WO2021170150A1 - 形状记忆合金诱导可调控挠曲电效应的复合材料制备方法 - Google Patents
形状记忆合金诱导可调控挠曲电效应的复合材料制备方法 Download PDFInfo
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- WO2021170150A1 WO2021170150A1 PCT/CN2021/087308 CN2021087308W WO2021170150A1 WO 2021170150 A1 WO2021170150 A1 WO 2021170150A1 CN 2021087308 W CN2021087308 W CN 2021087308W WO 2021170150 A1 WO2021170150 A1 WO 2021170150A1
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- WO
- WIPO (PCT)
- Prior art keywords
- shape memory
- memory alloy
- composite material
- film
- substrate
- Prior art date
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- 229910001285 shape-memory alloy Inorganic materials 0.000 title claims abstract description 39
- 230000000694 effects Effects 0.000 title claims abstract description 34
- 239000002131 composite material Substances 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims abstract description 17
- 230000001939 inductive effect Effects 0.000 title claims abstract 3
- 230000001105 regulatory effect Effects 0.000 title claims abstract 3
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 4
- 238000005498 polishing Methods 0.000 claims abstract description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 38
- 239000011787 zinc oxide Substances 0.000 claims description 19
- 229910001000 nickel titanium Inorganic materials 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- HLXZNVUGXRDIFK-UHFFFAOYSA-N nickel titanium Chemical compound [Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni] HLXZNVUGXRDIFK-UHFFFAOYSA-N 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 abstract description 22
- 239000000463 material Substances 0.000 abstract description 6
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 230000010287 polarization Effects 0.000 abstract description 4
- 238000007373 indentation Methods 0.000 abstract description 2
- 239000010409 thin film Substances 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003306 harvesting Methods 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 230000001808 coupling effect Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3457—Sputtering using other particles than noble gas ions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D22/00—Shaping without cutting, by stamping, spinning, or deep-drawing
- B21D22/02—Stamping using rigid devices or tools
- B21D22/04—Stamping using rigid devices or tools for dimpling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D37/00—Tools as parts of machines covered by this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
Definitions
- the invention relates to the field of functional materials, and mainly relates to a method for preparing a composite material based on a shape memory alloy induced and adjustable flexural electrical effect.
- Force-electric coupling refers to the mutual transformation between mechanical energy and electrical energy, which is highly valued in the fields of micro-electromechanical systems and other fields.
- the flexural electrical effect has been reported by Kogan since 1964, and has attracted extensive research interest in recent years.
- the flexural electrical effect means that the strain gradient or non-uniform strain field can locally destroy the inversion symmetry, which leads to the electric polarization of the crystal and even the centrosymmetric crystal. It describes the electrical polarization induced by the strain gradient (positive flexural electrical effect) and the mechanical deformation induced by the electric field gradient (inverse flexural electrical effect), and has a wide range of applications in the fields of energy harvesting, sensors, and actuators.
- Hu et al. prepared the first automatic power supply system driven by a nanogenerator through the flexural electrical effect, which can realize wireless connection and be used for long-distance data transmission.
- the present invention is to provide a method for preparing a composite material based on a shape memory alloy that induces adjustable flexural electrical effects. Flexural electrical effect. To achieve the above objective, the present invention adopts the following technical solutions:
- a method for preparing a composite material based on a shape memory alloy-induced flexural electrical effect which is characterized in that: a shape memory alloy is used as a substrate, and after pre-deformation treatment, a flexural electrical film is prepared on the surface to obtain a double-layer structure Composite materials.
- the shape memory alloy substrate adopts Nitinol.
- the flexural electrical film adopts a zinc oxide film.
- the thickness of the zinc oxide film is 0.5 ⁇ m-2 ⁇ m, and the thickness of the nickel-titanium shape memory alloy substrate is 0.1 mm-1 mm.
- the pre-deformation treatment of the nickel-titanium shape memory alloy is to first use the indenter to treat the shape memory alloy base
- the method for preparing a zinc oxide flexural electrical film adopts a magnetron sputtering method to prepare a zinc oxide flexural electrical film on a polished substrate surface, using zinc oxide as a target material, and argon and oxygen as sputtering gases.
- the shape of the indenter is a rectangular steel block of 1 cm ⁇ 1 cm ⁇ 2 cm, and a large number of semi-cylindrical protrusions are processed on one end surface of the indenter.
- the length of the semi-cylindrical protrusion is 1cm and the radius is 0.1 mm -1mm.
- the flexural electrical properties are adjustable and can be adjusted by parameters such as the size of the zinc oxide film and the size of the indenter protrusion.
- the composite material based on the shape memory alloy-induced flexural electrical effect prepared by the present invention can be applied to the fields of energy harvesting, sensors and the like.
- Figure 1 Schematic diagram of the structure of a shape memory alloy induced flexural electrical effect composite material
- Figure 2 Schematic diagram of indenter structure design
- Figure 4 Performance test results of shape memory alloy induced flexural electrical effects.
- FIG. 1 where 1 is a zinc oxide flexural electrical film, and 2 is a nickel-titanium shape memory alloy substrate; it can be seen from Figure 2 that there are a large number of parallel semi-cylindrical protrusions on the end surface of the indenter; It can be seen that after the pre-deformed shape memory alloy substrate is heated, a large number of protrusions are generated on its surface, so the zinc oxide film also produces a large number of protrusions and deformations;
- Figure 4 shows the flexural electrical performance test results of the composite material. The abscissa is time and the ordinate is current. It can be seen from the figure that the composite material has an obvious flexural electrical effect. When the sample area increases, the current also increases, which indicates that the flexural electrical effect can be adjusted by controlling the sample size.
- the present invention relates to a method for preparing a composite material with a shape memory alloy induced and adjustable flexural electrical properties, comprising a double-layer structure composed of a nickel-titanium shape memory alloy base layer 2 and a zinc oxide flexural electrical film 1, as shown in Figure 1 Shown.
- the shape of the indenter is designed as shown in Figure 2.
- the surface is composed of a large number of semi-cylindrical protrusions with a protrusion length of 10mm.
- the radius of the protrusion is 0.5 mm.
- the shape memory alloy substrate is loaded with 2000N through the indenter, and the load is maintained for 60s, so that the surface is deformed.
- the indentation layer on the surface of the shape memory alloy substrate is polished smoothly with 400 # , 800 # , 1200 # , 1500 # , 2000 # sandpaper, and then the substrate surface is polished to a mirror surface with a polishing agent with a particle size of 0.5 ⁇ m and 0.25 ⁇ m Effect.
- Magnetron sputtering method is used to prepare zinc oxide flexural electrical film on the surface of shape memory alloy.
- the vacuum of the sputtering chamber is pre-evacuated to 3 ⁇ 10 -4 Pa.
- the zinc oxide target material is used.
- Argon and oxygen are used as sputtering gas.
- the gas flow rate is 3sccm
- the oxygen flow rate is 6sccm
- the pressure of the sputtering chamber is 0.5Pa
- the radio frequency power supply is selected
- the preparation power is 50W
- the bias voltage is 80V at the same time
- the preparation time is 1 hour and 4 hours respectively to prepare oxides with different thicknesses.
- Zinc film Zinc film.
- Stick electrodes on the upper and lower surfaces of the prepared sample and heat it.
- a desktop high-precision multimeter is used to measure the current signal. After heating, it can be seen that a large number of protrusions are produced on the surface of the shape memory alloy substrate, and the prepared zinc oxide film also produces a large number of protrusions corresponding to it, as shown in Figure 3.
- the zinc oxide film During the heating process, due to the deformation of the Nitinol shape memory alloy substrate, the zinc oxide film also produces a large number of deformation areas with high strain gradients.
- the zinc oxide film is polarized and generates an electric potential, so a significant current is generated, as shown in Figure 4 .
- Figure 4 (a) and (b) are samples of zinc oxide thin films prepared with areas of 0.5 cm 2 and 1 cm 2 respectively. It can be seen that when the area of the film is larger, the current generated by the flexural effect is also higher. This indicates that the flexural electrical effect induced by the shape memory alloy can be controlled by parameters such as the size of the flexural electrical film and the size of the indenter.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Semiconductor Memories (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
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Abstract
Description
Claims (6)
- 形状记忆合金诱导可调控挠曲电效应的复合材料制备方法,其特征在于:以形状记忆合金作为基底(2),经预变形处理后,在其表面制备挠曲电薄膜(1),制备得到具有双层结构的复合材料:首先对镍钛形状记忆合金进行预变形处理,即先使用压头对形状记忆合金基底变形处理,载荷1000-3000N,保载30-90s,随后依次用400 #、800 #、1200 #、1500 #、2000 #的砂纸打磨,再采用粒径为0.5μm、0.25μm的抛光剂将基底表面抛光至镜面效果;采用磁控溅射方法在抛光后的基底表面制备氧化锌挠曲电薄膜,以氧化锌作为靶材,电源使用射频电源,氩气与氧气作为溅射气体。
- 根据权利1要求所述的形状记忆合金诱导可调控挠曲电效应的复合材料制备方法,其特征在于,所述形状记忆合金基底采用镍钛合金。
- 根据权利1要求所述的形状记忆合金诱导可调控挠曲电效应的复合材料制备方法,其特征在于,所述挠曲电薄膜采用氧化锌薄膜。
- 根据权利1要求所述的形状记忆合金诱导可调控挠曲电效应的复合材料制备方法,其特征在于,氧化锌薄膜的厚度为0.5μm-2μm,镍钛形状记忆合金基底的厚度为0.1mm-1mm。
- 根据权利要求1所述的形状记忆合金诱导可调控挠曲电效应的复合材料制备方法,其特征在于,压头形状为1cm×1cm×2cm的长方形钢块,在其一端面有加工出大量半圆柱型凸起。
- 根据权利要求5所述的形状记忆合金诱导可调控挠曲电效应的复合材料制备方法,其特征在于,所述半圆柱型凸起的长度为1cm,半径为0.1 mm -1mm。
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CN115463965A (zh) * | 2022-08-29 | 2022-12-13 | 武汉大学 | 一种梯度微纳结构Ti-TiZnX层状复合材料及其制备方法 |
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CN111235538B (zh) * | 2020-02-28 | 2021-03-16 | 西安交通大学 | 形状记忆合金诱导可调控挠曲电效应的复合材料制备方法 |
CN113083638A (zh) * | 2021-03-16 | 2021-07-09 | 西安交通大学 | 基于预变形处理调控形状记忆合金疏水性的方法 |
CN113930734A (zh) * | 2021-09-17 | 2022-01-14 | 中国地质大学(武汉) | 一种基于4d打印技术的热电复合材料的制备方法 |
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CN115463965A (zh) * | 2022-08-29 | 2022-12-13 | 武汉大学 | 一种梯度微纳结构Ti-TiZnX层状复合材料及其制备方法 |
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