WO2020082630A1 - 基板及显示面板的制造方法 - Google Patents

基板及显示面板的制造方法 Download PDF

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Publication number
WO2020082630A1
WO2020082630A1 PCT/CN2019/072252 CN2019072252W WO2020082630A1 WO 2020082630 A1 WO2020082630 A1 WO 2020082630A1 CN 2019072252 W CN2019072252 W CN 2019072252W WO 2020082630 A1 WO2020082630 A1 WO 2020082630A1
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Prior art keywords
substrate
manufacturing
color filter
spacers
forming
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PCT/CN2019/072252
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English (en)
French (fr)
Inventor
黄世帅
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HKC Co Ltd
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HKC Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the present application relates to the field of display, and in particular to a method for manufacturing a substrate and a display panel.
  • Thin-film transistor liquid crystal display (Thin Film Transistor-Liquid Crystal) (TFT-LCD for short) has the characteristics of small size, low power consumption and no radiation. It has developed rapidly in recent years and occupies a dominant position in the current flat panel display market.
  • the main structure of the liquid crystal display is a liquid crystal panel.
  • the design of the cell thickness and the pressure resistance is one of the key technologies of the liquid crystal display, which directly affects the quality of the liquid crystal display.
  • the liquid crystal display is composed of a color filter substrate, an active switch array substrate and two substrates filled with liquid crystal.
  • a large-size liquid crystal display in order to maintain the gap between the two substrates, a plurality of spacers are distributed in the liquid crystal layer to maintain the gap The height of the two substrates is kept parallel.
  • the liquid crystal injection method is mainly liquid crystal vacuum injection method, but the injection time is time-consuming.
  • ODF One Drop Fill
  • the structure of the spacer needs to be updated.
  • spherical spacers are distributed between the liquid crystal layers. This structure damages the substrate due to the spacer rolling when the substrate is under pressure, or is unevenly distributed in the pixel area due to arbitrary distribution. The scattering problem affects the product yield.
  • photolithography Photo Spacer, PS
  • photolithography Photo Spacer, PS
  • a layer of light spacer pillars is usually made on the color filter substrate to support the cell thickness of the liquid crystal layer between the array substrate and the color filter substrate (CellGap ),
  • the area ratio of the optical spacer generally does not exceed 2% of the AA area (the display area of the panel), and the design of the optical spacer ratio (PS ratio) has a great influence on the display of the panel. It is not easy to recover when exposed to external force, and light leakage is easy to occur; if the ratio of the photo spacer is too small, the uniformity of the cell thickness of the liquid crystal layer cannot be guaranteed, resulting in the influence of the optical characteristics of the panel.
  • the optical spacers are divided into main optical spacers (Main PS) and secondary optical spacers (Sub PS).
  • Main optical spacers Main PS
  • Secondary optical spacers Secondary optical spacers
  • the general optical spacer design will design a main optical spacer (Main PS) and a secondary optical spacer to form a breakout to cope with changes in external force.
  • the change of external force is diverse. If only one fault is needed to deal with it, the ability will be weaker.
  • Various changes in external force will cause bubbles or unevenness of gravity (Mura) defects, that is, insufficient liquid crystal filling range (margin LC) , Not conducive to product quality.
  • Mura unevenness of gravity
  • the main purpose of the present application is to provide a method for manufacturing a substrate and a display panel, so as to optimize the aforementioned problems.
  • the object of the present application is to provide a method for manufacturing a substrate, comprising: providing a first substrate; sequentially forming a plurality of photoresist layers arranged in parallel on the first substrate to complete a A color filter layer; while forming one of the photoresist layers, a plurality of primary photo spacers and secondary photo spacers are also formed on the color filter layer; and a transparent common electrode layer is formed and provided on On the color filter layer.
  • Another object of the present application is a method for manufacturing a substrate, comprising: providing a first substrate; sequentially forming a plurality of photoresist layers arranged in parallel on the first substrate to complete a color filter layer; While forming one of the photoresist layers, a plurality of primary photo spacers and secondary photo spacers are also formed on the color filter layer; and a transparent common electrode layer is formed on the color filter layer Above; wherein the shape of the secondary light spacer includes any one of a cross shape, a crack shape, or a polygon; the primary light spacer and the secondary light spacer have a set step difference.
  • Another object of the present application is a method for manufacturing a display panel, including: providing a first substrate; sequentially forming a plurality of photoresist layers arranged in parallel on the first substrate to complete a color filter layer; While forming one of the photoresist layers, a plurality of primary photo spacers and secondary photo spacers are also formed on the color filter layer; a transparent common electrode layer is formed on the color filter layer To complete a first substrate; provide a second substrate, which is opposite to the first substrate, wherein the primary and secondary optical spacers are located on the first substrate and the second substrate To define a liquid crystal space; and form a liquid crystal layer between the first substrate and the second substrate to fill the liquid crystal space; wherein the shape of the secondary optical spacer Including any one of a cross shape, a crack shape, or a polygon; the primary optical spacer and the secondary optical spacer have a set level difference.
  • a plurality of primary optical spacers and secondary optical spacers are also formed in the color filter
  • the steps on the layer include: forming a photoresist material layer on the first substrate; setting a photomask on the photoresist material layer, the photomask having a light-transmitting area, a non-light-transmitting area, and a half A light-transmitting area; and performing an exposure manufacturing and a development manufacturing to form the color filter layer and a plurality of primary optical spacers and secondary optical spacers.
  • the photomask in the manufacturing method of the substrate, is a gray-scale photomask or a half-tone photomask.
  • the shape of the secondary optical spacer includes any one of a cross shape, a crack shape, or a polygon shape.
  • the materials of the primary optical spacer and the secondary optical spacer include polymer materials.
  • one of the photoresist layers and the primary photospacers and secondary photospacers are coated, exposed, developed and The photomask is formed simultaneously.
  • a plurality of primary optical spacers and secondary optical spacers are also formed in the color filter
  • the steps on the optical layer include: forming a photoresist material layer on the first substrate; setting a photomask on the photoresist material layer, the photomask having a light-transmitting area, a non-light-transmitting area and Half of the light-transmitting area; and performing an exposure manufacturing and a development manufacturing to form the color filter layer and a plurality of primary optical spacers and secondary optical spacers.
  • the photomask in the manufacturing method of the display panel, is a gray-scale photomask or a half-tone photomask.
  • the display panel in the manufacturing method of the display panel, may include an LCD (Liquid Crystal) Display panel, wherein the LCD (Liquid Crystal) Display panel includes: a switching array (thin film transistor, TFT) substrate, The color filter layer (CF) substrate and the liquid crystal layer formed between the two substrates, the display panel may also be an OLED (Organic Light-Emitting Diode) panel, or a QLED (Quantum Dots Light-Emitting Diode) panel.
  • LCD Liquid Crystal
  • TFT thin film transistor
  • CF color filter layer
  • the display panel may also be an OLED (Organic Light-Emitting Diode) panel, or a QLED (Quantum Dots Light-Emitting Diode) panel.
  • This application has designed the breakage of multiple spacers to improve the liquid crystal filling range of the product, thereby improving the quality of the product.
  • FIG. 1a is a schematic cross-sectional view of an exemplary display panel.
  • FIG. 1b is a schematic cross-sectional view of the structure in an exemplary display panel.
  • FIG. 2 is a schematic cross-sectional view of a structure in a display panel according to an embodiment of the application.
  • FIG. 3a is a schematic diagram of a shape of a photo spacer in a display panel according to an embodiment of the application.
  • FIG. 3b is a schematic diagram of a shape of a photo spacer in a display panel according to another embodiment of the present application.
  • FIG. 4 is a flowchart of a method for manufacturing a substrate according to an embodiment of the application.
  • FIG. 5 is a flowchart of a method for manufacturing a display panel according to an embodiment of the application.
  • FIG. 1a is a schematic cross-sectional diagram in an exemplary display panel and FIG. 1b is a schematic cross-sectional diagram in an exemplary display panel. Please refer to FIGS. 1a and 1b.
  • a dual-gap semi-transmissive and semi-reverse MVA liquid crystal display is taken as an example.
  • a double-gap half-transflective LCD is provided with an adjustment layer 208 in the reflection area R, as shown in FIG. 1a.
  • This adjustment layer can be provided on the side of a color filter (CF) substrate or thin-film transistor (thin TFT) substrate side.
  • CF color filter
  • TFT thin-film transistor
  • the basic structure of a double-gap transflective MVA liquid crystal display includes a first substrate 10, a color filter substrate 202, and a liquid crystal layer 30.
  • the first substrate 10 has a plurality of sub-pixel regions 110, and each sub-pixel region 110 is provided with a reflective region R and a transmissive region T.
  • the color filter layer substrate 202 also has a plurality of sub-pixel regions 120 corresponding to the plurality of sub-pixel regions 110 of the first substrate, and each sub-pixel region 120 corresponds to the reflective region R
  • An adjustment layer 208 is provided at each of the positions.
  • the liquid crystal layer 30 is disposed between the first substrate 10 and the color filter layer substrate 202.
  • Each sub-pixel region 110 of the first substrate 10 is provided with a thin film transistor (TFT) and a storage capacitor 308 under the reflective region R.
  • TFT thin film transistor
  • a flat layer 104 is formed on the upper surface of the first substrate 10.
  • a concave-convex surface is formed on the flat layer 104 in the reflective region R, and then a metal with high reflectivity (for example: aluminum, silver, etc.) is plated as the reflective electrode 113, and each sub-pixel region 110 penetrates
  • the area T is also provided with a transparent electrode 114.
  • each sub-pixel area 110 of the first substrate 10 further has a contact hole 310 for electrically connecting the reflection electrode 113 and the storage capacitor 308.
  • an alignment protrusion 122 (protrusion, PR) is further provided on the color filter substrate 202 relative to the reflective region R and the transmissive region T of the first substrate 10. Since the alignment protrusions 122 change the distribution of power lines, the liquid crystal molecules are inclined in the direction of the alignment protrusions 122 to produce the effect of multi-domain liquid crystal alignment (multi-domains), which achieves a wide viewing angle technology and improves the single-domain liquid crystal The problem of gray scale inversion in single-domain alignment. As shown in FIG.
  • the color filter substrate 202 when the first substrate 10 and the color filter substrate 202 are assembled together, the color filter substrate 202 is further provided with an optical spacer 300 to fix the cell gap.
  • an optical spacer 300 to fix the cell gap.
  • a plurality of platforms corresponding to the optical spacers 300 are designed on the first substrate side 10, so that the optical spacers 300 can maintain the panel pitch more stably.
  • FIG. 2 is a schematic cross-sectional view of a structure in a display panel according to an embodiment of the present application
  • FIG. 3a is a schematic view of a shape of an optical spacer in a display panel according to an embodiment of the present application
  • FIG. 3b is a display panel according to another embodiment of the present application
  • FIG. 4 is a schematic diagram of the shape of the optical spacer
  • FIG. 4 is a flowchart of a method for manufacturing a substrate according to an embodiment of the present application. Please refer to FIG. 2, FIG. 3a, FIG. 3b and FIG.
  • a method for manufacturing a substrate 21 includes: providing a first substrate 210; sequentially forming a plurality of photoresists arranged in parallel Layers (for example: red photoresist layer, green photoresist layer, blue photoresist layer) 211, 212, 213 on the first substrate 210 to complete a color filter layer 215; these photoresist layers 211 are formed At the same time as one of 212, 213, a plurality of primary optical spacers 320 and secondary optical spacers 322 are also formed on the color filter layer 215; and a transparent common electrode layer 216 is formed on the color filter On the optical layer 215; wherein the shape of the secondary light spacer 322 includes any one of a cross shape, a crack shape, or a polygon; the primary light spacer 320 and the secondary light spacer 322 have a design Fixed step.
  • Layers for example: red photoresist layer, green photoresist layer, blue photoresist layer
  • the step of the object 322 on the color filter layer 215 includes: forming a photoresist layer (not shown) on the first substrate 210; setting a photomask (not shown) on the photoresist layer ), The photomask has a light-transmitting area (for example: 100% transmittance), a non-light-transmitting area (for example: 8% -16% transmittance) and a half light-transmitting area (for example: transmittance) 20% -40%); and performing an exposure manufacturing and a development manufacturing to form the color filter layer 215 and a plurality of primary optical spacers 320 and secondary optical spacers 322.
  • the photomask in the manufacturing method of the substrate 21, is a gray-scale photomask or a half-tone photomask.
  • the materials of the primary optical spacer 320 and the secondary optical spacer 322 include polymer materials.
  • a manufacturing method of a display panel 1 includes: providing a first substrate 210; sequentially forming a plurality of parallel-arranged light A resist layer (for example: a red resist layer, a green resist layer, a blue resist layer) 211, 212, 213 is formed on the first substrate 210 to complete a color filter layer 215; these resist layers are formed At the same time as one of 211, 212, and 213, a plurality of primary optical spacers 320 and secondary optical spacers 322 are also formed on the color filter layer 215; a transparent common electrode layer 216 is formed on the color filter On the optical layer 215, a first substrate 21 is completed; a second substrate 11 is provided opposite to the first substrate 21, wherein the optical spacers (main optical spacer 320, secondary optical spacer 322) ) Is located
  • one of the photoresist layers 211, 212, 213 and the photo-spacers is formed simultaneously through the same photoresist coating, exposure, development and photomask processes.
  • the step of the spacer 322 on the color filter layer 215 includes: forming a photoresist material layer (not shown) on the first substrate 210; setting a photomask on the photoresist material layer (figure) Not shown), the photomask has a light-transmitting area (for example: 100% transmittance), a non-light-transmitting area (for example: 8% -16% transmittance), and a semi-transparent area (for example: penetration Rate 20% -40%); and performing an exposure manufacturing and a development manufacturing, to form the color filter layer 215 and a plurality of primary optical spacers 320 and secondary optical spacers 322.
  • the photomask is a gray-scale photomask or a half-tone photomask.
  • Masks can be divided into two types: gray-tone masks and half-tone masks.
  • the gray mask is used to create micro slits below the resolution of the exposure machine, and then part of the light source is blocked by the micro slits to achieve the half-exposure effect.
  • halftone masks use "semi-transmissive" films for half-exposure. Because the above two methods can show three exposure levels of "exposed part", “half exposed part” and “unexposed part” after one exposure process, two thicknesses of light can be formed after development Resistance (By taking advantage of such a difference in thickness of the photoresist, the pattern can be transferred to the panel substrate in a smaller number of pieces, and the production efficiency of the panel can be improved). If it is a half-tone mask, the cost of the mask will be slightly higher than the average mask.
  • the display panel may include an LCD panel, wherein the LCD panel includes: a switch array substrate, a color filter layer substrate and a liquid crystal layer formed between the two substrates, the display panel may also be an OLED panel, Or QLED panel.
  • a first substrate is provided.
  • a plurality of photoresist layers arranged in parallel are sequentially formed on the first substrate to complete a color filter layer.
  • a plurality of primary photo spacers and secondary photo spacers are also formed on the color filter layer.
  • a transparent common electrode layer is formed and disposed on the color filter layer.
  • the shape of the secondary optical spacer includes any one of a cross shape, a crack shape, or a polygon shape.
  • the primary optical spacer and the secondary optical spacer have a set step difference.
  • a first substrate is provided.
  • a plurality of photoresist layers arranged in parallel are sequentially formed on the first substrate to complete a color filter layer.
  • a plurality of primary photo spacers and secondary photo spacers are also formed on the color filter layer.
  • a transparent common electrode layer is formed and disposed on the color filter layer to complete a first substrate.
  • a second substrate is provided, which is disposed opposite to the first substrate, wherein the primary optical spacers and the secondary optical spacers are located on the first substrate and the second Between the substrates, it is used to define a liquid crystal space.
  • a liquid crystal layer is formed between the first substrate and the second substrate, and fills the liquid crystal space.
  • the shape of the secondary optical spacer includes any one of a cross shape, a crack shape, or a polygon shape.
  • the primary optical spacer and the secondary optical spacer have a set step difference.
  • This application has designed the breakage of multiple optical spacers to improve the liquid crystal filling range of the product, thereby improving the quality of the product and having industrial applicability.

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  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
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  • Chemical & Material Sciences (AREA)
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Abstract

一种基板及显示面板的制造方法，包括：提供一第一基底（210）；依序形成多个平行配置的光阻层（211、212、213）于第一基底（210）上，以完成一彩色滤光层（215）；在形成该些光阻层（211、212、213）之一的同时，也形成多个主要光间隔物（320）及次要光间隔物（322）在彩色滤光层（215）上；以及形成一透明公共电极层（216），设置在彩色滤光层（215）上；其中主要光间隔物（320）及次要光间隔物（322）之间具有设定的段差。

Description

基板及显示面板的制造方法 技术领域
本申请涉及显示领域，特别是涉及一种基板及显示面板的制造方法。
背景技术
薄膜晶体管液晶显示器(Thin Film Transistor-Liquid Crystal Display，简称TFT-LCD)具有体积小，功耗低，无辐射等特点，近年来得到迅速发展，在当前的平板显示器市场中占据主导地位。液晶显示器的主体结构为液晶面板，在液晶面板的制造过程中，盒厚和抗压能力的设计是液晶显示器的关键技术之一，其直接影响液晶显示器的品质。
而液晶显示器由一彩色滤光基板、主动开关阵列基板及二基板间充满液晶所构成，在较大尺寸液晶显示器中，为维持二基板的间隙，在液晶层内分布多个间隔物以维持间隙高度保持二基板平行，另外在液晶注入法以液晶真空注入法为主，但注入时间耗时，目前逐渐以滴下注入法(One Drop Fill，ODF)取代，对于间隔物的结构需要更新设计。已知技术以球型间隔物分布在液晶层间，此种结构在基板受到压力时，因间隔物滚动而破坏基板，或因为任意分布而位于画素区内产生不均匀分布，更因为间隔物的散射问题而影响产品良率，近年以微影技术形成光间隔物(Photo Spacer，PS)，精确的控制间隔物的位置、大小及高度取代传统球型间隔物的构造。
在TFT-LCD(Thin Film Transistor Liquid Crystal Display)领域，通常在彩色滤光片基板上制作一层光间隔物支柱来支撑阵列基板和彩色滤光片基板之间的液晶层的盒厚(Cell Gap)，光间隔物的面积比一般不超过AA区(面板的显示区)的2％，光间隔物比率(PS ratio)的设计对面板显示有很大的影响，光间隔物比率过大，面板受到外力时不容易恢复，容易产生漏光；若光间隔物比率过小，不能保证液晶层的盒厚的均一性，导致面板的光学特性受到影响。
另外光间隔物还会分为主光间隔物(Main PS)和次光间隔物(Sub PS)两种，在玻璃基板不受外力的情况下，主光间隔物(Main PS)起到主要的支撑作用；当受到外力时，主光间隔物被压缩，次光间隔物开始起到支撑作用。一般光间隔物设计会设计一个主光间隔物(Main PS)和一个次光间隔物，来形成断差，以应对外力的变化。但是外力的变化是多样的，只一个断差来应对的话，能力会比较弱，多样的外力变化会导致气泡(bubble)或者重力不均匀(Mura)瑕疵出现，即液晶填充范围(margin LC)不足，不利于产品的品质。
因此，本申请的主要目的在于提供一种基板及显示面板的制造方法，以更优化上述所提的问题。
发明内容
为了解决上述技术问题，本申请的目的在于，提供一种基板的制造方法，包括：提供一第一基底；依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上；以及形成一透明公共电极层，设置在所述彩色滤光层上。
本申请的目的及解决其技术问题还可以采用以下技术方案来实现的。
本申请的另一目的为一种基板的制造方法，包括：提供一第一基底；依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上；以及形成一透明公共电极层，设置在所述彩色滤光层上；其中所述次要光间隔物的形状包括交叉形、裂缝形或多边形中的任意一种；所述主要光间隔物及所述次要光间隔物之间具有设定的段差。
本申请的又一目的为一种显示面板的制造方法，包括：提供一第一基底；依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上；形成一透明公共电极层，设置在所述彩色滤光层上，以完成一第一基板；提供一第二基板，与所述第一基板对向设置，其中该些主要光间隔物及次要光间隔物位于所述第一基板以及所述第二基板之间，用以定义一液晶间隔空间；以及形成一液晶层于所述第一基板以及所述第二基板之间，并填满所述液晶间隔空间；其中所述次要光间隔物的形状包括交叉形、裂缝形或多边形中的任意一种；所述主要光间隔物及所述次要光间隔物之间具有设定的段差。
在本申请的一实施例中，所述基板的制造方法，所述在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上的步骤包括：在所述第一基底上形成一光阻材料层；在所述光阻材料层上设置一光罩，所述光罩具有一透光区、一非透光区以及一半透光区；以及进行一曝光制造以及一显影制造，而形成所述彩色滤光层及多个主要光间隔物及次要光间隔物。
在本申请的一实施例中，所述基板的制造方法，所述光罩为灰阶光罩或半色调光罩。
在本申请的一实施例中，所述基板的制造方法，所述次要光间隔物的形状包括交叉形、裂缝形或多边形中的任意一种。
在本申请的一实施例中，所述基板的制造方法，所述主要光间隔物及次要光间隔物的材质包括聚合物材料。
在本申请的一实施例中，所述显示面板的制造方法，该些光阻层之一和该些主要光间隔物及次要光间隔物是通过相同的光阻涂布、曝光、显影及光罩过程而同时形成。
在本申请的一实施例中，所述显示面板的制造方法，所述在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上的步骤包括：在所述第一基底上形成一光阻材料层；在所述光阻材料层上设置一光罩，所述光罩具有一透光区、一非透光区以及一半透光区；以及进行一曝光制造以及一显影制造，而形成所述彩色滤光层及多个主要光间隔物及次要光间隔物。
在本申请的一实施例中，所述显示面板的制造方法，所述光罩为灰阶光罩或半色调光罩。
在本申请的一实施例中，所述显示面板的制造方法，显示面板可包括LCD(Liquid Crystal Display)面板，其中LCD(Liquid Crystal Display)面板包括：开关阵列(thin film transistor，TFT)基板、彩色滤光层(color filter，CF)基板与形成于两基板之间的液晶层，显示面板也可以为OLED(Organic Light-Emitting Diode)面板，或QLED(Quantum Dots Light-Emitting Diode)面板。
本申请设计了多个间隔物的断差，来提高产品的液晶填充范围，因而提升产品的品质。
附图说明
图1a为范例性的显示面板中横截面示意图。
图1b为范例性的显示面板中的构造横截面示意图。
图2为本申请一实施例的显示面板中的构造横截面示意图。
图3a为本申请一实施例的显示面板中的光间隔物形状示意图。
图3b为本申请另一实施例的显示面板中的光间隔物形状示意图。
图4为本申请一实施例的基板的制造方法流程图。
图5为本申请一实施例的显示面板的制造方法流程图。
具体实施方式
以下各实施例的说明是参考附加的图式，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。
附图和说明被认为在本质上是示出性的，而不是限制性的。在图中，结构相似的单元是以相同标号表示。另外，为了理解和便于描述，附图中示出的每个组件的尺寸和厚度是任意示出的，但是本申请不限于此。
在附图中，为了清晰起见，夸大了层、膜、面板、区域等的厚度。在附图中，为了理解和便于描述，夸大了一些层和区域的厚度。将理解的是，当例如层、膜、区域或基底的组件被称作“在”另一组件“上”时，所述组件可以直接在所述另一组件上，或者也可以存在中 间组件。
另外，在说明书中，除非明确地描述为相反的，否则词语“包括”将被理解为意指包括所述组件，但是不排除任何其它组件。此外，在说明书中，“在......上”意指位于目标组件上方或者下方，而不意指必须位于基于重力方向的顶部上。
为更进一步阐述本申请为达成预定发明目的所采取的技术手段及功效，以下结合附图及具体的实施例，对依据本申请提出的一种基板及显示面板的制造方法，其具体实施方式、结构、特征及其功效，详细说明如后。
图1a为范例性的显示面板中横截面示意图及图1b为范例性的显示面板中的构造横截面示意图。请参考图1a及图1b，在目前的液晶显示器的技术发展上，以双间隙(dual gap)的半穿半反MVA液晶显示器为例。通常双间隙的半穿半反液晶显示器会在反射区R设置一个调整层208，如图1a所示，此调整层可以设置在彩色滤光层(color filter，CF)基板侧或薄膜晶体管(thin film transister，TFT)基板侧。如图1a所示，双间隙半穿半反MVA液晶显示器的基本结构包括一第一基板10、一彩色滤光层基板202及一液晶层30。其中，第一基板10具有多个次画素区110，每一个次画素区110均设有一反射区R以及一穿透区T。彩色滤光层基板202也具有多个次画素区120，该些次画素区120分别与第一基板的多个次画素区110相对应，且每一个次画素区120在与反射区R相对应的位置处均设有一调整层208。液晶层30则设于第一基板10与彩色滤光层基板202之间。
请继续参考图1a及图1b，第一基板10的各个次画素区110内皆设有一薄膜晶体管(thin film transistor，TFT)，以及一储存电容308于反射区R的下方。接着形成一平坦层104于第一基板10的上表面。然后在平坦层104上制作出凹凸的表面于反射区R，再镀上具有高反射率的金属(例如：铝、银…等)当作反射电极113，同时每一个次画素区110的穿透区T也均设有一透明电极114。值得一提的是，第一基板10各次画素区110的反射区R内更具有一接触孔310，用以电性连接反射电极113与储存电容308。另外，彩色滤光层基板202相对于第一基板10的反射区R与穿透区T的位置上更设有一配向凸起物122(protrusion，PR)。由于配向凸起物122会改变电力线的分布，使得液晶分子往配向凸起物122的方向倾斜以产生多区域液晶配向(multi-domains)的效果，而达到广视角的技术，并改善单一区域液晶配向(single-domain)时所存在的灰阶反转的问题。如图1b所示，通常在组立第一基板10与彩色滤光层基板202时，彩色滤光层基板202更设有一光间隔物300来固定面板的间距(cell gap)。并在第一基板侧10设计多个与光间隙物300相对应的平台，使光间隔物300能够更稳定的维持面板间距。
图2为本申请一实施例的显示面板中的构造横截面示意图、图3a为本申请一实施例的 显示面板中的光间隔物形状示意图、图3b为本申请另一实施例的显示面板中的光间隔物形状示意图及图4为本申请一实施例的基板的制造方法流程图。请参考图2、图3a、图3b及图4，在本申请的一实施例中，一种基板21的制造方法，包括：提供一第一基底210；依序形成多个平行配置的光阻层(举例：红色光阻层、绿色光阻层、蓝色光阻层)211、212、213于所述第一基底210上，以完成一彩色滤光层215；在形成该些光阻层211、212、213之一的同时，也形成多个主要光间隔物320及次要光间隔物322在所述彩色滤光层215上；以及形成一透明公共电极层216，设置在所述彩色滤光层215上；其中所述次要光间隔物322的形状包括交叉形、裂缝形或多边形中的任意一种；所述主要光间隔物320及所述次要光间隔物322之间具有设定的段差。
在本申请的一实施例中，所述基板21的制造方法，所述在形成该些光阻层211、212、213之一的同时，也形成多个主要光间隔物320及次要光间隔物322在所述彩色滤光层215上的步骤包括：在所述第一基底210上形成一光阻材料层(图未示)；在所述光阻材料层上设置一光罩(图未示)，所述光罩具有一透光区(举例：穿透率100％)、一非透光区(举例：穿透率8％～16％)以及一半透光区(举例：穿透率20％～40％)；以及进行一曝光制造以及一显影制造，而形成所述彩色滤光层215及多个主要光间隔物320及次要光间隔物322。
在本申请的一实施例中，所述基板21的制造方法，所述光罩为灰阶光罩或半色调光罩。
在本申请的一实施例中，所述基板21的制造方法，所述主要光间隔物320及次要光间隔物322的材质包括聚合物材料。
图5为本申请一实施例的显示面板的制造方法流程图。请参考图2、图3a、图3b及图5，在本申请的一实施例中，一种显示面板1的制造方法，包括：提供一第一基底210；依序形成多个平行配置的光阻层(举例：红色光阻层、绿色光阻层、蓝色光阻层)211、212、213于所述第一基底210上，以完成一彩色滤光层215；在形成该些光阻层211、212、213之一的同时，也形成多个主要光间隔物320及次要光间隔物322在所述彩色滤光层215上；形成一透明公共电极层216，设置在所述彩色滤光层215上，以完成一第一基板21；提供一第二基板11，与所述第一基板21对向设置，其中该些光间隔物(主要光间隔物320、次要光间隔物322)位于所述第一基板21以及所述第二基板11之间，用以定义一液晶间隔空间；以及形成一液晶层31于所述第一基板21以及所述第二基板11之间，并填满所述液晶间隔空间；其中所述次要光间隔物322的形状包括交叉形、裂缝形或多边形中的任意一种；所述主要光间隔物320及所述次要光间隔物322之间具有设定的段差。
在本申请的一实施例中，所述显示面板1的制造方法，所述该些光阻层211、212、213之一和该些光间隔物(主要光间隔物320、次要光间隔物322)是通过相同的光阻涂布、曝 光、显影及光罩过程而同时形成。
在本申请的一实施例中，所述显示面板1的制造方法，所述在形成该些光阻层211、212、213之一的同时，也形成多个主要光间隔物320及次要光间隔物322在所述彩色滤光层215上的步骤包括：在所述第一基底210上形成一光阻材料层(图未示)；在所述光阻材料层上设置一光罩(图未示)，所述光罩具有一透光区(举例：穿透率100％)、一非透光区(举例：穿透率8％～16％)以及一半透光区(举例：穿透率20％～40％)；以及进行一曝光制造以及一显影制造，而形成所述彩色滤光层215及多个主要光间隔物320及次要光间隔物322。
在本申请的一实施例中，所述显示面板1的制造方法，所述光罩为灰阶光罩或半色调光罩。
光罩，可分为灰色光罩(Gray-tone Mask)和半色调光罩(Half Tone Mask)2种。灰色光罩是制作出曝光机分辨率以下的微缝，再借由此微缝部位遮住一部分的光源，以达成半曝光的效果。另一方面，半色调光罩是利用「半透过」的膜，来进行半曝光。因为以上两种方式都是在1次的曝光过程后即可呈现出「曝光部分」「半曝光部分」及「未曝光部分」3种的曝光层次，故在显影后能够形成2种厚度的光阻(借由利用这样的光阻厚度差异、便可以较一般少的片数下将图形转写至面板基板上，并达成面板生产効率的提升)。若为半色调光罩则光罩成本会略高于一般光罩。
在本申请的某些实施例中，显示面板可包括LCD面板，其中LCD面板包括：开关阵列基板、彩色滤光层基板与形成于两基板之间的液晶层，显示面板也可为OLED面板，或QLED面板。
请参考图4，在流程S411中，提供一第一基底。
请参照图4，在流程S412中，依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层。
请参照图4，在流程S413中，在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上。
请参照图4，在流程S414中，形成一透明公共电极层，设置在所述彩色滤光层上。
请参照图4，在流程S415中，所述次要光间隔物的形状包括交叉形、裂缝形或多边形中的任意一种。
请参照图4，在流程S416中，所述主要光间隔物及所述次要光间隔物之间具有设定的段差。
请参考图5，在流程S511中，提供一第一基底。
请参考图5，在流程S512中，依序形成多个平行配置的光阻层于所述第一基底上，以 完成一彩色滤光层。
请参考图5，在流程S513中，在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上。
请参考图5，在流程S514中，形成一透明公共电极层，设置在所述彩色滤光层上，以完成一第一基板。
请参考图5，在流程S515中，提供一第二基板，与所述第一基板对向设置，其中该些主要光间隔物及次要光间隔物位于所述第一基板以及所述第二基板之间，用以定义一液晶间隔空间。
请参考图5，在流程S516中，形成一液晶层于所述第一基板以及所述第二基板之间，并填满所述液晶间隔空间。
请参考图5，在流程S517中，所述次要光间隔物的形状包括交叉形、裂缝形或多边形中的任意一种。
请参考图5，在流程S518中，所述主要光间隔物及所述次要光间隔物之间具有设定的段差。
本申请设计了多个光间隔物的断差，来提高产品的液晶填充范围，因而提升产品的品质，而具有工业实用性。
“在一些实施例中”及“在各种实施例中”等用语被重复地使用。所述用语通常不是指相同的实施例；但它也可以是指相同的实施例。“包含”、“具有”及“包括”等用词是同义词，除非其前后文意显示出其它意思。
以上所述，仅是本申请的实施例，并非对本申请作任何形式上的限制，虽然本申请已以具体的实施例揭露如上，然而并非用以限定本申请，任何熟悉本专业的技术人员，在不脱离本申请技术方案范围内，当可利用上述揭示的技术内容作出些许更动或修饰为等同变化的等效实施例，但凡是未脱离本申请技术方案的内容，依据本申请的技术实质对以上实施例所作的任何简单修改、等同变化与修饰，均仍属于本申请技术方案的范围内。

Claims (18)

  1. 一种基板的制造方法，其中，包括：
    提供一第一基底；
    依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；
    在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上；以及
    形成一透明公共电极层，设置在所述彩色滤光层上。
  2. 如权利要求1所述的基板的制造方法，其中，所述在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上的步骤更包括：在所述第一基底上形成一光阻材料层。
  3. 如权利要求2所述的基板的制造方法，其中，在所述第一基底上形成一光阻材料层的步骤更包括：在所述光阻材料层上设置一光罩，所述光罩具有一透光区、一非透光区以及一半透光区。
  4. 如权利要求3所述的基板的制造方法，其中，在所述光阻材料层上设置一光罩，所述光罩具有一透光区、一非透光区以及一半透光区的步骤更包括：进行一曝光制造以及一显影制造，而形成所述彩色滤光层及多个主要光间隔物及次要光间隔物。
  5. 如权利要求3所述的基板的制造方法，其中，所述光罩为灰阶光罩或半色调光罩。
  6. 如权利要求1所述的基板的制造方法，其中，所述次要光间隔物的形状包括交叉形、裂缝形或多边形中的任意一种。
  7. 如权利要求1所述的基板的制造方法，其中，所述主要光间隔物及次要光间隔物的材质包括聚合物材料。
  8. 如权利要求1所述的基板的制造方法，其中，所述主要光间隔物及所述次要光间隔物之间具有设定的段差。
  9. 一种基板的制造方法，其中，包括：
    提供一第一基底；
    依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；
    在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上；以及
    形成一透明公共电极层，设置在所述彩色滤光层上；其中所述次要光间隔物的形状包括交叉形、裂缝形或多边形中的任意一种；所述主要光间隔物及所述次要光间隔物之间具有设定的段差。
  10. 如权利要求9所述的基板的制造方法，其中，所述主要光间隔物及次要光间隔物的材质包括聚合物材料。
  11. 一种显示面板的制造方法，其中，包括：
    提供一第一基底；
    依序形成多个平行配置的光阻层于所述第一基底上，以完成一彩色滤光层；
    在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上；
    形成一透明公共电极层，设置在所述彩色滤光层上，以完成一第一基板；
    提供一第二基板，与所述第一基板对向设置，其中该些主要光间隔物及次要光间隔物位于所述第一基板以及所述第二基板之间，用以定义一液晶间隔空间；以及
    形成一液晶层于所述第一基板以及所述第二基板之间，并填满所述液晶间隔空间；其中所述次要光间隔物的形状包括交叉形、裂缝形或多边形中的任意一种；所述主要光间隔物及所述次要光间隔物之间具有设定的段差。
  12. 如权利要求11所述的显示面板的制造方法，其中，该些光阻层之一和该些主要光间隔物及次要光间隔物是通过相同的光阻涂布、曝光、显影及光罩过程而同时形成。
  13. 如权利要求11所述的显示面板的制造方法，其中，所述在形成该些光阻层之一的同时，也形成多个主要光间隔物及次要光间隔物在所述彩色滤光层上的步骤更包括：在所述第一基底上形成一光阻材料层。
  14. 如权利要求13所述的显示面板的制造方法，其中，在所述第一基底上形成一光阻材料层的步骤更包括：在所述光阻材料层上设置一光罩，所述光罩具有一透光区、一非透光区以及一半透光区。
  15. 如权利要求14所述的显示面板的制造方法，其中，在所述光阻材料层上设置一光罩，所述光罩具有一透光区、一非透光区以及一半透光区的步骤更包括：进行一曝光制造以及一显影制造，而形成所述彩色滤光层及多个主要光间隔物及次要光间隔物。
  16. 如权利要求14所述的显示面板的制造方法，其中，所述光罩为灰阶光罩或半色调光罩。
  17. 如权利要求11所述的显示面板的制造方法，其中，所述显示面板可为LCD面板，所述LCD面板包括：开关阵列基板、彩色滤光层基板与形成于两基板之间的液晶层。
  18. 如权利要求11所述的显示面板的制造方法，其中，所述显示面板可为OLED面板，或QLED面板。
PCT/CN2019/072252 2018-10-24 2019-01-18 基板及显示面板的制造方法 Ceased WO2020082630A1 (zh)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050112485A1 (en) * 2003-11-24 2005-05-26 Lg Philips Lcd Co., Ltd. Fabrication method of liquid crystal display device using color filter substrate formed using back exposure
US20050134763A1 (en) * 2003-12-23 2005-06-23 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and method of fabricating the same
US7195847B2 (en) * 2002-02-26 2007-03-27 Fuji Photo Film Co., Ltd. Image forming method
CN106526953A (zh) * 2016-12-29 2017-03-22 惠科股份有限公司 彩色滤光层基板的制造方法
CN106646981A (zh) * 2017-03-20 2017-05-10 惠科股份有限公司 主动开关阵列基板及其制造方法
CN107045222A (zh) * 2016-12-29 2017-08-15 惠科股份有限公司 液晶面板及其制造方法
CN107608124A (zh) * 2017-11-03 2018-01-19 惠科股份有限公司 主动开关阵列基板及其制造方法和液晶面板

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4771038B2 (ja) * 2001-09-13 2011-09-14 ゲットナー・ファンデーション・エルエルシー 液晶表示装置
CN102375271B (zh) * 2010-08-16 2015-02-25 上海天马微电子有限公司 液晶显示面板、液晶显示器及液晶显示面板的制造方法
CN104503150A (zh) * 2014-12-04 2015-04-08 深圳市华星光电技术有限公司 液晶面板及其制作方法
CN106773349A (zh) * 2016-12-28 2017-05-31 张家港康得新光电材料有限公司 隔垫物、隔垫物的制造方法及液晶显示装置
CN107145011A (zh) * 2017-07-19 2017-09-08 武汉华星光电技术有限公司 液晶面板及液晶显示装置
CN107450221B (zh) * 2017-08-11 2020-06-05 京东方科技集团股份有限公司 彩膜基板、显示面板、显示装置及其制作方法
CN107561789A (zh) * 2017-09-25 2018-01-09 武汉华星光电技术有限公司 一种彩膜基板及液晶显示面板

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7195847B2 (en) * 2002-02-26 2007-03-27 Fuji Photo Film Co., Ltd. Image forming method
US20050112485A1 (en) * 2003-11-24 2005-05-26 Lg Philips Lcd Co., Ltd. Fabrication method of liquid crystal display device using color filter substrate formed using back exposure
US20050134763A1 (en) * 2003-12-23 2005-06-23 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and method of fabricating the same
CN106526953A (zh) * 2016-12-29 2017-03-22 惠科股份有限公司 彩色滤光层基板的制造方法
CN107045222A (zh) * 2016-12-29 2017-08-15 惠科股份有限公司 液晶面板及其制造方法
CN106646981A (zh) * 2017-03-20 2017-05-10 惠科股份有限公司 主动开关阵列基板及其制造方法
CN107608124A (zh) * 2017-11-03 2018-01-19 惠科股份有限公司 主动开关阵列基板及其制造方法和液晶面板

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