WO2020248722A1 - 显示基板及其制作方法、显示装置 - Google Patents

显示基板及其制作方法、显示装置 Download PDF

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Publication number
WO2020248722A1
WO2020248722A1 PCT/CN2020/086105 CN2020086105W WO2020248722A1 WO 2020248722 A1 WO2020248722 A1 WO 2020248722A1 CN 2020086105 W CN2020086105 W CN 2020086105W WO 2020248722 A1 WO2020248722 A1 WO 2020248722A1
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WO
WIPO (PCT)
Prior art keywords
insulating layer
area
groove
display substrate
base substrate
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PCT/CN2020/086105
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English (en)
French (fr)
Inventor
刘弘
王凤国
方业周
武新国
郭志轩
李凯
田亮
马波
王海东
Original Assignee
京东方科技集团股份有限公司
鄂尔多斯市源盛光电有限责任公司
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Publication of WO2020248722A1 publication Critical patent/WO2020248722A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line

Definitions

  • the present disclosure relates to the field of display technology, in particular to a display substrate, a manufacturing method thereof, and a display device.
  • Reliability refers to the verification of related functionality (such as: electrical, plug-in, conduction, etc.) by simulating the applicability of the product on the client and under real working conditions to ensure that the product meets the final requirements of the customer.
  • a display substrate in one aspect, includes a first insulating layer on a base substrate, and a conductive trace on a side of the first insulating layer away from the base substrate is located on the conductive trace.
  • the line is away from the second insulating layer on the side of the base substrate, and at least a part of the surface of the first insulating layer facing the second insulating layer is uneven.
  • the first insulating layer is an interlayer insulating layer
  • the second insulating layer is a flat layer
  • the conductive traces are source and drain metal traces.
  • the at least part of the area is located in a wiring area of the display substrate, and the conductive wiring is arranged in the wiring area.
  • the wiring area includes a first area and a second area
  • the conductive wiring includes a first conductive sub-wiring and a second conductive sub-wiring
  • the first conductive sub-wiring runs parallel to the liner.
  • the first edge direction of the base substrate is arranged in the first area
  • the second conductive sub-wiring is arranged in the second area along a direction that forms a first angle with the first edge of the base substrate.
  • each of the first conductive sub-wires is correspondingly provided with a plurality of first grooves arranged at intervals.
  • the first groove is rectangular.
  • the height of the first groove is 800 um to 1000 um
  • the width is 500 um to 800 um
  • the distance between adjacent first grooves is 100 um.
  • the second area is provided with a plurality of second grooves arranged at intervals in a direction parallel to the second edge of the base substrate.
  • the second groove is rectangular.
  • the width of the second groove is greater than the width of the first groove, and the height of the second groove is greater than the height of the first groove.
  • the first area is provided with a plurality of strip-shaped third grooves parallel to the second edge of the base substrate and arranged at intervals
  • the second area is provided with a plurality of third grooves parallel to the Strip-shaped fourth grooves arranged at intervals on the second edge of the base substrate.
  • the height of the third groove is 300 um to 500 um and the width is 30 mm
  • the height of the fourth groove is 300 um to 500 um and the width is 60 mm.
  • the first area includes a third sub-area and a fourth sub-area
  • the third sub-area is provided with a plurality of strips whose extending directions form a third angle with the first edge of the base substrate and are arranged at intervals.
  • the fourth sub-area is provided with strip-shaped sixth grooves whose extending direction forms a fourth angle with the first edge of the base substrate and are arranged at intervals.
  • the third angle and the The absolute values of the fourth angles are equal
  • the second area is provided with a plurality of strip-shaped seventh grooves that are parallel to the second edge of the base substrate and are arranged at intervals.
  • the fifth groove and the sixth groove have a height of 1 mm and a width of 500 um to 800 um
  • the seventh groove has a height of 300 um to 500 um and a width of 60 mm.
  • the first insulating layer includes a first insulating film layer and a second insulating film layer that are stacked, and the second insulating film layer is located between the base substrate and the first insulating film layer, The depth of the groove does not exceed the thickness of the first insulating film layer.
  • the depth of the groove is equal to the thickness of the first insulating film layer.
  • the depth of the groove is one-third to one-half of the thickness of the first insulating layer.
  • the embodiment of the present disclosure also provides a display device, including the display substrate as described above.
  • the embodiment of the present disclosure also provides a manufacturing method of a display substrate, including:
  • a second insulating layer covering the conductive traces is formed.
  • the forming the first insulating layer with uneven surface on the base substrate includes:
  • the halftone mask includes a light-transmitting area corresponding to the via area of the first insulating layer and a groove corresponding to the first insulating layer. A partial light-transmitting area and a light-shielding area corresponding to other areas of the first insulating layer;
  • FIG. 1 is a schematic diagram showing a wiring area of a substrate in the related art
  • Figure 2 is a schematic cross-sectional view of Figure 1 in the AA direction;
  • FIG. 3 is a schematic diagram showing a wiring area of a substrate according to an embodiment of the disclosure.
  • Figure 4 is a schematic cross-sectional view of Figure 3 in the AA direction;
  • FIG. 5 is a schematic diagram showing a wiring area of a substrate according to another embodiment of the present disclosure.
  • Figure 6 is a schematic cross-sectional view of Figure 5 in the AA direction;
  • FIG. 7 is a schematic diagram showing a wiring area of a substrate according to another embodiment of the present disclosure.
  • FIGS. 8-11 are schematic diagrams of patterns of forming an interlayer insulating layer according to an embodiment of the disclosure.
  • the wiring density in the display wiring area is relatively large, which affects the effective contact area between the insulating film layers on the upper and lower sides of the wiring, and is prone to film shedding.
  • the display substrate of the related technology In the interlayer insulating layer 1, an active drain metal trace 2 is provided, and the source-drain metal trace 2 is provided with a flat layer 3 on the side away from the interlayer insulation layer 1, due to the source-drain metal trace 2 in the trace area
  • the high trace density results in less effective contact area between the interlayer insulating layer 1 and the flat layer 3.
  • the flat layer 3 is likely to fall off, causing the outside air to fall off. The place where the flat layer 3 falls off enters the inside of the display, generating bubbles, causing the display to appear black masses, and affecting the reliability of the display device.
  • the embodiments of the present disclosure provide a display substrate, a manufacturing method thereof, and a display device, which can improve the reliability of the display device.
  • An embodiment of the present disclosure provides a display substrate, the display substrate includes a first insulating layer located on a base substrate, and a conductive trace located on a side of the first insulating layer away from the base substrate is located on the The conductive trace is away from the second insulating layer on the side of the base substrate, and at least a part of the surface of the first insulating layer facing the second insulating layer is uneven.
  • At least part of the surface of the first insulating layer facing the second insulating layer is uneven, which can increase the contact area between the first insulating layer and the second insulating layer, thereby increasing the first insulating layer and the second insulating layer.
  • the bonding force between the two insulating layers prevents the film layer from falling off, and can improve the reliability of the display substrate.
  • the entire area of the surface of the first insulating layer facing the second insulating layer may be uneven, or part of the surface of the first insulating layer facing the second insulating layer may be uneven, both can be increased
  • the contact area between the first insulating layer and the second insulating layer further increases the bonding force between the first insulating layer and the second insulating layer.
  • the part of the first insulating layer facing the second insulating layer in the wiring area is preferably uneven, that is, the at least part The area is located in the wiring area of the display substrate.
  • the first insulating layer may be an interlayer insulating layer
  • the second insulating layer may be a flat layer
  • the conductive traces may be source and drain metal traces.
  • the first insulating layer is not limited to an interlayer insulating layer
  • the second insulating layer is not limited to a flat layer
  • the conductive traces are not limited to source and drain metal traces, and can also be other film layers and other signal lines. .
  • At least a part of the surface of the first insulating layer facing the second insulating layer may be provided with a plurality of grooves arranged in an array.
  • the surface of an insulating layer facing the second insulating layer is uneven.
  • At least a part of the surface of the first insulating layer facing the second insulating layer may be provided with a plurality of mutually parallel strip-shaped grooves through a plurality of parallel-arranged strip-shaped grooves. The groove makes the surface of the first insulating layer facing the second insulating layer uneven.
  • the technical solution of the present disclosure is not limited to making the surface of the first insulating layer facing the second insulating layer uneven through the grooves, and more can be provided on the surface of the first insulating layer facing the second insulating layer.
  • the protrusions make the surface of the first insulating layer facing the second insulating layer uneven.
  • the grooves on the surface of the first insulating layer facing the second insulating layer do not have to be arranged regularly, and may also be arranged irregularly.
  • the first insulating layer includes a first insulating film layer and a second insulating film layer that are stacked, and the second insulating film layer is located between the base substrate and the first insulating film layer.
  • the grooves need to be formed through an etching process, and the materials of the first insulating film layer and the second insulating film layer are different, the applicable etching process parameters are different, and the first insulating film layer and the second insulating film layer are simultaneously performed
  • the etching is not easy to control. Therefore, it is optional to form the groove only in the range of the first insulating film layer, that is, the depth of the groove does not exceed the thickness of the first insulating film layer.
  • the depth of the groove may be equal to the thickness of the first insulating film layer.
  • the depth of the groove may be one-third of the thickness of the first insulating layer One to one-half, so that the contact area between the first insulating layer and the second insulating layer and the conductivity of the conductive trace can be considered.
  • the first insulating layer is an interlayer insulating layer 1
  • the second insulating layer is a flat layer 3
  • the conductive traces are source and drain metal traces 2, which are insulated between layers
  • the surface of the layer 1 and the flat layer 3 is provided with a plurality of grooves 4 arranged in an array, which can increase the contact area between the interlayer insulating layer 1 and the flat layer 3, so that the reliability of the display is dropped during the whole machine drop test process.
  • the flat layer 3 is not easy to fall off.
  • the conductive traces may also be traces of other metal film layers, such as gates, pixel electrodes, common electrodes, and the like.
  • the first insulating layer may be silicon nitride SiNx, silicon oxide SiOx, or a SiNx/SiOx composite layer
  • the second insulating layer may be acrylic or resin glue.
  • the interlayer insulating layer 1 includes a wiring area, and the conductive wiring is arranged in the wiring area.
  • the wiring area includes a first area 10 and a second area 20, and the conductive wiring includes a first conductive sub-wiring 31 and a second conductive sub-wiring 32.
  • the first conductive sub-wiring 31 is arranged in the first region 10 in a direction parallel to the first edge of the base substrate, and the second conductive sub-wiring 32 is arranged along a first angle with the first edge of the base substrate.
  • the direction is arranged in the second area 20.
  • the second area 20 includes a first sub-area 201 and a second sub-area 202.
  • the second conductive sub-line 32 is aligned first with the first edge of the base substrate.
  • the direction of the angle is arranged.
  • the second conductive sub-line 32 is arranged along a direction at a second angle to the first edge of the base substrate, and the absolute value of the second angle and the first angle equal.
  • the first conductive sub-wiring 31 of each conductive wiring is correspondingly provided with a plurality of first grooves arranged at intervals, and the first grooves may be rectangular.
  • the height h of the first groove is 800 um to 1000 um
  • the width w is 500 um to 800 um
  • the distance d between adjacent first grooves is 100 um.
  • only one groove corresponding to the first conductive sub-line 31 may be provided at the first conductive sub-line 31 of each conductive trace, and the groove is along the first conductive sub-line 31 parallel to the base substrate.
  • the length of an edge direction is greater than the sum of the lengths of the plurality of spaced first grooves along the first edge direction parallel to the base substrate.
  • the second region 20 is provided with a plurality of second grooves arranged at intervals in a direction parallel to the second edge of the base substrate, and the second grooves are optional It is rectangular.
  • the arrangement is sparse, the line width is small, and The distance between adjacent first conductive sub-wiring lines 31 is relatively small; while the second conductive sub-wiring lines 32 in the second region 20 are arranged obliquely on the interlayer insulating layer 1, with a higher wiring density, line width and phase The distances between the adjacent second conductive sub-wirings 32 are relatively large.
  • the width of the second groove is larger than that of the first groove
  • the height of the second groove is greater than the height of the first groove.
  • the first insulating layer is an interlayer insulating layer 1
  • the second insulating layer is a flat layer 3
  • the conductive traces are source and drain metal traces 2, which are
  • the surface of the insulating layer 1 in contact with the flat layer 3 is provided with a plurality of parallel strip-shaped grooves 4, which can increase the contact area between the interlayer insulating layer 1 and the flat layer 3, so that the reliability of the display is adjusted.
  • the flat layer 3 is not easy to fall off.
  • the extending direction of the strip-shaped groove 4 may be parallel to the second edge of the base substrate.
  • the first region 10 is provided with a plurality of strip-shaped third grooves that are parallel to the second edge of the base substrate and are arranged at intervals, and the height h of the third grooves is 300um ⁇ 500um, the width w is 30mm;
  • the second area 20 is provided with a plurality of fourth grooves parallel to the second edge of the base substrate and arranged at intervals, the height h of the fourth grooves is 300um ⁇ 500um, width w is 60mm.
  • the extending direction of the strip-shaped groove 4 may form a certain angle with the edge of the base substrate.
  • the first area 10 includes a third sub-area 101 and a fourth sub-area 102, and the third sub-area 101 is provided with a plurality of extending directions which form a third angle with the first edge of the base substrate and are arranged at intervals.
  • the fourth sub-region 102 is provided with strip-shaped sixth grooves that extend at a fourth angle to the first edge of the base substrate and are arranged at intervals.
  • the third angle is relative to the first edge.
  • the absolute values of the four angles are equal, the height h of the fifth groove and the sixth groove is 1 mm, and the width w is 500 um to 800 um.
  • the second region 20 is provided with a plurality of strip-shaped seventh grooves parallel to the second edge of the base substrate at intervals, and the seventh grooves have a height h of 300 um to 500 um and a width w of 60 mm.
  • the shape of the groove 4 may be any other shape besides the rectangular shape in FIG. 4 and the strip shape in FIGS. 5 and 7.
  • the embodiment of the present disclosure also provides a display device, including the display substrate as described above.
  • the display device includes but is not limited to: radio frequency unit, network module, audio output unit, input unit, sensor, display unit, user input unit, interface unit, memory, processor, power supply and other components.
  • the structure of the above-mentioned display device does not constitute a limitation on the display device, and the display device may include more or less of the above-mentioned components, or a combination of some components, or different component arrangements.
  • the display device includes, but is not limited to, a display, a mobile phone, a tablet computer, a television, a wearable electronic device, a navigation display device, and the like.
  • the display device may be any product or component with a display function, such as an LCD TV, a liquid crystal display, a digital photo frame, a mobile phone, a tablet computer, etc., wherein the display device also includes a flexible circuit board, a printed circuit board and a backplane.
  • a display function such as an LCD TV, a liquid crystal display, a digital photo frame, a mobile phone, a tablet computer, etc.
  • the display device also includes a flexible circuit board, a printed circuit board and a backplane.
  • the embodiment of the present disclosure also provides a manufacturing method of a display substrate, including:
  • a second insulating layer covering the conductive traces is formed.
  • At least part of the surface of the first insulating layer facing the second insulating layer is uneven, which can increase the contact area between the first insulating layer and the second insulating layer, thereby increasing the first insulating layer and the second insulating layer.
  • the bonding force between the two insulating layers prevents the film layer from falling off, and can improve the reliability of the display substrate.
  • the entire area of the surface of the first insulating layer facing the second insulating layer may be uneven, or part of the surface of the first insulating layer facing the second insulating layer may be uneven, both can be increased
  • the contact area between the first insulating layer and the second insulating layer further increases the bonding force between the first insulating layer and the second insulating layer.
  • the part of the first insulating layer facing the second insulating layer in the wiring area is preferably uneven, that is, the at least part The area is located in the wiring area of the display substrate.
  • the first insulating layer may be an interlayer insulating layer
  • the second insulating layer may be a flat layer
  • the conductive traces may be source and drain metal traces.
  • the first insulating layer is not limited to an interlayer insulating layer
  • the second insulating layer is not limited to a flat layer
  • the conductive traces are not limited to source and drain metal traces, and can also be other film layers and other signal lines. .
  • the side surface of the first insulating layer facing the second insulating layer may be provided with a plurality of grooves arranged in an array, and the first insulating layer faces toward The surface of one side of the second insulating layer is uneven.
  • the surface of the first insulating layer facing the second insulating layer may be provided with a plurality of parallel strip grooves, and the first insulating layer The surface of an insulating layer facing the second insulating layer is uneven.
  • the forming the first insulating layer with uneven surface on the base substrate includes:
  • a first insulating material layer 5 is formed on the base substrate, and a photoresist 6 is coated on the first insulating material layer 5; a halftone mask 7 is used to etch the photoresist The adhesive 6 is exposed, and the halftone mask 7 includes a light-transmitting area 73 corresponding to the via area of the first insulating layer, a partial light-transmitting area 72 corresponding to the groove of the first insulating layer, and The light-shielding area 71 in other areas of the first insulating layer; wherein the via area of the first insulating layer may be located in the display area or the wiring area of the display substrate, and the groove of the first insulating layer may be located only in the wiring area, or Simultaneously located in the display area and wiring area of the display substrate;
  • the first insulating material layer 5 in the photoresist removal area C is etched to form a via hole penetrating the first insulating layer; the photoresist in the partially reserved area of the photoresist is removed;
  • a groove can be formed on the surface of the first insulating layer facing the second insulating layer.
  • the technical solution of the present disclosure is not limited to making the surface of the first insulating layer facing the second insulating layer uneven through the grooves, and more can be provided on the surface of the first insulating layer facing the second insulating layer.
  • the protrusions make the surface of the first insulating layer facing the second insulating layer uneven.
  • the grooves on the surface of the first insulating layer facing the second insulating layer do not have to be arranged regularly, and may also be arranged irregularly.
  • the first insulating layer includes a first insulating film layer and a second insulating film layer that are stacked, and the second insulating film layer is located between the base substrate and the first insulating film layer.
  • the grooves need to be formed through an etching process, and the materials of the first insulating film layer and the second insulating film layer are different, the applicable etching process parameters are different, and the first insulating film layer and the second insulating film layer are simultaneously performed
  • the etching is not easy to control. Therefore, it is optional to form the groove only in the range of the first insulating film layer, that is, the depth of the groove does not exceed the thickness of the first insulating film layer.
  • the depth of the groove may be equal to the thickness of the first insulating film layer.
  • the depth of the groove may be one-third of the thickness of the first insulating layer One to one-half, so that the contact area between the first insulating layer and the second insulating layer and the conductivity of the conductive trace can be considered.
  • the first insulating layer is an interlayer insulating layer 1
  • the second insulating layer is a flat layer 3
  • the conductive traces are source and drain metal traces 2, which are insulated between layers
  • the surface of the layer 1 and the flat layer 3 is provided with a plurality of grooves 4 arranged in an array, which can increase the contact area between the interlayer insulating layer 1 and the flat layer 3, so that the reliability of the display is dropped during the whole machine drop test process.
  • the flat layer 3 is not easy to fall off.
  • the first insulating layer is an interlayer insulating layer 1
  • the second insulating layer is a flat layer 3
  • the conductive traces are source and drain metal traces 2, which are
  • the surface of the insulating layer 1 in contact with the flat layer 3 is provided with a plurality of parallel strip-shaped grooves 4, which can increase the contact area between the interlayer insulating layer 1 and the flat layer 3, so that the reliability of the display is adjusted.
  • the flat layer 3 is not easy to fall off.
  • the extending direction of the strip-shaped groove 4 may be parallel to the second edge of the base substrate; or as shown in FIG. 7, the extending direction of the strip-shaped groove 4 may be aligned with the edge of the base substrate. A certain angle.
  • the shape of the groove 4 may be any other shape besides the rectangular shape in FIG. 4 and the strip shape in FIGS. 5 and 7.

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Abstract

一种显示基板及其制作方法、显示装置，属于显示技术领域。其中，显示基板包括位于衬底基板上的第一绝缘层（1），位于第一绝缘层（1）远离衬底基板一侧的导电走线（2），位于导电走线（2）远离衬底基板一侧的第二绝缘层（3），第一绝缘层（1）朝向第二绝缘层（3）一侧表面的至少部分区域为凹凸不平的。

Description

显示基板及其制作方法、显示装置
相关申请的交叉引用
本申请主张在2019年6月10日在中国提交的中国专利申请号No.201910497875.X的优先权，其全部内容通过引用包含于此。
技术领域
本公开涉及显示技术领域，特别是指一种显示基板及其制作方法、显示装置。
背景技术
信赖性是指通过模拟产品在客户端和真实工作条件下的应用性来进行的相关功能性的验证(如：电气、插拔、导通等)，从而确保产品满足客户最终要求。
发明内容
一方面，提供一种显示基板，所述显示基板包括位于衬底基板上的第一绝缘层，位于所述第一绝缘层远离所述衬底基板一侧的导电走线，位于所述导电走线远离所述衬底基板一侧的第二绝缘层，所述第一绝缘层朝向所述第二绝缘层一侧表面的至少部分区域为凹凸不平的。
可选地，所述第一绝缘层为层间绝缘层，所述第二绝缘层为平坦层，所述导电走线为源漏金属走线。
可选地，所述至少部分区域位于所述显示基板的走线区，所述导电走线布置在所述走线区。
可选地，所述走线区包括第一区域和第二区域，所述导电走线包括第一导电子走线和第二导电子走线，所述第一导电子走线沿平行于衬底基板的第一边缘方向布置在所述第一区域，所述第二导电子走线沿与衬底基板的第一边缘成第一角度的方向布置在所述第二区域。
可选地，每个所述第一导电子走线处均对应设置有多个间隔布置的第一 凹槽。
可选地，所述第一凹槽为矩形。
可选地，所述第一凹槽的高度为800um～1000um，宽度为500um～800um，相邻所述第一凹槽之间的间距为100um。
可选地，所述第二区域设置有多个沿平行于衬底基板的第二边缘方向、且间隔布置的第二凹槽。
可选地，所述第二凹槽为矩形。
可选地，所述第二凹槽的宽度大于所述第一凹槽的宽度，所述第二凹槽的高度大于所述第一凹槽的高度。
可选地，所述第一区域设置有多个平行于所述衬底基板的第二边缘、且间隔布置的条状的第三凹槽，所述第二区域设置有多个平行于所述衬底基板的第二边缘、且间隔布置的条状的第四凹槽。
可选地，所述第三凹槽的高度为300um～500um，宽度为30mm，所述第四凹槽的高度为300um～500um，宽度为60mm。
可选地，所述第一区域包括第三子区域和第四子区域，所述第三子区域设置有多个延伸方向与衬底基板的第一边缘成第三角度、且间隔布置的条状的第五凹槽，所述第四子区域设置有延伸方向与衬底基板的第一边缘成第四角度、且间隔布置的条状的第六凹槽，所述第三角度与所述第四角度的绝对值相等，所述第二区域设置有多个平行于所述衬底基板的第二边缘、且间隔布置的条状的第七凹槽。
可选地，所述第五凹槽和所述第六凹槽的高度为1mm，宽度为500um～800um，所述第七凹槽的高度为300um～500um，宽度为60mm。
可选地，所述第一绝缘层包括层叠设置的第一绝缘膜层和第二绝缘膜层，所述第二绝缘膜层位于所述衬底基板和所述第一绝缘膜层之间，所述凹槽的深度不超过所述第一绝缘膜层的厚度。
可选地，所述凹槽的深度等于所述第一绝缘膜层的厚度。
可选地，所述凹槽的深度为所述第一绝缘层的厚度的三分之一至二分之一。
本公开实施例还提供了一种显示装置，包括如上所述的显示基板。
本公开实施例还提供了一种显示基板的制作方法，包括：
在衬底基板上形成表面凹凸不平的第一绝缘层；
在所述第一绝缘层上形成导电走线；
形成覆盖所述导电走线的第二绝缘层。
可选地，所述在衬底基板上形成表面凹凸不平的第一绝缘层包括：
在所述衬底基板上形成第一绝缘材料层；
在所述第一绝缘材料层上涂覆光刻胶；
利用半色调掩膜板对所述光刻胶进行曝光，所述半色调掩膜板包括对应所述第一绝缘层的过孔区的透光区、对应所述第一绝缘层的凹槽的部分透光区和对应所述第一绝缘层其他区域的遮光区；
显影后形成光刻胶完全保留区域、光刻胶部分保留区域和光刻胶去除区域；
对光刻胶去除区域的所述第一绝缘材料层进行刻蚀，形成贯穿所述第一绝缘层的过孔；
去除光刻胶部分保留区域的光刻胶；
对光刻胶部分保留区域的所述第一绝缘材料层进行刻蚀，形成所述第一绝缘层表面的凹槽；
去除光刻胶完全保留区域的光刻胶。
附图说明
图1为相关技术中显示基板的走线区的示意图；
图2为图1在AA方向上的截面示意图；
图3为本公开一实施例显示基板的走线区的示意图；
图4为图3在AA方向上的截面示意图；
图5为本公开另一实施例显示基板的走线区的示意图；
图6为图5在AA方向上的截面示意图；
图7为本公开又一实施例显示基板的走线区的示意图；
图8-图11为本公开实施例制作层间绝缘层的图形的示意图。
具体实施方式
为使本公开的实施例要解决的技术问题、技术方案和优点更加清楚，下面将结合附图及具体实施例进行详细描述。
显示器走线区的走线密度较大，影响了走线上下两侧的绝缘膜层之间的有效接触面积，易发生膜层脱落现象，如图1和图2所示，相关技术的显示基板中，在层间绝缘层1上设置有源漏金属走线2，源漏金属走线2远离层间绝缘层1的一侧设置有平坦层3，由于走线区的源漏金属走线2的走线密度较大，导致层间绝缘层1与平坦层3之间的有效接触面积较少，在进行显示器信赖性整机跌落测试过程中，易发生平坦层3脱落现象，导致外部空气从平坦层3脱落处进入显示器内部，产生气泡，导致显示器出现黑团不良，影响了显示器件的信赖性。
本公开的实施例针对上述问题，提供一种显示基板及其制作方法、显示装置，能够提高显示器件的信赖性。
本公开的实施例提供一种显示基板，所述显示基板包括位于衬底基板上的第一绝缘层，位于所述第一绝缘层远离所述衬底基板一侧的导电走线，位于所述导电走线远离所述衬底基板一侧的第二绝缘层，所述第一绝缘层朝向所述第二绝缘层一侧表面的至少部分区域为凹凸不平的。
本实施例中，第一绝缘层朝向第二绝缘层一侧表面的至少部分区域为凹凸不平的，这样能够增加第一绝缘层与第二绝缘层的接触面积，进而增加第一绝缘层与第二绝缘层之间的结合力，避免发生膜层脱落现象，能够提高显示基板的信赖性。
其中，可以是第一绝缘层朝向第二绝缘层一侧表面的全部区域为凹凸不平的，也可以是第一绝缘层朝向第二绝缘层一侧表面的部分区域为凹凸不平的，均可以增加第一绝缘层与第二绝缘层的接触面积，进而增加第一绝缘层与第二绝缘层之间的结合力。
由于走线区的走线密度较大，易发生膜层脱落现象，因此，第一绝缘层朝向第二绝缘层一侧表面位于走线区的部分最好是凹凸不平的，即所述至少部分区域位于所述显示基板的走线区。
一具体实施例中，所述第一绝缘层可以为层间绝缘层，所述第二绝缘层 可以为平坦层，所述导电走线可以为源漏金属走线。当然，第一绝缘层并不局限为层间绝缘层，第二绝缘层并不绝限为平坦层，导电走线也不局限为源漏金属走线，还可以为其他膜层和其他信号线。
一具体实施例中，所述第一绝缘层朝向所述第二绝缘层的一侧表面的至少部分区域可以设有多个阵列排布的凹槽，通过多个阵列排布的凹槽使得第一绝缘层朝向第二绝缘层一侧表面为凹凸不平的。
另一具体实施例中，所述第一绝缘层朝向所述第二绝缘层的一侧表面的至少部分区域可以设有多个相互平行的条状凹槽，通过多个平行排布的条状凹槽使得第一绝缘层朝向第二绝缘层一侧表面为凹凸不平的。
当然，本公开的技术方案并不局限于通过凹槽使得第一绝缘层朝向第二绝缘层一侧表面为凹凸不平的，还可以在第一绝缘层朝向第二绝缘层的一侧表面设置多个凸起，使得第一绝缘层朝向第二绝缘层一侧表面为凹凸不平的。另外，第一绝缘层朝向第二绝缘层一侧表面的凹槽并不必须是规则排布的，也可以是不规则排布的。
一具体实施例中，所述第一绝缘层包括层叠设置的第一绝缘膜层和第二绝缘膜层，所述第二绝缘膜层位于所述衬底基板和所述第一绝缘膜层之间，由于需要通过刻蚀工艺形成凹槽，而第一绝缘膜层与第二绝缘膜层的材料不同，适用的刻蚀工艺参数不同，对第一绝缘膜层和第二绝缘膜层同时进行刻蚀不容易控制，因此，可选仅在第一绝缘膜层的范围内形成凹槽，即所述凹槽的深度不超过所述第一绝缘膜层的厚度。
具体地，所述凹槽的深度可以等于所述第一绝缘膜层的厚度。
凹槽的深度越大，则第一绝缘层与第二绝缘层之间的接触面积越大，但同时第一绝缘层表面的凹凸程度变大，形成在第一绝缘层上的导电走线的长度也会增加，会导致导电走线的电阻变大，因此，凹槽的深度也不宜过大，可选地，所述凹槽的深度可以为所述第一绝缘层的厚度的三分之一至二分之一，这样可以兼顾第一绝缘层与第二绝缘层之间的接触面积以及导电走线的导电性能。
一具体实施例中，如图3和图4所示，第一绝缘层为层间绝缘层1，第二绝缘层为平坦层3，导电走线为源漏金属走线2，在层间绝缘层1与平坦层3 接触的表面设有多个阵列排布的凹槽4，这样可以增加层间绝缘层1与平坦层3之间的接触面积，使得在进行显示器信赖性整机跌落测试过程中，平坦层3不容易脱落。在一些实施例中，所述导电走线还可以为其他金属膜层如栅极、像素电极、公共电极等的走线。在一些实施例中，所述第一绝缘层可以采用氮化硅SiNx、氧化硅SiOx或SiNx/SiOx的复合层，所述第二绝缘层可以采用亚克力胶或者树脂胶等。
在一些实施例中，层间绝缘层1包括走线区，所述导电走线布置在所述走线区。如图3、5、7所示，所述走线区包括第一区域10和第二区域20，所述导电走线包括第一导电子走线31和第二导电子走线32，所述第一导电子走线31沿平行于衬底基板的第一边缘方向布置在所述第一区域10，所述第二导电子走线32沿与衬底基板的第一边缘成第一角度的方向布置在所述第二区域20。在一些实施例中，第二区域20包括第一子区域201和第二子区域202，在第一子区域201中，第二导电子走线32沿与衬底基板的第一边缘成第一角度的方向布置，在第二子区域202，第二导电子走线32沿与衬底基板的第一边缘成第二角度的方向布置，所述第二角度与所述第一角度的绝对值相等。
在一些实施例中，如图3所示，每个导电走线的第一导电子走线31处均对应设置有多个间隔布置的第一凹槽，该第一凹槽可选为矩形。在一些实施例中，第一凹槽的高度h为800um～1000um，宽度w为500um～800um，相邻第一凹槽之间的间距d为100um。在一些实施例中，每个导电走线的第一导电子走线31处还可仅设置一个凹槽与第一导电子走线31对应，该凹槽沿平行于所述衬底基板的第一边缘方向的长度大于所述多个间隔布置的第一凹槽沿平行于所述衬底基板的第一边缘方向的长度之和。
在一些实施例中，如图3所示，所述第二区域20设置有多个沿平行于衬底基板的第二边缘方向、且间隔布置的第二凹槽，该第二凹槽可选为矩形。
在一些实施例中，由于第一区域10中的第一导电子走线31沿平行于衬底基板的第一边缘方向布置在层间绝缘层1上，布置较稀疏，线宽较小，且相邻第一导电子走线31之间的间距较小；而第二区域20中的第二导电子走线32倾斜布置在层间绝缘层1上，排线密度较大，线宽以及相邻第二导电子 走线32之间的间距均较大，为保证第二导电子走线32尽可能多地被第二凹槽覆盖，该第二凹槽的宽度大于所述第一凹槽的宽度，该第二凹槽的高度大于所述第一凹槽的高度。
另一具体实施例中，如图5-图7所示，第一绝缘层为层间绝缘层1，第二绝缘层为平坦层3，导电走线为源漏金属走线2，在层间绝缘层1与平坦层3接触的表面设有多个平行排布的条状的凹槽4，这样可以增加层间绝缘层1与平坦层3之间的接触面积，使得在进行显示器信赖性整机跌落测试过程中，平坦层3不容易脱落。
如图5所示，条状的凹槽4的延伸方向可与衬底基板的第二边缘平行。在一些实施例中，第一区域10中设置有多个平行于所述衬底基板的第二边缘、且间隔布置的条状的第三凹槽，该第三凹槽的高度h为300um～500um，宽度w为30mm；第二区域20中设置有多个平行于所述衬底基板的第二边缘、且间隔布置的条状的第四凹槽，该第四凹槽的高度h为300um～500um，宽度w为60mm。
在一些实施例中，如图7所示，条状的凹槽4的延伸方向可与衬底基板的边缘成一定角度。在一些实施例中，第一区域10包括第三子区域101和第四子区域102，第三子区域101设置有多个延伸方向与衬底基板的第一边缘成第三角度、且间隔布置的条状的第五凹槽，第四子区域102设置有延伸方向与衬底基板的第一边缘成第四角度、且间隔布置的条状的第六凹槽，该第三角度与该第四角度的绝对值相等，该第五凹槽和第六凹槽的高度h为1mm，宽度w为500um～800um。第二区域20间隔设置有多个平行于衬底基板的第二边缘、且间隔布置的条状的第七凹槽，该第七凹槽的高度h为300um～500um，宽度w为60mm。
在一些实施例中，凹槽4的形状除了如图4中的矩形以及图5、7中的条状外，还可以为其他任意形状。
本公开实施例还提供了一种显示装置，包括如上所述的显示基板。该显示装置包括但不限于：射频单元、网络模块、音频输出单元、输入单元、传感器、显示单元、用户输入单元、接口单元、存储器、处理器、以及电源等部件。本领域技术人员可以理解，上述显示装置的结构并不构成对显示装置的 限定，显示装置可以包括上述更多或更少的部件，或者组合某些部件，或者不同的部件布置。在本公开实施例中，显示装置包括但不限于显示器、手机、平板电脑、电视机、可穿戴电子设备、导航显示设备等。
所述显示装置可以为：液晶电视、液晶显示器、数码相框、手机、平板电脑等任何具有显示功能的产品或部件，其中，所述显示装置还包括柔性电路板、印刷电路板和背板。
本公开实施例还提供了一种显示基板的制作方法，包括：
在衬底基板上形成表面凹凸不平的第一绝缘层；
在所述第一绝缘层上形成导电走线；
形成覆盖所述导电走线的第二绝缘层。
本实施例中，第一绝缘层朝向第二绝缘层一侧表面的至少部分区域为凹凸不平的，这样能够增加第一绝缘层与第二绝缘层的接触面积，进而增加第一绝缘层与第二绝缘层之间的结合力，避免发生膜层脱落现象，能够提高显示基板的信赖性。
其中，可以是第一绝缘层朝向第二绝缘层一侧表面的全部区域为凹凸不平的，也可以是第一绝缘层朝向第二绝缘层一侧表面的部分区域为凹凸不平的，均可以增加第一绝缘层与第二绝缘层的接触面积，进而增加第一绝缘层与第二绝缘层之间的结合力。
由于走线区的走线密度较大，易发生膜层脱落现象，因此，第一绝缘层朝向第二绝缘层一侧表面位于走线区的部分最好是凹凸不平的，即所述至少部分区域位于所述显示基板的走线区。
一具体实施例中，所述第一绝缘层可以为层间绝缘层，所述第二绝缘层可以为平坦层，所述导电走线可以为源漏金属走线。当然，第一绝缘层并不局限为层间绝缘层，第二绝缘层并不绝限为平坦层，导电走线也不局限为源漏金属走线，还可以为其他膜层和其他信号线。
一具体实施例中，所述第一绝缘层朝向所述第二绝缘层的一侧表面可以设有多个阵列排布的凹槽，通过多个阵列排布的凹槽使得第一绝缘层朝向第二绝缘层一侧表面为凹凸不平的。
另一具体实施例中，所述第一绝缘层朝向所述第二绝缘层的一侧表面可 以设有多个相互平行的条状凹槽，通过多个平行排布的条状凹槽使得第一绝缘层朝向第二绝缘层一侧表面为凹凸不平的。
具体地，所述在衬底基板上形成表面凹凸不平的第一绝缘层包括：
如图8所示，在所述衬底基板上形成第一绝缘材料层5，在所述第一绝缘材料层5上涂覆光刻胶6；利用半色调掩膜板7对所述光刻胶6进行曝光，所述半色调掩膜板7包括对应所述第一绝缘层的过孔区的透光区73、对应所述第一绝缘层的凹槽的部分透光区72和对应所述第一绝缘层其他区域的遮光区71；其中，第一绝缘层的过孔区可以位于显示基板的显示区或走线区，第一绝缘层的凹槽可以仅位于走线区，也可以同时位于显示基板的显示区和走线区；
如图9所示，显影后形成光刻胶完全保留区域A、光刻胶部分保留区域B和光刻胶去除区域C；
如图10所示，对光刻胶去除区域C的所述第一绝缘材料层5进行刻蚀，形成贯穿所述第一绝缘层的过孔；去除光刻胶部分保留区域的光刻胶；
如图11所示，对光刻胶部分保留区域B的所述第一绝缘材料层5进行刻蚀，形成所述第一绝缘层表面的凹槽；
之后，去除光刻胶完全保留区域A的光刻胶。
通过上述步骤即可在第一绝缘层朝向第二绝缘层一侧表面形成凹槽。
当然，本公开的技术方案并不局限于通过凹槽使得第一绝缘层朝向第二绝缘层一侧表面为凹凸不平的，还可以在第一绝缘层朝向第二绝缘层的一侧表面设置多个凸起，使得第一绝缘层朝向第二绝缘层一侧表面为凹凸不平的。另外，第一绝缘层朝向第二绝缘层一侧表面的凹槽并不必须是规则排布的，也可以是不规则排布的。
一具体实施例中，所述第一绝缘层包括层叠设置的第一绝缘膜层和第二绝缘膜层，所述第二绝缘膜层位于所述衬底基板和所述第一绝缘膜层之间，由于需要通过刻蚀工艺形成凹槽，而第一绝缘膜层与第二绝缘膜层的材料不同，适用的刻蚀工艺参数不同，对第一绝缘膜层和第二绝缘膜层同时进行刻蚀不容易控制，因此，可选仅在第一绝缘膜层的范围内形成凹槽，即所述凹槽的深度不超过所述第一绝缘膜层的厚度。
具体地，所述凹槽的深度可以等于所述第一绝缘膜层的厚度。
凹槽的深度越大，则第一绝缘层与第二绝缘层之间的接触面积越大，但同时第一绝缘层表面的凹凸程度变大，形成在第一绝缘层上的导电走线的长度也会增加，会导致导电走线的电阻变大，因此，凹槽的深度也不宜过大，可选地，所述凹槽的深度可以为所述第一绝缘层的厚度的三分之一至二分之一，这样可以兼顾第一绝缘层与第二绝缘层之间的接触面积以及导电走线的导电性能。
一具体实施例中，如图3和图4所示，第一绝缘层为层间绝缘层1，第二绝缘层为平坦层3，导电走线为源漏金属走线2，在层间绝缘层1与平坦层3接触的表面设有多个阵列排布的凹槽4，这样可以增加层间绝缘层1与平坦层3之间的接触面积，使得在进行显示器信赖性整机跌落测试过程中，平坦层3不容易脱落。
另一具体实施例中，如图5-图7所示，第一绝缘层为层间绝缘层1，第二绝缘层为平坦层3，导电走线为源漏金属走线2，在层间绝缘层1与平坦层3接触的表面设有多个平行排布的条状的凹槽4，这样可以增加层间绝缘层1与平坦层3之间的接触面积，使得在进行显示器信赖性整机跌落测试过程中，平坦层3不容易脱落。
如图5所示，条状的凹槽4的延伸方向可与衬底基板的第二边缘平行；或者如图7所示，条状的凹槽4的延伸方向可与衬底基板的边缘成一定角度。
在一些实施例中，凹槽4的形状除了如图4中的矩形以及图5、7中的条状外，还可以为其他任意形状。
需要说明，本说明书中的各个实施例均采用递进的方式描述，各个实施例之间相同相似的部分互相参见即可，每个实施例重点说明的都是与其他实施例的不同之处。尤其，对于实施例而言，由于其基本相似于产品实施例，所以描述得比较简单，相关之处参见产品实施例的部分说明即可。
除非另外定义，本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元 件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
可以理解，当诸如层、膜、区域或基板之类的元件被称作位于另一元件“上”或“下”时，该元件可以“直接”位于另一元件“上”或“下”，或者可以存在中间元件。
在上述实施方式的描述中，具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。
以上所述，仅为本公开的具体实施方式，但本公开的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本公开揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本公开的保护范围之内。因此，本公开的保护范围应以所述权利要求的保护范围为准。

Claims (20)

  1. 一种显示基板，所述显示基板包括位于衬底基板上的第一绝缘层，位于所述第一绝缘层远离所述衬底基板一侧的导电走线，位于所述导电走线远离所述衬底基板一侧的第二绝缘层，所述第一绝缘层朝向所述第二绝缘层一侧表面的至少部分区域为凹凸不平的。
  2. 根据权利要求1所述的显示基板，其中，所述第一绝缘层为层间绝缘层，所述第二绝缘层为平坦层，所述导电走线为源漏金属走线。
  3. 根据权利要求1所述的显示基板，其中，所述至少部分区域位于所述显示基板的走线区，所述导电走线布置在所述走线区。
  4. 根据权利要求3所述的显示基板，其中，所述走线区包括第一区域和第二区域，所述导电走线包括第一导电子走线和第二导电子走线，所述第一导电子走线沿平行于衬底基板的第一边缘方向布置在所述第一区域，所述第二导电子走线沿与衬底基板的第一边缘成第一角度的方向布置在所述第二区域。
  5. 根据权利要求4所述的显示基板，其中，每个所述第一导电子走线处均对应设置有多个间隔布置的第一凹槽。
  6. 根据权利要求5所述的显示基板，其中，所述第一凹槽为矩形。
  7. 根据权利要求6所述的显示基板，其中，所述第一凹槽的高度为800um～1000um，宽度为500um～800um，相邻所述第一凹槽之间的间距为100um。
  8. 根据权利要求5所述的显示基板，其中，所述第二区域设置有多个沿平行于衬底基板的第二边缘方向、且间隔布置的第二凹槽。
  9. 根据权利要求8所述的显示基板，其中，所述第二凹槽为矩形。
  10. 根据权利要求9所述的显示基板，其中，所述第二凹槽的宽度大于所述第一凹槽的宽度，所述第二凹槽的高度大于所述第一凹槽的高度。
  11. 根据权利要求4所述的显示基板，其中，所述第一区域设置有多个平行于所述衬底基板的第二边缘、且间隔布置的条状的第三凹槽，所述第二区域设置有多个平行于所述衬底基板的第二边缘、且间隔布置的条状的第四凹槽。
  12. 根据权利要求11所述的显示基板，其中，所述第三凹槽的高度为300um～500um，宽度为30mm，所述第四凹槽的高度为300um～500um，宽度为60mm。
  13. 根据权利要求4所述的显示基板，其中，所述第一区域包括第三子区域和第四子区域，所述第三子区域设置有多个延伸方向与衬底基板的第一边缘成第三角度、且间隔布置的条状的第五凹槽，所述第四子区域设置有延伸方向与衬底基板的第一边缘成第四角度、且间隔布置的条状的第六凹槽，该第三角度与该第四角度的绝对值相等，所述第二区域设置有多个平行于所述衬底基板的第二边缘、且间隔布置的条状的第七凹槽。
  14. 根据权利要求13所述的显示基板，其中，所述第五凹槽和所述第六凹槽的高度为1mm，宽度为500um～800um，所述第七凹槽的高度为300um～500um，宽度为60mm。
  15. 根据权利要求5-14中任一项所述的显示基板，其中，所述第一绝缘层包括层叠设置的第一绝缘膜层和第二绝缘膜层，所述第二绝缘膜层位于所述衬底基板和所述第一绝缘膜层之间，所述凹槽的深度不超过所述第一绝缘膜层的厚度。
  16. 根据权利要求15所述的显示基板，其中，所述凹槽的深度等于所述第一绝缘膜层的厚度。
  17. 根据权利要求5-14中任一项所述的显示基板，其中，所述凹槽的深度为所述第一绝缘层的厚度的三分之一至二分之一。
  18. 一种显示装置，包括如权利要求1-17中任一项所述的显示基板。
  19. 一种显示基板的制作方法，包括：
    在衬底基板上形成表面凹凸不平的第一绝缘层；
    在所述第一绝缘层上形成导电走线；
    形成覆盖所述导电走线的第二绝缘层。
  20. 根据权利要求19所述的显示基板的制作方法，其中，所述在衬底基板上形成表面凹凸不平的第一绝缘层包括：
    在所述衬底基板上形成第一绝缘材料层；
    在所述第一绝缘材料层上涂覆光刻胶；
    利用半色调掩膜板对所述光刻胶进行曝光，所述半色调掩膜板包括对应所述第一绝缘层的过孔区的透光区、对应所述第一绝缘层的凹槽的部分透光区和对应所述第一绝缘层其他区域的遮光区；
    显影后形成光刻胶完全保留区域、光刻胶部分保留区域和光刻胶去除区域；
    对光刻胶去除区域的所述第一绝缘材料层进行刻蚀，形成贯穿所述第一绝缘层的过孔；
    去除光刻胶部分保留区域的光刻胶；
    对光刻胶部分保留区域的所述第一绝缘材料层进行刻蚀，形成所述第一绝缘层表面的凹槽；
    去除光刻胶完全保留区域的光刻胶。
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