WO2022091643A1 - チップ抵抗器及びその製造方法 - Google Patents

チップ抵抗器及びその製造方法 Download PDF

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Publication number
WO2022091643A1
WO2022091643A1 PCT/JP2021/034732 JP2021034732W WO2022091643A1 WO 2022091643 A1 WO2022091643 A1 WO 2022091643A1 JP 2021034732 W JP2021034732 W JP 2021034732W WO 2022091643 A1 WO2022091643 A1 WO 2022091643A1
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WIPO (PCT)
Prior art keywords
layer
resistor
conductive base
base layer
electrode
Prior art date
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Ceased
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PCT/JP2021/034732
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English (en)
French (fr)
Japanese (ja)
Inventor
幸作 田中
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Rohm Co Ltd
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Rohm Co Ltd
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Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to DE112021005223.3T priority Critical patent/DE112021005223T5/de
Priority to CN202180074236.8A priority patent/CN116508118A/zh
Priority to JP2022558918A priority patent/JP7779850B2/ja
Priority to US18/245,485 priority patent/US12525377B2/en
Publication of WO2022091643A1 publication Critical patent/WO2022091643A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C1/00—Details
    • H01C1/14—Terminals or tapping points specially adapted for resistors; Arrangements of terminals or tapping points on resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C1/00—Details
    • H01C1/14—Terminals or tapping points specially adapted for resistors; Arrangements of terminals or tapping points on resistors
    • H01C1/142—Terminals or tapping points specially adapted for resistors; Arrangements of terminals or tapping points on resistors the terminals or tapping points being coated on the resistive element
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C1/00—Details
    • H01C1/12—Arrangements of current collectors
    • H01C1/125—Arrangements of current collectors of fluid contacts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C1/00—Details
    • H01C1/14—Terminals or tapping points specially adapted for resistors; Arrangements of terminals or tapping points on resistors
    • H01C1/148—Terminals or tapping points specially adapted for resistors; Arrangements of terminals or tapping points on resistors the terminals embracing or surrounding the resistive element
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/28—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals
    • H01C17/288—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals by thin film techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/003—Thick film resistors

Definitions

  • This disclosure relates to a chip resistor and a method for manufacturing the chip resistor.
  • Patent Document 1 discloses a shunt resistor including a resistor, a first electrode, and a second electrode.
  • the first electrode covers one end of the resistor.
  • the second electrode covers the other end of the resistor on the opposite side of the resistor. The first electrode and the second electrode are separated from each other.
  • the resistance value of the shunt resistor described in Patent Document 1 is determined by the electrical resistivity of the resistor, the cross-sectional area of the resistor, and the distance between the first electrode and the second electrode.
  • the resistance value of the resistor changes from the design resistance value.
  • the chip resistor of the present disclosure includes a resistor, a first conductive base layer, a second conductive base layer, a first electrode, and a second electrode.
  • the resistor has a first main surface, a second main surface opposite to the first main surface, a first side surface connected to the first main surface and the second main surface, and the first side surface. Includes a second side surface on the opposite side. The second side surface is connected to the first main surface and the second main surface.
  • the first conductive base layer is provided on the first main surface of the resistor.
  • the second conductive base layer is provided on the first main surface of the resistor and is separated from the first conductive base layer.
  • the first electrode is provided on the first side surface side of the resistor and is separated from the second conductive base layer.
  • the second electrode is provided on the second side surface side of the resistor and is separated from the first conductive base layer and the first electrode.
  • the first electrode includes a first electrode layer provided on the first main surface of the resistor and on the first conductive base layer.
  • the second electrode includes a second electrode layer provided on the first main surface of the resistor and on the second conductive base layer.
  • the first electrical resistivity of the first conductive base layer is larger than the second electrical resistivity of the first electrode layer and is larger than the third electrical resistivity of the resistor.
  • the fourth electrical resistivity of the second conductive base layer is larger than the fifth electrical resistivity of the second electrode layer and is larger than the third electrical resistivity of the resistor.
  • the method for manufacturing a chip resistor of the present disclosure is to form a first conductive base layer and a second conductive base layer separated from the first conductive base layer on the first main surface of the strip resistor.
  • the first conductive film is formed on the first conductive base layer, the second conductive base layer, and the portion of the first main surface exposed from the first conductive base layer and the second conductive base layer.
  • the first conductive film has a first electrode layer proximal to the first side surface and a first electrode layer proximal to the second side surface and separated from the first electrode layer. It is divided into two electrode layers.
  • the first electrical resistivity of the first conductive base layer is larger than the second electrical resistivity of the first electrode layer and is larger than the third electrical resistivity of the resistor.
  • the fourth electrical resistivity of the second conductive base layer is larger than the fifth electrical resistivity of the second electrode layer and is larger than the third electrical resistivity of the resistor.
  • the heat dissipation of the chip resistor can be improved independently of the resistance value of the chip resistor. According to the method for manufacturing a chip resistor of the present disclosure, it is possible to obtain a chip resistor having improved heat dissipation independently of the resistance value.
  • FIG. FIG. 5 is a schematic cross-sectional view taken along the cross-sectional line II-II shown in FIG. 1 of the chip resistor of the first embodiment. It is schematic cross-sectional view of the chip resistor of Embodiment 1 mounted on a circuit board. It is a schematic plan view which shows one step of the manufacturing method of the chip resistor of Embodiment 1 to Embodiment 4. FIG. It is a schematic bottom view which shows the next process of the process shown in FIG. 4 in the manufacturing method of the chip resistor of Embodiment 1 to Embodiment 3.
  • FIG. 28 is a schematic plan view showing the next step of the process shown in FIG.
  • FIG. 4 in the method for manufacturing the chip resistor according to the first to third embodiments, and FIG. 28 in the method for manufacturing the chip resistor according to the fourth embodiment.
  • FIG. 8 is a schematic bottom view showing the next step of the steps shown in FIGS. 8 and 9 in the method for manufacturing a chip resistor according to the first embodiment, and FIGS. 8 and 18 are shown in the method for manufacturing a chip resistor according to the second embodiment. It is a schematic bottom view which shows the next process of the process shown in FIG.
  • FIG. 9 is a schematic plan view showing the next step of the steps shown in FIGS. 8 and 9 in the method for manufacturing a chip resistor according to the first embodiment, and FIGS. 9 and 30 are shown in the method for manufacturing a chip resistor according to the fourth embodiment.
  • It is a schematic bottom view which shows the next process of the process shown in.
  • It is a schematic bottom view which shows the next process of the process shown in FIGS.
  • It is a schematic bottom view which shows the next process of the process shown in FIGS.
  • FIG. 11 is a schematic plan view showing the next step of the steps shown in FIGS.
  • FIGS. 11 and 31 are shown in the method for manufacturing a chip resistor according to the fourth embodiment.
  • It is a schematic bottom view which shows the next process of the process shown in.
  • It is a schematic plan view of the chip resistor of Embodiment 2.
  • FIG. 3 is a schematic cross-sectional view taken along the cross-sectional line XV-XV shown in FIG. 14 of the chip resistor of the second embodiment.
  • FIG. 5 is a schematic plan view showing the next step of the steps shown in FIGS. 5 and 6 in the method for manufacturing a chip resistor according to the second embodiment.
  • FIG. 5 is a schematic plan view showing the next step of the steps shown in FIGS.
  • FIG. 7 and 16 in the method for manufacturing a chip resistor according to the second embodiment.
  • 8 is a schematic plan view showing the next step of the steps shown in FIGS. 8 and 18 in the method for manufacturing a chip resistor according to the second embodiment, and FIGS. 8 and 25 are shown in the method for manufacturing a chip resistor according to the third embodiment.
  • FIG. 5 is a schematic cross-sectional view taken along the cross-sectional line XXII-XXII shown in FIG. 21 of the chip resistor of the third embodiment.
  • FIG. 5 is a schematic plan view showing the next step of the steps shown in FIGS. 5 and 6 in the method for manufacturing a chip resistor according to the third embodiment.
  • FIG. 3 is a schematic plan view showing the next step of the steps shown in FIGS. 7 and 23 in the method for manufacturing a chip resistor according to the third embodiment.
  • FIG. 3 is a schematic plan view showing the next step of the step shown in FIG. 24 in the method for manufacturing a chip resistor according to the third embodiment.
  • FIG. 6 is a schematic cross-sectional view taken along the cross-sectional line XXVII-XXVII shown in FIG. 26 of the chip resistor of the fourth embodiment. It is a schematic plan view which shows the next process of the process shown in FIG. 4 in the manufacturing method of the chip resistor of Embodiment 4. FIG. It is a schematic bottom view which shows the next process of the process shown in FIG. 28 in the manufacturing method of the chip resistor of Embodiment 4.
  • FIG. 6 is a schematic bottom view showing the next step of the steps shown in FIGS. 6 and 29 in the method for manufacturing a chip resistor according to the fourth embodiment.
  • FIG. 9 is a schematic bottom view showing the next step of the steps shown in FIGS. 9 and 30 in the method for manufacturing a chip resistor according to the fourth embodiment.
  • 11 is a schematic bottom view showing the next step of the steps shown in FIGS. 11 and 31 in the method for manufacturing a chip resistor according to the fourth embodiment.
  • the chip resistor 1 of the first embodiment will be described with reference to FIGS. 1 and 2.
  • the chip resistor 1 is, for example, a chip resistor suitable for current detection.
  • the chip resistor 1 is, for example, a shunt resistor.
  • the chip resistor 1 includes a resistor 10, a first conductive base layer 17, a second conductive base layer 18, a first electrode 20, and a second electrode 25.
  • the chip resistor 1 may further include a first insulating layer 15, a second insulating layer 16, and an insulating coating film 30.
  • the resistor 10 is made of an electric resistance material such as a Cu—Mn alloy, a Cu—Ni alloy or a Ni—Cr alloy.
  • the resistor 10 includes a first main surface 11, a second main surface 12 on the opposite side of the first main surface 11, a first side surface 13a, and a second side surface 13b on the opposite side of the first side surface 13a.
  • a third side surface 14a and a fourth side surface 14b opposite to the third side surface 14a are included.
  • the first main surface 11 and the second main surface 12 extend along a first direction (x direction) and a second direction (y direction) perpendicular to the first direction (x direction), respectively. There is.
  • the first direction (x direction) is, for example, the longitudinal direction of the resistor 10.
  • the second direction (y direction) is, for example, the lateral direction of the resistor 10.
  • the first main surface 11 and the second main surface 12 are separated from each other in a third direction (z direction) perpendicular to the first direction (x direction) and the second direction (y direction).
  • the third direction (z direction) is the thickness direction of the resistor 10.
  • the first side surface 13a is connected to the first main surface 11 and the second main surface 12.
  • the second side surface 13b is connected to the first main surface 11 and the second main surface 12.
  • the first side surface 13a and the second side surface 13b are separated from each other in the first direction (x direction).
  • the third side surface 14a is connected to the first main surface 11 and the second main surface 12, and is also connected to the first side surface 13a and the second side surface 13b.
  • the fourth side surface 14b is connected to the first main surface 11 and the second main surface 12, and is also connected to the first side surface 13a and the second side surface 13b.
  • the third side surface 14a and the fourth side surface 14b are separated from each other in the second direction (y direction).
  • the resistor 10 includes a central portion 10 m exposed from the first electrode 20 and the second electrode 25 in a plan view of the first main surface 11.
  • the central portion 10 m is arranged between the first electrode 20 and the second electrode 25 in the first direction (x direction).
  • the first insulating layer 15 is provided on the first main surface 11 of the resistor 10.
  • the first insulating layer 15 is arranged between the first electrode 20 and the second electrode 25, and separates the first electrode 20 and the second electrode 25 from each other.
  • the first insulating layer 15 is arranged between the first electrode layer 21 and the second electrode layer 26, and separates the first electrode layer 21 and the second electrode layer 26 from each other.
  • the first insulating layer 15 is arranged between the first conductive base layer 17 and the second conductive base layer 18, and separates the first conductive base layer 17 and the second conductive base layer 18 from each other.
  • the first insulating layer 15 is formed on the central portion 10 m of the resistor 10. The first insulating layer 15 protects the resistor 10.
  • the first insulating layer 15 includes a first end 15a proximal to the first side surface 13a of the resistor 10 and a second end 15b proximal to the second side surface 13b of the resistor 10.
  • the first insulating layer 15 is made of an insulating resin such as an epoxy resin.
  • the second insulating layer 16 is provided on the second main surface 12 of the resistor 10.
  • the second insulating layer 16 is arranged between the first electrode 20 and the second electrode 25, and separates the first electrode 20 and the second electrode 25 from each other.
  • the second insulating layer 16 is arranged between the third electrode layer 22 and the fourth electrode layer 27, and separates the third electrode layer 22 and the fourth electrode layer 27 from each other.
  • the second insulating layer 16 is formed on the central portion 10 m of the resistor 10.
  • the second insulating layer 16 protects the resistor 10.
  • the second insulating layer 16 includes a third end 16a proximal to the second side surface 13b of the resistor 10 and a fourth end 16b proximal to the first side surface 13a of the resistor 10.
  • the third end 16a of the second insulating layer 16 may come into contact with the fourth electrode layer 27.
  • the fourth end 16b of the second insulating layer 16 may come into contact with the third electrode layer 22.
  • the second insulating layer 16 is made of an insulating resin such as an epoxy resin.
  • the insulating coating film 30 has a third side surface 14a of the resistor 10, a fourth side surface 14b of the resistor 10, and a first band-shaped region proximal to the third side surface 14a of the first main surface 11 of the resistor 10.
  • the longitudinal direction of the first band-shaped region, the second band-shaped region, the third band-shaped region, and the fourth band-shaped region is the first direction (x direction).
  • the insulating coating film 30 protects the resistor 10.
  • the insulating coating film 30 is made of an insulating resin such as an epoxy resin.
  • the first conductive base layer 17 is provided on the first main surface 11 of the resistor 10.
  • the first conductive base layer 17 is formed on a region of the first main surface 11 of the resistor 10 proximal to the first side surface 13a of the resistor 10 with respect to the central portion 10 m of the resistor 10.
  • the first conductive base layer 17 includes an end 17a proximal to the first side surface 13a of the resistor 10 and an end 17b proximal to the central portion 10 m of the resistor 10.
  • the first conductive base layer 17 is also provided on the first insulating layer 15.
  • the first end 15a of the first insulating layer 15 is covered with the first conductive base layer 17.
  • the end 17b of the first conductive base layer 17 is exposed from the first insulating layer 15.
  • the ends 17a and 17b of the first conductive base layer 17 are covered with the first electrode layer 21.
  • the first conductive base layer 17 is formed of, for example, a conductive resin containing a binder resin (for example, epoxy resin, phenol resin or polyimide resin) and conductive particles (for example, silver particles) dispersed in the binder resin. ing.
  • the first electrical resistivity of the first conductive base layer 17 is larger than the second electrical resistivity of the first electrode layer 21, and is larger than the third electrical resistivity of the resistor 10. Therefore, when a current flows through the chip resistor 1, almost no current flows through the first conductive base layer 17. The first conductive base layer 17 does not substantially change the resistance value of the chip resistor 1.
  • the first electrical resistivity of the first conductive base layer 17 is, for example, 10 times or more the second electrical resistivity of the first electrode layer 21.
  • the first electrical resistivity of the first conductive base layer 17 may be 20 times or more, 50 times or more, or 100 times or more the second electrical resistivity of the first electrode layer 21. May be good.
  • the first electrical resistivity of the first conductive base layer 17 is, for example, five times or more the third electrical resistivity of the resistor 10.
  • the first electrical resistivity of the first conductive base layer 17 may be 10 times or more, 25 times or more, or 50 times or more the third electrical resistivity of the resistor 10. ..
  • the second conductive base layer 18 is provided on the first main surface 11 of the resistor 10.
  • the second conductive base layer 18 is formed on a region of the first main surface 11 of the resistor 10 proximal to the second side surface 13b of the resistor 10 with respect to the central portion 10 m of the resistor 10.
  • the second conductive base layer 18 includes an end 18a proximal to the second side surface 13b of the resistor 10 and an end 18b proximal to the central portion 10m of the resistor 10.
  • the second conductive base layer 18 is also provided on the first insulating layer 15.
  • the second end 15b of the first insulating layer 15 is covered with the second conductive base layer 18.
  • the end 18b of the second conductive base layer 18 is exposed from the first insulating layer 15.
  • the ends 18a and 18b of the second conductive base layer 18 are covered with the second electrode layer 26.
  • the second conductive base layer 18 is separated from the first conductive base layer 17 in the first direction (x direction).
  • the second conductive base layer 18 is formed of, for example, a conductive resin containing a binder resin (for example, epoxy resin, phenol resin or polyimide resin) and conductive particles (for example, silver particles) dispersed in the binder resin. ing.
  • the fourth electrical resistivity of the second conductive base layer 18 is larger than the fifth electrical resistivity of the second electrode layer 26, and is larger than the third electrical resistivity of the resistor 10. Therefore, when a current flows through the chip resistor 1, almost no current flows through the second conductive base layer 18. The second conductive base layer 18 does not substantially change the resistance value of the chip resistor 1.
  • the fourth electrical resistivity of the second conductive base layer 18 is, for example, 10 times or more the fifth electrical resistivity of the second electrode layer 26.
  • the fourth electrical resistivity of the second conductive base layer 18 may be 20 times or more, 50 times or more, or 100 times or more the fifth electrical resistivity of the second electrode layer 26. May be good.
  • the fourth electrical resistivity of the second conductive base layer 18 is, for example, five times or more the third electrical resistivity of the resistor 10.
  • the fourth electrical resistivity of the second conductive base layer 18 may be 10 times or more, 25 times or more, or 50 times or more the third electrical resistivity of the resistor 10. ..
  • the first electrode 20 is provided on the first side surface 13a side of the resistor 10.
  • the first electrode 20 is proximal to the first side surface 13a of the resistor 10 with respect to the central portion 10 m of the resistor 10 in the first direction (x direction).
  • the first electrode 20 extends along the first side surface 13a of the resistor 10.
  • the first electrode 20 is separated from the second conductive base layer 18 and the second electrode 25 in the first direction (x direction).
  • the first electrode 20 includes a first electrode layer 21, a third electrode layer 22, and a first metal thin film layer 23.
  • the first electrode layer 21 is provided on the first main surface 11 of the resistor 10 and on the first conductive base layer 17.
  • the first electrode layer 21 is proximal to the first side surface 13a of the resistor 10 and extends along the first side surface 13a of the resistor 10.
  • the first portion 21m of the first electrode layer 21 that is in contact with the resistor 10 and is most proximal to the central portion 10 m of the resistor 10 is the third.
  • the thickness of the first electrode layer 21 on the first conductive base layer 17 is very small due to the thickness of the first electrode layer 21 on the first main surface 11 of the resistor 10.
  • the thickness of the first electrode layer 21 on the first conductive base layer 17 is, for example, 0.1 times or less the thickness of the first electrode layer 21 on the first main surface 11 of the resistor 10.
  • the second electrical resistivity of the first electrode layer 21 is smaller than the third electrical resistivity of the resistor 10.
  • the first electrode layer 21 is made of a metal such as copper, for example.
  • the first electrode layer 21 is, for example, a plating layer.
  • the third electrode layer 22 is provided on the second main surface 12 of the resistor 10.
  • the ninth electrical resistivity of the third electrode layer 22 is smaller than the third electrical resistivity of the resistor 10.
  • the third electrode layer 22 is made of a metal such as copper, for example.
  • the third electrode layer 22 is, for example, a plating layer.
  • the first metal thin film layer 23 electrically connects the first electrode layer 21 and the third electrode layer 22 to each other.
  • the first metal thin film layer 23 covers the first electrode layer 21, the third electrode layer 22, and the first side surface 13a of the resistor 10.
  • the first metal thin film layer 23 is formed of a conductive material containing tin, such as a solder layer.
  • the first metal thin film layer 23 is, for example, a plating layer.
  • the second electrode 25 is provided on the second side surface 13b side of the resistor 10.
  • the second electrode 25 is proximal to the second side surface 13b of the resistor 10 with respect to the central portion 10 m of the resistor 10 in the first direction (x direction).
  • the second electrode 25 extends along the second side surface 13b of the resistor 10.
  • the second electrode 25 is separated from the first conductive base layer 17 and the first electrode 20 in the first direction (x direction).
  • the second electrode 25 includes a second electrode layer 26, a fourth electrode layer 27, and a second metal thin film layer 28.
  • the second electrode layer 26 is provided on the first main surface 11 of the resistor 10 and on the second conductive base layer 18.
  • the second electrode layer 26 is proximal to the second side surface 13b of the resistor 10 and extends along the second side surface 13b of the resistor 10.
  • the second portion 26m of the second electrode layer 26 that is in contact with the resistor 10 and is most proximal to the central portion 10 m of the resistor 10 is the fourth.
  • the thickness of the second electrode layer 26 on the second conductive base layer 18 is very small due to the thickness of the second electrode layer 26 on the first main surface 11 of the resistor 10.
  • the thickness of the second electrode layer 26 on the second conductive base layer 18 is, for example, 0.1 times or less the thickness of the second electrode layer 26 on the first main surface 11 of the resistor 10.
  • the fifth electrical resistivity of the second electrode layer 26 is smaller than the third electrical resistivity of the resistor 10.
  • the second electrode layer 26 is made of a metal such as copper.
  • the second electrode layer 26 is, for example, a plating layer.
  • the fourth electrode layer 27 is provided on the second main surface 12 of the resistor 10.
  • the fourth electrode layer 27 is separated from the third electrode layer 22 in the first direction (x direction).
  • the seventh electrical resistivity of the fourth electrode layer 27 is smaller than the third electrical resistivity of the resistor 10.
  • the fourth electrode layer 27 is made of a metal such as copper, for example.
  • the fourth electrode layer 27 is, for example, a plating layer.
  • the second metal thin film layer 28 electrically connects the second electrode layer 26 and the fourth electrode layer 27 to each other.
  • the second metal thin film layer 28 covers the second electrode layer 26, the fourth electrode layer 27, and the second side surface 13b of the resistor 10.
  • the second metal thin film layer 28 is formed of a conductive material containing tin, such as a solder layer.
  • the second metal thin film layer 28 is, for example, a plating layer.
  • the first portion 21m of the first electrode layer 21, which is in contact with the resistor 10 and is most proximal to the central portion 10m of the resistor 10, is in contact with the resistor 10 of the third electrode layer 22 and is of the resistor 10. It is more proximal to the central portion 10m of the resistor 10 than the third portion 22m most proximal to the central portion 10m, or is flush with the third portion 22m of the third electrode layer 22.
  • the second portion 26m of the second electrode layer 26, which is in contact with the resistor 10 and is most proximal to the central portion 10 m of the resistor 10, is in contact with the resistor 10 of the fourth electrode layer 27 and is of the resistor 10.
  • the resistance value of the chip resistor 1 depends on the distance L (see FIG. 2) between the first portion 21 m of the first electrode layer 21 and the second portion 26 m of the second electrode layer 26.
  • the first conductive base layer 17 and the second conductive base layer 18 do not substantially change the resistance value of the chip resistor 1. That is, even if the size of the first conductive base layer 17 and the size of the second conductive base layer 18 change, the resistance value of the chip resistor 1 does not substantially change unless the distance L changes.
  • the resistance value of the chip resistor 1 depends on the distance L, but does not depend on the size of the first electrode 20 (first electrode layer 21) or the second electrode 25 (second electrode layer 26). Independent of the resistance value of the chip resistor 1, the heat dissipation of the chip resistor 1 can be improved.
  • the chip resistor 1 is mounted on the circuit board 50, for example.
  • the circuit board 50 includes an insulating board 51 and conductive wirings 52 and 53.
  • the first electrode 20 of the chip resistor 1 is joined to the conductive wiring 52 of the circuit board 50 by using a joining member 54 such as solder.
  • the second electrode 25 of the chip resistor 1 is joined to the conductive wiring 53 of the circuit board 50 by using a joining member 55 such as solder.
  • the method for manufacturing the chip resistor 1 of the present embodiment includes preparing a resistor frame 5.
  • the resistor frame 5 is made of an electric resistance material such as a Cu—Mn alloy, a Cu—Ni alloy or a Ni—Cr alloy.
  • the resistor frame 5 includes a plurality of band-shaped resistors 10a.
  • the longitudinal direction of the band-shaped resistor 10a is the first direction (x direction).
  • the plurality of strip-shaped resistors 10a have a first main surface 11, a second main surface 12 on the opposite side of the first main surface 11, a third side surface 14a, and a third surface opposite the third side surface 14a, respectively. Includes 4 side surfaces 14b.
  • the first insulating layer 15 is formed on the first main surface 11 of the strip resistor 10a, and the strip resistor is formed. It includes forming a second insulating layer 16 on the second main surface 12 of 10a.
  • the first insulating layer 15 is an end 15a which is an end of the first insulating layer 15 in the first direction (x direction) and an end of the first insulating layer 15 in the first direction (x direction). Includes the second end 15b on the opposite side of the first end 15a.
  • the second insulating layer 16 is a third end 16a which is an end of the second insulating layer 16 in the first direction (x direction) and an end of the second insulating layer 16 in the first direction (x direction). Includes the fourth end 16b on the opposite side of the third end 16a.
  • the first insulating layer 15 and the second insulating layer 16 are formed of, for example, an insulating resin such as an epoxy resin.
  • the first insulating layer 15 and the second insulating layer 16 are provided by printing such as screen printing.
  • the first conductive base layer 17 and the second conductive base layer 18 are formed on the first main surface 11 of the strip-shaped resistor 10a. Prepare to form.
  • the first conductive base layer 17 and the second conductive base layer 18 may be further formed on the first insulating layer 15.
  • the first conductive base layer 17 may cover the first end 15a of the first insulating layer 15.
  • the second conductive base layer 18 may cover the second end 15b of the first insulating layer 15.
  • the first conductive base layer 17 and the second conductive base layer 18 are separated from each other in the first direction (x direction).
  • the first conductive base layer 17 and the second conductive base layer 18 are, for example, a binder resin (for example, epoxy resin, phenol resin or polyimide resin) and conductive particles (for example, silver particles) dispersed in the binder resin. It is made of a conductive resin containing.
  • the first conductive base layer 17 and the second conductive base layer 18 are provided by printing such as screen printing.
  • the method of manufacturing the chip resistor 1 of the present embodiment includes forming an insulating coating film 30.
  • the insulating coating film 30 includes a band-shaped resistor 10a with a third side surface 14a and a fourth side surface 14b, a first band-shaped region proximal to the third side surface 14a of the first main surface 11 of the band-shaped resistor 10a, and a band-shaped resistor.
  • the second main surface 12 of the band-shaped resistor 10a covers the fourth band-shaped region proximal to the fourth side surface 14b.
  • the insulating coating film 30 is made of an insulating resin such as an epoxy resin.
  • the insulating coating film 30 is provided, for example, by dip coating or printing.
  • the method for manufacturing the chip resistor 1 includes forming the first conductive film 40 and the second conductive film 41.
  • the first conductive film 40 is formed on the first conductive base layer 17, the second conductive base layer 18, and the first insulating layer 15, the insulating coating film 30, and the first of the first main surfaces 11 of the resistor 10. It is formed on a portion exposed from the conductive base layer 17 and the second conductive base layer 18.
  • the second conductive film 41 is formed on the portion of the second main surface 12 of the resistor 10 that is exposed from the second insulating layer 16 and the insulating coating film 30.
  • the first conductive film 40 and the second conductive film 41 are made of a metal such as copper, for example.
  • the first conductive film 40 and the second conductive film 41 are provided, for example, by plating.
  • the first conductive film 40 and the second conductive film 41 are, for example, metal-plated films. While the resistor 10, the first conductive base layer 17 and the second conductive base layer 18 have conductivity, the first insulating layer 15, the second insulating layer 16 and the insulating coating film 30 are electrically insulated. Has sex. Therefore, the first conductive film 40 includes the first insulating layer 15 and the insulating coating film 30 on the first conductive base layer 17, the second conductive base layer 18, and the first main surface 11 of the resistor 10. It is selectively formed on the portion exposed from the first conductive base layer 17 and the second conductive base layer 18.
  • the second conductive film 41 is selectively formed on the portion of the second main surface 12 of the resistor 10 that is exposed from the second insulating layer 16 and the insulating coating film 30.
  • the first electrical resistivity of the first conductive base layer 17 is smaller than the third electrical resistivity of the resistor 10.
  • the fourth electrical resistivity of the second conductive base layer 18 is smaller than the third electrical resistivity of the resistor 10. Therefore, when the first conductive film 40 is formed by, for example, plating, the thickness of the first conductive film 40 on the first conductive base layer 17 is the thickness of the first conductive film 40 on the first main surface 11 of the resistor 10. As a result, the thickness of the first conductive film 40 on the second conductive base layer 18 becomes very small due to the thickness of the first conductive film 40 on the first main surface 11 of the resistor 10. ..
  • the band-shaped resistor 10a is divided to form a resistor 10 including a first side surface 13a and a second side surface 13b. Be prepared to do.
  • the first conductive film 40 is divided into a first electrode layer 21 proximal to the first side surface 13a and a second electrode layer 26 proximal to the second side surface 13b. ..
  • the second electrode layer 26 is separated from the first electrode layer 21 in the first direction (x direction).
  • the second conductive film 41 is divided into a third electrode layer 22 proximal to the first side surface 13a and a fourth electrode layer 27 proximal to the second side surface 13b. ..
  • the fourth electrode layer 27 is separated from the third electrode layer 22 in the first direction (x direction).
  • the method for manufacturing the chip resistor 1 of the present embodiment includes forming the first metal thin film layer 23 and the second metal thin film layer 28.
  • the first metal thin film layer 23 electrically connects the first electrode layer 21 and the third electrode layer 22 to each other.
  • the first metal thin film layer 23 covers the first electrode layer 21, the third electrode layer 22, and the first side surface 13a of the resistor 10.
  • the second metal thin film layer 28 electrically connects the second electrode layer 26 and the fourth electrode layer 27 to each other.
  • the second metal thin film layer 28 covers the second electrode layer 26, the fourth electrode layer 27, and the second side surface 13b of the resistor 10.
  • the first metal thin film layer 23 and the second metal thin film layer 28 are formed of a conductive material containing tin, such as a solder layer.
  • the first metal thin film layer 23 and the second metal thin film layer 28 are provided, for example, by plating.
  • the first metal thin film layer 23 and the second metal thin film layer 28 are, for example, metal-plated films.
  • the first electrode layer 21, the second electrode layer 26, the resistor 10, the third electrode layer 22, and the fourth electrode layer 27 have conductivity, whereas the first insulating layer 15 and the second insulating layer are conductive. 16 and the insulating coating film 30 have electrical insulating properties. Therefore, the first metal thin film layer 23 is selectively formed on the first electrode layer 21, the second electrode layer 26, and the first side surface 13a of the resistor 10.
  • the second metal thin film layer 28 is selectively formed on the third electrode layer 22, the fourth electrode layer 27, and the second side surface 13b of the resistor 10. In this way, the chip resistor 1 shown in FIGS. 1 and 2 is obtained.
  • the chip resistor 1 of the present embodiment includes a resistor 10, a first conductive base layer 17, a second conductive base layer 18, a first electrode 20, and a second electrode 25.
  • the resistor 10 has a first main surface 11, a second main surface 12 opposite to the first main surface 11, and a first side surface 13a connected to the first main surface 11 and the second main surface 12. And a second side surface 13b opposite to the first side surface 13a.
  • the second side surface 13b is connected to the first main surface 11 and the second main surface 12.
  • the first conductive base layer 17 is provided on the first main surface 11 of the resistor 10.
  • the second conductive base layer 18 is provided on the first main surface 11 of the resistor 10 and is separated from the first conductive base layer 17.
  • the first electrode 20 is provided on the first side surface 13a side of the resistor 10, and is separated from the second conductive base layer 18.
  • the second electrode 25 is provided on the second side surface 13b side of the resistor 10, and is separated from the first conductive base layer 17 and the first electrode 20.
  • the first electrode 20 includes a first electrode layer 21 provided on the first main surface 11 of the resistor 10 and on the first conductive base layer 17.
  • the second electrode 25 includes a second electrode layer 26 provided on the first main surface 11 of the resistor 10 and on the second conductive base layer 18.
  • the first electrical resistivity of the first conductive base layer 17 is larger than the second electrical resistivity of the first electrode layer 21, and is larger than the third electrical resistivity of the resistor 10.
  • the fourth electrical resistivity of the second conductive base layer 18 is larger than the fifth electrical resistivity of the second electrode layer 26, and is larger than the third electrical resistivity of the resistor 10.
  • the resistance value of the chip resistor 1 depends on the distance L (see FIG. 2), but the size of the first electrode 20 (first electrode layer 21) and the resistance value of the second electrode 25 (second electrode layer 26). It does not depend on size.
  • the first electrode layer 21 is provided not only on the first main surface 11 of the resistor 10 but also on the first conductive base layer 17.
  • the second electrode layer 26 is provided not only on the first main surface 11 of the resistor 10 but also on the second conductive base layer 18.
  • the resistance value of the chip resistor 1 depends on the distance L (see FIG. 2), but the size of the first electrode 20 (first electrode layer 21) and the second electrode 25 (second electrode layer 26). ) Does not depend on the size. Therefore, among the plurality of chip resistors 1 having various distances L and having various resistance values, the size of the first electrode 20 (first electrode layer 21) and the second electrode 25 (second electrode layer 26). ) Sizes can be standardized. The size of the conductive wiring 52 and the size of the conductive wiring 53 of the circuit board 50 (see FIG. 3) on which the chip resistor 1 is mounted can be made common. The design of the circuit board 50 on which the chip resistor 1 is mounted can be simplified.
  • the first conductive base layer 17 and the second conductive base layer 18 are conductive including a binder resin and conductive particles (for example, silver particles) dispersed in the binder resin. It is made of resin.
  • the first electrode layer 21 and the second electrode layer 26 are made of metal. Therefore, the heat dissipation of the chip resistor 1 can be improved independently of the resistance value of the chip resistor 1. The manufacturing cost of the chip resistor 1 can be reduced.
  • the chip resistor 1 of the present embodiment further includes a first insulating layer 15 provided on the first main surface 11 of the resistor 10.
  • the first insulating layer 15 is arranged between the first electrode 20 and the second electrode 25, and is arranged between the first conductive base layer 17 and the second conductive base layer 18.
  • the first insulating layer 15 protects the resistor 10. The life of the chip resistor 1 is extended.
  • the first insulating layer 15 prevents the first conductive base layer 17 and the second conductive base layer 18 from coming into contact with each other, and the first electrode layer 21 and the second electrode layer 26 from coming into contact with each other.
  • the first end 15a of the first insulating layer 15 proximal to the first side surface 13a of the resistor 10 is covered with the first conductive base layer 17.
  • the second end 15b of the first insulating layer 15 proximal to the second side surface 13b of the resistor 10 is covered with the second conductive base layer 18.
  • the heat dissipation of the chip resistor 1 can be improved independently of the resistance value of the chip resistor 1.
  • the first electrode 20 further includes a third electrode layer 22 and a first metal thin film layer 23.
  • the third electrode layer 22 is provided on the second main surface 12 of the resistor 10.
  • the first metal thin film layer 23 electrically connects the first electrode layer 21 and the third electrode layer 22 to each other.
  • the second electrode 25 further includes a fourth electrode layer 27 and a second metal thin film layer 28.
  • the fourth electrode layer 27 is provided on the second main surface 12 of the resistor 10 and is separated from the third electrode layer 22.
  • the second metal thin film layer 28 electrically connects the second electrode layer 26 and the fourth electrode layer 27 to each other.
  • the heat generated in the chip resistor 1 is generated not only from the first main surface 11 of the resistor 10 but also from the third electrode layer 22 and the third electrode layer 22. 1 It can also be dissipated to the circuit board 50 from the second main surface 12 of the resistor 10 through the metal thin film layer 23, the fourth electrode layer 27, and the second metal thin film layer 28. The heat dissipation of the chip resistor 1 can be improved.
  • the resistor 10 includes a central portion 10 m exposed from the first electrode 20 and the second electrode 25 in the plan view of the first main surface 11.
  • the first portion 21m of the first electrode layer 21, which is in contact with the resistor 10 and is most proximal to the central portion 10m of the resistor 10, is in contact with the resistor 10 of the third electrode layer 22 and is of the resistor 10. It is more proximal to the central portion 10m of the resistor 10 than the third portion 22m most proximal to the central portion 10m, or is flush with the third portion 22m of the third electrode layer 22.
  • the second portion 26m of the second electrode layer 26, which is in contact with the resistor 10 and is most proximal to the central portion 10 m of the resistor 10, is in contact with the resistor 10 of the fourth electrode layer 27 and is of the resistor 10. It is more proximal to the central portion 10m of the resistor 10 than the fourth portion 27m most proximal to the central portion 10m, or is flush with the fourth portion 27m of the fourth electrode layer 27.
  • the resistance value of the chip resistor 1 depends on the distance L between the first portion 21 m of the first electrode layer 21 and the second portion 26 m of the second electrode layer 26, but is the size of the first electrode 20 and the second. It does not depend on the size of the electrode 25. According to the chip resistor 1 of the present embodiment, the heat dissipation of the chip resistor 1 can be improved independently of the resistance value of the chip resistor 1.
  • the first metal thin film layer 23 and the second metal thin film layer 28 are formed of a conductive material containing tin. Therefore, it becomes easy to mount the chip resistor 1 on the circuit board 50 (see FIG. 3) by using solder.
  • the chip resistor 1 of the present embodiment further includes a second insulating layer 16 provided on the second main surface 12 of the resistor 10.
  • the second insulating layer 16 is arranged between the third electrode layer 22 and the fourth electrode layer 27.
  • the second insulating layer 16 protects the resistor 10. The life of the chip resistor 1 is extended. The second insulating layer 16 prevents the third electrode layer 22 and the fourth electrode layer 27 from coming into contact with each other.
  • the chip resistor 1 is a shunt resistor. Therefore, the heat dissipation of the chip resistor 1 can be improved independently of the resistance value of the chip resistor 1.
  • a chip resistor 1 suitable for current detection may be provided.
  • the first conductive base layer 17 is separated from the first conductive base layer 17 on the first main surface 11 of the strip resistor 10a, and the second conductive bottom is separated from the first conductive base layer 17.
  • the first conductive film 40 is formed on the portion exposed from the formation layer 18.
  • the method for manufacturing the chip resistor 1 of the present embodiment further comprises dividing the band-shaped resistor 10a to form the resistor 10 including the first side surface 13a and the second side surface 13b.
  • the first conductive film 40 is proximal to the first electrode layer 21 proximal to the first side surface 13a and proximal to the second side surface 13b, and is proximal to the first electrode layer 21. It is divided into a second electrode layer 26 which is separated from the second electrode layer 26.
  • the first electrical resistivity of the first conductive base layer 17 is larger than the second electrical resistivity of the first electrode layer 21, and is larger than the third electrical resistivity of the resistor 10.
  • the fourth electrical resistivity of the second conductive base layer 18 is larger than the fifth electrical resistivity of the second electrode layer 26, and is larger than the third electrical resistivity of the resistor 10.
  • the resistance value of the chip resistor 1 depends on the distance L (see FIG. 2), but does not depend on the size of the first electrode layer 21 and the size of the second electrode layer 26.
  • the first electrode layer 21 is provided not only on the first main surface 11 of the resistor 10 but also on the first conductive base layer 17.
  • the second electrode layer 26 is provided not only on the first main surface 11 of the resistor 10 but also on the second conductive base layer 18.
  • the resistance value of the chip resistor 1 depends on the distance L (see FIG. 2), but does not depend on the size of the first electrode layer 21 and the size of the second electrode layer 26. Therefore, the size of the first electrode layer 21 and the size of the second electrode layer 26 can be made common among the plurality of chip resistors 1 having various distances L and having various resistance values.
  • the size of the conductive wiring 52 and the size of the conductive wiring 53 of the circuit board 50 (see FIG. 3) on which the chip resistor 1 is mounted can be made common.
  • the design of the circuit board 50 (see FIG. 3) on which the chip resistor 1 is mounted can be simplified.
  • the first conductive base layer 17 and the second conductive base layer 18 are provided by printing.
  • the first conductive film 40 is provided by plating. Therefore, the productivity of the chip resistor 1 can be improved and the manufacturing cost of the chip resistor 1 can be reduced.
  • the chip resistor 1b of the second embodiment will be described with reference to FIGS. 14 and 15.
  • the chip resistor 1b of the present embodiment has the same configuration as the chip resistor 1 of the first embodiment, but is different in the following points.
  • the chip resistor 1b further includes a third conductive base layer 33.
  • the chip resistor 1b may further include a third insulating layer 35.
  • the third conductive base layer 33 is provided on the second main surface 12 of the resistor 10 and on the second insulating layer 16.
  • the third conductive base layer 33 is in contact with the fourth electrode layer 27 and is separated from the third electrode layer 22 in the first direction (x direction).
  • a part of the third conductive base layer 33 is exposed from the third insulating layer 35.
  • the third conductive base layer 33 includes an end 33a proximal to the first side surface 13a.
  • the end 33a of the third conductive base layer 33 is covered with the third insulating layer 35.
  • the end 33a of the third conductive base layer 33 is separated from the third electrode layer 22 in the first direction (x direction).
  • the third end 16a of the second insulating layer 16 proximal to the second side surface 13b of the resistor 10 is covered with the third conductive base layer 33.
  • the third conductive base layer 33 overlaps with the second conductive base layer 18.
  • the third conductive base layer 33 is the resistor 10 in the first direction (x direction) in which the first electrode 20 and the second electrode 25 are separated from each other. It overlaps the central part of 10m.
  • the third conductive base layer 33 may overlap with the first conductive base layer 17.
  • the fourth end 16b of the second insulating layer 16 proximal to the first side surface 13a of the resistor 10 is exposed from the third conductive base layer 33.
  • the sixth electrical resistivity of the third conductive base layer 33 is larger than the seventh electrical resistivity of the fourth electrode layer 27, and is larger than the third electrical resistivity of the resistor 10. Therefore, when a current flows through the chip resistor 1, almost no current flows through the third conductive base layer 33.
  • the third conductive base layer 33 does not substantially change the resistance value of the chip resistor 1.
  • the sixth electrical resistivity of the third conductive base layer 33 is, for example, 10 times or more the seventh electrical resistivity of the fourth electrode layer 27.
  • the sixth electrical resistivity of the third conductive base layer 33 may be 20 times or more, 50 times or more, or 100 times or more the seventh electrical resistivity of the fourth electrode layer 27. May be good.
  • the sixth electrical resistivity of the third conductive base layer 33 is, for example, five times or more the third electrical resistivity of the resistor 10.
  • the sixth electrical resistivity of the third conductive base layer 33 may be 10 times or more, 25 times or more, or 50 times or more the third electrical resistivity of the resistor 10. ..
  • the third conductive base layer 33 is formed of a conductive resin containing a binder resin (for example, epoxy resin, phenol resin or polyimide resin) and conductive particles (for example, silver particles) dispersed in the binder resin. ..
  • the fourth electrode layer 27 is further provided on the third conductive base layer 33.
  • the thickness of the fourth electrode layer 27 on the third conductive base layer 33 is very small due to the thickness of the fourth electrode layer 27 on the first main surface 11 of the resistor 10.
  • the thickness of the fourth electrode layer 27 on the third conductive base layer 33 is, for example, 0.1 times or less the thickness of the fourth electrode layer 27 on the first main surface 11 of the resistor 10.
  • the third insulating layer 35 is provided on the third conductive base layer 33 and on the second insulating layer 16.
  • the third insulating layer 35 protects the third conductive base layer 33.
  • the third insulating layer 35 is made of an insulating resin such as an epoxy resin.
  • the manufacturing method of the chip resistor 1b of the present embodiment includes the same steps as the manufacturing method of the chip resistor 1 of the first embodiment, but is mainly different in the following points.
  • the method for manufacturing the chip resistor 1c according to the present embodiment includes the steps shown in FIGS. 4 to 6.
  • the first conductive base layer 17 and the second conductive base layer 18 are placed on the first main surface 11 of the strip resistor 10a.
  • the third conductive base layer 33 is formed on the second main surface 12 and the second insulating layer 16 of the strip-shaped resistor 10a.
  • the third end 16a of the second insulating layer 16 is covered with the third conductive base layer 33.
  • the third conductive base layer 33 overlaps with the second conductive base layer 18.
  • the third conductive base layer 33 may overlap with the first conductive base layer 17.
  • the fourth end 16b of the second insulating layer 16 is exposed from the third conductive base layer 33.
  • the third conductive base layer 33 is formed of, for example, a conductive resin containing a binder resin (for example, epoxy resin, phenol resin or polyimide resin) and conductive particles (for example, silver particles) dispersed in the binder resin. ing.
  • the third conductive base layer 33 is provided by printing such as screen printing.
  • the method for manufacturing the chip resistor 1b includes forming a third insulating layer 35 on the third conductive base layer 33 and the second insulating layer 16. A part of the third conductive base layer 33 is exposed from the third insulating layer 35.
  • the third insulating layer 35 is made of an insulating resin such as an epoxy resin.
  • the third insulating layer 35 is provided by printing such as screen printing.
  • the method of manufacturing the chip resistor 1b of the present embodiment includes forming an insulating coating film 30.
  • the step of forming the insulating coating film 30 in the present embodiment is the same as the step of forming the insulating coating film 30 in the first embodiment.
  • the insulating coating film 30 further includes a fifth band-shaped region proximal to the third side surface 14a of the third insulating layer 35 and a sixth band-shaped region proximal to the fourth side surface 14b of the third insulating layer 35. Covering.
  • the method for manufacturing the chip resistor 1b according to the present embodiment is the same as the method for manufacturing the chip resistor 1 according to the first embodiment, that is, the first conductive film 40 and the second conductive film. It is provided to form with 41.
  • the second conductive film 41 is exposed on the third conductive base layer 33 and from the insulating coating film 30, the third insulating layer 35, and the third conductive base layer 33 of the second main surface 12 of the resistor 10. Formed on and on the part.
  • the sixth electrical resistivity of the third conductive base layer 33 is smaller than the third electrical resistivity of the resistor 10. Therefore, when the second conductive film 41 is formed by plating, for example, the thickness of the second conductive film 41 on the third conductive base layer 33 is the thickness of the second conductive film 41 on the first main surface 11 of the resistor 10. It becomes very small.
  • the method for manufacturing the chip resistor 1b according to the present embodiment is the same as the method for manufacturing the chip resistor 1 according to the first embodiment. It comprises forming a resistor 10 including one side surface 13a and a second side surface 13b.
  • the first conductive film 40 is divided into a first electrode layer 21 and a second electrode layer 26.
  • the second conductive film 41 is divided into a third electrode layer 22 and a fourth electrode layer 27.
  • the third conductive base layer 33 is in contact with the fourth electrode layer 27 and is separated from the third electrode layer 22.
  • the fourth electrode layer 27 is provided not only on the second main surface 12 of the resistor 10 but also on the third conductive base layer 33.
  • the first metal thin film layer 23 and the second metal thin film layer 28 are formed in the same manner as the method for manufacturing the chip resistor 1 of the first embodiment. To prepare for. In this way, the chip resistor 1b shown in FIGS. 14 and 15 is obtained.
  • the chip resistor 1b of the present embodiment and the manufacturing method thereof have the following effects in addition to the effects of the chip resistor 1 of the first embodiment and the manufacturing method thereof.
  • the chip resistor 1b of the present embodiment further includes a third conductive base layer 33 provided on the second main surface 12 and the second insulating layer 16 of the resistor 10.
  • the third conductive base layer 33 is in contact with the fourth electrode layer 27 and is separated from the third electrode layer 22.
  • the third end 16a of the second insulating layer 16 proximal to the second side surface 13b of the resistor 10 is covered with the third conductive base layer 33.
  • the sixth electrical resistivity of the third conductive base layer 33 is larger than the seventh electrical resistivity of the fourth electrode layer 27, and is larger than the third electrical resistivity of the resistor 10.
  • the heat generated in the chip resistor 1b is generated not only from the first main surface 11 of the resistor 10 but also with the third conductive base layer 33. It can also be dissipated to the circuit board 50 from the second main surface 12 of the resistor 10 through the fourth electrode layer 27 and the second metal thin film layer 28. Further, the third conductive base layer 33 does not substantially change the resistance value of the chip resistor 1b. Independent of the resistance value of the chip resistor 1b, the heat dissipation of the chip resistor 1b can be improved.
  • the third conductive base layer 33 is in the direction in which the first electrode 20 and the second electrode 25 are separated from each other. It overlaps with the central portion 10 m of the resistor 10 in the (first direction (x direction)).
  • the heat generated in the chip resistor 1b is generated from the central portion 10 m of the resistor 10 having the highest temperature in the chip resistor 1b. It can be dissipated to the circuit board 50 (see FIG. 3) through the third conductive underlayer 33, the fourth electrode layer 27, and the second metal thin film layer 28. The heat dissipation of the chip resistor 1b can be improved.
  • the third conductive base layer 33 is formed of a conductive resin containing a binder resin and conductive particles dispersed in the binder resin.
  • the fourth electrode layer 27 is made of metal. Therefore, it is independent of the resistance value of the chip resistor 1b, and the heat dissipation of the chip resistor 1b can be improved. The manufacturing cost of the chip resistor 1b can be reduced.
  • the second insulating layer 16 is formed on the second main surface 12 of the strip resistor 10a on the side opposite to the first main surface 11 of the strip resistor 10a.
  • a third conductive base layer 33 is formed on the second main surface 12 of the strip-shaped resistor 10a and on the second insulating layer 16, and a second conductive base layer 33 is formed on the third conductive base layer 33 and the strip-shaped resistor 10a.
  • the second conductive film 41 is formed on the portion of the main surface 12 exposed from the third conductive base layer 33, and the first metal thin film layer 23 and the second metal thin film layer 28 are formed. And further prepare.
  • the second conductive film 41 is proximal to the third electrode layer 22 proximal to the first side surface 13a and proximal to the second side surface 13b, and is proximal to the third electrode layer 22. It is divided into a fourth electrode layer 27 which is separated from the fourth electrode layer 27.
  • the third conductive base layer 33 is in contact with the fourth electrode layer 27 and is separated from the third electrode layer 22.
  • the first metal thin film layer 23 electrically connects the first electrode layer 21 and the third electrode layer 22 to each other.
  • the second metal thin film layer 28 electrically connects the second electrode layer 26 and the fourth electrode layer 27 to each other.
  • the sixth electrical resistivity of the third conductive base layer 33 is larger than the seventh electrical resistivity of the fourth electrode layer 27, and is larger than the third electrical resistivity of the resistor 10.
  • the heat generated in the chip resistor 1b is generated not only from the first main surface 11 of the resistor 10 but also from the third conductive base layer 33. It can also be dissipated to the circuit board 50 from the second main surface 12 of the resistor 10 through the fourth electrode layer 27 and the second metal thin film layer 28. Further, the third conductive base layer 33 does not substantially change the resistance value of the chip resistor 1b. It is possible to obtain a chip resistor 1b having improved heat dissipation independently of the resistance value.
  • the third conductive base layer 33 is provided by printing.
  • the second conductive film 41 is provided by plating. Therefore, the productivity of the chip resistor 1b can be improved and the manufacturing cost of the chip resistor 1b can be reduced.
  • the chip resistor 1c of the third embodiment will be described with reference to FIGS. 21 and 22.
  • the chip resistor 1c of the present embodiment has the same configuration as the chip resistor 1b of the second embodiment, but is different in the following points.
  • the chip resistor 1c further includes a fourth conductive base layer 34.
  • the fourth conductive base layer 34 is provided on the second main surface 12 of the resistor 10 and on the second insulating layer 16.
  • the fourth conductive base layer 34 is in contact with the third electrode layer 22 and is separated from the third conductive base layer 33 and the fourth electrode layer 27 in the first direction (x direction).
  • a part of the fourth conductive base layer 34 is exposed from the third insulating layer 35.
  • the fourth conductive underlayer 34 includes an end 34a proximal to the second side surface 13b.
  • the end 34a of the fourth conductive base layer 34 is covered with the third insulating layer 35.
  • the end 34a of the fourth conductive base layer 34 is separated from the end 33a of the third conductive base layer 33 and the fourth electrode layer 27 in the first direction (x direction).
  • the fourth end 16b of the second insulating layer 16 proximal to the first side surface 13a of the resistor 10 is covered with the fourth conductive base layer 34.
  • the fourth conductive base layer 34 overlaps with the first conductive base layer 17.
  • the fourth conductive base layer 34 is the resistor 10 in the first direction (x direction) in which the first electrode 20 and the second electrode 25 are separated from each other. It is separated from the central part of 10 m.
  • the eighth electrical resistivity of the fourth conductive base layer 34 is larger than the ninth electrical resistivity of the third electrode layer 22, and is larger than the third electrical resistivity of the resistor 10. Therefore, when a current flows through the chip resistor 1, almost no current flows through the fourth conductive base layer 34. The fourth conductive base layer 34 does not substantially change the resistance value of the chip resistor 1.
  • the eighth electrical resistivity of the fourth conductive base layer 34 is, for example, 10 times or more the ninth electrical resistivity of the third electrode layer 22.
  • the eighth electrical resistivity of the fourth conductive base layer 34 may be 20 times or more, 50 times or more, or 100 times or more the ninth electrical resistivity of the third electrode layer 22. May be good.
  • the eighth electrical resistivity of the fourth conductive base layer 34 is, for example, five times or more the third electrical resistivity of the resistor 10.
  • the eighth electrical resistivity of the fourth conductive base layer 34 may be 10 times or more, 25 times or more, or 50 times or more the third electrical resistivity of the resistor 10. ..
  • the fourth conductive base layer 34 is formed of a conductive resin containing a binder resin (for example, epoxy resin, phenol resin or polyimide resin) and conductive particles (for example, silver particles) dispersed in the binder resin. ..
  • the third electrode layer 22 is further provided on the fourth conductive base layer 34.
  • the thickness of the third electrode layer 22 on the fourth conductive base layer 34 is very small due to the thickness of the third electrode layer 22 on the first main surface 11 of the resistor 10.
  • the thickness of the third electrode layer 22 on the fourth conductive base layer 34 is, for example, 0.1 times or less the thickness of the third electrode layer 22 on the first main surface 11 of the resistor 10.
  • the third insulating layer 35 is provided on the third conductive base layer 33, the fourth conductive base layer 34, and the second insulating layer 16.
  • the third insulating layer 35 protects the third conductive base layer 33 and the fourth conductive base layer 34.
  • the manufacturing method of the chip resistor 1c of the present embodiment includes the same steps as the manufacturing method of the chip resistor 1b of the second embodiment, but is mainly different in the following points.
  • the method for manufacturing the chip resistor 1c according to the present embodiment includes the steps shown in FIGS. 4 to 6.
  • the first conductive base layer 17 and the second conductive base layer 18 are placed on the first main surface 11 of the strip resistor 10a.
  • the third conductive base layer 33 and the fourth conductive base layer 34 are formed on the second main surface 12 and the second insulating layer 16 of the strip-shaped resistor 10a.
  • the fourth end 16b of the second insulating layer 16 is covered with the fourth conductive base layer 34.
  • the fourth conductive base layer 34 overlaps with the first conductive base layer 17.
  • the fourth conductive base layer 34 is separated from the third conductive base layer 33 in the first direction (x direction).
  • the fourth conductive base layer 34 is formed of, for example, a conductive resin containing a binder resin (for example, epoxy resin, phenol resin or polyimide resin) and conductive particles (for example, silver particles) dispersed in the binder resin. ing.
  • the fourth conductive base layer 34 is provided by printing such as screen printing.
  • a third insulating layer is formed on the third conductive base layer 33, the fourth conductive base layer 34, and the second insulating layer 16. It is provided to form 35. A part of the third conductive base layer 33 and a part of the fourth conductive base layer 34 are exposed from the third insulating layer 35.
  • the method for manufacturing the chip resistor 1c according to the present embodiment includes forming an insulating coating film 30.
  • the step of forming the insulating coating film 30 in the present embodiment is the same as the step of forming the insulating coating film 30 in the second embodiment.
  • the method for manufacturing the chip resistor 1c according to the present embodiment is the same as the method for manufacturing the chip resistor 1b according to the second embodiment, that is, the first conductive film 40 and the second conductive film. It is provided to form with 41.
  • the second conductive film 41 is formed on the third conductive base layer 33, on the fourth conductive base layer 34, and among the second main surfaces 12 of the resistor 10, the insulating coating film 30, the third insulating layer 35, and the third. It is formed on the portion exposed from the conductive base layer 33 and the fourth conductive base layer 34.
  • the eighth electrical resistivity of the fourth conductive base layer 34 is smaller than the third electrical resistivity of the resistor 10. Therefore, when the second conductive film 41 is formed by plating, for example, the thickness of the second conductive film 41 on the fourth conductive base layer 34 is the thickness of the second conductive film 41 on the first main surface 11 of the resistor 10. It becomes very small.
  • the method for manufacturing the chip resistor 1c according to the present embodiment is the same as the method for manufacturing the chip resistor 1b according to the second embodiment. It comprises forming a resistor 10 including one side surface 13a and a second side surface 13b.
  • the first conductive film 40 is divided into a first electrode layer 21 and a second electrode layer 26.
  • the second conductive film 41 is divided into a third electrode layer 22 and a fourth electrode layer 27.
  • the fourth conductive base layer 34 is in contact with the third electrode layer 22 and is separated from the fourth electrode layer 27.
  • the third electrode layer 22 is formed not only on the second main surface 12 of the resistor 10 but also on the fourth conductive base layer 34.
  • the first metal thin film layer 23 and the second metal thin film layer 28 are formed in the same manner as the method of manufacturing the chip resistor 1b of the second embodiment. To prepare for. In this way, the chip resistor 1c shown in FIGS. 21 and 22 is obtained.
  • the chip resistor 1c of the present embodiment and the manufacturing method thereof have the following effects in addition to the effects of the chip resistor 1b of the second embodiment and the manufacturing method thereof.
  • the chip resistor 1c of the present embodiment further includes a fourth conductive base layer 34 provided on the second main surface 12 and the second insulating layer 16 of the resistor 10.
  • the fourth conductive base layer 34 is in contact with the third electrode layer 22 and is separated from the third conductive base layer 33 and the fourth electrode layer 27.
  • the fourth end 16b of the second insulating layer 16 proximal to the first side surface 13a of the resistor 10 is covered with the fourth conductive base layer 34.
  • the eighth electrical resistivity of the fourth conductive base layer 34 is larger than the ninth electrical resistivity of the third electrode layer 22, and is larger than the third electrical resistivity of the resistor 10.
  • the heat generated in the chip resistor 1c is not only from the first main surface 11 of the resistor 10, but also from the third conductive base layer 33, It can also be dissipated to the circuit board 50 from the second main surface 12 of the resistor 10 through the fourth conductive base layer 34, the third electrode layer 22, and the fourth electrode layer 27. Further, the fourth conductive base layer 34 does not substantially change the resistance value of the chip resistor 1c. Independent of the resistance value of the chip resistor 1c, the heat dissipation of the chip resistor 1c can be improved.
  • the fourth conductive base layer 34 is formed of a conductive resin containing a binder resin and conductive particles dispersed in the binder resin.
  • the third electrode layer 22 is made of metal. Therefore, the heat dissipation of the chip resistor 1c can be improved independently of the resistance value of the chip resistor 1c. The manufacturing cost of the chip resistor 1c can be reduced.
  • the chip resistor 1c of the present embodiment on the second main surface 12 of the strip resistor 10a and on the second insulating layer 16, under the fourth conductivity separated from the third conductive base layer 33. Further provided to form a formation 34.
  • the second conductive film 41 is also formed on the fourth conductive base layer 34.
  • the fourth conductive base layer 34 is in contact with the third electrode layer 22 and is separated from the fourth electrode layer 27.
  • the eighth electrical resistivity of the fourth conductive base layer 34 is larger than the ninth electrical resistivity of the third electrode layer 22, and is larger than the third electrical resistivity of the resistor 10.
  • the heat generated in the chip resistor 1c is not only from the first main surface 11 of the resistor 10, but also from the third conductive base layer 33, It can also be dissipated to the circuit board 50 from the second main surface 12 of the resistor 10 through the fourth conductive base layer 34, the third electrode layer 22, and the fourth conductive base layer 34. Further, the fourth conductive base layer 34 does not substantially change the resistance value of the chip resistor 1c. It is possible to obtain a chip resistor 1c having improved heat dissipation independently of the resistance value.
  • the fourth conductive base layer 34 is provided by printing. Therefore, the productivity of the chip resistor 1c can be improved and the manufacturing cost of the chip resistor 1c can be reduced.
  • the chip resistor 1d of the fourth embodiment will be described with reference to FIGS. 26 and 27.
  • the chip resistor 1d of the present embodiment has the same configuration as the chip resistor 1 of the first embodiment, but is different in the following points.
  • the first insulating layer 15 is also provided on the first conductive base layer 17.
  • the first end 15a of the first insulating layer 15 is exposed from the first conductive base layer 17.
  • the end 17b of the first conductive base layer 17 is covered with the first insulating layer 15.
  • the end 17b of the first conductive base layer 17 is separated from the first electrode layer 21.
  • the first insulating layer 15 is also provided on the second conductive base layer 18.
  • the second end 15b of the first insulating layer 15 is exposed from the first conductive base layer 17.
  • the end 18b of the second conductive base layer 18 is covered with the first insulating layer 15.
  • the end 18b of the second conductive base layer 18 is separated from the second electrode layer 26.
  • a method for manufacturing the chip resistor 1d according to the present embodiment will be described with reference to FIGS. 4, 6, 9, 11, 13, and 28 to 32.
  • the method for manufacturing the chip resistor 1d according to the present embodiment includes the same steps as the method for manufacturing the chip resistor 1 according to the first embodiment, but is mainly different in the following points.
  • the method for manufacturing the chip resistor 1d according to the present embodiment includes the process shown in FIG. With reference to FIG. 28, in the method of manufacturing the chip resistor 1d of the present embodiment, the first conductive base layer 17 and the second conductive base layer 18 are formed on the first main surface 11 of the strip resistor 10a. Prepare to form. The first conductive base layer 17 and the second conductive base layer 18 are separated from each other in the first direction (x direction).
  • the first conductive base layer 17 is an end 17a which is an end of the first conductive base layer 17 in the first direction (x direction) and an end of the first conductive base layer 17 in the first direction (x direction). , The end 17b on the opposite side of the end 17a.
  • the second conductive base layer 18 is an end 18a which is an end of the second conductive base layer 18 in the first direction (x direction) and an end of the second conductive base layer 18 in the first direction (x direction). , The end 18b on the opposite side of the end 18a.
  • the end 17b of the first conductive base layer 17 faces the end 18b of the second conductive base layer 18.
  • the first conductive base layer 17 and the second conductive base layer 18 are provided by printing such as screen printing.
  • the method for manufacturing the chip resistor 1d is as follows on the first main surface 11 of the strip resistor 10a, on the first conductive base layer 17, and on the second conductive base layer 18.
  • the first insulating layer 15 is formed on the upper surface
  • the second insulating layer 16 is formed on the second main surface 12 of the band-shaped resistor 10a.
  • the first insulating layer 15 is formed between the first conductive base layer 17 and the second conductive base layer 18.
  • the end 17b of the first conductive base layer 17 is covered with the first insulating layer 15.
  • the end 18b of the second conductive base layer 18 is covered with the first insulating layer 15.
  • the first insulating layer 15 is an end 15a which is an end of the first insulating layer 15 in the first direction (x direction) and an end of the first insulating layer 15 in the first direction (x direction). Includes the second end 15b on the opposite side of the first end 15a.
  • the first end 15a of the first insulating layer 15 is on the first conductive base layer 17 and covers the end 17b of the first conductive base layer 17.
  • the second end 15b of the first insulating layer 15 is on the second conductive base layer 18 and covers the end 18b of the second conductive base layer 18.
  • the second insulating layer 16 is a third end 16a which is an end of the second insulating layer 16 in the first direction (x direction) and an end of the second insulating layer 16 in the first direction (x direction). Includes the fourth end 16b on the opposite side of the third end 16a.
  • the method for manufacturing the chip resistor 1d according to the present embodiment is to form the insulating coating film 30 in the same manner as the method for manufacturing the chip resistor 1 according to the first embodiment. Be prepared.
  • the method for manufacturing the chip resistor 1d according to the present embodiment is the same as the method for manufacturing the chip resistor 1 according to the first embodiment, that is, the first conductive film 40 and the second conductive film. It comprises forming 41 and.
  • the method for manufacturing the chip resistor 1d according to the present embodiment is the same as the method for manufacturing the chip resistor 1 according to the first embodiment. It comprises forming a resistor 10 including one side surface 13a and a second side surface 13b.
  • the manufacturing method of the chip resistor 1d of the present embodiment forms the first metal thin film layer 23 and the second metal thin film layer 28 in the same manner as the manufacturing method of the chip resistor 1 of the first embodiment. Be prepared for that. In this way, the chip resistor 1d shown in FIGS. 26 and 27 is obtained.
  • the chip resistor 1d of the present embodiment has the same effect as that of the chip resistor 1 of the first embodiment.
  • the resistor 10 includes a central portion 10 m exposed from the first electrode 20 and the second electrode 25 in a plan view of the first main surface 11.
  • the end 17b of the first conductive base layer 17 proximal to the central portion 10 m of the resistor 10 is covered with the first insulating layer 15.
  • the end 18b of the second conductive base layer 18 proximal to the central portion 10 m of the resistor 10 is covered with the first insulating layer 15.
  • the heat dissipation of the chip resistor 1d can be improved independently of the resistance value of the chip resistor 1d.
  • the chip resistor 1d of the fourth embodiment may be provided with the third conductive base layer 33 and the third insulating layer 35 of the second embodiment.
  • the chip resistor 1d of the fourth embodiment may be provided with the third conductive base layer 33, the fourth conductive base layer 34, and the third insulating layer 35 of the third embodiment.
  • 1,1b, 1c, 1d chip resistor 5 conductor frame, 10 conductor, 10a band-shaped resistor, 10m central part, 11 1st main surface, 12 2nd main surface, 13a 1st side surface, 13b 2nd side surface , 14a 3rd side surface, 14b 4th side surface, 15 1st insulating layer, 15a 1st end, 15b 2nd end, 16 2nd insulating layer, 16a 3rd end, 16b 4th end, 17 1st conductive base layer, 17a, 17b end, 18 second conductive base layer, 18a, 18b end, 20 first electrode, 21 first electrode layer, 21m first part, 22 third electrode layer, 22m third part, 23 first metal thin film layer , 25 2nd electrode, 26 2nd electrode layer, 26m 2nd part, 27 4th electrode layer, 27m 4th part, 28 2nd metal thin film layer, 30 insulation coating film, 33 3rd conductive base layer, 33a edge , 34 4th conductive base layer, 34a end, 35 3r

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
PCT/JP2021/034732 2020-11-02 2021-09-22 チップ抵抗器及びその製造方法 Ceased WO2022091643A1 (ja)

Priority Applications (4)

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DE112021005223.3T DE112021005223T5 (de) 2020-11-02 2021-09-22 Chip-Widerstand und Verfahren zum Herstellen desselben
CN202180074236.8A CN116508118A (zh) 2020-11-02 2021-09-22 片式电阻器及其制造方法
JP2022558918A JP7779850B2 (ja) 2020-11-02 2021-09-22 チップ抵抗器及びその製造方法
US18/245,485 US12525377B2 (en) 2020-11-02 2021-09-22 Chip resistor and method of manufacturing the same

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Citations (4)

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Publication number Priority date Publication date Assignee Title
JP2005277019A (ja) * 2004-03-24 2005-10-06 Rohm Co Ltd チップ抵抗器およびその製造方法
WO2010113341A1 (ja) * 2009-04-01 2010-10-07 釜屋電機株式会社 電流検出用金属板抵抗器及びその製造方法
JP2012199579A (ja) * 2006-08-10 2012-10-18 Kamaya Denki Kk 角板形チップ抵抗器の製造方法及び角板形チップ抵抗器
JP2013089855A (ja) * 2011-10-20 2013-05-13 Rohm Co Ltd 電子部品の電極構造

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JP3848286B2 (ja) * 2003-04-16 2006-11-22 ローム株式会社 チップ抵抗器
US8242878B2 (en) * 2008-09-05 2012-08-14 Vishay Dale Electronics, Inc. Resistor and method for making same
JP6730106B2 (ja) 2016-06-27 2020-07-29 Koa株式会社 シャント抵抗器の実装構造および実装基板
JP7262296B2 (ja) 2019-05-09 2023-04-21 福井コンピュータホールディングス株式会社 ３次元ｃａｄ装置、及び３次元ｃａｄプログラム

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Publication number Priority date Publication date Assignee Title
JP2005277019A (ja) * 2004-03-24 2005-10-06 Rohm Co Ltd チップ抵抗器およびその製造方法
JP2012199579A (ja) * 2006-08-10 2012-10-18 Kamaya Denki Kk 角板形チップ抵抗器の製造方法及び角板形チップ抵抗器
WO2010113341A1 (ja) * 2009-04-01 2010-10-07 釜屋電機株式会社 電流検出用金属板抵抗器及びその製造方法
JP2013089855A (ja) * 2011-10-20 2013-05-13 Rohm Co Ltd 電子部品の電極構造

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JP7779850B2 (ja) 2025-12-03
JPWO2022091643A1 (https=) 2022-05-05

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