WO2020015300A1 - 调节机构、微透镜阵列系统及曝光机 - Google Patents

调节机构、微透镜阵列系统及曝光机 Download PDF

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Publication number
WO2020015300A1
WO2020015300A1 PCT/CN2018/122481 CN2018122481W WO2020015300A1 WO 2020015300 A1 WO2020015300 A1 WO 2020015300A1 CN 2018122481 W CN2018122481 W CN 2018122481W WO 2020015300 A1 WO2020015300 A1 WO 2020015300A1
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WIPO (PCT)
Prior art keywords
adjusting
adjustment
mounting base
box
microlens array
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PCT/CN2018/122481
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English (en)
French (fr)
Inventor
汪孝军
徐珍华
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中山新诺科技股份有限公司
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Publication of WO2020015300A1 publication Critical patent/WO2020015300A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device

Definitions

  • the invention relates to the technical field of optical adjustment of an exposure machine, in particular to an adjustment mechanism, a microlens array system and an exposure machine.
  • Micro lens array is an array structure composed of lenses with a clear aperture and a relief depth of micron order. As an important optical element, it not only has the basic functions of focusing and imaging of traditional lenses Moreover, it also has the characteristics of small unit size and high integration, which enables it to complete functions that traditional optical elements cannot complete, and forms a new type of optical system.
  • the pixels of the maskless exposure system (Digital Micromirror Device, DMD system for short) need to be further reduced, and the function of reducing the pixels can be achieved by using a microlens array.
  • the concave dot array of the micro lens array needs to correspond to the pixel array of the DMD system one-to-one. Therefore, the micro lens array needs to be fine-tuned so that it corresponds to the pixel array of the DMD system.
  • the adjustment mechanism can adjust the position of the microlens array to improve the accuracy of subsequent graphic exposure.
  • the microlens array system uses this adjustment mechanism to improve the position accuracy of the microlens array system when used.
  • the exposure machine includes a microlens array system to make graphics The quality of the exposure is higher.
  • an adjustment mechanism including an adjustment box, the adjustment box is provided with a first through window; a first mounting seat, the first mounting seat is disposed in the adjustment box, and is used to install a microlens array, the microlens array and the first A through window is provided correspondingly; and an adjusting member, one end of the adjusting member extends into the adjusting box, a plurality of adjusting members are arranged at a distance, and are arranged telescopically on the outside of the adjusting box, and the adjusting member is telescopic and resists the first installation.
  • the first mounting seat moves in a first direction and a second direction.
  • the depth of the plurality of adjustment members protruding into the adjustment box is adjusted, so that the different adjustment members press the first mounting seat, thereby
  • the position of the first mount is changed, and the technical effect of adjusting the position of the microlens array on the first mount is achieved, so that the concave point array of the microlens array corresponds to the pixel array of the exposure module one by one, and the subsequent graphic exposure quality is improved.
  • the adjusting member includes a first adjusting member and a second adjusting member.
  • the first adjusting member is provided in a plurality and is respectively disposed on the first side and the second side opposite to the adjusting box.
  • the second adjusting member There are a plurality of third sides and a fourth side that are respectively disposed opposite to the adjustment box.
  • it further includes a protection sheet.
  • the protection sheet is provided in a plurality and surrounds the outer side of the first mounting seat. The first adjustment member and the second adjustment both press the protection sheet and make the protection sheet press against the first. One mount moves.
  • the protective sheet includes a first protective sheet, two first protective sheets are provided on opposite sides of the first mounting seat, and four first adjusting members are provided, two of which are The first adjustment member presses against a first protection sheet, and the other two first adjustment members press against another first protection sheet;
  • the protection sheet includes a second protection sheet, two second protection sheets are provided on opposite sides of the first mounting seat, four second adjustment members are provided, and two of the second adjustment members are pressed against One second protection sheet, and the other two second adjusting members are pressed against the other second protection sheet.
  • the two ends of the first protective sheet are provided with first mating grooves, and the two ends of the second protective sheet are provided with first mating bars.
  • a mating strip moves, and the first mating strip moves along the groove wall of the first mating groove when the second protective sheet moves;
  • first protective sheet is provided with a second mating strip
  • second protective sheet is provided with a second mating slot
  • the second mating strip moves along the groove wall of the second mating slot when the first protective sheet is moved
  • the second mat The groove wall of the two matching grooves moves along the second matching bar.
  • the adjusting member further includes a third adjusting member.
  • One end of the third adjusting member extends into the adjusting box.
  • the third adjusting member is telescopically provided on the outside of the adjusting box.
  • the third adjusting member is retractable and resists. Press the first mounting base to move the first mounting base in the third direction.
  • the adjustment box includes a box cover body and a cover plate that cooperates with the box cover body, and an elastic member is also provided in the adjustment box, and two ends of the elastic member are respectively connected to the cover plate and the first mounting seat.
  • the adjusting member includes an adjusting screw, rotates the plurality of adjusting screws, presses the adjusting screws to different positions of the first mounting base, and places the first mounting base in the first direction, the second direction, and the third direction. Direction.
  • a microlens array system including the microlens array; and the adjustment mechanism according to any one of the above technical solutions, the first mounting seat of the adjustment mechanism is provided with a first mounting groove, and the microlens array is provided with It is arranged in the first mounting groove and corresponding to the first through window.
  • the aforementioned microlens array system uses the aforementioned adjustment mechanism, so that the position of the microlens array can be accurately adjusted, so that the adjusted position and the position of the exposure component correspond to each other, and the accuracy of subsequent graphic exposure is improved.
  • an exposure machine which includes an exposure component; an objective lens component; a second mounting base, the second mounting base is arranged in a cylindrical structure; and the microlens array system and microlens array according to any one of the above technical solutions.
  • the system and the objective lens assembly are respectively disposed on both sides of the second mounting base, and the objective lens assembly is disposed between the exposure assembly and the second mounting base.
  • the above exposure machine adopts the aforementioned micro lens array system, the quality of pattern exposure is higher, and the product yield and processing accuracy are improved.
  • FIG. 1 is an exploded view of a microlens array system in an embodiment
  • FIG. 2 is a schematic diagram of the overall structure of the cover body in the embodiment
  • FIG. 3 is an exploded view of a part of the structure of the exposure machine in the embodiment.
  • micro lens array system 110, micro lens array, 121, cover body, 122, cover plate, 123, first through window, 130, first mounting base, 131, first mounting groove, 141, first adjusting member , 142, second adjusting member, 143, third adjusting member, 144, locking member, 151, first protective sheet, 152, second protective sheet, 153, first mating groove, 154, first mating strip, 160 , Elastic piece, 200, exposure component, 300, objective lens component, 400, second mount.
  • FIG. 1 to FIG. 3 provides an adjusting mechanism including an adjusting box, the adjusting box is provided with a first through window 123, a first mounting base 130, and the first mounting base 130 is provided in the adjusting box, It is also used to install the microlens array 110, and the microlens array 110 is arranged corresponding to the first through window 123; and an adjusting member, one end of the adjusting member extends into the adjusting box, and the adjusting member is provided at a plurality of intervals and is provided in a retractable manner. On the outside of the adjusting box, the adjusting member expands and contracts and presses the first mounting base 130 to move the first mounting base 130 in the first direction and the second direction.
  • the depth of the plurality of adjusting members protruding into the adjusting box is adjusted, so that the different adjusting members are pressed against the first mounting base 130, so that The position of the first mounting base 130 changes to achieve the technical effect of adjusting the position of the microlens array 110 on the first mounting base 130, so that the concave point array of the microlens array 110 corresponds to the pixel array of the DMD system one by one, which improves the subsequent Graphic exposure quality.
  • the pixel size of the DMD system needs to be further reduced, while the traditional high-power objective method takes up a large space, has a complicated lens group structure and high cost.
  • the use of the microlens array 110 can avoid this problem.
  • a one-to-one correspondence between the concave point array of the microlens array 110 and the pixel array of the DMD system is required to obtain a better exposure effect, and currently there is no mechanism that is convenient to operate and has high adjustment accuracy.
  • a plurality of adjusting members are provided.
  • the adjusting members are arranged at a distance and are used to press the first mounting base 130, so that different adjusting members press different positions of the first mounting base 130.
  • the position of the first mounting base 130 is changed by adjusting the positions of different adjusting members, thereby realizing the position adjustment of the first mounting base 130. Since there are multiple adjusting members, the first mounting base can be precisely adjusted.
  • the position angle of each position 130 can achieve the technical effect of precise adjustment.
  • the micro lens array 110 is set on the first mounting base 130, that is, the precise position adjustment of the micro lens array 110 is achieved.
  • the adjusting mechanism further includes a locking member 144 provided on the outside of the adjusting box.
  • One end of the locking member 144 extends into the adjusting box and presses against the first mounting base 130.
  • the locking member 144 also presents The telescopically cooperates with the adjustment box. After the position of the first mounting base 130 is adjusted by the adjustment member, the locking member 144 is further adjusted to adjust the position to fix the previous position adjustment result, avoiding subsequent offsets and affecting the adjustment accuracy, thereby further improving Position adjustment accuracy.
  • the locking member 144 is a screw structure, and one end of the locking member 144 is pressed against the outer side wall of the first mounting base 130.
  • the screw structure has simple operation and low cost.
  • a plurality of adjusting members are arranged around the outside of the adjusting box, so as to adjust the position of the first mounting base 130 at various angles.
  • first direction and the second direction are two directions arranged at an included angle.
  • first direction is the X-axis direction
  • second direction is the Y-axis direction
  • the X-axis and the Y-axis are arranged perpendicularly.
  • first mounting base 130 is realized on the X-axis through the expansion and contraction of multiple adjusting members. Position adjustment in the horizontal plane formed with the Y axis.
  • the first rotation of the first mounting base 130 can be finely adjusted by adjusting the multiple adjusting members on opposite sides to more accurately adjust the micro lens array 110 and the DMD system.
  • Positional relationship of the middle exposure component 200 For example, a plurality of adjusting members are operated to shift a plurality of side portions of the first mounting base 130, so as to finally form a micro-rotation adjustment result.
  • the first pass-through window 123 is provided so that the laser can pass through the adjustment box and reach the microlens array. Those skilled in the art can set different structures of the first pass-through window 123 according to needs, which will not be repeated here.
  • the corresponding arrangement of the microlens array 110 and the first through window 123 means that the laser can reach the microlens array 110 through the first through window 123.
  • Those skilled in the art can use the microlens array 110 in the prior art to set the various settings required to receive laser light. This structure is not repeated here.
  • the adjusting member includes a first adjusting member 141 and a second adjusting member 142.
  • the first adjusting member 141 is provided in a plurality and is disposed on the first side and the opposite side of the adjusting box.
  • On the second side a plurality of second adjusting members 142 are provided, and are respectively disposed on the third side and the fourth side opposite to the adjusting box.
  • the setting of the plurality of first adjusting members 141 and the plurality of second adjusting members 142 facilitates the precise movement of the first mounting base 130 in the X-axis and the Y-axis and a slight rotation through operation.
  • the first adjusting member 141 on the first side may be used to perform a callback to avoid the problem of excessive adjustment and achieve more precise adjustment.
  • first adjusting members 141 and two second adjusting members 142 there are four first adjusting members 141 and two second adjusting members 142.
  • Two first adjusting members 141 are provided on the first side of the adjusting box, and two other first adjusting members 141 are provided on the second side of the adjusting box; one second adjusting member 142 is provided on the third side of the adjusting box, and the other The second adjusting member 142 is disposed on a fourth side of the adjusting box.
  • the first side and the second side are oppositely disposed, and the third side and the fourth side are oppositely disposed.
  • the adjustment mechanism further includes a protection sheet.
  • the protection sheet is provided in a plurality and surrounds the outside of the first mounting base 130.
  • the first adjustment member 141 and the second adjustment are pressed against each other.
  • the protection sheet moves the protection sheet against the first mounting base 130.
  • the first mounting base 130 is made of a relatively rigid material to protect the microlens array 110 inside, and the protective sheet is used to be pressed, so The rigidity of the first mounting base 130 should be stronger than that of the first mounting base 130, so that when the first mounting base 130 is pressed, the protection sheet is pressed, thereby avoiding the deformation of the first mounting base 130 after the end of the adjusting member is pressed. .
  • a special pressing portion may be provided on the first mounting base 130, and the first adjusting member 141 or the second adjusting member 142 is pressed against the pressing portion, thereby protecting the first mounting base.
  • the function of 130 may be selected by those skilled in the art according to the needs, and is not repeated here.
  • the protection sheet includes a first protection sheet 151, two first protection sheets 151 are provided, and are respectively disposed on opposite sides of the first mounting base 130, and the first adjusting member 141 There are four, two of the first adjusting pieces 141 are pressed against one first protection piece 151, and the other two of the first adjusting pieces 141 are pressed against the other first protection piece 151;
  • the protection sheet includes a second protection sheet 152.
  • the second protection sheet 152 is provided in two, and is disposed on two opposite sides of the first mounting base 130.
  • the second adjusting member 142 is provided in four, two of which are second. The adjusting member 142 is pressed against one second protective sheet 152, and the other two second adjusting members 142 are pressed against the other second protective sheet 152.
  • first protection pieces 151 are provided on the outside of the first mounting base 130 and correspond to the first and second sides of the adjustment box; the second protection piece 152 is also provided.
  • Two which are respectively disposed on the outer side of the first mounting base 130, and correspond to the third and fourth sides of the adjusting box; four first adjusting members 141 are provided, and two of the first adjusting members 141 are arranged at intervals.
  • the other two first adjusting members 141 are also arranged at a distance and for pressing the second protective sheet 152 corresponding to the second side position, and
  • the two first adjusting members 141 on the first side are correspondingly disposed with the two first adjusting members 141 on the second side;
  • the two second adjusting members 142 are respectively disposed on the first mounting seats corresponding to the third and fourth sides.
  • two second adjusting members 142 are correspondingly arranged.
  • the first direction is the X-axis direction
  • the second direction is the Y-axis direction.
  • the two first adjusting members 141 corresponding to the first side adjust the same distance to move the first mounting base 130 in the X-axis direction, or the two first adjusting members 141 corresponding to the first side adjust different distances so that The first mounting base 130 rotates slightly.
  • the two first adjusting members 141 corresponding to the second side need to be adjusted.
  • the second adjusting member 142 can cooperate with the first mounting base 130 to move in the Y-axis direction. It is easy for people to know how to adjust specifically, so I wo n’t repeat them here.
  • first mating grooves 153 are provided at both ends of the first protective sheet 151, and first mating strips 154 are provided at both ends of the second protective sheet 152.
  • the groove wall of the mating groove 153 moves along the first mating strip 154, and the first mating strip 154 moves along the groove wall of the first mating groove 153 when the second protection sheet 152 moves;
  • first protective sheet 151 is provided with a second mating strip
  • second protective sheet 152 is provided with a second mating slot
  • the second protective strip moves along the groove wall of the second mating slot when the first protective sheet 151 moves
  • the second protective sheet When 152 moves, the groove wall of the second fitting groove moves along the second fitting bar.
  • the first mating groove 153 is provided in a concave-shaped structure, and the first mating strip 154 is provided in a convex-shaped structure.
  • the first protection piece 151 moves under the pressure of the first adjusting member 141
  • the first protection The first engaging groove 153 of the sheet 151 moves along the first convex-shaped structure; similarly, when the second protective sheet 152 moves under the pressure of the second adjusting member 142, the first engaging strip 154 of the second protective sheet 152 Moving along the groove wall of the first matching groove 153 prevents displacement or tilting during movement, and improves adjustment accuracy.
  • first protection sheet 151 and the second protection sheet 152 may be a plastic sheet structure or other structures that meet requirements, and will not be repeated here.
  • the adjusting member further includes a third adjusting member 143.
  • One end of the third adjusting member 143 extends into the adjusting box.
  • the third adjusting member 143 is telescopically provided on the outside of the adjusting box.
  • the third adjusting member 143 expands and contracts and presses the first mounting base 130 to move the first mounting base 130 in a third direction.
  • the third adjusting member 143 expands and contracts in the adjusting box to press the first mounting base 130 to move in the third direction, thereby realizing further adjustment of the position of the micro lens array 110, so that the micro lens array 110 and the exposure module 200 of the DMD system are at Same focal plane.
  • the third direction is a Z-axis direction
  • the Z-axis direction is disposed perpendicular to a plane formed by the X-axis and the Y-axis. Therefore, through the cooperation of the first adjusting member 141, the second adjusting member 142, and the third adjusting member 143, the degree of freedom of movement of the first mounting base 130 in three directions of X, Y, and Z, and about the Z axis can be achieved.
  • the degree of freedom of micro-rotation that is, the position adjustment of four degrees of freedom is achieved, so that the microlens array 110 on the first mounting base 130 can adjust the position with multiple degrees of freedom and increase the position adjustment accuracy.
  • the adjustment box includes a box cover body 121 and a cover plate 122 that cooperates with the box cover body 121.
  • An elastic member 160 is also provided in the adjustment box. Two ends of the elastic member 160 are respectively connected to the cover plate 122 and The first mounting base 130 is connected.
  • the setting of the elastic member 160 makes it possible to improve the pre-tightening force between the third adjusting member 143 and the cover plate 122 and to prevent the third adjusting member 143 from adjusting the back cover 122 to loosen or generate displacement, thereby affecting the adjustment result.
  • the elastic member 160 is a compression spring, and the compression spring is disposed between the cover plate 122 and the first mounting base 130. After the third adjustment member 143 is adjusted, one end of the compression spring presses the cover plate due to the effect of the compression spring. 122, so that the cover plate 122 cannot be moved, thereby preventing the cover plate 122 from loosening or rotating (for example, when the cover plate 122 is threaded with the box body), and improving the adjustment accuracy of the third adjusting member 143.
  • one end of the compression spring may be fixed to the third adjusting member 143, and the other end of the compression spring may be fixed to the cover plate 122.
  • the adjusting member includes an adjusting screw, and the plurality of adjusting screws are rotated so that the adjusting screws respectively press the different positions of the first mounting base 130, and the first mounting base 130 is in a first direction. , Second and third directions.
  • the first adjusting member 141, the second adjusting member 142, the third adjusting member 143, and the locking member 144 are all adjusting screw structures, which are extended and retracted by rotation to respectively press the first mounting seat.
  • the corresponding position of 130 realizes the position adjustment of the first mounting base 130.
  • a microlens array system 100 is further provided, including a microlens array 110; and the adjustment mechanism according to any one of the above embodiments, the first mounting base 130 of the adjustment mechanism.
  • a first mounting groove 131 is provided.
  • the microlens array 110 is disposed in the first mounting groove 131 and is disposed corresponding to the first through window 123.
  • the aforementioned adjustment mechanism is adopted, so that the position of the microlens array 110 can be accurately adjusted, so that the adjusted position and the position of the exposure module 200 correspond to each other, thereby improving the accuracy of subsequent pattern exposure.
  • an exposure machine which includes an exposure assembly 200; an objective lens assembly 300; a second mounting base 400, and the second mounting base 400 is arranged in a cylindrical structure; and any one of the above embodiments
  • the micro lens array system 100, the micro lens array system 100, and the objective lens assembly 300 are respectively disposed on two sides of the second mounting base 400, and the objective lens assembly 300 is disposed between the exposure assembly 200 and the second mounting base 400.
  • micro-lens array system 100 Because the aforementioned micro-lens array system 100 is used, the quality of graphic exposure is higher, and the product yield and processing accuracy are improved.
  • the corresponding setting of the microlens array 110 and the first through window 123, and the exposure module 200, the objective lens module 300, the second mounting base 400, and the microlens array refer to the corresponding settings in the prior art that can meet the requirements of exposure or laser passing. Those skilled in the art can make specific settings according to any setting method in the prior art, and will not be repeated here.
  • the exposure module 200 of the DMD system is provided on the upper portion, and the lower portion of the exposure module 200 is provided with the objective lens module 300.
  • 400 is used to mount or fix the lens barrel and other structures of the objective lens assembly 300, and the other end of the second mounting base 400 is used to connect the microlens array system 100.
  • the exposure system also includes a CCD device (Charge Coupled Device) for observation.
  • CCD device Charge Coupled Device
  • the pixel display is clear; finally, the
  • the laser light enters the objective lens assembly 300 from the DMD system, then passes through the barrel of the second mount 400, and finally reaches the microlens array 110 of the microlens array system 100.

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种调节机构、微透镜阵列系统及曝光机，调节机构包括调节箱；第一安装座，用于安装微透镜阵列（110）；及调节件（141，142，143），调节件的一端伸入调节箱，调节件呈间距设有多个、并呈可伸缩地设于调节箱的外侧，调节件伸缩、并抵压第一安装座（130）、使第一安装座在第一方向和第二方向进行移动。微透镜阵列包括调节机构。曝光机包括微透镜阵列系统（100）。通过调节件的设置，当需要调节微透镜阵列与曝光组件（200）之间的位置关系时，调节多个调节件伸入调节箱的深度，使不同调节件抵压第一安装座、从而使第一安装座的位置发生变化，实现调整第一安装座上微透镜阵列位置的技术效果，从而使微透镜阵列的凹面点阵列与曝光组件的像素阵列一一对应，提高后续的图形曝光质量。

Description

调节机构、微透镜阵列系统及曝光机 技术领域
本发明涉及曝光机的光学调节技术领域，特别是涉及一种调节机构、微透镜阵列系统及曝光机。
背景技术
微透镜阵列(Micro lens array，亦简称MLA)是由通光孔径及浮雕深度为微米级的透镜组成的阵列结构，作为一种重要的光学元件，其不仅具有传统透镜的聚焦、成像等基本功能，而且还具有单元尺寸小、集成度高的特点，使得它能够完成传统光学元件无法完成的功能，并构成新型的光学系统。
曝光机在曝光时，若要曝光更加精密的图案，则无掩模曝光系统(Digital Micromirror Device，简称DMD系统)的像素需进一步缩小，采用微透镜阵列能够实现该像素缩小的功能。使用时，微透镜阵列的凹面点阵列需与DMD系统的像素阵列一一对应。因此，需对微透镜阵列进行微调、以使其与DMD系统的像素阵列对应。
发明内容
基于此，有必要提供一种调节机构、微透镜阵列系统及曝光机。该调节机构能够对微透镜阵列进行位置调节，提高后续图形曝光的精度；微透镜阵列系统采用该调节机构，提高了微透镜阵列系统使用时的位置精度；曝光机包括微透镜阵列系统，使图形曝光的质量更高。
其技术方案如下：
一方面，提供了一种调节机构，包括调节箱，调节箱设有第一通窗；第一安装座，第一安装座设于调节箱内、并用于安装微透镜阵列，微透镜阵列与第一通窗对应设置；及调节件，调节件的一端伸入调节箱，调节件呈间距设有多个、并呈可伸缩地设于调节箱的外侧，调节件伸缩、并抵压第一安装座、使第一安装座在第一方向和第二方向进行移动。
上述调节机构，通过调节件的设置，当需要调节微透镜阵列与曝光组件之间的位置关系时，调节多个调节件伸入调节箱的深度，使不同调节件抵压第一安装座、从而使第一安装座的位置发生变化，实现调整第一安装座上微透镜阵列位置的技术效果，从而使微透镜阵列的凹面点阵列与曝光组件的像素阵列一一对应，提高后续的图形曝光质量。
下面进一步对技术方案进行说明：
在其中一个实施例中，调节件包括第一调节件和第二调节件，第一调节件设有多个、并分别设于调节箱相对设置的第一侧和第二侧，第二调节件设有多个、并分别设于调节箱相对设置的第三侧和第四侧。
在其中一个实施例中，还包括保护片，保护片设有多个、并环绕设于第一安装座的外侧，第一调节件和第二调节均抵压保护片、使保护片抵压第一安装座移动。
在其中一个实施例中，保护片包括第一保护片，第一保护片设有两个、并分别设于第一安装座的相对两侧，第一调节件设有四个，其中的两个第一调节件抵压一个第一保护片，其中的另外两个第一调节件抵压另一个第一保护片；
或保护片包括第二保护片，第二保护片设有两个、并分别设于第一安装座的相对两侧，第二调节件设有四个，其中的两个第二调节件抵压一个第二保护片，其中的另外两个第二调节件抵压另一个第二保护片。
在其中一个实施例中，第一保护片的两端设有第一配合槽，第二保护片的两端设有第一配合条，第一保护片移动时第一配合槽的槽壁沿第一配合条移动，第二保护片移动时第一配合条沿第一配合槽的槽壁移动；
或第一保护片设有第二配合条，第二保护片设有第二配合槽，第一保护片移动时第二配合条沿第二配合槽的槽壁移动，第二保护片移动时第二配合槽的槽壁沿第二配合条移动。
在其中一个实施例中，调节件还包括第三调节件，第三调节件的一端伸入调节箱，第三调节件呈可伸缩地设于调节箱的外侧，第三调节件伸缩、并抵压第一安装座、使第一安装座在第三方向进行移动。
在其中一个实施例中，调节箱包括箱罩本体和与箱罩本体配合的盖板，调 节箱内还设有弹性件，弹性件的两端分别与盖板和第一安装座连接。
在其中一个实施例中，调节件包括调节螺钉，旋转多个调节螺钉、使调节螺钉分别抵压第一安装座的不同位置、并使第一安装座在第一方向、第二方向和第三方向进行移动。
另一方面，还提供了一种微透镜阵列系统，包括微透镜阵列；及如上述任一个技术方案所述的调节机构，调节机构的第一安装座设有第一安装槽，微透镜阵列设于第一安装槽、并与第一通窗对应设置。
上述微透镜阵列系统，采用了前述的调节机构，使微透镜阵列的位置能够得到精确调整，从而使其调整后的位置与曝光组件的位置相互对应，提高后续的图形曝光精度。
另外，还提供了一种曝光机，包括曝光组件；物镜组件；第二安装座，第二安装座呈筒状结构设置；及如上述任一个技术方案所述的微透镜阵列系统，微透镜阵列系统和物镜组件分别设于第二安装座的两侧，物镜组件设于曝光组件和第二安装座之间。
上述曝光机，由于采用了前述的微透镜阵列系统，图形曝光的质量更高，提高了产品的良品率和加工精度。
附图说明
图1为实施例中微透镜阵列系统的爆炸图；
图2为实施例中罩本体的整体结构示意图；
图3为实施例中曝光机的部分结构爆炸图。
100、微透镜阵列系统，110、微透镜阵列，121、罩本体，122、盖板，123、第一通窗，130、第一安装座，131、第一安装槽，141、第一调节件，142、第二调节件，143、第三调节件，144、锁紧件，151、第一保护片，152、第二保护片，153、第一配合槽，154、第一配合条，160、弹性件，200、曝光组件，300、物镜组件，400、第二安装座。
具体实施方式
下面结合附图对本发明的实施例进行详细说明：
需要说明的是，文中所称元件与另一个元件“固定”时，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是与另一个元件“连接”时，它可以是直接连接到另一个元件或者可能同时存在居中元件。相反，当元件被称作“直接在”另一元件“上”时，不存在中间元件。本文所使用的术语“垂直的”、“水平的”、“左”、“右”以及类似的表述只是为了说明的目的，并不表示是唯一的实施方式。
除非另有定义，本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施方式的目的，不是旨在于限制本发明。本文所使用的术语“及/或”包括一个或多个相关的所列项目的任意的和所有的组合。
如图1至图3所示的实施例，提供了一种调节机构，包括调节箱，调节箱设有第一通窗123；第一安装座130，第一安装座130设于调节箱内、并用于安装微透镜阵列110，微透镜阵列110与第一通窗123对应设置；及调节件，调节件的一端伸入调节箱，调节件呈间距设有多个、并呈可伸缩地设于调节箱的外侧，调节件伸缩、并抵压第一安装座130、使第一安装座130在第一方向和第二方向进行移动。
通过调节件的设置，当需要调节微透镜阵列110与曝光组件200之间的位置关系时，调节多个调节件伸入调节箱的深度，使不同调节件抵压第一安装座130、从而使第一安装座130的位置发生变化，实现调整第一安装座130上微透镜阵列110位置的技术效果，从而使微透镜阵列110的凹面点阵列与DMD系统的像素阵列一一对应，提高后续的图形曝光质量。
通常，若需要实现更加精密图形的曝光，则DMD系统的像素大小需进一步缩小，而传统使用高倍物镜的方式占用空间大、镜组结构复杂及成本高，采用微透镜阵列110则可避免该问题。然而，在具体使用时，需要使微透镜阵列110的凹面点阵列与DMD系统的像素阵列一一对应才能得到更好的曝光效果，而目前并未有便于操作且调节精度高的机构。
本实施例通过设置多个调节件，调节件呈间距设置、并用于抵压第一安装 座130，使得不同的调节件抵压第一安装座130的不同位置，当需要调节微透镜阵列110的位置时，通过调节不同调节件的位置、使第一安装座130的位置发生改变，从而实现对第一安装座130的位置调整，由于调节件设有多个，可实现精准调节第一安装座130的各位置角度，从而实现精准调节的技术效果，微透镜阵列110设在第一安装座130上，也即实现了微透镜阵列110的精准位置调整。
进一步地，调节机构还包括锁紧件144，锁紧件144设于调节箱的外侧，锁紧件144的一端伸入调节箱内、并抵压第一安装座130，锁紧件144也呈可伸缩的与调节箱配合，当调节件调节好第一安装座130的位置后，锁紧件144进一步伸缩调节，以固定前面的位置调节结果，避免后续发生偏移影响调节精度，从而进一步提高了位置调节精度。
更进一步地，锁紧件144为螺钉结构，锁紧件144的一端抵压第一安装座130的外侧壁。螺钉结构操作简单，成本低廉。
如图1所示，多个调节件环绕调节箱的外侧设置，以便于在各个角度调节第一安装座130的位置。
需要说明的是，这里的第一方向和第二方向为呈夹角设置的两个方向。可选地，第一方向为X轴方向，第二方向为Y轴方向，X轴与Y轴呈垂直设置，在调节时，通过多个调节件的伸缩，实现第一安装座130在X轴和Y轴形成的水平面内的位置调节。
当然，由于调节件设有多个，在操作精准的情况下，可通过调节相对两侧的多个调节件实现第一安装座130的微转动，以更精准的调节微透镜阵列110与DMD系统中曝光组件200的位置关系。如操作多个调节件使第一安装座130的多个侧部发生偏移，从而最终形成一种微转动的调节结果。
还需要说明的是：
第一通窗123的设置是为了使激光能够通过调节箱并到达微透镜阵列，本领域技术人员可根据需要设置不同的第一通窗123结构，这里不再赘述；
微透镜阵列110与第一通窗123对应设置指激光能够通过第一通窗123到达微透镜阵列110，本领域技术人员可根据需要采用现有技术中微透镜阵列110 接收激光需要进行设置的各种结构，这里不再赘述。
如图1和图2所示的实施例，调节件包括第一调节件141和第二调节件142，第一调节件141设有多个、并分别设于调节箱相对设置的第一侧和第二侧，第二调节件142设有多个、并分别设于调节箱相对设置的第三侧和第四侧。
多个第一调节件141和多个第二调节件142的设置便于通过操作实现第一安装座130在X轴、Y轴的精准移动、及轻微转动。如当第一侧的第一调节件141调节过度的情况下，可以通过第二侧的第一调节件141进行回调，从而避免调节过度的问题，实现更为精准的调节。
如图1所示，第一调节件141设有四个，第二调节件142设有两个。两个第一调节件141设于调节箱的第一侧，另外两个第一调节件141设于调节箱的第二侧；一个第二调节件142设于调节箱的第三侧，另一个第二调节件142设于调节箱的第四侧。
另外，需要说明的是，图1实施例中的第一侧和第二侧相对设置，第三侧和第四侧相对设置。
如图1和图2所示的实施例，调节机构还包括保护片，保护片设有多个、并环绕设于第一安装座130的外侧，第一调节件141和第二调节均抵压保护片、使保护片抵压第一安装座130移动。
由于微透镜阵列110由玻璃材质制作而成，因此，第一安装座130由刚性较强的材质制作，以起到保护内部的微透镜阵列110的作用，而保护片用来被抵压，因此，其刚性应强于第一安装座130的刚性，以使第一安装座130在抵压时因保护片被抵压、从而避免调节件的端部抵压后第一安装座130变形的问题。
当然，根据需要，也可以是在第一安装座130上设置专门的抵压部，第一调节件141或第二调节件142抵压在抵压部位置上，从而起到保护第一安装座130的作用，本领域技术人员可根据需要选用不同的设置方式，这里不再赘述。
如图1和图2所示的实施例，保护片包括第一保护片151，第一保护片151设有两个、并分别设于第一安装座130的相对两侧，第一调节件141设有四个，其中的两个第一调节件141抵压一个第一保护片151，其中的另外两个第一调节 件141抵压另一个第一保护片151；
或保护片包括第二保护片152，第二保护片152设有两个、并分别设于第一安装座130的相对两侧，第二调节件142设有四个，其中的两个第二调节件142抵压一个第二保护片152，其中的另外两个第二调节件142抵压另一个第二保护片152。
如图1所示，第一保护片151设有两个、并分别设于第一安装座130的外侧、且对应调节箱的第一侧和第二侧位置；第二保护片152也设有两个、并分别设于第一安装座130的外侧、且对应调节箱的第三侧和第四侧位置；第一调节件141设有四个，其中两个第一调节件141呈间距设置、并用于抵压与第一侧位置对应的第一保护片151，另外两个第一调节件141也呈间距设置、并用于抵压与第二侧位置对应的第二保护片152，同时，第一侧的两个第一调节件141与第二侧的两个第一调节件141对应设置；两个第二调节件142分别设在与第三侧和第四侧对应的第一安装座130外侧位置，两个第二调节件142对应设置。
第一方向为X轴方向，第二方向为Y轴方向。调节时，第一侧对应的两个第一调节件141调节相同距离、使第一安装座130在X轴方向移动，或第一侧对应的两个第一调节件141调节不同的距离、使第一安装座130产生微转动，当然，第二侧对应的两个第一调节件141需配合调节；第二调节件142可配合调节时第一安装座130在Y轴方向移动，本领域技术人员容易得知如何具体进行调节，这里不再赘述。
如图1所示的实施例，第一保护片151的两端设有第一配合槽153，第二保护片152的两端设有第一配合条154，第一保护片151移动时第一配合槽153的槽壁沿第一配合条154移动，第二保护片152移动时第一配合条154沿第一配合槽153的槽壁移动；
或第一保护片151设有第二配合条，第二保护片152设有第二配合槽，第一保护片151移动时第二配合条沿第二配合槽的槽壁移动，第二保护片152移动时第二配合槽的槽壁沿第二配合条移动。
如图1所示，第一配合槽153呈凹字形结构设置，第一配合条154呈凸字形结构设置，第一保护片151在第一调节件141的抵压作用下移动时，第一保 护片151的第一配合槽153沿第一凸字形结构进行移动；同理，第二保护片152在第二调节件142的抵压作用下移动时，第二保护片152的第一配合条154沿第一配合槽153的槽壁移动，防止移动时发生偏移或倾斜，提高调节精度。
当然，在满足要求的情况下，也可以设置为其他能够进行移动的结构，这里不再赘述。
需要说明的是，这里的第一保护片151和第二保护片152可以是塑料片结构，也可以是其他满足要求的结构，这里不再赘述。
如图1和图2所示的实施例，调节件还包括第三调节件143，第三调节件143的一端伸入调节箱，第三调节件143呈可伸缩地设于调节箱的外侧，第三调节件143伸缩、并抵压第一安装座130、使第一安装座130在第三方向进行移动。
第三调节件143在调节箱内进行伸缩、以抵压第一安装座130在第三方向移动，从而实现微透镜阵列110进一步进行位置调整，使微透镜阵列110与DMD系统的曝光组件200处于同一焦面。
进一步地，第三方向为Z轴方向，Z轴方向与X轴和Y轴形成的平面垂直设置。因此，通过第一调节件141、第二调节件142和第三调节件143的共同配合，可实现第一安装座130在X、Y、Z三个方向上的移动自由度、及绕Z轴的微转动自由度，即实现四个自由度的位置调整，从而使第一安装座130上的微透镜阵列110能够多自由度调整位置，调高位置调整精度。
如图1所示的实施例，调节箱包括箱罩本体121和与箱罩本体121配合的盖板122，调节箱内还设有弹性件160，弹性件160的两端分别与盖板122和第一安装座130连接。
弹性件160的设置使为了提高第三调节件143与盖板122之间的预紧力，避免第三调节件143调节后盖板122松动或产生位移从而影响调节结果。
进一步地，弹性件160为压缩弹簧，压缩弹簧设在盖板122和第一安装座130之间，当第三调节件143调节完毕后，由于压缩弹簧的作用，压缩弹簧的一端抵压盖板122，使盖板122无法移动，从而避免盖板122产生松动或转动(如盖板122与箱本体为螺纹配合时)，提高第三调节件143的调节精度。
当然，压缩弹簧的一端也可以固设在第三调节件143上，压缩弹簧的另一 端固设在盖板122上。
如图1和图2所示的实施例，调节件包括调节螺钉，旋转多个调节螺钉、使调节螺钉分别抵压第一安装座130的不同位置、并使第一安装座130在第一方向、第二方向和第三方向进行移动。
如图1和图2所示，第一调节件141、第二调节件142、第三调节件143和锁紧件144均为调节螺钉结构，通过旋转实现伸缩，以分别抵压第一安装座130的对应位置，实现对第一安装座130的位置调整。
如图1至图3所示的实施例，还提供了一种微透镜阵列系统100，包括微透镜阵列110；及如上述任一个实施例所述的调节机构，调节机构的第一安装座130设有第一安装槽131，微透镜阵列110设于第一安装槽131、并与第一通窗123对应设置。
采用了前述的调节机构，使微透镜阵列110的位置能够得到精确调整，从而使其调整后的位置与曝光组件200的位置相互对应，提高后续的图形曝光精度。
如图3所示的实施例，还提供了一种曝光机，包括曝光组件200；物镜组件300；第二安装座400，第二安装座400呈筒状结构设置；及如上述任一个实施例所述的微透镜阵列系统100，微透镜阵列系统100和物镜组件300分别设于第二安装座400的两侧，物镜组件300设于曝光组件200和第二安装座400之间。
由于采用了前述的微透镜阵列系统100，图形曝光的质量更高，提高了产品的良品率和加工精度。
需要说明的是，在微透镜阵列系统或曝光机的实施例中，微透镜阵列110与第一通窗123的对应设置，及曝光组件200、物镜组件300、第二安装座400和微透镜阵列系统100的对应设置，均指现有技术中能够满足曝光或激光通过需要的对应设置，本领域技术人员可根据现有技术中的任意设置方式进行具体设置，这里不再赘述。
如图3所示，DMD系统的曝光组件200设于上部，曝光组件200的下部设置物镜组件300，物镜组件300的下部设置一端与物镜组件300配合连接的第二安装座400，第二安装座400用于安装或固定物镜组件300的镜筒等结构，第二 安装座400的另一端用于连接微透镜阵列系统100。
曝光系统还包括用于观察的CCD装置(Charge Coupled Device)。使用时，先用第三调节件143调节微透镜阵列系统100的微透镜阵列110与DMD系统的曝光组件200之间间距(即第一安装座130在Z轴方向的位置)，并采用CCD装置观察DMD曝光系统的像素清晰度且根据预设要求进行判读，使微透镜阵列110与DMD系统的曝光组件200处于或基本处于同一焦面；之后，通过调节第一调节件141和第二调节件142调节第一安装座130在X轴和Y轴方向的位置及绕Z轴的轻微转动、使微透镜阵列110的凹面点阵列与DMD系统的像素阵列一一对应，通过CCD装置观察DMD曝光系统的像素达到图形显示清晰；最后，盖上盖板122，压缩弹簧顶压盖板122，后面可以进行其他的相应操作。
工作时，激光从DMD系统进入物镜组件300，然后再经过第二安装座400的筒内，最终到达微透镜阵列系统100的微透镜阵列110上。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本发明的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对发明专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本发明构思的前提下，还可以做出若干变形和改进，这些都属于本发明的保护范围。因此，本发明专利的保护范围应以所附权利要求为准。

Claims (10)

  1. 一种调节机构，其特征在于，包括：
    调节箱，所述调节箱设有第一通窗；
    第一安装座，所述第一安装座设于所述调节箱内、并用于安装微透镜阵列，所述微透镜阵列与所述第一通窗对应设置；及
    调节件，所述调节件的一端伸入所述调节箱，所述调节件呈间距设有多个、并呈可伸缩地设于所述调节箱的外侧，所述调节件伸缩、并抵压所述第一安装座、使所述第一安装座在第一方向和第二方向进行移动。
  2. 根据权利要求1所述的调节机构，其特征在于，所述调节件包括第一调节件和第二调节件，所述第一调节件设有多个、并分别设于所述调节箱相对设置的第一侧和第二侧，所述第二调节件设有多个、并分别设于所述调节箱相对设置的第三侧和第四侧。
  3. 根据权利要求2所述的调节机构，其特征在于，还包括保护片，所述保护片设有多个、并环绕设于所述第一安装座的外侧，所述第一调节件和所述第二调节均抵压所述保护片、使所述保护片抵压所述第一安装座移动。
  4. 根据权利要求3所述的调节机构，其特征在于，所述保护片包括第一保护片，所述第一保护片设有两个、并分别设于所述第一安装座的相对两侧，所述第一调节件设有四个，其中的两个所述第一调节件抵压一个所述第一保护片，其中的另外两个所述第一调节件抵压另一个所述第一保护片；
    或所述保护片包括第二保护片，所述第二保护片设有两个、并分别设于所述第一安装座的相对两侧，所述第二调节件设有四个，其中的两个所述第二调节件抵压一个所述第二保护片，其中的另外两个所述第二调节件抵压另一个所述第二保护片。
  5. 根据权利要求4所述的调节机构，其特征在于，所述第一保护片的两端设有第一配合槽，所述第二保护片的两端设有第一配合条，所述第一保护片移动时所述第一配合槽的槽壁沿所述第一配合条移动，所述第二保护片移动时所述第一配合条沿所述第一配合槽的槽壁移动；
    或所述第一保护片设有第二配合条，所述第二保护片设有第二配合槽，所述第一保护片移动时所述第二配合条沿所述第二配合槽的槽壁移动，所述第二保护片移动时所述第二配合槽的槽壁沿所述第二配合条移动。
  6. 根据权利要求1-5任一项所述的调节机构，其特征在于，所述调节件还包括第三调节件，所述第三调节件的一端伸入所述调节箱，所述第三调节件呈可伸缩地设于所述调节箱的外侧，所述第三调节件伸缩、并抵压所述第一安装座、使所述第一安装座在第三方向进行移动。
  7. 根据权利要求6所述的调节机构，其特征在于，所述调节箱包括箱罩本体和与所述箱罩本体配合的盖板，所述调节箱内还设有弹性件，所述弹性件的两端分别与所述盖板和所述第一安装座连接。
  8. 根据权利要求6所述的调节机构，其特征在于，所述调节件包括调节螺钉，旋转多个所述调节螺钉、使所述调节螺钉分别抵压所述第一安装座的不同位置、并使所述第一安装座在所述第一方向、所述第二方向和所述第三方向进行移动。
  9. 一种微透镜阵列系统，其特征在于，包括：
    微透镜阵列；及
    如权利要求1-8任一项所述的调节机构，所述调节机构的第一安装座设有第一安装槽，所述微透镜阵列设于所述第一安装槽、并与所述第一通窗对应设置。
  10. 一种曝光机，其特征在于，包括：
    曝光组件；
    物镜组件；
    第二安装座，所述第二安装座呈筒状结构设置；及
    如权利要求9所述的微透镜阵列系统，所述微透镜阵列系统和所述物镜组件分别设于所述第二安装座的两侧，所述物镜组件设于所述曝光组件和所述第二安装座之间。
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