WO2022004737A1 - 反射防止膜付透明基体 - Google Patents

反射防止膜付透明基体 Download PDF

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Publication number
WO2022004737A1
WO2022004737A1 PCT/JP2021/024605 JP2021024605W WO2022004737A1 WO 2022004737 A1 WO2022004737 A1 WO 2022004737A1 JP 2021024605 W JP2021024605 W JP 2021024605W WO 2022004737 A1 WO2022004737 A1 WO 2022004737A1
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WO
WIPO (PCT)
Prior art keywords
transparent substrate
antireflection film
layer
multilayer film
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2021/024605
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English (en)
French (fr)
Japanese (ja)
Inventor
克巳 鈴木
和矢 竹本
保 森本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to CN202180046554.3A priority Critical patent/CN115734951B/zh
Priority to JP2022534050A priority patent/JP7729340B2/ja
Priority to KR1020227045585A priority patent/KR20230034225A/ko
Priority to EP21833619.6A priority patent/EP4177227A4/en
Publication of WO2022004737A1 publication Critical patent/WO2022004737A1/ja
Priority to US18/147,414 priority patent/US12607777B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/06—Coating with compositions not containing macromolecular substances
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/202—LCD, i.e. liquid crystal displays
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/76—Hydrophobic and oleophobic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2301/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2301/08—Cellulose derivatives
    • C08J2301/10—Esters of organic acids
    • C08J2301/12—Cellulose acetate
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F21/00—Mobile visual advertising
    • G09F21/04—Mobile visual advertising by land vehicles
    • G09F21/049—Mobile visual advertising by land vehicles giving information to passengers inside the vehicles
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements

Definitions

  • the present invention relates to a transparent substrate with an antireflection film.
  • one issue is the reflection caused by the cover glass reflecting external light.
  • a multilayer film having a laminated structure is often installed on the surface of the cover glass.
  • the boundary line between the black frame portion of the image display device and the image display portion stands out, and the aesthetic appearance is inferior.
  • an antireflection film which is a multilayer film in which at least two or more dielectric layers having different refractive indexes are laminated.
  • Patent Document 1 discloses a transparent substrate with an antireflection film which has a light absorption ability and is an insulating property.
  • Patent Document 2 discloses a transparent conductive laminate in which a silicon oxide layer and a copper layer are laminated in this order.
  • Patent Document 3 discloses an antireflection film having a coating film made of a high refractive index material and a coating film made of a low refractive index material on the surface of a glass plate, and a coating film made of a low refractive index material arranged on the resurface surface. There is.
  • an object of the present invention is to provide a transparent substrate with an antireflection film, which has a light absorbing ability and suppresses a change in the transmittance of the antireflection film due to the intrusion of moisture from the outside.
  • the present inventors have provided a multilayer film in which at least two or more layers having different refractive indexes are laminated on at least one main surface of a transparent substrate having two main surfaces, and at least one of the layers of the multilayer film is provided.
  • the silicon oxide layer can solve the above problems by using a transparent substrate with an antireflection film having a moisture permeability of 300 g / m 2 / day or less, and completed the present invention.
  • the multilayer film has a structure in which at least two or more layers having different refractive indices are laminated, and at least one of the layers of the multilayer film is mainly.
  • Si oxides, and at least one of the layers of the multilayer film is composed of at least one oxide mainly selected from the group A consisting of Mo and W, and Si, Nb, Ti. , Zr, Ta, Al, Sn and In, which is composed of a mixed oxide of at least one oxide selected from the group B, and the elements of the group A contained in the mixed oxide and the mixed oxide. It is preferable that the content of the elements of the group B contained in the mixed oxide is less than 80% by mass with respect to the total of the elements of the group B contained.
  • At least one silicon oxide layer among the layers of the multilayer film has an arithmetic mean height (Sa) representing surface roughness in a measurement range of 1 ⁇ m ⁇ 1 ⁇ m. It is preferably 1.00 nm or less.
  • At least one silicon oxide layer among the layers of the multilayer film has an arithmetic mean height (Sa) representing surface roughness in a measurement range of 5 ⁇ m ⁇ 5 ⁇ m. It is preferably 0.90 nm or less.
  • the hardness of at least one silicon oxide layer among the layers of the multilayer film is preferably 5.0 GPa or more.
  • the elastic modulus of at least one silicon oxide layer among the layers of the multilayer film is preferably 70 GPa or more.
  • the transparent substrate with an antireflection film according to one aspect of the present invention further has an antifouling film on the antireflection film.
  • the transparent substrate with an antireflection film it is preferable that the transparent substrate is a glass substrate.
  • the transparent substrate with an antireflection film it is preferable that the transparent substrate is a resin substrate.
  • the transparent substrate with an antireflection film is a laminate composed of a glass and a resin substrate.
  • the glass is chemically strengthened in the transparent substrate with an antireflection film according to one aspect of the present invention.
  • the main surface of the transparent substrate on the side having the antireflection film is antiglare-treated.
  • the image display device is provided with the transparent substrate with an antireflection film.
  • a transparent substrate with an antireflection film which has a light absorbing ability and suppresses a change in the transmittance of the antireflection film due to the intrusion of moisture from the outside.
  • FIG. 1 is a cross-sectional view schematically showing a configuration example of a transparent substrate with an antireflection film.
  • the transparent substrate with an antireflection film includes a multilayer film in which at least two or more layers having different refractive indexes are laminated on at least one main surface of the transparent substrate having two main surfaces.
  • the silicon oxide layer which is at least one of the layers of the multilayer film, has a moisture permeability of 300 g / m 2 / day or less.
  • the transparent substrate according to the present embodiment is not particularly limited as long as it is a transparent substrate having excellent translucency, and examples thereof include glass and resin.
  • the multilayer film in the transparent substrate with antireflection film (transparent substrate with multilayer film) preferably has the following configuration.
  • FIG. 1 is a cross-sectional view schematically showing a configuration example of a transparent substrate with a multilayer film.
  • the multilayer film 30 is formed on the transparent substrate 10.
  • the multilayer film 30 shown in FIG. 1 has a laminated structure in which two dielectric layers 32 and 34 having different refractive indexes are laminated. By laminating the dielectric layers 32 and 34 having different refractive indexes from each other, the reflection of light is suppressed.
  • the dielectric layer 32 is a high refractive index layer
  • the dielectric layer 34 is a low refractive index layer.
  • the dielectric layer 32 is composed of at least one selected from the group A composed of Mo and W and the group B composed of Si, Nb, Ti, Zr, Ta, Al, Sn and In. It is preferably composed of a mixed oxide with at least one selected.
  • the mixed oxide is the content of the elements of group B contained in the mixed oxide with respect to the total of the elements of group A contained in the mixed oxide and the elements of group B contained in the mixed oxide. (Hereinafter referred to as group B content) is preferably less than 80% by mass.
  • the dielectric layer 34 is preferably made of SiO x.
  • the dielectric layer 32 is composed of at least one oxide selected from the group A composed of Mo and W and at least one selected from the group B composed of Si, Nb, Ti, Zr, Ta, Al, Sn and In. It is preferably composed of a mixed oxide with two oxides. Among these, Mo is preferable as the A group, and Nb is preferable as the B group.
  • the conventional oxygen-deficient silicon oxide layer 34 and the dielectric layer 32 By using Mo and Nb for the oxygen-deficient silicon oxide layer 34 and the dielectric layer 32, the conventional oxygen-deficient silicon oxide layer is yellowish in visible light, but Mo and Nb. It is more preferable that the silicon oxide layer does not become yellowish even if oxygen is deficient.
  • the refractive index of the dielectric layer 32 at a wavelength of 550 nm is preferably 1.8 to 2.3 from the viewpoint of the transmittance with the transparent substrate.
  • the extinction coefficient of the dielectric layer 32 is preferably 0.005 to 3, more preferably 0.01 to 1, and even more preferably 0.04 to 0.38.
  • the extinction coefficient is 0.005 or more, the desired absorption rate can be realized with an appropriate number of layers. Further, when the extinction coefficient is 3 or less, it is relatively easy to achieve both the reflected color and the transmittance.
  • the multilayer film 30 shown in FIG. 1 has a laminated structure in which two dielectric layers 32 and 34 are laminated, but the multilayer film in the present embodiment is not limited to this, and three layers having different refractive indexes from each other are formed. It may have a laminated structure in which the above is laminated. In this case, the refractive indexes of all layers do not have to be different.
  • a three-layer laminated structure of a low refractive index layer, a high refractive index layer, and a low refractive index layer, or a three-layer laminated structure of a high refractive index layer, a low refractive index layer, and a high refractive index layer.
  • two low refractive index layers may exist, and in the latter case, two high refractive index layers may have the same refractive index.
  • a four-layer laminated structure of a low refractive index layer, a high refractive index layer, a low refractive index layer, and a high refractive index layer, or a high refractive index layer, a low refractive index layer, a high refractive index layer, and a low refractive index layer. It can be a four-layer laminated structure of the index layer.
  • the low refractive index layer and the high refractive index layer, each of which has two layers, may have the same refractive index.
  • the high refractive index layer referred to here is, for example, a layer having a refractive index of 1.8 or more at a wavelength of 550 nm
  • a low refractive index layer is a layer having a refractive index of 1.6 or less at a wavelength of 550 nm. Is.
  • a halftone mask used in the field of semiconductor manufacturing As a light transmitting film having a light absorbing ability and having an insulating property, a halftone mask used in the field of semiconductor manufacturing is known. As the halftone mask, an oxygen-deficient film such as a Mo-SiO x film containing a small amount of Mo is used. Further, as a light transmitting film having a light absorbing ability and insulating property, there is a narrow bandgap film used in the field of semiconductor manufacturing.
  • the dielectric layer 32 having an increased Mo content and the dielectric layer 34 composed of SiO x it has a light absorbing ability, is insulating, and has adhesiveness. And a transparent substrate with an antireflection film having excellent strength can be obtained.
  • the transparent substrate with an antireflection film shown in FIG. 1 satisfies the characteristics of the transparent substrate with an antireflection film according to the present embodiment described above because the multilayer film 30 has the above-mentioned configuration.
  • the B group content in the oxide layer (ABO) 32 is less than 80% by mass, it is possible to suppress the b * value from becoming more than 5.
  • the B group content is more preferably 70% by mass or less, and further preferably 60% by mass or less.
  • a layer other than the layer (ABO) and the layer (SiO x ) may be included.
  • the outermost layer is preferably a layer (SiO x ). This is because if the outermost layer is a layer (SiO x ), it can be relatively easily produced in order to obtain low reflectivity. Further, when forming the antifouling film, it is preferable to form the antifouling film on the layer (SiO x ) from the viewpoint of the bondability related to the durability of the antifouling film.
  • the layer (ABO) 32 is preferably amorphous. If it is amorphous, it can be produced at a relatively low temperature, and when the transparent substrate is a resin, the resin is not damaged by heat and can be suitably applied.
  • At least one silicon oxide layer among the layers of the multilayer film has a moisture permeability of 300 g / m 2 / day or less.
  • the moisture permeability is within the above range, the intrusion of moisture from the outside can be suppressed, so that the change in the transmittance of the antireflection film due to the intrusion of moisture can be suppressed.
  • Moisture permeability of multilayer film transparent substrate according to the present embodiment is preferably 0.1 ⁇ 300g / m 2 / day , more preferably 0.1 ⁇ 100g / m 2 / day .
  • At least one silicon oxide layer among the layers of the multilayer film has a surface roughness (arithmetic mean height (Sa)) in a measurement range of 1 ⁇ m ⁇ 1 ⁇ m. It is preferably 00 nm or less.
  • the surface roughness (arithmetic mean height (Sa)) is within the above range, the silicon oxide layer becomes dense and the invasion of water from the outside can be suppressed. Can be suppressed.
  • the surface roughness (arithmetic mean height (Sa)) in the measurement range of 1 ⁇ m ⁇ 1 ⁇ m can be measured with a scanning probe microscope, for example, in accordance with the provisions of the international standard ISO 25178, as described in Examples described later.
  • the surface roughness (arithmetic mean height (Sa)) of the silicon oxide layer of the transparent substrate with a multilayer film according to the present embodiment in a measurement range of 1 ⁇ m ⁇ 1 ⁇ m is preferably 0.05 to 0.99 nm, preferably 0.05 to 0.99. 0.98 nm is more preferable.
  • At least one silicon oxide layer among the layers of the multilayer film has a surface roughness (arithmetic mean height (Sa)) of 0. It is preferably 90 nm or less.
  • the surface roughness (arithmetic mean height (Sa)) is within the above range, the silicon oxide layer becomes dense and the invasion of water from the outside can be suppressed. Can be suppressed.
  • the surface roughness (arithmetic mean height (Sa)) in the measurement range of 5 ⁇ m ⁇ 5 ⁇ m can be measured with a scanning probe microscope, for example, in accordance with the provisions of the international standard ISO 25178, as described in Examples described later.
  • the surface roughness (arithmetic mean height (Sa)) of the silicon oxide layer of the transparent substrate with a multilayer film according to the present embodiment in a measurement range of 5 ⁇ m ⁇ 5 ⁇ m is preferably 0.05 to 0.90 nm, preferably 0.05 to 0.90 nm. 0.87 nm is more preferable.
  • At least one silicon oxide layer among the layers of the multilayer film has a hardness of 5.0 GPa or more when measured by applying a load of 0.1 mN. ..
  • the silicon oxide layer becomes dense and the invasion of water from the outside can be suppressed, so that the change in the transmittance of the antireflection film due to the invasion of water can be suppressed.
  • the hardness of the silicon oxide layer can be measured by, for example, a surface tension measuring device (nano indenter) as described in Examples described later.
  • the hardness when measured by applying a load of 0.1 mN to the silicon oxide layer of the transparent substrate with a multilayer film according to the present embodiment is preferably 5.0 to 20.0 GPa, more preferably 5.2 to 15.0 GPa. ..
  • the transparent substrate with a multilayer film it is preferable that at least one silicon oxide layer among the layers of the multilayer film has a hardness of 6.6 GPa or more when measured by applying a load of 1 mN.
  • the hardness is within the above range, the silicon oxide layer becomes dense and the invasion of water from the outside can be suppressed, so that the change in the transmittance of the antireflection film due to the invasion of water can be suppressed.
  • the hardness of the silicon oxide layer can be measured by, for example, a surface tension measuring device (nano indenter) as described in Examples described later.
  • the hardness when measured by applying a load of 1 mN to the silicon oxide layer of the transparent substrate with a multilayer film according to the present embodiment is preferably 6.6 to 20.0 GPa, more preferably 6.7 to 15.0 GPa.
  • At least one silicon oxide layer among the layers of the multilayer film has an elastic modulus of 70 GPa or more when measured by applying a load of 0.1 mN.
  • the elastic modulus is within the above range, the silicon oxide layer becomes dense and the invasion of water from the outside can be suppressed, so that the change in the transmittance of the antireflection film due to the invasion of water can be suppressed.
  • the elastic modulus of the silicon oxide layer can be measured by, for example, a surface tension measuring device (nano indenter) as described in Examples described later.
  • the elastic modulus of the transparent substrate with a multilayer film according to the present embodiment when a load of 0.1 mN is applied to the silicon oxide layer and measured is preferably 70 to 200 GPa, more preferably 72 to 150 GPa.
  • At least one silicon oxide layer among the layers of the multilayer film has an elastic modulus of 81 GPa or more when measured by applying a load of 1 mN.
  • the elastic modulus is within the above range, the silicon oxide layer becomes dense and the invasion of water from the outside can be suppressed, so that the change in the transmittance of the antireflection film due to the invasion of water can be suppressed.
  • the elastic modulus of the silicon oxide layer can be measured by, for example, a surface tension measuring device (nano indenter) as described in Examples described later.
  • the elastic modulus of the transparent substrate with a multilayer film according to the present embodiment when a load of 1 mN is applied to the silicon oxide layer and measured is preferably 81 to 200 GPa, more preferably 81 to 150 GPa.
  • the transparent substrate is preferably made of a material having a refractive index of 1.4 or more and 1.7 or less. This is because when a display, a touch panel, or the like is optically bonded, reflection on the bonded surface can be sufficiently suppressed.
  • the transparent substrate a glass substrate or a resin substrate is preferable.
  • the transparent substrate may be a laminate composed of a glass and a resin substrate.
  • the glass substrate glass having various compositions can be used.
  • the glass used in the present embodiment preferably contains sodium, and preferably has a composition that can be strengthened by molding or chemical strengthening treatment. Specific examples thereof include aluminosilicate glass, soda-lime glass, borosilicate glass, lead glass, alkaline barium glass, and aluminhosilicate glass.
  • the thickness of the glass substrate is not particularly limited, but in order to effectively perform the chemical strengthening treatment, it is usually preferably 5 mm or less, and more preferably 3 mm or less.
  • the glass substrate is preferably chemically strengthened glass that has been chemically strengthened in order to increase the strength of the cover glass.
  • the chemical strengthening is performed after the antiglare treatment and before the multilayer film is formed.
  • the main surface of the glass substrate on the side having the multilayer film is antiglare-treated.
  • the antiglare treatment method is not particularly limited, and a method of surface-treating the main surface of the glass to form desired unevenness can be used.
  • a method of chemically treating the main surface of the glass substrate for example, a method of applying a frost treatment can be mentioned.
  • a glass substrate to be treated can be immersed in a mixed solution of hydrogen fluoride and ammonium fluoride, and the immersed surface can be chemically surface-treated.
  • so-called sandblasting treatment in which crystalline silicon dioxide powder, silicon carbide powder, or the like is sprayed onto the surface of a glass substrate with pressurized air, crystalline silicon dioxide powder, silicon carbide, etc.
  • a method by physical treatment such as polishing a brush to which powder or the like is attached with a damp cloth can also be used.
  • a resin film is preferable as the resin substrate.
  • a thermoplastic resin or a thermosetting resin can be used.
  • polyvinyl chloride resin polyethylene resin, polypropylene resin, polystyrene resin, polyvinyl acetate resin, polyester resin, polyurethane resin, cellulose resin, acrylic resin, AS (acrylonitrile-styrene) resin, ABS (acrylonitrile-butadiene-styrene).
  • cellulosic resin is preferable, and triacetyl cellulose resin, polycarbonate resin, and polyethylene terephthalate resin are more preferable. These resins may be used alone or in combination of two or more.
  • the thickness of the film is not particularly limited, but is preferably 20 to 150 ⁇ m, more preferably 40 to 80 ⁇ m.
  • a hard coat layer (not shown) or an antiglare layer (not shown) is provided on the transparent substrate 10, and a multilayer film 30 is provided on the hard coat layer (not shown). good.
  • the anti-glare layer may be arranged on the hard coat layer, and the multilayer film 30 may be provided on the anti-glare layer.
  • the hard coat layer a layer in which a polymer resin is dissolved can be applied.
  • the anti-glare layer increases haze by forming an uneven shape on one side of the film and imparts antiglare properties.
  • a material in which a polymer resin is dissolved can be applied in the same manner as the hard coat layer.
  • the anti-glare layer composition constituting the anti-glare layer comprises at least a particulate substance having antiglare property by itself dispersed in a solution in which a polymer resin as a binder is dissolved.
  • antiglare particle-like substance examples include inorganic fine particles such as silica, clay, talc, calcium carbonate, calcium sulfate, barium sulfate, aluminum silicate, titanium oxide, synthetic zeolite, alumina, and smectite, as well as styrene resin.
  • inorganic fine particles such as silica, clay, talc, calcium carbonate, calcium sulfate, barium sulfate, aluminum silicate, titanium oxide, synthetic zeolite, alumina, and smectite, as well as styrene resin.
  • organic fine particles made of urethane resin, benzoguanamine resin, silicone resin, acrylic resin and the like.
  • the polymer resin as the binder of the hard coat layer and the antiglare layer includes polyester resin, acrylic resin, acrylic urethane resin, polyester acrylate resin, polyurethane acrylate resin, epoxy acrylate resin, and urethane resin.
  • a polymer resin made of a resin can be used.
  • the above-mentioned multilayer film can be formed on the main surface of the transparent substrate by using a known film forming method such as a sputtering method, a vacuum vapor deposition method or a coating method. That is, the dielectric layer or the layer constituting the multilayer film is formed on the main surface of the transparent substrate by using a known film forming method such as a sputtering method, a vacuum vapor deposition method or a coating method, depending on the stacking order.
  • a known film forming method such as a sputtering method, a vacuum vapor deposition method or a coating method.
  • Examples of the sputtering method include magnetron sputtering, pulse sputtering, AC sputtering, digital sputtering and the like.
  • a magnet is placed on the back surface of a dielectric material as a base to generate a magnetic field, and gas ion atoms collide with the surface of the dielectric material and are knocked out to a thickness of several nm.
  • This is a method for forming a sputter film.
  • a continuous film of a dielectric material which is an oxide or a nitride of a dielectric material, can be formed.
  • the digital sputtering method first forms an ultrathin metal film by sputtering, and then oxidizes it by irradiating it with oxygen plasma, oxygen ions, or oxygen radicals in the same chamber.
  • This is a method of repeatedly forming a thin film of a metal oxide.
  • the film-forming molecule is a metal when it is formed on the substrate, it is presumed that it has ductility as compared with the case where the film is formed with a metal oxide. Therefore, it is considered that the rearrangement of the film-forming molecules is likely to occur even with the same energy, and as a result, a dense and smooth film is formed.
  • the material of the antireflection film is not particularly limited, and various materials can be used as long as they can suppress the reflection of light.
  • the antireflection film may be configured by laminating a high refractive index layer and a low refractive index layer.
  • the high refractive index layer referred to here is a layer having a refractive index of 1.8 or more at a wavelength of 550 nm
  • a low refractive index layer is a layer having a refractive index of 1.6 or less at a wavelength of 550 nm.
  • the antireflection film may be provided on at least one main surface of the transparent substrate, but if necessary, it may be provided on both main surfaces of the transparent substrate. May be good.
  • the transparent substrate with a multilayer film of the present embodiment may further have an antifouling film (also referred to as "Anti Fingerprint (AFP) film”) on the multilayer film from the viewpoint of protecting the outermost surface of the film.
  • AFP Anti Fingerprint
  • the antifouling film can be composed of, for example, a fluorine-containing organosilicon compound.
  • the fluorine-containing organosilicon compound can be used without particular limitation as long as it can impart antifouling property, water repellency, and oil repellency.
  • the fluorine-containing organosilicon compound include a fluorine-containing organosilicon compound having one or more groups selected from the group consisting of a polyfluoropolyether group, a polyfluoroalkylene group and a polyfluoroalkyl group.
  • the polyfluoropolyether group is a divalent group having a structure in which a polyfluoroalkylene group and an ethereal oxygen atom are alternately bonded.
  • a fluorine-containing organic silicon compound having one or more groups selected from the group consisting of a commercially available polyfluoropolyether group, polyfluoroalkylene group and polyfluoroalkyl group KP-801 (trade name, Shin-Etsu Chemical Co., Ltd.) KY178 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), KY-130 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.), KY-185 (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.) Optool (registered trademark) DSX and Optool AES (manufactured by Shin-Etsu Chemical Co., Ltd.) In either case, the product name (manufactured by Daikin Co., Ltd.) can be preferably used.
  • the antifouling film will be laminated on the antireflection film.
  • the antifouling film can be formed on both antireflection films, but the antifouling film is formed only on one of the surfaces. It may be configured to be laminated. This is because the antifouling film may be provided in a place where human hands or the like may come into contact with the film, and can be selected according to the intended use.
  • the transparent substrate with a multilayer film of the present embodiment is suitable as a cover glass of an image display device, particularly as a cover glass of an image display device mounted on a vehicle such as an image display device of a navigation system mounted on a vehicle or the like. be.
  • Examples 1 and 2 are Examples, and Examples 3 and 4 are Comparative Examples.
  • Example 3 An antireflection film was formed on one main surface of the transparent substrate by the following method to prepare a transparent substrate with an antireflection film.
  • TAC film A triacetyl cellulose resin film (hereinafter referred to as TAC film) having a thickness of 40 ⁇ m was used as the transparent substrate.
  • niobium and molybdenum are mixed as a dielectric layer (1) (metal oxide layer) on one main surface of the transparent substrate by a digital sputtering method at a weight ratio of 60:40 by the following method.
  • a sintered target an oxide film is formed by repeating the formation of a metal film with a fine film thickness with argon gas and the immediate oxidation with oxygen gas at high speed while keeping the pressure at 0.2 Pa.
  • a 10 nm Mo—Nb—O layer was formed on the main surface of the transparent substrate to which the diffusion layer was bonded.
  • a silicon film is formed with argon gas and immediately oxidized with oxygen gas while keeping the pressure at 0.3 Pa.
  • a silicon oxide film was formed, and a layer made of silicon oxide [silica (SiO x )] having a thickness of 40 nm was formed on the Mo—Nb—O layer.
  • the oxygen flow rate when oxidizing with oxygen gas was 500 sccm, and the input power of the oxidation source was 200 W.
  • the pressure is reduced to 0.
  • a metal film with a small film thickness is formed with argon gas, and immediately after that, oxidation with oxygen gas is repeated at high speed to form an oxide film, which is layered on a silicon oxide layer and has a thickness of 120 nm.
  • An Nb—O layer was formed.
  • a silicon target was used as the dielectric layer (4) (silicon oxide layer) by a digital sputtering method, and while the pressure was maintained at 0.3 Pa, a silicon film was formed with argon gas and immediately immediately oxidized with oxygen gas.
  • a silicon oxide film was formed by repeating the process at high speed, and a layer made of silicon oxide [silica (SiO x )] having a thickness of 100 nm was formed by superimposing the Mo—Nb—O layer on the Mo—Nb—O layer.
  • the oxygen flow rate when oxidizing with oxygen gas was 500 sccm, and the input power of the oxidation source was 200 W.
  • the transparent substrate before being put into the 95 ° C. reliability test tank and 500 hours after being put into the transmittance meter was used as a spectrophotometer (manufactured by Shimadzu Corporation, trade name: The spectral transmittance was measured by SolidSpec-3700), and the visual transmittance (stimulation value Y specified in JIS Z 8701: 1999) was obtained by calculation. The visual transmittance before injection and after 500 hours had passed. The amount of change in the visual transmittance was obtained from the visual transmittance.
  • Example 3 As a result, the amount of change in the visual transmittance of Example 3 was 5%.
  • Example 1 A transparent substrate with an antireflection film was produced in the same manner as in Example 3 except that the pressure for forming the silicon oxide layer of the dielectric layer (2) and the dielectric layer (4) was changed to 0.1 Pa. The amount of change in the visual transmittance of Example 1 was 2%.
  • Example 2 When the silicon oxide layers of the dielectric layer (2) and the dielectric layer (4) were formed, a linear ion source (manufactured by ULVAC) was used to emit high-energy argon ions to the film forming surface at an input voltage of 2 kV. Made a transparent substrate with an antireflection film in the same manner as in Example 1. The amount of change in the visual transmittance of Example 2 was 1.5%.
  • Example 4 No antireflection film was formed on one main surface of the transparent substrate of Example 3.
  • a silicon oxide layer having a thickness of 100 nm formed on a chemically strengthened glass substrate (Dragontrail: registered trademark, manufactured by AGC) having a length of 100 mm, a width of 100 mm, and a thickness of 1.1 mm under the film forming conditions of Examples 1, 2 and 3.
  • the results of the following evaluations are shown in Table 1 below.
  • the silicon oxide layers of Examples 1 and 2 had a moisture permeability of 300 g / m 2 / day or less, and the amount of change in the visual transmittance was suppressed as compared with Example 3.
  • the transparent substrate with the antireflection film of Examples 1 and 2 in which the surface roughness (arithmetic mean height (Sa)) of the silicon oxide layer in the measurement range of 1 ⁇ m ⁇ 1 ⁇ m is 1.00 nm or less is silicon oxide. Since the layer became dense and the invasion of water from the outside could be suppressed, the amount of change in the visual transmittance was suppressed as compared with Example 3.

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4215957A1 (en) * 2022-01-19 2023-07-26 Agc Inc. Anti-reflective film-attached transparent substrate and image display device
JP2023105806A (ja) * 2022-01-19 2023-07-31 Ａｇｃ株式会社 反射防止膜付透明基体および画像表示装置
WO2023162999A1 (ja) * 2022-02-28 2023-08-31 Ａｇｃ株式会社 自発光型表示装置

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008201633A (ja) 2007-02-21 2008-09-04 Asahi Glass Co Ltd 反射防止膜付きガラス板および窓用合わせガラス
JP2010243163A (ja) * 2009-04-01 2010-10-28 Seiko Epson Corp 透光性部材、時計、および透光性部材の製造方法
JP2012073542A (ja) * 2010-09-29 2012-04-12 Fujifilm Corp 反射防止膜及びその製造方法、光学部材、並びにプラスチックレンズ
JP2016068470A (ja) 2014-09-30 2016-05-09 株式会社カネカ 透明導電積層体および静電容量方式タッチパネル
JP2018115105A (ja) 2017-01-16 2018-07-26 旭硝子株式会社 反射防止膜付透明基体
JP2019066515A (ja) * 2017-09-28 2019-04-25 日東電工株式会社 反射防止フィルムおよびその製造方法、ならびに反射防止層付き偏光板
JP2019152863A (ja) * 2018-02-28 2019-09-12 日東電工株式会社 動力走行車両用の偏光フィルム積層体、及び、該偏光フィルム積層体が使用される光学表示パネル
JP2020006651A (ja) * 2018-07-12 2020-01-16 Ａｇｃ株式会社 ガラス積層体、ディスプレイ用前面板、表示装置およびガラス積層体の製造方法
JP2020115919A (ja) 2019-01-18 2020-08-06 サミー株式会社 ぱちんこ遊技機

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004004176A (ja) * 2002-05-30 2004-01-08 Nitto Denko Corp 反射防止樹脂シート、画像表示装置用基板、画像表示装置
JP2004299985A (ja) * 2003-03-31 2004-10-28 Sumitomo Heavy Ind Ltd 成膜方法およびフラットディスプレイパネル
JP5440005B2 (ja) 2009-07-24 2014-03-12 凸版印刷株式会社 ガスバリア積層体
US10543662B2 (en) 2012-02-08 2020-01-28 Corning Incorporated Device modified substrate article and methods for making
US9725357B2 (en) 2012-10-12 2017-08-08 Corning Incorporated Glass articles having films with moderate adhesion and retained strength
TWI615367B (zh) 2012-10-12 2018-02-21 康寧公司 具有保留強度之物品
EP2932496A4 (en) 2012-12-13 2016-11-02 Corning Inc GLASS AND METHOD FOR PRODUCING GLASS ARTICLES
TWI617437B (zh) 2012-12-13 2018-03-11 康寧公司 促進控制薄片與載體間接合之處理
JP6116337B2 (ja) * 2013-04-24 2017-04-19 株式会社大真空 光学デバイス
CN106457758B (zh) 2014-04-09 2018-11-16 康宁股份有限公司 装置改性的基材制品及其制备方法
US11021392B2 (en) 2017-01-16 2021-06-01 AGC Inc. Transparent substrate with multilayer antireflective film containing an oxide of molybdenum

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008201633A (ja) 2007-02-21 2008-09-04 Asahi Glass Co Ltd 反射防止膜付きガラス板および窓用合わせガラス
JP2010243163A (ja) * 2009-04-01 2010-10-28 Seiko Epson Corp 透光性部材、時計、および透光性部材の製造方法
JP2012073542A (ja) * 2010-09-29 2012-04-12 Fujifilm Corp 反射防止膜及びその製造方法、光学部材、並びにプラスチックレンズ
JP2016068470A (ja) 2014-09-30 2016-05-09 株式会社カネカ 透明導電積層体および静電容量方式タッチパネル
JP2018115105A (ja) 2017-01-16 2018-07-26 旭硝子株式会社 反射防止膜付透明基体
JP2019066515A (ja) * 2017-09-28 2019-04-25 日東電工株式会社 反射防止フィルムおよびその製造方法、ならびに反射防止層付き偏光板
JP2019152863A (ja) * 2018-02-28 2019-09-12 日東電工株式会社 動力走行車両用の偏光フィルム積層体、及び、該偏光フィルム積層体が使用される光学表示パネル
JP2020006651A (ja) * 2018-07-12 2020-01-16 Ａｇｃ株式会社 ガラス積層体、ディスプレイ用前面板、表示装置およびガラス積層体の製造方法
JP2020115919A (ja) 2019-01-18 2020-08-06 サミー株式会社 ぱちんこ遊技機

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP4177227A4

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4215957A1 (en) * 2022-01-19 2023-07-26 Agc Inc. Anti-reflective film-attached transparent substrate and image display device
JP2023105806A (ja) * 2022-01-19 2023-07-31 Ａｇｃ株式会社 反射防止膜付透明基体および画像表示装置
US12601942B2 (en) 2022-01-19 2026-04-14 AGC Inc. Anti-reflective film-attached transparent substrate and image display device
WO2023162999A1 (ja) * 2022-02-28 2023-08-31 Ａｇｃ株式会社 自発光型表示装置
JP2023125926A (ja) * 2022-02-28 2023-09-07 Ａｇｃ株式会社 自発光型表示装置

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