WO2020237914A1 - 一种柔性基板及其制作方法、显示面板 - Google Patents
一种柔性基板及其制作方法、显示面板 Download PDFInfo
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- WO2020237914A1 WO2020237914A1 PCT/CN2019/106322 CN2019106322W WO2020237914A1 WO 2020237914 A1 WO2020237914 A1 WO 2020237914A1 CN 2019106322 W CN2019106322 W CN 2019106322W WO 2020237914 A1 WO2020237914 A1 WO 2020237914A1
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- Prior art keywords
- layer
- flexible
- metal
- metal oxide
- oxide layer
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 87
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 title claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 143
- 239000002184 metal Substances 0.000 claims abstract description 143
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 108
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 108
- 238000005452 bending Methods 0.000 claims abstract description 75
- 239000004642 Polyimide Substances 0.000 claims description 13
- 238000005516 engineering process Methods 0.000 claims description 13
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 13
- 229920001721 polyimide Polymers 0.000 claims description 13
- 229910052782 aluminium Inorganic materials 0.000 claims description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 12
- 230000003647 oxidation Effects 0.000 claims description 10
- 238000007254 oxidation reaction Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 302
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 22
- 229910052760 oxygen Inorganic materials 0.000 description 22
- 239000001301 oxygen Substances 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 22
- 238000010586 diagram Methods 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to the technical field of display panels, in particular to a flexible substrate, a manufacturing method thereof, and a display panel.
- polyimide polyimide
- Polyimide has excellent heat resistance, radiation resistance, chemical resistance, electrical insulation, mechanical properties, etc., but its own water and oxygen resistance is weak.
- the prior art generally achieves the water and oxygen resistance of the flexible substrate by depositing a single-layer or multi-layer stacked inorganic film with a uniform thickness on the surface of the flexible substrate, or adopting a structure of alternately stacked multiple polyimide/inorganic films.
- these structures all have problems such as stress concentration of inorganic films, easy fracture in the bending area, and easy separation at high temperature and high humidity.
- the embodiments of the present invention provide a flexible substrate, a manufacturing method thereof, and a display panel, so as to solve the problems of increased internal stress of the existing flexible substrate, easy fracture in the bending area, and easy separation at high temperature and high humidity.
- the embodiment of the present invention provides a flexible substrate, including:
- a first flexible layer includes a bending area and a display area
- a metal oxide layer provided on the display area of the first flexible layer
- the first metal layer is arranged on the bending area of the first flexible layer, and the surface of the first metal layer is oxidized into a metal oxide layer.
- the flexible substrate further includes:
- a second flexible layer provided on the metal oxide layer on the display area and the metal oxide layer on the surface of the first metal layer;
- a second metal layer is provided on the second flexible layer, and the surface of the second metal layer is oxidized into a metal oxide layer.
- first metal layer and the second metal layer are both metal aluminum layers, and the metal oxide layer is an aluminum oxide layer.
- the materials of the first flexible layer and the second flexible layer include polyimide or flexible glass.
- the embodiment of the present invention also provides a display panel, including:
- An array layer provided on the flexible substrate
- a display layer provided on the array layer
- the flexible substrate includes:
- a first flexible layer includes a bending area and a display area
- a metal oxide layer provided on the display area of the first flexible layer
- the first metal layer is arranged on the bending area of the first flexible layer, and the surface of the first metal layer is oxidized into a metal oxide layer.
- the flexible substrate further includes:
- a second flexible layer provided on the metal oxide layer on the display area and the metal oxide layer on the surface of the first metal layer;
- a second metal layer is provided on the second flexible layer, and the surface of the second metal layer is oxidized into a metal oxide layer.
- first metal layer and the second metal layer are both metal aluminum layers, and the metal oxide layer is an aluminum oxide layer.
- the materials of the first flexible layer and the second flexible layer include polyimide or flexible glass.
- the embodiment of the present invention also provides a method for manufacturing a flexible substrate, including:
- the first flexible layer includes a bending area and a display area
- a metal oxide layer is formed on the display area of the first flexible layer, a first metal layer is formed on the bending area of the first flexible layer, and the surface of the first metal layer on the bending area is covered Oxidized to metal oxide layer;
- the forming a metal oxide layer on the display area of the first flexible layer, and forming a first metal layer on the bending area of the first flexible layer specifically includes:
- the first metal layer is patterned and oxidized, so that the first metal layer on the display area of the first flexible layer is completely oxidized into a metal oxide layer.
- the method further includes:
- the entire surface of the second metal layer is oxidized, so that the surface of the second metal layer is oxidized into a metal oxide layer.
- the oxidizing the entire surface of the second metal layer specifically includes:
- the entire surface of the second metal layer is oxidized by natural oxidation technology or heating oxidation technology.
- first metal layer and the second metal layer are both metal aluminum layers
- the metal oxide layer is an aluminum oxide layer
- the materials of the first flexible layer and the second flexible layer include polyamide Imine or flexible glass.
- the beneficial effect of the present invention is: a metal oxide layer is provided on the display area of the first flexible layer to ensure that the display area in the display area has excellent water and oxygen blocking capabilities, thereby protecting the display device thereon.
- a first metal layer is provided on the bending area of the layer, and the surface of the first metal layer in the bending area is oxidized to a metal oxide layer, so that the thin metal oxide layer blocks the entry of water and oxygen in the bending area, and the first
- the excellent ductility of the metal layer improves the bending performance of the flexible substrate; the metal oxide layer on the surface of the first metal layer has better surface roughness, which can improve the adhesion between the metal layer and the flexible layer, and can be used in high temperature and high humidity environments It has more excellent stability under or under bending.
- FIG. 1 is a schematic structural diagram of a flexible substrate provided by an embodiment of the present invention
- FIG. 2 is a schematic diagram of another structure of a flexible substrate provided by an embodiment of the present invention.
- FIG. 3 is a schematic structural diagram of a display panel provided by an embodiment of the present invention.
- FIG. 4 is a schematic flowchart of a method for manufacturing a flexible substrate provided by an embodiment of the present invention.
- step 402 in the method for manufacturing a flexible substrate provided by an embodiment of the present invention
- FIG. 6 is a schematic diagram of a part of the structure of step 403 in the method for manufacturing a flexible substrate provided by an embodiment of the present invention.
- FIG. 7 is a schematic diagram of another part of the structure of step 403 in the method for manufacturing a flexible substrate provided by an embodiment of the present invention.
- FIG. 1 is a schematic structural diagram of a flexible substrate provided by an embodiment of the present invention.
- the flexible substrate provided in this embodiment includes a first flexible layer 110, and the first flexible layer 110 includes a bending area and a non-bending area.
- the non-bending area includes a display area and a non-display area, and the display area of the flexible substrate corresponds to the display area of the display panel, and the bending area of the flexible substrate corresponds to the bending area of the display panel.
- the first flexible layer 110 may be polyimide, or flexible glass or the like.
- the flexible substrate further includes a metal oxide layer 111 provided on the display area of the first flexible layer 110.
- a metal oxide layer 111 may also be provided on the non-display area in the non-bending area of the first flexible layer 110.
- the metal oxide layer 111 is a dense oxide layer formed by completely oxidizing the metal provided on the display area. Since the display area of the display panel needs to have excellent water and oxygen resistance, a dense metal oxide layer is provided in the display area of the first flexible layer 110 to prevent water and oxygen from entering from the first flexible layer 110, thereby protecting Display devices, etc. in the display area of the display panel.
- the flexible substrate further includes a first metal layer 101 disposed on the bending area of the first flexible layer 110, and the surface of the first metal layer 101 is oxidized into a metal oxide layer 113.
- the metal oxide layer 113 on the surface of the first metal layer 101 is a natural oxide layer formed by natural oxidation on the surface of the first metal layer 101.
- the metal oxide layer 113 is relatively thin, and the metal oxide layer 113 and the metal oxide layer 111 have the same substance. Since the bending area of the display panel needs to have excellent bending performance, the first metal layer 101 with good ductility is provided on the bending area of the first flexible layer 110 to realize the excellent bending performance of the flexible substrate. At the same time, the thin metal oxide layer 113 is naturally oxidized on the surface of the first metal layer 11 to prevent water and oxygen from entering the bending area.
- the flexible substrate further includes a second flexible layer 120 provided on the metal oxide layer 111 on the display area and the metal oxide layer 113 on the surface of the first metal layer 101.
- the second flexible layer 120 may be polyimide, or flexible glass or the like. Since the metal oxide layer 113 is a natural oxide layer on the surface of the first metal layer 101, it has better surface roughness than the inorganic film layer deposited in the prior art, and can improve the difference between the first metal layer 101 and the second flexible layer 120.
- the adhesion between the flexible substrates makes the flexible substrate more stable in a high temperature and high humidity environment or in a bent state, avoiding problems such as increase in internal stress caused by bending and fracture of the inorganic layer.
- the flexible substrate further includes a second metal layer 102 disposed on the second flexible layer 120, and the surface of the second metal layer 102 is oxidized to a metal oxide layer 112.
- the metal oxide layer 112 on the surface of the second metal layer 102 is a natural oxide layer formed by natural oxidation on the surface of the second metal layer 102, and the metal oxide layer 112 is relatively thin. Since the metal oxide layer 111, the first metal layer 101 and the metal oxide layer 113 have achieved the water and oxygen barrier performance and bending performance of the flexible substrate, only the thin metal oxide layer 112 is naturally oxidized on the surface of the second metal layer 112 , So that the flexible substrate can achieve process optimization while maintaining excellent water and oxygen barrier performance and bending performance.
- metal aluminum (Aluminium, Al) has excellent ductility, it is difficult to react with water and oxygen at high temperatures, and is a good conductor of heat, and it is easy to form a thin dense aluminum oxide film in the air (Aluminium Oxide , Al 2 O 3 ) to prevent it from being further oxidized or corroded.
- Aluminum oxide is chemically stable and has excellent water and oxygen barrier properties. Therefore, the first metal layer 101 and the second metal layer 102 are set as metal aluminum layers.
- the metal oxide layer 111 is a dense aluminum oxide layer formed after the metal aluminum on the display area of the first flexible layer 110 is completely oxidized, and the metal oxide layer 113 is an aluminum oxide layer formed by natural oxidation on the surface of the first metal layer 101.
- the metal oxide layer 112 is an aluminum oxide layer formed by natural oxidation on the surface of the second metal layer 101.
- the flexible substrate provided in this embodiment can be provided with a metal oxide layer on the display area of the first flexible layer to ensure that the display area has excellent water and oxygen resistance, thereby protecting the display devices on it.
- a first metal layer is arranged on the bending area of a flexible layer, and the surface of the first metal layer in the bending area is oxidized to a metal oxide layer, so that the thin metal oxide layer blocks the entry of water and oxygen in the bending area.
- the excellent ductility of the first metal layer can improve the bending performance of the flexible substrate; the metal oxide layer on the surface of the first metal layer has better surface roughness, which can improve the adhesion between the metal layer and the flexible layer. It has more excellent stability in high humidity environment or in bending state.
- FIG. 3 is a schematic structural diagram of a display panel provided by an embodiment of the present invention.
- the display panel includes a flexible substrate, an array layer 130 and a display layer 140.
- the flexible substrate 31 is the flexible substrate in the above embodiment, the array layer 130 is provided on the flexible substrate, and the display layer 140 is provided on the array layer 130.
- the flexible substrate includes a first flexible layer 110, a metal oxide layer 111 disposed on the display area of the first flexible layer 110, and a second flexible substrate disposed on the bending area of the first flexible layer 110.
- the array layer 130 is disposed on the metal oxide layer 112, and the display layer is disposed on the array layer 130.
- the display panel provided by this embodiment can be provided with a metal oxide layer on the display area of the first flexible layer to ensure that the display area has excellent water and oxygen resistance, thereby protecting the display devices on it.
- a first metal layer is arranged on the bending area of a flexible layer, and the surface of the first metal layer in the bending area is oxidized to a metal oxide layer, so that the thin metal oxide layer blocks the entry of water and oxygen in the bending area.
- the excellent ductility of the first metal layer can improve the bending performance of the flexible substrate; the metal oxide layer on the surface of the first metal layer has better surface roughness, which can improve the adhesion between the metal layer and the flexible layer. It has more excellent stability in high humidity environment or in bending state.
- FIG. 4 is a schematic flowchart of a manufacturing method of a flexible substrate provided by an embodiment of the present invention.
- the embodiment of the present invention also provides a method for manufacturing a flexible substrate, including:
- the substrate may be a glass substrate.
- a first flexible layer is formed on the substrate; the first flexible layer includes a display area and a bending area.
- the first flexible layer 110 is prepared on a clean and smooth substrate 100.
- the first flexible layer includes a bending area and a non-bending area, and the non-bending area includes a display area and a non-display area.
- the first flexible layer 110 may be polyimide, or flexible glass or the like.
- a metal oxide layer is formed on the display area of the first flexible layer, a first metal layer is formed on the bending area of the first flexible layer, and the first metal layer on the bending area is The surface is oxidized to a metal oxide layer.
- step 103 includes:
- the first metal layer is patterned and oxidized so that the first metal layer on the display area of the first flexible layer is completely oxidized to a metal oxide layer, and the first metal layer on the bending area is The surface is oxidized to a metal oxide layer.
- a first metal layer 101 is prepared on the bending area and the non-bending area of the first flexible layer 110, and a single pattern 1 is provided on the bending area of the first metal layer 101 or A plurality of evenly distributed patterns, and then patterning and oxidizing the first metal layer 101, so that the first metal layer 101 in the non-bending area not covered by the pattern 001 is completely oxidized to the metal oxide layer 111, thereby making the first flexible
- the first metal layer 101 is a metal aluminum layer
- the metal oxide layer 111 and the metal oxide layer 113 are aluminum oxide layers.
- the display area of the display panel needs to have excellent water and oxygen resistance
- a dense metal oxide layer is provided in the display area of the first flexible layer 110, which can well prevent water and oxygen from getting from the first flexible layer. 110 enters, thereby protecting the display devices and the like in the display area of the display panel.
- the first metal layer 101 with good ductility is provided on the bending area of the first flexible layer 110 to realize the excellent bending performance of the flexible substrate.
- the thin metal oxide layer 113 is naturally oxidized on the surface of the first metal layer 11 to prevent water and oxygen from entering from the bending area.
- laser lift-off technology or mechanical lift-off technology is used to separate the substrate from the first flexible layer to remove the substrate, thereby obtaining a flexible display panel, as shown in FIG. 1.
- the method further includes:
- the entire surface of the second metal layer is oxidized, so that the surface of the second metal layer is oxidized into a metal oxide layer.
- the oxidizing the entire surface of the second metal layer specifically includes:
- the entire surface of the second metal layer is oxidized by natural oxidation technology or heating oxidation technology.
- a second flexible layer 120 is formed on the metal oxide layer 111 in the display area and the metal oxide layer 113 on the surface of the first metal layer 101.
- the second flexible layer 120 may be polyimide, or flexible glass or the like.
- a second metal layer 102 is formed on the second flexible layer 120, and the surface of the second metal layer 102 is oxidized to form a metal oxide layer 112.
- the second metal layer 102 is a metal aluminum layer, and the metal oxide layer 112 is an aluminum oxide layer.
- the metal oxide layer 113 is a natural oxide layer on the surface of the first metal layer 101, it has better surface roughness than the inorganic film layer deposited in the prior art, and can improve the first metal layer 101 and the first metal layer 101.
- the adhesion between the two flexible layers 120 makes the flexible substrate more stable in a high-temperature and high-humidity environment or in a bent state, and avoids problems such as increased internal stress caused by bending and fracture of the inorganic layer.
- the metal oxide layer 111, the first metal layer 101 and the metal oxide layer 113 have achieved the water and oxygen barrier performance and bending performance of the flexible substrate, only a thin metal oxide layer is naturally oxidized on the surface of the second metal layer 112 112, so that the flexible substrate can achieve process optimization while maintaining excellent water and oxygen barrier performance and bending performance.
- a metal oxide layer is provided on the display area of the first flexible layer to ensure that the display area has excellent water and oxygen resistance, thereby protecting the display device on it.
- a first metal layer is provided on the bending area of the layer, and the surface of the first metal layer in the bending area is oxidized to a metal oxide layer, so that the thin metal oxide layer blocks the entry of water and oxygen in the bending area, and the first
- the excellent ductility of the metal layer improves the bending performance of the flexible substrate; the metal oxide layer on the surface of the first metal layer has better surface roughness, which can improve the adhesion between the metal layer and the flexible layer, and can be used in high temperature and high humidity environments It has more excellent stability under or under bending.
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Abstract
一种柔性基板及其制作方法、显示面板。所述柔性基板包括:第一柔性层(110);所述第一柔性层(110)包括弯折区和显示区;设于所述第一柔性层(110)的显示区上的金属氧化层(111);设于所述第一柔性层(110)的弯折区上的第一金属层(101),且所述第一金属层(101)的表面被氧化为金属氧化层(113)。
Description
本发明涉及显示面板技术领域,尤其涉及一种柔性基板及其制作方法、显示面板。
随着现代显示技术的快速发展,显示技术领域正朝着更轻、更薄、更柔、更透明的方向发展。传统的玻璃基板由于自身硬和脆等特性,难以满足未来柔性显示技术的要求,而高分子薄膜基板具有质轻、柔性、综合性能优异等特点,可以很好地满足显示技术对柔性的要求。因此,柔性高分子基板材料是未来柔性显示技术的首选材料。
目前用作柔性基板最具发展前景的高分子材料是聚酰亚胺(polyimide, PI)。聚酰亚胺具有优异的耐热性、耐辐射性能、耐化学性、电绝缘性、机械性能等,但其自身的阻水阻氧能力较弱。现有技术一般通过在柔性基板表面沉积厚度均匀的单层或多层堆叠结构的无机薄膜,或采用多层聚酰亚胺/无机薄膜交替堆叠的结构来实现柔性基板的阻水阻氧能力,但这些结构均存在无机薄膜应力集中、弯折区域易断裂、高温高湿易分离等问题。
本发明实施例提供一种柔性基板及其制作方法、显示面板,以解决现有柔性基板内应力增加、弯折区易断裂、高温高湿易分离的问题。
本发明实施例提供了一种柔性基板,包括:
第一柔性层;所述第一柔性层包括弯折区和显示区;
设于所述第一柔性层的显示区上的金属氧化层;
设于所述第一柔性层的弯折区上的第一金属层,且所述第一金属层的表面被氧化为金属氧化层。
进一步地,所述柔性基板还包括:
设于所述显示区的金属氧化层和所述第一金属层表面的金属氧化层上的第二柔性层;
设于所述第二柔性层上的第二金属层,且所述第二金属层的表面被氧化为金属氧化层。
进一步地,所述第一金属层和所述第二金属层均为金属铝层,所述金属氧化层为氧化铝层。
进一步地,所述第一柔性层和所述第二柔性层的材料包括聚酰亚胺或柔性玻璃。
本发明实施例还提供了一种显示面板,包括:
柔性基板;
设于所述柔性基板上的阵列层;
设于所述阵列层上的显示层;
所述柔性基板包括:
第一柔性层;所述第一柔性层包括弯折区和显示区;
设于所述第一柔性层的显示区上的金属氧化层;
设于所述第一柔性层的弯折区上的第一金属层,且所述第一金属层的表面被氧化为金属氧化层。
进一步地,所述柔性基板还包括:
设于所述显示区的金属氧化层和所述第一金属层表面的金属氧化层上的第二柔性层;
设于所述第二柔性层上的第二金属层,且所述第二金属层的表面被氧化为金属氧化层。
进一步地,所述第一金属层和所述第二金属层均为金属铝层,所述金属氧化层为氧化铝层。
进一步地,所述第一柔性层和所述第二柔性层的材料包括聚酰亚胺或柔性玻璃。
本发明实施例还提供了一种柔性基板的制作方法,包括:
提供基板;
在所述基板上形成第一柔性层;所述第一柔性层包括弯折区和显示区;
在所述第一柔性层的显示区上形成金属氧化层,在所述第一柔性层的弯折区上形成第一金属层,并使所述弯折区上的第一金属层的表面被氧化为金属氧化层;
去除所述基板。
进一步地,所述在所述第一柔性层的显示区上形成金属氧化层,在所述第一柔性层的弯折区上形成第一金属层,具体包括:
在所述第一柔性层上形成第一金属层;
对所述第一金属层进行图案化氧化,使所述第一柔性层的显示区上的第一金属层被完全氧化为金属氧化层。
进一步地,在所述去掉所述基板之前,还包括:
在所述显示区的金属氧化层和所述第一金属层表面的金属氧化层上形成第二柔性层;
在所述第二柔性层上形成第二金属层;
对所述第二金属层进行整面氧化,使所述第二金属层的表面被氧化为金属氧化层。
进一步地,所述对所述第二金属层进行整面氧化,具体包括:
采用自然氧化技术或加热氧化技术对所述第二金属层进行整面氧化。
进一步地,所述第一金属层和所述第二金属层均为金属铝层,所述金属氧化层为氧化铝层,所述第一柔性层和所述第二柔性层的材料包括聚酰亚胺或柔性玻璃。
本发明的有益效果为:在第一柔性层的显示区上设置金属氧化层,以保证显示区中的显示区具有优异的阻水阻氧能力,从而保护其上的显示器件,在第一柔性层的弯折区上设置第一金属层,且弯折区的第一金属层的表面被氧化为金属氧化层,以使薄薄的金属氧化层阻隔弯折区的水氧进入,同时第一金属层优异的延展性能提高柔性基板的弯折性能;第一金属层表面的金属氧化层具有更好的表面粗糙度,可提高金属层与柔性层之间的粘附力,在高温高湿环境下或在弯折状态下具有更优异的稳定性。
为了更清楚地说明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单介绍,显而易见地,下面描述中的附图仅仅是发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的柔性基板的结构示意图;
图2为本发明实施例提供的柔性基板的另一结构示意图;
图3为本发明实施例提供的显示面板的结构示意图;
图4为本发明实施例提供的柔性基板的制作方法的流程示意图;
图5为本发明实施例提供的柔性基板的制作方法中步骤402的结构示意图;
图6为本发明实施例提供的柔性基板的制作方法中步骤403的部分结构示意图;
图7为本发明实施例提供的柔性基板的制作方法中步骤403的另一部分结构示意图。
以下参考说明书附图介绍本发明的优选实施例,用以举例证明本发明可以实施,这些实施例可以向本领域中的技术人员完整介绍本发明的技术内容,使得本发明的技术内容更加清楚和便于理解。然而本发明可以通过许多不同形式的实施例来得以体现,本发明的保护范围并非仅限于文中提到的实施例。
本发明说明书中使用的术语仅用来描述特定实施方式,而并不意图显示本发明的概念。除非上下文中有明确不同的意义,否则,以单数形式使用的表达涵盖复数形式的表达。在本发明说明书中,应理解,诸如“包括”、“具有”以及“含有”等术语意图说明存在本发明说明书中揭示的特征、数字、步骤、动作或其组合的可能性,而并不意图排除可存在或可添加一个或多个其他特征、数字、步骤、动作或其组合的可能性。附图中的相同参考标号指代相同部分。
参见图1,是本发明实施例提供的柔性基板的结构示意图。
本实施例提供的柔性基板包括第一柔性层110,所述第一柔性层110包括弯折区和非弯折区。其中,非弯折区包括显示区和非显示区,且柔性基板的显示区对应显示面板的显示区,柔性基板的弯折区对应显示面板的弯折区。可选地,第一柔性层110可以为聚酰亚胺,也可以为柔性玻璃等。
进一步地,所述柔性基板还包括设于所述第一柔性层110的显示区上的金属氧化层111。所述第一柔性层110的非弯折区中的非显示区上也可设置金属氧化层111。其中,金属氧化层111是由设于显示区上的金属完全氧化而成的致密氧化层。由于显示面板的显示区需要具备优异的阻水阻氧能力,因此在第一柔性层110的显示区设置致密的金属氧化层,可以很好地避免水氧从第一柔性层110进入,从而保护显示面板显示区中的显示器件等。
进一步地,所述柔性基板还包括设于所述第一柔性层110的弯折区上的第一金属层101,且所述第一金属层101的表面被氧化为金属氧化层113。其中,第一金属层101表面的金属氧化层113是第一金属层101表面自然氧化而成的自然氧化层,金属氧化层113较薄,且金属氧化层113与金属氧化层111的物质相同。由于显示面板的弯折区需要具备优异的弯折性能,因此在第一柔性层110的弯折区上设置具有良好延展性的第一金属层101,以实现柔性基板优异的弯折性能。同时,在第一金属层11表面自然氧化薄薄的金属氧化层113,以避免水氧从弯折区进入。
进一步地,如图2所示,所述柔性基板还包括设于所述显示区的金属氧化层111和所述第一金属层101表面的金属氧化层113上的第二柔性层120。可选地,第二柔性层120可以为聚酰亚胺,也可以为柔性玻璃等。由于金属氧化层113为第一金属层101表面的自然氧化层,相对于现有技术沉积的无机膜层,具有更好的表面粗糙度,可以提高第一金属层101与第二柔性层120之间的粘附力,使柔性基板在高温高湿环境下或者在弯折状态下更加稳定,避免因弯折导致的内应力增加及无机层断裂等问题。
进一步地,所述柔性基板还包括设于所述第二柔性层120上的第二金属层102,且所述第二金属层102的表面被氧化为金属氧化层112。其中,第二金属层102表面的金属氧化层112是第二金属层102表面自然氧化而成的自然氧化层,且金属氧化层112较薄。由于金属氧化层111、第一金属层101和金属氧化层113已实现柔性基板的水氧阻隔性能和弯折性能,因此在第二金属层112的表面只需自然氧化薄薄的金属氧化层112,以使柔性基板在保持优异的水氧阻隔性能和弯折性能的同时实现工艺优化。
需要说明的是,金属铝(Aluminium, Al)具有优异的延展性能,高温下难与水氧反应,是热的良导体,且在空气中易形成一层薄薄的致密氧化铝膜(Aluminium
Oxide, Al
2O
3),阻止其进一步被氧化或腐蚀,而氧化铝化学性质稳定,具有极其优异的阻水阻氧性能,因此设置第一金属层101和第二金属层102为金属铝层,而金属氧化层111为第一柔性层110的显示区上的金属铝被完全氧化后形成的致密氧化铝层,金属氧化层113是第一金属层101的表面自然氧化而成的氧化铝层,金属氧化层112是第二金属层101的表面自然氧化而成的氧化铝层。
由上述可知,本实施例提供的柔性基板,能够在第一柔性层的显示区上设置金属氧化层,以保证显示区具有优异的阻水阻氧能力,从而保护其上的显示器件,在第一柔性层的弯折区上设置第一金属层,且弯折区的第一金属层的表面被氧化为金属氧化层,以使薄薄的金属氧化层阻隔弯折区的水氧进入,同时第一金属层优异的延展性能够提高柔性基板的弯折性能;第一金属层表面的金属氧化层具有更好的表面粗糙度,可提高金属层与柔性层之间的粘附力,在高温高湿环境下或在弯折状态下具有更优异的稳定性。
参见图3,是本发明实施例提供的显示面板的结构示意图。
所述显示面板包括柔性基板、阵列层130和显示层140。其中,柔性基板31为上述实施例中的柔性基板,阵列层130设于柔性基板上,显示层140设于阵列层130上。
例如,如图3所示,柔性基板包括第一柔性层110,设于第一柔性层110的显示区上的金属氧化层111,设于所述第一柔性层110的弯折区上的第一金属层101,第一金属层101表面自然氧化的金属氧化层113,设于所述显示区的金属氧化层111和所述第一金属层101表面的金属氧化层113上的第二柔性层120,设于所述第二柔性层120上的第二金属层102,以及第二金属层102表面自然氧化的金属氧化层112。阵列层130设于金属氧化层112上,显示层设于阵列层130上。
由上述可知,本实施例提供的显示面板,能够在第一柔性层的显示区上设置金属氧化层,以保证显示区具有优异的阻水阻氧能力,从而保护其上的显示器件,在第一柔性层的弯折区上设置第一金属层,且弯折区的第一金属层的表面被氧化为金属氧化层,以使薄薄的金属氧化层阻隔弯折区的水氧进入,同时第一金属层优异的延展性能够提高柔性基板的弯折性能;第一金属层表面的金属氧化层具有更好的表面粗糙度,可提高金属层与柔性层之间的粘附力,在高温高湿环境下或在弯折状态下具有更优异的稳定性。
参见图4,是本发明实施例提供的柔性基板的制作方法的流程示意图。
本发明实施例还提供一种柔性基板的制作方法,包括:
401、提供基板。
本实施例中,基板可以为玻璃基板。
402、在所述基板上形成第一柔性层;所述第一柔性层包括显示区和弯折区。
本实施例中,如图5所示,在洁净光滑的基板100上制备第一柔性层110。第一柔性层包括弯折区和非弯折区,所述非弯折区包括显示区和非显示区。可选地,第一柔性层110可以为聚酰亚胺,也可以为柔性玻璃等。
403、在所述第一柔性层的显示区上形成金属氧化层,在所述第一柔性层的弯折区上形成第一金属层,并使所述弯折区上的第一金属层的表面被氧化为金属氧化层。
具体地,步骤103包括:
在所述第一柔性层上形成第一金属层;
对所述第一金属层进行图案化氧化,使所述第一柔性层的显示区上的第一金属层被完全氧化为金属氧化层,并使所述弯折区上的第一金属层的表面被氧化为金属氧化层。
本实施例中,如图6所示,在第一柔性层110的弯折区和非弯折区上制备第一金属层101,在第一金属层101的弯折区设置单一图案1或者设置多个均匀分布的图案,然后对第一金属层101进行图案化氧化,使未被图案001遮挡的非弯折区的第一金属层101被完全氧化为金属氧化层111,从而使第一柔性层110的显示区上为金属氧化层111,而被图案1遮挡的第一金属层101在去除图案1后表面自然氧化为金属氧化层113,如图7所示。可选地,第一金属层101为金属铝层,金属氧化层111和金属氧化层113为氧化铝层。
需要说明的是,由于显示面板的显示区需要具备优异的阻水阻氧能力,因此在第一柔性层110的显示区设置致密的金属氧化层,可以很好地避免水氧从第一柔性层110进入,从而保护显示面板显示区中的显示器件等。而由于显示面板的弯折区需要具备优异的弯折性能,因此在第一柔性层110的弯折区上设置具有良好延展性的第一金属层101,以实现柔性基板优异的弯折性能。同时,在第一金属层11表面自然氧化薄薄的金属氧化层113,以避免水氧从弯折区进入。
404、去除所述基板。
本实施例中,采用激光剥离技术或机械剥离技术将基板与第一柔性层分离,以去除基板,从而获得柔性显示面板,如图1所示。
进一步地,在所述去掉所述基板之前,还包括:
在所述显示区的金属氧化层和所述第一金属层表面的金属氧化层上形成第二柔性层;
在所述第二柔性层上形成第二金属层;
对所述第二金属层进行整面氧化,使所述第二金属层的表面被氧化为金属氧化层。
进一步地,所述对所述第二金属层进行整面氧化,具体包括:
采用自然氧化技术或加热氧化技术对所述第二金属层进行整面氧化。
本实施例中,如图2所示,所述显示区的金属氧化层111和所述第一金属层101表面的金属氧化层113上形成第二柔性层120。可选地,第二柔性层120可以为聚酰亚胺,也可以为柔性玻璃等。在所述第二柔性层120上形成第二金属层102,且对所述第二金属层102的表面进行氧化形成金属氧化层112。可选地,第二金属层102为金属铝层,金属氧化层112为氧化铝层。
需要说明的是,由于金属氧化层113为第一金属层101表面的自然氧化层,相对于现有技术沉积的无机膜层,具有更好的表面粗糙度,可以提高第一金属层101与第二柔性层120之间的粘附力,使柔性基板在高温高湿环境下或者在弯折状态下更加稳定,避免因弯折导致的内应力增加及无机层断裂等问题。而由于金属氧化层111、第一金属层101和金属氧化层113已实现柔性基板的水氧阻隔性能和弯折性能,因此在第二金属层112的表面只需自然氧化薄薄的金属氧化层112,以使柔性基板在保持优异的水氧阻隔性能和弯折性能的同时实现工艺优化。
本实施例提供的柔性基板的制作方法,在第一柔性层的显示区上设置金属氧化层,以保证显示区具有优异的阻水阻氧能力,从而保护其上的显示器件,在第一柔性层的弯折区上设置第一金属层,且弯折区的第一金属层的表面被氧化为金属氧化层,以使薄薄的金属氧化层阻隔弯折区的水氧进入,同时第一金属层优异的延展性能提高柔性基板的弯折性能;第一金属层表面的金属氧化层具有更好的表面粗糙度,可提高金属层与柔性层之间的粘附力,在高温高湿环境下或在弯折状态下具有更优异的稳定性。
综上所述,虽然本发明已以优选实施例揭露如上,但上述优选实施例并非用以限制本发明,本领域的普通技术人员,在不脱离本发明的精神和范围内,均可作各种更动与润饰,因此本发明的保护范围以权利要求界定的范围为准。
Claims (13)
- 一种柔性基板,其中,包括:第一柔性层;所述第一柔性层包括弯折区和显示区;设于所述第一柔性层的显示区上的金属氧化层;设于所述第一柔性层的弯折区上的第一金属层,且所述第一金属层的表面被氧化为金属氧化层。
- 根据权利要求1所述的柔性基板,其中,所述柔性基板还包括:设于所述显示区的金属氧化层和所述第一金属层表面的金属氧化层上的第二柔性层;设于所述第二柔性层上的第二金属层,且所述第二金属层的表面被氧化为金属氧化层。
- 根据权利要求2所述的柔性基板,其中,所述第一金属层和所述第二金属层均为金属铝层,所述金属氧化层为氧化铝层。
- 根据权利要求2所述的柔性基板,其中,所述第一柔性层和所述第二柔性层的材料包括聚酰亚胺或柔性玻璃。
- 一种显示面板,其中,包括:柔性基板;设于所述柔性基板上的阵列层;设于所述阵列层上的显示层;所述柔性基板包括:第一柔性层;所述第一柔性层包括弯折区和显示区;设于所述第一柔性层的显示区上的金属氧化层;设于所述第一柔性层的弯折区上的第一金属层,且所述第一金属层的表面被氧化为金属氧化层。
- 根据权利要求5所述的显示面板,其中,所述柔性基板还包括:设于所述显示区的金属氧化层和所述第一金属层表面的金属氧化层上的第二柔性层;设于所述第二柔性层上的第二金属层,且所述第二金属层的表面被氧化为金属氧化层。
- 根据权利要求6所述的显示面板,其中,所述第一金属层和所述第二金属层均为金属铝层,所述金属氧化层为氧化铝层。
- 根据权利要求6所述的显示面板,其中,所述第一柔性层和所述第二柔性层的材料包括聚酰亚胺或柔性玻璃。
- 一种柔性基板的制作方法,其中,包括:提供基板;在所述基板上形成第一柔性层;所述第一柔性层包括弯折区和显示区;在所述第一柔性层的显示区上形成金属氧化层,在所述第一柔性层的弯折区上形成第一金属层,并使所述弯折区上的第一金属层的表面被氧化为金属氧化层;去除所述基板。
- 根据权利要求9所述的柔性基板的制作方法,其中,所述在所述第一柔性层的显示区上形成金属氧化层,在所述第一柔性层的弯折区上形成第一金属层,具体包括:在所述第一柔性层上形成第一金属层;对所述第一金属层进行图案化氧化,使所述第一柔性层的显示区上的第一金属层被完全氧化为金属氧化层。
- 根据权利要求9所述的柔性基板的制作方法,其中,在所述去掉所述基板之前,还包括:在所述显示区的金属氧化层和所述第一金属层表面的金属氧化层上形成第二柔性层;在所述第二柔性层上形成第二金属层;对所述第二金属层进行整面氧化,使所述第二金属层的表面被氧化为金属氧化层。
- 根据权利要求11所述的柔性基板的制作方法,其中,所述对所述第二金属层进行整面氧化,具体包括:采用自然氧化技术或加热氧化技术对所述第二金属层进行整面氧化。
- 根据权利要求11所述的柔性基板的制作方法,其中,所述第一金属层和所述第二金属层均为金属铝层,所述金属氧化层为氧化铝层,所述第一柔性层和所述第二柔性层的材料包括聚酰亚胺或柔性玻璃。
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