WO2021190250A1

WO2021190250A1 - Electrochemical deposition device

Info

Publication number: WO2021190250A1
Application number: PCT/CN2021/078513
Authority: WO
Inventors: 张国才; 曹占锋; 闫俊伟; 麦轩伟; 王大军; 王宏; 董士豪
Original assignee: 京东方科技集团股份有限公司
Priority date: 2020-03-27
Filing date: 2021-03-01
Publication date: 2021-09-30
Also published as: CN111254479A

Abstract

An electrochemical deposition device, comprising: a first tank body (10), the first tank body (10) being used for performing electrochemical deposition, an anode (101) and a cathode (102) which are provided oppositely to each other at intervals being provided in the first tank body (10), and a spacing between the anode (101) and the cathode (102) being capable of being adjusted; a second tank body (11), the second tank body (11) being connected to the first tank body (10), a solution in the first tank body (10) being capable of flowing into the second tank body (11), the second tank body (11) comprising a solution outlet, and the solution outlet being capable of being connected to a filter used for filtering the solution; and a flow jetting system (12), the flow jetting system (12) comprising a solution inlet end and a solution outlet end, the solution inlet end being connected to the filter, and the solution outlet end being provided in the first tank body (10).

Description

Electrochemical deposition device

Cross-references to related applications

The present disclosure claims the priority of a Chinese patent application filed with the Chinese Patent Office with an application number of 202010231379.2 and titled "An Electrochemical Deposition Device" on March 27, 2020, the entire content of which is incorporated into the present disclosure by reference.

Technical field

The present disclosure relates to the field of electrochemical technology, in particular to an electrochemical deposition device.

Background technique

Electrochemical deposition refers to the technology of forming a coating by the current passing through the migration of positive and negative ions in the electrolyte solution and the redox reaction of gain and loss of electrons on the electrode under the action of an external electric field. Due to the advantages of simple processing equipment and low process cost, electrochemical deposition tools are widely used to form coatings and their laminates.

Overview

The embodiment of the present disclosure provides an electrochemical deposition device.

The embodiment of the present disclosure discloses an electrochemical deposition device, including:

A first tank body, the first tank body is used for electrochemical deposition, the first tank body is provided with an anode and a cathode spaced apart, and the distance between the anode and the cathode is adjustable;

The second tank body, the second tank body is connected with the first tank body, the solution in the first tank body can flow into the second tank body, the second tank body includes a liquid outlet, the The liquid outlet can be connected with a filter for filtering the solution; and

A jet stream system, the jet stream system includes a liquid inlet end and a liquid outlet end, the liquid inlet end is connected to the filter, and the liquid outlet end is arranged in the first tank.

Optionally, the electrochemical deposition apparatus further includes a bracket, the bracket is movably connected to the first tank body, and the cathode is connected to the bracket.

Optionally, the electrochemical deposition apparatus further includes: a driving device fixed to the first tank, the driving device is connected to the bracket, and the driving device is used to drive the bracket to move in a first direction , Wherein the cathode is an elongated cathode, and the first direction is parallel to the length direction of the cathode.

Optionally, the driving device includes: a motor, a rotating disk, and a connecting rod; wherein,

The motor is fixed outside the first tank, the output end of the motor is connected to the rotating disk, and the motor is used to drive the rotating disk to rotate;

One end of the connecting rod is hinged to the rotating disk, and the other end is hinged to the bracket. The rotation of the rotating disk drives the connecting rod to rotate, and the rotation of the connecting rod drives the bracket in the first direction. move.

Optionally, an adjustment rod is provided on the support, the cathode is slidably connected to the adjustment rod, and the cathode slides along the length of the adjustment rod to adjust the distance between the anode and the cathode .

Optionally, the first tank is further provided with a plate rack for loading samples, and the plate rack is fixedly connected with the cathode.

Optionally, the electrochemical deposition apparatus further includes: a shielding plate, the shielding plate is fixed in the first tank and located between the cathode and the anode, the shielding plate is provided with a plurality of communication hole.

Optionally, the jet flow system includes: a jet flow pipeline, a jet flow pump and a jet flow tube; wherein,

The jet flow pipeline is respectively connected with the filter and the jet flow tube for solution flow;

The jet flow pump is connected to the jet flow pipeline and is used to drive the solution in the jet flow pipeline to flow to the jet flow tube;

The jet pipe is arranged between the cathode and the anode.

Optionally, the jet flow system is further provided with an electronic flow meter, and the electronic flow meter is used to control the jet flow velocity of the jet tube.

Optionally, a partition is provided between the first tank and the second tank, and an overflow port is provided on the top of the partition, and the solution in the first tank can pass through the overflow The mouth flows into the second tank body.

Optionally, the liquid outlet is arranged at the bottom of the second tank; or, the liquid outlet is arranged on the side wall of the second tank at a position close to the bottom.

Optionally, a titanium basket is arranged in the first tank, and the titanium basket is hung on the anode.

Optionally, the filter is a filter sleeve, and the filter sleeve is arranged outside the liquid outlet of the second tank body.

Optionally, a thermometer and a heating device are provided in the second tank, the thermometer is used to detect the temperature of the solution in the second tank, and the heating device is used to heat the solution.

Optionally, the heating device is a heating tube or a heating resistor.

Optionally, a pH detector is further provided in the second tank, and the pH detector is used to detect the pH of the solution in the second tank.

The above description is only an overview of the technical solutions of the present disclosure. In order to understand the technical means of the present disclosure more clearly, they can be implemented in accordance with the content of the specification, and in order to make the above and other objectives, features and advantages of the present disclosure more obvious and easy to understand. In the following, specific embodiments of the present disclosure are specifically cited.

Brief description of the drawings

In order to more clearly describe the technical solutions in the embodiments of the present disclosure or related technologies, the following will briefly introduce the drawings that need to be used in the description of the embodiments or related technologies. Obviously, the drawings in the following description are of the present invention. For some of the disclosed embodiments, those of ordinary skill in the art can obtain other drawings based on these drawings without creative work.

FIG. 1 is a schematic diagram of the forward structure of an electrochemical deposition apparatus of the present disclosure; and

FIG. 2 is a schematic top view of the structure of the electrochemical deposition apparatus shown in FIG. 1.

A detailed description

In order to make the above objectives, features and advantages of the present disclosure more obvious and understandable, the present disclosure will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present disclosure.

The embodiments of the present disclosure provide an electrochemical deposition device, which can be used for the deposition of metals such as copper, nickel, cadmium, etc., to form a metal coating on the surface of a sample.

1, there is shown a schematic diagram of the forward structure of an electrochemical deposition device of the present disclosure, and FIG. 2 shows a schematic diagram of the top structure of the electrochemical deposition device shown in FIG. 1, and the electrochemical deposition device may specifically include:

The first tank body 10, the first tank body 10 can be used for electrochemical deposition, the first tank body 10 is provided with an anode 101 and a cathode 102 which are arranged at intervals, and the distance between the anode 101 and the cathode 102 can be adjusted;

The second tank body 11, the second tank body 11 is connected with the first tank body 10, the solution in the first tank body 10 can flow into the second tank body 11, the second tank body 11 includes a liquid outlet, the liquid outlet A filter (not shown in the figure) for filtering the solution can be connected; and

The jet flow system 12 includes a liquid inlet end and a liquid outlet end, the liquid inlet end is connected with the filter, and the liquid outlet end is arranged in the first tank body 10.

In the embodiment of the present disclosure, the first tank body 10 can be used as the main tank body of the electrochemical deposition device for electrochemical deposition of a sample to form a coating on the surface of the sample. The first tank body 10 may be provided with an anode 101 and a cathode 102 which are arranged relatively spaced apart. The distance between the anode 101 and the cathode 102 can be adjusted. In this way, during the electrochemical deposition of the sample, the anode 101 can be adjusted. The distance from the cathode 102 can make the temperature field distribution between the anode 101 and the cathode 102 in the first tank body 10 more uniform, so that the thickness uniformity of the coating can be improved.

Specifically, the first tank body 10 is also provided with a plate rack 103 for loading samples, and the plate rack 103 is fixedly connected with the cathode 102. In practical applications, a titanium basket may be arranged in the first tank body 10, and the titanium basket may be used to hang on the anode 101. When the power is on, the anode 101 can be dissolved to form metal ions and migrate to the cathode 102. On the surface of the sample, a coating film is formed on the surface of the sample.

In the embodiment of the present disclosure, since the distance between the anode 101 and the cathode 102 is adjustable, by adjusting the distance between the anode 101 and the cathode 102, the temperature field distribution between the anode 101 and the cathode 102 in the first tank body 10 can be made It is relatively uniform. In this way, the metal ions that migrate from the anode 101 to the cathode 102 can be made more uniform, and furthermore, the thickness uniformity of the coating film can be improved.

In the embodiment of the present disclosure, the second tank body 11 can be used as a sub-tank body of the electrochemical deposition device for purification and heating of the solution. Specifically, the second tank body 11 is connected to the first tank body 10, and the solution in the first tank body 10 can flow into the second tank body 11. Since the liquid outlet of the second tank body 11 is connected with a filter, the filter The filter can be used to filter the solution to filter out impurities in the solution to obtain a clean solution. Since the inlet end of the jet stream system 12 is connected to the filter, and the outlet end of the jet stream system is arranged in the first tank body 10, the jet stream system 12 can be used to deliver the filtered solution to the first tank. Inside the tank body 10, the filtered clean solution can be electrochemically deposited again. That is, the solution purification effect of the electrochemical deposition device is better, and furthermore, the quality of the coating film can be improved.

Specifically, a partition 13 is provided between the first tank body 10 and the second tank body 11, and an overflow port is provided on the top of the partition board 13 through which the solution in the first tank body 10 can flow to Inside the second tank body 12.

In practical applications, a partition 13 can be arranged in a large tank, and the first tank 10 and the second tank 11 are formed on both sides of the partition 13 by using the separate function of the partition 13. In addition, an overflow port penetrating through the divider 13 may be provided on the divider 13, and the first tank body 10 and the second tank body 11 may be connected through the overflow port, so that the first tank body can be connected The solution in 10 can flow into the second tank 11 through the overflow port.

For example, the overflow port may be arranged at the top of the partition plate 13, so that when the height of the solution in the first tank body 10 rises to the overflow port, the solution in the first tank body 10 can be automatically It flows into the second tank body 11 from the overflow port to avoid leakage of the solution in the first tank body 10, so as to reduce the waste of solution and improve the operational safety of electrochemical deposition.

It is understandable that, in practical applications, those skilled in the art can also set the overflow port at any position on the partition 13 according to actual needs. The embodiment of the present disclosure has the effect that the overflow port is on the partition 13 The specific location of the site is not limited.

In the embodiment of the present disclosure, the liquid outlet of the second tank body 11 may be arranged at the bottom of the tank or on the side wall near the bottom, so that the solution in the second tank body 11 can fully flow out of the liquid outlet.

Optionally, the filter is a filter sleeve, and the filter sleeve may be arranged outside the liquid outlet of the second tank 11, so that when the solution in the second tank 11 flows out from the liquid outlet, Can enter the filter jacket for filtering.

Of course, those skilled in the art can also select devices such as filters, filter screens, etc. as the filtering device of the present disclosure according to actual needs, and the embodiments of the present disclosure may not limit the specific content of the filtering device.

Optionally, the second tank body 11 is provided with a thermometer 111 and a heating device 112, the thermometer 111 may be used to detect the temperature of the solution in the second tank body 11, and the heating device 112 may be used to heat the solution.

In practical applications, the heating device 112 can be electrically connected to the thermometer 111. When the thermometer 111 detects that the temperature of the solution in the second tank 11 is lower than the temperature required for electrochemical deposition, the heating device 112 can be used to heat the Solution to increase the temperature of the solution to the temperature required for electrochemical deposition to improve the quality of the coating.

Specifically, the heating device 112 may be a heating tube, a heating resistor, etc., and the specific content of the heating device 112 may not be limited in the embodiment of the present disclosure.

Optionally, a pH detector 113 is also provided in the second tank 11, and the pH detector 113 can be used to detect the pH of the solution in the second tank 11. In practical applications, the pH detector 113 can be used to monitor the pH of the solution in the second tank 11 in real time. When the pH of the solution does not meet the pH required for electrochemical deposition, the pH of the solution can be adjusted. , Until the pH of the solution meets the pH required for electrochemical deposition, so as to improve the quality of the coating.

In the embodiment of the present disclosure, the electrochemical deposition apparatus may further include a support 14, the support 14 is movably connected to the first tank body 10, and the cathode 102 is connected to the support 14. Specifically, since the bracket 14 is movably connected to the first tank body 10, the bracket 14 can be moved on the first tank body 10. Since the cathode 102 is connected to the support 14, when the support 14 moves relative to the first tank body 10, the cathode 102 can be driven to move relative to the first tank body 10, so as to realize the position adjustment of the cathode 102 on the first tank body 10. . Since the sample to be electrochemically deposited is set on the cathode 102, the position of the sample can be adjusted by the movement of the cathode 102 on the first tank body 10. In this way, during the electrochemical deposition of the sample, The position of the sample can be adjusted by adjusting the position of the cathode 102 on the first tank body 10 to further increase the thickness uniformity of the coating.

In an optional embodiment of the present disclosure, the electrochemical deposition apparatus may further include: a driving device 15 fixed to the first tank body 10, the driving device 15 is connected to the bracket 14, and the driving device 15 may be used to drive the bracket 14 moves in a first direction, wherein the cathode 102 is a long strip cathode, and the first direction is parallel to the length direction of the cathode 102.

In practical applications, the shapes of the anode 101 and the cathode 102 can be elongated, the anode 101 can be fixed in the first tank body 10, and the cathode 101 can be connected to the support 14. Since the driving device 15 can drive the support 14 to move in the first direction, that is, the support 14 can be moved along the length of the cathode 102 under the drive of the driving device 15 to adjust the relative position of the cathode 102 and the anode 101 to The relative position of the cathode 102 and the anode 101 is suitable for electrochemical deposition of the sample on the cathode 101, which improves the efficiency of electrochemical deposition and the quality of electrochemical deposition.

Optionally, the driving device 15 may include: a motor 151, a rotating disk 152, and a connecting rod 153; wherein the motor 151 is fixed outside the first tank body 10, the output end of the motor 151 is connected to the rotating disk 152, and the motor 151 can be used for Drive the rotating disk 152 to rotate; one end of the connecting rod 153 is hinged with the rotating disk 152, and the other end is hinged with the bracket 14. The rotation of the rotating disk 152 drives the connecting rod 153 to rotate, and the rotation of the connecting rod 153 drives the bracket 14 to move in the first direction .

In practical applications, the hinged connection between the connecting rod 153 and the rotating disk 152 and the bracket 14 can make the rotating disk 152 and the connecting rod 153 form a crank connection mechanism. In this way, when the motor drives the rotating disk 152 to rotate, Through the transmission action of the crank connecting mechanism formed by the rotating disc 152 and the connecting rod 153, the power of the motor 151 can be transmitted to the bracket 14 to drive the bracket 14 to move in the first direction.

In the embodiment of the present disclosure, an adjusting rod 141 is provided on the bracket 14, and the cathode 102 is slidably connected to the adjusting rod 141. The sliding of the cathode 102 on the adjusting rod 141 can adjust the distance between the anode 101 and the cathode 102.

Specifically, the shapes of the anode 101 and the cathode 102 may be elongated, and the anode 101 and the cathode 102 may be arranged vertically or approximately vertically. The adjusting rod 141 may also be an elongated adjusting rod, and the length direction of the adjusting rod 141 may be a second direction, and the second direction may be perpendicular or approximately perpendicular to the length direction of the cathode 102.

In the embodiment of the present disclosure, the cathode 102 can slide along the length of the adjusting rod 141 to adjust the distance between the cathode 102 and the anode 101, so that the temperature field distribution between the anode 101 and the cathode 102 in the first tank body 10 is more uniform. In this way, the thickness uniformity of the plating film can be improved.

In an optional embodiment of the present disclosure, the electrochemical deposition apparatus may further include: a shielding plate 16 fixed in the first tank body 10 and located between the cathode 102 and the anode 101, and the shielding plate 16 A plurality of through holes are provided on the upper surface.

In practical applications, the shielding plate 16 can be used to shield the electric field between the cathode 102 and the anode 101, and the through hole on the shielding plate 16 can be used to pass the electric field. In this way, by adjusting the size and position of the through hole on the shielding plate 16, the electric field distribution between the cathode 102 and the anode 101 can be adjusted, so that the electric field between the cathode 102 and the anode 101 can be evenly distributed, and further, the coating can be further improved. The thickness uniformity.

In an optional embodiment of the present disclosure, the jet stream system 12 may include: a jet stream pipeline 121, a jet pump 122, and a jet stream pipe 123; wherein the jet stream pipeline 121 is connected to the filter and the spray pipe respectively. The jet pipe 123 is connected for solution flow; the jet pump 122 is connected with the jet pipe 121 to drive the solution in the jet pipe 121 to flow to the jet pipe 123; the jet pipe 123 is arranged at the cathode 102 and the anode Between 101.

Specifically, since the jet flow pipe 121 is connected to the filter and the jet pipe 123 respectively, the solution filtered by the filter can enter the jet flow pipe 121 and enter the jet flow through the jet pipe 121. Inside the tube 123. The jet pump 122 can be used to provide power to drive the solution in the jet pipe 121 to flow to the jet pipe 123. Since the jet tube 123 is arranged between the cathode 102 and the anode 101 in the first tank body 10, the solution flowing out of the jet tube 123 can be electrochemically deposited again.

In practical applications, the jet flow system 12 may also be provided with an electronic flow meter to control the jet flow velocity of the jet tube 123 through the electronic flow meter to further improve the effect of electrochemical deposition.

In summary, the electrochemical deposition apparatus described in the embodiments of the present disclosure may at least include the following advantages:

In the embodiments of the present disclosure, since the distance between the anode and the cathode is adjustable, by adjusting the distance between the anode and the cathode, the temperature field distribution between the anode and the cathode in the first tank can be made more uniform. Therefore, the metal ions that migrate from the anode to the cathode can be made more uniform, and furthermore, the thickness uniformity of the coating can be improved. Moreover, since the liquid outlet of the second tank body is connected with a filter, the filter can be used to filter the solution, filter out impurities in the solution, and obtain a clean solution. The jet flow system can be used to deliver the filtered solution into the first tank, so that the filtered clean solution can be electrochemically deposited again. That is, the solution purification effect of the electrochemical deposition device is better, and furthermore, the quality of the coating film can be improved.

The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments, and the same or similar parts between the various embodiments can be referred to each other.

Although the preferred embodiments of the embodiments of the present disclosure have been described, those skilled in the art can make additional changes and modifications to these embodiments once they learn the basic creative concept. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications falling within the scope of the embodiments of the present disclosure.

Finally, it should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply these entities. Or there is any such actual relationship or sequence between operations. Moreover, the terms "including", "including" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or terminal device including a series of elements not only includes those elements, but also includes those elements that are not explicitly listed. Other elements listed, or also include elements inherent to this process, method, article, or terminal device. If there are no more restrictions, the element defined by the sentence "including a..." does not exclude the existence of other same elements in the process, method, article, or terminal device that includes the element.

The electrochemical deposition device provided by the present disclosure is described in detail above, and specific examples are used in this article to illustrate the principles and implementations of the present disclosure. The description of the above examples is only used to help understand the method of the present disclosure. And its core ideas; at the same time, for those of ordinary skill in the art, according to the ideas of the present disclosure, there will be changes in the specific implementation and the scope of application. limits.

Claims

An electrochemical deposition device, which includes:

A first tank body, the first tank body is used for electrochemical deposition, the first tank body is provided with an anode and a cathode spaced apart, and the distance between the anode and the cathode is adjustable;

The second tank body, the second tank body is connected with the first tank body, the solution in the first tank body can flow into the second tank body, the second tank body includes a liquid outlet, the The liquid outlet can be connected with a filter for filtering the solution; and

A jet stream system, the jet stream system includes a liquid inlet end and a liquid outlet end, the liquid inlet end is connected to the filter, and the liquid outlet end is arranged in the first tank.
4. The electrochemical deposition apparatus according to claim 1, wherein the electrochemical deposition apparatus further comprises a bracket, the bracket is movably connected to the first tank body, and the cathode is connected to the bracket.
The electrochemical deposition apparatus according to claim 2, wherein the electrochemical deposition apparatus further comprises: a driving device fixed to the first tank, the driving device is connected to the bracket, and the driving device is used for The support is driven to move in a first direction, wherein the cathode is an elongated cathode, and the first direction is parallel to the length direction of the cathode.
The electrochemical deposition apparatus according to claim 3, wherein the driving device comprises: a motor, a rotating disk, and a connecting rod; wherein,

The motor is fixed outside the first tank, the output end of the motor is connected to the rotating disk, and the motor is used to drive the rotating disk to rotate;

One end of the connecting rod is hinged to the rotating disk, and the other end is hinged to the bracket. The rotation of the rotating disk drives the connecting rod to rotate, and the rotation of the connecting rod drives the bracket in the first direction. move.
The electrochemical deposition apparatus according to claim 2, wherein the bracket is provided with an adjustment rod, the cathode is slidably connected to the adjustment rod, and the cathode slides along the length of the adjustment rod to adjust the The distance between the anode and the cathode.
The electrochemical deposition apparatus according to claim 1, wherein the first tank is further provided with a plate rack for loading samples, and the plate rack is fixedly connected with the cathode.
The electrochemical deposition apparatus according to claim 1, wherein the electrochemical deposition apparatus further comprises: a shielding plate, the shielding plate being fixed in the first tank and located between the cathode and the anode, A plurality of through holes are provided on the shielding plate.
The electrochemical deposition apparatus according to claim 1, wherein the jet flow system comprises: a jet flow pipeline, a jet flow pump, and a jet flow tube; wherein,

The jet flow pipeline is respectively connected with the filter and the jet flow tube for solution flow;

The jet flow pump is connected to the jet flow pipeline and is used to drive the solution in the jet flow pipeline to flow to the jet flow tube;

The jet pipe is arranged between the cathode and the anode.
8. The electrochemical deposition apparatus according to claim 8, wherein the jet flow system is further provided with an electronic flow meter, and the electronic flow meter is used to control the jet flow velocity of the jet tube.
The electrochemical deposition apparatus according to claim 1, wherein a partition is provided between the first tank and the second tank, an overflow is provided on the top of the partition, and the first The solution in the tank can flow into the second tank through the overflow port.
The electrochemical deposition apparatus according to claim 1, wherein the liquid outlet is arranged at the bottom of the second tank; or, the liquid outlet is arranged on the side wall of the second tank close to The location of the bottom.
The electrochemical deposition apparatus according to claim 1, wherein a titanium basket is arranged in the first tank body, and the titanium basket is hung on the anode.
The electrochemical deposition device according to any one of claims 1 to 12, wherein the filter is a filter sleeve, and the filter sleeve is arranged outside the liquid outlet of the second tank body.
The electrochemical deposition apparatus according to any one of claims 1 to 12, wherein a thermometer and a heating device are provided in the second tank, and the thermometer is used to detect the temperature of the solution in the second tank, and the The heating device is used to heat the solution.
The electrochemical deposition apparatus according to claim 14, wherein the heating device is a heating tube or a heating resistor.
The electrochemical deposition apparatus according to any one of claims 1 to 12, wherein a pH detector is further provided in the second tank, and the pH detector is used to detect the pH of the solution in the second tank.