WO2020073397A1 - 一种查找表的制作方法、显示面板的制作方法及显示装置 - Google Patents

一种查找表的制作方法、显示面板的制作方法及显示装置 Download PDF

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Publication number
WO2020073397A1
WO2020073397A1 PCT/CN2018/114273 CN2018114273W WO2020073397A1 WO 2020073397 A1 WO2020073397 A1 WO 2020073397A1 CN 2018114273 W CN2018114273 W CN 2018114273W WO 2020073397 A1 WO2020073397 A1 WO 2020073397A1
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Prior art keywords
photoresist layer
display panel
photoresist
baking
manufacturing
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English (en)
French (fr)
Inventor
何怀亮
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HKC Co Ltd
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HKC Co Ltd
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Priority to US16/320,490 priority Critical patent/US11435725B2/en
Publication of WO2020073397A1 publication Critical patent/WO2020073397A1/zh
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/4183—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by data acquisition, e.g. workpiece identification
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G02F1/13415—Drop filling process
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/35—Nc in input of data, input till input file format
    • G05B2219/35172—Lookup tables for technology, machining parameters
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45031—Manufacturing semiconductor wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Definitions

  • the present application relates to the field of display technology, and in particular, to a method for manufacturing a lookup table, a method for manufacturing a display panel, and a display device.
  • the displays on the market are generally controlled based on active switches, which have many advantages such as thin body, power saving, no radiation, etc., and have been widely used, mainly including liquid crystal displays, OLED (Organic Light-Emitting Diode) displays, QLED (Quantum Dot Light (Emitting Diodes) displays, plasma displays, etc. From the perspective of appearance structure, there are both flat displays and curved displays.
  • the present application provides a method for manufacturing a look-up table, a method for manufacturing a display panel, and a display device.
  • the manufacturing method includes:
  • the film thickness of each photoresist layer is measured to obtain a graph of the baking time of the photoresist layer versus the film thickness;
  • the preset time includes a first preset time and a second preset time. After the preset time interval, the film thickness of each photoresist layer is measured to obtain the photoresist layer ’s thickness.
  • the method of the curve graph of baking time versus film thickness includes:
  • the photoresist layer is placed in the baking furnace for baking;
  • the film thickness of the photoresist layer is measured once every second preset time
  • a graph of the baking time of the photoresist layer versus the film thickness is obtained.
  • the first preset time is equal to the baking time of the photoresist layer in the manufacturing process of the display panel, the first preset time is 20 minutes to 60 minutes, and the second preset time More than 3 minutes.
  • a method for respectively forming a single layer of different types of photoresist layers on the corresponding plurality of plain glass substrates includes:
  • a photomask process is performed on the photoresist material layer by using a corresponding preset photomask to form a photoresist layer.
  • the preset photomask and the photomask of the photoresist layer in the manufacturing process of the display panel are the same photomask.
  • the preset temperature is equal to the baking temperature of the photoresist layer in the manufacturing process of the display panel, and the preset temperature is 220 degrees Celsius to 260 degrees Celsius.
  • the photoresist layer includes a black matrix photoresist layer, a red photoresist layer, a green photoresist layer, a blue photoresist layer, a white photoresist layer, and a spacer photoresist layer.
  • the application also discloses a method for manufacturing a display panel, which uses the look-up table manufactured as described above.
  • the method includes:
  • the first substrate and the second substrate are arranged in a box to form a display panel.
  • the method for calculating the box thickness of the display panel corresponding to the setting sequence and the baking time includes:
  • the cell thickness of the display panel is calculated corresponding to the film thickness of each photoresist layer.
  • the present application also discloses a display device including a control component and a display panel produced by the method for controlling the amount of liquid crystal as described above.
  • Change the graph, and fit the curve to correct the curve, establish a look-up table, according to the look-up table can effectively detect the change of the film thickness of the substrate, and then calculate the display panel box thickness, corresponding to the calculation of the drop of liquid crystal , Solve the problem of bubbles or color difference in the display panel.
  • 1 is a graph of baking time and film thickness of a black matrix photoresist layer according to an embodiment of the present application
  • FIG. 2 is a graph of film thickness and baking time of a red photoresist layer according to an embodiment of the present application
  • FIG. 3 is a graph of post-film and baking time of a green photoresist layer according to an embodiment of the present application
  • FIG. 5 is a graph of various physical properties and baking time of a spacer photoresist layer according to an embodiment of the present application
  • FIG. 6 is a schematic diagram of a display panel according to an embodiment of the present application.
  • FIG. 7 is a flowchart of a method for manufacturing a lookup table according to an embodiment of the present application.
  • FIG. 8 is a flowchart of a method for manufacturing a display panel according to an embodiment of the present application.
  • FIG. 9 is a schematic diagram of the relationship between the thickness of Li Zhong cell and the amount of liquid crystal in the embodiment of the present application.
  • features defined as “first” and “second” may explicitly or implicitly include one or more of the features.
  • the meaning of “plurality” is two or more.
  • the term “including” and any variations thereof are intended to cover non-exclusive inclusions.
  • connection should be understood in a broad sense, for example, it can be fixed or detachable Connected, or connected integrally; either mechanically or electrically; directly connected, or indirectly connected through an intermediary, or internally connected between two components.
  • installation should be understood in a broad sense, for example, it can be fixed or detachable Connected, or connected integrally; either mechanically or electrically; directly connected, or indirectly connected through an intermediary, or internally connected between two components.
  • an embodiment of the present application discloses a method for manufacturing a lookup table.
  • the manufacturing method includes:
  • a single layer of different types of photoresist layers 130 are formed on multiple pieces of plain glass substrates 140 to facilitate accurate calculation of the film thickness after baking, and the preset temperature is used for the photoresist layer 130 on the plain glass substrates 140 Baking, to ensure that each photoresist layer 130 is baked in the same time, to ensure that the film thickness is accurately calculated, after a preset preset time interval, the film thickness of the photoresist layer 130 is measured to obtain light
  • a graph of the baking time of the resist layer 130 against the film thickness change, and the curve is fitted and corrected to establish a look-up table, which can effectively detect the change in the film thickness of the substrate according to the look-up table, and then calculate the display panel 100
  • the cell thickness corresponds to the calculation of the dripping amount of liquid crystal to solve the problem of bubbles or color difference in the display panel 100.
  • the preset time includes a first preset time and a second preset time. After the preset time interval, the film thickness of each photoresist layer 130 is measured to obtain the The method of the graph of the baking time of the photoresist layer 130 versus the film thickness includes:
  • the film thickness of the photoresist layer 130 is measured
  • the photoresist layer 130 is placed in the baking furnace for baking;
  • the film thickness of the photoresist layer 130 is measured once every second preset time interval
  • a graph of the baking time of the photoresist layer 130 versus the film thickness is obtained.
  • the preset time interval includes the first preset time and the second preset time.
  • the film thickness of the photoresist layer 130 is measured after cooling to ensure the measurement
  • the thickness of the film is an accurate measurement value to prevent errors due to thermal expansion and contraction.
  • the photoresist layer 130 is placed in a baking furnace for baking, and the photoresist layer is measured every second preset time interval 130 film thickness, each measurement is measured after cooling. After multiple measurements, a graph of the change of the baking time of the photoresist layer 130 to the film thickness is obtained. Multiple baking can achieve accurate film thickness changes, which is convenient The cell thickness of the display panel 100 is calculated, and the dripping amount of liquid crystal is accurately calculated.
  • the first preset time is equal to the baking time of the photoresist layer in the manufacturing process of the display panel 100, and the first preset time is 20 minutes to 60 minutes. 2. The preset time is greater than 3 minutes.
  • the first preset time is equal to the baking time of the photoresist layer in the process of the display panel 100, that is, the baking time of the photoresist layer in the process of the display panel 100 is the first preset time; due to the difference
  • the baking time of the photoresist layer is different, and different types of display panels have different film thickness requirements, and the corresponding baking time is also different. Therefore, the first preset time ranges from 20 minutes to 60 minutes, the second preset When the time is greater than 3 minutes, the film thickness of different photoresist layers at different times can be obtained, and it is beneficial to look up the table to obtain the thickness value.
  • the first preset time may be set to 24 minutes, and the second preset time may be set to 6 minutes.
  • the first preset time is 24 minutes
  • the second preset time is 6 minutes
  • the two preset times are the preferred baking time
  • the formation of the photoresist is gradually completed in the process of the display panel 100 Therefore, the photoresist formed first needs to be baked several times for 24 minutes, so the second preset time of the photoresist layer 130 in this solution is 6 minutes, 24 minutes is a multiple of 6, which is easier to find Corresponding film thickness changes.
  • a method for respectively forming a single layer of different types of photoresist layers 130 on the corresponding plurality of plain glass substrates 140 includes:
  • a photomask process is performed on the photoresist material layer using a corresponding preset photomask to form the photoresist layer 130.
  • the preset photomask and the photomask of the photoresist layer in the manufacturing process of the display panel 100 are the same photomask.
  • the same preset photomask is used for the photomask process, because the film thickness is obtained by multi-point detection and the average value is obtained, so the same photomask should be used for the photomask process to reduce the variables. Therefore, it is convenient to obtain accurate film thickness measurement values, and further calculate the box thickness of the display panel 100.
  • the preset temperature is equal to the baking temperature of the photoresist layer in the manufacturing process of the display panel 100, and the preset temperature is 220 degrees Celsius to 260 degrees Celsius.
  • the corresponding baking temperatures are also different, so different baking temperatures range from 220 degrees Celsius to 260 Between degrees Celsius, different photoresist layers can reach a more suitable baking temperature, and at the same time, the photoresist layer 130 can be fully baked, and the actual baking temperature is also in this range, reducing errors caused by temperature and making the photoresist layer
  • the film thickness measurement of 130 is more accurate, which facilitates accurate calculation of the cell thickness of the display panel 100, and then accurately calculates the dripping amount of liquid crystal, to prevent problems such as bubbles or color difference in the display panel 100.
  • the preset temperature may be set to 230 degrees Celsius.
  • 230 degrees Celsius is the preferred baking temperature, and 230 degrees Celsius is used in the actual display panel 100 manufacturing process. Therefore, using the actual display panel 100 baking temperature can reduce the error caused by the temperature.
  • the film thickness measurement of the photoresist layer 130 is more accurate, which facilitates accurate calculation of the cell thickness of the display panel 100, and then accurately calculates the dripping amount of liquid crystal, to prevent the display panel 100 from having problems such as bubbles or color difference.
  • the photoresist layer 130 includes a black matrix photoresist layer 131, a red photoresist layer 132, a green photoresist layer 133, a blue photoresist layer 134, a white photoresist layer 135, and a spacer photoresist layer 136.
  • the photoresist layer 130 includes a black matrix photoresist layer 131, a red photoresist layer, a green photoresist layer 133, a blue photoresist layer 134, a white photoresist layer 135, and a spacer unit photoresist layer 136.
  • all the photoresist layers 130 are detected, which is convenient and accurate to measure the film thickness of each photoresist layer 130, so as to accurately calculate the cell thickness of the display panel 100, and then accurately calculate the dripping amount of liquid crystal.
  • the problems such as bubbles or chromatic aberration caused by the dripping amount of liquid crystal to the display panel 100 are reduced.
  • a manufacturing method of the display panel 100 which uses the lookup table manufactured as described above, and the method includes:
  • the manufacturing method of the display panel 100 includes obtaining the setting order and baking time of different types of photoresist layers 130 to facilitate finding the film thickness at different baking times, and then calculating the box thickness of the display panel 100, The liquid crystal drip amount is controlled according to the cell thickness of the display panel 100, thereby further reducing the problems such as bubbles or chromatic aberration caused by the liquid crystal drip amount to the display panel 100.
  • the method for calculating the box thickness of the display panel 100 corresponding to the setting sequence and the baking time includes:
  • the cell thickness of the display panel 100 is calculated corresponding to the film thickness of each photoresist layer 130.
  • the manufacturing method of the display panel 100 is that the setting order of the photoresist layer 130 and the baking time calculate the baking time of each photoresist layer 130, and find each corresponding layer according to the baking time
  • the thickness of the photoresist is used to calculate the cell thickness of the display panel 100 according to the thickness of the photoresist, so that the dripping amount of liquid crystal can be calculated, and the production of the display panel 100 is completed.
  • a display device including: a control component, and a display panel 100 produced by the manufacturing method of the display panel 100 as described above.
  • a display device includes a control component, which finds the baking time of the photoresist layer 130 and the corresponding film thickness according to a look-up table, accurately calculates the cell thickness of the display panel 100, and then calculates the amount of liquid crystal dripping, reducing Because of the bubbles or chromatic aberration caused by the liquid crystal problem to the display panel 100, the quality problem of the display panel 100 is solved, and the production yield of the display panel 100 is increased.
  • the panel of this application can be a TN panel (full name Twisted Nematic), an IPS panel (In-Pane Switching), a VA panel (Vertical Alignment), and of course, it can Other types of panels can be applied.
  • TN panel full name Twisted Nematic
  • IPS panel In-Pane Switching
  • VA panel Very Alignment

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Automation & Control Theory (AREA)
  • Liquid Crystal (AREA)

Abstract

一种查找表的制作方法、显示面板(100)的制作方法及显示装置，包括形成不同光阻层(130)；烘烤光阻层(130)；测量光阻层(130)膜厚，获得时间对膜厚曲线图；根据曲线图，建立查找表。

Description

一种查找表的制作方法、显示面板的制作方法及显示装置
本申请要求于2018年10月08日提交中国专利局，申请号为CN201811168119.4，发明名称为“一种查找表的制作方法、显示面板的制作方法及显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术领域，尤其涉及一种查找表的制作方法、显示面板的制作方法及显示装置。
背景技术
这里的陈述仅提供与本申请相关的背景信息，而不必然地构成现有技术。市场上的显示器一般都基于主动开关进行控制，具有机身薄、省电、无辐射等众多优点，得到了广泛的应用，主要包括液晶显示器、OLED(Organic Light-Emitting Diode)显示器、QLED(Quantum Dot Light Emitting Diodes)显示器、等离子显示器等、从外观结构来看，既有平面型显示器、也有曲面型显示器。
显示器技术在不断进步，但是也存在着一些问题，例如显示面板经常会有气泡或色差问题，以及面板的色饱和度或穿透率无法满足需求等问题。
技术解决方案
鉴于上述缺陷，本申请提供一种查找表的制作方法、显示面板的制作方法及显示装置。
为实现上述目的，本申请提供了一种查找表的制作方法，所述制作方法包括：
对应多块素玻璃基板上分别形成单层不同类型的光阻层；
采用预设温度对所述素玻璃基板上的所述光阻层进行烘烤；
间隔预设时间后对每个所述光阻层的膜厚进行测量，获得所述光阻层的烘烤时间对膜厚变化的曲线图；
对所述曲线图进行拟合和修正，建立查找表。
可选的，所述预设时间包括第一预设时间和第二预设时间，所述间隔预设时间后对每个所述光阻层的膜厚进行测量，获得所述光阻层的烘烤时间对膜厚变化的曲线图的方法包括：
在烘烤炉中烘烤第一预设时间后；
冷却后测量所述光阻层的膜厚；
测量完毕后再将所述光阻层放入所述烘烤炉中进行烘烤；
每间隔第二预设时间均测量一次所述光阻层膜厚；
获得所述光阻层的烘烤时间对膜厚变化的曲线图。
可选的，所述第一预设时间与所述光阻层在显示面板的制程中的烘烤时间相等，所述第一预设时间为20分钟至60分钟，所述第二预设时间大于3分钟。
可选的，所述对应多块素玻璃基板上分别形成单层不同类型的光阻层的方法包括：
在多块素玻璃基板上分别涂布单层不同类型的光阻材料层；
采用对应的预设光罩对所述光阻材料层进行光罩制程形成光阻层。
可选的，所述预设光罩与所述光阻层在显示面板的制程中的光罩为同一光罩。
可选的，所述预设温度与所述光阻层在显示面板的制程中的烘烤温度相等，所述预设温度为220摄氏度至260摄氏度。
可选的，所述光阻层包括黑矩阵光阻层、红光阻层、绿光阻层、蓝光阻层、白光阻层和间隔单元光阻层。
本申请还公开一种显示面板的制作方法，采用如上所述制作的查找表，所述方法包括：
在玻璃基板上采用不同得光罩制程，形成设有不同类型的光阻层的第一基板；
获取不同类型的光阻层的设置顺序和烘烤时间；
对应所述设置顺序和所述烘烤时间计算显示面板的盒厚；
根据所述盒厚控制液晶的滴入量；
将第一基板和第二基板进行对盒设置，形成显示面板。
可选的，所述对应所述设置顺序和所述烘烤时间计算显示面板的盒厚的方法包括：
对应所述设置顺序和所述烘烤时间计算每层所述光阻层烘烤的总时间；
根据每层所述光阻层烘烤的总时间对应查询所述查找表，获得每 层所述光阻层的膜厚；
对应每层所述光阻层的膜厚计算显示面板的盒厚。
本申请还公开一种显示装置，包括控制部件，以及包括采用如上所述的控制液晶量的方法生产的显示面板。
相对于彩膜基板(color filter CF)上的色层经过多次后制程后都会有一定程度的膜缩，这就造成后续滴液晶量的差异，引起面板的气泡或色差的方案来说，本申请在多块素玻璃基板上分别形成单层不同类型的光阻层，方便准确计算烘烤后的膜厚，采用预设温度对素玻璃基板上的光阻层进行烘烤，保证每一个光阻层都在相同的时间内进行烘烤，保证准确计算膜厚，在设定的预设时间的间隔后，对光阻层的膜厚进行测量，获得光阻层的烘烤时间对膜厚变化的曲线图，并对曲线图进行拟合修正，建立查找表，根据查找表可有效的查出基板的膜厚的变化，进而计算出显示面板的盒厚，对应计算出液晶的滴入量，解决显示面板的气泡或色差的问题。
附图说明
所包括的附图用来提供对本申请实施例的进一步的理解，其构成了说明书的一部分，用于例示本申请的实施方式，并与文字描述一起来阐释本申请的原理。显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。在附图中：
图1是本申请实施例一种黑矩阵光阻层的烘烤时间与膜厚的曲线 图；
图2是本申请实施例一种红光阻层的膜厚与烘烤时间的曲线图；
图3是本申请实施例一种绿光阻层的膜后与烘烤时间的曲线图；
图4是本申请实施例一种蓝光阻层的膜后与烘烤时间的曲线图；
图5是本申请实施例一种间隔单元光阻层的各种物理性能与烘烤时间的曲线图；
图6是本申请实施例一种显示面板的示意图；
图7是本申请实施例一种查找表的制作方法流程图；
图8是本申请实施例一种显示面板的制作方法流程图；
图9是本申请实施例李忠盒厚与液晶量的关系示意图。
本申请的实施方式
这里所公开的具体结构和功能细节仅仅是代表性的，并且是用于描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定 有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本申请中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面结合附图和实施例对本申请作进一步说明。
如图1至图7和图9所示，本申请实施例公布了一种查找表的制作方法，所述制作方法包括：
S71：对应多块素玻璃基板140上分别形成单层不同类型的光阻层130；
S72：采用预设温度对所述素玻璃基板140上的所述光阻层130进行烘烤；
S73：间隔预设时间后对每个所述光阻层130的膜厚进行测量，获得所述光阻层130的烘烤时间对膜厚变化的曲线图；
S74：对所述曲线图进行拟合和修正，建立查找表。
本方案中，在多块素玻璃基板140上分别形成单层不同类型的光阻层130，方便准确计算烘烤后的膜厚，采用预设温度对素玻璃基板140上的光阻层130进行烘烤，保证每一个光阻层130都在相同的时间内进行烘烤，保证准确计算膜厚，在设定的预设时间的间隔后，对光阻层130的膜厚进行测量，获得光阻层130的烘烤时间对膜厚变化的曲线图，并对曲线图进行拟合修正，建立查找表，根据查找表可有效的查出基板的膜厚的变化，进而计算出显示面板100的盒厚，对应计算出液晶的滴入量，解决显示面板100的气泡或色差的问题。
本实施例可选的，所述预设时间包括第一预设时间和第二预设时间，所述间隔预设时间后对每个所述光阻层130的膜厚进行测量，获得所述光阻层130的烘烤时间对膜厚变化的曲线图的方法包括：
在烘烤炉中烘烤第一预设时间后；
冷却后测量所述光阻层130的膜厚；
测量完毕后再将所述光阻层130放入所述烘烤炉中进行烘烤；
每间隔第二预设时间均测量一次所述光阻层130膜厚；
获得所述光阻层130的烘烤时间对膜厚变化的曲线图。
本方案中，间隔的预设时间包括第一预设时间和第二预设时间，在烘烤炉中烘烤第一预设时间后，冷却后进行测量光阻层130的膜厚，保证测量的膜厚为准确测量值，防止由于热胀冷缩产生误差，测量完毕后，再将光阻层130放入烘烤炉中进行烘烤，每间隔第二预设时间均测量一次光阻层130膜厚，每次测量均在冷却后的测量，多次测量后，得到光阻层130的烘烤时间对膜厚的变化曲线图，多次烘烤可以的到准确的膜厚变化，方便计算出显示面板100的盒厚，并准确计算出液晶的滴入量。
本实施例可选的，所述第一预设时间与所述光阻层在显示面板100的制程中的烘烤时间相等，所述第一预设时间为20分钟至60分钟，所述第二预设时间为大于3分钟。
本方案中，第一预设时间与光阻层在显示面板100的制程中的烘烤时间相等，既光阻层在显示面板100的制程中的烘烤时间为第一预设时间；由于不同的光阻层烘烤的时间不同，并且不同类型的显示面板对膜厚的要求不同，对应的烘烤时间也不同，因此第一预设时间的范围在20分钟到60分钟，第二预设时间大于3分钟，可以得到不同时间的不同光阻层的膜厚变化，并且有利于查表得到厚度值。
本实施例可选的，所述第一预设时间可以设为24分钟，所述第二预设时间可以设为6分钟。
本方案中，第一预设时间为24分钟，第二预设时间为6分钟，两个预设时间为优选的烘烤时间，同时在显示面板100的制程中光阻的 形成是逐步完成的，因此先形成的光阻要经过几次24分钟的烘烤，因此要对本方案中的光阻层130进行第二预设时间为6分钟的烘烤，24分钟为6的倍数，比较易找到对应的膜厚变化。
本实施例可选的，所述对应多块素玻璃基板140上分别形成单层不同类型的光阻层130的方法包括：
在多块素玻璃基板140上分别涂布单层不同类型的光阻材料层；
采用对应的预设光罩对所述光阻材料层进行光罩制程形成光阻层130。
本方案中，在多块素玻璃基板140上分别涂布不同类型的光阻材料，可以准确的检测出光阻的厚度，防止在同一玻璃基板140上涂布多层光阻材料，不能准确的测出光阻材料随烘烤时间的变化；由于在实际的显示面板100制程中，使用了光罩的制程，因此本方案中为得到准确的膜厚值，在每一个光阻层130都增加一个光罩制程，减少膜厚的测量误差。
本实施例可选的，所述预设光罩与所述光阻层在显示面板100的制程中的光罩为同一光罩。
本方案中，采用相同的预设光罩进行光罩制程，因为膜厚的检测为多点检测取平均值的方式得到，因此要选用相同的光罩进行光罩制程，减小变量带来的影响，方便的到准确的膜厚测量值，进一步计算出显示面板100的盒厚。
本实施例可选的，所述预设温度与所述光阻层在显示面板100 的制程中的烘烤温度相等，所述预设温度为220摄氏度至260摄氏度。
本方案中，由于不同的光阻层需要的烘烤温度不同，并且不同类型的显示面板对膜厚的要求不同，对应的烘烤温度也不同，因此不同的烘烤的温度在220摄氏度到260摄氏度之间，可以使不同光阻层达到比较合适的烘烤的温度，同时光阻层130可以充分烘烤，并且实际烘烤温度也在这个范围，减小由温度引起误差，使光阻层130的膜厚测量更加准确，方便准确的计算出显示面板100的盒厚，进而准确的计算出液晶的滴入量，防止显示面板100出现气泡或色差等问题。
本实施例可选的，所述预设温度可以设为230摄氏度。
本方案中，采用230摄氏度为优选的烘烤温度，同时在实际的显示面板100制程中采用230摄氏度进行的，因此采用实际的显示面板100烘烤温度，可以减小在温度上引起的误差，使光阻层130的膜厚测量更加准确，方便准确的计算出显示面板100的盒厚，进而准确的计算出液晶的滴入量，防止显示面板100出现气泡或色差等问题。
本实施例可选的，所述光阻层130包括黑矩阵光阻层131、红光阻层132、绿光阻层133、蓝光阻层134、白光阻层135和间隔单元光阻层136。
本方案中，光阻层130包括黑矩阵光阻层131、红光阻层、绿光阻层133、蓝光阻层134、白光阻层135和间隔单元光阻层136，在显示面板100的制程中，将多个光阻层130全部检测，方便准确的测量出每一个光阻层130的膜厚，从而准确的计算出显示面板100的盒厚，进而 准确的计算出液晶的滴入量，减少液晶滴入量给显示面板100带来的气泡或色差等问题。
作为本申请的另一实施例，参考图1至图6、图8和图9所示，公开了一种显示面板100的制作方法，采用如上所述制作的查找表，所述方法包括：
S81：在素玻璃基板140上采用不同得光罩制程，形成设有不同类型的光阻层130的第一基板110；
S82：获取不同类型的光阻层130的设置顺序和烘烤时间；
S83：对应所述设置顺序和所述烘烤时间，对照查找表计算显示面板100的盒厚；
S84：根据所述盒厚控制液晶的滴入量；
S85：将第一基板110和第二基板120进行对盒设置，形成显示面板100。
本方案中，显示面板100的制作方法包括，获取不同类型的光阻层130的设置顺序和烘烤时间，方便找出不同烘烤时间下的膜厚，进而计算出显示面板100的盒厚，根据显示面板100的盒厚控制液晶的滴入量，进而减小液晶滴入量给显示面板100带来的气泡或色差等问题。
本实施例可选的，所述对应所述设置顺序和所述烘烤时间计算显示面板100的盒厚的方法包括：
对应所述设置顺序和所述烘烤时间计算每层所述光阻层130烘烤的总时间；
根据每层所述光阻层130烘烤的总时间对应查询所述查找表，获得每层所述光阻层130的膜厚；
对应每层所述光阻层130的膜厚计算显示面板100的盒厚。
本方案中，显示面板100的制作方法为，光阻层130的设置顺序和烘烤的时间计算出每一层光阻层130的烘烤时间，根据烘烤的时间找出对应的每一层光阻的厚度，对应光阻的厚度来计算显示面板100的盒厚，从而可以计算出液晶的滴入量，完成显示面板100的制作。
作为本申请的另一实施例，参考图1至图9所示，公开了一种显示装置，包括：控制部件，以及采用如上所述的显示面板100的制作方法生产的显示面板100。
本方案中一种显示装置包括控制部件，根据查找表查出光阻层130烘烤的时间以及对应的膜厚，准确计算出显示面板100的盒厚，进而计算出液晶的滴入量，减少因为液晶问题给显示面板100带来的气泡或色差的情况，解决显示面板100的品质问题，增加显示面板100的而制作良率。
本申请的面板可以是TN面板(全称为Twisted Nematic，即扭曲向列型面板)、IPS面板(In-Pane Switching，平面转换)、VA面板(Vertical Alignment，垂直配向技术)，当然，也可以是其他类型的面板，适用即可。
以上内容是结合具体的可选实施方式对本申请所作的进一步详细说明，不能认定本申请的具体实施只局限于这些说明。对于本申请所 属技术领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本申请的保护范围。

Claims (17)

  1. 一种查找表的制作方法，所述制作方法包括：
    对应多块素玻璃基板上分别形成单层不同类型的光阻层；
    采用预设温度对所述素玻璃基板上的所述光阻层进行烘烤；
    间隔预设时间后对每个所述光阻层的膜厚进行测量，获得所述光阻层的烘烤时间对膜厚变化的曲线图；以及
    对所述曲线图进行拟合和修正，建立查找表。
  2. 如权利要求1所述的一种查找表的制作方法，其中，所述预设时间包括第一预设时间和第二预设时间，
  3. 如权利要求2所述的一种查找表的制作方法，其中，所述间隔预设时间后对每个所述光阻层的膜厚进行测量，获得所述光阻层的烘烤时间对膜厚变化的曲线图的方法包括：
    在烘烤炉中烘烤第一预设时间后；
    冷却后测量所述光阻层的膜厚；
    测量完毕后再将所述光阻层放入所述烘烤炉中进行烘烤；
    每间隔第二预设时间均测量一次所述光阻层膜厚；以及
    获得所述光阻层的烘烤时间对膜厚变化的曲线图。
  4. 如权利要求3所述的一种查找表的制作方法，其中，所述第一预设时间与所述光阻层在显示面板的制程中的烘烤时间相等，所述第一预设时间为20分钟至60分钟，所述第二预设时间大于3分钟。
  5. 如权利要求4所述的一种查找表的制作方法，其中，所述第一预设 时间设为24分钟，所述第二预设时间设为6分钟。
  6. 如权利要求1所述的一种查找表的制作方法，其中，所述对应多块素玻璃基板上分别形成单层不同类型的光阻层的方法包括：
    在多块素玻璃基板上分别涂布单层不同类型的光阻材料层；以及
    采用对应的预设光罩对所述光阻材料层进行光罩制程形成光阻层。
  7. 如权利要求4所述的一种查找表的制作方法，其中，所述预设光罩与所述光阻层在显示面板的制程中的光罩为同一光罩。
  8. 如权利要求1所述的一种查找表的制作方法，其中，所述预设温度与所述光阻层在显示面板的制程中的烘烤温度相等，所述预设温度为220摄氏度至260摄氏度。
  9. 如权利要求1所述的一种查找表的制作方法，其中，所述预设温度设为230摄氏度。
  10. 如权利要求1所述的一种查找表的制作方法，其中，所述光阻层包括黑矩阵光阻层、红光阻层、绿光阻层、蓝光阻层、白光阻层以及间隔单元光阻层。
  11. 一种显示面板的制作方法，采用查找表制作方法制作的查找表，所述方法包括：
    在玻璃基板上采用不同得光罩制程，形成设有不同类型的光阻层的第一基板；
    获取不同类型的光阻层的设置顺序和烘烤时间；
    对应所述设置顺序和所述烘烤时间计算显示面板的盒厚；
    根据所述盒厚控制液晶的滴入量；以及
    将第一基板和第二基板进行对盒设置，形成显示面板。
  12. 如权利要求11所述的一种显示面板的制作方法，其中，所述在玻璃基板上采用不同得光罩制程，形成设有不同类型的光阻层的第一基板的方法包括：
    在多块素玻璃基板上分别涂布单层不同类型的光阻材料层；以及
    采用对应的光罩对所述光阻材料层进行光罩制程形成光阻层。
  13. 如权利要求11所述的一种显示面板的制作方法，其中，所述对应所述设置顺序和所述烘烤时间计算显示面板的盒厚的方法包括：
    对应所述设置顺序和所述烘烤时间计算每层所述光阻层烘烤的总时间；
    根据每层所述光阻层烘烤的总时间对应查询所述查找表，获得每层所述光阻层的膜厚；以及
    对应每层所述光阻层的膜厚计算显示面板的盒厚。
  14. 如权利要求11所述的一种显示面板的制作方法，其中，所述烘烤时间为20分钟至60分钟。
  15. 如权利要求11所述的一种显示面板的制作方法，其中，所述光阻层包括黑矩阵光阻层、红光阻层、绿光阻层、蓝光阻层、白光阻层以及间隔单元光阻层。
  16. 一种显示装置，包括：采用控制液晶量的方法生产的显示面板，所述方法包括：
    在玻璃基板上采用不同得光罩制程，形成设有不同类型的光阻层的第 一基板；
    获取不同类型的光阻层的设置顺序和烘烤时间；
    对应所述设置顺序和所述烘烤时间计算显示面板的盒厚；
    根据所述盒厚控制液晶的滴入量；以及
    将第一基板和第二基板进行对盒设置，形成显示面板。
  17. 如权利要求16所述的显示装置，其中，所述对应所述设置顺序和所述烘烤时间计算显示面板的盒厚的方法包括：
    对应所述设置顺序和所述烘烤时间计算每层所述光阻层烘烤的总时间；
    根据每层所述光阻层烘烤的总时间对应查询所述查找表，获得每层所述光阻层的膜厚；以及
    对应每层所述光阻层的膜厚计算显示面板的盒厚。
PCT/CN2018/114273 2018-10-08 2018-11-07 一种查找表的制作方法、显示面板的制作方法及显示装置 Ceased WO2020073397A1 (zh)

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