WO2017111300A1 - Polyamic acid solution to which diamine monomer having novel structure is applied, and polyimide film comprising same - Google Patents

Polyamic acid solution to which diamine monomer having novel structure is applied, and polyimide film comprising same Download PDF

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WO2017111300A1
WO2017111300A1 PCT/KR2016/012829 KR2016012829W WO2017111300A1 WO 2017111300 A1 WO2017111300 A1 WO 2017111300A1 KR 2016012829 W KR2016012829 W KR 2016012829W WO 2017111300 A1 WO2017111300 A1 WO 2017111300A1
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diamine
mol
compound
polyamic acid
polyimide film
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PCT/KR2016/012829
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French (fr)
Korean (ko)
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안경일
김동연
이재훈
김선영
오현석
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주식회사 두산
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Priority to CN201680075839.9A priority Critical patent/CN108431088B/en
Priority to JP2018533188A priority patent/JP6899830B2/en
Publication of WO2017111300A1 publication Critical patent/WO2017111300A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00Compounds containing amino groups bound to a carbon skeleton
    • C07C211/43Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00Compounds containing amino groups bound to a carbon skeleton
    • C07C211/43Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C07C211/44Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Definitions

  • the present invention relates to a diamine monomer having a novel structure, a polyamic acid composition for producing a transparent polyimide resin including such a diamine monomer, and a transparent polyimide resin prepared from the composition and applicable to a flexible display substrate or a protective film.
  • a transparent plastic substrate manufactured by film-forming a polymer resin such as polyethylene terephthalate (PET) or polyether sulfone (PES) has been developed.
  • the transparent plastic substrate using a polymer resin such as PET or PES has a good ductility compared to the glass substrate, but has a low heat resistance because the glass transition temperature (Tg) is low.
  • Tg glass transition temperature
  • CTE coefficient of thermal expansion
  • a technique for producing a transparent plastic substrate using a polyimide resin having excellent heat resistance and a relatively low coefficient of thermal expansion has attracted attention.
  • Polyimide resin (PI) has a limitation in showing high transparency like a glass substrate because it is colored in brown or yellow due to the effect of a charge transfer complex (CTC) and thus has low transmittance in the visible region. . Therefore, a lot of research is in progress to solve this problem.
  • a polyimide (PI) resin refers to a high heat-resistant resin prepared by solution polymerization of an aromatic acid dianhydride and an aromatic diamine or an aromatic diisocyanate to produce a polyamic acid derivative, and then imidization by ring closure dehydration at a high temperature.
  • pyromellitic dianhydride (PMDA) or biphenyltetracarboxylic dianhydride (BPDA) is used, and as the aromatic diamine component, oxydianiline (ODA) ), p-phenylene diamine (p-PDA), m-methylene diamine (m-MDA), methylene diamine (MDA), bisaminophenylhexafluoropropane (HFDA), etc.
  • ODA oxydianiline
  • p-PDA p-phenylene diamine
  • m-MDA m-methylene diamine
  • MDA methylene diamine
  • HFDA bisaminophenylhexafluoropropane
  • the acid dianhydride or diamine component has a trade-off relationship between optical properties, thermal properties, and mechanical properties, it is necessary to develop a compound of a component suitable for each property, that is, a monomer for transparent PI. Accordingly, development of a transparent polyamic acid composition for a flexible display having high transparency, excellent heat resistance, low thermal expansion coefficient, and excellent mechanical properties is required.
  • the present invention is directed to the introduction of a monomer having a specific chemical structure and substituents improve the optical, mechanical and thermal properties compared to the conventional.
  • a polyimide resin having high transparency, excellent mechanical and thermal properties it is judged to be effective to introduce a rigid chemical monomer, and a diamine monomer derivative having a specific chemical structure Designed and synthesized, by adjusting the content of the new diamine monomer synthesized in a specific range, a transparent polyamic acid composition and a polyimide film that can simultaneously implement a low YI (high Yellow Index), high light transmittance, mechanical and thermal properties For the purpose of manufacturing.
  • YI high Yellow Index
  • the present invention is a transparent polyamic acid applicable to a plastic transparent substrate, a TFT substrate, a flexible printed circuit board, a flexible OLED surface lighting substrate, and an electronic paper substrate material for LCD and OLED flexible displays. It is to provide a composition and a transparent polyimide film.
  • the present invention provides a compound represented by the following formula (1).
  • Y is a C 6 ⁇ C 40 arylene group, the C 6 ⁇ C 40 arylene group may be substituted with a halogen or a C 1 ⁇ C 6 alkyl group substituted with a halogen atom,
  • X 1 and X 2 are the same or different, are each independently selected from hydrogen, halogen, the group consisting of an alkyl group of C 1 ⁇ C 6 alkyl, and C 1 ⁇ in which one or more hydrogen substituted with halogen atoms C 6, the Provided that at least one of X 1 , X 2 and Y has a halogen or a C 1 to C 6 alkyl group substituted with a halogen atom,
  • n is an integer of 0-3.
  • each of X 1 and X 2 is an electron-withdrawing group (EWG) which is independently F or CF 3 .
  • EWG electron-withdrawing group
  • the present invention (a) a diamine containing a compound of the formula (1); (b) acid dianhydrides; And (c) an organic solvent, wherein the compound represented by Chemical Formula 1 provides a polyamic acid composition that is included in the range of 10 to 90 mol% based on 100 mol% of the total diamine.
  • the diamine is fluorinated first diamine; It may further comprise one or more selected from the group consisting of sulfone-based second diamine, hydroxy-based third diamine, ether-based fourth diamine and alicyclic fifth diamine.
  • the content of the fluorinated first diamine, sulfone-based second diamine, hydroxy-based third diamine, ether-based fourth diamine and cycloaliphatic fifth diamine are each 10 to 90 mol based on 100 mol% total diamine May be%.
  • the acid dianhydride may include one or more selected from the group consisting of fluorinated aromatic first acid dianhydride, alicyclic diacid dianhydride and non-fluorinated aromatic tertiary dianhydride.
  • the content of the at least one compound selected from the group consisting of the first acid dianhydride, the second acid dianhydride and the third acid dianhydride may be in the range of 10 to 100 mol% based on 100 mol% of the total acid dianhydride.
  • the ratio (a / b) of the number of moles of the diamine (a) and the acid dianhydride (b) may range from 0.7 to 1.3.
  • the present invention provides a transparent polyimide film prepared by imidizing the polyamic acid composition described above.
  • the transparent polyimide film may satisfy the physical property conditions of the following (i) to (v), more specifically (i) the glass transition temperature (Tg) is 320 to 400 °C range, (ii ) The light transmittance of wavelength 550nm is 88% or more based on film thickness of 50 ⁇ m, (iii) Yellowness is 4.0 or less according to ASTM E313 standard, (iv) Tensile strength is 110 MPa or more, and (v) Tensile modulus is May be at least 3.5 GPa.
  • Tg glass transition temperature
  • iii Yellowness is 4.0 or less according to ASTM E313 standard
  • Tensile strength is 110 MPa or more
  • Tensile modulus is May be at least 3.5 GPa.
  • the transparent imide film may be used as a substrate and / or protective film for a flexible display.
  • a polyamic acid composition having excellent optical properties, mechanical properties, thermal properties, etc. by adopting a diamine monomer having a specific structure and a substituent and adjusting the weight percentage thereof.
  • the polyamic acid composition having excellent optical properties, mechanical properties, thermal properties and the like as a substrate, it is possible to provide a flexible display substrate exhibiting excellent physical properties and product reliability.
  • the present invention provides a compound represented by Chemical Formula 1, preferably a diamine compound.
  • Y is a C 6 ⁇ C 40 arylene group, the C 6 ⁇ C 40 arylene group may be substituted with a halogen or a C 1 ⁇ C 6 alkyl group substituted with a halogen atom,
  • X 1 and X 2 are the same or different, are each independently selected from hydrogen, halogen, the group consisting of an alkyl group of C 1 ⁇ C 6 alkyl, and C 1 ⁇ in which one or more hydrogen substituted with halogen atoms C 6, the Provided that at least one of X 1 , X 2 and Y has a halogen or a C 1 to C 6 alkyl group substituted with a halogen atom,
  • n is an integer of 0-3.
  • the compound represented by Formula 1 is a conventional 2,2'-bis (trifluoromethyl) -4,4'- diaminobiphenyl (2,2'-Bis (trifluoromethyl) -4,4'- Basic structure is similar to Diaminobiphenyl (hereinafter referred to as TFDB), but has a more rigid structure as a divalent arylene linker is introduced between the diamine-substituted moieties in the compound. . Therefore, since it is not decomposed by heat or light and is more stable against external impact, optical properties, thermal properties, and mechanical properties (Modulus, Strength) of the polyamic acid composition including the same may be significantly improved.
  • TFDB Diaminobiphenyl
  • the polyimide film is dark brown rather than colorless because of the Charge Transfer Complex (CTC) of ⁇ electrons present in the imide chain. Since -F, -CF 3 and the like introduced in Chemical Formula 1 are strong electron withdrawing groups, the CT-Complex does not occur through the movement between ⁇ electrons, thereby exhibiting high transparency of polyimide.
  • EWG electron-withdrawing group
  • CTC Charge Transfer Complex
  • X 1 and X 2 may be a conventional electron withdrawing group (EWG) known in the art, each independently fluorine (F) or CF 3 It is preferred.
  • EWG electron withdrawing group
  • the Y may be a conventional C 6 ⁇ C 40 arylene group known in the art, specific examples thereof include phenylene, biphenylene, triphenylenyl and the like.
  • the Y is preferably selected from the group of substituents represented by the following formula.
  • R 1 to R 3 are the same as or different from each other, and are each independently selected from the group consisting of hydrogen, F, and CF 3 .
  • R 1 to R 3 are each independently F or CF 3 .
  • the compound represented by Formula 1 according to the present invention may be more specific to any one of a compound group consisting of Compound 1 to Compound 26, but is not particularly limited thereto.
  • the transparent polyamic acid composition of the present invention is for producing a transparent polyimide film, characterized in that it comprises a compound represented by the formula (1) as a diamine (diamine) component.
  • the polyamic acid composition comprises (a) a diamine containing the compound of Formula 1; (b) acid dianhydrides; And (c) an organic solvent.
  • the diamine (a) monomer used in the preparation of the transparent polyamic acid of the present invention may include a compound represented by Chemical Formula 1, and may be mixed with a conventional diamine compound known in the art.
  • the amount of the diamine monomer represented by Chemical Formula 1 is not particularly limited, and may be, for example, in the range of 10 to 90 mol% based on 100 mol% of the total acid dianhydride, and preferably in the range of 20 to 80 mol%. .
  • the diamine compound mixed with the compound of Formula 1 may be used without particular limitation as long as the compound has a diamine structure in the molecule.
  • An example is an aromatic, alicyclic, or aliphatic compound having a diamine structure.
  • Diamines usable in the present invention include optical properties such as high transmittance, low Y.I, low haze, and the like; Thermal properties such as high glass transition temperature (High Tg) and low coefficient of thermal expansion (Low CTE); Considering mechanical properties such as high modulus and high surface hardness, linear structures having fluorinated substituents or sulfone based, hydroxy based, ether based, etc. Appropriate combinations of structures to include are required. Accordingly, in the present invention, as the diamine compound, fluorinated aromatic first diamine, sulphonated second diamine, hydroxy third diamine, ether fourth diamine and alicyclic fifth diamine each having a fluorine substituent introduced therein alone. It may be used or in a form in which two or more thereof are mixed.
  • Non-limiting examples of diamine monomer (a) that can be used include oxydianiline (ODA), 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB ), 2,2'-bis (trifluoromethyl) -4,3'-diaminobiphenyl (2,2'-Bis (trifluoromethyl) -4,3'-Diaminobiphenyl), 2,2'-bis ( Trifluoromethyl) -5,5'-diaminobiphenyl (2,2'-Bis (trifluoromethyl) -5,5'-Diaminobiphenyl), 2,2'-bis (trifluoromethyl) -4,4 '-Diaminophenyl ether (2,2'-Bis (trifluoromethyl) -4,4'-diaminodiphenyl ether, 6-FODA), bis aminohydroxy phenyl hexafluoropropane (DBOH), bis amino
  • the fluorinated first diamine is a 2,2'-bis (trifluoromethyl) -4,4'-dia which may lead to linear polymerisation.
  • Preference is given to using minobiphenyl (2,2'-TFDB).
  • the hydroxy tertiary diamine is 2,2-bis (3-amino-4-methylphenyl) -hexafluoropropane (2,2-Bis (3-amino-4-methylphenyl) -hexafluoropropane, BIS-AT- AF) is preferred.
  • BIS-AT- AF 2,2-bis (3-amino-4-methylphenyl) -hexafluoropropane
  • the content of the fluorinated first diamine, sulfonated second diamine, hydroxy third diamine, ether fourth diamine, alicyclic fifth diamine, and the like are not particularly limited. It may be 10 to 90 mol% based on 100 mol% of the total diamine, preferably in the range of 20 to 80 mol%.
  • Acid dianhydride (b) monomers used in the preparation of the transparent polyamic acid of the present invention can be used without limitation, acid dianhydrides such as fluorinated, non-fluorinated, alicyclic and the like known in the art having an acid dianhydride structure in the molecule.
  • acid dianhydrides such as fluorinated, non-fluorinated, alicyclic and the like known in the art having an acid dianhydride structure in the molecule.
  • the fluorinated first acid dianhydride, alicyclic diacid dianhydride, and non-fluorinated triacid dianhydride may be used alone or in a mixed form of two or more thereof.
  • the fluorinated first acid dianhydride monomer is not particularly limited as long as it is an aromatic acid dianhydride into which a fluorine substituent is introduced.
  • fluorinated first dianhydrides examples include 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride (2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydrid, 6-FDA), 4- (trifluoromethyl) pyromellitic dianhydride (4- (trifluoromethyl) pyromellitic dianhydride, 4-TFPMDA). These may be used alone or in combination of two or more thereof.
  • 6-FDA is a very suitable compound for clearing due to its very high property of limiting the formation of change transfer complexes (CTCs) between and within molecular chains.
  • the alicyclic diacid dianhydride that can be used in the present invention is not particularly limited as long as it is a compound having an acid dianhydride structure having an alicyclic ring instead of an aromatic ring in the compound.
  • Examples of the alicyclic second dianhydride usable in the present invention include cyclobutane tetracarboxylic dianhydride (CBDA), 1,2,3,4-cyclopentane tetracarboxylic dianhydride (CPDA) , Bicyclo [2,2,2] -7-octene-2,3,5,6-tetracarboxylic dianhydride (BCDA), or mixtures of one or more thereof, but are not particularly limited thereto. .
  • CBDA cyclobutane tetracarboxylic dianhydride
  • CPDA 1,2,3,4-cyclopentane tetracarboxylic dianhydride
  • BCDA Bicyclo [2,2,2] -7-octene-2,3,5,6-tetracarboxylic dianhydride
  • the non-fluorinated tertiary acid dianhydride monomer is not particularly limited as long as it is a non-fluorinated aromatic acid dianhydride to which a fluorine substituent is not introduced.
  • Non-limiting examples of non-fluorinated tertiary dianhydride monomers that can be used include pyromellitic dianhydride (PMDA), 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (3, 3 ′, 4,4′-Biphenyl tetracarboxylic acid dianhydride (BPDA). These may be used alone or in combination of two or more thereof.
  • PMDA pyromellitic dianhydride
  • BPDA 4,4'-biphenyltetracarboxylic acid dianhydride
  • the content of at least one compound selected from the group consisting of the first acid dianhydride, the second acid dianhydride and the third acid dianhydride is not particularly limited. In one example, they may each range from 10 to 100 mole percent, based on 100 mole percent total acid dianhydride, preferably in the range from 10 to 90 mole percent, more preferably 20 to 80 mole percent.
  • the ratio thereof when the fluorinated first acid dianhydride and the non-fluorinated third acid dianhydride are mixed as the acid dianhydride (b), the ratio thereof may be 40 to 90: 60 to 10 mol%.
  • the ratio thereof when the fluorinated first acid dianhydride and alicyclic second acid dianhydride are mixed as the acid dianhydride (b), the ratio thereof may be 30 to 70:70 to 30 mol%. have.
  • the ratio of their use is 40 to 90: 60 to 10 mol% ratio. Can be.
  • the ratio (a / b) of the number of moles of the diamine component (a) to the number of moles of the dianhydride component (b) may be 0.7 to 1.3, preferably 0.8 to 1.2. And more preferably 0.9 to 1.1.
  • the solvent (c) for solution polymerization of the aforementioned monomers included in the polyamic acid composition of the present invention may use any organic solvent known in the art without limitation.
  • solvents examples include m-cresol, N-methyl-2-pyrrolidone (NMP), dimethylformamide (DMF), dimethylacetamide (DMAc), dimethyl sulfoxide (DMSO), acetone, diethyl
  • NMP N-methyl-2-pyrrolidone
  • DMF dimethylformamide
  • DMAc dimethylacetamide
  • DMSO dimethyl sulfoxide
  • acetone diethyl
  • polar solvents selected from acetate, and dimethyl phthalate (DMP) can be used.
  • low boiling point solutions such as tetrahydrofuran (THF), chloroform or low absorbing solvents such as ⁇ -butyrolactone may be used.
  • the content of the solvent is not particularly limited, but in order to obtain an appropriate molecular weight and viscosity of the polyamic acid solution, the content of the solvent for polymerization (the first solvent) may range from 50 to 95 wt% based on the total weight of the polyamic acid composition. It is preferably in the range of 70 to 90% by weight, more preferably in the range of 75 to 85% by weight.
  • the polyamic acid composition of the present invention may be prepared by adding the above-described acid dianhydride and diamine into an organic solvent and reacting.
  • the diamine of Formula 1 at least one or more diamine components of the first to fifth diamine, and acid dianhydride, diamine (a) and acid dianhydride (b) to improve the glass transition temperature and yellowness Transparent polyamic acid compositions can be formed with an equivalent ratio of approximately 1: 1.
  • the composition of the polyamic acid composition is not particularly limited, and for example, based on 100% by weight of the total weight of the polyamic acid composition, 2.5 to 25.0% by weight of the acid dianhydride, 2.5 to 25.0% by weight of diamine, and the remaining amount to satisfy 100% by weight of the composition It may be configured to include an organic solvent of. In one example, the content of the organic solvent may be 75 to 85% by weight. Meanwhile, in the composition of the polyamic acid composition according to the present invention, based on 100% by weight of solids, the acid dianhydride may be in the range of 30 to 70% by weight, and diamine 30 to 70% by weight. However, this is not particularly limited.
  • Such transparent polyamic acid compositions of the present invention may have a viscosity in the range of about 1,000 to 50,000 cps, preferably about 3,000 to 15,000 cps.
  • the viscosity of the polyamic acid solution falls within the above-described range, the thickness of the polyamic acid solution may be easily adjusted when the solution is coated, and the coating surface may be uniformly exhibited.
  • the polyamic acid solution of the present invention may contain a small amount of additives such as plasticizers, antioxidants, flame retardants, dispersants, viscosity regulators, leveling agents and the like within the range that does not significantly impair the object and effect of the present invention if necessary. .
  • the present invention provides a polyimide film prepared by imidizing and heat treating the polyamic acid solution described above at high temperature.
  • the polyimide resin is a polymer material containing an imide ring, and is excellent in heat resistance, chemical resistance, abrasion resistance, and electrical properties.
  • the polyimide resin may be in the form of a random copolymer or a block copolymer.
  • a polyimide resin film in order to apply a polyimide resin film to a flexible display, it should basically have characteristics such as high transparency, low thermal expansion coefficient, and high glass transition temperature. More specifically, a light transmittance of 550 nm is 90% or more based on a film thickness of 10 ⁇ m, a yellowness value of 550 nm is 3 or less, a glass transition temperature (Tg) of 300 ° C. or more is required.
  • the polyimide film of the present invention prepared by imidizing the polyamic acid composition described above has a rigid chemical structure in a repeating unit and exhibits high transparency while having low yellowness, thermal expansion coefficient, and high glass transition temperature. (Tg), high tensile strength and elastic modulus.
  • the polyimide film has a physical property condition of the following (i) to (v), such as (i) the glass transition temperature (T g ) is in the range of 320 to 400 °C, (ii) the film thickness 50 ⁇ m reference
  • T g glass transition temperature
  • the film thickness 50 ⁇ m reference The light transmittance of 500 nm is 88% or more, (iii) the yellowness according to ASTM E313 standard is 4.0 or less (50 micrometers basis), (iv) tensile strength is 110-150 MPa, (v) tensile elasticity modulus is 3.5-
  • the 5.0 GPa range can all be met.
  • the polyimide film according to the present invention may be prepared by exothermic solution polymerization of a transparent polyamic acid solution according to conventional methods known in the art.
  • the transparent polyamic acid composition may be prepared by coating (casting) a glass substrate and inducing an imide cyclization reaction (Imidazation) for 0.5 to 8 hours while gradually raising the temperature in the range of 30 to 350 ° C. It is preferable to react in inert atmosphere, such as argon and nitrogen at this time.
  • the coating method may be used without limitation conventional methods known in the art, for example, spin coating (dip coating), dip coating (Dip coating), solvent casting (Solvent casting), slot die coating (Slot die coating) ) And at least one method selected from the group consisting of spray coating.
  • the colorless transparent polyimide layer may be coated at least once with a transparent polyamic acid composition such that the thickness of the colorless and transparent polyimide layer is several hundreds of micrometers.
  • the thickness of the polyimide film thus formed is not particularly limited and may be appropriately adjusted according to the field to be applied. For example, it may be in the range of 10 to 150 ⁇ m, preferably in the range of 10 to 80 ⁇ m.
  • the transparent polyimide film manufactured as described above may be used in various fields, and particularly, displays for organic EL devices (OLEDs), displays for liquid crystal devices, TFT substrates, flexible printed circuit boards that require high transparency and heat resistance. It can be used as a flexible display substrate and a protective film such as a flexible OLED surface lighting substrate, a substrate material for electronic paper.
  • OLEDs organic EL devices
  • TFT substrates TFT substrates
  • flexible printed circuit boards that require high transparency and heat resistance.
  • a protective film such as a flexible OLED surface lighting substrate, a substrate material for electronic paper.
  • CBDA cyclobutane-1,2,3,4-tetracarboxylic dianhydride
  • 6FDA cyclobutane-1,2,3,4-tetracarboxylic dianhydride
  • compositions of the polyamic acid composition prepared in Examples 1 to 20 and Comparative Examples 1 to 6 are as shown in Table 1 below. At this time, mol% represents the mole ratio of each monomer in diamine and the whole acid dianhydride.
  • Measurement was performed using a UV-Vis NIR Spectrophotometer (Shimadzu, model name: UV-3150) at a wavelength of 550 nm.
  • Yellowness was measured according to ASTM E313 using a spectrophotometer (Konica Minolta, model name: CM-3700d).
  • Tensile strength (MPa) and elastic modulus (GPa) were measured according to ISO 527-3 using UTM (Instron, Model Name: 5942).
  • the thickness of the film was measured by a thickness gauge (Mitutoyo, model name: 293-140).
  • Example 1 52 90 3.2 340 129 4.2 Example 2 50 90 2.9 345 144 4.6 Example 3 51 90 3.3 339 128 4.0 Example 4 49 90 3.1 342 141 4.4 Example 5 51 90 2.7 330 137 4.6 Example 6 52 91 2.5 337 142 4.8 Example 7 50 90 2.9 329 140 4.7 Example 8 50 90 2.8 331 144 4.9 Example 9 49 91 2.7 321 127 3.9 Example 10 51 91 2.5 336 132 4.2 Example 11 49 91 2.9 327 129 4.0 Example 12 50 91 2.7 339 136 4.4 Example 13 52 90 2.9 341 133 4.3 Example 14 48 90 2.9 338 129 4.1 Example 15 50 90 3.2 349 128 3.9 Example 16 51 90 3.7 347 124 3.7 Example 17 51 90 2.9 330 135 4.5 Example 18 50 91 2.9 3
  • the polyimide film of the present invention improves the optical, thermal, and mechanical properties of the conventional polyimide film, and the polyimide film is usefully applied as a transparent plastic substrate instead of a glass substrate when manufacturing a flat panel display. It could be confirmed.

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Abstract

The present invention provides: a novel monomer applicable as a diamine component of a polyamic acid; a polyamic acid composition containing the same; and a polyimide prepared from the composition. The polyamic acid composition provided by the present invention, having excellent optical, thermal and mechanical characteristics, can be applied as a flexible display material.

Description

신규 구조의 디아민 모노머를 적용한 폴리아믹산 용액 및 이를 포함하는 폴리이미드 필름Polyamic acid solution to which a diamine monomer of a novel structure is applied and a polyimide film comprising the same
본 발명은 신규 구조의 디아민계 모노머, 이러한 디아민 모노머를 포함하여 투명 폴리이미드 수지를 제조하기 위한 폴리아믹산 조성물 및 상기 조성물로부터 제조되고 플렉서블 디스플레이 기판 또는 보호막으로 적용이 가능한 투명 폴리이미드 수지에 관한 것이다.The present invention relates to a diamine monomer having a novel structure, a polyamic acid composition for producing a transparent polyimide resin including such a diamine monomer, and a transparent polyimide resin prepared from the composition and applicable to a flexible display substrate or a protective film.
플랫 패널 디스플레이(Flat Panel Display, FPD)의 경박화 및 소형화가 진행됨에 따라 플랫 패널 디스플레이 제조시 유리 기판 대신에 투명 플라스틱 기판이 요구되고 있다.As the thinning and miniaturization of flat panel displays (FPDs) proceeds, transparent plastic substrates are required instead of glass substrates in the manufacture of flat panel displays.
이러한 요구에 따라 폴리에틸렌 테레프탈레이트(Polyethylene terephthalate, PET)나 폴리에테르 설폰(Polyether sulfone, PES)과 같은 고분자 수지를 필름화하여 제조된 투명 플라스틱 기판이 개발된 바 있다. 상기 PET 또는 PES와 같은 고분자 수지를 이용한 투명 플라스틱 기판은 유리 기판에 비해 연성이 좋은 반면, 유리전이온도(glass transition temperature, Tg)가 낮기 때문에 내열성이 떨어지는 문제가 있다. 또한 유리 기판에 비해 열팽창 계수(Coefficient of Thermal Expansion, CTE)가 높기 때문에, 디스플레이 제조공정 중 고온에서 이루어지는 공정(예를 들어, 220℃ 이상의 TFT 공정)에 의해 쉽게 변형이 일어나는 문제도 있다.According to such a demand, a transparent plastic substrate manufactured by film-forming a polymer resin such as polyethylene terephthalate (PET) or polyether sulfone (PES) has been developed. The transparent plastic substrate using a polymer resin such as PET or PES has a good ductility compared to the glass substrate, but has a low heat resistance because the glass transition temperature (Tg) is low. In addition, since the coefficient of thermal expansion (CTE) is higher than that of the glass substrate, there is also a problem that deformation is easily caused by a process (for example, a TFT process of 220 ° C or higher) at a high temperature in the display manufacturing process.
한편, 내열성이 우수하여 열팽창계수가 비교적 낮은 폴리이미드 수지를 이용하여 투명 플라스틱 기판을 제조하는 기술이 주목을 받고 있다. 폴리이미드 수지(polyimide resin, PI)는 전하이동착물(CTC: Change transfer complex)에 의한 영향으로 갈색 또는 황색으로 착색되어 가시광선 영역에서의 투과도가 낮기 때문에 유리 기판과 같은 고투명성을 나타내는데 한계가 있다. 따라서 이러한 문제를 해결하기 위한 수많은 연구가 진행 중에 있다. 일반적으로 폴리이미드(PI) 수지는 방향족 산이무수물과 방향족 디아민 또는 방향족 디이소시아네이트를 용액중합하여 폴리아믹산 유도체를 제조한 후, 고온에서 폐환 탈수시켜 이미드화하여 제조되는 고내열 수지를 일컫는다. On the other hand, a technique for producing a transparent plastic substrate using a polyimide resin having excellent heat resistance and a relatively low coefficient of thermal expansion has attracted attention. Polyimide resin (PI) has a limitation in showing high transparency like a glass substrate because it is colored in brown or yellow due to the effect of a charge transfer complex (CTC) and thus has low transmittance in the visible region. . Therefore, a lot of research is in progress to solve this problem. In general, a polyimide (PI) resin refers to a high heat-resistant resin prepared by solution polymerization of an aromatic acid dianhydride and an aromatic diamine or an aromatic diisocyanate to produce a polyamic acid derivative, and then imidization by ring closure dehydration at a high temperature.
상기 폴리이미드 수지를 제조하기 위한 방향족 산이무수물의 성분으로는 피로멜리트산이무수물(PMDA) 또는 비페닐테트라카르복실산이무수물(BPDA) 등을 사용하고 있고, 방향족 디아민 성분으로는 옥시디아닐린(ODA), p-페닐렌 디아민(p-PDA), m-메틸렌 디아민(m-MDA), 메틸렌 디아민(MDA), 비스아미노페닐헥사플로오로프로판(HFDA) 등을 주로 사용하고 있다. 이러한 산이무수물 혹은 디아민 성분은 광학 특성과 열특성, 기계 특성의 연관관계가 trade-off 관계에 있기 때문에, 각 특성에 적합한 성분의 화합물, 즉 투명 PI용 모노머(Monomer)의 개발이 필요한 실정이며, 이에 따라 고투명성을 나타내면서도 내열성이 우수하고 낮은 열팽창 계수와 우수한 기계적 특성을 가지는 플레시블 디스플레이용 투명 폴리아믹산(Polyamic acid) 조성물의 개발이 요구되고 있다.As the component of the aromatic acid dianhydride for producing the polyimide resin, pyromellitic dianhydride (PMDA) or biphenyltetracarboxylic dianhydride (BPDA) is used, and as the aromatic diamine component, oxydianiline (ODA) ), p-phenylene diamine (p-PDA), m-methylene diamine (m-MDA), methylene diamine (MDA), bisaminophenylhexafluoropropane (HFDA), etc. are mainly used. Since the acid dianhydride or diamine component has a trade-off relationship between optical properties, thermal properties, and mechanical properties, it is necessary to develop a compound of a component suitable for each property, that is, a monomer for transparent PI. Accordingly, development of a transparent polyamic acid composition for a flexible display having high transparency, excellent heat resistance, low thermal expansion coefficient, and excellent mechanical properties is required.
본 발명은 특정 화학구조와 치환기를 가진 모노머를 도입하면 광학적인 특성, 기계적 특성 및 열 특성이 기존에 비하여 개선되는 점을 착안하였다. The present invention is directed to the introduction of a monomer having a specific chemical structure and substituents improve the optical, mechanical and thermal properties compared to the conventional.
보다 구체적으로, 본 발명에서는 고투명성, 우수한 기계적, 열적 특성을 가진 폴리이미드 수지를 얻기 위해서 강직한(Rigid)한 화학구조의 모노머를 도입하는 것이 효과적이라 판단하고, 특정 화학구조의 디아민 모노머 유도체를 디자인 및 합성하였으며, 이와 같이 합성된 신규 디아민 모노머의 함량을 특정 범위로 조절함으로써, 낮은 YI(Yellow Index), 높은 광투과도, 기계적, 열적 특성 등을 동시에 구현할 수 있는 투명 폴리아믹산 조성물 및 폴리이미드 필름을 제조하는 것을 목적으로 한다.More specifically, in the present invention, in order to obtain a polyimide resin having high transparency, excellent mechanical and thermal properties, it is judged to be effective to introduce a rigid chemical monomer, and a diamine monomer derivative having a specific chemical structure Designed and synthesized, by adjusting the content of the new diamine monomer synthesized in a specific range, a transparent polyamic acid composition and a polyimide film that can simultaneously implement a low YI (high Yellow Index), high light transmittance, mechanical and thermal properties For the purpose of manufacturing.
아울러, 본 발명은 LCD 및 OLED의 플렉시블(Flexible) 디스플레이용 플라스틱(Plastic) 투명 기판, TFT 기판, 플렉서블 인쇄회로기판, 플렉서블(Flexible) OLED 면조명 기판, 전자 종이용 기판소재 등에 적용 가능한 투명 폴리아믹산 조성물 및 투명 폴리이미드 필름을 제공하는데 있다.In addition, the present invention is a transparent polyamic acid applicable to a plastic transparent substrate, a TFT substrate, a flexible printed circuit board, a flexible OLED surface lighting substrate, and an electronic paper substrate material for LCD and OLED flexible displays. It is to provide a composition and a transparent polyimide film.
상술한 목적을 달성하기 위해, 본 발명은 하기 화학식 1로 표시되는 화합물을 제공한다. In order to achieve the above object, the present invention provides a compound represented by the following formula (1).
Figure PCTKR2016012829-appb-C000001
Figure PCTKR2016012829-appb-C000001
상기 화학식 1에서, In Chemical Formula 1,
Y는 C6~C40의 아릴렌기로서, 상기 C6~C40의 아릴렌기는 할로겐 또는 할로겐 원자로 치환된 C1~C6 알킬기로 치환될 수 있으며, Y is a C 6 ~ C 40 arylene group, the C 6 ~ C 40 arylene group may be substituted with a halogen or a C 1 ~ C 6 alkyl group substituted with a halogen atom,
X1 및 X2은 서로 동일하거나 상이하며, 각각 독립적으로 수소, 할로겐, C1~C6의 알킬기, 및 하나 이상의 수소가 할로겐 원자로 치환된 C1~C6의 알킬기로 이루어진 군에서 선택되며, 다만 X1, X2 및 Y 중 적어도 하나 이상은 할로겐 또는 할로겐 원자로 치환된 C1~C6의 알킬기를 가지며, X 1 and X 2 are the same or different, are each independently selected from hydrogen, halogen, the group consisting of an alkyl group of C 1 ~ C 6 alkyl, and C 1 ~ in which one or more hydrogen substituted with halogen atoms C 6, the Provided that at least one of X 1 , X 2 and Y has a halogen or a C 1 to C 6 alkyl group substituted with a halogen atom,
n은 0 내지 3의 정수이다. n is an integer of 0-3.
본 발명에서, 상기 X1 및 X2는 각각 독립적으로 F, 또는 CF3인 전자흡인성기(EWG)인 것이 바람직하다. In the present invention, it is preferable that each of X 1 and X 2 is an electron-withdrawing group (EWG) which is independently F or CF 3 .
또한 본 발명은 (a) 전술한 화학식 1의 화합물을 함유하는 디아민; (b) 산이무수물; 및 (c) 유기용매를 포함하며, 상기 화학식 1로 표시되는 화합물은 전체 디아민 100 몰%를 기준으로 10 내지 90 몰% 범위로 포함되는 폴리아믹산 조성물을 제공한다. In addition, the present invention (a) a diamine containing a compound of the formula (1); (b) acid dianhydrides; And (c) an organic solvent, wherein the compound represented by Chemical Formula 1 provides a polyamic acid composition that is included in the range of 10 to 90 mol% based on 100 mol% of the total diamine.
본 발명에서, 상기 디아민은 불소화 제1디아민; 설폰계 제2디아민, 히드록시계 제3디아민, 에테르계 제4디아민 및 지환족 제5디아민으로 구성된 군으로부터 선택되는 1종 이상을 더 포함할 수 있다. In the present invention, the diamine is fluorinated first diamine; It may further comprise one or more selected from the group consisting of sulfone-based second diamine, hydroxy-based third diamine, ether-based fourth diamine and alicyclic fifth diamine.
본 발명에서, 상기 불소화 제1디아민, 설폰계 제2디아민, 히드록시계 제3디아민, 에테르계 제4디아민 및 지환족 제5디아민의 함량은 각각 전체 디아민 100 몰%를 기준으로 10 내지 90 몰%일 수 있다. In the present invention, the content of the fluorinated first diamine, sulfone-based second diamine, hydroxy-based third diamine, ether-based fourth diamine and cycloaliphatic fifth diamine are each 10 to 90 mol based on 100 mol% total diamine May be%.
본 발명에서, 상기 산이무수물은 불소화 방향족 제1산이무수물, 지환족 제2산이무수물 및 비불소화 방향족 제3산이무수물로 구성된 군에서 선택되는 1종 이상을 포함할 수 있다. In the present invention, the acid dianhydride may include one or more selected from the group consisting of fluorinated aromatic first acid dianhydride, alicyclic diacid dianhydride and non-fluorinated aromatic tertiary dianhydride.
본 발명에서, 상기 제1산이무수물, 제2산이무수물 및 제3 산이무수물로 구성된 군에서 선택되는 1종 이상의 화합물의 함량은 전체 산이무수물 100 몰%를 기준으로 10 내지 100 몰% 범위일수 있다. In the present invention, the content of the at least one compound selected from the group consisting of the first acid dianhydride, the second acid dianhydride and the third acid dianhydride may be in the range of 10 to 100 mol% based on 100 mol% of the total acid dianhydride.
본 발명에서, 상기 디아민(a)과 상기 산이무수물(b)의 몰수의 비(a/b)는 0.7 내지 1.3 범위일 수 있다. In the present invention, the ratio (a / b) of the number of moles of the diamine (a) and the acid dianhydride (b) may range from 0.7 to 1.3.
아울러, 본 발명은 전술한 폴리아믹산 조성물을 이미드화하여 제조된 투명 폴리이미드 필름을 제공한다.In addition, the present invention provides a transparent polyimide film prepared by imidizing the polyamic acid composition described above.
본 발명에서, 상기 투명 폴리이미드 필름은 하기 (i) 내지 (v)의 물성 조건을 만족하는 것일 수 있으며, 보다 구체적으로 (i)유리전이온도(Tg)가 320 내지 400℃ 범위이며, (ii) 필름 두께 50㎛ 기준으로 파장 550nm의 광선 투과율이 88% 이상이며, (iii) ASTM E313 규격에 의한 황색도가 4.0 이하이며, (iv) 인장강도가 110 MPa 이상이며, (v) 인장 탄성률이 3.5 GPa 이상일 수 있다. In the present invention, the transparent polyimide film may satisfy the physical property conditions of the following (i) to (v), more specifically (i) the glass transition temperature (Tg) is 320 to 400 ℃ range, (ii ) The light transmittance of wavelength 550nm is 88% or more based on film thickness of 50㎛, (iii) Yellowness is 4.0 or less according to ASTM E313 standard, (iv) Tensile strength is 110 MPa or more, and (v) Tensile modulus is May be at least 3.5 GPa.
본 발명에서, 상기 투명이미드 필름은 플렉서블 디스플레이용 기판 및/또는 보호막으로 사용될 수 있다. In the present invention, the transparent imide film may be used as a substrate and / or protective film for a flexible display.
본 발명에서는 특정 구조와 치환기를 도입한 디아민 모노머를 채택하고 이들의 중량%를 조절함으로써, 우수한 광특성, 기계특성, 열적 특성등을 가지는 폴리아믹산 조성물을 제공할 수 있다.In the present invention, it is possible to provide a polyamic acid composition having excellent optical properties, mechanical properties, thermal properties, etc. by adopting a diamine monomer having a specific structure and a substituent and adjusting the weight percentage thereof.
또한 본 발명에서는 우수한 광특성, 기계특성, 열적 특성 등을 갖는 상기 폴리아믹산 조성물을 기판으로 적용함으로써, 우수한 물성과 제품 신뢰성을 발휘하는 플렉시블 디스플레이 기판을 제공할 수 있다. In the present invention, by applying the polyamic acid composition having excellent optical properties, mechanical properties, thermal properties and the like as a substrate, it is possible to provide a flexible display substrate exhibiting excellent physical properties and product reliability.
이하, 본 발명을 상세히 설명한다. 다만, 이는 예시로써 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구항의 범주에 의해 정의될 뿐이다. Hereinafter, the present invention will be described in detail. However, this is presented by way of example, whereby the present invention is not limited and the present invention is defined only by the scope of the claims to be described later.
<신규 디아민 화합물><New diamine compound>
본 발명은 하기 화학식 1로 표시되는 화합물, 바람직하게는 디아민 (diamine) 화합물을 제공한다. The present invention provides a compound represented by Chemical Formula 1, preferably a diamine compound.
[화학식 1][Formula 1]
Figure PCTKR2016012829-appb-I000001
Figure PCTKR2016012829-appb-I000001
상기 화학식 1에서, In Chemical Formula 1,
Y는 C6~C40의 아릴렌기로서, 상기 C6~C40의 아릴렌기는 할로겐 또는 할로겐 원자로 치환된 C1~C6 알킬기로 치환될 수 있으며, Y is a C 6 ~ C 40 arylene group, the C 6 ~ C 40 arylene group may be substituted with a halogen or a C 1 ~ C 6 alkyl group substituted with a halogen atom,
X1 및 X2은 서로 동일하거나 상이하며, 각각 독립적으로 수소, 할로겐, C1~C6의 알킬기, 및 하나 이상의 수소가 할로겐 원자로 치환된 C1~C6의 알킬기로 이루어진 군에서 선택되며, 다만 X1, X2 및 Y 중 적어도 하나 이상은 할로겐 또는 할로겐 원자로 치환된 C1~C6의 알킬기를 가지며, X 1 and X 2 are the same or different, are each independently selected from hydrogen, halogen, the group consisting of an alkyl group of C 1 ~ C 6 alkyl, and C 1 ~ in which one or more hydrogen substituted with halogen atoms C 6, the Provided that at least one of X 1 , X 2 and Y has a halogen or a C 1 to C 6 alkyl group substituted with a halogen atom,
n은 0 내지 3의 정수이다. n is an integer of 0-3.
본 발명에서, 상기 화학식 1로 표시되는 화합물은 기존 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐 (2,2'-Bis(trifluoromethyl)-4,4'-Diaminobiphenyl, 이하 TFDB로 표기함)과 기본골격 구조가 유사하나, 상기 화합물 내 디아민이 치환된 모이어티 사이에 2가의 아릴렌기 링커(divalent arylene linker)가 도입됨에 따라 보다 강직한(Rigid) 구조를 갖는다. 따라서 열이나 빛에 의해 분해되지 않고 외부 충격에 대해 보다 안정적이므로, 이를 포함하는 폴리아믹산 조성물의 광학 특성, 열적 특성 및 기계적 특성(Modulus, Strength) 등을 유의적으로 개선할 수 있다. In the present invention, the compound represented by Formula 1 is a conventional 2,2'-bis (trifluoromethyl) -4,4'- diaminobiphenyl (2,2'-Bis (trifluoromethyl) -4,4'- Basic structure is similar to Diaminobiphenyl (hereinafter referred to as TFDB), but has a more rigid structure as a divalent arylene linker is introduced between the diamine-substituted moieties in the compound. . Therefore, since it is not decomposed by heat or light and is more stable against external impact, optical properties, thermal properties, and mechanical properties (Modulus, Strength) of the polyamic acid composition including the same may be significantly improved.
또한 본 발명에서는 전술한 화학식 1에 불소(F)나 CF3 등의 전자흡인성기(EWG)를 적어도 하나 이상 도입함에 따라, 전술한 광학 특성, 열적 특성을 보다 상승시킬 수 있다. 보다 구체적으로, 폴리이미드 필름은 무색이 아닌 짙은 갈색을 띠게 되는데, 이는 이미드(Imide) 사슬 내에 존재하는 π 전자들의 Charge Transfer Complex(CTC) 때문이다. 상기 화학식 1에 도입된 -F, -CF3 등은 강한 전자 끄는 기이므로, π 전자들간의 이동을 통해 상기 CT-Complex가 일어나지 않도록 함으로써 폴리이미드의 높은 투명성을 나타낼 수 있다.In the present invention, by introducing at least one electron-withdrawing group (EWG) such as fluorine (F) or CF 3 in the above formula (1), it is possible to further increase the above-described optical and thermal properties. More specifically, the polyimide film is dark brown rather than colorless because of the Charge Transfer Complex (CTC) of π electrons present in the imide chain. Since -F, -CF 3 and the like introduced in Chemical Formula 1 are strong electron withdrawing groups, the CT-Complex does not occur through the movement between π electrons, thereby exhibiting high transparency of polyimide.
본 발명의 바람직한 일례에 따르면, 상기 X1 및 X2는 당 업계에 알려진 통상적인 전자흡인성기(electron withdrawing group, EWG) 일 수 있으며, 각각 독립적으로 불소(F) 또는 CF3 인 것이 바람직하다.According to a preferred embodiment of the present invention, X 1 and X 2 may be a conventional electron withdrawing group (EWG) known in the art, each independently fluorine (F) or CF 3 It is preferred.
또한 상기 Y는 당 분야에 알려진 통상적인 C6~C40의 아릴렌기일 수 있으며, 이의 구체적인 예로는 페닐렌, 비페닐렌, 트리페닐렌일 등이 있다. 특히, 상기 Y는 하기 화학식으로 표시되는 치환체 군에서 선택되는 것이 바람직하다. In addition, the Y may be a conventional C 6 ~ C 40 arylene group known in the art, specific examples thereof include phenylene, biphenylene, triphenylenyl and the like. In particular, the Y is preferably selected from the group of substituents represented by the following formula.
Figure PCTKR2016012829-appb-I000002
,
Figure PCTKR2016012829-appb-I000003
,
Figure PCTKR2016012829-appb-I000004
,
Figure PCTKR2016012829-appb-I000005
,
Figure PCTKR2016012829-appb-I000006
,
Figure PCTKR2016012829-appb-I000007
,
Figure PCTKR2016012829-appb-I000008
Figure PCTKR2016012829-appb-I000002
,
Figure PCTKR2016012829-appb-I000003
,
Figure PCTKR2016012829-appb-I000004
,
Figure PCTKR2016012829-appb-I000005
,
Figure PCTKR2016012829-appb-I000006
,
Figure PCTKR2016012829-appb-I000007
,
Figure PCTKR2016012829-appb-I000008
상기 치환체에서, R1 내지 R3는 서로 동일하거나 또는 상이하며, 각각 독립적으로 수소, F, 및 CF3로 이루어진 군에서 선택된다. 바람직하게는 R1 내지 R3가 각각 독립적으로 F 또는 CF3 이다. In the above substituents, R 1 to R 3 are the same as or different from each other, and are each independently selected from the group consisting of hydrogen, F, and CF 3 . Preferably, R 1 to R 3 are each independently F or CF 3 .
본 발명에 따른 화학식 1로 표시되는 화합물은, 하기 compound 1 내지 compound 26으로 구성된 화합물 군 중 어느 하나로 보다 구체화될 수 있으나, 이에 특별히 한정되는 것은 아니다. The compound represented by Formula 1 according to the present invention may be more specific to any one of a compound group consisting of Compound 1 to Compound 26, but is not particularly limited thereto.
Figure PCTKR2016012829-appb-I000009
Figure PCTKR2016012829-appb-I000009
Figure PCTKR2016012829-appb-I000010
Figure PCTKR2016012829-appb-I000010
Figure PCTKR2016012829-appb-I000011
Figure PCTKR2016012829-appb-I000011
Figure PCTKR2016012829-appb-I000012
Figure PCTKR2016012829-appb-I000012
<투명 폴리아믹산 조성물><Transparent Polyamic Acid Composition>
본 발명의 투명 폴리아믹산 조성물은 투명 폴리이미드 필름을 제조하기 위한 것으로, 상기 화학식 1로 표시되는 화합물을 디아민(diamine) 성분으로 포함하는 것을 특징으로 한다. The transparent polyamic acid composition of the present invention is for producing a transparent polyimide film, characterized in that it comprises a compound represented by the formula (1) as a diamine (diamine) component.
보다 구체적으로, 상기 폴리아믹산 조성물은 (a) 상기 화학식 1의 화합물을 함유하는 디아민; (b) 산이무수물; 및 (c) 유기용매를 포함한다. More specifically, the polyamic acid composition comprises (a) a diamine containing the compound of Formula 1; (b) acid dianhydrides; And (c) an organic solvent.
본 발명의 투명 폴리아믹산 제조에 사용되는 디아민(a) 단량체는 상기 화학식 1로 표시되는 화합물을 포함하되, 여기에 당 분야에 알려진 통상적인 디아민 화합물을 포함하여 혼용(混用)할 수 있다. The diamine (a) monomer used in the preparation of the transparent polyamic acid of the present invention may include a compound represented by Chemical Formula 1, and may be mixed with a conventional diamine compound known in the art.
상기 화학식 1로 표시되는 디아민 모노머의 사용량은 특별히 제한되지 않으며, 일례로 전체 산이무수물 100 몰%를 기준으로 하여 10 내지 90 몰% 범위일 수 있으며, 바람직하게는 20 내지 80 몰% 범위일 수 있다. The amount of the diamine monomer represented by Chemical Formula 1 is not particularly limited, and may be, for example, in the range of 10 to 90 mol% based on 100 mol% of the total acid dianhydride, and preferably in the range of 20 to 80 mol%. .
본 발명에서, 상기 화학식 1의 화합물과 혼용되는 디아민 화합물은 분자 내 디아민 구조를 갖는 화합물이라면 특별한 제한 없이 사용 가능하다. 일례로, 디아민 구조를 가지고 있는 방향족, 지환족, 또는 지방족 화합물 등이 있다. In the present invention, the diamine compound mixed with the compound of Formula 1 may be used without particular limitation as long as the compound has a diamine structure in the molecule. An example is an aromatic, alicyclic, or aliphatic compound having a diamine structure.
본 발명에서 사용할 수 있는 디아민은 높은 투과도(High Transmittance), 낮은 Y.I, 낮은 헤이즈(Haze) 등의 광학 특성; 높은 유리전이온도(High Tg), 낮은 열팽창계수(Low CTE) 등의 열 특성; 높은 모듈러스(High Modulus), 높은 표면 경도(High Surface Hardness) 등의 기계적 특성 등을 고려할 때, 불소화 치환기를 가진 직선형 구조 또는 설폰(Sulfone)계, 히드로실계(Hydroxyl), 에테르(Ether)계 등을 포함하는 구조들의 적절한 조합이 필요하다. 이에 따라, 본 발명에서는 상기 디아민 화합물로서, 불소 치환기가 도입된 불소화 방향족 제1디아민, 설폰계 제2디아민, 히드록시계 제3디아민, 에테르계 제4디아민, 지환족 제5디아민을 각각 단독으로 사용하거나 또는 이들이 2종 이상 혼합된 형태로 사용할 수 있다.Diamines usable in the present invention include optical properties such as high transmittance, low Y.I, low haze, and the like; Thermal properties such as high glass transition temperature (High Tg) and low coefficient of thermal expansion (Low CTE); Considering mechanical properties such as high modulus and high surface hardness, linear structures having fluorinated substituents or sulfone based, hydroxy based, ether based, etc. Appropriate combinations of structures to include are required. Accordingly, in the present invention, as the diamine compound, fluorinated aromatic first diamine, sulphonated second diamine, hydroxy third diamine, ether fourth diamine and alicyclic fifth diamine each having a fluorine substituent introduced therein alone. It may be used or in a form in which two or more thereof are mixed.
사용 가능한 디아민 단량체(a)의 비제한적인 예로는, 옥시디아닐린(ODA), 2,2'-비스(트리플루오로메틸)-4,4'-디아미노비페닐(2,2'-TFDB), 2,2'-비스(트리플루오로 메틸)-4,3'- 디아미노비페닐 (2,2'-Bis(trifluoromethyl) -4,3'-Diaminobiphenyl), 2,2'-비스 (트리플루오로 메틸)-5,5'-디아미노비페닐 (2,2'-Bis(trifluoromethyl) -5,5'-Diaminobiphenyl), 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA), 비스 아미노하이드록시 페닐 헥사플르오로프로판(DBOH), 비스 아미노 페녹시 페닐 헥사플루오로프로판(4BDAF), 비스 아미노 페녹시 페닐프로판(6HMDA), 비스 아미노페녹시 디페닐술폰(DBSDA), 비스(4-아미노페닐)설폰(4,4'-DDS), 비스(3-아미노페닐)설폰(3,3'-DDS), 술포닐디프탈릭안하이드라이드(SO2DPA), 비스(카르복시페닐) 디메틸실란, 또는 이들의 1종 또는 2종 이상이 혼합된 형태 등이 적용 가능하다. Non-limiting examples of diamine monomer (a) that can be used include oxydianiline (ODA), 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB ), 2,2'-bis (trifluoromethyl) -4,3'-diaminobiphenyl (2,2'-Bis (trifluoromethyl) -4,3'-Diaminobiphenyl), 2,2'-bis ( Trifluoromethyl) -5,5'-diaminobiphenyl (2,2'-Bis (trifluoromethyl) -5,5'-Diaminobiphenyl), 2,2'-bis (trifluoromethyl) -4,4 '-Diaminophenyl ether (2,2'-Bis (trifluoromethyl) -4,4'-diaminodiphenyl ether, 6-FODA), bis aminohydroxy phenyl hexafluoropropane (DBOH), bis amino phenoxy phenyl hexafluoro Lopropanane (4BDAF), bis amino phenoxy phenylpropane (6HMDA), bis aminophenoxy diphenylsulfone (DBSDA), bis (4-aminophenyl) sulfone (4,4'-DDS), bis (3-aminophenyl ) sulfone (3,3'-DDS), sulfonyl deep Talic anhydride (SO 2 DPA), bis (dicarboxyphenyl) dimethylsilane, or one kind of these addition This mixture of two or more of the like is applicable.
고투명성, 높은 유리전이온도, 및 낮은 황색도를 고려할 때, 상기 불소화 제1디아민은 직선형의 고분자화를 유도할 수 있는 2,2'-비스(트리플루오로 메틸)-4,4'-디아미노비페닐 (2,2'-TFDB)를 사용하는 것이 바람직하다. 또한 상기 설폰계 제2디아민은 비스(4-아미노페닐)설폰(4,4'-DDS)를 사용하는 것이 바람직하다. 또한 상기 히드록시계 제3디아민은 2,2- 비스 (3-아미노-4-메틸페닐)-헥사플루오로프로판 (2,2-Bis (3-amino-4-methylphenyl)-hexafluoropropane, BIS-AT-AF)을 사용하는 것이 바람직하다. 또한 상기 에테르계 제4디아민은 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르 (6-FODA)를 사용하는 것이 바람직하다. Given high transparency, high glass transition temperature, and low yellowness, the fluorinated first diamine is a 2,2'-bis (trifluoromethyl) -4,4'-dia which may lead to linear polymerisation. Preference is given to using minobiphenyl (2,2'-TFDB). In addition, it is preferable to use bis (4-aminophenyl) sulfone (4,4'-DDS) as the sulfone-based second diamine. In addition, the hydroxy tertiary diamine is 2,2-bis (3-amino-4-methylphenyl) -hexafluoropropane (2,2-Bis (3-amino-4-methylphenyl) -hexafluoropropane, BIS-AT- AF) is preferred. In addition, it is preferable to use 2,2'-bis (trifluoromethyl) -4,4'- diaminophenyl ether (6-FODA) as said ether type 4 diamine.
본 발명의 디아민 단량체(a)에서, 상기 불소화 제1디아민, 설폰계 제2디아민, 히드록시계 제3디아민, 에테르계 제4디아민, 지환족 제5디아민 등의 함량은 특별히 한정되지 않으나, 각각 전체 디아민 100 몰%를 기준으로 10 내지 90 몰%일 수 있으며, 바람직하게는 20 내지 80 몰% 범위일 수 있다. In the diamine monomer (a) of the present invention, the content of the fluorinated first diamine, sulfonated second diamine, hydroxy third diamine, ether fourth diamine, alicyclic fifth diamine, and the like are not particularly limited. It may be 10 to 90 mol% based on 100 mol% of the total diamine, preferably in the range of 20 to 80 mol%.
본 발명의 투명 폴리아믹산 제조에 사용되는 산이무수물(b) 단량체는 분자 내 산이무수물 구조를 갖는 당 분야에 알려진 통상적인 불소화, 비불소화, 지환족 등의 산이무수물 등을 제한 없이 사용할 수 있다. 일례로, 불소화 제1산이무수물, 지환족 제2산이무수물, 비불소화 제3산이무수물을 각각 단독으로 사용하거나 또는 이들이 2종 이상 혼합된 혼합 형태 등이 있다. Acid dianhydride (b) monomers used in the preparation of the transparent polyamic acid of the present invention can be used without limitation, acid dianhydrides such as fluorinated, non-fluorinated, alicyclic and the like known in the art having an acid dianhydride structure in the molecule. For example, the fluorinated first acid dianhydride, alicyclic diacid dianhydride, and non-fluorinated triacid dianhydride may be used alone or in a mixed form of two or more thereof.
본 발명에서, 상기 불소화 제1산이무수물 단량체는 불소 치환기가 도입된 방향족 산이무수물이라면, 특별히 한정하지 않는다. In the present invention, the fluorinated first acid dianhydride monomer is not particularly limited as long as it is an aromatic acid dianhydride into which a fluorine substituent is introduced.
사용 가능한 불소화 제1디안하드라이드의 일례를 들면, 2,2-비스(3,4-디카르복시페닐)헥사플루오로프로판 디안하이드라이드 (2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydrid, 6-FDA), 4-(트리플루오로메틸)피로멜리틱 디안하이드라이드 (4-(trifluoromethyl)pyromellitic dianhydride, 4-TFPMDA) 등이 있다. 이들을 단독으로 사용하거나 또는 2종 이상 혼합하여 사용될 수 있다. 불소화 산이무수물 중 6-FDA는 분자 사슬 간 및 분자 사슬 내 전하이동착물 (CTC: Change transfer complex)의 형성을 제한하는 특성이 매우 커서 투명화하는데 매우 적절한 화합물이다. Examples of fluorinated first dianhydrides that can be used include 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride (2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydrid, 6-FDA), 4- (trifluoromethyl) pyromellitic dianhydride (4- (trifluoromethyl) pyromellitic dianhydride, 4-TFPMDA). These may be used alone or in combination of two or more thereof. In fluorinated acid dianhydrides, 6-FDA is a very suitable compound for clearing due to its very high property of limiting the formation of change transfer complexes (CTCs) between and within molecular chains.
또한, 본 발명에서 사용할 수 있는 지환족(alicyclic) 제2산이무수물은 화합물 내 방향족고리가 아닌 지환족 고리를 가지면서 산이무수물 구조를 갖는 화합물이라면 특별히 제한되지 않는다. In addition, the alicyclic diacid dianhydride that can be used in the present invention is not particularly limited as long as it is a compound having an acid dianhydride structure having an alicyclic ring instead of an aromatic ring in the compound.
본 발명에서 사용 가능한 지환족 제2디안하이드라이의 일례를 들면, 사이클로부탄 테트라카르복실릭 디안하이드라이드(CBDA), 1,2,3,4-사이클로펜탄 테트라카르복실릭 디안하이드라이드(CPDA), 비사이클로[2,2,2]-7-옥텐-2,3,5,6-테트라카르복실산 디안하이드라이드(BCDA), 또는 이들의 1종 이상의 혼합물 등이 있으나, 이에 특별히 제한되지 않는다. Examples of the alicyclic second dianhydride usable in the present invention include cyclobutane tetracarboxylic dianhydride (CBDA), 1,2,3,4-cyclopentane tetracarboxylic dianhydride (CPDA) , Bicyclo [2,2,2] -7-octene-2,3,5,6-tetracarboxylic dianhydride (BCDA), or mixtures of one or more thereof, but are not particularly limited thereto. .
상기 비불소화 제3산이무수물 단량체는 불소 치환기가 도입되지 않은 비(非)불소화 방향족 산이무수물이라면, 특별히 한정하지 않는다. The non-fluorinated tertiary acid dianhydride monomer is not particularly limited as long as it is a non-fluorinated aromatic acid dianhydride to which a fluorine substituent is not introduced.
사용 가능한 비불소화 제3산이무수물 단량체의 비제한적인 예로는 피로멜리틱 디안하이드라이드 (Pyromellitic Dianhydride, PMDA), 3,3′,4,4′-비페닐테트라카르복실릭 디안하이드라이드 (3,3′,4,4′-Biphenyl tetracarboxylic acid dianhydride, BPDA) 등이 있다. 이들을 단독으로 사용하거나, 또는 2종 이상 혼용할 수 있다.Non-limiting examples of non-fluorinated tertiary dianhydride monomers that can be used include pyromellitic dianhydride (PMDA), 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (3, 3 ′, 4,4′-Biphenyl tetracarboxylic acid dianhydride (BPDA). These may be used alone or in combination of two or more thereof.
본 발명에서, 상기 제1산이무수물, 제2산이무수물 및 제3 산이무수물로 구성된 군에서 선택되는 1종 이상의 화합물의 함량은 특별히 한정되지 않는다. 일례로, 이들은 각각 전체 산이무수물 100 몰%를 기준으로 10 내지 100 몰%일 수 있으며, 바람직하게는 10 내지 90 몰% 범위이며, 더욱 바람직하게는 20 내지 80 몰%일 수 있다. In the present invention, the content of at least one compound selected from the group consisting of the first acid dianhydride, the second acid dianhydride and the third acid dianhydride is not particularly limited. In one example, they may each range from 10 to 100 mole percent, based on 100 mole percent total acid dianhydride, preferably in the range from 10 to 90 mole percent, more preferably 20 to 80 mole percent.
본 발명의 바람직한 일례에 따르면, 상기 산이무수물(b)로서 불소화 제1산이무수물과 비불소화 제3산이무수물을 혼용하는 경우, 이들의 사용 비율은 40~90 : 60~10 몰%비일 수 있다. According to a preferred embodiment of the present invention, when the fluorinated first acid dianhydride and the non-fluorinated third acid dianhydride are mixed as the acid dianhydride (b), the ratio thereof may be 40 to 90: 60 to 10 mol%.
또한 본 발명의 바람직한 다른 일례에 따르면, 상기 산이무수물(b)로서 불소화 제1산이무수물과 지환족 제2산이무수물을 혼용하는 경우, 이들의 사용 비율은 30~70 : 70~30 몰%비일 수 있다. According to another preferred embodiment of the present invention, when the fluorinated first acid dianhydride and alicyclic second acid dianhydride are mixed as the acid dianhydride (b), the ratio thereof may be 30 to 70:70 to 30 mol%. have.
또한 본 발명의 바람직한 다른 일례에 따르면, 상기 산이무수물(b)로서 지환족 제2산이무술과 비불소화 제3산이무수물을 혼용하는 경우, 이들의 사용 비율은 40~90 : 60~10 몰%비일 수 있다. According to another preferred embodiment of the present invention, when the alicyclic dianhydride and non-fluorinated tertiary dianhydride are mixed as the acid dianhydride (b), the ratio of their use is 40 to 90: 60 to 10 mol% ratio. Can be.
본 발명의 투명 폴리아믹산 조성물에 있어서, 상기 디아민 성분(a)의 몰수와 상기 디안하이드라이드 성분(b)의 몰수의 비(a/b)는 0.7~1.3 일 수 있으며, 바람직하게는 0.8 내지 1.2이며, 더욱 바람직하게는 0.9 내지 1.1 범위일 수 있다.In the transparent polyamic acid composition of the present invention, the ratio (a / b) of the number of moles of the diamine component (a) to the number of moles of the dianhydride component (b) may be 0.7 to 1.3, preferably 0.8 to 1.2. And more preferably 0.9 to 1.1.
본 발명의 폴리아믹산 조성물에 포함되어 전술한 단량체들의 용액 중합반응을 위한 용매 (c)는 당 분야에 공지된 유기용매를 제한 없이 사용할 수 있다. The solvent (c) for solution polymerization of the aforementioned monomers included in the polyamic acid composition of the present invention may use any organic solvent known in the art without limitation.
사용 가능한 용매의 일례를 들면, m-크레졸, N-메틸-2-피롤리돈(NMP), 디메틸포름아미드(DMF), 디메틸아세트아미드(DMAc), 디메틸설폭사이드(DMSO), 아세톤, 디에틸아세테이트, 및 디메틸 프탈레이트(DMP) 중에서 선택된 하나 이상의 극성용매를 사용할 수 있다. 이외에도, 테트라하이드로퓨란(THF), 클로로포름과 같은 저비점 용액 또는 γ-부티로락톤과 같은 저흡수성 용매를 사용할 수 있다. Examples of solvents that can be used include m-cresol, N-methyl-2-pyrrolidone (NMP), dimethylformamide (DMF), dimethylacetamide (DMAc), dimethyl sulfoxide (DMSO), acetone, diethyl One or more polar solvents selected from acetate, and dimethyl phthalate (DMP) can be used. In addition, low boiling point solutions such as tetrahydrofuran (THF), chloroform or low absorbing solvents such as γ-butyrolactone may be used.
상기 용매의 함량에 대해서 특별히 한정되어 있지는 않으나, 적절한 폴리아믹산 용액의 분자량과 점도를 얻기 위하여 중합용 용매(제1 용매)의 함량은 전체 폴리아믹산 조성물 중량을 기준으로 하여 50 ~ 95 중량% 범위일 수 있고, 바람직하게는 70 ~ 90 중량% 범위이며, 더욱 바람직하게는 75~85 중량% 범위이다.The content of the solvent is not particularly limited, but in order to obtain an appropriate molecular weight and viscosity of the polyamic acid solution, the content of the solvent for polymerization (the first solvent) may range from 50 to 95 wt% based on the total weight of the polyamic acid composition. It is preferably in the range of 70 to 90% by weight, more preferably in the range of 75 to 85% by weight.
본 발명의 폴리아믹산 조성물은, 전술한 산이무수물과 디아민을 유기용매에 투입한 후 반응시켜 제조될 수 있다. 일례로, 화학식 1의 디아민, 상기 제1디아민 내지 제5디아민 중 적어도 하나 이상의 디아민 성분, 및 산이무수물을 포함하되, 유리전이온도 및 황색도 개선을 위해 디아민(a)과 산이무수물(b)을 대략 1:1의 당량비로 하여 투명 폴리아믹산 조성물을 형성할 수 있다.The polyamic acid composition of the present invention may be prepared by adding the above-described acid dianhydride and diamine into an organic solvent and reacting. In one example, the diamine of Formula 1, at least one or more diamine components of the first to fifth diamine, and acid dianhydride, diamine (a) and acid dianhydride (b) to improve the glass transition temperature and yellowness Transparent polyamic acid compositions can be formed with an equivalent ratio of approximately 1: 1.
상기 폴리아믹산 조성물의 조성은 특별히 제한되지 않으며, 일례로 폴리아믹산 조성물 전체 중량 100 중량%을 기준으로, 산이무수물 2.5 내지 25.0 중량%, 디아민 2.5 내지 25.0 중량%, 및 조성물 100 중량%를 만족시키는 잔량의 유기용매를 포함하여 구성될 수 있다. 일례로, 상기 유기용매의 함량은 75 내지 85 중량%일 수 있다. 한편 본 발명에 따른 폴리아믹산 조성물의 조성에서, 고형분 100 중량%을 기준으로 할 때, 산이무수물 30 내지 70 중량%, 및 디아민 30 내지 70 중량% 범위일 수 있다. 그러나, 이에 특별히 제한되지 않는다. The composition of the polyamic acid composition is not particularly limited, and for example, based on 100% by weight of the total weight of the polyamic acid composition, 2.5 to 25.0% by weight of the acid dianhydride, 2.5 to 25.0% by weight of diamine, and the remaining amount to satisfy 100% by weight of the composition It may be configured to include an organic solvent of. In one example, the content of the organic solvent may be 75 to 85% by weight. Meanwhile, in the composition of the polyamic acid composition according to the present invention, based on 100% by weight of solids, the acid dianhydride may be in the range of 30 to 70% by weight, and diamine 30 to 70% by weight. However, this is not particularly limited.
이러한 본 발명의 투명 폴리아믹산 조성물은 약 1,000 내지 50,000 cps, 바람직하게는 약 3,000 내지 15,000 cps 범위의 점도를 가질 수 있다. 폴리아믹산 용액의 점도가 전술한 범위에 해당되는 경우, 폴리아믹산 용액 코팅 시 두께 조절이 용이하며, 코팅 표면이 균일하게 발휘될 수 있다. Such transparent polyamic acid compositions of the present invention may have a viscosity in the range of about 1,000 to 50,000 cps, preferably about 3,000 to 15,000 cps. When the viscosity of the polyamic acid solution falls within the above-described range, the thickness of the polyamic acid solution may be easily adjusted when the solution is coated, and the coating surface may be uniformly exhibited.
또한, 본 발명의 폴리아믹산 용액은 필요에 따라 본 발명의 목적과 효과를 현저히 손상시키지 않는 범위 내에서 가소제, 산화방지제, 난연화제, 분산제, 점도 조절제, 레벨링제 등의 첨가제를 소량 포함할 수 있다.In addition, the polyamic acid solution of the present invention may contain a small amount of additives such as plasticizers, antioxidants, flame retardants, dispersants, viscosity regulators, leveling agents and the like within the range that does not significantly impair the object and effect of the present invention if necessary. .
<폴리이미드 필름><Polyimide film>
본 발명은 상기에서 설명한 폴리아믹산 용액을 고온에서 이미드화 및 열처리하여 제조된 폴리이미드 필름을 제공한다.The present invention provides a polyimide film prepared by imidizing and heat treating the polyamic acid solution described above at high temperature.
상기 폴리이미드 수지는 이미드(imide) 고리를 함유하는 고분자 물질로서, 내열성, 내화학성, 내마모성 및 전기적 특성이 우수하다. 이때 상기 폴리이미드 수지는 랜덤 공중합체(random copolymer)나 블록 공중합체(block copolymer) 형태일 수 있다. The polyimide resin is a polymer material containing an imide ring, and is excellent in heat resistance, chemical resistance, abrasion resistance, and electrical properties. In this case, the polyimide resin may be in the form of a random copolymer or a block copolymer.
한편 폴리이미드 수지 필름이 플렉서블 디스플레이 등에 적용하기 위해서는 기본적으로 고투명성, 낮은 열팽창계수, 높은 유리전이온도 등의 특징을 가져야 한다. 보다 구체적으로, 막 두께 10㎛를 기준으로 하여 550nm의 광투과율이 90% 이상이며, 550nm의 황색도 값이 3 이하, 유리전이온도(Tg)가 300℃ 이상 등이 요구된다. Meanwhile, in order to apply a polyimide resin film to a flexible display, it should basically have characteristics such as high transparency, low thermal expansion coefficient, and high glass transition temperature. More specifically, a light transmittance of 550 nm is 90% or more based on a film thickness of 10 μm, a yellowness value of 550 nm is 3 or less, a glass transition temperature (Tg) of 300 ° C. or more is required.
실제로, 전술한 폴리아믹산 조성물을 이미드화하여 제조된 본 발명의 폴리이미드 필름은 반복 단위 내에 강직한(Rigid) 화학구조를 가짐에 따라 고투명성을 나타내면서도 낮은 황색도, 열팽창계수, 높은 유리전이온도(Tg), 높은 인장강도 및 탄성율을 가진다. 보다 구체적으로, 상기 폴리이미드 필름은 하기 (i) 내지 (v)의 물성 조건, 예컨대 (i)유리전이온도(Tg)가 320 내지 400℃ 범위이며, (ii) 필름 두께 50㎛ 기준으로 파장 500nm의 광선 투과율이 88% 이상이며, (iii) ASTM E313 규격에 의한 황색도가 4.0 이하이며 (50㎛ 기준), (iv) 인장강도가 110 내지 150 MPa이며, (v) 인장 탄성률이 3.5 내지 5.0 GPa 범위를 모두 만족시킬 수 있다. Indeed, the polyimide film of the present invention prepared by imidizing the polyamic acid composition described above has a rigid chemical structure in a repeating unit and exhibits high transparency while having low yellowness, thermal expansion coefficient, and high glass transition temperature. (Tg), high tensile strength and elastic modulus. More specifically, the polyimide film has a physical property condition of the following (i) to (v), such as (i) the glass transition temperature (T g ) is in the range of 320 to 400 ℃, (ii) the film thickness 50㎛ reference The light transmittance of 500 nm is 88% or more, (iii) the yellowness according to ASTM E313 standard is 4.0 or less (50 micrometers basis), (iv) tensile strength is 110-150 MPa, (v) tensile elasticity modulus is 3.5- The 5.0 GPa range can all be met.
본 발명에 따른 폴리이미드 필름은 당 분야에 알려진 통상적인 방법에 따라 투명 폴리아믹산 용액을 발열 용액중합반응하여 제조될 수 있다. 일례로 상기 투명 폴리아믹산 조성물을 유리기판에 코팅(캐스팅)한 후 30~350℃의 범위에서 온도를 서서히 승온시키면서 0.5 ~ 8시간 동안 이미드 폐환반응 (Imidazation)을 유도시켜 제조될 수 있다. 이때 아르곤이나 질소 등의 불활성 분위기 하에서 반응하는 것이 바람직하다. The polyimide film according to the present invention may be prepared by exothermic solution polymerization of a transparent polyamic acid solution according to conventional methods known in the art. For example, the transparent polyamic acid composition may be prepared by coating (casting) a glass substrate and inducing an imide cyclization reaction (Imidazation) for 0.5 to 8 hours while gradually raising the temperature in the range of 30 to 350 ° C. It is preferable to react in inert atmosphere, such as argon and nitrogen at this time.
이때, 상기 코팅방법은 당 업계에 알려진 통상적인 방법을 제한 없이 사용할 수 있으며, 일례로 스핀코팅(Spin coating), 딥 코팅(Dip coating), 용매 캐스팅(Solvent casting), 슬롯다이 코팅(Slot die coating) 및 스프레이 코팅으로 이루어진 군에서 선택되는 적어도 어느 하나의 방법에 의해 이루어질 수 있다. 상기 무색투명한 폴리이미드 층의 두께는 수 백 nm에서 수십 ㎛가 되도록 투명 폴리아믹산 조성물을 1회 이상 코팅할 수 있다. In this case, the coating method may be used without limitation conventional methods known in the art, for example, spin coating (dip coating), dip coating (Dip coating), solvent casting (Solvent casting), slot die coating (Slot die coating) ) And at least one method selected from the group consisting of spray coating. The colorless transparent polyimide layer may be coated at least once with a transparent polyamic acid composition such that the thickness of the colorless and transparent polyimide layer is several hundreds of micrometers.
이와 같이 형성된 폴리이미드 필름의 두께는 특별히 제한되지 않으며, 적용되는 분야에 따라 적절히 조절될 수 있다. 일례로 10 내지 150㎛ 범위일 수 있으며, 바람직하게는 10 내지 80㎛ 범위일 수 있다.The thickness of the polyimide film thus formed is not particularly limited and may be appropriately adjusted according to the field to be applied. For example, it may be in the range of 10 to 150㎛, preferably in the range of 10 to 80㎛.
본 발명에서, 상기와 같이 제작된 투명 폴리이미드 필름은 다양한 분야에 사용될 수 있으며, 특히 고투명성 및 내열성이 요구되는 유기 EL 소자(OLED)용 디스플레이, 액정 소자용 디스플레이, TFT 기판, 플렉서블 인쇄회로기판, 플렉서블(Flexible) OLED 면조명 기판, 전자 종이용 기판소재와 같은 플렉서블(Flexible) 디스플레이용 기판 및 보호막으로 활용될 수 있다. In the present invention, the transparent polyimide film manufactured as described above may be used in various fields, and particularly, displays for organic EL devices (OLEDs), displays for liquid crystal devices, TFT substrates, flexible printed circuit boards that require high transparency and heat resistance. It can be used as a flexible display substrate and a protective film such as a flexible OLED surface lighting substrate, a substrate material for electronic paper.
이하, 구체적인 실시예를 통해 본 발명을 보다 구체적으로 설명한다. 하기 실시예는 본 발명의 이해를 돕기 위한 예시에 불과하며, 본 발명의 범위가 이에 한정되는 것은 아니다. Hereinafter, the present invention will be described in more detail with reference to specific examples. The following examples are merely examples to help understanding of the present invention, but the scope of the present invention is not limited thereto.
[화학식 1의 디아민 모노머 합성][Diamine Monomer Synthesis of Chemical Formula 1]
[합성예 1] Compound 1의 합성Synthesis Example 1 Synthesis of Compound 1
Figure PCTKR2016012829-appb-I000013
Figure PCTKR2016012829-appb-I000013
1-1. 중간체 2의 합성1-1. Synthesis of Intermediate 2
1-bromo-4-nitro-2-(trifluoromethyl)benzene (54g, 200mmol), 2,2'-(2-(trifluoromethyl)-1,4-phenylene)bis(4,4,5,5-tetramethyl-1,3,2-dioxaborolane) (39.8g, 100mmol), Pd(PPh3)4 (13.5g, 10 mol%)을 플라스크에 넣었다. Toluene 300 ㎖와 THF 150 ㎖를 넣고 K2CO3 (83g, 600mmol)을 증류수 200 ㎖에 녹인 수용액을 첨가한 후 13시간 동안 가열 교반하였다. 1-bromo-4-nitro-2- (trifluoromethyl) benzene (54g, 200mmol), 2,2 '-(2- (trifluoromethyl) -1,4-phenylene) bis (4,4,5,5-tetramethyl- 1,3,2-dioxaborolane) (39.8 g, 100 mmol) and Pd (PPh 3 ) 4 (13.5 g, 10 mol%) were added to the flask. 300 ml of Toluene and 150 ml of THF were added thereto, an aqueous solution of K 2 CO 3 (83 g, 600 mmol) dissolved in 200 ml of distilled water was added thereto, followed by heating and stirring for 13 hours.
TLC로 반응이 종결된 것을 확인한 후 반응액을 여과하고 에틸아세테이트 100 ㎖로 2회 추출하였다. 회전 증발기(rotary evaporator)로 용매를 제거한 다음 MeOH을 이용하여 결정화하여 화합물2(34.13g, 수율 65%)를 얻었다.After confirming that the reaction was terminated by TLC, the reaction solution was filtered and extracted twice with 100 ml of ethyl acetate. The solvent was removed with a rotary evaporator and then crystallized with MeOH to obtain Compound 2 (34.13 g, yield 65%).
Elemental Analysis: C, 48.11; H, 1.73; F, 32.61; N, 5.34; O, 12.21Elemental Analysis: C, 48.11; H, 1.73; F, 32.61; N, 5.34; O, 12.21
HRMS [M]+:524HRMS [M] + : 524
1-2. Compound 1의 합성1-2. Synthesis of Compound 1
중간체 2, 34.13g(65mmol)을 에탄올 200 ml, 증류수 200 ml 의 혼합용매에 넣고 교반하였다. Fe Powder 44g를 넣은 후 80℃에서 가열 교반하였다. 10 분뒤 3 M HCl 15 ml를 천천히 추가한 후 7시간동안 가열 교반하였다. TLC로 반응이 종결된 것을 확인한 후 반응액을 실온으로 냉각시켰다. 반응액을 여과하고 에틸아세테이트 100 ㎖로 2회 추출하였다. 회전 증발기(rotary evaporator)로 용매를 제거한 다음 HX로 결정화하여 Compound 1 화합물 27.2g(수율90%)를 얻었다.34.13 g (65 mmol) of the intermediate 2 was added to a mixed solvent of 200 ml of ethanol and 200 ml of distilled water and stirred. 44 g of Fe powder was added thereto, followed by heating and stirring at 80 ° C. After 10 minutes, 15 ml of 3 M HCl was slowly added and stirred by heating for 7 hours. After confirming that the reaction was terminated by TLC, the reaction solution was cooled to room temperature. The reaction solution was filtered and extracted twice with 100 ml of ethyl acetate. The solvent was removed with a rotary evaporator and crystallized with HX to obtain 27.2 g of Compound 1 compound (yield 90%).
Elemental Analysis: C, 54.32; H, 2.82; F, 36.82; N, 6.03Elemental Analysis: C, 54.32; H, 2. 82; F, 36.82; N, 6.03
HRMS [M]+:464HRMS [M] + : 464
[합성예 2] Compound 4의 합성Synthesis Example 2 Synthesis of Compound 4
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 55.57; H, 2.80; F, 35.16; N, 6.48Elemental Analysis: C, 55.57; H, 2.80; F, 35.16; N, 6.48
HRMS [M]+: 432HRMS [M] + : 432
[합성예 3] Compound 5의 합성Synthesis Example 3 Synthesis of Compound 5
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다.Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 51.30; H, 2.15; F, 40.57; N, 5.98Elemental Analysis: C, 51.30; H, 2. 15; F, 40.57; N, 5.98
HRMS [M]+: 468HRMS [M] + : 468
[합성예 4] Compound 7의 합성Synthesis Example 4 Synthesis of Compound 7
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 60.61; H, 3.56; F, 28.76; N, 7.07Elemental Analysis: C, 60.61; H, 3.56; F, 28.76; N, 7.07
HRMS [M]+: 396HRMS [M] + : 396
[합성예 5] Compound 9의 합성Synthesis Example 5 Synthesis of Compound 9
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 54.32; H, 2.82; F, 36.82; N, 6.03Elemental Analysis: C, 54.32; H, 2. 82; F, 36.82; N, 6.03
HRMS [M]+: 464HRMS [M] + : 464
[합성예 6] Compound 10의 합성Synthesis Example 6 Synthesis of Compound 10
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 51.30; H, 2.15; F, 40.57; N, 5.98Elemental Analysis: C, 51.30; H, 2. 15; F, 40.57; N, 5.98
HRMS [M]+: 468HRMS [M] + : 468
[합성예 7] Compound 12의 합성Synthesis Example 7 Synthesis of Compound 12
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 57.98; H, 3.16; F, 32.10; N, 6.76Elemental Analysis: C, 57.98; H, 3. 16; F, 32.10; N, 6.76
HRMS [M]+: 414HRMS [M] + : 414
[합성예 8] Compound 13의 합성Synthesis Example 8 Synthesis of Compound 13
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 55.27; H, 2.65; F, 37.47; N, 4.60Elemental Analysis: C, 55.27; H, 2.65; F, 37.47; N, 4.60
HRMS [M]+: 608HRMS [M] + : 608
[합성예 9] Compound 15의 합성Synthesis Example 9 Synthesis of Compound 15
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 50.67; H, 1.64; F, 43.15; N, 4.55Elemental Analysis: C, 50.67; H, 1. 64; F, 43.15; N, 4.55
HRMS [M]+: 616HRMS [M] + : 616
[합성예 10] Compound 16의 합성Synthesis Example 10 Synthesis of Compound 16
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 61.42; H, 3.17; F, 29.89; N, 5.51Elemental Analysis: C, 61.42; H, 3. 17; F, 29.89; N, 5.51
HRMS [M]+: 508HRMS [M] + : 508
[합성예 11] Compound 18의 합성Synthesis Example 11 Synthesis of Compound 18
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 55.27; H, 2.65; F, 37.47; N, 4.60Elemental Analysis: C, 55.27; H, 2. 65; F, 37.47; N, 4.60
HRMS [M]+: 608HRMS [M] + : 608
[합성예 12] Compound 20의 합성Synthesis Example 12 Synthesis of Compound 20
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 61.42; H, 3.17; F, 29.89; N, 5.51Elemental Analysis: C, 61.42; H, 3. 17; F, 29.89; N, 5.51
HRMS [M]+: 508HRMS [M] + : 508
[합성예 13] Compound 21의 합성Synthesis Example 13 Synthesis of Compound 21
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 55.86; H, 2.54; F, 37.87; N, 3.72Elemental Analysis: C, 55.86; H, 2.54; F, 37.87; N, 3.72
HRMS [M]+: 752HRMS [M] + : 752
[합성예 14] Compound 23의 합성Synthesis Example 14 Synthesis of Compound 23
실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1.
Elemental Analysis: C, 55.86; H, 2.54; F, 37.87; N, 3.72Elemental Analysis: C, 55.86; H, 2.54; F, 37.87; N, 3.72
HRMS [M]+: 752HRMS [M] + : 752
[투명 폴리아믹산 조성물의 합성 및 폴리이미드 필름의 제조][Synthesis of Transparent Polyamic Acid Composition and Production of Polyimide Film]
[실시예 1] Example 1
1-1. 폴리아믹산 조성물의 제조1-1. Preparation of Polyamic Acid Compositions
500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드 (N,N-Dimethylacetamide, 이하 DMAc로 표기함) 216.366g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐 (2,2'-Bis(trifluoromethyl)-4,4'-Diaminobiphenyl, 이하 TFDB로 표기함) 15.0g(90mol%)을 가하고, 30분 후, 화합물(1) 2.417g(10mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(1)을 완전히 용해시켰다. 그 후, 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 디안하이드라이드 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 이하 6FDA로 표기함) 및 피로멜리틱 디안하이드라이드 (Pyromellitic dianhydride, 이하 PMDA로 표기함)를 각각 순차적으로 18.495g(80mol%), 2.270g(20mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.A 500 ml three-necked round bottom flask was charged with 216.366 g (85.0 wt%) of N, N-dimethylacetamide (denoted as N, N-Dimethylacetamide, hereinafter referred to as DMAc), and the temperature of the reactor was increased to 50 ° C. , 2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-Bis (trifluoromethyl) -4,4'-Diaminobiphenyl, hereinafter referred to as TFDB) 15.0 g (90 mol%) After 30 minutes, 2.417 g (10 mol%) of Compound (1) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (1). Thereafter, 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride (denoted 2,2-bis (3,4-dicarboxyphenyl) Hexa fluoropropane dianhydride, hereinafter referred to as 6FDA) and pyromelli Pyromellitic dianhydride (hereinafter referred to as PMDA) was sequentially added to 18.495 g (80 mol%) and 2.270 g (20 mol%), respectively, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
1-2. 투명 폴리이미드 필름의 제조 1-2. Preparation of Transparent Polyimide Film
상기 투명 폴리아믹산 용액을 LCD용 유리판에 바코터(Bar Coater)를 이용하여 코팅한 후 질소 분위기의 컨벡션 오븐에서 80℃에서 30분, 150℃에서 30분, 200℃에서 1시간, 300℃에서 1시간으로 단계적으로 서서히 승온시키면서 건조 및 이미드 폐환반응(Imidazation)을 진행하였다. 이로써, 이미드화율이 85% 이상인 막 두께 52㎛의 투명 폴리이미드 필름을 제조하였다. 이후 유리판에서 폴리이미드 필름을 분리하여 취하였다.After coating the transparent polyamic acid solution on the glass plate for LCD using a bar coater (Bar Coater) in nitrogen convection oven 30 minutes at 80 ℃, 30 minutes at 150 ℃, 1 hour at 200 ℃, 1 at 300 ℃ Drying and imid ring closure (Imidazation) were performed while gradually raising the temperature step by step. This produced the transparent polyimide film with a film thickness of 52 micrometers whose imidation ratio is 85% or more. Then, the polyimide film was separated and taken from the glass plate.
[실시예 2] Example 2
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 210.028g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 7.5g(50mol%)을 가하고, 30분 후, 화합물(1) 10.875g(50mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(1)을 완전히 용해시켰다. 그 후, 6FDA 및 PMDA를 각각 순차적으로 16.646g(80mol%), 2.043g(20mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 210.028 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as mentioned in Example 1, the reactor was heated to 50 ° C., 7.5 g (50 mol%) of TFDB was added, and 30 minutes later. 10.875 g (50 mol%) was added to Compound (1). Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (1). Thereafter, 16.646 g (80 mol%) and 2.043 g (20 mol%) of 6FDA and PMDA were sequentially added, and then cooled to 30 ° C to be dissolved. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 3] Example 3
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 214.361g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 15.0g(90mol%)을 가하고, 30분 후, 화합물(2) 2.063g(10mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(2)를 완전히 용해시켰다. 그 후, 6FDA 및 PMDA를 각각 순차적으로 18.495g(80mol%), 2.270g(20mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 214.361 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., 15.0 g (90 mol%) was added thereto, and 30 minutes later. , 2.063 g (10 mol%) of Compound (2) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (2). Thereafter, 18.495 g (80 mol%) and 2.270 g (20 mol%) of 6FDA and PMDA were sequentially added, and then cooled to 30 ° C to be dissolved. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 4] Example 4
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 214.403g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 8.0g(50mol%)을 가하고, 30분 후, 화합물(2) 9.901g(50mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(2)를 완전히 용해시켰다. 그 후, 6FDA 및 PMDA를 각각 순차적으로 17.755g(80mol%), 2.180g(20mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 214.403 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as mentioned in Example 1, the reactor was heated to 50 ° C., 8.0 g (50 mol%) of TFDB was added, and 30 minutes later. And 9.901 g (50 mol%) of compound (2) were added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (2). Thereafter, 6FDA and PMDA were sequentially added to 17.755 g (80 mol%) and 2.180 g (20 mol%), respectively, and then cooled to 30 ° C to be dissolved. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 5] Example 5
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 212.732g(85.0 wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 13.5g(80 mol%)을 가하고, 30분 후, 화합물(5) 5.610g(20 mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(5)를 완전히 용해시켰다. 그 후, 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(3,3',4,4'-Biphenyltetracarboxylic dianhydride, 이하 BPDA로 표기함) 및 6FDA를 각각 순차적으로 9.302g(60 mol%), 9.363g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 12.732 g (85.0 wt%) of DMAc in a round-bottomed flask under the same conditions as described in Example 1, the temperature of the reactor was raised to 50 ° C., and 13.5 g (80 mol%) of TFDB was added thereto for 30 minutes. Thereafter, 5.610 g (20 mol%) of compound (5) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (5). Subsequently, 9.302 g of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (denoted as 3,3', 4,4'-Biphenyltetracarboxylic dianhydride, hereinafter referred to as BPDA) and 6FDA were respectively sequentially (60 mol%) and 9.363 g (40 mol%) were added, followed by cooling to 30 ° C to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 6] Example 6
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 212.732g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 9.5g(60mol%)을 가하고, 30분 후, 화합물(5) 10.528g(40mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(5)를 완전히 용해시켰다. 그 후, BPDA 및 6FDA를 각각 순차적으로 8.728g(60mol%), 8.785g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling DM12 212.732 g (85.0 wt%) in a round bottom flask under the same conditions as mentioned in Example 1, the reactor was heated to 50 ° C., 9.5 g (60 mol%) of TFDB was added, and 30 minutes later. 10.528 g (40 mol%) of Compound (5) were added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (5). Thereafter, 8.728 g (60 mol%) and 8.785 g (40 mol%) of BPDA and 6FDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 7] Example 7
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 212.732g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 14.0g(80mol%)을 가하고, 30분 후, 화합물(6) 5.118g(20mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(6)을 완전히 용해시켰다. 그 후, BPDA 및 6FDA를 각각 순차적으로 9.647g(60mol%), 9.710g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling DMAc 212.732 g (85.0 wt%) in a round bottom flask under the same conditions as described in Example 1, the temperature of the reactor was raised to 50 ° C., 14.0 g (80 mol%) of TFDB was added, and 30 minutes later. , 5.118 g (20 mol%) of compound (6) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (6). Thereafter, 9.647 g (60 mol%) and 9.710 g (40 mol%) were added to BPDA and 6FDA sequentially, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 8] Example 8
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 216.375g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 10.0g(60mol%)을 가하고, 30분 후, 화합물(6) 9.749g(40mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(6)을 완전히 용해시켰다. 그 후, BPDA 및 6FDA를 각각 순차적으로 9.187g(60mol%), 9.248g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 216.375 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., TFDB 10.0 g (60 mol%) was added, and after 30 minutes 9.749 g (40 mol%) of Compound (6) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (6). Thereafter, 9.187 g (60 mol%) and 9.248 g (40 mol%) were added to BPDA and 6FDA sequentially, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 9] Example 9
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 216.031g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-디아미노디페닐 에테르 (2,2'-Bis(trifluoromethyl)-4,4'-diamin odiphenyl ether, 이하 6FODA로 표기함) 8.0g(70mol%)을 가하고, 30분 후, 화합물(10) 8.286g (30mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 6FODA 및 화합물(10)을 완전히 용해시켰다. 그 후, 사이클로부탄-1,2,3,4-테트라카르복실릭 디안하이드라이드 (Cyclobutane-1,2,3,4-tetracarboxylic dianhydride, 이하 CBDA로 표기함) 및 6FDA를 각각 순차적으로 8.166g(70mol%), 7.927g(30mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 216.031 g (85.0 wt%) of DMAc in a round-bottomed flask under the same conditions as described in Example 1, the temperature of the reactor was raised to 50 ° C., thereby yielding 2,2′-bis (trifluoromethyl)- 8.0 g (70 mol%) of 4,4'-diaminodiphenyl ether (2,2'-Bis (trifluoromethyl) -4,4'-diamin odiphenyl ether, hereinafter referred to as 6FODA) was added, and after 30 minutes, the compound (10) 8.286 g (30 mol%) were added. Thereafter, the monomer was stirred for 1 hour to completely dissolve 6FODA and compound (10). Subsequently, 8.166 g of cyclobutane-1,2,3,4-tetracarboxylic dianhydride (hereinafter referred to as CBDA) and 6FDA were sequentially 70 mol%) and 7.927g (30mol%) were added, and it cooled to 30 degreeC and dissolved. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 10] Example 10
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 216.031g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 6FODA 7.5g(40mol%)을 가하고, 30분 후, 화합물(10) 15.536g(60mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 6FODA 및 화합물(10)을 완전히 용해시켰다. 그 후, CBDA 및 6FDA를 각각 순차적으로 7.655g(70mol%), 7.432g(30mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 216.031 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., and 7.5 g (40 mol%) of 6FODA was added thereto, and 30 minutes later. 15.536 g (60 mol%) was added to Compound (10). Thereafter, the monomer was stirred for 1 hour to completely dissolve 6FODA and compound (10). Thereafter, 7.655 g (70 mol%) and 7.432 g (30 mol%) of CBDA and 6FDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 11] Example 11
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 212.422g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 6FODA 14.0g(70mol%)을 가하고, 30분 후, 화합물(13) 7.394g(30mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 6FODA 및 화합물(13)을 완전히 용해시켰다. 그 후, CBDA 및 6FDA를 각각 순차적으로 8.166g(70mol%), 7.927g(30mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 212.422 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as mentioned in Example 1, the temperature of the reactor was raised to 50 ° C., and 14.0 g (70 mol%) of 6FODA was added thereto, followed by 30 minutes. 7.394 g (30 mol%) was added to the compound (13). Thereafter, the monomer was stirred for 1 hour to completely dissolve 6FODA and compound (13). Thereafter, 8.166 g (70 mol%) and 7.927 g (30 mol%) of CBDA and 6FDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 12] Example 12
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 220.319g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 6FODA 8.0g(40mol%)을 가하고, 30분 후, 화합물(13) 14.787g(60mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 6FODA 및 화합물(13)을 완전히 용해시켰다. 그 후, CBDA 및 6FDA를 각각 순차적으로 8.166g(70mol%), 7.927g(30mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 220.319 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as mentioned in Example 1, the reactor was heated to 50 ° C., 8.0 g (40 mol%) of 6FODA was added, and 30 minutes later. 14.787 g (60 mol%) of Compound (13) were added. Thereafter, the monomer was stirred for 1 hour to completely dissolve 6FODA and compound (13). Thereafter, 8.166 g (70 mol%) and 7.927 g (30 mol%) of CBDA and 6FDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 13] Example 13
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 220.807g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2- 비스 (3-아미노-4-메틸페닐)-헥사플루오로프로판 (2,2-Bis (3-amino-4-methylphenyl)-hexafluoropropane, 이하 BIS-AT-AF로 표기함) 1.8g(10mol%)을 가하고, 30분 후, 화합물(15) 27.204g(90mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 BIS-AT-AF 및 화합물(15)을 완전히 용해시켰다. 그 후, CBDA 및 PMDA를 각각 순차적으로 7.794g(80mol%), 2.167g(20mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 220.807 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as mentioned in Example 1, the temperature of the reactor was increased to 50 ° C., thereby obtaining 2,2-bis (3-amino-4-methylphenyl ) -Hexafluoropropane (2,2-Bis (3-amino-4-methylphenyl) -hexafluoropropane, hereinafter referred to as BIS-AT-AF) 1.8 g (10 mol%) was added thereto, and 30 minutes later, a compound (15 27.204 g (90 mol%) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve BIS-AT-AF and Compound (15). Thereafter, 7.794 g (80 mol%) and 2.167 g (20 mol%) of CBDA and PMDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 14] Example 14
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 210.783g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, BIS-AT-AF 5.5g(30mol%)을 가하고, 30분 후, 화합물(15) 21.551g(70mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 BIS-AT-AF 및 화합물(15)을 완전히 용해시켰다. 그 후, CBDA 및 PMDA를 각각 순차적으로 7.939g(80mol%), 2.207g(20mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 210.783 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., and 5.5 g (30 mol%) of BIS-AT-AF was added thereto. After 30 minutes, 21.551 g (70 mol%) of Compound (15) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve BIS-AT-AF and Compound (15). Thereafter, 7.939 g (80 mol%) and 2.207 g (20 mol%) of CBDA and PMDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 15] Example 15
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 210.783g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 4,4'- 디아미노디페닐설폰(4,4'-Diaminodiphenylsulfone, 이하 4,4'-DDS로 표기함) 1.1g(10mol%)을 가하고, 30분 후, 화합물(19) 20.271g(90mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 4,4'-DDS 및 화합물(19)를 완전히 용해시켰다. 그 후, BPDA 및 6FDA를 각각 순차적으로 7.821g(60mol%), 7.872g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 210.783 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the temperature of the reactor was raised to 50 ° C. to give 4,4′-diaminodiphenylsulfone (4, 1.1 g (10 mol%) of 4'-Diaminodiphenylsulfone (hereinafter referred to as 4,4'-DDS) was added, and after 30 minutes, 20.271 g (90 mol%) of compound (19) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve 4,4'-DDS and Compound (19). Thereafter, 7.821 g (60 mol%) and 7.872 g (40 mol%) of BPDA and 6FDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 16] Example 16
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 208.903g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 4,4'-DDS 3.5g(30mol%)을 가하고, 30분 후, 화합물(19) 16.722g(70mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 4,4'-DDS 및 화합물(19)를 완전히 용해시켰다. 그 후, BPDA 및 6FDA를 각각 순차적으로 8.295g(60mol%), 8.349g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 208.903 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the temperature of the reactor was raised to 50 ° C., and 3.5 g (30 mol%) of 4,4′-DDS was added. After 30 minutes, 16.722 g (70 mol%) of compound (19) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve 4,4'-DDS and Compound (19). Thereafter, 8.295 g (60 mol%) and 8.349 g (40 mol%) of BPDA and 6FDA were sequentially added, and then cooled to 30 ° C to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 17] Example 17
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 208.903g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 15.0g(90mol%)을 가하고, 30분 후, 화합물(21) 3.166g(10mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(21)를 완전히 용해시켰다. 그 후, 6FDA 및 BPDA를 각각 순차적으로 13.871g(60mol%), 6.125g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 208.903 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as mentioned in Example 1, the temperature of the reactor was raised to 50 ° C., 15.0 g (90 mol%) was added thereto, and 30 minutes later. , 3.166 g (10 mol%) of Compound (21) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (21). Thereafter, 13.871 g (60 mol%) and 6.125 g (40 mol%) of 6FDA and BPDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 18] Example 18
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 210.212g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 7.0g(50mol%)을 가하고, 30분 후, 화합물(21) 13.299g(50mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(21)를 완전히 용해시켰다. 그 후, 6FDA 및 BPDA를 각각 순차적으로 11.652g(60mol%), 5.145g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 210.212 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as mentioned in Example 1, the reactor was heated to 50 ° C., 7.0 g (50 mol%) of TFDB was added, and 30 minutes later. And 13.299 g (50 mol%) of compound (21) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (21). Thereafter, 11.652 g (60 mol%) and 5.145 g (40 mol%) of 6FDA and BPDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 19] Example 19
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 210.212g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 15.0g(90mol%)을 가하고, 30분 후, 화합물(24) 3.916g(10mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(24)를 완전히 용해시켰다. 그 후, 6FDA 및 1,2,3,4-싸이클로펜탄테트라카볼실릭 디안하이드라이드 (1,2,3,4-Cyclopentanetetracarboxylic Dianhydride, 이하 CPDA라 표기함)를 각각 순차적으로 16.183g(70mol%), 3.281g(30mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 210.212 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., TFDB 15.0 g (90 mol%) was added, and 30 minutes later. , 3.916 g (10 mol%) of Compound (24) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (24). Then, 16.183 g (70 mol%) of 6FDA and 1,2,3,4-cyclopentanetetracarbolic dianhydride (denoted as 1,2,3,4-Cyclopentanetetracarboxylic Dianhydride, hereinafter CPDA) were sequentially 3.281g (30mol%) was added, and it cooled to 30 degreeC and dissolved. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[실시예 20] Example 20
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 209.418g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 6.5g(50mol%)을 가하고, 30분 후, 화합물(24) 15.274g(50mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB 및 화합물(24)를 완전히 용해시켰다. 그 후, 6FDA 및 CPDA를 각각 순차적으로 12.623g(70mol%), 2.599g(30mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 209.418 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as mentioned in Example 1, the temperature of the reactor was increased to 50 ° C., 6.5 g (50 mol%) of TFDB was added, and 30 minutes later. 15.274 g (50 mol%) of Compound (24) was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve TFDB and compound (24). Thereafter, 6FDA and CPDA were sequentially added to 12.623 g (70 mol%) and 2.599 g (30 mol%), respectively, and then cooled to 30 ° C to be dissolved. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[비교예 1] Comparative Example 1
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 216.359g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 17.0g(100mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB를 완전히 용해시켰다. 그 후, 6FDA 및 PMDA를 각각 순차적으로 18.865g(80mol%), 2.316g(20mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 216.359 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., and 17.0 g (100 mol%) of TFDB was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve the TFDB. Thereafter, 6FDA and PMDA were each sequentially added 18.865 g (80 mol%) and 2.316 g (20 mol%), and then cooled to 30 ° C to be dissolved. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[비교예 2] Comparative Example 2
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 214.823g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 18.0g(100mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB를 완전히 용해시켰다. 그 후, BPDA 및 6FDA를 각각 순차적으로 9.922g(60mol%), 9.987g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 214.823 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., and 18.0 g (100 mol%) of TFDB was added thereto. Thereafter, the monomer was stirred for 1 hour to completely dissolve the TFDB. Thereafter, 9.922 g (60 mol%) and 9.987 g (40 mol%) were added to BPDA and 6FDA sequentially, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[비교예 3] Comparative Example 3
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 214.752g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 6FODA 21.0g(100mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 6FODA를 완전히 용해시켰다. 그 후, CBDA 및 6FDA를 각각 순차적으로 8.574g(70mol%), 8.323g(30mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 214.752 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., and 21.0 g (100 mol%) of 6FODA was added thereto. Thereafter, the monomer was stirred for 1 hour to completely dissolve 6FODA. Thereafter, 8.574 g (70 mol%) and 8.323 g (30 mol%) of CBDA and 6FDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[비교예 4] [Comparative Example 4]
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 211.266g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, BIS-AT-AF 24.0g(100mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 BIS-AT-AF를 완전히 용해시켰다. 그 후, CBDA 및 PMDA를 각각 순차적으로 10.393g(80mol%), 2.890g(20mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 211.266 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the temperature of the reactor was increased to 50 ° C., and 24.0 g (100 mol%) of BIS-AT-AF was added. It was. Thereafter, the monomer was stirred for 1 hour to completely dissolve the BIS-AT-AF. Thereafter, 10.393 g (80 mol%) and 2.890 g (20 mol%) of CBDA and PMDA were sequentially added, and then cooled to 30 ° C. to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[비교예 5] [Comparative Example 5]
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 206.259g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 4,4'-DDS 15.0g(100mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 4,4'-DDS를 완전히 용해시켰다. 그 후, BPDA 및 6FDA를 각각 순차적으로 10.664g(60mol%), 10.734g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 206.259 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., and 15.0 g (100 mol%) of 4,4′-DDS was added. Was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve the 4,4'-DDS. Thereafter, 10.664 g (60 mol%) and 10.734 g (40 mol%) of BPDA and 6FDA were sequentially added, and then cooled to 30 ° C to dissolve. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
[비교예 6] Comparative Example 6
1. 폴리아믹산 조성물의 제조1. Preparation of Polyamic Acid Composition
상기 실시예 1에서 언급한 것과 동일한 조건으로 둥근바닥 플라스크에 DMAc 208.837g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, TFDB 17.0g(100mol%)을 가하였다. 이후, 1시간 동안 해당 모노머를 교반하여 TFDB를 완전히 용해시켰다. 그 후, 6FDA 및 CPDA를 각각 순차적으로 16.507g(70mol%), 3.347g(40mol%) 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 3시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 폴리아믹산 조성물을 얻었다.After filling 208.837 g (85.0 wt%) of DMAc in a round bottom flask under the same conditions as described in Example 1, the reactor was heated to 50 ° C., and 17.0 g (100 mol%) of TFDB was added. Thereafter, the monomer was stirred for 1 hour to completely dissolve the TFDB. Thereafter, 6FDA and CPDA were sequentially added to 16.507 g (70 mol%) and 3.347 g (40 mol%), respectively, and then cooled to 30 ° C to be dissolved. Solid content at this time was 15%, and then stirred for 3 hours. After the reaction of the monomer was completed, it was naturally cooled to obtain a polyamic acid composition.
2. 투명 폴리이미드 필름의 제조 2. Preparation of Transparent Polyimide Film
무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.Colorless and transparent polyimide film production process was carried out in the same manner as in Example 1.
상기 실시예 1~20 및 비교예 1~6에서 제조된 폴리아믹산 조성물의 조성은 하기 표 1과 같다. 이때 몰%는 디아민, 산이무수물 전체 중의 각 모노머의 몰 비율을 나타낸다.Compositions of the polyamic acid composition prepared in Examples 1 to 20 and Comparative Examples 1 to 6 are as shown in Table 1 below. At this time, mol% represents the mole ratio of each monomer in diamine and the whole acid dianhydride.
디아민 (몰%)Diamine (mol%) 산이무수물 (몰%)Acid dianhydride (mol%)
제1모노머First Monomer 제2모노머Second Monomer 제1모노머First Monomer 제2모노머Second Monomer
실시예 1Example 1 TFDB (90)TFDB (90) 화합물1 (10)Compound 1 (10) 6FDA (80)6FDA (80) PMDA (20)PMDA (20)
실시예 2Example 2 TFDB (50)TFDB (50) 화합물1 (50)Compound 1 (50) 6FDA (80)6FDA (80) PMDA (20)PMDA (20)
실시예 3Example 3 TFDB (90)TFDB (90) 화합물2 (10)Compound 2 (10) 6FDA (80)6FDA (80) PMDA (20)PMDA (20)
실시예 4Example 4 TFDB (50)TFDB (50) 화합물2 (50)Compound 2 (50) 6FDA (80)6FDA (80) PMDA (20)PMDA (20)
실시예 5Example 5 TFDB (80)TFDB (80) 화합물5 (20)Compound 5 (20) BPDA (60)BPDA (60) 6FDA (40)6FDA (40)
실시예 6Example 6 TFDB (60)TFDB (60) 화합물5 (40)Compound 5 (40) BPDA (60)BPDA (60) 6FDA (40)6FDA (40)
실시예 7Example 7 TFDB (80)TFDB (80) 화합물6 (20)Compound 6 (20) BPDA (60)BPDA (60) 6FDA (40)6FDA (40)
실시예 8Example 8 TFDB (60)TFDB (60) 화합물6 (40)Compound 6 (40) BPDA (60)BPDA (60) 6FDA (40)6FDA (40)
실시예 9Example 9 6FODA (70)6FODA (70) 화합물10 (30)Compound 10 (30) CBDA (70)CBDA (70) 6FDA (30)6FDA (30)
실시예 10Example 10 6FODA (40)6FODA (40) 화합물10 (60)Compound 10 (60) CBDA (70)CBDA (70) 6FDA (30)6FDA (30)
실시예 11Example 11 6FODA (70)6FODA (70) 화합물13 (30)Compound 13 (30) CBDA (70)CBDA (70) 6FDA (30)6FDA (30)
실시예 12Example 12 6FODA (40)6FODA (40) 화합물13 (60)Compound 13 (60) CBDA (70)CBDA (70) 6FDA (30)6FDA (30)
실시예 13Example 13 BIS-AT-AF (10)BIS-AT-AF (10) 화합물15 (90)Compound 15 (90) CBDA (80)CBDA (80) PMDA (20)PMDA (20)
실시예 14Example 14 BIS-AT-AF (30)BIS-AT-AF (30) 화합물15 (70)Compound 15 (70) CBDA (80)CBDA (80) PMDA (20)PMDA (20)
실시예 15Example 15 4,4-DDS (10)4,4-DDS (10) 화합물19 (90)Compound 19 (90) BPDA (60)BPDA (60) 6FDA (40)6FDA (40)
실시예 16Example 16 4,4-DDS (30)4,4-DDS (30) 화합물19 (70)Compound 19 (70) BPDA (60)BPDA (60) 6FDA (40)6FDA (40)
실시예 17Example 17 TFDB (90)TFDB (90) 화합물21 (10)Compound 21 (10) 6FDA (60)6FDA (60) BPDA (40)BPDA (40)
실시예 18Example 18 TFDB (50)TFDB (50) 화합물21 (50)Compound 21 (50) 6FDA (60)6FDA (60) BPDA (40)BPDA (40)
실시예 19Example 19 TFDB (90)TFDB (90) 화합물24 (10)Compound 24 (10) 6FDA (70)6FDA (70) CPDA (30)CPDA (30)
실시예 20Example 20 TFDB (50)TFDB (50) 화합물24 (50)Compound 24 (50) 6FDA (70)6FDA (70) CPDA (30)CPDA (30)
비교예 1Comparative Example 1 TFDB (100)TFDB 100 -- 6FDA (80)6FDA (80) PMDA (20)PMDA (20)
비교예 2Comparative Example 2 TFDB (100)TFDB 100 -- BPDA (60)BPDA (60) 6FDA (40)6FDA (40)
비교예 3Comparative Example 3 6FODA (100)6FODA (100) -- CBDA (70)CBDA (70) 6FDA (30)6FDA (30)
비교예 4Comparative Example 4 BIS-AT-AF (100)BIS-AT-AF 100 -- CBDA (80)CBDA (80) PMDA (20)PMDA (20)
비교예 5Comparative Example 5 4,4-DDS (100)4,4-DDS (100) -- BPDA (60)BPDA (60) 6FDA (40)6FDA (40)
비교예 6Comparative Example 6 TFDB (10)TFDB (10) 6FDA (7)6FDA (7) CPDA (3)CPDA (3)
[물성 평가][Property evaluation]
상기 실시예 1~20 및 비교예 1~6에서 제조된 폴리이미드 필름을 하기와 같은 방법으로 물성을 평가하였으며, 그 결과를 하기 표 2에 나타내었다.Physical properties of the polyimide films prepared in Examples 1 to 20 and Comparative Examples 1 to 6 were evaluated in the following manner, and the results are shown in Table 2 below.
<물성평가 방법><Property evaluation method>
(1) 광투과도 측정(1) Light transmittance measurement
550nm 파장에서 UV-Vis NIR Spectrophotometer(Shimadzu, 모델명: UV-3150)를 이용하여 측정하였다. Measurement was performed using a UV-Vis NIR Spectrophotometer (Shimadzu, model name: UV-3150) at a wavelength of 550 nm.
(2) 황색도 측정(2) yellowness measurement
분광측색계(Konica Minolta, 모델명: CM-3700d)를 이용하여 황색도를 ASTM E313 규격으로 측정하였다. Yellowness was measured according to ASTM E313 using a spectrophotometer (Konica Minolta, model name: CM-3700d).
(3) 인장강도 및 탄성율 측정(3) Measurement of tensile strength and elastic modulus
UTM(Instron, 모델명: 5942)을 이용하여 ISO 527-3 규격으로 인장강도(MPa), 탄성율(GPa)을 측정하였다.Tensile strength (MPa) and elastic modulus (GPa) were measured according to ISO 527-3 using UTM (Instron, Model Name: 5942).
(4) 필름 두께 측정(4) film thickness measurement
두께 측정기(Mitutoyo, 모델명: 293-140)로 필름의 두께를 측정하였다. The thickness of the film was measured by a thickness gauge (Mitutoyo, model name: 293-140).
(5) 유리전이온도(Glass Transition Temperature, Tg)(5) Glass Transition Temperature (Tg)
DMA(TA Instrument, 모델명: Q800)를 이용하여 유리전이온도를 측정하였다.Glass transition temperature was measured using a DMA (TA Instrument, model name: Q800).
두께(㎛)Thickness (㎛) 투과도(%)Permeability (%) 황색도Yellow road 유리전이온도(℃)Glass transition temperature (℃) 인장강도(Mpa)Tensile Strength (Mpa) 탄성률(Gpa)Modulus of elasticity (Gpa)
실시예 1Example 1 5252 9090 3.23.2 340340 129129 4.24.2
실시예 2Example 2 5050 9090 2.92.9 345345 144144 4.64.6
실시예 3Example 3 5151 9090 3.33.3 339339 128128 4.04.0
실시예 4Example 4 4949 9090 3.13.1 342342 141141 4.44.4
실시예 5Example 5 5151 9090 2.72.7 330330 137137 4.64.6
실시예 6Example 6 5252 9191 2.52.5 337337 142142 4.84.8
실시예 7Example 7 5050 9090 2.92.9 329329 140140 4.74.7
실시예 8Example 8 5050 9090 2.82.8 331331 144144 4.94.9
실시예 9Example 9 4949 9191 2.72.7 321321 127127 3.93.9
실시예 10Example 10 5151 9191 2.52.5 336336 132132 4.24.2
실시예 11Example 11 4949 9191 2.92.9 327327 129129 4.04.0
실시예 12Example 12 5050 9191 2.72.7 339339 136136 4.44.4
실시예 13Example 13 5252 9090 2.92.9 341341 133133 4.34.3
실시예 14Example 14 4848 9090 2.92.9 338338 129129 4.14.1
실시예 15Example 15 5050 9090 3.23.2 349349 128128 3.93.9
실시예 16Example 16 5151 9090 3.73.7 347347 124124 3.73.7
실시예 17Example 17 5151 9090 2.92.9 330330 135135 4.54.5
실시예 18Example 18 5050 9191 2.92.9 337337 144144 4.94.9
실시예 19Example 19 5151 8888 3.83.8 329329 112112 3.63.6
실시예 20Example 20 4949 8989 3.53.5 334334 124124 3.93.9
비교예 1Comparative Example 1 5151 9090 3.33.3 337337 124124 3.93.9
비교예 2Comparative Example 2 5050 9090 2.92.9 325325 130130 4.34.3
비교예 3Comparative Example 3 5050 9191 3.13.1 307307 117117 3.73.7
비교예 4Comparative Example 4 5252 8888 2.92.9 321321 109109 3.63.6
비교예 5Comparative Example 5 4949 8585 5.75.7 332332 9797 3.23.2
비교예 6Comparative Example 6 5151 8787 4.24.2 319319 107107 3.43.4
상기 표 2를 살펴본 결과, 본 발명에 따른 화학식 1의 신규 디아민 모노머가 첨가된 실시예 1~20의 필름의 경우, 신규 디아민 모노머를 비포함하는 비교예 1~6의 필름과 비교하여 광투과도 상승 및 황색도 감소의 우수한 광학 특성을 가질 뿐만 아니라, 유리전이온도 상승에 의한 열 특성, 인장강도 및 탄성률 상승 등에 의한 우수한 기계적 특성을 가진다는 것을 알 수 있었다.As a result of looking at Table 2, in the case of the films of Examples 1 to 20 to which the new diamine monomer of Formula 1 was added according to the present invention, the light transmittance was increased in comparison with the films of Comparative Examples 1 to 6 containing no new diamine monomer. And it was found that not only has excellent optical properties of yellowishness reduction, but also excellent mechanical properties such as thermal properties due to glass transition temperature rise, tensile strength and elastic modulus increase.
이에 따라, 본 발명의 폴리이미드 필름은 종래 폴리이미드 필름의 광학적, 열적, 기계적 특성을 개선함을 알 수 있으며, 상기 폴리이미드 필름은 플랫 패널 디스플레이 제조시 유리 기판 대신에 투명 플라스틱 기판으로 유용하게 적용할 수 있음을 확인할 수 있었다.Accordingly, it can be seen that the polyimide film of the present invention improves the optical, thermal, and mechanical properties of the conventional polyimide film, and the polyimide film is usefully applied as a transparent plastic substrate instead of a glass substrate when manufacturing a flat panel display. It could be confirmed.

Claims (13)

  1. 하기 화학식 1로 표시되는 화합물:Compound represented by the following formula (1):
    [화학식 1][Formula 1]
    Figure PCTKR2016012829-appb-I000014
    Figure PCTKR2016012829-appb-I000014
    상기 화학식 1에서, In Chemical Formula 1,
    Y는 C6~C40의 아릴렌기로서, 상기 C6~C40의 아릴렌기는 할로겐 또는 할로겐 원자로 치환된 C1~C6 알킬기로 치환될 수 있으며, Y is a C 6 ~ C 40 arylene group, the C 6 ~ C 40 arylene group may be substituted with a halogen or a C 1 ~ C 6 alkyl group substituted with a halogen atom,
    X1 및 X2은 서로 동일하거나 상이하며, 각각 독립적으로 수소, 할로겐, C1~C6의 알킬기, 및 하나 이상의 수소가 할로겐 원자로 치환된 C1~C6의 알킬기로 이루어진 군에서 선택되며, 다만 X1, X2 및 Y 중 적어도 하나 이상은 할로겐 또는 할로겐 원자로 치환된 C1~C6의 알킬기를 가지며, X 1 and X 2 are the same or different, are each independently selected from hydrogen, halogen, the group consisting of an alkyl group of C 1 ~ C 6 alkyl, and C 1 ~ in which one or more hydrogen substituted with halogen atoms C 6, the Provided that at least one of X 1 , X 2 and Y has a halogen or a C 1 to C 6 alkyl group substituted with a halogen atom,
    n은 0 내지 3의 정수이다. n is an integer of 0-3.
  2. 제1항에 있어서, The method of claim 1,
    상기 X1 및 X2는 각각 독립적으로 F 또는 CF3인 전자흡인성기(EWG)인 것을 특징으로 하는 화합물. X 1 and X 2 are each independently an electron-withdrawing group (EWG) which is F or CF 3 .
  3. 제1항에 있어서, The method of claim 1,
    상기 화학식 1에서, Y는 하기 화학식으로 표시되는 치환체 군에서 선택되는 것을 특징으로 하는 화합물:In Formula 1, Y is selected from the group of substituents represented by the following formula:
    Figure PCTKR2016012829-appb-I000015
    ,
    Figure PCTKR2016012829-appb-I000016
    ,
    Figure PCTKR2016012829-appb-I000017
    ,
    Figure PCTKR2016012829-appb-I000018
    ,
    Figure PCTKR2016012829-appb-I000019
    ,
    Figure PCTKR2016012829-appb-I000020
    ,
    Figure PCTKR2016012829-appb-I000021
    Figure PCTKR2016012829-appb-I000015
    ,
    Figure PCTKR2016012829-appb-I000016
    ,
    Figure PCTKR2016012829-appb-I000017
    ,
    Figure PCTKR2016012829-appb-I000018
    ,
    Figure PCTKR2016012829-appb-I000019
    ,
    Figure PCTKR2016012829-appb-I000020
    ,
    Figure PCTKR2016012829-appb-I000021
    상기 치환체에서, In the above substituents,
    R1 내지 R3는 서로 동일하거나 또는 상이하며, 각각 독립적으로 수소, F, 및 CF3로 이루어진 군에서 선택된다. R 1 to R 3 are the same as or different from each other, and are each independently selected from the group consisting of hydrogen, F, and CF 3 .
  4. 제1항에 있어서, The method of claim 1,
    상기 화학식 1로 표시되는 화합물은 하기 화학식으로 표시되는 화합물 군에서 선택되는 것을 특징으로 하는 화합물.Compound represented by Formula 1 is selected from the group of compounds represented by the following formula.
    Figure PCTKR2016012829-appb-I000022
    Figure PCTKR2016012829-appb-I000022
    Figure PCTKR2016012829-appb-I000023
    Figure PCTKR2016012829-appb-I000023
    Figure PCTKR2016012829-appb-I000024
    Figure PCTKR2016012829-appb-I000024
    Figure PCTKR2016012829-appb-I000025
    Figure PCTKR2016012829-appb-I000025
  5. (a) 제1항 내지 제4항 중 어느 한 항에 기재된 화학식 1의 화합물을 함유하는 디아민;(a) a diamine containing a compound of formula 1 according to any one of claims 1 to 4;
    (b) 산이무수물; 및 (b) acid dianhydrides; And
    (c) 유기용매를 포함하며, (c) comprises an organic solvent,
    상기 화학식 1로 표시되는 화합물은 전체 디아민 100 몰%를 기준으로 10 내지 90 몰% 범위로 포함되는 것을 특징으로 하는 폴리아믹산 조성물. Compound represented by the formula (1) is a polyamic acid composition, characterized in that included in 10 to 90 mol% range based on 100 mol% total diamine.
  6. 제5항에 있어서, The method of claim 5,
    상기 디아민은 불소화 제1디아민; 설폰계 제2디아민, 히드록시계 제3디아민, 에테르계 제4디아민 및 지환족 제5디아민으로 구성된 군으로부터 선택되는 1종 이상을 더 포함하는 것을 특징으로 하는 폴리아믹산 조성물. The diamine is fluorinated first diamine; A polyamic acid composition further comprising at least one member selected from the group consisting of sulfonated second diamine, hydroxy third diamine, ether fourth diamine, and alicyclic fifth diamine.
  7. 제6항에 있어서, The method of claim 6,
    상기 불소화 제1디아민, 설폰계 제2디아민, 히드록시계 제3디아민, 에테르계 제4디아민 및 지환족 제5디아민의 함량은 각각 전체 디아민 100 몰%를 기준으로 10 내지 90 몰%인 것을 특징으로 하는 폴리아믹산 조성물. The content of the fluorinated first diamine, sulfone-based second diamine, hydroxy-based third diamine, ether-based fourth diamine and cycloaliphatic fifth diamine are each 10 to 90 mol% based on 100 mol% of all diamines. Polyamic acid composition to be.
  8. 제5항에 있어서, The method of claim 5,
    상기 산이무수물은 불소화 방향족 제1산이무수물, 지환족 제2산이무수물 및 비불소화 방향족 제3산이무수물로 구성된 군에서 선택되는 1종 이상을 포함하는 것을 특징으로 하는 폴리아믹산 조성물. The acid dianhydride is a polyamic acid composition, characterized in that it comprises one or more selected from the group consisting of fluorinated aromatic first acid dianhydride, alicyclic second acid dianhydride and non-fluorinated aromatic third acid dianhydride.
  9. 제8항에 있어서, The method of claim 8,
    상기 제1산이무수물, 제2산이무수물 및 제3 산이무수물로 구성된 군에서 선택되는 1종 이상의 화합물의 함량은 전체 산이무수물 100 몰%를 기준으로 10 내지 100 몰%인 것을 특징으로 하는 폴리아믹산 조성물. The content of at least one compound selected from the group consisting of the first acid dianhydride, the second acid dianhydride and the third acid dianhydride is 10 to 100 mol% based on 100 mol% of the total acid dianhydride. .
  10. 제5항에 있어서, The method of claim 5,
    상기 디아민(a)과 상기 산이무수물(b)의 몰수의 비(a/b)는 0.7 내지 1.3 범위인 것을 특징으로 하는 폴리아믹산 조성물.A ratio (a / b) of the number of moles of diamine (a) and acid dianhydride (b) is in the range of 0.7 to 1.3.
  11. 제5항의 폴리아믹산 조성물을 이미드화하여 제조된 투명 폴리이미드 필름. The transparent polyimide film manufactured by imidating the polyamic-acid composition of Claim 5.
  12. 제11항에 있어서, The method of claim 11,
    하기 (i) 내지 (v)의 물성 조건을 만족하는 것을 특징으로 하는 투명 폴리이미드 필름:Transparent polyimide film, characterized by satisfying the following physical property conditions of (i) to (v):
    (i)유리전이온도(Tg)가 320 내지 400℃ 범위이며, (i) the glass transition temperature (T g ) ranges from 320 to 400 ° C.,
    (ii) 필름 두께 50㎛ 기준으로 파장 550nm의 광선 투과율이 88% 이상이며, (ii) the light transmittance of wavelength 550nm is 88% or more based on the film thickness of 50 micrometers,
    (iii) ASTM E313 규격에 의한 황색도가 4.0 이하이며, (iii) the yellowness according to ASTM E313 is 4.0 or less;
    (iv) 인장강도가 110 MPa 이상이며, (iv) tensile strength is 110 MPa or more,
    (v) 인장 탄성률이 3.5 GPa 이상임. (v) the tensile modulus is 3.5 GPa or more.
  13. 제11항에 있어서, The method of claim 11,
    플렉서블 디스플레이용 기판 또는 보호막으로 사용되는 것을 특징으로 하는 투명 폴리이미드 필름. A transparent polyimide film, which is used as a substrate or a protective film for a flexible display.
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