WO2022059430A1 - 超純水供給システム、制御装置およびプログラム - Google Patents
超純水供給システム、制御装置およびプログラム Download PDFInfo
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- WO2022059430A1 WO2022059430A1 PCT/JP2021/030749 JP2021030749W WO2022059430A1 WO 2022059430 A1 WO2022059430 A1 WO 2022059430A1 JP 2021030749 W JP2021030749 W JP 2021030749W WO 2022059430 A1 WO2022059430 A1 WO 2022059430A1
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- ultrapure water
- amount
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- control unit
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- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 216
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 216
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 81
- 238000004519 manufacturing process Methods 0.000 claims abstract description 57
- 239000012535 impurity Substances 0.000 claims abstract description 51
- 238000004140 cleaning Methods 0.000 claims abstract description 47
- 238000012545 processing Methods 0.000 claims description 69
- 238000009826 distribution Methods 0.000 claims description 51
- 239000012528 membrane Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 26
- 238000001914 filtration Methods 0.000 claims description 12
- 238000005259 measurement Methods 0.000 claims description 11
- 239000010419 fine particle Substances 0.000 claims description 8
- 150000002500 ions Chemical class 0.000 description 30
- 238000010586 diagram Methods 0.000 description 9
- 238000001179 sorption measurement Methods 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 8
- 238000001471 micro-filtration Methods 0.000 description 8
- 238000005070 sampling Methods 0.000 description 8
- 238000000108 ultra-filtration Methods 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 7
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000011084 recovery Methods 0.000 description 5
- 238000005342 ion exchange Methods 0.000 description 4
- 239000003456 ion exchange resin Substances 0.000 description 4
- 229920003303 ion-exchange polymer Polymers 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 239000003480 eluent Substances 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 239000003957 anion exchange resin Substances 0.000 description 2
- 239000003729 cation exchange resin Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005374 membrane filtration Methods 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000005349 anion exchange Methods 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003673 groundwater Substances 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/006—Water distributors either inside a treatment tank or directing the water to several treatment tanks; Water treatment plants incorporating these distributors, with or without chemical or biological tanks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
- C02F1/004—Processes for the treatment of water whereby the filtration technique is of importance using large scale industrial sized filters
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/002—Construction details of the apparatus
- C02F2201/005—Valves
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/001—Upstream control, i.e. monitoring for predictive control
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/003—Downstream control, i.e. outlet monitoring, e.g. to check the treating agents, such as halogens or ozone, leaving the process
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/005—Processes using a programmable logic controller [PLC]
- C02F2209/006—Processes using a programmable logic controller [PLC] comprising a software program or a logic diagram
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/05—Conductivity or salinity
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/10—Solids, e.g. total solids [TS], total suspended solids [TSS] or volatile solids [VS]
- C02F2209/105—Particle number, particle size or particle characterisation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/04—Flow arrangements
- C02F2301/043—Treatment of partial or bypass streams
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/04—Flow arrangements
- C02F2301/046—Recirculation with an external loop
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2307/00—Location of water treatment or water treatment device
- C02F2307/14—Treatment of water in water supply networks, e.g. to prevent bacterial growth
Definitions
- the present invention relates to an ultrapure water supply system, a control device and a program.
- the water quality of ultrapure water supplied from an ultrapure water production facility to a use point meets a predetermined standard.
- a use point for example, a place of use in a semiconductor cleaning device
- the water quality of the ultrapure water supplied from the ultrapure water production facility to the point of use does not meet the standard due to the elution of ionic metal impurities from the supply pipe.
- a technique of installing a processing unit for removing impurities contained in ultrapure water between an ultrapure water production facility and a point of use has been considered (see, for example, Patent Document 1). ..
- An object of the present invention is to provide an ultrapure water supply system, a control device and a program capable of efficiently using a system for supplying ultrapure water.
- the present invention comprises a first distribution pipe for flowing ultrapure water from an ultrapure water production facility to a cleaning device.
- a processing unit installed on the first distribution pipe to process the ultrapure water
- a second distribution pipe that branches from the first distribution pipe between the ultrapure water production facility and the processing unit and flows ultrapure water to the cleaning device.
- a first water amount control unit provided in a first branch portion where the second flow pipe branches from the first flow pipe, and A second water amount control unit that controls ultrapure water flowing from the second flow pipe to the cleaning device, and Compare the first amount, which is the amount of impurities contained in the ultrapure water treated by the treatment unit, with the second amount, which is the amount of impurities contained in the ultrapure water not treated by the treatment unit.
- Comparison section and It is an ultrapure water supply system having a flow path control unit that controls the first water amount control unit and the second water amount control unit based on the comparison result in the comparison unit.
- the ultrapure water is installed on the ultrapure water production facility and the first flow pipe from the first flow pipe for flowing ultrapure water from the ultrapure water production facility to the cleaning device.
- a first water amount control unit provided in a first branch portion where a second flow pipe that branches from the first flow pipe to the processing unit to be treated and flows ultrapure water to the cleaning device branches.
- a second water amount control unit that controls ultrapure water flowing from the second flow pipe to the cleaning device, and The first amount, which is the amount of impurities contained in the ultrapure water at the first point that has passed through the treatment unit, and the ultrapure water that has been flown from the ultrapure water production facility and has not been treated by the treatment unit.
- a comparison unit that compares the amount of impurities contained in the second amount with the second amount, Based on the result of comparison in the comparison unit, it is a control device having a flow path control unit that controls the first water amount control unit and the second water amount control unit.
- the present invention applies to a computer.
- Impurities contained in the ultrapure water at the first point installed on the first flow pipe for flowing the ultrapure water from the ultrapure water production facility to the cleaning device and passing through the processing unit for processing the ultrapure water.
- the system for supplying ultrapure water can be efficiently used.
- FIG. 1st Embodiment of the ultrapure water supply system of this invention It is a figure which shows an example of the internal structure of the 1st water amount control part shown in FIG. It is a figure which shows an example of the internal structure of the 2nd water amount control part shown in FIG. It is a figure which shows an example of the control method of the valve performed by the flow path control part shown in FIG. It is a flowchart for demonstrating an example of the ultrapure water supply method in the ultrapure water supply system shown in FIG. It is a figure which shows the 1st internal configuration example of the processing unit shown in FIG. It is a figure which shows the 2nd internal structure example of the processing unit shown in FIG.
- FIG. 1 is a diagram showing a first embodiment of the ultrapure water supply system of the present invention.
- the ultrapure water supply system in this embodiment includes a processing unit 110, a distribution pipe 210, 220, 230, 240, a water volume control unit 310, 320, a measurement unit 410, 420, and a comparison unit 510. And a flow path control unit 520.
- the processing unit 110 is a device installed on a flow pipe 210 for flowing ultrapure water from the ultrapure water production facility 100 to a use point (in this embodiment, a cleaning device 120 for cleaning an object).
- This ultrapure water is water used in semiconductor device manufacturing factories and the like.
- the treatment unit 110 is a unit that removes impurities from the ultrapure water flowing on the flow pipe 210.
- the treatment unit 110 removes impurities from ultrapure water using, for example, an ion exchanger, a microfiltration membrane (MF), an ultrafiltration membrane (UF), or the like.
- This ion exchanger has an ion removal or ion adsorption function (for example, an ion adsorption film or monolith, an ion exchange resin).
- the object to be removed or adsorbed by the ion exchanger is an ionic metal impurity.
- the ion exchanger also adsorbs fine particles due to the electrostatic effect.
- the treatment unit 110 has a structure in which the amount of impurities (first amount) of the treated ultrapure water is, for example, a value lower than 1 ppt in terms of concentration.
- the processing unit 110 may independently have a filter or the like used for removing these impurities. Further, the processing unit 110 may have a combination of filters and the like used for removing these impurities.
- the processing unit 110 may have a redundant configuration so that the constituent filters and the like can be replaced. Further, a boosting pump and a heat exchanger may be provided in front of the processing unit 110.
- Examples of the member to be filled in the processing unit 110 include an ion exchanger, a microfiltration membrane (MF), an ultrafiltration membrane (UF), and the like. Each of these members may be used independently. Further, these members may be used in any combination.
- -Anionic monoliths-Cation monoliths-Combination of anion monoliths and cationic monoliths can be mentioned.
- the monolithic organic porous body is referred to as a monolith.
- an ion exchange resin a combination of an ion exchange resin and a microfiltration membrane (MF), an ion adsorption membrane, a combination of an ion adsorption membrane and a microfiltration membrane (MF), or a plurality of precision filtration membranes.
- a combination of (MF) may be provided.
- the configuration of the processing unit 110 is ⁇ Anion exchange resin ⁇ Cation exchange resin ⁇ Combination of anion exchange resin and cation exchange resin (laminated or mixed bed) It may be.
- an ion adsorption membrane, a combination of the ion adsorption membrane and the microfiltration membrane (MF), or a combination of a plurality of precision filtration membranes (MF) may be provided in the front stage or the rear stage of each of these.
- the configuration of the processing unit 110 is ⁇ Ion adsorption membrane ⁇ Combination of ion adsorption membrane and microfiltration membrane (MF) ⁇ Precision filtration membrane (MF) ⁇ Ultrafiltration membrane (UF) It may be.
- the monolith and the ion exchange resin as described above may be combined, or the monolith and the ion adsorption membrane may be combined.
- the ultrapure water production facility 100 is an facility for producing ultrapure water for supplying to the cleaning device 120.
- the configuration for producing ultrapure water may be a general one.
- the ultrapure water production facility 100 includes, for example, a pretreatment system, a primary pure water system, and a secondary pure water system (subsystem).
- the primary pure water system is a system installed after the pretreatment system.
- the secondary pure water system (subsystem) is a system installed after the primary pure water system.
- Ultrapure water is generally produced by sequentially treating raw water (river water, groundwater, industrial water, etc.) by a pretreatment system, a primary pure water system, and a secondary pure water system.
- the secondary pure water system includes, for example, a primary pure water tank for storing pure water produced by the primary pure water system, a heat exchanger (HE: Heat Exchanger), and an ultraviolet oxidizer (UVox: UltraViolet oxidizer).
- a heat exchanger HE: Heat Exchanger
- UVox UltraViolet oxidizer
- a non-regenerative ion exchange device CP: Cartridge Policeher
- a membrane degassing device MD: Membrane Degassifier
- UF Ultrafiltration membrane
- the cleaning device 120 is a device that cleans wafers, glass substrates, printed circuit boards, metal substrates, etc. using the supplied ultrapure water.
- the distribution pipe 210 is the first distribution pipe for flowing ultrapure water from the ultrapure water production facility 100 to the cleaning device 120.
- the flow pipe 220 branches from the flow pipe 210 between the ultrapure water production facility 100 and the processing unit 110, and the ultrapure water flows to the cleaning device 120 (strictly speaking, the cleaning device is passed through the flow pipe 240 described later). (Ultrapure water flows to 120)
- the distribution pipe 230 is a third distribution pipe that returns ultrapure water from the distribution pipe 220 to the ultrapure water production facility 100.
- the distribution pipe 230 may be for flowing ultrapure water from the distribution pipe 220 to a drainage tank / recovery tank (not shown).
- the distribution pipe 240 is a fourth distribution pipe that allows ultrapure water to flow from the distribution pipe 220 to the cleaning device 120.
- the branch point at which the distribution pipe 220 branches from the distribution pipe 210 is set as the first branch portion. Further, the branch point at which the distribution pipe 220 branches into the distribution pipe 230 and the distribution pipe 240 is set as the second branch portion.
- the water amount control unit 310 is a first water amount control unit provided in the first branch portion.
- the water amount control unit 320 is a second water amount control unit provided in the second branch portion.
- the water amount control unit 320 controls the flow rate of the ultrapure water flowing from the flow pipe 220 to the cleaning device 120. ) Is the first measuring unit for measuring the first amount of impurities.
- the measuring unit 420 is a second measuring unit that measures a second amount of impurities at the second point on the flow pipe 220.
- the measuring unit 420 may be arranged at a position where the second amount, which is the amount of impurities contained in the ultrapure water not treated by the treatment unit 110, can be measured.
- the measuring unit 420 may be provided on the distribution pipe 210.
- the measuring unit 420 may be provided on the distribution pipe 220 as shown in FIG.
- the distribution pipe 240 joins the distribution pipe 210 between the first point and the cleaning device 120.
- FIG. 2 is a diagram showing an example of the internal configuration of the water amount control unit 310 shown in FIG.
- the water amount control unit 310 shown in FIG. 1 has a valve 610 and a valve 620.
- the valve 610 is a first valve (off-off valve) that adjusts the amount of water flowing to the processing unit 110.
- the valve 620 is a second valve (open / close valve) that adjusts the amount of water flowing to the flow pipe 220.
- FIG. 3 is a diagram showing an example of the internal configuration of the water amount control unit 320 shown in FIG.
- the water amount control unit 320 shown in FIG. 1 has a measuring unit 420, a valve 630, and a valve 640.
- the valve 630 is a third valve (open / close valve) that adjusts the amount of water flowing from the flow pipe 220 to the flow pipe 230.
- the valve 640 is a fourth valve (opening / closing valve) that adjusts the amount of water flowing from the flow pipe 220 to the flow pipe 240.
- the measuring units 410 and 420 are provided with a filtration type sampling mechanism for capturing impurities.
- This filtered sampling mechanism includes an ion exchanger.
- the ion exchanger in this case may be any material having an ion exchange function.
- the ion exchanger is preferably a monolithic ion exchanger.
- the object captured by the measuring units 410 and 420 may be fine particles having a diameter of 10 nm or more.
- the filtration type sampling mechanism for capturing impurities provided in the measuring units 410 and 420 includes a filtration membrane and a centrifugation membrane capable of capturing fine particles having a diameter of 10 nm or more.
- the filtration membrane capable of capturing fine particles having a diameter of 10 nm or more is an AAA (Anodic Aluminum Oxide) membrane.
- the analysis method and analysis evaluation of impurities in the measuring units 410 and 420 will be described.
- the concentration method disclosed in Japanese Patent Application Laid-Open No. 2001-153855 it is preferable to use the concentration method disclosed in Japanese Patent Application Laid-Open No. 2001-153855.
- ultrapure water produced by the ultrapure water production facility 100 is passed through an ion exchanger provided in the measuring units 410 and 420, and ionic impurities contained in the ultrapure water are contained. Is captured by the ion exchanger. Subsequently, the eluent is passed through the ion exchanger in which the ionic impurities contained in the ultrapure water are trapped.
- a concentration method using a monolith ion exchanger is used as the ion exchanger.
- the structure of the monolith ion exchanger used here include the open cell structure disclosed in JP-A-2002-306976 and JP-A-2009-62512, and JP-A-2009-67982. Examples thereof include a co-continuous structure, a particle-aggregated structure disclosed in JP-A-2009-7550, and a particle-composite-type structure disclosed in JP-A-2009-108294.
- the structure, material and property of the ion exchanger those disclosed in Japanese Patent Application Laid-Open No. 2019-195763 can be mentioned.
- the ion exchange group introduced in the monolith ion exchanger the cation exchange group introduced in the monolith-like organic porous cation exchanger (hereinafter referred to as monolith cation exchanger), and the monolith-like organic porous body.
- monolith anion exchanger examples include those disclosed in Japanese Patent Application Laid-Open No. 2019-195763.
- the particle analysis in ultrapure water by the measuring units 410 and 420 it is preferable to use a direct inspection method in which particles captured by membrane filtration are observed using a SEM (Scanning Electron Microscope).
- SEM Sccanning Electron Microscope
- the analysis using the submerged particle counter only particles having a particle size larger than 20 nm can be detected, and the detection efficiency is low.
- the direct examination method it is possible to analyze the composition of fine particles and identify the source of fine particles.
- the filtration type sampling mechanism installed in the measuring units 410 and 420 for analyzing and evaluating the water quality of ultrapure water does not have to be installed all the time.
- the filtration type sampling mechanism installed in the measuring units 410 and 420 is preferably one that can sample at arbitrary timing or periodic timing.
- a portion for example, a kit, a module, a holder, etc., hereinafter referred to as a sample
- the samples removed from the measuring units 410 and 420 by capturing (concentrating) impurities are subjected to analysis while avoiding contamination. Sampling is performed by the measuring units 410 and 420, and the sample removed from the measuring units 410 and 420 does not necessarily have to be analyzed each time the sampling is performed.
- the samples removed from the measuring units 410 and 420 may be stored to avoid contamination, and may be analyzed collectively or only partially when necessary.
- the comparison unit 510 compares the first amount measured by the measuring unit 410 with the second amount measured by the measuring unit 420. For example, in the comparison unit 510, the value obtained by converting the first amount measured by the measuring unit 410 into a concentration (hereinafter referred to as the first concentration) and the second amount measured by the measuring unit 420 are converted into a concentration. (Hereinafter, referred to as a second concentration) may be compared.
- the flow path control unit 520 controls the water amount control unit 310 and the water amount control unit 320 based on the comparison result in the comparison unit 510. Specifically, the flow path control unit 520 controls the opening and closing of each of the valves 610, 620, 630, and 640 based on the comparison result in the comparison unit 510.
- the flow path control unit 520 opens the valves 610, 620, and 630 and closes the valve 640. In other cases, the flow path control unit 520 closes the valves 610 and 630 and opens the valves 620 and 640.
- FIG. 4 is a diagram showing an example of a control method for valves 610, 620, 630, and 640 performed by the flow path control unit 520 shown in FIG.
- the example shown in FIG. 4 is an example of the correspondence used when the comparison unit 510 compares the first concentration and the second concentration.
- the first concentration measured by the measuring unit 410 is converted into a concentration and the second amount measured by the measuring unit 420 is converted into a concentration.
- the magnitude relationship with the concentration of 2 is associated with the contents of the opening / closing control of the valves 610, 620, 630, and 640.
- the flow path control unit 520 controls the opening and closing of each of the valves 610, 620, 630, and 640 with reference to the comparison result in the comparison unit 510 and this association. For example, when the result of the comparison in the comparison unit 510 is transmitted to the flow path control unit 520 and the first concentration is lower than the second concentration, the flow path control unit 520 has the first concentration in this correspondence.
- the valves 610, 620, 630, 640 are controlled by the method associated with the case where the concentration is lower than the second concentration. In the example shown in FIG. 4, in this case, the flow path control unit 520 controls the valve 610, the valve 620, and the valve 630 in the open state, and controls the valve 640 in the closed state.
- the flow path control unit 520 controls the valve 610 and the valve 630 in the closed state, and controls the valve 620 and the valve 640 in the open state.
- This correspondence may be stored in the flow path control unit 520. Further, this association may be stored in an external storage medium accessible by the flow path control unit 520.
- the result of this comparison may have a certain margin.
- the flow path The control unit 520 controls the valves 610 and 630 in the closed state and controls the valves 620 and 640 in the open state.
- the flow path control unit 520 sets the valves 610 and 630. The valve may be controlled to the closed state and the valves 620 and 640 may be controlled to the open state.
- This margin may be set in advance or may be calculated based on the concentration thereof.
- the first concentration measured by the measuring unit 410 is lower than the second concentration measured by the measuring unit 420, and the difference between the first concentration and the second concentration is If it is equal to or higher than a predetermined value (margin value), the flow path control unit 520 controls the valves 610, 620, and 630 to be in the open state and controls the valve 640 to be in the closed state. In other cases, the flow path control unit 520 controls the valves 610 and 630 in the closed state and controls the valves 620 and 640 in the open state.
- a predetermined value margin value
- FIG. 5 is a flowchart for explaining an example of the ultrapure water supply method in the ultrapure water supply system shown in FIG.
- a process in which the comparison unit 510 compares the first concentration and the second concentration will be described as an example.
- the processing unit 110 is attached to the distribution pipe 210 (step S1).
- the flow path control unit 520 causes the valves 610, 620, 630, 640 so that the ultrapure water supplied from the ultrapure water production facility 100 flows to the cleaning device 120 via the flow pipe 210 and the processing unit 110. Controls the opening and closing of (step S2).
- the flow path control unit 520 controls the opening and closing of the valves 610, 620, 630, and 640 so that the ultrapure water supplied from the ultrapure water production facility 100 also flows to the measuring unit 420. Specifically, the flow path control unit 520 opens the valves 610, 620, and 630 and closes the valve 640. Subsequently, the ultrapure water production facility 100 starts supplying ultrapure water (step S3). After that, the comparison unit 510 compares the measurement result (for example, the concentration of impurities or the number of fine particles) in the measurement unit 410 with the measurement result (concentration of impurities) in the measurement unit 420.
- the measurement result for example, the concentration of impurities or the number of fine particles
- the comparison unit 510 determines whether or not the measured impurities concentrations are equal to each other by the flow path control unit 520 (step S4).
- the flow path control unit 520 transfers the ultrapure water supplied from the ultrapure water production facility 100 to the cleaning device 120 via the flow pipe 220.
- the opening and closing of the valves 610, 620, 630, and 640 are controlled so as to flow (step S5). Specifically, the flow path control unit 520 closes the valves 610 and 630 and opens the valves 620 and 640.
- the flow path control unit 520 controls the opening and closing of the valves 610, 620, 630, and 640, so that the ultrapure water flows from the ultrapure water production facility 100 immediately after the start-up of the ultrapure water production facility 100.
- the concentration of water impurities is higher than the specified value
- the ultrapure water from the ultrapure water production facility 100 is supplied to the cleaning device 120 through the treatment unit 110, and then the ultrapure water flows from the ultrapure water production facility 100.
- the concentration of impurities in the pure water is equal to or less than the specified value, the ultrapure water from the ultrapure water production facility 100 is supplied to the cleaning device 120 without passing through the processing unit 110.
- the concentration of impurities contained in the ultrapure water flowing from the ultrapure water production facility 100 again.
- the ultrapure water from the ultrapure water production facility 100 may be supplied to the cleaning device 120 through the processing unit 110 again.
- the ultrapure water from the ultrapure water production facility 100 is controlled to be supplied to the cleaning device 120 without passing through the processing unit 110, the ultrapure water does not flow in the processing unit 110. Therefore, the processing unit 110 can be removed from the distribution pipe 210.
- the flow path control unit 520 may control the valves 610 and 630 in the closed state and control the valves 620 and 640 in the open state. Further, the flow path control unit 520 may control the valves 610, 620, and 640 in the open state and the valves 630 in the closed state.
- the timing at which the flow path control unit 520 controls the opening and closing of the valves 610, 620, 630, and 640 is the timing at which the inflow and cutoff of ultrapure water into the desired flow pipe can be switched. For example, when the path for flowing ultrapure water to the cleaning device 120 is switched from the flow tube 210 to the path through the flow pipes 220 and 240, the flow path control unit 520 has the same timing as the timing for closing the valves 610 and 630. Then, the valves 620 and 640 are opened. It is preferable that the same timing coincides perfectly with each other. The same timing may not be exactly the same as each other, but the difference between these timings may be within a predetermined range.
- the flow path control unit 520 may open the valves 620 and 640 within a predetermined time after controlling the valves 610 and 630 to the closed state.
- valves 610, 620, 630, 640, a comparison unit 510, and a flow path control unit 520 constitute a control device.
- FIG. 6 is a diagram showing a first internal configuration example of the processing unit 110 shown in FIG.
- the processing unit 110 shown in FIG. 1 includes two removal members 1100 and 1101 and four valves 1110 to 1113.
- the series in which the removal member 1100 and the valves 1110 and 1111 are connected in series in the order of the valve 1110, the removal member 1100 and the valve 1111 from the upstream, and the removal member 1101 and the valves 1112 and 1113 are the valves 1112 and the removal member 1101 from the upstream.
- the series connected in series in the order of valves 1113 are connected in parallel with each other.
- the valves 1110 to 1113 are the sixth valves controlled so that the ultrapure water flowing from the flow pipe 210 flows to either one of the two removal members 1100 and 1101.
- the flow path control unit 520 controls the opening and closing of the valves 1110 to 1113. At this time, when the first amount is smaller than the second amount but approaches the second amount (for example, when the first amount becomes a value obtained by subtracting a predetermined value from the second amount).
- the flow path control unit 520 controls the opening and closing of the valves 1110 to 1113 so as to switch the removing member through which the ultrapure water flows to the other removing member.
- a value smaller than the second amount is set in advance as the allowable amount, and when the first amount becomes the allowable amount, the removal member through which the ultrapure water flows is switched to the other removal member.
- the path control unit 520 may control the opening and closing of the valves 1110 to 1113.
- FIG. 7 is a diagram showing a second internal configuration example of the processing unit 110 shown in FIG.
- the processing unit 110 shown in FIG. 1 includes three removal members 1120, 1121, 1122 and six valves 1130-1135.
- the removal member 1120 and the valves 1130, 1131 are connected in series in the order of the valve 1130, the removal member 1120, and the valve 1131 from the upstream, and the removal member 1121 and the valves 1132 and 1133 are the valve 1132 and the removal member 1121 from the upstream.
- the series in which the removal member 1122 and the valves 1134 and 1135 are connected in series in the order of the valve 1134, the removal member 1122, and the valve 1135 from the upstream are connected in series in the order of the valve 1133. It is connected.
- the valves 1130 to 1135 are the sixth valves controlled so that the ultrapure water flowing from the flow pipe 210 flows to any one of the three removal members 1120, 1121, 1122. Based on the result of comparison between the first quantity and the second quantity in the comparison unit 510, the flow path control unit 520 controls the opening and closing of the valves 1130 to 1135.
- the flow path control unit 520 controls the opening and closing of valves 1130 to 1135 so as to switch the removing member through which ultrapure water flows to another removing member. Further, a value smaller than the second amount is set in advance as the allowable amount, and when the first amount becomes the allowable amount, the removal member through which the ultrapure water flows is switched to another removal member. The path control unit 520 may control the opening and closing of valves 1130 to 1135.
- FIG. 8 is a diagram showing a third internal configuration example of the processing unit 110 shown in FIG.
- the processing unit 110 shown in FIG. 1 includes four removal members 1140, 1141, 1142, 1143 and four valves 1150 to 1153.
- the series in which the removal members 1140, 1141 and the valves 1150, 1151 are connected in series in the order of the valve 1150, the removal member 1140, the removal member 1141, and the valve 1151 from the upstream, and the removal members 1142, 1143 and the valves 1152, 1153 are connected.
- a series of valves 1152, removal member 1142, removal member 1143, and valve 1153 connected in series from the upstream are connected in parallel to each other.
- the valves 1150 to 1153 are the sixth valves in which the ultrapure water flowing from the flow pipe 210 is controlled to flow to one of the two series. Based on the result of comparison between the first amount and the second amount in the comparison unit 510, the flow path control unit 520 controls the opening and closing of the valves 1150 to 1153. At this time, when the first amount is smaller than the second amount but approaches the second amount (for example, when the first amount becomes a value obtained by subtracting a predetermined value from the second amount). The flow path control unit 520 controls the opening and closing of the valves 1150 to 1153 so as to switch the series through which the ultrapure water flows to the other series.
- a value smaller than the second amount is set in advance as an allowable amount, and when the first amount becomes the allowable amount, the flow path control is performed so that the series through which the ultrapure water flows is switched to the other series.
- the unit 520 may control the opening and closing of the valves 1150 to 1153. Further, a valve similarly controlled by the flow path control unit 520 may be provided between the removal member 1140 and the removal member 1141 and between the removal member 1142 and the removal member 1143.
- the processing unit 110 includes a plurality of removal members, and the removal members have a redundant configuration. Then, the flow path control unit 520 switches the removing member through which the ultrapure water flows by using the sixth valve according to the amount of impurities contained in the ultrapure water flowing through the removing member. As a result, the ultrapure water can be continuously supplied to the cleaning device 120.
- a pump may be provided in the processing unit 110, and the ultrapure water may be supplied using the pump. The installation position of the pump is, for example, the stage before the removal member.
- the specific redundant configuration of the removal member in the processing unit 110 is not limited to that shown in FIGS. 6 to 8. Further, the above description does not exclude the processing unit 110 including only one removing member from the present invention.
- Each of the removal members 1100, 1101, 1120 to 1122, 1140 to 1143 shown in FIGS. 6 to 8 is, for example, an ion exchanger, a microfiltration membrane (MF), an ultrafiltration membrane (UF), or the like. It is the above-mentioned member as a member to be filled in a processing unit 110.
- the ultrapure water from the ultrapure water production facility 100 is passed through the processing unit 110 and then supplied to the cleaning device 120.
- the amount (concentration) of impurities in ultrapure water in the flow pipe supplied from the ultrapure water production facility 100 to the cleaning device 120 without going through the processing unit 110, and the amount of impurities in ultrapure water via the treatment unit 110 ( Based on the result of comparison with the concentration), the path of the ultrapure water supplied to the cleaning device 120 is switched to one that does not go through the processing unit 110.
- the ultrapure water production facility 100 can be started up at an early stage, and the operation of the ion exchange filter constituting the processing unit 110 is optimized. Therefore, the system for supplying ultrapure water can be efficiently used.
- FIG. 9 is a diagram showing a second embodiment of the ultrapure water supply system of the present invention.
- the ultrapure water supply system in this embodiment is compared with a processing unit 110, a distribution pipe 210, 220, 230, 240, 250, a water volume control unit 310, 320, 330, and a measurement unit 410. It has a section 510 and a flow path control section 521.
- the processing unit 110, the distribution pipe 210, 220, 230, 240, the water amount control unit 310, 320, the measurement unit 410, 420, and the comparison unit 510 are the same as those in the first embodiment, respectively.
- the distribution pipe 250 is a third branch portion between the point where the measurement unit 410 is installed and the confluence point between the distribution pipe 240 and the distribution pipe 210, and branches from the distribution pipe 210 to exceed ultrapure water. This is the fifth distribution pipe that flows to the pure water production facility 100.
- the distribution pipe 250 may be used to flow ultrapure water from the distribution pipe 210 to a drainage tank / recovery tank (not shown).
- the water amount control unit 330 is a third water amount control unit provided in the third branch unit.
- FIG. 10 is a diagram showing an example of the internal configuration of the water amount control unit 330 shown in FIG.
- the water amount control unit 330 shown in FIG. 9 has a valve 650 and a valve 660.
- the valve 650 is a fifth valve (open / close valve) that adjusts the amount of water flowing to the flow pipe 250.
- the valve 660 is a sixth valve (open / close valve) that adjusts the amount of water flowing to the cleaning device 120.
- the flow path control unit 521 controls the valves 610 and 650 in the open state and controls the valves 660 in the closed state. ..
- the ultrapure water from the ultrapure water production facility 100 flows to the cleaning device 120 via the flow pipes 210, 220, 240, and flows through the flow pipes 210, 250.
- the flow path control unit 521 controls the valves 620 and 630 in the open state.
- the flow path control unit 521 not only controls the open / closed state of the valves 610, 620, 630, 640, 650, 660 to the fully open or fully closed state, but also controls the flow tubes 210, 220, 230, 240, 250, respectively.
- the open / closed state is controlled so that the required amount of ultrapure water flows.
- the water volume control units 310, 320, 330, the measurement units 410, 420, the valves 610, 620, 630, 640, 650, 660, the comparison unit 510, and the flow path control unit 521 described above form a control device. Configure.
- the ultrapure water from the ultrapure water production facility 100 is passed through the processing unit 110 and then supplied to the cleaning device 120.
- the amount (concentration) of impurities in ultrapure water in the flow pipe supplied from the ultrapure water production facility 100 to the cleaning device 120 without going through the processing unit 110, and the amount of impurities in ultrapure water via the treatment unit 110 are switched to one that does not go through the processing unit 110.
- the ultrapure water production facility 100 can be started up at an early stage, and the operation of the ion exchanger, the microfiltration membrane (MF), the ultrafiltration membrane (UF), etc. constituting the processing unit 110 is optimal. Is made. Therefore, the system for supplying ultrapure water can be efficiently used.
- a distribution pipe 250 is provided to return the ultrapure water flowing through the distribution pipe 210 to the recovery tank or the drainage tank. Thereby, for example, the ultrapure water can be flowed so as to blow the flow pipe 210 when the treatment unit 110 is removed from the flow pipe 210.
- the treatment unit 110 is re-installed in the flow pipe 210 and supplied from the ultrapure water production facility 100.
- the ultrapure water is supplied through the flow pipe 210 in which the processing unit 110 is installed. As a result, the start-up time can be shortened, and ultrapure water can be supplied without stopping the operation of the cleaning device 120.
- each component has been assigned to each function (process), but this allocation is not limited to the above. Further, the above-mentioned form is merely an example of the configuration of the constituent elements, and the present invention is not limited to this. Further, each embodiment may be combined. Further, in addition to the control of the open / closed state of the valves 610, 620, 630, 640, 650, and 660 by the flow path control units 520 and 521 as described above, the control of the open / closed state may be performed by the administrator who manages the system.
- the processing performed by the measurement units 410, 420, the comparison unit 510, and the flow path control unit 520, 521 described above may be performed by logic circuits manufactured according to the purpose. Further, a computer program (hereinafter referred to as a program) in which the processing contents are described as a procedure can be read by a control device provided with a measuring unit 410, 420, a comparison unit 510, and a flow path control unit 520, 521. The program recorded on the recording medium may be read by the control device and executed.
- the recording media that can be read by the control device are floppy (registered trademark) disc, optomagnetic disc, DVD (Digital Versaille Disc), CD (Compact Disc), Blu-ray (registered trademark) Disc, and USB (Universal Serial Bus).
- a transferable recording medium such as a memory
- it refers to a memory such as a ROM (Read Only Memory) and a RAM (Random Access Memory) built in a control device, an HDD (Hard Disk Drive), and the like.
- the program recorded on this recording medium is read by a CPU provided in the control device, and the same processing as described above is performed under the control of the CPU.
- the CPU operates as a computer that executes a program read from a recording medium in which the program is recorded.
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Abstract
Description
前記第1の流通管上に設置され、前記超純水を処理する処理ユニットと、
前記超純水製造設備と前記処理ユニットとの間で前記第1の流通管から分岐し、前記洗浄装置へ超純水を流す第2の流通管と、
前記第1の流通管から前記第2の流通管が分岐する第1の分岐部に設けられた第1の水量制御部と、
前記第2の流通管から前記洗浄装置へ流す超純水を制御する第2の水量制御部と、
前記処理ユニットで処理された超純水に含まれる不純物の量である第1の量と、前記処理ユニットで処理されていない超純水に含まれる不純物の量である第2の量とを比較する比較部と、
前記比較部における比較の結果に基づいて、前記第1の水量制御部と前記第2の水量制御部とを制御する流路制御部とを有する超純水供給システムである。
前記第2の流通管から前記洗浄装置へ流す超純水を制御する第2の水量制御部と、
前記処理ユニットを通過した第1のポイントにおける前記超純水に含まれる不純物の量である第1の量と、前記超純水製造設備から流され、前記処理ユニットで処理されていない超純水に含まれる不純物の量である第2の量とを比較する比較部と、
前記比較部における比較の結果に基づいて、前記第1の水量制御部と前記第2の水量制御部とを制御する流路制御部とを有する制御装置である。
超純水製造設備から洗浄装置へ超純水を流す第1の流通管上に設置され、前記超純水を処理する処理ユニットを通過した第1のポイントにおける前記超純水に含まれる不純物の量である第1の量と、前記超純水製造設備から流され、前記処理ユニットで処理されていない超純水に含まれる不純物の量である第2の量とを比較する手順と、
前記比較の結果に基づいて、前記第1の流通管に流す超純水と前記第2の流通管に流す超純水とを制御する手順とを実行させるためのプログラムである。
(第1の実施の形態)
処理ユニット110の構成の具体的な例として、
・アニオンモノリス
・カチオンモノリス
・アニオンモノリスとカチオンモノリスの組み合わせ
が挙げられる。ここで、モノリス状有機多孔質体をモノリスと称する。また、これらそれぞれの前段または後段に、イオン交換樹脂、イオン交換樹脂と精密ろ過膜(MF)の組み合わせ、イオン吸着膜、イオン吸着膜と精密ろ過膜(MF)との組み合わせまたは複数の精密ろ過膜(MF)の組合せを設けても良い。さらに、処理ユニット110の構成は、
・アニオン交換樹脂
・カチオン交換樹脂
・アニオン交換樹脂とカチオン交換樹脂との組み合わせ(積層または混床)
であっても良い。また、これらそれぞれの前段または後段に、イオン吸着膜、イオン吸着膜と精密ろ過膜(MF)との組み合わせまたは複数の精密ろ過膜(MF)の組合せを設けても良い。さらに、処理ユニット110の構成は、
・イオン吸着膜
・イオン吸着膜と精密ろ過膜(MF)との組み合わせ
・精密ろ過膜(MF)
・限外ろ過膜(UF)
であっても良い。また、上述したようなモノリスとイオン交換樹脂とを組み合わせたものや、モノリスとイオン吸着膜とを組み合わせたものであっても良い。
(第2の実施の形態)
Claims (12)
- 超純水製造設備から洗浄装置へ超純水を流す第1の流通管と、
前記第1の流通管上に設置され、前記超純水を処理する処理ユニットと、
前記超純水製造設備と前記処理ユニットとの間で前記第1の流通管から分岐し、前記洗浄装置へ超純水を流す第2の流通管と、
前記第1の流通管から前記第2の流通管が分岐する第1の分岐部に設けられた第1の水量制御部と、
前記第2の流通管から前記洗浄装置へ流す超純水を制御する第2の水量制御部と、
前記処理ユニットで処理された超純水に含まれる不純物の量である第1の量と、前記処理ユニットで処理されていない超純水に含まれる不純物の量である第2の量とを比較する比較部と、
前記比較部における比較の結果に基づいて、前記第1の水量制御部と前記第2の水量制御部とを制御する流路制御部とを有する超純水供給システム。 - 請求項1に記載の超純水供給システムにおいて、
前記第2の流通管から前記超純水製造設備へ超純水を戻す第3の流通管と、前記第2の流通管から前記洗浄装置へ超純水を流す第4の流通管とに分岐する第2の分岐部を有し、
前記第2の水量制御部は、前記第2の分岐部に設けられる超純水供給システム。 - 請求項2に記載の超純水供給システムにおいて、
前記第1の水量制御部は、前記第1の流通管から前記処理ユニットへ流れる水量を調整する第1のバルブと、前記第1の流通管から前記第2の流通管へ流れる水量を調整する第2のバルブとを有し、
前記第2の水量制御部は、前記第2の流通管から前記第3の流通管へ流れる水量を調整する第3のバルブと、前記第2の流通管から前記第4の流通管へ流れる水量を調整する第4のバルブとを有し、
前記流路制御部は、前記第1のバルブ、前記第2のバルブ、前記第3のバルブおよび前記第4のバルブそれぞれの開閉を制御する超純水供給システム。 - 請求項3に記載の超純水供給システムにおいて、
前記流路制御部は、前記第1の量が前記第2の量よりも少なく、且つ前記第1の量と前記第2の量との差分が所定の値以上である場合、前記第1のバルブ、前記第2のバルブおよび前記第3のバルブを開状態とし、前記第4のバルブを閉状態とし、それ以外の場合、前記第1のバルブおよび前記第3のバルブを閉状態とし、前記第2のバルブおよび前記第4のバルブを開状態とする超純水供給システム。 - 請求項2から4のいずれか1項に記載の超純水供給ユニットにおいて、
前記第1の量が測定される第1の量測定ポイントと、前記第4の流通管と前記第1の流通管との合流点との間で、前記第1の流通管から分岐し、超純水を前記超純水製造設備へ流す第5の流通管と、
前記第1の流通管から前記第5の流通管へ流れる水量を調整する第5のバルブとを有する超純水供給システム。 - 請求項1から5のいずれか1項に記載の超純水供給システムにおいて、
前記第1の量を測定する第1の測定部と、
前記第2の量を測定する第2の測定部とを有し、
前記第1の測定部および前記第2の測定部は、前記不純物を捕捉するイオン交換体を含む超純水供給システム。 - 請求項6に記載の超純水供給システムにおいて、
前記イオン交換体は、モノリス状イオン交換体である超純水供給システム。 - 請求項1から5のいずれか1項に記載の超純水供給システムにおいて、
前記第1の量を測定する第1の測定部と、
前記第2の量を測定する第2の測定部とを有し、
前記第1の測定部および前記第2の測定部は、前記不純物として直径10nm以上の微粒子を捕捉できるろ過膜と遠心ろ過機構とを含む超純水供給システム。 - 請求項1から8のいずれか1項に記載の超純水供給システムにおいて、
前記処理ユニットは、
当該処理ユニットに流入する前記超純水から前記不純物を除去する、互いに並列に接続された複数の除去部材と、
前記複数の除去部材のいずれか1つの除去部材に前記超純水を流通させる第6のバルブとを有する超純水供給システム。 - 請求項9に記載の超純水供給システムにおいて、
前記流路制御部は、前記比較部における前記第1の量と前記第2の量との比較の結果に基づいて、前記超純水を流通させる除去部材を切り替えるように前記第6のバルブを制御する超純水供給システム。 - 超純水製造設備から洗浄装置へ超純水を流す第1の流通管から、前記超純水製造設備と前記第1の流通管上に設置され、前記超純水を処理する処理ユニットとの間で前記第1の流通管から分岐し、前記洗浄装置へ超純水を流す第2の流通管が分岐する第1の分岐部に設けられた第1の水量制御部と、
前記第2の流通管から前記洗浄装置へ流す超純水を制御する第2の水量制御部と、
前記処理ユニットを通過した第1のポイントにおける前記超純水に含まれる不純物の量である第1の量と、前記超純水製造設備から流され、前記処理ユニットで処理されていない超純水に含まれる不純物の量である第2の量とを比較する比較部と、
前記比較部における比較の結果に基づいて、前記第1の水量制御部と前記第2の水量制御部とを制御する流路制御部とを有する制御装置。 - コンピュータに、
超純水製造設備から洗浄装置へ超純水を流す第1の流通管上に設置され、前記超純水を処理する処理ユニットを通過した第1のポイントにおける前記超純水に含まれる不純物の量である第1の量と、前記超純水製造設備から流され、前記処理ユニットで処理されていない超純水に含まれる不純物の量である第2の量とを比較する手順と、
前記比較の結果に基づいて、前記第1の流通管に流す超純水と前記第2の流通管に流す超純水とを制御する手順とを実行させるためのプログラム。
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JP2010249651A (ja) * | 2009-04-15 | 2010-11-04 | Kurita Water Ind Ltd | 水質評価方法及び装置 |
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