WO2020015347A1 - Tma gas supply system for tubular pecvd furnace - Google Patents

Tma gas supply system for tubular pecvd furnace Download PDF

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Publication number
WO2020015347A1
WO2020015347A1 PCT/CN2019/072726 CN2019072726W WO2020015347A1 WO 2020015347 A1 WO2020015347 A1 WO 2020015347A1 CN 2019072726 W CN2019072726 W CN 2019072726W WO 2020015347 A1 WO2020015347 A1 WO 2020015347A1
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Prior art keywords
valve
control valve
tma
liquid
pipeline
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PCT/CN2019/072726
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French (fr)
Chinese (zh)
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李致文
肖四哲
张勇
伍波
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深圳市捷佳伟创新能源装备股份有限公司
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Publication of WO2020015347A1 publication Critical patent/WO2020015347A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Definitions

  • the utility model relates to solar cell production equipment, in particular to a TMA gas supply system for a tubular PECVD furnace.
  • PERC battery production technology is the main development direction at present.
  • PERC passivation emitter and backside battery technology is based on the conventional battery to make a layer of alumina + silicon nitride on the backside, and then laser mold, the single crystal current efficiency can reach 21% or more.
  • the present invention proposes a TMA gas supply system for a tubular PECVD furnace that can continuously supply liquid.
  • the technical solution proposed by the present utility model is to design a TMA gas supply system for a tubular PECVD furnace, which includes a nitrogen source, an air supply pipeline, a TMA bottle, a liquid supply pipeline, and a liquid flow meter LFM01 connected in this order.
  • Evaporator CEM, process gas output pipeline, the nitrogen source and the evaporator CEM are also connected in series with the gas mixing pipeline and the first mass flowmeter FMC01, the gas supply pipeline in series with the air valve, liquid delivery pipeline
  • the medium string shuttle liquid valve and the gas mixing valve PV02 are connected in series.
  • the liquid flow meter LFM01 and the first mass flow meter are connected to a controller.
  • the controller controls the opening and closing of the gas supply valve, the liquid supply valve and the gas mixing valve.
  • the opening of the liquid flow meter LFM01 and the first mass flow meter FMC01 is controlled according to the flow rates measured by the two flow meters.
  • the air supply line includes first and second air supply lines
  • the TMA bottle includes first and second TMA bottles
  • the liquid supply line includes first and second liquid supply lines; wherein the first air supply tube Circuit, the first TMA bottle and the first liquid feeding pipeline are connected in series in sequence and connected to the liquid flow meter LFM01.
  • the first gas feeding pipeline is connected with the first gas feeding valve PV10 in series
  • the first liquid feeding pipeline is connected with the first liquid feeding pipeline in series.
  • Liquid valve PV11; the second gas supply line, the second TMA bottle, and the second liquid supply line are connected in series to the liquid flow meter LFM01, and the second gas supply line is connected to the second gas supply valve PV08 and the second liquid supply
  • a second liquid feeding valve PV09 is connected in series in the pipeline; the controller controls the opening and closing of the first liquid feeding valve PV10, the first liquid feeding valve PV11, the second liquid feeding valve PV08, and the second liquid feeding valve PV09.
  • the first TMA bottle has an air inlet and a liquid outlet.
  • the air inlet is provided with a twelfth manual valve MV12
  • the liquid outlet is provided with a thirteenth manual valve MV13
  • the eighteenth control valve PV18 is connected between the first air supply valve PV10
  • the nineteenth control valve PV19 and the twenty-fifth control valve PV25 are connected in sequence between the thirteenth manual valve MV13 and the first liquid supply valve PV11.
  • the line between the valve PV10 to the eighteenth control valve PV18 and the line between the twenty-fifth control valve PV25 to the nineteenth control valve PV19 are connected to the fifteenth control valve PV15;
  • the second TMA bottle has an air inlet and a liquid outlet.
  • the air inlet is provided with a tenth manual valve MV10.
  • the liquid outlet is provided with an eleventh manual valve MV11.
  • the tenth manual valve MV10 to the second air supply valve PV08.
  • the sixteenth control valve PV16 is connected between the eleventh manual valve MV11 and the second liquid feeding valve PV09.
  • the seventeenth control valve PV17, the twenty-fourth control valve PV24, and the second air supply valve PV08 to the tenth are connected in this order.
  • the second mass flowmeter FMC02 Between the second mass flowmeter FMC02 and the outlet of the second mass flowmeter FMC02 through the 22nd control valve PV22 to the 19th control valve PV25; the second mass flowmeter FMC02
  • the outflow port is connected to the pipeline between the second liquid feeding valve PV09 to the twenty-fourth control valve PV24 through the seventh control valve PV07, and the outflow port of the second mass flow meter FMC02 is connected to the twentieth through the twenty-third control valve PV23.
  • the pipeline from the sixteenth control valve PV16 is coupled to the vacuum generating device through the twelfth control valve PV12; the controller receives the measurement measured by the second mass flow meter FMC02, and the controller controls the first Opening and closing of six to nineteenth control valves, And controlling opening and closing of the twenty-second to twenty-fifth of the control valve PV25.
  • the twelfth control valve PV12 and the thirteenth control valve PV13 are both connected to a vacuum generating device through a twentieth control valve PV20.
  • An outflow port of the first mass flow meter FMC01 is connected to the evaporator CEM, and is also connected to the process gas output pipeline through a first control valve PV01.
  • the process gas output line is connected to a vacuum generating device through a fifth control valve PV05, and the exhaust port of the evaporator CEM is connected to a vacuum generating device through a fourth control valve PV04.
  • the output port of the nitrogen source is connected in series with a pressure reducing valve PR002 and a purifier P01.
  • the process gas output pipeline is provided with five gas output ports.
  • An electronic scale is installed at the bottom of the first TMA bottle and the second TMA bottle.
  • the electronic scale sends the weight value to the controller, and the controller calculates the amount of TMA in the first TMA bottle and the second TMA bottle. And control one of the TMA bottles to supply liquid.
  • the utility model enables the traditional PECVD equipment to be equipped with an alumina process, which solves the lamination deposition of ALOX plus SiNX in one-stop, and has excellent passivation effect when the thickness is less than 12nm; the operation is simple, The stacked deposition is completed in one step, and only the relevant formula parameters need to be changed; the dual TMA source bottle is used to supply the system gas, so that the system gas supply is not affected when the empty source bottle is replaced.
  • Figure 1 is a schematic diagram of a single TMA source bottle liquid supply
  • Figure 2 is a schematic diagram of the liquid supply of a dual TMA source bottle
  • FIG. 3 is a schematic diagram of a gas path of a preferred embodiment.
  • the technical solution proposed by the present utility model is to design a TMA gas supply system for a tubular PECVD furnace.
  • FIG. 1 includes a nitrogen source, a gas supply pipeline, a TMA bottle, a liquid supply pipeline, A liquid flow meter LFM01, an evaporator CEM, and a process gas output line, a gas mixing line and a first mass flow meter FMC01 are connected in series between the nitrogen source and the evaporator CEM, and a gas valve is connected in series in the air supply line,
  • the liquid feeding line is connected with a liquid feeding valve in series
  • the gas mixing line is connected with a gas mixing valve PV02 in series.
  • the liquid flow meter LFM01 is connected to a controller of the first mass flow meter, and the controller controls the gas feeding valve, the liquid feeding valve and the gas mixing valve
  • the opening degree of the liquid flow meter LFM01 and the first mass flow meter FMC01 are controlled according to the flow rates measured by the two flow meters.
  • a high-purity nitrogen source applies air pressure to the TMA in the source bottle through the air supply line, pressurizes it to about 4 bar, and the TMA liquid flows into the liquid supply line under the pressure, and is calculated by the liquid flow meter LFM01
  • the flow rate is then evaporated into gas in the evaporator CEM at high temperature, and mixed with the nitrogen gas sent from the other channel through the gas mixing pipe and the first mass flow meter FMC01, and then sent to the PECVD reactor through the process gas output pipe.
  • the controller controls the opening and closing of the air supply valve, the liquid supply valve and the gas mixing valve, and controls the liquid flow meter LFM01 and the first mass flow meter according to the flow values fed back from the liquid flow meter LFM01 and the first mass flow meter FMC01.
  • the opening degree of FMC01 is used to control the mixing ratio of TMA and nitrogen.
  • the controller may be a PLC program controller.
  • the air supply line includes first and second air supply lines
  • the TMA bottle includes first and second TMA bottles
  • the liquid supply line includes first and second liquid supply lines; wherein the first air supply tube Circuit, the first TMA bottle and the first liquid feeding pipeline are connected in series in sequence and connected to the liquid flow meter LFM01.
  • the first gas feeding pipeline is connected with the first gas feeding valve PV10 in series
  • the first liquid feeding pipeline is connected with the first liquid feeding pipeline in series.
  • Liquid valve PV11; the second gas supply line, the second TMA bottle, and the second liquid supply line are connected in series to the liquid flow meter LFM01, and the second gas supply line is connected to the second gas supply valve PV08 and the second liquid supply
  • a second liquid feeding valve PV09 is connected in series in the pipeline; the controller controls the opening and closing of the first liquid feeding valve PV10, the first liquid feeding valve PV11, the second liquid feeding valve PV08, and the second liquid feeding valve PV09.
  • the two sets of gas supply systems are standby for each other. When one bottle of TMA runs out, the other bottle can continue to supply gas, and production will not be affected.
  • the first TMA bottle has an air inlet and a liquid outlet
  • a twelfth manual valve MV12 is provided on the air inlet
  • a liquid outlet is provided on the liquid outlet
  • the thirteenth manual valve MV13, the twelfth manual valve MV12 to the first air supply valve PV10 are connected to the eighteenth control valve PV18
  • the thirteenth manual valve MV13 to the first liquid supply valve PV11 are connected in order to the nineteenth
  • a fifteenth control valve PV15 is connected between the two pipes; the second TMA bottle has an air inlet and a liquid outlet, a tenth manual valve MV10 is provided on the air inlet, and an eleventh is provided on the liquid outlet.
  • the sixteenth control valve PV16 is connected between the manual valve MV11, the tenth manual valve MV10 and the second air supply valve PV08, and the seventeenth control valve PV17, The line between the twenty-fourth control valve PV24, the second air supply valve PV08 to the sixteenth control valve PV16, and the twenty-fourth control valve PV24 to the seventeenth
  • the pipeline of the control valve PV17 and the fourteenth control valve PV14 are connected between the two pipelines; the nitrogen source is connected to the second mass flow meter FMC02, and the outlet of the second mass flow meter FMC02 is connected through the sixth control valve PV06
  • the pipeline between the first liquid feeding valve PV11 to the twenty-fifth control valve PV25, and the outlet of the second mass flow meter FMC02 is connected to the twenty
  • the pipeline between valve PV19; the outlet of the second mass flow meter FMC02 is connected to the pipeline between the second liquid feeding valve PV09 to the twenty-fourth control valve PV24 through the seventh control valve PV07, and the second mass flow meter FMC02
  • the outflow port is connected to the pipeline from the twenty-fourth control valve PV24 to the seventeenth control valve PV17 through the twenty-third control valve PV23; the pipeline between the first air supply valve PV10 to the eighteenth control valve PV18 is through the tenth
  • the three control valves PV13 are coupled to the vacuum generating device, and the pipeline between the second air supply valve PV08 to the sixteenth control valve PV16 is coupled to the vacuum generating device through the twelfth control valve PV12; the controller receives the second mass Metered by flowmeter FMC02, the controller Opening and closing system of the sixth to nineteenth control valve, and controlling opening and closing of the twenty-second to twenty-fifth of the control valve PV25.
  • the control valve is a pneumatic control valve.
  • the twelfth control valve PV12 and the thirteenth control valve PV13 are both connected to a vacuum generating device through a twentieth control valve PV20.
  • An outflow port of the first mass flow meter FMC01 is connected to the evaporator CEM, and is also connected to the process gas output pipeline through a first control valve PV01.
  • the process gas output line can be purged with nitrogen for cleaning.
  • the process gas output line is connected to a vacuum generating device through a fifth control valve PV05, and the exhaust port of the evaporator CEM is connected to a vacuum generating device through a fourth control valve PV04.
  • the process gas output line evaporator CEM can be cleaned by vacuuming.
  • the output port of the nitrogen source is connected in series with a pressure reducing valve PR002 and a purifier P01.
  • the pressure reducing valve PR002 can reduce the pressure of nitrogen and stabilize the pressure.
  • Purifier P01 can purify nitrogen components.
  • the process gas output pipeline is provided with 5 gas output ports, which can be connected to multiple interfaces of the PECVD furnace.
  • An electronic scale is installed at the bottom of the first TMA bottle and the second TMA bottle.
  • the electronic scale sends the weight value to the controller, and the controller calculates the amount of TMA in the first TMA bottle and the second TMA bottle. And control one of the TMA bottles to supply liquid.
  • Gas supply for the first TMA bottle The nitrogen is depressurized through the pressure reducing valve PR002, and then the nitrogen component is purified by the purifier P01. PV10 is turned on, PV18 is turned on, MV12 and MV13 have been manually opened, and nitrogen pushes the liquid in the first TMA bottle through PV19, PV25, PV11, after passing through the liquid flow meter LFM01 (LFM01 can feedback, can control the TMA liquid flow rate), and then evaporated into gas in the evaporator CEM; meanwhile, the other nitrogen gas passes through PV02 and the first mass flow meter FMC01 (FMC01 can feedback (Can control the flow of nitrogen) into the evaporator CEM and mix with TMA gas, and then convey it to the PECVD reactor through the process gas output line (1-PV21 to 5-PV21) for the process.
  • Gas supply in the second TMA bottle The nitrogen is depressurized through the pressure reducing valve PR002, and then the nitrogen component is purified by the purifier P01. PV08 is turned on, PV16 is turned on, MV10 and MV11 have been manually opened. PV24, PV09, pass through the liquid flow meter LFM01, and then evaporate to gas in the evaporator CEM; meanwhile, another nitrogen gas is sequentially passed through PV02, the first mass flow meter FMC01 to the evaporator CEM and mixed with TMA gas, and is output through the process gas Pipes (1-PV21 to 5-PV21) are sent to the PECVD reactor for processing.
  • An electronic scale is installed at the bottom of the TMA bottle.
  • the electronic scale feedbacks the weight of the TMA to the controller.
  • the controller closes the corresponding set of gas supply lines through the control valve, activates another set of gas supply lines, and then replaces them.
  • An empty TMA bottle thereby achieving continuous gas supply without affecting production.
  • the first step back pressure of TMA liquid.
  • the nitrogen flow is calculated by the second mass flow meter FMC02, and then the TMA liquid in the liquid delivery pipeline is returned to the TMA bottle through PV06, PV25, PV19, and MV13.
  • the tube connected to MV13 extends into the bottom of the TMA bottle, and the tube connected to MV12 extends.
  • the nitrogen in the upper part of the TMA bottle is discharged through the MV12, PV18, PV13, and PV20 due to the return of the TMA liquid; the controller receives the flow value from the second mass flow meter FMC02, and presets the flow threshold value.
  • the second step is to fill the pipeline with nitrogen.
  • the operator manually closes the twelfth manual valve MV12 and the thirteenth manual valve MV13, the controller closes PV25 and opens PV15, and nitrogen is flushed into the pipeline through the second mass flow meter FMC02, PV22, PV19, PV18, and PV15. And hold for 5 minutes.
  • the third step is to evacuate the pipe. The controller closes PV06, PV22, PV25, and the vacuum generating device evacuates the pipeline through PV20, PV13, PV18, PV15, and PV19.
  • the pipeline of the second step is repeatedly filled with nitrogen and the pipeline of the third step is evacuated.
  • the fifth step is to replace the first TMA bottle.
  • the pipeline of the second step is repeatedly filled with nitrogen and the pipeline of the third step is evacuated.
  • the operator manually opens the twelfth manual valve MV12 and the thirteenth manual valve MV13, and the first TMA bottle can be refilled.
  • the second TMA bottle the first step, back pressure of TMA liquid.
  • the nitrogen flow is calculated by the second mass flow meter FMC02, and then the TMA liquid in the liquid delivery line is returned to the TMA bottle through PV07, PV24, PV17, and MV11.
  • the tube connected by MV11 extends into the bottom of the TMA bottle, and the tube connected by MV10 extends.
  • the nitrogen in the upper part of the TMA bottle is discharged through the MV10, PV16, PV12, PV20 due to the return of the TMA liquid; the controller receives the flow value from the second mass flow meter FMC02, and presets the flow threshold value.
  • the second step is to fill the pipeline with nitrogen.
  • the operator manually closes the tenth manual valve MV10 and the eleventh manual valve MV11.
  • the controller closes PV24 and opens PV14. Nitrogen is flushed into the pipeline through the second mass flow meter FMC02, PV23, PV17, PV14, and PV16 to ensure that Press for 5 minutes.
  • the third step is to evacuate the pipe.
  • the controller closes PV07, PV23, PV24, and the vacuum generating device evacuates the pipeline through PV20, PV12, PV16, PV14, and PV17.
  • the pipeline of the second step is repeatedly filled with nitrogen and the pipeline of the third step is evacuated.
  • the fifth step is to replace the second TMA bottle.
  • the pipeline of the second step is repeatedly filled with nitrogen and the pipeline of the third step is evacuated.
  • the operator manually opens the tenth manual valve MV10 and the eleventh manual valve MV11, and the second TMA bottle can be refilled.

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Abstract

Provided is a TMA gas supply system for a tubular PECVD furnace, the system comprising a nitrogen gas source, a gas delivery pipeline, a TMA bottle, a liquid delivery pipeline, a fluid flowmeter (LFM01), an evaporator (CEM), and a process gas output pipeline, which are connected in sequence, wherein a gas mixing pipeline and a first mass flowmeter (FMC01) are connected in series between the nitrogen gas source and the evaporator; a gas delivery valve is connected in series in the gas delivery pipeline, a liquid delivery valve is connected in series in the liquid delivery pipeline, and a gas mixing valve (PV02) is connected in series in the gas mixing pipeline; a controller controls the opening and closing of the gas delivery valve, the liquid delivery valve and the gas mixing valve; and the opening degree of two flowmeters is controlled according to the flow measured by the two flowmeters. The present application endows a traditional PECVD apparatus with a process of manufacturing aluminum oxide, solves the problem of laminated deposition of ALOX with SiNX in one step, and has an excellent passivation effect when the thickness is less than 12 nm. The operation is simple, and the laminated deposition is completed in one step, thus only requiring the changing of the relevant formulation parameters. Two TMA source bottles are used for supplying gas for the system, such that the gas supply for the system will not be affected when an empty source bottle is replaced.

Description

一种管式PECVD炉TMA供气系统TMA gas supply system for tubular PECVD furnace 技术领域Technical field
本实用新型涉及太阳能电池片生产设备,尤其涉及一种管式PECVD炉TMA供气系统。The utility model relates to solar cell production equipment, in particular to a TMA gas supply system for a tubular PECVD furnace.
背景技术Background technique
随着光伏行业发展,行业内主要生产太阳能电池片的设备管式PECVD炉的生产工艺也不断的得到改进和发展。PERC电池生产工艺是目前主要发展方向,PERC钝化发射极和背面电池技术,就是在常规电池基础上在背面做一层氧化铝+氮化硅,然后再激光开模,单晶目前效率可达21%以上。With the development of the photovoltaic industry, the production process of tubular PECVD furnaces, which are mainly used to produce solar cells in the industry, has also been continuously improved and developed. PERC battery production technology is the main development direction at present. PERC passivation emitter and backside battery technology is based on the conventional battery to make a layer of alumina + silicon nitride on the backside, and then laser mold, the single crystal current efficiency can reach 21% or more.
现有技术的不足和缺陷:1、现有的管式PECVD设备只能对电池片镀氮化硅膜,需配另外的设备(ALD或者板式PECVD)做氧化铝膜。2、现有的PECVD设备生产的电池片光电转换效率在现有技术条件下提升困难。Defects and shortcomings of the prior art: 1. Existing tubular PECVD equipment can only be used to deposit silicon nitride films on battery cells, and additional equipment (ALD or plate-type PECVD) is required to be used as the aluminum oxide film. 2. It is difficult to improve the photoelectric conversion efficiency of the cells produced by the existing PECVD equipment under the existing technical conditions.
因此,业内亟需设计一种供气系统,可以在传统PECVD设备的基础上,将TMA(三甲基铝)液体转换成气态,以便满足工艺对TMA源的要求,同时还需解决用TMA源瓶供液,换TMA源瓶时可以不间断供液。Therefore, there is an urgent need in the industry to design a gas supply system that can convert TMA (trimethylaluminum) liquid into a gas state on the basis of traditional PECVD equipment in order to meet the requirements of the process for the TMA source. Bottle supply liquid, you can continue to supply liquid when changing the TMA source bottle.
实用新型内容Utility model content
为了解决现有技术中存在的上述缺陷,本实用新型提出一种可以不间断供 液的管式PECVD炉TMA供气系统。In order to solve the above-mentioned shortcomings in the prior art, the present invention proposes a TMA gas supply system for a tubular PECVD furnace that can continuously supply liquid.
为解决上述技术问题,本实用新型提出的技术方案是设计一种管式PECVD炉TMA供气系统,其包括依次连接的氮气源、送气管路、TMA瓶、送液管路、液体流量计LFM01、蒸发器CEM、工艺气体输出管路,所述氮气源与蒸发器CEM之间还串接混气管路和第一质量流量计FMC01,所述送气管路中串接送气阀、送液管路中串接送液阀、混气管路中串接混气阀PV02,所述液体流量计LFM01和第一质量流量计连接控制器,控制器控制送气阀、送液阀和混气阀的启闭,并根据两流量计所测流量控制液体流量计LFM01和第一质量流量计FMC01的开启度。In order to solve the above technical problems, the technical solution proposed by the present utility model is to design a TMA gas supply system for a tubular PECVD furnace, which includes a nitrogen source, an air supply pipeline, a TMA bottle, a liquid supply pipeline, and a liquid flow meter LFM01 connected in this order. , Evaporator CEM, process gas output pipeline, the nitrogen source and the evaporator CEM are also connected in series with the gas mixing pipeline and the first mass flowmeter FMC01, the gas supply pipeline in series with the air valve, liquid delivery pipeline The medium string shuttle liquid valve and the gas mixing valve PV02 are connected in series. The liquid flow meter LFM01 and the first mass flow meter are connected to a controller. The controller controls the opening and closing of the gas supply valve, the liquid supply valve and the gas mixing valve. The opening of the liquid flow meter LFM01 and the first mass flow meter FMC01 is controlled according to the flow rates measured by the two flow meters.
所述送气管路包括第一、第二送气管路,所述TMA瓶包括第一、第二TMA瓶,所述送液管路包括第一、第二送液管路;其中第一送气管路、第一TMA瓶和第一送液管路依次串联后连接所述液体流量计LFM01,第一送气管路中串接第一送气阀PV10,第一送液管路中串接第一送液阀PV11;第二送气管路、第二TMA瓶和第二送液管路依次串联后连接所述液体流量计LFM01,第二送气管路中串接第二送气阀PV08,第二送液管路中串接第二送液阀PV09;所述控制器控制所述第一送气阀PV10、第一送液阀PV11、第二送气阀PV08、第二送液阀PV09的启闭。The air supply line includes first and second air supply lines, the TMA bottle includes first and second TMA bottles, and the liquid supply line includes first and second liquid supply lines; wherein the first air supply tube Circuit, the first TMA bottle and the first liquid feeding pipeline are connected in series in sequence and connected to the liquid flow meter LFM01. The first gas feeding pipeline is connected with the first gas feeding valve PV10 in series, and the first liquid feeding pipeline is connected with the first liquid feeding pipeline in series. Liquid valve PV11; the second gas supply line, the second TMA bottle, and the second liquid supply line are connected in series to the liquid flow meter LFM01, and the second gas supply line is connected to the second gas supply valve PV08 and the second liquid supply A second liquid feeding valve PV09 is connected in series in the pipeline; the controller controls the opening and closing of the first liquid feeding valve PV10, the first liquid feeding valve PV11, the second liquid feeding valve PV08, and the second liquid feeding valve PV09.
所述第一TMA瓶具有进气口和出液口、其进气口上设有第十二手动阀MV12、其出液口上设有第十三手动阀MV13,第十二手动阀MV12至第一送气 阀PV10之间连接第十八控制阀PV18,第十三手动阀MV13至第一送液阀PV11之间依次连接第十九控制阀PV19、第二十五控制阀PV25,第一送气阀PV10至第十八控制阀PV18之间的管路、和第二十五控制阀PV25至第十九控制阀PV19的管路、这两个管路之间连接第十五控制阀PV15;所述第二TMA瓶具有进气口和出液口、其进气口上设有第十手动阀MV10、其出液口上设有第十一手动阀MV11,第十手动阀MV10至第二送气阀PV08之间连接第十六控制阀PV16,第十一手动阀MV11至第二送液阀PV09之间依次连接第十七控制阀PV17、第二十四控制阀PV24,第二送气阀PV08至第十六控制阀PV16之间的管路、和第二十四控制阀PV24至第十七控制阀PV17的管路、这两个管路之间连接第十四控制阀PV14;所述氮气源连接第二质量流量计FMC02,第二质量流量计FMC02的流出口通过第六控制阀PV06连接第一送液阀PV11至第二十五控制阀PV25之间的管路,第二质量流量计FMC02的流出口通过第二十二控制阀PV22连接第二十五控制阀PV25至第十九控制阀PV19之间的管路;第二质量流量计FMC02的流出口通过第七控制阀PV07连接第二送液阀PV09至第二十四控制阀PV24之间的管路,第二质量流量计FMC02的流出口通过第二十三控制阀PV23连接第二十四控制阀PV24至第十七控制阀PV17的管路;第一送气阀PV10至第十八控制阀PV18之间的管路通过第十三控制阀PV13耦合连接真空发生装置,第二送气阀PV08至第十六控制阀PV16之间的管路通过第十二控制阀PV12耦合连接真空发生装置;所述控制器接收所述第二质量流量 计FMC02所测计量,所述控制器控制所述第六至第十九控制阀的启闭、以及控制所述第二十二至第二十五控制阀PV25的启闭。The first TMA bottle has an air inlet and a liquid outlet. The air inlet is provided with a twelfth manual valve MV12, the liquid outlet is provided with a thirteenth manual valve MV13, and the twelfth manual valve MV12 to The eighteenth control valve PV18 is connected between the first air supply valve PV10, and the nineteenth control valve PV19 and the twenty-fifth control valve PV25 are connected in sequence between the thirteenth manual valve MV13 and the first liquid supply valve PV11. The line between the valve PV10 to the eighteenth control valve PV18 and the line between the twenty-fifth control valve PV25 to the nineteenth control valve PV19 are connected to the fifteenth control valve PV15; The second TMA bottle has an air inlet and a liquid outlet. The air inlet is provided with a tenth manual valve MV10. The liquid outlet is provided with an eleventh manual valve MV11. The tenth manual valve MV10 to the second air supply valve PV08. The sixteenth control valve PV16 is connected between the eleventh manual valve MV11 and the second liquid feeding valve PV09. The seventeenth control valve PV17, the twenty-fourth control valve PV24, and the second air supply valve PV08 to the tenth are connected in this order. The line between the six control valves PV16, the line between the twenty-fourth control valve PV24 to the seventeenth control valve PV17, and the connection between these two lines Fourteenth control valve PV14; the nitrogen source is connected to the second mass flow meter FMC02, and the outlet of the second mass flow meter FMC02 is connected to the first liquid feeding valve PV11 to the twenty-fifth control valve PV25 through the sixth control valve PV06. Between the second mass flowmeter FMC02 and the outlet of the second mass flowmeter FMC02 through the 22nd control valve PV22 to the 19th control valve PV25; the second mass flowmeter FMC02 The outflow port is connected to the pipeline between the second liquid feeding valve PV09 to the twenty-fourth control valve PV24 through the seventh control valve PV07, and the outflow port of the second mass flow meter FMC02 is connected to the twentieth through the twenty-third control valve PV23. The pipeline from the four control valves PV24 to the seventeenth control valve PV17; the pipeline between the first air supply valve PV10 to the eighteenth control valve PV18 is coupled to the vacuum generating device through the thirteenth control valve PV13, and the second air supply valve PV08 The pipeline from the sixteenth control valve PV16 is coupled to the vacuum generating device through the twelfth control valve PV12; the controller receives the measurement measured by the second mass flow meter FMC02, and the controller controls the first Opening and closing of six to nineteenth control valves, And controlling opening and closing of the twenty-second to twenty-fifth of the control valve PV25.
所述第十二控制阀PV12和第十三控制阀PV13皆通过第二十控制阀PV20连接真空发生装置。The twelfth control valve PV12 and the thirteenth control valve PV13 are both connected to a vacuum generating device through a twentieth control valve PV20.
所述第一质量流量计FMC01的流出口连接所述蒸发器CEM、还通过第一控制阀PV01连接所述工艺气体输出管路。An outflow port of the first mass flow meter FMC01 is connected to the evaporator CEM, and is also connected to the process gas output pipeline through a first control valve PV01.
所述工艺气体输出管路通过第五控制阀PV05连接真空发生装置,所述蒸发器CEM的排气口通过第四控制阀PV04连接真空发生装置。The process gas output line is connected to a vacuum generating device through a fifth control valve PV05, and the exhaust port of the evaporator CEM is connected to a vacuum generating device through a fourth control valve PV04.
所述氮气源的输出口串接减压阀PR002和纯化器P01。The output port of the nitrogen source is connected in series with a pressure reducing valve PR002 and a purifier P01.
所述工艺气体输出管路设有5个气体输出口。The process gas output pipeline is provided with five gas output ports.
所述第一TMA瓶和第二TMA瓶的底部皆安装有电子秤,电子秤将所称重量值发给所述控制器,控制器根据第一TMA瓶和第二TMA瓶中的TMA液量而控制其中一个TMA瓶供液。An electronic scale is installed at the bottom of the first TMA bottle and the second TMA bottle. The electronic scale sends the weight value to the controller, and the controller calculates the amount of TMA in the first TMA bottle and the second TMA bottle. And control one of the TMA bottles to supply liquid.
与现有技术相比,本实用新型使传统的PECVD设备具备了做氧化铝的工艺,一站式解决ALOX加SiNX的叠层沉积,厚度<12nm时具有极好的钝化效果;操作简单,叠层沉积一步完成,仅需更改相关配方参数;采用了双TMA源瓶为系统供气,使更换空源瓶时也不影响系统供气。Compared with the prior art, the utility model enables the traditional PECVD equipment to be equipped with an alumina process, which solves the lamination deposition of ALOX plus SiNX in one-stop, and has excellent passivation effect when the thickness is less than 12nm; the operation is simple, The stacked deposition is completed in one step, and only the relevant formula parameters need to be changed; the dual TMA source bottle is used to supply the system gas, so that the system gas supply is not affected when the empty source bottle is replaced.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
下面结合实施例和附图对本实用新型进行详细说明,其中:The following describes the utility model in detail with reference to the embodiments and the drawings, in which:
图1是单TMA源瓶供液原理图;Figure 1 is a schematic diagram of a single TMA source bottle liquid supply;
图2是双TMA源瓶供液原理图;Figure 2 is a schematic diagram of the liquid supply of a dual TMA source bottle;
图3是较佳实施例气路原理图。FIG. 3 is a schematic diagram of a gas path of a preferred embodiment.
具体实施方式detailed description
为了使本实用新型的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本实用新型作进一步详细说明。应当理解,此处所描述的具体实施例仅仅用于解释本实用新型,并不用于限定本实用新型。In order to make the purpose, technical solution and advantages of the present utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.
为解决上述技术问题,本实用新型提出的技术方案是设计一种管式PECVD炉TMA供气系统,参看图1,其包括依次连接的氮气源、送气管路、TMA瓶、送液管路、液体流量计LFM01、蒸发器CEM、工艺气体输出管路,所述氮气源与蒸发器CEM之间还串接混气管路和第一质量流量计FMC01,所述送气管路中串接送气阀、送液管路中串接送液阀、混气管路中串接混气阀PV02,所述液体流量计LFM01和第一质量流量计连接控制器,控制器控制送气阀、送液阀和混气阀的启闭,并根据两流量计所测流量控制液体流量计LFM01和第一质量流量计FMC01的开启度。In order to solve the above technical problems, the technical solution proposed by the present utility model is to design a TMA gas supply system for a tubular PECVD furnace. Referring to FIG. 1, it includes a nitrogen source, a gas supply pipeline, a TMA bottle, a liquid supply pipeline, A liquid flow meter LFM01, an evaporator CEM, and a process gas output line, a gas mixing line and a first mass flow meter FMC01 are connected in series between the nitrogen source and the evaporator CEM, and a gas valve is connected in series in the air supply line, The liquid feeding line is connected with a liquid feeding valve in series, and the gas mixing line is connected with a gas mixing valve PV02 in series. The liquid flow meter LFM01 is connected to a controller of the first mass flow meter, and the controller controls the gas feeding valve, the liquid feeding valve and the gas mixing valve The opening degree of the liquid flow meter LFM01 and the first mass flow meter FMC01 are controlled according to the flow rates measured by the two flow meters.
其大致的工作过程就是:高纯度的氮气源通过送气管路对源瓶内的TMA施加气压,加压到4bar左右,TMA液体在压力作用下流入送液管路,并通过液体流量计LFM01计算流量,而后在蒸发器CEM内经高温蒸发为气体的同时,与 另一路经过混气管路和第一质量流量计FMC01送来的氮气混合,而后通过工艺气体输出管路输送给PECVD反应炉。在控制过程中,控制器控制送气阀、送液阀和混气阀的启闭,根据液体流量计LFM01和第一质量流量计FMC01反馈回来的流量值控制液体流量计LFM01和第一质量流量计FMC01的开启度,藉此控制TMA和氮气的混合比例。控制器可以是PLC程序控制器。The general working process is: a high-purity nitrogen source applies air pressure to the TMA in the source bottle through the air supply line, pressurizes it to about 4 bar, and the TMA liquid flows into the liquid supply line under the pressure, and is calculated by the liquid flow meter LFM01 The flow rate is then evaporated into gas in the evaporator CEM at high temperature, and mixed with the nitrogen gas sent from the other channel through the gas mixing pipe and the first mass flow meter FMC01, and then sent to the PECVD reactor through the process gas output pipe. In the control process, the controller controls the opening and closing of the air supply valve, the liquid supply valve and the gas mixing valve, and controls the liquid flow meter LFM01 and the first mass flow meter according to the flow values fed back from the liquid flow meter LFM01 and the first mass flow meter FMC01. The opening degree of FMC01 is used to control the mixing ratio of TMA and nitrogen. The controller may be a PLC program controller.
TMA由TMA源瓶提供,当瓶内TMA用尽时就要中断反应,影响生产。故此较佳实施例中设有互为备用的两系统进行供气。参看图2示出的双TMA源瓶供液原理图。所述送气管路包括第一、第二送气管路,所述TMA瓶包括第一、第二TMA瓶,所述送液管路包括第一、第二送液管路;其中第一送气管路、第一TMA瓶和第一送液管路依次串联后连接所述液体流量计LFM01,第一送气管路中串接第一送气阀PV10,第一送液管路中串接第一送液阀PV11;第二送气管路、第二TMA瓶和第二送液管路依次串联后连接所述液体流量计LFM01,第二送气管路中串接第二送气阀PV08,第二送液管路中串接第二送液阀PV09;所述控制器控制所述第一送气阀PV10、第一送液阀PV11、第二送气阀PV08、第二送液阀PV09的启闭。两套供气系统互为备用,当一瓶TMA用尽时,另一瓶可以继续供气,生产不会受到影响。TMA is provided by the TMA source bottle. When the TMA in the bottle is exhausted, the reaction will be interrupted and production will be affected. Therefore, in the preferred embodiment, two systems are provided as backups for supplying gas to each other. Refer to the schematic diagram of the dual TMA source bottle liquid supply shown in FIG. 2. The air supply line includes first and second air supply lines, the TMA bottle includes first and second TMA bottles, and the liquid supply line includes first and second liquid supply lines; wherein the first air supply tube Circuit, the first TMA bottle and the first liquid feeding pipeline are connected in series in sequence and connected to the liquid flow meter LFM01. The first gas feeding pipeline is connected with the first gas feeding valve PV10 in series, and the first liquid feeding pipeline is connected with the first liquid feeding pipeline in series. Liquid valve PV11; the second gas supply line, the second TMA bottle, and the second liquid supply line are connected in series to the liquid flow meter LFM01, and the second gas supply line is connected to the second gas supply valve PV08 and the second liquid supply A second liquid feeding valve PV09 is connected in series in the pipeline; the controller controls the opening and closing of the first liquid feeding valve PV10, the first liquid feeding valve PV11, the second liquid feeding valve PV08, and the second liquid feeding valve PV09. The two sets of gas supply systems are standby for each other. When one bottle of TMA runs out, the other bottle can continue to supply gas, and production will not be affected.
TMA有一定粘度,与空气或水接触会发生剧烈反应或爆炸,所以在更换气瓶时需要对管路进行清洁。参看图3示出的较佳实施例气路原理图:所述第一TMA瓶具有进气口和出液口、其进气口上设有第十二手动阀MV12、其出液口 上设有第十三手动阀MV13,第十二手动阀MV12至第一送气阀PV10之间连接第十八控制阀PV18,第十三手动阀MV13至第一送液阀PV11之间依次连接第十九控制阀PV19、第二十五控制阀PV25,第一送气阀PV10至第十八控制阀PV18之间的管路、和第二十五控制阀PV25至第十九控制阀PV19的管路、这两个管路之间连接第十五控制阀PV15;所述第二TMA瓶具有进气口和出液口、其进气口上设有第十手动阀MV10、其出液口上设有第十一手动阀MV11,第十手动阀MV10至第二送气阀PV08之间连接第十六控制阀PV16,第十一手动阀MV11至第二送液阀PV09之间依次连接第十七控制阀PV17、第二十四控制阀PV24,第二送气阀PV08至第十六控制阀PV16之间的管路、和第二十四控制阀PV24至第十七控制阀PV17的管路、这两个管路之间连接第十四控制阀PV14;所述氮气源连接第二质量流量计FMC02,第二质量流量计FMC02的流出口通过第六控制阀PV06连接第一送液阀PV11至第二十五控制阀PV25之间的管路,第二质量流量计FMC02的流出口通过第二十二控制阀PV22连接第二十五控制阀PV25至第十九控制阀PV19之间的管路;第二质量流量计FMC02的流出口通过第七控制阀PV07连接第二送液阀PV09至第二十四控制阀PV24之间的管路,第二质量流量计FMC02的流出口通过第二十三控制阀PV23连接第二十四控制阀PV24至第十七控制阀PV17的管路;第一送气阀PV10至第十八控制阀PV18之间的管路通过第十三控制阀PV13耦合连接真空发生装置,第二送气阀PV08至第十六控制阀PV16之间的管路通过第十二控制阀PV12耦合 连接真空发生装置;所述控制器接收所述第二质量流量计FMC02所测计量,所述控制器控制所述第六至第十九控制阀的启闭、以及控制所述第二十二至第二十五控制阀PV25的启闭。需要指出,在较佳实施例中,控制阀采用气动控制阀。TMA has a certain viscosity, and it will react violently or explode when it comes into contact with air or water, so the pipeline needs to be cleaned when replacing the gas cylinder. Referring to FIG. 3, a schematic diagram of a gas circuit of a preferred embodiment: the first TMA bottle has an air inlet and a liquid outlet, a twelfth manual valve MV12 is provided on the air inlet, and a liquid outlet is provided on the liquid outlet The thirteenth manual valve MV13, the twelfth manual valve MV12 to the first air supply valve PV10 are connected to the eighteenth control valve PV18, and the thirteenth manual valve MV13 to the first liquid supply valve PV11 are connected in order to the nineteenth The control line PV19, the twenty-fifth control valve PV25, the line between the first air supply valve PV10 to the eighteenth control valve PV18, and the line between the twenty-fifth control valve PV25 to the nineteenth control valve PV19. A fifteenth control valve PV15 is connected between the two pipes; the second TMA bottle has an air inlet and a liquid outlet, a tenth manual valve MV10 is provided on the air inlet, and an eleventh is provided on the liquid outlet. The sixteenth control valve PV16 is connected between the manual valve MV11, the tenth manual valve MV10 and the second air supply valve PV08, and the seventeenth control valve PV17, The line between the twenty-fourth control valve PV24, the second air supply valve PV08 to the sixteenth control valve PV16, and the twenty-fourth control valve PV24 to the seventeenth The pipeline of the control valve PV17 and the fourteenth control valve PV14 are connected between the two pipelines; the nitrogen source is connected to the second mass flow meter FMC02, and the outlet of the second mass flow meter FMC02 is connected through the sixth control valve PV06 The pipeline between the first liquid feeding valve PV11 to the twenty-fifth control valve PV25, and the outlet of the second mass flow meter FMC02 is connected to the twenty-fifth control valve PV25 to the nineteenth control through the twenty-second control valve PV22. The pipeline between valve PV19; the outlet of the second mass flow meter FMC02 is connected to the pipeline between the second liquid feeding valve PV09 to the twenty-fourth control valve PV24 through the seventh control valve PV07, and the second mass flow meter FMC02 The outflow port is connected to the pipeline from the twenty-fourth control valve PV24 to the seventeenth control valve PV17 through the twenty-third control valve PV23; the pipeline between the first air supply valve PV10 to the eighteenth control valve PV18 is through the tenth The three control valves PV13 are coupled to the vacuum generating device, and the pipeline between the second air supply valve PV08 to the sixteenth control valve PV16 is coupled to the vacuum generating device through the twelfth control valve PV12; the controller receives the second mass Metered by flowmeter FMC02, the controller Opening and closing system of the sixth to nineteenth control valve, and controlling opening and closing of the twenty-second to twenty-fifth of the control valve PV25. It should be noted that, in the preferred embodiment, the control valve is a pneumatic control valve.
所述第十二控制阀PV12和第十三控制阀PV13皆通过第二十控制阀PV20连接真空发生装置。The twelfth control valve PV12 and the thirteenth control valve PV13 are both connected to a vacuum generating device through a twentieth control valve PV20.
所述第一质量流量计FMC01的流出口连接所述蒸发器CEM、还通过第一控制阀PV01连接所述工艺气体输出管路。在第一次启用供气系统时,可以对工艺气体输出管路吹扫氮气进行清洁。An outflow port of the first mass flow meter FMC01 is connected to the evaporator CEM, and is also connected to the process gas output pipeline through a first control valve PV01. When the gas supply system is activated for the first time, the process gas output line can be purged with nitrogen for cleaning.
所述工艺气体输出管路通过第五控制阀PV05连接真空发生装置,所述蒸发器CEM的排气口通过第四控制阀PV04连接真空发生装置。在第一次启用供气系统时,可以对工艺气体输出管路蒸发器CEM用抽真空的方式进行清洁。The process gas output line is connected to a vacuum generating device through a fifth control valve PV05, and the exhaust port of the evaporator CEM is connected to a vacuum generating device through a fourth control valve PV04. When the gas supply system is activated for the first time, the process gas output line evaporator CEM can be cleaned by vacuuming.
所述氮气源的输出口串接减压阀PR002和纯化器P01。减压阀PR002可以减低氮气的压力,将压力稳定下来。纯化器P01可以纯化氮气成分。The output port of the nitrogen source is connected in series with a pressure reducing valve PR002 and a purifier P01. The pressure reducing valve PR002 can reduce the pressure of nitrogen and stabilize the pressure. Purifier P01 can purify nitrogen components.
所述工艺气体输出管路设有5个气体输出口,可以对接PECVD炉的多个接口。The process gas output pipeline is provided with 5 gas output ports, which can be connected to multiple interfaces of the PECVD furnace.
所述第一TMA瓶和第二TMA瓶的底部皆安装有电子秤,电子秤将所称重量值发给所述控制器,控制器根据第一TMA瓶和第二TMA瓶中的TMA液量而控制其中一个TMA瓶供液。An electronic scale is installed at the bottom of the first TMA bottle and the second TMA bottle. The electronic scale sends the weight value to the controller, and the controller calculates the amount of TMA in the first TMA bottle and the second TMA bottle. And control one of the TMA bottles to supply liquid.
下面结合图3详述本实用新型较佳实施例的工作原理。The working principle of the preferred embodiment of the present invention is described in detail below with reference to FIG. 3.
第一TMA瓶供气:氮气经过减压阀PR002减压,再经过纯化器P01纯化氮气成分,PV10开启、PV18开启、MV12和MV13已经手动打开,氮气推动第一TMA瓶中的液体经过PV19、PV25、PV11、在经过液体流量计LFM01(LFM01可反馈、可控制TMA液体流量)、然后在蒸发器CEM中蒸发成气体;同时另一路氮气依次经PV02、第一质量流量计FMC01(FMC01可反馈、可控制氮气流量)到蒸发器CEM中与TMA气体混合,在通过工艺气体输出管路(1-PV21至5-PV21)输送到PECVD反应炉中进行工艺。Gas supply for the first TMA bottle: The nitrogen is depressurized through the pressure reducing valve PR002, and then the nitrogen component is purified by the purifier P01. PV10 is turned on, PV18 is turned on, MV12 and MV13 have been manually opened, and nitrogen pushes the liquid in the first TMA bottle through PV19, PV25, PV11, after passing through the liquid flow meter LFM01 (LFM01 can feedback, can control the TMA liquid flow rate), and then evaporated into gas in the evaporator CEM; meanwhile, the other nitrogen gas passes through PV02 and the first mass flow meter FMC01 (FMC01 can feedback (Can control the flow of nitrogen) into the evaporator CEM and mix with TMA gas, and then convey it to the PECVD reactor through the process gas output line (1-PV21 to 5-PV21) for the process.
第二TMA瓶供气:氮气经过减压阀PR002减压,再经过纯化器P01纯化氮气成分,PV08开启、PV16开启、MV10和MV11已经手动打开,氮气推动第二TMA瓶中的液体经过PV17、PV24、PV09、在经过液体流量计LFM01、然后在蒸发器CEM中蒸发成气体;同时另一路氮气依次经PV02、第一质量流量计FMC01到蒸发器CEM中与TMA气体混合,在通过工艺气体输出管路(1-PV21至5-PV21)输送到PECVD反应炉中进行工艺。Gas supply in the second TMA bottle: The nitrogen is depressurized through the pressure reducing valve PR002, and then the nitrogen component is purified by the purifier P01. PV08 is turned on, PV16 is turned on, MV10 and MV11 have been manually opened. PV24, PV09, pass through the liquid flow meter LFM01, and then evaporate to gas in the evaporator CEM; meanwhile, another nitrogen gas is sequentially passed through PV02, the first mass flow meter FMC01 to the evaporator CEM and mixed with TMA gas, and is output through the process gas Pipes (1-PV21 to 5-PV21) are sent to the PECVD reactor for processing.
TMA瓶底安装有电子秤,电子秤将TMA重量反馈给控制器,当TMA即将用尽时,控制器通过控制阀关闭相应的那套供气管路,启用另一套供气管路,而后在更换空的TMA瓶,藉此实现持续供气,不影响生产。An electronic scale is installed at the bottom of the TMA bottle. The electronic scale feedbacks the weight of the TMA to the controller. When the TMA is about to run out, the controller closes the corresponding set of gas supply lines through the control valve, activates another set of gas supply lines, and then replaces them. An empty TMA bottle, thereby achieving continuous gas supply without affecting production.
更换气瓶之前,需要先将送液管路中的TMA液体压回TMA瓶,用氮气吹 扫送液管路和送气管路,对送液管路和送气管路抽真空,然后更换TMA瓶,再用氮气吹扫送液管路和送气管路,再对送液管路和送气管路抽真空,最后用TMA瓶供液。Before replacing the gas bottle, you need to press the TMA liquid in the liquid supply line back to the TMA bottle, purge the liquid supply line and the gas supply line with nitrogen, evacuate the liquid supply line and the gas supply line, and then replace the TMA bottle. Then, the liquid feeding pipeline and the gas feeding pipeline are purged with nitrogen, and then the liquid feeding pipeline and the gas feeding pipeline are evacuated, and finally the liquid is supplied by a TMA bottle.
更换第一TMA瓶:第一步、TMA液体回压。氮气经第二质量流量计FMC02计算流量,再经PV06、PV25、PV19、MV13将送液管路中的TMA液体压回TMA瓶,MV13连接的管子伸入TMA瓶的底部,MV12连接的管子伸在TMA瓶的上部,因TMA液体回流TMA瓶上部的氮气经MV12、PV18、PV13、PV20排放掉;控制器接收第二质量流量计FMC02发来的流量值,预先设定好流量阈值,所测流量值累计达到流量阈值时TMA液体全部压回TMA瓶,此时停止液体回压。第二步、管道充氮气。操作人员手动关闭第十二手动阀MV12和第十三手动阀MV13,控制器关闭PV25、开启PV15,氮气经第二质量流量计FMC02、PV22、PV19、PV18、PV15向管路中冲入氮气并保压5分钟。第三步、管道抽真空。控制器关闭PV06、PV22、PV25,真空发生装置通过PV20、PV13、PV18、PV15、PV19对管道抽真空。第四步,多次重复第二步的管道充氮气和第三步的管道抽真空。第五步,更换第一TMA瓶。第六步,多次重复第二步的管道充氮气和第三步的管道抽真空。第七步,操作人员手动开启第十二手动阀MV12和第十三手动阀MV13,第一TMA瓶可以重新供液。Replace the first TMA bottle: the first step, back pressure of TMA liquid. The nitrogen flow is calculated by the second mass flow meter FMC02, and then the TMA liquid in the liquid delivery pipeline is returned to the TMA bottle through PV06, PV25, PV19, and MV13. The tube connected to MV13 extends into the bottom of the TMA bottle, and the tube connected to MV12 extends. In the upper part of the TMA bottle, the nitrogen in the upper part of the TMA bottle is discharged through the MV12, PV18, PV13, and PV20 due to the return of the TMA liquid; the controller receives the flow value from the second mass flow meter FMC02, and presets the flow threshold value. When the accumulated flow value reaches the flow threshold, the TMA liquid is fully returned to the TMA bottle, and the liquid back pressure is stopped at this time. The second step is to fill the pipeline with nitrogen. The operator manually closes the twelfth manual valve MV12 and the thirteenth manual valve MV13, the controller closes PV25 and opens PV15, and nitrogen is flushed into the pipeline through the second mass flow meter FMC02, PV22, PV19, PV18, and PV15. And hold for 5 minutes. The third step is to evacuate the pipe. The controller closes PV06, PV22, PV25, and the vacuum generating device evacuates the pipeline through PV20, PV13, PV18, PV15, and PV19. In the fourth step, the pipeline of the second step is repeatedly filled with nitrogen and the pipeline of the third step is evacuated. The fifth step is to replace the first TMA bottle. In the sixth step, the pipeline of the second step is repeatedly filled with nitrogen and the pipeline of the third step is evacuated. In the seventh step, the operator manually opens the twelfth manual valve MV12 and the thirteenth manual valve MV13, and the first TMA bottle can be refilled.
更换第二TMA瓶:第一步、TMA液体回压。氮气经第二质量流量计FMC02计算流量,再经PV07、PV24、PV17、MV11将送液管路中的TMA液体压回 TMA瓶,MV11连接的管子伸入TMA瓶的底部,MV10连接的管子伸在TMA瓶的上部,因TMA液体回流TMA瓶上部的氮气经MV10、PV16、PV12、PV20排放掉;控制器接收第二质量流量计FMC02发来的流量值,预先设定好流量阈值,所测流量值累计达到流量阈值时TMA液体全部压回TMA瓶,此时停止液体回压。第二步、管道充氮气。操作人员手动关闭第十手动阀MV10和第十一手动阀MV11,控制器关闭PV24、开启PV14,氮气经第二质量流量计FMC02、PV23、PV17、PV14、PV16向管路中冲入氮气并保压5分钟。第三步、管道抽真空。控制器关闭PV07、PV23、PV24,真空发生装置通过PV20、PV12、PV16、PV14、PV17对管道抽真空。第四步,多次重复第二步的管道充氮气和第三步的管道抽真空。第五步,更换第二TMA瓶。第六步,多次重复第二步的管道充氮气和第三步的管道抽真空。第七步,操作人员手动开启第十手动阀MV10和第十一手动阀MV11,第二TMA瓶可以重新供液。Replace the second TMA bottle: the first step, back pressure of TMA liquid. The nitrogen flow is calculated by the second mass flow meter FMC02, and then the TMA liquid in the liquid delivery line is returned to the TMA bottle through PV07, PV24, PV17, and MV11. The tube connected by MV11 extends into the bottom of the TMA bottle, and the tube connected by MV10 extends. In the upper part of the TMA bottle, the nitrogen in the upper part of the TMA bottle is discharged through the MV10, PV16, PV12, PV20 due to the return of the TMA liquid; the controller receives the flow value from the second mass flow meter FMC02, and presets the flow threshold value. When the accumulated flow value reaches the flow threshold, the TMA liquid is fully returned to the TMA bottle, and the liquid back pressure is stopped at this time. The second step is to fill the pipeline with nitrogen. The operator manually closes the tenth manual valve MV10 and the eleventh manual valve MV11. The controller closes PV24 and opens PV14. Nitrogen is flushed into the pipeline through the second mass flow meter FMC02, PV23, PV17, PV14, and PV16 to ensure that Press for 5 minutes. The third step is to evacuate the pipe. The controller closes PV07, PV23, PV24, and the vacuum generating device evacuates the pipeline through PV20, PV12, PV16, PV14, and PV17. In the fourth step, the pipeline of the second step is repeatedly filled with nitrogen and the pipeline of the third step is evacuated. The fifth step is to replace the second TMA bottle. In the sixth step, the pipeline of the second step is repeatedly filled with nitrogen and the pipeline of the third step is evacuated. In the seventh step, the operator manually opens the tenth manual valve MV10 and the eleventh manual valve MV11, and the second TMA bottle can be refilled.
以上实施例仅为举例说明,并不用以限制本实用新型,凡在本实用新型的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本实用新型的保护范围之内。The above embodiments are merely examples and are not intended to limit the present invention. Any modification, equivalent replacement, and improvement made within the spirit and principles of the present invention shall be included in the protection scope of the present invention. .

Claims (9)

  1. 一种管式PECVD炉TMA供气系统,其特征在于:包括依次连接的氮气源、送气管路、TMA瓶、送液管路、液体流量计(LFM01)、蒸发器(CEM)、工艺气体输出管路,所述氮气源与蒸发器之间还串接混气管路和第一质量流量计(FMC01),所述送气管路中串接送气阀、送液管路中串接送液阀、混气管路中串接混气阀(PV02),所述液体流量计和第一质量流量计连接控制器,控制器控制送气阀、送液阀和混气阀的启闭,并根据两流量计所测流量控制液体流量计和第一质量流量计的开启度。A TMA gas supply system for a tubular PECVD furnace, which is characterized in that it includes a nitrogen source, an air supply pipeline, a TMA bottle, a liquid supply pipeline, a liquid flow meter (LFM01), an evaporator (CEM), and a process gas output connected in sequence. A pipeline is connected in series between the nitrogen source and the evaporator, and a first mass flow meter (FMC01) is connected in series. A gas mixing valve (PV02) is connected in series in the gas pipeline. The liquid flow meter and the first mass flow meter are connected to a controller. The controller controls the opening and closing of the gas feeding valve, the liquid feeding valve, and the gas mixing valve. The flow measurement controls the opening of the liquid flow meter and the first mass flow meter.
  2. 如权利要求1所述的管式PECVD炉TMA供气系统,其特征在于:所述送气管路包括第一、第二送气管路,所述TMA瓶包括第一、第二TMA瓶,所述送液管路包括第一、第二送液管路;其中The TMA gas supply system for a tubular PECVD furnace according to claim 1, wherein the gas supply pipeline includes first and second gas supply pipelines, and the TMA bottle includes first and second TMA bottles, and The liquid feeding pipeline includes first and second liquid feeding pipelines;
    第一送气管路、第一TMA瓶和第一送液管路依次串联后连接所述液体流量计(LFM01),第一送气管路中串接第一送气阀(PV10),第一送液管路中串接第一送液阀(PV11);The first air supply line, the first TMA bottle, and the first liquid supply line are connected in series to the liquid flow meter (LFM01). The first air supply line is connected to the first air supply valve (PV10) and the first liquid supply. The first liquid feeding valve (PV11) is connected in series in the pipeline;
    第二送气管路、第二TMA瓶和第二送液管路依次串联后连接所述液体流量计(LFM01),第二送气管路中串接第二送气阀(PV08),第二送液管路中串接第二送液阀(PV09);The second air supply line, the second TMA bottle, and the second liquid supply line are connected in series to the liquid flow meter (LFM01), and the second air supply line is connected to the second air supply valve (PV08) and the second liquid supply The second liquid feeding valve (PV09) is connected in series in the pipeline;
    所述控制器控制所述第一送气阀、第一送液阀、第二送气阀、第二送液阀的启闭。The controller controls the opening and closing of the first air-supply valve, the first liquid-supply valve, the second air-supply valve, and the second liquid-supply valve.
  3. 如权利要求2所述的管式PECVD炉TMA供气系统,其特征在于:所述第一TMA瓶具有进气口和出液口、其进气口上设有第十二手动阀(MV12)、其出液口上设有第十三手动阀(MV13),第十二手动阀(MV12)至第一送气阀(PV10)之间连接第十八控制阀(PV18),第十三手动阀(MV13)至第一送液阀(PV11)之间依次连接第十九控制阀(PV19)、第二十五控制阀(PV25),第一送气阀(PV10)至第十八控制阀(PV18)之间的管路、和第二十五控制阀(PV25)至第十九控制阀(PV19)的管路、这两个管路之间连接第十五控制阀(PV15);The TMA gas supply system for a tubular PECVD furnace according to claim 2, wherein the first TMA bottle has an air inlet and a liquid outlet, and a twelfth manual valve (MV12) is provided on the air inlet. 13 、 The thirteenth manual valve (MV13) is set on the liquid outlet. The eighteenth control valve (PV18) and the thirteenth manual valve are connected between the twelfth manual valve (MV12) and the first air supply valve (PV10). (MV13) to the first liquid delivery valve (PV11) are connected in order from the 19th control valve (PV19), the 25th control valve (PV25), the first air supply valve (PV10) to the 18th control valve (PV18) ), And the 25th control valve (PV25) to the 19th control valve (PV19), the 15th control valve (PV15) is connected between these two lines;
    所述第二TMA瓶具有进气口和出液口、其进气口上设有第十手动阀(MV10)、其出液口上设有第十一手动阀(MV11),第十手动阀(MV10)至第二送气阀(PV08)之间连接第十六控制阀(PV16),第十一手动阀(MV11)至第二送液阀(PV09)之间依次连接第十七控制阀(PV17)、第二十四控制阀(PV24),第二送气阀(PV08)至第十六控制阀(PV16)之间的管路、和第二十四控制阀(PV24)至第十七控制阀(PV17)的管路、这两个管路之间连接第十四控制阀(PV14);The second TMA bottle has an air inlet and a liquid outlet. The air inlet is provided with a tenth manual valve (MV10), the liquid outlet is provided with an eleventh manual valve (MV11), and the tenth manual valve (MV10). ) To the second air supply valve (PV08) is connected to the sixteenth control valve (PV16), and the eleventh manual valve (MV11) to the second liquid supply valve (PV09) is connected in order to the seventeenth control valve (PV17) The line between the twenty-fourth control valve (PV24), the second air supply valve (PV08) to the sixteenth control valve (PV16), and the twenty-fourth control valve (PV24) to the seventeenth control valve (PV24) PV17) pipeline, and the fourteenth control valve (PV14) is connected between these two pipelines;
    所述氮气源连接第二质量流量计(FMC02),第二质量流量计(FMC02)的流出口通过第六控制阀(PV06)连接第一送液阀(PV11)至第二十五控制阀(PV25)之间的管路,第二质量流量计(FMC02)的流出口通过第二十二控制阀(PV22)连接第二十五控制阀(PV25)至第十九控制阀(PV19)之间的管 路;第二质量流量计(FMC02)的流出口通过第七控制阀(PV07)连接第二送液阀(PV09)至第二十四控制阀(PV24)之间的管路,第二质量流量计(FMC02)的流出口通过第二十三控制阀(PV23)连接第二十四控制阀(PV24)至第十七控制阀(PV17)的管路;The nitrogen source is connected to the second mass flow meter (FMC02), and the outflow port of the second mass flow meter (FMC02) is connected to the first liquid feeding valve (PV11) to the twenty-fifth control valve (PV11) through a sixth control valve (PV06). PV25), the outlet of the second mass flow meter (FMC02) is connected between the twenty-fifth control valve (PV25) to the nineteenth control valve (PV19) through the twenty-second control valve (PV22) The pipeline of the second mass flow meter (FMC02) is connected to the pipeline between the second liquid delivery valve (PV09) and the twenty-fourth control valve (PV24) through the seventh control valve (PV07), and the second The outlet of the mass flow meter (FMC02) is connected to the pipeline from the twenty-fourth control valve (PV24) to the seventeenth control valve (PV17) through the twenty-third control valve (PV23);
    第一送气阀(PV10)至第十八控制阀(PV18)之间的管路通过第十三控制阀(PV13)耦合连接真空发生装置,第二送气阀(PV08)至第十六控制阀(PV16)之间的管路通过第十二控制阀(PV12)耦合连接真空发生装置;The pipeline between the first air supply valve (PV10) to the eighteenth control valve (PV18) is coupled to the vacuum generating device through the thirteenth control valve (PV13), and the second air supply valve (PV08) to the sixteenth control valve (PV08) The pipeline between PV16) is coupled to the vacuum generating device through the twelfth control valve (PV12);
    所述控制器接收所述第二质量流量计(FMC02)所测计量,所述控制器控制所述第六至第十九控制阀的启闭、以及控制所述第二十二至第二十五控制阀(PV25)的启闭。The controller receives the measurement measured by the second mass flow meter (FMC02), the controller controls opening and closing of the sixth to nineteenth control valves, and controls the twenty-second to twentieth Opening and closing of five control valves (PV25).
  4. 如权利要求3所述的管式PECVD炉TMA供气系统,其特征在于:所述第十二控制阀(PV12)和第十三控制阀(PV13)皆通过第二十控制阀(PV20)连接真空发生装置。The TMA gas supply system for a tubular PECVD furnace according to claim 3, wherein the twelfth control valve (PV12) and the thirteenth control valve (PV13) are connected through a twentieth control valve (PV20) Vacuum generating device.
  5. 如权利要求4所述的管式PECVD炉TMA供气系统,其特征在于:所述第一质量流量计(FMC01)的流出口连接所述蒸发器(CEM)、还通过第一控制阀(PV01)连接所述工艺气体输出管路。The TMA gas supply system for a tube-type PECVD furnace according to claim 4, characterized in that the outflow port of the first mass flow meter (FMC01) is connected to the evaporator (CEM), and also through a first control valve (PV01) ) Connect the process gas output pipeline.
  6. 如权利要求5所述的管式PECVD炉TMA供气系统,其特征在于:所述工艺气体输出管路通过第五控制阀(PV05)连接真空发生装置,所述蒸发器(CEM)的排气口通过第四控制阀(PV04)连接真空发生装置。The TMA gas supply system for a tubular PECVD furnace according to claim 5, wherein the process gas output pipe is connected to a vacuum generating device through a fifth control valve (PV05), and the exhaust gas of the evaporator (CEM) The port is connected to a vacuum generating device through a fourth control valve (PV04).
  7. 如权利要求6所述的管式PECVDPR002炉TMA供气系统,其特征在于:所述氮气源的输出口串接减压阀(PR002)和纯化器(P01)。The tube-type PECVDPR002 furnace TMA gas supply system according to claim 6, characterized in that: the output port of the nitrogen source is connected in series with a pressure reducing valve (PR002) and a purifier (P01).
  8. 如权利要求7所述的管式PECVDPR002炉TMA供气系统,其特征在于:所述工艺气体输出管路设有5个气体输出口。The tube-type PECVDPR002 furnace TMA gas supply system according to claim 7, wherein the process gas output pipeline is provided with five gas output ports.
  9. 如权利要求2至8任一项所述的管式PECVDPR002炉TMA供气系统,其特征在于:所述第一TMA瓶和第二TMA瓶的底部皆安装有电子秤,电子秤将所称重量值发给所述控制器,控制器根据第一TMA瓶和第二TMA瓶中的TMA液量而控制其中一个TMA瓶供液。The TMA gas supply system for a tubular PECVDPR002 furnace according to any one of claims 2 to 8, characterized in that an electronic scale is installed at the bottom of the first TMA bottle and the second TMA bottle, and the electronic scale will weigh the weight The value is sent to the controller, and the controller controls one of the TMA bottles to supply liquid according to the amount of TMA liquid in the first TMA bottle and the second TMA bottle.
PCT/CN2019/072726 2018-07-17 2019-01-22 Tma gas supply system for tubular pecvd furnace WO2020015347A1 (en)

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CN110983300B (en) * 2019-12-04 2023-06-20 江苏菲沃泰纳米科技股份有限公司 Coating equipment and application thereof

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CN1943019A (en) * 2004-06-15 2007-04-04 株式会社日立国际电气 Substrate processing equipment and semiconductor device manufacturing method
CN101921994A (en) * 2010-07-30 2010-12-22 北京印刷学院 Device and method for depositing ultrathin alumina film by atomic layer
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