WO2017073431A1 - Cleansing device, system for cleansing spherical body, and method for cleansing spherical body - Google Patents

Cleansing device, system for cleansing spherical body, and method for cleansing spherical body Download PDF

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Publication number
WO2017073431A1
WO2017073431A1 PCT/JP2016/080969 JP2016080969W WO2017073431A1 WO 2017073431 A1 WO2017073431 A1 WO 2017073431A1 JP 2016080969 W JP2016080969 W JP 2016080969W WO 2017073431 A1 WO2017073431 A1 WO 2017073431A1
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Prior art keywords
sphere
cleaning
spiral groove
space
spherical body
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PCT/JP2016/080969
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French (fr)
Japanese (ja)
Inventor
則秀 佐藤
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Ntn株式会社
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Publication date
Priority claimed from JP2016195865A external-priority patent/JP2017080735A/en
Application filed by Ntn株式会社 filed Critical Ntn株式会社
Priority to US15/771,743 priority Critical patent/US10751736B2/en
Priority to EP16859661.7A priority patent/EP3369490B1/en
Publication of WO2017073431A1 publication Critical patent/WO2017073431A1/en

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    • B08B1/32

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  • the present invention relates to a cleaning device, a sphere cleaning system, and a sphere cleaning method, and more particularly, to a cleaning device, a sphere cleaning system, and a sphere cleaning method capable of uniformly cleaning a sphere surface.
  • the steel balls and ceramic balls for bearings are subjected to precise polishing to obtain high sphericity.
  • the sphere is polished using a grindstone, loose abrasive grains, and oil-based or water-based coolant. Therefore, dirt such as a coolant or polishing powder may adhere to the surface of the sphere after the polishing process, and it is necessary to further perform a cleaning process in order to remove these.
  • sphere cleaning methods include, for example, ultrasonic cleaning, brush cleaning, rolling cleaning, and hand cleaning.
  • ultrasonic cleaning the sphere is cleaned by a shock wave caused by cavitation.
  • brush cleaning a sphere is placed in a disc-shaped cage, and the sphere is cleaned by rubbing the surface with a brush.
  • rolling cleaning a sphere is cleaned by rolling on a sponge or the like.
  • hand-washing the spheres are washed by rubbing with both hands or by sponge and hand.
  • Patent Document 1 describes a method of cleaning a sphere while feeding it along a spiral guide member.
  • the present invention has been made in view of the above problems, and an object thereof is to provide a cleaning device, a sphere cleaning system, and a sphere cleaning method capable of uniformly cleaning the surface of the sphere.
  • the cleaning device is a cleaning device for cleaning a sphere.
  • the cleaning apparatus includes a first member having a first surface and a second member having a second surface opposite to the first surface. The first surface and the second surface are sandwiching surfaces that sandwich the sphere. The first surface and the second surface are configured to be rotatable relative to each other.
  • the cleaning device further includes an input unit for introducing a sphere into the space between the first surface and the second surface, and a discharge unit for discharging the sphere from the space.
  • One surface of the first surface and the second surface is provided with a spiral groove for guiding the sphere from the input portion to the discharge portion.
  • the sphere can be rotated by holding the sphere between the first surface and the second surface and rotating the first surface and the second surface relative to each other. . Then, by cleaning the rotated sphere while guiding it along the spiral groove from the input portion to the discharge portion, the surface of the sphere is changed while changing the inclination of the rotation axis with respect to the clamping surfaces (first surface and second surface). Can be washed. As a result, a more uniform cleanliness can be ensured over the entire surface of the sphere. Therefore, according to the cleaning device according to the present invention, it is possible to provide a cleaning device capable of uniformly cleaning the surface of the sphere.
  • one member of the first member and the second member is a deformable member capable of deforming the sandwiching surface from a flat surface to a curved surface along the surface shape of the sphere.
  • differential slip occurs at the contact portion between the sphere and the clamping surface, so that the surface of the rotated sphere can be cleaned while being rubbed against the clamping surface. As a result, the surface of the sphere can be more uniformly cleaned.
  • the deformable member includes a porous member and a fiber member that is disposed on the porous member and that forms the holding surface and is impregnated with a cleaning agent for cleaning the sphere. Contains.
  • the flexibility of the deformable member is ensured by using the porous member, and a high cleaning effect can be obtained by sandwiching the sphere in the fiber member impregnated with the cleaning agent. As a result, higher cleanliness can be ensured on the sphere surface.
  • the cleaning agent preferably contains an organic solvent or water.
  • cleaning of the spherical surface can be selected suitably.
  • the spiral groove protrudes from one surface of the first surface and the second surface and from the one surface to the other surface of the first surface and the second surface. It is the area
  • the first and second surfaces constituting the space and the wall surface in the space are formed by a porous member.
  • the abrasive grain bond is taken into the pores included in the porous member when the sphere having the abrasive grain bond adhered to the surface during the polishing process is washed with the cleaning device.
  • the problem that the surface of the sphere is damaged by the attached bond can be suppressed.
  • the spiral groove protrudes from one surface of the first surface and the second surface and from the one surface to the other surface of the first surface and the second surface. It is the area
  • the wall surface is a surface having a larger coefficient of friction than the one surface.
  • the friction coefficient between the sandwiching surface and the wall surface is reduced.
  • the rotation axis of the sphere can be changed by the difference. As a result, the surface of the sphere can be more uniformly cleaned.
  • the spiral groove includes a portion that has been changed from a spiral track.
  • the rotation axis of the sphere can be changed in the portion where the trajectory has been changed. As a result, the surface of the sphere can be more uniformly cleaned.
  • the first member and the second member are arranged so that the rotation axes are eccentric from each other.
  • the rotation axis of the sphere can be changed by the difference in peripheral speed when the first member and the second member are relatively rotated. As a result, the surface of the sphere can be more uniformly cleaned.
  • the member provided with the spiral groove in the first member and the second member includes a resin material or a metal material.
  • the constituent material of the member provided with the spiral groove can be appropriately selected in consideration of the component of the cleaning agent and the like.
  • the spherical cleaning system provided with the cleaning device preferably includes a plurality of the cleaning devices.
  • the sphere cleaning system preferably includes a transfer means for sending a sphere cleaned by one of the plurality of cleaning devices to another cleaning device located downstream of the one cleaning device. I have. According to the above configuration, the surface of the sphere can be more uniformly cleaned by using a plurality of cleaning devices.
  • the method for cleaning a sphere includes a step of preparing a sphere and a step of preparing a cleaning device for cleaning the sphere.
  • the cleaning device includes a first member having a first surface, a second member having a second surface opposite to the first surface, and a space between the first surface and the second surface. And a discharge portion for discharging the sphere from the space.
  • One surface of the first surface and the second surface is provided with a spiral groove for guiding the sphere from the input portion to the discharge portion.
  • the method for cleaning a sphere further includes a step of inserting a sphere into the space from the input portion, a step of cleaning the sphere in the space, and a step of discharging the cleaned sphere from the discharge portion.
  • the sphere is rotated by rotating the first surface and the second surface relative to each other while holding the sphere between the first surface and the second surface, and the rotated sphere Is cleaned while being guided in the spiral groove from the input part to the discharge part.
  • the sphere cleaning method the sphere is rotated by rotating the first surface and the second surface relative to each other while holding the sphere between the first surface and the second surface. be able to. Then, the surface of the sphere is cleaned while changing the inclination of the rotation axis with respect to the sandwiching surfaces (first surface and second surface) by cleaning the rotating sphere while guiding it from the input portion to the discharge portion in the spiral groove. can do. As a result, a more uniform cleanliness can be ensured over the entire surface of the sphere. Therefore, according to the method for cleaning a sphere according to the present invention, it is possible to provide a method for cleaning a sphere that can uniformly clean the surface of the sphere.
  • the cleaning device capable of uniformly cleaning the surface of the sphere, the sphere cleaning system, and A method for cleaning a sphere can be provided.
  • FIG. 3 is a schematic diagram showing a cross-sectional structure along a line segment III-III in FIG. It is a top view which shows roughly the 2nd example of a structure of the washing
  • FIG. 6 is a schematic diagram showing a cross-sectional structure of a portion corresponding to a portion along line III-III in FIG. 2 in a spherical body cleaning system according to Embodiment 5 of the present invention.
  • Embodiments of the present invention will be described below with reference to the drawings.
  • Embodiment 1 (Configuration of sphere cleaning system)
  • the spherical body cleaning system 1 according to the present embodiment includes a cleaning device 10 for cleaning the spherical body 30.
  • the sphere 30 may be, for example, a ceramic sphere such as a steel ball for a bearing or a nitrogen silicon sphere, or may be another sphere.
  • FIG. 1 shows a case where the spherical cleaning system 1 includes a single cleaning device 10, but the spherical cleaning system of the present invention includes a plurality of spherical cleaning systems as described in other embodiments described later. A cleaning device may be provided.
  • the cleaning apparatus 10 includes a spiral flutes 11 as a first member having a first surface 11 a and a second member having a second surface 20 a facing the first surface 11 a.
  • a spiral flutes 11 as a first member having a first surface 11 a and a second member having a second surface 20 a facing the first surface 11 a.
  • the first surface 11 a and the second surface 20 a are clamping surfaces that sandwich the sphere 30.
  • the first surface 11a and the second surface 20a are configured to be rotatable relative to each other. That is, the first surface 11a may be fixed and the second surface 20a may be rotatable, or the second surface 20a may be fixed and the first surface 11a may be rotated. Alternatively, both the first surface 11a and the second surface 20a may be rotatable.
  • the cleaning apparatus 10 includes an input unit 12 for inputting the sphere 30 into the space S between the first surface 11a and the second surface 20a, and the sphere 30 from the space S.
  • the input part 12 may be provided in the center part of the spiral flutes 11, and the discharge part 13 may be provided in a part of the outer peripheral surface of the spiral flutes 11.
  • the spiral flutes 11 have a circular shape in a plan view, and a sphere 30 is disposed in a spiral groove 15 having a substantially circular spiral shape in a plan view.
  • the spiral groove 15 is a part for guiding the sphere 30 from the input part 12 to the discharge part 13.
  • the spiral groove 15 may be, for example, an Archimedean spiral or a Bernoulli spiral.
  • the spiral groove 15 is not limited to such a regular shape.
  • the spiral groove 15 guides the sphere 30 introduced into the space S from the input portion 12 to the discharge portion 13 along the spiral groove 15, and the cleaned sphere 30 is transferred from the discharge portion 13 to the cleaning device 10. It can be discharged to the outside.
  • spiral groove 15 should just be provided in one surface among the 1st surface 11a and the 2nd surface 20a, and may be provided in the 2nd surface 20a.
  • the direction of the spiral groove 15 may be clockwise as viewed in plan from above the spiral groove 11 as shown in FIG. 2, or may be counterclockwise.
  • the spiral groove plate 11 includes a resin material or a metal material, and preferably includes a resin material. More specifically, the material of the spiral flutes 11 can be appropriately selected in consideration of the components of the cleaning agent, for example, polyvinyl chloride (PVC: Poly Vinyl Chloride). Thereby, even when oil-based or water-based cleaning agents are used, the swelling of the spiral flutes 11 can be suppressed. Further, in the case of metal spiral flutes, metal may rub against and adhere to the surface of the ceramic sphere, whereas in PVC spiral flutes 11 this can be suppressed.
  • PVC Poly Vinyl Chloride
  • the spiral groove 15 is a region surrounded by the first surface 11a and the wall surface 40a.
  • the wall surface 40a is included in the wall portion 40 that protrudes from the first surface 11a toward the second surface 20a.
  • the wall surface 40a may be a surface having a larger coefficient of friction than the first surface 11a.
  • the flat disk 20 as the second member is a deformable member capable of deforming the second surface 20a, which is a clamping surface, from a flat surface to a curved surface along the surface shape of the sphere 30.
  • the flat disk 20 that is a deformable member includes a porous member 22 and a fiber member 21 disposed on the porous member 22.
  • the porous member 22 is an elastic member such as a sponge.
  • the fiber member 21 constitutes a second surface 20a that is a clamping surface.
  • the fiber member 21 is a cloth (for example, non-woven fabric) and is impregnated with a cleaning agent for cleaning the sphere 30.
  • the cleaning agent contains an organic solvent and water, such as white kerosene.
  • the flat disk 20 that is a deformable member may be configured by only the porous member 22 without the fiber member 21, but the cleaning action of the sphere 30 can be further improved by providing the fiber member 21. .
  • the spiral groove board 11 provided with the spiral groove 15 may be comprised as said deformation
  • the spiral groove 16 has a spiral groove 15 having a substantially polygonal (pentagonal) spiral shape in plan view.
  • the spiral flutes 16 of FIG. 4 are different from the spiral flutes 11 of FIG. 2, but are otherwise the same as the spiral flutes 11 of FIG. Is the same. For this reason, the detailed description regarding the spiral flutes 16 of FIG. 4 is omitted.
  • a sphere cleaning method according to the present embodiment which is performed using the sphere cleaning system 1, will be described.
  • the process of preparing a spherical body is first implemented as process (S10).
  • a spherical body 30 such as a steel ball or a ceramic ball for bearing that has been subjected to precise polishing is prepared.
  • a step (S20) of preparing a cleaning device for cleaning the sphere 30 is performed.
  • cleaning device 10 of sphere cleaning system 1 according to the present embodiment is prepared.
  • a step of throwing the sphere 30 into the space S from the throwing unit 12 is performed.
  • the spheres 30 may be continuously introduced at intervals of 0.5 seconds, for example. That is, in the spherical body cleaning system 1, since the spiral groove 15 is provided in the plane of the first surface 11 a, the collision and contact between the spherical bodies 30 can be suppressed by adjusting the insertion interval of the spherical bodies 30. Can do.
  • a step of cleaning the sphere 30 in the space S is performed as a step (S40).
  • the first surface 11a and the second surface 20a are connected to each other while holding the sphere 30 between the first surface 11a and the second surface 20a.
  • the sphere 30 is rotated by rotating it relatively.
  • the first surface 11a may be fixed and only the second surface 20a may rotate
  • the second surface 20a may be fixed and only the first surface 11a may rotate
  • Both the first surface 11a and the second surface 20a may rotate.
  • the rotated sphere 30 is cleaned while being guided from the input unit 12 to the discharge unit 13 in the spiral groove 15.
  • the sphere 30 may be wet-cleaned with white kerosene impregnated in the fiber member 21, but may be dry-cleaned by blowing gas onto the surface of the sphere 30.
  • FIG. 6 shows the inclination of the rotation axis P of the sphere 30 in the region VI in FIG.
  • FIG. 7 shows the inclination of the rotation axis P of the sphere 30 in the region VII in FIG.
  • FIG. 8 shows the inclination of the rotation axis P of the sphere 30 in the region VIII in FIG.
  • the second surface 20a which is one of the clamping surfaces, is deformed into a curved surface when the sphere 30 is clamped.
  • the surface 20a is shown, and the inclination of the rotation axis P of the sphere 30 is shown.
  • the spherical body 30 has an inclination angle of the rotation axis P when passing through the corner portion in plan view of the spiral groove 15. Can be changed.
  • a step of discharging the cleaned sphere 30 from the discharge unit 13 is performed as a step (S50).
  • steps (S10) to (S50) the cleaning of the sphere 30 is completed, and the sphere cleaning method according to the present embodiment is completed.
  • the spherical body 30 is sandwiched between the first surface 11a and the second surface 20a, and the first surface 11a and the second surface 20a are relative to each other.
  • the sphere 30 can be washed while rotating.
  • the surface of the sphere 30 can be cleaned while changing the inclination of the rotation axis by cleaning the rotated sphere 30 while guiding it from the input portion 12 to the discharge portion 13 in the spiral groove 15.
  • more uniform cleanliness can be ensured over the entire surface of the sphere 30, and higher cleanliness can be obtained as compared with ultrasonic cleaning, brush cleaning, and the like.
  • the surface of the sphere 30 can be cleaned uniformly.
  • the sphere cleaning system 1 according to the present embodiment can be applied to cleaning the sphere 30 having various sizes, is power-saving, and can be installed in a space-saving manner.
  • Embodiment 2 which is another embodiment of the present invention will be described.
  • the sphere cleaning system according to the second embodiment has basically the same configuration as the sphere cleaning system 1 according to the first embodiment and has the same effects.
  • the spherical cleaning system according to the second embodiment is different from the spherical cleaning system 1 according to the first embodiment in the configuration of the spiral groove.
  • the spiral groove 51 as the first member is provided with a spiral groove 55 for guiding the sphere 30 from the input part 52 to the discharge part 53.
  • the spiral groove 55 includes a portion whose trajectory is changed from the spiral trajectory. More specifically, the spiral groove 55 includes a spiral track portion 55a and a plurality of (three in FIG. 9) track change portions 55b positioned between the spiral track portions 55a.
  • the trajectory changing portion 55b is provided so as to extend in a direction intersecting the tangential direction of the spiral trajectory portion 55a.
  • the rotation axis of the sphere 30 input from the input unit 52 can be changed by the trajectory changing unit 55b. More specifically, as shown in FIG. 10, the rotation axis P of the sphere 30 can be changed to the rotation axis P ′ when passing through the trajectory changing unit 55b. As a result, the surface of the sphere 30 can be more uniformly cleaned.
  • the position and number of the trajectory changing portions 55b are not particularly limited, but may be arranged so as to face each other across the central portion of the spiral flutes 51 as shown in FIG. Further, the length of the trajectory changing portion 55b and the angle formed with respect to the tangent line of the spiral trajectory portion 55a can be appropriately selected in order to clean the surface of the sphere 30 uniformly.
  • Embodiment 3 which is still another embodiment of the present invention will be described.
  • the spherical body cleaning system according to Embodiment 3 has basically the same configuration as the spherical body cleaning system according to Embodiment 1 or 2 described above, and has the same effects.
  • the spherical cleaning system according to the third embodiment is different from the spherical cleaning systems according to the first and second embodiments in the number of installed cleaning apparatuses.
  • the spherical cleaning system 3 includes a plurality (four in FIG. 11) of cleaning apparatuses 10A, 10B, 10C, and 10D (10A to 10D). Further, the spherical body cleaning system 3 further includes an input unit 60 and a transfer unit 61.
  • the throwing means 60 is for throwing the sphere 30 to be cleaned into the cleaning apparatus 10A located at the most upstream.
  • the transfer means 61 is for sending the sphere 30 cleaned by one of the plurality of cleaning devices 10A to 10D to another cleaning device located downstream of the one cleaning device. That is, the transfer means 61 is provided between the cleaning device 10A and the cleaning device 10B in order to transfer the sphere 30 cleaned by the cleaning device 10A to the cleaning device 10B. Further, the transfer means 61 is provided between the cleaning device 10B and the cleaning device 10C in order to transfer the sphere 30 cleaned by the cleaning device 10B to the cleaning device 10C. The transfer means 61 is provided between the cleaning device 10C and the cleaning device 10D in order to transfer the sphere 30 cleaned by the cleaning device 10C to the cleaning device 10D.
  • the surface of the sphere can be obtained by using a plurality of cleaning devices 10A to 10D.
  • the uniformity of cleanliness can be further improved.
  • the sphere cleaning system according to the fourth embodiment has basically the same configuration as the sphere cleaning system according to the first to third embodiments and has the same effects.
  • the spherical cleaning system according to the fourth embodiment is different from the spherical cleaning system according to the first to third embodiments in the relative positional relationship between the first member and the second member.
  • the spiral groove disk 70 as the first member and the flat disk 80 as the second member have rotation axes P1 and P2, respectively. And is configured to be rotatable around the rotation axes P1 and P2. Further, the spiral groove disk 70 and the flat disk 80 are arranged such that the rotation axes P1 and P2 are eccentric from each other. Specifically, the eccentricity between the rotation axis P 1 of the spiral groove disk 70 and the rotation axis P 2 of the flat disk 80 is larger than the radius of the spiral groove disk 70. When the amount of eccentricity is large as described above, the rotation axis of the sphere 30 can be changed by rotating the spiral groove 70 and slowly rotating the flat disk 80.
  • the rotation axis of the spherical body 30 can be changed by the difference in peripheral speed when the spiral groove disk 70 and the flat disk 80 are relatively rotated. it can. As a result, the surface of the sphere 30 can be more uniformly cleaned.
  • the eccentricity between the rotation axis P1 of the spiral groove disk 70 and the rotation axis P2 of the flat disk 80 is smaller than the radius of the insertion portion 12 of the spiral groove disk 70 with respect to the rotation axis P1. .
  • the rotation axis of the sphere 30 can be changed by rotating only the flat disk 80 without rotating the spiral groove 70.
  • Embodiment 5 which is still another embodiment of the present invention will be described.
  • the spherical body cleaning system according to Embodiment 5 has basically the same configuration as the spherical body cleaning systems according to Embodiments 1 to 4 described above, and has the same effects.
  • the spherical cleaning system according to the fifth embodiment is different from the spherical cleaning system according to the first to fourth embodiments in the constituent materials of the first member and the second member.
  • spiral grooving 11 as the first member in the fifth embodiment is a helical groove including a resin material or a metal material, similar to spiral grooving 11 (see FIG. 3) in the first embodiment.
  • the base plate part 14 and the porous member 22 are configured.
  • the fifth embodiment also has a flat disk 20 as a second member, as in the first embodiment.
  • the spiral groove base portion 14 constituting the spiral groove plate 11 is a portion that forms the foundation of the entire shape of the spiral groove plate 11 including the protruding shape of the wall portion 40 and the like.
  • the spiral flutes 11 preferably contain a resin material, but more specifically, the material of the spiral flutes 11 is, for example, polyvinyl chloride (PVC: Poly Vinyl Chloride).
  • the porous member 22 constituting the spiral groove plate 11 is formed in a thin film so as to cover the surface of the spiral groove base portion 14 on the flat disk 20 side. That is, the porous member 22 in the spiral groove disk 11 is formed so as to constitute a first surface 11 a facing the flat disk 20 and a wall surface 40 a that covers the wall portion 40 in the spiral groove 15.
  • the porous member 22 constituting the spiral flutes 11 is not limited to the above configuration, and constitutes at least a portion of the spiral flutes 11 with which the spherical body 30 can contact, that is, the first surface 11a and the wall surface 40a in the space S. It suffices if it is arranged in the part to be. Conversely, the entire spiral flutes 11 including the base portions thereof, that is, the entire spiral flutes base portion 14 and the porous member 22 of FIG.
  • the porous member 22 is arranged so that the first surface 11 a and the wall surface 40 a in the spiral groove 15 of the spiral groove plate 11 are formed by at least the porous member 22.
  • the present embodiment is different from the first embodiment in which the spiral groove 11 does not include the porous member 22.
  • the flat disk 20 includes a part that forms the second surface 20 a that is the surface on the spiral grooved disk 11 side, and the entire member is formed by the porous member 22. It is.
  • the present embodiment is different from the first embodiment in which the flat disk 20 includes a porous member 22 and a fiber member 21 (see FIG. 3) disposed thereon.
  • the porous member 22 only needs to be disposed so as to constitute at least the second surface 20a that faces the space S. Portions other than the portion constituting the second surface 20 a may not be formed by the porous member 22.
  • the flat disk 20 is illustrated as a deformable member.
  • the spiral groove disk 11 provided with the spiral groove 15 is also configured as the deformable member. It may be.
  • the first surface 11 a and the second surface 20 a constituting the space S and the wall surface 40 a in the space S are formed by the porous member 22.
  • the entire inner wall surface of the space S (the surface on which the sphere 30 disposed in the space S can come into contact) is formed by at least the porous member 22.
  • the porous member 22 in the present embodiment is an elastic member such as a sponge as in the first embodiment.
  • the sponge is a fibrous spongy body made of synthetic resin or the like.
  • the diameter of the pores contained in the sponge is larger than the diameter of the bond with abrasive grains that is attached to the surface of the sphere 30 after the polishing process of the sphere 30 and is peeled off from the polishing plate for polishing the sphere 30.
  • the diameter is a linear distance from one point of the outer edge of the hole or bond with abrasive grains to the other point of the outer edge of the hole or bond with abrasive grains through the center of the hole or bond with abrasive grains.
  • the sponge is preferably softer than PVC.
  • the bond with abrasive grains peeled off from the surface plate used for the polishing process adheres to the surface of the spherical body 30. If the surface of the sphere 30 is cleaned using a spiral cleaner such as the cleaning device 10 to remove the bond with abrasive grains, the sphere 30 transfers the bond with abrasive grains that has adhered to the sphere 30. Stings into the resin material of the site. Then, when the spiral groove 15 and the flat disk 20 are comprised with iron or resin (PVC etc.), the part which the bond with an abrasive grain stabbed becomes convex with respect to the resin material of surfaces, such as the spiral groove 15. FIG.
  • the first surface 11a and the second surface 20a constituting the space S in which the sphere 30 is arranged that is, the inner wall surface of the space S, and the wall surface 40a in the space S are ) It is formed by a porous member 22 such as a sponge.
  • a porous member 22 such as a sponge.
  • the bond with abrasive grains taken into the sponge is not taken into the pores of the sponge, the elasticity of the sponge is low and the surface pressure of the surface in contact with the sphere 30 becomes low. Even if it contacts with an attached bond, possibility that a damage
  • the present embodiment even if the bond with abrasive grains adhering to the surface of the sphere 30 quickly enters the pores of the sponge as the porous member 22 or does not temporarily enter, the sponge itself Therefore, the local surface pressure between the sphere 30 and the bond with abrasive grains can be lowered, so that the possibility of generating scratches on the surface of the sphere 30 can be reduced.
  • the cleaning apparatus 10 in the present embodiment by repeating the cleaning process using the cleaning apparatus 10 in the present embodiment three times, the bond with abrasive grains on the entire surface of the sphere 30 can be removed, and the cleaning can be completed.
  • Example 1 medium diameter ceramic balls for machine tools were prepared as spheres to be cleaned. Further, as the spherical cleaning system, the spherical cleaning system 1 according to the first embodiment was prepared. The state of the sphere surface after the ceramic sphere was cleaned using the sphere cleaning system 1 was confirmed.
  • Example 2 In the same manner as in Experimental Example 1, a medium diameter ceramic sphere for machine tools was prepared. In addition, a sphere cleaning system according to the second embodiment was prepared as a sphere cleaning system. And the surface state of the ceramic ball
  • the above-mentioned “OK” and “NG” in the cleaning state of the sphere surface are determined by the entire surface inspection of the sphere by the laser inspection machine.
  • the criterion is that the cleaning is determined to be “NG” when a foreign matter of 50 ⁇ m or more is detected from the resolution of the laser inspection machine, and the cleaning is determined to be “OK” when such a foreign matter is not detected. Is done.
  • a sphere 30 having a diameter of 11/32 inches and having diamond abrasive grains attached to the surface is formed. 6000 pieces were washed and examined for the presence or absence of scratches on the surface. The washing process was repeated three times for each sample of the sphere 30.
  • the exposed surface in the space S of the flat disk 20 is made of sponge. The results are shown in Table 5 below.
  • the sphere cleaning system and the sphere cleaning method of the present invention can be applied particularly advantageously in a sphere cleaning system and a sphere cleaning method that require uniform cleaning of the surface of the sphere.
  • 1,3 Sphere cleaning system 10, 10A, 10B, 10C, 10D cleaning device, 11, 16, 51, 70 spiral flutes, 11a first surface, 12, 52 input section, 13, 53 discharge section, 14 Spiral groove base, 15, 55, spiral groove, 20,80 flat disk, 20a second surface, 21 fiber member, 22 porous member, 30 sphere, 40 wall, 40a wall, 55a spiral track, 55b track Change section, 60 input means, 61 transfer means, P, P 'rotation axis, P1, P2 rotation axis, S space.

Abstract

Provided are a cleansing device, a system for cleansing a spherical body, and a method for cleansing a spherical body, which enable uniform cleansing of the surface of a spherical body. The system for cleansing a spherical body is provided with a cleansing device for cleansing a spherical body. This cleansing device includes a first member (11) having a first surface (11a) and a second member (20) having a second surface (20a) that is disposed to face the first surface (11a). The first surface (11a) and the second surface (20a) are holding surfaces for holding the spherical body therebetween. The first surface (11a) and the second surface are configured to be rotatable relative to each other. This cleansing device further includes: a loading part (12) for receiving loading of a spherical body in a space between the first surface (11a) and the second surface (20a); and a discharge part (13) for discharging the spherical body from the abovementioned space. Either the first surface (11a) or the second surface (20a) is provided with a helical channel (15) for guiding the spherical body from the loading part (12) to the discharge part (14).

Description

洗浄装置、球体の洗浄システムおよび球体の洗浄方法Cleaning device, spherical cleaning system, and spherical cleaning method
 本発明は洗浄装置、球体の洗浄システムおよび球体の洗浄方法に関し、特に、球体表面を均一に洗浄することが可能な洗浄装置、球体の洗浄システムおよび球体の洗浄方法に関する。 The present invention relates to a cleaning device, a sphere cleaning system, and a sphere cleaning method, and more particularly, to a cleaning device, a sphere cleaning system, and a sphere cleaning method capable of uniformly cleaning a sphere surface.
 軸受用の鋼球やセラミック球には、高い真球度を得るために精密な研磨加工が施される。この研磨加工では、砥石や遊離砥粒および油系や水系のクーラント液を用いて球体が研磨される。そのため、研磨加工後の球体の表面には、クーラント液や研磨粉などの汚れが付着する場合があり、これらを除去するために洗浄工程をさらに実施することが必要になる。 ¡The steel balls and ceramic balls for bearings are subjected to precise polishing to obtain high sphericity. In this polishing process, the sphere is polished using a grindstone, loose abrasive grains, and oil-based or water-based coolant. Therefore, dirt such as a coolant or polishing powder may adhere to the surface of the sphere after the polishing process, and it is necessary to further perform a cleaning process in order to remove these.
 球体の洗浄方法には、球体の大きさや必要な清浄度により種々の方法がある。一般的な球体の洗浄方法としては、たとえば超音波洗浄、ブラシ洗浄、転がし洗浄または手洗い洗浄などがある。超音波洗浄では、キャビテーションによる衝撃波によって球体が洗浄される。またブラシ洗浄では、円盤状の保持器に球体が入れられ、ブラシで表面を擦ることにより球体が洗浄される。転がし洗浄では、スポンジなどの上で転がすことにより球体が洗浄される。手洗い洗浄では、両手揉みやスポンジと手によって転がすことにより球体が洗浄される。またこの種の球体の洗浄方法として、特開平7-100229号公報(特許文献1)には、螺旋ガイド部材に沿って球体を送りつつ洗浄する方法が記載されている。 There are various methods for cleaning the sphere depending on the size of the sphere and the required cleanliness. Common sphere cleaning methods include, for example, ultrasonic cleaning, brush cleaning, rolling cleaning, and hand cleaning. In ultrasonic cleaning, the sphere is cleaned by a shock wave caused by cavitation. In brush cleaning, a sphere is placed in a disc-shaped cage, and the sphere is cleaned by rubbing the surface with a brush. In rolling cleaning, a sphere is cleaned by rolling on a sponge or the like. In hand-washing, the spheres are washed by rubbing with both hands or by sponge and hand. As a cleaning method for this type of sphere, Japanese Patent Application Laid-Open No. 7-100289 (Patent Document 1) describes a method of cleaning a sphere while feeding it along a spiral guide member.
特開平7-100229号公報Japanese Patent Laid-Open No. 7-1000022
 研磨加工後の鋼球やセラミック球の洗浄工程においては、球体表面の全体において均一かつ高い清浄度を確保し、また洗浄作業中における球体同士の衝突や接触に起因した傷の発生を抑制することが必要になる。しかしながら、従来の洗浄方法では、球体表面を均一かつ高い清浄度で洗浄することは困難であった。 In the cleaning process of steel balls and ceramic balls after polishing, ensure a uniform and high cleanness on the entire surface of the sphere, and suppress the occurrence of scratches due to collision and contact between the spheres during the cleaning operation. Is required. However, with the conventional cleaning method, it has been difficult to clean the spherical surface with a uniform and high cleanliness.
 本発明は、上記課題に鑑みてなされたものであり、その目的は、球体の表面を均一に洗浄することが可能な洗浄装置、球体の洗浄システムおよび球体の洗浄方法を提供することである。 The present invention has been made in view of the above problems, and an object thereof is to provide a cleaning device, a sphere cleaning system, and a sphere cleaning method capable of uniformly cleaning the surface of the sphere.
 本発明に従った洗浄装置は、球体を洗浄するための洗浄装置である。上記洗浄装置は、第1の面を有する第1の部材と、第1の面に対向する第2の面を有する第2の部材とを含んでいる。第1の面および第2の面は、球体を挟持する挟持面である。第1の面と第2の面とは、互いに相対的に回転可能に構成されている。上記洗浄装置は、第1の面と第2の面との間の空間に球体を投入するための投入部と、上記空間から球体を排出するための排出部とをさらに含んでいる。第1の面および第2の面のうち一方の面には、投入部から排出部まで球体を案内するための螺旋溝が設けられている。 The cleaning device according to the present invention is a cleaning device for cleaning a sphere. The cleaning apparatus includes a first member having a first surface and a second member having a second surface opposite to the first surface. The first surface and the second surface are sandwiching surfaces that sandwich the sphere. The first surface and the second surface are configured to be rotatable relative to each other. The cleaning device further includes an input unit for introducing a sphere into the space between the first surface and the second surface, and a discharge unit for discharging the sphere from the space. One surface of the first surface and the second surface is provided with a spiral groove for guiding the sphere from the input portion to the discharge portion.
 本発明に従った洗浄装置では、第1の面および第2の面により球体を挟持して第1の面および第2の面を互いに相対的に回転させることにより、球体を自転させることができる。そして、自転した球体を投入部から排出部まで螺旋溝に沿って案内しつつ洗浄することにより、挟持面(第1の面および第2の面)に対する自転軸の傾きを変更させつつ球体表面を洗浄することができる。その結果、球体の表面全体においてより均一な清浄度を確保することができる。したがって、本発明に従った洗浄装置によれば、球体の表面を均一に洗浄することが可能な洗浄装置を提供することができる。 In the cleaning apparatus according to the present invention, the sphere can be rotated by holding the sphere between the first surface and the second surface and rotating the first surface and the second surface relative to each other. . Then, by cleaning the rotated sphere while guiding it along the spiral groove from the input portion to the discharge portion, the surface of the sphere is changed while changing the inclination of the rotation axis with respect to the clamping surfaces (first surface and second surface). Can be washed. As a result, a more uniform cleanliness can be ensured over the entire surface of the sphere. Therefore, according to the cleaning device according to the present invention, it is possible to provide a cleaning device capable of uniformly cleaning the surface of the sphere.
 上記洗浄装置において好ましくは、第1の部材および第2の部材のうち一方の部材は、上記挟持面が平面から球体の表面形状に沿った曲面に変形することが可能な変形部材である。 Preferably, in the cleaning apparatus, one member of the first member and the second member is a deformable member capable of deforming the sandwiching surface from a flat surface to a curved surface along the surface shape of the sphere.
 上記構成によれば、球体と上記挟持面との接触部において差動滑りが発生するため、自転した球体の表面を上記挟持面に擦り付けながら洗浄することができる。その結果、球体の表面をより均一に洗浄することができる。 According to the above configuration, differential slip occurs at the contact portion between the sphere and the clamping surface, so that the surface of the rotated sphere can be cleaned while being rubbed against the clamping surface. As a result, the surface of the sphere can be more uniformly cleaned.
 上記洗浄装置において好ましくは、上記変形部材は、多孔質部材と、上記多孔質部材上に配置されるとともに上記挟持面を構成し、球体を洗浄するための洗浄剤が含浸された繊維部材とを含んでいる。 Preferably, in the cleaning device, the deformable member includes a porous member and a fiber member that is disposed on the porous member and that forms the holding surface and is impregnated with a cleaning agent for cleaning the sphere. Contains.
 上記構成によれば、多孔質部材を用いることにより上記変形部材の柔軟性を確保し、また洗浄剤が含浸された繊維部材において球体を挟持することにより高い洗浄効果を得ることができる。その結果、球体表面においてより高い清浄度を確保することができる。 According to the above configuration, the flexibility of the deformable member is ensured by using the porous member, and a high cleaning effect can be obtained by sandwiching the sphere in the fiber member impregnated with the cleaning agent. As a result, higher cleanliness can be ensured on the sphere surface.
 上記洗浄装置において好ましくは、上記洗浄剤は有機溶剤または水を含んでいる。このように上記洗浄装置においては、球体表面の洗浄に適した洗浄剤を適宜選択することができる。 In the cleaning apparatus, the cleaning agent preferably contains an organic solvent or water. Thus, in the said washing | cleaning apparatus, the cleaning agent suitable for washing | cleaning of the spherical surface can be selected suitably.
 上記洗浄装置において好ましくは、上記螺旋溝は、第1の面および第2の面のうち一方の面と、上記一方の面から第1の面および第2の面のうち他方の面に向かい突出する壁部の壁面とにより囲まれた領域である。上記空間を構成する上記第1および第2の面ならびに上記空間内における上記壁面は多孔質部材により形成される。 Preferably, in the cleaning device, the spiral groove protrudes from one surface of the first surface and the second surface and from the one surface to the other surface of the first surface and the second surface. It is the area | region enclosed by the wall surface of the wall part to perform. The first and second surfaces constituting the space and the wall surface in the space are formed by a porous member.
 上記構成によれば、研磨加工時に砥粒付ボンドが表面に付着した球体を上記洗浄装置で洗浄する際に、砥粒付ボンドは多孔質部材に含まれる空孔内に取り込まれるため、砥粒付ボンドにより球体の表面が傷つけられる不具合を抑制することができる。 According to the above configuration, the abrasive grain bond is taken into the pores included in the porous member when the sphere having the abrasive grain bond adhered to the surface during the polishing process is washed with the cleaning device. The problem that the surface of the sphere is damaged by the attached bond can be suppressed.
 上記洗浄装置において好ましくは、上記螺旋溝は、第1の面および第2の面のうち一方の面と、上記一方の面から第1の面および第2の面のうち他方の面に向かい突出する壁部の壁面とにより囲まれた領域である。また上記壁面は、上記一方の面よりも摩擦係数が大きい面である。 Preferably, in the cleaning device, the spiral groove protrudes from one surface of the first surface and the second surface and from the one surface to the other surface of the first surface and the second surface. It is the area | region enclosed by the wall surface of the wall part to perform. The wall surface is a surface having a larger coefficient of friction than the one surface.
 上記構成によれば、挟持面(第1の面および第2の面)により挟持された状態で螺旋溝に沿って移送される球体が壁面と接触した場合、挟持面と壁面との摩擦係数の差により球体の自転軸を変更させることができる。その結果、球体の表面をさらに均一に洗浄することができる。 According to the above configuration, when the sphere transferred along the spiral groove in a state of being sandwiched by the sandwiching surfaces (the first surface and the second surface) is in contact with the wall surface, the friction coefficient between the sandwiching surface and the wall surface is reduced. The rotation axis of the sphere can be changed by the difference. As a result, the surface of the sphere can be more uniformly cleaned.
 上記洗浄装置において好ましくは、上記螺旋溝は、螺旋軌道から軌道変更された部分を含んでいる。 Preferably, in the cleaning device, the spiral groove includes a portion that has been changed from a spiral track.
 上記構成によれば、軌道変更された上記部分において球体の自転軸を変更させることができる。その結果、球体の表面を一層均一に洗浄することができる。 According to the above configuration, the rotation axis of the sphere can be changed in the portion where the trajectory has been changed. As a result, the surface of the sphere can be more uniformly cleaned.
 上記洗浄装置において好ましくは、第1の部材および第2の部材は、回転軸が互いに偏心するように配置されている。 In the above cleaning apparatus, preferably, the first member and the second member are arranged so that the rotation axes are eccentric from each other.
 上記構成によれば、第1の部材および第2の部材を相対的に回転させたときの周速の差により球体の自転軸を変更させることができる。その結果、球体の表面を一層均一に洗浄することができる。 According to the above configuration, the rotation axis of the sphere can be changed by the difference in peripheral speed when the first member and the second member are relatively rotated. As a result, the surface of the sphere can be more uniformly cleaned.
 上記洗浄装置において好ましくは、第1の部材および第2の部材のうち上記螺旋溝が設けられた部材は、樹脂材料または金属材料を含んでいる。このように上記螺旋溝が設けられた部材の構成材料は、洗浄剤の成分などを考慮して適宜選択することができる。 Preferably, in the cleaning apparatus, the member provided with the spiral groove in the first member and the second member includes a resin material or a metal material. Thus, the constituent material of the member provided with the spiral groove can be appropriately selected in consideration of the component of the cleaning agent and the like.
 上記洗浄装置を備える球体の洗浄システムは好ましくは、複数の上記洗浄装置を備えている。また、上記球体の洗浄システムは好ましくは、上記複数の洗浄装置のうち一の洗浄装置により洗浄された球体を上記一の洗浄装置の下流側に位置する他の洗浄装置に送るための移送手段を備えている。上記構成によれば、複数の洗浄装置を用いることで球体の表面を一層均一に洗浄することができる。 The spherical cleaning system provided with the cleaning device preferably includes a plurality of the cleaning devices. The sphere cleaning system preferably includes a transfer means for sending a sphere cleaned by one of the plurality of cleaning devices to another cleaning device located downstream of the one cleaning device. I have. According to the above configuration, the surface of the sphere can be more uniformly cleaned by using a plurality of cleaning devices.
 本発明に従った球体の洗浄方法は、球体を準備する工程と、球体を洗浄するための洗浄装置を準備する工程とを備えている。上記洗浄装置は、第1の面を有する第1の部材と、第1の面に対向する第2の面を有する第2の部材と、第1の面と第2の面との間の空間に球体を投入するための投入部と、上記空間から球体を排出するための排出部とを含んでいる。第1の面および第2の面のうち一方の面には、投入部から排出部まで球体を案内するための螺旋溝が設けられている。上記球体の洗浄方法は、球体を投入部から上記空間に投入する工程と、上記空間において球体を洗浄する工程と、洗浄された球体を排出部から排出する工程とをさらに備えている。球体を洗浄する工程では、第1の面と第2の面とにより球体を挟持しつつ第1の面と第2の面とを互いに相対的に回転させることにより球体を自転させ、自転した球体が螺旋溝において投入部から排出部まで案内されつつ洗浄される。 The method for cleaning a sphere according to the present invention includes a step of preparing a sphere and a step of preparing a cleaning device for cleaning the sphere. The cleaning device includes a first member having a first surface, a second member having a second surface opposite to the first surface, and a space between the first surface and the second surface. And a discharge portion for discharging the sphere from the space. One surface of the first surface and the second surface is provided with a spiral groove for guiding the sphere from the input portion to the discharge portion. The method for cleaning a sphere further includes a step of inserting a sphere into the space from the input portion, a step of cleaning the sphere in the space, and a step of discharging the cleaned sphere from the discharge portion. In the step of cleaning the sphere, the sphere is rotated by rotating the first surface and the second surface relative to each other while holding the sphere between the first surface and the second surface, and the rotated sphere Is cleaned while being guided in the spiral groove from the input part to the discharge part.
 本発明に従った球体の洗浄方法では、第1の面および第2の面により球体を挟持しつつ第1の面と第2の面とを互いに相対的に回転させることにより、球体を自転させることができる。そして、自転した球体を螺旋溝において投入部から排出部まで案内しつつ洗浄することにより、挟持面(第1の面および第2の面)に対する自転軸の傾きを変更させつつ球体の表面を洗浄することができる。その結果、球体の表面全体においてより均一な清浄度を確保することができる。したがって、本発明に従った球体の洗浄方法によれば、球体の表面を均一に洗浄することが可能な球体の洗浄方法を提供することができる。 In the sphere cleaning method according to the present invention, the sphere is rotated by rotating the first surface and the second surface relative to each other while holding the sphere between the first surface and the second surface. be able to. Then, the surface of the sphere is cleaned while changing the inclination of the rotation axis with respect to the sandwiching surfaces (first surface and second surface) by cleaning the rotating sphere while guiding it from the input portion to the discharge portion in the spiral groove. can do. As a result, a more uniform cleanliness can be ensured over the entire surface of the sphere. Therefore, according to the method for cleaning a sphere according to the present invention, it is possible to provide a method for cleaning a sphere that can uniformly clean the surface of the sphere.
 以上の説明から明らかなように、本発明に従った洗浄装置、球体の洗浄システムおよび球体の洗浄方法によれば、球体の表面を均一に洗浄することが可能な洗浄装置、球体の洗浄システムおよび球体の洗浄方法を提供することができる。 As is apparent from the above description, according to the cleaning device, the sphere cleaning system and the sphere cleaning method according to the present invention, the cleaning device capable of uniformly cleaning the surface of the sphere, the sphere cleaning system, and A method for cleaning a sphere can be provided.
本発明の実施の形態1に係る球体の洗浄システムの構成を概略的に示す斜視図である。It is a perspective view which shows roughly the structure of the washing | cleaning system of the spherical body which concerns on Embodiment 1 of this invention. 本発明の実施の形態1に係る球体の洗浄システムの構成の第1例を概略的に示す平面図である。It is a top view which shows roughly the 1st example of a structure of the washing | cleaning system of the spherical body which concerns on Embodiment 1 of this invention. 図2中の線分III-IIIに沿った断面構造を示す概略図である。FIG. 3 is a schematic diagram showing a cross-sectional structure along a line segment III-III in FIG. 本発明の実施の形態1に係る球体の洗浄システムの構成の第2例を概略的に示す平面図である。It is a top view which shows roughly the 2nd example of a structure of the washing | cleaning system of the spherical body which concerns on Embodiment 1 of this invention. 本発明の実施の形態1に係る球体の洗浄方法を概略的に示すフローチャートである。It is a flowchart which shows roughly the washing | cleaning method of the sphere which concerns on Embodiment 1 of this invention. 図2中の領域VIにおける球体の自転軸の傾きを示す概略図である。It is the schematic which shows the inclination of the rotating shaft of the spherical body in the area | region VI in FIG. 図2中の領域VIIにおける球体の自転軸の傾きを示す概略図である。It is the schematic which shows the inclination of the rotating shaft of the spherical body in the area | region VII in FIG. 図2中の領域VIIIにおける球体の自転軸の傾きを示す概略図である。It is the schematic which shows the inclination of the rotating shaft of the spherical body in the area | region VIII in FIG. 本発明の実施の形態2に係る球体の洗浄システムの構成を概略的に示す平面図である。It is a top view which shows roughly the structure of the washing | cleaning system of the spherical body which concerns on Embodiment 2 of this invention. 球体の自転軸の変化を示す概略図である。It is the schematic which shows the change of the rotating shaft of a spherical body. 本発明の実施の形態3に係る球体の洗浄システムの構成を示す概略図である。It is the schematic which shows the structure of the washing | cleaning system of the spherical body which concerns on Embodiment 3 of this invention. 本発明の実施の形態4に係る球体の洗浄システムの構成の第1例を示す概略図である。It is the schematic which shows the 1st example of a structure of the washing | cleaning system of the spherical body which concerns on Embodiment 4 of this invention. 本発明の実施の形態4に係る球体の洗浄システムの構成の第2例を示す概略図である。It is the schematic which shows the 2nd example of a structure of the washing | cleaning system of the spherical body which concerns on Embodiment 4 of this invention. 本発明の実施の形態5に係る球体の洗浄システムにおける、図2中の線分III-IIIに沿った部分に対応する部分の断面構造を示す概略図である。FIG. 6 is a schematic diagram showing a cross-sectional structure of a portion corresponding to a portion along line III-III in FIG. 2 in a spherical body cleaning system according to Embodiment 5 of the present invention.
 以下、本発明の実施の形態について図面を参照しつつ説明する。
 (実施の形態1)
 (球体の洗浄システムの構成)
 まず、本発明の一実施の形態である実施の形態1に係る球体の洗浄システムの構成について、図1~図3を参照しつつ説明する。本実施の形態に係る球体の洗浄システム1は、球体30を洗浄するための洗浄装置10を備えている。
Embodiments of the present invention will be described below with reference to the drawings.
(Embodiment 1)
(Configuration of sphere cleaning system)
First, the configuration of a sphere cleaning system according to Embodiment 1, which is one embodiment of the present invention, will be described with reference to FIGS. The spherical body cleaning system 1 according to the present embodiment includes a cleaning device 10 for cleaning the spherical body 30.
 球体30は、たとえば軸受用の鋼球や窒素珪素球などのセラミックス球であってもよいし、その他の球体であってもよい。また図1では、球体の洗浄システム1が一つの洗浄装置10を備える場合が示されているが、後述の他の実施の形態で説明されるように、本発明の球体の洗浄システムは複数の洗浄装置を備えていてもよい。 The sphere 30 may be, for example, a ceramic sphere such as a steel ball for a bearing or a nitrogen silicon sphere, or may be another sphere. Further, FIG. 1 shows a case where the spherical cleaning system 1 includes a single cleaning device 10, but the spherical cleaning system of the present invention includes a plurality of spherical cleaning systems as described in other embodiments described later. A cleaning device may be provided.
 図3を参照して、洗浄装置10は、第1の面11aを有する第1の部材としての螺旋溝盤11と、第1の面11aに対向する第2の面20aを有する第2の部材としての平円盤20とを含んでいる。第1の面11aおよび第2の面20aは、球体30を挟持する挟持面である。 Referring to FIG. 3, the cleaning apparatus 10 includes a spiral flutes 11 as a first member having a first surface 11 a and a second member having a second surface 20 a facing the first surface 11 a. As a flat disk 20. The first surface 11 a and the second surface 20 a are clamping surfaces that sandwich the sphere 30.
 第1の面11aおよび第2の面20aは、互いに相対的に回転可能に構成されている。すなわち、第1の面11aが固定されて第2の面20aが回転可能な構成であってもよいし、第2の面20aが固定されて第1の面11aが回転可能な構成であってもよいし、第1の面11aおよび第2の面20aの両方が回転可能な構成であってもよい。 The first surface 11a and the second surface 20a are configured to be rotatable relative to each other. That is, the first surface 11a may be fixed and the second surface 20a may be rotatable, or the second surface 20a may be fixed and the first surface 11a may be rotated. Alternatively, both the first surface 11a and the second surface 20a may be rotatable.
 図1~図3を参照して、洗浄装置10は、第1の面11aと第2の面20aとの間の空間Sに球体30を投入するための投入部12と、空間Sから球体30を排出するための排出部13とを含んでいる。投入部12は螺旋溝盤11の中央部に設けられていてもよく、排出部13は螺旋溝盤11の外周面の一部に設けられていてもよい。 With reference to FIGS. 1 to 3, the cleaning apparatus 10 includes an input unit 12 for inputting the sphere 30 into the space S between the first surface 11a and the second surface 20a, and the sphere 30 from the space S. The discharge part 13 for discharging | emitting this. The input part 12 may be provided in the center part of the spiral flutes 11, and the discharge part 13 may be provided in a part of the outer peripheral surface of the spiral flutes 11.
 図2を参照して、螺旋溝盤11は平面視において円形を有しており、平面視においてほぼ円形の渦巻き形状を有する螺旋溝15内に球体30が配置される。図2および図3を参照して、螺旋溝15は、投入部12から排出部13まで球体30を案内するための部分である。螺旋溝15はたとえばアルキメデスの螺旋であってもよく、ベルヌーイの螺旋であってもよい。ただし螺旋溝15はそのような規則正しい形状のものに限られない。螺旋溝15は上記構成により、投入部12から空間S内に投入された球体30を螺旋溝15に沿って排出部13にまで案内し、洗浄後の球体30を排出部13より洗浄装置10の外部に排出可能となっている。なお、螺旋溝15は、第1の面11aおよび第2の面20aのうち一方の面に設けられていればよく、第2の面20aに設けられていてもよい。また螺旋溝15の方向は、図2に示すように螺旋溝盤11の上方から平面的に見て時計周りであってもよいし、反時計周りであってもよい。 Referring to FIG. 2, the spiral flutes 11 have a circular shape in a plan view, and a sphere 30 is disposed in a spiral groove 15 having a substantially circular spiral shape in a plan view. With reference to FIGS. 2 and 3, the spiral groove 15 is a part for guiding the sphere 30 from the input part 12 to the discharge part 13. The spiral groove 15 may be, for example, an Archimedean spiral or a Bernoulli spiral. However, the spiral groove 15 is not limited to such a regular shape. With the above configuration, the spiral groove 15 guides the sphere 30 introduced into the space S from the input portion 12 to the discharge portion 13 along the spiral groove 15, and the cleaned sphere 30 is transferred from the discharge portion 13 to the cleaning device 10. It can be discharged to the outside. In addition, the spiral groove 15 should just be provided in one surface among the 1st surface 11a and the 2nd surface 20a, and may be provided in the 2nd surface 20a. The direction of the spiral groove 15 may be clockwise as viewed in plan from above the spiral groove 11 as shown in FIG. 2, or may be counterclockwise.
 螺旋溝15が設けられた部材である第1の部材として螺旋溝盤11は樹脂材料または金属材料を含んでおり、好ましくは樹脂材料を含んでいる。より具体的には、螺旋溝盤11の材質は洗浄剤の成分を考慮して適宜選択することが可能であり、たとえばポリ塩化ビニル(PVC:Poly Vinyl Chloride)である。これにより、油系や水系の洗浄剤を用いた場合でも螺旋溝盤11の膨潤を抑制することができる。また金属製の螺旋溝盤ではセラミック球の表面に金属が擦れて付着する場合があるのに対し、PVC製の螺旋溝盤11ではこれを抑制することができる。 As the first member, which is a member provided with the spiral groove 15, the spiral groove plate 11 includes a resin material or a metal material, and preferably includes a resin material. More specifically, the material of the spiral flutes 11 can be appropriately selected in consideration of the components of the cleaning agent, for example, polyvinyl chloride (PVC: Poly Vinyl Chloride). Thereby, even when oil-based or water-based cleaning agents are used, the swelling of the spiral flutes 11 can be suppressed. Further, in the case of metal spiral flutes, metal may rub against and adhere to the surface of the ceramic sphere, whereas in PVC spiral flutes 11 this can be suppressed.
 図3を参照して、螺旋溝15は、第1の面11aと壁面40aとにより囲まれた領域である。壁面40aは、第1の面11aから第2の面20aに向かい突出する壁部40に含まれる。壁面40aは、第1の面11aよりも摩擦係数が大きい面であってもよい。これにより、球体30を壁面40aと接触させることで、壁面40aおよび第1の面11aの摩擦係数の差に起因して球体30の自転軸を変更させることができるため、球体30の表面をより均一に洗浄することができる。なお、壁面40aの摩擦係数を第1の面11aの摩擦係数よりも大きくするための方法としては、たとえば壁面40aに荒らし加工を施す方法や壁面40aにコーティング層を設ける方法などが挙げられる。 Referring to FIG. 3, the spiral groove 15 is a region surrounded by the first surface 11a and the wall surface 40a. The wall surface 40a is included in the wall portion 40 that protrudes from the first surface 11a toward the second surface 20a. The wall surface 40a may be a surface having a larger coefficient of friction than the first surface 11a. Thereby, since the rotation axis of the spherical body 30 can be changed due to the difference in the friction coefficient between the wall surface 40a and the first surface 11a by bringing the spherical body 30 into contact with the wall surface 40a, the surface of the spherical body 30 is more It can be washed uniformly. Examples of a method for making the friction coefficient of the wall surface 40a larger than the friction coefficient of the first surface 11a include a method of roughening the wall surface 40a and a method of providing a coating layer on the wall surface 40a.
 第2の部材としての平円盤20は、挟持面である第2の面20aが平面から球体30の表面形状に沿った曲面に変形することが可能な変形部材である。変形部材である平円盤20は、多孔質部材22と多孔質部材22上に配置される繊維部材21とを含んでいる。 The flat disk 20 as the second member is a deformable member capable of deforming the second surface 20a, which is a clamping surface, from a flat surface to a curved surface along the surface shape of the sphere 30. The flat disk 20 that is a deformable member includes a porous member 22 and a fiber member 21 disposed on the porous member 22.
 多孔質部材22はたとえばスポンジなどの弾性部材である。繊維部材21は挟持面である第2の面20aを構成している。繊維部材21は布(たとえば不織布)であり、球体30を洗浄するための洗浄剤が含浸されている。洗浄剤は有機溶剤や水を含んでおり、たとえば白灯油である。 The porous member 22 is an elastic member such as a sponge. The fiber member 21 constitutes a second surface 20a that is a clamping surface. The fiber member 21 is a cloth (for example, non-woven fabric) and is impregnated with a cleaning agent for cleaning the sphere 30. The cleaning agent contains an organic solvent and water, such as white kerosene.
 なお、変形部材である平円盤20は、繊維部材21が省略されて多孔質部材22のみにより構成されてもよいが、繊維部材21を設けることにより球体30の洗浄作用をより向上させることができる。また、平円盤20が変形部材である場合に限られず、螺旋溝15が設けられた螺旋溝盤11が上記変形部材として構成されていてもよい。 The flat disk 20 that is a deformable member may be configured by only the porous member 22 without the fiber member 21, but the cleaning action of the sphere 30 can be further improved by providing the fiber member 21. . Moreover, it is not restricted to the case where the flat disk 20 is a deformation | transformation member, The spiral groove board 11 provided with the spiral groove 15 may be comprised as said deformation | transformation member.
 図4を参照して、螺旋溝盤16は平面視においてほぼ多角形状(五角形状)の渦巻き形状を有する螺旋溝15を有する構成となっている。この点において図4の螺旋溝盤16は図2の螺旋溝盤11と異なっているが、他の点においては図2の螺旋溝盤11と同じであり、断面構造についても基本的に図3と同じである。このため図4の螺旋溝盤16に関する詳細な説明を省略する。 Referring to FIG. 4, the spiral groove 16 has a spiral groove 15 having a substantially polygonal (pentagonal) spiral shape in plan view. In this respect, the spiral flutes 16 of FIG. 4 are different from the spiral flutes 11 of FIG. 2, but are otherwise the same as the spiral flutes 11 of FIG. Is the same. For this reason, the detailed description regarding the spiral flutes 16 of FIG. 4 is omitted.
 (球体の洗浄方法)
 次に、上記球体の洗浄システム1を用いて実施される本実施の形態に係る球体の洗浄方法について説明する。図5を参照して、まず工程(S10)として球体を準備する工程が実施される。この工程(S10)では、精密な研磨加工が施された軸受用の鋼球やセラミック球などの球体30が準備される。またこの工程(S10)と並んで、球体30を洗浄するための洗浄装置を準備する工程(S20)が実施される。この工程(S20)では、上記本実施の形態に係る球体の洗浄システム1の洗浄装置10が準備される。
(How to clean the sphere)
Next, a sphere cleaning method according to the present embodiment, which is performed using the sphere cleaning system 1, will be described. With reference to FIG. 5, the process of preparing a spherical body is first implemented as process (S10). In this step (S10), a spherical body 30 such as a steel ball or a ceramic ball for bearing that has been subjected to precise polishing is prepared. In addition to this step (S10), a step (S20) of preparing a cleaning device for cleaning the sphere 30 is performed. In this step (S20), cleaning device 10 of sphere cleaning system 1 according to the present embodiment is prepared.
 次に、工程(S30)として球体30を投入部12から空間Sに投入する工程が実施される。この工程(S30)では、球体30同士の衝突や接触を抑制するため、たとえば0.5秒の間隔で球体30が連続的に投入されてもよい。すなわち、上記球体の洗浄システム1では第1の面11aの平面内に螺旋溝15が設けられているため、球体30の投入間隔を調整することにより、球体30同士の衝突や接触を抑制することができる。 Next, as a step (S30), a step of throwing the sphere 30 into the space S from the throwing unit 12 is performed. In this step (S30), in order to suppress collision and contact between the spheres 30, the spheres 30 may be continuously introduced at intervals of 0.5 seconds, for example. That is, in the spherical body cleaning system 1, since the spiral groove 15 is provided in the plane of the first surface 11 a, the collision and contact between the spherical bodies 30 can be suppressed by adjusting the insertion interval of the spherical bodies 30. Can do.
 次に、工程(S40)として空間Sにおいて球体30を洗浄する工程が実施される。この工程(S40)では、図2および図3を参照して、第1の面11aと第2の面20aとにより球体30を挟持しつつ第1の面11aと第2の面20aとを互いに相対的に回転させることにより球体30を自転させる。このとき、第1の面11aが固定されて第2の面20aのみが回転してもよいし、第2の面20aが固定されて第1の面11aのみが回転してもよいし、第1の面11aおよび第2の面20aの両方が回転してもよい。そして、自転した球体30が螺旋溝15において投入部12から排出部13まで案内されつつ洗浄される。このとき、螺旋溝15の螺旋軌道に沿って球体30が移送されることにより、挟持面(第1の面11aおよび第2の面20a)に対する自転軸の傾きが変化する。なお、球体30は繊維部材21に含浸された白灯油によりウェット洗浄されてもよいが、球体30の表面に気体を吹き付けることによりドライ洗浄されてもよい。 Next, a step of cleaning the sphere 30 in the space S is performed as a step (S40). In this step (S40), referring to FIG. 2 and FIG. 3, the first surface 11a and the second surface 20a are connected to each other while holding the sphere 30 between the first surface 11a and the second surface 20a. The sphere 30 is rotated by rotating it relatively. At this time, the first surface 11a may be fixed and only the second surface 20a may rotate, the second surface 20a may be fixed and only the first surface 11a may rotate, Both the first surface 11a and the second surface 20a may rotate. Then, the rotated sphere 30 is cleaned while being guided from the input unit 12 to the discharge unit 13 in the spiral groove 15. At this time, when the spherical body 30 is transferred along the spiral trajectory of the spiral groove 15, the inclination of the rotation axis with respect to the sandwiching surfaces (the first surface 11a and the second surface 20a) changes. The sphere 30 may be wet-cleaned with white kerosene impregnated in the fiber member 21, but may be dry-cleaned by blowing gas onto the surface of the sphere 30.
 ここで、螺旋溝15に沿って移送される球体30の自転軸の傾きの変化について図6~図8を参照して説明する。図6は、図2中の領域VIにおける球体30の自転軸Pの傾きを示している。図7は、図2中の領域VIIにおける球体30の自転軸Pの傾きを示している。図8は、図2中の領域VIIIにおける球体30の自転軸Pの傾きを示している。なお、図3を参照して説明したように、一方の挟持面である第2の面20aは球体30を挟持する際に曲面状に変形するが、図6~図8では平面状態の第2の面20aが示されており、これに対する球体30の自転軸Pの傾きが示されている。 Here, the change in the inclination of the rotation axis of the sphere 30 transferred along the spiral groove 15 will be described with reference to FIGS. FIG. 6 shows the inclination of the rotation axis P of the sphere 30 in the region VI in FIG. FIG. 7 shows the inclination of the rotation axis P of the sphere 30 in the region VII in FIG. FIG. 8 shows the inclination of the rotation axis P of the sphere 30 in the region VIII in FIG. As described with reference to FIG. 3, the second surface 20a, which is one of the clamping surfaces, is deformed into a curved surface when the sphere 30 is clamped. In FIGS. The surface 20a is shown, and the inclination of the rotation axis P of the sphere 30 is shown.
 投入直後の球体30の自転軸Pが挟持面(第2の面20a)に対して交差するのに対し(図6)、排出直前の球体30の自転軸Pは挟持面(第2の面20a)に対して略水平である(図8)。すなわち、図6~図8に示されるように、投入部12から投入された球体30は、螺旋溝15に沿って排出部13にまで移送される過程において、挟持面に対する傾斜角が徐々に小さくなるように変化する。 While the rotation axis P of the sphere 30 immediately after the insertion intersects the clamping surface (second surface 20a) (FIG. 6), the rotation axis P of the sphere 30 just before discharge is the clamping surface (second surface 20a). ) Substantially horizontal (FIG. 8). That is, as shown in FIGS. 6 to 8, the sphere 30 thrown from the throwing portion 12 has a gradually decreasing inclination angle with respect to the clamping surface in the process of being transferred to the discharge portion 13 along the spiral groove 15. It changes to become.
 なお特に図4のように多角形状の螺旋溝15を有する螺旋溝盤16を用いる場合には、球体30は螺旋溝15の平面視における角部を通過する際にその自転軸Pの傾斜角を変更することができる。 In particular, when the spiral groove 16 having the polygonal spiral groove 15 is used as shown in FIG. 4, the spherical body 30 has an inclination angle of the rotation axis P when passing through the corner portion in plan view of the spiral groove 15. Can be changed.
 次に、工程(S50)として洗浄された球体30を排出部13から排出する工程が実施される。以上の工程(S10)~(S50)が順に実施されることにより球体30の洗浄が終了し、本実施の形態に係る球体の洗浄方法が完了する。 Next, a step of discharging the cleaned sphere 30 from the discharge unit 13 is performed as a step (S50). By performing the steps (S10) to (S50) in order, the cleaning of the sphere 30 is completed, and the sphere cleaning method according to the present embodiment is completed.
 以上のように、本実施の形態に係る球体の洗浄システム1では、第1の面11aおよび第2の面20aにより球体30を挟持し、第1の面11aおよび第2の面20aを互いに相対的に回転させることにより、球体30を自転させつつ洗浄することができる。そして、自転した球体30を螺旋溝15において投入部12から排出部13まで案内しつつ洗浄することにより、自転軸の傾きを変更させつつ球体30の表面を洗浄することができる。その結果、球体30の表面全体においてより均一な清浄度を確保することができ、さらに超音波洗浄やブラシ洗浄などに比べてより高い清浄度を得ることができる。したがって、本実施の形態に係る球体の洗浄システム1および球体の洗浄方法によれば、球体30の表面を均一に洗浄することができる。また上記本実施の形態に係る球体の洗浄システム1は、種々のサイズを有する球体30の洗浄に適用可能であるとともに、省電力であり、さらに省スペースで設置することが可能である。 As described above, in the spherical cleaning system 1 according to the present embodiment, the spherical body 30 is sandwiched between the first surface 11a and the second surface 20a, and the first surface 11a and the second surface 20a are relative to each other. By rotating it automatically, the sphere 30 can be washed while rotating. Then, the surface of the sphere 30 can be cleaned while changing the inclination of the rotation axis by cleaning the rotated sphere 30 while guiding it from the input portion 12 to the discharge portion 13 in the spiral groove 15. As a result, more uniform cleanliness can be ensured over the entire surface of the sphere 30, and higher cleanliness can be obtained as compared with ultrasonic cleaning, brush cleaning, and the like. Therefore, according to the sphere cleaning system 1 and the sphere cleaning method according to the present embodiment, the surface of the sphere 30 can be cleaned uniformly. In addition, the sphere cleaning system 1 according to the present embodiment can be applied to cleaning the sphere 30 having various sizes, is power-saving, and can be installed in a space-saving manner.
 (実施の形態2)
 次に、本発明の他の実施の形態である実施の形態2について説明する。実施の形態2に係る球体の洗浄システムは、基本的には上記実施の形態1に係る球体の洗浄システム1と同様の構成を有し、かつ同様の効果を奏する。しかし、実施の形態2に係る球体の洗浄システムは、螺旋溝の構成において上記実施の形態1に係る球体の洗浄システム1とは異なっている。
(Embodiment 2)
Next, Embodiment 2 which is another embodiment of the present invention will be described. The sphere cleaning system according to the second embodiment has basically the same configuration as the sphere cleaning system 1 according to the first embodiment and has the same effects. However, the spherical cleaning system according to the second embodiment is different from the spherical cleaning system 1 according to the first embodiment in the configuration of the spiral groove.
 図9を参照して、第1の部材としての螺旋溝盤51には、投入部52から排出部53まで球体30を案内するための螺旋溝55が設けられている。螺旋溝55は、螺旋軌道から軌道変更された部分を含んでいる。より具体的には、螺旋溝55は、螺旋軌道部55aと、螺旋軌道部55aの間に位置する複数の(図9では3つの)軌道変更部55bとを有している。軌道変更部55bは、螺旋軌道部55aの接線方向に交差する方向に延在するように設けられている。 Referring to FIG. 9, the spiral groove 51 as the first member is provided with a spiral groove 55 for guiding the sphere 30 from the input part 52 to the discharge part 53. The spiral groove 55 includes a portion whose trajectory is changed from the spiral trajectory. More specifically, the spiral groove 55 includes a spiral track portion 55a and a plurality of (three in FIG. 9) track change portions 55b positioned between the spiral track portions 55a. The trajectory changing portion 55b is provided so as to extend in a direction intersecting the tangential direction of the spiral trajectory portion 55a.
 上記本実施の形態に係る球体の洗浄システムによれば、投入部52より投入された球体30の自転軸を軌道変更部55bにおいて変更させることができる。より具体的には、図10に示すように、球体30の自転軸Pを軌道変更部55bを通過する際に自転軸P’に変更させることができる。その結果、球体30の表面をより均一に洗浄することができる。なお、軌道変更部55bの位置や数は特に限定されないが、図9に示すように螺旋溝盤51の中央部を挟んで互いに対向するように配置されていてもよい。また軌道変更部55bの長さや螺旋軌道部55aの接線に対して成す角度は、球体30の表面を均一に洗浄するために適宜選択することが可能である。 According to the sphere cleaning system according to the present embodiment, the rotation axis of the sphere 30 input from the input unit 52 can be changed by the trajectory changing unit 55b. More specifically, as shown in FIG. 10, the rotation axis P of the sphere 30 can be changed to the rotation axis P ′ when passing through the trajectory changing unit 55b. As a result, the surface of the sphere 30 can be more uniformly cleaned. The position and number of the trajectory changing portions 55b are not particularly limited, but may be arranged so as to face each other across the central portion of the spiral flutes 51 as shown in FIG. Further, the length of the trajectory changing portion 55b and the angle formed with respect to the tangent line of the spiral trajectory portion 55a can be appropriately selected in order to clean the surface of the sphere 30 uniformly.
 (実施の形態3)
 次に、本発明のさらに他の実施の形態である実施の形態3について説明する。実施の形態3に係る球体の洗浄システムは、基本的には上記実施の形態1または2に係る球体の洗浄システムと同様の構成を有し、かつ同様の効果を奏する。しかし、実施の形態3に係る球体の洗浄システムは、洗浄装置の設置数において上記実施の形態1および2に係る球体の洗浄システムとは異なっている。
(Embodiment 3)
Next, Embodiment 3 which is still another embodiment of the present invention will be described. The spherical body cleaning system according to Embodiment 3 has basically the same configuration as the spherical body cleaning system according to Embodiment 1 or 2 described above, and has the same effects. However, the spherical cleaning system according to the third embodiment is different from the spherical cleaning systems according to the first and second embodiments in the number of installed cleaning apparatuses.
 図11を参照して、実施の形態3に係る球体の洗浄システム3は、複数の(図11では4つ)の洗浄装置10A,10B,10C,10D(10A~10D)を備えている。また球体の洗浄システム3は、投入手段60と移送手段61とをさらに備えている。 Referring to FIG. 11, the spherical cleaning system 3 according to the third embodiment includes a plurality (four in FIG. 11) of cleaning apparatuses 10A, 10B, 10C, and 10D (10A to 10D). Further, the spherical body cleaning system 3 further includes an input unit 60 and a transfer unit 61.
 投入手段60は、最上流に位置する洗浄装置10Aに被洗浄物である球体30を投入するためのものである。移送手段61は、複数の洗浄装置10A~10Dのうち一の洗浄装置により洗浄された球体30を上記一の洗浄装置の下流側に位置する他の洗浄装置に送るためのものである。すなわち、移送手段61は、洗浄装置10Aにより洗浄された球体30を洗浄装置10Bへ移送するために、洗浄装置10Aおよび洗浄装置10Bの間に設けられている。また移送手段61は、洗浄装置10Bにより洗浄された球体30を洗浄装置10Cへ移送するために、洗浄装置10Bおよび洗浄装置10Cの間に設けられている。また移送手段61は、洗浄装置10Cにより洗浄された球体30を洗浄装置10Dへ移送するために、洗浄装置10Cおよび洗浄装置10Dの間に設けられている。 The throwing means 60 is for throwing the sphere 30 to be cleaned into the cleaning apparatus 10A located at the most upstream. The transfer means 61 is for sending the sphere 30 cleaned by one of the plurality of cleaning devices 10A to 10D to another cleaning device located downstream of the one cleaning device. That is, the transfer means 61 is provided between the cleaning device 10A and the cleaning device 10B in order to transfer the sphere 30 cleaned by the cleaning device 10A to the cleaning device 10B. Further, the transfer means 61 is provided between the cleaning device 10B and the cleaning device 10C in order to transfer the sphere 30 cleaned by the cleaning device 10B to the cleaning device 10C. The transfer means 61 is provided between the cleaning device 10C and the cleaning device 10D in order to transfer the sphere 30 cleaned by the cleaning device 10C to the cleaning device 10D.
 上記本実施の形態に係る球体の洗浄システム3によれば、一つの洗浄装置では球体30を十分に洗浄することが困難である場合でも、複数の洗浄装置10A~10Dを用いることにより、球体表面における清浄度の均一性をより向上させることができる。 According to the sphere cleaning system 3 according to the present embodiment, even when it is difficult to sufficiently clean the sphere 30 with a single cleaning device, the surface of the sphere can be obtained by using a plurality of cleaning devices 10A to 10D. The uniformity of cleanliness can be further improved.
 (実施の形態4)
 次に、本発明のさらに他の実施の形態である実施の形態4について説明する。実施の形態4に係る球体の洗浄システムは、基本的には上記実施の形態1~3に係る球体の洗浄システムと同様の構成を有し、かつ同様の効果を奏する。しかし、実施の形態4に係る球体の洗浄システムは、第1の部材および第2の部材の相対的な位置関係において上記実施の形態1~3に係る球体の洗浄システムとは異なっている。
(Embodiment 4)
Next, a fourth embodiment which is still another embodiment of the present invention will be described. The sphere cleaning system according to the fourth embodiment has basically the same configuration as the sphere cleaning system according to the first to third embodiments and has the same effects. However, the spherical cleaning system according to the fourth embodiment is different from the spherical cleaning system according to the first to third embodiments in the relative positional relationship between the first member and the second member.
 図12を参照して、実施の形態4に係る球体の洗浄システムでは、第1の部材としての螺旋溝盤70および第2の部材としての平円盤80は回転軸P1,P2をそれぞれ有しており、当該回転軸P1,P2の周りにおいて回転可能に構成されている。また螺旋溝盤70および平円盤80は、回転軸P1,P2が互いに偏心するように配置されている。具体的には、螺旋溝盤70の回転軸P1と平円盤80の回転軸P2との偏心が、螺旋溝盤70の半径よりも大きくなっている。このように偏心の量が大きい場合には、螺旋溝盤70を回転させ、かつ平円盤80をゆっくり回転させることにより、球体30の自転軸を変更させることができる。これにより、上記実施の形態4に係る球体の洗浄システムによれば、螺旋溝盤70および平円盤80を相対的に回転させたときの周速の差により球体30の自転軸を変更させることができる。その結果、球体30の表面を一層均一に洗浄することができる。 Referring to FIG. 12, in the spherical body cleaning system according to the fourth embodiment, the spiral groove disk 70 as the first member and the flat disk 80 as the second member have rotation axes P1 and P2, respectively. And is configured to be rotatable around the rotation axes P1 and P2. Further, the spiral groove disk 70 and the flat disk 80 are arranged such that the rotation axes P1 and P2 are eccentric from each other. Specifically, the eccentricity between the rotation axis P 1 of the spiral groove disk 70 and the rotation axis P 2 of the flat disk 80 is larger than the radius of the spiral groove disk 70. When the amount of eccentricity is large as described above, the rotation axis of the sphere 30 can be changed by rotating the spiral groove 70 and slowly rotating the flat disk 80. Thereby, according to the spherical body cleaning system according to the fourth embodiment, the rotation axis of the spherical body 30 can be changed by the difference in peripheral speed when the spiral groove disk 70 and the flat disk 80 are relatively rotated. it can. As a result, the surface of the sphere 30 can be more uniformly cleaned.
 図13を参照して、ここでは螺旋溝盤70の回転軸P1と平円盤80の回転軸P2との偏心が、螺旋溝盤70の投入部12の回転軸P1に対する半径よりも小さくなっている。この場合、螺旋溝盤70は回転させずに平円盤80のみを回転させることにより、球体30の自転軸を変更させることができる。 Referring to FIG. 13, here, the eccentricity between the rotation axis P1 of the spiral groove disk 70 and the rotation axis P2 of the flat disk 80 is smaller than the radius of the insertion portion 12 of the spiral groove disk 70 with respect to the rotation axis P1. . In this case, the rotation axis of the sphere 30 can be changed by rotating only the flat disk 80 without rotating the spiral groove 70.
 (実施の形態5)
 次に、本発明のさらに他の実施の形態である実施の形態5について説明する。実施の形態5に係る球体の洗浄システムは、基本的には上記実施の形態1~4に係る球体の洗浄システムと同様の構成を有し、かつ同様の効果を奏する。しかし、実施の形態5に係る球体の洗浄システムは、第1の部材および第2の部材の構成材料において上記実施の形態1~4に係る球体の洗浄システムとは異なっている。
(Embodiment 5)
Next, Embodiment 5 which is still another embodiment of the present invention will be described. The spherical body cleaning system according to Embodiment 5 has basically the same configuration as the spherical body cleaning systems according to Embodiments 1 to 4 described above, and has the same effects. However, the spherical cleaning system according to the fifth embodiment is different from the spherical cleaning system according to the first to fourth embodiments in the constituent materials of the first member and the second member.
 図14を参照して、実施の形態5における第1の部材としての螺旋溝盤11は、実施の形態1の螺旋溝盤11(図3参照)と同様に樹脂材料または金属材料を含む螺旋溝盤土台部14と、多孔質部材22とから構成される。また実施の形態5においても、実施の形態1と同様に、第2の部材としての平円盤20を有している。 Referring to FIG. 14, spiral grooving 11 as the first member in the fifth embodiment is a helical groove including a resin material or a metal material, similar to spiral grooving 11 (see FIG. 3) in the first embodiment. The base plate part 14 and the porous member 22 are configured. Further, the fifth embodiment also has a flat disk 20 as a second member, as in the first embodiment.
 ここで螺旋溝盤11を構成する螺旋溝盤土台部14は、壁部40の突出形状などを含む螺旋溝盤11の全体の形状を構成する土台となる部分である。螺旋溝盤11は樹脂材料を含んでいることが好ましいが、より具体的には、螺旋溝盤11の材質はたとえばポリ塩化ビニル(PVC:Poly Vinyl Chloride)である。 Here, the spiral groove base portion 14 constituting the spiral groove plate 11 is a portion that forms the foundation of the entire shape of the spiral groove plate 11 including the protruding shape of the wall portion 40 and the like. The spiral flutes 11 preferably contain a resin material, but more specifically, the material of the spiral flutes 11 is, for example, polyvinyl chloride (PVC: Poly Vinyl Chloride).
 これに対して螺旋溝盤11を構成する多孔質部材22は、螺旋溝盤土台部14の平円盤20側の表面を覆うように薄膜状に形成されている。すなわち螺旋溝盤11における多孔質部材22は、平円盤20に対向する第1の面11aと、螺旋溝15内の壁部40を覆い壁面40aとを構成するように形成されている。 On the other hand, the porous member 22 constituting the spiral groove plate 11 is formed in a thin film so as to cover the surface of the spiral groove base portion 14 on the flat disk 20 side. That is, the porous member 22 in the spiral groove disk 11 is formed so as to constitute a first surface 11 a facing the flat disk 20 and a wall surface 40 a that covers the wall portion 40 in the spiral groove 15.
 ただし上記の構成に限らず、螺旋溝盤11を構成する多孔質部材22は、螺旋溝盤11のうち少なくとも球体30が接触し得る部分すなわち空間S内における第1の面11aおよび壁面40aを構成する部分に配置されていればよい。また逆に、螺旋溝盤11はその土台部を含む全体、すなわち図14の螺旋溝盤土台部14および多孔質部材22の双方の全体が多孔質部材22により構成されてもよい。 However, the porous member 22 constituting the spiral flutes 11 is not limited to the above configuration, and constitutes at least a portion of the spiral flutes 11 with which the spherical body 30 can contact, that is, the first surface 11a and the wall surface 40a in the space S. It suffices if it is arranged in the part to be. Conversely, the entire spiral flutes 11 including the base portions thereof, that is, the entire spiral flutes base portion 14 and the porous member 22 of FIG.
 以上のように、螺旋溝盤11の螺旋溝15内における第1の面11aおよび壁面40aが少なくとも多孔質部材22により形成されるように、多孔質部材22が配置されている。この点において本実施の形態は、螺旋溝盤11には多孔質部材22が含まれない実施の形態1と異なっている。 As described above, the porous member 22 is arranged so that the first surface 11 a and the wall surface 40 a in the spiral groove 15 of the spiral groove plate 11 are formed by at least the porous member 22. In this respect, the present embodiment is different from the first embodiment in which the spiral groove 11 does not include the porous member 22.
 図14に示すように、本実施の形態の平円盤20は、螺旋溝盤11側の表面である第2の面20aを構成する部分を含む、その全体が多孔質部材22により形成された部材である。この点において本実施の形態は、平円盤20が多孔質部材22とその上に配置される繊維部材21(図3参照)とを含む構成を有する実施の形態1と異なっている。ただし本実施の形態の平円盤20は、少なくとも空間S内に面する部分の第2の面20aを構成するように多孔質部材22が配置されていればよく、平円盤20のうち空間S内の第2の面20aを構成する部分以外の部分は多孔質部材22により形成されていなくてもよい。 As shown in FIG. 14, the flat disk 20 according to the present embodiment includes a part that forms the second surface 20 a that is the surface on the spiral grooved disk 11 side, and the entire member is formed by the porous member 22. It is. In this respect, the present embodiment is different from the first embodiment in which the flat disk 20 includes a porous member 22 and a fiber member 21 (see FIG. 3) disposed thereon. However, in the flat disk 20 of the present embodiment, the porous member 22 only needs to be disposed so as to constitute at least the second surface 20a that faces the space S. Portions other than the portion constituting the second surface 20 a may not be formed by the porous member 22.
 なお図14においては図3と同様に、平円盤20が変形部材であるものとして図示されているが、本実施の形態においても螺旋溝15が設けられた螺旋溝盤11が変形部材として構成されていてもよい。 In FIG. 14, as in FIG. 3, the flat disk 20 is illustrated as a deformable member. However, in this embodiment, the spiral groove disk 11 provided with the spiral groove 15 is also configured as the deformable member. It may be.
 以上のように本実施の形態においては、空間Sを構成する第1の面11aおよび第2の面20a、ならびに空間S内における壁面40aは多孔質部材22により形成されている。言い換えれば空間Sの内壁面(空間Sに配置される球体30が接触し得る面)の全体が少なくとも多孔質部材22により形成されている。 As described above, in the present embodiment, the first surface 11 a and the second surface 20 a constituting the space S and the wall surface 40 a in the space S are formed by the porous member 22. In other words, the entire inner wall surface of the space S (the surface on which the sphere 30 disposed in the space S can come into contact) is formed by at least the porous member 22.
 本実施の形態における多孔質部材22は、実施の形態1と同様にたとえばスポンジなどの弾性部材である。ここでスポンジとは、合成樹脂などで形成された繊維状の海綿体である。当該スポンジに含まれる空孔の径は、球体30の研磨工程後に球体30の表面に付着する、球体30の研磨用の定盤などから剥がれた砥粒付ボンドの径以上の大きさであることが好ましく、たとえば0.1mm程度以上であることが好ましい。なおここで径とは、当該空孔または砥粒付ボンドの外縁の一点から、空孔または砥粒付ボンドの中心を通り、空孔または砥粒付ボンドの外縁の他の一点までの直線距離の最大値をいうものとする。また当該スポンジの硬さはPVCよりも柔らかいことが好ましい。 The porous member 22 in the present embodiment is an elastic member such as a sponge as in the first embodiment. Here, the sponge is a fibrous spongy body made of synthetic resin or the like. The diameter of the pores contained in the sponge is larger than the diameter of the bond with abrasive grains that is attached to the surface of the sphere 30 after the polishing process of the sphere 30 and is peeled off from the polishing plate for polishing the sphere 30. For example, about 0.1 mm or more is preferable. Here, the diameter is a linear distance from one point of the outer edge of the hole or bond with abrasive grains to the other point of the outer edge of the hole or bond with abrasive grains through the center of the hole or bond with abrasive grains. The maximum value of. The sponge is preferably softer than PVC.
 次に、本実施の形態の背景技術について説明したうえで、本実施の形態の作用効果を説明する。 Next, after describing the background technology of the present embodiment, the operational effects of the present embodiment will be described.
 球体30の研磨加工後、研磨加工に用いる定盤などから剥がれた砥粒付ボンドが球体30の表面に付着する。この砥粒付ボンドを除去するために洗浄装置10のような螺旋状の洗浄機を用いて球体30の表面を洗浄すれば、球体30に付着していた砥粒付ボンドが球体30が転送する部位の樹脂材料に刺さる。すると、螺旋溝15および平円盤20が鉄または樹脂(PVCなど)で構成されている場合、砥粒付ボンドが刺さった部分は螺旋溝15などの表面の樹脂材料に対して凸状となる。そこへ別の球体30が通過すれば、その球体30の表面が、螺旋溝15に刺さり凸状となっていた砥粒付ボンドと接触し、球体30の表面に傷が形成される不具合を生じるおそれがある。 After polishing of the spherical body 30, the bond with abrasive grains peeled off from the surface plate used for the polishing process adheres to the surface of the spherical body 30. If the surface of the sphere 30 is cleaned using a spiral cleaner such as the cleaning device 10 to remove the bond with abrasive grains, the sphere 30 transfers the bond with abrasive grains that has adhered to the sphere 30. Stings into the resin material of the site. Then, when the spiral groove 15 and the flat disk 20 are comprised with iron or resin (PVC etc.), the part which the bond with an abrasive grain stabbed becomes convex with respect to the resin material of surfaces, such as the spiral groove 15. FIG. If another sphere 30 passes there, the surface of the sphere 30 comes into contact with the bond with abrasive grains that has been pierced into the spiral groove 15, resulting in a defect in which scratches are formed on the surface of the sphere 30. There is a fear.
 そこで本実施の形態においては、球体30が配置される空間Sすなわち空間Sの内壁面を構成する第1の面11aおよび第2の面20a、ならびに空間S内における壁面40aが、(その全体が)スポンジなどの多孔質部材22により形成されている。これにより、洗浄装置10においては球体30が、螺旋溝盤11と平円盤20との間の空間Sに挟まれ擦られる作用において、球体30の表面は多孔質部材22に接することになる。このため球体30の表面に付着している砥粒付ボンドは多孔質部材22を構成するスポンジに含まれる特に空孔内に取り込まれる。スポンジに取り込まれた砥粒付ボンドは、たとえスポンジの空孔内に取り込まれなかったとしても、スポンジの弾性が低く球体30と接する面の面圧が低くなるため、球体30がスポンジの砥粒付ボンドに接触しても球体30に傷が形成される可能性を低減することができる。また空孔に入っていない砥粒付ボンドについてもスポンジの表面上を動くことにより容易にスポンジの空孔内に収納させることができる。この観点からも、砥粒付ボンドが球体30の表面に傷を形成させる可能性を低減することができる。 Therefore, in the present embodiment, the first surface 11a and the second surface 20a constituting the space S in which the sphere 30 is arranged, that is, the inner wall surface of the space S, and the wall surface 40a in the space S are ) It is formed by a porous member 22 such as a sponge. Thus, in the cleaning device 10, the surface of the sphere 30 is in contact with the porous member 22 in the action of the sphere 30 being sandwiched and rubbed by the space S between the spiral groove disk 11 and the flat disk 20. For this reason, the bond with abrasive grains adhering to the surface of the sphere 30 is taken in particularly in the pores included in the sponge constituting the porous member 22. Even if the bond with abrasive grains taken into the sponge is not taken into the pores of the sponge, the elasticity of the sponge is low and the surface pressure of the surface in contact with the sphere 30 becomes low. Even if it contacts with an attached bond, possibility that a damage | wound will be formed in the spherical body 30 can be reduced. Further, the bond with abrasive grains not entering the pores can be easily accommodated in the pores of the sponge by moving on the surface of the sponge. Also from this point of view, the possibility that the bond with abrasive grains may form scratches on the surface of the sphere 30 can be reduced.
 以上のように、本実施の形態においては、球体30の表面に付着している砥粒付ボンドが速やかに多孔質部材22としてのスポンジの空孔内に入るか、仮に入らなくてもスポンジ自体が柔らかいために球体30と砥粒付ボンドとの接触時における両者間の局部的面圧を低くすることができるため、球体30の表面に傷を発生させる可能性を低減することができる。 As described above, in the present embodiment, even if the bond with abrasive grains adhering to the surface of the sphere 30 quickly enters the pores of the sponge as the porous member 22 or does not temporarily enter, the sponge itself Therefore, the local surface pressure between the sphere 30 and the bond with abrasive grains can be lowered, so that the possibility of generating scratches on the surface of the sphere 30 can be reduced.
 なお本実施の形態における洗浄装置10を用いた洗浄処理を3回繰り返すことにより、球体30の表面の全面における砥粒付ボンドを除去し、洗浄を完了させることができる。 In addition, by repeating the cleaning process using the cleaning apparatus 10 in the present embodiment three times, the bond with abrasive grains on the entire surface of the sphere 30 can be removed, and the cleaning can be completed.
 (実験例)
 球体表面の洗浄作用を確認するため、以下の実験を行った。
(Experimental example)
In order to confirm the cleaning action of the sphere surface, the following experiment was conducted.
 (実験例1)
 まず、被洗浄物である球体として工作機用中径セラミック球を準備した。また球体の洗浄システムとしては上記実施の形態1に係る球体の洗浄システム1を準備した。そして、球体の洗浄システム1を用いて上記セラミック球を洗浄した後の球表面の状態を確認した。
(Experimental example 1)
First, medium diameter ceramic balls for machine tools were prepared as spheres to be cleaned. Further, as the spherical cleaning system, the spherical cleaning system 1 according to the first embodiment was prepared. The state of the sphere surface after the ceramic sphere was cleaned using the sphere cleaning system 1 was confirmed.
 上記実験の詳細な条件は表1に示される通りであり、また上記実験結果は表2に示される通りである。表2から明らかなように、上記実施の形態1に係る球体の洗浄システム1によれば十分な清浄度が得られることが分かった。 The detailed conditions of the experiment are as shown in Table 1, and the result of the experiment is as shown in Table 2. As is clear from Table 2, it was found that the spherical cleaning system 1 according to the first embodiment can obtain a sufficient cleanliness.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
 (実験例2)
 上記実験例1と同様に工作機用中径セラミック球を準備した。また球体の洗浄システムとしては上記実施の形態2に係る球体の洗浄システムを準備した。そして、上記実験例1と同様に洗浄後のセラミック球の表面状態を確認した。
(Experimental example 2)
In the same manner as in Experimental Example 1, a medium diameter ceramic sphere for machine tools was prepared. In addition, a sphere cleaning system according to the second embodiment was prepared as a sphere cleaning system. And the surface state of the ceramic ball | bowl after washing | cleaning was confirmed similarly to the said Experimental example 1.
 上記実験の詳細な条件および結果は表3に示される通りである。表3から明らかなように、上記実施の形態2に係る球体の洗浄システムにおいても十分な清浄度が得られることが分かった。 The detailed conditions and results of the above experiment are as shown in Table 3. As is apparent from Table 3, it was found that sufficient cleanliness can be obtained even in the spherical cleaning system according to the second embodiment.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 また比較例として、本実施の形態を用いずに超音波洗浄、ブラシ洗浄、手洗い洗浄により球体を洗浄したときの洗浄後の球表面の状態を確認した。その結果は表4に示される通りである。表4から明らかなように、本実施の形態を用いない場合には、一定数の洗浄NGのサンプルが確認されており、十分な清浄度が得られない。 As a comparative example, the state of the surface of the sphere after cleaning was confirmed when the sphere was cleaned by ultrasonic cleaning, brush cleaning, and hand cleaning without using this embodiment. The results are as shown in Table 4. As is apparent from Table 4, when this embodiment is not used, a certain number of washed NG samples have been confirmed, and sufficient cleanliness cannot be obtained.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 なお以上の球表面の洗浄状態の「OK」「NG」については、レーザ検査機による球体の全表面検査により判定される。その判定基準は、レーザ検査機の分解能から50μm以上の異物を検出した場合に洗浄が「NG」であると判定され、そのような異物を検出しない場合には洗浄が「OK」であると判定される。 The above-mentioned “OK” and “NG” in the cleaning state of the sphere surface are determined by the entire surface inspection of the sphere by the laser inspection machine. The criterion is that the cleaning is determined to be “NG” when a foreign matter of 50 μm or more is detected from the resolution of the laser inspection machine, and the cleaning is determined to be “OK” when such a foreign matter is not detected. Is done.
 (実験例3)
 実施の形態5の効果検証のため、図14のように螺旋溝盤11の空間S内における表面がスポンジである洗浄装置10と、図3のように螺旋溝盤11の空間S内における表面が樹脂(PVC)である洗浄装置10とを用いた、球体30の洗浄時における球体30の表面への傷発生有無を確認した。
(Experimental example 3)
In order to verify the effect of the fifth embodiment, the cleaning device 10 whose surface in the space S of the spiral flutes 11 is a sponge as shown in FIG. 14 and the surface of the spiral flutes 11 in the space S as shown in FIG. The presence or absence of scratches on the surface of the sphere 30 when the sphere 30 was cleaned using the cleaning device 10 made of resin (PVC) was confirmed.
 図14の螺旋溝15を有する洗浄装置10、および図3の螺旋溝15を有する洗浄装置10のそれぞれを用いて、直径が11/32インチの、表面にダイヤモンドの砥粒が付着した球体30を6000個ずつ洗浄し、その表面の傷の有無を調査した。なお洗浄処理は球体30の各サンプルに対して3回繰り返した。なお上記いずれの洗浄装置10においても、平円盤20の空間S内において露出する表面はスポンジにより構成されている。その結果を以下の表5に示す。 Using each of the cleaning device 10 having the spiral groove 15 in FIG. 14 and the cleaning device 10 having the spiral groove 15 in FIG. 3, a sphere 30 having a diameter of 11/32 inches and having diamond abrasive grains attached to the surface is formed. 6000 pieces were washed and examined for the presence or absence of scratches on the surface. The washing process was repeated three times for each sample of the sphere 30. In any of the cleaning apparatuses 10 described above, the exposed surface in the space S of the flat disk 20 is made of sponge. The results are shown in Table 5 below.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
 表5に示す通り、図3のように空間S内にてPVCが露出する螺旋溝盤11を用いた場合にはすべての球体30において傷が確認されたのに対し、図14のように空間S内にてスポンジが露出する螺旋溝盤11を用いた場合にはすべての球体30において傷が確認されなかった。 As shown in Table 5, when the spiral flutes 11 in which PVC is exposed in the space S as shown in FIG. 3, scratches were confirmed in all the spheres 30, whereas in the space as shown in FIG. 14. When the spiral flutes 11 in which the sponge was exposed in S were used, no scratches were observed in all the spheres 30.
 今回開示された実施の形態および実験例はすべての点で例示であって、制限的なものではないと考えられるべきである。本発明の範囲は上記した説明ではなくて請求の範囲によって示され、請求の範囲と均等の意味、および範囲内でのすべての変更が含まれることが意図される。 It should be considered that the embodiments and experimental examples disclosed this time are examples in all respects and are not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.
 本発明の球体の洗浄システムおよび球体の洗浄方法は、球体の表面を均一に洗浄することが要求される球体の洗浄システムおよび球体の洗浄方法において、特に有利に適用され得る。 The sphere cleaning system and the sphere cleaning method of the present invention can be applied particularly advantageously in a sphere cleaning system and a sphere cleaning method that require uniform cleaning of the surface of the sphere.
 1,3 球体の洗浄システム、10,10A,10B,10C,10D 洗浄装置、11,16,51,70 螺旋溝盤、11a 第1の面、12,52 投入部、13,53 排出部、14 螺旋溝盤土台部、15,55 螺旋溝、20,80 平円盤、20a 第2の面、21 繊維部材、22 多孔質部材、30 球体、40 壁部、40a 壁面、55a 螺旋軌道部、55b 軌道変更部、60 投入手段、61 移送手段、P,P’ 自転軸、P1,P2 回転軸、S 空間。 1,3 Sphere cleaning system, 10, 10A, 10B, 10C, 10D cleaning device, 11, 16, 51, 70 spiral flutes, 11a first surface, 12, 52 input section, 13, 53 discharge section, 14 Spiral groove base, 15, 55, spiral groove, 20,80 flat disk, 20a second surface, 21 fiber member, 22 porous member, 30 sphere, 40 wall, 40a wall, 55a spiral track, 55b track Change section, 60 input means, 61 transfer means, P, P 'rotation axis, P1, P2 rotation axis, S space.

Claims (12)

  1.  球体を洗浄するための洗浄装置であって、
     第1の面を有する第1の部材と、
     前記第1の面に対向する第2の面を有する第2の部材とを含み、
     前記第1の面および前記第2の面は、前記球体を挟持する挟持面であり、
     前記第1の面と前記第2の面とは、互いに相対的に回転可能に構成されており、
     前記第1の面と前記第2の面との間の空間に前記球体を投入するための投入部と、
     前記空間から前記球体を排出するための排出部とをさらに含み、
     前記第1の面および前記第2の面のうち一方の面には、前記投入部から前記排出部まで前記球体を案内するための螺旋溝が設けられている、洗浄装置。
    A cleaning device for cleaning a sphere,
    A first member having a first surface;
    A second member having a second surface opposite to the first surface;
    The first surface and the second surface are clamping surfaces that sandwich the sphere,
    The first surface and the second surface are configured to be rotatable relative to each other,
    A loading unit for loading the sphere into a space between the first surface and the second surface;
    A discharge part for discharging the sphere from the space,
    The cleaning apparatus, wherein one of the first surface and the second surface is provided with a spiral groove for guiding the sphere from the input portion to the discharge portion.
  2.  前記第1の部材および前記第2の部材のうち一方の部材は、前記挟持面が平面から前記球体の表面形状に沿った曲面に変形することが可能な変形部材である、請求項1に記載の洗浄装置。 2. The member according to claim 1, wherein one of the first member and the second member is a deformable member in which the clamping surface can be deformed from a flat surface to a curved surface along the surface shape of the sphere. Cleaning equipment.
  3.  前記変形部材は、
     多孔質部材と、
     前記多孔質部材上に配置されるとともに前記挟持面を構成し、前記球体を洗浄するための洗浄剤が含浸された繊維部材とを含む、請求項2に記載の洗浄装置。
    The deformable member is
    A porous member;
    The cleaning apparatus according to claim 2, further comprising: a fiber member that is disposed on the porous member and constitutes the holding surface and is impregnated with a cleaning agent for cleaning the sphere.
  4.  前記洗浄剤は、有機溶剤または水を含む、請求項3に記載の洗浄装置。 The cleaning apparatus according to claim 3, wherein the cleaning agent includes an organic solvent or water.
  5.  前記螺旋溝は、前記一方の面と、前記一方の面から前記第1の面および前記第2の面のうち他方の面に向かい突出する壁部の壁面とにより囲まれた領域であり、
     前記空間を構成する前記第1および第2の面ならびに前記空間内における前記壁面は多孔質部材により形成される、請求項1または2に記載の洗浄装置。
    The spiral groove is a region surrounded by the one surface and a wall surface of the wall portion protruding from the one surface toward the other surface of the first surface and the second surface;
    The cleaning apparatus according to claim 1 or 2, wherein the first and second surfaces constituting the space and the wall surface in the space are formed by a porous member.
  6.  前記螺旋溝は、前記一方の面と、前記一方の面から前記第1の面および前記第2の面のうち他方の面に向かい突出する壁部の壁面とにより囲まれた領域であり、
     前記壁面は、前記一方の面よりも摩擦係数が大きい面である、請求項1~4のいずれか1項に記載の洗浄装置。
    The spiral groove is a region surrounded by the one surface and a wall surface of the wall portion protruding from the one surface toward the other surface of the first surface and the second surface;
    The cleaning apparatus according to any one of claims 1 to 4, wherein the wall surface is a surface having a larger coefficient of friction than the one surface.
  7.  前記螺旋溝は、螺旋軌道から軌道変更された部分を含む、請求項1~6のいずれか1項に記載の洗浄装置。 The cleaning device according to any one of claims 1 to 6, wherein the spiral groove includes a portion whose trajectory is changed from a spiral trajectory.
  8.  前記第1の部材および前記第2の部材は、回転軸が互いに偏心するように配置されている、請求項1~7のいずれか1項に記載の洗浄装置。 The cleaning apparatus according to any one of claims 1 to 7, wherein the first member and the second member are arranged such that rotation axes are eccentric from each other.
  9.  前記第1の部材および前記第2の部材のうち前記螺旋溝が設けられた部材は、樹脂材料または金属材料を含む、請求項1~8のいずれか1項に記載の洗浄装置。 The cleaning apparatus according to any one of claims 1 to 8, wherein the member provided with the spiral groove among the first member and the second member includes a resin material or a metal material.
  10.  請求項1~9のいずれか1項に記載の洗浄装置を備える、球体の洗浄システム。 A spherical cleaning system comprising the cleaning device according to any one of claims 1 to 9.
  11.  前記球体の洗浄システムは複数の前記洗浄装置を備え、さらに、
     前記複数の洗浄装置のうち一の前記洗浄装置により洗浄された前記球体を前記一の洗浄装置の下流側に位置する他の前記洗浄装置に送るための移送手段を備える、請求項10に記載の球体の洗浄システム。
    The spherical cleaning system includes a plurality of the cleaning devices, and
    11. The transfer device according to claim 10, further comprising a transfer unit configured to send the sphere cleaned by one of the plurality of cleaning apparatuses to the other cleaning apparatus located downstream of the one cleaning apparatus. Sphere cleaning system.
  12.  球体を準備する工程と、
     前記球体を洗浄するための洗浄装置を準備する工程とを備え、
     前記洗浄装置は、
     第1の面を有する第1の部材と、
     前記第1の面に対向する第2の面を有する第2の部材と、
     前記第1の面と前記第2の面との間の空間に前記球体を投入するための投入部と、
     前記空間から前記球体を排出するための排出部とを含み、
     前記第1の面および前記第2の面のうち一方の面には、前記投入部から前記排出部まで前記球体を案内するための螺旋溝が設けられており、さらに、
     前記球体を前記投入部から前記空間に投入する工程と、
     前記空間において前記球体を洗浄する工程と、
     洗浄された前記球体を前記排出部から排出する工程とを備え、
     前記球体を洗浄する工程では、
     前記第1の面と前記第2の面とにより前記球体を挟持しつつ前記第1の面と前記第2の面とを互いに相対的に回転させることにより前記球体を自転させ、自転した前記球体が前記螺旋溝において前記投入部から前記排出部まで案内されつつ洗浄される、球体の洗浄方法。
    Preparing a sphere,
    Providing a cleaning device for cleaning the sphere,
    The cleaning device includes:
    A first member having a first surface;
    A second member having a second surface facing the first surface;
    A loading unit for loading the sphere into a space between the first surface and the second surface;
    A discharge part for discharging the sphere from the space,
    One surface of the first surface and the second surface is provided with a spiral groove for guiding the sphere from the input portion to the discharge portion, and
    Throwing the sphere into the space from the throwing section;
    Cleaning the sphere in the space;
    And discharging the washed sphere from the discharge section,
    In the step of cleaning the sphere,
    The sphere rotated by rotating the sphere by rotating the first surface and the second surface relative to each other while sandwiching the sphere between the first surface and the second surface. A cleaning method for a sphere, wherein the cleaning is performed while being guided from the input portion to the discharge portion in the spiral groove.
PCT/JP2016/080969 2015-10-29 2016-10-19 Cleansing device, system for cleansing spherical body, and method for cleansing spherical body WO2017073431A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018223305A1 (en) * 2017-06-07 2018-12-13 江苏力星通用钢球股份有限公司 Dedicated precise steel ball washing machine for high-grade numerical control system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4511920Y1 (en) * 1965-10-26 1970-05-26
JPS55501173A (en) * 1979-02-09 1980-12-25
JPH06319866A (en) * 1993-05-13 1994-11-22 Ajina Giken Kk Pachinko ball cleaner
JP3472730B2 (en) * 1999-09-07 2003-12-02 山崎産業株式会社 Ball washer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4511920Y1 (en) * 1965-10-26 1970-05-26
JPS55501173A (en) * 1979-02-09 1980-12-25
JPH06319866A (en) * 1993-05-13 1994-11-22 Ajina Giken Kk Pachinko ball cleaner
JP3472730B2 (en) * 1999-09-07 2003-12-02 山崎産業株式会社 Ball washer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3369490A4 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018223305A1 (en) * 2017-06-07 2018-12-13 江苏力星通用钢球股份有限公司 Dedicated precise steel ball washing machine for high-grade numerical control system

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