WO2020251200A1 - 마스크 및 이를 포함하는 피부 관리 기기 - Google Patents

마스크 및 이를 포함하는 피부 관리 기기 Download PDF

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Publication number
WO2020251200A1
WO2020251200A1 PCT/KR2020/007032 KR2020007032W WO2020251200A1 WO 2020251200 A1 WO2020251200 A1 WO 2020251200A1 KR 2020007032 W KR2020007032 W KR 2020007032W WO 2020251200 A1 WO2020251200 A1 WO 2020251200A1
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WO
WIPO (PCT)
Prior art keywords
mask
piezoelectric element
layer
disposed
wiring
Prior art date
Application number
PCT/KR2020/007032
Other languages
English (en)
French (fr)
Korean (ko)
Inventor
홍범선
손해록
오준재
이규린
Original Assignee
엘지이노텍 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020190070592A external-priority patent/KR102711473B1/ko
Priority claimed from KR1020190070502A external-priority patent/KR102703769B1/ko
Priority claimed from KR1020190086080A external-priority patent/KR20210010680A/ko
Priority claimed from KR1020190086099A external-priority patent/KR20210009508A/ko
Priority claimed from KR1020190090955A external-priority patent/KR20210012727A/ko
Application filed by 엘지이노텍 주식회사 filed Critical 엘지이노텍 주식회사
Priority to US17/616,264 priority Critical patent/US20220312940A1/en
Priority to CN202080043653.1A priority patent/CN113993418B/zh
Publication of WO2020251200A1 publication Critical patent/WO2020251200A1/ko

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    • A—HUMAN NECESSITIES
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    • A45D44/00—Other cosmetic or toiletry articles, e.g. for hairdressers' rooms
    • A45D44/002—Masks for cosmetic treatment of the face
    • A—HUMAN NECESSITIES
    • A45—HAND OR TRAVELLING ARTICLES
    • A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D44/00—Other cosmetic or toiletry articles, e.g. for hairdressers' rooms
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    • A61F7/00—Heating or cooling appliances for medical or therapeutic treatment of the human body
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    • A61H23/00—Percussion or vibration massage, e.g. using supersonic vibration; Suction-vibration massage; Massage with moving diaphragms
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    • A61H23/00—Percussion or vibration massage, e.g. using supersonic vibration; Suction-vibration massage; Massage with moving diaphragms
    • A61H23/02—Percussion or vibration massage, e.g. using supersonic vibration; Suction-vibration massage; Massage with moving diaphragms with electric or magnetic drive
    • A61H23/0245—Percussion or vibration massage, e.g. using supersonic vibration; Suction-vibration massage; Massage with moving diaphragms with electric or magnetic drive with ultrasonic transducers, e.g. piezoelectric
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    • A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D2200/00—Details not otherwise provided for in A45D
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    • A61F7/00—Heating or cooling appliances for medical or therapeutic treatment of the human body
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    • A61F7/00—Heating or cooling appliances for medical or therapeutic treatment of the human body
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Definitions

  • the embodiment relates to a mask and a skin care device including the same.
  • Human skin may be damaged or contaminated depending on external factors such as environmental pollution, ultraviolet rays, and stress, and wrinkles may occur due to internal factors such as aging and hormonal changes. Recently, as interest in skin increases, various devices for skin treatment, beauty, and anti-aging have been developed.
  • devices capable of applying thermal energy to the skin such as devices capable of improving skin elasticity by applying infrared energy
  • devices using sound waves or light rays have been developed to effectively inject cosmetics or drugs into the skin.
  • a device capable of forming a path through which cosmetics or drugs are injected into the skin by using sonophoresis and laser pollination are being developed.
  • devices using electric propulsion force have been developed to effectively inject cosmetics or drugs into the skin.
  • a device that can effectively inject ionic substances contained in cosmetics or drugs into the skin using iontophoresis, electroporation, and electroosmosis has been developed.
  • various devices are being developed that can care or treat a user's skin by providing light energy, microcurrent, and vibration to the skin.
  • the above-described devices may be provided in the form of a patch detachable to the skin, and are attached to a specific skin area to care or treat the skin of the attached area.
  • the above-described devices are provided in the form of a mask pack disposed to cover the entire user's face to care or treat facial skin.
  • the devices are formed to have a predetermined thickness, it may be difficult to effectively contact the user's skin.
  • the devices may be difficult to effectively contact the user's skin in a relatively curved area such as both cheeks and nose.
  • it may be difficult to effectively contact the user's skin due to the material and variable characteristics of the device.
  • the device may be operated in a state not in close contact with the user's skin, and may be separated from the user's skin due to the user's movement and vibration of the device during the operation process. For this reason, the care or treatment effect using the device may be insignificant.
  • a separate heating member may be disposed inside the device.
  • the overall thickness of the device is thickened by the heating member, and there is a problem in that the adhesion with the user's skin decreases due to the increase in thickness.
  • the device has a problem in that it is difficult to effectively transmit ultrasonic energy to the user's skin, and it is difficult to evenly transmit ultrasonic energy to the entire skin area.
  • the embodiment is to provide a mask and skin care device having variability and improved reliability.
  • the embodiment is to provide a mask and a skin care device capable of effectively contacting the user's skin.
  • the embodiment is to provide a mask and a skin care device capable of providing uniform ultrasonic energy to a user's skin.
  • the embodiment is to provide a mask and a skin care device capable of providing a thermal function to a user without including a separate heating member.
  • the embodiment is to provide a mask and skin care device capable of providing a cooling function to a user without including a separate cooling member.
  • the embodiment is to provide a mask and skin care device capable of reducing the overall thickness and weight.
  • the embodiment is to provide a mask and a skin care device capable of minimizing the loss of ultrasonic energy generated during operation.
  • the mask according to the embodiment includes a first wiring disposed on a first base layer, a piezoelectric element disposed on the first wiring, a second wiring disposed on the piezoelectric element, and a second wiring disposed on the second wiring.
  • the driving frequency of the piezoelectric element is controlled in a frequency band defined by the first range, and the temperature of the piezoelectric element is changed by controlling the driving frequency of the control unit.
  • the mask according to the embodiment may be elastically deformed according to the shape of the user's curved skin by the first base layer, the second base layer, or the like. Accordingly, the mask can effectively contact the user's skin.
  • the mask according to the embodiment includes a plurality of piezoelectric elements, and the piezoelectric elements may generate ultrasonic energy in the entire area of the mask. Accordingly, ultrasonic energy having a uniform intensity may be provided to a user wearing the mask.
  • the piezoelectric elements according to the embodiment may be disposed at different intervals according to the shape of the user's face.
  • piezoelectric elements arranged in relatively curved areas such as the user's nose and cheeks, and flat areas such as forehead are arranged at different intervals, so that the ultrasonic energy of uniform intensity is applied to the curved area of the user's face.
  • the mask according to the embodiment may operate in various modes.
  • the mask may include a cooling mode, a warming mode, and the like, and may provide a cooling effect, a heating effect, and the like to the user's skin.
  • the mask may provide the above-described effect by controlling the driving frequency of the piezoelectric element without a separate heating member and a cooling member. Accordingly, the mask according to the embodiment may be provided to be slimmer.
  • the mask according to the embodiment may include a sensing unit that senses the temperature of the mask.
  • the mask may sense the temperature by the sensing unit, and the driving frequency of the mask may be corrected based on the sensed temperature. Accordingly, the embodiment can control the temperature of the mask, and prevent the user from seeing damage such as low-temperature burns due to the temperature.
  • FIG. 1 is a front view of a mask according to an embodiment.
  • FIG. 2 is an exploded perspective view of area A1 of FIG. 1.
  • FIG. 3 is a top view of area A1 of FIG. 1.
  • FIG. 4 is another top view of area A1 of FIG. 1.
  • FIG. 5 is a cross-sectional view showing a cross-section A-A' of FIG. 4.
  • FIG. 6 is an enlarged view of area A2 of FIG. 5.
  • Fig. 7 is a block diagram showing the configuration of a mask according to the first embodiment.
  • 11 is data on temperature for each driving frequency of the piezoelectric element according to the first embodiment.
  • FIG. 13 is a graph of temperature and impedance for each driving frequency of the piezoelectric device according to the first embodiment.
  • 15 is a block diagram showing the configuration of a mask according to the second embodiment.
  • 16 is a flowchart of the operation of the mask according to the second embodiment.
  • 17 is a graph showing impedance characteristics of a plurality of piezoelectric elements according to the second embodiment.
  • FIG. 19 is a cross-sectional view of a mask according to the third embodiment showing a cross-section taken along line A-A' of FIG. 4.
  • FIG. 20 is a cross-sectional view of a mask according to the third embodiment showing another cross-section taken along line A-A' of FIG. 4.
  • FIG. 21 is a cross-sectional view of a mask according to the third embodiment showing another cross-sectional view taken along line AA′ of FIG. 4.
  • FIG. 22 is a top view of the mask according to the third embodiment, showing a top view of area A1 of FIG. 1.
  • FIG. 23 is a cross-sectional view of a mask according to the third embodiment, showing a cross section taken along line B-B' of FIG. 19.
  • FIG. 24 is a cross-sectional view showing a cross-section C-C' of FIG. 3.
  • FIG. 25 is an enlarged view of the mask according to the fourth embodiment in which the area A3 of FIG. 24 is enlarged.
  • FIG. 26 is a cross-sectional view of a mask according to the fourth embodiment showing a cross-section D-D' of FIG. 25.
  • FIG. 27 is a diagram illustrating an example in which stress is applied to the electrode of FIG. 25 in the x-axis direction.
  • FIG. 28 is a cross-sectional view of a mask according to the fourth embodiment showing a cross section E-E' of FIG. 27.
  • 29 is a diagram illustrating an example in which stress is applied to the electrode of FIG. 25 in the y-axis direction.
  • FIG. 30 is a cross-sectional view of a mask according to the fourth embodiment showing a cross-section F-F' of FIG. 29.
  • FIG. 31 is another enlarged view of the mask according to the fourth embodiment in which the area A3 of FIG. 24 is enlarged.
  • FIG. 32 is a cross-sectional view illustrating a cross section G-G' of FIG. 31.
  • 33 to 37 are diagrams for explaining a method of manufacturing a mask according to an embodiment.
  • 39 is a cross-sectional view illustrating a cross section of the mask of FIG. 38.
  • 40 to 42 are diagrams illustrating examples in which indicators and protrusions are provided to the mask according to the embodiment.
  • 43 is a diagram illustrating a user wearing a mask according to an embodiment.
  • 44 is a diagram illustrating a skin care device to which a mask is applied according to an embodiment.
  • first, second, A, B, (a), and (b) may be used in describing the constituent elements of the embodiment of the present invention. These terms are only for distinguishing the component from other components, and are not limited to the nature, order, or order of the component by the term. And, when a component is described as being'connected','coupled' or'connected' to another component, the component is not only directly connected, coupled or connected to the other component, but also the component and The case of being'connected','coupled', or'connected' due to another element between the other elements may also be included.
  • top (top) or bottom (bottom) is one as well as when the two components are in direct contact It also includes a case in which the above other component is formed or disposed between the two components.
  • upper (upper) or lower (lower) when expressed as "upper (upper) or lower (lower)", the meaning of not only an upward direction but also a downward direction based on one component may be included.
  • the first direction may refer to the x-axis direction shown in the drawings, and the second direction may be a different direction from the first direction.
  • the second direction may mean a y-axis direction shown in the drawing in a direction perpendicular to the first direction.
  • the horizontal direction may mean first and second directions
  • the vertical direction may mean a direction perpendicular to at least one of the first and second directions.
  • the horizontal direction may mean the x-axis and y-axis directions of the drawing
  • the vertical direction may be a direction perpendicular to the x-axis and y-axis directions in the z-axis direction of the drawing.
  • the mask 1000 may have a shape corresponding to a shape of a human face.
  • the mask 1000 is provided in a predetermined size to cover the user's face, and may have a predetermined elasticity in order to closely contact the user's face.
  • the mask 1000 includes one surface in contact with the user's skin and the other surface opposite to the one surface, and one surface of the mask 1000 is made of a material that is harmless to the human body, so that it may be harmless even if it is in contact with the user's skin for a long time. have.
  • the mask 1000 may include at least one of an opening 1010 and a cutout 1020.
  • the opening 1010 may be formed in a portion corresponding to the user's eyes or mouth.
  • the opening 1010 is a region penetrating one surface and the other surface of the mask 1000 facing the user's skin. When the user wears the mask 1000, the user's eyes, mouth, etc. are in the opening 1010. It may be inserted, and the area excluding the opening 1010 may be in close contact with the user's face.
  • the cutting portion 1020 may be formed in a portion corresponding to the relatively curved both ball lines, chins, etc. in order to improve adhesion between the mask 1000 and the skin, but is not limited thereto.
  • the cutting part 1020 may have a form in which one surface and the other surface of the mask 1000 are partially cut.
  • the mask 1000 is adhered to the user's skin and may provide ultrasound to the user's skin through a piezoelectric member included therein. Accordingly, a drug or cosmetics between the mask 1000 and the skin can be effectively provided to the user.
  • the first base layer 110, the first wiring 200, the piezoelectric element 400, the second wiring 300, and the second base layer are regions excluding the opening 1010.
  • 120, a protective layer 550, and a control unit 1200 may be included.
  • the mask 1000 includes a first wiring 200, a piezoelectric element 400, a second wiring 300, and a second base layer 120 sequentially disposed on the first base layer 110. It may include, and may include a protective layer 550 disposed between the first base layer 110 and the second base layer 120.
  • the first base layer 110 may include a material harmless to the human body.
  • the first base layer 110 may include a soft and elastic material.
  • the first base layer 110 is polyvinyl chloride to which silicone, thermoplastic resin, thermoplastic silicone resin, thermoplastic elastomer, polyurethane elastomer, ethylene vinyl acetate (EVA), a harmless plasticizer and a stabilizer are added ( PVC) may include at least one material.
  • the first base layer 110 is relatively light, can minimize irritation upon contact with the user's skin, and may include a silicone elastomer having a predetermined elasticity.
  • the first base layer 110 may reflect a wavelength emitted from the piezoelectric element 400 to be described later in the direction of one surface of the mask 1000. That is, the first base layer 110 may be a reflective layer.
  • the thickness t1 of the first base layer 110 may be smaller than or equal to the thickness t2 of the second base layer 120 to be described later.
  • the thickness t1 of the first base layer 110 in order to reflect the wavelength emitted from the piezoelectric element 400 toward the first base layer 110 to the first base layer 110 is It may be thinner than or equal to the thickness t2 of the second base layer 120. That is, the second base layer 120 may be a base layer facing the user's skin, and the first base layer 110 may be a base layer disposed in an area opposite to the second base layer 120. .
  • the thickness t1 of the first base layer 110 may be about 50 ⁇ m to about 10 mm. When the thickness t1 of the first base layer 110 is less than about 50 ⁇ m, the thickness t1 of the first base layer 110 is relatively thin, so that the configuration is disposed on the first base layer 110 Cannot effectively protect them. In detail, when the mask 1000 is elastically deformed and the first base layer 110 is elastically deformed, the wirings 200 and 300 and the piezoelectric element 400 on the first base layer 110 can be effectively protected. Can't.
  • the thickness t1 of the first base layer 110 exceeds about 10 mm, the thickness of the entire mask 1000 may increase, and the first base layer 110 in the piezoelectric element 400 The amount of most of the wavelengths emitted in the) direction passes through the first base layer 110 and is reflected in the direction of one surface of the mask 1000 may be small.
  • the required thickness of the second base layer 120 may increase for reflection in the direction of one surface of the mask 1000.
  • the range of wavelengths generated by the piezoelectric element 400 for reflection is high, it may not be suitable for use in the mask 1000.
  • the thickness t1 of the first base layer 110 exceeds about 10 mm, the elastic deformation characteristics of the mask 1000 may be deteriorated. Accordingly, the mask 1000 may not be elastically deformed effectively in a shape corresponding to the user's skin.
  • the thickness t1 of the first base layer 110 satisfies the above-described range in order to prevent the above problems. More preferably, the thickness t1 of the first base layer 110 may be about 100 ⁇ m to about 1000 ⁇ m. That is, it is preferable that the first base layer 110 has a thickness range of about 100 ⁇ m to about 1000 ⁇ m in consideration of reliability, reflection characteristics, variability of the manufactured mask 1000, thickness, weight, and ultrasonic impedance characteristics. Do.
  • the first base layer 110 may have grooves and pores formed therein to effectively reflect the wavelength generated by the piezoelectric element 400.
  • the grooves and pores may be disposed in a region overlapping with the piezoelectric element 400 for effective reflection, but is not limited thereto.
  • a first wiring 200 may be disposed on the first base layer 110.
  • the first wiring 200 may be disposed on one surface of the first base layer 110 facing the piezoelectric element 400.
  • the first wiring 200 may extend on the first base layer 110 in a first direction (x-axis direction).
  • the first wiring 200 may directly contact one surface of the first base layer 110.
  • the first wiring 200 may be formed on one surface of the first base layer 110 by a process such as deposition, printing, or bonding.
  • the first wiring 200 may be electrically connected to the piezoelectric element 400.
  • the first wiring 200 may include a conductive material.
  • the first wiring 200 is aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti) And it may include at least one metal of these alloys.
  • the first wiring 200 may include a non-metal such as carbon, and may include a conductive elastic body.
  • the first wiring 200 may have a single layer or a multilayer structure.
  • the first wiring 200 may have a single layer structure including one selected from the above-described materials.
  • the first wiring 200 may have a multilayer structure including a metal material selected from the above-described materials and a conductive elastic body.
  • the first wiring 200 may include a plurality of first sub-wirings 201 disposed on the first base layer 110.
  • Each of the plurality of first sub-wires 201 may extend in a first direction and may be disposed to be spaced apart from each other in a second direction different from the first direction.
  • the plurality of first sub-wires 201 may be electrically connected to each other.
  • the second direction may be a direction perpendicular to the first direction in a direction different from the first direction, but is not limited thereto.
  • the thickness of the first sub-wiring 201 may be about 2 ⁇ m to about 50 ⁇ m. In detail, the thickness of the first sub-wire 201 may be about 2 ⁇ m to about 40 ⁇ m. When the thickness of the first sub-wiring 201 is less than about 2 ⁇ m, electrical characteristics may be deteriorated, and it may be difficult to form uniformly. In addition, when the thickness of the first sub-wire 201 exceeds about 50 ⁇ m, the total thickness of the mask 1000 may increase, and the manufacturing time of the first wire 200 may increase. In addition, the first sub-wiring 201 may be too thick to reduce stretchable characteristics. Preferably, the thickness of the first sub-wire 201 may be about 5 ⁇ m to about 35 ⁇ m or less in consideration of stretchable characteristics, reliability, and process efficiency in the horizontal direction.
  • the line width of the first sub-wire 201 may be about 50 ⁇ m to about 500 ⁇ m. In detail, the line width of the first sub-wire 201 may be about 100 ⁇ m to about 450 ⁇ m. A line width of the first sub-wire 201 may be greater than a thickness of the first sub-wire 201. If the line width of the first sub-wire 201 is less than about 50 ⁇ m, reliability may be degraded, and if the line width of the first sub-wire 201 exceeds about 500 ⁇ m, the elongation rate decreases, resulting in a stretchable characteristic. It can be degraded. Preferably, the line width of the first sub-wire 201 may be about 100 ⁇ m to about 400 ⁇ m in consideration of stretchable characteristics.
  • the first wiring 200 may include a first connection part 210 and a first extension part 220.
  • one of the first sub-wires 201 may include a first connection part 210 and a first extension part 220 connected to the first connection part 210.
  • the first connection part 210 may be disposed in a region corresponding to a lower surface of the piezoelectric element 400.
  • the first connection part 210 may be disposed in a region overlapping the lower surface of the piezoelectric element 400 in a vertical direction.
  • the first connection part 210 may face a lower surface of the piezoelectric element 400.
  • the first connector 210 may be provided in a number corresponding to the piezoelectric element 400.
  • the first connection part 210 may have a shape corresponding to a lower surface of the piezoelectric element 400.
  • the first connection part 210 may have a width corresponding to a lower surface of the piezoelectric element 400.
  • the width in the horizontal direction of the first connector 210 may be less than or equal to the width in the horizontal direction of the bottom surface of the piezoelectric element 400.
  • the width of the first connection part 210 in the horizontal direction may be about 50% to about 100% of the width of the lower surface of the piezoelectric element 400 in the horizontal direction.
  • the width of the first connection part 210 in the horizontal direction is less than about 50%, electrical characteristics between the first wiring 200 and the piezoelectric element 400 may be deteriorated.
  • the width in the horizontal direction of the first connector 210 is larger than the width of the lower surface of the piezoelectric element 400, the transmittance of ultrasonic energy may be reduced. Accordingly, it is preferable that the horizontal width of the first connection part 210 satisfies the above-described range.
  • the first extension part 220 may extend in a first direction from the first connection part 210.
  • the first extension part 220 may be disposed between a plurality of first connection parts 210.
  • the first extension part 220 may be disposed between the first connection parts 210 spaced apart in a first direction. That is, the first extension part 220 may connect between adjacent first connection parts 210.
  • the first wiring 200 may have various shapes. For example, when viewed in a plan view, each of the plurality of first sub-wires 201 may extend in a first direction in a linear shape as shown in FIG. 3. In detail, the plurality of first sub-wires 201 are spaced apart from the adjacent first sub-wires 201 in the second direction at equal intervals, and may extend in the first direction in the form of a straight line. That is, the first extension part 220 of the first wiring 200 may have a shape of a straight line extending in the first direction.
  • each of the plurality of first sub-wires 201 may extend in the first direction in a curved shape as shown in FIG. 4.
  • each of the plurality of first sub-wires 201 may be provided in a form in which a wavy pattern is repeated. That is, the first extension part 220 of the first wiring 200 may have a curved shape extending in the first direction.
  • the first extension part 220 may have a curvature pattern of about 3R to about 20R (mm). Accordingly, when the mask 1000 is stretched or contracted in one direction, the first wiring 200 has a stretchable characteristic and may not be cut off. Preferably, the first extension part 220 may have a curvature pattern of about 5R to about 15R (mm). In addition, the first extension part 220 may have an elongation of about 10% to about 50%. Accordingly, since the first wiring 200 may have improved stretchable characteristics, reliability may be improved, and adhesion with the user's skin may be improved.
  • the first extension part 220 may have a shape in which a pattern in which a straight line and a curve extending in a first direction are mixed is repeated.
  • the first extension part 220 located in an area overlapping with a relatively curved area (nose, cheek, etc.) of the user's face when viewed from a plane may be provided in a curved shape, and a relatively flat area
  • the first extension part 220 located in a region overlapping with (forehead, etc.) may be provided in a straight line. Accordingly, when the mask 1000 is attached to the user's face, it is possible to prevent the first wiring 200 from being damaged due to the deformation of the mask 1000.
  • the first extension part 220 is provided in a form in which a straight line and a curved line are mixed, an electrical characteristic can be maintained and a ratio occupied by the first wiring 200 can be reduced. Accordingly, the embodiment can reduce the manufacturing cost of the first wiring 200 and minimize the loss of ultrasonic energy emitted from the piezoelectric element 400.
  • a piezoelectric element 400 may be disposed on the first base layer 110.
  • the piezoelectric element 400 may be disposed on the first wiring 200.
  • the piezoelectric element 400 may be disposed on the first connection part 210 of the first wire 200 to be electrically connected to the first wire 200.
  • the piezoelectric element 400 may include a ceramic material.
  • the piezoelectric element 400 includes ZnO, AlN, LiNbO 4 , lead antimony stannate, lead magnesium tantalate, lead nickel tantalate, and titanate ( titanates), tungstates, zirconates, or lead zirconate titanate [Pb(Zr x Ti 1-x )O 3 (PZT)], lead lanthanum zirconate titanate (PLZT), lead niobium Zirconate titanate (PNZT), BaTiO 3 , SrTiO 3 , lead magnesium niobate, lead nickel niobate, lead manganese niobate, lead zinc niobate, lead including lead titanate, barium, bismuth, or niobium of strontium It may contain at least one of niobates.
  • a plurality of piezoelectric elements 400 may be disposed on the first wiring 200.
  • the plurality of piezoelectric elements 400 may be disposed to be spaced apart from each other on the first sub-wire 201.
  • the plurality of piezoelectric elements 400 may be disposed on the first connection part 210 on the first sub-wire 201.
  • one piezoelectric element 400 may be disposed on one first connection part 210.
  • the center of the lower surface of the piezoelectric element 400 may overlap the first sub-wire 201 in a vertical direction.
  • the center of the lower surface of the piezoelectric element 400 may overlap the first connection part 210.
  • the center of the lower surface of the piezoelectric element 400 may overlap the center of the first connection part 210.
  • the plurality of piezoelectric elements 400 may be spaced apart from each other at equal intervals on the first sub-wiring 201.
  • a plurality of piezoelectric elements 400 disposed on one first sub-wire 201 may be disposed at equal intervals based on the first direction.
  • the piezoelectric elements 400 disposed on the adjacent first sub-wires 201 may be disposed at equal intervals based on the second direction. Accordingly, a virtual line connecting the centers of the adjacent piezoelectric elements 400 in the first direction and the second direction may have a mesh shape.
  • the piezoelectric element 400 disposed on one first sub-wire 201 is the piezoelectric element 400 disposed on the first sub-wire 201 closest to the one first sub-wire 201 And may or may not overlap in the second direction.
  • the piezoelectric element 400 may be arranged in a zigzag shape on the adjacent first sub-wire 201.
  • some of the piezoelectric elements 400 may be spaced at equal intervals, and the remaining piezoelectric elements 400 may not be disposed at equal intervals.
  • the spacing between the piezoelectric elements 400 may not be arranged at equal intervals. That is, the spacing between the piezoelectric elements 400 may be relatively narrow or large depending on the degree of curvature of the skin surface.
  • a gap between the piezoelectric elements 400 in a region overlapping with a curved region, such as a user's nose and both cheeks, may be relatively narrow. Accordingly, the mask 1000 according to the embodiment may effectively provide ultrasonic energy even to curved skin.
  • the piezoelectric element 400 may be disposed on the entire area of the mask 1000 to evenly generate ultrasonic energy.
  • the piezoelectric element 400 may generate ultrasonic energy of about 1 MHz or less by an applied current.
  • the piezoelectric element 400 may generate ultrasonic energy of about 10 kHz to about 1 MHz.
  • the piezoelectric element 400 may generate ultrasonic energy of about 100 KHz to about 800 KHz.
  • the ultrasonic energy generated by the piezoelectric element 400 may move in a direction of one surface of the mask 1000, and may be transferred to the user's skin and massage the user's skin.
  • the thickness of the piezoelectric element 400 may be about 1500 ⁇ m or less. In detail, the thickness of the piezoelectric element 400 may be about 1200 ⁇ m or less. Preferably, the thickness of the piezoelectric element 400 may be about 1000 ⁇ m or less. It is preferable that the thickness of the piezoelectric element 400 satisfies the above-described range in consideration of the overall thickness and variable characteristics of the mask 1000.
  • the piezoelectric element 400 may have various shapes.
  • the piezoelectric element 400 may have a polygonal column shape with a lower surface and an upper surface thereof, and the lower surface and an upper surface may have a circular column shape.
  • the piezoelectric element 400 may have one of a lower surface and an upper surface of a polygonal surface, and the other surface may have a pillar shape.
  • an area of at least one of a lower surface and an upper surface of the piezoelectric element 400 may be about 100 mm 2 or less.
  • the piezoelectric element 400 may have various pillar shapes, and the intensity of ultrasonic energy generated according to the pillar shape, the oscillation direction, and the like can be controlled.
  • the intensity of ultrasonic energy delivered to the user's skin may be adjusted according to the size, arrangement interval, and arrangement density of the piezoelectric element 400.
  • the piezoelectric element 400 may generate various waves.
  • the piezoelectric element 400 may generate at least one wave of a horizontal wave in which a direction in which the wave travels and a vibration direction of the medium are perpendicular, and a longitudinal wave in which the direction in which the wave travels and the vibration direction of the medium are the same.
  • the piezoelectric element 400 may resonate multiple times.
  • the piezoelectric element 400 may include at least one via hole, and may resonate multiple times by the formed via hole.
  • the upper area of the via hole may be about 10% to about 45% of the upper surface area of the piezoelectric element 400 for multiple resonance.
  • the number of multiple resonance frequency domains may correspond to the number of via holes. That is, the piezoelectric element 400 may emit wavelengths of various frequency ranges, for example, ultrasonic energy, as the number of via holes increases within a set number range of via holes.
  • a second base layer 120 may be disposed on the piezoelectric element 400.
  • the second base layer 120 is a portion that faces the user's skin and can contact the skin, and may include a material harmless to the human body.
  • the second base layer 120 may include a soft and elastic material.
  • the second base layer 120 is polyvinyl chloride to which silicone, thermoplastic resin, thermoplastic silicone resin, thermoplastic elastomer, polyurethane elastomer, ethylene vinyl acetate (EVA), harmless plasticizer and stabilizer are added ( PVC) may include at least one material.
  • the second base layer 120 is relatively light, can minimize irritation upon contact with the user's skin, and may include a silicone elastomer having a predetermined elasticity.
  • the first base layer 110 may be made of the same material as the second base layer 120.
  • the second base layer 120 may pass the wavelength emitted from the piezoelectric element 400 in the direction of one surface of the mask 1000 to transmit the wavelength to the user's skin. That is, the second base layer 120 may be a transmission layer and may be a matching layer.
  • the thickness t2 of the second base layer 120 may vary according to an impedance of the second base layer 120 and a driving frequency of the piezoelectric element 400.
  • the thickness t2 of the second base layer 120 may be greater than or equal to the thickness t1 of the first base layer 110.
  • the thickness t2 of the second base layer 120 may be about 50 ⁇ m to about 10 mm.
  • the thickness (t2) of the second base layer 120 is less than about 50 ⁇ m, the thickness (t2) of the second base layer 120 is relatively thin, so that the configuration is disposed on the second base layer 120 Cannot effectively protect them.
  • the wirings 200 and 300 and the piezoelectric element 400 on the second base layer 120 are It cannot be effectively protected.
  • the thickness t2 of the second base layer 120 exceeds about 10 mm, the thickness of the entire mask 1000 may increase. It is preferable that the thickness t2 of the second base layer 120 satisfies the above-described range in order to effectively pass the wavelength emitted from the piezoelectric element 400.
  • the thickness t2 of the second base layer 120 is about 100 ⁇ m to about 1000 ⁇ m in consideration of reliability, transmission characteristics, variability of the manufactured mask 1000, thickness, weight, and ultrasonic impedance characteristics. It can have a thickness range.
  • some of the ultrasonic energy emitted from the piezoelectric device 400 according to the embodiment may be emitted toward the second base layer 120 and passed through the second base layer 120 to be transmitted to the user's skin. have.
  • another part of the ultrasonic energy may be emitted toward the first base layer 110 and reflected toward the second base layer 120 by the first base layer 110. Thereafter, the reflected ultrasonic energy may pass through the second base layer 120 and be transferred to the user's skin.
  • a second wiring 300 may be disposed on the second base layer 120.
  • the second wiring 300 may be disposed on one surface of the second base layer 120 facing the piezoelectric element 400.
  • the second wiring 300 may extend on the second base layer 120 in a different direction from the first wiring 200.
  • the second wiring 300 may extend in a second direction (y-axis direction) perpendicular to the first direction.
  • the second wiring 300 may directly contact one surface of the second base layer 120.
  • the second wiring 300 may be formed on one surface of the second base layer 120 by a process such as deposition, printing, or bonding.
  • the second wiring 300 may be electrically connected to the piezoelectric element 400.
  • the second wiring 300 may include a conductive material.
  • the second wiring 300 is aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti) And it may include at least one metal of these alloys.
  • the second wiring 300 may include a non-metal such as carbon, and may include a conductive elastic body.
  • the second wiring 300 may include the same material as the first wiring 200.
  • the second wiring 300 may have a single layer or a multilayer structure.
  • the second wiring 300 may have a single layer structure including one selected from the above-described materials.
  • the second wiring 300 may have a multilayer structure including a metal selected from the above-described materials and a conductive elastic body.
  • the second wiring 300 may have the same structure as the first wiring 200.
  • the second wiring 300 may include a plurality of second sub-wirings 301 disposed on the second base layer 120.
  • Each of the plurality of second sub-wires 301 may extend in the second direction and may be disposed to be spaced apart from each other in the first direction.
  • the plurality of second sub-wires 301 may be electrically connected to each other.
  • the thickness of the second sub-wire 301 may be about 2 ⁇ m to about 50 ⁇ m. In detail, the thickness of the second sub-wire 301 may be about 2 ⁇ m to about 40 ⁇ m. When the thickness of the second sub-wire 301 is less than about 2 ⁇ m, electrical characteristics may be deteriorated, and it may be difficult to form uniformly. In addition, when the thickness of the second sub-wire 301 exceeds about 50 ⁇ m, the overall thickness of the mask 1000 may increase, and the manufacturing time of the second wire 300 may increase. In addition, the thickness of the second sub-wiring 301 is too thick, so that stretchable characteristics may be deteriorated. Preferably, the thickness of the second sub-wire 301 may be about 5 ⁇ m to about 35 ⁇ m or less in consideration of stretchable characteristics, reliability, and process efficiency in the horizontal direction.
  • the line width of the second sub-wiring 301 may be about 50 ⁇ m to about 500 ⁇ m.
  • the line width of the second sub-wire 301 may be about 100 ⁇ m to about 450 ⁇ m.
  • a line width of the second sub-wire 301 may be greater than a thickness of the second sub-wire 301.
  • the line width of the second sub-wire 301 may be about 100 ⁇ m to about 400 ⁇ m in consideration of stretchable characteristics.
  • the second wiring 300 may include a second connection part 310 and a second extension part 320.
  • one of the second sub-wires 301 may include a second connection part 310 and a second extension part 320 connected to the second connection part 310.
  • the second connection part 310 may be disposed in a region corresponding to the upper surface of the piezoelectric element 400.
  • the second connection part 310 may be disposed in a region overlapping the upper surface of the piezoelectric element 400 in a vertical direction.
  • the second connection part 310 may face an upper surface of the piezoelectric element 400.
  • the second connector 310 may be provided in a number corresponding to the piezoelectric element 400.
  • the second connection part 310 may have a shape corresponding to an upper surface of the piezoelectric element 400.
  • the second connection part 310 may have a width corresponding to the upper surface of the piezoelectric element 400.
  • the width of the second connection part 310 in the horizontal direction may be less than or equal to the width of the upper surface of the piezoelectric element 400 in the horizontal direction.
  • the width of the second connection part 310 in the horizontal direction may be about 50% to about 100% of the width of the upper surface of the piezoelectric element 400 in the horizontal direction.
  • the width of the second connection part 310 in the horizontal direction is less than about 50%, electrical characteristics between the second wiring 300 and the piezoelectric element 400 may be deteriorated.
  • the width of the second connection part 310 in the horizontal direction is greater than the width of the lower surface of the piezoelectric element 400, the transmittance of ultrasonic energy may decrease. Therefore, it is preferable that the width of the second connection part 310 in the horizontal direction satisfies the above-described range.
  • the second extension part 320 may extend in a second direction from the second connection part 310.
  • the second extension part 320 may be disposed between the plurality of second connection parts 310.
  • the second extension part 320 may be disposed between the second connection parts 310 spaced apart in a second direction. That is, the second extension part 320 may connect between the adjacent second connection parts 310.
  • the second wiring 300 may have various shapes. For example, when viewed in a plan view, each of the plurality of second sub-wires 301 may extend in the second direction in the form of a straight line as shown in FIG. 3. In detail, the plurality of second sub-wires 301 are spaced apart from the adjacent second sub-wires 301 in the first direction at equal intervals, and may extend in the second direction in the form of a straight line. That is, the second extension part 320 of the second wiring 300 may have a straight line extending in the second direction.
  • each of the plurality of second sub-wires 301 may extend in the second direction in a curved shape as shown in FIG. 4.
  • each of the plurality of second sub-wires 301 may be provided in a form in which a wavy pattern is repeated. That is, the second extension part 320 of the second wiring 300 may have a curved shape extending in the second direction.
  • the second extension part 320 may have a curvature pattern of about 3R to about 20R (mm). Accordingly, when the mask 1000 is stretched or contracted in one direction, the second wiring 300 has a stretchable characteristic and may not be cut off.
  • the second extension part 320 may have a curvature pattern of about 5R to about 15R (mm).
  • the second extension part 320 may have an elongation of about 10% to about 50%. Accordingly, since the second wiring 300 may have improved stretchable characteristics, reliability may be improved, and adhesion with the user's skin may be improved.
  • the second extension part 320 may have a repeating pattern in which a straight line and a curved line extending in the second direction are mixed.
  • the second extension part 320 located in a region overlapping with a relatively curved region (nose, cheek, etc.) of the user's face when viewed from a plane may be provided in a curved shape, and a relatively flat region
  • the second extension part 320 located in a region overlapping with (forehead, etc.) may be provided in a straight line. Accordingly, when the mask 1000 is attached to the user's face, damage to the second wiring 300 due to the deformation of the mask 1000 may be prevented.
  • the second extension part 320 is provided in a form in which straight lines and curves are mixed, it is possible to maintain electrical characteristics and reduce a ratio occupied by the second wires 300. Accordingly, according to the embodiment, the manufacturing cost of the second wiring 300 may be reduced, and loss of ultrasonic energy emitted from the piezoelectric element 400 may be minimized.
  • the first wiring 200 and the second wiring 300 may be disposed to cross each other.
  • the first sub-wire 201 and the second sub-wire 301 may be disposed to cross each other in a mesh shape, and the sub-wires 201 and 301 ), an open area in which the wirings 200 and 300 are not disposed may be formed.
  • the piezoelectric element 400 may be disposed on an area where the first wiring 200 and the second wiring 300 cross each other.
  • the center of the piezoelectric element 400 may overlap with an intersection point of the first sub-wire 201 and the second sub-wire 301.
  • the center of each of the lower and upper surfaces of the piezoelectric element 400 is the center of the first connection part 210 of the first wire 200 and the center of the second connection part 310 of the second wire 300 Can overlap with
  • a vibration member may be further disposed on the piezoelectric element.
  • a vibration member may be further disposed on the upper surface of the piezoelectric element 400.
  • the vibration member may be a vibration plate.
  • the vibration member may be disposed between the piezoelectric element 400 and the second wiring 300.
  • the vibration member may be electrically connected to the piezoelectric element 400.
  • the vibration member may include a metal material.
  • the vibration member is aluminum (Al), copper (Cu), zinc (Zn), iron (Fe), nickel (Ni), chromium (Cr), silver (Ag), gold (Pt), stainless steel ( SUS) and at least one of the alloys thereof may be included.
  • the vibration member may have a shape corresponding to the piezoelectric element 400.
  • the vibration member may have a planar shape corresponding to an upper surface of the piezoelectric element 400.
  • the vibration member may have a horizontal width corresponding to the upper surface of the piezoelectric element 400.
  • the thickness of the vibration member may be about 1500 ⁇ m or less. In detail, the thickness of the vibration member may be about 1200 ⁇ m or less. Preferably, the thickness of the vibration member may be about 1000 ⁇ m or less. The thickness of the vibration member preferably satisfies the above-described range in consideration of the variable characteristics of the mask 1000 and the vibration characteristics of the piezoelectric element 400.
  • the mask 1000 may include a protective layer 550.
  • the protective layer 550 may be disposed between the first base layer 110 and the second base layer 120.
  • the protective layer 550 may be disposed in direct contact with one surface of the first base layer 110 and one surface of the second base layer 120.
  • the protective layer 550 may be disposed between the first base layer 110 and the second base layer 120 to protect the piezoelectric element 400.
  • the protective layer 550 may be disposed between the base layers 110 and 120 to surround the piezoelectric element 400 and the wires 200 and 300 to protect the components.
  • the protective layer 550 may include a soft and elastic material.
  • the protective layer 550 is a polyvinyl chloride (PVC) containing silicone, a thermoplastic resin, a thermoplastic silicone resin, a thermoplastic elastomer, a polyurethane elastomer, an ethylene vinyl acetate (EVA), a harmless plasticizer and a stabilizer At least one of the materials may be included.
  • the protective layer 550 may be relatively light and may minimize irritation upon contact with the user's skin, and may preferably include a silicone elastomer having a predetermined elasticity.
  • the protective layer 550 may be connected to the first base layer 110 and the second base layer 120.
  • the protective layer 550 may be integrally formed with the first base layer 110 and the second base layer 120.
  • the protective layer 550 may be physically connected to the first base layer 110 and the second base layer 120 to protect components disposed therein.
  • the protective layer 550 may include the same material as the first base layer 110 and the second base layer 120. That is, the first base layer 110, the second base layer 120, and the protective layer 550 may have improved bonding strength as they include the same material.
  • the piezoelectric element 400 may be electrically connected to the first wiring 200 and the second wiring 300.
  • the piezoelectric element 400 may include a first electrode 410 disposed on a lower surface.
  • the first electrode 410 may be disposed in an area of about 80% or more of the total area of the lower surface of the piezoelectric element 400 in consideration of electrical characteristics.
  • the first electrode 410 may be disposed in an area of about 90% of the total area of the lower surface of the piezoelectric element 400.
  • the first electrode 410 may be disposed on the entire lower surface of the piezoelectric element 400.
  • the first electrode 410 may include a conductive material.
  • the first electrode 410 may include a metal material.
  • the first electrode 410 includes aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and It may include at least one metal among these alloys.
  • the first electrode 410 may be disposed facing the first wire 200 and may be electrically connected to the first wire 200.
  • a first bonding layer 451 may be disposed between the first electrode 410 and the first wiring 200.
  • the first bonding layer 451 may physically and electrically connect the first electrode 410 and the first wiring 200.
  • the overlapping ratio between the first bonding layer 451 and the first wiring 200 may be about 20% or more in consideration of physical and electrical characteristics.
  • an overlapping ratio of one surface of the first wiring 200 facing the piezoelectric element 400 and the first bonding layer 451 may be about 20% or more.
  • the first bonding layer 451 is aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and these It may include at least one metal of the alloy.
  • the thickness of the first bonding layer 451 may be about 100 ⁇ m or less. In detail, the thickness of the first bonding layer 451 may be about 20 ⁇ m to about 80 ⁇ m. Preferably, the thickness of the first bonding layer 451 may be about 30 ⁇ m to about 60 ⁇ m.
  • the first bonding layer 451 may be disposed between the first electrode 410 and the first wiring 200 to serve as a conductive adhesive.
  • the first bonding layer 451 may be applied in the form of a paste on the first wiring 200, and a piezoelectric structure including the first electrode 410 on the first bonding layer 451
  • the device 400 may be disposed. Accordingly, the piezoelectric element 400 may be physically and electrically connected to the first wiring 200.
  • the piezoelectric element 400 may include a second electrode 420 disposed on an upper surface.
  • the second electrode 420 may be disposed in an area of about 80% or more of the total area of the top surface of the piezoelectric element 400 in consideration of electrical characteristics.
  • the second electrode 420 may be disposed in an area of about 90% of the total area of the upper surface of the piezoelectric element 400.
  • the second electrode 420 may be disposed on the entire lower surface of the piezoelectric element 400.
  • the second electrode 420 may include a conductive material.
  • the second electrode 420 may include a metal material.
  • the second electrode 420 includes aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and It may include at least one metal among these alloys.
  • the second electrode 420 may be disposed facing the second wiring 300 and may be electrically connected to the second wiring 300.
  • a second bonding layer 452 may be disposed between the second electrode 420 and the second wiring 300.
  • the second bonding layer 452 may physically and electrically connect the second electrode 420 and the second wiring 300.
  • the overlapping ratio between the second bonding layer 452 and the second wiring 300 may be about 20% or more in consideration of physical and electrical characteristics.
  • an overlapping ratio between one surface of the second wiring 300 facing the piezoelectric element 400 and the second bonding layer 452 may be about 20% or more.
  • the second bonding layer 452 includes aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and these It may include at least one metal of the alloy.
  • the thickness of the second bonding layer 452 may be about 100 ⁇ m or less. In detail, the thickness of the second bonding layer 452 may be about 20 ⁇ m to about 80 ⁇ m. Preferably, the thickness of the second bonding layer 452 may be about 30 ⁇ m to about 60 ⁇ m.
  • the second bonding layer 452 may be disposed between the second electrode 420 and the second wiring 300 to serve as a conductive adhesive.
  • the second bonding layer 452 may be applied in the form of a paste on the second wiring 300, and a piezoelectric structure including the second electrode 420 on the second bonding layer 452
  • the device 400 may be disposed. Accordingly, the piezoelectric element 400 may be physically and electrically connected to the second wiring 300.
  • the thickness of the first bonding layer 451 may be the same as or different from the thickness of the second bonding layer 452. For example, since the first bonding layer 451 has the same thickness as the second bonding layer 452, the variability of the mask 1000 may be improved. As another example, the thickness of the first bonding layer 451 may be thicker than the thickness of the second bonding layer 452. Accordingly, a wavelength emitted from the piezoelectric element 400 toward the first base layer 110 may be reflected by the first bonding layer 451 and may move toward the second base layer 120.
  • the protective layer 550 includes the piezoelectric element 400, the first wiring 200, the second wiring 300, the first electrode 410, the second electrode 420, and the first bonding It may be disposed to surround the layer 451 and the second bonding layer 452, and it is possible to prevent the components from being exposed to the outside.
  • Fig. 7 is a block diagram showing the configuration of a mask according to the first embodiment.
  • the mask 1000 may include a power supply unit 1100.
  • the power supply unit 1100 may supply power to the mask 1000.
  • the power supply unit 1100 may be a separate external power supply connected to the mask 1000.
  • the power supply unit 1100 may be a battery disposed inside and outside the mask 1000.
  • the power supply unit 1100 may supply power to the piezoelectric element 400, a control unit 1200 and a sensing unit 1300 to be described later.
  • the mask 1000 may include a control unit 1200.
  • the controller 1200 may control a driving frequency of the piezoelectric element 400.
  • a piezoelectric element has a resonant frequency and drives the resonant frequency as a driving frequency for optimal ultrasonic output.
  • the mask 1000 according to the first exemplary embodiment can change the driving frequency of the piezoelectric element 400 by the control unit 1200 and operate in various frequency bands.
  • the piezoelectric element 400 may be driven at a resonance frequency or a different frequency from the resonance frequency by the control unit 1200.
  • the controller 1200 may control the driving frequency of the piezoelectric element 400 in a frequency band defined as a first range.
  • the first range is a range determined by the resonance frequency and the anti-resonance frequency of the piezoelectric element 400 and may satisfy the following [Equation 1].
  • f o is the driving frequency of the piezoelectric element according to the embodiment
  • f r is the resonance frequency of the piezoelectric element according to the embodiment.
  • k is a constant value
  • f a is the anti-resonant frequency of the piezoelectric element
  • the value of the constant k in [Equation 1] may be about 0.2 to about 0.3.
  • the value of the constant k may be about 0.22 to about 0.27.
  • a change in the driving frequency of the piezoelectric element 400 may be insignificant.
  • the value of the constant k exceeds about 0.3, a change in the driving frequency of the piezoelectric element 400 may be too large, and some ultrasonic energy may be lost.
  • a change in temperature of the piezoelectric element 400 according to a change in the driving frequency of the piezoelectric element 400 may be too large to be suitable for use on the user's skin.
  • the value of the constant k may be about 0.25 in consideration of effects such as effective transmission of ultrasonic energy to the user's skin and cooling and heating.
  • the driving frequency f 0 of the piezoelectric element may satisfy the following [Equation 2].
  • f o is the driving frequency of the piezoelectric element according to the embodiment.
  • f r is the resonance frequency of the piezoelectric element according to the embodiment
  • f a is the anti-resonant frequency of the piezoelectric element.
  • control unit 1200 may control the driving frequency of the piezoelectric element 400 within the first range according to the equations, and the mask 1000 is the driving frequency controlled by the control unit 1200 Can be operated as
  • the control unit 1200 may set a first frequency defined as a frequency band higher than the resonance frequency f r of the piezoelectric element 400 as the driving frequency within the first range. Also, the controller 1200 may set a second frequency defined as a frequency band lower than the resonance frequency within the first range as the driving frequency.
  • the controller 1200 may control the temperature of the mask 1000. For example, when the mask 1000 operates at the first frequency compared to when the mask 1000 operates at a resonance frequency, the temperature of the piezoelectric element 400 may decrease. Accordingly, the overall temperature of the mask 1000 may be reduced compared to the mask 1000 operating at the resonance frequency.
  • the temperature of the piezoelectric element 400 may increase. Accordingly, the overall temperature of the mask 1000 may increase compared to the mask 1000 operating at the resonance frequency.
  • the temperature of the mask 1000 according to the first embodiment may change according to the driving frequency of the piezoelectric element 400, and the user selects an operation mode of the mask 1000 You can set the temperature.
  • the user may select an operation mode of the mask 1000 to control the surface temperature of the mask 1000 in direct contact with the user's skin, for example, the surface temperature of the second base layer 120.
  • the user may select an operation mode of the mask 1000 as a normal mode, and in the normal mode, the mask 1000 may operate at the resonance frequency of the piezoelectric element 400. .
  • the user may select an operation mode of the mask 1000 as a cooling mode.
  • the cooling mode may mean a mode operating at a temperature lower than a temperature when the mask 1000 operates at a resonance frequency.
  • the mask 1000 may operate at a higher frequency than the first frequency, for example, the resonance frequency. Accordingly, the temperature of the piezoelectric element 400 may be driven to a lower temperature than when the piezoelectric element 400 operates at a resonant frequency, and heat generation of the entire mask 1000 may be reduced.
  • the user may select the operation mode of the mask 1000 as a heating mode.
  • the thermal mode may mean a mode operating at a temperature higher than a temperature when the mask 1000 operates at a resonance frequency.
  • the mask 1000 may operate at a lower frequency than the second frequency, for example, the resonance frequency. Accordingly, the temperature of the piezoelectric element 400 may be driven to a higher temperature than when the piezoelectric element 400 operates at a resonant frequency, and heat generation of the entire mask 1000 may be increased.
  • control unit 1200 when the mask 1000 is operated in the normal mode, the control unit 1200 is configured to have the piezoelectric element ( 400) can be controlled.
  • control unit 1200 when the mask 1000 is operated in the cooling mode operating at the above-described first frequency, the control unit 1200 is configured to a temperature defined as a second temperature lower than the first temperature when the mask 1000 is operated.
  • the driving frequency of the piezoelectric element 400 may be controlled so as to have a. In this case, as the difference between the first frequency and the resonance frequency increases, the second temperature may gradually decrease.
  • the control unit 1200 when the mask 1000 is operated in a heating mode operating at the second frequency, the control unit 1200 is a temperature defined as a third temperature higher than the first temperature when the mask 1000 is operated.
  • the driving frequency of the piezoelectric element 400 may be controlled so as to have a. In this case, as the difference between the second frequency and the resonance frequency increases, the second temperature may gradually increase.
  • the mask 1000 may include a sensing unit 1300.
  • the sensing unit 1300 may be connected to the control unit 1200 to detect the temperature of the mask 1000.
  • the sensing unit 1300 is disposed in the mask 1000 to at least one of the piezoelectric element 400, the protective layer 550, the first base layer 110, and the second base layer 120.
  • the temperature of one configuration can be detected.
  • the sensing unit 1300 may detect a surface temperature of the mask 1000 in direct contact with the user's skin, for example, the surface temperature of the second base layer 120.
  • the sensing unit 1300 may include a temperature sensor.
  • the detection unit 1300 may include at least one sensor selected from a thermocouple, resistance temperature detectors (RTD) sensor, a thermistor sensor, and a bimetal type.
  • RTD resistance temperature detectors
  • the mask 1000 When the mask 1000 is operated in the general mode and/or the cooling mode described above, it may operate at a relatively low temperature. In addition, when the mask 1000 is operated in the above-described heating mode, it may operate at a relatively high temperature.
  • the temperature of the mask 1000 may directly affect the user's skin.
  • a suitable heating temperature and cooling temperature can help the user's pores to be widened or narrowed to help absorb cosmetics or drugs, and obtain a skin soothing effect.
  • excessive heating and cooling temperatures may adversely affect the user's skin.
  • a burn such as a low-temperature burn may occur on the user's skin, and an excessive cooling temperature may block pores to prevent absorption of cosmetics or drugs.
  • the mask 1000 according to the first exemplary embodiment can prevent the above-described problem by the sensing unit 1300. That is, the sensing unit 1300 may transmit temperature information of the mask 1000 to the control unit 1200, and the control unit 1200 may operate and/or operate the piezoelectric element 400 based on the received information. Alternatively, the driving frequency of the piezoelectric element 400 may be corrected.
  • 8 to 10 are flowcharts of operation modes of a mask according to the first embodiment.
  • the mask 1000 may operate in a normal mode according to a user's selection.
  • the controller 1200 may set a frequency corresponding to the normal mode as a driving frequency of the piezoelectric element 400. Accordingly, the mask 1000 may operate at a resonant frequency.
  • the sensing unit 1300 may sense the temperature of the mask 1000. For example, when the temperature of the mask 1000, for example, the surface temperature of the second base layer 120, satisfies the set temperature, the mask 1000 sets the resonance frequency as a driving frequency or the end of the user It can operate up to this point.
  • the controller 1200 may control the driving frequency of the piezoelectric element 400.
  • the control unit 1200 may control the temperature of the mask 1000 to correspond to the normal mode by performing correction to increase or decrease the driving frequency of the piezoelectric element 400 from the current driving frequency. Thereafter, when the temperature of the mask 1000 reaches a set temperature range, the control unit 1200 may control the driving frequency of the piezoelectric element 400 back to the resonance frequency.
  • the mask 1000 may operate in a cooling mode according to a user's selection.
  • the control unit 1200 may set a frequency corresponding to the cooling mode as a driving frequency of the piezoelectric element 400. Accordingly, the mask 1000 may operate at the first frequency.
  • the sensing unit 1300 may sense the temperature of the mask 1000. For example, when the temperature of the mask 1000 satisfies the set temperature, the mask 1000 may operate with the first frequency as a driving frequency or until the end of the user.
  • the controller 1200 may control the driving frequency of the piezoelectric element 400.
  • the control unit 1200 may perform correction to lower the driving frequency of the piezoelectric element 400 than the current driving frequency.
  • the driving frequency of the piezoelectric element 400 may be lowered from the first frequency to the resonant frequency band, or from the first frequency to the second frequency region. Accordingly, it is possible to increase the temperature of the mask 1000 to prevent damage to the user's skin. Thereafter, when the temperature of the mask 1000 reaches a set temperature range, the controller 1200 may control the driving frequency of the piezoelectric element 400 back to the first frequency.
  • the mask 1000 may operate in a warming mode according to a user's selection.
  • the controller 1200 may set a frequency corresponding to the heating mode as the driving frequency of the piezoelectric element 400. Accordingly, the mask 1000 may operate at the second frequency.
  • the sensing unit 1300 may sense the temperature of the mask 1000. For example, when the temperature of the mask 1000 satisfies the set temperature, the mask 1000 may operate the second frequency to a time set as a driving frequency or until a user ends.
  • the controller 1200 may control the driving frequency of the piezoelectric element 400.
  • the control unit 1200 may perform correction to increase the driving frequency of the piezoelectric element 400 higher than the current driving frequency.
  • the driving frequency of the piezoelectric element 400 may be increased from the second frequency to the resonance frequency band, or from the second frequency to the first frequency range. Accordingly, since the temperature of the mask 1000 can be lowered, damage to the user's skin can be prevented. Thereafter, when the temperature of the mask 1000 reaches a set temperature range, the controller 1200 may control the driving frequency of the piezoelectric element 400 to the second frequency again.
  • FIG. 11 is data on the temperature of the piezoelectric device according to the driving frequency according to the first embodiment
  • FIG. 12 is data on the temperature of the mask according to the driving frequency of the mask according to the first embodiment
  • 13 is a graph of temperature and impedance for each driving frequency of the piezoelectric device according to the first embodiment
  • FIG. 14 is data on the temperature and impedance of the mask for each driving frequency of the mask according to the first embodiment.
  • the first base layer 110, the second base layer 120, and the protective layer 550 are omitted, and only electrodes are connected to the piezoelectric element 400 to provide a temperature for each frequency. And data obtained by measuring the impedance.
  • the first base layer 110 and the second base layer 120 are disposed on the upper and lower portions of the protective layer 550, and the piezoelectric element 400 and the piezoelectric element 400 are disposed in the protective layer 550.
  • This is data obtained by arranging electrodes to manufacture a mask, and measuring the temperature and impedance of the mask 1000 for each driving frequency.
  • FIG. 12 is data obtained by measuring the surface temperature of the second base layer 120 in contact with the user's skin for each driving frequency of the piezoelectric element 400.
  • the resonance frequency of the piezoelectric device 400 according to the first embodiment may be about 334 kHz.
  • the temperature of the piezoelectric element 400 may be about 28.5°C, and the temperature of the mask 1000 defined as the above-described first temperature may be about 42.7°C.
  • the anti-resonant frequency of the piezoelectric element 400 may be about 353khz, and the minimum and maximum driving frequency range of the piezoelectric element 400 is described above. It may be about 329.25khz to about 338.75khz according to [Equation 2].
  • f o is the driving frequency of the piezoelectric element according to the embodiment.
  • f r is the resonance frequency of the piezoelectric element according to the embodiment
  • f a is the anti-resonant frequency of the piezoelectric element.
  • the temperature of the piezoelectric element 400 may be about 24.7°C (338khz in FIG. 11), and ,
  • the temperature of the mask 1000, defined as the above-described second temperature, may be about 34.5°C (339khz in FIG. 12). That is, the mask 1000 may operate at a temperature lower than the user's body temperature, thereby providing a cooling effect to the user.
  • the temperature of the mask 1000 may be too low.
  • the temperature of the piezoelectric element 400 may be about 23.2°C, and the temperature of the mask 1000 is about 25.2°C. (See FIG. 12). That is, an excessively low temperature may be provided to the user's skin, which may damage the user's skin.
  • the temperature of the piezoelectric element 400 may be about 31.2° C. (330 kHz in FIG. 11), , The temperature of the mask 1000 defined as the above-described third temperature may be about 48.9°C (330.7 kHz in FIG. 12). That is, the mask 1000 may operate at a temperature higher than the user's body temperature, thereby providing a thermal effect to the user.
  • the temperature of the mask 1000 may be too high.
  • the temperature of the piezoelectric element 400 may be about 34.7°C, and the temperature of the mask 1000 is about 52°C. (See FIG. 12). That is, the heat effect on the user's skin may be excessive, which may cause a low-temperature burn on the user's skin.
  • the mask 1000 according to the first exemplary embodiment may operate in various modes to provide various temperatures to the user's skin.
  • the mask 1000 may operate in a normal mode, a cooling mode, a heating mode, or the like to provide a cooling or heating effect to the user's skin.
  • a separate heating member, a cooling member, etc. may be omitted, and a cooling or heating effect may be provided to the user's skin by using the piezoelectric element 400.
  • the mask 1000 according to the embodiment may include the detection unit 1300, and the control unit 1200 drives the mask 1000 based on temperature information detected by the detection unit 1300. Frequency and temperature can be controlled. Accordingly, the mask 1000 according to the embodiment may prevent the skin of a user who uses the mask 1000 from being damaged, and control so that cosmetics or drugs can be effectively supplied to the user's skin.
  • the mask 1000 may include a power supply unit 1100.
  • the power supply unit 1100 may supply power to the mask 1000.
  • the power supply unit 1100 may be a separate external power supply connected to the mask 1000.
  • the power supply unit 1100 may be a battery disposed inside and outside the mask 1000.
  • the power supply unit 1100 may supply power to the piezoelectric element 400 and the control unit 1200.
  • the mask 1000 according to the second embodiment may include a control unit 1200.
  • the controller 1200 may control the driving frequency of the piezoelectric element 400 within a set range.
  • the control unit 1200 may control driving frequencies of the plurality of piezoelectric elements 400 to reduce a driving deviation of each of the plurality of piezoelectric elements 400. A description of the control unit 1200 will be described in more detail with reference to FIGS. 8 and 9 to be described later.
  • the mask 1000 may include a sensing unit 1300.
  • the sensing unit 1300 may detect the output voltage of the piezoelectric element 400.
  • the sensing unit 1300 may sense the output voltage of the piezoelectric element 400 and convert the sensed analog signal into a digital signal.
  • the sensing unit 1300 may include an ADC driver (Anolog to digital converter).
  • the mask 1000 may include a storage unit 1400.
  • the storage unit 1400 may store a signal detected by the detection unit 1300.
  • the storage unit 1400 may store a signal value corresponding to the output voltage of the piezoelectric element 400.
  • the controller 1200 may control the driving frequency of the piezoelectric element 400 by using a signal stored in the storage unit 1400.
  • the mask 1000 may include a control unit 1200 that controls driving frequencies of the plurality of piezoelectric elements 400.
  • the mask 1000 has a resonant frequency (f r ), and when operating at the resonant frequency (f r ), the ultrasonic efficiency becomes maximum and the impedance becomes minimum.
  • the mask 1000 may include a plurality of piezoelectric elements 400.
  • the plurality of piezoelectric elements 400 may have the same or similar impedance characteristics within a set error range. However, while wearing the mask 1000 or operating the mask 1000, the impedance characteristics of the plurality of piezoelectric elements 400 may change.
  • the impedance characteristic is a factor that can be changed by the external environment, and can be changed by the pressure applied to the mask 1000 while the user wears the mask 1000, and the mask 1000 It can be changed by various factors such as the process of being stretchable.
  • the impedance characteristic may be changed according to a movement of a user worn during the operation of the mask 1000 and may vary according to an arrangement area of each of the plurality of piezoelectric elements 400.
  • a piezoelectric element 400 disposed in a region corresponding to a relatively curved skin region may have an impedance characteristic different from that of the piezoelectric element 400 disposed in a region corresponding to a relatively flat region. Accordingly, there is a problem in that the resonance frequency of the piezoelectric element 400 is changed, so that ultrasonic performance is deteriorated, and there is a problem that the ultrasonic efficiency provided to the user's skin is deteriorated.
  • the mask 1000 may operate at various driving frequencies.
  • the control unit 1200 may set a driving frequency band of the plurality of piezoelectric elements 400, and the mask 1000 may operate while changing a driving frequency in the set frequency band.
  • the operation method may include first supplying power to the mask 1000.
  • the step of supplying power may be a step of applying a driving voltage set to the piezoelectric element 400 by the power supply unit 1100.
  • the operating method may include sweeping the driving frequency.
  • the step of sweeping the frequency may be a step of continuously changing the driving frequencies of the plurality of piezoelectric elements 400.
  • the sweeping may be a step of changing the driving frequencies of the plurality of piezoelectric elements 400 into a predetermined range set from the resonance frequency f r .
  • the operation method may include sensing an output voltage for each frequency sensed within the range.
  • the sensing of the output voltage may be a step of sensing an output voltage for each frequency of each of the plurality of piezoelectric elements 400.
  • the sensing unit 1300 may detect the output voltage for each frequency swept in the sweeping step.
  • the sensing unit 1300 may convert a signal of the sensed output voltage.
  • the detection unit 1300 may convert an analog signal corresponding to the sensed output voltage into a digital signal.
  • the converted signal may be stored in the storage unit 1400.
  • the controller 1200 may control driving frequencies of the plurality of piezoelectric elements 400 based on output voltages for each frequency. For example, the controller 1200 may control driving frequencies of the plurality of piezoelectric elements 400 based on the data stored in the storage unit 1400. The control unit 1200 may set a driving frequency band of the plurality of piezoelectric elements 400 based on the data, and the mask 1000 may operate the set frequency band as a driving frequency.
  • the step of sweeping the driving frequency and the step of sensing the output voltage for each frequency may be repeatedly operated.
  • the step may be performed for a short time that the user does not recognize, and the steps may be repeated every set time to continuously detect a change in impedance of the mask 1000.
  • the mask 1000 may operate as a driving frequency in the first frequency band set through the above step. Thereafter, the mask 1000 may perform a step of sweeping the driving frequency after a time set in the process of operating in the first frequency band and sensing an output voltage for each frequency again. When an impedance change is not detected as a result of the step, the mask 1000 may operate until a time set as a driving frequency in the first frequency band or a user end time.
  • the above process may be repeated to set a new frequency band.
  • the step of sweeping the driving frequency and the step of detecting the detected output voltage for each frequency may be performed again, and the control unit 1200 may perform a new operation detected by the detection unit 1300.
  • the driving frequency bands of the plurality of piezoelectric elements 400 may be newly set based on data.
  • the mask 1000 may operate in a newly set driving frequency band, and the controller 1200 may control the driving frequency by continuously monitoring changes in impedance.
  • the mask 1000 may operate by repeating this process, and may operate until a set time or until the end of the user. Accordingly, the mask 1000 according to the exemplary embodiment may control a continuously changing resonance frequency and a resonance deviation of the piezoelectric element 400.
  • the mask 1000 may include a plurality of piezoelectric elements 400.
  • the plurality of piezoelectric elements 400 may include first to third piezoelectric elements.
  • the first to third piezoelectric elements may have different impedance characteristics as shown in FIG. 9 due to an external environment or the like.
  • the total impedance of the mask 1000 may have a shape as shown in FIG. 9.
  • the mask 1000 may include a first driving frequency f1 defined as a resonance frequency f r from a total impedance curve.
  • the resonance frequency f r may be a frequency corresponding to the lowest output voltage in the step of detecting the above-described output voltage.
  • the lowest output voltage may be defined as the first voltage V1.
  • the first voltage V1 may be an output voltage of a frequency having a minimum impedance magnitude in the impedance curve.
  • the first voltage V1 may be the lowest output voltage among the output voltages of the first to third piezoelectric elements.
  • the first voltage V1 may be a minimum voltage value among output voltages in the first region R1 to be described later.
  • the mask 1000 may include a second driving frequency f2 defined as a frequency different from the first driving frequency f1.
  • the second driving frequency f2 may be a frequency corresponding to the specific voltage detected in the step of sensing the output voltage described above.
  • the second driving frequency f2 may be a frequency corresponding to the second voltage V2 having a predetermined voltage difference from the first voltage V1 in the total impedance curve.
  • the predetermined voltage difference may be defined as a first voltage difference S1.
  • the second voltage V2 may mean an output voltage value greater than the first voltage V1 by the first voltage difference S1.
  • the total impedance curve may include a point defined as a first point.
  • the first point may be a point corresponding to the second voltage V2 and the second driving frequency f2. That is, the first point may be a point at which a voltage difference equal to the first voltage V1 and the first voltage difference S1 occurs.
  • the first point may be a point in the total impedance curve having a larger impedance than a point corresponding to the first driving frequency f1.
  • the second driving frequency f2, which is a frequency corresponding to the first point may be a higher frequency than the first driving frequency f1.
  • the mask 1000 may include a third driving frequency f3 defined as a different frequency from the first driving frequency f1.
  • the third driving frequency f3 may be a frequency corresponding to the specific voltage detected in the step of sensing the output voltage described above.
  • the third driving frequency f3 may be a frequency corresponding to the first voltage V1 and the third voltage V3 having the first voltage difference S1 in the total impedance curve.
  • the third voltage V3 may have the same output voltage value as the second voltage V2.
  • the total impedance curve may include a point defined as a second point.
  • the second point may be a point corresponding to the third voltage V3 and the third driving frequency f3. That is, the second point may be a point at which a voltage difference equal to the third voltage V3 and the first voltage difference S1 occurs.
  • the second point may be a point in the total impedance curve having an impedance greater than a point corresponding to the resonance frequency f r , for example, the first driving frequency f1.
  • the third driving frequency f3, which is a frequency corresponding to the second point, may be a frequency lower than the first driving frequency f1.
  • the controller 1200 may set a driving frequency band defined as the first region R1.
  • the controller 1200 may set a first region R1 defined as a driving frequency band of the plurality of piezoelectric elements 400 (first to third piezoelectric elements of FIG. 9 ).
  • the controller 1200 may set the first region R1 from the output voltage of the resonance frequency f1 and the impedances of the first and second points that are different by the first voltage difference S1.
  • the mask 1000 may operate in the frequency band of the first region R1 as a driving frequency.
  • the first voltage difference S1 may be about 2.5 decibels (db) to about 3.5 decibels (db). In detail, the first voltage difference S1 may range from about 2.8 decibels to about 3.2 decibels.
  • the range of the first region R1 set by the controller 1200 may be narrow. That is, there may be no significant difference in the driving frequency band in which the piezoelectric element 400 is variable compared to the first driving frequency f1. Accordingly, the effect of reducing the ultrasonic energy deviation of each of the plurality of piezoelectric elements 400 may be insignificant.
  • the range of the first region R1 set by the controller 1200 may be too large. That is, a driving frequency band in which the plurality of piezoelectric elements 400 can be variable may have a too large difference compared to the first driving frequency f1. Accordingly, the ultrasonic energy deviation of each of the plurality of piezoelectric elements 400 may be greater.
  • the first voltage difference S1 may be about 3 decibels in consideration of variations in operating temperatures and ultrasonic power of the plurality of piezoelectric elements 400.
  • the mask 1000 according to the second exemplary embodiment may operate while changing a driving frequency in the first region R1.
  • the plurality of piezoelectric elements 400 may operate while changing driving frequencies in the first region R1.
  • the plurality of piezoelectric elements 400 may operate while continuously changing their frequency for a predetermined time. That is, the plurality of piezoelectric elements 400 may operate with a frequency sweep in the first region R1.
  • the plurality of piezoelectric elements 400 may operate at an interval set in the first region R1.
  • the set interval may be about 0.5 kHz to about 2 kHz.
  • the set interval may be about 0.8 kHz to about 1.2 kHz. That is, the plurality of piezoelectric elements 400 may operate with variable driving frequencies at intervals of about 0.8 kHz to about 1.2 kHz in the frequency band of the first region R1.
  • the interval interval When the interval is less than about 0.5 kHz, the interval interval is too narrow, and a high cool-lock controller may be required to secure a frequency resolution. Accordingly, power consumption and manufacturing cost of the mask 1000 may increase.
  • the interval exceeds about 2 kHz, there is no significant difference from the frequency deviation of the plurality of piezoelectric elements 400, and thus the frequency variable effect may be insignificant.
  • the set interval may be about 1 kHz in consideration of power consumption and ultrasonic deviation.
  • the plurality of piezoelectric elements 400 may operate at a dwell time set in the first region R1.
  • the dwell time may mean an operation time at a specific frequency.
  • the set dwell time may be about 0.1 seconds to 3 seconds.
  • the set dwell time may be about 0.2 seconds to about 2.5 seconds.
  • the set dwell time may be from about 0.5 seconds to about 2 seconds in consideration of reducing the ultrasonic deviation of the plurality of piezoelectric elements 400 and heating characteristics.
  • the plurality of piezoelectric elements 400 may operate for about 0.2 seconds to 2.5 seconds at a specific frequency selected in the first region R1, and then the frequency may be varied by a set interval.
  • the set interval may be 1 kHz and the dwell time may be 1 second
  • the second driving frequency f2 and the third driving frequency f3 may be 333 kHz and 325 kHz, respectively.
  • the plurality of piezoelectric elements 400 may operate for 1 second at a start frequency of 325 kHz. Thereafter, the driving frequencies of the plurality of piezoelectric elements 400 may be varied by the interval and may operate at a frequency of 326 kHz for 1 second.
  • the plurality of piezoelectric elements 400 may operate in an up-sweep method in which a driving frequency changes from a low frequency to a high frequency according to a dwell time set in the frequency band of the first region R1.
  • the plurality of piezoelectric elements 400 may operate in a down-sweep method in which a driving frequency changes from high frequency to low frequency in the frequency band of the first region R1.
  • the plurality of piezoelectric elements 400 may operate by mixing up-sweep and down-sweep in the first region R1. That is, the driving frequencies of the plurality of piezoelectric elements 400 may be changed and operated in at least one of an up sweep and a down sweep in the first region R1.
  • the mask 1000 according to the second exemplary embodiment can maximize ultrasonic efficiency.
  • the mask 1000 can compensate for the change in the impedance component caused by the external environment and the change in the resonance frequency of the specific piezoelectric element 400 as it operates while changing the driving frequency in the set frequency band, thereby maximizing the ultrasonic performance. have.
  • the mask 1000 may repeat the above-described steps in the operation process and monitor a first driving frequency f1 defined as a resonance frequency f r and a resonance deviation of the plurality of piezoelectric elements 400. . Accordingly, the user may receive uniform ultrasonic energy while using the mask 1000.
  • the mask 1000 may control heat generation characteristics of the plurality of piezoelectric elements 400.
  • the control unit 1200 may set the driving frequency band in consideration of the resonance deviation of the plurality of piezoelectric elements 400, thereby preventing a specific piezoelectric element 400 having a changed impedance component from excessively heating. have. Accordingly, it is possible to prevent a user from getting a burn such as a low temperature burn due to heat generated by an abnormal operation of a specific piezoelectric element 400 during the operation of the mask 1000.
  • An ultrasonic mask was manufactured by arranging a plurality of piezoelectric elements having a cylindrical shape inside the silicone elastomer and spaced apart from each other, and arranging wires for applying power to the piezoelectric elements inside the silicone elastomer.
  • the driving frequency of the ultrasonic mask was fixed at 328 kHz, operated for 10 seconds (s), and the ultrasonic intensity of the plurality of piezoelectric elements operating for 10 seconds was measured.
  • the driving frequency of the ultrasonic mask was set in the range of 325 kHz to 333 kHz and operated for 10 minutes. At this time, the driving frequency of the mask was operated while varying at an interval of 1 kHz and a dwell time of 0.5 seconds in the set frequency band, and the ultrasonic intensity of the plurality of piezoelectric elements operating for 10 seconds was measured. .
  • a plurality of circles represented by yellow indicates a plurality of piezoelectric elements.
  • the stronger the yellow color is expressed in the data the stronger the ultrasonic intensity may be.
  • the plurality of piezoelectric elements have different colors (brightness, saturation). That is, it can be seen that the plurality of piezoelectric elements of the mask according to the comparative example have different ultrasonic intensities.
  • the mask operates at a fixed frequency, it can be seen that some piezoelectric devices whose impedance components are changed in an external environment relatively deteriorate ultrasonic performance. Accordingly, when the mask is used by the user, it may be difficult to effectively supply ultrasonic energy to the skin region corresponding to the piezoelectric element having deteriorated performance.
  • the plurality of piezoelectric elements have similar colors (brightness, saturation). That is, it can be seen that the plurality of piezoelectric elements of the mask according to the embodiment have similar ultrasonic intensity to each other.
  • the mask according to the implementation may operate while a driving frequency is swept in a set frequency band, and accordingly, the ultrasonic performance of some piezoelectric elements whose impedance components are changed in an external environment may be corrected. Accordingly, when the user uses the mask, ultrasonic energy can be uniformly supplied to the entire area of the skin to be used.
  • the mask 1000 according to the second embodiment can maximize the ultrasonic efficiency. That is, the mask 1000 can maximize the ultrasonic performance by analyzing the change in the impedance component generated by the external environment to compensate for the wrong resonance frequency, and control the heating characteristics of the plurality of piezoelectric elements 400. have.
  • the mask 1000 according to the third embodiment may include a barrier layer 600.
  • the barrier layer 600 may maintain the thickness of the mask 1000 when the mask 1000 is elastically deformed, and may protect the internal structure of the mask 1000.
  • the barrier layer 600 may be disposed on at least one of the first wiring 200 and the second wiring 300.
  • the barrier layer 600 may be disposed in a region corresponding to the piezoelectric element 400 in a vertical direction.
  • the barrier layer 600 may include at least one of a metal and a polymer material.
  • the barrier layer 600 is polypropylene (PP), polyethylene (PE), polycarbonate (PC), polyimide, polyethylene terephthalate (PET), poly It may contain at least one of polyetherether ketone (PEEK).
  • the barrier layer 600 may include a material having a lower elastic modulus than at least one selected from among the first base layer 110, the second base layer 120, and the protective layer 550.
  • the barrier layer 600 may be about 80% or less of the elastic modulus of the first base layer 110, the second base layer 120, and the protective layer 550.
  • the elastic modulus of the barrier layer 600 may be about 70% or less of the elastic modulus of the components 110, 120, and 550.
  • the thickness of the barrier layer 600 may be thinner than the thickness of each of the first and second base layers 110 and 120.
  • the thickness of the barrier layer 600 may be about 1 ⁇ m to about 100 ⁇ m.
  • the thickness of the barrier layer 600 is less than about 1 ⁇ m, deterioration of the deformation characteristics of the components 110, 120, and 550 by the barrier layer 600 may be insignificant.
  • the thickness of the barrier layer 600 exceeds about 100 ⁇ m, the total thickness of the mask 1000 may increase, and elastic deformation characteristics may be deteriorated, so that adhesion to the user's skin may decrease.
  • the barrier layer 600 may include a first barrier layer 610 disposed on the first base layer 110.
  • the first barrier layer 610 may be disposed on the other surface opposite to one surface of the first base layer 110.
  • the first barrier layer 610 may be disposed below the first base layer 110 in a vertical direction.
  • the first barrier layer 610 may be disposed in the third base layer 130.
  • the first barrier layer 610 may be disposed in the third base layer 130 disposed on the other surface of the first base layer 110.
  • the third base layer 130 may include a material harmless to the human body.
  • the third base layer 130 may include a soft and elastic material.
  • the third base layer 130 may be relatively light and may include a silicone elastomer having a predetermined elasticity and may minimize irritation upon contact with the user's skin.
  • the third base layer 130 may be disposed surrounding the first barrier layer 610. Accordingly, the third base layer 130 may prevent the first barrier layer 610 from being exposed to the outside.
  • the third base layer 130 may include the same material as the first base layer 110.
  • the third base layer 130 may be integrally formed with the first base layer 110. Accordingly, the third base layer 130 may have an improved bonding force with the first base layer 110.
  • the first barrier layer 610 may be disposed in a region corresponding to the piezoelectric element 400.
  • the first barrier layer 610 may overlap the piezoelectric element 400 in a vertical direction.
  • the center of the first barrier layer 610 may overlap the center of the lower surface of the piezoelectric element 400 in a vertical direction.
  • the first barrier layer 610 may overlap the first connection part 210 in a vertical direction.
  • the center of the first barrier layer 610 may overlap the center of the first connection part 210 in a vertical direction.
  • the width of the first barrier layer 610 may be the same as or different from the width of the piezoelectric element 400.
  • the horizontal direction width w1 of the first barrier layer 610 may be about 0.8 times to about 2 times the width of the lower surface of the piezoelectric element 400.
  • the width w1 of the first barrier layer 610 in the horizontal direction is less than about 0.8 times the width of the lower surface of the piezoelectric element 400, the reliability of the first wiring 200 may be deteriorated. .
  • the first barrier layer 610 may not deteriorate the elastic deformation characteristic of the protective layer 550 corresponding to the boundary between the first connection part 210 and the first extension part 220. For this reason, during repeated elastic deformation, a disconnection may occur between the first connection part 210 and the first extension part 220.
  • the width w1 in the horizontal direction of the first barrier layer 610 exceeds about twice the width of the lower surface of the piezoelectric element 400, the elastic deformation characteristic of the mask 1000 may be deteriorated. .
  • the width w1 of the first barrier layer 610 in the horizontal direction satisfies the above-described range in consideration of the reliability of the first wiring 200 and the reflective characteristics of the first base layer 110. .
  • the width w1 in the horizontal direction of the first barrier layer 610 may be about 1 to about 1.5 times the width of the lower surface of the piezoelectric element 400. Accordingly, the first wiring 200 may have improved reliability, and the first base layer 110 may effectively reflect ultrasonic energy.
  • the barrier layer 600 may include a second barrier layer 620 disposed on the second base layer 120.
  • the second barrier layer 620 may be disposed on the other surface opposite to the one surface of the second base layer 120.
  • the second barrier layer 620 may be disposed above the second base layer 120 in a vertical direction.
  • the second barrier layer 620 may be disposed in the fourth base layer 140.
  • the second barrier layer 620 may be disposed in the fourth base layer 140 disposed on the other surface of the second base layer 120.
  • the fourth base layer 140 may include a material harmless to the human body.
  • the fourth base layer 140 may include a soft and elastic material.
  • the fourth base layer 140 may be relatively light and may include a silicone elastomer having a predetermined elasticity and may minimize irritation upon contact with the user's skin.
  • the fourth base layer 140 may be disposed surrounding the second barrier layer 620. Accordingly, the fourth base layer 140 may prevent the second barrier layer 620 from being exposed to the outside.
  • the fourth base layer 140 may include the same material as the second base layer 120.
  • the fourth base layer 140 may be integrally formed with the second base layer 120. Accordingly, the fourth base layer 140 may have an improved bonding force with the second base layer 120.
  • the second barrier layer 620 may be disposed in a region corresponding to the piezoelectric element 400.
  • the second barrier layer 620 may overlap the piezoelectric element 400 in a vertical direction.
  • the center of the second barrier layer 620 may overlap the center of the upper surface of the piezoelectric element 400 in a vertical direction.
  • the second barrier layer 620 may overlap the second connection part 310 in a vertical direction.
  • the center of the second barrier layer 620 may overlap the center of the second connection part 310 in a vertical direction.
  • the width of the second barrier layer 620 may be the same as or different from the width of the piezoelectric element 400.
  • the width w1 in the horizontal direction of the second barrier layer 620 may be about 0.8 times to about 2 times the width of the top surface of the piezoelectric element 400.
  • the width w2 in the horizontal direction of the second barrier layer 620 is less than about 0.8 times the width of the top surface of the piezoelectric element 400, the reliability of the second wiring 300 may be degraded. .
  • the second barrier layer 620 may not deteriorate the elastic deformation characteristic of the protective layer 550 corresponding to the boundary between the second connection part 310 and the second extension part 320. For this reason, a disconnection between the second connection part 310 and the second extension part 320 may be caused during repeated elastic deformation.
  • the width w2 in the horizontal direction of the second barrier layer 620 exceeds about twice the width of the lower surface of the piezoelectric element 400, the elastic deformation characteristic of the mask 1000 may be deteriorated. .
  • the width w2 of the second barrier layer 620 in the horizontal direction satisfies the above-described range in consideration of the reliability of the second wiring 300 and the transmission characteristics of the second base layer 120. .
  • the width w2 in the horizontal direction of the second barrier layer 620 may be about 1 to 1.5 times the width of the lower surface of the piezoelectric element 400. Also, the width w2 in the horizontal direction of the second barrier layer 620 may be the same as the width w1 in the horizontal direction of the first barrier layer 610. Accordingly, the second wiring 300 may have improved reliability, and the second base layer 120 may effectively transmit ultrasonic energy.
  • the second barrier layer 620 may include the same material as the first barrier layer 610.
  • the second barrier layer 620 may include a material different from the first barrier layer 610.
  • the first barrier layer 610 may include a material capable of reflecting ultrasonic energy emitted from the piezoelectric element 400.
  • the second barrier layer 620 may include a material capable of transmitting ultrasonic energy emitted from the piezoelectric element 400. Accordingly, the thickness of the first base layer 110 and the second base layer 120 may be reduced, and a slimmer mask may be provided.
  • the mask 1000 according to the third exemplary embodiment may be elastically deformed by the user's wearing or the like.
  • the first base layer 110, the second base layer 120, and the protective layer 550 may be elastically deformed.
  • the thicknesses t1 and t2 of the first base layer 110 and the second base layer 120 may be changed.
  • a predetermined stress may be applied to the mask 1000 in order for the user to adhere the mask 1000 to the skin, and the thickness of the first base layer 110 and the second base layer 120 (t1, t2) can be thinner compared to before the stress is applied.
  • the ultrasonic energy reflection characteristic of the first base layer 110 and the ultrasonic energy transmission characteristic of the second base layer 120 may be changed.
  • the mask 1000 according to the third exemplary embodiment may reduce elastic deformation characteristics of some regions of the first base layer 110, the second base layer 120, and the protective layer 550.
  • the embodiment may include a first barrier layer 610 and a second barrier layer 620 disposed in a region corresponding to the piezoelectric element 400 in a vertical direction. Accordingly, elastic deformation characteristics of the first base layer 110, the second base layer 120, and the protective layer 550 on which the barrier layers 610 and 620 are disposed may be deteriorated. In detail, it is possible to minimize changes in the thicknesses t1 and t2 of each of the first and second base layers 110 and 120 in the region in which the barrier layers 610 and 620 are disposed.
  • the mask 1000 according to the third exemplary embodiment may be elastically deformed effectively according to the shape of a person's skin, thereby making it close to the skin.
  • ultrasonic energy can be effectively reflected and transmitted to provide the user with the same.
  • the first wiring 200 and the second wiring 300 may have improved reliability.
  • the first and second barrier layers 610 and 620 may have a structure in which a hole is formed.
  • the first and second barrier layers 610 and 620 may have a ring shape in which a hole is formed in a central region.
  • the planar area of the first barrier layer 610 may be about 10% or more of the bottom surface area of the piezoelectric element 400.
  • a plan area of the second barrier layer 620 may be about 10% or more of a top area of the piezoelectric element 400.
  • 20 and 21 are cross-sectional views of a mask according to the third embodiment showing another cross-sectional view taken along line A-A' of FIG. 4.
  • the barrier layer 600 may include a third barrier layer 630 and a fourth barrier layer 640.
  • the third barrier layer 630 may be disposed on the first wiring 200.
  • the third barrier layer 630 may be spaced apart from the first wiring 200.
  • the third barrier layer 630 may be spaced apart from the first interconnection 200 in a vertical direction and may be disposed below the first interconnection 200. That is, the third barrier layer 630 may be closer to the other surface of the mask 1000 than the first wiring 200.
  • the third barrier layer 630 may be disposed in the first base layer 110.
  • the third barrier layer 630 may be inserted and disposed in the first base layer 110.
  • the first base layer 110 may be disposed surrounding the third barrier layer 630.
  • the third barrier layer 630 may be disposed in a region corresponding to the piezoelectric element 400.
  • the third barrier layer 630 may overlap the piezoelectric element 400 in a vertical direction.
  • the center of the third barrier layer 630 may overlap the center of the lower surface of the piezoelectric element 400 in a vertical direction.
  • the third barrier layer 630 may vertically overlap the first connection part 210.
  • the center of the third barrier layer 630 may overlap the center of the first connection part 210 in a vertical direction.
  • the width of the third barrier layer 630 may be the same as or different from the width of the piezoelectric element 400.
  • the width of the third barrier layer 630 in the horizontal direction may be about 0.8 times to about 2 times the width of the lower surface of the piezoelectric element 400.
  • the width of the third barrier layer 630 in the horizontal direction is less than about 0.8 times the width of the lower surface of the piezoelectric element 400, the reliability of the first wiring 200 may be deteriorated.
  • the third barrier layer 630 may not deteriorate the elastic deformation characteristics of the protective layer 550 corresponding to the boundary between the first connection part 210 and the first extension part 220. For this reason, during repeated elastic deformation, a disconnection may occur between the first connection part 210 and the first extension part 220.
  • the width of the third barrier layer 630 in the horizontal direction exceeds about twice the width of the lower surface of the piezoelectric element 400, the elastic deformation characteristics of the mask 1000 may be deteriorated.
  • the width of the third barrier layer 630 in the horizontal direction satisfies the above-described range in consideration of the reliability of the first wiring 200 and reflection characteristics of the first base layer 110.
  • the width in the horizontal direction of the third barrier layer 630 may be about 1 to about 1.5 times the width of the lower surface of the piezoelectric element 400. Accordingly, the first wiring 200 may have improved reliability, and the first base layer 110 may effectively reflect ultrasonic energy.
  • the fourth barrier layer 640 may be disposed on the second wiring 300.
  • the fourth barrier layer 640 may be spaced apart from the second wiring 300.
  • the fourth barrier layer 640 may be spaced apart from the second wiring 300 in a vertical direction and disposed below the second wiring 300. That is, the fourth barrier layer 640 may be closer to one surface of the mask 1000 than the second wiring 300.
  • the fourth barrier layer 640 may be disposed in the second base layer 120.
  • the fourth barrier layer 640 may be inserted and disposed in the second base layer 120.
  • the second base layer 120 may be disposed surrounding the fourth barrier layer 640.
  • the fourth barrier layer 640 may be disposed in a region corresponding to the piezoelectric element 400.
  • the fourth barrier layer 640 may overlap the piezoelectric element 400 in a vertical direction.
  • the center of the fourth barrier layer 640 may overlap the center of the upper surface of the piezoelectric element 400 in a vertical direction.
  • the fourth barrier layer 640 may overlap the second connection part 310 in a vertical direction.
  • the center of the fourth barrier layer 640 may overlap the center of the second connection part 310 in a vertical direction.
  • the width of the fourth barrier layer 640 may be the same as or different from the width of the piezoelectric element 400.
  • the width of the fourth barrier layer 640 in the horizontal direction may be about 0.8 times to about 2 times the width of the top surface of the piezoelectric element 400.
  • the width of the fourth barrier layer 640 in the horizontal direction is less than about 0.8 times the width of the upper surface of the piezoelectric element 400, the reliability of the second wiring 300 may be deteriorated.
  • the fourth barrier layer 640 may not deteriorate the elastic deformation characteristics of the protective layer 550 corresponding to the boundary between the second connection part 310 and the second extension part 320. For this reason, a disconnection between the second connection part 310 and the second extension part 320 may be caused during repeated elastic deformation.
  • the width of the fourth barrier layer 640 in the horizontal direction exceeds about twice the width of the upper surface of the piezoelectric element 400, the elastic deformation characteristic of the mask 1000 may be deteriorated.
  • the width of the fourth barrier layer 640 in the horizontal direction satisfies the above-described range in consideration of the reliability of the second wiring 300 and the reflection characteristics of the second base layer 120.
  • the width of the fourth barrier layer 640 in the horizontal direction may be about 1 to about 1.5 times the width of the upper surface of the piezoelectric element 400. Accordingly, the second wiring 300 may have improved reliability, and the second base layer 120 may effectively transmit ultrasonic energy.
  • the fourth barrier layer 640 may include the same material as the third barrier layer 630. Alternatively, the fourth barrier layer 640 may include a material different from that of the third barrier layer 630.
  • the third barrier layer 630 may include a material capable of reflecting ultrasonic energy emitted from the piezoelectric element 400.
  • the fourth barrier layer 640 may include a material capable of transmitting ultrasonic energy emitted from the piezoelectric element 400. Accordingly, the thickness of the first base layer 110 and the second base layer 120 may be reduced, and a slimmer mask may be provided.
  • the barrier layer 600 may include a plurality of barrier layers.
  • the barrier layer 600 includes a first barrier layer 610 disposed on the first base layer 110, a second barrier layer 620 disposed on the second base layer 120, and A third barrier layer 630 disposed in the first base layer 110 and a fourth barrier layer 640 disposed in the second base layer 120 may be included.
  • the first barrier layer 610 and the third barrier layer 630 may overlap the piezoelectric element 400 in a vertical direction.
  • the centers of each of the first barrier layer 610 and the third barrier layer 630 may overlap in a vertical direction with the center of the lower surface of the piezoelectric element 400.
  • the first barrier layer 610 and the third barrier layer 630 may be spaced apart in a vertical direction.
  • the first barrier layer 610 and the third barrier layer 630 may be spaced apart by a distance defined by a first interval d1.
  • the first interval d1 may be about 5 ⁇ m to about 1000 ⁇ m.
  • the first interval d1 may be about 10 ⁇ m to about 1000 ⁇ m.
  • the elastic deformation characteristics of the first base layer 110 and the protective layer 550 corresponding to the barrier layers 610 and 630 may be rapidly deteriorated. have. Accordingly, since the elastic deformation characteristics of the mask 1000 may be deteriorated, it may be difficult to effectively contact the user's skin.
  • the first gap d1 exceeds about 1000 ⁇ m, the thickness of the first base layer 110 may increase, so that the total thickness of the mask 1000 may increase.
  • the first barrier layer 610 and the third barrier layer 630 may include the same material.
  • the first barrier layer 610 and the third barrier layer 630 may include at least one of a metal and a polymer material.
  • the first barrier layer 610 and the third barrier layer 630 may include a material capable of reflecting ultrasonic energy emitted from the piezoelectric element 400.
  • the second barrier layer 620 and the fourth barrier layer 640 may overlap the piezoelectric element 400 in a vertical direction.
  • the centers of each of the second barrier layer 620 and the fourth barrier layer 640 may overlap the center of the upper surface of the piezoelectric element 400 in a vertical direction.
  • the second barrier layer 620 and the fourth barrier layer 640 may be spaced apart in a vertical direction.
  • the second barrier layer 620 and the fourth barrier layer 640 may be spaced apart by a distance defined by a second interval d2.
  • the second interval d2 may be about 5 ⁇ m to about 1000 ⁇ m.
  • the second interval d2 may be about 5 ⁇ m to about 1000 ⁇ m.
  • the elastic deformation characteristics of the second base layer 120 and the protective layer 550 corresponding to the barrier layers 620 and 640 may be rapidly deteriorated. . Accordingly, since the elastic deformation characteristics of the mask 1000 may be deteriorated, it may be difficult to effectively contact the user's skin.
  • the second gap d2 exceeds about 1000 ⁇ m, the thickness of the second base layer 120 may increase, so that the total thickness of the mask 1000 may increase.
  • the second barrier layer 620 and the fourth barrier layer 640 may include the same material.
  • the second barrier layer 620 and the fourth barrier layer 640 may include at least one of a metal and a polymer material.
  • the second barrier layer 620 and the fourth barrier layer 640 may include a material capable of transmitting ultrasonic energy emitted from the piezoelectric element 400.
  • first and third barrier layers 610 and 630 may include the same material as the second and third barrier layers 620 and 640.
  • the first and third barrier layers 610 and 630 may include a material different from the second and third barrier layers 620 and 640.
  • the first and third barrier layers 610 and 630 may include a material capable of reflecting ultrasonic energy, and the second and fourth barrier layers 620 and 640 may transmit ultrasonic energy. It may contain a material that can be. Accordingly, the thickness of the first base layer 110 and the second base layer 120 may be reduced, and a slimmer mask may be provided.
  • the mask 1000 according to the embodiment includes a plurality of barrier layers 610, 620, 630, and 640, it may have improved reliability, and the ultrasonic energy provided in the direction of one surface of the mask 1000 Efficiency can be maximized.
  • the barrier layer 600 may be disposed on at least one of the first wiring 200 and the second wiring 300.
  • the barrier layer 600 may be disposed in a region corresponding to the piezoelectric element 400 and the wirings 200 and 300.
  • the barrier layer 600 may include a third barrier layer 630 disposed on the first wiring 200 as shown in FIG. 7.
  • the third barrier layer 630 may be disposed in a region corresponding to the piezoelectric element 400.
  • a part of the third barrier layer 630 may overlap the piezoelectric element 400 in a vertical direction.
  • the third barrier layer 630 may be disposed in a region spaced apart from the bottom surface of the piezoelectric element 400 without overlapping in a vertical direction.
  • the third barrier layer 630 may be disposed in a region corresponding to the first wiring 200.
  • a part of the third barrier layer 630 may overlap the first connection part 210, and another part may overlap the first extension part 220.
  • the third barrier layer 630 may be disposed in a region overlapping the boundary of the first connection part 210 and the first extension part 220 in a vertical direction.
  • the third barrier layer 630 may be disposed in a region corresponding to a bending region of the first extension part 220.
  • the third barrier layer 630 is formed in a vertical direction to a bending area in which the extension direction is changed. It can be placed in an overlapping area.
  • the barrier layer 600 may include a fourth barrier layer 640 disposed on the second wiring 300 as shown in FIG. 7.
  • the fourth barrier layer 640 may be disposed in a region corresponding to the piezoelectric element 400.
  • a part of the fourth barrier layer 640 may overlap the piezoelectric element 400 in a vertical direction.
  • the fourth barrier layer 640 may be disposed in a region spaced apart from the bottom surface of the piezoelectric element 400 without overlapping in a vertical direction.
  • the fourth barrier layer 640 may be disposed in a region corresponding to the second wiring 300.
  • a part of the fourth barrier layer 640 may overlap the second connection part 310, and another part of the fourth barrier layer 640 may overlap the second extension part 320.
  • the fourth barrier layer 640 may be disposed in a region perpendicular to the boundary of the second connection part 310 and the second extension part 320.
  • the fourth barrier layer 640 may be disposed in a region corresponding to a bending region of the second extension part 320.
  • the fourth barrier layer 640 is formed in a vertical direction to a bending area in which the extension direction is changed. It can be placed in an overlapping area.
  • Each of the third and fourth barrier layers 630 and 640 may have a width smaller than that of the piezoelectric element 400 in the horizontal direction.
  • each of the third and fourth barrier layers 630 and 640 may be about 80% or less of the width of the piezoelectric element 400 in the horizontal direction.
  • the wirings 200 and 300 of the mask 1000 may have improved reliability.
  • the wirings 200 and 300 may also be deformed.
  • the boundary between the connection portions 210 and 310 and the extension portions 220 and 320 having relatively low reliability among the wirings 200 and 300, and the third and fourth barrier layers on the bending area of the extension portions 220 and 320 (630, 640) may be placed.
  • the barrier layers 630 and 640 may reduce elastic deformability of a region in which the barrier layers 630 and 640 are disposed, thereby minimizing stress applied to the wirings 200 and 300.
  • each of the first and second barrier layers 610 and 620 is similar to the third and fourth barrier layers 630 and 640, and the first and second wirings 110 and 120 It may be disposed on the border area and the banding area of, but is not limited thereto.
  • At least one of the first wiring 200 and the second wiring 300 according to the embodiment may have a multilayer structure.
  • the first wiring 200 and the second wiring 300 may be provided in a multilayer structure.
  • the first sub-wiring 201 and the second sub-wiring 301 may be provided in the same multilayer structure. That is, since the first wiring 200 and the second wiring 300 may have the same structure, the description using FIGS. 6 to 11 will be described centering on the first wiring 200 for convenience of description.
  • the first wiring 200 may include a first metal layer 710, a second metal layer 720, and a conductive elastic layer 740.
  • the first metal layer 710 may be disposed on the first base layer 110.
  • the first metal layer 710 may be disposed on one surface of the first base layer 110.
  • the first metal layer 710 may extend in the first direction.
  • the second metal layer 720 may be disposed on an upper surface of the first metal layer 710.
  • the second metal layer 720 may be spaced apart from the first base layer 110.
  • the second metal layer 720 may extend in a first direction.
  • the second metal layer 720 may be spaced apart from the first metal layer 710 in a vertical direction (z-axis direction).
  • the second metal layer 720 may be disposed closer to the piezoelectric element 400 than the first metal layer 710.
  • the second metal layer 720 may have a horizontal width corresponding to the first metal layer 710.
  • the width of the second metal layer 720 in the horizontal direction (x-axis and y-axis) may be the same as the width of the first metal layer 710 in the horizontal direction (x-axis and y-axis).
  • the first metal layer 710 and the second metal layer 720 are aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo) , Titanium (Ti), and at least one of alloys thereof may be included.
  • the first metal layer 710 and the second metal layer 720 may include the same material and may include different materials among the above-described materials.
  • a conductive elastic layer 740 may be disposed between the first metal layer 710 and the second metal layer 720.
  • the conductive elastic layer 740 is spaced apart from the first base layer 110 and may extend in a first direction.
  • the conductive elastic layer 740 may directly contact the first metal layer 710 and the second metal layer 720.
  • the conductive elastic layer 740 may be physically and electrically connected to the first metal layer 710 and the second metal layer 720.
  • the conductive elastic layer 740 may have a width in a horizontal direction corresponding to the first metal layer 710 and the second metal layer 720.
  • the width of the conductive elastic layer 740 in the horizontal direction (x-axis and y-axis) may be the same as the width of each of the first and second metal layers 200 and 300 in the horizontal direction (x-axis and y-axis). have.
  • the conductive elastic layer 740 may include a conductive elastic material.
  • the conductive elastic layer 740 may include an elastic material such as silicone or resin, and may further include a conductive material such as metal particles and carbon to have conductivity.
  • the material of the conductive elastic layer 740 is not limited thereto, and the conductive elastic layer 740 may include various materials having elasticity and conductivity.
  • the first metal layer 710 may include a plurality of first protrusions 711.
  • the first metal layer 710 may include a plurality of first protrusions 711 disposed on one surface facing the second metal layer 720.
  • the first protrusion 711 may have a shape protruding toward the second metal layer 720.
  • the plurality of first protrusions 711 may extend in a horizontal direction.
  • each of the plurality of first protrusions 711 may have a width in the y-axis direction defined as a first width d1 and may extend in the x-axis direction.
  • the plurality of first protrusions 711 may be spaced apart from each other.
  • the first protrusions 711 adjacent to each other may be spaced apart in the y-axis direction. In this case, the plurality of adjacent first protrusions 711 may be spaced apart at equal intervals.
  • the first metal layer 710 may include a plurality of first concave portions 713 disposed on one surface.
  • the first metal layer 710 may include a first concave portion 713 between the plurality of first protrusions 711.
  • the first concave portion 713 may extend in a horizontal direction.
  • each of the plurality of first concave portions 713 may have a width in the y-axis direction defined as a second width d2 and may extend in the x-axis direction.
  • the plurality of first concave portions 713 may be spaced apart from each other.
  • the first concave portions 713 adjacent to each other may be spaced apart in the y-axis direction. In this case, the plurality of adjacent first concave portions 713 may be spaced apart at equal intervals.
  • the widths of the first protruding portion 711 and the first concave portion 713 may be the same or different.
  • the first width d1 of the first protrusion 711 may be less than or equal to the second width d2 of the first concave portion 713.
  • the first width d1 may be 100% or less of the second width d2.
  • the first width d1 may be about 80% or less of the second width d2.
  • the second metal layer 720 may include a plurality of second protrusions 721.
  • the second metal layer 720 may include a plurality of second protrusions 721 disposed on one surface facing the first metal layer 710.
  • the second protrusion 721 may have a shape protruding toward the first metal layer 710.
  • the plurality of second protrusions 721 may extend in a horizontal direction.
  • each of the plurality of second protrusions 721 may have a width in the y-axis direction defined as a third width d3 and may extend in the x-axis direction.
  • the plurality of second protrusions 721 may be spaced apart from each other.
  • the second protrusions 721 adjacent to each other may be spaced apart in the y-axis direction. In this case, the plurality of adjacent second protrusions 721 may be spaced apart at equal intervals.
  • the second protrusion 721 may be disposed in a region corresponding to the first concave portion 713 of the first metal layer 710.
  • the second protrusion 721 may overlap with the first concave part 713 based on a vertical direction (z-axis direction) and may be disposed in an area not overlapping with the first protrusion 711.
  • the second metal layer 720 may include a plurality of second concave portions 723 disposed on one surface.
  • the second metal layer 720 may include a second concave portion 723 between the plurality of second protrusions 721.
  • the second concave portion 723 may extend in a horizontal direction.
  • each of the plurality of second concave portions 723 may have a width in the y-axis direction defined as a fourth width d4 and may extend in the x-axis direction.
  • the plurality of second concave portions 723 may be spaced apart from each other.
  • the second concave portions 723 adjacent to each other may be spaced apart in the y-axis direction. In this case, the plurality of adjacent second concave portions 723 may be spaced apart at equal intervals.
  • the second concave portion 723 may be disposed in a region corresponding to the first protrusion 711 of the first metal layer 710.
  • the second concave portion 723 may be disposed in a region that overlaps the first protrusion 711 and does not overlap with the first concave portion 713 based on a vertical direction (z-axis direction). .
  • the widths of the second protrusion 721 and the second concave part 723 may be the same or different.
  • the third width d3 of the second protrusion 721 may be less than or equal to the fourth width d4 of the second concave portion 723.
  • the third width d3 may be 100% or less of the fourth width d4.
  • the first width d1 may be about 80% or less of the second width d2.
  • first protrusion 711 may have a width smaller than or equal to the second concave portion 723 facing, and the second protrusion 721 may be smaller than the first concave portion 713 facing each other. Or have the same width.
  • first width d1 may be less than about 100% of the fourth width d4, and the third width d3 may be less than about 100% of the second width d2.
  • first width d1 may be about 80% or less of the fourth width d4, and the third width d3 may be about 80% or less of the second width d2.
  • the upper surface of the first protrusion 711 may be spaced apart from the lower surface of the second concave portion 723 by a height defined by a first height h1.
  • the lower surface of the first concave portion 713 may be spaced apart from the upper surface of the second protrusion 721 by a height defined by a second height h2.
  • the first height h1 and the second height h2 may correspond to each other.
  • the first height h1 may be about 1.2 to about 5 times the height of the first protrusion 711 and/or the depth of the second concave portion 723.
  • the first height h1 may be about 1.5 to about 3 times the height of the first protrusion 711 and/or the depth of the second concave portion 723.
  • the second height h2 may be about 1.2 to about 5 times the depth of the first concave portion 713 and/or the height of the second protrusion 721. In detail, the second height h2 may be about 1.5 to about 3 times the depth of the first concave portion 713 and/or the height of the second protrusion 721.
  • the first wiring 200 when the first wiring 200 is elastically deformed, it is possible to prevent the first wiring 200 from being damaged by the deformation.
  • the first concave portion 713 and the second concave portion 723 move in the horizontal and/or vertical direction, the second protrusion 721 and the first protrusion 211 And a space capable of accommodating the first protrusions 221 and 211 may be provided. Accordingly, when the mask 1000 according to the embodiment is elastically deformed, it is possible to prevent the first and second metal layers 210 and 220 from being damaged by contacting each other.
  • each of the first metal layer 710 and the second metal layer 720 may have an uneven structure including protrusions 211 and 221 and recesses 213 and 223, and the first The wiring 200 can be effectively deformed by deformation of the conductive elastic layer 740 disposed between the two metal layers 210 and 220.
  • the conductive elastic layer 740 may have an increased contact area with the two metal layers 210 and 220 due to the uneven structure of the two metal layers 210 and 220 and the two metal layers 210 and 220 ) And can have improved bonding.
  • At least one barrier member 751 and 752 may be disposed on the first wiring 200.
  • the barrier members 751 and 752 may include a first barrier member 751 disposed on the first metal layer 710 and a second barrier member 752 disposed on the second metal layer 720. It may include.
  • the first barrier member 751 may be disposed adjacent to the first metal layer 710. It may be disposed on the outer surface of the first metal layer 710.
  • the first barrier member 751 may be disposed on an outer surface extending in a first direction among a plurality of outer surfaces of the first metal layer 710.
  • the first barrier member 751 may extend in a first direction (x-axis direction).
  • the first barrier member 751 may correspond to a length of the first metal layer 710 in the horizontal direction (x-axis direction).
  • the first barrier member 751 may directly contact the outer surface of the first metal layer 710 as shown in the drawing.
  • the first barrier member 751 may be spaced apart from the outer surface of the first metal layer 710 at a predetermined interval.
  • the protective layer 550 may be disposed between the first barrier member 751 and the first metal layer 710.
  • the second barrier member 752 may be disposed adjacent to the second metal layer 720. It may be disposed on the outer surface of the second metal layer 720.
  • the second barrier member 752 may be disposed on an outer surface extending in a second direction among a plurality of outer surfaces of the second metal layer 720.
  • the second barrier member 752 may extend in a first direction (x-axis direction).
  • the second barrier member 752 may correspond to a length of the second metal layer 720 in the horizontal direction (x-axis direction).
  • the second barrier member 752 may directly contact the outer surface of the second metal layer 720 as shown in the drawing.
  • the second barrier member 752 may be spaced apart from the outer surface of the second metal layer 720 at a predetermined interval.
  • the protective layer 550 may be disposed between the second barrier member 752 and the second metal layer 720.
  • the first barrier member 751 and the second barrier member 752 may include a material having a lower elastic modulus than that of the conductive elastic layer 740.
  • the first barrier member 751 and the second barrier member 752 are at least one selected from the first base layer 110, the second base layer 120, and the protective layer 550 It may include a material having a lower elastic modulus than the composition.
  • the first barrier member 751 and the second barrier member 752 may include metal or polymer materials.
  • the barrier members 751 and 752 are polypropylene (PP), polyethylene (PE), polycarbonate (PC), polyimide, polyethylene terephthalate (PET), and polypropylene. It may contain at least one of polyetherether ketone (PEEK).
  • the first and second barrier members 751 and 752 may be about 80% or less of the elastic modulus of the first base layer 110, the second base layer 120, and the protective layer 550.
  • the elastic modulus of the first and second barrier members 751 and 752 may be about 70% or less of the elastic modulus of the components 110, 120 and 550.
  • the above-described protective layer 550 may be disposed around the first metal layer 710, the second metal layer 720, the conductive elastic layer 740, and the barrier members 751 and 752.
  • the protective layer 550 is disposed to surround the components and may directly contact the components. At this time, when the barrier members 751 and 752 are spaced apart from the metal layers 210 and 220, the protective layer 550 is disposed between the barrier members 751 and 752 and the metal layers 210 and 220. I can.
  • the protective layer 550 may be disposed surrounding the components to prevent the components from being exposed to the outside.
  • first barrier member 751 and the second barrier member 752 may prevent the first metal layer 710 and the second metal layer 720 from being damaged.
  • first base layer 110, the second base layer 120, and the protective layer 550 are elastic. It can be deformed, and the first wiring 200 can also be deformed together.
  • the first barrier member 751 is deformed from the first base layer 110 and the protective layer 550 adjacent to the first metal layer 710, and the second barrier member 752 is 2 It is possible to minimize deformation of the second base layer 120 and the protective layer 550 adjacent to the metal layer 720.
  • the conductive elastic layer 740 of the first wiring 200 may be elastically deformed by external stress, and the first metal layer 710 and the second metal layer The deformation 720 may be minimized by the first barrier member 751 and the second barrier member 752. Accordingly, the first wiring 200 can effectively maintain conductivity against external stress, elastically deform, and have improved reliability.
  • the mask 1000 according to the fourth embodiment may be elastically deformed by stress applied from the outside.
  • the mask 1000 may be elastically deformed in the x-axis and/or -x-axis directions.
  • the conductive elastic layer 740 may elastically deform in the x-axis direction.
  • the conductive elastic layer 740 when viewed from the side, it may have a parallelogram shape as shown in FIG. 8.
  • the first base layer 110, the second base layer 120, and the protective layer 550 may be elastically deformed by the stress.
  • the conductive elastic layer 740 may be elastically deformed by the stress, and the first metal layer 710 and/or the second metal layer 720 may move in the x-axis direction.
  • the first protrusion 711 or the second protrusion 721 may move in the x-axis direction overlapping with the second concave part 723 or the first concave part 713.
  • a gap between the first metal layer 710 and the second metal layer 720 may decrease. That is, the first height h1 and the second height h2 may be reduced compared to before the elastic deformation (FIGS. 6 and 7 ). Accordingly, a distance between the first and second metal layers 210 and 220 may become closer, and a resistance value between the first and second metal layers 210 and 220 may decrease.
  • the mask 1000 may be elastically deformed in the y-axis and/or -y-axis directions.
  • the conductive elastic layer 740 may elastically deform in the y-axis direction.
  • the conductive elastic layer 740 when viewed from the side, it may have a rectangular shape as shown in FIG. 29.
  • the first base layer 110, the second base layer 120, and the protective layer 550 may be elastically deformed by the stress.
  • the conductive elastic layer 740 may be elastically deformed by the stress, and the first metal layer 710 or the second metal layer 720 may move in the y-axis direction.
  • the first protrusion 711 or the second protrusion 721 may move in the y-axis direction within a region overlapping with the second concave part 723 or the first concave part 713.
  • a gap between the first metal layer 710 and the second metal layer 720 may decrease. That is, the first height h1 and the second height h2 may be decreased compared to before the elastic deformation (FIGS. 25 and 26 ). Accordingly, a distance between the first and second metal layers 210 and 220 may become closer, and a resistance value between the first and second metal layers 210 and 220 may decrease.
  • a third barrier member 753 may be disposed on the first wiring 200.
  • the third barrier member 753 may be disposed on the outer surface of the first metal layer 710.
  • the third barrier member 753 may be disposed on a lower surface of the first metal layer 710. That is, the third barrier member 753 may be disposed between the first base layer 110 and the first metal layer 710.
  • the third barrier member 753 may have a shape corresponding to a lower surface of the first metal layer 710. In addition, the third barrier member 753 may have a size corresponding to the lower surface of the first metal layer 710. In detail, the third barrier member 753 may have the same length in the horizontal direction (x-axis and y-axis directions) as the lower surface of the first metal layer 710 and may have the same planar area.
  • the third barrier member 753 may directly contact the lower surface of the first metal layer 710. Further, although not shown in the drawings, the third barrier member 753 may be spaced apart from the lower surface of the first metal layer 710 at a predetermined interval. In this case, the protective layer 550 may be disposed between the third barrier member 753 and the first metal layer 710.
  • the third barrier member 753 may include a material having a lower elastic modulus than the conductive elastic layer 740.
  • the third barrier member 753 may include a material having a lower elastic modulus than at least one selected from among the first base layer 110, the second base layer 120, and the protective layer 550.
  • the third barrier member 753 may include a metal or polymer material.
  • the third barrier member 753 is polypropylene (PP), polyethylene (PE), polycarbonate (PC), polyimide (polyimide), polyethylene terephthalate (polyethyleneterephthalate (PET)), poly It may contain at least one of polyetherether ketone (PEEK).
  • the third barrier member 753 may be about 80% or less of the elastic modulus of the first base layer 110, the second base layer 120, and the protective layer 550.
  • the elastic modulus of the third barrier member 753 may be about 70% or less of the elastic modulus of the components 110, 120, and 550. Accordingly, the third barrier member 753 can minimize the movement of the first metal layer 710 when the conductive elastic layer 740 is elastically deformed, and the deformation of the conductive elastic layer 740 and the 2 It is possible to induce movement of the metal layer 720. Accordingly, it is possible to prevent the first metal layer 710 and the second metal layer 720 from being damaged.
  • the first wiring 200 has been described with reference to FIGS. 24 to 31, but in consideration of the stretchable characteristic of the mask 1000 according to the fourth embodiment, the second wiring 300 ) Preferably has the same shape as the first wiring 200.
  • the mask 1000 according to the fourth exemplary embodiment may be elastically deformed to correspond to the user's face shape when the user wears it.
  • the mask 1000 may be elastically deformed by the user to effectively contact the user's skin.
  • the wiring of the mask 1000 may be deformed to correspond to the elastic deformation of the mask 1000, and the wiring corresponding to the curved region such as the nose may be effectively elastically deformed to have improved reliability.
  • the mask 1000 according to the embodiment is provided so as to elastically deform not only the base layer but also the internal wiring, so that the user may have improved reliability in a process of repeatedly wearing the mask 1000.
  • the wirings 200 and 300 may have improved electrical characteristics.
  • the mask 1000 may detect a change in resistance value inside the first wiring 200 to determine elastic deformation information of the mask 1000, and an indicator ( 910) or the like may be provided to the user. Accordingly, when a stress exceeding a set range is applied to the mask 1000 or elastically deformed beyond a set range, a warning sound or the like may be provided to the user.
  • the method of manufacturing a mask according to the embodiment may include forming a wire on the protective film (S301).
  • the protective film may include a resin material.
  • the protective film may include resin materials such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polyimide (PI), and may be provided in the form of a film having a predetermined thickness.
  • the wiring may include a conductive material.
  • the wiring is aluminum (Al), copper (Cu), silver (Ag), gold (Au), chromium (Cr), nickel (Ni), molybdenum (Mo), titanium (Ti), and alloys thereof It may contain at least one metal.
  • the wiring may include a non-metal such as carbon, and may include a conductive elastic body.
  • the step of forming the wiring (S301) may include forming a first wiring 200 on the protective film and forming a second wiring 300 on the protective film.
  • the first wiring 200 may be disposed on the first protective film 811
  • the second wiring 300 is a second wiring different from the first protective film 811 It may be disposed on the protective film 812.
  • a method of manufacturing a mask according to an embodiment may include arranging a piezoelectric element (S302).
  • the piezoelectric element 400 may include a ceramic material.
  • the piezoelectric element 400 includes ZnO, AlN, LiNbO 4 , lead antimony stannate, lead magnesium tantalate, lead nickel tantalate, and titanate ( titanates), tungstates, zirconates, or lead zirconate titanate [Pb(Zr x Ti 1-x )O 3 (PZT)], lead lanthanum zirconate titanate (PLZT), lead niobium Zirconate titanate (PNZT), BaTiO 3 , SrTiO 3 , lead magnesium niobate, lead nickel niobate, lead manganese niobate, lead zinc niobate, lead including lead titanate, barium, bismuth, or niobium of strontium It may contain at least one of niobates.
  • Arranging the piezoelectric element may be a step of disposing the piezoelectric element 400 between the first protective film 811 and the second protective film 812.
  • the step S302 may be a step of disposing the piezoelectric element 400 between the first wiring 200 and the second wiring 300.
  • the piezoelectric element 400 is connected to the first wiring 200 and the second wiring 300
  • the step of arranging the piezoelectric element may be a step of disposing the piezoelectric element 400 on the first wiring 200 and the second wiring 300.
  • the piezoelectric element 400 may be electrically connected to the first wiring 200 and the second wiring 300.
  • a bonding member may be disposed between the first wiring 200 and the lower surface of the piezoelectric element 400, and between the second wiring 300 and the upper surface of the piezoelectric element 400, and the bonding member As a result, the piezoelectric element 400 may be bonded to the first wiring 200 and the second wiring 300.
  • a first bonding layer 451 may be disposed between the first wiring 200 and the lower surface of the piezoelectric element 400.
  • the first wiring 200 and the bottom surface of the piezoelectric element 400 may be bonded by the first bonding layer 451.
  • a second bonding layer 452 may be disposed between the second wiring 300 and the upper surface of the piezoelectric element 400.
  • the second wiring 300 and the upper surface of the piezoelectric element 400 may be bonded by the second bonding layer 452.
  • the piezoelectric element 400 may be physically and electrically connected to the wirings 200 and 300 by the first and second bonding layers 451 and 452.
  • the method of manufacturing a mask according to the embodiment may include sealing the piezoelectric element (S303).
  • Sealing the piezoelectric element (S303) may be a step of forming a fourth filling layer 851 between the first protective film 811 and the second protective film 812 using a filler.
  • the fourth filling layer 851 may include a soft and elastic material.
  • the fourth filling layer 851 is a polyvinyl chloride ( PVC) may include at least one material.
  • PVC polyvinyl chloride
  • the fourth filling layer 851 may be relatively light and may minimize irritation upon contact with the user's skin, and may preferably include a silicone elastomer having a predetermined elasticity.
  • the filler may be supplied between the first protective film 811 and the second protective film 812. Thereafter, the filler may be cured to form the fourth filler layer 851.
  • the fourth filling layer 851 may be disposed surrounding the piezoelectric element 400.
  • the fourth filling layer 851 may directly contact the piezoelectric element 400.
  • the fourth filling layer 851 may be formed to be thicker than the piezoelectric element 400 and may be disposed to surround the entire piezoelectric element 400.
  • the fourth filling layer 851 may be disposed to surround the first and second wirings 200 and 300 disposed on the first and second protective films 811 and 812.
  • the fourth filling layer 851 may directly contact the first and second wirings 200 and 300.
  • the fourth filling layer 851 may directly contact the first bonding layer 451 and the second bonding layer 452.
  • the method of manufacturing a mask according to the embodiment may include removing the protective film (S304).
  • the step of removing the protective film (S304) may be a step of removing the first protective film 811 and the second protective film 812 and forming a structure defined as the first structure S1.
  • the first protective film 811 disposed on the lower surface of the fourth filling layer 851 may be removed.
  • the second protective film 812 disposed on the upper surface of the fourth filling layer 851 may be removed.
  • the first and second protective films 811 and 812 may be removed by a mechanical or chemical method, but the embodiment is not limited thereto.
  • the lower and upper surfaces of the fourth filling layer 851 may be exposed.
  • the lower surface of the first wiring 200 facing the upper surface of the first protective film 811 may be exposed.
  • the lower surface of the fourth filling layer 851 may be disposed on the same plane as the lower surface of the first wiring 200.
  • a lower surface of the second wiring 300 facing the upper surface of the second protective film 812 may be exposed.
  • the upper surface of the fourth filling layer 851 may be disposed on the same plane as the lower surface of the second wiring 300.
  • the first structure S1 including the piezoelectric element 400, the first wiring 200, the second wiring 300, and the fourth filling layer 851 may be formed through the step S304.
  • a method of manufacturing a mask according to an embodiment may include forming a filling layer on the first structure (S305 ).
  • the step of forming the filling layer (S305) may be a step of forming a fifth filling layer 852 on the first structure S1 by disposing a filler on the first structure S1.
  • the fifth filling layer 852 is made of polyvinyl chloride (PVC) to which silicone, thermoplastic resin, thermoplastic silicone resin, thermoplastic elastomer, polyurethane elastomer, ethylene vinyl acetate (EVA), harmless plasticizer and stabilizer are added. It may include at least one material.
  • PVC polyvinyl chloride
  • the fifth filling layer 852 is relatively light and can minimize irritation upon contact with the user's skin, and may preferably include a silicone elastomer having a predetermined elasticity.
  • the filler may be supplied around the first structure S1.
  • the first structure S1 may be disposed in a molding jig having a receiving portion of a set shape and size.
  • the filler may be supplied into the molding jig, and the filler may be disposed to surround the first structure S1.
  • the filler may be cured to become the fifth filler layer 852.
  • the fifth filling layer 852 may include the same material as the fourth filling layer 851. Since the fifth filling layer 852 includes the same material as the fourth filling layer 851, it may have an improved bonding force.
  • the fifth filling layer 852 may be disposed surrounding the upper and lower surfaces of the first structure S1. Further, although not shown in the drawings, the fifth filling layer 852 may be disposed to surround at least one side surface of the first structure S1. For example, the fifth filling layer 852 may be disposed to surround the entire side surface of the first structure S1.
  • the fifth filling layer 852 may directly contact the upper and lower surfaces of the fourth filling layer 851. In addition, the fifth filling layer 852 may directly contact a side surface of the fourth filling layer 851. In addition, the fifth filling layer 852 may directly contact the first wiring 200 and the second wiring 300.
  • the fifth filling layer 852 may be disposed to selectively surround the outer surface of the first structure S1 according to the shape and/or size of the molding jig, but is not limited thereto.
  • the first base layer 110, the second base layer 120, the piezoelectric element 400, the first wiring 200, and the second wiring are formed through the step of forming a filling layer on the first structure (S305).
  • the mask 1000 according to the embodiment including 300) and the protective layer 550 may be manufactured.
  • the method of manufacturing a mask according to the embodiment can prevent or minimize the deformation of the layer that occurs during the manufacturing process, and the alignment characteristic between the piezoelectric element 400 and the wirings 200 and 300 is improved. Can be improved.
  • filling layers 821 and 822 surrounding the wirings 200 and 300 are formed on the protective films 811 and 812, and after removing the protective films 811 and 812, the piezoelectric The device and the wirings 200 and 300 were connected.
  • the wirings 200 and 300 and the piezoelectric element 400 can be connected.
  • a separate filling layer is not disposed on the protective films 811 and 812, and thus, due to the ductility of the filling layer. It is possible to prevent or reduce the occurrence of an alignment failure between the piezoelectric element 400 and the wirings 200 and 300.
  • a maximum degree of shift between the wirings 200 and 300 and the piezoelectric element 400 based on a horizontal direction may be about 1 mm or less.
  • the degree of deviation may be about 500 ⁇ m or less.
  • the degree of deviation may be about 300 ⁇ m or less. That is, the embodiment may have improved alignment characteristics compared to a conventional manufacturing method that is displaced by a maximum of 1.7 mm or more, and the piezoelectric element 400 may have improved reliability with the wirings 200 and 300. .
  • the wirings 200 and 300 and the piezoelectric element 400 may be first connected before a separate filling layer is disposed, and thereafter, a fourth filling layer surrounding the piezoelectric element 400 ( 851) can be placed. Accordingly, the fourth filling layer 851 surrounding the piezoelectric element 400 may be provided in various colors regardless of color.
  • the mask 1000 may be manufactured by arranging the first structure in the molding jig and forming the fifth filling layer 852. Accordingly, the thickness of the first base layer 110 and the second base layer 120 of the manufactured mask 1000, for example, the thickness of the reflective layer and the matching layer may be manufactured to a set thickness. Accordingly, the mask 1000 according to the embodiment may have uniform ultrasonic reflection characteristics and impedance characteristics.
  • the mask 1000 according to the embodiment may further include a first substrate 510 and a second substrate 520.
  • the first substrate 510 may be disposed on the first base layer 110.
  • the first substrate 510 may be disposed between the first base layer 110 and the first wiring 200.
  • the first substrate 510 may directly contact one surface of the first base layer 110.
  • the first wiring 200 may be spaced apart from the first base layer 110 and may directly contact the first substrate 510.
  • the first substrate 510 is transparent and may include a material in consideration of moisture barrier properties and thermal stability.
  • the first substrate 510 may include a material that has flexibility and elastically deforms according to the shape of the user's skin.
  • the first substrate 510 may include a resin material such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polyimide (PI).
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • PI polyimide
  • the first substrate 510 may be provided in the form of a film.
  • the first substrate 510 may have a thickness of about 0.5 ⁇ m to about 5 ⁇ m or less.
  • the thickness of the first substrate 510 is less than about 0.5 ⁇ m, the components disposed on the first substrate 510, for example, the first substrate 510 overlapped with the components by the weight of the piezoelectric element 400 1 There may be a problem that the area of the substrate 510 is struck. Accordingly, reliability of the first substrate 510 may be deteriorated, and a problem of alignment of components disposed on the first substrate 510 may occur.
  • the thickness of the first substrate 510 exceeds about 5 ⁇ m, the total thickness of the mask 1000 may be increased.
  • the first substrate 510 may have a thickness of about 0.5 ⁇ m to about 3 ⁇ m.
  • the thickness of the first substrate 510 satisfies the above-described range, reliability and alignment characteristics can be maintained and elastically deformed efficiently into a shape corresponding to the user's skin, and the total thickness of the mask 1000 and Weight can be reduced.
  • the second substrate 520 may be disposed on the second base layer 120.
  • the second substrate 520 may be disposed between the second base layer 120 and the second wiring 300.
  • the second substrate 520 may directly contact one surface of the second base layer 120.
  • the second wiring 300 may be spaced apart from the second base layer 120 and may directly contact the second substrate 520.
  • the second substrate 520 is transparent and may include a material in consideration of moisture barrier properties and thermal stability.
  • the second substrate 520 may include a material that has flexibility and is elastically deformed according to the shape of the user's skin.
  • the second substrate 520 may include a resin material such as polyethylene terephthalate (PET), polyethylene nattalate (PEN), and polyimide (PI).
  • PET polyethylene terephthalate
  • PEN polyethylene nattalate
  • PI polyimide
  • the second substrate 520 may be provided in the form of a film.
  • the second substrate 520 may have the same material and shape as the first substrate 510, but is not limited thereto.
  • the second substrate 520 may have a thickness of about 0.5 ⁇ m to about 5 ⁇ m.
  • the thickness of the second substrate 520 is less than about 0.5 ⁇ m, components disposed on the second substrate 520, for example, the second substrate 520 overlapping the components by the weight of the piezoelectric element 400 2 There may be a problem that the area of the substrate 520 is hit. Accordingly, reliability of the second substrate 520 may be deteriorated, and an alignment problem may occur between components disposed on the second substrate 520.
  • the thickness of the second substrate 520 exceeds about 5 ⁇ m, the total thickness of the mask 1000 may be increased.
  • the second substrate 520 may have a thickness of about 0.5 ⁇ m to about 3 ⁇ m.
  • the thickness of the second substrate 520 satisfies the above-described range, reliability and alignment characteristics can be maintained and elastically deformed efficiently into a shape corresponding to the user's skin, and the total thickness of the mask 1000 and Weight can be reduced.
  • the second substrate 520 may have the same thickness as the first substrate 510, but is not limited thereto.
  • first substrate 510 and the second substrate 520 alignment characteristics of the piezoelectric element 400 may be improved.
  • first substrate 510 and the second substrate 520 are added, an inflow path of moisture and foreign substances introduced from the outside may be increased, so that the mask 1000 may have improved reliability.
  • 40 to 42 are diagrams illustrating examples in which an indicator and a protrusion are provided to a mask according to embodiments.
  • the mask 1000 may include an indicator 910.
  • the indicator 910 may include at least one of a member capable of transmitting information to a user, such as visually or aurally, such as an LED, a display, and a buzzer.
  • the indicator 910 may be disposed outside the mask 1000 to display an operation state of the mask 1000.
  • the indicator 910 may provide information on the start of the operation of the mask 1000, information indicating that the operation is in progress, and information on the completion of the operation through auditory information generated from a buzzer.
  • the indicator 910 may display an operation state according to the light emission color of the LED.
  • the indicator may display information on an operating frequency domain through the display.
  • the mask 1000 may include a protrusion 920 disposed on an outer surface.
  • the protrusion 920 may be disposed on a surface of the second base layer 120 facing the user's skin.
  • the protrusion 920 may be disposed on the other surface opposite to one surface of the second base layer 120 on which the second wiring 300 is disposed.
  • the protrusion 920 may include a material harmless to the human body and may be disposed to protrude from the other surface of the second base layer 120 toward the user's skin.
  • the protrusion 920 may be disposed on the other surface of the second base layer 120 in the form of a plurality of points spaced apart from each other.
  • the protrusions 920 may be disposed in the form of a plurality of straight lines or curved lines spaced apart from each other on the other surface of the second base layer 120.
  • the protrusion 920 may be disposed in the form of at least one line on the other surface of the second base layer 120.
  • the protrusion 920 may be disposed on the other surface of the second base layer 120 in at least one spiral shape.
  • the protrusion 920 may form a predetermined space between the mask 1000 and the user's skin when the user wears the mask 1000. Accordingly, by the pressure generated when the mask 1000 is worn and/or the ultrasonic energy generated from the piezoelectric element 400, cosmetics or drugs between the mask 1000 and the skin are at the edge of the mask 1000 It can prevent being pushed into the area. That is, the protrusion 920 may serve as a partition wall preventing cosmetics or drugs from escaping from the mask 1000. Accordingly, the user can effectively inject cosmetics or drugs into the skin by using the mask 1000.
  • FIG. 43 is a diagram illustrating a user wearing a mask according to embodiments
  • FIG. 44 is a diagram illustrating a skin care device to which a mask according to the embodiments is applied.
  • the user 50 may wear the mask 1000.
  • the mask 1000 may include the above-described opening 1010, and the user 50 may secure a view through the opening 1010.
  • the mask 1000 may include the above-described cutting portion 1020, and the mask 1000 may be effectively in close contact with the curved skin by the cutting portion 1020.
  • one surface of the second base layer 120 may directly contact the skin of the user 50.
  • drugs or cosmetics are disposed between the second bath layer 520 and the skin of the user 50 so that the base layer 520 may directly or indirectly contact the skin of the user 50.
  • the mask 1000 may be operated by receiving power through an external power connected to the mask 1000. Further, the mask 1000 may be operated by receiving power through a power supply unit 1100 disposed outside the mask 1000, for example, on the other surface of the first base layer 110.
  • the mask 1000 may be applied to and operated on the skin care device 1.
  • one side of the skin care device 1 is open and may include a body 10 including an accommodation space 11 therein.
  • the body 10 is light and may include a material capable of preventing damage from external impact or contact.
  • the body 10 may include a plastic or ceramic material, and may have improved reliability from an external environment, and may protect the mask 1000 disposed inside the accommodation space 11.
  • the main body 10 may include a viewing part 13 formed at a position corresponding to the user's eyes. The viewing part 13 is formed in an area corresponding to the opening 1010 of the mask 1000, and a user can secure an external view through the viewing part 13.
  • the mask 1000 may be disposed in the receiving space 11 of the body 10.
  • the mask 1000 may be disposed between the body 10 and the skin of the user 50.
  • the first base layer 110 of the mask 1000 may be disposed to face the receiving space 11 of the body 10
  • the second base layer 120 of the mask 1000 is 50 may be arranged to face the skin.
  • the mask 1000 may be coupled to the body 10.
  • the mask 1000 may be fixed to a set position of the receiving space 11 by a fastening member (not shown), and may have a structure that is detachable from the main body 10.
  • the mask 1000 may receive power through a power supply unit 1100 disposed outside the mask 1000, for example, on the other surface of the first base layer 110.
  • the mask 1000 may be connected to the main body 10 to receive power through the power supply unit 1100 disposed on the main body 10.
  • the mask 1000 may include a deformable member (not shown) disposed on the lower surface of the first base layer 110.
  • the deformable member may directly contact the first base layer 110 and may be disposed facing the receiving space 11 of the main body 10. That is, the deformable member may be disposed between the body 10 and the first base layer 110 of the mask 1000.
  • the deformable member may include a material whose shape is changed by external pressure.
  • the deformable member may include a material such as an air gap or a sponge, but is not limited thereto, and may include various materials whose shape is changed by external pressure. Accordingly, when the user 50 wears the skin care device 1, the deformable member may be transformed into a form corresponding to the face form of the user 50. Accordingly, the mask 1000 and the skin of the user 50 can be effectively brought into close contact. In addition, when a plurality of users wear the skin care device 1, the skin of the user 50 and the mask 1000 may be effectively brought into close contact with each other by deforming to correspond to each face shape.

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  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Biomedical Technology (AREA)
  • Mechanical Engineering (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Vascular Medicine (AREA)
  • Anesthesiology (AREA)
  • Hematology (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Epidemiology (AREA)
  • Pain & Pain Management (AREA)
  • Physical Education & Sports Medicine (AREA)
  • Rehabilitation Therapy (AREA)
  • Medical Informatics (AREA)
  • Dermatology (AREA)
  • Percussion Or Vibration Massage (AREA)
PCT/KR2020/007032 2019-06-14 2020-05-29 마스크 및 이를 포함하는 피부 관리 기기 WO2020251200A1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US17/616,264 US20220312940A1 (en) 2019-06-14 2020-05-29 Mask and skin care device including same
CN202080043653.1A CN113993418B (zh) 2019-06-14 2020-05-29 面膜以及包括面膜的皮肤护理装置

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
KR1020190070592A KR102711473B1 (ko) 2019-06-14 2019-06-14 마스크 및 이를 포함하는 피부 관리 기기
KR10-2019-0070502 2019-06-14
KR10-2019-0070592 2019-06-14
KR1020190070502A KR102703769B1 (ko) 2019-06-14 2019-06-14 마스크 및 이를 포함하는 피부 관리 기기
KR10-2019-0086099 2019-07-17
KR1020190086080A KR20210010680A (ko) 2019-07-17 2019-07-17 마스크 및 이를 포함하는 피부 관리 기기
KR10-2019-0086080 2019-07-17
KR1020190086099A KR20210009508A (ko) 2019-07-17 2019-07-17 마스크 및 이를 포함하는 피부 관리 기기
KR10-2019-0090955 2019-07-26
KR1020190090955A KR20210012727A (ko) 2019-07-26 2019-07-26 마스크, 이의 제조 방법 및 이를 포함하는 피부 관리 기기

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