WO2020080068A1 - Planographic printing plate precursor, and production method for planographic printing plate - Google Patents

Planographic printing plate precursor, and production method for planographic printing plate Download PDF

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Publication number
WO2020080068A1
WO2020080068A1 PCT/JP2019/038263 JP2019038263W WO2020080068A1 WO 2020080068 A1 WO2020080068 A1 WO 2020080068A1 JP 2019038263 W JP2019038263 W JP 2019038263W WO 2020080068 A1 WO2020080068 A1 WO 2020080068A1
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group
printing plate
lithographic printing
plate precursor
acid
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PCT/JP2019/038263
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French (fr)
Japanese (ja)
Inventor
加奈 栢木
尚志 佐藤
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富士フイルム株式会社
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Publication of WO2020080068A1 publication Critical patent/WO2020080068A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/12Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14Lithographic printing foils
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Definitions

  • the present disclosure relates to a lithographic printing plate precursor and a method for producing a lithographic printing plate.
  • a lithographic printing plate consists of a lipophilic image area that receives ink during the printing process and a hydrophilic non-image area that receives fountain solution.
  • Lithographic printing utilizes the property that water and oil-based ink repel each other, and the lipophilic image part of the lithographic printing plate is the ink receiving part, and the hydrophilic non-image part is the dampening water receiving part (ink non-receiving part).
  • image exposure is performed by a CTP (computer to plate) technique. That is, image exposure is carried out by using a laser or a laser diode directly on a lithographic printing plate precursor by scanning exposure without using a lith film.
  • a conventional lithographic printing plate precursor or a photosensitive resin composition used for manufacturing the same for example, those described in Patent Documents 1 and 2 are known.
  • Patent Document 1 discloses a lithographic printing plate precursor comprising a support and a resin and an infrared absorbing agent, and having at least two or more positive type recording layers whose solubility in an alkaline aqueous solution is increased by infrared laser exposure, on a support, Of the positive recording layers, the positive recording layer closest to the support contains at least two resins, at least one of these resins forms a dispersed phase, and at least one of the above resins is used.
  • a lithographic printing plate precursor characterized in that one is a polymer containing maleimide is described.
  • Patent Document 2 an image recording layer containing a ternary to quaternary copolymer having a maleimide structure and an infrared absorber is provided on a support, and the weight average molecular weight of the above copolymer is 15,000 to 35. And a lithographic printing plate precursor having a number average molecular weight of 7,000 to 15,000.
  • Patent Document 1 Japanese Patent Laid-Open No. 2006-3658
  • Patent Document 2 Chinese Patent Application Publication No. 1038716969
  • the problem to be solved by the embodiments of the present invention is to provide a lithographic printing plate precursor having excellent post-exposure developability and excellent chemical resistance of the lithographic printing plate obtained.
  • a problem to be solved by another embodiment of the present invention is to provide a method for producing a lithographic printing plate using the lithographic printing plate precursor.
  • Means for solving the above problems include the following aspects. ⁇ 1> An image recording layer is provided on a support, and the image recording layer is represented by a structural unit represented by the following formula (1), a structural unit having a phenolic hydroxyl group in a side chain, and the following formula (2).
  • R represents an alkyl group or an aryl group.
  • ⁇ 2> The lithographic printing plate precursor as described in ⁇ 1>, wherein the counter anion in the quaternary ammonium salt compound is a sulfonate ion, a carboxylate ion, an inorganic acid ion having a halogen atom, or a halide ion.
  • the image recording layer has an upper layer and a lower layer.
  • the upper layer contains the infrared absorbent and the quaternary ammonium salt compound, and the lower layer contains the alkali-soluble resin.
  • ⁇ 5> The lithographic printing plate precursor as described in ⁇ 4>, wherein the content of the quaternary ammonium salt compound in the upper layer is 0.06 g / m 2 or more and 0.10 g / m 2 or less.
  • ⁇ 6> The lithographic printing plate precursor as described in any one of ⁇ 1> to ⁇ 5>, wherein the alkali-soluble resin has a weight average molecular weight of 10,000 to 200,000.
  • ⁇ 7> The lithographic printing plate precursor as described in any one of ⁇ 1> to ⁇ 6>, wherein the alkali-soluble resin has a weight average molecular weight of 40,000 to 100,000.
  • lithographic printing plate precursor as described in any one of ⁇ 1> to ⁇ 7> which is a lithographic printing plate precursor for non-silicate development.
  • a method for producing a lithographic printing plate including the step of developing by development.
  • the liquid activity of the alkaline developer is measured by the conductivity of the alkaline developer, and a replenisher is added according to the measured value to adjust the conductivity so that the target conductivity is achieved, and the liquid activity is controlled.
  • the method for producing a lithographic printing plate as described in ⁇ 9> including the step of:
  • a lithographic printing plate precursor having excellent post-exposure developability and excellent chemical resistance of the lithographic printing plate obtained. Further, according to another embodiment of the present invention, it is possible to provide a method for producing a planographic printing plate using the planographic printing plate precursor.
  • FIG. 3 is a schematic view of an electrolytic treatment apparatus in a two-stage power supply electrolysis method applicable to production of a support.
  • the amount of each component in the composition is the total amount of the corresponding plurality of substances present in the composition, unless a plurality of substances corresponding to each component are present in the composition.
  • the notation that does not indicate substituted and unsubstituted includes not only those having no substituent but also those having a substituent.
  • the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • (meth) acrylic is a term used as a concept including both acryl and methacryl
  • (meth) acryloyl is a term used as a concept including both acryloyl and methacryloyl. is there.
  • the group in the compound represented by the formula when no substitution or substitution is mentioned, and when the group can further have a substituent, there is no particular limitation. As long as the group includes not only an unsubstituted group but also a group having a substituent.
  • R V represents an alkyl group, an aryl group or a heterocyclic group
  • R V is an unsubstituted alkyl group, a substituted alkyl group, an unsubstituted aryl group, a substituted aryl group
  • process in the present disclosure is included in this term as long as the intended purpose of the process is achieved, not only when it is an independent process but also when it cannot be clearly distinguished from other processes. Be done.
  • “mass%” and “weight%” are synonymous, and “mass part” and “weight part” are synonymous.
  • the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present disclosure are columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (both manufactured by Tosoh Corporation) unless otherwise specified.
  • the gel permeation chromatography (GPC) analyzer was used to detect the solvent THF (tetrahydrofuran) with a differential refractometer, and the molecular weight was calculated using polystyrene as a standard substance.
  • the total solid content refers to the total mass of components excluding volatile components such as a solvent in the composition.
  • the term “lithographic printing plate precursor” includes not only the lithographic printing plate precursor but also the discarded plate precursor.
  • the term “lithographic printing plate” includes not only a lithographic printing plate precursor prepared through an operation such as exposure and development, but also a discarding plate, if necessary. In the case of a waste original plate, the operations of exposure and development are not always necessary.
  • the waste plate is a lithographic printing plate precursor to be attached to an unused plate cylinder when a part of the paper surface is printed in a single color or two colors in color newspaper printing, for example.
  • the lithographic printing plate precursor according to the present disclosure has an image recording layer on a support, and the image recording layer comprises a structural unit represented by the following formula (1) and a structural unit having a phenolic hydroxyl group in a side chain. It contains an alkali-soluble resin having a structural unit represented by the following formula (2), an infrared absorbing agent, and a quaternary ammonium salt compound.
  • R represents an alkyl group or an aryl group.
  • the lithographic printing plate precursor according to the present disclosure is a positive lithographic printing plate precursor, and preferably a thermal positive lithographic printing plate precursor. Furthermore, the lithographic printing plate precursor according to the present disclosure can be suitably used as a lithographic printing plate precursor for non-silicate development.
  • the above configuration can provide a lithographic printing plate precursor having excellent post-exposure aging developability.
  • the mechanism of action of the excellent effect of the above configuration is not clear, it is estimated as follows.
  • the constitutional unit represented by the above formula (1) the constitutional unit having a phenolic hydroxyl group (also referred to as "phenolic hydroxy group") in the side chain, and the constitution represented by the above formula (2).
  • the maleimide ring structure, the phenolic hydroxyl group, the cyano group and the like in the alkali-soluble resin and the quaternary ammonium salt compound are mutually exchanged. Since it works, the difference in solubility between the exposed portion and the non-exposed portion is maintained even after exposure, and the developability (post-exposure aging developability) is excellent even when the lithographic printing plate precursor is stored after exposure. I'm estimating.
  • the lithographic printing plate precursor according to the present disclosure is obtained because the image-recording layer contains the alkali-soluble resin and the quaternary ammonium salt compound, and these interact with each other through hydrogen bond and ionic bond. It is presumed that the lithographic printing plate used has excellent chemical resistance.
  • the image recording layer contains the alkali-soluble resin and the quaternary ammonium salt compound, these interact with each other through hydrogen bond, ionic bond, etc. It is presumed that the difference in solubility between the unexposed area and the unexposed area becomes larger and the development latitude of the image recording layer (acceptance of development conditions suitable for image formation) is excellent.
  • the image recording layer in the lithographic printing plate precursor according to the present disclosure comprises the constitutional unit represented by the above formula (1), the constitutional unit having a phenolic hydroxyl group in the side chain, and the constitutional unit represented by the above formula (2). It contains an alkali-soluble resin, an infrared absorber, and a quaternary ammonium salt compound.
  • the image recording layer has a constitutional unit represented by the formula (1), a constitutional unit having a phenolic hydroxyl group in a side chain, and a constitutional unit represented by the formula (2).
  • alkali-soluble in the present disclosure means being soluble in a 1 mol / L sodium hydroxide solution at 25 ° C.
  • the alkali-soluble resin is preferably a copolymer obtained by copolymerizing at least a maleimide compound and a (meth) acrylic compound or a styrene compound and acrylonitrile, and a maleimide compound, a (meth) acrylamide compound and acrylonitrile. It is more preferable that the copolymer is a copolymer.
  • the alkali-soluble resin has a structural unit represented by the following formula (1).
  • the constitutional unit represented by the following formula (1) is preferably a constitutional unit derived from a maleimide compound (a constitutional unit obtained by copolymerizing a maleimide compound).
  • R represents an alkyl group or an aryl group.
  • the alkyl group and aryl group for R in formula (1) may have a substituent.
  • substituents include an alkyl group, an aryl group, a halogen atom, a hydroxy group, an alkoxy group, a carboxy group, an alkoxycarbonyl group, an acyl group, an acyloxy group and a cyano group.
  • the above-mentioned substituent may further have a substituent.
  • the number of carbon atoms (also referred to as “carbon number”) of the alkyl group represented by R in the formula (1) is preferably 1 to 20, more preferably 1 to 12, and further preferably 1 to 8. More preferable.
  • the number of carbon atoms of the alkyl group represented by R in the formula (1) is preferably 2 or more from the viewpoint of development latitude.
  • the aryl group represented by R in the formula (1) preferably has 6 to 20 carbon atoms, more preferably has 6 to 12 carbon atoms, and further preferably has 6 to 10 carbon atoms.
  • the aryl group represented by R in the formula (1) may be an aryl group having a monocyclic structure or an aryl group having a structure in which two or more rings are condensed.
  • R in the formula (1) is preferably an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms from the viewpoint of developability with time after exposure, and has 1 to 12 carbon atoms.
  • a group, a benzyl group, or a phenyl group is particularly preferable, and a phenyl group is most preferable.
  • R in the formula (1) is preferably an aryl group from the viewpoint of development latitude and post-exposure aging developability.
  • alkyl group represented by R in the formula (1) examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a s-butyl group, a t-butyl group, a cyclohexyl group and a benzyl group.
  • aryl group for R in the formula (1) include a phenyl group and a naphthyl group.
  • Examples of the monomer forming the structural unit represented by the formula (1) include N-methylmaleimide, Nn-butylmaleimide, N-benzylmaleimide, N-phenylmaleimide, N-naphthylmaleimide and the like. The disclosure is not limited to these.
  • constitutional unit represented by the formula (1) are preferably the followings.
  • the alkali-soluble resin may have one type of the structural unit represented by the above formula (1) alone, or may have two or more types. From the viewpoint of development latitude and post-exposure aging developability, the content of the constitutional unit represented by the above formula (1) (the total content in the case of two or more kinds, the same applies hereinafter) is the same as that of the alkali-soluble resin.
  • the total amount is preferably 10 mol% to 80 mol%, more preferably 10 mol% to 60 mol%, and particularly preferably 20 mol% to 50 mol%.
  • the “constituent unit” is synonymous with the “monomer unit”.
  • the “monomer unit” may be modified after polymerization by a polymer reaction or the like. The same applies to the following.
  • the alkali-soluble resin has a structural unit having a phenolic hydroxyl group on its side chain.
  • the “main chain” represents the relatively longest binding chain in the molecule of the polymer compound constituting the resin
  • the “side chain” represents the atomic group branched from the main chain.
  • the number of phenolic hydroxyl groups contained in the structural unit having a phenolic hydroxyl group in the side chain is not particularly limited, but is preferably 1 to 4 from the viewpoint of developability and development latitude, and 1 or 2 It is more preferable that the number is 1, and it is particularly preferable that the number is 1.
  • the structure having a phenolic hydroxyl group in the constituent unit having a phenolic hydroxyl group in the side chain preferably has a nitrogen atom from the viewpoint of development latitude and post-exposure aging developability, and is represented by the following formula (Ph-1). It is more preferable that the structure is
  • R ph1 each independently represent a monovalent substituent
  • R ph2 represents a hydrogen atom, an alkyl group or an aryl group
  • n1 represents an integer of 1 ⁇ 4
  • n2 is It represents an integer of 0 to 4
  • the wavy line represents the bonding position with another structure.
  • R ph1 in formula (Ph-1) is independently an alkyl group, an aryl group, a halogen atom, an alkoxy group, a carboxy group, an alkoxycarbonyl group, an acyl group, an acyloxy group, a cyano group, or a sulfonamide group. Is more preferable, and an alkyl group, an aryl group, a halogen atom, or a sulfonamide group is more preferable.
  • R ph2 in the formula (Ph-1) is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom, from the viewpoint of development latitude and post-exposure aging developability.
  • N1 in the formula (Ph-1) is preferably 1 or 2, and more preferably 1 from the viewpoint of developability and development latitude.
  • the bonding position of the phenolic hydroxyl group in the formula (Ph-1) is not particularly limited, but from the viewpoint of developability and development latitude, the ortho position (with respect to the bonding position of the nitrogen atom in the formula (Ph-1) ( The o-position) or the para-position (p-position) is preferable, and the para-position is more preferable.
  • N2 in the formula (Ph-1) is preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 0.
  • the structural unit having a phenolic hydroxyl group in the side chain preferably has an amide bond from the viewpoint of development latitude and post-exposure aging developability, and is a structural unit represented by the following formula (Ph-2). Is more preferable.
  • R ph1 each independently represent a monovalent substituent
  • R ph2 represents a hydrogen atom, an alkyl group or an aryl group
  • R ph3 represents a hydrogen atom or a methyl group
  • n1 represents an integer of 1 to 4
  • n2 represents an integer of 0 to 4.
  • R ph1, R ph2, n1 and n2 in Formula (Ph-2), have the same meaning as R ph1, R ph2, n1 and n2 in Formula (Ph-1), a preferable embodiment thereof is also the same.
  • R ph3 in formula (Ph-2) is preferably a hydrogen atom.
  • Examples of the monomer forming the structural unit having a phenolic hydroxyl group on the side chain include acrylamide, methacrylamide, acrylic acid ester, methacrylic acid ester having a phenolic hydroxyl group, or hydroxystyrene.
  • the alkali-soluble resin may have one kind of structural unit having a phenolic hydroxyl group in the side chain, or may have two or more kinds.
  • the content of the constituent unit having a phenolic hydroxyl group in the side chain is preferably 10 mol% to 80 mol% with respect to the total amount of the alkali-soluble resin, from the viewpoint of development latitude and post-exposure aging developability. It is more preferably 10 mol% to 60 mol%, and particularly preferably 20 mol% to 50 mol%.
  • the molar ratio of the structural unit represented by the formula (1) and the structural unit having a phenolic hydroxyl group in the side chain in the alkali-soluble resin is not particularly limited, but the development latitude and the post-exposure post-exposure developability are not limited. From the viewpoint, it is preferable that the constitutional unit represented by the above formula (1): the constitutional unit having a phenolic hydroxyl group in the side chain is 2: 1 to 1: 2, and 1.5: 1 to 1: 1. It is more preferably 0.5, and particularly preferably 1.2: 1 to 1: 1.2.
  • the alkali-soluble resin has a structural unit represented by the following formula (2).
  • the constitutional unit represented by the following formula (2) is preferably a constitutional unit formed by copolymerizing acrylonitrile.
  • the content of the structural unit represented by the formula (2) in the alkali-soluble resin is 1 mol% to 50 mol% based on the total amount of the alkali-soluble resin from the viewpoint of development latitude and post-exposure aging developability. It is preferably from 5 to 40 mol%, more preferably from 10 to 30 mol%.
  • the alkali-soluble resin preferably further has a structural unit having a carboxy group.
  • the structural unit having a carboxy group is preferably a structural unit represented by the following formula (Ac), from the viewpoints of developability, development latitude and post-exposure aging developability.
  • R Ac represents a hydrogen atom or a methyl group.
  • R Ac in formula (Ac) is preferably a hydrogen atom.
  • Specific examples of the monomer forming the constitutional unit having a carboxy group include acrylic acid, methacrylic acid, maleic anhydride, itaconic acid, etc. Examples thereof include carboxylic acids. Among them, acrylic acid or methacrylic acid is preferable, and acrylic acid is more preferable.
  • the alkali-soluble resin may have one kind of the structural unit having a carboxy group, or may have two or more kinds.
  • the content of the structural unit having a carboxy group is 1 with respect to the total amount of the alkali-soluble resin from the viewpoint of development latitude and post-exposure aging developability. It is preferably from 50 to 50 mol%, more preferably from 2 to 40 mol%, and particularly preferably from 5 to 30 mol%.
  • the alkali-soluble resin may have other constitutional units other than those mentioned above.
  • Other structural units are not particularly limited, but preferably include a structural unit derived from an alkyl (meth) acrylate compound (a structural unit obtained by copolymerizing an alkyl (meth) acrylate compound).
  • Specific examples of the monomer forming the above-mentioned other structural units are preferably the following monomers (m1) to (m9).
  • (M1) Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.
  • (M2) Alkyl acrylates such as methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate and glycidyl acrylate.
  • Alkyl methacrylates such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate and the like.
  • (M4) acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl- Acrylamide or methacrylamide such as N-phenylacrylamide, N-vinylpyrrolidone.
  • (M5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether and phenyl vinyl ether.
  • (M6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate.
  • Styrenes such as styrene, ⁇ -methylstyrene, methylstyrene and chloromethylstyrene.
  • (M8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.
  • Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene.
  • the alkali-soluble resin may have one of the above-mentioned other structural units alone, or may have two or more thereof.
  • the content of the other structural unit is 1 mol% to 50 with respect to the total amount of the alkali-soluble resin, from the viewpoint of development latitude and post-exposure aging developability.
  • the amount is preferably mol%, more preferably 2 mol% to 40 mol%, particularly preferably 5 mol% to 30 mol%.
  • the weight-average molecular weight (Mw) of the alkali-soluble resin is preferably 2,000 or more, more preferably 5,000 to 300,000, from the viewpoint of development latitude and post-exposure aging developability. It is more preferably 2,000 to 200,000, and particularly preferably 40,000 to 100,000.
  • the alkali-soluble resin preferably has a weight average molecular weight of 2,000 or more and a number average molecular weight of 500 or more, a weight average molecular weight of 5,000 to 300,000, and a number average molecular weight of 800 to 250. More preferably, it is 1,000.
  • the degree of dispersion (weight average molecular weight / number average molecular weight) of the alkali-soluble resin is preferably 1.1 to 10.
  • the above alkali-soluble resins may be used alone or in combination of two or more.
  • the content of the alkali-soluble resin is preferably 1% by mass to 90% by mass, more preferably 3% by mass to 70% by mass, and more preferably 5% by mass. It is particularly preferably from about 50% by mass.
  • the lower layer contains at least the alkali-soluble resin.
  • the content of the alkali-soluble resin in the lower layer is preferably 3% by mass or more, more preferably 10% by mass or more, and further preferably 25% by mass or more, based on the total mass of the lower layer. .
  • the image forming layer contains an infrared absorber.
  • the infrared absorbent is not particularly limited as long as it is a pigment or dye that absorbs infrared light and generates heat, and various pigments or dyes known as infrared absorbents can be used.
  • the pigment commercially available pigments, color index (CI) handbook, "latest pigment handbook” (edited by Japan Pigment Technology Association, 1977), “latest pigment application technology” (CMC Publishing, 1986), and The pigments described in “Printing Ink Technology", CMC Publishing Co., Ltd., 1984) can be used.
  • pigments examples include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and polymer-bonded dyes.
  • a quinophthalone pigment, a dyed lake pigment, an azine pigment, a nitroso pigment, a nitro pigment, a natural pigment, a fluorescent pigment, an inorganic pigment, and carbon black can be used.
  • the pigment may be used without surface treatment or may be subjected to conventionally known surface treatment before use.
  • the particle size of the pigment is preferably 0.01 ⁇ m to 10 ⁇ m, more preferably 0.05 ⁇ m to 1 ⁇ m, and further preferably 0.1 ⁇ m to 1 ⁇ m. The above range is preferable from the viewpoint of stability of the pigment dispersion in the coating liquid for forming the image recording layer, uniformity of the image recording layer, and the like.
  • a method for dispersing the pigment for example, a known dispersion technique used in ink production or toner production described in "Latest Pigment Application Technology" (CMC Publishing, 1986) can be used.
  • dyes are preferably mentioned.
  • the infrared absorber that can be used in the present disclosure, commercially available dyes and known ones described in a literature (for example, “Handbook of Dyes” edited by The Society of Synthetic Organic Chemistry, published in 1970) can be used. Specific examples thereof include azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, cyanine dyes, and oxonol dyes.
  • these dyes those that absorb at least infrared light or near infrared light are preferable in that they are suitable for use in a laser that emits infrared light or near infrared light, and cyanine dyes are particularly preferable. preferable.
  • Examples of such dyes that absorb at least infrared light or near infrared light include, for example, JP-A-58-125246, JP-A-59-84356, JP-A-59-202829, and JP-A-60-.
  • Cyanine dyes described in JP-A-78787 and the like methine dyes described in JP-A-58-173696, JP-A-58-181690 and JP-A-58-194595, and JP-A-58-112793, JP-A-58-224793, JP-A-59-48187, JP-A-59-73996, JP-A-60-52940, JP-A-60-63744 and the like.
  • cyanine dyes particularly preferred among these dyes are cyanine dyes, phthalocyanine dyes, oxonol dyes, squarylium dyes, pyrylium salts, thiopyrylium dyes, and nickel thiolate complexes.
  • the cyanine dye represented by the following formula (a) is most preferable because it has excellent stability and economy when used in the upper layer of the present disclosure.
  • X 1 represents a hydrogen atom, a halogen atom, a diarylamino group (-NPh 2 ), X 2 -L 1 or a group shown below, X 2 represents an oxygen atom or a sulfur atom, L 1 represents a hydrocarbon group having 1 to 12 carbon atoms, an aromatic ring having a hetero atom, or a hydrocarbon group having 1 to 12 carbon atoms containing a hetero atom.
  • a hetero atom here represents N, S, O, a halogen atom, and Se.
  • Xa ⁇ is defined in the same manner as Za ⁇ described later, and R a is a substituent selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, a substituted or unsubstituted amino group, and a halogen atom. Represents a group.
  • R 21 and R 22 each independently represent a hydrocarbon group having 1 to 12 carbon atoms. From the viewpoint of storage stability of the coating liquid for the image recording layer, R 21 and R 22 are preferably a hydrocarbon group having 2 or more carbon atoms, and further, R 21 and R 22 are bonded to each other to form a 5-membered ring or It is particularly preferable to form a 6-membered ring.
  • Ar 1 and Ar 2 may be the same or different and each represents an aromatic hydrocarbon group which may have a substituent.
  • Preferred aromatic hydrocarbon groups include a benzene ring and a naphthalene ring.
  • Examples of preferable substituents include a hydrocarbon group having 12 or less carbon atoms, a halogen atom, and an alkoxy group having 12 or less carbon atoms.
  • Preferred substituents include an alkoxy group having 12 or less carbon atoms, a carboxy group, or a sulfo group.
  • Za ⁇ represents a counter anion. However, when the cyanine dye represented by the formula (a) has an anionic substituent in its structure and neutralization of charge is not necessary, Za ⁇ is not necessary.
  • Preferred Za ⁇ is a halide ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, and a sulfonate ion in view of the storage stability of the coating solution for the image recording layer, and a perchlorate ion is particularly preferred.
  • a perchlorate ion is particularly preferred.
  • Hexafluorophosphate ion, and arylsulfonate ion is particularly preferred.
  • cyanine dye represented by the formula (a) which can be preferably used include, for example, paragraphs 0017 to 0019 of JP 2001-133969 A, paragraphs 0012 to 0038 of JP 2002-40638 A, and JP 2002 A. Examples thereof include those described in paragraphs 0012 to 0023 of JP-A-23360.
  • the cyanine dye A shown below is particularly preferable as the infrared absorber.
  • the infrared absorbers may be used alone or in combination of two or more.
  • the content of the infrared absorbing agent in the image forming layer is 0.01% by mass to 50% by mass based on the total mass of the image forming layer from the viewpoint of sensitivity, uniformity of the image forming layer, and durability. It is preferable that the amount is 0.1% by mass to 30% by mass, more preferably 1.0% by mass to 30% by mass.
  • the image recording layer contains a quaternary ammonium salt compound.
  • the quaternary ammonium cation in the quaternary ammonium salt compound may be a monovalent cation or a divalent or higher cation having two or more quaternary ammonium structures. Preferably there is.
  • the counter anion in the quaternary ammonium salt compound may be a monovalent anion or a divalent or higher valent anion as long as it is an anion capable of neutralizing the charge, but it is a monovalent anion. Is preferred.
  • the quaternary ammonium cation in the above quaternary ammonium salt compound is preferably a cation represented by the following formula (Am-1), and more preferably a cation represented by the following formula (Am-2).
  • a cation represented by the following formula (Am-3) is particularly preferable.
  • R m1 to R m4 each independently represent a substituent containing at least one carbon atom, and two or more of R m1 to R m4 are bonded to each other to form a ring structure. May be formed.
  • C 1 to C 6 represent carbon atoms
  • N 1 represents a nitrogen atom
  • R 4 to R 17 each independently represent a hydrogen atom or a substituent
  • L 3 represents C 3 and C 4 and a single or double bond linking, or, -C 3 -C 1 -N 1 -C 2 -C 4 - represents a divalent linking group to form a ring structure containing
  • m1 and m2 each independently represents an integer of 0 to 5, and n1 and n2 each independently represent 0 or a positive integer.
  • Examples of the substituent containing at least one carbon atom represented by R m1 to R m4 in formula (Am-1) include the followings.
  • an alkyl group preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, specifically, for example, methyl group, ethyl group, n-butyl.
  • a group preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms
  • vinyl group preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms
  • alkynyl group preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, particularly preferably 2 to 12 carbon atoms.
  • aryl group preferably having 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, particularly preferably 6 to 12 carbon atoms, for example, Phenyl group, p-methylphenyl group, naphthyl group, etc.
  • Phenyl group p-methylphenyl group, naphthyl group, etc.
  • substituents may be further substituted. When there are two or more substituents, they may be the same or different. If possible, they may be linked to each other to form a ring.
  • R m1 to R m4 in formula (Am-1) are preferably an alkyl group, an aryl group, or a group in which any of these is further substituted.
  • the total carbon number of R m1 to R m4 is preferably 8 to 80, more preferably 10 to 64, and 12 to 48. It is particularly preferable that
  • Examples of the substituent in R 4 to R 17 of the formula (Am-2) include the followings.
  • an alkyl group preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, specifically, for example, methyl group, ethyl group, n-butyl.
  • alkenyl preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, specifically, for example, methyl group, ethyl group, n-butyl.
  • a group preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms
  • vinyl group preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms
  • alkynyl group preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, particularly preferably 2 to 12 carbon atoms.
  • examples thereof include a propargyl group, a 3-pentynyl group, etc.), an aryl group (preferably having 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and particularly preferably 6 to 12 carbon atoms, for example, Phenyl group, p-methylphenyl group, naphthyl group, etc.),
  • An amino group preferably having 0 to 20 carbon atoms, more preferably 0 to 12 carbon atoms, particularly preferably 0 to 6 carbon atoms, for example, amino group, methylamino group, dimethylamino group, diethylamino group, diphenylamino group, A dibenzylamino group, etc.
  • an alkoxy group preferably having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, particularly preferably 1 to 8 carbon atoms
  • a methoxy group preferably having 0 to 20 carbon atoms, more preferably 0 to 12 carbon atoms, particularly preferably 0 to 6 carbon atoms
  • an alkoxy group preferably having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, particularly preferably 1 to 8 carbon atoms
  • an aryloxy group (preferably having 6 to 20 carbon atoms, more preferably 6 to 16 carbon atoms, particularly preferably 6 to 12 carbon atoms), for example, a phenyloxy group, a 2-naphthyloxy group. Etc.),
  • Acyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include an acetyl group, a benzoyl group, a formyl group, a pivaloyl group).
  • Alkoxycarbonyl group (preferably having 2 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, particularly preferably 2 to 12 carbon atoms, and examples thereof include a methoxycarbonyl group and an ethoxycarbonyl group), aryloxycarbonyl.
  • a group (preferably having 7 to 20 carbon atoms, more preferably 7 to 16 carbon atoms, particularly preferably 7 to 10 carbon atoms, and examples thereof include a phenyloxycarbonyl group); an acyloxy group (preferably having 2 carbon atoms). To 20, more preferably 2 to 16 carbon atoms, and particularly preferably 2 to 10 carbon atoms. And an acylamino group (preferably having a carbon number of 2 to 20, more preferably a carbon number of 2 to 16, and particularly preferably a carbon number of 2 to 10), such as an acetylamino group and a benzoylamino group. Can be mentioned.),
  • Alkoxycarbonylamino group (preferably having 2 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, particularly preferably 2 to 12 carbon atoms, and examples thereof include a methoxycarbonylamino group) and an aryloxycarbonylamino group.
  • Sulfonylamino group (preferably having carbon number 1 to 20, more preferably 1 to 16 carbon atoms, and particularly preferably 1 to 12 carbon atoms, and examples thereof include a methanesulfonylamino group and a benzenesulfonylamino group.), A sulfamoyl group (preferably having a carbon number of 0 to 20, more preferably 0 to 16 carbon atoms, particularly preferably 0 to 12 carbon atoms. Famoiru group, methylsulfamoyl group, dimethylsulfamoyl group, and a phenylsulfamoyl group.)
  • Carbamoyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a carbamoyl group, a methylcarbamoyl group, a diethylcarbamoyl group and a phenylcarbamoyl group.
  • An alkylthio group (preferably having a carbon number of 1 to 20, more preferably a carbon number of 1 to 16, and particularly preferably a carbon number of 1 to 12, and examples thereof include a methylthio group and an ethylthio group), an arylthio group ( It preferably has 6 to 20 carbon atoms, more preferably 6 to 16 carbon atoms, and particularly preferably 6 to 12 carbon atoms, and examples thereof include a phenylthio group.), A sulfonyl group (preferably 1 to 20 carbon atoms, more preferably It preferably has 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a mesyl group and a tosyl group.
  • a sulfinyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a methanesulfinyl group and a benzenesulfinyl group).
  • a ureido group (preferably having a carbon number of 1 to 20, more preferably a carbon number of 1 to 16 and particularly preferably a carbon number of 1 to 12, and examples thereof include a ureido group, a methylureido group, a phenylureido group, etc.),
  • Phosphoric acid amide group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a diethylphosphoric acid amide group and a phenylphosphoric acid amide group.
  • Hydroxy group for example, fluorine atom, chlorine atom, bromine atom, iodine atom
  • cyano group for example, fluorine atom, chlorine atom, bromine atom, iodine atom
  • sulfo group carboxyl group, nitro group, hydroxamic acid group, sulfino group, hydrazino group, imino group
  • Heterocyclic group preferably having 1 to 30 carbon atoms, more preferably having 1 to 12 carbon atoms, and the hetero atom includes, for example, a nitrogen atom, an oxygen atom and a sulfur atom, and specifically, for example, imidazolyl.
  • silyl group preferably having 3 to 40 carbon atoms, more preferably 3 to 30 carbon atoms, particularly preferably 3 to 24 carbon atoms, For example, a trimethylsilyl group, a triphenylsilyl group, etc. and the like.
  • substituents may be further substituted. When there are two or more substituents, they may be the same or different. If possible, they may be linked to each other to form a ring.
  • the substituent in R 4 to R 17 of formula (Am-2) is preferably an alkyl group, an aryl group, an alkenyl group, an alkynyl group, or a group in which any of these is further substituted.
  • R 4 to R 17 in formula (Am-2) may be the same or different, and may combine with each other to form a ring structure.
  • R 4 to R 17 may be bonded to L 3 or R 4 to R 17 , respectively, to form a ring structure.
  • R 4 to R 11 are accordingly absent. Good.
  • N1 and n2 in formula (Am-2) are each independently preferably 0, 1, 2 or 3, more preferably 0, 1 or 2, and particularly preferably 0 or 1.
  • a plurality of R 12 and R 13 , and R 15 and R 16 may be the same or different, and are bonded to each other to form a ring structure. May be.
  • Preferable examples of the divalent linking group for L 3 in the formula (Am-2) include —O—, —S—, —N (R L1 ) —, and —C (R L2 ) (R L3 ) —.
  • R L1 to R L3 include a hydrogen atom or a substituent in R 4 to R 17 , which may be bonded to any of R 4 to R 14 to form a ring structure. When C 3 and C 4 and L 3 form a double bond, R L1 to R L3 may not be present.
  • the quaternary ammonium cation in the quaternary ammonium salt compound preferably has an aromatic ring from the viewpoint of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained. Further, the quaternary ammonium cation and the counter anion in the above quaternary ammonium salt compound each preferably have an aromatic ring from the viewpoints of development latitude, post-exposure aging developability, and chemical resistance of the lithographic printing plate obtained. .
  • the quaternary ammonium cation in the quaternary ammonium salt compound preferably has an alicyclic structure from the viewpoint of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained, and is preferably nitrogen.
  • the aliphatic ring is preferably a 5-membered ring to an 8-membered ring, more preferably a 5-membered ring or a 6-membered ring, and particularly preferably a 6-membered ring.
  • the quaternary ammonium cation in the quaternary ammonium salt compound preferably has an aromatic ring and an aliphatic ring, from the viewpoints of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained. preferable.
  • the counter anion in the quaternary ammonium salt compound is a sulfonate ion, a carboxylate ion, an inorganic acid ion having a halogen atom, from the viewpoint of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained.
  • a halide ion is preferable, a sulfonate ion, an inorganic acid ion having a halogen atom, or a halide ion is more preferable, and a sulfonate ion is particularly preferable.
  • the counter anion in the quaternary ammonium salt compound preferably has an aromatic group from the viewpoint of development latitude, post-exposure aging developability, and chemical resistance of the lithographic printing plate obtained. Further, the counter anion in the above quaternary ammonium salt compound preferably has a phenolic hydroxyl group from the viewpoint of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained. Further, the counter anion in the quaternary ammonium salt compound preferably has a diarylketone structure from the viewpoints of development latitude, post-exposure aging developability, and chemical resistance of the lithographic printing plate obtained.
  • the counter anion in the quaternary ammonium salt compound preferably has a phenolic hydroxyl group and a diaryl ketone structure from the viewpoints of development latitude, post-exposure aging developability, and chemical resistance of the lithographic printing plate obtained.
  • the pKa (acid dissociation constant) of the conjugate acid (XH) of the counter anion in the quaternary ammonium salt compound is preferably less than 5, more preferably -10 or more and less than 5, and more preferably -10 or more. It is particularly preferably 2 or less.
  • the pKa in the present disclosure is the pKa in water, and is calculated using ACD / Labs software Ver 8.0 for Microsoft windows ACD / pKa DB ver 8.07 manufactured by Advanced Chemistry Development.
  • the counter anion in the quaternary ammonium salt compound include chloride ion, bromide ion, iodide ion, BF 4 ⁇ , PF 6 ⁇ , trifluoromethanesulfonate ion, p-toluenesulfonate ion, methanesulfone.
  • An acid ion or an anion represented by the following formula (X-1) is preferable, and an anion represented by the following formula (X-1) is particularly preferable.
  • the anion represented by the following formula (X-1) is an anion having a phenolic hydroxyl group and a diarylketone structure.
  • the quaternary ammonium salt compounds may be used alone or in combination of two or more.
  • the content of the quaternary ammonium salt compound is 0.1% by mass to the total mass of the image recording layer from the viewpoints of development latitude, developability after exposure and chemical resistance of the lithographic printing plate obtained. 50 mass% is preferable, 0.5 mass% to 40 mass% is more preferable, and 1 mass% to 30 mass% is particularly preferable.
  • the image recording layer may further contain a resin other than the alkali-soluble resin.
  • the other resin used in the present disclosure is not particularly limited as long as it is a conventionally known resin, and a known alkali-soluble resin can be preferably used. Further, as the other resin, the phenol resins shown below are preferably used.
  • the other resin used in the present disclosure is preferably a phenol resin having a weight average molecular weight of more than 2,000.
  • the phenol resin having a weight average molecular weight of more than 2,000 is a phenol resin containing phenol or a substituted phenol as a structural unit, preferably a novolac resin.
  • the novolak resin is preferably used for the image recording layer in the present disclosure, in the lithographic printing plate precursor, since it causes a strong hydrogen bonding property in the unexposed area and a part of the hydrogen bonding is easily released in the exposed area. It is an alkali-soluble resin.
  • the novolac resin is not particularly limited as long as it contains phenols as a structural unit in the molecule.
  • the novolac resin in the present disclosure is a resin obtained by a condensation reaction of phenol, a substituted phenol shown below, and an aldehyde.
  • the phenol include phenol, isopropylphenol, t-butylphenol, Examples thereof include t-amylphenol, hexylphenol, cyclohexylphenol, 3-methyl-4-chloro-6-t-butylphenol, isopropylcresol, t-butylcresol and t-amylcresol.
  • Preferred are t-butylphenol and t-butylcresol.
  • aldehydes include aliphatic and aromatic aldehydes such as formaldehyde, acetaldehyde, acrolein, and crotonaldehyde. Formaldehyde and acetaldehyde are preferable.
  • examples of the novolac resin in the present disclosure include a condensation polymer of phenol and formaldehyde (phenol formaldehyde resin), a condensation polymer of m-cresol and formaldehyde (m-cresol formaldehyde resin), p -Polycondensation polymer of cresol and formaldehyde (p-cresol formaldehyde resin), polycondensation polymer of m- / p-mixed cresol and formaldehyde (m- / p-mixed cresol-formaldehyde resin), phenol and cresol (m-, Condensation polymer of p- or m- / p-mixture) and formaldehyde (phenol / cresol (m-, p-, or m- / p-mixture) mixed formaldehyde resin), etc.
  • phenol formaldehyde resin phenol formaldehyde resin
  • m-cresol formaldehyde resin a condensation poly
  • novolac resin as described in US Pat. No. 4,123,279, an alkyl group having 3 to 8 carbon atoms such as t-butylphenolformaldehyde resin and octylphenolformaldehyde resin is further used. Examples thereof include a condensation polymer of phenol and formaldehyde having a substituent. Among these novolac resins, phenol formaldehyde resin and phenol / cresol mixed formaldehyde resin are particularly preferable.
  • the weight average molecular weight of the phenol resin is preferably more than 2,000 and 50,000 or less, more preferably 2,500 to 20,000, and particularly preferably 3,000 to 10,000. .
  • the dispersity is preferably 1.1 to 10.
  • the number average molecular weight is a polystyrene equivalent number average molecular weight measured by gel permeation chromatography (GPC) when tetrahydrofuran (THF) is used as a solvent.
  • GPC gel permeation chromatography
  • THF tetrahydrofuran
  • the content of the other resin in the image recording layer in the present disclosure is, from the viewpoint of burning suitability and image forming property, 100 parts by mass of the total content of the resin having an acid group of pKa5 or less and the specific polymer compound.
  • the amount is preferably 90 parts by mass or less, more preferably 50 parts by mass or less, and particularly preferably 30 parts by mass or less.
  • the burning treatment means a high-temperature heat treatment performed after exposure and development of the lithographic printing plate precursor, and the excellent burning suitability means excellent printing durability after the burning treatment.
  • the image forming layer may contain other components, if desired. As other components, known additives can be used. Hereinafter, the acid generator, the acid multiplying agent, and other additives which are optional components in the image forming layer will be described.
  • the image recording layer preferably contains an acid generator.
  • the acid generator is a compound that generates an acid by light or heat, and refers to a compound that decomposes to generate an acid when irradiated with infrared rays or heated at 100 ° C. or higher.
  • the generated acid is preferably a strong acid having a pKa of 2 or less such as sulfonic acid and hydrochloric acid.
  • the acid generated from the acid generator enhances the permeability of the developing solution into the image recording layer in the exposed area of the lithographic printing plate precursor, and further improves the solubility of the image recording layer in the aqueous alkaline solution.
  • the acid generator preferably used in the image recording layer include the acid generators described in paragraphs 0116 to 0130 of WO2016 / 047392.
  • the onium salt compound will be described below.
  • Examples of onium salt compounds that can be suitably used in the present disclosure include compounds known as compounds that generate an acid by being exposed to infrared rays and decomposed by thermal energy generated from the infrared absorber upon exposure.
  • onium salt compounds suitable for the present disclosure include known thermal polymerization initiators and compounds having an onium salt structure described below having a bond with a small bond dissociation energy from the viewpoint of sensitivity.
  • onium salt compounds preferably used in the present disclosure include known diazonium salts, iodonium salts, sulfonium salts, primary to tertiary ammonium salts, pyridinium salts, azinium salts, and the like, among which triarylsulfonium, Alternatively, sulfonate, carboxylate, BF 4 ⁇ , PF 6 ⁇ , ClO 4 ⁇ , etc. of diaryl iodonium are preferable.
  • Examples of the onium salt compound that can be used as the acid generator in the present disclosure include onium salt compounds represented by the following formulas (III) to (V).
  • Ar 11 and Ar 12 each independently represent an aryl group having 20 or less carbon atoms, which may have a substituent.
  • a preferable substituent is a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or an aryloxy group having 12 or less carbon atoms. Is mentioned.
  • Z 11- is a pair selected from the group consisting of halide ion, perchlorate ion, tetrafluoroborate ion, hexafluorophosphate ion, sulfonate ion, and sulfonate ion having a fluorine atom such as perfluoroalkylsulfonate ion. It represents an ion, and is preferably a perchlorate ion, a hexafluorophosphate ion, an aryl sulfonate ion, and a perfluoroalkyl sulfonic acid.
  • Ar 21 represents an optionally substituted aryl group having 1 to 20 carbon atoms.
  • Preferred substituents are a halogen atom, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aryloxy group having 1 to 12 carbon atoms, an alkylamino group having 1 to 12 carbon atoms, Examples thereof include a dialkylamino group having 2 to 12 carbon atoms, an arylamino group having 6 to 12 carbon atoms, and a diarylamino group (the carbon numbers of two aryl groups are each independently 6 to 12).
  • Z 21- represents a counter ion having the same meaning as Z 11- .
  • R 31 , R 32 and R 33 may be the same or different and each represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent.
  • substituents include a halogen atom, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and an aryloxy group having 1 to 12 carbon atoms.
  • Z 31- represents a counter ion having the same meaning as Z 11- .
  • onium salt compound that can be preferably used in the image recording layer are the same as the compounds described in paragraphs 0121 to 0124 of International Publication WO2016 / 047392.
  • the compounds described as examples of the radical polymerization initiator in paragraphs 0036 to 0045 of JP 2008-195018 can be used. It can be suitably used as the acid generator according to the present disclosure.
  • More preferred examples of the acid generator usable in the present disclosure include the following compounds (PAG-1) to (PAG-5). Me represents a methyl group.
  • these acid generators When these acid generators are contained in the image recording layer in the present disclosure, these compounds may be used alone or in combination of two or more kinds.
  • the content of the acid generator is preferably 0.01% by mass to 50% by mass, more preferably 0.1% by mass to 40% by mass, and 0.5% by mass with respect to the total mass of the image recording layer. More preferably, it is from about 30% by mass.
  • the content is within the above range, the sensitivity, which is an effect of the addition of the acid generator, is improved, and the generation of the residual film in the non-image area is suppressed.
  • the image recording layer in the present disclosure may contain an acid multiplying agent.
  • the acid multiplying agent in the present disclosure is a compound substituted with a residue of a relatively strong acid, and is a compound which is easily eliminated in the presence of an acid catalyst to newly generate an acid. That is, it decomposes by an acid-catalyzed reaction to generate an acid again.
  • One or more acids are increased in one reaction, and the acid concentration is accelerated as the reaction progresses, so that the sensitivity is dramatically improved.
  • the strength of the generated acid is preferably 3 or less as an acid dissociation constant (pKa), and more preferably 2 or less. When the acid dissociation constant is 3 or less, the elimination reaction by the acid catalyst is likely to occur.
  • Examples of the acid used for such an acid catalyst include dichloroacetic acid, trichloroacetic acid, methanesulfonic acid, ethanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid and phenylsulfonic acid.
  • the usable acid multiplying agent is the same as those described in paragraphs 0133 to 0135 of WO 2016/047392.
  • the content thereof is preferably 0.01% by mass to 20% by mass, and 0.01% by mass to 10% by mass based on the total mass of the image recording layer. Is more preferable, and 0.1% by mass to 5% by mass is further preferable.
  • the content of the acid proliferating agent is in the above range, the effect of adding the acid proliferating agent is sufficiently obtained, the sensitivity is improved, and the reduction of the film strength of the image area is suppressed.
  • the image recording layer in the present disclosure may contain a development accelerator, a surfactant, a printout agent, a colorant, a plasticizer, a wax agent, etc. as other additives.
  • -Development accelerator- An acid anhydride, a phenol, or an organic acid may be added to the image recording layer in the present disclosure for the purpose of improving sensitivity.
  • Cyclic acid anhydrides are preferred as the acid anhydrides, and specific examples of the cyclic acid anhydrides include phthalic anhydride, tetrahydrophthalic anhydride, and hexahydroanhydride described in US Pat. No. 4,115,128.
  • Phthalic acid, 3,6-endooxytetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, ⁇ -phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride and the like can be used.
  • Acetic anhydride etc. are mentioned as an acyclic acid anhydride.
  • phenols include bisphenol A, 2,2′-bishydroxysulfone, p-nitrophenol, p-ethoxyphenol, 2,4,4′-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 4- Examples include hydroxybenzophenone, 4,4 ', 4 "-trihydroxytriphenylmethane, 4,4', 3", 4 "-tetrahydroxy-3,5,3 ', 5'-tetramethyltriphenylmethane. .
  • Organic acids are described in JP-A-60-88942, JP-A-2-96755, and the like.
  • p-toluenesulfonic acid dodecylbenzenesulfonic acid, p-toluenesulfinic acid, Ethyl sulfuric acid, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene Examples include -1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid.
  • the proportion of the above-mentioned acid anhydride, phenols and organic acids in the total mass of the image recording layer is preferably 0.05% by mass to 20% by mass, more preferably 0.1% by mass to 15% by mass, and 0.1% by mass. 1% by mass to 10% by mass is particularly preferable.
  • JP-A-62-251740 and JP-A-3-208514 The image recording layer in the present disclosure is described in JP-A-62-251740 and JP-A-3-208514 in order to improve the coating property and to broaden the stability of processing under developing conditions.
  • Such nonionic surfactants, amphoteric surfactants as described in JP-A-59-121044 and JP-A-4-13149, JP-A-62-170950, JP-A-11- Fluorine-containing monomer copolymers as described in JP-A-288093 and JP-A-2003-57820 can be added.
  • nonionic surfactant examples include sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride and polyoxyethylene nonylphenyl ether.
  • amphoteric activator examples include alkyldi (aminoethyl) glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethylimidazolinium betaine and N-tetradecyl-N, N-betaine.
  • the ratio of the surfactant to the total mass of the image recording layer is preferably 0.01% by mass to 15% by mass, more preferably 0.01% by mass to 5% by mass, and 0.05% by mass to 2.0% by mass. % Is more preferable.
  • -Bakeout agent / colorant- A printout agent for obtaining a visible image immediately after heating by exposure and a dye or pigment as an image colorant can be added to the image recording layer.
  • a dye or pigment as an image colorant can be added to the image recording layer.
  • Examples of the print-out agent and the colorant are described in detail in paragraphs 0122 to 0123 of JP 2009-229917 A, and the compounds described therein can be applied to the present disclosure.
  • the print-out agent and the colorant are preferably added in a proportion of 0.01% by mass to 10% by mass, and in a ratio of 0.1% by mass to 3% by mass, based on the total mass of the image recording layer. Is more preferable.
  • plasticizer may be added to the image recording layer in order to impart flexibility to the coating film.
  • plasticizers are preferably added in a proportion of 0.5% by mass to 10% by mass, more preferably 1.0% by mass to 5% by mass, based on the total mass of the image recording layer. preferable.
  • -Wax agent- A compound that reduces the coefficient of static friction of the surface may be added to the image recording layer for the purpose of imparting resistance to scratches.
  • Examples thereof include compounds having an ester of a long-chain alkylcarboxylic acid.
  • the content of the wax agent is preferably 0.1% by mass to 10% by mass, more preferably 0.5% by mass to 5% by mass, based on the total mass of the image recording layer. .
  • the image recording layer preferably has an upper layer and a lower layer, and an image recording layer in which the lower layer and the upper layer are arranged in this order on a support (hereinafter, also referred to as a “lithographic printing plate precursor having a two-layer structure”). Is more preferable.
  • the lower layer and the upper layer are preferably formed by separating the two layers.
  • a method of forming the two layers separately for example, a method of utilizing a difference in solvent solubility between a component contained in the lower layer and a component contained in the upper layer, or a method of applying a solvent rapidly after coating the upper layer Examples of the method include drying and removing.
  • the ammonium salt compound may be contained in either the lower layer or the upper layer, but from the viewpoint of printing durability and scratch resistance, the upper layer contains at least an infrared absorbing agent, and a quaternary ammonium salt compound, and
  • the lower layer preferably contains at least an alkali-soluble resin having a constitutional unit represented by the above formula (1), a constitutional unit having a phenolic hydroxyl group in a side chain, and a constitutional unit represented by the above formula (2).
  • the content of the infrared absorber in the upper layer is preferably 0.01 g / m 2 or more and 1.0 g / m 2 or less, and 0.02 g / m 2 or more 0 from the viewpoint of development latitude and post-exposure aging developability. More preferably .50g / m 2 or less, and particularly preferably 0.07 g / m 2 or more 0.19 g / m 2 or less.
  • the content of the quaternary ammonium salt compound in the upper layer is preferably 0.01 g / m 2 or more and 0.40 g / m 2 or less from the viewpoint of development latitude and post-exposure aging developability.
  • the content of the alkali-soluble resin in the lower layer is preferably 0.1 g / m 2 or more and 10.0 g / m 2 or less, and 0.5 g / m 2 or more, from the viewpoint of development latitude and post-exposure aging developability. More preferably 4.0 g / m 2 or less, particularly preferably 1.40 g / m 2 or more 2.40 g / m 2 or less.
  • these methods will be described in detail, but the method of separating and applying the two layers is not limited thereto.
  • a solvent system in which none of the components contained in the lower layer is insoluble is used when the coating liquid for the upper layer is applied. It is a thing. As a result, even if two-layer coating is performed, each layer can be clearly separated to form a coating film.
  • a component insoluble in a solvent such as methyl ethyl ketone or 1-methoxy-2-propanol that dissolves the upper layer component alkali-soluble resin is selected, and the lower layer is coated using a solvent system that dissolves the lower layer component. After drying, the upper layer mainly composed of the alkali-soluble resin is dissolved with methyl ethyl ketone, 1-methoxy-2-propanol or the like, and the resulting layer is coated and dried to form a double layer.
  • high-pressure air is blown from a slit nozzle installed almost at right angles to the running direction of the web, or heating with steam or the like.
  • This can be achieved by applying heat energy as conduction heat from the lower surface of the web from a roll (heating roll) that is internally supplied with the medium, or by combining them.
  • the coating amount of the lower layer component coated on the support of the lithographic printing plate precursor according to the present disclosure after drying is preferably in the range of 0.5 g / m 2 to 4.0 g / m 2 , and is 0.6 g. / M 2 to 2.5 g / m 2 is more preferable. When it is 0.5 g / m 2 or more, printing durability is excellent, and when it is 4.0 g / m 2 or less, image reproducibility and sensitivity are excellent.
  • the coating amount after drying of the upper layer component is preferably in the range of 0.05g / m 2 ⁇ 1.0g / m 2, in the range of 0.08g / m 2 ⁇ 0.7g / m 2 Is more preferable.
  • the combined coating amount of the lower layer and the upper layer after drying is preferably in the range of 0.6 g / m 2 to 4.0 g / m 2 , and in the range of 0.7 g / m 2 to 2.5 g / m 2 . Is more preferable.
  • 0.6 g / m 2 or more printing durability is excellent, and when it is 4.0 g / m 2 or less, image reproducibility and sensitivity are excellent.
  • the support used in the lithographic printing plate precursor according to the present disclosure is not particularly limited as long as it is a dimensionally stable plate-like material having necessary strength and durability, and for example, paper, plastic (for example, , Polyethylene, polypropylene, polystyrene, etc.) laminated paper, metal plate (eg, aluminum, zinc, copper, etc.), plastic film (eg, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate) , Cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.), a paper laminated with or vapor-deposited with the above metals, or a plastic film.
  • plastic for example, Polyethylene, polypropylene, polystyrene, etc.
  • metal plate eg, aluminum, zinc, copper, etc.
  • plastic film eg, cellulose diacetate,
  • a polyester film or an aluminum plate is preferable, and among them, an aluminum plate which has good dimensional stability and is relatively inexpensive is particularly preferable.
  • a suitable aluminum plate is a pure aluminum plate or an alloy plate containing aluminum as a main component and containing a trace amount of a foreign element, and may be a plastic film on which aluminum is laminated or vapor-deposited.
  • the foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel and titanium.
  • the content of the foreign element in the alloy is preferably 10 mass% or less.
  • Aluminum which is particularly suitable in the present disclosure is pure aluminum, but completely pure aluminum is difficult to produce due to refining technology, and thus may contain slightly different elements.
  • the composition of the aluminum plate applied to the present disclosure is not specified, and an aluminum plate of a publicly known and publicly known material can be appropriately used.
  • the aluminum plate used in the present disclosure preferably has a thickness of 0.1 mm to 0.6 mm, more preferably 0.15 mm to 0.4 mm, and particularly preferably 0.2 mm to 0.3 mm. preferable.
  • Such aluminum plate may be subjected to surface treatment such as surface roughening treatment and anodizing treatment, if necessary.
  • surface treatment such as surface roughening treatment and anodizing treatment
  • a degreasing treatment with a surfactant, an organic solvent or an alkaline aqueous solution, a rough surface as described in paragraphs 0167 to 0169 of JP2009-175195A Chemical treatment, anodization treatment, etc. are appropriately performed.
  • the aluminum surface that has been subjected to the anodizing treatment is optionally subjected to a hydrophilic treatment.
  • hydrophilic treatment examples include an alkali metal silicate (for example, sodium silicate aqueous solution) method, a treatment with potassium fluorozirconate, or polyvinylphosphonic acid as disclosed in paragraph 0169 of 2009-175195. Used. Further, the support described in JP 2011-245844 A is also preferably used.
  • an undercoat layer can be provided between the support and the image forming layer, if necessary.
  • various organic compounds are used, for example, carboxymethyl cellulose, phosphonic acids having an amino group such as dextrin, organic phosphonic acid, organic phosphoric acid, organic phosphinic acid, amino acids, and a hydroxy group.
  • Preferable examples are the hydrochlorides of the amines that it has.
  • These undercoat layer components may be used alone or in combination of two or more.
  • the coating amount of the undercoat layer is preferably 2 mg / m 2 to 200 mg / m 2 , and more preferably 5 mg / m 2 to 100 mg / m 2 . When the coating amount is within the above range, sufficient printing durability can be obtained.
  • a back coat layer is preferably provided on the surface of the support opposite to the side on which the image recording layer is provided, if necessary.
  • the back coat layer is composed of an organic polymer compound described in JP-A-5-45885 and a metal oxide obtained by hydrolyzing and polycondensing an organic or inorganic metal compound described in JP-A-6-35174.
  • a coating layer is preferably used.
  • silicon alkoxy compounds such as Si (OCH 3 ) 4 , Si (OC 2 H 5 ) 4 , Si (OC 3 H 7 ) 4 and Si (OC 4 H 9 ) 4 are inexpensively available. It is particularly preferable because the coating layer of the metal oxide obtained therefrom is excellent in the resistance to developing solution.
  • the method for producing a lithographic printing plate according to the present disclosure includes an exposure step of exposing the lithographic printing plate precursor according to the present disclosure in an imagewise manner, and a developing step of developing with a developing solution in this order.
  • the developer is preferably an alkali developer having a pH of 9 or more from the viewpoint of suppressing silicate debris.
  • the method for producing a lithographic printing plate according to the present disclosure from the viewpoint of suppressing silicate residue, a step of imagewise exposing the lithographic printing plate precursor according to the present disclosure using an infrared laser, and does not include a silicate compound. It is preferable to include a step of developing using an alkaline developer having a pH of 9 or more.
  • the method for producing a lithographic printing plate according to the present disclosure includes an exposure step of imagewise exposing the lithographic printing plate precursor according to the present disclosure.
  • a light source of actinic rays used for image exposure of the lithographic printing plate precursor according to the present disclosure a light source having an emission wavelength in the near infrared to infrared region is preferable, and a solid laser and a semiconductor laser are more preferable.
  • the laser output is preferably 100 mW or more, and it is preferable to use a multi-beam laser device in order to shorten the exposure time.
  • the exposure time per pixel is preferably within 20 ⁇ sec.
  • the energy applied to the lithographic printing plate precursor is preferably 10 mJ / cm 2 to 300 mJ / cm 2 . Within the above range, laser ablation can be suppressed and the image can be prevented from being damaged.
  • the exposure in the present disclosure can be performed by overlapping the light beams of the light source.
  • the overlap means that the sub-scanning pitch width is smaller than the beam diameter.
  • the overlap can be quantitatively expressed by FWHM / sub-scanning pitch width (overlap coefficient) when the beam diameter is expressed by the full width at half maximum (FWHM) of the beam intensity. In the present disclosure, this overlap coefficient is preferably 0.1 or more.
  • the light source scanning method of the exposure apparatus that can be used in the present disclosure is not particularly limited, and a cylinder outer surface scanning method, a cylinder inner surface scanning method, a flat surface scanning method, or the like can be used.
  • the light source channel may be a single channel or a multi-channel, but in the case of the cylindrical outer surface system, the multi-channel is preferably used.
  • the method for producing a lithographic printing plate according to the present disclosure includes a developing step of developing with a developing solution.
  • the developer used in the developing step is preferably an alkali developer having a pH of 9 or more, more preferably an alkali developer having a pH of 9 or more and containing no silicate compound.
  • the silicate compound include silicon dioxide.
  • the developer containing no silicate compound is also referred to as a non-silicate developer, and the development using the non-silicate developer is also referred to as a non-silicate development.
  • the non-silicate developer the non-silicate developer described in JP 2001-209172 A is preferably used.
  • the pH of the alkaline developer is preferably 12.5 to 13.5.
  • the alkaline developer preferably contains an organic compound having a buffering action and a basic compound.
  • the organic compound having a buffering action include saccharides (especially those represented by the general formula (I) or (II)) described as a compound having a buffering action in JP-A-8-220775, and oximes (especially General formula (III)), phenols (particularly represented by general formula (IV)), fluorinated alcohols (particularly represented by general formula (V)) and the like.
  • the compounds represented by the general formulas (I) to (V) preferred are the saccharides represented by the general formula (I) or (II) and the phenols represented by the general formula (V).
  • non-reducing sugars such as saccharose or sulfosalicylic acid are more preferable.
  • the above-mentioned non-reducing sugars include trehalose-type oligosaccharides having reducing groups bound to each other, glycosides having reducing groups of saccharides bound to non-saccharides, sugar alcohols hydrogenated to reduce sugars, and the like.
  • Examples of the trehalose-type oligosaccharides include saccharose and trehalose, and examples of the glycosides include alkyl glycosides, phenol glycosides, mustard oil glycosides, and the like.
  • Examples of the sugar alcohol include D, L-arabite, ribit, xylit, D, L-sorbit, D, L-annite, D, L-idit, D, L-talit, Kiricit, and alodulcit.
  • maltitol obtained by hydrogenation of a disaccharide, a reduced form (reduced starch syrup) obtained by hydrogenation of an oligosaccharide, and the like can be preferably mentioned.
  • sugar alcohol and saccharose are preferable as the non-reducing sugar, and among them, D-sorbit, sucrose and reduced starch syrup are more preferable because they have a buffering action in an appropriate pH range.
  • the organic compounds having a buffering effect may be used alone or in combination of two or more.
  • the content of the organic compound having a buffering effect is preferably 0.1% by mass to 30% by mass, more preferably 1% by mass to 20% by mass, based on the total mass of the developer.
  • An alkaline agent as a basic compound can be appropriately selected from the conventionally known compounds and combined with the above-mentioned organic compound having a buffering action.
  • the alkaline agent include sodium hydroxide, potassium hydroxide, lithium hydroxide, trisodium phosphate, tripotassium phosphate, triammonium phosphate, disodium phosphate, dipotassium phosphate, diammonium phosphate, Inorganic alkaline agents such as sodium carbonate, potassium carbonate, ammonium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, ammonium hydrogen carbonate, sodium borate, potassium borate, ammonium borate, potassium citrate, tripotassium citrate, sodium citrate Etc.
  • organic alkali agents such as neuramis, ethyleneimine, ethylenediamine, pyridine and the like.
  • sodium hydroxide or potassium hydroxide is preferable as the basic compound.
  • the reason is that the pH can be adjusted in a wide pH range by adjusting the addition amount to the non-reducing sugar.
  • trisodium phosphate, tripotassium phosphate, sodium carbonate, potassium carbonate and the like are preferable because they have a buffering effect.
  • the above basic compounds may be used alone or in combination of two or more.
  • the content of the basic compound is not particularly limited, and it may be added to the developing solution in an amount that provides a desired pH.
  • the developer preferably contains a surfactant from the viewpoint of processability.
  • the surfactant used in the developer may be any of anionic, nonionic, cationic, and amphoteric surfactants, but as described above, anionic and nonionic surfactants. Agents are preferred.
  • anionic, nonionic, cationic and amphoteric surfactants used in the developing solution in the present disclosure those described in paragraphs 0128 to 0131 of JP2013-134341A can be used.
  • the HLB value of the surfactant is preferably 6 or more, more preferably 8 or more.
  • anionic surfactants and nonionic surfactants are preferable, and anionic surfactants containing sulfonic acid or sulfonate, and nonionics having an aromatic ring and an ethylene oxide chain. Surfactants are especially preferred.
  • the surfactants can be used alone or in combination.
  • the content of the surfactant in the developer is preferably 0.01% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass.
  • the developer may contain a wetting agent, a preservative, a chelate compound, a defoaming agent, an organic acid, an organic solvent, an inorganic acid, an inorganic salt and the like.
  • a wetting agent e.g., a preservative, a chelate compound, a defoaming agent, an organic acid, an organic solvent, an inorganic acid, an inorganic salt and the like.
  • the wetting agent described in paragraph 0141 of JP2013-134341A can be preferably used.
  • the wetting agents may be used alone or in combination of two or more.
  • the wetting agent is preferably used in an amount of 0.1% by mass to 5% by mass, based on the total mass of the developer.
  • the preservative described in paragraph 0142 of JP2013-134341A can be preferably used. It is preferable to use two or more preservatives in combination so as to be effective against various molds and sterilizations.
  • the addition amount of the preservative is an amount that exerts a stable effect on bacteria, molds, yeasts and the like, and varies depending on the types of bacteria, molds, yeasts, but it is 0 for the total mass of the developer. A range of 0.01% by mass to 4% by mass is preferable.
  • the chelate compound described in paragraph 0143 of JP2013-134341A can be preferably used.
  • the chelating agent is selected so that it stably exists in the developer composition and does not impair the printability.
  • the addition amount is preferably 0.001% by mass to 1.0% by mass with respect to the total mass of the developer.
  • the defoaming agent described in paragraph 0144 of JP2013-134341A can be preferably used.
  • the content of the defoaming agent is preferably in the range of 0.001% by mass to 1.0% by mass with respect to the total weight of the developer.
  • the defoaming agent described in paragraph 0145 of JP2013-134341A can be preferably used.
  • the content of the organic acid is preferably 0.01% by mass to 0.5% by mass with respect to the total mass of the developer.
  • organic solvent examples include aliphatic hydrocarbons (hexane, heptane, “Isopar E, H, G” (manufactured by Esso Chemical Co., Ltd.), gasoline, or kerosene), aromatic hydrocarbons (toluene, Xylene) or halogenated hydrocarbons (methylene dichloride, ethylene dichloride, trichlene, monochlorobenzene, etc.) and polar solvents.
  • aliphatic hydrocarbons hexane, heptane, “Isopar E, H, G” (manufactured by Esso Chemical Co., Ltd.)
  • aromatic hydrocarbons toluene, Xylene
  • halogenated hydrocarbons methylene dichloride, ethylene dichloride, trichlene, monochlorobenzene, etc.
  • polar solvents examples include alcohols (methanol, ethanol, propanol, isopropanol, benzyl alcohol, ethylene glycol monomethyl ether, 2-ethoxyethanol, etc.), ketones (methyl ethyl ketone, cyclohexanone, etc.), esters (ethyl acetate, methyl lactate, propylene). Glycol monomethyl ether acetate, etc.) and others (triethyl phosphate, tricresyl phosphate, N-phenylethanolamine, N-phenyldiethanolamine, etc.) and the like.
  • the above organic solvent is insoluble in water, it can be solubilized in water with a surfactant or the like before use.
  • the concentration of the solvent is preferably less than 40 mass% from the viewpoint of safety and flammability.
  • the inorganic acid and the inorganic salt phosphoric acid, metaphosphoric acid, monobasic ammonium phosphate, dibasic ammonium phosphate, monobasic sodium phosphate, dibasic sodium phosphate, monobasic potassium phosphate, dibasic potassium phosphate, Examples thereof include sodium tripolyphosphate, potassium pyrophosphate, sodium hexametaphosphate, magnesium nitrate, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium sulfite, ammonium sulfite, sodium hydrogensulfate and nickel sulfate.
  • the content of the inorganic salt is preferably 0.01% by mass to 0.5% by mass with respect to the total mass of the developer.
  • the developing temperature is not particularly limited as long as it can be developed, but is preferably 60 ° C. or lower, more preferably 15 ° C. to 40 ° C.
  • the developing solution may become fatigued depending on the processing amount, and therefore the replenishing solution or a fresh developing solution may be used to recover the processing ability.
  • a method of performing alkali development, removing the alkali in the post-water washing step, performing gum treatment in the gumming step, and drying in the drying step can be exemplified.
  • a method of simultaneously performing pre-washing, developing and gumming can be preferably exemplified by using an aqueous solution containing carbonate ion, hydrogen carbonate ion and a surfactant. Therefore, the pre-water washing step does not have to be particularly performed, and it is preferable to perform the pre-water washing, the development and the gumming in one bath only after using one solution, and then to perform the drying step. After the development, it is preferable to remove excess developer using a squeeze roller or the like and then perform drying.
  • Development process can be preferably carried out by an automatic processor equipped with a rubbing member.
  • the automatic processor for example, the automatic processor described in JP-A-2-220061 and JP-A-60-59351, which performs rubbing treatment while conveying the planographic printing plate precursor after image exposure, and a cylinder
  • the lithographic printing plate precursor after image exposure set on the above is subjected to rubbing treatment while rotating a cylinder
  • an automatic processor using a rotating brush roll as the rubbing member is particularly preferable.
  • the rotating brush roll used in the present disclosure can be appropriately selected in consideration of the scratch resistance of the image area, the rigidity of the support of the planographic printing plate precursor, and the like.
  • a known roll formed by planting a brush material on a plastic or metal roll can be used.
  • a metal or plastic in which brush materials are implanted in rows as described in JP-A-58-159533 and JP-A-3-100554, and JP-B-62-167253. It is possible to use a brush roll in which the groove-shaped material is wound around a plastic or metal roll serving as a core in a radial pattern without a gap.
  • plastic fibers for example, polyester type such as polyethylene terephthalate and polybutylene terephthalate, polyamide type such as nylon 6.6 and nylon 6.10, polyacryl type such as polyacrylonitrile, alkyl poly (meth) acrylate
  • Polyolefin-based synthetic fibers such as polypropylene and polystyrene
  • fibers having a hair diameter of 20 ⁇ m to 400 ⁇ m and a hair length of 5 mm to 30 mm can be preferably used.
  • the outer diameter of the rotating brush roll is preferably 30 mm to 200 mm, and the peripheral speed of the tip of the brush rubbing the plate surface is preferably 0.1 m / sec to 5 m / sec. It is preferable to use a plurality of rotating brush rolls.
  • the rotating brush roll may be rotated in the same direction or in the opposite direction with respect to the conveying direction of the lithographic printing plate precursor, but when using two or more rotating brush rolls, at least one rotating brush roll is used. It is preferable that the rotating brush rolls of 1 rotate in the same direction and at least one rotating brush roll rotate in the opposite direction. This further ensures removal of the image recording layer in the non-image area. Further, it is also effective to swing the rotating brush roll in the rotation axis direction of the brush roll.
  • the method for producing a lithographic printing plate according to the present disclosure the liquid activity of the alkaline developer is measured by the conductivity of the alkaline developer, and a replenisher is added according to the measured value to obtain the target conductivity. Therefore, it is preferable to include a step of controlling the liquid activity (also referred to as a “control step”).
  • the alkali developing solution in the control step is preferably an alkali developing solution containing no silicate compound and having a pH of 9 or more.
  • the “replenisher” is a processing solution replenished to keep the developing performance constant.
  • the replenishing solution there are those prepared by diluting the replenishing solution undiluted solution with a diluting solution (eg, water), and those using the replenishing solution undiluted solution as it is without diluting it. Is preferably prepared by diluting the replenisher stock solution with a diluent.
  • a replenishing method there is a method of replenishing the developing solution with a replenishing solution prepared by diluting in advance, or a method of directly replenishing the developing solution with the replenishing solution stock solution and the diluting solution separately.
  • an electric conductivity sensor As a method for measuring the electric conductivity of the alkaline developer, it is preferable to use an electric conductivity sensor.
  • the conductivity sensor for measuring the conductivity of the developer a known means such as an AC conductivity meter, an AC bridge meter, or other conductivity meter can be used.
  • the measured current value, oscillation frequency, etc. of the above-mentioned measuring device differ in optimum conditions depending on the composition of the developing solution, etc., but the current value is low to some extent in terms of the apparatus and to prevent electrolysis of the water-soluble developing solution. Is preferable, and several hundred mA to several ⁇ A is preferable.
  • the frequency is preferably several hundreds Hz to several hundreds kHz from the relationship with the electrostatic capacitance component in the developing solution.
  • the value of the conductivity of the developer containing the electrolyte depends on the temperature of the aqueous solution, and decreases as the temperature of the solution rises. Therefore, it is more preferable to measure the electric conductivity with a measuring instrument equipped with a temperature sensor and a temperature compensation circuit. Further, in the control device for controlling replenishment, it is possible to convert the actually measured liquid resistance value and liquid temperature into an electric conductivity value at a predetermined temperature for temperature compensation.
  • the sensor installation position of the AC conductivity meter, the AC bridge meter, or other conductivity meter may be a place where the AC conductivity value of the developer can be measured by being immersed in the developer at the time of measurement.
  • the preferred position is the developing solution circulation system, especially in the developing tank or the circulation pipe.
  • As the detection unit a known measurement cell using platinum, stainless steel or the like for the electrode can be used.
  • a drying step continuously or discontinuously. Drying is performed with hot air, infrared rays, far infrared rays, or the like.
  • an automatic processor preferably used in the method for producing a lithographic printing plate according to the present disclosure, an apparatus having a developing unit and a drying unit is used, and a lithographic printing plate precursor is developed and gummed in a developing tank. And then dried in the drying section to obtain a lithographic printing plate.
  • the printing plate after development can be heated for the purpose of improving printing durability.
  • the heating temperature is preferably in the range of 200 ° C to 500 ° C.
  • the molecular weight is the weight average molecular weight (Mw) and the ratio of the constitutional units is a mole percentage, except for those specifically specified.
  • Mw weight average molecular weight
  • the weight average molecular weight (Mw) is a value measured as a polystyrene conversion value by a gel permeation chromatography (GPC) method.
  • ⁇ Surface treatment> As the surface treatment, the following various treatments (a) to (k) were continuously performed. After each treatment and washing with water, drainage was performed with a nip roller.
  • FIG. 1 Mechanical surface roughening treatment
  • a device such as shown in FIG. 1 was used to supply a suspension of an abrasive (pumice) having a specific gravity of 1.12 and water as a polishing slurry liquid to the surface of an aluminum plate. Meanwhile, mechanical roughening treatment was performed by a rotating roller-shaped nylon brush.
  • 1 is an aluminum plate
  • 2 and 4 are roller brushes
  • 3 is a polishing slurry liquid
  • 5, 6, 7 and 8 are support rollers.
  • the average particle size of the abrasive was 30 ⁇ m, and the maximum particle size was 100 ⁇ m.
  • the material of the nylon brush was 6.10 nylon, the bristle length was 45 mm, and the bristle diameter was 0.3 mm.
  • the nylon brush was prepared by forming holes in a stainless steel cylinder having a diameter of 300 mm and densely implanting the bristles. Three rotating brushes were used. The distance between the two support rollers ( ⁇ 200 mm) below the brush was 300 mm. The brush roller was pressed until the load of the drive motor for rotating the brush became 7 kW plus with respect to the load before the brush roller was pressed against the aluminum plate. The rotating direction of the brush was the same as the moving direction of the aluminum plate. The rotation number of the brush was 200 rpm (revolutions per minute).
  • Desmutting treatment was carried out by spraying with a 1% by weight nitric acid concentration aqueous solution (containing 0.5% by weight of aluminum ion) at a temperature of 30 ° C., followed by washing with water by spraying.
  • the nitric acid aqueous solution used for the desmutting treatment was the waste liquid of the step of performing the electrochemical surface roughening treatment using an alternating current in the nitric acid aqueous solution.
  • Electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz. At this time, the electrolytic solution was a 10.5 g / L nitric acid aqueous solution (containing 5 g / L of aluminum ions and 0.007% by mass of ammonium ions), and the liquid temperature was 50 ° C.
  • the AC power supply waveform is the waveform shown in FIG. 2, in which the time TP required for the current value to reach the peak from zero is 0.8 msec, the duty ratio is 1: 1, and a trapezoidal rectangular wave AC is used, with the carbon electrode as the counter electrode.
  • An electrochemical graining treatment was performed. Ferrite was used for the auxiliary anode. The electrolytic cell used was that shown in FIG.
  • the electrolytic cell (radial cell) shown in FIG. 3 includes a main electrolytic cell 40 including a radial drum roller 12 and main electrodes 13a and 13b, an auxiliary anode tank 50 including an auxiliary anode 18, thyristors 19a and 19b, and an AC power supply. 20 and.
  • the electrolytic treatment liquid 14 is supplied to the aluminum plate 11 conveyed to the electrolytic liquid passage 17 via the electrolytic liquid supply ports 15 and 16.
  • the current density was 30 A / dm 2 at the peak value of the current, and the amount of electricity was 220 C / dm 2 as the total amount of electricity when the aluminum plate was the anode. 5% of the current flowing from the power source was shunted to the auxiliary anode. Then, washing with water was performed by spraying.
  • (E) Alkaline etching treatment An aluminum plate is subjected to etching treatment by spraying with an aqueous solution having a caustic soda concentration of 26 mass% and an aluminum ion concentration of 6.5 mass% at 32 ° C to dissolve the aluminum plate at 0.50 g / m 2 . Removes the smut component composed mainly of aluminum hydroxide generated when electrochemical roughening treatment was performed using the alternating current in the previous stage, and melts the edge part of the generated pit to smooth the edge part. did. Then, washing with water was performed by spraying.
  • Desmutting treatment was performed by spraying with a 15% by weight nitric acid aqueous solution (containing 4.5% by weight of aluminum ion) at a temperature of 30 ° C., and then washed with water by spraying.
  • nitric acid aqueous solution used for the desmut a waste liquid from the step of performing an electrochemical graining treatment using an alternating current in the nitric acid aqueous solution was used.
  • Electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz.
  • the electrolytic solution at this time was a 5.0 g / L hydrochloric acid aqueous solution (containing 5 g / L of aluminum ions), and the temperature was 35 ° C.
  • the AC power supply waveform is the waveform shown in FIG. 2, and the time TP from when the current value reaches zero to the peak is 0.8 msec, the duty ratio is 1: 1, and the trapezoidal rectangular wave AC is used to drive the carbon electrode.
  • Electrochemical roughening treatment was performed as a counter electrode. Ferrite was used for the auxiliary anode.
  • the electrolytic cell used was that shown in FIG.
  • the 3 includes a main electrolytic cell 40 including a radial drum roller 12 and main electrodes 13a and 13b, an auxiliary anode tank 50 including an auxiliary anode 18, thyristors 19a and 19b, and an AC power supply. 20 and.
  • the electrolytic treatment liquid 14 is supplied to the aluminum plate 11 conveyed to the electrolytic liquid passage 17 via the electrolytic liquid supply ports 15 and 16.
  • the current density was 25 A / dm 2 at the peak value of the current, and the amount of electricity was 50 C / dm 2 as the total amount of electricity when the aluminum plate was the anode. Then, washing with water was performed by spraying.
  • (H) Alkaline etching treatment An aluminum plate is subjected to etching treatment by spraying at 32 ° C. using an aqueous solution having a caustic soda concentration of 26 mass% and an aluminum ion concentration of 6.5 mass% to dissolve the aluminum plate at 0.10 g / m 2 . Removes the smut component composed mainly of aluminum hydroxide generated when electrochemical roughening treatment was performed using the alternating current in the previous stage, and melts the edge part of the generated pit to smooth the edge part. did. Then, washing with water was performed by spraying.
  • Desmutting treatment was carried out by spraying with a 25% by mass aqueous solution of sulfuric acid (containing 0.5% by mass of aluminum ion) at a temperature of 60 ° C., followed by washing with water by spraying.
  • the anodizing device currents from the power source 67a and the power source 67b flow to the first power feeding electrode 65a provided in the first power feeding portion 62a, flow to the aluminum plate 11 via the electrolytic solution, and then to the first electrolytic portion 63a. Then, an anodic oxide film is formed on the surface of the aluminum plate 11, passes through the electrolytic electrodes 66a and 66b provided in the first electrolytic portion 63a, and returns to the electrodes 67a and 67b.
  • the amount of electricity supplied from the power sources 67a and 67b to the first power supply unit 62a is equal to the amount of electricity supplied from the power sources 67c and 67d to the second power supply unit 62b, and the first electrolysis unit 63a and the second electrolysis unit 63a
  • the current densities at 63b were both about 30 A / dm 2 .
  • power is fed through the oxide film surface of 1.35 g / m 2 generated in the first electrolytic portion 63a.
  • the final amount of oxide film was 2.7 g / m 2 .
  • (K) Alkali metal silicate treatment By immersing the aluminum support obtained by anodizing treatment in a treatment tank of a 1% by mass aqueous solution of sodium silicate No. 3 at a temperature of 30 ° C for 10 seconds, the alkali metal silicate is treated. Acid salt treatment (silicate treatment) was performed. After that, washing with well water was performed by spraying to obtain a support having a surface silicate hydrophilized. On the aluminum support treated with an alkali metal silicate obtained as described above, an undercoat liquid having the following composition was applied and dried at 80 ° C. for 15 seconds to form a coating film. The coating amount of the coating film after drying was 15 mg / m 2 .
  • Et represents an ethyl group.
  • ⁇ Novolak resin (2,3-xylenol / m-cresol / p-cresol ratio 10/20/70, weight average molecular weight 3,300): 0.192 parts
  • Cyanine dye A (the following compound): 0.134 parts 4,4'-bishydroxyphenyl sulfone: 0.126 parts Tetrahydrophthalic anhydride: 0.190 parts p-Toluenesulfonic acid: 0.008 parts 3-Methoxy-4-diazophenylamine hexafluorophosphate: 0.032 parts-Ethyl violet counter ion changed to 6-hydroxynaphthalenesulfonic acid: 0.0781 parts-Polymer 1 (polymer shown below): 0.035 parts-Methyl ethyl ketone: 25.41 parts-1- Methoxy
  • -Polymer 1 0.015 part-Polymer 2 (polymer shown below): 0.00328 part-Sulfonium salt compound consisting of cation and anion described in Table 1: Addition amount described in Table 1 (for example, Example 1 Will be 0.08 parts.) -Surfactant (Megafac F-780F, manufactured by DIC Corporation: 0.008 parts) -Methyl ethyl ketone: 6.79 parts-1-Methoxy-2-propanol: 13.07 parts
  • the developing solution was prepared by diluting and mixing the developing solutions XP-D and XP-DR manufactured by FUJIFILM Corporation and changing the conductivity between 80 to 100 mS / cm and every 2 mS / cm. .
  • the liquid feeling of the developing solution is low, the development in the exposed area becomes insufficient and a residual film is generated in the non-image area.
  • the liquid feeling of the developing solution is high, the surface of the unexposed portion is developed and the film thickness is reduced, so that a good image cannot be obtained.
  • the width of the electric conductivity of the developer in which neither the residual film in the non-image area nor the film loss in the image area was generated was evaluated for each lithographic printing plate precursor as an index of the development latitude.
  • a test pattern was written in an image on the obtained lithographic printing plate precursor with a Trendsetter manufactured by Creo at a beam intensity of 9 W and a drum rotation speed of 150 rpm.
  • a developing processor XP-D produced by FUJIFILM Corporation, diluted to have an electric conductivity of 43 mS / cm
  • a PS processor LP940H manufactured by FUJIFILM Corporation was used.
  • the development was performed for 20 seconds to 20 seconds. At this time, the developing time was set to the time at which the non-image areas of each level were completely dissolved and the respective images could be formed.
  • the lithographic printing plate precursor thus obtained was image-wise written with a test pattern by a Trendsetter manufactured by Creo at a beam intensity of 9 W and a drum rotation speed of 150 rpm.
  • the exposed lithographic printing plate precursor was allowed to stand in an environment of a temperature of 25 ° C. and a humidity of 70% RH for 30 minutes.
  • a developing processor XP-D produced by FUJIFILM Corporation, diluted to have an electric conductivity of 43 mS / cm
  • a PS processor LP940H manufactured by FUJIFILM Corporation was used. Development was carried out in seconds to 30 seconds.
  • the developing time was set to the time at which the non-image areas of each level were completely dissolved and the respective images could be formed.
  • the difference between the completion times of development in (1) and (2) was determined, and the shorter the difference in development time was, the better the post-exposure aging developability was evaluated.
  • -Chemical resistance evaluation The obtained lithographic printing plate precursor was cut into 3 cm ⁇ 3 cm, and a cleaner (manufactured by FUJIFILM Corporation, MC-E2) was dropped on the image recording layer. After the dropping, the mixture was allowed to stand for 3 minutes, the image area was washed with water, and naturally dried. The density of the area of the dried plate where the cleaner was dripped was measured with the X-Rite reflection density system (X-Rite eXact), and the difference in density from the image recording layer before the cleaner treatment was calculated to evaluate the chemical resistance. did. The smaller the density difference between the image recording layer before and after the cleaner treatment, the better the chemical resistance.
  • -Development residue (silicate residue) inhibition evaluation The obtained lithographic printing plate precursor was exposed on the entire surface with a Trendsetter manufactured by Creo at a beam intensity of 9 W and a drum rotation speed of 150 rpm. The exposed plate was evaluated for development residue (silicate residue) according to the following procedures (1) to (3).
  • the developing solution in which the exposure plate was dissolved was transferred to a resin container and left standing overnight.
  • the state of dregs of the stationary developer was visually evaluated according to the following evaluation criteria. 5: No debris during development in (1) above. One day and night, leave it at rest without any residue.
  • the structural unit a in Table 1 represents a structural unit represented by the formula (1)
  • the structural unit b represents a structural unit having a phenolic hydroxyl group in the side chain
  • the structural unit c represents the structural formula (2).
  • the composition ratio (mol ratio) of the alkali-soluble resin shown in Table 1 is described in order from the structural unit shown on the left of Table 1, and for example, in Example 6, a-1 is 28 mol%.
  • B-1 is 26 mol%
  • c-1 is 20 mol%
  • d-1 is 6 mol%
  • d-2 is 20 mol%.
  • details of each abbreviation shown in Table 1 are shown below.
  • a-1 to a-3 structural units shown below
  • Cyanine dye B the following compound
  • Example 21 On a support obtained in the same manner as in Example 1, a single layer coating solution having the following composition was applied so that the coating amount was 1.2 g / m 2, and dried to form a recording layer. I got the original planographic printing plate.
  • ⁇ Single layer coating liquid> -Alkali-soluble resin described in Example 1: 2.625 parts-m, p-cresol novolac resin (m / p ratio 6/4, weight average molecular weight 4,500, containing 0.8% by mass of unreacted cresol) : 0.525 part Cyanine dye A: 0.15 part 4,4'-bishydroxyphenyl sulfone: 0.225 part Tetrahydrophthalic anhydride: 0.3 part p-Toluenesulfonic acid: 0.015 part ⁇ 3-Methoxy-4-diazophenylamine hexafluorophosphate: 0.045 part ⁇ Ethyl violet counter ion changed to 6-hydroxynaphthalenesulfonic acid: 0.1125 part ⁇ Surfactant (MegaFac F-780F , DIC Co., Ltd .: 0.0525 parts, methyl ethyl ketone: 22.5 parts, 1-methoxy-2-propanol: 11.25 parts,
  • the lithographic printing plate precursors of Examples 1 to 21 which are the lithographic printing plate precursors according to the present disclosure were compared with the lithographic printing plate precursors of Comparative Examples 1 to 3 after the exposure. Excellent developability and excellent chemical resistance of the resulting lithographic printing plate. Further, it is understood that the lithographic printing plate precursors of Examples 1 to 21 which are the lithographic printing plate precursors according to the present disclosure can provide lithographic printing plates excellent in development latitude.

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Abstract

The present invention provides: a planographic printing plate precursor which has an image recording layer upon a support body, the image recording layer containing an infrared absorber, a quaternary ammonium salt compound, and an alkali-soluble resin having a structural unit represented by formula (1), a structural unit having a phenolic hydroxyl group on a side chain, and a structural unit represented by formula (2); and a production method for a planographic printing plate which uses the abovementioned planographic printing plate precursor. In formula (1), R represents an alkyl group or an aryl group.

Description

平版印刷版原版、及び、平版印刷版の作製方法Lithographic printing plate precursor and method of making lithographic printing plate
 本開示は、平版印刷版原版、及び、平版印刷版の作製方法の作製方法に関する。 The present disclosure relates to a lithographic printing plate precursor and a method for producing a lithographic printing plate.
 一般に平版印刷版は、印刷過程でインキを受容する親油性の画像部と湿し水を受容する親水性の非画像部とからなる。
 平版印刷は、水と油性インキとが互いに反発する性質を利用して、平版印刷版の親油性の画像部をインキ受容部、親水性の非画像部を湿し水受容部(インキ非受容部)として、平版印刷版の表面にインキの付着性の差異を生じさせ、画像部のみにインキを着肉させた後、紙等の被印刷体にインキを転写して印刷する方法である。
 現在、平版印刷版原版から平版印刷版を作製する製版工程においては、CTP(コンピュータトゥプレート)技術による画像露光が行われている。即ち、画像露光は、レーザーやレーザーダイオードを用いて、リスフィルムを介することなく、直接平版印刷版原版に走査露光などにより行われる。
 従来の平版印刷版原版、又は、その製造に用いられる感光性樹脂組成物としては、例えば、特許文献1又は2に記載されたものが知られている。
Generally, a lithographic printing plate consists of a lipophilic image area that receives ink during the printing process and a hydrophilic non-image area that receives fountain solution.
Lithographic printing utilizes the property that water and oil-based ink repel each other, and the lipophilic image part of the lithographic printing plate is the ink receiving part, and the hydrophilic non-image part is the dampening water receiving part (ink non-receiving part). ) Is a method in which a difference in ink adhesion is caused on the surface of the lithographic printing plate, the ink is applied only to the image area, and then the ink is transferred to a printing medium such as paper for printing.
Currently, in a plate making process for producing a lithographic printing plate from a lithographic printing plate precursor, image exposure is performed by a CTP (computer to plate) technique. That is, image exposure is carried out by using a laser or a laser diode directly on a lithographic printing plate precursor by scanning exposure without using a lith film.
As a conventional lithographic printing plate precursor or a photosensitive resin composition used for manufacturing the same, for example, those described in Patent Documents 1 and 2 are known.
 特許文献1には、支持体上に、樹脂及び赤外線吸収剤を含み、赤外レーザー露光によりアルカリ水溶液に対する溶解性が増大するポジ型記録層を少なくとも2層以上有する平版印刷版原版であって、上記ポジ型記録層のうち支持体に最も近接するポジ型記録層が、少なくとも2種の樹脂を含有し、それらの樹脂の少なくとも1種が分散相を形成しており、且つ、上記樹脂の少なくとも1種がマレイミドを含むポリマーであることを特徴とする平版印刷版原版が記載されている。 Patent Document 1 discloses a lithographic printing plate precursor comprising a support and a resin and an infrared absorbing agent, and having at least two or more positive type recording layers whose solubility in an alkaline aqueous solution is increased by infrared laser exposure, on a support, Of the positive recording layers, the positive recording layer closest to the support contains at least two resins, at least one of these resins forms a dispersed phase, and at least one of the above resins is used. A lithographic printing plate precursor characterized in that one is a polymer containing maleimide is described.
 特許文献2には、支持体上に、マレイミド構造を有する3元~5元共重合体及び赤外線吸収剤を含む画像記録層を有し、上記共重合体の重量平均分子量が15,000~35,000であり、かつ数平均分子量が7,000~15,000である平版印刷版原版が記載されている。 In Patent Document 2, an image recording layer containing a ternary to quaternary copolymer having a maleimide structure and an infrared absorber is provided on a support, and the weight average molecular weight of the above copolymer is 15,000 to 35. And a lithographic printing plate precursor having a number average molecular weight of 7,000 to 15,000.
  特許文献1:特開2006-3658号公報
  特許文献2:中国特許出願公開第103879169号明細書
Patent Document 1: Japanese Patent Laid-Open No. 2006-3658 Patent Document 2: Chinese Patent Application Publication No. 1038716969
 本発明の実施形態が解決しようとする課題は、露光後経時現像性に優れ、得られる平版印刷版の耐薬品性に優れる平版印刷版原版を提供することである。
 本発明の他の実施形態が解決しようとする課題は、上記平版印刷版原版を用いた平版印刷版の作製方法を提供することである。
The problem to be solved by the embodiments of the present invention is to provide a lithographic printing plate precursor having excellent post-exposure developability and excellent chemical resistance of the lithographic printing plate obtained.
A problem to be solved by another embodiment of the present invention is to provide a method for producing a lithographic printing plate using the lithographic printing plate precursor.
 上記課題を解決するための手段には、以下の態様が含まれる。
<1> 支持体上に画像記録層を有し、上記画像記録層が、下記式(1)で表される構成単位と側鎖にフェノール性水酸基を有する構成単位と下記式(2)で表される構成単位とを有するアルカリ可溶性樹脂、赤外線吸収剤、及び、第4級アンモニウム塩化合物を含む平版印刷版原版。
Means for solving the above problems include the following aspects.
<1> An image recording layer is provided on a support, and the image recording layer is represented by a structural unit represented by the following formula (1), a structural unit having a phenolic hydroxyl group in a side chain, and the following formula (2). A lithographic printing plate precursor containing an alkali-soluble resin having a structural unit described above, an infrared absorber, and a quaternary ammonium salt compound.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
 式(1)中、Rは、アルキル基又はアリール基を表す。 In the formula (1), R represents an alkyl group or an aryl group.
<2> 上記第4級アンモニウム塩化合物における対アニオンが、スルホン酸イオン、カルボン酸イオン、ハロゲン原子を有する無機酸イオン、又は、ハロゲン化物イオンである<1>に記載の平版印刷版原版。
<3> 上記画像記録層が、上層及び下層を有する<1>又は<2>に記載の平版印刷版原版。
<4> 上記上層が、上記赤外線吸収剤、及び、上記第4級アンモニウム塩化合物を含み、上記下層が、上記アルカリ可溶性樹脂を含む<3>に記載の平版印刷版原版。
<5> 上記上層における上記第4級アンモニウム塩化合物の含有量が、0.06g/m以上0.10g/m以下である<4>に記載の平版印刷版原版。
<6> 上記アルカリ可溶性樹脂の重量平均分子量が、10,000~200,000である<1>~<5>のいずれか1つに記載の平版印刷版原版。
<7> 上記アルカリ可溶性樹脂の重量平均分子量が、40,000~100,000である<1>~<6>のいずれか1つに記載の平版印刷版原版。
<8> ノンシリケート現像用平版印刷版原版である<1>~<7>のいずれか1つに記載の平版印刷版原版。
<9> <1>~<8>のいずれか1つに記載の平版印刷版原版を赤外線レーザーを用いて画像様に露光する工程、及び、シリケート化合物を含まないpH9以上のアルカリ現像液を用いて現像する工程を含む平版印刷版の作製方法。
<10> 上記アルカリ現像液の液活性を、上記アルカリ現像液の電導度で測定し、測定された測定値に従って補充液を加えて、目標の電導度となるように調整し、液活性を制御する工程を含む<9>に記載の平版印刷版の作製方法。
<2> The lithographic printing plate precursor as described in <1>, wherein the counter anion in the quaternary ammonium salt compound is a sulfonate ion, a carboxylate ion, an inorganic acid ion having a halogen atom, or a halide ion.
<3> The lithographic printing plate precursor as described in <1> or <2>, wherein the image recording layer has an upper layer and a lower layer.
<4> The lithographic printing plate precursor as described in <3>, wherein the upper layer contains the infrared absorbent and the quaternary ammonium salt compound, and the lower layer contains the alkali-soluble resin.
<5> The lithographic printing plate precursor as described in <4>, wherein the content of the quaternary ammonium salt compound in the upper layer is 0.06 g / m 2 or more and 0.10 g / m 2 or less.
<6> The lithographic printing plate precursor as described in any one of <1> to <5>, wherein the alkali-soluble resin has a weight average molecular weight of 10,000 to 200,000.
<7> The lithographic printing plate precursor as described in any one of <1> to <6>, wherein the alkali-soluble resin has a weight average molecular weight of 40,000 to 100,000.
<8> The lithographic printing plate precursor as described in any one of <1> to <7>, which is a lithographic printing plate precursor for non-silicate development.
<9> A step of imagewise exposing the lithographic printing plate precursor according to any one of <1> to <8> using an infrared laser, and using an alkali developing solution containing no silicate compound and having a pH of 9 or more. A method for producing a lithographic printing plate including the step of developing by development.
<10> The liquid activity of the alkaline developer is measured by the conductivity of the alkaline developer, and a replenisher is added according to the measured value to adjust the conductivity so that the target conductivity is achieved, and the liquid activity is controlled. The method for producing a lithographic printing plate as described in <9>, including the step of:
 本発明の実施形態によれば、露光後経時現像性に優れ、得られる平版印刷版の耐薬品性に優れる平版印刷版原版を提供することができる。
 また、本発明の他の実施形態によれば、上記平版印刷版原版を用いた平版印刷版の作製方法を提供することができる。
According to the embodiment of the present invention, it is possible to provide a lithographic printing plate precursor having excellent post-exposure developability and excellent chemical resistance of the lithographic printing plate obtained.
Further, according to another embodiment of the present invention, it is possible to provide a method for producing a planographic printing plate using the planographic printing plate precursor.
支持体の作製に用いられる機械的粗面化装置一例を示す概略構成図である。It is a schematic block diagram which shows an example of the mechanical roughening apparatus used for manufacture of a support body. 支持体の作製に用いられる電気化学的粗面化に用いる交番波形電流波形図の一例を示すグラフである。It is a graph which shows an example of the alternating waveform current waveform diagram used for electrochemical roughening used for manufacture of a support body. 支持体の作製に用いられる電気化学的粗面化に用いる2つ以上のラジアルドラムローラを連結した装置の概略構成図である。It is a schematic block diagram of the apparatus which connected two or more radial drum rollers used for electrochemical roughening used for manufacture of a support body. 支持体の作製に適用可能な二段給電電解法における電解処理装置の概略図である。FIG. 3 is a schematic view of an electrolytic treatment apparatus in a two-stage power supply electrolysis method applicable to production of a support.
 以下において、本開示の内容について詳細に説明する。以下に記載する構成要件の説明は、本開示の代表的な実施態様に基づいてなされることがあるが、本開示はそのような実施態様に限定されるものではない。
 なお、本開示において、数値範囲を示す「~」とはその前後に記載される数値を下限値及び上限値として含む意味で使用される。
 本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
 更に、本開示において組成物中の各成分の量は、組成物中に各成分に該当する物質が複数存在する場合、特に断らない限り、組成物中に存在する該当する複数の物質の合計量を意味する。
 また、本開示における基(原子団)の表記において、置換及び無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
 本開示において、「(メタ)アクリル」は、アクリル及びメタクリルの両方を包含する概念で用いられる語であり、「(メタ)アクリロイル」は、アクリロイル及びメタクリロイルの両方を包含する概念として用いられる語である。
 また、本開示において、式で表される化合物における基の表記に関して、置換又は無置換を記していない場合、その基がさらに置換基を有することが可能な場合には、他に特に規定がない限り、その基は、無置換の基のみならず、置換基を有する基も包含する。例えば、式において、「Rはアルキル基、アリール基又は複素環基を表す」との記載があれば、「Rは無置換アルキル基、置換アルキル基、無置換アリール基、置換アリール基、無置換複素環基又は置換複素環基を表す」ことを意味する。
 また、本開示中の「工程」の用語は、独立した工程だけではなく、他の工程と明確に区別できない場合であっても、その工程の所期の目的が達成されれば本用語に含まれる。
 また、本開示において、「質量%」と「重量%」とは同義であり、「質量部」と「重量部」とは同義である。
 更に、本開示において、2以上の好ましい態様の組み合わせは、より好ましい態様である。
 また、本開示における重量平均分子量(Mw)及び数平均分子量(Mn)は、特に断りのない限り、TSKgel GMHxL、TSKgel G4000HxL、TSKgel G2000HxL(何れも東ソー(株)製の商品名)のカラムを使用したゲルパーミエーションクロマトグラフィ(GPC)分析装置により、溶媒THF(テトラヒドロフラン)、示差屈折計により検出し、標準物質としてポリスチレンを用いて換算した分子量である。
 本開示において、全固形分量とは、組成物における溶剤等の揮発性成分を除いた成分の全質量をいう。
 本開示において、「平版印刷版原版」の用語は、平版印刷版原版だけでなく、捨て版原版を包含する。また、「平版印刷版」の用語は、平版印刷版原版を、必要により、露光、現像などの操作を経て作製された平版印刷版だけでなく、捨て版を包含する。捨て版原版の場合には、必ずしも、露光、現像の操作は必要ない。なお、捨て版とは、例えばカラーの新聞印刷において一部の紙面を単色又は2色で印刷を行う場合に、使用しない版胴に取り付けるための平版印刷版原版である。
 以下、本開示を詳細に説明する。
The details of the present disclosure will be described below. The description of the constituent elements described below may be made based on the representative embodiment of the present disclosure, but the present disclosure is not limited to such an embodiment.
In the present disclosure, “to” indicating a numerical range is used to mean that numerical values described before and after the numerical range are included as a lower limit value and an upper limit value.
In the numerical ranges described stepwise in the present disclosure, the upper limit or the lower limit described in one numerical range may be replaced with the upper limit or the lower limit of the numerical range described in other stages. . Further, in the numerical range described in the present disclosure, the upper limit value or the lower limit value of the numerical range may be replaced with the value shown in the examples.
Further, in the present disclosure, the amount of each component in the composition is the total amount of the corresponding plurality of substances present in the composition, unless a plurality of substances corresponding to each component are present in the composition. Means
In addition, in the notation of a group (atomic group) in the present disclosure, the notation that does not indicate substituted and unsubstituted includes not only those having no substituent but also those having a substituent. For example, the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present disclosure, “(meth) acrylic” is a term used as a concept including both acryl and methacryl, and “(meth) acryloyl” is a term used as a concept including both acryloyl and methacryloyl. is there.
Further, in the present disclosure, with respect to the notation of the group in the compound represented by the formula, when no substitution or substitution is mentioned, and when the group can further have a substituent, there is no particular limitation. As long as the group includes not only an unsubstituted group but also a group having a substituent. For example, in the formula, if “R V represents an alkyl group, an aryl group or a heterocyclic group” is described, “R V is an unsubstituted alkyl group, a substituted alkyl group, an unsubstituted aryl group, a substituted aryl group, "Represents an unsubstituted heterocyclic group or a substituted heterocyclic group".
In addition, the term “process” in the present disclosure is included in this term as long as the intended purpose of the process is achieved, not only when it is an independent process but also when it cannot be clearly distinguished from other processes. Be done.
Moreover, in this indication, "mass%" and "weight%" are synonymous, and "mass part" and "weight part" are synonymous.
Further, in the present disclosure, a combination of two or more preferable aspects is a more preferable aspect.
In addition, the weight average molecular weight (Mw) and the number average molecular weight (Mn) in the present disclosure are columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (both manufactured by Tosoh Corporation) unless otherwise specified. The gel permeation chromatography (GPC) analyzer was used to detect the solvent THF (tetrahydrofuran) with a differential refractometer, and the molecular weight was calculated using polystyrene as a standard substance.
In the present disclosure, the total solid content refers to the total mass of components excluding volatile components such as a solvent in the composition.
In the present disclosure, the term “lithographic printing plate precursor” includes not only the lithographic printing plate precursor but also the discarded plate precursor. In addition, the term "lithographic printing plate" includes not only a lithographic printing plate precursor prepared through an operation such as exposure and development, but also a discarding plate, if necessary. In the case of a waste original plate, the operations of exposure and development are not always necessary. The waste plate is a lithographic printing plate precursor to be attached to an unused plate cylinder when a part of the paper surface is printed in a single color or two colors in color newspaper printing, for example.
Hereinafter, the present disclosure will be described in detail.
(平版印刷版原版)
 本開示に係る平版印刷版原版は、支持体上に画像記録層を有し、上記画像記録層が、下記式(1)で表される構成単位と側鎖にフェノール性水酸基を有する構成単位と下記式(2)で表される構成単位とを有するアルカリ可溶性樹脂、赤外線吸収剤、及び、第4級アンモニウム塩化合物を含む。
(Lithographic printing plate original)
The lithographic printing plate precursor according to the present disclosure has an image recording layer on a support, and the image recording layer comprises a structural unit represented by the following formula (1) and a structural unit having a phenolic hydroxyl group in a side chain. It contains an alkali-soluble resin having a structural unit represented by the following formula (2), an infrared absorbing agent, and a quaternary ammonium salt compound.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 式(1)中、Rは、アルキル基又はアリール基を表す。 In the formula (1), R represents an alkyl group or an aryl group.
 また、本開示に係る平版印刷版原版は、ポジ型平版印刷版原版であり、サーマルポジ型平版印刷版原版であることが好ましい。
 更に、本開示に係る平版印刷版原版は、ノンシリケート現像用平版印刷版原版として好適に用いることができる。
Further, the lithographic printing plate precursor according to the present disclosure is a positive lithographic printing plate precursor, and preferably a thermal positive lithographic printing plate precursor.
Furthermore, the lithographic printing plate precursor according to the present disclosure can be suitably used as a lithographic printing plate precursor for non-silicate development.
 本発明者らが鋭意検討した結果、上記構成をとることにより、露光後経時現像性に優れる平版印刷版原版を提供できることを見出した。
 上記構成による優れた効果の作用機構は明確ではないが、以下のように推定している。
 上記画像記録層において、上記式(1)で表される構成単位と側鎖にフェノール性水酸基(「フェノール性ヒドロキシ基」ともいう。)を有する構成単位と上記式(2)で表される構成単位とを有するアルカリ可溶性樹脂、及び、第4級アンモニウム塩化合物を併用することにより、上記アルカリ可溶性樹脂におけるマレイミド環構造、フェノール性水酸基及びシアノ基等と、上記第4級アンモニウム塩化合物とが相互作用するため、露光後においても露光部と非露光部との溶解性の差が維持され、露光後に平版印刷版原版を保管した場合であっても現像性(露光後経時現像性)に優れると推定している。
 また、本開示に係る平版印刷版原版は、上記画像記録層が上記アルカリ可溶性樹脂と、第4級アンモニウム塩化合物とを含むことにより、これらが水素結合及びイオン結合等により相互作用するため、得られる平版印刷版の耐薬品性に優れるに優れると推定している。
As a result of diligent studies by the present inventors, it has been found that the above configuration can provide a lithographic printing plate precursor having excellent post-exposure aging developability.
Although the mechanism of action of the excellent effect of the above configuration is not clear, it is estimated as follows.
In the image recording layer, the constitutional unit represented by the above formula (1), the constitutional unit having a phenolic hydroxyl group (also referred to as "phenolic hydroxy group") in the side chain, and the constitution represented by the above formula (2). By using an alkali-soluble resin having a unit and a quaternary ammonium salt compound in combination, the maleimide ring structure, the phenolic hydroxyl group, the cyano group and the like in the alkali-soluble resin and the quaternary ammonium salt compound are mutually exchanged. Since it works, the difference in solubility between the exposed portion and the non-exposed portion is maintained even after exposure, and the developability (post-exposure aging developability) is excellent even when the lithographic printing plate precursor is stored after exposure. I'm estimating.
Further, the lithographic printing plate precursor according to the present disclosure is obtained because the image-recording layer contains the alkali-soluble resin and the quaternary ammonium salt compound, and these interact with each other through hydrogen bond and ionic bond. It is presumed that the lithographic printing plate used has excellent chemical resistance.
 更に、本開示に係る平版印刷版原版は、上記画像記録層が上記アルカリ可溶性樹脂と、第4級アンモニウム塩化合物とを含むことにより、これらが水素結合及びイオン結合等により相互作用するため、露光部と非露光部との溶解性の差がより大きくなり、上記画像記録層の現像ラチチュード(画像形成に適する現像条件の許容性)に優れると推定している。 Further, in the lithographic printing plate precursor according to the present disclosure, since the image recording layer contains the alkali-soluble resin and the quaternary ammonium salt compound, these interact with each other through hydrogen bond, ionic bond, etc. It is presumed that the difference in solubility between the unexposed area and the unexposed area becomes larger and the development latitude of the image recording layer (acceptance of development conditions suitable for image formation) is excellent.
 以下、本開示に係る平版印刷版原版に含まれる各構成要件の詳細について説明する。 Details of each constituent element included in the planographic printing plate precursor according to the present disclosure will be described below.
〔画像記録層〕
 本開示に係る平版印刷版原版における画像記録層は、上記式(1)で表される構成単位と側鎖にフェノール性水酸基を有する構成単位と上記式(2)で表される構成単位とを有するアルカリ可溶性樹脂、赤外線吸収剤、及び、第4級アンモニウム塩化合物を含む。
[Image recording layer]
The image recording layer in the lithographic printing plate precursor according to the present disclosure comprises the constitutional unit represented by the above formula (1), the constitutional unit having a phenolic hydroxyl group in the side chain, and the constitutional unit represented by the above formula (2). It contains an alkali-soluble resin, an infrared absorber, and a quaternary ammonium salt compound.
<式(1)で表される構成単位と側鎖にフェノール性水酸基を有する構成単位と式(2)で表される構成単位とを有するアルカリ可溶性樹脂>
 本開示に係る平版印刷版原版は、上記画像記録層が、上記式(1)で表される構成単位と側鎖にフェノール性水酸基を有する構成単位と上記式(2)で表される構成単位とを有するアルカリ可溶性樹脂(単に「アルカリ可溶性樹脂」ともいう。)を含む。
 なお、本開示における「アルカリ可溶性」とは、25℃の1mol/L水酸化ナトリウム溶液に可溶であることをいう。また、「可溶である」とは、100mLの溶媒に0.1g以上溶解することをいう。
 また、上記アルカリ可溶性樹脂は、マレイミド化合物と(メタ)アクリル化合物又はスチレン化合物とアクリロニトリルとを少なくとも共重合してなる共重合体であることが好ましく、マレイミド化合物と(メタ)アクリルアミド化合物とアクリロニトリルとを少なくとも共重合してなる共重合体であることがより好ましい。
<Alkali-Soluble Resin Having Structural Unit Represented by Formula (1), Structural Unit Having Phenolic Hydroxyl Group in Side Chain, and Structural Unit Represented by Formula (2)>
In the lithographic printing plate precursor according to the present disclosure, the image recording layer has a constitutional unit represented by the formula (1), a constitutional unit having a phenolic hydroxyl group in a side chain, and a constitutional unit represented by the formula (2). And an alkali-soluble resin having (and also simply referred to as “alkali-soluble resin”).
The term "alkali-soluble" in the present disclosure means being soluble in a 1 mol / L sodium hydroxide solution at 25 ° C. Further, “soluble” means that 0.1 g or more is dissolved in 100 mL of solvent.
Further, the alkali-soluble resin is preferably a copolymer obtained by copolymerizing at least a maleimide compound and a (meth) acrylic compound or a styrene compound and acrylonitrile, and a maleimide compound, a (meth) acrylamide compound and acrylonitrile. It is more preferable that the copolymer is a copolymer.
-式(1)で表される構成単位-
 上記アルカリ可溶性樹脂は、下記式(1)で表される構成単位を有する。
 下記式(1)で表される構成単位は、マレイミド化合物由来の構成単位(マレイミド化合物を共重合してなる構成単位)であることが好ましい。
-Structural Unit Represented by Formula (1)-
The alkali-soluble resin has a structural unit represented by the following formula (1).
The constitutional unit represented by the following formula (1) is preferably a constitutional unit derived from a maleimide compound (a constitutional unit obtained by copolymerizing a maleimide compound).
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
 式(1)中、Rは、アルキル基又はアリール基を表す。 In the formula (1), R represents an alkyl group or an aryl group.
 式(1)のRにおけるアルキル基及びアリール基は、置換基を有していてもよい。
 置換基としては、アルキル基、アリール基、ハロゲン原子、ヒドロキシ基、アルコキシ基、カルボキシ基、アルコキシカルボニル基、アシル基、アシルオキシ基、シアノ基等が挙げられる。上記置換基が更に置換基を有していてもよい。
 式(1)のRのアルキル基の炭素原子数(「炭素数」ともいう。)は、1~20であることが好ましく、1~12であることがより好ましく、1~8であることが更に好ましい。また、式(1)のRのアルキル基の炭素原子数は、現像ラチチュードの観点からは、2以上であることが好ましい。
 式(1)のRのアリール基の炭素原子数は、6~20であることが好ましく、6~12であることがより好ましく、6~10であることが更に好ましい。
 また、式(1)のRのアリール基は、単環構造のアリール基であっても、2環以上が縮合した構造のアリール基であってもよい。
 式(1)におけるRは、露光後経時現像性の観点から、炭素原子数1~20のアルキル基、又は、炭素原子数6~20のアリール基であることが好ましく、炭素原子数1~12のアルキル基、又は、炭素原子数6~12のアリール基であることがより好ましく、メチル基、n-ブチル基、ベンジル基、フェニル基、又は、ナフチル基であることが更に好ましく、n-ブチル基、ベンジル基、又は、フェニル基であることが特に好ましく、フェニル基であることが最も好ましい。
 また、式(1)におけるRは、現像ラチチュード及び露光後経時現像性の観点から、アリール基であることが好ましい。
The alkyl group and aryl group for R in formula (1) may have a substituent.
Examples of the substituent include an alkyl group, an aryl group, a halogen atom, a hydroxy group, an alkoxy group, a carboxy group, an alkoxycarbonyl group, an acyl group, an acyloxy group and a cyano group. The above-mentioned substituent may further have a substituent.
The number of carbon atoms (also referred to as “carbon number”) of the alkyl group represented by R in the formula (1) is preferably 1 to 20, more preferably 1 to 12, and further preferably 1 to 8. More preferable. Further, the number of carbon atoms of the alkyl group represented by R in the formula (1) is preferably 2 or more from the viewpoint of development latitude.
The aryl group represented by R in the formula (1) preferably has 6 to 20 carbon atoms, more preferably has 6 to 12 carbon atoms, and further preferably has 6 to 10 carbon atoms.
The aryl group represented by R in the formula (1) may be an aryl group having a monocyclic structure or an aryl group having a structure in which two or more rings are condensed.
R in the formula (1) is preferably an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms from the viewpoint of developability with time after exposure, and has 1 to 12 carbon atoms. Is more preferably an alkyl group having 6 to 12 carbon atoms, or is more preferably a methyl group, an n-butyl group, a benzyl group, a phenyl group, or a naphthyl group, and an n-butyl group. A group, a benzyl group, or a phenyl group is particularly preferable, and a phenyl group is most preferable.
Further, R in the formula (1) is preferably an aryl group from the viewpoint of development latitude and post-exposure aging developability.
 式(1)のRにおけるアルキル基として、具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s-ブチル基、t-ブチル基、シクロヘキシル基、ベンジル基等が挙げられる。
 式(1)のRにおけるアリール基として、具体的には、フェニル基、ナフチル基等が挙げられる。
Specific examples of the alkyl group represented by R in the formula (1) include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a s-butyl group, a t-butyl group, a cyclohexyl group and a benzyl group. Is mentioned.
Specific examples of the aryl group for R in the formula (1) include a phenyl group and a naphthyl group.
 式(1)で表される構成単位を形成するモノマーとしては、N-メチルマレイミド、N-n-ブチルマレイミド、N-ベンジルマレイミド、N-フェニルマレイミド、N-ナフチルマレイミド等が挙げられるが、本開示はこれらに限定されるものではない。 Examples of the monomer forming the structural unit represented by the formula (1) include N-methylmaleimide, Nn-butylmaleimide, N-benzylmaleimide, N-phenylmaleimide, N-naphthylmaleimide and the like. The disclosure is not limited to these.
 式(1)で表される構成単位の具体例としては、以下に示すものが好ましく挙げられる。 Specific examples of the constitutional unit represented by the formula (1) are preferably the followings.
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 上記アルカリ可溶性樹脂は、上記式(1)で表される構成単位を、1種単独で有していても、2種以上を有していてもよい。
 上記式(1)で表される構成単位の含有量(2種以上である場合には総含有量。以下同じ。)は、現像ラチチュード及び露光後経時現像性の観点から、上記アルカリ可溶性樹脂の全量に対し、10モル%~80モル%であることが好ましく、10モル%~60モル%であることがより好ましく、20モル%~50モル%であることが特に好ましい。
 なお、本開示において、「構成単位」の含有量をモル比で規定する場合、当該「構成単位」は「モノマー単位」と同義であるものとする。また、本開示において上記「モノマー単位」は、高分子反応等により重合後に修飾されていてもよい。以下においても同様である。
The alkali-soluble resin may have one type of the structural unit represented by the above formula (1) alone, or may have two or more types.
From the viewpoint of development latitude and post-exposure aging developability, the content of the constitutional unit represented by the above formula (1) (the total content in the case of two or more kinds, the same applies hereinafter) is the same as that of the alkali-soluble resin. The total amount is preferably 10 mol% to 80 mol%, more preferably 10 mol% to 60 mol%, and particularly preferably 20 mol% to 50 mol%.
In the present disclosure, when the content of the “constituent unit” is defined by the molar ratio, the “constituent unit” is synonymous with the “monomer unit”. Further, in the present disclosure, the “monomer unit” may be modified after polymerization by a polymer reaction or the like. The same applies to the following.
-側鎖にフェノール性水酸基を有する構成単位-
 上記アルカリ可溶性樹脂は、側鎖にフェノール性水酸基を有する構成単位を有する。
 なお、本開示において、「主鎖」とは樹脂を構成する高分子化合物の分子中で相対的に最も長い結合鎖を表し、「側鎖」とは主鎖から枝分かれしている原子団を表す。
 上記側鎖にフェノール性水酸基を有する構成単位が有するフェノール性水酸基の数は、特に制限はないが、現像性及び現像ラチチュードの観点から、1個~4個であることが好ましく、1個又は2個であることがより好ましく、1個であることが特に好ましい。
-Structural unit having a phenolic hydroxyl group on the side chain-
The alkali-soluble resin has a structural unit having a phenolic hydroxyl group on its side chain.
In the present disclosure, the “main chain” represents the relatively longest binding chain in the molecule of the polymer compound constituting the resin, and the “side chain” represents the atomic group branched from the main chain. .
The number of phenolic hydroxyl groups contained in the structural unit having a phenolic hydroxyl group in the side chain is not particularly limited, but is preferably 1 to 4 from the viewpoint of developability and development latitude, and 1 or 2 It is more preferable that the number is 1, and it is particularly preferable that the number is 1.
 上記側鎖にフェノール性水酸基を有する構成単位におけるフェノール性水酸基を有する構造としては、現像ラチチュード及び露光後経時現像性の観点から、窒素原子を有することが好ましく、下記式(Ph-1)で表される構造であることがより好ましい。 The structure having a phenolic hydroxyl group in the constituent unit having a phenolic hydroxyl group in the side chain preferably has a nitrogen atom from the viewpoint of development latitude and post-exposure aging developability, and is represented by the following formula (Ph-1). It is more preferable that the structure is
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 式(Ph-1)中、Rph1はそれぞれ独立に、一価の置換基を表し、Rph2は、水素原子、アルキル基又はアリール基を表し、n1は1~4の整数を表し、n2は0~4の整数を表し、波線部分は他の構造との結合位置を表す。 Wherein (Ph-1), R ph1 each independently represent a monovalent substituent, R ph2 represents a hydrogen atom, an alkyl group or an aryl group, n1 represents an integer of 1 ~ 4, n2 is It represents an integer of 0 to 4, and the wavy line represents the bonding position with another structure.
 式(Ph-1)におけるRph1はそれぞれ独立に、アルキル基、アリール基、ハロゲン原子、アルコキシ基、カルボキシ基、アルコキシカルボニル基、アシル基、アシルオキシ基、シアノ基、又は、スルホンアミド基であることが好ましく、アルキル基、アリール基、ハロゲン原子、又は、スルホンアミド基であることがより好ましい。
 式(Ph-1)におけるRph2は、現像ラチチュード及び露光後経時現像性の観点から、水素原子又はアルキル基であることが好ましく、水素原子であることがより好ましい。
 式(Ph-1)におけるn1は、現像性及び現像ラチチュードの観点から、1又は2であることが好ましく、1であることがより好ましい。
 また、式(Ph-1)におけるフェノール性水酸基の結合位置は、特に制限はないが、現像性及び現像ラチチュードの観点から、式(Ph-1)における窒素原子の結合位置に対し、オルト位(o位)又はパラ位(p位)であることが好ましく、パラ位であることがより好ましい。
 式(Ph-1)におけるn2は、0~2の整数であることが好ましく、0又は1であることがより好ましく、0であることが特に好ましい。
R ph1 in formula (Ph-1) is independently an alkyl group, an aryl group, a halogen atom, an alkoxy group, a carboxy group, an alkoxycarbonyl group, an acyl group, an acyloxy group, a cyano group, or a sulfonamide group. Is more preferable, and an alkyl group, an aryl group, a halogen atom, or a sulfonamide group is more preferable.
R ph2 in the formula (Ph-1) is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom, from the viewpoint of development latitude and post-exposure aging developability.
N1 in the formula (Ph-1) is preferably 1 or 2, and more preferably 1 from the viewpoint of developability and development latitude.
The bonding position of the phenolic hydroxyl group in the formula (Ph-1) is not particularly limited, but from the viewpoint of developability and development latitude, the ortho position (with respect to the bonding position of the nitrogen atom in the formula (Ph-1) ( The o-position) or the para-position (p-position) is preferable, and the para-position is more preferable.
N2 in the formula (Ph-1) is preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 0.
 また、上記側鎖にフェノール性水酸基を有する構成単位は、現像ラチチュード及び露光後経時現像性の観点から、アミド結合を有することが好ましく、下記式(Ph-2)で表される構成単位であることがより好ましい。 Further, the structural unit having a phenolic hydroxyl group in the side chain preferably has an amide bond from the viewpoint of development latitude and post-exposure aging developability, and is a structural unit represented by the following formula (Ph-2). Is more preferable.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 式(Ph-2)中、Rph1はそれぞれ独立に、一価の置換基を表し、Rph2は、水素原子、アルキル基又はアリール基を表し、Rph3は、水素原子又はメチル基を表し、n1は1~4の整数を表し、n2は0~4の整数を表す。 Wherein (Ph-2), R ph1 each independently represent a monovalent substituent, R ph2 represents a hydrogen atom, an alkyl group or an aryl group, R ph3 represents a hydrogen atom or a methyl group, n1 represents an integer of 1 to 4, and n2 represents an integer of 0 to 4.
 式(Ph-2)におけるRph1、Rph2、n1及びn2はそれぞれ、式(Ph-1)におけるRph1、Rph2、n1及びn2と同義であり、好ましい態様も同様である。
 式(Ph-2)におけるRph3は、水素原子であることが好ましい。
Each R ph1, R ph2, n1 and n2 in Formula (Ph-2), have the same meaning as R ph1, R ph2, n1 and n2 in Formula (Ph-1), a preferable embodiment thereof is also the same.
R ph3 in formula (Ph-2) is preferably a hydrogen atom.
 上記側鎖にフェノール性水酸基を有する構成単位を形成するモノマーとしては、フェノール性水酸基を有するアクリルアミド、メタクリルアミド、アクリル酸エステル、メタクリル酸エステル、又は、ヒドロキシスチレン等が挙げられる。具体的にはN-(2-ヒドロキシフェニル)アクリルアミド、N-(3-ヒドロキシフェニル)アクリルアミド、N-(4-ヒドロキシフェニル)アクリルアミド、N-(2-ヒドロキシフェニル)メタクリルアミド、N-(3-ヒドロキシフェニル)メタクリルアミド、N-(4-ヒドロキシフェニル)メタクリルアミド、o-ヒドロキシフェニルアクリレート、m-ヒドロキシフェニルアクリレート、p-ヒドロキシフェニルアクリレート、o-ヒドロキシフェニルメタクリレート、m-ヒドロキシフェニルメタクリレート、p-ヒドロキシフェニルメタクリレート、o-ヒドロキシスチレン、m-ヒドロキシスチレン、p-ヒドロキシスチレン、2-(2-ヒドロキシフェニル)エチルアクリレート、2-(3-ヒドロキシフェニル)エチルアクリレート、2-(4-ヒドロキシフェニル)エチルアクリレート、2-(2-ヒドロキシフェニル)エチルメタクリレート、2-(3-ヒドロキシフェニル)エチルメタクリレート、2-(4-ヒドロキシフェニル)エチルメタクリレート等を好適に使用することができる。 Examples of the monomer forming the structural unit having a phenolic hydroxyl group on the side chain include acrylamide, methacrylamide, acrylic acid ester, methacrylic acid ester having a phenolic hydroxyl group, or hydroxystyrene. Specifically, N- (2-hydroxyphenyl) acrylamide, N- (3-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) acrylamide, N- (2-hydroxyphenyl) methacrylamide, N- (3- Hydroxyphenyl) methacrylamide, N- (4-hydroxyphenyl) methacrylamide, o-hydroxyphenyl acrylate, m-hydroxyphenyl acrylate, p-hydroxyphenyl acrylate, o-hydroxyphenyl methacrylate, m-hydroxyphenyl methacrylate, p-hydroxy Phenyl methacrylate, o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, 2- (2-hydroxyphenyl) ethyl acrylate, 2- (3-hydroxyphenyl) Preferable are tyl acrylate, 2- (4-hydroxyphenyl) ethyl acrylate, 2- (2-hydroxyphenyl) ethyl methacrylate, 2- (3-hydroxyphenyl) ethyl methacrylate, 2- (4-hydroxyphenyl) ethyl methacrylate and the like. Can be used.
 上記側鎖にフェノール性水酸基を有する構成単位の具体例としては、下記に示すものが好ましく挙げられる。 Specific examples of the structural unit having a phenolic hydroxyl group in the above side chain are preferably those shown below.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 上記アルカリ可溶性樹脂は、上記側鎖にフェノール性水酸基を有する構成単位を、1種単独で有していても、2種以上を有していてもよい。
 上記側鎖にフェノール性水酸基を有する構成単位の含有量は、現像ラチチュード及び露光後経時現像性の観点から、上記アルカリ可溶性樹脂の全量に対し、10モル%~80モル%であることが好ましく、10モル%~60モル%であることがより好ましく、20モル%~50モル%であることが特に好ましい。
The alkali-soluble resin may have one kind of structural unit having a phenolic hydroxyl group in the side chain, or may have two or more kinds.
The content of the constituent unit having a phenolic hydroxyl group in the side chain is preferably 10 mol% to 80 mol% with respect to the total amount of the alkali-soluble resin, from the viewpoint of development latitude and post-exposure aging developability. It is more preferably 10 mol% to 60 mol%, and particularly preferably 20 mol% to 50 mol%.
 また、上記アルカリ可溶性樹脂における上記式(1)で表される構成単位と上記側鎖にフェノール性水酸基を有する構成単位とのモル比は、特に制限はないが、現像ラチチュード及び露光後経時現像性の観点から、上記式(1)で表される構成単位:上記側鎖にフェノール性水酸基を有する構成単位=2:1~1:2であることが好ましく、1.5:1~1:1.5であることがより好ましく、1.2:1~1:1.2であることが特に好ましい。 The molar ratio of the structural unit represented by the formula (1) and the structural unit having a phenolic hydroxyl group in the side chain in the alkali-soluble resin is not particularly limited, but the development latitude and the post-exposure post-exposure developability are not limited. From the viewpoint, it is preferable that the constitutional unit represented by the above formula (1): the constitutional unit having a phenolic hydroxyl group in the side chain is 2: 1 to 1: 2, and 1.5: 1 to 1: 1. It is more preferably 0.5, and particularly preferably 1.2: 1 to 1: 1.2.
-式(2)で表される構成単位-
 上記アルカリ可溶性樹脂は、下記式(2)で表される構成単位を有する。
 下記式(2)で表される構成単位は、アクリロニトリルを共重合してなる構成単位であることが好ましい。
-Structural Unit Represented by Formula (2)-
The alkali-soluble resin has a structural unit represented by the following formula (2).
The constitutional unit represented by the following formula (2) is preferably a constitutional unit formed by copolymerizing acrylonitrile.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 上記アルカリ可溶性樹脂が上記式(2)で表される構成単位の含有量は、現像ラチチュード及び露光後経時現像性の観点から、上記アルカリ可溶性樹脂の全量に対し、1モル%~50モル%であることが好ましく、5モル%~40モル%であることがより好ましく、10モル%~30モル%であることが特に好ましい。 The content of the structural unit represented by the formula (2) in the alkali-soluble resin is 1 mol% to 50 mol% based on the total amount of the alkali-soluble resin from the viewpoint of development latitude and post-exposure aging developability. It is preferably from 5 to 40 mol%, more preferably from 10 to 30 mol%.
 上記アルカリ可溶性樹脂における上記式(1)で表される構成単位と上記式(2)で表される構成単位とのモル比は、特に制限はないが、現像ラチチュード及び露光後経時現像性の観点から、上記式(1)で表される構成単位:上記式(2)で表される構成単位=2:1~1:2であることが好ましく、1.5:1~1:1.5であることがより好ましく、1.5:1~1:1であることが特に好ましい。
 また、上記アルカリ可溶性樹脂における上記側鎖にフェノール性水酸基を有する構成単位と上記式(2)で表される構成単位とのモル比は、特に制限はないが、現像ラチチュード及び露光後経時現像性の観点から、上記側鎖にフェノール性水酸基を有する構成単位:上記式(2)で表される構成単位=2:1~1:2であることが好ましく、1.5:1~1:1.5であることがより好ましく、1.5:1~1:1であることが特に好ましい。
 更に、上記アルカリ可溶性樹脂における上記式(1)で表される構成単位と上記側鎖にフェノール性水酸基を有する構成単位と上記式(2)で表される構成単位とのモル比は、特に制限はないが、現像ラチチュード及び露光後経時現像性の観点から、上記式(1)で表される構成単位:上記側鎖にフェノール性水酸基を有する構成単位:上記式(2)で表される構成単位=1~2:1~2:1~2であることが好ましく、1~2:1~2:1~1.5であることがより好ましく、1.2~2:1.2~2:1~1.2であることが特に好ましい。
The molar ratio of the constitutional unit represented by the above formula (1) to the constitutional unit represented by the above formula (2) in the above alkali-soluble resin is not particularly limited, but it is from the viewpoint of development latitude and post-exposure aging developability. Therefore, it is preferable that the constitutional unit represented by the above formula (1): the constitutional unit represented by the above formula (2) = 2: 1 to 1: 2, and 1.5: 1 to 1: 1.5. Is more preferable, and 1.5: 1 to 1: 1 is particularly preferable.
The molar ratio of the structural unit having a phenolic hydroxyl group on the side chain to the structural unit represented by the formula (2) in the alkali-soluble resin is not particularly limited, but the development latitude and the post-exposure aging developability From the viewpoint of the above, it is preferable that the constitutional unit having a phenolic hydroxyl group in the side chain: the constitutional unit represented by the formula (2) = 2: 1 to 1: 2, and 1.5: 1 to 1: 1. It is more preferably 0.5 and particularly preferably 1.5: 1 to 1: 1.
Furthermore, the molar ratio of the structural unit represented by the formula (1), the structural unit having a phenolic hydroxyl group in the side chain, and the structural unit represented by the formula (2) in the alkali-soluble resin is not particularly limited. However, from the viewpoint of development latitude and post-exposure aging developability, a structural unit represented by the above formula (1): a structural unit having a phenolic hydroxyl group in the above side chain: a configuration represented by the above formula (2) Unit = 1 to 2: 1 to 2: 1 to 2, preferably 1 to 2: 1 to 2: 1 to 1.5, and more preferably 1.2 to 2: 1.2 to 2 It is particularly preferable that the ratio is from 1 to 1.2.
-カルボキシ基を有する構成単位-
 上記アルカリ可溶性樹脂は、現像性、現像ラチチュード及び露光後経時現像性の観点から、カルボキシ基を有する構成単位を更に有することが好ましい。
 上記カルボキシ基を有する構成単位としては、現像性、現像ラチチュード及び露光後経時現像性の観点から、下記式(Ac)で表される構成単位であることが好ましい。
-Structural unit having a carboxy group-
From the viewpoints of developability, development latitude and post-exposure aging developability, the alkali-soluble resin preferably further has a structural unit having a carboxy group.
The structural unit having a carboxy group is preferably a structural unit represented by the following formula (Ac), from the viewpoints of developability, development latitude and post-exposure aging developability.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 式(Ac)中、RAcは、水素原子又はメチル基を表す。 In formula (Ac), R Ac represents a hydrogen atom or a methyl group.
 式(Ac)におけるRAcは、水素原子であることが好ましい。
 上記カルボキシ基を有する構成単位を形成するモノマーの具体例としては、アクリル酸、メタクリル酸、無水マレイン酸、イタコン酸等、カルボキシ基とエチレン性不飽和基とを分子内にそれぞれ1以上有する不飽和カルボン酸が挙げられる。
 中でも、アクリル酸又はメタクリル酸が好ましく、アクリル酸がより好ましい。
R Ac in formula (Ac) is preferably a hydrogen atom.
Specific examples of the monomer forming the constitutional unit having a carboxy group include acrylic acid, methacrylic acid, maleic anhydride, itaconic acid, etc. Examples thereof include carboxylic acids.
Among them, acrylic acid or methacrylic acid is preferable, and acrylic acid is more preferable.
 上記アルカリ可溶性樹脂は、上記カルボキシ基を有する構成単位を、1種単独で有していても、2種以上を有していてもよい。
 上記アルカリ可溶性樹脂が上記カルボキシ基を有する構成単位を有する場合、上記カルボキシ基を有する構成単位の含有量は、現像ラチチュード及び露光後経時現像性の観点から、上記アルカリ可溶性樹脂の全量に対し、1モル%~50モル%であることが好ましく、2モル%~40モル%であることがより好ましく、5モル%~30モル%であることが特に好ましい。
The alkali-soluble resin may have one kind of the structural unit having a carboxy group, or may have two or more kinds.
When the alkali-soluble resin has a structural unit having a carboxy group, the content of the structural unit having a carboxy group is 1 with respect to the total amount of the alkali-soluble resin from the viewpoint of development latitude and post-exposure aging developability. It is preferably from 50 to 50 mol%, more preferably from 2 to 40 mol%, and particularly preferably from 5 to 30 mol%.
-その他の構成単位-
 上記アルカリ可溶性樹脂は、上述した以外のその他の構成単位を有していてもよい。
 その他の構成単位としては、特に制限はないが、アルキル(メタ)アクリレート化合物由来の構成単位(アルキル(メタ)アクリレート化合物を共重合してなる構成単位)を含むことが好ましい。
-Other building units-
The alkali-soluble resin may have other constitutional units other than those mentioned above.
Other structural units are not particularly limited, but preferably include a structural unit derived from an alkyl (meth) acrylate compound (a structural unit obtained by copolymerizing an alkyl (meth) acrylate compound).
 上記その他の構成単位を形成するモノマーの具体例としては、下記(m1)~(m9)のモノマーが好ましく挙げられる。
 (m1)2-ヒドロキシエチルアクリレート又は2-ヒドロキシエチルメタクリレート等の脂肪族水酸基を有するアクリル酸エステル類、及びメタクリル酸エステル類。
 (m2)アクリル酸メチル、アクリル酸エチル、アクリル酸プロピル、アクリル酸ブチル、アクリル酸アミル、アクリル酸ヘキシル、アクリル酸オクチル、アクリル酸ベンジル、アクリル酸-2-クロロエチル、グリシジルアクリレート、等のアルキルアクリレート。
 (m3)メタクリル酸メチル、メタクリル酸エチル、メタクリル酸プロピル、メタクリル酸ブチル、メタクリル酸アミル、メタクリル酸ヘキシル、メタクリル酸シクロヘキシル、メタクリル酸ベンジル、メタクリル酸-2-クロロエチル、グリシジルメタクリレート等のアルキルメタクリレート。
 (m4)アクリルアミド、メタクリルアミド、N-メチロールアクリルアミド、N-エチルアクリルアミド、N-ヘキシルメタクリルアミド、N-シクロヘキシルアクリルアミド、N-ヒドロキシエチルアクリルアミド、N-フェニルアクリルアミド、N-ニトロフェニルアクリルアミド、N-エチル-N-フェニルアクリルアミド等のアクリルアミド若しくはメタクリルアミド、N-ビニルピロリドン。
 (m5)エチルビニルエーテル、2-クロロエチルビニルエーテル、ヒドロキシエチルビニルエーテル、プロピルビニルエーテル、ブチルビニルエーテル、オクチルビニルエーテル、フェニルビニルエーテル等のビニルエーテル類。
 (m6)ビニルアセテート、ビニルクロロアセテート、ビニルブチレート、安息香酸ビニル等のビニルエステル類。
 (m7)スチレン、α-メチルスチレン、メチルスチレン、クロロメチルスチレン等のスチレン類。
 (m8)メチルビニルケトン、エチルビニルケトン、プロピルビニルケトン、フェニルビニルケトン等のビニルケトン類。
 (m9)エチレン、プロピレン、イソブチレン、ブタジエン、イソプレン等のオレフィン類。
Specific examples of the monomer forming the above-mentioned other structural units are preferably the following monomers (m1) to (m9).
(M1) Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.
(M2) Alkyl acrylates such as methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate and glycidyl acrylate.
(M3) Alkyl methacrylates such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate and the like.
(M4) acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl- Acrylamide or methacrylamide such as N-phenylacrylamide, N-vinylpyrrolidone.
(M5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether and phenyl vinyl ether.
(M6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate.
(M7) Styrenes such as styrene, α-methylstyrene, methylstyrene and chloromethylstyrene.
(M8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.
(M9) Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene.
 上記アルカリ可溶性樹脂は、上記その他の構成単位を、1種単独で有していても、2種以上を有していてもよい。
 上記アルカリ可溶性樹脂が上記その他の構成単位を有する場合、上記その他の構成単位の含有量は、現像ラチチュード及び露光後経時現像性の観点から、上記アルカリ可溶性樹脂の全量に対し、1モル%~50モル%であることが好ましく、2モル%~40モル%であることがより好ましく、5モル%~30モル%であることが特に好ましい。
The alkali-soluble resin may have one of the above-mentioned other structural units alone, or may have two or more thereof.
When the alkali-soluble resin has the other structural unit, the content of the other structural unit is 1 mol% to 50 with respect to the total amount of the alkali-soluble resin, from the viewpoint of development latitude and post-exposure aging developability. The amount is preferably mol%, more preferably 2 mol% to 40 mol%, particularly preferably 5 mol% to 30 mol%.
 上記アルカリ可溶性樹脂の重量平均分子量(Mw)は、現像ラチチュード及び露光後経時現像性の観点から、2,000以上であることが好ましく、5,000~300,000であることがより好ましく、10,000~200,000であることが更に好ましく、40,000~100,000であることが特に好ましい。
 また、上記アルカリ可溶性樹脂は、重量平均分子量が2,000以上、数平均分子量が500以上のものが好ましく、重量平均分子量が5,000~300,000であり、かつ数平均分子量が800~250,000であることがより好ましい。
 また、上記アルカリ可溶性樹脂の分散度(重量平均分子量/数平均分子量)は、1.1~10であることが好ましい。
The weight-average molecular weight (Mw) of the alkali-soluble resin is preferably 2,000 or more, more preferably 5,000 to 300,000, from the viewpoint of development latitude and post-exposure aging developability. It is more preferably 2,000 to 200,000, and particularly preferably 40,000 to 100,000.
The alkali-soluble resin preferably has a weight average molecular weight of 2,000 or more and a number average molecular weight of 500 or more, a weight average molecular weight of 5,000 to 300,000, and a number average molecular weight of 800 to 250. More preferably, it is 1,000.
The degree of dispersion (weight average molecular weight / number average molecular weight) of the alkali-soluble resin is preferably 1.1 to 10.
 上記アルカリ可溶性樹脂は、1種単独で使用しても、2種以上を併用してもよい。
 上記アルカリ可溶性樹脂の含有量は、耐刷性の観点から、画像記録層の全質量に対して、1質量%~90質量%が好ましく、3質量%~70質量%がより好ましく、5質量%~50質量%が特に好ましい。
 また、上記画像形成層が、上層及び下層を有する重層構造である場合、上記アルカリ可溶性樹脂は、下層に少なくとも含有されることが好ましい。下層における上記アルカリ可溶性樹脂の含有量としては、下層の全質量に対し、3質量%以上であることが好ましく、10質量%以上であることがより好ましく、25質量%以上であることが更に好ましい。
The above alkali-soluble resins may be used alone or in combination of two or more.
From the viewpoint of printing durability, the content of the alkali-soluble resin is preferably 1% by mass to 90% by mass, more preferably 3% by mass to 70% by mass, and more preferably 5% by mass. It is particularly preferably from about 50% by mass.
In addition, when the image forming layer has a multilayer structure having an upper layer and a lower layer, it is preferable that the lower layer contains at least the alkali-soluble resin. The content of the alkali-soluble resin in the lower layer is preferably 3% by mass or more, more preferably 10% by mass or more, and further preferably 25% by mass or more, based on the total mass of the lower layer. .
<赤外線吸収剤>
 上記画像形成層は、赤外線吸収剤を含有する。
 赤外線吸収剤としては、赤外光を吸収し熱を発生する顔料又は染料であれば特に制限はなく、赤外線吸収剤として知られる種々の顔料又は染料を用いることができる。
 顔料としては、市販の顔料、並びに、カラーインデックス(C.I.)便覧、「最新顔料便覧」(日本顔料技術協会編、1977年刊)、「最新顔料応用技術」(CMC出版、1986年刊)及び「印刷インキ技術」CMC出版、1984年刊)に記載されている顔料を利用することができる。
<Infrared absorber>
The image forming layer contains an infrared absorber.
The infrared absorbent is not particularly limited as long as it is a pigment or dye that absorbs infrared light and generates heat, and various pigments or dyes known as infrared absorbents can be used.
As the pigment, commercially available pigments, color index (CI) handbook, "latest pigment handbook" (edited by Japan Pigment Technology Association, 1977), "latest pigment application technology" (CMC Publishing, 1986), and The pigments described in "Printing Ink Technology", CMC Publishing Co., Ltd., 1984) can be used.
 顔料の種類としては、例えば、黒色顔料、黄色顔料、オレンジ色顔料、褐色顔料、赤色顔料、紫色顔料、青色顔料、緑色顔料、蛍光顔料、金属粉顔料、ポリマー結合色素が挙げられる。具体的には、不溶性アゾ顔料、アゾレーキ顔料、縮合アゾ顔料、キレートアゾ顔料、フタロシアニン系顔料、アントラキノン系顔料、ペリレン及びペリノン系顔料、チオインジゴ系顔料、キナクリドン系顔料、ジオキサジン系顔料、イソインドリノン系顔料、キノフタロン系顔料、染付けレーキ顔料、アジン顔料、ニトロソ顔料、ニトロ顔料、天然顔料、蛍光顔料、無機顔料、カーボンブラックを用いることができる。
 顔料は表面処理をせずに用いてもよく、従来公知の表面処理を施して用いてもよい。
 顔料の粒径は、0.01μm~10μmが好ましく、0.05μm~1μmがより好ましく、0.1μm~1μmが更に好ましい。上記範囲であると、顔料の分散物の画像記録層形成用塗布液中での安定性、画像記録層の均一性等の点で好ましい。
 顔料を分散する方法としては、例えば、「最新顔料応用技術」(CMC出版、1986年刊)等に記載されているインキ製造やトナー製造等に用いられる公知の分散技術が使用できる。
Examples of types of pigments include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and polymer-bonded dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments. A quinophthalone pigment, a dyed lake pigment, an azine pigment, a nitroso pigment, a nitro pigment, a natural pigment, a fluorescent pigment, an inorganic pigment, and carbon black can be used.
The pigment may be used without surface treatment or may be subjected to conventionally known surface treatment before use.
The particle size of the pigment is preferably 0.01 μm to 10 μm, more preferably 0.05 μm to 1 μm, and further preferably 0.1 μm to 1 μm. The above range is preferable from the viewpoint of stability of the pigment dispersion in the coating liquid for forming the image recording layer, uniformity of the image recording layer, and the like.
As a method for dispersing the pigment, for example, a known dispersion technique used in ink production or toner production described in "Latest Pigment Application Technology" (CMC Publishing, 1986) can be used.
 赤外線吸収剤としては、染料が好ましく挙げられる。
 本開示において用いることができる赤外線吸収剤としては、市販の染料及び文献(例えば「染料便覧」有機合成化学協会編集、昭和45年刊)に記載されている公知のものが利用できる。具体的には、アゾ染料、金属錯塩アゾ染料、ピラゾロンアゾ染料、アントラキノン染料、フタロシアニン染料、カルボニウム染料、キノンイミン染料、メチン染料、シアニン染料、オキソノール染料などの染料が挙げられる。
 具体的には、例えば、特開平7-285275号公報の段落0020~0021に記載されている化合物、及び、「エレクトロニクス関連色素-現状と将来展望-」第16章(株)シーエムシー(1998年刊)等の公知資料に記載されている化合物が挙げられる。
 本開示において、これらの染料のうち、赤外光又は近赤外光を少なくとも吸収するものが、赤外光又は近赤外光を発光するレーザーでの利用に適する点で好ましく、シアニン染料が特に好ましい。
As the infrared absorber, dyes are preferably mentioned.
As the infrared absorber that can be used in the present disclosure, commercially available dyes and known ones described in a literature (for example, “Handbook of Dyes” edited by The Society of Synthetic Organic Chemistry, published in 1970) can be used. Specific examples thereof include azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, cyanine dyes, and oxonol dyes.
Specifically, for example, the compounds described in paragraphs 0020 to 0021 of JP-A-7-285275, and "Electronics-related dyes-present state and future prospect-", Chapter 16 CMC (published in 1998) ) And the like described in publicly known materials.
In the present disclosure, among these dyes, those that absorb at least infrared light or near infrared light are preferable in that they are suitable for use in a laser that emits infrared light or near infrared light, and cyanine dyes are particularly preferable. preferable.
 そのような赤外光又は近赤外光を少なくとも吸収する染料としては、例えば、特開昭58-125246号、特開昭59-84356号、特開昭59-202829号、特開昭60-78787号等の各公報に記載されているシアニン染料、特開昭58-173696号、特開昭58-181690号、特開昭58-194595号等の各公報に記載されているメチン染料、特開昭58-112793号、特開昭58-224793号、特開昭59-48187号、特開昭59-73996号、特開昭60-52940号、特開昭60-63744号等の各公報に記載されているナフトキノン染料、特開昭58-112792号公報等に記載されているスクワリリウム色素、英国特許434,875号明細書記載のシアニン染料等を挙げることができる。
 また、染料として米国特許第5,156,938号明細書記載の近赤外吸収増感剤も好適に用いられ、また、米国特許第3,881,924号明細書記載の置換されたアリールベンゾ(チオ)ピリリウム塩、特開昭57-142645号公報(米国特許第4,327,169号明細書)記載のトリメチンチアピリリウム塩、特開昭58-181051号、同58-220143号、同59-41363号、同59-84248号、同59-84249号、同59-146063号、同59-146061号の各公報に記載されているピリリウム系化合物、特開昭59-216146号公報記載のシアニン色素、米国特許第4,283,475号明細書に記載のペンタメチンチオピリリウム塩等や特公平5-13514号、同5-19702号公報に開示されているピリリウム化合物等が、市販品としては、エポリン社製のEpolight III-178、Epolight III-130、Epolight III-125等が特に好ましく用いられる。
 また、染料として特に好ましい別の例として米国特許第4,756,993号明細書中に式(I)、(II)として記載されている近赤外吸収染料を挙げることができる。
Examples of such dyes that absorb at least infrared light or near infrared light include, for example, JP-A-58-125246, JP-A-59-84356, JP-A-59-202829, and JP-A-60-. Cyanine dyes described in JP-A-78787 and the like, methine dyes described in JP-A-58-173696, JP-A-58-181690 and JP-A-58-194595, and JP-A-58-112793, JP-A-58-224793, JP-A-59-48187, JP-A-59-73996, JP-A-60-52940, JP-A-60-63744 and the like. The naphthoquinone dyes described in JP-A-58-112792, the squarylium dyes described in JP-A-58-112792, and the cyanine dyes described in British Patent 434,875. Can.
Further, a near infrared absorption sensitizer described in US Pat. No. 5,156,938 is also preferably used as a dye, and a substituted arylbenzo described in US Pat. No. 3,881,924 is also used. (Thio) pyrylium salt, the trimethine thiapyrylium salt described in JP-A-57-142645 (US Pat. No. 4,327,169), JP-A-58-181051, JP-A-58-220143, and JP-A-58-220143. 59-41363, 59-84248, 59-84249, 59-146063, 59-146061 and pyrylium compounds described in JP-A-59-216146. Cyanine dyes, pentamethine thiopyrylium salts described in U.S. Pat. No. 4,283,475, and Japanese Patent Publication Nos. 5-13514 and 5-19702. Pyrylium compounds disclosed in distribution is, as commercially available products, Epolight III-178 of Eporin Co., Epolight III-130, Epolight III-125 and the like are particularly preferably used.
Another particularly preferable example of the dye is a near-infrared absorbing dye described as formulas (I) and (II) in US Pat. No. 4,756,993.
 これらの染料のうち特に好ましいものとしては、シアニン色素、フタロシアニン染料、オキソノール染料、スクアリリウム色素、ピリリウム塩、チオピリリウム染料、ニッケルチオレート錯体が挙げられる。更に、下記式(a)で表されるシアニン色素は、本開示における上層に使用した場合に、安定性、経済性に優れるため最も好ましい。 Particularly preferred among these dyes are cyanine dyes, phthalocyanine dyes, oxonol dyes, squarylium dyes, pyrylium salts, thiopyrylium dyes, and nickel thiolate complexes. Furthermore, the cyanine dye represented by the following formula (a) is most preferable because it has excellent stability and economy when used in the upper layer of the present disclosure.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 式(a)中、Xは、水素原子、ハロゲン原子、ジアリールアミノ基(-NPh)、X-L又は以下に示す基を表し、Xは、酸素原子又は硫黄原子を表し、Lは、炭素数1~12の炭化水素基、ヘテロ原子を有する芳香族環、又はヘテロ原子を含む炭素数1~12の炭化水素基を表す。なお、ここでヘテロ原子とは、N、S、O、ハロゲン原子、及び、Seを表す。 In the formula (a), X 1 represents a hydrogen atom, a halogen atom, a diarylamino group (-NPh 2 ), X 2 -L 1 or a group shown below, X 2 represents an oxygen atom or a sulfur atom, L 1 represents a hydrocarbon group having 1 to 12 carbon atoms, an aromatic ring having a hetero atom, or a hydrocarbon group having 1 to 12 carbon atoms containing a hetero atom. In addition, a hetero atom here represents N, S, O, a halogen atom, and Se.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 上記式中、Xa-は後述するZa-と同様に定義され、Raは、水素原子、アルキル基、アリール基、置換又は無置換のアミノ基、及び、ハロゲン原子よりなる群から選択される置換基を表す。 In the above formula, Xa is defined in the same manner as Za described later, and R a is a substituent selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, a substituted or unsubstituted amino group, and a halogen atom. Represents a group.
 R21及びR22は、それぞれ独立に、炭素数1~12の炭化水素基を示す。画像記録層塗布液の保存安定性から、R21及びR22は、炭素数2個以上の炭化水素基であることが好ましく、更に、R21とR22とは互いに結合し、5員環又は6員環を形成していることが特に好ましい。 R 21 and R 22 each independently represent a hydrocarbon group having 1 to 12 carbon atoms. From the viewpoint of storage stability of the coating liquid for the image recording layer, R 21 and R 22 are preferably a hydrocarbon group having 2 or more carbon atoms, and further, R 21 and R 22 are bonded to each other to form a 5-membered ring or It is particularly preferable to form a 6-membered ring.
 Ar及びArは、それぞれ同じでも異なっていてもよく、置換基を有していてもよい芳香族炭化水素基を示す。好ましい芳香族炭化水素基としては、ベンゼン環及びナフタレン環が挙げられる。また、好ましい置換基としては、炭素数12個以下の炭化水素基、ハロゲン原子、炭素数12個以下のアルコキシ基が挙げられる。
 Y11及びY12は、それぞれ同じでも異なっていてもよく、硫黄原子又は炭素数12個以下のジアルキルメチレン基を示す。R23及びR24は、それぞれ同じでも異なっていてもよく、置換基を有していてもよい炭素数20個以下の炭化水素基を示す。好ましい置換基としては、炭素数12個以下のアルコキシ基、カルボキシ基、又は、スルホ基が挙げられる。
 R25、R26、R27及びR28は、それぞれ同じでも異なっていてもよく、水素原子又は炭素数12個以下の炭化水素基を示す。原料の入手性から、好ましくは水素原子である。また、Zaは、対アニオンを示す。但し、式(a)で示されるシアニン色素がその構造内にアニオン性の置換基を有し、電荷の中和が必要ない場合は、Zaは必要ない。好ましいZaは、画像記録層塗布液の保存安定性から、ハロゲン化物イオン、過塩素酸イオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、及びスルホン酸イオンであり、特に好ましくは、過塩素酸イオン、ヘキサフルオロホスフェートイオン、及びアリールスルホン酸イオンである。
Ar 1 and Ar 2 may be the same or different and each represents an aromatic hydrocarbon group which may have a substituent. Preferred aromatic hydrocarbon groups include a benzene ring and a naphthalene ring. Examples of preferable substituents include a hydrocarbon group having 12 or less carbon atoms, a halogen atom, and an alkoxy group having 12 or less carbon atoms.
Y 11 and Y 12, which may be the same or different, each represents a sulfur atom or a dialkylmethylene group having 12 or less carbon atoms. R 23 and R 24, which may be the same or different, each represents a hydrocarbon group having 20 or less carbon atoms, which may have a substituent. Preferred substituents include an alkoxy group having 12 or less carbon atoms, a carboxy group, or a sulfo group.
R 25 , R 26 , R 27 and R 28, which may be the same or different, each represents a hydrogen atom or a hydrocarbon group having 12 or less carbon atoms. From the availability of raw materials, hydrogen atom is preferable. Za represents a counter anion. However, when the cyanine dye represented by the formula (a) has an anionic substituent in its structure and neutralization of charge is not necessary, Za is not necessary. Preferred Za is a halide ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, and a sulfonate ion in view of the storage stability of the coating solution for the image recording layer, and a perchlorate ion is particularly preferred. , Hexafluorophosphate ion, and arylsulfonate ion.
 好適に用いることのできる式(a)で示されるシアニン色素の具体例としては、特開2001-133969号公報の段落0017~0019、特開2002-40638号公報の段落0012~0038、特開2002-23360号公報の段落0012~0023に記載されたものを挙げることができる。
 赤外線吸収剤として特に好ましくは、以下に示すシアニン染料Aである。
Specific examples of the cyanine dye represented by the formula (a) which can be preferably used include, for example, paragraphs 0017 to 0019 of JP 2001-133969 A, paragraphs 0012 to 0038 of JP 2002-40638 A, and JP 2002 A. Examples thereof include those described in paragraphs 0012 to 0023 of JP-A-23360.
The cyanine dye A shown below is particularly preferable as the infrared absorber.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 上記赤外線吸収剤は、1種単独で使用しても、2種以上を併用してもよい。
 上記画像形成層における赤外線吸収剤の含有量としては、感度、画像形成層の均一性及び、耐久性の観点から、上記画像形成層の全質量に対し、0.01質量%~50質量%であることが好ましく、0.1質量%~30質量%であることがより好ましく、1.0質量%~30質量%であることが特に好ましい。
The infrared absorbers may be used alone or in combination of two or more.
The content of the infrared absorbing agent in the image forming layer is 0.01% by mass to 50% by mass based on the total mass of the image forming layer from the viewpoint of sensitivity, uniformity of the image forming layer, and durability. It is preferable that the amount is 0.1% by mass to 30% by mass, more preferably 1.0% by mass to 30% by mass.
<第4級アンモニウム塩化合物>
 上記画像記録層は、第4級アンモニウム塩化合物を含む。
 上記第4級アンモニウム塩化合物における第4級アンモニウムカチオンは、一価のカチオンであっても、第4級アンモニウム構造を2以上有する二価以上のカチオンであってもよいが、一価のカチオンであることが好ましい。
 上記第4級アンモニウム塩化合物における対アニオンは、電荷を中和できるアニオンであれば、一価のアニオンであっても、二価以上のアニオンであってもよいが、一価のアニオンであることが好ましい。
<Quaternary ammonium salt compound>
The image recording layer contains a quaternary ammonium salt compound.
The quaternary ammonium cation in the quaternary ammonium salt compound may be a monovalent cation or a divalent or higher cation having two or more quaternary ammonium structures. Preferably there is.
The counter anion in the quaternary ammonium salt compound may be a monovalent anion or a divalent or higher valent anion as long as it is an anion capable of neutralizing the charge, but it is a monovalent anion. Is preferred.
 上記第4級アンモニウム塩化合物における第4級アンモニウムカチオンは、下記式(Am-1)で表されるカチオンであることが好ましく、下記式(Am-2)で表されるカチオンであることがより好ましく、下記式(Am-3)で表されるカチオンであることが特に好ましい。 The quaternary ammonium cation in the above quaternary ammonium salt compound is preferably a cation represented by the following formula (Am-1), and more preferably a cation represented by the following formula (Am-2). A cation represented by the following formula (Am-3) is particularly preferable.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 式(Am-1)中、Rm1~Rm4はそれぞれ独立に、炭素原子を1個以上含む置換基を表し、また、Rm1~Rm4のうちの2つ以上が互いに結合して環構造を形成してもよい。
 式(Am-2)中、C~Cは炭素原子を表し、Nは窒素原子を表し、R~R17はそれぞれ独立に、水素原子又は置換基を表し、Lは、CとCとを連結する単結合又は二重結合、又は、-C-C-N-C-C-を含む環構造を形成する2価の連結基を表し、m1及びm2はそれぞれ独立に、0~5の整数を表し、n1及びn2はそれぞれ独立に、0又は正の整数を表す。
In formula (Am-1), R m1 to R m4 each independently represent a substituent containing at least one carbon atom, and two or more of R m1 to R m4 are bonded to each other to form a ring structure. May be formed.
In formula (Am-2), C 1 to C 6 represent carbon atoms, N 1 represents a nitrogen atom, R 4 to R 17 each independently represent a hydrogen atom or a substituent, and L 3 represents C 3 and C 4 and a single or double bond linking, or, -C 3 -C 1 -N 1 -C 2 -C 4 - represents a divalent linking group to form a ring structure containing, m1 and m2 each independently represents an integer of 0 to 5, and n1 and n2 each independently represent 0 or a positive integer.
 式(Am-1)におけるRm1~Rm4で表される炭素原子を1個以上含む置換基としては、以下のものを例示することができる。
 例えば、アルキル基(好ましくは炭素数1~20であり、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、具体的には、例えばメチル基、エチル基、n-ブチル基、iso-プロピル基、tert-ブチル基、n-オクチル基、n-デシル基、n-ヘキサデシル基、シクロプロピル基、シクロペンチル基、シクロヘキシル基、2-シクロヘキシルエチル基等が挙げられる。)、アルケニル基(好ましくは炭素数2~20、より好ましくは炭素数2~12、特に好ましくは炭素数2~8であり、例えばビニル基、アリル基、2-ブテニル基、3-ペンテニル基、2-シクロヘキセニルメチル基等が挙げられる。)、アルキニル基(好ましくは炭素数2~20、より好ましくは炭素数2~12、特に好ましくは炭素数2~8であり、例えばプロパルギル基、3-ペンチニル基等が挙げられる。)、アリール基(好ましくは炭素数6~30、より好ましくは炭素数6~20、特に好ましくは炭素数6~12であり、例えばフェニル基、p-メチルフェニル基、ナフチル基、等が挙げられる。)等が挙げられる。
Examples of the substituent containing at least one carbon atom represented by R m1 to R m4 in formula (Am-1) include the followings.
For example, an alkyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, specifically, for example, methyl group, ethyl group, n-butyl). Group, iso-propyl group, tert-butyl group, n-octyl group, n-decyl group, n-hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 2-cyclohexylethyl group, etc.), alkenyl. A group (preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms), for example, vinyl group, allyl group, 2-butenyl group, 3-pentenyl group, 2-cyclo A hexenylmethyl group, etc.), an alkynyl group (preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, particularly preferably 2 to 12 carbon atoms). And examples thereof include a propargyl group and a 3-pentynyl group.), An aryl group (preferably having 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, particularly preferably 6 to 12 carbon atoms, for example, Phenyl group, p-methylphenyl group, naphthyl group, etc.) and the like.
 これらの置換基は更に置換されてもよい。また、置換基が二つ以上ある場合は、同一でも異なっていてもよい。また、可能な場合には互いに連結して環を形成していてもよい。 These substituents may be further substituted. When there are two or more substituents, they may be the same or different. If possible, they may be linked to each other to form a ring.
 式(Am-1)におけるRm1~Rm4として好ましくは、アルキル基、アリール基、又はそれらを更に任意に置換した基である。また、得られる平版印刷版の耐薬品性の観点からは、Rm1~Rm4の炭素数の合計が8~80であることが好ましく、10~64であることがより好ましく、12~48であることが特に好ましい。 R m1 to R m4 in formula (Am-1) are preferably an alkyl group, an aryl group, or a group in which any of these is further substituted. From the viewpoint of chemical resistance of the lithographic printing plate obtained, the total carbon number of R m1 to R m4 is preferably 8 to 80, more preferably 10 to 64, and 12 to 48. It is particularly preferable that
 式(Am-2)のR~R17における置換基としては、以下のものを例示することができる。
 例えば、アルキル基(好ましくは炭素数1~20であり、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、具体的には、例えばメチル基、エチル基、n-ブチル基、iso-プロピル基、tert-ブチル基、n-オクチル基、n-デシル基、n-ヘキサデシル基、シクロプロピル基、シクロペンチル基、シクロヘキシル基、2-シクロヘキシルエチル基等が挙げられる。)、アルケニル基(好ましくは炭素数2~20、より好ましくは炭素数2~12、特に好ましくは炭素数2~8であり、例えばビニル基、アリル基、2-ブテニル基、3-ペンテニル基、2-シクロヘキセニルメチル基等が挙げられる。)、アルキニル基(好ましくは炭素数2~20、より好ましくは炭素数2~12、特に好ましくは炭素数2~8であり、例えばプロパルギル基、3-ペンチニル基等が挙げられる。)、アリール基(好ましくは炭素数6~30、より好ましくは炭素数6~20、特に好ましくは炭素数6~12であり、例えばフェニル基、p-メチルフェニル基、ナフチル基、等が挙げられる。)、
Examples of the substituent in R 4 to R 17 of the formula (Am-2) include the followings.
For example, an alkyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, specifically, for example, methyl group, ethyl group, n-butyl). Group, iso-propyl group, tert-butyl group, n-octyl group, n-decyl group, n-hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 2-cyclohexylethyl group, etc.), alkenyl. A group (preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms), for example, vinyl group, allyl group, 2-butenyl group, 3-pentenyl group, 2-cyclo A hexenylmethyl group, etc.), an alkynyl group (preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, particularly preferably 2 to 12 carbon atoms). And examples thereof include a propargyl group, a 3-pentynyl group, etc.), an aryl group (preferably having 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and particularly preferably 6 to 12 carbon atoms, for example, Phenyl group, p-methylphenyl group, naphthyl group, etc.),
アミノ基(好ましくは炭素数0~20、より好ましくは炭素数0~12、特に好ましくは炭素数0~6であり、例えばアミノ基、メチルアミノ基、ジメチルアミノ基、ジエチルアミノ基、ジフェニルアミノ基、ジベンジルアミノ基等が挙げられる。)、アルコキシ基(好ましくは炭素数1~20、より好ましくは炭素数1~12、特に好ましくは炭素数1~8であり、例えばメトキシ基、エトキシ基、ブトキシ基等が挙げられる。)、アリールオキシ基(好ましくは炭素数6~20、より好ましくは炭素数6~16、特に好ましくは炭素数6~12であり、例えばフェニルオキシ基、2-ナフチルオキシ基等が挙げられる。)、 An amino group (preferably having 0 to 20 carbon atoms, more preferably 0 to 12 carbon atoms, particularly preferably 0 to 6 carbon atoms, for example, amino group, methylamino group, dimethylamino group, diethylamino group, diphenylamino group, A dibenzylamino group, etc.), an alkoxy group (preferably having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, particularly preferably 1 to 8 carbon atoms), for example, a methoxy group, an ethoxy group, butoxy. Group, etc.), an aryloxy group (preferably having 6 to 20 carbon atoms, more preferably 6 to 16 carbon atoms, particularly preferably 6 to 12 carbon atoms), for example, a phenyloxy group, a 2-naphthyloxy group. Etc.),
アシル基(好ましくは炭素数1~20、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、例えばアセチル基、ベンゾイル基、ホルミル基、ピバロイル基等が挙げられる。)、アルコキシカルボニル基(好ましくは炭素数2~20、より好ましくは炭素数2~16、特に好ましくは炭素数2~12であり、例えばメトキシカルボニル基、エトキシカルボニル基等が挙げられる。)、アリールオキシカルボニル基(好ましくは炭素数7~20、より好ましくは炭素数7~16、特に好ましくは炭素数7~10であり、例えばフェニルオキシカルボニル基などが挙げられる。)、アシルオキシ基(好ましくは炭素数2~20、より好ましくは炭素数2~16、特に好ましくは炭素数2~10であり、例えばアセトキシ基、ベンゾイルオキシ基等が挙げられる。)、アシルアミノ基(好ましくは炭素数2~20、より好ましくは炭素数2~16、特に好ましくは炭素数2~10であり、例えばアセチルアミノ基、ベンゾイルアミノ基等が挙げられる。)、 Acyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include an acetyl group, a benzoyl group, a formyl group, a pivaloyl group). Alkoxycarbonyl group (preferably having 2 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, particularly preferably 2 to 12 carbon atoms, and examples thereof include a methoxycarbonyl group and an ethoxycarbonyl group), aryloxycarbonyl. A group (preferably having 7 to 20 carbon atoms, more preferably 7 to 16 carbon atoms, particularly preferably 7 to 10 carbon atoms, and examples thereof include a phenyloxycarbonyl group); an acyloxy group (preferably having 2 carbon atoms). To 20, more preferably 2 to 16 carbon atoms, and particularly preferably 2 to 10 carbon atoms. And an acylamino group (preferably having a carbon number of 2 to 20, more preferably a carbon number of 2 to 16, and particularly preferably a carbon number of 2 to 10), such as an acetylamino group and a benzoylamino group. Can be mentioned.),
アルコキシカルボニルアミノ基(好ましくは炭素数2~20、より好ましくは炭素数2~16、特に好ましくは炭素数2~12であり、例えばメトキシカルボニルアミノ基等が挙げられる。)、アリールオキシカルボニルアミノ基(好ましくは炭素数7~20、より好ましくは炭素数7~16、特に好ましくは炭素数7~12であり、例えばフェニルオキシカルボニルアミノ基等が挙げられる。)、スルホニルアミノ基(好ましくは炭素数1~20、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、例えばメタンスルホニルアミノ基、ベンゼンスルホニルアミノ基等が挙げられる。)、スルファモイル基(好ましくは炭素数0~20、より好ましくは炭素数0~16、特に好ましくは炭素数0~12であり、例えばスルファモイル基、メチルスルファモイル基、ジメチルスルファモイル基、フェニルスルファモイル基等が挙げられる。)、 Alkoxycarbonylamino group (preferably having 2 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, particularly preferably 2 to 12 carbon atoms, and examples thereof include a methoxycarbonylamino group) and an aryloxycarbonylamino group. (Preferably having 7 to 20 carbon atoms, more preferably 7 to 16 carbon atoms, particularly preferably 7 to 12 carbon atoms, and examples thereof include a phenyloxycarbonylamino group and the like.), Sulfonylamino group (preferably having carbon number 1 to 20, more preferably 1 to 16 carbon atoms, and particularly preferably 1 to 12 carbon atoms, and examples thereof include a methanesulfonylamino group and a benzenesulfonylamino group.), A sulfamoyl group (preferably having a carbon number of 0 to 20, more preferably 0 to 16 carbon atoms, particularly preferably 0 to 12 carbon atoms. Famoiru group, methylsulfamoyl group, dimethylsulfamoyl group, and a phenylsulfamoyl group.)
カルバモイル基(好ましくは炭素数1~20、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、例えばカルバモイル基、メチルカルバモイル基、ジエチルカルバモイル基、フェニルカルバモイル基等が挙げられる。)、アルキルチオ基(好ましくは炭素数1~20、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、例えばメチルチオ基、エチルチオ基等が挙げられる。)、アリールチオ基(好ましくは炭素数6~20、より好ましくは炭素数6~16、特に好ましくは炭素数6~12であり、例えばフェニルチオ基等が挙げられる。)、スルホニル基(好ましくは炭素数1~20、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、例えばメシル基、トシル基等が挙げられる。)、スルフィニル基(好ましくは炭素数1~20、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、例えばメタンスルフィニル基、ベンゼンスルフィニル基等が挙げられる。)、ウレイド基(好ましくは炭素数1~20、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、例えばウレイド基、メチルウレイド基、フェニルウレイド基等が挙げられる。)、 Carbamoyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a carbamoyl group, a methylcarbamoyl group, a diethylcarbamoyl group and a phenylcarbamoyl group. ), An alkylthio group (preferably having a carbon number of 1 to 20, more preferably a carbon number of 1 to 16, and particularly preferably a carbon number of 1 to 12, and examples thereof include a methylthio group and an ethylthio group), an arylthio group ( It preferably has 6 to 20 carbon atoms, more preferably 6 to 16 carbon atoms, and particularly preferably 6 to 12 carbon atoms, and examples thereof include a phenylthio group.), A sulfonyl group (preferably 1 to 20 carbon atoms, more preferably It preferably has 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a mesyl group and a tosyl group. ), A sulfinyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a methanesulfinyl group and a benzenesulfinyl group). A ureido group (preferably having a carbon number of 1 to 20, more preferably a carbon number of 1 to 16 and particularly preferably a carbon number of 1 to 12, and examples thereof include a ureido group, a methylureido group, a phenylureido group, etc.),
リン酸アミド基(好ましくは炭素数1~20、より好ましくは炭素数1~16、特に好ましくは炭素数1~12であり、例えばジエチルリン酸アミド基、フェニルリン酸アミド基等が挙げられる。)、ヒドロキシ基、メルカプト基、ハロゲン原子(例えばフッ素原子、塩素原子、臭素原子、ヨウ素原子)、シアノ基、スルホ基、カルボキシル基、ニトロ基、ヒドロキサム酸基、スルフィノ基、ヒドラジノ基、イミノ基、ヘテロ環基(好ましくは炭素数1~30、より好ましくは炭素数1~12であり、ヘテロ原子としては、例えば窒素原子、酸素原子、硫黄原子を含むものであり、具体的には、例えばイミダゾリル基、ピリジル基、キノリル基、フリル基、チエニル基、ピペリジル基、モルホリノ基、ベンゾオキサゾリル基、ベンゾイミダゾリル基、ベンゾチアゾリル基、カルバゾリル基、アゼピニル基、オキシラニル等が挙げられる。)、シリル基(好ましくは炭素数3~40、より好ましくは炭素数3~30、特に好ましくは炭素数3~24であり、例えばトリメチルシリル基、トリフェニルシリル基等が挙げられる。)等が挙げられる。 Phosphoric acid amide group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, and examples thereof include a diethylphosphoric acid amide group and a phenylphosphoric acid amide group. ), Hydroxy group, mercapto group, halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), cyano group, sulfo group, carboxyl group, nitro group, hydroxamic acid group, sulfino group, hydrazino group, imino group, Heterocyclic group (preferably having 1 to 30 carbon atoms, more preferably having 1 to 12 carbon atoms, and the hetero atom includes, for example, a nitrogen atom, an oxygen atom and a sulfur atom, and specifically, for example, imidazolyl. Group, pyridyl group, quinolyl group, furyl group, thienyl group, piperidyl group, morpholino group, benzoxazolyl group, benzimidazo Group, benzothiazolyl group, carbazolyl group, azepinyl group, oxiranyl, etc.), silyl group (preferably having 3 to 40 carbon atoms, more preferably 3 to 30 carbon atoms, particularly preferably 3 to 24 carbon atoms) , For example, a trimethylsilyl group, a triphenylsilyl group, etc.) and the like.
 これらの置換基は更に置換されてもよい。また、置換基が二つ以上ある場合は、同一でも異なっていてもよい。また、可能な場合には互いに連結して環を形成していてもよい。 These substituents may be further substituted. When there are two or more substituents, they may be the same or different. If possible, they may be linked to each other to form a ring.
 式(Am-2)のR~R17における置換基として好ましくは、アルキル基、アリール基、アルケニル基、アルキニル基、又は、それらを更に任意に置換した基である。 The substituent in R 4 to R 17 of formula (Am-2) is preferably an alkyl group, an aryl group, an alkenyl group, an alkynyl group, or a group in which any of these is further substituted.
 また、式(Am-2)におけるR~R17は、互いに同一でも異なっていてもよく、互いに結合し環構造を形成してもよい。R~R17は、それぞれL又はR~R17と結合し、環構造を形成してもよい。また、C炭素原子及びC炭素原子が、それぞれC炭素原子及びC炭素原子と二重結合若しくは三重結合を形成する場合、C炭素原子及びC炭素原子がLと二重結合若しくは三重結合を形成する場合、又は、LがC炭素原子とC炭素原子とを連結する二重結合を表す場合には、それに応じて、R~R11は存在しなくてもよい。 In addition, R 4 to R 17 in formula (Am-2) may be the same or different, and may combine with each other to form a ring structure. R 4 to R 17 may be bonded to L 3 or R 4 to R 17 , respectively, to form a ring structure. Also, C 3 carbon atom and C 4 carbon atoms, to form a C 1 carbon atom and C 2 carbon atoms and a double bond or triple bond, respectively, C 3 carbon atom and C 4 carbon atom and L 3 double When a bond or a triple bond is formed or when L 3 represents a double bond connecting a C 3 carbon atom and a C 4 carbon atom, R 4 to R 11 are accordingly absent. Good.
 式(Am-2)におけるm1及びm2が2以上の場合に複数存在するR14及びR17は、互いに同一でも異なっていてもよく、互いに結合して環構造を形成してもよい。
 式(Am-2)におけるn1及びn2はそれぞれ独立に、好ましくは0、1、2又は3であり、より好ましくは0、1又は2であり、特に好ましくは0又は1である。n1及びn2が、2以上である場合に複数存在することになるR12とR13、及び、R15とR16は、互いに同一でも異なっていてもよく、互いに結合して環構造を形成してもよい。
When m1 and m2 in the formula (Am-2) are 2 or more, a plurality of R 14 and R 17 may be the same or different and may be bonded to each other to form a ring structure.
N1 and n2 in formula (Am-2) are each independently preferably 0, 1, 2 or 3, more preferably 0, 1 or 2, and particularly preferably 0 or 1. When n1 and n2 are 2 or more, a plurality of R 12 and R 13 , and R 15 and R 16 may be the same or different, and are bonded to each other to form a ring structure. May be.
 式(Am-2)のLにおける2価の連結基としては、-O-、-S-、-N(RL1)-、-C(RL2)(RL3)-が好適に挙げられる。RL1~RL3としては、水素原子又はR~R17における置換基が挙げられ、これらはそれぞれR~R14のいずれかと結合して環構造を形成してもよい。C及びCとLが二重結合を形成する場合、RL1~RL3は存在しなくてもよい。 Preferable examples of the divalent linking group for L 3 in the formula (Am-2) include —O—, —S—, —N (R L1 ) —, and —C (R L2 ) (R L3 ) —. . Examples of R L1 to R L3 include a hydrogen atom or a substituent in R 4 to R 17 , which may be bonded to any of R 4 to R 14 to form a ring structure. When C 3 and C 4 and L 3 form a double bond, R L1 to R L3 may not be present.
 式(Am-2)のR~R17及びRL1~RL3において、2つの置換基が同一原子に結合している場合、その2つの置換基が互いに同一の原子又は置換基を表し、2重結合を形成してもよい(例:R=R=Oとして、カルボニル基(-CO-)を形成してもよい。)。
 また、式(Am-2)のR~R17及びRL1~RL3において、2つの置換基が隣接する2つの原子に結合している場合、その2つの置換基が互いに同一の原子又は置換基を表し、3員環を形成してもよい。(例:R=R=Oとして、エポキシ基を形成してもよい。)
In R 4 to R 17 and R L1 to R L3 of formula (Am-2), when two substituents are bonded to the same atom, the two substituents represent the same atom or substituent, A double bond may be formed (eg, R 4 ═R 5 ═O, and a carbonyl group (—CO—) may be formed).
Further, in R 4 to R 17 and R L1 to R L3 of the formula (Am-2), when two substituents are bonded to two adjacent atoms, the two substituents are the same atom or It represents a substituent and may form a three-membered ring. (Example: R 4 = R 8 = O, and an epoxy group may be formed.)
 上記第4級アンモニウム塩化合物における第4級アンモニウムカチオンは、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、芳香環を有することが好ましい。
 また、上記第4級アンモニウム塩化合物における第4級アンモニウムカチオン及び対アニオンはそれぞれ、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、芳香環を有することが好ましい。
 また、上記第4級アンモニウム塩化合物における第4級アンモニウムカチオンは、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、脂肪族環構造を有することが好ましく、窒素原子を含む脂肪族環構造を有することがより好ましい。上記脂肪族環としては、5員環~8員環であることが好ましく、5員環又は6員環であることがより好ましく、6員環であることが特に好ましい。
 更に、上記第4級アンモニウム塩化合物における第4級アンモニウムカチオンは、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、芳香環及び脂肪族環を有することが特に好ましい。
The quaternary ammonium cation in the quaternary ammonium salt compound preferably has an aromatic ring from the viewpoint of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained.
Further, the quaternary ammonium cation and the counter anion in the above quaternary ammonium salt compound each preferably have an aromatic ring from the viewpoints of development latitude, post-exposure aging developability, and chemical resistance of the lithographic printing plate obtained. .
The quaternary ammonium cation in the quaternary ammonium salt compound preferably has an alicyclic structure from the viewpoint of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained, and is preferably nitrogen. It is more preferable to have an aliphatic ring structure containing atoms. The aliphatic ring is preferably a 5-membered ring to an 8-membered ring, more preferably a 5-membered ring or a 6-membered ring, and particularly preferably a 6-membered ring.
Further, the quaternary ammonium cation in the quaternary ammonium salt compound preferably has an aromatic ring and an aliphatic ring, from the viewpoints of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained. preferable.
 上記第4級アンモニウム塩化合物における対アニオンは、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、スルホン酸イオン、カルボン酸イオン、ハロゲン原子を有する無機酸イオン、又は、ハロゲン化物イオンであることが好ましく、スルホン酸イオン、ハロゲン原子を有する無機酸イオン、又は、ハロゲン化物イオンであることがより好ましく、スルホン酸イオンであることが特に好ましい。
 また、上記第4級アンモニウム塩化合物における対アニオンは、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、芳香族基を有することが好ましい。
 更に、上記第4級アンモニウム塩化合物における対アニオンは、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、フェノール性水酸基を有することが好ましい。
 また更に、上記第4級アンモニウム塩化合物における対アニオンは、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、ジアリールケトン構造を有することが好ましい。
 中でも、上記第4級アンモニウム塩化合物における対アニオンは、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、フェノール性水酸基及びジアリールケトン構造を有することが特に好ましい。
The counter anion in the quaternary ammonium salt compound is a sulfonate ion, a carboxylate ion, an inorganic acid ion having a halogen atom, from the viewpoint of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained. Alternatively, a halide ion is preferable, a sulfonate ion, an inorganic acid ion having a halogen atom, or a halide ion is more preferable, and a sulfonate ion is particularly preferable.
The counter anion in the quaternary ammonium salt compound preferably has an aromatic group from the viewpoint of development latitude, post-exposure aging developability, and chemical resistance of the lithographic printing plate obtained.
Further, the counter anion in the above quaternary ammonium salt compound preferably has a phenolic hydroxyl group from the viewpoint of development latitude, post-exposure aging developability and chemical resistance of the lithographic printing plate obtained.
Further, the counter anion in the quaternary ammonium salt compound preferably has a diarylketone structure from the viewpoints of development latitude, post-exposure aging developability, and chemical resistance of the lithographic printing plate obtained.
Among them, the counter anion in the quaternary ammonium salt compound preferably has a phenolic hydroxyl group and a diaryl ketone structure from the viewpoints of development latitude, post-exposure aging developability, and chemical resistance of the lithographic printing plate obtained.
 また、上記第4級アンモニウム塩化合物における対アニオンの共役酸(XH)のpKa(酸解離定数)は、5未満であることが好ましく、-10以上5未満であることがより好ましく、-10以上2以下であることが特に好ましい。
 なお、本開示におけるpKaは、水中のpKaであり、Advanced Chemistry Development社製ACD/Labs software Ver 8.0 for Microsoft windowsのACD/pKa DB ver 8.07を使用して計算するものとする。
Further, the pKa (acid dissociation constant) of the conjugate acid (XH) of the counter anion in the quaternary ammonium salt compound is preferably less than 5, more preferably -10 or more and less than 5, and more preferably -10 or more. It is particularly preferably 2 or less.
Note that the pKa in the present disclosure is the pKa in water, and is calculated using ACD / Labs software Ver 8.0 for Microsoft windows ACD / pKa DB ver 8.07 manufactured by Advanced Chemistry Development.
 上記第4級アンモニウム塩化合物における対アニオンとして具体的には、塩化物イオン、臭化物イオン、ヨウ化物イオン、BF 、PF 、トリフルオロメタンスルホン酸イオン、p-トルエンスルホン酸イオン、メタンスルホン酸イオン、又は、下記式(X-1)で表されるアニオンであることが好ましく、下記式(X-1)で表されるアニオンであることが特に好ましい。
 なお、下記式(X-1)で表されるアニオンは、フェノール性水酸基及びジアリールケトン構造を有するアニオンである。
Specific examples of the counter anion in the quaternary ammonium salt compound include chloride ion, bromide ion, iodide ion, BF 4 , PF 6 , trifluoromethanesulfonate ion, p-toluenesulfonate ion, methanesulfone. An acid ion or an anion represented by the following formula (X-1) is preferable, and an anion represented by the following formula (X-1) is particularly preferable.
The anion represented by the following formula (X-1) is an anion having a phenolic hydroxyl group and a diarylketone structure.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 上記第4級アンモニウム塩化合物として、具体的には下記に示す化合物が好ましく挙げられる。 As the above quaternary ammonium salt compound, specifically, the following compounds are preferably exemplified.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 上記第4級アンモニウム塩化合物は、1種単独で用いてもよいし、2種以上を併用してもよい。
 上記第4級アンモニウム塩化合物の含有量は、現像ラチチュード、露光後経時現像性及び得られる平版印刷版の耐薬品性の観点から、画像記録層の全質量に対して、0.1質量%~50質量%が好ましく、0.5質量%~40質量%がより好ましく、1質量%~30質量%が特に好ましい。
The quaternary ammonium salt compounds may be used alone or in combination of two or more.
The content of the quaternary ammonium salt compound is 0.1% by mass to the total mass of the image recording layer from the viewpoints of development latitude, developability after exposure and chemical resistance of the lithographic printing plate obtained. 50 mass% is preferable, 0.5 mass% to 40 mass% is more preferable, and 1 mass% to 30 mass% is particularly preferable.
<他の樹脂>
 本開示に係る平版印刷版原版は、上記画像記録層に、上記アルカリ可溶性樹脂以外の他の樹脂を更に含んでいてもよい。
 本開示において使用される他の樹脂は、従来公知のものであれば特に制限はなく、公知のアルカリ可溶性樹脂を好ましく用いることができる。
 また、他の樹脂としては、下記に示すフェノール樹脂が好ましく使用される。
<Other resins>
In the lithographic printing plate precursor according to the present disclosure, the image recording layer may further contain a resin other than the alkali-soluble resin.
The other resin used in the present disclosure is not particularly limited as long as it is a conventionally known resin, and a known alkali-soluble resin can be preferably used.
Further, as the other resin, the phenol resins shown below are preferably used.
-フェノール樹脂-
 本開示において用いられる他の樹脂は、重量平均分子量が2,000を超えるフェノール樹脂であることが好ましい。重量平均分子量が2,000を超えるフェノール樹脂は、構造単位としてフェノール、あるいは置換フェノール類を含むフェノール樹脂であり、好ましくはノボラック樹脂である。ノボラック樹脂は、平版印刷版原版において、未露光部において強い水素結合性を生起し、露光部において一部の水素結合が容易に解除されるといった点から、本開示における画像記録層に好ましく用いられるアルカリ可溶性樹脂である。
 このノボラック樹脂は、分子内に構造単位としてフェノール類を含むものであれば特に制限はない。
 本開示におけるノボラック樹脂は、フェノール、以下に示される置換フェノール類と、アルデヒド類との縮合反応により得られる樹脂であり、フェノール類としては、具体的には、フェノール、イソプロピルフェノール、t-ブチルフェノール、t-アミルフェノール、ヘキシルフェノール、シクロヘキシルフェノール、3-メチル-4-クロロ-6-t-ブチルフェノール、イソプロピルクレゾール、t-ブチルクレゾール、t-アミルクレゾールが挙げられる。好ましくは、t-ブチルフェノール、t-ブチルクレゾールである。また、アルデヒド類の例としては、ホルムアルデヒド、アセトアルデヒド、アクロレイン、クロトンアルデヒド等の脂肪族及び芳香族アルデヒドが挙げられる。好ましくは、ホルムアルデヒド、アセトアルデヒドである。
 より具体的には、本開示におけるノボラック樹脂しては、例えば、フェノールとホルムアルデヒドとの縮重合体(フェノールホルムアルデヒド樹脂)、m-クレゾールとホルムアルデヒドとの縮重合体(m-クレゾールホルムアルデヒド樹脂)、p-クレゾールとホルムアルデヒドとの縮重合体(p-クレゾールホルムアルデヒド樹脂)、m-/p-混合クレゾールとホルムアルデヒドとの縮重合体(m-/p-混合クレゾールホルムアルデヒド樹脂)、フェノールとクレゾール(m-,p-,又はm-/p-混合のいずれでもよい)とホルムアルデヒドとの縮重合体(フェノール/クレゾール(m-,p-,又はm-/p-混合のいずれでもよい)混合ホルムアルデヒド樹脂)等が挙げられる。
 また、ノボラック樹脂としては、更に、米国特許第4,123,279号明細書に記載されているように、t-ブチルフェノールホルムアルデヒド樹脂、オクチルフェノールホルムアルデヒド樹脂のような、炭素数3~8のアルキル基を置換基として有するフェノールとホルムアルデヒドとの縮重合体が挙げられる。
 これらノボラック樹脂の中でも、特に好ましいものとして、フェノールホルムアルデヒド樹脂、フェノール/クレゾール混合ホルムアルデヒド樹脂が挙げられる。
-Phenolic resin-
The other resin used in the present disclosure is preferably a phenol resin having a weight average molecular weight of more than 2,000. The phenol resin having a weight average molecular weight of more than 2,000 is a phenol resin containing phenol or a substituted phenol as a structural unit, preferably a novolac resin. The novolak resin is preferably used for the image recording layer in the present disclosure, in the lithographic printing plate precursor, since it causes a strong hydrogen bonding property in the unexposed area and a part of the hydrogen bonding is easily released in the exposed area. It is an alkali-soluble resin.
The novolac resin is not particularly limited as long as it contains phenols as a structural unit in the molecule.
The novolac resin in the present disclosure is a resin obtained by a condensation reaction of phenol, a substituted phenol shown below, and an aldehyde. Specific examples of the phenol include phenol, isopropylphenol, t-butylphenol, Examples thereof include t-amylphenol, hexylphenol, cyclohexylphenol, 3-methyl-4-chloro-6-t-butylphenol, isopropylcresol, t-butylcresol and t-amylcresol. Preferred are t-butylphenol and t-butylcresol. In addition, examples of aldehydes include aliphatic and aromatic aldehydes such as formaldehyde, acetaldehyde, acrolein, and crotonaldehyde. Formaldehyde and acetaldehyde are preferable.
More specifically, examples of the novolac resin in the present disclosure include a condensation polymer of phenol and formaldehyde (phenol formaldehyde resin), a condensation polymer of m-cresol and formaldehyde (m-cresol formaldehyde resin), p -Polycondensation polymer of cresol and formaldehyde (p-cresol formaldehyde resin), polycondensation polymer of m- / p-mixed cresol and formaldehyde (m- / p-mixed cresol-formaldehyde resin), phenol and cresol (m-, Condensation polymer of p- or m- / p-mixture) and formaldehyde (phenol / cresol (m-, p-, or m- / p-mixture) mixed formaldehyde resin), etc. Is mentioned.
Further, as the novolac resin, as described in US Pat. No. 4,123,279, an alkyl group having 3 to 8 carbon atoms such as t-butylphenolformaldehyde resin and octylphenolformaldehyde resin is further used. Examples thereof include a condensation polymer of phenol and formaldehyde having a substituent.
Among these novolac resins, phenol formaldehyde resin and phenol / cresol mixed formaldehyde resin are particularly preferable.
 上記フェノール樹脂の重量平均分子量は、好ましくは2,000を超え50,000以下であり、2,500~20,000であることが更に好ましく、3,000~10,000であることが特に好ましい。また、分散度(重量平均分子量/数平均分子量)は、1.1~10であることが好ましい。
 上記数平均分子量は、テトラヒドロフラン(THF)を溶剤とした場合のゲルパーミエーションクロマトグラフィ(GPC)により測定されるポリスチレン換算の数平均分子量である。
 このようなフェノール樹脂は、1種のみを用いてもよく、2種以上を混合して用いてもよい。
The weight average molecular weight of the phenol resin is preferably more than 2,000 and 50,000 or less, more preferably 2,500 to 20,000, and particularly preferably 3,000 to 10,000. . The dispersity (weight average molecular weight / number average molecular weight) is preferably 1.1 to 10.
The number average molecular weight is a polystyrene equivalent number average molecular weight measured by gel permeation chromatography (GPC) when tetrahydrofuran (THF) is used as a solvent.
Such phenolic resins may be used alone or in combination of two or more.
 本開示における画像記録層中の他の樹脂の含有量は、バーニング適性、画像形成性の観点から、上記pKa5以下の酸基を有する樹脂及び特定高分子化合物の総含有量100質量部に対し、90質量部以下であることが好ましく、50質量部以下であることがより好ましく、30質量部以下であることが特に好ましい。
 本開示において、バーニング処理とは、平版印刷版原版の露光及び現像後に行われる高温加熱処理をいい、バーニング適性に優れるとは、上記バーニング処理後の耐刷性に優れることをいう。
The content of the other resin in the image recording layer in the present disclosure is, from the viewpoint of burning suitability and image forming property, 100 parts by mass of the total content of the resin having an acid group of pKa5 or less and the specific polymer compound. The amount is preferably 90 parts by mass or less, more preferably 50 parts by mass or less, and particularly preferably 30 parts by mass or less.
In the present disclosure, the burning treatment means a high-temperature heat treatment performed after exposure and development of the lithographic printing plate precursor, and the excellent burning suitability means excellent printing durability after the burning treatment.
 上記画像形成層には、所望により他の成分を含有してもよい。
 他の成分としては、公知の添加剤を用いることができる。
 以下、上記画像形成層における任意成分である、酸発生剤、酸増殖剤、及び、その他の添加剤について説明する。
The image forming layer may contain other components, if desired.
As other components, known additives can be used.
Hereinafter, the acid generator, the acid multiplying agent, and other additives which are optional components in the image forming layer will be described.
<酸発生剤>
 上記画像記録層は、得られる平版印刷版原版における感度向上の観点から、酸発生剤を含有することが好ましい。
 本開示において酸発生剤とは、光又は熱により酸を発生する化合物であり、赤外線の照射や、100℃以上の加熱によって分解し酸を発生する化合物を指す。発生する酸としては、スルホン酸、塩酸等のpKaが2以下の強酸であることが好ましい。この酸発生剤から発生した酸によって、平版印刷版原版における露光部画像記録層への現像液の浸透性が高くなり、画像記録層のアルカリ水溶液に対する溶解性がより向上するものである。
 上記画像記録層において好適に用いられる酸発生剤としては、国際公開第2016/047392号の段落0116から段落0130に記載の酸発生剤が挙げられる。
 中でも、感度と安定性の観点から、酸発生剤としてオニウム塩化合物を用いることが好ましい。以下、オニウム塩化合物について説明する。
 本開示において好適に用い得るオニウム塩化合物としては、赤外線露光、及び、露光により赤外線吸収剤から発生する熱エネルギーにより分解して酸を発生する化合物として知られる化合物を挙げることができる。本開示に好適なオニウム塩化合物としては、感度の観点から、公知の熱重合開始剤や結合解離エネルギーの小さな結合を有する、以下に述べるオニウム塩構造を有するものを挙げることができる。
 本開示において好適に用いられるオニウム塩化合物としては、公知のジアゾニウム塩、ヨードニウム塩、スルホニウム塩、第1級~第3級アンモニウム塩、ピリジニウム塩、アジニウム塩等が挙げられ、中でも、トリアリールスルホニウム、又は、ジアリールヨードニウムのスルホン酸塩、カルボン酸塩、BF 、PF 、ClO などが好ましい。
 本開示において酸発生剤として用い得るオニウム塩化合物としては、下記式(III)~式(V)で表されるオニウム塩化合物が挙げられる。
<Acid generator>
From the viewpoint of improving the sensitivity of the lithographic printing plate precursor obtained, the image recording layer preferably contains an acid generator.
In the present disclosure, the acid generator is a compound that generates an acid by light or heat, and refers to a compound that decomposes to generate an acid when irradiated with infrared rays or heated at 100 ° C. or higher. The generated acid is preferably a strong acid having a pKa of 2 or less such as sulfonic acid and hydrochloric acid. The acid generated from the acid generator enhances the permeability of the developing solution into the image recording layer in the exposed area of the lithographic printing plate precursor, and further improves the solubility of the image recording layer in the aqueous alkaline solution.
Examples of the acid generator preferably used in the image recording layer include the acid generators described in paragraphs 0116 to 0130 of WO2016 / 047392.
Above all, it is preferable to use an onium salt compound as the acid generator from the viewpoint of sensitivity and stability. The onium salt compound will be described below.
Examples of onium salt compounds that can be suitably used in the present disclosure include compounds known as compounds that generate an acid by being exposed to infrared rays and decomposed by thermal energy generated from the infrared absorber upon exposure. Examples of onium salt compounds suitable for the present disclosure include known thermal polymerization initiators and compounds having an onium salt structure described below having a bond with a small bond dissociation energy from the viewpoint of sensitivity.
Examples of onium salt compounds preferably used in the present disclosure include known diazonium salts, iodonium salts, sulfonium salts, primary to tertiary ammonium salts, pyridinium salts, azinium salts, and the like, among which triarylsulfonium, Alternatively, sulfonate, carboxylate, BF 4 , PF 6 , ClO 4 −, etc. of diaryl iodonium are preferable.
Examples of the onium salt compound that can be used as the acid generator in the present disclosure include onium salt compounds represented by the following formulas (III) to (V).
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 上記式(III)中、Ar11とAr12は、それぞれ独立に、置換基を有していてもよい炭素数20個以下のアリール基を示す。このアリール基が置換基を有する場合の好ましい置換基としては、ハロゲン原子、ニトロ基、炭素数12個以下のアルキル基、炭素数12個以下のアルコキシ基、又は炭素数12個以下のアリールオキシ基が挙げられる。Z11-はハロゲン化物イオン、過塩素酸イオン、テトラフルオロボレートイオン、ヘキサフルオロホスフェートイオン、スルホン酸イオン、及び、ペルフルオロアルキルスルホン酸イオン等フッ素原子を有するスルホン酸イオンよりなる群から選択される対イオンを表し、好ましくは、過塩素酸イオン、ヘキサフルオロホスフェートイオン、アリールスルホン酸イオン、及びペルフルオロアルキルスルホン酸である。
 上記式(IV)中、Ar21は、置換基を有していてもよい炭素数1~20のアリール基を示す。好ましい置換基としては、ハロゲン原子、ニトロ基、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、炭素数1~12のアリールオキシ基、炭素数1~12のアルキルアミノ基、炭素数2~12のジアルキルアミノ基、炭素数6~12のアリールアミノ基又は、ジアリールアミノ基(2つのアリール基の炭素数が、それぞれ独立に、6~12)が挙げられる。Z21-はZ11-と同義の対イオンを表す。
 上記式(V)中、R31、R32及びR33は、それぞれ同じでも異なっていてもよく、置換基を有していてもよい炭素数1~20の炭化水素基を示す。好ましい置換基としては、ハロゲン原子、ニトロ基、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、又は炭素数1~12のアリールオキシ基が挙げられる。Z31-はZ11-と同義の対イオンを表す。
In the above formula (III), Ar 11 and Ar 12 each independently represent an aryl group having 20 or less carbon atoms, which may have a substituent. When the aryl group has a substituent, a preferable substituent is a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or an aryloxy group having 12 or less carbon atoms. Is mentioned. Z 11- is a pair selected from the group consisting of halide ion, perchlorate ion, tetrafluoroborate ion, hexafluorophosphate ion, sulfonate ion, and sulfonate ion having a fluorine atom such as perfluoroalkylsulfonate ion. It represents an ion, and is preferably a perchlorate ion, a hexafluorophosphate ion, an aryl sulfonate ion, and a perfluoroalkyl sulfonic acid.
In the formula (IV), Ar 21 represents an optionally substituted aryl group having 1 to 20 carbon atoms. Preferred substituents are a halogen atom, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aryloxy group having 1 to 12 carbon atoms, an alkylamino group having 1 to 12 carbon atoms, Examples thereof include a dialkylamino group having 2 to 12 carbon atoms, an arylamino group having 6 to 12 carbon atoms, and a diarylamino group (the carbon numbers of two aryl groups are each independently 6 to 12). Z 21- represents a counter ion having the same meaning as Z 11- .
In the above formula (V), R 31 , R 32 and R 33 may be the same or different and each represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. Examples of preferable substituents include a halogen atom, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and an aryloxy group having 1 to 12 carbon atoms. Z 31- represents a counter ion having the same meaning as Z 11- .
 上記画像記録層において、好適に用いることのできるオニウム塩化合物の具体例は、国際公開第2016/047392号の段落0121~段落0124に記載された化合物と同様である。 Specific examples of the onium salt compound that can be preferably used in the image recording layer are the same as the compounds described in paragraphs 0121 to 0124 of International Publication WO2016 / 047392.
 また、上記式(III)~式(V)で表される化合物の別の例としては、特開2008-195018号公報の段落0036~0045において、ラジカル重合開始剤の例として記載の化合物を、本開示に係る酸発生剤として好適に用いることができる。 Further, as another example of the compounds represented by the above formulas (III) to (V), the compounds described as examples of the radical polymerization initiator in paragraphs 0036 to 0045 of JP 2008-195018 can be used. It can be suitably used as the acid generator according to the present disclosure.
 本開示に用いうる酸発生剤のより好ましい例として、下記化合物(PAG-1)~(PAG-5)が挙げられる。Meはメチル基を表す。 More preferred examples of the acid generator usable in the present disclosure include the following compounds (PAG-1) to (PAG-5). Me represents a methyl group.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 これらの酸発生剤を本開示における画像記録層中に含有させる場合、これらの化合物は単独で使用してもよく、また2種以上を組み合わせて使用してもよい。
 酸発生剤の含有量は、画像記録層の全質量に対し、0.01質量%~50質量%であることが好ましく、0.1質量%~40質量%がより好ましく、0.5質量%~30質量%が更に好ましい。含有量が上記範囲において、酸発生剤添加の効果である感度の向上が見られると共に、非画像部における残膜の発生が抑制される。
When these acid generators are contained in the image recording layer in the present disclosure, these compounds may be used alone or in combination of two or more kinds.
The content of the acid generator is preferably 0.01% by mass to 50% by mass, more preferably 0.1% by mass to 40% by mass, and 0.5% by mass with respect to the total mass of the image recording layer. More preferably, it is from about 30% by mass. When the content is within the above range, the sensitivity, which is an effect of the addition of the acid generator, is improved, and the generation of the residual film in the non-image area is suppressed.
<酸増殖剤>
 本開示における画像記録層は、酸増殖剤を含有してもよい。本開示における酸増殖剤とは、比較的に強い酸の残基で置換された化合物であって、酸触媒の存在下で容易に脱離して新たに酸を発生する化合物である。すなわち、酸触媒反応によって分解し、再び酸を発生する。1反応で1つ以上の酸が増えており、反応の進行に伴って加速的に酸濃度が増加することにより、飛躍的に感度が向上する。この発生する酸の強度は、酸解離定数(pKa)として3以下であることが好ましく、2以下であることがより好ましい。酸解離定数として3以下であれば、酸触媒による脱離反応を引き起こしやすい。
 このような酸触媒に使用される酸としては、ジクロロ酢酸、トリクロロ酢酸、メタンスルホン酸、エタンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸、ナフタレンスルホン酸、フェニルスルホン酸等が挙げられる。
<Acid multiplying agent>
The image recording layer in the present disclosure may contain an acid multiplying agent. The acid multiplying agent in the present disclosure is a compound substituted with a residue of a relatively strong acid, and is a compound which is easily eliminated in the presence of an acid catalyst to newly generate an acid. That is, it decomposes by an acid-catalyzed reaction to generate an acid again. One or more acids are increased in one reaction, and the acid concentration is accelerated as the reaction progresses, so that the sensitivity is dramatically improved. The strength of the generated acid is preferably 3 or less as an acid dissociation constant (pKa), and more preferably 2 or less. When the acid dissociation constant is 3 or less, the elimination reaction by the acid catalyst is likely to occur.
Examples of the acid used for such an acid catalyst include dichloroacetic acid, trichloroacetic acid, methanesulfonic acid, ethanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid and phenylsulfonic acid.
 使用可能な酸増殖剤は、国際公開第2016/047392号の段落0133から段落0135に記載されたものと同様である。 The usable acid multiplying agent is the same as those described in paragraphs 0133 to 0135 of WO 2016/047392.
 これらの酸増殖剤を画像記録層中に添加する場合の含有量としては、画像記録層の全質量に対し、0.01質量%~20質量%が好ましく、0.01質量%~10質量%がより好ましく、0.1質量%~5質量%が更に好ましい。酸増殖剤の含有量が上記範囲において、酸増殖剤を添加する効果が充分に得られ、感度向上が達成されるともに、画像部の膜強度低下が抑制される。 When the acid proliferating agent is added to the image recording layer, the content thereof is preferably 0.01% by mass to 20% by mass, and 0.01% by mass to 10% by mass based on the total mass of the image recording layer. Is more preferable, and 0.1% by mass to 5% by mass is further preferable. When the content of the acid proliferating agent is in the above range, the effect of adding the acid proliferating agent is sufficiently obtained, the sensitivity is improved, and the reduction of the film strength of the image area is suppressed.
<その他の添加剤>
 本開示における画像記録層は、その他の添加剤として、現像促進剤、界面活性剤、焼き出し剤、着色剤、可塑剤、ワックス剤等を含んでもよい。
<Other additives>
The image recording layer in the present disclosure may contain a development accelerator, a surfactant, a printout agent, a colorant, a plasticizer, a wax agent, etc. as other additives.
-現像促進剤-
 本開示における画像記録層には、感度を向上させる目的で、酸無水物類、フェノール類、有機酸類を添加してもよい。
 酸無水物類としては環状酸無水物が好ましく、具体的に環状酸無水物としては、米国特許第4,115,128号明細書に記載されている無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、3,6-エンドオキシテトラヒドロ無水フタル酸、テトラクロロ無水フタル酸、無水マレイン酸、クロロ無水マレイン酸、α-フェニル無水マレイン酸、無水コハク酸、無水ピロメリット酸などが使用できる。非環状の酸無水物としては、無水酢酸などが挙げられる。
 フェノール類としては、ビスフェノールA、2,2’-ビスヒドロキシスルホン、p-ニトロフェノール、p-エトキシフェノール、2,4,4’-トリヒドロキシベンゾフェノン、2,3,4-トリヒドロキシベンゾフェノン、4-ヒドロキシベンゾフェノン、4,4’,4”-トリヒドロキシトリフェニルメタン、4,4’,3”,4”-テトラヒドロキシ-3,5,3’,5’-テトラメチルトリフェニルメタンなどが挙げられる。
 有機酸類としては、特開昭60-88942号公報、特開平2-96755号公報などに記載されており、具体的には、p-トルエンスルホン酸、ドデシルベンゼンスルホン酸、p-トルエンスルフィン酸、エチル硫酸、フェニルホスホン酸、フェニルホスフィン酸、リン酸フェニル、リン酸ジフェニル、安息香酸、イソフタル酸、アジピン酸、p-トルイル酸、3,4-ジメトキシ安息香酸、フタル酸、テレフタル酸、4-シクロヘキセン-1,2-ジカルボン酸、エルカ酸、ラウリン酸、n-ウンデカン酸、アスコルビン酸などが挙げられる。上記の酸無水物、フェノール類及び有機酸類の画像記録層の全質量に占める割合は、0.05質量%~20質量%が好ましく、0.1質量%~15質量%がより好ましく、0.1質量%~10質量%が特に好ましい。
-Development accelerator-
An acid anhydride, a phenol, or an organic acid may be added to the image recording layer in the present disclosure for the purpose of improving sensitivity.
Cyclic acid anhydrides are preferred as the acid anhydrides, and specific examples of the cyclic acid anhydrides include phthalic anhydride, tetrahydrophthalic anhydride, and hexahydroanhydride described in US Pat. No. 4,115,128. Phthalic acid, 3,6-endooxytetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, α-phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride and the like can be used. Acetic anhydride etc. are mentioned as an acyclic acid anhydride.
Examples of phenols include bisphenol A, 2,2′-bishydroxysulfone, p-nitrophenol, p-ethoxyphenol, 2,4,4′-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 4- Examples include hydroxybenzophenone, 4,4 ', 4 "-trihydroxytriphenylmethane, 4,4', 3", 4 "-tetrahydroxy-3,5,3 ', 5'-tetramethyltriphenylmethane. .
Organic acids are described in JP-A-60-88942, JP-A-2-96755, and the like. Specifically, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, Ethyl sulfuric acid, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene Examples include -1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid. The proportion of the above-mentioned acid anhydride, phenols and organic acids in the total mass of the image recording layer is preferably 0.05% by mass to 20% by mass, more preferably 0.1% by mass to 15% by mass, and 0.1% by mass. 1% by mass to 10% by mass is particularly preferable.
-界面活性剤-
 本開示における画像記録層には、塗布性を良化するため、また、現像条件に対する処理の安定性を広げるため、特開昭62-251740号公報や特開平3-208514号公報に記載されているような非イオン界面活性剤、特開昭59-121044号公報、特開平4-13149号公報に記載されているような両性界面活性剤、特開昭62-170950号公報、特開平11-288093号公報、特開2003-57820号公報に記載されているようなフッ素含有のモノマー共重合体を添加することができる。
 非イオン界面活性剤の具体例としては、ソルビタントリステアレート、ソルビタンモノパルミテート、ソルビタントリオレート、ステアリン酸モノグリセリド、ポリオキシエチレンノニルフェニルエーテル等が挙げられる。
 両性活性剤の具体例としては、アルキルジ(アミノエチル)グリシン、アルキルポリアミノエチルグリシン塩酸塩、2-アルキル-N-カルボキシエチル-N-ヒドロキシエチルイミダゾリニウムベタインやN-テトラデシル-N,N-ベタイン型(例えば、商品名「アモーゲンK」:第一工業製薬(株)製)等が挙げられる。
 界面活性剤の画像記録層の全質量に占める割合は、0.01質量%~15質量%が好ましく、0.01質量%~5質量%がより好ましく、0.05質量%~2.0質量%が更に好ましい。
-Surfactant-
The image recording layer in the present disclosure is described in JP-A-62-251740 and JP-A-3-208514 in order to improve the coating property and to broaden the stability of processing under developing conditions. Such nonionic surfactants, amphoteric surfactants as described in JP-A-59-121044 and JP-A-4-13149, JP-A-62-170950, JP-A-11- Fluorine-containing monomer copolymers as described in JP-A-288093 and JP-A-2003-57820 can be added.
Specific examples of the nonionic surfactant include sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride and polyoxyethylene nonylphenyl ether.
Specific examples of the amphoteric activator include alkyldi (aminoethyl) glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethylimidazolinium betaine and N-tetradecyl-N, N-betaine. Molds (for example, trade name “Amorgen K”: manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.) and the like.
The ratio of the surfactant to the total mass of the image recording layer is preferably 0.01% by mass to 15% by mass, more preferably 0.01% by mass to 5% by mass, and 0.05% by mass to 2.0% by mass. % Is more preferable.
-焼出し剤/着色剤-
 上記画像記録層には、露光による加熱後直ちに可視像を得るための焼出し剤や、画像着色剤としての染料や顔料を加えることができる。
 焼出し剤及び着色剤としては、例えば、特開2009-229917号公報の段落0122~0123に詳細に記載され、ここに記載の化合物を本開示においても適用しうる。
 焼出し剤及び着色剤は、画像記録層の全質量に対し、0.01質量%~10質量%の割合で添加することが好ましく、0.1質量%~3質量%の割合で添加することがより好ましい。
-Bakeout agent / colorant-
A printout agent for obtaining a visible image immediately after heating by exposure and a dye or pigment as an image colorant can be added to the image recording layer.
Examples of the print-out agent and the colorant are described in detail in paragraphs 0122 to 0123 of JP 2009-229917 A, and the compounds described therein can be applied to the present disclosure.
The print-out agent and the colorant are preferably added in a proportion of 0.01% by mass to 10% by mass, and in a ratio of 0.1% by mass to 3% by mass, based on the total mass of the image recording layer. Is more preferable.
-可塑剤-
 上記画像記録層には、塗膜の柔軟性等を付与するために可塑剤を添加してもよい。例えば、ブチルフタリル、ポリエチレングリコール、クエン酸トリブチル、フタル酸ジエチル、フタル酸ジブチル、フタル酸ジヘキシル、フタル酸ジオクチル、リン酸トリクレジル、リン酸トリブチル、リン酸トリオクチル、オレイン酸テトラヒドロフルフリル、アクリル酸又はメタクリル酸のオリゴマー及びポリマー等が用いられる。
 これらの可塑剤は、画像記録層の全質量に対し、0.5質量%~10質量%の割合で添加することが好ましく、1.0質量%~5質量%の割合で添加することがより好ましい。
-Plasticizer-
A plasticizer may be added to the image recording layer in order to impart flexibility to the coating film. For example, butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, acrylic acid or methacrylic acid. Oligomers and polymers are used.
These plasticizers are preferably added in a proportion of 0.5% by mass to 10% by mass, more preferably 1.0% by mass to 5% by mass, based on the total mass of the image recording layer. preferable.
-ワックス剤-
 上記画像記録層には、傷に対する抵抗性を付与する目的で、表面の静摩擦係数を低下させる化合物を添加することもできる。具体的には、米国特許第6,117,913号明細書、特開2003-149799号公報、特開2003-302750号公報、又は、特開2004-12770号公報に記載されているような、長鎖アルキルカルボン酸のエステルを有する化合物などを挙げることができる。
 ワックス剤の含有量としては、画像記録層の全質量中に占める割合が、0.1質量%~10質量%であることが好ましく、0.5質量%~5質量%であることがより好ましい。
-Wax agent-
A compound that reduces the coefficient of static friction of the surface may be added to the image recording layer for the purpose of imparting resistance to scratches. Specifically, as described in US Pat. No. 6,117,913, JP-A 2003-149799, JP-A 2003-302750, or JP-A 2004-12770, Examples thereof include compounds having an ester of a long-chain alkylcarboxylic acid.
The content of the wax agent is preferably 0.1% by mass to 10% by mass, more preferably 0.5% by mass to 5% by mass, based on the total mass of the image recording layer. .
<下層及び上層>
 また、上記画像記録層は、上層及び下層を有することが好ましく、支持体上に下層及び上層をこの順に配設した画像記録層(以下、「2層構造の平版印刷版原版」ともいう。)であることがより好ましい。
 下層及び上層は、2つの層を分離して形成することが好ましい。
 2つの層を分離して形成する方法としては、例えば、下層に含まれる成分と、上層に含まれる成分との溶剤溶解性の差を利用する方法、又は、上層を塗布した後、急速に溶剤を乾燥、除去する方法等が挙げられる。後者の方法を併用することにより、層間の分離が一層良好に行われることになるため好ましい。
 上記式(1)で表される構成単位と側鎖にフェノール性水酸基を有する構成単位と上記式(2)で表される構成単位とを有するアルカリ可溶性樹脂、赤外線吸収剤、及び、第4級アンモニウム塩化合物は、下層又は上層のいずれかに含まれていればよいが、耐刷性及び耐傷性の観点から、上層が、赤外線吸収剤、並びに、第4級アンモニウム塩化合物を少なくとも含み、かつ、下層が、上記式(1)で表される構成単位と側鎖にフェノール性水酸基を有する構成単位と上記式(2)で表される構成単位とを有するアルカリ可溶性樹脂を少なくとも含むことが好ましい。
 上層における赤外線吸収剤の含有量は、現像ラチチュード及び露光後経時現像性の観点から、0.01g/m以上1.0g/m以下であることが好ましく、0.02g/m以上0.50g/m以下であることがより好ましく、0.07g/m以上0.19g/m以下であることが特に好ましい。
 また、上層における上記第4級アンモニウム塩化合物の含有量は、現像ラチチュード及び露光後経時現像性の観点から、0.01g/m以上0.40g/m以下であることが好ましく、0.02g/m以上0.20g/m以下であることがより好ましく、0.06g/m以上0.10g/m以下であることが特に好ましい。
 下層における上記アルカリ可溶性樹脂の含有量は、現像ラチチュード及び露光後経時現像性の観点から、0.1g/m以上10.0g/m以下であることが好ましく、0.5g/m以上4.0g/m以下であることがより好ましく、1.40g/m以上2.40g/m以下であることが特に好ましい。
 以下、これらの方法について詳述するが、2つの層を分離して塗布する方法はこれらに限定されるものではない。
<Lower layer and upper layer>
Further, the image recording layer preferably has an upper layer and a lower layer, and an image recording layer in which the lower layer and the upper layer are arranged in this order on a support (hereinafter, also referred to as a “lithographic printing plate precursor having a two-layer structure”). Is more preferable.
The lower layer and the upper layer are preferably formed by separating the two layers.
As a method of forming the two layers separately, for example, a method of utilizing a difference in solvent solubility between a component contained in the lower layer and a component contained in the upper layer, or a method of applying a solvent rapidly after coating the upper layer Examples of the method include drying and removing. It is preferable to use the latter method together because the separation between layers can be more favorably performed.
Alkali-soluble resin having a constitutional unit represented by the above formula (1), a constitutional unit having a phenolic hydroxyl group in a side chain, and a constitutional unit represented by the above formula (2), an infrared absorbing agent, and a quaternary The ammonium salt compound may be contained in either the lower layer or the upper layer, but from the viewpoint of printing durability and scratch resistance, the upper layer contains at least an infrared absorbing agent, and a quaternary ammonium salt compound, and The lower layer preferably contains at least an alkali-soluble resin having a constitutional unit represented by the above formula (1), a constitutional unit having a phenolic hydroxyl group in a side chain, and a constitutional unit represented by the above formula (2). .
The content of the infrared absorber in the upper layer is preferably 0.01 g / m 2 or more and 1.0 g / m 2 or less, and 0.02 g / m 2 or more 0 from the viewpoint of development latitude and post-exposure aging developability. more preferably .50g / m 2 or less, and particularly preferably 0.07 g / m 2 or more 0.19 g / m 2 or less.
The content of the quaternary ammonium salt compound in the upper layer is preferably 0.01 g / m 2 or more and 0.40 g / m 2 or less from the viewpoint of development latitude and post-exposure aging developability. more preferably 02G / m 2 or more 0.20 g / m 2 or less, particularly preferably 0.06 g / m 2 or more 0.10 g / m 2 or less.
The content of the alkali-soluble resin in the lower layer is preferably 0.1 g / m 2 or more and 10.0 g / m 2 or less, and 0.5 g / m 2 or more, from the viewpoint of development latitude and post-exposure aging developability. more preferably 4.0 g / m 2 or less, particularly preferably 1.40 g / m 2 or more 2.40 g / m 2 or less.
Hereinafter, these methods will be described in detail, but the method of separating and applying the two layers is not limited thereto.
 下層に含まれる成分と上層に含まれる成分との溶剤溶解性の差を利用する方法としては、上層用塗布液を塗布する際に、下層に含まれる成分のいずれもが不溶な溶剤系を用いるものである。これにより、二層塗布を行っても、各層を明確に分離して塗膜にすることが可能になる。例えば、下層成分として、上層成分であるアルカリ可溶性樹脂を溶解するメチルエチルケトンや1-メトキシ-2-プロパノール等の溶剤に不溶な成分を選択し、上記下層成分を溶解する溶剤系を用いて下層を塗布、乾燥し、その後、アルカリ可溶性樹脂を主体とする上層をメチルエチルケトンや1-メトキシ-2-プロパノール等で溶解し、塗布、乾燥することにより二層化が可能になる。 As a method of utilizing the difference in solvent solubility between the component contained in the lower layer and the component contained in the upper layer, a solvent system in which none of the components contained in the lower layer is insoluble is used when the coating liquid for the upper layer is applied. It is a thing. As a result, even if two-layer coating is performed, each layer can be clearly separated to form a coating film. For example, as the lower layer component, a component insoluble in a solvent such as methyl ethyl ketone or 1-methoxy-2-propanol that dissolves the upper layer component alkali-soluble resin is selected, and the lower layer is coated using a solvent system that dissolves the lower layer component. After drying, the upper layer mainly composed of the alkali-soluble resin is dissolved with methyl ethyl ketone, 1-methoxy-2-propanol or the like, and the resulting layer is coated and dried to form a double layer.
 次に、2層目(上層)を塗布後に、極めて速く溶剤を乾燥させる方法としては、ウェブの走行方向に対してほぼ直角に設置したスリットノズルより高圧エアーを吹きつけることや、蒸気等の加熱媒体を内部に供給されたロール(加熱ロール)よりウェブの下面から伝導熱として熱エネルギーを与えること、あるいはそれらを組み合わせることにより達成できる。 Next, as a method for drying the solvent extremely quickly after applying the second layer (upper layer), high-pressure air is blown from a slit nozzle installed almost at right angles to the running direction of the web, or heating with steam or the like. This can be achieved by applying heat energy as conduction heat from the lower surface of the web from a roll (heating roll) that is internally supplied with the medium, or by combining them.
 本開示に係る平版印刷版原版の支持体上に塗布される下層成分の乾燥後の塗布量は、0.5g/m~4.0g/mの範囲にあることが好ましく、0.6g/m~2.5g/mの範囲にあることがより好ましい。0.5g/m以上であると、耐刷性に優れ、4.0g/m以下であると、画像再現性及び感度に優れる。
 また、上層成分の乾燥後の塗布量は、0.05g/m~1.0g/mの範囲にあることが好ましく、0.08g/m~0.7g/mの範囲であることがより好ましい。0.05g/m以上であると、現像ラチチュード、及び、耐傷性に優れ、1.0g/m以下であると、感度に優れる。
 下層及び上層を合わせた乾燥後の塗布量としては、0.6g/m~4.0g/mの範囲にあることが好ましく、0.7g/m~2.5g/mの範囲にあることがより好ましい。0.6g/m以上であると、耐刷性に優れ、4.0g/m以下であると、画像再現性及び感度に優れる。
The coating amount of the lower layer component coated on the support of the lithographic printing plate precursor according to the present disclosure after drying is preferably in the range of 0.5 g / m 2 to 4.0 g / m 2 , and is 0.6 g. / M 2 to 2.5 g / m 2 is more preferable. When it is 0.5 g / m 2 or more, printing durability is excellent, and when it is 4.0 g / m 2 or less, image reproducibility and sensitivity are excellent.
The coating amount after drying of the upper layer component is preferably in the range of 0.05g / m 2 ~ 1.0g / m 2, in the range of 0.08g / m 2 ~ 0.7g / m 2 Is more preferable. If it is 0.05 g / m 2 or more, development latitude, and excellent scratch resistance, if it is 1.0 g / m 2 or less, excellent sensitivity.
The combined coating amount of the lower layer and the upper layer after drying is preferably in the range of 0.6 g / m 2 to 4.0 g / m 2 , and in the range of 0.7 g / m 2 to 2.5 g / m 2 . Is more preferable. When it is 0.6 g / m 2 or more, printing durability is excellent, and when it is 4.0 g / m 2 or less, image reproducibility and sensitivity are excellent.
〔支持体〕
 本開示に係る平版印刷版原版に使用される支持体としては、必要な強度と耐久性を備えた寸度的に安定な板状物であれば特に制限はなく、例えば、紙、プラスチック(例えば、ポリエチレン、ポリプロピレン、ポリスチレン等)がラミネートされた紙、金属板(例えば、アルミニウム、亜鉛、銅等)、プラスチックフィルム(例えば、二酢酸セルロース、三酢酸セルロース、プロピオン酸セルロース、酪酸セルロース、酢酸酪酸セルロース、硝酸セルロース、ポリエチレンテレフタレート、ポリエチレン、ポリスチレン、ポリプロピレン、ポリカーボネート、ポリビニルアセタール等)、上記の如き金属がラミネート若しくは蒸着された紙、又は、プラスチックフィルム等が挙げられる。
[Support]
The support used in the lithographic printing plate precursor according to the present disclosure is not particularly limited as long as it is a dimensionally stable plate-like material having necessary strength and durability, and for example, paper, plastic (for example, , Polyethylene, polypropylene, polystyrene, etc.) laminated paper, metal plate (eg, aluminum, zinc, copper, etc.), plastic film (eg, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate) , Cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.), a paper laminated with or vapor-deposited with the above metals, or a plastic film.
 上記支持体としては、ポリエステルフィルム又はアルミニウム板が好ましく、その中でも寸度安定性がよく、比較的安価であるアルミニウム板は特に好ましい。好適なアルミニウム板は、純アルミニウム板及びアルミニウムを主成分とし、微量の異元素を含む合金板であり、更にアルミニウムがラミネート又は蒸着されたプラスチックフィルムでもよい。アルミニウム合金に含まれる異元素には、ケイ素、鉄、マンガン、銅、マグネシウム、クロム、亜鉛、ビスマス、ニッケル、チタンなどがある。合金中の異元素の含有量は10質量%以下であることが好ましい。 As the above support, a polyester film or an aluminum plate is preferable, and among them, an aluminum plate which has good dimensional stability and is relatively inexpensive is particularly preferable. A suitable aluminum plate is a pure aluminum plate or an alloy plate containing aluminum as a main component and containing a trace amount of a foreign element, and may be a plastic film on which aluminum is laminated or vapor-deposited. The foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel and titanium. The content of the foreign element in the alloy is preferably 10 mass% or less.
 本開示において特に好適なアルミニウムは、純アルミニウムであるが、完全に純粋なアルミニウムは精錬技術上製造が困難であるので、僅かに異元素を含有するものでもよい。
 このように本開示に適用されるアルミニウム板は、その組成が特定されるものではなく、従来より公知公用の素材のアルミニウム板を適宜に利用することができる。本開示において用いられるアルミニウム板の厚みは、0.1mm~0.6mmであることが好ましく、0.15mm~0.4mmであることがより好ましく、0.2mm~0.3mmであることが特に好ましい。
Aluminum which is particularly suitable in the present disclosure is pure aluminum, but completely pure aluminum is difficult to produce due to refining technology, and thus may contain slightly different elements.
As described above, the composition of the aluminum plate applied to the present disclosure is not specified, and an aluminum plate of a publicly known and publicly known material can be appropriately used. The aluminum plate used in the present disclosure preferably has a thickness of 0.1 mm to 0.6 mm, more preferably 0.15 mm to 0.4 mm, and particularly preferably 0.2 mm to 0.3 mm. preferable.
 このようなアルミニウム板には、必要に応じて粗面化処理、陽極酸化処理などの表面処理を行ってもよい。アルミニウム支持体の表面処理については、例えば、特開2009-175195号公報の段落0167~0169に詳細に記載されるような、界面活性剤、有機溶剤又はアルカリ性水溶液などによる脱脂処理、表面の粗面化処理、陽極酸化処理などが適宜、施される。
 陽極酸化処理を施されたアルミニウム表面は、必要により親水化処理が施される。
 親水化処理としては、2009-175195号公報の段落0169に開示されているような、アルカリ金属シリケート(例えばケイ酸ナトリウム水溶液)法、フッ化ジルコン酸カリウムあるいは、ポリビニルホスホン酸で処理する方法などが用いられる。
 また、特開2011-245844号公報に記載された支持体も好ましく用いられる。
Such aluminum plate may be subjected to surface treatment such as surface roughening treatment and anodizing treatment, if necessary. Regarding the surface treatment of the aluminum support, for example, a degreasing treatment with a surfactant, an organic solvent or an alkaline aqueous solution, a rough surface as described in paragraphs 0167 to 0169 of JP2009-175195A Chemical treatment, anodization treatment, etc. are appropriately performed.
The aluminum surface that has been subjected to the anodizing treatment is optionally subjected to a hydrophilic treatment.
Examples of the hydrophilic treatment include an alkali metal silicate (for example, sodium silicate aqueous solution) method, a treatment with potassium fluorozirconate, or polyvinylphosphonic acid as disclosed in paragraph 0169 of 2009-175195. Used.
Further, the support described in JP 2011-245844 A is also preferably used.
〔下塗層〕
 本開示に係る平版印刷版原版は、必要に応じて、支持体と画像形成層との間に、下塗層を設けることができる。
 下塗層成分としては、種々の有機化合物が用いられ、例えば、カルボキシメチルセルロース、デキストリン等のアミノ基を有するホスホン酸類、有機ホスホン酸、有機リン酸、有機ホスフィン酸、アミノ酸類、並びに、ヒドロキシ基を有するアミンの塩酸塩等が好ましく挙げられる。また、これら下塗層成分は、1種単独で用いても、2種以上混合して用いてもよい。下塗層に使用される化合物の詳細、下塗層の形成方法は、特開2009-175195号公報の段落0171~0172に記載され、これらの記載は本開示にも適用される。
 下塗層の被覆量は、2mg/m~200mg/mであることが好ましく、5mg/m~100mg/mであることがより好ましい。被覆量が上記範囲であると、十分な耐刷性能が得られる。
[Undercoat layer]
In the lithographic printing plate precursor according to the present disclosure, an undercoat layer can be provided between the support and the image forming layer, if necessary.
As the undercoat layer component, various organic compounds are used, for example, carboxymethyl cellulose, phosphonic acids having an amino group such as dextrin, organic phosphonic acid, organic phosphoric acid, organic phosphinic acid, amino acids, and a hydroxy group. Preferable examples are the hydrochlorides of the amines that it has. These undercoat layer components may be used alone or in combination of two or more. Details of the compound used for the undercoat layer and the method for forming the undercoat layer are described in paragraphs 0171 to 0172 of JP2009-175195A, and these descriptions also apply to the present disclosure.
The coating amount of the undercoat layer is preferably 2 mg / m 2 to 200 mg / m 2 , and more preferably 5 mg / m 2 to 100 mg / m 2 . When the coating amount is within the above range, sufficient printing durability can be obtained.
〔バックコート層〕
 本開示に係る平版印刷版原版における上記支持体の上記画像記録層が設けられた側とは反対の面には、必要に応じてバックコート層が設けられることが好ましい。かかるバックコート層としては、特開平5-45885号公報記載の有機高分子化合物及び特開平6-35174号公報記載の有機又は無機金属化合物を加水分解及び重縮合させて得られる金属酸化物からなる被覆層が好ましく用いられる。これらの被覆層のうち、Si(OCH、Si(OC、Si(OC、Si(OCなどのケイ素のアルコキシ化合物が安価で入手し易く、それから得られる金属酸化物の被覆層が耐現像液に優れており特に好ましい。
[Backcoat layer]
In the planographic printing plate precursor according to the present disclosure, a back coat layer is preferably provided on the surface of the support opposite to the side on which the image recording layer is provided, if necessary. The back coat layer is composed of an organic polymer compound described in JP-A-5-45885 and a metal oxide obtained by hydrolyzing and polycondensing an organic or inorganic metal compound described in JP-A-6-35174. A coating layer is preferably used. Among these coating layers, silicon alkoxy compounds such as Si (OCH 3 ) 4 , Si (OC 2 H 5 ) 4 , Si (OC 3 H 7 ) 4 and Si (OC 4 H 9 ) 4 are inexpensively available. It is particularly preferable because the coating layer of the metal oxide obtained therefrom is excellent in the resistance to developing solution.
(平版印刷版の作製方法)
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光する露光工程、及び、現像液を用いて現像する現像工程、をこの順で含む。
 上記現像液としては、シリケートカスの抑制の観点から、pH9以上のアルカリ現像液であることが好ましい。
 また、本開示に係る平版印刷版の作製方法は、シリケートカスの抑制の観点から、本開示に係る平版印刷版原版を赤外線レーザーを用いて画像様に露光する工程、及び、シリケート化合物を含まないpH9以上のアルカリ現像液を用いて現像する工程を含むことが好ましい。
 以下、本開示に係る平版印刷版の作製方法の各工程について詳細に説明する。
(Method of preparing lithographic printing plate)
The method for producing a lithographic printing plate according to the present disclosure includes an exposure step of exposing the lithographic printing plate precursor according to the present disclosure in an imagewise manner, and a developing step of developing with a developing solution in this order.
The developer is preferably an alkali developer having a pH of 9 or more from the viewpoint of suppressing silicate debris.
Further, the method for producing a lithographic printing plate according to the present disclosure, from the viewpoint of suppressing silicate residue, a step of imagewise exposing the lithographic printing plate precursor according to the present disclosure using an infrared laser, and does not include a silicate compound. It is preferable to include a step of developing using an alkaline developer having a pH of 9 or more.
Hereinafter, each step of the method for producing a lithographic printing plate according to the present disclosure will be described in detail.
<露光工程>
 本開示に係る平版印刷版の作製方法は、本開示に係る平版印刷版原版を画像様に露光する露光工程を含む。
 本開示に係る平版印刷版原版の画像露光に用いられる活性光線の光源としては、近赤外から赤外領域に発光波長を持つ光源が好ましく、固体レーザー、半導体レーザーがより好ましい。中でも、本開示においては、波長750nm~1,400nmの赤外線を放射する固体レーザー又は半導体レーザーにより画像露光されることが特に好ましい。
 レーザーの出力は、100mW以上が好ましく、露光時間を短縮するため、マルチビームレーザデバイスを用いることが好ましい。また、1画素あたりの露光時間は20μ秒以内であることが好ましい。
 平版印刷版原版に照射されるエネルギーは、10mJ/cm~300mJ/cmであることが好ましい。上記範囲であると、レーザーアブレーションを抑制し、画像が損傷を防ぐことができる。
<Exposure process>
The method for producing a lithographic printing plate according to the present disclosure includes an exposure step of imagewise exposing the lithographic printing plate precursor according to the present disclosure.
As a light source of actinic rays used for image exposure of the lithographic printing plate precursor according to the present disclosure, a light source having an emission wavelength in the near infrared to infrared region is preferable, and a solid laser and a semiconductor laser are more preferable. Among them, in the present disclosure, it is particularly preferable to perform image exposure with a solid-state laser or semiconductor laser that emits infrared rays having a wavelength of 750 nm to 1,400 nm.
The laser output is preferably 100 mW or more, and it is preferable to use a multi-beam laser device in order to shorten the exposure time. The exposure time per pixel is preferably within 20 μsec.
The energy applied to the lithographic printing plate precursor is preferably 10 mJ / cm 2 to 300 mJ / cm 2 . Within the above range, laser ablation can be suppressed and the image can be prevented from being damaged.
 本開示における露光は、光源の光ビームをオーバーラップさせて露光することができる。オーバーラップとは、副走査ピッチ幅がビーム径より小さいことをいう。オーバーラップは、例えば、ビーム径をビーム強度の半値幅(FWHM)で表したとき、FWHM/副走査ピッチ幅(オーバーラップ係数)で定量的に表現することができる。本開示ではこのオーバーラップ係数が、0.1以上であることが好ましい。 The exposure in the present disclosure can be performed by overlapping the light beams of the light source. The overlap means that the sub-scanning pitch width is smaller than the beam diameter. The overlap can be quantitatively expressed by FWHM / sub-scanning pitch width (overlap coefficient) when the beam diameter is expressed by the full width at half maximum (FWHM) of the beam intensity. In the present disclosure, this overlap coefficient is preferably 0.1 or more.
 本開示において使用することができる露光装置の光源の走査方式は、特に限定はなく、円筒外面走査方式、円筒内面走査方式、平面走査方式などを用いることができる。また、光源のチャンネルは単チャンネルでもマルチチャンネルでもよいが、円筒外面方式の場合にはマルチチャンネルが好ましく用いられる。 The light source scanning method of the exposure apparatus that can be used in the present disclosure is not particularly limited, and a cylinder outer surface scanning method, a cylinder inner surface scanning method, a flat surface scanning method, or the like can be used. The light source channel may be a single channel or a multi-channel, but in the case of the cylindrical outer surface system, the multi-channel is preferably used.
<現像工程>
 本開示に係る平版印刷版の作製方法は、現像液を用いて現像する現像工程を含む。
 現像工程に使用される現像液は、pH9以上のアルカリ現像液が好ましく、シリケート化合物を含まないpH9以上のアルカリ現像液がより好ましい。
 上記シリケート化合物としては、二酸化ケイ素が挙げられ、上記シリケート化合物を含まない現像液をノンシリケート現像液ともいい、ノンシリケート現像液を用いる現像をノンシリケート現像ともいう。
 シリケート化合物を含まない現像液を用いることにより、現像カス抑制性に優れる。
 また、上記ノンシリケート現像液としては、特開2001-209172号公報に記載の非シリケート現像液が好適に用いられる。
 上記アルカリ現像液のpHは、12.5~13.5であることが好ましい。
<Developing process>
The method for producing a lithographic printing plate according to the present disclosure includes a developing step of developing with a developing solution.
The developer used in the developing step is preferably an alkali developer having a pH of 9 or more, more preferably an alkali developer having a pH of 9 or more and containing no silicate compound.
Examples of the silicate compound include silicon dioxide. The developer containing no silicate compound is also referred to as a non-silicate developer, and the development using the non-silicate developer is also referred to as a non-silicate development.
By using a developer that does not contain a silicate compound, the development dust suppressing property is excellent.
As the non-silicate developer, the non-silicate developer described in JP 2001-209172 A is preferably used.
The pH of the alkaline developer is preferably 12.5 to 13.5.
 上記アルカリ現像液は、緩衝作用を有する有機化合物、及び、塩基性化合物を含むことが好ましい。
 緩衝作用を有する有機化合物としては、特開平8-220775号公報に緩衝作用を有する化合物として記載されている糖類(特に一般式(I)又は(II)で表されるもの)、オキシム類(特に一般式(III)で表されるもの)、フェノール類(特に一般式(IV)で表されるもの)及びフッ素化アルコール類(特に一般式(V)で表されるもの)等が挙げられる。一般式(I)~(V)で表される化合物のなかでも、好ましいものは、一般式(I)又は(II)で表される糖類、一般式(V)で表されるフェノール類であり、更に好ましくは一般式(I)又は(II)で表される糖類のうち、サッカロース等の非還元糖又はスルホサリチル酸である。上記非還元糖には、還元基同士の結合したトレハロース型少糖類、糖類の還元基と非糖類が結合した配糖体、糖類に水素添加して還元した糖アルコール等が包含される。
The alkaline developer preferably contains an organic compound having a buffering action and a basic compound.
Examples of the organic compound having a buffering action include saccharides (especially those represented by the general formula (I) or (II)) described as a compound having a buffering action in JP-A-8-220775, and oximes (especially General formula (III)), phenols (particularly represented by general formula (IV)), fluorinated alcohols (particularly represented by general formula (V)) and the like. Among the compounds represented by the general formulas (I) to (V), preferred are the saccharides represented by the general formula (I) or (II) and the phenols represented by the general formula (V). Of the saccharides represented by the general formula (I) or (II), non-reducing sugars such as saccharose or sulfosalicylic acid are more preferable. The above-mentioned non-reducing sugars include trehalose-type oligosaccharides having reducing groups bound to each other, glycosides having reducing groups of saccharides bound to non-saccharides, sugar alcohols hydrogenated to reduce sugars, and the like.
 上記トレハロース型少糖類としては、例えば、サッカロースやトレハロースが挙げられ、上記配糖体としては、例えば、アルキル配糖体、フェノール配糖体、カラシ油配糖体等が挙げられる。上記糖アルコールとしては、例えば、D,L-アラビット、リビット、キシリット、D,L-ソルビット、D,L-アンニット、D,L-イジット、D,L-タリット、ズリシット、アロズルシット等が挙げられる。更には、二糖類の水素添加で得られるマルチトール、オリゴ糖の水素添加で得られる還元体(還元水あめ)等も好適に挙げることができる。 Examples of the trehalose-type oligosaccharides include saccharose and trehalose, and examples of the glycosides include alkyl glycosides, phenol glycosides, mustard oil glycosides, and the like. Examples of the sugar alcohol include D, L-arabite, ribit, xylit, D, L-sorbit, D, L-annite, D, L-idit, D, L-talit, zuricit, and alodulcit. Furthermore, maltitol obtained by hydrogenation of a disaccharide, a reduced form (reduced starch syrup) obtained by hydrogenation of an oligosaccharide, and the like can be preferably mentioned.
 上記のうち、非還元糖としては、糖アルコール、サッカロースが好ましく、中でも特に、D-ソルビット、サッカロース、還元水あめが、適度なpH領域に緩衝作用がある点でより好ましい。 Among the above, sugar alcohol and saccharose are preferable as the non-reducing sugar, and among them, D-sorbit, sucrose and reduced starch syrup are more preferable because they have a buffering action in an appropriate pH range.
 上記緩衝作用を有する有機化合物は、1種単独で使用しても、2種以上を併用してもよい。
 上記緩衝作用を有する有機化合物の含有量は、現像液の全質量に対し、0.1質量%~30質量%が好ましく、1質量%~20質量%がより好ましい。
The organic compounds having a buffering effect may be used alone or in combination of two or more.
The content of the organic compound having a buffering effect is preferably 0.1% by mass to 30% by mass, more preferably 1% by mass to 20% by mass, based on the total mass of the developer.
 上記緩衝作用を有する有機化合物には、塩基性化合物としてアルカリ剤を、従来公知のものの中から適宜選択して組合せることができる。
 上記アルカリ剤としては、例えば、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、リン酸三ナトリウム、リン酸三カリウム、リン酸三アンモニウム、リン酸二ナトリウム、リン酸二カリウム、リン酸二アンモニウム、炭酸ナトリウム、炭酸カリウム、炭酸アンモニウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素アンモニウム、ホウ酸ナトリウム、ホウ酸カリウム、ホウ酸アンモニウム等の無機アルカリ剤、クエン酸カリウム、クエン酸三カリウム、クエン酸ナトリウム等が挙げられる。更に、モノメチルアミン、ジメチルアミン、トリメチルアミン、モノエチルアミン、ジエチルアミン、トリエチルアミン、モノイソプロピルアミン、ジイソプロピルアミン、トリイソプロピルァミン、n-ブチルアミン、モノエタノールアミン、ジエタノールアミン、トリエタノールアミン、モノイソプロパノールアミン、ジイソブロパノールアミシ、エチレンイミン、エチレンジアミン、ピリジン等の有機アルカリ剤も好適に挙げることができる。
An alkaline agent as a basic compound can be appropriately selected from the conventionally known compounds and combined with the above-mentioned organic compound having a buffering action.
Examples of the alkaline agent include sodium hydroxide, potassium hydroxide, lithium hydroxide, trisodium phosphate, tripotassium phosphate, triammonium phosphate, disodium phosphate, dipotassium phosphate, diammonium phosphate, Inorganic alkaline agents such as sodium carbonate, potassium carbonate, ammonium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, ammonium hydrogen carbonate, sodium borate, potassium borate, ammonium borate, potassium citrate, tripotassium citrate, sodium citrate Etc. Furthermore, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanol. Preference is also given to organic alkali agents such as neuramis, ethyleneimine, ethylenediamine, pyridine and the like.
 中でも、上記塩基性化合物としては、水酸化ナトリウム、又は、水酸化カリウムが好ましい。その理由は、非還元糖に対する添加量を調整することにより、広いpH領域においてpH調整が可能となるためである。
 また、リン酸三ナトリウム、リン酸三カリウム、炭酸ナトリウム、炭酸カリウム等もそれ自身に緩衝作用があるので好ましい。
Among them, sodium hydroxide or potassium hydroxide is preferable as the basic compound. The reason is that the pH can be adjusted in a wide pH range by adjusting the addition amount to the non-reducing sugar.
In addition, trisodium phosphate, tripotassium phosphate, sodium carbonate, potassium carbonate and the like are preferable because they have a buffering effect.
 上記塩基性化合物は、1種単独で用いても、2種以上を併用してもよい。
 上記塩基性化合物の含有量は、特に制限はなく、所望のpHとなる量を現像液に添加すればよい。
The above basic compounds may be used alone or in combination of two or more.
The content of the basic compound is not particularly limited, and it may be added to the developing solution in an amount that provides a desired pH.
 上記現像液は、処理性の観点から、界面活性剤を含むことが好ましい。
 上記現像液に用いられる界面活性剤は、アニオン性、ノニオン性、カチオン性、及び、両性の界面活性剤のいずれも用いることができるが、既述のように、アニオン性、ノニオン性の界面活性剤が好ましい。
 本開示において現像液に用いられるアニオン性、ノニオン性、カチオン性、及び、両性界面活性剤としては、特開2013-134341号公報の段落0128~0131に記載の物を使用することができる。
The developer preferably contains a surfactant from the viewpoint of processability.
The surfactant used in the developer may be any of anionic, nonionic, cationic, and amphoteric surfactants, but as described above, anionic and nonionic surfactants. Agents are preferred.
As the anionic, nonionic, cationic and amphoteric surfactants used in the developing solution in the present disclosure, those described in paragraphs 0128 to 0131 of JP2013-134341A can be used.
 また、水に対する安定な溶解性あるいは混濁性の観点から、上記界面活性剤のHLB値が、6以上であることが好ましく、8以上であることがより好ましい。
 上記現像液に用いられる界面活性剤としては、アニオン性界面活性剤及びノニオン界面活性剤が好ましく、スルホン酸又はスルホン酸塩を含有するアニオン性界面活性剤及び、芳香環とエチレンオキサイド鎖を有するノニオン界面活性剤が特に好ましい。
 界面活性剤は、単独又は組み合わせて使用することができる。
 界面活性剤の現像液中における含有量は、0.01質量%~10質量%が好ましく、0.01質量%~5質量%がより好ましい。
From the viewpoint of stable solubility or turbidity in water, the HLB value of the surfactant is preferably 6 or more, more preferably 8 or more.
As the surfactant used in the developing solution, anionic surfactants and nonionic surfactants are preferable, and anionic surfactants containing sulfonic acid or sulfonate, and nonionics having an aromatic ring and an ethylene oxide chain. Surfactants are especially preferred.
The surfactants can be used alone or in combination.
The content of the surfactant in the developer is preferably 0.01% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass.
 上記現像液には上記の他に、湿潤剤、防腐剤、キレート化合物、消泡剤、有機酸、有機溶剤、無機酸、無機塩などを含有することができる。ただし、水溶性高分子化合物を添加すると、特に現像液が疲労した際に版面がベトツキやすくなるため、添加しないことが好ましい。 In addition to the above, the developer may contain a wetting agent, a preservative, a chelate compound, a defoaming agent, an organic acid, an organic solvent, an inorganic acid, an inorganic salt and the like. However, when the water-soluble polymer compound is added, the plate surface tends to become sticky, especially when the developer is fatigued.
 湿潤剤としては、特開2013-134341号公報の段落0141に記載の湿潤剤を好適に用いることができる。湿潤剤は単独で用いてもよいが、2種以上併用してもよい。湿潤剤は、現像剤の全質量に対し、0.1質量%~5質量%の量で使用されることが好ましい。 As the wetting agent, the wetting agent described in paragraph 0141 of JP2013-134341A can be preferably used. The wetting agents may be used alone or in combination of two or more. The wetting agent is preferably used in an amount of 0.1% by mass to 5% by mass, based on the total mass of the developer.
 防腐剤としては、特開2013-134341号公報の段落0142に記載の防腐剤を好適に用いることができる。種々のカビ、殺菌に対して効力のあるように2種以上の防腐剤を併用することが好ましい。防腐剤の添加量は、細菌、カビ、酵母等に対して、安定に効力を発揮する量であって、細菌、カビ、酵母の種類によっても異なるが、現像液の全質量に対して、0.01質量%~4質量%の範囲が好ましい。 As the preservative, the preservative described in paragraph 0142 of JP2013-134341A can be preferably used. It is preferable to use two or more preservatives in combination so as to be effective against various molds and sterilizations. The addition amount of the preservative is an amount that exerts a stable effect on bacteria, molds, yeasts and the like, and varies depending on the types of bacteria, molds, yeasts, but it is 0 for the total mass of the developer. A range of 0.01% by mass to 4% by mass is preferable.
 キレート化合物としては、特開2013-134341号公報の段落0143に記載のキレート化合物を好適に用いることができる。キレート剤は現像液組成中に安定に存在し、印刷性を阻害しないものが選ばれる。添加量は、現像液の全質量に対して、0.001質量%~1.0質量%が好適である。 As the chelate compound, the chelate compound described in paragraph 0143 of JP2013-134341A can be preferably used. The chelating agent is selected so that it stably exists in the developer composition and does not impair the printability. The addition amount is preferably 0.001% by mass to 1.0% by mass with respect to the total mass of the developer.
 消泡剤としては、特開2013-134341号公報の段落0144に記載の消泡剤を好適に用いることができる。消泡剤の含有量は、現像液の全重量に対して、0.001質量%~1.0質量%の範囲が好適である。 As the defoaming agent, the defoaming agent described in paragraph 0144 of JP2013-134341A can be preferably used. The content of the defoaming agent is preferably in the range of 0.001% by mass to 1.0% by mass with respect to the total weight of the developer.
 有機酸としては、特開2013-134341号公報の段落0145に記載の消泡剤を好適に用いることができる。有機酸の含有量は、現像液の全質量に対して、0.01質量%~0.5質量%が好ましい。 As the organic acid, the defoaming agent described in paragraph 0145 of JP2013-134341A can be preferably used. The content of the organic acid is preferably 0.01% by mass to 0.5% by mass with respect to the total mass of the developer.
 有機溶剤としては、例えば、脂肪族炭化水素類(ヘキサン、ヘプタン、“アイソパーE、H、G”(エッソ化学(株)製)、ガソリン、若しくは、灯油等)、芳香族炭化水素類(トルエン、キシレン等)、又は、ハロゲン化炭化水素(メチレンジクロライド、エチレンジクロライド、トリクレン、モノクロルベンゼン等)や、極性溶剤が挙げられる。 Examples of the organic solvent include aliphatic hydrocarbons (hexane, heptane, “Isopar E, H, G” (manufactured by Esso Chemical Co., Ltd.), gasoline, or kerosene), aromatic hydrocarbons (toluene, Xylene) or halogenated hydrocarbons (methylene dichloride, ethylene dichloride, trichlene, monochlorobenzene, etc.) and polar solvents.
 極性溶剤としては、アルコール類(メタノール、エタノール、プロパノール、イソプロパノール、ベンジルアルコール、エチレングリコールモノメチルエーテル、2-エトキシエタノール等)、ケトン類(メチルエチルケトン、シクロヘキサノン等)、エステル類(酢酸エチル、乳酸メチル、プロピレングリコールモノメチルエーテルアセテート等)、その他(トリエチルホスフェート、トリクレジルホスフェート、N-フェニルエタノールアミン、N-フェニルジエタノールアミン等)等が挙げられる。 Examples of polar solvents include alcohols (methanol, ethanol, propanol, isopropanol, benzyl alcohol, ethylene glycol monomethyl ether, 2-ethoxyethanol, etc.), ketones (methyl ethyl ketone, cyclohexanone, etc.), esters (ethyl acetate, methyl lactate, propylene). Glycol monomethyl ether acetate, etc.) and others (triethyl phosphate, tricresyl phosphate, N-phenylethanolamine, N-phenyldiethanolamine, etc.) and the like.
 また、上記有機溶剤が水に不溶な場合は、界面活性剤等を用いて水に可溶化して使用することも可能である。現像液が有機溶剤を含有する場合は、安全性、引火性の観点から、溶剤の濃度は40質量%未満が好ましい。 If the above organic solvent is insoluble in water, it can be solubilized in water with a surfactant or the like before use. When the developer contains an organic solvent, the concentration of the solvent is preferably less than 40 mass% from the viewpoint of safety and flammability.
 無機酸及び無機塩としては、リン酸、メタリン酸、第一リン酸アンモニウム、第二リン酸アンモニウム、第一リン酸ナトリウム、第二リン酸ナトリウム、第一リン酸カリウム、第二リン酸カリウム、トリポリリン酸ナトリウム、ピロリン酸カリウム、ヘキサメタリン酸ナトリウム、硝酸マグネシウム、硝酸ナトリウム、硝酸カリウム、硝酸アンモニウム、硫酸ナトリウム、硫酸カリウム、硫酸アンモニウム、亜硫酸ナトリウム、亜硫酸アンモニウム、硫酸水素ナトリウム、硫酸ニッケルなどが挙げられる。無機塩の含有量は、現像液の全質量に対し、0.01質量%~0.5質量%が好ましい。 As the inorganic acid and the inorganic salt, phosphoric acid, metaphosphoric acid, monobasic ammonium phosphate, dibasic ammonium phosphate, monobasic sodium phosphate, dibasic sodium phosphate, monobasic potassium phosphate, dibasic potassium phosphate, Examples thereof include sodium tripolyphosphate, potassium pyrophosphate, sodium hexametaphosphate, magnesium nitrate, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium sulfite, ammonium sulfite, sodium hydrogensulfate and nickel sulfate. The content of the inorganic salt is preferably 0.01% by mass to 0.5% by mass with respect to the total mass of the developer.
 現像の温度は、現像可能であれば特に制限はないが、60℃以下であることが好ましく、15℃~40℃であることがより好ましい。自動現像機を用いる現像処理においては、処理量に応じて現像液が疲労してくることがあるので、補充液又は新鮮な現像液を用いて処理能力を回復させてもよい。現像及び現像後の処理の一例としては、アルカリ現像を行い、後水洗工程でアルカリを除去し、ガム引き工程でガム処理を行い、乾燥工程で乾燥する方法が例示できる。また、他の例としては、炭酸イオン、炭酸水素イオン及び界面活性剤を含有する水溶液を用いることにより、前水洗、現像及びガム引きを同時に行う方法が好ましく例示できる。よって、前水洗工程は特に行わなくともよく、一液を用いるだけで、更には一浴で前水洗、現像及びガム引きを行ったのち、乾燥工程を行うことが好ましい。現像の後は、スクイズローラ等を用いて余剰の現像液を除去してから乾燥を行うことが好ましい。 The developing temperature is not particularly limited as long as it can be developed, but is preferably 60 ° C. or lower, more preferably 15 ° C. to 40 ° C. In a developing process using an automatic developing machine, the developing solution may become fatigued depending on the processing amount, and therefore the replenishing solution or a fresh developing solution may be used to recover the processing ability. As an example of the development and the treatment after the development, a method of performing alkali development, removing the alkali in the post-water washing step, performing gum treatment in the gumming step, and drying in the drying step can be exemplified. As another example, a method of simultaneously performing pre-washing, developing and gumming can be preferably exemplified by using an aqueous solution containing carbonate ion, hydrogen carbonate ion and a surfactant. Therefore, the pre-water washing step does not have to be particularly performed, and it is preferable to perform the pre-water washing, the development and the gumming in one bath only after using one solution, and then to perform the drying step. After the development, it is preferable to remove excess developer using a squeeze roller or the like and then perform drying.
 現像工程は、擦り部材を備えた自動処理機により好適に実施することができる。自動処理機としては、例えば、画像露光後の平版印刷版原版を搬送しながら擦り処理を行う、特開平2-220061号公報、特開昭60-59351号公報に記載の自動処理機や、シリンダー上にセットされた画像露光後の平版印刷版原版を、シリンダーを回転させながら擦り処理を行う、米国特許第5148746号、同5568768号、英国特許2297719号の各明細書に記載の自動処理機等が挙げられる。中でも、擦り部材として、回転ブラシロールを用いる自動処理機が特に好ましい。 Development process can be preferably carried out by an automatic processor equipped with a rubbing member. As the automatic processor, for example, the automatic processor described in JP-A-2-220061 and JP-A-60-59351, which performs rubbing treatment while conveying the planographic printing plate precursor after image exposure, and a cylinder The lithographic printing plate precursor after image exposure set on the above is subjected to rubbing treatment while rotating a cylinder, the automatic processor described in each specification of US Pat. Nos. 5,148,746, 5,568,768 and British Patent 2,297,719. Is mentioned. Above all, an automatic processor using a rotating brush roll as the rubbing member is particularly preferable.
 本開示において使用する回転ブラシロールは、画像部の傷つき難さ、更には、平版印刷版原版の支持体における腰の強さ等を考慮して適宜選択することができる。回転ブラシロールとしては、ブラシ素材をプラスチック又は金属のロールに植え付けて形成された公知のものが使用できる。例えば、特開昭58-159533号公報、特開平3-100554号公報に記載のものや、実公昭62-167253号公報に記載されているような、ブラシ素材を列状に植え込んだ金属又はプラスチックの溝型材を芯となるプラスチック又は金属のロールに隙間なく放射状に巻き付けたブラシロールが使用できる。
 ブラシ素材としては、プラスチック繊維(例えば、ポリエチレンテレフタレート、ポリブチレンテレフタレート等のポリエステル系、ナイロン6.6、ナイロン6.10等のポリアミド系、ポリアクリロニトリル、ポリ(メタ)アクリル酸アルキル等のポリアクリル系、ポリプロピレン、ポリスチレン等のポリオレフィン系の合成繊維)を使用することができ、例えば、繊維の毛の直径は20μm~400μm、毛の長さは5mm~30mmのものが好適に使用できる。
 回転ブラシロールの外径は30mm~200mmが好ましく、版面を擦るブラシの先端の周速は0.1m/sec~5m/secが好ましい。回転ブラシロールは、複数本用いることが好ましい。
The rotating brush roll used in the present disclosure can be appropriately selected in consideration of the scratch resistance of the image area, the rigidity of the support of the planographic printing plate precursor, and the like. As the rotating brush roll, a known roll formed by planting a brush material on a plastic or metal roll can be used. For example, a metal or plastic in which brush materials are implanted in rows, as described in JP-A-58-159533 and JP-A-3-100554, and JP-B-62-167253. It is possible to use a brush roll in which the groove-shaped material is wound around a plastic or metal roll serving as a core in a radial pattern without a gap.
As the brush material, plastic fibers (for example, polyester type such as polyethylene terephthalate and polybutylene terephthalate, polyamide type such as nylon 6.6 and nylon 6.10, polyacryl type such as polyacrylonitrile, alkyl poly (meth) acrylate) Polyolefin-based synthetic fibers such as polypropylene and polystyrene) can be preferably used. For example, fibers having a hair diameter of 20 μm to 400 μm and a hair length of 5 mm to 30 mm can be preferably used.
The outer diameter of the rotating brush roll is preferably 30 mm to 200 mm, and the peripheral speed of the tip of the brush rubbing the plate surface is preferably 0.1 m / sec to 5 m / sec. It is preferable to use a plurality of rotating brush rolls.
 回転ブラシロールの回転方向は、平版印刷版原版の搬送方向に対し、同一方向であっても、逆方向であってもよいが、2本以上の回転ブラシロールを使用する場合は、少なくとも1本の回転ブラシロールが同一方向に回転し、少なくとも1本の回転ブラシロールが逆方向に回転することが好ましい。これにより、非画像部の画像記録層の除去が更に確実となる。更に、回転ブラシロールをブラシロールの回転軸方向に揺動させることも効果的である。 The rotating brush roll may be rotated in the same direction or in the opposite direction with respect to the conveying direction of the lithographic printing plate precursor, but when using two or more rotating brush rolls, at least one rotating brush roll is used. It is preferable that the rotating brush rolls of 1 rotate in the same direction and at least one rotating brush roll rotate in the opposite direction. This further ensures removal of the image recording layer in the non-image area. Further, it is also effective to swing the rotating brush roll in the rotation axis direction of the brush roll.
<制御工程>
 本開示に係る平版印刷版の作製方法は、上記アルカリ現像液の液活性を、上記アルカリ現像液の電導度で測定し、測定された測定値に従って補充液を加えて、目標の電導度となるように調整し、液活性を制御する工程(「制御工程」ともいう。)を含むことが好ましい。
 なお、上記制御工程におけるアルカリ現像液は、シリケート化合物を含まないpH9以上のアルカリ現像液であることが好ましい。
 本開示において、「補充液」とは、現像性能を一定に保つために補充する処理液のことである。一般に、この補充液として、補充液原液を希釈液(例、水)で希釈して調製されたものや、希釈することなく補充液原液そのままを用いるものがあるが、本開示では、上記補充液は、補充液原液を希釈液で希釈し調製したものであることが好ましい。また、補充方法としては、予め希釈して調製した補充液を現像液に補充することもあれば、補充液原液と希釈液とを別々に直接現像液に補充する方法もある。
<Control process>
The method for producing a lithographic printing plate according to the present disclosure, the liquid activity of the alkaline developer is measured by the conductivity of the alkaline developer, and a replenisher is added according to the measured value to obtain the target conductivity. Therefore, it is preferable to include a step of controlling the liquid activity (also referred to as a “control step”).
The alkali developing solution in the control step is preferably an alkali developing solution containing no silicate compound and having a pH of 9 or more.
In the present disclosure, the “replenisher” is a processing solution replenished to keep the developing performance constant. In general, as the replenishing solution, there are those prepared by diluting the replenishing solution undiluted solution with a diluting solution (eg, water), and those using the replenishing solution undiluted solution as it is without diluting it. Is preferably prepared by diluting the replenisher stock solution with a diluent. As a replenishing method, there is a method of replenishing the developing solution with a replenishing solution prepared by diluting in advance, or a method of directly replenishing the developing solution with the replenishing solution stock solution and the diluting solution separately.
 また、上記アルカリ現像液の電導度の測定方法としては、電導度センサを用いることが好ましい。
 現像液の電導度を測定する電導度センサとしては、交流電導度計、交流ブリッジ計あるいは、その他の電導度計などの公知の手段を用いることができる。また、上記測定装置の測定電流値や発振周波数等は、現像液の組成等により最適条件は異なるが、電流値は装置的にも又水溶性の現像液の電気分解を防ぐためにもある程度低いことが好ましく、数百mA~数μAが好ましい。また、周波数は、現像液中の静電容量成分との関係から、数百Hz~数百kHzのものが好ましい。
As a method for measuring the electric conductivity of the alkaline developer, it is preferable to use an electric conductivity sensor.
As the conductivity sensor for measuring the conductivity of the developer, a known means such as an AC conductivity meter, an AC bridge meter, or other conductivity meter can be used. Further, the measured current value, oscillation frequency, etc. of the above-mentioned measuring device differ in optimum conditions depending on the composition of the developing solution, etc., but the current value is low to some extent in terms of the apparatus and to prevent electrolysis of the water-soluble developing solution. Is preferable, and several hundred mA to several μA is preferable. Further, the frequency is preferably several hundreds Hz to several hundreds kHz from the relationship with the electrostatic capacitance component in the developing solution.
 電解質を含む現像液の電導度の値は、水溶液の温度に依存し、液温が上がるとその値は低下する。したがって、より好ましくは、温度センサ及び温度補償回路を付した測定器で電導度を測定するのが好ましい。また、補充を制御する制御装置において、実際に測定した液抵抗値と液温度から、予め定めた温度における電導度値に換算し温度補償することも可能である。交流電導度計、交流ブリッジ計あるいは、その他の電導度計のセンサ設置位置は、測定時に現像液に浸漬され、現像液の交流電導度値が測定できる場所であればよく、例えば自動現像装置液の現像液循環系、特に現像タンク中、又は、循環パイプ中が好ましい位置である。検出部としては、電極に白金、ステンレス等を用いた公知の測定セルを使用することができる。 The value of the conductivity of the developer containing the electrolyte depends on the temperature of the aqueous solution, and decreases as the temperature of the solution rises. Therefore, it is more preferable to measure the electric conductivity with a measuring instrument equipped with a temperature sensor and a temperature compensation circuit. Further, in the control device for controlling replenishment, it is possible to convert the actually measured liquid resistance value and liquid temperature into an electric conductivity value at a predetermined temperature for temperature compensation. The sensor installation position of the AC conductivity meter, the AC bridge meter, or other conductivity meter may be a place where the AC conductivity value of the developer can be measured by being immersed in the developer at the time of measurement. The preferred position is the developing solution circulation system, especially in the developing tank or the circulation pipe. As the detection unit, a known measurement cell using platinum, stainless steel or the like for the electrode can be used.
 また、上記制御工程としては、特開2005-275384号公報を参照することができる。 For the control process, reference can be made to JP-A-2005-275384.
 現像工程の後、連続的又は不連続的に乾燥工程を設けることが好ましい。乾燥は熱風、赤外線、遠赤外線等によって行う。
 本開示に係る平版印刷版の作製方法において好適に用いられる自動処理機としては、現像部と乾燥部とを有する装置が用いられ、平版印刷版原版に対して、現像槽で、現像とガム引きとが行われ、その後、乾燥部で乾燥されて平版印刷版が得られる。
After the developing step, it is preferable to provide a drying step continuously or discontinuously. Drying is performed with hot air, infrared rays, far infrared rays, or the like.
As an automatic processor preferably used in the method for producing a lithographic printing plate according to the present disclosure, an apparatus having a developing unit and a drying unit is used, and a lithographic printing plate precursor is developed and gummed in a developing tank. And then dried in the drying section to obtain a lithographic printing plate.
 また、耐刷性等の向上を目的として、現像後の印刷版を加熱することもできる。加熱温度は、200℃~500℃の範囲であることが好ましい。
 このようにして得られた平版印刷版は、オフセット印刷機に掛けられ、多数枚の印刷に好適に用いられる。
Further, the printing plate after development can be heated for the purpose of improving printing durability. The heating temperature is preferably in the range of 200 ° C to 500 ° C.
The lithographic printing plate thus obtained is set on an offset printing machine and is suitably used for printing a large number of sheets.
 以下、実施例により本開示を詳細に説明するが、本開示はこれらに限定されるものではない。なお、本実施例において、「%」、「部」とは、特に断りのない限り、それぞれ「質量%」、「質量部」を意味する。
 また、高分子化合物において、特別に規定したもの以外は、分子量は重量平均分子量(Mw)であり、構成単位の比率はモル百分率である。また、重量平均分子量(Mw)は、ゲル浸透クロマトグラフィー(GPC)法によるポリスチレン換算値として測定した値である。
Hereinafter, the present disclosure will be described in detail with reference to Examples, but the present disclosure is not limited thereto. In this example, "%" and "part" mean "mass%" and "part by mass", respectively, unless otherwise specified.
In addition, in the polymer compound, the molecular weight is the weight average molecular weight (Mw) and the ratio of the constitutional units is a mole percentage, except for those specifically specified. The weight average molecular weight (Mw) is a value measured as a polystyrene conversion value by a gel permeation chromatography (GPC) method.
<アルカリ可溶性樹脂の作製>
 特開2006-3658号公報、特表2003-518264号公報、又は、中国特許公開第103879169号明細書に記載された方法を参照し、実施例又は比較例で使用
<Preparation of alkali-soluble resin>
Used in Examples or Comparative Examples with reference to the methods described in JP-A-2006-3658, JP-T-2003-518264, or Chinese Patent Publication No. 1038716969.
(実施例1~20、及び、比較例1~3)
<支持体の作製>
 Si:0.06質量%、Fe:0.30質量%、Cu:0.025質量%、Mn:0.001質量%、Mg:0.001質量%、Zn:0.001質量%、Ti:0.03質量%を含有し、残部はAlと不可避不純物のアルミニウム合金を用いて溶湯を調製し、溶湯処理及びろ過を行った上で、厚さ500mm、幅1,200mmの鋳塊をダイレクトチル(DC)鋳造法で作製した。表面を平均10mmの厚さで面削機により削り取った後、550℃で、約5時間均熱保持し、温度400℃に下がったところで、熱間圧延機を用いて厚さ2.7mmの圧延板とした。更に、連続焼鈍機を用いて熱処理を500℃で行った後、冷間圧延で、厚さ0.24mmに仕上げ、JIS 1050材のアルミニウム板を得た。なお、得られたアルミニウムの平均結晶粒径の短径は50μm、長径は300μmであった。このアルミニウム板を幅1,030mmにした後、以下に示す表面処理に供した。
(Examples 1 to 20 and Comparative Examples 1 to 3)
<Preparation of support>
Si: 0.06 mass%, Fe: 0.30 mass%, Cu: 0.025 mass%, Mn: 0.001 mass%, Mg: 0.001 mass%, Zn: 0.001 mass%, Ti: It contains 0.03% by mass, the balance is Al and aluminum alloy of unavoidable impurities, prepares a molten metal, and after the molten metal treatment and filtration, the ingot with a thickness of 500 mm and a width of 1,200 mm is directly chilled. It was produced by the (DC) casting method. After shaving the surface with an average thickness of 10 mm by a chamfering machine, it was soaked and held at 550 ° C. for about 5 hours, and when the temperature fell to 400 ° C., it was rolled with a hot rolling mill to a thickness of 2.7 mm. It was a plate. Further, heat treatment was performed at 500 ° C. using a continuous annealing machine, and then cold rolling was performed to finish the thickness to 0.24 mm to obtain a JIS 1050 aluminum plate. The average crystal grain size of the obtained aluminum had a short diameter of 50 μm and a long diameter of 300 μm. After making this aluminum plate a width of 1,030 mm, it was subjected to the following surface treatment.
<表面処理>
 表面処理は、以下の(a)~(k)の各種処理を連続的に行った。なお、各処理及び水洗の後には、ニップローラーで液切りを行った。
<Surface treatment>
As the surface treatment, the following various treatments (a) to (k) were continuously performed. After each treatment and washing with water, drainage was performed with a nip roller.
(a)機械的粗面化処理
 図1に示したような装置を使って、比重1.12の研磨剤(パミス)と水との懸濁液を研磨スラリー液としてアルミニウム板の表面に供給しながら、回転するローラ状ナイロンブラシにより機械的粗面化処理を行った。図1において、1はアルミニウム板、2及び4はローラ状ブラシ、3は研磨スラリー液、5、6、7及び8は支持ローラである。研磨剤の平均粒径は30μm、最大粒径は100μmであった。ナイロンブラシの材質は6・10ナイロン、毛長は45mm、毛の直径は0.3mmであった。ナイロンブラシはφ300mmのステンレス製の筒に穴をあけて密になるように植毛した。回転ブラシは3本使用した。ブラシ下部の2本の支持ローラ(φ200mm)の距離は300mmであった。ブラシローラはブラシを回転させる駆動モータの負荷が、ブラシローラをアルミニウム板に押さえつける前の負荷に対して7kWプラスになるまで押さえつけた。ブラシの回転方向はアルミニウム板の移動方向と同じであった。ブラシの回転数は200rpm(revolutions per minute)であった。
(A) Mechanical surface roughening treatment A device such as shown in FIG. 1 was used to supply a suspension of an abrasive (pumice) having a specific gravity of 1.12 and water as a polishing slurry liquid to the surface of an aluminum plate. Meanwhile, mechanical roughening treatment was performed by a rotating roller-shaped nylon brush. In FIG. 1, 1 is an aluminum plate, 2 and 4 are roller brushes, 3 is a polishing slurry liquid, 5, 6, 7 and 8 are support rollers. The average particle size of the abrasive was 30 μm, and the maximum particle size was 100 μm. The material of the nylon brush was 6.10 nylon, the bristle length was 45 mm, and the bristle diameter was 0.3 mm. The nylon brush was prepared by forming holes in a stainless steel cylinder having a diameter of 300 mm and densely implanting the bristles. Three rotating brushes were used. The distance between the two support rollers (φ200 mm) below the brush was 300 mm. The brush roller was pressed until the load of the drive motor for rotating the brush became 7 kW plus with respect to the load before the brush roller was pressed against the aluminum plate. The rotating direction of the brush was the same as the moving direction of the aluminum plate. The rotation number of the brush was 200 rpm (revolutions per minute).
(b)アルカリエッチング処理
 上記で得られたアルミニウム板を水酸化ナトリウム濃度2.6質量%、アルミニウムイオン濃度6.5質量%、温度70℃の水溶液を用いてスプレーによるエッチング処理を行い、アルミニウム板を10g/m溶解した。その後、スプレーによる水洗を行った。
(B) Alkaline etching treatment The aluminum plate obtained above was subjected to etching treatment by spraying using an aqueous solution having a sodium hydroxide concentration of 2.6% by mass, an aluminum ion concentration of 6.5% by mass, and a temperature of 70 ° C. to obtain an aluminum plate. Was dissolved at 10 g / m 2 . Then, washing with water was performed by spraying.
(c)デスマット処理
 温度30℃の硝酸濃度1質量%水溶液(アルミニウムイオンを0.5質量%含む。)で、スプレーによるデスマット処理を行い、その後、スプレーで水洗した。デスマット処理に用いた硝酸水溶液は、硝酸水溶液中で交流を用いて電気化学的粗面化処理を行う工程の廃液を用いた。
(C) Desmutting treatment Desmutting treatment was carried out by spraying with a 1% by weight nitric acid concentration aqueous solution (containing 0.5% by weight of aluminum ion) at a temperature of 30 ° C., followed by washing with water by spraying. The nitric acid aqueous solution used for the desmutting treatment was the waste liquid of the step of performing the electrochemical surface roughening treatment using an alternating current in the nitric acid aqueous solution.
(d)電気化学的粗面化処理
 60Hzの交流電圧を用いて連続的に電気化学的粗面化処理を行った。このときの電解液は、硝酸10.5g/L水溶液(アルミニウムイオンを5g/L、アンモニウムイオンを0.007質量%含む。)、液温50℃であった。交流電源波形は図2に示した波形であり、電流値がゼロからピークに達するまでの時間TPが0.8msec、duty比1:1、台形の矩形波交流を用いて、カーボン電極を対極として電気化学的な粗面化処理を行った。補助アノードにはフェライトを用いた。使用した電解槽は図3に示すものを使用した。
 図3に示す電解槽(ラジアル型セル)は、ラジアルドラムローラ12及び主極13a、13bを備える主電解槽40と、補助陽極18を備える補助陽極槽50と、サイリスタ19a、19bと、交流電源20と、を有する。主電解槽40では、電解処理液14が電解液供給口15及び16を介して、電解液通路17に搬送されるアルミニウム板11に給液される。
 電流密度は電流のピーク値で30A/dm、電気量はアルミニウム板が陽極時の電気量の総和で220C/dmであった。補助陽極には電源から流れる電流の5%を分流させた。その後、スプレーによる水洗を行った。
(D) Electrochemical surface roughening treatment Electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz. At this time, the electrolytic solution was a 10.5 g / L nitric acid aqueous solution (containing 5 g / L of aluminum ions and 0.007% by mass of ammonium ions), and the liquid temperature was 50 ° C. The AC power supply waveform is the waveform shown in FIG. 2, in which the time TP required for the current value to reach the peak from zero is 0.8 msec, the duty ratio is 1: 1, and a trapezoidal rectangular wave AC is used, with the carbon electrode as the counter electrode. An electrochemical graining treatment was performed. Ferrite was used for the auxiliary anode. The electrolytic cell used was that shown in FIG.
The electrolytic cell (radial cell) shown in FIG. 3 includes a main electrolytic cell 40 including a radial drum roller 12 and main electrodes 13a and 13b, an auxiliary anode tank 50 including an auxiliary anode 18, thyristors 19a and 19b, and an AC power supply. 20 and. In the main electrolytic bath 40, the electrolytic treatment liquid 14 is supplied to the aluminum plate 11 conveyed to the electrolytic liquid passage 17 via the electrolytic liquid supply ports 15 and 16.
The current density was 30 A / dm 2 at the peak value of the current, and the amount of electricity was 220 C / dm 2 as the total amount of electricity when the aluminum plate was the anode. 5% of the current flowing from the power source was shunted to the auxiliary anode. Then, washing with water was performed by spraying.
(e)アルカリエッチング処理
 アルミニウム板をカセイソーダ濃度26質量%、アルミニウムイオン濃度6.5質量%の水溶液を用いてスプレーによるエッチング処理を32℃で行い、アルミニウム板を0.50g/m溶解し、前段の交流を用いて電気化学的粗面化処理を行ったときに生成した水酸化アルミニウムを主体とするスマット成分を除去し、また、生成したピットのエッジ部分を溶解してエッジ部分を滑らかにした。その後、スプレーによる水洗を行った。
(E) Alkaline etching treatment An aluminum plate is subjected to etching treatment by spraying with an aqueous solution having a caustic soda concentration of 26 mass% and an aluminum ion concentration of 6.5 mass% at 32 ° C to dissolve the aluminum plate at 0.50 g / m 2 . Removes the smut component composed mainly of aluminum hydroxide generated when electrochemical roughening treatment was performed using the alternating current in the previous stage, and melts the edge part of the generated pit to smooth the edge part. did. Then, washing with water was performed by spraying.
(f)デスマット処理
 温度30℃の硝酸濃度15質量%水溶液(アルミニウムイオンを4.5質量%含む。)で、スプレーによるデスマット処理を行い、その後、スプレーで水洗した。デスマットに用いた硝酸水溶液は、硝酸水溶液中で交流を用いて電気化学的粗面化処理を行う工程の廃液を用いた。
(F) Desmutting treatment Desmutting treatment was performed by spraying with a 15% by weight nitric acid aqueous solution (containing 4.5% by weight of aluminum ion) at a temperature of 30 ° C., and then washed with water by spraying. As the nitric acid aqueous solution used for the desmut, a waste liquid from the step of performing an electrochemical graining treatment using an alternating current in the nitric acid aqueous solution was used.
(g)電気化学的粗面化処理
 60Hzの交流電圧を用いて連続的に電気化学的粗面化処理を行った。このときの電解液は、塩酸5.0g/L水溶液(アルミニウムイオンを5g/L含む。)、温度35℃であった。交流電源波形は図2に示した形波であり、電流値がゼロからピークに達するまでの時間TPが0.8msec、duty比1:1、台形の炬形波交流を用いて、カーボン電極を対極として電気化学的粗面化処理を行った。補助アノードにはフェライトを用いた。使用した電解槽は図3に示すものを使用した。
 図3に示す電解槽(ラジアル型セル)は、ラジアルドラムローラ12及び主極13a、13bを備える主電解槽40と、補助陽極18を備える補助陽極槽50と、サイリスタ19a、19bと、交流電源20と、を有する。主電解槽40では、電解処理液14が電解液供給口15及び16を介して、電解液通路17に搬送されるアルミニウム板11に給液される。
 電流密度は電流のピーク値で25A/dm、電気量はアルミニウム板が陽極時の電気量の総和で50C/dmであった。その後、スプレーによる水洗を行った。
(G) Electrochemical surface roughening treatment Electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz. The electrolytic solution at this time was a 5.0 g / L hydrochloric acid aqueous solution (containing 5 g / L of aluminum ions), and the temperature was 35 ° C. The AC power supply waveform is the waveform shown in FIG. 2, and the time TP from when the current value reaches zero to the peak is 0.8 msec, the duty ratio is 1: 1, and the trapezoidal rectangular wave AC is used to drive the carbon electrode. Electrochemical roughening treatment was performed as a counter electrode. Ferrite was used for the auxiliary anode. The electrolytic cell used was that shown in FIG.
The electrolytic cell (radial cell) shown in FIG. 3 includes a main electrolytic cell 40 including a radial drum roller 12 and main electrodes 13a and 13b, an auxiliary anode tank 50 including an auxiliary anode 18, thyristors 19a and 19b, and an AC power supply. 20 and. In the main electrolytic bath 40, the electrolytic treatment liquid 14 is supplied to the aluminum plate 11 conveyed to the electrolytic liquid passage 17 via the electrolytic liquid supply ports 15 and 16.
The current density was 25 A / dm 2 at the peak value of the current, and the amount of electricity was 50 C / dm 2 as the total amount of electricity when the aluminum plate was the anode. Then, washing with water was performed by spraying.
(h)アルカリエッチング処理
 アルミニウム板をカセイソーダ濃度26質量%、アルミニウムイオン濃度6.5質量%の水溶液を用いてスプレーによるエッチング処理を32℃で行い、アルミニウム板を0.10g/m溶解し、前段の交流を用いて電気化学的粗面化処理を行ったときに生成した水酸化アルミニウムを主体とするスマット成分を除去し、また、生成したピットのエッジ部分を溶解してエッジ部分を滑らかにした。その後、スプレーによる水洗を行った。
(H) Alkaline etching treatment An aluminum plate is subjected to etching treatment by spraying at 32 ° C. using an aqueous solution having a caustic soda concentration of 26 mass% and an aluminum ion concentration of 6.5 mass% to dissolve the aluminum plate at 0.10 g / m 2 . Removes the smut component composed mainly of aluminum hydroxide generated when electrochemical roughening treatment was performed using the alternating current in the previous stage, and melts the edge part of the generated pit to smooth the edge part. did. Then, washing with water was performed by spraying.
(i)デスマット処理
 温度60℃の硫酸濃度25質量%水溶液(アルミニウムイオンを0.5質量%含む。)で、スプレーによるデスマット処理を行い、その後、スプレーによる水洗を行った。
(I) Desmutting treatment Desmutting treatment was carried out by spraying with a 25% by mass aqueous solution of sulfuric acid (containing 0.5% by mass of aluminum ion) at a temperature of 60 ° C., followed by washing with water by spraying.
(j)陽極酸化処理
 図4に示す構造の陽極酸化装置(第一及び第二電解部長各6m、第一及び第二給電部長各3m、第一及び第二給電電極長各2.4m)を用いて陽極酸化処理を行った。第一及び第二電解部に供給した電解液としては、硫酸を用いた。電解液は、いずれも、硫酸濃度50g/L(アルミニウムイオンを0.5質量%含む。)、温度20℃であった。その後、スプレーによる水洗を行った。
 上記陽極酸化装置においては、電源67a及び電源67bからの電流は、第一給電部62aに設けられた第一給電電極65aに流れ、電解液を介してアルミニウム板11に流れ、第一電解部63aでアルミニウム板11表面に陽極酸化皮膜を生成させ、第一電解部63aに設けられた電解電極66a及び66bを通り、電極67a及び67bに戻る。
 電源67a及び67bから第一給電部62aに給電される電気量と、電源67c及び67dから第二給電部62bに給電される電気量とは等しく、また、第一電解部63a及び第二電解部63bにおける電流密度はともに約30A/dmであった。第二給電部62bでは、第一電解部63aで生成した1.35g/mの酸化皮膜面を通じて給電したことになる。最終的な酸化皮膜量は2.7g/mであった。
(J) Anodizing treatment The anodizing device having the structure shown in FIG. 4 (first and second electrolysis section lengths of 6 m each, first and second feeding section lengths of 3 m, and first and second feeding electrode lengths of 2.4 m) was used. Was used to perform anodizing treatment. Sulfuric acid was used as the electrolytic solution supplied to the first and second electrolysis sections. Each of the electrolytic solutions had a sulfuric acid concentration of 50 g / L (containing 0.5% by mass of aluminum ion) and a temperature of 20 ° C. Then, washing with water was performed by spraying.
In the anodizing device, currents from the power source 67a and the power source 67b flow to the first power feeding electrode 65a provided in the first power feeding portion 62a, flow to the aluminum plate 11 via the electrolytic solution, and then to the first electrolytic portion 63a. Then, an anodic oxide film is formed on the surface of the aluminum plate 11, passes through the electrolytic electrodes 66a and 66b provided in the first electrolytic portion 63a, and returns to the electrodes 67a and 67b.
The amount of electricity supplied from the power sources 67a and 67b to the first power supply unit 62a is equal to the amount of electricity supplied from the power sources 67c and 67d to the second power supply unit 62b, and the first electrolysis unit 63a and the second electrolysis unit 63a The current densities at 63b were both about 30 A / dm 2 . In the second power feeding portion 62b, power is fed through the oxide film surface of 1.35 g / m 2 generated in the first electrolytic portion 63a. The final amount of oxide film was 2.7 g / m 2 .
(k)アルカリ金属ケイ酸塩処理
 陽極酸化処理により得られたアルミニウム支持体を温度30℃の3号ケイ酸ソーダの1質量%水溶液の処理槽中へ、10秒間、浸せきすることでアルカリ金属ケイ酸塩処理(シリケート処理)を行った。その後、井水を用いたスプレーによる水洗を行い、表面シリケート親水化処理された支持体を得た。上記のようにして得られたアルカリ金属珪酸塩処理後のアルミニウム支持体上に、下記組成の下塗り液を塗布し、80℃で15秒間乾燥し、塗膜を形成させた。乾燥後の塗膜の被覆量は15mg/mであった。
(K) Alkali metal silicate treatment By immersing the aluminum support obtained by anodizing treatment in a treatment tank of a 1% by mass aqueous solution of sodium silicate No. 3 at a temperature of 30 ° C for 10 seconds, the alkali metal silicate is treated. Acid salt treatment (silicate treatment) was performed. After that, washing with well water was performed by spraying to obtain a support having a surface silicate hydrophilized. On the aluminum support treated with an alkali metal silicate obtained as described above, an undercoat liquid having the following composition was applied and dried at 80 ° C. for 15 seconds to form a coating film. The coating amount of the coating film after drying was 15 mg / m 2 .
-下塗り液組成- -Undercoat composition-
-下塗り液組成-
・重量平均分子量2.8万の下記共重合体:0.3部
・メタノール:100部
・水:1部
-Undercoat composition-
-The following copolymer having a weight average molecular weight of 28,000: 0.3 part-Methanol: 100 parts-Water: 1 part
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 なお、Etはエチル基を表す。 Note that Et represents an ethyl group.
<画像記録層(重層)の形成>
 得られたウェブ状の基板に下記組成の下層用塗布液を塗布量が0.85g/mになるようバーコーターで塗布したのち160℃で44秒間乾燥し、直ちに17℃~20℃の冷風で支持体の温度が35℃になるまで冷却した。
 その後、下記組成の上層用塗布液を塗布量が0.22g/mになるようバーコーター塗布したのち、148℃で25秒間乾燥し、更に20℃~26℃の風で徐冷し、実施例1~23及び比較例1~3の各平版印刷版原版を作製した。
<Formation of image recording layer (multilayer)>
The web-shaped substrate thus obtained was coated with a lower layer coating solution having the following composition by a bar coater so that the coating amount was 0.85 g / m 2 , followed by drying at 160 ° C. for 44 seconds and immediately cooling with cold air at 17 ° C. to 20 ° C. It was cooled until the temperature of the support reached 35 ° C.
Then, a coating solution for the upper layer having the following composition was applied by a bar coater to a coating amount of 0.22 g / m 2 , dried at 148 ° C. for 25 seconds, and then gradually cooled by a wind at 20 ° C. to 26 ° C. The lithographic printing plate precursors of Examples 1 to 23 and Comparative Examples 1 to 3 were prepared.
<下層用塗布液>
・表1に記載のアルカリ可溶性樹脂:表1に記載の添加量(例えば、実施例1では1.92部となる。)
・ノボラック樹脂(2,3-キシレノール/m-クレゾール/p-クレゾール比=10/20/70、重量平均分子量3,300):0.192部
・シアニン染料A(下記化合物):0.134部
・4,4’-ビスヒドロキシフェニルスルホン:0.126部
・無水テトラヒドロフタル酸:0.190部
・p-トルエンスルホン酸:0.008部
・3-メトキシ-4-ジアゾフェニルアミンヘキサフルオロホスフェート:0.032部
・エチルバイオレットの対イオンを6-ヒドロキシナフタレンスルホン酸に変えたもの:0.0781部
・ポリマー1(下記に示すポリマー):0.035部
・メチルエチルケトン:25.41部
・1-メトキシ-2-プロパノール:12.97部
・γ-ブチロラクトン:3.18部
<Coating liquid for lower layer>
-Alkali-soluble resin described in Table 1: The addition amount described in Table 1 (for example, in Example 1, it becomes 1.92 parts).
・ Novolak resin (2,3-xylenol / m-cresol / p-cresol ratio = 10/20/70, weight average molecular weight 3,300): 0.192 parts ・ Cyanine dye A (the following compound): 0.134 parts 4,4'-bishydroxyphenyl sulfone: 0.126 parts Tetrahydrophthalic anhydride: 0.190 parts p-Toluenesulfonic acid: 0.008 parts 3-Methoxy-4-diazophenylamine hexafluorophosphate: 0.032 parts-Ethyl violet counter ion changed to 6-hydroxynaphthalenesulfonic acid: 0.0781 parts-Polymer 1 (polymer shown below): 0.035 parts-Methyl ethyl ketone: 25.41 parts-1- Methoxy-2-propanol: 12.97 parts γ-butyrolactone: 3.18 parts
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
<上層用塗布液>
・m,p-クレゾールノボラック樹脂(m/p比=6/4、重量平均分子量4,500、未反応クレゾール0.8質量%含有):0.3479部
・ポリマー3(下記に示すポリマー):0.1403部
・シアニン染料A:表1に記載の添加量(例えば、実施例1では0.0192部となる。)
・ポリマー1:0.015部
・ポリマー2(下記に示すポリマー):0.00328部
・表1に記載のカチオン及びアニオンからなるスルホニウム塩化合物:表1に記載の添加量(例えば、実施例1では0.08部となる。)
・界面活性剤(メガファックF-780F、DIC(株)製:0.008部
・メチルエチルケトン:6.79部
・1-メトキシ-2-プロパノール:13.07部
<Upper layer coating liquid>
M, p-cresol novolac resin (m / p ratio = 6/4, weight average molecular weight 4,500, containing 0.8% by mass of unreacted cresol): 0.3479 parts Polymer 3 (polymer shown below): 0.1403 parts-Cyanine dye A: the addition amount described in Table 1 (for example, in Example 1, it becomes 0.0192 parts).
-Polymer 1: 0.015 part-Polymer 2 (polymer shown below): 0.00328 part-Sulfonium salt compound consisting of cation and anion described in Table 1: Addition amount described in Table 1 (for example, Example 1 Will be 0.08 parts.)
-Surfactant (Megafac F-780F, manufactured by DIC Corporation: 0.008 parts) -Methyl ethyl ketone: 6.79 parts-1-Methoxy-2-propanol: 13.07 parts
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
<平版印刷版原版の評価>
-現像ラチチュード評価-
 得られた平版印刷原版を、富士フイルム(株)製Luxel PLATESETTER T-9800HSにて、ビーム出力100%、ドラム回転速度150rpmの条件で、175lpi/2400dpiの網点面積率1~99%のチャートが入ったテストパターンを画像状に書き込み(露光)を行った。
 次に富士フイルム(株)製PSプロセッサーLP940H自動現像機を用い、現像温度30℃、現像時間12秒で現像を行った。この時、現像液は、富士フイルム(株)製現像液XP-DとXP-DRを稀釈及び混合して、電導度を80~100mS/cmの間で、2mS/cmおきに変えて使用した。
 現像液の液感が低い場合、露光部の現像が不十分となり、非画像部に残膜が発生する。また、現像液の液感が高い場合、未露光部の表面が現像され、膜減りを起こし、良好な画像が得られない。このように非画像部の残膜と画像部の膜減りとの両方が発生しない現像液の電導度の幅を、現像ラチチュードの指標として、各平版印刷版原版で評価した。評価基準を以下に示す。
<評価基準>
  5:膜減りする電導度-残膜発生電導度=5以上
  4:膜減りする電導度-残膜発生電導度=3より大きく5未満
  3:膜減りする電導度-残膜発生電導度=2より大きく3以下
  2:膜減りする電導度-残膜発生電導度=2以下
  1:いずれの電導度でも膜減り又は残膜発生
<Evaluation of original planographic printing plate>
-Development latitude evaluation-
The obtained lithographic printing original plate was subjected to a Luxel PLATESETTER T-9800HS manufactured by FUJIFILM Corporation under the conditions of a beam output of 100% and a drum rotation speed of 150 rpm to obtain a chart of a dot area ratio of 1 to 99% of 175 lpi / 2400 dpi. The entered test pattern was image-wise written (exposed).
Next, development was performed at a developing temperature of 30 ° C. and a developing time of 12 seconds using a PS processor LP940H automatic developing machine manufactured by FUJIFILM Corporation. At this time, the developing solution was prepared by diluting and mixing the developing solutions XP-D and XP-DR manufactured by FUJIFILM Corporation and changing the conductivity between 80 to 100 mS / cm and every 2 mS / cm. .
When the liquid feeling of the developing solution is low, the development in the exposed area becomes insufficient and a residual film is generated in the non-image area. Further, when the liquid feeling of the developing solution is high, the surface of the unexposed portion is developed and the film thickness is reduced, so that a good image cannot be obtained. The width of the electric conductivity of the developer in which neither the residual film in the non-image area nor the film loss in the image area was generated was evaluated for each lithographic printing plate precursor as an index of the development latitude. The evaluation criteria are shown below.
<Evaluation criteria>
5: Conduction to decrease film-conductivity of residual film = 5 or more 4: Conductivity to decrease film-conductivity of residual film = greater than 3 and less than 5 3: Conductivity of film decrease-conductivity of residual film = 2 Greater than 3 or less 2: Conductivity to decrease film-residual film generation Conductivity = 2 or less 1: Film decrease or residual film generation at any conductivity
-露光後経時現像性(やきだめ性)評価-
 (1)得られた平版印刷原版を、Creo社製Trendsetterにて、ビーム強度9W、ドラム回転速度150rpmで、テストパターンを画像状に書き込みを行った。その後、富士フイルム(株)製現像液XP-D(稀釈して、電導度43mS/cmとしたもの)を仕込んだ富士フイルム(株)製PSプロセッサーLP940Hを用い、現像温度30℃、現像時間12秒~20秒で現像を行った。この時、現像時間は、各水準の非画像部が完全に溶解し、それぞれが画像形成できる時間とした。
 (2)次に、得られた平版因印刷版原版を、Creo社製Trendsetterにて、ビーム強度9W、ドラム回転速度150rpmで、テストパターンを画像状に書き込みを行った。次に、露光した平版印刷版原版を、温度25℃、湿度70%RHの環境に30分間静置した。その後、富士フイルム(株)製現像液XP-D(稀釈して、電導度43mS/cmとしたもの)を仕込んだ富士フイルム(株)製PSプロセッサーLP940Hを用い、現像温度30℃、現像時間12秒~30秒で現像を行った。この時、現像時間は、各水準の非画像部が完全に溶解し、それぞれが画像形成できる時間とした。
 (1)と(2)の現像が完了する時間の差を求め、現像時間の差が短い程、露光後経時現像性がよいと評価した。
  5:(2)現像時間-(1)現像時間=0以上2秒以下
  4:(2)現像時間-(1)現像時間=2秒より大きく4秒以下
  3:(2)現像時間-(1)現像時間=4秒より大きく6秒以下
  2:(2)現像時間-(1)現像時間=6秒より大きく10秒以下
  1:(2)現像時間-(1)現像時間=10秒より大きい
-Evaluation of developability with time (exposure) after exposure-
(1) A test pattern was written in an image on the obtained lithographic printing plate precursor with a Trendsetter manufactured by Creo at a beam intensity of 9 W and a drum rotation speed of 150 rpm. After that, a developing processor XP-D (produced by FUJIFILM Corporation, diluted to have an electric conductivity of 43 mS / cm) was used, and a PS processor LP940H manufactured by FUJIFILM Corporation was used. The development was performed for 20 seconds to 20 seconds. At this time, the developing time was set to the time at which the non-image areas of each level were completely dissolved and the respective images could be formed.
(2) Next, the lithographic printing plate precursor thus obtained was image-wise written with a test pattern by a Trendsetter manufactured by Creo at a beam intensity of 9 W and a drum rotation speed of 150 rpm. Next, the exposed lithographic printing plate precursor was allowed to stand in an environment of a temperature of 25 ° C. and a humidity of 70% RH for 30 minutes. After that, a developing processor XP-D (produced by FUJIFILM Corporation, diluted to have an electric conductivity of 43 mS / cm) was used, and a PS processor LP940H manufactured by FUJIFILM Corporation was used. Development was carried out in seconds to 30 seconds. At this time, the developing time was set to the time at which the non-image areas of each level were completely dissolved and the respective images could be formed.
The difference between the completion times of development in (1) and (2) was determined, and the shorter the difference in development time was, the better the post-exposure aging developability was evaluated.
5: (2) development time- (1) development time = 0 or more and 2 seconds or less 4: (2) development time- (1) development time = more than 2 seconds and 4 seconds or less 3: (2) development time- (1 ) Development time = greater than 4 seconds and less than 6 seconds 2: (2) development time- (1) development time = greater than 6 seconds and less than 10 seconds 1: (2) development time- (1) development time = greater than 10 seconds
-耐薬品性評価-
 得られた平版印刷版原版を、3cm×3cmにカットし、画像記録層にクリーナー(富士フイルム(株)製、MC-E2)を滴下した。滴下後、3分間静置し、画像部を水洗し、自然乾燥させた。乾燥完了した版のクリーナーを滴下した領域の濃度を、エックスライト社製反射濃度系(X-Rite eXact)で測定し、クリーナー処理前の画像記録層との濃度差を求め、耐薬品性を評価した。クリーナー処理前後の画像記録層の濃度差が小さい程、耐薬品性が優れる。
  5:濃度差3%未満
  4:濃度差3%以上5%未満
  3:濃度差5%以上10%未満
  2:濃度差10%以上20%未満
  1:濃度差20%以上
-Chemical resistance evaluation-
The obtained lithographic printing plate precursor was cut into 3 cm × 3 cm, and a cleaner (manufactured by FUJIFILM Corporation, MC-E2) was dropped on the image recording layer. After the dropping, the mixture was allowed to stand for 3 minutes, the image area was washed with water, and naturally dried. The density of the area of the dried plate where the cleaner was dripped was measured with the X-Rite reflection density system (X-Rite eXact), and the difference in density from the image recording layer before the cleaner treatment was calculated to evaluate the chemical resistance. did. The smaller the density difference between the image recording layer before and after the cleaner treatment, the better the chemical resistance.
5: Density difference of less than 3% 4: Density difference of 3% or more and less than 5% 3: Density difference of 5% or more and less than 10% 2: Density difference of 10% or more and less than 20% 1: Density difference of 20% or more
-現像カス(シリケートカス)抑制性評価-
 得られた平版印刷原版を、Creo社製Trendsetterにて、ビーム強度9W、ドラム回転速度150rpmで全面露光した。露光した版を、下記(1)~(3)の手順に従って、現像カス(シリケートカス)の評価を行った。
 (1)18cm×10cmにカットした露光版2枚を、バットに入れた表1に記載の現像液に浸漬させて、溶解させた。
 (2)露光版を溶解させた現像液を樹脂製容器に移して、1晩静置した。
 (3)静置した現像液のカス状態を目視により、下記評価基準に従って評価した。
  5:上記(1)における現像時にカス無し。1昼夜、静置でカス無し。
  4:上記(1)における現像時に少しカス有り。1昼夜、静置でカス無し。
  3:上記(1)における現像時にカス有り。1昼夜、静置でカス無し。
  2:上記(1)における現像時にカス有り。1昼夜、静置で若干カス有り。
  1:上記(1)における現像時にカス有り。1昼夜、静置でカス有り。
-Development residue (silicate residue) inhibition evaluation-
The obtained lithographic printing plate precursor was exposed on the entire surface with a Trendsetter manufactured by Creo at a beam intensity of 9 W and a drum rotation speed of 150 rpm. The exposed plate was evaluated for development residue (silicate residue) according to the following procedures (1) to (3).
(1) Two exposure plates cut into a size of 18 cm × 10 cm were immersed in the developing solution shown in Table 1 placed in a bat and dissolved.
(2) The developing solution in which the exposure plate was dissolved was transferred to a resin container and left standing overnight.
(3) The state of dregs of the stationary developer was visually evaluated according to the following evaluation criteria.
5: No debris during development in (1) above. One day and night, leave it at rest without any residue.
4: There is some dust during the development in (1) above. One day and night, leave it at rest without any residue.
3: There is residue during development in (1) above. One day and night, leave it at rest without any residue.
2: There is dust during the development in (1) above. One day and night, there is some residue after standing.
1: There is dust at the time of development in (1) above. One day and night, there is residue after standing.
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000023
 表1における構成単位aは、上記式(1)で表される構成単位を表し、構成単位bは上記側鎖にフェノール性水酸基を有する構成単位を表し、構成単位cは、上記式(2)で表される構成単位を表す。
 また、表1に記載のアルカリ可溶性樹脂の組成比(mol比)は、表1の左に記載の構成単位から順に記載したものであり、例えば、実施例6では、a-1が28モル%、b-1が26モル%、c-1が20モル%、d-1が6モル%、及び、d-2が20モル%である。
 更に、表1に記載の各略号の詳細を、以下に示す。
 a-1~a-3:下記に示す構成単位
The structural unit a in Table 1 represents a structural unit represented by the formula (1), the structural unit b represents a structural unit having a phenolic hydroxyl group in the side chain, and the structural unit c represents the structural formula (2). Represents a structural unit represented by.
Further, the composition ratio (mol ratio) of the alkali-soluble resin shown in Table 1 is described in order from the structural unit shown on the left of Table 1, and for example, in Example 6, a-1 is 28 mol%. , B-1 is 26 mol%, c-1 is 20 mol%, d-1 is 6 mol%, and d-2 is 20 mol%.
Further, details of each abbreviation shown in Table 1 are shown below.
a-1 to a-3: structural units shown below
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
 b-1~b-3:下記に示す構成単位 B-1 to b-3: Structural units shown below
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 c-1:下記に示す構成単位 C-1: Structural unit shown below
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 d-1及びd-2:下記に示す構成単位 D-1 and d-2: structural units shown below
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 シアニン染料B:下記化合物 Cyanine dye B: the following compound
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
 ca-1~ca-5:下記カチオン Ca-1 to ca-5: the following cations
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 an-1~an-4:下記アニオン An-1 to an-4: the following anions
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
(実施例21)
 実施例1と同様にして得られた支持体上に、下記組成の単層用塗布液を塗布量が1.2g/mとなるよう塗布、乾燥して記録層を形成し、実施例21の平版印刷版原版を得た。
(Example 21)
On a support obtained in the same manner as in Example 1, a single layer coating solution having the following composition was applied so that the coating amount was 1.2 g / m 2, and dried to form a recording layer. I got the original planographic printing plate.
<単層用塗布液>
・実施例1に記載のアルカリ可溶性樹脂:2.625部
・m,p-クレゾールノボラック樹脂(m/p比=6/4、重量平均分子量4,500、未反応クレゾール0.8質量%含有):0.525部
・シアニン染料A:0.15部
・4,4’-ビスヒドロキシフェニルスルホン:0.225部
・無水テトラヒドロフタル酸:0.3部
・p-トルエンスルホン酸:0.015部
・3-メトキシ-4-ジアゾフェニルアミンヘキサフルオロホスフェート:0.045部
・エチルバイオレットの対イオンを6-ヒドロキシナフタレンスルホン酸に変えたもの:0.1125部
・界面活性剤(メガファックF-780F,DIC(株)製):0.0525部
・メチルエチルケトン:22.5部
・1-メトキシ-2-プロパノール:11.25部
・γ-ブチロラクトン:11.25部
・実施例1に記載のカチオン及びアニオンからなるスルホニウム塩化合物:0.516部
<Single layer coating liquid>
-Alkali-soluble resin described in Example 1: 2.625 parts-m, p-cresol novolac resin (m / p ratio = 6/4, weight average molecular weight 4,500, containing 0.8% by mass of unreacted cresol) : 0.525 part Cyanine dye A: 0.15 part 4,4'-bishydroxyphenyl sulfone: 0.225 part Tetrahydrophthalic anhydride: 0.3 part p-Toluenesulfonic acid: 0.015 part・ 3-Methoxy-4-diazophenylamine hexafluorophosphate: 0.045 part ・ Ethyl violet counter ion changed to 6-hydroxynaphthalenesulfonic acid: 0.1125 part ・ Surfactant (MegaFac F-780F , DIC Co., Ltd .: 0.0525 parts, methyl ethyl ketone: 22.5 parts, 1-methoxy-2-propanol: 11.25 parts, γ-bu Rorakuton: 11.25 parts Example 1 consisting of cations and anions described sulfonium salt compound: 0.516 parts
 得られた平版印刷版原版を用い、実施例1と同様な方法により、評価を行った。
 評価結果は、現像ラチチュード:4、露光後経時現像性:5、耐薬品性:5、現像カス抑制性:5であった。
Using the obtained lithographic printing plate precursor, evaluation was performed in the same manner as in Example 1.
The evaluation results were: development latitude: 4, post-exposure aging developability: 5, chemical resistance: 5, and development residue suppression property: 5.
 表1及び実施例21に記載した結果から、本開示に係る平版印刷版原版である実施例1~21の平版印刷版原版は、比較例1~3の平版印刷版原版と比べ、露光後経時現像性に優れ、得られる平版印刷版の耐薬品性に優れる。
 また、本開示に係る平版印刷版原版である実施例1~21の平版印刷版原版は、現像ラチチュードにも優れた平版印刷版が得られることがわかる。
From the results shown in Table 1 and Example 21, the lithographic printing plate precursors of Examples 1 to 21 which are the lithographic printing plate precursors according to the present disclosure were compared with the lithographic printing plate precursors of Comparative Examples 1 to 3 after the exposure. Excellent developability and excellent chemical resistance of the resulting lithographic printing plate.
Further, it is understood that the lithographic printing plate precursors of Examples 1 to 21 which are the lithographic printing plate precursors according to the present disclosure can provide lithographic printing plates excellent in development latitude.
 2018年10月17日に出願された日本国特許出願第2018-196148号の開示は、その全体が参照により本明細書に取り込まれる。
 本明細書に記載された全ての文献、特許出願、及び、技術規格は、個々の文献、特許出願、及び、技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。
The disclosure of Japanese Patent Application No. 2018-196148 filed on Oct. 17, 2018 is incorporated herein by reference in its entirety.
All documents, patent applications, and technical standards mentioned in this specification are to the same extent as if each individual document, patent application, and technical standard were specifically and individually noted to be incorporated by reference. Are incorporated herein by reference.
1 アルミニウム板
2,4 ローラ状ブラシ
3 研磨スラリー液
5,6,7,8 支持ローラ
11 アルミニウムウエブ
12 ラジアルドラムローラ
13a,13b 主極
14 電解処理液
15a,15b 電解液供給口
16 スリット
17 電解液通路
18 補助陽極
19a,19b サイリスタ
20 交流電源
40,41 主電解槽
50,51 補助陽極槽
62a 第一給電部
62b 第二給電部
63a 第一電解部
63b 第二電解部
64a,64b 支持ローラ
65a 第一給電電極
65b 第二給電電極
66a,66b,66c,66d 電解電極
67a,67b,67c,67d 電源
I 電流値
Ip 電流のピーク
t 時間
TP 電流値がゼロからピークに達するまでの時間
1 Aluminum Plate 2, 4 Roller Brush 3 Polishing Slurry Liquid 5, 6, 7, 8 Support Roller 11 Aluminum Web 12 Radial Drum Rollers 13a, 13b Main Electrode 14 Electrolytic Treatment Liquids 15a, 15b Electrolyte Supply Port 16 Slit 17 Electrolyte Passage 18 Auxiliary anode 19a, 19b Thyristor 20 AC power supply 40, 41 Main electrolysis tank 50, 51 Auxiliary anode tank 62a First power supply section 62b Second power supply section 63a First electrolysis section 63b Second electrolysis section 64a, 64b Support roller 65a One feeding electrode 65b Second feeding electrodes 66a, 66b, 66c, 66d Electrolytic electrodes 67a, 67b, 67c, 67d Power source I Current value Ip Current peak t time TP Time until current value reaches zero peak

Claims (10)

  1.  支持体上に画像記録層を有し、
     前記画像記録層が、下記式(1)で表される構成単位と側鎖にフェノール性水酸基を有する構成単位と下記式(2)で表される構成単位とを有するアルカリ可溶性樹脂、赤外線吸収剤、及び、第4級アンモニウム塩化合物を含む
     平版印刷版原版。
    Figure JPOXMLDOC01-appb-C000001

     式(1)中、Rは、アルキル基又はアリール基を表す。
    Having an image recording layer on a support,
    An alkali-soluble resin and an infrared absorbing agent in which the image recording layer has a constitutional unit represented by the following formula (1), a constitutional unit having a phenolic hydroxyl group in a side chain, and a constitutional unit represented by the following formula (2). And a lithographic printing plate precursor containing a quaternary ammonium salt compound.
    Figure JPOXMLDOC01-appb-C000001

    In formula (1), R represents an alkyl group or an aryl group.
  2.  前記第4級アンモニウム塩化合物における対アニオンが、スルホン酸イオン、カルボン酸イオン、ハロゲン原子を有する無機酸イオン、又は、ハロゲン化物イオンである請求項1に記載の平版印刷版原版。 The lithographic printing plate precursor according to claim 1, wherein the counter anion in the quaternary ammonium salt compound is a sulfonate ion, a carboxylate ion, an inorganic acid ion having a halogen atom, or a halide ion.
  3.  前記画像記録層が、上層及び下層を有する請求項1又は請求項2に記載の平版印刷版原版。 The lithographic printing plate precursor according to claim 1 or 2, wherein the image recording layer has an upper layer and a lower layer.
  4.  前記上層が、前記赤外線吸収剤、及び、前記第4級アンモニウム塩化合物を含み、前記下層が、前記アルカリ可溶性樹脂を含む請求項3に記載の平版印刷版原版。 The lithographic printing plate precursor according to claim 3, wherein the upper layer contains the infrared absorber and the quaternary ammonium salt compound, and the lower layer contains the alkali-soluble resin.
  5.  前記上層における前記第4級アンモニウム塩化合物の含有量が、0.06g/m以上0.10g/m以下である請求項4に記載の平版印刷版原版。 The lithographic printing plate precursor according to claim 4, wherein the content of the quaternary ammonium salt compound in the upper layer is 0.06 g / m 2 or more and 0.10 g / m 2 or less.
  6.  前記アルカリ可溶性樹脂の重量平均分子量が、10,000~200,000である請求項1~請求項5のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate precursor according to any one of claims 1 to 5, wherein the alkali-soluble resin has a weight average molecular weight of 10,000 to 200,000.
  7.  前記アルカリ可溶性樹脂の重量平均分子量が、40,000~100,000である請求項1~請求項6のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate precursor according to any one of claims 1 to 6, wherein the alkali-soluble resin has a weight average molecular weight of 40,000 to 100,000.
  8.  ノンシリケート現像用平版印刷版原版である請求項1~請求項7のいずれか1項に記載の平版印刷版原版。 The lithographic printing plate precursor according to any one of claims 1 to 7, which is a lithographic printing plate precursor for non-silicate development.
  9.  請求項1~請求項8のいずれか1項に記載の平版印刷版原版を赤外線レーザーを用いて画像様に露光する工程、及び、
     シリケート化合物を含まないpH9以上のアルカリ現像液を用いて現像する工程を含む
     平版印刷版の作製方法。
    A step of imagewise exposing the lithographic printing plate precursor according to any one of claims 1 to 8 using an infrared laser;
    A method for producing a lithographic printing plate, comprising a step of developing using an alkali developer having a pH of 9 or more containing no silicate compound.
  10.  前記アルカリ現像液の液活性を、前記アルカリ現像液の電導度で測定し、測定された測定値に従って補充液を加えて、目標の電導度となるように調整し、液活性を制御する工程を含む請求項9に記載の平版印刷版の作製方法。 A step of controlling the liquid activity of the alkaline developer by measuring the conductivity of the alkaline developer, adding a replenisher according to the measured value, and adjusting the conductivity to a target conductivity. The method for producing a lithographic printing plate according to claim 9, which comprises:
PCT/JP2019/038263 2018-10-17 2019-09-27 Planographic printing plate precursor, and production method for planographic printing plate WO2020080068A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007025354A (en) * 2005-07-19 2007-02-01 Fujifilm Holdings Corp Image forming material
JP2007321104A (en) * 2006-06-02 2007-12-13 Okamoto Kagaku Kogyo Kk Original plate for lithographic printing plate
JP2009085983A (en) * 2007-09-27 2009-04-23 Fujifilm Corp Photosensitive lithographic printing plate precursor for infrared laser
JP2009294352A (en) * 2008-06-04 2009-12-17 Konica Minolta Medical & Graphic Inc Resin composition for printing plate material and lithographic printing plate material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007025354A (en) * 2005-07-19 2007-02-01 Fujifilm Holdings Corp Image forming material
JP2007321104A (en) * 2006-06-02 2007-12-13 Okamoto Kagaku Kogyo Kk Original plate for lithographic printing plate
JP2009085983A (en) * 2007-09-27 2009-04-23 Fujifilm Corp Photosensitive lithographic printing plate precursor for infrared laser
JP2009294352A (en) * 2008-06-04 2009-12-17 Konica Minolta Medical & Graphic Inc Resin composition for printing plate material and lithographic printing plate material

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