WO2020066229A1 - Film manufacturing method and film roll - Google Patents

Film manufacturing method and film roll Download PDF

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Publication number
WO2020066229A1
WO2020066229A1 PCT/JP2019/027778 JP2019027778W WO2020066229A1 WO 2020066229 A1 WO2020066229 A1 WO 2020066229A1 JP 2019027778 W JP2019027778 W JP 2019027778W WO 2020066229 A1 WO2020066229 A1 WO 2020066229A1
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WO
WIPO (PCT)
Prior art keywords
film
coating
liquid
meniscus
upstream
Prior art date
Application number
PCT/JP2019/027778
Other languages
French (fr)
Japanese (ja)
Inventor
尚志 山本
諭司 國安
貴之 佐野
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to CN201980063669.6A priority Critical patent/CN112770846B/en
Priority to JP2020548032A priority patent/JP7011081B2/en
Publication of WO2020066229A1 publication Critical patent/WO2020066229A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs

Definitions

  • the present invention relates to a film manufacturing method and a film roll.
  • the slot die is a coating die that discharges a coating liquid from a slot between an upstream block (hereinafter, referred to as an upstream block) and a downstream block (hereinafter, referred to as a downstream block) in the moving direction of the base material. is there.
  • Patent Document 1 describes that the shape and application conditions of the slot die are performed under conditions that satisfy a predetermined formula.
  • the coating is performed under the condition that the distance between the surface of the tip lip of the downstream block and the substrate is gradually increased toward the downstream side in the moving direction of the substrate. It also describes that the conditions for coating are set using a forward contact angle and a receding contact angle of the coating liquid.
  • Patent Document 2 discloses that when the contact angle hysteresis obtained by subtracting the receding contact angle from the advancing contact angle is small, the mobility of the droplet is increased.
  • Patent Document 3 describes a mode in which, at the end of coating using a slot die, the meniscus located in the upstream block moves upstream, and then moves downstream.
  • a spherical convex portion is formed on the coating film while the coating is continued.
  • the projections are formed by the formation of a lump (a gel-like substance or the like) of the coating liquid at the tip of the upstream block of the slot die, and the lump detaches from the slot die and enters the coating film. Therefore, after the application is stopped and the tip of the upstream block is washed, a new laminated film is manufactured. Since the application is stopped in this way, there is a limit to the application time that can be continued, and the length of the film that can be produced is limited.
  • Patent Document 2 relates to an ink jet printer, and cannot be used for coating with a slot die, but cannot solve the above-described limitations on the coating time and the length of a film that can be manufactured.
  • an object of the present invention is to provide a method for producing a film that suppresses unevenness in the thickness of a coating film for a longer time and a film roll using the method.
  • a film manufacturing method of the present invention includes a liquid discharge starting step, a liquid contacting step, a preliminary coating step, and a main coating step.
  • a laminated film is manufactured by continuously applying a coating liquid by a slot die for discharging the coating liquid from a slot between an upstream block and a downstream block in the moving direction of the material.
  • the coating liquid is discharged from the slot of the slot die.
  • the distance between the moving base material and the slot die that is discharging liquid is reduced, so that the coating liquid coming out of the slot die is brought into contact with the base material.
  • the preliminary application step exposes the tip lip of the upstream block wetted by the application liquid in the liquid application step while the application liquid is being applied to the base material.
  • the coating is continued after the preliminary coating step to form a coating film of a laminated film to be a product part.
  • the pre-coating step preferably includes a dropping step of dropping the droplet when the tip lip is exposed while the coating liquid remains as a droplet on the tip lip.
  • the pre-coating step preferably includes a first meniscus moving step and a second meniscus moving step.
  • the droplet is integrated with the application bead by moving the meniscus on the upstream side of the application bead between the slot die and the substrate to the upstream side in the moving direction of the substrate.
  • the second meniscus moving step after the first meniscus moving step, the upstream meniscus is moved to a position before the first meniscus moving step.
  • the movement of the upstream meniscus includes changing the degree of pressure reduction on the upstream side in the moving direction of the base material of the coating bead, increasing or decreasing the distance between the slot die and the base material, and increasing the flow rate of the coating liquid from the slot die. It is preferable to move the upstream meniscus by either of the above methods.
  • the pre-coating step is preferably completed within 10 seconds from the start of the contact of the coating liquid with the base material in the liquid landing step.
  • the film manufacturing method further includes a winding step of winding the laminated film around a core, and after winding the laminated film having undergone the preliminary coating step on the core, winding the laminated film having undergone the main coating step. Is preferred.
  • the film roll of the present invention includes a winding core and a laminated film
  • the laminated film includes a substrate and a film formed on the substrate, is formed in a long shape, and is wound around the winding core from one end side in the longitudinal direction.
  • the laminated film has, on the one end side, a film portion in which protrusions extending in the longitudinal direction of the laminated film are formed on the film.
  • thickness unevenness of the coating film can be suppressed for a longer time, and a film roll on which a longer film is wound can be obtained.
  • the film roll 10 includes a winding core 11 and a long laminated film (hereinafter, simply referred to as “film”) 12.
  • the winding core 11 is formed in a cylindrical shape in this example, but may be formed in a cylindrical shape.
  • the two-dot broken line indicates the film 12 wound around the core 11, and the solid line indicates the film 12 before being wound around the core 11.
  • the film 12 is formed into a roll form in which the core 11 is rotated in a direction indicated by an arrow A in FIG. 1 as described later, and is wound around the core 11 from one end 12A side in the longitudinal direction.
  • the thickness of the film 12 is greatly exaggerated.
  • the film 12 is composed of a product part 15 and a non-product part 16.
  • the product section 15 is a film section provided for use as a product such as an optical member.
  • the non-product part 16 is a film part that is not used as a product such as an optical member.
  • the non-product part 16 may be a film part that is not planned to be used, and is not limited to a film part that is not actually used.
  • the product section 15 may be a film section to be used, and need not be a film section actually used.
  • the non-product part 16 is a film part constituting one end 12A side of the film 12, and the product part 15 is a film part constituting the other end 12B side. Therefore, the non-product part 16 is located inside the film roll 10, and the product part 15 is located outside the non-product part 16.
  • the product part 15 constitutes most of the film 12 in the longitudinal direction, and the length L15 is extremely longer than the length L16 of the non-product part 16. It is preferable that the length L16 of the non-product part 16 is suppressed to 300 m at most, and is 100 m in this example.
  • the length L16 of the non-product part 16 is more preferably in the range of 20 m or more and 300 m or less, and even more preferably in the range of 20 m or more and 100 m or less.
  • the non-product part 16 has a projection forming part 17 and a projection non-forming part 18.
  • the protrusion forming portion 17 is a region having a protrusion 17A extending in the longitudinal direction of the film 12, and the protrusion non-forming portion 18 does not have such a protrusion 17A.
  • the protrusion forming portion 17 is formed at an end of the non-product portion 16 on the product portion 15 side as a length region extremely shorter than the protrusion non-forming portion 18.
  • the length L17 of the projection forming portion 17 in the longitudinal direction of the film 12 is in the range of 300 mm or more and 5000 mm or less.
  • a plurality of projections 17A are formed.
  • the protrusion forming portion 17 is a region from the one end 12A side of the protrusion 17A closest to the one end 12A to the other end 12B of the protrusion 17A closest to the other end 12B.
  • the projection 17A may be formed on the first film surface (inward surface) S1 on the winding core 11 side, or may be formed on the second film surface (outward surface) S2 on the opposite side to the winding core 11 side. May be. In this example, it is formed on the first film surface S1, and thereby, the mark of the step between the surface of the winding core 11 and the one end 12A or the mark of the adhesive tape for fixing the winding core 11 and the one end 12A (hereinafter, referred to as the following). , Etc.) are hardly attached to the wound film 12, and even if it is attached, the section in the longitudinal direction is kept short.
  • both the product portion 15 and the non-product portion 16 include the base material 21 and the film 22 having a thickness smaller than the base material 21.
  • the film 22 of the product unit 15 is a so-called flat film whose film surface is flat like the substrate 21.
  • the material of the base material 21 is not particularly limited, but has sufficient flexibility to be wound around the winding core 11, and includes, for example, a thermoplastic resin (polymer).
  • thermoplastic resin examples include cellulose acylate (eg, cellulose triacetate, cellulose diacetate, cellulose acetate propionate, etc.), polyester (eg, polyethylene terephthalate, polyethylene-2,6-naphthalate, etc.), polyvinyl chloride, polyvinyl chloride, and the like. Examples include vinylidene chloride, polycarbonate, polyimide, and polyamide.
  • the substrate 21 in this example has a single-layer structure, the substrate 21 may have a multilayer structure.
  • the base material having a multilayer structure examples include, for example, a base material including a film material formed of a thermoplastic resin as described above and a photo-alignment film containing a compound oriented by photo-isomerization by light irradiation.
  • the thickness T21 of the substrate 21 is not particularly limited, and is preferably in a range of 5 ⁇ m or more and 300 ⁇ m or less, and is set to 40 ⁇ m in this example.
  • the film 22 is provided on one substrate surface 21A of the substrate 21.
  • a functional film formed by applying a functional material is exemplified, and examples of the functional film include a magnetic film, a photosensitive film, and an optical functional film.
  • the optical functional film in the case where the substrate 21 has a multilayer structure including the photo-alignment film for example, a liquid crystal film containing a liquid crystal compound (liquid crystal polymer and / or liquid crystal monomer) is used. No.
  • the thickness T22 of the film 22 is preferably the same as the thickness T22 of the product portion 15. But it does so.
  • the thickness T22 of the product unit 15 is set to 100, if the thickness is within the range of 98 or more and 102 or less, the thickness is regarded as the same.
  • a plurality of the above-described protrusions 17A are formed on the film 22 of the protrusion formation portion 17. Therefore, the thickness T22 of the film 22 of the projection forming portion 17 is different between the portion having the projection 17A and the portion having no projection 17A.
  • the projection 17A forms a film surface 22A on the opposite side of the film 22 from the substrate 21 side.
  • a plurality of projections 17A are formed in the entire area (entire width area) in the width direction of the long film 12 (see FIG. 1), and a plurality of projections 17A are also formed in the longitudinal direction.
  • the arrangement of the plurality of projections 17A is irregular, and is formed in a manner dispersed on the film surface 22A.
  • the projection 17A has an elliptical shape when the film surface 22A is viewed from the vertical direction.
  • the major axis of the ellipse is in the longitudinal direction of the film 12, and the minor axis is in the width direction.
  • the shape of the projection 17A when the film surface 22A is viewed from the vertical direction is not particularly limited as long as the shape extends in the longitudinal direction of the film 12.
  • the width the length in the width direction of the film 12
  • the plurality of protrusions 17A are non-uniform in size.
  • the length of the projection 17A in the longitudinal direction of the film 12 (hereinafter, referred to as a projection length) LP is preferably in a range of 50 mm or more and 1000 mm or less, and the length in the width direction of the film 12 (hereinafter, referred to as a projection width).
  • the WP is preferably in the range of 1 mm or more and 5 mm or less, and the height HP of the projections 17A from the film surface 22A in the film region where the projections 17A are not formed (hereinafter, referred to as projection height) is 0.05 ⁇ m or more. It is preferable that it is within the range of 0.3 ⁇ m or less.
  • the film manufacturing equipment 30 shown in FIG. 4 is an example of equipment for manufacturing the laminated film 12 and obtaining the film roll 10.
  • the film manufacturing facility 30 includes a delivery unit 31, a coating device 32, a curing device 33, and a winding unit 34 in order from the upstream side in the moving direction Dc of the base 21.
  • a plurality of rollers 37 are provided on a moving path for moving the base material 21.
  • a rotation mechanism (not shown) may be provided among the plurality of rollers 37, and a driving roller rotated in the circumferential direction by the rotation mechanism may be provided.
  • the delivery unit 31 is set with a base material roll 38 obtained by winding the base material 21 in a roll shape.
  • the sending unit 31 continuously sends out the long base material 21 from the base material roll 38.
  • the coating device 32 is for forming a coating film 41 to be the film 22 (see FIG. 2) on one surface of the base material 21.
  • the coating device 32 includes a support roller 42 that supports the base material 21, a slot die 44 that outputs a coating liquid 43, and the like.
  • the support roller 42 includes a rotation shaft 42a, and the rotation of the rotation shaft 42a by a rotation mechanism (not shown) causes the support roller 42 to rotate in the circumferential direction. Thereby, the base material 21 in contact with the support roller 42 moves in the longitudinal direction.
  • the moving speed of the substrate 21 is set to 20 m / min, but the moving speed is not limited to this.
  • the slot die 44 is arranged in such a manner that a liquid outlet 45 (see FIG. 5) for discharging the coating liquid 43 faces the support roller 42.
  • the application liquid 43 is continuously output from the liquid outlet 45 toward the moving substrate 21, whereby the application liquid 43 is continuously applied to the substrate surface 21 ⁇ / b> A (see FIG. 2) of the substrate 21.
  • the coating film 41 is formed.
  • the film 12 is manufactured through the coating process in the coating device 32. In this example, the coating is performed in a state where the coating film 41 is formed to have a thickness of 10 ⁇ m, but the thickness of the coating film 41 immediately after formation is not limited to this example. Details of the coating device 32 will be described later using another drawing.
  • the coating liquid 43 is, for example, a liquid containing the above-mentioned various functional materials.
  • the coating liquid 43 of this example has a viscosity of 3 mPa ⁇ s, a surface tension of 24 mN / m, a solvent containing methyl ethyl ketone (MEK) as a main component, and a solid content (film 22 (see FIG. 2)). Is 32% by mass.
  • the main component is a component that occupies at least of the mass when the total mass of the solvent is 100.
  • the solid content concentration (unit is mass%) is a percentage obtained by (M1 / M2) ⁇ 100, where M1 is the mass of the solid content and M2 is the mass of the solvent.
  • the application liquid is not limited to this example.
  • the curing device 33 forms the film 22 by curing the coating film 41 by a predetermined process.
  • the film 22 of the non-projection forming portion 18 of the product portion 15 and the non-product portion 16 is formed to have a uniform thickness
  • the film 22 of the projection forming portion 17 of the non-product portion 16 is formed to have the projection 17A.
  • Examples of the curing device 33 include a drying device and a light irradiation device, and are selected according to the functional material contained in the coating film 41.
  • the drying device supplies the dried gas (for example, air) to the coating film 41 to dry the coating film 41.
  • the light irradiation device emits light toward the coating film 41 to cure, for example, a photocurable compound contained in the coating film 41.
  • an ultraviolet irradiation device that emits ultraviolet light may be used as the light irradiation device. Note that a plurality of these curing devices may be arranged in combination.
  • the winding unit 34 has a turret arm 46 and winds the film 12 around the winding core 11 set on the winding shaft 47.
  • the film 12 is wound up with the film 22 facing the winding core 11 (inward), but the film 12 is wound up with the film 22 facing outward (outward). You may.
  • the direction of the film 22 in winding can be set by the rotation direction of the winding shaft 47 and the introduction path of the film 22 with respect to the rotation direction of the winding shaft 47.
  • the turret arm 46 is intermittently rotated by 180 degrees by an arm driving unit (not shown), and selectively switches the winding core 11 between the winding position PS1 and the core replacing position PS2.
  • a guide arm 48 is provided at an intermediate position in the rotation direction of the turret arm 46, and a guide roller 51 is attached to each end of the guide arm 48.
  • the guide roller 51 supports the film 12 in a state where the film 12 does not contact the turret arm 46 and the arm mounting shaft 52 when the turret arm 46 is rotating.
  • the winding shaft 47 is provided at each end of the turret arm 46, and the winding core 11 is set on the winding shaft 47.
  • the film 12 sent from the roller 30 is wound around the winding core 11.
  • the film 12 having a fixed length is wound, and the film roll 10 which has been fully wound is removed from the winding shaft 47 together with the core 11, and a new winding shaft 47 is attached to the winding shaft 47.
  • An empty core 11 is set, and the core 11 is replaced.
  • the turret arm 46 is set. Is rotated by 180 degrees, and the film roll 10 close to full winding is positioned at the core exchange position PS2. An empty winding core 11 is positioned at the winding position PS1.
  • a rewinding device (not shown) is operated, and the film 12 is cut.
  • the cut preceding film 12 is wound on the film roll 10 at the core exchange position PS2 with the rear end as the above-mentioned other end 12B (see FIG. 1).
  • the cut film 12 is wound around the empty winding core 11 at the winding position PS1 with the leading end 12A as described above (see FIG. 1).
  • the continuously fed film 12 becomes a roll product in the form of the film roll 10.
  • the coating device 32 further includes a supply unit 60, a gantry 61, a moving table 62, a stage 63, a shift mechanism 66, a decompression chamber 67, a suction unit 68, and a collection unit 71. And a controller 72.
  • the supply unit 60 supplies the coating liquid 43 (see FIG. 4) to the slot die 44 at a set flow rate.
  • the gantry 61 is for supporting the slot die 44.
  • the outlet port 45 is directed upward, and the slot die 44 is disposed at a position lower than the rotation center of the support roller 42, and the slot die 44 is held in a position in which the outlet port 45 is directed upward.
  • the slot die 44 is not limited to this arrangement, and may be, for example, above or below the support roller 42.
  • the liquid outlet 45 only needs to face the support roller 42, and is not limited to the upward as in this example.
  • the gantry 61 is fixed to the moving table 62, and the moving table 62 is movably provided on the stage 63 and includes a shift mechanism 66.
  • the stage 63 is provided with a rail (not shown) extending in the lateral direction in FIG.
  • the moving table 62 is slid along the rail by the shift mechanism 66.
  • the gantry 61 moves integrally with the movable gantry 62, and this movement causes the slot die 44 on the gantry 61 to move in a direction to increase or decrease the distance from the support roller 42.
  • a coating bead (hereinafter, simply referred to as a bead) 76 is formed between the slot die 33 and the substrate 21 by the coating liquid 43 that has come out of the slot die 44.
  • the boundary between the bead 76 and the outside air on the upstream side in the moving direction Dc is called an upstream meniscus MU (see FIG. 8), and the boundary with the outside air on the downstream side is called a downstream meniscus MD (see FIG. 8).
  • the decompression chamber 67 is for adjusting the shape of the bead 76, and adjusting the shape of the bead 76 includes adjusting the shape of the bead 76 itself and adjusting the position of the upstream meniscus MU.
  • the decompression chamber 67 is provided on the upstream side in the movement direction Dc of the slot die 44 and the support roller 42, and is provided below the slot die 44 and the support roller 42 in this example.
  • the decompression chamber 67 is provided with an opening 67o facing the support roller.
  • the pressure in the partitioned space (hereinafter, referred to as a decompression space) is reduced by the suction unit 68.
  • the front plate 67a, the back plate 67b, the pair of side plates 67c, and the base plate 67d partition the decompressed space from the external space.
  • the front plate 67a, the back plate 67b, and the pair of side plates 67c are provided in an upright posture with respect to the moving base material 21, and the base plate 67d is placed on the movable base 62.
  • Each of the side plates 67c is cut out in a substantially arc shape (curved shape) substantially along the peripheral surface of the support roller 42, and is not outside the support roller 42, that is, the edge of the side plate 67c is supported. It is arranged at a position facing the peripheral surface of the roller 42. Thereby, the side plate 67c partitions the reduced pressure space at both ends in the width direction of the base 21.
  • the front plate 67a partitions the decompression space on the downstream side in the movement direction Dc
  • the back plate 67b partitions on the upstream side in the movement direction Dc, and extends in the width direction of the base material 21.
  • the front plate 67a, the back plate 67b, and the side plate 67c are spaced from the peripheral surface of the support roller 42 in consideration of the thickness T21 of the substrate 21 in order to prevent contact with the substrate 21.
  • the back plate 67b is provided with an adjusting plate 67e extending in the width direction of the base member 21, and is movable in a direction to increase or decrease the distance from the base member 21.
  • the adjustment plate 67e adjusts the gap with the base material 21 by this movement, and more precisely adjusts the pressure in the reduced pressure space.
  • the suction unit 68 is connected to the decompression chamber 67, and depressurizes the decompression space by sucking air. Thereby, the shape of the bead 76 is adjusted, and the position of the upstream meniscus MU (see FIG. 8) on the slot die 44 is adjusted.
  • a partition plate 67f is provided inside the decompression chamber 67 so as to stand on the base plate 67d.
  • the partition plate 67f forms a liquid reservoir 67s for receiving (reserving) the coating liquid 43 from the slot die 44 between the partition plate 67f and the front plate 67a.
  • a discharge port 67v is provided at the lower part of the pair of side plates 67c so as to be openable and closable, and a recovery section 71 for recovering the coating liquid 43 is connected to the discharge port 67v.
  • the controller 72 controls the supply unit 60, the shift mechanism 66, the suction unit 68, the opening / closing of the discharge port 67v, the collection unit 71, and the like.
  • the supply unit 60 is controlled to adjust the supply amount of the coating liquid 43 to the slot die 44.
  • the adjustment of the supply amount includes the start and stop of the application liquid 43 (the flow rate is set to zero).
  • the shift mechanism 66 is controlled to move the slot die 44 in the horizontal direction in FIG. 5 at a predetermined timing, thereby increasing or decreasing the distance between the slot die 44 and the base 21.
  • the controller 72 controls the suction unit 68, adjusts the pressure in the decompression space, controls the collection unit 71, and opens and closes the discharge port 67v via the collection unit 71.
  • the camera 73 is for observing the exposed state of the tip lip 82 in the pre-coating step described later.
  • the camera 73 is arranged inside the support roller 42 so that the tip lip 82 can be imaged.
  • a display device (not shown) for observing the captured image is provided outside the support roller 42, and the camera 73 is electrically connected to the display device. Since the camera 73 is for observing the tip lip 82, the support roller 42 is formed of a transparent material in the outer peripheral member 42b constituting the outer peripheral surface having a circular cross section, and is formed of glass in this example. I have. Thereby, the camera 73 captures an image of the surface of the tip lip 82 via the outer peripheral member 42b.
  • the slot die 44 includes an upstream block (hereinafter, referred to as an upstream block) 77 and a downstream block (hereinafter, referred to as a downstream block) 78 in the movement direction Dc.
  • the upstream block 77 and the downstream block 78 form a slot 81 therebetween as a flow path through which the coating liquid 43 flows.
  • One end of the slot 81 is formed in the slot die 44 with a slit-shaped opening extending in the width direction of the substrate 21 as the liquid outlet 45.
  • the slot die 44 of this example has an outer dimension of 120 mm in the width direction (the depth direction in the drawing of FIG. 5 and coincides with the width direction of the base material 21). Not limited.
  • the upstream block 77 and the downstream block 78 are made of metal (for example, stainless steel), it is preferable to apply a surface treatment to the tip lip 82 between the upstream block 77 and the downstream block 78.
  • the surface layer 82a is for surely exposing the tip lip 82 in a pre-coating step described later, and may be extremely thin. Although the thickness of the surface layer 82a is greatly exaggerated in FIG. 5, the thickness in this example is approximately 100 nm.
  • the surface layer 82a is formed by applying a material to be the surface layer 82a or a liquid in which the material is dissolved in a solvent or dispersed in a dispersion medium by spraying and heat-treated.
  • the tip lip of the upstream block 77 will be denoted by 82U, and the tip lip of the downstream block 78 will be denoted by reference numeral 82D. Also in this example, the above-described surface treatment is performed on the tip lip 82, and the surface layer 82a is formed.
  • the surface layer 82a is formed of a polymer containing fluorine, and Optool (registered trademark) DSX manufactured by Daikin Industries, Ltd. is used as the polymer containing fluorine.
  • the material of the surface layer 82a is not limited to this example.
  • SURECO (registered trademark) AF series manufactured by AGC Co., Ltd. beam set (registered trademark) 1400 series manufactured by Arakawa Chemical Industry Co., Ltd., Shin-Etsu Chemical Co., Ltd. SHIN-ETSU @ SUBELYN (registered trademark) KY-100 series.
  • the method of the surface treatment is not limited to this example, and may be, for example, vapor deposition, dip coating, spin coating, or the like.
  • the tip lip 82 may be formed of a detachable member.
  • a tip lip member (not shown) constituting the tip lip 82 is fitted to a die body in which a metal upstream block body (not shown) and a downstream block body (not shown) are integrally combined. Slot die combined. It is preferable to apply the above-mentioned surface treatment to the tip lip member.
  • the tip lip 82 having the surface layer 82a preferably has a contact angle hysteresis ⁇ H with respect to the coating liquid 43 of at most 30 °, that is, within 30 °.
  • the contact angle hysteresis ⁇ H is the contact angle hysteresis for the used coating solution.
  • the contact angle hysteresis ⁇ H is more preferably within 25 °, further preferably within 20 °, and particularly preferably within 10 °.
  • the contact angle hysteresis ⁇ H is, as is well known, a difference obtained by subtracting the receding contact angle ⁇ 2 from the advancing contact angle ⁇ 1 of the droplet D attached to the surface of the solid S (see FIG. 6).
  • the wettability of the surface of the solid S is often discussed by the contact angle ⁇ C.
  • the contact angle ⁇ C is an angle formed between the free surface of the droplet D that is stationary on the surface of the solid S and the surface of the solid S, and the angle formed is the angle on the droplet D side (see FIG. 7). .
  • the tip lip 82 corresponds to the solid S
  • the droplet D is the droplet 43 d of the coating liquid 43.
  • the leading lip 82 has a forward contact angle ⁇ 1 of 69.3 ° and a receding contact angle ⁇ 2 of 53.7 ° when the contact angle hysteresis ⁇ H is 15.6 ° described above.
  • the contact angle ⁇ C of the tip lip 82 with the coating liquid 43 is 59.1 °.
  • the tip lip having the contact angle hysteresis ⁇ H of 43.2 ° described above has a forward contact angle ⁇ 1 of 71.3 °, a receding contact angle ⁇ 2 of 28.1 °, and a contact angle ⁇ C of 65.3. °.
  • the tip lip having the contact angle hysteresis ⁇ H of 70 ° described above has a forward contact angle ⁇ 1 of 81.3 °, a receding contact angle ⁇ 2 of 11.1 °, and a contact angle ⁇ C of 10.6 °.
  • the contact angle hysteresis ⁇ H can be calculated by calculating the forward contact angle ⁇ 1 and the receding contact angle ⁇ 2, and calculating the equation ⁇ 1 ⁇ 2.
  • the advancing contact angle ⁇ 1 and the receding contact angle ⁇ 2 can be obtained by a sliding down method.
  • the sliding down method first, a liquid is dropped on a substrate having a horizontal substrate surface. Then, the substrate is gradually tilted while the droplet is placed thereon, and the angle between the droplet and the substrate surface when the droplet starts to move is obtained.
  • the angle formed by the droplet in the traveling direction is referred to as an advancing contact angle ⁇ 1, and the angle formed in the direction opposite to the traveling direction is defined as a receding contact angle ⁇ 2.
  • the forward contact angle ⁇ 1 and the receding contact angle ⁇ 2 using the sliding down method can be obtained with a commercially available sliding down angle meter.
  • a commercially available sliding contact angle meter there is, for example, DropMaster SA series of Kyowa Interface Science Co., Ltd.
  • the forward contact angle ⁇ 1 and the receding contact angle ⁇ 2 may be obtained by attaching the droplet 43d of the coating liquid 43 to the tip lip 82, or a sample made of the same material as the tip lip 82
  • the measurement may be performed by attaching the droplet 43d to the sample, and in this example, the measurement is performed using the sample.
  • the contact angle ⁇ C can be determined by a droplet method, and a commercially available measuring instrument (for example, the above-mentioned DropMaster SA series) may be used. Also in this example, the value is determined by the liquid appropriate method, and DropMaster SA series of Kyowa Interface Science Co., Ltd. is used.
  • the slot die 44 of this example is configured such that the distal end lip 82D of the downstream side block 78 has a smaller distance from the base material 21 than the distal end lip 82U of the upstream side block 77.
  • 77 and the downstream block 78 are integrally combined.
  • the manner of combining the upstream block 77 and the downstream block 78 is not limited to this example.
  • the distance d1 (unit: ⁇ m) of the tip lip 82D is the same as the distance d2 (unit: ⁇ m) between the tip lip 82U and the base material 21 and the upstream block 77 and the downstream block 78 are combined.
  • the upstream block 77 and the downstream block 78 may be combined so that the distance d2 is smaller than the distance d1.
  • the distance d1 is 100 ⁇ m.
  • the protrusion amount QE of one of the tip lip 82U and the tip lip 82D projecting toward the substrate 21 and the support roller 42 more than the other is preferably within a range of more than 0 ⁇ m and 300 ⁇ m or less, and in this example, 150 ⁇ m. I have.
  • the tip lip 82U and the tip lip 82D have flat surfaces substantially along the movement direction Dc, as shown in FIG.
  • the length LL of the flat surface portion of the tip lip 82 in the movement direction Dc (hereinafter, referred to as lip length) is 1 mm for the tip lip 82U and extremely short for the tip lip 82D.
  • the lip length LL is not limited to this example.
  • the lip lengths LL of the tip lip 82U and the tip lip 82D may be the same.
  • the lip length LL of the end lip 82D is in the formula below (1) and (1A), is represented by L 1.
  • the pressure at an arbitrary position (symbol PA in FIG. 8) on the downstream side of the bead 76 is set to P0 (unit: Pa), and an arbitrary position very close to the downstream meniscus MD of the bead 76 (FIG. Of the bead 76 is denoted by P1 (unit: Pa), the pressure at an arbitrary position (reference numeral PC in FIG. 8) of the bead 76 extended from the slot is denoted by P2 (unit: Pa), and
  • the pressure at an arbitrary position (symbol PD in FIG. 8) very close to the upstream meniscus MU is P3 (unit: Pa), and the pressure at an arbitrary position (symbol PE in FIG.
  • the pressure P0 is the atmospheric pressure
  • the pressure P4 is adjusted by the decompression chamber 67.
  • Each of the pressures P0 to P4 is a so-called gauge pressure when the atmospheric pressure is set to 0 Pa.
  • the flow of the coating liquid 43 in the bead 76 is a flow obtained by combining the Couette flow and the Poiseuille flow, as is well known.
  • the Couette flow is a flow that depends on the movement of the substrate 21 and the viscosity of the coating liquid 43
  • the Poiseuille flow depends on the difference between the pressures P1 and P2 and / or the difference between the pressures P2 and P3. It is a flow.
  • the length L (unit is m) of the upstream meniscus MU (hereinafter, referred to as upstream bead length) at the tip lip 82U is obtained by the following equation (1).
  • L (d1 2 / 6 ⁇ U) ⁇ [-P4-1.34 ( ⁇ U / ⁇ ) 2/3 ⁇ ( ⁇ / h) - (6 ⁇ UL 1 / d1 3) ⁇ (d1-2h) + ⁇ (cos ⁇ C s + Cos ⁇ C d ) ⁇ / d2] (1)
  • Equation (1) is obtained from the following equations (1A) and (1B).
  • P0 ⁇ P4 1.34 ( ⁇ U / ⁇ ) 2/3 ⁇ ( ⁇ / h) + (6 ⁇ UL 1 / d1 3 ) ⁇ (d1-2h) + (6 ⁇ UL / d2 2 ) + ⁇ / R (1A) )
  • R - ⁇ d2 / (cos ⁇ C s + cos ⁇ C d) ⁇ ⁇ (1B)
  • ⁇ , U, etc. mean the following, respectively.
  • ⁇ unit: Pa ⁇ s
  • viscosity U of coating liquid 43 (unit: m / s); moving speed of substrate 21 ⁇ (unit: N / m); surface tension h (unit: m); coating film 41 thickness .theta.C s (unit °) of; is an angle formed between the tip lip 82U and the upstream meniscus MU, angle formed .theta.C d (unit is °) is an angle of the inner side of the bead 76; base material 21 and the upstream The angle formed with the side meniscus MU is an angle formed on the inner side of the bead 76.
  • R unit is m
  • the substrate 21 is moved.
  • the supply of the coating liquid 43 from the supply unit 60 (see FIG. 5) to the slot die 44 is started.
  • the supplied flow rate is a flow rate at which the film 22 of the protrusion non-formed portion 18 (see FIG. 1) is formed to a predetermined thickness T22.
  • the coating liquid 43 that has exited the slot flows down along the tip lip 82U. As a result, the tip lip 82U becomes wet with the coating liquid 43.
  • the slot die 44 is moved by the shift mechanism 66 to reduce the distance between the slot die 44 and the substrate 21.
  • the distance between the slot die 44 and the base 21 is the distance d1.
  • the coating liquid 43 coming out of the slot 81 is brought into contact with the substrate 21 (liquid contacting step).
  • a bead 76 is formed between.
  • the slot die 44 is moved to a predetermined application position set in advance. However, the slot die 44 may be moved to a position closer to the substrate 21 than the application position.
  • the substrate inside the decompression chamber 67 is suctioned by the suction unit 68 and the pressure inside the decompression chamber 67 is set to a negative pressure, so that the above-described pressure P4 is the same pressure as the pressure P4 set in the main coating process described later.
  • suction is performed at a reduced pressure (suction pressure) of approximately 300 Pa by the reduced pressure chamber 67 in the main coating process.
  • the “same pressure” does not have to be exactly the same as the pressure P4 and may be regarded as the same if the difference is within 10 Pa.
  • the coating liquid 43 is continuously applied to the base material 21, and the tip lip 82 ⁇ / b> U is exposed while the application liquid 43 is being applied (preliminary application step).
  • the entire area of the tip lip 82U does not need to be exposed to the outside air, and a part of the tip lip 82U on the upstream side in the movement direction Dc (a part of the area from the upstream edge) is formed of the base material 21. What is necessary is that it is exposed in the entire area in the width direction.
  • the position of the upstream meniscus MU at the tip lip 82U during the formation of the film 22 of the product portion 15 to the predetermined thickness T22 is determined in advance, and the position of the upstream meniscus MU on the upstream side is shifted to the position downstream of the position.
  • a part of the tip lip 82U on the upstream side in the movement direction Dc may be exposed in the width direction of the base 21. Since the contact angle hysteresis is suppressed within 20 °, the tip lip 82U is reliably exposed in the preliminary coating step.
  • the coating liquid 43 although extremely thin, remained in the form of a film on the tip lip of the upstream block, which was considered to be exposed. While the coating is continued, the coating liquid oozes from the bead into the coating liquid remaining in a film form in this way. Then, it was found that the solvent evaporates from the film-like material, the surface tension increases, and a lump of a coating liquid such as a gel-like material is formed on the film-like material. On the other hand, according to the present embodiment, since the tip lip 82U is exposed, the lump is not formed on the tip lip 82U, and as a result, a streak-like groove is not formed in the coating film. Therefore, the application can be continued for a longer time, and as a result, the film 12 can be obtained as a longer one.
  • the preliminary application step may be an exposure waiting step of waiting for the tip lip 82U to be exposed. If the contact angle hysteresis ⁇ H is within 10 °, even if the droplet 43d once occurs on the tip lip 82U, the droplet 43d falls quickly, and the droplet 43d does not remain. When the contact angle hysteresis ⁇ H of the tip lip 82U is larger than 10 ° and within 20 °, after waiting for the exposure, as shown in FIG. 9B, the tip lip 82U remains in a state where the droplet 43d remains. Exposed. In this way, as shown in FIG. 9B, the droplet 43d may remain in the exposed region.
  • the tip lip 82 is in a state where the coating liquid 43 remains as a droplet 43d. It has been confirmed by observation using the camera 73 that the portion other than the portion where the droplet 43d is attached is exposed.
  • the contact angle hysteresis ⁇ H is 7.2 ° which is within 10 °, it has been confirmed that the droplet 43d does not remain and the entire area of the tip lip 82 is exposed to the outside air.
  • the tip lip is extremely thin but keeps the entire area wet with the coating liquid 43. Therefore, it has been confirmed that the state of exposure to the outside air does not occur in the observation time of 300 minutes.
  • the pre-coating step preferably includes a droplet dropping step of dropping the droplet 43d.
  • a method of dropping the droplet 43d include a method of applying vibration to the tip lip 82U and a method of blowing wind to the tip lip 82U.
  • the pre-coating step may include a first meniscus moving step and a second meniscus moving step.
  • the first meniscus moving step is performed.
  • a second meniscus moving step In the first meniscus moving step, as shown in FIG. 9C, the droplet 43d is integrated with the bead 76 by moving the upstream meniscus MU to the upstream side in the moving direction Dc.
  • the upstream meniscus MU is moved to a position before the first meniscus moving step. More specifically, it returns to the position at the start of the first meniscus moving step.
  • the tip lip 82U on the upstream side of the upstream meniscus MU is more reliably exposed to a state in which the droplet 43d does not remain.
  • the movement of the upstream meniscus MU includes changing the degree of pressure reduction on the upstream side of the bead 76 in the movement direction Dc, increasing or decreasing the distance between the slot die 44 and the base material 21, and changing the coating liquid 43 flowing out of the slot die 44. It is preferable to change the flow rate.
  • the pressure P4 changes, so that the upstream meniscus MU moves. For example, when moving the upstream meniscus MU to the upstream side, in order to reduce the pressure P4, the suction force in the pressure reducing chamber 67 is increased, and the degree of pressure reduction is increased. Further, when the meniscus MU on the upstream side is moved to the downstream side, the suction force in the decompression chamber 67 may be reduced because the pressure P4 may be increased.
  • the distance d1 between the slot die 44 and the base material 21 may be increased, as shown in Expression (1), or the coating coming out of the slot die 44.
  • the flow rate of the liquid 43 may be increased.
  • the distance d1 between the slot die 44 and the base material 21 may be reduced, or the flow rate of the coating liquid 43 exiting the slot die 44 may be reduced. You may.
  • the pre-coating step is preferably completed within 10 seconds from the start of the contact of the coating liquid 43 with the base material 21 in the liquid contacting step.
  • the droplets 43d are formed in a dense state in a part of the coating film 41 to be formed which is close to the front end of the base material 21 in the longitudinal direction and is very limited.
  • the plurality of protrusions 17A are formed in a very limited partial section near one end 12A in the longitudinal direction of the film 12 (see FIG. 1). Play.
  • the film 22 of the non-product part 16 is generated from the coating film 41 formed in the above preliminary coating step. Specifically, no protrusions are formed from the coating film 41 formed from the start of the liquid landing step shown in FIG. 9B to before the unification of the droplets 43d in the first meniscus moving step.
  • the film 22 of the part 18 (see FIG. 1) is generated.
  • the film 22 of the projection forming portion 17 (see FIGS. 1 and 3) is generated from the coating film 41 formed from the beginning to the end of the integration of the droplets 43d in the first meniscus moving step.
  • the spherical droplet 43d integrated with the bead 76 forms the projection 17A (see FIGS. 1 and 3).
  • the above-mentioned edge trace may be formed in a certain length region on one end 12A side of the film 12.
  • the area with this edge mark is not usually encouraged to use and is a waste area.
  • the film roll 10 effectively uses the non-product portion where the projections 17A exist as a region where an edge mark is left. As a result, the total amount of waste including raw materials is reduced.

Abstract

Provided are a film manufacturing method in which uneven thickness of a coating is suppressed for a longer period of time, and a film roll utilizing the method. This method for manufacturing a film (12) using a film manufacturing facility (30) comprises a liquid discharge start step, a liquid deposition step, a preliminary application step, and a main application step. In the liquid discharge start step, discharging of an application liquid (43) from a slot die (44) is started. In the liquid deposition step, the application liquid (43) is brought into contact with a base material (21). In the preliminary application step, a leading-end lip of an upstream block is exposed in a state where the application liquid (43) is applied to the base material (21). After the preliminary application step, the application is continued to form a coating (22) of a layered film (12) which is to serve as a product part.

Description

フィルム製造方法及びフィルムロールFilm manufacturing method and film roll
　本発明は、フィルム製造方法及びフィルムロールに関する。 The present invention relates to a film manufacturing method and a film roll.
　移動する長尺の基材に、スロットダイを用いて塗布液を塗布することにより、積層フィルムを製造する方法が知られている。スロットダイは、基材の移動方向における上流側のブロック（以下、上流側ブロックと称する）と下流側のブロック（以下、下流側ブロックと称する）との間のスロットから塗布液を出す塗布ダイである。 方法 A method of manufacturing a laminated film by applying a coating liquid to a moving long substrate using a slot die is known. The slot die is a coating die that discharges a coating liquid from a slot between an upstream block (hereinafter, referred to as an upstream block) and a downstream block (hereinafter, referred to as a downstream block) in the moving direction of the base material. is there.
　スロットダイを用いた塗布で積層フィルム製造する方法として、例えば特許文献１には，スロットダイの形状及び塗布条件を所定の式を満たす条件で行うことが記載されている。この方法では、下流側ブロックの先端リップの表面と基材との間隔を、基材の移動方向における下流側に向かうに従って漸増させた条件下で塗布している。また、塗布の条件を、塗布液の前進接触角と後退接触角とを用いて設定することが記載されている。 As a method of manufacturing a laminated film by application using a slot die, for example, Patent Document 1 describes that the shape and application conditions of the slot die are performed under conditions that satisfy a predetermined formula. In this method, the coating is performed under the condition that the distance between the surface of the tip lip of the downstream block and the substrate is gradually increased toward the downstream side in the moving direction of the substrate. It also describes that the conditions for coating are set using a forward contact angle and a receding contact angle of the coating liquid.
　前進接触角から後退接触角を減じた接触角ヒステリシスが小さい場合には、液滴の移動性が大きくなることが特許文献２に記載されている。 Patent Document 2 discloses that when the contact angle hysteresis obtained by subtracting the receding contact angle from the advancing contact angle is small, the mobility of the droplet is increased.
　また、特許文献３には、スロットダイを用いた塗布の終了時において、上流側ブロックに位置しているメニスカスが、上流側に移動し、その後、下流側に移動する態様が記載されている。 Patent Document 3 describes a mode in which, at the end of coating using a slot die, the meniscus located in the upstream block moves upstream, and then moves downstream.
特開２００４－２１６２９８号公報JP-A-2004-216298 特開２００４－０１７４９７号公報JP-A-2004-017497 特開２００７－２３７０７２号公報JP 2007-237072 A
　しかしながら、スロットダイを用いた塗布方法においては、塗布を継続している間に、塗膜に球状の凸部が形成するようになる。この凸部は、スロットダイの上流側ブロックの先端において、塗布液の塊（ゲル状物等）が生じ、この塊がスロットダイから脱離し、塗膜に入り込んでしまうことで形成される。そこで、塗布を停止し、上流側ブロックの先端を洗浄した後に新たな積層フィルムを製造することになる。このように塗布を停止することから、継続できる塗布時間には限界があり、製造できるフィルムの長さは制限されている。 However, in the coating method using the slot die, a spherical convex portion is formed on the coating film while the coating is continued. The projections are formed by the formation of a lump (a gel-like substance or the like) of the coating liquid at the tip of the upstream block of the slot die, and the lump detaches from the slot die and enters the coating film. Therefore, after the application is stopped and the tip of the upstream block is washed, a new laminated film is manufactured. Since the application is stopped in this way, there is a limit to the application time that can be continued, and the length of the film that can be produced is limited.
　この点、特許文献１及び３の塗布方法を用いても、上記のように、継続できる塗布時間には限界があり、製造できるフィルムの長さも限界がある。また、特許文献２に記載される手法は、インクジェットプリンタに関するものであり、スロットダイでの塗布に利用したとしても、上記のような塗布時間及び製造できるフィルムの長さの限界を解決できない。 点 In this regard, even if the coating methods of Patent Documents 1 and 3 are used, there is a limit to the continuous coating time and a limit to the length of a film that can be produced, as described above. Further, the method described in Patent Document 2 relates to an ink jet printer, and cannot be used for coating with a slot die, but cannot solve the above-described limitations on the coating time and the length of a film that can be manufactured.
　そこで本発明は、塗膜の厚みむらをより長時間抑制するフィルム製造方法及びその方法を利用したフィルムロールを提供することを目的とする。 Accordingly, an object of the present invention is to provide a method for producing a film that suppresses unevenness in the thickness of a coating film for a longer time and a film roll using the method.
　上記目的を達成するために、本発明のフィルム製造方法は、出液開始工程と、着液工程と、予備塗布工程と、本塗布工程とを有し、移動する長尺の基材に、基材の移動方向における上流側のブロックと下流側のブロックとの間のスロットから塗布液を出すスロットダイにより塗布液を連続的に塗布することにより、積層フィルムを製造する。出液開始工程は、スロットダイのスロットから塗布液を出し始める。着液工程は、移動中の基材と出液中のスロットダイとの距離を狭めることにより、スロットダイから出ている塗布液を基材に接触させる。予備塗布工程は、塗布液を基材に塗布している状態で、着液工程により塗布液で濡れていた上流側ブロックの先端リップを露呈させる。本塗布工程は、予備塗布工程の後に塗布を継続し、製品部となる積層フィルムの塗膜を形成する。 In order to achieve the above object, a film manufacturing method of the present invention includes a liquid discharge starting step, a liquid contacting step, a preliminary coating step, and a main coating step. A laminated film is manufactured by continuously applying a coating liquid by a slot die for discharging the coating liquid from a slot between an upstream block and a downstream block in the moving direction of the material. In the liquid discharging start step, the coating liquid is discharged from the slot of the slot die. In the liquid contacting step, the distance between the moving base material and the slot die that is discharging liquid is reduced, so that the coating liquid coming out of the slot die is brought into contact with the base material. The preliminary application step exposes the tip lip of the upstream block wetted by the application liquid in the liquid application step while the application liquid is being applied to the base material. In the present coating step, the coating is continued after the preliminary coating step to form a coating film of a laminated film to be a product part.
　予備塗布工程は、先端リップに塗布液が液滴として残存している状態に先端リップが露呈した場合には、液滴を落下させる液滴落下工程を有することが好ましい。 (4) The pre-coating step preferably includes a dropping step of dropping the droplet when the tip lip is exposed while the coating liquid remains as a droplet on the tip lip.
　予備塗布工程は、第１メニスカス移動工程と、第２メニスカス移動工程とを有することが好ましい。第１メニスカス移動工程は、スロットダイと基材との間の塗布ビードの上流側メニスカスを、基材の移動方向における上流側に移動させることにより、液滴を塗布ビードに一体化させる。第２メニスカス移動工程は、第１メニスカス移動工程の後に、上流側メニスカスを第１メニスカス移動工程前の位置に移動させる。 The pre-coating step preferably includes a first meniscus moving step and a second meniscus moving step. In the first meniscus moving step, the droplet is integrated with the application bead by moving the meniscus on the upstream side of the application bead between the slot die and the substrate to the upstream side in the moving direction of the substrate. In the second meniscus moving step, after the first meniscus moving step, the upstream meniscus is moved to a position before the first meniscus moving step.
　上流側メニスカスの移動は、塗布ビードの基材の移動方向における上流側の減圧度を変更することと、スロットダイと基材との距離を増減させることと、スロットダイからの塗布液の流量を変更することとのいずれかにより、上流側メニスカスを移動させることが好ましい。 The movement of the upstream meniscus includes changing the degree of pressure reduction on the upstream side in the moving direction of the base material of the coating bead, increasing or decreasing the distance between the slot die and the base material, and increasing the flow rate of the coating liquid from the slot die. It is preferable to move the upstream meniscus by either of the above methods.
　予備塗布工程を、着液工程における塗布液の基材への接触開始から１０秒以内に終了させることが好ましい。 (4) The pre-coating step is preferably completed within 10 seconds from the start of the contact of the coating liquid with the base material in the liquid landing step.
　フィルム製造方法は、積層フィルムを巻き芯に巻き取る巻取工程をさらに有し、巻き芯には、予備塗布工程を経た積層フィルムを巻き取った後に、本塗布工程を経た積層フィルムを巻き取ることが好ましい。 The film manufacturing method further includes a winding step of winding the laminated film around a core, and after winding the laminated film having undergone the preliminary coating step on the core, winding the laminated film having undergone the main coating step. Is preferred.
　本発明のフィルムロールは、巻き芯と、積層フィルムとを備え、積層フィルムは、基材と基材に形成された膜を備え、長尺に形成され、長手方向における一端側から巻き芯に巻かれている。積層フィルムは、積層フィルムの長手方向に延びた突起が膜に形成されているフィルム部を、上記一端側に有する。 The film roll of the present invention includes a winding core and a laminated film, and the laminated film includes a substrate and a film formed on the substrate, is formed in a long shape, and is wound around the winding core from one end side in the longitudinal direction. Has been. The laminated film has, on the one end side, a film portion in which protrusions extending in the longitudinal direction of the laminated film are formed on the film.
　本発明のフィルム製造方法によると、塗膜の厚みむらをより長時間抑制することができ、より長尺のフィルムが巻かれたフィルムロールが得られる。 According to the film production method of the present invention, thickness unevenness of the coating film can be suppressed for a longer time, and a film roll on which a longer film is wound can be obtained.
本発明を実施したフィルムロールの説明図である。BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing of the film roll which implemented this invention. 積層フィルムの層構造の説明図である。It is explanatory drawing of the layer structure of a laminated film. 突起形成部の説明図であり、（Ａ）は平面図であり、（Ｂ）は（Ａ）の（IIIｂ）－（IIIｂ）線に沿った断面の端面図である。It is explanatory drawing of a protrusion formation part, (A) is a top view, (B) is an end elevation of the cross section along the (IIIb)-(IIIb) line of (A). フィルム製造設備の概略図である。It is a schematic diagram of a film manufacturing facility. 塗布装置の概略図である。It is a schematic diagram of a coating device. 接触角ヒステリシスの説明図である。It is explanatory drawing of a contact angle hysteresis. 接触角の説明図である。It is explanatory drawing of a contact angle. スロットダイと基材との説明図である。It is explanatory drawing of a slot die and a base material. 塗布の説明図である。It is explanatory drawing of application | coating.
　図１において、フィルムロール１０は、巻き芯１１と、長尺の積層フィルム（以下、単に「フィルム」と称する）１２とを備える。巻き芯１１は、この例では円筒状に形成されているが、円柱状であっても構わない。 In FIG. 1, the film roll 10 includes a winding core 11 and a long laminated film (hereinafter, simply referred to as “film”) 12. The winding core 11 is formed in a cylindrical shape in this example, but may be formed in a cylindrical shape.
　図１において二点破線は巻き芯１１に巻かれた状態のフィルム１２を示し、実線は巻き芯１１に巻かれる前のフィルム１２を示している。フィルム１２は、巻き芯１１が後述のように図１の矢線Ａで示す方向に回転することにより、長手方向における一端１２Ａ側から巻き芯１１に巻かれたロール形態にされる。なお、図１においては、フィルム１２の厚みを大きく誇張して描いてある。 In FIG. 1, the two-dot broken line indicates the film 12 wound around the core 11, and the solid line indicates the film 12 before being wound around the core 11. The film 12 is formed into a roll form in which the core 11 is rotated in a direction indicated by an arrow A in FIG. 1 as described later, and is wound around the core 11 from one end 12A side in the longitudinal direction. In FIG. 1, the thickness of the film 12 is greatly exaggerated.
　フィルム１２は、製品部１５と、非製品部１６とで構成されている。製品部１５は、例えば光学部材などの製品として使用に供されるフィルム部である。非製品部１６は、例えば光学部材などの製品としては使用しないフィルム部である。ただし非製品部１６は、使用を予定しないフィルム部であってもよく、実際に使用しないフィルム部には限られない。また、製品部１５は、使用を予定するフィルム部であればよく、実際に使用されるフィルム部でなくてもよい。 The film 12 is composed of a product part 15 and a non-product part 16. The product section 15 is a film section provided for use as a product such as an optical member. The non-product part 16 is a film part that is not used as a product such as an optical member. However, the non-product part 16 may be a film part that is not planned to be used, and is not limited to a film part that is not actually used. Further, the product section 15 may be a film section to be used, and need not be a film section actually used.
　非製品部１６はフィルム１２の一端１２Ａ側を構成するフィルム部であり、製品部１５は、他端１２Ｂ側を構成するフィルム部である。したがって、非製品部１６はフィルムロール１０の内部に位置し、製品部１５が非製品部１６の外側に位置する。 The non-product part 16 is a film part constituting one end 12A side of the film 12, and the product part 15 is a film part constituting the other end 12B side. Therefore, the non-product part 16 is located inside the film roll 10, and the product part 15 is located outside the non-product part 16.
　製品部１５は、フィルム１２の長手方向における大部分を構成しており、長さＬ１５が非製品部１６の長さＬ１６よりも極端に長い。非製品部１６の長さＬ１６は大きくても３００ｍに抑えられていることが好ましく、本例では１００ｍとなっている。非製品部１６の長さＬ１６は２０ｍ以上３００ｍ以下の範囲内であることがより好ましく、２０ｍ以上１００ｍ以下の範囲内であることがさらに好ましい。 The product part 15 constitutes most of the film 12 in the longitudinal direction, and the length L15 is extremely longer than the length L16 of the non-product part 16. It is preferable that the length L16 of the non-product part 16 is suppressed to 300 m at most, and is 100 m in this example. The length L16 of the non-product part 16 is more preferably in the range of 20 m or more and 300 m or less, and even more preferably in the range of 20 m or more and 100 m or less.
　非製品部１６は、突起形成部１７と突起非形成部１８とを有する。突起形成部１７は、フィルム１２の長手方向に延びた突起１７Ａがある領域であり、突起非形成部１８にはこのような突起１７Ａは形成されていない。突起形成部１７は、非製品部１６の製品部１５側の端部に、突起非形成部１８よりも極端に短い長さ領域として形成されている。 The non-product part 16 has a projection forming part 17 and a projection non-forming part 18. The protrusion forming portion 17 is a region having a protrusion 17A extending in the longitudinal direction of the film 12, and the protrusion non-forming portion 18 does not have such a protrusion 17A. The protrusion forming portion 17 is formed at an end of the non-product portion 16 on the product portion 15 side as a length region extremely shorter than the protrusion non-forming portion 18.
　フィルム１２の長手方向における突起形成部１７の長さＬ１７は３００ｍｍ以上５０００ｍｍ以下の範囲内である。突起１７Ａは、複数形成されている。なお、突起形成部１７は、図１に示すように、一端１２Ａに最も近い突起１７Ａの一端１２Ａ側から、他端１２Ｂに最も近い突起１７Ａの他端１２Ｂまでの領域とする。 突起 The length L17 of the projection forming portion 17 in the longitudinal direction of the film 12 is in the range of 300 mm or more and 5000 mm or less. A plurality of projections 17A are formed. In addition, as shown in FIG. 1, the protrusion forming portion 17 is a region from the one end 12A side of the protrusion 17A closest to the one end 12A to the other end 12B of the protrusion 17A closest to the other end 12B.
　突起１７Ａは、巻き芯１１側の第１フィルム面（内向き面）Ｓ１に形成されていてもよいし、巻き芯１１側とは反対側の第２フィルム面（外向き面）Ｓ２に形成されていてもよい。この例では、第１フィルム面Ｓ１に形成してあり、これにより、巻き芯１１の表面と一端１２Ａとの段差の跡、あるいは、巻き芯１１と一端１２Ａとを固定する粘着テープの跡（以下、これらをまとめて端縁跡と称する）などが、巻き回されたフィルム１２に付きにくく、また、付いたとしても、その長手方向における区間が短く抑えられる。 The projection 17A may be formed on the first film surface (inward surface) S1 on the winding core 11 side, or may be formed on the second film surface (outward surface) S2 on the opposite side to the winding core 11 side. May be. In this example, it is formed on the first film surface S1, and thereby, the mark of the step between the surface of the winding core 11 and the one end 12A or the mark of the adhesive tape for fixing the winding core 11 and the one end 12A (hereinafter, referred to as the following). , Etc.) are hardly attached to the wound film 12, and even if it is attached, the section in the longitudinal direction is kept short.
　フィルム１２は、製品部１５及び非製品部１６の両方が、基材２１と、基材２１よりも厚みが小さい膜２２とを備える。製品部１５の膜２２は、図２に示すように、膜面が基材２１と同様に平坦な、いわゆる平膜となっている。基材２１の材料は、特に限定されないが、巻き芯１１に巻き取れるに十分な可撓性を備えており、例えば熱可塑性樹脂（ポリマー）が挙げられる。熱可塑性樹脂としては、例えば、セルロースアシレート（例えばセルローストリアセテート、セルロースジアセテート、セルロースアセテートプロピオネートなど）、ポリエステル（例えば、ポリエチレンテレフタレート、ポリエチレン－２，６－ナフタレートなど）、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリカーボネート、ポリイミド、ポリアミドなどが挙げられる。この例の基材２１は単層構造であるが、基材２１は複層構造であってもよい。複層構造の基材としては、例えば、上記のような熱可塑性樹脂で形成されたフィルム材と、光照射での光異性化により配向した化合物を含有する光配向膜などとを備える基材が挙げられる。基材２１の厚みＴ２１は、特に限定されず、好ましくは５μｍ以上３００μｍ以下の範囲内であり、本例では４０μｍとしている。 In the film 12, both the product portion 15 and the non-product portion 16 include the base material 21 and the film 22 having a thickness smaller than the base material 21. As shown in FIG. 2, the film 22 of the product unit 15 is a so-called flat film whose film surface is flat like the substrate 21. The material of the base material 21 is not particularly limited, but has sufficient flexibility to be wound around the winding core 11, and includes, for example, a thermoplastic resin (polymer). Examples of the thermoplastic resin include cellulose acylate (eg, cellulose triacetate, cellulose diacetate, cellulose acetate propionate, etc.), polyester (eg, polyethylene terephthalate, polyethylene-2,6-naphthalate, etc.), polyvinyl chloride, polyvinyl chloride, and the like. Examples include vinylidene chloride, polycarbonate, polyimide, and polyamide. Although the substrate 21 in this example has a single-layer structure, the substrate 21 may have a multilayer structure. Examples of the base material having a multilayer structure include, for example, a base material including a film material formed of a thermoplastic resin as described above and a photo-alignment film containing a compound oriented by photo-isomerization by light irradiation. No. The thickness T21 of the substrate 21 is not particularly limited, and is preferably in a range of 5 μm or more and 300 μm or less, and is set to 40 μm in this example.
　膜２２は、基材２１の一方の基材面２１Ａに設けられている。例えば機能性材料を塗布することにより形成した機能膜が挙げられ、機能膜の例は磁性膜、感光膜、光学機能性膜などである。前述のように基材２１が光配向膜を備える複層構造である場合の光学機能性膜としては、例えば、液晶性化合物（液晶性ポリマー及び／または液晶性モノマー）を含有する液晶性膜が挙げられる。 The film 22 is provided on one substrate surface 21A of the substrate 21. For example, a functional film formed by applying a functional material is exemplified, and examples of the functional film include a magnetic film, a photosensitive film, and an optical functional film. As described above, as the optical functional film in the case where the substrate 21 has a multilayer structure including the photo-alignment film, for example, a liquid crystal film containing a liquid crystal compound (liquid crystal polymer and / or liquid crystal monomer) is used. No.
　製品部１５と同様に基材２１と膜２２とを有する突起非形成部１８（図１参照）は、膜２２の厚みＴ２２が製品部１５における厚みＴ２２と同じ厚みであることが好ましく、本例でもそのようにしている。なお、製品部１５における厚みＴ２２を１００としたときに、９８以上１０２以下の範囲内であれば、同じ厚みと見なす。 In the non-projection-formed portion 18 having the base material 21 and the film 22 (see FIG. 1) similarly to the product portion 15, the thickness T22 of the film 22 is preferably the same as the thickness T22 of the product portion 15. But it does so. When the thickness T22 of the product unit 15 is set to 100, if the thickness is within the range of 98 or more and 102 or less, the thickness is regarded as the same.
　突起形成部１７の膜２２には、前述の突起１７Ａが複数形成されている。したがって、突起形成部１７の膜２２は、突起１７Ａが有る部分と突起１７Ａが無い部分とで厚みＴ２２が異なる。図３に示すように、突起１７Ａは、膜２２の基材２１側とは反対側の膜面２２Ａを構成している。突起１７Ａは、長尺のフィルム１２（図１参照）の幅方向全域（全幅域）に複数形成されており、また、長手方向にも複数形成されている。複数の突起１７Ａの配置は、不規則であり、膜面２２Ａに分散した態様で形成されている。 複数 A plurality of the above-described protrusions 17A are formed on the film 22 of the protrusion formation portion 17. Therefore, the thickness T22 of the film 22 of the projection forming portion 17 is different between the portion having the projection 17A and the portion having no projection 17A. As shown in FIG. 3, the projection 17A forms a film surface 22A on the opposite side of the film 22 from the substrate 21 side. A plurality of projections 17A are formed in the entire area (entire width area) in the width direction of the long film 12 (see FIG. 1), and a plurality of projections 17A are also formed in the longitudinal direction. The arrangement of the plurality of projections 17A is irregular, and is formed in a manner dispersed on the film surface 22A.
　突起１７Ａは、図３（Ａ）に示すように、膜面２２Ａをその垂直方向から見たときの形状が楕円形状であり、楕円の長軸がフィルム１２の長手方向に、短軸が幅方向に沿っている。ただし、膜面２２Ａをその垂直方向から見たときの突起１７Ａの形状は、フィルム１２の長手方向に延びた形状であれば、特に限定されない。例えば、幅（フィルム１２の幅方向における長さ）が概ね一定である形状、幅がフィルム１２の長手方向における一方から他方に向かって漸増する形状、あるいは、幅が極めて小さい線形状であっても構わない。複数の突起１７Ａは、サイズが不均一である。突起１７Ａは、フィルム１２の長手方向における長さ（以下、突起長さと称する）ＬＰが５０ｍｍ以上１０００ｍｍ以下の範囲内であることが好ましく、フィルム１２の幅方向における長さ（以下、突起幅と称する）ＷＰが１ｍｍ以上５ｍｍ以下の範囲内であることが好ましく、突起１７Ａが非形成であるフィルム領域における膜面２２Ａからの突起１７Ａの高さ（以下、突起高さと称する）ＨＰが０．０５μｍ以上０．３μｍ以下の範囲内であることが好ましい。 As shown in FIG. 3A, the projection 17A has an elliptical shape when the film surface 22A is viewed from the vertical direction. The major axis of the ellipse is in the longitudinal direction of the film 12, and the minor axis is in the width direction. Along. However, the shape of the projection 17A when the film surface 22A is viewed from the vertical direction is not particularly limited as long as the shape extends in the longitudinal direction of the film 12. For example, even if the width (the length in the width direction of the film 12) is substantially constant, the width gradually increases from one side to the other in the longitudinal direction of the film 12, or the line width is extremely small. I do not care. The plurality of protrusions 17A are non-uniform in size. The length of the projection 17A in the longitudinal direction of the film 12 (hereinafter, referred to as a projection length) LP is preferably in a range of 50 mm or more and 1000 mm or less, and the length in the width direction of the film 12 (hereinafter, referred to as a projection width). ) The WP is preferably in the range of 1 mm or more and 5 mm or less, and the height HP of the projections 17A from the film surface 22A in the film region where the projections 17A are not formed (hereinafter, referred to as projection height) is 0.05 μm or more. It is preferable that it is within the range of 0.3 μm or less.
　図４に示すフィルム製造設備３０は、積層フィルム１２を製造し、フィルムロール１０を得る設備の一例である。フィルム製造設備３０は、送出部３１と塗布装置３２と硬化装置３３と巻取部３４とを、基材２１の移動方向Ｄｃにおける上流側から順に備える。基材２１を移動させる移動路には、ローラ３７が複数備えられている。複数のローラ３７の中には、回転機構（図示無し）を備え、この回転機構により周方向に回転する駆動ローラがあってもよい。 フ ィ ル ム The film manufacturing equipment 30 shown in FIG. 4 is an example of equipment for manufacturing the laminated film 12 and obtaining the film roll 10. The film manufacturing facility 30 includes a delivery unit 31, a coating device 32, a curing device 33, and a winding unit 34 in order from the upstream side in the moving direction Dc of the base 21. A plurality of rollers 37 are provided on a moving path for moving the base material 21. A rotation mechanism (not shown) may be provided among the plurality of rollers 37, and a driving roller rotated in the circumferential direction by the rotation mechanism may be provided.
　送出部３１は、基材２１をロール状に巻いた基材ロール３８がセットされる。送出部３１は、基材ロール３８から長尺の基材２１を連続的に送り出す。 The delivery unit 31 is set with a base material roll 38 obtained by winding the base material 21 in a roll shape. The sending unit 31 continuously sends out the long base material 21 from the base material roll 38.
　塗布装置３２は、基材２１の一方の表面に、膜２２（図２参照）になる塗膜４１を形成するためのものである。塗布装置３２は、基材２１を支持する支持ローラ４２と、塗布液４３を出すスロットダイ４４等から構成されている。支持ローラ４２は、回転軸４２ａを備え、この回転軸４２ａが回転機構（図示無し）により回転することにより、支持ローラ４２は周方向に回転する。これにより、支持ローラ４２に接している基材２１が、長手方向に移動する。本例では、基材２１の移動速度を２０ｍ／分としているが、移動速度はこれに限られない。 The coating device 32 is for forming a coating film 41 to be the film 22 (see FIG. 2) on one surface of the base material 21. The coating device 32 includes a support roller 42 that supports the base material 21, a slot die 44 that outputs a coating liquid 43, and the like. The support roller 42 includes a rotation shaft 42a, and the rotation of the rotation shaft 42a by a rotation mechanism (not shown) causes the support roller 42 to rotate in the circumferential direction. Thereby, the base material 21 in contact with the support roller 42 moves in the longitudinal direction. In this example, the moving speed of the substrate 21 is set to 20 m / min, but the moving speed is not limited to this.
　スロットダイ４４は、塗布液４３を出す出液口４５（図５参照）を支持ローラ４２に向けた姿勢で配される。移動中の基材２１に向けて出液口４５から連続的に塗布液４３が出されることにより、塗布液４３が基材２１の基材面２１Ａ（図２参照）に連続的に塗布され、塗膜４１が形成される。このように、フィルム１２は、塗布装置３２での塗布工程を経て製造される。なお、本例では、塗膜４１が１０μｍの厚みに形成される状態に塗布を行っているが、形成直後の塗膜４１の厚みはこの例に限られない。塗布装置３２の詳細は、別の図面を用いて後述する。 The slot die 44 is arranged in such a manner that a liquid outlet 45 (see FIG. 5) for discharging the coating liquid 43 faces the support roller 42. The application liquid 43 is continuously output from the liquid outlet 45 toward the moving substrate 21, whereby the application liquid 43 is continuously applied to the substrate surface 21 </ b> A (see FIG. 2) of the substrate 21. The coating film 41 is formed. As described above, the film 12 is manufactured through the coating process in the coating device 32. In this example, the coating is performed in a state where the coating film 41 is formed to have a thickness of 10 μm, but the thickness of the coating film 41 immediately after formation is not limited to this example. Details of the coating device 32 will be described later using another drawing.
　塗布液４３は、例えば前述の各種機能性材料を含有する液体が挙げられる。本例の塗布液４３は、粘度が３ｍＰａ・ｓであり、表面張力が２４ｍＮ／ｍであり、溶媒がメチルエチルケトン（ＭＥＫ）を主成分として含有しており、固形分（膜２２（図２参照）を生成する成分）の濃度が３２質量％である。主成分とは、溶媒の全質量を１００とするときに、少なくとも　　の質量を占める成分である。固形分の濃度（単位は質量％）は、固形分の質量をＭ１とし、溶媒の質量をＭ２とするときに、（Ｍ１／Ｍ２）×１００で求める百分率である。ただし、塗布液は本例に限られない。 The coating liquid 43 is, for example, a liquid containing the above-mentioned various functional materials. The coating liquid 43 of this example has a viscosity of 3 mPa · s, a surface tension of 24 mN / m, a solvent containing methyl ethyl ketone (MEK) as a main component, and a solid content (film 22 (see FIG. 2)). Is 32% by mass. The main component is a component that occupies at least of the mass when the total mass of the solvent is 100. The solid content concentration (unit is mass%) is a percentage obtained by (M1 / M2) × 100, where M1 is the mass of the solid content and M2 is the mass of the solvent. However, the application liquid is not limited to this example.
　硬化装置３３は、塗膜４１を所定の処理により硬化することにより膜２２を形成する。製品部１５及び非製品部１６の突起非形成部１８の膜２２は均一な厚みに、非製品部１６の突起形成部１７の膜２２は、突起１７Ａを有する状態に、それぞれ形成される。硬化装置３３としては、乾燥装置、あるいは光照射装置等が挙げられ、塗膜４１に含まれる機能性材料に応じて選択される。乾燥装置は、塗膜４１に乾燥した気体（例えば空気）を供給することにより塗膜４１を乾燥する。光照射装置は、塗膜４１に向けて光を射出し、塗膜４１に含まれる例えば光硬化性化合物を硬化させる。光硬化性化合物として、紫外線で硬化する紫外線硬化性化合物を用いる場合には、光照射装置には紫外線を射出する紫外線照射装置を用いるとよい。なお、これらの硬化装置を、複数組み合わせて配してもよい。 (4) The curing device 33 forms the film 22 by curing the coating film 41 by a predetermined process. The film 22 of the non-projection forming portion 18 of the product portion 15 and the non-product portion 16 is formed to have a uniform thickness, and the film 22 of the projection forming portion 17 of the non-product portion 16 is formed to have the projection 17A. Examples of the curing device 33 include a drying device and a light irradiation device, and are selected according to the functional material contained in the coating film 41. The drying device supplies the dried gas (for example, air) to the coating film 41 to dry the coating film 41. The light irradiation device emits light toward the coating film 41 to cure, for example, a photocurable compound contained in the coating film 41. When an ultraviolet curable compound that cures with ultraviolet light is used as the photocurable compound, an ultraviolet irradiation device that emits ultraviolet light may be used as the light irradiation device. Note that a plurality of these curing devices may be arranged in combination.
　巻取部３４は、ターレットアーム４６を有し、巻取り軸４７にセットされた巻き芯１１にフィルム１２を巻き取る。この例では、膜２２を巻き芯１１側に向けた（内向き）状態に、フィルム１２を巻き取っているが、膜２２を外周側に向けた（外向き）状態に、フィルム１２を巻き取ってもよい。巻取りにおける膜２２の向きは、巻取り軸４７の回転方向と、巻取り軸４７の回転の向きに対するフィルム２２の導入経路とによって、設定できる。ターレットアーム４６はアーム駆動部（図示無し）によって１８０度間欠回転し、巻き芯１１を巻取り位置ＰＳ１と、巻き芯交換位置ＰＳ２とに選択的に切り換える。なお、ターレットアーム４６の回転方向の中間位置には、ガイドアーム４８が設けられており、ガイドアーム４８の各先端部にはガイドローラ５１が取り付けられている。ガイドローラ５１は、ターレットアーム４６が回転している場合に、フィルム１２がターレットアーム４６とアーム取付軸５２とに接触することがない状態に、フィルム１２を支持する。 The winding unit 34 has a turret arm 46 and winds the film 12 around the winding core 11 set on the winding shaft 47. In this example, the film 12 is wound up with the film 22 facing the winding core 11 (inward), but the film 12 is wound up with the film 22 facing outward (outward). You may. The direction of the film 22 in winding can be set by the rotation direction of the winding shaft 47 and the introduction path of the film 22 with respect to the rotation direction of the winding shaft 47. The turret arm 46 is intermittently rotated by 180 degrees by an arm driving unit (not shown), and selectively switches the winding core 11 between the winding position PS1 and the core replacing position PS2. A guide arm 48 is provided at an intermediate position in the rotation direction of the turret arm 46, and a guide roller 51 is attached to each end of the guide arm 48. The guide roller 51 supports the film 12 in a state where the film 12 does not contact the turret arm 46 and the arm mounting shaft 52 when the turret arm 46 is rotating.
　巻取り軸４７はターレットアーム４６の各先端部に設けられており、巻取り軸４７に巻き芯１１がセットされる。巻取り位置ＰＳ１では、ローラ３０から送られてくるフィルム１２を巻き芯１１に巻き取る。また、巻き芯交換位置ＰＳ２では、一定長さのフィルム１２を巻き取り、満巻きとなったフィルムロール１０を巻き芯１１と一緒に巻取り軸４７から取り外し、この巻取り軸４７には新たな空の巻き芯１１がセットされ、巻き芯１１の交換が行われる。 The winding shaft 47 is provided at each end of the turret arm 46, and the winding core 11 is set on the winding shaft 47. At the winding position PS1, the film 12 sent from the roller 30 is wound around the winding core 11. Further, at the core exchange position PS2, the film 12 having a fixed length is wound, and the film roll 10 which has been fully wound is removed from the winding shaft 47 together with the core 11, and a new winding shaft 47 is attached to the winding shaft 47. An empty core 11 is set, and the core 11 is replaced.
　巻取り位置ＰＳ１において、一端１２Ａ（図１参照）側からフィルム１２が巻き芯１１に巻き取られ、フィルムロール１０が所定の長さの満巻きに近い状態になった場合には、ターレットアーム４６が１８０度回転し、巻き芯交換位置ＰＳ２に満巻きに近いフィルムロール１０を位置させる。また、巻取り位置ＰＳ１には空の巻き芯１１が位置決めされる。フィルムロール１０が所定の長さとなった場合には、巻替え装置（図示無し）が作動し、フィルム１２が切断される。切断された先行のフィルム１２は、後端を前述の他端１２Ｂ（図１参照）として、巻き芯交換位置ＰＳ２にてフィルムロール１０に巻き取られる。また、切断された後行のフィルム１２は、先端を前述の一端１２Ａ（図１参照）として、巻取り位置ＰＳ１にて空の巻き芯１１に巻き取られる。 At the winding position PS1, when the film 12 is wound on the winding core 11 from one end 12A (see FIG. 1) side and the film roll 10 is almost fully wound with a predetermined length, the turret arm 46 is set. Is rotated by 180 degrees, and the film roll 10 close to full winding is positioned at the core exchange position PS2. An empty winding core 11 is positioned at the winding position PS1. When the film roll 10 has a predetermined length, a rewinding device (not shown) is operated, and the film 12 is cut. The cut preceding film 12 is wound on the film roll 10 at the core exchange position PS2 with the rear end as the above-mentioned other end 12B (see FIG. 1). The cut film 12 is wound around the empty winding core 11 at the winding position PS1 with the leading end 12A as described above (see FIG. 1).
　以下、同じように、巻き芯１１にフィルム１２が巻き取られることにより、連続して送られてくるフィルム１２がフィルムロール１０の形態としてロール製品となる。 Hereinafter, similarly, by continuously winding the film 12 around the winding core 11, the continuously fed film 12 becomes a roll product in the form of the film roll 10.
　塗布装置３２は、図５に示すように、さらに、供給部６０と、架台６１と、移動台６２と、ステージ６３と、シフト機構６６と、減圧チャンバ６７と、吸引部６８と、回収部７１と、コントローラ７２とを備える。供給部６０は、塗布液４３（図４参照）を設定された流量でスロットダイ４４へ供給する。 As shown in FIG. 5, the coating device 32 further includes a supply unit 60, a gantry 61, a moving table 62, a stage 63, a shift mechanism 66, a decompression chamber 67, a suction unit 68, and a collection unit 71. And a controller 72. The supply unit 60 supplies the coating liquid 43 (see FIG. 4) to the slot die 44 at a set flow rate.
　架台６１は、スロットダイ４４を支持するためのものである。この例では、出液口４５を上向きにし、支持ローラ４２の回転中心よりも低い位置にスロットダイ４４を配しており、出液口４５を上向きにした姿勢にスロットダイ４４が保持されている。ただし、スロットダイ４４はこの配置に限られず、例えば支持ローラ４２の上または下などでもよい。また、出液口４５は支持ローラ４２に向いていればよく、本例のような上向きに限られない。 The gantry 61 is for supporting the slot die 44. In this example, the outlet port 45 is directed upward, and the slot die 44 is disposed at a position lower than the rotation center of the support roller 42, and the slot die 44 is held in a position in which the outlet port 45 is directed upward. . However, the slot die 44 is not limited to this arrangement, and may be, for example, above or below the support roller 42. Further, the liquid outlet 45 only needs to face the support roller 42, and is not limited to the upward as in this example.
　架台６１は移動台６２に固定されており、移動台６２はステージ６３上で移動自在に設けられ、シフト機構６６を備える。ステージ６３には図５における横方向に延びたレール（図示無し）が設けられている。移動台６２は、シフト機構６６により、レールに沿ってスライド移動する。これにより、架台６１は移動台６２と一体に移動し、この移動により、架台６１上のスロットダイ４４が支持ローラ４２との距離を増減する方向で移動する。 The gantry 61 is fixed to the moving table 62, and the moving table 62 is movably provided on the stage 63 and includes a shift mechanism 66. The stage 63 is provided with a rail (not shown) extending in the lateral direction in FIG. The moving table 62 is slid along the rail by the shift mechanism 66. As a result, the gantry 61 moves integrally with the movable gantry 62, and this movement causes the slot die 44 on the gantry 61 to move in a direction to increase or decrease the distance from the support roller 42.
　スロットダイ４４から出た塗布液４３により、スロットダイ３３と基材２１との間には塗布ビード（以下、単にビードと称する）７６が形成される。移動方向Ｄｃにおけるビード７６の上流側の外気との境界を上流側メニスカスＭＵ（図８参照）、下流側の外気との境界を下流側メニスカスＭＤ（図８参照）と称する。減圧チャンバ６７は、ビード７６の形態の調整を行うためのものであり、ビード７６の形態の調整には、ビード７６自体の形状の調整と、上流側メニスカスＭＵの位置の調整とを含む。減圧チャンバ６７は、スロットダイ４４及び支持ローラ４２の移動方向Ｄｃにおける上流側に設けられ、本例では、スロットダイ４４及び支持ローラ４２の下に設けてある。 (4) A coating bead (hereinafter, simply referred to as a bead) 76 is formed between the slot die 33 and the substrate 21 by the coating liquid 43 that has come out of the slot die 44. The boundary between the bead 76 and the outside air on the upstream side in the moving direction Dc is called an upstream meniscus MU (see FIG. 8), and the boundary with the outside air on the downstream side is called a downstream meniscus MD (see FIG. 8). The decompression chamber 67 is for adjusting the shape of the bead 76, and adjusting the shape of the bead 76 includes adjusting the shape of the bead 76 itself and adjusting the position of the upstream meniscus MU. The decompression chamber 67 is provided on the upstream side in the movement direction Dc of the slot die 44 and the support roller 42, and is provided below the slot die 44 and the support roller 42 in this example.
　減圧チャンバ６７は支持ローラ４２に対面する開口６７ｏが設けられている。減圧チャンバ６７は、その仕切られた空間（以下、減圧空間という）の圧力が、吸引部６８によって低くされる。フロントプレート６７ａと、バックプレート６７ｂと、一対のサイドプレート６７ｃと、ベースプレート６７ｄとは、減圧空間を外部空間と仕切るためのものである。フロントプレート６７ａと、バックプレート６７ｂと、一対のサイドプレート６７ｃとは、移動中の基材２１に対して起立した姿勢で設けられ、ベースプレート６７ｄが移動台６２に載せられる。各サイドプレート６７ｃは、支持ローラ４２の周面にほぼ沿って概ね円弧状（湾曲した形状）に切り欠かれおり、それぞれ支持ローラ４２よりも外側にならない状態に、すなわちサイドプレート６７ｃのエッジが支持ローラ４２の周面に対向する位置に配してある。これにより、サイドプレート６７ｃは基材２１の幅方向の両端で減圧空間を仕切る。 The decompression chamber 67 is provided with an opening 67o facing the support roller. In the decompression chamber 67, the pressure in the partitioned space (hereinafter, referred to as a decompression space) is reduced by the suction unit 68. The front plate 67a, the back plate 67b, the pair of side plates 67c, and the base plate 67d partition the decompressed space from the external space. The front plate 67a, the back plate 67b, and the pair of side plates 67c are provided in an upright posture with respect to the moving base material 21, and the base plate 67d is placed on the movable base 62. Each of the side plates 67c is cut out in a substantially arc shape (curved shape) substantially along the peripheral surface of the support roller 42, and is not outside the support roller 42, that is, the edge of the side plate 67c is supported. It is arranged at a position facing the peripheral surface of the roller 42. Thereby, the side plate 67c partitions the reduced pressure space at both ends in the width direction of the base 21.
　フロントプレート６７ａは移動方向Ｄｃにおける下流側で、また、バックプレート６７ｂは上流側で、それぞれ減圧空間を仕切っており、基材２１の幅方向に延びている。これらフロントプレート６７ａ、バックプレート６７ｂ、及びサイドプレート６７ｃは、基材２１との接触を防ぐために、基材２１の厚みＴ２１を考慮した上で支持ローラ４２の周面と間隔があけられている。また、バックプレート６７ｂには、基材２１の幅方向に延びた調整板６７ｅが設けられており、基材２１との距離を増減する方向で移動可能となっている。調整板６７ｅは、この移動により基材２１との隙間を調整し、減圧空間の圧力をより精緻に調節している。 The front plate 67a partitions the decompression space on the downstream side in the movement direction Dc, and the back plate 67b partitions on the upstream side in the movement direction Dc, and extends in the width direction of the base material 21. The front plate 67a, the back plate 67b, and the side plate 67c are spaced from the peripheral surface of the support roller 42 in consideration of the thickness T21 of the substrate 21 in order to prevent contact with the substrate 21. The back plate 67b is provided with an adjusting plate 67e extending in the width direction of the base member 21, and is movable in a direction to increase or decrease the distance from the base member 21. The adjustment plate 67e adjusts the gap with the base material 21 by this movement, and more precisely adjusts the pressure in the reduced pressure space.
　吸引部６８は減圧チャンバ６７に接続し、空気を吸引することにより、減圧空間を減圧する。これにより、ビード７６の形状が調整されたり、上流側メニスカスＭＵ（図８参照）のスロットダイ４４上での位置が調整される。 The suction unit 68 is connected to the decompression chamber 67, and depressurizes the decompression space by sucking air. Thereby, the shape of the bead 76 is adjusted, and the position of the upstream meniscus MU (see FIG. 8) on the slot die 44 is adjusted.
　減圧チャンバ６７の内部には、ベースプレート６７ｄに起立した姿勢で、仕切り板６７ｆが設けられている。この仕切り板６７ｆは、フロントプレート６７ａとの間に、スロットダイ４４から出た塗布液４３を受ける（溜める）液溜め部６７ｓを形成している。一対のサイドプレート６７ｃの下部には、排出口６７ｖが開閉自在に設けられており、この排出口６７ｖには、塗布液４３を回収する回収部７１が接続している。液溜め部６７ｓに塗布液４３を受ける場合（例えば後述の出液開始工程）及び減圧空間を減圧する場合には、排出口６７ｖが閉状態とされ、液溜め部６７ｓの液を排出する場合及び減圧空間の減圧を解除する場合には、排出口６７ｖは開状態とされる。 A partition plate 67f is provided inside the decompression chamber 67 so as to stand on the base plate 67d. The partition plate 67f forms a liquid reservoir 67s for receiving (reserving) the coating liquid 43 from the slot die 44 between the partition plate 67f and the front plate 67a. A discharge port 67v is provided at the lower part of the pair of side plates 67c so as to be openable and closable, and a recovery section 71 for recovering the coating liquid 43 is connected to the discharge port 67v. When the coating liquid 43 is received in the liquid reservoir 67s (for example, a liquid discharge start step described later) and when the pressure in the decompression space is reduced, the discharge port 67v is closed, and the liquid in the liquid reservoir 67s is discharged. To release the reduced pressure in the reduced pressure space, the outlet 67v is opened.
　コントローラ７２は、供給部６０、シフト機構６６、吸引部６８、排出口６７ｖの開閉及び回収部７１などを統括的に制御する。例えば、供給部６０を制御し、塗布液４３のスロットダイ４４への供給量を調整する。供給量の調整には、塗布液４３の開始及び停止（流量をゼロとする）を含む。また、シフト機構６６を制御し、所定のタイミングでスロットダイ４４を図５における横方向に移動させ、これによりスロットダイ４４と基材２１との距離を増減させる。また、コントローラ７２は、吸引部６８を制御し、減圧空間の圧力を調整し、回収部７１を制御し、回収部７１を介して排出口６７ｖの開閉を行う。 The controller 72 controls the supply unit 60, the shift mechanism 66, the suction unit 68, the opening / closing of the discharge port 67v, the collection unit 71, and the like. For example, the supply unit 60 is controlled to adjust the supply amount of the coating liquid 43 to the slot die 44. The adjustment of the supply amount includes the start and stop of the application liquid 43 (the flow rate is set to zero). Further, the shift mechanism 66 is controlled to move the slot die 44 in the horizontal direction in FIG. 5 at a predetermined timing, thereby increasing or decreasing the distance between the slot die 44 and the base 21. In addition, the controller 72 controls the suction unit 68, adjusts the pressure in the decompression space, controls the collection unit 71, and opens and closes the discharge port 67v via the collection unit 71.
　カメラ７３は、後述の予備塗布工程において先端リップ８２の露呈状態を観察するためのものである。カメラ７３は、先端リップ８２を撮像できる状態に、支持ローラ４２の内部に配されている。撮像した画像を観察するための例えば表示装置（図示無し）は、支持ローラ４２の外部に設けてあり、この表示装置にカメラ７３は電気的に接続されている。カメラ７３は先端リップ８２を観察するためのものであるから、支持ローラ４２は、断面円形の外周面を構成する外周部材４２ｂが透明な素材で形成されており、本例ではガラスで形成されている。これにより、カメラ７３は、外周部材４２ｂを介して先端リップ８２の表面を撮像する。 The camera 73 is for observing the exposed state of the tip lip 82 in the pre-coating step described later. The camera 73 is arranged inside the support roller 42 so that the tip lip 82 can be imaged. For example, a display device (not shown) for observing the captured image is provided outside the support roller 42, and the camera 73 is electrically connected to the display device. Since the camera 73 is for observing the tip lip 82, the support roller 42 is formed of a transparent material in the outer peripheral member 42b constituting the outer peripheral surface having a circular cross section, and is formed of glass in this example. I have. Thereby, the camera 73 captures an image of the surface of the tip lip 82 via the outer peripheral member 42b.
　スロットダイ４４は、移動方向Ｄｃにおける上流側のブロック（以下、上流側ブロックと称する）７７と、下流側のブロック（以下、下流側ブロックと称する）７８とを備える。上流側ブロック７７と下流側ブロック７８とは、互いの間に、塗布液４３が流れる流路としてのスロット８１を形成している。スロット８１の一端は、基材２１の幅方向に延びたスリット状の開口を出液口４５としてスロットダイ４４に形成している。なお、本例のスロットダイ４４は、幅方向（図５の紙面奥行方向であり、基材２１の幅方向に一致する）の外寸が１２０ｍｍであるが、スロットダイはこの例にこの例に限られない。 The slot die 44 includes an upstream block (hereinafter, referred to as an upstream block) 77 and a downstream block (hereinafter, referred to as a downstream block) 78 in the movement direction Dc. The upstream block 77 and the downstream block 78 form a slot 81 therebetween as a flow path through which the coating liquid 43 flows. One end of the slot 81 is formed in the slot die 44 with a slit-shaped opening extending in the width direction of the substrate 21 as the liquid outlet 45. Note that the slot die 44 of this example has an outer dimension of 120 mm in the width direction (the depth direction in the drawing of FIG. 5 and coincides with the width direction of the base material 21). Not limited.
　上流側ブロック７７と下流側ブロック７８とは金属（例えばステンレス）製とされているが、これら上流側ブロック７７と下流側ブロック７８との先端リップ８２には表面処理を施すことが好ましい。表層８２ａは、後述の予備塗布工程において先端リップ８２を確実に露呈させるためのものであり、厚みは極めて薄くてよい。図５では表層８２ａの厚みを大きく誇張して描いてあるが、本例での厚みは概ね１００ｎｍである。表層８２ａは、表層８２ａとなる素材、または、その素材を溶剤に溶解もしくは分散媒に分散した液を、スプレーで塗布し、加熱処理を行うことによって形成している。なお、以下の説明において、上流側ブロック７７の先端リップには８２Ｕを、下流側ブロック７８の先端リップには符号８２Ｄをそれぞれ付し、両者を区別しない場合には、先端リップ８２と記載する。本例でも先端リップ８２に上記の表面処理を施しており、表層８２ａが形成されている。 Although the upstream block 77 and the downstream block 78 are made of metal (for example, stainless steel), it is preferable to apply a surface treatment to the tip lip 82 between the upstream block 77 and the downstream block 78. The surface layer 82a is for surely exposing the tip lip 82 in a pre-coating step described later, and may be extremely thin. Although the thickness of the surface layer 82a is greatly exaggerated in FIG. 5, the thickness in this example is approximately 100 nm. The surface layer 82a is formed by applying a material to be the surface layer 82a or a liquid in which the material is dissolved in a solvent or dispersed in a dispersion medium by spraying and heat-treated. In the following description, the tip lip of the upstream block 77 will be denoted by 82U, and the tip lip of the downstream block 78 will be denoted by reference numeral 82D. Also in this example, the above-described surface treatment is performed on the tip lip 82, and the surface layer 82a is formed.
　表層８２ａはフッ素を含有するポリマーで形成されており、フッ素を含有するポリマーとしてはダイキン工業株式会社製のオプツール（登録商標）ＤＳＸを用いている。ただし、表層８２ａの素材はこの例に限定されず、例えば、ＡＧＣ株式会社製のＳＵＲＥＣＯ（登録商標）ＡＦシリーズ、荒川化学工業株式会社製のビームセット（登録商標）１４００シリーズ、信越化学工業株式会社製のＳＨＩＮ－ＥＴＳＵ　ＳＵＢＥＬＹＮ（登録商標）ＫＹ－１００シリーズなどでもよい。また、表面処理の手法は、この例に限定されず、例えば、蒸着、ディップコート、スピンコートなどでもよい。 The surface layer 82a is formed of a polymer containing fluorine, and Optool (registered trademark) DSX manufactured by Daikin Industries, Ltd. is used as the polymer containing fluorine. However, the material of the surface layer 82a is not limited to this example. For example, SURECO (registered trademark) AF series manufactured by AGC Co., Ltd., beam set (registered trademark) 1400 series manufactured by Arakawa Chemical Industry Co., Ltd., Shin-Etsu Chemical Co., Ltd. SHIN-ETSU @ SUBELYN (registered trademark) KY-100 series. The method of the surface treatment is not limited to this example, and may be, for example, vapor deposition, dip coating, spin coating, or the like.
　なお、先端リップ８２は、着脱自在な別部材で構成してもよい。その一例としては、金属製の上流側ブロック本体（図示無し）と下流側ブロック本体（図示無し）とを一体に組み合わせたダイ本体に、先端リップ８２を構成する先端リップ部材（図示無し）を嵌合させたスロットダイが挙げられる。先端リップ部材には、上記の表面処理を施すことが好ましい。 The tip lip 82 may be formed of a detachable member. As an example, a tip lip member (not shown) constituting the tip lip 82 is fitted to a die body in which a metal upstream block body (not shown) and a downstream block body (not shown) are integrally combined. Slot die combined. It is preferable to apply the above-mentioned surface treatment to the tip lip member.
　表層８２ａを有する先端リップ８２は、塗布液４３に対する接触角ヒステリシスθＨが大きくても３０°に、すなわち３０°以内であることが好ましい。なお、以下の説明において接触角ヒステリシスθＨは、用いる塗布液に対する接触角ヒステリシスである。接触角ヒステリシスθＨは、２５°以内であることがより好ましく、２０°以内であることがさらに好ましく、１０°以内であることが特に好ましい。 先端 The tip lip 82 having the surface layer 82a preferably has a contact angle hysteresis θH with respect to the coating liquid 43 of at most 30 °, that is, within 30 °. In the following description, the contact angle hysteresis θH is the contact angle hysteresis for the used coating solution. The contact angle hysteresis θH is more preferably within 25 °, further preferably within 20 °, and particularly preferably within 10 °.
　接触角ヒステリシスθＨは、周知の通り、固体Ｓ表面に付着した液滴Ｄの前進接触角θ１から後退接触角θ２を減じた差である（図６参照）。固体Ｓの表面の濡れ性は、接触角θＣで論じられることが多い。しかし、接触角θＣを基準にしても予備塗布工程で先端リップ８２を確実に露呈させることができない場合がある。なお、接触角θＣは、固体Ｓの表面に静止した状態の液滴Ｄの自由表面と固体Ｓの表面とのなす角であり、なす角は液滴Ｄ側の角度である（図７参照）。本例では先端リップ８２が固体Ｓに対応し、液滴Ｄは塗布液４３の液滴４３ｄである。 The contact angle hysteresis θH is, as is well known, a difference obtained by subtracting the receding contact angle θ2 from the advancing contact angle θ1 of the droplet D attached to the surface of the solid S (see FIG. 6). The wettability of the surface of the solid S is often discussed by the contact angle θC. However, there is a case where the tip lip 82 cannot be reliably exposed in the pre-coating step based on the contact angle θC. The contact angle θC is an angle formed between the free surface of the droplet D that is stationary on the surface of the solid S and the surface of the solid S, and the angle formed is the angle on the droplet D side (see FIG. 7). . In this example, the tip lip 82 corresponds to the solid S, and the droplet D is the droplet 43 d of the coating liquid 43.
　先端リップ８２は、接触角ヒステリシスθＨが前述の１５．６°である場合の前進接触角θ１は６９．３°、後退接触角θ２は５３．７°である。この先端リップ８２の塗布液４３に対する接触角θＣは、５９．１°となっている。これに対し、接触角ヒステリシスθＨが前述の４３．２°である先端リップは、前進接触角θ１が７１．３°、後退接触角θ２が２８．１°であり、接触角θＣが６５．３°である。また、接触角ヒステリシスθＨが前述の７０°の先端リップは、前進接触角θ１が８１．３°、後退接触角θ２が１１．１°であり、接触角θＣが１０．６°である。 The leading lip 82 has a forward contact angle θ1 of 69.3 ° and a receding contact angle θ2 of 53.7 ° when the contact angle hysteresis θH is 15.6 ° described above. The contact angle θC of the tip lip 82 with the coating liquid 43 is 59.1 °. In contrast, the tip lip having the contact angle hysteresis θH of 43.2 ° described above has a forward contact angle θ1 of 71.3 °, a receding contact angle θ2 of 28.1 °, and a contact angle θC of 65.3. °. The tip lip having the contact angle hysteresis θH of 70 ° described above has a forward contact angle θ1 of 81.3 °, a receding contact angle θ2 of 11.1 °, and a contact angle θC of 10.6 °.
　接触角ヒステリシスθＨは、前進接触角θ１と後退接触角θ２とを求め、θ１－θ２の算出式で算出することができる。前進接触角θ１と後退接触角θ２とは、滑落法により求めることができる。滑落法は、まず、基板面を水平にした基板の上に、液を滴下する。そして、液滴が載っている状態で基板を徐々に傾けていき、液滴が動き始めたときの液滴と基板面とのなす角を求める。液滴の進行方向側のなす角を前進接触角θ１、進行方向と反対側のなす角を後退接触角θ２とする。滑落法を用いた前進接触角θ１と後退接触角θ２とは、市販の滑落接触角計で求めることができる。市販の滑落接触角計としては、例えば協和界面科学（株）のＤｒｏｐＭａｓｔｅｒ　ＳＡシリーズがある。なお、前進接触角θ１と後退接触角θ２とを求める場合には、先端リップ８２に塗布液４３の液滴４３ｄを付着させることにより求めてもよいし、先端リップ８２と同じ素材のサンプルを作製し、このサンプルに液滴４３ｄを付着させることにより求めてもよく、本例ではサンプルを用いて求めている。接触角θＣは、液滴法により求めることができ、市販の測定機器（例えば前述のＤｒｏｐＭａｓｔｅｒ　ＳＡシリーズ）を用いてもよい。本例でも液適法により求めており、協和界面科学（株）のＤｒｏｐＭａｓｔｅｒ　ＳＡシリーズを用いている。 The contact angle hysteresis θH can be calculated by calculating the forward contact angle θ1 and the receding contact angle θ2, and calculating the equation θ1−θ2. The advancing contact angle θ1 and the receding contact angle θ2 can be obtained by a sliding down method. In the sliding down method, first, a liquid is dropped on a substrate having a horizontal substrate surface. Then, the substrate is gradually tilted while the droplet is placed thereon, and the angle between the droplet and the substrate surface when the droplet starts to move is obtained. The angle formed by the droplet in the traveling direction is referred to as an advancing contact angle θ1, and the angle formed in the direction opposite to the traveling direction is defined as a receding contact angle θ2. The forward contact angle θ1 and the receding contact angle θ2 using the sliding down method can be obtained with a commercially available sliding down angle meter. As a commercially available sliding contact angle meter, there is, for example, DropMaster SA series of Kyowa Interface Science Co., Ltd. When the forward contact angle θ1 and the receding contact angle θ2 are obtained, the forward contact angle θ1 and the receding contact angle θ2 may be obtained by attaching the droplet 43d of the coating liquid 43 to the tip lip 82, or a sample made of the same material as the tip lip 82 However, the measurement may be performed by attaching the droplet 43d to the sample, and in this example, the measurement is performed using the sample. The contact angle θC can be determined by a droplet method, and a commercially available measuring instrument (for example, the above-mentioned DropMaster SA series) may be used. Also in this example, the value is determined by the liquid appropriate method, and DropMaster SA series of Kyowa Interface Science Co., Ltd. is used.
　この例のスロットダイ４４は、図８に示すように、下流側ブロック７８の先端リップ８２Ｄの方が上流側ブロック７７の先端リップ８２Ｕよりも基材２１との距離が小さい状態に、上流側ブロック７７と下流側ブロック７８とを一体に組み合わせてある。しかし、上流側ブロック７７と下流側ブロック７８との組み合わせ方の態様は、この例に限定されない。例えば、先端リップ８２Ｄの距離ｄ１（単位はμｍ）は、先端リップ８２Ｕと基材２１との距離ｄ２（単位はμｍ）と同じ状態に、上流側ブロック７７と下流側ブロック７８とを組み合わせてもよい。また、距離ｄ１よりも距離ｄ２が小さい状態に、上流側ブロック７７と下流側ブロック７８とを組み合わせてもよい。 As shown in FIG. 8, the slot die 44 of this example is configured such that the distal end lip 82D of the downstream side block 78 has a smaller distance from the base material 21 than the distal end lip 82U of the upstream side block 77. 77 and the downstream block 78 are integrally combined. However, the manner of combining the upstream block 77 and the downstream block 78 is not limited to this example. For example, the distance d1 (unit: μm) of the tip lip 82D is the same as the distance d2 (unit: μm) between the tip lip 82U and the base material 21 and the upstream block 77 and the downstream block 78 are combined. Good. Further, the upstream block 77 and the downstream block 78 may be combined so that the distance d2 is smaller than the distance d1.
　本例では、距離ｄ１は１００μｍとしている。先端リップ８２Ｕと先端リップ８２Ｄとの一方が他方よりも基材２１及び支持ローラ４２側へ突出している突出量ＱＥは、０μｍより大きく３００μｍ以下の範囲内であることが好ましく、本例では１５０μｍとしている。 距離 In this example, the distance d1 is 100 μm. The protrusion amount QE of one of the tip lip 82U and the tip lip 82D projecting toward the substrate 21 and the support roller 42 more than the other is preferably within a range of more than 0 μm and 300 μm or less, and in this example, 150 μm. I have.
　この例では、先端リップ８２Ｕと先端リップ８２Ｄとは、図８に示すように、移動方向Ｄｃに概ね沿った平坦面を有している。先端リップ８２の平坦面部分の移動方向Ｄｃにおける長さ（以下、リップ長さと称する）ＬＬは、先端リップ８２Ｕについては１ｍｍとしており、先端リップ８２Ｄについてはこれによりも極めて短くしている。ただし、リップ長さＬＬは、この例に限られず、例えば先端リップ８２Ｕと先端リップ８２Ｄとのリップ長さＬＬは互いに同じであってもよい。なお、先端リップ８２Ｄのリップ長さＬＬは、後述の式（１）及び（１Ａ）において、Ｌ１で表している。 In this example, the tip lip 82U and the tip lip 82D have flat surfaces substantially along the movement direction Dc, as shown in FIG. The length LL of the flat surface portion of the tip lip 82 in the movement direction Dc (hereinafter, referred to as lip length) is 1 mm for the tip lip 82U and extremely short for the tip lip 82D. However, the lip length LL is not limited to this example. For example, the lip lengths LL of the tip lip 82U and the tip lip 82D may be the same. Incidentally, the lip length LL of the end lip 82D is in the formula below (1) and (1A), is represented by L 1.
　ここで、ビード７６よりも下流側外部の任意の位置（図８中の符号ＰＡ）の圧力をＰ０（単位はＰａ）とし、ビード７６の下流側メニスカスＭＤに極めて近い任意の位置（図８中の符号ＰＢ）の圧力をＰ１（単位はＰａ）とし、ビード７６のうち、スロットから延長された任意の位置（図８中の符号ＰＣ）の圧力をＰ２（単位はＰａ）とし、ビード７６の上流側メニスカスＭＵに極めて近い任意の位置（図８中の符号ＰＤ）の圧力をＰ３（単位はＰａ）とし、ビード７６よりも上流側外部の任意の位置（図８中の符号ＰＥ）の圧力をＰ４（単位はＰａ）とする。本例では、圧力Ｐ０は大気圧であり、圧力Ｐ４は減圧チャンバ６７によって調整している。なお、上記圧力Ｐ０～Ｐ４は、いずれも大気圧を０Ｐａとした場合のいわゆるゲージ圧である。 Here, the pressure at an arbitrary position (symbol PA in FIG. 8) on the downstream side of the bead 76 is set to P0 (unit: Pa), and an arbitrary position very close to the downstream meniscus MD of the bead 76 (FIG. Of the bead 76 is denoted by P1 (unit: Pa), the pressure at an arbitrary position (reference numeral PC in FIG. 8) of the bead 76 extended from the slot is denoted by P2 (unit: Pa), and The pressure at an arbitrary position (symbol PD in FIG. 8) very close to the upstream meniscus MU is P3 (unit: Pa), and the pressure at an arbitrary position (symbol PE in FIG. 8) outside the bead 76 on the upstream side. Is P4 (the unit is Pa). In this example, the pressure P0 is the atmospheric pressure, and the pressure P4 is adjusted by the decompression chamber 67. Each of the pressures P0 to P4 is a so-called gauge pressure when the atmospheric pressure is set to 0 Pa.
　ビード７６における塗布液４３の流れは、周知の通りクエット流れとポアズイユ流れとが合成された流れである。クエット流れは基材２１の移動と塗布液４３の粘性とに依存する流れであり、ポアズイユ流れは、圧力Ｐ１と圧力Ｐ２との差、及び／または、圧力Ｐ２と圧力Ｐ３との差に依存する流れである。 The flow of the coating liquid 43 in the bead 76 is a flow obtained by combining the Couette flow and the Poiseuille flow, as is well known. The Couette flow is a flow that depends on the movement of the substrate 21 and the viscosity of the coating liquid 43, and the Poiseuille flow depends on the difference between the pressures P1 and P2 and / or the difference between the pressures P2 and P3. It is a flow.
　先端リップ８２Ｕにおける上流側メニスカスＭＵの長さ（以下、上流側ビード長と称する）Ｌ（単位はｍ）は、以下の式（１）で求められる。
　Ｌ＝（ｄ１２／６μＵ）・［－Ｐ４－１．３４（μＵ／σ）２／３・（σ／ｈ）－（６μＵＬ１／ｄ１３）・（ｄ１－２ｈ）＋｛σ（cosθＣｓ＋cosθＣｄ）｝／ｄ２］・・・（１） The length L (unit is m) of the upstream meniscus MU (hereinafter, referred to as upstream bead length) at the tip lip 82U is obtained by the following equation (1).
L = (d1 2 / 6μU) · [-P4-1.34 (μU / σ) 2/3 · (σ / h) - (6μUL 1 / d1 3) · (d1-2h) + {σ (cosθC s + CosθC d )｝ / d2] (1)
　式（１）は、下記の式（１Ａ）と式（１Ｂ）とから得ている。
　Ｐ０－Ｐ４＝１．３４（μＵ／σ）２／３・（σ／ｈ）＋（６μＵＬ１／ｄ１３）・（ｄ１－２ｈ）＋（６μＵＬ／ｄ２２）＋σ／Ｒ　　　・・・（１Ａ）
　Ｒ＝－｛ｄ２／（cosθＣｓ＋cosθＣｄ）｝　　　・・・（１Ｂ） Equation (1) is obtained from the following equations (1A) and (1B).
P0−P4 = 1.34 (μU / σ) 2/3 · (σ / h) + (6μUL 1 / d1 3 ) · (d1-2h) + (6 μUL / d2 2 ) + σ / R (1A) )
R = - {d2 / (cosθC s + cosθC d)} ··· (1B)
　式（１），（１Ａ），（１Ｂ）において、μ，Ｕなどは、それぞれ下記を意味する。
　μ（単位はＰａ・ｓ）；塗布液４３の粘度
　Ｕ（単位はｍ／ｓ）；基材２１の移動速度
　σ（単位はＮ／ｍ）；表面張力
　ｈ（単位はｍ）；塗膜４１の厚み
　θＣｓ（単位は°）；先端リップ８２Ｕと上流側メニスカスＭＵとのなす角であり、なす角はビード７６の内部側の角度である
　θＣｄ（単位は°）；基材２１と上流側メニスカスＭＵとのなす角であり、なす角はビード７６の内部側の角度である
　Ｒ（単位はｍ）；メニスカスの曲率半径 In the formulas (1), (1A) and (1B), μ, U, etc. mean the following, respectively.
μ (unit: Pa · s); viscosity U of coating liquid 43 (unit: m / s); moving speed of substrate 21 σ (unit: N / m); surface tension h (unit: m); coating film 41 thickness .theta.C s (unit °) of; is an angle formed between the tip lip 82U and the upstream meniscus MU, angle formed .theta.C d (unit is °) is an angle of the inner side of the bead 76; base material 21 and the upstream The angle formed with the side meniscus MU is an angle formed on the inner side of the bead 76. R (unit is m); radius of curvature of the meniscus
　塗布液４３の塗布方法について、図９を参照しながら説明する。まず、基材２１を移動させる。スロットダイ４４を、所定の塗布位置よりも基材２１から離れた退避位置に配した状態で、供給部６０（図５参照）からスロットダイ４４へ塗布液４３の供給を開始し、塗布液４３をスロット８１から出し始める（出液開始工程）。供給する流量は、突起非形成部１８（図１参照）の膜２２を所定の厚みＴ２２に形成する流量とする。スロットから出た塗布液４３は、図９（Ａ）に示すように、先端リップ８２Ｕを伝って流れ落ちる。これにより先端リップ８２Ｕは、塗布液４３に濡れた状態になる。 (4) A method for applying the coating liquid 43 will be described with reference to FIG. First, the substrate 21 is moved. In a state where the slot die 44 is disposed at a retreat position farther from the base material 21 than a predetermined coating position, the supply of the coating liquid 43 from the supply unit 60 (see FIG. 5) to the slot die 44 is started. From the slot 81 (a liquid discharge start step). The supplied flow rate is a flow rate at which the film 22 of the protrusion non-formed portion 18 (see FIG. 1) is formed to a predetermined thickness T22. As shown in FIG. 9A, the coating liquid 43 that has exited the slot flows down along the tip lip 82U. As a result, the tip lip 82U becomes wet with the coating liquid 43.
　次に、シフト機構６６によりスロットダイ４４を移動させ、スロットダイ４４と基材２１との距離を狭める。この例では、距離ｄ１が距離ｄ２よりも小さいから、スロットダイ４４と基材２１との距離とは距離ｄ１である。距離ｄ１を減少させることにより、図９の（Ｂ）に示すように、スロット８１から出ている塗布液４３を基材２１に接触させ（着液工程）、これにより先端リップ８２と基材２１との間にはビード７６が形成される。着液工程では、本例では予め設定した所定の塗布位置にスロットダイ４４を移動させているが、塗布位置よりも基材２１に近い位置に移動させても構わない。 Next, the slot die 44 is moved by the shift mechanism 66 to reduce the distance between the slot die 44 and the substrate 21. In this example, since the distance d1 is smaller than the distance d2, the distance between the slot die 44 and the base 21 is the distance d1. By reducing the distance d1, as shown in FIG. 9B, the coating liquid 43 coming out of the slot 81 is brought into contact with the substrate 21 (liquid contacting step). A bead 76 is formed between. In the liquid landing step, in this example, the slot die 44 is moved to a predetermined application position set in advance. However, the slot die 44 may be moved to a position closer to the substrate 21 than the application position.
　減圧チャンバ６７の内部の基体を吸引部６８により吸引し、減圧チャンバ６７の内部の圧力を負圧にすることによって、前述の圧力Ｐ４を、後述の本塗布工程において設定される圧力Ｐ４と同じ圧力にする。なお、本例では本塗布工程において減圧チャンバ６７により、概ね３００Ｐａの減圧度（吸引圧力）で吸引している。「同じ圧力」とは厳密に圧力Ｐ４と同じでなくてもよく、１０Ｐａ以内の差であれば同じとみなしてよい。 The substrate inside the decompression chamber 67 is suctioned by the suction unit 68 and the pressure inside the decompression chamber 67 is set to a negative pressure, so that the above-described pressure P4 is the same pressure as the pressure P4 set in the main coating process described later. To In this example, suction is performed at a reduced pressure (suction pressure) of approximately 300 Pa by the reduced pressure chamber 67 in the main coating process. The “same pressure” does not have to be exactly the same as the pressure P4 and may be regarded as the same if the difference is within 10 Pa.
　ビード７６が形成した後、塗布液４３を基材２１に塗布し続け、塗布している状態で、先端リップ８２Ｕを露呈させる（予備塗布工程）。先端リップ８２Ｕは、その全域が外気に露呈している必要はなく、先端リップ８２Ｕのうち移動方向Ｄｃにおける上流側の一部領域（上流側端縁からの一部領域）が、基材２１の幅方向全域において露呈していればよい。より好ましくは、製品部１５の膜２２を所定の厚みＴ２２に形成する間の上流側メニスカスＭＵの先端リップ８２Ｕにおける位置を予め求めておき、その位置またはその位置よりも下流側の位置に上流側メニスカスＭＵが位置する状態に、先端リップ８２Ｕのうちの移動方向Ｄｃにおける上流側の一部領域が、基材２１の幅方向に渡って露呈していればよい。接触角ヒステリシスが、２０°以内に抑えられているから、予備塗布工程において先端リップ８２Ｕが確実に露呈する。 After the bead 76 is formed, the coating liquid 43 is continuously applied to the base material 21, and the tip lip 82 </ b> U is exposed while the application liquid 43 is being applied (preliminary application step). The entire area of the tip lip 82U does not need to be exposed to the outside air, and a part of the tip lip 82U on the upstream side in the movement direction Dc (a part of the area from the upstream edge) is formed of the base material 21. What is necessary is that it is exposed in the entire area in the width direction. More preferably, the position of the upstream meniscus MU at the tip lip 82U during the formation of the film 22 of the product portion 15 to the predetermined thickness T22 is determined in advance, and the position of the upstream meniscus MU on the upstream side is shifted to the position downstream of the position. In the state where the meniscus MU is located, a part of the tip lip 82U on the upstream side in the movement direction Dc may be exposed in the width direction of the base 21. Since the contact angle hysteresis is suppressed within 20 °, the tip lip 82U is reliably exposed in the preliminary coating step.
　従来の手法では、露呈していると考えられていた上流側ブロックの先端リップに、極めて薄くではあるが塗布液４３が膜状に残っていた。塗布を継続している間に、このように膜状に残っていた塗布液にビードから塗布液が滲む。そして、この膜状物から溶媒が蒸発することにより表面張力が上昇し、膜状物に例えばゲル状物等の塗布液の塊が形成されてしまっていることがわかった。これに対し、上記の本例によると、先端リップ８２Ｕを露呈させるから、上記の塊は先端リップ８２Ｕに形成されず、その結果、塗膜に筋状の溝を形成することがない。そのため、塗布をより長く継続することができ、その結果、フィルム１２はより長尺なものとして得られる。 (4) In the conventional method, the coating liquid 43, although extremely thin, remained in the form of a film on the tip lip of the upstream block, which was considered to be exposed. While the coating is continued, the coating liquid oozes from the bead into the coating liquid remaining in a film form in this way. Then, it was found that the solvent evaporates from the film-like material, the surface tension increases, and a lump of a coating liquid such as a gel-like material is formed on the film-like material. On the other hand, according to the present embodiment, since the tip lip 82U is exposed, the lump is not formed on the tip lip 82U, and as a result, a streak-like groove is not formed in the coating film. Therefore, the application can be continued for a longer time, and as a result, the film 12 can be obtained as a longer one.
　予備塗布工程は、先端リップ８２Ｕの露呈を待つ露呈待機工程であってもよい。接触角ヒステリシスθＨが１０°以内であれば、液滴４３ｄが先端リップ８２Ｕに一旦生じても迅速に落下し、液滴４３ｄが残存することない。先端リップ８２Ｕの接触角ヒステリシスθＨが１０°より大きく２０°以内の場合には、露呈を待った後には、図９の（Ｂ）に示すように、液滴４３ｄが残存した状態に先端リップ８２Ｕは露呈する。このように、図９の（Ｂ）に示すように、露呈した領域に、液滴４３ｄが残ってもよい。 The preliminary application step may be an exposure waiting step of waiting for the tip lip 82U to be exposed. If the contact angle hysteresis θH is within 10 °, even if the droplet 43d once occurs on the tip lip 82U, the droplet 43d falls quickly, and the droplet 43d does not remain. When the contact angle hysteresis θH of the tip lip 82U is larger than 10 ° and within 20 °, after waiting for the exposure, as shown in FIG. 9B, the tip lip 82U remains in a state where the droplet 43d remains. Exposed. In this way, as shown in FIG. 9B, the droplet 43d may remain in the exposed region.
　例えば、接触角ヒステリシスθＨが１０°よりも大きく３０°以内である１５．６°の場合には、予備塗布工程において先端リップ８２は、塗布液４３が液滴４３ｄとして残った状態にはなるものの、液滴４３ｄが付着している箇所以外は露呈していることが、カメラ７３を用いた観察により確認されている。また、接触角ヒステリシスθＨが１０°以内である７．２°の場合には、液滴４３ｄの残存もなく、先端リップ８２は全領域が外気に露呈した状態になることが確認されている。これに対し、接触角ヒステリシスθＨが３０°よりも大きい場合（例えば４３．２°、及び７０°の場合）の先端リップは、極めて薄くではあるが全領域が塗布液４３に濡れた状態を保持してしまい、３００分の観察時間において外気に露呈した状態にはならないことが確認されている。 For example, when the contact angle hysteresis θH is 15.6 °, which is larger than 10 ° and equal to or less than 30 °, in the pre-coating step, the tip lip 82 is in a state where the coating liquid 43 remains as a droplet 43d. It has been confirmed by observation using the camera 73 that the portion other than the portion where the droplet 43d is attached is exposed. When the contact angle hysteresis θH is 7.2 ° which is within 10 °, it has been confirmed that the droplet 43d does not remain and the entire area of the tip lip 82 is exposed to the outside air. On the other hand, when the contact angle hysteresis θH is larger than 30 ° (for example, at 43.2 ° and 70 °), the tip lip is extremely thin but keeps the entire area wet with the coating liquid 43. Therefore, it has been confirmed that the state of exposure to the outside air does not occur in the observation time of 300 minutes.
　液滴４３ｄが残存した状態に先端リップ８２Ｕが露呈した場合には、予備塗布工程は、液滴４３ｄを落下させる液滴落下工程を有することが好ましい。液滴４３ｄを落下させる手法としては、例えば、先端リップ８２Ｕに振動を与える手法、先端リップ８２Ｕに風を吹き付ける手法などがある。 (4) When the tip lip 82U is exposed in a state where the droplet 43d remains, the pre-coating step preferably includes a droplet dropping step of dropping the droplet 43d. Examples of a method of dropping the droplet 43d include a method of applying vibration to the tip lip 82U and a method of blowing wind to the tip lip 82U.
　予備塗布工程は、第１メニスカス移動工程と、第２メニスカス移動工程とを有していてもよく、特に、液滴４３ｄが先端リップ８２Ｕに残存している場合には、第１メニスカス移動工程と、第２メニスカス移動工程とを有していることが好ましい。第１メニスカス移動工程は、図９の（Ｃ）に示すように、上流側メニスカスＭＵを移動方向Ｄｃにおける上流側へ移動させることにより、液滴４３ｄをビード７６に一体化させる。第２メニスカス移動工程は、第１メニスカス移動工程の後に、図９の（ｄ）に示すように、上流側メニスカスＭＵを第１のメニスカス移動工程の前の位置に移動させる。より具体的には第１のメニスカス移動工程開始時の位置に戻す。この第１メニスカス移動工程と、第２メニスカス移動工程とにより、上流側メニスカスＭＵよりも上流側の先端リップ８２Ｕは、液滴４３ｄが残存することない状態に、より確実に露呈する。 The pre-coating step may include a first meniscus moving step and a second meniscus moving step. In particular, when the droplet 43d remains on the tip lip 82U, the first meniscus moving step is performed. And a second meniscus moving step. In the first meniscus moving step, as shown in FIG. 9C, the droplet 43d is integrated with the bead 76 by moving the upstream meniscus MU to the upstream side in the moving direction Dc. In the second meniscus moving step, after the first meniscus moving step, as shown in FIG. 9D, the upstream meniscus MU is moved to a position before the first meniscus moving step. More specifically, it returns to the position at the start of the first meniscus moving step. By the first meniscus moving step and the second meniscus moving step, the tip lip 82U on the upstream side of the upstream meniscus MU is more reliably exposed to a state in which the droplet 43d does not remain.
　上流側メニスカスＭＵの移動は、移動方向Ｄｃにおけるビード７６よりも上流側の減圧度を変更すること、スロットダイ４４と基材２１との距離を増減させること、スロットダイ４４から出る塗布液４３の流量を変更することの少なくともいずれかで行うことが好ましい。移動方向Ｄｃにおけるビード７６よりも上流側の減圧度を変更することにより、圧力Ｐ４が変わるから、上流側メニスカスＭＵが移動する。例えば、上流側メニスカスＭＵを上流側へ移動させる場合には、圧力Ｐ４をより小さくするために、減圧チャンバ６７での吸引力を強め、減圧度を大きくする。また、上流側メニスカスＭＵを下流側へ移動させる場合には、圧力Ｐ４をより大きくすればよいから、減圧チャンバ６７での吸引力を弱めればよい。 The movement of the upstream meniscus MU includes changing the degree of pressure reduction on the upstream side of the bead 76 in the movement direction Dc, increasing or decreasing the distance between the slot die 44 and the base material 21, and changing the coating liquid 43 flowing out of the slot die 44. It is preferable to change the flow rate. By changing the degree of pressure reduction on the upstream side of the bead 76 in the moving direction Dc, the pressure P4 changes, so that the upstream meniscus MU moves. For example, when moving the upstream meniscus MU to the upstream side, in order to reduce the pressure P4, the suction force in the pressure reducing chamber 67 is increased, and the degree of pressure reduction is increased. Further, when the meniscus MU on the upstream side is moved to the downstream side, the suction force in the decompression chamber 67 may be reduced because the pressure P4 may be increased.
　また、上流側メニスカスＭＵを上流側へ移動させる場合には、式（１）からわかるように、スロットダイ４４と基材２１との距離ｄ１を大きくしてもよいし、スロットダイ４４から出る塗布液４３の流量を増加させてもよい。これに対し、上流側メニスカスＭＵを下流側へ移動させる場合には、スロットダイ４４と基材２１との距離ｄ１を小さくしてもよいし、スロットダイ４４から出る塗布液４３の流量を減少させてもよい。 When the upstream meniscus MU is moved to the upstream side, the distance d1 between the slot die 44 and the base material 21 may be increased, as shown in Expression (1), or the coating coming out of the slot die 44. The flow rate of the liquid 43 may be increased. On the other hand, when moving the upstream meniscus MU to the downstream side, the distance d1 between the slot die 44 and the base material 21 may be reduced, or the flow rate of the coating liquid 43 exiting the slot die 44 may be reduced. You may.
　予備塗布工程は、着液工程における塗布液４３の基材２１への接触開始から１０秒以内に終了させることが好ましい。これにより、形成される塗膜４１のうち、基材２１の長手方向における先端に近い、かつ、ごく限られた一部区間に、液滴４３ｄが密集した状態に形成される。その結果、複数の突起１７Ａは、フィルム１２（図１参照）の長手方向における一端１２Ａに近い、かつ、ごく限られた一部区間に形成されるから、前述の端縁跡の抑制に効果を奏する。 (4) The pre-coating step is preferably completed within 10 seconds from the start of the contact of the coating liquid 43 with the base material 21 in the liquid contacting step. As a result, the droplets 43d are formed in a dense state in a part of the coating film 41 to be formed which is close to the front end of the base material 21 in the longitudinal direction and is very limited. As a result, the plurality of protrusions 17A are formed in a very limited partial section near one end 12A in the longitudinal direction of the film 12 (see FIG. 1). Play.
　以上の予備塗布工程で形成された塗膜４１からは非製品部１６の膜２２が生成する。具体的には、図９の（Ｂ）に示す着液工程開始から、上記の第１メニスカス移動工程における液滴４３ｄの合一化前までの間に形成した塗膜４１からは、突起非形成部１８（図１参照）の膜２２が生成する。また、第１メニスカス移動工程における液滴４３ｄの一体化の始まりから終わりまでの間に形成した塗膜４１からは突起形成部１７（図１，図３参照）の膜２２が生成する。ビード７６に一体化された球冠状の液滴４３ｄが、突起１７Ａ（図１，図３参照）を形成する。 膜 The film 22 of the non-product part 16 is generated from the coating film 41 formed in the above preliminary coating step. Specifically, no protrusions are formed from the coating film 41 formed from the start of the liquid landing step shown in FIG. 9B to before the unification of the droplets 43d in the first meniscus moving step. The film 22 of the part 18 (see FIG. 1) is generated. In addition, the film 22 of the projection forming portion 17 (see FIGS. 1 and 3) is generated from the coating film 41 formed from the beginning to the end of the integration of the droplets 43d in the first meniscus moving step. The spherical droplet 43d integrated with the bead 76 forms the projection 17A (see FIGS. 1 and 3).
　予備塗布工程の後に塗布を継続し、製品部１５（図１，図２）となるフィルム１２の膜２２を形成する（本塗布工程）。 (4) The coating is continued after the pre-coating step to form the film 22 of the film 12 to be the product section 15 (FIGS. 1 and 2) (main coating step).
　図１に示すフィルムロール１０においては、フィルム１２の一端１２Ａ側の一定の長さ領域に、前述の端縁跡がつく場合がある。この端縁跡がある部分は、使用を奨励しないのが通常であり、廃棄領域となる。この点、フィルムロール１０は、突起１７Ａが存在する非製品部を端縁跡がついてしまう領域として有効利用している。これにより、原材料を含めたトータルの廃棄量が抑えられる。 に お い て In the film roll 10 shown in FIG. 1, the above-mentioned edge trace may be formed in a certain length region on one end 12A side of the film 12. The area with this edge mark is not usually encouraged to use and is a waste area. In this regard, the film roll 10 effectively uses the non-product portion where the projections 17A exist as a region where an edge mark is left. As a result, the total amount of waste including raw materials is reduced.
　１０　　フィルムロール
　１１　　巻き芯
　１２　　フィルム
　１２Ａ　一端
　１２Ｂ　他端
　１５　　製品部
　１６　　非製品部
　１７　　突起形成部
　１７Ａ　突起
　１８　　突起非形成部
　２１　　基材
　２１Ａ　　基材面
　２２　　膜
　２２Ａ　膜面
　３０　　フィルム製造設備
　３１　　送出部
　３２　　塗布装置
　３３　　硬化装置
　３４　　巻取部
　３７　　ローラ
　３８　　基材ロール
　４１　　塗膜
　４２　　支持ローラ
　４２ａ　回転軸
　４２ｂ　外周部材
　４３　　塗布液
　４３ｄ　液滴
　４４　　スロットダイ
　４５　　出液口
　４６　　ターレットアーム
　４７　　巻取り軸
　４８　　ガイドアーム
　５１　　ガイドローラ
　５２　　アーム取付軸
　６０　　供給部
　６１　　架台
　６２　　移動台
　６３　　ステージ
　６６　　シフト機構
　６７　　減圧チャンバ
　６７ａ　フロントプレート
　６７ｂ　バックプレート
　６７ｃ　サイドプレート
　６７ｄ　ベースプレート
　６７ｅ　調整板
　６７ｆ　仕切り板
　６７ｏ　開口
　６７ｓ　液溜め部
　６７ｖ　排出口
　６８　　吸引部
　７１　　回収部
　７２　　コントローラ
　７３　　カメラ
　７６　　ビード
　７７　　上流側ブロック
　７８　　下流側ブロック
　８１　　スロット
　８２，８２Ｄ，８２Ｕ　　先端リップ
　８２ａ　　表層
　Ｄ　　　液滴
　ｄ１，ｄ２　距離
　ｈ，Ｔ２１，Ｔ２２　厚み
　ＱＥ　　突出量
　ＬＬ　　リップ長さ
　Ｓ　　　固体
　Ｓ１　　第１フィルム面
　Ｓ２　　第２フィルム面
　Ｌ１５，Ｌ１６　長さ
　ＭＤ　　下流側メニスカス
　ＭＵ　　上流側メニスカス
　ＬＰ　　突起長さ
　ＴＰ　　突起高さ
　ＷＰ　　突起幅
　θＣ，θＣｄ，θＣｓ　接触角 DESCRIPTION OF SYMBOLS 10 Film roll 11 Core 12 Film 12A One end 12B Other end 15 Product part 16 Non-product part 17 Projection forming part 17A Projection 18 No projection part 21 Base material 21A Base material surface 22 Film 22A Film surface 30 Film manufacturing equipment 31 Sending part 32 Coating device 33 Curing device 34 Winding unit 37 Roller 38 Base roll 41 Coating film 42 Support roller 42a Rotating shaft 42b Outer peripheral member 43 Coating liquid 43d Droplet 44 Slot die 45 Liquid outlet 46 Turret arm 47 Winding shaft 48 Guide Arm 51 Guide roller 52 Arm mounting shaft 60 Supply unit 61 Mount 62 Moving table 63 Stage 66 Shift mechanism 67 Decompression chamber 67a Front plate 67b Back plate 67c Side plate 67d Base plate 67e Adjustment plate 7f Partition plate 67o Opening 67s Liquid reservoir 67v Discharge port 68 Suction unit 71 Recovery unit 72 Controller 73 Camera 76 Bead 77 Upstream block 78 Downstream block 81 Slot 82, 82D, 82U Tip lip 82a Surface D droplet d1, d2 distance h, T21, T22 Thickness QE Projection amount LL Lip length S Solid S1 First film surface S2 Second film surface L15, L16 Length MD Downstream meniscus MU Upstream meniscus LP Projection length TP Projection height WP Projection width θC , ΘCd, θCs Contact angle

Claims (7)

  1. 　移動する長尺の基材に、前記基材の移動方向における上流側のブロックと下流側のブロックとの間のスロットから塗布液を出すスロットダイにより前記塗布液を連続的に塗布することにより、積層フィルムを製造するフィルム製造方法において、
    　前記スロットダイの前記スロットから前記塗布液を出し始める出液開始工程と、
    　移動中の基材と出液中の前記スロットダイとの距離を狭めることにより、前記スロットダイから出ている前記塗布液を前記基材に接触させる着液工程と、
    　前記塗布液を前記基材に塗布している状態で、前記着液工程により前記塗布液で濡れていた前記上流側ブロックの先端リップを露呈させる予備塗布工程と、
    　前記予備塗布工程の後に塗布を継続し、製品部となる前記積層フィルムの塗膜を形成する本塗布工程と、
    　を有するフィルム製造方法。     On the long substrate to be moved, by continuously applying the coating liquid by a slot die that outputs the coating liquid from a slot between the upstream block and the downstream block in the moving direction of the substrate, In a film manufacturing method for manufacturing a laminated film,
    A liquid discharge start step of starting to discharge the coating liquid from the slot of the slot die,
    A liquid contacting step of bringing the coating liquid coming out of the slot die into contact with the base material by narrowing a distance between the moving substrate and the slot die during liquid discharge,
    In a state where the application liquid is applied to the base material, a preliminary application step of exposing a tip lip of the upstream block wetted with the application liquid in the liquid application step,
    Main application step of continuing application after the preliminary application step, and forming a coating film of the laminated film to be a product part,
    A film production method having:
  2. 　前記予備塗布工程は、
    　前記先端リップに前記塗布液が液滴として残存している状態に前記先端リップが露呈した場合には、前記液滴を落下させる液滴落下工程を有する請求項１に記載のフィルム製造方法。     The preliminary coating step,
    The film manufacturing method according to claim 1, further comprising a droplet dropping step of dropping the droplet when the tip lip is exposed while the coating liquid remains as a droplet on the tip lip.
  3. 　前記予備塗布工程は、
    　前記スロットダイと前記基材との間の塗布ビードの上流側メニスカスを、前記基材の移動方向における上流側に移動させることにより、前記液滴を前記塗布ビードに一体化させる第１メニスカス移動工程と、
    　前記第１メニスカス移動工程の後に、前記上流側メニスカスを前記第１メニスカス移動工程前の位置に移動させる第２メニスカス移動工程と
    　を有する請求項１または２に記載のフィルム製造方法。     The preliminary coating step,
    A first meniscus moving step of moving the upstream meniscus of the application bead between the slot die and the substrate to an upstream side in the moving direction of the substrate to integrate the droplet into the application bead; When,
    The film manufacturing method according to claim 1, further comprising: a second meniscus moving step of moving the upstream meniscus to a position before the first meniscus moving step after the first meniscus moving step.
  4. 　前記上流側メニスカスの移動は、
    　前記塗布ビードの前記基材の移動方向における上流側の減圧度を変更することと、前記スロットダイと前記基材との距離を増減させることと、前記スロットダイからの前記塗布液の流量を変更することとのいずれかにより、前記上流側メニスカスを移動させる請求項３に記載のフィルム製造方法。     The movement of the upstream meniscus is
    Changing the degree of pressure reduction on the upstream side in the moving direction of the base material of the coating bead, increasing or decreasing the distance between the slot die and the base material, and changing the flow rate of the coating liquid from the slot die 4. The method according to claim 3, wherein the upstream meniscus is moved.
  5. 　前記予備塗布工程を、前記着液工程における前記塗布液の前記基材への接触開始から１０秒以内に終了させる請求項１ないし４のいずれか１項に記載のフィルム製造方法。 The method according to any one of claims 1 to 4, wherein the preliminary application step is completed within 10 seconds from the start of contact of the coating liquid with the base material in the liquid applying step.
  6. 　前記積層フィルムを巻き芯に巻き取る巻取工程をさらに有し、
    　前記巻き芯には、前記予備塗布工程を経た前記積層フィルムを巻き取った後に、前記本塗布工程を経た前記積層フィルムを巻き取る請求項１ないし５のいずれか１項に記載のフィルム製造方法。     Further comprising a winding step of winding the laminated film around a winding core,
    The film manufacturing method according to any one of claims 1 to 5, wherein, after winding the laminated film having undergone the preliminary application step, the laminated film having undergone the main application step is wound around the core.
  7. 　巻き芯と、
    　基材と前記基材に形成された膜を備え、長尺に形成され、長手方向における一端側から前記巻き芯に巻かれている積層フィルムと、
    　を備え、
    　前記積層フィルムは、前記積層フィルムの長手方向に延びた突起が前記膜に形成されているフィルム部を、前記一端側に有するフィルムロール。     Core and
    A laminated film comprising a substrate and a film formed on the substrate, formed to be long, and wound around the core from one end side in the longitudinal direction,
    With
    A film roll, wherein the laminated film has a film portion on one end side of the laminated film in which a protrusion extending in a longitudinal direction of the laminated film is formed on the film.
PCT/JP2019/027778 2018-09-27 2019-07-12 Film manufacturing method and film roll WO2020066229A1 (en)

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