WO2021189601A1 - Panneau d'affichage déformable et son procédé de fabrication, et dispositif d'affichage - Google Patents

Panneau d'affichage déformable et son procédé de fabrication, et dispositif d'affichage Download PDF

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Publication number
WO2021189601A1
WO2021189601A1 PCT/CN2020/088672 CN2020088672W WO2021189601A1 WO 2021189601 A1 WO2021189601 A1 WO 2021189601A1 CN 2020088672 W CN2020088672 W CN 2020088672W WO 2021189601 A1 WO2021189601 A1 WO 2021189601A1
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WIPO (PCT)
Prior art keywords
layer
area
bridge
display area
display
Prior art date
Application number
PCT/CN2020/088672
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English (en)
Chinese (zh)
Inventor
王雷
Original Assignee
武汉华星光电半导体显示技术有限公司
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Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US16/964,213 priority Critical patent/US11061440B1/en
Publication of WO2021189601A1 publication Critical patent/WO2021189601A1/fr

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment

Definitions

  • This application relates to the technical field of display panels, and in particular to a deformable display panel, a manufacturing method thereof, and a display device.
  • OLED Organic Light-Emitting Diode
  • Stretchable OLED display panels have the characteristics of unchanged picture display effects after any deformation, and can be applied to specific display fields such as heterosexual displays and wearable devices, adding diversity and possibilities to the future display field.
  • An object of the present invention is to provide a method for manufacturing a deformable display panel, which can solve the problems that are not described in the prior art regarding the corresponding structure and process flow of the stretchable display panel.
  • the present invention provides a deformable display panel, including a plurality of display areas, pillar areas, bridge areas and opening areas, wherein the pillar area surrounds the display area, and the bridge area is provided in the Between the open area and the column area or between the open area; wherein the column area is provided with a spacer structure, and the spacer structure is spaced from the display area; the bridge area has a bridge structure , The bridge structure and the spacer structure are arranged at intervals; each display area has a display unit, and the deformable display panel further includes a signal line that passes through the pillar area from the bridge area and is connected to the display unit.
  • the display panel includes a substrate layer extending from the display area to the opening area; a stretchable substrate extending from the display area to the bridge area; a barrier layer , Arranged on the stretchable substrate, extending from the display area to the bridge area.
  • the display panel further includes a buffer layer provided on the barrier layer of the display area; an active layer provided on the buffer layer of the display area; first A gate insulating layer is provided on the buffer layer in the display area and covers the active layer; a first gate layer is provided on the first gate insulating layer in the display area; layer An interlayer dielectric layer is provided on the first gate insulating layer in the display area and covers the first gate layer; a through hole penetrates the interlayer dielectric layer and the first gate insulating layer
  • the signal line includes a source and drain layer, which is provided on the interlayer dielectric layer and in the through hole, and on the barrier layer of the pillar region and the bridge region.
  • the display panel further includes a flat layer, which is provided on the interlayer dielectric layer of the display area and the barrier layer of the bridge area, and covers the bridge.
  • the signal line of the area, in the display area, the flat layer has and has an opening corresponding to the source and drain layer;
  • the anode layer is provided on the surface of the flat layer in the display area And the signal line of the pillar region, and the anode layer extends into the opening to be connected to the source and drain electrodes;
  • a pixel definition layer is provided in the display region, the pillar region and the bridge Area on the flat layer and the anode layer; PS spacer layer, arranged on the pixel definition layer of the display area, the column area and the bridge area; OLED light emitting layer, arranged on the On the anode of the display area;
  • the signal line further includes a cathode layer, which is provided on the OLED light-emitting layer of the display area and the PS spacer of the bridge area; in the display area, the The buffer layer,
  • the source-drain layer and the anode layer of the pillar region are in an inverted trapezoid shape as a whole.
  • the present invention also provides a manufacturing method for preparing the deformable display panel of the present invention, which includes a plurality of display areas, pillar areas, bridge areas, and opening areas, wherein the pillar area Surrounding the display area, the bridge area is provided between the opening area and the column area or between the opening area;
  • the preparation method includes: preparing a display unit in the display area; preparing spacers Structure in the column area; preparing a bridge structure in the bridge area; wherein the spacers and the display area are spaced apart; the bridge structure and the spaced column structure are spaced apart; the deformable display panel It also includes a signal line that passes through the pillar area from the bridge area and is connected to the display unit.
  • the preparation method specifically includes the following steps: providing a substrate layer extending from the display area to the opening area; preparing a stretchable substrate extending from the display area To the open area; prepare a barrier layer on the stretchable substrate, extending from the display area to the open area; prepare a buffer layer on the barrier layer, extending from the display area to The opening area; preparing an active layer on the buffer layer of the display area; preparing a first gate insulating layer on the buffer layer and covering the active layer, the first gate An insulating layer extends from the display area to the opening area; preparing a first gate layer on the first gate insulating layer in the display area; preparing an interlayer dielectric layer on the gate insulating layer And cover the first gate layer, the interlayer dielectric layer extends from the display area to the opening area; the first gate in the pillar area, bridge area, and opening area is etched away An insulating layer, an interlayer dielectric layer, and a part of the first gate insulating layer and the interlayer dielectric
  • a flat layer can also be prepared on the column area, mainly to control the film layer stacking according to the subsequent disconnection of the cathode; the anode layer is prepared on the surface of the flat layer in the display area And on the source
  • the source and drain layers and the anode layer of the column region of the inverted trapezoidal shape can be finally formed.
  • This structure helps The subsequent cathode is disconnected here.
  • the cathode can be disconnected here and the spacer structure can also act as a barrier structure. Water and oxygen effect.
  • the open area can become larger or smaller, and when the open area becomes larger or smaller, the display area will rotate accordingly.
  • the material of the barrier layer is silicon oxide
  • the material of the first gate insulating layer is silicon oxide or silicon nitride
  • the material of the gate layer is molybdenum.
  • the material of the interlayer dielectric layer is silicon oxide and silicon nitride, wherein the silicon nitride in the interlayer dielectric layer can supplement hydrogen to fill the damage of the active layer by ELA in the previous process to adjust the electrical property.
  • the source and drain layers are made of titanium or aluminum
  • the flat layer and the pixel defining layer are made of photoresist.
  • the flat layer and the pixel are made of photoresist.
  • the material of the definition layer can also be an organic material that has high elasticity and matches the modulus of the source and drain layers.
  • the PS spacer and the pixel definition layer are prepared by using a halftone mask process, which can save costs.
  • the preparation method further includes preparing an OLED light-emitting layer on the anode of the display area; preparing a cathode layer on the OLED light-emitting layer and the bridge area of the display area On the PS compartment.
  • the present invention also provides a display device including the deformable display panel described in the present invention.
  • the beneficial effect of the present invention is that the present invention provides a deformable display panel, a manufacturing method thereof, and a display device, reveals the corresponding structure and process flow in the stretchable display panel, and fills the existing The lack of technology and high process feasibility facilitate the actual production of the factory.
  • FIG. 1 is a schematic cross-sectional structure diagram of a deformable display panel provided by an embodiment of the present invention
  • FIG. 2 is a schematic diagram of a top view structure of a deformable display panel provided by an embodiment of the present invention
  • FIG. 3 is a flowchart of a method for manufacturing a deformable display panel provided by an embodiment of the present invention
  • step S9 is a schematic structural diagram of the method for manufacturing a display panel provided by an embodiment of the present invention in step S9;
  • step S10 is a schematic diagram of the structure in step S10 of the method for manufacturing a display panel according to an embodiment of the present invention
  • step S11 is a schematic diagram of the structure in step S11 of the method for manufacturing a display panel according to an embodiment of the present invention
  • FIG. 7 is a schematic diagram of the structure in step S12 of the manufacturing method of the display panel provided by the embodiment of the present invention.
  • step S13 is a schematic diagram of the structure in step S13 of the method for manufacturing a display panel according to an embodiment of the present invention.
  • FIG. 9 is a schematic diagram of the structure in step S14 of the manufacturing method of the display panel provided by the embodiment of the present invention.
  • FIG. 10 is a schematic diagram of the structure in step S15 of the manufacturing method of the display panel provided by the embodiment of the present invention.
  • step S16 is a schematic diagram of the structure in step S16 of the method for manufacturing a display panel provided by an embodiment of the present invention.
  • FIG. 12 is a schematic diagram of the structure in step S17 of the method for manufacturing a display panel according to an embodiment of the present invention.
  • FIG. 13 is a schematic structural diagram at step S18 of the method for manufacturing a display panel according to an embodiment of the present invention.
  • FIG. 14 is a schematic diagram of the structure in step S19 of the method for manufacturing a display panel according to an embodiment of the present invention.
  • step S20 is a schematic diagram of the structure in step S20 of the method for manufacturing a display panel according to an embodiment of the present invention.
  • FIG. 16 is a schematic diagram of the structure in step S21 of the method for manufacturing a display panel provided by an embodiment of the present invention.
  • Bridge area -103 Opening area -104;
  • Buffer layer-113 Active layer-114;
  • Anode layer-119 Pixel definition layer-121;
  • first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of the features. In the description of the present application, “multiple” means two or more than two, unless otherwise specifically defined.
  • connection should be understood in a broad sense, unless otherwise clearly specified and limited.
  • it can be a fixed connection or a detachable connection.
  • Connected or integrally connected it can be mechanically connected, or electrically connected or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two components or the interaction of two components relation.
  • an intermediate medium it can be the internal communication of two components or the interaction of two components relation.
  • FIGS. 1 and 2 are respectively a cross-sectional structural diagram and a top structural diagram of the deformable display panel 100 provided in this embodiment.
  • the deformable display panel 100 includes a plurality of displays. Area 101, column area 102, bridge area 103 and opening area 104.
  • the pillar area 102 surrounds the display area 101, and the bridge area 103 is provided between the opening area 104 and the pillar area 102 or between the opening area 104.
  • the opening area 104 has an I-shape.
  • the column area 102 is provided with a spacer structure 120 which is spaced apart from the display area 101; the bridge region 103 has a bridge structure 130 which is spaced from the spacer structure 120; each display area 101 has a display unit 110.
  • the deformable display panel 100 further includes a signal line 140, which is connected to the display unit 110 from the bridge area 103 through the column area 102.
  • the display panel 100 includes a substrate layer 10, a stretchable substrate 111, a barrier layer 112, a buffer layer 113, an active layer 114, a first gate insulating layer 1151, a first gate layer 1161, an interlayer dielectric layer 117, a source and drain layer 141, a flat layer 118, an anode layer 119, a pixel definition layer 121, a PS spacer 122, an OLED light-emitting layer 123, and a cathode layer 142.
  • the substrate layer 10 extends from the display area 101 area to the opening area 104; the stretchable substrate 111 extends from the display area 101 area to the bridge area 103; the barrier layer 112 is arranged on the stretchable substrate 111 and extends from the display area.
  • the area 101 area extends to the bridge area 103.
  • the buffer layer 113 is arranged on the barrier layer 112 of the display area 101; the active layer 114 is arranged on the buffer layer 113 of the display area 101; the first gate insulating layer 1151 is arranged on the buffer layer 113 of the display area 101, And cover the active layer 114; the first gate layer 1161 is arranged on the first gate insulating layer 1151 of the display area 101; the second gate insulating layer 1152 is arranged on the first gate insulating layer 1151 of the display area 101 And cover the first gate layer 1161; the second gate layer 1162 is arranged on the second gate insulating layer 1152 of the display area 101; the interlayer dielectric layer 117 is arranged on the second gate insulating layer of the display area 101 On the layer 1152 and cover the second gate layer 1162; the through hole 1171 penetrates the interlayer dielectric layer 117, the first gate insulating layer 1151 and the second gate insulating layer 1152; the signal line 140 includes a source and drain layer 141, It is arranged on the interlayer
  • the flat layer 118 is disposed on the interlayer dielectric layer 117 of the display area 101 and the barrier layer 112 of the bridge area 103, and covers the signal line 140 of the bridge area 103. In the display area 101, the flat layer 118 has and has an opening.
  • the opening corresponds to the source and drain layer 141; the anode layer 119 is arranged on the surface of the flat layer 118 of the display area 101 and on the signal line 140 of the column area 102, and the anode layer 119 extends into the opening and is connected to the source and drain; pixel definition The layer 121 is arranged on the flat layer 118 of the display area 101, the pillar area 102 and the bridge area 103 and the anode layer 119; the PS spacer 122 is arranged on the pixel defining layer 121 of the display area 101, the pillar area 102 and the bridge area 103 On; the OLED light-emitting layer 123 is provided on the anode of the display area 101; the signal line 140 also includes a cathode layer 142, which is provided on the OLED light-emitting layer 123 of the display area 101 and the PS spacer 122 of the bridge area 103.
  • the pixel definition layer 121, the PS spacer layer 122, the OLED light-emitting layer 123 and the cathode layer 142 form the display unit 110; in the column area 102, the source and drain layer 141, the anode layer 119, the pixel definition layer 121 and the PS spacer layer 122 form spacer columns Structure 120;
  • the bridge area 103, the source and drain layer 141, the flat layer 118, the pixel definition layer 121, the PS spacer 122 and the cathode layer 142 form a bridge structure 130; the cathode layer 142 of the bridge area 103, the anode of the display area 101
  • the layers 119 are all connected to the anode layer 119 of the column region 102.
  • the source and drain layer 141 and the anode layer 119 of the pillar region 102 are in an inverted trapezoid shape as a whole. This structure helps the subsequent cathode to be disconnected here. By adjusting the height of the source-drain layer 141 and the anode layer 119 of the column region 102 and the inverted trapezoidal structure, the cathode can be disconnected here and the spacer structure 120 can also be separated. It can be used as a retaining wall structure to block water and oxygen.
  • This embodiment also provides a preparation method for preparing the deformable display panel 100 involved in this embodiment.
  • the deformable display panel 100 includes a plurality of display areas 101, column areas 102, bridge areas 103, and aperture areas 104. , Wherein the pillar area 102 surrounds the display area 101, and the bridge area 103 is provided between the opening area 104 and the pillar area 102 or between the opening area 104; the preparation method includes step S100-step S300. Please refer to FIG. 3.
  • FIG. 3 shows a flow chart of the method for manufacturing the deformable display panel provided by this embodiment.
  • Step S100 preparing the display unit 110 in the display area 101.
  • Step S200 preparing the spacer structure 120 in the column area 102.
  • Step S300 Prepare the bridge structure 130 in the bridge area 103.
  • the spacer structure 120 and the display area 101 are spaced apart; the bridge structure 130 is spaced from the spacer structure 120; the deformable display panel 100 further includes a signal line 140, which is connected to the display unit 110 from the bridge region 103 through the column region 102 .
  • the preparation method specifically includes the following steps:
  • Step S1 Provide a substrate layer 10 extending from the display area 101 area to the opening area 104.
  • Step S2 preparing a stretchable substrate 111, extending from the display area 101 to the opening area 104.
  • Step S3 preparing a barrier layer 112 on the stretchable substrate 111, extending from the display area 101 to the opening area 104; wherein the barrier layer 112 is made of silicon oxide.
  • Step S4 preparing a buffer layer 113 on the barrier layer 112, extending from the display area 101 to the opening area 104.
  • Step S5 preparing an active layer 114 on the buffer layer 113 of the display area 101;
  • Step S6 preparing a first gate insulating layer 1151 on the buffer layer 113 and covering the active layer 114.
  • the first gate insulating layer 1151 extends from the display area 101 to the opening area 104.
  • Step S7 Prepare a first gate layer 1161 on the first gate insulating layer 1151 of the display area 101; wherein the material of the first gate insulating layer 1151 is silicon oxide or silicon nitride, and the material of the first gate layer 1161 Use molybdenum metal.
  • Step S8 preparing a second gate insulating layer 1152 on the buffer layer 113 and covering the first gate layer 1161.
  • the second gate insulating layer 1152 extends from the display area 101 to the opening area 104.
  • Step S9 Prepare a second gate layer 1162 on the second gate insulating layer 1152 of the display area 101; please refer to FIG. 4, which shows a schematic diagram of the structure in step S9 of the method for manufacturing the display panel provided in this embodiment .
  • the material of the second gate insulating layer 1152 is silicon oxide or silicon nitride, and the material of the second gate layer 1162 is molybdenum.
  • Step S10 preparing an interlayer dielectric layer 117 on the gate insulating layer and covering the second gate layer 1162.
  • the interlayer dielectric layer 117 extends from the display area 101 to the opening area 104; please refer to FIG. 5, which is shown in FIG. A schematic diagram of the structure of the method for manufacturing a display panel provided in this embodiment in step S10.
  • the material of the interlayer dielectric layer 117 is silicon oxide and silicon nitride, and the silicon nitride in the interlayer dielectric layer 117 can supplement hydrogen to fill the damage of the active layer 114 to the active layer 114 and adjust the electrical property.
  • Step S11 etch away the first gate insulating layer 1151 of the pillar region 102, the bridge region 103, and the opening region 104, the interlayer dielectric layer 117, the second gate insulating layer 1152 and part of the first gate of the display region 101
  • the insulating layer 1151, the interlayer dielectric layer 117, and the second gate insulating layer 1152 are formed on the display area 101 through the interlayer dielectric layer 117, the second gate insulating layer 1152 and the first gate insulating layer 1151 through holes 1171
  • FIG. 6, shows a schematic diagram of the structure of the method for manufacturing a display panel provided by this embodiment in step S11.
  • Step S12 etch away the buffer layer 113 of the pillar region 102, the bridge region 103, and the opening region 104; please refer to FIG.
  • Step S13 Prepare the source and drain layers 141 on the through holes 1171 of the display area 101, the pillar area 102 and the barrier layer 112 of the bridge area 103.
  • the source and drain layers 141 of the display area 101, the pillar area 102 and the bridge area 103 are separated from each other.
  • the source and drain layer 141 is made of titanium metal or aluminum metal.
  • Step S14 etch away the barrier layer 112 and the stretchable substrate 111 in the opening area 104; please refer to FIG. 9, which shows the structure diagram of the method for manufacturing the display panel provided by this embodiment in step S14.
  • Step S15 Prepare a flat layer 118 on the interlayer dielectric layer 117 of the display area 101 and the barrier layer 112 of the bridge area 103, and cover the source and drain layers 141 of the bridge area 103.
  • the flat layer 118 has and has An opening, the opening corresponds to the source and drain layer 141; please refer to FIG. 10, which is a schematic structural diagram of the method for manufacturing a display panel provided by this embodiment in step S15.
  • a flat layer 118 on the bridge region 103 can provide a certain ability for subsequent deformation, and the absence of a flat layer 118 on the opening region 104 is for subsequent deformation.
  • a flat layer 118 can also be prepared on the pillar region 102.
  • the layer 118 is mainly used to control the film layer stacking according to the subsequent disconnection of the cathode.
  • Step S16 An anode layer 119 is prepared on the surface of the flat layer 118 of the display area 101 and on the source/drain layer 141 of the column area 102, and the anode layer 119 extends into the opening to be connected to the source and drain; please refer to FIG. 11, FIG. 11 is a schematic diagram of the structure of the method for manufacturing the display panel provided in this embodiment at step S16.
  • Step S17 Prepare a pixel definition layer 121 on the flat layer 118 of the display area 101, the pillar area 102 and the bridge area 103 and on the anode layer 119; please refer to FIG. 12, which shows the structure of the display panel provided by this embodiment. Schematic diagram of the structure in step S17 of the preparation method.
  • the formation of the pixel definition layer 121 on the bridge region 103 can improve the performance of subsequent deformation of the display panel 100 while protecting the wiring of the source and drain layer 141.
  • the flat layer 118 and the pixel definition layer 121 are made of photoresist.
  • the flat layer 118 and the pixel definition layer 121 can also be made of organic materials that have higher elasticity and match the modulus of the source and drain layer 141. Material.
  • Step S18 Prepare the PS spacer 122 on the pixel definition layer 121 of the display area 101, the column area 102 and the bridge area 103; please refer to FIG. 13, which shows the method for manufacturing the display panel provided in this embodiment at step S18 Schematic diagram of the structure.
  • the PS interlayer 122 and the pixel definition layer 121 are prepared by a halftone mask process, which can save costs.
  • Step S19 Part of the source and drain layers 141 and the anode layer 119 of the column region 102 are etched so that the source and drain layers 141 and the anode layer 119 of the column region 102 are in an inverted trapezoid shape, which provides conditions for subsequent disconnection of the cathode.
  • FIG. 14 is a schematic diagram of the structure of the method for manufacturing the display panel provided by this embodiment in step S19.
  • the source and drain layers 141 and the anode layer 119 of the inverted trapezoidal column region 102 can be finally formed. This structure is helpful for subsequent cathodes. Disconnect here, by adjusting the height of the source and drain layer 141 and the anode layer 119 of the column region 102 and the inverted trapezoidal structure, the cathode can be disconnected here and the spacer structure 120 can also act as a barrier structure. Water and oxygen effect.
  • Step S20 preparing an OLED light-emitting layer 123 on the anode of the display area 101; please refer to FIG.
  • Step S21 Prepare a cathode layer 142 on the OLED light-emitting layer 123 of the display area 101 and the PS spacer 122 of the bridge area 103; please refer to FIG. 16, which shows the method of manufacturing the display panel provided in this embodiment at step S21 Schematic diagram of the structure.
  • the opening area 104 can become larger or smaller.
  • the display area 101 rotates accordingly.
  • This embodiment also provides a display device, including the deformable display panel 100 related to the present invention.
  • the present invention provides a deformable display panel, a preparation method thereof, and a display device, reveals the corresponding structure and process flow in the stretchable display panel, fills the gaps in the prior art, and the process The feasibility is high, and it is convenient for the actual production of the factory.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

L'invention concerne un panneau d'affichage déformable et son procédé de fabrication, et un dispositif d'affichage. Le panneau d'affichage comprend plusieurs régions d'affichage (101), des régions de colonne (102), des régions de pont (103) et des régions d'ouverture (104). Les régions de colonne (102) entourent les régions d'affichage (101) ; les régions de pont (103) sont disposées entre les régions d'ouverture (104) et les régions de colonne (102) ou entre les régions d'ouverture (104) ; les régions de colonne (102) sont pourvues de structures de colonne d'espacement (120) ; les structures de colonnes d'espacement (120) et les régions d'affichage (101) sont disposées à des intervalles ; les régions de pont (103) présentent des structures de pontage (130) ; et les structures de pontage (130) et les structures de colonnes d'espacement (120) sont disposées à des intervalles.
PCT/CN2020/088672 2020-03-23 2020-05-06 Panneau d'affichage déformable et son procédé de fabrication, et dispositif d'affichage WO2021189601A1 (fr)

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Application Number Priority Date Filing Date Title
US16/964,213 US11061440B1 (en) 2020-05-06 2020-05-06 Deformable display panel, manufacturing method thereof, and display device

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CN202010209249.9A CN111261693A (zh) 2020-03-23 2020-03-23 一种可形变的显示面板及其制备方法、显示装置
CN202010209249.9 2020-03-23

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WO2021189601A1 true WO2021189601A1 (fr) 2021-09-30

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CN114758586A (zh) * 2022-04-22 2022-07-15 京东方科技集团股份有限公司 测试元件组、显示面板及其制备方法和测试方法
CN114758586B (zh) * 2022-04-22 2023-12-29 京东方科技集团股份有限公司 测试元件组、显示面板及其制备方法和测试方法

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