WO2021209083A1 - Réseau de diffraction et procédé d'utilisation du réseau de diffraction - Google Patents

Réseau de diffraction et procédé d'utilisation du réseau de diffraction Download PDF

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Publication number
WO2021209083A1
WO2021209083A1 PCT/DE2021/000073 DE2021000073W WO2021209083A1 WO 2021209083 A1 WO2021209083 A1 WO 2021209083A1 DE 2021000073 W DE2021000073 W DE 2021000073W WO 2021209083 A1 WO2021209083 A1 WO 2021209083A1
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WO
WIPO (PCT)
Prior art keywords
grating
range
diffraction
diffraction grating
lines
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Application number
PCT/DE2021/000073
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German (de)
English (en)
Inventor
Andrey SOKOLOV
Florin Radu
Original Assignee
Helmholtz-Zentrum Berlin für Materialien und Energie Gesellschaft mit beschränkter Haftung
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Publication of WO2021209083A1 publication Critical patent/WO2021209083A1/fr

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Definitions

  • the invention relates to a diffraction grating of the type used for diffraction of X-rays, for example in a monochromator, and an associated method.
  • a diffraction grating of the type according to the invention is a so-called plane grating.
  • Planar grids of the type according to the invention are, for example, in article 1 by G. Reichardt and F. Shufers (Laminar versus trapezoidal grating profiles: AFM measurements and efficiency simulations, Grating and Grating Monochromators for Synchrotron Radiation, Proceedings of the Society of Photo-Optical Instrumentation Engineers (SPIE), Vol. 3150, 1997, pp. 121-129).
  • a plane grid essentially consists of a flat substrate in which there are parallel, straight grooves, the so-called grid lines. The substrate can be coated or made up of several layers.
  • Layers and coatings also have a functional character, for example to influence the reflective properties of the grating.
  • the grid lines have a spacing, a width and a depth which are suitable for diffracting electromagnetic radiation and, in particular, X-ray radiation of a predetermined wavelength upon incidence at an angle determined by the Bragg condition.
  • the distance between the grating lines has a periodicity, ie it is regular. The distance also determines the line density, lines / mm.
  • c ff (cos ⁇ / cos ⁇ ), engl.
  • Constant or fix focal distance Constant distance from the focal plane
  • plane grating-focus condition is usually considered when using a plane grating in a monochromator. In particular, it influences the focusing properties of the plane grating and is a function of the wavelength (energy), the diffraction order and the grating period.
  • c ff is set by the orientation of the plane grating in relation to the incident X-ray beam and optimized as required. Also influenced by c ff are, for example, parameters of the monochromator such as resolution and transmission.
  • the substrate in the plane grids to be considered according to the invention is flat.
  • the surface can be treated to improve the diffraction properties, e.g. by polishing or coating.
  • the grid lines can be designed from planar grid to planar grid, as required, by grooves of different profiles, with only grooves with a rectangular profile to be considered with regard to the grid according to the invention.
  • the spacing of the grid lines on a given substrate can also change continuously in one direction, in which case it is a so-called variable line spacing (VSL) grid.
  • VSL variable line spacing
  • Diffraction gratings are often used due to the property of selective diffraction to monochromatize radiation and are used in spectrometers, X-ray optics and other devices.
  • An overview of diffraction gratings for the monochromatization of soft X-rays is given in article 2 by H. Petersen et. al. (Review of plane grating focusing for soft x-ray monochromators, Review of Scientific Instruments, Vol. 66 (1), 1995, pp. 1-14).
  • monochromatization it is meant here to reduce electromagnetic radiation with a spectral width incident on a grating, in the emerging, i.e. diffracted beam, in the spectral width.
  • the spectral width to be achieved in the diffracted beam is a characteristic of a given plane grating.
  • the narrowest possible spectral width is aimed for in the emerging (monochromatized) beam, which is also rated as a good property of a monochromator.
  • blaze grids from English sparkle, blaze
  • Blaze gratings are characterized by the optimization of the diffraction efficiency of a diffraction order, contrary to the suppression of undesired diffraction orders, and consist of equidistant, inclined surfaces.
  • These grids are very complex to manufacture, as e.g. the article 6 by R. K. Heilmann et al. (Advances in reflection grating technology for Constellation-X; Proceedings of SPIE Vol. 5168, 2004, pp. 271-282) can be found.
  • the object of the present invention is therefore to specify a device which causes a suppression of higher orders of diffraction while at the same time minimizing the instrumental complexity and good resolution and using the same.
  • the object is achieved by the features of the subject matter of claim 1 and claim 4.
  • Advantageous configurations are the subject matter of the dependent claims.
  • the device is given by the diffraction grating according to the invention, which comprises at least one substrate with a surface having the grating lines.
  • the grid lines are parallel and regular. All materials with high reflectivity in the soft X-ray range, in particular silicon, in particular coated with gold, platinum or tantalum, as also corresponds to embodiments, come into consideration as the substrate.
  • the substrate normal of the silicon advantageously corresponds to ⁇ 100>, as it corresponds to an embodiment.
  • the number of grid lines is large enough to ensure diffraction, which is theoretically the case from a number of two grid lines. The total number here is in particular greater than 50 and, in a particularly advantageous manner, greater than a total of 500.
  • the profile of the grating lines of the diffraction grating is ideally rectangular. However, from a manufacturing point of view, this cannot be achieved or can only be achieved with difficulty.
  • the angles that characterize the profile are formed by the acute angle (g, trapezoidal angle) that is spanned by the walls of the profile and the base line in the profile (parallel to the base / surface of the substrate).
  • the tolerable angular range for the grating according to the invention is 5 ° to, as a limit case of the acute angle, 90 °.
  • the angle mentioned is referred to here with g and otherwise also as a trapezoidal or “slope” angle in the literature. Any unevenness that may occur due to production needs to be averaged out when looking at the angles.
  • the line spacing of the grating lines (p), which corresponds to the grating period of the diffraction grating, is in the range from 6.1 ⁇ m to 7.1 ⁇ m. This corresponds to a line density in the range of 164 lines / mm and 141 lines / mm.
  • the upper groove width (G), ie the distance between the profiles of the grid lines, is in the range from 3.66 ⁇ m to 4.97 ⁇ m and the line depth of the grid lines (GD) is in the range from 55 nm to 65 nm.
  • the values for The upper groove width G and the line spacing of the grid lines p are designed in such a way that they form a ratio of the upper groove width G to the line spacing p, G: p, which is between 0.6 and 0.7.
  • the values for G and p are to be selected accordingly when manufacturing the diffraction grating, taking the boundary conditions into account
  • the diffraction grating according to the invention is used in the suppression of diffraction of higher order,>
  • the diffraction grating according to the invention of use comprises at least one substrate with a surface which has grating lines.
  • the grid lines are parallel and regular. All materials with high reflectivity in the soft X-ray region, in particular silicon, in particular coated with gold, as also corresponds to embodiments, come into consideration as the substrate.
  • the substrate normal of the silicon advantageously corresponds to ⁇ 100>, as it corresponds to an embodiment.
  • the number of grid lines is large enough to ensure diffraction, which is theoretically the case from a number of two grid lines. The total number here is in particular greater than 50 and, in a particularly advantageous manner, greater than a total of 500.
  • the profile of the grating lines in the diffraction grating is ideally rectangular. However, from a manufacturing point of view, this cannot be achieved or can only be achieved with difficulty.
  • the angles that characterize the profile of the grid lines are formed by the acute angle ( ⁇ , trapezoidal angle) formed by the walls of the Profile and the baseline in the profile (parallel to the base / surface of the substrate) is spanned.
  • the tolerable angular range for the grating according to the invention is 5 ° to, as a limit case of the acute angle, 90 °.
  • the angle mentioned is referred to here as g and is otherwise also referred to in the literature as a trapezoidal or “slope” angle. Any unevenness that may occur due to production needs to be averaged out when looking at the angles.
  • the line spacing of the grating lines (p), which corresponds to the grating period, is in the range from 6.1 ⁇ m to 7.1 ⁇ m. This corresponds to a line density in the range of 164 lines / mm and 141 lines / mm.
  • the upper groove width (G), ie the distance between the profiles of the grid lines, is in the range from 3.66 ⁇ m to 4.97 ⁇ m and the line depth of the grid lines (GD) is in the range from 55 nm to 65 nm.
  • the values for The upper groove width G and the line spacing of the grid lines p are designed in such a way that they form a ratio of the upper groove width G to the line spacing p, G: p, which is between 0.6 and 0.7.
  • the values for G and p are to be selected when manufacturing the diffraction grating, taking the boundary conditions into account, so that a corresponding ratio is set.
  • the plane grating condition c ff is in the range between 1.2 to 1.7 and in particular in the range from 1.4 to 1.5 .
  • the ideal value for c ff for the energy range of the X-ray beam in the range from 10 eV to 200 eV, is 1.45, the maximum efficiency is then 60 eV.
  • the choice of the value for c ff depends on the choice of energy to be used and can also be determined by optimizing the flow of the X-rays (flux).
  • a grating according to the invention with the specified parameters and below a suitable plane grating focus condition, c ff , without the use of further aids, in particular optics, contrary to the prejudice that a large line spacing has a very negative effect on the grating properties, a suppression of higher order diffraction (>
  • ) of up to to an efficiency of ⁇ 0.025 for the energy range 10 eV to 200 eV, with an efficiency for the first order diffraction of up to> 0.32, with an energy of 60 eV (c ff 1.45).
  • the plan grid focus condition c ff is in the range between 1.2 and 1.7.
  • the diffraction grating according to the invention and the associated method enable a very efficient suppression of higher-order diffraction, while at the same time having good diffraction properties and with minimal instrumental expenditure. It is only necessary to use the diffraction grating.
  • Figure 1 Schematic representation of a section perpendicular to the
  • FIG. 2 Diffraction efficiency of diffractions of different orders on a diffraction grating according to the invention when used according to the invention as a function of the energy;
  • FIG. 3 Quality factor of the transmission as a function of the energy of a diffraction grating according to the invention.
  • Fig. 1 shows a schematic representation of a section perpendicular to the
  • Grating lines of a generic diffraction grating as it is also from the State of the art, for example in article 1, is known. The illustration is not true to scale and only serves to illustrate the parameters of the diffraction grating.
  • the diffraction grating is characterized by the uniform line spacing p of the grating lines, the depth of the profiles of the grating lines GD and their upper groove width G.
  • the grating lines are introduced onto the surface of a substrate S.
  • the trapezoidal angle ⁇ is also marked.
  • the substrate is made from silicon ⁇ 100> and the grid lines are applied to the surface of the substrate using a grid dividing machine.
  • the line spacing of the grid lines p is 6.7 ⁇ m, which corresponds to a line density of 150 lines / mm.
  • the line depth GD is 60 nm and the upper groove width G is 4.36 ⁇ m and the ratio of G to p therefore corresponds to 0.65.
  • the trapezoidal angle g i is 10 °.
  • the surface of the diffraction grating is gold-plated.
  • ) using the diffraction grating of the exemplary embodiment is shown on the basis of the efficiency of the diffraction as a function of the energy.
  • the efficiency results from the ratio of the intensity of the X-ray radiation incident on the diffraction grating to the intensity of the X-ray beam after diffraction.
  • the suppression of the higher order diffraction (2, 3, 4, 5) is due to their very low efficiency (or low transmission) of up to ⁇ 0.025 for the energy range 10 eV to 200 eV, with a simultaneous efficiency for first order diffraction ( ⁇ , -) of up to> 0.32, with an energy of 60 eV.
  • the plan grid focus condition c ff is 1.45.
  • a figure of merit (FOM) for the transmission to be expressed also as the quality of the suppression of higher order (ie low transmission (efficiency) of the diffraction of higher order), with simultaneous optimized efficiency of the diffraction 1.
  • FAM figure of merit
  • the FOM is defined as:. where Ef f i the efficiency (or transmission) of the Denotes i-th order diffraction.
  • the illustrated embodiment shows the advantages of the diffraction grating according to the invention and the associated use.
  • the diffraction grating and its use enable a very efficient suppression of the higher order diffraction while at the same time having good diffraction properties for the diffraction ⁇ 1. Order and with minimal instrumental effort. Only the diffraction grating is used.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

L'invention concerne un réseau de diffraction et son utilisation comme, par exemple, dans des monochromateurs pour rayons X. Le réseau de diffraction selon l'invention comprend au moins un substrat (S) doté d'une surface présentant des lignes de réseau, et est caractérisé en ce que les lignes de réseau sont espacées d'une distance régulière et forment un angle trapézoïdal y compris entre 5° et 90° en profil, avec une distance interligne (p) comprise entre 6,1 μm et 7,1 μm, une largeur de rainure supérieure (G) comprise entre 3,66 μm et 4,97 μm et une profondeur de ligne (GD) comprise entre 55 nm et 65 nm. Le rapport entre la largeur de rainure supérieure (G) et la distance interligne (p) s'établit entre 0,6 et 0,7. Le réseau de diffraction selon l'invention et son utilisation provoquent une suppression efficace de la diffraction d'ordre supérieur tout en offrant simultanément une bonne efficacité de la diffraction de 1er ordre.
PCT/DE2021/000073 2020-04-14 2021-04-12 Réseau de diffraction et procédé d'utilisation du réseau de diffraction WO2021209083A1 (fr)

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DE102020110173.2 2020-04-14
DE102020110173.2A DE102020110173B4 (de) 2020-04-14 2020-04-14 Beugungsgitter und Verfahren zur Verwendung des Beugungsgitters

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Citations (2)

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US20060274392A1 (en) * 2003-06-25 2006-12-07 Ovd Kinegram Ag Optical safety element and system for visualising hidden information
CN209487521U (zh) * 2019-04-16 2019-10-11 华侨大学 基于微纳米复合结构的薄膜太阳能电池

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Publication number Priority date Publication date Assignee Title
DE19652563A1 (de) 1996-12-17 1998-06-18 Heidenhain Gmbh Dr Johannes Lichtelektrische Positionsmeßeinrichtung
EP3540479A1 (fr) 2018-03-13 2019-09-18 Thomson Licensing Réseau de diffraction comprenant des structures à double matériau

Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
US20060274392A1 (en) * 2003-06-25 2006-12-07 Ovd Kinegram Ag Optical safety element and system for visualising hidden information
CN209487521U (zh) * 2019-04-16 2019-10-11 华侨大学 基于微纳米复合结构的薄膜太阳能电池

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Title
DALE G ET AL: "Photolithographic method for producing metal-dissolved diffractive structures in As-S glasses", IEE PROCEEDINGS: OPTOELECTRONICS, INSTITUTION OF ELECTRICAL ENGINEERS, STEVENAGE, GB, vol. 144, no. 6, 16 December 1997 (1997-12-16), pages 426 - 432, XP006008884, ISSN: 1350-2433, DOI: 10.1049/IP-OPT:19971347 *
G. REICHARDTF. SCHÄFERS: "Laminar versus trapezoidal grating profiles: AFM-measurements and efficiency simulations, Gratings and Grating Monochromators for Synchrotron Radiation", PROCEEDINGS OFT HE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE, vol. 3150, 1997, pages 121 - 129
H. PETERSEN: "Review of plane grating focusing for soft x-ray monochromators", REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 66, no. 1, 1995, pages 1 - 14, XP000495419, DOI: 10.1063/1.1145258
M. R. HOWELLS: "Plane grating monochromators for synchrotron radiation", NUCLEAR INSTRUMENTS AND METHODS, vol. 177, 1980, pages 127 - 139
R. FOLLATH: "The versatility of collimated plane grating monochromators", NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH A, vol. 467, no. 468, 2001, pages 418 - 425, XP004297884, DOI: 10.1016/S0168-9002(01)00338-2
R. K. HEILMANN ET AL.: "Advances in reflection grating technology for Constellation-X", PROCEEDINGS OF SPIE, vol. 5168, 2004, pages 271 - 282
SHIN D ET AL: "A laser interferometer encoder with two micromachined gratings generating phase-shifted quadrature;A laser interferometer encoder with two micromachined gratings generating phase-shifted quadrature", JOURNAL OF MICROMECHANICS AND MICROENGINEERING, INSTITUTE OF PHYSICS PUBLISHING, BRISTOL, GB, vol. 21, no. 8, 26 July 2011 (2011-07-26), pages 85036, XP020208887, ISSN: 0960-1317, DOI: 10.1088/0960-1317/21/8/085036 *
Z.-Y. GUO ET AL.: "A new method to suppress heigh-order harmonics for a synchrotron radiation soft X-ray beamline", CHINESE PHYSICS C, vol. 39, 2015

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DE102020110173A1 (de) 2021-10-14
DE102020110173B4 (de) 2021-11-25

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