WO2021149595A1 - 着色樹脂組成物、膜、カラーフィルタ、固体撮像素子、及び、画像表示装置 - Google Patents

着色樹脂組成物、膜、カラーフィルタ、固体撮像素子、及び、画像表示装置 Download PDF

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Publication number
WO2021149595A1
WO2021149595A1 PCT/JP2021/001140 JP2021001140W WO2021149595A1 WO 2021149595 A1 WO2021149595 A1 WO 2021149595A1 JP 2021001140 W JP2021001140 W JP 2021001140W WO 2021149595 A1 WO2021149595 A1 WO 2021149595A1
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Prior art keywords
group
resin composition
colored resin
compound
film
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Ceased
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PCT/JP2021/001140
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English (en)
French (fr)
Japanese (ja)
Inventor
雅臣 牧野
敬史 川島
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Fujifilm Corp
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Fujifilm Corp
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Priority to CN202180009003.XA priority Critical patent/CN115210612B/zh
Priority to JP2021573117A priority patent/JP7425093B2/ja
Publication of WO2021149595A1 publication Critical patent/WO2021149595A1/ja
Priority to US17/867,327 priority patent/US20220390658A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/22—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/26—Nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/12—Amino derivatives of triarylmethanes without any OH group bound to an aryl nucleus
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0084—Dispersions of dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/106—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C09D11/107—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds from unsaturated acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/32—Inkjet printing inks characterised by colouring agents
    • C09D11/322—Pigment inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • C09D17/003—Pigment pastes, e.g. for mixing in paints containing an organic pigment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/03—Viewing layer characterised by chemical composition
    • C09K2323/031—Polarizer or dye

Definitions

  • the present invention relates to a colored resin composition, a film, a color filter, a solid-state image sensor, and an image display device.
  • a film containing a pigment such as a color filter is used for the solid-state image sensor.
  • a film containing a coloring material such as a color filter is manufactured by using a colored resin composition containing the coloring material, a resin, and a solvent.
  • the main polymer is composed of a styrene-based polymer chain having a weight average molecular weight of 5,000 to 20,000 and one of the main chain and the graft portion containing a styrene-based monomer unit, and the other.
  • an invention relating to an inkjet ink composition for a color filter which comprises a graft polymer composed of a methacrylate-based polymer chain containing a methacrylate-based monomer unit.
  • a step requiring heat treatment at a high temperature for example, 300 ° C. or higher
  • a film such as a color filter using a colored resin composition containing a coloring material, a resin, and a solvent. It is also being considered for use in.
  • an object of the present invention is to provide a novel colored resin composition, a film, a color filter, a solid-state image sensor, and an image display device capable of expanding the process window of the process after manufacturing the film. ..
  • ⁇ 1> Contains resin, coloring material, and organic solvent.
  • the resin contains a resin A containing a repeating unit (A) represented by the following formula (a).
  • Colored resin composition In formula (a), La1 represents a trivalent group.
  • Ar a1 represents an aromatic hydrocarbon group having a substituent and represents The substituent is a group having a structure in which the bonding portion with the aromatic hydrocarbon group is an ester bond or an amide bond. In the ester bond, an atom on the side different from the oxygen atom in the ester bond is on the bonding portion side with the aromatic hydrocarbon group.
  • n1 represents an integer of 1 or more and less than or equal to the maximum number of permutations of Ar 1.
  • ⁇ 4> The colored resin composition according to ⁇ 1> or ⁇ 2>, wherein the repeating unit (A) is a repeating unit represented by the following formula (2); Wherein (2), R 21 ⁇ R 23 are each independently a hydrogen atom, an alkyl group or an aryl group, R 24 represents a substituent, R Q11 represents a substituent, n11 is 1-5 It represents an integer, n12 represents an integer of 0 to 4, and n11 + n12 is 1 to 5.
  • ⁇ 5> The colored resin composition according to any one of ⁇ 1> to ⁇ 4>, wherein the resin A has a carboxy group.
  • ⁇ 6> The colored resin composition according to any one of ⁇ 1> to ⁇ 5>, wherein the acid value of the resin A is 20 to 200 mgKOH / g. ⁇ 7>
  • ⁇ 8> The colored resin composition according to any one of ⁇ 1> to ⁇ 7>, wherein the resin A has a crosslinkable group.
  • ⁇ 9> The colored resin composition according to any one of ⁇ 1> to ⁇ 8>, wherein the resin A is a graft polymer or a star-shaped polymer.
  • ⁇ 10> The colored resin composition according to any one of ⁇ 1> to ⁇ 9>, wherein the resin A is a graft polymer having a graft chain containing the repeating unit (A).
  • the coloring material contains at least one selected from the group consisting of a chromatic coloring material and a near-infrared absorbing coloring material. .. ⁇ 12> The colored resin composition according to any one of ⁇ 1> to ⁇ 11>, wherein the coloring material contains a chromatic color material and a near infrared ray absorbing color material.
  • ⁇ 13> The colored resin composition according to any one of ⁇ 1> to ⁇ 12>, wherein the coloring material contains a black coloring material.
  • the coloring material contains at least one chromatic color material selected from the group consisting of a red color material, a yellow color material, a blue color material, and a purple color material.
  • ⁇ 15> The colored resin composition according to any one of ⁇ 1> to ⁇ 14>, further comprising a photopolymerization initiator.
  • ⁇ 16> The colored resin composition according to ⁇ 15>, wherein the photopolymerization initiator is an oxime compound.
  • ⁇ 17> The colored resin composition according to any one of ⁇ 1> to ⁇ 16>, which is used for pattern formation in a photolithography method.
  • ⁇ 18> The colored resin composition according to any one of ⁇ 1> to ⁇ 17>, which is used for a solid-state image sensor.
  • ⁇ 19> A film obtained from the colored resin composition according to any one of ⁇ 1> to ⁇ 18>.
  • ⁇ 20> A color filter containing the film according to ⁇ 19>.
  • ⁇ 21> A solid-state image sensor including the film according to ⁇ 19>.
  • ⁇ 22> An image display device including the film according to ⁇ 19>.
  • a novel colored resin composition a film, a color filter, a solid-state image sensor, and an image display device capable of expanding the process window of a process after manufacturing a film are provided.
  • the present invention is not limited to the specified embodiments.
  • "-" is used to mean that the numerical values described before and after the value are included as the lower limit value and the upper limit value.
  • the notation not describing substitution and non-substitution also includes a group having a substituent (atomic group) as well as a group having no substituent (atomic group).
  • the "alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • exposure includes not only exposure using light but also drawing using particle beams such as an electron beam and an ion beam, unless otherwise specified.
  • the light used for exposure include the emission line spectrum of a mercury lamp, far ultraviolet rays typified by an excimer laser, extreme ultraviolet rays (EUV light), X-rays, active rays such as electron beams, or radiation.
  • EUV light extreme ultraviolet rays
  • active rays such as electron beams, or radiation.
  • the (meth) allyl group represents both allyl and metharyl, or either, and "(meth) acrylate” represents both acrylate and methacrylate, or either, and "(meth)”.
  • “Acrylic” represents both acrylic and methacrylic, or either, and “(meth) acryloyl” represents both or either of acryloyl and methacrylic.
  • the weight average molecular weight and the number average molecular weight are polystyrene-equivalent values measured by a GPC (gel permeation chromatography) method.
  • the near infrared ray means light having a wavelength of 700 to 2500 nm.
  • the total solid content means the total mass of all the components of the composition excluding the solvent.
  • process does not only refer to an independent process, but even if it cannot be clearly distinguished from other processes, if the desired action of the process is achieved, the term is used. included. In the present specification, the combination of preferred embodiments is a more preferred embodiment.
  • the colored resin composition of the present invention contains a resin, a coloring material, and an organic solvent.
  • the resin is characterized by containing a resin A containing a repeating unit (A) represented by the formula (a) described later.
  • the colored resin composition of the present invention by containing the above resin A (hereinafter, also referred to as a specific resin), it is hard to be decomposed even at a high temperature, and film shrinkage is hard to occur even after heat treatment at a high temperature, and it is excellent in heat resistance.
  • a film can be formed. Therefore, even if a film is formed using the colored resin composition of the present invention and then heat-treated at a high temperature (for example, 300 ° C. or higher), the film shrinkage is suppressed and another inorganic film or the like is formed on the film. Even when a film or the like is formed, it is possible to suppress the occurrence of cracks in other films.
  • the process window of the process after manufacturing the film can be expanded.
  • the above-mentioned specific resin is made of a resin because an aromatic hydrocarbon group is bonded to a trivalent group La1 forming a molecular chain. It is presumed that the depolymerization temperature was improved. Since the above aromatic hydrocarbon group has a specific substituent, even if a radical is generated during the depolymerization of the resin, the generated radical is destabilized and the depolymerization of the resin by the radical is suppressed. It is presumed that it can be done.
  • the specific substituent is a group having a structure in which the bonding portion with the aromatic hydrocarbon group is an ester bond or an amide bond, and in the ester group, the atom on the side different from the oxygen atom in the ester bond is aromatic. It is on the side of the bond with the hydrocarbon group, and in the above amide bond, the atom on the side different from the nitrogen atom in the amide bond is on the side of the bond with the aromatic hydrocarbon group. Therefore, it is presumed that the colored resin composition of the present invention containing the above-mentioned specific resin can form a film having excellent heat resistance, which is less likely to be decomposed even at a high temperature and is less likely to cause film shrinkage even after heat treatment at a high temperature. Furthermore, since the resin A has the specific substituent, the dispersibility of the coloring material in the colored resin composition can be improved, and the storage stability of the colored resin composition can be improved.
  • the film was heat-treated at 300 ° C. for 5 hours in a nitrogen atmosphere.
  • the thickness of the film is preferably 70% or more, more preferably 80% or more, and further preferably 90% or more of the thickness of the film before the heat treatment.
  • the thickness of the film after being heat-treated at 350 ° C. for 5 hours in a nitrogen atmosphere is preferably 70% or more, preferably 80% or more of the thickness of the film before the heat treatment. Is more preferable, and 90% or more is further preferable.
  • the above physical characteristics can be achieved by a method such as adjusting the type and content of the specific resin to be used.
  • the film when the colored resin composition of the present invention was heated at 200 ° C. for 30 minutes to form a film having a thickness of 0.60 ⁇ m, the film was heat-treated at 300 ° C. for 5 hours in a nitrogen atmosphere.
  • the rate of change ⁇ A of the absorbance of the film after heat treatment represented by the following formula (1) is preferably 50% or less, more preferably 45% or less, and more preferably 40% or less. Is more preferable, and 35% or less is particularly preferable.
  • ⁇ A (%)
  • ⁇ A is the rate of change in the absorbance of the film after heat treatment.
  • A1 is the maximum value of the absorbance in the wavelength range of 400 to 1100 nm of the film before heat treatment.
  • A2 is the absorbance of the film after the heat treatment, and is the absorbance at a wavelength indicating the maximum value of the absorbance of the film before the heat treatment in the wavelength range of 400 to 1100 nm.
  • the above physical characteristics can be achieved by a method such as adjusting the type and content of the specific resin to be used.
  • a wavelength indicating the maximum value of absorbance in the wavelength range of 400 to 1100 nm of the film is preferably 50 nm or less, preferably 45 nm or less. It is more preferable that the wavelength is 40 nm or less.
  • the film when the colored resin composition of the present invention was heated at 200 ° C. for 30 minutes to form a film having a thickness of 0.60 ⁇ m, the film was heat-treated at 300 ° C. for 5 hours in a nitrogen atmosphere.
  • the maximum value of the rate of change ⁇ A ⁇ of the absorbance in the wavelength range of 400 to 1100 nm after the heat treatment is preferably 30% or less, more preferably 27% or less, and more preferably 25% or less. More preferred.
  • the rate of change in absorbance is a value calculated from the following formula (2).
  • ⁇ A ⁇
  • a ⁇ is the rate of change in absorbance at the wavelength ⁇ of the film after heat treatment.
  • A1 ⁇ is the absorbance at the wavelength ⁇ of the film before heat treatment.
  • A2 ⁇ is the absorbance at the wavelength ⁇ of the film after the heat treatment.
  • the above physical characteristics can be achieved by a method such as adjusting the type and content of the specific resin to be used.
  • the transmittance of the film at a wavelength of 400 nm is 80% or more. It is preferable that the composition is. Further, the film preferably has a transmittance of 90% or more at a wavelength of 450 nm. A more preferable embodiment of the film is an embodiment in which the transmittance at a wavelength of 400 nm is 90% or more and the transmittance at a wavelength of 450 nm is 95% or more.
  • the colored resin composition of the present invention can be used for a color filter, a near-infrared transmission filter, a near-infrared cut filter, a black matrix, a light-shielding film, and the like.
  • the color filter examples include a filter having colored pixels that transmit light of a specific wavelength, and at least one colored pixel selected from red pixels, blue pixels, green pixels, yellow pixels, cyan pixels, and magenta pixels. It is preferable that the filter has.
  • the color filter can be formed by using a colored resin composition containing a chromatic coloring material.
  • the near-infrared cut filter examples include a filter having a maximum absorption wavelength in the wavelength range of 700 to 1800 nm.
  • the near-infrared cut filter is preferably a filter having a maximum absorption wavelength in the wavelength range of 700 to 1300 nm, and more preferably a filter having a wavelength in the wavelength range of 700 to 1100 nm.
  • the transmittance of the near-infrared cut filter in the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and further preferably 90% or more. Further, the transmittance at at least one point in the wavelength range of 700 to 1800 nm is preferably 20% or less.
  • the absorbance Amax / absorbance A550 which is the ratio of the absorbance Amax at the maximum absorption wavelength of the near-infrared cut filter to the absorbance A550 at a wavelength of 550 nm, is preferably 20 to 500, more preferably 50 to 500. , 70 to 450, more preferably 100 to 400.
  • the near-infrared cut filter can be formed by using a colored resin composition containing a near-infrared absorbing coloring material.
  • a near-infrared ray transmitting filter is a filter that transmits at least a part of near infrared rays.
  • the near-infrared transmission filter may be a filter (transparent film) that transmits both visible light and near-infrared light, and is a filter that blocks at least a part of visible light and transmits at least a part of near-infrared light. May be good.
  • the maximum value of the transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the transmittance in the wavelength range of 1100 to 1300 nm.
  • a filter satisfying the spectral characteristics having a minimum value of 70% or more is preferably mentioned.
  • the near-infrared transmission filter is preferably a filter that satisfies any of the following spectral characteristics (1) to (4).
  • the maximum value of the transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of the transmittance in the wavelength range of 800 to 1300 nm is.
  • the maximum value of the transmittance in the wavelength range of 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of the transmittance in the wavelength range of 900 to 1300 nm is.
  • the maximum value of the transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of the transmittance in the wavelength range of 1000 to 1300 nm is.
  • the maximum value of the transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of the transmittance in the wavelength range of 1100 to 1300 nm is.
  • a filter that is 70% or more (preferably 75% or more, more preferably 80% or more).
  • the colored resin composition of the present invention can be preferably used as a colored resin composition for a color filter. Specifically, it can be preferably used as a colored resin composition for forming pixels of a color filter, and more preferably used as a colored resin composition for forming red or blue pixels of a color filter. Further, the colored resin composition of the present invention can be preferably used as a colored resin composition for forming pixels of a color filter used in a solid-state image sensor.
  • the film When the colored resin composition of the present invention is applied to a glass substrate and heated at 100 ° C. for 120 seconds to form a film having a film thickness of 0.6 ⁇ m, the film has a maximum transmittance of 70 at a wavelength of 400 to 1100 nm. % Or more (preferably 75% or more, more preferably 80% or more, still more preferably 85% or more), and the minimum value is 30% or less (preferably 25% or less, more preferably 20% or less, still more preferably 15%). The following) is preferable.
  • a colored resin composition capable of forming a film satisfying the above spectral characteristics can be particularly preferably used as a colored resin composition for forming a color filter, a near-infrared transmitting filter or a near-infrared cut filter.
  • the colored resin composition of the present invention is a colored resin composition for pattern formation in a photolithography method. According to this aspect, finely sized pixels can be easily formed. Therefore, it can be particularly preferably used as a colored resin composition for forming pixels of a color filter used in a solid-state image sensor.
  • a colored resin composition containing a component having a polymerizable group (for example, a resin having a polymerizable group or a polymerizable compound) and a photopolymerization initiator is a colored resin composition for pattern formation by a photolithography method. It can be preferably used as a product.
  • the colored resin composition for pattern formation in the photolithography method preferably further contains an alkali-soluble resin.
  • the colored resin composition of the present invention contains a coloring material.
  • the coloring material include a white coloring material, a black coloring material, a chromatic coloring material, and a near-infrared absorbing coloring material.
  • the white color material includes not only pure white color material but also a light gray color material close to white (for example, grayish white, light gray, etc.).
  • the coloring material preferably contains at least one selected from the group consisting of a chromatic color material, a black color material, and a near-infrared absorbing color material, and is selected from the group consisting of a chromatic color material and a near-infrared absorbing color material. It is more preferable to contain at least one chromatic color material, further preferably to contain a chromatic color material, and at least one chromatic color selected from the group consisting of a red color material, a yellow color material, a blue color material and a purple color material. It is more preferable to include a material.
  • the coloring material preferably contains a chromatic color material and a near-infrared absorbing color material, and preferably includes two or more kinds of chromatic color materials and a near-infrared absorbing color material.
  • black may be formed by a combination of two or more kinds of chromatic color materials.
  • the coloring material preferably contains a black coloring material and a near-infrared absorbing coloring material.
  • the colored resin composition of the present invention can be preferably used as a colored resin composition for forming a near-infrared transmission filter.
  • Japanese Patent Application Laid-Open No. 2013-077009, Japanese Patent Application Laid-Open No. 2014-130338, International Publication No. 2015/166779 and the like can be referred to.
  • the coloring material examples include dyes and pigments, and pigments are preferable from the viewpoint of heat resistance.
  • the pigment may be either an inorganic pigment or an organic pigment, but is preferably an organic pigment from the viewpoints of many color variations, ease of dispersion, safety and the like. Further, the pigment preferably contains at least one selected from a chromatic pigment and a near-infrared absorbing pigment, and more preferably contains a chromatic pigment.
  • the pigment may contain at least one selected from phthalocyanine pigments, dioxazine pigments, quinacridone pigments, anthraquinone pigments, perylene pigments, azo pigments, diketopyrrolopyrrole pigments, pyrolopyrrolop pigments, isoindolin pigments and quinophthalone pigments. It is more preferable that it contains at least one selected from a phthalocyanine pigment, a diketopyrrolopyrrole pigment and a pyrrolopyrrole pigment, and even more preferably it contains a phthalocyanine pigment or a diketopyrrolopyrrole pigment.
  • the phthalocyanine pigment has a phthalocyanine pigment having no central metal and copper or zinc as the central metal because it is easy to form a film whose spectral characteristics do not easily fluctuate even after heating to a high temperature (for example, 300 ° C. or higher). Phthalocyanine pigments are preferred.
  • the coloring material contained in the colored resin composition easily forms a film whose spectral characteristics do not easily fluctuate even after being heated to a high temperature (for example, 300 ° C. or higher), and therefore red pigment, yellow pigment, blue pigment and near infrared pigment. It is preferable to contain at least one selected from absorption pigments, more preferably to contain at least one selected from red pigments and blue pigments, and even more preferably to include blue pigments.
  • the coloring material contained in the colored resin composition preferably contains a pigment A that satisfies the following condition 1.
  • a coloring material having such characteristics it is possible to form a film whose spectral characteristics are less likely to fluctuate even after heating to a high temperature (for example, 300 ° C. or higher).
  • the ratio of the pigment A in the total amount of the pigment contained in the colored resin composition is preferably 20 to 100% by mass, more preferably 30 to 100% by mass, and further preferably 40 to 100% by mass. preferable.
  • A11 is the maximum value of the absorbance in the wavelength range of 400 to 1100 nm of the film before heat treatment.
  • A12 is the absorbance of the film after the heat treatment, which is the absorbance at the wavelength indicating the maximum value of the absorbance of the film before the heat treatment in the wavelength range of 400 to 1100 nm;
  • Resin 1 is a resin having the following structure, and the numerical values added to the main chain are molar ratios, the weight average molecular weight is 11000, and the acid value is 32 mgKOH / g.
  • Pigment A that satisfies the above condition 1 includes C.I. I. Pigment Red 254, C.I. I. Pigment Red 264, Pigment Red 272, Pigment Red 122, Pigment Red 177, C.I. I. Pigment Blue 15: 3, C.I. I. Pigment Blue 15: 4, C.I. I. Pigment Blue 15: 6, C.I. I. Pigment Blue 16 and the like.
  • the average primary particle size of the pigment is preferably 1 to 200 nm.
  • the lower limit is preferably 5 nm or more, more preferably 10 nm or more.
  • the upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less.
  • the primary particle size of the pigment can be determined from the photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment.
  • the average primary particle size in the present invention is an arithmetic mean value of the primary particle size for the primary particles of 400 pigments.
  • the primary particles of the pigment refer to independent particles without agglomeration.
  • the chromatic color material examples include a color material having a maximum absorption wavelength in the wavelength range of 400 to 700 nm. For example, a yellow color material, an orange color material, a red color material, a green color material, a purple color material, a blue color material, and the like can be mentioned. From the viewpoint of heat resistance, the chromatic color material is preferably a pigment (chromatic pigment), more preferably a red pigment, a yellow pigment, and a blue pigment, and further preferably a red pigment and a blue pigment. Specific examples of the chromatic pigment include those shown below.
  • C.I. I. Pigment Red 254, C.I. I. Pigment Red 264, Pigment Red 272, Pigment Red 122, Pigment Red 177 are preferable.
  • C.I. I. Pigment Blue 15: 3 C.I. I. Pigment Blue 15: 4
  • C.I. I. Pigment Blue 15: 6 C.I. I. Pigment Blue 16 is preferable.
  • a halogenated zinc phthalocyanine having an average of 10 to 14 halogen atoms in one molecule, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms. Pigments can also be used. Specific examples include the compounds described in WO 2015/118720.
  • a green pigment the compound described in Chinese Patent Application Publication No. 1069009027, the phthalocyanine compound having a phosphate ester described in International Publication No. 2012/10395 as a ligand, and Japanese Patent Application Laid-Open No. 2019-008014.
  • the phthalocyanine compound of the above, the phthalocyanine compound described in JP-A-2018-180023, the compound described in JP-A-2019-038958, and the like can also be used.
  • an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP2012-247591A and paragraph numbers 0047 of JP2011-157478A.
  • X 1 to X 16 independently represent a hydrogen atom or a halogen atom, and Z 1 represents an alkylene group having 1 to 3 carbon atoms.
  • Specific examples of the compound represented by the formula (QP1) include the compounds described in paragraph No. 0016 of Japanese Patent No. 6443711.
  • Y 1 ⁇ Y 3 represents a halogen atom independently.
  • n and m represent integers of 0 to 6, and p represents an integer of 0 to 5.
  • N + m is 1 or more.
  • Specific examples of the compound represented by the formula (QP2) include the compounds described in paragraphs 0047 to 0048 of Japanese Patent No. 6432077.
  • a red color material As a red color material, a diketopyrrolopyrrole compound in which at least one bromine atom is substituted in the structure described in JP-A-2017-201384, and a diketopyrrolopyrrole compound described in paragraphs 0016 to 0022 of Patent No. 6248838.
  • Diketopyrrolopyrrole compound described in WO2012 / 102399 Diketopyrrolopyrrole compound described in WO2012 / 117965, naphtholazo compound described in JP2012-229344, patent No. 6516119.
  • the compound described in No. 6525101, the compound described in Patent No. 6525101, and the like can also be used.
  • red color material a compound having a structure in which an aromatic ring group having an oxygen atom, a sulfur atom or a nitrogen atom bonded to the aromatic ring is bonded to a diketopyrrolopyrrole skeleton is used. You can also. As such a compound, a compound represented by the formula (DPP1) is preferable, and a compound represented by the formula (DPP2) is more preferable.
  • R 11 and R 13 independently represent a substituent
  • R 12 and R 14 independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group
  • n 11 and n 13 are independent of each other.
  • X 12 and X 14 independently represent an oxygen atom, a sulfur atom or a nitrogen atom
  • m12 represents 1 and X.
  • m12 represents 2 when X 14 is a nitrogen atom.
  • the substituents represented by R 11 and R 13 include an alkyl group, an aryl group, a halogen atom, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heteroaryloxycarbonyl group, an amide group, a cyano group, a nitro group and a trifluoro group.
  • Preferred specific examples include a methyl group, a sulfoxide group, and a sulfo group.
  • the chromatic dyes include pyrazole azo compounds, anilino azo compounds, triarylmethane compounds, anthraquinone compounds, anthrapylidene compounds, benzylidene compounds, oxonor compounds, pyrazorotriazole azo compounds, pyridone azo compounds, cyanine compounds, phenothiazine compounds, and pyropyrazole azomethine compounds. , Xanthene compound, phthalocyanine compound, benzopyran compound, indigo compound, pyromethene compound and the like.
  • Two or more kinds of chromatic color materials may be used in combination. Further, when two or more kinds of chromatic color materials are used in combination, black may be formed by a combination of two or more kinds of chromatic color materials. Examples of such a combination include the following aspects (1) to (7).
  • the colored resin composition of the present invention transmits near infrared rays. It can be preferably used as a filter.
  • An embodiment containing a red color material, a blue color material, a yellow color material, and a purple color material (3) An embodiment containing a red color material, a blue color material, a yellow color material, and a purple color material. (4) An embodiment containing a red color material, a blue color material, a yellow color material, a purple color material, and a green color material. (5) An embodiment containing a red color material, a blue color material, a yellow color material, and a green color material. (6) An embodiment containing a red color material, a blue color material, and a green color material. (7) An embodiment containing a yellow color material and a purple color material.
  • White coloring materials include titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, Examples thereof include hollow resin particles and inorganic pigments (white pigments) such as zinc sulfide.
  • the white pigment is preferably particles having a titanium atom, and more preferably titanium oxide.
  • the white pigment is preferably particles having a refractive index of 2.10 or more with respect to light having a wavelength of 589 nm. The above-mentioned refractive index is preferably 2.10 to 3.00, and more preferably 2.50 to 2.75.
  • titanium oxide described in "Titanium Oxide Physical Properties and Applied Technology, by Manabu Kiyono, pp. 13-45, published on June 25, 1991, published by Gihodo Publishing" can also be used.
  • the white pigment is not limited to a single inorganic substance, but particles compounded with other materials may be used. For example, particles having pores or other materials inside, particles in which a large number of inorganic particles are attached to core particles, core particles composed of core particles composed of polymer particles, and shell composite particles composed of a shell layer composed of inorganic nanoparticles are used. Is preferable.
  • the core and shell composite particles composed of the core particles composed of the polymer particles and the shell layer composed of the inorganic nanoparticles for example, the description in paragraphs 0012 to 0042 of JP2015-047520 can be referred to. This content is incorporated herein by reference.
  • Hollow inorganic particles can also be used as the white pigment.
  • Hollow inorganic particles are inorganic particles having a structure having cavities inside, and refer to inorganic particles having cavities surrounded by an outer shell.
  • Examples of the hollow inorganic particles include the hollow inorganic particles described in JP-A-2011-075786, International Publication No. 2013/061621, JP-A-2015-164881, and the like, and the contents thereof are incorporated in the present specification. Is done.
  • Black color material The black color material is not particularly limited, and known materials can be used.
  • inorganic pigments black pigments
  • carbon black and titanium black being preferable, and titanium black being more preferable.
  • Titanium black is black particles containing a titanium atom, and low-order titanium oxide or titanium oxynitride is preferable.
  • the surface of titanium black can be modified as needed for the purpose of improving dispersibility and suppressing cohesion.
  • Titanium black preferably has a small primary particle size and an average primary particle size of each particle. Specifically, the average primary particle size is preferably 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion containing titanium black particles and silica particles and having a content ratio of Si atoms and Ti atoms in the dispersion adjusted in the range of 0.20 to 0.50 can be mentioned. Regarding the above dispersion, the description in paragraphs 0020 to 0105 of JP2012-169556A can be referred to, and the contents thereof are incorporated in the present specification.
  • titanium black products examples include titanium black 10S, 12S, 13R, 13M, 13M-C, 13RN, 13MT (trade name: manufactured by Mitsubishi Materials Corporation), Tilak D (trade name: manufactured by Mitsubishi Materials Corporation). Product name: Ako Kasei Co., Ltd.) and the like.
  • an organic black color material such as a bisbenzofuranone compound, an azomethin compound, a perylene compound, or an azo compound
  • the bisbenzofuranone compound include the compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234.
  • the perylene compound include the compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. I. Pigment Black 31, 32 and the like can be mentioned.
  • the azomethine compound include compounds described in JP-A-01-170601 and JP-A-02-0346664, and are available as, for example, "Chromofine Black A1103" manufactured by Dainichiseika.
  • the coloring material used in the colored resin composition of the present invention may be only the above-mentioned black coloring material, or may further contain a chromatic coloring material. According to this aspect, it is easy to obtain a composition capable of forming a film having a high light-shielding property in the visible region.
  • chromatic color material 100: 10 to 300, preferably 100: 20 to 200. Is more preferable.
  • Preferred combinations of the black color material and the chromatic color material include, for example, the following.
  • A-1) An embodiment containing an organic black color material and a blue color material.
  • A-2) An embodiment containing an organic black color material, a blue color material, and a yellow color material.
  • A-3) An embodiment containing an organic black color material, a blue color material, a yellow color material, and a red color material.
  • A-4) An embodiment containing an organic black color material, a blue color material, a yellow color material, and a purple color material.
  • the near-infrared absorbing color material is preferably a pigment, more preferably an organic pigment. Further, the near-infrared absorbing color material preferably has a maximum absorption wavelength in a range of more than 700 nm and 1400 nm or less. The maximum absorption wavelength of the near-infrared absorbing color material is preferably 1200 nm or less, more preferably 1000 nm or less, and further preferably 950 nm or less.
  • the near-infrared absorbing color material preferably has A 550 / A max, which is the ratio of the absorbance A 550 at a wavelength of 550 nm to the absorbance A max at the maximum absorption wavelength, of 0.1 or less, preferably 0.05 or less. More preferably, it is more preferably 0.03 or less, and particularly preferably 0.02 or less.
  • the lower limit is not particularly limited, but can be, for example, 0.0001 or more, or 0.0005 or more.
  • the maximum absorption wavelength of the near-infrared absorbing color material and the value of the absorbance at each wavelength are values obtained from the absorption spectrum of the film formed by using the colored resin composition containing the near-infrared absorbing color material. ..
  • the near-infrared absorbing coloring material is not particularly limited, but is pyrolopyrrole compound, cyanine compound, squarylium compound, phthalocyanine compound, naphthalocyanine compound, quaterylene compound, merocyanine compound, croconium compound, oxonor compound, iminium compound, dithiol compound, and tria.
  • Examples thereof include a reelmethane compound, a pyromethene compound, an azomethine compound, an anthraquinone compound, a dibenzofuranone compound, and a dithiolene metal complex.
  • Examples of the pyrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP2009-263614, the compounds described in paragraphs 0037 to 0052 of JP2011-066731, and International Publication No. 2015/166783. Examples thereof include the compounds described in paragraphs 0010 to 0033.
  • Examples of the squarylium compound include the compounds described in paragraphs 0044 to 0049 of JP2011-208101A, the compounds described in paragraphs 0060 to 0061 of Patent No. 6065169, and paragraph numbers 0040 of International Publication No. 2016/181987. , The compound described in JP-A-2015-176046, the compound described in paragraph number 0072 of International Publication No.
  • JP2012-077153 the oxytitanium phthalocyanine described in JP2006-343631, and paragraphs 0013 to 0029 of JP2013-195480.
  • vanadium phthalocyanine compound described in Japanese Patent No. 6081771.
  • examples of the naphthalocyanine compound include the compounds described in paragraph No. 0093 of JP2012-077153.
  • Examples of the dithiolene metal complex include the compounds described in Japanese Patent No. 5733804.
  • Examples of the near-infrared absorbing color material include a squarylium compound described in JP-A-2017-197437, a squarylium compound described in JP-A-2017-025311, a squarylium compound described in International Publication No. 2016/154782, and a patent.
  • Squalylium compound described in Japanese Patent No. 5884953 Squalylium compound described in Japanese Patent No. 6036689
  • Squalylium compound described in Japanese Patent No. 5810604 Squalylium compound described in paragraph Nos. 0090 to 0107 of International Publication No. 2017/213047.
  • the amide-linked squalylium compound of JP-A-2017-141215 a compound having a pyrrole bis-type squalylium skeleton or a croconium skeleton described in JP-A-2017-141215, a dihydrocarbazole-type squalylium compound described in JP-A-2017-082029, JP-A-2017
  • the content of the coloring material in the total solid content of the colored resin composition is preferably 30% by mass or more, more preferably 40% by mass or more, further preferably 50% by mass or more, and 60% by mass. % Or more is even more preferable.
  • the content of the coloring material in the total solid content of the colored resin composition is preferably 90% by mass or less, and more preferably 80% by mass or less.
  • the content of the pigment in the total solid content of the colored resin composition is preferably 30% by mass or more, more preferably 40% by mass or more, further preferably 50% by mass or more, and 60% by mass. It is even more preferably mass% or more.
  • the content of the pigment in the total solid content of the colored resin composition is preferably 90% by mass or less, and more preferably 80% by mass or less.
  • the content of the dye in the coloring material is preferably 50% by mass or less, more preferably 40% by mass or less, and further preferably 30% by mass or less. Further, it is also preferable that the colored resin composition of the present invention does not substantially contain a dye because it is easy to more effectively suppress the change in film thickness when the obtained film is heated to a high temperature.
  • the content of the dye in the total solid content of the colored resin composition of the present invention is preferably 0.1% by mass or less, preferably 0.05. It is more preferably mass% or less, and particularly preferably not contained.
  • the colored resin composition of the present invention contains a resin.
  • the resin contained in the colored resin composition includes a resin A (hereinafter, also referred to as a specific resin) containing a repeating unit (A) represented by the following formula (a).
  • La1 represents a trivalent group.
  • Ar a1 represents an aromatic hydrocarbon group having a substituent and represents The substituent is a group having a structure in which the bonding portion with the aromatic hydrocarbon group is an ester bond or an amide bond.
  • the ester bond an atom on the side different from the oxygen atom in the ester bond is on the bonding portion side with the aromatic hydrocarbon group.
  • the amide bond an atom on the side different from the nitrogen atom in the amide bond is on the bonding portion side with the aromatic hydrocarbon group.
  • Aliphatic hydrocarbon group As a trivalent group represented by La1 of the above formula (a), Aliphatic hydrocarbon group; Aromatic hydrocarbon groups; Heterocyclic group; A group represented by at least two bonds selected from the group consisting of aliphatic hydrocarbon groups, aromatic hydrocarbon groups and heterocyclic groups; and From at least one selected from the group consisting of aliphatic hydrocarbon groups, aromatic hydrocarbon groups and heterocyclic groups, and from -O-, -CO-, -COO-, -OCO-, -NH- and -N ⁇ . A group represented by a bond with at least one selected from the group; and the like.
  • the number of carbon atoms of the aliphatic hydrocarbon group is preferably 1 to 20, more preferably 1 to 15, further preferably 1 to 10, and even more preferably 1 to 5.
  • the aliphatic hydrocarbon group is more preferably an aliphatic saturated hydrocarbon group.
  • the number of carbon atoms of the aromatic hydrocarbon group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12.
  • the number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3.
  • the hetero atom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom.
  • heterocyclic group L a1 represents is preferably a heterocyclic 5- or 6-membered ring.
  • the above aliphatic hydrocarbon group, aromatic hydrocarbon group and heterocyclic group may have a substituent.
  • substituents include a halogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyl group and an acyloxy group.
  • the substituent is preferably an alkyl group or an aryl group.
  • the trivalent group represented by La1 is preferably an aliphatic hydrocarbon group, and more preferably an aliphatic saturated hydrocarbon group, because the effects of the present invention can be remarkably obtained.
  • Ar a1 that can go to the formula (a) represents an aromatic hydrocarbon group having a specific substituent (hereinafter, also referred to as an aromatic hydrocarbon group A).
  • the number of carbon atoms constituting the aromatic hydrocarbon ring in the aromatic hydrocarbon group A is preferably 6 to 30 carbon atoms, and more preferably 6 to 20 carbon atoms.
  • Specific examples of the aromatic hydrocarbon ring include a benzene ring and a naphthalene ring, and a benzene ring is preferable.
  • the specific substituent contained in the aromatic hydrocarbon group A is a group having a structure in which the bonding portion with the aromatic hydrocarbon group is an ester bond or an amide bond.
  • the ester group of the specific substituent an atom on the side different from the oxygen atom in the ester bond is on the bonding portion side with the aromatic hydrocarbon group, and in the amide bond of the specific substituent, nitrogen in the amide bond.
  • the atom on the side different from the atom is on the bond side with the aromatic hydrocarbon group.
  • the aromatic hydrocarbon group A has the specific substituent (a group having a structure in which the bonding portion with the aromatic hydrocarbon group is an ester group or an amide group)
  • the heat resistance of the obtained film can be further improved. ..
  • the dispersibility of the coloring material in the colored resin composition can be improved, and the storage stability of the colored resin composition can be improved.
  • the number of specific substituents contained in one aromatic hydrocarbon group A is preferably 1 to 3, more preferably 1 or 2, and even more preferably 1.
  • one aromatic hydrocarbon group A preferably has 1 to 3 of the above-mentioned specific substituents, more preferably 1 or 2, and even more preferably 1.
  • the aromatic hydrocarbon group A may have a specific substituent at any of the para-position, the ortho-position and the meta-position of the bond with La 1, but it is easy to improve the heat resistance. it preferably has a specific substituent at the para position of the junction of the L a1.
  • the ester bond means a bond formed by an oxo acid and an alcohol.
  • the oxo acid include carboxylic acid, sulfonic acid, and phosphoric acid.
  • Specific examples of the ester bond include a carboxylic acid ester bond, a sulfonic acid ester bond, a phosphoric acid ester bond, and the like, and a carboxylic acid ester bond is preferable.
  • the amide bond include a carboxylic acid amide bond and a sulfonic acid amide bond, and a carboxylic acid amide bond is preferable.
  • Specific examples of the specific substituent include groups represented by the formulas (Q-1) to (Q-5), which can be obtained with good dispersibility of the coloring material in the colored resin composition.
  • the group represented by the formula (Q-1) is preferable because it is easy to improve the heat resistance of the film.
  • RQ1 , RQ2 , RQ3 , RQ6 and RQ8 each independently represent a substituent.
  • RQ4 , RQ5 and RQ7 independently represent hydrogen atoms or substituents, respectively.
  • Indicates a connecting hand n1 represents an integer of 1 or more and less than or equal to the maximum number of permutations of Ar 1.
  • an aliphatic hydrocarbon group having 1 to 20 carbon atoms is preferable, and an aliphatic saturated hydrocarbon group having 1 to 20 carbon atoms is more preferable.
  • an aromatic hydrocarbon group having 6 to 30 carbon atoms is preferable, and an aromatic hydrocarbon group having 6 to 20 carbon atoms is more preferable.
  • the aromatic hydrocarbon group is preferably a phenyl group or a naphthyl group, and more preferably a phenyl group.
  • the aliphatic hydrocarbon group and the aromatic hydrocarbon group may further have a substituent.
  • Examples of the substituent include an acid group such as a phenolic hydroxy group, a carboxy group, a sulfo group and a phosphoric acid group, and a crosslinkable group.
  • the number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3.
  • the hetero atom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom.
  • the number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 20, more preferably 3 to 18, and even more preferably 3 to 12.
  • Examples of the crosslinkable group include an ethylenically unsaturated bond-containing group and a cyclic ether group.
  • Examples of the ethylenically unsaturated bond-containing group include (meth) acryloyl group, (meth) acryloyloxy group, (meth) acrylamide group, vinylphenyl group, allyl group and the like, and (meth) acryloyl from the viewpoint of reactivity.
  • An oxy group is preferred.
  • Cyclic ether groups include epoxy groups and oxetanyl groups.
  • polymer chain examples include polymer chains containing at least one structural repeating unit selected from polyester repeating units, polyether repeating units, poly (meth) acrylic repeating units and (poly) styrene repeating units.
  • Specific examples of the polymer chain include a polymer chain containing a repeating unit represented by any of the formulas (P1-1) to (P1-6).
  • the weight average molecular weight of the polymer chain is preferably 500 to 10000.
  • RG1 and RG2 each represent an alkylene group.
  • the alkylene group R G1 and R G2 represents a linear or branched is preferably a chain alkylene group, a linear or branched alkylene group having 2 to 16 carbon atoms having 1 to 20 carbon atoms It is more preferable that it is a linear or branched alkylene group having 3 to 12 carbon atoms.
  • RG3 represents a hydrogen atom, a methyl group, a fluorine atom, a chlorine atom or a hydroxymethyl group, and is preferably a hydrogen atom or a methyl group.
  • Q G1 represents -O- or -NR q-
  • R q represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group.
  • Q G1 is preferably —O—.
  • L G1 represents a single bond or an arylene group, is preferably a single bond.
  • LG2 represents a single bond or a divalent linking group, and is preferably a single bond.
  • the divalent linking group includes an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, and -SO 2-. , -CO-, -O-, -COO-, -OCO-, -S-, -NHCO-, -CONH-, and a group consisting of a combination of two or more of these are examples, which are an alkylene group or an arylene group. Is preferable.
  • RG4 represents a hydrogen atom or a substituent.
  • substituent a halogen atom, a hydroxy group, a carboxy group, a sulfo group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, an acyl group, an acyloxy group, an alkylthioether group, an arylthioether group, and a crosslinkable group.
  • the group etc. can be mentioned.
  • RG5 represents a hydrogen atom or a methyl group
  • RG6 represents an aryl group.
  • the aryl group represented by RG6 preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and even more preferably 6 to 12 carbon atoms.
  • the aryl group represented by RG6 may have a substituent.
  • a halogen atom a hydroxy group, a carboxy group, a sulfo group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, an acyl group, an acyloxy group, an alkylthioether group, an arylthioether group, and a crosslinkable group.
  • a halogen atom a hydroxy group, a carboxy group, a sulfo group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, an acyl group, an acyloxy group, an alkylthioether group, an arylthioether group, and a crosslinkable group.
  • La 1 and Ar a 1 may be combined to form a ring.
  • the ring to be formed is preferably an aliphatic hydrocarbon ring, and more preferably a 5-membered ring or a 6-membered ring.
  • Examples of the repeating unit when L a1 and Ar a1 are combined to form a ring include the following repeating units (AB-3) and (AB-4).
  • the repeating unit (A) is preferably a repeating unit represented by the following formula (1). According to this aspect, the dispersibility of the coloring material in the colored resin composition is good, and the heat resistance of the obtained film can be further improved.
  • R 11 to R 13 independently represent a hydrogen atom, an alkyl group or an aryl group
  • Ar 1 represents an aromatic hydrocarbon group
  • Q 1 is the above-mentioned formula (Q-1).
  • n1 represents an integer of 1 or more and less than or equal to the maximum number of substitutions of Ar 1.
  • R 11 to R 13 of the formula (1) independently represent a hydrogen atom, an alkyl group or an aryl group, and are preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.
  • an alkyl group having 1 to 10 carbon atoms is preferable, an alkyl group having 1 to 4 carbon atoms is more preferable, and a methyl group is further preferable.
  • the alkyl group may be a linear, branched, or cyclic alkyl group, but is preferably a linear alkyl group.
  • an aryl group having 6 to 30 carbon atoms is preferable, an aryl group having 6 to 20 carbon atoms is more preferable, a phenyl group and a naphthyl group are further preferable, and a phenyl group is particularly preferable.
  • Ar 1 of the formula (1) represents an aromatic hydrocarbon group, and an aromatic hydrocarbon group having 6 to 30 carbon atoms is preferable, and an aromatic hydrocarbon group having 6 to 20 carbon atoms is more preferable.
  • the aromatic hydrocarbon group is preferably a phenyl group or a naphthyl group, and more preferably a phenyl group.
  • the aromatic hydrocarbon group represented by Ar 1 may have a substituent.
  • a halogen atom a hydroxy group, a carboxy group, a sulfo group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, an acyl group, an acyloxy group, an alkylthioether group, an arylthioether group, and a crosslinkable group.
  • the group etc. can be mentioned.
  • Equation (1) represents a group represented by any one of formulas (Q-1) ⁇ formula (Q-5), is preferably a group represented by the formula (Q-1).
  • n1 represents an integer of 1 or more and not more than the maximum number of substitutions of Ar 1 , and an integer of 1 to 3 is preferable, 1 or 2 is more preferable, and 1 is further preferable.
  • the maximum number of substituents Ar 1 refers to the maximum number of substituents that can be possessed by the aromatic hydrocarbon group represented by Ar 1, when Ar 1 is a phenyl group, the maximum number of substituents is 5.
  • the above contents are the same in the description of the maximum number of substitutions.
  • the repeating unit (A) is preferably a repeating unit represented by the following formula (2).
  • R 21 ⁇ R 23 are each independently a hydrogen atom, an alkyl group or an aryl group
  • R 24 represents a substituent
  • R Q11 represents a substituent
  • n11 is 1-5 It represents an integer
  • n12 represents an integer of 0 to 4
  • n11 + n12 is 1 to 5.
  • R 21 to R 23 of the formula (2) independently represent a hydrogen atom, an alkyl group or an aryl group, and are preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.
  • the alkyl and aryl groups represented by R 21 to R 23 are synonymous with the alkyl and aryl groups represented by R 11 to R 13 of the formula (1), and the preferred range is also the same.
  • R Q11 represents the formula (2) is the same as the substituents represented by R Q1 of the above formula (Q1), and preferred ranges are also the same.
  • the substituent represented by R 24 in the formula (2) includes a halogen atom, a hydroxy group, a carboxy group, a sulfo group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, an acyl group, an acyloxy group and an alkylthio.
  • a halogen atom a hydroxy group, a carboxy group, a sulfo group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, an acyl group, an acyloxy group and an alkylthio.
  • Examples thereof include an ether group, an arylthioether group and a crosslinkable group.
  • N11 represents an integer of 1 to 5, preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1.
  • n12 represents an integer of 0 to 4, preferably an integer of 0 to 3, more preferably 0 or 1, and even more preferably 0.
  • the repeating unit represented by the formula (2) is preferably the repeating unit represented by the following formula (2a).
  • R 21 ⁇ R 23 are each independently a hydrogen atom, an alkyl group or an aryl group
  • R 24 represents a substituent
  • R Q11 represents a substituent
  • n12 is 0-4 Represents an integer.
  • the content of the repeating unit (A) in the specific resin is preferably 10 mol% or more, preferably 20 mol% or more, based on the total molar amount of the repeating units contained in the specific resin. % Or more, more preferably 30 mol% or more.
  • the upper limit is not particularly limited and may be 100 mol% or less.
  • the content of the repeating unit (A) in the specific resin is preferably 5% by mass or more, more preferably 10% by mass or more, based on the mass of the specific resin. It is preferably 15% by mass or more, and more preferably 15% by mass or more.
  • the upper limit is not particularly limited and may be 100% by mass or less.
  • the specific resin preferably contains a repeating unit having an acid group in addition to the repeating unit (A) described above.
  • the dispersibility of the coloring material can be improved and the alkali developability can be improved.
  • the acid group include a phenolic hydroxy group, a carboxy group, a sulfo group, a phosphoric acid group and the like, and a carboxy group is preferable.
  • the structure of the repeating unit having an acid group include a repeating unit having at least one structure selected from a polyester repeating unit, a polyether repeating unit, a poly (meth) acrylic repeating unit and a (poly) styrene repeating unit. From the viewpoint of heat resistance of the film to be obtained, a (poly) styrene repeating unit and a poly (meth) acrylic repeating unit are preferable.
  • the content of the repeating unit having an acid group in the specific resin is preferably 30 to 95 mol%, more preferably 40 to 90 mol%, based on the total molar amount of the repeating unit contained in the specific resin. It is preferably 50 to 85 mol%, more preferably 50 to 85 mol%.
  • the content of the repeating unit having an acid group in the specific resin is preferably 5 to 50% by mass, more preferably 10 to 40% by mass, and 15 to 30% by mass with respect to the mass of the specific resin. It is more preferably mass%.
  • the specific resin preferably contains a repeating unit having a crosslinkable group in addition to the repeating unit (A) described above. According to this aspect, a film having more excellent heat resistance can be easily obtained.
  • the crosslinkable group include an ethylenically unsaturated bond-containing group and a cyclic ether group.
  • the ethylenically unsaturated bond-containing group include (meth) acryloyl group, (meth) acryloyloxy group, (meth) acrylamide group, vinylphenyl group, allyl group and the like, and (meth) acryloyl from the viewpoint of reactivity.
  • An oxy group is preferred.
  • Cyclic ether groups include epoxy groups and oxetanyl groups.
  • Examples of the structure of the repeating unit having a crosslinkable group include a repeating unit having at least one structure selected from a polyester repeating unit, a polyether repeating unit, a poly (meth) acrylic repeating unit and a (poly) styrene repeating unit. From the viewpoint of heat resistance of the obtained film, (poly) styrene repeating unit and poly (meth) acrylic repeating unit are preferable.
  • the content of the repeating unit having a crosslinkable group in the specific resin is preferably 20 to 90 mol%, preferably 30 to 85 mol%, based on the total molar amount of the repeating unit contained in the specific resin. More preferably, it is 40 to 80 mol%.
  • the content of the repeating unit having a crosslinkable group in the specific resin is preferably 20 to 90% by mass, more preferably 30 to 85% by mass, and 40 to 40% by mass with respect to the mass of the specific resin. It is more preferably 80% by mass.
  • the specific resin may be a linear polymer, a star polymer, or a graft polymer compound, but the graft polymer or the graft polymer or a graft polymer because it is easy to obtain a colored resin composition having excellent storage stability. It is preferably a star-shaped polymer.
  • the repeating unit (A) may be contained in the main chain of the graft polymer or in the graft chain. Further, each of the main chain and the graft chain may have a repeating unit (A).
  • the graft chain is preferably a polymer chain having a molecular weight of 1000 to 10000 and having no acid group or basic group.
  • the main chain of the polyester repeating unit, the polyether repeating unit, the poly (meth) acrylic repeating unit or the (poly) styrene repeating unit contains the repeating unit (A) as a side chain.
  • the repeating unit (A) as a side chain. Examples thereof include a resin having a repeating unit of a structure having a graft chain.
  • the graft polymer may further have a repeating unit having an acid group and a repeating unit having a crosslinkable group.
  • the specific resin is preferably a resin represented by the following formula (S-1).
  • S1 represents (ms1 + ns1) valent organic linking group, are each R S2 independently represents a single bond or a (ns2 + 1) -valent linking group
  • a S1 is independently hydroxy Represents at least one group selected from the group consisting of a group, a carboxy group, a sulfo group, a phosphate group, and an amino group
  • RS3 independently represents a single or divalent linking group, P.
  • S1 independently represents a polymer chain, ms1 represents an integer of 1 to 8, ns1 represents an integer of 2 to 9, ms1 + ns1 is 3 to 10, and ns2 is an integer of 1 or more.
  • ms is 1, PS1 is a polymer chain containing the repeating unit (A), and when ms is 2, at least one PS1 out of ms PS1 is the repeating unit (A). ) Is a polymer chain containing.
  • the R S1 represents (ms1 + ns1) -valent organic linking group of the formula (S1), 1 - 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 Groups consisting of up to 200 hydrogen atoms and 0 to 20 sulfur atoms are listed, with 1 to 60 carbon atoms, 0 to 10 nitrogen atoms, 0 to 40 oxygen atoms, 1 A group consisting of 1 to 120 hydrogen atoms and 0 to 10 sulfur atoms is preferable, and 1 to 50 carbon atoms, 0 to 10 nitrogen atoms, 0 to 30 oxygen atoms, 1 More preferably, a group consisting of 1 to 100 hydrogen atoms and 0 to 7 sulfur atoms, 1 to 40 carbon atoms, 0 to 8 nitrogen atoms, 0 to 20 oxygen atoms, A group consisting of 1 to 80 hydrogen atoms and 0 to 5 sulfur atoms is particularly preferable.
  • R S1 represents (ms1 + ns1)
  • Linking group formula represents (S-1) of the R S2 (ns2 + 1 valence), and, as the divalent linking group R S3 represents 1 to 50 carbon atoms, 0 to 8 nitrogen atoms, Examples include groups consisting of 0 to 25 oxygen atoms, 1 to 100 hydrogen atoms, and 0 to 10 sulfur atoms, 1 to 30 carbon atoms, and 0 to 6 nitrogen atoms. , Preferably a group consisting of 0 to 15 oxygen atoms, 1 to 50 hydrogen atoms, and 0 to 7 sulfur atoms, 1 to 10 carbon atoms, 0 to 5 nitrogens.
  • Examples of the linking group represented by RS2 and RS3 include a group composed of the following structural units or a combination of two or more of the following structural units.
  • RS2 is a single bond, or 1 to 30 carbon atoms, 0 to 6 nitrogen atoms, 0 to 15 oxygen atoms, 1 to 50 hydrogen atoms, and 0 to 7
  • a group consisting of 1 sulfur atom is preferable, and a single bond or 1 to 10 carbon atom, 0 to 5 nitrogen atom, 0 to 10 oxygen atom, 1 to 30 hydrogen atom, And a divalent group consisting of 0 to 5 sulfur atoms is more preferred.
  • R S3 represents a single bond or -S- are preferred, -S- is more preferable.
  • Examples of the polymer chain represented by PS1 include polymer chains containing at least one structural repeating unit selected from polyester repeating units, polyether repeating units, poly (meth) acrylic repeating units and (poly) styrene repeating units. .. Specific examples include the repeating unit (A) described above, the repeating unit represented by the above formula (P1-1), the repeating unit represented by the above formula (P1-2), and the above formula (P1-3). At least selected from the repeating unit represented by the above formula (P1-4), the repeating unit represented by the above formula (P1-5) and the repeating unit represented by the above formula (P1-6).
  • Examples thereof include a polymer chain containing one type of repeating unit, and a polymer chain containing the above-mentioned repeating unit (A) is preferable.
  • the weight average molecular weight of the polymer chain is preferably 500 to 10000.
  • the polymer chain represented by PS1 is preferably a polymer chain having no acid group and basic group.
  • Ms1 in the formula (S-1) represents an integer of 1 to 8, preferably 1 to 5, more preferably 1 to 4, and particularly preferably 2 to 4.
  • Ns1 in the formula (S-1) represents an integer of 2 to 9, preferably 2 to 8, more preferably 2 to 7, and particularly preferably 2 to 6.
  • Ns2 in the formula (S-1) represents an integer of 1 or more, preferably 1 to 10, more preferably 1 to 4, and even more preferably 1 or 2.
  • the star-shaped polymer represented by the formula (S-1) is preferably a star-shaped polymer represented by the formula (S-2).
  • S-2 R S1 , A S1, P S1, ns1, ns2, and ms1 each, R S1 in the formula (S1), A S1, P S1, ns1, ns2, and ms1 and It has the same meaning, and the preferred embodiment is also the same.
  • R S4 of formula (S-2) represents a single bond or a (ns2 + 1) -valent linking group.
  • the linking group R S4 represents (ns2 + 1) valence, 1 to 50 carbon atoms, 0 to 8 nitrogen atoms, 0 to 25 oxygen atoms, 1 to 100 hydrogen atoms and, Groups consisting of 0 to 10 sulfur atoms include 1 to 30 carbon atoms, 0 to 6 nitrogen atoms, 0 to 15 oxygen atoms, 1 to 50 hydrogen atoms, In addition, a group consisting of 0 to 7 sulfur atoms is preferable, and 1 to 10 carbon atoms, 0 to 5 nitrogen atoms, 0 to 10 oxygen atoms, and 1 to 30 hydrogen atoms are preferable. , And a group consisting of 0 to 5 sulfur atoms is more preferred. Examples of the linking group represented by RS4 include the following structural units or groups formed by combining two or more of the following structural units.
  • RS4 is a single bond, or 1 to 30 carbon atoms, 0 to 6 nitrogen atoms, 0 to 15 oxygen atoms, 1 to 50 hydrogen atoms, and 0 to 7
  • a group consisting of 1 sulfur atom is preferable, and a single bond or 1 to 10 carbon atom, 0 to 5 nitrogen atom, 0 to 10 oxygen atom, 1 to 30 hydrogen atom, And a divalent group consisting of 0 to 5 sulfur atoms is more preferred.
  • the weight average molecular weight (Mw) of the specific resin is preferably 5,000 to 100,000, more preferably 10,000 to 100,000, and even more preferably 10,000 to 50,000.
  • the maximum value of the molar extinction coefficient of the specific resin at a wavelength of 400 to 1100 nm is preferably 0 to 1000 L ⁇ mol -1 ⁇ cm -1 , and more preferably 0 to 100 L ⁇ mol -1 ⁇ cm -1. ..
  • the specific resin preferably has an acid group.
  • the acid group include a phenolic hydroxy group, a carboxy group, a sulfo group, a phosphoric acid group and the like, and a carboxy group is preferable.
  • the acid group may be contained in the above-mentioned repeating unit (A), or may be contained in a repeating unit different from the above-mentioned repeating unit (A).
  • the acid value of the specific resin is preferably 20 to 200 mgKOH / g or more from the viewpoint of improving the film-forming property and the alkali developability.
  • the lower limit of the acid value is preferably 30 mgKOH / g or more, and more preferably 50 mgKOH / g or more.
  • the upper limit of the acid value is preferably 150 mgKOH / g or less.
  • the specific resin preferably has a crosslinkable group.
  • the crosslinkable group include an ethylenically unsaturated bond-containing group and a cyclic ether group.
  • the ethylenically unsaturated bond-containing group include (meth) acryloyl group, (meth) acryloyloxy group, (meth) acrylamide group, vinylphenyl group, allyl group and the like, and (meth) acryloyl from the viewpoint of reactivity.
  • An oxy group is preferred.
  • Cyclic ether groups include epoxy groups and oxetanyl groups.
  • the crosslinkable group may be contained in the above-mentioned repeating unit (A), or may be contained in a repeating unit different from the above-mentioned repeating unit (A).
  • the specific resin preferably has a 5% mass reduction temperature of 280 ° C. or higher, more preferably 300 ° C. or higher, and even more preferably 320 ° C. or higher by TG / DTA (thermogravimetric measurement / differential thermal measurement) in a nitrogen atmosphere.
  • the upper limit of the 5% mass reduction temperature is not particularly limited, and may be, for example, 1,000 ° C. or lower.
  • the 5% mass reduction temperature is determined by a known TG / DTA measuring method as a temperature at which the mass reduction rate becomes 5% when the mixture is allowed to stand at a specific temperature for 5 hours in a nitrogen atmosphere.
  • the specific resin preferably has a mass reduction rate of 10% or less, more preferably 5% or less, and 2% or less when left to stand at 300 ° C. for 5 hours in a nitrogen atmosphere. More preferred.
  • the lower limit of the mass reduction rate is not particularly limited, and may be 0% or more.
  • the mass reduction rate is a value calculated as the rate of mass reduction in the specific resin before and after being allowed to stand at 300 ° C. for 5 hours in a nitrogen atmosphere.
  • the method for synthesizing the specific resin is not particularly limited, and it is possible to synthesize the specific resin by a known method.
  • the content of the specific resin in the colored resin composition of the present invention is preferably 10 to 95% by mass with respect to the total solid content of the colored resin composition.
  • the lower limit is more preferably 20% by mass or more, further preferably 30% by mass or more.
  • the upper limit is more preferably 90% by mass or less, further preferably 85% by mass or less.
  • the colored resin composition of the present invention may contain one specific resin alone, or two or more of them may be used in combination. When two or more kinds of specific resins are used in combination, the total amount is preferably within the above range.
  • the specific resin is preferably contained in an amount of 20% by mass or more, more preferably 30% by mass or more, and 40% by mass or more in the components obtained by removing the coloring material from the total solid content of the colored resin composition. Is even more preferable.
  • the upper limit can be 100% by mass, 90% by mass or less, or 85% by mass or less.
  • the total content of the coloring material and the above-mentioned specific resin in the total solid content of the colored resin composition is preferably 25 to 100% by mass.
  • the lower limit is more preferably 30% by mass or more, further preferably 40% by mass or more.
  • the upper limit is more preferably 90% by mass or less, further preferably 80% by mass or less.
  • the colored resin composition of the present invention may contain a resin other than the above-mentioned specific resin as the resin.
  • examples of other resins include resins having alkali developability, resins as dispersants, and the like.
  • the weight average molecular weight (Mw) of the alkali-developable resin is preferably 3000 to 2000000.
  • the upper limit is more preferably 1,000,000 or less, still more preferably 500,000 or less.
  • the lower limit is more preferably 4000 or more, further preferably 5000 or more.
  • Examples of the resin having alkali developability include (meth) acrylic resin, polyimine resin, polyether resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin and the like, and (meth) acrylic resin and polyimine resin are preferable.
  • (Meta) acrylic resin is more preferable.
  • the resin described in JP-A-2017-032685, the resin described in JP-A-2017-075248, and the resin described in JP-A-066240 can also be used.
  • the resin having alkali developability it is preferable to use a resin having an acid group.
  • the developability of the colored resin composition can be further improved.
  • the acid group include a phenolic hydroxy group, a carboxy group, a sulfo group, a phosphoric acid group, a phosphonic acid group, an active imide group, a sulfonamide group and the like, and a carboxy group is preferable.
  • the resin having an acid group can be used as, for example, an alkali-soluble resin.
  • the alkali-developable resin preferably contains a repeating unit having an acid group in the side chain, and more preferably contains 1 to 70 mol% of the repeating unit having an acid group in the side chain in all the repeating units of the resin.
  • the upper limit of the content of the repeating unit having an acid group in the side chain is preferably 50 mol% or less, more preferably 40 mol% or less.
  • the lower limit of the content of the repeating unit having an acid group in the side chain is preferably 2 mol% or more, and more preferably 5 mol% or more.
  • the acid value of the alkali-developable resin is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, further preferably 120 mgKOH / g or less, and particularly preferably 100 mgKOH / g or less.
  • the acid value of the resin having an acid group is preferably 5 mgKOH / g or more, more preferably 10 mgKOH / g or more, and even more preferably 20 mgKOH / g or more.
  • the alkali-developable resin further has an ethylenically unsaturated bond-containing group.
  • the ethylenically unsaturated bond-containing group include a vinyl group, an allyl group, a (meth) acryloyl group, and the like, preferably an allyl group and a (meth) acryloyl group, and more preferably a (meth) acryloyl group.
  • the resin having an ethylenically unsaturated bond-containing group preferably contains a repeating unit having an ethylenically unsaturated bond-containing group in the side chain, and the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is the whole resin. More preferably, it contains 5-80 mol% in the repeating unit.
  • the upper limit of the content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 60 mol% or less, more preferably 40 mol% or less.
  • the lower limit of the content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 10 mol% or more, more preferably 15 mol% or more.
  • the alkali-developable resin includes a compound represented by the following formula (ED1) and / or a compound represented by the following formula (ED2) (hereinafter, these compounds may be referred to as "ether dimer”). It is also preferable to include repeating units derived from the monomer component.
  • R 1 and R 2 each independently represent a hydrocarbon group having 1 to 25 carbon atoms which may have a hydrogen atom or a substituent.
  • R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms.
  • paragraph number 0317 of JP2013-209760A can be referred to, and this content is incorporated in the present specification.
  • the alkali-developable resin preferably contains a repeating unit derived from the compound represented by the following formula (X).
  • R 1 represents a hydrogen atom or a methyl group
  • R 2 represents an alkylene group having 2 to 10 carbon atoms
  • R 3 represents a hydrogen atom or a benzene ring having 1 to 20 carbon atoms.
  • n represents an integer from 1 to 15.
  • Examples of the resin having alkali developability include a resin having the following structure.
  • Me represents a methyl group.
  • the colored resin composition of the present invention may also contain a resin as a dispersant.
  • the dispersant include an acidic dispersant (acidic resin) and a basic dispersant (basic resin).
  • the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is larger than the amount of basic groups.
  • the acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups accounts for 70 mol% or more when the total amount of the amount of acid groups and the amount of basic groups is 100 mol%, and is substantially an acid. A resin consisting only of groups is more preferable.
  • the acid group of the acidic dispersant (acidic resin) is preferably a carboxy group.
  • the acid value of the acidic dispersant (acidic resin) is preferably 40 to 105 mgKOH / g, more preferably 50 to 105 mgKOH / g, and even more preferably 60 to 105 mgKOH / g.
  • the basic dispersant (basic resin) represents a resin in which the amount of basic groups is larger than the amount of acid groups.
  • the basic dispersant (basic resin) is preferably a resin in which the amount of basic groups exceeds 50 mol% when the total amount of the amount of acid groups and the amount of basic groups is 100 mol%.
  • the basic group contained in the basic dispersant is preferably an amino group.
  • the resin used as the dispersant preferably contains a repeating unit having an acid group.
  • the resin used as the dispersant is also preferably a graft resin.
  • the graft resin include the resins described in paragraphs 0025 to 0094 of JP2012-255128A, the contents of which are incorporated in the present specification.
  • the resin used as the dispersant is a polyimine-based dispersant (polyimine resin) containing a nitrogen atom in at least one of the main chain and the side chain.
  • the polyimine-based dispersant has a main chain having a partial structure having a functional group of pKa14 or less, a side chain having 40 to 10,000 atoms, and a basic nitrogen atom in at least one of the main chain and the side chain.
  • the resin to have is preferable.
  • the basic nitrogen atom is not particularly limited as long as it is a nitrogen atom exhibiting basicity.
  • Examples of the polyimine-based dispersant include the resins described in paragraphs 0102 to 0166 of JP2012-255128A, the contents of which are incorporated in the present specification.
  • the resin used as the dispersant is also preferably a resin having a structure in which a plurality of polymer chains are bonded to the core portion.
  • a resin include dendrimers (including star-shaped polymers).
  • specific examples of the dendrimer include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP2013-043962.
  • the dispersant is also available as a commercially available product, and specific examples thereof include DISPERBYK series manufactured by BYK Chemie (for example, DISPERBYK-111, 161 etc.) and Solspace series manufactured by Lubrizol (for example, Solspire 36000 etc.). And so on. Further, the pigment dispersants described in paragraphs 0041 to 0130 of JP-A-2014-130338 can also be used, and the contents thereof are incorporated in the present specification. Dispersants include JP-A-2018-150498, JP-A-2017-100116, JP-A-2017-100115, JP-A-2016-108520, JP-A-2016-108519, and JP-A-2015. The compound described in Japanese Patent Application Laid-Open No. 232105 may be used.
  • the resin described as the above-mentioned dispersant can also be used for purposes other than the dispersant.
  • it can also be used as a binder.
  • the content of the total resin component in the total solid content of the colored resin composition is preferably 10 to 95% by mass.
  • the lower limit is more preferably 20% by mass or more, further preferably 30% by mass or more.
  • the upper limit is more preferably 90% by mass or less, further preferably 85% by mass or less.
  • the content of the above-mentioned other resin is preferably 230 parts by mass or less, more preferably 200 parts by mass or less, based on 100 parts by mass of the above-mentioned specific resin. It is more preferably 150 parts by mass or less.
  • the lower limit may be 0 parts by mass, 5 parts by mass or more, or 10 parts by mass or more. It is also preferable that the colored resin composition does not substantially contain the other resins described above.
  • the other resin is substantially not contained means that the content of the other resin in the total solid content of the resin composition is 0.1% by mass or less, and is 0.05% by mass or less. It is preferable, and it is more preferable that it is not contained.
  • the colored resin composition of the present invention contains an organic solvent.
  • the organic solvent is basically not particularly limited as long as it satisfies the solubility of each component and the coatability of the colored resin composition.
  • the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents and the like.
  • paragraph No. 0223 of WO 2015/166779 can be referred to, the contents of which are incorporated herein by reference.
  • an ester solvent substituted with a cyclic alkyl group and a ketone solvent substituted with a cyclic alkyl group can also be preferably used.
  • organic solvent examples include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2 -Heptanone, cyclohexanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N, N-dimethylpropanamide, 3-butoxy-N , N-Dimethylpropanamide, gammabutyrolactone, N-methyl-2-pyrrolidone and the like.
  • aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents may need to be reduced for environmental reasons (for example, 50 mass ppm (parts) with respect to the total amount of organic solvent. Per million) or less, 10 mass ppm or less, or 1 mass ppm or less).
  • an organic solvent having a low metal content it is preferable to use an organic solvent having a low metal content, and the metal content of the organic solvent is preferably, for example, 10 mass ppb (parts per parts) or less. If necessary, an organic solvent at the mass ppt (parts per parts) level may be used, and such an organic solvent is provided by, for example, Toyo Synthetic Co., Ltd. (The Chemical Daily, November 13, 2015).
  • Examples of the method for removing impurities such as metals from the organic solvent include distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter.
  • the filter pore diameter of the filter used for filtration is preferably 10 ⁇ m or less, more preferably 5 ⁇ m or less, and even more preferably 3 ⁇ m or less.
  • the filter material is preferably polytetrafluoroethylene, polyethylene or nylon.
  • the organic solvent may contain isomers (compounds having the same number of atoms but different structures). Further, only one kind of isomer may be contained, or a plurality of kinds may be contained.
  • the content of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially free of peroxide.
  • the content of the organic solvent in the colored resin composition is preferably 10 to 95% by mass, more preferably 20 to 90% by mass, and even more preferably 30 to 90% by mass.
  • the colored resin composition of the present invention can contain a pigment derivative.
  • the pigment derivative include compounds having a structure in which a part of the chromophore is replaced with an acid group, a basic group or a phthalimide methyl group.
  • the colorants constituting the pigment derivative include quinoline skeleton, benzoimidazolone skeleton, diketopyrrolopyrrole skeleton, azo skeleton, phthalocyanine skeleton, anthracinone skeleton, quinacridone skeleton, dioxazine skeleton, perinone skeleton, perylene skeleton, thioindigo skeleton, and iso.
  • Indoline skeleton, isoindolinone skeleton, quinophthalone skeleton, slene skeleton, metal complex skeleton, etc. include quinoline skeleton, benzoimidazolone skeleton, diketopyrrolopyrrole skeleton, azo skeleton, quinophthalone skeleton, isoindolin skeleton and phthalocyanine skeleton.
  • the azo skeleton and the benzoimidazolone skeleton are more preferable.
  • the acid group contained in the pigment derivative a sulfo group and a carboxy group are preferable, and a sulfo group is more preferable.
  • an amino group is preferable, and a tertiary amino group is more preferable.
  • a pigment derivative having excellent visible light transparency (hereinafter, also referred to as a transparent pigment derivative) can be used.
  • the maximum value of the molar extinction coefficient in the wavelength region of 400 ⁇ 700 nm of the transparent pigment derivative (.epsilon.max) is that it is preferable, 1000L ⁇ mol -1 ⁇ cm -1 or less is not more than 3000L ⁇ mol -1 ⁇ cm -1 Is more preferable, and 100 L ⁇ mol -1 ⁇ cm -1 or less is further preferable.
  • the lower limit of ⁇ max is, for example, 1 L ⁇ mol -1 ⁇ cm -1 or more, and may be 10 L ⁇ mol -1 ⁇ cm -1 or more.
  • pigment derivative examples include Japanese Patent Application Laid-Open No. 56-118462, Japanese Patent Application Laid-Open No. 63-264674, Japanese Patent Application Laid-Open No. 01-2170777, Japanese Patent Application Laid-Open No. 03-009961, and Japanese Patent Application Laid-Open No. 03-026767.
  • JP-A-2011-52065, JP-A-2003-081972, JP-A-52299151, JP-A-2015-172732 Examples thereof include the compounds described in JP-A-2014-199308, JP-A-2014-0855562, JP-A-2014-035351, JP-A-2008-081565, and JP-A-2019-109512.
  • the content of the pigment derivative is preferably 1 to 30 parts by mass, more preferably 3 to 20 parts by mass with respect to 100 parts by mass of the pigment. Only one type of pigment derivative may be used, or two or more types may be used in combination.
  • the colored resin composition of the present invention can contain a polymerizable compound.
  • the polymerizable compound is preferably, for example, a compound having an ethylenically unsaturated bond-containing group.
  • Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a (meth) allyl group, and a (meth) acryloyl group.
  • the polymerizable compound used in the present invention is preferably a radically polymerizable compound.
  • the polymerizable compound may be in any chemical form such as a monomer, a prepolymer, or an oligomer, but a monomer is preferable.
  • the molecular weight of the polymerizable compound is preferably 100 to 3000.
  • the upper limit is more preferably 2000 or less, and even more preferably 1500 or less.
  • the lower limit is more preferably 150 or more, and even more preferably 250 or more.
  • the polymerizable compound is preferably a compound containing 3 or more ethylenically unsaturated bond-containing groups, more preferably a compound containing 3 to 15 ethylenically unsaturated bond-containing groups, and an ethylenically unsaturated bond. It is more preferable that the compound contains 3 to 6 containing groups.
  • the polymerizable compound is preferably a (meth) acrylate compound having 3 to 15 functionalities, and more preferably a (meth) acrylate compound having 3 to 6 functionalities.
  • polymerizable compound examples include paragraph numbers 0905 to 0108 of JP2009-288705A, paragraphs 0227 of JP2013-209760A, paragraphs 0254 to 0257 of JP2008-292970, and JP-A.
  • Examples include the compounds described in the publication, the contents of which are incorporated herein.
  • dipentaerythritol tri (meth) acrylate commercially available KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.
  • dipentaerythritol tetra (meth) acrylate commercially available KAYARAD D-320) ; Nippon Kayaku Co., Ltd.
  • dipentaerythritol penta (meth) acrylate commercially available KAYARAD D-310; Nihon Kayaku Co., Ltd.
  • dipentaerythritol hexa (meth) acrylate commercially available
  • KAYARAD DPHA manufactured by Nippon Kayaku Co., Ltd.
  • NK ester A-DPH-12E manufactured by Shin-Nakamura Chemical Industry Co., Ltd.
  • these (meth) acryloyl groups via ethylene glycol and / or propylene glycol residues.
  • SR454, SR499 commercially available from Sartmer
  • polymerizable compounds diglycerin EO (ethylene oxide) modified (meth) acrylate (commercially available M-460; manufactured by Toa Synthetic), pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., NK ester A) -TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nihon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toa Synthetic Co., Ltd.) , NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine
  • trimethylolpropane tri (meth) acrylate trimethylolpropane propylene oxide modified tri (meth) acrylate, trimethylolpropane ethylene oxide modified tri (meth) acrylate, isocyanurate ethylene oxide modified tri (meth) acrylate, penta
  • a trifunctional (meth) acrylate compound such as erythritol trimethylolpropane (meth) acrylate.
  • Commercially available trifunctional (meth) acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, and M-305.
  • M-303, M-452, M-450 manufactured by Toagosei Co., Ltd.
  • a compound having an acid group can also be used.
  • the acid group include a carboxy group, a sulfo group, a phosphoric acid group and the like, and a carboxy group is preferable.
  • examples of commercially available products of the polymerizable compound having an acid group include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).
  • the preferable acid value of the polymerizable compound having an acid group is 0.1 to 40 mgKOH / g, and more preferably 5 to 30 mgKOH / g. When the acid value of the polymerizable compound is 0.1 mgKOH / g or more, the solubility in a developing solution is good, and when it is 40 mgKOH / g or less, it is advantageous in production and handling.
  • the polymerizable compound is a compound having a caprolactone structure.
  • Polymerizable compounds having a caprolactone structure are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series, and examples thereof include DPCA-20, DPCA-30, DPCA-60, and DPCA-120.
  • a polymerizable compound having an alkyleneoxy group can also be used.
  • a polymerizable compound having an alkyleneoxy group a polymerizable compound having an ethyleneoxy group and / or a propyleneoxy group is preferable, a polymerizable compound having an ethyleneoxy group is more preferable, and 3 to 3 having 4 to 20 ethyleneoxy groups.
  • a hexafunctional (meth) acrylate compound is more preferred.
  • SR-494 which is a tetrafunctional (meth) acrylate having four ethyleneoxy groups manufactured by Sartmer, and 3 isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.
  • examples thereof include KAYARAD TPA-330, which is a trifunctional (meth) acrylate having individual substances.
  • a polymerizable compound having a fluorene skeleton can also be used.
  • examples of commercially available products of the polymerizable compound having a fluorene skeleton include Ogsol EA-0200 and EA-0300 (manufactured by Osaka Gas Chemical Co., Ltd., a (meth) acrylate monomer having a fluorene skeleton).
  • the polymerizable compound it is also preferable to use a compound that does not substantially contain an environmentally regulated substance such as toluene.
  • an environmentally regulated substance such as toluene.
  • commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).
  • Examples of the polymerizable compound include urethane acrylates as described in JP-A-48-041708, JP-A-51-0371993, JP-A-02-032293, and JP-A-02-016765.
  • Urethane compounds having an ethylene oxide-based skeleton described in Japanese Patent Publication No. 58-049860, Japanese Patent Publication No. 56-017654, Japanese Patent Publication No. 62-039417, and Japanese Patent Publication No. 62-039418 are also suitable.
  • a polymerizable compound having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-01-105238.
  • the polymerizable compounds are UA-7200 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, Commercially available products such as T-600, AI-600, and LINK-202UA (manufactured by Kyoeisha Chemical Co., Ltd.) can also be used.
  • the content of the polymerizable compound in the total solid content of the colored resin composition is preferably 0.1 to 50% by mass.
  • the lower limit is more preferably 0.5% by mass or more, and further preferably 1% by mass or more.
  • the upper limit is more preferably 45% by mass or less, further preferably 40% by mass or less.
  • the polymerizable compound may be used alone or in combination of two or more.
  • the colored resin composition of the present invention can contain a photopolymerization initiator.
  • the photopolymerization initiator is not particularly limited and may be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light rays in the ultraviolet region to the visible region is preferable.
  • the photopolymerization initiator is preferably a photoradical polymerization initiator.
  • the photopolymerization initiator examples include halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, compounds having an imidazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole, oxime compounds, and organic compounds.
  • halogenated hydrocarbon derivatives for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, compounds having an imidazole skeleton, etc.
  • acylphosphine compounds examples include peroxides, thio compounds, ketone compounds, aromatic onium salts, ⁇ -hydroxyketone compounds, and ⁇ -aminoketone compounds.
  • the photopolymerization initiator is a trihalomethyltriazine compound, a biimidazole compound, a benzyl dimethyl ketal compound, an ⁇ -hydroxyketone compound, an ⁇ -aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, or an oxime compound.
  • Triarylimidazole dimer onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxaziazole compound and 3-aryl substituted coumarin compound, preferably biimidazole compound,
  • a compound selected from an oxime compound, an ⁇ -hydroxyketone compound, an ⁇ -aminoketone compound, and an acylphosphine compound is more preferable, and an oxime compound is further preferable.
  • the photopolymerization initiator include compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173, compounds described in Japanese Patent No.
  • biimidazole compound examples include 2,2-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole and 2,2'-bis (o-chlorophenyl) -4,4', 5 , 5-Tetrakiss (3,4,5-trimethoxyphenyl) -1,2'-biimidazole, 2,2'-bis (2,3-dichlorophenyl) -4,4', 5,5'-tetraphenyl Examples thereof include biimidazole and 2,2'-bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl-1,2'-biimidazole.
  • ⁇ -hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (all manufactured by IGM Resins BV), Irgacure 184, Irgacure 1173, Irgacare 1173, Irgacure29. (Made by the company) and so on.
  • Commercially available ⁇ -aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (above, IGM Resins BV), Irgacare 907, Irgacare 369, Irgacure 369, Irgacure 369, Irgar (Made) and so on.
  • acylphosphine compounds examples include Omnirad 819, Omnirad TPO (above, manufactured by IGM Resins BV), Irgacure 819, and Irgacure TPO (above, manufactured by BASF).
  • Examples of the oxime compound include the compounds described in JP-A-2001-233842, the compounds described in JP-A-2000-080068, and the compounds described in JP-A-2006-342166.
  • oxime compound examples include 3-benzoyloxyiminobutane-2-one, 3-acetoxyiminobutane-2-one, 3-propionyloxyiminovtan-2-one, 2-acetoxyimiminopentane-3-one, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3- (4-toluenesulfonyloxy) iminobutane-2-one, and 2-ethoxycarbonyloxy Examples thereof include imino-1-phenylpropane-1-one.
  • An oxime compound having a fluorene ring can also be used as the photopolymerization initiator.
  • Specific examples of the oxime compound having a fluorene ring include the compounds described in JP-A-2014-137466.
  • an oxime compound having a skeleton in which at least one benzene ring of the carbazole ring is a naphthalene ring can also be used.
  • Specific examples of such an oxime compound include the compounds described in International Publication No. 2013/083505.
  • An oxime compound having a fluorine atom can also be used as the photopolymerization initiator.
  • Specific examples of the oxime compound having a fluorine atom are described in the compounds described in JP-A-2010-262028, compounds 24, 36-40 described in JP-A-2014-500852, and JP-A-2013-164471. Compound (C-3) and the like.
  • an oxime compound in which a substituent having a hydroxy group is bonded to the carbazole skeleton can also be used.
  • Examples of such a photopolymerization initiator include the compounds described in International Publication No. 2019/088055.
  • An oxime compound having a nitro group can be used as the photopolymerization initiator.
  • the oxime compound having a nitro group is also preferably a dimer.
  • Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of JP2013-114249A and paragraphs 0008-0012 and 0070-0079 of JP2014-137466. Examples thereof include the compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKULS NCI-831 (manufactured by ADEKA Corporation).
  • An oxime compound having a benzofuran skeleton can also be used as the photopolymerization initiator.
  • Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.
  • an oxime compound in which a substituent having a hydroxy group is bonded to the carbazole skeleton can also be used.
  • Examples of such a photopolymerization initiator include the compounds described in International Publication No. 2019/088055.
  • the oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm.
  • the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high, more preferably 1000 to 300,000, further preferably 2000 to 300,000, and more preferably 5000 to 200,000. It is particularly preferable to have.
  • the molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g / L using ethyl acetate with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).
  • a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used as the photopolymerization initiator.
  • a photoradical polymerization initiator two or more radicals are generated from one molecule of the photoradical polymerization initiator, so that good sensitivity can be obtained.
  • the crystallinity is lowered, the solubility in a solvent or the like is improved, the precipitation is less likely to occur with time, and the stability of the colored resin composition with time is improved.
  • Specific examples of the bifunctional or trifunctional or higher functional photo-radical polymerization initiators include JP-A-2010-527339, JP-A-2011-524436, International Publication No.
  • the content of the photopolymerization initiator in the total solid content of the colored resin composition is preferably 0.1 to 30% by mass.
  • the lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more.
  • the upper limit is preferably 20% by mass or less, more preferably 15% by mass or less. Only one type of photopolymerization initiator may be used, or two or more types may be used.
  • the colored resin composition of the present invention can contain a silane coupling agent.
  • the silane coupling agent means a silane compound having a hydrolyzable group and other functional groups.
  • the hydrolyzable group refers to a substituent that is directly linked to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction.
  • Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group and the like, and an alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group.
  • Examples of the functional group other than the hydrolyzable group include a vinyl group, a (meth) allyl group, a (meth) acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group and an isocyanate group.
  • a phenyl group and the like, and an amino group, a (meth) acryloyl group and an epoxy group are preferable.
  • Specific examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP2009-288703A and the compounds described in paragraphs 0056 to 0066 of JP2009-242604A. The contents of are incorporated herein by reference.
  • the content of the silane coupling agent in the total solid content of the colored resin composition is preferably 0.1 to 5% by mass.
  • the upper limit is preferably 3% by mass or less, and more preferably 2% by mass or less.
  • the lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more.
  • the silane coupling agent may be only one kind or two or more kinds.
  • the colored resin composition of the present invention may further contain a curing accelerator for the purpose of accelerating the reaction of the resin or the polymerizable compound and lowering the curing temperature.
  • the curing accelerator is a methylol compound (for example, a compound exemplified as a cross-linking agent in paragraph No. 0246 of JP-A-2015-034963), amines, a phosphonium salt, an amidin salt, and an amide compound (for example, JP-A-2015).
  • cyanate compound for example, Japanese Patent Application Laid-Open No. 2012-150180.
  • alkoxysilane compound for example, alkoxysilane compound having an epoxy group described in JP-A-2011-253504
  • onium salt compound eg, JP-A-2015-034963
  • a compound exemplified as an acid generator in 0216, a compound described in JP-A-2009-180949) and the like can also be used.
  • the content of the curing accelerator is preferably 0.3 to 8.9% by mass, preferably 0.8 to 6% by mass, based on the total solid content of the colored resin composition. .4% by mass is more preferable.
  • the colored resin composition of the present invention can contain a polymerization inhibitor.
  • the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-tert-butylphenol), and the like. Examples thereof include 2,2'-methylenebis (4-methyl-6-t-butylphenol) and N-nitrosophenylhydroxyamine salts (ammonium salt, primary cerium salt, etc.). Of these, p-methoxyphenol is preferable.
  • the content of the polymerization inhibitor in the total solid content of the colored resin composition is preferably 0.0001 to 5% by mass.
  • the colored resin composition of the present invention can contain a surfactant.
  • a surfactant various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicon-based surfactant can be used.
  • the surfactant the surfactant described in paragraph Nos. 0238 to 0245 of International Publication No. 2015/166779 is mentioned, and the content thereof is incorporated in the present specification.
  • the surfactant is preferably a fluorine-based surfactant.
  • a fluorine-based surfactant in the colored resin composition, the liquid characteristics (particularly, fluidity) can be further improved, and the liquid saving property can be further improved. It is also possible to form a film having a small thickness unevenness.
  • the fluorine content in the fluorine-based surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass.
  • a fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of coating film thickness and liquid saving property, and has good solubility in a colored resin composition.
  • fluorine-based surfactant examples include the surfactants described in paragraphs 0060 to 0064 of Japanese Patent Application Laid-Open No. 2014-041318 (paragraphs 0060 to 0064 of the corresponding International Publication No. 2014/017669) and the like, Japanese Patent Application Laid-Open No. 2011-.
  • the surfactants described in paragraphs 0117 to 0132 of JP 132503 are mentioned and their contents are incorporated herein by reference.
  • fluorine-based surfactants include, for example, Megafuck F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, EXP, MFS.
  • the fluorine-based surfactant it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound.
  • a fluorine-based surfactant the description in JP-A-2016-216602 can be referred to, and the content thereof is incorporated in the present specification.
  • the fluorine-based surfactant a block polymer can also be used.
  • the fluorine-based surfactant has a repeating unit derived from a (meth) acrylate compound having a fluorine atom and 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy groups and propyleneoxy groups) (meth).
  • a fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used.
  • the following compounds are also exemplified as the fluorine-based surfactant used in the present invention.
  • the weight average molecular weight of the above compounds is preferably 3000 to 50000, for example 14000.
  • % indicating the ratio of the repeating unit is mol%.
  • a fluorine-based surfactant a fluorine-containing polymer having an ethylenically unsaturated bond-containing group in the side chain can also be used.
  • the compounds described in paragraphs 0050 to 0090 and paragraph numbers 0289 to 0295 of JP2010-164965 for example, Megafuck RS-101, RS-102, RS-718K manufactured by DIC Corporation. , RS-72-K and the like.
  • the fluorine-based surfactant the compounds described in paragraphs 0015 to 0158 of JP2015-117327A can also be used.
  • the content of the surfactant in the total solid content of the colored resin composition is preferably 0.001% by mass to 5.0% by mass, more preferably 0.005 to 3.0% by mass.
  • the surfactant may be only one kind or two or more kinds. In the case of two or more types, the total amount is preferably in the above range.
  • the colored resin composition of the present invention can contain an ultraviolet absorber.
  • an ultraviolet absorber a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indol compound, a triazine compound and the like can be used.
  • paragraph numbers 0052 to 0072 of JP2012-208374A paragraph numbers 0317 to 0334 of JP2013-066814, and paragraphs 0061 to 0080 of JP2016-162946.
  • Examples of commercially available ultraviolet absorbers include UV-503 (manufactured by Daito Kagaku Co., Ltd.).
  • Examples of the benzotriazole compound include the MYUA series made by Miyoshi Oil & Fat Co., Ltd. (The Chemical Daily, February 1, 2016).
  • the ultraviolet absorber the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 can also be used.
  • the content of the ultraviolet absorber in the total solid content of the colored resin composition is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass. Only one kind of ultraviolet absorber may be used, or two or more kinds may be used. When two or more types are used, the total amount is preferably in the above range.
  • the colored resin composition of the present invention can contain an antioxidant.
  • the antioxidant include phenol compounds, phosphite ester compounds, thioether compounds and the like.
  • the phenol compound any phenol compound known as a phenolic antioxidant can be used.
  • Preferred phenolic compounds include hindered phenolic compounds.
  • a compound having a substituent at a site (ortho position) adjacent to the phenolic hydroxy group is preferable.
  • a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable.
  • the antioxidant a compound having a phenol group and a phosphite ester group in the same molecule is also preferable.
  • a phosphorus-based antioxidant can also be preferably used.
  • the content of the antioxidant in the total solid content of the colored resin composition is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass. Only one type of antioxidant may be used, or two or more types may be used. When two or more types are used, the total amount is preferably in the above range.
  • the colored resin composition of the present invention contains sensitizers, fillers, thermosetting accelerators, plasticizers and other auxiliaries (eg, conductive particles, fillers, defoamers, flame retardants, etc.). It may contain a leveling agent, a peeling accelerator, a fragrance, a surface tension adjusting agent, a chain transfer agent, etc.). By appropriately containing these components, properties such as film physical characteristics can be adjusted. These components are described in, for example, paragraph No. 0183 or later of JP2012-003225A (paragraph number 0237 of the corresponding US Patent Application Publication No. 2013/0034812), paragraph of JP-A-2008-250074. The descriptions of Nos.
  • the colored resin composition may contain a latent antioxidant, if necessary.
  • the latent antioxidant is a compound in which the site that functions as an antioxidant is protected by a protecting group, and is heated at 100 to 250 ° C. or at 80 to 200 ° C. in the presence of an acid / base catalyst. As a result, a compound in which the protecting group is eliminated and functions as an antioxidant can be mentioned.
  • Examples of the latent antioxidant include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A-2017-008219.
  • Examples of commercially available products include ADEKA ARKULS GPA-5001 (manufactured by ADEKA Corporation) and the like. Further, as described in Japanese Patent Application Laid-Open No. 2018-155881, C.I. I. Pigment Yellow 129 may be added for the purpose of improving weather resistance.
  • the colored resin composition of the present invention may contain a metal oxide in order to adjust the refractive index of the obtained film.
  • the metal oxide include TiO 2 , ZrO 2 , Al 2 O 3 , SiO 2 and the like.
  • the primary particle size of the metal oxide is preferably 1 to 100 nm, more preferably 3 to 70 nm, and even more preferably 5 to 50 nm.
  • the metal oxide may have a core-shell structure. Further, in this case, the core portion may be hollow.
  • the colored resin composition of the present invention may contain a light resistance improving agent.
  • the light resistance improving agent include the compounds described in paragraphs 0036 to 0037 of JP-A-2017-198787, the compounds described in paragraphs 0029 to 0034 of JP-A-2017-146350, and JP-A-2017-129774.
  • the colored resin composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less, and further preferably 10 ppm or less, which is not bonded or coordinated with a pigment or the like. It is preferable, and it is particularly preferable that it is not substantially contained. According to this aspect, stabilization of pigment dispersibility (suppression of aggregation), improvement of spectral characteristics due to improvement of dispersibility, stabilization of curable components, suppression of conductivity fluctuation due to elution of metal atoms / metal ions, and display. Effects such as improvement of characteristics can be expected.
  • the types of free metals include Na, K, Ca, Sc, Ti, Mn, Cu, Zn, Fe, Cr, Co, Mg, Al, Sn, Zr, Ga, Ge, Ag, Au, Pt, and the like.
  • examples thereof include Cs, Ni, Cd, Pb and Bi.
  • the colored resin composition of the present invention preferably has a free halogen content of 100 ppm or less, more preferably 50 ppm or less, and 10 ppm or less, which is not bonded or coordinated with a pigment or the like. Is more preferable, and it is particularly preferable that the content is substantially not contained.
  • the halogen include F, Cl, Br, I and their anions.
  • Examples of the method for reducing free metals and halogens in the colored resin composition include methods such as washing with ion-exchanged water, filtration, ultrafiltration, and purification with an ion-exchange resin.
  • the colored resin composition of the present invention does not substantially contain terephthalic acid ester.
  • substantially free means that the content of the terephthalic acid ester is 1000 mass ppb or less in the total amount of the colored resin composition, and more preferably 100 mass ppb or less. , Zero is particularly preferred.
  • the container for the colored resin composition of the present invention is not particularly limited, and a known container can be used.
  • a storage container a multi-layer bottle composed of 6 types and 6 layers of resin and 6 types of resin have a 7-layer structure for the purpose of suppressing impurities from being mixed into raw materials and colored resin compositions. It is also preferable to use a bottle. Examples of such a container include the container described in Japanese Patent Application Laid-Open No. 2015-123351.
  • the inner wall of the container is preferably made of glass or stainless steel for the purpose of preventing metal elution from the inner wall of the container, enhancing the storage stability of the colored resin composition, and suppressing deterioration of the components.
  • the colored resin composition of the present invention can be prepared by mixing the above-mentioned components. In preparing the colored resin composition, all the components may be simultaneously dissolved and / or dispersed in an organic solvent to prepare the colored resin composition, or if necessary, each component may be appropriately dissolved in two or more solutions or a solution.
  • a colored resin composition may be prepared by preparing a dispersion liquid and mixing them at the time of use (at the time of application).
  • the mechanical force used for dispersing the pigment includes compression, squeezing, impact, shearing, cavitation and the like.
  • Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high speed impellers, sand grinders, flow jet mixers, high pressure wet atomization, ultrasonic dispersion and the like.
  • the process and disperser for dispersing pigments are "Dispersion Technology Complete Works, Published by Information Organization Co., Ltd., July 15, 2005" and "Dispersion technology centered on suspension (solid / liquid dispersion system) and industrial. Practical application The process and disperser described in Paragraph No.
  • JP-A-2015-157893 "Comprehensive Data Collection, Published by Management Development Center Publishing Department, October 10, 1978" can be preferably used.
  • the particles may be miniaturized in the salt milling step.
  • the materials, equipment, processing conditions, etc. used in the salt milling step for example, the descriptions in JP-A-2015-194521 and JP-A-2012-046629 can be referred to.
  • any filter that has been conventionally used for filtration or the like can be used without particular limitation.
  • fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (eg, nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP) (high density, ultrahigh molecular weight).
  • PTFE polytetrafluoroethylene
  • nylon eg, nylon-6, nylon-6,6)
  • polyolefin resins such as polyethylene and polypropylene (PP) (high density, ultrahigh molecular weight).
  • PP polypropylene
  • the pore size of the filter is preferably 0.01 to 7.0 ⁇ m, more preferably 0.01 to 3.0 ⁇ m, and even more preferably 0.05 to 0.5 ⁇ m. If the pore size of the filter is within the above range, fine foreign matter can be removed more reliably.
  • the nominal value of the filter manufacturer can be referred to.
  • various filters provided by Nippon Pole Co., Ltd. (DFA4201NIEY, etc.), Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), KITZ Microfilter Co., Ltd., etc. can be used.
  • fibrous filter medium examples include polypropylene fiber, nylon fiber, glass fiber and the like.
  • examples of commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.) and SHPX type series (SHPX003, etc.) manufactured by Roki Techno Co., Ltd.
  • filters for example, a first filter and a second filter
  • the filtration with each filter may be performed only once or twice or more.
  • filters having different pore diameters may be combined within the above-mentioned range.
  • the filtration with the first filter may be performed only on the dispersion liquid, and after mixing the other components, the filtration may be performed with the second filter.
  • the film of the present invention is a film obtained from the colored resin composition of the present invention described above.
  • the film of the present invention can be used for a color filter, a near-infrared transmission filter, a near-infrared cut filter, a black matrix, a light-shielding film, and the like.
  • it can be preferably used as a coloring layer of a color filter.
  • the film thickness of the film of the present invention can be appropriately adjusted according to the purpose.
  • the film thickness is preferably 20 ⁇ m or less, more preferably 10 ⁇ m or less, and even more preferably 5 ⁇ m or less.
  • the lower limit of the film thickness is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more, and even more preferably 0.3 ⁇ m or more.
  • the thickness of the film of the present invention after heat treatment at 300 ° C. for 5 hours in a nitrogen atmosphere is preferably 70% or more, preferably 80% or more of the thickness of the film before heat treatment. More preferably, it is more preferably 90% or more.
  • the thickness of the film after being heat-treated at 350 ° C. for 5 hours in a nitrogen atmosphere is preferably 70% or more, preferably 80% or more of the thickness of the film before the heat treatment. Is more preferable, and 90% or more is further preferable.
  • the thickness of the film after being heat-treated at 400 ° C. for 5 hours in a nitrogen atmosphere is preferably 70% or more, preferably 80% or more of the thickness of the film before the heat treatment. Is more preferable, and 90% or more is further preferable.
  • the film of the present invention has a maximum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more, still more preferably 85% or more) and a minimum value of 30% or less (preferably 75% or more, more preferably 85% or more) at a wavelength of 400 to 1100 nm. It is preferably 25% or less, more preferably 20% or less, still more preferably 15% or less).
  • the film of the present invention can be produced through the steps of applying the colored resin composition of the present invention described above onto a support.
  • the film manufacturing method of the present invention preferably further includes a step of forming a pattern (pixel). Examples of the pattern (pixel) forming method include a photolithography method and a dry etching method, and the photolithography method is preferable.
  • Pattern formation by the photolithography method includes a step of forming a colored resin composition layer on a support using the colored resin composition of the present invention, a step of exposing the colored resin composition layer in a pattern, and a colored resin composition. It is preferable to include a step of developing and removing an unexposed portion of the material layer to form a pattern (pixel). If necessary, a step of baking the colored resin composition layer (pre-baking step) and a step of baking the developed pattern (pixels) (post-baking step) may be provided.
  • the colored resin composition layer of the present invention is used to form the colored resin composition layer on the support.
  • the support is not particularly limited and may be appropriately selected depending on the intended use.
  • a glass substrate, a silicon substrate, and the like can be mentioned, and a silicon substrate is preferable.
  • a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, or the like may be formed on the silicon substrate.
  • CMOS complementary metal oxide semiconductor
  • a black matrix that isolates each pixel may be formed on the silicon substrate.
  • the silicon substrate may be provided with a base layer for improving the adhesion with the upper layer, preventing the diffusion of substances, or flattening the surface of the substrate.
  • the surface contact angle of the base layer is preferably 20 to 70 ° when measured with diiodomethane. Further, it is preferably 30 to 80 ° when measured with water. When the surface contact angle of the base layer is within the above range, the wettability of the colored resin composition is good.
  • the surface contact angle of the base layer can be adjusted by, for example, adding a surfactant.
  • a known method can be used as a method for applying the colored resin composition.
  • a dropping method drop casting
  • a slit coating method for example, a spray method; a roll coating method; a rotary coating method (spin coating); a casting coating method; a slit and spin method; a pre-wet method (for example, JP-A-2009-145395).
  • Methods described in the publication Inkjet (for example, on-demand method, piezo method, thermal method), ejection system printing such as nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing, etc.
  • Various printing methods; transfer method using a mold or the like; nano-imprint method and the like can be mentioned.
  • the method of application to inkjet is not particularly limited, and is, for example, the method shown in "Expandable and usable inkjet-infinite possibilities seen in patents-, published in February 2005, Sumi Betechno Research" (especially from page 115). (Page 133), and the methods described in JP-A-2003-262716, JP-A-2003-185831, JP-A-2003-261827, JP-A-2012-126830, JP-A-2006-169325, and the like. Can be mentioned. Further, as a method for applying the colored resin composition, the methods described in International Publication No. 2017/030174 and International Publication No. 2017/018419 can also be used, and these contents are incorporated in the present specification.
  • the colored resin composition layer formed on the support may be dried (prebaked).
  • the prebaking temperature is preferably 150 ° C. or lower, more preferably 120 ° C. or lower, and even more preferably 110 ° C. or lower.
  • the lower limit can be, for example, 50 ° C. or higher, or 80 ° C. or higher.
  • the prebaking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and even more preferably 80 to 220 seconds. Pre-baking can be performed on a hot plate, an oven, or the like.
  • the colored resin composition layer is exposed in a pattern (exposure step).
  • the colored resin composition layer can be exposed in a pattern by exposing the colored resin composition layer through a mask having a predetermined mask pattern using a stepper exposure machine, a scanner exposure machine, or the like. As a result, the exposed portion can be cured.
  • Examples of radiation (light) that can be used for exposure include g-line and i-line. Further, light having a wavelength of 300 nm or less (preferably light having a wavelength of 180 to 300 nm) can also be used. Examples of the light having a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), and KrF line (wavelength 248 nm) is preferable. Further, a long wave light source having a diameter of 300 nm or more can also be used.
  • the pulse exposure is an exposure method of a method of repeatedly irradiating and pausing light in a cycle of a short time (for example, a millisecond level or less).
  • the pulse width is preferably 100 nanoseconds (ns) or less, more preferably 50 nanoseconds or less, and even more preferably 30 nanoseconds or less.
  • the lower limit of the pulse width is not particularly limited, but may be 1 femtosecond (fs) or more, and may be 10 femtoseconds or more.
  • the frequency is preferably 1 kHz or higher, more preferably 2 kHz or higher, and even more preferably 4 kHz or higher.
  • the upper limit of the frequency is preferably 50 kHz or less, more preferably 20 kHz or less, and further preferably 10 kHz or less.
  • Maximum instantaneous intensity is preferably at 50000000W / m 2 or more, more preferably 100000000W / m 2 or more, more preferably 200000000W / m 2 or more.
  • the upper limit of the maximum instantaneous intensity is preferably at 1000000000W / m 2 or less, more preferably 800000000W / m 2 or less, further preferably 500000000W / m 2 or less.
  • the pulse width is the time during which light is irradiated in the pulse period.
  • the frequency is the number of pulse cycles per second.
  • the maximum instantaneous illuminance is the average illuminance within the time during which the light is irradiated in the pulse period.
  • the pulse cycle is a cycle in which light irradiation and pause in pulse exposure are one cycle.
  • Irradiation dose for example, preferably 0.03 ⁇ 2.5J / cm 2, more preferably 0.05 ⁇ 1.0J / cm 2.
  • the oxygen concentration at the time of exposure can be appropriately selected, and in addition to the operation in the atmosphere, for example, in a low oxygen atmosphere having an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially). It may be exposed in an oxygen-free environment), or may be exposed in a high oxygen atmosphere (for example, 22% by volume, 30% by volume, or 50% by volume) in which the oxygen concentration exceeds 21% by volume.
  • the exposure illuminance can be set as appropriate, and is usually selected from the range of 1000 W / m 2 to 100,000 W / m 2 (for example, 5000 W / m 2 , 15,000 W / m 2 , or 35,000 W / m 2). Can be done. Oxygen concentration and exposure illuminance may appropriately combined conditions, for example, illuminance 10000 W / m 2 at an oxygen concentration of 10 vol%, oxygen concentration of 35 vol% can be such illuminance 20000W / m 2.
  • the unexposed portion of the colored resin composition layer is developed and removed to form a pattern (pixel).
  • the unexposed portion of the colored resin composition layer can be developed and removed using a developing solution.
  • the colored resin composition layer in the unexposed portion in the exposure step is eluted in the developing solution, and only the photocured portion remains.
  • the temperature of the developing solution is preferably, for example, 20 to 30 ° C.
  • the development time is preferably 20 to 180 seconds. Further, in order to improve the residue removability, the steps of shaking off the developing solution every 60 seconds and further supplying a new developing solution may be repeated several times.
  • Examples of the developing solution include organic solvents and alkaline developing solutions, and alkaline developing solutions are preferably used.
  • the alkaline developer an alkaline aqueous solution (alkaline developer) obtained by diluting an alkaline agent with pure water is preferable.
  • the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, and tetrabutylammonium hydroxide.
  • Ethyltrimethylammonium hydroxide Ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis (2-hydroxyethyl) ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene and other organic substances.
  • alkaline compounds examples include alkaline compounds and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate and sodium metasilicate.
  • the alkaline agent a compound having a large molecular weight is preferable in terms of environment and safety.
  • the concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass.
  • the developer may further contain a surfactant.
  • the surfactant include the above-mentioned surfactants, and nonionic surfactants are preferable.
  • the developer may be once produced as a concentrated solution and diluted to a concentration required for use from the viewpoint of convenience of transfer and storage.
  • the dilution ratio is not particularly limited, but can be set in the range of, for example, 1.5 to 100 times. It is also preferable to wash (rinse) with pure water after development.
  • the rinsing is performed by supplying the rinsing liquid to the developed colored resin composition layer while rotating the support on which the developed colored resin composition layer is formed. It is also preferable to move the nozzle for discharging the rinse liquid from the central portion of the support to the peripheral edge of the support. At this time, when moving the nozzle from the central portion of the support to the peripheral portion, the nozzle may be moved while gradually reducing the moving speed. By rinsing in this way, in-plane variation of rinsing can be suppressed. Further, the same effect can be obtained by gradually reducing the rotation speed of the support while moving the nozzle from the central portion to the peripheral portion of the support.
  • Additional exposure treatment and post-baking are post-development curing treatments to complete the curing.
  • the heating temperature in the post-baking is, for example, preferably 100 to 240 ° C, more preferably 200 to 240 ° C.
  • Post-baking can be performed on the developed film in a continuous or batch manner using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so as to meet the above conditions. ..
  • the light used for the exposure is preferably light having a wavelength of 400 nm or less. Further, the additional exposure process may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.
  • a colored resin composition layer is formed on a support using the colored resin composition of the present invention, and the entire colored resin composition layer is cured to form a cured product layer.
  • a step a step of forming a photoresist layer on the cured product layer, a step of exposing the photoresist layer in a pattern and then developing to form a resist pattern, and using this resist pattern as a mask to form a cured product layer.
  • the color filter of the present invention has the above-mentioned film of the present invention. More preferably, it has the film of the present invention as a pixel of a color filter.
  • the color filter of the present invention can be used for a solid-state image sensor such as a CCD (charge-coupled device) or CMOS (complementary metal oxide semiconductor), an image display device, or the like.
  • the film thickness of the film of the present invention can be appropriately adjusted according to the purpose.
  • the film thickness is preferably 20 ⁇ m or less, more preferably 10 ⁇ m or less, and even more preferably 5 ⁇ m or less.
  • the lower limit of the film thickness is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more, and further preferably 0.3 ⁇ m or more.
  • the pixel width is preferably 0.5 to 20.0 ⁇ m.
  • the lower limit is preferably 1.0 ⁇ m or more, and more preferably 2.0 ⁇ m or more.
  • the upper limit is preferably 15.0 ⁇ m or less, and more preferably 10.0 ⁇ m or less.
  • the Young's modulus of the pixel is preferably 0.5 to 20 GPa, more preferably 2.5 to 15 GPa.
  • each pixel included in the color filter of the present invention has high flatness.
  • the surface roughness Ra of the pixel is preferably 100 nm or less, more preferably 40 nm or less, and further preferably 15 nm or less.
  • the lower limit is not specified, but it is preferably 0.1 nm or more, for example.
  • the surface roughness of the pixels can be measured using, for example, an AFM (atomic force microscope) Measurement 3100 manufactured by Veeco.
  • the contact angle of water on the pixel can be appropriately set to a preferable value, but is typically in the range of 50 to 110 °.
  • the contact angle can be measured using, for example, a contact angle meter CV-DT ⁇ A type (manufactured by Kyowa Interface Science Co., Ltd.). Further, it is preferable that the volume resistance value of the pixel is high. Specifically, it is preferred that the volume resistivity value of the pixel is 10 9 ⁇ ⁇ cm or more, and more preferably 10 11 ⁇ ⁇ cm or more. The upper limit is not specified, but it is preferably 10 14 ⁇ ⁇ cm or less, for example.
  • the volume resistance value of the pixel can be measured using an ultra-high resistance meter 5410 (manufactured by Advantest).
  • a protective layer may be provided on the surface of the film of the present invention.
  • various functions such as oxygen blocking, low reflection, hydrophobicization, and shielding of light of a specific wavelength (ultraviolet rays, near infrared rays, etc.) can be imparted.
  • the thickness of the protective layer is preferably 0.01 to 10 ⁇ m, more preferably 0.1 to 5 ⁇ m.
  • the method for forming the protective layer include a method of applying a resin composition for forming a protective layer dissolved in an organic solvent to form the protective layer, a chemical vapor deposition method, a method of attaching the molded resin with an adhesive, and the like.
  • the components constituting the protective layer include (meth) acrylic resin, en-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, and polyimide.
  • Resin polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin, melamine resin, urethane resin, aramid resin, polyamide resin, alkyd resin, epoxy resin, modified silicone resin, fluorine Examples thereof include resins, polycarbonate resins, polyacrylonitrile resins, cellulose resins, Si, C, W, Al 2 O 3 , Mo, SiO 2 , and Si 2 N 4, and two or more of these components may be contained.
  • the protective layer preferably contains a polyol resin, SiO 2 , and Si 2 N 4 .
  • the protective layer preferably contains a (meth) acrylic resin and a fluororesin.
  • the protective layer forming resin composition When the protective layer forming resin composition is applied to form the protective layer, known methods such as a spin coating method, a casting method, a screen printing method, and an inkjet method are used as the coating method of the protective layer forming resin composition. Can be used.
  • a known organic solvent for example, propylene glycol 1-monomethyl ether 2-acetate, cyclopentanone, ethyl lactate, etc.
  • the protective layer is formed by a chemical vapor deposition method
  • the chemical vapor deposition method is a known chemical vapor deposition method (thermochemical vapor deposition method, plasma chemical vapor deposition method, photochemical vapor deposition method). Can be used.
  • the protective layer may be an additive such as organic / inorganic fine particles, an absorber for light of a specific wavelength (for example, ultraviolet rays, near infrared rays, etc.), a refractive index adjuster, an antioxidant, an adhesive, a surfactant, etc., if necessary. May be contained.
  • organic / inorganic fine particles include polymer fine particles (for example, silicone resin fine particles, polystyrene fine particles, melamine resin fine particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, and titanium oxynitride. , Magnesium fluoride, hollow silica, silica, calcium carbonate, barium sulfate and the like.
  • a known absorbent can be used as the light absorber of a specific wavelength.
  • the content of these additives can be adjusted as appropriate, but is preferably 0.1 to 70% by mass, more preferably 1 to 60% by mass, based on the total mass of the protective layer.
  • the protective layer the protective layer described in paragraphs 0073 to 0092 of JP-A-2017-151176 can also be used.
  • the color filter may have a base layer.
  • C.I. I. Pigment Green 7 and C.I. I. Pigment Green 36 and C.I. I. Pigment Yellow 139 and C.I. I. A green color may be formed in combination with Pigment Yellow 185, and C.I. I. Pigment Green 58 and C.I. I. Pigment Yellow 150 and C.I. I. A green color may be formed in combination with Pigment Yellow 185.
  • the color filter may have a structure in which each colored pixel is embedded in a space partitioned by a partition wall, for example, in a grid pattern.
  • the colored resin composition of the present invention can also be suitably used for the pixel configuration described in International Publication No. 2019/1028887.
  • the solid-state image sensor of the present invention has the above-mentioned film of the present invention.
  • the configuration of the solid-state image sensor of the present invention is not particularly limited as long as it includes the film of the present invention and functions as a solid-state image sensor, and examples thereof include the following configurations.
  • a solid-state image sensor CCD (charge-coupled device) image sensor, CMOS (complementary metal oxide semiconductor) image sensor, etc.
  • a transfer electrode made of polysilicon or the like.
  • the configuration has a color filter on the device protective film.
  • the color filter may have a structure in which each colored pixel is embedded in a space partitioned by a partition wall, for example, in a grid pattern.
  • the partition wall preferably has a lower refractive index than each colored pixel. Examples of an imaging apparatus having such a structure are described in JP2012-227478A, Japanese Patent Application Laid-Open No. 2014-179757, International Publication No. 2018/043654, and US Patent Application Publication No.
  • the image pickup device provided with the solid-state image pickup device of the present invention can be used not only for digital cameras and electronic devices having an image pickup function (mobile phones and the like), but also for in-vehicle cameras and surveillance cameras. Further, the solid-state image sensor incorporating the color filter of the present invention may incorporate another color filter, a near-infrared cut filter, an organic photoelectric conversion film, or the like in addition to the color filter of the present invention.
  • the image display device of the present invention has the above-mentioned film of the present invention.
  • the image display device include a liquid crystal display device and an organic electroluminescence display device.
  • the liquid crystal display device is described in, for example, “Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, Kogyo Chosakai Co., Ltd., published in 1994)”.
  • the liquid crystal display device to which the present invention can be applied is not particularly limited, and for example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "next-generation liquid crystal display technology".
  • the acid value of the sample represents the mass of potassium hydroxide required to neutralize the acidic component per 1 g of solid content in the sample.
  • the acid value was calculated by the following formula with the inflection point of the titration pH curve as the titration end point.
  • A 56.11 ⁇ Vs ⁇ 0.5 ⁇ f / w
  • Vs Amount of 0.1 mol / L sodium hydroxide aqueous solution required for titration (mL)
  • f Titer of 0.1 mol / L sodium hydroxide aqueous solution
  • a mixed solution containing the raw materials listed in the table below is mixed and dispersed for 3 hours using a bead mill (using zirconia beads having a diameter of 0.3 mm), and then a high-pressure disperser with a decompression mechanism NANO-3000-10 (Nippon BEE).
  • a dispersion treatment was carried out at a flow rate of 500 g / min under a pressure of 2000 MPa using (manufactured by Co., Ltd.). This dispersion treatment was repeated 10 times to obtain each dispersion.
  • Pigment Blue 16 blue pigment, phthalocyanine pigment
  • PG7 C.I. I. Pigment Green 7
  • PG36 C.I. I. Pigment Green 36
  • PY138 C.I. I. Pigment Yellow 138
  • PY215 C.I. I. Pigment Yellow 215
  • PV23 C.I. I. Pigment Violet 23
  • IR dye A compound having the following structure (near-infrared absorbing pigment, in the structural formula, Me represents a methyl group and Ph represents a phenyl group).
  • IRGAPHORE Irgaphor Black S 0100 CF (manufactured by BASF, compound with the following structure, lactam pigment)
  • PBk32 C.I. I. Pigment Black 32 (compound with the following structure, perylene pigment)
  • ⁇ resin ⁇ AA-2 Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain (repeating unit of Polymer) is the number of repeating units.
  • the weight average molecular weight is 26000, and the acid value is 55 mgKOH / g.
  • AA-4 Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain (repeating unit of Polymer) is the number of repeating units.
  • the weight average molecular weight is 21000, and the acid value is 38 mgKOH / g.) AA-6: Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain (repeating unit of Polymer) is the number of repeating units.
  • the weight average molecular weight is 18500, and the acid value is 42 mgKOH / g.) AA-10: Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain (repeating unit of Polymer) is the number of repeating units.
  • the weight average molecular weight is 32000, and the acid value is 70 mgKOH / g.) AA-12: Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain (repeating unit of Polymer) is the number of repeating units.
  • the weight average molecular weight is 29500, and the acid value is 63 mgKOH / g.) AA-15: Resin having the following structure (the numerical value added to the repeating unit (Polym) is the number of repeating units.
  • the weight average molecular weight is 12500, and the acid value is 55 mgKOH / g.)
  • CA-1 Resin with the following structure ((meth) acrylic resin, the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units.
  • Weight average molecular weight is 20000, acid value is 77 mgKOH / g.)
  • Dispersions R1 to R8, B1 to B5, G1 to G4, Y1 to Y2, I1 to I6, Bk1 to Bk13 Dispersions described above
  • A-1 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 12300.
  • A-2 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 18500.
  • A-3 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 23000.
  • A-4 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 8900.
  • A-5 Resin with the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 27,000.
  • A-6 Resin with the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 56000.
  • A-7 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 31400.
  • A-8 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 42000.
  • A-9 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 18900.
  • A-10 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 16700.
  • A-111 Resin with the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 31000. A-12: Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 14,000. A-13: Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 12600. A-14: Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 17,400. A-15: Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 34000.
  • A-16 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 23100.
  • A-17 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 19000.
  • A-18 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 22300.
  • A-19 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 28700.
  • A-20 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 15,000.
  • A-211 Resin with the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 9700. A-22: Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 50,000. A-23: Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 12100. A-24: Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 13000. A-27: Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 25,000.
  • A-28 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 28100.
  • A-29 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 34200.
  • A-30 Resin having the following structure. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 14500.
  • CA-3 Resin having the following structure.
  • the numerical value added to the repeating unit is the molar ratio.
  • the weight average molecular weight is 18700.
  • CA-4 Resin represented by the following formula. The numerical value added to the repeating unit is the molar ratio. The weight average molecular weight is 15900.
  • E-1 IRGACURE 379 (aminoacetophenone-based photoradical initiator (manufactured by BASF))
  • E-2 Irgacure OXE01 (Oxime ester-based photoradical initiator (manufactured by BASF))
  • E-3 Irgacure OXE03 (Oxime ester-based photoradical initiator (manufactured by BASF))
  • the obtained pattern was observed while changing the specific exposure amount, and the minimum exposure amount for resolving a square pattern having a side of 1.0 ⁇ m was determined and evaluated according to the following evaluation criteria. It can be said that the smaller the value of the minimum exposure amount, the better the exposure sensitivity of the composition.
  • the minimum exposure amount was less than 100 mJ / cm 2.
  • B The minimum exposure amount was 100 or more and less than 200 mJ / cm 2.
  • C The minimum exposure amount was 200 or more and less than 500 mJ / cm 2.
  • D The minimum exposure amount was 500 or more and less than 1000 mJ / cm 2.
  • E The minimum exposure amount was 1000 mJ / cm 2 or more.
  • ⁇ Vis was 0.5 mPa ⁇ s or less.
  • B ⁇ Vis exceeded 0.5 mPa ⁇ s and was 1.0 mPa ⁇ s or less.
  • C ⁇ Vis exceeded 1.0 mPa ⁇ s and was 2.0 mPa ⁇ s or less.
  • D ⁇ Vis exceeded 2.0 mPa ⁇ s and was 2.5 mPa ⁇ s or less.
  • the colored resin composition was applied on a glass substrate by spin coating, dried (prebaked) at 100 ° C. for 120 seconds using a hot plate, and then dried (prebaked) at 200 ° C. for 30 minutes using an oven.
  • a film having a thickness of 0.60 ⁇ m was produced by heating (post-baking).
  • the transmittance Tr1 of the obtained film at a wavelength of 450 nm was measured.
  • the obtained membrane was heat-treated at 300 ° C. for 5 hours under a nitrogen atmosphere.
  • Tr2 of the film after the heat treatment at a wavelength of 450 nm was measured.
  • the absolute value ⁇ T of the difference between Tr1 and Tr2 was calculated, and the spectral change was evaluated according to the following evaluation criteria. It can be said that the smaller ⁇ T, the less likely the spectral change will occur, which is preferable.
  • Both Tr1 and Tr2 were measured in a laboratory where the temperature and humidity were controlled to 22 ⁇ 5 ° C. and 60 ⁇ 20%, with the substrate temperature adjusted to 25 ° C.
  • ⁇ T was 0.1% or less.
  • B ⁇ T was more than 0.1% and 0.5% or less.
  • C ⁇ T was more than 0.5% and 1% or less.
  • D ⁇ T was more than 1% and 5% or less.
  • E ⁇ T exceeded 5%.
  • the colored resin composition was applied on a glass substrate by spin coating, dried (prebaked) at 100 ° C. for 120 seconds using a hot plate, and then dried (prebaked) at 200 ° C. for 30 minutes using an oven.
  • a film having a thickness of 0.60 ⁇ m was produced by heating (post-baking). The film thickness is measured by scraping a part of the film to expose the surface of the glass substrate and measuring the step between the glass substrate surface and the coating film (the film thickness of the coating film) using a stylus type profilometer (DectakXT, manufactured by BRUKER). did.
  • the obtained membrane was heat-treated at 300 ° C. for 5 hours under a nitrogen atmosphere.
  • the film shrinkage rate was obtained from the following formula, and the film shrinkage rate was evaluated according to the following evaluation criteria.
  • T0 and T1 below were measured in a laboratory where the temperature and humidity were controlled to 22 ⁇ 5 ° C. and 60 ⁇ 20%, with the substrate temperature adjusted to 25 ° C. It can be said that the smaller the film shrinkage rate, the more the film shrinkage is suppressed, which is a preferable result.
  • Membrane shrinkage rate (%) (1- (T1 / T0)) x 100
  • T1 Film thickness after heat treatment at 300 ° C for 5 hours in a nitrogen atmosphere-evaluation criteria-
  • A The membrane contraction rate was 1% or less.
  • B The membrane contraction rate was more than 1% and 5% or less.
  • C The membrane contraction rate was more than 5% and 10% or less.
  • D The membrane contraction rate was more than 10% and 30% or less.
  • E The membrane contraction rate exceeded 30%.
  • the colored resin composition was applied on a glass substrate by spin coating, dried (prebaked) at 100 ° C. for 120 seconds using a hot plate, and then dried (prebaked) at 200 ° C. for 30 minutes using an oven.
  • a film having a thickness of 0.60 ⁇ m was produced by heating (post-baking).
  • SiO 2 was laminated at 200 nm on the surface of the obtained film by a sputtering method to form an inorganic film.
  • the film on which the inorganic film was formed was heat-treated at 300 ° C. for 5 hours in a nitrogen atmosphere.
  • the surface of the inorganic film after the heat treatment was observed with an optical microscope, the number of cracks per 1 cm 2 was counted, and the presence or absence of cracks was evaluated according to the following evaluation criteria.
  • E The number of cracks per 1 cm 2 was 101 or more.
  • Example 100 Pattern formation by photolithography method
  • the colored resin composition of Example 1 is applied on a silicon wafer by spin coating, dried (prebaked) at 100 ° C. for 120 seconds using a hot plate, and then heated (post-baked) at 200 ° C. for 30 minutes using an oven.
  • a resin composition layer having a thickness of 0.60 ⁇ m.
  • an i-line stepper exposure apparatus FPA-3000i5 + (Canon, Inc.) is provided via a mask pattern in which square non-masked portions having a side of 1.1 ⁇ m are arranged in a region of 4 mm ⁇ 3 mm.
  • the produced patterned silicon wafer was divided into two, and one was heat-treated at 300 ° C. for 5 hours in a nitrogen atmosphere (hereinafter, one is a substrate before heat treatment at 300 ° C. and the other is a substrate after heat treatment at 300 ° C.).
  • one is a substrate before heat treatment at 300 ° C. and the other is a substrate after heat treatment at 300 ° C.
  • the cross section of the resist pattern formed on the substrate before the heat treatment at 300 ° C. and the substrate after the heat treatment at 300 ° C. was evaluated by a scanning electron microscope (SEM), the resist pattern formed on the substrate after the heat treatment at 300 ° C. was evaluated.
  • the height of the resist pattern was 75% of the height of the resist pattern formed on the substrate before heat treatment at 300 ° C.

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