WO2020071256A1 - Polariseur à grille de fil métallique - Google Patents

Polariseur à grille de fil métallique

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Publication number
WO2020071256A1
WO2020071256A1 PCT/JP2019/038051 JP2019038051W WO2020071256A1 WO 2020071256 A1 WO2020071256 A1 WO 2020071256A1 JP 2019038051 W JP2019038051 W JP 2019038051W WO 2020071256 A1 WO2020071256 A1 WO 2020071256A1
Authority
WO
WIPO (PCT)
Prior art keywords
wire grid
grid polarizer
light
layer
groove
Prior art date
Application number
PCT/JP2019/038051
Other languages
English (en)
Japanese (ja)
Inventor
賢太 関川
総 石戸
康宏 池田
拓馬 西坂
Original Assignee
Ａｇｃ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ａｇｃ株式会社 filed Critical Ａｇｃ株式会社
Publication of WO2020071256A1 publication Critical patent/WO2020071256A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements

Definitions

  • the present invention relates to a wire grid polarizer.
  • the present invention also relates to a polarizing beam splitter provided with a wire grid polarizer, a polarizing plate for display, a polarizing lens, or a mirror display.
  • the wire grid polarizer has a structure in which a plurality of fine metal wires are arranged parallel to each other on a light transmitting substrate.
  • Patent Document 1 describes a polarizing element in which convex portions and concave grooves are alternately provided on the surface of a base material, and a support portion made of a low refractive material is provided in the concave groove in order to prevent the convex portions from falling. .
  • a wire grid polarizer such as a polarizing beam splitter
  • a high ratio of (s-polarized light reflectance Rs) / (p-polarized light reflectance Rp) may be required.
  • the object of the present invention is to provide a wire grid polarizer that can reduce the reflectance Rp of p-polarized light while suppressing a decrease in the reflectance Rs of s-polarized light.
  • a light-transmitting substrate in which convexes and concave grooves parallel to each other are alternately formed at a predetermined pitch on a surface, and a metal layer made of a metal or a metal compound provided on the surface of the convexes.
  • An absorption layer containing a dye or pigment is provided on the bottom surface of the groove,
  • a wire grid polarizer wherein a height from a bottom surface of the groove to an upper surface of the absorbing layer is equal to or less than a height from a bottom surface of the groove to an upper end of the metal layer.
  • the wire grid polarizer according to [1] further comprising a resin layer covering the light transmitting substrate, the metal layer, and the absorbing layer.
  • the pigment or pigment is selected from azo, anthraquinone, perinone, methine, quinoline, azine, oxazine, phthalocyanine, carbon black, titanium black, perylene pigment, and metal oxide.
  • the wire grid polarizer according to any one of [1] to [5], which is a kind or two or more kinds.
  • a polarizing beam splitter, a polarizing plate for display, a polarizing lens, or a mirror display comprising the wire grid polarizer according to any one of [1] to [6].
  • a wire grid polarizer that can reduce the reflectance Rp of p-polarized light while suppressing the decrease in reflectance Rs of s-polarized light can be obtained.
  • 4 is a scanning electron microscope image of a cross section of the wire grid polarizer manufactured in Comparative Example 1.
  • 4 is a spectrum showing measurement results of Tp in Example 1 and Comparative Example 1.
  • 4 is a spectrum showing measurement results of Rs in Example 1 and Comparative Example 1.
  • 4 is a spectrum showing measurement results of Rp in Example 1 and Comparative Example 1.
  • 6 is a scanning electron microscope image of a cross section of the wire grid polarizer manufactured in Example 2.
  • 9 is a scanning electron microscope image of a cross section of the wire grid polarizer manufactured in Comparative Example 2.
  • FIG. 1 is a sectional view schematically showing a first embodiment of the wire grid polarizer of the present invention.
  • reference numeral 1 denotes a light transmitting substrate
  • 2 denotes a metal layer
  • 3 denotes an absorption layer
  • 11 denotes a ridge
  • 12 denotes a concave groove.
  • the length direction of the ridge 11 (the extending direction of the ridge) is defined as the Z direction
  • the width direction of the ridge 11 in a plane perpendicular to the Z direction is defined as the X direction
  • the X direction and the Z direction The direction perpendicular to the direction
  • the direction perpendicular to the direction is referred to as the Y direction (the height direction of the ridge).
  • the X direction and the Y direction are orthogonal.
  • FIG. 1 is a schematic diagram based on design values.
  • a shape unavoidable in manufacturing and a nonuniform thickness of a metal layer occur.
  • the dimension of each part of the wire grid polarizer is an average value of measured values at arbitrary five points in a scanning electron microscope image or a transmission electron microscope image of a cross section orthogonal to the Z direction.
  • the light-transmitting substrate 1 is light-transmitting in the wavelength range in which the wire grid polarizer is used.
  • the light transmittance means that the transmittance is 80% or more.
  • the working wavelength range of the wire grid polarizer is preferably in the range of 300 to 1000 nm, more preferably in the range of 400 to 800 nm, and even more preferably in the range of 420 to 680 nm.
  • the refractive index of the light transmissive substrate 1 is preferably from 1.35 to 1.6, more preferably from 1.4 to 1.58, even more preferably from 1.45 to 1.55.
  • Examples of the material of the light-transmitting substrate 1 include a light-curing resin, a thermosetting resin, a thermoplastic resin, and glass. From the viewpoint that the ridges 11 and the concave grooves 12 can be formed by the imprint method, a photocurable resin or a thermosetting resin is preferable. In particular, a photocurable resin is preferable in terms of excellent workability, heat resistance, and durability.
  • the photocurable resin a cured product obtained by photocuring a photocurable composition that can be photocured by photoradical polymerization is preferable from the viewpoint of productivity.
  • the photocurable composition is, for example, a composition containing a monomer, a photopolymerization initiator, a solvent, and optional additives (for example, a surfactant and a polymerization inhibitor).
  • a photocurable composition described in paragraphs 0028 to 0060 of Japanese Patent No. 5978761 can be used.
  • the material of the metal layer 2 may be a conductive metal material, and is preferably a corrosion-resistant material.
  • a metal or metal compound can be exemplified.
  • a simple substance of a metal, an alloy, a metal containing a dopant or an impurity may be mentioned.
  • aluminum, silver, chromium, magnesium, an aluminum alloy, and a silver alloy can be exemplified.
  • the material of the metal layer 2 is preferably aluminum, an aluminum-based alloy, silver, chromium, magnesium, or a silver-based alloy, from the viewpoint of high reflectance to visible light, low absorption of visible light, and high conductivity. Aluminum-based alloys and silver-based alloys are more preferred.
  • the absorption layer 3 is formed of a material containing a dye or a pigment in the light transmitting resin.
  • the refractive index of the light transmitting resin constituting the absorbing layer 3 may be higher or lower than the refractive index of the light transmitting substrate 1.
  • the absolute value of the difference between the two refractive indexes is preferably 0.5 or less, more preferably 0.3 or less. More preferably, the refractive index of the light transmitting resin is lower than the refractive index of the light transmitting substrate 1.
  • the light-transmitting resin constituting the absorption layer 3 is preferably a light-curable resin, a thermosetting resin, or a thermoplastic resin, and is preferably a light-curable resin or a thermosetting resin because it can be easily filled into the concave groove.
  • photocurable resins described in paragraphs 0028 to 0060 of Japanese Patent No. 5978761 can be used.
  • the absorbing layer 3 contains a dye or a pigment as a light absorbing material.
  • a dye or pigment that absorbs a part or all of the light having the wavelength used by the wire grid polarizer is used. It is preferable to appropriately select a light absorbing material having absorption in a wavelength band in which Rp is desired to be reduced.
  • One type of dye or pigment may be used, or two or more types may be used in combination. For example, a light absorbing material exhibiting black by itself alone is preferable, and a mixture exhibiting black by mixing two or more kinds is also preferable. You may use a pigment and a pigment together.
  • dyes examples include azo, anthraquinone, perinone, methine, quinoline, azine, oxazine and phthalocyanine. These can be used alone or in combination of two or more.
  • pigments examples include carbon black, titanium black, perylene pigments, and metal oxides. These can be used alone or in combination of two or more.
  • the total content of the coloring matter and the pigment (hereinafter, also referred to as a light absorbing material concentration) with respect to the absorbing layer 3 is preferably 1 to 80% by mass, more preferably 5 to 50% by mass, and preferably 10 to 30% by mass. More preferred.
  • the concentration of the light absorbing material is equal to or more than the lower limit of the above range, the effect of reducing Rp while suppressing the decrease in Rs is likely to be sufficiently obtained.
  • the concentration of the light absorbing material is lower than the upper limit of the above range, the absorbing layer 3 is easily deformed when the wire grid polarizer is bent or molded into a three-dimensional shape.
  • the transmitted light reduction ratio is preferably 1 to 20%, more preferably 3 to 15%.
  • the transmittances A and B are average transmittances at 400 to 700 nm.
  • a plurality of ridges 11 and a plurality of concave grooves 12 are alternately formed on the surface of the light-transmitting substrate 1 at a predetermined pitch.
  • the plurality of ridges 11 extend in the Z direction and are parallel to each other.
  • the plurality of concave grooves 12 extend in the Z direction and are parallel to each other.
  • the shape (cross-sectional shape) of the ridge 11 in a cross section orthogonal to the Z direction is a triangle or a substantially triangle whose width gradually decreases toward the top 11a.
  • the top 11a of the ridge 11 is a portion having the highest height in the Y direction, and is continuous with the Z direction to form a line.
  • the vertex angle including the vertex 11a may be an acute angle or a rounded angle.
  • the ridge 11 has a main side surface 11b in the cross-sectional shape in the Z direction.
  • the inclination of the tangent is preferably substantially constant.
  • the lower end of the main side surface 11b is the lower end 11c of the ridge 11.
  • the cross-sectional shape of the plurality of ridges 11 is uniform.
  • a plane passing through the lower end 11c of the ridge 11 and orthogonal to the Y direction is defined as a reference plane H.
  • the width a in the X direction of the ridge 11 on the reference plane H, the pitch b in the X direction of the ridge 11 on the reference plane, and the height c in the Y direction from the reference plane to the top 11a of the ridge 11 are uniform. It is.
  • the term “uniform” includes a collapse of a shape inevitable in manufacturing. For example, a variation of several nm to a maximum of about 20 nm can occur.
  • the shape (cross-sectional shape) of the concave groove 12 in a cross section orthogonal to the Z direction has a tapered surface 12b whose groove width gradually decreases toward the bottom 12a.
  • the portion having the lowest position in the Y direction is the bottom portion 12a.
  • the height in the Y direction from the bottom 12a of the groove 12 to the reference plane is defined as the depth d of the groove.
  • the cross-sectional shape of the concave groove 12 is a V-shape in which the inclination of the tangent to the tapered surface 12b is constant or substantially constant.
  • the bottom 12a may be an acute angle or a rounded corner.
  • the bottom portion 12a extends in the Z direction to form a line.
  • the cross-sectional shape of the plurality of grooves 12 is uniform, and the depth d of the grooves 12 is uniform.
  • the surface from the lower end 11c of the ridge 11 to the top 11a of the ridge 11 is defined as the side surface of the ridge 11.
  • the two side surfaces sandwiching the top 11a of the ridge 11 are referred to as a first side surface 11b1 and a second side surface 11b2.
  • the metal layer 2 is provided so as to cover at least the entire first side surface 11b1 of the first side surface 11b1 and the second side surface 11b2 of the ridge 11. A part of the second side surface 11b2 and a part of the bottom surface of the concave groove 12 may be covered with the metal layer 2.
  • the second side surface 11b2 of the ridge 11 is not entirely covered with the metal layer 2, and has an exposed surface where the light-transmitting substrate 1 (the ridge 11) is exposed.
  • the absorbing layer 3 is provided on the bottom surface of the concave groove 12 (tapered surface 12b in the example of FIG. 1).
  • the height f from the bottom surface of the concave groove 12 to the upper surface of the absorbing layer 3 is equal to or less than the height g from the bottom surface of the concave groove 12 to the upper end of the metal layer 2.
  • the height f is equal to or less than the height (c + d) from the bottom surface of the concave groove 12 to the top 11a of the ridge 11.
  • the height f of the absorbing layer 3 is a height from the deepest bottom 12 a of the concave groove 12 to the upper surface of the absorbing layer 3.
  • the wire grid polarizer of this embodiment can be manufactured by the following method.
  • a light-curable composition is applied to the surface of a light-transmissive substrate, and the light-transmissible substrate is formed by forming ridges and grooves in the light-curable composition layer using a photo-imprinting method. Is prepared. After the optical imprint method, etching may be performed as necessary.
  • the optical imprint method for example, by combining electron beam drawing and etching, a mold in which a plurality of grooves are formed in parallel with each other and at a predetermined pitch is produced, and the grooves of the mold are applied to the surface of the base material. And transferring the photocurable composition to the cured photocurable composition and simultaneously photocuring the photocurable composition.
  • a mold prepared by electron beam drawing and etching may be used as a master mold (master mold), and a child mold or a grandchild mold replicated by a photo-imprint method may be used for transfer to the photocurable composition.
  • a glass plate for example, a quartz glass plate, a non-alkali glass plate
  • a resin cyclic olefin resin, triacetyl cellulose resin, acrylic resin, polyimide resin, polyethylene terephthalate, polybutylene terephthalate, polyethylene na
  • films made of phthalate, polydimethylsiloxane, and transparent fluororesin include films made of phthalate, polydimethylsiloxane, and transparent fluororesin).
  • an uncured photocurable composition 22 is applied to the surface of a substrate 21, and irregularities having shapes corresponding to the ridges 11 and the grooves 12 to be obtained are formed.
  • the molded mold 23 is pressed against the photocurable composition 22.
  • the photocurable composition is cured by irradiating radiation (for example, ultraviolet rays or electron beams), and then, as shown in FIG. 2B, the mold 23 is released to obtain the light transmissive substrate 1.
  • a metal layer can be formed on the light transmitting substrate 1 while being integrated with the base material 21.
  • the substrate 21 may be a support described later. If necessary, the light transmissive substrate 1 and the base material 21 may be separated before or after the formation of the metal layer.
  • the light-transmitting substrate 1 can be manufactured by a method using a mold 24 having a different shape from the mold 23. Specifically, first, the mold 24 is pressed against the photocurable composition 22 on the base material 21 to perform photocuring, thereby forming a rectangular ridge 10 larger than the ridge 11 to be obtained. Get things. Thereafter, as shown in FIG. 3C, the ridges 10 of the cured product are etched and processed into ridges 11 having a desired shape to obtain the light-transmitting substrate 1.
  • the wire grid polarizer of the present embodiment can be obtained.
  • the metal layer 2 is preferably formed by vapor deposition.
  • the vapor deposition method include a physical vapor deposition method (PVD) and a chemical vapor deposition method (CVD).
  • PVD physical vapor deposition method
  • CVD chemical vapor deposition method
  • a vacuum deposition method, a sputtering method, or an ion plating method is preferable.
  • the vacuum evaporation method is preferable because the incident direction of the fine particles to be attached to the light transmitting substrate can be easily controlled.
  • the metal layer 2 on the entire surface of the first side surface of the ridge 11 and in the vicinity thereof by using an oblique evaporation method by a vacuum evaporation method.
  • an angle of ⁇ (unit is “°”) (evaporation angle) is perpendicular or substantially perpendicular to the Z direction and is on the first side surface side with respect to the Y direction.
  • the metal layer 2 is formed by vapor-depositing a metal or a metal compound from the direction (deposition direction).
  • the deposition amount is controlled so that a predetermined thickness of the metal layer 2 is obtained.
  • the test piece is placed in the same film-forming environment as the light-transmitting substrate 1, and the deposition amount is controlled so that the thickness of the metal layer formed on the test piece becomes a target value.
  • a glass substrate is used as the test piece.
  • the film thickness is measured by, for example, a stylus type contact film thickness meter.
  • the absorption layer 3 can be formed by applying an uncured resin composition containing a light-transmitting resin, a dye or a pigment, and a solvent into the concave groove 12 and then curing the resin composition.
  • the resin composition may contain optional components such as a surfactant. Before the curing, a part or all of the solvent may be removed by heating and drying.
  • the light-transmitting resin is a light-curable resin
  • a light-curing initiator is added to the resin composition, and the resin composition is cured by irradiation with radiation (for example, ultraviolet rays or electron beams).
  • the application of the resin composition can be performed using, for example, a bar coater, a die coater, a spin coater, a gravure coater, a spray coater, or an inkjet coater.
  • the height f from the bottom surface of the concave groove to the upper surface of the absorbing layer can be adjusted by adjusting the amount of the resin composition applied.
  • the width a of the ridge 11 in the X direction is preferably from 10 to 150 nm, more preferably from 20 to 100 nm, and even more preferably from 30 to 60 nm.
  • the pitch b of the ridges 11 in the X direction is preferably 30 to 200 nm, more preferably 50 to 150 nm, and further preferably 80 to 100 nm.
  • a a / b representing the ratio of the width a to the pitch b is preferably 0.2 to 0.8, more preferably 0.3 to 0.7, and even more preferably 0.4 to 0.6.
  • the height c of the ridge 11 in the Y direction is preferably from 50 to 250 nm, more preferably from 70 to 200 nm, even more preferably from 90 to 150 nm.
  • Cc / a representing the ratio of the height c to the width a (aspect ratio) is preferably 1 to 10, more preferably 1.5 to 5, and even more preferably 2 to 4.
  • the depth d of the concave groove 12 may be 0 to 50 nm, 3 to 30 nm, or 5 to 10 nm.
  • the deposition angle ⁇ is preferably 5 to 65 °, more preferably 10 to 50 °, and further preferably 20 to 40 °.
  • the thickness e in the X direction of the metal layer 2 at a position corresponding to a half of the height (c + d) is preferably 15 to 100 nm, more preferably 20 to 80 nm, and further preferably 25 to 50 nm.
  • F / g representing the ratio of the height f from the bottom surface of the concave groove 12 to the upper surface of the absorbing layer 3 to the height g from the bottom surface of the concave groove 12 to the upper end of the metal layer 2 is 1 or less. Preferably, it is 0.8 or less, more preferably 0.5 or less.
  • f / g is within the above range, it is easy to suppress a decrease in the reflectance Rs of the s-polarized light, and it is easy to decrease the reflectance Rp of the p-polarized light.
  • the absorbing layer 3 covers the entire bottom surface of the concave groove 12.
  • the height f from the bottom surface of the concave groove 12 to the upper surface of the absorbing layer 3 is preferably equal to or greater than the depth d of the concave groove 12.
  • (Fd) is preferably larger than 0 nm, more preferably 10 nm or more, and still more preferably 30 nm or more.
  • the absorbance of the cured film made of the material constituting the absorbing layer 3 and having the same thickness as the height f of the absorbing layer 3 is preferably 0.002 to 0.3, more preferably 0.005 to 0.05. More preferably, it is more preferably 0.008 to 0.025.
  • the amount is not less than the lower limit of the above range, the effect of reducing Rp is easily obtained while suppressing the decrease of Rs, and when it is not more than the upper limit, the reduction of Tp is sufficiently suppressed.
  • the absorbance is a value at a wavelength of 400 to 700 nm and can be measured using a spectrophotometer.
  • FIG. 4 is a cross-sectional view schematically showing a second embodiment of the wire grid polarizer.
  • the same components as those in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted.
  • the second embodiment is different from the first embodiment in that a resin layer 4 that covers the light-transmitting substrate 1, the metal layer 2, and the absorption layer 3 is provided.
  • the resin layer 4 is light transmissive.
  • the resin layer 4 contains neither pigment nor pigment.
  • the refractive index of the resin layer 4 is preferably 1.10 to 1.50, more preferably 1.15 to 1.40, and still more preferably 1.18 to 1.36.
  • the refractive index of the resin layer 4 is preferably lower than the refractive index of the light transmitting substrate 1.
  • the difference is preferably 0.05 or more, more preferably 0.1 to 0.4, and even more preferably 0.12 to 0.35.
  • the refractive index of the resin layer 4 is preferably lower than the refractive index of the absorption layer 3.
  • the difference is preferably 0.05 or more, more preferably 0.1 to 0.4, and even more preferably 0.12 to 0.35.
  • the height h from the upper end of the metal layer 2 to the upper surface of the resin layer 4 is preferably 5 nm or more, more preferably 50 nm or more. From the viewpoint of flexibility, the upper limit of the height h is preferably 50 ⁇ m or less, and more preferably 10 ⁇ m or less.
  • the wire grid polarizer of the present embodiment is obtained by manufacturing a light-transmitting substrate 1, providing a metal layer 2 and an absorption layer 3, and then applying a material for a resin layer 4 so as to cover these, and curing the resin layer. Can be manufactured.
  • the cross-sectional shape of the ridge 11 is triangular or substantially triangular, but may be a trapezoid in which the top 11a is a flat surface orthogonal to the Y direction.
  • the sectional shape of the bottom surface of the concave groove 12 is V-shaped, but a flat surface orthogonal to the Y direction may exist at the bottom between the tapered surfaces 12b.
  • the lower end of the metal layer 2 is below the upper surface of the absorbing layer 3 and a part of the metal layer 2 is covered with the absorbing layer 3. 3 may be above the upper surface.
  • a support made of a thermoplastic resin, glass, or the like (not shown) is provided on the back surface of the light-transmitting substrate 1 (the surface opposite to the surface provided with the ridges and grooves). ) May be included. From the viewpoint of the optical characteristics of the wire grid polarizer, it is preferable that a support (hereinafter, also referred to as a first support) is provided on the back surface of the light transmitting substrate 1.
  • the difference (absolute value) in the refractive index between the support and the light-transmitting substrate 1 is preferably 0.1 or less, more preferably 0.05 or less.
  • a decrease in p-polarized light transmittance and a decrease in s-polarized light reflectance can be suppressed.
  • a support hereinafter, also referred to as a second support
  • the resin layer and the support (second support) are integrated with an adhesive.
  • the materials of the first support and the second support may be the same or different.
  • the absorption layer 3 covers the bottom surface of the concave groove 12 and does not cover the upper end of the metal layer 2, so that Rp can be reduced while suppressing a decrease in Rs, as shown in an example described later.
  • the width of the decrease in Rs can be realized at 5% or less on the average in the use wavelength range, and the decrease in Rp can be 0.1% or more on the average in the use wavelength range. .
  • the absorbing layer 3 is a resin layer containing a dye or a pigment, the absorbing layer 3 is excellent in follow-up to bending deformation. In particular, even when the width of the groove is narrow, the material of the absorbing layer 3 is easily filled into the groove, and the absorbing layer 3 is deformed when the wire grid polarizer is bent or molded into a three-dimensional shape. It is more preferable that the absorbing layer 3 contains a dye from the viewpoint of easiness.
  • Examples of applications of the wire grid polarizer of the embodiment include a polarizing beam splitter, a polarizing plate for a display, a polarizing lens, and a mirror display.
  • the p-polarized light transmittance was measured using an ultraviolet-visible spectrophotometer (UH-4150, manufactured by Hitachi High-Tech Science Corporation). Specifically, an attached polarizer is inserted between the wire grid polarizer to be measured and the light source, in the major axis direction (Z direction) of the metal wire of the wire grid polarizer, and the absorption of the attached polarizer. The axis was set to be parallel. Polarized light was incident at an incident angle of 0 ° from the surface side (the side on which the ridges were formed) of the wire grid polarizer, and the p-polarized light transmittance was measured. The measurement wavelength was 420 nm to 680 nm.
  • Monomer 1 Shin Nakamura Chemical Co., Ltd. product name "NK Ester A-DPH”, dipentaerythritol hexaacrylate.
  • Monomer 2 Shin Nakamura Chemical Co., Ltd. product name “NK Ester A-HD-N”, 1,6-hexanediol diacrylate.
  • Monomer 3 New Nakamura Chemical Co., Ltd. product name “NK Ester A-TMM-3LM-N”, pentaerythritol triacrylate (triester 57%).
  • Monomer 4 Solvay Specialty Polymers Japan Co., Ltd. product name “MD700”, fluorine-based dimethacrylate.
  • Azo-based dye 1 "Oliblack 860", a product name of Orient Chemical Industries.
  • Azine dye 2 “VALIFAST1821”, a product name of Orient Chemical Industry Co., Ltd.
  • Photopolymerization initiator 1 Ciba Specialty Chemicals, Inc. product name "IRGACURE907”.
  • Photopolymerization initiator 2 Product name “DR1173” of Ciba Specialty Chemicals.
  • Fluorinated surfactant 1 Co-oligomer of fluoroacrylate (CH 2 CHCHCOO (CH 2 ) 2 (CF 2 ) 8 F) and butyl acrylate, manufactured by Asahi Glass Co., Ltd., fluorine content about 30% by mass, mass average molecular weight about 3000.
  • Solvent 1 isopropyl alcohol.
  • ⁇ Preparation Example 1 Preparation of photocurable composition> 40 g of the monomer 1, 60 g of the monomer 2, 4.0 g of the photopolymerization initiator 1, and 0.1 g of the fluorinated surfactant 1 were mixed to prepare a photocurable composition.
  • ⁇ Preparation Example 2 Preparation of resin composition for absorption layer> 1 g of the monomer 2, 0.25 g of the azo dye 1, 0.04 g of the photopolymerization initiator 1, and 0.01 g of the fluorinated surfactant 1 were mixed, and the obtained mixture was subjected to solid concentration.
  • the resin composition was diluted with the solvent 1 so as to be 1% by mass to obtain a resin composition 1 for the absorption layer.
  • the refractive index of the homopolymer of the monomer 2 used in this example is 1.51.
  • the concentration of the light absorbing material (the concentration of the dye) was 19% by mass, the reduction ratio of the transmitted light in the cured film having a thickness of 100 nm was 10%, and the absorbance of the cured film having a thickness of 30 nm was 0.01. .
  • ⁇ Preparation Example 3 Preparation of resin composition for absorption layer> 1 g of the monomer 3, 0.2 g of the azine dye 2 and 0.04 g of the photopolymerization initiator 1 were mixed, and the resulting mixture was mixed with the solvent 1 so that the solid content concentration was 1% by mass. After dilution, a resin composition 2 for the absorption layer was obtained.
  • the homopolymer of the monomer 3 used in this example has a refractive index of 1.52.
  • the concentration of the light absorbing material was 17% by mass
  • the reduction ratio of the transmitted light in the cured film having a thickness of 100 nm was 7%
  • the absorbance of the cured film having a thickness of 80 nm was 0.02.
  • Preparation Example 4 Preparation of resin composition for absorption layer>
  • the amount of the dye and the solid content were changed. 1 g of the monomer 3, 0.1 g of the azine dye 2 and 0.04 g of the photopolymerization initiator 1 were mixed, and the resulting mixture was mixed with the solvent 1 so that the solid content concentration became 2% by mass. After dilution, a resin composition 3 for an absorbing layer was obtained. In the resin composition 3, the concentration of the light absorbing material was 9% by mass, the reduction ratio of transmitted light in a cured film having a thickness of 100 nm was 1%, and the absorbance of the cured film having a thickness of 160 nm was 0.02.
  • ⁇ Preparation Example 5 Preparation of resin composition for resin layer> 1 g of the monomer 4, 0.04 g of the photopolymerization initiator 2 and 0.005 g of the photopolymerization initiator 1 were mixed to obtain a resin composition of a resin layer.
  • ⁇ Production Example 1 Production of wire grid type polarizer>
  • a light transmitting substrate was manufactured by the manufacturing method shown in FIGS. 2A and 2B, and a metal layer was formed.
  • a cyclic polyolefin film having a thickness of 100 ⁇ m (Zeonor film, 100 mm ⁇ 100 mm, manufactured by Zeon Corporation) was used.
  • the photocurable composition 22 obtained in Preparation Example 1 was applied to the surface of the substrate 21 by spin coating to form a coating film having a thickness of 5 ⁇ m.
  • the silicon mold 23 having the irregularities of the shape shown in FIG. 2A is photocured at 25 ° C. with a pressing force of 0.5 MPa (gauge pressure) so that the entire surface of the concave portion is in contact with the photocurable composition 22. The composition was pressed against the coating composition 22.
  • a metal layer was formed on the light transmitting substrate 1 obtained as described above by the following method. Using a vacuum evaporation apparatus (SEC-16CM, manufactured by Showa Vacuum Co., Ltd.) capable of changing the inclination of the light transmitting substrate 1 facing the evaporation source, aluminum is evaporated on the ridges of the light transmitting substrate 1 by oblique evaporation. Then, a metal layer was formed. The deposition angle ⁇ was 27 °.
  • Example 1 [Formation of absorption layer] After forming a light-transmitting substrate by the method of Production Example 1 and forming a metal layer, the resin composition obtained in Preparation Example 2 was applied into the concave groove 12 using a bar coater, and dried at 80 ° C. for 3 minutes. I let it. The coating amount of the resin composition was set so that the dry film thickness (height f of the absorbing layer) was 30 nm. Ultraviolet rays were irradiated at 2,000 mJ / cm 2 from a high-pressure mercury lamp in a nitrogen atmosphere to cure the resin composition to produce a wire grid polarizer.
  • FIG. 5 shows a scanning electron microscope image of a cross section of the obtained wire grid polarizer.
  • the width a of the ridge is 45 nm
  • the pitch b is 90 nm
  • the height c of the ridge is 110 nm
  • the depth d of the concave groove is 10 nm
  • the thickness e of the metal layer is 40 nm
  • the height f of the absorption layer is 30 nm.
  • F / g is 0.19.
  • Table 1 shows the measurement results of Tp, Rs, and Rp (average values at wavelengths of 420 to 680 nm), the calculation results of Rs / Rp, and the main manufacturing conditions of the obtained wire grid polarizer (the same applies hereinafter). .
  • the spectra of Tp, Rs, and Rp are shown by solid lines in FIGS. 7, 8, and 9, respectively.
  • FIG. 6 shows a scanning electron microscope image of a cross section of the obtained wire grid polarizer.
  • the spectra of Tp, Rs and Rp are shown by broken lines in FIGS. 7, 8 and 9, respectively.
  • FIG. 10 shows a scanning electron microscope image of a cross section of the obtained wire grid polarizer.
  • FIG. 11 shows a scanning electron microscope image of a cross section of the obtained wire grid polarizer.
  • Example 3 a wire grid polarizer having the configuration shown in FIG. 4 was manufactured.
  • a light-transmitting substrate was produced by the method of Production Example 1 and a metal layer was formed, an absorption layer was formed in the same manner as in Example 2.
  • the width a of the ridge is 45 nm
  • the pitch b is 90 nm
  • the height c of the ridge is 115 nm
  • the depth d of the groove is 10 nm
  • the thickness e of the metal layer is 40 nm
  • the height f of the absorption layer is 80 nm.
  • F / g is 0.5.
  • the resin composition obtained in Preparation Example 5 was applied to the entire front surface of the light-transmitting substrate 1 using a bar coater.
  • the application amount of the resin composition was set such that the height h from the upper end of the metal layer to the upper surface of the resin layer was 10 ⁇ m.
  • Ultraviolet rays were irradiated at 4000 mJ / cm 2 from a high-pressure mercury lamp in a nitrogen atmosphere to cure the resin composition to form a resin layer, thereby obtaining a wire grid polarizer.
  • the refractive index of the resin layer is 1.36.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Optical Filters (AREA)

Abstract

La présente invention concerne un polariseur à grille de fil métallique comprenant : un substrat de transmission de lumière (1) sur la surface duquel sont formées en alternance des nervures (11) et des rainures évidées (12) parallèles les unes aux autres selon un pas prédéfini ; et une couche métallique (2) disposée sur la surface de chacune des nervures (11) et comprenant un métal ou un composé métallique. Une couche d'absorption (3) contenant une matière colorante ou un pigment est disposée sur une surface de fond de la rainure évidée (12), et une hauteur f de la surface de fond de la rainure évidée (12) à une surface supérieure de la couche d'absorption (3) est inférieure ou égale à une hauteur g de la surface de fond de la rainure évidée (12) à une extrémité supérieure de la couche métallique (2).
PCT/JP2019/038051 2018-10-01 2019-09-26 Polariseur à grille de fil métallique WO2020071256A1 (fr)

Applications Claiming Priority (2)

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JP2018186781A JP2022001890A (ja) 2018-10-01 2018-10-01 ワイヤグリッド型偏光子
JP2018-186781 2018-10-01

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005037900A (ja) * 2003-06-25 2005-02-10 Sharp Corp 偏光光学素子、およびそれを用いた表示装置
WO2006126707A1 (fr) * 2005-05-27 2006-11-30 Zeon Corporation Pellicule de polarisation en grille, son procédé de production, stratifié optique, son procédé de fabrication, et affichage à cristaux liquides
WO2008084856A1 (fr) * 2007-01-12 2008-07-17 Toray Industries, Inc. Plaque de polarisation et dispositif d'affichage à cristaux liquides utilisant celle-ci
JP2010117646A (ja) * 2008-11-14 2010-05-27 Sony Corp 機能性グリッド構造体及びその製造方法
JP2017173742A (ja) * 2016-03-25 2017-09-28 大日本印刷株式会社 偏光子の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005037900A (ja) * 2003-06-25 2005-02-10 Sharp Corp 偏光光学素子、およびそれを用いた表示装置
WO2006126707A1 (fr) * 2005-05-27 2006-11-30 Zeon Corporation Pellicule de polarisation en grille, son procédé de production, stratifié optique, son procédé de fabrication, et affichage à cristaux liquides
WO2008084856A1 (fr) * 2007-01-12 2008-07-17 Toray Industries, Inc. Plaque de polarisation et dispositif d'affichage à cristaux liquides utilisant celle-ci
JP2010117646A (ja) * 2008-11-14 2010-05-27 Sony Corp 機能性グリッド構造体及びその製造方法
JP2017173742A (ja) * 2016-03-25 2017-09-28 大日本印刷株式会社 偏光子の製造方法

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