WO2020166555A1 - Wiring structure and method for producing wiring structure - Google Patents

Wiring structure and method for producing wiring structure Download PDF

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Publication number
WO2020166555A1
WO2020166555A1 PCT/JP2020/005119 JP2020005119W WO2020166555A1 WO 2020166555 A1 WO2020166555 A1 WO 2020166555A1 JP 2020005119 W JP2020005119 W JP 2020005119W WO 2020166555 A1 WO2020166555 A1 WO 2020166555A1
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WO
WIPO (PCT)
Prior art keywords
conductor
adhesive layer
wiring
base
layer
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PCT/JP2020/005119
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French (fr)
Japanese (ja)
Inventor
亮介 三井
隼也 佐藤
敦史 田中
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日本航空電子工業株式会社
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Publication of WO2020166555A1 publication Critical patent/WO2020166555A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits

Definitions

  • the present invention relates to a wiring structure and a method for producing the wiring structure.
  • the wiring structure 10 has a configuration in which a microphone 20 is mounted.
  • an insulating pressure-sensitive adhesive layer 12 is formed on one surface 11 a of the film 11, and wiring (referred to as a conductor pattern in Patent Document 1) 13 is formed on the pressure-sensitive adhesive layer 12. It has a structure.
  • the adhesive layer 12 is formed on the entire one surface 11 a of the film 11.
  • the wiring 13 is formed by printing using silver ink (silver paste), and includes four conductors in this example. Lands 13a and 13b are formed at one end and the other end of each conductor.
  • the microphone 20 is mounted on the wiring structure 10 by being pressed against the adhesive layer 12.
  • the terminal 21 of the microphone 20 is in contact with the land 13 a of the wiring 13.
  • a portion of the bottom surface 20a of the microphone 20 where the terminal 21 is not formed is mechanically coupled to the adhesive layer 12 by adhesion.
  • reference numeral 30 indicates a cover film
  • reference numeral 31 indicates a window formed in the cover film
  • reference numeral 32 indicates a notch formed in the cover film 30.
  • the wiring resistance is increased as compared with the method of forming the wiring by copper foil or plating.
  • the volume resistivity of the cured conductive ink is generally about 100 times that of bulk metal.
  • the wiring is formed using a printing method such as inkjet printing, gravure printing, flexographic printing or gravure offset printing, the volume resistivity of the cured conductive ink is about the same as that of bulk metal.
  • the wiring thickness is about several ⁇ m, that is, it is difficult to increase the film thickness, it is also difficult to reduce the wiring resistance.
  • An object of the present invention is to provide a wiring structure having a low wiring resistance and a method for producing the wiring structure.
  • At least a part of the wiring is formed by superimposing the first conductor formed on the one base portion and the second conductor formed on the other base portion, that is, the thickness of the portion is reduced. Since it becomes large, the wiring resistance can be made small.
  • FIG. 6 is a plan view of a wiring structure in which unnecessary parts are removed and components are mounted.
  • FIG. 5B is an enlarged sectional view taken along line FF of the structure shown in FIG. 5A. It is a flowchart of a production process.
  • wiring means an object, not an act, unless otherwise specified or unless clearly understood from the context.
  • FIG. 2 shows the wiring structure 100 of the embodiment.
  • FIG. 2 shows the wiring structure 100 in a state before the unnecessary portion is finally removed by cutting.
  • the wiring structure 100 has a structure in which the first layer structure 40 and the second layer structure 60 are bonded to each other.
  • FIG. 3 shows details of the first layer structure 40
  • FIG. 4 shows details of the second layer structure 60. The configurations of the first layer structure 40 and the second layer structure 60 will be described with reference to FIGS.
  • the first layer structure 40 is formed on a rectangular plate-shaped first base portion 41, an insulating first adhesive layer 42 formed on the first base portion 41, and a first adhesive layer 42.
  • the first wiring 50 and the alignment marker 56 formed on the first adhesive layer 42 are included.
  • the first pressure-sensitive adhesive layer 42 is elastically deformable.
  • the first adhesive layer 42 is formed on the entire one surface of the first base 41.
  • first wiring 50 four electronic components such as chip components are mounted on the first wiring 50. Portions of the first wiring 50 located at both ends of the first base 41 in the long side direction (that is, the horizontal direction in the drawing) are connected to an external circuit (for example, a power supply circuit) other than the wiring structure 100. It is a connection part for doing.
  • an external circuit for example, a power supply circuit
  • the first wiring 50 includes ten lands 51 located in the central portion of the first base 41, ten conductive wire portions 52, and a land 53 described later.
  • the lands 51 and 53 are connection portions for connecting to an external circuit (for example, an electronic component) other than the wiring structure 100.
  • the ten lands 51 include five lands 51 on the right side and five lands 51 on the left side.
  • the ten conducting wire portions 52 extend from the five lands 51 on the right side to the right side and reach the right end edge of the first base 41, and the five conducting lands 51 on the left side extend to the left side from the five lands 51 on the left side. It includes five conducting wire portions 52 extending to the left edge of the one base portion 41.
  • One of the five conductors 52 extending to the left side has a break in one place in the middle, and the other one has a break in two places in the middle.
  • Wide lands 53 are formed on both sides of the cut portion.
  • each conductor part 52 located at the edge of the first base part 41 is the connecting part 54, and the remaining part is the linear part 55.
  • the spacing between the linear portions 55 is not constant, and the spacing between the linear portions 55 near the edge of the first base portion 41 is smaller than the spacing between the linear portions 55 near the land 51 (fine pitch wiring).
  • the four alignment markers 56 are located at the four corners of the first layer structure 40.
  • the alignment marker 56 has a shape combining a cross and a circle.
  • the alignment marker 56 is formed on the first adhesive layer 42, that is, on the same layer as the layer on which the first wiring 50 is formed.
  • the second layer structure 60 includes a rectangular flat plate-shaped second base 61 having the same size as the first base 41, an insulating second adhesive layer 62 formed on the second base 61, and a second base 61.
  • the second wiring 71 is formed on the second adhesive layer 62, and the alignment marker 72 is formed on the second adhesive layer 62.
  • the second adhesive layer 62 is elastically deformable.
  • the second pressure-sensitive adhesive layer 62 is formed on the entire one surface of the second base portion 61 having such a shape.
  • the second wiring 71 includes a plurality of conducting wires and has a shape that is mirror-symmetrical to the linear portion 55 of the first layer structure 40, that is, in this example, the linear portion 55 of the first layer structure 40 is vertically inverted. There is.
  • the four alignment markers 72 are located at four corners of the second layer structure 60.
  • the alignment marker 72 has a shape imitating a cross outline.
  • the alignment marker 72 is formed on the second adhesive layer 62, that is, in the same layer as the layer on which the second wiring 71 is formed.
  • the first wiring 50, the second wiring 71, and the alignment markers 56 and 72 are formed by, for example, gravure offset printing using a conductive ink containing conductive particles such as silver particles or copper particles.
  • the first wiring 50, the second wiring 71, and the alignment markers 56 and 72 are cured products of conductive ink.
  • the first layer structure 40 and the second layer structure 60 are in a state where the surface on which the first wiring 50 is formed and the surface on which the second wiring 71 is formed face each other, that is, the first adhesive layer 42 and the second adhesive layer 42. With the pressure-sensitive adhesive layers 62 facing each other, the first layer structure 40 and the second layer structure 60 are pressed against each other to be bonded to each other.
  • Alignment between the first layer structure 40 and the second layer structure 60 is performed using alignment markers 56 and 72 in this example.
  • the first base portion 41 and the second base portion 61 formed of a film base material are transparent bodies in this example, and the first pressure-sensitive adhesive layer 42 and the second pressure-sensitive adhesive layer 62 are also transparent bodies in this example. Therefore, the alignment marker 56 and the alignment marker 72 can be recognized through the transparent first base portion 41 and the first adhesive layer 42 or through the transparent second base portion 61 and the second adhesive layer 62, that is, the alignment marker 56. , 72, the shape information (or position information) of the second layer structure 60 is positioned with respect to the first layer structure 40 by aligning the alignment marker 56 and the alignment marker 72 with each other.
  • the first base 41 and the first pressure-sensitive adhesive layer 42 may be transparent and the second base 61 and the second pressure-sensitive adhesive layer 62 may be opaque, or the first base 41 and the first pressure-sensitive adhesive layer may be used. 42 may be an opaque body, and the second base portion 61 and the second adhesive layer 62 may be transparent bodies. It is not essential to use the alignment markers 56 and 72, and the alignment may be performed using the shape information (or position information) of the linear portion 55 and the shape information (or position information) of the second wiring 71, for example. ..
  • the surface of the first adhesive layer 42 on which the first wiring 50 is not formed and the surface of the second adhesive layer 62 on which the second wiring 71 is not formed adhere to each other, whereby the first layer structure 40 is formed. And the second layer structure 60 are mechanically coupled to each other.
  • the second wiring 71 corresponding to the above-mentioned second conductor is in close contact with the linear portion 55 corresponding to the above-mentioned first conductor in the state where the first layer structure 40 and the second layer structure 60 are bonded to each other.
  • the linear portion 55 and the second wiring 71 which are overlapped with each other form a conductor portion 80 as if it were an integral body.
  • the first pressure-sensitive adhesive layer 42 and the second pressure-sensitive adhesive layer 62 are elastically deformed by pressing when they are bonded to each other. Since the elastic restoring force acts as a force in the direction in which the linear portion 55 and the second wiring 71 are pressed against each other, a good contact state between the linear portion 55 and the second wiring 71, that is, electrical coupling is obtained.
  • FIG. 2A in order to clearly show the positional relationship between the first layer structure 40 and the second layer structure 60, the first wiring 50 and the alignment marker 56 are shown only by the outline.
  • the material of each of the first base portion 41 and the second base portion 61 is a flexible film substrate such as PET (polyethylene terephthalate), PEN (polyethylene naphthalate), and PI (polyimide). Alternatively, it may be a rigid base material.
  • the pressure-sensitive adhesive forming the first pressure-sensitive adhesive layer 42 and the second pressure-sensitive adhesive layer 62 is, for example, polyester-based, polyurethane-based, acrylic-based, epoxy-based, phenol-based, silicone-based, polyolefin-based, polyimide-based, vinyl-based, It is one or more types of polymers selected from natural high molecular weight polymers.
  • polyester-based, polyurethane-based, acrylic-based, epoxy-based, phenol-based, silicone-based, polyolefin-based, polyimide-based, vinyl-based monomers or oligomers are mixed with the above-mentioned polymer. May be.
  • the wiring structure 100 is cut and processed along the alternate long and two short dashes line a shown in FIG. As a result, a finished product (see FIG. 5A) from which unnecessary parts are removed is obtained.
  • the removal of the unnecessary portion is not an essential process, and the wiring structure 100 shown in FIG. 2A may be a completed product.
  • FIG. 5A shows a state in which chip components 91, 92, 93, and 94 are mounted on the wiring structure 100 of the finished product.
  • the chip 91 is arranged in the hole 63, and the chip 91 is mounted on the land 51 exposed in the hole 63.
  • Three chips 92, 93, 94 are arranged in the three holes 64, and the chips 92, 93, 94 are mounted on the land 53 exposed in the holes 64.
  • the chip 91 is, for example, a microcomputer, and the chips 92, 93 and 94 are electronic parts such as resistors and capacitors.
  • the chips 91, 92, 93, 94 adhere to the first adhesive layer 42 by being pressed against the first adhesive layer 42. That is, the mounting of the chips 91, 92, 93, 94 does not require soldering or heat treatment.
  • connection portion 54 is exposed from the cutouts 65 of the second layer structure 60 at both ends in the left-right direction of the wiring structure 100, and an external circuit is electrically and mechanically connected to the connection portion 54 by the adhesion of the first adhesive layer 42. Connected to.
  • the wiring included in the wiring structure 100 includes the linear conductor portion 80, and at least a part of the conductor portion 80 (the whole conductor portion 80 in the embodiment) is included in the first layer structure 40. It is a conductor formed by stacking the first conductor 55 and the second conductor 71 of the second layer structure 60. In the embodiment, the wiring included in the wiring structure 100 does not include the land 51, the land 53, and the connection portion 54.
  • the conductor portion having a large thickness that is, at least one of the wirings of the wiring structure is formed by superimposing the first conductor formed on one substrate and the second conductor formed on the other substrate). Part
  • the wiring structure of the embodiment is useful when the conductor on the substrate is formed by a printing method in which it is difficult to form a thick conductor.
  • the wiring structure of the embodiment is also useful in the case of fine-pitch wiring in which a plurality of thin conductive wires are arranged at narrow intervals (for example, the interval between two adjacent conductive wires is 0.3 mm or less).
  • the wiring structure of the embodiment is useful even when the width of the conductive wire is narrow (for example, the width of the conductive wire is 0.3 mm or less).
  • the wiring structure of the embodiment achieves a good yield.
  • the wiring structure of the embodiment has a vertically symmetrical structure as shown in the cross-sectional view of FIG. 5B.
  • the second adhesive layer 62 and the second base portion 61 are located above the conductor portion 80, and the first adhesive layer 42 and the first base portion 41 are located below the conductor portion 80.
  • the conductor portion 80 is sandwiched between the adhesive layer and the base portion, and is located at the center of the cross section of the wiring structure. Therefore, even if the narrow-width extension 101 (see FIG.
  • the wiring structure 100 is, for example, a cable, and the bending is applied in the extension direction of the conductor portion 80 and the direction orthogonal to the width direction of the narrow-width extension 101, the conductor No compressive stress or tensile stress is strongly applied to the portion 80. Therefore, peeling of the adhesive layer is unlikely to occur, and a cable portion that is resistant to bending can be realized.
  • the second wiring 71 does not have to have a shape that completely matches the shape of the linear portion 55, and a part of the second wiring 71 does not have to overlap the linear portion 55.
  • the line width of the part or the whole may be different from the line width of the linear part 55.
  • a part of the surface of the first adhesive layer 42 on which the first wiring 50 is not formed is used for adhering the chips 91, 92, 93, 94. Therefore, the mechanical coupling between the first layer structure 40 and the second layer structure 60 is performed by at least a part of the surface of the first adhesive layer 42 where the first wiring 50 is not formed and the second adhesive layer 62 of the first adhesive layer 62. This is achieved by adhering at least some of the surfaces on which the two wirings 71 are not formed to each other.
  • the first layer structure 40 including the first base portion 41, the first adhesive layer 42, and the linear first conductor 55 is manufactured (step S1).
  • the second layer structure 60 including the second base portion 61, the second adhesive layer 62, and the linear second conductor 71 is manufactured (step S2).
  • step S1 may be executed after step S2 instead of this order.
  • at least a part of the surface of the first adhesive layer 42 on which the first conductor 55 is not formed and at least a part of the surface of the second adhesive layer 62 on which the second conductor 71 is not formed are adhered to each other.
  • the wiring structure 100 is obtained by overlapping the first conductor 55 and the second conductor 71 with each other (step S3).
  • the first base 41 and the first pressure-sensitive adhesive layer 42 are transparent bodies, or the second base 61 and the second pressure-sensitive adhesive layer 62 are transparent bodies, or the first base 41, the first pressure-sensitive adhesive layer 42,
  • the process of step S3 includes the shape information obtained through the transparent bodies (that is, the shape information of each of the alignment markers 56 and 72 in the embodiment). The process may be utilized to perform alignment of the first layer structure 40 and the second layer structure 60.
  • connection means a direct or indirect connection between two or more elements. There may be one or more intermediate elements between two elements that are "connected” to each other.
  • an ordinal number (for example, “No. ⁇ ” in which the prefix “No.” is combined with a Chinese number or an arithmetic digit) is an element that is modified by the ordinal number or combined with the ordinal number in the order of the elements or It is not intended to be limited by the amount of the element.
  • the use of ordinal numbers is simply used as a convenient method of distinguishing two or more elements from each other, unless otherwise stated. Therefore, for example, the phrase “first X” and the phrase “second X” are expressions for distinguishing two Xs, and do not necessarily mean that the total number of Xs is 2, or the first X is the first. It does not necessarily mean that 2X must precede.
  • the term “include” and its inflection are used as non-exclusive expressions.
  • the sentence “X includes A and B” does not deny that X includes components other than A and B (eg, C).
  • the sentence only refers to the term “comprise” or the object of the inflection.
  • the sentence "X does not include A and B” acknowledges that X may include components other than A and B.
  • the term "or" as used in the specification or claims is not intended to be an exclusive OR.
  • Wiring Structure 11 Film 11a One Surface 12 Adhesive Layer 13 Wiring 13a Land 13b Land 20 Microphone 20a Bottom 21 Terminal 30 Cover Film 31 Window 32 Notch 40 First Layer Structure 41 First Base 42 First Adhesive Layer 50 First Wiring 51 land 52 conducting wire portion 53 land 54 connecting portion 55 linear portion 56 alignment marker 60 second layer structure 61 second base portion 62 second adhesive layer 63 hole 64 hole 65 notch 71 second wiring 72 alignment marker 80 conductor portion 91 Chip 92 Chip 93 Chip 94 Chip 100 Wiring structure 101 Narrow width extension

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

A wiring structure 100 comprises a first layer structure 40 and a second layer structure 60. The first layer structure 40 includes a first base portion 41, a first adhesive agent layer 42, and a linear first conductor 55. The second layer structure 60 includes a second base portion 61, a second adhesive agent layer 62, and a linear second conductor 71. At least a part of a surface of the first adhesive agent layer 42 in which the first conductor 55 is not formed and at least a part of a surface of the second adhesive agent layer 62 in which the second conductor 71 is not formed are adhered to each other. The first conductor 55 and the second conductor 71 are overlapped with each other. A wire included in the wiring structure 100 includes a linear conductor portion 80. At least a part of the conductor portion 80 comprises a conductor formed by the overlap of the first conductor 55 and the second conductor 71.

Description

配線構造および配線構造を生産する方法Wiring structure and method of producing wiring structure
 この発明は、配線構造、および、配線構造を生産する方法に関する。 The present invention relates to a wiring structure and a method for producing the wiring structure.
 図1A,1B,1Cは、特許文献1に開示されている配線構造を示している。配線構造10は、マイクロホン20がマウントされた構成を持つ。 1A, 1B, and 1C show the wiring structure disclosed in Patent Document 1. The wiring structure 10 has a configuration in which a microphone 20 is mounted.
 配線構造10は、フィルム11の一面11a上に絶縁性の粘着剤層12が形成されており、粘着剤層12上に配線(特許文献1では導体パターンと呼称されている)13が形成されている構成を持つ。粘着剤層12は、フィルム11の一面11aの全面に形成されている。配線13は、銀インキ(銀ペースト)を用いた印刷によって形成されており、この例では4本の導線を含む。各導線の一端および他端のそれぞれにおいて、ランド13aおよび13bが形成されている。 In the wiring structure 10, an insulating pressure-sensitive adhesive layer 12 is formed on one surface 11 a of the film 11, and wiring (referred to as a conductor pattern in Patent Document 1) 13 is formed on the pressure-sensitive adhesive layer 12. It has a structure. The adhesive layer 12 is formed on the entire one surface 11 a of the film 11. The wiring 13 is formed by printing using silver ink (silver paste), and includes four conductors in this example. Lands 13a and 13b are formed at one end and the other end of each conductor.
 マイクロホン20は、粘着剤層12に押し付けられることによって配線構造10にマウントされている。マイクロホン20の端子21は、配線13のランド13aと接触している。マイクロホン20の底面20aのうち端子21が形成されていない部分は、粘着によって粘着剤層12に機械的に結合している。図1A,1B,1C中、符号30はカバーフィルムを示し、符号31はカバーフィルム30に形成されている窓を示し、符号32はカバーフィルム30に形成されている切欠きを示す。 The microphone 20 is mounted on the wiring structure 10 by being pressed against the adhesive layer 12. The terminal 21 of the microphone 20 is in contact with the land 13 a of the wiring 13. A portion of the bottom surface 20a of the microphone 20 where the terminal 21 is not formed is mechanically coupled to the adhesive layer 12 by adhesion. 1A, 1B and 1C, reference numeral 30 indicates a cover film, reference numeral 31 indicates a window formed in the cover film 30, and reference numeral 32 indicates a notch formed in the cover film 30.
日本国特許第6293938号公報Japanese Patent No. 6293938
 特許文献1に開示されている配線構造10のように、導電インキを用いた印刷法で配線が形成される場合、銅箔あるいはめっきによって配線を形成する方法と比べて、配線抵抗が増大する。 When the wiring is formed by the printing method using the conductive ink like the wiring structure 10 disclosed in Patent Document 1, the wiring resistance is increased as compared with the method of forming the wiring by copper foil or plating.
 例えば、スクリーン印刷を用いて配線を形成すると、硬化した導電インキの体積抵抗率は一般的にバルク金属の100倍程度である。この点、インクジェット印刷、グラビア印刷、フレキソ印刷あるいはグラビアオフセット印刷などの印刷法を用いて配線を形成すると、硬化した導電インキの体積抵抗率はバルク金属のそれと同程度である。しかし、これらの方法によると、配線の厚さは数μm程度であり、つまり膜厚を大きくすることが困難であるから、配線抵抗を小さくすることはやはり難しい。 For example, when wiring is formed using screen printing, the volume resistivity of the cured conductive ink is generally about 100 times that of bulk metal. In this respect, when the wiring is formed using a printing method such as inkjet printing, gravure printing, flexographic printing or gravure offset printing, the volume resistivity of the cured conductive ink is about the same as that of bulk metal. However, according to these methods, since the wiring thickness is about several μm, that is, it is difficult to increase the film thickness, it is also difficult to reduce the wiring resistance.
 この発明の目的は、配線抵抗の小さい配線構造および配線構造を生産する方法を提供することである。 An object of the present invention is to provide a wiring structure having a low wiring resistance and a method for producing the wiring structure.
 ここで述べる技術事項は、特許請求の範囲に記載された発明を明示的にまたは黙示的に限定するためではなく、さらに、本発明によって利益を受ける者(例えば出願人と権利者である)以外の者によるそのような限定を容認する可能性の表明でもなく、単に、本発明の要点を容易に理解するために記載される。他の観点からの本発明の概要は、例えば、この特許出願の出願時の特許請求の範囲から理解できる。
 配線構造に含まれる配線の少なくとも一部は、一方の基部に形成された第1導体と他方の基部に形成された第2導体との重ね合わせによって形成される。
The technical matters described here are not for the purpose of explicitly or implicitly limiting the invention described in the scope of the claims, and also for the benefit of the present invention (for example, the applicant and the right holder). It is not a statement of the possibility of admitting such limitation by anyone of the above, and is merely provided for the purpose of facilitating the understanding of the gist of the present invention. The outline of the present invention from other points of view can be understood, for example, from the claims as filed in this patent application.
At least a part of the wiring included in the wiring structure is formed by superimposing the first conductor formed on one base and the second conductor formed on the other base.
 この発明によれば、一方の基部に形成された第1導体と他方の基部に形成された第2導体との重ね合わせによって配線の少なくとも一部が形成されるので、つまり、その部分の厚みが大きくなるので、配線抵抗を小さくできる。 According to this invention, at least a part of the wiring is formed by superimposing the first conductor formed on the one base portion and the second conductor formed on the other base portion, that is, the thickness of the portion is reduced. Since it becomes large, the wiring resistance can be made small.
配線構造の従来例の平面図である。It is a top view of the prior art example of a wiring structure. 配線構造の従来例の正面図である。It is a front view of the conventional example of a wiring structure. 配線構造の従来例の部分拡大断面図である。It is a partial expanded sectional view of the prior art example of a wiring structure. 実施形態の配線構造である。(a)正面図である。(b)C-C線断面図である。It is a wiring structure of an embodiment. (A) It is a front view. (B) A sectional view taken along the line CC. 第1層構造である。(a)平面図である。(b)D-D線断面図である。It is the first layer structure. (A) It is a top view. (B) It is a sectional view taken along the line DD. 第2層構造である。(a)平面図である。(b)E-E線断面図である。It is the second layer structure. (A) It is a top view. (B) EE line sectional drawing. 不要部分が除去され且つ部品がマウントされた配線構造の平面図である。FIG. 6 is a plan view of a wiring structure in which unnecessary parts are removed and components are mounted. 図5Aに示す構造のF-F線拡大断面図である。FIG. 5B is an enlarged sectional view taken along line FF of the structure shown in FIG. 5A. 生産工程のフロー図である。It is a flowchart of a production process.
 図面を参照して、この発明の実施形態を説明する。以下、「配線」という用語は、特に断りが無い限り、あるいは、文脈から一義的に理解できる場合を除き、行為ではなく、物を意味する。 Embodiments of the present invention will be described with reference to the drawings. Hereinafter, the term “wiring” means an object, not an act, unless otherwise specified or unless clearly understood from the context.
 図2は、実施形態の配線構造100を示している。図2では、不要部分が切断によって最終的に除去される前の状態の配線構造100が示されている。 FIG. 2 shows the wiring structure 100 of the embodiment. FIG. 2 shows the wiring structure 100 in a state before the unnecessary portion is finally removed by cutting.
 配線構造100は、第1層構造40と第2層構造60とが互いに接着した構造を持つ。図3は第1層構造40の詳細を示しており、図4は第2層構造60の詳細を示している。図3,4を参照して、第1層構造40および第2層構造60の構成を説明する。 The wiring structure 100 has a structure in which the first layer structure 40 and the second layer structure 60 are bonded to each other. FIG. 3 shows details of the first layer structure 40, and FIG. 4 shows details of the second layer structure 60. The configurations of the first layer structure 40 and the second layer structure 60 will be described with reference to FIGS.
 第1層構造40は、矩形平板状の第1基部41と、第1基部41の上に形成されている絶縁性の第1粘着剤層42と、第1粘着剤層42の上に形成されている第1配線50と、第1粘着剤層42の上に形成されているアラインメントマーカ56を含む。第1粘着剤層42は、弾性変形可能である。第1粘着剤層42は、第1基部41の一面の全体に形成されている。 The first layer structure 40 is formed on a rectangular plate-shaped first base portion 41, an insulating first adhesive layer 42 formed on the first base portion 41, and a first adhesive layer 42. The first wiring 50 and the alignment marker 56 formed on the first adhesive layer 42 are included. The first pressure-sensitive adhesive layer 42 is elastically deformable. The first adhesive layer 42 is formed on the entire one surface of the first base 41.
 この例ではチップ部品のような4個の電子部品が第1配線50にマウントされる。第1配線50のうち第1基部41の長辺方向(つまり図面の左右方向)の両端部に位置する部分は、配線構造100以外の回路である外部回路(例えば、電源回路である)と接続するための接続部である。 In this example, four electronic components such as chip components are mounted on the first wiring 50. Portions of the first wiring 50 located at both ends of the first base 41 in the long side direction (that is, the horizontal direction in the drawing) are connected to an external circuit (for example, a power supply circuit) other than the wiring structure 100. It is a connection part for doing.
 第1配線50は、第1基部41の中央部に位置する10個のランド51と、10本の導線部52と、後述するランド53とを含む。ランド51,53は、配線構造100以外の回路である外部回路(例えば、電子部品である)と接続するための接続部である。10個のランド51は、右側の5個のランド51と左側の5個のランド51を含む。10本の導線部52は、右側の5個のランド51から右側に伸びて第1基部41の右端縁に至る5本の導線部52と、左側の5個のランド51から左側に伸びて第1基部41の左端縁に至る5本の導線部52を含む。左側に伸びる5本の導体52のうちの1本はその中間の1か所で断絶しており、他の1本はその中間の2箇所で断絶している。断絶部を挟む両側に、幅広のランド53が形成されている。 The first wiring 50 includes ten lands 51 located in the central portion of the first base 41, ten conductive wire portions 52, and a land 53 described later. The lands 51 and 53 are connection portions for connecting to an external circuit (for example, an electronic component) other than the wiring structure 100. The ten lands 51 include five lands 51 on the right side and five lands 51 on the left side. The ten conducting wire portions 52 extend from the five lands 51 on the right side to the right side and reach the right end edge of the first base 41, and the five conducting lands 51 on the left side extend to the left side from the five lands 51 on the left side. It includes five conducting wire portions 52 extending to the left edge of the one base portion 41. One of the five conductors 52 extending to the left side has a break in one place in the middle, and the other one has a break in two places in the middle. Wide lands 53 are formed on both sides of the cut portion.
 各導線部52のうち第1基部41の端縁に位置する部分は接続部54であり、残余の部分は線状部55である。線状部55の間隔は一定ではなく、第1基部41の端縁近傍での線状部55の間隔は、ランド51近傍での線状部55の間隔よりも小さい(ファインピッチ配線)。 The part of each conductor part 52 located at the edge of the first base part 41 is the connecting part 54, and the remaining part is the linear part 55. The spacing between the linear portions 55 is not constant, and the spacing between the linear portions 55 near the edge of the first base portion 41 is smaller than the spacing between the linear portions 55 near the land 51 (fine pitch wiring).
 4個のアラインメントマーカ56は、第1層構造40の4つの角部に位置する。アラインメントマーカ56は十字と円を組み合わせた形状を持つ。アラインメントマーカ56は、第1粘着剤層42の上、つまり第1配線50が形成されている層と同じ層に形成されている。 The four alignment markers 56 are located at the four corners of the first layer structure 40. The alignment marker 56 has a shape combining a cross and a circle. The alignment marker 56 is formed on the first adhesive layer 42, that is, on the same layer as the layer on which the first wiring 50 is formed.
 次に、第2層構造60について説明する。第2層構造60は、第1基部41と同じ大きさを持つ矩形平板状の第2基部61と、第2基部61の上に形成されている絶縁性の第2粘着剤層62と、第2粘着剤層62の上に形成されている第2配線71と、第2粘着剤層62の上に形成されているアラインメントマーカ72を含む。第2粘着剤層62は、弾性変形可能である。 Next, the second layer structure 60 will be described. The second layer structure 60 includes a rectangular flat plate-shaped second base 61 having the same size as the first base 41, an insulating second adhesive layer 62 formed on the second base 61, and a second base 61. The second wiring 71 is formed on the second adhesive layer 62, and the alignment marker 72 is formed on the second adhesive layer 62. The second adhesive layer 62 is elastically deformable.
 1個の大きな正方形の穴63と、3個の小さな長方形の穴64と、2個の切欠き65が第2基部61に形成されている。第2粘着剤層62は、このような形状を有する第2基部61の一面の全体に形成されている。第2配線71は、複数の導線を含み、第1層構造40の線状部55と鏡映対称の形状つまりこの例では第1層構造40の線状部55を上下反転した形状を持っている。4個のアラインメントマーカ72は、第2層構造60の4つの角部に位置する。アラインメントマーカ72は十字のアウトラインを模した形状を持つ。アラインメントマーカ72は、第2粘着剤層62の上、つまり第2配線71が形成されている層と同じ層に形成されている。 One large square hole 63, three small rectangular holes 64, and two notches 65 are formed in the second base 61. The second pressure-sensitive adhesive layer 62 is formed on the entire one surface of the second base portion 61 having such a shape. The second wiring 71 includes a plurality of conducting wires and has a shape that is mirror-symmetrical to the linear portion 55 of the first layer structure 40, that is, in this example, the linear portion 55 of the first layer structure 40 is vertically inverted. There is. The four alignment markers 72 are located at four corners of the second layer structure 60. The alignment marker 72 has a shape imitating a cross outline. The alignment marker 72 is formed on the second adhesive layer 62, that is, in the same layer as the layer on which the second wiring 71 is formed.
 第1配線50、第2配線71およびアラインメントマーカ56,72は、銀粒子または銅粒子のような導電粒子を含む導電インキを用いる例えばグラビアオフセット印刷によって形成される。第1配線50、第2配線71およびアラインメントマーカ56,72は、導電インキの硬化物である。 The first wiring 50, the second wiring 71, and the alignment markers 56 and 72 are formed by, for example, gravure offset printing using a conductive ink containing conductive particles such as silver particles or copper particles. The first wiring 50, the second wiring 71, and the alignment markers 56 and 72 are cured products of conductive ink.
 第1層構造40と第2層構造60は、第1配線50が形成された面と第2配線71が形成された面が互いに対向する状態において、つまり、第1粘着剤層42と第2粘着剤層62が互いに対向する状態において、第1層構造40と第2層構造60を互いに押し付けることによって、互いに接着される。 The first layer structure 40 and the second layer structure 60 are in a state where the surface on which the first wiring 50 is formed and the surface on which the second wiring 71 is formed face each other, that is, the first adhesive layer 42 and the second adhesive layer 42. With the pressure-sensitive adhesive layers 62 facing each other, the first layer structure 40 and the second layer structure 60 are pressed against each other to be bonded to each other.
 第1層構造40と第2層構造60との間の位置合わせは、この例ではアラインメントマーカ56,72を用いて行われる。フィルム基材で形成された第1基部41および第2基部61は、この例では透明体であり、第1粘着剤層42および第2粘着剤層62もこの例では透明体である。したがって、透明な第1基部41および第1粘着剤層42を通して、あるいは透明な第2基部61および第2粘着剤層62を通して、アラインメントマーカ56およびアラインメントマーカ72を認識できるので、つまり、アラインメントマーカ56,72の形状情報(あるいは位置情報)を得られるので、アラインメントマーカ56とアラインメントマーカ72を互いに位置合わせすることによって第2層構造60が第1層構造40に対して位置決めされる。第1基部41および第1粘着剤層42が透明体であり、第2基部61および第2粘着剤層62が不透明体であってもよいし、あるいは、第1基部41および第1粘着剤層42が不透明体であり、第2基部61および第2粘着剤層62が透明体であってもよい。アラインメントマーカ56,72を使用することは必須ではなく、例えば線状部55の形状情報(あるいは位置情報)と第2配線71の形状情報(あるいは位置情報)を用いて位置合わせを行ってもよい。 Alignment between the first layer structure 40 and the second layer structure 60 is performed using alignment markers 56 and 72 in this example. The first base portion 41 and the second base portion 61 formed of a film base material are transparent bodies in this example, and the first pressure-sensitive adhesive layer 42 and the second pressure-sensitive adhesive layer 62 are also transparent bodies in this example. Therefore, the alignment marker 56 and the alignment marker 72 can be recognized through the transparent first base portion 41 and the first adhesive layer 42 or through the transparent second base portion 61 and the second adhesive layer 62, that is, the alignment marker 56. , 72, the shape information (or position information) of the second layer structure 60 is positioned with respect to the first layer structure 40 by aligning the alignment marker 56 and the alignment marker 72 with each other. The first base 41 and the first pressure-sensitive adhesive layer 42 may be transparent and the second base 61 and the second pressure-sensitive adhesive layer 62 may be opaque, or the first base 41 and the first pressure-sensitive adhesive layer may be used. 42 may be an opaque body, and the second base portion 61 and the second adhesive layer 62 may be transparent bodies. It is not essential to use the alignment markers 56 and 72, and the alignment may be performed using the shape information (or position information) of the linear portion 55 and the shape information (or position information) of the second wiring 71, for example. ..
 第1粘着剤層42のうち第1配線50が形成されていない表面と第2粘着剤層62のうち第2配線71が形成されていない表面が相互に接着することによって、第1層構造40と第2層構造60は互いに機械的結合する。 The surface of the first adhesive layer 42 on which the first wiring 50 is not formed and the surface of the second adhesive layer 62 on which the second wiring 71 is not formed adhere to each other, whereby the first layer structure 40 is formed. And the second layer structure 60 are mechanically coupled to each other.
 第1層構造40と第2層構造60が互いに接着している状態において、第1層構造40の10個のランド51が穴63から露出しており、第1層構造40のランド53が3個の穴64から露出しており、第1層構造40の接続部54が2個の切欠き65から露出している。 In a state where the first layer structure 40 and the second layer structure 60 are adhered to each other, ten lands 51 of the first layer structure 40 are exposed from the holes 63, and three lands 53 of the first layer structure 40 are exposed. It is exposed from the holes 64, and the connection portion 54 of the first layer structure 40 is exposed from the two notches 65.
 上述の第2導体に相当する第2配線71は、第1層構造40と第2層構造60が互いに接着している状態において、上述の第1導体に相当する線状部55と密着する。重なり合った線状部55と第2配線71によって、あたかも一体物としての導体部80が構成される。 The second wiring 71 corresponding to the above-mentioned second conductor is in close contact with the linear portion 55 corresponding to the above-mentioned first conductor in the state where the first layer structure 40 and the second layer structure 60 are bonded to each other. The linear portion 55 and the second wiring 71 which are overlapped with each other form a conductor portion 80 as if it were an integral body.
 第1粘着剤層42および第2粘着剤層62は、互いに接着する際に、押圧によって弾性変形する。弾性復元力が線状部55と第2配線71とを互いに押し付ける方向の力として働くので、線状部55と第2配線71との良好な接触状態、つまり電気的結合が得られる。図2(a)では、第1層構造40と第2層構造60との位置関係をわかりやすく示すため、アウトラインだけで第1配線50およびアラインメントマーカ56を示している。 The first pressure-sensitive adhesive layer 42 and the second pressure-sensitive adhesive layer 62 are elastically deformed by pressing when they are bonded to each other. Since the elastic restoring force acts as a force in the direction in which the linear portion 55 and the second wiring 71 are pressed against each other, a good contact state between the linear portion 55 and the second wiring 71, that is, electrical coupling is obtained. In FIG. 2A, in order to clearly show the positional relationship between the first layer structure 40 and the second layer structure 60, the first wiring 50 and the alignment marker 56 are shown only by the outline.
 第1基部41および第2基部61のそれぞれの材質は、この例では、PET(ポリエチレンテレフタレート)、PEN(ポリエチレンナフタレート)、PI(ポリイミド)のような可撓性を有するフィルム基材であるが、リジッドな基材であってもよい。 In this example, the material of each of the first base portion 41 and the second base portion 61 is a flexible film substrate such as PET (polyethylene terephthalate), PEN (polyethylene naphthalate), and PI (polyimide). Alternatively, it may be a rigid base material.
 第1粘着剤層42および第2の粘着剤層62を形成する粘着剤は、例えば、ポリエステル系、ポリウレタン系、アクリル系、エポキシ系、フェノール系、シリコーン系、ポリオレフィン系、ポリイミド系、ビニル系、天然高分子系のポリマーのうちから選択される1種類以上のポリマーである。 The pressure-sensitive adhesive forming the first pressure-sensitive adhesive layer 42 and the second pressure-sensitive adhesive layer 62 is, for example, polyester-based, polyurethane-based, acrylic-based, epoxy-based, phenol-based, silicone-based, polyolefin-based, polyimide-based, vinyl-based, It is one or more types of polymers selected from natural high molecular weight polymers.
 粘着性つまり機械的特性を向上させるために、上記ポリマーに、例えばポリエステル系、ポリウレタン系、アクリル系、エポキシ系、フェノール系、シリコーン系、ポリオレフィン系、ポリイミド系、ビニル系のモノマーまたはオリゴマーを混合してもよい。 In order to improve tackiness, that is, mechanical properties, for example, polyester-based, polyurethane-based, acrylic-based, epoxy-based, phenol-based, silicone-based, polyolefin-based, polyimide-based, vinyl-based monomers or oligomers are mixed with the above-mentioned polymer. May be.
 配線構造100は、図2(a)に示す二点鎖線aに沿って切断加工される。この結果、不要部分が除去された完成品(図5A参照)が得られる。不要部分の除去は必須の処理ではなく、図2Aに示す配線構造100が完成品であってもよい。 The wiring structure 100 is cut and processed along the alternate long and two short dashes line a shown in FIG. As a result, a finished product (see FIG. 5A) from which unnecessary parts are removed is obtained. The removal of the unnecessary portion is not an essential process, and the wiring structure 100 shown in FIG. 2A may be a completed product.
 図5Aは、完成品の配線構造100にチップ部品91,92,93,94がマウントされた状態を示している。チップ91が穴63に配置されており、穴63内に露出するランド51にチップ91がマウントされている。3個のチップ92,93,94が3個の穴64に配置されており、穴64内に露出するランド53にチップ92,93,94がマウントされている。チップ91は例えばマイクロコンピュータであり、チップ92,93,94は抵抗器とコンデンサのような電子部品である。チップ91,92,93,94は、第1粘着剤層42に押し付けられることによって第1粘着剤層42に粘着する。つまり、チップ91,92,93,94のマウントは、半田処理あるいは熱処理を必要としない。 FIG. 5A shows a state in which chip components 91, 92, 93, and 94 are mounted on the wiring structure 100 of the finished product. The chip 91 is arranged in the hole 63, and the chip 91 is mounted on the land 51 exposed in the hole 63. Three chips 92, 93, 94 are arranged in the three holes 64, and the chips 92, 93, 94 are mounted on the land 53 exposed in the holes 64. The chip 91 is, for example, a microcomputer, and the chips 92, 93 and 94 are electronic parts such as resistors and capacitors. The chips 91, 92, 93, 94 adhere to the first adhesive layer 42 by being pressed against the first adhesive layer 42. That is, the mounting of the chips 91, 92, 93, 94 does not require soldering or heat treatment.
 配線構造100の左右方向の両端部において第2層構造60の切欠き65から接続部54が露出しており、第1粘着剤層42の粘着によって外部回路が接続部54に電気的および機械的に接続される。 The connection portion 54 is exposed from the cutouts 65 of the second layer structure 60 at both ends in the left-right direction of the wiring structure 100, and an external circuit is electrically and mechanically connected to the connection portion 54 by the adhesion of the first adhesive layer 42. Connected to.
 実施形態から明らかなように、外部回路と接続するための接続部を除いて、配線構造に含まれる配線の一部つまり導体部80は、第1層構造の第1導体つまり線状部55と第2層構造の第2導体つまり第2配線71との重なりによって形成される。よって、2個の導体の重なり合いによって厚い導体部80を構成するので、導体部80の抵抗は小さくなる。別の観点から説明すると、配線構造100に含まれる配線は、線状の導体部80を含み、導体部80の少なくとも一部(実施形態では導体部80の全部)は、第1層構造40の第1導体55と第2層構造60の第2導体71との重ね合わせによって形成された導体である。実施形態において、配線構造100に含まれる配線は、ランド51、ランド53、接続部54を含まない。 As is apparent from the embodiment, except for the connection portion for connecting to an external circuit, a part of the wiring included in the wiring structure, that is, the conductor portion 80, is the same as the first conductor of the first layer structure, that is, the linear portion 55. It is formed by overlapping the second conductor of the second layer structure, that is, the second wiring 71. Therefore, since the thick conductor portion 80 is formed by the overlapping of the two conductors, the resistance of the conductor portion 80 becomes small. To describe from another viewpoint, the wiring included in the wiring structure 100 includes the linear conductor portion 80, and at least a part of the conductor portion 80 (the whole conductor portion 80 in the embodiment) is included in the first layer structure 40. It is a conductor formed by stacking the first conductor 55 and the second conductor 71 of the second layer structure 60. In the embodiment, the wiring included in the wiring structure 100 does not include the land 51, the land 53, and the connection portion 54.
 実施形態から明らかなように、一方の基板に形成された第1導体と他方の基板に形成された第2導体との重ね合わせによって大きな厚みを持つ導体部(つまり、配線構造の配線の少なくとも一部)が形成される。よって、基板上の導体が、厚い導体を形成することが困難な印刷法によって形成される場合に、実施形態の配線構造は有用である。あるいは、複数の細い導線が狭い間隔(例えば、隣り合う二つの導線の間隔が0.3mm以下である)で配置されるファインピッチ配線の場合にも、実施形態の配線構造は有用である。さらに、導線の幅が狭い(例えば、導線の幅は0.3mm以下である)場合にも、実施形態の配線構造は有用である。 As is clear from the embodiment, the conductor portion having a large thickness (that is, at least one of the wirings of the wiring structure is formed by superimposing the first conductor formed on one substrate and the second conductor formed on the other substrate). Part) is formed. Therefore, the wiring structure of the embodiment is useful when the conductor on the substrate is formed by a printing method in which it is difficult to form a thick conductor. Alternatively, the wiring structure of the embodiment is also useful in the case of fine-pitch wiring in which a plurality of thin conductive wires are arranged at narrow intervals (for example, the interval between two adjacent conductive wires is 0.3 mm or less). Furthermore, the wiring structure of the embodiment is useful even when the width of the conductive wire is narrow (for example, the width of the conductive wire is 0.3 mm or less).
 実施形態から明らかなように、配線構造に含まれる配線の少なくとも一部は、一方の基板に形成された第1導体と他方の基板に形成された第2導体との重ね合わせによって形成される。よって、一方の導体に例えば導電不良が生じたとしても、他方の導体に導電不良が生じていないかぎり配線構造は正しく機能する。この点で、実施形態の配線構造は良好な歩留まりを達成する。 As is clear from the embodiment, at least a part of the wiring included in the wiring structure is formed by superimposing the first conductor formed on one substrate and the second conductor formed on the other substrate. Therefore, for example, even if one conductor has a poor conductivity, the wiring structure functions properly unless the other conductor has a poor conductivity. In this respect, the wiring structure of the embodiment achieves a good yield.
 実施形態の配線構造は、図5Bの断面図に示すように、上下対称構造を持つ。導体部80の上側に第2粘着剤層62と第2基部61が位置し、導体部80の下側に、第1粘着剤層42と第1基部41が位置している。導体部80は、これら粘着剤層および基部によって挟まれており、配線構造の断面の中央に位置する。よって、配線構造100の狭幅伸長部101(図5A参照)が例えばケーブル部であり、導体部80の伸長方向および狭幅伸長部101の幅方向と直交する方向に曲げが加わっても、導体部80に圧縮応力や引張応力は強く加わらない。したがって、粘着剤層の剥れが発生しにくく、曲げに強いケーブル部を実現できる。 The wiring structure of the embodiment has a vertically symmetrical structure as shown in the cross-sectional view of FIG. 5B. The second adhesive layer 62 and the second base portion 61 are located above the conductor portion 80, and the first adhesive layer 42 and the first base portion 41 are located below the conductor portion 80. The conductor portion 80 is sandwiched between the adhesive layer and the base portion, and is located at the center of the cross section of the wiring structure. Therefore, even if the narrow-width extension 101 (see FIG. 5A) of the wiring structure 100 is, for example, a cable, and the bending is applied in the extension direction of the conductor portion 80 and the direction orthogonal to the width direction of the narrow-width extension 101, the conductor No compressive stress or tensile stress is strongly applied to the portion 80. Therefore, peeling of the adhesive layer is unlikely to occur, and a cable portion that is resistant to bending can be realized.
 第2配線71が線状部55の形状と完全に一致する形状を持つ必要は無く、第2配線71の一部が線状部55と重ならなくてもよいし、第2配線71の一部または全部の線幅が線状部55の線幅と異なってもよい。 The second wiring 71 does not have to have a shape that completely matches the shape of the linear portion 55, and a part of the second wiring 71 does not have to overlap the linear portion 55. The line width of the part or the whole may be different from the line width of the linear part 55.
 実施形態では、第1配線50が形成されていない第1粘着剤層42の表面の一部は、チップ91,92,93,94の粘着に使用される。したがって、第1層構造40と第2層構造60の機械的結合は、第1粘着剤層42の第1配線50が形成されていない表面の少なくとも一部と、第2粘着剤層62の第2配線71が形成されていない表面の少なくとも一部が相互に接着することによって達成される。 In the embodiment, a part of the surface of the first adhesive layer 42 on which the first wiring 50 is not formed is used for adhering the chips 91, 92, 93, 94. Therefore, the mechanical coupling between the first layer structure 40 and the second layer structure 60 is performed by at least a part of the surface of the first adhesive layer 42 where the first wiring 50 is not formed and the second adhesive layer 62 of the first adhesive layer 62. This is achieved by adhering at least some of the surfaces on which the two wirings 71 are not formed to each other.
 上述の説明から配線構造100を生産する方法は明らかであるが、再度、その工程を説明する。 The method for producing the wiring structure 100 is clear from the above description, but the process will be described again.
 まず、第1基部41と、第1粘着剤層42と、線状の第1導体55を含む第1層構造40を製造する(ステップS1)。次に、第2基部61と、第2粘着剤層62と、線状の第2導体71を含む第2層構造60を製造する(ステップS2)。ただし、この順序でなく、ステップS2の後にステップS1を実行してもよい。さらに、第1導体55が形成されていない第1粘着剤層42の表面の少なくとも一部と第2導体71が形成されていない第2粘着剤層62の表面の少なくとも一部とを、互いに接着させ、且つ、第1導体55と第2導体71を互いに重なり合わせることによって配線構造100を得る(ステップS3)。 First, the first layer structure 40 including the first base portion 41, the first adhesive layer 42, and the linear first conductor 55 is manufactured (step S1). Next, the second layer structure 60 including the second base portion 61, the second adhesive layer 62, and the linear second conductor 71 is manufactured (step S2). However, step S1 may be executed after step S2 instead of this order. Further, at least a part of the surface of the first adhesive layer 42 on which the first conductor 55 is not formed and at least a part of the surface of the second adhesive layer 62 on which the second conductor 71 is not formed are adhered to each other. Then, the wiring structure 100 is obtained by overlapping the first conductor 55 and the second conductor 71 with each other (step S3).
 第1基部41および第1粘着剤層42が透明体であり、または、第2基部61および第2粘着剤層62が透明体であり、または、第1基部41、第1粘着剤層42、第2基部61および第2粘着剤層62が透明体である場合、ステップS3の処理は、透明体を通して得られる形状情報(つまり、実施形態では、アラインメントマーカ56,72のそれぞれの形状情報)を利用して第1層構造40と第2層構造60との位置合わせを実行するプロセスを含んでもよい。 The first base 41 and the first pressure-sensitive adhesive layer 42 are transparent bodies, or the second base 61 and the second pressure-sensitive adhesive layer 62 are transparent bodies, or the first base 41, the first pressure-sensitive adhesive layer 42, When the second base portion 61 and the second pressure-sensitive adhesive layer 62 are transparent bodies, the process of step S3 includes the shape information obtained through the transparent bodies (that is, the shape information of each of the alignment markers 56 and 72 in the embodiment). The process may be utilized to perform alignment of the first layer structure 40 and the second layer structure 60.
 「接続された」という用語とこのあらゆる語形変形は、2又はそれ以上の要素間の直接的又は間接的な接続を意味する。互いに「接続」された2つの要素の間に1又はそれ以上の中間要素が存在してもよい。 The term “connected” and any inflections thereof mean a direct or indirect connection between two or more elements. There may be one or more intermediate elements between two elements that are "connected" to each other.
 序数詞(例えば、接頭辞「第」に漢数詞または算用数字を組み合わせた「第○」)は、特段の断りが無い限り、序数詞で修飾されるまたは序数詞と結合する要素を当該要素の順序または当該要素の量で限定することを意図しない。序数詞の使用は、特段の断りが無い限り、単に、2つ以上の要素を互いに区別する便利な表現方法として使用される。したがって、例えば語句「第1X」と語句「第2X」は、2つのXを区別するための表現であり、Xの総数が2であることを意味するものでは必ずしもなく、あるいは、第1Xが第2Xに先行しなければならないことを意味するものでは必ずしもない。 Unless otherwise specified, an ordinal number (for example, “No. ○” in which the prefix “No.” is combined with a Chinese number or an arithmetic digit) is an element that is modified by the ordinal number or combined with the ordinal number in the order of the elements or It is not intended to be limited by the amount of the element. The use of ordinal numbers is simply used as a convenient method of distinguishing two or more elements from each other, unless otherwise stated. Therefore, for example, the phrase “first X” and the phrase “second X” are expressions for distinguishing two Xs, and do not necessarily mean that the total number of Xs is 2, or the first X is the first. It does not necessarily mean that 2X must precede.
 用語「含む」とその語形変化は非排他的表現として使用されている。例えば、「XはAとBを含む」という文は、XがAとB以外の構成要素(例えばC)を含むことを否定しない。また、或る文が用語「含む」またはその語形変化が否定辞と結合した語句を含む場合、当該文は用語「含む」またはその語形変化の目的語について言及するだけである。したがって、例えば「XはAとBを含まない」という文は、XがAとB以外の構成要素を含む可能性を認めている。さらに、明細書あるいは請求の範囲において使用されている用語「または」は排他的論理和ではないことが意図される。 The term “include” and its inflection are used as non-exclusive expressions. For example, the sentence “X includes A and B” does not deny that X includes components other than A and B (eg, C). Further, when a sentence includes the term “comprise” or its inflection includes a phrase combined with a negation, the sentence only refers to the term “comprise” or the object of the inflection. Thus, for example, the sentence "X does not include A and B" acknowledges that X may include components other than A and B. Furthermore, the term "or" as used in the specification or claims is not intended to be an exclusive OR.
 本開示において、例えば、英語でのa, an及びtheのように、翻訳によって冠詞が追加された場合、本開示は、これらの冠詞の後に続く名詞が複数形であることを含んでもよい。 In the present disclosure, if translations add articles, such as a,  an and the in English, the present disclosure may include that nouns following these articles are plural.
 以上、本発明の実施形態について説明したが、本発明はこれらの実施形態に限定されるものではない。本発明の要旨を逸脱しない範囲において種々の変更と変形が許される。選択され且つ説明された実施形態は、本発明の原理およびその実際的応用を解説するためのものである。本発明は様々な変更あるいは変形を伴って様々な実施形態として使用され、様々な変更あるいは変形は期待される用途に応じて決定される。そのような変更および変形のすべては、添付の請求の範囲によって規定される本発明の範囲に含まれることが意図されており、公平、適法および公正に与えられる広さに従って解釈される場合、同じ保護が与えられることが意図されている。 Although the embodiments of the present invention have been described above, the present invention is not limited to these embodiments. Various modifications and variations are allowed without departing from the scope of the present invention. The selected and described embodiments are intended to illustrate the principles of the invention and its practical application. The present invention is used in various embodiments with various modifications or variations, and the various modifications or variations are determined according to the intended use. All such modifications and variations are intended to be included within the scope of this invention as defined by the appended claims and, when interpreted in a fair, lawful and fairly imparted breadth, the same. Protection is intended to be given.
10 配線構造
11 フィルム
11a 一面
12 粘着剤層
13 配線
13a ランド
13b ランド
20 マイクロホン
20a 底面
21 端子
30 カバーフィルム
31 窓
32 切欠き
40 第1層構造
41 第1基部
42 第1粘着剤層
50 第1配線
51 ランド
52 導線部
53 ランド
54 接続部
55 線状部
56 アラインメントマーカ
60 第2層構造
61 第2基部
62 第2粘着剤層
63 穴
64 穴
65 切欠き
71 第2配線
72 アラインメントマーカ
80 導体部
91 チップ
92 チップ
93 チップ
94 チップ
100 配線構造
101 狭幅伸長部
10 Wiring Structure 11 Film 11a One Surface 12 Adhesive Layer 13 Wiring 13a Land 13b Land 20 Microphone 20a Bottom 21 Terminal 30 Cover Film 31 Window 32 Notch 40 First Layer Structure 41 First Base 42 First Adhesive Layer 50 First Wiring 51 land 52 conducting wire portion 53 land 54 connecting portion 55 linear portion 56 alignment marker 60 second layer structure 61 second base portion 62 second adhesive layer 63 hole 64 hole 65 notch 71 second wiring 72 alignment marker 80 conductor portion 91 Chip 92 Chip 93 Chip 94 Chip 100 Wiring structure 101 Narrow width extension

Claims (7)

  1.  配線構造であって、
     第1層構造と、
     第2層構造と
    を含み、
     上記第1層構造は、
     第1基部と、
     上記第1基部の上に形成された絶縁性の第1粘着剤層と、ただし、第1粘着剤層は弾性変形可能であり、
     上記第1粘着剤層の上に形成された線状の第1導体と
    を含み、
     上記第2層構造は、
     第2基部と、
     上記第2基部の上に形成された絶縁性の第2粘着剤層と、ただし、第2粘着剤層は弾性変形可能であり、
     上記第2粘着剤層の上に形成された線状の第2導体と
    を含み、
     上記第1導体が形成されていない上記第1粘着剤層の表面の少なくとも一部と上記第2導体が形成されていない上記第2粘着剤層の表面の少なくとも一部とが、互いに接着しており、
     上記第1導体と上記第2導体は互いに重なり合っており、
     上記配線構造に含まれる配線は、線状の導体部を含み、
     上記導体部の少なくとも一部は、上記第1導体と上記第2導体との重ね合わせによって形成された導体である。
    Wiring structure,
    A first layer structure,
    And a second layer structure,
    The first layer structure is
    A first base,
    An insulating first adhesive layer formed on the first base portion, provided that the first adhesive layer is elastically deformable;
    A linear first conductor formed on the first adhesive layer,
    The second layer structure is
    A second base,
    An insulating second adhesive layer formed on the second base portion, provided that the second adhesive layer is elastically deformable;
    A second linear conductor formed on the second adhesive layer,
    At least a part of the surface of the first pressure-sensitive adhesive layer on which the first conductor is not formed and at least a part of the surface of the second pressure-sensitive adhesive layer on which the second conductor is not formed are adhered to each other. Cage,
    The first conductor and the second conductor overlap each other,
    The wiring included in the wiring structure includes a linear conductor portion,
    At least a part of the conductor portion is a conductor formed by overlapping the first conductor and the second conductor.
  2.  請求項1に記載の配線構造において、
     上記第1導体は、導電インキの硬化物であり、
     上記第2導体は、導電インキの硬化物である。
    The wiring structure according to claim 1,
    The first conductor is a cured product of conductive ink,
    The second conductor is a cured product of conductive ink.
  3.  請求項1または請求項2に記載の配線構造において、
     上記導体部は、ファインピッチ配線に含まれる導線である。
    In the wiring structure according to claim 1 or 2,
    The conductor portion is a conductor included in the fine pitch wiring.
  4.  請求項1から請求項3のいずれかに記載の配線構造において、
     上記第1基部および上記第1粘着剤層は透明体である、
     または、
     上記第2基部および上記第2粘着剤層は透明体である、
     または、
     上記第1基部、上記第1粘着剤層、上記第2基部および上記第2粘着剤層は透明体である。
    The wiring structure according to any one of claims 1 to 3,
    The first base and the first pressure-sensitive adhesive layer are transparent bodies,
    Or
    The second base and the second pressure-sensitive adhesive layer are transparent bodies,
    Or
    The first base, the first pressure-sensitive adhesive layer, the second base and the second pressure-sensitive adhesive layer are transparent bodies.
  5.  請求項1から請求項4のいずれかに記載の配線構造において、
     上記配線は、外部回路と接続するための接続部を含まない。
    The wiring structure according to any one of claims 1 to 4,
    The wiring does not include a connecting portion for connecting to an external circuit.
  6.  配線構造を生産する方法であって、
     第1基部と、
     上記第1基部の上に形成された絶縁性の第1粘着剤層と、ただし、第1粘着剤層は弾性変形可能であり、
     上記第1粘着剤層の上に形成された線状の第1導体と
    を含む第1層構造を製造するステップと、
     第2基部と、
     上記第2基部の上に形成された絶縁性の第2粘着剤層と、ただし、第2粘着剤層は弾性変形可能であり、
     上記第2粘着剤層の上に形成された線状の第2導体と
    を含む第2層構造を製造するステップと、
     上記第1導体が形成されていない上記第1粘着剤層の表面の少なくとも一部と上記第2導体が形成されていない上記第2粘着剤層の表面の少なくとも一部とを、互いに接着させ、且つ、上記第1導体と上記第2導体を互いに重なり合わせることによって上記配線構造を得る組み立てステップと
    を含む。
    A method of producing a wiring structure, comprising:
    A first base,
    An insulating first adhesive layer formed on the first base portion, provided that the first adhesive layer is elastically deformable;
    Manufacturing a first layer structure including a linear first conductor formed on the first adhesive layer;
    A second base,
    An insulating second adhesive layer formed on the second base portion, provided that the second adhesive layer is elastically deformable;
    Manufacturing a second layer structure including a linear second conductor formed on the second pressure-sensitive adhesive layer;
    At least a part of the surface of the first pressure-sensitive adhesive layer on which the first conductor is not formed and at least a part of the surface of the second pressure-sensitive adhesive layer on which the second conductor is not formed are adhered to each other, And an assembling step of obtaining the wiring structure by overlapping the first conductor and the second conductor with each other.
  7.  請求項6に記載の方法であって、
     上記第1基部および上記第1粘着剤層は透明体であり、
     または、
     上記第2基部および上記第2粘着剤層は透明体であり、
     または、
     上記第1基部、上記第1粘着剤層、上記第2基部および上記第2粘着剤層は透明体であり、
     上記組み立てステップは、透明体を通して得られる形状情報を利用して上記第1層構造と上記第2層構造との位置合わせを実行するプロセスを含む。
    The method of claim 6, wherein
    The first base and the first pressure-sensitive adhesive layer are transparent bodies,
    Or
    The second base and the second pressure-sensitive adhesive layer are transparent bodies,
    Or
    The first base, the first adhesive layer, the second base and the second adhesive layer are transparent bodies,
    The assembling step includes a process of performing alignment between the first layer structure and the second layer structure using shape information obtained through a transparent body.
PCT/JP2020/005119 2019-02-13 2020-02-10 Wiring structure and method for producing wiring structure WO2020166555A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794861A (en) * 1993-09-27 1995-04-07 Matsushita Electric Ind Co Ltd Circuit connection method
JPH07226569A (en) * 1994-02-10 1995-08-22 Matsushita Electric Ind Co Ltd Circuit board and electrode connection member and its manufacture
JP2000049423A (en) * 1998-07-30 2000-02-18 Sony Chem Corp Flexible substrate
JP2006032590A (en) * 2004-07-15 2006-02-02 Matsushita Electric Ind Co Ltd Connection structure of circuit board and its manufacturing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794861A (en) * 1993-09-27 1995-04-07 Matsushita Electric Ind Co Ltd Circuit connection method
JPH07226569A (en) * 1994-02-10 1995-08-22 Matsushita Electric Ind Co Ltd Circuit board and electrode connection member and its manufacture
JP2000049423A (en) * 1998-07-30 2000-02-18 Sony Chem Corp Flexible substrate
JP2006032590A (en) * 2004-07-15 2006-02-02 Matsushita Electric Ind Co Ltd Connection structure of circuit board and its manufacturing method

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