WO2020124890A1 - 线栅型偏光片制作方法及透明显示装置 - Google Patents

线栅型偏光片制作方法及透明显示装置 Download PDF

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Publication number
WO2020124890A1
WO2020124890A1 PCT/CN2019/082596 CN2019082596W WO2020124890A1 WO 2020124890 A1 WO2020124890 A1 WO 2020124890A1 CN 2019082596 W CN2019082596 W CN 2019082596W WO 2020124890 A1 WO2020124890 A1 WO 2020124890A1
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Prior art keywords
layer
polarizer
imprint
metal layer
metal
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PCT/CN2019/082596
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English (en)
French (fr)
Inventor
侯俊
陈书志
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G02F1/133548—Wire-grid polarisers

Definitions

  • the present disclosure relates to the field of liquid crystal display, and particularly to a method of manufacturing a wire grid polarizer and a transparent display device.
  • Transparent liquid crystal displays can be used in shopping malls and supermarket display windows, refrigerator door perspectives, window stores, etc., and can also be used to create transparent boxes, glass decorative lamp creative equipment and other fields, allowing consumers to enjoy the convenience brought by technological innovation.
  • the general transparent LCD will add W (white) color resistance on the basis of the existing R, G, B color resistance to improve the transparency of the display.
  • W white
  • polarized light placed orthogonally is attached to both sides of the liquid crystal cell To achieve normal display. After the backlight passes through two layers of polarizers, its brightness will drop by more than 50%. At the same time, due to the addition of W color resistance, the display color saturation of the display device decreases and the color performance is not good.
  • the existing transparent display device has the problems of low display color saturation and poor color expression capability. Therefore, it is necessary to provide a wire grid polarizer manufacturing method and a transparent display device to improve this defect.
  • the transparent liquid crystal display will increase the W (white) color resistance on the basis of the existing R, G, B color resistance to improve the transparency of the display.
  • W white
  • polarizers placed orthogonally on both sides of the liquid crystal cell Achieve normal display. After the backlight passes through two layers of polarizers, its brightness will drop by more than 50%. At the same time, due to the addition of W color resistance, the display color saturation of the display device decreases, and the color performance is not good.
  • the present disclosure provides a manufacturing method of a wire grid polarizer and a transparent display device, which are used to solve the problem of ripples in the existing foldable display device.
  • the present disclosure provides a method for manufacturing a wire grid polarizer, including:
  • the metal layer is etched to form a plurality of metal lines arranged in parallel on the pixel area at intervals, and the photoresist strip is removed, and the plurality of metal lines constitute the wire grid polarizer.
  • the step S20 includes:
  • S202 Provide a nano-imprint template, and use the nano-imprint template to imprint the photoresist layer to form an imprinted strip and an imprinted layer;
  • S204 Etching and removing the imprint layer to form a plurality of the photoresist strips arranged in parallel on the pixel area.
  • the material of the metal layer is aluminum or silver.
  • the thickness of the metal layer is in the range of 100-300 nm.
  • the distance between two adjacent metal lines in the metal layer is in the range of 20-100 nm.
  • the method for depositing the metal layer is physical vapor deposition.
  • the method of etching and removing the imprint layer in step S203 is: performing dry etching on the imprint layer by using a mixed gas of oxygen and sulfur hexafluoride gas to remove The imprint layer is removed by etching.
  • the present disclosure provides a method for manufacturing a wire grid polarizer, including:
  • the thickness of the metal layer is in the range of 100-300 nm, and the distance between the two adjacent metal lines in the metal layer is in the range of 20-100 nm.
  • the step S20 includes:
  • S202 Provide a nano-imprint template, and use the nano-imprint template to imprint the photoresist layer to form an imprinted strip and an imprinted layer;
  • S204 Etching and removing the imprint layer to form a plurality of the photoresist strips arranged in parallel on the pixel area.
  • the material of the metal layer is aluminum or silver.
  • the method for depositing the metal layer is physical vapor deposition.
  • the method of etching and removing the imprint layer in step S203 is: performing dry etching on the imprint layer by using a mixed gas of oxygen and sulfur hexafluoride gas to remove The imprint layer is removed by etching.
  • the present disclosure provides a transparent display device including a liquid crystal panel including a color film substrate and an array substrate, a liquid crystal layer, a first polarizer, and a second polarizer that are oppositely arranged;
  • the first polarizer and the second polarizer are both wire grid polarizers composed of a plurality of metal wires arranged side by side at intervals.
  • the material of the metal wire is aluminum or silver.
  • the distance between two adjacent metal lines is in the range of 20-100 nm.
  • the thickness range of the first polarizer and the second polarizer are both 100-300 nm.
  • the first polarizer is disposed on the color film substrate away from the liquid crystal layer
  • the second polarizer is disposed on the array substrate away from the liquid crystal layer.
  • the first polarizer is disposed on the color filter substrate close to the liquid crystal layer side
  • the second polarizer is disposed on the array substrate close to the liquid crystal layer side
  • the embodiment of the present disclosure improves the ability of the polarizer to transmit incident light and the polarization effect by replacing the traditional polarizer with a wire grid polarizer having a plurality of metal wires arranged side by side at the same time
  • the W pixel area of the type polarizer is vacated, so that the light emitted by the backlight is not weakened in the W pixel area, and the transmittance and contrast of the display device are greatly improved, thereby improving the color performance of the display device.
  • FIG. 1 is a schematic flowchart of a manufacturing method provided by an embodiment of the present disclosure
  • FIG. 2 is a schematic flowchart of a manufacturing method provided by an embodiment of the disclosure
  • FIG. 3 is a schematic structural view of a wire grid polarizer provided by an embodiment of the disclosure.
  • FIG. 4 is a schematic structural diagram of a wire grid polarizer provided by an embodiment of the disclosure.
  • FIG. 5 is a schematic structural diagram of a wire grid polarizer provided by an embodiment of the disclosure.
  • FIG. 6 is a schematic structural diagram of a wire grid polarizer provided by an embodiment of the disclosure.
  • FIG. 7 is a schematic structural diagram of a transparent display device according to an embodiment of the present disclosure.
  • FIG. 8 is a schematic structural diagram of another transparent display device provided by an embodiment of the present disclosure.
  • the present disclosure provides a method for manufacturing a wire grid polarizer, which will be described in detail below with reference to FIGS. 1 to 4.
  • FIG. 1 is a manufacturing method provided by an embodiment of the present disclosure. The method includes:
  • step S10 as shown in FIG. 3, a substrate 302 is provided, and a metal layer 303 is deposited on the substrate 302.
  • Step S20 as shown in FIG. 5, forming a plurality of photoresist strips 501 arranged side by side on the metal layer 303;
  • step S30 as shown in FIG. 6, the metal layer 303 is etched to form a plurality of metal lines 601 arranged in parallel on the pixel area 305 (for example, the RGB pixel area), and the photoresist strip 501 is removed ,
  • the plurality of metal wires 601 constitute the wire grid polarizer.
  • step S20 further includes:
  • a nano-imprint template 403 is provided, and the nano-imprint template 403 is used to imprint the photoresist layer 304 to form an imprinting strip 401 and an imprinting layer 402;
  • the imprint layer 402 is etched away to form a plurality of photoresist stripes 501 arranged on the pixel area 305 in parallel and spaced apart.
  • the nanoimprint template 403 is provided with a plurality of grooves 404 having a rectangular cross-sectional shape juxtaposed at intervals in the direction of the pixel area 305.
  • the nano-imprint template 403 is a smooth plane.
  • the photoresist layer 304 is subjected to an imprinting process.
  • the portion not imprinted by the groove 404 is formed in a plurality of imprinting stripes 401 arranged in parallel in the direction of the pixel area 305, and the portion imprinted by the nanoimprint template 402 Then, the imprint layer 402 is formed.
  • the photoresist of the imprint layer 402 needs to be etched to remove the imprint layer 402 to obtain a photoresist pattern.
  • the method of etching and removing the imprint layer 402 in the step S203 is: performing dry etching on the imprint layer 402 using a mixed gas of oxygen and sulfur hexafluoride gas Etching to etch away the imprint layer 402.
  • the polarization characteristics of the wire grid polarizer are related to the material of the metal layer 303.
  • the material of the metal layer 303 used to make the wire grid polarizer is one of aluminum or silver.
  • the polarization characteristics of the wire grid polarizer are also related to the structure of the metal wire 501.
  • the thickness of the metal layer 303 is 100-300 nm, and the distance between two adjacent metal wires 501 is 20 -100nm.
  • the method of depositing the metal layer is physical vapor deposition.
  • the width of the groove 404 of the nano-imprint template 403 can be adjusted according to the width of the required metal line.
  • the area of the R/G/B pixels can be appropriately increased.
  • the disclosure also provides a transparent display device, which will be described in detail below with reference to FIG. 7.
  • a transparent display device provided in this embodiment includes a liquid crystal panel
  • the liquid crystal panel includes a color filter substrate 701 and an array substrate 702, a liquid crystal layer 703, a first polarizer 706, and a second polarizer 707 that are oppositely arranged.
  • the first polarizer 706 and the second polarizer 707 are both wire grid polarizers manufactured by the method for manufacturing a wire grid polarizer described in Embodiment 1.
  • the first polarizer 706 and the second polarizer 707 are composed of a plurality of metal wires 709 arranged side by side and spaced apart, and no metal wire 709 is provided on the W pixel area 705 to facilitate light from the W
  • the pixel area directly passes through, so that it is not absorbed and utilized by the polarizer, which greatly improves the light transmittance of the W pixel area.
  • both the first polarizer 706 and the second polarizer 707 are external polarizers.
  • the first polarizer 706 is disposed on the color film substrate 701 on the side away from the liquid crystal layer 703.
  • the second polarizer 707 is disposed on the array substrate 702 away from the liquid crystal layer 703.
  • the transparent display device further includes a backlight module 708 disposed on the side of the array substrate 702 away from the liquid crystal layer 703.
  • the present disclosure also provides a transparent display device, which will be described in detail below with reference to FIG. 8.
  • a transparent display device provided in this embodiment includes a liquid crystal panel
  • the liquid crystal panel includes a color filter substrate 801 and an array substrate 802, a liquid crystal layer 803, a first polarizer 806, and a second polarizer 807 that are oppositely arranged.
  • the first polarizer 806 and the second polarizer 807 are both external polarizers, and the first polarizer 806 is disposed on the color film substrate 801 close to the liquid crystal layer 803 side
  • the second polarizer 807 is disposed on the array substrate 802 near the liquid crystal layer 803.
  • a first inorganic protective layer 808 and a second inorganic protective layer 809 are provided on both sides of the first polarizer 806, and a third inorganic protective layer 810 and a fourth inorganic protective layer 811 are provided on both sides of the second polarizer 807.
  • the first polarizer 806 and the second polarizer 807 can be prevented from being oxidized and corroded, and the service life thereof can be improved.
  • the transparent display device further includes a backlight module 708, and the backlight module 812 is disposed on a side of the array substrate 802 away from the liquid crystal layer 803.
  • the embodiment of the present disclosure improves the ability of the polarizer to transmit incident light and the polarization effect by replacing the traditional polarizer with a wire grid polarizer having a plurality of metal wires arranged side by side, and at the same time, the W pixel of the wire grid polarizer The area is vacated, so that the light emitted by the backlight is not weakened in the W pixel area, which greatly improves the transmittance and contrast of the display device, thereby improving the color performance of the display device.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

一种线栅型偏光片的制作方法及透明显示装置，方法包括：提供基板（302），在基板（302）上沉积形成金属层（303）（S10）；在金属层（303）上形成多个并列间隔排布的光阻条（501）（S20）；对金属层（303）进行刻蚀，形成在像素区域（305）上并列间隔排布的多条金属线（601），去除光阻条（501），金属线（601）构成线栅型偏光片（S30）。

Description

线栅型偏光片制作方法及透明显示装置 技术领域
本揭示涉及液晶显示领域，尤其涉及一种线栅型偏光片制作方法及透明显示装置。
 背景技术
透明液晶显示器可用于商场超市陈列窗、冰箱门透视、橱窗卖场等，还可以用来打造透明箱体、玻璃装饰灯创意设备等多个领域，让消费者享受科技创新带来的便利。
一般的透明液晶显示器会在现有R、G、B色阻的基础上增加W（白色）色阻以提升显示器透明度，在普通显示器的架构下，液晶盒两侧会贴附正交放置的偏光片以实现正常显示。背光经过两层偏光片以后，其亮度会下降50%以上，同时也由于W色阻的加入，导致显示装置的显示色彩饱和度下降，颜色表现能力不好。
综上所述，现有透明显示装置存在显示色彩饱和度低，颜色表现能力不好的问题。故，有必要提供一种线栅型偏光片制作方法及透明显示装置来改善这一缺陷。
 技术问题
透明液晶显示器会在现有R、G、B色阻的基础上增加W（白色）色阻以提升显示器透明度，在普通显示器的架构下，液晶盒两侧会贴附正交放置的偏光片以实现正常显示。背光经过两层偏光片以后，其亮度会下降50%以上，同时也由于W色阻的加入，导致显示装置的显示色彩饱和度下降，颜色表现能力不好。
 技术解决方案
本揭示提供一种线栅型偏光片制作方法及透明显示装置，用于解决现有可折叠显示装置产生波纹现象的问题。
本揭示提供一种线栅型偏光片的制作方法，包括:
S10：提供基板，在所述基板上沉积形成金属层；以及
S20：在所述金属层上形成多个并列间隔排布的光阻条；
S30：对所述金属层进行刻蚀，形成在像素区域上并列间隔排布的多条金属线，去除所述光阻条，所述多条金属线构成所述线栅型偏光片。
根据本揭示一实施例，所述步骤S20包括：
S201：在所述金属层上涂布一层光阻，形成光阻层；
S202：提供纳米压印模板，采用所述纳米压印模板对所述光阻层进行压印处理，形成压印条以及压印层；
S203：对所述纳米压印模板进行脱膜；以及
S204：刻蚀去除所述压印层，形成在所述像素区域上并列间隔排布的多个所述光阻条。
根据本揭示一实施例，所述金属层的材料为铝或银。
根据本揭示一实施例，所述金属层的厚度范围为100-300nm。
根据本揭示一实施例，所述金属层中相邻两条金属线的间隔距离范围为20-100nm。
根据本揭示一实施例，沉积所述金属层的方法为物理气相沉积。
根据本揭示一实施例，所述步骤S203中将所述压印层刻蚀去除的方法为：采用氧气和六氟化硫气体的混合气体对所述压印层进行干法刻蚀，以将所述压印层刻蚀去除。
本揭示提供一种线栅型偏光片的制作方法，包括:
S10：提供基板，在所述基板上沉积形成金属层；
S20：在所述金属层上形成多个并列间隔排布的光阻条；以及
S30：对所述金属层进行刻蚀，形成在像素区域上并列间隔排布的多条金属线，去除所述光阻条，所述多条金属线构成所述线栅型偏光片；
其中，所述金属层的厚度范围为100-300nm，所述金属层中相邻两条金属线的间隔距离范围为20-100nm。
根据本揭示一实施例，所述步骤S20包括：
S201：在所述金属层上涂布一层光阻，形成光阻层；
S202：提供纳米压印模板，采用所述纳米压印模板对所述光阻层进行压印处理，形成压印条以及压印层；
S203：对所述纳米压印模板进行脱膜；以及
S204：刻蚀去除所述压印层，形成在所述像素区域上并列间隔排布的多个所述光阻条。
根据本揭示一实施例，所述金属层的材料为铝或银。
根据本揭示一实施例，沉积所述金属层的方法为物理气相沉积。
根据本揭示一实施例，所述步骤S203中将所述压印层刻蚀去除的方法为：采用氧气和六氟化硫气体的混合气体对所述压印层进行干法刻蚀，以将所述压印层刻蚀去除。
本揭示提供一种透明显示装置，包括液晶面板，所述液晶面板包括相对设置的彩膜基板和阵列基板、液晶层、第一偏光片以及第二偏光片；
其中，所述第一偏光片以及第二偏光片均为多条并列间隔排布的金属线组成的线栅型偏光片。
根据本揭示一实施例，所述金属线的材料为铝或银。
根据本揭示一实施例，相邻两条所述金属线之间的间隔距离范围为20-100nm。
根据本揭示一实施例，所述第一偏光片和所述第二偏光片的厚度范围均为100-300nm。
根据本揭示一实施例，所述第一偏光片设置于所述彩膜基板上远离所述液晶层一侧，所述第二偏光片设置于所述阵列基板上远离所述液晶层一侧。
根据本揭示一实施例，所述第一偏光片设置于所述彩膜基板上靠近所述液晶层一侧，所述第二偏光片设置于所述阵列基板上靠近所述液晶层一侧。
 有益效果
本揭示的有益效果：本揭示实施例通过将传统偏光片替换为具有多条并列间隔排布金属线的线栅型偏光片，提高了偏光片透过入射光的能力以及偏振效果，同时在线栅型偏光片的W像素区域空出，使得背光源发出的光线在W像素区域不被削弱，大幅提高显示装置的穿透率和对比度，从而提升显示装置的颜色表现能力。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是揭示的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本揭示实施例提供的制作方法的流程示意图；
图2为本揭示实施例提供的制作方法的流程示意图；
图3为本揭示实施例提供的线栅型偏光片的结构示意图；
图4为本揭示实施例提供的线栅型偏光片的结构示意图；
图5为本揭示实施例提供的线栅型偏光片的结构示意图；
图6为本揭示实施例提供的线栅型偏光片的结构示意图；
图7为本揭示实施例提供的一种透明显示装置的结构示意图；
图8为本揭示实施例提供的另一种透明显示装置的结构示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
下面结合附图和具体实施例对本揭示做进一步的说明：
本揭示提供了一种线栅型偏光片的制作方法，下面结合图1至图4进行详细说明。
如图1所示，图1为本揭示实施例提供的制作方法，所述方法包括：
步骤S10，如图3所示，提供一块基板302，在所述基板302上沉积形成金属层303。
步骤S20，如图5所示，在所述金属层303上形成多个并列间隔排布的光阻条501；
步骤S30，如图6所示，对所述金属层303进行刻蚀，形成在像素区域305(例如为RGB像素区域)上并列间隔排布的多条金属线601，去除所述光阻条501，所述多条金属线601构成所述线栅型偏光片。
在本实施例中，所述步骤S20还包括：
S201：如图3所示，在所述金属层303上涂布一层光阻，形成光阻层304；
S202：如图4所示，提供一块纳米压印模板403，采用所述纳米压印模板403对所述光阻层304进行压印处理，形成压印条401以及压印层402；
S204：对所述纳米压印模板403进行脱膜；
S203：如图5所示，刻蚀去除所述压印层402，形成在所述像素区域305上并列间隔排布的多个光阻条501。
如图4所示，在本实施例中，所述纳米压印模板403在像素区域305方向上间隔并列设置有多个截面形状为矩形的凹槽404，在W像素区域306方向上，所述纳米压印模板403为光滑平面。对光阻层304进行压印制程，没有被凹槽404所压印的部分形成在像素区域305方向上并列间隔排布的多条压印条401，被纳米压印模板402压印的部分则形成压印层402。在步骤S203中，需要对压印层402的光阻进行刻蚀，以去除压印层402，获得光阻图案。
具体地，在本实施例中，所述步骤S203中将所述压印层402刻蚀去除的方法为：采用氧气和六氟化硫气体的混合气体对所述压印层402进行干法刻蚀，以将所述压印层402刻蚀去除。
具体地，线栅型偏光片的偏光特性与金属层303的材料相关，为了取得更好的偏振效果，用以制作线栅型偏光片的金属层303的材料为铝或银中的一种。
具体地，线栅型偏光片的偏光特性同样与金属线501的结构相关，为了取得更好的偏振效果，金属层303的厚度为100-300nm，相邻两条金属线501的间隔距离为20-100nm。
具体地，沉积所述金属层的方法为物理气相沉积。
进一步的，纳米压印模板403的凹槽404宽度可以根据所需要金属线的宽度进行调整，同时为了保证显示器的颜色表现能力，可以适当增大R/G/B像素的面积。
本揭示还提供了一种透明显示装置，下面结合图7进行详细说明。
本实施例提供的一种透明显示装置包括液晶面板；
所述液晶面板包括相对设置的彩膜基板701和阵列基板702、液晶层703、第一偏光片706以及第二偏光片707。
在本实施例中，所示第一偏光片706和所述第二偏光片707均为利用实施例一所述的线栅型偏光片制作方法制成的线栅型偏光片。在像素区域704的方向上，第一偏光片706以及第二偏光片707均由多条并列间隔排布的金属线709构成，在W像素区域705上空出没有设置金属线709，便于光线从W像素区域直接穿过，从而不被偏光片吸收利用，大幅度提升了W像素区域的光线透过率。
在本实施例中，第一偏光片706以及第二偏光片707均为外置偏光片，所述第一偏光片706设置于所述彩膜基板701上远离所述液晶层703一侧，所述第二偏光片707设置于所述阵列基板702上远离所述液晶层703一侧。
优选的，所述透明显示装置还包括背光模组708，所述背光模组708设置于所述阵列基板702远离所述液晶层703一侧。
本揭示还提供了一种透明显示装置，下面结合图8进行详细说明。
本实施例提供的一种透明显示装置包括液晶面板；
所述液晶面板包括相对设置的彩膜基板801和阵列基板802、液晶层803、第一偏光片806以及第二偏光片807。
在本实施例中，此时第一偏光片806以及第二偏光片807均为外置偏光片，所述第一偏光片806设置于所述彩膜基板801上靠近所述液晶层803一侧，所述第二偏光片807设置于所述阵列基板802上靠近所述液晶层803一侧。
优选的，在第一偏光片806两侧设置有第一无机保护层808和第二无机保护层809，第二偏光片807两侧设置有第三无机保护层810和第四无机保护层811。通过在内置偏光片两侧设置无机保护层，可以避免第一偏光片806以及第二偏光片807被氧化腐蚀，提高其使用寿命。
优选的，所述透明显示装置还包括背光模组708，所述背光模组812设置于所述阵列基板802远离所述液晶层803一侧。
本揭示实施例通过将传统偏光片替换为具有多条并列间隔排布金属线的线栅型偏光片，提高了偏光片透过入射光的能力以及偏振效果，同时在线栅型偏光片的W像素区域空出，使得背光源发出的光线在W像素区域不被削弱，大幅提高显示装置的穿透率和对比度，从而提升显示装置的颜色表现能力。
综上所述，虽然本揭示以优选实施例揭露如上，但上述优选实施例并非用以限制本揭示，本领域的普通技术人员，在不脱离本揭示的精神和范围内，均可作各种更动与润饰，因此本揭示的保护范围以权利要求界定的范围为基准。

Claims (18)

  1. 一种线栅型偏光片的制作方法，包括:
    S10：提供基板，在所述基板上沉积形成金属层；
    S20：在所述金属层上形成多个并列间隔排布的光阻条；以及
    S30：对所述金属层进行刻蚀，形成在像素区域上并列间隔排布的多条金属线，去除所述光阻条，所述多条金属线构成所述线栅型偏光片。
  2. 如权利要求1所述的制作方法，其中，所述步骤S20包括：
    S201：在所述金属层上涂布一层光阻，形成光阻层；
    S202：提供纳米压印模板，采用所述纳米压印模板对所述光阻层进行压印处理，形成压印条以及压印层；
    S203：对所述纳米压印模板进行脱膜；以及
    S204：刻蚀去除所述压印层，形成在所述像素区域上并列间隔排布的多个所述光阻条。
  3. 如权利要求1所述的制作方法，其中，所述金属层的材料为铝或银。
  4. 如权利要求1所述的制作方法，其中，所述金属层的厚度范围为100-300nm。
  5. 如权利要求1所述的制作方法，其中，所述金属层中相邻两条金属线的间隔距离范围为20-100nm。
  6. 如权利要求1所述的制作方法，其中，沉积所述金属层的方法为物理气相沉积。
  7. 如权利要求2所述的制作方法，其中，所述步骤S203中将所述压印层刻蚀去除的方法为：采用氧气和六氟化硫气体的混合气体对所述压印层进行干法刻蚀，以将所述压印层刻蚀去除。
  8. 一种线栅型偏光片的制作方法，包括:
    S10：提供基板，在所述基板上沉积形成金属层；
    S20：在所述金属层上形成多个并列间隔排布的光阻条；以及
    S30：对所述金属层进行刻蚀，形成在像素区域上并列间隔排布的多条金属线，去除所述光阻条，所述多条金属线构成所述线栅型偏光片；
    其中，所述金属层的厚度范围为100-300nm；
    其中，所述金属层中相邻两条金属线的间隔距离范围为20-100nm。
  9. 如权利要求8所述的制作方法，其中，所述步骤S20包括：
    S201：在所述金属层上涂布一层光阻，形成光阻层；
    S202：提供纳米压印模板，采用所述纳米压印模板对所述光阻层进行压印处理，形成压印条以及压印层；
    S203：对所述纳米压印模板进行脱膜；以及
    S204：刻蚀去除所述压印层，形成在所述像素区域上并列间隔排布的多个所述光阻条。
  10. 如权利要求8所述的制作方法，其中，所述金属层的材料为铝或银。
  11. 如权利要求8所述的制作方法，其中，沉积所述金属层的方法为物理气相沉积。
  12. 如权利要求9所述的制作方法，其中，所述步骤S203中将所述压印层刻蚀去除的方法为：采用氧气和六氟化硫气体的混合气体对所述压印层进行干法刻蚀，以将所述压印层刻蚀去除。
  13. 一种透明显示装置，包括液晶面板，所述液晶面板包括相对设置的彩膜基板和阵列基板、液晶层、第一偏光片以及第二偏光片；
    其中，所述第一偏光片以及第二偏光片均为多条并列间隔排布的金属线组成的线栅型偏光片。
  14. 如权利要求13所述的透明显示装置，其中，所述金属线的材料为铝或银。
  15. 如权利要求13所述的透明显示装置，其中，相邻两条所述金属线之间的间隔距离范围为20-100nm。
  16. 如权利要求13所述的透明显示装置，其中，所述第一偏光片和所述第二偏光片的厚度范围均为100-300nm。
  17. 如权利要求13所述的透明显示装置，其中，所述第一偏光片设置于所述彩膜基板上远离所述液晶层一侧，所述第二偏光片设置于所述阵列基板上远离所述液晶层一侧。
  18. 如权利要求13所述的透明显示装置，其中，所述第一偏光片设置于所述彩膜基板上靠近所述液晶层一侧，所述第二偏光片设置于所述阵列基板上靠近所述液晶层一侧。
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CN109785757B (zh) * 2019-03-20 2021-04-20 合肥鑫晟光电科技有限公司 一种显示基板、显示面板和显示装置
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