WO2022110878A1 - 一种光学防伪元件及其产品 - Google Patents

一种光学防伪元件及其产品 Download PDF

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Publication number
WO2022110878A1
WO2022110878A1 PCT/CN2021/109842 CN2021109842W WO2022110878A1 WO 2022110878 A1 WO2022110878 A1 WO 2022110878A1 CN 2021109842 W CN2021109842 W CN 2021109842W WO 2022110878 A1 WO2022110878 A1 WO 2022110878A1
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WIPO (PCT)
Prior art keywords
array
curved mirror
micro
optical anti
counterfeiting element
Prior art date
Application number
PCT/CN2021/109842
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English (en)
French (fr)
Inventor
崔海波
张宝利
朱军
王晓利
Original Assignee
中钞特种防伪科技有限公司
中国印钞造币总公司
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Application filed by 中钞特种防伪科技有限公司, 中国印钞造币总公司 filed Critical 中钞特种防伪科技有限公司
Priority to US18/253,969 priority Critical patent/US20240092114A1/en
Priority to CA3199882A priority patent/CA3199882A1/en
Priority to EP21896385.8A priority patent/EP4253076A4/en
Publication of WO2022110878A1 publication Critical patent/WO2022110878A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/342—Moiré effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/369—Magnetised or magnetisable materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378—Special inks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/002—Arrays of reflective systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces

Definitions

  • This application relates to the field of anti-counterfeiting, in particular to an optical anti-counterfeiting element suitable for various high-security products and high-value-added products such as banknotes, credit cards, passports, and securities, as well as products using the optical anti-counterfeiting element, such as banknotes, Credit cards, passports and securities, etc.
  • optical anti-counterfeiting elements are widely used in high security products such as banknotes, credit cards, passports and securities, as well as other high value-added products.
  • CN1906547B and CN101379423B disclose anti-counterfeiting elements with a microlens array and a micrographic text array on the two surfaces of the substrate respectively, wherein the micrographic text array is located near the focal plane of the microlens array, and the micrographic text array is detected by the microlens array. Moiré magnification of the array to reproduce patterns with depth of field or dynamic effects.
  • CN104024921B discloses a transferable optical system with reduced thickness that eliminates the need for optical spacers to provide the necessary focal length between focusing elements and their associated micrographic structures that are in contact but not fully embedded
  • the focusing element and the micro-text structure are respectively subjected to UV glue casting replication, and two nested UV glue casting replications are carried out. This process requires high standard requirements for microstructure replication equipment and materials. Process difficulty.
  • CN1906547B discloses a film material.
  • the microlens array and the micrographic and text array are located in their respective planes.
  • the lens arrays are separately mastered, and then the micrographic arrays and the microlens arrays are replicated in batches on both sides of the film substrate, respectively, in production.
  • the defects of the anti-counterfeiting element of this structure are: (1) This structure requires that the microlens array and the micrographic and text array are arranged periodically, and the period error of the original plate is in the sub-micron level, so the production is difficult; (2) In the production process, the two surfaces of the substrate need to be processed in sequence, so the process flow is complicated; (3) In the production process, the alignment problem of the microlens array and the micrographic array needs to be solved, so the process can be Low controllability; (4) Since the strict alignment of the micrographic and text array and the microlens array cannot be guaranteed during the production process, some anti-counterfeiting effects cannot be expected or even unrealized.
  • the present application provides an optical anti-counterfeiting element capable of overcoming the above-mentioned defects and a product using the optical anti-counterfeiting element. There is no need for the alignment of the microlens array and the micrographic text array.
  • an embodiment of the present application provides an optical anti-counterfeiting element
  • the optical anti-counterfeiting element includes: a base material; a reflective curved mirror array located on a surface of the base material; and a micrographic and text array formed on the base material
  • the micro-graphics array and the reflective curved mirror array are in the same plane and overlap without space, wherein the reflective curved mirror array is sampled to synthesize the micro-graphics array that has a coupling effect therewith Then, a dynamic effect is formed.
  • the reflective curved mirror array is a periodic array, a local periodic array, a non-periodic array and/or a random array composed of a plurality of curved units
  • the micro-graphics array is the same as the reflective curved mirror A periodic arrangement, aperiodic arrangement, or random arrangement with coupling effects that match the array.
  • the specific arrangement of the micro-graphics and text units is a periodic array and/or a non-periodic array, and is jointly determined by the arrangement of the reflective surface sampling tool and the macro animation effect to be achieved.
  • the macro animation effects are horizontal translation, vertical translation, orthogonal translation, floating up, and sinking
  • the micro-image and text arrangement is periodic;
  • the dynamic effects are zoom, dual-channel, and stereo, each angle is reflected into the human eye.
  • the rays are different, ie, the micrographic arrangement is aperiodic, or random.
  • the sampling and synthesis process of the reflective curved mirror array described in this application to the micro-graphics and text array finally forms a sampled composite image.
  • These sampled composite images are macroscopic composite images that can be directly observed by the human eye.
  • Dynamic effects, the dynamic effects include translation, dual-channel, multi-channel, animation, and stereo.
  • the reflective curved surface mirrors in the reflective curved surface mirror array include concave mirrors and/or convex mirrors.
  • the base of the reflective curved mirror in the reflective curved mirror array is one or any combination of the following: circular, elliptical, polygonal, or infinitely extending in a certain direction in the plane (that is, embodied in the form of a cylindrical lens) ).
  • the cross section of the reflective curved mirror in the reflective curved mirror array is one or any combination of the following: circle, ellipse, polygon, sawtooth, parabola and sine.
  • the reflective curved mirror array is one-dimensional or two-dimensional.
  • micro-graphics and text units in the micro-graphics and text array are grooves, planes or protrusions.
  • microstructures are distributed in the grooves or on the protrusions, so that the intensity contrast of light reflection is generated between the micrograph and text area and the reflective curved mirror area.
  • the microstructure is any one of the following: a one-dimensional microstructure, a two-dimensional submicron structure, and a structural color, which can be colored in combination with the metal coating or optically variable coating mentioned below to form a groove or an optically variable coating. Color contrast in areas outside of raised structures.
  • micrographic and text unit when the micrographic and text unit is a groove or a protrusion, its cross section can be any one of the following: a rectangle, a sawtooth shape, a triangle shape, and a sinusoidal waveform.
  • the optical anti-counterfeiting element further includes a first color functional layer and a second color functional layer respectively located on the micrographic array and the reflective curved mirror array.
  • the colors of the first color functional layer and the second color functional layer are the same or different.
  • the first color functional layer and the second color functional layer can be based on the unevenness of the grooves or protrusions, so that the color functional layer exhibits color saturation contrast, thereby realizing coloring;
  • the colors of the first color functional layer and the second color functional layer are different. In this case, coloration is achieved by filling with different pigments.
  • the first color functional layer and the second color functional layer include single-layer coating layer, multi-layer coating layer, ink, pigment, dye, which can be one or any combination of the above.
  • the first color functional layer and the second color functional layer have diffractive light-variable features, interference light-variable features, micro-nano structure features, printing features, partial metallization features, fluorescent features and/or magnetic properties for machine reading. , optical, electrical, radioactive characteristics.
  • the optical anti-counterfeiting element further includes: a reflective layer, which is located on the micro-graphics array and the reflective curved mirror array.
  • the reflective layer is one or any combination of the following: a single-layer metal coating, a multi-layer metal coating, a coating formed by an absorption layer, a low-refractive-index dielectric layer and a reflective layer, a high-refractive-index dielectric layer coating, a The first high-refractive-index medium layer, the low-refractive-index medium layer and the second high-refractive-index medium layer are stacked in sequence to form a multi-medium layer coating, and a coating layer is formed by stacking an absorption layer, a high-refractive-index medium layer and a reflective layer in sequence.
  • the period of the reflective curved mirror array is 5 micrometers to 200 micrometers.
  • the line width of the micro-graphics unit in the micro-graphics array is 0.2 micrometers to 100 micrometers.
  • the substrate is a colored or colorless film that is transparent to visible light and is composed of one or more of the following materials: polyethylene terephthalate, polyvinyl chloride, polyethylene, polycarbonate, poly Acrylic, metal, glass and paper.
  • the present application provides an optical anti-counterfeiting product, the optical anti-counterfeiting product includes the above-mentioned optical anti-counterfeiting element.
  • the micro-graphics array and the reflective curved mirror array are in the same plane without overlapping; after the reflective curved mirror array is sampled to synthesize a micro-graphics array with a coupling effect therewith, an optical dynamic, three-dimensional image is formed. Effect.
  • the difficulty of fabricating the microlens array and the micrographic text array and the need for strict alignment with each other can be solved, the process controllability can be improved, and the expected anti-counterfeiting effect can also be ensured.
  • Figure 1a is a top view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • FIG. 1b is a cross-sectional view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Fig. 1c is an optical schematic diagram of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Fig. 2a is a micrographic design diagram of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Figure 2b is a top view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • FIG. 3 is a cross-sectional view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • FIG. 4 is a schematic cross-sectional view of a micrographic text stroke and a region between the micrographic text strokes in an optical anti-counterfeiting element according to an embodiment of the present application.
  • FIG. 5a is a schematic diagram of a micrographic design method of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Figure 5b is a macroscopic rendering of an optical anti-counterfeiting element according to an embodiment of the present application.
  • FIG. 6a is a schematic diagram of a micrographic design method of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Figure 6b is a macro rendering of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Figure 8a is a top view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • 8b is a cross-sectional view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Figure 9a is a top view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Figure 9b is a top view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • Substrate 2. Surface of substrate; 21. Reflective curved mirror array; 22. Micrographic array; 23. Reflective layer; 41. Pigment functional layer; 42. Structural color; 43. Subwavelength structure.
  • first and second are only used for description purposes, and cannot be understood as indicating relative importance, or implicitly indicating the number of indicated technical features.
  • features defined as “first” and “second” may expressly or implicitly include one or more of the features; “plurality” means two or more.
  • the term “comprising” and any variations thereof mean non-exclusive inclusion, possibly the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or combinations thereof.
  • Fig. 1a is a top view of an optical anti-counterfeiting element according to an embodiment of the present application
  • Fig. 1b is a cross-sectional view of an optical anti-counterfeiting element according to an embodiment of the present application.
  • an embodiment of the present application provides an optical anti-counterfeiting element
  • the optical anti-counterfeiting element includes: a substrate 1 and a reflective curved mirror array 21 located on a surface 2 of the substrate; The micro-graphics array 22 on the reflective curved mirror array; and the reflective layer 23 are located on the micro-graphics array 22 and the reflective curved mirror array 21 .
  • the micro-graphics array 22 and the reflective curved mirror array 21 are in the same plane, and the two arrays are overlapped in space without space.
  • the micrographic array 22 is represented in the cross-sectional view as grooves in the reflective curved mirror array 21, the grooves being etched (eg, laser etched) on the reflective curved mirror array 21 is formed, and further reflects the morphology of the micrographic array 22 . It can be seen that the micrographic array 22 is embedded in the reflective curved mirror array 21 , which is on the same plane as the reflective curved mirror array 21 .
  • the reflective curved mirror array 21 and the micro-graphics array 22 have an array coupling effect, the reflective curved mirror array 21 performs spatial sampling on the micro-graphics array 22, and is reflected into the human eye through the reflective layer 23 to synthesize macroscopic optical images and dynamic features.
  • Fig. 1a The top view of the optical anti-counterfeiting element is shown in Fig. 1a, and the cross-sectional view is shown in Fig. 1b.
  • the figures show the spatial arrangement law between the curved mirror array and the micrographic array in a periodic instance. It should be noted that the reflective layer 23 is only provided to achieve a better viewing effect, which is not necessary.
  • i and j are the serial numbers of the animation frames when the sample is rotated on the y-axis and on the x-axis, respectively, let i and j range from 1, 2, 3... M. That is, M frames are taken in each of the x and y directions, and the total number of frames is M*M frames.
  • Figure 1c shows the design process of the reflective curved mirror array and the micrographic array.
  • its macro image "5" consists of 12*12 pixels, and each pixel corresponds to the contribution of a micro-sampling tool.
  • the pixel (m,n) in column n will correspond to a position under the microsampling tool in row m, column n, which is determined by the macro image under consideration
  • the corresponding viewing angles ⁇ and The frame numbers i and j are determined.
  • the value of pixel (m, n) can be assigned to pixel (i, j) of the microtext array.
  • Traverse the viewing angle ⁇ and M*M macro-enlarged images and the N*N micro-sampling tools involved can generate total micro-graphic information including (M*N) 2 micro-pixels.
  • the present application is a sampling synthesis principle between a reflective element array and a micro-text array, and the moving direction, floating direction, and sinking direction of the macro-enlarged image are opposite to the design directions in the above-mentioned refraction principle.
  • the defect position can form a continuous image, and the macroscopic color characteristics of the image are: if the reflected light from the curved mirror enters the human eye, a bright background will be formed; The human eye forms a dark image.
  • the degree of space-free overlap between the micro-image and the curved mirror that is, the depth of the position where the micro-image is distributed on the cross-section of the curved mirror, will not change the grayscale of the dark image.
  • the micro-images and texts should be overlapped on the surface of the curved mirror without any space.
  • the depth of the micro-images and texts from the surface of the curved mirror is less than 1 micron. The clarity of the image is better.
  • the reflective curved mirror array is a periodic array or a partial periodic array composed of a plurality of curved mirror units
  • the matching micrographic array with coupling effect is a periodic arrangement or a non-periodic arrangement.
  • the reflective curved mirror array can also be an aperiodic array and/or a random array composed of a plurality of curved units, and the matching micrographic array with coupling effect is aperiodic arrangement or random arrangement.
  • the virtual shadow is the inevitable existence of the reflective curved mirror array after sampling and synthesis of the micro-graphics array, and it should be avoided as much as possible in the optical effect, otherwise it will lead to the disadvantage of blurred images. Due to the defects of the equipment manufacturing process, the smoothness of the reflective surface is not enough. During the sampling process of the micro-image and text by the curved mirror, phenomena such as erroneous sampling and repeated sampling occur, resulting in the occurrence of ghosting. In order to avoid the above problems, it is necessary to use a curved mirror array design with a simple arrangement rule as much as possible.
  • the reflective curved mirror arrays are in a rectangular arrangement and a hexagonal arrangement, and in this embodiment, a rectangular arrangement is adopted.
  • the period of the reflective curved mirror array is 5 microns to 200 microns, and 25 microns is used in this embodiment.
  • the line width of the micro-text unit is 0.2 micrometers to 100 micrometers, and 2 micrometers is used in this embodiment.
  • Fig. 2a is a micrographic design diagram of an optical anti-counterfeiting element according to an embodiment of the present application
  • Fig. 2b is a top view of the optical anti-counterfeiting element according to an embodiment of the present application.
  • the optical anti-counterfeiting element includes: a cylindrical graphic and text array, and a reflective spherical lens array, and the cylindrical graphic text array is embedded in the reflecting spherical lens array, as shown in Figure 2b.
  • Figure 2a shows the arrangement of the column graphic text, that is, the number "5", the width is unchanged in the horizontal direction, and the stretching is performed in the vertical direction.
  • the stretched length is a macro size, which is consistent with the actual optical effect.
  • the arrangement of the two-dimensional spherical mirror and the two-dimensional micrographics and texts (the arrangement of the micrographics and texts is the same as that of the spherical mirror, only the period and angle of the textual images have some changes on the microscopic level), which has requirements for the observation light source.
  • the optical effect is the best, when there are multiple light sources in the environment, multiple images will be formed, and overlapping will cause blurring. Therefore, in this embodiment, the column image and text arrangement is adopted, and the magnification effect exists only in one direction, and the other direction is not affected by the light source, so that the actual optical effect becomes clearer and more variable.
  • the period of the reflective curved mirror array is 5 microns to 200 microns, and 25 microns is used in this embodiment.
  • the column graphic period is 5 microns to 200 microns, which is 24.9 microns in this embodiment, and the line width of the micro graphic cells is 0.2 microns to 100 microns, which is 2 microns in this embodiment.
  • the reflective curved mirror in the reflective curved mirror array can be a concave mirror and/or a convex mirror.
  • the above Fig. 1b shows the case where it is a convex mirror
  • the following Fig. 3 shows the concave mirror.
  • a cross-sectional view of a concave mirror array according to an embodiment of the present application is specifically given.
  • the optical anti-counterfeiting element includes: a substrate 1 and a reflective curved mirror array 21 located on the surface of the substrate; and a micro-graphics array 22 formed on the reflective curved mirror array, and a surface covered on the curved mirror Reflective layer 23 on the surface of the array.
  • Fig. 1b when viewed upward from the lower end of the substrate, it is a cross-sectional view of the microstructure as shown in Fig. 3 .
  • the contribution of the curved surface to the sampling micro-text array is to realize the micro-text selection at different angles.
  • Concave mirrors or convex mirrors have the same contribution to the angle selection, so the optical effects of the macro images formed by the convex mirror and the concave mirror are roughly the same. .
  • the distribution of the micro-graphics and text arrays on the curved mirror can be grooves, or protrusions, or planes of color functional layers, or small-sized structures filled in the grooves or protrusions of graphic and text strokes.
  • the micrographic structure is a groove or a protrusion, and a convex micrographic array structure is used in this embodiment.
  • the period of the reflective curved mirror array is 5 microns to 200 microns, and 25 microns is used in this embodiment.
  • the line width of the micro-text unit is 0.2 micrometers to 100 micrometers, and 2 micrometers is used in this embodiment.
  • FIG. 4 shows a cross-sectional view of a graphic and text that can be filled with small-sized structures or not filled with any small-sized structures in the micro-graphics and text grooves, combined with color functional colors to form color contrast.
  • the optical anti-counterfeiting element includes: a substrate 1 and a reflective curved mirror array 21 located on the surface of the substrate; and a micrographic array 22 formed on the reflective curved mirror array, and covered on the reflective curved surface
  • the human eye is not very sensitive to the visual response of dark images.
  • small-sized structures are filled in the micro-images and strokes, combined with the diffraction effect of the metal coating and the microstructure, Interference effect, microstructure effect, pigment coating, etc., can realize the coloring of micro-graphics and strokes.
  • the small-sized microstructure must be attached to the large-sized structure, and only when the same shape is covered, that is, the micro-graphics and text strokes formed by the small-sized microstructures are attached to the surface or inside of the curved mirror, and the morphology of the micro-graphics and text stroke grooves. It has the same curvature as the curved mirror topography. Only the reflected light at the strokes of the micro-graphics can be reflected into the human eye, and under a specific optical principle, a structural color is formed, thereby forming a colorful optical magnification effect.
  • the above-mentioned small-scale structure can be any of the following: one-dimensional microstructure (sine in the figure), two-dimensional submicron structure (sine in the figure), structural color (circle in the figure), paint layer .
  • the small-scale structures in combination with a reflective layer 23 (eg, a metal coating or an optically variable coating), are colored to create a color contrast to the areas outside the groove structures.
  • the color functional layer may include a single-layer coating layer, a multi-layer coating layer, ink, pigment, and dye, which may be one or any combination of the above.
  • the color functional layer A and the color functional layer B are respectively applied on the surfaces of the micrographic array and the curved mirror array.
  • the above-mentioned micrographic units can be grooves, protrusions or planes.
  • the color functional layer A and the color functional layer B are the same or different.
  • the color functional layer A and the color functional layer B can be based on the unevenness of the groove protrusions, so that the color functional layer exhibits color saturation contrast, thereby realizing coloring.
  • a color functional layer A and a color functional layer B are respectively applied on the surface of the graphic array and the reflective curved mirror array, and the color functional layer A and the color functional layer B are different. In this case, coloration is achieved by filling with different pigments.
  • the small-scale structure is a sub-wavelength structure 43, it can be a one-dimensional grating or a two-dimensional grating, and the groove shape of the sub-wavelength structure can be sinusoidal, rectangular, sawtooth, etc.; the grid distribution of the two-dimensional grating can be an orthogonal structure , honeycomb structure, two-dimensional Bravais lattice structure, random structure, etc.
  • the sub-wavelength structures are not limited to the structures described above, and the splicing or combination of these sub-wavelength structures may be used in practical optical anti-counterfeiting elements.
  • One of the ways of splicing or combining may include a reflective curved mirror and a secondary structure located on the reflective curved mirror, and the secondary structure may be a two-dimensional subwavelength structure.
  • a metal layer needs to be evaporated and sputtered on the surface of the two-dimensional subwavelength structure.
  • the metal material used can be one or more of gold, silver, copper, aluminum, iron, tin, zinc, nickel, chromium and the like.
  • the aluminum layer is evaporated, and the thickness is preferably 30 nm. It is also possible to vapor-deposit a single dielectric layer or multiple dielectric layers.
  • the used dielectric material can be selected from MgF 2 , SiO 2 , Al 2 O 3 , MgO, PMMA, TiO 2 , ZnS, ZnO, and the multilayer dielectric film usually adopts a high-low-high film system design.
  • SiO 2 is used to vapor-deposit a three-layer structure, and the light changes color from yellow to green. In the covered area of the two-dimensional subwavelength structure, the color of the light changes from red to green; in the uncovered area, the color of the light changes from yellow to green.
  • Figures 5a and 5b respectively show a micrographic array and a macro rendering of the optical anti-counterfeiting element when the optical characteristic effect is a translation change according to an embodiment of the present application.
  • the optical anti-counterfeiting element comprises a periodically arranged reflective curved mirror array, which has an axis of symmetry in at least one direction; and a periodically arranged micro-graphics and text array.
  • the micrographic array has an axis of symmetry in at least one direction, which is parallel to a certain axis of symmetry of the reflective curved mirror array.
  • FIG. 5a shows the visual image effect of the provided x-axis, that is, the translation process of a visual image, that is, during the process of changing the viewing angle along the positive or negative direction of the x-axis, the visual image will restore a
  • the repeated translation process of the visual image is shown in Fig. 5a.
  • Figure 5b shows the characteristics of the optical translation effect when the anti-counterfeiting element swings left and right and up and down in the human eye.
  • a one-dimensional cylindrical graphic design is adopted in this embodiment, and a two-dimensional spherical curved mirror design is adopted for the reflective curved mirror.
  • the dynamic features in a certain dimension are sacrificed, and at the same time, the probability of mis-sampling and repeated sampling of micro-images is reduced, and the number of ghost images is reduced by half, thereby increasing the clarity.
  • the period of the reflective curved mirror array is 5 microns to 200 microns, and 25 microns is used in this embodiment.
  • the line width of the micro-text unit is 0.2 micrometers to 100 micrometers, and 2 micrometers is used in this embodiment.
  • the optical anti-counterfeiting element includes a periodically arranged reflective curved mirror array and a non-periodically designed micro-graphics array, and the microscopic arrangement of the micro-graphics array is aperiodic and has no axis of symmetry.
  • the figure only schematically shows the visual image effect of the provided y-axis, that is, the translation process of a visual image, that is, during the process of changing the viewing angle along the positive or negative direction of the y-axis, the visual image will restore a visual image. The image is panned over and over again.
  • the period of the reflective curved mirror array is 5 microns to 200 microns, and 25 microns is used in this embodiment.
  • the line width of the micro-text unit is 0.2 micrometers to 100 micrometers, and 2 micrometers is used in this embodiment.
  • Figures 7a and 7b show macroscopic reproduction diagrams of an optical anti-counterfeiting element whose optical characteristic effect is a change in image and text switching according to an embodiment of the present application.
  • the micro-text array is designed as text 5 and graphic star, respectively, and two original design images of the micro-text array with the same pixels are obtained. Then, use half of the curved surface of the curved mirror unit to sample the micro-text array text 5, and use the other half of the curved surface to sample the micro-text array star. In this way, two micro-text arrays with only half of the image and text information are combined, and Figure 7 can be obtained.
  • original optical design When the anti-counterfeiting element swings left and right, up and down in the human eye, it can be observed that the optical effect of the micro-image and text is switched.
  • FIG. 8a and 8b show a micrographic array and a macro rendering diagram of the optical anti-counterfeiting element whose optical characteristic effect is a scaling change according to an embodiment of the present application.
  • the microscopic arrangement of the micrographic array is non-periodic and has no axis of symmetry, which is another optical effect embodiment of the optical principle of FIG. 5a.
  • Figures 9a and 9b show a micrographic array of an optical anti-counterfeiting element whose optical characteristic effect is sinking and floating, according to an embodiment of the present application, and the microscopic arrangement of the micrographic array is periodic or local. Periodic, with an axis of symmetry in at least one plane, is yet another optical effect embodiment of the optical principle of Figure 5a.

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Abstract

提供了一种光学防伪元件及其产品，光学防伪元件包括：基材（1）；位于基材的一表面上的反射曲面镜阵列（21）；以及形成在反射曲面镜阵列上的微图文阵列（22），微图文阵列与反射曲面镜阵列处于同一平面内，且无间隔重叠，反射曲面镜阵列采样合成与之具有耦合效应的微图文阵列后，形成动感效果。

Description

一种光学防伪元件及其产品 技术领域
本申请涉及防伪领域，尤其涉及一种适用于钞票、信用卡、护照和有价证券等各类高安全产品和高附加值产品的光学防伪元件，还涉及使用该光学防伪元件的产品，诸如钞票、信用卡、护照和有价证券等。
背景技术
由于光学防伪元件具有独特的视觉效果和易识别性，所以被广泛应用于钞票、信用卡、护照和有价证券等高安全产品以及其它高附加值产品中。
CN1906547B和CN101379423B公开了在基材的两个表面上分别带有微透镜阵列和微图文阵列的防伪元件，其中微图文阵列位于微透镜阵列的焦平面附近，通过微透镜阵列对微图文阵列的莫尔放大作用来再现具有一定景深或呈现动态效果的图案。
CN104024921B公开了具有减小厚度的可转移光学系统，消除了对用于提供聚焦元件与它们的相关微图文结构之间必需焦距的光学间隔物的需要，微图文结构接触但不完全地嵌入其内部，在工程化复制过程中，聚焦元件与微图文结构分别进行UV胶浇铸复制，进行两次嵌套UV胶浇铸复制，该工艺需求对于微结构复制设备和材料具有高标准要求，增加工艺难度。
CN1906547B公开了一种膜材料，在其中所公开的光学微结构防伪元件中，微透镜阵列和微图文阵列分别位于各自的平面内，因此在制作过程中，首先需要对微图文阵列和微透镜阵列分别进行原版制备，然后在生产中在薄膜基材的两侧上分别对微图文阵列和微透镜阵列进行批量复制。这种结构的防伪元件的缺陷在于：(1)该结构要求微透镜阵列、微图文阵列均为周期性排列，在制作原版时其周期误差在亚微米级，因此制作难度高；(2)在 生产过程中，需要在基材的两个表面上依次分别进行加工，因此工艺流程复杂；(3)在生产过程中，需要解决微透镜阵列和微图文阵列的对位问题，因此工艺可控性低；(4)由于生产过程中无法保证微图文阵列和微透镜阵列的严格对位，所以一些防伪效果无法达到预期甚至无法实现。
发明内容
本申请针对现有技术中的上述缺点，提供一种能够克服上述缺陷的光学防伪元件以及使用该光学防伪元件的产品，本申请所提供的光学防伪元件以及使用该光学防伪元件的产品在制造过程中无需微透镜阵列和微图文阵列的对位。
为了实现上述目的，本申请实施例提供一种光学防伪元件，该光学防伪元件包括：基材；反射曲面镜阵列，位于所述基材的一表面上；以及微图文阵列，形成在所述反射曲面镜阵列上，所述微图文阵列与所述反射曲面镜阵列处于同一平面内，且无间隔重叠，其中所述反射曲面镜阵列采样合成与之具有耦合效应的所述微图文阵列后，形成动感效果。
其中，所述反射曲面镜阵列为由多个曲面单元构成的周期性阵列、局部周期性阵列、非周期性阵列和/或随机性阵列，且所述微图文阵列为与所述反射曲面镜阵列相匹配的具有耦合效应的周期性排列、非周期性排列、或随机性排列。
其中，所述微图文单元的排布具体形式为周期性阵列和/或非周期性阵列，且由反射曲面采样工具的排布形式和所要实现的宏观动画效果共同决定。当宏观动画效果为水平平移、垂直平移、正交平移、上浮、下沉时，其微图文排列是周期性的；当动感效果为缩放、双通道、立体时，每一个角度反射入人眼的光线是不同的，即，微图文排列是非周期性的，或随机的。需要说明的是，本申请所述的反射曲面镜阵列对微图文阵列的采样合成过程，最终 形成采样合成图像，这些采样合成图像是人眼可以直接观察到的宏观合成图像，可以具体形成若干动感效果，所述动感效果包括平移、双通道、多通道、动画、立体。
其中，由于反射曲面的功能在于反射光射入人眼，其形貌是光滑的、连续的，所述反射曲面镜阵列内的反射曲面镜包含凹面镜和/或凸面镜。
其中，所述反射曲面镜阵列内的反射曲面镜的基座为以下中的一者或任意组合：圆形、椭圆形、多边形，或沿面内某方向无限延伸(即，体现为柱透镜的形式)。
其中，所述反射曲面镜阵列内的反射曲面镜的横截面为以下中的一者或任意组合：圆形、椭圆形、多边形、锯齿形、抛物线形和正弦形。
其中，所述反射曲面镜阵列为一维的或二维的。
其中，所述微图文阵列内的微图文单元为凹槽、平面或者凸起。
其中，所述凹槽内或所述凸起上分布有微结构，使得微图文区域与反射曲面镜区域产生光线反射的强弱对比。
其中，所述微结构为以下任意一种：一维亚微米结构、二维亚微米结构、结构色，其可结合以下提及的金属镀层或者光变镀层，进行着色，以形成与凹槽或凸起结构之外区域的颜色对比。
其中，当所述微图文单元为凹槽、凸起时，其横截面可以为以下任意一种：矩形、锯齿形、三角形、正弦波形。
其中，该光学防伪元件还包括分别位于所述微图文阵列与所述反射曲面镜阵列上的第一颜色功能层和第二颜色功能层。
其中，在所述微图文阵列内的微图文单元为凹槽或者凸起的情况下，所述第一颜色功能层和第二颜色功能层的颜色是相同的或不同。在这种情况下，第一颜色功能层和第二颜色功能层可根据凹槽或凸起的高低不平，使得颜色功能层呈现颜色饱和度对比，从而实现着色；
其中，在所述微图文阵列内的微图文单元为平面的情况下，所述第一颜色功能层和第二颜色功能层的颜色是不同的。在该情况下，通过填充不同的颜料，从而实现着色。
其中，所述第一颜色功能层和第二颜色功能层包括单层镀层、多层镀层、油墨、颜料、染料，可以是上述的一种或者任意组合。
其中，所述第一颜色功能层和第二颜色功能层具有衍射光变特征、干涉光变特征、微纳结构特征、印刷特征、部分金属化特征、荧光特征和/或用于机读的磁、光、电、放射性特征。
其中，该光学防伪元件还包括：反射层，位于所述微图文阵列和所述反射曲面镜阵列上。
其中，所述反射层为以下中的一者或任意组合：单层金属镀层、多层金属镀层、由吸收层、低折射率介质层和反射层形成的镀层、高折射率介质层镀层、由第一高折射率介质层、低折射率介质层和第二高折射率介质层依次堆叠形成的多介质层镀层、以及由吸收层、高折射率介质层和反射层依次堆叠形成的镀层。
其中，所述反射曲面镜阵列的周期为5微米至200微米。
其中，所述微图文阵列内的微图文单元的线条宽度为0.2微米至100微米。
其中，所述基材为由以下材料中的一者或多者构成的对可见光透明的有色或无色薄膜：聚对苯二甲酸二醇酯、聚氯乙烯、聚乙烯、聚碳酸酯、聚丙烯、金属、玻璃以及纸张。
另一方面，本申请提供一种光学防伪产品，该光学防伪产品包括上述光学防伪元件。
通过上述技术方案，使得所述微图文阵列与反射曲面镜阵列处于同一平面内，且无间隔重叠；反射曲面镜阵列采样合成与之具有耦合效应的微图文 阵列后，形成光学动感、立体效果。籍此，可解决微透镜阵列和微图文阵列的制作难度及相互之间需严格对位问题，提高工艺可控性，亦可保证实现预期的防伪效果。
本申请实施例的其它特征和优点将在随后的具体实施方式部分予以详细说明。
附图说明
附图是用来提供对本申请实施例的进一步理解，并且构成说明书的一部分，与下面的具体实施方式一起用于解释本申请实施例，但并不构成对本申请实施例的限制。在附图中：
图1a是根据本申请一种实施方式的光学防伪元件的俯视图。
图1b是根据本申请一种实施方式的光学防伪元件的剖面图。
图1c是根据本申请一种实施方式的光学防伪元件的光学原理图。
图2a是根据本申请一种实施方式的光学防伪元件的微图文设计图。
图2b是根据本申请一种实施方式的光学防伪元件的俯视图。
图3是根据本申请一种实施方式的光学防伪元件的剖面图。
图4是根据本申请一种实施方式的的光学防伪元件中的微图文笔画和微图文笔画之间的区域的剖面示意图。
图5a是根据本申请一种实施方式的光学防伪元件的微图文设计方法示意图。
图5b是根据本申请一种实施方式的光学防伪元件的宏观再现图。
图6a是根据本申请一种实施方式的光学防伪元件的微图文设计方法示意图。
图6b是根据本申请一种实施方式的光学防伪元件的宏观再现图。
图7是根据本申请一种实施方式的光学防伪元件的宏观再现图。
图8a是根据本申请一种实施方式的光学防伪元件的俯视图。
图8b是根据本申请一种实施方式的光学防伪元件的剖面图。
图9a是根据本申请一种实施方式的光学防伪元件的俯视图。
图9b是根据本申请一种实施方式的光学防伪元件的俯视图。
附图标记说明：
1、基材；2、基材表面；21、反射曲面镜阵列；22、微图文阵列；23、反射层；41、颜料功能层；42、结构色；43、亚波长结构。
具体实施方式
下面将结合附图来详细说明根据本申请的光学防伪元件及使用该光学防伪元件的光学防伪产品。应当理解，所述附图和详细描述只是对本申请优选实施方式的描述，并非以任何方式来限制本申请的保护范围。并且，本领域技术人员应当理解，所有附图中的灰度以及尺寸比例仅为示意性的，不代表实际的颜色和尺寸比例。
在本申请的描述中，术语“第一”、“第二”仅用于描述目的，而不能理解为指示相对重要性，或者隐含指明所指示的技术特征的数量。由此，除非另有说明，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征；“多个”的含义是两个或两个以上。术语“包括”及其任何变形，意为不排他的包含，可能存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
另外，“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系的术语，是基于附图所示的方位或相对位置关系描述的，仅是为了便于描述本申请的简化描述，而不是指示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
图1a是根据本申请一种实施方式的光学防伪元件的俯视图，图1b是根 据本申请一种实施方式的光学防伪元件的剖面图。如图1a和图1b所示，本申请一种实施方式提供了一种光学防伪元件，该光学防伪元件包括：基材1和位于基材表面2上的反射曲面镜阵列21；形成在所述反射曲面镜阵列上的微图文阵列22；以及反射层23，位于所述微图文阵列22和所述反射曲面镜阵列21上。所述微图文阵列22与反射曲面镜阵列21处于同一平面内，且两阵列在空间位置上实现无间隔重叠。如图1b所示，微图文阵列22在剖面图内被表现为反射曲面镜阵列21内的凹槽，该凹槽通过对所述反射曲面镜阵列21进行刻蚀(例如，激光刻蚀)而形成，进而反映出微图文阵列22的形貌。可见微图文阵列22是嵌入在反射曲面镜阵列21内的，其与反射曲面镜阵列21处于同一平面。当反射曲面镜阵列21和微图文阵列22具有阵列耦合效应时，所述反射曲面镜阵列21对微图文阵列22进行空间采样，经过反射层23反射入人眼，合成宏观的光学影像以及动态特征。
所述光学防伪元件俯视图如图1a，剖面图如图1b所示，图中示出了一周期性实例下的曲面镜阵列与微图文阵列之间的空间排列规律。需要说明的是，所述反射层23只是为了达成更好的观看效果而设置，其并非是必须的。
为产生任意动画效果，需要一般性的微图文阵列设计方法，该方法包含以下三步：
1)确定各个观察角度下所看到的宏观放大图像
Figure PCTCN2021109842-appb-000001
θ和
Figure PCTCN2021109842-appb-000002
分别为样品以y轴转动的倾角和以x轴转动的倾角，i和j分别为样品以y轴转动和以x轴转动的动画帧的序号，设i和j范围为1,2,3…M。即在x和y方向各取M帧，总帧数即为M*M帧。
2)将每一张宏观放大图像
Figure PCTCN2021109842-appb-000003
按照宏观图像的实际尺寸和微采样工具的尺寸进行像素化，每个像素对应一个微采样工具；举例来说，设宏观图像为正方形，边长为L，微采样工具的间距为p，那么在L的长度内包括的微采样工具数目为N＝L/p。将宏观放大图像
Figure PCTCN2021109842-appb-000004
缩放为N*N像素即可实 现每个像素对应一个微采样工具。
3)按照观察角度将每个像素投影到微采样工具所对应的微图文区域。遍历所有宏观图像和所有微采样工具后即完成微图文阵列的设计。
根据上述动画设计原则，图1c示出了反射曲面镜阵列与微图文阵列的设计过程。以柱透镜为例，其宏观图像“5”由12*12像素组成，每个像素对应一个微采样工具的贡献。对于第m行，第n列的像素(m,n)将对应第m行，第n列的微采样工具下的某个位置，该位置便由所考虑的宏观图像
Figure PCTCN2021109842-appb-000005
对应的观察角度θ和
Figure PCTCN2021109842-appb-000006
的帧序号i和j决定。由
Figure PCTCN2021109842-appb-000007
对应的观察角度
Figure PCTCN2021109842-appb-000008
即可将像素(m,n)的值赋给微图文阵列的像素(i,j)。遍历观察角度θ和
Figure PCTCN2021109842-appb-000009
下M*M张宏观放大图像和所涉及的N*N个微采样工具，即可生成包含(M*N) 2个微像素的总的微图文信息。
特殊说明的是，本申请为反射型元件阵列与微图文阵列之间的采样合成原理，其宏观放大图像的运动方向、上浮方向、下沉方向与上述折射型原理中的设计方向相反。在采样阵列中，缺陷位置可形成连续的图像，其图像的宏观颜色特征为：若曲面镜的反射光线进入人眼，则形成亮背景；若微图文阵列的图文笔画处的光线无法进入人眼，则形成暗图像。
这里，需要说明的是，微图文与曲面镜的空间无间隔重叠程度，即，微图文分布在曲面镜横截面上的位置深度，不会改变暗图像的灰度。但是，在实际应用中，微图文尽量无间隔重叠在曲面镜表面，优选地，微图文距离曲面镜表面深度小于1微米，这样在表面覆盖反射层(例如，金属镀层)后，宏观合成图像的清晰度更好。
其中，所述反射曲面镜阵列为由多个曲面镜单元构成的周期性阵列或局部周期性阵列，与之匹配的具有耦合效应的微图文阵列为周期性排列、或非周期性排列。所述反射曲面镜阵列也可以为由多个曲面单元构成的非周期性阵列和/或随机性阵列，与之匹配的具有耦合效应的微图文阵列为非周期性排 列、或随机性排列。
虚影是反射型曲面镜阵列对于微图文阵列采样合成后的必然存在，是光学效果中需要尽量避免的，否则会导致图像模糊的弊端。由于设备制作工艺缺陷，导致反射曲面平滑度不够，在曲面镜对微图文采样过程中，发生错误采样、重复采样等现象，从而导致虚影现象发生。为避免上述问题，需要尽量采用排布规律简单的曲面镜阵列设计。优选地，所述反射曲面镜阵列为矩形排列和六角形排列，该实施例中采用矩形排列。
优选地，所述反射曲面镜阵列周期为5微米至200微米，该实施例中采用25微米。优选地，所述微图文单元线条宽度为0.2微米至100微米，该实施例中采用2微米。
图2a是根据本申请一种实施方式的光学防伪元件的微图文设计图，图2b是根据本申请一种实施方式的光学防伪元件的俯视图。该光学防伪元件包括：柱图文阵列，与反射球面透镜阵列，柱图文阵列嵌入在反射球面透镜阵列中，如图2b所示。图2a示出了柱图文的排列方式，即数字“5”，在水平方向上宽度不变，在垂直方向上进行拉伸，拉伸长度为宏观尺寸，与实际光学效果大小一致。
这里，需要说明的是，采用二维球面镜与二维微图文排列(微图文的排列方式与球面镜一致，只有图文周期和角度在微观上有一些改变)，对观察光源有要求。在点光源条件下，光学效果最好，当环境中存在多个光源时，则会形成多个图像，且发生重叠而产生模糊。所以，本实施例中采用柱图文排列方式，仅在一个方向上存在放大效果，另一个方向则不受光源的影响，使得实际光学效果变得更清晰可变。
优选地，所述反射曲面镜阵列周期为5微米至200微米，该实施例中采用25微米。优选地，柱图文周期为5微米至200微米，该实施例中采用24.9微米，所述微图文单元线条宽度为0.2微米至100微米，该实施例中采用2 微米。
对于所述反射曲面镜阵列内的反射曲面镜而言，其可为凹面镜和/或凸面镜，以上图1b示出了其为凸面镜的情况，以下图3给出了其为凹面镜的情况下，具体给出了根据本申请一个实施方式的凹面反射镜阵列的剖面图。如图3所示，该光学防伪元件包括：基材1和位于基材表面上的反射曲面镜阵列21；以及形成在所述反射曲面镜阵列上的微图文阵列22，以及覆盖在曲面镜阵列表面的反射层23。
需要说明的是，反射凸面镜表面覆盖金属镀层后，可以实现双面观察。对于图1b中的光学防伪元件示例，从基材下端向上观察时，其为微结构剖面图如图3所示。曲面的表面对于采样微图文阵列的贡献在于实现不同角度下的微图文选择，凹面镜或者凸面镜，对于角度选择的贡献相同，所以凸面镜和凹面镜形成的宏观图像的光学效果大致一样。
需要强调的是，所述微图文阵列在曲面镜上的分布可以为凹槽、或凸起、或颜色功能层平面，或图文笔画凹槽内或凸起上填充小尺寸结构。优选地，所述微图文结构为凹槽或者凸起，该实施例中采用凸起的微图文阵列结构。
优选地，所述反射曲面镜阵列周期为5微米至200微米，该实施例中采用25微米。优选地，所述微图文单元线条宽度为0.2微米至100微米，该实施例中采用2微米。
图4示出了在微图文凹槽内可以填充小尺寸结构或者不填充任何小尺寸结构，结合颜色功能色，形成颜色对比的图文的剖面图。
如图4所示，该光学防伪元件包括：基材1和位于基材表面上的反射曲面镜阵列21；以及形成在所述反射曲面镜阵列上的微图文阵列22，以及覆盖在反射曲面镜阵列21和微图文阵列22的表面的反射层23，以及填充微图文阵列22的凹槽内的颜料功能层41、结构色42、亚波长结构43。
客观地，人眼对于暗图像在视觉上的反应敏感度不强，为形成具有鲜明 颜色特征图文，在所述微图文笔画内填充小尺寸结构，结合金属镀层与微结构的衍射效果、干涉效果、微结构效果、颜料涂层等，可实现微图文笔画的着色。
需要说明的是，小尺寸微结构必须依附在大尺寸结构上，只有同形覆盖时，即小尺寸微结构形成的微图文笔画依附在曲面镜表面或者内部，微图文笔画沟槽的形貌与曲面镜形貌具有相同曲率。微图文笔画处的反射光线才能反射入人眼，在特定光学原理下，形成结构色，从而形成彩色的光学放大效果。
上述的小尺寸结构可以为以下任意一种：一维亚微米结构(图中为正弦形)、二维亚微米结构(图中为正弦形)、结构色(图中为圆形)、涂料层。小尺寸结构结合反射层23(例如，金属镀层或者光变镀层)，进行着色，以形成与凹槽结构之外区域的颜色对比。
所述颜色功能层可包括单层镀层、多层镀层、油墨、颜料、染料，可以是上述的一种或者任意组合。
需要说明的是，在微图文阵列和反射曲镜阵列表面分别施加颜色功能层A和颜色功能层B。上述的微图文单元可为凹槽、凸起或者平面。当微图文单元是凹槽或凸起时，其颜色功能层A和颜色功能层B是相同的或不同的。颜色功能层A和颜色功能层B可根据凹槽凸起的高低不平，使得颜色功能层呈现颜色饱和度对比，从而实现着色。当微图文单元是平面时，在图文阵列和反射曲面镜阵列表面分别施加颜色功能层A和颜色功能层B，颜色功能层A和颜色功能层B是不同的。在该情况下，通过填充不同的颜料，从而实现着色。
当小尺寸结构为亚波长结构43时，可以为一维光栅或二维光栅，亚波长结构的槽型可以是正弦形、矩形、锯齿形等；二维光栅的栅格分布可以是正交结构、蜂窝结构、二维布拉维点阵结构、随机结构等。应当理解的是， 亚波长结构并不局限于以上描述的结构，而且实际的光学防伪元件中可以采用这些亚波长结构的拼接或组合。其中一种拼接或组合的方式可包括反射曲面镜以及位于该反射曲面镜上的次级结构，该次级结构可为二维亚波长结构。为满足等离子体吸收条件，需在二维亚波长结构表面需蒸镀、溅射金属层。所采用的金属材料可以为金、银、铜、铝、铁、锡、锌、镍、铬等中一着或多。优选地，蒸镀铝层，厚度优选为30nm。也可以蒸镀单层介质层或者多层介质层。所采用的介质材料可以选自MgF 2、SiO 2、Al 2O 3、MgO、PMMA、TiO 2、ZnS、ZnO，并且多层介质膜通常采用高低高膜系设计。优选地，采用SiO 2，蒸镀三层结构，光变颜色为黄变绿。在有覆盖二维亚波长结构区域，光变颜色为红色变绿；未覆盖区域，光变颜色为黄变绿。
图5a和5b分别示出了根据本申请一实施例的光学特征效果为平移变化时的光学防伪元件的微图文阵列以及宏观再现图。该光学防伪元件包括周期性排列的反射曲面镜阵列，至少在一个方向上具有对称轴；以及周期性排列的微图文阵列。该微图文阵列至少在一个方向上具有对称轴，且与反射曲面镜阵列的某一对称轴平行。图中仅示意性地给出了所提供x轴的视觉图像效果，即一个视觉图像的平移过程，即沿着x轴正方向或者反方向改变观察视角的过程中，该视觉图像将还原出一个视觉图像周而复始的平移过程，如图5a所示。图5b示出了防伪元件在人眼内进行左右、上下摆动时的光学平移效果特征。
需要说明的是，为了减少虚影的影响，增加宏观合成图像的清晰度，该实施例中采用一维柱图文设计，反射曲面镜采用二维球面曲面镜设计。如此，牺牲某一维度上的动感特征，同时减少了微图文被误采样、重复采样的概率，使得虚影的数量减少一半，从而增加清晰度。
优选地，所述反射曲面镜阵列周期为5微米至200微米，该实施例中采 用25微米。优选地，所述微图文单元线条宽度为0.2微米至100微米，该实施例中采用2微米。
图6a和图6b示出了根据本申请的一实施例的光学特征效果为动感条纹变化的光学防伪元件的微图文阵列以及宏观再现图。该光学防伪元件包括周期性排列的反射曲面镜阵列以及非周期设计的微图文阵列，该微图文阵列的微观排列是非周期且无对称轴的。图中仅示意性地给出了所提供y轴的视觉图像效果，即一个视觉图像的平移过程，即沿y轴正方向或者反方向改变观察视角的过程中，该视觉图像将还原出一个视觉图像周而复始的平移过程。
需要说明的是，考虑虚影的影响，可以采用类似于图4中的结构设计理念。
优选地，所述反射曲面镜阵列周期为5微米至200微米，该实施例中采用25微米。优选地，所述微图文单元线条宽度为0.2微米至100微米，该实施例中采用2微米。
图7a和图7b示出了根据本申请的一实施例的光学特征效果为图文切换变化的光学防伪元件的宏观再现图。
在图5a中的微图文阵列分别设计为文字5和图文star，得到两张像素相同的微图文阵列设计原图。然后利用曲面镜单元的一半曲面采样微图文阵列文字5，利用另一半曲面采样微图文阵列star，如此将分别只有一半图文信息的两张微图文阵列进行组合，即可得到图7的光学设计原图。当防伪元件在人眼内进行左右、上下摆动时，可观察到微图文进行切换的光学效果特征。
图8a和图8b示出了根据本申请的一实施例的光学特征效果为缩放变化的光学防伪元件的微图文阵列及宏观再现图。该微图文阵列的微观排列是非周期且无对称轴的，为图5a的光学原理的又一光学效果实施例。
图9a和图9b示出了根据本申请的一实施例的光学特征效果为下沉、上浮变化的光学防伪元件的微图文阵列，该微图文阵列的微观排列是周期性的， 或者局部周期性的，至少在一个平面内具有对称轴，为图5a的光学原理的又一光学效果实施例。
还需要说明的是，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、商品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、商品或者设备所固有的要素。在没有更多限制的情况下，由语句“包括一个……”限定的要素，并不排除在包括要素的过程、方法、商品或者设备中还存在另外的相同要素。
以上仅为本申请的实施例而已，并不用于限制本申请。对于本领域技术人员来说，本申请可以有各种更改和变化。凡在本申请的精神和原理之内所作的任何修改、等同替换、改进等，均应包含在本申请的权利要求范围之内。

Claims (19)

  1. 一种光学防伪元件，其特征在于，该光学防伪元件包括：
    基材(1)；
    反射曲面镜阵列(21)，位于所述基材(1)的一表面上；以及
    微图文阵列(22)，形成在所述反射曲面镜阵列(21)上，所述微图文阵列(22)与所述反射曲面镜阵列(21)处于同一平面内，且无间隔重叠，其中所述反射曲面镜阵列(21)采样合成与之具有耦合效应的所述微图文阵列(22)后，形成动感效果。
  2. 根据权利要求1所述的光学防伪元件，其特征在于，
    所述反射曲面镜阵列(21)为由多个曲面单元构成的周期性阵列、局部周期性阵列、非周期性阵列和随机性阵列，且所述微图文阵列(22)为与所述反射曲面镜阵列(21)相匹配的具有耦合效应的周期性排列、非周期性排列、或随机性排列；或者
    所述反射曲面镜阵列(21)为由多个曲面单元构成的周期性阵列、局部周期性阵列、非周期性阵列，且所述微图文阵列(22)为与所述反射曲面镜阵列(21)相匹配的具有耦合效应的周期性排列、非周期性排列、或随机性排列；或者
    所述反射曲面镜阵列(21)为由多个曲面单元构成的周期性阵列、局部周期性阵列、随机性阵列，且所述微图文阵列(22)为与所述反射曲面镜阵列(21)相匹配的具有耦合效应的周期性排列、非周期性排列、或随机性排列。
  3. 根据权利要求1所述的光学防伪元件，其特征在于，
    所述反射曲面镜阵列(21)内的反射曲面镜包含凹面镜和凸面镜；或者
    所述反射曲面镜阵列(21)内的反射曲面镜包含凹面镜；或者
    所述反射曲面镜阵列(21)内的反射曲面镜包含凸面镜。
  4. 根据权利要求1所述的光学防伪元件，其特征在于，所述反射曲面镜阵列(21)内的反射曲面镜的基座为以下中的一者或任意组合：圆形、椭圆形、多边形，或沿面内某方向无限延伸。
  5. 根据权利要求1所述的光学防伪元件，其特征在于，所述反射曲面镜阵列(21)内的反射曲面镜的横截面为以下中的一者或任意组合：圆形、椭圆形、多边形、锯齿形、抛物线形和正弦形。
  6. 根据权利要求1所述的光学防伪元件，其特征在于，所述反射曲面镜阵列(21)为一维的或二维的。
  7. 根据权利要求1所述的光学防伪元件，其特征在于，所述微图文阵列(22)内的微图文单元为凹槽、平面或者凸起。
  8. 根据权利要求7所述的光学防伪元件，其特征在于，所述凹槽内或所述凸起上分布有微结构，使得微图文区域与反射曲面镜区域产生光线反射的强弱对比。
  9. 根据权利要求8所述的光学防伪元件，其特征在于，所述微结构为以下任意一种：一维亚微米结构、二维亚微米结构、结构色(42)。
  10. 根据权利要求7所述的光学防伪元件，其特征在于，当所述微图文单元为凹槽、凸起时，其横截面可以为以下任意一种：矩形、锯齿形、三角形、正弦波形。
  11. 根据权利要求7所述的光学防伪元件，其特征在于，该光学防伪元件还包括分别位于所述微图文阵列(22)与所述反射曲面镜阵列(21)上的第一颜色功能层和第二颜色功能层。
  12. 根据权利要求11所述的光学防伪元件，其特征在于，
    在所述微图文阵列(22)内的微图文单元为凹槽或者凸起的情况下，所述第一颜色功能层和第二颜色功能层的颜色是相同的或不同的；或
    在所述微图文阵列(22)内的微图文单元为平面的情况下，所述第一颜色功能层和第二颜色功能层的颜色是不同的。
  13. 根据权利要求11所述的光学防伪元件，其特征在于，
    所述第一颜色功能层和第二颜色功能层具有衍射光变特征、干涉光变特征、微纳结构特征、印刷特征、部分金属化特征、荧光特征和用于机读的磁、光、电、放射性特征；或者
    所述第一颜色功能层和第二颜色功能层具有衍射光变特征、干涉光变特征、微纳结构特征、印刷特征、部分金属化特征、荧光特征；或者
    所述第一颜色功能层和第二颜色功能层具有衍射光变特征、干涉光变特征、微纳结构特征、印刷特征、部分金属化特征、用于机读的磁、光、电、放射性特征。
  14. 根据权利要求1所述的光学防伪元件，其特征在于，该光学防伪元件还包括：
    反射层(23)，位于所述微图文阵列(22)和所述反射曲面镜阵列(21)上。
  15. 根据权利要求14所述的光学防伪元件，其特征在于，所述反射层 (23)为以下中的一者或任意组合：单层金属镀层、多层金属镀层、由吸收层、低折射率介质层和反射层(23)形成的镀层、高折射率介质层镀层、由第一高折射率介质层、低折射率介质层和第二高折射率介质层依次堆叠形成的多介质层镀层、以及由吸收层、高折射率介质层和反射层(23)依次堆叠形成的镀层。
  16. 根据权利要求1所述的防伪元件，其特征在于，所述反射曲面镜阵列(21)的周期为5微米至200微米。
  17. 根据权利要求1所述的防伪元件，其特征在于，所述微图文阵列(22)内的微图文单元的线条宽度为0.2微米至100微米。
  18. 根据权利要求1所述的光学防伪元件，其特征在于，所述基材(1)为由以下材料中的一者或多者构成的对可见光透明的有色或无色薄膜：聚对苯二甲酸二醇酯、聚氯乙烯、聚乙烯、聚碳酸酯、聚丙烯、金属、玻璃以及纸张。
  19. 一种光学防伪产品，其特征在于，包括根据权利要求1至18中任意一项权利要求所述的光学防伪元件。
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