Classifications

• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
  • C07C17/00—Preparation of halogenated hydrocarbons
  • C07C17/38—Separation; Purification; Stabilisation; Use of additives
  • C07C17/42—Use of additives, e.g. for stabilisation
• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
  • C07C17/00—Preparation of halogenated hydrocarbons
  • C07C17/38—Separation; Purification; Stabilisation; Use of additives
• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
  • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
  • C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
  • C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
  • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
  • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
  • Y02E60/30—Hydrogen technology
  • Y02E60/32—Hydrogen storage

Definitions

• the present invention relates to a method for storing fluoro-2-butene.
• Unsaturated fluorocarbons disclosed in Patent Documents 1 and 2, etc. may be used as an etching gas for dry etching.
• unsaturated fluorocarbons fluoro-2-butene is attracting attention as an etching gas that can be used in the most advanced dry etching process.
• An object of the present invention is to provide a method for storing fluoro-2-butene in which the isomerization reaction does not easily proceed during storage.
• one aspect of the present invention is as follows [1] to [3].
• [1] A method for storing fluoro-2-butene represented by the general formula C 4 H x F y , in which x is 0 or more and 7 or less, y is 1 or more and 8 or less, and x + y is 8.
• the fluoro-2-butene contains or does not contain hydrogen fluoride as an impurity, and the concentration of hydrogen fluoride in the gas phase portion in the case of containing hydrogen fluoride is 100% by volume or less, and the fluoro-2-butene is contained in the container. How to store fluoro-2-butene in.
• the fluoro-2-butene is (Z) -1,1,1,4,4,4-hexafluoro-2-butene, (E) -1,1,1,4,4,4-hexa. Fluoro-2-butene, (Z) -1,1,1,2,4,4,4-heptafluoro-2-butene, (E) -1,1,1,2,4,4,4-hepta Fluoro-2-butene, (Z) -1,1,1,2,3,4,4,4-octafluoro-2-butene, and (E) -1,1,1,2,3,4
• the isomerization reaction of fluoro-2-butene does not easily proceed during storage.
• the method for storing fluoro-2-butene according to the present embodiment is represented by the general formula C 4 H x F y , and x in the general formula is 0 or more and 7 or less, y is 1 or more and 8 or less, and x + y is 8.
• a method for storing fluoro-2-butene the concentration of hydrogen fluoride in the gas phase portion when fluoro-2-butene contains or does not contain hydrogen fluoride (HF) as an impurity is determined. It is a method of storing fluoro-2-butene in a container with a volume of 100 ppm or less.
• fluoro-2-butene contains hydrogen fluoride as an impurity
• the isomerization reaction of fluoro-2-butene is promoted by the catalytic action of hydrogen fluoride. Therefore, fluoro-2-butene containing hydrogen fluoride may undergo an isomerization reaction during storage and its purity may decrease.
• the fluoro-2-butene stored by the method for storing fluoro-2-butene according to the present embodiment does not contain hydrogen fluoride, or even if it contains hydrogen fluoride, its content is small, so that it is stored for a long period of time. However, the isomerization reaction is unlikely to proceed, and the purity is unlikely to decrease. Therefore, fluoro-2-butene can be stably stored for a long period of time.
• fluoro-2-butene The fluoro-2-butene according to the present embodiment is represented by the general formula C 4 H x F y , and x in the general formula is 0 or more and 7 or less, y is 1 or more and 8 or less, and x + y is. It satisfies the three conditions of 8.
• the type of fluoro-2-butene is not particularly limited as long as it meets the above requirements.
• fluoro-2-butenes may be used alone or in combination of two or more.
• E / Z geometric isomer is present in the above-mentioned fluoro-2-butene as described above, any of the above-mentioned geometric isomers, fluoro-2-butene, is the fluoro-2-butene according to the present embodiment. It can be used as a storage method for butene.
• a gas consisting only of fluoro-2-butene may be stored in the container, or a mixed gas containing fluoro-2-butene and a diluting gas may be stored in the container.
• the diluting gas at least one selected from nitrogen gas (N 2 ), helium (He), neon (Ne), argon (Ar), krypton (Kr), and xenon (Xe) can be used.
• the content of the diluted gas is preferably 90% by volume or less, more preferably 50% by volume or less, based on the total amount of gas stored in the container.
• the shape, size, material, and the like of the container for storing fluoro-2-butene are not particularly limited as long as they can contain and seal fluoro-2-butene.
• the material of the container metal, ceramic, resin or the like can be adopted. Examples of the metal include manganese steel, chrome molybdenum steel, stainless steel, Hastelloy (registered trademark), Inconel (registered trademark) and the like.
• Fluoro-2-butene according to the present embodiment contains or does not contain hydrogen fluoride as an impurity, but when it contains hydrogen fluoride, the concentration of hydrogen fluoride in the gas phase portion is 100% by volume ppm or less and stored in a container. Therefore, as described above, the isomerization reaction of fluoro-2-butene is difficult to be promoted, and as a result, the isomerization reaction of fluoro-2-butene is difficult to proceed during storage. If the concentration of hydrogen fluoride in the gas phase portion is equal to or lower than the above concentration, the concentration of hydrogen fluoride in the liquid phase portion is also sufficiently low.
• Hydrogen fluoride may be produced in the manufacturing process of fluoro-2-butene. Further, the concentration of hydrogen fluoride in fluoro-2-butene can be quantified by an infrared spectrophotometer, but the absence thereof means a case where it cannot be quantified by an infrared spectrophotometer. ..
• the concentration of hydrogen fluoride in the gas phase part needs to be 100% by volume ppm or less, but 50% by volume or less. It is preferable, and it is more preferable that it is 10 volume ppm or less.
• the concentration of hydrogen fluoride in the gas phase portion may be 1 volume ppm or more.
• the method for producing fluoro-2-butene having a low hydrogen fluoride concentration is not particularly limited, and examples thereof include a method for removing hydrogen fluoride from fluoro-2-butene having a high hydrogen fluoride concentration. Be done.
• the method for removing hydrogen fluoride from fluoro-2-butene is not particularly limited, and a known method can be adopted. For example, a method of contacting with an adsorbent to adsorb hydrogen fluoride to the adsorbent, a method of contacting with a reactant to react hydrogen fluoride with the reactant, and a method of separating by distillation can be mentioned.
• Specific examples of the adsorbent include molecular sieves and metal fluorides such as sodium fluoride.
• the pressure condition at the time of storage in the method for storing fluoro-2-butene according to the present embodiment is not particularly limited as long as the fluoro-2-butene can be stored in a container in a sealed manner, but is not particularly limited, but is 0.05 MPa or more. It is preferably 5 MPa or less, and more preferably 0.1 MPa or more and 3 MPa or less.
• fluoro-2-butene can be circulated without heating when the container is connected to the dry etching apparatus.
• the temperature conditions during storage in the method for storing fluoro-2-butene according to the present embodiment are not particularly limited, but are preferably ⁇ 20 ° C. or higher and 50 ° C. or lower, and 0 ° C. or higher and 40 ° C. or lower. Is more preferable. If the storage temperature is ⁇ 20 ° C. or higher, the container is unlikely to be deformed, so that the airtightness of the container is lost and oxygen, water, etc. are unlikely to be mixed into the container. If oxygen, water or the like is mixed in, the polymerization reaction and decomposition reaction of fluoro-2-butene may be promoted. On the other hand, when the storage temperature is 50 ° C. or lower, the polymerization reaction and decomposition reaction of fluoro-2-butene are suppressed.
• the fluoro-2-butene according to this embodiment can be used as an etching gas.
• the etching gas containing fluoro-2-butene according to the present embodiment is used in the etching process for manufacturing a semiconductor having a film containing silicon (Si), a protective film is formed on the mask and the side wall. Therefore, the selectivity of etching is improved. Further, the etching gas containing fluoro-2-butene according to the present embodiment can be used for both plasma etching using plasma and plasmaless etching using no plasma.
• plasma etching examples include reactive ion etching (RIE), inductively coupled plasma (ICP) etching, capacitively coupled plasma (CCP: Capacitive Coupled Plasma) etching, and electron etching.
• RIE reactive ion etching
• ICP inductively coupled plasma
• CCP capacitively coupled plasma
• electron etching examples include electron Cyclotron Resonance Plasma etching, microwave plasma etching can be mentioned. Further, in plasma etching, plasma may be generated in a chamber in which a member to be etched is installed, or a plasma generation chamber and a chamber in which the member to be etched may be installed may be separated (that is, remote plasma is used). May be).
• Fluoro-2-butene containing hydrogen fluoride at various concentrations was prepared. Examples of preparation of fluoro-2-butene are described below.
• (Preparation Example 1) One cylinder made of manganese steel with a capacity of 10 L and four cylinders made of manganese steel with a capacity of 1 L were prepared. These cylinders are referred to as cylinder A, cylinder B, cylinder C, and cylinder D in order. The cylinder was filled with 5000 g of (Z) -1,1,1,4,4,4-hexafluoro-2-butene (boiling point: 33 ° C.) and liquefied by cooling to 0 ° C.
• the liquid phase part and the gas phase part were formed in.
• the cylinders A, B, C, and D were cooled to ⁇ 78 ° C. after depressurizing the inside to 1 kPa or less with a vacuum pump.
• a SUS tube having a diameter of 1 inch and a length of 30 cm was filled with 100 mL of Molecular Sieve 5A manufactured by Union Showa Co., Ltd. Then, this SUS tube was connected to the cylinder. 500 g of gas of (Z) -1,1,1,4,4,4-hexafluoro-2-butene was extracted from the upper outlet in which the gas phase portion of the cylinder was present, and supplied to a SUS tube. Then, the gas of (Z) -1,1,1,4,4,4-hexafluoro-2-butene that passed through the SUS tube was collected in the cylinder A under reduced pressure.
• the flow rate of the gas when passing through the SUS tube was controlled to 500 mL / min by a mass flow controller.
• the amount of gas of (Z) -1,1,1,4,4,4-hexafluoro-2-butene collected in the cylinder A was 491 g.
• the (Z) -1,1,1,4,4,4-hexafluoro-2-butene collected in the cylinder A is used as a sample 1-1.
• the gas of (Z) -1,1,1,4,4,4-hexafluoro-2-butene collected in the cylinder A was extracted from the upper outlet, and the concentration of hydrogen fluoride was measured with an infrared spectrophotometer. .. The results are shown in Table 1.
• the measurement conditions of the infrared spectrophotometer are as follows.
• Infrared spectrophotometer Nicolet iS10 FT-IR spectroscope manufactured by Thermo Fisher Scientific Co., Ltd. Number of integrations: 128 times Mirror speed: 0.6329
• Optical path length 3m
• Gas cell material SUS316
• Gas cell temperature 100 ° C
• Measurement wavelength range 800-5000 cm -1
• Measurement wavelength of hydrogen fluoride 4038 cm -1
• the temperature of the cylinder A is raised to about 0 ° C. to form a liquid phase portion and a gas phase portion, and (Z) -1,1,1, from the upper outlet where the gas phase portion of the cylinder A is present.
• 100 g of gas of 4,4,4-hexafluoro-2-butene was extracted and transferred to the cylinder B under reduced pressure.
• 10 g of gas of (Z) -1,1,1,4,4,4-hexafluoro-2-butene was extracted from the cylinder and transferred to the cylinder B under reduced pressure. Then, the cylinder B was heated to room temperature and allowed to stand for 24 hours.
• the (Z) -1,1,1,4,4,4-hexafluoro-2-butene after standing still is used as sample 1-2.
• the gas of (Z) -1,1,1,4,4,4-hexafluoro-2-butene is extracted from the upper outlet where the gas phase portion of the cylinder B after standing still exists, and an infrared spectrophotometer is used.
• the concentration of hydrogen fluoride was measured in. The results are shown in Table 1.
• Example 1 After allowing the cylinder A to stand at 20 ° C. for 30 days, the gas of (Z) -1,1,1,4,4,4-hexafluoro-2-butene was extracted from the gas phase portion of the cylinder A, and gas chromatography was performed. The concentration of (E) -1,1,1,4,4,4-hexafluoro-2-butene in Sample 1-1 was quantified. As a result, it is a product of the isomerization reaction of (Z) -1,1,1,4,4,4-hexafluoro-2-butene (E) -1,1,1,4,4-4. Hexafluoro-2-butene was not detected.
• Examples 2 to 18 and Comparative Examples 1 to 6 The analysis targets and analysis results in Examples 2 to 18 and Comparative Examples 1 to 6 are shown in Table 7 in comparison with Example 1. That is, the analysis was performed by the same operation as in Example 1 except for the items shown in Table 7.

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• 2021
  • 2021-10-08 JP JP2022556933A patent/JPWO2022080275A1/ja active Pending
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