WO2020175337A1 - Laminated body, article provided with laminated body, and image display device - Google Patents

Laminated body, article provided with laminated body, and image display device Download PDF

Info

Publication number
WO2020175337A1
WO2020175337A1 PCT/JP2020/006912 JP2020006912W WO2020175337A1 WO 2020175337 A1 WO2020175337 A1 WO 2020175337A1 JP 2020006912 W JP2020006912 W JP 2020006912W WO 2020175337 A1 WO2020175337 A1 WO 2020175337A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
polymer
general formula
hard coat
coat layer
Prior art date
Application number
PCT/JP2020/006912
Other languages
French (fr)
Japanese (ja)
Inventor
暢之 芥川
顕夫 田村
北村 哲
裕三 永田
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to JP2021502154A priority Critical patent/JP7064650B2/en
Priority to KR1020217019637A priority patent/KR102602546B1/en
Publication of WO2020175337A1 publication Critical patent/WO2020175337A1/en
Priority to JP2022071039A priority patent/JP2022115881A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/042Coating with two or more layers, where at least one layer of a composition contains a polymer binder
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • C09D183/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2377/00Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers
    • C08J2377/10Polyamides derived from aromatically bound amino and carboxyl groups of amino carboxylic acids or of polyamines and polycarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Definitions

  • the present invention relates to a laminate, an article including the laminate, and an image display device.
  • CRT cathode ray tube
  • PDP plasma display
  • Image display devices such as, electroluminescent displays (ELDs), fluorescent display (VFDs), field emission displays (FEDs), and liquid crystal displays (LCDs) are designed to prevent scratches on the display surface. It is preferable to provide a laminate having a hard coat layer (hard coat film) on the substrate.
  • ELDs electroluminescent displays
  • VFDs fluorescent display
  • FEDs field emission displays
  • LCDs liquid crystal displays
  • Patent Document 1 describes a hard coat film having a hard coat layer made of a cured product of a curable composition containing a cationic curable silicone resin and a leveling agent on a substrate. There is.
  • Patent Document 1 Japanese Patent Laid-Open No. 2 0 1 8-8 3 9 15
  • An object of the present invention is to provide a laminate having excellent scratch resistance and resistance to repeated bending, and suppressing whitening, an article including the laminate, and an image display device.
  • the hard coat layer-forming composition comprising a polymer _ (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group is contained, and the scratch resistant layer is a radically polymerizable group.
  • the scratch resistant layer is a radically polymerizable group.
  • the polymer _ (3) has a structural unit represented by the following general formula (3_1), a structural unit represented by the following general formula (3_2), and a structural unit represented by the following general formula (3_3).
  • 1_ 2 represents a single bond or a divalent linking group, 0 2 denotes the Kachio down polymerizable group.
  • 1_ 3 represents a single bond or a divalent linking group
  • 0 3 represents the radical Le polymerizable group
  • the composition for forming a hard coat layer contains the polymer (3) in an amount of 0.001 to 5% by mass based on the total solid content of the composition for forming a hard coat layer, ⁇ 1> to ⁇
  • An image display device comprising the laminate according to any one of ⁇ 1> to ⁇ 9> as a surface protection film.
  • the present invention it is possible to provide a laminate having excellent scratch resistance and repeated bending resistance, and suppressing whitening, an article including the laminate, and an image display device.
  • the laminate of the present invention is a laminate of the present invention.
  • the bonded _ DoCoMo _ Bokuso is,
  • the hard coat layer-forming composition comprising a polymer _ (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group is contained, and the scratch resistant layer is a radically polymerizable group.
  • the scratch resistant layer is a radically polymerizable group.
  • Polyorganosilsesquioxane having a cationically polymerizable group (3 1) is a material capable of imparting hardness and flex resistance to the hard coat layer, but polyorganosilsesquioxane having a cationically polymerizable group (3 1)
  • the hard coating layer is Since it is a cationic polymerization system and the scratch-resistant layer is a radical polymerization system, the polymerization systems of both layers are different, and it is considered that the adhesion between the layers was weak and the improvement in scratch resistance was low.
  • the polymer (3) by adding a polymer (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group to the composition for forming a hard coat layer, the polymer (3) can be It is believed that the film functions as an interlayer adhesive, strengthening the adhesiveness between the layers and providing excellent scratch resistance.
  • the polymer (3) has a group containing a fluorine atom, ⁇ 2020/175 337 6 ⁇ (: 171-1? 2020/006912
  • the polymer (3) When the composition for forming a hard coat layer is applied, the polymer (3) is unevenly distributed on the surface of the hard coat layer (surface on the air interface side), and the layers can be adhered efficiently. Further, the action of the group containing a fluorine atom lowers the surface tension of the coating liquid, and suppresses Marangoni convection, wind drying unevenness, and the like, so that it is considered that whitening due to surface scattering can be suppressed.
  • the polymer (3) Since the polymer (3) has a cationically polymerizable group, it can be bonded to the polyorganosilsesquioxane (3 1) having a cationically polymerizable group, which is a material of the hard coat layer, by a polymerization reaction.
  • the polymer (3) since the polymer (3) has a radically polymerizable group, it can be bonded to the radically polymerizable compound ( ⁇ 1) which is a material of the scratch resistant layer by a polymerization reaction.
  • the polymer (3) can be bonded to both the material of the hard coat layer and the material of the scratch resistant layer, the adhesion between the layers can be enhanced, and thus the scratch resistance can be improved. it is conceivable that.
  • the laminate of the present invention includes a base material.
  • the substrate preferably has a transmittance in the visible light region of 70% or more, more preferably 80% or more, and further preferably 90% or more.
  • the substrate preferably comprises a polymer.
  • the polymer a polymer having excellent optical transparency, mechanical strength, thermal stability and the like is preferable.
  • polystyrene-based polymers examples include polycarbonate-based polymers, polyethylene terephthalate (Mitsuingo), polyethylene naphthalate (Mitsumi 1 ⁇ 1) and other polyester-based polymers, polystyrene, acrylonitrile-styrene copolymers (83 resin), and the like.
  • polyolefins such as polyethylene and polypropylene, norbornene-based resins, polyolefin-based polymers such as ethylene-propylene copolymers, polymethylmethacrylate, etc.
  • (meth) acrylic polymer such as rate, (meth) acrylic polymer, vinyl chloride polymer, nylon, amide polymer such as aromatic polyamide, imide polymer, sulfone polymer, Polyether sulfone-based polymer, polyether ether ketone-based polymer, polyphenylene sulfide-based polymer, vinylidene chloride-based polymer, vinyl alcohol-based polymer, vinyl butyral-based polymer, aryl-based polymer, polyoxymethylene-based polymer, epoxy
  • the polymer also include cellulosic polymers, cellulosic polymers typified by triacetyl cellulose, copolymers of the above polymers, and polymers obtained by mixing the above polymers.
  • amide-based polymers and imide-based polymers such as aromatic polyamides are
  • I 3 Japanese Industrial Standards 8 1 15 (2 0 0 1)
  • the number of breaks and bends measured with an IV! I Ding tester is large, and the hardness is relatively high, so it is preferably used as a substrate.
  • an aromatic polyamide as shown in Example 1 of Japanese Patent No. 5 6 9 9 4 5 4, Japanese Patent Publication No. 2 0 1 5 — 5 0 8 3 4 5 and Japanese Patent Publication No. 2 0 1 6-5
  • the polyimides described in JP-A Nos. 2 1 2 1 6 and 0 2 0 1 7/0 1 4 2 8 7 can be preferably used as a base material.
  • the amide-based polymer aromatic polyamide (aramid-based polymer) is preferable.
  • the substrate preferably contains at least one polymer selected from imide-based polymers and aramid-based polymers.
  • the base material can also be formed as a cured layer of an acrylic, urethane, acrylic urethane, epoxy, silicone or other UV curable or thermosetting resin.
  • the base material may contain a material that further softens the above-mentioned polymer.
  • the softening material refers to a compound that improves the number of times of bending at break.
  • a rubber elastic body, a brittleness improving agent, a plasticizer, a sliding ring polymer, etc. can be used as the softening material.
  • the softening material described in paragraph numbers [0 0 5 1] to [0 1 1 4] can be preferably used.
  • the softening material may be mixed alone with the polymer, or a plurality of softening materials may be appropriately used in combination, and the softening material alone or in plural without mixing with the polymer. It may be used together as a base material.
  • the amount of these softening materials to be mixed is not particularly limited, and a polymer having a sufficient number of times of breaking and folding may be used alone as a base material of the film, or a softening material may be mixed. Good, all of them may be made of flexible material (100%) and have a sufficient number of breaks and bends.
  • additives for example, an ultraviolet absorber, a matting agent, an antioxidant, a peeling accelerator, a retardation (optical anisotropy) regulator, etc.
  • They may be solid or oily. That is, its melting point or boiling point is not particularly limited.
  • the time of adding the additive may be added at any time in the step of producing the base material, or the step of adding and preparing the additive in the material preparation step may be added.
  • the addition amount of each material is not particularly limited as long as the function is exhibited.
  • the additives described in the step numbers [0 1 1 7] to [0 1 2 2] in JP-A No. 2 016 -1 6 7 0 4 3 are preferably used. it can.
  • One kind of the above additives may be used alone, or two or more kinds may be used in combination.
  • ultraviolet absorbers examples include benzotriazole compounds, triazine compounds, and benzoxazine compounds.
  • the benzotriazole compound is a compound having a benzotriazole ring, and specific examples thereof include various compounds described in paragraph 0 0 3 3 of JP-A No. 20 1 3 — 1 1 1 8 3 5
  • a benzotriazole type ultraviolet absorber can be mentioned. All ⁇ 2020/175 337 9 ⁇ (:171? 2020 /006912
  • the lyazine compound is a compound having a triazine ring, and specific examples thereof include various triazine-based UV absorbers described in paragraph 0033 of JP-A-2013-1111835.
  • benzoxazine compound for example, those described in JP-A-2014-209162, paragraph 0031 can be used.
  • the content of the ultraviolet absorber in the base material is, for example, about 0.1 to 10 parts by mass with respect to 100 parts by mass of the polymer contained in the base material, but is not particularly limited. Further, with respect to the ultraviolet absorber, reference can be made to JP-A No. 2013-111835, paragraph 0032.
  • an ultraviolet absorber having high heat resistance and low volatility is preferable. Examples of such UV absorbers include 11 3 0 [3 ⁇ 4mi 101 (manufactured by FUJIFILM Fine Chemicals Co., Ltd.), 1-111 111-360, 1-111 1
  • the base material has a small difference in refractive index between the flexible material and various additives used for the base material and the polymer.
  • the base material a base material containing an imide polymer can be preferably used.
  • the imide-based polymer means a polymer containing at least one repeating structural unit represented by the following formulas: (3), (3') and (3).
  • the repeating structural unit represented by the formula () is the main structural unit of the imido polymer.
  • the repeating structural unit represented by the formula () is preferably 40 mol% or more, more preferably 50 mol% or more, further preferably 50 mol% or more, based on all repeating structural units of the imide polymer 1. It is 70 mol% or more, particularly preferably 90 mol% or more, and most preferably 98 mol% or more.
  • ⁇ 3 represents a tetravalent organic group
  • 3 represents a divalent organic group.
  • Each of 0 4 and 4 in the formula (10) represents a divalent organic group.
  • the organic group of the tetravalent organic group represented by ⁇ (hereinafter, may be referred to as the organic group of ⁇ ) is an acyclic aliphatic group or a cyclic aliphatic group. And a group selected from the group consisting of aromatic groups. From the viewpoint of transparency and flexibility of the base material containing the imide polymer, the organic group of ⁇ is preferably a tetravalent cycloaliphatic group or a tetravalent aromatic group.
  • the aromatic group includes a monocyclic aromatic group, a condensed polycyclic aromatic group, and a non-condensed polycyclic aromatic group having two or more aromatic rings, which are directly or linked to each other by a bonding group.
  • the organic group of ⁇ is a cycloaliphatic group, a cycloaliphatic group having a fluorine-containing substituent, or a monocyclic aromatic group having a fluorine-containing substituent.
  • the fluorine-based substituent means a group containing a fluorine atom.
  • the fluorine-based substituent is preferably a fluoro group (fluorine atom, _) and a perfluoroalkyl group, and more preferably a fluoro group and a trifluoromethyl group.
  • the organic group represented by: is, for example, a saturated or unsaturated cycloalkyl group, a saturated or unsaturated heterocycloalkyl group, an aryl group, a heteroaryl group, an arylalkyl group, an alkylaryl group, And a heteroalkylaryl group, and any two groups (may be the same) of these groups, which are directly or linked to each other by a bonding group.
  • the bonding group one hundred and one, alkylene group of from 1 to 1 0 carbon atoms, _ 3_Rei 2 -, _ ⁇ _ ⁇ one or _ ⁇ _ ⁇ _ ([3 ⁇ 4 is a methyl group, an ethyl group, and propyl group having a carbon Which represents an alkyl group of the formula 1 to 3 or a hydrogen atom).
  • the tetravalent organic group represented by ⁇ usually has 2 to 32 carbon atoms, preferably 4 to 15 carbon atoms, more preferably 5 to 10 carbon atoms, and further preferably 6 to 8 carbon atoms. Is.
  • the organic group of ⁇ is a cycloaliphatic group or an aromatic group, at least one of the carbon atoms constituting these groups may be replaced with a hetero atom. Examples of the hetero atom include O, 1 ⁇ ] or 3.
  • an acyclic aliphatic group, a cyclic aliphatic group and an aromatic group are included. Examples include groups selected from the group consisting of group groups.
  • the divalent organic group represented by is preferably selected from a divalent cycloaliphatic group and a divalent aromatic group.
  • the aromatic group includes a monocyclic aromatic group, a condensed polycyclic aromatic group, and a non-condensed polycyclic aromatic group having two or more aromatic rings, which are directly or linked to each other by a bonding group. Groups. From the viewpoints of transparency of the base material and suppression of coloring, it is preferable that a fluorine-based substituent is introduced into the organic group.
  • the eight organic groups include, for example, a saturated or unsaturated cycloalkyl group, a saturated or unsaturated heterocycloalkyl group, an aryl group, a heteroaryl group, an arylalkyl group, an alkylaryl group, A heteroalkylaryl group, and any two of these groups (which may be the same), which are linked to each other directly or by a linking group.
  • the hetero atom, ⁇ include 1 ⁇ 1 or 3, as the bonding group, one hundred and one from 1 to 1 0 alkylene group carbon number one 3_Rei 2 -, one hundred one or one hundred one ([Including an alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group or a hydrogen atom]).
  • the carbon number of the divalent organic group represented by 8 is usually 2 to 40, and preferably
  • 1 and 3 are one hundred and one, and 2 _ ⁇ _1 ⁇ 1 2 -, _ ⁇ (Rei_1 ⁇ 1 3) 2 - or _ 3_Rei 2 -.
  • One or more hydrogen atoms of these groups may be substituted with a fluorine-based substituent.
  • At least one hydrogen atom of hydrogen atoms constituting at least one of 8 and ⁇ is selected from the group consisting of a fluorine-based substituent, a hydroxyl group, a sulfone group, and an alkyl group having 1 to 10 carbon atoms. May be substituted with at least one functional group.
  • the organic group of and the organic group of is respectively a cycloaliphatic group or an aromatic group, it is preferable that at least one of and has a fluorine-based substituent, and both of and are fluorine-based. It is more preferable to have a substituent.
  • ⁇ 2 in the formula (3) is a trivalent organic group.
  • This organic group is a trivalent group ⁇ 2020/175 337 14 ⁇ (:171? 2020 /006912
  • Expression (3' It can be selected from the same groups as ⁇ in formula (I). Eight- three in formula (3') can be selected from the same groups as eight in formula (I).
  • ⁇ 4 is a divalent organic group.
  • This organic group can be selected from the same groups as the organic group of ⁇ in the formula (), except that it is a divalent group.
  • a group in which any two of the four bonds of the groups represented by formula (20) to formula (26) given as specific examples of You can Eight four in formula (I) can be selected from the same groups as eight in formula (I).
  • the imide-based polymer contained in the base material containing the imide-based polymer includes a diamine, a tetracarboxylic acid compound (an acid chloride compound, and a tetracarboxylic acid compound analog such as tetracarboxylic dianhydride Or a tricarboxylic acid compound (including an acid chloride compound and a tricarboxylic acid compound analog such as a tricarboxylic acid anhydride), may be a condensation polymer obtained by polycondensation. Further, a dicarboxylic acid compound (including an analog such as an acid chloride compound) may be polycondensed.
  • the repeating structural unit represented by the formula () or the formula (3') is usually derived from a diamine and a tetracarboxylic acid compound.
  • the repeating structural unit represented by the formula (3) is usually derived from a diamine and a tricarboxylic acid compound.
  • the repeating structural unit represented by the formula ( ⁇ ) is usually derived from diamines and dicarboxylic acid compounds.
  • tetracarboxylic acid compound examples include aromatic tetracarboxylic acid compounds, alicyclic tetracarboxylic acid compounds, and acyclic aliphatic tetracarboxylic acid compounds. ⁇ 2020/175 337 15 ⁇ (:171? 2020 /006912
  • the tetracarboxylic acid compound is preferably tetracarboxylic dianhydride.
  • tetracarboxylic acid dianhydride examples include aromatic tetracarboxylic acid dianhydride, alicyclic tetracarboxylic acid dianhydride, and acyclic aliphatic tetracarboxylic acid dianhydride.
  • the tetracarboxylic acid compound is an alicyclic tetracarbone compound or an aromatic tetracarboxylic acid compound. Etc. are preferred.
  • a tetracarboxylic acid compound is an alicyclic tetracarboxylic acid compound having a fluorine-based substituent and an aromatic tetracarboxylic acid compound having a fluorine-based substituent. It is preferably selected from carboxylic acid compounds, and more preferably an alicyclic tetracarboxylic acid compound having a fluorine-based substituent.
  • Examples of the tricarboxylic acid compound include aromatic tricarboxylic acids, alicyclic tricarboxylic acids, acyclic aliphatic tricarboxylic acids and their related acid chloride compounds, and acid anhydrides.
  • the tricarboxylic acid compound is preferably selected from aromatic tricarboxylic acid, alicyclic tricarboxylic acid, acyclic aliphatic tricarboxylic acid and their related acid chloride compounds. Two or more tricarboxylic acid compounds may be used in combination.
  • the tricarboxylic acid compound is an alicyclic tricarboxylic acid compound or an aromatic compound. It is preferably a tricarboxylic acid compound.
  • the tricarboxylic acid compound is an alicyclic tricarboxylic acid compound having a fluorine-based substituent or an aromatic tricarboxylic acid compound having a fluorine-based substituent. More preferably.
  • dicarboxylic acid compound examples include aromatic dicarboxylic acids, alicyclic dicarboxylic acids, acyclic aliphatic dicarboxylic acids and their related acid chloride compounds, and acid anhydrides.
  • the dicarboxylic acid compound is preferably an aromatic dicarboxylic acid. It is selected from acids, alicyclic dicarboxylic acids, acyclic aliphatic dicarboxylic acids and their related acid chloride compounds. Two or more dicarboxylic acid compounds may be used in combination.
  • the dicarboxylic acid compound is an alicyclic dicarboxylic acid compound or an aromatic compound. It is preferably a dicarboxylic acid compound.
  • the dicarboxylic acid compound is an alicyclic dicarboxylic acid compound having a fluorine-based substituent or an aromatic dicarboxylic acid compound having a fluorine-based substituent from the viewpoint of transparency and suppression of coloration of a substrate containing an imide-based polymer. Is more preferable.
  • diamines examples include aromatic diamines, alicyclic diamines, and aliphatic diamines, and two or more of them may be used in combination.
  • diamines are alicyclic diamines and aromatic compounds having a fluorine-based substituent. It is preferably selected from diamines.
  • the use of such an imide-based polymer has particularly excellent flexibility and a high light transmittance (for example, 85% or more, preferably 88% or more with respect to light of 550 nm), It is easy to obtain a substrate having low yellowness (Y value, 5 or less, preferably 3 or less), and low haze (1.5% or less, preferably 1.0% or less).
  • the imide-based polymer may be a copolymer containing a plurality of different types of repeating structural units described above.
  • the weight average molecular weight of the polyimide-based polymer is usually 100,000 to 500,000.
  • the weight average molecular weight of the imide-based polymer is preferably 50,000 to 500,000, more preferably 70,000 to 400,000.
  • the weight average molecular weight is a standard polystyrene equivalent molecular weight measured by gel permeation chromatography (GPC). If the weight average molecular weight of the imido polymer is large, it tends to be easy to obtain high flexibility. ⁇ 2020/175 337 17 ⁇ (:171? 2020 /006912
  • the imide-based polymer may contain a halogen atom such as a fluorine atom that can be introduced by the above-mentioned fluorine-based substituent or the like.
  • a halogen atom such as a fluorine atom that can be introduced by the above-mentioned fluorine-based substituent or the like.
  • the halogen atom is preferably a fluorine atom.
  • the content of halogen atoms in the polyimide-based polymer is preferably 1 to 40 mass% based on the mass of the polyimide-based polymer,
  • the substrate containing the imide-based polymer may contain one kind or two or more kinds of ultraviolet absorbers.
  • the ultraviolet absorber can be appropriately selected from those commonly used as an ultraviolet absorber in the field of resin materials. UV absorbers
  • the ultraviolet absorber that can be appropriately combined with the imide-based polymer includes, for example, at least one compound selected from the group consisting of benzophenone-based compounds, salicylate-based compounds, benzotriazole-based compounds, and triazine-based compounds.
  • system compound refers to a derivative of the compound to which the “system compound” is attached.
  • benzophenone-based compound refers to a compound having benzophenone as a base skeleton and a substituent bonded to benzophenone.
  • the content of the ultraviolet absorber is usually 1% by mass or more, preferably 2% by mass or more, more preferably 3% by mass or more, usually 10% with respect to the total mass of the substrate. It is not more than 8% by mass, preferably not more than 8% by mass, more preferably not more than 6% by mass.
  • the weather resistance of the base material can be enhanced. ⁇ 2020/175 337 18 ⁇ (:171? 2020 /006912
  • the substrate containing the imide-based polymer may further contain an inorganic material such as inorganic particles.
  • the inorganic material is preferably a silicon material containing silicon atoms. Since the base material containing the imide-based polymer contains an inorganic material such as a silicon material, the tensile elastic modulus of the base material containing the imide-based polymer can be easily increased to 4.003 or more. However, the method of controlling the tensile elastic modulus of the base material containing the imide polymer is not limited to the compounding of the inorganic material.
  • Examples of the silicon material containing a silicon atom include silica particles, quaternary alkoxysilanes such as tetraethyl orthosilicate (Chomi 03), and silicon compounds such as silsesquioxane derivatives.
  • silicon materials silica particles are preferable from the viewpoint of transparency and flexibility of the substrate containing the imide polymer.
  • the average primary particle diameter of silica particles is usually 100 n It is the following. When the average primary particle size of silica particles is 100 n or less, transparency tends to improve.
  • the average primary particle diameter of silica particles in a substrate containing an imide-based polymer can be determined by observation with a transmission electron microscope (Cingemi IV!).
  • the primary particle size of the silica particles can be a unidirectional diameter measured by a transmission electron microscope (Dingmi IV!).
  • the average primary particle diameter can be obtained as an average value of 10 points of the primary particle diameter measured by observing D.
  • the particle distribution of silica particles before forming a base material containing an imide-based polymer can be obtained by a commercially available laser diffraction particle size distribution analyzer.
  • the mixing ratio of the imide-based polymer and the inorganic material is 1:9 to 10:0 in terms of mass ratio with the total of both being 10.
  • it is more preferably 3:7 to 10:0, and 3:7 to 8:
  • the ratio of the inorganic material to the total mass of the imido polymer and the inorganic material is usually 20% by mass or more, preferably 30% by mass or more, usually 90% by mass or less, and preferably 70% by mass. % Or less.
  • the imido polymer is ⁇ 2020/175 337 19 ⁇ (:171? 2020/006912
  • the transparency and mechanical strength of the substrate containing the limmer tend to be improved.
  • the tensile elastic modulus of the substrate containing the imide-based polymer can be easily increased to 4.03 or more.
  • the base material containing the imide-based polymer may further contain components other than the imide-based polymer and the inorganic material, as long as transparency and flexibility are not significantly impaired.
  • components other than the imide polymer and the inorganic material include antioxidants, release agents, stabilizers, coloring agents such as bluing agents, flame retardants, lubricants, thickeners and leveling agents.
  • the ratio of components other than imide-based polymers and inorganic materials is preferably more than 0% and 20% by mass or less, more preferably more than 0% and 10% by mass with respect to the mass of the base material. % Or less.
  • the substrate containing the imide-based polymer contains the imide-based polymer and the silicon material
  • the ratio of the number of silicon atoms to the number of nitrogen atoms on at least one surface of 3 / 1 ⁇ ! The above is preferable.
  • This atomic number ratio of 3 / / is X-ray photoelectron spectroscopy 1-101: 06 1 601:
  • the composition of the base material containing the imide-based polymer was evaluated by “0
  • 3 / 1 ⁇ 1 is more preferably 9 or more, further preferably 10 or more, preferably 50 or less, and more preferably 40 or less. ..
  • the base material is preferably in the form of a film.
  • the thickness of the base material is more preferably 100 or less, further preferably 80 or less, and most preferably 50 or less.
  • the thickness of the base material is thin, the difference in curvature between the front surface and the back surface during bending is small, cracks are less likely to occur, and breakage of the base material does not occur even if the base material is bent multiple times.
  • the thickness of the base material is preferably 3 or more, more preferably 5 or more, and most preferably 15 or more.
  • the base material may be formed by heat-melting a thermoplastic polymer, or may be formed by solution casting (solvent casting method) from a solution in which the polymer is uniformly dissolved.
  • solvent casting method solution casting method
  • the above-mentioned softening material and various additives can be added during heat melting.
  • the substrate is produced by the solution casting method
  • the above-mentioned softening material and various additives can be added to the polymer solution (hereinafter also referred to as a dope) in each preparation step.
  • the addition may be performed at any time in the dope preparation process, but may be carried out by adding the additive to the final preparation process of the dope preparation process.
  • the coating film may be heated for drying and/or baking the coating film.
  • the heating temperature of the coating film is usually 50 to 350 ° .
  • the coating film may be heated under an inert atmosphere or under reduced pressure.
  • the solvent can be evaporated and removed by heating the coating film.
  • the substrate, the method comprising the steps of drying the coating film at 5 0 ⁇ 1 5 0 ° ⁇ , and a step of 1 8 0 ⁇ 3 5 0 ° ⁇ Debe Kingu the coating film after drying, are formed Good.
  • At least one surface of the base material may be surface-treated.
  • the laminate of the present invention includes a hard coat layer.
  • the hard coat layer is formed on at least the _ side of the substrate.
  • the laminate of the present invention has at least one hard coat layer between the base material and the scratch resistant layer.
  • the hard coat layer of the laminate of the present invention comprises a polyorganosilsesquioxane (3 1) having a cation-polymerizable group, and a group containing a fluorine atom, a cation-polymerizable group and a radical-polymerizable group. It includes a cured product of the hard coat layer-forming composition containing the polymer (3). ⁇ 2020/175 337 21 ⁇ (: 171? 2020/006912
  • Polyorganosilsesquioxane having a cationically polymerizable group (3 1) Polyorganosilsesquioxane having a cationically polymerizable group (3 1) (“Polyorganosilsesquioxane (3 1)”
  • the cationically polymerizable group in the polyorganosilsesquioxane (31) is not particularly limited, and a generally known cationically polymerizable group can be used. Examples thereof include an alicyclic ether group, a cyclic acetal group, a cyclic lactone group, a cyclic thioether group, a spiro orthoester group, and a vinyloxy group.
  • an alicyclic ether group and a vinyloxy group are preferable, an epoxy group, an oxetanyl group and a vinyloxy group are particularly preferable, and an epoxy group is most preferable.
  • the epoxy group may be an alicyclic epoxy group (a group having a condensed ring structure of an epoxy group and an alicyclic group).
  • the polyorganosilsesquioxane (31) is preferably a polyorganosilsesquioxane represented by the following general formula (1).
  • [?] represents a group containing a cationically polymerizable group
  • Represents a monovalent group. And “represent the ratio of 13 and ⁇ in the general formula (1), +“ 100, is greater than 0, and is “0 or more.
  • a plurality of swallows and ⁇ may be the same or different, and when there are plural 80 in general formula (1), plural may form a bond with each other. ..
  • Polyorganosilsesquioxane is a network having a siloxane constitutional unit (silsesquioxane unit) derived from a hydrolyzable trifunctional silane compound. — A hexagonal polymer or a polyhedral cluster, which can form a random structure, a ladder structure, a cage structure, etc. by a siloxane bond.
  • siloxane constitutional unit siloxane constitutional unit derived from a hydrolyzable trifunctional silane compound.
  • a hexagonal polymer or a polyhedral cluster which can form a random structure, a ladder structure, a cage structure, etc. by a siloxane bond.
  • [S i ⁇ !. 5] structure represents portion may have any structure described above, but preferably contains a large amount of ladder structure. By forming the ladder structure, it is possible to maintain good deformation recovery of the laminate. Ladder structure shape
  • R b represents a group containing a cationically polymerizable group, and preferably a group containing an epoxy group.
  • Examples of the group containing an epoxy group include known groups having an oxirane ring.
  • R b is preferably a group represented by the following formulas (1 b) to (4 b).
  • ** represents a connecting portion with 3 m in the general formula (1), and is represented by [3 ⁇ 4 11 ⁇ [3 ⁇ 4 21 ⁇ Represents a single bond or a divalent linking group. [[ 3] and [[] are preferably substituted or unsubstituted alkylene groups.
  • alkylene group represented by [3 ⁇ 4 3 and [3 ⁇ 4 a linear or branched alkylene group having 1 to 10 carbon atoms is preferable, and examples thereof include a methylene group, a methylmethylene group, a dimethylmethylene group, an ethylene group, and examples thereof include a propylene group, a propylene group, a butyl-butylene group, an n-pentylene group, a hexylene group, and an n-decylene group. ⁇ 2020/175 337 24 ⁇ (: 171?
  • the alkylene group represented by 3 and 4 I has a substituent, the substituent is a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group, a silyl group, or the like.
  • the substituent is a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group, a silyl group, or the like.
  • an unsubstituted straight-chain alkylene group having 1 to 4 carbon atoms and an unsubstituted branched alkylene group having 3 or 4 carbon atoms are preferable, ethylene group, n-propylene More preferably, it is an ethylene group or a closed-propylene group.
  • the polyorganosilsesquioxane (31) preferably has an alicyclic epoxy group (a group having a condensed ring structure of an epoxy group and an alicyclic group).
  • an alicyclic epoxy group a group having a condensed ring structure of an epoxy group and an alicyclic group.
  • the general formula (1) is preferably a group having an alicyclic epoxy group, more preferably a group having an epoxycyclohexyl group, and a group represented by the above formula (1 13) Is more preferable.
  • the general formula (1) Is a group bonded to a silicon atom in the hydrolyzable trifunctional silane compound used as a raw material for the polyorganosilsesquioxane (a group other than an alkoxy group and a halogen atom; for example, represented by the formula (M) below. 13) in hydrolyzable silane compounds).
  • the monovalent group represented by ⁇ is a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted An unsubstituted aralkyl group may be mentioned.
  • Examples of the alkyl group represented by ⁇ include an alkyl group having 1 to 10 carbon atoms.
  • Examples thereof include straight-chain or branched-chain alkyl groups such as a methyl group, an ethyl group, a propyl group, a _butyl group, an isopropyl group, an isoptyl group, a 3_butyl group, a 1_butyl group, and an isopentyl group.
  • Examples of the cycloalkyl group represented by ⁇ include a cycloalkyl group having 3 to 15 carbon atoms, and examples thereof include a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
  • Examples of the alkenyl group represented by ⁇ include an alkenyl group having 2 to 10 carbon atoms, and examples thereof include a linear or branched alkenyl group such as a vinyl group, an allyl group and an isopropenyl group.
  • Examples of the aryl group represented by ⁇ include aryl groups having 6 to 15 carbon atoms, and examples thereof include a phenyl group, a tolyl group, and a naphthyl group.
  • the aralkyl group represented by ⁇ includes an aralkyl group having 7 to 20 carbon atoms, and examples thereof include a benzyl group and a phenethyl group.
  • the above-mentioned substituted alkyl group, substituted cycloalkyl group, substituted alkenyl group, substituted aryl group, and substituted aralkyl group include hydrogen atoms in each of the above-mentioned alkyl group, cycloalkyl group, alkenyl group, aryl group, and aralkyl group.
  • Part or all of the child or main chain skeleton is from the group consisting of ether group, ester group, carbonyl group, halogen atom (fluorine atom, etc.), acryl group, methacryl group, mercapto group, and hydroxy group (hydroxyl group) Examples include groups substituted with at least one selected.
  • is preferably a substituted or unsubstituted alkyl group and has an unsubstituted carbon number of 1 to 1
  • the plurality of O may form a bond with each other. It is preferable that two or three O's form a bond with each other, and it is more preferable that two O's form a bond with each other.
  • a group formed by bonding two ⁇ to each other Is preferably an alkylene group formed by combining the substituted or unsubstituted alkyl groups represented by the above.
  • An unsubstituted alkylene group having 2 to 20 carbon atoms is preferable, more preferably an unsubstituted alkylene group having 2 to 20 carbon atoms, and further preferably an unsubstituted alkylene group having 2 to 8 carbon atoms, Especially preferably! ...!—Putylene group, Pentylene group, Hexylene group, 1-1-heptylene group, 1-1-octylene group.
  • the alkylene group represented by 2 is preferably a trivalent group in which any hydrogen atom in the alkylene group is reduced by one.
  • the general formula (1) Is a group bonded to a silicon atom in a hydrolyzable silane compound used as a raw material of polyorganosilsesquioxane (a group other than an alkoxy group and a halogen atom; In the hydrolyzable silane compound represented ⁇ 3 etc.).
  • (+ “) is preferably from 0.5 to 1.0.
  • the total amount of the group represented by the swallow or ⁇ contained in the polyorganosilsesquioxane (3 1) Since the network formed by the organic cross-linking group is sufficiently formed, it is possible to maintain good hardness and repeated bending resistance.
  • 4 + 0 is more preferably 0.7 to 1.0, further preferably 0.9 to 1.0, and particularly preferably 0.95 to 1.0.
  • 4+0 is more preferably 0.005 to 0.01, more preferably 0.005 to 0.05, and particularly preferably 0.005 to 0.025.
  • the molecular weight dispersity (Mw/Mn) of polyorganosilsesquioxane (3 1) in terms of standard polystyrene by ⁇ is, for example, 1.0 to 4.0, preferably 1.1. To 3.7, more preferably 1.2 to 3.0, and further preferably 1.3 to 2.5. IV! represents the weight average molecular weight, and IV! n represents the number average molecular weight.
  • the weight average molecular weight and molecular weight dispersity of the polyorganosilsesquioxane (31) are measured by the following apparatus and conditions.
  • Measuring device Product name "!_ (3-20 8 0" (manufactured by Shimadzu Corporation) Column: 3 0 6 fathers [ ⁇ 801 x 2 pcs, [ ⁇ 1802, and ⁇ - 803 (Showa Denko KK ) Made)
  • Detector 11 _ ⁇ 3 detectors (brand name "30 _ 20 8", manufactured by Shimadzu Corporation)
  • the polyorganosilsesquioxane (31) can be produced by a known production method, and is not particularly limited, but it is produced by a method of hydrolyzing and condensing one or more hydrolyzable silan compounds. it can.
  • a hydrolyzable silane compound a hydrolyzable trifunctional silane compound (a compound represented by the following formula (M)) for forming a siloxane constitutional unit containing an epoxy group is used as the hydrolyzable silane compound.
  • M hydrolyzable trifunctional silane compound
  • X 2 in the formula (Mi) represents an alkoxy group or a halogen atom.
  • alkoxy group for X 2 examples include an alkoxy group having 1 to 4 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, an isopropyloxy group, a butoxy group and an isoptyloxy group.
  • halogen atom for X 2 examples include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
  • an alkoxy group is preferable, and a methoxy group and an ethoxy group are more preferable.
  • the three X 2 may be the same or different. ⁇ 2020/175 337 30 ⁇ (:171? 2020 /006912
  • the compound represented by the above formula (M) is a compound forming a siloxane constitutional unit having a gap.
  • X 3 in the above formulas ( ⁇ 1) to ( ⁇ 3) has the same meaning as X 2 in the above formula (M), and the preferred examples are also the same.
  • a plurality of X 3's may be the same or different.
  • hydrolyzable silane compound a hydrolyzable silane compound other than the compounds represented by the formulas (M) and ( ⁇ 31) to (03) may be used in combination.
  • Examples thereof include trifunctional silane compounds, hydrolyzable monofunctional silane compounds, and hydrolyzable bifunctional silane compounds.
  • [0107] is a hydrolyzable silane compound represented by the above formulas ( ⁇ 31) to (03).
  • / (+ ⁇ ) in the general formula (1) it suffices to adjust the compounding ratio (molar ratio) of the compounds represented by the above formulas (M) and ( ⁇ 3 1) to (0 3). ..
  • the value represented by the following (2) should be 0.5 to 1.0, and these compounds should be produced by hydrolysis and condensation. ..
  • the amount and composition of the above hydrolyzable silane compound can be appropriately adjusted according to the desired structure of the polyorganosilsesquioxane (31).
  • hydrolysis and condensation reaction of the hydrolyzable silane compound can be performed simultaneously or sequentially.
  • the order of performing the reactions is not particularly limited.
  • the hydrolysis and condensation reaction of the hydrolyzable silane compound can be carried out in the presence or absence of a solvent, and is preferably carried out in the presence of a solvent.
  • the solvent examples include aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene; ethers such as diethyl ether, dimethoxyethane, tetrahydrofuran and dioxane; ketones such as acetone, methyl ethyl ketone and methyl isoptyl ketone; acetic acid.
  • aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene
  • ethers such as diethyl ether, dimethoxyethane, tetrahydrofuran and dioxane
  • ketones such as acetone, methyl ethyl ketone and methyl isoptyl ketone
  • acetic acid examples include aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene; ethers such as diethyl ether, dim
  • Esters such as methyl, ethyl acetate, isopropyl acetate, and butyl acetate; 1 ⁇ 1, 1 ⁇ 1-dimethylformamide, 1 ⁇ 1, 1 ⁇ 1-amide such as dimethylacetamide; acetonitrile, propionitrile , Nitrile such as benzonitrile; methanol, ethanol, isopropyl alcohol ⁇ 2020/175 337 32 ⁇ (: 171? 2020 /006912
  • the solvent is preferably ketone or ether.
  • the solvent may be used alone or in combination of two or more.
  • the amount of the solvent used is not particularly limited, and within a range of 0 to 200 parts by mass with respect to the total amount of the hydrolyzable silane compound of 100 parts by mass, a desired reaction time, etc. It can be adjusted accordingly.
  • the hydrolysis and condensation reactions of the hydrolyzable silane compound are preferably allowed to proceed in the presence of a catalyst and water.
  • the catalyst may be an acid catalyst or an alkali catalyst.
  • Examples of the above-mentioned acid catalyst include mineral acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid and boric acid; phosphoric acid esters; carboxylic acids such as acetic acid, sacrificial acid and trifluoroacetic acid; methansulfonic acid, trifluoromethanesulfonic acid, Examples thereof include sulfonic acids such as toluenesulfonic acid; solid acids such as activated clay; Lewis acids such as iron chloride.
  • alkali catalyst examples include hydroxides of alkali metals such as lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide; alkaline earth metals such as magnesium hydroxide, calcium hydroxide and barium hydroxide.
  • nitrogen-containing aromatic heterocyclic compounds such as 2,2′-bibilidyl and 1,10-phenanthroline.
  • the catalyst may be used alone or in combination of two or more.
  • the catalyst can also be used in a state of being dissolved or dispersed in water, an organic solvent or the like.
  • the catalyst is preferably a base catalyst.
  • a base catalyst By using a base catalyst, the condensation rate of polyorganosilsesquioxane can be increased, and the deformation recovery rate upon curing can be kept good.
  • the amount of the catalyst used is not particularly limited, and may be appropriately adjusted within the range of 0.002 to 0.200 mol based on 1 mol of the total amount of the hydrolyzable silane compound. You can
  • the amount of water used in the hydrolysis and condensation reaction is not particularly limited, and may be appropriately in the range of 0.5 to 20 mol with respect to 1 mol of the total amount of the hydrolyzable silane compound. Can be adjusted.
  • the method for adding the water is not particularly limited, and the total amount of water used (total amount used) may be added all at once or sequentially. When they are added sequentially, they may be added continuously or intermittently.
  • the reaction conditions for carrying out the hydrolysis and condensation reaction of the above-mentioned hydrolyzable silane compound are, in particular, a reaction such that the condensation rate of the polyorganosilsesquioxane (31) is 80% or more. It is important to choose the conditions.
  • the reaction temperature of the hydrolysis and condensation reaction is, for example, 40 to 100 ° , preferably 45 to 80 ° . By controlling the reaction temperature within the above range, the condensation rate tends to be controlled to 80% or more.
  • the reaction time of the hydrolysis and condensation reactions is, for example, 0.1 to 10 hours, preferably 1.5 to 8 hours.
  • the above hydrolysis and condensation reaction can be carried out under normal pressure, or under pressure or under reduced pressure.
  • the atmosphere during the hydrolysis and condensation reaction may be, for example, an atmosphere of an inert gas such as a nitrogen atmosphere or an argon atmosphere, or the presence of oxygen such as an air. atmosphere Lower is preferred.
  • the polyorganosilsesquioxane (a 1) is obtained by the hydrolysis and condensation reaction of the hydrolyzable silane compound. After completion of the hydrolysis and condensation reactions, it is preferable to neutralize the catalyst in order to suppress ring opening of the epoxy group.
  • polyorganosilsesquioxane (a 1) can be separated by, for example, washing with water, washing with acid, washing with alkali, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, or a combination thereof. It may be separated and purified by a separation means or the like.
  • the polyorganosilsesquioxane (a 1) condensation rate is preferably 80% or more from the viewpoint of film hardness.
  • the condensation rate is more preferably 90% or more, further preferably 95% or more.
  • the condensation rate is calculated using 29 Si NMR (nuclear magnetic resonance) spectrum measurement on a sample having a hard coat layer containing a cured product of polyorganosilsesquioxane (a 1) and using the measurement result. It is possible to calculate 29 Si NMR (nuclear magnetic resonance) spectrum measurement on a sample having a hard coat layer containing a cured product of polyorganosilsesquioxane (a 1) and using the measurement result. It is possible to
  • the epoxy group is preferably ring-opened by a polymerization reaction.
  • the epoxy group ring-opening rate of the cured product of the polyorganosilsesquioxane (a 1) having an epoxy group is preferably 40% or more from the viewpoint of the hardness of the film.
  • the ring opening rate is more preferably 50% or more, further preferably 60% or more.
  • the ring-opening rate is F T-IR (Fourier I ransrorm Infrared Spectroscopy) of the sample before and after the complete curing and heat treatment of the composition for forming a hard core layer containing polyorganosilsesquioxane (a 1).
  • F T-IR Fastier I ransrorm Infrared Spectroscopy
  • ATR Average Total Reef Iection
  • the polyorganosilsesquioxane (31) may be used alone or in combination of two or more having different structures.
  • the content of 3 1) is preferably 50% by mass or more, and more preferably 70% by mass or more, based on the total solid content of the composition for forming a hard coat layer. More preferably, it is at least mass %.
  • the upper limit of the content of polyorganosilsesquioxane (81) in the hard coat layer-forming composition is 99.9% by mass or less based on the total solid content of the hard coat layer-forming composition.
  • the amount is preferably 98% by mass or less, more preferably 97% by mass or less.
  • the total solid content refers to all components other than the solvent.
  • the polymer (3) As described above for the polymer (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group (also referred to as “polymer (3) ”), the polymer (3) is a hard resin. It can function as an interlayer adhesive that enhances the adhesion between the coat layer and the scratch resistant layer.
  • the group containing a fluorine atom in the polymer (3) is a group containing at least one fluorine atom, and includes, for example, a fluorine atom and an organic group having at least one fluorine atom.
  • examples include groups.
  • the organic group include an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an alkynyl group, a cycloalkynyl group, an aryl group, and a group formed by combining at least two of these, and an alkyl group is preferable. preferable.
  • alkyl group, cycloalkyl group, alkenyl group, cycloalkenyl group, alkynyl group, cycloalkynyl group and aryl group may further have a substituent in addition to the fluorine atom. ⁇ 2020/175 337 36 ⁇ (:171? 2020 /006912
  • the fluorine-containing group is preferably a fluoroalkyl group having 1 to 20 carbon atoms, more preferably a fluoroalkyl group having 2 to 15 carbon atoms, and a fluoroalkyl group having 4 to 10 carbon atoms. It is more preferable that the fluoroalkyl group is a fluoroalkyl group having 4 to 8 carbon atoms.
  • the number of fluorine atoms in one fluorine-containing group is preferably 3 or more, more preferably 5 or more, and further preferably 9 or more.
  • the number of fluorine atoms in one fluorine-containing group is preferably 17 or less, and more preferably 13 or less.
  • the fluorine-containing group is preferably a group represented by the following general formula (Chi...!).
  • 91 is preferably an integer of 1 to 7, more preferably an integer of 1 to 5, and even more preferably 1 or 2.
  • 92 is preferably an integer of 2 to 8, more preferably an integer of 4 to 8, and even more preferably an integer of 4 to 6.
  • the cation-polymerizable group in the polymer (3) is not particularly limited, and a generally known cation-polymerizable group can be used. Specifically, an alicyclic ether group, a cyclic acetal group, a cyclic lactone group can be used. , A cyclic thioether group, a spiro orthoester group, a vinyloxy group and the like. As the cationic polymerizable group, an alicyclic ether group and a vinyloxy group are preferable, an epoxy group, an oxetanyl group and a vinyloxy group are particularly preferable, and an epoxy group is most preferable. ⁇ 0 2020/175 337 37 ⁇ (: 17 2020 /006912
  • the epoxy group may be an alicyclic epoxy group (a group having a condensed ring structure of an epoxy group and an alicyclic group).
  • each of the above groups may have a substituent.
  • the cationically polymerizable group is a group represented by the following formula (6-1), a group represented by the following general formula (6-2), or a group represented by the following general formula (6-3). It is preferable to have.
  • alkyl group having 1 to 6 carbon atoms examples include a methyl group, an ethyl group, a 11-propyl group, a __propyl group, a s-butyl group, a s-hexyl group and the like.
  • alkyl group has a substituent
  • substituents include a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group and a silyl group.
  • 8 13 is preferably an unsubstituted linear alkyl group having 1 to 3 carbon atoms, and more preferably a methyl group or an ethyl group.
  • alkyl group having 1 to 6 carbon atoms include a methyl group, an ethyl group, a 11-propyl group, a __propyl group, a door-butyl group, a door-hexyl group and the like.
  • examples of the substituent include a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group and a silyl group.
  • 93 represents an integer of 0 to 2, preferably 0 or 1, and more preferably 0.
  • the radically polymerizable group in the polymer (3) is not particularly limited, and a generally known radically polymerizable group can be used.
  • the radically polymerizable group include a polymerizable unsaturated group, specifically, a (meth)acryloyl group, a vinyl group, an allyl group and the like, and a (meth)acryloyl group is preferable.
  • Each of the above groups may have a substituent.
  • the content molar ratio of the structural unit having a fluorine atom is preferably more than 1 mol% and less than 70 mol% with respect to all the structural units,
  • the molar ratio of the constituent units having a fluorine atom is more than 1 mol% and less than 50 mol% with respect to all the constituent units, whereby the radical polymerizable group in the polymer (3) is A radical contained in the composition for forming a scratch resistant layer ⁇ 2020/175 337 39 ⁇ (:171? 2020 /006912
  • the polymerization reaction of the polymerizable compound (O 1) with the radically polymerizable group is not easily inhibited, the adhesion between the hard coat layer and the scratch resistant layer is increased, and the scratch resistance is easily improved, which is preferable.
  • the molar ratio of the constituent units having a cationically polymerizable group in the polymer (3) is more than 25 mol% and not more than 85 mol% with respect to all the constituent units. Is preferable, 30 mol% or more and 85 mol% or less is more preferable, and 30 mol% or more and 60 mol% or less is further preferable.
  • the content molar ratio of the structural unit having a radically polymerizable group in the polymer _) is preferably more than 1 mol% with respect to all the structural units. It is more preferably at least 90 mol% and more preferably at least 30 mol% and not more than 60 mol%.
  • the weight average molecular weight (IV!) of the polymer (3) is preferably 500 to 500.
  • 00 more preferably 1 000 to 30000, further preferably 1 500 to 1 2000, even more preferably 1 500 to 1 0000, particularly preferably 1 500 to 6000, and most preferably 1 500 to 4500.
  • Molecular weight dispersity of polymer (3) Is, for example, 1.00 to 4.
  • N represents the weight average molecular weight
  • IV! n represents the number average molecular weight
  • the weight average molecular weight and the molecular weight dispersity of the polymer _ (3) are measured values of OO (in terms of polystyrene).
  • the weight average molecular weight, specifically prepared 1-1! _ As a device (3_8220 (manufactured by Tosoh Corporation), with tetrahydrofuran as the eluent, Ding 3 ⁇ 9 6 I (registered trademark) ⁇ as column 30001 ⁇ 1 ⁇ 1 _ + Ding 3 [ ⁇ 96 I (registered trademark) ⁇ 20001 ⁇ 1 ⁇ 1 _, temperature 23°0, flow rate 1 / n , differential refractive index ([3 ⁇ 4 ⁇ ) detection Measure with a measuring instrument.
  • the polymer (3) may be used alone or in combination of two or more having different structures. ⁇ 2020/175 337 40 ⁇ (:171? 2020 /006912
  • the content of the polymer (3) in the composition for forming a hard coat layer in the present invention is, based on the total solid content of the composition for forming a hard coat layer, from the viewpoint of scratch resistance and suppression of whitening. 0.01 to 5 mass% is preferable, 0.01 to 3 mass% is more preferable, and 0.01 to 2 mass% is even more preferable, and 0.01 to It is particularly preferably 1% by mass.
  • the structure of the polymer (3) is not particularly limited, but it is preferably polyorganosilsesquioxane or (meth)acrylic polymer, and more preferably polyorganosilsesquioxane.
  • the polymer (3) is polyorganosilsesquioxane, whitening is particularly reduced in the laminate of the present invention, which is preferable.
  • the composition for forming a hard coat layer in the present invention contains the above-mentioned polyorganosylsesquioxane (31), the polymer (3) is a polyorganosil. It is considered that this is because sesquioxane has high compatibility with polyorganosylsesquioxane (31) and therefore has high homogeneity in the vicinity of the surface of the hard coat layer (not like microphase separation).
  • polymer (3) is polyorganosilsesquioxane
  • polymer (3) is also referred to as polyorganosilsesquioxane (33).
  • polyorganosilsesquioxane (33) is not particularly limited, and may have a structure that can be adopted as polyorganosilsesquioxane, such as a random structure, a ladder structure, or a cage structure. I like to be there.
  • Polyorganosilsesquioxane (3 3) is a silsesquioxane unit having a group containing a fluorine atom, a silsesquioxane unit having a cationically polymerizable group, and a silsesquioxane unit having a radically polymerizable group. It is preferable to have
  • Polyorganosilsesquioxane (33) is represented by the following general formula (3-1). ⁇ 0 2020/175 337 41 ⁇ (: 17 2020 /006912
  • 1_ 2 represents a single bond or a divalent linking group, 0 2 denotes the Kachio down polymerizable group.
  • 1_ 3 represents a single bond or a divalent linking group
  • 0 3 represents the radical Le polymerizable group
  • the molar ratio of the constituent units represented by the general formula (3-1) is more than 1 mol% and not more than 70 mol% based on all constituent units. Is more preferable, 3 mol% or more and 50 mol% or less is more preferable, and 5 mol% or more and 20 mol% or less is further preferable.
  • the content molar ratio of the structural unit represented by the general formula (3-2) is 15% or more and 85 5% or less based on all the structural units. Is more preferable, 30 mol% or more and 80 mol% or less is more preferable, 30 mol% or more and 70 mol% or less is further preferable, and 30 mol% or more and 60 mol% or more is preferable. % Or less is particularly preferable.
  • the content molar ratio of the structural unit represented by the general formula (3-3) is more than 1 mol% based on all the structural units. ⁇ 2020/175 337 42 ⁇ (: 171? 2020 /006912
  • an organic linking group having 1 to 20 carbon atoms eg, an alkylene group which may have a substituent, a cycloalkylene group which may have a substituent, and a substituent
  • an arylene group e.g., an organic linking group having 1 to 20 carbon atoms (eg, an alkylene group which may have a substituent, a cycloalkylene group which may have a substituent, and a substituent) Or an arylene group), or a linking group formed by combining two or more of these.
  • the above represents a hydrogen atom or a substituent.
  • _ general formula (3_ 1) a structural unit represented by the following _ general formula - is preferably a structural unit table in (3_ 1 ⁇ ).
  • 9 1 represents an integer from 0 to 12
  • 92 represents an integer from 1 to 8
  • 1_ 2 represents a single bond or a divalent linking group.
  • 1_ 2 is bivalent ⁇ 02020/175 337 43 ⁇ (: 17 2020 /006912
  • an alkylene group of 0 good carbon atoms 1-1 may have a substituent, one hundred and one, one thousand and one, ten thousand and one one OO 1, 1, 3 -, or a linking group formed by combining two or more of these is preferable, an alkylene group having 1 to 5 carbon atoms which may have a substituent, _ ⁇ 1, _ ⁇ ⁇ one,
  • 301 is a linking group formed by combining two or more of these, and an alkylene group having 1 to 5 carbon atoms which may have a substituent, or a substituted group.
  • a linking group formed by combining a C1-5 alkylene group which may have a group and 101 is more preferable.
  • 0 2 represents a cation polymerizable group.
  • the cationically polymerizable group is the same as described above.
  • structural units represented by the general formula (3_2), structural units represented by the following general formula (3_2_ 6 1), the structural unit represented by the following general formula (3_2_ 6 2), or the following general formula is preferably a structural unit represented by (3_2_ 6 3).
  • 1_ 2 represents a single bond or a divalent linking group.
  • Or 1 or 2 represents a single bond or a divalent linking group.
  • 1_ 2 represents a single bond or a divalent linking group.
  • 1 2 is the same as 1_ 2 in the above general formula (3-2).
  • 1-3 represents a single bond or a divalent linking group.
  • Specific examples and preferred ranges in the case where 1_ 3 represents a divalent linking group are the same as those in the above 1_ 2 .
  • 0 3 represents a radical polymerizable group.
  • the radical polymerizable group is the same as described above.
  • the constitutional unit represented by the general formula (3_3) may be a constitutional unit represented by the following general formula (3_3_ "1") or a constitutional unit represented by the following general formula (3_3_ "2). Preferred.
  • Formula (3_3_ "1), 1_ 3 represents a single bond or a divalent linking group, Represents a hydrogen atom or a methyl group.
  • 1_ 3 represents a single bond or a divalent linking group.
  • the method for producing the polyorganosilsesquioxane (33) is not particularly limited. ⁇ 2020/175 337 49 2020/006912
  • hydrolyzable silane compound a hydrolyzable trifunctional silane compound having a group containing a fluorine atom (preferably represented by the following general formula (3 _ 1) represented by the formula), a hydrolyzable trifunctional silane compound having a cationically polymerizable group (preferably a compound represented by the following general formula (30 1 _2)), and a radically polymerizable group. It is preferable to use a hydrolyzable trifunctional silane compound (preferably a compound represented by the following general formula (3_3)).
  • X 4 ⁇ X 6 each independently represent an alkoxy group or a halogen atom
  • l 1 represents a single bond or a divalent linking group
  • X 7 ⁇ X 9 each independently represent an alkoxy group or a halogen atom
  • 1_ 2 represents a single bond or a divalent linking group
  • 0 2 represents a cation polymerizable group.
  • X 1 ⁇ to X 12 are each independently an alkoxy group or halogen. ⁇ 2020/175 337 50 ⁇ (:171? 2020 /006912
  • X 4 - X 12 represents an alkoxy group or a halogen atom independently.
  • alkoxy group examples include methoxy group, ethoxy group, propoxy group, isopropyloxy group, butoxy group, isoptyloxy group, and other alkoxy groups having 1 to 4 carbon atoms.
  • halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
  • X 4 to X 12 an alkoxy group is preferable, and a methoxy group and an ethoxy group are more preferable.
  • X 4 to X 12 may be the same or different.
  • the amount and composition of the hydrolyzable silane compound can be appropriately adjusted according to the desired structure of the polyorganosilsesquioxane (33).
  • hydrolysis and condensation reactions of the hydrolyzable silane compound can be performed simultaneously or sequentially.
  • the order of performing the reactions is not particularly limited.
  • hydrolysis and condensation reactions of the hydrolyzable silane compound can be carried out in the presence or absence of a solvent, and are preferably carried out in the presence of a solvent.
  • solvent examples include aromatic hydrocarbons such as benzene, toluene, xylene, and ethylbenzene; diethyl ether, dimethyethane, and tetrahydine. ⁇ 2020/175 337 51 ⁇ (:171? 2020 /006912
  • Ethers such as drofuran and dioxane; ketones such as acetone, methyl ethyl ketone, methyl isopropyl ethyl ketone; esters such as methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate; 1 ⁇ 1, 1 ⁇ 1-dimethylformamide, 1 ⁇ 1, 1 ⁇ 1 - amino-de-such as dimethyl acetamidine de; acetonitrile, propionitrile, nitrile such as base Nzonitoriru; methanol, ethanol, isopropyl alcohol _ le, alkoxyalkyl _ le such as butanol _ le and the like .
  • the solvent is preferably ketone or ether.
  • the solvent may be used alone or in combination of two or more.
  • the amount of the solvent used is not particularly limited, and is usually the total amount of the hydrolyzable silane compound.
  • the hydrolysis and condensation reactions of the hydrolyzable silane compound are preferably allowed to proceed in the presence of a catalyst and water.
  • the catalyst may be an acid catalyst or an alkali catalyst.
  • the acid catalyst is not particularly limited, and examples thereof include mineral acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid and boric acid; phosphoric acid esters; carboxylic acids such as acetic acid, sacrificial acid and trifluoroacetic acid; methanesulfonic acid, Trifluoromethanesulfonic acid, Examples thereof include sulfonic acids such as toluene sulfonic acid; solid acids such as activated clay; Lewis acids such as iron chloride.
  • the alkali catalyst is not particularly limited, and examples thereof include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, and cesium hydroxide; magnesium hydroxide, calcium hydroxide, barium hydroxide, and the like.
  • Alkaline earth metal hydroxides lithium carbonates, sodium carbonates, potassium carbonates, cesium carbonates and other alkali metal carbonates; magnesium carbonates and other alkaline earth metal carbonates; lithium hydrogen carbonate, sodium hydrogen carbonate, carbonic acid
  • Alkali metal hydrogencarbonates such as potassium hydrogen and cesium hydrogen carbonate
  • Organic acid salts of alkali metals such as lithium acetate, sodium acetate, potassium acetate and cesium acetate (eg acetate);
  • Alkaline earths such as magnesium acetate Metal organic acid salt (eg ⁇ 2020/175337 52 ⁇ (:171? 2020/006912
  • the catalyst may be used alone or in combination of two or more.
  • the catalyst can also be used in a state of being dissolved or dispersed in water, a solvent or the like.
  • the amount of the catalyst used is not particularly limited, and is usually adjusted appropriately within the range of 0.002 to 0.20.2 mol with respect to 1 mol of the total amount of the hydrolyzable silane compound. You can
  • the amount of water used in the hydrolysis and condensation reactions is not particularly limited, and is usually within a range of 0.5 to 40 mols based on 1 mol of the total amount of the hydrolyzable silane compound, It can be adjusted appropriately.
  • the method for adding the water is not particularly limited, and the total amount of water used (total amount used) may be added all at once or sequentially. When they are added sequentially, they may be added continuously or intermittently.
  • reaction temperature of the hydrolysis and condensation reaction is not particularly limited, and may be, for example, 40 to
  • the reaction time of the hydrolysis and condensation reaction is not particularly limited and is, for example, 0.1 to 15 hours, and preferably 1.5 to 10 hours. Further, the hydrolysis and condensation reactions can be carried out under normal pressure, or under pressure or under reduced pressure.
  • the atmosphere for the hydrolysis and condensation reaction may be, for example, an atmosphere of an inert gas such as a nitrogen atmosphere or an argon atmosphere, or the presence of oxygen such as an air. A gas atmosphere is preferable. ⁇ 0 2020/175 337 53 ⁇ (: 17 2020 /006912
  • the polyorganosilsesquioxane (33) can be obtained by the hydrolysis and condensation reaction of the hydrolyzable silane compound. After completion of the hydrolysis and condensation reactions, the catalyst may be neutralized.
  • polyorganosilsesquioxane (33) can be separated by, for example, washing with water, washing with acid, washing with alkali, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, and other separation means. It may be separated and purified by a combination of separating means.
  • the polymer (3) is an acrylic polymer
  • the polymer (3) is also called (medium) acrylic polymer (38).
  • the (meth)acrylic polymer (38) may have a group containing a fluorine atom in its side chain, and may not have a fluorine atom in its main chain, from the viewpoint of adhesion to the scratch resistant layer. preferable.
  • the (meth) acrylic polymer (38) is a structural unit represented by the following general formula (1), a structural unit represented by the following general formula (_2), and a general formula (_3) below. It is preferable to have a structural unit represented by
  • IV 2 represents a hydrogen atom or a methyl group
  • 1_ 5 represents a single bond or a divalent linking group
  • ⁇ 5 represents a cation polymerizable group.
  • IV! 3 represents a hydrogen atom or a methyl group
  • 1_ ⁇ is a single bond or ⁇ 2020/175 337 54 ⁇ (: 171? 2020 /006912
  • 1_ 4 represents a single bond or a divalent linking group
  • 1_ 4 represents a divalent linking group
  • the specific examples are as follows.
  • 0 4 represents a group containing a fluorine atom.
  • the group containing a fluorine atom is the same as described above.
  • _ general formula structural units represented by (_ 1) is preferably a structural unit table below _ general formula (an "! One-! 1).
  • 0 2 represents a cation polymerizable group.
  • the cationically polymerizable group is the same as described above.
  • structural units represented by the general formula (_2), structural units represented by the following general formula (_2_ 6 1), the structural unit represented by the following general formula (_2_ 6 2), or the following general formula is preferably a structural unit represented by (_2_ 6 3). ⁇ 2020/175 337 55
  • IV! 2 represents a hydrogen atom or a methyl group
  • 1-5 represents a single bond or a divalent linking group.
  • IV! 2 represents a hydrogen atom or a methyl group, It represents an elementary atom or a substituted or unsubstituted alkyl group, and 1-5 represents a single bond or a divalent linking group.
  • IV! 2 represents a hydrogen atom or a methyl group, It represents a substituted or unsubstituted alkyl group. 3 represents an integer from 0 to 2. When there are two or more, they may be the same as or different from each other. 1_ 5 represents a single bond or a divalent linking group.
  • 1_ 6 represents a single bond or a divalent linking group.
  • Specific examples and preferred range when 1_ 6 represents a divalent linking group are the same as 1_ 3 in the aforementioned general formula (3_3).
  • the structural unit represented by general formula (_3) is a structural unit represented by the following general formula (_3_ “1”) or a structural unit represented by the following general formula (_3_ “2) Is preferred.
  • IV! 3 represents a hydrogen atom or a methyl group
  • 1_ 6 represents a single bond or a divalent linking group.
  • the method for producing the (meth)acrylic polymer (38) is not particularly limited, and it can be produced by a known production method.
  • a monomer having a (meth)acryloyl group is radically polymerized. It can be manufactured by the method.
  • Compound represented by the following general formula (_ 1) corresponds to a structural unit table by the general formula (_ 1), compounds represented by the following general formula (_2), the top Symbol _ general formula ( corresponding with the structural unit represented by _2), a compound represented by the following _ general formula (Rei_1 _3) corresponds to the constitutional unit represented by the general formula (_3)
  • IV! 2 represents a hydrogen atom or a methyl group
  • 1-5 represents a single bond or a divalent linking group
  • 0 5 represents a cation polymerizable group.
  • 1 ⁇ /1 3 represents a hydrogen atom or a methyl group
  • 1_ 6 is a single bond.
  • 0 6 represents a radical polymerizable group.
  • composition for forming a hard coat layer in the present invention preferably contains a cationic polymerization initiator.
  • composition for forming a hard coat layer in the present invention which contains a cationic polymerization initiator, can favorably proceed the polymerization reaction of the polyorganosilsesquioxane (3 1) and the cationically polymerizable group of the polymer (5). It is possible to combine the polyorganosilsesquioxane (81) and the polymer (3) in the hard coat layer.
  • the cationic polymerization initiator may be a photopolymerization initiator or a thermal polymerization initiator.
  • the content of the cationic polymerization initiator in the composition for forming the hard coat layer is not particularly limited, but for example, polyorganosilsesquioxane (3 1)
  • the composition for forming a hard coat layer in the present invention may contain a solvent.
  • a solvent an organic solvent is preferable, and one kind or two or more kinds of organic solvents can be mixed and used at an arbitrary ratio.
  • Specific examples of the organic solvent include, for example, methanol, ethanol, propanol, 11 _ butanol, _ _ butano. ⁇ 2020/175 337 62 ⁇ (:171? 2020/006912
  • -Alcohols such as acetone; Ketones such as acetone, methylisoptylketone, methylethylketone and cyclohexanone; Cellosolves such as ethylcellosolve; Aromatic compounds such as toluene and xylene; Propylene glycol monomethyl ether etc. Glycol ethers; acetic acid esters such as methyl acetate, ethyl acetate and butyl acetate; diacetone alcohol and the like.
  • the content of the solvent in the composition for forming a hard coat layer in the present invention can be appropriately adjusted within a range in which the suitability for coating of the composition for forming a hard coat layer can be ensured.
  • the total solid content of the hard coat layer-forming composition may be 50 to 500 parts by mass, preferably 80 to 200 parts by mass, based on 100 parts by mass. You can
  • composition for forming a hard coat layer usually takes the form of a liquid.
  • the solid content of the composition for forming a hard coat layer is usually about 10 to 90% by mass, preferably 20 to 80% by mass, and particularly preferably about 40 to 70% by mass. ..
  • the composition for forming a hard coat layer in the present invention may contain a component other than the above, and examples thereof include inorganic fine particles, a dispersant, a leveling agent, an antifouling agent, an antistatic agent, an ultraviolet absorber, It may contain an antioxidant and the like.
  • composition for forming a hard coat layer used in the present invention can be prepared by simultaneously mixing the various components described above or sequentially in an arbitrary order.
  • the preparation method is not particularly limited, and a known stirrer or the like can be used for the preparation.
  • the hard coat layer of the laminate of the present invention contains a cured product of the composition for forming a hard coat layer containing polyorganosilsesquioxane (31) and polymer (3), and preferably polyorganosyl. It includes a cured product of a composition for forming a hard coat layer, which contains sesquioxane (31), polymer _ (3), and a cationic polymerization initiator. ⁇ 2020/175 337 63 ⁇ (:171? 2020 /006912
  • the hardened product of the composition for forming a hard coat layer is at least a hardened product obtained by bonding a cationically polymerizable group of polyorganosylsesquioxane (3 1) and a cationically polymerizable group of the polymer (3) by a polymerization reaction. It is preferable to include.
  • the content of the cured product of the hard coat layer-forming composition in the hard coat layer of the laminate of the present invention is preferably 50% by mass or more, and more preferably 60% by mass or more. , 70% by mass or more is more preferable.
  • the thickness of the hard coat layer is not particularly limited, but is preferably 0.5 to 300, more preferably 1 to 25, and further preferably 2 to 20.
  • the film thickness of the hard coat layer is calculated by observing the cross section of the laminate with an optical microscope.
  • the cross-section sample can be created by a microtome method using an ultra-microtome cross-section cutting device, or a cross-section processing method using a focused ion beam (Mimi) device.
  • Mimi focused ion beam
  • the laminate of the present invention includes a scratch resistant layer.
  • the scratch resistant layer is formed on the hard coat layer.
  • the laminate of the present invention has at least one scratch resistant layer on the surface of the hard coat layer opposite to the substrate.
  • the scratch-resistant layer of the laminate of the present invention contains a cured product of the scratch-resistant layer-forming composition containing the radically polymerizable compound (O 1 ).
  • the radical-polymerizable compound ( ⁇ 1) (also referred to as “compound ( ⁇ 1)") is explained.
  • the compound ( ⁇ 1) is a compound having a radically polymerizable group.
  • the radically polymerizable group in the compound (O1) is not particularly limited, and a commonly known radical carboxylic acid polymerizable group can be used.
  • Examples of the group include a polymerizable unsaturated group, specifically, a (meth)acryloyl group, a vinyl group, an allyl group and the like, and a (meth)acryloyl group is preferable.
  • a polymerizable unsaturated group specifically, a (meth)acryloyl group, a vinyl group, an allyl group and the like, and a (meth)acryloyl group is preferable.
  • Each of the above groups may have a substituent.
  • the compound ( ⁇ 1) is preferably a compound having two or more (meth)acryloyl groups in one molecule, and a compound having three or more (meth)acryloyl groups in one molecule. Is more preferable.
  • the molecular weight of the compound (O1) is not particularly limited, and it may be a monomer, an oligomer or a polymer.
  • Examples of compounds having two (meth)acryloyl groups in one molecule include neopentyl glycol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, dipropylene glycol di(meth)acrylate, and Propylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, hydroxypivalate neopentyl glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyl oxyacrylate
  • Preferable examples are chill (meth)acrylate, dicyclopentanyl di(meth)acrylate and the like.
  • Examples of the compound having three or more (meth)acryloyl groups in one molecule include an ester of a polyhydric alcohol and (meth)acrylic acid. Specifically, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolethanetri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, dipentaerythritol.
  • Examples include tall tetra(meth)acrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol hexa(meth)acrylate, etc. ⁇ 2020/175 337 65 ⁇ (:171? 2020/006912
  • ethyl triacrylate pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, or mixtures thereof.
  • the compound (O1) may be used alone or in combination of two or more kinds having different structures.
  • the content of the compound ( ⁇ 1) in the composition for forming a scratch resistant layer is preferably 80% by mass or more based on the total solid content in the composition for forming a scratch resistant layer, 85 mass% or more is more preferable, and 90 mass% or more is further preferable.
  • composition for forming a scratch resistant layer in the present invention preferably contains a radical polymerization initiator.
  • the scratch-resistant layer forming composition of the present invention contains a radical polymerizable group of the polymer _ (3) and the compound ( ⁇ 1) contained in the above-mentioned hard coat layer forming composition by containing a radical polymerization initiator.
  • the polymer _ (3) which is capable of favorably advancing the polymerization reaction of, is unevenly distributed on the surface of the hard coat layer coating on the scratch-resistant layer coating side, and the compound ( ⁇ 1) in the scratch-resistant layer coating layer Can be combined with each other, and the adhesion between the hard coating layer and the scratch resistant layer can be enhanced.
  • radical polymerization initiator Only one radical polymerization initiator may be used, or two or more radical polymerization initiators having different structures may be used in combination.
  • the radical polymerization initiator may be a photopolymerization initiator or a thermal polymerization initiator.
  • the content of the radical polymerization initiator in the scratch-resistant layer-forming composition is not particularly limited, but may be, for example, 0.1 to 200 parts by mass relative to 100 parts by mass of the compound ( ⁇ 1). A part is preferable, and 1 to 50 parts by mass is more preferable.
  • the composition for forming a scratch resistant layer in the present invention may contain a solvent.
  • the solvent is the same as the solvent that may be contained in the composition for forming a hard coat layer.
  • the content of the solvent in the composition for forming a scratch resistant layer in the present invention is ⁇ 2020/175 337 66 ⁇ (:171? 2020 /006912
  • the composition for forming a scratch resistant layer it can be appropriately adjusted within a range that can secure the coating suitability of the composition for forming.
  • the total solid content of 100 parts by mass of the composition for forming a scratch resistant layer it can be 50 to 500 parts by mass, and preferably 80 to 200 parts by mass. You can
  • the composition for forming a scratch resistant layer usually takes the form of a liquid.
  • the solid content of the scratch-resistant layer forming composition is usually about 10 to 90% by mass, preferably 20 to 80% by mass, and particularly preferably about 40 to 70% by mass. ..
  • composition for forming a scratch resistant layer may contain components other than the above, and for example, it may contain inorganic particles, leveling agents, antifouling agents, antistatic agents, slip agents, solvents and the like. Good.
  • the fluorine-containing compound may be any of a monomer, an oligomer and a polymer.
  • the fluorine-containing compound preferably has a substituent that contributes to bond formation or compatibility with the polyfunctional (meth)acrylate compound ( ⁇ 1) in the scratch resistant layer.
  • the substituents may be the same or different, and it is preferable that there are plural substituents.
  • This substituent is preferably a polymerizable group, and may be a polymerizable reactive group exhibiting any of radically polymerizable, cationically polymerizable, anionically polymerizable, polycondensable and addition polymerizable, and examples of preferable substituents Examples thereof include an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, a cinnamoyl group, an epoxy group, an oxetanyl group, a hydroxyl group, a polyoxyalkylene group, a carboxyl group and an amino group. Of these, radically polymerizable groups are preferable, and acryloyl group and methacryloyl group are particularly preferable.
  • the fluorine-containing compound may be a polymer with a compound not containing a fluorine atom or may be a ligomer. ⁇ 2020/175 337 67 ⁇ (:171? 2020 /006912
  • the above-mentioned fluorine-containing compound is preferably a fluorine-based compound represented by the following general formula ().
  • nf represents an integer of 1 to 3.
  • 111 is an integer of 1 to 3.
  • the polymerizable unsaturated group is preferably a group having an unsaturated bond capable of causing a radical polymerization reaction by irradiation with active energy rays such as ultraviolet rays and electron beams (that is, radical polymerizable group), and (meth) Acryloyl group, (meth)acryloyloxy group, vinyl group, allyl group, etc., (meth)acryloyl group, (meth)acryloyloxy group, and any hydrogen atom in these groups is replaced by a fluorine atom.
  • the groups described above are preferably used.
  • Na represents a (per) fluoroalkyl group or a (per) fluoropolyether group.
  • the (per) fluoroalkyl group represents at least one of a fluoroalkyl group and a perfluoroalkyl group
  • the (per) fluoropolyether group represents at least one of a fluoropolyether group and a perfluoropolyether group.
  • the (per)fluoroalkyl group is preferably a group having 1 to 20 carbon atoms, and more preferably a group having 1 to 10 carbon atoms.
  • branched structure for example ten! ( ⁇ 3) 2, one Rei_1 to 1 2 ⁇ ( ⁇ 3) 2, ten 1 to 1 (Rei_1 to 1 3) ⁇ 2 ⁇ 3, one Rei_1 ⁇ 1 (Rei_1 ⁇ 1 3) ( ⁇ 2) 5 ⁇ be filed in 2 1 ⁇ 1), alicyclic structure (preferably a 5- or 6-membered ring, for example perfluoro cyclo hexyl and perfluoro Cyclopentyl groups as well as substituted with these groups ⁇ 2020/175 337 68 ⁇ (:171? 2020 /006912
  • the (per)fluoropolyether group refers to a case where the (per)fluoroalkyl group has an ether bond, and may be a monovalent group or a divalent or higher valent group.
  • Fluoropolyether groups include, for example, 2 ⁇ 3, ten H 2 CH 2 ⁇ _CH 2 C 4 F 8 H, _ ⁇ 1-1 2 ⁇ 1-1 2 hundred 1-1 2 ⁇ 1-1 2 ⁇ 8! 7 include _ ⁇ _1 ⁇ 1 2 ⁇ H 2 OC F 2 CF 2 OC F 2 CF 2 H% fluorine atom fluorocycloalkyl group with carbon number 4-2 0 having four or more like.
  • a perfluoropolyether group for example, one ( ⁇ 2 0) ( ⁇ 2 0 2 20) ⁇ -
  • the above chi and chi each independently represent an integer of 0 to 20. However, dried + dried is an integer of 1 or more.
  • the total of dried fish and dried fish is preferably 1 to 83, more preferably 1 to 43, and even more preferably 5 to 23.
  • the fluorine-containing compound is one from the viewpoint of excellent scratch resistance ( ⁇ 2 ⁇ ) - ( ⁇ 2 ⁇ 2 ⁇ ) particularly preferred and this having a perfluoropolyether group represented by.
  • the fluorine-containing compound preferably has a perfluoropolyether group and a plurality of polymerizable unsaturated groups in one molecule.
  • linking group represents a linking group.
  • examples thereof include an alkylene group, an arylene group and a heteroalkylene group, and a linking group formed by combining these groups.
  • These linking groups may further have an oxy group, a carbonyl group, a carbonyloxy group, a carbonylimino group, a sulfonamide group, and the like, and a functional group in which these groups are combined.
  • It is preferably an ethylene group, and more preferably an ethylene group bonded to a carbonylimino group.
  • the fluorine atom content of the fluorine-containing compound is not particularly limited, but is preferably 20% by mass or more, more preferably 30 to 70% by mass, and further preferably 40 to 70% by mass. ⁇ 2020/175 337 69 ⁇ (:171? 2020 /006912
  • Examples of preferable fluorine-containing compounds include [3 ⁇ 4-2020, 1 ⁇ /1-2020, 6-3833, IV!-3833 and Optool 0880 (trade name) manufactured by Daikin Chemical Industries, Ltd. , ⁇ I ⁇ made by Megafaq-1 7 1,-1 72,-179 8, [3 ⁇ 43-78, [3 ⁇ 43-90, Defenser IV! ⁇ -300 and IV! ⁇ -323 (these product names) Examples include but are not limited to:
  • the product of nf and mf (nfXm) is preferably 2 or more, and more preferably 4 or more.
  • Weight average molecular weight of fluorine-containing compound having polymerizable unsaturated group can be measured using molecular exclusion chromatography, for example gel permeation chromatography ( ⁇ ).
  • fluorine-containing compound used in the present invention Is preferably 400 or more and less than 50,000, more preferably 400 or more and less than 30,000, and even more preferably 400 or more and less than 2,500.
  • the content of the fluorine-containing compound is preferably 0.01 to 5% by mass, more preferably 0.1 to 5% by mass, and more preferably 0.01 to 5% by mass based on the total solid content in the composition for forming a scratch resistant layer.
  • 5 to 5 mass% is more preferable, and 0.5 to 2 mass% is particularly preferable.
  • composition for forming a scratch resistant layer used in the present invention can be prepared by simultaneously mixing the various components described above or sequentially in an arbitrary order.
  • the preparation method is not particularly limited, and a known stirrer or the like can be used for the preparation.
  • the scratch-resistant layer of the laminate of the present invention contains a cured product of the scratch-resistant layer-forming composition containing the compound ( ⁇ 1 ), and preferably contains the compound ( ⁇ 1) and a radical polymerization initiator. It includes a cured product of the composition for forming a scratch resistant layer.
  • the cured product of the composition for forming a scratch resistant layer preferably contains at least a cured product obtained by polymerization reaction of the radically polymerizable group of the compound (O1). ⁇ 2020/175 337 70 ⁇ (:171? 2020/006912
  • the content of the cured product of the scratch-resistant layer forming composition in the scratch-resistant layer of the laminate of the present invention is preferably 60% by mass or more, and 70% by mass or more based on the total mass of the scratch-resistant layer. Is more preferable, and 80% by mass or more is further preferable.
  • the film thickness of the scratch resistant layer is preferably less than 3.0, more preferably 0.01 to 2.0, and ⁇ .
  • the laminate of the present invention has excellent resistance to repeated bending.
  • the laminate of the present invention has no scratches when the abrasion resistance layer is placed inside and a bending test of 180 ° with a radius of curvature of 2 is repeated 300,000 times.
  • the repeated bending resistance is specifically measured as follows.
  • the laminate of the present invention has excellent scratch resistance.
  • the laminate of the present invention is made of #0000 steel wool. It is preferable that the surface of the scratch-resistant layer be rubbed 100 times back and forth while applying a load of 1. No scratches are generated, and it is preferable that the scratches are not generated when rubbed 100 times back and forth.
  • the scratch resistance is specifically measured as follows.
  • the surface of the scratch resistant layer of the laminate is subjected to a rubbing test using a rubbing tester under the following conditions to give an index of scratch resistance.
  • Scrubbing material Steel wool (manufactured by Nippon Steel Wool Co., Ltd., Grade 1 ⁇ 1 ⁇ .#00000)
  • Tip contact area 20 X 01 X 201
  • the oily black ink was applied to the surface (surface of the base material) opposite to the rubbed surface (surface of the scratch resistant layer) of the laminated body, and it was visually observed by reflected light, and it was in contact with steel wool. The number of times of rubbing when a part is scratched is measured and evaluated.
  • the method for producing a laminate of the present invention is preferably a production method including the following steps (I) to (IV).
  • the step () is a polyorganosylsesquioxane (3 1) having a cationically polymerizable group on the substrate, and a polymer (3) having a fluorine atom-containing group, a cationically polymerizable group and a radically polymerizable group. Is applied to form a hard coat layer-forming composition to form a hard coat layer coating film.
  • the base material, polyorganosilsesquioxane (31), polymer (3) and composition for forming a hard coat layer are as described above.
  • the method of applying the composition for forming a hard coat layer is not particularly limited, and a known method can be used. Examples thereof include a dip coating method, an air knife coating method, a force-ten coating method, a mouth roller coating method, a wire bar coating method, a gravure coating method and a die coating method.
  • the step ( ⁇ ) is a step of forming a hard coat layer by curing the hard coat layer coating film.
  • Curing the hard coat layer coating means that at least a part of the cationically polymerizable groups of the polyorganosilsesquioxane (81) and polymer (3) contained in the hard coat layer coating is polymerized.
  • the hard coat layer coating film is preferably cured by irradiation with ionizing radiation or heating.
  • the type of ionizing radiation is not particularly limited, and examples thereof include X-rays, electron beams, ultraviolet rays, visible light, and infrared rays, and ultraviolet rays are preferably used.
  • the coating film of the hard coat layer is UV curable, it can be treated with a UV lamp to measure 10". Then, the curable compound is preferably semi-cured. 5 0_Rei_1 "/ ⁇ 111 2 to 1 8 0 0
  • a metal halide lamp, a high-pressure mercury lamp, or the like is preferably used as the UV lamp type.
  • the oxygen concentration during curing is preferably 0 to 1.0% by volume, more preferably 0 to 0. 1% by volume, and most preferably 0 to 0. 05% by volume. Good
  • the step ( ⁇ ) is a step of forming a scratch-resistant layer coating film by applying the scratch-resistant layer forming composition containing the radically polymerizable compound ( ⁇ 1) on the hard coat layer.
  • the radical polymerizable compound ( ⁇ 1) and the composition for forming a scratch resistant layer are as described above.
  • the method for applying the composition for forming a scratch resistant layer is not particularly limited, and a known method can be used.
  • a known method can be used.
  • the dip coating method, the air knife coating method, the force-ten coating method, the mouth-roller coating method, the wire bar coating method, the gravure coating method, the die coating method and the like can be mentioned.
  • step (IV)-step ( ⁇ V) forms a scratch resistant layer by curing the above scratch resistant layer coating film ⁇ 2020/175 337 74 ⁇ (:171? 2020 /006912
  • Curing of the scratch resistant layer coating is preferably performed by irradiation with ionizing radiation or heating. Irradiation and heating of ionizing radiation are the same as those described in the process ( ⁇ ).
  • the curing of the scratch resistant layer coating means a polymerization reaction of at least a part of the radical polymerizable group of the radical polymerizable compound (O 1) contained in the scratch resistant layer coating.
  • the coating film of the hard coat layer is semi-cured in the above step ( ⁇ ). That is, in the step ( ⁇ ), the hard coat layer coating film is semi-cured, and then in the step ( ⁇ ), the scratch-resistant layer forming composition is applied on the semi-cured hard coat layer. It is preferable to form a layer coating film, and then in step (IV), the scratch-resistant layer coating film is cured and the hard coat layer is completely cured.
  • the hard coat layer coating means to polymerize only part of the cationically polymerizable groups of the polyorganosilsesquioxane (81) and polymer (3) contained in the hard coat layer coating. It means to react.
  • the semi-curing of the coating film of the hard coat layer can be carried out by adjusting the irradiation dose of ionizing radiation and the heating temperature and time.
  • a drying process may be performed if necessary. Drying is performed by blowing warm air, placing in a heating furnace, transporting in a heating furnace, heating with a roller from the surface (base material surface) where the hard coat layer and scratch resistant layer are not provided. It can be carried out.
  • the heating temperature may be set to a temperature at which the solvent can be dried and removed, and is not particularly limited. Here, the heating temperature means the temperature of warm air or the ambient temperature in the heating furnace.
  • the laminate of the present invention is excellent in scratch resistance and resistance to repeated bending and has little whitening, and can be used, for example, as an optical film (preferably a hard coat film). Further, the laminate of the present invention can be used as a surface protective film of an image display device, and for example, a folderable device ⁇ 2020/175 337 75 ⁇ (:171? 2020 /006912
  • a folderable device is a device that employs a flexible display whose display screen can be deformed, and the device itself (display) can be folded using the deformability of the display screen.
  • foldable devices include organic electroluminescent devices.
  • the present invention also relates to an article provided with the laminate of the present invention, and an image display device provided with the laminate of the present invention as a surface protective film.
  • 1 0101 1 to 19 is about 133.322 Pa.
  • each polymer used as the interlayer adhesive is shown below.
  • the molecular weight (1 ⁇ /1) and dispersity (Mw/ Mn ) of each polymer are shown in Table 1 below.
  • “3 0 5 ” represents a silsesquioxane unit.
  • Interlayer adhesive (3X 1 — 1) was added to IV! I, a solution containing the above compound (8).
  • ⁇ 111 is the start of photocationic polymerization by San-Apro Co., Ltd. It is an agent (solid content concentration 50% by mass).
  • the compounds used in the composition for forming a scratch resistant layer are as follows.
  • D P l ⁇ A A mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.
  • RS- 90 Lubricant, manufactured by DIC Corporation
  • the hard coat layer forming composition HC-1 was applied onto a polyimide base material S _ 1 having a thickness of 30 m using a wire par # 18 so that the film thickness after curing became 18 Mm. After coating, a hard coat layer coating film was provided on the substrate.
  • the hard coat layer coating film was dried at 120°C for 1 minute, and then the illuminance was 18 mW/ Irradiation with an ultraviolet ray having a dose of cm 2 and an irradiation dose of 19 mJ/cm 2 was performed. In this way, the hard coat layer coating film was semi-cured.
  • the scratch-resistant layer forming composition S R-1 was applied using a die coater so that the film thickness after curing would be 0.8 ⁇ m. ..
  • Example 1 hard coat film having a hard coat layer and a scratch resistant layer on a substrate.
  • Example 2 was repeated in the same manner as in Example 1 except that the type and content of the interlayer adhesive used, the film thickness of the hard coat layer, and the film thickness of the scratch resistant layer were changed as described in Table 1 below. ⁇ 10 and the laminates (hard coat films) of Comparative Examples 1 to 7 were manufactured.
  • Scrubbing material Steel wool (manufactured by Nippon Steel Wool Co., Ltd., Grade 1 ⁇ 1 ⁇ .#00000)
  • Mouth scratches when rubbed 10 times back and forth
  • the tester used was a sample film with a diameter of 4 After bending along the curved surface of (cylindrical) at a bending angle of 180° at the center in the longitudinal direction and then returning it to its original position (expanding the sample film), one test is repeated and this test is repeated. Is. When the above 180° bending test was repeated 300,000 times, the case where no crack was generated was evaluated as 8, and the case where a crack was generated was evaluated as Mami. The presence or absence of cracks was visually evaluated.
  • the whitening of the film is performed with a surface roughness non-contact 3D surface profilometer (6 "I Surface roughness measured using an (trade name), manufactured by Ryoka System Co., Ltd. ) Was evaluated.
  • the content (% by mass) of the interlayer adhesive is a value based on the total solid content of the composition for forming a hard coat layer.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)

Abstract

According to the present invention, there is provided a laminated body having a substrate, a hard coat layer, and a scratch resistant layer in this order, wherein the hard coat layer includes a cured product of a composition for forming a hard coat layer including a polyorganosilsesquioxane (a1) having a cationically polymerizable group, and a polymer (S) having a group including a fluorine atom, a cationically polymerizable group and a radically polymerizable group, and the scratch resistant layer includes a cured product of a composition for forming a scratch resistant layer that includes a radically polymerizable compound (c1); provided also are an article and an image display device that comprise the laminated body.

Description

明 細 書 Specification
発明の名称 : 積層体、 積層体を備えた物品、 及び画像表示装置 技術分野 Title of invention: Laminated body, article provided with laminated body, and image display device Technical Field
[0001 ] 本発明は、 積層体、 積層体を備えた物品、 及び画像表示装置に関する。 The present invention relates to a laminate, an article including the laminate, and an image display device.
背景技術 Background technology
[0002] 陰極管 (C R T) を利用した表示装置、 プラズマディスプレイ (P D P) [0002] A display device using a cathode ray tube (CRT), a plasma display (PDP)
、 エレクトロルミネッセンスディスプレイ (E L D) 、 蛍光表示ディスプレ イ (V F D) 、 フィールドエミッションディスプレイ (F E D) 、 及び液晶 ディスプレイ (L C D) のような画像表示装置では、 表示面への傷付きを防 止するために、 基材上にハードコート層を有する積層体 (ハードコートフィ ルム) を設けることが好適である。 Image display devices such as, electroluminescent displays (ELDs), fluorescent display (VFDs), field emission displays (FEDs), and liquid crystal displays (LCDs) are designed to prevent scratches on the display surface. It is preferable to provide a laminate having a hard coat layer (hard coat film) on the substrate.
[0003] たとえば、 特許文献 1 には、 基材上に、 カチオン硬化性シリコーン樹脂及 びレベリング剤を含む硬化性組成物の硬化物からなるハードコート層を有す るハードコートフィルムが記載されている。 [0003]For example, Patent Document 1 describes a hard coat film having a hard coat layer made of a cured product of a curable composition containing a cationic curable silicone resin and a leveling agent on a substrate. There is.
先行技術文献 Prior art documents
特許文献 Patent literature
[0004] 特許文献 1 : 日本国特開 2 0 1 8 - 8 3 9 1 5号公報 [0004] Patent Document 1: Japanese Patent Laid-Open No. 2 0 1 8-8 3 9 15
発明の概要 Summary of the invention
発明が解決しようとする課題 Problems to be Solved by the Invention
[0005] 近年、 たとえばスマートフォンなどにおいて、 極薄型のフレキシブルなデ ィスプレイに対するニーズが高まってきており、 これに伴って、 耐擦傷性と 繰り返し折り曲げ耐性 (繰り返し折り曲げてもクラックが発生しない性質) を両立することができる光学フィルムが強く求められている。 また、 ハード コート層などの塗布層を乾燥させる際などに生じる膜厚ムラなどに起因する 白化が少ないことも求められている。 [0005] In recent years, for example, in smartphones and the like, there is an increasing need for an ultra-thin flexible display, and along with this, both scratch resistance and repeated bending resistance (property that cracks do not occur even when repeatedly bent) are compatible. There is a strong demand for an optical film that can be used. In addition, it is also required that the whitening caused by the unevenness of the film thickness caused when the coating layer such as the hard coat layer is dried is small.
本発明者らが検討したところ、 特許文献 1 に記載のハードコートフィルム は、 耐擦傷性と繰り返し折り曲げ耐性が両立できないことが分かった。 〇 2020/175337 2 卩(:171? 2020 /006912 As a result of examination by the present inventors, it was found that the hard coat film described in Patent Document 1 cannot achieve both scratch resistance and repeated bending resistance. 〇 2020/175337 2 卩 (:171? 2020 /006912
本発明の課題は、 耐擦傷性及び繰り返し折り曲げ耐性に優れ、 かつ白化が 抑制された積層体、 上記積層体を備えた物品、 並びに画像表示装置を提供す ることにある。 An object of the present invention is to provide a laminate having excellent scratch resistance and resistance to repeated bending, and suppressing whitening, an article including the laminate, and an image display device.
課題を解決するための手段 Means for solving the problem
[0006] 本発明者らは鋭意検討し、 下記手段により上記課題が解消できることを見 出した。 [0006] The inventors of the present invention have made earnest studies and found that the above-mentioned problems can be solved by the following means.
[0007] < 1 > [0007] <1>
基材と、 ハードコート層と、 耐擦傷層とをこの順に有する積層体であって 上記ハ _ドコ _卜層は、 A substrate, a hard coat layer, a laminate the Ha _ DoCoMo _ Bokuso having a scratch layer in this order,
カチオン重合性基を有するポリオルガノシルセスキオキサン (3 1) 、 及 び A polyorganosilsesquioxane having a cationically polymerizable group (31), and
フッ素原子を含有する基と、 カチオン重合性基と、 ラジカル重合性基とを 有するポリマ _ (3) を含むハードコート層形成用組成物の硬化物を含み、 上記耐擦傷層は、 ラジカル重合性化合物 (〇 1) を含む耐擦傷層形成用組 成物の硬化物を含み、 The hard coat layer-forming composition comprising a polymer _ (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group is contained, and the scratch resistant layer is a radically polymerizable group. Including a cured product of a scratch resistant layer-forming composition containing the compound (○ 1),
上記耐擦傷層を内側にして、 曲率半径 2 で 1 80° 折り曲げ試験を 3 0万回繰り返し行った場合にクラックが発生せず、 かつ、 When the above-mentioned scratch resistant layer was placed inside and a bending test of 180 ° with a radius of curvature of 2 was repeated 300,000 times, no cracks occurred, and
# 000〇番のスチールウールで 1
Figure imgf000003_0001
上記 耐擦傷層の表面を往復 1 〇〇回擦った場合に傷が生じない、 積層体。
With #000 〇 steel wool 1
Figure imgf000003_0001
A laminate in which no scratches occur when the surface of the scratch resistant layer is rubbed 100 times back and forth.
<2> <2>
上記ポリマー (3) が、 ポリオルガノシルセスキオキサンである、 <1 > に記載の積層体。 The laminate according to <1>, wherein the polymer (3) is polyorganosilsesquioxane.
<3> <3>
上記ポリマ _ (3) が、 下記一般式 (3_ 1) で表される構成単位、 下記 _般式 (3_2) で表される構成単位、 及び下記一般式 (3_3) で表され る構成単位を有する、 < 2 >に記載の積層体。 The polymer _ (3) has a structural unit represented by the following general formula (3_1), a structural unit represented by the following general formula (3_2), and a structural unit represented by the following general formula (3_3). The laminate according to <2>.
[0008] 〇 2020/175337 卩(:171? 2020 /006912 [0008] 〇 2020/175337 卩(: 171-1? 2020/006912
Figure imgf000004_0001
Figure imgf000004_0001
(5-1) (3-2) -3) (5-1) (3-2) -3)
[0009] —般式 (3_ 1) 中、 !_ 1は単結合又は 2価の連結基を表し、
Figure imgf000004_0002
はフッ素 原子を含有する基を表す。
[0009] — General formula (3_1) Medium! _ 1 represents a single bond or a divalent linking group,
Figure imgf000004_0002
Represents a group containing a fluorine atom.
—般式 (3— 2) 中、 1_2は単結合又は 2価の連結基を表し、 02はカチオ ン重合性基を表す。 - in general formula (3-2), 1_ 2 represents a single bond or a divalent linking group, 0 2 denotes the Kachio down polymerizable group.
一般式 (3— 3) 中、 1_3は単結合又は 2価の連結基を表し、 03はラジカ ル重合性基を表す。 In the general formula (3-3), 1_ 3 represents a single bond or a divalent linking group, 0 3 represents the radical Le polymerizable group.
<4> <4>
上記ポリマー (3) における、 フッ素原子を有する構成単位の含有モル比 率が、 全構成単位に対して、 1モル%超 70モル%以下である、 <1>〜< 3>のいずれか 1項に記載の積層体。 Any one of <1> to <3>, wherein the molar ratio of the constituent units having a fluorine atom in the polymer (3) is more than 1 mol% and 70 mol% or less based on all constituent units. The laminated body according to.
<5> <5>
上記ポリマー (3) における、 ラジカル重合性基を有する構成単位の含有 モル比率が、 全構成単位に対して、 1モル%超である、 <1>〜<4>のい ずれか 1項に記載の積層体。 In any one of <1> to <4>, wherein the molar ratio of the structural unit having a radically polymerizable group in the polymer (3) is more than 1 mol% based on all the structural units. Stack of.
<6> <6>
上記耐擦傷層の膜厚が、 3. 〇 未満である、 <1>〜<5>のいずれ か 1項に記載の積層体。 The laminate according to any one of <1> to <5>, wherein the scratch-resistant layer has a thickness of less than 3.0.
<7> <7>
上記基材が、 イミ ド系ポリマー及びアラミ ド系ポリマーから選ばれる少な くとも 1種のポリマーを含有する、 < 1>〜<6>のいずれか 1項に記載の 積層体。 \¥0 2020/175337 4 卩(:17 2020 /006912 The laminate according to any one of <1> to <6>, wherein the base material contains at least one polymer selected from imide polymers and aramid polymers. \¥0 2020/175 337 4 卩 (: 17 2020 /006912
<8> <8>
上記ポリオルガノシルセスキオキサン (3 1) における上記カチオン重合 性基が、 エポキシ基である、 <1>〜<7>のいずれか 1項に記載の積層体 The laminate according to any one of <1> to <7>, wherein the cationically polymerizable group in the polyorganosilsesquioxane (31) is an epoxy group.
<9> <9>
上記ハードコート層形成用組成物が、 上記ポリマー (3) を、 上記ハード コート層形成用組成物の全固形分に対して、 〇. 〇〇 1〜 5質量%含有する 、 <1>〜<8>のいずれか 1項に記載の積層体。 The composition for forming a hard coat layer contains the polymer (3) in an amount of 0.001 to 5% by mass based on the total solid content of the composition for forming a hard coat layer, <1> to < The laminated body according to any one of 8>.
<1 〇> <1>
<1>〜< 9>のいずれか 1項に記載の積層体を備えた物品。 An article provided with the laminate according to any one of <1> to <9>.
< 1 1> <1 1>
<1>〜< 9>のいずれか 1項に記載の積層体を表面保護フィルムとして 備えた画像表示装置。 An image display device, comprising the laminate according to any one of <1> to <9> as a surface protection film.
発明の効果 Effect of the invention
[0010] 本発明によれば、 耐擦傷性及び繰り返し折り曲げ耐性に優れ、 かつ白化が 抑制された積層体、 上記積層体を備えた物品、 並びに画像表示装置を提供す ることができる。 According to the present invention, it is possible to provide a laminate having excellent scratch resistance and repeated bending resistance, and suppressing whitening, an article including the laminate, and an image display device.
発明を実施するための形態 MODE FOR CARRYING OUT THE INVENTION
[001 1 ] 以下、 本発明を実施するための形態について詳細に説明するが、 本発明は これらに限定されるものではない。 なお、 本明細書において、 数値が物性値 、 特性値等を表す場合に、 「 (数値 1) 〜 (数値 2) 」 という記載は 「 (数 値 1) 以上 (数値 2) 以下」 の意味を表す。 また、 本明細書において、 「 ( メタ) アクリレート」 との記載は、 「アクリレート及びメタクリレートの少 なくともいずれか」 の意味を表す。 「 (メタ) アクリル酸」 、 「 (メタ) ア クリロイル」 等も同様である。 [001 1] Hereinafter, modes for carrying out the present invention will be described in detail, but the present invention is not limited thereto. In this specification, when a numerical value represents a physical property value, a characteristic value, etc., the description “(numerical value 1) to (numerical value 2)” means “(numerical value 1) or more (numerical value 2) or less”. Represent Further, in the present specification, the description “(meth)acrylate” means “at least one of acrylate and methacrylate”. The same applies to “(meth)acrylic acid”, “(meth)acryloyl” and the like.
[0012] [積層体] [0012] [Laminate]
本発明の積層体は、 The laminate of the present invention is
基材と、 ハードコート層と、 耐擦傷層とをこの順に有する積層体であって 〇 2020/175337 5 卩(:171? 2020 /006912 A laminate having a base material, a hard coat layer, and a scratch resistant layer in this order: 〇 2020/175 337 5 卩 (:171? 2020 /006912
上記ハ _ドコ _卜層は、 The bonded _ DoCoMo _ Bokuso is,
カチオン重合性基を有するポリオルガノシルセスキオキサン (3 1) 、 及 び A polyorganosilsesquioxane having a cationically polymerizable group (31), and
フッ素原子を含有する基と、 カチオン重合性基と、 ラジカル重合性基とを 有するポリマ _ (3) を含むハードコート層形成用組成物の硬化物を含み、 上記耐擦傷層は、 ラジカル重合性化合物 (〇 1) を含む耐擦傷層形成用組 成物の硬化物を含み、 The hard coat layer-forming composition comprising a polymer _ (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group is contained, and the scratch resistant layer is a radically polymerizable group. Including a cured product of a scratch resistant layer-forming composition containing the compound (○ 1),
上記耐擦傷層を内側にして、 曲率半径 2 で 1 8 0 ° 折り曲げ試験を 3 0万回繰り返し行った場合にクラックが発生せず、 かつ、 When the 180 ° bending test with a radius of curvature of 2 was repeated 300,000 times with the scratch resistant layer on the inside, cracks did not occur, and
# 0 0 0〇番のスチールウールで 1
Figure imgf000006_0001
上記 耐擦傷層の表面を往復 1 〇〇回擦った場合に傷が生じない、 積層体である。
# 0 0 0 0 with #1 steel wool
Figure imgf000006_0001
It is a laminate in which scratches do not occur when the surface of the scratch resistant layer is rubbed 100 times back and forth.
[0013] 本発明の積層体が、 耐擦傷性及び繰り返し折り曲げ耐性に優れるメカニズ ムについて、 詳細は明らかではないが、 本発明者らは以下のように推察して いる。 [0013] Although the details of the mechanism by which the laminate of the present invention is excellent in scratch resistance and repeated bending resistance are not clear, the present inventors speculate as follows.
カチオン重合性基を有するポリオルガノシルセスキオキサン (3 1) は、 ハードコート層に硬度と耐屈曲性を付与できる素材であるが、 カチオン重合 性基を有するポリオルガノシルセスキオキサン (3 1) を含むハードコート 層形成用組成物の硬化物を含むハードコート層上に、 ラジカル重合性化合物 (〇 1) を含む耐擦傷層形成用組成物の硬化物を形成した場合、 ハードコー 卜層はカチオン重合系であり、 耐擦傷層はラジカル重合系であるため、 両層 の重合系が異なっており、 層間の密着性が弱く、 耐擦傷性の向上が低くなっ ていたと考えられる。 Polyorganosilsesquioxane having a cationically polymerizable group (3 1) is a material capable of imparting hardness and flex resistance to the hard coat layer, but polyorganosilsesquioxane having a cationically polymerizable group (3 1) When a cured product of the scratch resistant layer-forming composition containing the radically polymerizable compound (○ 1) is formed on the hard coat layer containing the cured product of the composition for forming a hard coat layer, the hard coating layer is Since it is a cationic polymerization system and the scratch-resistant layer is a radical polymerization system, the polymerization systems of both layers are different, and it is considered that the adhesion between the layers was weak and the improvement in scratch resistance was low.
本発明では、 ハードコート層形成用組成物に、 フッ素原子を含有する基と 、 カチオン重合性基と、 ラジカル重合性基とを有するポリマー (3) を添加 することにより、 このポリマー (3) が、 層間密着剤として機能し、 層間の 密着性が強くなり、 耐擦傷性が優れるものとなったと考えられる。 In the present invention, by adding a polymer (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group to the composition for forming a hard coat layer, the polymer (3) can be It is believed that the film functions as an interlayer adhesive, strengthening the adhesiveness between the layers and providing excellent scratch resistance.
より詳細には、 ポリマー (3) はフッ素原子を含有する基を有するため、 〇 2020/175337 6 卩(:171? 2020 /006912 More specifically, since the polymer (3) has a group containing a fluorine atom, 〇 2020/175 337 6 卩(: 171-1? 2020/006912
ハードコート層形成用組成物を塗布したときに、 ポリマー (3) がハードコ —卜層表面 (空気界面側表面) に偏在し、 効率よく層間を密着させることが できる。 また、 フッ素原子を含有する基の作用により、 塗布液の表面張力が 低下し、 マランゴニ対流や風乾燥ムラ等が抑えられるため、 表面散乱に起因 する白化を抑制することができると考えられる。 When the composition for forming a hard coat layer is applied, the polymer (3) is unevenly distributed on the surface of the hard coat layer (surface on the air interface side), and the layers can be adhered efficiently. Further, the action of the group containing a fluorine atom lowers the surface tension of the coating liquid, and suppresses Marangoni convection, wind drying unevenness, and the like, so that it is considered that whitening due to surface scattering can be suppressed.
ポリマー (3) はカチオン重合性基を有するため、 ハードコート層の素材 であるカチオン重合性基を有するポリオルガノシルセスキオキサン (3 1) と重合反応により結合することができる。 Since the polymer (3) has a cationically polymerizable group, it can be bonded to the polyorganosilsesquioxane (3 1) having a cationically polymerizable group, which is a material of the hard coat layer, by a polymerization reaction.
また、 ポリマー (3) はラジカル重合性基を有するため、 耐擦傷層の素材 であるラジカル重合性化合物 (〇 1) と重合反応により結合することができ る。 Further, since the polymer (3) has a radically polymerizable group, it can be bonded to the radically polymerizable compound (○ 1) which is a material of the scratch resistant layer by a polymerization reaction.
したがって、 ポリマー (3) はハードコート層の素材と耐擦傷層の素材の 両方と結合することができるため、 層間の密着性を高めることができ、 これ によって、 耐擦傷性を向上することができると考えられる。 Therefore, since the polymer (3) can be bonded to both the material of the hard coat layer and the material of the scratch resistant layer, the adhesion between the layers can be enhanced, and thus the scratch resistance can be improved. it is conceivable that.
[0014] <基材> [Base material]
本発明の積層体は基材を含む。 The laminate of the present invention includes a base material.
基材は、 可視光領域の透過率が 7 0 %以上であることが好ましく、 8 0 % 以上であることがより好ましく、 9 0 %以上であることが更に好ましい。 The substrate preferably has a transmittance in the visible light region of 70% or more, more preferably 80% or more, and further preferably 90% or more.
[0015] (ポリマー) [0015] (Polymer)
基材はポリマーを含むことが好ましい。 The substrate preferably comprises a polymer.
ポリマーとしては、 光学的な透明性、 機械的強度、 熱安定性などに優れる ポリマーが好ましい。 As the polymer, a polymer having excellent optical transparency, mechanical strength, thermal stability and the like is preferable.
[0016] ポリマーとしては、 例えば、 ポリカーボネート系ポリマー、 ポリエチレン テレフタレート ( 巳丁) 、 ポリエチレンナフタレート ( 巳 1\1) 等のポリ エステル系ポリマー、 ポリスチレン、 アクリロニトリル ·スチレン共重合体 (八 3樹脂) 等のスチレン系ポリマーなどが挙げられる。 また、 ポリエチレ ン、 ポリプロピレン等のポリオレフイン、 ノルボルネン系樹脂、 エチレン · プロピレン共重合体などのポリオレフイン系ポリマー、 ポリメチルメタクリ 〇 2020/175337 7 卩(:171? 2020 /006912 レート等の (メタ) アクリル系ポリマー、 塩化ビニル系ポリマー、 ナイロン 、 芳香族ポリアミ ド等のアミ ド系ポリマー、 イミ ド系ポリマー、 スルホン系 ポリマー、 ポリエーテルスルホン系ポリマー、 ポリエーテルエーテルケトン 系ポリマー、 ポリフエニレンスルフイ ド系ポリマー、 塩化ビニリデン系ポリ マー、 ビニルアルコール系ポリマー、 ビニルブチラール系ポリマー、 アリレ —卜系ポリマー、 ポリオキシメチレン系ポリマー、 エポキシ系ポリマー、 卜 リアセチルセルロースに代表されるセルロース系ポリマー、 又は上記ポリマ —同士の共重合体、 上記ポリマー同士を混合したポリマーも挙げられる。 [0016] Examples of the polymer include polycarbonate-based polymers, polyethylene terephthalate (Mitsuingo), polyethylene naphthalate (Mitsumi 1\1) and other polyester-based polymers, polystyrene, acrylonitrile-styrene copolymers (83 resin), and the like. The styrene-based polymer and the like. In addition, polyolefins such as polyethylene and polypropylene, norbornene-based resins, polyolefin-based polymers such as ethylene-propylene copolymers, polymethylmethacrylate, etc. 〇 2020/175337 7 (meth) acrylic polymer such as rate, (meth) acrylic polymer, vinyl chloride polymer, nylon, amide polymer such as aromatic polyamide, imide polymer, sulfone polymer, Polyether sulfone-based polymer, polyether ether ketone-based polymer, polyphenylene sulfide-based polymer, vinylidene chloride-based polymer, vinyl alcohol-based polymer, vinyl butyral-based polymer, aryl-based polymer, polyoxymethylene-based polymer, epoxy Examples of the polymer also include cellulosic polymers, cellulosic polymers typified by triacetyl cellulose, copolymers of the above polymers, and polymers obtained by mixing the above polymers.
[0017] 特に、 芳香族ポリアミ ド等のアミ ド系ポリマー及びイミ ド系ポリマーは、 [0017] In particular, amide-based polymers and imide-based polymers such as aromatic polyamides are
」 I 3 (日本工業規格) 8 1 1 5 (2 0 0 1) に従い IV! I 丁試験機によ って測定した破断折り曲げ回数が大きく、 硬度も比較的高いことから、 基材 として好ましく用いることができる。 例えば、 特許第 5 6 9 9 4 5 4号公報 の実施例 1 にあるような芳香族ポリアミ ド、 特表 2 0 1 5— 5 0 8 3 4 5号 公報、 特表 2 0 1 6— 5 2 1 2 1 6号公報、 及び 〇 2 0 1 7 / 0 1 4 2 8 7号公報に記載のポリイミ ドを基材として好ましく用いることができる。 アミ ド系ポリマーとしては、 芳香族ポリアミ ド (アラミ ド系ポリマー) が 好ましい。 According to I 3 (Japanese Industrial Standards) 8 1 15 (2 0 0 1), the number of breaks and bends measured with an IV! I Ding tester is large, and the hardness is relatively high, so it is preferably used as a substrate. be able to. For example, an aromatic polyamide as shown in Example 1 of Japanese Patent No. 5 6 9 9 4 5 4, Japanese Patent Publication No. 2 0 1 5 — 5 0 8 3 4 5 and Japanese Patent Publication No. 2 0 1 6-5 The polyimides described in JP-A Nos. 2 1 2 1 6 and 0 2 0 1 7/0 1 4 2 8 7 can be preferably used as a base material. As the amide-based polymer, aromatic polyamide (aramid-based polymer) is preferable.
基材は、 イミ ド系ポリマー及びアラミ ド系ポリマーから選ばれる少なくと も 1種のポリマーを含有することが好ましい。 The substrate preferably contains at least one polymer selected from imide-based polymers and aramid-based polymers.
[0018] また、 基材は、 アクリル系、 ウレタン系、 アクリルウレタン系、 エポキシ 系、 シリコーン系等の紫外線硬化型、 熱硬化型の樹脂の硬化層として形成す ることもできる。 [0018] The base material can also be formed as a cured layer of an acrylic, urethane, acrylic urethane, epoxy, silicone or other UV curable or thermosetting resin.
[0019] (柔軟化素材) [0019] (Softening material)
基材は、 上記のポリマーを更に柔軟化する素材を含有しても良い。 柔軟化 素材とは、 破断折り曲げ回数を向上させる化合物を指し、 柔軟化素材として は、 ゴム質弾性体、 脆性改良剤、 可塑剤、 スライ ドリングポリマー等を用い ることが出来る。 The base material may contain a material that further softens the above-mentioned polymer. The softening material refers to a compound that improves the number of times of bending at break. As the softening material, a rubber elastic body, a brittleness improving agent, a plasticizer, a sliding ring polymer, etc. can be used.
柔軟化素材として具体的には、 特開 2 0 1 6 - 1 6 7 0 4 3号公報におけ 〇 2020/175337 8 卩(:171? 2020 /006912 Specifically, as a softening material, see Japanese Patent Laid-Open No. 20 1 6-1 6 7 04 3 〇 2020/175 337 8 卩 (:171? 2020 /006912
る段落番号 [0 0 5 1] 〜 [0 1 1 4] に記載の柔軟化素材を好適に用いる ことができる。 The softening material described in paragraph numbers [0 0 5 1] to [0 1 1 4] can be preferably used.
[0020] 柔軟化素材は、 ポリマーに単独で混合しても良いし、 複数を適宜併用して 混合しても良いし、 また、 ポリマーと混合せずに、 柔軟化素材のみを単独又 は複数併用で用いて基材としても良い。 [0020] The softening material may be mixed alone with the polymer, or a plurality of softening materials may be appropriately used in combination, and the softening material alone or in plural without mixing with the polymer. It may be used together as a base material.
[0021] これらの柔軟化素材を混合する量は、 とくに制限はなく、 単独で十分な破 断折り曲げ回数を持つポリマーを単独でフィルムの基材としても良いし、 柔 軟化素材を混合しても良いし、 すべてを柔軟化素材 (1 〇〇%) として十分 な破断折り曲げ回数を持たせても良い。 [0021] The amount of these softening materials to be mixed is not particularly limited, and a polymer having a sufficient number of times of breaking and folding may be used alone as a base material of the film, or a softening material may be mixed. Good, all of them may be made of flexible material (100%) and have a sufficient number of breaks and bends.
[0022] (その他の添加剤) [0022] (Other additives)
基材には、 用途に応じた種々の添加剤 (例えば、 紫外線吸収剤、 マッ ト剤 、 酸化防止剤、 剥離促進剤、 レターデーション (光学異方性) 調節剤、 など ) を添加できる。 それらは固体でもよく油状物でもよい。 すなわち、 その融 点又は沸点において特に限定されるものではない。 また添加剤を添加する時 期は基材を作製する工程において何れの時点で添加しても良く、 素材調製エ 程に添加剤を添加し調製する工程を加えて行ってもよい。 更にまた、 各素材 の添加量は機能が発現する限りにおいて特に限定されない。 Various additives (for example, an ultraviolet absorber, a matting agent, an antioxidant, a peeling accelerator, a retardation (optical anisotropy) regulator, etc.) can be added to the base material depending on the application. They may be solid or oily. That is, its melting point or boiling point is not particularly limited. Further, the time of adding the additive may be added at any time in the step of producing the base material, or the step of adding and preparing the additive in the material preparation step may be added. Furthermore, the addition amount of each material is not particularly limited as long as the function is exhibited.
その他の添加剤としては、 特開 2 0 1 6 - 1 6 7 0 4 3号公報における段 落番号 [0 1 1 7] 〜 [0 1 2 2] に記載の添加剤を好適に用いることがで きる。 As other additives, the additives described in the step numbers [0 1 1 7] to [0 1 2 2] in JP-A No. 2 016 -1 6 7 0 4 3 are preferably used. it can.
[0023] 以上の添加剤は、 1種類を単独で使用してもよいし、 2種類以上を組み合 わせて使用してもよい。 [0023] One kind of the above additives may be used alone, or two or more kinds may be used in combination.
[0024] (紫外線吸収剤) [0024] (UV absorber)
紫外線吸収剤としては、 例えば、 ベンゾトリアゾール化合物、 トリアジン 化合物、 ベンゾオキサジン化合物を挙げることができる。 ここでベンゾトリ アゾール化合物とは、 ベンゾトリアゾール環を有する化合物であり、 具体例 としては、 例えば特開 2 0 1 3— 1 1 1 8 3 5号公報段落 0 0 3 3に記載さ れている各種ベンゾトリアゾール系紫外線吸収剤を挙げることができる。 卜 〇 2020/175337 9 卩(:171? 2020 /006912 Examples of ultraviolet absorbers include benzotriazole compounds, triazine compounds, and benzoxazine compounds. Here, the benzotriazole compound is a compound having a benzotriazole ring, and specific examples thereof include various compounds described in paragraph 0 0 3 3 of JP-A No. 20 1 3 — 1 1 1 8 3 5 A benzotriazole type ultraviolet absorber can be mentioned. All 〇 2020/175 337 9 卩 (:171? 2020 /006912
リアジン化合物とは、 トリアジン環を有する化合物であり、 具体例としては 、 例えば特開 201 3- 1 1 1 835号公報段落 0033に記載されている 各種トリアジン系紫外線吸収剤を挙げることができる。 ベンゾオキサジン化 合物としては、 例えば特開 201 4-209 1 62号公報段落 003 1 に記 載されているものを用いることができる。 基材中の紫外線吸収剤の含有量は 、 例えば基材に含まれるポリマー 1 〇〇質量部に対して〇. 1〜 1 〇質量部 程度であるが、 特に限定されるものではない。 また、 紫外線吸収剤について は、 特開 201 3— 1 1 1 835号公報段落 0032も参照できる。 なお、 本発明においては、 耐熱性が高く揮散性の低い紫外線吸収剤が好ましい。 か かる紫外線吸収剤としては、 例えば、 11 3〇[¾巳 1 01 (富士フイルムフ アインケミカルズ株式会社製) 、 丁 丨 1\111 丨 360、 丁 丨 1\111 1The lyazine compound is a compound having a triazine ring, and specific examples thereof include various triazine-based UV absorbers described in paragraph 0033 of JP-A-2013-1111835. As the benzoxazine compound, for example, those described in JP-A-2014-209162, paragraph 0031 can be used. The content of the ultraviolet absorber in the base material is, for example, about 0.1 to 10 parts by mass with respect to 100 parts by mass of the polymer contained in the base material, but is not particularly limited. Further, with respect to the ultraviolet absorber, reference can be made to JP-A No. 2013-111835, paragraph 0032. In the present invention, an ultraviolet absorber having high heat resistance and low volatility is preferable. Examples of such UV absorbers include 11 3 0 [¾mi 101 (manufactured by FUJIFILM Fine Chemicals Co., Ltd.), 1-111 111-360, 1-111 1
460、 丁 1 1\111 1 1 577 (巳八3 社製) 、 !_八 - 70、 !_ 八一3 1、 !_八一46 (八〇巳 八社製) などが挙げられる。 460, Ding 1 1 1 1 1 1 1 1 1 577 (made by Mamihachi 3),! _ Eight-70,! _ Yaichi 3 1,! _Yaichi 46 (manufactured by Yatsumi Hachisha) and the like.
[0025] 基材は、 透明性の観点から、 基材に用いる柔軟性素材及び各種添加剤と、 ポリマーとの屈折率の差が小さいことが好ましい。 [0025] From the viewpoint of transparency, it is preferable that the base material has a small difference in refractive index between the flexible material and various additives used for the base material and the polymer.
[0026] (イミ ド系ポリマーを含む基材) [0026] (Substrate containing imido polymer)
基材として、 イミ ド系ポリマーを含む基材を好ましく用いることができる 。 本明細書において、 イミ ド系ポリマーとは、 式 丨) 、 式 (3) 、 式 ( 3’ ) 及び式 (匕) で表される繰り返し構造単位を少なくとも 1種以上含む 重合体を意味する。 なかでも、 式 ( 丨) で表される繰り返し構造単位が、 イミ ド系ポリマーの主な構造単位であると、 フィルムの強度及び透明性の観 点で好ましい。 式 ( 丨) で表される繰り返し構造単位は、 イミ ド系ポリマ 一の全繰り返し構造単位に対し、 好ましくは 40モル%以上であり、 より好 ましくは 50モル%以上であり、 さらに好ましくは 70モル%以上であり、 特に好ましくは 90モル%以上であり、 最も好ましくは 98モル%以上であ る。 As the base material, a base material containing an imide polymer can be preferably used. In the present specification, the imide-based polymer means a polymer containing at least one repeating structural unit represented by the following formulas: (3), (3') and (3). Above all, it is preferable from the viewpoint of strength and transparency of the film that the repeating structural unit represented by the formula () is the main structural unit of the imido polymer. The repeating structural unit represented by the formula () is preferably 40 mol% or more, more preferably 50 mol% or more, further preferably 50 mol% or more, based on all repeating structural units of the imide polymer 1. It is 70 mol% or more, particularly preferably 90 mol% or more, and most preferably 98 mol% or more.
[0027] \¥0 2020/175337 10 卩(:17 2020 /006912 [0027] \\0 2020/175 337 10 卩 (: 17 2020 /006912
[化 2] [Chemical 2]
Figure imgf000011_0001
Figure imgf000011_0001
[0028] 式 ( I) 中の◦は 4価の有機基を表し、 八は 2価の有機基を表す。 式 ( [0028] In the formula (I), ◯ represents a tetravalent organic group, and oct represents a divalent organic group. Expression (
3) 中の◦ 2は 3価の有機基を表し、 2は 2価の有機基を表す。 式 (3’ ) 中の◦ 3は 4価の有機基を表し、 3は 2価の有機基を表す。 式 (1〇) 中の〇4 及び 4は、 それぞれ 2価の有機基を表す。 3) in 2 ) represents a trivalent organic group, and 2 represents a divalent organic group. In the formula (3′), ◦ 3 represents a tetravalent organic group, and 3 represents a divalent organic group. Each of 0 4 and 4 in the formula (10) represents a divalent organic group.
[0029] 式 ( I) 中、 ◦で表される 4価の有機基の有機基 (以下、 ◦の有機基と いうことがある) としては、 非環式脂肪族基、 環式脂肪族基及び芳香族基か らなる群から選ばれる基が挙げられる。 ◦の有機基は、 イミ ド系ポリマーを 含む基材の透明性及び屈曲性の観点から、 4価の環式脂肪族基又は 4価の芳 香族基であることが好ましい。 芳香族基としては、 単環式芳香族基、 縮合多 環式芳香族基及び 2以上の芳香族環を有しそれらが直接または結合基により 相互に連結された非縮合多環式芳香族基等が挙げられる。 基材の透明性及び 着色の抑制の観点から、 ◦の有機基は、 環式脂肪族基、 フッ素系置換基を有 する環式脂肪族基、 フッ素系置換基を有する単環式芳香族基、 フッ素系置換 基を有する縮合多環式芳香族基又はフッ素系置換基を有する非縮合多環式芳 〇 2020/175337 11 卩(:171? 2020 /006912 [0029] In the formula (I), the organic group of the tetravalent organic group represented by ◦ (hereinafter, may be referred to as the organic group of ◦) is an acyclic aliphatic group or a cyclic aliphatic group. And a group selected from the group consisting of aromatic groups. From the viewpoint of transparency and flexibility of the base material containing the imide polymer, the organic group of ◯ is preferably a tetravalent cycloaliphatic group or a tetravalent aromatic group. The aromatic group includes a monocyclic aromatic group, a condensed polycyclic aromatic group, and a non-condensed polycyclic aromatic group having two or more aromatic rings, which are directly or linked to each other by a bonding group. Etc. From the viewpoint of transparency of the base material and suppression of coloring, the organic group of ◦ is a cycloaliphatic group, a cycloaliphatic group having a fluorine-containing substituent, or a monocyclic aromatic group having a fluorine-containing substituent. , A fused polycyclic aromatic group having a fluorine-based substituent or a non-fused polycyclic aromatic group having a fluorine-based substituent 〇 2020/175 337 11 卩 (:171? 2020 /006912
香族基であることが好ましい。 本明細書においてフッ素系置換基とは、 フッ 素原子を含む基を意味する。 フッ素系置換基は、 好ましくはフルオロ基 (フ ッ素原子, _ ) 及びパーフルオロアルキル基であり、 さらに好ましくはフ ルオロ基及びトリフルオロメチル基である。 It is preferably an aromatic group. In the present specification, the fluorine-based substituent means a group containing a fluorine atom. The fluorine-based substituent is preferably a fluoro group (fluorine atom, _) and a perfluoroalkyl group, and more preferably a fluoro group and a trifluoromethyl group.
[0030] より具体的には、 ◦の有機基は、 例えば、 飽和又は不飽和シクロアルキル 基、 飽和又は不飽和へテロシクロアルキル基、 アリール基、 ヘテロアリール 基、 アリールアルキル基、 アルキルアリール基、 ヘテロアルキルアリール基 、 及び、 これらのうちの任意の 2つの基 (同一でもよい) を有しこれらが直 接又は結合基により相互に連結された基から選ばれる。 結合基としては、 一 〇一、 炭素数 1〜 1 0のアルキレン基、 _ 3〇2—、 _〇〇一又は _〇〇_ ([¾は、 メチル基、 エチル基、 プロピル基等の炭素数 1〜 3のアルキル 基又は水素原子を表す) が挙げられる。 [0030] More specifically, the organic group represented by: is, for example, a saturated or unsaturated cycloalkyl group, a saturated or unsaturated heterocycloalkyl group, an aryl group, a heteroaryl group, an arylalkyl group, an alkylaryl group, And a heteroalkylaryl group, and any two groups (may be the same) of these groups, which are directly or linked to each other by a bonding group. The bonding group, one hundred and one, alkylene group of from 1 to 1 0 carbon atoms, _ 3_Rei 2 -, _〇_〇 one or _〇_〇_ ([¾ is a methyl group, an ethyl group, and propyl group having a carbon Which represents an alkyl group of the formula 1 to 3 or a hydrogen atom).
[0031 ] ◦で表される 4価の有機基の炭素数は通常 2〜 3 2であり、 好ましくは 4 〜 1 5であり、 より好ましくは 5〜 1 0であり、 さらに好ましくは 6〜 8で ある。 ◦の有機基が環式脂肪族基又は芳香族基である場合、 これらの基を構 成する炭素原子のうちの少なくとも 1つがへテロ原子で置き換えられていて もよい。 ヘテロ原子としては、 〇、 1\]又は 3が挙げられる。 [0031] The tetravalent organic group represented by ◦ usually has 2 to 32 carbon atoms, preferably 4 to 15 carbon atoms, more preferably 5 to 10 carbon atoms, and further preferably 6 to 8 carbon atoms. Is. When the organic group of ◦ is a cycloaliphatic group or an aromatic group, at least one of the carbon atoms constituting these groups may be replaced with a hetero atom. Examples of the hetero atom include O, 1\] or 3.
[0032] ◦の具体例としては、 以下の式 (2 0) 、 式 (2 1) 、 式 (2 2) 、 式 ( As specific examples of ◦, the following formula (20), formula (2 1), formula (2 2), formula (2)
2 3) 、 式 (2 4) 、 式 (2 5) 又は式 (2 6) で表される基が挙げられる 。 式中の*は結合手を示す。 式 (2 6) 中の は、 単結合、 _〇一、 _〇1~1 2 —、 一〇 ( 0 1~1 3) 2 __八 「一〇一八 「一、 一八 「一 0 \~\ 2 _八 「一、 一八 r — 0 (〇1~1 3
Figure imgf000012_0001
八 「は炭素数 6〜 2 0のアリール基を表し、 例えば、 フエニレン基であってもよい。 これ らの基の水素原子のうち少なくとも 1つが、 フッ素系置換基で置換されてい てもよい。
Groups represented by formula (2 3), formula (2 4), formula (2 5) or formula (2 6). * In the formula indicates a bond. In formula (26), is a single bond, _ 〇 1, _ 〇 1 to 1 2 —, 10 (0 1 to 1 3) 2 _ , _ 8 ”10 18 ”1, 18 ”1 0 \~\ 2 _ 8 "One, eighteen r — 0 (〇 1 ~ 1 3 )
Figure imgf000012_0001
“8” represents an aryl group having 6 to 20 carbon atoms, and may be, for example, a phenylene group. At least one hydrogen atom of these groups may be substituted with a fluorine-based substituent.
[0033] \¥02020/175337 12 卩(:171?2020/006912 [0033] \¥02020/175337 12 卩 (: 171?2020/006912
[化 3] [Chemical 3]
Figure imgf000013_0001
Figure imgf000013_0001
[0034] 式 ( |) 中、 で表される 2価の有機基の有機基 (以下、 の有機基と いうことがある) としては、 非環式脂肪族基、 環式脂肪族基及び芳香族基か らなる群から選択される基が挙げられる。 で表される 2価の有機基は、 2 価の環式脂肪族基及び 2価の芳香族基から選ばれることが好ましい。 芳香族 基としては、 単環式芳香族基、 縮合多環式芳香族基、 及び 2以上の芳香族環 を有しそれらが直接または結合基により相互に連結された非縮合多環式芳香 族基が挙げられる。 基材の透明性、 及び着色の抑制の観点から、 の有機基 には、 フッ素系置換基が導入されていることが好ましい。 [0034] In the formula (|), as the organic group of the divalent organic group represented by (the following may be referred to as the organic group), an acyclic aliphatic group, a cyclic aliphatic group and an aromatic group are included. Examples include groups selected from the group consisting of group groups. The divalent organic group represented by is preferably selected from a divalent cycloaliphatic group and a divalent aromatic group. The aromatic group includes a monocyclic aromatic group, a condensed polycyclic aromatic group, and a non-condensed polycyclic aromatic group having two or more aromatic rings, which are directly or linked to each other by a bonding group. Groups. From the viewpoints of transparency of the base material and suppression of coloring, it is preferable that a fluorine-based substituent is introduced into the organic group.
[0035] より具体的には、 八の有機基は、 例えば、 飽和又は不飽和シクロアルキル 基、 飽和又は不飽和へテロシクロアルキル基、 アリール基、 ヘテロアリール 基、 アリールアルキル基、 アルキルアリール基、 ヘテロアルキルアリール基 、 及びこれらの内の任意の 2つの基 (同一でもよい) を有しそれらが直接又 は結合基により相互に連結された基から選ばれる。 ヘテロ原子としては、 〇 、 1\1又は 3が挙げられ、 結合基としては、 一〇一、 炭素数 1〜 1 0のアルキ レン基、 一 3〇2—、 一〇〇一又は一〇〇一
Figure imgf000013_0002
([¾はメチル基、 エチル基 、 プロピル基等の炭素数 1〜 3のアルキル基又は水素原子を含む) が挙げら れる。
[0035] More specifically, the eight organic groups include, for example, a saturated or unsaturated cycloalkyl group, a saturated or unsaturated heterocycloalkyl group, an aryl group, a heteroaryl group, an arylalkyl group, an alkylaryl group, A heteroalkylaryl group, and any two of these groups (which may be the same), which are linked to each other directly or by a linking group. The hetero atom, 〇, include 1 \ 1 or 3, as the bonding group, one hundred and one from 1 to 1 0 alkylene group carbon number one 3_Rei 2 -, one hundred one or one hundred one
Figure imgf000013_0002
([Including an alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group or a hydrogen atom]).
[0036] 八で表される 2価の有機基の炭素数は、 通常 2〜 4 0であり、 好ましくは [0036] The carbon number of the divalent organic group represented by 8 is usually 2 to 40, and preferably
5〜 3 2であり、 より好ましくは 1 2〜 2 8であり、 さらに好ましくは 2 4 〜 2 7である。 It is 5 to 32, more preferably 12 to 28, and further preferably 24 to 27.
[0037] 八の具体例としては、 以下の式 (3 0) 、 式 (3 1) 、 式 (3 2) 、 式 ( \¥0 2020/175337 13 卩(:17 2020 /006912 [0037] As a specific example of Eighth, the following formula (3 0), formula (3 1), formula (3 2), formula (3) \¥0 2020/175 337 13 卩 (: 17 2020 /006912
3 3) 又は式 (3 4) で表される基が挙げられる。 式中の*は結合手を示す 。 2 1 ~ 3は、 それぞれ独立して、 単結合、 _〇一、
Figure imgf000014_0001
-〇 (〇1~1
3 3) or a group represented by the formula (34). * In the formula indicates a bond. 2 1 to 3 are each independently a single bond, _ 〇,
Figure imgf000014_0001
-〇 (〇1-1
3) 2—、 _ 3〇2—、 一〇〇一又は一〇〇一
Figure imgf000014_0002
([¾はメチル基、 エチル基 、 プロピル基等の炭素数 1〜 3のアルキル基又は水素原子を表す) を表す。 下記の基において、
Figure imgf000014_0003
2、 及び、 23は、 それぞれ、 各環に対して メタ位又はパラ位にあることが好ましい。 また、 1と末端の単結合、 2と 末端の単結合、 及び、 3と末端の単結合とは、 それぞれメタ位又はパラ位に あることが好ましい。 八の 1つの例において、 1及び 3が一〇一であり、 かつ、 2が _〇1~1 2—、 _〇 (〇1~1 32—又は _ 3〇 2—である。 これらの基 の水素原子の 1つ又は 2つ以上が、 フッ素系置換基で置換されていてもよい
3) 2, _ 3_Rei 2 -, one thousand and one or one thousand and one
Figure imgf000014_0002
([Represents a methyl group, an ethyl group, a propyl group, or another alkyl group having 1 to 3 carbon atoms or a hydrogen atom]. In the following groups,
Figure imgf000014_0003
And 2 , and 2 and 3 are preferably in the meta or para position with respect to each ring. Further, the single bond between 1 and the terminal, the single bond between 2 and the terminal, and the single bond between 3 and the terminal are preferably in the meta position or the para position, respectively. In one example eight, 1 and 3 are one hundred and one, and 2 _〇_1 ~ 1 2 -, _〇 (Rei_1 ~ 1 3) 2 - or _ 3_Rei 2 -. One or more hydrogen atoms of these groups may be substituted with a fluorine-based substituent.
[0038] [化 4] [0038] [Chemical 4]
Figure imgf000014_0004
Figure imgf000014_0004
[0039] 八及び◦の少なくとも一方を構成する水素原子のうちの少なくとも 1つの 水素原子が、 フッ素系置換基、 水酸基、 スルホン基及び炭素数 1〜 1 〇のア ルキル基等からなる群から選ばれる少なくとも 1種の官能基で置換されてい てもよい。 また、 の有機基及び◦の有機基がそれぞれ環式脂肪族基又は芳 香族基である場合に、 及び◦の少なくとも一方がフッ素系置換基を有する ことが好ましく、 及び◦の両方がフッ素系置換基を有することがより好ま しい。 [0039] At least one hydrogen atom of hydrogen atoms constituting at least one of 8 and ◦ is selected from the group consisting of a fluorine-based substituent, a hydroxyl group, a sulfone group, and an alkyl group having 1 to 10 carbon atoms. May be substituted with at least one functional group. Further, when the organic group of and the organic group of is respectively a cycloaliphatic group or an aromatic group, it is preferable that at least one of and has a fluorine-based substituent, and both of and are fluorine-based. It is more preferable to have a substituent.
[0040] 式 (3) 中の◦ 2は、 3価の有機基である。 この有機基は、 3価の基である 〇 2020/175337 14 卩(:171? 2020 /006912 [0040] ◦ 2 in the formula (3) is a trivalent organic group. This organic group is a trivalent group 〇 2020/175 337 14 卩 (:171? 2020 /006912
点以外は、 式 ( 丨) 中の◦の有機基と同様の基から選択することができる 。 の例としては、 ◦の具体例として挙げられた式 (2 0) 〜式 (2 6) で 表される基の 4つの結合手のうち、 いずれか 1つが水素原子に置き換わった 基を挙げることができる。 式 (3) 中の八2は式 ( I) 中の八と同様の基か ら選択することができる。 Except for the point, it can be selected from the same groups as the organic groups of ◦ in the formula (). As an example of, one of four bonds of the groups represented by formula (20) to formula (26) given as a specific example of You can Eight two in formula (3) can be selected from the same groups as eight in formula (I).
[0041 ] 式 (3’
Figure imgf000015_0001
式 ( I) 中の〇と同様の基から選択することがで きる。 式 (3’ ) 中の八3は、 式 ( I) 中の八と同様の基から選択すること ができる。
[0041] Expression (3'
Figure imgf000015_0001
It can be selected from the same groups as ◯ in formula (I). Eight- three in formula (3') can be selected from the same groups as eight in formula (I).
[0042] 式 (1〇) 中の◦ 4は、 2価の有機基である。 この有機基は、 2価の基である 点以外は、 式 ( 丨) 中の◦の有機基と同様の基から選択することができる 。 の例としては、 ◦の具体例として挙げられた式 (2 0) 〜式 (2 6) で 表される基の 4つの結合手のうち、 いずれか 2つが水素原子に置き換わった 基を挙げることができる。 式 (匕) 中の八4は、 式 ( I) 中の八と同様の基 から選択することができる。 In formula (10), ◦ 4 is a divalent organic group. This organic group can be selected from the same groups as the organic group of ◯ in the formula (), except that it is a divalent group. As an example of, a group in which any two of the four bonds of the groups represented by formula (20) to formula (26) given as specific examples of You can Eight four in formula (I) can be selected from the same groups as eight in formula (I).
[0043] イミ ド系ポリマーを含む基材に含まれるイミ ド系ポリマーは、 ジアミン類 と、 テトラカルボン酸化合物 (酸クロライ ド化合物およびテトラカルボン酸 二無水物などのテトラカルボン酸化合物類縁体を含む) 又はトリカルボン酸 化合物 (酸クロライ ド化合物及びトリカルボン酸無水物などのトリカルボン 酸化合物類縁体を含む) の少なくとも 1種類とを重縮合することによって得 られる縮合型高分子であってもよい。 さらにジカルボン酸化合物 (酸クロラ イ ド化合物などの類縁体を含む) を重縮合させてもよい。 式 ( 丨) 又は式 (3’ ) で表される繰り返し構造単位は、 通常、 ジアミン類及びテトラカル ボン酸化合物から誘導される。 式 (3) で表される繰り返し構造単位は、 通 常、 ジアミン類及びトリカルボン酸化合物から誘導される。 式 (匕) で表さ れる繰り返し構造単位は、 通常、 ジアミン類及びジカルボン酸化合物から誘 導される。 The imide-based polymer contained in the base material containing the imide-based polymer includes a diamine, a tetracarboxylic acid compound (an acid chloride compound, and a tetracarboxylic acid compound analog such as tetracarboxylic dianhydride Or a tricarboxylic acid compound (including an acid chloride compound and a tricarboxylic acid compound analog such as a tricarboxylic acid anhydride), may be a condensation polymer obtained by polycondensation. Further, a dicarboxylic acid compound (including an analog such as an acid chloride compound) may be polycondensed. The repeating structural unit represented by the formula () or the formula (3') is usually derived from a diamine and a tetracarboxylic acid compound. The repeating structural unit represented by the formula (3) is usually derived from a diamine and a tricarboxylic acid compound. The repeating structural unit represented by the formula (匕) is usually derived from diamines and dicarboxylic acid compounds.
[0044] テトラカルボン酸化合物としては、 芳香族テトラカルボン酸化合物、 脂環 式テトラカルボン酸化合物及び非環式脂肪族テトラカルボン酸化合物等が挙 〇 2020/175337 15 卩(:171? 2020 /006912 [0044] Examples of the tetracarboxylic acid compound include aromatic tetracarboxylic acid compounds, alicyclic tetracarboxylic acid compounds, and acyclic aliphatic tetracarboxylic acid compounds. 〇 2020/175 337 15 卩 (:171? 2020 /006912
げられる。 これらは、 2種以上を併用してもよい。 テトラカルボン酸化合物 は、 好ましくはテトラカルボン酸二無水物である。 テトラカルボン酸二無水 物としては、 芳香族テトラカルボン酸二無水物、 脂環式テトラカルボン酸二 無水物、 非環式脂肪族テトラカルボン酸二無水物が挙げられる。 You can get it. These may be used in combination of two or more. The tetracarboxylic acid compound is preferably tetracarboxylic dianhydride. Examples of the tetracarboxylic acid dianhydride include aromatic tetracarboxylic acid dianhydride, alicyclic tetracarboxylic acid dianhydride, and acyclic aliphatic tetracarboxylic acid dianhydride.
[0045] イミ ド系ポリマーの溶媒に対する溶解性、 並びに基材を形成した場合の透 明性及び屈曲性の観点から、 テトラカルボン酸化合物は、 脂環式テトラカル ボン化合物又は芳香族テトラカルボン酸化合物等であることが好ましい。 イ ミ ド系ポリマーを含む基材の透明性及び着色の抑制の観点から、 テトラカル ボン酸化合物は、 フッ素系置換基を有する脂環式テトラカルボン酸化合物及 びフッ素系置換基を有する芳香族テトラカルボン酸化合物から選ばれること が好ましく、 フッ素系置換基を有する脂環式テトラカルボン酸化合物である ことがさらに好ましい。 [0045] From the viewpoint of the solubility of the imide-based polymer in a solvent, and the transparency and flexibility when forming a substrate, the tetracarboxylic acid compound is an alicyclic tetracarbone compound or an aromatic tetracarboxylic acid compound. Etc. are preferred. From the viewpoint of transparency and suppression of coloring of a base material containing an imide-based polymer, a tetracarboxylic acid compound is an alicyclic tetracarboxylic acid compound having a fluorine-based substituent and an aromatic tetracarboxylic acid compound having a fluorine-based substituent. It is preferably selected from carboxylic acid compounds, and more preferably an alicyclic tetracarboxylic acid compound having a fluorine-based substituent.
[0046] トリカルボン酸化合物としては、 芳香族トリカルボン酸、 脂環式トリカル ボン酸、 非環式脂肪族トリカルボン酸及びそれらの類縁の酸クロライ ド化合 物、 酸無水物等が挙げられる。 トリカルボン酸化合物は、 好ましくは芳香族 トリカルボン酸、 脂環式トリカルボン酸、 非環式脂肪族トリカルボン酸及び それらの類縁の酸クロライ ド化合物から選ばれる。 トリカルボン酸化合物は 、 2種以上を併用してもよい。 [0046] Examples of the tricarboxylic acid compound include aromatic tricarboxylic acids, alicyclic tricarboxylic acids, acyclic aliphatic tricarboxylic acids and their related acid chloride compounds, and acid anhydrides. The tricarboxylic acid compound is preferably selected from aromatic tricarboxylic acid, alicyclic tricarboxylic acid, acyclic aliphatic tricarboxylic acid and their related acid chloride compounds. Two or more tricarboxylic acid compounds may be used in combination.
[0047] イミ ド系ポリマーの溶媒に対する溶解性、 並びにイミ ド系ポリマーを含む 基材を形成した場合の透明性及び屈曲性の観点から、 トリカルボン酸化合物 は、 脂環式トリカルボン酸化合物又は芳香族トリカルボン酸化合物であるこ とが好ましい。 イミ ド系ポリマーを含む基材の透明性及び着色の抑制の観点 から、 トリカルボン酸化合物は、 フッ素系置換基を有する脂環式トリカルボ ン酸化合物又はフッ素系置換基を有する芳香族トリカルボン酸化合物である ことがより好ましい。 [0047] From the viewpoint of the solubility of the imide-based polymer in a solvent, and the transparency and flexibility when a substrate containing the imide-based polymer is formed, the tricarboxylic acid compound is an alicyclic tricarboxylic acid compound or an aromatic compound. It is preferably a tricarboxylic acid compound. From the viewpoint of transparency and suppression of coloration of a base material containing an imide-based polymer, the tricarboxylic acid compound is an alicyclic tricarboxylic acid compound having a fluorine-based substituent or an aromatic tricarboxylic acid compound having a fluorine-based substituent. More preferably.
[0048] ジカルボン酸化合物としては、 芳香族ジカルボン酸、 脂環式ジカルボン酸 、 非環式脂肪族ジカルボン酸及びそれらの類縁の酸クロライ ド化合物、 酸無 水物等が挙げられる。 ジカルボン酸化合物は、 好ましくは芳香族ジカルボン 酸、 脂環式ジカルボン酸、 非環式脂肪族ジカルボン酸及びそれらの類縁の酸 クロライ ド化合物から選ばれる。 ジカルボン酸化合物は、 2種以上併用して もよい。 [0048] Examples of the dicarboxylic acid compound include aromatic dicarboxylic acids, alicyclic dicarboxylic acids, acyclic aliphatic dicarboxylic acids and their related acid chloride compounds, and acid anhydrides. The dicarboxylic acid compound is preferably an aromatic dicarboxylic acid. It is selected from acids, alicyclic dicarboxylic acids, acyclic aliphatic dicarboxylic acids and their related acid chloride compounds. Two or more dicarboxylic acid compounds may be used in combination.
[0049] イミ ド系ポリマーの溶媒に対する溶解性、 並びにイミ ド系ポリマーを含む 基材を形成した場合の透明性及び屈曲性の観点から、 ジカルボン酸化合物は 、 脂環式ジカルボン酸化合物又は芳香族ジカルボン酸化合物であることが好 ましい。 イミ ド系ポリマーを含む基材の透明性及び着色の抑制の観点から、 ジカルボン酸化合物は、 フッ素系置換基を有する脂環式ジカルボン酸化合物 又はフッ素系置換基を有する芳香族ジカルボン酸化合物であることがさらに 好ましい。 From the viewpoint of the solubility of the imide-based polymer in a solvent, and the transparency and flexibility when a substrate containing the imide-based polymer is formed, the dicarboxylic acid compound is an alicyclic dicarboxylic acid compound or an aromatic compound. It is preferably a dicarboxylic acid compound. The dicarboxylic acid compound is an alicyclic dicarboxylic acid compound having a fluorine-based substituent or an aromatic dicarboxylic acid compound having a fluorine-based substituent from the viewpoint of transparency and suppression of coloration of a substrate containing an imide-based polymer. Is more preferable.
[0050] ジアミン類としては、 芳香族ジアミン、 脂環式ジアミン及び脂肪族ジアミ ンが挙げられ、 これらは 2種以上併用してもよい。 イミ ド系ポリマーの溶媒 に対する溶解性、 並びにイミ ド系ポリマーを含む基材を形成した場合の透明 性及び屈曲性の観点から、 ジアミン類は、 脂環式ジアミン及びフッ素系置換 基を有する芳香族ジアミンから選ばれることが好ましい。 [0050] Examples of the diamines include aromatic diamines, alicyclic diamines, and aliphatic diamines, and two or more of them may be used in combination. From the viewpoint of the solubility of the imide-based polymer in a solvent and the transparency and flexibility when a substrate containing the imide-based polymer is formed, diamines are alicyclic diamines and aromatic compounds having a fluorine-based substituent. It is preferably selected from diamines.
[0051] このようなイミ ド系ポリマーを使用すれば、 特に優れた屈曲性を有し、 高 い光透過率 (例えば、 550 n mの光に対して 85 %以上、 好ましくは 88 %以上) 、 低い黄色度 (Y 丨値、 5以下、 好ましくは 3以下) 、 及び低いへ イズ ( 1. 5 %以下、 好ましくは 1. 0%以下) を有する基材が得られ易い [0051] The use of such an imide-based polymer has particularly excellent flexibility and a high light transmittance (for example, 85% or more, preferably 88% or more with respect to light of 550 nm), It is easy to obtain a substrate having low yellowness (Y value, 5 or less, preferably 3 or less), and low haze (1.5% or less, preferably 1.0% or less).
[0052] イミ ド系ポリマーは、 異なる複数の種類の上記の繰り返し構造単位を含む 共重合体でもよい。 ポリイミ ド系高分子の重量平均分子量は、 通常 1 〇, 〇 00〜 500, 000である。 イミ ド系ポリマーの重量平均分子量は、 好ま しくは、 50, 000〜 500, 000であり、 さらに好ましくは 70, 0 00〜 400, 000である。 重量平均分子量は、 ゲル浸透クロマトグラフ ィー (Ge l P e r me a t i o n C h r om a t o g r a p h y ; G PC) で測定した標準ポリスチレン換算分子量である。 イミ ド系ポリマーの 重量平均分子量が大きいと高い屈曲性を得られやすい傾向があるが、 イミ ド 〇 2020/175337 17 卩(:171? 2020 /006912 [0052] The imide-based polymer may be a copolymer containing a plurality of different types of repeating structural units described above. The weight average molecular weight of the polyimide-based polymer is usually 100,000 to 500,000. The weight average molecular weight of the imide-based polymer is preferably 50,000 to 500,000, more preferably 70,000 to 400,000. The weight average molecular weight is a standard polystyrene equivalent molecular weight measured by gel permeation chromatography (GPC). If the weight average molecular weight of the imido polymer is large, it tends to be easy to obtain high flexibility. 〇 2020/175 337 17 卩 (:171? 2020 /006912
系ポリマーの重量平均分子量が大きすぎると、 ワニスの粘度が高くなり、 加 エ性が低下する傾向がある。 If the weight average molecular weight of the base polymer is too large, the viscosity of the varnish becomes high and the additivity tends to decrease.
[0053] イミ ド系ポリマーは、 上述のフッ素系置換基等によって導入できるフッ素 原子等のハロゲン原子を含んでいてもよい。 ポリイミ ド系高分子がハロゲン 原子を含むことにより、 イミ ド系ポリマーを含む基材の弾性率を向上させ且 つ黄色度を低減させることができる。 これにより、 ハードコートフイルムに 発生するキズ及びシワ等が抑制され、 且つ、 イミ ド系ポリマーを含む基材の 透明性を向上させることができる。 ハロゲン原子として好ましくは、 フッ素 原子である。 ポリイミ ド系高分子におけるハロゲン原子の含有量は、 ポリイ ミ ド系高分子の質量を基準として、 1〜 4 0質量%であることが好ましく、 [0053] The imide-based polymer may contain a halogen atom such as a fluorine atom that can be introduced by the above-mentioned fluorine-based substituent or the like. When the polyimide polymer contains a halogen atom, it is possible to improve the elastic modulus of the substrate containing the imide polymer and reduce the yellowness. As a result, scratches, wrinkles, and the like that occur on the hard coat film can be suppressed, and the transparency of the substrate containing the imido polymer can be improved. The halogen atom is preferably a fluorine atom. The content of halogen atoms in the polyimide-based polymer is preferably 1 to 40 mass% based on the mass of the polyimide-based polymer,
1〜 3 0質量%であることがより好ましい。 It is more preferably 1 to 30% by mass.
[0054] イミ ド系ポリマーを含む基材は、 1種又は 2種以上の紫外線吸収剤を含有 していてもよい。 紫外線吸収剤は、 樹脂材料の分野で紫外線吸収剤として通 常用いられているものから、 適宜選択することができる。 紫外線吸収剤は、 The substrate containing the imide-based polymer may contain one kind or two or more kinds of ultraviolet absorbers. The ultraviolet absorber can be appropriately selected from those commonly used as an ultraviolet absorber in the field of resin materials. UV absorbers
4 0 0 n
Figure imgf000018_0001
以下の波長の光を吸収する化合物を含んでいてもよい。 イミ ド系 ポリマーと適切に組み合わせることのできる紫外線吸収剤は、 例えば、 ベン ゾフエノン系化合物、 サリシレート系化合物、 ベンゾトリアゾール系化合物 及びトリアジン系化合物からなる群より選ばれる少なくとも 1種の化合物が 挙げられる。
4 0 0 n
Figure imgf000018_0001
It may contain a compound that absorbs light of the following wavelengths. The ultraviolet absorber that can be appropriately combined with the imide-based polymer includes, for example, at least one compound selected from the group consisting of benzophenone-based compounds, salicylate-based compounds, benzotriazole-based compounds, and triazine-based compounds.
本明細書において、 「系化合物」 とは、 「系化合物」 が付される化合物の 誘導体を指す。 例えば、 「ベンゾフエノン系化合物」 とは、 母体骨格として のべンゾフエノンと、 ベンゾフエノンに結合している置換基とを有する化合 物を指す。 In the present specification, the “system compound” refers to a derivative of the compound to which the “system compound” is attached. For example, “benzophenone-based compound” refers to a compound having benzophenone as a base skeleton and a substituent bonded to benzophenone.
[0055] 紫外線吸収剤の含有量は、 基材の全体質量に対して、 通常 1質量%以上で あり、 好ましくは 2質量%以上であり、 より好ましくは 3質量%以上であり 、 通常 1 〇質量%以下であり、 好ましくは 8質量%以下であり、 より好まし くは 6質量%以下である。 紫外線吸収剤がこれらの量で含まれることで、 基 材の耐候性を高めることができる。 〇 2020/175337 18 卩(:171? 2020 /006912 [0055] The content of the ultraviolet absorber is usually 1% by mass or more, preferably 2% by mass or more, more preferably 3% by mass or more, usually 10% with respect to the total mass of the substrate. It is not more than 8% by mass, preferably not more than 8% by mass, more preferably not more than 6% by mass. By containing the ultraviolet absorber in these amounts, the weather resistance of the base material can be enhanced. 〇 2020/175 337 18 卩 (:171? 2020 /006912
[0056] イミ ド系ポリマーを含む基材は、 無機粒子等の無機材料を更に含有してい てもよい。 無機材料は、 ケイ素原子を含むケイ素材料が好ましい。 イミ ド系 ポリマーを含む基材がケイ素材料等の無機材料を含有することで、 イミ ド系 ポリマーを含む基材の引張弾性率を容易に 4 .〇〇 3以上とすることができ る。 ただし、 イミ ド系ポリマーを含む基材の引張弾性率を制御する方法は、 無機材料の配合に限られない。 [0056] The substrate containing the imide-based polymer may further contain an inorganic material such as inorganic particles. The inorganic material is preferably a silicon material containing silicon atoms. Since the base material containing the imide-based polymer contains an inorganic material such as a silicon material, the tensile elastic modulus of the base material containing the imide-based polymer can be easily increased to 4.003 or more. However, the method of controlling the tensile elastic modulus of the base material containing the imide polymer is not limited to the compounding of the inorganic material.
[0057] ケイ素原子を含むケイ素材料としては、 シリカ粒子、 オルトケイ酸テトラ エチル (丁巳〇3) 等の 4級アルコキシシラン、 シルセスキオキサン誘導体 等のケイ素化合物が挙げられる。 これらのケイ素材料の中でも、 イミ ド系ポ リマーを含む基材の透明性及び屈曲性の観点から、 シリカ粒子が好ましい。 [0057] Examples of the silicon material containing a silicon atom include silica particles, quaternary alkoxysilanes such as tetraethyl orthosilicate (Chomi 03), and silicon compounds such as silsesquioxane derivatives. Among these silicon materials, silica particles are preferable from the viewpoint of transparency and flexibility of the substrate containing the imide polymer.
[0058] シリカ粒子の平均一次粒子径は、 通常、 1 0 0 n
Figure imgf000019_0001
以下である。 シリカ粒 子の平均一次粒子径が 1 0 0 n 以下であると透明性が向上する傾向がある
[0058] The average primary particle diameter of silica particles is usually 100 n
Figure imgf000019_0001
It is the following. When the average primary particle size of silica particles is 100 n or less, transparency tends to improve.
[0059] イミ ド系ポリマーを含む基材中のシリカ粒子の平均一次粒子径は、 透過型 電子顕微鏡 (丁巳 IV!) による観察で求めることができる。 シリカ粒子の一次 粒子径は、 透過型電子顕微鏡 (丁巳 IV!) による定方向径とすることができる 。 平均一次粒子径は、 丁巳 IV!観察により一次粒子径を 1 0点測定し、 それら の平均値として求めることができる。 イミ ド系ポリマーを含む基材を形成す る前のシリカ粒子の粒子分布は、 市販のレーザー回折式粒度分布計により求 めることができる。 [0059] The average primary particle diameter of silica particles in a substrate containing an imide-based polymer can be determined by observation with a transmission electron microscope (Cingemi IV!). The primary particle size of the silica particles can be a unidirectional diameter measured by a transmission electron microscope (Dingmi IV!). The average primary particle diameter can be obtained as an average value of 10 points of the primary particle diameter measured by observing D. The particle distribution of silica particles before forming a base material containing an imide-based polymer can be obtained by a commercially available laser diffraction particle size distribution analyzer.
[0060] イミ ド系ポリマーを含む基材において、 イミ ド系ポリマーと無機材料との 配合比は、 両者の合計を 1 0として、 質量比で、 1 : 9〜 1 0 : 0であるこ とが好ましく、 3 : 7〜 1 0 : 0であることがより好ましく、 3 : 7〜 8 : [0060] In a base material containing an imide-based polymer, the mixing ratio of the imide-based polymer and the inorganic material is 1:9 to 10:0 in terms of mass ratio with the total of both being 10. Preferably, it is more preferably 3:7 to 10:0, and 3:7 to 8:
2であることがさらに好ましく、 3 : 7〜 7 : 3であることがよりさらに好 ましい。 イミ ド系ポリマー及び無機材料の合計質量に対する無機材料の割合 は、 通常 2 0質量%以上であり、 好ましくは 3 0質量%以上であり、 通常 9 〇質量%以下であり、 好ましくは 7 0質量%以下である。 イミ ド系ポリマー と無機材料 (ケイ素材料) との配合比が上記の範囲内であると、 イミ ド系ポ 〇 2020/175337 19 卩(:171? 2020 /006912 2 is more preferable, and 3:7 to 7:3 is even more preferable. The ratio of the inorganic material to the total mass of the imido polymer and the inorganic material is usually 20% by mass or more, preferably 30% by mass or more, usually 90% by mass or less, and preferably 70% by mass. % Or less. When the compounding ratio of the imido polymer and the inorganic material (silicon material) is within the above range, the imido polymer is 〇 2020/175 337 19 卩(:171? 2020/006912
リマーを含む基材の透明性及び機械的強度が向上する傾向がある。 また、 イ ミ ド系ポリマーを含む基材の引張弾性率を容易に 4. 0〇 3以上とするこ とができる。 The transparency and mechanical strength of the substrate containing the limmer tend to be improved. In addition, the tensile elastic modulus of the substrate containing the imide-based polymer can be easily increased to 4.03 or more.
[0061] イミ ド系ポリマーを含む基材は、 透明性及び屈曲性を著しく損なわない範 囲で、 イミ ド系ポリマー及び無機材料以外の成分を更に含有していてもよい 。 イミ ド系ポリマー及び無機材料以外の成分としては、 例えば、 酸化防止剤 、 離型剤、 安定剤、 ブルーイング剤等の着色剤、 難燃剤、 滑剤、 増粘剤及び レベリング剤が挙げられる。 イミ ド系ポリマー及び無機材料以外の成分の割 合は、 基材の質量に対して、 0%を超えて 20質量%以下であることが好ま しく、 さらに好ましくは 0%を超えて 1 0質量%以下である。 The base material containing the imide-based polymer may further contain components other than the imide-based polymer and the inorganic material, as long as transparency and flexibility are not significantly impaired. Examples of components other than the imide polymer and the inorganic material include antioxidants, release agents, stabilizers, coloring agents such as bluing agents, flame retardants, lubricants, thickeners and leveling agents. The ratio of components other than imide-based polymers and inorganic materials is preferably more than 0% and 20% by mass or less, more preferably more than 0% and 10% by mass with respect to the mass of the base material. % Or less.
[0062] イミ ド系ポリマーを含む基材がイミ ド系ポリマー及びケイ素材料を含有す るとき、 少なくとも一方の面における、 窒素原子に対するケイ素原子の原子 数比である 3 丨 /1\!が 8以上であることが好ましい。 この原子数比 3 丨 / は、 X線光電子分光
Figure imgf000020_0001
1-101: 06 1 601: 「 0 |·! 3 0〇 I 「〇 3〇〇 ソ、 X ? 3) によって、 イミ ド系ポリマーを含む基材の組成 を評価し、 これによって得られたケイ素原子の存在量と窒素原子の存在量か ら算出される値である。
[0062] When the substrate containing the imide-based polymer contains the imide-based polymer and the silicon material, the ratio of the number of silicon atoms to the number of nitrogen atoms on at least one surface of 3 / 1\! The above is preferable. This atomic number ratio of 3 / / is X-ray photoelectron spectroscopy
Figure imgf000020_0001
1-101: 06 1 601: The composition of the base material containing the imide-based polymer was evaluated by “0 |·! It is a value calculated from the abundance of atoms and the abundance of nitrogen atoms.
[0063] イミ ド系ポリマーを含む基材の少なくとも一方の面における 3 丨 /1\1が 8 以上であることにより、 ハードコート層との充分な密着性が得られる。 密着 性の観点から、 3 丨 / 1\1は、 9以上であることがより好ましく、 1 0以上で あることがさらに好ましく、 50以下であることが好ましく、 40以下であ ることがより好ましい。 [0063] When at least one surface of the substrate containing the imide-based polymer has a ratio of 3 1 /1\1 of 8 or more, sufficient adhesion to the hard coat layer can be obtained. From the viewpoint of adhesion, 3 / 1\1 is more preferably 9 or more, further preferably 10 or more, preferably 50 or less, and more preferably 40 or less. ..
[0064] (基材の厚み) (Substrate thickness)
基材はフイルム状であることが好ましい。 The base material is preferably in the form of a film.
基材の厚みは、 1 〇〇 以下であることがより好ましく、 80 以下 であることが更に好ましく、 50 以下が最も好ましい。 基材の厚みが薄 くなれば、 折り曲げ時の表面と裏面の曲率差が小さくなり、 クラック等が発 生し難くなり、 複数回の折れ曲げでも、 基材の破断が生じなくなる。 一方、 〇 2020/175337 20 卩(:171? 2020 /006912 The thickness of the base material is more preferably 100 or less, further preferably 80 or less, and most preferably 50 or less. When the thickness of the base material is thin, the difference in curvature between the front surface and the back surface during bending is small, cracks are less likely to occur, and breakage of the base material does not occur even if the base material is bent multiple times. on the other hand, 〇 2020/175 337 20 卩 (:171? 2020 /006912
基材の取り扱いの容易さの観点から基材の厚みは 3 以上であることが好 ましく、 5 以上であることがより好ましく、 1 5 以上が最も好まし い。 From the viewpoint of easy handling of the base material, the thickness of the base material is preferably 3 or more, more preferably 5 or more, and most preferably 15 or more.
[0065] (基材の作製方法) (Method for producing base material)
基材は、 熱可塑性のポリマーを熱溶融して製膜しても良いし、 ポリマーを 均一に溶解した溶液から溶液製膜 (ソルベントキャスト法) によって製膜し ても良い。 熱溶融製膜の場合は、 上述の柔軟化素材及び種々の添加剤を、 熱 溶融時に加えることができる。 一方、 基材を溶液製膜法で作製する場合は、 ポリマー溶液 (以下、 ドープともいう) には、 各調製工程において上述の柔 軟化素材及び種々の添加剤を加えることができる。 またその添加する時期は ドープ作製工程において何れでも添加しても良いが、 ドープ調製工程の最後 の調製工程に添加剤を添加し調製する工程を加えて行ってもよい。 The base material may be formed by heat-melting a thermoplastic polymer, or may be formed by solution casting (solvent casting method) from a solution in which the polymer is uniformly dissolved. In the case of heat melting film formation, the above-mentioned softening material and various additives can be added during heat melting. On the other hand, when the substrate is produced by the solution casting method, the above-mentioned softening material and various additives can be added to the polymer solution (hereinafter also referred to as a dope) in each preparation step. The addition may be performed at any time in the dope preparation process, but may be carried out by adding the additive to the final preparation process of the dope preparation process.
[0066] 塗膜の乾燥、 及び/又はべーキングのために、 塗膜を加熱してもよい。 塗 膜の加熱温度は、 通常 5 0〜 3 5 0 °〇である。 塗膜の加熱は、 不活性雰囲気 下又は減圧下で行ってもよい。 塗膜を加熱することにより溶媒を蒸発させ、 除去することができる。 基材は、 塗膜を 5 0〜 1 5 0 °〇で乾燥する工程と、 乾燥後の塗膜を 1 8 0〜 3 5 0 °〇でべーキングする工程とを含む方法により 、 形成されてもよい。 [0066] The coating film may be heated for drying and/or baking the coating film. The heating temperature of the coating film is usually 50 to 350 ° . The coating film may be heated under an inert atmosphere or under reduced pressure. The solvent can be evaporated and removed by heating the coating film. The substrate, the method comprising the steps of drying the coating film at 5 0~ 1 5 0 ° 〇, and a step of 1 8 0~ 3 5 0 ° 〇 Debe Kingu the coating film after drying, are formed Good.
[0067] 基材の少なくとも一方の面には、 表面処理を施してもよい。 [0067] At least one surface of the base material may be surface-treated.
[0068] <ハードコート層 ñ [0068] <Hard coat layer ñ
本発明の積層体はハードコート層を含む。 The laminate of the present invention includes a hard coat layer.
ハードコート層は、 基材の少なくとも _方の面上に形成されている。 本発明の積層体は、 少なくとも 1層のハードコート層を、 基材と耐擦傷層 との間に有する。 The hard coat layer is formed on at least the _ side of the substrate. The laminate of the present invention has at least one hard coat layer between the base material and the scratch resistant layer.
本発明の積層体のハードコート層は、 カチオン重合性基を有するポリオル ガノシルセスキオキサン (3 1) 、 及び、 フッ素原子を含有する基とカチオ ン重合性基とラジカル重合性基とを有するポリマー (3) を含むハードコー 卜層形成用組成物の硬化物を含む。 〇 2020/175337 21 卩(:171? 2020 /006912 The hard coat layer of the laminate of the present invention comprises a polyorganosilsesquioxane (3 1) having a cation-polymerizable group, and a group containing a fluorine atom, a cation-polymerizable group and a radical-polymerizable group. It includes a cured product of the hard coat layer-forming composition containing the polymer (3). 〇 2020/175 337 21 卩(: 171? 2020/006912
[0069] (カチオン重合性基を有するポリオルガノシルセスキオキサン (3 1) ) カチオン重合性基を有するポリオルガノシルセスキオキサン (3 1) ( 「 ポリオルガノシルセスキオキサン (3 1) 」 ともいう。 ) について説明する ポリオルガノシルセスキオキサン (3 1) におけるカチオン重合性基とし ては、 特に限定されず、 一般に知られているカチオン重合性基を用いること ができ、 具体的には、 脂環式エーテル基、 環状アセタール基、 環状ラクトン 基、 環状チオエーテル基、 スピロオルソエステル基、 ビニルオキシ基などを 挙げることができる。 カチオン重合性基としては、 脂環式エーテル基、 ビニ ルオキシ基が好ましく、 エポキシ基、 オキセタニル基、 ビニルオキシ基が特 に好ましく、 エポキシ基が最も好ましい。 エポキシ基としては、 脂環式エポ キシ基 (エポキシ基と脂環基の縮環構造を有する基) であってもよい。 (Polyorganosilsesquioxane having a cationically polymerizable group (3 1)) Polyorganosilsesquioxane having a cationically polymerizable group (3 1) (“Polyorganosilsesquioxane (3 1)” The cationically polymerizable group in the polyorganosilsesquioxane (31) is not particularly limited, and a generally known cationically polymerizable group can be used. Examples thereof include an alicyclic ether group, a cyclic acetal group, a cyclic lactone group, a cyclic thioether group, a spiro orthoester group, and a vinyloxy group. As the cationically polymerizable group, an alicyclic ether group and a vinyloxy group are preferable, an epoxy group, an oxetanyl group and a vinyloxy group are particularly preferable, and an epoxy group is most preferable. The epoxy group may be an alicyclic epoxy group (a group having a condensed ring structure of an epoxy group and an alicyclic group).
[0070] ポリオルガノシルセスキオキサン (3 1) は、 下記一般式 (1) で表され るポリオルガノシルセスキオキサンであることが好ましい。 [0070] The polyorganosilsesquioxane (31) is preferably a polyorganosilsesquioxane represented by the following general formula (1).
[0071 ] [化 5] [0071] [Chemical 5]
Figure imgf000022_0001
Figure imgf000022_0001
[0072] 一般式 (1) 中、 [¾匕は、 カチオン重合性基を含有する基を表し、
Figure imgf000022_0002
[0072] In the general formula (1), [?] represents a group containing a cationically polymerizable group,
Figure imgf000022_0002
Is
1価の基を表す。 及び「は、 一般式 (1) 中の 13および 〇の比率を表 し、 + 「 = 1 0 0であり、 は 0超、 「は 0以上である。 一般式 ( 1) 中 に複数の 8匕及び 〇がある場合、 複数の 匕及び 〇はそれぞれ同一であ っても異なっていてもよい。 一般式 (1) 中に複数の 8〇がある場合、 複数 互いに結合を形成してもよい。 Represents a monovalent group. And “represent the ratio of 13 and 〇 in the general formula (1), +“ = 100, is greater than 0, and is “0 or more. When there are swallows and ◯, a plurality of swallows and ◯ may be the same or different, and when there are plural 80 in general formula (1), plural may form a bond with each other. ..
[0073] —般式 ( 1) 中の [ 3 丨 〇】. 5 ] は、 ポリオルガノシルセスキオキサン中、 シロキサン結合 (3 丨 - 0 - 3 I) により構成される構造部分を表す。 [0073] - general formula (1) [. 3丨〇] 5] in during polyorganosilsesquioxane, siloxane bonds (3丨- 0 - 3 I) represents a structural moiety composed of.
ポリオルガノシルセスキオキサンとは、 加水分解性三官能シラン化合物に 由来するシロキサン構成単位 (シルセスキオキサン単位) を有するネッ トワ —ク型ポリマー又は多面体クラスターであり、 シロキサン結合によって、 ラ ンダム構造、 ラダー構造、 ケージ構造などを形成し得る。 本発明において、Polyorganosilsesquioxane is a network having a siloxane constitutional unit (silsesquioxane unit) derived from a hydrolyzable trifunctional silane compound. — A hexagonal polymer or a polyhedral cluster, which can form a random structure, a ladder structure, a cage structure, etc. by a siloxane bond. In the present invention,
[S i 〇!. 5] が表す構造部分は、 上記のいずれの構造であってもよいが、 ラ ダー構造を多く含有していることが好ましい。 ラダー構造を形成しているこ とにより、 積層体の変形回復性を良好に保つことができる。 ラダー構造の形
Figure imgf000023_0001
[S i 〇!. 5] structure represents portion may have any structure described above, but preferably contains a large amount of ladder structure. By forming the ladder structure, it is possible to maintain good deformation recovery of the laminate. Ladder structure shape
Figure imgf000023_0001
d S p e c t r o s c o p y) を測定した際、 1 020— 1 050 c m-1 付近に現れるラダー構造に特徴的な S i -o-s i伸縮に由来する吸収の有 無によって定性的に確認することができる。 When d S pectroscopy) is measured, it can be qualitatively confirmed by the presence or absence of absorption due to the S i -os i expansion and contraction characteristic of the ladder structure that appears around 1 020 — 1 050 cm −1 .
[0074] —般式 (1) 中、 R bは、 カチオン重合性基を含有する基を表し、 エポキ シ基を含有する基を表すことが好ましい。 In general formula (1), R b represents a group containing a cationically polymerizable group, and preferably a group containing an epoxy group.
エポキシ基を含有する基としては、 オキシラン環を有する公知の基が挙げ られる。 Examples of the group containing an epoxy group include known groups having an oxirane ring.
R bは、 下記式 (1 b) 〜 (4 b) で表される基であることが好ましい。 R b is preferably a group represented by the following formulas (1 b) to (4 b).
[0075] [0075]
\¥02020/175337 23 卩(:171? 2020 /006912 \¥02020/175337 23 卩(: 171? 2020 /006912
[化 6] [Chemical 6]
Figure imgf000024_0001
Figure imgf000024_0001
[0076] 上記式 (1 匕) 〜 (4匕) 中、 **は一般式 (1) 中の 3 丨 との連結部分 を表し、 [¾11\ [¾21\
Figure imgf000024_0002
単結合又は 2価の連結基を表す。
Figure imgf000024_0003
[¾3 及び[¾ は、 置換又は無置換のアルキレン基を表すこと が好ましい。
[0076] In the above formulas (1 scoop) to (4 scoops), ** represents a connecting portion with 3 m in the general formula (1), and is represented by [¾ 11 \ [¾ 21 \
Figure imgf000024_0002
Represents a single bond or a divalent linking group.
Figure imgf000024_0003
[[ 3] and [[] are preferably substituted or unsubstituted alkylene groups.
Figure imgf000024_0004
[¾3 及び[¾ が表すアルキレン基としては、 炭素数 1〜 1 〇 の直鎖又は分岐鎖状のアルキレン基が好ましく、 例えば、 メチレン基、 メチ ルメチレン基、 ジメチルメチレン基、 エチレン基、 丨 _プロピレン基、 门一 プロピレン基、 门ーブチレン基、 n -ペンチレン基、 门ーヘキシレン基、 n —デシレン基等が挙げられる。 〇 2020/175337 24 卩(:171? 2020 /006912
Figure imgf000025_0001
3 及び 4 I:が表すアルキレン基が置換基を有する場合の置 換基としては、 ヒドロキシル基、 カルボキシル基、 アルコキシ基、 アリール 基、 ヘテロアリール基、 ハロゲン原子、 ニトロ基、 シアノ基、 シリル基等が 挙げられる。
Figure imgf000024_0004
As the alkylene group represented by [¾ 3 and [¾, a linear or branched alkylene group having 1 to 10 carbon atoms is preferable, and examples thereof include a methylene group, a methylmethylene group, a dimethylmethylene group, an ethylene group, and Examples thereof include a propylene group, a propylene group, a butyl-butylene group, an n-pentylene group, a hexylene group, and an n-decylene group. 〇 2020/175 337 24 卩 (: 171? 2020 /006912
Figure imgf000025_0001
When the alkylene group represented by 3 and 4 I: has a substituent, the substituent is a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group, a silyl group, or the like. Are listed.
Figure imgf000025_0002
3 及び [¾ としては、 無置換の炭素数 1〜 4の直鎖状のア ルキレン基、 無置換の炭素数 3又は 4の分岐鎖状のアルキレン基が好ましく 、 エチレン基、 n -プロピレン基、 又は丨 ープロピレン基がより好ましく、 さらに好ましくはエチレン基、 又は门ープロピレン基である。
Figure imgf000025_0002
As [ 3 and [ 3 ], an unsubstituted straight-chain alkylene group having 1 to 4 carbon atoms and an unsubstituted branched alkylene group having 3 or 4 carbon atoms are preferable, ethylene group, n-propylene More preferably, it is an ethylene group or a closed-propylene group.
[0077] ポリオルガノシルセスキオキサン (3 1) は、 脂環式エポキシ基 (エポキ シ基と脂環基の縮環構造を有する基) を有することが好ましい。 一般式 (1 ) 中の は、 脂環式エポキシ基を有する基であることが好ましく、 エポキ シシクロヘキシル基を有する基であることがより好ましく、 上記式 (1 13) で表される基であることがさらに好ましい。 [0077] The polyorganosilsesquioxane (31) preferably has an alicyclic epoxy group (a group having a condensed ring structure of an epoxy group and an alicyclic group). In the general formula (1) is preferably a group having an alicyclic epoxy group, more preferably a group having an epoxycyclohexyl group, and a group represented by the above formula (1 13) Is more preferable.
[0078] なお、 一般式 (1)
Figure imgf000025_0003
は、 ポリオルガノシルセスキオキサンの原料 として使用する加水分解性三官能シラン化合物におけるケイ素原子に結合し た基 (アルコキシ基及びハロゲン原子以外の基;例えば、 後述の式 (巳) で 表される加水分解性シラン化合物における 13等) に由来する。
[0078] Note that the general formula (1)
Figure imgf000025_0003
Is a group bonded to a silicon atom in the hydrolyzable trifunctional silane compound used as a raw material for the polyorganosilsesquioxane (a group other than an alkoxy group and a halogen atom; for example, represented by the formula (M) below. 13) in hydrolyzable silane compounds).
[0079] 以下に 匕の具体例を示すが、 本発明はこれらに限定されるものではない 。 下記具体例において、 * *は一般式 (1) 中の 3 丨 との連結部分を表す。 [0079] Specific examples of the bowl are shown below, but the invention is not limited thereto. In the following specific examples, ** represents a connecting portion with 3 g in the general formula (1).
[0080] [0080]
um um
Figure imgf000026_0001
〇 2020/175337 26 卩(:171? 2020 /006912
Figure imgf000026_0001
〇 2020/175 337 26 卩 (:171? 2020 /006912
[0081 ] 一般式 (1) 中、
Figure imgf000027_0001
を表す。
[0081] In the general formula (1),
Figure imgf000027_0001
Represents.
〇が表す 1価の基としては、 水素原子、 置換若しくは無置換のアルキル 基、 置換若しくは無置換のシクロアルキル基、 置換若しくは無置換のアルケ ニル基、 置換若しくは無置換のアリール基、 又は置換若しくは無置換のアラ ルキル基が挙げられる。 The monovalent group represented by ◯ is a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted An unsubstituted aralkyl group may be mentioned.
[0082] 〇が表すアルキル基としては、 炭素数 1〜 1 0のアルキル基が挙げられ [0082] Examples of the alkyl group represented by ◯ include an alkyl group having 1 to 10 carbon atoms.
、 例えば、 メチル基、 エチル基、 プロピル基、 门 _ブチル基、 イソプロピル 基、 イソプチル基、 3 _ブチル基、 1 _ブチル基、 イソペンチル基等の直鎖 又は分岐鎖状のアルキル基が挙げられる。 Examples thereof include straight-chain or branched-chain alkyl groups such as a methyl group, an ethyl group, a propyl group, a _butyl group, an isopropyl group, an isoptyl group, a 3_butyl group, a 1_butyl group, and an isopentyl group.
〇が表すシクロアルキル基としては、 炭素数 3〜 1 5のシクロアルキル 基が挙げられ、 例えば、 シクロブチル基、 シクロペンチル基、 シクロへキシ ル基等が挙げられる。 Examples of the cycloalkyl group represented by ◯ include a cycloalkyl group having 3 to 15 carbon atoms, and examples thereof include a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
〇が表すアルケニル基としては、 炭素数 2〜 1 〇のアルケニル基が挙げ られ、 例えば、 ビニル基、 アリル基、 イソプロべニル基等の直鎖又は分岐鎖 状のアルケニル基が挙げられる。 Examples of the alkenyl group represented by ◯ include an alkenyl group having 2 to 10 carbon atoms, and examples thereof include a linear or branched alkenyl group such as a vinyl group, an allyl group and an isopropenyl group.
〇が表すアリール基としては、 炭素数 6〜 1 5のアリール基が挙げられ 、 例えば、 フエニル基、 トリル基、 ナフチル基等が挙げられる。 Examples of the aryl group represented by ◯ include aryl groups having 6 to 15 carbon atoms, and examples thereof include a phenyl group, a tolyl group, and a naphthyl group.
〇が表すアラルキル基としては、 炭素数 7〜 2 0のアラルキル基が挙げ られ、 例えば、 ベンジル基、 フエネチル基等が挙げられる。 The aralkyl group represented by ◯ includes an aralkyl group having 7 to 20 carbon atoms, and examples thereof include a benzyl group and a phenethyl group.
[0083] 上述の置換アルキル基、 置換シクロアルキル基、 置換アルケニル基、 置換 アリール基、 置換アラルキル基としては、 上述のアルキル基、 シクロアルキ ル基、 アルケニル基、 アリール基、 アラルキル基のそれぞれにおける水素原 子又は主鎖骨格の一部若しくは全部が、 エーテル基、 エステル基、 カルボニ ル基、 ハロゲン原子 (フッ素原子等) 、 アクリル基、 メタクリル基、 メルカ プト基、 及びヒドロキシ基 (水酸基) からなる群より選択された少なくとも 1種で置換された基等が挙げられる。 [0083] The above-mentioned substituted alkyl group, substituted cycloalkyl group, substituted alkenyl group, substituted aryl group, and substituted aralkyl group include hydrogen atoms in each of the above-mentioned alkyl group, cycloalkyl group, alkenyl group, aryl group, and aralkyl group. Part or all of the child or main chain skeleton is from the group consisting of ether group, ester group, carbonyl group, halogen atom (fluorine atom, etc.), acryl group, methacryl group, mercapto group, and hydroxy group (hydroxyl group) Examples include groups substituted with at least one selected.
[0084] 〇は、 置換又は無置換のアルキル基が好ましく、 無置換の炭素数 1〜 1 [0084] ◯ is preferably a substituted or unsubstituted alkyl group and has an unsubstituted carbon number of 1 to 1
0のアルキル基であることがより好ましい。 〇 2020/175337 27 卩(:171? 2020 /006912 More preferably, it is an alkyl group of 0. 〇 2020/175 337 27 卩 (:171? 2020 /006912
[0085] 一般式 (1) 中に複数の 〇がある場合、 複数の 〇は互いに結合を形成 していてもよい。 2つ又は 3つの 〇が互いに結合を形成していることが好 ましく、 2つの 〇が互いに結合を形成していることがより好ましい。 [0085] When there are a plurality of O in general formula (1), the plurality of O may form a bond with each other. It is preferable that two or three O's form a bond with each other, and it is more preferable that two O's form a bond with each other.
[0086] 2つの 〇が互いに結合して形成される基
Figure imgf000028_0001
としては、 上述の が表す置換又は無置換のアルキル基が結合して形成されるアルキレン基であ ることが好ましい。
[0086] A group formed by bonding two ◯ to each other
Figure imgf000028_0001
Is preferably an alkylene group formed by combining the substituted or unsubstituted alkyl groups represented by the above.
[0087]
Figure imgf000028_0002
例えば、 メチレン基、 エチレン基、 プ ロピレン基、 イソプロピレン基、
Figure imgf000028_0003
-プチレン基、 イソプチレン基、 3 -ブ チレン基、 ーブチレン基、 n -ペンチレン基、 イソペンチレン基、 3 -ぺ ンチレン基、 ーペンチレン基、 11—ヘキシレン基、 イソヘキシレン基、 3 —ヘキシレン基、 ーヘキシレン基、 —ヘプチレン基、 イソヘプチレン基 、 £—ヘプチレン基、 ーヘプチレン基、 —オクチレン基、 イソオクチレ ン基、 3 _オクチレン基、 I _オクチレン基等の直鎖又は分岐鎖状のアルキ レン基が挙げられる。
[0087]
Figure imgf000028_0002
For example, methylene group, ethylene group, propylene group, isopropylene group,
Figure imgf000028_0003
-Putylene group, isoptylene group, 3-butylene group, -butylene group, n-pentylene group, isopentylene group, 3-pentylene group, -pentylene group, 11-hexylene group, isohexylene group, 3-hexylene group, -hexylene group,- Examples thereof include linear or branched alkylene groups such as heptylene group, isoheptylene group, £-heptylene group, -heptylene group, -octylene group, isooctylene group, 3_octylene group, I_octylene group.
[0088]
Figure imgf000028_0004
無置換の炭素数 2〜 2 0のアルキレン 基が好ましく、 より好ましくは無置換の炭素数 2〜 2 0のアルキレン基、 さ らに好ましくは無置換の炭素数 2〜 8のアルキレン基であり、 特に好ましく は!··!—プチレン基、
Figure imgf000028_0005
ペンチレン基、
Figure imgf000028_0006
ヘキシレン基、 1-1—ヘプチレン 基、 1-1—オクチレン基である。
[0088]
Figure imgf000028_0004
An unsubstituted alkylene group having 2 to 20 carbon atoms is preferable, more preferably an unsubstituted alkylene group having 2 to 20 carbon atoms, and further preferably an unsubstituted alkylene group having 2 to 8 carbon atoms, Especially preferably! ...!—Putylene group,
Figure imgf000028_0005
Pentylene group,
Figure imgf000028_0006
Hexylene group, 1-1-heptylene group, 1-1-octylene group.
[0089] 3つの 〇が互いに結合して形成される基 ([¾〇3) としては、 上述の[0089] The group ([¾ 〇 3 ) formed by bonding three ◯ to each other is as described above.
2が表すアルキレン基において、 アルキレン基中の任意の水素原子をひとつ減 らした 3価の基であることが好ましい。 The alkylene group represented by 2 is preferably a trivalent group in which any hydrogen atom in the alkylene group is reduced by one.
[0090] なお、 一般式 (1)
Figure imgf000028_0007
は、 ポリオルガノシルセスキオキサンの原料 として使用する加水分解性シラン化合物におけるケイ素原子に結合した基 ( アルコキシ基及びハロゲン原子以外の基;例えば、 後述の式 (〇 1) 〜 (〇 3) で表される加水分解性シラン化合物における
Figure imgf000028_0008
3等) に由来す る。
[0090] Note that the general formula (1)
Figure imgf000028_0007
Is a group bonded to a silicon atom in a hydrolyzable silane compound used as a raw material of polyorganosilsesquioxane (a group other than an alkoxy group and a halogen atom; In the hydrolyzable silane compound represented
Figure imgf000028_0008
3 etc.).
[0091 ] —般式 (1) 中、 は 0超であり、 「は 0以上である。 〇 2020/175337 28 卩(:171? 2020 /006912 [0091] — In the general formula (1), is greater than 0 and “is greater than or equal to 0. 〇 2020/175 337 28 卩 (:171? 2020 /006912
( + 「) は〇. 5~ 1. 0であることが好ましい。 ポリオルガノシ ルセスキオキサン (3 1) に含まれる 匕又は 〇で表される基全量に対し て、
Figure imgf000029_0001
有機架橋基が作るネッ トワ —クが十分に形成されるため、 硬度、 繰り返し折り曲げ耐性の各性能を良好 に保つことができる。
(+ “) is preferably from 0.5 to 1.0. With respect to the total amount of the group represented by the swallow or ◯ contained in the polyorganosilsesquioxane (3 1),
Figure imgf000029_0001
Since the network formed by the organic cross-linking group is sufficiently formed, it is possible to maintain good hardness and repeated bending resistance.
4 + 0 は〇. 7~ 1. 0であることがより好ましく、 〇. 9〜 1 . 0がさらに好ましく、 〇. 95~ 1. 0であることが特に好ましい。 4 + 0 is more preferably 0.7 to 1.0, further preferably 0.9 to 1.0, and particularly preferably 0.95 to 1.0.
[0092] 一般式 (1) 中、 複数の
Figure imgf000029_0003
複数の
Figure imgf000029_0002
が互いに結合を形成して いることも好ましい。 この場合、 「/ 4 + 0 が〇. 005〜〇. 20で あることが好ましい。
[0092] In general formula (1), a plurality of
Figure imgf000029_0003
plural
Figure imgf000029_0002
It is also preferable that the groups form a bond with each other. In this case, “/4+0” is preferably 0.005 to 0.20.
4 + 0 は〇. 005〜〇. 1 0がより好ましく、 〇. 005〜〇 . 05がさらに好ましく、 〇. 005〜〇. 025であることが特に好まし い。 4+0 is more preferably 0.005 to 0.01, more preferably 0.005 to 0.05, and particularly preferably 0.005 to 0.025.
[0093] ポリオルガノシルセスキオキサン (3 1) のゲル浸透クロマトグラフィー (0 ?〇 による標準ポリスチレン換算の数平均分子量 (Mn) は、 好まし くは 500〜 6000であり、 より好ましくは 1 000〜 4500であり、 更に好ましくは 1 500〜 3000である。 [0093] Gel permeation chromatography of polyorganosilsesquioxane (3 1) (standard polystyrene equivalent number average molecular weight (Mn) by 0 to 〇 is preferably 500 to 6000, more preferably 1 000. It is -4500, more preferably 1500-3000.
[0094] ポリオルガノシルセスキオキサン (3 1) の◦ 〇による標準ポリスチレ ン換算の分子量分散度 (Mw/Mn) は、 例えば 1. 〇〜 4. 0であり、 好 ましくは 1. 1〜 3. 7であり、 より好ましくは 1. 2〜 3. 0であり、 さ らに好ましくは 1. 3~2. 5である。 IV! は重量平均分子量を表し、 IV! n は数平均分子量を表す。 [0094] The molecular weight dispersity (Mw/Mn) of polyorganosilsesquioxane (3 1) in terms of standard polystyrene by ◯○ is, for example, 1.0 to 4.0, preferably 1.1. To 3.7, more preferably 1.2 to 3.0, and further preferably 1.3 to 2.5. IV! represents the weight average molecular weight, and IV! n represents the number average molecular weight.
[0095] ポリオルガノシルセスキオキサン (3 1) の重量平均分子量、 分子量分散 度は、 下記の装置及び条件により測定する。 [0095] The weight average molecular weight and molecular weight dispersity of the polyorganosilsesquioxane (31) are measured by the following apparatus and conditions.
測定装置:商品名 「 !_(3 - 20八 0」 ( (株) 島津製作所製) カラム: 3 〇 6父 [< 一801 X2本、 [< 一802、 及び< ー 803 (昭和電工 (株) 製) Measuring device: Product name "!_ (3-20 8 0" (manufactured by Shimadzu Corporation) Column: 3 0 6 fathers [< 801 x 2 pcs, [< 1802, and <- 803 (Showa Denko KK ) Made)
測定温度: 40°0 〇 2020/175337 29 卩(:171? 2020 /006912 Measuring temperature: 40 ° 0 〇 2020/175 337 29 卩 (:171? 2020 /006912
溶離液:テトラヒドロフラン (丁 1~1 ) 、 試料濃度〇. 1〜〇. 2質量% 流量: 1 01 1_ /分 Eluent: Tetrahydrofuran (1 to 1), sample concentration: 0,1 to 0,2 mass% Flow rate: 101 1_/min
検出器: 11 _ 丨 3検出器 (商品名 「3 0 _ 2 0八」 、 (株) 島津製 作所製) Detector: 11 _ 丨 3 detectors (brand name "30 _ 20 8", manufactured by Shimadzu Corporation)
分子量:標準ポリスチレン換算 Molecular weight: Standard polystyrene equivalent
[0096] <ポリオルガノシルセスキオキサン (3 1) の製造方法> <Method for producing polyorganosilsesquioxane (31)>
ポリオルガノシルセスキオキサン (3 1) は、 公知の製造方法により製造 することができ、 特に限定されないが、 1種又は 2種以上の加水分解性シラ ン化合物を加水分解及び縮合させる方法により製造できる。 上記加水分解性 シラン化合物としては、 エポキシ基を含有するシロキサン構成単位を形成す るための加水分解性三官能シラン化合物 (下記式 (巳) で表される化合物) を加水分解性シラン化合物として使用することが好ましい。 The polyorganosilsesquioxane (31) can be produced by a known production method, and is not particularly limited, but it is produced by a method of hydrolyzing and condensing one or more hydrolyzable silan compounds. it can. As the hydrolyzable silane compound, a hydrolyzable trifunctional silane compound (a compound represented by the following formula (M)) for forming a siloxane constitutional unit containing an epoxy group is used as the hydrolyzable silane compound. Preferably.
—般式 ( 1) 中の「が 0超である場合には、 加水分解性シラン化合物とし て、 下記式 (<3 1) 、 (0 2) 又は (0 3) で表される化合物を併用するこ とが好ましい。 — When “in general formula (1) is greater than 0, a compound represented by the following formula (<3 1), (0 2) or (0 3) is used in combination as the hydrolyzable silane compound. This is preferable.
[0097] [化 8] 勵一 23 (6) [0097] [Chemical 8] Kouichi 2 ) 3 (6)
[0098] 式 (巳) 中の は、 上記一般式 (1) 中の 匕と同義であり、 好ましい 例も同様である。 In the formula (M), has the same meaning as that in the above general formula (1), and the preferred examples are also the same.
[0099] 式 (巳) 中の X 2は、 アルコキシ基又はハロゲン原子を示す。 [0099] X 2 in the formula (Mi) represents an alkoxy group or a halogen atom.
X 2におけるアルコキシ基としては、 例えば、 メ トキシ基、 エトキシ基、 プ ロポキシ基、 イソプロピルオキシ基、 ブトキシ基、 イソプチルオキシ基等の 炭素数 1〜 4のアルコキシ基等が挙げられる。 Examples of the alkoxy group for X 2 include an alkoxy group having 1 to 4 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, an isopropyloxy group, a butoxy group and an isoptyloxy group.
X 2におけるハロゲン原子としては、 例えば、 フッ素原子、 塩素原子、 臭素 原子、 ヨウ素原子等が挙げられる。 Examples of the halogen atom for X 2 include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
X 2としては、 アルコキシ基が好ましく、 メ トキシ基、 エトキシ基がより好 ましい。 なお、 3つの X 2は、 それぞれ同一であっても、 異なっていてもよい 〇 2020/175337 30 卩(:171? 2020 /006912 As X 2 , an alkoxy group is preferable, and a methoxy group and an ethoxy group are more preferable. The three X 2 may be the same or different. 〇 2020/175 337 30 卩 (:171? 2020 /006912
[0100] 上記式 (巳) で表される化合物は、 匕を有するシロキサン構成単位を形 成する化合物である。 [0100] The compound represented by the above formula (M) is a compound forming a siloxane constitutional unit having a gap.
[0101] [化 9]
Figure imgf000031_0001
[0101] [Chemical 9]
Figure imgf000031_0001
[0102] [化 10]
Figure imgf000031_0002
[0102] [Chemical 10]
Figure imgf000031_0002
[0103] [化 11]
Figure imgf000031_0003
[0103] [Chemical 11]
Figure imgf000031_0003
[0104] 式
Figure imgf000031_0005
上記一般式 (1)
Figure imgf000031_0004
と同義であり、 好まし い例も同様である。
[0104] Expression
Figure imgf000031_0005
The above general formula (1)
Figure imgf000031_0004
Is synonymous with, and so is the preferred example.
Figure imgf000031_0006
上記一般式 (1) 中の 2つの 〇が互いに結合す ることにより形成される基
Figure imgf000031_0007
と同義であり、 好ましい例も同様である 式
Figure imgf000031_0008
上記一般式 (1) 中の 3つの 〇が互いに結合す ることにより形成される基 (?¾〇3) と同義であり、 好ましい例も同様である
formula
Figure imgf000031_0006
A group formed by bonding two ◯ in the above general formula (1) to each other.
Figure imgf000031_0007
With the same meaning as in the preferred example
Figure imgf000031_0008
It has the same meaning as the group (?¾ 〇 3 ) formed by bonding three ◯ in the general formula (1) to each other, and the preferred examples are also the same.
[0105] 上記式 (〇 1) 〜 (〇3) 中の X3は、 上記式 (巳) 中の X2と同義であり 、 好ましい例も同様である。 複数の X3は、 それぞれ同一であっても、 異なっ ていてもよい。 [0105] X 3 in the above formulas (○ 1) to (〇 3) has the same meaning as X 2 in the above formula (M), and the preferred examples are also the same. A plurality of X 3's may be the same or different.
[0106] 上記加水分解性シラン化合物としては、 上記式 (巳) 、 (<31) 〜 (〇3 ) で表される化合物以外の加水分解性シラン化合物を併用してもよい。 例え ば、 上記式 (巳) 、 (<31) 〜 (03) で表される化合物以外の加水分解性 〇 2020/175337 31 卩(:171? 2020 /006912 As the hydrolyzable silane compound, a hydrolyzable silane compound other than the compounds represented by the formulas (M) and (<31) to (03) may be used in combination. For example, hydrolyzability other than the compounds represented by the above formulas (M) and (<31) to (03) 〇 2020/175 337 31 卩(:171? 2020/006912
三官能シラン化合物、 加水分解性単官能シラン化合物、 加水分解性二官能シ ラン化合物等が挙げられる。 Examples thereof include trifunctional silane compounds, hydrolyzable monofunctional silane compounds, and hydrolyzable bifunctional silane compounds.
[0107] が上記式 (<3 1) 〜 (0 3) で表される加水分解性シラン化合物にお
Figure imgf000032_0001
一般式 (1) 中の / ( + 〇 を調整 するには、 上記式 (巳) 、 (<3 1) 〜 (0 3) で表される化合物の配合比 ( モル比) を調整すれはよい。
[0107] is a hydrolyzable silane compound represented by the above formulas (<31) to (03).
Figure imgf000032_0001
In order to adjust / (+ 〇) in the general formula (1), it suffices to adjust the compounding ratio (molar ratio) of the compounds represented by the above formulas (M) and (<3 1) to (0 3). ..
具体的には、 例えば、
Figure imgf000032_0002
+ 〇 を〇. 5〜 1 . 0とするには、 下記 ( 2) で表される値を〇. 5〜 1 . 0とし、 これらの化合物を加水分解及 び縮合させる方法により製造すればよい。
Specifically, for example,
Figure imgf000032_0002
In order to adjust + to 0.5 to 1.0, the value represented by the following (2) should be 0.5 to 1.0, and these compounds should be produced by hydrolysis and condensation. ..
( 2) =式 (巳) で表される化合物 (モル量) / {式 (巳) で表される 化合物 (モル量) 十式 (<3 1) で表される化合物 (モル量) 十式 (0 2) で 表される化合物 (モル量) 2十式 (0 3) で表される化合物 (モル量) X 3 } (2) = compound represented by formula (Mi) (molar amount) / {compound represented by formula (Mi) (molar amount) 10 formula (<3 1) compound represented by (molar amount) 10 formula Compound represented by (0 2) (molar amount) 20 Compound represented by formula (0 3) (molar amount) X 3}
[0108] 上記加水分解性シラン化合物の使用量及び組成は、 所望するポリオルガノ シルセスキオキサン (3 1) の構造に応じて適宜調整できる。 [0108] The amount and composition of the above hydrolyzable silane compound can be appropriately adjusted according to the desired structure of the polyorganosilsesquioxane (31).
[0109] また、 上記加水分解性シラン化合物の加水分解及び縮合反応は、 同時に行 うことも、 逐次行うこともできる。 上記反応を逐次行う場合、 反応を行う順 序は特に限定されない。 [0109] Further, the hydrolysis and condensation reaction of the hydrolyzable silane compound can be performed simultaneously or sequentially. When the above reactions are sequentially performed, the order of performing the reactions is not particularly limited.
[01 10] 上記加水分解性シラン化合物の加水分解及び縮合反応は、 溶媒の存在下で 行うことも、 非存在下で行うこともでき、 溶媒の存在下で行うことが好まし い。 [0110] The hydrolysis and condensation reaction of the hydrolyzable silane compound can be carried out in the presence or absence of a solvent, and is preferably carried out in the presence of a solvent.
上記溶媒としては、 例えば、 ベンゼン、 トルエン、 キシレン、 エチルベン ゼン等の芳香族炭化水素;ジエチルエーテル、 ジメ トキシエタン、 テトラヒ ドロフラン、 ジオキサン等のエーテル; アセトン、 メチルエチルケトン、 メ チルイソプチルケトン等のケトン;酢酸メチル、 酢酸エチル、 酢酸イソプロ ピル、 酢酸プチル等のエステル; 1\1 , 1\1 -ジメチルホルムアミ ド、 1\1 , 1\1 - ジメチルアセトアミ ド等のアミ ド; アセトニトリル、 プロピオニトリル、 ベ ンゾニトリル等の二トリル; メタノール、 エタノール、 イソプロピルアルコ 〇 2020/175337 32 卩(:171? 2020 /006912 Examples of the solvent include aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene; ethers such as diethyl ether, dimethoxyethane, tetrahydrofuran and dioxane; ketones such as acetone, methyl ethyl ketone and methyl isoptyl ketone; acetic acid. Esters such as methyl, ethyl acetate, isopropyl acetate, and butyl acetate; 1\1, 1\1-dimethylformamide, 1\1, 1\1-amide such as dimethylacetamide; acetonitrile, propionitrile , Nitrile such as benzonitrile; methanol, ethanol, isopropyl alcohol 〇 2020/175 337 32 卩 (: 171? 2020 /006912
—ル、 ブタノール等のアルコール等が挙けられる。 -Alcohol such as le and butanol is given.
上記溶媒としては、 ケトン又はエーテルが好ましい。 なお、 溶媒は 1種を 単独で使用することも、 2種以上を組み合わせて使用することもできる。 The solvent is preferably ketone or ether. The solvent may be used alone or in combination of two or more.
[01 1 1 ] 溶媒の使用量は、 特に限定されず、 加水分解性シラン化合物の全量 1 〇〇 質量部に対して、 〇〜 2 0 0 0質量部の範囲内で、 所望の反応時間等に応じ て、 適宜調整することができる。 [0111] The amount of the solvent used is not particularly limited, and within a range of 0 to 200 parts by mass with respect to the total amount of the hydrolyzable silane compound of 100 parts by mass, a desired reaction time, etc. It can be adjusted accordingly.
[01 12] 上記加水分解性シラン化合物の加水分解及び縮合反応は、 触媒及び水の存 在下で進行させることが好ましい。 上記触媒は、 酸触媒であってもアルカリ 触媒であってもよい。 [0112] The hydrolysis and condensation reactions of the hydrolyzable silane compound are preferably allowed to proceed in the presence of a catalyst and water. The catalyst may be an acid catalyst or an alkali catalyst.
上記酸触媒としては、 例えば、 塩酸、 硫酸、 硝酸、 リン酸、 ホウ酸等の鉱 酸; リン酸エステル;酢酸、 犠酸、 トリフルオロ酢酸等のカルボン酸; メタ ンスルホン酸、 トリフルオロメタンスルホン酸、
Figure imgf000033_0001
トルエンスルホン酸等 のスルホン酸;活性白土等の固体酸;塩化鉄等のルイス酸等が挙げられる。 上記アルカリ触媒としては、 例えば、 水酸化リチウム、 水酸化ナトリウム 、 水酸化カリウム、 水酸化セシウム等のアルカリ金属の水酸化物;水酸化マ グネシウム、 水酸化カルシウム、 水酸化バリウム等のアルカリ土類金属の水 酸化物;炭酸リチウム、 炭酸ナトリウム、 炭酸カリウム、 炭酸セシウム等の アルカリ金属の炭酸塩;炭酸マグネシウム等のアルカリ土類金属の炭酸塩; 炭酸水素リチウム、 炭酸水素ナトリウム、 炭酸水素カリウム、 炭酸水素セシ ウム等のアルカリ金属の炭酸水素塩;酢酸リチウム、 酢酸ナトリウム、 酢酸 カリウム、 酢酸セシウム等のアルカリ金属の有機酸塩 (例えば、 酢酸塩) ; 酢酸マグネシウム等のアルカリ土類金属の有機酸塩 (例えば、 酢酸塩) ; リ チウムメ トキシド、 ナトリウムメ トキシド、 ナトリウムエトキシド、 ナトリ ウムイソプロポキシド、 カリウムエトキシド、 カリウム 1: _ブトキシド等の アルカリ金属のアルコキシド;ナトリウムフエノキシド等のアルカリ金属の フエノキシド; トリエチルアミン、 1\1—メチルピぺリジン、 1 , 8—ジアザ ビシクロ [ 5 . 4 . 0 ] ウンデカー 7 -エン、 1 , 5 -ジアザビシクロ [ 4 . 3 . 0 ] ノナー 5 -エン等のアミン類 (第 3級アミン等) ; ピリジン、 2 〇 2020/175337 33 卩(:171? 2020 /006912
Examples of the above-mentioned acid catalyst include mineral acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid and boric acid; phosphoric acid esters; carboxylic acids such as acetic acid, sacrificial acid and trifluoroacetic acid; methansulfonic acid, trifluoromethanesulfonic acid,
Figure imgf000033_0001
Examples thereof include sulfonic acids such as toluenesulfonic acid; solid acids such as activated clay; Lewis acids such as iron chloride. Examples of the alkali catalyst include hydroxides of alkali metals such as lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide; alkaline earth metals such as magnesium hydroxide, calcium hydroxide and barium hydroxide. Hydroxides; lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate and other alkali metal carbonates; magnesium carbonate and other alkaline earth metal carbonates; lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, hydrogen carbonate Alkali metal hydrogen carbonate such as cesium; Organic acid salt of alkali metal such as lithium acetate, sodium acetate, potassium acetate, cesium acetate (eg acetate); Organic acid salt of alkaline earth metal such as magnesium acetate ( For example, acetate); Lithium methoxide, sodium methoxide, sodium ethoxide, sodium isopropoxide, potassium ethoxide, potassium 1: alkoxides of alkali metals such as butoxide; alkali metal phenoxides such as sodium phenoxide Amines such as triethylamine, 1\1-methylpiperidine, 1,8-diazabicyclo [5.4.0] undeca 7-ene, 1,5-diazabicyclo [4.3.0] noner 5-ene ( Tertiary amines, etc.); Pyridine, 2 〇 2020/175 337 33 卩 (:171? 2020 /006912
, 2’ービビリジル、 1 , 1 0—フエナントロリン等の含窒素芳香族複素環化 合物等が挙げられる。 Examples thereof include nitrogen-containing aromatic heterocyclic compounds such as 2,2′-bibilidyl and 1,10-phenanthroline.
なお、 触媒は 1種を単独で使用することもできるし、 2種以上を組み合わ せて使用することもできる。 また、 触媒は、 水又は有機溶剤等に溶解又は分 散させた状態で使用することもできる。 The catalyst may be used alone or in combination of two or more. The catalyst can also be used in a state of being dissolved or dispersed in water, an organic solvent or the like.
上記触媒は塩基触媒であることが好ましい。 塩基触媒を用いることでポリ オルガノシルセスキオキサンの縮合率を高くすることができ、 硬化した際の 変形回復率を良好に保つことができる。 The catalyst is preferably a base catalyst. By using a base catalyst, the condensation rate of polyorganosilsesquioxane can be increased, and the deformation recovery rate upon curing can be kept good.
[01 13] 上記触媒の使用量は、 特に限定されず、 加水分解性シラン化合物の全量 1 モルに対して、 〇. 0 0 2〜〇. 2 0 0モルの範囲内で、 適宜調整すること ができる。 [0113] The amount of the catalyst used is not particularly limited, and may be appropriately adjusted within the range of 0.002 to 0.200 mol based on 1 mol of the total amount of the hydrolyzable silane compound. You can
[01 14] 上記加水分解及び縮合反応に際しての水の使用量は、 特に限定されず、 加 水分解性シラン化合物の全量 1モルに対して、 〇. 5〜 2 0モルの範囲内で 、 適宜調整することができる。 [0114] The amount of water used in the hydrolysis and condensation reaction is not particularly limited, and may be appropriately in the range of 0.5 to 20 mol with respect to 1 mol of the total amount of the hydrolyzable silane compound. Can be adjusted.
[01 15] 上記水の添加方法は、 特に限定されず、 使用する水の全量 (全使用量) を 一括で添加しても、 逐次的に添加してもよい。 逐次的に添加する際には、 連 続的に添加しても、 間欠的に添加してもよい。 [0115] The method for adding the water is not particularly limited, and the total amount of water used (total amount used) may be added all at once or sequentially. When they are added sequentially, they may be added continuously or intermittently.
[01 16] 上記加水分解性シラン化合物の加水分解及び縮合反応を行う際の反応条件 としては、 特に、 ポリオルガノシルセスキオキサン (3 1) の縮合率が 8 0 %以上となるような反応条件を選択することが重要である。 上記加水分解及 び縮合反応の反応温度は、 例えば 4 0〜 1 0 0 °〇であり、 好ましくは 4 5〜 8 0 °〇である。 反応温度を上記範囲に制御することにより、 上記縮合率を 8 0 %以上に制御できる傾向がある。 また、 上記加水分解及び縮合反応の反応 時間は、 例えば〇. 1〜 1 0時間であり、 好ましくは 1 . 5〜 8時間である 。 また、 上記加水分解及び縮合反応は、 常圧下で行うこともできるし、 加圧 下又は減圧下で行うこともできる。 なお、 上記加水分解及び縮合反応を行う 際の雰囲気は、 例えば、 窒素雰囲気、 アルゴン雰囲気等の不活性ガス雰囲気 下、 空気下等の酸素存在下等のいずれであってもよいが、 不活性ガス雰囲気 下が好ましい。 [0116] The reaction conditions for carrying out the hydrolysis and condensation reaction of the above-mentioned hydrolyzable silane compound are, in particular, a reaction such that the condensation rate of the polyorganosilsesquioxane (31) is 80% or more. It is important to choose the conditions. The reaction temperature of the hydrolysis and condensation reaction is, for example, 40 to 100 ° , preferably 45 to 80 ° . By controlling the reaction temperature within the above range, the condensation rate tends to be controlled to 80% or more. The reaction time of the hydrolysis and condensation reactions is, for example, 0.1 to 10 hours, preferably 1.5 to 8 hours. The above hydrolysis and condensation reaction can be carried out under normal pressure, or under pressure or under reduced pressure. The atmosphere during the hydrolysis and condensation reaction may be, for example, an atmosphere of an inert gas such as a nitrogen atmosphere or an argon atmosphere, or the presence of oxygen such as an air. atmosphere Lower is preferred.
[0117] 上記加水分解性シラン化合物の加水分解及び縮合反応により、 ポリオルガ ノシルセスキオキサン (a 1) が得られる。 上記加水分解及び縮合反応の終 了後には、 エポキシ基の開環を抑制するために触媒を中和することが好まし い。 また、 ポリオルガノシルセスキオキサン (a 1) を、 例えば、 水洗、 酸 洗浄、 アルカリ洗浄、 濾過、 濃縮、 蒸留、 抽出、 晶析、 再結晶、 カラムクロ マトグラフィー等の分離手段や、 これらを組み合わせた分離手段等により分 離精製してもよい。 [0117] The polyorganosilsesquioxane (a 1) is obtained by the hydrolysis and condensation reaction of the hydrolyzable silane compound. After completion of the hydrolysis and condensation reactions, it is preferable to neutralize the catalyst in order to suppress ring opening of the epoxy group. In addition, polyorganosilsesquioxane (a 1) can be separated by, for example, washing with water, washing with acid, washing with alkali, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, or a combination thereof. It may be separated and purified by a separation means or the like.
[0118] ハードコート層において、 ポリオルガノシルセスキオキサン (a 1) の縮 合率としては、 80%以上であることがフィルムの硬度の観点から好ましい 。 縮合率は、 90 %以上がより好ましく、 95 %以上であることがさらに好 ましい。 [0118] In the hard coat layer, the polyorganosilsesquioxane (a 1) condensation rate is preferably 80% or more from the viewpoint of film hardness. The condensation rate is more preferably 90% or more, further preferably 95% or more.
上記縮合率は、 ポリオルガノシルセスキオキサン (a 1) の硬化物を含む ハードコート層を有する試料について29 S i NMR (n u c l e a r m a g n e t i c r e s o n a n c e) スぺクトル測定を行い、 その測定結 果を用いて算出することが可能である。 The condensation rate is calculated using 29 Si NMR (nuclear magnetic resonance) spectrum measurement on a sample having a hard coat layer containing a cured product of polyorganosilsesquioxane (a 1) and using the measurement result. It is possible to
[0119] エポキシ基を有するポリオルガノシルセスキオキサン (a 1) の硬化物は 、 エポキシ基が重合反応により開環していることが好ましい。 [0119] In the cured product of the polyorganosilsesquioxane (a1) having an epoxy group, the epoxy group is preferably ring-opened by a polymerization reaction.
ハードコート層において、 エポキシ基を有するポリオルガノシルセスキオ キサン (a 1) の硬化物のエポキシ基の開環率としては、 40%以上である ことがフィルムの硬度の観点から好ましい。 開環率は、 50 %以上がより好 ましく、 60 %以上であることがさらに好ましい。 In the hard coat layer, the epoxy group ring-opening rate of the cured product of the polyorganosilsesquioxane (a 1) having an epoxy group is preferably 40% or more from the viewpoint of the hardness of the film. The ring opening rate is more preferably 50% or more, further preferably 60% or more.
上記開環率は、 ポリオルガノシルセスキオキサン (a 1) を含むハードコ -卜層形成用組成物を完全硬化及び熱処理する前後の試料について F T- I R (F o u r i e r I r a n s r o r m I n f r a r e d S p e c t r o s c o p y) —回反射 A T R (A t t e n u a t e d T o t a l R e f I e c t i o n) 測定を行い、 エポキシ基に由来するピーク高さの変化 から、 算出することが可能である。 〇 2020/175337 35 卩(:171? 2020 /006912 The ring-opening rate is F T-IR (Fourier I ransrorm Infrared Spectroscopy) of the sample before and after the complete curing and heat treatment of the composition for forming a hard core layer containing polyorganosilsesquioxane (a 1). — It is possible to calculate from the change in peak height derived from the epoxy group by measuring the ATR (Attenuated Total Reef Iection). 〇 2020/175 337 35 卩 (:171? 2020 /006912
[0120] ポリオルガノシルセスキオキサン (3 1) は一種のみ用いてもよく、 構造 の異なる二種以上を併用してもよい。 [0120] The polyorganosilsesquioxane (31) may be used alone or in combination of two or more having different structures.
[0121 ] ハードコート層形成用組成物におけるポリオルガノシルセスキオキサン ( [0121] Polyorganosilsesquioxane (in the composition for forming a hard coat layer)
3 1) の含有率は、 ハードコート層形成用組成物の全固形分に対して、 5 0 質量%以上であることが好ましく、 7 0質量%以上であることがより好まし く、 8 0質量%以上であることが更に好ましい。 ハードコート層形成用組成 物におけるポリオルガノシルセスキオキサン (8 1) の含有率の上限は、 ハ —ドコート層形成用組成物の全固形分に対して、 9 9 . 9質量%以下である ことが好ましく、 9 8質量%以下であることがより好ましく、 9 7質量%以 下であることが更に好ましい。 The content of 3 1) is preferably 50% by mass or more, and more preferably 70% by mass or more, based on the total solid content of the composition for forming a hard coat layer. More preferably, it is at least mass %. The upper limit of the content of polyorganosilsesquioxane (81) in the hard coat layer-forming composition is 99.9% by mass or less based on the total solid content of the hard coat layer-forming composition. The amount is preferably 98% by mass or less, more preferably 97% by mass or less.
なお、 全固形分とは溶剤以外の全成分のことである。 The total solid content refers to all components other than the solvent.
[0122] (フッ素原子を含有する基と、 カチオン重合性基と、 ラジカル重合性基とを 有するポリマ _ (3) ) [0122] (Polymer Having Fluorine Atom-Containing Group, Cationically Polymerizable Group, and Radical Polymerizable Group _ (3))
フッ素原子を含有する基と、 カチオン重合性基と、 ラジカル重合性基とを 有するポリマー (3) ( 「ポリマー (3) 」 ともいう。 ) について説明する 前述のとおり、 ポリマー (3) は、 ハードコート層と耐擦傷層との密着性 を高くする層間密着剤として機能することができる。 As described above for the polymer (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group (also referred to as “polymer (3) ”), the polymer (3) is a hard resin. It can function as an interlayer adhesive that enhances the adhesion between the coat layer and the scratch resistant layer.
[0123] 〔フッ素原子を含有する基〕 [0123] [Group containing a fluorine atom]
ポリマー (3) におけるフッ素原子を含有する基 ( 「フッ素含有基」 とも 呼ぶ。 ) とは、 少なくとも 1つのフッ素原子を含んでなる基であり、 例えば 、 フッ素原子、 少なくとも 1つのフッ素原子を有する有機基などが挙げられ る。 上記有機基としては、 アルキル基、 シクロアルキル基、 アルケニル基、 シクロアルケニル基、 アルキニル基、 シクロアルキニル基、 アリール基、 及 びこれらの少なくとも 2つを組み合わせてなる基が挙げられ、 アルキル基で あることが好ましい。 また、 上記アルキル基、 シクロアルキル基、 アルケニ ル基、 シクロアルケニル基、 アルキニル基、 シクロアルキニル基、 アリール 基は、 フッ素原子以外に更に置換基を有していてもよい。 〇 2020/175337 36 卩(:171? 2020 /006912 The group containing a fluorine atom in the polymer (3) (also referred to as a “fluorine-containing group”) is a group containing at least one fluorine atom, and includes, for example, a fluorine atom and an organic group having at least one fluorine atom. Examples include groups. Examples of the organic group include an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an alkynyl group, a cycloalkynyl group, an aryl group, and a group formed by combining at least two of these, and an alkyl group is preferable. preferable. The alkyl group, cycloalkyl group, alkenyl group, cycloalkenyl group, alkynyl group, cycloalkynyl group and aryl group may further have a substituent in addition to the fluorine atom. 〇 2020/175 337 36 卩 (:171? 2020 /006912
フッ素含有基は、 炭素数 1〜 2 0のフルオロアルキル基であることが好ま しく、 炭素数 2〜 1 5のフルオロアルキル基であることがより好ましく、 炭 素数 4〜 1 〇のフルオロアルキル基であることが更に好ましく、 炭素数 4〜 8のフルオロアルキル基であることが特に好ましい。 The fluorine-containing group is preferably a fluoroalkyl group having 1 to 20 carbon atoms, more preferably a fluoroalkyl group having 2 to 15 carbon atoms, and a fluoroalkyl group having 4 to 10 carbon atoms. It is more preferable that the fluoroalkyl group is a fluoroalkyl group having 4 to 8 carbon atoms.
1つのフッ素含有基中のフッ素原子の数は、 3個以上であることが好まし く、 5個以上であることがより好ましく、 9個以上であることが更に好まし い。 The number of fluorine atoms in one fluorine-containing group is preferably 3 or more, more preferably 5 or more, and further preferably 9 or more.
1つのフッ素含有基中のフッ素原子の数は、 1 7個以下であることが好ま しく、 1 3個以下であることがより好ましい。 The number of fluorine atoms in one fluorine-containing group is preferably 17 or less, and more preferably 13 or less.
[0124] フッ素含有基は、 下記一般式 (チー ·!) で表される基であることが好まし い。 [0124] The fluorine-containing group is preferably a group represented by the following general formula (Chi...!).
[0125] [化 12]
Figure imgf000037_0001
[0125] [Chemical 12]
Figure imgf000037_0001
[0126] —般式 _ 1) 中、 1は〇〜 1 2の整数を表し、 9 2は 1〜 8の整数 を表し、
Figure imgf000037_0002
!は水素原子又はフッ素原子を表す。 氺は結合位置を表す。
[0126] — In the general formula _ 1), 1 represents an integer from 0 to 12, 9 2 represents an integer from 1 to 8,
Figure imgf000037_0002
!! Represents a hydrogen atom or a fluorine atom. The symbol represents the bonding position.
9 1は 1〜 7の整数を表すことが好ましく、 1〜 5の整数を表すことがよ り好ましく、 1又は 2を表すことが更に好ましい。 91 is preferably an integer of 1 to 7, more preferably an integer of 1 to 5, and even more preferably 1 or 2.
9 2は 2〜 8の整数を表すことが好ましく、 4〜 8の整数を表すことがよ り好ましく、 4〜 6の整数を表すことが更に好ましい。 92 is preferably an integer of 2 to 8, more preferably an integer of 4 to 8, and even more preferably an integer of 4 to 6.
Figure imgf000037_0003
Figure imgf000037_0003
[0127] 〔カチオン重合性基〕 [0127] [Cationically polymerizable group]
ポリマー (3) におけるカチオン重合性基は、 特に限定されず、 一般に知 られているカチオン重合性基を用いることができ、 具体的には、 脂環式エー テル基、 環状アセタール基、 環状ラクトン基、 環状チオエーテル基、 スピロ オルソエステル基、 ビニルオキシ基などを挙げることができる。 カチオン重 合性基としては、 脂環式エーテル基、 ビニルオキシ基が好ましく、 エポキシ 基、 オキセタニル基、 ビニルオキシ基が特に好ましく、 エポキシ基が最も好 \¥0 2020/175337 37 卩(:17 2020 /006912 The cation-polymerizable group in the polymer (3) is not particularly limited, and a generally known cation-polymerizable group can be used. Specifically, an alicyclic ether group, a cyclic acetal group, a cyclic lactone group can be used. , A cyclic thioether group, a spiro orthoester group, a vinyloxy group and the like. As the cationic polymerizable group, an alicyclic ether group and a vinyloxy group are preferable, an epoxy group, an oxetanyl group and a vinyloxy group are particularly preferable, and an epoxy group is most preferable. \¥0 2020/175 337 37 卩 (: 17 2020 /006912
ましい。 エポキシ基としては、 脂環式エポキシ基 (エポキシ基と脂環基の縮 環構造を有する基) であってもよい。 なお、 上記した各基は置換基を有して いてもよい。 Good The epoxy group may be an alicyclic epoxy group (a group having a condensed ring structure of an epoxy group and an alicyclic group). In addition, each of the above groups may have a substituent.
[0128] カチオン重合性基は下記式 (6— 1) で表される基、 下記一般式 (6— 2 ) で表される基、 又は下記一般式 (6— 3) で表される基であることが好ま しい。 [0128] The cationically polymerizable group is a group represented by the following formula (6-1), a group represented by the following general formula (6-2), or a group represented by the following general formula (6-3). It is preferable to have.
[0129] [化 13] [0129] [Chemical 13]
Figure imgf000038_0001
Figure imgf000038_0001
てもよい。 May be.
式 (6— 1) 、 一般式 (6— 2) 、 一般式 (6— 3) において、 氺は結合 位置を表す。 In the formula (6-1), the general formula (6-2), and the general formula (6-3), the symbol represents a bond position.
[0131 ] 一般式 (6 _ 2) 中、
Figure imgf000038_0002
は水素原子又は置換若しくは無置換のアルキル 基を表す。
[0131] In the general formula ( 6 _ 2),
Figure imgf000038_0002
Represents a hydrogen atom or a substituted or unsubstituted alkyl group.
Figure imgf000038_0003
のアルキル基を表すことが好ましい 。 炭素数 1〜 6のアルキル基としては、 例えば、 メチル基、 エチル基、 11 - プロピル基、 丨 _プロピル基、 门ーブチル基、 门ーヘキシル基等が挙げられ る。
Figure imgf000038_0003
It is preferable to represent the alkyl group of Examples of the alkyl group having 1 to 6 carbon atoms include a methyl group, an ethyl group, a 11-propyl group, a __propyl group, a s-butyl group, a s-hexyl group and the like.
上記アルキル基が置換基を有する場合の置換基としては、 ヒドロキシル基 、 カルボキシル基、 アルコキシ基、 アリール基、 ヘテロアリール基、 ハロゲ ン原子、 ニトロ基、 シアノ基、 シリル基等が挙げられる。 〇 2020/175337 38 卩(:171? 2020 /006912 When the alkyl group has a substituent, examples of the substituent include a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group and a silyl group. 〇 2020/175 337 38 卩 (:171? 2020 /006912
8 1 3は無置換の炭素数 1〜 3の直鎖アルキル基であることが好ましく、 メ チル基又はエチル基であることがより好ましい。8 13 is preferably an unsubstituted linear alkyl group having 1 to 3 carbon atoms, and more preferably a methyl group or an ethyl group.
Figure imgf000039_0001
Figure imgf000039_0001
は置換又は無置換の炭素数 1〜 6のアルキル基を表すことが好ましい 。 炭素数 1〜 6のアルキル基としては、 例えば、 メチル基、 エチル基、 11 - プロピル基、 丨 _プロピル基、 门ーブチル基、 门ーヘキシル基等が挙げられ る。 Is preferably a substituted or unsubstituted alkyl group having 1 to 6 carbon atoms. Examples of the alkyl group having 1 to 6 carbon atoms include a methyl group, an ethyl group, a 11-propyl group, a __propyl group, a door-butyl group, a door-hexyl group and the like.
上記アルキル基が置換基を有する場合の置換基としては、 ヒドロキシル基 、 カルボキシル基、 アルコキシ基、 アリール基、 ヘテロアリール基、 ハロゲ ン原子、 ニトロ基、 シアノ基、 シリル基等が挙げられる。 When the alkyl group has a substituent, examples of the substituent include a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group and a silyl group.
8 2 3は無置換の炭素数 1〜 3の直鎖アルキル基であることが好ましく、 メ チル基又はエチル基であることがより好ましい。 8 2 3 It is more preferably preferably, methyltransferase group or an ethyl group which is unsubstituted linear alkyl group of from 1 to 3 carbon atoms.
9 3は〇〜 2の整数を表し、 0又は 1であることが好ましく、 0であるこ とがより好ましい。 93 represents an integer of 0 to 2, preferably 0 or 1, and more preferably 0.
[0133] 〔ラジカル重合性基〕 [0133] [Radical polymerizable group]
ポリマー (3) におけるラジカル重合性基は、 特に限定されず、 一般に知 られているラジカル重合性基を用いることができる。 ラジカル重合性基とし ては、 重合性不飽和基が挙げられ、 具体的には、 (メタ) アクリロイル基、 ビニル基、 アリル基などが挙げられ、 (メタ) アクリロイル基が好ましい。 なお、 上記した各基は置換基を有していてもよい。 The radically polymerizable group in the polymer (3) is not particularly limited, and a generally known radically polymerizable group can be used. Examples of the radically polymerizable group include a polymerizable unsaturated group, specifically, a (meth)acryloyl group, a vinyl group, an allyl group and the like, and a (meth)acryloyl group is preferable. Each of the above groups may have a substituent.
[0134] ポリマー (3) における、 フッ素原子を有する構成単位の含有モル比率は 、 全構成単位に対して、 1モル%超 7 0モル%未満であることが好ましく、 [0134] In the polymer (3), the content molar ratio of the structural unit having a fluorine atom is preferably more than 1 mol% and less than 70 mol% with respect to all the structural units,
1モル%超 5 0モル%未満であることがより好ましく、 3モル%以上 3〇モ ル%以下であることが更に好ましく、 5モル%以上 2 0モル%以下であるこ とが特に好ましく、 5モル%以上 1 0モル%以下であることが最も好ましい 。 ポリマー (3) における、 フッ素原子を有する構成単位の含有モル比率が 、 全構成単位に対して、 1モル%超 5 0モル%未満であることで、 ポリマー (3) 中のラジカル重合性基と、 耐擦傷層形成用組成物に含まれるラジカル 〇 2020/175337 39 卩(:171? 2020 /006912 It is more preferably more than 1 mol% and less than 50 mol%, further preferably 3 mol% or more and 30 mol% or less, particularly preferably 5 mol% or more and 20 mol% or less, 5 Most preferably, it is at least mol% and at most 10 mol%. In the polymer (3), the molar ratio of the constituent units having a fluorine atom is more than 1 mol% and less than 50 mol% with respect to all the constituent units, whereby the radical polymerizable group in the polymer (3) is A radical contained in the composition for forming a scratch resistant layer 〇 2020/175 337 39 卩 (:171? 2020 /006912
重合性化合物 (〇 1) のラジカル重合性基との重合反応が阻害されにくく、 ハードコート層と耐擦傷層との密着性が高くなり、 耐擦傷性が向上しやすい ため好ましい。 The polymerization reaction of the polymerizable compound (O 1) with the radically polymerizable group is not easily inhibited, the adhesion between the hard coat layer and the scratch resistant layer is increased, and the scratch resistance is easily improved, which is preferable.
[0135] 耐擦傷性の観点から、 ポリマー (3) における、 カチオン重合性基を有す る構成単位の含有モル比率は、 全構成単位に対して、 25モル%超 85モル %以下であることが好ましく、 30モル%以上 85モル%以下であることが より好ましく、 30モル%以上 60モル%以下であることが更に好ましい。 [0135] From the viewpoint of scratch resistance, the molar ratio of the constituent units having a cationically polymerizable group in the polymer (3) is more than 25 mol% and not more than 85 mol% with respect to all the constituent units. Is preferable, 30 mol% or more and 85 mol% or less is more preferable, and 30 mol% or more and 60 mol% or less is further preferable.
[0136] 耐擦傷性の観点から、 ポリマ _ ) における、 ラジカル重合性基を有す る構成単位の含有モル比率は、 全構成単位に対して、 1モル%超であること が好ましく、 1 〇モル%以上 90モル%以下であることがより好ましく、 3 0モル%以上 60モル%以下であることが更に好ましい。 [0136] From the viewpoint of scratch resistance, the content molar ratio of the structural unit having a radically polymerizable group in the polymer _) is preferably more than 1 mol% with respect to all the structural units. It is more preferably at least 90 mol% and more preferably at least 30 mol% and not more than 60 mol%.
[0137] ポリマー (3) の重量平均分子量 (IV! ) は、 好ましくは 500〜 500 [0137] The weight average molecular weight (IV!) of the polymer (3) is preferably 500 to 500.
00であり、 より好ましくは 1 000〜 30000であり、 更に好ましくは 1 500〜 1 2000であり、 より一層好ましくは 1 500〜 1 0000で あり、 特に好ましくは 1 500〜 6000であり、 最も好ましくは 1 500 〜 4500である。 00, more preferably 1 000 to 30000, further preferably 1 500 to 1 2000, even more preferably 1 500 to 1 0000, particularly preferably 1 500 to 6000, and most preferably 1 500 to 4500.
[0138] ポリマー (3) の分子量分散度
Figure imgf000040_0001
は、 例えば 1. 00 ~4.
[0138] Molecular weight dispersity of polymer (3)
Figure imgf000040_0001
Is, for example, 1.00 to 4.
00であり、 好ましくは 1. 1 0~3. 70であり、 より好ましくは 1. 2 0~3. 00であり、 さらに好ましくは 1. 20~2. 50である。
Figure imgf000040_0002
重量平均分子量を表し、 IV! nは数平均分子量を表す。
00, preferably 1.10 to 3.70, more preferably 1.20 to 3.00, and further preferably 1.20 to 2.50.
Figure imgf000040_0002
N represents the weight average molecular weight, and IV! n represents the number average molecular weight.
[0139] ポリマ _ (3) の重量平均分子量、 分子量分散度は、 特に断りがない限り 、 〇 〇の測定値 (ポリスチレン換算) である。 重量平均分子量は、 具体的 には装置として 1~1 !_(3_8220 (東ソー株式会社製) を用意し、 溶離液と してテトラヒドロフランを用い、 カラムとして丁3 < 9 6 I (登録商標) ◦ 30001~1乂1_ +丁3 [< 96 I (登録商標) ◦ 20001~1乂1_を用い、 温度 23°0, 流量 1 し/ 丨 nの条件下、 示差屈折率 ([¾ 丨) 検出器を用いて 測定する。 [0139] Unless otherwise specified, the weight average molecular weight and the molecular weight dispersity of the polymer _ (3) are measured values of OO (in terms of polystyrene). The weight average molecular weight, specifically prepared 1-1! _ As a device (3_8220 (manufactured by Tosoh Corporation), with tetrahydrofuran as the eluent, Ding 3 <9 6 I (registered trademark) ◦ as column 30001 ~ 1 侂1 _ + Ding 3 [< 96 I (registered trademark) ◦ 20001 ~ 1 侂1 _, temperature 23°0, flow rate 1 / n , differential refractive index ([¾丨) detection Measure with a measuring instrument.
[0140] ポリマー (3) は一種のみ用いてもよく、 構造の異なる二種以上を併用し 〇 2020/175337 40 卩(:171? 2020 /006912 [0140] The polymer (3) may be used alone or in combination of two or more having different structures. 〇 2020/175 337 40 卩 (:171? 2020 /006912
てもよい。 May be.
[0141 ] 本発明におけるハードコート層形成用組成物中のポリマー (3) の含有率 は、 耐擦傷性と白化抑制の観点から、 ハードコート層形成用組成物の全固形 分に対して、 〇. 0 0 1〜 5質量%であることが好ましく、 〇. 0 1〜 3質 量%であることがより好ましく、 〇. 1〜 2質量%であることが更に好まし く、 〇. 1〜 1質量%であることが特に好ましい。 [0141] The content of the polymer (3) in the composition for forming a hard coat layer in the present invention is, based on the total solid content of the composition for forming a hard coat layer, from the viewpoint of scratch resistance and suppression of whitening. 0.01 to 5 mass% is preferable, 0.01 to 3 mass% is more preferable, and 0.01 to 2 mass% is even more preferable, and 0.01 to It is particularly preferably 1% by mass.
[0142] ポリマー (3) の構造は特に限定されないが、 ポリオルガノシルセスキオ キサン又は (メタ) アクリル系ポリマーであることが好ましく、 ポリオルガ ノシルセスキオキサンであることがより好ましい。 ポリマー (3) がポリオ ルガノシルセスキオキサンであると、 本発明の積層体において、 白化が特に 少なくなり、 好ましい。 この理由の詳細は明らかではないが、 本発明におけ るハードコート層形成用組成物には、 前述のポリオルガノシルセスキオキサ ン (3 1) が含まれるため、 ポリマー (3) がポリオルガノシルセスキオキ サンであると、 ポリオルガノシルセスキオキサン (3 1) との相溶性が高い ため、 ハードコート層表面近傍で均一性が高くなる (ミクロ相分離のように ならない) ためであると考えられる。 [0142] The structure of the polymer (3) is not particularly limited, but it is preferably polyorganosilsesquioxane or (meth)acrylic polymer, and more preferably polyorganosilsesquioxane. When the polymer (3) is polyorganosilsesquioxane, whitening is particularly reduced in the laminate of the present invention, which is preferable. Although the details of the reason are not clear, since the composition for forming a hard coat layer in the present invention contains the above-mentioned polyorganosylsesquioxane (31), the polymer (3) is a polyorganosil. It is considered that this is because sesquioxane has high compatibility with polyorganosylsesquioxane (31) and therefore has high homogeneity in the vicinity of the surface of the hard coat layer (not like microphase separation). To be
[0143] 〔ポリオルガノシルセスキオキサン (3 3) 〕 [0143] [Polyorganosilsesquioxane (33)]
ポリマー (3) がポリオルガノシルセスキオキサンである場合、 ポリマー (3) をポリオルガノシルセスキオキサン (3 3) とも呼ぶ。 When the polymer (3) is polyorganosilsesquioxane, the polymer (3) is also referred to as polyorganosilsesquioxane (33).
ポリオルガノシルセスキオキサン (3 3) の構造は特に限定されず、 ポリ オルガノシルセスキオキサンとして採り得る構造を有することができ、 例え ば、 ランダム構造、 ラダー構造、 ケージ構造などを有していることが好まし い。 The structure of polyorganosilsesquioxane (33) is not particularly limited, and may have a structure that can be adopted as polyorganosilsesquioxane, such as a random structure, a ladder structure, or a cage structure. I like to be there.
ポリオルガノシルセスキオキサン (3 3) は、 フッ素原子を含有する基を 有するシルセスキオキサン単位と、 カチオン重合性基を有するシルセスキオ キサン単位と、 ラジカル重合性基を有するシルセスキオキサン単位とを有す ることが好ましい。 Polyorganosilsesquioxane (3 3) is a silsesquioxane unit having a group containing a fluorine atom, a silsesquioxane unit having a cationically polymerizable group, and a silsesquioxane unit having a radically polymerizable group. It is preferable to have
[0144] ポリオルガノシルセスキオキサン (3 3) は、 下記一般式 (3 - 1) で表 \¥0 2020/175337 41 卩(:17 2020 /006912 [0144] Polyorganosilsesquioxane (33) is represented by the following general formula (3-1). \¥0 2020/175 337 41 卩 (: 17 2020 /006912
される構成単位、 下記一般式 (3 _ 2) で表される構成単位、 及び下記一般 式 (3— 3) で表される構成単位を有することが好ましい。 It is preferable to have a structural unit represented by the following general formula (3 — 2), and a structural unit represented by the following general formula (3-3).
[0145] [化 14] [0145] [Chemical 14]
Figure imgf000042_0001
Figure imgf000042_0001
(3-1) (8-2) ( 3) (3-1) (8-2) (3)
[0146] 一般式 (3 - 1) 中、 は単結合又は 2価の連結基を表し、
Figure imgf000042_0002
はフッ素 原子を含有する基を表す。
[0146] In the general formula (3-1), represents a single bond or a divalent linking group,
Figure imgf000042_0002
Represents a group containing a fluorine atom.
—般式 (3— 2) 中、 1_ 2は単結合又は 2価の連結基を表し、 0 2はカチオ ン重合性基を表す。 - in general formula (3-2), 1_ 2 represents a single bond or a divalent linking group, 0 2 denotes the Kachio down polymerizable group.
一般式 (3— 3) 中、 1_ 3は単結合又は 2価の連結基を表し、 0 3はラジカ ル重合性基を表す。 In the general formula (3-3), 1_ 3 represents a single bond or a divalent linking group, 0 3 represents the radical Le polymerizable group.
[0147] —般式 (3— 1) 〜 (3— 3) 中、 「3 丨 〇〗. 5」 は、 シルセスキオキサン 単位を表す。 [0147] — In the general formulas (3-1) to (3-3), “3 丨〗. 5 ”represents a silsesquioxane unit.
[0148] ポリオルガノシルセスキオキサン (3 3) において、 一般式 (3— 1) で 表される構成単位の含有モル比率は、 全構成単位に対して、 1モル%超 7 0 モル%以下であることが好ましく、 3モル%以上 5 0モル%以下であること がより好ましく、 5モル%以上 2 0モル%以下であることが更に好ましい。 [0148] In the polyorganosilsesquioxane (33), the molar ratio of the constituent units represented by the general formula (3-1) is more than 1 mol% and not more than 70 mol% based on all constituent units. Is more preferable, 3 mol% or more and 50 mol% or less is more preferable, and 5 mol% or more and 20 mol% or less is further preferable.
[0149] ポリオルガノシルセスキオキサン (3 3) において、 一般式 (3— 2) で 表される構成単位の含有モル比率は、 全構成単位に対して、 1 5 %以上 8 5 モル%以下であることが好ましく、 3 0モル%以上 8 0モル%以下であるこ とがより好ましく、 3 0モル%以上 7 0モル%以下であることが更に好まし く、 3 0モル%以上 6 0モル%以下であることが特に好ましい。 [0149] In the polyorganosilsesquioxane (3 3), the content molar ratio of the structural unit represented by the general formula (3-2) is 15% or more and 85 5% or less based on all the structural units. Is more preferable, 30 mol% or more and 80 mol% or less is more preferable, 30 mol% or more and 70 mol% or less is further preferable, and 30 mol% or more and 60 mol% or more is preferable. % Or less is particularly preferable.
[0150] ポリオルガノシルセスキオキサン (3 3) において、 一般式 (3— 3) で 表される構成単位の含有モル比率は、 全構成単位に対して、 1モル%超であ 〇 2020/175337 42 卩(:171? 2020 /006912 [0150] In the polyorganosilsesquioxane (3 3), the content molar ratio of the structural unit represented by the general formula (3-3) is more than 1 mol% based on all the structural units. 〇 2020/175 337 42 卩 (: 171? 2020 /006912
ることが好ましく、 1 0モル%以上 85モル%以下であることがより好まし く、 1 5モル%以上 70モル%以下であることが更に好ましく、 30モル% 以上 60モル%以下であることが更に好ましい。 It is preferably 10 mol% or more and 85 mol% or less, more preferably 15 mol% or more and 70 mol% or less, and 30 mol% or more and 60 mol% or less Is more preferable.
[0151] 一般式 (3_ 1) 中、 !_!は単結合又は 2価の連結基を表す。 !_!が 2価の
Figure imgf000043_0001
[0151] In the general formula (3_1),! _ ! represents a single bond or a divalent linking group. !! _ ! is a divalent
Figure imgf000043_0001
-302 -, _ [¾_、 炭素数 1〜 20の有機連結基 (例えば、 置換基を有し てもよいアルキレン基、 置換基を有してもよいシクロアルキレン基、 置換基 を有してもよいアリーレン基など) 、 又はこれらを 2つ以上組み合わせてな る連結基などが挙げられる。 上記 は水素原子又は置換基を表す。 -30 2 -, _ [¾_, an organic linking group having 1 to 20 carbon atoms (eg, an alkylene group which may have a substituent, a cycloalkylene group which may have a substituent, and a substituent) Or an arylene group), or a linking group formed by combining two or more of these. The above represents a hydrogen atom or a substituent.
一般式 (3- 1) 中、 〇!はフッ素原子を含有する基を表す。 フッ素原子を 含有する基については、 前述したものと同様である。 General formula (3-1) Medium, ○! Represents a group containing a fluorine atom. The group containing a fluorine atom is the same as described above.
[0152] _般式 (3_ 1) で表される構成単位は、 下記 _般式 (3_ 1 —†) で表 される構成単位であることが好ましい。 [0152] _ general formula (3_ 1), a structural unit represented by the following _ general formula - is preferably a structural unit table in (3_ 1 †).
[0153] [化 15] [0153] [Chemical 15]
Figure imgf000043_0002
Figure imgf000043_0002
(3-1イ) (3-1 a)
[0154] —般式 (3- 1 -干) 中、 9 1は〇〜 1 2の整数を表し、 92は 1〜 8の 整数を表し、
Figure imgf000043_0003
!は水素原子又はフッ素原子を表す。
[0154] — In the general formula (3-1-dried), 9 1 represents an integer from 0 to 12, 92 represents an integer from 1 to 8,
Figure imgf000043_0003
!! Represents a hydrogen atom or a fluorine atom.
一般式 (3_ 1 _干) 中の 9 1、 92、
Figure imgf000043_0004
それぞれ前述の一般式 ( 干一 1) 中の 1、 2、 [¾ 1と同様である。
91, 92 in the general formula (3_ 1 _ dried),
Figure imgf000043_0004
They are the same as 1, 2 and [¾ 1 in the above-mentioned general formula (Sho 1), respectively.
[0155] —般式 (3— 1 —干) 中、 「3 丨 〇1 5」 は、 シルセスキオキサン単位を表 す。 [0155] — In the general formula (3-1 — dried), “3 丨 〇 15 ”represents a silsesquioxane unit.
[0156] 一般式 (3_2) 中、 1_2は単結合又は 2価の連結基を表す。 1_2が 2価の \¥02020/175337 43 卩(:17 2020 /006912 [0156] In the general formula (3_2), 1_ 2 represents a single bond or a divalent linking group. 1_ 2 is bivalent \¥02020/175 337 43 卩(: 17 2020 /006912
連結基を表す場合の具体例は 1_1と同様であり、 置換基を有してもよい炭素数 1〜 1 0のアルキレン基、 一〇一、 一〇〇一、 一〇〇〇一、 一〇〇〇一、 一 3 -, 又はこれらを 2つ以上組み合わせてなる連結基であることが好ましく 、 置換基を有してもよい炭素数 1〜 5のアルキレン基、 _〇一、 _〇〇一、Specific examples when it represents a linking group are the same as 1_ 1, an alkylene group of 0 good carbon atoms 1-1 may have a substituent, one hundred and one, one thousand and one, ten thousand and one one OO 1, 1, 3 -, or a linking group formed by combining two or more of these is preferable, an alkylene group having 1 to 5 carbon atoms which may have a substituent, _ 〇 1, _ 〇 〇 one,
—〇〇〇一、 一0(3〇一、 又はこれらを 2つ以上組み合わせてなる連結基で あることがより好ましく、 置換基を有してもよい炭素数 1〜 5のアルキレン 基、 又は置換基を有してもよい炭素数 1〜 5のアルキレン基と一〇一を組み 合わせてなる連結基であることが更に好ましい。 — 〇 001, 10 (301, or more preferred is a linking group formed by combining two or more of these, and an alkylene group having 1 to 5 carbon atoms which may have a substituent, or a substituted group. A linking group formed by combining a C1-5 alkylene group which may have a group and 101 is more preferable.
一般式 (3— 2) 中、 02はカチオン重合性基を表す。 カチオン重合性基に ついては、 前述したものと同様である。 In the general formula (3-2), 0 2 represents a cation polymerizable group. The cationically polymerizable group is the same as described above.
[0157] 一般式 (3_2) で表される構成単位は、 下記一般式 (3_2_6 1) で 表される構成単位、 下記一般式 (3_2_62) で表される構成単位、 又は 下記一般式 (3_2_63) で表される構成単位であることが好ましい。 [0157] structural units represented by the general formula (3_2), structural units represented by the following general formula (3_2_ 6 1), the structural unit represented by the following general formula (3_2_ 6 2), or the following general formula is preferably a structural unit represented by (3_2_ 6 3).
[0158] [化 16] [0158] [Chemical 16]
Figure imgf000044_0001
Figure imgf000044_0001
(3-2-61) (3-2-82) (3-2-61) (3-2-82)
(3-2-63) (3-2-63)
[0159] 一般式 (3_2_6 1) 中、 1_2は単結合又は 2価の連結基を表す。 [0159] In the general formula (3_2_ 6 1), 1_ 2 represents a single bond or a divalent linking group.
一般式 (3_2_62) 中、
Figure imgf000044_0002
しくは無置換のア ルキル基を表し、 1_ 2は単結合又は 2価の連結基を表す。
In the general formula (3_2_ 6 2),
Figure imgf000044_0002
Or 1 or 2 represents a single bond or a divalent linking group.
9
Figure imgf000044_0003
な っていてもよい。 1_ 2は単結合又は 2価の連結基を表す。
9
Figure imgf000044_0003
It may be. 1_ 2 represents a single bond or a divalent linking group.
[0160] —般式 (3-2-6 1) 、 (3-2-62) 、 及び (3-2-63) 中、 \¥02020/175337 44 卩(:17 2020 /006912 [0160] - general formula (3-2-6 1), in (3-2-6 2), and (3-2-6 3), \¥02020/175 337 44 卩 (: 17 2020 /006912
「3 丨 〇1 5」 は、 シルセスキオキサン単位を表す。 “3 〇 15 ”represents a silsesquioxane unit.
[0161] -般式 (3-2-6 1) 、 (3-2-62) 、 及び (3-2-63) 中の [0161] - general formula (3-2-6 1), in (3-2-62), and (3-2-63)
1-2は、 前述の一般式 (3— 2) 中の 1_2と同様である。 1 2 is the same as 1_ 2 in the above general formula (3-2).
Figure imgf000045_0003
Figure imgf000045_0003
[0162] 一般式 (3— 3) 中、 1-3は単結合又は 2価の連結基を表す。 1_3が 2価の 連結基を表す場合の具体例及び好ましい範囲は前述の 1_ 2と同様である。[0162] In general formula (3-3), 1-3 represents a single bond or a divalent linking group. Specific examples and preferred ranges in the case where 1_ 3 represents a divalent linking group are the same as those in the above 1_ 2 .
—般式 (3_3) 中、 03はラジカル重合性基を表す。 ラジカル重合性基に ついては、 前述したものと同様である。 - in general formula (3_3), 0 3 represents a radical polymerizable group. The radical polymerizable group is the same as described above.
[0163] 一般式 (3_3) で表される構成単位は、 下記一般式 (3_3_ 「 1) で 表される構成単位、 又は下記一般式 (3_3_ 「 2) で表される構成単位で あることが好ましい。 [0163] The constitutional unit represented by the general formula (3_3) may be a constitutional unit represented by the following general formula (3_3_ "1") or a constitutional unit represented by the following general formula (3_3_ "2). Preferred.
[0164] [化 17] [0164] [Chemical 17]
Figure imgf000045_0001
Figure imgf000045_0001
3ィ 1) 3 1)
[0165] 一般式 (3_3_ 「 1) 中、 1_3は単結合又は 2価の連結基を表し、
Figure imgf000045_0002
水素原子又はメチル基を表す。
[0165] Formula (3_3_ "1), 1_ 3 represents a single bond or a divalent linking group,
Figure imgf000045_0002
Represents a hydrogen atom or a methyl group.
一般式 (3_3_ 「 2) 中、 1_3は単結合又は 2価の連結基を表す。 In the general formula (3_3_ "2), 1_ 3 represents a single bond or a divalent linking group.
[0166] —般式 (3-3 - 「 1) 、 及び (3-3 - 「 2) 中、 「3 丨 〇 5」 は、 シ \¥02020/175337 45 卩(:17 2020 /006912 [0166] - general formula (3-3 - "1), and (3-3 -" 2), "3丨〇 5", shea \¥02020/175 337 45 卩 (: 17 2020 /006912
ルセスキオキサン単位を表す。 Represents a lusesquioxane unit.
[0167] 一般式 (3_3_ 1) 、 及び (3_3_ 「 2) 中の 1_3は、 前述の一般式[0167] Formula (3_3_ 1), and (3_3_ "2) 1_ 3 in the aforementioned general formula
(3— 3) 中の 1_3と同様である。 It is the same as (3-3) 1_ 3 in.
[0168] ポリオルガノシルセスキオキサン (33) の具体例を以下に示すが、 本発 明はこれらに限定されない。 下記構造式において、 「3 丨 〇! 5」 は、 シルセ スキオキサン単位を表す。 [0168] Specific examples of the polyorganosilsesquioxane (33) are shown below, but the present invention is not limited thereto. In the following structural formula, “3 ◯! 5 ”represents a silsesquioxane unit.
[0169] [0169]
〇 2020/175337 46 卩(:171? 2020 /006912〇 2020/175 337 46 卩 (: 171? 2020 /006912
[化 18][Chemical 18]
Figure imgf000047_0001
Figure imgf000047_0002
Figure imgf000047_0003
Figure imgf000047_0004
Figure imgf000047_0001
Figure imgf000047_0002
Figure imgf000047_0003
Figure imgf000047_0004
[0170] [>ib19] [0170] [>ib19]
Figure imgf000048_0001
Figure imgf000048_0001
[0171] [0171]
〇 2020/175337 48 卩(:171? 2020 /006912 〇 2020/175 337 48 卩 (: 171? 2020 /006912
[化 20] [Chemical 20]
Figure imgf000049_0001
Figure imgf000049_0001
Figure imgf000049_0002
Figure imgf000049_0003
Figure imgf000049_0004
Figure imgf000049_0002
Figure imgf000049_0003
Figure imgf000049_0004
[0172] <ポリオルガノシルセスキオキサン (3 3) の製造方法> [0172] <Method for producing polyorganosilsesquioxane (33)>
ポリオルガノシルセスキオキサン (3 3) の製造方法は、 特に限定されず 〇 2020/175337 49 2020 /006912 The method for producing the polyorganosilsesquioxane (33) is not particularly limited. 〇 2020/175 337 49 2020/006912
、 公知の製造方法を用いて製造することができるが、 例えば、 加水分解性シ ラン化合物を加水分解及び縮合させる方法により製造できる。 上記加水分解 性シラン化合物としては、 フッ素原子を含有する基を有する加水分解性三官 能シラン化合物 (好ましくは下記一般式 (3
Figure imgf000050_0001
_ 1) で表される化合物) 、 カチオン重合性基を有する加水分解性三官能シラン化合物 (好ましくは下記 —般式 (3〇1 _2) で表される化合物) 、 及びラジカル重合性基を有する加 水分解性三官能シラン化合物 (好ましくは下記一般式 (3 _ 3) で表され る化合物) を使用することが好ましい。
Although it can be produced by a known production method, for example, it can be produced by a method of hydrolyzing and condensing a hydrolyzable silane compound. As the hydrolyzable silane compound, a hydrolyzable trifunctional silane compound having a group containing a fluorine atom (preferably represented by the following general formula (3
Figure imgf000050_0001
_ 1) represented by the formula), a hydrolyzable trifunctional silane compound having a cationically polymerizable group (preferably a compound represented by the following general formula (30 1 _2)), and a radically polymerizable group. It is preferable to use a hydrolyzable trifunctional silane compound (preferably a compound represented by the following general formula (3_3)).
下記一般式 (3
Figure imgf000050_0002
_ 1) で表される化合物は、 上記一般式 (3_ 1) で表 される構成単位に対応し、 下記一般式 (3〇1 _2) で表される化合物は、 上 記 _般式 (3_2) で表される構成単位に対応し、 下記 _般式 (3〇1 _3) で表される化合物は、 上記一般式 (3_3) で表される構成単位に対応する
The following general formula (3
Figure imgf000050_0002
Compounds represented by _ 1) corresponds to a structural unit table by the general formula (3_ 1), compounds represented by the following general formula (3_Rei_1 _2), the top Symbol _ general formula (3_2 corresponding to the configuration unit represented by) a compound represented by the following _ general formula (3_Rei_1 _3) corresponds to the constitutional unit represented by the general formula (3_3)
[0173] [化 21] [0173] [Chemical 21]
Figure imgf000050_0003
Figure imgf000050_0003
-1) -2) -3) -one two Three)
[0174] —般式 (3 _ 1) 中、 X4〜 X6は各々独立にアルコキシ基又はハロゲン 原子を表し、 1- 1は単結合又は 2価の連結基を表し、
Figure imgf000050_0004
はフッ素原子を含有 する基を表す。
[0174] - in general formula (3 _ 1), X 4 ~ X 6 each independently represent an alkoxy group or a halogen atom, l 1 represents a single bond or a divalent linking group,
Figure imgf000050_0004
Represents a group containing a fluorine atom.
—般式 (3 _2) 中、 X7〜 X9は各々独立にアルコキシ基又はハロゲン 原子を表し、 1_2は単結合又は 2価の連結基を表し、 02はカチオン重合性基 を表す。 - in general formula (3 _2), X 7 ~ X 9 each independently represent an alkoxy group or a halogen atom, 1_ 2 represents a single bond or a divalent linking group, 0 2 represents a cation polymerizable group.
—般式 (3 _3) 中、 X1◦〜 X 12は各々独立にアルコキシ基又はハロゲ 〇 2020/175337 50 卩(:171? 2020 /006912 — In the general formula (3_3), X 1 ◦ to X 12 are each independently an alkoxy group or halogen. 〇 2020/175 337 50 卩 (:171? 2020 /006912
ン原子を表し、 1-3は単結合又は 2価の連結基を表し、 03はラジカル重合性 基を表す。 It represents a down atoms, 1- 3 represents a single bond or a divalent linking group, 0 3 represents a radical polymerizable group.
[0175] 一般式 (3 一 1) 中の 1_1及び は、 一般式 (3- 1)
Figure imgf000051_0001
[0175] 1_ 1 and in the general formula (3-11) are the general formula (3-1)
Figure imgf000051_0001
とそれぞれ同義であり、 好ましい範囲も同様である。 And synonymous with preferred ranges.
一般式 (3 _2) 中の 1_2及び 02は、 一般式 (3— 2) 中の 1_2及び〇2 とそれぞれ同義であり、 好ましい範囲も同様である。 1_ 2 and 0 2 of the general formula (3 - 2) in the general formula (3-2) and 1_ 2 and 〇 2 in have the same meanings and preferred ranges are also the same.
一般式 (3 _3) 中の 1_3及び〇3は、 一般式 (3— 3) 中の 1_3及び〇3 とそれぞれ同義であり、 好ましい範囲も同様である。 1_ 3 and 〇 3 of the general formula (3 - 3) In the general formula (3-3) and 1_ 3 and 〇 3 in have the same meanings and preferred ranges are also the same.
[0176] —般式 (3 一 1) 〜 (3 一3) 中、 X4〜 X12は各々独立にアルコキシ 基又はハロゲン原子を示す。 [0176] - in general formula (3 one 1) to (3 one 3), X 4 - X 12 represents an alkoxy group or a halogen atom independently.
上記アルコキシ基としては、 例えば、 メ トキシ基、 エトキシ基、 プロポキ シ基、 イソプロピルオキシ基、 ブトキシ基、 イソプチルオキシ基等の炭素数 1〜 4のアルコキシ基等が挙げられる。 Examples of the alkoxy group include methoxy group, ethoxy group, propoxy group, isopropyloxy group, butoxy group, isoptyloxy group, and other alkoxy groups having 1 to 4 carbon atoms.
上記ハロゲン原子としては、 例えば、 フッ素原子、 塩素原子、 臭素原子、 ヨウ素原子等が挙げられる。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
X4〜 X12としては、 アルコキシ基が好ましく、 メ トキシ基、 エトキシ基が より好ましい。 なお、 X4〜 X12は、 それぞれ同一であっても、 異なっていて もよい。 As X 4 to X 12 , an alkoxy group is preferable, and a methoxy group and an ethoxy group are more preferable. In addition, X 4 to X 12 may be the same or different.
[0177] 上記加水分解性シラン化合物の使用量及び組成は、 所望するポリオルガノ シルセスキオキサン (33) の構造に応じて適宜調整できる。 [0177] The amount and composition of the hydrolyzable silane compound can be appropriately adjusted according to the desired structure of the polyorganosilsesquioxane (33).
[0178] また、 上記加水分解性シラン化合物の加水分解及び縮合反応は、 同時に行 うことも、 逐次行うこともできる。 上記反応を逐次行う場合、 反応を行う順 序は特に限定されない。 [0178] Further, the hydrolysis and condensation reactions of the hydrolyzable silane compound can be performed simultaneously or sequentially. When the above reactions are sequentially performed, the order of performing the reactions is not particularly limited.
[0179] 上記加水分解性シラン化合物の加水分解及び縮合反応は、 溶媒の存在下で 行うことも、 非存在下で行うこともでき、 溶媒の存在下で行うことが好まし い。 [0179] The hydrolysis and condensation reactions of the hydrolyzable silane compound can be carried out in the presence or absence of a solvent, and are preferably carried out in the presence of a solvent.
上記溶媒としては、 例えば、 ベンゼン、 トルエン、 キシレン、 エチルベン ゼン等の芳香族炭化水素;ジエチルエーテル、 ジメ トキシエタン、 テトラヒ 〇 2020/175337 51 卩(:171? 2020 /006912 Examples of the solvent include aromatic hydrocarbons such as benzene, toluene, xylene, and ethylbenzene; diethyl ether, dimethyethane, and tetrahydine. 〇 2020/175 337 51 卩 (:171? 2020 /006912
ドロフラン、 ジオキサン等のエーテル; アセトン、 メチルエチルケトン、 メ チルイソプチルケトン等のケトン;酢酸メチル、 酢酸エチル、 酢酸イソプロ ピル、 酢酸プチル等のエステル; 1\1 , 1\1 -ジメチルホルムアミ ド、 1\1 , 1\1 - ジメチルアセトアミ ド等のアミ ド; アセトニトリル、 プロピオニトリル、 ベ ンゾニトリル等の二トリル; メタノール、 エタノール、 イソプロピルアルコ _ル、 ブタノ _ル等のアルコ _ル等が挙げられる。 Ethers such as drofuran and dioxane; ketones such as acetone, methyl ethyl ketone, methyl isopropyl ethyl ketone; esters such as methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate; 1\1, 1\1-dimethylformamide, 1 \ 1, 1 \ 1 - amino-de-such as dimethyl acetamidine de; acetonitrile, propionitrile, nitrile such as base Nzonitoriru; methanol, ethanol, isopropyl alcohol _ le, alkoxyalkyl _ le such as butanol _ le and the like ..
上記溶媒としては、 ケトン又はエーテルが好ましい。 なお、 溶媒は 1種を 単独で使用することも、 2種以上を組み合わせて使用することもできる。 The solvent is preferably ketone or ether. The solvent may be used alone or in combination of two or more.
[0180] 溶媒の使用量は、 特に限定されず、 通常、 加水分解性シラン化合物の全量 [0180] The amount of the solvent used is not particularly limited, and is usually the total amount of the hydrolyzable silane compound.
1 0 0質量部に対して、 〇〜 2 0 0 0質量部の範囲内で、 所望の反応時間等 に応じて、 適宜調整することができる。 It can be appropriately adjusted within the range of 0 to 200 parts by mass with respect to 100 parts by mass, depending on a desired reaction time and the like.
[0181 ] 上記加水分解性シラン化合物の加水分解及び縮合反応は、 触媒及び水の存 在下で進行させることが好ましい。 上記触媒は、 酸触媒であってもアルカリ 触媒であってもよい。 [0181] The hydrolysis and condensation reactions of the hydrolyzable silane compound are preferably allowed to proceed in the presence of a catalyst and water. The catalyst may be an acid catalyst or an alkali catalyst.
上記酸触媒としては、 特に限定されず、 例えば、 塩酸、 硫酸、 硝酸、 リン 酸、 ホウ酸等の鉱酸; リン酸エステル;酢酸、 犠酸、 トリフルオロ酢酸等の カルボン酸; メタンスルホン酸、 トリフルオロメタンスルホン酸、
Figure imgf000052_0001
トル エンスルホン酸等のスルホン酸;活性白土等の固体酸;塩化鉄等のルイス酸 等が挙げられる。
The acid catalyst is not particularly limited, and examples thereof include mineral acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid and boric acid; phosphoric acid esters; carboxylic acids such as acetic acid, sacrificial acid and trifluoroacetic acid; methanesulfonic acid, Trifluoromethanesulfonic acid,
Figure imgf000052_0001
Examples thereof include sulfonic acids such as toluene sulfonic acid; solid acids such as activated clay; Lewis acids such as iron chloride.
上記アルカリ触媒としては、 特に限定されず、 例えば、 水酸化リチウム、 水酸化ナトリウム、 水酸化カリウム、 水酸化セシウム等のアルカリ金属の水 酸化物;水酸化マグネシウム、 水酸化カルシウム、 水酸化バリウム等のアル カリ土類金属の水酸化物;炭酸リチウム、 炭酸ナトリウム、 炭酸カリウム、 炭酸セシウム等のアルカリ金属の炭酸塩;炭酸マグネシウム等のアルカリ土 類金属の炭酸塩;炭酸水素リチウム、 炭酸水素ナトリウム、 炭酸水素カリウ ム、 炭酸水素セシウム等のアルカリ金属の炭酸水素塩;酢酸リチウム、 酢酸 ナトリウム、 酢酸カリウム、 酢酸セシウム等のアルカリ金属の有機酸塩 (例 えば、 酢酸塩) ;酢酸マグネシウム等のアルカリ土類金属の有機酸塩 (例え 〇 2020/175337 52 卩(:171? 2020 /006912 The alkali catalyst is not particularly limited, and examples thereof include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, and cesium hydroxide; magnesium hydroxide, calcium hydroxide, barium hydroxide, and the like. Alkaline earth metal hydroxides; lithium carbonates, sodium carbonates, potassium carbonates, cesium carbonates and other alkali metal carbonates; magnesium carbonates and other alkaline earth metal carbonates; lithium hydrogen carbonate, sodium hydrogen carbonate, carbonic acid Alkali metal hydrogencarbonates such as potassium hydrogen and cesium hydrogen carbonate; Organic acid salts of alkali metals such as lithium acetate, sodium acetate, potassium acetate and cesium acetate (eg acetate); Alkaline earths such as magnesium acetate Metal organic acid salt (eg 〇2020/175337 52 卩(:171? 2020/006912
ば、 酢酸塩) ; リチウムメ トキシド、 ナトリウムメ トキシド、 ナトリウムエ トキシド、 ナトリウムイソプロポキシド、 カリウムエトキシド、 カリウム I —ブトキシド等のアルカリ金属のアルコキシド;ナトリウムフエノキシド等 のアルカリ金属のフエノキシド; トリエチルアミン、 1\1 _メチルピぺリジン 、 1 , 8 -ジアザビシクロ [ 5 . 4 . 0 ] ウンデカー 7 -エン、 1 , 5 -ジ アザビシクロ [ 4 . 3 . 0 ] ノナー 5—エン等のアミン類 (第 3級アミン等 ) ; ピリジン、 2 , 2’ービビリジル、 1 , 1 0 -フエナントロリン等の含窒 素芳香族複素環化合物等が挙げられる。 For example, acetate); Lithium methoxide, sodium methoxide, sodium ethoxide, sodium isopropoxide, potassium ethoxide, potassium I-alkoxides of alkali metals such as butoxide; 1\1 _ Methylpiperidine, 1,8-diazabicyclo[5.4.0]undeca-7-ene, 1,5-diazabicyclo[4.3.0]noner-5-ene and other amines (tertiary Amine etc.); Nitrogen-containing aromatic heterocyclic compounds such as pyridine, 2,2′-bibilidyl, 1,10-phenanthroline and the like.
なお、 触媒は 1種を単独で使用することもできるし、 2種以上を組み合わ せて使用することもできる。 また、 触媒は、 水又は溶媒等に溶解又は分散さ せた状態で使用することもできる。 The catalyst may be used alone or in combination of two or more. The catalyst can also be used in a state of being dissolved or dispersed in water, a solvent or the like.
[0182] 上記触媒の使用量は、 特に限定されず、 通常、 加水分解性シラン化合物の 全量 1モルに対して、 〇. 0 0 2〜〇. 2 0 0モルの範囲内で、 適宜調整す ることができる。 [0182] The amount of the catalyst used is not particularly limited, and is usually adjusted appropriately within the range of 0.002 to 0.20.2 mol with respect to 1 mol of the total amount of the hydrolyzable silane compound. You can
[0183] 上記加水分解及び縮合反応に際しての水の使用量は、 特に限定されず、 通 常、 加水分解性シラン化合物の全量 1モルに対して、 〇. 5〜 4 0モルの範 囲内で、 適宜調整することができる。 [0183] The amount of water used in the hydrolysis and condensation reactions is not particularly limited, and is usually within a range of 0.5 to 40 mols based on 1 mol of the total amount of the hydrolyzable silane compound, It can be adjusted appropriately.
[0184] 上記水の添加方法は、 特に限定されず、 使用する水の全量 (全使用量) を 一括で添加しても、 逐次的に添加してもよい。 逐次的に添加する際には、 連 続的に添加しても、 間欠的に添加してもよい。 [0184] The method for adding the water is not particularly limited, and the total amount of water used (total amount used) may be added all at once or sequentially. When they are added sequentially, they may be added continuously or intermittently.
[0185] 上記加水分解及び縮合反応の反応温度は、 特に限定されず、 例えば 4 0〜 [0185] The reaction temperature of the hydrolysis and condensation reaction is not particularly limited, and may be, for example, 40 to
1 0 0 °〇であり、 好ましくは 4 5〜 8 0 °〇である。 また、 上記加水分解及び 縮合反応の反応時間は、 特に限定されず、 例えば〇. 1〜 1 5時間であり、 好ましくは 1 . 5〜 1 0時間である。 また、 上記加水分解及び縮合反応は、 常圧下で行うこともできるし、 加圧下又は減圧下で行うこともできる。 なお 、 上記加水分解及び縮合反応を行う際の雰囲気は、 例えば、 窒素雰囲気、 ア ルゴン雰囲気等の不活性ガス雰囲気下、 空気下等の酸素存在下等のいずれで あってもよいが、 不活性ガス雰囲気下が好ましい。 \¥0 2020/175337 53 卩(:17 2020 /006912 It is 100° and preferably 45 to 80°. The reaction time of the hydrolysis and condensation reaction is not particularly limited and is, for example, 0.1 to 15 hours, and preferably 1.5 to 10 hours. Further, the hydrolysis and condensation reactions can be carried out under normal pressure, or under pressure or under reduced pressure. The atmosphere for the hydrolysis and condensation reaction may be, for example, an atmosphere of an inert gas such as a nitrogen atmosphere or an argon atmosphere, or the presence of oxygen such as an air. A gas atmosphere is preferable. \¥ 0 2020/175 337 53 卩 (: 17 2020 /006912
[0186] 上記加水分解性シラン化合物の加水分解及び縮合反応により、 ポリオルガ ノシルセスキオキサン (3 3) を得ることができる。 上記加水分解及び縮合 反応の終了後には、 触媒を中和してもよい。 また、 ポリオルガノシルセスキ オキサン (3 3) を、 例えば、 水洗、 酸洗浄、 アルカリ洗浄、 濾過、 濃縮、 蒸留、 抽出、 晶析、 再結晶、 カラムクロマトグラフィー等の分離手段や、 こ れらを組み合わせた分離手段等により分離精製してもよい。 [0186] The polyorganosilsesquioxane (33) can be obtained by the hydrolysis and condensation reaction of the hydrolyzable silane compound. After completion of the hydrolysis and condensation reactions, the catalyst may be neutralized. In addition, polyorganosilsesquioxane (33) can be separated by, for example, washing with water, washing with acid, washing with alkali, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, and other separation means. It may be separated and purified by a combination of separating means.
[0187] 〔 (メタ) アクリル系ポリマー (3八) 〕 [0187] [(Meth)acrylic polymer (3/8)]
ポリマー (3) がアクリル系ポリマーである場合、 ポリマー (3) を (メ 夕) アクリル系ポリマー (3八) とも呼ぶ。 When the polymer (3) is an acrylic polymer, the polymer (3) is also called (medium) acrylic polymer (38).
(メタ) アクリル系ポリマー (3八) は、 耐擦傷層との密着性の観点から 、 側鎖にフッ素原子を含有する基を有し、 かつ、 主鎖にはフッ素原子を有さ ないことが好ましい。 The (meth)acrylic polymer (38) may have a group containing a fluorine atom in its side chain, and may not have a fluorine atom in its main chain, from the viewpoint of adhesion to the scratch resistant layer. preferable.
(メタ) アクリル系ポリマー (3八) は、 下記一般式 ( 一 1) で表され る構成単位、 下記 _般式 ( _ 2) で表される構成単位、 及び下記 _般式 ( _ 3) で表される構成単位を有することが好ましい。 The (meth) acrylic polymer (38) is a structural unit represented by the following general formula (1), a structural unit represented by the following general formula (_2), and a general formula (_3) below. It is preferable to have a structural unit represented by
[0188] [化 22] [0188] [Chemical 22]
Figure imgf000054_0001
Figure imgf000054_0001
(卩-1 ) -2) (^3) (卩-1) -2) (^3)
[0189] 一般式 ( _ 1) 中、 IV! !は水素原子又はメチル基を表し、 1_ 4は単結合又 は 2価の連結基を表し、 〇4はフッ素原子を含有する基を表す。 [0189] In the general formula (_ 1), IV!! Represents a hydrogen atom or a methyl group, 1_ 4 represents a single bond or a divalent linking group, 〇 4 represents a group containing a fluorine atom.
—般式 ( 一 2) 中、 IV! 2は水素原子又はメチル基を表し、 1_ 5は単結合又 は 2価の連結基を表し、 〇 5はカチオン重合性基を表す。 - in general formula (one 2), IV 2 represents a hydrogen atom or a methyl group, 1_ 5 represents a single bond or a divalent linking group, 〇 5 represents a cation polymerizable group.
—般式 ( 一3) 中、 IV! 3は水素原子又はメチル基を表し、 1_ ^は単結合又 〇 2020/175337 54 卩(:171? 2020 /006912 — In the general formula (1), IV! 3 represents a hydrogen atom or a methyl group, and 1_ ^ is a single bond or 〇 2020/175 337 54 卩 (: 171? 2020 /006912
は 2価の連結基を表し、 06はラジカル重合性基を表す。 Represents a divalent linking group, 0 6 represents a radical polymerizable group.
[0190] 一般式 ( _ 1) 中、 1_4は単結合又は 2価の連結基を表し、 1_4が 2価の 連結基を表す場合の具体例は、 前述の一般式 (3_ 1) 中の !_!と同様である 一般式 ( _ 1) 中、 〇4はフッ素原子を含有する基を表す。 フッ素原子を 含有する基については、 前述したものと同様である。 [0190] In the general formula (_ 1), 1_ 4 represents a single bond or a divalent linking group, and 1_ 4 represents a divalent linking group, the specific examples are as follows. In the general formula (_ 1) which is the same as !_ ! of , 0 4 represents a group containing a fluorine atom. The group containing a fluorine atom is the same as described above.
[0191 ] _般式 ( _ 1) で表される構成単位は、 下記 _般式 ( 一 "! 一 ·!1) で表 される構成単位であることが好ましい。 [0191] _ general formula structural units represented by (_ 1) is preferably a structural unit table below _ general formula (an "! One-! 1).
[0192] [化 23] [0192] [Chemical 23]
Figure imgf000055_0001
Figure imgf000055_0001
(^1-0 (^1-0
[0193] 一般式
Figure imgf000055_0002
[0193] General formula
Figure imgf000055_0002
1 2の整数を表し、 92は 1〜 8の整数を表し、
Figure imgf000055_0003
は水素原子又はフッ素 原子を表す。
1 represents an integer of 2, 92 represents an integer of 1 to 8,
Figure imgf000055_0003
Represents a hydrogen atom or a fluorine atom.
一般式 ( _ 1 _干) 中の 9 1、 92、
Figure imgf000055_0004
それぞれ前述の一般式 ( 干一 1) 中の 1、 2、 [¾ 1と同様である。
91, 92 in the general formula (_ 1 _ dried),
Figure imgf000055_0004
They are the same as 1, 2 and [¾ 1 in the above-mentioned general formula (Sho 1), respectively.
[0194] 一般式 ( _2) 中、 は単結合又は 2価の連結基を表す。 が 2価の 連結基を表す場合の具体例及び好ましい範囲は、 前述の一般式 (3_2) 中 の 1- 2と同様である。 [0194] In the general formula (_2), represents a single bond or a divalent linking group. There are specific examples and preferred ranges when it represents a divalent linking group, which is similar to the 1-2 in the above general formula (3_2).
一般式 ( _2) 中、 02はカチオン重合性基を表す。 カチオン重合性基に ついては、 前述したものと同様である。 In the general formula (_2) 0 2 represents a cation polymerizable group. The cationically polymerizable group is the same as described above.
[0195] 一般式 ( _2) で表される構成単位は、 下記一般式 ( _2_6 1) で 表される構成単位、 下記一般式 ( _2_62) で表される構成単位、 又は 下記一般式 ( _2_63) で表される構成単位であることが好ましい。 〇 2020/175337 55 卩(:171? 2020 /006912 [0195] structural units represented by the general formula (_2), structural units represented by the following general formula (_2_ 6 1), the structural unit represented by the following general formula (_2_ 6 2), or the following general formula is preferably a structural unit represented by (_2_ 6 3). 〇2020/175 337 55
[0196] [化 24] [0196] [Chemical 24]
Figure imgf000056_0001
- -e )
Figure imgf000056_0001
--e)
[0197] 一般式 ( _2_6 1) 中、 IV! 2は水素原子又はメチル基を表し、 1-5は単 結合又は 2価の連結基を表す。 [0197] In the general formula (_2_ 6 1), IV! 2 represents a hydrogen atom or a methyl group, 1-5 represents a single bond or a divalent linking group.
一般式 ( _2_62) 中、 IV! 2は水素原子又はメチル基を表し、
Figure imgf000056_0002
素原子又は置換若しくは無置換のアルキル基を表し、 1-5は単結合又は 2価の 連結基を表す。
In the general formula (_2_ 6 2), IV! 2 represents a hydrogen atom or a methyl group,
Figure imgf000056_0002
It represents an elementary atom or a substituted or unsubstituted alkyl group, and 1-5 represents a single bond or a divalent linking group.
一般式 ( _2_63) 中、 IV! 2は水素原子又はメチル基を表し、
Figure imgf000056_0003
換又は無置換のアルキル基を表す。 3は〇〜 2の整数を表す。
Figure imgf000056_0004
が複数 存在する場合は互いに同じでも異なっていてもよい。 1_ 5は単結合又は 2価の 連結基を表す。
In the general formula (_2_ 6 3), IV! 2 represents a hydrogen atom or a methyl group,
Figure imgf000056_0003
It represents a substituted or unsubstituted alkyl group. 3 represents an integer from 0 to 2.
Figure imgf000056_0004
When there are two or more, they may be the same as or different from each other. 1_ 5 represents a single bond or a divalent linking group.
[0198] -般式 ( 一2-6 1) 、 ( 一2-62) 、 及び ( 一2-63) 中の し 5は、 前述の一般式 ( 一 2) 中の 1_5と同様である。 [0198] - general formula (one 2-6 1), (one 2-62), and (one 2-63) teeth 5 are the same as 1_ 5 in the above general formula (one 2) ..
Figure imgf000056_0005
Figure imgf000056_0005
[0199] 一般式 ( _3) 中、 1_6は単結合又は 2価の連結基を表す。 1_6が 2価の 連結基を表す場合の具体例及び好ましい範囲は前述の一般式 (3_3) 中の 1_ 3と同様である。 [0199] In the general formula (- 3), 1_ 6 represents a single bond or a divalent linking group. Specific examples and preferred range when 1_ 6 represents a divalent linking group are the same as 1_ 3 in the aforementioned general formula (3_3).
一般式 ( _3) 中、 はラジカル重合性基を表す。 ラジカル重合性基に \¥02020/175337 56 卩(:17 2020 /006912 In the general formula (_3), represents a radically polymerizable group. Radical polymerizable group \¥02020/175 337 56 卩 (: 17 2020 /006912
ついては、 前述したものと同様である。 This is the same as that described above.
[0200] —般式 ( _3) で表される構成単位は、 下記一般式 ( _3_ 「 1) で 表される構成単位、 又は下記一般式 ( _3_ 「 2) で表される構成単位で あることが好ましい。 [0200] — The structural unit represented by general formula (_3) is a structural unit represented by the following general formula (_3_ “1”) or a structural unit represented by the following general formula (_3_ “2) Is preferred.
[0201] [化 25] [0201] [Chemical 25]
Figure imgf000057_0001
-3ィ1)
Figure imgf000057_0001
-3i 1)
[0202] 一般式 ( _3_ 「 1) 中、 1\/13は水素原子又はメチル基を表し、 1_6は単 結合又は 2価の連結基を表し、
Figure imgf000057_0002
[0202] In the general formula (_3_ "1) 1 \ / 1 3 represents a hydrogen atom or a methyl group, 1_ 6 represents a single bond or a divalent linking group,
Figure imgf000057_0002
一般式 ( _3_ 「 2) 中、 IV! 3は水素原子又はメチル基を表し、 1_6は単 結合又は 2価の連結基を表す。 In the general formula (_3_ "2), IV! 3 represents a hydrogen atom or a methyl group, 1_ 6 represents a single bond or a divalent linking group.
[0203] 一般式 ( _3_ 「 1) 、 及び ( _3_ 「 2) 中の 1_6は、 前述の一般式 ( _3) 中の 1_6と同様である。 [0203] Formula (_3_ "1), and (_3_" 2) in 1_ 6 is similar to 1_ 6 in the above general formula (_ 3).
[0204] (メタ) アクリル系ポリマー (3八) の具体例を以下に示すが、 本発明は これらに限定されない。 [0204] Specific examples of the (meth)acrylic polymer (38) are shown below, but the present invention is not limited thereto.
[0205] Hb26] [0205] Hb26]
Figure imgf000058_0001
Figure imgf000058_0001
[0206] [fb27] [0206] [fb27]
Figure imgf000059_0001
Figure imgf000059_0001
[0207] \¥0 2020/175337 59 卩(:17 2020 /006912[0207] \\0 2020/175 33 59 59 (: 17 2020 /006912
[化 28][Chemical 28]
Figure imgf000060_0001
Figure imgf000060_0001
[0208] < (メタ) アクリル系ポリマー (3八) の製造方法 > 〇 2020/175337 60 卩(:171? 2020 /006912 [0208] <Production method of (meth)acrylic polymer (38)> 〇 2020/175 337 60 卩 (: 171? 2020 /006912
(メタ) アクリル系ポリマー (3八) の製造方法は、 特に限定されず、 公 知の製造方法を用いて製造することができるが、 例えば、 (メタ) アクリロ イル基を有するモノマーをラジカル重合させる方法により製造できる。 上記 (メタ) アクリロイル基を有するモノマー ( (メタ) アクリレートモノマー ) としては、 フッ素原子を含有する基を有する (メタ) アクリレートモノマ - (好ましくは下記一般式 ( _ 1) で表される化合物) 、 カチオン重合 性基を有する (メタ) アクリレートモノマー (好ましくは下記一般式 ( -2) で表される化合物) 、 及びラジカル重合性基を有する (メタ) アクリ レートモノマー (好ましくは下記一般式 ( _3) で表される化合物) を 使用することが好ましい。 The method for producing the (meth)acrylic polymer (38) is not particularly limited, and it can be produced by a known production method. For example, a monomer having a (meth)acryloyl group is radically polymerized. It can be manufactured by the method. As the above-mentioned monomer having a (meth)acryloyl group ((meth)acrylate monomer), a (meth)acrylate monomer having a group containing a fluorine atom-(preferably a compound represented by the following general formula (_ 1)), (Meth)acrylate monomer having a cationically polymerizable group (preferably a compound represented by the following general formula (-2)), and a (meth)acrylate monomer having a radically polymerizable group (preferably the following general formula (_3) It is preferable to use a compound represented by
下記一般式 ( _ 1) で表される化合物は、 上記一般式 ( _ 1) で表 される構成単位に対応し、 下記一般式 ( _2) で表される化合物は、 上 記 _般式 ( _2) で表される構成単位に対応し、 下記 _般式 ( 〇1 _3) で表される化合物は、 上記一般式 ( _3) で表される構成単位に対応する Compound represented by the following general formula (_ 1) corresponds to a structural unit table by the general formula (_ 1), compounds represented by the following general formula (_2), the top Symbol _ general formula ( corresponding with the structural unit represented by _2), a compound represented by the following _ general formula (Rei_1 _3) corresponds to the constitutional unit represented by the general formula (_3)
[0209] [化 29] [0209] [Chemical 29]
Figure imgf000061_0001
Figure imgf000061_0001
[0210] 一般式 ( 一〇 中、 IV! 1は水素原子又はメチル基を表し、 1_4は単結合 又は 2価の連結基を表し、 04はフッ素原子を含有する基を表す。 [0210] In the Formula (ten, IV! 1 represents a hydrogen atom or a methyl group, 1_ 4 represents a single bond or a divalent linking group, 0 4 represents a group containing a fluorine atom.
一般式 ( _2) 中、 IV! 2は水素原子又はメチル基を表し、 1-5は単結合 又は 2価の連結基を表し、 05はカチオン重合性基を表す。 In the general formula (_2), IV! 2 represents a hydrogen atom or a methyl group, 1-5 represents a single bond or a divalent linking group, 0 5 represents a cation polymerizable group.
一般式 ( _3) 中、 1\/13は水素原子又はメチル基を表し、 1_6は単結合 〇 2020/175337 61 卩(:171? 2020 /006912 In the general formula (_3), 1\/1 3 represents a hydrogen atom or a methyl group, and 1_ 6 is a single bond. 〇 2020/175 337 61 卩(:171? 2020/006912
又は 2価の連結基を表し、 06はラジカル重合性基を表す。 Or it represents a divalent linking group, 0 6 represents a radical polymerizable group.
[0211] —般式 ( 〇^ - 1) 中の 1^]、 1_4及び〇4は、 一般式 ( 一 1) 中の 1^][0211] - general formula (〇 ^ - 1) 1 ^] in, 1_ 4 and 〇 4, the general formula (one 1) 1 ^] in,
1_4及び〇4とそれぞれ同義であり、 好ましい範囲も同様である。 They are each a 1_ 4 and 〇 4 synonymous, and preferred ranges are also the same.
一般式 ( _2) 中の 1\/12、 1_5及び 05は、 一般式 ( _2) 中の 1\/12、 1_5及び〇5とそれぞれ同義であり、 好ましい範囲も同様である。 Formula (_2) 1 \ / 1 2 in, 1_ 5 and 0 5, the general formula (_2) 1 \ / 1 2 in each are synonymous with 1_ 5 and 〇 5, a preferred range is also the same ..
一般式 ( _3) 中の 1\/13、 1_6及び 06は、 一般式 ( _3) 中の 1\/13、 1-6及び〇6とそれぞれ同義であり、 好ましい範囲も同様である。 Formula (_3) in 1 \ / 1 3, 1_ 6 and 0 6, the general formula (_3) in 1 \ / 1 3, have the same meanings as 1-6 and 〇 6, the preferred range is also the same is there.
[0212] (カチオン重合開始剤) [0212] (Cationic polymerization initiator)
本発明におけるハードコート層形成用組成物は、 カチオン重合開始剤を含 むことが好ましい。 The composition for forming a hard coat layer in the present invention preferably contains a cationic polymerization initiator.
本発明におけるハードコート層形成用組成物は、 カチオン重合開始剤を含 むことで、 ポリオルガノシルセスキオキサン (3 1) 及びポリマー ⑸ の カチオン重合性基の重合反応を良好に進行させることができ、 ハードコート 層において、 ポリオルガノシルセスキオキサン (8 1) とポリマー (3) と を結合することができる。 The composition for forming a hard coat layer in the present invention, which contains a cationic polymerization initiator, can favorably proceed the polymerization reaction of the polyorganosilsesquioxane (3 1) and the cationically polymerizable group of the polymer ⑸. It is possible to combine the polyorganosilsesquioxane (81) and the polymer (3) in the hard coat layer.
カチオン重合開始剤は一種のみ用いてもよく、 構造の異なる二種以上を併 用してもよい。 また、 カチオン重合開始剤は光重合開始剤でも良く、 熱重合 開始剤でも良い。 Only one cationic polymerization initiator may be used, or two or more cationic polymerization initiators having different structures may be used in combination. The cationic polymerization initiator may be a photopolymerization initiator or a thermal polymerization initiator.
ハードコート層形成用組成物中のカチオン重合開始剤の含有率は、 特に限 定されるものではないが、 例えばポリオルガノシルセスキオキサン (3 1) The content of the cationic polymerization initiator in the composition for forming the hard coat layer is not particularly limited, but for example, polyorganosilsesquioxane (3 1)
1 〇〇質量部に対して、 〇. 1〜 200質量部が好ましく、 1〜 50質量部 がより好ましい。 With respect to 100 parts by mass, 0.1 to 200 parts by mass is preferable, and 1 to 50 parts by mass is more preferable.
[0213] (溶媒) [0213] (solvent)
本発明におけるハードコート層形成用組成物は、 溶媒を含んでいてもよい 溶媒としては、 有機溶媒が好ましく、 有機溶媒の一種または二種以上を任 意の割合で混合して用いることができる。 有機溶媒の具体例としては、 例え ば、 メタノール、 エタノール、 プロパノール、 11 _ブタノール、 丨 _ブタノ 〇 2020/175337 62 卩(:171? 2020 /006912 The composition for forming a hard coat layer in the present invention may contain a solvent. As the solvent, an organic solvent is preferable, and one kind or two or more kinds of organic solvents can be mixed and used at an arbitrary ratio. Specific examples of the organic solvent include, for example, methanol, ethanol, propanol, 11 _ butanol, _ _ butano. 〇 2020/175 337 62 卩(:171? 2020/006912
—ル等のアルコール類; アセトン、 メチルイソプチルケトン、 メチルエチル ケトン、 シクロへキサノン等のケトン類;エチルセロソルブ等のセロソルブ 類; トルエン、 キシレン等の芳香族類; プロピレングリコールモノメチルエ —テル等のグリコールエーテル類;酢酸メチル、 酢酸エチル、 酢酸プチル等 の酢酸エステル類;ジアセトンアルコール等が挙げられる。 -Alcohols such as acetone; Ketones such as acetone, methylisoptylketone, methylethylketone and cyclohexanone; Cellosolves such as ethylcellosolve; Aromatic compounds such as toluene and xylene; Propylene glycol monomethyl ether etc. Glycol ethers; acetic acid esters such as methyl acetate, ethyl acetate and butyl acetate; diacetone alcohol and the like.
本発明におけるハードコート層形成用組成物における溶媒の含有率は、 ハ —ドコート層形成用組成物の塗布適性を確保できる範囲で適宜調整すること ができる。 例えば、 ハードコート層形成用組成物の全固形分 1 〇〇質量部に 対して、 5 0〜 5 0 0質量部とすることができ、 好ましくは 8 0〜 2 0 0質 量部とすることができる。 The content of the solvent in the composition for forming a hard coat layer in the present invention can be appropriately adjusted within a range in which the suitability for coating of the composition for forming a hard coat layer can be ensured. For example, the total solid content of the hard coat layer-forming composition may be 50 to 500 parts by mass, preferably 80 to 200 parts by mass, based on 100 parts by mass. You can
ハードコート層形成用組成物は、 通常、 液の形態をとる。 The composition for forming a hard coat layer usually takes the form of a liquid.
ハードコート層形成用組成物の固形分の濃度は、 通常、 1 0〜 9 0質量% 程度であり、 好ましくは 2 0〜 8 0質量%、 特に好ましくは 4 0〜 7 0質量 %程度である。 The solid content of the composition for forming a hard coat layer is usually about 10 to 90% by mass, preferably 20 to 80% by mass, and particularly preferably about 40 to 70% by mass. ..
[0214] (その他の添加剤) [0214] (Other additives)
本発明におけるハードコート層形成用組成物は、 上記以外の成分を含有し ていてもよく、 たとえば、 無機微粒子、 分散剤、 レべリング剤、 防汚剤、 帯 電防止剤、 紫外線吸収剤、 酸化防止剤等を含有していてもよい。 The composition for forming a hard coat layer in the present invention may contain a component other than the above, and examples thereof include inorganic fine particles, a dispersant, a leveling agent, an antifouling agent, an antistatic agent, an ultraviolet absorber, It may contain an antioxidant and the like.
[0215] 本発明に用いるハードコート層形成用組成物は、 以上説明した各種成分を 同時に、 または任意の順序で順次混合することにより調製することができる 。 調製方法は特に限定されるものではなく、 調製には公知の攪拌機等を用い ることができる。 [0215] The composition for forming a hard coat layer used in the present invention can be prepared by simultaneously mixing the various components described above or sequentially in an arbitrary order. The preparation method is not particularly limited, and a known stirrer or the like can be used for the preparation.
[0216] (ハードコート層形成用組成物の硬化物) [0216] (Cured product of composition for forming hard coat layer)
本発明の積層体のハードコート層は、 ポリオルガノシルセスキオキサン ( 3 1) 及びポリマー (3) を含むハードコート層形成用組成物の硬化物を含 むものであり、 好ましくは、 ポリオルガノシルセスキオキサン (3 1) 、 ポ リマ _ (3) 及びカチオン重合開始剤を含むハードコート層形成用組成物の 硬化物を含むものである。 〇 2020/175337 63 卩(:171? 2020 /006912 The hard coat layer of the laminate of the present invention contains a cured product of the composition for forming a hard coat layer containing polyorganosilsesquioxane (31) and polymer (3), and preferably polyorganosyl. It includes a cured product of a composition for forming a hard coat layer, which contains sesquioxane (31), polymer _ (3), and a cationic polymerization initiator. 〇 2020/175 337 63 卩 (:171? 2020 /006912
ハードコート層形成用組成物の硬化物は、 少なくとも、 ポリオルガノシル セスキオキサン (3 1) のカチオン重合性基とポリマー (3) のカチオン重 合性基とが重合反応により結合してなる硬化物を含むことが好ましい。 本発明の積層体のハードコート層における、 上記ハードコート層形成用組 成物の硬化物の含有率は、 5 0質量%以上であることが好ましく、 6 0質量 %以上であることがより好ましく、 7 0質量%以上であることが更に好まし い。 The hardened product of the composition for forming a hard coat layer is at least a hardened product obtained by bonding a cationically polymerizable group of polyorganosylsesquioxane (3 1) and a cationically polymerizable group of the polymer (3) by a polymerization reaction. It is preferable to include. The content of the cured product of the hard coat layer-forming composition in the hard coat layer of the laminate of the present invention is preferably 50% by mass or more, and more preferably 60% by mass or more. , 70% by mass or more is more preferable.
[0217] (ハードコート層の膜厚) [0217] (Film thickness of hard coat layer)
ハードコート層の膜厚は特に限定されないが、 〇. 5〜 3 0 〇1であるこ とが好ましく、 1〜 2 5 であることがより好ましく、 2〜 2 0 であ ることが更に好ましい。 The thickness of the hard coat layer is not particularly limited, but is preferably 0.5 to 300, more preferably 1 to 25, and further preferably 2 to 20.
ハードコート層の膜厚は、 積層体の断面を光学顕微鏡で観察して算出する 。 断面試料は、 断面切削装置ウルトラミクロトームを用いたミクロトーム法 や、 集束イオンビーム ( 丨 巳) 装置を用いた断面加工法などにより作成で きる。 The film thickness of the hard coat layer is calculated by observing the cross section of the laminate with an optical microscope. The cross-section sample can be created by a microtome method using an ultra-microtome cross-section cutting device, or a cross-section processing method using a focused ion beam (Mimi) device.
[0218] <耐擦傷層> [0218] <Scratch resistant layer>
本発明の積層体は耐擦傷層を含む。 The laminate of the present invention includes a scratch resistant layer.
耐擦傷層は、 ハードコート層上に形成されている。 The scratch resistant layer is formed on the hard coat layer.
本発明の積層体は、 少なくとも 1層の耐擦傷層を、 ハードコート層の基材 と反対側の表面上に有する。 The laminate of the present invention has at least one scratch resistant layer on the surface of the hard coat layer opposite to the substrate.
本発明の積層体の耐擦傷層は、 ラジカル重合性化合物 (〇 1) を含む耐擦 傷層形成用組成物の硬化物を含む。 The scratch-resistant layer of the laminate of the present invention contains a cured product of the scratch-resistant layer-forming composition containing the radically polymerizable compound (O 1 ).
[0219] (ラジカル重合性化合物 (〇 1) ) [0219] (Radical polymerizable compound (〇 1))
ラジカル重合性化合物 (〇 1) ( 「化合物 (〇 1) 」 ともいう。 ) につい て説明する。 The radical-polymerizable compound (○ 1) (also referred to as "compound (○ 1)") is explained.
化合物 (〇 1) は、 ラジカル重合性基を有する化合物である。 化合物 (〇 1) におけるラジカル重合性基としては、 特に限定されず、 一 般に知られているラジカノレ重合性基を用いることができる。 ラジカノレ重合性 20/175337 64 卩(:171? 2020 /006912 The compound (○ 1) is a compound having a radically polymerizable group. The radically polymerizable group in the compound (O1) is not particularly limited, and a commonly known radical carboxylic acid polymerizable group can be used. Radicanole Polymerizable 20/175337 64 卩 (: 171? 2020 /006912
基としては、 重合性不飽和基が挙げられ、 具体的には、 (メタ) アクリロイ ル基、 ビニル基、 アリル基などが挙げられ、 (メタ) アクリロイル基が好ま しい。 なお、 上記した各基は置換基を有していてもよい。 Examples of the group include a polymerizable unsaturated group, specifically, a (meth)acryloyl group, a vinyl group, an allyl group and the like, and a (meth)acryloyl group is preferable. Each of the above groups may have a substituent.
化合物 (〇 1) は、 1分子中に 2個以上の (メタ) アクリロイル基を有す る化合物であることが好ましく、 1分子中に 3個以上の (メタ) アクリロイ ル基を有する化合物であることがより好ましい。 The compound (○ 1) is preferably a compound having two or more (meth)acryloyl groups in one molecule, and a compound having three or more (meth)acryloyl groups in one molecule. Is more preferable.
化合物 (〇 1) の分子量は特に限定されず、 モノマーでもよいし、 オリゴ マーでもよいし、 ポリマーでもよい。 The molecular weight of the compound (O1) is not particularly limited, and it may be a monomer, an oligomer or a polymer.
上記化合物 (〇 1) の具体例を以下に示すが、 本発明はこれらに限定され ない。 Specific examples of the above compound (○ 1) are shown below, but the present invention is not limited thereto.
1分子中に 2個の (メタ) アクリロイル基を有する化合物としては、 ネオ ペンチルグリコールジ (メタ) アクリレート、 1 , 9—ノナンジオールジ ( メタ) アクリレート、 ジプロピレングリコールジ (メタ) アクリレート、 卜 リプロピレングリコールジ (メタ) アクリレート、 テトラエチレングリコー ルジ (メタ) アクリレート、 ヒドロキシピバリン酸ネオペンチルグリコール ジ (メタ) アクリレート、 ポリエチレングリコールジ (メタ) アクリレート 、 ジシクロペンテニル (メタ) アクリレート、 ジシクロペンテニルオキシエ チル (メタ) アクリレート、 ジシクロペンタニルジ (メタ) アクリレート等 が好適に例示される。 Examples of compounds having two (meth)acryloyl groups in one molecule include neopentyl glycol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, dipropylene glycol di(meth)acrylate, and Propylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, hydroxypivalate neopentyl glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyl oxyacrylate Preferable examples are chill (meth)acrylate, dicyclopentanyl di(meth)acrylate and the like.
1分子中に 3個以上の (メタ) アクリロイル基を有する化合物としては、 多価アルコールと (メタ) アクリル酸とのエステルが挙げられる。 具体的に は、 ペンタエリスリ トールトリ (メタ) アクリレート, ペンタエリスリ トー ルテトラ (メタ) アクリレート、 トリメチロールプロパントリ (メタ) アク リレート、 トリメチロールエタントリ (メタ) アクリレート、 ジトリメチロ —ルプロパンテトラ (メタ) アクリレート、 ジペンタエリスリ トールテトラ (メタ) アクリレート、 ジペンタエリスリ トールペンタアクリレート、 ジぺ ンタエリスリ トールへキサアクリレート, ペンタエリスリ トールへキサ (メ 夕) アクリレートなどが挙げられるが、 高架橋という点ではペンタエリスリ 〇 2020/175337 65 卩(:171? 2020 /006912 Examples of the compound having three or more (meth)acryloyl groups in one molecule include an ester of a polyhydric alcohol and (meth)acrylic acid. Specifically, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolethanetri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, dipentaerythritol. Examples include tall tetra(meth)acrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol hexa(meth)acrylate, etc. 〇 2020/175 337 65 卩(:171? 2020/006912
卜ールトリアクリレート、 ペンタエリスリ トールテトラアクリレート、 もし くはジペンタエリスリ トールペンタアクリレート、 ジペンタエリスリ トール へキサアクリレート、 又はこれらの混合物が好ましい。 Preference is given to ethyl triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, or mixtures thereof.
[0220] 化合物 (〇 1) は一種のみ用いてもよく、 構造の異なる二種以上を併用し てもよい。 [0220] The compound (O1) may be used alone or in combination of two or more kinds having different structures.
[0221 ] 耐擦傷層形成用組成物中の化合物 (〇 1) の含有率は、 耐擦傷層形成用組 成物中の全固形分に対して、 8 0質量%以上であることが好ましく、 8 5質 量%以上がより好ましく、 9 0質量%以上が更に好ましい。 [0221] The content of the compound (○ 1) in the composition for forming a scratch resistant layer is preferably 80% by mass or more based on the total solid content in the composition for forming a scratch resistant layer, 85 mass% or more is more preferable, and 90 mass% or more is further preferable.
[0222] (ラジカル重合開始剤) [0222] (Radical polymerization initiator)
本発明における耐擦傷層形成用組成物は、 ラジカル重合開始剤を含むこと が好ましい。 The composition for forming a scratch resistant layer in the present invention preferably contains a radical polymerization initiator.
本発明における耐擦傷層形成用組成物は、 ラジカル重合開始剤を含むこと で、 前述のハードコート層形成用組成物に含まれるポリマ _ (3) 及び化合 物 (〇 1) のラジカル重合性基の重合反応を良好に進行させることができ、 ハードコート層塗膜の耐擦傷層塗膜側の表面に偏在しているポリマ _ (3) と、 耐擦傷層塗膜中の化合物 (〇 1) とを結合することができ、 ハードコー 卜層と耐擦傷層の密着性を高めることができる。 The scratch-resistant layer forming composition of the present invention contains a radical polymerizable group of the polymer _ (3) and the compound (○ 1) contained in the above-mentioned hard coat layer forming composition by containing a radical polymerization initiator. The polymer _ (3), which is capable of favorably advancing the polymerization reaction of, is unevenly distributed on the surface of the hard coat layer coating on the scratch-resistant layer coating side, and the compound (〇 1) in the scratch-resistant layer coating layer Can be combined with each other, and the adhesion between the hard coating layer and the scratch resistant layer can be enhanced.
ラジカル重合開始剤は一種のみ用いてもよく、 構造の異なる二種以上を併 用してもよい。 また、 ラジカル重合開始剤は光重合開始剤でも良く、 熱重合 開始剤でも良い。 Only one radical polymerization initiator may be used, or two or more radical polymerization initiators having different structures may be used in combination. The radical polymerization initiator may be a photopolymerization initiator or a thermal polymerization initiator.
耐擦傷層形成用組成物中のラジカル重合開始剤の含有率は、 特に限定され るものではないが、 例えば化合物 (〇 1) 1 0 0質量部に対して、 〇. 1〜 2 0 0質量部が好ましく、 1〜 5 0質量部がより好ましい。 The content of the radical polymerization initiator in the scratch-resistant layer-forming composition is not particularly limited, but may be, for example, 0.1 to 200 parts by mass relative to 100 parts by mass of the compound (〇1). A part is preferable, and 1 to 50 parts by mass is more preferable.
[0223] (溶媒) [0223] (solvent)
本発明における耐擦傷層形成用組成物は、 溶媒を含んでいてもよい。 溶媒としては、 前述のハードコート層形成用組成物が含んでいてもよい溶 媒と同様である。 The composition for forming a scratch resistant layer in the present invention may contain a solvent. The solvent is the same as the solvent that may be contained in the composition for forming a hard coat layer.
本発明における耐擦傷層形成用組成物における溶媒の含有率は、 耐擦傷層 〇 2020/175337 66 卩(:171? 2020 /006912 The content of the solvent in the composition for forming a scratch resistant layer in the present invention is 〇 2020/175 337 66 卩 (:171? 2020 /006912
形成用組成物の塗布適性を確保できる範囲で適宜調整することができる。 例 えば、 耐擦傷層形成用組成物の全固形分 1 〇〇質量部に対して、 5 0〜 5 0 〇質量部とすることができ、 好ましくは 8 0〜 2 0 0質量部とすることがで きる。 It can be appropriately adjusted within a range that can secure the coating suitability of the composition for forming. For example, with respect to the total solid content of 100 parts by mass of the composition for forming a scratch resistant layer, it can be 50 to 500 parts by mass, and preferably 80 to 200 parts by mass. You can
耐擦傷層形成用組成物は、 通常、 液の形態をとる。 The composition for forming a scratch resistant layer usually takes the form of a liquid.
耐擦傷層形成用組成物の固形分の濃度は、 通常、 1 0〜 9 0質量%程度で あり、 好ましくは 2 0〜 8 0質量%、 特に好ましくは 4 0〜 7 0質量%程度 である。 The solid content of the scratch-resistant layer forming composition is usually about 10 to 90% by mass, preferably 20 to 80% by mass, and particularly preferably about 40 to 70% by mass. ..
[0224] (その他添加剤) [0224] (Other additives)
耐擦傷層形成用組成物は、 上記以外の成分を含有していてもよく、 たとえ ば、 無機粒子、 レべリング剤、 防汚剤、 帯電防止剤、 滑り剤、 溶媒等を含有 していてもよい。 The composition for forming a scratch resistant layer may contain components other than the above, and for example, it may contain inorganic particles, leveling agents, antifouling agents, antistatic agents, slip agents, solvents and the like. Good.
特に、 滑り剤として下記の含フッ素化合物を含有することが好ましい。 In particular, it is preferable to contain the following fluorine-containing compound as a slip agent.
[0225] [含フッ素化合物] [0225] [Fluorine-containing compound]
含フッ素化合物は、 モノマー、 オリゴマー、 ポリマーいずれでもよい。 含 フッ素化合物は、 耐擦傷層中で多官能 (メタ) アクリレート化合物 (〇 1) との結合形成あるいは相溶性に寄与する置換基を有していることが好ましい 。 この置換基は同一であっても異なっていてもよく、 複数個あることが好ま しい。 The fluorine-containing compound may be any of a monomer, an oligomer and a polymer. The fluorine-containing compound preferably has a substituent that contributes to bond formation or compatibility with the polyfunctional (meth)acrylate compound (○ 1) in the scratch resistant layer. The substituents may be the same or different, and it is preferable that there are plural substituents.
この置換基は重合性基が好ましく、 ラジカル重合性、 カチオン重合性、 ア ニオン重合性、 縮重合性及び付加重合性のうちいずれかを示す重合性反応基 であればよく、 好ましい置換基の例としては、 アクリロイル基、 メタクリロ イル基、 ビニル基、 アリル基、 シンナモイル基、 エポキシ基、 オキセタニル 基、 水酸基、 ポリオキシアルキレン基、 カルボキシル基、 アミノ基が挙げら れる。 その中でもラジカル重合性基が好ましく、 中でもアクリロイル基、 メ タクリロイル基が特に好ましい。 This substituent is preferably a polymerizable group, and may be a polymerizable reactive group exhibiting any of radically polymerizable, cationically polymerizable, anionically polymerizable, polycondensable and addition polymerizable, and examples of preferable substituents Examples thereof include an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, a cinnamoyl group, an epoxy group, an oxetanyl group, a hydroxyl group, a polyoxyalkylene group, a carboxyl group and an amino group. Of these, radically polymerizable groups are preferable, and acryloyl group and methacryloyl group are particularly preferable.
含フッ素化合物はフッ素原子を含まない化合物とのポリマーであっても才 リゴマーであってもよい。 〇 2020/175337 67 卩(:171? 2020 /006912 The fluorine-containing compound may be a polymer with a compound not containing a fluorine atom or may be a ligomer. 〇 2020/175 337 67 卩 (:171? 2020 /006912
[0226] 上記含フッ素化合物は、 下記一般式 ( ) で表されるフッ素系化合物が好 ましい。[0226] The above-mentioned fluorine-containing compound is preferably a fluorine-based compound represented by the following general formula ().
Figure imgf000068_0001
Figure imgf000068_0001
(式中、
Figure imgf000068_0002
ナは (パー) フルオロアルキル基又は (パー) フルオロポリエー テル基、 は単結合又は連結基、
Figure imgf000068_0003
は重合性不飽和基を表す。 n f は1〜3 の整数を表す。 111チは 1〜 3の整数を表す。 )
(In the formula,
Figure imgf000068_0002
Is a (per) fluoroalkyl group or (per) fluoropolyether group, is a single bond or a linking group,
Figure imgf000068_0003
Represents a polymerizable unsaturated group. nf represents an integer of 1 to 3. 111 is an integer of 1 to 3. )
[0227] 一般式 ( ) において、
Figure imgf000068_0004
は重合性不飽和基を表す。 重合性不飽和基は、 紫外線や電子線などの活性エネルギー線を照射することによりラジカル重合 反応を起こしうる不飽和結合を有する基 (すなわち、 ラジカル重合性基) で あることが好ましく、 (メタ) アクリロイル基、 (メタ) アクリロイルオキ シ基、 ビニル基、 アリル基などが挙げられ、 (メタ) アクリロイル基、 (メ 夕) アクリロイルオキシ基、 及びこれらの基における任意の水素原子がフッ 素原子に置換された基が好ましく用いられる。
[0227] In the general formula (),
Figure imgf000068_0004
Represents a polymerizable unsaturated group. The polymerizable unsaturated group is preferably a group having an unsaturated bond capable of causing a radical polymerization reaction by irradiation with active energy rays such as ultraviolet rays and electron beams (that is, radical polymerizable group), and (meth) Acryloyl group, (meth)acryloyloxy group, vinyl group, allyl group, etc., (meth)acryloyl group, (meth)acryloyloxy group, and any hydrogen atom in these groups is replaced by a fluorine atom. The groups described above are preferably used.
[0228] —般式 ( ) において、
Figure imgf000068_0005
ナは (パー) フルオロアルキル基又は (パー) フ ルオロポリエーテル基を表す。
[0228] — In the general formula (),
Figure imgf000068_0005
Na represents a (per) fluoroalkyl group or a (per) fluoropolyether group.
ここで、 (パー) フルオロアルキル基は、 フルオロアルキル基及びパーフ ルオロアルキル基のうち少なくとも 1種を表し、 (パー) フルオロポリエー テル基は、 フルオロポリエーテル基及びパーフルオロポリエーテル基のうち 少なくとも 1種を表す。 耐擦傷性の観点では、
Figure imgf000068_0006
ナ中のフッ素含有率は高いほ うが好ましい。
Here, the (per) fluoroalkyl group represents at least one of a fluoroalkyl group and a perfluoroalkyl group, and the (per) fluoropolyether group represents at least one of a fluoropolyether group and a perfluoropolyether group. Represents a species. From the viewpoint of scratch resistance,
Figure imgf000068_0006
It is preferable that the fluorine content in the sodium is high.
[0229] (パー) フルオロアルキル基は、 炭素数 1〜 2 0の基が好ましく、 より好 ましくは炭素数 1〜 1 〇の基である。 [0229] The (per)fluoroalkyl group is preferably a group having 1 to 20 carbon atoms, and more preferably a group having 1 to 10 carbon atoms.
(パー) フルオロアルキル基は、 直鎖構造 (例えば一〇 23、 一〇1~1 2
Figure imgf000068_0007
(Per) fluoroalkyl group, straight chain structure (e.g. ten 23, One Rei_1 ~ 1 2
Figure imgf000068_0007
つても、 分岐構造 (例えば一〇! ! (〇 32、 一〇1~1 2〇 (〇 32、 一〇 1~1 (〇1~1 3) 〇 23、 一〇1~1 (〇1~1 3) (〇 252 1~1) であつても 、 脂環式構造 (好ましくは 5員環又は 6員環で、 例えばパーフルオロシクロ ヘキシル基及びパーフルオロシクロペンチル基並びにこれらの基で置換され 〇 2020/175337 68 卩(:171? 2020 /006912 Connexion also, branched structure (for example ten! (〇 3) 2, one Rei_1 to 1 2 〇 (〇 3) 2, ten 1 to 1 (Rei_1 to 1 3)23, one Rei_1 ~ 1 (Rei_1 ~ 1 3) (〇 2) 5 〇 be filed in 2 1 ~ 1), alicyclic structure (preferably a 5- or 6-membered ring, for example perfluoro cyclo hexyl and perfluoro Cyclopentyl groups as well as substituted with these groups 〇 2020/175 337 68 卩 (:171? 2020 /006912
たアルキル基) であってもよい。 Alkyl group).
[0230] (パー) フルオロポリエーテル基は、 (パー) フルオロアルキル基がエー テル結合を有している場合を指し、 1価でも 2価以上の基であってもよい。 フルオロポリエーテル基としては、 例えば一
Figure imgf000069_0001
23、 一〇 H2CH2〇CH2C4F8H、 _〇 1~12〇 1~12〇〇 1~12〇 1~1287、 _〇1~12〇 H2OC F2C F2OC F2C F2H% フッ素原子を 4個以上有する炭素数 4〜 2 0のフルオロシクロアルキル基等が挙げられる。 また、 パーフルオロポリエ —テル基としては、 例えば、 一 (〇 2〇) (〇 22〇) ^ -
Figure imgf000069_0002
[0230] The (per)fluoropolyether group refers to a case where the (per)fluoroalkyl group has an ether bond, and may be a monovalent group or a divalent or higher valent group. Fluoropolyether groups include, for example,
Figure imgf000069_0001
23, ten H 2 CH 2 〇_CH 2 C 4 F 8 H, _〇 1-1 21-1 2 hundred 1-1 21-1 28! 7 include _〇_1 ~ 1 2 H 2 OC F 2 CF 2 OC F 2 CF 2 H% fluorine atom fluorocycloalkyl group with carbon number 4-2 0 having four or more like. In addition, as a perfluoropolyether group, for example, one (○ 2 0) (○ 2 0 2 20) ^-
Figure imgf000069_0002
2〇) 一、 一 (〇 22〇) 一などが挙げられる。 2_Rei) one, and a one (〇 22 〇) scratch.
上記 チ及び チはそれぞれ独立に〇〜 20の整数を表す。 ただし 干 + 干は 1以上の整数である。 The above chi and chi each independently represent an integer of 0 to 20. However, dried + dried is an integer of 1 or more.
干及び 干の総計は 1〜 83が好ましく、 1〜 43がより好ましく、 5 〜 23がさらに好ましい。 The total of dried fish and dried fish is preferably 1 to 83, more preferably 1 to 43, and even more preferably 5 to 23.
上記含フッ素化合物は、 耐擦傷性に優れるという観点から一 (〇 2〇) — (〇 22〇) で表されるパーフルオロポリエーテル基を有するこ とが特に好ましい。 The fluorine-containing compound is one from the viewpoint of excellent scratch resistance (〇 2 〇) - (〇 22 〇) particularly preferred and this having a perfluoropolyether group represented by.
[0231] 本発明においては、 含フッ素化合物は、 パーフルオロポリエーテル基を有 し、 かつ重合性不飽和基を一分子中に複数有することが好ましい。 [0231] In the present invention, the fluorine-containing compound preferably has a perfluoropolyether group and a plurality of polymerizable unsaturated groups in one molecule.
[0232] —般式 ( ) において、 は連結基を表す。 としては、 例えばアルキレ ン基、 アリーレン基及びへテロアルキレン基、 並びにこれらの基が組み合わ さった連結基が挙げられる。 これらの連結基は、 更に、 オキシ基、 カルボニ ル基、 カルボニルオキシ基、 カルボニルイミノ基及びスルホンアミ ド基等、 並びにこれらの基が組み合わさった官能基を有してもよい。 [0232] — In the general formula (), represents a linking group. Examples thereof include an alkylene group, an arylene group and a heteroalkylene group, and a linking group formed by combining these groups. These linking groups may further have an oxy group, a carbonyl group, a carbonyloxy group, a carbonylimino group, a sulfonamide group, and the like, and a functional group in which these groups are combined.
として、 好ましくは、 エチレン基、 より好ましくは、 カルボニルイミノ 基と結合したエチレン基である。 It is preferably an ethylene group, and more preferably an ethylene group bonded to a carbonylimino group.
[0233] 含フッ素化合物のフッ素原子含有量には特に制限は無いが、 20質量%以 上が好ましく、 30〜 70質量%がより好ましく、 40〜 70質量%がさら 〇 2020/175337 69 卩(:171? 2020 /006912 [0233] The fluorine atom content of the fluorine-containing compound is not particularly limited, but is preferably 20% by mass or more, more preferably 30 to 70% by mass, and further preferably 40 to 70% by mass. 〇 2020/175 337 69 卩 (:171? 2020 /006912
に好ましい。 Is preferred.
[0234] 好ましい含フッ素化合物の例としては、 ダイキン化学工業 (株) 製の[¾- 2020、 1\/1-2020、 6-3833、 IV! - 3833及びオプツール 0八 〇 (以上商品名) 、 口 I 〇社製のメガフアック ー 1 7 1、 ー 1 72、 - 1 79八、 [¾3-78、 [¾3-90、 デイフェンサ IV!〇 ー 300及び IV! 〇 ー323 (以上商品名) が挙げられるがこれらに限定されるものではな い。 [0234] Examples of preferable fluorine-containing compounds include [¾-2020, 1\/1-2020, 6-3833, IV!-3833 and Optool 0880 (trade name) manufactured by Daikin Chemical Industries, Ltd. , 口 I 〇 made by Megafaq-1 7 1,-1 72,-179 8, [¾3-78, [¾3-90, Defencer IV! 〇-300 and IV! 〇-323 (these product names) Examples include but are not limited to:
[0235] 耐擦傷性の観点から、 一般式 ( ) において、 n f とm f の積 (n f Xm 干) は 2以上が好ましく、 4以上がより好ましい。 [0235] From the viewpoint of scratch resistance, in the general formula (), the product of nf and mf (nfXm) is preferably 2 or more, and more preferably 4 or more.
[0236] 重合性不飽和基を有する含フッ素化合物の重量平均分子量
Figure imgf000070_0001
は、 分 子排斥クロマトグラフイー、 例えばゲル浸透クロマトグラフイー (〇 〇) を用いて測定できる。
[0236] Weight average molecular weight of fluorine-containing compound having polymerizable unsaturated group
Figure imgf000070_0001
Can be measured using molecular exclusion chromatography, for example gel permeation chromatography (○○).
本発明で用いられる含フッ素化合物の
Figure imgf000070_0002
は 400以上 50000未満が 好ましく、 400以上 30000未満がより好ましく、 400以上 2500 〇未満が更に好ましい。
Of the fluorine-containing compound used in the present invention
Figure imgf000070_0002
Is preferably 400 or more and less than 50,000, more preferably 400 or more and less than 30,000, and even more preferably 400 or more and less than 2,500.
[0237] 含フッ素化合物の含有率は、 耐擦傷層形成用組成物中の全固形分に対して 、 〇. 01〜 5質量%が好ましく、 〇. 1〜 5質量%がより好ましく、 〇. [0237] The content of the fluorine-containing compound is preferably 0.01 to 5% by mass, more preferably 0.1 to 5% by mass, and more preferably 0.01 to 5% by mass based on the total solid content in the composition for forming a scratch resistant layer.
5〜 5質量%が更に好ましく、 〇. 5〜 2質量%が特に好ましい。 5 to 5 mass% is more preferable, and 0.5 to 2 mass% is particularly preferable.
[0238] 本発明に用いる耐擦傷層形成用組成物は、 以上説明した各種成分を同時に 、 または任意の順序で順次混合することにより調製することができる。 調製 方法は特に限定されるものではなく、 調製には公知の攪拌機等を用いること ができる。 [0238] The composition for forming a scratch resistant layer used in the present invention can be prepared by simultaneously mixing the various components described above or sequentially in an arbitrary order. The preparation method is not particularly limited, and a known stirrer or the like can be used for the preparation.
[0239] (耐擦傷層形成用組成物の硬化物) [0239] (Cured product of composition for forming scratch resistant layer)
本発明の積層体の耐擦傷層は、 化合物 (〇 1) を含む耐擦傷層形成用組成 物の硬化物を含むものであり、 好ましくは、 化合物 (〇 1) 及びラジカル重 合開始剤を含む耐擦傷層形成用組成物の硬化物を含むものである。 The scratch-resistant layer of the laminate of the present invention contains a cured product of the scratch-resistant layer-forming composition containing the compound (○ 1 ), and preferably contains the compound (○ 1) and a radical polymerization initiator. It includes a cured product of the composition for forming a scratch resistant layer.
耐擦傷層形成用組成物の硬化物は、 少なくとも、 化合物 (〇 1) のラジカ ル重合性基が重合反応してなる硬化物を含むことが好ましい。 〇 2020/175337 70 卩(:171? 2020 /006912 The cured product of the composition for forming a scratch resistant layer preferably contains at least a cured product obtained by polymerization reaction of the radically polymerizable group of the compound (O1). 〇 2020/175 337 70 卩(:171? 2020/006912
本発明の積層体の耐擦傷層における耐擦傷層形成用組成物の硬化物の含有 率は、 耐擦傷層の全質量に対して 6 0質量%以上であることが好ましく、 7 〇質量%以上がより好ましく、 8 0質量%以上が更に好ましい。 The content of the cured product of the scratch-resistant layer forming composition in the scratch-resistant layer of the laminate of the present invention is preferably 60% by mass or more, and 70% by mass or more based on the total mass of the scratch-resistant layer. Is more preferable, and 80% by mass or more is further preferable.
[0240] (耐擦傷層の膜厚) [0240] (film thickness of scratch resistant layer)
耐擦傷層の膜厚は、 繰り返し折り曲げ耐性の観点から、 3 . 〇 未満で あることが好ましく、 〇. 1〜 2 . 〇 であることがより好ましく、 〇. From the viewpoint of repeated bending resistance, the film thickness of the scratch resistant layer is preferably less than 3.0, more preferably 0.01 to 2.0, and 〇.
1〜 1 . 0 であることが更に好ましい。 More preferably, it is 1 to 1.0.
[0241 ] <繰り返し折り曲げ耐性> [0241] <Resistance to repeated bending>
本発明の積層体は、 優れた繰り返し折り曲げ耐性を有する。 The laminate of the present invention has excellent resistance to repeated bending.
本発明の積層体は、 耐擦傷層を内側にして、 曲率半径 2 で 1 8 0 ° 折 り曲げ試験を 3 0万回繰り返し行った場合にクラックが発生しない。 The laminate of the present invention has no scratches when the abrasion resistance layer is placed inside and a bending test of 180 ° with a radius of curvature of 2 is repeated 300,000 times.
繰り返し折り曲げ耐性は具体的には以下のように測定する。 The repeated bending resistance is specifically measured as follows.
積層体か
Figure imgf000071_0001
の試料フィルムを切り出し、 温度
Is it a laminate
Figure imgf000071_0001
Cut out the sample film of
2 5 °〇、 相対湿度 6 5 %の状態に 1時間以上静置させる。 その後、 1 8 0 ° 耐折度試験機 ( (株) 井元製作所製、 丨 1\/!(3 - 0 7 5 5型) を用いて、 耐擦 傷層を内側 (基材を外側) にして繰り返し折り曲げ耐性の試験を行う。 上記 試験機は、 試料フィルムを直径 4 0! 0!の棒 (円柱) の曲面に沿わせて曲げ角 度 1 8 0 ° で長手方向の中央部分で折り曲げた後、 元に戻す (試料フィルム を広げる) という動作を 1回の試験とし、 この試験を繰り返し行うものであ る。 上記 1 8 0 ° 折り曲げ試験を 3 0万回繰り返し行った場合にクラックが 発生するか否かを目視で評価する。 Allow to stand for 1 hour or more in the condition of 25° and relative humidity of 65%. Then, using a 180° folding endurance tester (manufactured by Imoto Machinery Co., Ltd., 丨1\/! (3-0755) type), the scratch-resistant layer was made inside (base material outside). The above tester bends the sample film along the curved surface of a rod (cylinder) with a diameter of 40!0! at a bending angle of 180 ° at the center in the longitudinal direction. After that, the operation of returning to the original state (expanding the sample film) is regarded as one test, and this test is repeated.When the above 180 ° bending test is repeated 300,000 times, cracks occur. Whether or not to do is visually evaluated.
[0242] 基材と、 ハードコート層と、 耐擦傷層とをこの順に有する積層体であって 、 上記ハ _ドコ _卜層が、 前述のポリオルガノシルセスキオキサン (8 1) [0242] A laminate having a base material, a hard coat layer, and a scratch-resistant layer in this order, wherein the above-mentioned hard_co_layer is a polyorganosilsesquioxane (81) described above.
、 及びポリマ _ (3) を含むハードコート層形成用組成物の硬化物を含み、 かつ上記耐擦傷層が、 ラジカル重合性化合物 (〇 1) を含む耐擦傷層形成用 組成物の硬化物を含む積層体とすることで、 上記繰り返し折り曲げ耐性に優 れた積層体とすることができる。 , And a hard coat layer-forming composition containing a polymer _ (3), wherein the scratch-resistant layer is a cured product of a scratch-resistant layer-forming composition containing a radically polymerizable compound (○ 1). By including the laminate including the above, it is possible to obtain the laminate excellent in the repeated bending resistance.
[0243] <耐擦傷性> 〇 2020/175337 71 卩(:171? 2020 /006912 [0243] <Scratch resistance> 〇 2020/175 337 71 卩 (:171? 2020 /006912
本発明の積層体は、 優れた耐擦傷性を有する。 The laminate of the present invention has excellent scratch resistance.
本発明の積層体は、 # 0 0 0〇番のスチールウールで 1
Figure imgf000072_0001
の荷重 をかけながら、 耐擦傷層の表面を往復 1 0 0回擦った場合に傷が生じないも のであり、 往復 1 0 0 0回擦った場合に傷が生じないことが好ましい。
The laminate of the present invention is made of #0000 steel wool.
Figure imgf000072_0001
It is preferable that the surface of the scratch-resistant layer be rubbed 100 times back and forth while applying a load of 1. No scratches are generated, and it is preferable that the scratches are not generated when rubbed 100 times back and forth.
耐擦傷性は具体的には以下のように測定する。 The scratch resistance is specifically measured as follows.
積層体の耐擦傷層の表面を、 ラビングテスターを用いて、 下記条件で擦り 試験を行うことで、 耐擦傷性の指標とする。 The surface of the scratch resistant layer of the laminate is subjected to a rubbing test using a rubbing tester under the following conditions to give an index of scratch resistance.
評価環境条件: 2 5 °0、 相対湿度 6 0 % Evaluation environmental conditions: 25 ° 0, relative humidity 60%
こすり材:スチールウール (日本スチールウール (株) 製、 グレード1\1〇 . # 0 0 0〇番) Scrubbing material: Steel wool (manufactured by Nippon Steel Wool Co., Ltd., Grade 1\1○.#00000)
試料と接触するテスターのこすり先端部 (2 0 01 X 2 0 01) に巻いて、 バ ンド固定
Figure imgf000072_0002
Wrap around the rubbing tip of the tester (2 01 X 200 1) that comes into contact with the sample, and fix the band.
Figure imgf000072_0002
先端部接触面積: 2〇 01 X 2〇 01 Tip contact area: 20 X 01 X 201
擦り回数:往復 1 〇回、 往復 1 〇〇回、 往復 1 〇〇〇回 Number of rubs: round trip 10 times, round trip 100 times, round trip 100 times
試験後の積層体の擦った面 (耐擦傷層の表面) とは逆側の面 (基材の表面 ) に油性黒インキを塗り、 反射光で目視観察して、 スチールウールと接触し ていた部分に傷が生じたときの擦り回数を計測し評価する。 After the test, the oily black ink was applied to the surface (surface of the base material) opposite to the rubbed surface (surface of the scratch resistant layer) of the laminated body, and it was visually observed by reflected light, and it was in contact with steel wool. The number of times of rubbing when a part is scratched is measured and evaluated.
[0244] 基材と、 ハードコート層と、 耐擦傷層とをこの順に有する積層体であって 、 上記ハ _ドコ _卜層が、 前述のポリオルガノシルセスキオキサン (8 1) [0244] A laminate having a base material, a hard coat layer, and a scratch-resistant layer in this order, wherein the hard coat layer has the above-mentioned polyorganosilsesquioxane (81).
、 及びポリマ _ (3) を含むハードコート層形成用組成物の硬化物を含み、 かつ上記耐擦傷層が、 ラジカル重合性化合物 (〇 1) を含む耐擦傷層形成用 組成物の硬化物を含む積層体とすることで、 上記耐擦傷性に優れた積層体と することができる。 , And a hard coat layer-forming composition containing a polymer _ (3), wherein the scratch-resistant layer is a cured product of a scratch-resistant layer-forming composition containing a radically polymerizable compound (○ 1). By including a laminate containing the above, the laminate having excellent scratch resistance can be obtained.
[0245] <積層体の製造方法> [0245] <Method for producing laminated body>
本発明の積層体の製造方法について説明する。 〇 2020/175337 72 卩(:171? 2020 /006912 The method for manufacturing the laminate of the present invention will be described. 〇 2020/175 337 72 卩 (:171? 2020 /006912
本発明の積層体の製造方法は、 下記工程 ( I) 〜 ( I V) を含む製造方法 であることが好ましい。 The method for producing a laminate of the present invention is preferably a production method including the following steps (I) to (IV).
( I) 基材上に、 カチオン重合性基を有するポリオルガノシルセスキオキ サン (3 1) 、 及び、 フッ素原子を含有する基とカチオン重合性基とラジカ ル重合性基とを有するポリマー (3) を含むハードコート層形成用組成物を 塗布してハードコート層塗膜を形成する工程 (I) Polyorganosilsesquioxane having a cationically polymerizable group (3 1) and a polymer having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group on a substrate (3) A step of applying a composition for forming a hard coat layer containing
( I I) 上記ハードコート層塗膜を硬化することによりハードコート層を 形成する工程 (II) Step of forming a hard coat layer by curing the above hard coat layer coating film
( I I I) 上記ハードコート層上に、 ラジカル重合性化合物 (〇 1) を含 む耐擦傷層形成用組成物を塗布して耐擦傷層塗膜を形成する工程 (IIII) A step of forming a scratch-resistant coating film by applying a composition for scratch-resistant layer formation containing a radically polymerizable compound (○ 1) on the hard coat layer.
( I V) 上記耐擦傷層塗膜を硬化することにより耐擦傷層を形成する工程 [0246] -工程 (丨) 一 (IV) Step of forming the scratch resistant layer by curing the scratch resistant layer coating film [0246]-Step ()
工程 (丨) は、 基材上にカチオン重合性基を有するポリオルガノシルセス キオキサン (3 1) 、 及び、 フッ素原子を含有する基とカチオン重合性基と ラジカル重合性基とを有するポリマー (3) を含むハードコート層形成用組 成物を塗布してハードコート層塗膜を設ける工程である。 The step () is a polyorganosylsesquioxane (3 1) having a cationically polymerizable group on the substrate, and a polymer (3) having a fluorine atom-containing group, a cationically polymerizable group and a radically polymerizable group. Is applied to form a hard coat layer-forming composition to form a hard coat layer coating film.
基材、 ポリオルガノシルセスキオキサン (3 1) 、 ポリマー (3) 及びハ —ドコート層形成用組成物については前述したとおりである。 The base material, polyorganosilsesquioxane (31), polymer (3) and composition for forming a hard coat layer are as described above.
[0247] ハードコート層形成用組成物の塗布方法としては、 特に限定されず公知の 方法を用いることができる。 例えば、 ディップコート法、 エアーナイフコー 卜法、 力ーテンコート法、 口ーラーコート法、 ワイヤーバーコート法、 グラ ビアコート法、 ダイコート法等が挙げられる。 [0247] The method of applying the composition for forming a hard coat layer is not particularly limited, and a known method can be used. Examples thereof include a dip coating method, an air knife coating method, a force-ten coating method, a mouth roller coating method, a wire bar coating method, a gravure coating method and a die coating method.
[0248] -工程 (丨 丨) 一 [0248] -Process (丨丨) one
工程 (丨 丨) は、 上記ハードコート層塗膜を硬化することによりハードコ —卜層を形成する工程である。 なお、 ハードコート層塗膜を硬化するとは、 ハードコート層塗膜に含まれるポリオルガノシルセスキオキサン (8 1) 及 びポリマー (3) のカチオン重合性基の少なくとも一部を重合反応させるこ とをいう。 〇 2020/175337 73 卩(:171? 2020 /006912 The step (丨丨) is a step of forming a hard coat layer by curing the hard coat layer coating film. Curing the hard coat layer coating means that at least a part of the cationically polymerizable groups of the polyorganosilsesquioxane (81) and polymer (3) contained in the hard coat layer coating is polymerized. Say. 〇 2020/175 337 73 卩 (:171? 2020 /006912
[0249] ハードコート層塗膜の硬化は、 電離放射線の照射又は加熱に行われること が好ましい。 [0249] The hard coat layer coating film is preferably cured by irradiation with ionizing radiation or heating.
[0250] 電離放射線の種類については、 特に制限はなく、 X線、 電子線、 紫外線、 可視光、 赤外線などが挙げられるが、 紫外線が好ましく用いられる。 例えば ハードコート層塗膜が紫外線硬化性であれば、 紫外線ランプにより 1 〇 」
Figure imgf000074_0001
して硬化性化合物を 半硬化するのが好ましい。 5 0〇1」/〇 111 2〜 1 8 0 0
Figure imgf000074_0002
[0250] The type of ionizing radiation is not particularly limited, and examples thereof include X-rays, electron beams, ultraviolet rays, visible light, and infrared rays, and ultraviolet rays are preferably used. For example, if the coating film of the hard coat layer is UV curable, it can be treated with a UV lamp to measure 10".
Figure imgf000074_0001
Then, the curable compound is preferably semi-cured. 5 0_Rei_1 "/ 〇 111 2 to 1 8 0 0
Figure imgf000074_0002
とがより好ましく、
Figure imgf000074_0003
5 0 0
Figure imgf000074_0004
であることが 更に好ましい。 紫外線ランプ種としては、 メタルハライ ドランプや高圧水銀 ランプ等が好適に用いられる。
And more preferred,
Figure imgf000074_0003
5 0 0
Figure imgf000074_0004
Is more preferable. A metal halide lamp, a high-pressure mercury lamp, or the like is preferably used as the UV lamp type.
[0251 ] 熱により硬化する場合、 温度に特に制限はないが、 8 0 °〇以上 2 0 0 °〇以 下であることが好ましく、 1 0 0 °〇以上 1 8 0 °〇以下であることがより好ま しく、 1 2 0 °0以上1 6 0 °◦以下であることがさらに好ましい。 [0251] It the case of curing by heat is not particularly limited to the temperature, it is 2 0 0 ° 〇 hereinafter 8 0 ° ● As preferably, 1 8 0 ° 〇 below 1 0 0 ° ● As Is more preferable, and it is further preferable that it is not less than 120° 0 and not more than 160°°.
[0252] 硬化時の酸素濃度は 0 ~ 1 . 0体積%であることが好ましく、 0〜〇. 1 体積%であることが更に好ましく、 0〜〇. 0 5体積%であることが最も好 ましい。 [0252] The oxygen concentration during curing is preferably 0 to 1.0% by volume, more preferably 0 to 0. 1% by volume, and most preferably 0 to 0. 05% by volume. Good
[0253] —工程 (丨 丨 丨) 一 [0253] — Process (丨丨丨) one
工程 (丨 丨 丨) は、 上記ハードコート層上に、 ラジカル重合性化合物 (〇 1) を含む耐擦傷層形成用組成物を塗布して耐擦傷層塗膜を形成する工程で ある。 The step (丨丨丨) is a step of forming a scratch-resistant layer coating film by applying the scratch-resistant layer forming composition containing the radically polymerizable compound (○ 1) on the hard coat layer.
ラジカル重合性化合物 (〇 1) 、 及び耐擦傷層形成用組成物については前 述したとおりである。 The radical polymerizable compound (○ 1) and the composition for forming a scratch resistant layer are as described above.
[0254] 耐擦傷層形成用組成物の塗布方法としては、 特に限定されず公知の方法を 用いることができる。 例えば、 ディップコート法、 エアーナイフコート法、 力ーテンコート法、 口ーラーコート法、 ワイヤーバーコート法、 グラビアコ —卜法、 ダイコート法等が挙げられる。 [0254] The method for applying the composition for forming a scratch resistant layer is not particularly limited, and a known method can be used. For example, the dip coating method, the air knife coating method, the force-ten coating method, the mouth-roller coating method, the wire bar coating method, the gravure coating method, the die coating method and the like can be mentioned.
[0255] _工程 ( I V) - 工程 (丨 V) は、 上記耐擦傷層塗膜を硬化することにより耐擦傷層を形成 〇 2020/175337 74 卩(:171? 2020 /006912 [0255] _ step (IV)-step (丨 V) forms a scratch resistant layer by curing the above scratch resistant layer coating film 〇 2020/175 337 74 卩 (:171? 2020 /006912
する工程である。 It is a process to do.
[0256] 耐擦傷層塗膜の硬化は、 電離放射線の照射又は加熱に行われることが好ま しい。 電離放射線の照射及び加熱については、 工程 (丨 丨) において記載し たものと同様である。 なお、 耐擦傷層塗膜を硬化するとは、 耐擦傷層塗膜に 含まれるラジカル重合性化合物 (〇 1) のラジカル重合性基の少なくとも一 部を重合反応させることをいう。 [0256] Curing of the scratch resistant layer coating is preferably performed by irradiation with ionizing radiation or heating. Irradiation and heating of ionizing radiation are the same as those described in the process (丨丨). The curing of the scratch resistant layer coating means a polymerization reaction of at least a part of the radical polymerizable group of the radical polymerizable compound (O 1) contained in the scratch resistant layer coating.
[0257] 本発明では、 上記工程 (丨 丨) において、 ハードコート層塗膜を半硬化さ せることが好ましい。 すなわち、 工程 (丨 丨) においてハードコート層塗膜 を半硬化させ、 次いで、 工程 (丨 丨 丨) では、 半硬化されたハードコート層 上に耐擦傷層形成用組成物を塗布して耐擦傷層塗膜を形成し、 次いで、 工程 ( I V) では、 耐擦傷層塗膜を硬化するとともに、 ハードコート層の完全硬 化を行うことが好ましい。 ここで、 ハードコート層塗膜を半硬化させるとは 、 ハードコート層塗膜に含まれるポリオルガノシルセスキオキサン (8 1) 及びポリマー (3) のカチオン重合性基のうち一部のみを重合反応させるこ とをいう。 ハードコート層塗膜の半硬化は、 電離放射線の照射量や、 加熱の 温度及び時間を調節することにより行うことができる。 [0257] In the present invention, it is preferable that the coating film of the hard coat layer is semi-cured in the above step (丨丨). That is, in the step (丨丨), the hard coat layer coating film is semi-cured, and then in the step (丨丨丨), the scratch-resistant layer forming composition is applied on the semi-cured hard coat layer. It is preferable to form a layer coating film, and then in step (IV), the scratch-resistant layer coating film is cured and the hard coat layer is completely cured. Here, to semi-cure the hard coat layer coating means to polymerize only part of the cationically polymerizable groups of the polyorganosilsesquioxane (81) and polymer (3) contained in the hard coat layer coating. It means to react. The semi-curing of the coating film of the hard coat layer can be carried out by adjusting the irradiation dose of ionizing radiation and the heating temperature and time.
[0258] 工程 (丨) と工程 (丨 丨) の間、 工程 (丨 丨) と工程 (丨 丨 丨) の間、 エ 程 (丨 丨 丨) と工程 (丨 V) の間、 又は工程 (丨 V) の後に、 必要に応じて 乾燥処理を行ってもよい。 乾燥処理は、 温風の吹き付け、 加熱炉内への配置 、 加熱炉内での搬送、 ハードコート層及び耐擦傷層が設けられていない面 ( 基材面) からの口ーラーでの加熱等により行うことができる。 加熱温度は、 溶媒を乾燥除去できる温度に設定すればよく、 特に限定されるものではない 。 ここで加熱温度とは、 温風の温度または加熱炉内の雰囲気温度をいうもの とする。 [0258] Between process (丨) and process (丨丨), between process (丨丨) and process (丨丨丨), between process (丨丨丨) and process (丨V), or process ( After V), a drying process may be performed if necessary. Drying is performed by blowing warm air, placing in a heating furnace, transporting in a heating furnace, heating with a roller from the surface (base material surface) where the hard coat layer and scratch resistant layer are not provided. It can be carried out. The heating temperature may be set to a temperature at which the solvent can be dried and removed, and is not particularly limited. Here, the heating temperature means the temperature of warm air or the ambient temperature in the heating furnace.
[0259] 本発明の積層体は、 耐擦傷性及び繰り返し折り曲げ耐性に優れ、 かつ白化 が少ないものであり、 例えば、 光学フィルム (好ましくはハードコートフィ ルム) として用いることができる。 また、 本発明の積層体は、 画像表示装置 の表面保護フィルムとして用いることができ、 例えば、 フォルダブルデバイ 〇 2020/175337 75 卩(:171? 2020 /006912 [0259] The laminate of the present invention is excellent in scratch resistance and resistance to repeated bending and has little whitening, and can be used, for example, as an optical film (preferably a hard coat film). Further, the laminate of the present invention can be used as a surface protective film of an image display device, and for example, a folderable device 〇 2020/175 337 75 卩 (:171? 2020 /006912
ス (フォルダブルディスプレイ) の表面保護フィルムとして用いることがで きる。 フォルダブルデバイスとは、 表示画面が変形可能であるフレキシブル ディスプレイを採用したデバイスのことであり、 表示画面の変形性を利用し てデバイス本体 (ディスプレイ) を折りたたむことが可能である。 It can be used as a surface protection film for a display (foldable display). A folderable device is a device that employs a flexible display whose display screen can be deformed, and the device itself (display) can be folded using the deformability of the display screen.
フォルダブルデバイスとしては、 例えば、 有機エレクトロルミネッセンス デバイスなどが挙げられる。 Examples of foldable devices include organic electroluminescent devices.
[0260] 本発明は、 本発明の積層体を備えた物品、 及び本発明の積層体を表面保護 フィルムとして備えた画像表示装置にも関する。 [0260] The present invention also relates to an article provided with the laminate of the present invention, and an image display device provided with the laminate of the present invention as a surface protective film.
実施例 Example
[0261] 以下、 実施例により本発明を更に具体的に説明するが、 本発明の範囲はこ れによって限定して解釈されるものではない。 [0261] Hereinafter, the present invention will be described in more detail with reference to Examples, but the scope of the present invention should not be construed as being limited thereto.
[0262] <基材の作製> [0262] <Production of base material>
(ポリイミ ド粉末の製造) (Production of polyimide powder)
攪拌器、 窒素注入装置、 滴下漏斗、 温度調節器及び冷却器を取り付けた 1 !_の反応器に、 窒素気流下、 1\1, 1\1—ジメチルアセトアミ ド (01\/1八〇) 8 329を加えた後、 反応器の温度を 25 °〇にした。 ここに、 ビストリフルオ ロメチルべンジジン (丁 〇巳) 64. 0469 (〇. 2〇1〇 丨) を加えて 溶解した。 得られた溶液を 25°〇に維持しながら、 2, 2—ビス (3, 4— ジカルボキシフエニル) ヘキサフルオロプロパンニ無水物 (6 0八) 3 1 . 099 (〇. 07〇1〇 1) とビフエニルテトラカルボン酸二無水物 (巳 〇八) 8. 839 (〇. 03 〇 1) を投入し、 一定時間撹拌して反応させ た。 その後、 塩化テレフタロイル (丁 〇) 20. 3029 (0. 1 〇1〇 1 ) を添加して、 固形分濃度 1 3質量%のポリアミック酸溶液を得た。 次いで 、 このポリアミック酸溶液にピリジン 25. 69、 無水酢酸 33. 1 9を投 入して 30分撹拌し、 さらに 70°〇で 1時間撹拌した後、 常温に冷却した。 ここにメタノール 20 !_を加え、 沈澱した固形分を濾過して粉砕した。 その 後、 1 00°〇下、 真空で 6時間乾燥させて、 1 1 1 9のポリイミ ド粉末を得 た。 〇 2020/175337 76 卩(:171? 2020 /006912 In a 1 !_ reactor equipped with a stirrer, a nitrogen injection device, a dropping funnel, a temperature controller and a cooler, under a nitrogen stream, 1\1, 1\1—dimethylacetamide (01\/1880) ) After adding 8329, the reactor temperature was brought to 25 °. Here, bis a trifluoromethyl base Njijin (Ding 〇 Yoshimi) was dissolved 64.046 9 (〇. 2_Rei_1_rei丨) was added. While maintaining the resulting solution at 25° 〇, 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride (60 8) 3 1.09 9 (0.07 〇 1 〇 1) and Biff enyl dianhydride (snake 〇 eight) 8.83 9 (〇. 03 〇 1) was charged, followed by reaction under stirring a certain time. Then, terephthaloyl chloride (Cho) 20.3029 (0.10110) was added to obtain a polyamic acid solution having a solid content concentration of 13 mass %. Then, the polyamic acid solution in pyridine 25.6 9, acetic anhydride 33.1 9 was stirred for 30 minutes and projecting ON, followed by stirring for 70 ° ● Among 1 hour and cooled to room temperature. Methanol 20 !_ was added thereto, and the precipitated solid content was filtered and ground. After that, it was dried under vacuum at 100 ° C. for 6 hours to obtain a polyimide powder of 111. 〇 2020/175 337 76 卩 (:171? 2020 /006912
[0263] (基材3- 1の作製) [0263] (Preparation of substrate 3-1)
1 009の上記ポリイミ ド粉末を 6709の 1\1, 1\1 -ジメチルアセトアミ ド (01\/1八〇) に溶かして 1 3質量%の溶液を得た。 得られた溶液をステン レス板に流延し、 1 30°〇の熱風で 30分乾燥させた。 その後フィルムをス テンレス板から剥離して、 フレームにピンで固定し、 フィルムが固定された フレームを真空才ーブンに入れ、 1 00°〇から 300°〇まで加熱温度を徐々 に上げながら 2時間加熱し、 その後、 徐々に冷却した。 冷却後のフィルムを フレームから分離した後、 最終熱処理工程として、 さらに 300°〇で 30分 間熱処理して、 ポリイミ ドフィルムからなる、 厚み 3〇 の基材3— 1 を 得た。 1009 of the above polyimide powder was dissolved in 6709 of 1\1,1\1-dimethylacetamide (01\/1880) to obtain a 13 mass% solution. The resulting solution was cast on a stainless plate and dried with hot air at 1300 ° for 30 minutes. After that, peel off the film from the stainless steel plate, fix it to the frame with pins, put the frame with the film fixed in a vacuum oven, and heat it for 2 hours while gradually raising the heating temperature from 100° 〇 to 300° 〇. And then gradually cooled. After the cooled film was separated from the frame, as a final heat treatment step, it was further heat-treated at 300 ° C. for 30 minutes to obtain a substrate 3-1 having a thickness of 30 and composed of a polyimide film.
[0264] <ポリオルガノシルセスキオキサン (3 1) の合成> [0264] <Synthesis of Polyorganosilsesquioxane (31)>
(化合物 (八) の合成) (Synthesis of Compound (8))
温度計、 攪拌装置、 還流冷却器、 及び窒素導入管を取り付けた 1 000ミ リリッ トルのフラスコ (反応容器) に、 窒素気流下で 2 _ (3, 4—エポキ シシクロヘキシル) エチルトリメ トキシシラン 300ミリモル (73. 99 ) 、 トリエチルアミン7. 399、
Figure imgf000077_0001
(メチルイソプチルケトン ) 3709を混合し、 純水 73. 99を、 滴下口一卜を使用して 30分かけ て滴下した。 この反応液を 80°〇に加熱し、 重縮合反応を窒素気流下で 1 0 時間行った。
In a 1 000 milliliter flask (reaction vessel) equipped with a thermometer, a stirrer, a reflux condenser, and a nitrogen introduction tube, 2_(3,4-epoxycyclohexyl)ethyltrimethoxysilane 300 mmol ( 73.99), triethylamine 7.399,
Figure imgf000077_0001
(Methyl isobutyl heptyl ketone) were mixed 370 9, purified water 73.99, was added dropwise over 30 minutes using a dropping port one Bok. The reaction solution was heated to 80 ° and the polycondensation reaction was carried out for 10 hours under a nitrogen stream.
その後、 反応溶液を冷却し、 5質量%食塩水 3009を添加し、 有機層を 抽出した。 有機層を 5質量%食塩水 3009、 純水 3009で 2回、 順次洗 浄した後、 1 1~19、 50°〇の条件で濃縮し、 固形分濃度 59. 8質量% の IV! I 巳 溶液として無色透明の液状の生成物 {脂環式エポキシ基を有する ポリオルガノシルセスキオキサン (3 1) である化合物 (八) (一般式 (1 ) 中の [¾匕 : 2 - (3, 4 -エポキシシクロヘキシル) エチル基、 = 1 0 0、 「= 0である化合物) } を87. 09得た。 Then, the reaction solution was cooled, 5 mass% saline solution 3009 was added, and the organic layer was extracted. The organic layer was sequentially washed with 5% by mass saline solution 3009 and pure water 3009 twice, and then concentrated under the conditions of 1 to 19 and 50°○ to obtain IV! I at a solid concentration of 59.8% by mass. A colorless and transparent liquid product as a solution {Compound (8) which is a polyorganosilsesquioxane (3 1) having an alicyclic epoxy group (in the general formula (1) [¾: 2-(3, 4 - epoxycyclohexyl) ethyl group, = 1 0 0, the "= 0, compound)} to give 87.0 9.
生成物を分析したところ、 数平均分子量は 2050であり、 分子量分散度 は·! . 9であった。 〇 2020/175337 77 卩(:171? 2020 /006912 When the product was analyzed, the number average molecular weight was 2050, and the molecular weight dispersity was! It was .9. 〇 2020/175 337 77 卩(:171? 2020/006912
なお、 1 01011~19は約 1 33. 322 P aである。 It should be noted that 1 0101 1 to 19 is about 133.322 Pa.
[0265] <ポリマ _ (3) の合成> [0265] <Synthesis of Polymer _ (3)>
( (3X 1 — 1 ) で表されるポリマーの合成) (Synthesis of polymer represented by (3X 1 — 1 ))
トリメ トキシ
Figure imgf000078_0001
1 1~1, 21~1, 2 !!-トリデカフルオロー n -オクチ ル) シラン 30ミリモル ( 1 4. 059) 、 2 _ (3, 4—エポキシシクロ ヘキシル) エチルトリメ トキシシラン 1 35ミリモル (33. 269) 、 ア クリル酸 3 - (トリメ トキシシリル) プロピル 1 35ミリモル ( 3 1. 63 9) 、 トリエチルアミン7. 399、
Figure imgf000078_0002
(メチルイソプチルケト ン) 3709を混合し、 純水 73. 99を、 滴下口一卜を使用して 30分か けて滴下した。 この反応液を 50°〇に加熱し、 重縮合反応を 1 0時間行った 〇
Trimethoxy
Figure imgf000078_0001
1 1 ~ 1, 21 ~ 1, 2 !!-Tridecafluoro-n-octyl) silane 30 mmol (1 4.059), 2 _ (3, 4-epoxycyclohexyl) ethyltrimethoxysilane 1 35 mmol (33 .269), 3-(trimethyloxysilyl)propyl acrylate 1 35 mmol (3 1. 639), triethylamine 7.399,
Figure imgf000078_0002
(Methyl isobutyl heptyl ketone) were mixed 370 9, purified water 73.99, was added dropwise 30 minutes or only by using a dropping port one Bok. The reaction solution was heated to 50 ° and polycondensation reaction was carried out for 10 hours.
その後、 反応溶液を冷却し、 5質量%食塩水 3009を添加し、 有機層を 抽出した。 有機層を 5質量%食塩水 3009、 純水 3009で 2回、 順次洗 浄した後、 30 1~19、 50°〇の条件で濃縮し、 固形分濃度 52質量%の IV! 丨 巳<溶液として無色透明の液状の生成物である下記式 (3乂 1 _ 1 ) で 表されるポリマー (ポリオルガノシルセスキオキサン) を得た。 Then, the reaction solution was cooled, 5 mass% saline solution 3009 was added, and the organic layer was extracted. The organic layer was sequentially washed twice with 5 wt% saline solution 3009 and pure water 3009 twice, and then concentrated under the conditions of 30 1 to 19 and 50° 〇, and IV! 丳 <solution with a solid concentration of 52 wt% As a result, a polymer (polyorganosilsesquioxane) represented by the following formula (3 1 1 — 1) which is a colorless and transparent liquid product was obtained.
[0266] 上記で得られたポリマー 5
Figure imgf000078_0003
9を重クロロホルム〇. 5 1_に溶解させ、
Figure imgf000078_0004
(株式会社日立 ハイテクサイエンス製) で測定を行った。 結果を以下に示す。
Figure imgf000078_0005
[0266] Polymer 5 obtained above
Figure imgf000078_0003
Dissolve 9 in deuterated chloroform 0.51_,
Figure imgf000078_0004
(Manufactured by Hitachi High-Tech Science Co., Ltd.). The results are shown below.
Figure imgf000078_0005
1 1 1 ) アクリル部〇1~12 =〇1~1〇〇2) , 55. 7 -5. 9 (〇1, ( 1 1 1 ) アクリル部〇1~12 =〇1~1〇〇2) , 54. 0-4. 2 ( , ( 1 1 1 ) アク リル部の隣〇1~12 =〇1~1〇〇2〇1~12) , 53. 0-3. 2 (〇1, ( I I ) エポ キシ部CH〇CH) , 5 1. 8-2. 3
Figure imgf000078_0006
( I ) フッ素の隣〇6 13〇1~1
1 1 1) Acrylic section Rei_1 ~ 1 2 = Rei_1 ~ 1_Rei_rei 2), 55.7 -5. 9 (Rei_1, (1 1 1) Acrylic section Rei_1 ~ 1 2 = Rei_1 ~ 1_Rei 〇 2), 54. 0-4. 2 (, (1 1 1) next to the Aku Lil part Rei_1 to 1 2 = Rei_1 - 1_Rei_rei 2 Rei_1 to 1 2), 53. 0-3. 2 (〇 1, (II) Epoxy part CH 〇 CH), 5 1. 8-2. 3
Figure imgf000078_0006
(I) Next to fluorine 〇 6 13 〇 1 ~ 1
2〇 1~12) , 5 1. 6 - 1. 8 ( , ( 1 1 1 ) シリル基の隣〇1~123 1 ) , 5 1. 〇- 1. 5 (〇!, ( I I ) 脂環部〇61~16) , 50. 8- 1. 0 ( , ( 2 ○ 1 ~ 1 2 ), 5 1. 6-1. 8 (, (1 1 1) next to silyl group ○ 1 ~ 1 2 3 1 ), 5 1. 〇-1.5 (〇!, (II ) Alicyclic part 〇 6 1 to 1 6 ), 50. 8- 1. 0 (, (
I ) シリル基の隣〇6 13〇1~12〇1~123 1 ) , 50. 4-0. 8 ( , ( I I 〇 2020/175337 78 卩(:171? 2020 /006912 I) Adjacent to silyl group 〇 6 13 〇 1 ~ 1 2 〇 1 ~ 1 2 3 1 ), 50.4-0. 8 (, (II 〇 2020/175 337 78 卩(:171? 2020/006912
) & ( I I I) メチレン部〇 1~12〇 1~12〇 1~123 1) . ) & (III) Methylene part ○ 1 ~ 1 2 ○ 1 ~ 1 2 ○ 1 ~ 1 2 3 1).
[0267] 上記 (3X 1 — 1) で表されるポリマーの合成において、 各モノマーの使 用量を変更することで、 各構成単位の含有モル比率を変更したポリマー ( ( 3X 1 -2) 、 (3X 1 -3) 、 (3X 1 -4) 、 (3X 1 -5) 、 (3 X
Figure imgf000079_0001
(3乂 1 -[¾ 2) 、 (3乂 1 -[¾3) ) を合成した。
[0267] In the synthesis of the polymer represented by (3X 1 — 1) above, by changing the amount of each monomer used, the molar ratio of the constituent units is changed ((3X 1 -2), ( 3X 1 -3), (3X 1 -4), (3X 1 -5), (3 X
Figure imgf000079_0001
(3 1-[¾ 2) and (3 1-[¾ 3)) were synthesized.
[0268] 上記 (3X 1 — 1) で表されるポリマーの合成において、 2— (3, 4— エポキシシクロヘキシル) エチルトリメ トキシシランを 3—グリシジルオキ シプロピルトリメ トキシシランに変更し、 さらに各モノマーの使用量を変更 して、 (3X4— 1) で表されるポリマーを合成した。 [0268] In the synthesis of the polymer represented by (3X 1 — 1) above, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane was changed to 3-glycidyloxypropyltrimethoxysilane, and the amount of each monomer used was changed. Was changed to synthesize the polymer represented by (3X4-1).
[0269] 上記 (3X 1 — 1) で表されるポリマーの合成において、 アクリル酸 3— (トリメ トキシシリル) プロピルをアクリル酸 3— (トリメ トキシシリル) オクチルに変更し、 さらに各モノマーの使用量を変更して、 (3X5— 1) で表されるポリマーを合成した。 [0269] In the synthesis of the polymer represented by (3X 1 — 1) above, 3-(trimethoxysilyl)propyl acrylate was changed to 3-(trimethoxysilyl)octyl acrylate, and the amount of each monomer used was changed. Then, a polymer represented by (3X5-1) was synthesized.
[0270] 上記 (3X 1 - 1) で表されるポリマーの合成において、 トリメ トキシ ( [0270] In the synthesis of the polymer represented by the above (3X 1-1), trimethoxy (
1 1~1, 1 1~1, 21~1, 2 !!-トリデカフルオロー n -オクチル) シランをトリ メ トキシ
Figure imgf000079_0002
1 1~1, 21~1, 21~1_ノナフルオロー n _ヘキシル) シラン に変更し、 さらに各モノマーの使用量を変更して、 (3X2— 1) で表され るポリマーを合成した。
1 1 ~ 1, 1 1 ~ 1, 21 ~ 1, 2 !!-Tridecafluoro-n-octyl) silane
Figure imgf000079_0002
1 1 ~ 1, 21 ~ 1, 21 ~ 1_ nonafluoro-n _ hexyl) The polymer represented by (3X2-1) was synthesized by changing to silane and changing the amount of each monomer used.
[0271] 上記 (3X 1 - 1) で表されるポリマーの合成において、 トリメ トキシ ( [0271] In the synthesis of the polymer represented by the above (3X 1-1), trimethoxy (
1 1~1, 1 1~1, 21~1, 2 !!-トリデカフルオロー n -オクチル) シランをトリ メ トキシ
Figure imgf000079_0003
1 1~1, 21~1, 2 !!—ヘプタデカフルオロー n—デシル) シ ランに変更し、 さらに各モノマーの使用量を変更して、 (3X3— 1) で表 されるポリマーを合成した。
1 1 ~ 1, 1 1 ~ 1, 21 ~ 1, 2 !!-Tridecafluoro-n-octyl) silane
Figure imgf000079_0003
1 1 ~ 1, 21 ~ 1, 2 !!—Heptadecafluoro-n-decyl) Silane, and the amount of each monomer used was changed to synthesize the polymer represented by (3X3-1) did.
層間密着剤として使用した各ポリマーの構造を以下に示す。 各ポリマーの 分子量 (1\/1 ) 及び分散度 (Mw/Mn) は下記表 1 に示した。 下記構造式 において、 「3 丨 〇 5」 は、 シルセスキオキサン単位を表す。 The structure of each polymer used as the interlayer adhesive is shown below. The molecular weight (1\/1) and dispersity (Mw/ Mn ) of each polymer are shown in Table 1 below. In the structural formula below, “3 0 5 ” represents a silsesquioxane unit.
[0272] 〇 2020/175337 79 2020 /006912[0272] 〇 2020/175 337 79 2020 /006912
[化 30][Chemical 30]
Figure imgf000080_0001
Figure imgf000080_0002
Figure imgf000080_0003
Figure imgf000080_0004
Figure imgf000080_0001
Figure imgf000080_0002
Figure imgf000080_0003
Figure imgf000080_0004
[0273] \¥02020/175337 80 卩(:17 2020 /006912[0273] \¥02020/175 337 80 卩(: 17 2020 /006912
[化 31][Chemical 31]
Figure imgf000081_0002
Figure imgf000081_0003
Figure imgf000081_0004
Figure imgf000081_0001
Figure imgf000081_0002
Figure imgf000081_0003
Figure imgf000081_0004
Figure imgf000081_0001
[0274] [0274]
〇 2020/175337 81 卩(:171? 2020 /006912〇 2020/175 337 81 卩 (: 171? 2020 /006912
[化 32]
Figure imgf000082_0001
[Chemical 32]
Figure imgf000082_0001
Figure imgf000082_0002
Figure imgf000082_0002
[0275]
Figure imgf000083_0001
[0275]
Figure imgf000083_0001
\¥02020/175337 83 2020 /006912 \\02020/175 337 83 2020/006912
[化 34] [Chemical 34]
Figure imgf000084_0002
Figure imgf000084_0002
[0277] [実施例 1 ] [0277] [Example 1]
<ハードコート層形成用組成物の調製> <Preparation of composition for forming hard coat layer>
(ハードコート層形成用組成物 1~10— 1) (Composition for forming hard coat layer 1 to 10-1)
上記化合物 (八) を含有する IV! I 巳 溶液に、 層間密着剤 (3X 1 — 1) Interlayer adhesive (3X 1 — 1) was added to IV! I, a solution containing the above compound (8).
Figure imgf000084_0001
(メチルイソプチルケトン) を添加し、 各含有成分の含有量を以下のように調整し、 ミキシングタンクに投入、 攪拌 した。 得られた組成物を孔径〇. 45 のポリプロピレン製フィルターで 濾過し、 ハードコート層形成用組成物!~1〇_ 1 とした。
,
Figure imgf000084_0001
(Methyl isoptyl ketone) was added, the content of each contained component was adjusted as follows, and the mixture was put into a mixing tank and stirred. The composition obtained was filtered through a polypropylene filter having a pore size of 0.45 to give a composition for forming a hard coat layer! ~ 10_1.
[0278] 化合物 (八) の IV! I 巳 溶液 (固形分濃度 59. 8質量%) [0278] IV! I solution of compound (8) (concentration of solid content: 59.8 mass%)
82. 1質量部 層間密着剤 (3X 1 — 1) の IV! I 巳 溶液 (固形分濃度 52質量%) 82.1 parts by mass IV! I solution of interlayer adhesive (3X 1 — 1) (solid concentration 52% by mass)
〇. 2質量部○ 0.2 parts by mass
〇 丨 一 1 1 0 1 3. 0質量部 〇 丨 1 1 0 1 3.0 Mass part
4. 6質量部 4.6 parts by mass
[0279] なお、 〇 丨 一 1 1 〇 は、 サンアプロ株式会社製の光カチオン重合開始 剤 (固形分濃度 50質量%) である。 [0279] Note that 〇丨一111 is the start of photocationic polymerization by San-Apro Co., Ltd. It is an agent (solid content concentration 50% by mass).
[0280] <耐擦傷層形成用組成物の調製> <Preparation of Scratch Resistant Layer-Forming Composition>
(耐擦傷層形成用組成物
Figure imgf000085_0001
(Scratch resistant layer forming composition
Figure imgf000085_0001
下記に記載の組成で各成分をミキシングタンクに投入、 攪拌し、 孔径〇. Add each component with the composition described below to a mixing tank, stir, and mix the pore size ○.
Figure imgf000085_0003
Figure imgf000085_0003
メチルエチルケトン 300. 0質量部 Methyl ethyl ketone 300.0 parts by mass
[0281] なお、 耐擦傷層形成用組成物中に用いた化合物は以下のとおりである。 [0281] The compounds used in the composition for forming a scratch resistant layer are as follows.
D P l·\A : ジペンタエリスリ トールペンタアクリ レートとジペンタエリス リ トールへキサアクリ レートの混合物、 日本化薬 (株) 製 D P l·\A: A mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.
イルガキュア 1 27 ( 1
Figure imgf000085_0002
1 27) : ラジカル光重合開始剤、 巳八3 社製
Irgacure 1 27 (1
Figure imgf000085_0002
1 27): Radical photopolymerization initiator, manufactured by Miwahachi 3
RS- 90 :滑り剤、 D I C (株) 製 RS- 90: Lubricant, manufactured by DIC Corporation
[0282] (積層体 (ハードコートフィルム) の製造) [0282] (Production of laminated body (hard coat film))
厚さ 3〇 mのポリイミ ド基材 S _ 1上に上記ハードコート層形成用組成 物 HC- 1 をワイヤーパー# 1 8を用いて、 硬化後の膜厚が 1 8 Mmとなる ようにパー塗布し、 基材上にハードコート層塗膜を設けた。 The hard coat layer forming composition HC-1 was applied onto a polyimide base material S _ 1 having a thickness of 30 m using a wire par # 18 so that the film thickness after curing became 18 Mm. After coating, a hard coat layer coating film was provided on the substrate.
次いで、 ハードコート層塗膜を 1 20°Cで 1分間乾燥した後、 25°C、 酸 素濃度 1 00 p p m (p a r t s p e r m i l l i o n) の条件にて空 冷水銀ランプを用いて、 照度 1 8 m W/ c m 2、 照射量 1 9 m J / c m 2の紫 外線を照射した。 このようにしてハードコート層塗膜を半硬化した。 Then, the hard coat layer coating film was dried at 120°C for 1 minute, and then the illuminance was 18 mW/ Irradiation with an ultraviolet ray having a dose of cm 2 and an irradiation dose of 19 mJ/cm 2 was performed. In this way, the hard coat layer coating film was semi-cured.
その後、 半硬化されたハードコート層塗膜上に、 耐擦傷層形成用組成物 S R- 1 をダイコーターを用いて、 硬化後の膜厚が 0. 8 ^mとなるように塗 布した。 Then, on the semi-cured hard coat layer coating, the scratch-resistant layer forming composition S R-1 was applied using a die coater so that the film thickness after curing would be 0.8 ^m. ..
次いで、 得られた積層体を 1 20°◦で 1分間乾燥した後、 25°0, 酸素濃 〇 2020/175337 85 卩(:171? 2020 /006912 Then, the obtained laminate was dried at 120°C for 1 minute, and then dried at 25°C and oxygen concentration. 〇 2020/175 337 85 卩 (:171? 2020 /006912
度 1 0 0 01、 照度 6 0 01 \/\//〇 01 2、 照射量
Figure imgf000086_0001
Degree 100 0 1, illuminance 6 00 01 \/\//〇 01 2 , irradiation amount
Figure imgf000086_0001
を照射し、 さらに 8 0 °〇、 酸素濃度 1 0 0 の条件にて空冷水銀ランプ を用いて、 で照度
Figure imgf000086_0002
照射量
Figure imgf000086_0003
And an air-cooled mercury lamp under the conditions of 80° and oxygen concentration of 100.
Figure imgf000086_0002
Irradiation amount
Figure imgf000086_0003
射することで、 ハードコート層塗膜及び耐擦傷層塗膜を完全硬化させた。 その後、 得られた積層体を 1 2 0 °〇 1時間熱処理することで、 基材上に、 ハードコート層と耐擦傷層を有する実施例 1の積層体 (ハードコートフィル ム) を得た。 By spraying, the hard coat layer coating film and the scratch resistant layer coating film were completely cured. Then, the obtained laminated body was heat-treated at 120 ° C. for 1 hour to obtain a laminated body of Example 1 (hard coat film) having a hard coat layer and a scratch resistant layer on a substrate.
[0283] [実施例 2〜 1 0、 比較例 1〜 7 ] [0283] [Examples 2 to 10, Comparative Examples 1 to 7]
用いる層間密着剤の種類及び含有率、 ハードコート層の膜厚、 並びに耐擦 傷層の膜厚を下記表 1 に記載したとおり変更した以外は、 実施例 1 と同様に して、 実施例 2〜 1 0、 比較例 1〜 7の積層体 (ハードコートフィルム) を それぞれ製造した。 Example 2 was repeated in the same manner as in Example 1 except that the type and content of the interlayer adhesive used, the film thickness of the hard coat layer, and the film thickness of the scratch resistant layer were changed as described in Table 1 below. ~ 10 and the laminates (hard coat films) of Comparative Examples 1 to 7 were manufactured.
[0284] [積層体 (ハードコートフィルム) の評価] [0284] [Evaluation of laminate (hard coat film)]
製造した各実施例及び比較例の積層体 (ハードコートフィルム) を、 以下 の方法によって評価した。 The produced laminates (hard coat films) of Examples and Comparative Examples were evaluated by the following methods.
[0285] (耐擦傷性) [0285] (Scratch resistance)
製造した各実施例及び比較例の積層体 (ハードコートフィルム) の耐擦傷 層の表面を、 ラビングテスターを用いて、 以下の条件で擦り試験を行うこと で、 耐擦傷性の指標とした。 The surface of the scratch resistant layer of each of the manufactured laminates (hard coat films) of Examples and Comparative Examples was subjected to a rubbing test using a rubbing tester under the following conditions to give an index of scratch resistance.
評価環境条件: 2 5 °0、 相対湿度 6 0 % Evaluation environmental conditions: 25 ° 0, relative humidity 60%
こすり材:スチールウール (日本スチールウール (株) 製、 グレード1\1〇 . # 0 0 0〇番) Scrubbing material: Steel wool (manufactured by Nippon Steel Wool Co., Ltd., Grade 1\1○.#00000)
試料と接触するテスターのこすり先端部 (2 0 01 X 2 0 01) に巻いて、 バ ンド固定
Figure imgf000086_0004
Wrap around the rubbing tip of the tester (2 01 X 200 1) that comes into contact with the sample, and fix the band.
Figure imgf000086_0004
先端部接触面積: 2〇 01 X 2〇 01 〇 2020/175337 86 卩(:171? 2020 /006912 Tip contact area: 20 X 01 X 201 〇 2020/175 337 86 卩 (:171? 2020 /006912
擦り回数:往復 1 〇回、 往復 1 〇〇回、 往復 1 0 0 0回 Number of rubs: round trip 10 times, round trip 100 times, round trip 100 times
試験後のハードコートフィルムの擦った面 (耐擦傷層の表面) とは逆側の 面 (基材の表面) に油性黒インキを塗り、 反射光で目視観察して、 スチール ウールと接触していた部分に傷が生じたときの擦り回数を計測し評価した。 八 :往復 1 0 0 0回擦った場合に傷が生じない After the test, apply oil-based black ink to the surface (the surface of the base material) opposite to the rubbed surface (the surface of the scratch-resistant layer) of the hard coat film, and visually observe it with reflected light to see that it is in contact with steel wool. The number of rubbing when scratches were formed on the damaged portion was measured and evaluated. Eighth: No scratches will occur when rubbed back and forth 100 times
巳 :往復 1 0 0回擦った場合に傷が生じないが、 往復 1 0 0 0回擦った場 合に傷が生じる Mami: No scratches when rubbing 100 times back and forth, but scratches when rubbing 100 times back and forth
〇 :往復 1 0回擦った場合に傷が生じないが、 往復 1 0 0回擦った場合に 傷が生じる ◯: No scratches when rubbing 100 times back and forth, but scratches when rubbing 100 times back and forth
口 :往復 1 0回擦った場合に傷が生じる Mouth: scratches when rubbed 10 times back and forth
[0286] (繰り返し折り曲げ耐性) [0286] (Resistance to repeated bending)
製造した各実施例及び比較例の積層体 (ハードコートフィルム) から幅 1
Figure imgf000087_0004
From the manufactured laminates (hard coat film) of Examples and Comparative Examples, width 1
Figure imgf000087_0004
を外側) にして繰り返し折り曲げ耐性の試験を行った。 使用した試験機は、 試料フィルムを直径 4
Figure imgf000087_0001
(円柱) の曲面に沿わせて曲げ角度 1 8 0 ° で長手方向の中央部分で折り曲げた後、 元に戻す (試料フィルムを広げる) という動作を 1回の試験とし、 この試験を繰り返し行うものである。 上記 1 8 0 ° 折り曲げ試験を 3 0万回繰り返し行った場合にクラックが発生しない ものを八とし、 クラックが発生したものを巳として評価した。 なお、 クラッ クの発生の有無は目視で評価した。
Was repeatedly set to the outer side) and the bending resistance test was repeated. The tester used was a sample film with a diameter of 4
Figure imgf000087_0001
After bending along the curved surface of (cylindrical) at a bending angle of 180° at the center in the longitudinal direction and then returning it to its original position (expanding the sample film), one test is repeated and this test is repeated. Is. When the above 180° bending test was repeated 300,000 times, the case where no crack was generated was evaluated as 8, and the case where a crack was generated was evaluated as Mami. The presence or absence of cracks was visually evaluated.
[0287] (フィルムの白化) [0287] (Whitening of film)
フィルムの白化は、 表面粗さ非接触三次元表面形状測定器 ( 6 「 I
Figure imgf000087_0002
a n (商品名) 、 (株) 菱化システム製) を用いて測定した表面粗さ
Figure imgf000087_0003
) で評価した。
The whitening of the film is performed with a surface roughness non-contact 3D surface profilometer (6 "I
Figure imgf000087_0002
Surface roughness measured using an (trade name), manufactured by Ryoka System Co., Ltd.
Figure imgf000087_0003
) Was evaluated.
表面 3が 8 0 01未満のものは八 (フィルムがクリアに視認できる) 、 表面 が 8 0 n mから 1 5 0 n m未満のものは巳 (フィルムが若干白化) 〇 2020/175337 87 卩(:171? 2020 /006912 Eight if the surface 3 is less than 8001 (the film is clearly visible), and if the surface 3 is less than 80 nm to 150 nm (the film is slightly whitened) 〇 2020/175 337 87 卩 (: 171? 2020 /006912
、 表面 が 1 5 0 n m以上のものは 0 (フィルムが白化) とした。 , Those with a surface of 150 nm or more were 0 (the film was whitened).
[0288] 下記表 1中、 層間密着剤の含有率 (質量%) は、 ハードコート層形成用組 成物の全固形分に対しての値である。 [0288] In Table 1 below, the content (% by mass) of the interlayer adhesive is a value based on the total solid content of the composition for forming a hard coat layer.
[0289] [0289]
〔¾二 [¾ji
Figure imgf000089_0001
Figure imgf000089_0001
\¥0 2020/175337 89 卩(:17 2020 /006912 \¥0 2020/175 337 89 卩 (: 17 2020 /006912
[0290] 表 1 に したとおり、 実施例 1〜 1 0の積層体 (ハードコートフィル厶) は、 耐擦傷性及び繰り返し折り曲げ耐性に優れ、 かつ白化が抑制されていた 産業上の利用可能性 [0290] As shown in Table 1, the laminates of Examples 1 to 10 (hard coat fill cases) had excellent scratch resistance and repeated bending resistance, and whitening was suppressed. Industrial applicability
[0291 ] 本発明によれば、 耐擦傷性及び繰り返し折り曲げ耐性に優れ、 かつ白化が 抑制された積層体、 上記積層体を備えた物品、 並びに画像表示装置を提供す ることができる。 [0291] According to the present invention, it is possible to provide a laminate having excellent scratch resistance and repeated bending resistance, and suppressing whitening, an article including the laminate, and an image display device.
[0292] 本発明を詳細にまた特定の実施態様を参照して説明したが、 本発明の精神 と範囲を逸脱することなく様々な変更や修正を加えることができることは当 業者にとって明らかである。 While the present invention has been described in detail and with reference to particular embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention.
本出願は、 2 0 1 9年 2月 2 7日出願の日本特許出願 (特願 2 0 1 9 - 3 4 9 5 5) に基づくものであり、 その内容はここに参照として取り込まれる This application is based on a Japanese patent application filed on Feb. 27, 1921 (Japanese Patent Application No. 2019-9-3495), the contents of which are incorporated herein by reference.

Claims

\¥02020/175337 90 卩(:17 2020 /006912 請求の範囲 \¥02020/175 337 90 卩(: 17 2020/006912 Claims
[請求項 1] 基材と、 ハードコート層と、 耐擦傷層とをこの順に有する積層体で あって、 [Claim 1] A laminate having a substrate, a hard coat layer, and a scratch resistant layer in this order,
前記ハードコート層は、 The hard coat layer is
カチオン重合性基を有するポリオルガノシルセスキオキサン (3 1 ) 、 及び A polyorganosilsesquioxane having a cationically polymerizable group (3 1), and
フッ素原子を含有する基と、 カチオン重合性基と、 ラジカル重合性 基とを有するポリマー (3) を含むハードコート層形成用組成物の硬 化物を含み、 A cured product of a composition for forming a hard coat layer containing a polymer (3) having a group containing a fluorine atom, a cationically polymerizable group, and a radically polymerizable group,
前記耐擦傷層は、 ラジカル重合性化合物 (〇 1) を含む耐擦傷層形 成用組成物の硬化物を含み、 The scratch-resistant layer contains a cured product of the scratch-resistant layer-forming composition containing a radically polymerizable compound (○ 1),
前記耐擦傷層を内側にして、 曲率半径 2 で 1 80° 折り曲げ試 験を 30万回繰り返し行った場合にクラックが発生せず、 かつ、No cracks were generated when the 180 ° bending test with a radius of curvature of 2 was repeated 300,000 times with the scratch resistant layer on the inside, and
#000〇番のスチールウールで 1
Figure imgf000091_0001
With #000 〇 steel wool 1
Figure imgf000091_0001
ら、 前記耐擦傷層の表面を往復 1 〇〇回擦った場合に傷が生じない、 積層体。 A laminate in which scratches do not occur when the surface of the scratch resistant layer is rubbed back and forth 100 times.
[請求項 2] 前記ポリマー ( 3) が、 ポリオルガノシルセスキオキサンである、 請求項 1 に記載の積層体。 2. The laminate according to claim 1, wherein the polymer (3) is polyorganosilsesquioxane.
[請求項 3] 前記ポリマ _ (3) が、 下記一般式 (3_ 1) で表される構成単位 、 下記 _般式 (3_2) で表される構成単位、 及び下記一般式 (3_ 3) で表される構成単位を有する、 請求項 2に記載の積層体。 [Claim 3] The polymer _ (3) is a structural unit represented by the following general formula (3_ 1), structural units represented by the following _ general formula (3_2), and the following general formula (3_ 3) The laminate according to claim 2, which has the structural unit represented.
[化 1] [Chemical 1]
Figure imgf000091_0002
Figure imgf000091_0002
(3-1) (3-2) (8-3) 〇 2020/175337 91 卩(:171? 2020 /006912 (3-1) (3-2) (8-3) 〇 2020/175 337 91 卩 (:171? 2020 /006912
一般式 (3 _ 1) 中、 1- 1は単結合又は 2価の連結基を表し、
Figure imgf000092_0001
はフッ素原子を含有する基を表す。
In the general formula (3 _ 1), 1 1 represents a single bond or a divalent linking group,
Figure imgf000092_0001
Represents a group containing a fluorine atom.
一般式 (3 _ 2) 中、 1_ 2は単結合又は 2価の連結基を表し、 〇 2 はカチオン重合性基を表す。 In the general formula (3 _ 2), 1_ 2 represents a single bond or a divalent linking group, 〇 2 represents a cation polymerizable group.
一般式 (3 _ 3) 中、 1- 3は単結合又は 2価の連結基を表し、 〇 3 はラジカル重合性基を表す。 In the general formula (3 _ 3), 1-3 represents a single bond or a divalent linking group, 〇 3 represents a radical polymerizable group.
[請求項 4] 前記ポリマ _ (3) における、 フッ素原子を有する構成単位の含有 モル比率が、 全構成単位に対して、 1モル%超 7 0モル%以下である 、 請求項 1〜 3のいずれか 1項に記載の積層体。 [Claim 4] In the polymer _ (3), the content molar ratio of the structural unit having a fluorine atom is more than 1 mol% and 70 mol% or less with respect to all the structural units, The laminate according to any one of items.
[請求項 5] 前記ポリマ _ (3) における、 ラジカル重合性基を有する構成単位 の含有モル比率が、 全構成単位に対して、 1モル%超である、 請求項 1〜 4のいずれか 1項に記載の積層体。 [Claim 5] The content molar ratio of the structural unit having a radically polymerizable group in the polymer _ (3) is more than 1 mol% with respect to all the structural units. The laminate according to item.
[請求項 6] 前記耐擦傷層の膜厚が、 3 . 〇 未満である、 請求項 1〜 5のい ずれか 1項に記載の積層体。 [Claim 6] The laminate according to any one of claims 1 to 5, wherein the scratch-resistant layer has a thickness of less than 3.0.
[請求項 7] 前記基材が、 イミ ド系ポリマー及びアラミ ド系ポリマーから選ばれ る少なくとも 1種のポリマーを含有する、 請求項 1〜 6のいずれか 1 項に記載の積層体。 [Claim 7] The laminate according to any one of claims 1 to 6, wherein the base material contains at least one polymer selected from imide polymers and aramid polymers.
[請求項 8] 前記ポリオルガノシルセスキオキサン (3 1) における前記カチオ ン重合性基が、 エポキシ基である、 請求項 1〜 7のいずれか 1項に記 載の積層体。 8. The laminate according to any one of claims 1 to 7, wherein the cation-polymerizable group in the polyorganosilsesquioxane (31) is an epoxy group.
[請求項 9] 前記ハードコート層形成用組成物が、 前記ポリマ _ (3) を、 前記 ハードコート層形成用組成物の全固形分に対して、 〇. 0 0 1〜 5質 量%含有する、 請求項 1〜 8のいずれか 1項に記載の積層体。 [Claim 9] The composition for forming a hard coat layer contains the polymer _ (3) in an amount of 0.01 to 5 mass% based on the total solid content of the composition for forming a hard coat layer. The laminated body according to any one of claims 1 to 8.
[請求項 10] 請求項 1〜 9のいずれか 1項に記載の積層体を備えた物品。 [Claim 10] An article comprising the laminate according to any one of claims 1 to 9.
[請求項 1 1 ] 請求項 1〜 9のいずれか 1項に記載の積層体を表面保護フィルムと して備えた画像表示装置。 [Claim 11] An image display device comprising the laminate according to any one of claims 1 to 9 as a surface protection film.
PCT/JP2020/006912 2019-02-27 2020-02-20 Laminated body, article provided with laminated body, and image display device WO2020175337A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2021502154A JP7064650B2 (en) 2019-02-27 2020-02-20 Laminates, articles with laminates, and image display devices
KR1020217019637A KR102602546B1 (en) 2019-02-27 2020-02-20 Laminates, articles including laminates, and image display devices
JP2022071039A JP2022115881A (en) 2019-02-27 2022-04-22 Laminate, article comprising laminate, and image display device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-034955 2019-02-27
JP2019034955 2019-02-27

Publications (1)

Publication Number Publication Date
WO2020175337A1 true WO2020175337A1 (en) 2020-09-03

Family

ID=72238467

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2020/006912 WO2020175337A1 (en) 2019-02-27 2020-02-20 Laminated body, article provided with laminated body, and image display device

Country Status (3)

Country Link
JP (2) JP7064650B2 (en)
KR (1) KR102602546B1 (en)
WO (1) WO2020175337A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022004746A1 (en) * 2020-06-29 2022-01-06 富士フイルム株式会社 Laminate, production method for laminate, laminate-containing surface protective film for image display device, and article and image display device provided with laminate
JPWO2022004747A1 (en) * 2020-06-29 2022-01-06
JP2022115881A (en) * 2019-02-27 2022-08-09 富士フイルム株式会社 Laminate, article comprising laminate, and image display device
WO2022259893A1 (en) * 2021-06-07 2022-12-15 富士フイルム株式会社 Curable resin composition, hard coat film, and production method for hard coat film
WO2023276864A1 (en) * 2021-06-29 2023-01-05 東洋紡株式会社 Silsesquioxane compound and method for producing same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023198743A1 (en) * 2022-04-14 2023-10-19 Optitune Oy Flexible multi-layered polysiloxane hard coating

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014043101A (en) * 2012-08-03 2014-03-13 Mazda Motor Corp Transparent laminate and manufacturing method thereof
JP2015212353A (en) * 2013-12-13 2015-11-26 株式会社ダイセル Polyorganosilsesquioxane, hard coat film, adhesive sheet and laminate
WO2016010041A1 (en) * 2014-07-15 2016-01-21 Jnc株式会社 Laminate, surface-protected article, method for manufacturing laminate
US20160046830A1 (en) * 2014-08-13 2016-02-18 Sk Innovation Co., Ltd. Composition for making hard coating layer
WO2018116598A1 (en) * 2016-12-22 2018-06-28 富士フイルム株式会社 Optical film and manufacturing method for optical film
WO2020021931A1 (en) * 2018-07-27 2020-01-30 富士フイルム株式会社 Hard coat film, article provided with hard coat film, and image display apparatus

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6619955B2 (en) * 2015-06-17 2019-12-11 株式会社ダイセル Wound healing film
KR101889955B1 (en) * 2016-03-14 2018-08-20 주식회사 엘지화학 Anti-reflective film
KR20180058912A (en) * 2016-11-24 2018-06-04 삼성디스플레이 주식회사 Hard coating composition and flexible display device
JP6931526B2 (en) 2016-11-25 2021-09-08 株式会社ダイセル Hard coat film
US20190375896A1 (en) * 2017-01-10 2019-12-12 Jnc Corporation Silsesquioxane derivative having radical polymerizable functional group, composition thereof, and cured film having low cure shrinkage
JP6842977B2 (en) * 2017-04-12 2021-03-17 株式会社ダイセル Laminate
JP2018178003A (en) * 2017-04-17 2018-11-15 株式会社ダイセル Fluorine-containing epoxy-modified silsesquioxane and curable composition containing the same
JP2018189800A (en) * 2017-05-02 2018-11-29 株式会社ダイセル Hard coat film for curved surface display, transparent substrate with hard coat film, and display device
KR102412888B1 (en) * 2017-05-12 2022-06-28 삼성디스플레이 주식회사 Hard coating composition, and window member having hard coating layer
KR101818487B1 (en) * 2017-05-16 2018-02-22 한국생산기술연구원 Hardcoating resin composition
JP2019164255A (en) * 2018-03-20 2019-09-26 株式会社ダイセル Antireflection film
JP7312543B2 (en) * 2018-11-21 2023-07-21 株式会社ダイセル WEATHER-RESISTANT HARD COAT COMPOSITION FOR GLASS SUBSTITUTE SUBSTRATE, CURED PRODUCT, AND LAMINATED PRODUCT
WO2020175337A1 (en) * 2019-02-27 2020-09-03 富士フイルム株式会社 Laminated body, article provided with laminated body, and image display device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014043101A (en) * 2012-08-03 2014-03-13 Mazda Motor Corp Transparent laminate and manufacturing method thereof
JP2015212353A (en) * 2013-12-13 2015-11-26 株式会社ダイセル Polyorganosilsesquioxane, hard coat film, adhesive sheet and laminate
WO2016010041A1 (en) * 2014-07-15 2016-01-21 Jnc株式会社 Laminate, surface-protected article, method for manufacturing laminate
US20160046830A1 (en) * 2014-08-13 2016-02-18 Sk Innovation Co., Ltd. Composition for making hard coating layer
WO2018116598A1 (en) * 2016-12-22 2018-06-28 富士フイルム株式会社 Optical film and manufacturing method for optical film
WO2020021931A1 (en) * 2018-07-27 2020-01-30 富士フイルム株式会社 Hard coat film, article provided with hard coat film, and image display apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022115881A (en) * 2019-02-27 2022-08-09 富士フイルム株式会社 Laminate, article comprising laminate, and image display device
WO2022004746A1 (en) * 2020-06-29 2022-01-06 富士フイルム株式会社 Laminate, production method for laminate, laminate-containing surface protective film for image display device, and article and image display device provided with laminate
JPWO2022004747A1 (en) * 2020-06-29 2022-01-06
WO2022004747A1 (en) * 2020-06-29 2022-01-06 富士フイルム株式会社 Composition for forming hard coat layer, hard coat film, method for producing hard coat film, and article comprising hard coat film
JP7373074B2 (en) 2020-06-29 2023-11-01 富士フイルム株式会社 Composition for forming hard coat layer, hard coat film, method for producing hard coat film, and article containing hard coat film
WO2022259893A1 (en) * 2021-06-07 2022-12-15 富士フイルム株式会社 Curable resin composition, hard coat film, and production method for hard coat film
WO2023276864A1 (en) * 2021-06-29 2023-01-05 東洋紡株式会社 Silsesquioxane compound and method for producing same

Also Published As

Publication number Publication date
KR20210095187A (en) 2021-07-30
JP7064650B2 (en) 2022-05-10
KR102602546B1 (en) 2023-11-16
JPWO2020175337A1 (en) 2021-10-28
JP2022115881A (en) 2022-08-09

Similar Documents

Publication Publication Date Title
WO2020175337A1 (en) Laminated body, article provided with laminated body, and image display device
JP6967662B2 (en) A hard coat film, an article having a hard coat film, an image display device, and a method for manufacturing the hard coat film.
JP7263356B2 (en) HARD COAT FILM, ARTICLE INCLUDED WITH HARD COAT FILM, AND IMAGE DISPLAY DEVICE
JP6999808B2 (en) Compositions, hardcourt films, articles with hardcourt films, and image display devices.
CN113544193B (en) Polyorganosiloxane and composition for forming hard coat layer
JPWO2019235108A1 (en) Modifiers, compositions, hard coat films, articles with hard coat films, and image display devices
KR102298174B1 (en) Optical laminate and flexible display panel including the same
CN115136033B (en) Composition for forming hard coat layer, hard coat film, article having hard coat film, image display device, and method for producing hard coat film
CN113840854B (en) Resin composition, hard-coated film and polysilsesquioxane
JP7280963B2 (en) Composition for forming hard coat layer, hard coat film, method for producing hard coat film, and article containing hard coat film
JP7291150B2 (en) Hard coat composition, hard coat film, article having hard coat film, image display device, and method for producing hard coat film
WO2022004746A1 (en) Laminate, production method for laminate, laminate-containing surface protective film for image display device, and article and image display device provided with laminate
CN115298275B (en) Composition for forming hard coating, hard coating film, method for producing hard coating film, and article provided with hard coating film
JP6945062B2 (en) A composition for forming a hard coat layer, a hard coat film, an article having a hard coat film, an image display device, and a method for producing the hard coat film.
WO2022004747A1 (en) Composition for forming hard coat layer, hard coat film, method for producing hard coat film, and article comprising hard coat film
WO2020235274A1 (en) Hard-coat film, article provided with hard-coat film, and image display device
KR20220165184A (en) Composition for forming cured layer, laminate, method for manufacturing laminate, article having laminate, image display device and flexible display

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20762716

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2021502154

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 20217019637

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 20762716

Country of ref document: EP

Kind code of ref document: A1