WO2020117125A1 - Procédé de détermination d'une pression au niveau d'une surface d'échantillon - Google Patents

Procédé de détermination d'une pression au niveau d'une surface d'échantillon Download PDF

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Publication number
WO2020117125A1
WO2020117125A1 PCT/SE2019/051243 SE2019051243W WO2020117125A1 WO 2020117125 A1 WO2020117125 A1 WO 2020117125A1 SE 2019051243 W SE2019051243 W SE 2019051243W WO 2020117125 A1 WO2020117125 A1 WO 2020117125A1
Authority
WO
WIPO (PCT)
Prior art keywords
pressure
sample
chamber
sample surface
aperture
Prior art date
Application number
PCT/SE2019/051243
Other languages
English (en)
Inventor
Peter Amann
Anders Nilsson
Original Assignee
Scienta Omicron Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Scienta Omicron Ab filed Critical Scienta Omicron Ab
Priority to EP19827855.8A priority Critical patent/EP3891775A1/fr
Priority to CN201980079910.4A priority patent/CN113169016A/zh
Publication of WO2020117125A1 publication Critical patent/WO2020117125A1/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/285—Emission microscopes, e.g. field-emission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/285—Emission microscopes
    • H01J2237/2855—Photo-emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0009—Calibration of the apparatus

Definitions

  • the mean free path for electrons is short for high pressures.
  • a desirable distance between the sample surface and the aperture is 30 pm for XPS in carbon monoxide at a pressure of 1 bar, since the mean free path for 10 keV electrons in carbon monoxide at 1 bar pressure is about 30 pm.
  • a distance of 30 pm would enable a reasonable part of the photoelectrons to pass into the aperture.
  • the pressure at the sample is provided by a flow of gas directed towards the sample surface.
  • the method may comprise another step before step a) of arranging a test container enclosing the sample region and the end wall so that the inside of the low-pressure chamber is in fluid communication with the inside of the test container through the aperture, wherein the sample reference pressures in the sample region are achieved by providing the sample reference pressures in the test container.
  • the different sample reference pressures may be provided more easily compared to the case that an entire vacuum chamber has to be filled.
  • the use of a test container enables the use of pressures higher than 1 bar. Pressures above 1 bar are not possible to apply in ordinary vacuum chambers due to their construction. This is due to the fact that vacuum chambers are designed only for sustaining a low pressure inside. The application of an over pressure in the vacuum chamber may lead to, e.g., breaking of the windows in the vacuum chamber.
  • Fig. 2 shows in more detail the end wall and the aperture in the arrangement shown in Fig. 1, wherein a test chamber has been arranged at the end wall.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

L'invention concerne un procédé de surveillance d'une pression d'échantillon au niveau d'une surface d'échantillon (Ss) d'un échantillon (1) placé dans une région d'échantillon (2), ladite surface d'échantillon (Ss) faisant face à une ouverture (3) dans une paroi (6) séparant la zone d'échantillon (2) d'une chambre basse pression (4) qui est pompée sous vide. Le procédé comprend les étapes consistant à déterminer une relation entre les pressions de référence d'échantillon au niveau de la surface d'échantillon (Ss) et les pressions de référence de chambre dans la chambre basse pression (4), à agencer (103) l'échantillon (1) avec la surface d'échantillon (Ss) faisant face à l'ouverture (3) à une certaine distance de l'ouverture (3), fournir (104) une pression d'échantillon, mesurer (105) une pression de chambre à l'intérieur de la chambre basse pression (4), et à déterminer (106) la pression d'échantillon à l'aide de la pression de chambre mesurée et de la relation déterminée entre les pressions de référence d'échantillon et les pressions de référence de chambre.
PCT/SE2019/051243 2018-12-07 2019-12-06 Procédé de détermination d'une pression au niveau d'une surface d'échantillon WO2020117125A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP19827855.8A EP3891775A1 (fr) 2018-12-07 2019-12-06 Procédé de détermination d'une pression au niveau d'une surface d'échantillon
CN201980079910.4A CN113169016A (zh) 2018-12-07 2019-12-06 用于确定样品表面处的压力的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE1851529A SE542905C2 (en) 2018-12-07 2018-12-07 Method for determining a pressure at a sample surface
SE1851529-6 2018-12-07

Publications (1)

Publication Number Publication Date
WO2020117125A1 true WO2020117125A1 (fr) 2020-06-11

Family

ID=69005795

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/SE2019/051243 WO2020117125A1 (fr) 2018-12-07 2019-12-06 Procédé de détermination d'une pression au niveau d'une surface d'échantillon

Country Status (4)

Country Link
EP (1) EP3891775A1 (fr)
CN (1) CN113169016A (fr)
SE (1) SE542905C2 (fr)
WO (1) WO2020117125A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110967363A (zh) * 2018-10-01 2020-04-07 盛达欧米科有限公司 硬x射线光电子能谱设备和系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4528451A (en) * 1982-10-19 1985-07-09 Varian Associates, Inc. Gap control system for localized vacuum processing
US4560880A (en) * 1983-09-19 1985-12-24 Varian Associates, Inc. Apparatus for positioning a workpiece in a localized vacuum processing system
US5103102A (en) * 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4528451A (en) * 1982-10-19 1985-07-09 Varian Associates, Inc. Gap control system for localized vacuum processing
US4560880A (en) * 1983-09-19 1985-12-24 Varian Associates, Inc. Apparatus for positioning a workpiece in a localized vacuum processing system
US5103102A (en) * 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
H. BLUHM, J. ELECTRON. SPECTROSC. RELAT. PHENOM, vol. 177, 2010, pages 71 - 84
J. KAHK ET AL., J. ELECTRON. SPECTROSC. RELAT. PHENOM, vol. 205, 2015, pages 57 - 65
J. KNUDSEN ET AL.: "A versatile instrument for ambient pressure x-ray photoelectron spectroscopy: The Lund cell approach", SURFACE SCIENCE, vol. 646, 2016, pages 160 - 169, XP029391641, DOI: 10.1016/j.susc.2015.10.038
JOACHIM SCHNADT ET AL: "The new ambient-pressure X-ray photoelectron spectroscopy instrument at MAX-lab", JOURNAL OF SYNCHROTRON RADIATION., vol. 19, no. 5, 1 September 2012 (2012-09-01), DK, pages 701 - 704, XP055672412, ISSN: 0909-0495, DOI: 10.1107/S0909049512032700 *
KNUDSEN JAN ET AL: "A versatile instrument for ambient pressure x-ray photoelectron spectroscopy: The Lund cell approach", SURFACE SCIENCE, NORTH-HOLLAND, AMSTERDAM, NL, vol. 646, 30 October 2015 (2015-10-30), pages 160 - 169, XP029391641, ISSN: 0039-6028, DOI: 10.1016/J.SUSC.2015.10.038 *
OGLETREE ET AL., REV. SCI. INSTRUM., vol. 73, 2002, pages 3872

Also Published As

Publication number Publication date
EP3891775A1 (fr) 2021-10-13
CN113169016A (zh) 2021-07-23
SE542905C2 (en) 2020-09-15
SE1851529A1 (en) 2020-06-08

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