WO2020159183A1 - Polyimide-based polymer film, and substrate for display device and optical device, each using same - Google Patents

Polyimide-based polymer film, and substrate for display device and optical device, each using same Download PDF

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Publication number
WO2020159183A1
WO2020159183A1 PCT/KR2020/001263 KR2020001263W WO2020159183A1 WO 2020159183 A1 WO2020159183 A1 WO 2020159183A1 KR 2020001263 W KR2020001263 W KR 2020001263W WO 2020159183 A1 WO2020159183 A1 WO 2020159183A1
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Prior art keywords
polyimide
functional group
based resin
resin film
formula
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PCT/KR2020/001263
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French (fr)
Korean (ko)
Inventor
김경환
박찬효
Original Assignee
주식회사 엘지화학
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Priority claimed from KR1020190121177A external-priority patent/KR102427758B1/en
Priority claimed from KR1020190121178A external-priority patent/KR102427759B1/en
Priority claimed from KR1020190161495A external-priority patent/KR102427760B1/en
Priority claimed from KR1020190161494A external-priority patent/KR102465430B1/en
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to US15/733,816 priority Critical patent/US20210230368A1/en
Priority to CN202080003026.5A priority patent/CN112204085B/en
Priority to JP2020565994A priority patent/JP7414011B2/en
Publication of WO2020159183A1 publication Critical patent/WO2020159183A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

Definitions

  • the present invention relates to a polyimide-based resin film, a substrate for a display device using the same, and an optical device capable of securing excellent optical properties even under high temperature heat treatment conditions and stably maintaining optical properties even during additional heat treatment.
  • the display device market is rapidly changing with a focus on flat panel displays (FPDs), which are easy to have a large area and can be thin and light.
  • the flat panel display includes a liquid crystal display (LCD), an organic light emitting display (OLED), or an electrophoretic display (EPD).
  • TFT devices are manufactured by depositing a multilayer inorganic film such as a buffer layer, an active layer, and a gate insulator on a cured polyimide.
  • the emission efficiency may be reduced by a difference between the refractive index of the multi-layered upper layer made of the inorganic film and the refractive index of the polyimide layer as described above.
  • the polyimide material included in the polyimide layer (substrate layer) is cured at a high temperature of 400° C. or higher, a decrease in optical properties may occur due to deterioration of the polyimide.
  • the present invention relates to a polyimide-based resin film capable of securing excellent optical properties even under high temperature heat treatment conditions and stably maintaining optical properties even during additional heat treatment.
  • the present invention is to provide a substrate for a display device using the polyimide-based resin film, and an optical device.
  • the polyimide-based resin containing a polyimide repeating unit represented by the following Chemical Formula 1 is included, and the absolute value of the yellow index change amount ( ⁇ YI) obtained by the following Equation 1 is 4
  • the following is a polyimide-based resin film.
  • X 1 is a tetravalent functional group represented by the following Chemical Formula 2
  • Y 1 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group
  • Ar is a polycyclic aromatic divalent functional group
  • Equation 1 YI f is the final yellow index of the film obtained after heat treatment of the polyimide resin film at a temperature of 400° C. to 450° C. for 130 minutes to 200 minutes, and YI 0 is a polyimide system before the heat treatment. It is the yellow index of the resin film.
  • a substrate for a display device comprising the polyimide-based resin film.
  • optical device comprising the polyimide-based resin film.
  • first component may also be referred to as the second component, and similarly, the second component may be referred to as the first component.
  • the (co)polymer means a polymer or a copolymer
  • the polymer means a homopolymer composed of a single repeating unit
  • the copolymer means a composite polymer containing two or more repeating units.
  • substitution means that other functional groups are bonded in place of the hydrogen atom in the compound, and the position to be substituted is not limited to a position where the hydrogen atom is substituted, that is, a position where the substituent is substitutable, and is substituted when two or more are substituted. , 2 or more substituents may be the same or different from each other.
  • substituted or unsubstituted in this specification is deuterium; Halogen group; Cyano group; Nitro group; Hydroxy group; Carbonyl group; Ester groups; Imide group; Amide group; Primary amino group; Carboxy group; Sulfonic acid group; Sulfonamide groups; Phosphine oxide group; Alkoxy groups; Aryloxy group; Alkyl thioxy group; Arylthioxy group; Alkyl sulfoxy group; Aryl sulfoxyl group; Silyl group; Boron group; Alkyl groups; Cycloalkyl group; Alkenyl group; Aryl group; Aralkyl group; An alkenyl group; Alkyl aryl groups; Alkoxysilylalkyl groups; Arylphosphine group; Or substituted or unsubstituted with one or more substituents selected from the group consisting of heterocyclic groups containing one or more of N, O and S atoms, or substituted or unsubstituted
  • aromatic is a property that satisfies the Huckels Rule (Huckels Rule), it can be defined as a case that satisfies all three conditions according to the Huckel rule.
  • the alkyl group is a monovalent functional group derived from alkane, and may be a straight chain or a branched chain, and the carbon number of the straight chain alkyl group is not particularly limited, but is preferably 1 to 20. Further, the number of carbon atoms in the branched chain alkyl group is 3 to 20.
  • alkyl group examples include methyl, ethyl, propyl, n-propyl, isopropyl, butyl, n-butyl, isobutyl, tert-butyl, sec-butyl, 1-methyl-butyl, 1-ethyl-butyl, pentyl, n -Pentyl, isopentyl, neopentyl, tert-pentyl, hexyl, n-hexyl, 1-methylpentyl, 2-methylpentyl, 4-methyl-2-pentyl, 3,3-dimethylbutyl, 2-ethylbutyl, heptyl , n-heptyl, 1-methylhexyl, octyl, n-octyl, tert-octyl, 1-methylheptyl, 2-ethylhexyl, 2-propylpentyl, n-non
  • the halo alkyl group means a functional group in which the halogen group is substituted with the aforementioned alkyl group, and examples of the halogen group include fluorine, chlorine, bromine or iodine.
  • the haloalkyl group may be substituted or unsubstituted, and when substituted, examples of the substituent are as described above.
  • a multivalent functional group is a residue in which a plurality of hydrogen atoms bound to an arbitrary compound are removed, for example, a divalent functional group, a trivalent functional group, and a tetravalent functional group.
  • a tetravalent functional group derived from cyclobutane refers to a residue in which any 4 hydrogen atoms attached to cyclobutane are removed.
  • the electron withdrawing group may include one or more selected from the group consisting of haloalkyl groups, halogen groups, cyano groups, nitro groups, sulfonic acid groups, carbonyl groups and sulfonyl groups, preferably It may be a haloalkyl group such as trifluoromethyl group (-CF 3 ).
  • a direct bond or a single bond means that there is no atom or atomic group at the corresponding position, and is connected by a bond line. Specifically, it means that a separate atom is not present in a portion represented by L 1 and L 2 in the chemical formula.
  • the weight average molecular weight means the weight average molecular weight of polystyrene conversion measured by GPC method.
  • detectors and analytical columns such as a commonly known analytical device and a differential index detector, can be used, and the temperature is usually applied.
  • Conditions, solvents and flow rates can be applied.
  • the evaluation temperature is 160°C, and 1,2,4-trichlorobenzene is used as a solvent.
  • the flow rate was 1 mL/min
  • the sample was prepared at a concentration of 10 mg/10 mL, and then supplied in an amount of 200 ⁇ L, and the value of Mw can be obtained by using an assay curve formed using a polystyrene standard.
  • the molecular weight of the polystyrene standard was 2,000 / 10,000 / 30,000 / 70,000 / 200,000 / 700,000 / 2,000,000 / 4,000,000 / 10,000,000.
  • a polyimide containing a polyimide-based resin including a polyimide repeating unit represented by Chemical Formula 1, and having an absolute value of a change in yellow index ( ⁇ YI) obtained by Equation 1 of 4 or less. Based resin film may be provided.
  • the present inventors like the polyimide-based resin film of the above embodiment, the tetravalent functional group derived from the tetracarboxylic acid dianhydride having a specific structure as in Chemical Formula 2 in the polyimide repeating unit structure and the number of carbon atoms substituted with at least one electron withdrawing functional group As the aromatic divalent functional group of 15 or more was contained, the polyimide resin film cured at a high temperature of 400° C. or higher also had excellent optical properties through experiments, and the invention was completed.
  • the polyimide-based resin comprises a reaction product obtained through an imidization reaction of a tetracarboxylic dianhydride containing a structure represented by Formula 2 and an aromatic diamine having 15 or more carbon atoms substituted with at least one electron withdrawing functional group,
  • a trifluoromethyl group capable of imparting an electron withdrawing effect to a diamine monomer compound used in the synthesis of polyimide resin is introduced as a substituent, and CTC (charge of Pi-electrons present in the imide chain) By suppressing the formation of transfer complex), transparency can be secured to realize excellent optical properties.
  • the polyimide-based resin synthesized from an aromatic diamine monomer having 15 or more carbon atoms with at least one electron withdrawing group functionally improves ordering and orientation characteristics between molecules to ensure sufficient heat resistance even in a polyimide film obtained by high temperature curing, thereby making it plastic.
  • the plastic substrate When used as a substrate, when heat-treating the metal layer formed on the plastic substrate, the plastic substrate is prevented from being damaged by heat, and excellent optical properties can be achieved even when heat treatment is performed at an additional high temperature of 400° C. or higher.
  • the polyimide film according to the present invention can increase the refractive index, and is used as a substrate layer in a flexible display device, thereby reducing the difference in refractive index with each layer constituting the device. By reducing the amount of extinguished light, it is possible to effectively increase the emission efficiency of the light (bottom emission).
  • the polyimide-based resin means that polyimide and polyamic acid and polyamic acid ester, which are precursor polymers thereof, are all included. That is, the polyimide-based polymer may include at least one selected from the group consisting of a polyamic acid repeating unit, a polyamic acid ester repeating unit, and a polyimide repeating unit. That is, the polyimide-based polymer may include a polyamic acid repeating unit, one polyamic acid ester repeating unit, one polyimide repeating unit, or a copolymer of two or more repeating units thereof.
  • One or more repeating units selected from the group consisting of the polyamic acid repeating unit, polyamic acid ester repeating unit, and polyimide repeating unit may form a main chain of the polyimide-based polymer.
  • the polyimide-based resin may include a polyimide repeating unit represented by Chemical Formula 1.
  • X 1 is a tetravalent functional group represented by Chemical Formula 2
  • X 1 is a functional group derived from a tetracarboxylic acid dianhydride compound used in the synthesis of polyimide resins.
  • Ar is a polycyclic aromatic divalent functional group.
  • the polycyclic aromatic divalent functional group may be a polycyclic aromatic hydrocarbon compound or a divalent functional group derived from a derivative compound thereof, and may include a fluorenylene group.
  • the derivative compound includes all compounds in which one or more substituents are introduced or carbon atoms are replaced by heteroatoms.
  • the polycyclic aromatic divalent functional group may include a conjugated cyclic divalent functional group containing at least two or more aromatic ring compounds. That is, the polycyclic aromatic divalent functional group may contain at least two or more aromatic ring compounds in the functional group structure, as well as the functional group may have a fused ring structure.
  • the aromatic ring compound may include an arene compound containing at least one benzene ring, or a hetero arene compound in which carbon atoms in the arene compound are replaced by heteroatoms.
  • the aromatic ring compound may contain at least two or more in the polycyclic aromatic divalent functional group, and each of the two or more aromatic ring compounds may form a direct fused ring or a fused ring through a different ring structure.
  • each of the two or more aromatic ring compounds may form a direct fused ring or a fused ring through a different ring structure.
  • two benzene rings are respectively bonded to a cycloalkyl ring structure, it can be defined that two benzene rings each form a cycloalkyl ring.
  • the conjugated cyclic divalent functional group containing at least two or more aromatic cyclic compounds is a divalent functional group derived from a conjugated cyclic compound containing at least two or more aromatic cyclic compounds or a derivative compound thereof, wherein the derivative compound has one or more substituents introduced Or a compound in which the carbon atom has been replaced with a heteroatom.
  • Examples of the polycyclic aromatic divalent functional group are not particularly limited, and examples thereof include a fluorenylene group.
  • the tetravalent functional group represented by Chemical Formula 2 may be a functional group represented by Chemical Formula 2-1.
  • Y 1 is an aromatic divalent functional group having 15 or more carbon atoms substituted with at least one electron withdrawing group, and Y 1 is an action derived from a diamine compound used in the synthesis of polyamic acid, polyamic acid ester, or polyimide. It can be a flag.
  • the aromatic divalent functional group having 15 or more carbon atoms in Y 1 may include three or more aromatic cyclic compounds. As such, as three or more aromatic cyclic compounds are contained, the ordering and orientation characteristics of the polyimide-based resin are improved, and sufficient heat resistance can be secured even in a polyimide film obtained by high temperature curing.
  • the aromatic divalent functional group having 15 or more carbon atoms may include at least one selected from the group consisting of a triphenylene group, a quaterphenylene group, and a pentaphenylene group.
  • the electron withdrawing functional group may include at least one selected from the group consisting of haloalkyl groups, halogen groups, cyano groups, nitro groups, sulfonic acid groups, carbonyl groups and sulfonyl groups.
  • CTC charge transfer complex
  • the aromatic divalent functional group having 15 or more carbon atoms substituted with at least one electron withdrawing functional group of Y 1 may include a functional group represented by the following Chemical Formula 3.
  • T 1 to T 3 are the same or different from each other, each independently an electron withdrawing group, m1 to m3 are the same or different from each other, and at least one of m1 to m3 is an integer of 1 to 4, the rest Is an integer from 0 to 4, and n is an integer from 1 to 10.
  • An aromatic divalent functional group having 15 or more carbon atoms substituted with at least one electron withdrawing functional group of Y 1 may include a functional group represented by the following Chemical Formula 3-1.
  • the polyimide-based resin may include a combination of tetracarboxylic acid dianhydride represented by the following Chemical Formula 4 and aromatic diamine having 15 or more carbon atoms substituted with at least one electron withdrawing functional group.
  • Ar' is a polycyclic aromatic divalent functional group.
  • the polycyclic aromatic divalent functional group is a divalent functional group derived from a polycyclic aromatic hydrocarbon compound, and may include a fluorenylene group as a divalent functional group derived from a fluorenylene group or a derivative compound thereof.
  • the derivative compound includes all compounds in which one or more substituents are introduced or carbon atoms are replaced by heteroatoms.
  • a specific example of the tetracarboxylic acid dianhydride represented by Chemical Formula 4 is 9,9-bis(3,4-dicarboxyphenyl)fluorene dianhydride (9,9-Bis(3,4-dicarboxyphenyl)fluorene Dianhydride, BPAF). Can be lifted.
  • the aromatic diamine having 15 or more carbon atoms in which the electron withdrawing functional group is substituted by at least 1 is a compound in which an amino group (-NH 2 ) is bonded to the sock end of the aromatic di2 having 15 or more carbon atoms in which the electron withdrawing functional group is substituted by at least 1,
  • the description of the aromatic divalent functional group having 15 or more carbon atoms in which the electron withdrawing functional group is substituted by at least one is as described above.
  • aromatic diamine having 15 or more carbon atoms in which the electron withdrawing functional group is substituted with at least one or more include diamine represented by the following formula (a).
  • the polyimide-based resin has a terminal anhydride group (-OC-O-CO-) of tetracarboxylic acid dianhydride represented by Chemical Formula 4 and an aromatic diamine having at least 15 carbon atoms substituted with at least one electron withdrawing group.
  • the reaction between the amino group (-NH 2 ) may form a bond between the nitrogen atom of the amino group and the carbon atom of the anhydride group.
  • the polyimide-based resin may further include a polyimide repeating unit represented by Formula 5 below.
  • X 2 is one of a tetravalent functional group represented by the following Chemical Formula 6, and Y 2 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group,
  • R 1 to R 6 are each independently hydrogen or an alkyl group having 1 to 6 carbon atoms
  • L is a single bond, -O-, -CO-, -COO-, -S-, -SO-,- SO 2 -, -CR 7 R 8 -, -(CH 2 ) t -, -O(CH 2 ) t O-, -COO(CH 2 ) t OCO-, -CONH-, phenylene or combinations thereof Any one selected from the group consisting of, wherein R 7 and R 8 are each independently hydrogen, an alkyl group having 1 to 10 carbon atoms, or a halo alkyl group having 1 to 10 carbon atoms, and t is an integer of 1 to 10.
  • Functional group represented by Chemical Formula 6 include functional groups represented by Chemical Formula 6-1, functional groups represented by Chemical Formula 6-2, or functional groups represented by Chemical Formula 6-3.
  • the polyimide-based polymer includes: a first repeating unit containing a repeating unit represented by Formula 1, wherein a repeating unit derived from tetracarboxylic acid dianhydride is a functional group represented by Formula 2; And a second repeating unit containing a repeating unit represented by Formula 5, wherein the repeating unit derived from tetracarboxylic dianhydride is a functional group represented by Formula 6 above.
  • the first repeating unit and the second repeating unit are randomly arranged in the polyimide-based polymer to form a random copolymer, or a block between the first repeating unit and a block between the second repeating units to form a block copolymer.
  • the polyimide-based polymer including the repeating unit represented by Chemical Formula 1 and the repeating unit represented by Chemical Formula 5 may be prepared by reacting two or more different tetracarboxylic acid dianhydride compounds with diamine compounds. Tetracarboxylic acid dianhydride may be added simultaneously to synthesize a random copolymer, or sequentially added to synthesize a block copolymer.
  • the polyimide repeating unit represented by Chemical Formula 5 may contain 1 mol% or more and 99 mol% or less of all the repeating units contained in the polyimide resin.
  • the polyimide repeating unit represented by Formula 1 and the polyimide repeating unit represented by Formula 5 are 70 mol% or more, or 80 mol% or more, or 90 mol% or more, compared to the total repeating units contained in the polyimide-based resin, or 70 mol% or more, 100 mol% or less, 80 mol% or more, 100 mol% or less, 70 mol% or more, 90 mol% or less, 70 mol% or more, 99 mol% or less, 80 mol% or more, 99 mol% or less, 90 mol% or more, 99 or more 99 It may contain less than mol%.
  • the polyimide-based resin is composed of only the polyimide repeating unit represented by Formula 1 and the polyimide repeating unit represented by Formula 5, or most of the polyimide repeating unit represented by Formula 1 and Formula 5 It may be made of polyimide repeat units.
  • other diamines other than diamines capable of inducing aromatic divalent functional groups having 15 or more carbon atoms substituted with at least one electron withdrawing functional group are not mixed, or may be mixed in an extremely small amount of less than 1 mol%. have.
  • the polyimide repeating unit represented by Chemical Formula 5 may include one or more repeat units selected from the group consisting of mid repeat units.
  • X 3 is a tetravalent functional group represented by Chemical Formula 6-1
  • Y 3 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group
  • X 4 is a tetravalent functional group represented by Chemical Formula 6-2
  • Y 4 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group
  • X 5 is a tetravalent functional group represented by Chemical Formula 6-3
  • Y 5 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group.
  • the weight average molecular weight (measured by GPC) of the polyimide-based resin is not particularly limited, but may be, for example, 1000 g/mol or more and 200000 g/mol or less, or 10000 g/mol or more and 200000 g/mol or less.
  • the polyimide-based resin according to the present invention can exhibit excellent colorless and transparent characteristics while maintaining characteristics such as heat resistance, mechanical strength, etc. due to a rigid structure, an element substrate, a display substrate for a display, and an optical film , IC (integrated circuit) package, electrodeposition film (adhesive film), multi-layer flexible printed circuit (FRC), tape, touch panel, protective film for optical disk, etc. can be used in various fields, especially suitable for display cover board have.
  • the polyimide-based resin film of the embodiment may include a cured product in which the polyimide-based resin is cured at a temperature of 400° C. or higher.
  • the cured product means a material obtained through a curing process of a resin composition containing the polyimide-based resin, and the curing process is performed at a temperature of 400° C. or higher, or 400° C. or higher and 500° C. or lower, for 50 minutes to 100 minutes. Can proceed.
  • an example of a method for synthesizing the polyimide-based resin film is not particularly limited, and for example, forming a coating film by applying a resin composition containing the polyimide-based resin to a substrate (step 1); Drying the coating film (step 2); A method of manufacturing the film may be used, including the step of curing the dried coating film by heat treatment (step 3).
  • Step 1 is a step of forming a coating film by applying a resin composition containing the above-described polyimide resin to a substrate.
  • the method of applying the resin composition containing the polyimide-based resin to the substrate is not particularly limited, and for example, methods such as screen printing, offset printing, flexo printing, inkjet, and the like can be used.
  • the resin composition containing the polyimide resin may be dissolved or dispersed in an organic solvent.
  • the solution may be the reaction solution itself obtained, and the reaction solution may be diluted with another solvent.
  • a polyimide resin when a polyimide resin is obtained as a powder, it may be dissolved in an organic solvent to form a solution.
  • organic solvent examples include toluene, N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 2-pyrrolidone, N-ethyl Pyrrolidone, N-vinylpyrrolidone, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylsulfoxide, gamma-butyrolactone, 3-methoxy-N,N-dimethylpropanamide, 3- Ethoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, 1,3-dimethyl-imidazolidinone, ethyl amyl ketone, methylnonyl ketone, methyl ethyl ketone, methyl isoa Milk ketone, methyl isopropyl ketone, cyclohexanone,
  • the resin composition containing the polyimide-based resin may contain solid content in an amount to have an appropriate viscosity in consideration of processability such as coatability during the film forming process.
  • the content of the composition may be adjusted such that the total resin content is 5% to 25% by weight, or 5% to 20% by weight, or 5% to 15% by weight. .
  • the resin composition containing the polyimide-based resin may further include other components in addition to the organic solvent.
  • the resin composition containing the polyimide-based resin when applied, it improves the uniformity or surface smoothness of the film thickness, or improves the adhesion to the substrate, or changes the dielectric constant or conductivity.
  • additives that can increase the density may be further included. Examples of such additives include surfactants, silane-based compounds, dielectric or cross-linkable compounds, and the like.
  • the step 2 is a step of drying the coating film formed by applying the resin composition containing the polyimide resin to the substrate.
  • the drying step of the coating film may be performed by heating means such as a hot plate, a hot air circulation path, an infrared furnace, and may be performed at a temperature of 50°C or more and 150°C or less, or 50°C or more and 100°C or less.
  • heating means such as a hot plate, a hot air circulation path, an infrared furnace, and may be performed at a temperature of 50°C or more and 150°C or less, or 50°C or more and 100°C or less.
  • Step 3 is a step of curing the dried coating film by heat treatment.
  • the heat treatment may be performed by heating means such as a hot plate, a hot air circulation path, an infrared furnace, and may be performed at a temperature of 400°C or higher, or 400°C or higher and 500°C or lower.
  • the thickness of the polyimide-based resin film is not particularly limited, for example, it can be freely adjusted within a range of 0.01 ⁇ m or more and 1000 ⁇ m or less. When the thickness of the polyimide-based resin film increases or decreases by a specific value, physical properties measured in the polyimide-based resin film may also change by a certain value.
  • the absolute value of the amount of change in the yellow index obtained by Equation 1 below is 4 or less, or 3.5 or less, or 0.01 or more and 4 or less, or 0.01 or more and 3.5 or less, or 0.05 or more and 4 or less, or 0.05 Or more and 3.5 or less, or 0.1 or more and 4 or less, or 0.1 or more and 3.5 or less.
  • Equation 1 YI f is the final yellow index of the film obtained after heat treatment of the polyimide resin film at a temperature of 400° C. to 450° C. for 130 minutes to 200 minutes, and YI 0 is a polyimide system before the heat treatment. It is the yellow index of the resin film.
  • the change in the actual yellow index according to the additional heat treatment can be compared through the absolute value of the amount of change in yellow index obtained in Equation 1.
  • the yellow index change amount obtained in Equation 1 is a negative number (eg, -1)
  • the absolute value of the yellow index change amount obtained in Equation 1 may be a value with a negative sign removed (eg 1).
  • the yellow index change amount obtained in Equation 1 is a positive number (for example, 1)
  • the absolute value of the yellow index change amount obtained in Equation 1 is a yellow index change amount value (eg, 1) obtained in Equation 1 Is the same as
  • an example of a method of heat-treating the polyimide-based resin film at a temperature of 400°C to 450°C for 130 minutes to 200 minutes is not particularly limited, and the heat treatment may be performed in a single step, or in multiple steps. Can proceed to In the case of the multi-step, an additional heat treatment process of 2 to 10 steps may be performed, and in this case, each step may be performed continuously or discontinuously.
  • each heat treatment step is performed at a temperature of 400°C to 450°C, and the total sum of the times of each heat treatment step satisfies 130 minutes to 200 minutes.
  • the absolute value of the amount of change in the yellow index, which is the optical property of the film is very small to 4 or less, so the polyimide of the above embodiment Based resin film can achieve high heat resistance.
  • the yellow index is a result of analyzing a polyimide-based resin film sample with a color meter (Color-Eye 7000A of GRETAGMACBETH). It can be measured automatically.
  • a pure polyimide-based resin film may be secured through a process of peeling the base film from a laminate including a base film and a polyimide-based resin film coated on the base film.
  • the yellow index may be measured for a sample of a polyimide resin film of one embodiment having a thickness of 5 ⁇ m or more and 30 ⁇ m or less, or 5 ⁇ m or more and 15 ⁇ m or less, or 8 ⁇ m or more and 12 ⁇ m or less.
  • the yellow index of the polyimide resin film before the heat treatment is 15 or less, or 14.5 or less, or 1 or more 15 or less, or 1 or more 14.5 or less, or 5 or more 15 or less, or 5 or more 14.5 or less, or 8.8 or more and 14.1 or less.
  • the polyimide resin film which is a yellow index measurement target of the polyimide resin film before the heat treatment, refers to a material obtained through a curing process of a resin composition containing a polyimide resin as described above, and the curing process is, for example, For example, at a temperature of 400° C. or higher, or 400° C. or higher and 500° C. or lower, the temperature may be 50 minutes or more and 100 minutes or less.
  • the final yellow index of the polyimide-based resin film is 20 or less, or 18 or less, or 5 or more 20 or less, or 5 or more 18 or less, or 8 or more 20 or less, or 8 or more and 18 or less, Or 8.7 or more and 17.6 or less.
  • the final yellow index measurement target polyimide-based resin film means a film obtained after further heat-treating the polyimide-based resin film at a temperature of 400°C to 450°C for 130 minutes to 200 minutes as described above, and the heat treatment Is as described above in Equation (1).
  • a substrate for a display device including the polyimide-based resin film of the other embodiment may be provided.
  • the contents of the polyimide-based resin film may include all of the contents described above in one embodiment.
  • the display device including the substrate is a liquid crystal display device (LCD), an organic light emitting diode (OLED), a flexible display (Flexible Display), or a rollable display device (rollable display or foldable display) ) And the like, but is not limited thereto.
  • LCD liquid crystal display device
  • OLED organic light emitting diode
  • flexible display Flexible Display
  • rollable display device rollable display or foldable display
  • the display device may have various structures depending on the application field and the specific shape, for example, a structure including a cover plastic window, a touch panel, a polarizing plate, a barrier film, a light emitting device (such as an OLED device), and a transparent substrate. have.
  • the polyimide-based resin film of the other embodiments described above may be used for various purposes such as a substrate, an external protective film, or a cover window in these various display devices, and more specifically, may be applied as a substrate.
  • the substrate for a display device may have a structure in which a device protection layer, a transparent electrode layer, a silicon oxide layer, a polyimide resin film, a silicon oxide layer, and a hard coating layer are sequentially stacked.
  • the transparent polyimide substrate may include a silicon oxide layer formed between the transparent polyimide-based resin film and the cured layer in terms of further improving solvent resistance, moisture permeability, and optical properties, and the silicon oxide layer is poly It may be produced by curing silazane.
  • the silicon oxide layer is formed by curing the coated polysilazane after coating and drying a solution containing polysilazane before the step of forming a coating layer on at least one surface of the transparent polyimide resin film.
  • the substrate for a display device can provide a transparent polyimide cover substrate having solvent resistance, optical properties, moisture permeability, and scratch resistance, while having excellent bending properties and impact resistance by including the above-described device protection layer. have.
  • an optical device including the polyimide-based resin film of the other embodiment may be provided.
  • the contents of the polyimide-based resin film may include all of the contents described above in one embodiment.
  • the optical device may include all of various devices using properties realized by light, for example, a display device.
  • a display device include a liquid crystal display device (LCD), an organic light emitting diode (OLED), a flexible display, or a rollable display or foldable display And the like, but is not limited thereto.
  • LCD liquid crystal display device
  • OLED organic light emitting diode
  • flexible display or a rollable display or foldable display And the like, but is not limited thereto.
  • the optical device may have various structures according to application fields and specific shapes, and may be, for example, a structure including a cover plastic window, a touch panel, a polarizing plate, a barrier film, a light emitting device (such as an OLED device), and a transparent substrate. have.
  • the polyimide-based resin film of the other embodiments described above may be used in various applications such as a substrate, an external protective film, or a cover window in these various optical devices, and more specifically, may be applied to a substrate.
  • a polyimide-based resin film and a substrate for a display device using the same and a polyimide resin film capable of securing excellent optical properties under high temperature heat treatment conditions and stably maintaining optical properties even during additional heat treatment are provided.
  • the polyimide precursor composition was spin coated on a glass substrate.
  • the glass substrate coated with the polyimide precursor composition was placed in an oven, heated at a rate of 5°C/min, and maintained at 80°C for 20 minutes and at 450°C for 70 minutes to undergo a curing process to perform a polyimide film (thickness: 10 ⁇ m) ) Was prepared.
  • pyromellitic dianhydride (PMDA) was used instead of 3,3',4,4'-biphenyltetracarboxylic dianhydride (3,3',4,4'-Biphenyltetracarboxylic dianhydride (BPDA)).
  • BPDA 3,3',4,4'-biphenyltetracarboxylic dianhydride
  • a polyimide film was manufactured in the same manner as in Example 1, except that.
  • BPDA 4'-biphenyltetracarboxylic dianhydride
  • the polyimide precursor composition was spin coated on a glass substrate.
  • the glass substrate coated with the polyimide precursor composition was placed in an oven, heated at a rate of 5°C/min, and maintained at 80°C for 20 minutes and at 450°C for 70 minutes to undergo a curing process to perform a polyimide film (thickness: 10 ⁇ m) ) Was prepared.
  • the polyimide film having a thickness of 10 ⁇ m obtained in Examples and Comparative Examples was peeled from a glass substrate, and after preparing a sample having a size of 2 cm X 10 cm in width, a color meter (Color-Eye 7000A by GRETAGMACBETH) was used for the sample. Then, the yellow index (YI 0 ) was obtained and is shown in Table 1 below.
  • the polyimide film having a thickness of 10 ⁇ m obtained in Examples and Comparative Examples was further cured at 410° C. for 60 minutes, and then the film further cured at 445° C. for 60 minutes was peeled from the glass substrate, and the size was 2 cm by 10 cm.
  • the final yellow index (YI f ) was measured using a color meter (Color-Eye 7000A manufactured by GRETAGMACBETH), and the amount of change in yellow index ( ⁇ YI) by Equation 1 below was calculated.
  • the heat-resistant yellow index was obtained and is shown in Table 1 below.
  • the polyimide film having a thickness of 10 ⁇ m obtained in Examples and Comparative Examples was further cured at 445° C. for 30 minutes, and then the film cured for an additional 30 minutes at 445° C. was peeled from the glass substrate, and the size was 2 cm X 10 cm
  • the final yellow index (YI f ) was measured using a color meter (Color-Eye 7000A manufactured by GRETAGMACBETH), and the amount of change in yellow index ( ⁇ YI) by Equation 1 below was calculated.
  • the heat-resistant yellow index was obtained and is shown in Table 1 below.
  • Yellow index change amount ( ⁇ YI) (final yellow index obtained in Experimental Example 2 (YI f ))-(yellow index obtained in Experimental Example 1 (YI 0 ))
  • the polyimide resin films of Examples 1 to 3 obtained through a curing process at 450°C for 70 minutes exhibited a yellow index (YI 0 ) of 8.8 or more and 14.1 or less.
  • the polyimide resin films of Comparative Examples 1 to 3 obtained through the curing process at 70 minutes exhibited a yellow index (YI 0 ) of 15.2 or more and 16.8 or less, which is much higher than in Examples.
  • the polyimide system of Examples It was confirmed that the resin film can have excellent optical properties even when curing at a high temperature of 400°C or higher.
  • the polyimide-based resin films of Examples 1 to 3 are heat resistant yellow index ( ⁇ YI) of -0.2 or more and 3.5 or less, or yellow index change amount of 0.1 or more and 3.5 or less ( ⁇ ) YI).
  • the optical properties of the polyimide-based resin film of the embodiment can be stably maintained even at a high temperature heat treatment of 400° C. or higher for the film.

Abstract

The present invention relates to a polyimide-based polymer film, and a substrate for a display device and an optical device, each using same, wherein the polyimide-based polymer film is synthesized by a reaction between specifically structured acid anhydride compound and diamine compound, and thus can secure excellent optical characteristics even in conditions of high-temperature thermal treatment and can stably maintain optical characteristics even at additional thermal treatment.

Description

폴리이미드계 수지 필름 및 이를 이용한 디스플레이 장치용 기판, 및 광학 장치Polyimide resin film and substrate for display device using same, and optical device
관련 출원(들)과의 상호 인용Cross-citation with relevant application(s)
본 출원은 2019년 2월 1일자 한국 특허 출원 제10-2019-0013486호, 2019년 9월 30일자 한국 특허 출원 제10-2019-0121176호, 2019년 9월 30일자 한국 특허 출원 제10-2019-0121177호, 2019년 9월 30일자 한국 특허 출원 제10-2019-0121178호, 2019년 12월 6일자 한국 특허 출원 제10-2019-0161494호, 및 2019년 12월 6일자 한국 특허 출원 제10-2019-0161495호에 기초한 우선권의 이익을 주장하며, 해당 한국 특허 출원의 문헌에 개시된 모든 내용은 본 명세서의 일부로서 포함된다.This application is for Korean Patent Application No. 10-2019-0013486 filed on February 1, 2019, Korean Patent Application No. 10-2019-0121176 for September 30, 2019, Korean Patent Application No. 10-2019 for September 30, 2019 -0121177, Korean Patent Application No. 10-2019-0121178 on September 30, 2019, Korean Patent Application No. 10-2019-0161494 on December 6, 2019, and Korean Patent Application No. 10 on December 6, 2019 -2019-0161495 claims the benefit of priority, and all content disclosed in the literature of the relevant Korean patent application is incorporated as part of this specification.
본 발명은 고온의 열처리 조건에서도 우수한 광학 특성을 확보할 수 있고, 추가열처리 시에도 광학 특성이 안정적으로 유지될 수 있는 폴리이미드계 수지 필름 및 이를 이용한 디스플레이 장치용 기판, 및 광학 장치에 관한 것이다.The present invention relates to a polyimide-based resin film, a substrate for a display device using the same, and an optical device capable of securing excellent optical properties even under high temperature heat treatment conditions and stably maintaining optical properties even during additional heat treatment.
표시 장치 시장은 대면적이 용이하고 박형 및 경량화가 가능한 평판디스플레이(Flat Panel Display; FPD) 위주로 급속히 변화하고 있다. 이러한 평판디스플레이에는 액정 표시 장치(Liquid Crystal Display; LCD), 유기 발광 표시 장치(Organic Light Emitting Display; OLED) 또는 전기 영동 표시 장치(electrophoretic display; EPD) 등이 있다. The display device market is rapidly changing with a focus on flat panel displays (FPDs), which are easy to have a large area and can be thin and light. The flat panel display includes a liquid crystal display (LCD), an organic light emitting display (OLED), or an electrophoretic display (EPD).
특히, 최근 들어서는 이러한 평판 디스플레이의 응용과 용도를 더욱확장하기 위해, 상기 평판 디스플레이에 가요성 기판을 적용한 소위 플렉서블 디스플레이 소자 등에 관한 관심이 집중되고 있다. 이러한 플렉서블 디스플레이 소자는 주로 스마트 폰 등 모바일 기기를 중심으로 적용이 검토되고 있으며, 점차로 그 응용 분야가 확장되고 있다. In particular, in recent years, in order to further expand the application and use of such a flat panel display, attention has been focused on a so-called flexible display device in which a flexible substrate is applied to the flat panel display. The application of the flexible display device is mainly being studied mainly on mobile devices such as smart phones, and its application fields are gradually expanding.
일반적으로, 플렉스블 디스플레이 소자 및 조명 소자를 제작함에 있어서 경화된 폴리이미드 위에 buffer layer, active layer, gate insulator등 다층의 무기막을 성막하여 TFT 소자를 제조하고 있다.In general, in manufacturing flexible display devices and lighting devices, TFT devices are manufactured by depositing a multilayer inorganic film such as a buffer layer, an active layer, and a gate insulator on a cured polyimide.
그러나, 폴리이미드층(기판층)으로 빛이 방출될 때 상기와 같이 무기막으로 이루어진 다층의 상부층의 굴절율과 폴리이미드층의 굴절률의 차이에 의해 방출 효율이 감소할 수 있다.However, when light is emitted to the polyimide layer (substrate layer), the emission efficiency may be reduced by a difference between the refractive index of the multi-layered upper layer made of the inorganic film and the refractive index of the polyimide layer as described above.
또한, 폴리이미드층(기판층)에 포함되는 폴리이미드 재료는 400 ℃ 이상의 고온에서 경화시 폴리이미드의 열화에 따른 광학특성 감소가 발생할 수 있다.In addition, when the polyimide material included in the polyimide layer (substrate layer) is cured at a high temperature of 400° C. or higher, a decrease in optical properties may occur due to deterioration of the polyimide.
이에, 고내열성과 우수한 광학특성을 만족할 수 있는 새로운 폴리이미드 개발이 요구되고 있다.Accordingly, development of a new polyimide capable of satisfying high heat resistance and excellent optical properties is required.
본 발명은 고온의 열처리 조건에서도 우수한 광학 특성을 확보할 수 있고, 추가열처리 시에도 광학 특성이 안정적으로 유지될 수 있는 폴리이미드계 수지 필름에 관한 것이다. The present invention relates to a polyimide-based resin film capable of securing excellent optical properties even under high temperature heat treatment conditions and stably maintaining optical properties even during additional heat treatment.
또한, 본 발명은 상기 폴리이미드계 수지 필름을 이용한 디스플레이 장치용 기판, 및 광학 장치를 제공하기 위한 것이다.In addition, the present invention is to provide a substrate for a display device using the polyimide-based resin film, and an optical device.
상기 과제를 해결하기 위하여, 본 명세서에서는, 하기 화학식1로 표시되는 폴리이미드 반복단위를 포함한 폴리이미드계 수지를 포함하고, 하기 수학식1에 의해 얻어지는 황색 지수 변화량(△YI)의 절대값이 4 이하인, 폴리이미드계 수지 필름을 제공한다.In order to solve the above problems, in the present specification, the polyimide-based resin containing a polyimide repeating unit represented by the following Chemical Formula 1 is included, and the absolute value of the yellow index change amount (ΔYI) obtained by the following Equation 1 is 4 The following is a polyimide-based resin film.
[화학식 1][Formula 1]
Figure PCTKR2020001263-appb-img-000001
Figure PCTKR2020001263-appb-img-000001
상기 화학식1에서, X 1은 하기 화학식2로 표시되는 4가의 작용기이며, Y 1은 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기 이고,In Chemical Formula 1, X 1 is a tetravalent functional group represented by the following Chemical Formula 2, Y 1 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group,
[화학식2][Formula 2]
Figure PCTKR2020001263-appb-img-000002
Figure PCTKR2020001263-appb-img-000002
상기 화학식2에서, Ar은 다중고리 방향족 2가 작용기이고, In Chemical Formula 2, Ar is a polycyclic aromatic divalent functional group,
[수학식1][Equation 1]
황색 지수 변화량(△YI) = YI f - YI 0 Yellow index change (△YI) = YI f- YI 0
상기 수학식1에서, YI f는, 상기 폴리이미드계 수지 필름을 400 ℃ 내지 450 ℃온도에서 130분 내지 200분간 열처리한 이후 얻어지는 필름의 최종 황색 지수 이고, YI 0는, 상기 열처리 전의 폴리이미드계 수지 필름의 황색 지수 이다.In Equation 1, YI f is the final yellow index of the film obtained after heat treatment of the polyimide resin film at a temperature of 400° C. to 450° C. for 130 minutes to 200 minutes, and YI 0 is a polyimide system before the heat treatment. It is the yellow index of the resin film.
본 명세서에서는 또한, 상기 폴리이미드계 수지 필름을 포함하는, 디스플레이 장치용 기판이 제공된다.Also provided in the present specification is a substrate for a display device comprising the polyimide-based resin film.
본 명세서에서는 또한, 상기 폴리이미드계 수지 필름을 포함하는, 광학 장치 가 제공된다.Also provided in the present specification is an optical device comprising the polyimide-based resin film.
이하 발명의 구체적인 구현예에 따른 폴리이미드계 수지 필름 및 이를 이용한 디스플레이 장치용 기판, 및 광학 장치에 대하여 보다 상세하게 설명하기로 한다. Hereinafter, a polyimide resin film according to a specific embodiment of the present invention, a substrate for a display device using the same, and an optical device will be described in more detail.
본 명세서에서 명시적인 언급이 없는 한, 전문용어는 단지 특정 실시예를 언급하기 위한 것이며, 본 발명을 한정하는 것을 의도하지 않는다.Unless expressly stated in this specification, the terminology is only for referring to a specific embodiment, and is not intended to limit the present invention.
본 명세서에서 사용되는 단수 형태들은 문구들이 이와 명백히 반대의 의미를 나타내지 않는 한 복수 형태들도 포함한다. Singular forms used herein include plural forms unless the phrases clearly indicate the opposite.
본 명세서에서 사용되는 '포함'의 의미는 특정 특성, 영역, 정수, 단계, 동작, 요소 및/또는 성분을 구체화하며, 다른 특정 특성, 영역, 정수, 단계, 동작, 요소, 성분 및/또는 군의 존재나 부가를 제외시키는 것은 아니다.As used herein, the meaning of'include' embodies a specific characteristic, region, integer, step, action, element, and/or component, and other specific characteristic, region, integer, step, action, element, component, and/or group. It does not exclude the existence or addition of.
그리고, 본 명세서에서 '제 1' 및 '제 2'와 같이 서수를 포함하는 용어는 하나의 구성요소를 다른 구성요소로부터 구별하는 목적으로 사용되며, 상기 서수에 의해 한정되지 않는다. 예를 들어, 본 발명의 권리 범위 내에서 제 1 구성요소는 제 2 구성요소로도 명명될 수 있고, 유사하게 제 2 구성요소는 제 1 구성요소로 명명될 수 있다.In addition, in this specification, terms including an ordinal number such as'first' and'second' are used for the purpose of distinguishing one component from other components, and are not limited by the ordinal number. For example, within the scope of the present invention, the first component may also be referred to as the second component, and similarly, the second component may be referred to as the first component.
본 명세서에서 (공)중합체는 중합체 또는 공중합체를 모두 포함하는 의미이며, 상기 중합체는 단일 반복단위로 이루어진 단독중합체를 의미하고, 공중합체는 2종 이상의 반복단위를 함유한 복합중합체를 의미한다.In the present specification, the (co)polymer means a polymer or a copolymer, and the polymer means a homopolymer composed of a single repeating unit, and the copolymer means a composite polymer containing two or more repeating units.
본 명세서에서, 치환기의 예시들은 아래에서 설명하나, 이에 한정되는 것은 아니다. In the present specification, examples of the substituent are described below, but are not limited thereto.
본 명세서에서, "치환"이라는 용어는 화합물 내의 수소 원자 대신 다른 작용기가 결합하는 것을 의미하며, 치환되는 위치는 수소 원자가 치환되는 위치 즉, 치환기가 치환 가능한 위치라면 한정되지 않으며, 2 이상 치환되는 경우, 2 이상의 치환기는 서로 동일하거나 상이할 수 있다.In the present specification, the term "substitution" means that other functional groups are bonded in place of the hydrogen atom in the compound, and the position to be substituted is not limited to a position where the hydrogen atom is substituted, that is, a position where the substituent is substitutable, and is substituted when two or more are substituted. , 2 or more substituents may be the same or different from each other.
본 명세서에서 "치환 또는 비치환된" 이라는 용어는 중수소; 할로겐기; 시아노기; 니트로기; 히드록시기; 카르보닐기; 에스테르기; 이미드기; 아미드기; 1차 아미노기; 카르복시기; 술폰산기; 술폰아미드기; 포스핀옥사이드기; 알콕시기; 아릴옥시기; 알킬티옥시기; 아릴티옥시기; 알킬술폭시기; 아릴술폭시기; 실릴기; 붕소기; 알킬기; 시클로알킬기; 알케닐기; 아릴기; 아르알킬기; 아르알케닐기; 알킬아릴기; 알콕시실릴알킬기; 아릴포스핀기; 또는 N, O 및 S 원자 중 1개 이상을 포함하는 헤테로고리기로 이루어진 군에서 선택된 1개 이상의 치환기로 치환 또는 비치환되거나, 상기 예시된 치환기 중 2 이상의 치환기가 연결된 치환 또는 비치환된 것을 의미한다. 예컨대, "2 이상의 치환기가 연결된 치환기"는 바이페닐기일 수 있다. 즉, 바이페닐기는 아릴기일 수도 있고, 2개의 페닐기가 연결된 치환기로 해석될 수도 있다.The term "substituted or unsubstituted" in this specification is deuterium; Halogen group; Cyano group; Nitro group; Hydroxy group; Carbonyl group; Ester groups; Imide group; Amide group; Primary amino group; Carboxy group; Sulfonic acid group; Sulfonamide groups; Phosphine oxide group; Alkoxy groups; Aryloxy group; Alkyl thioxy group; Arylthioxy group; Alkyl sulfoxy group; Aryl sulfoxyl group; Silyl group; Boron group; Alkyl groups; Cycloalkyl group; Alkenyl group; Aryl group; Aralkyl group; An alkenyl group; Alkyl aryl groups; Alkoxysilylalkyl groups; Arylphosphine group; Or substituted or unsubstituted with one or more substituents selected from the group consisting of heterocyclic groups containing one or more of N, O and S atoms, or substituted or unsubstituted with two or more substituents among the exemplified substituents above . For example, "a substituent having two or more substituents" may be a biphenyl group. That is, the biphenyl group may be an aryl group or may be interpreted as a substituent to which two phenyl groups are connected.
본 명세서에서,
Figure PCTKR2020001263-appb-img-000003
, 또는
Figure PCTKR2020001263-appb-img-000004
는 다른 치환기에 연결되는 결합을 의미하고, 직접결합은 L 로 표시되는 부분에 별도의 원자가 존재하지 않은 경우를 의미한다.
In this specification,
Figure PCTKR2020001263-appb-img-000003
, or
Figure PCTKR2020001263-appb-img-000004
Means a bond connected to another substituent, and a direct bond means a case in which a separate atom does not exist in a portion represented by L.
본 명세서에 있어서, 방향족(aromatic)은 휘켈 규칙(Huckels Rule)을 만족하는 특성으로서, 상기 휘켈 규칙에 따라 다음 3가지 조건을 모두 만족하는 경우를 방향족이라고 정의할 수 있다.In this specification, aromatic (aromatic) is a property that satisfies the Huckels Rule (Huckels Rule), it can be defined as a case that satisfies all three conditions according to the Huckel rule.
1) 비어있는 p-오비탈, 불포화 결합, 홀전자쌍 등에 의하여 완전히 콘주게이션을 이루고 있는 4n+2개의 전자가 존재하여야 한다.1) There must be 4n+2 electrons that are completely conjugated by empty p-orbitals, unsaturated bonds, and hole electron pairs.
2) 4n+2개의 전자는 평면 형태 이성질체를 구성하여야 하고, 고리 구조를 이루어야 한다.2) 4n+2 electrons must form a planar isomer and form a ring structure.
3) 고리의 모든 원자가 콘주게이션에 참여할 수 있어야 한다.3) All atoms in the ring must be able to participate in conjugation.
본 명세서에 있어서, 알킬기는 알케인(alkane)으로부터 유래한 1가의 작용기로, 직쇄 또는 분지쇄일 수 있고, 상기 직쇄 알킬기의 탄소수는 특별히 한정되지 않으나 1 내지 20인 것이 바람직하다. 또한, 상기 분지쇄 알킬기의 탄소수는 3 내지 20이다. 알킬기의 구체적인 예로는 메틸, 에틸, 프로필, n-프로필, 이소프로필, 부틸, n-부틸, 이소부틸, tert-부틸, sec-부틸, 1-메틸-부틸, 1-에틸-부틸, 펜틸, n-펜틸, 이소펜틸, 네오펜틸, tert-펜틸, 헥실, n-헥실, 1-메틸펜틸, 2-메틸펜틸, 4-메틸-2-펜틸, 3,3-디메틸부틸, 2-에틸부틸, 헵틸, n-헵틸, 1-메틸헥실, 옥틸, n-옥틸, tert-옥틸, 1-메틸헵틸, 2-에틸헥실, 2-프로필펜틸, n-노닐, 2,2-디메틸헵틸, 1-에틸-프로필, 1,1-디메틸-프로필, 이소헥실, 2-메틸펜틸, 4-메틸헥실, 5-메틸헥실, 2,6-디메틸헵탄-4-일 등이 있으나, 이들에 한정되지 않는다. 상기 알킬기는 치환 또는 비치환될 수 있으며, 치환되는 경우 치환기의 예시는 상술한 바와 같다.In the present specification, the alkyl group is a monovalent functional group derived from alkane, and may be a straight chain or a branched chain, and the carbon number of the straight chain alkyl group is not particularly limited, but is preferably 1 to 20. Further, the number of carbon atoms in the branched chain alkyl group is 3 to 20. Specific examples of the alkyl group are methyl, ethyl, propyl, n-propyl, isopropyl, butyl, n-butyl, isobutyl, tert-butyl, sec-butyl, 1-methyl-butyl, 1-ethyl-butyl, pentyl, n -Pentyl, isopentyl, neopentyl, tert-pentyl, hexyl, n-hexyl, 1-methylpentyl, 2-methylpentyl, 4-methyl-2-pentyl, 3,3-dimethylbutyl, 2-ethylbutyl, heptyl , n-heptyl, 1-methylhexyl, octyl, n-octyl, tert-octyl, 1-methylheptyl, 2-ethylhexyl, 2-propylpentyl, n-nonyl, 2,2-dimethylheptyl, 1-ethyl- Propyl, 1,1-dimethyl-propyl, isohexyl, 2-methylpentyl, 4-methylhexyl, 5-methylhexyl, 2,6-dimethylheptan-4-yl, and the like, but is not limited to these. The alkyl group may be substituted or unsubstituted, and when substituted, examples of the substituent are as described above.
본 명세서에 있어서, 할로 알킬기는 상술한 알킬기에 할로겐기가 치환된 작용기를 의미하며, 할로겐기의 예로는 불소, 염소, 브롬 또는 요오드가 있다. 상기 할로알킬기는 치환 또는 비치환될 수 있으며, 치환되는 경우 치환기의 예시는 상술한 바와 같다.In the present specification, the halo alkyl group means a functional group in which the halogen group is substituted with the aforementioned alkyl group, and examples of the halogen group include fluorine, chlorine, bromine or iodine. The haloalkyl group may be substituted or unsubstituted, and when substituted, examples of the substituent are as described above.
본 명세서에 있어서, 다가 작용기(multivalent functional group)는 임의의 화합물에 결합된 복수의 수소 원자가 제거된 형태의 잔기로 예를 들어 2가 작용기, 3가 작용기, 4가 작용기를 들 수 있다. 일 예로, 사이클로부탄에서 유래한 4가의 작용기는 사이클로부탄에 결합된 임의의 수소 원자 4개가 제거된 형태의 잔기를 의미한다. In the present specification, a multivalent functional group is a residue in which a plurality of hydrogen atoms bound to an arbitrary compound are removed, for example, a divalent functional group, a trivalent functional group, and a tetravalent functional group. For example, a tetravalent functional group derived from cyclobutane refers to a residue in which any 4 hydrogen atoms attached to cyclobutane are removed.
본 명세서에서, 전자끌개 작용기(Electro-withdrawing group)는, 할로알킬기, 할로겐기, 시아노기, 니트로기, 술폰산기, 카보닐기 및 술포닐기로 이루어진 군에서 선택된 1종 이상을 포함할 수 있으며, 바람직하게는 트리플루오루메틸기(-CF 3) 등의 할로알킬기 일 수 있다. In this specification, the electron withdrawing group (Electro-withdrawing group) may include one or more selected from the group consisting of haloalkyl groups, halogen groups, cyano groups, nitro groups, sulfonic acid groups, carbonyl groups and sulfonyl groups, preferably It may be a haloalkyl group such as trifluoromethyl group (-CF 3 ).
본 명세서에서, 직접결합 또는 단일결합은 해당 위치에 어떠한 원자 또는 원자단도 존재하지 않아, 결합선으로 연결되는 것을 의미한다. 구체적으로, 화학식 중 L 1, L 2로 표시되는 부분에 별도의 원자가 존재하지 않은 경우를 의미한다.In the present specification, a direct bond or a single bond means that there is no atom or atomic group at the corresponding position, and is connected by a bond line. Specifically, it means that a separate atom is not present in a portion represented by L 1 and L 2 in the chemical formula.
본 명세서에서, 중량 평균 분자량은 GPC법에 의해 측정한 폴리스티렌 환산의 중량 평균 분자량을 의미한다. 상기 GPC법에 의해 측정한 폴리스티렌 환산의 중량 평균 분자량을 측정하는 과정에서는, 통상적으로 알려진 분석 장치와 시차 굴절 검출기(Refractive Index Detector) 등의 검출기 및 분석용 컬럼을 사용할 수 있으며, 통상적으로 적용되는 온도 조건, 용매, flow rate를 적용할 수 있다. 상기 측정 조건의 구체적인 예를 들면, Polymer Laboratories PLgel MIX-B 300mm 길이 칼럼을 이용하여 Waters PL-GPC220 기기를 이용하여, 평가 온도는 160 ℃이며, 1,2,4-트리클로로벤젠을 용매로서 사용하였으며 유속은 1mL/min의 속도로, 샘플은 10mg/10mL의 농도로 조제한 다음, 200 μL 의 양으로 공급하며, 폴리스티렌 표준을 이용하여 형성된 검정 곡선을 이용하여 Mw 의 값을 구할 수 있다. 폴리스티렌 표준품의 분자량은 2,000 / 10,000 / 30,000 / 70,000 / 200,000 / 700,000 / 2,000,000 / 4,000,000 / 10,000,000의 9종을 사용하였다.In this specification, the weight average molecular weight means the weight average molecular weight of polystyrene conversion measured by GPC method. In the process of measuring the weight average molecular weight in terms of polystyrene measured by the GPC method, detectors and analytical columns, such as a commonly known analytical device and a differential index detector, can be used, and the temperature is usually applied. Conditions, solvents and flow rates can be applied. As a specific example of the above measurement conditions, using a Waters PL-GPC220 instrument using a Polymer Laboratories PLgel MIX-B 300mm length column, the evaluation temperature is 160°C, and 1,2,4-trichlorobenzene is used as a solvent. The flow rate was 1 mL/min, the sample was prepared at a concentration of 10 mg/10 mL, and then supplied in an amount of 200 μL, and the value of Mw can be obtained by using an assay curve formed using a polystyrene standard. The molecular weight of the polystyrene standard was 2,000 / 10,000 / 30,000 / 70,000 / 200,000 / 700,000 / 2,000,000 / 4,000,000 / 10,000,000.
이하, 본 발명을 보다 상세히 설명한다. Hereinafter, the present invention will be described in more detail.
1. 폴리이미드 필름1. Polyimide film
발명의 일 구현예에 따르면, 상기 화학식1로 표시되는 폴리이미드 반복단위를 포함한 폴리이미드계 수지를 포함하고, 상기 수학식1에 의해 얻어지는 황색 지수 변화량(△YI)의 절대값이 4 이하인 폴리이미드계 수지 필름이 제공될 수 있다.According to one embodiment of the invention, a polyimide containing a polyimide-based resin including a polyimide repeating unit represented by Chemical Formula 1, and having an absolute value of a change in yellow index (ΔYI) obtained by Equation 1 of 4 or less. Based resin film may be provided.
본 발명자들은 상기 일 구현예의 폴리이미드계 수지 필름과 같이, 폴리이미드 반복단위 구조내에 상기 화학식2와 같은 특정한 구조의 테트라카르복시산 이무수물로부터 유래된 4가작용기 및 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기를 함유함에 따라, 400 ℃ 이상의 고온에서 경화를 진행한 폴리이미드 수지 필름에서도 우수한 광학특성을 가짐을 실험을 통해 확인하고 발명을 완성하였다. The present inventors, like the polyimide-based resin film of the above embodiment, the tetravalent functional group derived from the tetracarboxylic acid dianhydride having a specific structure as in Chemical Formula 2 in the polyimide repeating unit structure and the number of carbon atoms substituted with at least one electron withdrawing functional group As the aromatic divalent functional group of 15 or more was contained, the polyimide resin film cured at a high temperature of 400° C. or higher also had excellent optical properties through experiments, and the invention was completed.
특히, 상기 폴리이미드계 수지는 상기 화학식2로 표시되는 구조를 함유한 테트라카르복시산 이무수물과 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 디아민의 이미드화 반응을 통해 얻어지는 반응 생성물을 포함하여, 산무수물 단량체와 방향족 디아민 단량체의 신규한 구조에 따른 물리, 화학적 작용에 의해 고내열성을 확보하여, 400 ℃ 이상의 고온에서 열처리를 통한 경화된 필름에서뿐만 아니라, 경화된 필름에 대해 추가적인 400 ℃ 이상의 고온에서 열처리시에도 우수한 광학물성이 달성되는 것으로 보인다.In particular, the polyimide-based resin comprises a reaction product obtained through an imidization reaction of a tetracarboxylic dianhydride containing a structure represented by Formula 2 and an aromatic diamine having 15 or more carbon atoms substituted with at least one electron withdrawing functional group, By securing high heat resistance by physical and chemical action according to the novel structure of the acid anhydride monomer and aromatic diamine monomer, not only in the cured film through heat treatment at a high temperature of 400°C or higher, but also at an additional high temperature of 400°C or more for the cured film It appears that excellent optical properties are achieved even during heat treatment.
구체적으로, 폴리이미드 수지 합성에 사용되는 디아민 단량체 화합물에, 전자끌개 효과를 부여할 수 있는 트리플루오루메틸기(-CF3)를 치환기로 도입하여, 이미드 사슬 내에 존재하는 Pi-전자들의 CTC (charge transfer complex) 형성을 억제함을 통해 투명성을 확보하여 우수한 광학특성을 구현할 수 있다 Specifically, a trifluoromethyl group (-CF3) capable of imparting an electron withdrawing effect to a diamine monomer compound used in the synthesis of polyimide resin is introduced as a substituent, and CTC (charge of Pi-electrons present in the imide chain) By suppressing the formation of transfer complex), transparency can be secured to realize excellent optical properties.
또한, 상기 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 디아민 단량체로부터 합성된 폴리이미드계 수지는 분자간의 ordering과 orientation특성을 향상시켜 고온 경화로 얻어지는 폴리이미드 필름에서도 충분한 내열성을 확보하여 이를 플라스틱 기판으로 사용할 경우, 플라스틱 기판에 형성된 금속층을 열처리할 때 플라스틱 기판이 열에 의해 손상되는 것을 방지하고, 추가적인 400 ℃ 이상의 고온에서 열처리시에도 우수한 광학물성이 달성될 수 있다.In addition, the polyimide-based resin synthesized from an aromatic diamine monomer having 15 or more carbon atoms with at least one electron withdrawing group functionally improves ordering and orientation characteristics between molecules to ensure sufficient heat resistance even in a polyimide film obtained by high temperature curing, thereby making it plastic. When used as a substrate, when heat-treating the metal layer formed on the plastic substrate, the plastic substrate is prevented from being damaged by heat, and excellent optical properties can be achieved even when heat treatment is performed at an additional high temperature of 400° C. or higher.
구체적으로, 본 발명에 따른 폴리이미드 필름은 굴절률을 상승시킬 수 있으며, 플렉서블 디스플레이 소자에서 기판층으로서 사용되어, 소자를 구성하는 각 층과의 굴절율의 차이를 감소시킬 수 있으며, 이로부터, 내부에서 소멸되는 빛의 양을 줄여주어, 빛의 방출(bottom emission) 효율을 효과적으로 증대시킬 수 있다.Specifically, the polyimide film according to the present invention can increase the refractive index, and is used as a substrate layer in a flexible display device, thereby reducing the difference in refractive index with each layer constituting the device. By reducing the amount of extinguished light, it is possible to effectively increase the emission efficiency of the light (bottom emission).
상기 폴리이미드계 수지는 폴리이미드, 그리고 이의 전구체 중합체인 폴리아믹산, 폴리아믹산 에스테르를 모두 포함한 것을 의미한다. 즉, 상기 폴리이미드계 고분자는 폴리아믹산 반복단위, 폴리아믹산에스테르 반복단위, 및 폴리이미드 반복단위로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다. 즉, 상기 폴리이미드계 고분자는 폴리아믹산 반복단위 1종, 폴리아믹산에스테르 반복단위 1종, 폴리이미드 반복단위 1종, 또는 이들의 2종 이상의 반복단위가 혼합된 공중합체를 포함할 수 있다.The polyimide-based resin means that polyimide and polyamic acid and polyamic acid ester, which are precursor polymers thereof, are all included. That is, the polyimide-based polymer may include at least one selected from the group consisting of a polyamic acid repeating unit, a polyamic acid ester repeating unit, and a polyimide repeating unit. That is, the polyimide-based polymer may include a polyamic acid repeating unit, one polyamic acid ester repeating unit, one polyimide repeating unit, or a copolymer of two or more repeating units thereof.
상기 폴리아믹산 반복단위, 폴리아믹산에스테르 반복단위, 및 폴리이미드 반복단위로 이루어진 군에서 선택된 1종 이상의 반복단위는 상기 폴리이미드계 고분자의 주쇄를 형성할 수 있다.One or more repeating units selected from the group consisting of the polyamic acid repeating unit, polyamic acid ester repeating unit, and polyimide repeating unit may form a main chain of the polyimide-based polymer.
특히, 상기 폴리이미드계 수지는 화학식1로 표시되는 폴리이미드 반복단위를 포함할 수 있다.In particular, the polyimide-based resin may include a polyimide repeating unit represented by Chemical Formula 1.
상기 화학식1에서, X 1은 상기 화학식2로 표시되는 4가의 작용기이며, 상기 X 1은 폴리이미드계 수지 합성에 사용되는 테트라카르복시산 이무수물 화합물로부터 유도된 작용기이다.In Chemical Formula 1, X 1 is a tetravalent functional group represented by Chemical Formula 2, and X 1 is a functional group derived from a tetracarboxylic acid dianhydride compound used in the synthesis of polyimide resins.
상기 화학식2에서, Ar은 다중고리 방향족 2가 작용기이다. 상기 다중고리 방향족 2가 작용기는 다중고리 방향족 탄화수소(polycyclic aromatic hydrocarbon) 화합물로 또는 이의 유도체 화합물로부터 유래된 2가의 작용기로서, 플루오레닐렌기를 포함할 수 있다. 상기 유도체 화합물은 1이상의 치환기가 도입되거나, 탄소원자가 헤테로원자로 대체된 화합물을 모두 포함한다.In the formula (2), Ar is a polycyclic aromatic divalent functional group. The polycyclic aromatic divalent functional group may be a polycyclic aromatic hydrocarbon compound or a divalent functional group derived from a derivative compound thereof, and may include a fluorenylene group. The derivative compound includes all compounds in which one or more substituents are introduced or carbon atoms are replaced by heteroatoms.
보다 구체적으로, 상기 화학식2의 Ar에서, 다중고리 방향족 2가 작용기는 적어도 2이상의 방향족 고리 화합물이 함유된 접합 고리형 2가 작용기를 포함할 수 있다. 즉, 상기 다중고리 방향족 2가 작용기는, 작용기 구조내에 적어도 2이상의 방향족 고리 화합물이 함유되고, 뿐만 아니라 작용기가 접합 고리(fused ring) 구조를 가질 수 있다.More specifically, in Ar of Formula 2, the polycyclic aromatic divalent functional group may include a conjugated cyclic divalent functional group containing at least two or more aromatic ring compounds. That is, the polycyclic aromatic divalent functional group may contain at least two or more aromatic ring compounds in the functional group structure, as well as the functional group may have a fused ring structure.
상기 방향족 고리 화합물은 1이상의 벤젠고리를 함유한 아렌 화합물, 또는 상기 아렌 화합물 내 탄소원자가 헤테로원자로 대체된 헤테로 아렌 화합물을 포함할 수 있다.The aromatic ring compound may include an arene compound containing at least one benzene ring, or a hetero arene compound in which carbon atoms in the arene compound are replaced by heteroatoms.
상기 방향족 고리 화합물은 다중고리 방향족 2가 작용기 내에 적어도 2이상 함유될 수 있으며, 상기 2이상의 방향족 고리 화합물 각각은 직접 접합 고리를 형성하거나, 혹은 다른 고리 구조를 매개로 접합고리를 형성할 수 있다. 일례로 2개의 벤젠고리가 시클로알킬고리구조에 각각 접합되는 경우, 시클로알킬 고리를 매 개로 2개의 벤젠고리가 접합고리를 형성했다고 정의할 수 있다.The aromatic ring compound may contain at least two or more in the polycyclic aromatic divalent functional group, and each of the two or more aromatic ring compounds may form a direct fused ring or a fused ring through a different ring structure. For example, when two benzene rings are respectively bonded to a cycloalkyl ring structure, it can be defined that two benzene rings each form a cycloalkyl ring.
상기 적어도 2이상의 방향족 고리 화합물이 함유된 접합 고리형 2가 작용기는 적어도 2이상의 방향족 고리 화합물이 함유된 접합 고리 화합물 또는 이의 유도체 화합물로부터 유래된 2가의 작용기로서, 상기 유도체 화합물은 1이상의 치환기가 도입되거나, 탄소원자가 헤테로원자로 대체된 화합물을 모두 포함한다.The conjugated cyclic divalent functional group containing at least two or more aromatic cyclic compounds is a divalent functional group derived from a conjugated cyclic compound containing at least two or more aromatic cyclic compounds or a derivative compound thereof, wherein the derivative compound has one or more substituents introduced Or a compound in which the carbon atom has been replaced with a heteroatom.
상기 다중고리 방향족 2가 작용기의 예가 크게 한정되는 것은 아니나, 일례로서 플루오레닐렌기를 들 수 있다. Examples of the polycyclic aromatic divalent functional group are not particularly limited, and examples thereof include a fluorenylene group.
상기 화학식2로 표시되는 4가의 작용기는 하기 화학식2-1로 표시되는 작용기를 들 수 있다.The tetravalent functional group represented by Chemical Formula 2 may be a functional group represented by Chemical Formula 2-1.
[화학식 2-1][Formula 2-1]
Figure PCTKR2020001263-appb-img-000005
Figure PCTKR2020001263-appb-img-000005
상기 화학식1에서, Y 1은 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기이고, 상기 Y 1은 폴리아믹산, 폴리아믹산에스테르, 또는 폴리이미드 합성시 사용되는 디아민 화합물로부터 유래한 작용기일 수 있다.In Formula 1, Y 1 is an aromatic divalent functional group having 15 or more carbon atoms substituted with at least one electron withdrawing group, and Y 1 is an action derived from a diamine compound used in the synthesis of polyamic acid, polyamic acid ester, or polyimide. It can be a flag.
상기 Y 1에서 탄소수 15 이상의 방향족 2가 작용기는 방향족 고리화합물을 3개 이상 포함할 수 있다. 이처럼 3개 이상의 방향족 고리화합물이 함유됨에 따라, 폴리이미드계 수지는 분자간의 ordering과 orientation특성이 향상되어, 고온 경화로 얻어지는 폴리이미드 필름에서도 충분한 내열성을 확보할 수 있다.The aromatic divalent functional group having 15 or more carbon atoms in Y 1 may include three or more aromatic cyclic compounds. As such, as three or more aromatic cyclic compounds are contained, the ordering and orientation characteristics of the polyimide-based resin are improved, and sufficient heat resistance can be secured even in a polyimide film obtained by high temperature curing.
상기 탄소수 15 이상의 방향족 2가 작용기는 트리페닐렌기, 쿼터페닐렌기, 및 펜터페닐렌기로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다.The aromatic divalent functional group having 15 or more carbon atoms may include at least one selected from the group consisting of a triphenylene group, a quaterphenylene group, and a pentaphenylene group.
상기 전자끌개 작용기는 할로알킬기, 할로겐기, 시아노기, 니트로기, 술폰산기, 카보닐기 및 술포닐기로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다.The electron withdrawing functional group may include at least one selected from the group consisting of haloalkyl groups, halogen groups, cyano groups, nitro groups, sulfonic acid groups, carbonyl groups and sulfonyl groups.
전기음성도가 높은 트리플루오루메틸기(-CF 3) 등의 전자끌개 치환기가 치환됨에 따라, 상기 폴리이미드 수지 사슬 내에 존재하는 Pi-전자들의 CTC (charge transfer complex) 형성을 억제하는 효과가 증가됨에 따라 향상된 투명성을 확보할 수 있다. 즉, 폴리이미드 구조내 또는 사슬간 packing을 감소시킬 수 있으며, 입체장애 및 전기적 효과로 인해 발색원 간의 전기적인 상호작용을 약화시켜 가시광 영역에서 높은 투명성을 나타내게 할 수 있다.As electron withdrawing substituents such as trifluoromethyl group (-CF 3 ) having high electronegativity are substituted, the effect of suppressing the formation of charge transfer complex (CTC) of Pi-electrons present in the polyimide resin chain is increased. Accordingly, improved transparency can be secured. That is, packing within the polyimide structure or between chains can be reduced, and electrical interactions between chromogens can be weakened due to steric hindrance and electrical effects, resulting in high transparency in the visible region.
보다 구체적으로, 상기 Y 1의 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기는 하기 화학식3으로 표시되는 작용기를 포함할 수 있다.More specifically, the aromatic divalent functional group having 15 or more carbon atoms substituted with at least one electron withdrawing functional group of Y 1 may include a functional group represented by the following Chemical Formula 3.
[화학식 3][Formula 3]
Figure PCTKR2020001263-appb-img-000006
Figure PCTKR2020001263-appb-img-000006
상기 화학식3에서, T 1 내지 T 3는 서로 동일하거나 상이하며, 각각 독립적으로 전자끌개 작용기이며, m1 내지 m3는 서로 동일하거나 상이하며, m1 내지 m3 중 적어도 하나는 1 내지 4의 정수이고, 나머지는 0 내지 4의 정수이고, n은 1 내지 10의 정수이다.In Chemical Formula 3, T 1 to T 3 are the same or different from each other, each independently an electron withdrawing group, m1 to m3 are the same or different from each other, and at least one of m1 to m3 is an integer of 1 to 4, the rest Is an integer from 0 to 4, and n is an integer from 1 to 10.
상기 Y 1의 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기는 하기 화학식3-1로 표시되는 작용기를 포함할 수 있다.An aromatic divalent functional group having 15 or more carbon atoms substituted with at least one electron withdrawing functional group of Y 1 may include a functional group represented by the following Chemical Formula 3-1.
[화학식 3-1][Formula 3-1]
Figure PCTKR2020001263-appb-img-000007
.
Figure PCTKR2020001263-appb-img-000007
.
상기 폴리이미드계 수지는 하기 화학식4로 표시되는 테트라카르복시산 이무수물 및 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 디아민의 결합물을 포함할 수 있다.The polyimide-based resin may include a combination of tetracarboxylic acid dianhydride represented by the following Chemical Formula 4 and aromatic diamine having 15 or more carbon atoms substituted with at least one electron withdrawing functional group.
[화학식4][Formula 4]
Figure PCTKR2020001263-appb-img-000008
Figure PCTKR2020001263-appb-img-000008
상기 화학식4에서, Ar '는 다중고리 방향족 2가 작용기이다. 상기 다중고리 방향족 2가 작용기는 다중고리 방향족 탄화수소(polycyclic aromatic hydrocarbon) 화합물로부터 유래된 2가의 작용기로서, 플루오레닐렌기 또는 이의 유도체 화합물로부터 유래된 2가의 작용기로서, 플루오레닐렌기를 포함할 수 있다. 상기 유도체 화합물은 1이상의 치환기가 도입되거나, 탄소원자가 헤테로원자로 대체된 화합물을 모두 포함한다.In the above formula (4), Ar' is a polycyclic aromatic divalent functional group. The polycyclic aromatic divalent functional group is a divalent functional group derived from a polycyclic aromatic hydrocarbon compound, and may include a fluorenylene group as a divalent functional group derived from a fluorenylene group or a derivative compound thereof. . The derivative compound includes all compounds in which one or more substituents are introduced or carbon atoms are replaced by heteroatoms.
상기 화학식4로 표시되는 테트라카르복시산 이무수물의 구체적인 예로는 9,9-비스(3,4-디카복시페닐)플루오렌이무수물(9,9-Bis(3,4-dicarboxyphenyl)fluorene Dianhydride, BPAF)를 들 수 있다.A specific example of the tetracarboxylic acid dianhydride represented by Chemical Formula 4 is 9,9-bis(3,4-dicarboxyphenyl)fluorene dianhydride (9,9-Bis(3,4-dicarboxyphenyl)fluorene Dianhydride, BPAF). Can be lifted.
상기 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 디아민은 상술한 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 디2가 작용기의 양말단에 아미노기(-NH 2)가 결합한 화합물로서, 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기에 대한 설명은 상술한 바와 같다.The aromatic diamine having 15 or more carbon atoms in which the electron withdrawing functional group is substituted by at least 1 is a compound in which an amino group (-NH 2 ) is bonded to the sock end of the aromatic di2 having 15 or more carbon atoms in which the electron withdrawing functional group is substituted by at least 1, The description of the aromatic divalent functional group having 15 or more carbon atoms in which the electron withdrawing functional group is substituted by at least one is as described above.
상기 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 디아민의 구체적인 예로는 하기 화학식 a로 표시되는 디아민을 들 수 있다.Specific examples of the aromatic diamine having 15 or more carbon atoms in which the electron withdrawing functional group is substituted with at least one or more include diamine represented by the following formula (a).
[화학식a][Formula a]
Figure PCTKR2020001263-appb-img-000009
Figure PCTKR2020001263-appb-img-000009
보다 구체적으로, 상기 폴리이미드계 수지는 상기 화학식4로 표시되는 테트라카르복시산 이무수물의 말단 무수물기(-OC-O-CO-)와, 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 디아민의 말단 아미노기(-NH 2)의 반응으로 아미노기의 질소원자와 무수물기의 탄소원자간 결합이 형성될 수 있다. More specifically, the polyimide-based resin has a terminal anhydride group (-OC-O-CO-) of tetracarboxylic acid dianhydride represented by Chemical Formula 4 and an aromatic diamine having at least 15 carbon atoms substituted with at least one electron withdrawing group. The reaction between the amino group (-NH 2 ) may form a bond between the nitrogen atom of the amino group and the carbon atom of the anhydride group.
상기 폴리이미드계 수지는 하기 화학식 5로 표시되는 폴리이미드 반복단위를 더 포함할 수 있다.The polyimide-based resin may further include a polyimide repeating unit represented by Formula 5 below.
[화학식 5][Formula 5]
Figure PCTKR2020001263-appb-img-000010
Figure PCTKR2020001263-appb-img-000010
상기 화학식 5 에서, X 2는 하기 화학식6으로 표시되는 4가의 작용기중 하나이고, Y 2은 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기이고,In Chemical Formula 5, X 2 is one of a tetravalent functional group represented by the following Chemical Formula 6, and Y 2 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group,
[화학식6][Formula 6]
Figure PCTKR2020001263-appb-img-000011
Figure PCTKR2020001263-appb-img-000011
상기 화학식 6에서, R 1 내지 R 6은 각각 독립적으로 수소 또는 탄소수 1 내지 6의 알킬기이고, L는 단일결합, -O-, -CO-, -COO-, -S-, -SO-, -SO 2-, -CR 7R 8-, -(CH 2) t-, -O(CH 2) tO-, -COO(CH 2) tOCO-, -CONH-, 페닐렌 또는 이들의 조합으로 이루어진 군에서 선택된 어느 하나이며, 상기에서 R 7 및 R 8는 각각 독립적으로 수소, 탄소수 1 내지 10의 알킬기, 또는 탄소수 1 내지 10의 할로 알킬기 중 하나이고, t는 1 내지 10의 정수이다.In Formula 6, R 1 to R 6 are each independently hydrogen or an alkyl group having 1 to 6 carbon atoms, and L is a single bond, -O-, -CO-, -COO-, -S-, -SO-,- SO 2 -, -CR 7 R 8 -, -(CH 2 ) t -, -O(CH 2 ) t O-, -COO(CH 2 ) t OCO-, -CONH-, phenylene or combinations thereof Any one selected from the group consisting of, wherein R 7 and R 8 are each independently hydrogen, an alkyl group having 1 to 10 carbon atoms, or a halo alkyl group having 1 to 10 carbon atoms, and t is an integer of 1 to 10.
상기 화학식6으로 표시되는 작용기의 구체적인 예로는 하기 화학식6-1로 표시되는 작용기, 하기 화학식6-2로 표시되는 작용기, 또는 하기 화학식6-3으로 표시되는 작용기 등을 들 수 있다.Specific examples of the functional group represented by Chemical Formula 6 include functional groups represented by Chemical Formula 6-1, functional groups represented by Chemical Formula 6-2, or functional groups represented by Chemical Formula 6-3.
[화학식6-1][Formula 6-1]
Figure PCTKR2020001263-appb-img-000012
Figure PCTKR2020001263-appb-img-000012
[화학식6-2][Formula 6-2]
Figure PCTKR2020001263-appb-img-000013
Figure PCTKR2020001263-appb-img-000013
[화학식6-3][Formula 6-3]
Figure PCTKR2020001263-appb-img-000014
Figure PCTKR2020001263-appb-img-000014
즉, 상기 폴리이미드계 고분자는, 테트라카르복시산 이무수물 유래 반복단위가 상기 화학식2로 표시되는 작용기인 화학식1로 표시되는 반복단위를 함유하는 제 1 반복 단위; 및 테트라카르복시산 이무수물 유래 반복단위가 상기 화학식6으로 표시되는 작용기인 화학식5로 표시되는 반복단위를 함유한 제 2 반복 단위;를 포함할 수 있다. 상기 제1 반복 단위 및 제 2 반복 단위는 상기 폴리이미드계 고분자 내에서 랜덤하게 배열하여 랜덤 공중합체를 이루거나, 제1 반복단위 간의 블록, 제2 반복단위 간의 블록을 형성하며 블록 공중합체를 이룰 수 있다.That is, the polyimide-based polymer includes: a first repeating unit containing a repeating unit represented by Formula 1, wherein a repeating unit derived from tetracarboxylic acid dianhydride is a functional group represented by Formula 2; And a second repeating unit containing a repeating unit represented by Formula 5, wherein the repeating unit derived from tetracarboxylic dianhydride is a functional group represented by Formula 6 above. The first repeating unit and the second repeating unit are randomly arranged in the polyimide-based polymer to form a random copolymer, or a block between the first repeating unit and a block between the second repeating units to form a block copolymer. Can.
상기 화학식 1로 표시되는 반복 단위 및 상기 화학식 5로 표시되는 반복 단위를 포함한 폴리이미드계 고분자는 디아민 화합물과 함께 서로 다른 2종 이상의 테트라카르복시산 이무수물 화합물을 반응시켜 제조할 수 있으며, 상기 2종의 테트라카르복시산 이무수물을 동시에 첨가하여 랜덤 공중합체를 합성하거나, 순차적으로 첨가하여 블록 공중합체를 합성할 수 있다.The polyimide-based polymer including the repeating unit represented by Chemical Formula 1 and the repeating unit represented by Chemical Formula 5 may be prepared by reacting two or more different tetracarboxylic acid dianhydride compounds with diamine compounds. Tetracarboxylic acid dianhydride may be added simultaneously to synthesize a random copolymer, or sequentially added to synthesize a block copolymer.
상기 화학식 5로 표시되는 폴리이미드 반복단위는 폴리이미드계 수지에 함유된 전체 반복단위 대비 1몰% 이상 99몰% 이하로 함유될 수 있다.The polyimide repeating unit represented by Chemical Formula 5 may contain 1 mol% or more and 99 mol% or less of all the repeating units contained in the polyimide resin.
상기 화학식 1로 표시되는 폴리이미드 반복단위 및 화학식 5로 표시되는 폴리이미드 반복단위는 폴리이미드계 수지에 함유된 전체 반복단위 대비 70몰% 이상, 또는 80몰% 이상, 또는 90몰% 이상, 또는 70몰% 이상 100몰%이하, 80몰% 이상 100몰%이하, 70몰% 이상 90몰%이하, 70몰% 이상 99몰%이하, 80몰% 이상 99몰%이하, 90몰% 이상 99몰%이하로 함유될 수 있다.The polyimide repeating unit represented by Formula 1 and the polyimide repeating unit represented by Formula 5 are 70 mol% or more, or 80 mol% or more, or 90 mol% or more, compared to the total repeating units contained in the polyimide-based resin, or 70 mol% or more, 100 mol% or less, 80 mol% or more, 100 mol% or less, 70 mol% or more, 90 mol% or less, 70 mol% or more, 99 mol% or less, 80 mol% or more, 99 mol% or less, 90 mol% or more, 99 or more 99 It may contain less than mol%.
즉, 상기 폴리이미드계 수지는 상기 화학식 1로 표시되는 폴리이미드 반복단위 및 화학식 5로 표시되는 폴리이미드 반복단위만으로 이루어져 있거나, 대부분이 상기 화학식 1로 표시되는 폴리이미드 반복단위 및 화학식 5로 표시되는 폴리이미드 반복단위로 이루어질 수 있다.That is, the polyimide-based resin is composed of only the polyimide repeating unit represented by Formula 1 and the polyimide repeating unit represented by Formula 5, or most of the polyimide repeating unit represented by Formula 1 and Formula 5 It may be made of polyimide repeat units.
보다 구체적으로, 상기 폴리이미드계 수지는 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기를 유도할 수 있는 디아민 이외에 다른 디아민이 혼합되지 않거나, 1몰% 미만의 극히 일부로 혼합될 수 있다.More specifically, in the polyimide-based resin, other diamines other than diamines capable of inducing aromatic divalent functional groups having 15 or more carbon atoms substituted with at least one electron withdrawing functional group are not mixed, or may be mixed in an extremely small amount of less than 1 mol%. have.
보다 구체적으로, 상기 화학식 5로 표시되는 폴리이미드 반복단위 하기 화학식 5-1로 표시되는 폴리이미드 반복단위, 하기 화학식 5-2로 표시되는 폴리이미드 반복단위, 및 하기 화학식 5-3으로 표시되는 폴리이미드 반복단위로 이루어진 군에서 선택된 1종 이상의 반복단위를 포함할 수 있다.More specifically, the polyimide repeating unit represented by Chemical Formula 5, the polyimide repeating unit represented by Chemical Formula 5-1, the polyimide repeating unit represented by Chemical Formula 5-2, and the polyyi represented by Chemical Formula 5-3: It may include one or more repeat units selected from the group consisting of mid repeat units.
[화학식5-1][Formula 5-1]
Figure PCTKR2020001263-appb-img-000015
Figure PCTKR2020001263-appb-img-000015
상기 화학식 5-1 에서, X 3는 상기 화학식6-1로 표시되는 4가의 작용기이고, Y 3은 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기이고,In Chemical Formula 5-1, X 3 is a tetravalent functional group represented by Chemical Formula 6-1, Y 3 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group,
[화학식5-2][Formula 5-2]
Figure PCTKR2020001263-appb-img-000016
Figure PCTKR2020001263-appb-img-000016
상기 화학식 5-2 에서, X 4는 상기 화학식6-2로 표시되는 4가의 작용기이고, Y 4은 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기이고,In Chemical Formula 5-2, X 4 is a tetravalent functional group represented by Chemical Formula 6-2, and Y 4 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group,
[화학식5-3][Formula 5-3]
Figure PCTKR2020001263-appb-img-000017
Figure PCTKR2020001263-appb-img-000017
상기 화학식 5-3에서, X 5는 상기 화학식6-3으로 표시되는 4가의 작용기이고, Y 5은 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기이다.In Chemical Formula 5-3, X 5 is a tetravalent functional group represented by Chemical Formula 6-3, and Y 5 is an aromatic divalent functional group having 15 or more carbon atoms with at least one substituted electron withdrawing functional group.
상기 폴리이미드계 수지의 중량평균 분자량(GPC측정)이 크게 한정되는 것은 아니나, 예를 들어, 1000 g/mol 이상 200000 g/mol 이하, 또는 10000 g/mol 이상 200000 g/mol 이하일 수 있다.The weight average molecular weight (measured by GPC) of the polyimide-based resin is not particularly limited, but may be, for example, 1000 g/mol or more and 200000 g/mol or less, or 10000 g/mol or more and 200000 g/mol or less.
본 발명에 따른 폴리이미드계 수지는 강직한 구조에 의한 내열성, 기계적 강도 등의 특성을 그대로 유지하면서, 우수한 무색 투명한 특성을 나타낼 수 있어, 소자용 기판, 디스플레이용 커버기판, 광학 필름(optical film), IC(integrated circuit) 패키지, 전착 필름(adhesive film), 다층 FRC(flexible printed circuit), 테이프, 터치패널, 광디스크용 보호필름 등과 같은 다양한 분야에 사용될 수 있으며, 특히 디스플레이용 커버기판에 적합할 수 있다.The polyimide-based resin according to the present invention can exhibit excellent colorless and transparent characteristics while maintaining characteristics such as heat resistance, mechanical strength, etc. due to a rigid structure, an element substrate, a display substrate for a display, and an optical film , IC (integrated circuit) package, electrodeposition film (adhesive film), multi-layer flexible printed circuit (FRC), tape, touch panel, protective film for optical disk, etc. can be used in various fields, especially suitable for display cover board have.
한편, 상기 일 구현예의 폴리이미드계 수지 필름은 상기 폴리이미드계 수지가 400 ℃ 이상의 온도에서 경화된 경화물을 포함할 수 있다. 상기 경화물은 상기 폴리이미드계 수지가 함유된 수지 조성물의 경화공정을 거쳐 얻어진 물질을 의미하며, 상기 경화공정은 400 ℃ 이상, 또는 400 ℃ 이상 500 ℃ 이하의 온도에서 50 분 이상 100 분 이하로 진행될 수 있다.Meanwhile, the polyimide-based resin film of the embodiment may include a cured product in which the polyimide-based resin is cured at a temperature of 400° C. or higher. The cured product means a material obtained through a curing process of a resin composition containing the polyimide-based resin, and the curing process is performed at a temperature of 400° C. or higher, or 400° C. or higher and 500° C. or lower, for 50 minutes to 100 minutes. Can proceed.
보다 구체적으로 상기 폴리이미드계 수지 필름을 합성하는 방법의 예가 크게 한정되는 것은 아니며, 예를 들어, 상기 폴리이미드계 수지를 함유한 수지 조성물을 기판에 도포하여 도막을 형성하는 단계(단계 1); 상기 도막을 건조하는 단계(단계 2); 상기 건조된 도막을 열처리하여 경화하는 단계(단계 3)를 포함하는, 필름의 제조 방법을 사용할 수 있다.More specifically, an example of a method for synthesizing the polyimide-based resin film is not particularly limited, and for example, forming a coating film by applying a resin composition containing the polyimide-based resin to a substrate (step 1); Drying the coating film (step 2); A method of manufacturing the film may be used, including the step of curing the dried coating film by heat treatment (step 3).
상기 단계 1은, 상술한 폴리이미드계 수지를 함유한 수지 조성물을 기판에 도포하여 도막을 형성하는 단계이다. 상기 폴리이미드계 수지를 함유한 수지 조성물을 기판에 도포하는 방법은 특별히 제한되지 않으며, 예컨대 스크린 인쇄, 오프셋 인쇄, 플렉소 인쇄, 잉크젯 등의 방법이 이용될 수 있다.Step 1 is a step of forming a coating film by applying a resin composition containing the above-described polyimide resin to a substrate. The method of applying the resin composition containing the polyimide-based resin to the substrate is not particularly limited, and for example, methods such as screen printing, offset printing, flexo printing, inkjet, and the like can be used.
그리고, 상기 폴리이미드계 수지를 함유한 수지 조성물은 유기 용매에 용해 또는 분산시킨 것일 수 있다. 이러한 형태를 갖는 경우, 예를 들어 폴리이미드계 수지를 유기 용매 중에서 합성한 경우에는, 용액은 얻어지는 반응 용액 그 자체여도 되고, 또 이 반응 용액을 다른 용매로 희석한 것이어도 된다. 또, 폴리이미드계 수지를 분말로서 얻은 경우에는, 이것을 유기 용매에 용해시켜 용액으로 한 것이어도 된다. In addition, the resin composition containing the polyimide resin may be dissolved or dispersed in an organic solvent. When it has such a form, for example, when the polyimide-type resin is synthesize|combined in an organic solvent, the solution may be the reaction solution itself obtained, and the reaction solution may be diluted with another solvent. In addition, when a polyimide resin is obtained as a powder, it may be dissolved in an organic solvent to form a solution.
상기 유기 용매의 구체적인 예로는 톨루엔, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸-2-피롤리돈, N-메틸카프로락탐, 2-피롤리돈, N-에틸피롤리돈, N-비닐피롤리돈, 디메틸술폭사이드, 테트라메틸우레아, 피리딘, 디메틸술폰, 헥사메틸술폭사이드, 감마-부티로락톤, 3-메톡시-N,N-디메틸프로판아미드, 3-에톡시-N,N-디메틸프로판아미드, 3-부톡시-N,N-디메틸프로판아미드, 1,3-디메틸-이미다졸리디논, 에틸아밀케톤, 메틸노닐케톤, 메틸에틸케톤, 메틸이소아밀케톤, 메틸이소프로필케톤, 사이클로헥사논, 에틸렌카보네이트, 프로필렌카보네이트, 디글라임, 4-하이드록시-4-메틸-2-펜타논, 에틸렌 글리콜 모노메틸 에테르, 에틸렌 글리콜 모노메틸 에테르 아세테이트, 에틸렌 글리콜 모노에틸 에테르, 에틸렌 글리콜 모노에틸 에테르 아세테이트, 에틸렌 글리콜 모노프로필 에테르, 에틸렌 글리콜 모노프로필 에테르 아세테이트, 에틸렌 글리콜 모노이소프로필 에테르, 에틸렌 글리콜 모노이소프로필 에테르 아세테이트, 에틸렌 글리콜 모노뷰틸 에테르, 에틸렌 글리콜 모노뷰틸 에테르 아세테이트 등을 들 수 있다. 이들은 단독으로 사용될 수도 있고, 혼합하여 사용될 수도 있다.Specific examples of the organic solvent include toluene, N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 2-pyrrolidone, N-ethyl Pyrrolidone, N-vinylpyrrolidone, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylsulfoxide, gamma-butyrolactone, 3-methoxy-N,N-dimethylpropanamide, 3- Ethoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, 1,3-dimethyl-imidazolidinone, ethyl amyl ketone, methylnonyl ketone, methyl ethyl ketone, methyl isoa Milk ketone, methyl isopropyl ketone, cyclohexanone, ethylene carbonate, propylene carbonate, diglyme, 4-hydroxy-4-methyl-2-pentanone, ethylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol Monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether, ethylene glycol monopropyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monoisopropyl ether acetate, ethylene glycol monobutyl ether, ethylene glycol monobutyl ether And acetate. These may be used alone or in combination.
상기 폴리이미드계 수지를 함유한 수지 조성물은 필름 형성 공정시의 도포성 등의 공정성을 고려하여 적절한 점도를 갖도록 하는 양으로 고형분을 포함할 수 있다. 예를 들어, 전체 수지의 함량이 5 중량% 이상 25 중량% 이하가 되도록 조성물의 함량을 조절할 수 있으며, 또는 5 중량% 이상 20 중량% 이하, 또는 5 중량% 이상 15 중량% 이하로 조절할 수 있다.The resin composition containing the polyimide-based resin may contain solid content in an amount to have an appropriate viscosity in consideration of processability such as coatability during the film forming process. For example, the content of the composition may be adjusted such that the total resin content is 5% to 25% by weight, or 5% to 20% by weight, or 5% to 15% by weight. .
또한, 상기 폴리이미드계 수지를 함유한 수지 조성물은 유기 용매 외에 다른 성분을 추가로 포함할 수 있다. 비제한적인 예로, 상기 폴리이미드계 수지를 함유한 수지 조성물이 도포되었을 때, 막 두께의 균일성이나 표면 평활성을 향상시키거나, 혹은 기판과의 밀착성을 향상시키거나, 혹은 유전율이나 도전성을 변화시키거나, 혹은 치밀성을 증가시킬 수 있는 첨가제가 추가로 포함될 수 있다. 이러한 첨가제로는 계면 활성제, 실란계 화합물, 유전체 또는 가교성 화합물 등이 예시될 수 있다.In addition, the resin composition containing the polyimide-based resin may further include other components in addition to the organic solvent. As a non-limiting example, when the resin composition containing the polyimide-based resin is applied, it improves the uniformity or surface smoothness of the film thickness, or improves the adhesion to the substrate, or changes the dielectric constant or conductivity. Or, additives that can increase the density may be further included. Examples of such additives include surfactants, silane-based compounds, dielectric or cross-linkable compounds, and the like.
상기 단계 2는, 상기 폴리이미드계 수지를 함유한 수지 조성물을 기판에 도포하여 형성된 도막을 건조하는 단계이다. The step 2 is a step of drying the coating film formed by applying the resin composition containing the polyimide resin to the substrate.
상기 도막의 건조 단계는 핫 플레이트, 열풍 순환로, 적외선로 등의 가열 수단에 의해 실시될 수 있고, 50 ℃ 이상 150 ℃ 이하, 또는 50 ℃ 이상 100 ℃ 이하 온도로 수행할 수 있다.The drying step of the coating film may be performed by heating means such as a hot plate, a hot air circulation path, an infrared furnace, and may be performed at a temperature of 50°C or more and 150°C or less, or 50°C or more and 100°C or less.
상기 단계 3은, 상기 건조된 도막을 열처리하여 경화하는 단계이다. 이때, 상기 열처리는 핫 플레이트, 열풍 순환로, 적외선로 등의 가열 수단에 의해 실시될 수 있고, 400 ℃ 이상, 또는 400 ℃ 이상 500 ℃ 이하의 온도로 수행할 수 있다.Step 3 is a step of curing the dried coating film by heat treatment. At this time, the heat treatment may be performed by heating means such as a hot plate, a hot air circulation path, an infrared furnace, and may be performed at a temperature of 400°C or higher, or 400°C or higher and 500°C or lower.
상기 폴리이미드계 수지 필름의 두께가 크게 한정되는 것은 아니나, 예를 들어, 0.01 ㎛ 이상 1000 ㎛ 이하 범위내에서 자유롭게 조절 가능하다. 상기 폴리이미드계 수지 필름의 두께가 특정 수치만큼 증가하거나 감소하는 경우 폴리이미드계 수지 필름에서 측정되는 물성 또한 일정 수치만큼 변화할 수 있다.Although the thickness of the polyimide-based resin film is not particularly limited, for example, it can be freely adjusted within a range of 0.01 μm or more and 1000 μm or less. When the thickness of the polyimide-based resin film increases or decreases by a specific value, physical properties measured in the polyimide-based resin film may also change by a certain value.
한편, 상기 폴리이미드계 수지 필름은 하기 수학식1에 의해 얻어지는 황색 지수 변화량의 절대값이 4 이하, 또는 3.5 이하, 또는 0.01 이상 4 이하, 또는 0.01 이상 3.5 이하, 또는 0.05 이상 4 이하, 또는 0.05 이상 3.5 이하, 또는 0.1 이상 4 이하, 또는 0.1 이상 3.5 이하일 수 있다.On the other hand, in the polyimide-based resin film, the absolute value of the amount of change in the yellow index obtained by Equation 1 below is 4 or less, or 3.5 or less, or 0.01 or more and 4 or less, or 0.01 or more and 3.5 or less, or 0.05 or more and 4 or less, or 0.05 Or more and 3.5 or less, or 0.1 or more and 4 or less, or 0.1 or more and 3.5 or less.
[수학식1][Equation 1]
황색 지수 변화량(△YI) = YI f - YI 0 Yellow index change (△YI) = YI f- YI 0
상기 수학식1에서, YI f는, 상기 폴리이미드계 수지 필름을 400 ℃ 내지 450 ℃온도에서 130분 내지 200분간 열처리한 이후 얻어지는 필름의 최종 황색 지수 이고, YI 0는, 상기 열처리 전의 폴리이미드계 수지 필름의 황색 지수 이다.In Equation 1, YI f is the final yellow index of the film obtained after heat treatment of the polyimide resin film at a temperature of 400° C. to 450° C. for 130 minutes to 200 minutes, and YI 0 is a polyimide system before the heat treatment. It is the yellow index of the resin film.
상기 수학식1에서 얻어지는 황색 지수 변화량 값은 음수 또는 양수의 값을 가질 수 있기 때문에, 상기 수학식1에서 얻어지는 황색 지수 변화량의 절대값을 통해 추가 열처리에 따른 실질적인 황색 지수의 변화를 비교할 수 있다. 상기 수학식1에서 얻어지는 황색 지수 변화량 값이 음수(예를 들어 -1)인 경우, 상기 수학식1에서 얻어지는 황색 지수 변화량의 절대값은 음의 부호를 제거한 값(예를 들어 1)일 수 있다. 상기 수학식1에서 얻어지는 황색 지수 변화량 값이 양수(예를 들어 1)인 경우, 상기 수학식1에서 얻어지는 황색 지수 변화량의 절대값은 상기 수학식1에서 얻어지는 황색 지수 변화량 값(예를 들어 1)과 동일하다.Since the value of the change in yellow index obtained in Equation 1 may have a negative or positive value, the change in the actual yellow index according to the additional heat treatment can be compared through the absolute value of the amount of change in yellow index obtained in Equation 1. When the yellow index change amount obtained in Equation 1 is a negative number (eg, -1), the absolute value of the yellow index change amount obtained in Equation 1 may be a value with a negative sign removed (eg 1). . When the yellow index change amount obtained in Equation 1 is a positive number (for example, 1), the absolute value of the yellow index change amount obtained in Equation 1 is a yellow index change amount value (eg, 1) obtained in Equation 1 Is the same as
상기 수학식1의 YI f에서, 상기 폴리이미드계 수지 필름을 400 ℃ 내지 450 ℃온도에서 130분 내지 200분간 열처리하는 방법의 예가 크게 한정되는 것은 아니며, 열처리가 단일단계로 진행될 수 도 있고, 다단계로 진행될 수 있다. 상기 다단계의 경우, 2단계 내지 10단계의 추가 열처리 과정을 거칠 수 있으며, 이 경우 각각의 단계는 연속적으로 혹은 불연속적으로 진행될 수 있다.In YI f of Equation 1, an example of a method of heat-treating the polyimide-based resin film at a temperature of 400°C to 450°C for 130 minutes to 200 minutes is not particularly limited, and the heat treatment may be performed in a single step, or in multiple steps. Can proceed to In the case of the multi-step, an additional heat treatment process of 2 to 10 steps may be performed, and in this case, each step may be performed continuously or discontinuously.
다만, 열처리가 순차적으로 이루어진 경우 각각의 열처리 단계가 400 ℃ 내지 450 ℃온도에서 이루어지며, 각각의 열처리 단계의 시간의 총 합계가 130분 내지 200분을 만족한다. However, when heat treatment is sequentially performed, each heat treatment step is performed at a temperature of 400°C to 450°C, and the total sum of the times of each heat treatment step satisfies 130 minutes to 200 minutes.
즉, 상기 일 구현예의 폴리이미드계 수지 필름에 대해 400 ℃ 이상의 고온에서의 열처리 조건을 추가하였음에도, 필름의 광학 물성인 황색 지수 변화량의 절대값이 4 이하로 매우 적기 때문에, 상기 일 구현예의 폴리이미드계 수지 필름이 고내열성을 구현할 수 있다.That is, even though heat treatment conditions at a high temperature of 400° C. or higher are added to the polyimide-based resin film of the above embodiment, the absolute value of the amount of change in the yellow index, which is the optical property of the film, is very small to 4 or less, so the polyimide of the above embodiment Based resin film can achieve high heat resistance.
상기 황색 지수 측정에 사용되는 폴리이미드계 수지 필름 시료가, 순수한 폴리이미드계 수지 필름만으로 이루어질 경우, 상기 황색 지수는 폴리이미드계 수지 필름 시료를 color meter(GRETAGMACBETH사의 Color-Eye 7000A)로 분석한 결과를 통해 자동으로 측정가능하다. 예를 들어, 기재필름 및 상기 기재필름 상에 코팅된 폴리이미드계 수지 필름을 포함한 적층체에서 기재필름을 박리하는 공정을 통해, 순수한 폴리이미드계 수지 필름을 확보할 수 있다.When the polyimide-based resin film sample used for the yellow index measurement is made of pure polyimide-based resin film only, the yellow index is a result of analyzing a polyimide-based resin film sample with a color meter (Color-Eye 7000A of GRETAGMACBETH). It can be measured automatically. For example, a pure polyimide-based resin film may be secured through a process of peeling the base film from a laminate including a base film and a polyimide-based resin film coated on the base film.
상기 황색 지수는 5 ㎛ 이상 30 ㎛ 이하, 또는 5 ㎛ 이상 15 ㎛ 이하, 또는 8 ㎛ 이상 12 ㎛ 이하의 두께를 갖는 상기 일 구현예의 폴리이미드계 수지 필름 시료에 대하여 측정한 것일 수 있다.The yellow index may be measured for a sample of a polyimide resin film of one embodiment having a thickness of 5 μm or more and 30 μm or less, or 5 μm or more and 15 μm or less, or 8 μm or more and 12 μm or less.
상기 수학식 1에서, 상기 열처리 전의 폴리이미드계 수지 필름의 황색 지수가 15 이하, 또는 14.5 이하, 또는 1 이상 15 이하, 또는 1 이상 14.5 이하, 또는 5 이상 15 이하, 또는 5 이상 14.5 이하, 또는 8.8 이상 14.1 이하일 수 있다. 상기 상기 열처리 전의 폴리이미드계 수지 필름의 황색 지수 측정 대상인 폴리이미드계 수지 필름은 상술한 바와 같이 폴리이미드계 수지가 함유된 수지 조성물의 경화공정을 거쳐 얻어진 물질을 의미하며, 상기 경화공정은 예를 들어 400 ℃ 이상, 또는 400 ℃ 이상 500 ℃ 이하의 온도에서 50 분 이상 100 분 이하로 진행될 수 있다.In Equation 1, the yellow index of the polyimide resin film before the heat treatment is 15 or less, or 14.5 or less, or 1 or more 15 or less, or 1 or more 14.5 or less, or 5 or more 15 or less, or 5 or more 14.5 or less, or 8.8 or more and 14.1 or less. The polyimide resin film, which is a yellow index measurement target of the polyimide resin film before the heat treatment, refers to a material obtained through a curing process of a resin composition containing a polyimide resin as described above, and the curing process is, for example, For example, at a temperature of 400° C. or higher, or 400° C. or higher and 500° C. or lower, the temperature may be 50 minutes or more and 100 minutes or less.
또한, 상기 수학식 1에서, 상기 폴리이미드계 수지 필름의 최종 황색 지수가 20 이하, 또는 18 이하, 또는 5 이상 20 이하, 또는 5 이상 18 이하, 또는 8 이상 20 이하, 또는 8 이상 18 이하, 또는 8.7 이상 17.6 이하일 수 있다. 상기 최종 황색 지수 측정 대상인 폴리이미드계 수지 필름은 상술한 바와 같이 상기 폴리이미드계 수지 필름을 400 ℃ 내지 450 ℃온도에서 130분 내지 200분간 더 열처리한 이후 얻어지는 필름을 의미하며, 상기 열처리에 대한 내용은 상기 수학식1에서 상술한 바와 같다.In addition, in Equation 1, the final yellow index of the polyimide-based resin film is 20 or less, or 18 or less, or 5 or more 20 or less, or 5 or more 18 or less, or 8 or more 20 or less, or 8 or more and 18 or less, Or 8.7 or more and 17.6 or less. The final yellow index measurement target polyimide-based resin film means a film obtained after further heat-treating the polyimide-based resin film at a temperature of 400°C to 450°C for 130 minutes to 200 minutes as described above, and the heat treatment Is as described above in Equation (1).
상술한 바와 같이, 폴리이미드계 수지 합성에 사용되는 디아민 단량체 화합물에, 전자끌개 효과를 부여할 수 있는 트리플루오루메틸기(-CF 3)를 치환기로 도입하여, 이미드 사슬 내에 존재하는 Pi-전자들의 CTC (charge transfer complex) 형성을 억제함을 통해 투명성을 확보하여 우수한 광학특성을 구현할 수 있다.As described above, by introducing a trifluoromethyl group (-CF 3 ) capable of imparting an electron withdrawing effect to the diamine monomer compound used in the synthesis of the polyimide-based resin as a substituent, the Pi-electron present in the imide chain By suppressing the formation of their charge transfer complex (CTC), transparency can be secured to realize excellent optical properties.
2. 디스플레이 장치용 기판2. Substrate for display device
한편, 발명의 또 다른 구현예에 따르면, 상기 다른 구현예의 폴리이미드계 수지 필름을 포함하는 디스플레이 장치용 기판이 제공될 수 있다. 상기 폴리이미드계 수지 필름에 관한 내용은 상기 일 구현예에서 상술한 내용을 모두 포함할 수 있다.Meanwhile, according to another embodiment of the present invention, a substrate for a display device including the polyimide-based resin film of the other embodiment may be provided. The contents of the polyimide-based resin film may include all of the contents described above in one embodiment.
상기 기판을 포함하는 디스플레이 장치는 액정 표시 장치(liquid crystal display device, LCD), 유기발광다이오드(organic light emitting diode, OLED), 플렉서블 디스플레이(Flexible Display), 또는 감김 가능 디스플레이 장치(rollable display or foldable display) 등을 들 수 있으나, 이에 한정되는 것은 아니다.The display device including the substrate is a liquid crystal display device (LCD), an organic light emitting diode (OLED), a flexible display (Flexible Display), or a rollable display device (rollable display or foldable display) ) And the like, but is not limited thereto.
상기 디스플레이 장치는 적용 분야 및 구체적인 형태 등에 따라서 다양한 구조를 가질 수 있으며, 예를 들어 커버 플라스틱 윈도우, 터치 패널, 편광판, 배리어 필름, 발광 소자(OLED 소자 등), 투명 기판 등을 포함하는 구조일 수 있다.The display device may have various structures depending on the application field and the specific shape, for example, a structure including a cover plastic window, a touch panel, a polarizing plate, a barrier film, a light emitting device (such as an OLED device), and a transparent substrate. have.
상술한 다른 구현예의 폴리이미드계 수지 필름은 이러한 다양한 디스플레이 장치에서 기판, 외부 보호 필름 또는 커버 윈도우 등의 다양한 용도로 사용될 수 있으며, 보다 구체적으로는 기판으로 적용될 수 있다.The polyimide-based resin film of the other embodiments described above may be used for various purposes such as a substrate, an external protective film, or a cover window in these various display devices, and more specifically, may be applied as a substrate.
예를 들면, 상기 디스플레이 장치용 기판은 소자보호층, 투명 전극층, 실리콘 산화물층, 폴리이미드계 수지 필름, 실리콘 산화물층 및 하드 코팅층이 순차적으로 적층된 구조를 구비할 수 있다.For example, the substrate for a display device may have a structure in which a device protection layer, a transparent electrode layer, a silicon oxide layer, a polyimide resin film, a silicon oxide layer, and a hard coating layer are sequentially stacked.
상기 투명 폴리이미드 기판은 내용제성 내지 수분투과성 및 광학적 특성을 보다 향상시킬 수 있는 측면에서 투명 폴리이미드계 수지 필름과 경화층 사이에 형성된, 실리콘산화물층을 포함할 수 있으며, 상기 실리콘산화물층은 폴리실라잔을 경화시켜 생성되는 것일 수 있다.The transparent polyimide substrate may include a silicon oxide layer formed between the transparent polyimide-based resin film and the cured layer in terms of further improving solvent resistance, moisture permeability, and optical properties, and the silicon oxide layer is poly It may be produced by curing silazane.
구체적으로, 상기 실리콘산화물층은 상기 투명 폴리이미드계 수지 필름의 적어도 일면상에 코팅층을 형성하는 단계 이전에 폴리실라잔을 포함하는 용액을 코팅 및 건조한 후 상기 코팅된 폴리실라잔을 경화시켜 형성되는 것일 수 있다.Specifically, the silicon oxide layer is formed by curing the coated polysilazane after coating and drying a solution containing polysilazane before the step of forming a coating layer on at least one surface of the transparent polyimide resin film. May be
본 발명에 따른 디스플레이 장치용 기판은 상술한 소자보호층을 포함함으로써 우수한 휨특성 및 내충격성을 가지면서, 내용제성, 광학특성, 수분투과도 및 내스크래치성을 갖는 투명 폴리이미드 커버기판을 제공할 수 있다.The substrate for a display device according to the present invention can provide a transparent polyimide cover substrate having solvent resistance, optical properties, moisture permeability, and scratch resistance, while having excellent bending properties and impact resistance by including the above-described device protection layer. have.
3. 광학 장치3. Optical device
한편, 발명의 또 다른 구현예에 따르면, 상기 다른 구현예의 폴리이미드계 수지 필름을 포함하는 광학 장치가 제공될 수 있다. 상기 폴리이미드계 수지 필름에 관한 내용은 상기 일 구현예에서 상술한 내용을 모두 포함할 수 있다.Meanwhile, according to another embodiment of the present invention, an optical device including the polyimide-based resin film of the other embodiment may be provided. The contents of the polyimide-based resin film may include all of the contents described above in one embodiment.
상기 광학 장치는 빛에 의해 구현되는 성질을 이용한 각종 장치가 모두 포함될 수 있으며, 예를 들어, 디스플레이 장치를 들 수 있다. 상기 디스플레이 장치의 구체적인 예로는 액정 표시 장치(liquid crystal display device, LCD), 유기발광다이오드(organic light emitting diode, OLED), 플렉서블 디스플레이(Flexible Display), 또는 감김 가능 디스플레이 장치(rollable display or foldable display) 등을 들 수 있으나, 이에 한정되는 것은 아니다.The optical device may include all of various devices using properties realized by light, for example, a display device. Specific examples of the display device include a liquid crystal display device (LCD), an organic light emitting diode (OLED), a flexible display, or a rollable display or foldable display And the like, but is not limited thereto.
상기 광학 장치는 적용 분야 및 구체적인 형태 등에 따라서 다양한 구조를 가질 수 있으며, 예를 들어 커버 플라스틱 윈도우, 터치 패널, 편광판, 배리어 필름, 발광 소자(OLED 소자 등), 투명 기판 등을 포함하는 구조일 수 있다.The optical device may have various structures according to application fields and specific shapes, and may be, for example, a structure including a cover plastic window, a touch panel, a polarizing plate, a barrier film, a light emitting device (such as an OLED device), and a transparent substrate. have.
상술한 다른 구현예의 폴리이미드계 수지 필름은 이러한 다양한 광학 장치에서 기판, 외부 보호 필름 또는 커버 윈도우 등의 다양한 용도로 사용될 수 있으며, 보다 구체적으로는 기판에 적용될 수 있다.The polyimide-based resin film of the other embodiments described above may be used in various applications such as a substrate, an external protective film, or a cover window in these various optical devices, and more specifically, may be applied to a substrate.
본 발명에 따르면, 고온의 열처리 조건에서도 우수한 광학 특성을 확보할 수 있고, 추가열처리 시에도 광학 특성이 안정적으로 유지될 수 있는 폴리이미드계 수지 필름 및 이를 이용한 디스플레이 장치용 기판, 및 광학 장치가 제공될 수 있다.According to the present invention, a polyimide-based resin film and a substrate for a display device using the same and a polyimide resin film capable of securing excellent optical properties under high temperature heat treatment conditions and stably maintaining optical properties even during additional heat treatment are provided. Can be.
발명을 하기의 실시예에서 보다 상세하게 설명한다. 단, 하기의 실시예는 본 발명을 예시하는 것일 뿐, 본 발명의 내용이 하기의 실시예에 의하여 한정되는 것은 아니다.The invention is described in more detail in the following examples. However, the following examples are only illustrative of the present invention, and the contents of the present invention are not limited by the following examples.
<실시예: 폴리이미드 필름의 제조><Example: Preparation of polyimide film>
실시예1Example 1
(1) 폴리이미드 전구체 조성물의 제조(1) Preparation of polyimide precursor composition
질소 기류가 흐르는 교반기 내에 유기용매 DEAc를 채운 후, 반응기의 온도를 25℃로 유지한 상태에서 하기 화학식 a로 표시되는 디아민 0.735 mol을 같은 온도에서 첨가하여 용해시켰다. 하기 화학식 a로 표시되는 디아민이 첨가된 용액에 산이무수물로 하기 화학식 b로 표시되는 9,9-비스(3,4-디카복시페닐)플루오렌이무수물(9,9-Bis(3,4-dicarboxyphenyl)fluorene Dianhydride, BPAF) 0.3675 mol 및 3,3',4,4'-바이페닐테트라카르복시산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 0.3675 mol을 같은 온도에서 첨가하여 24시간동안 교반하여 폴리이미드 전구체 조성물을 얻었다.After filling the organic solvent DEAc in a stirrer through which a nitrogen stream flowed, 0.735 mol of diamine represented by the following formula (a) was dissolved at the same temperature while maintaining the temperature of the reactor at 25°C. 9,9-bis(3,4-dicarboxyphenyl)fluorene dianhydride represented by the following formula (b) as an acid dianhydride in the solution to which the diamine represented by the following formula (a) is added (9,9-Bis(3,4- dicarboxyphenyl)fluorene Dianhydride, BPAF) 0.3675 mol and 3,3',4,4'-biphenyltetracarboxylic dianhydride (3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 0.3675 mol were added at the same temperature The mixture was stirred for 24 hours to obtain a polyimide precursor composition.
[화학식a] [Formula a]
Figure PCTKR2020001263-appb-img-000018
Figure PCTKR2020001263-appb-img-000018
[화학식b][Formula b]
Figure PCTKR2020001263-appb-img-000019
Figure PCTKR2020001263-appb-img-000019
(2) 폴리이미드 필름의 제조(2) Preparation of polyimide film
상기 폴리이미드 전구체 조성물을 유리기판 상에 스핀 코팅하였다. 폴리이미드 전구체 조성물이 도포된 유리 기판을 오븐에 넣고 5℃/min의 속도로 가열하였으며, 80℃에서 20분, 450℃에서 70분을 유지하여 경화 공정을 진행하여 폴리이미드 필름(두께 : 10 ㎛)을 제조하였다.The polyimide precursor composition was spin coated on a glass substrate. The glass substrate coated with the polyimide precursor composition was placed in an oven, heated at a rate of 5°C/min, and maintained at 80°C for 20 minutes and at 450°C for 70 minutes to undergo a curing process to perform a polyimide film (thickness: 10 μm) ) Was prepared.
실시예2Example 2
산이무수물로 3,3',4,4'-바이페닐테트라카르복시산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 대신 4,4'-(헥사플루오로이소프로필리덴)디프탈산무수물(4,4'-(Hexafluoroisopropylidene)diphthalic anhydride, 6-FDA)를 사용한 것을 제외하고는 상기 실시예1과 동일한 방법으로 폴리이미드 필름을 제조하였다.4,4'-(hexafluoroisopropylidene)di instead of 3,3',4,4'-biphenyltetracarboxylic dianhydride (3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) as acid dianhydride A polyimide film was prepared in the same manner as in Example 1, except that phthalic anhydride (4,4'-(Hexafluoroisopropylidene) diphthalic anhydride, 6-FDA) was used.
실시예3Example 3
산이무수물로 3,3',4,4'-바이페닐테트라카르복시산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 대신 피로멜리틱산 디안하이드라이드(pyromellitic dianhydride, PMDA)을 사용한 것을 제외하고는 상기 실시예1과 동일한 방법으로 폴리이미드 필름을 제조하였다.As an acid dianhydride, pyromellitic dianhydride (PMDA) was used instead of 3,3',4,4'-biphenyltetracarboxylic dianhydride (3,3',4,4'-Biphenyltetracarboxylic dianhydride (BPDA)). A polyimide film was manufactured in the same manner as in Example 1, except that.
<비교예: 폴리이미드 필름의 제조><Comparative Example: Preparation of polyimide film>
비교예1Comparative Example 1
(1) 폴리이미드 전구체 조성물의 제조(1) Preparation of polyimide precursor composition
질소 기류가 흐르는 교반기 내에 유기용매 DEAc를 채운 후, 반응기의 온도를 25℃로 유지한 상태에서 2,2'-비스(트리플루오로메틸)벤지딘) (2,2'-bis(trifluoromethyl)benzidine), TFMB) 0.735 mol을 같은 온도에서 첨가하여 용해시켰다. 2,2'-비스(트리플루오로메틸)벤지딘) (2,2'-bis(trifluoromethyl)benzidine), TFMB)이 첨가된 용액에 산이무수물로 하기 화학식 b로 표시되는 3,3',4,4'-바이페닐테트라카르복시산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 0.735 mol을 같은 온도에서 첨가하여 24시간동안 교반하여 폴리이미드 전구체 조성물을 얻었다.After filling the organic solvent DEAc in a stirrer through which a nitrogen stream flows, 2,2'-bis(trifluoromethyl)benzidine) (2,2'-bis(trifluoromethyl)benzidine) while maintaining the temperature of the reactor at 25°C , TFMB) 0.735 mol was added at the same temperature to dissolve. 2,2'-bis(trifluoromethyl)benzidine) (2,2'-bis(trifluoromethyl)benzidine), 3,3',4 represented by the following formula (b) as an acid dianhydride in a solution added with TFMB) 0.735 mol of 4'-biphenyltetracarboxylic dianhydride (3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) was added at the same temperature and stirred for 24 hours to obtain a polyimide precursor composition.
(2) 폴리이미드 필름의 제조(2) Preparation of polyimide film
상기 폴리이미드 전구체 조성물을 유리기판 상에 스핀 코팅하였다. 폴리이미드 전구체 조성물이 도포된 유리 기판을 오븐에 넣고 5℃/min의 속도로 가열하였으며, 80℃에서 20분, 450℃에서 70분을 유지하여 경화 공정을 진행하여 폴리이미드 필름(두께 : 10 ㎛)을 제조하였다.The polyimide precursor composition was spin coated on a glass substrate. The glass substrate coated with the polyimide precursor composition was placed in an oven, heated at a rate of 5°C/min, and maintained at 80°C for 20 minutes and at 450°C for 70 minutes to undergo a curing process to perform a polyimide film (thickness: 10 μm) ) Was prepared.
비교예2Comparative Example 2
산이무수물로 3,3',4,4'-바이페닐테트라카르복시산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 0.3675 mol, 4,4'-(헥사플루오로이소프로필리덴)디프탈산무수물(4,4'-(Hexafluoroisopropylidene)diphthalic anhydride, 6-FDA) 0.3675 mol 을 첨가한 것을 제외하고는 상기 비교예1과 동일한 방법으로 폴리이미드 필름을 제조하였다.3,3',4,4'-biphenyltetracarboxylic dianhydride (3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 0.3675 mol, 4,4'-(hexafluoroisopropylidene ) Diphthalic anhydride (4,4'-(Hexafluoroisopropylidene) diphthalic anhydride, 6-FDA) except that 0.3675 mol was added, a polyimide film was prepared in the same manner as in Comparative Example 1.
비교예3Comparative Example 3
산이무수물로 피로멜리틱산 디안하이드라이드(pyromellitic dianhydride, PMDA) 0.3675 mol, 4,4'-(헥사플루오로이소프로필리덴)디프탈산무수물(4,4'-(Hexafluoroisopropylidene)diphthalic anhydride, 6-FDA) 0.3675 mol 을 첨가한 것을 제외하고는 상기 비교예1과 동일한 방법으로 폴리이미드 필름을 제조하였다.Pyromellitic dianhydride (PMDA) 0.3675 mol, 4,4'-(hexafluoroisopropylidene) diphthalic anhydride (4,4'-(Hexafluoroisopropylidene) diphthalic anhydride, 6-FDA) A polyimide film was prepared in the same manner as in Comparative Example 1, except that 0.3675 mol was added.
<실험예: 실시예 및 비교예에서 얻어진 폴리이미드 필름의 물성 측정><Experimental Example: Measurement of physical properties of polyimide films obtained in Examples and Comparative Examples>
상기 실시예 및 비교예에서 얻어진 폴리이미드 필름로부터 물성을 하기 방법으로 측정하였으며, 그 결과를 표1 및 표2에 나타내었다.The physical properties from the polyimide films obtained in Examples and Comparative Examples were measured by the following methods, and the results are shown in Tables 1 and 2.
1. 황색 지수(YI 0) (450 ℃/70분 경화)1. Yellow index (YI 0 ) (450 ℃ / 70 minutes curing)
실시예 및 비교예에서 얻어진 두께 10 ㎛의 폴리이미드 필름을 유리 기판으로부터 박리하고, 가로 2cm X 세로 10cm 크기의 시료를 제조한 후, 상기 시료에 대하여 color meter(GRETAGMACBETH사의 Color-Eye 7000A)를 이용하여 황색 지수(YI 0)를 구하고 하기 표1에 기재하였다.The polyimide film having a thickness of 10 μm obtained in Examples and Comparative Examples was peeled from a glass substrate, and after preparing a sample having a size of 2 cm X 10 cm in width, a color meter (Color-Eye 7000A by GRETAGMACBETH) was used for the sample. Then, the yellow index (YI 0 ) was obtained and is shown in Table 1 below.
2. 내열 황색 지수(△YI)2. Heat resistant yellow index (△YI)
(1) 1회 고온 열경화 추가 조건(450 ℃/70분 → 410 ℃/60분 경화)(1) Additional conditions for one time high temperature heat curing (450 ℃/70 minutes → 410 ℃/60 minutes curing)
실시예 및 비교예에서 얻어진 두께 10 ㎛의 폴리이미드 필름을 410 ℃ 에서 60분 추가로 경화시킨 필름을 유리 기판으로부터 박리하고, 가로 2cm X 세로 10cm 크기의 시료를 제조한 후, 상기 시료에 대하여 color meter(GRETAGMACBETH사의 Color-Eye 7000A)를 이용하여 최종 황색 지수(YI f)를 측정하고, 하기 수학식 1에 의한 황색 지수 변화량(△YI)을 계산하여 내열 황색 지수를 구하고 하기 표1에 기재하였다.After the polyimide film having a thickness of 10 μm obtained in Examples and Comparative Examples was further cured at 410° C. for 60 minutes, the film was peeled from the glass substrate, and a sample having a size of 2 cm X 10 cm in width was prepared, followed by color to the sample. The final yellow index (YI f ) was measured using a meter (GRETAGMACBETH's Color-Eye 7000A), and the amount of change in yellow index (ΔYI) according to Equation 1 below was calculated to obtain a heat-resistant yellow index and is shown in Table 1 below. .
(2) 2회 고온 열경화 추가 조건(450 ℃/70분 → 410 ℃/60분 → 445 ℃/60분 경화)(2) Additional conditions for two times of high temperature heat curing (450 ℃/70 minutes → 410 ℃/60 minutes → 445 ℃/60 minutes curing)
실시예 및 비교예에서 얻어진 두께 10 ㎛의 폴리이미드 필름을 410 ℃ 에서 60분 추가로 경화한 다음, 445 ℃ 에서 60분 추가로 경화시킨 필름을 유리 기판으로부터 박리하고, 가로 2cm X 세로 10cm 크기의 시료를 제조한 후, 상기 시료에 대하여 color meter(GRETAGMACBETH사의 Color-Eye 7000A)를 이용하여 최종 황색 지수(YI f)를 측정하고, 하기 수학식 1에 의한 황색 지수 변화량(△YI)을 계산하여 내열 황색 지수를 구하고 하기 표1에 기재하였다.The polyimide film having a thickness of 10 μm obtained in Examples and Comparative Examples was further cured at 410° C. for 60 minutes, and then the film further cured at 445° C. for 60 minutes was peeled from the glass substrate, and the size was 2 cm by 10 cm. After preparing the sample, the final yellow index (YI f ) was measured using a color meter (Color-Eye 7000A manufactured by GRETAGMACBETH), and the amount of change in yellow index (ΔYI) by Equation 1 below was calculated. The heat-resistant yellow index was obtained and is shown in Table 1 below.
(3) 2회 고온 열경화 추가 조건(450 ℃/70분 → 445 ℃/30분 → 445 ℃/30분 경화)(3) Additional conditions for two times of high temperature heat curing (450 ℃/70 minutes → 445 ℃/30 minutes → 445 ℃/30 minutes curing)
실시예 및 비교예에서 얻어진 두께 10 ㎛의 폴리이미드 필름을 445 ℃ 에서 30분 추가로 경화한 다음, 445 ℃ 에서 30분 추가로 경화시킨 필름을 유리 기판으로부터 박리하고, 가로 2cm X 세로 10cm 크기의 시료를 제조한 후, 상기 시료에 대하여 color meter(GRETAGMACBETH사의 Color-Eye 7000A)를 이용하여 최종 황색 지수(YI f)를 측정하고, 하기 수학식 1에 의한 황색 지수 변화량(△YI)을 계산하여 내열 황색 지수를 구하고 하기 표1에 기재하였다.The polyimide film having a thickness of 10 μm obtained in Examples and Comparative Examples was further cured at 445° C. for 30 minutes, and then the film cured for an additional 30 minutes at 445° C. was peeled from the glass substrate, and the size was 2 cm X 10 cm After preparing the sample, the final yellow index (YI f ) was measured using a color meter (Color-Eye 7000A manufactured by GRETAGMACBETH), and the amount of change in yellow index (ΔYI) by Equation 1 below was calculated. The heat-resistant yellow index was obtained and is shown in Table 1 below.
[수학식1][Equation 1]
황색 지수 변화량(△YI) = (실험예2에서 얻어진 최종 황색 지수(YI f)) - (실험예1에서 얻어진 황색 지수(YI 0))Yellow index change amount (△YI) = (final yellow index obtained in Experimental Example 2 (YI f ))-(yellow index obtained in Experimental Example 1 (YI 0 ))
실시예 및 비교예의 실험예 측정 결과Experimental Example Measurement Results of Examples and Comparative Examples
구분division 황색 지수(YI 0)Yellow index (YI 0 ) 최종 황색 지수(YI f)Final yellow index (YI f ) 내열 황색 지수(△YI)Heat-resistant yellow index (△YI)
고온 경화 조건High temperature curing conditions 450 ℃/70분450 ℃/70 minutes 450 ℃/70분 → 410 ℃/60분450 ℃ / 70 minutes → 410 ℃ / 60 minutes 450 ℃/70분 → 410 ℃/60분 → 445 ℃/60분450 ℃ / 70 minutes → 410 ℃ / 60 minutes → 445 ℃ / 60 minutes 450 ℃/70분 → 445 ℃/30분 →445 ℃/30분450 ℃/70 minutes → 445 ℃/30 minutes →445 ℃/30 minutes 450 ℃/70분 → 410 ℃/60분450 ℃ / 70 minutes → 410 ℃ / 60 minutes 450 ℃/70분 → 410 ℃/60분 → 445 ℃/60분450 ℃ / 70 minutes → 410 ℃ / 60 minutes → 445 ℃ / 60 minutes 450 ℃/70분 → 445 ℃/30분 → 445 ℃/30분450 ℃ / 70 minutes → 445 ℃ / 30 minutes → 445 ℃ / 30 minutes
실시예1Example 1 8.88.8 9.59.5 11.311.3 8.78.7 0.70.7 2.52.5 -0.1-0.1
실시예2Example 2 12.112.1 12.012.0 13.313.3 15.315.3 -0.1-0.1 1.21.2 3.23.2
실시예3Example 3 14.114.1 14.814.8 16.216.2 17.617.6 0.70.7 2.12.1 3.53.5
비교예1Comparative Example 1 16.816.8 24.624.6 39.839.8 21.321.3 4.54.5 7.87.8 23.023.0
비교예2Comparative Example 2 15.215.2 22.522.5 40.740.7 21.121.1 5.95.9 7.37.3 25.525.5
비교예3Comparative Example 3 15.915.9 23.923.9 42.542.5 22.522.5 6.66.6 8.08.0 26.626.6
상기 표1에 나타난 바와 같이, 450 ℃에서 70분간의 경화공정을 통해 얻어진 실시예1 내지 3의 폴리이미드계 수지 필름은 8.8 이상 14.1 이하의 황색 지수(YI 0)를 나타내었다.반면, 450 ℃에서 70분간의 경화공정을 통해 얻어진 비교예1 내지 3의 폴리이미드계 수지 필름은 실시예에 비해 훨씬 높은 15.2 이상 16.8 이하의 황색 지수(YI 0)를 나타내었다.이를 통해, 실시예의 폴리이미드계 수지 필름은 400 ℃ 이상의 고온 경화시에도 우수한 광학물성을 가질 수 있음을 확인할 수 있었다.As shown in Table 1, the polyimide resin films of Examples 1 to 3 obtained through a curing process at 450°C for 70 minutes exhibited a yellow index (YI 0 ) of 8.8 or more and 14.1 or less. The polyimide resin films of Comparative Examples 1 to 3 obtained through the curing process at 70 minutes exhibited a yellow index (YI 0 ) of 15.2 or more and 16.8 or less, which is much higher than in Examples. Through this, the polyimide system of Examples It was confirmed that the resin film can have excellent optical properties even when curing at a high temperature of 400°C or higher.
또한, 실시예1 내지 3의 폴리이미드계 수지 필름은 400 ℃ 이상의 고온으로 추가적인 열처리를 진행하더라도, -0.2 이상 3.5 이하의 내열 황색 지수(△YI), 또는 0.1 이상 3.5 이하의 황색 지수 변화량(△YI)의 절대값을 나타내었다.In addition, the polyimide-based resin films of Examples 1 to 3 are heat resistant yellow index (△YI) of -0.2 or more and 3.5 or less, or yellow index change amount of 0.1 or more and 3.5 or less (△) YI).
반면, 비교예1 내지 3의 폴리이미드계 수지 필름은 400 ℃ 이상의 고온으로 추가적인 열처리를 진행한 경우, 실시예에 비해 훨씬 높은 4.5 이상 26.6 이하의 내열 황색 지수(△YI), 또는 4.5 이상 26.6 이하의 황색 지수 변화량(△YI)의 절대값을 나타내었다.On the other hand, when the polyimide-based resin films of Comparative Examples 1 to 3 were subjected to additional heat treatment at a high temperature of 400° C. or higher, heat resistance yellow index (ΔYI) of 4.5 or more and 26.6 or less, or 4.5 or more and 26.6 or less, which is much higher than in Examples. The absolute value of the yellow index change amount (ΔYI) was shown.
이를 통해, 실시예의 폴리이미드계 수지 필름은 필름에 대해 추가적인 400 ℃ 이상의 고온 열처리에도 광학물성이 안정적으로 유지될 수 있음을 확인할 수 있었다.Through this, it was confirmed that the optical properties of the polyimide-based resin film of the embodiment can be stably maintained even at a high temperature heat treatment of 400° C. or higher for the film.

Claims (18)

  1. 하기 화학식1로 표시되는 폴리이미드 반복단위를 포함한 폴리이미드계 수지를 포함하고,A polyimide-based resin comprising a polyimide repeating unit represented by the following Chemical Formula 1,
    하기 수학식1에 의해 얻어지는 황색 지수 변화량(△YI)의 절대값이 4 이하인, 폴리이미드계 수지 필름: A polyimide-based resin film having an absolute value of the yellow index change amount (ΔYI) obtained by Equation 1 below 4 or less:
    [화학식 1][Formula 1]
    Figure PCTKR2020001263-appb-img-000020
    Figure PCTKR2020001263-appb-img-000020
    상기 화학식1에서,In Chemical Formula 1,
    X 1은 하기 화학식2로 표시되는 4가의 작용기이며,X 1 is a tetravalent functional group represented by the following formula (2),
    Y 1은 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기이고,Y 1 is an aromatic divalent functional group having 15 or more carbon atoms substituted with at least one electron withdrawing functional group,
    [화학식2][Formula 2]
    Figure PCTKR2020001263-appb-img-000021
    Figure PCTKR2020001263-appb-img-000021
    상기 화학식2에서, Ar은 다중고리 방향족 2가 작용기이고,In Chemical Formula 2, Ar is a polycyclic aromatic divalent functional group,
    [수학식1][Equation 1]
    황색 지수 변화량(△YI) = YI f - YI 0 Yellow index change (△YI) = YI f- YI 0
    상기 수학식1에서, In Equation 1,
    YI f는, 상기 폴리이미드계 수지 필름을 400 ℃ 내지 450 ℃온도에서 130분 내지 200분간 열처리한 이후 얻어지는 필름의 최종 황색 지수 이고,YI f is the final yellow index of the film obtained after heat treatment of the polyimide resin film at a temperature of 400°C to 450°C for 130 minutes to 200 minutes,
    YI 0는, 상기 열처리 전의 폴리이미드계 수지 필름의 황색 지수 이다.YI 0 is the yellow index of the polyimide-based resin film before the heat treatment.
  2. 제1항에 있어서,According to claim 1,
    상기 수학식1에 의해 얻어지는 황색 지수 변화량(△YI)의 절대값이 3.5 이하인, 폴리이미드계 수지 필름.A polyimide-based resin film having an absolute value of the amount of change in yellow index (ΔYI) obtained by Equation 1 below 3.5.
  3. 제1항에 있어서,According to claim 1,
    상기 열처리 전의 폴리이미드계 수지 필름의 황색 지수가 15 이하인, 폴리이미드계 수지 필름.The polyimide-based resin film having a yellow index of 15 or less of the polyimide-based resin film before the heat treatment.
  4. 제1항에 있어서,According to claim 1,
    상기 폴리이미드계 수지 필름의 최종 황색 지수가 20 이하인, 폴리이미드계 수지 필름.The polyimide-based resin film having a final yellow index of 20 or less of the polyimide-based resin film.
  5. 제1항에 있어서,According to claim 1,
    상기 화학식2의 Ar에서, 다중고리 방향족 2가 작용기는 In Ar of Formula 2, a polycyclic aromatic divalent functional group
    적어도 2이상의 방향족 고리 화합물이 함유된 접합 고리형 2가 작용기를 포함하는, 폴리이미드계 수지 필름.A polyimide-based resin film comprising a fused cyclic divalent functional group containing at least two aromatic cyclic compounds.
  6. 제1항에 있어서,According to claim 1,
    상기 화학식2의 Ar에서, 다중고리 방향족 2가 작용기는 플루오레닐렌기를 포함하는, 폴리이미드계 수지 필름.In Ar of Formula 2, the polycyclic aromatic divalent functional group comprises a fluorenylene group, a polyimide-based resin film.
  7. 제1항에 있어서,According to claim 1,
    상기 화학식2로 표시되는 4가의 작용기는 하기 화학식2-1로 표시되는 작용기를 포함하는, 폴리이미드계 수지 필름:The tetravalent functional group represented by Chemical Formula 2 includes a functional group represented by Chemical Formula 2-1, and a polyimide-based resin film:
    [화학식 2-1][Formula 2-1]
    Figure PCTKR2020001263-appb-img-000022
    .
    Figure PCTKR2020001263-appb-img-000022
    .
  8. 제1항에 있어서,According to claim 1,
    상기 Y 1에서 탄소수 15 이상의 방향족 2가 작용기는 방향족 고리화합물을 3개 이상 포함하는, 폴리이미드계 수지 필름.A polyimide-based resin film, wherein the aromatic divalent functional group having 15 or more carbon atoms in Y 1 includes three or more aromatic cyclic compounds.
  9. 제8항에 있어서,The method of claim 8,
    상기 탄소수 15 이상의 방향족 2가 작용기는 트리페닐렌기, 쿼터페닐렌기, 및 펜터페닐렌기로 이루어진 군에서 선택된 1종 이상을 포함하는, 폴리이미드계 수지 필름.The aromatic divalent functional group having 15 or more carbon atoms includes at least one member selected from the group consisting of a triphenylene group, a quaterphenylene group, and a pentaphenylene group, and a polyimide resin film.
  10. 제1항에 있어서,According to claim 1,
    상기 전자끌개 작용기는 할로알킬기, 할로겐기, 시아노기, 니트로기, 술폰산기, 카보닐기 및 술포닐기로 이루어진 군에서 선택된 1종 이상을 포함하는, 폴리이미드계 수지 필름.The electron withdrawing functional group includes at least one selected from the group consisting of haloalkyl groups, halogen groups, cyano groups, nitro groups, sulfonic acid groups, carbonyl groups and sulfonyl groups, polyimide-based resin film.
  11. 제1항에 있어서,According to claim 1,
    상기 Y 1의 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기는 하기 화학식3으로 표시되는 작용기를 포함하는, 폴리이미드계 수지 필름:The aromatic divalent functional group having 15 or more carbon atoms in which the electron withdrawing functional group of Y 1 is substituted by at least 1, includes a functional group represented by the following Chemical Formula 3:
    [화학식 3][Formula 3]
    Figure PCTKR2020001263-appb-img-000023
    Figure PCTKR2020001263-appb-img-000023
    상기 화학식3에서, In Chemical Formula 3,
    T 1 내지 T 3는 서로 동일하거나 상이하며, 각각 독립적으로 전자끌개 작용기이며,T 1 to T 3 are the same or different from each other, each independently an electron withdrawing group,
    m1 내지 m3는 서로 동일하거나 상이하며, m1 내지 m3 중 적어도 하나는 1 내지 4의 정수이고, 나머지는 0 내지 4의 정수이고,m1 to m3 are the same as or different from each other, at least one of m1 to m3 is an integer from 1 to 4, and the other is an integer from 0 to 4,
    n은 1 내지 10의 정수이다.n is an integer from 1 to 10.
  12. 제1항에 있어서,According to claim 1,
    상기 Y 1의 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기는 하기 화학식3-1로 표시되는 작용기를 포함하는, 폴리이미드계 수지 필름:A polyimide-based resin film comprising a functional group represented by the following Chemical Formula 3-1, wherein the aromatic divalent functional group having 15 or more carbon atoms in which the electron withdrawing functional group of Y 1 is substituted by at least one or more:
    [화학식 3-1][Formula 3-1]
    Figure PCTKR2020001263-appb-img-000024
    .
    Figure PCTKR2020001263-appb-img-000024
    .
  13. 제1항에 있어서,According to claim 1,
    상기 폴리이미드계 수지는 하기 화학식4로 표시되는 테트라카르복시산 이무수물 및 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 디아민의 결합물을 포함하는, 폴리이미드계 수지 필름:The polyimide-based resin comprises a combination of a tetracarboxylic acid dianhydride represented by the following Chemical Formula 4 and an aromatic diamine having 15 or more carbon atoms substituted with at least one electron withdrawing functional group, a polyimide-based resin film:
    [화학식4][Formula 4]
    Figure PCTKR2020001263-appb-img-000025
    Figure PCTKR2020001263-appb-img-000025
    상기 화학식4에서, Ar '는 다중고리 방향족 2가 작용기이다.In the above formula (4), Ar' is a polycyclic aromatic divalent functional group.
  14. 제1항에 있어서,According to claim 1,
    상기 폴리이미드계 수지는 하기 화학식 5로 표시되는 폴리이미드 반복단위를 더 포함하는, 폴리이미드계 수지 필름:The polyimide-based resin further includes a polyimide repeating unit represented by Chemical Formula 5, a polyimide-based resin film:
    [화학식 5][Formula 5]
    Figure PCTKR2020001263-appb-img-000026
    Figure PCTKR2020001263-appb-img-000026
    상기 화학식 5 에서, In Chemical Formula 5,
    X 2는 하기 화학식6으로 표시되는 4가의 작용기중 하나이고,X 2 is one of the tetravalent functional groups represented by the following formula (6),
    Y 2은 전자끌개 작용기가 적어도 1이상 치환된 탄소수 15 이상의 방향족 2가 작용기이고,Y 2 is an aromatic divalent functional group having 15 or more carbon atoms substituted with at least one electron withdrawing functional group,
    [화학식6][Formula 6]
    Figure PCTKR2020001263-appb-img-000027
    Figure PCTKR2020001263-appb-img-000027
    상기 화학식 6에서, R 1 내지 R 6은 각각 독립적으로 수소 또는 탄소수 1 내지 6의 알킬기이고, L는 단일결합, -O-, -CO-, -COO-, -S-, -SO-, -SO 2-, -CR 7R 8-, -(CH 2) t-, -O(CH 2) tO-, -COO(CH 2) tOCO-, -CONH-, 페닐렌 또는 이들의 조합으로 이루어진 군에서 선택된 어느 하나이며, 상기에서 R 7 및 R 8는 각각 독립적으로 수소, 탄소수 1 내지 10의 알킬기, 또는 탄소수 1 내지 10의 할로 알킬기 중 하나이고, t는 1 내지 10의 정수이다.In Formula 6, R 1 to R 6 are each independently hydrogen or an alkyl group having 1 to 6 carbon atoms, and L is a single bond, -O-, -CO-, -COO-, -S-, -SO-,- SO 2 -, -CR 7 R 8 -, -(CH 2 ) t -, -O(CH 2 ) t O-, -COO(CH 2 ) t OCO-, -CONH-, phenylene or combinations thereof Any one selected from the group consisting of, wherein R 7 and R 8 are each independently hydrogen, an alkyl group having 1 to 10 carbon atoms, or a halo alkyl group having 1 to 10 carbon atoms, and t is an integer of 1 to 10.
  15. 제14항에 있어서,The method of claim 14,
    상기 화학식 5로 표시되는 폴리이미드 반복단위와 화학식 1로 표시되는 폴리이미드 반복단위는 폴리이미드계 수지에 함유된 전체 반복단위 대비 70몰% 이상으로 함유되는, 폴리이미드계 수지 필름.The polyimide repeating unit represented by Chemical Formula 5 and the polyimide repeating unit represented by Chemical Formula 1 contain 70 mol% or more of the total repeating units contained in the polyimide resin, and the polyimide resin film.
  16. 제1항에 있어서,According to claim 1,
    상기 폴리이미드계 수지 필름은 상기 폴리이미드계 수지가 400 ℃ 이상의 온도에서 경화된 경화물을 포함하는, 폴리이미드계 수지 필름.The polyimide-based resin film, the polyimide-based resin film containing a cured product cured at a temperature of 400 °C or higher.
  17. 제1항의 폴리이미드계 수지 필름을 포함하는, 디스플레이 장치용 기판.A substrate for a display device comprising the polyimide-based resin film of claim 1.
  18. 제1항의 폴리이미드계 수지 필름을 포함하는, 광학 장치.An optical device comprising the polyimide-based resin film of claim 1.
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