WO2020162345A1 - ジベンゾピロメテンホウ素キレート化合物、近赤外光吸収材料、有機薄膜及び有機エレクトロニクスデバイス - Google Patents
ジベンゾピロメテンホウ素キレート化合物、近赤外光吸収材料、有機薄膜及び有機エレクトロニクスデバイス Download PDFInfo
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- WO2020162345A1 WO2020162345A1 PCT/JP2020/003632 JP2020003632W WO2020162345A1 WO 2020162345 A1 WO2020162345 A1 WO 2020162345A1 JP 2020003632 W JP2020003632 W JP 2020003632W WO 2020162345 A1 WO2020162345 A1 WO 2020162345A1
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Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
- H10K85/322—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising boron
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/022—Boron compounds without C-boron linkages
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
Definitions
- the present invention relates to a novel dibenzopyrromethene boron chelate compound having an absorption band in the near infrared light region, a near infrared light absorbing material containing the compound, a thin film, and an organic electronic device.
- the near-infrared light absorbing material having an absorption band in the wavelength range of 700 to 2500 nm has been conventionally considered for various industrial applications.
- Specific applications include optical information recording media such as CD-R (Compact Disc-Recordable); thermal CTP (Computer To Plate); printing applications such as flash toner fixing and laser thermal recording; heat-blocking film, etc.
- optical information recording media such as CD-R (Compact Disc-Recordable); thermal CTP (Computer To Plate); printing applications such as flash toner fixing and laser thermal recording; heat-blocking film, etc.
- CD-R Compact Disc-Recordable
- thermal CTP Computer To Plate
- printing applications such as flash toner fixing and laser thermal recording
- heat-blocking film etc.
- the near infrared absorbing ink by dissolving or dispersing a dye containing a near infrared absorbing material in a solvent.
- the printed matter using the near-infrared light absorbing ink can be read only by a near-infrared light detector or the like and is difficult to visually recognize (invisible image). Used for etc.
- Inorganic near-infrared light absorbing materials and organic near-infrared light absorbing materials are known as such near-infrared light absorbing materials for forming invisible images.
- examples of the inorganic near-infrared light absorbing material include rare earth metals such as ytterbium, and copper phosphate crystallized glass.
- these inorganic near-infrared light absorbing materials do not have sufficient light-absorbing ability in the near-infrared region, and therefore a large amount of near-infrared light absorbing material is required per unit area for forming an invisible image.
- the unevenness of the surface of the invisible image as a base may affect the surface state of the visible image.
- organic near-infrared absorbing materials have sufficient absorption of light in the near-infrared region, so the amount of near-infrared absorbing materials used per unit area required for forming an invisible image should be adjusted to the inorganic type.
- the amount can be reduced as compared with the near-infrared light absorbing material, and the inconvenience that occurs when an inorganic near-infrared light absorbing material is used does not occur. Therefore, many organic near-infrared light absorbing materials have been developed to date.
- an organic electronic device does not contain a rare metal or the like as a raw material and can not only be stably supplied, but also have a flexibility not possessed by an inorganic material and can be manufactured by a wet film forming method. Recently, it has become very interesting. Specific examples of the organic electronic device include an organic EL element, an organic solar cell element, an organic photoelectric conversion element, an organic transistor element, and the like, and further, applications utilizing the characteristics of organic materials are being studied.
- Patent Document 1 there is a study aimed at applying an existing dye such as squarylium, which is one of the infrared absorbing materials described above, to a photoelectric conversion material in the near infrared region, Organic electronic materials using squarylium have poor robustness and are not practical.
- an existing dye such as squarylium, which is one of the infrared absorbing materials described above
- Non-Patent Documents 1 and 2 report on a boron-dipyrromethene (hereinafter, referred to as “BODIPY”) dye that exhibits an absorption band to a fluorescence band in a red or near-infrared light region and has excellent fastness.
- BODIPY boron-dipyrromethene
- a simple BODIPY dye has a strong absorption band near 500 nm, and by extending the ⁇ -conjugated system and introducing an aromatic group into which an electron-donating substituent is introduced, a near-infrared light region can be obtained. It is described that it is possible to extend the absorption wavelength.
- Patent Documents 3 to 5 describe that by compounding a compound having a BODIPY skeleton with B—O chelate, the robustness of the compound to light can be further improved and the absorption wavelength can be shifted to the long wavelength side.
- Patent Documents 3 and 4 also describe examples in which these B—O chelated compounds are applied to organic solar cell elements and organic photoelectric conversion elements.
- the compounds described in Patent Documents 3 and 4 cannot be said to have a sufficiently long absorption wavelength, and Patent Document 5 does not refer to the absorption wavelength or the photoelectric conversion characteristics in the near infrared region. ..
- Patent Document 6 exemplifies a photoelectric conversion element having absorption in the near-infrared region, which uses a compound obtained by chelating a thiophene ring and B—O chelate. For use in photoelectric conversion applications, it is required to further lengthen the photoelectric conversion wavelength and increase the sensitivity of photoelectric conversion characteristics in the near infrared region.
- the object of the present invention is to have a broad absorption in the near infrared region and an organic compound having excellent photoelectric conversion efficiency in the near infrared region, a near infrared light absorbing material containing the compound, and the near infrared light absorbing material.
- the present inventors have studied to solve the above problems, developed a novel dibenzopyrromethene boron chelate compound that exhibits sufficient performance when used in organic electronic devices, and in addition, The present inventors have found that the existing organic electronic device functions as a near-infrared photoelectric conversion element, and completed the present invention. That is, the present invention is as follows. [1] The following formula (1)
- R 1 to R 8 are each independently a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, an alkylthio group, an aromatic group, a heterocyclic group, a halogen atom, a hydroxyl group, a mercapto group, a nitro group.
- R 9 to R 12 are each independently a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, an alkylthio group, an aromatic group, a heterocyclic group, a halogen atom, a hydroxyl group, a mercapto group, or a nitro group.
- At least one of R 1 to R 4 is an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group or a halogen atom
- at least one of R 5 to R 8 is an aliphatic hydrocarbon group, an aromatic group.
- R 1 and R 8 are the same, R 2 and R 7 are the same, R 3 and R 6 are the same, and R 4 and R 5 are the same [1]
- R 9 and R 10 is an aromatic group or a heterocyclic group
- R 11 and R 12 is an aromatic group or a heterocyclic group.
- R 10 and R 11 are the following formula (2)
- R 21 to R 25 are each independently a hydrogen atom, an alkoxy group, an alkylthio group, an aromatic group, a heterocyclic group, a substituted amino group, an unsubstituted amino group, or an electron-accepting substituent, or Represents an atom, and R 21 and R 22 may be bonded to each other or R 22 and R 23 may be bonded to each other to form an aromatic ring or a heterocycle, provided that at least one of R 21 to R 25 is Or an electron-accepting substituent or atom, or R 21 and R 22 are bonded to each other, or R 22 and R 23 are bonded to each other to form an electron-accepting aromatic ring or heterocycle.
- R 21 to R 25 is a halogen atom, a formyl group, an acetyl group, an alkoxycarbonyl group, a trifluoromethyl group, a cyano group, a nitro group, a toluenesulfonyl group, a methanesulfonyl group, a trifluoromethanesulfonyl group, An electron-accepting substituent or atom selected from the group consisting of a pyridyl group, a quinolyl group, a pyrazyl group, a quinoxalyl group, a thiazolyl group, a benzothiazolyl group, an indolyl group, a benzothiadiazolyl group, a succinimidoyl group and a phthalimidoyl group.
- the organic thin film using the novel compound of the present invention has a main absorption band in the near infrared light region. Further, a near infrared photoelectric conversion element is realized by using the compound and/or the organic thin film.
- the compound can be used for various organic electronic devices.
- FIG. 1 is a sectional view illustrating an embodiment of the organic photoelectric conversion element of the present invention.
- FIG. 2 is a schematic cross-sectional view showing an example of the layer structure of the organic electroluminescence element.
- the near-infrared region means a wavelength region of light in the range of 750 to 2500 nm
- the near-infrared light absorbing material (or dye) means the absorption wavelength mainly in the near-infrared light region.
- the near-infrared light emitting material (or dye) means a material (or dye) emitting light in the near infrared light region.
- the compound of the present invention is represented by the following formula (1).
- R 1 to R 8 are each independently a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, an alkylthio group, an aromatic group, a heterocyclic group, a halogen atom, a hydroxyl group, a mercapto group, a nitro group, It represents a substituted amino group, an unsubstituted amino group, a cyano group, a sulfo group, or an acyl group.
- at least one of R 1 to R 4 represents other than hydrogen atom
- at least one of R 5 to R 8 represents other than hydrogen atom.
- the aliphatic hydrocarbon group represented by R 1 to R 8 in the formula (1) may be a saturated or unsaturated linear, branched or cyclic aliphatic hydrocarbon and has 1 carbon atom. To 30 are preferred, 1 to 20 are more preferred, and 3 to 10 are even more preferred.
- specific examples of the saturated or unsaturated linear, branched or cyclic aliphatic hydrocarbon group include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an iso-butyl group.
- the aliphatic hydrocarbon group represented by R 1 to R 8 in the formula (1) is preferably a linear or branched aliphatic hydrocarbon group, and a linear or branched alkyl group. Is more preferable, and n-butyl group, n-hexyl group, n-octyl group, n-decyl group, n-dodecyl group, 2-ethylhexyl group, 2-methylpropyl group or 2-butyloctyl group Is more preferable, and an n-hexyl group, an n-octyl group or a 2-methylpropyl group is particularly preferable.
- the alkoxy group represented by R 1 to R 8 in the formula (1) is a substituent in which an oxygen atom and an alkyl group are bonded, and examples of the alkyl group in the alkoxy group include R 1 to R 8 in the formula (1).
- the alkyl group described as a specific example in the section of the aliphatic hydrocarbon group represented by R 8 can be mentioned.
- the alkoxy group represented by R 1 to R 8 in the formula (1) may have a substituent such as an alkoxy group.
- the alkylthio group represented by R 1 to R 8 in the formula (1) is a substituent in which a sulfur atom and an alkyl group are bonded, and examples of the alkyl group in the alkylthio group include R 1 to R 8 in the formula (1).
- the alkyl group described as a specific example in the section of the aliphatic hydrocarbon group represented by R 8 can be mentioned.
- the alkylthio group represented by R 1 to R 8 in the formula (1) may have a substituent such as an alkylthio group.
- the aromatic group represented by R 1 to R 8 in formula (1) is not particularly limited as long as it is a residue obtained by removing one hydrogen atom from the aromatic ring of an aromatic compound, and examples thereof include a phenyl group and a biphenyl group. Examples thereof include an indenyl group, a naphthyl group, an anthryl group, a fluorenyl group, a pyrenyl group, a phenanthnyl group and a mestyl group. A phenyl group or a naphthyl group is preferable, and a phenyl group is more preferable.
- the aromatic compound which can be an aromatic group may have a substituent, and the substituent which may have is not particularly limited, but may be an alkyl group having 1 to 4 carbon atoms, a halogen atom or phenyl.
- a group is preferable, and a methyl group, a halogen atom or a phenyl group is more preferable.
- the heterocyclic group represented by R 1 to R 8 in the formula (1) is not particularly limited as long as it is a residue obtained by removing one hydrogen atom from the heterocycle of the heterocyclic compound, and examples thereof include a furanyl group, a thienyl group, Thienothienyl group, pyrrolyl group, imidazolyl group, N-methylimidazolyl group, thiazolyl group, oxazolyl group, pyridyl group, pyrazyl group, pyrimidyl group, quinolyl group, indolyl group, benzopyrazyl group, benzopyrimidyl group, benzothienyl group, benzothiazolyl group, pyri Dinothiazolyl group, benzimidazolyl group, pyridinoimidazolyl group, N-methylbenzimidazolyl group, pyridino-N-methylimidazolyl group, benzoxazolyl group, pyri
- a group or a pyridinothiadiazolyl group is preferable, and a thienyl group, a thiazolyl group, a benzothiazolyl group or a benzothiadiazolyl group is more preferable.
- the heterocyclic compound that can be a heterocyclic group may have a substituent, and the substituent that may have is not particularly limited.
- Examples of the halogen atom represented by R 1 to R 8 in the formula (1) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, preferably a fluorine atom or a chlorine atom, and more preferably a fluorine atom.
- the substituted amino group represented by R 1 to R 8 in formula (1) is a substituent in which one or two hydrogen atoms of the amino group are substituted with a substituent.
- the substituent that the substituted amino group has is preferably an alkyl group or an aromatic group, and more preferably an aromatic group. Specific examples of these substituents include the alkyl group described in the section of the aliphatic hydrocarbon group represented by R 1 to R 8 in the formula (1) and the aromatic group represented by R 1 to R 8 in the formula (1). The same as the group can be mentioned.
- the unsubstituted amino group represented by R 1 to R 8 in the formula (1) means an NH 2 group.
- the acyl group represented by R 1 to R 8 in the formula (1) is a substituent in which a carbonyl group and an aromatic group or an alkyl group are bonded, and the alkyl group and the aromatic group in the acyl group are represented by the formula ( The same as the alkyl group described in the item of the aliphatic hydrocarbon group represented by R 1 to R 8 in 1) and the aromatic group represented by R 1 to R 8 in the formula (1) can be mentioned.
- R 1 to R 8 in formula (1) at least one of R 1 to R 4 is an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group, a halogen atom or a substituted amino group, and R 5 to R 8 At least one of R 8 is preferably an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group, a halogen atom or a substituted amino group, and at least one of R 1 to R 4 is an aliphatic hydrocarbon group or an aromatic group.
- R 5 to R 8 is an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group or a halogen atom
- R 1 to R 4 One of them is an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group or a halogen atom, the remaining three are hydrogen atoms, and one of R 5 to R 8 is an aliphatic hydrocarbon group, an aromatic group.
- the remaining three groups are a group, a heterocyclic group or a halogen atom
- one of R 1 to R 4 is an aromatic group, a heterocyclic group or a halogen atom and the remaining three are hydrogen atoms.
- three is a hydrogen atom and one aromatic group of R 5 to R 8, particularly preferably a heterocyclic group, or a halogen atom and the remaining three are hydrogen atoms, the R 1 to R 4 Most preferably, one of them is a halogen atom and the remaining three are hydrogen atoms, and one of R 5 to R 8 is a halogen atom and the remaining three are hydrogen atoms.
- R 1 to R 4 is a substituent or a halogen atom
- the remaining three are hydrogen atoms
- one of R 5 to R 8 is a substituent or a halogen atom.
- the substituent or the substitution position of the halogen atom is preferably R 2 and R 7 , or R 3 and R 6 .
- a substituent means a thing other than a hydrogen atom and a halogen atom among the examples of R 1 to R 8 .
- R 2 and R 7 are each independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group, a halogen atom or a substituted amino group, and R 1 , R 3 to R 6, and R 8 are hydrogen atoms.
- R 3 and R 6 are each independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group, a halogen atom or a substituted amino group, and R 1 , R 2 , R 4 , R 5 and R 7 And R 8 is preferably a hydrogen atom, and R 2 and R 7 are each independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group or a halogen atom, and R 1 , R 3 to R 6 and R 8 is a hydrogen atom, or R 3 and R 6 are independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group or a halogen atom, and R 1 , R 2 , R 4 , R 5 and R 7 And R 8 is more preferably a hydrogen atom, R 2 and R 7 are each independently an aromatic group, a heterocyclic group or a halogen atom, and R 1 , R 3 to R 6 and R 8 are hydrogen atoms.
- R 3 and R 6 are each independently an aromatic group, a heterocyclic group or a halogen atom, and R 1 , R 2 , R 4 , R 5 , R 7 and R 8 are hydrogen atoms.
- R 2 and R 7 are each independently a halogen atom and R 1 , R 3 to R 6 and R 8 are hydrogen atoms, or R 3 and R 6 are each independently a halogen atom and R 1 , R 2 , R 4 , R 5 , R 7 and R 8 are particularly preferably hydrogen atoms.
- R 1 to R 8 in the formula (1) R 1 and R 8 are the same, R 2 and R 7 are the same, R 3 and R 6 are the same, and It is also a preferred embodiment that R 4 and R 5 are the same.
- R 2 and R 7 , or R 3 and R 6 are substituents or a halogen atom and the other are hydrogen atoms, both R 2 and R 7 are the same aliphatic group.
- R 2 and R 7 are the same aromatic group, heterocyclic group or halogen atom
- R 1 , R 3 to R 6 and R 8 are hydrogen atoms, or both R 3 and R 6 are It is more preferable that R 1 , R 2 , R 4 , R 5 , R 7 and R 8 are the same aromatic group, heterocyclic group or halogen atom, and that both R 2 and R 7 are hydrogen atoms.
- the same halogen atom and R 1 , R 3 to R 6, and R 8 are hydrogen atoms, or both R 3 and R 6 are the same halogen atom, and R 1 , R 2 , R 4 , and R 8 It is particularly preferred that 5 , R 7 and R 8 are hydrogen atoms.
- R 1 to R 4 in the formula (1) are independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group, a halogen atom or a substituted amino group, and R 5 to R 4 It is also preferable that two or more of R 8 are independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group, a halogen atom or a substituted amino group, and two or more of R 1 to R 4 are Each independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group, or a halogen atom, and two or more of R 5 to R 8 each independently represent an aliphatic hydrocarbon group, an aromatic group, or a heterocyclic group.
- R 1 to R 4 are independently an aromatic group, a heterocyclic group or a halogen atom, and a group of R 5 to R 8 It is further preferred that two or more are each independently an aromatic group, a heterocyclic group or a halogen atom.
- R 1 to R 4 are independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group, a halogen atom or a substituted amino group, and the remaining two are hydrogen atoms
- R 5 to two are each independently an aliphatic hydrocarbon group of R 8, an aromatic group, a heterocyclic group, it a halogen atom, or a substituted amino group remaining two are hydrogen atoms
- R 1 to Two of R 4 are each independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group or a halogen atom, the remaining two are hydrogen atoms
- two of R 5 to R 8 are respectively More preferably, they are independently an aliphatic hydrocarbon group, an aromatic group, a heterocyclic group or a halogen atom, and the remaining two are hydrogen atoms
- one of R 1 to R 4 is a halogen atom and Is a halogen atom, an aromatic group or a heterocyclic group, the remaining two are hydrogen atom
- R 9 to R 12 are each independently a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, an alkylthio group, an aromatic group, a heterocyclic group, a halogen atom, a hydroxyl group, a mercapto group, a nitro group, It represents a substituted amino group, an unsubstituted amino group, a cyano group, a sulfo group or an acyl group.
- the aliphatic hydrocarbon group, the alkoxy group, the alkylthio group, the aromatic group, the heterocyclic group, the halogen atom, the substituted amino group and the acyl group represented by R 9 to R 12 of the formula (1) include R of the formula (1).
- R 9 to R 12 in the formula (1) are preferably each independently a hydrogen atom, an aromatic group, a heterocyclic group, a halogen atom or a cyano group, and each independently an aromatic group or a heterocyclic group. Is more preferable. More specifically, at least one of R 9 and R 10 is an aromatic group, a heterocyclic group, a halogen atom or a cyano group, and at least one of R 11 and R 12 is an aromatic group, a heterocyclic group, a halogen atom. Or a cyano group, at least one of R 9 and R 10 is an aromatic group or a heterocyclic group, and at least one of R 11 and R 12 is an aromatic group or a heterocyclic group.
- R 10 and R 11 are aromatic groups or heterocyclic groups
- R 9 and R 12 are hydrogen atoms
- R 10 and R 11 are aromatic groups or heterocyclic groups. More preferably, More specifically, at least one of R 9 and R 10 is a substituent represented by the following formula (2), and at least one of R 11 and R 12 is a substituent represented by the following formula (2).
- R 10 and R 11 are more preferably a substituent represented by the following formula (2), R 9 and R 12 are hydrogen atoms, and R 10 and R 11 are the same.
- R 9 and R 12 are hydrogen atoms
- R 10 and R 11 are the same, represented by the following formula (2).
- a substituent is particularly preferable.
- R 21 to R 25 are each independently a hydrogen atom, an alkoxy group, an alkylthio group, an aromatic group, a heterocyclic group, a substituted amino group, an unsubstituted amino group, an acyl group, or an electron-accepting group. It represents a substituent or an atom, and R 21 and R 22 may be bonded to each other, or R 22 and R 23 may be bonded to each other to form an aromatic ring or a heterocycle. However, at least one of R 21 to R 25 represents an electron-accepting substituent or atom, or R 21 and R 22 are bonded to each other, or R 22 and R 23 are bonded to each other to have an electron-accepting fragrance. Form a ring or heterocycle.
- the alkoxy group represented by R 21 to R 25 of the formula (2), the alkylthio group, the aromatic group, the heterocyclic group, the substituted amino group, and the acyl group are the alkoxy groups represented by R 1 to R 8 of the formula (1),
- the same as the alkylthio group, aromatic group, heterocyclic group, substituted amino group and acyl group can be mentioned, and the preferable ones are also the same.
- the electron-accepting (electron-withdrawing) substituent or atom represented by at least one of R 21 to R 25 in formula (2) is not particularly limited as long as it is a substituent or atom having an electron-accepting property.
- Halogen atom formyl group, acetyl group, alkoxycarbonyl group, trifluoromethyl group, cyano group, nitro group, toluenesulfonyl group, methanesulfonyl group and trifluoromethanesulfonyl group, which are known by Hammett's rule, etc.
- Examples thereof include pyridyl group, quinolyl group, pyrazyl group, quinoxalyl group, thiazolyl group, benzothiazolyl group, indolyl group, benzothiadiazolyl group, succinimidoyl group and phthalimidoyl group, which are heterocycles.
- a halogen atom, an acetyl group, a trifluoromethyl group, a cyano group, a pyridyl group, a thiazolyl group or a benzothiazolyl group is preferable, and a halogen atom, a cyano group, a thiazolyl group or a benzothiazolyl group is more preferable.
- R 21 and R 22 in the formula (2) may be bonded to each other, or R 22 and R 23 may be bonded to each other to form an aromatic ring or a heterocycle.
- Specific examples of the aromatic ring or heterocyclic ring formed by R 21 and R 22 bound to each other or R 22 and R 23 bound to each other include benzene ring, naphthalene ring, furan ring, pyrrole ring, imidazole ring and thiophene.
- Examples thereof include 5-membered or 6-membered aromatic rings or heterocycles such as a ring, a pyrazole ring, an oxazole ring, a thiazole ring, a pyridine ring, a pyrazine ring, a triazole ring, an oxadiazole ring and a thiadiazole ring.
- those having an electron accepting property include an oxazole ring, a thiazole ring, It is a pyridine ring, a pyrazine ring, a triazole ring, an oxadiazole ring, or a thiadiazole ring, and it is more preferable to form a heterocycle containing a nitrogen atom and/or a sulfur atom.
- the aromatic ring or heterocyclic ring formed by combining R 21 and R 22 or by combining R 22 and R 23 may have a substituent, and as the substituent which may have, Aliphatic hydrocarbon group, alkoxy group, alkylthio group, aromatic group, heterocyclic group, halogen atom, hydroxyl group, mercapto group, nitro group, substituted amino group, and unsubstituted represented by R 1 to R 8 in the formula (1)
- the same groups as the amino group, cyano group, sulfo group and acyl group can be mentioned.
- the compound represented by the above formula (1) can be obtained, for example, in the following reaction step with reference to the description of Tetrahedron Letters, 2010, 51, 1600.
- the step (a) of reacting the compound (A) and the compound (B) to obtain the compound (C) includes, for example, an ammonium salt (eg ammonium acetate, ammonium chloride) in a mixed solvent of alcohol and acetic acid. Alternatively, it can be performed by adding aqueous ammonia.
- an ammonium salt eg ammonium acetate, ammonium chloride
- it can be performed by adding aqueous ammonia.
- the step (a) can be carried out by the compound (A) alone.
- the compound (C) is treated with a boron trifluoride (eg, boron trifluoride diethyl) in the presence of a tertiary amine (eg, triethylamine). It can be carried out by reacting with an ether complex or the like).
- the step (c) of obtaining the compound represented by the formula (1) from the compound (D) can be performed by reacting the compound (D) with boron tribromide.
- R 1 through R 12 in the compound (A) to (D) have the same meanings as R 1 to R 12 in the formula (1).
- the method for purifying the compound represented by the formula (1) is not particularly limited, and for example, washing, recrystallization, column chromatography, vacuum sublimation and the like can be adopted, and these methods can be combined as necessary.
- the near infrared light absorbing material of the present invention contains the compound represented by the above formula (1).
- the content of the compound represented by formula (1) in the near-infrared light absorbing material of the present invention is such that the near-infrared light absorbing ability required in the application of the near-infrared light absorbing material is exhibited. Although not particularly limited, it is usually 50 mass% or more, preferably 80 mass% or more, more preferably 90 mass% or more, still more preferably 95 mass% or more.
- a compound other than the compound represented by the formula (1) for example, a near-infrared light absorbing material (dye) other than the compound represented by the formula (1)
- an additive is added to the near-infrared light absorbing material of the present invention. You may use an agent etc. together.
- Compounds and additives that can be used in combination are not particularly limited as long as the near-infrared light absorbing ability required in the use of the near-infrared light absorbing material is exhibited.
- the organic thin film of the present invention contains the near infrared light absorbing material of the present invention.
- the organic thin film of the present invention can be produced by a general dry film forming method or a wet film forming method. Specifically, vacuum processes such as resistance heating evaporation, electron beam evaporation, sputtering and molecular lamination, solution processes such as casting, spin coating, dip coating, blade coating, wire bar coating, spray coating, and other coating methods, inkjet printing. Printing methods such as screen printing, offset printing, letterpress printing, and soft lithography methods such as microcontact printing.
- an organic thin film of a general near-infrared light absorbing material In order to form an organic thin film of a general near-infrared light absorbing material, a process of applying a compound in a solution state is desired from the viewpoint of processability, but an organic electronic device such as stacking organic films is desired. In the case of, the coating solution is not suitable because it may attack the organic film of the lower layer.
- the material is a vapor deposition material that can be used in a dry film formation method, for example, a dry film formation method such as resistance heating evaporation. Therefore, a near-infrared light absorbing material having a main absorption wavelength in the near-infrared region and capable of vapor deposition is preferable as the near-infrared photoelectric conversion material.
- each layer cannot be limited because it depends on the resistance value and charge mobility of each substance, but is usually in the range of 0.5 to 5,000 nm, preferably in the range of 1 to 1,000 nm, More preferably, it is in the range of 5 to 500 nm.
- the molecular weight of the compound represented by the above formula (1) is 1,500 or less when the organic thin film containing the compound represented by the formula (1) is intended to be formed into a film by a vapor deposition method and used. Is preferable, it is more preferable that it is 1,200 or less, and further preferable that it is 1,000 or less.
- the lower limit of the molecular weight is the lowest possible molecular weight of the compound represented by the formula (1).
- the compound represented by the formula (1) may be formed into a film by a coating method regardless of the molecular weight. By using the coating method, it is possible to form a film even with a compound having a relatively large molecular weight.
- the molecular weight in this specification means the value calculated by the EI-GCMS method.
- the organic electronic device of the present invention includes the organic thin film of the present invention (hereinafter, the organic thin film may be simply referred to as “thin film”).
- the organic electronic device include an organic thin film transistor, an organic photoelectric conversion element, an organic solar cell element, an organic electroluminescence element (hereinafter, referred to as “organic EL element” or “organic light emitting element”), an organic light emitting transistor element, and an organic material. Examples thereof include semiconductor laser devices.
- organic photoelectric conversion elements and organic EL elements which are expected to be developed for near infrared applications.
- near-infrared light having a wavelength of more than 700 nm has high transparency to living tissue. Therefore, since it can also be used for observing in-vivo tissues, it can be applied in various modes according to its purpose in pathological elucidation, diagnosis, etc. in the medical field such as near infrared fluorescent probe. ..
- the compound represented by the above formula (1) is a compound having a near-infrared light absorption property, it is expected to be used as an organic photoelectric conversion element.
- the compound represented by the above formula (1) can be used in the photoelectric conversion layer in the organic photoelectric conversion device of the present invention.
- the maximum absorption of the absorption band of the response wavelength light with respect to light is 700 to 2500 nm.
- the organic photoelectric conversion element include a near infrared light sensor, an organic image pickup element, and a near infrared light image sensor.
- the maximum absorption of the absorption band in the present specification means the value of the maximum absorbance in the spectrum of the absorbance measured by absorption spectrum measurement, the maximum absorption wavelength ( ⁇ max) is the longest wavelength side of the maximum absorption. It means the wavelength that gives maximum absorption.
- the organic photoelectric conversion element is an element in which a photoelectric conversion part (film) is arranged between a pair of opposing electrode films, and light is incident on the photoelectric conversion part from above the electrode film.
- the photoelectric conversion unit has a function of generating electrons and holes in response to the incident light, an organic photoelectric conversion element having such a photoelectric conversion unit, a signal corresponding to the charge is read by a semiconductor, It is an element showing the amount of incident light according to the absorption wavelength of the photoelectric conversion film portion.
- a transistor for reading may be connected to the electrode film on the side where light does not enter.
- the organic photoelectric conversion elements show incident position information in addition to the amount of incident light, and thus become an image sensor.
- the photoelectric conversion element arranged closer to the light source does not block (transmit) the absorption wavelength of the photoelectric conversion element arranged behind it when viewed from the light source side, a plurality of photoelectric conversion elements are stacked. You may use.
- the organic photoelectric conversion element of the present invention uses the compound represented by the above formula (1) as a constituent material of the photoelectric conversion section.
- the photoelectric conversion unit is a photoelectric conversion layer and one or more kinds selected from the group consisting of an electron transport layer, a hole transport layer, an electron block layer, a hole block layer, a crystallization prevention layer, an interlayer contact improvement layer, and the like. It is often composed of an organic thin film layer other than the photoelectric conversion layer.
- the compound of the above formula (1) can be used in addition to the photoelectric conversion layer, but is preferably used as a material of the organic semiconductor film of the photoelectric conversion layer.
- the photoelectric conversion layer may be composed only of the compound represented by the above formula (1), but in addition to the compound represented by the above formula (1), a known near-infrared light absorbing material and others are included. You may stay.
- the electrode film used in the organic photoelectric conversion element of the present invention has a hole-transporting property when the photoelectric conversion layer included in the photoelectric conversion part described later has a hole-transporting property or an organic thin film layer other than the photoelectric conversion layer has a hole-transporting property.
- it When it is a hole transport layer, it plays a role of extracting holes from the photoelectric conversion layer or other organic thin film layers and collecting them, and the photoelectric conversion layer included in the photoelectric conversion part has an electron transport property.
- the organic thin film layer other than the photoelectric conversion layer is an electron transporting layer having an electron transporting property, it plays a role of taking out electrons from the photoelectric conversion layer and other organic thin film layers and discharging them. is there.
- the material that can be used as the electrode film is not particularly limited as long as it has a certain degree of conductivity, but the adhesiveness with adjacent photoelectric conversion layers and other organic thin film layers, electron affinity, ionization potential, stability, etc. It is preferable to select in consideration of.
- Examples of materials that can be used as the electrode film include conductive metal oxides such as tin oxide (NESA), indium oxide, indium tin oxide (ITO), and zinc indium oxide (IZO); gold, silver, platinum, chromium, and aluminum.
- Metals such as iron, cobalt, nickel and tungsten; inorganic conductive materials such as copper iodide and copper sulfide; conductive polymers such as polythiophene, polypyrrole and polyaniline; carbon and the like. If necessary, a plurality of these materials may be mixed and used, or two or more electrode films of different materials may be laminated and used.
- the conductivity of the material used for the electrode film is not particularly limited as long as it does not hinder the light reception of the photoelectric conversion element more than necessary, but it is preferably as high as possible from the viewpoint of the signal strength of the photoelectric conversion element and the power consumption.
- an ITO film having a sheet resistance value of 300 ⁇ / ⁇ or less will function sufficiently as an electrode film, but a commercially available substrate having an ITO film having a conductivity of about several ⁇ / ⁇ is also available. Therefore, it is desirable to use a substrate having such high conductivity.
- the thickness of the ITO film (electrode film) can be arbitrarily selected in consideration of conductivity, but is usually 5 to 500 nm, preferably about 10 to 300 nm. Examples of methods for forming a film of ITO or the like include conventionally known vapor deposition methods, electron beam methods, sputtering methods, chemical reaction methods, coating methods, and the like. If necessary, the ITO film provided on the substrate may be subjected to UV-ozone treatment, plasma treatment, or the like.
- the material of the transparent electrode film used on at least one of the light incident sides of the electrode film is ITO, IZO, SnO 2 , ATO (antimony-doped tin oxide), ZnO, AZO (Al-doped zinc oxide). , GZO (gallium-doped zinc oxide), TiO 2 , FTO (fluorine-doped tin oxide), and the like.
- the transmittance of light incident through the transparent electrode film at the absorption peak wavelength of the photoelectric conversion layer is preferably 60% or more, more preferably 80% or more, and further preferably 95% or more. ..
- the electrode films used between the respective photoelectric conversion layers are It is necessary to transmit light other than light having a wavelength to be detected, and it is preferable to use a material that transmits 90% or more of incident light for the electrode film, and use a material that transmits 95% or more of light. More preferable.
- the electrode film is made plasma-free.
- plasma-free means that the substrate is reached by not using plasma when forming the electrode film or by separating the distance from the plasma generation source to the substrate by 2 cm or more, preferably 10 cm or more, more preferably 20 cm or more. It means a state in which the plasma generated is reduced.
- an electron beam vapor deposition apparatus EB vapor deposition apparatus
- a pulse laser vapor deposition apparatus A method of forming a transparent electrode film using an EB evaporation device is called an EB evaporation method
- a method of forming a transparent electrode film using a pulse laser evaporation device is called a pulse laser evaporation method.
- a facing target type sputtering apparatus for example, a facing target type sputtering apparatus, an arc plasma vapor deposition apparatus, etc. can be mentioned.
- the conductive film is thinner than the specified thickness, the resistance value will rapidly increase.
- the sheet resistance of the conductive film in the photoelectric conversion element for an optical sensor which is one of the embodiments, is usually 100 to 10,000 ⁇ / ⁇ , and the film thickness can be set appropriately.
- the thinner the transparent conductive film the smaller the amount of light absorbed, and generally the higher the light transmittance.
- the light transmittance is high, the amount of light absorbed by the photoelectric conversion layer is increased and the photoelectric conversion ability is improved, which is very preferable.
- the photoelectric conversion part included in the organic photoelectric conversion element of the present invention may be composed of only a photoelectric conversion layer or may include an organic thin film layer other than the photoelectric conversion layer.
- An organic semiconductor film is generally used for the photoelectric conversion layer forming the photoelectric conversion part, but the organic semiconductor film may be a single layer or a plurality of layers.
- a type organic semiconductor film or a mixed film thereof (bulk heterostructure) is used.
- the number of layers is about 2 to 10 and a structure in which any one of a p-type organic semiconductor film, an n-type organic semiconductor film, or a mixed film thereof (bulk hetero structure) is laminated. Therefore, a buffer layer may be inserted between the layers.
- the compound represented by the formula (1) of the present invention is used as a p-type semiconductor material, and fullerene or a derivative thereof which is a general n-type semiconductor material is used. It is preferable to use.
- the organic thin film layer other than the photoelectric conversion layer forming the photoelectric conversion part is a layer other than the photoelectric conversion layer, for example, an electron transport layer, a hole transport layer, an electron block layer, a hole block. It is used as a layer, an anti-crystallization layer or an interlayer contact improvement layer.
- an electron transport layer, a hole transport layer, an electron block layer and a hole block layer hereinafter also referred to as “carrier block layer”. This is preferable because an element that efficiently converts the electric signal can be obtained.
- organic photoelectric conversion elements in the organic image sensor, it is common to aim at improving the performance by reducing the dark current for the purpose of high contrast and power saving.
- the technique of inserting layers is preferred.
- These carrier block layers are generally used in the field of organic electronic devices, and play a role of controlling the reverse transfer of holes or electrons in the constituent film of each device.
- the electron transport layer plays a role of transporting electrons generated in the photoelectric conversion layer to the electrode film and blocking transfer of holes from the electrode film of the electron transport destination to the photoelectric conversion layer.
- the hole transport layer plays a role of transporting generated holes from the photoelectric conversion layer to the electrode film and blocking transfer of electrons from the electrode film of the hole transport destination to the photoelectric conversion layer.
- the electron blocking layer plays a role of preventing movement of electrons from the electrode film to the photoelectric conversion layer, preventing recombination in the photoelectric conversion layer, and reducing dark current.
- the hole blocking layer functions to prevent movement of holes from the electrode film to the photoelectric conversion layer, prevent recombination in the photoelectric conversion layer, and reduce dark current.
- FIG. 1 shows a typical element structure of the organic photoelectric conversion element of the present invention, but the present invention is not limited to this structure.
- 1 is an insulating part
- 2 is one electrode film (upper electrode film)
- 3 is an electron block layer
- 4 is a photoelectric conversion layer
- 5 is a hole block layer
- 6 is the other electrode film.
- (Lower electrode film) and 7 each represent an insulating substrate or another organic photoelectric conversion element.
- a readout transistor not shown in the drawing may be connected to the electrode film 2 or 6, and if the photoelectric conversion layer 4 is transparent, it may be provided on the side opposite to the side on which light is incident. It may be formed on the outside of the electrode film.
- Light is incident on the organic photoelectric conversion element from any of the upper and lower sides unless the constituent elements other than the photoelectric conversion layer 4 extremely prevent light with the main absorption wavelength of the photoelectric conversion layer from entering. It can be from
- Organic EL element Next, the organic EL element will be described. Since the compound represented by the formula (1) of the present invention has near-infrared emission characteristics, it is expected to be used for an organic EL device.
- the structure has a structure having two layers, a light emitting layer and a charge transport layer, between a counter electrode composed of a cathode and an anode; an electron transport layer, a light emitting layer and a hole transport layer laminated between the counter electrodes.
- a structure having three layers; those having three or more layers; and the like are known, and those having a single light emitting layer are known.
- the hole transport layer has a function of injecting holes from the anode, transporting holes to the light emitting layer, facilitating injection of holes into the light emitting layer, and a function of blocking electrons.
- the electron-transporting layer has a function of injecting electrons from the cathode, transporting the electrons to the light-emitting layer, facilitating injection of electrons into the light-emitting layer, and a function of blocking holes. Further, in the light emitting layer, the injected electrons and holes are recombined with each other to generate excitons, and the energy emitted in the process of deactivating the excitons is detected as light emission.
- the preferred embodiments of the organic EL device will be described below.
- An organic EL element is an element in which one layer or a plurality of layers of organic thin films are formed between electrodes of an anode and a cathode, and is an element that emits light by electric energy.
- the anode that can be used in the organic EL element is an electrode having a function of injecting holes into the hole injection layer, the hole transport layer and the light emitting layer.
- metal oxides, metals, alloys, and conductive materials having a work function of 4.5 eV or more are suitable.
- the material suitable for the anode of the organic EL element is not particularly limited, but a conductive metal such as tin oxide (NESA), indium oxide, indium tin oxide (ITO), and zinc indium oxide (IZO).
- Oxides metals such as gold, silver, platinum, chromium, aluminum, iron, cobalt, nickel and tungsten, inorganic conductive materials such as copper iodide and copper sulfide, conductive polymers such as polythiophene, polypyrrole and polyaniline and carbon Can be mentioned. Among them, it is preferable to use ITO or NESA.
- the anode may use a plurality of materials if necessary, or may be composed of two or more layers made of different materials.
- the resistance of the anode is not limited as long as it can supply a sufficient current for light emission of the element, but it is preferably low from the viewpoint of power consumption of the element.
- an ITO substrate having a sheet resistance value of 300 ⁇ / ⁇ or less functions as an element electrode, but a substrate having a resistance of several ⁇ / ⁇ can be supplied. Therefore, it is desirable to use a low resistance product.
- the thickness of ITO can be arbitrarily selected according to the resistance value, but it is usually 5 to 500 nm, preferably 10 to 300 nm. Examples of methods for forming a film of ITO or the like include a vapor deposition method, an electron beam method, a sputtering method, a chemical reaction method, and a coating method.
- the cathode that can be used in the organic EL device is an electrode having a function of injecting electrons into the electron injection layer, the electron transport layer and the light emitting layer.
- a metal or an alloy having a small work function (which is approximately 4 eV or less) is suitable. Specific examples thereof include platinum, gold, silver, copper, iron, tin, zinc, aluminum, indium, chromium, lithium, sodium, potassium, calcium and magnesium, which improve electron injection efficiency and improve device characteristics. Therefore, lithium, sodium, potassium, calcium or magnesium is preferable.
- the alloy an alloy with a metal such as aluminum or silver containing these low work function metals, or an electrode having a structure in which these are laminated can be used.
- the cathode may be a transparent electrode capable of forming a film at a low temperature.
- the cathode film forming method include a vapor deposition method, an electron beam method, a sputtering method, a chemical reaction method, and a coating method, but are not particularly limited.
- the resistance of the cathode is not limited as long as it can supply a sufficient current for light emission of the element, but it is preferably low from the viewpoint of the power consumption of the element, specifically, several hundreds to several ⁇ / ⁇ .
- the thickness of the cathode is usually 5 to 500 nm, preferably 10 to 300 nm.
- the electrode In order to extract emitted light, it is generally preferable to form the electrode on a substrate having sufficient transparency in the emission wavelength region of the device.
- transparent substrates include glass substrates and polymer substrates.
- soda lime glass, non-alkali glass, quartz or the like is used.
- the substrate may have a thickness sufficient to maintain mechanical and thermal strength, and is preferably 0.5 mm or more.
- a material of the glass a material having a small amount of ions eluted from the glass, for example, alkali-free glass is preferable.
- commercially available soda lime glass having a barrier coat such as SiO 2 can be used.
- the polymer substrate include polycarbonate, polypropylene, polyether sulfone, polyethylene terephthalate, and acrylic substrate.
- the organic thin film of the organic EL element is formed of one layer or a plurality of layers between the anode and cathode electrodes.
- the "layer” formed by the organic thin film means a hole transport layer, an electron transport layer, a hole transport light emitting layer, an electron transport light emitting layer, a hole blocking layer, an electron blocking layer, a hole injection layer, and an electron injection layer.
- One mode of the organic EL element is shown in FIG. In FIG. 2, 1E is a substrate, 2E is an anode, 3E is a hole injection layer, 4E is a hole transport layer, 5E is a light emitting layer, 6E is an electron transport layer, and 7E is a cathode.
- the structure of the layer forming the organic thin film in the organic EL element may be any of the following structural examples 1) to 9).
- an electron injection layer is further provided before the electron transport layer or the electron transport light emitting layer.
- a configuration in which the materials used in the combinations 1) to 8) are mixed, and only one layer containing the mixed material is provided.
- a single layer formed of a material generally called a bipolar light emitting material; or a single layer containing a light emitting material and a hole transport material or an electron transport material may be provided.
- a multilayer structure can efficiently transport charges, that is, holes and/or electrons, and recombine these charges. Further, by suppressing the quenching of charges, it is possible to prevent the stability of the device from being lowered and to improve the efficiency of light emission.
- the hole injection layer and the hole transport layer are formed by using a hole transport material alone or by laminating a mixture of two or more kinds of the materials.
- the hole transport material include N,N′-diphenyl-N,N′-di(3-methylphenyl)-4,4′′-diphenyl-1,1′-diamine, N,N′-dinaphthyl-N , N'-diphenyl-4,4'-diphenyl-1,1'-diamine and other triphenylamines; bis(N-allylcarbazole) or bis(N-alkylcarbazole)s; pyrazoline derivatives, stilbene compounds, Heterocyclic compounds represented by hydrazone compounds, triazole derivatives, oxadiazole derivatives and porphyrin derivatives; in the polymer system, polycarbonate or styrene derivative having the above monomer in the side chain, polyvinylcarbazole, polysilane and the like can be
- the hole injection layer provided between the hole transport layer and the anode for improving the hole injection property is a phthalocyanine derivative, m-MTDATA(4,4′,4′′-tris[phenyl(m-tolyl ) Amino]triphenylamine) and other starburst amines, and in a polymer system, those made of polythiophene such as PEDOT (poly(3,4-ethylenedioxythiophene)) and polyvinylcarbazole derivatives.
- the electron transport layer is formed by using an electron transport material alone or by laminating a mixture of two or more kinds of the materials.
- an electron transport material it is necessary to efficiently transport electrons from the negative electrode between electrodes to which an electric field is applied.
- the electron transport material has a high electron injection efficiency, and it is preferable that the injected electrons are efficiently transported.
- the electron transport material is required to be a substance having a high electron affinity, a high electron mobility, excellent stability, and an impurity which becomes a trap and is unlikely to be generated during production and use.
- quinolinol derivative metal complex represented by tris(8-quinolinolato)aluminum complex, tropolone metal complex, perylene derivative, perinone derivative, naphthalimide derivative, naphthalic acid derivative, oxazole derivative, oxadiazole
- examples thereof include derivatives, thiazole derivatives, thiadiazole derivatives, triazole derivatives, bisstyryl derivatives, pyrazine derivatives, phenanthroline derivatives, benzoxazole derivatives, and quinoxaline derivatives, but are not particularly limited.
- These electron transport materials may be used alone, but may be used by being laminated or mixed with different electron transport materials.
- Examples of the electron injection layer provided between the electron transport layer and the cathode for improving the electron injection property include metals such as cesium, lithium, and strontium, and lithium fluoride.
- the hole blocking layer is formed by stacking the hole blocking substances individually or in a mixture of two or more kinds.
- the hole blocking substance is preferably a phenanthroline derivative such as bathophenanthroline or bathocuproine, a silole derivative, a quinolinol derivative metal complex, an oxadiazole derivative or an oxazole derivative.
- the hole blocking substance is not particularly limited as long as it is a compound that can prevent the holes from flowing out of the device from the cathode side to lower the luminous efficiency.
- the light emitting layer means an organic thin film that emits light, and can be said to be, for example, a hole transporting layer, an electron transporting layer, or a bipolar transporting layer having a strong light emitting property.
- the light emitting layer may be formed of a light emitting material (host material, dopant material, etc.), which may be a mixture of a host material and a dopant material, or a single host material. Each of the host material and the dopant material may be one kind or a combination of a plurality of materials.
- the dopant material may be contained in the whole host material, partially contained, or either.
- the dopant material may be laminated, dispersed, or any of them.
- Examples of the light emitting layer include the hole transport layer and the electron transport layer described above.
- As the material used for the light emitting layer a carbazole derivative, anthracene derivative, naphthalene derivative, phenanthrene derivative, phenylbutadiene derivative, styryl derivative, pyrene derivative, perylene derivative, quinoline derivative, tetracene derivative, perylene derivative, quinacridone derivative, coumarin derivative, Examples thereof include porphyrin derivatives and phosphorescent metal complexes (Ir complex, Pt complex, Eu complex, etc.).
- a method for forming an organic thin film of an organic EL element is a vacuum process such as resistance heating vapor deposition, electron beam vapor deposition, sputtering, molecular lamination method, solution process such as casting, spin coating, dip coating, blade coating, and wire bar.
- Coating methods such as coating and spray coating, printing methods such as inkjet printing, screen printing, offset printing, letterpress printing, soft lithography methods such as microcontact printing method, etc., and a combination of these methods is adopted. You can.
- the thickness of each layer is not limited because it depends on the resistance value and charge mobility of each substance, but is selected from 0.5 to 5,000 nm. It is preferably 1 to 1,000 nm, more preferably 5 to 500 nm.
- one or a plurality of thin films such as a light emitting layer, a hole transporting layer and an electron transporting layer, which are present between the anode and cathode electrodes, are represented by the above formula (1).
- a device that efficiently emits light even with low electric energy can be obtained.
- the compound represented by the above formula (1) can be suitably used as a hole transport layer, a light emitting layer, and an electron transport layer.
- they can be used in combination with the above-mentioned electron transporting material, hole transporting material, light emitting material or the like, or can be used in combination.
- the dopant material include perylene derivatives such as bis(diisopropylphenyl)perylenetetracarboxylic acid imide, perinone derivatives, 4- (Dicyanomethylene)-2methyl-6-(p-dimethylaminostyryl)-4Hpyran (DCM) and its analogs, metal phthalocyanine derivatives such as magnesium phthalocyanine and aluminum chlorophthalocyanine, rhodamine compounds, deazaflavin derivatives, coumarin derivatives, oxazine Compounds, squarylium compounds, violanthrone compounds, Nile red, pyrromethene derivatives such as 5-cyanopyrromethene-BF 4 complex, and Eu complexes having acetylacetone or benzoylacetone and phenanthroline as a phosphorescent material, Li complex, Ru complex, A porphyrin such
- the concentration quenching phenomenon will occur, so normally use an amount of 30% by mass or less based on the host material. It is preferably 20% by mass or less, and more preferably 10% by mass or less.
- the host material can be formed by a co-evaporation method, but it may be mixed with the host material in advance and then evaporated simultaneously. It is also possible to use it by sandwiching it between the host materials. In this case, the host material may be laminated as a single layer or two or more dopant layers.
- dopant layers may be formed by using the dopant material alone or may be formed by mixing the dopant materials.
- the dopant material may be polyvinyl chloride, polycarbonate, polystyrene, polystyrene sulfonic acid, poly(N-vinylcarbazole), poly(methyl)(meth)acrylate, polybutyl methacrylate, polyester, polysulfone as a polymer binder, Solvent-soluble resin such as polyphenylene oxide, polybutadiene, hydrocarbon resin, ketone resin, phenoxy resin, polysulfone, polyamide, ethyl cellulose, vinyl acetate, ABS resin (acrylonitrile-butadiene-styrene copolymer resin), polyurethane resin, phenol resin, It is also possible to dissolve or disperse it in a curable resin such as xylene resin, petroleum resin, urea resin, melamine resin, unsaturated polyester resin, alkyd resin, epoxy
- the organic EL element can be suitably used as a flat panel display. It can also be used as a flat backlight, and in this case, any of those emitting colored light and those emitting white light can be used.
- the backlight is mainly used for improving the visibility of a display device that does not emit light by itself, and is used for a liquid crystal display device, a clock, an audio device, an automobile panel, a display board, a sign, and the like.
- a liquid crystal display device, in particular, a conventional backlight for personal computer applications which has been a problem to be thinned, is difficult to be thinned because it includes a fluorescent lamp and a light guide plate. Since the backlight using the element is characterized by being thin and lightweight, the above problems are solved. Similarly, it can be usefully used for lighting.
- Organic semiconductor laser device Since the compound represented by the above formula (1) is a compound having near-infrared emission characteristics, it is expected to be used as an organic semiconductor laser device. That is, if the organic semiconductor laser device containing the compound represented by the above formula (1) is combined with a resonator structure and carriers are efficiently injected to sufficiently increase the density of the excited state, the light is amplified. It is expected that laser oscillation will occur. Conventionally, it has been said that it is very difficult to generate a high-density excited state required for laser oscillation by electric excitation in an organic semiconductor laser device because only laser oscillation by optical excitation is observed. However, it is expected that highly efficient light emission (electroluminescence) may occur by using the organic semiconductor element containing the compound represented by the above formula (1).
- the irradiation of the incident light was carried out by PVL-3300 (manufactured by Asahi Bunko Co., Ltd.) with a light source having an irradiation light intensity of 130 ⁇ W and a half width of 20 nm in the range of 350 nm to 1100 nm.
- Example 1 a compound represented by the following formula (2-1) was prepared by using methyl 3-methoxy-2-thienothiophenecarboxylate as a raw material and by a method similar to the previously reported method (eg, Tetrahedron Letters, 2008, 49, 3716-3721).
- the compound of the present invention represented by the following formula (1-1) was synthesized according to the following synthetic flow using the compound as a starting material.
- Step 1 Synthesis of Intermediate Compound Represented by Formula (2-2)
- -Thienothienyl)methanone 32 mmol
- ethanol 350 mL
- acetic acid 75 mL
- ammonium acetate 200 mmol
- ammonium chloride 35 mmol
- Step 2 Synthesis of Intermediate Compound Represented by Formula (2-3)
- the compound represented by Formula (2-2) (8.4 mmol) obtained in Step 1, toluene (350 mL) and After adding triethylamine (84 mmol) and heating at 80 degreeC, the boron trifluoride diethyl ether complex (84 mmol) was dripped and it heated up to 100 degreeC and stirred overnight.
- the reaction solution was air-cooled and neutralized with a saturated aqueous sodium hydrogen carbonate solution, and the resulting solid was collected by filtration to obtain an intermediate compound represented by the formula (2-3) (3.0 mmol, yield). Rate: 36%).
- Step 3 Synthesis of Compound 1 of the Present Invention Represented by Formula (1-1)
- the intermediate compound (1.8 mmol) represented by formula (2-3) obtained in Step 2 and dichloromethane are added. (60 mL) was added and the mixture was stirred, boron tribromide (9 mL) was added dropwise, and the mixture was stirred at room temperature for 5 hours. A precipitate formed by adding saturated aqueous sodium hydrogen carbonate was collected by filtration and repeatedly washed with water and methanol to obtain a black compound 1 of the present invention represented by the formula (1-1) (1.6 mmol, Yield: 89%).
- Example 3 (Step 5) Synthesis of Compound 3 of the Present Invention Represented by Formula (1-3) Instead of the compound represented by Formula (2-1), (1-acetyl-4-fluorophenyl)(5-
- the compound 3 of the present invention represented by the formula (1-3) was obtained according to steps 1 to 3 of Example 1 except that (benzobisthiadiazole)-3-methoxy-2-thienothienyl)methanone was used. (Yield: 55%).
- Comparative Example 1 Synthesis of Comparative Compound 1 A comparative compound 1 represented by the following formula (3-1) was obtained according to the method described in Patent Document 2. The ⁇ max of the chloroform solution of this compound was 790 nm.
- Comparative example 2 Synthesis of Comparative Compound 2 According to the method described in Patent Document 6, Comparative Compound 2 represented by the following formula (3-2) was obtained. The ⁇ max of the chloroform solution of this compound was 769 nm.
- Example 5 Preparation of Organic Thin Film 1 of the Present Invention and Measurement of Absorption Spectrum
- the compound 1 of the present invention represented by the formula (1-1) obtained in Example 1 was deposited on a glass substrate under vacuum by a resistance heating method to obtain The organic thin film 1 of the invention was obtained.
- ⁇ max of the absorption spectrum was 870 nm.
- Example 6 Preparation of Organic Thin Film 2 of the Present Invention and Absorption Spectrum Measurement
- the formula (1-2 obtained in Example 2 was used.
- the organic thin film 2 of the present invention was obtained according to Example 5 except that the compound 2 of the present invention represented by the formula (4) was used.
- ⁇ max of the absorption spectrum was 905 nm.
- Example 7 Preparation of Organic Thin Film 3 of the Present Invention and Measurement of Absorption Spectrum
- the formula (1-3 obtained in Example 3 was used.
- the organic thin film 3 of the present invention was obtained in the same manner as in Example 5 except that the compound 3 of the present invention represented by the formula (4) was used.
- ⁇ max of the absorption spectrum was 960 nm.
- Example 8 Preparation of Organic Thin Film 4 of the Present Invention and Absorption Spectrum Measurement
- the formula (1-4 obtained in Example 4 was used.
- the organic thin film 3 of the present invention was obtained in the same manner as in Example 5 except that the compound 3 of the present invention represented by the formula (4) was used.
- ⁇ max of the absorption spectrum was 984 nm.
- Comparative Example 3 Preparation of Comparative Organic Thin Film 1 and Measurement of Absorption Spectrum Instead of the compound 1 of the present invention represented by the formula (1-1) obtained in Example 1, the formula (3-1) obtained in Comparative Example 1 was obtained. Comparative organic thin film 1 was obtained according to Example 5 except that comparative compound 1 represented by As a result of measuring an absorption spectrum of the obtained organic thin film 1 for comparison on the glass substrate, ⁇ max of the absorption spectrum was 760 nm.
- Comparative Example 4 Preparation of Comparative Organic Thin Film 2 and Absorption Spectrum Measurement Instead of the compound 1 of the present invention represented by the formula (1-1) obtained in Example 1, the formula (3-2) obtained in Comparative Example 2 was obtained. Comparative organic thin film 2 was obtained according to Example 5 except that comparative compound 2 represented by As a result of measuring the absorption spectrum of the obtained organic thin film 2 for comparison on the glass substrate, ⁇ max of the absorption spectrum was 810 nm.
- Example 9 Preparation and Evaluation of Organic Photoelectric Conversion Element 1 Containing Organic Thin Film of the Present Invention
- an ITO transparent conductive glass manufactured by Geomatec, ITO film thickness 150 nm
- the represented compound 1 of the present invention was vacuum-deposited by resistance heating to form an organic thin film having a thickness of 100 nm.
- aluminum was vacuum-deposited on the obtained organic thin film by resistance heating vacuum deposition to form an electrode having a thickness of 100 nm, thereby producing an organic photoelectric conversion element 1 of the present invention.
- the maximum photocurrent wavelength was 906 nm as a result of measuring the photocurrent response when a voltage of 1 V was applied in the state where light was irradiated from 350 nm to 1100 nm using ITO and aluminum as electrodes.
- Example 10 Preparation and Evaluation of Organic Photoelectric Conversion Element 2 Containing Organic Thin Film of the Present Invention
- ITO transparent conductive glass manufactured by Geomatec, ITO film thickness 150 nm
- the represented compound 2 of the present invention was vacuum-deposited by resistance heating to form an organic thin film having a thickness of 100 nm.
- aluminum was vacuum-deposited on the obtained organic thin film by resistance heating vacuum deposition to form an electrode having a thickness of 100 nm, thereby producing an organic photoelectric conversion element 2 of the present invention.
- the maximum photocurrent wavelength was 981 nm as a result of measuring the photocurrent response when a voltage of 1 V was applied in a state where light irradiation of 350 nm to 1100 nm was performed using ITO and aluminum as electrodes.
- Example 11 Preparation and Evaluation of Organic Photoelectric Conversion Element 3 Containing Organic Thin Film of the Present Invention
- an ITO transparent conductive glass manufactured by Geomatec Co., Ltd., ITO film thickness 150 nm
- the represented compound 3 of the present invention was vacuum-deposited by resistance heating to form an organic thin film having a thickness of 100 nm.
- aluminum was vacuum-deposited on the obtained organic thin film by resistance heating vacuum deposition to form an electrode having a thickness of 100 nm, thereby producing an organic photoelectric conversion element 3 of the present invention.
- the maximum photocurrent wavelength was 990 nm as a result of measuring the photocurrent response when a voltage of 1 V was applied in a state where light irradiation of 350 nm to 1100 nm was performed using ITO and aluminum as electrodes.
- Comparative Example 5 Preparation and Evaluation of Comparative Organic Photoelectric Conversion Device 1 Comprising Organic Thin Film for Comparison Comparative compound 1 represented by formula (3-1) was used instead of compound 1 represented by formula (1-1)
- a comparative organic photoelectric conversion element 1 was prepared in the same manner as in Example 9 except that the photocurrent response was measured.
- the maximum photocurrent wavelength was 772 nm as a result of measuring the photocurrent response when a voltage of 1 V was applied in the state where light was irradiated from 350 nm to 1100 nm using ITO and aluminum as electrodes.
- Comparative Example 6 Preparation and Evaluation of Comparative Organic Photoelectric Conversion Device 2 Comprising Organic Thin Film for Comparison Comparative compound 2 represented by formula (3-2) was used instead of compound 1 represented by formula (1-1)
- a comparative organic photoelectric conversion element 2 was prepared in the same manner as in Example 9 except that the photocurrent response was measured.
- the maximum photocurrent wavelength was 824 nm as a result of measuring the photocurrent response when a voltage of 1 V was applied in a state where light irradiation of 350 nm to 1100 nm was performed using ITO and aluminum as electrodes.
- the organic photoelectric conversion element of the example containing the organic thin film of the compound of the present invention shows the maximum photocurrent wavelength on the longer wavelength side than the organic photoelectric conversion element for comparative examples, and emits near infrared light of 900 nm or more. Obviously it can be absorbed. Further, the organic photoelectric conversion element including the organic thin film of the present invention shows a high contrast ratio for light in the near infrared region, and the compound of the present invention is effective as a material for an image sensor or an optical sensor. all right. It was found that it has a high contrast ratio even in the near-infrared region and is effective as a material for an image sensor.
- the compound of the present invention having a main absorption band in the near-infrared region is easy to synthesize and has both the absorption property in the near-infrared region and the vaporizable property, so that the organic electronics operating in the near-infrared region Very useful as a device material.
- FIG. 1 Insulating Part 2 Upper Electrode Film 3 Electron Block Layer 4 Photoelectric Conversion Layer 5 Hole Block Layer 6 Lower Electrode Film 7 Insulating Substrate or Other Photoelectric Conversion Element
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Abstract
Description
また特許文献2には、単純なBODIPY色素は500nm付近に強い吸収帯を有するとともに、π共役系の拡張や、電子供与性置換基を導入した芳香族基の導入により、近赤外光領域まで吸収波長を伸ばすことが可能であることが記載されている。
特許文献6には、チオフェン環とB-Oキレート化した化合物を用いた近赤外領域に吸収を有する光電変換素子が例示されているが、900nmを超える光に対する明暗比は低く、近赤外光電変換用途に使用するためには更なる光電変換波長の長波長化、近赤外領域における光電変換特性の高感度化が求められている。
[1]下記式(1)
[2]R1乃至R4の少なくとも一つが脂肪族炭化水素基、芳香族基、複素環基又はハロゲン原子であって、かつR5乃至R8の少なくとも一つが脂肪族炭化水素基、芳香族基、複素環基又はハロゲン原子である前項[1]に記載の化合物、
[3]R1乃至R4の少なくとも一つがハロゲン原子であって、かつR5乃至R8の少なくとも一つがハロゲン原子である前項[2]に記載の化合物、
[4]R1乃至R4の少なくとも一つが芳香族基又は複素環基であって、かつR5乃至R8の少なくとも一つが芳香族基又は複素環基である前項[2]に記載の化合物、
[5]R1とR8が同一であって、R2とR7が同一であって、R3とR6が同一であって、かつR4とR5が同一である前項[1]乃至[4]のいずれか一項に記載の化合物、
[6]R9及びR10の少なくとも一つが芳香族基又は複素環基であって、かつR11及びR12の少なくとも一つが芳香族基又は複素環基である前項[1]乃至[5]のいずれか一項に記載の化合物、
[7]R9及びR12が水素原子であって、かつR10及びR11が芳香族基又は複素環基である前項[6]に記載の化合物、
[8]R10及びR11が下記式(2)
[9]R21乃至R25の少なくとも一つが、ハロゲン原子、ホルミル基、アセチル基、アルコキシカルボニル基、トリフルオロメチル基、シアノ基、ニトロ基、トルエンスルホニル基、メタンスルホニル基、トリフルオロメタンスルホニル基、ピリジル基、キノリル基、ピラジル基、キノキサリル基、チアゾリル基、ベンゾチアゾリル基、インドリル基、ベンゾチアジアゾリル基、スクシンイミドイル基及びフタルイミドイル基からなる群より選択される電子受容性の置換基又は原子である前項[8]に記載の化合物、
[10]R21とR22が結合して、又はR22とR23が結合して、窒素原子及び/又は硫黄原子を含む複素環を形成している前項[8]に記載の化合物、
[11]前項[1]乃至[10]いずれか一項に記載の化合物を含む近赤外光吸収材料、
[12]前項[11]に記載の近赤外光吸収材料を含む有機薄膜、
[13]前項[12]に記載の有機薄膜を含む有機エレクトロニクスデバイス、及び
[14]前項[12]に記載の有機薄膜を含む有機光電変換素子。
式(1)中のR1乃至R8が表す脂肪族炭化水素基としては、直鎖状又は分岐鎖状の脂肪族炭化水素基であることが好ましく、直鎖状又は分岐鎖状のアルキル基であることがより好ましく、n-ブチル基、n-ヘキシル基、n-オクチル基、n-デシル基、n-ドデシル基、2-エチルへキシル基、2-メチルプロピル基又は2-ブチルオクチル基であることが更に好ましく、n-ヘキシル基、n-オクチル基又は2-メチルプロピル基であることが特に好ましい。
式(1)中のR1乃至R8が表すアルキルチオ基とは、硫黄原子とアルキル基が結合した置換基であり、アルキルチオ基中のアルキル基としては、例えば式(1)中のR1乃至R8が表す脂肪族炭化水素基の項に具体例として記載したアルキル基が挙げられる。式(1)中のR1乃至R8が表すアルキルチオ基は、例えばアルキルチオ基等の置換基を有していてもよい。
式(1)中のR1乃至R8が表す非置換アミノ基とはNH2基を意味する。
式(1)中のR1乃至R8が表すアシル基とは、カルボニル基と芳香族基又はアルキル基が結合した置換基であり、アシル基中のアルキル基及び芳香族基としては、式(1)中のR1乃至R8が表す脂肪族炭化水素基の項に記載したアルキル基、及び式(1)中のR1乃至R8が表す芳香族基と同じものが挙げられる。
例えば、上記したR2及びR7、又はR3及びR6が置換基又はハロゲン原子であってそれ以外が水素原子である態様の場合には、R2及びR7の両者が同一の脂肪族炭化水素基、芳香族基、複素環基、ハロゲン原子又は置換アミノ基であってR1、R3乃至R6及びR8が水素原子であるか、R3及びR6の両者が同一の脂肪族炭化水素基、芳香族基、複素環基、ハロゲン原子又は置換アミノ基であってR1、R2、R4、R5、R7及びR8が水素原子であることが好ましく、R2及びR7の両者が同一の脂肪族炭化水素基、芳香族基、複素環基又はハロゲン原子であってR1、R3乃至R6及びR8が水素原子であるか、R3及びR6の両者が同一の脂肪族炭化水素基、芳香族基、複素環基又はハロゲン原子であってR1、R2、R4、R5、R7及びR8が水素原子であることがより好ましく、R2及びR7の両者が同一の芳香族基、複素環基又はハロゲン原子であってR1、R3乃至R6及びR8が水素原子であるか、R3及びR6の両者が同一の芳香族基、複素環基又はハロゲン原子であってR1、R2、R4、R5、R7及びR8が水素原子であることが更に好ましく、R2及びR7の両者が同一のハロゲン原子であってR1、R3乃至R6及びR8が水素原子であるか、R3及びR6の両者が同一のハロゲン原子であってR1、R2、R4、R5、R7及びR8が水素原子であることが特に好ましい。
更には、R1乃至R4のうちの二つがそれぞれ独立に脂肪族炭化水素基、芳香族基、複素環基、ハロゲン原子又は置換アミノ基であって残りの二つが水素原子であり、かつR5乃至R8のうちの二つがそれぞれ独立に脂肪族炭化水素基、芳香族基、複素環基、ハロゲン原子又は置換アミノ基であって残りの二つが水素原子であることが好ましく、R1乃至R4のうちの二つがそれぞれ独立に脂肪族炭化水素基、芳香族基、複素環基又はハロゲン原子であって残りの二つが水素原子であり、かつR5乃至R8のうちの二つがそれぞれ独立に脂肪族炭化水素基、芳香族基、複素環基又はハロゲン原子であって残りの二つが水素原子であることがより好ましく、R1乃至R4のうちの一つがハロゲン原子であって別の一つがハロゲン原子、芳香族基又は複素環基であって残りの二つが水素原子であり、かつR5乃至R8のうちの一つがハロゲン原子であって別の一つがハロゲン原子、芳香族基又は複素環基であって残りの二つが水素原子であることが更に好ましい。
式(1)のR9乃至R12が表す脂肪族炭化水素基、アルコキシ基、アルキルチオ基、芳香族基、複素環基、ハロゲン原子、置換アミノ基及びアシル基としては、式(1)のR1乃至R8が表す脂肪族炭化水素基、アルコキシ基、アルキルチオ基、芳香族基、複素環基、ハロゲン原子、置換アミノ基及びアシル基と同じものが挙げられ、好ましいものも同様である。
より詳しくは、R9及びR10の少なくとも一つが芳香族基、複素環基、ハロゲン原子又はシアノ基であって、かつR11及びR12の少なくとも一つが芳香族基、複素環基、ハロゲン原子又はシアノ基であることが好ましく、R9及びR10の少なくとも一つが芳香族基又は複素環基であって、かつR11及びR12の少なくとも一つが芳香族基又は複素環基であることがより好ましく、R10及びR11が芳香族基又は複素環基であることが更に好ましく、R9及びR12が水素原子であって、かつR10及びR11が芳香族基又は複素環基であることが更に好ましい。
更に詳しくは、R9及びR10の少なくとも一つが下記式(2)で表される置換基であって、かつR11及びR12の少なくとも一つが下記式(2)で表される置換基であることが好ましく、R10及びR11が下記式(2)で表される置換基であることがより好ましく、R9及びR12が水素原子であって、かつR10及びR11が同一の又は異なる下記式(2)で表される置換基であることが更に好ましく、R9及びR12が水素原子であって、かつR10及びR11が同一の下記式(2)で表される置換基であることが特に好ましい。
式(2)のR21乃至R25が表すアルコキシ基、アルキルチオ基、芳香族基、複素環基、置換アミノ基及びアシル基としては、式(1)のR1乃至R8が表すアルコキシ基、アルキルチオ基、芳香族基、複素環基、置換アミノ基及びアシル基と同じものが挙げられ、好ましいものも同様である。
R21とR22が結合して、又はR22とR23が結合して形成する芳香族環又は複素環の具体例としては、ベンゼン環、ナフタレン環、フラン環、ピロール環、イミダゾール環、チオフェン環、ピラゾール環、オキサゾール環、チアゾール環、ピリジン環、ピラジン環、トリアゾール環、オキサジアゾール環、チアジアゾール環等の五員環又は六員環の芳香族環または複素環が挙げられる。
上記したR21とR22が結合して、又はR22とR23が結合して形成する芳香族環又は複素環の具体例のうち、電子受容性を有するものは、オキサゾール環、チアゾール環、ピリジン環、ピラジン環、トリアゾール環、オキサジアゾール環、チアジアゾール環であり、窒素原子及び/又は硫黄原子を含む複素環を形成することがより好ましい。
R21とR22が結合して、又はR22とR23が結合して形成する芳香族環又は複素環は置換基を有してもよく、該有していてもよい置換基としては、式(1)中のR1乃至R8が表す脂肪族炭化水素基、アルコキシ基、アルキルチオ基、芳香族基、複素環基、ハロゲン原子、水酸基、メルカプト基、ニトロ基、置換アミノ基、非置換アミノ基、シアノ基、スルホ基及びアシル基と同様のものが挙げられる。
尚、化合物(A)乃至(D)中のR1乃至R12は、式(1)中のR1乃至R12と同じ意味を表す。
式(1)で表される化合物の精製方法は特に限定されず、例えば洗浄、再結晶、カラムクロマトグラフィー、真空昇華等が採用でき、必要に応じてこれらの方法を組み合わせることができる。
本発明の近赤外光吸収材料中の式(1)で表される化合物の含有量は、近赤外光吸収材料を用いる用途において必要とされる近赤外光の吸収能力が発現する限り特に限定されないが、通常は50質量%以上であり、80質量%以上が好ましく、90質量%以上がより好ましく、95質量%以上が更に好ましい。
本発明の近赤外光吸収材料には、式(1)で表される化合物以外の化合物(例えば式(1)で表される化合物以外の近赤外光吸収材料(色素)等)や添加剤等を併用してもよい。併用し得る化合物や添加剤等は、近赤外光吸収材料を用いる用途において必要とされる近赤外光の吸収能力が発現する限り特に限定されない。
本発明の有機薄膜は、本発明の近赤外光吸収材料を含有する。
本発明の有機薄膜は、一般的な乾式成膜法や湿式成膜法により作製することができる。具体的には真空プロセスである抵抗加熱蒸着、電子ビーム蒸着、スパッタリング及び分子積層法、溶液プロセスであるキャスティング、スピンコーティング、ディップコーティング、ブレードコーティング、ワイヤバーコーティング、スプレーコーティング等のコーティング法、インクジェット印刷、スクリーン印刷、オフセット印刷、凸版印刷等の印刷法、マイクロコンタクトプリンティング法等のソフトリソグラフィーの手法等が挙げられる。
一般的な近赤外光吸収材料の有機薄膜の形成は、加工の容易性という観点から化合物を溶液状態で塗布するようなプロセスが望まれているが、有機膜を積層するような有機エレクトロニクスデバイスの場合、塗布溶液が下層の有機膜を侵す恐れがあることから不向きである。
なお、式(1)で表される化合物は、分子量にかかわらず塗布法で成膜してもよい。塗布法を用いれば、分子量が比較的大きな化合物であっても成膜することが可能である。
尚、本明細書における分子量は、EI-GCMS法で算出した値を意味する。
本発明の有機エレクトロニクスデバイスは本発明の有機薄膜(以下、有機薄膜を単に「薄膜」と言う場合もある)を含む。有機エレクトロニクスデバイスとしては、例えば、有機薄膜トランジスタ、有機光電変換素子、有機太陽電池素子、有機エレクトロルミネッセンス素子(以下、「有機EL素子」又は「有機発光素子」と表す。)、有機発光トランジスタ素子、有機半導体レーザー素子などが挙げられる。本発明では、特に近赤外用途の展開が期待される有機光電変換素子、有機EL素子に着目する。ここでは本発明の実施形態の一つである近赤外光吸収材料を用いた有機光電変換素子、近赤外発光特性を利用した有機EL素子、有機半導体レーザー素子について説明する。
なお、ここでは詳細に説明しないが、700nmを超える近赤外光は、生体組織に対する透過性が高い。従って、生体内組織の観測のための利用も可能であるため、近赤外蛍光プローブ等、医療分野での病理解明、診断等において、その目的に応じて様々な態様での適用が可能である。
上記式(1)で表される化合物は近赤外光吸収特性を有する化合物であることから、有機光電変換素子としての利用が期待される。特に、上記式(1)で表される化合物は、本発明の有機光電変換素子に於ける光電変換層に用いることができる。当該素子に於いては、光に対する応答波長光の吸収帯の極大吸収が700乃至2500nmであることが好ましい。ここで、有機光電変換素子としては近赤外光センサ、有機撮像素子、近赤外光イメージセンサ等が挙げられる。
尚、本明細書における吸収帯の極大吸収とは、吸収スペクトル測定で測定した吸光度のスペクトルにおける極大の吸光度の値を意味し、極大吸収波長(λmax)は極大吸収の中で最も長波長側の極大吸収となる波長を意味する。
光電変換部は、光電変換層と、電子輸送層、正孔輸送層、電子ブロック層、正孔ブロック層、結晶化防止層及び層間接触改良層等から成る群より選択される一種又は複数種の光電変換層以外の有機薄膜層とから成ることが多い。上記式(1)の化合物は光電変換層以外にも用いることもできるが、光電変換層の有機半導体膜の材料として用いることが好ましい。光電変換層は上記式(1)で表される化合物のみで構成されていてもよいが、上記式(1)で表される化合物以外に、公知の近赤外光吸収材料やその他を含んでいてもよい。
次に有機EL素子について説明する。
本発明の式(1)で表される化合物は近赤外発光特性を有することから、有機EL素子への利用が期待される。
1)正孔輸送層/電子輸送性発光層。
2)正孔輸送層/発光層/電子輸送層。
3)正孔輸送性発光層/電子輸送層。
4)正孔輸送層/発光層/正孔阻止層。
5)正孔輸送層/発光層/正孔阻止層/電子輸送層。
6)正孔輸送性発光層/正孔阻止層/電子輸送層。
7)前記1)から6)の組み合わせのそれぞれにおいて、正孔輸送層もしくは正孔輸送性発光層の前に正孔注入層を更にもう一層付与した構成。
8)前記1)から3)、5)から7)の組み合わせのそれぞれにおいて、電子輸送層もしくは電子輸送性発光層の前に電子注入層を更にもう一層付与した構成。
9)前記1)から8)の組み合わせにおいて使用する材料をそれぞれ混合し、この混合した材料を含有する一層のみを有する構成。
なお、前記9)は、一般にバイポーラー性の発光材料と言われる材料で形成される単一の層;又は、発光材料と正孔輸送材料又は電子輸送材料を含む層を一層設けるだけでもよい。一般的に多層構造とすることで、効率良く電荷、すなわち正孔及び/又は電子を輸送し、これらの電荷を再結合させることができる。また電荷のクエンチングなどが抑えられることにより、素子の安定性の低下を防ぎ、発光の効率を向上させることができる。
上記式(1)で表される化合物は近赤外発光特性を有する化合物であることから、有機半導体レーザー素子としての利用が期待される。すなわち、上記式(1)で表される化合物を含有する有機半導体レーザー素子と共振器構造を組み合わせ、効率的にキャリアを注入して励起状態の密度を十分に高めることが出来れば、光が増幅されレーザー発振に至る事が期待される。従来、有機半導体レーザー素子は、光励起によるレーザー発振が観測されるのみであり、電気励起によるレーザー発振に必要とされる高密度の励起状態を発生させるのは非常に困難と言われてきた。しかし、上記式(1)で表される化合物を含有する有機半導体素子を用いることで、高効率な発光(電界発光)が起こる可能性が期待される。
実施例1では、3-メトキシ-2-チエノチオフェンカルボン酸メチルを原料として既報(例えばTetrahedron Letters,2008,49,3716-3721)と同様の方法によって合成した下記式(2-1)で表される化合物を出発原料として、下記の合成フローに準じて下記式(1-1)で表される本発明の化合物を合成した。
フラスコ内で、上記式(2-1)で表される(1-アセチル-4-フルオロフェニル)(3-メトキシ-2-チエノチエニル)メタノン(32mmol)をエタノール(350mL)及び酢酸(75mL)に溶解し、65℃に加熱して酢酸アンモニウム(200mmol)及び塩化アンモニウム(35mmol)を加え、90℃に昇温して3時間撹拌した。反応液を空冷して飽和炭酸水素ナトリウム水溶液で中和したのち、生じた固体を濾過により回収することにより、式(2-2)で表される中間体化合物を得た(8.4mmol、収率:53%)。
式(2-2)で表される中間体化合物の質量分析スペクトルの測定結果は以下の通りであった。
EI-MS(m/z):616[M]+
フラスコに、工程1で得られた式(2-2)で表される化合物(8.4mmol)、トルエン(350mL)及びトリエチルアミン(84mmol)を加えて80℃に加熱後、三フッ化ホウ素ジエチルエーテル錯体(84mmol)を滴下して100℃まで昇温して一晩撹拌した。反応液を空冷して飽和炭酸水素ナトリウム水溶液で中和したのち、生じた固体を濾過により回収することにより、式(2-3)で表される中間体化合物を得た(3.0mmol、収率:36%)。
式(2-3)で表される中間体化合物の核磁気共鳴スペクトル(NMR)の測定結果は以下の通りであった。
1H-NMR(400MHz,CDCl3) δ(ppm)=7.86(q,2H),7.67(s,1H),7.43(d,2H),7.33(dd,2H),7.24-7.22(m,2H),7.21(d,2H),3.96(s,6H)
フラスコに、工程2で得られた式(2-3)で表される中間体化合物(1.8mmol)及びジクロロメタン(60mL)を加えて攪拌し、三臭化ホウ素(9mL)を滴下した後に室温で5時間攪拌した。飽和重曹水を加えて生じた沈殿をろ過により回収し、水とメタノールで繰り返し洗浄することにより、黒色の式(1-1)で表される本発明の化合物1を得た(1.6mmol、収率:89%)。
式(1-1)で表される化合物1の質量分析スペクトル及び吸収スペクトルの測定結果は以下の通りであった。
EI-MS(m/z):596[M]+
λmax=845nm(クロロホルム)
(工程4)下記式(1-2)で表される本発明の化合物2の合成
式(2-1)で表される化合物のかわりに、(1-アセチル-4-フルオロフェニル)(5-(4-シアノフェニル)-3-メトキシ-2-チエノチエニル)メタノンを用いたこと以外は実施例1の工程1乃至3に準じて、式(1-2)で表される本発明の化合物2を得た(収率:89%)。
式(1-2)で表される本発明の化合物2の質量分析スペクトル及び吸収スペクトルの測定結果は以下の通りであった。
EI-MS(m/z):798[M]+
λmax=890nm(クロロホルム)
(工程5)下記式(1-3)で表される本発明の化合物3の合成
式(2-1)で表される化合物のかわりに、(1-アセチル-4-フルオロフェニル)(5-(ベンゾビスチアジアゾール)-3-メトキシ-2-チエノチエニル)メタノンを用いたこと以外は実施例1の工程1乃至3に準じて、式(1-3)で表される本発明の化合物3を得た(収率:55%)。
式(1-3)で表される本発明の化合物3の質量分析スペクトル及び吸収スペクトルの測定結果は以下の通りであった。
EI-MS(m/z):864[M]+
λmax=900nm(クロロホルム)
(工程6)下記式(1-4)で表される本発明の化合物4の合成
式(2-1)で表される化合物のかわりに、(1-アセチル-3-フェニル)―4-フルオロフェニル)(5-(ベンゾビスチアジアゾール)-3-メトキシ-2-チエノチエニル)メタノンを用いたこと以外は実施例1の工程1乃至3に準じて、式(1-4)で表される本発明の化合物4を得た(収率:30%)。
式(1-4)で表される本発明の化合物4の質量分析スペクトル及び吸収スペクトルの測定結果は以下の通りであった。
EI-MS(m/z):1016[M]+
λmax=913nm(クロロホルム)
比較用化合物1の合成
特許文献2に記載の方法に準じて、下記式(3-1)で表される比較用化合物1を得た。この化合物のクロロホルム溶液のλmaxは790nmであった。
比較用化合物2の合成
特許文献6に記載の方法に準じて、下記式(3-2)で表される比較用化合物2を得た。この化合物のクロロホルム溶液のλmaxは769nmであった。
本発明の有機薄膜1の作製及び吸収スペクトル測定
ガラス基板上に実施例1で得られた式(1-1)で表される本発明の化合物1を真空下、抵抗加熱法により蒸着して本発明の有機薄膜1を得た。得られたガラス基板上の有機薄膜1の吸収スペクトルを測定した結果、吸収スペクトルのλmaxは870nmであった。
本発明の有機薄膜2の作製及び吸収スペクトル測定
実施例1で得られた式(1-1)で表される本発明の化合物1の代りに、実施例2で得られた式(1-2)で表される本発明の化合物2を用いた以外は実施例5に準じて、本発明の有機薄膜2を得た。得られたガラス基板上の有機薄膜2の吸収スペクトルを測定した結果、吸収スペクトルのλmaxは905nmであった。
本発明の有機薄膜3の作製及び吸収スペクトル測定
実施例1で得られた式(1-1)で表される本発明の化合物1の代りに、実施例3で得られた式(1-3)で表される本発明の化合物3を用いた以外は実施例5に準じて、本発明の有機薄膜3を得た。得られたガラス基板上の有機薄膜3の吸収スペクトルを測定した結果、吸収スペクトルのλmaxは960nmであった。
本発明の有機薄膜4の作製及び吸収スペクトル測定
実施例1で得られた式(1-1)で表される本発明の化合物1の代りに、実施例4で得られた式(1-4)で表される本発明の化合物3を用いた以外は実施例5に準じて、本発明の有機薄膜3を得た。得られたガラス基板上の有機薄膜3の吸収スペクトルを測定した結果、吸収スペクトルのλmaxは984nmであった。
比較用有機薄膜1の作製及び吸収スペクトル測定
実施例1で得られた式(1-1)で表される本発明の化合物1の代りに、比較例1で得られた式(3-1)で表される比較用化合物1を用いた以外は実施例5に準じて、比較用有機薄膜1を得た。得られたガラス基板上の比較用の有機薄膜1の吸収スペクトルを測定した結果、吸収スペクトルのλmaxは760nmであった。
比較用有機薄膜2の作製及び吸収スペクトル測定
実施例1で得られた式(1-1)で表される本発明の化合物1の代りに、比較例2で得られた式(3-2)で表される比較用化合物2を用いた以外は実施例5に準じて、比較用有機薄膜2を得た。得られたガラス基板上の比較用の有機薄膜2の吸収スペクトルを測定した結果、吸収スペクトルのλmaxは810nmであった。
本発明の有機薄膜を含む有機光電変換素子1の作製と評価
予め洗浄したITO透明導電硝子(ジオマテック社製、ITO膜厚150nm)上に、実施例1で得られた式(1-1)で表される本発明の化合物1を抵抗加熱真空蒸着して厚さ100nmの有機薄膜を形成した。次いで、得られた有機薄膜上に、アルミニウムを抵抗加熱真空蒸着して厚さ100nmの電極を成膜することにより、本発明の有機光電変換素子1を作製した。ITOとアルミニウムを電極として、350nmから1100nmの光照射を行った状態で電圧1Vを印加した際の光電流応答性を測定した結果、最大光電流波長は906nmであった。
本発明の有機薄膜を含む有機光電変換素子2の作製と評価
予め洗浄したITO透明導電硝子(ジオマテック社製、ITO膜厚150nm)上に、実施例2で得られた式(1-2)で表される本発明の化合物2を抵抗加熱真空蒸着して厚さ100nmの有機薄膜を形成した。次いで、得られた有機薄膜上に、アルミニウムを抵抗加熱真空蒸着して厚さ100nmの電極を成膜することにより、本発明の有機光電変換素子2を作製した。ITOとアルミニウムを電極として、350nmから1100nmの光照射を行った状態で電圧1Vを印加した際の光電流応答性を測定した結果、最大光電流波長は981nmであった。
本発明の有機薄膜を含む有機光電変換素子3の作製と評価
予め洗浄したITO透明導電硝子(ジオマテック社製、ITO膜厚150nm)上に、実施例3で得られた式(1-3)で表される本発明の化合物3を抵抗加熱真空蒸着して厚さ100nmの有機薄膜を形成した。次いで、得られた有機薄膜上に、アルミニウムを抵抗加熱真空蒸着して厚さ100nmの電極を成膜することにより、本発明の有機光電変換素子3を作製した。ITOとアルミニウムを電極として、350nmから1100nmの光照射を行った状態で電圧1Vを印加した際の光電流応答性を測定した結果、最大光電流波長は990nmであった。
比較用有機薄膜を含む比較用有機光電変換素子1の作製と評価
式(1-1)で表される化合物1の代わりに式(3-1)で表される比較用化合物1を用いたこと以外は実施例9に準じて比較用有機光電変化素子1を作製し、光電流応答性を測定した。ITOとアルミニウムを電極として、350nmから1100nmの光照射を行った状態で電圧1Vを印加した際の光電流応答性を測定した結果、最大光電流波長は772nmであった。
比較用有機薄膜を含む比較用有機光電変換素子2の作製と評価
式(1-1)で表される化合物1の代わりに式(3-2)で表される比較用化合物2を用いたこと以外は実施例9に準じて比較用有機光電変化素子2を作製し、光電流応答性を測定した。ITOとアルミニウムを電極として、350nmから1100nmの光照射を行った状態で電圧1Vを印加した際の光電流応答性を測定した結果、最大光電流波長は824nmであった。
実施例9乃至11で得られた本発明の有機光電変換素子1、2、3を用いて、実施例9乃至11と同じ条件の光照射及び印可電圧で光電流値(A/cm2)と暗電流値(A/cm2)を測定し、900nm及び1000nmにおける明暗比を算出し、結果を表1に示した。
比較例5乃至6で得られた比較用有機光電変換素子1、2を用いて、比較例5乃至6と同じ条件の光照射及び印可電圧で光電流値(A/cm2)と暗電流値(A/cm2)を測定し、900nm及び1000nmにおける明暗比を算出し、結果を表1に示した。
近赤外付近でも高い明暗比であり、撮像素子の材料として有効であることがわかった。
1 絶縁部
2 上部電極膜
3 電子ブロック層
4 光電変換層
5 正孔ブロック層
6 下部電極膜
7 絶縁基材若しくは他光電変換素子
1E 基板
2E 陽極
3E 正孔注入層
4E 正孔輸送層
5E 発光層
6E 電子輸送層
7E 陰極
Claims (14)
- 下記式(1)
- R1乃至R4の少なくとも一つが脂肪族炭化水素基、芳香族基、複素環基又はハロゲン原子であって、かつR5乃至R8の少なくとも一つが脂肪族炭化水素基、芳香族基、複素環基又はハロゲン原子である請求項1に記載の化合物。
- R1乃至R4の少なくとも一つがハロゲン原子であって、かつR5乃至R8の少なくとも一つがハロゲン原子である請求項2に記載の化合物。
- R1乃至R4の少なくとも一つが芳香族基又は複素環基であって、かつR5乃至R8の少なくとも一つが芳香族基又は複素環基である請求項2に記載の化合物。
- R1とR8が同一であって、R2とR7が同一であって、R3とR6が同一であって、かつR4とR5が同一である請求項1乃至4のいずれか一項に記載の化合物。
- R9及びR10の少なくとも一つが芳香族基又は複素環基であって、かつR11及びR12の少なくとも一つが芳香族基又は複素環基である請求項1乃至5のいずれか一項に記載の化合物。
- R9及びR12が水素原子であって、かつR10及びR11が芳香族基又は複素環基である請求項6に記載の化合物。
- R21乃至R25の少なくとも一つが、ハロゲン原子、ホルミル基、アセチル基、アルコキシカルボニル基、トリフルオロメチル基、シアノ基、ニトロ基、トルエンスルホニル基、メタンスルホニル基、トリフルオロメタンスルホニル基、ピリジル基、キノリル基、ピラジル基、キノキサリル基、チアゾリル基、ベンゾチアゾリル基、インドリル基、ベンゾチアジアゾリル基、スクシンイミドイル基及びフタルイミドイル基からなる群より選択される電子受容性の置換基又は原子である請求項8に記載の化合物。
- R21とR22が結合して、又はR22とR23が結合して、窒素原子及び/又は硫黄原子を含む複素環を形成している請求項8に記載の化合物。
- 請求項1乃至10のいずれか一項に記載の化合物を含む近赤外光吸収材料。
- 請求項11に記載の近赤外光吸収材料を含む有機薄膜。
- 請求項12に記載の有機薄膜を含む有機エレクトロニクスデバイス。
- 請求項12に記載の有機薄膜を含む有機光電変換素子。
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WO2018079653A1 (ja) * | 2016-10-28 | 2018-05-03 | 日本化薬株式会社 | ジベンゾピロメテンホウ素キレート化合物、近赤外光吸収材料、薄膜及び有機エレクトロニクスデバイス |
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WO2013035303A1 (ja) * | 2011-09-09 | 2013-03-14 | 出光興産株式会社 | 有機薄膜太陽電池材料 |
JP2017137264A (ja) * | 2016-02-04 | 2017-08-10 | 日本化薬株式会社 | 有機化合物、赤外光吸収材料及びその利用 |
WO2018079653A1 (ja) * | 2016-10-28 | 2018-05-03 | 日本化薬株式会社 | ジベンゾピロメテンホウ素キレート化合物、近赤外光吸収材料、薄膜及び有機エレクトロニクスデバイス |
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WO2022181439A1 (ja) * | 2021-02-25 | 2022-09-01 | 日本化薬株式会社 | ホウ素キレート化合物、近赤外光吸収材料、薄膜、光電変換素子、及び撮像素子 |
JP7523390B2 (ja) | 2021-02-25 | 2024-07-26 | 日本化薬株式会社 | ホウ素キレート化合物、近赤外光吸収材料、薄膜、光電変換素子、及び撮像素子 |
CN115093433A (zh) * | 2022-05-30 | 2022-09-23 | 华南理工大学 | 一种亲水性有机近红外吸收染料及其制备方法与应用 |
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KR20210124325A (ko) | 2021-10-14 |
CN113286799A (zh) | 2021-08-20 |
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