WO2020238047A1 - 基板及制备方法、液晶显示面板 - Google Patents

基板及制备方法、液晶显示面板 Download PDF

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Publication number
WO2020238047A1
WO2020238047A1 PCT/CN2019/117429 CN2019117429W WO2020238047A1 WO 2020238047 A1 WO2020238047 A1 WO 2020238047A1 CN 2019117429 W CN2019117429 W CN 2019117429W WO 2020238047 A1 WO2020238047 A1 WO 2020238047A1
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Prior art keywords
film layer
substrate
groove
layer
liquid crystal
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Ceased
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PCT/CN2019/117429
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English (en)
French (fr)
Inventor
俞云
张稚敏
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TCL China Star Optoelectronics Technology Co Ltd
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TCL China Star Optoelectronics Technology Co Ltd
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Publication of WO2020238047A1 publication Critical patent/WO2020238047A1/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H10D86/0212—Manufacture or treatment of multiple TFTs comprising manufacture, treatment or coating of substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/411—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by materials, geometry or structure of the substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

Definitions

  • This application relates to the field of display technology, in particular to a substrate, a preparation method, and a liquid crystal display panel.
  • some functional film layers such as alignment film layer, organic insulating photoresist layer, color resist layer, support column, etc., need to be prepared on the existing film layer by coating process. If the film layer uses material viscosity It is relatively low and easy to flow. After these functional films are formed, problems such as uneven film thickness may easily occur at the edges of the film, resulting in uneven display around the periphery, which seriously affects the display quality of the display device.
  • the prior art has provided a convex retaining wall 11 in the non-display area, but the film material will accumulate at the position of the convex retaining wall 11 or block reflow, causing uneven film thickness at the edge of the film. .
  • the existing coating technology has the technical problem of uneven thickness of the film layer edge, which needs to be improved.
  • the present application provides a substrate, a preparation method, and a liquid crystal display panel, so as to alleviate the technical problem of uneven thickness of the film layer in the prior coating technology.
  • An embodiment of the present application provides a substrate, which includes:
  • the second film layer is coated on the coating area of the first film layer
  • the first film layer is formed with a groove.
  • the groove penetrates the first film layer.
  • the depth of the groove is greater than half of the thickness of the first film layer.
  • the edge area is located in the non-display area.
  • the groove is a continuous groove or a discontinuous groove.
  • the groove is a dot groove or a block groove.
  • the grooves are one or more rows.
  • the substrate is a color filter substrate
  • the first film layer is a transparent conductive layer
  • the second film layer is an alignment film layer
  • the substrate is an array substrate
  • the first film layer is one of a light shielding layer, a supporting column, a color resist layer, and a pixel electrode
  • the second film layer is an alignment film One of layer, organic insulating photoresist layer, support column, and color resist layer.
  • An embodiment of the application provides a liquid crystal display panel, which includes a substrate, and the substrate includes:
  • the second film layer is coated on the coating area of the first film layer
  • the first film layer is formed with a groove.
  • the groove penetrates the first film layer.
  • the depth of the groove is greater than half of the thickness of the first film layer.
  • the edge area is located in the non-display area.
  • the groove is a continuous groove or a discontinuous groove.
  • the groove is a dot groove or a block groove.
  • the grooves are one or more rows.
  • the substrate is a color filter substrate
  • the first film layer is a transparent conductive layer
  • the second film layer is an alignment film layer
  • the substrate is an array substrate
  • the first film layer is one of a light shielding layer, a support column, a color resist layer, and a pixel electrode
  • the second film layer is One of the alignment film layer, the organic insulating photoresist layer, the support column, and the color resist layer.
  • the embodiment of the present application provides a method for preparing a substrate, which includes:
  • a second film layer is coated in the coating area.
  • the step of forming grooves includes: forming the grooves in one or more rows.
  • the present application provides a substrate, a preparation method, and a liquid crystal display panel.
  • the substrate includes a first film layer, a second film layer, and is coated on a coating area of the first film layer.
  • the first film layer is formed with grooves; in the present application, the grooves formed based on the first film layer can buffer the fluid-like second film layer from spreading out or accumulate on the edge to increase the edge film thickness At the same time, there will be no accumulation or blocking of reflow in the area of the groove, which further improves the uniformity of the edge film thickness and alleviates the uneven thickness of the film edge in the existing coating technology. problem.
  • FIG. 1 is a schematic diagram of the structure of an existing substrate.
  • FIG. 2 is a schematic diagram of the first structure of a substrate provided by an embodiment of the application.
  • FIG. 3 is a schematic diagram of a second structure of a substrate provided by an embodiment of the application.
  • FIG. 4 is a schematic diagram of the arrangement of the groove provided by the embodiment of the application.
  • 5 to 9 are schematic flow diagrams of a substrate preparation method provided by embodiments of the application.
  • the embodiment of the present application can alleviate the technical problem of uneven thickness of the film layer edge in the existing coating technology.
  • the substrate 20 provided in the present application includes:
  • Substrate 201 such as glass substrate, flexible substrate, etc.
  • the first film layer 202 The first film layer 202;
  • the second film layer 203 is coated on the coating area TA of the first film layer 202;
  • the first film layer 202 is formed with a groove 204.
  • This embodiment provides a substrate, which includes a first film layer, a second film layer, and is coated on a coating area of the first film layer, wherein, at the edge area of the coating area, the first film layer A film layer is formed with grooves; in this embodiment, based on the grooves formed by the first film layer, the second film layer in the form of a fluid can be buffered to diffuse outward or accumulate on the edge, improving the uniformity of the edge film thickness, and at the same time In the area where the grooves are provided, no phenomena such as accumulation or blocking of reflow will occur, which further improves the uniformity of the edge film thickness and alleviates the technical problem of uneven film edge thickness in the existing coating technology.
  • the groove 204 penetrates through the first film layer 202.
  • the first film layer 202 is not a light-shielding layer, so as to avoid light leakage at the position of the groove 204 or a metal layer. Reflective.
  • the depth of the groove 204 is greater than half of the thickness of the first film 202.
  • the depth of the groove 204 is greater than half of the thickness of the first film layer 202 and less than two-thirds of the thickness of the first film layer 202.
  • the edge area BA is located in the non-display area NA, so that the display effect of the display area AA is not affected.
  • the groove is a continuous groove 2041 or a discontinuous groove 2042.
  • the groove is a dot-shaped groove 2043 or a block-shaped groove 2044.
  • the grooves 204 have multiple rows.
  • the grooves are in a row to simplify design complexity.
  • the substrate is a color filter substrate
  • the first film layer is a transparent conductive layer
  • the second film layer is an alignment film layer
  • the substrate is an array substrate
  • the first film layer is one of a light-shielding layer, a support column, a color resist layer, and a pixel electrode
  • the second film layer is an alignment film layer, an organic insulating light One of the resist layer, support column, and color resist layer.
  • the material of the transparent conductive layer may be indium tin oxide, indium zinc oxide, aluminum zinc oxide, or the like.
  • the material of the pixel electrode layer may be a copper-molybdenum laminate, a copper-molybdenum-titanium laminate, a copper-titanium laminate, an aluminum-molybdenum laminate, a copper-niobium alloy, a nickel-chromium alloy, and the like.
  • the substrate preparation method provided in the embodiment of the present application includes the following steps:
  • a substrate 201 is provided.
  • the substrate 201 may be a glass substrate, a flexible substrate, etc., and is subjected to processing such as cleaning.
  • a first film layer 202 is formed on the substrate 201.
  • the substrate is a color filter substrate
  • the first film layer 202 is a transparent conductive layer.
  • the substrate is an array substrate
  • the first film layer is one of a light-shielding layer, a supporting column, a color resist layer, and a pixel electrode.
  • the edge area BA surrounding the coating area of the first film layer 202 is processed to form a groove 204.
  • a process such as photolithography may be used to process the edge area BA of the coating area of the first film layer 202 to form the groove 204.
  • the groove formed in this step penetrates the first film layer.
  • the depth of the groove formed in this step is greater than half of the thickness of the first film layer.
  • the edge area is located in a non-display area.
  • the groove formed in this step is a continuous groove or a discontinuous groove.
  • the groove formed in this step is a dot groove or a block groove.
  • the grooves formed in this step are one or more rows.
  • the film layer material of the second film layer 203 is coated in the coating area.
  • the substrate is a color filter substrate
  • the second film layer is an alignment film layer
  • the substrate is an array substrate
  • the second film layer is one of an alignment film layer, an organic insulating photoresist layer, a support column, and a color resist layer, and is combined with the first film layer 202.
  • the film layer is different.
  • the second film layer is formed.
  • the embodiment of the present application further provides a liquid crystal display panel, the liquid crystal display panel including a substrate, the substrate including:
  • the second film layer is coated on the coating area of the first film layer
  • the first film layer is formed with a groove.
  • the substrate of the liquid crystal display panel includes a first film layer and a second film layer, which are coated on the coating area of the first film layer, wherein, in the coating area In the edge area of the first film layer, the first film layer is formed with grooves; in this application, the grooves formed based on the first film layer can buffer the fluid-like second film layer from spreading out or accumulate on the edge, thereby improving the edge film Thick uniformity, and at the same time, there will be no accumulation or blocking of reflow in the recessed area, which further improves the uniformity of the edge film thickness and provides the display quality of the liquid crystal display panel.
  • the groove penetrates the first film layer.
  • the depth of the groove is greater than half of the thickness of the first film layer.
  • the edge area is located in the non-display area.
  • the groove is a continuous groove or a discontinuous groove.
  • the groove is a dot groove or a block groove.
  • the grooves are one or more rows.
  • the substrate is a color filter substrate
  • the first film layer is a transparent conductive layer
  • the second film layer is an alignment film layer
  • the substrate is an array substrate
  • the first film layer is one of a light shielding layer, a supporting column, a color resist layer, and a pixel electrode
  • the second film layer is one of an alignment film layer, an organic insulating photoresist layer, a supporting column, and a color resist layer.
  • the embodiment of the present application further provides a liquid crystal display device, the liquid crystal display device includes a liquid crystal display panel, and the substrate of the liquid crystal display panel includes:
  • the second film layer is coated on the coating area of the first film layer
  • the first film layer is formed with a groove.
  • the liquid crystal display device includes a liquid crystal display panel, the substrate of the liquid crystal display panel includes a first film layer, a second film layer, coated on the coating area of the first film layer , Wherein, in the edge area of the coating area, the first film layer is formed with a groove; in this application, the groove formed based on the first film layer can buffer the fluid-like second film layer outward Diffusion or accumulation on the edge improves the uniformity of the edge film thickness. At the same time, there is no accumulation or blocking of reflow in the recessed area, which further improves the uniformity of the edge film thickness and provides the display quality of the liquid crystal display device. .
  • the groove penetrates the first film layer.
  • the depth of the groove is greater than half of the thickness of the first film layer.
  • the edge area is located in a non-display area.
  • the groove is a continuous groove or a discontinuous groove.
  • the groove is a dot-shaped groove or a block-shaped groove.
  • the grooves are one or more rows.
  • the substrate is a color filter substrate
  • the first film layer is a transparent conductive layer
  • the second film layer is an alignment film layer
  • the substrate is an array substrate
  • the first film layer is one of a light shielding layer, a supporting column, a color resist layer, and a pixel electrode
  • the second film layer is one of an alignment film layer, an organic insulating photoresist layer, a supporting column, and a color resist layer.
  • the present application provides a substrate and a preparation method, a liquid crystal display panel and a device.
  • the substrate includes a first film layer, a second film layer, and is coated on a coating area of the first film layer, wherein In the edge area of the region, the first film layer is formed with grooves; in this application, the grooves formed based on the first film layer can buffer the fluid-like second film layer from spreading out or accumulate on the edge to lift the edge The uniformity of the film thickness. At the same time, there will be no accumulation or blocking of reflow in the recessed area, which further improves the uniformity of the edge film thickness and alleviates the uneven thickness of the film edge in the existing coating technology. technical problem.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
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  • Laminated Bodies (AREA)

Abstract

一种基板及制备方法、液晶显示面板，该基板（20）包括第一膜层（202），第二膜层（203），涂布在所述第一膜层（202）的涂布区域（TA），其中，在所述涂布区域（TA）的边缘区域（BA），所述第一膜层（202）形成有凹槽（204）；基于第一膜层（202）形成的凹槽（204），能缓冲流体状的第二膜层（203）向外扩散或者在边缘堆积，提升边缘膜厚的均匀性，不会出现堆积或者阻挡回流等现象。

Description

基板及制备方法、液晶显示面板 技术领域
本申请涉及显示技术领域，尤其涉及一种基板及制备方法、液晶显示面板。
 背景技术
在显示面板制备工艺中，有些功能膜层，如配向膜层、有机绝缘光阻层、色阻层、支撑柱等，需要使用涂布工艺在已有膜层上制备，如果膜层使用材料粘度较低以及易流动，这些功能膜层成膜后，膜层边缘容易出现膜厚不均等问题，从而导致周边的显示不均，严重影响显示装置的显示品质。
为了解决这个问题，如图1所示，现有技术在非显示区设置外凸挡墙11，但是膜层材料会在外凸挡墙11的位置堆积或者阻挡回流，引起膜层边缘膜厚不均。
即，现有涂布技术存在膜层边缘厚度不均的技术问题，需要改进。
 技术问题
本申请提供一种基板及制备方法、液晶显示面板，以缓解现有涂布技术存在的膜层边缘厚度不均的技术问题。
 技术解决方案
为解决上述问题，本申请提供的技术方案如下：
本申请实施例提供一种基板，其包括：
第一膜层；
第二膜层，涂布在所述第一膜层的涂布区域；
其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽。
在本申请实施例提供的基板中，所述凹槽贯穿所述第一膜层。
在本申请实施例提供的基板中，所述凹槽的深度大于所述第一膜层厚度的一半。
在本申请实施例提供的基板中，所述边缘区域位于非显示区内。
在本申请实施例提供的基板中，所述凹槽为连续凹槽，或者不连续凹槽。
在本申请实施例提供的基板中，所述凹槽为点状凹槽，或者块状凹槽。
在本申请实施例提供的基板中，所述凹槽为一行或者多行。
在本申请实施例提供的基板中，所述基板为彩膜基板，所述第一膜层为透明导电层，所述第二膜层为配向膜层。
在本申请实施例提供的基板中，所述基板为阵列基板，所述第一膜层为遮光层、支撑柱、色阻层、像素电极中的一种，所述第二膜层为配向膜层、有机绝缘光阻层、支撑柱、色阻层中的一种。
本申请实施例提供一种液晶显示面板，其包括基板，所述基板包括：
第一膜层；
第二膜层，涂布在所述第一膜层的涂布区域；
其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽。
在本申请实施例提供的液晶显示面板中，所述凹槽贯穿所述第一膜层。
在本申请实施例提供的液晶显示面板中，所述凹槽的深度大于所述第一膜层厚度的一半。
在本申请实施例提供的液晶显示面板中，所述边缘区域位于非显示区内。
在本申请实施例提供的液晶显示面板中，所述凹槽为连续凹槽，或者不连续凹槽。
在本申请实施例提供的液晶显示面板中，所述凹槽为点状凹槽，或者块状凹槽。
在本申请实施例提供的液晶显示面板中，所述凹槽为一行或者多行。
在本申请实施例提供的液晶显示面板中，所述基板为彩膜基板，所述第一膜层为透明导电层，所述第二膜层为配向膜层。
在本申请实施例提供的液晶显示面板中，所述基板为阵列基板，所述第一膜层为遮光层、支撑柱、色阻层、像素电极中的一种，所述第二膜层为配向膜层、有机绝缘光阻层、支撑柱、色阻层中的一种。
本申请实施例提供一种基板制备方法，其包括：
提供一衬底；
在所述衬底上形成第一膜层；
对所述第一膜层围绕涂布区域的边缘区域进行处理，形成凹槽；
在所述涂布区域内涂布第二膜层。
在本申请实施例提供的基板制备方法中，所述形成凹槽的步骤包括：形成的所述凹槽为一行或者多行。
 有益效果
本申请提供一种基板及制备方法、液晶显示面板，该基板包括第一膜层，第二膜层，涂布在所述第一膜层的涂布区域，其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽；在本申请中，基于第一膜层形成的凹槽，能缓冲流体状的第二膜层向外扩散或者在边缘堆积，提升边缘膜厚的均匀性，同时在凹槽的设置区域，不会出现堆积或者阻挡回流等现象，进一步提升边了缘膜厚的均匀性，缓解了现有涂布技术存在的膜层边缘厚度不均的技术问题。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为现有基板的结构示意图。
图2为本申请实施例提供的基板的第一种结构示意图。
图3为本申请实施例提供的基板的第二种结构示意图。
图4为本申请实施例提供的凹槽的设置示意图。
图5至图9为本申请实施例提供的基板制备方法的流程示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
针对现有涂布技术存在的膜层边缘厚度不均的技术问题，本申请实施例可以缓解。
在一种实施例中，如图2所示，本申请提供的基板20包括：
衬底201，如玻璃衬底、柔性衬底等；
第一膜层202；
第二膜层203，涂布在所述第一膜层202的涂布区域TA；
其中，在所述涂布区域TA的边缘区域BA，所述第一膜层202形成有凹槽204。
本实施例提供一种基板，该基板包括第一膜层，第二膜层，涂布在所述第一膜层的涂布区域，其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽；在本实施例中，基于第一膜层形成的凹槽，能缓冲流体状的第二膜层向外扩散或者在边缘堆积，提升边缘膜厚的均匀性，同时在凹槽的设置区域，不会出现堆积或者阻挡回流等现象，进一步提升了边缘膜厚的均匀性，缓解了现有涂布技术存在的膜层边缘厚度不均的技术问题。
在一种实施例中，如图2所示，所述凹槽204贯穿所述第一膜层202，此时第一膜层202不是遮光层，以避免凹槽204的位置漏光，或者金属层反光。
在一种实施例中，如图3所示，所述凹槽204的深度大于所述第一膜层202厚度的一半。
在一种实施例中，所述凹槽204的深度大于所述第一膜层202厚度的一半，小于所述第一膜层202厚度的三分之二。
在一种实施例中，如图3所示，所述边缘区域BA位于非显示区NA内，这样就不会影响显示区AA的显示效果。
在一种实施例中，如图4所示，所述凹槽为连续凹槽2041，或者不连续凹槽2042。
在一种实施例中，如图4所示，所述凹槽为点状凹槽2043，或者块状凹槽2044。
在一种实施例中，如图4所示，所述凹槽204为多行。
在一种实施例中，所述凹槽为一行，以简化设计复杂度。
在一种实施例中，所述基板为彩膜基板，所述第一膜层为透明导电层，所述第二膜层为配向膜层。
在一种实施例中，所述基板为阵列基板，第一膜层为遮光层、支撑柱、色阻层、像素电极中的一种，所述第二膜层为配向膜层、有机绝缘光阻层、支撑柱、色阻层中的一种。
在一种实施例中，透明导电层的材料可以为氧化铟锡、氧化铟锌、氧化铝锌等。
在一种实施例中，像素电极层的材料可以是铜钼叠层、铜钼钛叠层、铜钛叠层，铝钼叠层，铜铌合金、镍铬合金等。
在一种实施例中，为了制备得到图2所示的基板，如图5所示，本申请实施例提供的基板制备方法包括以下步骤：
如图5所示，提供一衬底201。
衬底201可以是玻璃基板、柔性基板等，并进行清洗等处理。
如图6所示，在所述衬底201上形成第一膜层202。
在一种实施例中，所述基板为彩膜基板，所述第一膜层202为透明导电层。
在一种实施例中，所述基板为阵列基板，所述第一膜层为遮光层、支撑柱、色阻层、像素电极中的一种。
如图7所示，对所述第一膜层202围绕涂布区域的边缘区域BA进行处理，形成凹槽204。
在一种实施例中，可以使用光刻等工艺，对所述第一膜层202涂布区域的边缘区域BA进行处理，形成凹槽204。
在一种实施例中，本步骤形成的所述凹槽贯穿所述第一膜层。
在一种实施例中，本步骤形成的所述凹槽的深度大于所述第一膜层厚度的一半。
在一种实施例中，所述边缘区域位于非显示区内。
在一种实施例中，本步骤形成的所述凹槽为连续凹槽，或者不连续凹槽。
在一种实施例中，本步骤形成的所述凹槽为点状凹槽，或者块状凹槽。
在一种实施例中，本步骤形成的所述凹槽为一行或者多行。
如图8所示，在所述涂布区域内涂布第二膜层203的膜层材料。
在一种实施例中，所述基板为彩膜基板，所述第二膜层为配向膜层。
在一种实施例中，所述基板为阵列基板，所述第二膜层为配向膜层、有机绝缘光阻层、支撑柱、色阻层中的一种，且与第一膜层202的膜层不同。
如图9所示，第二膜层203的膜层材料流动固化后，形成所述第二膜层。
在一种实施例中，本申请实施例还提供了一种液晶显示面板，该液晶显示面板包括基板，该基板包括：
第一膜层；
第二膜层，涂布在所述第一膜层的涂布区域；
其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽。
本实施例提供了一种液晶显示面板，该液晶显示面板的基板包括第一膜层，第二膜层，涂布在所述第一膜层的涂布区域，其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽；在本申请中，基于第一膜层形成的凹槽，能缓冲流体状的第二膜层向外扩散或者在边缘堆积，提升边缘膜厚的均匀性，同时在凹槽的设置区域，不会出现堆积或者阻挡回流等现象，进一步提升了边缘膜厚的均匀性，提供了液晶显示面板的显示品质。
在一种实施例中，在本申请实施例提供的液晶显示面板中，所述凹槽贯穿所述第一膜层。
在一种实施例中，在本申请实施例提供的液晶显示面板中，所述凹槽的深度大于所述第一膜层厚度的一半。
在一种实施例中，在本申请实施例提供的液晶显示面板中，所述边缘区域位于非显示区内。
在一种实施例中，在本申请实施例提供的液晶显示面板中，所述凹槽为连续凹槽，或者不连续凹槽。
在一种实施例中，在本申请实施例提供的液晶显示面板中，所述凹槽为点状凹槽，或者块状凹槽。
在一种实施例中，在本申请实施例提供的液晶显示面板中，所述凹槽为一行或者多行。
在一种实施例中，在本申请实施例提供的液晶显示面板中，所述基板为彩膜基板，所述第一膜层为透明导电层，所述第二膜层为配向膜层。
在一种实施例中，在本申请实施例提供的液晶显示面板中，所述基板为阵列基板，所述第一膜层为遮光层、支撑柱、色阻层、像素电极中的一种，所述第二膜层为配向膜层、有机绝缘光阻层、支撑柱、色阻层中的一种。
在一种实施例中，本申请实施例还提供了一种液晶显示装置，该液晶显示装置包括液晶显示面板，该液晶显示面板的基板包括：
第一膜层；
第二膜层，涂布在所述第一膜层的涂布区域；
其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽。
本实施例提供了一种液晶显示装置，该液晶显示装置包括液晶显示面板，该液晶显示面板的基板包括第一膜层，第二膜层，涂布在所述第一膜层的涂布区域，其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽；在本申请中，基于第一膜层形成的凹槽，能缓冲流体状的第二膜层向外扩散或者在边缘堆积，提升边缘膜厚的均匀性，同时在凹槽的设置区域，不会出现堆积或者阻挡回流等现象，进一步提升了边缘膜厚的均匀性，提供了液晶显示装置的显示品质。
在一种实施例中，在本申请实施例提供的液晶显示装置中，所述凹槽贯穿所述第一膜层。
在一种实施例中，在本申请实施例提供的液晶显示装置中，所述凹槽的深度大于所述第一膜层厚度的一半。
在一种实施例中，在本申请实施例提供的液晶显示装置中，所述边缘区域位于非显示区内。
在一种实施例中，在本申请实施例提供的液晶显示装置中，所述凹槽为连续凹槽，或者不连续凹槽。
在一种实施例中，在本申请实施例提供的液晶显示装置中，所述凹槽为点状凹槽，或者块状凹槽。
在一种实施例中，在本申请实施例提供的液晶显示装置中，所述凹槽为一行或者多行。
在一种实施例中，在本申请实施例提供的液晶显示装置中，所述基板为彩膜基板，所述第一膜层为透明导电层，所述第二膜层为配向膜层。
在一种实施例中，在本申请实施例提供的液晶显示装置中，所述基板为阵列基板，所述第一膜层为遮光层、支撑柱、色阻层、像素电极中的一种，所述第二膜层为配向膜层、有机绝缘光阻层、支撑柱、色阻层中的一种。
根据上述实施例可知：
本申请提供一种基板及制备方法、液晶显示面板及装置，该基板包括第一膜层，第二膜层，涂布在所述第一膜层的涂布区域，其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽；在本申请中，基于第一膜层形成的凹槽，能缓冲流体状的第二膜层向外扩散或者在边缘堆积，提升边缘膜厚的均匀性，同时在凹槽的设置区域，不会出现堆积或者阻挡回流等现象，进一步提升了边缘膜厚的均匀性，缓解了现有涂布技术存在的膜层边缘厚度不均的技术问题。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种基板，其包括：
    第一膜层；
    第二膜层，涂布在所述第一膜层的涂布区域；
    其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽。
  2. 根据权利要求1所述的基板，其中，所述凹槽贯穿所述第一膜层。
  3. 根据权利要求1所述的基板，其中，所述凹槽的深度大于所述第一膜层厚度的一半。
  4. 根据权利要求1所述的基板，其中，所述边缘区域位于非显示区内。
  5. 根据权利要求1所述的基板，其中，所述凹槽为连续凹槽，或者不连续凹槽。
  6. 根据权利要求1所述的基板，其中，所述凹槽为点状凹槽，或者块状凹槽。
  7. 根据权利要求1所述的基板，其中，所述凹槽为一行或者多行。
  8. 根据权利要求1所述的基板，其中，所述基板为彩膜基板，所述第一膜层为透明导电层，所述第二膜层为配向膜层。
  9. 根据权利要求1所述的基板，其中，所述基板为阵列基板，所述第一膜层为遮光层、支撑柱、色阻层、像素电极中的一种，所述第二膜层为配向膜层、有机绝缘光阻层、支撑柱、色阻层中的一种。
  10. 一种液晶显示面板，其包括基板，所述基板包括：
    第一膜层；
    第二膜层，涂布在所述第一膜层的涂布区域；
    其中，在所述涂布区域的边缘区域，所述第一膜层形成有凹槽。
  11. 根据权利要求10所述的液晶显示面板，其中，所述凹槽贯穿所述第一膜层。
  12. 根据权利要求10所述的液晶显示面板，其中，所述凹槽的深度大于所述第一膜层厚度的一半。
  13. 根据权利要求10所述的液晶显示面板，其中，所述边缘区域位于非显示区内。
  14. 根据权利要求10所述的液晶显示面板，其中，所述凹槽为连续凹槽，或者不连续凹槽。
  15. 根据权利要求10所述的液晶显示面板，其中，所述凹槽为点状凹槽，或者块状凹槽。
  16. 根据权利要求10所述的液晶显示面板，其中，所述凹槽为一行或者多行。
  17. 根据权利要求10所述的液晶显示面板，其中，所述基板为彩膜基板，所述第一膜层为透明导电层，所述第二膜层为配向膜层。
  18. 根据权利要求10所述的液晶显示面板，其中，所述基板为阵列基板，所述第一膜层为遮光层、支撑柱、色阻层、像素电极中的一种，所述第二膜层为配向膜层、有机绝缘光阻层、支撑柱、色阻层中的一种。
  19. 一种基板制备方法，其包括：
    提供一衬底；
    在所述衬底上形成第一膜层；
    对所述第一膜层围绕涂布区域的边缘区域进行处理，形成凹槽；
    在所述涂布区域内涂布第二膜层。
  20. 根据权利要求19所述的基板制备方法，其中，所述形成凹槽的步骤包括：形成的所述凹槽为一行或者多行。
PCT/CN2019/117429 2019-05-24 2019-11-12 基板及制备方法、液晶显示面板 Ceased WO2020238047A1 (zh)

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