WO2020042743A1 - 曝光机的光源更换系统以及曝光机 - Google Patents

曝光机的光源更换系统以及曝光机 Download PDF

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Publication number
WO2020042743A1
WO2020042743A1 PCT/CN2019/093703 CN2019093703W WO2020042743A1 WO 2020042743 A1 WO2020042743 A1 WO 2020042743A1 CN 2019093703 W CN2019093703 W CN 2019093703W WO 2020042743 A1 WO2020042743 A1 WO 2020042743A1
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WIPO (PCT)
Prior art keywords
chamber
light source
guide rail
replacement
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2019/093703
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English (en)
French (fr)
Inventor
吴利峰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
Original Assignee
Wuhan China Star Optoelectronics Technology Co Ltd
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Application filed by Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Wuhan China Star Optoelectronics Technology Co Ltd
Publication of WO2020042743A1 publication Critical patent/WO2020042743A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

Definitions

  • the present application relates to the field of display technology, and in particular, to a light source replacement system for an exposure machine and an exposure machine.
  • the exposure lamp when the exposure lamp is approaching its service life, it will affect the characteristics of the product. At this time, a new exposure lamp needs to be replaced in advance, but the replacement of the exposure lamp requires shutdown and cooling, and the replacement procedures are relatively cumbersome. It directly affects the quality of exposure and causes uneven exposure on the glass substrate. This causes various macro and micro defects on the glass substrate and affects the yield of the entire glass substrate.
  • the traditional way of exposing the exposure lamp of the exposure equipment also involves the use of the exposure lamp from the start of lighting to the stabilization of the illuminance. Therefore, it is necessary to wait for the new lamp to stabilize before using it. The entire process wastes a lot of time and reduces production efficiency.
  • This application mainly solves the technical problems, how to improve the production efficiency.
  • the present application provides a light source replacement system for an exposure machine, including:
  • a chamber including a working chamber, a testing chamber, and a replacement chamber disposed adjacent to each other, the working chamber being provided with a first light source and the replacement chamber being provided with a second light source;
  • a guide rail provided in the cavity; wherein,
  • the first light source can be moved into the replacement chamber along the guide rail, and the second light source can be moved into the test chamber along the guide rail.
  • the guide rail moves into the working chamber
  • the shapes and sizes of the first light source and the second light source are consistent;
  • a reflector is also provided in the working chamber, and a receiver is provided outside the working chamber; wherein the reflector is used to reflect light emitted by the first light source to the receiver.
  • the working chamber and the test chamber are arranged side by side, and the replacement chamber is provided on the working chamber and the test chamber.
  • the guide rail is a circular guide rail.
  • a first moving plate, a second moving plate, and a third moving plate are further provided in the chamber; wherein the first moving plate is provided in the working chamber.
  • the second moving plate is disposed between the test chamber and the replacement chamber, and the third moving plate is disposed between the working chamber and the test chamber Between rooms.
  • the first moving plate includes a first moving portion and a first fixing portion
  • the second moving plate includes a second moving portion and a second fixing portion
  • the The third moving plate includes a third moving portion and a third fixing portion; wherein the first fixing portion is provided with a first via hole, the second fixing portion is provided with a second via hole, and the third fixing portion A third via is provided, and the guide rail is disposed along the first via, the second via, and the third via.
  • the first light source includes a first sliding portion and a first light emitting portion provided on a side of the first sliding portion
  • the second light source includes a second sliding portion. Part and a second light emitting part provided on one side of the second sliding part;
  • the first sliding part and the second sliding part are both disposed on the guide rail, so that the first light source can be moved into the replacement chamber along the guide rail, and the second light source can be moved along the The guide rail moves into the test chamber, and after the second light source passes the test, it moves along the guide rail into the working chamber.
  • test unit is further disposed in the test chamber
  • the test unit is configured to test a second light source moved into the test chamber, so that a parameter of the second light source in the test chamber reaches a preset parameter.
  • the present application provides a light source replacement system for an exposure machine, including:
  • a chamber including a working chamber, a testing chamber, and a replacement chamber disposed adjacent to each other, the working chamber being provided with a first light source and the replacement chamber being provided with a second light source;
  • a guide rail provided in the cavity; wherein,
  • the first light source can be moved into the replacement chamber along the guide rail, and the second light source can be moved into the test chamber along the guide rail.
  • the guide rail moves into the working chamber.
  • the working chamber and the test chamber are arranged side by side, and the replacement chamber is provided on the working chamber and the test chamber.
  • the guide rail is a circular guide rail.
  • a first moving plate, a second moving plate, and a third moving plate are further provided in the chamber; wherein the first moving plate is provided in the working chamber.
  • the second moving plate is disposed between the test chamber and the replacement chamber, and the third moving plate is disposed between the working chamber and the test chamber Between rooms.
  • the first moving plate includes a first moving portion and a first fixing portion
  • the second moving plate includes a second moving portion and a second fixing portion
  • the The third moving plate includes a third moving portion and a third fixing portion; wherein the first fixing portion is provided with a first via hole, the second fixing portion is provided with a second via hole, and the third fixing portion A third via is provided, and the guide rail is disposed along the first via, the second via, and the third via.
  • the first light source includes a first sliding portion and a first light emitting portion provided on a side of the first sliding portion
  • the second light source includes a second sliding portion. Part and a second light emitting part provided on one side of the second sliding part;
  • the first sliding part and the second sliding part are both disposed on the guide rail, so that the first light source can be moved into the replacement chamber along the guide rail, and the second light source can be moved along the The guide rail moves into the test chamber, and after the second light source passes the test, it moves along the guide rail into the working chamber.
  • a reflector is provided inside the working chamber, and a receiver is provided outside the working chamber; wherein the reflector is used to connect the first light source. The emitted light is reflected on the receiver.
  • test unit is further disposed in the test chamber
  • the test unit is configured to test a second light source moved into the test chamber, so that a parameter of the second light source in the test chamber reaches a preset parameter.
  • the shapes and sizes of the first light source and the second light source are the same.
  • the present application provides an exposure machine including a light source replacement system
  • the light source update system includes:
  • a chamber including a working chamber, a testing chamber, and a replacement chamber disposed adjacent to each other, the working chamber being provided with a first light source and the replacement chamber being provided with a second light source;
  • a guide rail provided in the cavity; wherein,
  • the first light source can be moved into the replacement chamber along the guide rail, and the second light source can be moved into the test chamber along the guide rail.
  • the guide moves into the working chamber.
  • the working chamber and the testing chamber are arranged side by side, and the replacement chamber is provided on the working chamber and the testing chamber.
  • the guide rail is a circular guide rail.
  • a first moving plate, a second moving plate, and a third moving plate are further provided in the chamber; the first moving plate is provided in the working chamber and the replacement chamber. Between the chambers, the second moving plate is disposed between the test chamber and the replacement chamber, and the third moving plate is disposed between the working chamber and the test chamber.
  • the beneficial effect of the present application is that by setting a guide rail in the chamber, there is no need to stop and cool down when changing the exposure lamp, thereby improving production efficiency.
  • FIG. 1 is a schematic structural diagram of a first implementation manner of a light source replacement system according to an embodiment of the present application.
  • FIG. 2 is a schematic structural diagram of a second implementation manner of a light source replacement system according to an embodiment of the present application.
  • FIG. 3 is a schematic structural diagram of a third implementation manner of a light source replacement system according to an embodiment of the present application.
  • FIG. 4 is a schematic structural diagram of a fourth implementation manner of a light source replacement system according to an embodiment of the present application.
  • FIG. 1 is a schematic structural diagram of a first implementation manner of a light source replacement system according to an embodiment of the present application.
  • This light source replacement system is used to replace the exposure lamp in the exposure machine.
  • This application provides a light source replacement system for an exposure machine, including:
  • Chamber 100 which includes a working chamber 101, a testing chamber 102, and a replacement chamber 103 adjacent to each other.
  • a first light source 201 is provided in the working chamber 101, and a second light source 202 is provided in the replacement chamber 103. as well as
  • the guide rail 301 is provided in the chamber 100;
  • the first light source 201 can be moved into the replacement chamber 103 along the guide rail 301, and the second light source 202 can be moved into the test chamber 102 along the guide rail 301. After the second light source 202 passes the test, it can be moved to work along the guide rail 301 Inside the chamber 101.
  • the first light source 201 and the second light source 202 may both be mercury lamps, and the shapes and sizes of the first light source 201 and the second light source 202 are the same.
  • the first light source 201 can enter the replacement chamber 103 through the guide rail 301, and at the same time, the second light source 202 in the replacement chamber 103 passes through the guide rail. 301 enters the test chamber 102 for testing.
  • the test of the second light source 202 is completed, that is, after the illuminance of the second light source 202 reaches a preset illuminance, the second light source 202 moves into the working chamber 101 through the guide rail 301, and the second light source 202 is completed to the first light source 201. replace.
  • the process of replacing the first light source 101 in the working chamber 101 does not require manual intervention, so the production efficiency can be improved. Moreover, during the replacement process, the working chamber 101, the test chamber 102, and the replacement chamber 103 form a closed space together, so the probability of the second light source 202 being contaminated is also reduced, thereby further improving production efficiency. .
  • the work chamber 101 and the test chamber 102 are arranged side by side, and the replacement chamber 103 is provided on the work chamber 101 and the test chamber 102.
  • the guide rail 301 may be an annular guide rail.
  • the first moving plate 50, the second moving plate 60, and the third moving plate 70 are also provided in the chamber 100.
  • the first moving plate 50 is disposed between the working chamber 101 and the replacement chamber 103
  • the second moving plate 60 is disposed between the test chamber 102 and the replacement chamber 103
  • the third moving plate 70 is disposed between the work chamber 101 and the test chamber 102.
  • the first moving plate 50 includes a first moving portion 501 and a first fixing portion 502, the second moving plate 60 includes a second moving portion 601 and a second fixing portion 602, and the third moving plate 70 includes a third moving portion 701 and a third
  • the first fixing portion 502 is provided with a first via hole 503, the second fixing portion 602 is provided with a second via hole 603, the third fixing portion 702 is provided with a third via hole 703, and the guide rail is along the first A via hole 503, a second via hole 603, and a third via hole 703 are provided.
  • the first fixing portion 502 and the second fixing portion 602 may be provided in an abutting relationship
  • the third fixing portion 702 is perpendicular to the first fixing portion 502 and the second fixing portion 602
  • the guide rail 301 may be an annular guide rail
  • the first fixing portion 502, the second fixing portion 602, and the third fixing portion 702 may be disposed on the inner circumferential side of the guide rail 301.
  • the first moving plate 50, the second moving plate 60, the third moving plate 70, and the guide rail 301 separate the working chamber 101, the test chamber 102, and the replacement chamber 103.
  • the process of replacing the first light source 201 can be completed by adjusting the positions of the first moving plate 50, the second moving plate 60, and the third moving plate 70.
  • the first moving part 501 is first moved so that an opening through which the first light source 201 can pass is formed between the working chamber 101 and the replacement chamber 103. . That is, the first light source 201 can enter the replacement chamber 103 through the opening along the guide rail 301.
  • the third moving part 701 is moved, so that the second light source 202 located in the detection chamber 102 that has been detected can be moved into the working chamber 101 along the guide rail 301.
  • the second moving part 601 is moved so that the second light source 202 in the replacement chamber 103 enters the test chamber 102 for detection. In this way, the replacement process of the first light source 201 is completed.
  • the first light source 201 includes a first sliding portion 2011 and a first light emitting portion 2012 provided on a side of the first sliding portion 2011.
  • the second light source 202 includes a second sliding portion 2021 and a portion. A second light emitting portion 2022 on the side of the second sliding portion 2021;
  • the first sliding portion 2011 and the second sliding portion 2021 are both disposed on the guide rail 301 so that the first light source 201 can be moved along the guide rail 301 into the replacement chamber 103, and the second light source 202 can be moved along the guide rail 301 to After the second light source 202 passes the test, the test chamber 102 is moved to the working chamber 101 along the guide rail 301.
  • the working chamber 101 is further provided with a reflector 80 and a receiver 90 provided outside the working chamber 101; wherein the reflector 80 is used for transmitting the first light source 201 The light is reflected on the receiver 90.
  • the light emitted by the first light source 201 is irradiated on the reflector 80, and then the reflector 80 reflects the light emitted by the first light source 201 onto the receiver 90.
  • the receiver 90 irradiates the light emitted by the first light source 201 on the substrate to be exposed to complete the exposure process.
  • a test unit is further disposed in the test chamber 102;
  • the test unit 102 is configured to test a second light source moved into the test chamber, so that a parameter of the second light source in the test chamber reaches a preset parameter.
  • this application also provides an exposure machine, which includes a light source replacement system provided by any embodiment of this application.
  • the light source replacement system includes a chamber 100 including a working chamber 101, a testing chamber 102, and a replacement chamber 103 adjacent to each other.
  • a first light source 201 is disposed in the working chamber 101.
  • a second light source 202 is provided in the replacement chamber 103; and a guide rail 301 is provided in the chamber 100; wherein the first light source 201 can be moved along the guide rail 301 into the replacement chamber 103, and the second light source 202 can be moved along the The guide rail 301 moves into the test chamber 102, and after the second light source 202 passes the test, it moves along the guide rail 301 into the working chamber 101.
  • the guide rail 301 is provided in the chamber 100, so that there is no need to stop and cool down when the exposure lamp is replaced, thereby improving production efficiency.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)

Abstract

本申请公开了一种曝光机的光源更换系统以及曝光机。该光源更换系统包括工作腔室、测试腔室以及更换腔室，工作腔室内设置有第一光源，更换腔室内设置有第二光源以及导轨，导轨设置在腔室内；第一光源可沿着导轨移动至更换腔室内，第二光源可沿着导轨移动至测试腔室内，待第二光源测试通过后再沿着导轨移动至工作腔室内。

Description

曝光机的光源更换系统以及曝光机 技术领域
本申请涉及显示技术领域，具体涉及一种曝光机的光源更换系统以及曝光机。
 背景技术
在现有的曝光工艺中，曝光机用于曝光的曝光灯使用一段时间后，随着其照度的下降，就需要更换曝光灯，而且曝光灯的使用还需要进行照度的确认才能进行使用，这对于连续生产及产能的制约都产生了非常大的影响。
一般曝光灯临近其使用寿命时，就会影响产品的特性，这时需要提前进行新的曝光灯更换，但更换曝光灯需要停机和降温，并且更换手续也相对繁琐，如果更换过程存在操作不当会直接影响曝光的品质，使玻璃基板上出现曝光不均匀的现象，这样就导致玻璃基板上产生各类宏观和微观的缺陷，影响整张玻璃基板的良品率。另外，传统的曝光设备曝光灯更换方式还会涉及到曝光灯从点灯开始到照度稳定才能开始使用，因此需要等待新灯稳定后才能使用，整个过程浪费了大量的时间，降低了生产效率。
 技术问题
本申请主要解决的技术问题，如何能够提高提高生产效率。
 技术解决方案
第一方面，本申请提供一种曝光机的光源更换系统，包括：
腔室，所述腔室包括相邻设置的工作腔室、测试腔室以及更换腔室，所述工作腔室内设置有第一光源，所述更换腔室内设置有第二光源；以及
导轨，所述导轨设置在所述腔室内；其中，
所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内；
所述第一光源与第二光源的形状、大小均一致；
所述工作腔室内还设置有反射器，以及设置在所述工作腔室外的接收器；其中，所述反射器用于将所述第一光源发出的光线反射至所述接收器上。
在本申请所述的曝光机的光源更换系统中，所述工作腔室与所述测试腔室并排设置，且所述更换腔室设置在所述工作腔室与测试腔室上。
在本申请所述的曝光机的光源更换系统中，所述导轨为环形导轨。
在本申请所述的曝光机的光源更换系统中，所述腔室内还设置有第一移动板、第二移动板和第三移动板；其中，所述第一移动板设置在所述工作腔室与所述更换腔室之间，所述第二移动板设置在所述测试腔室与所述更换腔室之间，所述第三移动板设置在所述工作腔室与所述测试腔室之间。
在本申请所述的曝光机的光源更换系统中，所述第一移动板包括第一移动部以及第一固定部，所述第二移动板包括第二移动部和第二固定部，所述第三移动板包括第三移动部和第三固定部；其中，所述第一固定部上设置有第一过孔，所述第二固定部设置有第二过孔，所述第三固定部设置有第三过孔，所述导轨沿着所述第一过孔、第二过孔以及第三过孔设置。
在本申请所述的曝光机的光源更换系统中，所述第一光源包括第一滑动部以及设置在所述第一滑动部一侧的第一发光部，所述第二光源包括第二滑动部以及设置在所述第二滑动部一侧的第二发光部；
其中，所述第一滑动部和第二滑动部均设置在所述导轨上，以使所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内。
在本申请所述的曝光机的光源更换系统中，其特征在于，所述测试腔室内还设置有一测试单元；
所述测试单元用于测试移动至所述测试腔室内的第二光源，以使所述测试腔室内的第二光源的参数达到预设参数。
第二方面，本申请提供一种曝光机的光源更换系统，包括：
腔室，所述腔室包括相邻设置的工作腔室、测试腔室以及更换腔室，所述工作腔室内设置有第一光源，所述更换腔室内设置有第二光源；以及
导轨，所述导轨设置在所述腔室内；其中，
所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内。
在本申请所述的曝光机的光源更换系统中，所述工作腔室与所述测试腔室并排设置，且所述更换腔室设置在所述工作腔室与测试腔室上。
在本申请所述的曝光机的光源更换系统中，所述导轨为环形导轨。
在本申请所述的曝光机的光源更换系统中，所述腔室内还设置有第一移动板、第二移动板和第三移动板；其中，所述第一移动板设置在所述工作腔室与所述更换腔室之间，所述第二移动板设置在所述测试腔室与所述更换腔室之间，所述第三移动板设置在所述工作腔室与所述测试腔室之间。
在本申请所述的曝光机的光源更换系统中，所述第一移动板包括第一移动部以及第一固定部，所述第二移动板包括第二移动部和第二固定部，所述第三移动板包括第三移动部和第三固定部；其中，所述第一固定部上设置有第一过孔，所述第二固定部设置有第二过孔，所述第三固定部设置有第三过孔，所述导轨沿着所述第一过孔、第二过孔以及第三过孔设置。
在本申请所述的曝光机的光源更换系统中，所述第一光源包括第一滑动部以及设置在所述第一滑动部一侧的第一发光部，所述第二光源包括第二滑动部以及设置在所述第二滑动部一侧的第二发光部；
其中，所述第一滑动部和第二滑动部均设置在所述导轨上，以使所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内。
在本申请所述的曝光机的光源更换系统中，所述工作腔室内还设置有反射器，以及设置在所述工作腔室外的接收器；其中，所述反射器用于将所述第一光源发出的光线反射至所述接收器上。
在本申请所述的曝光机的光源更换系统中，其特征在于，所述测试腔室内还设置有一测试单元；
所述测试单元用于测试移动至所述测试腔室内的第二光源，以使所述测试腔室内的第二光源的参数达到预设参数。
在本申请所述的曝光机的光源更换系统中，所述第一光源与第二光源的形状、大小均一致。
第三方面，本申请提供一种曝光机，包括光源更换系统；
所述光源更新系统包括：
腔室，所述腔室包括相邻设置的工作腔室、测试腔室以及更换腔室，所述工作腔室内设置有第一光源，所述更换腔室内设置有第二光源；以及
导轨，所述导轨设置在所述腔室内；其中，
所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内.
在本申请所述的曝光机中，所述工作腔室与所述测试腔室并排设置，且所述更换腔室设置在所述工作腔室与测试腔室上。
在本申请所述的曝光机中，所述导轨为环形导轨。
在本申请所述的曝光机中，所述腔室内还设置有第一移动板、第二移动板和第三移动板；所述第一移动板设置在所述工作腔室与所述更换腔室之间，所述第二移动板设置在所述测试腔室与所述更换腔室之间，所述第三移动板设置在所述工作腔室与所述测试腔室之间。
 有益效果
本申请的有益效果是：通过在腔室内设置导轨，更换曝光灯时无需停机和降温，因此提高了生产效率。
 附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的光源更换系统的第一种实施方式的结构示意图。
图2为本申请实施例提供的光源更换系统的第二种实施方式的结构示意图。
图3为本申请实施例提供的光源更换系统的第三种实施方式的结构示意图。
图4为本申请实施例提供的光源更换系统的第四种实施方式的结构示意图。
 本发明的实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
具体的，请参阅图1，图1为本申请实施例提供的光源更换系统的第一种实施方式的结构示意图。该光源更换系统用于更换曝光机内的曝光灯。
本申请提供一种曝光机的光源更换系统，包括：
腔室100，腔室包括相邻设置的工作腔室101、测试腔室102以及更换腔室103，工作腔室101内设置有第一光源201，更换腔室103内设置有第二光源202；以及
导轨301，导轨设置301在腔室100内；其中，
第一光源201可沿着导轨301移动至更换腔室103内，第二光源202可沿着导轨301移动至测试腔室102内，待第二光源202测试通过后再沿着导轨301移动至工作腔室101内。比如，该第一光源201与该第二光源202可以均为水银灯，且第一光源201与第二光源202的形状、大小均一致。
例如，具体的，当工作腔室101中的第一光源201照度下降时，第一光源201可以通过导轨301进入到更换腔室103中，同时，更换腔室103中的第二光源202通过导轨301进入到测试腔室102中进行测试。待该第二光源202测试完成后，即第二光源202的照度达到预设照度后，该第二光源202通过导轨301移动工作腔室101中，即完成第二光源202对第一光源201的替换。
在本申请实施例中，更换工作腔室101中的第一光源101的过程无需人工干预，因此可以提高生产效率。并且，由于在更换过程中，工作腔室101、测试腔室102以及更换腔室103共同形成了一个密闭的空间，因此，还降低了第二光源202被污染的概率，从而进一步提高了生产效率。
紧接着，请参阅图2，在一些实施例中，工作腔室101与测试腔室102并排设置，且更换腔室103设置在工作腔室101与测试腔室102上。其中，在本申请实施例中，该导轨301可以为环形导轨。
腔室100内还设置有第一移动板50、第二移动板60和第三移动板70；其中，第一移动板50设置在工作腔室101与更换腔室103之间，第二移动板60设置在测试腔室102与更换腔室103之间，第三移动板70设置在工作腔室101与测试腔室102之间。
第一移动板50包括第一移动部501以及第一固定部502，第二移动板60包括第二移动部601和第二固定部602，第三移动板70包括第三移动部701和第三固定部702；其中，第一固定部502上设置有第一过孔503，第二固定部602设置有第二过孔603，第三固定部702设置有第三过孔703，导轨沿着第一过孔503、第二过孔603以及第三过孔703设置。
比如，第一固定部502和第二固定部602可以贴合设置，第三固定部702垂直于第一固定部502和第二固定部602，并且该导轨301可以是环形导轨，第一固定部502、第二固定部602和第三固定部702可以设置在导轨301的内圆周侧。具体实施时，第一移动板50、第二移动板60、第三移动板70以及导轨301将工作腔室101、测试腔室102以及更换腔室103分隔开。当需要更换设置在工作腔室101中的第一光源201时，可以通过调节第一移动板50、第二移动板60以及第三移动板70的位置来完成更换第一光源201的进程。
例如，具体的，请参阅图3，当需要更换第一光源201时，首先移动第一移动部501，使得工作腔室101与更换腔室103之间形成一个可以让第一光源201通过的开口。即，第一光源201可以沿着导轨301通过该开口进入到更换腔室103中。同时，移动第三移动部701，使得已经检测完毕的位于检测腔室102中的第二光源202可以沿着导轨301移动至工作腔室101中。并且，移动第二移动部601，使更换腔室103中的第二光源202进入到测试腔室102中进行检测。这样，就完成了一次对第一光源201的更换进程。
在一些实施例中，请参阅图4，第一光源201包括第一滑动部2011以及设置在第一滑动部2011一侧的第一发光部2012，第二光源202包括第二滑动部2021以及设置在第二滑动部2021一侧的第二发光部2022；
其中，第一滑动部2011和第二滑动部2021均设置在导轨301上，以使第一光源201可沿着导轨301移动至更换腔室103内，第二光源202可沿着导轨301移动至测试腔室102内，待第二光源202测试通过后再沿着导轨301移动至工作腔室内101。
在一些实施例中，请继续参阅图4，工作腔室内101还设置有反射器80，以及设置在工作腔室101外的接收器90；其中，反射器80用于将第一光源201发出的光线反射至所述接收器90上。
例如，具体的，在工作腔室101处于工作状态时，第一光源201发出的光线照射在反射器80上，然后反射器80将第一光源201发出的光线反射至接收器90上。紧接着，接收器90再将第一光源201发出的光线照射在需要曝光的基板上，以完成曝光进程。
在一些实施例中，测试腔室102内还设置有一测试单元；
测试单元102用于测试移动至测试腔室内的第二光源，以使测试腔室内的第二光源的参数达到预设参数。
相应的，本申请还提供了一种曝光机，包括本申请任一实施例提供的光源更换系统。
本申请实施例提供的光源更换系统，包括腔室100，腔室100包括相邻设置的工作腔室101、测试腔室102以及更换腔室103，工作腔室101内设置有第一光源201，更换腔室103内设置有第二光源202；以及导轨301，导轨301设置在腔室100内；其中，第一光源201可沿着导轨301移动至更换腔室103内，第二光源202可沿着导轨301移动至测试腔室102内，待第二光源202测试通过后再沿着导轨301移动至工作腔室101内。本申请实施例通过在腔室100内设置导轨301，更换曝光灯时无需停机和降温，因此提高了生产效率。
在上述实施例中，对各个实施例的描述都各有侧重，某个实施例中没有详述的部分，可以参见其他实施例的相关描述。
以上对本申请实施例所提供的一种曝光机的光源更换系统以及曝光机进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (20)

  1. 一种曝光机的光源更换系统，其包括：
    腔室，所述腔室包括相邻设置的工作腔室、测试腔室以及更换腔室，所述工作腔室内设置有第一光源，所述更换腔室内设置有第二光源；以及
    导轨，所述导轨设置在所述腔室内；其中，
    所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内；
    所述第一光源与第二光源的形状、大小均一致；
    所述工作腔室内还设置有反射器，以及设置在所述工作腔室外的接收器；其中，所述反射器用于将所述第一光源发出的光线反射至所述接收器上。
  2. 根据权利要求1所述的光源更换系统，其中，所述工作腔室与所述测试腔室并排设置，且所述更换腔室设置在所述工作腔室与测试腔室上。
  3. 根据权利要求2所述的光源更换系统，其中，所述导轨为环形导轨。
  4. 根据权利要求3所述的光源更换系统，其中，所述腔室内还设置有第一移动板、第二移动板和第三移动板；所述第一移动板设置在所述工作腔室与所述更换腔室之间，所述第二移动板设置在所述测试腔室与所述更换腔室之间，所述第三移动板设置在所述工作腔室与所述测试腔室之间。
  5. 根据权利要求4所述的光源更换系统，其中，所述第一移动板包括第一移动部以及第一固定部，所述第二移动板包括第二移动部和第二固定部，所述第三移动板包括第三移动部和第三固定部；所述第一固定部上设置有第一过孔，所述第二固定部设置有第二过孔，所述第三固定部设置有第三过孔，所述导轨沿着所述第一过孔、第二过孔以及第三过孔设置。
  6. 根据权利要求1所述的光源更换系统，其中，所述第一光源包括第一滑动部以及设置在所述第一滑动部一侧的第一发光部，所述第二光源包括第二滑动部以及设置在所述第二滑动部一侧的第二发光部；
    所述第一滑动部和第二滑动部均设置在所述导轨上，以使所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内。
  7. 根据权利要求1所述的光源更换系统，其中，所述测试腔室内还设置有一测试单元；
    所述测试单元用于测试移动至所述测试腔室内的第二光源，以使所述测试腔室内的第二光源的参数达到预设参数。
  8. 一种曝光机的光源更换系统，其包括：
    腔室，所述腔室包括相邻设置的工作腔室、测试腔室以及更换腔室，所述工作腔室内设置有第一光源，所述更换腔室内设置有第二光源；以及
    导轨，所述导轨设置在所述腔室内；其中，
    所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内。
  9. 根据权利要求8所述的光源更换系统，其中，所述工作腔室与所述测试腔室并排设置，且所述更换腔室设置在所述工作腔室与测试腔室上。
  10. 根据权利要求9所述的光源更换系统，其中，所述导轨为环形导轨。
  11. 根据权利要求10所述的光源更换系统，其中，所述腔室内还设置有第一移动板、第二移动板和第三移动板；所述第一移动板设置在所述工作腔室与所述更换腔室之间，所述第二移动板设置在所述测试腔室与所述更换腔室之间，所述第三移动板设置在所述工作腔室与所述测试腔室之间。
  12. 根据权利要求11所述的光源更换系统，其中，所述第一移动板包括第一移动部以及第一固定部，所述第二移动板包括第二移动部和第二固定部，所述第三移动板包括第三移动部和第三固定部；所述第一固定部上设置有第一过孔，所述第二固定部设置有第二过孔，所述第三固定部设置有第三过孔，所述导轨沿着所述第一过孔、第二过孔以及第三过孔设置。
  13. 根据权利要求8所述的光源更换系统，其中，所述第一光源包括第一滑动部以及设置在所述第一滑动部一侧的第一发光部，所述第二光源包括第二滑动部以及设置在所述第二滑动部一侧的第二发光部；
    所述第一滑动部和第二滑动部均设置在所述导轨上，以使所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内。
  14. 根据权利要求8所述的光源更换系统，其中，所述工作腔室内还设置有反射器，以及设置在所述工作腔室外的接收器；其中，所述反射器用于将所述第一光源发出的光线反射至所述接收器上。
  15. 根据权利要求8所述的光源更换系统，其中，所述测试腔室内还设置有一测试单元；
    所述测试单元用于测试移动至所述测试腔室内的第二光源，以使所述测试腔室内的第二光源的参数达到预设参数。
  16. 根据权利要求8所述的光源更换系统，其中，所述第一光源与第二光源的形状、大小均一致。
  17. 一种曝光机，其包括光源更新系统；
    所述光源更新系统包括：
    腔室，所述腔室包括相邻设置的工作腔室、测试腔室以及更换腔室，所述工作腔室内设置有第一光源，所述更换腔室内设置有第二光源；以及
    导轨，所述导轨设置在所述腔室内；其中，
    所述第一光源可沿着所述导轨移动至所述更换腔室内，所述第二光源可沿着所述导轨移动至所述测试腔室内，待所述第二光源测试通过后再沿着所述导轨移动至所述工作腔室内.
  18. 根据权利要求17所述的曝光机，其中，所述工作腔室与所述测试腔室并排设置，且所述更换腔室设置在所述工作腔室与测试腔室上。
  19. 根据权利要求18所述的曝光机，其中，所述导轨为环形导轨。
  20. 根据权利要求19所述的曝光机，其中，所述腔室内还设置有第一移动板、第二移动板和第三移动板；所述第一移动板设置在所述工作腔室与所述更换腔室之间，所述第二移动板设置在所述测试腔室与所述更换腔室之间，所述第三移动板设置在所述工作腔室与所述测试腔室之间。
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