WO2021017098A1 - 差动式正弦相位调制激光干涉纳米位移测量装置及方法 - Google Patents

差动式正弦相位调制激光干涉纳米位移测量装置及方法 Download PDF

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WO2021017098A1
WO2021017098A1 PCT/CN2019/104314 CN2019104314W WO2021017098A1 WO 2021017098 A1 WO2021017098 A1 WO 2021017098A1 CN 2019104314 W CN2019104314 W CN 2019104314W WO 2021017098 A1 WO2021017098 A1 WO 2021017098A1
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beam splitter
interference signal
polarization
corner cube
polarized light
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PCT/CN2019/104314
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English (en)
French (fr)
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严利平
陈本永
楼盈天
谢建东
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浙江理工大学
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Priority to US17/256,011 priority Critical patent/US11255655B2/en
Publication of WO2021017098A1 publication Critical patent/WO2021017098A1/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/353—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells influencing the transmission properties of an optical fibre
    • G01D5/35306—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells influencing the transmission properties of an optical fibre using an interferometer arrangement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Definitions

  • the invention relates to a laser interference displacement measurement method and device, in particular to a differential sinusoidal phase modulation laser interference nanometer displacement measurement device and method, belonging to the technical field of precision measurement.
  • High-precision nano-displacement measurement has important applications in technical fields such as ultra-precision machining, microelectronics manufacturing, and precision measurement and measurement.
  • Laser interferometric measurement technology is widely used in high-end manufacturing, precision measurement, scientific research and other fields because of its large measurement range, high measurement accuracy and direct traceability to the laser wavelength.
  • the different interference signal processing methods it is mainly divided into single frequency interference technology, heterodyne interference technology and sinusoidal phase modulation interference technology.
  • Single frequency interference technology is essentially a DC light intensity detection, DC light intensity drift, fine interference fringes Direct subdivision and non-orthogonal interference signals will introduce large errors; heterodyne interference technology is an AC detection, which can overcome the influence of DC light intensity drift, but it is caused by frequency aliasing and polarization aliasing.
  • the first-order nonlinear error limits the improvement of measurement accuracy; the sinusoidal phase modulation interference technology modulates the single-frequency interference DC interference signal into a high-frequency sinusoidal carrier and the sidebands of its harmonic signals, which can improve the interference resistance of the interference signal
  • the purpose of the present invention is to provide a differential sinusoidal phase modulation laser interferometer nano-displacement measurement device and method, and construct two sets of sinusoidal phase modulation interferometers at the same time, in the common reference arm of the two sets of interferometers.
  • An electro-optical phase modulator is placed in the center to modulate the DC interference signals of the two sets of interferometers into high-frequency sinusoidal carrier AC signals.
  • the measured displacement is obtained by demodulating the difference between the phase changes of the two interference signals and achieving sub-nanometer displacement measuring.
  • a differential sine phase modulation laser interference nanometer displacement measurement device :
  • the device includes a single-frequency laser, a polarizer, a beam splitter, a half glass plate, an electro-optic phase modulator, a first corner cube, a first polarization beam splitter, a second corner cube, a third corner cube, and a second polarization
  • the reflected output light beam of the mirror is modulated into s-polarized light after being modulated by the electro-optic phase modulator, and then directed to the first corner prism for folding reflection, and the light beam reflected by the first corner prism passes through half again After a glass slide, it becomes 45° linearly polarized light and is transmitted to the beam splitter; the transmitted output beam of the beam splitter
  • the s-polarized light beam reflected by the first polarization beam splitting prism is reflected on the second corner prism, and the p-polarized beam transmitted by the first polarization beam splitting prism is reflected by the third corner prism.
  • the s-polarized light beam reflected by the prism and the p-polarized light beam reflected by the third corner cube return to the first polarization beam splitting prism and merge into a beam of orthogonal linearly polarized light, which is incident on the beam splitter and reflected;
  • the 45° linearly polarized beam and the orthogonal linearly polarized beam returned by the first polarization beam splitter are combined at the beam splitter, where the s-polarized component of the 45° linearly polarized beam and the s-polarized light of the orthogonal linearly polarized beam interfere to form s-polarization Interference signal, the p-polarized component of the 45° linearly polarized beam and the p-polarized light of the orthogonal linearly
  • the s-polarized interference signal is used as a reference interference signal and reflected by the second polarization beam splitter by the first photoelectric
  • the detector receives the p-polarization interference signal as the measurement interference signal and is transmitted by the second polarization beam splitter and then received by the second photodetector.
  • the polarization transmission direction of the polarizer is 45° with the beam propagation direction.
  • the optical axis of the half glass slide is 22.5° with the beam propagation direction.
  • the electro-optical phase modulator is placed between the half glass and the first corner cube, and modulates the s-polarized light beam output from the half glass of the first corner cube, and the electro-optical phase
  • the electric field application direction of the modulator is consistent with the polarization direction of s-polarized light.
  • the beam with the output wavelength of ⁇ of the single-frequency laser is converted by the polarizer into linearly polarized light with the polarization direction and the beam propagation direction at 45°, which are respectively directed toward the beam splitter, the half glass plate, the electro-optic phase modulator, and the first
  • a reference sine phase modulation interferometer composed of a corner cube, a first polarization beam splitter and a second corner cube and the same beam splitter, a half glass, an electro-optic phase modulator, a first corner prism, a first corner cube
  • the measurement sine phase modulation interferometer composed of a polarization beam splitter and a different third corner cube form a reference interference signal and a measurement interference signal respectively, which are received by two photodetectors (11, 12) after being split by the second polarization beam splitter;
  • the electro-optical phase modulator is placed between the half glass of the sinusoidal phase modulation interferometer and the first corner prism to modulate the s-polarized beam emitted from the half glass and incident on the first corner prism , Apply a high-frequency sinusoidal carrier voltage whose electric field direction is consistent with the polarization direction of s-polarized light to the electro-optical phase modulator, and modulate the interference signals of the reference sinusoidal phase modulation interferometer and the measurement sinusoidal phase modulation interferometer into a high-frequency sinusoidal carrier AC interference signal ;
  • the third corner cube is fixed on the object to be measured.
  • the PGC phase demodulation method is used to obtain the phase change of the reference interference signal And measure the phase change of the interference signal
  • ⁇ is the laser wavelength
  • ⁇ L R is the fluctuation of the optical path between the beam splitter and the first corner cube caused by temperature drift and environmental disturbance during the movement of the third corner cube
  • ⁇ L M is the third corner cube during the movement The fluctuation of the optical path between the beam splitter and the first polarization beam splitter caused by temperature drift and environmental disturbance
  • the measured displacement ⁇ L is obtained by using the following formula:
  • the present invention includes two sets of sinusoidal phase modulation interferometers.
  • a high-frequency sinusoidal modulation voltage to the electro-optic phase modulators in the common reference arm of the two sets of interferometers, the DC interference signals of the two sets of interferometers are modulated to high Frequency sine carrier AC interference signal improves the anti-interference ability of interference signal.
  • the light path structure is simple and easy to use.
  • the invention is mainly suitable for sub-nanometer precision displacement measurement involved in the fields of ultra-precision machining, microelectronics manufacturing, and precision measurement and measurement.
  • Figure 1 is a schematic diagram of the device and method of the present invention.
  • the present invention includes a single-frequency laser 1, a polarizer 2, a beam splitter 3, a half glass plate 4, an electro-optical phase modulator 5, a first corner cube 6, a first polarizing beam splitter 7, The second corner prism 8, the third triangular prism 9, the second polarization beam splitter 10, the first photodetector 11 and the second photodetector 12; the light beam output by the single frequency laser 1 is converted into the polarization direction after passing through the polarizer 2
  • the linearly polarized light at 45° to the beam propagation direction is transmitted and reflected to the beam splitter 3: the reflected output beam of the beam splitter 3 is modulated into s-polarized light after half of the glass plate 4, and is modulated by the electro-optic phase modulator 5.
  • the light beam reflected by the first corner prism 6 becomes 45° linearly polarized light after passing through one-half of the glass plate 4 and is transmitted toward the beam splitter 3 for transmission;
  • the transmitted output beam of 3 is directed to the first polarization beam splitter 7 to reflect and transmit two orthogonal linearly polarized beams respectively divided into s-polarization and p-polarization.
  • the s-polarized beam reflected by the first polarization beam splitter 7 is directed to the second The corner cube 8 undergoes foldback reflection, the p-polarized beam transmitted by the first polarization beam splitting prism 7 is directed to the third corner prism 9 for foldback reflection, and the s-polarized beam reflected by the second corner prism 8 and the third corner prism 9 reflected
  • the p-polarized beam returns to the first polarization beam splitting prism 7 and merges into a beam of orthogonal linearly polarized light, which is incident on the beam splitter 3 and reflected; the 45° linearly polarized beam returned by the half glass 4 and the first polarization beam splitter
  • the orthogonal linearly polarized beams returned by the prism 7 are combined at the beam splitter 3, where the s-polarized component of the 45° linearly polarized beam and the s-polarized light of the orthogonal linearly polarized beam interfere to form an s-polarized interference signal, and the 45° linearly
  • the s-polarized interference signal is used as a reference interference signal and is reflected by the second polarization beam splitter 10 and then received by the first photodetector 11.
  • the interference signal is transmitted through the second polarization beam splitter 10 as a measurement interference signal and then received by the second photodetector 12.
  • the interferometer composed of the beam splitter 3, the half glass slide 4, the electro-optical phase modulator 5, the first corner cube 6, the first polarization beam splitter 7 and the second corner cube 8 is a reference sinusoidal phase modulation interferometer
  • the interferometer composed of the scoring beam splitter 3, the half glass slide 4, the electro-optic phase modulator 5, the first corner cube 6, the first polarization beam splitter 7 and the third corner cube 9 is a measuring sine phase modulation interferometer; It can be seen from Figure 1 that the optical path between the beam splitter 3 and the first corner cube 6 constitutes the common reference arm of the reference interferometer and the measuring interferometer, the beam splitter 3, the first polarization beam splitter 7 and the second corner cone
  • the optical path between the prisms 8 constitutes the measurement arm of the reference interferometer, and the optical path between the beam splitter 3, the first polarization beam splitter 7 and the third corner cube 9 constitute the measurement arm of the measurement interferometer.
  • the electro-optic phase modulator 5 is used to modulate the DC interference signal of the interferometer into a high-frequency sinusoidal carrier AC signal.
  • the third corner cube 9 fixed on the object to be measured moves, it drives the measuring interferometer
  • the phase has changed, and the displacement can be calculated more accurately by detecting the phase change of the two interferometers.
  • the polarization transmission direction of the polarizer 2 is 45° with the beam propagation direction, and the optical axis of the half glass plate 4 is 22.5° with the beam propagation direction.
  • the electro-optical phase modulator 5 is placed between the half glass plate 4 and the first corner cube 6 and modulates the s-polarized light beam output from the half glass plate 4 of the first corner cube 6, and
  • the electric field application direction of the electro-optical phase modulator 5 coincides with the polarization direction of s-polarized light.
  • the implementation process of the present invention is as follows:
  • the interferometer composed of the scoring beam splitter 3, the half glass slide 4, the electro-optic phase modulator 5, the first corner cube 6, the first polarization beam splitter 7 and the second corner cube is a reference sinusoidal phase modulation interferometer
  • the interferometer composed of the scoring beam splitter 3, the half glass slide 4, the electro-optical phase modulator 5, the first corner cube 6, the first polarization beam splitter 7 and the third corner cube 9 is a measuring sine phase modulation interferometer;
  • the optical path between the beam splitter 3 and the first corner cube 6 constitutes the common reference arm of the reference interferometer and the measuring interferometer
  • the optical path between 8 constitutes the measurement arm of the reference interferometer
  • the optical path between the beam splitter 3, the first polarization beam splitter 7 and the third corner cube 9 constitute the measurement arm of the measurement interferometer.
  • S 01 and S 11 represent the DC component and AC component amplitude of the reference interference signal
  • S 02 and S 12 represent the DC component and AC component amplitude of the measurement interference signal
  • ⁇ is the laser wavelength
  • ⁇ is the electro-optic phase modulator 5 is the frequency of the sinusoidal voltage applied
  • z is the sinusoidal phase modulation depth.
  • the movement displacement of the third triangular prism 9 is ⁇ L.
  • the optical path lengths of the common reference arm and measuring arm of the two sets of interferometers will change. Record the beam splitter 3 to the first corner prism
  • the optical path fluctuation ⁇ L R between 6 and the optical path fluctuation ⁇ L M between the beam splitter 3 and the first polarization beam splitter 7 are recorded, and the phases of the reference interference signal and the measured interference signal become:
  • phase changes of the two interference signals are:
  • the displacement ⁇ L of the third corner cube 9 can be obtained as:
  • the bandwidth of the device is 10MHz, and the existing PGC phase demodulation technology can generally achieve a phase demodulation accuracy of 0.1°, which is substituted into the above formula (9) to obtain a displacement measurement accuracy of 88pm.
  • the method of the present invention constructs two sets of sinusoidal phase modulation interferometers, placing an electro-optic phase modulator in the common reference arm of the two sets of interferometers, and modulating the DC interference signals of the two sets of interferometers into high-frequency sinusoidal carriers
  • the AC signal improves the anti-interference ability of the interference signal
  • the phase change of the constructed reference interferometer characterizes the optical path fluctuation of the interferometer reference arm and part of the measurement arm caused by temperature drift and environmental disturbance during the measurement process.
  • the difference in the phase change of the signal is used to obtain the measured displacement, which eliminates the error introduced by temperature drift and environmental disturbance, and achieves sub-nanometer measurement accuracy.

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  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
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Abstract

一种差动式正弦相位调制激光干涉纳米位移测量装置及方法。单频激光器（1）输出的光束经偏振片（2）转换为45°线偏振光，射向由分光镜（3）、电光相位调制器（5）、二分之一玻片（4）、三个角锥棱镜（6,8,9）、两个偏振分光镜（7,10）组成的两套正弦相位调制干涉仪，形成测量和参考干涉信号，两个光电探测器（11,12）接收；两套干涉仪公共参考臂的电光相位调制器（5）施加高频正弦电压信号，将干涉信号调制为高频交流信号；检测被测对象运动时两路干涉信号的相位变化量之差，得到被测位移。通过正弦相位调制提高了干涉信号的抗干扰能力，采用差动光路消除了参考臂和部分测量臂的温度漂移和环境扰动误差，具有亚纳米级测量精度，适用于高端装备制造与精密测试计量领域的精密位移测量。

Description

差动式正弦相位调制激光干涉纳米位移测量装置及方法 技术领域
本发明涉及激光干涉位移测量方法及装置，尤其是涉及一种差动式正弦相位调制激光干涉纳米位移测量装置及方法，属于精密测量技术领域。
背景技术
高精度的纳米位移测量在超精密加工、微电子制造以及精密测试计量等技术领域有着重要的应用。激光干涉测量技术因具有测量范围大、测量精度高和直接溯源至激光波长的特点，在高端制造、精密测量、大科学研究等领域广泛应用。根据干涉信号处理方式的不同，主要分为单频干涉技术、外差干涉技术和正弦相位调制干涉技术，单频干涉技术本质上是一种直流光强检测，直流光强漂移、对干涉条纹细分直接细分和干涉信号非正交等会引入较大的误差；外差干涉技术是一种交流探测，可以克服直流光强漂移的影响，但是由于存在频率混叠和偏振混叠等引起的一阶非线性误差，限制了测量精度的提高；正弦相位调制干涉技术将单频干涉的直流干涉信号调制为高频正弦载波及其各阶谐频信号的边带，可以提高干涉信号的抗干扰能力，但是受测量过程中干涉仪的参考臂和测量臂的温度变化和环境波动等影响，位移测量精度难以提高。
发明内容
针对现有技术中的不足，本发明的目的在于提供一种差动式正弦相位调制激光干涉纳米位移测量装置及方法，同时构建两套正弦相位调制干涉仪，在两套干涉仪的公共参考臂中放置电光相位调制器，将两套干涉仪的直流干涉信号调制为高频正弦载波交流信号，通过解调计算两路干涉信号的相位变化量之差来获得被测位移，实现亚纳米级位移测量。
本发明解决其技术问题所采用的技术方案是：
一、一种差动式正弦相位调制激光干涉纳米位移测量装置：
装置包括单频激光器、偏振片、分光镜、二分之一玻片、电光相位调制器、第一角锥棱镜、第一偏振分光镜、第二角锥棱镜、第三角锥棱镜、第二偏振分光镜、第一光电探测器和第二光电探测器；单频激光器输出的光束经偏振片后转换为偏振方向与光束传播方向成45°的线偏振光射向分光镜发生透射和反射：分光镜的反射输出光束经二分之一玻片后调制为s偏振光，经电光相位调制器调制后射向第一角锥棱镜发生折返反射，第一角锥棱镜反射的光束再次经过二分之一玻片后变成45°线偏振光并射向分光镜发生透射；分光镜的透射输出光束射 向第一偏振分光镜发生反射和透射分别分为s偏振和p偏振的两束正交线偏振光束，经第一偏振分光棱镜反射的s偏振光束射向第二角锥棱镜发生折返反射，经第一偏振分光棱镜透射的p偏振光束射向第三角锥棱镜发生折返反射，第二角锥棱镜反射的s偏振光束和第三角锥棱镜反射的p偏振光束回到第一偏振分光棱镜处并汇合为一束正交线偏振光入射到分光镜发生反射；经二分之一玻片返回的45°线偏振光束与第一偏振分光棱镜返回的正交线偏振光束在分光镜处合束，其中45°线偏振光束的s偏振分量和正交线偏振光束的s偏振光产生干涉形成s偏振干涉信号，45°线偏振光束的p偏振分量和正交线偏振光束的p偏振光产生干涉形成p偏振干涉信号，s偏振干涉信号作为参考干涉信号经第二偏振分光镜反射后由第一光电探测器接收，p偏振干涉信号作为测量干涉信号经第二偏振分光镜透射后由第二光电探测器接收。
所述的偏振片的偏振透射方向与光束传播方向成45°。
所述的二分之一玻片的光轴与光束传播方向成22.5°。
所述的电光相位调制器放置在二分之一玻片和第一角锥棱镜之间，调制的是射向第一角锥棱镜的二分之一玻片输出的s偏振光束，且电光相位调制器的电场施加方向与s偏振光的偏振方向一致。
二、一种差动式正弦相位调制激光干涉纳米位移测量方法：
1)单频激光器输出波长为λ的光束经偏振片转换为偏振方向与光束传播方向成45°的线偏振光，分别射向由分光镜、二分之一玻片、电光相位调制器、第一角锥棱镜、第一偏振分光镜和第二角锥棱镜组成的参考正弦相位调制干涉仪和由同一分光镜、二分之一玻片、电光相位调制器、第一角锥棱镜、第一偏振分光镜和不同的第三角锥棱镜组成的测量正弦相位调制干涉仪，分别形成参考干涉信号和测量干涉信号，经第二偏振分光镜分光后由两个光电探测器(11、12)接收；
2)电光相位调制器放置在正弦相位调制干涉仪的二分之一玻片和第一角锥棱镜之间，调制由二分之一玻片出射、向第一角锥棱镜入射的s偏振光束，对电光相位调制器施加电场方向与s偏振光的偏振方向一致的高频正弦载波电压，将参考正弦相位调制干涉仪和测量正弦相位调制干涉仪的干涉信号调制为高频正弦载波交流干涉信号；
3)第三角锥棱镜固定于待测物体上，第三角锥棱镜移动位移ΔL时，采用PGC相位解调方法获得参考干涉信号的相位变化量
Figure PCTCN2019104314-appb-000001
和测量干涉信号的相位变化量
Figure PCTCN2019104314-appb-000002
分别为：
Figure PCTCN2019104314-appb-000003
Figure PCTCN2019104314-appb-000004
式中：λ为激光波长，δL R为第三角锥棱镜运动过程中温度漂移和环境扰动引起的分光镜至第一角锥棱镜之间的光程波动，δL M为第三角锥棱镜运动过程中温度漂移和环境扰动引起的分光镜至第一偏振分光镜之间的光程波动；
4)通过计算测量干涉信号的相位变化量和参考干涉信号的相位变化量之差，再采用以下公式得到被测位移ΔL为：
Figure PCTCN2019104314-appb-000005
至此求出第三角锥棱镜的运动位移。
本发明具有的有益效果是：
(1)本发明中包含两套正弦相位调制干涉仪，通过在两套干涉仪公共参考臂中的电光相位调制器上施加高频正弦调制电压，将两套干涉仪的直流干涉信号调制为高频正弦载波交流干涉信号，提高了干涉信号的抗干扰能力。
(2)第三角锥棱镜运动时，检测测量干涉信号的相位变化量和参考干涉信号的相位变化量，计算两套干涉仪的两路干涉信号的相位变化量之差来获得被测位移，消除了温度漂移和环境扰动引入的误差，具有亚纳米级测量精度，可达到88pm左右的精度。
(3)光路结构简单，使用方便。本发明主要适用于超精密加工、微电子制造以及精密测试计量等领域所涉及的亚纳米级精度的位移测量。
附图说明
图1是本发明装置和方法的原理图。
图中：1、单频激光器，2、偏振片，3、分光镜，4、二分之一玻片，5、电光相位调制器，6、第一角锥棱镜，7、第一偏振分光镜，8、第二角锥棱镜，9、第三角锥棱镜，10、第二偏振分光镜，11、第一光电探测器，12、第二光电探测器。
具体实施方式
下面结合附图和实施例对本发明加以详细说明。
如图1所示，本发明包括单频激光器1、偏振片2、分光镜3、二分之一玻片4、电光相位调制器5、第一角锥棱镜6、第一偏振分光镜7、第二角锥棱镜8、 第三角锥棱镜9、第二偏振分光镜10、第一光电探测器11和第二光电探测器12；单频激光器1输出的光束经偏振片2后转换为偏振方向与光束传播方向成45°的线偏振光射向分光镜3发生透射和反射：分光镜3的反射输出光束经二分之一玻片4后调制为s偏振光，经电光相位调制器5调制后射向第一角锥棱镜6发生折返反射，第一角锥棱镜6反射的光束再次经过二分之一玻片4后变成45°线偏振光并射向分光镜3发生透射；分光镜3的透射输出光束射向第一偏振分光镜7发生反射和透射分别分为s偏振和p偏振的两束正交线偏振光束，经第一偏振分光棱镜7反射的s偏振光束射向第二角锥棱镜8发生折返反射，经第一偏振分光棱镜7透射的p偏振光束射向第三角锥棱镜9发生折返反射，第二角锥棱镜8反射的s偏振光束和第三角锥棱镜9反射的p偏振光束回到第一偏振分光棱镜7处并汇合为一束正交线偏振光入射到分光镜3发生反射；经二分之一玻片4返回的45°线偏振光束与第一偏振分光棱镜7返回的正交线偏振光束在分光镜3处合束，其中45°线偏振光束的s偏振分量和正交线偏振光束的s偏振光产生干涉形成s偏振干涉信号，45°线偏振光束的p偏振分量和正交线偏振光束的p偏振光产生干涉形成p偏振干涉信号，s偏振干涉信号作为参考干涉信号经第二偏振分光镜10反射后由第一光电探测器11接收，p偏振干涉信号作为测量干涉信号经第二偏振分光镜10透射后由第二光电探测器12接收。
记分光镜3、二分之一玻片4、电光相位调制器5、第一角锥棱镜6、第一偏振分光镜7和第二角锥棱镜8组成的干涉仪为参考正弦相位调制干涉仪，记分光镜3、二分之一玻片4、电光相位调制器5、第一角锥棱镜6、第一偏振分光7和第三角锥棱镜9组成的干涉仪为测量正弦相位调制干涉仪；从图1中可以看出，分光镜3和第一角锥棱镜6之间的光路构成参考干涉仪和测量干涉仪的公共参考臂，分光镜3、第一偏振分光镜7和第二角锥棱镜8之间的光路构成参考干涉仪的测量臂，分光镜3、第一偏振分光镜7和第三角锥棱镜9之间的光路构成测量干涉仪的测量臂。
由此构成两套干涉仪，利用电光相位调制器5将干涉仪的直流干涉信号调制为高频正弦载波交流信号，固定于待测对象上的第三角锥棱镜9运动时，带动测量干涉仪的相位发生了变化，检测两条干涉仪的相位变化量可更准确计算获得位移。
偏振片2的偏振透射方向与光束传播方向成45°，二分之一玻片4的光轴与光束传播方向成22.5°。
电光相位调制器5放置在二分之一玻片4和第一角锥棱镜6之间，调制的是射向第一角锥棱镜6的二分之一玻片4输出的s偏振光束，且电光相位调制器 5的电场施加方向与s偏振光的偏振方向一致。
本发明实施过程如下：
记分光镜3、二分之一玻片4、电光相位调制器5、第一角锥棱镜6、第一偏振分光镜7和第二角锥棱镜组成的干涉仪为参考正弦相位调制干涉仪，记分光镜3、二分之一玻片4、电光相位调制器5、第一角锥棱镜6、第一偏振分光7和第三角锥棱镜9组成的干涉仪为测量正弦相位调制干涉仪；从图1中可以看出，分光镜3和第一角锥棱镜6之间的光路构成参考干涉仪和测量干涉仪的公共参考臂，分光镜3、第一偏振分光镜7和第二角锥棱镜8之间的光路构成参考干涉仪的测量臂，分光镜3、第一偏振分光镜7和第三角锥棱镜9之间的光路构成测量干涉仪的测量臂。
测量开始时，记L CR为参考干涉仪和测量干涉仪的公共参考臂光程，L M1为参考干涉仪的测量臂光程，L M2为测量干涉仪的测量臂光程。当电光相位调制器5施加高频正弦电压时，两个探测器接收到的参考和测量干涉信号分别为：
Figure PCTCN2019104314-appb-000006
Figure PCTCN2019104314-appb-000007
式中：S 01、S 11分别表示参考干涉信号的直流分量和交流分量幅度，S 02、S 12分别表示测量干涉信号的直流分量和交流分量幅度，λ为激光波长，ω为电光相位调制器5上施加的正弦电压的频率，z为正弦相位调制深度。
从公式(1)和(2)可以看出，参考干涉信号和测量干涉信号被调制为高频正弦载波交流信号，采用PGC相位解调方法获得参考干涉信号的相位
Figure PCTCN2019104314-appb-000008
和测量干涉信号的相位
Figure PCTCN2019104314-appb-000009
分别为：
Figure PCTCN2019104314-appb-000010
Figure PCTCN2019104314-appb-000011
第三角锥棱镜9移动位移ΔL，在此过程中，受温度漂移和环境扰动的影响，两套干涉仪的公共参考臂和测量臂光程会发生变化，记分光镜3至第一角锥棱镜6之间的光程波动δL R，记分光镜3至第一偏振分光镜7之间的光程波动δL M，则参考干涉信号和测量干涉信号的相位分别变为：
Figure PCTCN2019104314-appb-000012
Figure PCTCN2019104314-appb-000013
此时两路干涉信号的相位变化量分别为：
Figure PCTCN2019104314-appb-000014
Figure PCTCN2019104314-appb-000015
式中：
Figure PCTCN2019104314-appb-000016
表示参考干涉信号的相位变化量，
Figure PCTCN2019104314-appb-000017
表示测量干涉信号的相位变化量。
则根据公式(7)和(8)，可得第三角锥棱镜9移动的位移ΔL为：
Figure PCTCN2019104314-appb-000018
实施例中，激光光源为单频He-Ne稳频激光器，采用的是英国Renishaw公司的XL80型激光器，输出的线偏振光波长λ＝632.990577nm，电光相位调制器的调制频率为1MHz，光电探测器的带宽为10MHz，现有PGC相位解调技术一般能达到的相位解调精度为0.1°，由此代入上述公式(9)获得位移测量精度为88pm。
至此由实施例可见，本发明方法构建了两套正弦相位调制干涉仪，在两套干涉仪的公共参考臂中放置电光相位调制器，将两套干涉仪的直流干涉信号调制为高频正弦载波交流信号，提高了干涉信号的抗干扰能力；构建的参考干涉仪的相位变化表征了测量过程中温度漂移和环境扰动引起的干涉仪参考臂和部分测量臂的光程波动，通过计算两路干涉信号的相位变化量之差来获得被测位移，消除了温度漂移和环境扰动引入的误差，实现了亚纳米级测量精度。
上述具体实施方式用来解释说明本发明，而不是对本发明进行限制，在本发明的精神和权利要求的保护范围内，对本发明做出的任何修改和改变，都落入本发明的保护范围。

Claims (5)

  1. 一种差动式正弦相位调制激光干涉纳米位移测量装置，其特征在于：包括单频激光器(1)、偏振片(2)、分光镜(3)、二分之一玻片(4)、电光相位调制器(5)、第一角锥棱镜(6)、第一偏振分光镜(7)、第二角锥棱镜(8)、第三角锥棱镜(9)、第二偏振分光镜(10)、第一光电探测器(11)和第二光电探测器(12)；单频激光器(1)输出的光束经偏振片(2)后转换为偏振方向与光束传播方向成45°的线偏振光射向分光镜(3)发生透射和反射：分光镜(3)的反射输出光束经二分之一玻片(4)后调制为s偏振光，经电光相位调制器(5)调制后射向第一角锥棱镜(6)发生折返反射，第一角锥棱镜(6)反射的光束再次经过二分之一玻片(4)后变成45°线偏振光并射向分光镜(3)发生透射；分光镜(3)的透射输出光束射向第一偏振分光镜(7)发生反射和透射分别分为s偏振和p偏振的两束正交线偏振光束，经第一偏振分光棱镜(7)反射的s偏振光束射向第二角锥棱镜(8)发生折返反射，经第一偏振分光棱镜(7)透射的p偏振光束射向第三角锥棱镜(9)发生折返反射，第二角锥棱镜(8)反射的s偏振光束和第三角锥棱镜(9)反射的p偏振光束回到第一偏振分光棱镜(7)处并汇合为一束正交线偏振光入射到分光镜(3)发生反射；经二分之一玻片(4)返回的45°线偏振光束与第一偏振分光棱镜(7)返回的正交线偏振光束在分光镜(3)处合束，其中45°线偏振光束的s偏振分量和正交线偏振光束的s偏振光产生干涉形成s偏振干涉信号，45°线偏振光束的p偏振分量和正交线偏振光束的p偏振光产生干涉形成p偏振干涉信号，s偏振干涉信号作为参考干涉信号经第二偏振分光镜(10)反射后由第一光电探测器(11)接收，p偏振干涉信号作为测量干涉信号经第二偏振分光镜(10)透射后由第二光电探测器(12)接收。
  2. 根据权利要求1所述的一种差动式正弦相位调制激光干涉纳米位移测量装置，其特征在于：所述的偏振片(2)的偏振透射方向与光束传播方向成45°。
  3. 根据权利要求1所述的一种差动式正弦相位调制激光干涉纳米位移测量装置，其特征在于：所述的二分之一玻片(4)的光轴与光束传播方向成22.5°。
  4. 根据权利要求1所述的一种差动式正弦相位调制激光干涉纳米位移测量装置，其特征在于：所述的电光相位调制器(5)放置在二分之一玻片(4)和第一角锥棱镜(6)之间，调制的是射向第一角锥棱镜(6)的二分之一玻片(4)输出的s偏振光束，且电光相位调制器(5)的电场施加方向与s偏振光的偏振方向一致。
  5. 一种差动式正弦相位调制激光干涉纳米位移测量方法，其特征在于方法步骤如下：1)单频激光器(1)输出波长为λ的光束经偏振片(2)转换为偏振方向与光束传播方向成45°的线偏振光，分别射向由分光镜(3)、二分之一玻片(4)、电光相位调制器(5)、第一角锥棱镜(6)、第一偏振分光镜(7)和第二角锥棱镜(8)组成的参考正弦相位调制干涉仪和由分光镜(3)、二分之一玻片(4)、电光相位调制器(5)、第一角锥棱镜(6)、第一偏振分光镜(7)和第三角锥棱镜(9)组成的测量正弦相位调制干涉仪，分别形成参考干涉信号和测量干涉信号，经第二偏振分光镜(10)分光后由两个光电探测器(11、12)接收；
    2)电光相位调制器(5)放置在正弦相位调制干涉仪的二分之一玻片(4)和第一角锥棱镜(6)之间，调制由二分之一玻片(4)出射、向第一角锥棱镜(6)入射的s偏振光束，对电光相位调制器(5)施加电场方向与s偏振光的偏振方向一致的高频正弦载波电压，将参考正弦相位调制干涉仪和测量正弦相位调制干涉仪的干涉信号调制为高频正弦载波交流干涉信号；
    3)第三角锥棱镜(9)移动位移ΔL时，采用PGC相位解调方法获得参考干涉信号的相位变化量
    Figure PCTCN2019104314-appb-100001
    和测量干涉信号的相位变化量
    Figure PCTCN2019104314-appb-100002
    分别为：
    Figure PCTCN2019104314-appb-100003
    Figure PCTCN2019104314-appb-100004
    式中：λ为激光波长，δL R为第三角锥棱镜(9)运动过程中温度漂移和环境扰动引起的分光镜(3)至第一角锥棱镜(6)之间的光程波动，δL M为第三角锥棱镜(9)运动过程中温度漂移和环境扰动引起的分光镜(3)至第一偏振分光镜(7)之间的光程波动；
    4)通过计算测量干涉信号的相位变化量和参考干涉信号的相位变化量之差，再采用以下公式得到被测位移ΔL为：
    Figure PCTCN2019104314-appb-100005
    至此求出第三角锥棱镜(9)的运动位移。
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