WO2020020103A1 - 触控基板及其制造方法和触控装置 - Google Patents

触控基板及其制造方法和触控装置 Download PDF

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Publication number
WO2020020103A1
WO2020020103A1 PCT/CN2019/097132 CN2019097132W WO2020020103A1 WO 2020020103 A1 WO2020020103 A1 WO 2020020103A1 CN 2019097132 W CN2019097132 W CN 2019097132W WO 2020020103 A1 WO2020020103 A1 WO 2020020103A1
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WIPO (PCT)
Prior art keywords
substrate
layer
touch
light
region
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Application number
PCT/CN2019/097132
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English (en)
French (fr)
Inventor
王庆浦
方振中
贺晓悦
尹利
张志�
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 合肥鑫晟光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/632,170 priority Critical patent/US11132076B2/en
Priority to EP19842043.2A priority patent/EP3832444A4/en
Publication of WO2020020103A1 publication Critical patent/WO2020020103A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present disclosure relates to the field of touch technology, and in particular, to a touch substrate, a manufacturing method thereof, and a touch device.
  • the frame of the touch screen is generally provided with an infrared filtering (IR) hole, and the infrared filtering hole is provided with a distance sensor or a light sensor to detect the distance or the brightness of the external environment by using infrared rays.
  • IR infrared filtering
  • People are increasingly demanding the appearance of touch screens.
  • the color of the infrared filter holes at the border of the touch screen needs to be consistent with the color of the edges of the touch screen, so that the infrared filter holes are better hidden.
  • a touch substrate including a touch area and a border area surrounding the touch area, the border area including a filter sub-area for transmitting light of a predetermined wave band and surrounding the touch area.
  • the light-shielding sub-region of the filter sub-region is less than 3.6.
  • the frame region of the touch substrate includes a substrate, a light shielding layer and a filter ink layer located on the substrate.
  • the light shielding layer is located in the light shielding sub-region, and a through hole is provided at a position in the light shielding layer corresponding to the filter sub-region.
  • the filter ink layer is located on a side of the light-shielding layer facing away from the substrate, and the orthographic projection of the through-hole on the substrate substrate is located on the front of the filter ink layer on the substrate. The interior of the projection.
  • the difference in brightness between the light-shielding layer and the filter ink layer is less than 3.6.
  • the difference between the lightness of the light-shielding layer and the filter ink layer is 0.5-2.
  • the lightness of the filter ink layer is 23 to 24.5, and the lightness of the light shielding layer is 24 to 25.
  • the thickness of the light shielding layer is 1.5 ⁇ m to 2.3 ⁇ m.
  • the filter ink layer is located in the through hole of the light-shielding layer and extends to a surface of the light-shielding layer facing away from the substrate.
  • the touch substrate further includes an anti-reflection layer.
  • the anti-reflection layer is located between the light-shielding layer and the filter ink layer.
  • the anti-reflection layer is located in the through hole of the light-shielding layer.
  • the orthographic projection of the through hole on the base substrate is located inside the orthographic projection of the antireflection layer on the substrate.
  • the reflectivity of the anti-reflection layer is between 1% and 15%.
  • the touch area of the touch substrate includes: a touch electrode layer located on the side of the substrate; and an insulating layer located on the touch electrode layer away from the touch electrode layer.
  • the antireflection layer which is located on the surface of the insulating layer facing away from the substrate, and the orthographic projection of the antireflection layer on the substrate and the touch area and The orthographic projection of the border region on the substrate overlaps.
  • the touch area of the touch substrate includes: a touch electrode layer located on the side of the substrate; and an anti-reflection layer located on the touch electrode layer On the surface facing away from the substrate, and the orthographic projection of the anti-reflection layer on the substrate overlaps with the orthographic projection of the touch area and the frame area on the substrate; and an insulating layer, It is on the surface of the anti-reflection layer facing away from the substrate.
  • a material of the insulating layer includes a photoresist.
  • the thickness of the insulating layer is 1 ⁇ m to 3 ⁇ m.
  • a touch device including the touch substrate described above.
  • a method for manufacturing a touch substrate includes a touch area and a frame area surrounding the touch area.
  • the manufacturing method includes forming a filter sub-region in the frame region for transmitting light of a predetermined wavelength band and a light-shielding sub-region surrounding the filter sub-region.
  • the difference in brightness between the light-shielding sub-region and the filter sub-region is less than 3.6.
  • forming a filter sub-region in the frame region for transmitting light of a predetermined wavelength band and a light-shielding sub-region surrounding the filter sub-region includes: providing a substrate; in the frame region A light-shielding layer is formed on one side of the substrate, wherein the light-shielding layer is located in the light-shielding sub-region, and a through-hole is provided in the light-shielding layer at a position corresponding to the filter sub-region; and A filter ink layer is formed on a side of the light shielding layer facing away from the substrate, and an orthographic projection of the through hole on the substrate is located inside the orthographic projection of the filter ink layer on the substrate.
  • the difference in brightness between the light-shielding layer and the filter ink layer is less than 3.6.
  • the difference between the lightness of the light-shielding layer and the filter ink layer is 0.5-2.
  • the filter ink layer is formed to fill the through hole of the light-shielding layer, and extends to a surface of the light-shielding layer facing away from the substrate.
  • an anti-reflection layer is formed between the light-shielding layer and the filter ink layer, so that the anti-reflection layer is formed to fill the through-hole of the light-shielding layer, and the through The orthographic projection of the hole on the substrate is located inside the orthographic projection of the antireflection layer on the substrate.
  • the manufacturing method further includes: forming a touch electrode layer on the one side of the substrate in the touch area; and forming a touch electrode layer on the touch electrode layer facing away from the substrate. Forming an insulating layer on the surface; and forming the antireflection layer on a surface of the insulating layer facing away from the substrate, so that the orthographic projection of the antireflection layer on the substrate and the touch area and The orthographic projection of the border region on the substrate overlaps.
  • the manufacturing method further includes: forming a touch electrode layer on the side of the substrate in the touch area; and a surface of the touch electrode layer facing away from the substrate Forming the anti-reflection layer on the substrate so that the orthographic projection of the anti-reflection layer on the substrate overlaps with the orthographic projection of the touch area and the frame area on the substrate; and An opposite layer forms an insulating layer on a surface facing away from the substrate.
  • FIG. 1 is a plan view illustrating a touch substrate according to an embodiment of the present disclosure
  • FIG. 2 is a cross-sectional view of the frame region along a line AA in FIG. 1 in a case where the frame region has a first laminated structure;
  • FIG. 3 is a cross-sectional view illustrating a case where the frame region has a second laminated structure along a line AA in FIG. 1;
  • FIG. 4 is a schematic diagram illustrating a laminated structure of a touch region of a touch substrate according to an embodiment of the present disclosure
  • FIG. 5 is a schematic diagram illustrating a laminated structure of a touch area of a touch substrate according to an embodiment of the present disclosure
  • 6a is a schematic diagram showing a state where water vapor and / or dirt is formed on the surface of the anti-reflection layer in a case where the touch area has a laminated structure as shown in FIG. 4;
  • FIG. 6b is a schematic view showing a state after the water vapor and / or dirt shown in FIG. 6a is wiped;
  • FIG. 7a is a schematic diagram showing a state where water vapor and / or dirt is formed on the surface of the third insulating layer in a case where the touch area has a laminated structure as shown in FIG. 5;
  • FIG. 7b is a schematic view showing a state after the water vapor and / or dirt shown in FIG. 7a is wiped.
  • FIG. 8 is a cross-sectional view showing a bezel region and a touch region taken along a line BB shown in FIG. 1.
  • the color of the infrared filter hole is significantly different from the color of the frame of the touch screen, and the infrared filter hole cannot be hidden well.
  • FIG. 1 is a plan view illustrating a touch substrate according to an embodiment of the present disclosure.
  • the touch substrate includes a touch area TA and a border area BA surrounding the touch area TA.
  • the border area BA includes a filter sub-area IR and a filter sub-area IR for transmitting light of a predetermined wavelength band.
  • FIG. 2 is a cross-sectional view illustrating a case where the frame region has a first laminated structure along a line AA in FIG. 1.
  • the touch substrate includes a substrate 1, a light shielding layer 2 disposed on the substrate 1, and a filter ink layer 3 disposed on a side of the light shielding layer 2 facing away from the substrate 1.
  • the light shielding layer 2 and the filter ink layer 3 are both located in the frame area BA.
  • the light-shielding layer 2 is located in the light-shielding sub-region SA, and a through-hole 9 is provided at a position corresponding to the light-shielding sub-region IR.
  • the filter ink layer 3 is located on the surface of the light-shielding layer 2 facing away from the substrate 1 and is filled in the through-hole 9.
  • the orthographic projection of the filter ink layer 3 on the substrate covers at least the orthographic projection of the filter sub-region SA on the substrate, or the through-hole 9 on the substrate 1.
  • the orthographic projection is located inside the orthographic projection of the filter sub-region SA on the substrate 1.
  • the filter ink layer 3 covers only a part of the through hole 9 and the light shielding layer.
  • the difference in brightness between the light-shielding sub-region SA and the filter sub-region IR is less than 3.6.
  • the substrate 1 may be a glass substrate or a polyimide (PI) substrate; the filter ink layer 3 may cover the entire border area BA. Alternatively, the orthographic projection of the filter ink layer 3 on the substrate 1 overlaps with the orthographic projection of the entire frame area BA on the substrate.
  • the substrate 1 may be provided with a structure such as a signal line and a driving chip, and the light shielding sub-region SA is an area for shielding the structure of the signal line and the driving chip.
  • the light in the predetermined wavelength band may be infrared light having a wavelength above 800 nm, and the brightness is an L value on a brightness axis in CIE Lab color coordinates, and the range of brightness is between 0 and 100, where 0 represents black and 100 represents white , Values between 0 and 100 indicate gray.
  • the “difference in lightness” (or “difference in lightness” of two structures) in the two regions in the present disclosure means: the lightness of the first region minus the lightness of the second region (or the lightness of the first structure) The absolute value of the difference obtained by subtracting the lightness of the second structure).
  • the hue of the filter sub-region IR and the light-shielding sub-region SA are the same, that is, the a, b values of the color of the filter sub-region IR in the CIE Lab color coordinate and the light-shielding sub-region SA in the CIE Lab color coordinate The a and b values are equal or substantially equal, respectively.
  • a sensor may be located at a position corresponding to the filter sub-region IR, and the sensor is used to detect the brightness of the external environment, acquire an external image, or detect based on light transmitted through the filter sub-region IR.
  • the filter ink layer 3 may be located at least in the filter sub-region IR of the frame region BA, and is configured to filter light incident from the outside into the filter sub-region IR (or a sensor).
  • the difference in brightness between the filter ink layer and the light-shielding layer is usually greater than 3.6, and the human eye can distinguish the color difference between the filter sub-region and the light-shielding sub-region based on the difference.
  • the difference between the lightness of the light-shielding sub-region SA and the lightness of the filter-sub-region IR is less than 3.6, so it is difficult for human eyes to distinguish between the color of the light-filtering sub-region IR and the light-shielding sub-region SA.
  • the difference in color thus achieving the uniform color of the border area BA, brings a better visual experience to the user.
  • the present disclosure can make the light-shielding sub-region SA and the filter sub-region IR reach substantially the same brightness by setting the brightness of the light-shielding layer 2 to be similar to that of the filter ink layer 3.
  • the difference between the lightness of the light shielding layer 2 and the lightness of the filter ink layer 3 is less than 3.6, the difference between the lightness of the light shielding sub-region SA and the lightness of the filter sub-region IR is less than 3.6.
  • the filter ink layer 3 has a specific brightness to meet the filtering effect of the filter ink layer 3.
  • the difference between the brightness of the light shielding layer 2 and the filter ink layer 3 is too small, which will cause the brightness of the light shielding layer 2 to be large.
  • the light-shielding layer 2 in order to ensure the light-shielding effect of the light-shielding layer 2, the light-shielding layer 2 needs to be set thicker, which affects the overall thickness of the touch substrate.
  • the difference between the lightness of the light-shielding layer 2 and the lightness of the filter ink layer 3 is 0.5 to 2, which can further reduce the difference between the lightness of the filter ink layer 3 and the light-shielding layer 2.
  • the difference between the lightness of the light-shielding layer 2 and the lightness of the filter ink layer 3 is 0.5 to 2, which can not only meet the filtering effect of the filter ink layer 3, but also not cause the lightness of the light-shielding layer 2 to be too large, so
  • the light-shielding layer 2 needs to be set thick to satisfy the light-shielding effect of the light-shielding layer 2.
  • the lightness of the filter ink layer 3 is 23 to 24.5, and the lightness of the light shielding layer 2 is 24 to 25.
  • the light-shielding layer 2 has a brightness of 24.5.
  • the thickness of the light shielding layer 2 is between 1.5 ⁇ m and 2.3 ⁇ m, so as to ensure that the brightness of the light shielding layer 2 can still have a good light shielding effect after being adjusted.
  • the thickness of the light shielding layer 2 may be 2.3 ⁇ m.
  • FIG. 3 is a cross-sectional view illustrating the frame region along a line AA in FIG. 1 in a case where the frame region has a second laminated structure.
  • the lightness of the light-shielding layer 2 is greater than the lightness of the filter ink layer 3.
  • a light-shielding layer 2 and a filter ink layer 3 The anti-reflection layer 4 is used to increase the brightness of the light reflected by the filter sub-region IR, as shown in FIG. 3.
  • the antireflection layer 4 is located in the through hole 9 of the light shielding layer 2 and extends to the surface of the light shielding layer 2 facing away from the substrate 1.
  • the filter ink layer 3 is located on the surface of the antireflection layer 4 facing away from the substrate 1.
  • the anti-reflection layer 4 should not be too thick to ensure that at least a part of the light can still be irradiated from the substrate 1 side to the filter ink layer 4 and reflected by the filter ink layer 3.
  • the light shielding layer 2 and the filter ink layer 3 are both located on the side of the substrate 1 facing away from the user.
  • the lightness of the light-shielding sub-region SA is equal to the lightness of the combination of the light-shielding layer 2 and the substrate 1. This lightness is related to the intensity of the external light reflected by the light-shielding sub-region SA;
  • the brightness of the combination of the photo ink layer 3, the antireflection layer 4 and the substrate 1 is related to the intensity of the external light reflected by the filter sub-region IR.
  • the arrangement of the antireflection layer 4 is beneficial to increase the reflection of the filter sub-region IR to external light, so as to increase the brightness of the filter sub-region IR.
  • the arrangement of the antireflection layer 4 is beneficial to reduce the difference in lightness between the filter sub-region IR and the light-shielding sub-region SA.
  • the antireflection layer 4 includes any one or more of a silicon oxynitride layer, a silicon oxide layer, and a niobium pentoxide layer.
  • the reflectivity of the antireflection layer 4 is 1% to 15%, for example, 7% ⁇ 1%.
  • the antireflection layer 4 is a silicon oxynitride layer with a thickness of E.g,
  • FIG. 4 is a schematic diagram illustrating a laminated structure of a touch region of a touch substrate according to an embodiment of the present disclosure.
  • the anti-reflection layer 4 may further cover the frame area BA and the touch area TA.
  • the antireflection layer 4 is on the substrate 1 except that the orthographic projection of the antireflection layer 4 on the substrate 1 overlaps with the orthographic projection of the filter sub-region IR on the substrate 1.
  • the orthographic projection may further overlap (eg, completely overlap) the orthographic projection of the frame area BA and the touch area TA on the substrate 1.
  • the anti-reflection layer 4 in the frame area BA and the anti-reflection layer 4 in the touch area TA are integrally formed in the same step. Compared with the anti-reflection layer 4 covering only the filter sub-region IR, the anti-reflection layer 4 is configured to completely cover both the frame area BA and the touch area TA, which can reduce the manufacturing difficulty.
  • the touch substrate further includes a touch electrode layer 6 located in the touch area TA.
  • the touch electrode layer 6 is disposed between the substrate 1 and the anti-reflection layer 4.
  • the touch electrode layer 6 may include a first electrode layer 61 and a second electrode layer 62 on a side of the first electrode layer 61 facing away from the substrate 1.
  • One of the first electrode layer 61 and the second electrode layer 62 is a touch driving electrode layer, and the other is a touch sensing electrode layer.
  • a first insulating layer 5 is provided between the first electrode layer 61 and the substrate 1.
  • a second insulating layer 7 is provided between the first electrode layer 61 and the second electrode layer 62.
  • a third insulating layer 8 is disposed on a side of the second electrode layer 62 facing away from the substrate 1, and the third insulating layer 8 is located between the antireflection layer 4 and the second electrode layer 62.
  • the first insulating layer 5, the second insulating layer 7, and the third insulating layer 8 have the same material, and the thicknesses of the first insulating layer 5, the second insulating layer 7, and the third insulating layer 8 are all 2.0 ⁇ m.
  • the antireflection layer 4 is susceptible to the lower layer film during the sputtering process.
  • the effect of the layer results in the poor film formation quality of the anti-reflection layer 4, which will lead to the formation of water vapor and / or dirt on the surface of the anti-reflection layer 4 in subsequent processes. These water vapor and dirt will also penetrate the anti-reflection layer.
  • the moisture and dirt immersed in the anti-reflection layer 4 and the layers below the anti-reflection layer 4 will affect the touch electrode layer 6
  • the electrical characteristics of the formed touch capacitor make the touch capacitor in the touch substrate have poor uniformity.
  • the touch area TA of the touch substrate of the present disclosure may also adopt the stacked structure of FIG. 5.
  • the anti-reflection layer 4 covers the frame area BA and the touch area TA.
  • the orthographic projection of the antireflection layer 4 on the substrate 1 overlaps (eg, completely overlaps) the orthographic projection of the frame area BA and the touch area TA on the substrate 1.
  • a touch electrode layer 6 is disposed in the touch area TA, and the touch electrode layer 6 is disposed between the substrate 1 and the antireflection layer 4.
  • the touch electrode layer 6 may include a first electrode layer 61 and a second electrode layer 62 on a side of the first electrode layer 61 facing away from the substrate 1.
  • One of the first electrode layer 61 and the second electrode layer 62 is a touch driving electrode layer, and the other is a touch sensing electrode layer.
  • a first insulating layer 5 is provided between the first electrode layer 61 and the substrate 1.
  • a second insulating layer 7 is provided between the first electrode layer 61 and the second electrode layer 62.
  • a third insulating layer 8 is provided on a side of the second electrode layer 62 facing away from the substrate 1. Different from FIG. 4, the third insulating layer 8 in FIG. 5 is located on the side of the antireflection layer 4 facing away from the substrate 1.
  • FIG. 8 is a cross-sectional view showing a bezel region and a touch region taken along a line BB shown in FIG. 1.
  • the anti-reflection layer 4 in the frame area BA and the anti-reflection layer 4 in the touch area TA are integrally formed in the same step.
  • the anti-reflection layer is set to cover the touch area TA and the border area BA, water vapor and the like can be prevented from entering.
  • an insulation layer made at a low temperature is used, the density of the insulation layer is low, which is not conducive to blocking external water vapor. Therefore, by selecting the material of the third insulating layer 8, a good antifouling performance of the third insulating layer 8 can be achieved.
  • the moisture and dirt on the touch substrate can be reduced.
  • the third insulating layer 8 have a higher density and a larger thickness, it is possible to prevent water vapor and dirt from penetrating into the third insulating layer 8, thereby preventing water vapor and dirt from affecting the electrical properties of the touch capacitor in the touch substrate. Characteristics to ensure the uniformity of the touch capacitor. Compared with FIG. 4, when manufacturing a touch substrate having a touch region with the laminated structure shown in FIG. 5, no process steps are added.
  • the third insulating layer 8 is used as a protective layer such as a black matrix, R / G / B, and the height difference of each layer can be reduced.
  • the material of the third insulating layer 8 includes an organic material, such as a photoresist; and the thickness of the third insulating layer 8 is 1 ⁇ m to 3 ⁇ m, for example, 2 ⁇ m.
  • the materials and thicknesses of the first insulating layer 5 and the second insulating layer 7 may be the same as those of the third insulating layer 8.
  • FIG. 6 a is a schematic diagram illustrating a state where water vapor and / or dirt is formed on the surface of the anti-reflection layer in a case where the touch area has a laminated structure as shown in FIG. 4.
  • Fig. 6b is a schematic view showing a state after the water vapor and / or dirt shown in Fig. 6a is wiped.
  • FIG. 7 a is a schematic diagram illustrating a state where water vapor and / or dirt is formed on the surface of the third insulating layer in a case where the touch area has a laminated structure as shown in FIG. 5.
  • Fig. 7b is a schematic view showing a state after the water vapor and / or dirt shown in Fig. 7a is wiped. It can be seen from FIGS.
  • the 8585 reliability test is performed on the touch substrate (that is, after being left for 240 hours under the environment of a temperature of 85 ° C. ⁇ 5 ° C. and a humidity of 85 ⁇ 5% RH).
  • the test result is that the uniformity of the touch capacitor formed by the touch electrode layer 6 is good.
  • the electrodes in the touch electrode layer 6 may be metal grid electrodes; alternatively, the electrodes in the touch electrode layer 6 may be transparent electrodes such as indium tin oxide. It should be noted that the structure of the touch electrode layer 6 is not limited to the structure of the touch electrode layer 6 in FIGS. 4 and 5. For example, the touch electrode layer 6 is a single-layer self-capacitive electrode layer.
  • Table 1 is a comparison of the optical performance of the related art touch substrate with the optical performance of the touch substrate of the present disclosure.
  • “Structure 1” refers to a touch substrate in which the frame area BA has a structure shown in FIG. 3 and the touch area TA has a laminated structure shown in FIG. 4 according to an embodiment of the present disclosure.
  • “Structure 2” refers to a touch substrate in which the frame area BA has a structure shown in FIG. 3 and the touch area TA has a laminated structure shown in FIG. 5 according to an embodiment of the present disclosure.
  • the color consistency test (or integrated color test) is used to test the similarity of the colors of the filter sub-region IR and the light-shielding sub-region SA.
  • LV1 to LV5 indicate the level of color difference between the filter sub-region IR and the light-shielding sub-region SA, where LV1 indicates the closest color and LV5 indicates the maximum color difference.
  • ⁇ L represents the difference between the brightness of the filter sub-region IR and the light-shielding sub-region SA.
  • the touch substrates of Structure 1 and Structure 2 can reduce the brightness difference between the filter sub-region IR and the light-shielding sub-region SA, so it is difficult for the human eye to detect the color difference between the filter sub-region IR and the light-shielding sub-region SA , So that the color of the border area BA is consistent.
  • the structures 1 and 2 of the present disclosure have substantially no influence on the transmittance, reflectance, and haze of the touch area TA.
  • An embodiment of the present disclosure provides a touch device, which includes the touch substrate described above.
  • the touch device further includes a sensor corresponding to the filter sub-region, and the sensor is located on a side of the filter ink layer 3 facing away from the substrate 1.
  • the sensor may be a camera, a light sensor, a distance sensor, or the like.
  • the touch device further includes a display panel, the touch substrate is located on a light emitting side of the display panel, and a touch area of the touch substrate Corresponds to the display area of the display panel, and the frame area of the touch substrate corresponds to the non-display area of the display panel.
  • the frame area of the touch substrate according to the embodiment of the present disclosure can achieve consistent color. Therefore, in a touch device having the touch substrate, the filter sub-area can be well hidden, thereby bringing a good visual experience to the user.
  • the insulating layer is disposed outside the anti-reflection layer, which is beneficial for removing water vapor and dirt on the surface of the insulating layer, thereby ensuring the contact without increasing the process steps.
  • the uniformity of the controlled capacitor ensures the touch effect of the touch device.
  • An embodiment of the present disclosure provides a method for manufacturing a touch substrate, wherein the touch substrate includes a touch area TA and a frame area BA surrounding the touch area TA.
  • the manufacturing method of the touch substrate includes forming a filter sub-region IR for transmitting light of a predetermined wavelength band and a light-shielding sub-region SA surrounding the filter sub-region IR in the frame region BA.
  • the difference in brightness between the light-shielding sub-region and the filter sub-region IR is less than 3.6.
  • a light-shielding layer 2 is formed on one side of the substrate 1 in the frame region BA, and the light-shielding layer 2 is located in the light-shielding sub-region SA.
  • a through hole 9 is provided in the light shielding layer 2 at a position corresponding to the filter sub-region IR.
  • a filter ink layer 3 is formed on a side of the light shielding layer 2 facing away from the substrate 1, and an orthographic projection of the filter ink layer 3 on the substrate 1 is at least equal to that of the filter sub-region IR.
  • the orthographic projection on the substrate 1 overlaps.
  • the orthographic projection of the through hole 9 on the substrate 1 is located inside the orthographic projection of the filter sub-region IR on the substrate 1.
  • the difference in brightness between the light-shielding layer 2 and the filter ink layer 3 is less than 3.6.
  • the difference in brightness between the light-shielding layer 2 and the filter ink layer 3 is 0.5 to 2.
  • the lightness of the filter ink layer 3 is 23 to 24.5, and the lightness of the light shielding layer 2 is 24 to 25.
  • the thickness of the light shielding layer is 1.5 ⁇ m to 2.3 ⁇ m.
  • the filter ink layer 3 is formed to fill the through-hole 9 of the light-shielding layer 2 and extends to a surface of the light-shielding layer 2 facing away from the substrate 1.
  • an anti-reflection layer 4 is formed between the light-shielding layer 2 and the filter ink layer 3 so that the anti-reflection layer 4 is formed to fill the through-hole 9 of the light-shielding layer 2.
  • the orthographic projection of the antireflection layer 4 on the substrate 1 overlaps with the orthographic projection of the frame region BA on the substrate 1.
  • the reflectivity of the anti-reflection layer 4 is between 1% and 15%.
  • a touch electrode layer 6 including a first electrode layer 61 and a second electrode layer 62 is formed on the one side of the substrate 1 in the touch area TA.
  • An insulating layer 8 is formed on a surface of the touch electrode layer 6 facing away from the substrate 1.
  • the anti-reflection layer 4 is formed on a surface of the insulating layer 8 facing away from the substrate 1.
  • the material of the insulating layer 8 includes a photoresist.
  • the thickness of the insulating layer is 1 ⁇ m to 3 ⁇ m.
  • a touch electrode layer 6 including a first electrode layer 61 and a second electrode layer 62 is formed on the one side of the substrate 1 in the touch area TA.
  • the anti-reflection layer 4 is formed on a surface of the touch electrode layer 6 facing away from the substrate 1.
  • An insulating layer 8 is formed on a surface of the antireflection layer 4 facing away from the substrate 1.
  • the touch substrate manufactured by the method for manufacturing a touch substrate according to the embodiment of the present disclosure can well hide the filter sub-region IR in the frame region, thereby bringing a good visual experience to the user.
  • the insulating layer is disposed outside the anti-reflection layer, which is beneficial for removing water vapor and dirt on the surface of the insulating layer, thereby ensuring that without increasing the number of process steps.
  • the uniformity of the touch capacitor ensures the touch effect of the touch substrate.

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Abstract

本公开提供一种触控基板及其制造方法和触控装置。触控基板包括触控区和围绕所述触控区的边框区，所述边框区包括用于透过预定波段的光线的滤光子区和围绕所述滤光子区的遮光子区，所述遮光子区与所述滤光子区的明度之差小于3.6。

Description

触控基板及其制造方法和触控装置
相关申请的交叉引用
本公开要求2018年7月27日提交给中国专利局的第201810847392.3号中国专利申请的优先权，其全部内容通过引用合并于此。
技术领域
本公开涉及触控技术领域，具体涉及一种触控基板及其制造方法和触控装置。
背景技术
随着科技发展，触摸屏的应用越来越广。触控屏的边框通常设置有红外滤波(Infrared filtering，IR)孔，该红外滤波孔中设置有距离传感器或光线传感器，以利用红外线来检测距离或外界环境的亮度。人们对触控屏的外观要求越来越高，触控屏的边框处的红外滤波孔的颜色需要与触控屏的边缘的颜色一致，从而较好地隐藏红外滤波孔。
发明内容
根据本公开的一个方面，提供一种触控基板，包括触控区和围绕所述触控区的边框区，所述边框区包括用于透过预定波段的光线的滤光子区和围绕所述滤光子区的遮光子区。所述遮光子区与所述滤光子区的明度之差小于3.6。
在一个实施例中，所述触控基板的所述边框区包括衬底、位于所述衬底上的遮光层和滤光油墨层。所述遮光层位于所述遮光子区，并且所述遮光层中的与所述滤光子区相对应的位置处设置有通孔。所述滤光油墨层位于所述遮光层背离所述衬底的一侧，并且所述通孔在所述衬底基板上的正投影位于所述滤光油墨层在所述衬底上的正投影的内部。所述遮光层与所述滤光油墨层的明度之差小于3.6。
在一个实施例中，所述遮光层与所述滤光油墨层的明度之差在0.5～2。
在一个实施例中，所述滤光油墨层的明度在23～24.5，所述遮光层的明度在24～25。
在一个实施例中，所述遮光层的厚度在1.5μm～2.3μm。
在一个实施例中，所述滤光油墨层位于所述遮光层的所述通孔中，并且延伸至所述遮光层背离所述衬底的表面上。
在一个实施例中，所述触控基板还包括增反层。所述增反层位于所述遮光层与所述滤光油墨层之间。所述增反层位于在所述遮光层的所述通孔中。所述通孔在所述衬底基板上的正投影位于所述增反层在所述衬底上的正投影的内部。
在一个实施例中，所述增反层的反射率在1％～15％。
在一个实施例中，所述触控基板的所述触控区包括：触控电极层，其位于所述衬底的所述一侧；绝缘层，其位于所述触控电极层背离所述衬底的表面上；并且所述增反层，其位于所述绝缘层背离所述衬底的表面上，并且所述增反层在所述衬底上的正投影与所述触控区和所述边框区在所述衬底上的正投影重叠。
在一个实施例中，所述触控基板的所述触控区包括：触控电极层，其位于所述衬底的所述一侧；所述增反层，其位于所述触控电极层背离所述衬底的表面上，并且所述增反层在所述衬底上的正投影与所述触控区和所述边框区在所述衬底上的正投影重叠；并且绝缘层，其位于所述增反层背离所述衬底的表面上。
在一个实施例中，所述绝缘层的材料包括光刻胶。
在一个实施例中，所述绝缘层的厚度在1μm～3μm。
根据本公开的一个方面，提供一种触控装置，包括上述触控基板。
根据本公开的一个方面，提供一种触控基板的制造方法。所述触控基板包括触控区和围绕所述触控区的边框区。所述制作方法包括：在所述边框区中形成用于透过预定波段的光线的滤光子区和围绕所述滤光子区的遮光子区。所述遮光子区与所述滤光子区的明度之差小于3.6。
在一个实施例中，所述在所述边框区中形成用于透过预定波段 的光线的滤光子区和围绕所述滤光子区的遮光子区包括：提供衬底；在所述边框区中的衬底的一侧形成遮光层，其中所述遮光层位于所述遮光子区中，并且在所述遮光层中的与所述滤光子区相对应的位置处设置有通孔；以及在所述遮光层背离所述衬底的一侧形成滤光油墨层，并且所述通孔在所述衬底上的正投影位于所述滤光油墨层在所述衬底上的正投影的内部。所述遮光层与所述滤光油墨层的明度之差小于3.6。
在一个实施例中，所述遮光层与所述滤光油墨层的明度之差在0.5～2。
在一个实施例中，所述滤光油墨层形成为填充在所述遮光层的所述通孔中，并且延伸至所述遮光层背离所述衬底的表面上。
在一个实施例中，在所述遮光层与所述滤光油墨层之间形成增反层，使得所述增反层形成为填充在所述遮光层的所述通孔中，并且所述通孔在所述衬底上的正投影位于所述增反层在所述衬底上的正投影的内部。
在一个实施例中，所述制造方法还包括：在所述触控区中的所述衬底的所述一侧形成触控电极层；在所述触控电极层的背离所述衬底的表面上形成绝缘层；以及在所述绝缘层的背离所述衬底的表面上形成所述增反层，使得所述增反层在所述衬底上的正投影与所述触控区和所述边框区在所述衬底上的正投影重叠。
在一个实施例中，所述制造方法还包括：在所述触控区中的所述衬底的所述一侧形成触控电极层；在所述触控电极层背离所述衬底的表面上形成所述增反层，使得所述增反层在所述衬底上的正投影与所述触控区和所述边框区在所述衬底上的正投影重叠；以及在所述增反层背离所述衬底的表面上形成绝缘层。
附图说明
附图是用来提供对本公开的进一步理解，并且构成说明书的一部分，与下面的具体实施方式一起用于解释本公开，但并不构成对本公开的限制。在附图中：
图1是示出根据本公开实施例的触控基板的俯视图；
图2是示出在边框区具有第一叠层结构的情况下，边框区沿图1中AA线的剖示图；
图3是示出在边框区具有第二叠层结构的情况下，边框区沿图1中AA线的剖示图；
图4是示出根据本公开实施例的触控基板的触控区的叠层结构的示意图；
图5是示出根据本公开实施例的触控基板的触控区的叠层结构的示意图；
图6a是示出触控区具有如图4所示的叠层结构的情况下，增反层的表面上形成水汽和/或脏污的状态的示意图；
图6b是示出如图6a所示的水汽和/或脏污被擦拭后的状态的示意图；
图7a是示出触控区具有如图5所示的叠层结构的情况下，第三绝缘层的表面上形成水汽和/或脏污的状态的示意图；
图7b是示出如图7a所示的水汽和/或脏污被擦拭后的状态的示意图；以及
图8是沿图1所示的线BB截取的示出了边框区和触控区的截面图。
具体实施方式
以下结合附图对本公开的具体实施方式进行详细说明。应当理解的是，此处所描述的具体实施方式仅用于说明和解释本公开，并不用于限制本公开。
在目前的触控屏中，红外滤波孔的颜色与触控屏的边框的颜色差异较明显，不能够较好地隐藏红外滤波孔。
图1是示出根据本公开实施例的触控基板的俯视图。如图1所示，所述触控基板包括触控区TA和围绕触控区TA的边框区BA，边框区BA包括用于透过预定波段的光线的滤光子区IR和围绕滤光子区IR的遮光子区SA。图2是示出在边框区具有第一叠层结构的情 况下，边框区沿图1中AA线的剖示图。如图2所示，所述触控基板包括衬底1、设置在衬底1上的遮光层2和设置在遮光层2背离衬底1一侧的滤光油墨层3。遮光层2和滤光油墨层3均位于边框区BA。遮光层2位于遮光子区SA，遮光层2与滤光子区IR相对应的位置处设置有通孔9。滤光油墨层3位于遮光层2背离衬底1的表面上并且填充在通孔9中。在一个实施例中，滤光油墨层3在所述衬底上的正投影至少覆盖滤光子区SA在所述衬底上的正投影，或者所述通孔9在所述衬底1上的正投影位于所述滤光子区SA在所述衬底1上的正投影的内部。滤光油墨层3仅覆盖通孔9和遮光层的一部分。遮光子区SA与滤光子区IR的明度之差小于3.6。
衬底1可以采用玻璃衬底或者聚酰亚胺(PI)衬底；滤光油墨层3可以覆盖整个边框区BA。可替换地，滤光油墨层3在所述衬底1上的正投影与整个边框区BA在所述衬底上的正投影重叠。衬底1上可以设置有信号线和驱动芯片等结构，遮光子区SA为用于遮挡信号线和驱动芯片等结构的区域。所述预定波段的光线可以为波长在800nm以上的红外线，所述明度为CIE Lab色坐标中的亮度轴上的L值，明度的范围在0与100之间，其中0表示黑色，100表示白色，0-100之间的数值表示灰色。
需要说明的是，本公开中两个区域的“明度之差”(或两个结构的“明度之差”)表示：第一区域的明度减去第二区域的明度(或第一结构的明度减去第二结构的明度)得到的差的绝对值。另外需要说明的是，滤光子区IR和遮光子区SA的色调是一致的，即，滤光子区IR的颜色在CIE Lab色坐标中的a、b值与遮光子区SA在CIE Lab色坐标中的a、b值分别相等或基本相等。
在具有触控基板的手机等电子设备中，传感器可以位于与滤光子区IR相对应的位置，所述传感器用于根据透过滤光子区IR的光线来检测外界环境的亮度、获取外部图像或者检测用户与触控基板的距离。滤光油墨层3可以至少位于边框区BA的滤光子区IR中，以用于对从外界入射至滤光子区IR(或传感器)的光进行滤光。
在目前的触控基板中，滤波油墨层与遮光层的明度的差异通常 大于3.6，人眼能够基于该差异分辨出滤光子区和遮光子区在颜色上的不同。然而，在根据本公开实施例的触控基板中，遮光子区SA的明度与滤光子区IR的明度之差小于3.6，因此人眼难以分辨出滤光子区IR和遮光子区SA在颜色上的差异，进而实现边框区BA的颜色统一，带给用户更好的视觉体验。
在一个实施例中，本公开可以通过将遮光层2的明度设置为与滤光油墨层3的明度相近，来使得遮光子区SA与滤光子区IR达到基本相同的明度。
根据本公开的实施例，因为遮光层2的明度与滤光油墨层3的明度之差小于3.6，所以遮光子区SA的明度与滤光子区IR的明度之差小于3.6。
通常滤光油墨层3具有特定的明度，以满足滤光油墨层3的滤光效果；遮光层2与滤光油墨层3的明度之差过小会导致遮光层2的明度较大，在这种情况下，为了保证遮光层2的遮光效果，则需要将遮光层2设置得较厚，影响了触控基板的整体厚度。为了防止这一现象，在一个实施例中，遮光层2的明度与滤光油墨层3的明度之差在0.5～2，这样可以进一步减小滤光油墨层3与遮光层2的明度之差；此外，遮光层2的明度与滤光油墨层3的明度之差在0.5～2，不仅能够满足滤光油墨层3的滤光效果，也不会导致遮光层2的明度过大，因此不需要将遮光层2设置得较厚以满足遮光层2的遮光效果。
例如，滤光油墨层3的明度在23～24.5，遮光层2的明度在24～25。例如，遮光层2的明度为24.5。
在一个实施例中，遮光层2的厚度在1.5μm～2.3μm，以保证遮光层2的明度被调整后仍能够具有良好的遮光效果。例如，遮光层2的厚度可以为2.3μm。
图3是示出在边框区具有第二叠层结构的情况下，边框区沿图1中AA线的剖示图。通常遮光层2的明度大于滤光油墨层3的明度，在这种情况下，为了进一步减少滤光子区IR和遮光子区SA的颜色差异，在遮光层2与滤光油墨层3之间设置增反层4，用于增大滤光子区IR所反射的光线的亮度，如图3所示。增反层4位于遮光层2 的所述通孔9中并且延伸至遮光层2背离衬底1的表面上。滤光油墨层3位于所述增反层4的背离衬底1的表面上。
需要说明的是，增反层4不应过厚，以保证至少一部分光线仍能够从衬底1侧照射至滤光油墨层4，并被滤光油墨层3反射。
在具有所述触控基板的电子设备中，遮光层2和滤光油墨层3均位于衬底1背离用户的一侧。从用户的角度观看，遮光子区SA的明度等于遮光层2和衬底1的组合的明度，该明度与遮光子区SA所反射的外界光线的强弱有关；滤光子区IR的明度等于滤光油墨层3、增反层4和衬底1的组合的明度，该明度与滤光子区IR所反射的外界光线的强弱有关。增反层4的设置有利于增加滤光子区IR对外界光线的反射，以增加滤光子区IR的明度。在滤光油墨层3的明度小于遮光层2的明度的情况下，增反层4的设置有利于减小滤光子区IR与遮光子区SA的明度差异。
通过设置增反层4的反射率和厚度，可以使滤光子区IR和遮光子区SA的明度更加趋于一致。在一个实施例中，增反层4包括氮氧化硅层、氧化硅层和五氧化二铌层中的任意一个或多个。在一个实施例中，增反层4的反射率在1％～15％，例如，7％±1％。在一个实施例中，增反层4为氮氧化硅层，厚度在
Figure PCTCN2019097132-appb-000001
例如，
Figure PCTCN2019097132-appb-000002
图4是示出根据本公开实施例的触控基板的触控区的叠层结构的示意图。如图3和图4所示，除了增反层4被设置为与所述滤光子区IR重叠以外，增反层4可以进一步覆盖边框区BA和触控区TA。可替换地，除了增反层4被设置为其在衬底1上的正投影与所述滤光子区IR在所述衬底1上的正投影重叠以外，增反层4在衬底1上的正投影可以进一步与边框区BA和触控区TA在衬底1上的正投影重叠(例如，完全重叠)。在一个实施例中，边框区BA中的增反层4和触控区TA中的增反层4在同一步骤中一体形成。与增反层4仅覆盖滤光子区IR相比，增反层4被设置为完全覆盖边框区BA和触控区TA二者，可以降低制造难度。
所述触控基板还包括位于触控区TA的触控电极层6，触控电极层6设置在衬底1与增反层4之间。触控电极层6可以包括第一电极 层61和位于第一电极层61背离衬底1一侧的第二电极层62。第一电极层61和第二电极层62中的一者为触控驱动电极层，另一者为触控感应电极层。第一电极层61与衬底1之间设置有第一绝缘层5。第一电极层61与第二电极层62之间设置有第二绝缘层7。第二电极层62背离衬底1的一侧设置有第三绝缘层8，第三绝缘层8位于增反层4与第二电极层62之间。第一绝缘层5、第二绝缘层7和第三绝缘层8具有相同的材料，第一绝缘层5、第二绝缘层7和第三绝缘层8的厚度均为2.0μm。
当触控基板的触控区TA采用图4所示的结构(在该结构中增反层4被设置为最外层)的情况下，由于增反层4在溅射过程中容易受到下层膜层的影响，导致增反层4的成膜质量较差，这会导致在后续工艺，增反层4的表面上容易形成水汽和/或脏污，这些水汽和脏污还会渗透到增反层4及其下方的各层中。经过擦拭后仅能去除增反层4的表面的一部分水汽和脏污，而浸入到增反层4内以及增反层4下方的各层中的水汽和脏污会影响由触控电极层6所形成的触控电容的电学特性，使得触控基板中的触控电容的均一性较差。
为了防止这一现象，本公开的触控基板的触控区TA还可以采用图5的叠层结构，如图3和图5所示，增反层4覆盖边框区BA和触控区TA。可替换地，增反层4在衬底1上的正投影与边框区BA和触控区TA在衬底1上的正投影重叠(例如，完全重叠)。触控区TA中设置有触控电极层6，触控电极层6设置在衬底1与增反层4之间。触控电极层6可以包括第一电极层61和位于第一电极层61背离衬底1一侧的第二电极层62。第一电极层61和第二电极层62中的一者为触控驱动电极层，另一者为触控感应电极层。第一电极层61与衬底1之间设置有第一绝缘层5。第一电极层61与第二电极层62之间设置有第二绝缘层7。第二电极层62背离衬底1的一侧设置有第三绝缘层8。与图4不同的是，图5中的第三绝缘层8位于增反层4背离衬底1的一侧。
图8是沿图1所示的线BB截取的示出了边框区和触控区的截面图。参照图8，边框区BA中的增反层4和触控区TA中的增反层4 在同一步骤中一体形成。在增反层被设置为覆盖触控区TA和边框区BA的情况下，可以避免水汽等进入。然而，如果采用低温制作的绝缘层，会导致绝缘层的致密性低，从而不利于阻挡外界的水汽。因此，通过选择第三绝缘层8的材料，可以实现第三绝缘层8的良好的防污性能。在第三绝缘层8的保护作用下，即使增反层4的成膜质量较差，也能够减少触控基板上的水汽和脏污。通过使第三绝缘层8具有较高的致密度和较大的厚度，可以防止水汽和脏污渗透至第三绝缘层8，从而防止水汽和脏污影响触控基板中的触控电容的电学特性，保证触控电容的均一性。和图4相比，在制造具有图5所示的层叠结构的触控区的触控基板时，不会增加工艺步骤。
在一个实施例中，第三绝缘层8用作例如黑矩阵、R/G/B的保护层，此外还可以降低各层的高度差。第三绝缘层8的材料包括有机材料，例如光刻胶；第三绝缘层8的厚度在1μm～3μm，例如，2μm。第一绝缘层5和第二绝缘层7的材料和厚度可以均与第三绝缘层8相同。
图6a是示出触控区具有如图4所示的叠层结构的情况下，在增反层的表面上形成水汽和/或脏污的状态的示意图。图6b是示出如图6a所示的水汽和/或脏污被擦拭后的状态的示意图。图7a是示出触控区具有如图5所示的叠层结构的情况下，第三绝缘层的表面上形成水汽和/或脏污的状态的示意图。图7b是示出如图7a所示的水汽和/或脏污被擦拭后的状态的示意图。从图6a至图7b可以看出，当触控区TA采用图4的叠层结构时，增反层4的表面容易产生较多的水汽和脏污10。如图6a所示；增反层4的表面经过擦拭后，仍有部分水汽和脏污10，如图6b所示。当触控区TA采用图5的叠层结构时，如图7a所示，残留在第三绝缘层8的表面上的水汽和脏污10相对于图6a较少；第三绝缘层8的表面经过擦拭后，基本无水汽和脏污，如图7b所示。当触控区TA采用图5的叠层结构时，对触控基板进行8585信赖性测试(即，在温度为85℃±5℃、湿度为85±5％RH环境下，放置240小时)后，测试结果是：由触控电极层6形成的触控电容的均一性良好。
在图4和图5中，触控电极层6中的电极可以采用金属网格电极；可替换地，触控电极层6中的电极可以采用氧化铟锡等透明电极。需要注意的是，触控电极层6的结构不限于图4和图5中的触控电极层6的结构。例如，触控电极层6为单层的自容式电极层。
表1是相关技术的触控基板的光学性能与本公开的触控基板的光学性能的比较。“结构1”是指根据本公开实施例的边框区BA具有图3所示的结构、且触控区TA具有图4所示的叠层结构的触控基板。“结构2”是指根据本公开实施例的边框区BA具有图3所示的结构、且触控区TA具有图5所示的叠层结构的触控基板。颜色一致性测试(或一体色测试)用于测试滤光子区IR和遮光子区SA的颜色的相近程度。LV1至LV5表示滤光子区IR和遮光子区SA的颜色差异的级别，其中LV1表示颜色最相近，LV5表示颜色相差最大。ΔL表示滤光子区IR与遮光子区SA的明度之差。
表1
Figure PCTCN2019097132-appb-000003
由表1可以看出，结构1和结构2的触控基板均能够减小滤光子区IR和遮光子区SA的明度差异，因此人眼难以察觉滤光子区IR和遮光子区SA的颜色差异，从而实现边框区BA的颜色一致。此外，本公开的结构1和2对触控区TA的透过率、反射率和雾度基本无影响。
本公开实施例提供一种触控装置，该触控装置包括上述触控基板。所述触控装置还包括与滤光子区对应的传感器，所述传感器位于滤光油墨层3背离衬底1的一侧。所述传感器可以为摄像头、光线传 感器、距离传感器等。
为了使得所述触控装置具备触控功能和显示功能二者，所述触控装置还包括显示面板，所述触控基板位于所述显示面板的出光侧，所述触控基板的触控区与显示面板的显示区对应，触控基板的边框区与显示面板的非显示区对应。
根据本公开实施例的触控基板的边框区能够实现颜色一致，因此，在具有所述触控基板的触控装置中，能够很好地隐藏滤光子区，从而带给用户良好的视觉体验。此外，在所述触控基板的触控区中，将绝缘层设置在增反层的外侧，有利于去除绝缘层的表面上的水汽和脏污，从而在不增加工艺步骤的同时，保证触控电容的均一性，保证触控装置的触控效果。
本公开实施例提供一种触控基板的制造方法，其中所述触控基板包括触控区TA和围绕所述触控区TA的边框区BA。所述触控基板的制作方法包括：在所述边框区BA中形成用于透过预定波段的光线的滤光子区IR和围绕所述滤光子区IR的遮光子区SA。所述遮光子区与所述滤光子区IR的明度之差小于3.6。
在所述边框区BA中的衬底1的一侧形成遮光层2，并且所述遮光层2位于所述遮光子区SA中。在所述遮光层2中的与所述滤光子区IR相对应的位置处设置有通孔9。在所述遮光层2背离所述衬底1的一侧形成滤光油墨层3，并且所述滤光油墨层3在所述衬底1上的正投影至少与所述滤光子区IR在所述衬底1上的正投影重叠。在一个实施例中，所述通孔9在所述衬底1上的正投影位于所述滤光子区IR在所述衬底1上的正投影的内部。所述遮光层2与所述滤光油墨层3的明度之差小于3.6。例如，所述遮光层2与所述滤光油墨层3的明度之差在0.5～2。在一个实施例中，所述滤光油墨层3的明度在23～24.5，所述遮光层2的明度在24～25。在一个实施例中，所述遮光层的厚度在1.5μm～2.3μm。
在一个实施例中，所述滤光油墨层3形成为填充在所述遮光层2的所述通孔9中，并且延伸至所述遮光层2背离所述衬底1的表面上。
在一个实施例中，在所述遮光层2与所述滤光油墨层3之间形 成增反层4，使得所述增反层4形成为填充在所述遮光层2的所述通孔9中，并且所述增反层4在所述衬底1上的正投影与所述边框区BA在所述衬底1上的正投影重叠。在一个实施例中，所述增反层4的反射率在1％～15％。
在一个实施例中，在所述触控区TA中的所述衬底1的所述一侧形成包括第一电极层61和第二电极层62的触控电极层6。在所述触控电极层6的背离所述衬底1的表面上形成绝缘层8。在所述绝缘层8的背离所述衬底1的表面上形成所述增反层4。所述绝缘层8的材料包括光刻胶。所述绝缘层的厚度在1μm～3μm。
在一个实施例中，在所述触控区TA中的所述衬底1的所述一侧形成包括第一电极层61和第二电极层62的触控电极层6。在所述触控电极层6背离所述衬底1的表面上形成所述增反层4。在所述增反层4背离所述衬底1的表面上形成绝缘层8。
根据本公开实施例的触控基板的制造方法制造的触控基板能够很好地隐藏边框区中的滤光子区IR，从而带给用户良好的视觉体验。此外，在所述触控基板的触控区中，将绝缘层设置在增反层的外侧，有利于去除绝缘层的表面上的水汽和脏污，从而在不增加工艺步骤的情况下，保证触控电容的均一性，保证触控基板的触控效果。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本公开的保护范围。

Claims (20)

  1. 一种触控基板，包括触控区和围绕所述触控区的边框区，所述边框区包括用于透过预定波段的光线的滤光子区和围绕所述滤光子区的遮光子区，其中
    所述遮光子区与所述滤光子区的明度之差小于3.6。
  2. 根据权利要求1所述的触控基板，其中，所述触控基板的所述边框区包括衬底、位于所述衬底上的遮光层和滤光油墨层，
    所述遮光层位于所述遮光子区，并且所述遮光层中的与所述滤光子区相对应的位置处设置有通孔，并且
    所述滤光油墨层位于所述遮光层背离所述衬底的一侧，并且所述通孔在所述衬底上的正投影位于所述滤光油墨层在所述衬底上的正投影的内部，其中
    所述遮光层与所述滤光油墨层的明度之差小于3.6。
  3. 根据权利要求2所述的触控基板，其中，所述遮光层与所述滤光油墨层的明度之差在0.5～2。
  4. 根据权利要求2所述的触控基板，其中，所述滤光油墨层的明度在23～24.5之间，所述遮光层的明度在24～25。
  5. 根据权利要求4所述的触控基板，其中，所述遮光层的厚度在1.5μm～2.3μm。
  6. 根据权利要求2至5中任意一项所述的触控基板，其中，
    所述滤光油墨层位于所述遮光层的所述通孔中，并且延伸至所述遮光层背离所述衬底的表面上。
  7. 根据权利要求2至5中任意一项所述的触控基板，还包括增 反层，
    所述增反层位于所述遮光层与所述滤光油墨层之间，
    所述增反层至少位于在所述遮光层的所述通孔中，并且
    所述通孔在所述衬底基板上的正投影位于所述增反层在所述衬底上的正投影的内部。
  8. 根据权利要求7所述的触控基板，其中，所述增反层的反射率在1％～15％。
  9. 根据权利要求7或8所述的触控基板，其中，所述触控基板的所述触控区包括：
    触控电极层，其位于所述衬底的所述一侧；
    绝缘层，其位于所述触控电极层背离所述衬底的表面上；并且所述增反层，其位于所述绝缘层背离所述衬底的表面上，并且所述增反层在所述衬底上的正投影与所述触控区和所述边框区在所述衬底上的正投影重叠。
  10. 根据权利要求7或8所述的触控基板，其中，所述触控基板的所述触控区包括：
    触控电极层，其位于所述衬底的所述一侧；
    所述增反层，其位于所述触控电极层背离所述衬底的表面上，并且所述增反层在所述衬底上的正投影与所述触控区和所述边框区在所述衬底上的正投影重叠；并且
    绝缘层，其位于所述增反层背离所述衬底的表面上。
  11. 根据权利要求9或10所述的触控基板，其中，
    所述绝缘层的材料包括光刻胶。
  12. 根据权利要求11所述的触控基板，其中，所述绝缘层的厚度在1μm～3μm。
  13. 一种触控装置，包括权利要求1至12中任意一项所述的触控基板。
  14. 一种触控基板的制造方法，其中所述触控基板包括触控区和围绕所述触控区的边框区，所述制作方法包括：
    在所述边框区中形成用于透过预定波段的光线的滤光子区和围绕所述滤光子区的遮光子区，其中
    所述遮光子区与所述滤光子区的明度之差小于3.6。
  15. 根据权利要求14所述的制造方法，其中，所述在所述边框区中形成用于透过预定波段的光线的滤光子区和围绕所述滤光子区的遮光子区包括：
    提供衬底；
    在所述边框区中的衬底的一侧形成遮光层，其中所述遮光层位于所述遮光子区中，并且在所述遮光层中的与所述滤光子区相对应的位置处设置有通孔；以及
    在所述遮光层背离所述衬底的一侧形成滤光油墨层，并且所述通孔在所述衬底基板上的正投影位于所述滤光油墨层在所述衬底上的正投影的内部，其中
    所述遮光层与所述滤光油墨层的明度之差小于3.6。
  16. 根据权利要求15所述的制造方法，其中，所述遮光层与所述滤光油墨层的明度之差在0.5～2。
  17. 根据权利要求15或16所述的制造方法，其中
    所述滤光油墨层形成为填充在所述遮光层的所述通孔中，并且延伸至所述遮光层背离所述衬底的表面上。
  18. 根据权利要求15或16所述的制造方法，还包括：
    在所述遮光层与所述滤光油墨层之间形成增反层，使得所述增反层形成为填充在所述遮光层的所述通孔中，并且所述通孔在所述衬底基板上的正投影位于所述增反层在所述衬底上的正投影的内部。
  19. 根据权利要求18所述的制造方法，还包括：
    在所述触控区中的所述衬底的所述一侧形成触控电极层；
    在所述触控电极层的背离所述衬底的表面上形成绝缘层；以及
    在所述绝缘层的背离所述衬底的表面上形成所述增反层，使得所述增反层在所述衬底上的正投影与所述触控区和所述边框区在所述衬底上的正投影重叠。
  20. 根据权利要求18所述的制造方法，还包括：
    在所述触控区中的所述衬底的所述一侧形成触控电极层；
    在所述触控电极层背离所述衬底的表面上形成所述增反层，使得所述增反层在所述衬底上的正投影与所述触控区和所述边框区在所述衬底上的正投影重叠；以及
    在所述增反层背离所述衬底的表面上形成绝缘层。
PCT/CN2019/097132 2018-07-27 2019-07-22 触控基板及其制造方法和触控装置 WO2020020103A1 (zh)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112380964A (zh) * 2020-11-11 2021-02-19 京东方科技集团股份有限公司 光电检测基板和显示装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112306295B (zh) * 2020-10-28 2024-01-23 京东方科技集团股份有限公司 一种显示模组及其制作方法、显示装置
US20240118135A1 (en) * 2022-10-07 2024-04-11 Dell Products L.P. Infrared alignment marker for display assembly

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017097042A (ja) * 2015-11-19 2017-06-01 日本電気硝子株式会社 ディスプレイ用保護部材及びこれを用いた携帯端末
CN206490707U (zh) * 2017-03-02 2017-09-12 广东欧珀移动通信有限公司 显示屏以及电子设备
CN107241466A (zh) * 2017-05-04 2017-10-10 广东欧珀移动通信有限公司 显示装置及移动终端
CN107637062A (zh) * 2015-05-13 2018-01-26 苹果公司 具有可调整漫射的光源模块

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8031174B2 (en) * 2007-01-03 2011-10-04 Apple Inc. Multi-touch surface stackup arrangement
KR101458569B1 (ko) * 2008-03-13 2014-11-12 삼성디스플레이 주식회사 표시 장치
CN202649968U (zh) * 2012-05-29 2013-01-02 深圳莱宝高科技股份有限公司 触控面板
TWI476454B (zh) * 2013-05-16 2015-03-11 Au Optronics Corp 觸控顯示面板
CN203520357U (zh) * 2013-05-30 2014-04-02 胜华科技股份有限公司 触控板
CN103442101A (zh) * 2013-08-01 2013-12-11 业成光电（深圳）有限公司 电子装置、电子装置的外壳及其制造方法
CN203423865U (zh) * 2013-08-01 2014-02-05 业成光电（深圳）有限公司 电子装置的外壳及电子装置
CN107678598B (zh) * 2014-12-02 2020-07-03 Oppo广东移动通信有限公司 触控显示屏结构及其制造方法及终端
CN104765505B (zh) 2015-05-04 2018-11-09 合肥鑫晟光电科技有限公司 一种触控显示面板、制造方法和显示装置
US20170255816A1 (en) * 2015-09-17 2017-09-07 Lenovo (Beijing) Limited Electronic device and fingerprint recognition device
KR102516344B1 (ko) * 2016-06-21 2023-04-03 삼성전자주식회사 커버 윈도우 및 이를 포함하는 전자 장치
CN206618919U (zh) * 2017-01-19 2017-11-07 合肥鑫晟光电科技有限公司 一种触控基板及显示装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107637062A (zh) * 2015-05-13 2018-01-26 苹果公司 具有可调整漫射的光源模块
JP2017097042A (ja) * 2015-11-19 2017-06-01 日本電気硝子株式会社 ディスプレイ用保護部材及びこれを用いた携帯端末
CN206490707U (zh) * 2017-03-02 2017-09-12 广东欧珀移动通信有限公司 显示屏以及电子设备
CN107241466A (zh) * 2017-05-04 2017-10-10 广东欧珀移动通信有限公司 显示装置及移动终端

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3832444A4 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112380964A (zh) * 2020-11-11 2021-02-19 京东方科技集团股份有限公司 光电检测基板和显示装置

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