WO2020179575A1 - Appareil de formation de film et procédé d'apport de gaz de matériau - Google Patents

Appareil de formation de film et procédé d'apport de gaz de matériau Download PDF

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Publication number
WO2020179575A1
WO2020179575A1 PCT/JP2020/007693 JP2020007693W WO2020179575A1 WO 2020179575 A1 WO2020179575 A1 WO 2020179575A1 JP 2020007693 W JP2020007693 W JP 2020007693W WO 2020179575 A1 WO2020179575 A1 WO 2020179575A1
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WO
WIPO (PCT)
Prior art keywords
raw material
pressure
processing container
material tank
forming apparatus
Prior art date
Application number
PCT/JP2020/007693
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English (en)
Japanese (ja)
Inventor
津田　栄之輔
Original Assignee
東京エレクトロン株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東京エレクトロン株式会社 filed Critical 東京エレクトロン株式会社
Publication of WO2020179575A1 publication Critical patent/WO2020179575A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

L'invention concerne un appareil de formation de film destiné à former un film prédéfini sur un substrat et ayant : un récipient de traitement qui est conçu pour pouvoir être décompressé et qui loge le substrat à l'intérieur de celui-ci ; un réservoir de matériau dans lequel est stocké un matériau liquide ou un matériau solide ; un tuyau d'apport qui relie le réservoir de matériau et le récipient de traitement de manière à permettre à un gaz de matériau généré par vaporisation du matériau liquide ou solide à l'intérieur du réservoir de matériau d'être introduit dans le récipient de traitement ; une soupape de régulation de pression qui est disposée sur le tuyau d'apport et qui est susceptible de régler une ouverture de soupape de celui-ci ; un capteur de pression pour mesurer la pression à l'intérieur du réservoir de matériau ; et une unité de commande pour commander la soupape de régulation de pression sur la base d'un résultat de mesure du capteur de pression.
PCT/JP2020/007693 2019-03-07 2020-02-26 Appareil de formation de film et procédé d'apport de gaz de matériau WO2020179575A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-041837 2019-03-07
JP2019041837A JP2020143351A (ja) 2019-03-07 2019-03-07 成膜装置及び原料ガス供給方法

Publications (1)

Publication Number Publication Date
WO2020179575A1 true WO2020179575A1 (fr) 2020-09-10

Family

ID=72338664

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2020/007693 WO2020179575A1 (fr) 2019-03-07 2020-02-26 Appareil de formation de film et procédé d'apport de gaz de matériau

Country Status (2)

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JP (1) JP2020143351A (fr)
WO (1) WO2020179575A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024027372A (ja) * 2022-08-17 2024-03-01 大陽日酸株式会社 混合ガス供給装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002162285A (ja) * 2000-10-31 2002-06-07 Applied Materials Inc 液体収容装置および液面検知方法
JP2010109302A (ja) * 2008-10-31 2010-05-13 Horiba Ltd 材料ガス濃度制御システム
JP2017205736A (ja) * 2016-05-20 2017-11-24 日本エア・リキード株式会社 昇華ガス供給システムおよび昇華ガス供給方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002162285A (ja) * 2000-10-31 2002-06-07 Applied Materials Inc 液体収容装置および液面検知方法
JP2010109302A (ja) * 2008-10-31 2010-05-13 Horiba Ltd 材料ガス濃度制御システム
JP2017205736A (ja) * 2016-05-20 2017-11-24 日本エア・リキード株式会社 昇華ガス供給システムおよび昇華ガス供給方法

Also Published As

Publication number Publication date
JP2020143351A (ja) 2020-09-10

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