WO2020114277A1 - 显示装置及其制造方法 - Google Patents

显示装置及其制造方法 Download PDF

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Publication number
WO2020114277A1
WO2020114277A1 PCT/CN2019/120945 CN2019120945W WO2020114277A1 WO 2020114277 A1 WO2020114277 A1 WO 2020114277A1 CN 2019120945 W CN2019120945 W CN 2019120945W WO 2020114277 A1 WO2020114277 A1 WO 2020114277A1
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WIPO (PCT)
Prior art keywords
cover plate
support
electrode
away
layer
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Ceased
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PCT/CN2019/120945
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English (en)
French (fr)
Inventor
李铸毅
刘祺
李子华
王强
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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Priority to US16/767,656 priority Critical patent/US11716872B2/en
Publication of WO2020114277A1 publication Critical patent/WO2020114277A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/842—Containers
    • H10K50/8428—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/871—Self-supporting sealing arrangements
    • H10K59/8723—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Definitions

  • the present disclosure relates to the field of display technology, and particularly to a display device and a method of manufacturing the same.
  • the OELD display device may include a cover plate and a display substrate attached to each other.
  • external pressure is applied to the OLED display device, external pressure is applied to the cover plate, so that the cover plate is deformed.
  • the deformed cover plate may come into contact with the display substrate, and the material of the structure in the display substrate may be crushed by the display substrate.
  • the present disclosure provides a display device, including: a display substrate; a first cover plate located on one side of the display substrate; at least one support layer located on the first cover plate away from the display substrate Side.
  • the support layer includes a support structure and a second cover plate, the second cover plate is located on a side of the first cover plate away from the display substrate, and the support structure is used to support the second cover plate.
  • the at least one support layer includes only one support layer; the support structure is located between the first cover plate and the second cover plate.
  • each support layer includes a plurality of support structures spaced from each other.
  • the display substrate includes a base substrate, a pixel defining layer and a plurality of spacers, the pixel defining layer defines a plurality of pixel areas, each pixel area is provided with a first electrode, a light emitting layer And the second electrode.
  • the first electrode is located on one side of the base substrate, and the pixel defining layer is located on the same side of the base substrate as the first electrode,
  • the light emitting layer is located on a side of the first electrode away from the base substrate, the plurality of spacers are located on a side of the pixel defining layer away from the base substrate, and the second electrode A side of the pixel defining layer, the plurality of spacers, and the light-emitting layer remote from the base substrate, and the first cover plate on the second electrode remote from the base substrate Side.
  • the orthographic projection of the plurality of support structures on the base substrate and the orthographic projection of the plurality of spacers on the base substrate, and the pixel defining layer on the substrate overlap in a one-to-one correspondence.
  • the materials of the support structure and the plurality of spacers are the same.
  • the thickness of the support structure ranges from 500 nm to 2000 nm.
  • the present disclosure provides a method for manufacturing a display device, including: forming a first cover plate on a side of a display substrate; forming a support structure and a first cover plate on a side of the first cover plate away from the display substrate At least one supporting layer of the two cover plates, so that the second cover plate is located on a side of the first cover plate structure away from the display substrate, and the support structure is used to support the second cover plate.
  • the number of the support layer is one.
  • the forming at least one support layer on a side of the first cover plate away from the display substrate includes: forming a plurality of support structures spaced apart from each other on a side of the first cover plate away from the display substrate; A second cover plate is formed on a side of the plurality of support structures away from the display substrate.
  • the forming a plurality of support structures spaced apart from each other on the side of the first cover plate away from the display substrate includes: forming a support material layer on the side of the first cover plate away from the display substrate Performing a patterning process on the support material layer to form the plurality of support structures.
  • the display substrate includes a base substrate, a pixel defining layer, and a plurality of spacers.
  • the pixel defining layer defines a plurality of pixel areas, and each pixel area is provided with a first electrode, a light emitting layer, and a second electrode.
  • the first electrode is located on one side of the base substrate, and the pixel defining layer is located on the same side of the base substrate as the first electrode.
  • the light emitting layer is located on a side of the first electrode away from the base substrate, the plurality of spacers are located on a side of the pixel defining layer away from the base substrate, and the second electrode A side of the pixel defining layer, the plurality of spacers, and the light-emitting layer remote from the base substrate, and the first cover plate on the second electrode remote from the base substrate Side.
  • Forming a plurality of support structures spaced apart from each other on the side of the first cover plate away from the display substrate further includes: forming the plurality of support structures so that the plurality of support structures are on the display substrate
  • the projection, the orthographic projection of the plurality of spacers on the display substrate, and the orthographic projection of the pixel defining layer on the base substrate overlap in a one-to-one correspondence.
  • the plurality of support structures and the plurality of spacers are made of the same material.
  • FIG. 1 is a schematic structural diagram of a display device provided by an embodiment of the present disclosure
  • FIG. 2 is a schematic diagram showing the state of the device when it is subjected to external pressure
  • FIG. 3 is a flowchart of a method for manufacturing a display device provided by an embodiment of the present disclosure.
  • the deformed cover plate gets into the material of the structure in the display substrate, which may cause defects such as indentation in the display substrate.
  • FIG. 1 is a schematic structural diagram of a display device provided by an embodiment of the present disclosure.
  • the display device includes: a first cover plate 1 and a display substrate 2 disposed oppositely, and the first cover plate 1 is far away from the display substrate
  • At least one support layer 3 is provided on one side of 2.
  • the support layer 3 includes a support structure 31 and a second cover plate 32.
  • the second cover plate 32 is located on a side of the support structure 31 away from the first cover plate 2.
  • the support structure 31 is used to support the second cover plate 32.
  • the number of the supporting layer 3 is one. In practical applications, the number of support layers 3 can be set according to the needs of product design. For example, the number of support layers 3 may be 2, 3 or more. This embodiment uses one support layer 3, so the structure of the display device can be simplified.
  • the support structure 31 is located on the side of the first cover plate 1 away from the display substrate 2. As shown in FIG. 1, the support structure 31 is located above the first cover plate 1, and the second cover plate 32 is located above the support structure 31. The support structure 31 is supported between the first cover plate 1 and the second cover plate 32. In one embodiment, the support structure 31 is located between the first cover plate 1 and the second cover plate 32. The first cover plate 1 and the second cover plate 32 are spaced apart by the support structure 31 by a predetermined distance, so that the first cover plate 32 is supported on the first cover plate 1 by the support structure 31.
  • each supporting layer 3 the number of supporting structures 31 is multiple, and the multiple supporting structures 31 are arranged at intervals.
  • the number of supporting structures 31 is multiple, and the multiple supporting structures 31 are arranged at intervals.
  • only two support structures 31 are used as an example for description.
  • the display device is an OLED display device.
  • the display substrate 2 includes a base substrate 4, a first electrode 23, a light-emitting layer 24 and a second electrode 22.
  • the second electrode 22 is located on the side of the first cover plate 1 away from the second cover plate 32, the first electrode 23 is located on the side of the second electrode 22 away from the first cover plate 1, and the light emitting layer 24 is located Between the first electrode 23 and the second electrode 22.
  • the light emitting layer 24 is located on the first electrode 23, the second electrode 22 is located on the side of the light emitting layer 24 away from the first electrode 23, and the first cover plate 1 is located on the second electrode 22 away from the first One side of the electrode 23.
  • the first electrode 23 is an anode and the second electrode is a cathode.
  • the first electrode 23 may include multiple sub-electrode layers, for example, three sub-electrode layers, and the materials of the three sub-electrode layers are ITO, Ag, and ITO, respectively.
  • the display substrate 2 further includes a plurality of spacers 21 and a pixel defining layer 25.
  • the pixel defining layer 25 defines a plurality of pixel areas, and the light emitting layer 24 is located in the pixel area.
  • the pixel defining layer 25 is located between the first electrode 23 and the second electrode 22, and the spacer 21 is located between the pixel defining layer 25 and the second electrode 22. Specifically, the spacer 21 is located above the pixel defining layer 25.
  • the second electrode 22 covers both side walls of the spacer 21 and the surface away from the pixel defining layer 25, covers (eg, completely covers) the surface of the pixel defining layer 25 away from the first electrode 23, and covers ( For example, the surface of the light-emitting layer 24 away from the first electrode 23 is completely covered.
  • the display substrate includes a base substrate 4, a first electrode 23, a second electrode 22, a light emitting layer 24, a pixel defining layer 25 and a plurality of spacers 21, the pixel defining layer 25 defines Multiple pixel areas.
  • the first electrode 23 is located in the pixel area and on one side of the base substrate 4.
  • the pixel defining layer 25 is located on the same side of the base substrate 4 as the first electrode 23 and covers (for example, completely covers) the anode 23.
  • the light-emitting layer 24 is located in the pixel area and on the side of the first electrode 23 away from the base substrate 4.
  • the plurality of spacers 21 are located on a side of the pixel defining layer 25 away from the base substrate 4 and on the pixel defining layer 25.
  • the second electrode 22 is located on a side of the pixel defining layer 25, the plurality of spacers 21, and the light emitting layer 23 away from the base substrate 4 and covers (eg, completely covers) the The pixel defining layer 25, the plurality of spacers 21, and the light emitting layer 23.
  • the first cover plate 1 is located on the side of the second electrode 22 away from the base substrate 4. From the top view, the pixel defining layer 25 has a grid shape surrounding the plurality of pixel regions.
  • the pixel defining layer 25 is provided with a through hole through which the anode 23 is coupled to the drain of the thin film transistor in the base substrate 4.
  • a plurality of first electrodes 23 are provided in the display substrate 2, and the plurality of first electrodes 23 are respectively spaced apart from each other and are independently controlled.
  • the display substrate 2 is provided with a second electrode 22.
  • the second electrode 22 extends on the surface of the pixel defining layer 25, the light emitting layer 24 and the plurality of spacers 21 away from the base substrate 4 to form a whole, and is controlled as a whole.
  • the display substrate 2 further includes a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer provided in this order.
  • the hole transport layer and the hole injection layer are located between the first electrode 23 and the light emitting layer 24, the hole injection layer is disposed near the first electrode 23, and the hole transport layer is disposed near the light emitting layer 24; the electron injection layer and the electron transport The layer is located between the light emitting layer 24 and the second electrode 22, the electron transport layer is disposed near the light emitting layer 24, and the electron injection layer is disposed near the second electrode 22.
  • the hole injection layer, hole transport layer, electron transport layer, and electron injection layer are all located in the pixel region. Among them, the hole injection layer, the hole transport layer, the electron transport layer, and the electron injection layer are not shown in the figure.
  • the number of the spacers 21 is plural, and the plurality of spacers 21 are arranged at intervals.
  • FIG. 1 only two spacers 21 are taken as an example for description.
  • each support structure 31 and a corresponding spacer 21 are correspondingly provided. Specifically, the support structure 31 is located above the first cover plate 1 above the correspondingly disposed spacer 21.
  • the orthographic projection of the plurality of support structures 31 on the display substrate 2, the orthographic projection of the plurality of spacers 21 on the display substrate 2, and the pixel defining layer 25 on the display substrate 2 The orthographic projections above completely overlap in a one-to-one correspondence.
  • the materials of the support structure 31 and the spacer 21 are the same.
  • the material of the support structure 31 is a photoresist material.
  • the thickness of the support structure 31 ranges from 500 nm to 2000 nm.
  • the supporting structure 31 can better withstand external pressure.
  • FIG. 2 is a schematic diagram of a state when the display device in FIG. 1 is subjected to external pressure.
  • external pressure is applied to the second cover plate 32, and the second cover plate 32 is deformed. Since the second cover plate 32 is subjected to external pressure, the first cover plate 1 is not deformed, so that the first cover plate 1 does not get in contact with the material of the second electrode 22 in the display substrate 2; further, even the second The cover plate 32 is deformed and squeezed onto the first cover plate 1, and the first cover plate 1 will not be stained with the material of the second electrode 22, thereby realizing the structure that the first cover plate 1 is not stained with the display substrate 2 s material.
  • At least one support layer is provided on the side of the first cover plate away from the display substrate, the support layer includes a support structure and a second cover plate, and when external pressure is applied to the display device, the second The cover plate is subjected to external pressure, so the first cover plate 1 is not deformed, so that the first cover plate does not get in contact with the material of the structure in the display substrate, thereby avoiding defects such as impression marks on the display substrate.
  • FIG. 3 is a flowchart of a method for manufacturing a display device according to an embodiment of the present disclosure. As shown in FIG. 3, the method includes:
  • Step 101 Form a first cover on one side of the display substrate.
  • the display substrate and the first cover plate may be joined to realize the relative arrangement of the display substrate and the first cover plate.
  • Step 102 forming at least one support layer on a side of the first cover plate away from the display substrate, the support layer includes a support structure and a second cover plate, so that the second cover plate is located at the first On a side of the cover plate away from the display substrate, the support structure is used to support the second cover plate.
  • step 102 specifically includes:
  • Step 1021 Form a plurality of support structures spaced apart from each other on the side of the first cover plate away from the display substrate.
  • Step 1021 specifically includes: forming a support material layer on a side of the first cover plate away from the display substrate, and performing a patterning process on the support material layer to form the plurality of support structures.
  • the material of the support structure 31 is a photoresist material, and the patterning process includes exposure and development.
  • Step 1022 Form a second cover plate on a side of the plurality of support structures away from the display substrate.
  • the second cover plate and the first cover plate may be joined, and the support structure is located between the first cover plate and the second cover plate, that is, a portion of the support structure away from the first cover plate
  • the second cover is formed on the side.
  • the plurality of support structures are formed such that the orthographic projection of the plurality of support structures on the display substrate, the orthographic projection of the plurality of spacers on the display substrate, and the The orthographic projections of the pixel defining layer on the display substrate overlap in a one-to-one correspondence.
  • the plurality of support structures and the plurality of spacers are made of the same material.
  • At least one support layer is provided on the side of the first cover plate away from the display substrate, the support layer includes a support structure and a second cover plate, when external pressure is applied to the display device Since the second cover plate is subjected to external pressure, the first cover plate is not deformed, so that the first cover plate does not get in contact with the material of the structure in the display substrate, thereby preventing the display substrate from generating indentation defects.

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Abstract

一种显示装置及其制造方法，该显示装置包括显示基板（2）；第一盖板（1），其位于所述显示基板（2）的一侧；至少一个支撑层（3），其位于所述第一盖板（1）的远离所述显示基板（2）的一侧。所述支撑层（3）包括支撑结构（31）和第二盖板（32），所述第二盖板（32）位于所述第一盖板（1）的远离所述显示基板（2）的一侧，所述支撑结构（31）用于支撑所述第二盖板（32）。

Description

显示装置及其制造方法
相关申请的交叉引用
本申请要求2018年12月6日提交的第201811488878.9号专利申请的优先权，其全部内容通过引用合并于此。
技术领域
本公开涉及显示技术领域，特别涉及一种显示装置及其制造方法。
背景技术
OELD显示装置可包括相互贴合的盖板与显示基板。当外部压力施加于OLED显示装置上时，外部压力施加于盖板上，使得盖板发生变形。变形的盖板会与显示基板接触，并且沾到显示基板中的结构的材料，压坏显示基板。
发明内容
一方面，本公开提供一种显示装置，包括：显示基板；第一盖板，其位于所述显示基板的一侧；至少一个支撑层，其位于所述第一盖板的远离所述显示基板的一侧。所述支撑层包括支撑结构和第二盖板，所述第二盖板位于所述第一盖板的远离所述显示基板的一侧，所述支撑结构用于支撑所述第二盖板。
在一个实施例中，所述至少一个支撑层仅包括一个支撑层；所述支撑结构位于第一盖板与所述第二盖板之间。
在一个实施例中，每个支撑层包括彼此间隔的多个支撑结构。
在一个实施例中，所述显示基板包括衬底基板、像素界定层和多个隔垫物，所述像素界定层限定出多个像素区域，每个像素区域中设置有第一电极、发光层和第二电极。所述第一电极位于衬底基板的一侧，所述像素界定层位于所述衬底基板的与所述第一电极的同一侧，
所述发光层位于所述第一电极的远离所述衬底基板的一侧，所述多个隔垫物位于所述像素界定层的远离所述衬底基板的一侧，所述第二电极 位于所述像素界定层、所述多个隔垫物和所述发光层的远离所述衬底基板的一侧，以及所述第一盖板位于所述第二电极的远离所述衬底基板的一侧。
在一个实施例中，所述多个支撑结构在所述衬底基板上的正投影和所述多个隔垫物在所述衬底基板上的正投影、和像素界定层在所述衬底基板上的正投影以一一对应的方式重叠。
在一个实施例中，所述支撑结构和所述多个隔垫物的材料相同。
在一个实施例中，所述支撑结构的厚度的范围为500nm至2000nm。
一方面，本公开提供一种显示装置的制造方法，包括：在显示基板的一侧形成第一盖板；在所述第一盖板的远离所述显示基板的一侧形成包括支撑结构和第二盖板的至少一个支撑层，使得所述第二盖板位于所述第一盖板构的远离所述显示基板的一侧，所述支撑结构用于支撑所述第二盖板。
在一个实施例中，所述支撑层的数量为一个。所述在所述第一盖板的远离所述显示基板的一侧形成至少一个支撑层包括：在所述第一盖板的远离所述显示基板的一侧形成彼此间隔的多个支撑结构；在所述多个支撑结构的远离所述显示基板的一侧形成第二盖板。
在一个实施例中，所述在所述第一盖板的远离所述显示基板的一侧形成彼此间隔的多个支撑结构包括：在第一盖板的远离显示基板的一侧形成支撑材料层；对所述支撑材料层进行构图工艺形成所述多个支撑结构。
在一个实施例中，所述显示基板包括衬底基板、像素界定层和多个隔垫物。所述像素界定层限定出多个像素区域，每个像素区域中设置有第一电极、发光层和第二电极。所述第一电极位于衬底基板的一侧，所述像素界定层位于所述衬底基板的与所述第一电极的同一侧。所述发光层位于所述第一电极的远离所述衬底基板的一侧，所述多个隔垫物位于所述像素界定层的远离所述衬底基板的一侧，所述第二电极位于所述像素界定层、所述多个隔垫物和所述发光层的远离所述衬底基板的一侧，以及所述第一盖板位于所述第二电极的远离所述衬底基板的一侧。在所述第一盖板的远离所述显示基板的一侧形成彼此间隔的多个支撑结构还包括：形成所述多个支撑结构，使得所述多个支撑结构在所述显示基板上的正投影、所述多 个隔垫物在所述显示基板上的正投影、和像素界定层在所述衬底基板上的正投影以一一对应的方式重叠。
在一个实施例中，所述多个支撑结构和所述多个隔垫物由相同的材料制成。
附图说明
图1为本公开实施例提供的一种显示装置的结构示意图；
图2为显示装置受到外部压力时的状态的示意图；
图3为本公开实施例提供的一种显示装置的制造方法的流程图。
具体实施方式
为使本领域的技术人员更好地理解本公开的技术方案，下面结合附图对本公开提供的显示装置及其制造方法进行详细描述。
在相关技术中，变形的盖板沾到显示基板中的结构的材料，会导致显示基板产生压痕等不良。
图1为本公开实施例提供的一种显示装置的结构示意图，如图1所示，该显示装置包括：相对设置的第一盖板1与显示基板2，第一盖板1的远离显示基板2的一侧设置有至少一个支撑层3。支撑层3包括支撑结构31和第二盖板32，第二盖板32位于支撑结构31的远离第一盖板2的一侧，支撑结构31用于支撑第二盖板32。
本实施例中，支撑层3的数量为一个。在实际应用中，可根据产品设计的需要对支撑层3的数量进行设置。例如，支撑层3的数量可以是2个、3个或更多个。本实施例采用一个支撑层3，因此可简化显示装置的结构。
本实施例中，支撑结构31位于第一盖板1的远离显示基板2的一侧，。如图1所示，支撑结构31位于第一盖板1之上，第二盖板32位于支撑结构31之上。支撑结构31支撑于第一盖板1和第二盖板32之间。在一个实施例中，所述支撑结构31位于第一盖板1与所述第二盖板32之间。第一盖板1与第二盖板32通过所述支撑结构31间隔开预定距离，使得1第二盖板32通过所述支撑结构31被支撑在所述第一盖板1上。
本实施例中，每个支撑层3中，支撑结构31的数量为多个，且多个支撑结构31间隔设置。图1中仅以两个支撑结构31为例进行描述。
本实施例中，显示装置为OLED显示装置。显示基板2包括衬底基板4、第一电极23、发光层24和第二电极22。所述第二电极22位于所述第一盖板1远离所述第二盖板32的一侧，第一电极23位于第二电极22的远离第一盖板1的一侧，发光层24位于第一电极23和第二电极22之间。具体地，发光层24位于第一电极23之上，第二电极22位于发光层24的远离所述第一电极23的一侧，第一盖板1位于第二电极22的远离所述第一电极23的一侧。在一个实施例中，第一电极23为阳极，第二电极为阴极。第一电极23可包括多层子电极层，例如三层子电极层，三层子电极层的材料分别为ITO、Ag和ITO。
在一个实施例中，显示基板2还包括多个隔垫物21和像素界定层25。所述像素界定层25限定出多个像素区域，发光层24位于像素区域中。像素界定层25位于第一电极23与第二电极22之间，隔垫物21位于像素界定层25与第二电极22之间。具体地，隔垫物21位于像素界定层25之上。第二电极22覆盖隔垫物21的两个侧壁和远离所述像素界定层25的表面，覆盖(例如，完全覆盖)像素界定层25的远离所述第一电极23的表面，并且覆盖(例如，完全覆盖)发光层24的远离所述第一电极23的表面。
在一个实施例中，所述显示基板包括衬底基板4、第一电极23、第二电极22、发光层24、像素界定层25和多个隔垫物21、所述像素界定层25限定出多个像素区域。所述第一电极23位于所述像素区域中、并且位于衬底基板4的一侧。所述像素界定层25位于所述衬底基板4的与所述第一电极23的同一侧，并且覆盖(例如，完全覆盖)阳极23。所述发光层24位于所述像素区域中、并且位于所述第一电极23的远离所述衬底基板4的一侧。所述多个隔垫物21位于所述像素界定层25的远离所述衬底基板4的一侧，并且位于所述像素界定层25上。所述第二电极22位于所述像素界定层25、所述多个隔垫物21和所述发光层23的远离所述衬底基板4的一侧，并且覆盖(例如，完全覆盖)所述像素界定层25、所述多个隔垫物21和所述发光层23。所述第一盖板1位于所述第二电极22的远离所述衬底基板4的一侧。从俯视图中看，像素界定层25具有包围所述多 个像素区域的网格形状。像素界定层25设置有通孔，所述阳极23经由所述通孔与衬底基板4中的薄膜晶体管的漏极耦接。
显示基板2中设置有多个第一电极23，所述多个第一电极23分别彼此间隔开的设置并且独立被控制。显示基板2中设置有第二电极22。所述第二电极22在像素界定层25、发光层24和所述多个隔垫物21的远离衬底基板4的表面上延伸形成一个整体、并且作为一个整体进行控制。
显示基板2还包括依次设置的空穴注入层、空穴传输层、电子传输层和电子注入层。其中，空穴传输层和空穴注入层位于第一电极23和发光层24之间，空穴注入层靠近第一电极23设置，空穴传输层靠近发光层24设置；电子注入层和电子传输层位于发光层24和第二电极22之间，电子传输层靠近发光层24设置，电子注入层靠近第二电极22设置。在一个实施例中，空穴注入层、空穴传输层、电子传输层和电子注入层均位于像素区域中。其中，空穴注入层、空穴传输层、电子传输层和电子注入层在图中未示出。
本实施例中，隔垫物21的数量为多个，且多个隔垫物21间隔设置。图1中仅以两个隔垫物21为例进行描述。
本实施例中，每个支撑结构31和一个相应的隔垫物21对应设置。具体地，支撑结构31位于对应设置的隔垫物21上方的第一盖板1之上。所述多个支撑结构31在所述显示基板2上的正投影、所述多个隔垫物21在所述显示基板2上的正投影、以及所述像素界定层25在所述显示基板2上的正投影以一一对应的方式完全重叠。
本实施例中，支撑结构31和隔垫物21的材料相同。例如，支撑结构31的材料为光阻材料。
本实施例中，支撑结构31的厚度的范围为500nm至2000nm。在支撑结构31的厚度采用上述数值范围的情况下，支撑结构31能够更好的承受外部压力。
图2为图1中显示装置受到外部压力时的状态的示意图，如图2所示，当显示装置受到外部压力时，外部压力施加于第二盖板32上，第二盖板32发生变形，由于第二盖板32承受了外部压力，因此第一盖板1未发生形变，进而第一盖板1不会沾到显示基板2中的第二电极22的材料； 进一步地，即便是第二盖板32发生形变而挤压到第一盖板1，第一盖板1也不会沾到第二电极22的材料，从而实现了第一盖板1不会沾到显示基板2中的结构的材料。
本实施例提供的显示装置中，第一盖板的远离显示基板的一侧设置有至少一个支撑层，支撑层包括支撑结构和第二盖板，当外部压力施加于显示装置上时，第二盖板承受了外部压力，因此第一盖板1未发生形变，使得第一盖板不会沾到显示基板中的结构的材料，从而避免了显示基板产生压痕等不良。
图3为本公开实施例提供的一种显示装置的制造方法的流程图，如图3所示，该方法包括：
步骤101、在显示基板的一侧形成第一盖板。
本实施例中，可将显示基板和第一盖板接合，以实现将显示基板和第一盖板相对设置。
步骤102、在所述第一盖板的远离所述显示基板的一侧形成至少一个支撑层，所述支撑层包括支撑结构和第二盖板，使得所述第二盖板位于所述第一盖板的远离所述显示基板的一侧，所述支撑结构用于支撑所述第二盖板。
本实施例中，所述支撑层的数量为一个，则步骤102具体包括：
步骤1021、在所述第一盖板的远离所述显示基板的一侧形成彼此间隔的多个支撑结构。
步骤1021具体包括：在第一盖板的远离显示基板的一侧形成支撑材料层，对所述支撑材料层进行构图工艺形成所述多个支撑结构。其中，支撑结构31的材料为光阻材料，并且构图工艺包括曝光和显影。
步骤1022、在所述多个支撑结构的远离所述显示基板的一侧形成第二盖板。
本实施例中，可将第二盖板和第一盖板接合，此时支撑结构位于第一盖板与第二盖板之间，即，在支撑结构的远离所述第一盖板的一侧形成第二盖板。
在一个实施例中，形成所述多个支撑结构，使得所述多个支撑结构在所述显示基板上的正投影、所述多个隔垫物在所述显示基板上的正投 影、以及所述像素界定层在所述显示基板上的正投影以一一对应的方式重叠。在一个实施例中，所述多个支撑结构和所述多个隔垫物由相同的材料制成。
本实施例提供的显示装置的制造方法中，第一盖板的远离显示基板的一侧设置有至少一个支撑层，支撑层包括支撑结构和第二盖板，当外部压力施加于显示装置上时，第二盖板承受了外部压力，因此第一盖板未发生形变，使得第一盖板不会沾到显示基板中的结构的材料，从而避免了显示基板产生压痕不良。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本公开的保护范围。

Claims (12)

  1. 一种显示装置，包括：
    显示基板；
    第一盖板，其位于所述显示基板的一侧，
    至少一个支撑层，其位于所述第一盖板的远离所述显示基板的一侧；其中
    每一个所述支撑层包括支撑结构和第二盖板，所述第二盖板位于所述支撑结构的远离所述第一盖板的一侧，所述支撑结构用于支撑所述第二盖板。
  2. 根据权利要求1所述的显示装置，
    所述至少一个支撑层仅包括一个支撑层；
    所述支撑结构位于第一盖板与所述第二盖板之间。
  3. 根据权利要求1或2所述的显示装置，其中
    每个支撑层包括彼此间隔的多个支撑结构。
  4. 根据权利要求1所述的显示装置，其中，所述显示基板包括衬底基板、像素界定层和多个隔垫物，所述像素界定层限定出多个像素区域，每个像素区域中设置有第一电极、发光层和第二电极
    所述第一电极位于衬底基板的一侧，
    所述像素界定层位于所述衬底基板的与所述第一电极的同一侧，
    所述发光层位于所述第一电极的远离所述衬底基板的一侧，
    所述多个隔垫物位于所述像素界定层的远离所述衬底基板的一侧，
    所述第二电极位于所述像素界定层、所述多个隔垫物和所述发光层的远离所述衬底基板的一侧，
    所述第一盖板位于所述第二电极的远离所述衬底基板的一侧。
  5. 根据权利要求4所述的显示装置，其中，所述多个支撑结构在所 述衬底基板上的正投影、所述多个隔垫物在所述衬底基板上的正投影、以及像素界定层在所述衬底基板上的正投影以一一对应的方式重叠。
  6. 根据权利要求4所述的显示装置，其中，所述多个支撑结构和所述多个隔垫物的材料相同。
  7. 根据权利要求1所述的显示装置，其中，所述支撑结构的厚度的范围为500nm至2000nm。
  8. 一种显示装置的制造方法，包括：
    在显示基板的一侧形成第一盖板；
    在所述第一盖板的远离所述显示基板的一侧形成包括支撑结构和第二盖板的至少一个支撑层，使得所述第二盖板位于所述第一盖板构的远离所述显示基板的一侧，所述支撑结构用于支撑所述第二盖板。
  9. 根据权利要求8所述的显示装置的制造方法，其中，所述支撑层的数量为一个；
    所述在所述第一盖板的远离所述显示基板的一侧形成至少一个支撑层包括：
    在所述第一盖板的远离所述显示基板的一侧形成彼此间隔的多个支撑结构；
    在所述多个支撑结构的远离所述显示基板的一侧形成第二盖板。
  10. 根据权利要求9所述的显示装置的制造方法，其中，所述在所述第一盖板的远离所述显示基板的一侧形成彼此间隔的多个支撑结构包括：
    在第一盖板的远离显示基板的一侧形成支撑材料层；
    对所述支撑材料层进行构图工艺形成所述多个支撑结构。
  11. 根据权利要求10所述的显示装置的制造方法，其中所述显示基 板包括衬底基板、像素界定层和多个隔垫物，所述像素界定层限定出多个像素区域，每个像素区域中设置有第一电极、发光层和第二电极
    所述第一电极位于衬底基板的一侧，
    所述像素界定层位于所述衬底基板的与所述第一电极的同一侧，
    所述发光层位于所述第一电极的远离所述衬底基板的一侧，
    所述多个隔垫物位于所述像素界定层的远离所述衬底基板的一侧，
    所述第二电极位于所述像素界定层、所述多个隔垫物和所述发光层的远离所述衬底基板的一侧，以及
    所述第一盖板位于所述第二电极的远离所述衬底基板的一侧，以及
    在所述第一盖板的远离所述显示基板的一侧形成彼此间隔的多个支撑结构还包括：形成所述多个支撑结构，使得所述多个支撑结构在所述衬底基板上的正投影、所述多个隔垫物在所述衬底基板上的正投影、以及所述像素界定层在所述衬底基板上的正投影以一一对应的方式重叠。
  12. 根据权利要求11所述的显示装置的制造方法，其中，所述多个支撑结构和所述多个隔垫物由相同的材料制成。
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