WO2021189601A1

WO2021189601A1 - Deformable display panel and manufacturing method therefor, and display device

Info

Publication number: WO2021189601A1
Application number: PCT/CN2020/088672
Authority: WO
Inventors: 王雷
Original assignee: 武汉华星光电半导体显示技术有限公司
Priority date: 2020-03-23
Filing date: 2020-05-06
Publication date: 2021-09-30
Also published as: CN111261693A

Abstract

A deformable display panel and a manufacturing method therefor, and a display device. The display panel comprises several display regions (101), column regions (102), bridge regions (103) and opening regions (104), the column regions (102) surrounding the display regions (101), the bridge regions (103) being provided between the opening regions (104) and the column regions (102) or between the opening regions (104), the column regions (102) being provided with spacing column structures (120), the spacing column structures (120) and the display regions (101) being provided at intervals, the bridge regions (103) having bridging structures (130), and the bridging structures (130) and the spacing column structures (120) being provided at intervals.

Description

Deformable display panel, preparation method thereof and display device

Technical field

This application relates to the technical field of display panels, and in particular to a deformable display panel, a manufacturing method thereof, and a display device.

Background technique

With the development of display technology, Organic Light-Emitting Diode (OLED) capable of flexible display has promoted the diversification of display and has gradually become the mainstream of display technology. In some related technologies, the OLED flexible display device can meet the bending of the two-dimensional surface, but it is not suitable for flexible display requirements with more complicated situations (for example, wearable, etc.).

Stretchable OLED display panels have the characteristics of unchanged picture display effects after any deformation, and can be applied to specific display fields such as heterosexual displays and wearable devices, adding diversity and possibilities to the future display field.

Since the stretchable OLED needs to be deformed arbitrarily, the design of the OLED structure and the realization of the process flow are particularly important, but the prior art does not record the corresponding structure and process flow of the stretchable OLED.

Therefore, it is indeed necessary to develop a new type of manufacturing method for display panels to fill the gaps in the prior art.

technical problem

An object of the present invention is to provide a method for manufacturing a deformable display panel, which can solve the problems that are not described in the prior art regarding the corresponding structure and process flow of the stretchable display panel.

Technical solutions

In order to achieve the above objective, the present invention provides a deformable display panel, including a plurality of display areas, pillar areas, bridge areas and opening areas, wherein the pillar area surrounds the display area, and the bridge area is provided in the Between the open area and the column area or between the open area; wherein the column area is provided with a spacer structure, and the spacer structure is spaced from the display area; the bridge area has a bridge structure , The bridge structure and the spacer structure are arranged at intervals; each display area has a display unit, and the deformable display panel further includes a signal line that passes through the pillar area from the bridge area and is connected to the display unit.

Further, in other embodiments, the display panel includes a substrate layer extending from the display area to the opening area; a stretchable substrate extending from the display area to the bridge area; a barrier layer , Arranged on the stretchable substrate, extending from the display area to the bridge area.

Further, in other embodiments, the display panel further includes a buffer layer provided on the barrier layer of the display area; an active layer provided on the buffer layer of the display area; first A gate insulating layer is provided on the buffer layer in the display area and covers the active layer; a first gate layer is provided on the first gate insulating layer in the display area; layer An interlayer dielectric layer is provided on the first gate insulating layer in the display area and covers the first gate layer; a through hole penetrates the interlayer dielectric layer and the first gate insulating layer The signal line includes a source and drain layer, which is provided on the interlayer dielectric layer and in the through hole, and on the barrier layer of the pillar region and the bridge region.

Further, in other embodiments, the display panel further includes a flat layer, which is provided on the interlayer dielectric layer of the display area and the barrier layer of the bridge area, and covers the bridge. The signal line of the area, in the display area, the flat layer has and has an opening corresponding to the source and drain layer; the anode layer is provided on the surface of the flat layer in the display area And the signal line of the pillar region, and the anode layer extends into the opening to be connected to the source and drain electrodes; a pixel definition layer is provided in the display region, the pillar region and the bridge Area on the flat layer and the anode layer; PS spacer layer, arranged on the pixel definition layer of the display area, the column area and the bridge area; OLED light emitting layer, arranged on the On the anode of the display area; the signal line further includes a cathode layer, which is provided on the OLED light-emitting layer of the display area and the PS spacer of the bridge area; in the display area, the The buffer layer, the active layer, the first gate insulating layer, the first gate layer, the interlayer dielectric layer, the source and drain layer, the flat layer, the anode layer, the pixel definition layer, the PS spacer, the OLED light-emitting layer and the cathode Layer to form the display unit; in the column region, the source and drain layer, the anode layer, the pixel definition layer and the PS spacer layer form the spacer column structure; in the bridge region, the source and drain layer, A flat layer, a pixel definition layer, a PS spacer layer and a cathode layer form the bridge structure; the cathode layer of the bridge area and the anode layer of the display area are all connected to the anode layer of the column area.

Further, in other embodiments, the source-drain layer and the anode layer of the pillar region are in an inverted trapezoid shape as a whole.

In order to achieve the above objective, the present invention also provides a manufacturing method for preparing the deformable display panel of the present invention, which includes a plurality of display areas, pillar areas, bridge areas, and opening areas, wherein the pillar area Surrounding the display area, the bridge area is provided between the opening area and the column area or between the opening area; the preparation method includes: preparing a display unit in the display area; preparing spacers Structure in the column area; preparing a bridge structure in the bridge area; wherein the spacers and the display area are spaced apart; the bridge structure and the spaced column structure are spaced apart; the deformable display panel It also includes a signal line that passes through the pillar area from the bridge area and is connected to the display unit.

Further, in other embodiments, the preparation method specifically includes the following steps: providing a substrate layer extending from the display area to the opening area; preparing a stretchable substrate extending from the display area To the open area; prepare a barrier layer on the stretchable substrate, extending from the display area to the open area; prepare a buffer layer on the barrier layer, extending from the display area to The opening area; preparing an active layer on the buffer layer of the display area; preparing a first gate insulating layer on the buffer layer and covering the active layer, the first gate An insulating layer extends from the display area to the opening area; preparing a first gate layer on the first gate insulating layer in the display area; preparing an interlayer dielectric layer on the gate insulating layer And cover the first gate layer, the interlayer dielectric layer extends from the display area to the opening area; the first gate in the pillar area, bridge area, and opening area is etched away An insulating layer, an interlayer dielectric layer, and a part of the first gate insulating layer and the interlayer dielectric layer of the display area are formed on the display area to penetrate the interlayer dielectric layer and the first gate insulating layer. Layer through holes; etch away the buffer layer in the pillar region, bridge region, and opening region; prepare source and drain layers in the through hole, pillar region, and bridge region of the display region On the barrier layer, the source and drain layers of the display region, the pillar region and the bridge region are respectively arranged at intervals; the barrier layer and the stretchable substrate in the aperture region are etched away; and the flat is prepared Layer on the interlayer dielectric layer of the display area and the barrier layer of the bridge area, and cover the source and drain layers of the bridge area, in the display area, the flat layer has And there is an opening corresponding to the source and drain layers, wherein the preparation of a flat layer on the bridge area can provide a certain ability for subsequent deformation, and the absence of the flat layer on the opening area is for the subsequent ability In other embodiments, a flat layer can also be prepared on the column area, mainly to control the film layer stacking according to the subsequent disconnection of the cathode; the anode layer is prepared on the surface of the flat layer in the display area And on the source and drain layers of the pillar region, and the anode layer extends into the opening to be connected to the source and drain electrodes; preparing a pixel definition layer on the display region, the pillar region, and On the flat layer and on the anode layer of the bridge region, wherein the preparation of a pixel definition layer on the bridge region can improve the performance of subsequent display panel deformation while protecting the traces of the source and drain layers; preparation The PS spacer is on the pixel defining layer of the display area, the pillar area and the bridge area; part of the source and drain layer and the anode layer of the pillar area is etched so that the pillar area is The source drain layer and the anode layer are in an inverted trapezoid shape, which provides conditions for the subsequent disconnection of the cathode. Because the etching rate of the etchant for the source and drain layers is greater than the etching rate of the anode, the source and drain layers and the anode layer of the column region of the inverted trapezoidal shape can be finally formed. This structure helps The subsequent cathode is disconnected here. By adjusting the height of the source and drain layer and the anode layer of the column area and the inverted trapezoidal structure, the cathode can be disconnected here and the spacer structure can also act as a barrier structure. Water and oxygen effect.

Wherein, the open area can become larger or smaller, and when the open area becomes larger or smaller, the display area will rotate accordingly.

Further, in other embodiments, the material of the barrier layer is silicon oxide, the material of the first gate insulating layer is silicon oxide or silicon nitride, and the material of the gate layer is molybdenum. The material of the interlayer dielectric layer is silicon oxide and silicon nitride, wherein the silicon nitride in the interlayer dielectric layer can supplement hydrogen to fill the damage of the active layer by ELA in the previous process to adjust the electrical property.

Further, in other embodiments, the source and drain layers are made of titanium or aluminum, and the flat layer and the pixel defining layer are made of photoresist. In other embodiments, the flat layer and the pixel are made of photoresist. The material of the definition layer can also be an organic material that has high elasticity and matches the modulus of the source and drain layers.

Further, in other embodiments, the PS spacer and the pixel definition layer are prepared by using a halftone mask process, which can save costs.

Further, in other embodiments, the preparation method further includes preparing an OLED light-emitting layer on the anode of the display area; preparing a cathode layer on the OLED light-emitting layer and the bridge area of the display area On the PS compartment.

To achieve the above objective, the present invention also provides a display device including the deformable display panel described in the present invention.

Beneficial effect

Compared with the prior art, the beneficial effect of the present invention is that the present invention provides a deformable display panel, a manufacturing method thereof, and a display device, reveals the corresponding structure and process flow in the stretchable display panel, and fills the existing The lack of technology and high process feasibility facilitate the actual production of the factory.

Description of the drawings

The following detailed description of specific implementations of the present application in conjunction with the accompanying drawings will make the technical solutions and other beneficial effects of the present application obvious.

FIG. 1 is a schematic cross-sectional structure diagram of a deformable display panel provided by an embodiment of the present invention;

2 is a schematic diagram of a top view structure of a deformable display panel provided by an embodiment of the present invention;

3 is a flowchart of a method for manufacturing a deformable display panel provided by an embodiment of the present invention;

4 is a schematic structural diagram of the method for manufacturing a display panel provided by an embodiment of the present invention in step S9;

5 is a schematic diagram of the structure in step S10 of the method for manufacturing a display panel according to an embodiment of the present invention;

6 is a schematic diagram of the structure in step S11 of the method for manufacturing a display panel according to an embodiment of the present invention;

FIG. 7 is a schematic diagram of the structure in step S12 of the manufacturing method of the display panel provided by the embodiment of the present invention; FIG.

8 is a schematic diagram of the structure in step S13 of the method for manufacturing a display panel according to an embodiment of the present invention;

FIG. 9 is a schematic diagram of the structure in step S14 of the manufacturing method of the display panel provided by the embodiment of the present invention; FIG.

FIG. 10 is a schematic diagram of the structure in step S15 of the manufacturing method of the display panel provided by the embodiment of the present invention; FIG.

11 is a schematic diagram of the structure in step S16 of the method for manufacturing a display panel provided by an embodiment of the present invention;

FIG. 12 is a schematic diagram of the structure in step S17 of the method for manufacturing a display panel according to an embodiment of the present invention; FIG.

FIG. 13 is a schematic structural diagram at step S18 of the method for manufacturing a display panel according to an embodiment of the present invention; FIG.

FIG. 14 is a schematic diagram of the structure in step S19 of the method for manufacturing a display panel according to an embodiment of the present invention; FIG.

15 is a schematic diagram of the structure in step S20 of the method for manufacturing a display panel according to an embodiment of the present invention;

FIG. 16 is a schematic diagram of the structure in step S21 of the method for manufacturing a display panel provided by an embodiment of the present invention.

Description of the drawings in the detailed description:

Display panel-100;

Display area -101; column area -102;

Bridge area -103; Opening area -104;

Display unit -110; spacer structure -120;

Bridge structure-130; signal line-140;

Substrate layer-10;

Stretchable substrate-111; barrier layer-112;

Buffer layer-113; Active layer-114;

First gate insulating layer-1151; first gate layer-1161;

Second gate insulating layer-1152; second gate layer-1162;

Interlayer dielectric layer-117; through hole-1171;

Source and drain layer -141; flat layer -118;

Anode layer-119; Pixel definition layer-121;

PS compartment-122; OLED light-emitting layer -123;

Cathode layer -142.

Embodiments of the present invention

The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative work shall fall within the protection scope of this application.

In the description of this application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " "Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise" and other directions or The positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, Therefore, it cannot be understood as a restriction on this application. In addition, the terms "first" and "second" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of the features. In the description of the present application, "multiple" means two or more than two, unless otherwise specifically defined.

In the description of this application, it should be noted that the terms "installation", "connection", and "connection" should be understood in a broad sense, unless otherwise clearly specified and limited. For example, it can be a fixed connection or a detachable connection. Connected or integrally connected; it can be mechanically connected, or electrically connected or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two components or the interaction of two components relation. For those of ordinary skill in the art, the specific meanings of the above-mentioned terms in this application can be understood according to specific circumstances.

Specifically, please refer to FIGS. 1 and 2. FIGS. 1 and 2 are respectively a cross-sectional structural diagram and a top structural diagram of the deformable display panel 100 provided in this embodiment. The deformable display panel 100 includes a plurality of displays. Area 101, column area 102, bridge area 103 and opening area 104.

The pillar area 102 surrounds the display area 101, and the bridge area 103 is provided between the opening area 104 and the pillar area 102 or between the opening area 104. The opening area 104 has an I-shape.

The column area 102 is provided with a spacer structure 120 which is spaced apart from the display area 101; the bridge region 103 has a bridge structure 130 which is spaced from the spacer structure 120; each display area 101 has a display unit 110.

The deformable display panel 100 further includes a signal line 140, which is connected to the display unit 110 from the bridge area 103 through the column area 102.

Specifically, the display panel 100 includes a substrate layer 10, a stretchable substrate 111, a barrier layer 112, a buffer layer 113, an active layer 114, a first gate insulating layer 1151, a first gate layer 1161, an interlayer dielectric layer 117, a source and drain layer 141, a flat layer 118, an anode layer 119, a pixel definition layer 121, a PS spacer 122, an OLED light-emitting layer 123, and a cathode layer 142.

The substrate layer 10 extends from the display area 101 area to the opening area 104; the stretchable substrate 111 extends from the display area 101 area to the bridge area 103; the barrier layer 112 is arranged on the stretchable substrate 111 and extends from the display area. The area 101 area extends to the bridge area 103.

The buffer layer 113 is arranged on the barrier layer 112 of the display area 101; the active layer 114 is arranged on the buffer layer 113 of the display area 101; the first gate insulating layer 1151 is arranged on the buffer layer 113 of the display area 101, And cover the active layer 114; the first gate layer 1161 is arranged on the first gate insulating layer 1151 of the display area 101; the second gate insulating layer 1152 is arranged on the first gate insulating layer 1151 of the display area 101 And cover the first gate layer 1161; the second gate layer 1162 is arranged on the second gate insulating layer 1152 of the display area 101; the interlayer dielectric layer 117 is arranged on the second gate insulating layer of the display area 101 On the layer 1152 and cover the second gate layer 1162; the through hole 1171 penetrates the interlayer dielectric layer 117, the first gate insulating layer 1151 and the second gate insulating layer 1152; the signal line 140 includes a source and drain layer 141, It is arranged on the interlayer dielectric layer 117 and in the through hole 1171 and on the barrier layer 112 of the pillar region 102 and the bridge region 103.

The flat layer 118 is disposed on the interlayer dielectric layer 117 of the display area 101 and the barrier layer 112 of the bridge area 103, and covers the signal line 140 of the bridge area 103. In the display area 101, the flat layer 118 has and has an opening. The opening corresponds to the source and drain layer 141; the anode layer 119 is arranged on the surface of the flat layer 118 of the display area 101 and on the signal line 140 of the column area 102, and the anode layer 119 extends into the opening and is connected to the source and drain; pixel definition The layer 121 is arranged on the flat layer 118 of the display area 101, the pillar area 102 and the bridge area 103 and the anode layer 119; the PS spacer 122 is arranged on the pixel defining layer 121 of the display area 101, the pillar area 102 and the bridge area 103 On; the OLED light-emitting layer 123 is provided on the anode of the display area 101; the signal line 140 also includes a cathode layer 142, which is provided on the OLED light-emitting layer 123 of the display area 101 and the PS spacer 122 of the bridge area 103.

In the display area 101, the buffer layer 113, the active layer 114, the first gate insulating layer 1151, the first gate layer 1161, the interlayer dielectric layer 117, the source and drain layer 141, the flat layer 118, the anode layer 119, The pixel definition layer 121, the PS spacer layer 122, the OLED light-emitting layer 123 and the cathode layer 142 form the display unit 110; in the column area 102, the source and drain layer 141, the anode layer 119, the pixel definition layer 121 and the PS spacer layer 122 form spacer columns Structure 120; In the bridge area 103, the source and drain layer 141, the flat layer 118, the pixel definition layer 121, the PS spacer 122 and the cathode layer 142 form a bridge structure 130; the cathode layer 142 of the bridge area 103, the anode of the display area 101 The layers 119 are all connected to the anode layer 119 of the column region 102.

The source and drain layer 141 and the anode layer 119 of the pillar region 102 are in an inverted trapezoid shape as a whole. This structure helps the subsequent cathode to be disconnected here. By adjusting the height of the source-drain layer 141 and the anode layer 119 of the column region 102 and the inverted trapezoidal structure, the cathode can be disconnected here and the spacer structure 120 can also be separated. It can be used as a retaining wall structure to block water and oxygen.

This embodiment also provides a preparation method for preparing the deformable display panel 100 involved in this embodiment. The deformable display panel 100 includes a plurality of display areas 101, column areas 102, bridge areas 103, and aperture areas 104. , Wherein the pillar area 102 surrounds the display area 101, and the bridge area 103 is provided between the opening area 104 and the pillar area 102 or between the opening area 104; the preparation method includes step S100-step S300. Please refer to FIG. 3. FIG. 3 shows a flow chart of the method for manufacturing the deformable display panel provided by this embodiment.

Step S100: preparing the display unit 110 in the display area 101.

Step S200: preparing the spacer structure 120 in the column area 102.

Step S300: Prepare the bridge structure 130 in the bridge area 103.

Among them, the spacer structure 120 and the display area 101 are spaced apart; the bridge structure 130 is spaced from the spacer structure 120; the deformable display panel 100 further includes a signal line 140, which is connected to the display unit 110 from the bridge region 103 through the column region 102 .

The preparation method specifically includes the following steps:

Step S1: Provide a substrate layer 10 extending from the display area 101 area to the opening area 104.

Step S2: preparing a stretchable substrate 111, extending from the display area 101 to the opening area 104.

Step S3: preparing a barrier layer 112 on the stretchable substrate 111, extending from the display area 101 to the opening area 104; wherein the barrier layer 112 is made of silicon oxide.

Step S4: preparing a buffer layer 113 on the barrier layer 112, extending from the display area 101 to the opening area 104.

Step S5: preparing an active layer 114 on the buffer layer 113 of the display area 101;

Step S6: preparing a first gate insulating layer 1151 on the buffer layer 113 and covering the active layer 114. The first gate insulating layer 1151 extends from the display area 101 to the opening area 104.

Step S7: Prepare a first gate layer 1161 on the first gate insulating layer 1151 of the display area 101; wherein the material of the first gate insulating layer 1151 is silicon oxide or silicon nitride, and the material of the first gate layer 1161 Use molybdenum metal.

Step S8: preparing a second gate insulating layer 1152 on the buffer layer 113 and covering the first gate layer 1161. The second gate insulating layer 1152 extends from the display area 101 to the opening area 104.

Step S9: Prepare a second gate layer 1162 on the second gate insulating layer 1152 of the display area 101; please refer to FIG. 4, which shows a schematic diagram of the structure in step S9 of the method for manufacturing the display panel provided in this embodiment .

The material of the second gate insulating layer 1152 is silicon oxide or silicon nitride, and the material of the second gate layer 1162 is molybdenum.

Step S10: preparing an interlayer dielectric layer 117 on the gate insulating layer and covering the second gate layer 1162. The interlayer dielectric layer 117 extends from the display area 101 to the opening area 104; please refer to FIG. 5, which is shown in FIG. A schematic diagram of the structure of the method for manufacturing a display panel provided in this embodiment in step S10.

Among them, the material of the interlayer dielectric layer 117 is silicon oxide and silicon nitride, and the silicon nitride in the interlayer dielectric layer 117 can supplement hydrogen to fill the damage of the active layer 114 to the active layer 114 and adjust the electrical property.

Step S11: etch away the first gate insulating layer 1151 of the pillar region 102, the bridge region 103, and the opening region 104, the interlayer dielectric layer 117, the second gate insulating layer 1152 and part of the first gate of the display region 101 The insulating layer 1151, the interlayer dielectric layer 117, and the second gate insulating layer 1152 are formed on the display area 101 through the interlayer dielectric layer 117, the second gate insulating layer 1152 and the first gate insulating layer 1151 through holes 1171 Please refer to FIG. 6, which shows a schematic diagram of the structure of the method for manufacturing a display panel provided by this embodiment in step S11.

Step S12: etch away the buffer layer 113 of the pillar region 102, the bridge region 103, and the opening region 104; please refer to FIG.

Step S13: Prepare the source and drain layers 141 on the through holes 1171 of the display area 101, the pillar area 102 and the barrier layer 112 of the bridge area 103. The source and drain layers 141 of the display area 101, the pillar area 102 and the bridge area 103 are separated from each other. Settings; please refer to FIG. 8, which shows a schematic structural diagram of the method for manufacturing a display panel provided by this embodiment in step S13.

The source and drain layer 141 is made of titanium metal or aluminum metal.

Step S14: etch away the barrier layer 112 and the stretchable substrate 111 in the opening area 104; please refer to FIG. 9, which shows the structure diagram of the method for manufacturing the display panel provided by this embodiment in step S14.

Step S15: Prepare a flat layer 118 on the interlayer dielectric layer 117 of the display area 101 and the barrier layer 112 of the bridge area 103, and cover the source and drain layers 141 of the bridge area 103. In the display area 101, the flat layer 118 has and has An opening, the opening corresponds to the source and drain layer 141; please refer to FIG. 10, which is a schematic structural diagram of the method for manufacturing a display panel provided by this embodiment in step S15.

The preparation of a flat layer 118 on the bridge region 103 can provide a certain ability for subsequent deformation, and the absence of a flat layer 118 on the opening region 104 is for subsequent deformation. In other embodiments, a flat layer 118 can also be prepared on the pillar region 102. The layer 118 is mainly used to control the film layer stacking according to the subsequent disconnection of the cathode.

Step S16: An anode layer 119 is prepared on the surface of the flat layer 118 of the display area 101 and on the source/drain layer 141 of the column area 102, and the anode layer 119 extends into the opening to be connected to the source and drain; please refer to FIG. 11, FIG. 11 is a schematic diagram of the structure of the method for manufacturing the display panel provided in this embodiment at step S16.

Step S17: Prepare a pixel definition layer 121 on the flat layer 118 of the display area 101, the pillar area 102 and the bridge area 103 and on the anode layer 119; please refer to FIG. 12, which shows the structure of the display panel provided by this embodiment. Schematic diagram of the structure in step S17 of the preparation method.

The formation of the pixel definition layer 121 on the bridge region 103 can improve the performance of subsequent deformation of the display panel 100 while protecting the wiring of the source and drain layer 141.

Wherein, the flat layer 118 and the pixel definition layer 121 are made of photoresist. In other embodiments, the flat layer 118 and the pixel definition layer 121 can also be made of organic materials that have higher elasticity and match the modulus of the source and drain layer 141. Material.

Step S18: Prepare the PS spacer 122 on the pixel definition layer 121 of the display area 101, the column area 102 and the bridge area 103; please refer to FIG. 13, which shows the method for manufacturing the display panel provided in this embodiment at step S18 Schematic diagram of the structure.

Among them, the PS interlayer 122 and the pixel definition layer 121 are prepared by a halftone mask process, which can save costs.

Step S19: Part of the source and drain layers 141 and the anode layer 119 of the column region 102 are etched so that the source and drain layers 141 and the anode layer 119 of the column region 102 are in an inverted trapezoid shape, which provides conditions for subsequent disconnection of the cathode. Please refer to FIG. 14, which is a schematic diagram of the structure of the method for manufacturing the display panel provided by this embodiment in step S19.

Because the etching rate of the source and drain layer 141 by the etchant is greater than the etching rate of the anode, the source and drain layers 141 and the anode layer 119 of the inverted trapezoidal column region 102 can be finally formed. This structure is helpful for subsequent cathodes. Disconnect here, by adjusting the height of the source and drain layer 141 and the anode layer 119 of the column region 102 and the inverted trapezoidal structure, the cathode can be disconnected here and the spacer structure 120 can also act as a barrier structure. Water and oxygen effect.

Step S20: preparing an OLED light-emitting layer 123 on the anode of the display area 101; please refer to FIG.

Step S21: Prepare a cathode layer 142 on the OLED light-emitting layer 123 of the display area 101 and the PS spacer 122 of the bridge area 103; please refer to FIG. 16, which shows the method of manufacturing the display panel provided in this embodiment at step S21 Schematic diagram of the structure.

Wherein, the opening area 104 can become larger or smaller. When the opening area 104 becomes larger or smaller, the display area 101 rotates accordingly.

This embodiment also provides a display device, including the deformable display panel 100 related to the present invention.

The beneficial effects of the present invention are: the present invention provides a deformable display panel, a preparation method thereof, and a display device, reveals the corresponding structure and process flow in the stretchable display panel, fills the gaps in the prior art, and the process The feasibility is high, and it is convenient for the actual production of the factory.

In the above-mentioned embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in an embodiment, reference may be made to related descriptions of other embodiments.

The above describes in detail a deformable display panel, a manufacturing method thereof, and a display device provided by the embodiments of the present application. Specific examples are used in this article to illustrate the principles and implementations of the present application. The description of the above embodiments It is only used to help understand the technical solutions and core ideas of the application; those of ordinary skill in the art should understand that they can still modify the technical solutions recorded in the foregoing embodiments, or equivalently replace some of the technical features; However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

A deformable display panel, which includes a plurality of display areas, pillar areas, bridge areas, and opening areas, wherein the pillar areas surround the display area, and the bridge areas are provided between the opening area and the opening area. Between the column areas or between the opening areas;

Wherein, the column area is provided with a spacer structure, and the spacer structure is spaced from the display area; the bridge region has a bridge structure, and the bridge structure is spaced from the spacer structure;

Each display area has a display unit, and the deformable display panel further includes a signal line that passes through the column area from the bridge area and is connected to the display unit.
The deformable display panel as claimed in claim 1, which comprises

The substrate layer extends from the display area to the opening area;

The stretchable substrate extends from the display area to the bridge area;

The barrier layer is arranged on the stretchable substrate and extends from the display area to the bridge area.
The deformable display panel of claim 2, further comprising

The buffer layer is arranged on the barrier layer of the display area;

The active layer is arranged on the buffer layer in the display area;

The first gate insulating layer is arranged on the buffer layer in the display area and covers the active layer;

A first gate layer disposed on the first gate insulating layer in the display area;

An interlayer dielectric layer, disposed on the first gate insulating layer in the display area, and covering the first gate layer;

A through hole penetrates the interlayer dielectric layer and the first gate insulating layer;

The signal line includes a source and drain layer, which is arranged on the interlayer dielectric layer and in the through hole, and on the barrier layer of the pillar region and the bridge region.
The deformable display panel of claim 3, further comprising

A flat layer is provided on the interlayer dielectric layer in the display area and the barrier layer in the bridge area, and covers the signal lines in the bridge area. In the display area, the flat layer Having and having an opening corresponding to the source and drain layer;

An anode layer disposed on the surface of the flat layer in the display area and the signal line of the pillar area, and the anode layer extends into the opening and is connected to the source and drain;

A pixel definition layer arranged on the flat layer and on the anode layer of the display area, the pillar area, and the bridge area;

PS spacers are arranged on the pixel definition layer of the display area, the pillar area and the bridge area;

The OLED light-emitting layer is arranged on the anode of the display area;

The signal line further includes a cathode layer provided on the OLED light-emitting layer of the display area and the PS spacer layer of the bridge area;

In the display area, the buffer layer, the active layer, the first gate insulating layer, the first gate layer, the interlayer dielectric layer, the source and drain layer, the flat layer, the anode layer, the pixel definition layer, the PS An interlayer, an OLED light-emitting layer and a cathode layer form the display unit;

In the column region, the source and drain layer, the anode layer, the pixel definition layer and the PS spacer form the spacer column structure;

In the bridge region, the source and drain layer, the flat layer, the pixel definition layer, the PS spacer and the cathode layer form the bridge structure;

The cathode layer of the bridge area and the anode layer of the display area are both connected to the anode layer of the column area.
4. The deformable display panel of claim 4, wherein the source and drain layer and the anode layer of the pillar area are in an inverted trapezoid shape as a whole.
A preparation method for preparing the deformable display panel as claimed in claim 1, which comprises a plurality of display areas, pillar areas, bridge areas and opening areas, wherein the pillar area surrounds the display area, so The bridge area is provided between the open area and the column area or between the open area; the preparation method includes:

Preparing a display unit in the display area;

Preparing a spacer structure in the column area;

Preparing a bridge structure in the bridge area;

Wherein, the spacing column and the display area are arranged at intervals; the bridge structure and the spacing column structure are arranged at intervals;

The deformable display panel further includes a signal line, which passes through the pillar area from the bridge area and is connected to the display unit.
8. The preparation method according to claim 6, wherein the preparation method specifically comprises the following steps:

Providing a substrate layer extending from the display area to the opening area;

Preparing a stretchable substrate, extending from the display area to the opening area;

Preparing a barrier layer on the stretchable substrate, extending from the display area to the opening area;

Preparing a buffer layer on the barrier layer, extending from the display area to the opening area;

Preparing an active layer on the buffer layer in the display area;

Preparing a first gate insulating layer on the buffer layer and covering the active layer, the first gate insulating layer extending from the display area to the opening area;

Preparing a first gate layer on the first gate insulating layer in the display area;

Preparing an interlayer dielectric layer on the gate insulating layer and covering the first gate layer, the interlayer dielectric layer extending from the display area to the opening area;

Etch off the first gate insulating layer, interlayer dielectric layer in the pillar region, bridge region, and opening region, and part of the first gate insulating layer and interlayer dielectric layer in the display region, Forming a through hole penetrating the interlayer dielectric layer and the first gate insulating layer on the display area;

Etching off the buffer layer in the pillar area, bridge area, and opening area;

A source and drain layer is prepared on the barrier layer of the through hole, the column region and the bridge region of the display region, and the source and drain layers of the display region, the column region and the bridge region are respectively Interval setting

Etching off the barrier layer and the stretchable substrate in the opening area;

Prepare a flat layer on the interlayer dielectric layer of the display area and the barrier layer of the bridge area, and cover the source and drain layers of the bridge area. In the display area, the flat layer The layer has and has an opening corresponding to the source and drain layer;

Preparing an anode layer on the surface of the flat layer in the display area and on the source and drain layer in the pillar area, and the anode layer extends into the opening and is connected to the source and drain;

Preparing a pixel definition layer on the flat layer and on the anode layer of the display area, the pillar area and the bridge area;

Preparing a PS spacer on the pixel defining layer of the display area, the pillar area and the bridge area;

Part of the source drain layer and the anode layer in the column region is etched, so that the source drain layer and the anode layer of the column region are in an inverted trapezoid shape.
7. The preparation method of claim 7, wherein the barrier layer is made of silicon oxide, the first gate insulating layer is made of silicon oxide or silicon nitride, and the gate layer is made of molybdenum. , The interlayer dielectric layer is made of silicon oxide and silicon nitride, the source and drain layers are made of titanium or aluminum, the flat layer and the pixel definition layer are made of photoresist, and the PS spacer And the pixel definition layer is prepared by using a halftone mask process.
The preparation method according to claim 7, wherein the preparation method further comprises

Preparing an OLED light-emitting layer on the anode of the display area;

A cathode layer is prepared on the OLED light-emitting layer in the display area and the PS spacer in the bridge area.
A display device comprising the deformable display panel according to any one of claims 1-5.
The display device according to claim 10, which comprises

The substrate layer extends from the display area to the opening area;

The stretchable substrate extends from the display area to the bridge area;

The barrier layer is arranged on the stretchable substrate and extends from the display area to the bridge area.
The display device of claim 11, further comprising

The buffer layer is arranged on the barrier layer of the display area;

The active layer is arranged on the buffer layer in the display area;

The first gate insulating layer is arranged on the buffer layer in the display area and covers the active layer;

A first gate layer disposed on the first gate insulating layer in the display area;

An interlayer dielectric layer, disposed on the first gate insulating layer in the display area, and covering the first gate layer;

A through hole penetrates the interlayer dielectric layer and the first gate insulating layer;

The signal line includes a source and drain layer, which is arranged on the interlayer dielectric layer and in the through hole, and on the barrier layer of the pillar region and the bridge region.
The display device of claim 12, further comprising

A flat layer is provided on the interlayer dielectric layer in the display area and the barrier layer in the bridge area, and covers the signal lines in the bridge area. In the display area, the flat layer Having and having an opening corresponding to the source and drain layer;

An anode layer disposed on the surface of the flat layer in the display area and the signal line of the pillar area, and the anode layer extends into the opening and is connected to the source and drain;

A pixel definition layer arranged on the flat layer and on the anode layer of the display area, the pillar area, and the bridge area;

PS spacers are arranged on the pixel definition layer of the display area, the pillar area and the bridge area;

The OLED light-emitting layer is arranged on the anode of the display area;

The signal line further includes a cathode layer provided on the OLED light-emitting layer of the display area and the PS spacer layer of the bridge area;

In the display area, the buffer layer, the active layer, the first gate insulating layer, the first gate layer, the interlayer dielectric layer, the source and drain layer, the flat layer, the anode layer, the pixel definition layer, the PS An interlayer, an OLED light-emitting layer and a cathode layer form the display unit;

In the column region, the source and drain layer, the anode layer, the pixel definition layer and the PS spacer form the spacer column structure;

In the bridge region, the source and drain layer, the flat layer, the pixel definition layer, the PS spacer and the cathode layer form the bridge structure;

The cathode layer of the bridge area and the anode layer of the display area are both connected to the anode layer of the column area.
11. The display device of claim 13, wherein the source and drain layer and the anode layer of the pillar region are in an inverted trapezoid shape as a whole.