WO2021238971A1 - Semiconductor chip, multiplexer, and communication device - Google Patents

Semiconductor chip, multiplexer, and communication device Download PDF

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Publication number
WO2021238971A1
WO2021238971A1 PCT/CN2021/095995 CN2021095995W WO2021238971A1 WO 2021238971 A1 WO2021238971 A1 WO 2021238971A1 CN 2021095995 W CN2021095995 W CN 2021095995W WO 2021238971 A1 WO2021238971 A1 WO 2021238971A1
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Prior art keywords
isolation layer
wafer
sealing ring
lower wafer
seal ring
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PCT/CN2021/095995
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French (fr)
Chinese (zh)
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蔡华林
庞慰
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诺思(天津)微系统有限责任公司
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Publication of WO2021238971A1 publication Critical patent/WO2021238971A1/en

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    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/481Internal lead connections, e.g. via connections, feedthrough structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator

Definitions

  • the present invention relates to the technical field of filters, in particular to a semiconductor chip, a multiplexer and a communication device.
  • FIG. 1 is a schematic diagram of a structure of an acoustic wave filter in the prior art.
  • this filter 10 there are inductors 121 and 122 between the input terminal 131 and the output terminal 132, and a plurality of resonators (usually called series resonators) 101 to 104, and the connection point of each series resonator is between the ground terminal Resonators 111 to 113 (usually referred to as parallel resonators) and inductors 123 to 125 are respectively arranged on multiple branches (usually referred to as parallel branches) of.
  • a mass load layer is added to each parallel resonator, so that the frequency of the parallel resonator and the frequency of the series resonator are different to form the passband of the filter.
  • the quadruplexer includes four filters.
  • the frequency bands of the four filters (chips) are B3TX: 1710 ⁇ 1785MHz, B3RX: 1805 ⁇ 1880MHz, B1TX: 1920 ⁇ 1980MHz, and B1RX: 2110 ⁇ 2170MHz.
  • FIG. 2 is a diagram of the positional relationship between the four chips and the matching inductor in the existing quadruplexer. As shown in FIG. 2, the size of the quadruplexer 20 is relatively large, so the four chips and the electrical structure thereon have a certain distance from the matching inductor 21 on the packaging substrate, and the coupling between each other is small.
  • FIG. 3 is a diagram showing the positional relationship between the four chips and the matching inductor in the existing improved quadruplexer.
  • the original four chips are stacked up and down two by two, and the original four chips are reduced to two in the horizontal direction, thereby reducing the total area of the quadruple. It can be seen from FIG. 3 that since the relative position between the chip and the matching inductor 31 has not changed, the coupling remains unchanged.
  • the packaging substrate of the quadruple can be further reduced.
  • FIG. 4 is a diagram showing the positional relationship between the four chips and the matching inductor in another improved quadruple.
  • the matching inductor 41 in the filter 40 is located below the chip.
  • there is coupling between the matching inductor 41 and the chip and the increased coupling in the quadruple will deteriorate the isolation of the quadruple.
  • FIG. 5 is a cross-sectional view of two existing chips arranged one above the other
  • FIG. 6 is a plan view of the lower surface of the upper wafer in FIG. 5.
  • the resonator on the upper wafer is connected to the ground pin PAD below through the through hole of the docking pin PAD1 through the two layers of the wafer, and the resonator on the middle wafer passes through the docking pin PAD1
  • the through holes of a layer of the wafer are connected to the ground pin PAD below, and the package substrate is connected below the ground pin PAD, and the passive device is integrated in the package substrate.
  • a sealing ring is arranged between adjacent wafers, and the sealing ring is arranged outside the mating pin PAD1 to form a sealing structure.
  • the upper wafer includes series resonators S1 to S4, parallel resonators P1 to P3, input pin IN, input pin OUT, docking pins G1, G2, and isolation layer (the vertical line in the figure) Occupied area) and sealing ring.
  • the isolation layer needs to be connected to one of the docking pins PAD1 and the corresponding through hole to achieve grounding, or grounded through an additional docking pin and the corresponding through hole (the isolation layer is connected to the docking pin G2 in FIG. 6).
  • the invention provides a semiconductor chip, a multiplexer and a communication device.
  • An isolation layer is added between the sealing ring and the passive device to avoid coupling between the two, thereby improving the isolation of the multiplexer.
  • a semiconductor chip is provided.
  • the semiconductor chip of the present invention includes an upper wafer and a lower wafer, the bottom of the lower wafer is connected with a packaging substrate, a sealing ring is provided between the upper wafer and the lower wafer, and a sealing ring isolation layer is provided between the sealing ring and the lower wafer;
  • the inner and outer sides of the seal ring are respectively provided with an inner isolation layer of the seal ring and an outer isolation layer of the seal ring, wherein the inner isolation layer of the seal ring and the outer isolation layer of the seal ring are connected by a conductor.
  • the conductor is located between the sealing ring and the lower wafer.
  • the upper surface of the lower wafer is further provided with a resonator isolation layer, and the resonator isolation layer and the seal ring isolation layer or the isolation layer in the seal ring are an integrated structure;
  • a through hole is provided at the opposite position, and the mating pin between the upper wafer and the lower wafer is connected to the ground pin on the lower side of the lower wafer through the through hole.
  • At least one ground hole is provided in the lower wafer, a wire is provided in the ground hole, and the resonator isolation layer, the seal ring isolation layer, the inner isolation layer of the seal ring, or the outer isolation layer of the seal ring are connected to the ground via the wires in the ground hole. At least one ground pin is connected.
  • the packaging substrate includes a plurality of superimposed upper wafers and lower wafers, and the plurality of superimposed upper wafers and lower wafers include a plurality of ground holes, wherein the plurality of ground holes are vertically projected to the packaging substrate Located on the periphery of the passive device, the passive device is located on the surface or inside of the package substrate, or on the underside of the lower wafer.
  • the resonator is an acoustic wave resonator.
  • a multiplexer is provided.
  • the multiplexer of the present invention includes at least two sets of stacking units.
  • the stacking unit includes an upper wafer, a middle wafer, and a lower wafer.
  • the inner and outer sides of the ring are respectively provided with an inner isolation layer of the seal ring and an outer isolation layer of the seal ring, wherein the inner isolation layer of the seal ring and the outer isolation layer of the seal ring are connected by a conductor.
  • the conductor is located between the sealing ring and the middle or lower wafer where it is located.
  • the upper surface of the middle wafer and/or the lower wafer is further provided with a resonator isolation layer, and the resonator isolation layer and the seal ring isolation layer of the same layer or the inner isolation layer of the seal ring form an integrated structure;
  • a through hole is provided at a position opposite to the through hole in the lower wafer, and the mating pin between the upper wafer and the lower wafer is connected to the ground pin on the lower side of the lower wafer through the through hole.
  • At least one ground hole is provided in the middle wafer and/or the lower wafer, and a wire is provided in the ground hole, and the resonator isolation layer, the seal ring isolation layer, the inner isolation layer of the seal ring, or the outer isolation layer of the seal ring pass The wire in the ground hole is connected to at least one ground pin.
  • the multiple superimposing units include multiple ground holes, and the vertical projection of the multiple ground holes to the packaging substrate is located on the periphery of the passive device in the packaging substrate, and the passive device is located on the surface or inside of the packaging substrate, or Bottom side of the lower wafer.
  • the resonator is an acoustic wave resonator.
  • the multiplexer includes a first receiving chip, a first sending chip, a second receiving chip, and a second sending chip; the second sending chip and the first sending chip are superimposed to form a superimposing unit, and the second receiving chip and the first The receiving chip is superimposed to form a superimposing unit, or the second sending chip and the first receiving chip are superimposed to form a superimposing unit, and the first sending chip and the second receiving chip are superimposed to form a superimposing unit.
  • a communication device which includes the multiplexer according to the present invention.
  • yet another communication device which includes the semiconductor chip according to the present invention.
  • Fig. 1 is a schematic diagram of a filter topology according to the prior art
  • Figure 2 is a diagram showing the positional relationship between four chips and matching inductors in a conventional quadruple
  • Fig. 3 is a diagram of the positional relationship between the four chips and the matching inductor in the existing improved quadruplexer
  • Figure 4 is a diagram of the positional relationship between the four chips and the matching inductor in another improved quadruplexer
  • FIG. 5 is a cross-sectional view of two existing chips arranged one above the other;
  • Fig. 6 is a plan view of the lower surface of the upper wafer in Fig. 5;
  • FIG. 7 is a plan view of the upper wafer in the package structure provided by the embodiment of the present invention.
  • FIG. 8 is a schematic diagram of an isolation method using a sealing ring in the packaging structure provided by the embodiment of the present invention.
  • FIG. 9 is a schematic diagram of another isolation method using a seal ring in the packaging structure provided by the embodiment of the present invention.
  • FIG. 10 is a schematic diagram of an isolation mode of a multiplexer according to an embodiment of the present invention.
  • FIG. 11 is a schematic diagram of another isolation mode of the multiplexer according to the embodiment of the present invention.
  • FIG. 12 is a distribution diagram of ground holes in a multiplexer according to an embodiment of the present invention.
  • FIG. 13a is a comparison diagram of out-of-band suppression curves of a second transmitting chip in a quadruplexer according to an embodiment of the present invention
  • 13b is a comparison diagram of out-of-band suppression curves of the second receiving chip in the quadruplexer according to the embodiment of the present invention.
  • FIG. 13c is a comparison diagram of out-of-band suppression curves of the first transmitting chip in the quadruplexer according to the embodiment of the present invention.
  • FIG. 13d is a comparison diagram of out-of-band suppression curves of the first receiving chip in the quadruplexer according to the embodiment of the present invention.
  • FIG. 13e is a comparison curve of isolation between the second transmitting chip and the second receiving chip in the quadruplexer according to the embodiment of the present invention.
  • FIG. 13f is a comparison curve of isolation between the first transmitting chip and the first receiving chip in the quadruplexer according to the embodiment of the present invention.
  • FIG. 14a is a comparison diagram of out-of-band suppression curves of a second transmitting chip in a quadruplexer according to an embodiment of the present invention.
  • FIG. 14b is a comparison diagram of out-of-band suppression curves of the second receiving chip in the quadruplexer according to the embodiment of the present invention.
  • 14c is a comparison diagram of out-of-band suppression curves of the first transmitting chip in the quadruplexer according to the embodiment of the present invention.
  • 14d is a comparison diagram of out-of-band suppression curves of the first receiving chip in the quadruplexer according to the embodiment of the present invention.
  • FIG. 14e is a comparison curve of isolation between the second transmitting chip and the second receiving chip in the quadruplexer according to the embodiment of the present invention.
  • FIG. 14f is a comparison curve of isolation between the first transmitting chip and the first receiving chip in the quadruplexer according to the embodiment of the present invention.
  • a seal ring isolation layer is added to the chip packaging structure, and the seal ring isolation layer avoids/reduces the coupling between the seal ring and the passive components, thereby avoiding/reducing the degradation of the multiplexer isolation, as follows Be specific.
  • FIG. 7 is a plan view of the upper wafer in the package structure provided by the embodiment of the present invention. As shown in FIG. 7, the area formed by the vertical lines in the figure is an isolation layer. Compared with the plan view of the upper wafer shown in FIG. 6, the isolation layer covers the sealing ring.
  • the seal ring isolation layer is used to realize the isolation of the seal ring, wherein the seal ring isolation layer includes two forms.
  • FIG. 8 is a schematic diagram of an isolation method using a seal ring in the package structure provided by the embodiment of the present invention . As shown in Fig. 8, a sealing ring isolation layer is provided between the upper surface of the lower wafer and the sealing ring (and between the silicon boss carrying the sealing ring).
  • FIG. 9 is a schematic diagram of another isolation method using a seal ring in the packaging structure provided by the embodiment of the present invention. As shown in Figure 9, the seal ring isolation layer is provided on the upper surface of the lower wafer.
  • the conductor is a metal wire or a metal conductive sheet, etc., which is arranged between the sealing ring and the lower wafer.
  • the conductors can be connected in one piece of metal, or one or more can be connected across the sealing ring.
  • the upper surface of the lower wafer is provided with a resonator isolation layer.
  • the resonator isolation layer is used to avoid/reduce the coupling between the resonator and passive components.
  • the resonator isolation layer is closer to the lower wafer. Central.
  • the seal ring isolation layer is added, as shown in FIG. 7, preferably, the resonator isolation layer and the seal ring isolation layer or the inner isolation layer of the seal ring can be arranged as an integral structure.
  • the position of the isolation layer of the lower wafer opposite to the via hole needs to be provided with a through hole to ensure that the mating pin PAD1 can be connected to the ground pin PAD.
  • FIG. 10 is a schematic diagram of an isolation mode of the multiplexer according to the embodiment of the present invention. As shown in Figure 10, a sealing ring isolation layer is provided between the surface of the middle wafer and the sealing ring, and between the surface of the lower wafer and the sealing ring.
  • FIG. 11 is a schematic diagram of another isolation manner of the multiplexer according to the embodiment of the present invention.
  • the inner and outer sides of the middle wafer seal ring and the inner and outer sides of the lower wafer seal ring are respectively provided with an outer seal ring isolation layer and an inner seal ring isolation layer, wherein the inner isolation layer of the seal ring and the seal ring
  • the outer isolation layers are connected by a conductor (not shown in the figure), the conductor is a metal wire or a metal conductive sheet, etc.
  • the conductor is arranged between the sealing ring and the middle wafer/lower wafer.
  • the structure of the sealing isolation ring is not limited to the form shown in FIG. 10 and FIG. Both the middle wafer and the lower wafer are provided with a seal ring structure, and the seal ring isolation layer can adopt any form of seal ring isolation shown in FIG. 10 or FIG. 11.
  • Fig. 12 is a distribution diagram of ground holes in a multiplexer according to an embodiment of the present invention. As shown in Figure 12, ISO_G1, ISO_G2...ISO_G8 in the filter 50 are represented as grounding holes.
  • each superimposed unit includes multiple grounding holes, and multiple grounding holes are arranged On the surface or inside of the package substrate, or the periphery of the passive device (matching inductance) 51 on the underside of the lower wafer (according to the chip plan view of Figure 12), this arrangement can couple the passive device and the chip electrical structure Decrease, further increase the isolation effect.
  • the isolation method of the embodiment of the present invention includes two superimposing units, the second transmitting chip B3TX and the first transmitting chip B1TX are superimposed, and the second receiving chip B3RX and the first receiving chip B1RX are superimposed.
  • the second transmitting chip B3TX frequency band is 1710 ⁇ 1785MHz; the second receiving chip B3RX frequency band is 1805 ⁇ 1880MHz; the first transmitting chip B1TX frequency band is 1920 ⁇ 1980MHz; the first receiving chip B1RX frequency band is 2110 ⁇ 2170MHz.
  • Figures 13a to 13d are comparison diagrams of out-of-band suppression curves for four chips.
  • the solid line in the figure is the out-of-band suppression curve when the seal ring is increased in isolation, and the dashed line is the out-of-band suppression curve when the seal ring is not isolated.
  • Figure 13e is a comparison curve of the isolation between the second transmitting chip and the second receiving chip
  • Figure 13f is the comparison curve of the isolation between the first transmitting chip and the first receiving chip.
  • the solid line is the isolation curve when the sealing ring is isolated.
  • the dotted line is the isolation curve when the seal ring is not isolated. It can be seen from Figures 13a to 13f that when the seal ring in the quadruple is isolated by the seal ring isolation layer, its out-of-band suppression and isolation are greatly improved.
  • Figures 14a-14d are comparison diagrams of out-of-band suppression curves of four chips.
  • the solid line in the figure is the out-of-band suppression curve when grounding holes are added, and the dashed line is the out-of-band suppression curve when no grounding holes are provided.
  • Figure 14e is a comparison curve of the isolation between the second transmitting chip and the second receiving chip
  • Figure 14f is a comparison curve of the isolation between the first transmitting chip and the first receiving chip.
  • the solid line is the isolation curve when the ground hole is added, and the dashed line It is the isolation curve when there is no grounding hole. It can be seen from Figures 14a-14f that when a ground hole is added to the quadruplexer, the signal leakage of passive components can be avoided, thereby further improving the out-of-band suppression and isolation of the quadruplexer.

Abstract

The present invention relates to the technical field of filters, and in particular, to a semiconductor chip, a multiplexer, and a communication device. In the semiconductor chip, a sealing ring between wafers is isolated from a passive device also using an isolation layer; and the coupling between the sealing ring and the passive device is avoided/reduced by a sealing ring isolation layer, thereby avoiding/reducing the deterioration of the isolation degree of the multiplexer.

Description

一种半导体芯片、多工器及通信设备Semiconductor chip, multiplexer and communication equipment 技术领域Technical field
本发明涉及滤波器技术领域,特别地涉及一种半导体芯片、多工器及通信设备。The present invention relates to the technical field of filters, in particular to a semiconductor chip, a multiplexer and a communication device.
背景技术Background technique
近年来的通信设备小型化和高性能趋势的加快,给射频前端提出了更高的挑战。在射频通信前端中,一方面要通过减小芯片和封装基板的尺寸来实现小型化,另一方面要通过减少损耗来源以及更好的谐振器配合设计来实现更好的性能。在现有的滤波器结构中,用于匹配的无源器件较多,同时用于改善特定性能比如滚降插损等也需要额外引入更多的电感、电容、耦合等多种结构。In recent years, the trend of miniaturization and high performance of communication equipment has accelerated, which has put forward higher challenges for the radio frequency front end. In the radio frequency communication front-end, on the one hand, it is necessary to achieve miniaturization by reducing the size of the chip and package substrate, on the other hand, it is necessary to achieve better performance by reducing the source of loss and better resonator design. In the existing filter structure, there are many passive components used for matching, and at the same time, it is necessary to introduce more inductance, capacitance, coupling and other structures to improve specific performance such as roll-off insertion loss.
普通的滤波器的一种典型结构如图1所示,图1是根据现有技术中的声波滤波器的一种结构的示意图。这种滤波器10中,输入端131和输出端132之间有电感121、122以及多个谐振器(通常称作串联谐振器)101~104,各串联谐振器的连接点与接地端之间的多个支路(通常称作并联支路)上分别设置有谐振器111~113(通常称作并联谐振器),以及电感123~125。各并联谐振器上添加有质量负载层,使并联谐振器的频率和串联谐振器的频率具有差异从而形成滤波器的通带。A typical structure of a common filter is shown in FIG. 1, which is a schematic diagram of a structure of an acoustic wave filter in the prior art. In this filter 10, there are inductors 121 and 122 between the input terminal 131 and the output terminal 132, and a plurality of resonators (usually called series resonators) 101 to 104, and the connection point of each series resonator is between the ground terminal Resonators 111 to 113 (usually referred to as parallel resonators) and inductors 123 to 125 are respectively arranged on multiple branches (usually referred to as parallel branches) of. A mass load layer is added to each parallel resonator, so that the frequency of the parallel resonator and the frequency of the series resonator are different to form the passband of the filter.
四工器包括四颗滤波器,四颗滤波器(芯片)的频段分别为B3TX:1710~1785MHz,B3RX:1805~1880MHz,B1TX:1920~1980MHz,B1RX:2110~2170MHz。图2为现有的四工器中四颗芯片及匹配电感之间的位置关系图。如图2所示,该四工器20的尺寸较大,因此四颗芯片及其上的电学结构与封装基板上的匹配电感21具有一定的距离,彼此间的耦合较小。The quadruplexer includes four filters. The frequency bands of the four filters (chips) are B3TX: 1710~1785MHz, B3RX: 1805~1880MHz, B1TX: 1920~1980MHz, and B1RX: 2110~2170MHz. FIG. 2 is a diagram of the positional relationship between the four chips and the matching inductor in the existing quadruplexer. As shown in FIG. 2, the size of the quadruplexer 20 is relatively large, so the four chips and the electrical structure thereon have a certain distance from the matching inductor 21 on the packaging substrate, and the coupling between each other is small.
目前通常采用的一种方式是,通过调整芯片的摆放位置的方式进一步缩小四工器的尺寸。图3为现有的改进后的四工器中四颗芯片及匹配电感之间的位置关系图。如图3所示,该滤波器30中,将原四颗平面布置的芯片改为两两上下堆叠设置,水平方向将原四颗芯片减少为两颗,进而可缩小四工器的总面积。由图3可知,由于芯片与匹配电感31之间相对位置没有改变,因此耦合不变。为了进一步缩小四工器的尺寸,可将四工器的封装基板进一步缩小,其中封装基板缩小,将改变封装基板上匹配电感与芯片之间的相对关系。图4为另一种改进后的四工器中四颗芯片及匹配电感之间的位置关系图。如图4所示,该滤波器40中匹配电感41位于芯片的下方,此结构下,匹配电感41与芯片之间存在耦合,四工器中耦合增强会恶化四工器的隔离度。At present, a commonly adopted method is to further reduce the size of the quadruplexer by adjusting the placement position of the chip. FIG. 3 is a diagram showing the positional relationship between the four chips and the matching inductor in the existing improved quadruplexer. As shown in FIG. 3, in the filter 30, the original four chips are stacked up and down two by two, and the original four chips are reduced to two in the horizontal direction, thereby reducing the total area of the quadruple. It can be seen from FIG. 3 that since the relative position between the chip and the matching inductor 31 has not changed, the coupling remains unchanged. In order to further reduce the size of the quadruple, the packaging substrate of the quadruple can be further reduced. The shrinking of the packaging substrate will change the relative relationship between the matching inductance and the chip on the packaging substrate. Figure 4 is a diagram showing the positional relationship between the four chips and the matching inductor in another improved quadruple. As shown in FIG. 4, the matching inductor 41 in the filter 40 is located below the chip. In this structure, there is coupling between the matching inductor 41 and the chip, and the increased coupling in the quadruple will deteriorate the isolation of the quadruple.
图5为现有的两个上下布置的芯片的剖视图,图6为图5中上晶圆下表面的平面图。如图5所示,在上晶圆的谐振器通过对接管脚PAD1穿过两层晶圆的通孔连接到下方的接地管脚PAD上,中晶圆的谐振器通过对接管脚PAD1穿过一层晶圆的通孔连接到下方的接地管脚PAD上,接地管脚PAD下方连接封装基板,封装基板中集成无源器件。相邻的晶圆之间设置密封环,密封环布置在对接管脚PAD1的外侧形成密封结构。如图6所示,上晶圆包括串联谐振器S1~S4,并联谐振器P1~P3,输入管脚IN,输入管脚OUT,对接管脚G1、G2,以及隔离层(图中竖线所占区域)和密封环。其中,隔离层需要和其中一个对接管脚PAD1以及对应的通孔连接实现接地,或者通过额外的对接管脚以及对应的通孔接地(图6中隔离层与对接管脚G2连接)。5 is a cross-sectional view of two existing chips arranged one above the other, and FIG. 6 is a plan view of the lower surface of the upper wafer in FIG. 5. As shown in Figure 5, the resonator on the upper wafer is connected to the ground pin PAD below through the through hole of the docking pin PAD1 through the two layers of the wafer, and the resonator on the middle wafer passes through the docking pin PAD1 The through holes of a layer of the wafer are connected to the ground pin PAD below, and the package substrate is connected below the ground pin PAD, and the passive device is integrated in the package substrate. A sealing ring is arranged between adjacent wafers, and the sealing ring is arranged outside the mating pin PAD1 to form a sealing structure. As shown in Figure 6, the upper wafer includes series resonators S1 to S4, parallel resonators P1 to P3, input pin IN, input pin OUT, docking pins G1, G2, and isolation layer (the vertical line in the figure) Occupied area) and sealing ring. Wherein, the isolation layer needs to be connected to one of the docking pins PAD1 and the corresponding through hole to achieve grounding, or grounded through an additional docking pin and the corresponding through hole (the isolation layer is connected to the docking pin G2 in FIG. 6).
发明内容Summary of the invention
本发明提供了一种半导体芯片、多工器及通信设备,在密封环和无源器件之间增加隔离层,避免两者产生耦合,从而改善多工器的隔离度。The invention provides a semiconductor chip, a multiplexer and a communication device. An isolation layer is added between the sealing ring and the passive device to avoid coupling between the two, thereby improving the isolation of the multiplexer.
为实现上述目的,根据本发明的一个方面,提供了一种半导体芯片。To achieve the above objective, according to one aspect of the present invention, a semiconductor chip is provided.
本发明的半导体芯片包括上晶圆和下晶圆,下晶圆底部连接封装基板,上晶圆和下晶圆之间具有密封环,密封环与下晶圆之间设有密封环隔离层;或者,密封环的内侧和外侧分别设有密封环内隔离层和密封环外隔离层,其中,密封环内隔离层与密封环外隔离层之间通过导体连接。The semiconductor chip of the present invention includes an upper wafer and a lower wafer, the bottom of the lower wafer is connected with a packaging substrate, a sealing ring is provided between the upper wafer and the lower wafer, and a sealing ring isolation layer is provided between the sealing ring and the lower wafer; Alternatively, the inner and outer sides of the seal ring are respectively provided with an inner isolation layer of the seal ring and an outer isolation layer of the seal ring, wherein the inner isolation layer of the seal ring and the outer isolation layer of the seal ring are connected by a conductor.
可选地,所述导体位于密封环与下晶圆之间。Optionally, the conductor is located between the sealing ring and the lower wafer.
可选地,下晶圆的上表面还设有谐振器隔离层,谐振器隔离层与密封环隔离层或密封环内隔离层为一体结构;该一体结构中,与下晶圆中的过孔相对的位置处设有通孔,用于上晶圆与下晶圆之间的对接管脚经由该通孔连接到下晶圆下侧的接地管脚。Optionally, the upper surface of the lower wafer is further provided with a resonator isolation layer, and the resonator isolation layer and the seal ring isolation layer or the isolation layer in the seal ring are an integrated structure; A through hole is provided at the opposite position, and the mating pin between the upper wafer and the lower wafer is connected to the ground pin on the lower side of the lower wafer through the through hole.
可选地,下晶圆中设有至少一个接地孔,接地孔内设有导线,谐振器隔离层、密封环隔离层、密封环内隔离层或密封环外隔离层通过接地孔内的导线与至少一个接地管脚连接。Optionally, at least one ground hole is provided in the lower wafer, a wire is provided in the ground hole, and the resonator isolation layer, the seal ring isolation layer, the inner isolation layer of the seal ring, or the outer isolation layer of the seal ring are connected to the ground via the wires in the ground hole. At least one ground pin is connected.
可选地,封装基板上包括多个叠加的上晶圆和下晶圆,多个叠加的上晶圆和下晶圆中包括多个接地孔,其中,多个接地孔向封装基板的垂直投影位于无源器件的外围,所述无源器件位于封装基板表面或内部,或位于下晶圆下侧。Optionally, the packaging substrate includes a plurality of superimposed upper wafers and lower wafers, and the plurality of superimposed upper wafers and lower wafers include a plurality of ground holes, wherein the plurality of ground holes are vertically projected to the packaging substrate Located on the periphery of the passive device, the passive device is located on the surface or inside of the package substrate, or on the underside of the lower wafer.
可选地,所述谐振器为声波谐振器。Optionally, the resonator is an acoustic wave resonator.
根据本发明的另一方面,提供了一种多工器。According to another aspect of the present invention, a multiplexer is provided.
本发明的多工器包括至少两组叠加单元,叠加单元包括上晶圆、中晶圆和下晶圆,下晶圆底部连接封装基板,上晶圆和中晶圆之间、中晶圆和下晶圆之间分别具有密封环,密封环和中晶圆之间和/或密封环和下晶圆之间设有密封环隔离层;或者,位于中晶圆和/或下晶圆的密封环的内侧和外 侧分别设有密封环内隔离层和密封环外隔离层,其中,密封环内隔离层与密封环外隔离层之间通过导体连接。The multiplexer of the present invention includes at least two sets of stacking units. The stacking unit includes an upper wafer, a middle wafer, and a lower wafer. There are sealing rings between the lower wafers, and a sealing ring isolation layer is provided between the sealing ring and the middle wafer and/or between the sealing ring and the lower wafer; or, the sealing of the middle wafer and/or the lower wafer The inner and outer sides of the ring are respectively provided with an inner isolation layer of the seal ring and an outer isolation layer of the seal ring, wherein the inner isolation layer of the seal ring and the outer isolation layer of the seal ring are connected by a conductor.
可选地,所述导体位于密封环与其所在的中晶圆或下晶圆之间。Optionally, the conductor is located between the sealing ring and the middle or lower wafer where it is located.
可选地,中晶圆和/或下晶圆的上表面还设有谐振器隔离层,谐振器隔离层与同层的密封环隔离层或密封环内隔离层为一体结构;该一体结构中,与下晶圆中的过孔相对的位置处设有通孔,用于上晶圆与下晶圆之间的对接管脚经由该通孔连接到下晶圆下侧的接地管脚。Optionally, the upper surface of the middle wafer and/or the lower wafer is further provided with a resonator isolation layer, and the resonator isolation layer and the seal ring isolation layer of the same layer or the inner isolation layer of the seal ring form an integrated structure; A through hole is provided at a position opposite to the through hole in the lower wafer, and the mating pin between the upper wafer and the lower wafer is connected to the ground pin on the lower side of the lower wafer through the through hole.
可选地,中晶圆和/或下晶圆中设有至少一个接地孔,接地孔内设有导线,谐振器隔离层、密封环隔离层、密封环内隔离层或密封环外隔离层通过接地孔内的导线与至少一个接地管脚连接。Optionally, at least one ground hole is provided in the middle wafer and/or the lower wafer, and a wire is provided in the ground hole, and the resonator isolation layer, the seal ring isolation layer, the inner isolation layer of the seal ring, or the outer isolation layer of the seal ring pass The wire in the ground hole is connected to at least one ground pin.
可选地,多个叠加单元中包括多个接地孔,多个接地孔向封装基板的垂直投影位于封装基板中的无源器件的外围,所述无源器件位于封装基板表面或内部,或位于下晶圆下侧。Optionally, the multiple superimposing units include multiple ground holes, and the vertical projection of the multiple ground holes to the packaging substrate is located on the periphery of the passive device in the packaging substrate, and the passive device is located on the surface or inside of the packaging substrate, or Bottom side of the lower wafer.
可选地,所述谐振器为声波谐振器。Optionally, the resonator is an acoustic wave resonator.
可选地,多工器包括第一接收芯片、第一发送芯片、第二接收芯片、第二发送芯片;第二发送芯片和第一发送芯片叠加设置形成叠加单元,第二接收芯片和第一接收芯片叠加设置形成叠加单元,或者,第二发送芯片和第一接收芯片叠加设置叠加单元,第一发送芯片和第二接收芯片叠加设置形成叠加单元。Optionally, the multiplexer includes a first receiving chip, a first sending chip, a second receiving chip, and a second sending chip; the second sending chip and the first sending chip are superimposed to form a superimposing unit, and the second receiving chip and the first The receiving chip is superimposed to form a superimposing unit, or the second sending chip and the first receiving chip are superimposed to form a superimposing unit, and the first sending chip and the second receiving chip are superimposed to form a superimposing unit.
根据本发明的又一方面,提供了一种通信设备,其包括本发明所述的多工器。According to another aspect of the present invention, a communication device is provided, which includes the multiplexer according to the present invention.
根据本发明的又一方面,提供了又一种通信设备,其包括本发明所述 的半导体芯片。According to another aspect of the present invention, there is provided yet another communication device, which includes the semiconductor chip according to the present invention.
附图说明Description of the drawings
为了说明而非限制的目的,现在将根据本发明的优选实施例、特别是参考附图来描述本发明,其中:For the purpose of illustration and not limitation, the present invention will now be described according to preferred embodiments of the present invention, particularly with reference to the accompanying drawings, in which:
图1是根据现有技术的一种滤波器拓扑结构的示意图;Fig. 1 is a schematic diagram of a filter topology according to the prior art;
图2为现有的四工器中四颗芯片及匹配电感之间的位置关系图;Figure 2 is a diagram showing the positional relationship between four chips and matching inductors in a conventional quadruple;
图3为现有的改进后的四工器中四颗芯片及匹配电感之间的位置关系图;Fig. 3 is a diagram of the positional relationship between the four chips and the matching inductor in the existing improved quadruplexer;
图4为另一种改进后的四工器中四颗芯片及匹配电感之间的位置关系图;Figure 4 is a diagram of the positional relationship between the four chips and the matching inductor in another improved quadruplexer;
图5为现有的两个上下布置的芯片的剖视图;FIG. 5 is a cross-sectional view of two existing chips arranged one above the other;
图6为图5中上晶圆下表面的平面图;Fig. 6 is a plan view of the lower surface of the upper wafer in Fig. 5;
图7为本发明实施方式提供的封装结构中上晶圆的平面图;7 is a plan view of the upper wafer in the package structure provided by the embodiment of the present invention;
图8为本发明实施方式提供的封装结构中采用密封环的一种隔离方式的示意图;8 is a schematic diagram of an isolation method using a sealing ring in the packaging structure provided by the embodiment of the present invention;
图9为本发明实施方式提供的封装结构中采用密封环的另一种隔离方式的示意图;9 is a schematic diagram of another isolation method using a seal ring in the packaging structure provided by the embodiment of the present invention;
图10为本发明实施方式提供的多工器的一种隔离方式的示意图;FIG. 10 is a schematic diagram of an isolation mode of a multiplexer according to an embodiment of the present invention;
图11为本发明实施方式提供的多工器的另一种隔离方式的示意图;FIG. 11 is a schematic diagram of another isolation mode of the multiplexer according to the embodiment of the present invention;
图12为本发明实施方式提供的多工器中接地孔的分布图;FIG. 12 is a distribution diagram of ground holes in a multiplexer according to an embodiment of the present invention;
图13a为本发明实施方式提供的四工器中第二发送芯片的带外抑制曲线对比图;FIG. 13a is a comparison diagram of out-of-band suppression curves of a second transmitting chip in a quadruplexer according to an embodiment of the present invention;
图13b为本发明实施方式提供的四工器中第二接收芯片的带外抑制曲线对比图;13b is a comparison diagram of out-of-band suppression curves of the second receiving chip in the quadruplexer according to the embodiment of the present invention;
图13c为本发明实施方式提供的四工器中第一发送芯片的带外抑制曲线对比图;FIG. 13c is a comparison diagram of out-of-band suppression curves of the first transmitting chip in the quadruplexer according to the embodiment of the present invention;
图13d为本发明实施方式提供的四工器中第一接收芯片的带外抑制曲线对比图;FIG. 13d is a comparison diagram of out-of-band suppression curves of the first receiving chip in the quadruplexer according to the embodiment of the present invention;
图13e为本发明实施方式提供的四工器中第二发送芯片和第二接收芯 片隔离度对比曲线;FIG. 13e is a comparison curve of isolation between the second transmitting chip and the second receiving chip in the quadruplexer according to the embodiment of the present invention;
图13f为本发明实施方式提供的四工器中第一发送芯片和第一接收芯片隔离度对比曲线;FIG. 13f is a comparison curve of isolation between the first transmitting chip and the first receiving chip in the quadruplexer according to the embodiment of the present invention;
图14a为本发明实施方式提供的四工器中第二发送芯片的带外抑制曲线对比图;FIG. 14a is a comparison diagram of out-of-band suppression curves of a second transmitting chip in a quadruplexer according to an embodiment of the present invention;
图14b为本发明实施方式提供的四工器中第二接收芯片的带外抑制曲线对比图;FIG. 14b is a comparison diagram of out-of-band suppression curves of the second receiving chip in the quadruplexer according to the embodiment of the present invention;
图14c为本发明实施方式提供的四工器中第一发送芯片的带外抑制曲线对比图;14c is a comparison diagram of out-of-band suppression curves of the first transmitting chip in the quadruplexer according to the embodiment of the present invention;
图14d为本发明实施方式提供的四工器中第一接收芯片的带外抑制曲线对比图;14d is a comparison diagram of out-of-band suppression curves of the first receiving chip in the quadruplexer according to the embodiment of the present invention;
图14e为本发明实施方式提供的四工器中第二发送芯片和第二接收芯片隔离度对比曲线;FIG. 14e is a comparison curve of isolation between the second transmitting chip and the second receiving chip in the quadruplexer according to the embodiment of the present invention;
图14f为本发明实施方式提供的四工器中第一发送芯片和第一接收芯片隔离度对比曲线。FIG. 14f is a comparison curve of isolation between the first transmitting chip and the first receiving chip in the quadruplexer according to the embodiment of the present invention.
具体实施方式Detailed ways
本发明实施方式中,在芯片的封装结构中增加密封环隔离层,通过密封环隔离层避免/减小密封环与无源器件之间的耦合,从而避免/降低多工器隔离度下降,以下具体加以说明。In the embodiment of the present invention, a seal ring isolation layer is added to the chip packaging structure, and the seal ring isolation layer avoids/reduces the coupling between the seal ring and the passive components, thereby avoiding/reducing the degradation of the multiplexer isolation, as follows Be specific.
图7为本发明实施方式提供的封装结构中上晶圆的平面图。如图7所示,图中竖线所形成的区域为隔离层,与图6所示的上晶圆的平面图相比,该隔离层覆盖了密封环。FIG. 7 is a plan view of the upper wafer in the package structure provided by the embodiment of the present invention. As shown in FIG. 7, the area formed by the vertical lines in the figure is an isolation layer. Compared with the plan view of the upper wafer shown in FIG. 6, the isolation layer covers the sealing ring.
本发明实施方式中,利用密封环隔离层实现密封环的隔离,其中,密封环隔离层包括两种形式,图8为本发明实施方式提供的封装结构中采用密封环的一种隔离方式的示意图。如图8所示,在下晶圆的上表面与密封环之间(与承载密封环的硅凸台之间)设有密封环隔离层。图9为本发明实施方式提供的封装结构中采用密封环的另一种隔离方式的示意图。如图 9所示,该密封环隔离层设置在下晶圆的上表面,其分为密封环内隔离层和密封环外隔离层,两者分别位于密封环的内侧和外侧,两者之间通过导体(图中未示出)连接,该导体为金属导线或金属导电片等,其设置在密封环与下晶圆之间。导体可以整块金属连接,或者可以跨过密封环连接一条或者多条。In the embodiment of the present invention, the seal ring isolation layer is used to realize the isolation of the seal ring, wherein the seal ring isolation layer includes two forms. FIG. 8 is a schematic diagram of an isolation method using a seal ring in the package structure provided by the embodiment of the present invention . As shown in Fig. 8, a sealing ring isolation layer is provided between the upper surface of the lower wafer and the sealing ring (and between the silicon boss carrying the sealing ring). FIG. 9 is a schematic diagram of another isolation method using a seal ring in the packaging structure provided by the embodiment of the present invention. As shown in Figure 9, the seal ring isolation layer is provided on the upper surface of the lower wafer. It is divided into a seal ring inner isolation layer and a seal ring outer isolation layer, which are located on the inside and outside of the seal ring, and pass between the two A conductor (not shown in the figure) is connected. The conductor is a metal wire or a metal conductive sheet, etc., which is arranged between the sealing ring and the lower wafer. The conductors can be connected in one piece of metal, or one or more can be connected across the sealing ring.
如图5所示,下晶圆的上表面设有谐振器隔离层,谐振器隔离层用于避免/减小谐振器与无源器件之间的耦合,谐振器隔离层更靠近下晶圆的中部。当增加密封环隔离层后,如图7所示,优选地,可将谐振器隔离层与密封环隔离层或密封环内隔离层设置为一体结构。其中,下晶圆的隔离层与过孔相对的位置需要设置通孔,以确保对接管脚PAD1能够连接到接地管脚PAD上。As shown in Figure 5, the upper surface of the lower wafer is provided with a resonator isolation layer. The resonator isolation layer is used to avoid/reduce the coupling between the resonator and passive components. The resonator isolation layer is closer to the lower wafer. Central. When the seal ring isolation layer is added, as shown in FIG. 7, preferably, the resonator isolation layer and the seal ring isolation layer or the inner isolation layer of the seal ring can be arranged as an integral structure. Wherein, the position of the isolation layer of the lower wafer opposite to the via hole needs to be provided with a through hole to ensure that the mating pin PAD1 can be connected to the ground pin PAD.
图10为本发明实施方式提供的多工器的一种隔离方式的示意图。如图10所示,中晶圆表面与密封环之间、下晶圆表面与密封环之间均设有密封环隔离层。图11为本发明实施方式提供的多工器的另一种隔离方式的示意图。如图11所示,中晶圆密封环的内外两侧、下晶圆密封环的内外两侧分别设置有密封环外隔离层和密封环内隔离层,其中,密封环内隔离层和密封环外隔离层之间通过导体(图中未示出)连接,该导体为金属导线或金属导电片等,导体设置在密封环与中晶圆/下晶圆之间。FIG. 10 is a schematic diagram of an isolation mode of the multiplexer according to the embodiment of the present invention. As shown in Figure 10, a sealing ring isolation layer is provided between the surface of the middle wafer and the sealing ring, and between the surface of the lower wafer and the sealing ring. FIG. 11 is a schematic diagram of another isolation manner of the multiplexer according to the embodiment of the present invention. As shown in Figure 11, the inner and outer sides of the middle wafer seal ring and the inner and outer sides of the lower wafer seal ring are respectively provided with an outer seal ring isolation layer and an inner seal ring isolation layer, wherein the inner isolation layer of the seal ring and the seal ring The outer isolation layers are connected by a conductor (not shown in the figure), the conductor is a metal wire or a metal conductive sheet, etc. The conductor is arranged between the sealing ring and the middle wafer/lower wafer.
本发明实施方式提供四工器中,密封隔离环的结构并非仅限于图10和图11所示的形式,其中,还可仅在中晶圆或仅在下晶圆设置密封环隔离结构。当中晶圆和下晶圆均设置密封环结构,密封环隔离层可采用图10或图11中所示的密封环隔离的任意形式。In the quadruple provided by the embodiment of the present invention, the structure of the sealing isolation ring is not limited to the form shown in FIG. 10 and FIG. Both the middle wafer and the lower wafer are provided with a seal ring structure, and the seal ring isolation layer can adopt any form of seal ring isolation shown in FIG. 10 or FIG. 11.
本发明实施例中,谐振器隔离层和密封环隔离层(密封环内隔离层和密封环外隔离层)通过接地孔与接地管脚连接,此方式可使无源器件泄露的信号能够直接到地,信号不会在芯片之间产生信号泄露,进而可进一步提高多工器的隔离度。另外,在晶圆上形成接地孔的操作不会额外增加半 导体封装结构/四工器的制造工艺,进而不会增加半导体封装结构/四工器的制作难度及成本。图12为本发明实施方式提供的多工器中接地孔的分布图。如图12所示,滤波器50中ISO_G1、ISO_G2……ISO_G8表示为接地孔,由图中的接地孔分布可知,每个叠加单元中均包括了多个接地孔,且多个接地孔均布置在封装基板表面或内部、或者下晶圆下侧的无源器件(匹配电感)51的外围(按图12的芯片平面图视角),此设置方式可以将无源器件与芯片电学结构之间的耦合减小,进一步增加隔离的效果。In the embodiment of the present invention, the resonator isolation layer and the seal ring isolation layer (the inner isolation layer of the seal ring and the outer isolation layer of the seal ring) are connected to the ground pin through the ground hole. Ground, the signal will not cause signal leakage between the chips, which can further improve the isolation of the multiplexer. In addition, the operation of forming a ground hole on the wafer does not increase the manufacturing process of the semiconductor package structure/quadruplexer, and thus does not increase the manufacturing difficulty and cost of the semiconductor package structure/quadruplexer. Fig. 12 is a distribution diagram of ground holes in a multiplexer according to an embodiment of the present invention. As shown in Figure 12, ISO_G1, ISO_G2...ISO_G8 in the filter 50 are represented as grounding holes. From the grounding hole distribution in the figure, each superimposed unit includes multiple grounding holes, and multiple grounding holes are arranged On the surface or inside of the package substrate, or the periphery of the passive device (matching inductance) 51 on the underside of the lower wafer (according to the chip plan view of Figure 12), this arrangement can couple the passive device and the chip electrical structure Decrease, further increase the isolation effect.
以下对于本发明实施方式的隔离方式的效果加以说明。以四工器为例,其包括两个叠加单元,第二发送芯片B3TX和第一发送芯片B1TX叠加设置,第二接收芯片B3RX和第一接收芯片B1RX叠加设置。其中,第二发送芯片B3TX频段为1710~1785MHz;第二接收芯片B3RX频段为1805~1880MHz;第一发送芯片B1TX频段为1920~1980MHz;第一接收芯片B1RX频段为2110~2170MHz。图13a~图13d为四颗芯片的带外抑制曲线对比图,图中实线为密封环增加隔离时的带外抑制曲线,虚线为密封环未隔离时的带外抑制曲线。图13e为第二发送芯片和第二接收芯片隔离度对比曲线,图13f为第一发送芯片和第一接收芯片隔离度对比曲线,图中,实线为密封环被隔离时的隔离度曲线,虚线为密封环未隔离时的隔离度曲线。由图13a~13f可知,当四工器中的密封环通过密封环隔离层进行隔离时,其带外抑制和隔离度都有较大的改善。The effect of the isolation method of the embodiment of the present invention will be described below. Taking a quadruple as an example, it includes two superimposing units, the second transmitting chip B3TX and the first transmitting chip B1TX are superimposed, and the second receiving chip B3RX and the first receiving chip B1RX are superimposed. Among them, the second transmitting chip B3TX frequency band is 1710~1785MHz; the second receiving chip B3RX frequency band is 1805~1880MHz; the first transmitting chip B1TX frequency band is 1920~1980MHz; the first receiving chip B1RX frequency band is 2110~2170MHz. Figures 13a to 13d are comparison diagrams of out-of-band suppression curves for four chips. The solid line in the figure is the out-of-band suppression curve when the seal ring is increased in isolation, and the dashed line is the out-of-band suppression curve when the seal ring is not isolated. Figure 13e is a comparison curve of the isolation between the second transmitting chip and the second receiving chip, and Figure 13f is the comparison curve of the isolation between the first transmitting chip and the first receiving chip. In the figure, the solid line is the isolation curve when the sealing ring is isolated. The dotted line is the isolation curve when the seal ring is not isolated. It can be seen from Figures 13a to 13f that when the seal ring in the quadruple is isolated by the seal ring isolation layer, its out-of-band suppression and isolation are greatly improved.
图14a~图14d为四颗芯片的带外抑制曲线对比图,图中实线为增加接地孔时的带外抑制曲线,虚线为未设置接地孔时的带外抑制曲线。图14e为第二发送芯片和第二接收芯片隔离度对比曲线,图14f为第一发送芯片和第一接收芯片隔离度对比曲线,图中,实线为增加接地孔时的隔离度曲线,虚线为未设置接地孔时的隔离度曲线。由图14a~14f可知,当四工器中增加接地孔时,可避免无源器件的信号泄露,从而进一步改善四工器的带外抑制和隔离度。Figures 14a-14d are comparison diagrams of out-of-band suppression curves of four chips. The solid line in the figure is the out-of-band suppression curve when grounding holes are added, and the dashed line is the out-of-band suppression curve when no grounding holes are provided. Figure 14e is a comparison curve of the isolation between the second transmitting chip and the second receiving chip, and Figure 14f is a comparison curve of the isolation between the first transmitting chip and the first receiving chip. In the figure, the solid line is the isolation curve when the ground hole is added, and the dashed line It is the isolation curve when there is no grounding hole. It can be seen from Figures 14a-14f that when a ground hole is added to the quadruplexer, the signal leakage of passive components can be avoided, thereby further improving the out-of-band suppression and isolation of the quadruplexer.
上述具体实施方式,并不构成对本发明保护范围的限制。本领域技术 人员应该明白的是,取决于设计要求和其他因素,可以发生各种各样的修改、组合、子组合和替代。任何在本发明的精神和原则之内所作的修改、等同替换和改进等,均应包含在本发明保护范围之内。The foregoing specific implementations do not constitute a limitation on the protection scope of the present invention. Those skilled in the art should understand that, depending on design requirements and other factors, various modifications, combinations, sub-combinations, and substitutions can occur. Any modification, equivalent replacement and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (15)

  1. 一种半导体芯片,包括上晶圆和下晶圆,下晶圆底部连接封装基板,上晶圆和下晶圆之间具有密封环,其特征在于,A semiconductor chip includes an upper wafer and a lower wafer, the bottom of the lower wafer is connected with a packaging substrate, and a sealing ring is arranged between the upper wafer and the lower wafer, and is characterized in that:
    密封环与下晶圆之间设有密封环隔离层;A sealing ring isolation layer is provided between the sealing ring and the lower wafer;
    或者,or,
    密封环的内侧和外侧分别设有密封环内隔离层和密封环外隔离层,其中,密封环内隔离层与密封环外隔离层之间通过导体连接。The inner side and the outer side of the sealing ring are respectively provided with an inner sealing ring and an outer sealing ring, wherein the inner insulating layer of the sealing ring and the outer insulating layer of the sealing ring are connected by a conductor.
  2. 根据权利要求1所述的半导体芯片,其特征在于,所述导体位于密封环与下晶圆之间。The semiconductor chip of claim 1, wherein the conductor is located between the sealing ring and the lower wafer.
  3. 根据权利要求1所述的半导体芯片,其特征在于,下晶圆的上表面还设有谐振器隔离层,谐振器隔离层与密封环隔离层或密封环内隔离层为一体结构;The semiconductor chip according to claim 1, wherein the upper surface of the lower wafer is further provided with a resonator isolation layer, and the resonator isolation layer and the seal ring isolation layer or the inner isolation layer of the seal ring are an integrated structure;
    该一体结构中,与下晶圆中的过孔相对的位置处设有通孔,用于上晶圆与下晶圆之间的对接管脚经由该通孔连接到下晶圆下侧的接地管脚。In this integrated structure, a through hole is provided at a position opposite to the via hole in the lower wafer, and the docking pin between the upper wafer and the lower wafer is connected to the ground on the lower side of the lower wafer through the through hole Pin.
  4. 根据权利要求1所述的半导体芯片,其特征在于,下晶圆中设有至少一个接地孔,接地孔内设有导线,谐振器隔离层、密封环隔离层、密封环内隔离层或密封环外隔离层通过接地孔内的导线与至少一个接地管脚连接。The semiconductor chip of claim 1, wherein at least one ground hole is provided in the lower wafer, a wire is provided in the ground hole, a resonator isolation layer, a seal ring isolation layer, an inner isolation layer of the seal ring, or a seal ring The outer isolation layer is connected to at least one ground pin through a wire in the ground hole.
  5. 根据权利要求3所述的半导体芯片,其特征在于,封装基板上包括多个叠加的上晶圆和下晶圆,多个叠加的上晶圆和下晶圆中包括多个接地孔,其中,多个接地孔向封装基板的垂直投影位于无源器件的外围,所述无源器件位于封装基板表面或内部,或位于下晶圆下侧。The semiconductor chip of claim 3, wherein the package substrate comprises a plurality of superimposed upper wafers and lower wafers, and the plurality of superimposed upper wafers and lower wafers comprise a plurality of ground holes, wherein, The vertical projection of the multiple ground holes to the packaging substrate is located on the periphery of the passive device, which is located on the surface or inside of the packaging substrate, or on the underside of the lower wafer.
  6. 根据权利要求3,4或5所述的半导体芯片,其特征在于,所述谐振器为声波谐振器。The semiconductor chip according to claim 3, 4 or 5, wherein the resonator is an acoustic wave resonator.
  7. 一种多工器,包括至少两组叠加单元,叠加单元包括上晶圆、中晶圆和下晶圆,下晶圆底部连接封装基板,上晶圆和中晶圆之间、中晶圆和下晶圆之间分别具有密封环,其特征在于,A multiplexer includes at least two sets of stacking units. The stacking unit includes an upper wafer, a middle wafer, and a lower wafer. The bottom of the lower wafer is connected to a packaging substrate. There are sealing rings between the lower wafers, which are characterized in that:
    密封环和中晶圆之间和/或密封环和下晶圆之间设有密封环隔离层;A sealing ring isolation layer is provided between the sealing ring and the middle wafer and/or between the sealing ring and the lower wafer;
    或者,or,
    位于中晶圆和/或下晶圆的密封环的内侧和外侧分别设有密封环内隔离层和密封环外隔离层,其中,密封环内隔离层与密封环外隔离层之间通过导体连接。The inner and outer sides of the seal ring located in the middle wafer and/or the lower wafer are respectively provided with an inner seal ring isolation layer and an outer seal ring isolation layer, wherein the inner isolation layer of the seal ring and the outer isolation layer of the seal ring are connected by a conductor .
  8. 根据权利要求1所述的多工器,其特征在于,所述导体位于密封环与其所在的中晶圆或下晶圆之间。The multiplexer according to claim 1, wherein the conductor is located between the sealing ring and the middle wafer or the lower wafer where it is located.
  9. 根据权利要求7所述的多工器,其特征在于,中晶圆和/或下晶圆的上表面还设有谐振器隔离层,谐振器隔离层与同层的密封环隔离层或密封环内隔离层为一体结构;The multiplexer according to claim 7, wherein the upper surface of the middle wafer and/or the lower wafer is further provided with a resonator isolation layer, the resonator isolation layer and the same layer of the seal ring isolation layer or seal ring The inner isolation layer is a one-piece structure;
    该一体结构中,与下晶圆中的过孔相对的位置处设有通孔,用于上晶圆与下晶圆之间的对接管脚经由该通孔连接到下晶圆下侧的接地管脚。In this integrated structure, a through hole is provided at a position opposite to the via hole in the lower wafer, and the docking pin between the upper wafer and the lower wafer is connected to the ground on the lower side of the lower wafer through the through hole Pin.
  10. 根据权利要求7所述的多工器,其特征在于,中晶圆和/或下晶圆中设有至少一个接地孔,接地孔内设有导线,谐振器隔离层、密封环隔离层、密封环内隔离层或密封环外隔离层通过接地孔内的导线与至少一个接地管脚连接。The multiplexer according to claim 7, wherein at least one ground hole is provided in the middle wafer and/or the lower wafer, a wire is provided in the ground hole, a resonator isolation layer, a sealing ring isolation layer, and The isolation layer inside the ring or the isolation layer outside the sealing ring is connected to at least one ground pin through a wire in the ground hole.
  11. 根据权利要求10所述的多工器,其特征在于,多个叠加单元中包括多个接地孔,多个接地孔向封装基板的垂直投影位于封装基板中的无源器件的外围,所述无源器件位于封装基板表面或内部,或位于下晶圆下侧。The multiplexer according to claim 10, wherein the plurality of superimposing units includes a plurality of ground holes, and the vertical projection of the plurality of ground holes to the package substrate is located on the periphery of the passive device in the package substrate, and the The source device is located on the surface or inside of the package substrate, or on the underside of the lower wafer.
  12. 根据权利要求9、10或11所述的多工器,其特征在于,所述谐 振器为声波谐振器。The multiplexer according to claim 9, 10 or 11, wherein the resonator is an acoustic wave resonator.
  13. 根据权利要求9、10或11所述的多工器,其特征在于,多工器包括第一接收芯片、第一发送芯片、第二接收芯片、第二发送芯片;The multiplexer according to claim 9, 10 or 11, wherein the multiplexer comprises a first receiving chip, a first sending chip, a second receiving chip, and a second sending chip;
    第二发送芯片和第一发送芯片叠加设置形成叠加单元,第二接收芯片和第一接收芯片叠加设置形成叠加单元,The second sending chip and the first sending chip are superimposed to form a superimposing unit, and the second receiving chip and the first receiving chip are superimposed to form a superimposing unit,
    或者,or,
    第二发送芯片和第一接收芯片叠加设置叠加单元,第一发送芯片和第二接收芯片叠加设置形成叠加单元。The second sending chip and the first receiving chip are superimposed to form a superimposing unit, and the first sending chip and the second receiving chip are superimposed to form a superimposing unit.
  14. 一种通信设备,其特征在于,包括如权利要求7至13中任一项所述的多工器。A communication device, characterized by comprising the multiplexer according to any one of claims 7 to 13.
  15. 一种通信设备,其特征在于,包括如权利要求1至6中任一项所述的半导体芯片。A communication device, characterized by comprising the semiconductor chip according to any one of claims 1 to 6.
PCT/CN2021/095995 2020-05-29 2021-05-26 Semiconductor chip, multiplexer, and communication device WO2021238971A1 (en)

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