WO2022065292A1 - Processing device, ceramic sphere, and rolling bearing - Google Patents

Processing device, ceramic sphere, and rolling bearing Download PDF

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Publication number
WO2022065292A1
WO2022065292A1 PCT/JP2021/034544 JP2021034544W WO2022065292A1 WO 2022065292 A1 WO2022065292 A1 WO 2022065292A1 JP 2021034544 W JP2021034544 W JP 2021034544W WO 2022065292 A1 WO2022065292 A1 WO 2022065292A1
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WO
WIPO (PCT)
Prior art keywords
green ball
polishing
elastic member
processing apparatus
surface plate
Prior art date
Application number
PCT/JP2021/034544
Other languages
French (fr)
Japanese (ja)
Inventor
則秀 佐藤
文耶 中村
Original Assignee
Ntn株式会社
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Filing date
Publication date
Application filed by Ntn株式会社 filed Critical Ntn株式会社
Publication of WO2022065292A1 publication Critical patent/WO2022065292A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B11/00Machines or devices designed for grinding spherical surfaces or parts of spherical surfaces on work; Accessories therefor
    • B24B11/02Machines or devices designed for grinding spherical surfaces or parts of spherical surfaces on work; Accessories therefor for grinding balls
    • B24B11/04Machines or devices designed for grinding spherical surfaces or parts of spherical surfaces on work; Accessories therefor for grinding balls involving grinding wheels
    • B24B11/06Machines or devices designed for grinding spherical surfaces or parts of spherical surfaces on work; Accessories therefor for grinding balls involving grinding wheels acting by the front faces, e.g. of plane, grooved or bevelled shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/06Dust extraction equipment on grinding or polishing machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28BSHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B11/00Apparatus or processes for treating or working the shaped or preshaped articles
    • B28B11/08Apparatus or processes for treating or working the shaped or preshaped articles for reshaping the surface, e.g. smoothing, roughening, corrugating, making screw-threads
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/584Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
    • C04B35/587Fine ceramics
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/30Parts of ball or roller bearings
    • F16C33/32Balls

Definitions

  • This disclosure relates to processing equipment, especially processing equipment used for polishing green balls. Further, the present invention relates to a ceramic ball formed by the processing apparatus and a rolling bearing.
  • ceramic balls used for rolling elements of rolling bearings are formed by molding raw material powder to produce unsintered ceramic balls, that is, green balls, which are sintered and then sintered. It is manufactured by finishing it into a ceramic ball having a shape close to a true sphere by performing a polishing process.
  • the ceramic sphere has a very high hardness, there is a problem that it takes a long time to process.
  • JP-A-1-130908 Patent Document 1
  • a green ball containing a composition mainly composed of a thermoplastic organic polymer compound as a binder is sandwiched between two opposing surface plates, and a polishing machine is used.
  • a processing method in which abrasive grains and water are dropped onto the surface to perform wet polishing.
  • this method has a problem that the composition of the binder is restricted.
  • Patent Document 2 discloses a processing method in which a green ball is sandwiched between two vertical grindstones and polished. However, this method has a problem of poor mass productivity because it is not possible to process a plurality of green balls at the same time in one device.
  • Patent Document 3 a plurality of green balls are sandwiched between a pair of processing surface plates facing each other in a plane, and a plurality of systems along the opposite planes of both processing surface plates are relative to each other.
  • a processing device for polishing a green ball into a shape close to a true sphere while causing the green ball to revolve and rotate in various directions by movement is disclosed.
  • the relative movement of a plurality of systems is, for example, an eccentric rotation of both processing surface plates, a combination of rotation and straight movement, and the like.
  • the rough surface for polishing in the prepared surface plate is formed by a rough surface constituent member having a grid through which polishing powder can pass, and the rough surface portion on the lower side of the rough surface constituent member. Can be provided with a large number of holes to open on the upper surface.
  • the polishing method using this processing device there are no restrictions on the composition of the binder, and a plurality of processes can be performed at the same time.
  • Patent Document 4 discloses a processing apparatus provided with a polishing powder removing mechanism for efficiently removing polishing powder generated by polishing a green ball from the polishing surface.
  • Japanese Unexamined Patent Publication No. 1-130908 Japanese Unexamined Patent Publication No. 2-303767 Japanese Unexamined Patent Publication No. 7-314308 Japanese Unexamined Patent Publication No. 2011-73076
  • a binder When forming a ceramic ball made of silicon nitride, a binder is generally contained for the purpose of increasing the powder density of the green ball and increasing the powder strength. However, the components of the binder may segregate when mixed with the powder constituting the green ball, and may cause cracks and defects due to removal by degreasing. Therefore, a green ball having a low powder strength may be formed without containing a binder. However, if the binder is not contained, cracks are likely to occur during the polishing process of the green ball, which makes the polishing process difficult.
  • balls for rolling elements are not limited to those made of ceramics, and may be formed by adding silicon and nitrogen to metal.
  • a method is used in which silicon is put into a metal powder and hardened to form a green ball, which is then polished, and then nitrogen is introduced when the green ball is fired.
  • the green ball is more easily cracked during the polishing process, which makes the process difficult.
  • a holding layer for holding a green ball is formed on the horizontal plane of the second surface plate arranged vertically above the first surface plate, and the holding layer is formed.
  • an elastic member such as rubber or resin.
  • cracking may occur when processing a particularly fragile green ball using the processing apparatus of Japanese Patent Application Laid-Open No. 2011-73076.
  • the plurality of green balls charged into the processing apparatus may have significantly different diameters from each other at the initial stage of processing, which exerts a strong force on the green balls.
  • Japanese Patent Application Laid-Open No. 2011-73076 since the elastic member is not arranged on the inner wall surface of the holding portion of the second surface plate, there is a concern that the green ball colliding with the inner wall surface of the holding portion may break.
  • An object of the present disclosure is to provide a processing apparatus capable of suppressing cracking during polishing of a plurality of green balls having greatly different diameters in the initial state even when a special construction method not including a binder is used. Is. Further, it is to provide a ceramic ball formed by the processing apparatus and a rolling bearing.
  • the processing apparatus includes a first member, a first shaft, a second member including a holding portion, a second shaft, a polishing layer, and a first elastic member as an elastic member.
  • the first member includes a first surface that holds the green ball by coming into contact with the green ball.
  • the first axis rotates the first member around an axis that intersects the center of the first surface.
  • the second member faces the first surface, includes a second surface that holds the green ball by contacting the green ball, and extends so as to project in a direction intersecting the second surface, the first surface and the second surface. Includes a holding section that surrounds the green ball sandwiched between.
  • the second axis rotates the second member around an axis that intersects the center of the second surface.
  • the polishing layer includes at least one of the first surface and the second surface, and polishes the green ball by contacting with the green ball.
  • the first elastic member is arranged on the inner wall portion of the holding portion of the second member.
  • FIG. 1 It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 1.
  • FIG. It is a schematic plan view which shows the structure of a polishing layer.
  • FIG. 3 is a schematic enlarged cross-sectional view showing an example of a fixing mode of each member constituting the second surface plate of FIG. 1.
  • It is schematic cross-sectional view which shows the aspect which the 1st example of the polishing powder removal mechanism was installed in the processing apparatus of FIG.
  • FIG. It is a schematic cross-sectional view which shows the mode in which the gas supply member of the 2nd example of the polishing powder removal mechanism is installed in the processing apparatus of FIG. It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 2.
  • FIG. It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 3.
  • FIG. It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 4.
  • FIG. It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 5.
  • FIG. 1 is a schematic cross-sectional view showing the structure of the processing apparatus according to the first embodiment.
  • the processing apparatus 1 which is a green ball polishing apparatus according to the present embodiment has a first surface plate 10 as a first member, a first shaft 12, and a second member as a second member. It mainly includes a surface plate 20, a second shaft 22, a polishing layer 11, another layer 21, and a first elastic member 50.
  • the first surface plate 10 is arranged below the second surface plate 20.
  • the second surface plate 20 is arranged directly above the first surface plate 10 so as to face the first surface plate 10 in the vertical direction.
  • the present invention is not limited to this, and for example, the second surface plate 20 may be arranged directly below the first surface plate 10 so as to face the first surface plate 10 in the vertical direction.
  • the first surface plate 10 includes a first surface 10c that holds the green ball 91 by coming into contact with the green ball 91.
  • the first surface 10c is a surface that extends substantially along the left-right direction, that is, the horizontal direction of FIG.
  • the first surface plate 10 includes a first flat plate portion 10A and an outer peripheral portion 10B. Both the first flat plate portion 10A and the outer peripheral portion 10B are formed of a generally known steel material or the like.
  • the first flat plate portion 10A is a main member constituting the first surface plate 10, and its surface extends along the first surface 10c.
  • the first flat plate portion 10A has, for example, a circular surface along the horizontal direction, and has a disk shape having substantially constant dimensions in the vertical direction perpendicular to the surface.
  • the outer peripheral portion 10B extends from the first flat plate portion 10A so as to project upward in the direction intersecting the first surface 10c.
  • the outer peripheral portion 10B is a separate member from the first flat plate portion 10A, and the outer peripheral portion 10B is an annular member in a plan view.
  • the outer peripheral portion 10B has a size that substantially overlaps with the edge portion of the first flat plate portion 10A in a plan view.
  • the outer peripheral portion 10B is provided to prevent the polishing powder or the like described later from the green ball 91 from leaking to the outside of the first surface 10c.
  • the polishing layer 11 is sandwiched between the first flat plate portion 10A and the outer peripheral portion 10B.
  • the polishing layer 11 polishes the green balls 91 by coming into contact with the green balls 91.
  • the surface of the polishing layer 11 facing the second surface plate 20 on the upper side corresponds to the first surface 10c.
  • the polishing layer 11 includes the first surface 10c (the polishing layer 11 is arranged in the region including the first surface 10c).
  • FIG. 2 is a schematic plan view showing the structure of the polishing layer.
  • the polishing layer 11 may be, for example, a grindstone, but in the present embodiment, the polishing layer 11 is a wire mesh having a grid-like shape of a grid 11a through which the polishing powder can pass. It consists of a grid member of.
  • the green ball 91 to be polished by the processing apparatus 1 is preferably made of powder of any material of ceramics and metal, and the powder may further contain a resin material.
  • the second surface plate 20 includes, for example, a second surface 20c that faces the first surface 10c in the vertical direction and holds the green ball 91 by coming into contact with the green ball 91.
  • the second surface 20c is a surface that extends substantially along the left-right direction, that is, the horizontal direction in FIG.
  • the second surface plate 20 includes a second flat plate portion 20A and a holding portion 20B. Both the second flat plate portion 20A and the holding portion 20B are formed of a generally known steel material or the like.
  • the second flat plate portion 20A is a main member constituting the second surface plate 20, and its surface extends along the second surface 20c.
  • the second flat plate portion 20A is a main member constituting the second surface plate 20, and its surface extends substantially along the left-right direction, that is, the horizontal direction of FIG.
  • the second flat plate portion 20A has, for example, a circular surface along the horizontal direction, and has a disk shape having substantially constant dimensions in the vertical direction perpendicular to the surface.
  • the holding portion 20B extends from the second flat plate portion 20A so as to project downward in the direction intersecting the second surface 20c.
  • the holding portion 20B is a separate member from the second flat plate portion 20A, and the holding portion 20B is an annular member in a plan view.
  • the holding portion 20B has a size that substantially overlaps with the edge portion of the second flat plate portion 20A in a plan view.
  • Another layer 21 is sandwiched between the second flat plate portion 20A and the holding portion 20B.
  • the surface of the other layer 21 facing the first surface plate 10 on the lower side thereof corresponds to the second surface 20c, for example.
  • the other layer 21 may include the second surface 20c (the other layer 21 may be arranged in the region including the second surface 20c).
  • the other layer 21 may be a polishing layer or may not be a polishing layer. That is, the material of the other layer 21 may or may not be a grindstone. Although not shown, in the present embodiment, the other layer 21 has a grid member such as a wire mesh having a grid-like shape of a grid (corresponding to the grid 11a in FIG. 2) through which the polishing powder can pass. There is.
  • both the first surface 10c and the second surface 20c come into contact with the green ball 91 so as to sandwich the green ball 91.
  • the first surface 10c is included in the polishing layer 11, and the second surface 20c is included in the other layer 21.
  • the green ball 91 to be polished is surrounded by the inside of the holding portion 20B of the second surface plate 20 in a plan view. Therefore, each of the plurality of green balls 91 to be polished is arranged so as to be surrounded by the polishing layer 11, the other layer 21, and the holding portion 20B.
  • the second surface plate 20 can roll and hold the green ball 91 by surrounding the green ball 91 by the second flat plate portion 20A and the holding portion 20B.
  • At least one of the first surface 10c and the second surface 20c is a polished surface for polishing the green ball 91 by coming into contact with the green ball 91.
  • the first surface 10c is included in the polishing layer 11, and the second surface 20c is included in the other layer 21. Both the first surface 10c and the second surface 20c may be polished surfaces, but only one of them may be a polished surface.
  • the green ball 91 is sandwiched between the first surface 10c and the second surface 20c. Then, the first surface plate 10 and the second surface plate 20 revolve and rotate the green ball 91 by a plurality of relative movements.
  • the relative motion of the plurality of systems of the first surface plate 10 and the second surface plate 20 is, for example, the rotation of the first surface plate 10 and the second surface plate 20 around different axes, or the rotation of one of the surface plates. And the combination of the other surface plate going straight.
  • FIG. 3 is a schematic enlarged cross-sectional view showing an example of a fixing mode of each member constituting the second surface plate of FIG. 1.
  • a part of the lower second surface 20c of the other layer 21 contacts the holding portion 20B, and the upper surface of the other layer 21 contacts the second flat plate portion 20A.
  • the second flat plate portion 20A and the holding portion 20B are fixed together with another layer 21 sandwiched between them by, for example, a screw member 30 on which a male screw is formed.
  • the male screw of the screw member 30 may be fitted with a female screw of a nut (not shown) to fix the second flat plate portion 20A and the holding portion 20B.
  • a female screw that fits with the male screw of the screw member 30 may be formed on the second flat plate portion 20A and the holding portion 20B.
  • the portion of the screw member 30 from which the male screw extends is preferably extended so as to penetrate one of the grids 11a.
  • the first flat plate portion 10A, the outer peripheral portion 10B, and the polishing layer 11 may be fixed to each other by other means without using the screw member as described above.
  • the first axis 12 is connected so as to project to the lower side of FIG. 1, which is the side of the first surface plate 10 opposite to the side facing the second surface plate 20. ..
  • a bearing 13 is fitted on the outer peripheral surface of the first shaft 12. The bearing 13 is held by the outer peripheral member 14.
  • the first surface plate 10 can rotate around the axis ⁇ corresponding to the central axis of the first axis 12 in the circumferential direction, for example, as shown by an arrow R1 in FIG. That is, the first axis 12 rotates the first surface plate 10 around the axis ⁇ intersecting the center of the first surface 10c. Therefore, the first flat plate portion 10A can also rotate around the first axis 12.
  • the second axis 22 is connected so as to project upward in FIG. 1, which is the side opposite to the side of the second surface plate 20 facing the first surface plate 10.
  • a bearing 23 is fitted on the outer peripheral surface of the second shaft 22.
  • the bearing 23 is held by the outer peripheral member 24.
  • the processing apparatus 1 of the present embodiment further includes a first elastic member 50 as an elastic member.
  • the first elastic member 50 is made of any of rubber, resin and sponge.
  • the first elastic member 50 is arranged on the inner wall portion of the holding portion 20B of the second surface plate 20.
  • the inner wall surface 26 which covers at least a part of the inner wall surface of the holding portion 20B having an annular shape in a plan view to hold the green ball 91 so as to surround it, and is a part (outermost surface) of the inner wall portion.
  • the first elastic member 50 is arranged so that the first elastic member 50 is composed of the first elastic member 50.
  • the first elastic member 50 is arranged so as to face the green ball 91 surrounded by the second flat plate portion 20A and the holding portion 20B of the second surface plate 20.
  • the first elastic member 50 is attached to the inner wall surface of the holding portion 20B by, for example, double-sided tape.
  • the means for joining the first elastic member 50 to the holding portion 20B is arbitrary.
  • the thickness of the first elastic member 50 may be, for example, 5% or more and 30% or less of the thickness of the holding portion 20B in the thickness direction of the holding portion 20B (left-right direction in FIG. 1), and may be 1 mm or more.
  • the first diameter D in the plan view of the first flat plate portion 10A has a dimension more than twice the second diameter d in the plan view of the second flat plate portion 20A.
  • FIG. 4 is a schematic cross-sectional view showing a mode in which the first example of the polishing powder removing mechanism is installed in the processing apparatus of FIG.
  • the processing apparatus 1 in the first example of the present embodiment is suctioned as a polishing powder removing mechanism for removing the polishing powder generated by polishing the green ball 91 from the first surface 10c of the polishing layer 11.
  • It includes a member 40.
  • the suction member 40 is arranged on the first surface 10c of the first surface plate 10 so as not to interfere with the second surface plate 20. That is, the suction member 40 has a region (exposed from the second surface plate 20) other than the region facing the second surface plate 20 including the second surface 20c of the first surface 10c (more than the second surface plate 20 in FIG.
  • FIG. 5 is a schematic cross-sectional view showing a mode in which the cleaning member of the second example of the polishing powder removing mechanism is installed in the processing apparatus of FIG.
  • FIG. 6 is a schematic cross-sectional view showing a mode in which the gas supply member of the second example of the polishing powder removing mechanism is installed in the processing apparatus of FIG.
  • the processing apparatus 1 in the second example of the present embodiment is basically the same as that of FIGS. 1 and 4, but the suction member 40 is used as a polishing powder removing mechanism. Instead, the cleaning member 60 and the gas supply member 62 constituting the polishing powder removing mechanism are provided.
  • the cleaning member 60 has a function of cleaning the first surface 10c by supplying an organic solvent as a cleaning liquid to the first surface 10c which is the polishing surface. More specifically, with reference to FIG. 5, the cleaning member 60 is arranged on the first surface 10c so as not to interfere with the second surface plate 20. That is, the cleaning member 60 has a region (exposed from the second surface plate 20) other than the region facing the second surface plate 20 including the second surface 20c of the first surface 10c (more than the second surface plate 20 in FIG. 5). It is arranged so as to face the first surface 10c in the area on the left side). Further, in the region of the cleaning member 60 facing the first surface 10c, a plurality of discharge holes 61 for discharging the organic solvent are formed.
  • the organic solvent is discharged from the discharge hole 61 of the cleaning member 60 toward the first surface 10c of the polishing layer 11 as shown by the arrow b, so that the polishing powder is removed from the first surface 10c of the polishing layer 11.
  • Ru for example, water can be adopted, and a rust preventive agent, a surfactant and the like can be added as needed.
  • the gas supply member 62 has a function of drying the first surface 10c, which is the polished surface cleaned by the cleaning member 60, particularly when used together with the cleaning member 60 in the processing device 1. More specifically, with reference to FIG. 6, the gas supply member 62 is arranged on the first surface 10c so as not to interfere with the second surface plate 20. That is, the gas supply member 62 has a region (exposed from the second surface plate 20) other than the region facing the second surface plate 20 including the second surface 20c of the first surface 10c (from the second surface plate 20 in FIG. 5). Is arranged so as to face the first surface 10c in the area on the left side).
  • the gas supply member 62 is arranged on the rear side in the rotation direction of the first surface plate 10 when viewed from the cleaning member 60. Further, in the region of the gas supply member 62 facing the first surface 10c, an injection hole 63 for injecting gas is formed. Then, a gas such as dried air is sprayed from the injection hole 63 of the gas supply member 62 toward the first surface 10c of the polishing layer 11 to dry the first surface 10c wet with a cleaning liquid such as an organic solvent. Can be done.
  • the processing apparatus 1 in the second example of the present embodiment may include both the cleaning member 60 and the gas supply member 62, but may include only one of the cleaning member 60 and the gas supply member 62. .. Further, the gas supply member 62 is an embodiment in which compressed air is blown toward the first surface 10c of the polishing layer 11 regardless of whether or not it is used together with the cleaning member 60. The gas supply member 62 can blow off and remove the polishing powder adhering to the first surface 10c by supplying compressed air.
  • a method of polishing the green ball 91 using the processing device 1 will be described.
  • a plurality of green balls 91 produced by forming the raw material powder into a spherical shape are supplied between the first surface plate 10 and the second surface plate 20 of the processing apparatus 1.
  • the first surface plate 10 rotates with the axis ⁇ as the rotation axis
  • the second surface plate 20 rotates with the axis ⁇ as the rotation axis. That is, in the first surface plate 10 and the second surface plate 20, a plurality of systems of relative motion are achieved.
  • the green ball 91 rotates on its axis and revolves along the inner wall surface 26 of the holding portion 22 of the second surface plate 20.
  • the first surface 10c is a polished surface for polishing the green ball by contacting the green ball 91. Further, the green ball 91 is sandwiched between the first surface 10c and the second surface 20c. Further, the first surface plate 10 and the second surface plate 20 revolve and rotate the green ball 91 by a plurality of systems of relative motion (here, rotational motion around different axes). Therefore, the green ball 91 rotates while changing its rotation axis. Further, since the first surface 10c is a polished surface, the protruding portion of the green ball 91 is preferentially processed by the rotation, and the green ball 91 is polished over the entire surface thereof. As a result, the green ball 91 efficiently approaches a true sphere by polishing by the processing device 1.
  • the second surface 20c may also be a polished surface.
  • the processing apparatus 1 includes a first surface plate 10 as a first member, a first shaft 12, a second surface plate 20 as a second member including a holding portion 20B, and a second shaft 22.
  • a polishing layer 11 and a first elastic member 50 as an elastic member are provided.
  • the first surface plate 10 includes a first surface 10c that holds the green ball 91 by coming into contact with the green ball 91.
  • the first axis 12 rotates the first surface plate 10 around the axis ⁇ intersecting the center of the first surface 10c.
  • the second surface plate 20 faces the first surface 10c, includes a second surface 20c that holds the green ball 91 by contacting the green ball 91, and extends so as to project in a direction intersecting the second surface 20c.
  • the holding portion 20B surrounding the green ball 91 sandwiched between the first surface 10c and the second surface 20c is included.
  • the second axis 22 rotates the second surface plate 20 around the axis ⁇ intersecting the center of the second surface 20c.
  • the polishing layer 11 includes at least one of the first surface 10c and the second surface 20c, and polishes the green ball 91 by contacting with the green ball 91.
  • the first elastic member 50 is arranged on the inner wall portion of the holding portion 20B of the second surface plate 20.
  • the 91 is sandwiched, and the relative movement of a plurality of systems along the facing planes of both surface plates is performed. As a result, the green ball 91 can be polished into a shape close to a true sphere.
  • the first surface 10c is a part of the polishing layer 11 (a layer having a rough surface for polishing).
  • both the first surface 10c and the second surface 20c may be a part of a polishing layer (a layer having a rough surface for polishing processing).
  • only one of the first surface 10c and the second surface 20c may be a part of the polishing layer.
  • the plurality of green balls 91 are not limited to the region adjacent to the holding portion 20B shown in FIG. 1 and the like, but are actually the central portion of the region surrounded by the polishing layer 11, the other layers 21 and the holding portion 20B in a plan view. Also exists.
  • the green ball 91 in the central portion may collide with the holding portion 20B when moving to the outside, that is, toward the holding portion 20B. Since the green ball 91 is made of a material that is very fragile, cracks and defects may occur at the time of the collision. Therefore, as in the present embodiment, the soft first elastic member 50 is arranged on the inner wall portion (inner wall surface 26) of the holding portion 20B existing on the wall portion surrounding the green ball 91 of the second surface plate 20. As a result, it is possible to prevent the green ball 91 from cracking when the green ball 91 that has moved from the inside to the outside in a plan view collides with the inner wall surface 26.
  • the first surface plate 10 further includes a first flat plate portion 10A that extends along the first surface 10c and is rotatable around the first axis 12.
  • the second surface plate 20 further includes a second flat plate portion 20A that extends along the second surface 20c and is rotatable around the second axis 22. Such a configuration may be used.
  • a green ball between the two is provided by the first flat plate portion 10A that can rotate around the first axis 12 and the second flat plate portion 20A that can rotate around the second axis 22.
  • the green ball 91 can be polished into a shape close to a true sphere while sandwiching the 91 and causing the green ball 91 to revolve and rotate in various directions.
  • the processing device 1 further includes a polishing powder removing mechanism (at least one of a suction member 40, a cleaning member 60, and a gas supply member 62) that removes polishing powder generated by polishing the green ball 91 from the polishing layer 11.
  • the polishing powder removing mechanism is arranged so as to face the first surface 10c in a region other than the region of the first surface 10c facing the second surface plate 20. Such a configuration may be used.
  • Polishing of the green ball 91 produces polishing powder, but especially in the initial stage of processing, the polishing powder is peeled off from the green ball 91 as large particles and adheres to the first surface 10c or the like. If such large particles are left attached to the first surface 10c or the like, the polishing powder will be accumulated in the same place on the first surface 10c as the polishing progresses.
  • the second surface plate 20 rotates around ⁇ , but the relative position with respect to the first surface plate 10 in a plan view does not change, so even if the first surface plate 10 rotates, it is the same on the first surface plate 10. This is because the polishing powder is formed at a place (such as directly under the green ball 91).
  • the processing apparatus 1 is provided with a suction member 40 constituting a polishing powder removing mechanism, and clogging of the first surface 10c, which is the polishing surface, is suppressed and a decrease in polishing efficiency is suppressed. , The efficient polishing process can be maintained for a long period of time.
  • the processing device 1 in the present embodiment is a polishing device for the green ball 91 capable of suppressing a decrease in polishing efficiency and efficiently polishing the green ball.
  • the processing apparatus 1 may have a dimension in which the first diameter D of the first flat plate portion 10A in a plan view is more than twice the second diameter d in a plan view of the second flat plate portion 20A.
  • the first surface plate 10 rotates around the axis ⁇
  • the exposed region of the first surface 10c of the first surface plate 10 that does not overlap with the second surface plate 20 changes.
  • the polishing powder adheres to the region of the first surface 10c that overlaps with the second surface plate 20
  • the region is exposed without overlapping with the second surface plate 20 due to the rotation of the first surface plate 10 around the axis ⁇ .
  • the polishing powder is removed by the polishing powder removing mechanism.
  • the first diameter D is sufficiently larger than the second diameter d, that is, the first diameter D is not sufficiently larger than the second diameter d, for example, because D has a dimension more than twice d.
  • the first surface 10c is exposed without overlapping with the second surface plate 20, and the ratio of the area and time during which the adhering or accumulated polishing powder can be removed increases. Therefore, the effect of removing the polishing powder by using the polishing powder removing mechanism is enhanced.
  • the first elastic member 50 in the above processing apparatus 1 may be any of rubber, resin and sponge. As a result, stress concentration applied to the green ball 91 when the green ball 91 collides with the first elastic member 50 can be prevented, and cracking of the green ball 91 can be suppressed.
  • FIG. 7 is a schematic cross-sectional view showing the structure of the processing apparatus according to the second embodiment.
  • the processing apparatus 1 as the green ball polishing apparatus according to the second embodiment basically has the same structure as the processing apparatus 1 according to the first embodiment, and operates in the same manner. At the same time, it has the same effect.
  • the second elastic member 51 as an elastic member is further arranged between the first flat plate portion 10A and the first surface 10c.
  • the present embodiment is different from the case of the first embodiment in which only the first elastic member 50 is provided as the elastic member.
  • the second elastic member 51 is made of the same material as the first elastic member 50.
  • the second elastic member 51 may be attached to the surface of the first flat plate portion 10A on the second surface plate 20 side (upper side in FIG. 7) by, for example, double-sided tape. However, the second elastic member 51 may be simply laid on the surface of the first flat plate portion 10A without using a joining means such as double-sided tape.
  • the thickness of the second elastic member 51 between the first flat plate portion 10A and the first surface 10c is, for example, 5% of the thickness of the first flat plate portion 10A in the thickness direction of the first flat plate portion 10A (vertical direction in FIG. 7). It may be 30% or more and 1 mm or more.
  • the size difference between the plurality of green balls 91 is large. Therefore, especially at the initial stage of processing, the green ball 91 having a relatively large diameter may be easily cracked by directly contacting the hard first flat plate portion 10A. If the soft second elastic member 51 is provided as described above, the stress applied to the green ball 91 due to the green ball 91 colliding with the surface plate on the first surface plate 10 side (lower side in FIG. 7) is concentrated. Can be suppressed and cracking of the green ball 91 can be suppressed.
  • the second elastic member 51 is provided between the first flat plate portion 10A and the first surface 10c of the first surface plate 10 below the second surface plate 20, as shown in Examples described later, if the second elastic member 51 is provided. In particular, the effect of suppressing the formation of scratches on the green ball 91 is enhanced.
  • FIG. 8 is a schematic cross-sectional view showing the structure of the processing apparatus according to the third embodiment.
  • the processing apparatus 1 as the green ball polishing apparatus according to the third embodiment basically has the same structure as the processing apparatus 1 according to the first embodiment, and operates in the same manner. At the same time, it has the same effect.
  • the third elastic member 52 as an elastic member is further arranged between the second flat plate portion 20A and the second surface 20c. In this respect, the present embodiment is different from the case of the first embodiment.
  • the third elastic member 52 is made of the same material as the first elastic member 50.
  • the third elastic member 52 may be attached on the surface of the first surface plate 10 side (lower side of FIG. 8) of the second flat plate portion 20A by, for example, double-sided tape, but the joining means thereof is arbitrary. ..
  • the thickness of the third elastic member 52 between the second flat plate portion 20A and the second surface 20c is, for example, 5% of the thickness of the second flat plate portion 20A in the thickness direction of the second flat plate portion 20A (vertical direction in FIG. 8). It may be 30% or more and 1 mm or more.
  • the size difference between the plurality of green balls 91 is large. Therefore, especially at the initial stage of processing, the green ball 91 having a relatively large diameter may be easily cracked by directly contacting the hard second flat plate portion 20A. If the third elastic member 52 is provided as described above, the concentration of stress applied to the green ball 91 is suppressed by the green ball 91 colliding with the surface plate on the second surface plate 20 side (upper side in FIG. 8). Therefore, cracking of the green ball 91 can be suppressed.
  • FIG. 9 is a schematic cross-sectional view showing the structure of the processing apparatus according to the fourth embodiment.
  • the processing apparatus 1 as the green ball polishing apparatus according to the fourth embodiment basically has the same structure as the processing apparatus 1 according to the second and third embodiments, and has the same structure. It works in the same way and has the same effect.
  • the processing apparatus 1 in the fourth embodiment has a second elastic member 51 between the first flat plate portion 10A and the first surface 10c shown in FIG. 7, and the second flat plate portion 20A and the second surface shown in FIG. It has both a third elastic member 52 and 20c.
  • Such a configuration may be used.
  • Elastic members are provided at three locations between the inner wall portion of the holding portion 20B, between the first flat plate portion 10A and the first surface 10c, and between the second flat plate portion 20A and the second surface 20c. It is possible to more reliably suppress a decrease in processing accuracy due to cracking of the green ball 91 or the like.
  • FIG. 10 is a schematic cross-sectional view showing the structure of the processing apparatus according to the fifth embodiment.
  • the processing apparatus 1 as the green ball polishing apparatus according to the fifth embodiment basically has the same structure as the processing apparatus 1 according to the first embodiment, and operates in the same manner. At the same time, it has the same effect.
  • the first diameter D in the plan view of the first flat plate portion 10A has a dimension three times as large as the second diameter d in the plan view of the second flat plate portion 20A. That is, the ratio of D to d is larger than that of the first embodiment.
  • the ratio of the area and the time during which the polishing powder that is exposed without overlapping with the second surface plate 20 and adhered or accumulated can be removed from the entire first surface 10c is It will increase further. Therefore, the effect of removing the polishing powder by using the polishing powder removing mechanism is further enhanced.
  • the first diameter D is the second diameter d. It is preferably more than 2 times and 3 times or less.
  • the entire second surface plate 20 is contained in the region on the right side of the axis ⁇ , which is the center of the plan view of the first surface plate 10.
  • the same embodiment may be used in the first to fourth embodiments. That is, in the first to fourth embodiments, as in the fifth embodiment (FIG. 10), the entire axis including the left end of the second surface plate 20 is the center of the plan view of the first surface plate 10. It may fit in the area on the right side of ⁇ .
  • the processing apparatus 1 of the present embodiment has the following modifications in the cross-sectional shape of the first elastic member 50 arranged on the inner wall portion of the holding portion 20B of the second surface plate 20. May have.
  • FIG. 11 is a schematic cross-sectional view showing the structure of the processing apparatus according to the first example of the sixth embodiment.
  • the processing apparatus 1 in the first example of the present embodiment basically has the same structure as the processing apparatus 1 in the first embodiment, operates in the same manner, and has the same operation. It has the same effect.
  • the processing apparatus 1 in the first example of the sixth embodiment has a configuration in which the first elastic member 50 of the inner wall portion of the holding portion 20B is laminated in a plurality of layers in the thickness direction (left-right direction in FIG. 11). is doing.
  • the first elastic member 50A and the first elastic member 50B are laminated as the two layers of the first elastic member 50, but the number of layers may be any number of three or more.
  • the first elastic member of the innermost layer (the side facing the green ball 91) that has the most chance of coming into contact with the green ball 91 and is likely to deteriorate. Only 50A can be replaced. As a result, the replacement amount of the first elastic member 50 can be reduced, and the replacement cost of the first elastic member 50 can be reduced.
  • FIG. 12 is a schematic cross-sectional view showing the structure of the processing apparatus according to the second example of the sixth embodiment.
  • the processing apparatus 1 in the second example of the present embodiment basically has the same structure as the processing apparatus 1 in the first embodiment, operates in the same manner, and has the same operation. It has the same effect.
  • the first elastic member 50 of the inner wall portion of the holding portion 20B is inclined with respect to the vertical direction on the inner wall surface 26 which is the outermost surface thereof.
  • the thickness of the first elastic member 50 is small on the first surface plate 10 side (lower side of FIG.
  • the first elastic member 50 has a trapezoidal shape in the cross-sectional view of FIG. Contrary to the above, the thickness of the first elastic member 50 may be large on the side of the first surface plate 10 (lower side of FIG. 12) and smaller on the side opposite to the first surface plate 10 (upper side of FIG. 12). ..
  • the collision force per unit area can be reduced. Therefore, the stress applied to the green ball 91 can be further reduced as compared with the case where the inner wall surface 26 extends along the vertical direction, and defects such as cracking of the green ball 91 can be reliably suppressed.
  • FIG. 13 is a schematic cross-sectional view showing the structure of the processing apparatus according to the third example of the sixth embodiment.
  • the processing apparatus 1 in the third example of the present embodiment basically has the same structure as the processing apparatus 1 in the first embodiment, operates in the same manner, and has the same operation. It has the same effect.
  • the inner wall surface 26, which is the outermost surface of the first elastic member 50 of the inner wall portion of the holding portion 20B has a curved surface shape.
  • the thickness of the first elastic member 50 in the horizontal direction along the first surface 10c is smaller in the center of the vertical direction in which the first surface 10c and the second surface 20c face each other than the end portion in the vertical direction.
  • the first elastic member 50 of FIG. 13 has a shape close to a part of the spherical surface so that the surface facing the green ball 91 follows the surface of the green ball 91 close to the spherical surface.
  • the present invention is not limited to such an aspect, and for example, although not shown, the first elastic member 50 may have a curved cross-sectional shape so that the thickness in the left-right direction is larger than that of the end portion in the up-down direction at the center in the up-down direction. good.
  • the collision force per unit area is reduced as compared with the case where the inner wall surface 26 is a flat surface. Can be done. Therefore, the stress applied to the green ball 91 can be further reduced, and defects such as cracking of the green ball 91 can be reliably suppressed.
  • FIG. 14 is a schematic cross-sectional view showing an example of a rolling bearing provided with a ceramic ball obtained by sintering a green ball formed by the processing apparatus according to any one of the first to sixth embodiments.
  • the rolling bearing 2 is polished using the processing apparatus 1 (as one of (each example) of each of the above embodiments) shown in any of FIGS. 1 and 4 to 13. It is a ball bearing provided with a ceramic ball 4 which is a sintered body obtained by sintering the green ball 91 as a rolling element.
  • the rolling bearing of FIG. 14 is a radial ball bearing, but it may be a thrust ball bearing.
  • the rolling bearing (radial ball bearing) may be a deep groove ball bearing, but may be either an angular contact ball bearing or a self-aligning ball bearing.
  • the rolling bearing 2 of FIG. 14 includes an outer ring 3A and an inner ring 3B.
  • the plurality of ceramic spheres 4 roll between the outer ring 3A and the inner ring 3B.
  • the plurality of ceramic spheres 4 are arranged by the cage 5 so as to have an interval in the circumferential direction.
  • the material of the green ball is described as "ceramics” because it is a solidified silicon nitride-based ceramic powder.
  • the material of the green ball is described as “metal” because it is made by putting silicon powder into copper-iron powder and hardening it.
  • No. 1 to 8 are groups having 10 green balls 91 each, and 10 green balls 91 were thrown between the first surface 10c and the second surface 20c in FIG. 7 and processed at the same time. No. 1 and No. The two green balls are the same, but the same test was performed twice with them. No. 3 and No. 4, No. 5 and No. 6, No. 7 and No. The same applies to 8.
  • the rotation speed of the first surface plate 10 during polishing was 10 rpm, and the rotation speed of the second surface plate 20 was 250 rpm.
  • the lattice 11a (see FIG. 2) of the polishing layer 11 and the other layers 21 had an opening of 50 ⁇ m or more and 350 ⁇ m or less. Processing was continued until the green balls 91 had the desired dimensions.
  • the "dent” in Table 1 means a chipping or peeling larger than the roughness due to the transfer of the grid 11a (see FIG. 2) to the green ball.
  • the "normal surface plate” is basically the same as the processing apparatus of the present embodiment, but none of the above-mentioned second elastic member 51, first elastic member 50, and third elastic member 52 is provided. The test result when the processing equipment equipped with the plate is used is shown.
  • the "elastic body surface plate” indicates a test result when a processing apparatus having a second elastic member 51 is used as described above. From Table 1, by providing the soft elastic member, it is possible to suppress the application of strong stress to the green ball 91 regardless of the presence or absence of the binder. For this reason, it was found that, for example, even when a special construction method that does not include a binder in the green ball is used from the viewpoint of suppressing segregation of powder, defects such as cracks or dents during polishing can be suppressed.
  • each of the above-described embodiments may be applied so as to be appropriately combined within a technically consistent range.
  • at least one of the polishing powder removing mechanisms of FIGS. 4 to 6 may be used for each of FIGS. 11 to 13, and the second elastic member 51 and the second elastic member 51 and FIG. 3 Elastic member 52 may be added.

Abstract

A processing device (1) is provided with a first surface plate (10), a first shaft (12), a second surface plate (20) including a retaining unit (20B), a second shaft (22), a polishing layer (11), and a first elastic member (50). The first surface plate (10) includes a first face (10c) that comes into contact with and retains a green ball (91). The first shaft (12) rotates the first surface plate (10) around an axis α. The second surface plate (20) includes: a second face (20c) that faces the first face (10c), and comes into contact with and retains the green ball (91); and the retaining unit (20B) that extends to protrude in a direction intersecting the second face (20c) and surrounds the green ball (91). The second shaft (22) rotates the second surface plate (20) around an axis β. The polishing layer (11) comes into contact with the green ball (91) to polish the green ball (91). The first elastic member (50) is arranged on an inner wall portion of the retaining unit (20B) of the second surface plate (20).

Description

加工装置、セラミックス球および転がり軸受Machining equipment, ceramic balls and rolling bearings
 本開示は加工装置に関し、特にグリーンボールの研磨に用いられる加工装置に関する。また当該加工装置により形成されるセラミックス球、および転がり軸受に関する。 This disclosure relates to processing equipment, especially processing equipment used for polishing green balls. Further, the present invention relates to a ceramic ball formed by the processing apparatus and a rolling bearing.
 一般に、転がり軸受の転動体などに使用されるセラミックス製のボール(セラミックス球)は、原料粉末を成形してセラミックスの未焼結のボール、すなわちグリーンボールを作製し、これを焼結した後、研磨処理を行なうことにより真球に近い形状を有するセラミックス球に仕上げることにより製造される。しかし、セラミックス球は硬度が非常に高いため、加工に長時間を要するという問題がある。 In general, ceramic balls (ceramic balls) used for rolling elements of rolling bearings are formed by molding raw material powder to produce unsintered ceramic balls, that is, green balls, which are sintered and then sintered. It is manufactured by finishing it into a ceramic ball having a shape close to a true sphere by performing a polishing process. However, since the ceramic sphere has a very high hardness, there is a problem that it takes a long time to process.
 一方、焼結前のグリーンボールは、硬度が低くて加工が容易であるので、焼結後の研磨に比べて格段に高い能率で加工できる。このような背景のもと、グリーンボールの加工に関して、種々の提案がなされている。たとえば特開平1-130908号公報(特許文献1)には、対向する2枚の定盤間に熱可塑性有機高分子化合物を主体とする組成物を結合材として加えたグリーンボールを挟み、研磨盤に砥粒と水とを滴下し、湿式研磨を行なう加工方法が開示されている。しかし、この方法では、結合材の組成が制約されるという問題がある。また、この方法では、加工後の脱脂および焼結条件が複雑になるため、量産性にも問題を生じる。また、特開平2-303767号公報(特許文献2)には、縦型の2枚の砥石間にグリーンボールを挟み込み、研磨する加工方法が開示されている。しかし、この方法では、一基の装置において複数個のグリーンボールを同時に加工することができないため、量産性に乏しいという問題がある。 On the other hand, green balls before sintering have low hardness and are easy to process, so they can be processed with much higher efficiency than polishing after sintering. Against this background, various proposals have been made regarding the processing of green balls. For example, in JP-A-1-130908 (Patent Document 1), a green ball containing a composition mainly composed of a thermoplastic organic polymer compound as a binder is sandwiched between two opposing surface plates, and a polishing machine is used. Disclosed is a processing method in which abrasive grains and water are dropped onto the surface to perform wet polishing. However, this method has a problem that the composition of the binder is restricted. In addition, this method complicates degreasing and sintering conditions after processing, which causes a problem in mass productivity. Further, Japanese Patent Application Laid-Open No. 2-303767 (Patent Document 2) discloses a processing method in which a green ball is sandwiched between two vertical grindstones and polished. However, this method has a problem of poor mass productivity because it is not possible to process a plurality of green balls at the same time in one device.
 一方、特開平7-314308号公報(特許文献3)には、互いに平面で対向する一対の加工定盤間に複数個のグリーンボールを挟み込み、両加工定盤の対向平面に沿う複数系統の相対移動で、グリーンボールに公転と、各種方向の自転とを行なわせながら、グリーンボールを真球に近い形状に研磨する加工装置が開示されている。複数系統の相対移動とは、たとえば両加工定盤の互いに偏心した回転や、回転と直進との組み合わせ等である。この研磨装置においては、下加工定盤における研磨加工用の粗面を、研磨粉の通過可能な格子目の粗面構成部材で形成し、かつこの粗面構成部材の下側の加工定盤部分に、上面に開口する多数の孔を設けることができる。この加工装置を用いた研磨方法は、結合材の組成に制約がなく、かつ同時に複数個の加工が可能である。 On the other hand, in Japanese Patent Application Laid-Open No. 7-314308 (Patent Document 3), a plurality of green balls are sandwiched between a pair of processing surface plates facing each other in a plane, and a plurality of systems along the opposite planes of both processing surface plates are relative to each other. A processing device for polishing a green ball into a shape close to a true sphere while causing the green ball to revolve and rotate in various directions by movement is disclosed. The relative movement of a plurality of systems is, for example, an eccentric rotation of both processing surface plates, a combination of rotation and straight movement, and the like. In this polishing apparatus, the rough surface for polishing in the prepared surface plate is formed by a rough surface constituent member having a grid through which polishing powder can pass, and the rough surface portion on the lower side of the rough surface constituent member. Can be provided with a large number of holes to open on the upper surface. In the polishing method using this processing device, there are no restrictions on the composition of the binder, and a plurality of processes can be performed at the same time.
 しかしながら、特開平7-314308号公報に記載のグリーンボールの研磨用の加工装置は、粗面構成部材の格子目や加工定盤に設けられた孔が、グリーンボールの研磨により生じた研磨粉により目詰まりし、研磨効率が低下するおそれがある。そこで特開2011-73076号公報(特許文献4)には、グリーンボールの研磨により生じた研磨粉を効率よく研磨面から除去する研磨粉除去機構を備えた加工装置が開示されている。 However, in the processing apparatus for polishing green balls described in JP-A-7-314308, the grids of the rough surface constituent members and the holes provided in the processing platen are formed by the polishing powder generated by polishing the green balls. There is a risk of clogging and reduced polishing efficiency. Therefore, Japanese Patent Application Laid-Open No. 2011-73076 (Patent Document 4) discloses a processing apparatus provided with a polishing powder removing mechanism for efficiently removing polishing powder generated by polishing a green ball from the polishing surface.
特開平1-130908号公報Japanese Unexamined Patent Publication No. 1-130908 特開平2-303767号公報Japanese Unexamined Patent Publication No. 2-303767 特開平7-314308号公報Japanese Unexamined Patent Publication No. 7-314308 特開2011-73076号公報Japanese Unexamined Patent Publication No. 2011-73076
 窒化珪素製のセラミックス球を形成する場合、グリーンボールの圧粉密度を高め、かつ圧粉体強度を増大する目的で、一般的には結合材が含有される。しかし結合材の成分は、グリーンボールを構成する粉体に混合する際に偏析したり、脱脂による除去に起因する割れおよび欠陥が発生したりする要因となる場合がある。このため結合材を含有せずに圧粉体強度が低いグリーンボールが形成されることもある。しかし結合材を含有させなければグリーンボールの研磨加工時に割れが発生し易く、研磨加工が困難である。 When forming a ceramic ball made of silicon nitride, a binder is generally contained for the purpose of increasing the powder density of the green ball and increasing the powder strength. However, the components of the binder may segregate when mixed with the powder constituting the green ball, and may cause cracks and defects due to removal by degreasing. Therefore, a green ball having a low powder strength may be formed without containing a binder. However, if the binder is not contained, cracks are likely to occur during the polishing process of the green ball, which makes the polishing process difficult.
 さらに転動体用のボールはセラミックス製に限らず、金属に珪素と窒素を加えることで形成される場合がある。この場合は金属粉体に珪素を入れて固めたものをグリーンボールとして研磨加工し、その後グリーンボールを焼成する際に窒素を導入する方法が用いられる。この場合は研磨加工時にグリーンボールがいっそう割れやすく、加工が困難である。 Furthermore, balls for rolling elements are not limited to those made of ceramics, and may be formed by adding silicon and nitrogen to metal. In this case, a method is used in which silicon is put into a metal powder and hardened to form a green ball, which is then polished, and then nitrogen is introduced when the green ball is fired. In this case, the green ball is more easily cracked during the polishing process, which makes the process difficult.
 ところで特開2011-73076号公報においては、第1定盤よりも鉛直方向の上側に配置される第2定盤の水平面に、グリーンボールを保持するための保持層が形成されており、保持層はゴム、樹脂などの弾性部材である。弾性部材を用いることで、保持部を有する第2定盤とその真下の第1定盤の間に挟むように配置された複数のグリーンボールが第2定盤に衝突することによる割れが抑制できる。しかし特開2011-73076号公報では弾性部材が第2定盤の第1定盤に対向する水平面上にのみ設置される。このため特開2011-73076号公報の加工装置を用いて特に割れやすいグリーンボールを加工する際に割れが発生する可能性がある。当該加工装置に投入される複数のグリーンボールは加工の初期において互いに直径が大きく異なる場合があり、このことがグリーンボールに強い力を加える。特開2011-73076号公報では第2定盤の保持部の内側の壁面に弾性部材が配置されないため、当該保持部の内側の壁面に衝突したグリーンボールが割れる不具合を起こすことが懸念される。 By the way, in Japanese Patent Application Laid-Open No. 2011-73076, a holding layer for holding a green ball is formed on the horizontal plane of the second surface plate arranged vertically above the first surface plate, and the holding layer is formed. Is an elastic member such as rubber or resin. By using an elastic member, it is possible to suppress cracking caused by a plurality of green balls arranged so as to be sandwiched between a second surface plate having a holding portion and a first surface plate directly below the second surface plate and collide with the second surface plate. .. However, in Japanese Patent Application Laid-Open No. 2011-73076, the elastic member is installed only on the horizontal plane facing the first surface plate of the second surface plate. Therefore, cracking may occur when processing a particularly fragile green ball using the processing apparatus of Japanese Patent Application Laid-Open No. 2011-73076. The plurality of green balls charged into the processing apparatus may have significantly different diameters from each other at the initial stage of processing, which exerts a strong force on the green balls. In Japanese Patent Application Laid-Open No. 2011-73076, since the elastic member is not arranged on the inner wall surface of the holding portion of the second surface plate, there is a concern that the green ball colliding with the inner wall surface of the holding portion may break.
 本開示は上記の課題に鑑みなされたものである。本開示の目的は、結合材を含めない特殊な工法を用いた場合であっても、初期状態において互いに直径が大きく異なる複数のグリーンボールの研磨加工時の割れを抑制できる加工装置を提供することである。また当該加工装置により形成されるセラミックス球、および転がり軸受を提供することである。 This disclosure was made in view of the above issues. An object of the present disclosure is to provide a processing apparatus capable of suppressing cracking during polishing of a plurality of green balls having greatly different diameters in the initial state even when a special construction method not including a binder is used. Is. Further, it is to provide a ceramic ball formed by the processing apparatus and a rolling bearing.
 本開示に従った加工装置は、第1部材と、第1軸と、保持部を含む第2部材と、第2軸と、研磨層と、弾性部材としての第1弾性部材とを備える。第1部材はグリーンボールに接触することによりグリーンボールを保持する第1面を含む。第1軸は第1部材を第1面の中心に交差する軸周りに回転させる。第2部材は第1面に対向し、グリーンボールに接触することによりグリーンボールを保持する第2面を含むとともに、第2面に交差する方向に突出するように延び第1面および第2面の間に挟持されるグリーンボールを取り囲む保持部を含む。第2軸は第2部材を第2面の中心に交差する軸周りに回転させる。研磨層は第1面および第2面の少なくともいずれかを含み、グリーンボールに接触することによりグリーンボールを研磨する。第1弾性部材は、第2部材の保持部の内壁部に配置される。 The processing apparatus according to the present disclosure includes a first member, a first shaft, a second member including a holding portion, a second shaft, a polishing layer, and a first elastic member as an elastic member. The first member includes a first surface that holds the green ball by coming into contact with the green ball. The first axis rotates the first member around an axis that intersects the center of the first surface. The second member faces the first surface, includes a second surface that holds the green ball by contacting the green ball, and extends so as to project in a direction intersecting the second surface, the first surface and the second surface. Includes a holding section that surrounds the green ball sandwiched between. The second axis rotates the second member around an axis that intersects the center of the second surface. The polishing layer includes at least one of the first surface and the second surface, and polishes the green ball by contacting with the green ball. The first elastic member is arranged on the inner wall portion of the holding portion of the second member.
 上記によれば、結合材を含めない特殊な工法を用いた場合であっても、初期状態において互いに直径が大きく異なる複数のグリーンボールの研磨加工時の割れを抑制できる加工装置を提供できる。また当該加工装置により形成されるセラミックス球および転がり軸受を提供できる。 According to the above, it is possible to provide a processing device capable of suppressing cracking during polishing of a plurality of green balls having significantly different diameters from each other in the initial state even when a special construction method that does not include a binder is used. Further, it is possible to provide a ceramic ball and a rolling bearing formed by the processing apparatus.
実施の形態1に係る加工装置の構造を示す概略断面図である。It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 1. FIG. 研磨層の構造を示す概略平面図である。It is a schematic plan view which shows the structure of a polishing layer. 図1の第2定盤を構成する各部材の固定態様の一例を示す概略拡大断面図である。FIG. 3 is a schematic enlarged cross-sectional view showing an example of a fixing mode of each member constituting the second surface plate of FIG. 1. 図1の加工装置に研磨粉除去機構の第1例が設置された態様を示す概略断面図である。It is schematic cross-sectional view which shows the aspect which the 1st example of the polishing powder removal mechanism was installed in the processing apparatus of FIG. 図1の加工装置に研磨粉除去機構の第2例の洗浄部材が設置された態様を示す概略断面図である。It is a schematic cross-sectional view which shows the mode in which the cleaning member of the 2nd example of the polishing powder removal mechanism is installed in the processing apparatus of FIG. 図1の加工装置に研磨粉除去機構の第2例の気体供給部材が設置された態様を示す概略断面図である。It is a schematic cross-sectional view which shows the mode in which the gas supply member of the 2nd example of the polishing powder removal mechanism is installed in the processing apparatus of FIG. 実施の形態2に係る加工装置の構造を示す概略断面図である。It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 2. FIG. 実施の形態3に係る加工装置の構造を示す概略断面図である。It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 3. FIG. 実施の形態4に係る加工装置の構造を示す概略断面図である。It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 4. FIG. 実施の形態5に係る加工装置の構造を示す概略断面図である。It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on Embodiment 5. 実施の形態6の第1例に係る加工装置の構造を示す概略断面図である。It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on 1st example of Embodiment 6. 実施の形態6の第2例に係る加工装置の構造を示す概略断面図である。It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on 2nd example of Embodiment 6. 実施の形態6の第3例に係る加工装置の構造を示す概略断面図である。It is a schematic sectional drawing which shows the structure of the processing apparatus which concerns on 3rd example of Embodiment 6. 実施の形態1~6のいずれかに係る加工装置により形成されたグリーンボールを焼結して得られるセラミックス球を備える転がり軸受の一例を示す概略断面図である。It is schematic cross-sectional view which shows an example of the rolling bearing provided with the ceramic ball obtained by sintering the green ball formed by the processing apparatus which concerns on one of Embodiments 1-6.
 以下、図面を参照しながら、本発明の実施の形態について説明する。なお、以下の図面において同一または相当する部分には、同一の参照番号を付し、その説明は繰り返さない。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, the same or corresponding parts are given the same reference numbers, and the description thereof will not be repeated.
 (実施の形態1)
 まず、本実施の形態におけるグリーンボールの研磨に用いる加工装置について説明する。図1は、実施の形態1に係る加工装置の構造を示す概略断面図である。図1を参照して、本実施の形態に係るグリーンボールの研磨装置である加工装置1は、第1部材としての第1定盤10と、第1軸12と、第2部材としての第2定盤20と、第2軸22と、研磨層11と、他の層21と、第1弾性部材50とを主に備えている。
(Embodiment 1)
First, the processing apparatus used for polishing the green ball in the present embodiment will be described. FIG. 1 is a schematic cross-sectional view showing the structure of the processing apparatus according to the first embodiment. With reference to FIG. 1, the processing apparatus 1 which is a green ball polishing apparatus according to the present embodiment has a first surface plate 10 as a first member, a first shaft 12, and a second member as a second member. It mainly includes a surface plate 20, a second shaft 22, a polishing layer 11, another layer 21, and a first elastic member 50.
 図1において、第1定盤10は第2定盤20の下側に配置されている。これにより第2定盤20は第1定盤10の真上に、鉛直方向について第1定盤10と対向するように配置されている。ただしこれに限らず、たとえば第2定盤20が第1定盤10の真下に、鉛直方向について第1定盤10と対向するように配置されてもよい。 In FIG. 1, the first surface plate 10 is arranged below the second surface plate 20. As a result, the second surface plate 20 is arranged directly above the first surface plate 10 so as to face the first surface plate 10 in the vertical direction. However, the present invention is not limited to this, and for example, the second surface plate 20 may be arranged directly below the first surface plate 10 so as to face the first surface plate 10 in the vertical direction.
 第1定盤10は、グリーンボール91に接触することによりグリーンボール91を保持する第1面10cを含んでいる。第1面10cは、概ね図1の左右方向すなわち水平方向に沿うように拡がる表面である。第1定盤10は、第1平板部10Aと外周部10Bとを含んでいる。第1平板部10Aおよび外周部10Bはともに一般公知の鋼材などにより形成されている。第1平板部10Aは、第1定盤10を構成する主要な部材であり、第1面10cに沿うように表面が拡がっている。第1平板部10Aは、水平方向に沿う表面がたとえば円形であり、それに垂直な鉛直方向の寸法がほぼ一定な円板形状を有している。 The first surface plate 10 includes a first surface 10c that holds the green ball 91 by coming into contact with the green ball 91. The first surface 10c is a surface that extends substantially along the left-right direction, that is, the horizontal direction of FIG. The first surface plate 10 includes a first flat plate portion 10A and an outer peripheral portion 10B. Both the first flat plate portion 10A and the outer peripheral portion 10B are formed of a generally known steel material or the like. The first flat plate portion 10A is a main member constituting the first surface plate 10, and its surface extends along the first surface 10c. The first flat plate portion 10A has, for example, a circular surface along the horizontal direction, and has a disk shape having substantially constant dimensions in the vertical direction perpendicular to the surface.
 外周部10Bは、第1平板部10Aから、第1面10cに交差する方向である上側に突出するように延びている。ただし外周部10Bは第1平板部10Aとは別部材であり、外周部10Bは平面視において円環状の部材である。外周部10Bは平面視にて第1平板部10Aの縁部と概ね重なる大きさを有する。外周部10Bは、グリーンボール91からの後述する研磨粉などが第1面10cの外側に漏出することを防ぐために設けられている。 The outer peripheral portion 10B extends from the first flat plate portion 10A so as to project upward in the direction intersecting the first surface 10c. However, the outer peripheral portion 10B is a separate member from the first flat plate portion 10A, and the outer peripheral portion 10B is an annular member in a plan view. The outer peripheral portion 10B has a size that substantially overlaps with the edge portion of the first flat plate portion 10A in a plan view. The outer peripheral portion 10B is provided to prevent the polishing powder or the like described later from the green ball 91 from leaking to the outside of the first surface 10c.
 第1平板部10Aと外周部10Bとの間には研磨層11が挟まれている。研磨層11は、グリーンボール91に接触することによりグリーンボール91を研磨する。研磨層11は、たとえばその上側の第2定盤20に対向する表面が、第1面10cに相当する。言い換えれば研磨層11は第1面10cを含んでいる(研磨層11は第1面10cを含む領域に配置されている)。図2は、研磨層の構造を示す概略平面図である。図2を参照して、研磨層11は、たとえば砥石であってもよいが、本実施の形態においては研磨層11は、研磨粉が通過可能な格子目11aの格子状の形状を有する金網などの格子部材からなっている。なお加工装置1で研磨されるグリーンボール91は、セラミックスおよび金属のいずれかの材料の粉体からなることが好ましく、当該粉体にさらに樹脂材料が含まれてもよい。 The polishing layer 11 is sandwiched between the first flat plate portion 10A and the outer peripheral portion 10B. The polishing layer 11 polishes the green balls 91 by coming into contact with the green balls 91. For example, the surface of the polishing layer 11 facing the second surface plate 20 on the upper side corresponds to the first surface 10c. In other words, the polishing layer 11 includes the first surface 10c (the polishing layer 11 is arranged in the region including the first surface 10c). FIG. 2 is a schematic plan view showing the structure of the polishing layer. With reference to FIG. 2, the polishing layer 11 may be, for example, a grindstone, but in the present embodiment, the polishing layer 11 is a wire mesh having a grid-like shape of a grid 11a through which the polishing powder can pass. It consists of a grid member of. The green ball 91 to be polished by the processing apparatus 1 is preferably made of powder of any material of ceramics and metal, and the powder may further contain a resin material.
 第2定盤20は、たとえば鉛直方向について第1面10cに対向し、グリーンボール91に接触することによりグリーンボール91を保持する第2面20cを含んでいる。第2面20cは、概ね図1の左右方向すなわち水平方向に沿うように拡がる表面である。第2定盤20は、第2平板部20Aと、保持部20Bとを含んでいる。第2平板部20Aおよび保持部20Bはともに一般公知の鋼材などにより形成されている。第2平板部20Aは、第2定盤20を構成する主要な部材であり、第2面20cに沿うように表面が拡がっている。第2平板部20Aは、第2定盤20を構成する主要な部材であり、概ね図1の左右方向すなわち水平方向に沿うように表面が拡がっている。第2平板部20Aは、水平方向に沿う表面がたとえば円形であり、それに垂直な鉛直方向の寸法がほぼ一定な円板形状を有している。 The second surface plate 20 includes, for example, a second surface 20c that faces the first surface 10c in the vertical direction and holds the green ball 91 by coming into contact with the green ball 91. The second surface 20c is a surface that extends substantially along the left-right direction, that is, the horizontal direction in FIG. The second surface plate 20 includes a second flat plate portion 20A and a holding portion 20B. Both the second flat plate portion 20A and the holding portion 20B are formed of a generally known steel material or the like. The second flat plate portion 20A is a main member constituting the second surface plate 20, and its surface extends along the second surface 20c. The second flat plate portion 20A is a main member constituting the second surface plate 20, and its surface extends substantially along the left-right direction, that is, the horizontal direction of FIG. The second flat plate portion 20A has, for example, a circular surface along the horizontal direction, and has a disk shape having substantially constant dimensions in the vertical direction perpendicular to the surface.
 保持部20Bは、第2平板部20Aから、第2面20cに交差する方向である下側に突出するように延びている。ただし保持部20Bは第2平板部20Aとは別部材であり、保持部20Bは平面視において円環状の部材である。保持部20Bは平面視にて第2平板部20Aの縁部と概ね重なる大きさを有する。第2平板部20Aと保持部20Bとの間には他の層21が挟まれている。他の層21は、たとえばその下側の第1定盤10に対向する表面が、第2面20cに相当する。他の層21は第2面20cを含んでもよい(他の層21は第2面20cを含む領域に配置されてもよい)。他の層21は研磨層であってもよいし、研磨層でなくてもよい。つまり他の層21の材質は砥石であっても砥石でなくてもよい。図示されないが、本実施の形態においては他の層21は、研磨粉が通過可能な格子目(図2の格子目11aに相当)の格子状の形状を有する金網などの格子部材を有している。 The holding portion 20B extends from the second flat plate portion 20A so as to project downward in the direction intersecting the second surface 20c. However, the holding portion 20B is a separate member from the second flat plate portion 20A, and the holding portion 20B is an annular member in a plan view. The holding portion 20B has a size that substantially overlaps with the edge portion of the second flat plate portion 20A in a plan view. Another layer 21 is sandwiched between the second flat plate portion 20A and the holding portion 20B. The surface of the other layer 21 facing the first surface plate 10 on the lower side thereof corresponds to the second surface 20c, for example. The other layer 21 may include the second surface 20c (the other layer 21 may be arranged in the region including the second surface 20c). The other layer 21 may be a polishing layer or may not be a polishing layer. That is, the material of the other layer 21 may or may not be a grindstone. Although not shown, in the present embodiment, the other layer 21 has a grid member such as a wire mesh having a grid-like shape of a grid (corresponding to the grid 11a in FIG. 2) through which the polishing powder can pass. There is.
 図1においては、第1面10cおよび第2面20cの双方がグリーンボール91を挟むように、グリーンボール91に接触する。第1面10cは研磨層11に、第2面20cは他の層21に含まれる。また研磨されるべきグリーンボール91は、平面視における第2定盤20の保持部20Bの内部に取り囲まれる。したがって研磨されるべき複数のグリーンボール91のそれぞれは、研磨層11、他の層21および保持部20Bに囲まれるように配置される。第2定盤20は、第2平板部20Aおよび保持部20Bによりグリーンボール91を取り囲む態様により、グリーンボール91を転動および保持可能である。 In FIG. 1, both the first surface 10c and the second surface 20c come into contact with the green ball 91 so as to sandwich the green ball 91. The first surface 10c is included in the polishing layer 11, and the second surface 20c is included in the other layer 21. Further, the green ball 91 to be polished is surrounded by the inside of the holding portion 20B of the second surface plate 20 in a plan view. Therefore, each of the plurality of green balls 91 to be polished is arranged so as to be surrounded by the polishing layer 11, the other layer 21, and the holding portion 20B. The second surface plate 20 can roll and hold the green ball 91 by surrounding the green ball 91 by the second flat plate portion 20A and the holding portion 20B.
 第1面10cおよび第2面20cの少なくともいずれかは、グリーンボール91に接触することによりグリーンボール91を研磨する研磨面となっている。第1面10cは研磨層11に含まれ第2面20cは他の層21に含まれる。第1面10cおよび第2面20cの双方が研磨面となってもよいが、いずれか一方のみが研磨面であってもよい。グリーンボール91は第1面10cと第2面20cとの間において挟持される。そして、第1定盤10と第2定盤20とは複数系統の相対運動によってグリーンボール91を公転および自転させる。なお、第1定盤10および第2定盤20の複数系統の相対運動とは、たとえば第1定盤10および第2定盤20の互いに異なった軸周りの回転や、一方の定盤の回転と他方の定盤の直進との組み合わせ等である。 At least one of the first surface 10c and the second surface 20c is a polished surface for polishing the green ball 91 by coming into contact with the green ball 91. The first surface 10c is included in the polishing layer 11, and the second surface 20c is included in the other layer 21. Both the first surface 10c and the second surface 20c may be polished surfaces, but only one of them may be a polished surface. The green ball 91 is sandwiched between the first surface 10c and the second surface 20c. Then, the first surface plate 10 and the second surface plate 20 revolve and rotate the green ball 91 by a plurality of relative movements. The relative motion of the plurality of systems of the first surface plate 10 and the second surface plate 20 is, for example, the rotation of the first surface plate 10 and the second surface plate 20 around different axes, or the rotation of one of the surface plates. And the combination of the other surface plate going straight.
 図3は、図1の第2定盤を構成する各部材の固定態様の一例を示す概略拡大断面図である。図3および図1を参照して、他の層21の下側の第2面20cの一部が保持部20Bに接触し、他の層21の上側の表面が第2平板部20Aに接触している。第2平板部20Aと保持部20Bとは、両者の間に挟まれる他の層21とともに、たとえば雄ねじが形成されたねじ部材30により固定されることが好ましい。ねじ部材30の雄ねじは、図示されないナットの雌ねじと嵌合することにより、第2平板部20Aと保持部20Bとを固定してもよい。あるいは第2平板部20Aおよび保持部20Bにねじ部材30の雄ねじと嵌合する雌ねじが形成されてもよい。ねじ部材30の雄ねじが延びる部分は、格子目11aの1つを貫通するように延びることが好ましい。また図示されないが、第1定盤10においても図3と同様に、ねじ部材が、第1平板部10Aと外周部10Bと両者間の研磨層11とを互いに固定するように嵌合してもよい。また上記のようなねじ部材を用いずに他の手段により第1平板部10Aと外周部10Bと研磨層11とが互いに固定されてもよい。 FIG. 3 is a schematic enlarged cross-sectional view showing an example of a fixing mode of each member constituting the second surface plate of FIG. 1. With reference to FIGS. 3 and 1, a part of the lower second surface 20c of the other layer 21 contacts the holding portion 20B, and the upper surface of the other layer 21 contacts the second flat plate portion 20A. ing. It is preferable that the second flat plate portion 20A and the holding portion 20B are fixed together with another layer 21 sandwiched between them by, for example, a screw member 30 on which a male screw is formed. The male screw of the screw member 30 may be fitted with a female screw of a nut (not shown) to fix the second flat plate portion 20A and the holding portion 20B. Alternatively, a female screw that fits with the male screw of the screw member 30 may be formed on the second flat plate portion 20A and the holding portion 20B. The portion of the screw member 30 from which the male screw extends is preferably extended so as to penetrate one of the grids 11a. Further, although not shown, in the first surface plate 10, as in FIG. 3, even if the screw member is fitted so as to fix the first flat plate portion 10A, the outer peripheral portion 10B, and the polishing layer 11 between them to each other. good. Further, the first flat plate portion 10A, the outer peripheral portion 10B, and the polishing layer 11 may be fixed to each other by other means without using the screw member as described above.
 再度図1を参照して、第1軸12は、第1定盤10の、第2定盤20に対向する側とは反対側である図1の下側に突出するように接続されている。第1軸12の外周面には軸受13が嵌め込まれている。この軸受13は、外周部材14により保持されている。以上の構成により、第1定盤10は、第1軸12の中心軸に一致する軸αを回転軸として周方向に、たとえば図1中に矢印R1で示すように回転できる。つまり第1軸12は、第1定盤10を第1面10cの中心に交差する軸αの周りに回転させる。このため第1平板部10Aも、第1軸12周りに回転可能である。 With reference to FIG. 1 again, the first axis 12 is connected so as to project to the lower side of FIG. 1, which is the side of the first surface plate 10 opposite to the side facing the second surface plate 20. .. A bearing 13 is fitted on the outer peripheral surface of the first shaft 12. The bearing 13 is held by the outer peripheral member 14. With the above configuration, the first surface plate 10 can rotate around the axis α corresponding to the central axis of the first axis 12 in the circumferential direction, for example, as shown by an arrow R1 in FIG. That is, the first axis 12 rotates the first surface plate 10 around the axis α intersecting the center of the first surface 10c. Therefore, the first flat plate portion 10A can also rotate around the first axis 12.
 第2軸22は、第2定盤20の、第1定盤10に対向する側とは反対側である図1の上側に突出するように接続されている。第2軸22の外周面には軸受23が嵌め込まれている。この軸受23は、外周部材24により保持されている。以上の構成により、第2定盤20は、第2軸22の中心軸に一致する軸βを回転軸として周方向に、たとえば図1中に矢印R2で示すように回転できる。つまり第2軸22は、第2定盤20を第2面20cの中心に交差する軸βの周りに回転させる。このため第2平板部20Aも、第2軸22周りに回転可能である。なお軸βは軸αとは異なり、軸βは軸αに対して平行である。 The second axis 22 is connected so as to project upward in FIG. 1, which is the side opposite to the side of the second surface plate 20 facing the first surface plate 10. A bearing 23 is fitted on the outer peripheral surface of the second shaft 22. The bearing 23 is held by the outer peripheral member 24. With the above configuration, the second surface plate 20 can rotate around the axis β corresponding to the central axis of the second axis 22 in the circumferential direction, for example, as shown by an arrow R2 in FIG. That is, the second axis 22 rotates the second surface plate 20 around the axis β intersecting the center of the second surface 20c. Therefore, the second flat plate portion 20A can also rotate around the second shaft 22. Note that the axis β is different from the axis α, and the axis β is parallel to the axis α.
 図1および図3を参照して、本実施の形態の加工装置1は、弾性部材としての第1弾性部材50をさらに備えている。第1弾性部材50は、ゴム、樹脂およびスポンジのいずれかにより形成されている。第1弾性部材50は、第2定盤20の保持部20Bの内壁部に配置されている。言い換えれば、グリーンボール91を取り囲むように保持するために平面視にて円環状を有する保持部20Bの内側の壁面の少なくとも一部を覆い、内壁部の一部(最表面)である内壁面26が第1弾性部材50で構成されるように、第1弾性部材50が配置されている。このため第1弾性部材50は、第2定盤20の第2平板部20Aおよび保持部20Bに囲まれるグリーンボール91に対向するように配置されている。第1弾性部材50は、たとえば両面テープにより、保持部20Bの内側の壁面に貼り付けられている。ただし保持部20Bに第1弾性部材50が接合される手段は任意である。第1弾性部材50の厚みは、たとえば保持部20Bの厚み方向(図1の左右方向)について保持部20Bの厚みの5%以上30%以下であり、かつ1mm以上であってもよい。 With reference to FIGS. 1 and 3, the processing apparatus 1 of the present embodiment further includes a first elastic member 50 as an elastic member. The first elastic member 50 is made of any of rubber, resin and sponge. The first elastic member 50 is arranged on the inner wall portion of the holding portion 20B of the second surface plate 20. In other words, the inner wall surface 26, which covers at least a part of the inner wall surface of the holding portion 20B having an annular shape in a plan view to hold the green ball 91 so as to surround it, and is a part (outermost surface) of the inner wall portion. The first elastic member 50 is arranged so that the first elastic member 50 is composed of the first elastic member 50. Therefore, the first elastic member 50 is arranged so as to face the green ball 91 surrounded by the second flat plate portion 20A and the holding portion 20B of the second surface plate 20. The first elastic member 50 is attached to the inner wall surface of the holding portion 20B by, for example, double-sided tape. However, the means for joining the first elastic member 50 to the holding portion 20B is arbitrary. The thickness of the first elastic member 50 may be, for example, 5% or more and 30% or less of the thickness of the holding portion 20B in the thickness direction of the holding portion 20B (left-right direction in FIG. 1), and may be 1 mm or more.
 図1の加工装置1においては、第1平板部10Aの平面視における第1径Dは、第2平板部20Aの平面視における第2径dの2倍を超える寸法を有する。 In the processing apparatus 1 of FIG. 1, the first diameter D in the plan view of the first flat plate portion 10A has a dimension more than twice the second diameter d in the plan view of the second flat plate portion 20A.
 図4は、図1の加工装置に研磨粉除去機構の第1例が設置された態様を示す概略断面図である。図4を参照して、本実施の形態の第1例における加工装置1は、グリーンボール91の研磨により生じた研磨粉を研磨層11の第1面10cから除去する研磨粉除去機構としての吸引部材40を備えている。吸引部材40は、第1定盤10の第1面10c上に、第2定盤20と干渉しないように配置されている。つまり吸引部材40は、第1面10cの第2面20cを含む第2定盤20と対向する領域以外の(第2定盤20から露出した)領域(図4の第2定盤20よりも左側の領域)において第1面10cと対向するように配置されている。吸引部材40において第1面10cに対向する領域には、研磨粉を吸引するための複数の吸引孔41が形成されている。吸引部材40の内部が外部に対して減圧状態とされることにより、矢印aに沿って研磨粉を吸引部材40の内部に吸引し、研磨面である第1面10cから除去することができる。 FIG. 4 is a schematic cross-sectional view showing a mode in which the first example of the polishing powder removing mechanism is installed in the processing apparatus of FIG. With reference to FIG. 4, the processing apparatus 1 in the first example of the present embodiment is suctioned as a polishing powder removing mechanism for removing the polishing powder generated by polishing the green ball 91 from the first surface 10c of the polishing layer 11. It includes a member 40. The suction member 40 is arranged on the first surface 10c of the first surface plate 10 so as not to interfere with the second surface plate 20. That is, the suction member 40 has a region (exposed from the second surface plate 20) other than the region facing the second surface plate 20 including the second surface 20c of the first surface 10c (more than the second surface plate 20 in FIG. 4). It is arranged so as to face the first surface 10c in the area on the left side). In the region of the suction member 40 facing the first surface 10c, a plurality of suction holes 41 for sucking the polishing powder are formed. By depressurizing the inside of the suction member 40 with respect to the outside, the polishing powder can be sucked into the inside of the suction member 40 along the arrow a and removed from the first surface 10c which is the polishing surface.
 図5は、図1の加工装置に研磨粉除去機構の第2例の洗浄部材が設置された態様を示す概略断面図である。図6は、図1の加工装置に研磨粉除去機構の第2例の気体供給部材が設置された態様を示す概略断面図である。図5、図6および図1を参照して、本実施の形態の第2例における加工装置1は、基本的に図1、図4と同様であるが、研磨粉除去機構として、吸引部材40に代えて、研磨粉除去機構を構成する洗浄部材60と気体供給部材62とを備えている。洗浄部材60は、研磨面である第1面10cに洗浄液である有機溶剤を供給することにより、第1面10cを洗浄する機能を有する。より具体的には、図5を参照して、洗浄部材60は、第1面10c上に、第2定盤20と干渉しないように配置されている。つまり洗浄部材60は、第1面10cの第2面20cを含む第2定盤20と対向する領域以外の(第2定盤20から露出した)領域(図5の第2定盤20よりも左側の領域)において第1面10cと対向するように配置されている。また、洗浄部材60において第1面10cに対向する領域には、有機溶剤を吐出するための複数の吐出孔61が形成されている。そして、洗浄部材60の吐出孔61から有機溶剤が矢印bで示すように研磨層11の第1面10cに向けて吐出されることにより、研磨層11の第1面10cから研磨粉が除去される。有機溶剤としては、たとえば水を採用することができ、必要に応じて防錆剤、界面活性剤などを添加することができる。 FIG. 5 is a schematic cross-sectional view showing a mode in which the cleaning member of the second example of the polishing powder removing mechanism is installed in the processing apparatus of FIG. FIG. 6 is a schematic cross-sectional view showing a mode in which the gas supply member of the second example of the polishing powder removing mechanism is installed in the processing apparatus of FIG. With reference to FIGS. 5, 6 and 1, the processing apparatus 1 in the second example of the present embodiment is basically the same as that of FIGS. 1 and 4, but the suction member 40 is used as a polishing powder removing mechanism. Instead, the cleaning member 60 and the gas supply member 62 constituting the polishing powder removing mechanism are provided. The cleaning member 60 has a function of cleaning the first surface 10c by supplying an organic solvent as a cleaning liquid to the first surface 10c which is the polishing surface. More specifically, with reference to FIG. 5, the cleaning member 60 is arranged on the first surface 10c so as not to interfere with the second surface plate 20. That is, the cleaning member 60 has a region (exposed from the second surface plate 20) other than the region facing the second surface plate 20 including the second surface 20c of the first surface 10c (more than the second surface plate 20 in FIG. 5). It is arranged so as to face the first surface 10c in the area on the left side). Further, in the region of the cleaning member 60 facing the first surface 10c, a plurality of discharge holes 61 for discharging the organic solvent are formed. Then, the organic solvent is discharged from the discharge hole 61 of the cleaning member 60 toward the first surface 10c of the polishing layer 11 as shown by the arrow b, so that the polishing powder is removed from the first surface 10c of the polishing layer 11. Ru. As the organic solvent, for example, water can be adopted, and a rust preventive agent, a surfactant and the like can be added as needed.
 一方、気体供給部材62は、特に加工装置1において洗浄部材60とともに用いられる場合には、洗浄部材60により洗浄された研磨面である第1面10cを乾燥させる機能を有する。より具体的には、図6を参照して、気体供給部材62は、第1面10c上に、第2定盤20と干渉しないように配置されている。つまり気体供給部材62は、第1面10cの第2面20cを含む第2定盤20と対向する領域以外の(第2定盤20から露出した)領域(図5の第2定盤20よりも左側の領域)において第1面10cと対向するように配置されている。このとき、気体供給部材62は、洗浄部材60から見て第1定盤10の回転方向において後方側に配置される。また、気体供給部材62において第1面10cに対向する領域には、気体を噴射するための噴射孔63が形成されている。そして、気体供給部材62の噴射孔63から乾燥した空気などの気体が研磨層11の第1面10cに向けて吹き付けられることにより、有機溶剤などの洗浄液で濡れた第1面10cを乾燥させることができる。 On the other hand, the gas supply member 62 has a function of drying the first surface 10c, which is the polished surface cleaned by the cleaning member 60, particularly when used together with the cleaning member 60 in the processing device 1. More specifically, with reference to FIG. 6, the gas supply member 62 is arranged on the first surface 10c so as not to interfere with the second surface plate 20. That is, the gas supply member 62 has a region (exposed from the second surface plate 20) other than the region facing the second surface plate 20 including the second surface 20c of the first surface 10c (from the second surface plate 20 in FIG. 5). Is arranged so as to face the first surface 10c in the area on the left side). At this time, the gas supply member 62 is arranged on the rear side in the rotation direction of the first surface plate 10 when viewed from the cleaning member 60. Further, in the region of the gas supply member 62 facing the first surface 10c, an injection hole 63 for injecting gas is formed. Then, a gas such as dried air is sprayed from the injection hole 63 of the gas supply member 62 toward the first surface 10c of the polishing layer 11 to dry the first surface 10c wet with a cleaning liquid such as an organic solvent. Can be done.
 なお本実施の形態の第2例における加工装置1は、洗浄部材60と気体供給部材62との双方を備えてもよいが、洗浄部材60および気体供給部材62のいずれか一方のみ備えてもよい。また上記の気体供給部材62は、洗浄部材60とともに用いられるか否かにかかわらず、圧縮空気を研磨層11の第1面10cに向けて吹き付ける態様である。気体供給部材62は、圧縮空気の供給により、第1面10cに付着した研磨粉を吹き飛ばし除去することができる。 The processing apparatus 1 in the second example of the present embodiment may include both the cleaning member 60 and the gas supply member 62, but may include only one of the cleaning member 60 and the gas supply member 62. .. Further, the gas supply member 62 is an embodiment in which compressed air is blown toward the first surface 10c of the polishing layer 11 regardless of whether or not it is used together with the cleaning member 60. The gas supply member 62 can blow off and remove the polishing powder adhering to the first surface 10c by supplying compressed air.
 次に、加工装置1を用いたグリーンボール91の研磨方法について説明する。図1を参照して、まず、原料粉末が球状に成形されて作製された複数のグリーンボール91が、加工装置1の第1定盤10と第2定盤20との間に供給される。このとき、図1を参照して、第1定盤10は軸αを回転軸として回転するとともに、第2定盤20は軸βを回転軸として回転する。つまり、第1定盤10および第2定盤20においては、複数系統の相対運動が達成される。これにより、グリーンボール91は自転するとともに、第2定盤20の保持部22の内壁面26に沿って公転する。 Next, a method of polishing the green ball 91 using the processing device 1 will be described. With reference to FIG. 1, first, a plurality of green balls 91 produced by forming the raw material powder into a spherical shape are supplied between the first surface plate 10 and the second surface plate 20 of the processing apparatus 1. At this time, referring to FIG. 1, the first surface plate 10 rotates with the axis α as the rotation axis, and the second surface plate 20 rotates with the axis β as the rotation axis. That is, in the first surface plate 10 and the second surface plate 20, a plurality of systems of relative motion are achieved. As a result, the green ball 91 rotates on its axis and revolves along the inner wall surface 26 of the holding portion 22 of the second surface plate 20.
 つまり、本実施の形態における加工装置1においては、第1面10cがグリーンボール91に接触することによりグリーンボールを研磨する研磨面となっている。また、グリーンボール91は第1面10cと第2面20cとの間において挟持される。さらに、第1定盤10と第2定盤20とは複数系統の相対運動(ここでは、異なった軸周りの回転運動)によってグリーンボール91を公転および自転させる。そのため、グリーンボール91は自転軸を変化させつつ自転する。また、第1面10cが研磨面となっているため、当該自転によってグリーンボール91は突出部が優先的に加工されるとともに、その表面全域にわたって研磨される。その結果、グリーンボール91は、加工装置1による研磨によって効率よく真球に近づく。第2面20cも研磨面となっていてもよい。 That is, in the processing apparatus 1 according to the present embodiment, the first surface 10c is a polished surface for polishing the green ball by contacting the green ball 91. Further, the green ball 91 is sandwiched between the first surface 10c and the second surface 20c. Further, the first surface plate 10 and the second surface plate 20 revolve and rotate the green ball 91 by a plurality of systems of relative motion (here, rotational motion around different axes). Therefore, the green ball 91 rotates while changing its rotation axis. Further, since the first surface 10c is a polished surface, the protruding portion of the green ball 91 is preferentially processed by the rotation, and the green ball 91 is polished over the entire surface thereof. As a result, the green ball 91 efficiently approaches a true sphere by polishing by the processing device 1. The second surface 20c may also be a polished surface.
 次に、本実施の形態の作用効果について説明する。
 本開示に従った加工装置1は、第1部材としての第1定盤10と、第1軸12と、保持部20Bを含む第2部材としての第2定盤20と、第2軸22と、研磨層11と、弾性部材としての第1弾性部材50とを備える。第1定盤10はグリーンボール91に接触することによりグリーンボール91を保持する第1面10cを含む。第1軸12は第1定盤10を第1面10cの中心に交差する軸α周りに回転させる。第2定盤20は第1面10cに対向し、グリーンボール91に接触することによりグリーンボール91を保持する第2面20cを含むとともに、第2面20cに交差する方向に突出するように延び第1面10cおよび第2面20cの間に挟持されるグリーンボール91を取り囲む保持部20Bを含む。第2軸22は第2定盤20を第2面20cの中心に交差する軸β周りに回転させる。研磨層11は第1面10cおよび第2面20cの少なくともいずれかを含み、グリーンボール91に接触することによりグリーンボール91を研磨する。第1弾性部材50は、第2定盤20の保持部20Bの内壁部に配置される。
Next, the action and effect of this embodiment will be described.
The processing apparatus 1 according to the present disclosure includes a first surface plate 10 as a first member, a first shaft 12, a second surface plate 20 as a second member including a holding portion 20B, and a second shaft 22. A polishing layer 11 and a first elastic member 50 as an elastic member are provided. The first surface plate 10 includes a first surface 10c that holds the green ball 91 by coming into contact with the green ball 91. The first axis 12 rotates the first surface plate 10 around the axis α intersecting the center of the first surface 10c. The second surface plate 20 faces the first surface 10c, includes a second surface 20c that holds the green ball 91 by contacting the green ball 91, and extends so as to project in a direction intersecting the second surface 20c. The holding portion 20B surrounding the green ball 91 sandwiched between the first surface 10c and the second surface 20c is included. The second axis 22 rotates the second surface plate 20 around the axis β intersecting the center of the second surface 20c. The polishing layer 11 includes at least one of the first surface 10c and the second surface 20c, and polishes the green ball 91 by contacting with the green ball 91. The first elastic member 50 is arranged on the inner wall portion of the holding portion 20B of the second surface plate 20.
 第1面10cを含む第1部材としての第1定盤10と、第1面10cに対向する第2面20cを含む第2部材としての第2定盤20との間に複数個のグリーンボール91が挟持され、両定盤の対向平面に沿う複数系統の相対移動が行なわれる。これにより、グリーンボール91を真球に近い形状に研磨できる。なお本実施の形態では、第1面10cが研磨層11(研磨加工用の粗面を有する層)の一部であるとしている。これについて、図1などに示すように第1面10cと第2面20cとの双方が研磨層(研磨加工用の粗面を有する層)の一部であってもよい。あるいは第1面10cおよび第2面20cのいずれか一方のみが研磨層の一部であってもよい。 A plurality of green balls between the first surface plate 10 as the first member including the first surface 10c and the second surface plate 20 as the second member including the second surface 20c facing the first surface 10c. The 91 is sandwiched, and the relative movement of a plurality of systems along the facing planes of both surface plates is performed. As a result, the green ball 91 can be polished into a shape close to a true sphere. In this embodiment, it is assumed that the first surface 10c is a part of the polishing layer 11 (a layer having a rough surface for polishing). Regarding this, as shown in FIG. 1 and the like, both the first surface 10c and the second surface 20c may be a part of a polishing layer (a layer having a rough surface for polishing processing). Alternatively, only one of the first surface 10c and the second surface 20c may be a part of the polishing layer.
 複数のグリーンボール91は、図1などに示される保持部20Bに隣接する領域に限らず、実際には研磨層11、他の層21および保持部20Bに囲まれる領域の平面視での中央部にも存在する。当該中央部のグリーンボール91は、外側すなわち保持部20B側へ移動する際に、保持部20Bに衝突することがある。グリーンボール91は非常に割れやすい材質からなるため、上記衝突時に割れや欠陥が生じる可能性がある。そこで本実施の形態のように、第2定盤20のグリーンボール91を取り囲む壁部に存在する保持部20Bの内壁部(内壁面26)には、柔らかい第1弾性部材50が配置される。これにより、平面視での内側から外側へ移動したグリーンボール91が内壁面26に衝突した際の、グリーンボール91が割れる不具合を抑制できる。 The plurality of green balls 91 are not limited to the region adjacent to the holding portion 20B shown in FIG. 1 and the like, but are actually the central portion of the region surrounded by the polishing layer 11, the other layers 21 and the holding portion 20B in a plan view. Also exists. The green ball 91 in the central portion may collide with the holding portion 20B when moving to the outside, that is, toward the holding portion 20B. Since the green ball 91 is made of a material that is very fragile, cracks and defects may occur at the time of the collision. Therefore, as in the present embodiment, the soft first elastic member 50 is arranged on the inner wall portion (inner wall surface 26) of the holding portion 20B existing on the wall portion surrounding the green ball 91 of the second surface plate 20. As a result, it is possible to prevent the green ball 91 from cracking when the green ball 91 that has moved from the inside to the outside in a plan view collides with the inner wall surface 26.
 上記加工装置1において、第1定盤10は、第1面10cに沿うように拡がり第1軸12周りに回転可能な第1平板部10Aをさらに含む。第2定盤20は、第2面20cに沿うように拡がり第2軸22周りに回転可能な第2平板部20Aをさらに含む。このような構成であってもよい。 In the processing apparatus 1, the first surface plate 10 further includes a first flat plate portion 10A that extends along the first surface 10c and is rotatable around the first axis 12. The second surface plate 20 further includes a second flat plate portion 20A that extends along the second surface 20c and is rotatable around the second axis 22. Such a configuration may be used.
 第1軸12周りに回転可能な第1平板部10Aおよび第2軸22周りに回転可能な第2平板部20Aにより、両者間(第1面10cと第2面20cとの間)にグリーンボール91を挟持し、グリーンボール91に公転と各種方向の自転とを行なわせながらグリーンボール91を真球に近い形状に研磨できる。 A green ball between the two (between the first surface 10c and the second surface 20c) is provided by the first flat plate portion 10A that can rotate around the first axis 12 and the second flat plate portion 20A that can rotate around the second axis 22. The green ball 91 can be polished into a shape close to a true sphere while sandwiching the 91 and causing the green ball 91 to revolve and rotate in various directions.
 上記加工装置1は、グリーンボール91の研磨により生じた研磨粉を研磨層11から除去する研磨粉除去機構(吸引部材40、洗浄部材60および気体供給部材62の少なくともいずれか)をさらに備える。研磨粉除去機構は、第1面10cの第2定盤20と対向する領域以外の領域において第1面10cと対向するように配置される。このような構成であってもよい。 The processing device 1 further includes a polishing powder removing mechanism (at least one of a suction member 40, a cleaning member 60, and a gas supply member 62) that removes polishing powder generated by polishing the green ball 91 from the polishing layer 11. The polishing powder removing mechanism is arranged so as to face the first surface 10c in a region other than the region of the first surface 10c facing the second surface plate 20. Such a configuration may be used.
 グリーンボール91の研磨により研磨粉が生じるが、特に加工の初期においては研磨粉は大きな粒としてグリーンボール91から剥がれ、第1面10c上などに付着する。このような大きな粒が第1面10c上などに付着したまま放置されれば、研磨が進むにつれ研磨粉は第1面10c上の同じ場所に蓄積されていく。第2定盤20はβ周りに回転するが、平面視での第1定盤10に対する相対位置は変化しないために、たとえ第1定盤10が回転しても第1定盤10上の同じ場所(グリーンボール91の真下など)で研磨粉が形成されるためである。第1面10c上に研磨粉が多数蓄積されたままの状態でグリーンボール91の研磨が続行されると、グリーンボール91の表面は大きな研磨粉により割れや傷などの破損を起こす。またグリーンボール91の表面の研磨ができなくなり、研磨加工の精度が低下する。そこで本実施の形態に係る加工装置1は、研磨粉除去機構を構成する吸引部材40を備えており、研磨面である第1面10cの目詰まりが抑制されて研磨効率の低下が抑えられるため、上記効率のよい研磨加工を長期間にわたって維持することができる。このように、本実施の形態における加工装置1は、研磨効率の低下を抑制し、効率よくグリーンボールの研磨を実施することが可能なグリーンボール91の研磨装置となっている。 Polishing of the green ball 91 produces polishing powder, but especially in the initial stage of processing, the polishing powder is peeled off from the green ball 91 as large particles and adheres to the first surface 10c or the like. If such large particles are left attached to the first surface 10c or the like, the polishing powder will be accumulated in the same place on the first surface 10c as the polishing progresses. The second surface plate 20 rotates around β, but the relative position with respect to the first surface plate 10 in a plan view does not change, so even if the first surface plate 10 rotates, it is the same on the first surface plate 10. This is because the polishing powder is formed at a place (such as directly under the green ball 91). If the polishing of the green ball 91 is continued with a large amount of polishing powder accumulated on the first surface 10c, the surface of the green ball 91 is damaged such as cracks and scratches due to the large polishing powder. Further, the surface of the green ball 91 cannot be polished, and the accuracy of the polishing process is lowered. Therefore, the processing apparatus 1 according to the present embodiment is provided with a suction member 40 constituting a polishing powder removing mechanism, and clogging of the first surface 10c, which is the polishing surface, is suppressed and a decrease in polishing efficiency is suppressed. , The efficient polishing process can be maintained for a long period of time. As described above, the processing device 1 in the present embodiment is a polishing device for the green ball 91 capable of suppressing a decrease in polishing efficiency and efficiently polishing the green ball.
 上記加工装置1は、第1平板部10Aの平面視における第1径Dが、第2平板部20Aの平面視における第2径dの2倍を超える寸法を有してもよい。たとえば図1の加工装置1において第1定盤10が軸α周りに回転すれば、第1定盤10の第1面10cのうち第2定盤20と重ならず露出した領域が変化する。この第1面10cのうち第2定盤20と重なる領域が研磨により研磨粉が付着した後、第1定盤10の軸α周りの回転により当該領域が第2定盤20と重ならず露出した領域となることで、研磨粉除去機構により研磨粉が除去される。第1径Dが第2径dに比べて十分に大きい、すなわちたとえばDがdの2倍を超える寸法であることにより、第1径Dが第2径dに比べて十分に大きくない場合に比べて、第1面10cが第2定盤20と重ならず露出し、付着または蓄積された研磨粉を除去できる面積および時間の割合が増加する。このため研磨粉除去機構を用いて研磨粉を除去する効果が高められる。 The processing apparatus 1 may have a dimension in which the first diameter D of the first flat plate portion 10A in a plan view is more than twice the second diameter d in a plan view of the second flat plate portion 20A. For example, in the processing apparatus 1 of FIG. 1, when the first surface plate 10 rotates around the axis α, the exposed region of the first surface 10c of the first surface plate 10 that does not overlap with the second surface plate 20 changes. After the polishing powder adheres to the region of the first surface 10c that overlaps with the second surface plate 20, the region is exposed without overlapping with the second surface plate 20 due to the rotation of the first surface plate 10 around the axis α. The polishing powder is removed by the polishing powder removing mechanism. When the first diameter D is sufficiently larger than the second diameter d, that is, the first diameter D is not sufficiently larger than the second diameter d, for example, because D has a dimension more than twice d. In comparison, the first surface 10c is exposed without overlapping with the second surface plate 20, and the ratio of the area and time during which the adhering or accumulated polishing powder can be removed increases. Therefore, the effect of removing the polishing powder by using the polishing powder removing mechanism is enhanced.
 上記の加工装置1における第1弾性部材50は、ゴム、樹脂およびスポンジのいずれかであってもよい。これにより、グリーンボール91が第1弾性部材50に衝突したときにグリーンボール91に加わる応力集中を防止し、グリーンボール91の割れを抑制できる。 The first elastic member 50 in the above processing apparatus 1 may be any of rubber, resin and sponge. As a result, stress concentration applied to the green ball 91 when the green ball 91 collides with the first elastic member 50 can be prevented, and cracking of the green ball 91 can be suppressed.
 (実施の形態2)
 図7は、実施の形態2に係る加工装置の構造を示す概略断面図である。図7および図1を参照して、実施の形態2におけるグリーンボールの研磨装置としての加工装置1は、基本的には実施の形態1における加工装置1と同様の構造を有し、同様に動作するとともに、同様の効果を奏する。しかし、実施の形態2における加工装置1は、第1平板部10Aと第1面10cとの間に、弾性部材としての第2弾性部材51がさらに配置される。この点において本実施の形態は、弾性部材として第1弾性部材50のみを備える実施の形態1の場合とは異なっている。第2弾性部材51は第1弾性部材50と同一の材質である。第2弾性部材51は、第1平板部10Aの第2定盤20側(図7の上側)の表面上にたとえば両面テープにより貼り付けられてもよい。ただし第2弾性部材51は両面テープなどの接合手段を用いずに第1平板部10Aの表面上に敷設されるのみであってもよい。第1平板部10Aと第1面10cとの間の第2弾性部材51の厚みは、たとえば第1平板部10Aの厚み方向(図7の上下方向)について第1平板部10Aの厚みの5%以上30%以下であり、かつ1mm以上であってもよい。
(Embodiment 2)
FIG. 7 is a schematic cross-sectional view showing the structure of the processing apparatus according to the second embodiment. With reference to FIGS. 7 and 1, the processing apparatus 1 as the green ball polishing apparatus according to the second embodiment basically has the same structure as the processing apparatus 1 according to the first embodiment, and operates in the same manner. At the same time, it has the same effect. However, in the processing apparatus 1 according to the second embodiment, the second elastic member 51 as an elastic member is further arranged between the first flat plate portion 10A and the first surface 10c. In this respect, the present embodiment is different from the case of the first embodiment in which only the first elastic member 50 is provided as the elastic member. The second elastic member 51 is made of the same material as the first elastic member 50. The second elastic member 51 may be attached to the surface of the first flat plate portion 10A on the second surface plate 20 side (upper side in FIG. 7) by, for example, double-sided tape. However, the second elastic member 51 may be simply laid on the surface of the first flat plate portion 10A without using a joining means such as double-sided tape. The thickness of the second elastic member 51 between the first flat plate portion 10A and the first surface 10c is, for example, 5% of the thickness of the first flat plate portion 10A in the thickness direction of the first flat plate portion 10A (vertical direction in FIG. 7). It may be 30% or more and 1 mm or more.
 グリーンボール91の研磨加工の特に初期においては、複数のグリーンボール91の間のサイズの差が大きい。このため特に加工初期において、直径の比較的大きいグリーンボール91が硬い第1平板部10Aに直接接することにより割れやすくなるおそれがある。上記のように柔らかい第2弾性部材51を設ければ、グリーンボール91がその第1定盤10側(図7での下側)において定盤に衝突することによりグリーンボール91に加わる応力の集中が抑制され、グリーンボール91の割れが抑制できる。なお第2定盤20よりも下側の第1定盤10の第1平板部10Aと第1面10cとの間に第2弾性部材51を設ければ、後述の実施例に示すように、特にグリーンボール91への傷などの形成を抑制する効果が高められる。 Especially in the initial stage of polishing the green balls 91, the size difference between the plurality of green balls 91 is large. Therefore, especially at the initial stage of processing, the green ball 91 having a relatively large diameter may be easily cracked by directly contacting the hard first flat plate portion 10A. If the soft second elastic member 51 is provided as described above, the stress applied to the green ball 91 due to the green ball 91 colliding with the surface plate on the first surface plate 10 side (lower side in FIG. 7) is concentrated. Can be suppressed and cracking of the green ball 91 can be suppressed. If the second elastic member 51 is provided between the first flat plate portion 10A and the first surface 10c of the first surface plate 10 below the second surface plate 20, as shown in Examples described later, if the second elastic member 51 is provided. In particular, the effect of suppressing the formation of scratches on the green ball 91 is enhanced.
 (実施の形態3)
 図8は、実施の形態3に係る加工装置の構造を示す概略断面図である。図8および図1を参照して、実施の形態3におけるグリーンボールの研磨装置としての加工装置1は、基本的には実施の形態1における加工装置1と同様の構造を有し、同様に動作するとともに、同様の効果を奏する。しかし、実施の形態3における加工装置1は、第2平板部20Aと第2面20cとの間に、弾性部材としての第3弾性部材52がさらに配置される。この点において本実施の形態は実施の形態1の場合とは異なっている。第3弾性部材52は第1弾性部材50と同一の材質である。第3弾性部材52は、第2平板部20Aの第1定盤10側(図8の下側)の表面上に、たとえば両面テープにより貼り付けられてもよいが、その接合手段は任意である。第2平板部20Aと第2面20cとの間の第3弾性部材52の厚みは、たとえば第2平板部20Aの厚み方向(図8の上下方向)について第2平板部20Aの厚みの5%以上30%以下であり、かつ1mm以上であってもよい。
(Embodiment 3)
FIG. 8 is a schematic cross-sectional view showing the structure of the processing apparatus according to the third embodiment. With reference to FIGS. 8 and 1, the processing apparatus 1 as the green ball polishing apparatus according to the third embodiment basically has the same structure as the processing apparatus 1 according to the first embodiment, and operates in the same manner. At the same time, it has the same effect. However, in the processing apparatus 1 according to the third embodiment, the third elastic member 52 as an elastic member is further arranged between the second flat plate portion 20A and the second surface 20c. In this respect, the present embodiment is different from the case of the first embodiment. The third elastic member 52 is made of the same material as the first elastic member 50. The third elastic member 52 may be attached on the surface of the first surface plate 10 side (lower side of FIG. 8) of the second flat plate portion 20A by, for example, double-sided tape, but the joining means thereof is arbitrary. .. The thickness of the third elastic member 52 between the second flat plate portion 20A and the second surface 20c is, for example, 5% of the thickness of the second flat plate portion 20A in the thickness direction of the second flat plate portion 20A (vertical direction in FIG. 8). It may be 30% or more and 1 mm or more.
 グリーンボール91の研磨加工の特に初期においては、複数のグリーンボール91の間のサイズの差が大きい。このため特に加工初期において、直径の比較的大きいグリーンボール91が硬い第2平板部20Aに直接接することにより割れやすくなるおそれがある。上記のように第3弾性部材52を設ければ、グリーンボール91がその第2定盤20側(図8での上側)において定盤に衝突することによりグリーンボール91に加わる応力の集中が抑制され、グリーンボール91の割れが抑制できる。 Especially in the initial stage of polishing the green balls 91, the size difference between the plurality of green balls 91 is large. Therefore, especially at the initial stage of processing, the green ball 91 having a relatively large diameter may be easily cracked by directly contacting the hard second flat plate portion 20A. If the third elastic member 52 is provided as described above, the concentration of stress applied to the green ball 91 is suppressed by the green ball 91 colliding with the surface plate on the second surface plate 20 side (upper side in FIG. 8). Therefore, cracking of the green ball 91 can be suppressed.
 (実施の形態4)
 図9は、実施の形態4に係る加工装置の構造を示す概略断面図である。図9および図1を参照して、実施の形態4におけるグリーンボールの研磨装置としての加工装置1は、基本的には実施の形態2,3における加工装置1と同様の構造を有し、同様に動作するとともに、同様の効果を奏する。しかし、実施の形態4における加工装置1は、図7に示す第1平板部10Aと第1面10cとの間の第2弾性部材51と、図8に示す第2平板部20Aと第2面20cとの間の第3弾性部材52との双方を有している。このような構成であってもよい。保持部20Bの内壁部と、第1平板部10Aと第1面10cとの間と、第2平板部20Aと第2面20cとの間との3か所に弾性部材が設けられることにより、グリーンボール91の割れなどによる加工精度の低下をより確実に抑制できる。
(Embodiment 4)
FIG. 9 is a schematic cross-sectional view showing the structure of the processing apparatus according to the fourth embodiment. With reference to FIGS. 9 and 1, the processing apparatus 1 as the green ball polishing apparatus according to the fourth embodiment basically has the same structure as the processing apparatus 1 according to the second and third embodiments, and has the same structure. It works in the same way and has the same effect. However, the processing apparatus 1 in the fourth embodiment has a second elastic member 51 between the first flat plate portion 10A and the first surface 10c shown in FIG. 7, and the second flat plate portion 20A and the second surface shown in FIG. It has both a third elastic member 52 and 20c. Such a configuration may be used. Elastic members are provided at three locations between the inner wall portion of the holding portion 20B, between the first flat plate portion 10A and the first surface 10c, and between the second flat plate portion 20A and the second surface 20c. It is possible to more reliably suppress a decrease in processing accuracy due to cracking of the green ball 91 or the like.
 (実施の形態5)
 図10は、実施の形態5に係る加工装置の構造を示す概略断面図である。図10および図1を参照して、実施の形態5におけるグリーンボールの研磨装置としての加工装置1は、基本的には実施の形態1における加工装置1と同様の構造を有し、同様に動作するとともに、同様の効果を奏する。しかし、実施の形態5の加工装置1においては、第1平板部10Aの平面視における第1径Dは、第2平板部20Aの平面視における第2径dの3倍の寸法を有する。すなわち実施の形態1に比べてDのdに対する割合が大きい。
(Embodiment 5)
FIG. 10 is a schematic cross-sectional view showing the structure of the processing apparatus according to the fifth embodiment. With reference to FIGS. 10 and 1, the processing apparatus 1 as the green ball polishing apparatus according to the fifth embodiment basically has the same structure as the processing apparatus 1 according to the first embodiment, and operates in the same manner. At the same time, it has the same effect. However, in the processing apparatus 1 of the fifth embodiment, the first diameter D in the plan view of the first flat plate portion 10A has a dimension three times as large as the second diameter d in the plan view of the second flat plate portion 20A. That is, the ratio of D to d is larger than that of the first embodiment.
 このようにすれば、実施の形態1に比べて、第1面10c全体のうち、第2定盤20と重ならず露出し、付着または蓄積された研磨粉を除去できる面積および時間の割合がいっそう増加する。このため研磨粉除去機構を用いて研磨粉を除去する効果がいっそう高められる。研磨粉除去機構を用いて第1面10c上の研磨粉を除去する効率と、より多数のグリーンボール91を同時に加工する効率とを兼ね合わせ考慮すれば、第1径Dは第2径dの2倍を超え3倍以下であることが好ましい。 By doing so, as compared with the first embodiment, the ratio of the area and the time during which the polishing powder that is exposed without overlapping with the second surface plate 20 and adhered or accumulated can be removed from the entire first surface 10c is It will increase further. Therefore, the effect of removing the polishing powder by using the polishing powder removing mechanism is further enhanced. Considering the efficiency of removing the polishing powder on the first surface 10c using the polishing powder removing mechanism and the efficiency of processing a larger number of green balls 91 at the same time, the first diameter D is the second diameter d. It is preferably more than 2 times and 3 times or less.
 なお図10においては、第2定盤20の全体が、第1定盤10の平面視の中心である軸αよりも右側の領域に収まっている。実施の形態1~4においてもこれと同様の態様であってもよい。すなわち実施の形態1~4においても実施の形態5(図10)と同様に、第2定盤20の左側の端部を含むその全体が、第1定盤10の平面視の中心である軸αよりも右側の領域に収まってもよい。 Note that in FIG. 10, the entire second surface plate 20 is contained in the region on the right side of the axis α, which is the center of the plan view of the first surface plate 10. The same embodiment may be used in the first to fourth embodiments. That is, in the first to fourth embodiments, as in the fifth embodiment (FIG. 10), the entire axis including the left end of the second surface plate 20 is the center of the plan view of the first surface plate 10. It may fit in the area on the right side of α.
 (実施の形態6)
 以上のほか、本実施の形態の加工装置1は、特に第2定盤20の保持部20Bの内壁部に配置される第1弾性部材50の断面形状において、以下の各変形例のような態様を有してもよい。
(Embodiment 6)
In addition to the above, the processing apparatus 1 of the present embodiment has the following modifications in the cross-sectional shape of the first elastic member 50 arranged on the inner wall portion of the holding portion 20B of the second surface plate 20. May have.
 図11は、実施の形態6の第1例に係る加工装置の構造を示す概略断面図である。図11および図1を参照して、本実施の形態の第1例における加工装置1は、基本的には実施の形態1における加工装置1と同様の構造を有し、同様に動作するとともに、同様の効果を奏する。しかし、実施の形態6の第1例における加工装置1は、保持部20Bの内壁部の第1弾性部材50が、その厚み方向(図11の左右方向)について複数層、積層された構成を有している。図11においては2層の第1弾性部材50として第1弾性部材50Aおよび第1弾性部材50Bが積層されているが、層の数は3層以上の任意の数であってもよい。このようにすれば、たとえば当該弾性部材50が劣化し交換する際に、最もグリーンボール91に接触する機会が多く劣化しやすい最も内側(グリーンボール91に対向する側)の層の第1弾性部材50Aのみを交換することができる。これにより第1弾性部材50の交換量を減らすことができ、第1弾性部材50の交換コストを削減できる。 FIG. 11 is a schematic cross-sectional view showing the structure of the processing apparatus according to the first example of the sixth embodiment. With reference to FIGS. 11 and 1, the processing apparatus 1 in the first example of the present embodiment basically has the same structure as the processing apparatus 1 in the first embodiment, operates in the same manner, and has the same operation. It has the same effect. However, the processing apparatus 1 in the first example of the sixth embodiment has a configuration in which the first elastic member 50 of the inner wall portion of the holding portion 20B is laminated in a plurality of layers in the thickness direction (left-right direction in FIG. 11). is doing. In FIG. 11, the first elastic member 50A and the first elastic member 50B are laminated as the two layers of the first elastic member 50, but the number of layers may be any number of three or more. By doing so, for example, when the elastic member 50 deteriorates and is replaced, the first elastic member of the innermost layer (the side facing the green ball 91) that has the most chance of coming into contact with the green ball 91 and is likely to deteriorate. Only 50A can be replaced. As a result, the replacement amount of the first elastic member 50 can be reduced, and the replacement cost of the first elastic member 50 can be reduced.
 図12は、実施の形態6の第2例に係る加工装置の構造を示す概略断面図である。図12および図1を参照して、本実施の形態の第2例における加工装置1は、基本的には実施の形態1における加工装置1と同様の構造を有し、同様に動作するとともに、同様の効果を奏する。しかし、実施の形態6の第2例における加工装置1は、保持部20Bの内壁部の第1弾性部材50が、その最表面である内壁面26において、鉛直方向に対して傾斜している。その結果、図12においては、第1弾性部材50の厚み(図12の第1面10cに沿う左右方向の寸法)が、第1定盤10側(図12の下側)において小さく、第1定盤10と反対側(図12の上側)において大きい。内壁面26が平面であれば、図12の断面図において第1弾性部材50は台形状となる。また上記とは逆に、第1弾性部材50の厚みは第1定盤10側(図12の下側)において大きく、第1定盤10と反対側(図12の上側)において小さくてもよい。このようにすれば、グリーンボール91が当該第1弾性部材50の傾斜した内壁面26に衝突する際に、単位面積当たりの衝突力を小さくすることができる。このため内壁面26が鉛直方向に沿って延びる場合に比べていっそうグリーンボール91に加わる応力を小さくでき、グリーンボール91の割れなどの不具合を確実に抑制できる。 FIG. 12 is a schematic cross-sectional view showing the structure of the processing apparatus according to the second example of the sixth embodiment. With reference to FIGS. 12 and 1, the processing apparatus 1 in the second example of the present embodiment basically has the same structure as the processing apparatus 1 in the first embodiment, operates in the same manner, and has the same operation. It has the same effect. However, in the processing device 1 in the second example of the sixth embodiment, the first elastic member 50 of the inner wall portion of the holding portion 20B is inclined with respect to the vertical direction on the inner wall surface 26 which is the outermost surface thereof. As a result, in FIG. 12, the thickness of the first elastic member 50 (dimensions in the left-right direction along the first surface 10c of FIG. 12) is small on the first surface plate 10 side (lower side of FIG. 12), and the first It is large on the side opposite to the surface plate 10 (upper side in FIG. 12). If the inner wall surface 26 is a flat surface, the first elastic member 50 has a trapezoidal shape in the cross-sectional view of FIG. Contrary to the above, the thickness of the first elastic member 50 may be large on the side of the first surface plate 10 (lower side of FIG. 12) and smaller on the side opposite to the first surface plate 10 (upper side of FIG. 12). .. By doing so, when the green ball 91 collides with the inclined inner wall surface 26 of the first elastic member 50, the collision force per unit area can be reduced. Therefore, the stress applied to the green ball 91 can be further reduced as compared with the case where the inner wall surface 26 extends along the vertical direction, and defects such as cracking of the green ball 91 can be reliably suppressed.
 図13は、実施の形態6の第3例に係る加工装置の構造を示す概略断面図である。図13および図1を参照して、本実施の形態の第3例における加工装置1は、基本的には実施の形態1における加工装置1と同様の構造を有し、同様に動作するとともに、同様の効果を奏する。しかし、実施の形態6の第3例における加工装置1は、保持部20Bの内壁部の第1弾性部材50の最表面である内壁面26が曲面状になっている。第1弾性部材50は、図13においては第1面10cと第2面20cとが対向する上下方向の中央において上下方向の端部に比べて第1面10cに沿う左右方向の厚みが小さくなるように湾曲した断面形状を有している。このため図13の第1弾性部材50は、そのグリーンボール91と対向する面が、グリーンボール91の球面に近い表面に沿うように、球面の一部に近い形状を有している。しかしこのような態様に限らず、たとえば図示されないが、第1弾性部材50は上下方向の中央において上下方向の端部に比べて左右方向の厚みが大きくなるように湾曲した断面形状であってもよい。このようにすれば、グリーンボール91が当該第1弾性部材50の湾曲した内壁面26に衝突する際に、内壁面26が平面である場合に比べて、単位面積当たりの衝突力を小さくすることができる。このためいっそうグリーンボール91に加わる応力を小さくでき、グリーンボール91の割れなどの不具合を確実に抑制できる。 FIG. 13 is a schematic cross-sectional view showing the structure of the processing apparatus according to the third example of the sixth embodiment. With reference to FIGS. 13 and 1, the processing apparatus 1 in the third example of the present embodiment basically has the same structure as the processing apparatus 1 in the first embodiment, operates in the same manner, and has the same operation. It has the same effect. However, in the processing device 1 in the third example of the sixth embodiment, the inner wall surface 26, which is the outermost surface of the first elastic member 50 of the inner wall portion of the holding portion 20B, has a curved surface shape. In FIG. 13, the thickness of the first elastic member 50 in the horizontal direction along the first surface 10c is smaller in the center of the vertical direction in which the first surface 10c and the second surface 20c face each other than the end portion in the vertical direction. It has a curved cross-sectional shape. Therefore, the first elastic member 50 of FIG. 13 has a shape close to a part of the spherical surface so that the surface facing the green ball 91 follows the surface of the green ball 91 close to the spherical surface. However, the present invention is not limited to such an aspect, and for example, although not shown, the first elastic member 50 may have a curved cross-sectional shape so that the thickness in the left-right direction is larger than that of the end portion in the up-down direction at the center in the up-down direction. good. By doing so, when the green ball 91 collides with the curved inner wall surface 26 of the first elastic member 50, the collision force per unit area is reduced as compared with the case where the inner wall surface 26 is a flat surface. Can be done. Therefore, the stress applied to the green ball 91 can be further reduced, and defects such as cracking of the green ball 91 can be reliably suppressed.
 図14は、実施の形態1~6のいずれかに係る加工装置により形成されたグリーンボールを焼結して得られるセラミックス球を備える転がり軸受の一例を示す概略断面図である。図14を参照して、転がり軸受2は、図1、図4~図13のいずれかに示す(上記の各実施の形態(の各例)のいずれかとしての)加工装置1を用いて研磨されたグリーンボール91を焼結して得られる焼結体であるセラミックス球4を転動体として備える玉軸受である。図14の転がり軸受2は図14の転がり軸受はラジアル玉軸受であるが、スラスト玉軸受であってもよい。また当該転がり軸受(ラジアル玉軸受)は深溝玉軸受であってもよいが、アンギュラ玉軸受および自動調心玉軸受のいずれかであってもよい。 FIG. 14 is a schematic cross-sectional view showing an example of a rolling bearing provided with a ceramic ball obtained by sintering a green ball formed by the processing apparatus according to any one of the first to sixth embodiments. With reference to FIG. 14, the rolling bearing 2 is polished using the processing apparatus 1 (as one of (each example) of each of the above embodiments) shown in any of FIGS. 1 and 4 to 13. It is a ball bearing provided with a ceramic ball 4 which is a sintered body obtained by sintering the green ball 91 as a rolling element. In the rolling bearing 2 of FIG. 14, the rolling bearing of FIG. 14 is a radial ball bearing, but it may be a thrust ball bearing. Further, the rolling bearing (radial ball bearing) may be a deep groove ball bearing, but may be either an angular contact ball bearing or a self-aligning ball bearing.
 図14の転がり軸受2は、外輪3Aと、内輪3Bとを備えている。複数のセラミックス球4は外輪3Aと内輪3Bとの間で転動する。複数のセラミックス球4は保持器5により周方向に間隔を有するように配置される。 The rolling bearing 2 of FIG. 14 includes an outer ring 3A and an inner ring 3B. The plurality of ceramic spheres 4 roll between the outer ring 3A and the inner ring 3B. The plurality of ceramic spheres 4 are arranged by the cage 5 so as to have an interval in the circumferential direction.
 上記実施の形態2と基本的に同様であるが、第1平板部10A上の第2弾性部材51のみを設け、保持部20Bには第1弾性部材50が設けられない加工装置を用いて、グリーンボール91の研磨加工の実験が行われた。以下の表1は、加工実験に用いられたグリーンボール91の種類(材質)および結合材の有無を示している。 It is basically the same as the second embodiment, but using a processing apparatus in which only the second elastic member 51 on the first flat plate portion 10A is provided and the holding portion 20B is not provided with the first elastic member 50. An experiment on the polishing process of the green ball 91 was conducted. Table 1 below shows the types (materials) of the green balls 91 used in the processing experiment and the presence or absence of a binder.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 表1中、グリーンボールの材質が「セラミックス」と記載されているのは、窒化珪素系のセラミックス圧粉体が固められたものである。グリーンボールの材質が「金属」と記載されているのは、銅-鉄系の粉体にシリコン粉体を入れて固められたものである。No.1~8はいずれも10個ずつのグリーンボール91を有するグループであり、図7の第1面10cと第2面20cとの間に10個のグリーンボール91が投入され同時に加工された。No.1とNo.2のグリーンボールは同一であるがこれらを用いて同じ試験が2回行なわれた。No.3とNo.4、No.5とNo.6、No.7とNo.8についても同様である。なおNo.1~No.8のいずれも、各グリーンボールの直径の誤差は±20μmであった。 In Table 1, the material of the green ball is described as "ceramics" because it is a solidified silicon nitride-based ceramic powder. The material of the green ball is described as "metal" because it is made by putting silicon powder into copper-iron powder and hardening it. No. 1 to 8 are groups having 10 green balls 91 each, and 10 green balls 91 were thrown between the first surface 10c and the second surface 20c in FIG. 7 and processed at the same time. No. 1 and No. The two green balls are the same, but the same test was performed twice with them. No. 3 and No. 4, No. 5 and No. 6, No. 7 and No. The same applies to 8. No. 1 to No. In all of 8, the error in the diameter of each green ball was ± 20 μm.
 研磨加工時の第1定盤10の回転数は10rpmとし、第2定盤20の回転数は250rpmとした。研磨層11および他の層21の格子目11a(図2参照)は目開きが50μm以上350μm以下であった。加工はグリーンボール91が所望の寸法になるまで継続するように行なわれた。 The rotation speed of the first surface plate 10 during polishing was 10 rpm, and the rotation speed of the second surface plate 20 was 250 rpm. The lattice 11a (see FIG. 2) of the polishing layer 11 and the other layers 21 had an opening of 50 μm or more and 350 μm or less. Processing was continued until the green balls 91 had the desired dimensions.
 表1中の「凹み」とは、格子目11a(図2参照)のグリーンボールへの転写による粗さよりも大きな欠けまたは剥離を意味する。「通常定盤」とは、本実施の形態の加工装置と基本的に同様であるが上記の第2弾性部材51、および第1弾性部材50、第3弾性部材52のいずれも設けられない定盤を備える加工装置が用いられた場合の試験結果を示す。「弾性体定盤」とは、上記のように第2弾性部材51を有する加工装置が用いられた場合の試験結果を示す。表1より、柔らかい弾性部材を設けることにより、結合材の有無にかかわらず、グリーンボール91に強い応力が加わることが抑制される。このため、たとえば粉体の偏析を抑制する観点からグリーンボールに結合材を含めない特殊な工法を用いた場合においても、研磨加工時における割れまたは凹みなどの不具合が抑制できることがわかった。 The "dent" in Table 1 means a chipping or peeling larger than the roughness due to the transfer of the grid 11a (see FIG. 2) to the green ball. The "normal surface plate" is basically the same as the processing apparatus of the present embodiment, but none of the above-mentioned second elastic member 51, first elastic member 50, and third elastic member 52 is provided. The test result when the processing equipment equipped with the plate is used is shown. The "elastic body surface plate" indicates a test result when a processing apparatus having a second elastic member 51 is used as described above. From Table 1, by providing the soft elastic member, it is possible to suppress the application of strong stress to the green ball 91 regardless of the presence or absence of the binder. For this reason, it was found that, for example, even when a special construction method that does not include a binder in the green ball is used from the viewpoint of suppressing segregation of powder, defects such as cracks or dents during polishing can be suppressed.
 以上に述べた各実施の形態(に含まれる各例)に記載した特徴を、技術的に矛盾のない範囲で適宜組み合わせるように適用してもよい。たとえば図11~図13のそれぞれに、図4~図6の研磨粉除去機構の少なくともいずれかが用いられてもよいし、図7~図9のいずれかのように第2弾性部材51、第3弾性部材52が追加されてもよい。 The features described in each of the above-described embodiments (each example included in the above) may be applied so as to be appropriately combined within a technically consistent range. For example, at least one of the polishing powder removing mechanisms of FIGS. 4 to 6 may be used for each of FIGS. 11 to 13, and the second elastic member 51 and the second elastic member 51 and FIG. 3 Elastic member 52 may be added.
 今回開示された実施の形態はすべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は上記した説明ではなくて請求の範囲によって示され、請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。 The embodiments disclosed this time should be considered to be exemplary in all respects and not restrictive. The scope of the present invention is shown by the scope of claims rather than the above description, and is intended to include all modifications within the meaning and scope of the claims.
 1 加工装置、2 転がり軸受、3A 外輪、3B 内輪、4 セラミックス球、5 保持器、10 第1定盤、10A 第1平板部、10B 外周部、10c 第1面、11 研磨層、11a 格子目、12 第1軸、13,23 軸受、14,24 外周部材、20 第2定盤、20A 第2平板部、20B 保持部、20c 第2面、21 他の層、22 第2軸、26 内壁面、30 ねじ部材、40 吸引部材、41 吸引孔、50,50A,50B 第1弾性部材、51 第2弾性部材、52 第3弾性部材、60 洗浄部材、61 吐出孔、62 気体供給部材、63 噴射孔、91 グリーンボール。 1 Processing equipment, 2 Rolling bearings, 3A outer ring, 3B inner ring, 4 ceramic balls, 5 cage, 10 1st surface plate, 10A 1st flat plate part, 10B outer peripheral part, 10c 1st surface, 11 polishing layer, 11a lattice , 12 1st axis, 13, 23 bearing, 14, 24 outer peripheral member, 20 2nd surface plate, 20A 2nd flat plate part, 20B holding part, 20c 2nd surface, 21 other layers, 22 2nd axis, 26 inside Wall surface, 30 screw member, 40 suction member, 41 suction hole, 50, 50A, 50B first elastic member, 51 second elastic member, 52 third elastic member, 60 cleaning member, 61 discharge hole, 62 gas supply member, 63 Injection hole, 91 green ball.

Claims (9)

  1.  グリーンボールに接触することにより前記グリーンボールを保持する第1面を含む第1部材と、
     前記第1部材を前記第1面の中心に交差する軸周りに回転させる第1軸と、
     前記第1面に対向し、前記グリーンボールに接触することにより前記グリーンボールを保持する第2面を含むとともに、前記第2面に交差する方向に突出するように延び前記第1面および前記第2面の間に挟持される前記グリーンボールを取り囲む保持部を含む第2部材と、
     前記第2部材を前記第2面の中心に交差する軸周りに回転させる第2軸と、
     前記第1面および前記第2面の少なくともいずれかを含み、前記グリーンボールに接触することにより前記グリーンボールを研磨する研磨層と、
     弾性部材としての第1弾性部材とを備え、
     前記第1弾性部材は、前記第2部材の前記保持部の内壁部に配置される、加工装置。
    A first member including a first surface that holds the green ball by coming into contact with the green ball.
    A first axis that rotates the first member around an axis that intersects the center of the first surface, and
    A second surface facing the first surface and holding the green ball by contacting the green ball is included, and the first surface and the first surface extend so as to project in a direction intersecting the second surface. A second member including a holding portion that surrounds the green ball sandwiched between the two surfaces, and
    A second axis that rotates the second member around an axis that intersects the center of the second surface, and
    A polishing layer comprising at least one of the first surface and the second surface and polishing the green ball by contacting with the green ball.
    With a first elastic member as an elastic member,
    The first elastic member is a processing device arranged on the inner wall portion of the holding portion of the second member.
  2.  前記第1部材は、前記第1面に沿うように拡がり前記第1軸周りに回転可能な第1平板部をさらに含み、
     前記第2部材は、前記第2面に沿うように拡がり前記第2軸周りに回転可能な第2平板部をさらに含む、請求項1に記載の加工装置。
    The first member further includes a first flat plate portion that extends along the first surface and is rotatable around the first axis.
    The processing apparatus according to claim 1, wherein the second member further includes a second flat plate portion that extends along the second surface and is rotatable around the second axis.
  3.  前記第1平板部と前記第1面との間に、前記弾性部材としての第2弾性部材が配置される、請求項2に記載の加工装置。 The processing apparatus according to claim 2, wherein a second elastic member as the elastic member is arranged between the first flat plate portion and the first surface.
  4.  前記第2平板部と前記第2面との間に、前記弾性部材としての第3弾性部材が配置される、請求項2または3に記載の加工装置。 The processing apparatus according to claim 2 or 3, wherein a third elastic member as the elastic member is arranged between the second flat plate portion and the second surface.
  5.  前記第1平板部の平面視における第1径は、前記第2平板部の平面視における第2径の2倍を超える寸法を有する、請求項2~4のいずれか1項に記載の加工装置。 The processing apparatus according to any one of claims 2 to 4, wherein the first diameter in the plan view of the first flat plate portion has a dimension more than twice the second diameter in the plan view of the second flat plate portion. ..
  6.  前記グリーンボールの研磨により生じた研磨粉を前記研磨層から除去する研磨粉除去機構をさらに備え、
     前記研磨粉除去機構は、前記第1面の前記第2部材と対向する領域以外の領域において前記第1面と対向するように配置される、請求項1~5のいずれか1項に記載の加工装置。
    Further provided with a polishing powder removing mechanism for removing the polishing powder generated by polishing the green ball from the polishing layer.
    The one according to any one of claims 1 to 5, wherein the polishing powder removing mechanism is arranged so as to face the first surface in a region other than the region facing the second member on the first surface. Processing equipment.
  7.  前記弾性部材は、ゴム、樹脂およびスポンジのいずれかである、請求項1~6のいずれか1項に記載の加工装置。 The processing apparatus according to any one of claims 1 to 6, wherein the elastic member is any of rubber, resin and sponge.
  8.  請求項1~7のいずれか1項に記載の加工装置を用いて研磨された前記グリーンボールを焼結して得られるセラミックス球。 A ceramic ball obtained by sintering the green ball polished by using the processing apparatus according to any one of claims 1 to 7.
  9.  請求項8に記載のセラミックス球を備える転がり軸受。 A rolling bearing provided with the ceramic ball according to claim 8.
PCT/JP2021/034544 2020-09-24 2021-09-21 Processing device, ceramic sphere, and rolling bearing WO2022065292A1 (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444494U (en) * 1977-09-02 1979-03-27
JPH01271164A (en) * 1988-04-19 1989-10-30 Yasushi Kato Polishing device using magnetic fluid
JPH03196963A (en) * 1989-12-25 1991-08-28 Miyagi Pref Gov Spherical polishing method for ceramics and working guide therefor
JPH10296623A (en) * 1997-05-05 1998-11-10 Shin Etsu Handotai Co Ltd Device and method for polishing semiconductor wafer
JP2010207933A (en) * 2009-03-09 2010-09-24 Olympus Corp Device and method for polishing
JP2011073076A (en) * 2009-09-29 2011-04-14 Ntn Corp Polishing device of green ball

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444494U (en) * 1977-09-02 1979-03-27
JPH01271164A (en) * 1988-04-19 1989-10-30 Yasushi Kato Polishing device using magnetic fluid
JPH03196963A (en) * 1989-12-25 1991-08-28 Miyagi Pref Gov Spherical polishing method for ceramics and working guide therefor
JPH10296623A (en) * 1997-05-05 1998-11-10 Shin Etsu Handotai Co Ltd Device and method for polishing semiconductor wafer
JP2010207933A (en) * 2009-03-09 2010-09-24 Olympus Corp Device and method for polishing
JP2011073076A (en) * 2009-09-29 2011-04-14 Ntn Corp Polishing device of green ball

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