WO2021135128A1 - Dustproof structure, microphone packaging structure and electronic device - Google Patents

Dustproof structure, microphone packaging structure and electronic device Download PDF

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Publication number
WO2021135128A1
WO2021135128A1 PCT/CN2020/099369 CN2020099369W WO2021135128A1 WO 2021135128 A1 WO2021135128 A1 WO 2021135128A1 CN 2020099369 W CN2020099369 W CN 2020099369W WO 2021135128 A1 WO2021135128 A1 WO 2021135128A1
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WO
WIPO (PCT)
Prior art keywords
dust
stress concentration
hole
proof structure
carrier
Prior art date
Application number
PCT/CN2020/099369
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French (fr)
Chinese (zh)
Inventor
游振江
畠山庸平
林育菁
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潍坊歌尔微电子有限公司
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Publication of WO2021135128A1 publication Critical patent/WO2021135128A1/en

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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00Electrostatic transducers
    • H04R19/005Electrostatic transducers using semiconductor materials
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00Electrostatic transducers
    • H04R19/04Microphones
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R2201/00Details of transducers, loudspeakers or microphones covered by H04R1/00 but not provided for in any of its subgroups
    • H04R2201/003Mems transducers or their use

Definitions

  • the present invention relates to the field of acousto-electric technology, and more specifically, to a dust-proof structure, a microphone packaging structure, and an electronic device.
  • the microphone is provided with a dust-proof structure.
  • the dust-proof structure is a device that can prevent foreign objects such as powder and particles from entering and cause the microphone to produce a false reaction, and can allow sound waves to pass through.
  • the dust-proof structure is composed of different materials, and the thermal expansion coefficients of different materials are different.
  • the dust-proof structure will warp during heat treatment.
  • the deformation of the carrier is large when the dust-proof structure is warped, and the deformation of the membrane is small. This causes the stress generated after the deformation to squeeze the membrane body, resulting in messy wrinkles on the mesh structure on the membrane body.
  • An object of the present invention is to provide a new technical solution for a dust-proof structure, a microphone packaging structure, and an electronic device.
  • a dust-proof structure including:
  • the supporting part includes a connecting part and a carrier fixed to the connecting part, the connecting part is arranged around the grid structure, a first through hole is formed in the middle of the carrier, and the grid structure covers the One end of the first through hole;
  • the stress concentration part is formed on the inner side of the support part, and the stress concentration part is used to concentrate the stress of the support part.
  • the stress concentration part is formed inside the connecting part, and the stress concentration part surrounds the grid structure.
  • the stress concentration portion includes a first extension portion extending inward from the connecting portion, a plurality of second through holes are provided on the first extension portion, and a plurality of second through holes are arranged along the The circumferential distribution of the first extension.
  • the aperture ratio of the second through hole is less than or equal to the aperture ratio of the grid structure.
  • the second through hole includes a rectangular hole or an arc-shaped hole.
  • the stress concentration portion includes a first extension portion extending inward from the connecting portion, a plurality of cuts are formed on the first extension portion, and a connection is formed between two ends of each of the cuts.
  • the cutout faces the grid structure, and the neck part faces the support part; a plurality of the cutouts are distributed along the circumferential direction of the first extension part.
  • the stress concentration portion is formed inside the carrier, and the stress concentration portion is arranged coaxially with the first through hole.
  • the stress concentration portion includes a second extension portion extending inwardly of the carrier, the second extension portion includes a plurality of protrusions, and the plurality of protrusions are along a circumferential direction of the second extension portion. distributed.
  • the protrusion includes a rectangular protrusion with a rectangular edge shape or an arc-shaped protrusion with an arc edge shape.
  • the stress concentration portion includes a second extension portion that extends inwardly of the carrier, and the second extension portion includes a plurality of arc-shaped walls; both ends of the arc-shaped wall are connected to the carrier, and the center of the arc-shaped wall is connected to the carrier. It is hollow; a plurality of the arc-shaped walls are distributed along the circumferential direction of the second extension portion, and the arc-shaped wall is arc-shaped along a section perpendicular to the axial direction of the first through hole.
  • the stress concentration portion is formed on both the connecting portion and the inner side of the carrier
  • the stress concentration part inside the connecting part is arranged around the grid structure, and the stress concentration part inside the carrier is arranged coaxially with the first through hole.
  • an elastic telescoping structure is provided on the grid structure, and the elastic telescoping structure can expand and contract along the plane where the grid structure is located.
  • the elastic coefficient of the elastic stretchable structure is anisotropic.
  • the aperture ratios of the grid structure are different everywhere.
  • the material of the grid structure and the connecting portion includes metallic glass.
  • the material of the carrier includes epoxy resin.
  • a microphone packaging structure including the dust-proof structure described in any one of the above, and the dust-proof structure is fixed on the sound hole of the microphone packaging structure;
  • the dust-proof structure covers the MEMS chip in the microphone packaging structure.
  • an electronic device including the aforementioned microphone packaging structure.
  • the stress concentration portion is provided to reduce the stress on the grid structure when the dust-proof structure is deformed, and avoid messy wrinkles on the grid structure.
  • Fig. 1 is a schematic structural diagram of a stress concentration part arranged inside a support part according to an embodiment of the present disclosure.
  • Fig. 2 is a schematic structural view of a cross-section of a stress concentration part arranged inside a connecting part according to an embodiment of the present disclosure.
  • Fig. 3 is a structural schematic diagram of a stress concentration part of an embodiment of the present disclosure in which a rectangular hole is provided on a first extension part.
  • Fig. 4 is a structural schematic diagram of a stress concentration part of an embodiment of the present disclosure in which an arc-shaped hole is provided on the first extension part.
  • Fig. 5 is a structural schematic diagram of a stress concentration part of an embodiment of the present disclosure in which a notch is provided on the first extension part.
  • Fig. 6 is a schematic structural view of a cross-section of a stress concentration portion provided inside a carrier according to an embodiment of the present disclosure.
  • Fig. 7 is a structural schematic diagram of a stress concentration part of an embodiment of the present disclosure in which a rectangular protrusion is provided on a second extension part.
  • Fig. 8 is a structural schematic diagram of an arc-shaped protrusion provided on the second extension part of the stress concentration part of an embodiment of the present disclosure.
  • Fig. 9 is a structural schematic diagram of the stress concentration part of an embodiment of the present disclosure in which an arc-shaped wall is provided on the second extension part.
  • FIG. 10 is a schematic structural view of a cross-section of a stress concentration portion provided on the inner side of the connecting portion and the inner side of the carrier according to an embodiment of the present disclosure.
  • FIG. 11 is a schematic diagram of a dustproof structure provided inside the sound hole on the microphone packaging structure substrate according to an embodiment of the present disclosure.
  • FIG. 12 is a schematic diagram of a dustproof structure provided at the MEMS chip on the microphone packaging structure substrate according to an embodiment of the present disclosure.
  • 11 is the connection part
  • 12 is the grid structure
  • 2 is the carrier layer
  • 3 is the stress concentration part
  • 31 is the first extension part
  • 311 is the rectangular hole
  • 312 is the arc hole
  • 313 is the cutout
  • 32 is the first extension.
  • Two extension parts 321 is a rectangular protrusion
  • 322 is an arc-shaped protrusion
  • 323 is an arc-shaped wall
  • 4 is a sound hole
  • 5 is a MEMS chip.
  • the dust-proof structure includes: a grid structure 12; a support portion, the support portion includes a connecting portion 11 and a carrier fixed to the connecting portion 11 2.
  • the connecting portion 11 is arranged around the grid structure 12, a first through hole is formed in the middle of the carrier 2, and the grid structure 12 covers one end of the first through hole; the connecting portion 11 and the grid structure 12 form a dust-proof structure film body.
  • the stress concentration part 3 forms a stress concentration part 3 inside the support part, and the stress concentration part 3 is used to concentrate the stress of the support part.
  • the grid structure 12 provides the dust-proof structure with a dust-proof effect, and can pass sound waves without affecting sound transmission.
  • the grid structure 12 may be provided with holes in the shape of a circle, a square, or the like.
  • the supporting part is used to support and fix the dust-proof structure at a set position.
  • the supporting part includes a connecting part 11 and a carrier 2, the carrier 2 is used to connect to a set position, and the connecting part 11 is used to connect the grid structure 12 to the carrier 2.
  • a stress concentration part 3 is formed inside the support part, and the stress concentration part 3 is arranged around the grid structure 12.
  • the stress concentration part 3 is arranged around the axis of the grid structure 12.
  • the stress concentration part 3 is used to concentrate the stress of the support part, for example, in the process of manufacturing or installing a dust-proof structure.
  • the dust-proof structure will be deformed by the heat treatment process or other factors in the above process, and stress will be generated in the support part.
  • the heat treatment process may warp the support part, and the stress caused by the warping deformation will be transferred to the mesh structure 12 and the mesh structure 12 will produce disorderly wrinkles.
  • the stress concentration part 3 concentrates the stress of the support part and reduces the stress on the grid structure 12. And, the concentrated stress causes the generated wrinkles to be concentrated on the stress concentration part with regular shapes and uniform distribution. This will control the generation of wrinkles on the grid structure 12, protect the structure of the grid structure 12 from damage, and improve the yield and reliability of the dust-proof structure.
  • the stress concentration part 3 may be formed inside the connecting part 11, and the stress concentration part 3 surrounds the grid structure 12.
  • the stress concentration part 3 is arranged inside the connecting part 11 of the support part, so that the connecting part 11, the stress concentration part 3 and the grid structure 12 are connected in sequence. In this way, it is possible to control the generation of wrinkles on the mesh structure 12 through the membrane body, protect the structure of the mesh structure 12 from damage, and improve the yield and reliability of the dust-proof structure.
  • the stress concentration portion 3 includes a first extension portion 31 extending inward from the connecting portion 11, a plurality of second through holes are provided on the first extension portion 31, and a plurality of second through holes are provided on the first extension portion 31.
  • the two through holes are distributed along the circumferential direction of the first extension portion 31.
  • the stress concentration portion 3 includes a first extension portion 31 and a plurality of second through holes provided on the first extension portion 31.
  • the generated stress can be concentrated on the position of the second through hole, and the position of the second through hole can be deformed to form wrinkles.
  • the stress on the grid structure 12 is reduced, and the grid structure 12 is prevented from causing messy folds due to the stress.
  • the second through hole includes a rectangular hole 311 or an arc-shaped hole 312.
  • the second through hole is a rectangular hole 311.
  • a plurality of rectangular holes 311 are provided on the first extension portion 31, so that stress can be concentrated on the positions of the plurality of rectangular holes 311. Avoid stress forming wrinkles on the grid structure 12.
  • the second through hole is an arc-shaped hole 312.
  • the arc-shaped holes 312 are distributed along the circumferential direction of the first extension portion 31, so that stress can be concentrated on the arc-shaped holes 312, and the stresses can prevent the grid structure 12 from forming wrinkles.
  • the arc-shaped holes 312 are evenly distributed along the circumferential direction of the first extension portion 31, so that the generated wrinkles are also evenly distributed along the circumferential direction, effectively controlling the shape and structure of the generated wrinkles.
  • the aperture ratio of the second through hole is less than or equal to the aperture ratio of the grid structure 12.
  • the second through hole provided on the stress concentration part 3 also sets the aperture ratio of the second through hole to be less than or equal to the aperture ratio of the mesh structure 12, so that the stress concentration part 3 is also It has the dustproof function of the grid structure 12.
  • the stress concentration portion 3 includes a first extension portion 31 extending inward from the connecting portion 11, and a plurality of slits 313 are formed on the first extension portion 31, and two of each slit 313 A neck portion connected to the first extension portion 31 is formed between the ends, the cutout 313 faces the grid structure 12, and the neck portion faces the support portion; a plurality of cutouts 313 are distributed along the circumference of the first extension portion 31.
  • a plurality of notches 313 are cut on the first extension portion 31 to form the stress concentration portion 3. In this way, the stress will cause the positions of multiple cuts 313 to avoid messy wrinkles of the grid structure 12 caused by the stress.
  • a stress concentration part 3 is formed inside the carrier 2, and the stress concentration part 3 is arranged coaxially with the first through hole.
  • the stress concentration part 3 is formed on the carrier 2, and the stress can be controlled by the carrier 2 to concentrate the stress on the stress concentration part 3.
  • the control wrinkles are formed on the stress concentration part 3 to avoid the formation of messy wrinkles on the grid structure 12.
  • the stress concentration portion 3 includes a second extension portion 32 extending inwardly of the carrier 2.
  • the second extension portion 32 includes a plurality of protrusions, and the plurality of protrusions are along the circumferential direction of the second extension portion 32. distributed.
  • the protrusion includes a rectangular protrusion 321 with a rectangular edge shape or an arc-shaped protrusion 322 with an arc edge shape.
  • a plurality of rectangular protrusions 321 are formed on the inner side of the carrier 2, so that stress can be concentrated on the plurality of rectangular protrusions 321.
  • the stress on the grid structure 12 is reduced, and messy folds on the grid structure 12 are avoided.
  • a plurality of arc-shaped protrusions 322 are formed on the inner side of the carrier 2, so that stress can be concentrated on the plurality of arc-shaped protrusions 322.
  • the stress on the grid structure 12 is reduced, and messy folds on the grid structure 12 are avoided.
  • the stress concentration portion 3 includes a second extension portion 32 extending inwardly of the carrier 2, and the second extension portion 32 includes a plurality of arc-shaped walls 323; both ends of the arc-shaped wall 323 and The carrier 2 is connected with a hollow in the middle; a plurality of arc-shaped walls 323 are distributed along the circumferential direction of the second extension portion 32, and the arc-shaped wall 323 is arc-shaped along a section perpendicular to the axial direction of the first through hole.
  • the arc-shaped wall 323 formed on the inner side of the carrier 2 can concentrate stress on each arc-shaped wall 323.
  • the stress is concentrated on each arc-shaped wall 323 in the circumferential direction.
  • the stress on the grid structure 12 can be reduced, the wrinkles can be evenly distributed along the circumferential direction, and the messy wrinkles on the grid structure 12 can be avoided.
  • the yield and reliability of the dust-proof structure are improved.
  • the stress concentration part 3 is formed on the inner side of the connecting part 11 and the carrier 2; the stress concentration part 3 inside the connecting part 11 is arranged around the grid structure 12, and the stress concentration inside the carrier 2 The part 3 is arranged coaxially with the first through hole.
  • the stress concentration portion 3 provided on the inner side of the carrier 2 and the stress concentration portion 3 provided on the inner side of the connecting portion 11 concentrate the stress, and the appearance of wrinkles on the stress concentration portion 3 is controlled.
  • the stress on the grid structure 12 is effectively reduced. Avoid messy folds on the grid structure 12.
  • an elastic telescoping structure is provided on the grid structure 12, and the elastic telescoping structure can expand and contract along the plane where the grid structure 12 is located.
  • the grid structure 12 has the ability to expand and contract along the plane by setting an elastic expansion structure. In this way, when stress occurs, the grid structure 12 can also eliminate the stress through the expansion and contraction of the elastic stretchable structure, which avoids the appearance of wrinkles on the grid structure 12.
  • the elastically stretchable structure may be a grid-like structure capable of elastically stretchable. This not only satisfies the ability of elastic expansion and contraction, but also has the same dustproof function as the grid structure 12.
  • the elastic coefficient of the elastic stretch structure is anisotropic.
  • the elastic coefficient of the elastic stretchable structure is anisotropic, so that the elastic stretchable structure has different elastic stretchability in different directions.
  • the elasticity coefficient on the plane where the grid structure 12 is located enables the other-row telescoping structure to meet the set telescoping capacity.
  • the wrinkles caused by the stress on the grid structure 12 can be effectively eliminated. Protect the grid structure from being destroyed.
  • the ability of elastic expansion and contraction can improve the ability of the dust-proof structure to resist external forces. Enhance the mechanical strength of the dust-proof structure.
  • the aperture ratios of the mesh structure 12 are different.
  • the mechanical strength of the mesh structure 12 is improved.
  • the grid structure 12 can protect itself from being damaged when it is subjected to stress or external force. It can improve the yield of dust-proof structure and the reliability of installation.
  • the strength of each location can be adjusted.
  • the material of the mesh structure 12 and the connecting portion 11 includes metallic glass.
  • the metallic glass has excellent mechanical strength, and the film body made of metallic glass can improve the mechanical strength of the mesh structure 12 and the connecting portion 11. It can improve the yield rate of manufacturing dust-proof structure and reduce the damage rate during installation.
  • the material of the carrier 2 includes epoxy resin.
  • the addition of epoxy resin to manufacture the carrier 2 can reduce the thickness of the carrier 2 on the premise of satisfying the function of the carrier 2 such as supporting the membrane body. This can contribute to the thinning of the dust-proof structure.
  • a microphone packaging structure includes the above-mentioned dust-proof structure, and the dust-proof structure is fixed on the sound hole 4 of the microphone packaging structure;
  • the dust-proof structure covers the MEMS chip 5 in the microphone packaging structure.
  • the microphone packaging structure includes a housing forming a accommodating cavity and a substrate fixed to the housing.
  • the sound hole 4 can be provided on the substrate or on the housing.
  • the dust-proof structure is fixed on the sound hole 4 from the outside of the microphone packaging structure to protect the components in the microphone packaging structure from the outside.
  • the dust-proof structure is fixed on the sound hole 4 from the inside of the microphone packaging structure to protect the components of the microphone packaging structure from the inside.
  • the dust-proof structure is fixed on the substrate to protect the sound hole 31 and the inside of the microphone packaging structure.
  • the MEMS chip 5 is fixed to the dust-proof structure.
  • the dust-proof structure is fixed inside the microphone packaging structure and covers the MEMS chip 5. In this way, the MEMS chip 5 can be protected.
  • the dust-proof structure can be fixed on the substrate where the MEMS chip 5 is located to form a coating. It is also possible to fix the dust-proof structure on the substrate of the MEMS chip 5 to form a coating. All of the above structures can form a protective effect on the MEMS chip 5.
  • the microphone packaging structure can effectively prevent damage to the dust-proof structure caused by heat during the installation and use of the microphone. And it can protect the components in the microphone. For example, the MEMS chip 5 is protected from contamination by external dust and other pollutants.
  • an electronic device including the aforementioned microphone packaging structure.
  • the electronic device includes the above-mentioned microphone packaging structure and has all the advantages of the above-mentioned microphone packaging structure.
  • the electronic equipment can be audio equipment, mobile phones, computers and other products.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Micromachines (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

Disclosed in the present invention are a dustproof structure, a microphone packaging structure and an electronic device. The dustproof structure comprises: a mesh structure; a support part, the support part comprising a connecting part and a carrier fixed to the connecting part, the connecting part surrounding the mesh structure, a first through hole being formed on the central portion of the carrier, and the mesh structure covering one end of the first through hole; and a stress concentration part, formed at the inner side of the support part, the stress concentration part being configured to concentrate stress of the support part. One technical effect of the present invention is reducing, by providing the stress concentration part, the stress generated on the mesh structure when the dustproof structure deforms, avoiding the generation of disordered folds on the mesh structure.

Description

防尘结构、麦克风封装结构以及电子设备Dustproof structure, microphone packaging structure and electronic equipment 技术领域Technical field
本发明涉及声电技术领域,更具体地,涉及一种防尘结构、麦克风封装结构以及电子设备。The present invention relates to the field of acousto-electric technology, and more specifically, to a dust-proof structure, a microphone packaging structure, and an electronic device.
背景技术Background technique
麦克风设置有防尘结构,防尘结构是一种能够防止粉末、颗粒等外来物进入引起麦克风产生错误反应,并且能够使声波通过的装置。The microphone is provided with a dust-proof structure. The dust-proof structure is a device that can prevent foreign objects such as powder and particles from entering and cause the microphone to produce a false reaction, and can allow sound waves to pass through.
防尘结构有不同的材料组成,不同材料的热膨胀系数不同。在防尘结构的安装工序中,热处理时,防尘结构会产生翘曲。相对地,载体在防尘结构发生翘曲中形变量大,膜体的形变量小。这样导致了形变后产生的应力会对膜体形成挤压,导致膜体上的网格结构产生杂乱的褶皱。The dust-proof structure is composed of different materials, and the thermal expansion coefficients of different materials are different. In the installation process of the dust-proof structure, the dust-proof structure will warp during heat treatment. In contrast, the deformation of the carrier is large when the dust-proof structure is warped, and the deformation of the membrane is small. This causes the stress generated after the deformation to squeeze the membrane body, resulting in messy wrinkles on the mesh structure on the membrane body.
因此,需要一种新的技术方案,以解决上述问题。Therefore, a new technical solution is needed to solve the above-mentioned problems.
发明内容Summary of the invention
本发明的一个目的是提供一种防尘结构、麦克风封装结构以及电子设备的新技术方案。An object of the present invention is to provide a new technical solution for a dust-proof structure, a microphone packaging structure, and an electronic device.
根据本发明的第一方面,提供了一种防尘结构,包括:According to the first aspect of the present invention, there is provided a dust-proof structure, including:
网格结构;Grid structure
支撑部,所述支撑部包括连接部和与连接部固定的载体,所述连接部围绕所述网格结构设置,所述载体的中部形成有第一通孔,所述网格结构覆盖所述第一通孔的一端;The supporting part includes a connecting part and a carrier fixed to the connecting part, the connecting part is arranged around the grid structure, a first through hole is formed in the middle of the carrier, and the grid structure covers the One end of the first through hole;
应力集中部,在所述支撑部的内侧形成所述应力集中部,所述应力集中部用于集中所述支撑部的应力。The stress concentration part is formed on the inner side of the support part, and the stress concentration part is used to concentrate the stress of the support part.
可选地,在所述连接部的内侧形成所述应力集中部,所述应力集中部围绕所述网格结构。Optionally, the stress concentration part is formed inside the connecting part, and the stress concentration part surrounds the grid structure.
可选地,所述应力集中部包括所述连接部向内侧延伸的第一延伸部,在所述第一延伸部上设置有多个第二通孔,多个所述第二通孔沿所述第一延伸部的周向分布。Optionally, the stress concentration portion includes a first extension portion extending inward from the connecting portion, a plurality of second through holes are provided on the first extension portion, and a plurality of second through holes are arranged along the The circumferential distribution of the first extension.
可选地,所述第二通孔的开口率小于等于所述网格结构的开口率。Optionally, the aperture ratio of the second through hole is less than or equal to the aperture ratio of the grid structure.
可选地,所述第二通孔包括矩形孔或弧形孔。Optionally, the second through hole includes a rectangular hole or an arc-shaped hole.
可选地,所述应力集中部包括所述连接部向内侧延伸的第一延伸部,在所述第一延伸部上切割形成多个切口,每个所述切口的两端部之间形成连接在所述第一延伸部上的颈部,所述切口朝向所述网格结构,所述颈部朝向所述支撑部;多个所述切口沿所述第一延伸部的周向分布。Optionally, the stress concentration portion includes a first extension portion extending inward from the connecting portion, a plurality of cuts are formed on the first extension portion, and a connection is formed between two ends of each of the cuts. On the neck of the first extension part, the cutout faces the grid structure, and the neck part faces the support part; a plurality of the cutouts are distributed along the circumferential direction of the first extension part.
可选地,在所述载体的内侧形成所述应力集中部,所述应力集中部与所述第一通孔同轴设置。Optionally, the stress concentration portion is formed inside the carrier, and the stress concentration portion is arranged coaxially with the first through hole.
可选地,所述应力集中部包括所述载体向内侧延伸的第二延伸部,所述第二延伸部包括多个凸起,多个所述凸起沿所述第二延伸部的周向分布。Optionally, the stress concentration portion includes a second extension portion extending inwardly of the carrier, the second extension portion includes a plurality of protrusions, and the plurality of protrusions are along a circumferential direction of the second extension portion. distributed.
可选地,沿与所述第一通孔的轴向垂直的剖面,所述凸起包括边缘形状为矩形的矩形凸起或边缘形状为弧形的弧形凸起。Optionally, along a cross-section perpendicular to the axial direction of the first through hole, the protrusion includes a rectangular protrusion with a rectangular edge shape or an arc-shaped protrusion with an arc edge shape.
可选地,所述应力集中部包括所述载体向内侧延伸的第二延伸部,所述第二延伸部包括多个弧形壁;所述弧形壁的两端和所述载体连接、中间为镂空;多个所述弧形壁沿所述第二延伸部的周向分布,所述弧形壁沿与所述第一通孔的轴向垂直的剖面为弧形。Optionally, the stress concentration portion includes a second extension portion that extends inwardly of the carrier, and the second extension portion includes a plurality of arc-shaped walls; both ends of the arc-shaped wall are connected to the carrier, and the center of the arc-shaped wall is connected to the carrier. It is hollow; a plurality of the arc-shaped walls are distributed along the circumferential direction of the second extension portion, and the arc-shaped wall is arc-shaped along a section perpendicular to the axial direction of the first through hole.
可选地,在所述连接部以及所述载体的内侧均形成所述应力集中部;Optionally, the stress concentration portion is formed on both the connecting portion and the inner side of the carrier;
所述连接部内侧的所述应力集中部围绕所述网格结构设置,所述载体内侧的所述应力集中部与所述第一通孔同轴设置。The stress concentration part inside the connecting part is arranged around the grid structure, and the stress concentration part inside the carrier is arranged coaxially with the first through hole.
可选地,所述网格结构上设置有弹性伸缩结构,所述弹性伸缩结构能沿所述网格结构所在的平面伸缩。Optionally, an elastic telescoping structure is provided on the grid structure, and the elastic telescoping structure can expand and contract along the plane where the grid structure is located.
可选地,所述弹性伸缩结构的弹性系数具有各向异性。Optionally, the elastic coefficient of the elastic stretchable structure is anisotropic.
可选地,所述网格结构各处的开口率不同。Optionally, the aperture ratios of the grid structure are different everywhere.
可选地,所述网格结构和所述连接部的材料包括金属玻璃。Optionally, the material of the grid structure and the connecting portion includes metallic glass.
可选地,所述载体的材料包括环氧树脂。Optionally, the material of the carrier includes epoxy resin.
根据本发明的第二方面,提供了一种麦克风封装结构,包括上述任意 一项所述的防尘结构,所述防尘结构固定在麦克风封装结构的声孔上;According to a second aspect of the present invention, there is provided a microphone packaging structure, including the dust-proof structure described in any one of the above, and the dust-proof structure is fixed on the sound hole of the microphone packaging structure;
或者,所述防尘结构包覆麦克风封装结构内的MEMS芯片。Alternatively, the dust-proof structure covers the MEMS chip in the microphone packaging structure.
根据本发明的第三方面,提供了一种电子设备,包括上述的麦克风封装结构。According to a third aspect of the present invention, there is provided an electronic device including the aforementioned microphone packaging structure.
根据本公开的一个实施例,通过设置应力集中部减小了防尘结构变形时网格结构上的应力,避免网格结构上产生杂乱的褶皱。According to an embodiment of the present disclosure, the stress concentration portion is provided to reduce the stress on the grid structure when the dust-proof structure is deformed, and avoid messy wrinkles on the grid structure.
通过以下参照附图对本发明的示例性实施例的详细描述,本发明的其它特征及其优点将会变得清楚。Through the following detailed description of exemplary embodiments of the present invention with reference to the accompanying drawings, other features and advantages of the present invention will become clear.
附图说明Description of the drawings
被结合在说明书中并构成说明书的一部分的附图示出了本发明的实施例,并且连同其说明一起用于解释本发明的原理。The drawings incorporated in the specification and constituting a part of the specification illustrate the embodiments of the present invention, and together with the description are used to explain the principle of the present invention.
图1是本公开一个实施例的在支撑部内侧设置应力集中部的结构示意图。Fig. 1 is a schematic structural diagram of a stress concentration part arranged inside a support part according to an embodiment of the present disclosure.
图2是本公开一个实施例的在连接部内侧设置应力集中部的剖面的结构示意图。Fig. 2 is a schematic structural view of a cross-section of a stress concentration part arranged inside a connecting part according to an embodiment of the present disclosure.
图3是本公开一个实施例的应力集中部为在第一延伸部上设置矩形孔的结构示意图。Fig. 3 is a structural schematic diagram of a stress concentration part of an embodiment of the present disclosure in which a rectangular hole is provided on a first extension part.
图4是本公开一个实施例的应力集中部为在第一延伸部上设置弧形孔的结构示意图。Fig. 4 is a structural schematic diagram of a stress concentration part of an embodiment of the present disclosure in which an arc-shaped hole is provided on the first extension part.
图5是本公开一个实施例的应力集中部为在第一延伸部上设置切口的结构示意图。Fig. 5 is a structural schematic diagram of a stress concentration part of an embodiment of the present disclosure in which a notch is provided on the first extension part.
图6是本公开一个实施例的在载体内侧设置应力集中部的剖面的结构示意图。Fig. 6 is a schematic structural view of a cross-section of a stress concentration portion provided inside a carrier according to an embodiment of the present disclosure.
图7是本公开一个实施例的应力集中部为在第二延伸部上设置矩形凸起的结构示意图。Fig. 7 is a structural schematic diagram of a stress concentration part of an embodiment of the present disclosure in which a rectangular protrusion is provided on a second extension part.
图8是本公开一个实施例的应力集中部为在第二延伸部上设置弧形凸起的结构示意图。Fig. 8 is a structural schematic diagram of an arc-shaped protrusion provided on the second extension part of the stress concentration part of an embodiment of the present disclosure.
图9是本公开一个实施例的应力集中部为在第二延伸部上设置弧形壁的结构示意图。Fig. 9 is a structural schematic diagram of the stress concentration part of an embodiment of the present disclosure in which an arc-shaped wall is provided on the second extension part.
图10是本公开一个实施例的在连接部内侧和载体内侧均设置应力集中部的剖面的结构示意图。FIG. 10 is a schematic structural view of a cross-section of a stress concentration portion provided on the inner side of the connecting portion and the inner side of the carrier according to an embodiment of the present disclosure.
图11是本公开一个实施例的在麦克风封装结构基板上的声孔内侧设置防尘结构结构示意图。FIG. 11 is a schematic diagram of a dustproof structure provided inside the sound hole on the microphone packaging structure substrate according to an embodiment of the present disclosure.
图12是本公开一个实施例的在麦克风封装结构基板上的MEMS芯片处设置防尘结构结构示意图。FIG. 12 is a schematic diagram of a dustproof structure provided at the MEMS chip on the microphone packaging structure substrate according to an embodiment of the present disclosure.
图中,11为连接部,12为网格结构,2为载体层,3为应力集中部,31为第一延伸部,311为矩形孔,312为弧形孔,313为切口,32为第二延伸部,321为矩形凸起,322为弧形凸起,323为弧形壁,4为声孔,5为MEMS芯片。In the figure, 11 is the connection part, 12 is the grid structure, 2 is the carrier layer, 3 is the stress concentration part, 31 is the first extension part, 311 is the rectangular hole, 312 is the arc hole, 313 is the cutout, and 32 is the first extension. Two extension parts, 321 is a rectangular protrusion, 322 is an arc-shaped protrusion, 323 is an arc-shaped wall, 4 is a sound hole, and 5 is a MEMS chip.
具体实施方式Detailed ways
现在将参照附图来详细描述本发明的各种示例性实施例。应注意到:除非另外具体说明,否则在这些实施例中阐述的部件和步骤的相对布置、数字表达式和数值不限制本发明的范围。Various exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. It should be noted that unless specifically stated otherwise, the relative arrangement of components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present invention.
以下对至少一个示例性实施例的描述实际上仅仅是说明性的,决不作为对本发明及其应用或使用的任何限制。The following description of at least one exemplary embodiment is actually only illustrative, and in no way serves as any limitation to the present invention and its application or use.
对于相关领域普通技术人员已知的技术、方法和设备可能不作详细讨论,但在适当情况下,所述技术、方法和设备应当被视为说明书的一部分。The technologies, methods, and equipment known to those of ordinary skill in the relevant fields may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be regarded as part of the specification.
在这里示出和讨论的所有例子中,任何具体值应被解释为仅仅是示例性的,而不是作为限制。因此,示例性实施例的其它例子可以具有不同的值。In all examples shown and discussed herein, any specific value should be interpreted as merely exemplary, rather than as a limitation. Therefore, other examples of the exemplary embodiment may have different values.
应注意到:相似的标号和字母在下面的附图中表示类似项,因此,一旦某一项在一个附图中被定义,则在随后的附图中不需要对其进行进一步讨论。It should be noted that similar reference numerals and letters indicate similar items in the following drawings, therefore, once an item is defined in one drawing, it does not need to be further discussed in the subsequent drawings.
根据本公开的一个实施例,提供了一种防尘结构,如图1所示,该防尘结构包括:网格结构12;支撑部,支撑部包括连接部11和与连接部11 固定的载体2,连接部11围绕网格结构12设置,载体2的中部形成有第一通孔,网格结构12覆盖第一通孔的一端;连接部11和网格结构12形成了防尘结构的膜体。According to an embodiment of the present disclosure, there is provided a dust-proof structure, as shown in FIG. 1, the dust-proof structure includes: a grid structure 12; a support portion, the support portion includes a connecting portion 11 and a carrier fixed to the connecting portion 11 2. The connecting portion 11 is arranged around the grid structure 12, a first through hole is formed in the middle of the carrier 2, and the grid structure 12 covers one end of the first through hole; the connecting portion 11 and the grid structure 12 form a dust-proof structure film body.
应力集中部3,在支撑部的内侧形成应力集中部3,应力集中部3用于集中支撑部的应力。The stress concentration part 3 forms a stress concentration part 3 inside the support part, and the stress concentration part 3 is used to concentrate the stress of the support part.
在该实施例中,网格结构12使防尘结构具备防尘的效果,并且可以使声波通过,不会影响声音传递。例如,网格结构12上可以设置有圆形、方形等形状的孔。In this embodiment, the grid structure 12 provides the dust-proof structure with a dust-proof effect, and can pass sound waves without affecting sound transmission. For example, the grid structure 12 may be provided with holes in the shape of a circle, a square, or the like.
支撑部用于将防尘结构支撑固定在设定的位置。支撑部包括连接部11和载体2,载体2用于与设定的位置进行连接,连接部11用于将网格结构12连接在载体2上。The supporting part is used to support and fix the dust-proof structure at a set position. The supporting part includes a connecting part 11 and a carrier 2, the carrier 2 is used to connect to a set position, and the connecting part 11 is used to connect the grid structure 12 to the carrier 2.
在支撑部的内侧形成应力集中部3,应力集中部3围绕网格结构12设置。例如图1,应力集中部3围绕网格结构12的轴线设置。A stress concentration part 3 is formed inside the support part, and the stress concentration part 3 is arranged around the grid structure 12. For example, in FIG. 1, the stress concentration part 3 is arranged around the axis of the grid structure 12.
应力集中部3用于集中支撑部的应力,例如,在制造或安装防尘结构的过程中。防尘结构会在上述过程中受到热处理工序或其他因素的影响发生变形,在支撑部会产生应力。例如热处理工序会使支撑部发生翘曲,翘曲的变形产生的应力传递到网格结构12会使网格结构12产生杂乱的褶皱。设置了应力集中部3后,应力集中部3将支撑部的应力集中,减少了网格结构12上的应力。以及,集中后的应力使产生的褶皱集中在应力集中部上且形状规则、分布均匀。这样会控制在网格结构12上产生褶皱,能够保护网格结构12的结构不损坏,提高防尘结构的成品率以及可靠性。The stress concentration part 3 is used to concentrate the stress of the support part, for example, in the process of manufacturing or installing a dust-proof structure. The dust-proof structure will be deformed by the heat treatment process or other factors in the above process, and stress will be generated in the support part. For example, the heat treatment process may warp the support part, and the stress caused by the warping deformation will be transferred to the mesh structure 12 and the mesh structure 12 will produce disorderly wrinkles. After the stress concentration part 3 is provided, the stress concentration part 3 concentrates the stress of the support part and reduces the stress on the grid structure 12. And, the concentrated stress causes the generated wrinkles to be concentrated on the stress concentration part with regular shapes and uniform distribution. This will control the generation of wrinkles on the grid structure 12, protect the structure of the grid structure 12 from damage, and improve the yield and reliability of the dust-proof structure.
例如,如图2所示,可以是在连接部11的内侧形成应力集中部3,应力集中部3围绕网格结构12。For example, as shown in FIG. 2, the stress concentration part 3 may be formed inside the connecting part 11, and the stress concentration part 3 surrounds the grid structure 12.
将应力集中部3设置在支撑部的连接部11的内侧,使连接部11、应力集中部3和网格结构12依次形成连接。这样能够通过膜体控制网格结构12上产生褶皱,保护网格结构12的结构不损坏,提高防尘结构的成品率以及可靠性。The stress concentration part 3 is arranged inside the connecting part 11 of the support part, so that the connecting part 11, the stress concentration part 3 and the grid structure 12 are connected in sequence. In this way, it is possible to control the generation of wrinkles on the mesh structure 12 through the membrane body, protect the structure of the mesh structure 12 from damage, and improve the yield and reliability of the dust-proof structure.
在一个例子中,如图3,4所示,应力集中部3包括连接部11向内侧延伸的第一延伸部31,在第一延伸部31上设置有多个第二通孔,多个第二 通孔沿第一延伸部31的周向分布。In an example, as shown in Figures 3 and 4, the stress concentration portion 3 includes a first extension portion 31 extending inward from the connecting portion 11, a plurality of second through holes are provided on the first extension portion 31, and a plurality of second through holes are provided on the first extension portion 31. The two through holes are distributed along the circumferential direction of the first extension portion 31.
在该例子中,应力集中部3包括了第一延伸部31以及在第一延伸部31上设置的多个第二通孔。这样能将产生的应力集中在第二通孔的位置,使第二通孔的位置发生变形形成褶皱。减少了网格结构12上的应力,避免应力使网格结构12产生杂乱的褶皱。In this example, the stress concentration portion 3 includes a first extension portion 31 and a plurality of second through holes provided on the first extension portion 31. In this way, the generated stress can be concentrated on the position of the second through hole, and the position of the second through hole can be deformed to form wrinkles. The stress on the grid structure 12 is reduced, and the grid structure 12 is prevented from causing messy folds due to the stress.
例如,第二通孔包括的矩形孔311或弧形孔312。For example, the second through hole includes a rectangular hole 311 or an arc-shaped hole 312.
如图3所示,第二通孔为矩形孔311。在第一延伸部31上设置有多个矩形孔311,这样能够将应力集中在多个矩形孔311的位置。避免应力在网格结构12上形成褶皱。As shown in FIG. 3, the second through hole is a rectangular hole 311. A plurality of rectangular holes 311 are provided on the first extension portion 31, so that stress can be concentrated on the positions of the plurality of rectangular holes 311. Avoid stress forming wrinkles on the grid structure 12.
例如,还可以将单个第二通孔的一部分设置在连接部11上,另一部分设置在第一延伸部31。这样的结构能够减小膜体和载体2连接在一起的对准误差,优化防尘结构的结构。避免了应力造成载体2和膜体间结构错位。For example, it is also possible to provide a part of the single second through hole on the connecting part 11 and another part on the first extension part 31. Such a structure can reduce the alignment error of the connection between the membrane body and the carrier 2 and optimize the structure of the dust-proof structure. The structural dislocation between the carrier 2 and the membrane body caused by stress is avoided.
如图4所示,第二通孔为弧形孔312。弧形孔312沿第一延伸部31周向分布,这样能够将应力集中在弧形孔312上,避免应力在网格结构12上形成褶皱。弧形孔312沿第一延伸部31的周向均匀分布,使产生的褶皱也沿周向均匀分布,有效控制了产生的褶皱的形状结构。As shown in FIG. 4, the second through hole is an arc-shaped hole 312. The arc-shaped holes 312 are distributed along the circumferential direction of the first extension portion 31, so that stress can be concentrated on the arc-shaped holes 312, and the stresses can prevent the grid structure 12 from forming wrinkles. The arc-shaped holes 312 are evenly distributed along the circumferential direction of the first extension portion 31, so that the generated wrinkles are also evenly distributed along the circumferential direction, effectively controlling the shape and structure of the generated wrinkles.
在一个例子中,第二通孔的开口率小于等于网格结构12的开口率。In an example, the aperture ratio of the second through hole is less than or equal to the aperture ratio of the grid structure 12.
该例子中,应力集中部3上设置的第二通孔除集中应力的功能以外,通过将第二通孔的开口率设置为小于或等于网格结构12的开口率,使应力集中部3也具有网格结构12的防尘功能。In this example, in addition to the function of concentrating stress, the second through hole provided on the stress concentration part 3 also sets the aperture ratio of the second through hole to be less than or equal to the aperture ratio of the mesh structure 12, so that the stress concentration part 3 is also It has the dustproof function of the grid structure 12.
在一个实施例中,如图5所示,应力集中部3包括连接部11向内侧延伸的第一延伸部31,在第一延伸部31上切割形成多个切口313,每个切口313的两端部之间形成连接在第一延伸部31上的颈部,切口313朝向网格结构12,颈部朝向支撑部;多个切口313沿第一延伸部31的周向分布。In one embodiment, as shown in FIG. 5, the stress concentration portion 3 includes a first extension portion 31 extending inward from the connecting portion 11, and a plurality of slits 313 are formed on the first extension portion 31, and two of each slit 313 A neck portion connected to the first extension portion 31 is formed between the ends, the cutout 313 faces the grid structure 12, and the neck portion faces the support portion; a plurality of cutouts 313 are distributed along the circumference of the first extension portion 31.
在该实施例中,在第一延伸部31上切割多个切口313,以形成应力集中部3。这样应力会多个切口313的位置,避免应力使网格结构12产生杂乱的褶皱。In this embodiment, a plurality of notches 313 are cut on the first extension portion 31 to form the stress concentration portion 3. In this way, the stress will cause the positions of multiple cuts 313 to avoid messy wrinkles of the grid structure 12 caused by the stress.
例如,还可以将单个切口的一部分设置在连接部11上,另一部分设 置在第一延伸部31。这样的结构能够减小膜体和载体2连接在一起的对准误差,优化防尘结构的结构。避免了应力造成载体2和膜体间结构错位。For example, it is also possible to provide a part of the single cutout on the connecting portion 11 and the other part on the first extension portion 31. Such a structure can reduce the alignment error of the connection between the membrane body and the carrier 2 and optimize the structure of the dust-proof structure. The structural dislocation between the carrier 2 and the membrane body caused by stress is avoided.
在一个实施例中,如图6所示,在载体2的内侧形成应力集中部3,应力集中部3与第一通孔同轴设置。In one embodiment, as shown in FIG. 6, a stress concentration part 3 is formed inside the carrier 2, and the stress concentration part 3 is arranged coaxially with the first through hole.
在载体2上形成应力集中部3,能够通过载体2控制将应力,以将应力集中在应力集中部3上。将控制褶皱在应力集中部3上形成,避免网格结构12上形成杂乱的褶皱。The stress concentration part 3 is formed on the carrier 2, and the stress can be controlled by the carrier 2 to concentrate the stress on the stress concentration part 3. The control wrinkles are formed on the stress concentration part 3 to avoid the formation of messy wrinkles on the grid structure 12.
例如,图7,8所示,应力集中部3包括载体2向内侧延伸的第二延伸部32,第二延伸部32包括多个凸起,多个凸起沿第二延伸部32的周向分布。For example, as shown in FIGS. 7 and 8, the stress concentration portion 3 includes a second extension portion 32 extending inwardly of the carrier 2. The second extension portion 32 includes a plurality of protrusions, and the plurality of protrusions are along the circumferential direction of the second extension portion 32. distributed.
通过在载体2的内侧形成多个凸起,将应力集中在多个凸起上,多个凸起即为第二延伸部32。应力作用在凸起上,减少了网格结构12上的应力,避免网格结构12上产生杂乱的褶皱。By forming a plurality of protrusions on the inner side of the carrier 2, stress is concentrated on the plurality of protrusions, and the plurality of protrusions are the second extension portions 32. The stress acts on the protrusions, reducing the stress on the grid structure 12 and avoiding messy wrinkles on the grid structure 12.
例如,沿与第一通孔的轴向垂直的剖面,凸起包括边缘形状为矩形的矩形凸起321或边缘形状为弧形的弧形凸起322。For example, along a cross-section perpendicular to the axial direction of the first through hole, the protrusion includes a rectangular protrusion 321 with a rectangular edge shape or an arc-shaped protrusion 322 with an arc edge shape.
如图7所示,载体2的内侧形成多个矩形凸起321,这样能够将应力集中在多个矩形凸起321上。减少了网格结构12上的应力,避免网格结构12上产生杂乱的褶皱。As shown in FIG. 7, a plurality of rectangular protrusions 321 are formed on the inner side of the carrier 2, so that stress can be concentrated on the plurality of rectangular protrusions 321. The stress on the grid structure 12 is reduced, and messy folds on the grid structure 12 are avoided.
如图8所示,载体2的内侧形成多个弧形凸起322,这样能够将应力集中在多个弧形凸起322上。减少了网格结构12上的应力,避免网格结构12上产生杂乱的褶皱。As shown in FIG. 8, a plurality of arc-shaped protrusions 322 are formed on the inner side of the carrier 2, so that stress can be concentrated on the plurality of arc-shaped protrusions 322. The stress on the grid structure 12 is reduced, and messy folds on the grid structure 12 are avoided.
在一个实施例中,如图9所示,应力集中部3包括载体2向内侧延伸的第二延伸部32,第二延伸部32包括多个弧形壁323;弧形壁323的两端和载体2连接、中间为镂空;多个弧形壁323沿第二延伸部32的周向分布,弧形壁323沿与第一通孔的轴向垂直的剖面为弧形。In one embodiment, as shown in FIG. 9, the stress concentration portion 3 includes a second extension portion 32 extending inwardly of the carrier 2, and the second extension portion 32 includes a plurality of arc-shaped walls 323; both ends of the arc-shaped wall 323 and The carrier 2 is connected with a hollow in the middle; a plurality of arc-shaped walls 323 are distributed along the circumferential direction of the second extension portion 32, and the arc-shaped wall 323 is arc-shaped along a section perpendicular to the axial direction of the first through hole.
在该实施例中,在载体2的内侧形成的弧形壁323能够将应力集中在每个弧形壁323上。使应力沿周向集中在每个弧形壁323上。这样能够减小网格结构12上的应力,使褶皱沿周向均匀分布,避免网格结构12上出现杂乱的褶皱。提高了防尘结构的成品率和可靠性。In this embodiment, the arc-shaped wall 323 formed on the inner side of the carrier 2 can concentrate stress on each arc-shaped wall 323. The stress is concentrated on each arc-shaped wall 323 in the circumferential direction. In this way, the stress on the grid structure 12 can be reduced, the wrinkles can be evenly distributed along the circumferential direction, and the messy wrinkles on the grid structure 12 can be avoided. The yield and reliability of the dust-proof structure are improved.
在一个实施例中,如图10所示,在连接部11以及载体2的内侧均形成应力集中部3;连接部11内侧的应力集中部3围绕网格结构12设置,载体2内侧的应力集中部3与第一通孔同轴设置。In one embodiment, as shown in FIG. 10, the stress concentration part 3 is formed on the inner side of the connecting part 11 and the carrier 2; the stress concentration part 3 inside the connecting part 11 is arranged around the grid structure 12, and the stress concentration inside the carrier 2 The part 3 is arranged coaxially with the first through hole.
在该实施例中,通过载体2内侧设置的应力集中部3以及连接部11内侧设置的应力集中部3集中应力,控制褶皱出现在应力集中部3上。有效减小了网格结构12上的应力。避免网格结构12上出现杂乱的褶皱。In this embodiment, the stress concentration portion 3 provided on the inner side of the carrier 2 and the stress concentration portion 3 provided on the inner side of the connecting portion 11 concentrate the stress, and the appearance of wrinkles on the stress concentration portion 3 is controlled. The stress on the grid structure 12 is effectively reduced. Avoid messy folds on the grid structure 12.
在一个实施例中,网格结构12上设置有弹性伸缩结构,弹性伸缩结构能沿网格结构12所在平面伸缩。In one embodiment, an elastic telescoping structure is provided on the grid structure 12, and the elastic telescoping structure can expand and contract along the plane where the grid structure 12 is located.
在该实施例中,通过设置弹性伸缩结构使网格结构12具有沿所在平面伸缩的能力。这样在出现应力使,网格结构12还能通过弹性伸缩结构的伸缩消除应力的作用,避免了网格结构12上出现褶皱。In this embodiment, the grid structure 12 has the ability to expand and contract along the plane by setting an elastic expansion structure. In this way, when stress occurs, the grid structure 12 can also eliminate the stress through the expansion and contraction of the elastic stretchable structure, which avoids the appearance of wrinkles on the grid structure 12.
例如,弹性伸缩结构可以是能够弹性伸缩的网格状结构。这样即满足弹性伸缩的能力,又具有网格结构12一样的防尘功能。For example, the elastically stretchable structure may be a grid-like structure capable of elastically stretchable. This not only satisfies the ability of elastic expansion and contraction, but also has the same dustproof function as the grid structure 12.
在一个例子中,弹性伸缩结构的弹性系数具有各向异性。In one example, the elastic coefficient of the elastic stretch structure is anisotropic.
弹性伸缩结构的弹性系数具有各向异性,使弹性伸缩结构在不同方向上的弹性伸缩能力不同。例如,在网格结构12所在平面上的弹性系数使他行伸缩结构满足设定的伸缩能力。能够有效地消除应力在网格结构12上产生的褶皱。保护网格结构不被破坏。The elastic coefficient of the elastic stretchable structure is anisotropic, so that the elastic stretchable structure has different elastic stretchability in different directions. For example, the elasticity coefficient on the plane where the grid structure 12 is located enables the other-row telescoping structure to meet the set telescoping capacity. The wrinkles caused by the stress on the grid structure 12 can be effectively eliminated. Protect the grid structure from being destroyed.
并且,弹性伸缩的能力能够提高防尘结构抵抗外部施加力的能力。增强了防尘结构的机械强度。Moreover, the ability of elastic expansion and contraction can improve the ability of the dust-proof structure to resist external forces. Enhance the mechanical strength of the dust-proof structure.
在一个例子中,网格结构12各处的开口率不同。In one example, the aperture ratios of the mesh structure 12 are different.
通过控制网格结构12各处的开口率,提高网格结构12的机械强度。这样在网格结构12受到应力作用或外部施力的作用时能够保护自身不被破坏。能够提高防尘结构的成品率以及安装的可靠性。By controlling the aperture ratio at various places of the mesh structure 12, the mechanical strength of the mesh structure 12 is improved. In this way, the grid structure 12 can protect itself from being damaged when it is subjected to stress or external force. It can improve the yield of dust-proof structure and the reliability of installation.
例如,通过控制网格结构12各处开口率,调整各位置的强度。For example, by controlling the aperture ratio of each location of the mesh structure 12, the strength of each location can be adjusted.
在一个例子中,网格结构12和连接部11的材料包括金属玻璃。In an example, the material of the mesh structure 12 and the connecting portion 11 includes metallic glass.
金属玻璃具有优异的机械强度,添加金属玻璃制作的膜体能够提高网格结构12和连接部11的机械强度。能够提高制造防尘结构的成品率,以及减少安装过程中的损坏率。The metallic glass has excellent mechanical strength, and the film body made of metallic glass can improve the mechanical strength of the mesh structure 12 and the connecting portion 11. It can improve the yield rate of manufacturing dust-proof structure and reduce the damage rate during installation.
在一个例子中,载体2的材料包括环氧树脂。In one example, the material of the carrier 2 includes epoxy resin.
添加环氧树脂制造载体2能够在满足载体2的支撑膜体等功能的前提下,减小载体2的厚度。这样能够有助于防尘结构薄化。The addition of epoxy resin to manufacture the carrier 2 can reduce the thickness of the carrier 2 on the premise of satisfying the function of the carrier 2 such as supporting the membrane body. This can contribute to the thinning of the dust-proof structure.
根据本发明的一个实施例,提供了一种麦克风封装结构,该麦克风封装结构包括上述的防尘结构,所述防尘结构固定在麦克风封装结构的声孔4上;According to an embodiment of the present invention, a microphone packaging structure is provided. The microphone packaging structure includes the above-mentioned dust-proof structure, and the dust-proof structure is fixed on the sound hole 4 of the microphone packaging structure;
或者,所述防尘结构包覆麦克风封装结构内的MEMS芯片5。Alternatively, the dust-proof structure covers the MEMS chip 5 in the microphone packaging structure.
一般地,麦克风封装结构包括形成容纳腔的壳体和与该壳体固定的基板。声孔4可以设置在基板上,也可以设置在壳体上。Generally, the microphone packaging structure includes a housing forming a accommodating cavity and a substrate fixed to the housing. The sound hole 4 can be provided on the substrate or on the housing.
在该实施例中,可以是,防尘结构从麦克风封装结构的外部固定在声孔4上,从外部对麦克风封装结构内的元器件起到保护作用。In this embodiment, it may be that the dust-proof structure is fixed on the sound hole 4 from the outside of the microphone packaging structure to protect the components in the microphone packaging structure from the outside.
也可以是,如图11所示,防尘结构从麦克风封装结构的内部固定在声孔4上,从内部对麦克风封装结构的元器件起到保护作用。Alternatively, as shown in FIG. 11, the dust-proof structure is fixed on the sound hole 4 from the inside of the microphone packaging structure to protect the components of the microphone packaging structure from the inside.
也可以是,如图12所示,防尘结构从固定在基板上,对声孔31与麦克风封装结构的内部起到保护作用。MEMS芯片5与防尘结构固定。Alternatively, as shown in FIG. 12, the dust-proof structure is fixed on the substrate to protect the sound hole 31 and the inside of the microphone packaging structure. The MEMS chip 5 is fixed to the dust-proof structure.
还可以是,防尘结构固定在麦克风封装结构的内部,并包覆MEMS芯片5。这样能够对MEMS芯片5形成保护。这种结构中,可以将防尘结构固定在MEMS芯片5所在的基板上,形成包覆。也可以将防尘结构固定在MEMS芯片5的衬底上,形成包覆。以上结构都能够对MEMS芯片5形成保护作用。It is also possible that the dust-proof structure is fixed inside the microphone packaging structure and covers the MEMS chip 5. In this way, the MEMS chip 5 can be protected. In this structure, the dust-proof structure can be fixed on the substrate where the MEMS chip 5 is located to form a coating. It is also possible to fix the dust-proof structure on the substrate of the MEMS chip 5 to form a coating. All of the above structures can form a protective effect on the MEMS chip 5.
该麦克风封装结构能够在麦克风安装和使用过程中有效防止受热导致的防尘结构损坏。并且能够对麦克风内的元器件形成保护。例如,保护MEMS芯片5不被外界灰尘等污染物污染。The microphone packaging structure can effectively prevent damage to the dust-proof structure caused by heat during the installation and use of the microphone. And it can protect the components in the microphone. For example, the MEMS chip 5 is protected from contamination by external dust and other pollutants.
根据本发明的一个实施例,提供了一种电子设备,包括上述的麦克风封装结构。According to an embodiment of the present invention, there is provided an electronic device including the aforementioned microphone packaging structure.
该电子设备包括上述麦克风封装结构,具有上述麦克风封装结构的所有优点。例如,电子设备可以是音响设备、手机、电脑等产品。The electronic device includes the above-mentioned microphone packaging structure and has all the advantages of the above-mentioned microphone packaging structure. For example, the electronic equipment can be audio equipment, mobile phones, computers and other products.
虽然已经通过例子对本发明的一些特定实施例进行了详细说明,但是 本领域的技术人员应该理解,以上例子仅是为了进行说明,而不是为了限制本发明的范围。本领域的技术人员应该理解,可在不脱离本发明的范围和精神的情况下,对以上实施例进行修改。本发明的范围由所附权利要求来限定。Although some specific embodiments of the present invention have been described in detail through examples, those skilled in the art should understand that the above examples are only for illustration and not for limiting the scope of the present invention. Those skilled in the art should understand that the above embodiments can be modified without departing from the scope and spirit of the present invention. The scope of the invention is defined by the appended claims.

Claims (18)

  1. 一种防尘结构,其特征在于,包括:A dust-proof structure, which is characterized in that it comprises:
    网格结构;Grid structure
    支撑部,所述支撑部包括连接部和与连接部固定的载体,所述连接部围绕所述网格结构设置,所述载体的中部形成有第一通孔,所述网格结构覆盖所述第一通孔的一端;The supporting part includes a connecting part and a carrier fixed to the connecting part, the connecting part is arranged around the grid structure, a first through hole is formed in the middle of the carrier, and the grid structure covers the One end of the first through hole;
    应力集中部,在所述支撑部的内侧形成所述应力集中部,所述应力集中部用于集中所述支撑部的应力。The stress concentration part is formed on the inner side of the support part, and the stress concentration part is used to concentrate the stress of the support part.
  2. 根据权利要求1所述的防尘结构,其特征在于,在所述连接部的内侧形成所述应力集中部,所述应力集中部围绕所述网格结构。The dust-proof structure according to claim 1, wherein the stress concentration part is formed inside the connecting part, and the stress concentration part surrounds the grid structure.
  3. 根据权利要求2所述的防尘结构,其特征在于,所述应力集中部包括所述连接部向内侧延伸的第一延伸部,在所述第一延伸部上设置有多个第二通孔,多个所述第二通孔沿所述第一延伸部的周向分布。The dust-proof structure according to claim 2, wherein the stress concentration portion includes a first extension portion extending inward from the connecting portion, and a plurality of second through holes are provided on the first extension portion , A plurality of the second through holes are distributed along the circumferential direction of the first extension part.
  4. 根据权利要求3所述的防尘结构,其特征在于,所述第二通孔的开口率小于等于所述网格结构的开口率。The dust-proof structure according to claim 3, wherein the aperture ratio of the second through hole is less than or equal to the aperture ratio of the grid structure.
  5. 根据权利要求3所述的防尘结构,其特征在于,所述第二通孔包括矩形孔或弧形孔。The dust-proof structure according to claim 3, wherein the second through hole comprises a rectangular hole or an arc-shaped hole.
  6. 根据权利要求2所述的防尘结构,其特征在于,所述应力集中部包括所述连接部向内侧延伸的第一延伸部,在所述第一延伸部上切割形成多个切口,每个所述切口的两端部之间形成连接在所述第一延伸部上的颈部,所述切口朝向所述网格结构,所述颈部朝向所述支撑部;多个所述切口沿所述第一延伸部的周向分布。The dust-proof structure according to claim 2, wherein the stress concentration portion includes a first extension portion extending inward from the connecting portion, and a plurality of incisions are formed on the first extension portion, each A neck connected to the first extension is formed between the two ends of the cut, the cut faces the grid structure, and the neck faces the support part; a plurality of the cuts are along the The circumferential distribution of the first extension.
  7. 根据权利要求1所述的防尘结构,其特征在于,在所述载体的内侧形成所述应力集中部,所述应力集中部与所述第一通孔同轴设置。The dust-proof structure according to claim 1, wherein the stress concentration portion is formed inside the carrier, and the stress concentration portion is arranged coaxially with the first through hole.
  8. 根据权利要求7所述的防尘结构,其特征在于,所述应力集中部包括所述载体向内侧延伸的第二延伸部,所述第二延伸部包括多个凸起,多个所述凸起沿所述第二延伸部的周向分布。The dust-proof structure according to claim 7, wherein the stress concentration portion includes a second extension portion of the carrier extending inward, the second extension portion includes a plurality of protrusions, and a plurality of the protrusions The ridges are distributed along the circumferential direction of the second extension portion.
  9. 根据权利要求7所述的防尘结构,其特征在于,沿与所述第一通孔的轴向垂直的剖面,所述凸起包括边缘形状为矩形的矩形凸起或边缘形状为弧形的弧形凸起。The dust-proof structure according to claim 7, characterized in that, along a cross-section perpendicular to the axial direction of the first through hole, the protrusions include rectangular protrusions with rectangular edges or arc-shaped edges. Curved convex.
  10. 根据权利要求7所述的防尘结构,其特征在于,所述应力集中部包括所述载体向内侧延伸的第二延伸部,所述第二延伸部包括多个弧形壁;所述弧形壁的两端和所述载体连接、中间为镂空;多个所述弧形壁沿所述第二延伸部的周向分布,所述弧形壁沿与所述第一通孔的轴向垂直的剖面为弧形。The dust-proof structure according to claim 7, wherein the stress concentration portion includes a second extension portion extending inwardly of the carrier, and the second extension portion includes a plurality of arc-shaped walls; the arc-shaped The two ends of the wall are connected with the carrier, and the middle is hollow; a plurality of the arc-shaped walls are distributed along the circumferential direction of the second extension, and the arc-shaped wall is perpendicular to the axial direction of the first through hole The section is curved.
  11. 根据权利要求1所述的防尘结构,其特征在于,在所述连接部以及所述载体的内侧均形成所述应力集中部;The dust-proof structure according to claim 1, wherein the stress concentration part is formed on both the connecting part and the inner side of the carrier;
    所述连接部内侧的所述应力集中部围绕所述网格结构设置,所述载体内侧的所述应力集中部与所述第一通孔同轴设置。The stress concentration part inside the connecting part is arranged around the grid structure, and the stress concentration part inside the carrier is arranged coaxially with the first through hole.
  12. 根据权利要求1-11中任意一项所述的防尘结构,其特征在于,所述网格结构上设置有弹性伸缩结构,所述弹性伸缩结构能沿所述网格结构所在的平面伸缩。The dust-proof structure according to any one of claims 1-11, wherein an elastic telescopic structure is provided on the grid structure, and the elastic telescopic structure can expand and contract along the plane where the grid structure is located.
  13. 根据权利要求12所述的防尘结构,其特征在于,所述弹性伸缩结构的弹性系数具有各向异性。The dust-proof structure according to claim 12, wherein the elastic coefficient of the elastic stretchable structure is anisotropic.
  14. 根据权利要求1-11中任意一项所述的防尘结构,其特征在于,所述网格结构各处的开口率不同。The dust-proof structure according to any one of claims 1-11, wherein the aperture ratio of the grid structure is different everywhere.
  15. 根据权利要求1-11中任意一项所述的防尘结构,其特征在于,所述网格结构和所述连接部的材料包括金属玻璃。The dust-proof structure according to any one of claims 1-11, wherein the material of the grid structure and the connecting part comprises metallic glass.
  16. 根据权利要求1-11中任意一项所述的防尘结构,其特征在于,所述载体的材料包括环氧树脂。The dust-proof structure according to any one of claims 1-11, wherein the material of the carrier comprises epoxy resin.
  17. 一种麦克风封装结构,其特征在于,包括权利要求1-16中任意一项所述的防尘结构,所述防尘结构固定在麦克风封装结构的声孔上;A microphone packaging structure, comprising the dust-proof structure according to any one of claims 1-16, the dust-proof structure being fixed on the sound hole of the microphone packaging structure;
    或者,所述防尘结构包覆麦克风封装结构内的MEMS芯片。Alternatively, the dust-proof structure covers the MEMS chip in the microphone packaging structure.
  18. 一种电子设备,其特征在于,包括权利要求17所述的麦克风封装结构。An electronic device, characterized by comprising the microphone packaging structure of claim 17.
PCT/CN2020/099369 2019-12-31 2020-06-30 Dustproof structure, microphone packaging structure and electronic device WO2021135128A1 (en)

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