WO2020037716A1 - 一种触摸屏及其制作方法 - Google Patents

一种触摸屏及其制作方法 Download PDF

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Publication number
WO2020037716A1
WO2020037716A1 PCT/CN2018/104190 CN2018104190W WO2020037716A1 WO 2020037716 A1 WO2020037716 A1 WO 2020037716A1 CN 2018104190 W CN2018104190 W CN 2018104190W WO 2020037716 A1 WO2020037716 A1 WO 2020037716A1
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WIPO (PCT)
Prior art keywords
layer
bridge
touch
touch screen
substrate
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PCT/CN2018/104190
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English (en)
French (fr)
Inventor
冯校亮
Original Assignee
武汉华星光电半导体显示技术有限公司
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Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US16/301,452 priority Critical patent/US20210232262A1/en
Publication of WO2020037716A1 publication Critical patent/WO2020037716A1/zh

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Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the invention relates to the field of display, in particular to a touch screen and a manufacturing method thereof.
  • the touch screen includes an on-cell touch panel and an in-cell touch panel.
  • the in-cell touch screen is embedded with the touch sensing function in the metallurgical pixels, which can better realize the thinness and lightness of the panel, which is favored by manufacturers.
  • Touch screens usually include an electrode layer.
  • the lateral distribution electrode and the longitudinal distribution electrode are usually bridged at the intersection to avoid short contact caused by direct contact between the lateral distribution electrode and the vertical distribution electrode.
  • Existing bridges are made of metal materials. If the line width of the bridge is too small, the production cost will increase significantly. If the line width of the bridge is too large, the metal will become visible due to external light in a black screen. Visibility of the touch screen is significantly reduced. Therefore, a touch screen and a manufacturing method thereof are urgently needed to solve the above problems.
  • a touch screen which includes a substrate and a touch part disposed on one side of the substrate, the touch part includes: a first conductive layer for realizing the first conductive layer across A second conductive layer and an insulating layer disposed between the first conductive layer and the second conductive layer;
  • a light-absorbing layer is disposed on a surface of the second conductive layer remote from the substrate, and a projection pattern of the light-absorbing layer on a plane where the second conductive layer is located covers the pattern of the second electrode layer.
  • the first conductive layer is a touch electrode layer
  • the second conductive layer is a bridge layer
  • the light absorbing layer is one of a black matrix layer and a gray coating.
  • a via is provided in the insulating layer, and the bridge layer realizes the bridging of the touch electrode layer through the via.
  • the touch electrode layer is disposed on a surface of the substrate
  • the insulating layer is disposed on a surface of the touch electrode layer
  • the bridge layer is disposed on a surface of the insulating layer
  • the light absorption layer is disposed on a surface of the bridge layer.
  • the bridge layer is disposed on a surface of the substrate
  • the light absorbing layer is disposed on a surface of the bridge layer
  • the insulating layer is disposed on a surface of the light absorbing layer and covers the bridge layer;
  • the touch electrode layer is disposed on a surface of the insulating layer.
  • a protection layer covering the touch portion is further included.
  • a method for manufacturing a touch screen including:
  • S10 Provide a substrate, and form a touch electrode layer on a surface of the substrate;
  • An insulating layer is formed on a surface of the touch electrode layer, and the insulating layer is provided with a via hole;
  • a bridge bridge layer is formed on a surface of the insulating layer, and the bridge bridge layer bridges the touch electrode layer through the via hole;
  • a light absorption layer is formed on a surface of the bridge layer, and a projection pattern of the light absorption layer on a plane where the bridge layer is located covers the pattern of the bridge layer;
  • the light absorption layer is one of a black matrix layer and a gray coating.
  • step S50 is further included.
  • a protective layer covering the light absorbing layer and the insulating layer is formed on a surface of the light absorbing layer.
  • a method for manufacturing a touch screen including:
  • S10 Provide a substrate, and form a touch electrode layer on a surface of the substrate;
  • An insulating layer is formed on a surface of the touch electrode layer, and the insulating layer is provided with a via hole;
  • a bridge bridge layer is formed on a surface of the insulating layer, and the bridge bridge layer bridges the touch electrode layer through the via hole;
  • a light absorption layer is formed on a surface of the bridge layer, and a projection pattern of the light absorption layer on a plane where the bridge layer is located covers the pattern of the bridge layer;
  • the light absorbing layer is one of a black matrix layer and a gray coating, and the light absorbing layer is prepared by a screen printing process or an inkjet printing process.
  • step S50 is further included.
  • a protective layer covering the light absorbing layer and the insulating layer is formed on a surface of the light absorbing layer.
  • the advantage of the present invention is to provide a touch screen and a method for manufacturing the same.
  • the invention By preparing a light absorbing layer formed by a black matrix layer or a gray coating on the surface of the bridge layer, the invention has the characteristics of simple process and low cost, thereby solving bridge bridge The problem of layer bridge metal visualization caused by strong reflection.
  • FIG. 1 is a schematic structural diagram of a bridge substrate in an embodiment of the present invention.
  • FIG. 2 is a schematic structural diagram of a bridge substrate in another embodiment of the present invention.
  • FIG. 3 is a schematic structural diagram of a touch screen according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural diagram of a touch screen according to another embodiment of the present invention.
  • FIG. 5 is a schematic structural diagram of a touch screen according to another embodiment of the present invention.
  • FIG. 6 is a schematic flowchart of a method for manufacturing a touch screen according to an embodiment of the present invention.
  • the invention provides a touch screen and a method for manufacturing the same.
  • the problem of visualization of the bridge metal due to the strong reflection effect of the bridge layer metal can be improved in this embodiment.
  • FIG. 1 is a schematic structural diagram of a bridge substrate in an embodiment of the present invention
  • FIG. 2 is a schematic structural diagram of a bridge substrate in another embodiment of the present invention
  • FIG. 3 is a schematic structural diagram of a touch screen in an embodiment of the present invention
  • FIG. 5 is a schematic structural diagram of a touch screen in another embodiment of the present invention
  • FIG. 5 is a schematic structural diagram of a touch screen in another embodiment of the present invention
  • the present invention provides a bridge substrate, which includes a first conductive layer 11, a second conductive layer 13 configured to bridge the first conductive layer 11, and a first conductive layer 11 disposed on the first conductive layer 11.
  • a light absorption layer 14 is disposed on one side of the second conductive layer 13, and a projection pattern of the light absorption layer 14 on a plane where the second conductive layer 13 is located covers the pattern of the second electrode layer 13.
  • the bridge substrate is used to prepare an array substrate.
  • the first conductive layer 11 and the second conductive layer 13 may be made of a metal material or other conductive materials.
  • the first conductive layer includes a first conductive line that is laterally distributed and a second conductive line that is vertically distributed. Since both the first conductive line and the second conductive line are distributed on the first In the conductive layer, the first conductive line and the second conductive line are used to transmit different signals; when the first conductive line and the second conductive line meet, in order to avoid the first conductive line Signal contact with the second conductive line causes signal interference; therefore, the second conductive layer needs to be used as a bridge layer to further bridge the first conductive layer.
  • the present invention is provided with a light absorbing layer 14 for absorbing light on the second conductive layer 13.
  • the light absorbing layer 14 is a black matrix layer and a gray coating layer. It can be understood that the material of the light absorbing layer in the present invention is not limited to the black matrix layer and the gray coating layer, and may include other light absorbing layers which are convenient for preparation. coating.
  • the main material of the black matrix layer is graphite, and the graphite has a strong light absorption ability.
  • the absorbance of a 1 micron-thick black matrix layer can reach more than 4, and the light reflectance of the black metal layer is basically 0, which indicates that the light intensity reaching the second conductive layer 13 through the black matrix layer is insufficient.
  • the intensity of the original incident light is one ten-thousandth, so the reflected light reflected from the second conductive layer is negligible when it penetrates through the black matrix layer.
  • the actual demand further determines the thickness of the light absorbing layer 14. According to the visual perception of the human eye, in a device prepared by using the bridge substrate, the color of the color screen of the light absorbing layer remains substantially the same in a black screen state, and the visualization of the second conductive layer 13 can be avoided.
  • the gray coating also has a light absorbing ability, and the gray coating can be used as the light absorbing layer 14 when the requirements are not critical; since the gray coating belongs to the dark series under a black screen state, the second conductive layer 13 can also be avoided. Visualization.
  • the second conductive layer 13 may be provided above the first conductive layer 11 as shown in FIG. 1; the second conductive layer 13 may also be provided below the first conductive layer, such as As shown in FIG. 2, the type of the bridge substrate may be specifically selected according to the requirements of the bridge.
  • the bridge substrate can be used in a touch device including a complete bridge layer, an insulating layer, a touch electrode layer, and a protective layer, and can also be used in other devices using a bridge structure.
  • the touch screen of the bridge substrate is taken as an example for further demonstration.
  • a touch screen is further provided.
  • the touch screen includes a substrate 2 and a touch portion 1 disposed on one side of the substrate.
  • the touch portion 1 includes: A conductive layer 11, a second conductive layer 13 for realizing the bridge between the first conductive layer, and an insulating layer 12 provided between the first conductive layer 11 and the second conductive layer 13;
  • a light absorption layer 14 is disposed on a surface of the second conductive layer 13 away from the substrate 2.
  • a projection pattern of the light absorption layer 14 on a plane where the second conductive layer 13 is located covers the second electrode layer 13. picture of.
  • the light absorbing layer 14 is one of a black matrix layer and a gray coating.
  • Both the black matrix layer and the gray coating layer can avoid the visualization of the second conductive layer 13.
  • the first conductive layer 11 is a touch electrode layer
  • the second conductive layer 12 is a bridge layer.
  • the touch electrode layer includes a first direction touch line and a second direction touch line.
  • the crossing layer of the first touch line and the second touch line 112 is provided at the intersection of the first touch line 111 and the first touch line 111, and the bridge layer is usually required to conduct electricity.
  • the bridge layer includes a plurality of bridges.
  • the insulating layer 12 includes a via hole 121, and the bridge layer realizes the bridging of the touch electrode layer through the via hole 121.
  • the via hole 121 includes a first via hole and a second via hole, and the first via hole and the second via hole are respectively located at two ends of the bridge.
  • the touch electrode layer is disposed on a surface of the substrate 2;
  • the insulating layer 12 is disposed on a surface of the touch electrode layer
  • the bridge layer is disposed on a surface of the insulating layer
  • the light absorption layer 14 is disposed on a surface of the bridge layer.
  • the via hole 121 is filled with the bridge layer above the touch electrode layer.
  • the bridge layer is disposed on the surface of the substrate 2;
  • the light absorption layer 14 is disposed on a surface of the bridge layer
  • the insulating layer 12 is disposed on a surface of the light absorbing layer and covers the bridge layer;
  • the touch electrode layer is disposed on a surface of the insulating layer.
  • the via hole 121 is filled with the touch electrode layer located above the bridge layer.
  • the touch screen further includes a protective layer 3 covering the touch portion 1.
  • the substrate 2 includes other common touch screen devices such as a thin film transistor, a scan line, a data line, and the details are not described herein.
  • the span bridge Since the position of the span bridge in the second conductive layer is extremely small compared to the touch screen, the span bridge is not visible when the touch screen is bright.
  • a method for manufacturing a touch screen including:
  • S10 Provide a substrate, and form a touch electrode layer on a surface of the substrate;
  • An insulating layer is formed on a surface of the touch electrode layer, and the insulating layer is provided with a via hole;
  • a bridge bridge layer is formed on a surface of the insulating layer, and the bridge bridge layer bridges the touch electrode layer through the via hole;
  • a light absorption layer is formed on a surface of the bridge layer, and a projection pattern of the light absorption layer on a plane where the bridge layer is located covers the pattern of the bridge layer;
  • the light absorbing layer is one of a black matrix layer and a gray coating, and the light absorbing layer is prepared by a screen printing process or an inkjet printing process.
  • the invention uses a black matrix layer or a gray coating layer to prepare a light absorbing layer, and only uses a screen printing process or an inkjet printing process to prepare the light absorbing layer, which greatly simplifies the manufacturing steps of the light absorbing layer and improves the light absorbing effect of the light absorbing layer.
  • Visualization of the bridge metal layer is avoided;
  • the black matrix layer and the gray coating used in the present invention are common low-cost materials, which can reduce the manufacturing cost of the light-absorbing layer while simplifying the manufacturing process of the light-absorbing layer;
  • the equipment used to prepare the light absorbing layer in the present invention is also a common equipment, so the equipment investment in the present invention can be reduced and the cost can be reduced.
  • the cross-bridge structure saves production costs.
  • the advantage of the present invention is to provide a touch screen and a method for manufacturing the same.
  • the invention By preparing a light absorbing layer formed by a black matrix layer or a gray coating on the surface of the bridge layer, the invention has the characteristics of simple process and low cost, thereby solving bridge bridges.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

一种触摸屏及其制作方法，所述触摸屏包括基板(2)及触控部(1)，所述触控部(1)包括：第一导电层(11)、用以实现所述第一导电层(11)跨接的第二导电层(13)以及设置在所述第一导电层(11)和所述第二导电层(13)之间的绝缘层(12)；其中，所述第二导电层(13)的一侧设置有吸光层(14)，所述吸光层(14)在所述第二导电层(13)所在平面的投影图案覆盖所述第二导电层(13)的图案。

Description

一种触摸屏及其制作方法 技术领域
本发明涉及显示领域，具体涉及一种触摸屏及其制作方法。
 背景技术
触摸屏包括覆盖表面式触摸屏(On-cell Touch Panel)和内嵌式触摸屏(In-cell Touch Panel)。其中，内嵌式触摸屏是将触控感应功能嵌入到冶金像素中，可以更好地实现面板的薄型化和轻量化，备受厂商青睐。
触摸屏通常包括有电极层，横向分布电极和纵向分布电极通常在交汇处采用跨桥的方式避免横向分布电极和纵向分布电极直接接触而导致短路。现有跨桥采用金属材料制备，跨桥的线宽过小会导致制作成本明显升高；跨桥的线宽过大会导致金属在黑屏状态下由于外界光照射变的可视，这样使得用户对触摸屏的可视感明显降低。因此目前亟需一种触摸屏及其制作方法以解决上述问题。
 技术问题
跨桥层金属由于强反光作用导致跨桥金属可视化的问题。
 技术解决方案
为实现上述目的，本发明提供的技术方案如下：
根据本发明的一个方面，提供了一种触摸屏，包括基板及设置在所述基板一侧的触控部，所述触控部包括：第一导电层、用以实现所述第一导电层跨接的第二导电层以及设置在所述第一导电层和所述第二导电层之间的绝缘层；
其中，所述第二导电层远离所述基板的一侧表面设置有吸光层，所述吸光层在所述第二导电层所在平面的投影图案覆盖所述第二电极层的图案。
根据本发明一实施例，所述第一导电层为触控电极层，所述第二导电层为跨桥层。
根据本发明一实施例，所述吸光层为黑色矩阵层和灰色涂层的其中一者。
根据本发明一实施例，所述绝缘层内设置有过孔，所述跨桥层通过所述过孔实现所述触控电极层的跨接。
根据本发明一实施例，所述触控电极层，设置于所述基板的表面；
所述绝缘层，设置于所述触控电极层的表面；
所述跨桥层，设置于所述绝缘层的表面；
所述吸光层，设置于所述跨桥层的表面。
根据本发明一实施例，所述跨桥层，设置于所述基板的表面；
所述吸光层，设置于所述跨桥层的表面；
所述绝缘层，设置于所述吸光层的表面，并覆盖所述跨桥层；
所述触控电极层，设置于所述绝缘层的表面。
根据本发明一实施例，还包括覆盖所述触控部的保护层。
根据本发明的另一个方面，提供了一种触摸屏的制作方法，包括：
S10、提供一基板，在所述基板表面形成触控电极层；
S20、在所述触控电极层的表面形成绝缘层，所述绝缘层设置有过孔；
S30、在所述绝缘层的表面形成跨桥层，所述跨桥层通过所述过孔实现所述触控电极层的跨接；
S40、在所述跨桥层的表面形成吸光层，所述吸光层在所述跨桥层所在平面的投影图案覆盖所述跨桥层的图案；
其中，所述吸光层为黑色矩阵层和灰色涂层的其中一者。
根据本发明一实施例，还包括步骤S50、在所述吸光层的表面形成覆盖所述吸光层和所述绝缘层的保护层。
根据本发明的又一个方面，提供了一种触摸屏的制作方法，包括：
S10、提供一基板，在所述基板表面形成触控电极层；
S20、在所述触控电极层的表面形成绝缘层，所述绝缘层设置有过孔；
S30、在所述绝缘层的表面形成跨桥层，所述跨桥层通过所述过孔实现所述触控电极层的跨接；
S40、在所述跨桥层的表面形成吸光层，所述吸光层在所述跨桥层所在平面的投影图案覆盖所述跨桥层的图案；
其中，所述吸光层为黑色矩阵层和灰色涂层的其中一者，所述吸光层采用丝网印刷打印工艺或者喷墨打印工艺制备。
根据本发明一实施例，还包括步骤S50、在所述吸光层的表面形成覆盖所述吸光层和所述绝缘层的保护层。
 有益效果
本发明的优点是，提供了一种触摸屏及其制作方法，通过在跨桥层的表面制备由黑色矩阵层或者灰色涂层形成的吸光层，具有工艺简便，成本低的特点，进而解决跨桥层金属由于强反光作用导致跨桥金属可视化的问题。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明一实施例中跨桥基板的结构示意图；
图2为本发明另一实施例中跨桥基板的结构示意图；
图3为本发明一实施例中触摸屏的结构示意图；
图4为本发明另一实施例中触摸屏的结构示意图；
图5为本发明又一实施例中触摸屏的结构示意图；
图6为本发明一实施例中触摸屏的制作方法的流程示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
本发明提供了一种触摸屏及其制作方法，跨桥层金属由于强反光作用导致跨桥金属可视化的问题，本实施例能够改善该缺陷。
图1为本发明一实施例中跨桥基板的结构示意图；图2为本发明另一实施例中跨桥基板的结构示意图；图3为本发明一实施例中触摸屏的结构示意图；图4为本发明另一实施例中触摸屏的结构示意图；图5为本发明又一实施例中触摸屏的结构示意图；图6为本发明一实施例中触摸屏的制作方法的流程示意图。下面结合附图和具体实施例对本发明做进一步的说明：
如图1和图2所示，本发明提供了一种跨桥基板，包括第一导电层11、用以实现所述第一导电层11跨接的第二导电层13以及设置在所述第一导电层11和所述第二导电层13之间的绝缘层12；
其中，所述第二导电层13的一侧设置有吸光层14，所述吸光层14在所述第二导电层13所在平面的投影图案覆盖所述第二电极层13的图案。
通常的，所述跨桥基板用以制备阵列基板。
所述第一导电层11和第二导电层13可以由金属材料制备或者其它导电材料制备。
需要解释的是，所述第一导电层包括有横向分布的第一导电线和纵向分布的第二导电线，由于所述第一导电线和所述第二导电线均分布于所述第一导电层中，所述第一导电线和所述第二导电线用于传输不同的信号；在所述第一导电线与所述第二导电线交汇的时候，为了避免所述第一导电线和所述第二导电线的接触发生信号干扰；因此需要采用第二导电层作为跨桥层，进而实现第一导电层的跨接。
进一步的，为了防止第二导电层13的可视化的发生，本发明在第二导电层13上设置有用于吸光的吸光层14。
优选的，所述吸光层14为黑色矩阵层和灰色涂层，可以理解的是本发明中的吸光层的材料并不仅限于所述黑色矩阵层和灰色涂层，还可以包括其它便于制备的吸光涂层。
其中，黑色矩阵层的主要材料为石墨，所述石墨具有强大的吸光能力。通常的，1微米厚的黑色矩阵层的吸光度可以达到4以上，而黑色金属层的光反射率基本为0，这说明透过所述黑色矩阵层到达所述第二导电层13的光强不足原入射光的强度的万分之一，因此从所述第二导电层反射出来的反射光在穿透除所述黑色矩阵层的光强可以忽略不计，在制备吸光层14的过程中可以根据实际需求进而确定所述吸光层14的厚度。根据人眼的视觉感应，在采用所述跨桥基板制备的装置在黑屏状态下由于所述吸光层的颜色屏幕的颜色基本保持一致，能够避免所述第二导电层13的可视化。
同样的，灰色涂层也具有吸光能力，在要求并不苛刻的情况下可以采用灰色涂层作为吸光层14；由于灰色涂层在黑屏状态下属于暗色系列，也能够避免第二导电层13的可视化。
其中，所述第二导电层13既可以设置在所述第一导电层11的上方，如图1所示；所述第二导电层13也可以设置在所述第一导电层的下方，如图2所示，具体可以根据跨桥的需要选择所述跨桥基板的类型。
所述跨桥基板既可以运用于包括完整的跨桥层、绝缘层、触控电极层、保护层的触控装置中，也可以运用在其他使用跨桥结构的其它装置中，本发明以使用所述跨桥基板的触摸屏为例进行进一步的示范说明。
根据本发明的另一个方面，如图3和图4所示，还提供了一种触摸屏，包括基板2及设置在所述基板一侧的触控部1，所述触控部1包括：第一导电层11、用以实现所述第一导电层跨接的第二导电层13以及设置在所述第一导电层11和所述第二导电层13之间的绝缘层12；
其中，所述第二导电层13远离所述基板2的一侧表面设置有吸光层14，所述吸光层14在所述第二导电层13所在平面的投影图案覆盖所述第二电极层13的图案。
优选的，所述吸光层14为黑色矩阵层和灰色涂层的其中一者。
黑色矩阵层和灰色涂层均能够避免所述第二导电层13的可视化，具体原理请参考所述跨桥基板的工作原理，在此不做赘述。
进一步的，所述第一导电层11为触控电极层，所述第二导电层12为跨桥层，所述触控电极层包括第一方向触控线和第二方向触控线，在所述第一触控线和所述第二触控线112交汇处设置有用以实现所述第一触控线111跨接的所述跨桥层，其中所述跨桥层由于导电需要，通常设置为导电金属，所述跨桥层包括多个跨桥。
具体的，所述绝缘层12包括过孔121，所述跨桥层通过所述过孔121实现所述触控电极层的跨接。
进一步的，所述过孔121包括第一过孔和第二过孔，所述第一过孔和所述第二过孔分别位于所述跨桥的两端。
优选的，如图3所示，所述触控电极层，设置于所述基板2的表面；
所述绝缘层12，设置于所述触控电极层的表面；
所述跨桥层，设置于所述绝缘层的表面；
所述吸光层14，设置于所述跨桥层的表面。
进一步的，所述过孔121中填充的为位于所述触控电极层上方的所述跨桥层。
优选的，所述跨桥层，设置于所述基板2的表面；
所述吸光层14，设置于所述跨桥层的表面；
所述绝缘层12，设置于所述吸光层的表面，并覆盖所述跨桥层；
所述触控电极层，设置于所述绝缘层的表面。
进一步的，所述过孔121中填充的为位于所述跨桥层上方的所述触控电极层。
如图5所示，所述触控屏还包括覆盖所述触控部1的保护层3。
可以理解的是，所述基板2包括薄膜晶体管、扫描线、数据线等其它常见的触控屏器件，在这里不做赘述。
由于所述第二导电层中跨桥的位置相较于触摸屏来说极其微小，在触摸屏亮屏状态下所述跨桥也是不可视的。
如图所示，根据本发明的又一个方面，还提供了一种触摸屏的制作方法，包括：
S10、提供一基板，在所述基板表面形成触控电极层；
S20、在所述触控电极层的表面形成绝缘层，所述绝缘层设置有过孔；
S30、在所述绝缘层的表面形成跨桥层，所述跨桥层通过所述过孔实现所述触控电极层的跨接；
S40、在所述跨桥层的表面形成吸光层，所述吸光层在所述跨桥层所在平面的投影图案覆盖所述跨桥层的图案；
其中，所述吸光层为黑色矩阵层和灰色涂层的其中一者，所述吸光层采用丝网印刷打印工艺或者喷墨打印工艺制备。
相较于现有在跨桥金属层的上方设置一层金属氧化物或者光学氧化膜使得跨桥金属层的反光率降低的结构，相较于本发明需要多出镀膜、刻蚀和剥离三道工序。
本发明通过采用黑色矩阵层或者灰色涂层制备吸光层，仅采用丝网印刷工艺或者喷墨打印工艺制备吸光层，极大的简化了吸光层的制作步骤，提高了吸光层的吸光效果，进而避免了跨桥金属层的可视化；其次，本发明中采用的黑色矩阵层和灰色涂层均为常见的低价材料，在简化吸光层制备工艺的同时也能够降低吸光层的制作成本；再者，制备本发明中所述吸光层所采用的设备也均为常见的设备，因此可以降低本发明中的设备投入，降低成本；最后，采用本发明中所述的吸光层不用制作超细线宽的跨桥结构，节约了制作成本。
本发明的优点是，提供了一种触摸屏及其制作方法，通过在跨桥层的表面制备由黑色矩阵层或者灰色涂层形成的吸光层，具有工艺简便，成本低的特点，进而解决跨桥层金属由于强反光作用导致跨桥金属可视化的问题。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (11)

  1. 一种触摸屏，其包括基板及设置在所述基板一侧的触控部，所述触控部包括：第一导电层、用以实现所述第一导电层跨接的第二导电层以及设置在所述第一导电层和所述第二导电层之间的绝缘层；
    其中，所述第二导电层远离所述基板的一侧表面设置有吸光层，所述吸光层在所述第二导电层所在平面的投影图案覆盖所述第二电极层的图案。
  2. 根据权利要求1所述的触摸屏，其中，所述第一导电层为触控电极层，所述第二导电层为跨桥层。
  3. 根据权利要求2所述的触摸屏，其中，所述吸光层为黑色矩阵层和灰色涂层的其中一者。
  4. 根据权利要求2所述的触控屏，其中，所述绝缘层内设置有过孔，所述跨桥层通过所述过孔实现所述触控电极层的跨接。
  5. 根据权利要求2所述的触控屏，其中，
    所述触控电极层，设置于所述基板的表面；
    所述绝缘层，设置于所述触控电极层的表面；
    所述跨桥层，设置于所述绝缘层的表面；
    所述吸光层，设置于所述跨桥层的表面。
  6. 根据权利要求2所述的触摸屏，其中，
    所述跨桥层，设置于所述基板的表面；
    所述吸光层，设置于所述跨桥层的表面；
    所述绝缘层，设置于所述吸光层的表面，并覆盖所述跨桥层；
    所述触控电极层，设置于所述绝缘层的表面。
  7. 根据权利要求2所述的触摸屏，其中，还包括覆盖所述触控部的保护层。
  8. 一种触摸屏的制作方法，其包括：
    S10、提供一基板，在所述基板表面形成触控电极层；
    S20、在所述触控电极层的表面形成绝缘层，在所述绝缘层内形成过孔；
    S30、在所述绝缘层的表面形成跨桥层，所述跨桥层通过所述过孔实现所述触控电极层的跨接；
    S40、在所述跨桥层的表面形成吸光层，所述吸光层在所述跨桥层所在平面的投影图案覆盖所述跨桥层的图案；
    其中，所述吸光层为黑色矩阵层和灰色涂层的其中一者。
  9. 根据权利要求8所述的触摸屏的制作方法，其中，还包括步骤S50、在所述吸光层的表面形成覆盖所述吸光层和所述绝缘层的保护层。
  10. 一种触摸屏的制作方法，其包括：
    S10、提供一基板，在所述基板表面形成触控电极层；
    S20、在所述触控电极层的表面形成绝缘层，在所述绝缘层内形成过孔；
    S30、在所述绝缘层的表面形成跨桥层，所述跨桥层通过所述过孔实现所述触控电极层的跨接；
    S40、在所述跨桥层的表面形成吸光层，所述吸光层在所述跨桥层所在平面的投影图案覆盖所述跨桥层的图案；
    其中，所述吸光层为黑色矩阵层和灰色涂层的其中一者，所述吸光层采用丝网印刷打印工艺或者喷墨打印工艺制备。
  11. 根据权利要求10所述的触摸屏的制作方法，其中，还包括步骤S50、在所述吸光层的表面形成覆盖所述吸光层和所述绝缘层的保护层。
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113918041A (zh) * 2020-07-08 2022-01-11 东友精细化工有限公司 触摸传感器、制造触摸传感器的方法以及包括触摸传感器的图像显示设备

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109782958A (zh) * 2019-01-31 2019-05-21 信利光电股份有限公司 一种金属网格触摸屏的黑化方法及金属网格触摸屏
CN109979980A (zh) * 2019-03-28 2019-07-05 武汉华星光电半导体显示技术有限公司 显示面板及其制备方法、显示装置
KR20230013686A (ko) * 2021-07-16 2023-01-27 삼성디스플레이 주식회사 표시 장치 및 이를 포함하는 센싱 시스템

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103885659A (zh) * 2013-12-17 2014-06-25 友达光电股份有限公司 电容式触控显示面板、电容式触控面板及其制造方法
CN203706188U (zh) * 2013-02-13 2014-07-09 松下电器产业株式会社 触控面板
US20140375910A1 (en) * 2012-02-09 2014-12-25 Sharp Kabushiki Kaisha Touch-panel substrate
CN106249952A (zh) * 2016-07-29 2016-12-21 京东方科技集团股份有限公司 一种触摸屏、其制作方法及显示装置
CN206848986U (zh) * 2017-05-31 2018-01-05 汕头超声显示器有限公司 一种可减少视觉干扰的电容触摸屏

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1568114A (zh) * 2003-06-13 2005-01-19 胜华科技股份有限公司 改善强光下可读性的高分子电激发光元件及其制造方法
CN100476531C (zh) * 2007-11-02 2009-04-08 友达光电股份有限公司 触控式平面显示器及其制造方法
CN103715138B (zh) * 2013-12-31 2017-01-25 京东方科技集团股份有限公司 一种阵列基板及其制造方法、显示装置
TWI578214B (zh) * 2015-10-02 2017-04-11 友達光電股份有限公司 觸控面板及其製作方法
FR3056776B1 (fr) * 2016-09-28 2019-07-12 Dav Dispositif d'affichage pour vehicule automobile et procede de fabrication
CN106406624A (zh) * 2016-10-31 2017-02-15 厦门天马微电子有限公司 一种触控显示面板以及电子设备
CN107741800B (zh) * 2017-10-23 2021-08-20 京东方科技集团股份有限公司 触控显示屏及制备方法、显示装置
CN108415603B (zh) * 2018-03-15 2021-02-23 业成科技（成都）有限公司 防漏红光的触控感光结构

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140375910A1 (en) * 2012-02-09 2014-12-25 Sharp Kabushiki Kaisha Touch-panel substrate
CN203706188U (zh) * 2013-02-13 2014-07-09 松下电器产业株式会社 触控面板
CN103885659A (zh) * 2013-12-17 2014-06-25 友达光电股份有限公司 电容式触控显示面板、电容式触控面板及其制造方法
CN106249952A (zh) * 2016-07-29 2016-12-21 京东方科技集团股份有限公司 一种触摸屏、其制作方法及显示装置
CN206848986U (zh) * 2017-05-31 2018-01-05 汕头超声显示器有限公司 一种可减少视觉干扰的电容触摸屏

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113918041A (zh) * 2020-07-08 2022-01-11 东友精细化工有限公司 触摸传感器、制造触摸传感器的方法以及包括触摸传感器的图像显示设备
CN113918041B (zh) * 2020-07-08 2024-07-16 东友精细化工有限公司 触摸传感器、制造触摸传感器的方法以及包括触摸传感器的图像显示设备

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