WO2022022072A1 - 显示基板、显示面板及显示装置 - Google Patents

显示基板、显示面板及显示装置 Download PDF

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Publication number
WO2022022072A1
WO2022022072A1 PCT/CN2021/098824 CN2021098824W WO2022022072A1 WO 2022022072 A1 WO2022022072 A1 WO 2022022072A1 CN 2021098824 W CN2021098824 W CN 2021098824W WO 2022022072 A1 WO2022022072 A1 WO 2022022072A1
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Prior art keywords
light
layer
photosensitive material
openings
area
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PCT/CN2021/098824
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English (en)
French (fr)
Inventor
程博
都蒙蒙
苟结
马宏伟
杨益祥
杨双宾
颜俊
李宇婧
张振华
Original Assignee
京东方科技集团股份有限公司
成都京东方光电科技有限公司
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Priority to US17/922,471 priority Critical patent/US20230180528A1/en
Publication of WO2022022072A1 publication Critical patent/WO2022022072A1/zh

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    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/301—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a display substrate, a display panel and a display device.
  • an embodiment of the present disclosure provides a display substrate, including:
  • the base substrate includes a bending region
  • the pixel definition layer has a plurality of first openings in the bending region, the orthographic projection of the sub-pixels in the bending region is located in the orthographic projection of the first openings, the first The slope angle of the opening is greater than a preset angle, and the slope angle of the first opening is positively correlated with the curvature of the bending area, so that the outgoing light of the sub-pixels in the bending area is not affected by the pixel. Defining layer occlusion.
  • the side surface of the pixel defining layer includes: Part 1, Transition and Part 2; of which,
  • the thickness of the first portion is larger than that of the transition portion and smaller than the thickness of the second portion.
  • the side surface of the pixel definition layer includes: a first part, and the first part is close to the base substrate The transition part and the second part are alternately arranged at the boundary of one side; wherein,
  • a thickness of the second portion is greater than a thickness of the transition portion and less than a thickness of the first portion.
  • the slope angle of the first opening is greater than or equal to 160° and less than or equal to 170°.
  • the base substrate further includes a flat region
  • the pixel defining layer has a plurality of second openings in the flat region
  • the sub-pixels are in the flat region.
  • the orthographic projection of the flat area is located within the orthographic projection of the second opening, and the second opening has the same shape as the first opening.
  • the base substrate further includes a flat region
  • the pixel defining layer has a plurality of second openings in the flat region
  • the sub-pixels are in the flat region.
  • the orthographic projection of the flat area is located within the orthographic projection of the second opening, and the slope angle of the second opening is smaller than the slope angle of the first opening.
  • the slope angle of the second opening is greater than or equal to 140° and less than or equal to 150°.
  • a side surface of the pixel definition layer is a plane, and the plane and the pixel definition layer are close to the base substrate
  • the angle between the surfaces on one side is greater than or equal to 30° and less than or equal to 40°.
  • an embodiment of the present disclosure provides a method for fabricating a display substrate, including:
  • the pixel definition layer has a plurality of first openings with a slope angle greater than a predetermined angle in the to-be-bent region;
  • forming a pixel definition layer specifically includes:
  • a first mask plate is provided, the first mask plate includes a first transparent substrate, a first light shielding layer located on the first transparent substrate; the first light shielding layer has a plurality of first transparent a light area, a plurality of second light transmission areas surrounding the first light transmission area, and between the first light transmission areas and between the first light transmission areas and the second light transmission areas shading area;
  • the photosensitive material layer is sequentially exposed and developed, and a plurality of first openings located in the to-be-bent area and a plurality of second openings located in the flat area are formed in the photosensitive material layer, and a plurality of annular grooves surrounding the first opening and the second opening;
  • Baking the photosensitive material layer is performed to form a pixel defining layer with a slope angle of 10°-20° in the to-be-bent area and the flat area.
  • forming a pixel definition layer specifically includes:
  • a second mask plate is provided, the second mask plate includes a second transparent substrate, a second light shielding layer located on the second transparent substrate;
  • the second light-shielding layer has a plurality of first light-transmitting regions, a light-shielding region located between the first light-transmitting regions, and also has a surrounding first light-shielding region in the light-shielding region of the to-be-bent region. a plurality of second light-transmitting regions in the light-transmitting region;
  • the photosensitive material layer is sequentially exposed and developed, and a plurality of first openings located in the to-be-bent area and a plurality of first openings located in the flat area are formed in the photosensitive material layer. a second opening, and an annular groove surrounding the first opening;
  • Baking the photosensitive material layer is performed to form a pixel defining layer with a slope angle of 10°-20° in the to-be-bent region and a slope angle of 30°-40° in the flat region.
  • the width of the annular groove is 0.5 ⁇ m-5 ⁇ m.
  • the width of the photosensitive material layer between the annular groove and the pixel opening is 0.5 ⁇ m-5 ⁇ m.
  • the pixel definition layer has the first slope angle in the flat area, and the formation of the pixel definition layer specifically includes:
  • a third mask plate is provided, the third mask plate includes a third light shielding layer; the third light shielding layer has a plurality of light-transmitting regions, and a zigzag structure is located between the light-transmitting regions and has a serrated edge. shading area;
  • the photosensitive material layer is sequentially exposed and developed, and a plurality of first openings located in the to-be-bent area and a plurality of second openings located in the flat area are formed in the photosensitive material layer. Openings, and the photosensitive material layers around the plurality of first openings and the plurality of second openings have the sawtooth structure;
  • Baking the photosensitive material layer is performed to form a pixel defining layer with a slope angle of 10°-20° in the to-be-bent area and the flat area.
  • forming a pixel definition layer specifically includes:
  • a fourth mask plate is provided, the fourth mask plate includes a fourth light shielding layer; the second light shielding layer corresponding to the to-be-bent area and the flat area has a plurality of light-transmitting areas, and a light-shielding area between the areas, and the edge of the light-shielding area corresponding to the to-be-bent area has a sawtooth structure;
  • the photosensitive material layer is sequentially exposed and developed, and a plurality of first openings located in the to-be-bent area are formed in the photosensitive material layer, and a plurality of first openings located in the flat area are formed in the photosensitive material layer.
  • a plurality of second openings, and the photosensitive material layer around the plurality of first openings has the sawtooth structure;
  • Baking the photosensitive material layer is performed to form a pixel defining layer with a slope angle of 10°-20° in the to-be-bent region and a slope angle of 30°-40° in the flat region.
  • an embodiment of the present disclosure provides a display panel including the above-mentioned display substrate provided by an embodiment of the present disclosure.
  • an embodiment of the present disclosure provides a display device including the above-mentioned display panel provided by an embodiment of the present disclosure.
  • FIG. 1 is a schematic structural diagram of a display panel according to an embodiment of the present disclosure
  • FIG. 2 is a schematic structural diagram of a display substrate provided by an embodiment of the present disclosure
  • Figure 3 is a micrograph of the P region in Figure 2;
  • FIG. 5 is a schematic structural diagram of a display substrate manufacturing process according to an embodiment of the present disclosure.
  • FIG. 6 is a schematic structural diagram of a first mask plate according to an embodiment of the present disclosure.
  • Fig. 7 is a cross-sectional structure schematic diagram along line I-II in Fig. 6;
  • FIG. 8 is another schematic structural diagram of a display substrate in a manufacturing process according to an embodiment of the present disclosure.
  • Fig. 9 is a cross-sectional structure schematic diagram along line III-IV in Fig. 8;
  • FIG. 10 is another schematic structural diagram of the display substrate in the manufacturing process according to the embodiment of the present disclosure.
  • FIG. 11 is a schematic cross-sectional structure diagram along the line V-VI in FIG. 10;
  • FIG. 12 is a schematic structural diagram of a second mask plate according to an embodiment of the present disclosure.
  • Figure 13 is a schematic cross-sectional structure diagram along line VII-VIII in Figure 12;
  • FIG. 14 is another schematic structural diagram of a display substrate in a manufacturing process according to an embodiment of the present disclosure.
  • FIG. 15 is a schematic structural diagram of a third mask plate according to an embodiment of the present disclosure.
  • FIG. 16 is another schematic structural diagram of a third mask plate provided by an embodiment of the present disclosure.
  • FIG. 17 is another schematic structural diagram of the display substrate manufacturing process according to the embodiment of the present disclosure.
  • FIG. 18 is another schematic structural diagram of the display substrate in the manufacturing process according to the embodiment of the present disclosure.
  • FIG. 19 is a schematic structural diagram of a fourth mask plate provided by an embodiment of the present disclosure.
  • FIG. 20 is another schematic structural diagram of a fourth mask plate provided by an embodiment of the present disclosure.
  • FIG. 21 is another schematic structural diagram of a display substrate in a manufacturing process according to an embodiment of the present disclosure.
  • FIG. 22 is another schematic structural diagram of a display substrate in a manufacturing process according to an embodiment of the present disclosure.
  • Curved screens bent at large angles require large-angle bending of flexible screens.
  • the curved screen bent at a large angle as shown in FIG. 1 as an example, in the related art, since the edge of the curved screen is the bending area b and the middle is the flat area a, when the curved screen is lit, the screen is generally viewed from the center of the screen directly in front of the screen.
  • the flat area a emits white light
  • the bending area b emits yellow light, resulting in the display quality of the bending area b being worse than that of the flat area a.
  • the pixel-defining layer will not block the outgoing light of the sub-pixels, so that the outgoing light of the sub-pixels of different colors is mixed to form white light; while in the bending area b, the bending causes the pixel-defining layer to occur.
  • the deformation will block part of the outgoing light of the sub-pixel, while the material of the pixel-defining layer in the related art will generate yellow light after absorbing blue light, and the red light and green light emitted by the sub-pixel will be mixed to form yellow light.
  • yellowing in the fold area b There is a problem of yellowing in the fold area b.
  • an embodiment of the present disclosure provides a display substrate, as shown in FIG. 2 , including:
  • the base substrate 101 includes a bending region b;
  • the pixel definition layer 103, the pixel definition layer 103 has a plurality of first openings K1 in the bending region b, the orthographic projection of the sub-pixels 102 in the bending region b is located in the orthographic projection of the first opening K1, and the slope of the first opening K1
  • the angle ⁇ (correspondingly, the first slope angle ⁇ of the pixel defining layer 103 around the first opening K1 is a supplementary angle of ⁇ ) is greater than the preset angle, and the slope angle ⁇ of the first opening K1 is positively correlated with the curvature of the bending region b , so that the outgoing light of the sub-pixels 102 in the bending region b is not blocked by the pixel defining layer 103 .
  • the slope angle ⁇ of the first opening K1 in the bending region b is set to be greater than a predetermined angle (eg, the slope angle of the pixel opening in the related art) and is different from the bending region b.
  • the curvature of the sub-pixel 102 is positively correlated, so that the outgoing light of the sub-pixel 102 in the bending area b is not blocked by the pixel defining layer 103, thereby preventing the blue light emitted by the sub-pixel 102 from being absorbed and converted into yellow light due to being blocked by the pixel defining layer 103, ensuring that the The blue light, green light, and red light emitted by the sub-pixels 102 are mixed to form white light, thus effectively solving the problem of yellowing of the bending region b.
  • the side surface of the pixel defining layer 103 includes: The first part A, the transition part B and the second part C of the cloth; wherein,
  • the thickness of the first portion A is greater than the thickness of the transition portion B and smaller than the thickness of the second portion C.
  • an annular groove can be provided in the photosensitive material between the first openings K1. Due to the fluidity of the photosensitive material, the photosensitive material adjacent to the annular groove will flow into the annular groove. Finally, after baking and shaping, a transition part B with a smaller thickness, and a first part A and a second part C respectively located on both sides of the transition part B are formed. In the present disclosure, the overall thickness of the pixel defining layer 103 in the bending region b is reduced, and the first slope angle ⁇ is reduced.
  • the side surface of the pixel definition layer 103 includes: a first part A, and a side surface of the first part A close to the base substrate 101 The transition part B and the second part C alternately arranged at the boundary; wherein,
  • the thickness of the second portion C is greater than the thickness of the transition portion B and smaller than the thickness of the first portion A.
  • a sawtooth structure may be provided in the photosensitive material adjacent to the first opening K1. Due to the fluidity of the photosensitive material, the gaps between the sawtooth structures will be blocked by the surrounding photosensitive material. Filling, and finally after baking and shaping, a transition part B with a smaller thickness is formed, a second part C (corresponding to the position of the sawtooth structure) alternately arranged with the transition part B, and the transition part B and the second part C are far from the first part C.
  • the first portion A of the opening K1 and compared with the technical solution without the sawtooth structure in the related art, the overall thickness of the pixel defining layer 103 in the bending region b in the present disclosure is reduced, and the first slope angle ⁇ is reduced.
  • the slope angle ⁇ of the first opening K1 is greater than or equal to 160° and less than or equal to 170°, correspondingly.
  • the first slope angle ⁇ of the pixel defining layer 103 in the bending region b is greater than or equal to 10° and less than or equal to 20°, such as 10°, 11°, 12°, 13°, 14°, 15°, 16°, 17°, 18°, 19°, 20°, etc.
  • the base substrate 101 further includes a flat area a
  • the pixel defining layer 103 has a plurality of second openings K2 in the flat area a
  • the sub-pixels The orthographic projection of 102 in the flat region a is located in the orthographic projection of the second opening K2.
  • the second The shape of the opening K2 can be kept the same as that in the phase technology (specifically, the slope angle ⁇ of the second opening K2 is greater than or equal to 150° and less than or equal to 140°), and the corresponding second slope angle ⁇ of the pixel definition layer 103 can be kept 30°-40° in the related art is unchanged; of course, the second opening K2 in the flat area a can be kept the same shape as the first opening K1 in the bending area b in the present disclosure, that is, the slope angle of the second opening K2 ⁇ is also greater than or equal to 160° and less than or equal to 170°, correspondingly, the second slope angle ⁇ of the pixel defining layer 103 is greater than or equal to 10° and less than or equal to 20°, which is not limited herein.
  • the side surface of the pixel defining layer 103 in the flat area a is a plane, and the included angle between the plane and the surface of the pixel definition layer 103 on the side close to the base substrate 101 (that is, the second slope angle ⁇ of the pixel definition layer 103 in the flat area a) is greater than or equal to 30° and less than or Equal to 40° (ie complementary to the slope angle ⁇ of the second opening K).
  • the sub-pixel 102 includes an anode and a cathode, and a light-emitting functional layer located between the anode and the cathode; wherein, the light-emitting functional layer includes but is not limited to: a hole injection layer, A hole transport layer, an electron blocking layer, a light emitting material layer, a hole blocking layer, an electron transport layer, and an electron injection layer.
  • an embodiment of the present disclosure also provides a method for manufacturing a display substrate. Since the principle of the manufacturing method for solving technical problems is similar to the principle for solving technical problems of the above-mentioned display substrate, the manufacturing method provided by the embodiment of the present disclosure provides For the implementation of the method, reference may be made to the implementation of the above-mentioned display substrate provided by the embodiments of the present disclosure, and repeated descriptions will not be repeated.
  • an embodiment of the present disclosure provides a method for manufacturing a display substrate, which may specifically include the following steps:
  • the pixel definition layer has a plurality of first openings with a slope angle greater than a predetermined angle in the to-be-bent area;
  • the base substrate with a plurality of sub-pixels is bent, wherein the curvature of the bending region is positively correlated with the slope angle of the first opening, so that the outgoing light of the sub-pixels in the bending region is not blocked by the pixel defining layer.
  • forming a pixel definition layer may be specifically implemented in the following manner:
  • a photosensitive material layer 103' is formed on the base substrate 101, as shown in FIG. 5;
  • a first mask 104 is provided.
  • the first mask 104 includes a first transparent substrate 1041 and a first light shielding layer 1042 on the first transparent substrate 1041; the first light shielding layer 1042 has a plurality of first light shielding layers 1042.
  • the photosensitive material layer 103' is exposed and developed in sequence, and a plurality of first openings K1 located in the to-be-bent area and a plurality of first openings K1 located in the flat area a are formed in the photosensitive material layer 103'.
  • the width of the photosensitive material layer 103 ′ between the annular groove H and the first opening K1 or the second opening K2 can be 0.5 ⁇ m-5 ⁇ m (eg 0.5 ⁇ m, 1 ⁇ m, 1.5 ⁇ m, 2 ⁇ m, 2.5 ⁇ m, 3 ⁇ m, 3.5 ⁇ m, 4 ⁇ m, 4.5 ⁇ m, 5 ⁇ m, etc.).
  • the photosensitive material layer 103' is subjected to a baking process. Due to the fluidity of the photosensitive material layer 103', during the baking process, the annular groove H will be filled with the surrounding photosensitive material layer 103', so that the pixel finally formed There is no annular groove H on the defining layer 103, and compared with the conventional design in the related art, the thickness of the pixel defining layer 103 surrounding the first opening K1 and the second opening K2 is reduced, and the slope angle is reduced, and finally the pixel defining layer 103 is formed.
  • the pixel defining layer 103 with a slope angle of 10°-20° in the to-be-bent area and the flat area a is shown in FIG. 10 and FIG. 11 . It is easy to understand that, since the annular groove H will be filled by the photosensitive material layer 103 ′ around it during the baking process, the larger the width of the annular groove H, the thinner the pixel defining layer 103 and the smaller the slope angle. small.
  • forming a pixel definition layer may be implemented in the following manner:
  • a photosensitive material layer 103' is formed on the base substrate 101, as shown in FIG. 5;
  • a second mask 105 is provided.
  • the second mask 105 includes a second transparent substrate 1051, a second light shielding layer 1052 located on the second transparent substrate 1051;
  • the second light-shielding layer 1052 has a plurality of first light-transmitting regions T1, and light-shielding regions S between the first light-transmitting regions T1, and the light-shielding region S of the to-be-bent region also has a surrounding first light-transmitting region T1 in the light-shielding region S.
  • a plurality of second light-transmitting regions T2 as shown in FIG. 12 and FIG. 13 ;
  • the photosensitive material layer 103' is exposed and developed in sequence, and a plurality of first openings K1 located in the to-be-bent area and a plurality of second openings located in the flat area are formed in the photosensitive material layer 103'. an opening K2, and a plurality of annular grooves H surrounding the first opening K1, as shown in FIG. 14 and FIG. 9;
  • the photosensitive material layer 103' is subjected to a baking process to form a pixel defining layer 103 with a slope angle of 10°-20° in the to-be-bent area and a slope angle of 30°-40° in the flat area.
  • forming a pixel definition layer may be specifically implemented by the following steps:
  • a photosensitive material layer 103' is formed on the base substrate 101, as shown in FIG. 5;
  • a third mask 106 is provided.
  • the third mask 106 includes a third light shielding layer 1061;
  • the shading area S is shown in FIGS. 15 and 16 ; specifically, FIG. 15 shows that the sawtooth structure is a triangle, and FIG. 16 shows that the sawtooth structure is a rectangle.
  • the sawtooth structure can also be other shapes. This is not specifically limited.
  • the photosensitive material layer 103' is exposed and developed in sequence, and a plurality of first openings K1 located in the to-be-bent area and a plurality of second openings located in the flat area are formed in the photosensitive material layer 103'.
  • the opening K2, and the photosensitive material layer 103' around the plurality of first openings K1 and the plurality of second openings K2 has a sawtooth structure, as shown in FIG. 17 and FIG. 18 ;
  • the photosensitive material layer 103' is subjected to a baking process. Due to the fluidity of the photosensitive material layer 103', during the baking process, the gaps between the sawtooth structures will be filled by the surrounding photosensitive material layer 103', so that the final The formed pixel defining layer 103 does not have a sawtooth structure, and compared with the conventional design in the related art, the thickness and slope angle of the pixel defining layer 103 surrounding the first opening K1 and the second opening K2 are reduced, specifically , forming a pixel defining layer 103 with a slope angle of 10°-20° between the to-be-bent area and the flat area.
  • forming a pixel definition layer may be implemented in the following manner:
  • a photosensitive material layer 103' is formed on the base substrate 101, as shown in FIG. 5;
  • a fourth mask 107 is provided.
  • the fourth mask 107 includes a fourth light shielding layer 1071;
  • the shading area S between the areas T, and the edge of the shading area S corresponding to the area to be bent has a sawtooth structure, as shown in FIG. 19 and FIG. 20 ;
  • the photosensitive material layer 103' is exposed and developed in sequence, and a plurality of first openings K1 located in the to-be-bent region and a plurality of second openings located in the flat region are formed in the photosensitive material layer 103'.
  • the opening K2, and the photosensitive material layers 103' around the plurality of first openings K1 have a sawtooth structure, as shown in FIG. 21 and FIG. 22;
  • the photosensitive material layer 103' is subjected to a baking process to form a pixel defining layer 103 with a slope angle of 10°-20° in the to-be-bent area and a slope angle of 30°-40° in the flat area.
  • an embodiment of the present disclosure provides a display panel, as shown in FIG. 1 , including the above-mentioned display substrate 01 provided by an embodiment of the present disclosure.
  • the display panel is an AMOLED panel bent at a large angle.
  • other essential components of the display panel such as pixel circuits, gate driving circuits, source driving circuits, light-emitting control driving circuits, encapsulation layers, and protective cover plate 02
  • the implementation of the display panel provided by the embodiment of the present disclosure may refer to the implementation of the above-mentioned display substrate provided by the embodiment of the present disclosure. No longer.
  • an embodiment of the present disclosure further provides a display device, including the above-mentioned display panel provided by an embodiment of the present disclosure, and the display device may be: a mobile phone, a tablet computer, a TV, a monitor, a notebook computer, a digital photo frame, Navigators, smart watches, fitness wristbands, personal digital assistants, and any other product or component that has a display function.
  • the display device eg, chip-on-film, driving circuit board
  • the implementation of the display device may refer to the above-mentioned embodiment of the display panel, and the repetition will not be repeated.
  • the above-mentioned display substrate, display panel, and display device provided by the embodiments of the present disclosure include: a base substrate, the base substrate including a bending region; a plurality of sub-pixels, located on the base substrate; a pixel definition layer, the pixel definition layer There are a plurality of first openings in the bending area, the orthographic projections of the plurality of sub-pixels in the bending area are located in the orthographic projections of the plurality of first openings, the slope angle of the first openings is greater than the preset angle, and the slope angle of the first openings There is a positive correlation with the curvature of the bending region, so that the outgoing light of the sub-pixels in the bending region is not blocked by the pixel defining layer.
  • the outgoing light of the sub-pixels in the bending area is not blocked by the pixel defining layer, thereby preventing the blue light emitted by the sub-pixels from being absorbed and converted into yellow light due to being blocked by the pixel defining layer. It is ensured that the blue light, green light and red light emitted by the sub-pixels are mixed to form white light, thus effectively solving the problem of yellowing in the bending area.

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Abstract

一种显示基板、显示面板及显示装置，显示基板包括：衬底基板(101)，衬底基板(101)包括弯折区(b)；多个子像素(102)，位于衬底基板(101)之上；像素界定层(103)，像素界定层(103)在弯折区(b)具有多个第一开口(K1)，子像素(102)在弯折区(b)的正投影位于第一开口(K1)的正投影内，第一开口(K1)的坡度角(α)大于预设角度，且第一开口(K1)的坡度角(α)与弯折区(b)的曲率呈正相关，以使得在弯折区(b)的子像素(102)的出射光未被像素界定层(103)遮挡。

Description

显示基板、显示面板及显示装置
相关申请的交叉引用
本申请要求在2020年07月27日提交中国专利局、申请号为202010730128.9、申请名称为“显示基板、显示面板及显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本公开涉及显示技术领域，尤其涉及一种显示基板、显示面板及显示装置。
背景技术
随着柔性AMOLED显示技术的发展，人们不仅对分辨率、色域等画质有更高需求，对产品的外形也有更高的追求，如大角度弯折的曲面屏幕、以及未来发展的卷曲屏幕。
发明内容
一方面，本公开实施例提供了一种显示基板，包括：
衬底基板，所述衬底基板包括弯折区；
多个子像素，位于所述衬底基板之上；
像素界定层，所述像素界定层在所述弯折区具有多个第一开口，所述子像素在所述弯折区的正投影位于所述第一开口的正投影内，所述第一开口的坡度角大于预设角度，且所述第一开口的坡度角与所述弯折区的曲率呈正相关，以使得在所述弯折区的所述子像素的出射光未被所述像素界定层遮挡。
可选地，在本公开实施例提供的上述显示基板中，在所述弯折区，所述像素界定层的侧表面包括：在远离所述衬底基板的方向上，依次连续排布的 第一部、过渡部和第二部；其中，
在垂直于所述衬底基板的方向上，所述第一部的厚度大于所述过渡部的厚度且小于所述第二部的厚度。
可选地，在本公开实施例提供的上述显示基板中，在所述弯折区，所述像素界定层的侧表面包括：第一部，以及在所述第一部靠近所述衬底基板一侧的边界处交替设置的所述过渡部和所述第二部；其中，
在垂直于所述衬底基板的方向上，所述第二部的厚度大于所述过渡部的厚度且小于所述第一部的厚度。
可选地，在本公开实施例提供的上述显示基板中，所述第一开口的坡度角大于或等于160°且小于或等于170°。
可选地，在本公开实施例提供的上述显示基板中，所述衬底基板还包括平坦区，所述像素界定层在所述平坦区具有多个第二开口，所述子像素在所述平坦区的正投影位于所述第二开口的正投影内，所述第二开口与所述第一开口的形状相同。
可选地，在本公开实施例提供的上述显示基板中，所述衬底基板还包括平坦区，所述像素界定层在所述平坦区具有多个第二开口，所述子像素在所述平坦区的正投影位于所述第二开口的正投影内，所述第二开口的坡度角小于所述第一开口的坡度角。
可选地，在本公开实施例提供的上述显示基板中，所述第二开口的坡度角大于或等于140°且小于或等于150°。
可选地，在本公开实施例提供的上述显示基板中，在所述平坦区，所述像素界定层的侧表面为一平面，且所述平面与所述像素界定层靠近所述衬底基板一侧表面之间的夹角大于或等于30°且小于或等于40°。
另一方面，本公开实施例提供了一种显示基板的制作方法，包括：
提供一衬底基板；
在所述衬底基板上形成像素界定层，所述像素界定层在待弯折区具有坡度角大于预设角度的多个第一开口；
在所述像素界定层的所述多个第一开口内形成多个子像素；
弯折具有所述多个子像素的所述衬底基板，其中弯折区的曲率与所述第一开口的坡度角呈正相关，使得所述弯折区的所述子像素的出射光未被所述像素界定层遮挡。
可选地，在本公开实施例提供的上述制作方法中，形成像素界定层，具体包括：
在所述衬底基板上形成感光材料层；
提供一第一掩膜板，所述第一掩膜板包括第一透明衬底，位于所述第一透明衬底之上的第一遮光层；所述第一遮光层具有多个第一透光区、环绕所述第一透光区的多个第二透光区、以及在所述第一透光区之间和所述第一透光区、所述第二透光区之间的遮光区；
采用第一掩膜板，对所述感光材料层依次进行曝光、显影处理，在所述感光材料层中形成位于待弯折区的多个第一开口，位于平坦区的多个第二开口，以及环绕所述第一开口和所述第二开口的多个环形槽；
对所述感光材料层进行烘烤处理，形成在所述待弯折区和所述平坦区具有10°-20°的坡度角的像素界定层。
可选地，在本公开实施例提供的上述制作方法中，形成像素界定层，具体包括：
在所述衬底基板上形成感光材料层；
提供一第二掩膜板，所述第二掩膜板包括第二透明衬底，位于所述第二透明衬底之上的第二遮光层；待弯折区和平坦区对应的所述第二遮光层在具有多个第一透光区、以及位于各所述第一透光区之间的遮光区，且在所述待弯折区的所述遮光区内还具有环绕所述第一透光区的多个第二透光区；
采用第二掩膜板，对所述感光材料层依次进行曝光、显影处理，在所述感光材料层中形成位于所述待弯折区的多个第一开口，位于所述平坦区的多个第二开口，以及环绕所述第一开口的环形槽；
对所述感光材料层进行烘烤处理，形成在所述待弯折区的坡度角为10° -20°、在所述平坦区的坡度角为30°-40°的像素界定层。
可选地，在本公开实施例提供的上述制作方法中，所述环形槽的宽度为0.5μm-5μm。
可选地，在本公开实施例提供的上述制作方法中，所述环形槽与所述像素开口之间的所述感光材料层的宽度为0.5μm-5μm。
可选地，在本公开实施例提供的上述制作方法中，所述像素界定层在平坦区具有所述第一坡度角，形成像素界定层，具体包括：
在所述衬底基板上形成感光材料层；
提供一第三掩膜板，所述第三掩膜板包括第三遮光层；所述第三遮光层具有多个透光区，以及位于各所述透光区之间且边缘具有锯齿结构的遮光区；
采用所述第三掩膜板，对所述感光材料层依次进行曝光、显影处理，在所述感光材料层中形成位于待弯折区的多个第一开口，位于平坦区的多个第二开口，且所述多个第一开口和所述多个第二开口周边的所述感光材料层具有所述锯齿结构；
对所述感光材料层进行烘烤处理，形成在所述待弯折区和所述平坦区具有10°-20°的坡度角的像素界定层。
可选地，在本公开实施例提供的上述制作方法中，形成像素界定层，具体包括：
在所述衬底基板上形成感光材料层；
提供一第四掩膜板，所述第四掩膜板包括第四遮光层；待弯折区和平坦区对应的所述第二遮光层具有多个透光区、以及位于各所述透光区之间的遮光区，且所述待弯折区对应的所述遮光区的边缘具有锯齿结构；
采用所述第四掩膜板，对所述感光材料层依次进行曝光、显影处理，在所述感光材料层中形成位于所述待弯折区的多个第一开口，位于所述平坦区的多个第二开口，且所述多个第一开口周边的所述感光材料层具有所述锯齿结构；
对所述感光材料层进行烘烤处理，形成在所述待弯折区的坡度角为10° -20°、在所述平坦区的坡度角为30°-40°的像素界定层。
另一方面，本公开实施例提供了一种显示面板，包括本公开实施例提供的上述显示基板。
另一方面，本公开实施例提供了一种显示装置，包括本公开实施例提供的上述显示面板。
附图说明
图1为本公开实施例提供的显示面板的结构示意图；
图2为本公开实施例提供的显示基板的结构示意图；
图3为图2中P区域的显微图；
图4为相关技术中像素界定层的侧表面的显微图；
图5为本公开实施例提供的显示基板制作过程中的一种结构示意图；
图6为本公开实施例提供的第一掩膜板的结构示意图；
图7为沿图6中I-II线的剖面结构示意图；
图8为本公开实施例提供的显示基板制作过程中的又一种结构示意图；
图9为沿图8中III-IV线的剖面结构示意图；
图10为本公开实施例提供的显示基板制作过程中的又一种结构示意图；
图11为沿图10中V-VI线的剖面结构示意图；
图12为本公开实施例提供的第二掩膜板的一种结构示意图；
图13为沿图12中VII-VIII线的剖面结构示意图；
图14为本公开实施例提供的显示基板制作过程中的又一种结构示意图；
图15为本公开实施例提供的第三掩膜板的一种结构示意图；
图16为本公开实施例提供的第三掩膜板的又一种结构示意图；
图17为本公开实施例提供的显示基板制作过程中的又一种结构示意图；
图18为本公开实施例提供的显示基板制作过程中的又一种结构示意图；
图19为本公开实施例提供的第四掩膜板的一种结构示意图；
图20为本公开实施例提供的第四掩膜板的又一种结构示意图；
图21为本公开实施例提供的显示基板制作过程中的又一种结构示意图；
图22为本公开实施例提供的显示基板制作过程中的又一种结构示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。需要注意的是，附图中各图形的尺寸和形状不反映真实比例，目的只是示意说明本公开内容。并且自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其它实施例，都属于本公开保护的范围。
除非另作定义，此处使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开说明书以及权利要求书中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“内”、“外”、“上”、“下”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
大角度(如90°)弯折的曲面屏幕，以及未来发展的卷曲屏幕，均需要对柔性屏幕进行大角度弯折。以图1所示大角度弯折的曲面屏幕为例，相关技术中由于曲面屏幕的边缘为弯折区b、中间为平坦区a，当曲面屏幕点亮时，一般从屏幕中央正前方看屏幕，以白色画面为例，可观看到平坦区a发出白光、弯折区b发出黄光，导致弯折区b的显示质量较平坦区a差。具体而言，在曲面屏幕的平坦区a，像素界定层不会遮挡子像素的出射光，从而不同颜色子像素的出射光混合形成白光；而在弯折区b，弯折导致像素界定层发生形变 从而会遮挡子像素的部分出射光，而相关技术中的像素界定层的材料在吸收蓝光后会生成黄光，并且子像素发出的红光和绿光混合后形成黄光，基于此，弯折区b出现发黄的问题。
针对相关技术中存在的上述技术问题，本公开实施例提供了一种显示基板，如图2所示，包括：
衬底基板101，该衬底基板101包括弯折区b；
多个子像素102，位于衬底基板101之上；
像素界定层103，该像素界定层103在弯折区b具有多个第一开口K1，子像素102在弯折区b的正投影位于第一开口K1的正投影内，第一开口K1的坡度角α(相应地，第一开口K1周边像素界定层103的第一坡度角β为α的补角)大于预设角度，且第一开口K1的坡度角α与弯折区b的曲率呈正相关，以使得在弯折区b的子像素102的出射光未被像素界定层103遮挡。
在本公开实施例提供的上述显示基板中，通过将弯折区b内第一开口K1的坡度角α设置为大于预设角度(例如相关技术中像素开口的坡度角)且与弯折区b的曲率呈正相关，使得在弯折区b的子像素102的出射光未被像素界定层103遮挡，从而避免了子像素102发出的蓝光因被像素界定层103遮挡吸收转换为黄光，保证了子像素102发出的蓝光、绿光、红光混合形成白光，因此有效解决了弯折区b发黄的问题。
可选地，在本公开实施例提供的上述显示基板中，如图3所示，在弯折区b，像素界定层103的侧表面包括：在远离衬底基板101的方向上，依次连续排布的第一部A、过渡部B和第二部C；其中，
在垂直于衬底基板101的方向上，第一部A的厚度大于过渡部B的厚度且小于第二部C的厚度。
在采用感光材料形成像素界定层103的过程中，可在第一开口K1之间的感光材料中设置环形槽，由于感光材料的流动性，会使得环形槽临近的感光材料流进环形槽内，最终在烘烤定型后，形成厚度较小的过渡部B，以及分别位于过渡部B两侧的第一部A和第二部C，且相较于相关技术中不设置环 形槽的技术方案，本公开中弯折区b内像素界定层103的整体厚度变小，第一坡度角β减小。
可选地，在本公开实施例提供的上述显示基板中，在弯折区b，像素界定层103的侧表面包括：第一部A，以及在第一部A靠近衬底基板101一侧的边界处交替设置的过渡部B和第二部C；其中，
在垂直于衬底基板101的方向上，第二部C的厚度大于过渡部B的厚度且小于第一部A的厚度。
在采用感光材料形成像素界定层103的过程中，可在临近第一开口K1的感光材料中设置锯齿结构，由于感光材料的流动性，会使得锯齿结构之间的间隙会被其周围的感光材料填充，最终在烘烤定型后，形成厚度较小的过渡部B，与过渡部B交替设置的第二部C(对应锯齿结构的位置)，以及位于过渡部B与第二部C远离第一开口K1的第一部A，且相较于相关技术中不设置锯齿结构的技术方案，本公开中弯折区b内像素界定层103的整体厚度变小，第一坡度角β减小。
可选地，在本公开实施例提供的上述显示基板中，为有效改善弯折区b的发黄现象，第一开口K1的坡度角α大于或等于160°且小于或等于170°，相应地，像素界定层103在弯折区b的第一坡度角β大于或等于10°且小于或等于20°，例如10°、11°、12°、13°、14°、15°、16°、17°、18°、19°、20°等。
可选地，在本公开实施例提供的上述显示基板中，如图2所示，衬底基板101还包括平坦区a，像素界定层103在平坦区a具有多个第二开口K2，子像素102在平坦区a的正投影位于第二开口K2的正投影内，由于相关技术中平坦区a内的像素界定层103本身不会遮挡子像素的出射光，因此，平坦区a内的第二开口K2可以保持与相技术中的形状相同(具体的，第二开口K2的坡度角λ大于或等于150°且小于或等于140°)，相应的像素界定层103的第二坡度角θ可以保持相关技术中的30°-40°不变；当然，平坦区a内的第二开口K2可以保持与本公开中弯折区b内第一开口K1的形状相同，即第 二开口K2的坡度角λ也大于或等于160°且小于或等于170°，相应地，像素界定层103的第二坡度角θ大于或等于10°且小于或等于20°，在此不做限定。
需要说明的是，在本公开中平坦区a内第二开口K2保持与相关技术中的形状相同的情况下，如图4所示，位于平坦区a内的像素界定层103的侧表面则为一平面，且该平面与像素界定层103靠近衬底基板101一侧表面之间的夹角(即平坦区a内的像素界定层103的第二坡度角θ)大于或等于30°且小于或等于40°(即与第二开口K的坡度角λ互补)。
一般地，在本公开实施例提供的上述显示基板中，子像素102包括阳极和阴极，以及位于阳极和阴极之间的发光功能层；其中，发光功能层包括但不限于：空穴注入层、空穴传输层、电子阻挡层、发光材料层、空穴阻挡层、电子传输层和电子注入层。
基于同一发明构思，本公开实施例还提供了一种显示基板的制作方法，由于该制作方法解决技术问题的原理与上述显示基板解决技术问题的原理相似，因此，本公开实施例提供的该制作方法的实施可以参见本公开实施例提供的上述显示基板的实施，重复之处不再赘述。
具体地，本公开实施例提供了一种显示基板的制作方法，具体可以包括以下步骤：
提供一衬底基板；
在衬底基板上形成像素界定层，该像素界定层在待弯折区具有坡度角大于预设角度的多个第一开口；
在像素界定层的多个第一开口内形成多个子像素；
弯折具有多个子像素的衬底基板，其中弯折区的曲率与第一开口的坡度角呈正相关，使得弯折区的子像素的出射光未被像素界定层遮挡。
可选地，在本公开实施例提供的上述制作方法中，形成像素界定层，具体可以通过以下方式进行实现：
在衬底基板101上形成感光材料层103’，如图5所示；
提供一第一掩膜板104，该第一掩膜板104包括第一透明衬底1041，位于第一透明衬底1041之上的第一遮光层1042；该第一遮光层1042具有多个第一透光区T1、环绕第一透光区T1的多个第二透光区T2、以及在第一透光区T1之间和第一透光区T1、第二透光区T2之间的遮光区S，如图6和图7所示；
采用第一掩膜板104，对感光材料层103’依次进行曝光、显影处理，在感光材料层103’中形成位于待弯折区的多个第一开口K1，位于平坦区a的多个第二开口K2，以及环绕第一开口K1和第二开口K2的环形槽H，如图8和图9所示；具体地，环形槽H的宽度可以为0.5μm-5μm(例如0.5μm、1μm、1.5μm、2μm、2.5μm、3μm、3.5μm、4μm、4.5μm、5μm等)，环形槽H与第一开口K1或第二开口K2之间感光材料层103’的宽度可以为0.5μm-5μm(例如0.5μm、1μm、1.5μm、2μm、2.5μm、3μm、3.5μm、4μm、4.5μm、5μm等)。
对感光材料层103’进行烘烤处理，由于感光材料层103’的流动性，在进行烘烤处理的过程中，环形槽H会被其周围的感光材料层103’填充，以致最终形成的像素界定层103上不具有环形槽H，且相比于相关技术中的常规设计，环绕第一开口K1和第二开口K2的像素界定层103的厚度减薄，坡度角减小，最终形成了在待弯折区和平坦区a内具有10°-20°的坡度角的像素界定层103，如图10和图11所示。易于理解的是，由于在烘烤处理过程中环形槽H会被其周围的感光材料层103’填充，因此环形槽H的宽度越大，最终形成像素界定层103的厚度越薄、坡度角越小。
可选地，在本公开实施例提供的上述制作方法中，形成像素界定层，具体还可以通过以下方式进行实现：
在衬底基板101上形成感光材料层103’，如图5所示；
提供一第二掩膜板105，第二掩膜板105包括第二透明衬底1051，位于第二透明衬底1051之上的第二遮光层1052；待弯折区和平坦区a对应的第二遮光层1052具有多个第一透光区T1、以及在各第一透光区T1之间的遮光区S，且待弯折区的遮光区S内还具有环绕第一透光区T1的多个第二透光区T2， 如图12和图13所示；
采用第二掩膜板105，对感光材料层103’依次进行曝光、显影处理，在感光材料层103’中形成位于待弯折区的多个第一开口K1，位于平坦区的多个第二开口K2，以及环绕第一开口K1的多个环形槽H，如图14和图9所示；
对感光材料层103’进行烘烤处理，形成在待弯折区的坡度角为10°-20°、在平坦区的坡度角为30°-40°的像素界定层103。
可选地，在本公开实施例提供的上述制作方法中，形成像素界定层，具体还可以通过以下步骤进行实现：
在衬底基板101上形成感光材料层103’，如图5所示；
提供一第三掩膜板106，第三掩膜板106包括第三遮光层1061；第三遮光层1061具有多个透光区T，以及位于各透光区T之间且边缘具有锯齿结构的遮光区S，如图15和图16所示；具体地，图15示出了锯齿结构为三角形，图16示出了锯齿结构为矩形，在具体实施时，锯齿结构还可以为其他形状，在此不做具体限定。
采用第三掩膜板106，对感光材料层103’依次进行曝光、显影处理，在感光材料层103’中形成位于待弯折区的多个第一开口K1，位于平坦区的多个第二开口K2，且多个第一开口K1和多个第二开口K2周边的感光材料层103’具有锯齿结构，如图17和图18所示；
对感光材料层103’进行烘烤处理，由于感光材料层103’的流动性，在进行烘烤处理的过程中，锯齿结构之间的间隙会被其周围的感光材料层103’填充，以致最终形成的像素界定层103上不具有锯齿结构，且相比于相关技术中的常规设计，环绕第一开口K1和第二开口K2的像素界定层103的厚度减薄、坡度角减小，具体地，形成了在待弯折区和平坦区的坡度角为10°-20°的像素界定层103。
可选地，在本公开实施例提供的上述制作方法中，形成像素界定层，具体还可以通过以下方式进行实现：
在衬底基板101上形成感光材料层103’，如图5所示；
提供一第四掩膜板107，该第四掩膜板107包括第四遮光层1071；待弯折区和平坦区对应的第四遮光层1071具有多个透光区T、以及位于各透光区T之间的遮光区S，且待弯折区对应的遮光区S的边缘具有锯齿结构，如图19和图20所示；
采用第四掩膜板107，对感光材料层103’依次进行曝光、显影处理，在感光材料层103’中形成位于待弯折区的多个第一开口K1，位于平坦区的多个第二开口K2，且多个第一开口K1周边的感光材料层103’具有锯齿结构，如图21和图22所示；
对感光材料层103’进行烘烤处理，形成在待弯折区的坡度角为10°-20°、在平坦区的坡度角为30°-40°的像素界定层103。
基于同一发明构思，本公开实施例提供了一种显示面板，如图1所示，包括本公开实施例提供的上述显示基板01。该显示面板为大角度弯折的AMOLED面板。对于该显示面板的其它必不可少的组成部分(例如像素电路、栅极驱动电路、源极驱动电路、发光控制驱动电路、封装层、保护盖板02)均为本领域的普通技术人员应该理解具有的，在此不做赘述，也不应作为对本公开的限制。另外，由于该显示面板解决问题的原理与上述显示基板解决问题的原理相似，因此，本公开实施例提供的该显示面板的实施可以参见本公开实施例提供的上述显示基板的实施，重复之处不再赘述。
基于同一发明构思，本公开实施例还提供了一种显示装置，包括本公开实施例提供的上述显示面板，该显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪、智能手表、健身腕带、个人数字助理等任何具有显示功能的产品或部件。对于显示装置的其它必不可少的组成部分(例如覆晶薄膜、驱动电路板)均为本领域的普通技术人员应该理解具有的，在此不做赘述，也不应作为对本公开的限制。另外，由于该显示装置解决问题的原理与上述显示面板解决问题的原理相似，因此，该显示装置的实施可以参见上述显示面板的实施例，重复之处不再赘述。
本公开实施例提供的上述显示基板、显示面板及显示装置，包括：衬底 基板，该衬底基板包括弯折区；多个子像素，位于衬底基板之上；像素界定层，该像素界定层在弯折区具有多个第一开口，多个子像素在弯折区的正投影位于多个第一开口的正投影内，第一开口的坡度角大于预设角度，且第一开口的坡度角与弯折区的曲率呈正相关，以使得在弯折区的子像素的出射光未被像素界定层遮挡。通过对弯折区的第一开口进行改进，使得在弯折区的子像素的出射光未被像素界定层遮挡，从而避免了子像素发出的蓝光因被像素界定层遮挡吸收转换为黄光，保证了子像素发出的蓝光、绿光、红光混合形成白光，因此有效解决了弯折区发黄的问题。
显然，本领域的技术人员可以对本公开实施例进行各种改动和变型而不脱离本公开实施例的精神和范围。这样，倘若本公开实施例的这些修改和变型属于本公开权利要求及其等同技术的范围之内，则本公开也意图包含这些改动和变型在内。

Claims (17)

  1. 一种显示基板，其中，包括：
    衬底基板，所述衬底基板包括弯折区；
    多个子像素，位于所述衬底基板之上；
    像素界定层，所述像素界定层在所述弯折区具有多个第一开口，所述子像素在所述弯折区的正投影位于所述第一开口的正投影内，所述第一开口的坡度角大于预设角度，且所述第一开口的坡度角与所述弯折区的曲率呈正相关，以使得在所述弯折区的所述子像素的出射光未被所述像素界定层遮挡。
  2. 如权利要求1所述的显示基板，其中，在所述弯折区，所述像素界定层的侧表面包括：在远离所述衬底基板的方向上，依次连续排布的第一部、过渡部和第二部；其中，
    在垂直于所述衬底基板的方向上，所述第一部的厚度大于所述过渡部的厚度且小于所述第二部的厚度。
  3. 如权利要求1所述的显示基板，其中，在所述弯折区，所述像素界定层的侧表面包括：第一部，以及在所述第一部靠近所述衬底基板一侧的边界处交替设置的所述过渡部和所述第二部；其中，
    在垂直于所述衬底基板的方向上，所述第二部的厚度大于所述过渡部的厚度且小于所述第一部的厚度。
  4. 如权利要求1所述的显示基板，其中，所述第一开口的坡度角大于或等于160°且小于或等于170°。
  5. 如权利要求1-4任一项所述的显示基板，其中，所述衬底基板还包括平坦区，所述像素界定层在所述平坦区具有多个第二开口，所述子像素在所述平坦区的正投影位于所述第二开口的正投影内，所述第二开口与所述第一开口的形状相同。
  6. 如权利要求1-4任一项所述的显示基板，其中，所述衬底基板还包括平坦区，所述像素界定层在所述平坦区具有多个第二开口，所述子像素在所 述平坦区的正投影位于所述第二开口的正投影内，所述第二开口的坡度角小于所述第一开口的坡度角。
  7. 如权利要求6所述的显示基板，其中，所述第二开口的坡度角大于或等于140°且小于或等于150°。
  8. 如权利要求6所述的显示基板，其中，在所述平坦区，所述像素界定层的侧表面为一平面，且所述平面与所述像素界定层靠近所述衬底基板一侧表面之间的夹角大于或等于30°且小于或等于40°。
  9. 一种显示基板的制作方法，其中，包括：
    提供一衬底基板；
    在所述衬底基板上形成像素界定层，所述像素界定层在待弯折区具有坡度角大于预设角度的多个第一开口；
    在所述像素界定层的所述多个第一开口内形成多个子像素；
    弯折具有所述多个子像素的所述衬底基板，其中弯折区的曲率与所述第一开口的坡度角呈正相关，使得所述弯折区的所述子像素的出射光未被所述像素界定层遮挡。
  10. 如权利要求9所述的制作方法，其中，形成像素界定层，具体包括：
    在所述衬底基板上形成感光材料层；
    提供一第一掩膜板，所述第一掩膜板包括第一透明衬底，位于所述第一透明衬底之上的第一遮光层；所述第一遮光层具有多个第一透光区、环绕所述第一透光区的多个第二透光区、以及在所述第一透光区之间和所述第一透光区、所述第二透光区之间的遮光区；
    采用第一掩膜板，对所述感光材料层依次进行曝光、显影处理，在所述感光材料层中形成位于待弯折区的多个第一开口，位于平坦区的多个第二开口，以及环绕所述第一开口和所述第二开口的多个环形槽；
    对所述感光材料层进行烘烤处理，形成在所述待弯折区和所述平坦区具有10°-20°的坡度角的像素界定层。
  11. 如权利要求9所述的制作方法，其中，形成像素界定层，具体包括：
    在所述衬底基板上形成感光材料层；
    提供一第二掩膜板，所述第二掩膜板包括第二透明衬底，位于所述第二透明衬底之上的第二遮光层；待弯折区和平坦区对应的所述第二遮光层具有多个第一透光区、以及位于各所述第一透光区之间的遮光区，且在所述待弯折区的所述遮光区内还具有环绕所述第一透光区的多个第二透光区；
    采用所述第二掩膜板，对所述感光材料层依次进行曝光、显影处理，在所述感光材料层中形成位于所述待弯折区的多个第一开口，位于所述平坦区的多个第二开口，以及环绕所述第一开口的环形槽；
    对所述感光材料层进行烘烤处理，形成在所述待弯折区的坡度角为10°-20°、在所述平坦区的坡度角为30°-40°的像素界定层。
  12. 如权利要求10或11所述的制作方法，其中，所述环形槽的宽度为0.5μm-5μm。
  13. 如权利要求12所述的制作方法，其中，所述环形槽与所述第一开口或所述第二开口之间的所述感光材料层的宽度为0.5μm-5μm。
  14. 如权利要求9所述的制作方法，其中，形成像素界定层，具体包括：
    在所述衬底基板上形成感光材料层；
    提供一第三掩膜板，所述第三掩膜板包括第三遮光层；所述第三遮光层具有多个透光区，以及位于各所述透光区之间且边缘具有锯齿结构的遮光区；
    采用所述第三掩膜板，对所述感光材料层依次进行曝光、显影处理，在所述感光材料层中形成位于待弯折区的多个第一开口，位于平坦区的多个第二开口，且所述多个第一开口和所述多个第二开口周边的所述感光材料层具有所述锯齿结构；
    对所述感光材料层进行烘烤处理，形成在待所述弯折区和所述平坦区具有10°-20°的坡度角的像素界定层。
  15. 如权利要求9所述的制作方法，其中，形成像素界定层，具体包括：
    在所述衬底基板上形成感光材料层；
    提供一第四掩膜板，所述第四掩膜板包括第四遮光层；待弯折区和平坦 区对应的所述第二遮光层具有多个透光区、以及位于各所述透光区之间的遮光区，且所述待弯折区对应的所述遮光区的边缘具有锯齿结构；
    采用所述第四掩膜板，对所述感光材料层依次进行曝光、显影处理，在所述感光材料层中形成位于所述待弯折区的多个第一开口，位于所述平坦区的多个第二开口，且所述多个第一开口周边的所述感光材料层具有所述锯齿结构；
    对所述感光材料层进行烘烤处理，形成在所述待弯折区的坡度角为10°-20°、在所述平坦区的坡度角为30°-40°的像素界定层。
  16. 一种显示面板，其中，包括如权利要求1-8任一项所述的显示基板。
  17. 一种显示装置，其中，包括如权利要求16所述的显示面板。
PCT/CN2021/098824 2020-07-27 2021-06-08 显示基板、显示面板及显示装置 WO2022022072A1 (zh)

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