WO2021208210A1 - 一种显示面板及其制备方法 - Google Patents

一种显示面板及其制备方法 Download PDF

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Publication number
WO2021208210A1
WO2021208210A1 PCT/CN2020/094026 CN2020094026W WO2021208210A1 WO 2021208210 A1 WO2021208210 A1 WO 2021208210A1 CN 2020094026 W CN2020094026 W CN 2020094026W WO 2021208210 A1 WO2021208210 A1 WO 2021208210A1
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WIPO (PCT)
Prior art keywords
layer
electrowetting
hydrophobic
display panel
electrochromic layer
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PCT/CN2020/094026
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English (en)
French (fr)
Inventor
王亚楠
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Tcl华星光电技术有限公司
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Priority to US16/980,411 priority Critical patent/US11703675B2/en
Publication of WO2021208210A1 publication Critical patent/WO2021208210A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G02F1/157—Structural association of cells with optical devices, e.g. reflectors or illuminating devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • G02B26/005—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1347—Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells

Definitions

  • the present invention relates to the field of display technology, in particular to a display panel and a preparation method thereof.
  • the purpose of the present invention is to provide a display panel and a manufacturing method thereof, so as to solve the technical problems of low light utilization efficiency, high cost, and shortened life of the display panel in the prior art.
  • the present application provides a display panel including an electrochromic layer, an electrowetting structure, and a super-surface structure; the electrowetting structure is provided on one side of the electrochromic layer; the super-surface The structure is arranged in the electrowetting structure; when the electrochromic layer is completely closed, the supersurface structure and the electrowetting structure are used to reflect light of the corresponding wavelength to form a reflective state; when the electrochromic layer When the part of the electrochromic layer is closed, it corresponds to the part of the electrochromic layer that is closed.
  • the metasurface structure and the electrowetting structure reflect light of the corresponding wavelength to form a reflective state, corresponding to the part of the electrochromic layer that is not closed, and the light is transparent Through the wetted super-surface structure and electrochromic layer, a transparent state is formed.
  • the display panel further includes: a first substrate disposed on a side of the electrochromic layer away from the super-surface structure; and a first electrode disposed on the electrochromic layer.
  • the electrowetting structure includes: a dielectric layer covering the electrochromic layer and the first electrode; and a hydrophobic layer provided on the dielectric layer; wherein the super The surface structure is arranged between the dielectric layer and the hydrophobic layer.
  • the super-surface structure includes: a substrate layer arranged on the dielectric layer; and a plurality of nano-pillars arranged on the substrate layer at intervals; wherein, a nano-pillar includes: a first silicon oxide layer, Is provided on the substrate layer; a titanium oxide layer is provided on the first silicon oxide layer; and a second silicon dioxide layer is provided on the titanium oxide layer.
  • the gap between two adjacent nano-pillars is 100 nm to 500 nm; the height of the nano-pillars is 200 to 1000 nm, and the width is 100 to 500 nm.
  • the thickness of the hydrophobic layer is less than the thickness of the nanopillars.
  • the display panel further includes: a hydrophilic layer arranged on the hydrophobic layer and close to the edge of the hydrophobic layer; and a hydrophobic area arranged on the same layer as the hydrophilic layer and close to the hydrophilic layer.
  • the electrowetting hydrophobic medium is arranged on the hydrophobic area; the liquid layer is overlaid on the hydrophilic layer, the hydrophobic area, the electrowetting hydrophobic medium and the dielectric layer;
  • Two electrodes are provided on the surface of the liquid layer away from the first substrate; and the second substrate is provided on the surface of the second electrode away from the first substrate.
  • the electrowetting hydrophobic medium when the voltage applied by the first electrode and the second electrode is greater than zero, the electrowetting hydrophobic medium is in a convergent state and converges on the upper surface of the hydrophobic region; when the first electrode When the voltage applied to the second electrode is equal to zero, the electrowetting hydrophobic medium presents an expanded state and completely covers the hydrophobic layer and the super-surface structure.
  • the present invention also provides a method for manufacturing a display panel, which includes the following steps:
  • the wetted super-surface structure and electrochromic layer form a transparent state.
  • the step of forming the super-surface structure further includes: forming a substrate layer above the electrochromic layer; forming a first silicon oxide layer on the substrate layer; and forming a titanium oxide layer on the substrate layer. On the first silicon oxide layer; forming a second silicon dioxide layer on the titanium oxide layer; and
  • the first silicon oxide layer, the titanium oxide layer, and the second silicon oxide layer are etched using an electron beam photolithography process and a plasma process to form a plurality of nanopillars arranged at intervals.
  • the technical effect of the present invention is to provide a display panel and a preparation method thereof, which utilize the combination of an electrowetting structure and a super-surface structure to realize two display states: reflective and transflective.
  • the color saturation of the super-surface structure is Higher, the electrowetting technology compatible with the electrowetting structure can also achieve fast response time and low energy consumption.
  • the overall structure of the display panel is simple, the response speed is fast, and the polarizer is not required, the light utilization rate is high, and the light reflection efficiency through the super-surface structure is as high as 70-80%, which can significantly reduce the display energy consumption.
  • FIG. 1 is a schematic structural diagram of the total reflection state of the display panel according to this embodiment.
  • Fig. 2 is a schematic diagram of the structure of the super-surface structure.
  • Fig. 3 is an enlarged view of the super-surface structure and the hydrophobic layer.
  • FIG. 4 is a schematic diagram of the structure of the display panel in the semi-transmissive and semi-reflective state of the embodiment.
  • FIG. 5 is a schematic diagram of the structure of the electrochromic layer of this embodiment in a state of total reflection.
  • FIG. 6 is a schematic diagram of the structure of the electrochromic layer of the embodiment in a transflective state.
  • FIG. 7 is a flow chart of the manufacturing method of the display panel according to this embodiment.
  • Fig. 8 is a flow chart of the preparation of the super-surface structure described in this embodiment.
  • the first silicon oxide layer 522 titanium oxide layer;
  • This embodiment provides a display panel and a manufacturing method thereof.
  • the display panel can realize two display states: total reflection and transflective display, wherein the total reflection display panel can realize normal reflection display and color display; transflective display panel
  • the display panel mainly uses the micro-structured metasurfaces to construct a full-color reflective display, and then through the combination of the metasurface structure and electrowetting technology, the display panel realizes a transparent display. The following is a description of the display panel and the preparation method thereof.
  • this embodiment provides a display panel, which includes a first substrate 1, an electrochromic layer 2, a first electrode 3, a dielectric layer 4, an ultra-surface structure 5, a hydrophobic layer 6, and a hydrophilic layer.
  • the electrochromic layer 2 is provided on the upper surface of the first substrate 1.
  • the electrochromic layer 2 can be changed into a transparent color under voltage control to control the gray scale control of the display panel in the reflective state.
  • the electrochromic layer 2 is controlled by different pixels by separate electrodes.
  • the first electrode 3 is provided on the upper surface of the electrochromic layer 2.
  • the first electrode 3 is a transparent electrode, and its material includes indium tin oxide (ITO), graphene, and the like.
  • the electrowetting structure 100 includes a dielectric layer 4 disposed on the upper surface of the first electrode 3 and part of the electrochromic layer 2.
  • the material of the dielectric layer 4 includes at least one of silicon oxide and silicon nitride.
  • the super-surface structure 5 covers the electrochromic layer and is arranged on the upper surface of the dielectric layer 4. Under the irradiation of ambient light, the metasurface can display different colors with different structures, and can achieve higher color purity.
  • the metasurface structure 5 can reflect a structure of a specific wavelength, reflecting the red sub-pixel (R), green sub-pixel (G) or blue sub-pixel (B) respectively, that is, used as RGB, which is a mechanism of structural color.
  • RGB can be displayed separately or displayed in layers, which is not limited here.
  • the super-surface structure 5 includes a substrate layer 51 and nano-pillars 52.
  • the substrate layer 51 is provided on the upper surface of the dielectric layer 4.
  • a plurality of nano-pillars 52 are arranged on the upper surface of the substrate layer 51 at intervals.
  • the gap between two adjacent nano-pillars 52 is 100 nm to 500 nm; the height of the nano-pillars 52 is 200 to 1000 nm, and the width is 100 to 500 nm.
  • the overall trend of the width of the red, green and blue (RGB) colors of the display panel is R> G> B.
  • Each nanopillar 52 includes a first silicon oxide layer 521, a titanium oxide layer 522, and a second silicon dioxide layer 523.
  • the first silicon oxide layer 521 is provided on the upper surface of the substrate layer 51; the titanium oxide layer 522 is provided on the upper surface of the first silicon oxide layer 521; the second silicon oxide layer 523 is provided on the upper surface of the titanium oxide layer 522.
  • the electrowetting structure 100 includes a hydrophobic layer 6 covering the upper surface of the supersurface structure 5.
  • the thickness of the hydrophobic layer 6 is less than the thickness of the nanopillars 52, and the refractive index of the hydrophobic layer 6 Less than 1.3, the thickness of the hydrophobic layer 6 is 50 ⁇ 300nm, and the conventional material of the hydrophobic layer 6 can be dichloro-para-xylene dimer (Parylene C) At least one of Teflon AF, non-crystalline fluorinated polymer (CYPOT).
  • the material of the hydrophobic layer 6 is preferably AE2400, the refractive index of AE2400 is 1.29, and AF2400 is made of polytetrafluoroethylene and 2,2-difluoromethyl-4,5-difluoro 1,3-epoxy
  • the polymer is a random copolymer prepared with a molar amount of 85:15.
  • the hydrophobic layer 6 is formed by the surface treatment of the ultra-surface structure 5 by AE2400.
  • the hydrophilic layer 7 is provided on the upper surface of the hydrophobic layer 6 and close to the edge of the hydrophobic layer 6.
  • the hydrophobic area 8 is arranged in the same layer as the hydrophilic layer 7 and is close to the edge of the hydrophilic layer 7.
  • the hydrophobic area 8 has an electrowetting hydrophobic medium 9 in the shape of a droplet.
  • the refractive index of the electrowetting hydrophobic medium 9 is greater than 1.4, and its material meets the hydrophobic characteristics and has high transparency. Liquid materials with high stability such as silicone oil can be selected.
  • the liquid layer 10 covers the upper surface of the hydrophilic layer 7, the hydrophobic area 8, the electrowetting hydrophobic medium 9 and the dielectric layer 4.
  • the liquid layer 10 is preferably water, which is the thickness of the display panel.
  • the electrowetting hydrophobic medium 9 can completely immerse the super-surface structure 5 after unfolding, and the electrowetting hydrophobic medium 9 does not need to be used too much, so the thickness of the liquid layer 10 does not need to be too thick, depending on the pixel size of the display panel
  • the design is between 0.3 ⁇ 10um.
  • the second electrode 11 is provided on the upper surface of the liquid layer 10.
  • the second electrode 11 is a transparent electrode, and its material includes indium tin oxide (ITO), graphene, and the like.
  • the second substrate 12 is disposed on the upper surface of the second electrode 11, and mainly controls the gray scale of the color and whether it is converted to a transparent state.
  • the gray scale of the color refers to the area of the displayed color and the color contrast.
  • the first electrode 3 on the first substrate 1 side and the second electrode 11 on the second substrate 12 side jointly control the expansion and convergence of the high refractive index liquid, mainly controlling the expansion and convergence of the electrowetting hydrophobic medium 9 convergence.
  • the thickness of the liquid layer 10 is preferably 2-100 um, and this setting is affected by the size of the pixel structure. If the pixel structure is too large, after the electrowetting hydrophobic medium 9 converges, the liquid layer 10 needs to be increased appropriately.
  • the supporting structure can be a supporting column (Photo Spacer, PS).
  • the electrowetting hydrophobic medium 9 assumes a convergent state and converges on the upper surface of the hydrophobic region 8.
  • the electrowetting hydrophobic medium 9 assumes an unfolded state and completely covers the hydrophobic layer 6 and the ultra-surface structure 5.
  • the function of the hydrophilic layer 7 is to use electrowetting technology to make water contact the lower surface as soon as possible when voltage is driven, and to accelerate the convergence of the electrowetting hydrophobic medium 9;
  • the function of the hydrophobic zone 8 is to make The electrowetting hydrophobic medium 9 can be stably located in a fixed position, and can also accelerate the convergence of the electrowetting hydrophobic medium 9.
  • This embodiment provides a display panel.
  • the electrochromic layer When the electrochromic layer is closed, the electrochromic layer is displayed in a black opaque state, which will absorb the light irradiated to its surface; when the electrochromic layer is turned on, it is in a transparent state and the light can Pass freely.
  • the electrowetting hydrophobic medium converges, the super-surface structure reflects light of a specific wavelength, and the rest of the light is transmitted. When it encounters the black electroluminescent layer, it is absorbed by it, and when it is not encountered, it is directly projected from the other side; When the electrowetting hydrophobic medium is spread out, it will submerge its surface when it touches the super-surface structure, and the reflection effect of the submerged part disappears.
  • the electrochromic layer is encountered. When it is black, it is completely absorbed. When the electrochromic layer is in a transparent state, it is completely transmitted through, and all can be emitted from the other side, that is, it is in a transparent state.
  • the corresponding pixel area is closed, that is, the electrochromic in a single pixel is either turned on or turned off.
  • the display state of the display panel is divided into a total reflection state and a transflective state.
  • the following will take the RGB space discrete display as an example to introduce:
  • the super-surface structure and the electrowetting structure are used to reflect light of a corresponding wavelength to form a reflective state.
  • the metasurface structure is used to reflect the light of the corresponding wavelength and displayed in a black opaque state. At this time, the metasurface structure can perform color reflection display .
  • the electrochromic layer When the electrochromic layer is partially closed, it corresponds to the portion of the electrochromic layer that is closed.
  • the metasurface structure and the electrowetting structure reflect light of the corresponding wavelength to form a reflective state, which corresponds to the portion of the electrochromic layer that is not closed.
  • the light passes through the wetted super-surface structure and the electrochromic layer to form a transparent state.
  • the electrochromic layer corresponding to the display area of the set screen is all closed and normally reflects to achieve the display effect; the electrochromic layer corresponding to the non-screen area is set to be in an open state and does not reflect.
  • the electrowetting hydrophobic medium when the electrowetting hydrophobic medium functions as a display screen area, it regulates the intensity of the super-surface reflected light by controlling the size of the wetting area; in a non-display screen area, it is in a full-pixel wetting state, With a transparent electrochromic layer, all light is transmitted through without reflection or absorption.
  • the comprehensive picture display effect means that the non-picture area is in a transparent state, and the picture area is in a display state.
  • the electrochromic layer in the state of total reflection, the electrochromic layer is completely closed, and the electrochromic layer 2 is black and cannot transmit and reflect light. Therefore, when light is irradiated on the sub-pixels R and G, the light of the corresponding wavelength is completely reflected, and the sub-pixel can control the amount of reflected light through the wet state to control the grayscale display of the display panel.
  • the G sub-pixel represents the normal display area, and the electrochromic layer corresponding to this area is closed and appears black.
  • the electrochromic layer corresponding to the R sub-pixel is in an open state and presents a transparent state.
  • the electrowetting hydrophobic medium on the super-surface structure is also in an expanded state, and the super-surface structure is infiltrated in the wet hydrophobic medium. In, the reflection effect of the specified wavelength of light disappears, and it appears transparent, so the entire area appears transparent.
  • This embodiment provides a display panel that uses a metasurface structure to construct a full-color reflective display, and then combines the metasurface structure with an electrowetting hydrophobic medium to achieve two display states: reflective and transflective.
  • High color saturation, compatible with electrowetting technology can also achieve fast response time and low energy consumption.
  • the overall structure of the display panel is simple, the response speed is fast, and no polarizer is needed, the light utilization efficiency is high, and the light reflection efficiency of the supersurface is as high as 70-80%, which can significantly reduce the display energy consumption.
  • this embodiment also provides a method for manufacturing a display panel, including the following steps S1) to S11).
  • An electrochromic layer is formed on the upper surface of the first substrate, and the electrochromic layer can be changed to a transparent color under voltage control to control the gray scale control of the display panel in the reflective state.
  • the electrochromic layer is controlled by different pixels by separate electrodes.
  • the first electrode is a transparent electrode, and its material includes indium tin oxide (ITO), graphene, and the like.
  • the material of the dielectric layer includes at least one of silicon oxide and silicon nitride.
  • the metasurface structure can reflect a structure of a specific wavelength, and reflect the red sub-pixel (R) or the green sub-pixel (G) or the blue sub-pixel (B) respectively, that is, used as RGB, which is a mechanism of structural color.
  • RGB can be displayed separately or displayed in layers, which is not limited here.
  • the thickness of the hydrophobic layer is less than the thickness of the nanopillars, the refractive index of the hydrophobic layer 6 is less than 1.3, the thickness of the hydrophobic layer 6 is 50 to 300 nm, and the conventional material of the hydrophobic layer 6 may be dichloropara-xylene dichloride.
  • the material of the hydrophobic layer 6 is preferably AE2400, the refractive index of AE2400 is 1.29, and AF2400 is made of polytetrafluoroethylene and 2,2-difluoromethyl-4,5-difluoro 1,3-epoxy
  • the polymer is a random copolymer prepared with a molar amount of 85:15.
  • the hydrophobic layer 6 is formed by the surface treatment of the ultra-surface structure 5 by AE2400.
  • the electrowetting hydrophobic medium is in the shape of water droplets.
  • the refractive index of the electrowetting hydrophobic medium is greater than 1.4, and its material meets the hydrophobic characteristics, has high transparency, and can be selected from liquid materials with high stability such as silicone oil.
  • the second electrode is a transparent electrode, and its material includes indium tin oxide (ITO), graphene, and the like.
  • ITO indium tin oxide
  • the first substrate and the second substrate form a cavity, and liquid is injected into the cavity to form a liquid layer , So that the liquid layer covers the upper surface of the hydrophilic layer, the hydrophobic region, the electrowetting hydrophobic medium and the dielectric layer.
  • the liquid layer is preferably water, which is the thickness of the display panel.
  • the electrowetting hydrophobic medium can completely immerse the super-surface structure after unfolding, and the electrowetting hydrophobic medium does not need to be used too much, so the thickness of the liquid layer does not need to be too thick, according to the display
  • the pixel size of the panel is designed to be between 0.3 ⁇ 10um.
  • the first substrate mainly controls the gray scale of the color and whether it is converted to a transparent state.
  • the gray scale of the color refers to the area of the displayed color and the color contrast.
  • the display state of the display panel manufactured by the above method is divided into a total reflection state and a transflective state.
  • the following will take the RGB space discrete display as an example to introduce:
  • the metasurface structure In the state of total reflection, when the electrochromic layer is completely closed, the metasurface structure is used to reflect the light of the corresponding wavelength, showing a black opaque state. At this time, the metasurface structure can perform color reflection show.
  • the super-surface structure and the electrowetting structure are used to reflect light of a corresponding wavelength to form a reflective state.
  • the metasurface structure is used to reflect the light of the corresponding wavelength and is displayed in a black opaque state. At this time, the metasurface structure can perform color reflection display .
  • the electrochromic layer When the electrochromic layer is partially closed, it corresponds to the portion of the electrochromic layer that is closed.
  • the metasurface structure and the electrowetting structure reflect light of the corresponding wavelength to form a reflective state, which corresponds to the portion of the electrochromic layer that is not closed.
  • the light passes through the wetted super-surface structure and the electrochromic layer to form a transparent state.
  • the electrochromic layer corresponding to the display area of the set screen is all closed and normally reflects to achieve the display effect; the electrochromic layer corresponding to the non-screen area is set to be in an open state and does not reflect.
  • the electrowetting hydrophobic medium when the electrowetting hydrophobic medium functions as a display screen area, it regulates the intensity of the super-surface reflected light by controlling the size of the wetting area; in a non-display screen area, it is in a full-pixel wetting state, With a transparent electrochromic layer, all light is transmitted through without reflection or absorption.
  • the comprehensive picture display effect means that the non-picture area is in a transparent state, and the picture area is in a display state.

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Abstract

一种显示面板及其制备方法，当电致变色层（2）全部关闭时，超表面结构（5）搭配电润湿结构（100）用以反射对应波长的光，形成反射态；当电致变色层（2）部分关闭时，对应关闭的电致变色层（2）的部分，超表面结构（5）搭配电润湿结构（100）反射对应波长的光，形成反射态，对应未关闭的电致变色层（2）的部分，光线透过被润湿的超表面结构（5）和电致变色层（2），形成透明态。

Description

一种显示面板及其制备方法 技术领域
本发明涉及显示技术领域，尤其涉及一种显示面板及其制备方法。
 背景技术
随着显示技术的发展，户外显示的需求越来越普及，商家的户外广告或标识需求，大众的移动办公需求等，对显示器的要求越来越多样化。传统的显示器面临更多困难和挑战。液晶显示器的光利用效率低，在户外显示中这一劣势越发的明显。OLED显示的光效及色彩度均有显著提高，但其又面临着成本与寿命的问题，也无法在户外显示中占有优势。
 技术问题
本发明的目的在于，提供一种显示面板及其制备方法，以解决现有技术存在的显示面板的光利用效率低、成本较高、寿命缩短的技术问题。
 技术解决方案
为实现上述目的，本申请提供一种显示面板，包括电致变色层、电润湿结构以及超表面结构；所述电润湿结构设于所述电致变色层的一侧；所述超表面结构设于所述电润湿结构内；当所述电致变色层全部关闭时，所述超表面结构搭配所述电润湿结构用以反射对应波长的光，形成反射态；当所述电致变色层部分关闭时，对应关闭的电致变色层的部分，所述超表面结构搭配电润湿结构反射对应波长的光，形成反射态，对应未关闭的电致变色层的部分，光线透过所述被润湿的超表面结构和电致变色层，形成透明态。
进一步地，所述的显示面板还包括：第一基板，设于所述电致变色层远离所述超表面结构的一侧；第一电极，设于所述电致变色层上。
进一步地，所述电润湿结构包括：介电层，覆于所述电致变色层及所述第一电极上；以及疏水层，设于所述介电层的上方；其中，所述超表面结构设于所述介电层及所述疏水层之间。
进一步地，所述超表面结构包括：衬底层，设于所述介电层上；以及多个纳米柱，间隔设置于所述衬底层上；其中，一纳米柱包括：第一氧化硅层，设于所述衬底层上；氧化钛层，设于所述第一氧化硅层上；以及第二氧化硅层，设于所述氧化钛层上。
进一步地，相邻的两个纳米柱的之间的间隙为100nm~500nm；所述纳米柱的高度为200~1000nm，其宽度为100~500nm。
进一步地，所述疏水层的厚度小于所述纳米柱的厚度。
进一步地，所述的显示面板还包括：亲水层，设于所述疏水层上，且靠近所述疏水层边缘处；疏水区，与所述亲水层同层设置，且靠近所述亲水层边缘处；电润湿疏水介质，设于所述疏水区；液体层，覆于所述亲水层、所述疏水区、所述电润湿疏水介质及所述介电层上；第二电极，设于所述液体层远离所述第一基板一侧的表面；以及第二基板，设于所述第二电极远离所述第一基板一侧的表面。
进一步地，当所述第一电极和所述第二电极施加的电压大于零时，所述电润湿疏水介质呈收敛状态，且收敛于所述疏水区的上表面；当所述第一电极和所述第二电极施加的电压等于零时，所述电润湿疏水介质呈现展开的状态，且将所述疏水层和所述超表面结构完全覆盖。
为实现上述目的，本发明还提供一种显示面板的制备方法，包括如下步骤：
形成一电致变色层；以及形成一电润湿结构于所述电致变色层上方；所述形成一电润湿结构于所述电致变色层上方的步骤中，形成一超表面结构于所述电润湿结构内；其中，当所述电致变色层全部关闭时，所述超表面结构搭配所述电润湿结构用以反射对应波长的光，形成反射态；当所述电致变色层部分关闭时，对应关闭的电致变色层的部分，所述超表面结构搭配电润湿结构反射对应波长的光，形成反射态，对应未关闭的电致变色层的部分，光线透过所述被润湿的超表面结构和电致变色层，形成透明态。
进一步地，在形成所述超表面结构步骤中，还包括：形成一衬底层于所述电致变色层上方；形成一第一氧化硅层于所述衬底层上；形成一氧化钛层于所述第一氧化硅层上；形成一第二氧化硅层于所述氧化钛层上；以及
采用电子束光光刻工艺及等离子工艺对所述第一氧化硅层、所述氧化钛层及所述第二氧化硅层进行刻蚀处理，形成间隔设置的多个纳米柱。
 有益效果
本发明的技术效果在于，提供一种显示面板及其制备方法，利用电润湿结构与超表面结构的结合，实现反射及半透半反两种显示状态，所述超表面结构的色彩饱和度较高，兼容电润湿结构的电润湿技术也可以实现快的响应时间及低能耗。所述显示面板的整体架构简单，响应速度快，且不需要偏光片，光利用率高，穿过所述超表面结构的光反射效率高达70~80%，可以显著降低显示能耗。
 附图说明
下面结合附图，通过对本申请的具体实施方式详细描述，将使本申请的技术方案及其它有益效果显而易见。
图1为本实施例所述显示面板的全反射状态的结构示意图。
图2为所述超表面结构的结构示意图。
图3为所述超表面结构与所述疏水层的放大图。
图4为本实施例所述显示面板的半透半反状态的结构示意图。
图5为本实施例所述电致变色层在全反射状态下的结构示意图。
图6为本实施例所述电致变色层在半透半反状态下的结构示意图。
图7为本实施例所述显示面板制备方法的流程图。
图8为本实施例所述超表面结构的制备的流程图。
附图中部件标识如下：
1第一基板；                   2电致变色层；
3第一电极；                   4介电层；
5超表面结构；                 6疏水层；
7亲水层；                     8疏水区；
9电润湿疏水介质；             10液体层；
11第二电极；                  12第二基板；
51衬底层；                    52纳米柱；
521第一氧化硅层；             522氧化钛层；
523第二氧化硅层；             100电润湿结构。
 本发明的实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开，下文中对特定例子的部件和设置进行描述。当然，它们仅仅为示例，并且目的不在于限制本申请。此外，本申请可以在不同例子中重复参考数字和/或参考字母，这种重复是为了简化和清楚的目的，其本身不指示所讨论各种实施方式和/或设置之间的关系。此外，本申请提供了的各种特定的工艺和材料的例子，但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。
随着技术的发展，反射式的显示器在此方面的优势便十分显著，反射式对外界光的利用，可以降低能耗的问题，色彩方面及相应速度方面都有很大的发展空间，是未来绿色显示的发展方向之一。
本实施例提供一种显示面板及其制备方法，所述显示面板可以实现全反射及半透半反两种显示状态，其中，全反射显示面板可以实现正常反射显示及彩色显示；半透半反显示面板主要利用微结构的超表面结构（Metasurfaces）来构建全彩反射显示，然后再通过超表面结构与电润湿技术的结合，使得显示面板实现透明态的显示。以下分别以显示面板及其制备方法展开说明。
如图1或4所示，本实施例提供一种显示面板，包括第一基板1、电致变色层2、第一电极3、介电层4、超表面结构5、疏水层6、亲水层7、疏水区8、电润湿疏水介质9、液体层10、第二电极11以及第二基板12。
电致变色层2设于第一基板1的上表面。电致变色层2在电压控制下可变为透明颜色，用以控制显示面板在反射状态时的灰度控制。电致变色层2由不同的像素由单独的电极控制。
第一电极3设于电致变色层2的上表面。第一电极3为透明电极，其材质包括氧化铟锡（ITO）、石墨烯等。
本实施例中，电润湿结构100包括介电层4，设于第一电极3及部分电致变色层2的上表面。介电层4的材质包括氧化硅、氮化硅的至少一种。
超表面结构5覆于所述电致变色层的上方且设于介电层4上表面。超表面在环境光的照射下，不同的结构可以显示不同的颜色，且可以达到较高的颜色纯度。超表面结构5可以反射特定波长的结构，分别反射红色子像素（R）或绿色子像素（G）或蓝色子像素（B），即做RGB 使用，是结构色的一种机制。本实施例中，RGB可以分开显示，也可以叠层显示，在此不做限定。
如图2所示，超表面结构5包括衬底层51以及纳米柱52。衬底层51设于介电层4上表面。多个纳米柱52间隔设置于衬底层51上表面。相邻的两个纳米柱52的之间的间隙为100nm~500nm；纳米柱52的高度为200~1000nm，其宽度为100~500nm。其中，显示面板的红绿蓝（RGB）三色的宽度整体趋势， R> G> B。
每一纳米柱52包括第一氧化硅层521、氧化钛层522以及第二氧化硅层523。第一氧化硅层521设于衬底层51上表面；氧化钛层522设于第一氧化硅层521上表面； 第二氧化硅层523设于氧化钛层522上表面。
如图3所示，本实施例中，电润湿结构100包括和疏水层6，覆于超表面结构5的上表面，疏水层6的厚度小于纳米柱52的厚度，疏水层6的折射率小于1.3，疏水层6的厚度为50~300nm，疏水层6的常规材质可以为二氯对二甲苯二聚体（Parylene C）、Teflon AF、非结晶氟化聚合物（CYPOT）中的至少一种。本实施例中，疏水层6的材质优选为AE2400，AE2400的折射率为1.29，AF2400是有聚四氟乙烯和2，2-二氟代甲基-4，5二氟1，3-环氧聚合物按85：15的摩尔量制备的无规共聚物。疏水层6的形成是由AE2400对超表面结构5的表面处理形成的。
亲水层7设于疏水层6的上表面，且靠近疏水层6的边缘处。
疏水区8与亲水层7同层设置，且靠近亲水层7的边缘处。
疏水区8具有电润湿疏水介质9，呈水滴状。电润湿疏水介质9的折射率大于1.4，其材质满足疏水特性，透明度高，可以选取硅油等稳定性高的液体材料。当超表面结构5浸润在折射率大于1.4的环境中，超表面结构5对颜色的反射效果消失，光线全部透射，显示面板变为透明状态。电润湿疏水介质9可以实现展开和收敛的状态。
液体层10覆于亲水层7、疏水区8、电润湿疏水介质9及介电层4的上表面。该液体层10优选为水，是显示面板的盒厚。其中，电润湿疏水介质9在展开后可以完全浸没超表面结构5，电润湿疏水介质9的不需要过多的用量，故而液体层10的厚度不用做太厚，依据显示面板的像素大小设计在0.3~10um之间。
第二电极11设于液体层10的上表面。第二电极11为透明电极，其材质包括氧化铟锡（ITO）、石墨烯等。
第二基板12设于第二电极11的上表面，主要控制颜色的灰度及是否转换为透明态。颜色的灰度指的是显示颜色的面积及颜色对比度。
本实施例中，通过第一基板1侧的第一电极3与第二基板12侧的第二电极11共同控制高折射率液体的展开与收敛，主要是控制电润湿疏水介质9的展开与收敛。液体层10的厚度优选2~100um，该设置受像素结构的大小影响，若像素结构偏大，则电润湿疏水介质9收敛后，液体层10需要适当增高。通过在第一基板1与第二基板之间设置多个间隔设置的支撑结构，以使得液体层10增高。该支撑结构可以为支撑柱（Photo Spacer，PS）。
如图1所示，在工作中，当显示面板的第一电极3和第二电极11施加的电压大于零时，电润湿疏水介质9呈收敛状态，且收敛于疏水区8的上表面。
如图4所示，当第一电极3和第二电极11施加的电压等于零时，电润湿疏水介质9呈现展开的状态，且将疏水层6和超表面结构5完全覆盖。
本实施例中，亲水层7的作用是在电压驱动时，利用电润湿技术使得水可以尽快的接触到下表面，加快电润湿疏水介质9的收敛；疏水区8的作用是为了让电润湿疏水介质9可以稳定的位于固定的位置，也可加速电润湿疏水介质9的收敛。
本实施例提供一种显示面板，电致变色层关闭时，电致变色层显示为黑色不透光状态，会吸收掉照射至其表面的光；电致变色层开启时，透明态，光可以自由通过。电润湿疏水介质在收敛时，所述超表面结构反射特定波长的光，其余光透射，遇到所述电致发光层黑色时则被其吸收，未遇到则从另一面直接投射出来；电润湿疏水介质铺展开时，接触到超表面结构，会将其表面淹没，其淹没部分的反射效果消失，所有的照射到其表面的光，全部透射，此情形下遇到电致变色层黑色时，就全被吸收了，电致变色层透明态时，则全部透过，从另一面可以全部出射，即透明态了。本发明中为了达成较好的对比度效果，在现实正常反射画面的部分，其对应的pixel区域都是关闭的，即单一像素点内电致变色不是开启就是关闭状态。
所述显示面板的显示状态被分为全反射状态和半透半反状态。以下将以RGB空间分立显示为例介绍：
当所述电致变色层全部关闭时，所述超表面结构搭配所述电润湿结构用以反射对应波长的光，形成反射态。在全反射状态下，所述电致变色层全部关闭时，所述超表面结构用以反射对应波长的光，显示为黑色不透光状态，此时，所述超表面结构可以进行彩色反射显示。
所述电致变色层部分关闭时，对应关闭的电致变色层的部分，所述超表面结构搭配电润湿结构反射对应波长的光，形成反射态，对应未关闭的电致变色层的部分，光线透过所述被润湿的超表面结构和电致变色层，形成透明态。具体的，在设置画面显示区域对应的电致变色层全部关闭并正常的反射，实现显示效果；在设置非画面区域对应的电致变色层全部为开态并不反射。另外，当所述电润湿疏水介质的作用是，在显示画面区，其通过控制润湿区域的大小调控超表面反射光的强度；在非显示画面区，其处于全像素点润湿状态，搭配透明态的电致变色层，光线全部透过，不发生反射或吸收。总的来说，综合画面显示效果即非画面区域为透明状态，画面区域为显示状态。
以下以两个子像素为例对全反射状态和半透半反状态进行阐述。
如图5所示，在全反射状态下，所述电致变色层全部关闭，电致变色层2呈黑色，不能透光和反射光。因此，当光线照射在子像素R、G上，对应波长的光线完全被反射出来，子像素可以通过润湿态控制反射光的多少来控制显示面板的灰阶显示。
如图6所示，在半透半反状态下，以G子像素代表正常显示区域，该区域对应的电致变色层关闭，呈黑色。而R子像素对应的电致变色层为开态，呈现透明态，同时所述超表面结构上的所述电润湿疏水介质也处于展开状态，所述超表面结构浸润在所述湿疏水介质中，对光的指定波长反射效果消失，呈现透明状态，因而整个区域呈现出透明的状态。
本实施例提供一种显示面板，利用超表面结构来构建全彩反射显示，然后通过超表面结构与电润湿疏水介质结合，实现反射及半透半反两种显示状态，其中超表面结构的色彩饱和度较高，兼容电润湿技术也可以实现快的响应时间及低能耗。所述显示面板的整体架构简单，响应速度快，且不需要偏光片，光利用效率高，超表面的光反射效率高达70~80%，可以显著降低显示能耗。
如图7所示，本实施例还提供一种显示面板的制备方法，包括如下步骤S1）~S11）。
S1）设置一第一基板。
S2）形成一电致变色层。在所述第一基板上表面形成一电致变色层，所述电致变色层在电压控制下可变为透明颜色，用以控制显示面板在反射状态时的灰度控制。电致变色层由不同的像素由单独的电极控制。
S3）形成第一电极于所述电致变色层上表面。所述第一电极为透明电极，其材质包括氧化铟锡（ITO）、石墨烯等。
S4）形成介电层于所述第一电极的上面。所述介电层的材质包括氧化硅、氮化硅的至少一种。
S5）形成一超表面结构于所述电致变色层上方。
如图8所示，在所述超表面结构形成步骤中，还包括如下步骤：
S51）形成一衬底层于所述介电层上表面。
S52）形成一第一氧化硅层于所述衬底层上表面。
S53）形成一氧化钛层于所述第一氧化硅层上表面。
S54）形成一第二氧化硅层于所述氧化钛层上表面。
S55）采用电子束光光刻工艺及等离子工艺对所述第一氧化硅层、所述氧化钛层及所述第二氧化硅层进行刻蚀处理，形成间隔设置的多个纳米柱。相邻的两个纳米柱的之间的间隙为100nm~500nm。所述纳米柱的高度为200~1000nm，其宽度为100~500nm。其中，显示面板的红绿蓝（RGB）三色的宽度整体趋势， R> G> B。
本实施例中，所述超表面在环境光的照射下，不同的结构可以显示不同的颜色，且可以达到较高的颜色纯度。所述超表面结构可以反射特定波长的结构，分别反射红色子像素（R）或绿色子像素（G）或蓝色子像素（B），即做RGB 使用，是结构色的一种机制。本实施例中，RGB可以分开显示，也可以叠层显示，在此不做限定。
S6）形成一疏水层于所述超表面结构上。具体地，所述疏水层的厚度小于所述纳米柱的厚度，疏水层6的折射率小于1.3，疏水层6的厚度为50~300nm，疏水层6的常规材质可以为二氯对二甲苯二聚体（Parylene C）、Teflon AF、非结晶氟化聚合物（CYPOT）中的至少一种。本实施例中，疏水层6的材质优选为AE2400，AE2400的折射率为1.29，AF2400是有聚四氟乙烯和2，2-二氟代甲基-4，5二氟1，3-环氧聚合物按85：15的摩尔量制备的无规共聚物。疏水层6的形成是由AE2400对超表面结构5的表面处理形成的。
S7）制备一疏水区于所述超表面结构上，所述疏水区与所述亲水层同层设置，且靠近所述亲水层的边缘处。
S8）将电润湿疏水介质设于疏水区。所述电润湿疏水介质呈水滴状。所述电润湿疏水介质的折射率大于1.4，其材质满足疏水特性，透明度高，可以选取硅油等稳定性高的液体材料。当所述超表面结构浸润在折射率大于1.4的环境中，所述超表面结构对颜色的反射效果消失，光线全部透射，显示面板变为透明状态。所述电润湿疏水介质可以实现展开和收敛的状态。
S9）设置一第二基板。
S10）制备一第二电极于所述第二基板上。所述第二电极为透明电极，其材质包括氧化铟锡（ITO）、石墨烯等。
S11）将所述第二基板与所述第一基板进行对盒处理。将所述第二基板翻转，与所述第一基板进行对位贴合处理后，所述第一基板与所述第二基板形成一空腔，并向所述空腔内注入液体，形成液体层，使得所述液体层覆于所述亲水层、所述疏水区、所述电润湿疏水介质及所述介电层的上表面。该液体层优选为水，是显示面板的盒厚。其中，所述电润湿疏水介质在展开后可以完全浸没所述超表面结构，所述电润湿疏水介质的不需要过多的用量，故而所述液体层的厚度不用做太厚，依据显示面板的像素大小设计在0.3~10um之间。
本实施例中，所述第一基板主要控制颜色的灰度及是否转换为透明态。颜色的灰度指的是显示颜色的面积及颜色对比度。
由上述方法制成的显示面板的显示状态被分为全反射状态和半透半反状态。以下将以RGB空间分立显示为例介绍：
在全反射状态下，当所述电致变色层全部关闭时，所述超表面结构用以反射对应波长的光，显示为黑色不透光状态，此时，所述超表面结构可以进行彩色反射显示。
当所述电致变色层全部关闭时，所述超表面结构搭配所述电润湿结构用以反射对应波长的光，形成反射态。在全反射状态下，所述电致变色层全部关闭时，所述超表面结构用以反射对应波长的光，显示为黑色不透光状态，此时，所述超表面结构可以进行彩色反射显示。
所述电致变色层部分关闭时，对应关闭的电致变色层的部分，所述超表面结构搭配电润湿结构反射对应波长的光，形成反射态，对应未关闭的电致变色层的部分，光线透过所述被润湿的超表面结构和电致变色层，形成透明态。具体的，在设置画面显示区域对应的电致变色层全部关闭并正常的反射，实现显示效果；在设置非画面区域对应的电致变色层全部为开态并不反射。另外，当所述电润湿疏水介质的作用是，在显示画面区，其通过控制润湿区域的大小调控超表面反射光的强度；在非显示画面区，其处于全像素点润湿状态，搭配透明态的电致变色层，光线全部透过，不发生反射或吸收。总的来说，综合画面显示效果即非画面区域为透明状态，画面区域为显示状态。
在上述实施例中，对各个实施例的描述都各有侧重，某个实施例中没有详述的部分，可以参见其他实施例的相关描述。
以上对本申请实施例所提供的一种显示面板及其制备方法进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (10)

  1. 一种显示面板，其包括：
    电致变色层；
    电润湿结构，设于所述电致变色层的一侧；以及
    超表面结构，设于所述电润湿结构内；
    当所述电致变色层全部关闭时，所述超表面结构搭配所述电润湿结构用以反射对应波长的光，形成反射态；
    当所述电致变色层部分关闭时，对应关闭的电致变色层的部分，所述超表面结构搭配电润湿结构反射对应波长的光，形成反射态，对应未关闭的电致变色层的部分，光线透过所述被润湿的超表面结构和电致变色层，形成透明态。
  2. 如权利要求1所述的显示面板，其中，还包括：
    第一基板，设于所述电致变色层远离所述超表面结构的一侧；
    第一电极，设于所述电致变色层上。
  3. 如权利要求2所述的显示面板，其中，
    所述电润湿结构包括：
    介电层，覆于所述电致变色层及所述第一电极上；以及
    疏水层，设于所述介电层的上方；
    其中，所述超表面结构设于所述介电层及所述疏水层之间。
  4. 如权利要求1所述的显示面板，其中，
    所述超表面结构包括：
    衬底层，设于所述介电层上；以及
    多个纳米柱，间隔设置于所述衬底层上；
    其中，一纳米柱包括
    第一氧化硅层，设于所述衬底层上；
    氧化钛层，设于所述第一氧化硅层上；以及
    第二氧化硅层，设于所述氧化钛层上。
  5. 如权利要求4所述的显示面板，其中，
    相邻的两个纳米柱的之间的间隙为100nm~500nm；
    所述纳米柱的高度为200~1000nm，其宽度为100~500nm。
  6. 如权利要求4所述的显示面板，其中，
    所述疏水层的厚度小于所述纳米柱的厚度。
  7. 如权利要求3所述的显示面板，其中，还包括：
    亲水层，设于所述疏水层上，且靠近所述疏水层边缘处；
    疏水区，与所述亲水层同层设置，且靠近所述亲水层边缘处；
    电润湿疏水介质，设于所述疏水区；
    液体层，覆于所述亲水层、所述疏水区、所述电润湿疏水介质及所述介电层上；
    第二电极，设于所述液体层远离所述第一基板一侧的表面；以及
    第二基板，设于所述第二电极远离所述第一基板一侧的表面。
  8. 如权利要求7所述的显示面板，其中，
    当所述第一电极和所述第二电极施加的电压大于零时，所述电润湿疏水介质呈收敛状态，且收敛于所述疏水区的上表面；
    当所述第一电极和所述第二电极施加的电压等于零时，所述电润湿疏水介质呈现展开的状态，且将所述疏水层和所述超表面结构完全覆盖。
  9. 一种显示面板的制备方法，其中，包括如下步骤：
    形成一电致变色层；以及
    形成一电润湿结构于所述电致变色层上方；
    所述形成一电润湿结构于所述电致变色层上方的步骤中，
    形成一超表面结构于所述电润湿结构内；
    其中，当所述电致变色层全部关闭时，所述超表面结构搭配所述电润湿结构用以反射对应波长的光，形成反射态；
    当所述电致变色层部分关闭时，对应关闭的电致变色层的部分，所述超表面结构搭配电润湿结构反射对应波长的光，形成反射态，对应未关闭的电致变色层的部分，光线透过所述被润湿的超表面结构和电致变色层，形成透明态。
  10. 如权利要求9所述的显示面板的制备方法，其中，
    在形成所述超表面结构步骤中，还包括：
    形成一衬底层于所述电致变色层上方；
    形成一第一氧化硅层于所述衬底层上；
    形成一氧化钛层于所述第一氧化硅层上；
    形成一第二氧化硅层于所述氧化钛层上；以及
    采用电子束光光刻工艺及等离子工艺对所述第一氧化硅层、所述氧化钛层及所述第二氧化硅层进行刻蚀处理，形成间隔设置的多个纳米柱。
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