WO2019239925A1 - Adhesive sheet - Google Patents

Adhesive sheet Download PDF

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Publication number
WO2019239925A1
WO2019239925A1 PCT/JP2019/021798 JP2019021798W WO2019239925A1 WO 2019239925 A1 WO2019239925 A1 WO 2019239925A1 JP 2019021798 W JP2019021798 W JP 2019021798W WO 2019239925 A1 WO2019239925 A1 WO 2019239925A1
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WO
WIPO (PCT)
Prior art keywords
pressure
sensitive adhesive
adhesive sheet
mass
layer
Prior art date
Application number
PCT/JP2019/021798
Other languages
French (fr)
Japanese (ja)
Inventor
毅朗 吉延
Original Assignee
リンテック株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by リンテック株式会社 filed Critical リンテック株式会社
Priority to JP2019562008A priority Critical patent/JP6740489B2/en
Priority to KR1020207034193A priority patent/KR20210019421A/en
Priority to CN201980039527.6A priority patent/CN112352027A/en
Publication of WO2019239925A1 publication Critical patent/WO2019239925A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/017Additives being an antistatic agent
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature

Definitions

  • the present invention relates to an adhesive sheet.
  • an adhesive sheet is used for the purpose of fixing a semiconductor wafer and protecting a semiconductor element (for example, a semiconductor chip).
  • the pressure-sensitive adhesive sheet is peeled off when a predetermined processing step is completed.
  • static electricity called peeling charging may occur between the pressure-sensitive adhesive sheet and the semiconductor wafer or between the pressure-sensitive adhesive sheet and the semiconductor element. is there. Since such static electricity causes damage to the semiconductor wafer, the semiconductor element, and the circuits formed thereon, a method for preventing this damage (hereinafter also referred to as “electrostatic breakdown”) has been studied. ing.
  • Patent Document 1 discloses a monomer mixture in which the pressure-sensitive adhesive layer contains (a) a specific (meth) acrylic acid alkyl ester as a main component and a monoethylenically unsaturated acid copolymerizable therewith. , (B) a polyfunctional (meth) acrylate as a cross-linking agent, (c) a photopolymerization initiator, and (d) a photopolymerization product of a photopolymerizable composition each containing a specific amount of an epoxy resin.
  • An electronic component reinforcing adhesive sheet is disclosed.
  • Patent Document 1 discloses that the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet for reinforcing electronic parts may contain an antistatic agent.
  • Patent Document 2 discloses (a) an ionic liquid, (b) a (meth) acrylic polymer containing as a main component at least one (meth) acrylate having an alkyl group having 4 to 12 carbon atoms, and ( c) A pressure-sensitive adhesive composition comprising a specific compound containing two or more hydroxyl groups in the molecule, wherein the (meth) acrylic polymer has a weight average molecular weight of 300,000 to 1.3 million.
  • surface or both surfaces of a support body is disclosed.
  • the pressure-sensitive adhesive sheet when the step of sealing the semiconductor element with the sealing material is performed, the pressure-sensitive adhesive sheet may be heated at a high temperature (for example, 150 ° C. or more and 190 ° C. or less).
  • a high temperature for example, 150 ° C. or more and 190 ° C. or less.
  • electronic components for example, electronic circuits
  • an antistatic agent may be included in the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet. Material selection is required.
  • the object of the present invention is to use a pressure-sensitive adhesive sheet having a pressure-sensitive adhesive layer having a surface resistivity of less than a predetermined value after passing through a process of heating at a high temperature (for example, 150 ° C. or higher and 190 ° C. or lower). It is to provide an adhesive sheet that can suppress electrostatic breakdown of a semiconductor element even if it is peeled off from an adherend.
  • a high temperature for example, 150 ° C. or higher and 190 ° C. or lower.
  • the pressure-sensitive adhesive sheet according to one embodiment of the present invention is a pressure-sensitive adhesive sheet used when sealing a semiconductor element on a pressure-sensitive adhesive sheet, and includes a base material and a pressure-sensitive adhesive layer containing an antistatic agent, and nitrogen.
  • the surface resistivity of the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet after heating in an atmosphere at 190 ° C. for 60 minutes and then standing at 23 ° C. and 50% RH for 24 hours is less than 10 11 ⁇ / ⁇ .
  • the band of the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet after being heated in a nitrogen atmosphere at 190 ° C. for 60 minutes and then allowed to stand in an atmosphere at 23 ° C. and 50% RH for 24 hours.
  • the voltage is preferably less than 0.1 kV.
  • the antistatic agent preferably contains at least one selected from the group consisting of a carbon material and an ionic material.
  • the carbon material is preferably at least one selected from the group consisting of carbon nanotubes, graphene, and carbon black.
  • the ionic material is preferably at least one selected from the group consisting of an ionic liquid and an ionic polymer.
  • the antistatic agent is the ionic liquid or a mixture of the ionic liquid and the carbon material.
  • the ionic liquid preferably contains a cation and an anion represented by the following general formula (1).
  • R 1 and R 2 are each independently a fluorine atom or a perfluoroalkyl group having 1 to 8 carbon atoms, and R 1 and R 2 are the same or different.
  • the content of the ionic liquid is preferably 0.01% by mass or more and 10% by mass or less with respect to the entire pressure-sensitive adhesive layer.
  • the pressure-sensitive adhesive layer contains an acrylic pressure-sensitive adhesive composition
  • the acrylic pressure-sensitive adhesive composition has an alkyl group having 4 to 12 carbon atoms (meth). It is preferable to include an acrylic copolymer having an alkyl acrylate as a main monomer.
  • the pressure-sensitive adhesive sheet is heated under conditions of 100 ° C. and 30 minutes, subsequently heated under conditions of 180 ° C. and 30 minutes, and further heated under conditions of 190 ° C. and 60 minutes. Then, the pressure-sensitive adhesive strength of the pressure-sensitive adhesive layer after being allowed to stand for 24 hours at 23 ° C. and 50% RH is 0.5 N / 25 mm or more and 3.0 N / 25 mm or less, and the pressure-sensitive adhesive The adhesive strength of the layer to the polyimide film is preferably 0.50 N / 25 mm or more and 2.00 N / 25 mm or less.
  • the surface of the substrate on the side of the pressure-sensitive adhesive layer has conductivity.
  • the pressure-sensitive adhesive sheet is heated at 190 ° C. for 60 minutes in a nitrogen atmosphere, and then left to stand at 23 ° C. and 50% RH for 24 hours.
  • the surface resistivity on the pressure-sensitive adhesive layer side is preferably 10 ⁇ 7 ⁇ / ⁇ or more and 10 7 ⁇ / ⁇ or less.
  • the pressure-sensitive adhesive sheet it is preferable to have a conductive layer between the base material and the pressure-sensitive adhesive layer.
  • the pressure-sensitive adhesive sheet is heated at 190 ° C. for 60 minutes in a nitrogen atmosphere, and then left to stand at 23 ° C. and 50% RH for 24 hours.
  • the surface resistivity on the pressure-sensitive adhesive layer side is preferably 10 ⁇ 7 ⁇ / ⁇ or more and 10 7 ⁇ / ⁇ or less.
  • the pressure-sensitive adhesive sheet is obtained by using a pressure-sensitive adhesive sheet having a pressure-sensitive adhesive layer having a surface resistivity of less than a predetermined value after undergoing a process of heating at a high temperature (for example, 150 ° C. or higher and 190 ° C. or lower). Even if it peels from a to-be-adhered body, the adhesive sheet which can suppress the electrostatic breakdown of a semiconductor element can be provided.
  • FIG. 1 shows a cross-sectional view of an adhesive sheet 10 according to the first embodiment.
  • the base material 11 and the pressure-sensitive adhesive layer 12 are in contact with each other.
  • the pressure-sensitive adhesive sheet 10 is used when sealing a semiconductor element on the pressure-sensitive adhesive sheet 10.
  • a semiconductor element and other members may be referred to as an adherend.
  • Examples of other members include a frame member.
  • the frame member can be used to prevent warping of the pressure-sensitive adhesive sheet 10 due to curing shrinkage of the sealing resin.
  • the pressure-sensitive adhesive sheet 10 includes a base material 11 and a pressure-sensitive adhesive layer 12 containing an antistatic agent.
  • the base material 11 has a first base material surface 11a and a second base material surface 11b opposite to the first base material surface 11a.
  • the pressure-sensitive adhesive layer 12 has a first pressure-sensitive adhesive surface 12a and a second pressure-sensitive adhesive surface 12b opposite to the first pressure-sensitive adhesive surface 12a.
  • the adhesive layer 12 is laminated
  • An adherend such as a semiconductor element is attached to the adhesive layer 12.
  • the pressure-sensitive adhesive layer 12 holds the adherend on the pressure-sensitive adhesive sheet 10 in the manufacturing process of the semiconductor device.
  • the shape of the pressure-sensitive adhesive sheet 10 can take any shape such as a sheet shape, a tape shape, and a label shape.
  • the pressure-sensitive adhesive sheet 10 of this embodiment has a surface resistivity of 10 11 ⁇ after being heated at 190 ° C. and 60 minutes in a nitrogen atmosphere and then allowed to stand at 23 ° C. and 50% RH for 24 hours. Less than / ⁇ .
  • 150 ° C. to 190 ° C. may be referred to as “high temperature”
  • heating at 150 ° C. to 190 ° C. may be referred to as “high temperature heating”.
  • the present inventors have found that electrostatic breakdown of a semiconductor element can be suppressed by using a pressure-sensitive adhesive sheet having a surface resistivity of less than 10 11 ⁇ / ⁇ after high-temperature heating, and to complete the present invention. It came.
  • the electrostatic breakdown of the semiconductor element can be suppressed even after the pressure-sensitive adhesive sheet 10 is peeled off from the adherend after the process of being heated at a high temperature (hereinafter referred to as “book”). Also referred to as “effect of embodiment”).
  • the achievement means for obtaining the pressure-sensitive adhesive sheet 10 of the present embodiment is not particularly limited.
  • the method is mentioned. These methods may be combined.
  • Method 1 Method of including a specific antistatic agent in the pressure-sensitive adhesive layer 12
  • Method 2 Method of including a specific antistatic agent in the pressure-sensitive adhesive layer 12 and adjusting the content of the antistatic agent
  • Method 3 Method / method 4: imparting conductivity to the surface of the base material 11 on the pressure-sensitive adhesive layer 12 side: Method of providing a conductive layer between the base material 11 and the pressure-sensitive adhesive layer 12
  • the surface resistivity of the pressure-sensitive adhesive layer 12 becomes less than 10 11 ⁇ / ⁇ even after high-temperature heating. Therefore, static electricity generated when the pressure-sensitive adhesive sheet 10 is peeled is easily removed through the conductive path formed in the pressure-sensitive adhesive layer 12. In addition, the static electricity is applied even when the pressure-sensitive adhesive sheet 10 has another layer (for example, at least one of a conductive layer and an intermediate layer) between the base material 11 and the pressure-sensitive adhesive layer 12. It tends to be removed through the conductive path formed in the layer.
  • another layer for example, at least one of a conductive layer and an intermediate layer
  • the surface resistivity of the pressure-sensitive adhesive layer 12 of the pressure-sensitive adhesive sheet 10 refers to a value measured from the surface side of the pressure-sensitive adhesive layer 12 (in the case of FIG. 1, from the first pressure-sensitive adhesive surface 12a side).
  • the surface resistivity of the pressure-sensitive adhesive layer 12 of the pressure-sensitive adhesive sheet 10 after heating in a nitrogen atmosphere at 190 ° C. for 60 minutes and then standing in a 23 ° C. and 50% RH atmosphere for 24 hours is preferably 1 ⁇ 10 11 ⁇ . / ⁇ , more preferably less than 7 ⁇ 10 10 ⁇ / ⁇ , and even more preferably less than 5 ⁇ 10 10 ⁇ / ⁇ .
  • the lower limit of the surface resistivity of the pressure-sensitive adhesive layer 12 is not particularly limited, but is preferably 1 ⁇ 10 4 ⁇ / ⁇ or more.
  • the surface resistivity of the pressure-sensitive adhesive layer 12 is measured as follows. When a release film is provided on the pressure-sensitive adhesive sheet, a part of this pressure-sensitive adhesive sheet with a release film is cut into a size of 90 mm ⁇ 90 mm with a cutter or the like. Next, the release film is peeled off from the cut-out pressure-sensitive adhesive sheet with a release film, and the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet is affixed to the mirror surface of a silicon mirror wafer (diameter 6 inches, thickness 0.68 mm, mirror surface finished 2000). This is a test piece.
  • a test piece is obtained by the method similar to the above using the adhesive sheet in which the peeling film is not provided.
  • the test piece was introduced into an atmospheric electric furnace (SKM-Series SKM-3035F, manufactured by Motoyama), the inside of the furnace was evacuated for 5 minutes, and then filled with nitrogen gas to normal pressure (1 atm). Vacuum the furnace for 5 minutes. Then, after flowing nitrogen gas and making the inside of the furnace a nitrogen atmosphere, the temperature was raised to 190 ° C. at a rate of temperature rise of 2 ° C./min while maintaining a nitrogen purge (1.5 L / min) and held at 190 ° C. for 60 minutes. To do.
  • test piece is taken out from the furnace, allowed to cool to room temperature (25 ° C.), and left in an atmosphere of 23 ° C. and 50% RH for 24 hours.
  • the adhesive sheet is peeled off from the test piece (adhesive sheet with a silicon mirror wafer) after being left for 24 hours, and this is used as a test piece for measuring surface resistivity.
  • the surface resistivity of the pressure-sensitive adhesive layer 12 is measured under the following measurement conditions in accordance with JIS K6911 (2006).
  • the charged voltage of the pressure-sensitive adhesive layer 12 refers to a value measured from the surface side of the pressure-sensitive adhesive layer 12 (in the case of FIG. 1, from the first pressure-sensitive adhesive surface 12a side). From the viewpoint of more manifesting the effects of the present embodiment, the pressure-sensitive adhesive sheet 10 is heated at 190 ° C. for 60 minutes in a nitrogen atmosphere and then left to stand at 23 ° C. and 50% RH for 24 hours.
  • the charged voltage of the agent layer 12 is preferably less than 0.1 kV, more preferably less than 0.07 kV, and even more preferably less than 0.05 kV.
  • the lower limit of the charged voltage of the pressure-sensitive adhesive layer 12 is not particularly limited, but is preferably 0.001 kV or more.
  • the achievement means for obtaining the pressure-sensitive adhesive sheet 10 having a voltage of the pressure-sensitive adhesive layer 12 of less than 0.1 kV is not particularly limited, and examples thereof include the above-described method 1 to method 4.
  • the charged voltage of the pressure-sensitive adhesive layer 12 is measured as follows. In the same manner as the method for measuring the surface resistivity of the pressure-sensitive adhesive layer 12, a test piece and a test piece for measuring charged voltage are obtained. However, the size when cutting out a part of the pressure-sensitive adhesive sheet with a release film or a part of the pressure-sensitive adhesive sheet with a cutter or the like is 40 mm ⁇ 40 mm. Using the test piece for measuring the charged voltage, the charged voltage of the pressure-sensitive adhesive layer 12 is measured under the following measurement conditions in accordance with JIS L1094 (2014).
  • the pressure-sensitive adhesive sheet 10 is heated at 100 ° C. and 30 minutes, subsequently heated at 180 ° C. and 30 minutes, and further at 190 ° C. and 60 minutes.
  • the adhesive strength of the adhesive layer 12 to the copper foil after being heated and then allowed to stand for 24 hours in an atmosphere of 23 ° C.
  • RH is preferably 0.50 N / 25 mm to 3.00 N / 25 mm, more preferably It is 1.00 N / 25 mm or more and 2.50 N / 25 mm or less, More preferably, it is 1.50 N / 25 mm or more and 2.00 N / 25 mm or less.
  • the adhesive strength of the adhesive layer 12 to the copper foil is 0.50 N / 25 mm or more, the adhesive sheet 10 can be prevented from peeling off from the adherend when the substrate 11 or the adherend is deformed by heating.
  • the adhesive force of the adhesive layer 12 to the copper foil is 3.00 N / 25 mm or less, the peeling force does not become too high, and the adhesive sheet 10 is easily peeled from the adherend.
  • the achievement means for obtaining the adhesive sheet 10 whose adhesive force with respect to the copper foil of the adhesive layer 12 is the said range is not specifically limited, For example, the above-mentioned method 1 to method 4 are mentioned.
  • the adhesive force with respect to the copper foil of the adhesive layer 12 is measured as follows.
  • a release film is provided on the pressure-sensitive adhesive sheet, a part of this pressure-sensitive adhesive sheet with a release film is cut into a size of 25 mm ⁇ 25 mm with a cutter or the like.
  • the release film is peeled off from the cut-out adhesive sheet with release film, and the adhesive layer of the adhesive sheet is copper foil (150 mm ⁇ 100 mm, thickness 0.08 mm, JIS H3100: 2010 C1220R-H (stretched copper foil)) Is attached in accordance with JIS Z 0237: 2009. This is a test piece for copper foil.
  • the test piece for copper foils is obtained by the method similar to the above using an adhesive sheet.
  • the test piece for copper foil was introduced into an atmospheric electric furnace (SKM-Series SKM-3035F, manufactured by Motoyama), heated at 100 ° C. for 30 minutes, and then at 180 ° C. for 30 minutes. It heats, and also heats on the conditions of 190 degreeC and 1 hour. Thereafter, the test piece is taken out from the furnace, allowed to cool to room temperature (25 ° C.), and left to stand in an atmosphere of 23 ° C. and 50% RH for 24 hours. Using the test piece for copper foil after being left for 24 hours, the adhesive strength of the adhesive layer 12 to the copper foil is measured under the following measurement conditions.
  • the pressure-sensitive adhesive sheet 10 is heated at 100 ° C. and 30 minutes, subsequently heated at 180 ° C. and 30 minutes, and further at 190 ° C. and 60 minutes.
  • the adhesive strength of the pressure-sensitive adhesive layer 12 to the polyimide film after being heated and then allowed to stand at 23 ° C. and 50% RH for 24 hours is preferably 0.50 N / 25 mm or more and 2.00 N / 25 mm or less, more preferably It is 0.70 N / 25 mm or more and 1.80 N / 25 mm or less, More preferably, it is 1.00 N / 25 mm or more and 1.50 N / 25 mm or less.
  • the adhesive sheet 10 can be prevented from peeling off from the adherend when the substrate 11 or the adherend is deformed by heating.
  • the adhesive force of the pressure-sensitive adhesive layer 12 to the polyimide film is 2.00 N / 25 mm or less, the peeling force does not become too high, and the pressure-sensitive adhesive sheet 10 is easily peeled off from the adherend.
  • the adhesive force with respect to the polyimide film of the adhesive layer 12 is measured as follows.
  • a polyimide film (150 mm ⁇ 70 mm, thickness 50 ⁇ m, manufactured by Toray DuPont, Kapton 200H) is attached to a stainless steel plate with a double-sided tape.
  • the copper of the adhesive layer 12 is used except that the adhesive layer 12 of the adhesive sheet 10 is affixed to the polyimide film of the adherend A instead of being affixed to the copper foil.
  • the adhesive force with respect to the polyimide film of the adhesive layer 12 is measured by the same method as the method for measuring the adhesive force with respect to the foil.
  • a base material is a member which supports an adhesive layer.
  • a sheet material such as a synthetic resin film can be used.
  • synthetic resin films include polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polyethylene naphthalate film, and polybutylene terephthalate film.
  • examples of the substrate include these crosslinked films and laminated films.
  • the base material preferably contains a polyester-based resin, and more preferably is made of a material mainly composed of a polyester-based resin.
  • the material having a polyester-based resin as a main component means that the proportion of the mass of the polyester-based resin in the entire material constituting the base material is 50% by mass or more.
  • the polyester resin is, for example, any resin selected from the group consisting of polyethylene terephthalate resin, polybutylene terephthalate resin, polyethylene naphthalate resin, polybutylene naphthalate resin, and copolymer resins of these resins. Is preferred, and polyethylene terephthalate resin is more preferred.
  • a polyethylene terephthalate film or a polyethylene naphthalate film is preferable, and a polyethylene terephthalate film is more preferable.
  • the oligomer contained in the polyester film is derived from a polyester-forming monomer, a dimer, a trimer, and the like.
  • the storage elastic modulus at 100 ° C. of the substrate is preferably 1 ⁇ 10 7 Pa or more from the viewpoint of improving the workability.
  • the lower limit of the storage elastic modulus at 100 ° C. of the substrate is preferably 1 ⁇ 10 7 Pa or more, more preferably 1 ⁇ 10 8 Pa or more, from the viewpoint of dimensional stability during processing.
  • the upper limit of the storage elastic modulus at 100 ° C. of the substrate is preferably 1 ⁇ 10 12 Pa or less from the viewpoint of processability.
  • the storage elastic modulus is a value measured at a frequency of 1 Hz by a torsional shear method using a dynamic viscoelasticity measuring device.
  • the substrate to be measured is cut into a width of 5 mm and a length of 20 mm, and a viscoelasticity measuring device (manufactured by TA Instruments, DMAQ800) is used, and the storage viscoelasticity at 100 ° C. is measured at a frequency of 1 Hz and a tensile mode. Measure.
  • the first substrate surface of the substrate is subjected to primer treatment, corona treatment, plasma treatment, etc. in order to enhance adhesion with a layer (adhesive layer in this embodiment) formed on the first substrate surface. At least one of the surface treatments may be performed.
  • the pressure-sensitive adhesive layer is formed on the first base material surface through, for example, an intermediate layer
  • the first base material surface is coated with a pressure-sensitive adhesive in order to improve adhesion with the intermediate layer.
  • An adhesion treatment may be performed.
  • the pressure-sensitive adhesive used for this pressure-sensitive adhesive treatment include acrylic, rubber-based, silicone-based, and urethane-based pressure-sensitive adhesives.
  • the surface of the substrate on the side of the pressure-sensitive adhesive layer (in the case of FIG. 1, the first substrate surface 11a) preferably has conductivity.
  • the whole base material may have electroconductivity as well as the surface.
  • the pressure-sensitive adhesive sheet is heated at 190 ° C. under a nitrogen atmosphere from the viewpoint of further expressing the effects of the present embodiment.
  • the surface resistivity of the substrate surface after being heated for 60 minutes and then allowed to stand for 24 hours in an atmosphere of 23 ° C. and 50% RH is preferably 10 ⁇ 7 ⁇ / ⁇ or more and 10 7 ⁇ / ⁇ or less, more preferably It is 10 ⁇ 7 ⁇ / ⁇ or more and 10 5 ⁇ / ⁇ or less, more preferably 10 ⁇ 7 ⁇ / ⁇ or more and 10 4 ⁇ / ⁇ or less.
  • the surface resistivity of the substrate refers to a value measured from the surface side on the pressure-sensitive adhesive layer side of the substrate (in the case of FIG. 1, from the first substrate surface 11a side).
  • the measuring method is the same as the measuring method of the surface resistivity of the pressure-sensitive adhesive layer described above.
  • a pressure-sensitive adhesive sheet in which the layer laminated on the substrate is removed and the surface of the substrate is exposed is used.
  • the method for imparting conductivity to the surface of the substrate is not particularly limited.
  • a substrate is prepared by dispersing or kneading a conductive material (for example, an antistatic agent described later) in advance in the material constituting the substrate.
  • a method of applying a conductive material to the surface of the substrate a method of forming a layer made of a metal or an alloy on the surface of the substrate, and the like.
  • Examples of the method for forming a layer made of a metal or alloy on the surface of the substrate include electroless plating, electrolytic plating, vapor deposition, and sputtering.
  • the surface resistivity of the substrate is preferably 10 4 ⁇ / ⁇ or more and 10 16 ⁇ / ⁇ or less, more preferably 10 7 ⁇ / ⁇ or more and 10 16 ⁇ / ⁇ or less. More preferably, it is 10 8 ⁇ / ⁇ or more and 10 16 ⁇ / ⁇ or less.
  • the thickness of the substrate is preferably 10 ⁇ m or more and 300 ⁇ m or less, more preferably 15 ⁇ m or more and 200 ⁇ m or less, and further preferably 20 ⁇ m or more and 100 ⁇ m or less.
  • the pressure-sensitive adhesive layer is a layer formed from a pressure-sensitive adhesive composition containing an antistatic agent (hereinafter also simply referred to as “pressure-sensitive adhesive composition”).
  • the antistatic agent contained in the pressure-sensitive adhesive composition examples include carbon materials, ionic materials, metal fine particles, metal oxides, metal fillers, and surfactants. From the viewpoint of more manifesting the effects of the present embodiment, the antistatic agent preferably includes at least one selected from the group consisting of a carbon material and an ionic material.
  • Carbon material examples include carbon nanotubes, carbon nanofibers, graphene, carbon black, milled carbon fibers, and graphite. These materials may use commercially available products.
  • the carbon nanotubes and graphene may be single-walled or multi-layered.
  • Examples of carbon black include ketjen black, furnace black, and acetylene black. These carbon materials can be used individually by 1 type or in combination of 2 or more types.
  • the carbon material is preferably at least one selected from the group consisting of carbon nanotubes, graphene, and carbon black.
  • a carbon material The content of depends on the type of carbon material, but is preferably 1.0% by mass or more and less than 15.0% by mass, more preferably 1.5% by mass or more and less than 13.0% by mass with respect to the entire pressure-sensitive adhesive layer. More preferably, it is 2.0 mass% or more and less than 10.0 mass%.
  • the content of the carbon material is 1.0% by mass or more, antistatic performance is easily exhibited.
  • the content of the carbon material is less than 15.0% by mass, the occurrence of aggregation and poor dispersion of the carbon material is easily suppressed.
  • the viscosity increase of an adhesive composition is suppressed as content of a carbon material is less than 15 mass%, a smooth coating surface is easy to be obtained.
  • the content of the carbon material Depending on the type of the carbon material, it is preferably 2.5% by mass or more and less than 15.0% by mass, more preferably 3.0% by mass or more and less than 13.0% by mass, and still more preferably, with respect to the entire pressure-sensitive adhesive layer. Is 5.0 mass% or more and less than 10.0 mass%.
  • the content of the carbon material When the content of the carbon material is 2.5% by mass or more, antistatic performance is easily exhibited. When the content of the carbon material is less than 15.0% by mass, the occurrence of aggregation and poor dispersion of the carbon material is easily suppressed. Moreover, since the viscosity increase of an adhesive composition is suppressed as content of a carbon material is less than 15 mass%, a smooth coating surface is easy to be obtained.
  • an ionic material is at least 1 sort (s) selected from the group which consists of an ionic liquid and an ionic polymer.
  • An ionic liquid is a salt comprised by a cation and an anion.
  • a nonmetallic ion is preferable, and examples thereof include an imidazolium cation, a pyridinium cation, a pyrrolidinium cation, a quaternary ammonium cation, and a quaternary phosphonium cation.
  • anion of the ionic liquid examples include an anion represented by the following general formula (1), CF 3 CO 2 ⁇ , CF 3 (CF 2 ) 3 SO 3 ⁇ , CF 3 SO 3 ⁇ , (CF 3 SO 2 ) 3 C ⁇ , CF 3 (CF 2 ) 2 CO 2 ⁇ , BF 3 (CF 3 ) ⁇ , BF 3 (C 2 F 5 ) ⁇ , BF 3 (C 3 F 7 ) ⁇ , BF 2 (CF 3 ) 2 ⁇ , BF 2 (CF 3 ) (C 2 F 5 ) ⁇ , PF 5 (CF 3 ) ⁇ , PF 5 (C 2 F 5 ) ⁇ , PF 5 (C 3 F 7 ) ⁇ , PF 4 (CF 3 ) 2 ⁇ , PF 4 (CF 3 ) 2 ⁇ , PF 4 (CF 3 ) 2 ⁇ , PF 4 (CF 3 ) (C 2 F 5 ) ⁇ , PF
  • an anion having a van der Waals radius of 0.260 nm or more is preferable, an anion of 0.280 nm or more is more preferable, and an anion of 0.300 nm or more is more preferable.
  • the van der Waals radius is an anion having a radius of 0.260 nm or more
  • the ionic liquid is hardly crystallized, and the ionic liquid tends to exist as a liquid at room temperature. That is, the ionic liquid is easily dissociated. Even if the pressure-sensitive adhesive layer containing such anions is heated at a high temperature, the pressure-sensitive adhesive layer is hardly deteriorated. As a result, the effect of the present embodiment is more easily expressed.
  • the ionic liquid preferably contains a cation and an anion represented by the following general formula (1) (hereinafter also referred to as “specific imide anion”).
  • specific imide anion an anion represented by the following general formula (1)
  • the van der Waals radius becomes large (preferably 0.260 nm or more), and therefore the effect of the present embodiment is more manifested for the same reason as described above. It becomes easy.
  • the van der Waals radius is a value based on the following document. ⁇ M.Ue, J. Electrochem. Soc., 141, 3336 (1994) ⁇ M. Ue, A. Murakami, S. Nakamura, J. Electrochem. Soc., 149, A1385 (2002)
  • R 1 and R 2 are each independently a fluorine atom or a perfluoroalkyl group having 1 to 8 carbon atoms, and R 1 and R 2 are the same or different.
  • R 1 and R 2 are each independently preferably a perfluoroalkyl group having 1 to 8 carbon atoms, more preferably a perfluoroalkyl group having 1 to 6 carbon atoms, still more preferably A perfluoroalkyl group having 1 to 4 carbon atoms.
  • R 1 and R 2 are preferably the same.
  • the content of the ionic liquid depends on the type of the ionic liquid, but is preferably 0.01% by mass or more and 10% by mass or less, more preferably 0.05% by mass or more and 8% by mass or less with respect to the entire pressure-sensitive adhesive layer. More preferably, it is 0.1 mass% or more and 5 mass% or less.
  • the content of the ionic liquid is 0.01% by mass or more, antistatic performance is easily exhibited.
  • the content of the ionic liquid is 10% by mass or less, contamination of the adherend due to bleed out is easily suppressed, and adhesive strength is easily secured.
  • the antistatic agent is preferably an ionic liquid or a mixture of an ionic liquid and a carbon material.
  • the antistatic agent is a mixture of an ionic liquid and a carbon material, when developing the same surface resistivity, the total content of the antistatic agent is smaller than when using a single type of antistatic agent alone. Since a predetermined antistatic performance can be exhibited, it is preferable because a decrease in adhesive force accompanying a decrease in the content of the adhesive component can be suppressed.
  • the antistatic agent is a mixture of an ionic liquid and a carbon material
  • the total content of the antistatic agent is preferably 0.
  • the antistatic agent is a mixture of an ionic liquid and a carbon material
  • the mass ratio (Iw / Cw) of the ionic liquid content Iw and the carbon material content Cw is preferably 0.01 / 15 or more. It is 10/2 or less, more preferably 0.05 / 13 or more and 8/3 or less, and further preferably 0.10 / 10 or more and 5/5 or less.
  • the mass ratio (Iw / Cw) When the mass ratio (Iw / Cw) is 0.01 / 15 or more, the ratio of the ionic liquid becomes an appropriate amount, and an increase in the charged voltage can be suppressed. Thereby, it becomes easy to suppress generation
  • the mass ratio (Iw / Cw) is 10/2 or less, the ratio of the ionic liquid is suppressed from being excessive, so that the component derived from the ionic liquid is transferred to the adherend surface when the adhesive sheet is peeled off. Is less likely to occur.
  • the ionic functional group is a concept including a cationic group (hereinafter also simply referred to as “cation”) and an anionic group (hereinafter also simply referred to as “anion”). That is, the ionic polymer is a polymer containing a cation and an anion for the cation, and can form an ionic bond between the cation and the anion.
  • the ionic polymer exhibits antistatic performance by having an ionic functional group.
  • the ionic polymer may have a cation in the main chain or a side chain, but preferably has a cation in the side chain.
  • Ionic functional groups examples include a quaternary ammonium cation, a phosphonium cation, a sulfonium cation, an oxonium cation, a diazonium cation, a chloronium cation, an iodonium cation, and a pyrylium cation. These cations can be used alone or in combination of two or more.
  • the “quaternary ammonium cation” means an onium cation of nitrogen, and includes heterocyclic onium ions such as imidazolium and pyridium.
  • alkylammonium cations examples include alkylammonium cations (herein, “alkyl” includes those substituted with a hydroxy group and an alkoxyalkyl in addition to a hydrocarbon group having 1 to 30 carbon atoms); Heterocyclic cation such as nium cation, pyrrolium cation, imidazolium cation, pyrazolium cation, pyridinium cation, piperidinium cation, piperazinium cation; indolium cation, benzimidazolium cation, carbazolium cation, key And condensed heterocyclic cations such as a norinium cation.
  • alkylammonium cations herein, “alkyl” includes those substituted with a hydroxy group and an alkoxyalkyl in addition to a hydrocarbon group having 1 to 30 carbon atoms
  • Heterocyclic cation such as nium cation,
  • any of them includes a nitrogen atom and / or a ring to which a hydrocarbon group, hydroxyalkyl group or alkoxyalkyl group having 1 to 30 carbon atoms (for example, 1 to 10 carbon atoms) is bonded.
  • a numerical range expressed using “to” means a range including a numerical value described before “to” as a lower limit value and a numerical value described after “to” as an upper limit value. To do.
  • anion contained in the ionic polymer examples include an anion having a halogen atom, and derivatives of oxo acids such as carboxylic acid, sulfonic acid, and phosphoric acid (for example, hydrogen sulfate, methanesulfonate, ethylsulfate, dimethylphosphate, 2- (2-methoxyethoxy) ethyl sulfate, dicyanamide, etc.), among which an anion having a halogen atom is preferred.
  • oxo acids such as carboxylic acid, sulfonic acid, and phosphoric acid (for example, hydrogen sulfate, methanesulfonate, ethylsulfate, dimethylphosphate, 2- (2-methoxyethoxy) ethyl sulfate, dicyanamide, etc.
  • These anions can be used individually by 1 type, and can also be used in combination of 2 or more type.
  • the ionic polymer has an energy ray curable group in the side chain, so when the energy layer is irradiated to the adhesive layer, the ionic polymer or the ionic polymer and the adhesive composition described later are used.
  • the adhesive in the product reacts and crosslinks. Therefore, bleeding out of the pressure-sensitive adhesive layer of the ionic polymer is suppressed, and when the pressure-sensitive adhesive sheet is peeled off from the adherend, it is difficult for adhesive residue (particles) to be generated, and contamination of the adherend is suppressed. be able to.
  • the energy ray curable group is, for example, a group containing an energy ray curable carbon-carbon double bond.
  • Specific examples include a (meth) acryloyl group and a vinyl group. Among them, a (meth) acryloyl group, particularly a methacryloyl group is preferable.
  • the content of the energy ray-curable group per unit mass of the ionic polymer is preferably 5 ⁇ 10 ⁇ 5 to 2 ⁇ 10 ⁇ 3 mol / g, and 1 ⁇ 10 ⁇ 4 to 1.5 ⁇ 10 ⁇ 3.
  • the molar ratio is particularly preferably 3 ⁇ 10 ⁇ 4 to 1 ⁇ 10 ⁇ 3 mol / g.
  • the ionic polymer has, for example, a polymerizable monomer having an ionic functional group (preferably a polymerizable monomer having a quaternary ammonium cation), a polymerizable monomer having a reactive functional group, and, if necessary, an ether bond.
  • a polymerizable monomer and another polymerizable monomer are copolymerized and then contain a curable group having a substituent that reacts with the reactive functional group and an energy ray-curable group. It can be obtained by reacting a compound (hereinafter also referred to as “energy ray curable compound”).
  • the “polymerizable monomer having a quaternary ammonium cation” is preferably composed of a quaternary ammonium cation having a polymerizable group and an anion corresponding thereto.
  • the polymerizable group include cyclic ethers having a carbon-carbon unsaturated group such as (meth) acryloyl group, vinyl group and allyl group, epoxy group and oxetane group, cyclic sulfides such as tetrahydrothiophene, and isocyanate groups.
  • (meth) acryloyl group and vinyl group are preferable.
  • the proportion of the mass of the structural portion derived from the “polymerizable monomer having a quaternary ammonium cation” in the total mass of the ionic polymer is preferably 20% by mass or more and 80% by mass or less, and 25% by mass or more and 75% by mass or less. It is more preferable that it is 35 mass% or more and 60 mass% or less.
  • the proportion of the mass of the structural portion derived from the “polymerizable monomer having a quaternary ammonium cation” is 20% by mass or more, the ionic polymer exhibits sufficient antistatic properties.
  • the proportion of the mass of the structural portion derived from the “polymerizable monomer having a quaternary ammonium cation” is 80% by mass or less, the proportion of the mass of the structural portion derived from another monomer can be controlled within a preferable range.
  • a (meth) acrylic acid ester monomer having a functional group such as a carboxyl group, a hydroxy group, an amino group, a substituted amino group, and an epoxy group in addition to (meth) acrylic acid Among them, (meth) acrylic acid is preferable.
  • the proportion of the mass of the structural portion derived from the “polymerizable monomer having a reactive functional group” in the mass of the entire ionic polymer is preferably 1% by mass to 35% by mass, and preferably 3% by mass to 20% by mass. It is more preferable that it is 3 mass% or more and 10 mass% or less.
  • the proportion of the mass of the structural portion derived from the “polymerizable monomer having a reactive functional group” is within the above range, the amount of energy ray curable group introduced into the ion polymer of the energy ray curable compound is controlled within a preferable range. be able to.
  • the ionic polymer preferably has a structural unit having an ether bond in the side chain.
  • “polymerizable monomer having an ether bond” is used as a raw material of the ionic polymer.
  • examples of the “polymerizable monomer having an ether bond” include (meth) acrylate having an ether bond.
  • the proportion of the mass of the structural portion derived from the “polymerizable monomer having an ether bond” in the total mass of the ionic polymer is preferably 5% by mass or more and 70% by mass or less, and preferably 10% by mass or more and 50% by mass or less. Particularly preferred is 15% by mass or more and 40% by mass or less.
  • an acrylic polymerizable monomer is preferable.
  • (meth) acrylic acid ester is preferably exemplified.
  • Examples of the (meth) acrylic acid ester have a chain skeleton such as methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate ( (Meth) acrylate; having a cyclic skeleton such as cyclohexyl (meth) acrylate, benzyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentanyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, imide acrylate ( And (meth) acrylate.
  • the (meth) acrylic acid ester is a (meth)
  • Examples of the “energy ray curable compound” are not particularly limited as long as they have an energy ray curable group, but are low molecular weight compounds (monofunctional and polyfunctional monomers and oligomers) from the viewpoint of versatility. Is preferred.
  • Specific examples of the low molecular weight energy ray-curable compound (A2) include trimethylolpropane tri (meth) acrylate, tetramethylolmethanetetra (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol monohydroxypenta ( (Meth) acrylate, dipentaerythritol hexa (meth) acrylate or 1,4-butylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, dicyclopentadiene dimethoxydi (meth) acrylate, isobornyl (meth) ) Cyclic
  • the “energy ray curable compound” and the “polymerizable monomer having a reactive functional group” are reacted so that the molar equivalent is about the same amount.
  • the weight average molecular weight of the ionic polymer is preferably 500 to 200,000, particularly preferably 800 to 100,000, and more preferably 800 to 50,000, from the viewpoint of more manifesting the effects of the present embodiment. preferable.
  • the weight average molecular weight of an ionic polymer is the value of standard polymethylmethacrylate conversion measured on the following measurement conditions by the gel permeation chromatography (GPC) method.
  • the content of the ionic polymer depends on the type of the ionic functional group contained in the ionic polymer, but is preferably 0.01% by mass or more and 20% by mass or less, more preferably 0.05% by mass with respect to the entire pressure-sensitive adhesive layer. It is 18 mass% or less, More preferably, it is 0.10 mass% or more and 15 mass% or less.
  • the content of the ionic polymer is 0.01% by mass or more, antistatic performance is easily exhibited.
  • the content of the ionic polymer is 20% by mass or less, the cohesive force of the pressure-sensitive adhesive layer before irradiation with energy rays is maintained high, so that adhesive residue on the adherend surface when the pressure-sensitive adhesive sheet is peeled is easily suppressed.
  • Metal fine particles, metal oxides, metal fillers, and surfactants examples include aluminum, copper, titanium, iron, and nickel.
  • metal oxide examples include ITO (indium tin oxide), ZnO (zinc oxide), IZO (indium zinc oxide), AZO (zinc aluminum oxide), GZO (zinc gallium oxide), IGZO (indium gallium zinc oxide), and ATO. (Tin antimony oxide) and the like.
  • surfactant a known one can be used.
  • Adhesive composition It does not specifically limit as an adhesive contained in the adhesive composition containing an antistatic agent, Various types of adhesive can be applied to an adhesive layer.
  • the adhesive contained in the adhesive layer 12 include rubber-based, acrylic-based, silicone-based, polyester-based, and urethane-based.
  • the kind of adhesive is selected in consideration of the use, the kind of adherend to be attached, and the like.
  • the pressure-sensitive adhesive layer 12 preferably contains an acrylic pressure-sensitive adhesive composition or a silicone-based pressure-sensitive adhesive composition.
  • Acrylic pressure-sensitive adhesive composition is also referred to as a (meth) acrylic acid alkyl ester having an alkyl group having 4 to 12 carbon atoms (hereinafter referred to as “specific (meth) acrylic acid alkyl ester”). It is preferable to include an acrylic copolymer having a main monomer.
  • (meth) acrylic acid is a notation used to represent both “acrylic acid” and “methacrylic acid”, and the same applies to other similar terms.
  • “specific (meth) acrylic acid alkyl ester” is the main monomer, and the mass of the copolymer component derived from the specific (meth) acrylic acid alkyl ester in the total mass of the acrylic copolymer. It means that the ratio of is 50 mass% or more.
  • the carbon number of the alkyl group in the specific (meth) acrylic acid alkyl ester is preferably 4 or more and 12 or less, more preferably 4 or more and 10 or less, and still more preferably 4 or more and 8 or less.
  • the alkyl group in the specific (meth) acrylic acid alkyl ester may be linear, branched, or cyclic, but is preferably branched.
  • the specific (meth) acrylic acid alkyl ester may be used alone or in combination of two or more, but the main monomer is preferably used alone.
  • the specific (meth) acrylic acid alkyl ester is preferably 2-ethylhexyl acrylate. That is, the acrylic pressure-sensitive adhesive composition preferably contains an acrylic copolymer having 2-ethylhexyl acrylate as a main monomer.
  • the proportion of the copolymer component derived from the specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate) in the acrylic copolymer is from 50% by mass to 95% by mass. It is preferably 60% by mass to 95% by mass, more preferably 80% by mass to 95% by mass, and still more preferably 85% by mass to 93% by mass. .
  • the proportion of the copolymer component derived from a specific (meth) acrylic acid alkyl ester preferably 2-ethylhexyl acrylate
  • the adhesive strength does not become too high after heating
  • the pressure-sensitive adhesive sheet is more easily peeled off, and is more easily peeled off at 80% by mass or more. If the proportion of the copolymer component derived from 2-ethylhexyl acrylate is 95% by mass or less, the initial adhesive force is insufficient and the substrate is deformed during heating, or the adhesive sheet is peeled off from the adherend due to the deformation. Can be prevented.
  • an adhesive layer contains an acrylic adhesive composition
  • the antistatic agent, the acrylic copolymer, and the adhesion adjuvant are included.
  • the acrylic copolymer is preferably a copolymer having a specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate) as a main monomer.
  • the adhesion aid preferably contains a rubber-based material having a reactive group as a main component.
  • the type and number of copolymer components other than the specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate) in the acrylic copolymer are not particularly limited.
  • a functional group-containing monomer having a reactive functional group is preferable.
  • a reactive functional group of a 2nd copolymer component when using the crosslinking agent mentioned later, it is preferable that it is a functional group which can react with the said crosslinking agent.
  • This reactive functional group is preferably at least one substituent selected from the group consisting of, for example, a carboxyl group, a hydroxyl group, an amino group, a substituted amino group, and an epoxy group. These substituents are more preferable, and a carboxyl group is still more preferable.
  • Examples of the monomer having a carboxyl group include ethylenically unsaturated carboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, maleic acid, itaconic acid, and citraconic acid.
  • carboxyl group-containing monomers acrylic acid is preferable from the viewpoint of reactivity and copolymerization.
  • a carboxyl group-containing monomer may be used independently and may be used in combination of 2 or more type.
  • Examples of the monomer having a hydroxyl group include, for example, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, (meth) acrylic acid 2 And (meth) acrylic acid hydroxyalkyl esters such as hydroxybutyl, 3-hydroxybutyl (meth) acrylate, and 4-hydroxybutyl (meth) acrylate.
  • 2-hydroxyethyl (meth) acrylate is preferred from the viewpoint of hydroxyl reactivity and copolymerization.
  • a hydroxyl-containing monomer may be used independently and may be used in combination of 2 or more type.
  • Examples of the acrylate ester having an epoxy group include glycidyl acrylate and glycidyl methacrylate.
  • the main monomer in the acrylic copolymer is one specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate)
  • other copolymer components other than the main monomer include an alkyl group (Meth) acrylic acid alkyl ester having 2 to 20 carbon atoms.
  • (meth) acrylic acid alkyl esters include, for example, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, n-pentyl (meth) acrylate, and (meth) acrylic acid n.
  • (meth) acrylic acid alkyl esters from the viewpoint of further improving adhesiveness, (meth) acrylic acid esters having an alkyl group with 2 or more and 4 or less carbon atoms are preferred, and (meth) acrylic acid n-butyl is preferred. More preferred.
  • the (meth) acrylic acid alkyl ester may be used alone or in combination of two or more.
  • copolymer components in the acrylic copolymer include, for example, alkoxyalkyl group-containing (meth) acrylic acid ester, (meth) acrylic acid ester having an aliphatic ring, and (meth) acrylic acid having an aromatic ring.
  • alkoxyalkyl group-containing (meth) acrylic acid ester examples include methoxymethyl (meth) acrylate, methoxyethyl (meth) acrylate, ethoxymethyl (meth) acrylate, and ethoxyethyl (meth) acrylate.
  • examples of the (meth) acrylic acid ester having an aliphatic ring include cyclohexyl (meth) acrylate.
  • examples of the (meth) acrylic acid ester having an aromatic ring examples include phenyl (meth) acrylate.
  • non-crosslinkable acrylamide examples include acrylamide and methacrylamide.
  • Examples of the (meth) acrylic acid ester having a non-crosslinkable tertiary amino group include (meth) acrylic acid (N, N-dimethylamino) ethyl and (meth) acrylic acid (N, N-dimethylamino). Propyl.
  • a copolymer component derived from a monomer having a nitrogen atom-containing ring is also preferable from the viewpoint of improving the polarity of the pressure-sensitive adhesive and improving the adhesion and adhesive force. .
  • Examples of monomers having a nitrogen atom-containing ring include N-vinyl-2-pyrrolidone, N-methylvinylpyrrolidone, N-vinylpiperidone, N-vinylpiperazine, N-vinylpyrazine, N-vinylpyrrole, N-vinylimidazole, N- Examples include vinyl morpholine, N-vinyl caprolactam, and N- (meth) acryloyl morpholine.
  • N- (meth) acryloylmorpholine is preferable. These monomers may be used independently and may be used in combination of 2 or more type.
  • a carboxyl group-containing monomer or a hydroxyl group-containing monomer is preferable as the second copolymer component, and acrylic acid is more preferable.
  • the acrylic copolymer includes a copolymer component derived from 2-ethylhexyl acrylate and a copolymer component derived from acrylic acid
  • the copolymer component derived from acrylic acid occupies the total mass of the acrylic copolymer.
  • the mass ratio is preferably 1% by mass or less, and more preferably 0.1% by mass or more and 0.5% by mass or less. If the ratio of acrylic acid is 1 mass% or less, when an adhesive composition contains a crosslinking agent, crosslinking of the acrylic copolymer can be prevented from proceeding too quickly.
  • the acrylic copolymer may contain a copolymer component derived from two or more kinds of functional group-containing monomers.
  • the acrylic copolymer may be a ternary copolymer.
  • an acrylic copolymer obtained by copolymerizing 2-ethylhexyl acrylate, a carboxyl group-containing monomer and a hydroxyl group-containing monomer is preferred, and this carboxyl group-containing monomer is preferred.
  • the hydroxyl group-containing monomer is preferably 2-hydroxyethyl acrylate.
  • the ratio of the copolymer component derived from 2-ethylhexyl acrylate in the acrylic copolymer is 80% by mass or more and 95% by mass or less, and the ratio of the mass of the copolymer component derived from acrylic acid is 1% by mass or less.
  • the balance is preferably a copolymer component derived from 2-hydroxyethyl acrylate.
  • the weight average molecular weight (Mw) of the acrylic copolymer is preferably from 300,000 to 2,000,000, more preferably from 600,000 to 1,500,000, and more preferably from 800,000 to 1,200,000. preferable. If the weight average molecular weight Mw of the acrylic copolymer is 300,000 or more, the acrylic copolymer can be peeled without a residue of the pressure-sensitive adhesive on the adherend. When the weight average molecular weight Mw of the acrylic copolymer is 2 million or less, it can be reliably attached to the adherend.
  • the weight average molecular weight Mw of the acrylic copolymer is a standard polystyrene equivalent value measured by a gel permeation chromatography (GPC) method.
  • the acrylic copolymer can be produced according to a conventionally known method using the above-mentioned various raw material monomers.
  • the form of copolymerization of the acrylic copolymer is not particularly limited, and any of a block copolymer, a random copolymer, and a graft copolymer may be used.
  • the content of the acrylic copolymer in the pressure-sensitive adhesive composition is preferably 40% by mass or more and 90% by mass or less, and more preferably 50% by mass or more and 90% by mass or less.
  • the adhesion aid preferably contains a rubber-based material having a reactive group as a main component. If the pressure-sensitive adhesive composition contains a reactive pressure-sensitive adhesive aid, the adhesive residue can be reduced.
  • the content of the adhesion assistant in the pressure-sensitive adhesive composition is preferably 3% by mass or more and 50% by mass or less, and more preferably 5% by mass or more and 30% by mass or less. If the content rate of the adhesion promoter in an adhesive composition is 3 mass% or more, generation
  • including a rubber-based material having a reactive group as a main component means that the proportion of the mass of the rubber-based material having a reactive group in the total mass of the adhesive aid exceeds 50% by mass.
  • the ratio of the rubber-based material having a reactive group in the adhesion assistant is preferably more than 50% by mass, and more preferably 80% by mass or more. It is also preferable that the adhesion assistant is made of a rubber-based material having a substantially reactive group.
  • the reactive group is preferably one or more functional groups selected from the group consisting of a hydroxyl group, an isocyanate group, an amino group, an oxirane group, an acid anhydride group, an alkoxy group, an acryloyl group, and a methacryloyl group. More preferably.
  • the reactive group possessed by the rubber material may be one type or two or more types.
  • the rubber-based material having a hydroxyl group may further have the aforementioned reactive group.
  • the number of reactive groups may be one per molecule constituting the rubber-based material, or two or more.
  • the rubber-based material is not particularly limited, but a polybutadiene-based resin and a hydrogenated product of a polybutadiene-based resin are preferable, and a hydrogenated product of a polybutadiene-based resin is more preferable.
  • the polybutadiene-based resin include resins having 1,4-repeat units, resins having 1,2-repeat units, and resins having both 1,4-repeat units and 1,2-repeat units.
  • the hydrogenated product of the polybutadiene resin of the present embodiment includes a hydride of a resin having these repeating units.
  • the polybutadiene resin and the hydrogenated product of the polybutadiene resin preferably have reactive groups at both ends.
  • the reactive groups at both ends may be the same or different.
  • the reactive groups at both ends are preferably one or more functional groups selected from the group consisting of a hydroxyl group, an isocyanate group, an amino group, an oxirane group, an acid anhydride group, an alkoxy group, an acryloyl group, and a methacryloyl group. More preferably, it is a hydroxyl group.
  • both ends are hydroxyl groups.
  • the pressure-sensitive adhesive composition according to the present embodiment preferably contains a cross-linked product obtained by cross-linking a composition containing a cross-linking agent in addition to the acrylic copolymer and the pressure-sensitive adhesive aid.
  • the solid content of the pressure-sensitive adhesive composition is substantially composed of a cross-linked product obtained by cross-linking the above-mentioned acrylic copolymer, a pressure-sensitive adhesive aid, and a cross-linking agent.
  • substantially means that the solid content of the pressure-sensitive adhesive composition is composed only of the cross-linked product, excluding trace amounts of impurities that are inevitably mixed in the pressure-sensitive adhesive.
  • examples of the crosslinking agent include an isocyanate crosslinking agent, an epoxy crosslinking agent, an aziridine crosslinking agent, a metal chelate crosslinking agent, an amine crosslinking agent, and an amino resin crosslinking agent.
  • These cross-linking agents may be used alone or in combination of two or more.
  • a crosslinking agent (isocyanate-based crosslinking agent) containing a compound having an isocyanate group as a main component is preferable.
  • isocyanate crosslinking agent examples include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylylene diisocyanate, 1,4-xylylene diisocyanate, diphenylmethane-4,4′-diisocyanate, Polyvalent isocyanates such as diphenylmethane-2,4'-diisocyanate, 3-methyldiphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, dicyclohexylmethane-2,4'-diisocyanate, and lysine isocyanate Compounds.
  • Polyvalent isocyanates such as diphenylmethane-2,4'-diisocyanate, 3-methyldiphenylmethane diisocyanate, hexamethylene diisocyanate,
  • the polyisocyanate compound may be a trimethylolpropane adduct-type modified product, a burette-type modified product reacted with water, or an isocyanurate-type modified product having an isocyanurate ring.
  • crosslinking agent whose main component is a compound having an isocyanate group means that the proportion of the compound having an isocyanate group in the total mass of the components constituting the crosslinking agent is 50% by mass or more. To do.
  • the content of the crosslinking agent in the pressure-sensitive adhesive composition is preferably 0.1 parts by mass or more and 20 parts by mass or less, more preferably 1 part by mass or more with respect to 100 parts by mass of the acrylic copolymer. 15 parts by mass or less, more preferably 5 parts by mass or more and 10 parts by mass or less. If content of the crosslinking agent in an adhesive composition is in such a range, the adhesiveness of the layer (adhesive layer) containing an adhesive composition and a to-be-adhered body (for example, base material) will be improved. It is possible to shorten the curing period for stabilizing the adhesive property after the production of the adhesive sheet.
  • the isocyanate-based crosslinking agent is more preferably a compound having an isocyanurate ring (isocyanurate-type modified product).
  • the compound having an isocyanurate ring is preferably blended in an amount of 0.7 to 1.5 equivalents relative to the hydroxyl equivalent of the acrylic copolymer. If the compounding quantity of the compound which has an isocyanurate ring is 0.7 equivalent or more, adhesive force will not become high too high after a heating, it will become easy to peel the adhesive sheet 10, and adhesive residue can be reduced. If the compounding quantity of the compound which has an isocyanurate ring is 1.5 equivalent or less, it can prevent that an initial stage adhesive force becomes low too much, or can prevent a sticking fall.
  • the pressure-sensitive adhesive composition in this embodiment contains a crosslinking agent
  • the pressure-sensitive adhesive composition preferably further contains a crosslinking accelerator.
  • the crosslinking accelerator is preferably selected and used as appropriate according to the type of the crosslinking agent.
  • the pressure-sensitive adhesive composition contains a polyisocyanate compound as a crosslinking agent
  • a silicone-type adhesive composition contains an addition polymerization type silicone resin.
  • a silicone pressure-sensitive adhesive composition containing an addition polymerization type silicone resin is referred to as an addition reaction type silicone pressure-sensitive adhesive composition.
  • the addition reaction type silicone pressure-sensitive adhesive composition contains a main agent and a crosslinking agent.
  • the addition reaction type silicone pressure-sensitive adhesive composition can be used only by primary curing at a low temperature, and has an advantage that secondary curing at a high temperature is not required.
  • the conventional peroxide-curing silicone pressure-sensitive adhesive requires secondary curing at a high temperature such as 150 ° C. or higher. Therefore, by using an addition reaction type silicone pressure-sensitive adhesive composition, it becomes possible to produce a pressure-sensitive adhesive sheet at a relatively low temperature, using a base material having excellent energy economy and relatively low heat resistance. It is also possible to produce an adhesive sheet. Further, since no by-product is produced during curing unlike the peroxide-curing silicone pressure-sensitive adhesive, there are no problems such as odor and corrosion.
  • the addition reaction type silicone pressure-sensitive adhesive composition is usually composed of a main agent composed of a mixture of a silicone resin component and a silicone rubber component, a hydrosilyl group (SiH group) -containing crosslinking agent, and a curing catalyst used as necessary.
  • the silicone resin component is an organopolysiloxane having a network structure obtained by hydrolyzing organochlorosilane or organoalkoxysilane and then performing a dehydration condensation reaction.
  • the silicone rubber component is a diorganopolysiloxane having a linear structure.
  • organo group in the silicone resin component and the silicone rubber component examples include a methyl group, an ethyl group, a propyl group, a butyl group, and a phenyl group.
  • the aforementioned organo groups are partially vinyl, hexenyl, allyl, butenyl, pentenyl, octenyl, (meth) acryloyl, (meth) acryloylmethyl, (meth) acryloylpropyl, and cyclohexenyl. It may be substituted with an unsaturated group such as a group.
  • An organo group having a vinyl group that is easily available industrially is preferred.
  • crosslinking proceeds by an addition reaction between an unsaturated group and a hydrosilyl group to form a network structure, thereby exhibiting adhesiveness.
  • the number of unsaturated groups such as vinyl groups is usually 0.05 or more and 3.0 or less, preferably 0.1 or more and 2.5 or less, per 100 organo groups.
  • organopolysiloxane described above examples include KS-3703 manufactured by Shin-Etsu Chemical Co., Ltd. (the number of vinyl groups is 0.6 with respect to 100 methyl groups), Toray Dow Corning BY23-753 manufactured by the company (the number of vinyl groups is 0.1 per 100 methyl groups) and BY24-162 (the number of vinyl groups is 1.4 per 100 methyl groups) )).
  • SD4560PSA, SD4570PSA, SD4580PSA, SD4584PSA, SD4585PSA, SD4587L, and SD4592PSA manufactured by Toray Dow Corning can also be used.
  • organopolysiloxane which is a silicone resin component
  • silicone rubber component KS-3800 (manufactured by Shin-Etsu Chemical Co., Ltd.) 7.6 for 100 methyl groups), BY24-162 made by Toray Dow Corning (number of vinyl groups is 1.4 for 100 methyl groups), BY24- 843 (having no unsaturated group) and SD-7292 (the number of vinyl groups is 5.0 with respect to 100 methyl groups).
  • Specific examples of the addition reaction type silicone as described above are described, for example, in JP-A-10-219229.
  • the crosslinking agent is usually 0.5 to 10 hydrogen atoms bonded to silicon atoms, preferably 1 or more to one unsaturated group such as a vinyl group of the silicone resin component and the silicone rubber component. It mix
  • the number By setting the number to 0.5 or more, the reaction between the unsaturated group such as a vinyl group and the hydrosilyl group does not proceed completely, thereby preventing poor curing.
  • the addition reaction type silicone pressure-sensitive adhesive composition preferably contains a curing catalyst together with the above addition reaction type silicone component (main agent comprising a silicone resin component and a silicone rubber component) and a crosslinking agent.
  • This curing catalyst is used to accelerate the hydrosilylation reaction between the unsaturated group in the silicone resin component and the silicone rubber component and the Si—H group in the crosslinking agent.
  • platinum-based catalysts that is, chloroplatinic acid, an alcohol solution of chloroplatinic acid, a reaction product of chloroplatinic acid and an alcohol solution, a reaction product of chloroplatinic acid and an olefin compound, chloroplatinic acid and vinyl
  • examples thereof include a reaction product with a group-containing siloxane compound, a platinum-olefin complex, a platinum-vinyl group-containing siloxane complex, and a platinum-phosphorus complex.
  • Specific examples of the curing catalyst as described above are described in, for example, JP-A-2006-28311 and JP-A-10-147758. More specifically, commercially available products include SRX-212 manufactured by Toray Dow Corning, and PL-50T manufactured by Shin-Etsu Chemical Co., Ltd.
  • the blending amount of the curing catalyst is usually 5 mass ppm or more and 2000 mass ppm or less, preferably 10 mass ppm or more and 500 mass ppm or less with respect to the total amount of the silicone resin component and the silicone rubber component as platinum content.
  • curability is lowered and the crosslinking density is reduced, that is, the adhesive force and the cohesive force (holding force) are prevented from being reduced. While preventing, the stability of an adhesive layer can be hold
  • addition reaction type silicone pressure-sensitive adhesive composition an adhesive force is exhibited even at room temperature (25 ° C.) by blending the above-mentioned components, but the addition reaction type silicone pressure-sensitive adhesive composition will be described later on the substrate 11 or later.
  • the heating temperature is usually 60 ° C. or higher and 140 ° C. or lower, preferably 80 ° C. or higher and 130 ° C. or lower. Heating at 60 ° C. or higher prevents insufficient crosslinking between the silicone resin component and the silicone rubber component and prevents the adhesive force from becoming insufficient. Heating at 140 ° C. or lower causes thermal shrinkage and wrinkles on the substrate. , Deterioration or discoloration can be prevented.
  • an active energy ray having energy quanta in an electromagnetic wave or a charged particle beam that is, an active light such as an ultraviolet ray or an electron beam
  • an active light such as an ultraviolet ray or an electron beam
  • a photopolymerization initiator is not required.
  • a photopolymerization initiator is present.
  • the photopolymerization initiator in the case of ultraviolet irradiation is not particularly limited, and any photopolymerization initiator that has been conventionally used in ultraviolet curable resins can be appropriately selected and used. it can.
  • photopolymerization initiator examples include benzoins, benzophenones, acetophenones, ⁇ -hydroxy ketones, ⁇ -amino ketones, ⁇ -diketones, ⁇ -diketone dialkyl acetals, anthraquinones, thioxanthones, and others. Compounds and the like. These photopolymerization initiators may be used alone or in combination of two or more. The amount used is usually 0.01 parts by mass or more and 30 parts by mass or less, preferably 0.05 parts by mass with respect to 100 parts by mass of the total amount of the addition reaction type silicone component and the crosslinking agent used as the main agent. It is selected in the range of 20 parts by mass or less.
  • a pressure-sensitive adhesive sheet having stable adhesive strength can be obtained by crosslinking by irradiation with heat or active energy rays.
  • the acceleration voltage of an electron beam in the case of crosslinking by irradiating with an electron beam which is one of active energy rays is generally 130 kV to 300 kV, preferably 150 kV to 250 kV. Irradiation at an acceleration voltage of 130 kV or more can prevent the silicone resin component and the silicone rubber component from being insufficiently crosslinked and prevent the adhesive force from becoming insufficient. It is possible to prevent the layer 12 and the substrate 11 from being deteriorated or discolored.
  • a preferable range of the beam current is 1 mA or more and 100 mA or less.
  • the dose of the irradiated electron beam is preferably 1 Mrad or more and 70 Mrad or less, and more preferably 2 Mrad or more and 20 Mrad or less.
  • irradiating with a dose of 1 Mrad or more it is possible to prevent the pressure-sensitive adhesive layer and the base material from being deteriorated or discolored, and to prevent the adhesiveness from being insufficient due to insufficient crosslinking.
  • irradiating with a dose of 70 Mrad or less it is possible to prevent the cohesive force from being lowered due to deterioration or discoloration of the pressure-sensitive adhesive layer, and it is possible to prevent the base material from being deteriorated or contracted.
  • the irradiation amount in the case of ultraviolet irradiation is appropriately selected.
  • the light amount is from 100 mJ / cm 2 to 500 mJ / cm 2 and the illuminance is from 10 mW / cm 2 to 500 mW / cm 2 .
  • Heating and irradiation with active energy rays are preferably performed in a nitrogen atmosphere in order to prevent reaction inhibition by oxygen.
  • the thickness of an adhesive layer is suitably determined according to the use of an adhesive sheet.
  • the thickness of the pressure-sensitive adhesive layer is preferably 5 ⁇ m or more and 60 ⁇ m or less, and more preferably 10 ⁇ m or more and 50 ⁇ m or less.
  • the pressure-sensitive adhesive layer easily follows unevenness on the circuit surface of the semiconductor chip. Thereby, since it becomes difficult to produce a clearance gap between an adhesive layer and a semiconductor chip, it is suppressed that an interlayer insulation material, sealing resin, etc. enter into the clearance gap, for example. As a result, the electrode pad for wiring connection on the chip circuit surface is prevented from being blocked.
  • the semiconductor chip is suppressed from sinking into the pressure-sensitive adhesive layer. Accordingly, a step between the semiconductor chip portion and the resin portion for sealing the semiconductor chip is less likely to occur, and as a result, disconnection of the wiring during rewiring is suppressed.
  • the adhesive composition may contain the other component in the range which does not impair the effect of this invention.
  • other components that can be included in the pressure-sensitive adhesive composition include flame retardants, tackifiers, ultraviolet absorbers, light stabilizers, antioxidants, antiseptics, antifungal agents, plasticizers, antifoaming agents, and coloring. Agents, fillers, wettability adjusting agents and the like.
  • the addition reaction type silicone pressure-sensitive adhesive composition may contain non-reactive polyorganosiloxanes such as polydimethylsiloxane and polymethylphenylsiloxane as additives.
  • Method for producing adhesive sheet for example, a method of applying an adhesive composition on the first substrate surface of a substrate to form an adhesive layer, on the first substrate surface of the substrate, if necessary. Then, an intermediate layer or a conductive layer was formed by applying a composition for forming an intermediate layer or a conductive layer (for example, an oligomer sealing layer composition, a primer layer forming composition, a conductive layer forming composition, etc.). Then, the method of apply
  • a composition for forming an intermediate layer or a conductive layer for example, an oligomer sealing layer composition, a primer layer forming composition, a conductive layer forming composition, etc.
  • a pressure-sensitive adhesive layer is formed on a release sheet to be described later, and the pressure-sensitive adhesive layer on the release sheet and the oligomer sealing layer formed on the substrate Or the method of bonding the said conductive layer is mentioned.
  • the detail about the manufacturing method of the adhesive sheet which has a peeling sheet is mentioned later.
  • the pressure-sensitive adhesive composition When the pressure-sensitive adhesive composition is applied to form a pressure-sensitive adhesive layer, it is preferable to dilute the pressure-sensitive adhesive composition with an organic solvent to prepare and use a coating solution.
  • an organic solvent used for preparation of a coating liquid.
  • the organic solvent include aromatic solvents, aliphatic solvents, ester solvents, ketone solvents, and alcohol solvents.
  • the aromatic solvent include benzene, toluene, and xylene.
  • the aliphatic solvent include normal hexane and normal heptane.
  • the ester solvent include ethyl acetate and butyl acetate.
  • Examples of the ketone solvent include methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and cyclopentanone.
  • Examples of the alcohol solvent include isopropyl alcohol and methanol.
  • Examples of the coating method include spin coating, spray coating, bar coating, knife coating, roll knife coating, roll coating, blade coating, die coating, and gravure coating. In order to prevent the organic solvent and the low boiling point component from remaining in the pressure-sensitive adhesive layer, the intermediate layer, and the conductive layer, it is preferable to apply the coating liquid to, for example, a substrate and then heat and dry the coating film.
  • the pressure-sensitive adhesive sheet according to the second embodiment is different from the pressure-sensitive adhesive sheet according to the first embodiment in that a conductive layer is provided between the base material and the pressure-sensitive adhesive layer. Since the other points are the same as those of the first embodiment, the description is omitted or simplified. That is, the pressure-sensitive adhesive sheet according to the second embodiment is a pressure-sensitive adhesive sheet having a base material, a conductive layer, and a pressure-sensitive adhesive layer in this order.
  • the conductive layer is a layer containing a conductive material.
  • the conductive layer is preferably formed from a resin composition containing a conductive material.
  • a resin composition containing a conductive material.
  • the material carbon material, ionic material (ionic liquid, ionic polymer), metal microparticles, metal oxide, metal filler, and surfactant illustrated in the item of antistatic agent ), Compounds having an ionic functional group, and alloys.
  • the conductive material may be a conductive polymer.
  • the conductive layer is formed from a resin composition containing a conductive polymer (hereinafter also referred to as “conductive layer forming composition”).
  • the resin contained in the conductive layer forming composition preferably contains at least one selected from the group consisting of a polyester resin, a urethane resin and an acrylic resin (hereinafter referred to as “specific resin”) as a main component.
  • the main component means that the ratio of the total mass of the specific resin to the total mass of the resin contained in the conductive layer forming composition is 50% by mass or more.
  • the resin contained in the composition for forming a conductive layer one type may be used alone, or two different types may be used in combination.
  • a polyester resin and a polyurethane resin are contained as the main component constituting the conductive layer from the viewpoint of adhesion to the substrate.
  • the adhesiveness with the polyester base material is sufficient, but since it is a relatively brittle resin, it tends to cause cohesive failure during cutting, If the resin contained in the composition for forming a conductive layer is a single polyurethane resin, the adhesiveness with a polyester base material is poor.
  • a resin layer that solves these problems, has excellent adhesion to a polyester-based substrate, and is difficult to break even during cutting is obtained.
  • Constaining a polyester resin and a polyurethane resin also means that a polymer containing a polyester structure and a polyurethane structure in one molecule is included alone.
  • Examples of the conductive polymer include polythiophene-based, polyaniline-based, and polypyrrole-based conductive polymers.
  • Examples of the polythiophene-based conductive polymer include polythiophene, poly (3-alkylthiophene), poly (3-thiophene- ⁇ -ethanesulfonic acid), a mixture of polyalkylenedioxythiophene and polystyrene sulfonate, and the like.
  • Examples of the polyalkylene dioxythiophene include polyethylene dioxythiophene, polypropylene dioxythiophene, poly (ethylene / propylene) dioxythiophene, and the like.
  • Examples of the polyaniline-based conductive polymer include polyaniline, polymethylaniline, polymethoxyaniline, and the like.
  • polypyrrole-based conductive polymer examples include polypyrrole, poly-3-methylpyrrole, and poly-3-octylpyrrole. These conductive polymer compounds may be used alone or in combination of two or more. These conductive polymers are preferably used in the form of an aqueous solution dispersed in water.
  • the content of the conductive polymer in the conductive layer is preferably from 0.1% by mass to 50% by mass in terms of solid content, and more preferably from 0.3% by mass to 30% by mass.
  • the content of the conductive polymer is 0.1% by mass or more, antistatic performance is easily exhibited.
  • the content of the conductive polymer is 50% by mass or less, the strength of the conductive layer is increased, the cohesive failure is less likely to occur, and the adhesiveness of the pressure-sensitive adhesive layer is easily secured.
  • the thickness of the conductive layer is 30 nm or more and 290 nm or less, and preferably 30 nm or more and 250 nm or less.
  • the thickness of the conductive layer is 30 nm or more, the film-forming property on the surface of the substrate is good, and pinholes due to repellence are less likely to occur.
  • the thickness of the conductive layer is 290 nm or less, the cohesive failure of the conductive layer is less likely to occur, and the adhesiveness of the pressure-sensitive adhesive layer is easily ensured.
  • the composition for forming a conductive layer may be applied to the surface of the substrate on the side of the pressure-sensitive adhesive layer (in the case of FIG. 2, the first substrate surface 11c) and then dried.
  • the coating method include the coating methods described in the section of the method for producing the pressure-sensitive adhesive sheet.
  • the composition for forming a conductive layer may contain an organic solvent capable of dissolving or dispersing each component in the composition for forming a conductive layer.
  • the organic solvent ether solvents, alcohol solvents, mixed solvents of alcohol solvents and purified water, and the like are preferable.
  • FIG. 2 shows a cross-sectional view of the pressure-sensitive adhesive sheet 10A according to the second embodiment.
  • the pressure-sensitive adhesive sheet 10A has a conductive layer 13 between the base material 11A and the pressure-sensitive adhesive layer 12A. That is, the pressure-sensitive adhesive sheet 10A has a base material 11A, a conductive layer 13 containing a conductive material, and a pressure-sensitive adhesive layer 12A in this order.
  • the substrate 11A has a first substrate surface 11c and a second substrate surface 11d opposite to the first substrate surface 11c.
  • the pressure-sensitive adhesive layer 12A has a first pressure-sensitive adhesive surface 12c and a second pressure-sensitive adhesive surface 12d opposite to the first pressure-sensitive adhesive surface 12c.
  • the conductive layer 13 is laminated on the first base material surface 11c.
  • the surface resistivity of the first pressure-sensitive adhesive surface 12c of the pressure-sensitive adhesive layer 12A after high-temperature heating is less than 10 11 ⁇ / ⁇ .
  • the antistatic performance of the first pressure-sensitive adhesive surface 12c of the pressure-sensitive adhesive layer 12A after high-temperature heating Is thought to improve. Therefore, according to the second embodiment, the electrostatic breakdown of the semiconductor element can be further suppressed even if the pressure-sensitive adhesive sheet 10A is peeled off from the adherend after the process of being heated at a high temperature.
  • the pressure-sensitive adhesive sheet according to the third embodiment is different from the pressure-sensitive adhesive sheet according to the second embodiment in that an intermediate layer is included between the base material and the conductive layer. Since the other points are the same as those of the second embodiment, the description is omitted or simplified. That is, the pressure-sensitive adhesive sheet according to the third embodiment is a pressure-sensitive adhesive sheet having a base material, an intermediate layer, a conductive layer, and a pressure-sensitive adhesive layer in this order.
  • the intermediate layer is provided between the base material and the conductive layer.
  • the intermediate layer preferably has a function corresponding to a desired purpose.
  • examples of the intermediate layer include an oligomer sealing layer, a primer layer, and a hard coat layer.
  • an intermediate layer for example, an oligomer sealing layer, a primer layer, and a hard coat layer
  • At least one of the substrate thermal shrinkage can be improved.
  • the oligomer sealing layer is a layer for preventing the oligomer from entering the pressure-sensitive adhesive layer and the conductive layer in the third embodiment.
  • the pressure-sensitive adhesive sheet is exposed to high temperature conditions, oligomers contained in the substrate may be deposited on the surface of the substrate by heating.
  • invasion to the adhesive layer and conductive layer of the oligomer contained in a base material can be suppressed.
  • the oligomer sealing layer preferably prevents the oligomer from entering the pressure-sensitive adhesive layer even under high temperature conditions of 180 ° C. or higher and 200 ° C. or lower.
  • the material of the oligomer sealing layer is not particularly limited as long as the oligomer in the base material can be prevented from entering the pressure-sensitive adhesive layer and the conductive layer.
  • the oligomer sealing layer is preferably a cured film obtained by curing the composition for the oligomer sealing layer.
  • the composition for the oligomer sealing layer preferably contains, for example, at least one selected from the group consisting of (A) an epoxy compound, (B) a polyester compound, and (C) a polyfunctional amino compound. It is more preferable that a compound, (B) polyester compound, and (C) polyfunctional amino compound are included.
  • the composition for oligomer sealing layer may further contain (D) an acidic catalyst in order to promote the curing reaction.
  • the epoxy compound is preferably a bisphenol A type epoxy compound.
  • Examples of the bisphenol A type epoxy compound include bisphenol A diglycidyl ether.
  • Polyester compound (B) It does not specifically limit as a polyester compound, It can select from a well-known polyester compound suitably, and can be used.
  • the polyester compound is a resin obtained by a condensation reaction between a polyhydric alcohol and a polybasic acid, and is a compound modified with a condensate of a dibasic acid and a dihydric alcohol or a non-drying oil fatty acid.
  • a convertible polyester compound that is a condensate of a dibasic acid and a trivalent or higher alcohol.
  • polyhydric alcohol and polybasic acid used as a raw material for the polyester compound known polyhydric alcohols and polybasic acids can be appropriately selected and used.
  • a polyfunctional amino compound As a polyfunctional amino compound, a melamine compound, a urea compound, a benzoguanamine compound, and diamine can be used, for example.
  • melamine compounds include hexamethoxymethyl melamine, methylated melamine compounds, and butylated melamine compounds.
  • the urea compound include a methylated urea compound and a butylated urea compound.
  • the benzoguanamine compound include a methylated benzoguanamine compound and a butylated benzoguanamine compound.
  • diamines examples include ethylenediamine, tetramethylenediamine, hexamethylenediamine, N, N′-diphenylethylenediamine, and p-xylylenediamine.
  • the (C) polyfunctional amino compound is preferably hexamethoxymethylmelamine.
  • Acidic catalyst examples include hydrochloric acid and p-toluenesulfonic acid.
  • the oligomer sealing layer comprises (A) 50 mass% or more and 80 mass% of (A) bisphenol A type epoxy compound, (B) polyester compound, and (C) polyfunctional amino compound, respectively. % Or less, (B) 5% by mass or more and 30% by mass or less, and (C) a cured film obtained by curing an oligomer sealing layer composition containing 10% by mass or more and 40% by mass or less. .
  • the thickness of the intermediate layer is preferably 50 nm or more and 500 nm or less, and more preferably 80 nm or more and 300 nm or less. If the thickness of the intermediate layer is 50 nm or more, good adhesion between the substrate and the conductive layer can be easily obtained. In 3rd embodiment, when an intermediate
  • FIG. 3 shows a cross-sectional view of the pressure-sensitive adhesive sheet 10B according to the third embodiment.
  • an oligomer sealing layer 14 is provided as an intermediate layer. That is, the pressure-sensitive adhesive sheet 10B has a base material 11B, an oligomer sealing layer 14, a conductive layer 13A, and a pressure-sensitive adhesive layer 12B in this order.
  • the base material 11B has a first base material surface 11e and a second base material surface 11f opposite to the first base material surface 11e.
  • the pressure-sensitive adhesive layer 12B has a first pressure-sensitive adhesive surface 12e and a second pressure-sensitive adhesive surface 12f opposite to the first pressure-sensitive adhesive surface 12e.
  • the oligomer sealing layer 14 is stacked on the first base material surface 11e, and the conductive layer 13A and the pressure-sensitive adhesive layer 12B are stacked on the oligomer sealing layer 14 in this order.
  • the surface resistivity of the first pressure-sensitive adhesive surface 12e of the pressure-sensitive adhesive layer 12B after high-temperature heating is less than 10 11 ⁇ / ⁇ .
  • the antistatic performance on the first pressure-sensitive adhesive surface 12e of the pressure-sensitive adhesive layer 12B is considered to be improved because it has the conductive layer 13A as in the second embodiment.
  • the electrostatic breakdown of a semiconductor element can be suppressed more. Furthermore, according to the pressure-sensitive adhesive sheet 10B of the third embodiment, since the oligomer sealing layer 14 is provided between the base material 11B and the conductive layer 13A, the oligomer pressure-sensitive adhesive layer 12B and the conductive layer contained in the base material 11B. Intrusion into 13A can also be prevented.
  • the pressure-sensitive adhesive sheet according to the fourth embodiment is different from the pressure-sensitive adhesive sheet according to the second embodiment in that an intermediate layer is included instead of the conductive layer between the base material and the pressure-sensitive adhesive layer. Since the other points are the same as those of the second embodiment, the description is omitted or simplified.
  • FIG. 4 shows a cross-sectional view of the pressure-sensitive adhesive sheet 10C according to the fourth embodiment.
  • an oligomer sealing layer 14A is provided as an intermediate layer. That is, the pressure-sensitive adhesive sheet 10C has a base material 11C, an oligomer sealing layer 14A, and a pressure-sensitive adhesive layer 12C in this order.
  • the oligomer sealing layer 14 ⁇ / b> A is a layer for preventing the oligomer from entering the pressure-sensitive adhesive layer in the fourth embodiment.
  • the substrate 11C has a first substrate surface 11g and a second substrate surface 11h opposite to the first substrate surface 11g.
  • the pressure-sensitive adhesive layer 12C has a first pressure-sensitive adhesive surface 12g and a second pressure-sensitive adhesive surface 12h opposite to the first pressure-sensitive adhesive surface 12g.
  • an oligomer sealing layer 14A is laminated on the first base material surface 11g.
  • the surface resistivity of the first pressure-sensitive adhesive surface 12g of the pressure-sensitive adhesive layer 12C after high-temperature heating is less than 10 11 ⁇ / ⁇ . Therefore, according to the fourth embodiment, electrostatic breakdown of the semiconductor element can be further suppressed even if the pressure-sensitive adhesive sheet 10C is peeled off from the adherend after the process of being heated at a high temperature.
  • the oligomer sealing layer 14A is provided between the base material 11C and the pressure-sensitive adhesive layer 12C, the oligomer contained in the base material 11C is applied to the pressure-sensitive adhesive layer 12C. Intrusion can also be prevented. Thereby, 10 C of adhesive sheets become difficult to peel from a to-be-adhered body.
  • the pressure-sensitive adhesive sheet according to the fifth embodiment is the fourth embodiment in that it further includes a conductive layer on the side of the base material between the base material and the pressure-sensitive adhesive layer, and the intermediate layer is a primer layer. It is different from the adhesive sheet according to the form. Since other points are the same as those of the fourth embodiment, description thereof is omitted or simplified.
  • FIG. 5 shows a cross-sectional view of an adhesive sheet 10D according to the fifth embodiment.
  • the pressure-sensitive adhesive sheet 10D includes a base material 11D, a conductive layer 13B, a primer layer 14B, and a pressure-sensitive adhesive layer 12D in this order.
  • the substrate 11D has a first substrate surface 11i and a second substrate surface 11j opposite to the first substrate surface 11i.
  • the pressure-sensitive adhesive layer 12D has a first pressure-sensitive adhesive surface 12i and a second pressure-sensitive adhesive surface 12j opposite to the first pressure-sensitive adhesive surface 12i.
  • the conductive layer 13B is laminated on the first base material surface 11i.
  • the surface resistivity of the first pressure-sensitive adhesive surface 12i of the pressure-sensitive adhesive layer 12D after high-temperature heating is less than 10 11 ⁇ / ⁇ . Therefore, according to the fifth embodiment, the electrostatic breakdown of the semiconductor element can be further suppressed even if the pressure-sensitive adhesive sheet 10D is peeled off from the adherend after the process of being heated at a high temperature. Furthermore, according to the pressure-sensitive adhesive sheet 10D of the fifth embodiment, since the primer layer 14B is provided between the pressure-sensitive adhesive layer 12D and the conductive layer 13B, the adhesion between the pressure-sensitive adhesive layer 12D and the conductive layer 13B can be improved. it can. Thereby, it becomes easy to suppress the adhesive residue to the to-be-adhered body after peeling an adhesive sheet.
  • the adhesive sheet of the said embodiment (any one of 5th embodiment from 1st embodiment) is used when sealing a semiconductor element.
  • the pressure-sensitive adhesive sheet is not mounted on a metal lead frame, and is preferably used when sealing a semiconductor element stuck on the pressure-sensitive adhesive sheet.
  • the pressure-sensitive adhesive sheet of the above embodiment is not used when sealing a semiconductor element mounted on a metal lead frame, but seals the semiconductor element in a state of being adhered to an adhesive layer. It is preferably used when stopping.
  • the pressure-sensitive adhesive sheet attaches a semiconductor chip (an example of a semiconductor element) to the pressure-sensitive adhesive layer exposed at the step of attaching the frame member formed with a plurality of openings to the pressure-sensitive adhesive sheet and the opening of the frame member. It is preferably used in a process having a step, a step of covering the semiconductor chip with a sealing resin, and a step of thermosetting the sealing resin.
  • the adhesive sheet may be a single sheet or may be provided in a state where a plurality of adhesive sheets are laminated.
  • the adhesive sheet may be a long sheet or may be provided in a state of being wound in a roll.
  • the pressure-sensitive adhesive sheet wound up in a roll shape can be used by being unwound from a roll and cut into a desired size.
  • the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet may be covered with a release sheet.
  • the release sheet is not particularly limited.
  • the release sheet preferably includes a release substrate and a release agent layer formed by applying a release agent on the release substrate.
  • the release sheet may be provided with a release agent layer only on one side of the release substrate, or may be provided with a release agent layer on both sides of the release substrate.
  • the release substrate include a paper substrate, a laminated paper obtained by laminating a thermoplastic resin such as polyethylene on the paper substrate, and a plastic film.
  • the paper substrate include glassine paper, coated paper, and cast coated paper.
  • plastic film examples include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate, and polyolefin films such as polypropylene and polyethylene.
  • release agent examples include olefin resins, rubber elastomers (eg, butadiene resins, isoprene resins, etc.), long chain alkyl resins, alkyd resins, fluorine resins, and silicone resins.
  • seat in this specification is the concept including not only what is generally called a sheet
  • the thickness of the release sheet is not particularly limited.
  • the thickness of the release sheet is usually 20 ⁇ m or more and 200 ⁇ m or less, and preferably 25 ⁇ m or more and 150 ⁇ m or less.
  • the thickness of the release agent layer is not particularly limited.
  • the thickness of the release agent layer is preferably 0.01 ⁇ m or more and 2.0 ⁇ m or less, and 0.03 ⁇ m or more and 1.0 ⁇ m or less. Is more preferable.
  • the thickness of the plastic film is preferably 3 ⁇ m or more and 50 ⁇ m or less, and more preferably 5 ⁇ m or more and 40 ⁇ m or less.
  • the pressure-sensitive adhesive sheet having a release sheet is produced, for example, through the following steps. First, a pressure-sensitive adhesive composition is applied on a release sheet to form a coating film. Next, the coating film is dried to form an adhesive layer. Next, the adhesive layer on the release sheet and the substrate are bonded together. In the case where the pressure-sensitive adhesive sheet has an oligomer sealing layer as an intermediate layer, for example, an oligomer sealing layer is formed on the first base material surface of the base material. Next, the pressure-sensitive adhesive layer on the release sheet and the oligomer sealing layer on the substrate are bonded together.
  • the pressure-sensitive adhesive sheet has a conductive layer, after the conductive layer is formed on the first base material surface of the base material or the oligomer sealing layer in the same manner, the pressure-sensitive adhesive layer on the release sheet and the base material The conductive layer is attached.
  • the material of the sealing resin is a thermosetting resin
  • the present invention is not limited to such a mode.
  • oligomer sealing agent liquid for coating The following (A) bisphenol A type epoxy compound, (B) polyester compound, (C) polyfunctional amino compound, and (D) acidic catalyst are blended and stirred sufficiently. Thus, an oligomer sealing agent liquid for coating (composition for oligomer sealing layer) was prepared.
  • oligomer sealing layer As a base material, a biaxially stretched polyethylene terephthalate film (“Diafoil T-100” (trade name) manufactured by Mitsubishi Plastics, Inc., thickness 50 ⁇ m, storage elastic modulus at 100 ° C. 3.2 ⁇ 10 9 Pa, hereinafter also simply referred to as “film”).
  • the prepared oligomer sealing agent solution for coating was uniformly coated on one side of the prepared film by the Mayer bar coating method.
  • the coated film was passed through the oven, and the coating film was thermally cured to obtain an oligomer sealing layer having a thickness of 150 nm as an intermediate layer.
  • the temperature was set to 150 ° C.
  • the wind speed was set to 8 m / min
  • the processing speed in the oven was adjusted so that the coated film passed through the oven in 20 seconds.
  • pressure-sensitive adhesive composition A1 As a pressure-sensitive adhesive liquid for application. Specifically, 1.5 parts by mass of ketjen black as an antistatic agent was added to 100 parts by mass of polymer (X), and ketjen black was dispersed in polymer (X) using a disper. . Next, 12.5 parts by mass (solid content) of an adhesion assistant and 8.75 parts by mass (solid content) of a crosslinking agent are added to the polymer (X) in which ketjen black is dispersed, and solidified using methyl ethyl ketone. A pressure-sensitive adhesive composition A1 having a partial concentration of 30% by mass was prepared.
  • A1- -Polymer (X) Acrylate ester copolymer, 100 parts by mass (solid content) The acrylic ester copolymer was prepared by copolymerizing 92.8% by mass of 2-ethylhexyl acrylate, 7.0% by mass of 2-hydroxyethyl acrylate, and 0.2% by mass of acrylic acid.
  • Antistatic agent Ketjen Black (Lion Specialty Chemicals, ED-600JD), 1.5 parts by mass
  • Adhesive aid Hydroxylated polybutadiene at both ends (Nippon Soda Co., Ltd .; GI-1000) 12.5 parts by mass (solid content)
  • Crosslinking agent aliphatic isocyanate having hexamethylene diisocyanate (isocyanurate-type modified product of hexamethylene diisocyanate) [manufactured by Nippon Polyurethane Industry Co., Ltd .; Coronate HX], 8.75 parts by mass (solid content)
  • Diluting solvent Methyl ethyl ketone
  • Preparation of pressure-sensitive adhesive layer A transparent polyethylene terephthalate film (manufactured by Lintec Corporation; SP-PET 382150, thickness 38 ⁇ m) provided with a silicone-based release layer was prepared as a release film.
  • the prepared pressure-sensitive adhesive composition A1 is applied to the release layer side of the release film using a comma coater (registered trademark), heated at 90 ° C. for 90 seconds, and then heated at 115 ° C. for 90 seconds.
  • the coating film was dried to produce an adhesive layer having a thickness of 50 ⁇ m.
  • pressure-sensitive adhesive composition A2 was prepared by adding 2.0 parts by mass of carbon nanotubes (manufactured by Kumho Petrochemical; K-Nanos 100P) instead of ketjen black.
  • a pressure-sensitive adhesive sheet of Example 2 was obtained in the same manner as Example 1 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition A2.
  • Example 3 In the preparation of the pressure-sensitive adhesive composition A1, 1.0 part by mass of the ionic liquid (1) (1-ethyl-3-methylpyridinium bis (trifluoromethanesulfonyl) imide) was added instead of the ketjen black and the pressure-sensitive adhesive Composition A3 was prepared. A pressure-sensitive adhesive sheet of Example 3 was obtained in the same manner as Example 1 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition A3.
  • the ionic liquid (1) (1-ethyl-3-methylpyridinium bis (trifluoromethanesulfonyl) imide
  • Example 4 instead of the pressure-sensitive adhesive composition A1, the following pressure-sensitive adhesive composition A4 was used, and in the same manner as in Example 1, a laminate comprising a substrate, an oligomer sealing layer, a conductive layer, a pressure-sensitive adhesive layer, and a release film was prepared. Obtained. Next, ultraviolet rays were irradiated from the side of the release film of the pressure-sensitive adhesive sheet under the conditions of an illuminance of 200 mW / cm 2 and an integrated irradiation amount of 200 mJ / cm 2 using a high-pressure mercury lamp manufactured by Eye Graphics as an ultraviolet irradiation device. Thereafter, the release film was peeled off from the laminate, and the pressure-sensitive adhesive sheet of Example 4 was obtained.
  • pressure-sensitive adhesive composition A4 As a pressure-sensitive adhesive liquid for application. Specifically, 12.5 parts by mass of an adhesion assistant is added to a polymer obtained by mixing 90 parts by mass (solid content) of polymer (X) and 10.0 parts by mass (solid content) of an ionic polymer as an antistatic agent. Solid content), 8.75 parts by mass of the cross-linking agent (solid content), and 1.0 parts by mass (solid content) of a photopolymerization initiator (IGM Resins; Omnirad-127) were added, and methyl ethyl ketone was used. A pressure-sensitive adhesive composition A4 having a solid content concentration of 30% by mass was prepared.
  • an adhesion assistant is added to a polymer obtained by mixing 90 parts by mass (solid content) of polymer (X) and 10.0 parts by mass (solid content) of an ionic polymer as an antistatic agent. Solid content), 8.75 parts by mass of the cross-linking agent (solid content), and 1.0 parts by mass (solid content) of a photo
  • [2- (Methacryloyloxy) ethyl] trimethylammonium bis (trifluoromethylsulfonyl) imide as “polymerizable monomer having a quaternary ammonium cation”, methacrylic acid as a polymerizable monomer having a reactive functional group, and polymerizability
  • a polymerizable monomer having a quaternary ammonium cation as a monomer having 2-ethylhexyl acrylate and 2-hydroxyethyl acrylate: methacrylic acid: 2-ethylhexyl acrylate: 2-hydroxyethyl acrylate 44.27: Copolymerization was performed so that 4.68: 40.24: 4.63.
  • the resulting polymer is reacted with glycidyl methacrylate as an energy ray-curable compound (6.18 in terms of the above mass ratio) to have an ionic polymer (a methacryloyl group and a quaternary ammonium cation in the side chain). )
  • glycidyl methacrylate as an energy ray-curable compound (6.18 in terms of the above mass ratio)
  • an ionic polymer a methacryloyl group and a quaternary ammonium cation in the side chain.
  • Example 5 In the preparation of the pressure-sensitive adhesive composition A1, a mixture of 5 parts by mass of furnace black (manufactured by Mitsubishi Chemical; product name # 3030B) and 0.5 parts by mass of the ionic liquid (1) was added instead of ketjen black. An adhesive composition A5 was prepared. A pressure-sensitive adhesive sheet of Example 5 was obtained in the same manner as Example 1 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition A5.
  • Example 6 In the preparation of the pressure-sensitive adhesive composition A1, 2.5 parts by mass of ketjen black was added to prepare a pressure-sensitive adhesive composition A6.
  • a pressure-sensitive adhesive sheet of Example 6 was obtained in the same manner as Example 1 except that the pressure-sensitive adhesive composition A6 was used to prepare a pressure-sensitive adhesive layer and the conductive layer was not prepared.
  • Example 7 A pressure-sensitive adhesive sheet of Example 7 was obtained in the same manner as Example 3 except that the following pressure-sensitive adhesive composition B1 was used instead of the pressure-sensitive adhesive composition A1.
  • pressure-sensitive adhesive composition B1 As a pressure-sensitive adhesive liquid for application. Specifically, with respect to 100 parts by mass (solid content) of the polymer (X), 1.0 part by mass of an ionic liquid (1) as an antistatic agent, 7.4 parts by mass (solid content) of a crosslinking agent, reactivity 23.3 parts by mass (solid content) of a low molecular compound having a functional group and 4.1 parts by mass (solid content) of a photopolymerization initiator are added, and an adhesive composition having a solid content concentration of 30% by mass using ethyl acetate. Product B1 was prepared.
  • Example 8 Low molecular weight compound having a reactive functional group, 10.0 parts by mass of an ionic polymer as an antistatic agent, 7.4 parts by mass (solid content), and a reactive functional group with respect to 90 parts by mass (solid content) of the polymer (X). 3 parts by mass (solid content) and 4.1 parts by mass (solid content) of a photopolymerization initiator were added, and an adhesive composition B2 having a solid content concentration of 30% by mass was prepared using ethyl acetate.
  • an ionic polymer is the same as the ionic polymer used by preparation of adhesive composition A4.
  • the crosslinking agent, the low molecular compound having a reactive functional group, and the photopolymerization initiator are the same as the materials used in the preparation of the pressure-sensitive adhesive composition B1.
  • a pressure-sensitive adhesive sheet of Example 8 was obtained in the same manner as Example 7 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition B2.
  • Comparative Example 1 In the preparation of the pressure-sensitive adhesive composition A1, 2.0 parts by mass of ketjen black was added to prepare a pressure-sensitive adhesive composition A7. A pressure-sensitive adhesive sheet of Comparative Example 1 was obtained in the same manner as in Example 1 except that this pressure-sensitive adhesive composition A7 was used to prepare a pressure-sensitive adhesive layer and that a conductive layer was not prepared.
  • Comparative Example 2 In the preparation of the pressure-sensitive adhesive composition A1, instead of ketjen black, 1.0 part by mass of the ionic liquid (1) was added to prepare a pressure-sensitive adhesive composition A8.
  • a pressure-sensitive adhesive sheet of Comparative Example 2 was obtained in the same manner as in Example 1 except that a pressure-sensitive adhesive layer was prepared using this pressure-sensitive adhesive composition A8 and a conductive layer was not prepared.
  • Table 1 shows the configuration of the pressure-sensitive adhesive sheet obtained in each example.
  • the pressure-sensitive adhesive layer was measured after the pressure-sensitive adhesive sheet was heated at 190 ° C. for 60 minutes in a nitrogen atmosphere and then allowed to stand at 23 ° C. and 50% RH for 24 hours.
  • the pressure-sensitive adhesive sheet is heated at 100 ° C. for 30 minutes, subsequently heated at 180 ° C. for 30 minutes, further heated at 190 ° C. and 60 minutes, and then at 23 ° C. and The adhesive strength of the adhesive layer to the copper foil and the adhesive strength to the polyimide film after being allowed to stand for 24 hours in an atmosphere of 50% RH were measured.
  • the pressure-sensitive adhesive sheet adheresive sheet with copper foil
  • the pressure-sensitive adhesive sheet after being allowed to cool is peeled off using an autograph (manufactured by Shimadzu Corporation, Autograph AG-IS 500N) at a peeling direction of 90 degrees and a peeling speed of 3 mm / min.
  • the subsequent copper foil and the pressure-sensitive adhesive sheet were observed with a digital microscope (manufactured by Keyence Corporation: Digital Microscope, VHX-1000) to confirm the presence or absence of adhesive residue.
  • the observation magnification was 500 times. The case where no adhesive remained was determined as “A”, and the case where adhesive remained partially was determined as “B”.
  • Polymer type means an ionic polymer. “Yes” means that there is a conductive layer, and “No” means that there is no conductive layer. “CNT” means carbon nanotubes. “Ionic liquid 1” means ionic liquid (1). “Ionic liquid 2” means the ionic liquid (2).
  • the surface resistivity of the pressure-sensitive adhesive layer was less than 10 11 ⁇ / ⁇ even after heating at 190 ° C. for 60 minutes in a nitrogen atmosphere.
  • the pressure-sensitive adhesive sheets of Comparative Examples 1 to 4 had a surface resistivity of 10 11 ⁇ / ⁇ or more after high-temperature heating.
  • the adhesive sheets of Examples 1 and 3 having a conductive layer are those of Comparative Examples 1 and 2 having no conductive layer. It can be seen that the rate of increase in surface resistivity after high-temperature heating (after heating / before heating) is significantly suppressed as compared to the pressure-sensitive adhesive sheet.
  • the charged voltage of the pressure-sensitive adhesive layer was less than 0.1 kV even after high temperature heating.
  • the pressure-sensitive adhesive sheets of Examples 1 to 8 were heated under the conditions of 100 ° C. and 30 minutes, subsequently heated under the conditions of 180 ° C. and 30 minutes, and further heated under the conditions of 190 ° C.
  • the pressure-sensitive adhesive sheet of this example the electrostatic breakdown of the semiconductor element can be suppressed even if the pressure-sensitive adhesive sheet is peeled off from the adherend after being subjected to a process of heating at a high temperature.
  • Adhesive sheet 11, 11A, 11B, 11C, 11D ...
  • Base material 11a, 11c, 11e, 11g, 11i ... First base material surface, 11b, 11d, 11f, 11h, 11j ... second substrate surface, 12, 12A, 12B, 12C, 12D ... adhesive layer, 12a, 12c, 12e, 12g, 12i ... first adhesive surface, 12b, 12d, 12f, 12h, 12j ... second adhesive Surface, 13, 13A, 13B ... conductive layer, 14, 14A ... oligomer sealing layer, 14B ... primer layer.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

This adhesive sheet (10) is used when sealing a semiconductor element on an adhesive sheet and is provided with a substrate (11) and an adhesive agent layer (12) that contains an antistatic agent. The surface resistivity of the adhesive agent layer (12) is less than 1011 Ω/□ after the adhesive sheet (10) is heated at 190°C for 60 minutes under a nitrogen atmosphere and then set aside for 24 hours at 23°C and 50% RH.

Description

粘着シートAdhesive sheet
 本発明は、粘着シートに関する。 The present invention relates to an adhesive sheet.
 半導体装置の製造工程では、半導体ウエハの固定、及び半導体素子(例えば半導体チップ等)の保護等を目的として粘着シートが用いられている。
 粘着シートは、所定の処理工程が終了すると剥離されるが、このときに、粘着シートと半導体ウエハとの間、または粘着シートと半導体素子との間で、剥離帯電と呼ばれる静電気が発生することがある。このような静電気は、半導体ウエハ、半導体素子、及びこれらに形成された回路等を破壊する原因となるため、この破壊(以下、「静電気破壊」とも称する。)を防止するための方法が検討されている。
In the manufacturing process of a semiconductor device, an adhesive sheet is used for the purpose of fixing a semiconductor wafer and protecting a semiconductor element (for example, a semiconductor chip).
The pressure-sensitive adhesive sheet is peeled off when a predetermined processing step is completed. At this time, static electricity called peeling charging may occur between the pressure-sensitive adhesive sheet and the semiconductor wafer or between the pressure-sensitive adhesive sheet and the semiconductor element. is there. Since such static electricity causes damage to the semiconductor wafer, the semiconductor element, and the circuits formed thereon, a method for preventing this damage (hereinafter also referred to as “electrostatic breakdown”) has been studied. ing.
 例えば特許文献1には、粘着剤層が、(a)特定の(メタ)アクリル酸アルキルエステルを主成分とし、これと共重合可能なモノエチレン性不飽和酸を含有してなる単量体混合物、(b)交叉結合剤としての多官能(メタ)アクリレート、(c)光重合開始剤、および(d)エポキシ樹脂をそれぞれ特定量で含む光重合性組成物の光重合物であることを特徴とする電子部品補強用粘着シートが開示されている。特許文献1には、この電子部品補強用粘着シートの粘着剤層が帯電防止剤を含有してもよいことが開示されている。
 また、特許文献2には、(a)イオン性液体、(b)炭素数4~12のアルキル基を有する(メタ)アクリレートの1種以上を主成分とする(メタ)アクリル系ポリマー、および(c)分子中に2個以上のヒドロキシル基を含有する特定の化合物を含み、前記(メタ)アクリル系ポリマーの重量平均分子量が、30万以上130万以下であることを特徴とする粘着剤組成物が開示されている。
 また、この粘着剤組成物を架橋してなる粘着層を、支持体の片面または両面に形成してなる粘着シート類が開示されている。
For example, Patent Document 1 discloses a monomer mixture in which the pressure-sensitive adhesive layer contains (a) a specific (meth) acrylic acid alkyl ester as a main component and a monoethylenically unsaturated acid copolymerizable therewith. , (B) a polyfunctional (meth) acrylate as a cross-linking agent, (c) a photopolymerization initiator, and (d) a photopolymerization product of a photopolymerizable composition each containing a specific amount of an epoxy resin. An electronic component reinforcing adhesive sheet is disclosed. Patent Document 1 discloses that the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet for reinforcing electronic parts may contain an antistatic agent.
Patent Document 2 discloses (a) an ionic liquid, (b) a (meth) acrylic polymer containing as a main component at least one (meth) acrylate having an alkyl group having 4 to 12 carbon atoms, and ( c) A pressure-sensitive adhesive composition comprising a specific compound containing two or more hydroxyl groups in the molecule, wherein the (meth) acrylic polymer has a weight average molecular weight of 300,000 to 1.3 million. Is disclosed.
Moreover, the adhesive sheet formed by forming the adhesive layer formed by bridge | crosslinking this adhesive composition on the single side | surface or both surfaces of a support body is disclosed.
特開2003-105278号公報JP 2003-105278 A 特開2011-127130号公報JP 2011-127130 A
 しかしながら、半導体装置の製造工程において、半導体素子を封止材で封止する工程を実施する場合には、粘着シートが高温(例えば150℃以上190℃以下)で加熱されることがある。このような加熱工程を経た後に、粘着シートを被着体から剥離すると、剥離帯電により発生した静電気によって、電子部品(例えば電子回路等)がより破壊されやすくなり、その結果、半導体素子が破壊されることがある。
 上述の特許文献1及び2には、粘着シートの粘着剤層に帯電防止剤を含ませてもよいことが開示されているものの、静電気破壊をより抑制するためには、用途及び工程に応じた材料の選定が必要である。特に、封止工程を実施する半導体装置の製造工程においては、粘着シートが高温で加熱された後の特性も考慮した材料の選定が必要である。
However, in the manufacturing process of the semiconductor device, when the step of sealing the semiconductor element with the sealing material is performed, the pressure-sensitive adhesive sheet may be heated at a high temperature (for example, 150 ° C. or more and 190 ° C. or less). When the pressure-sensitive adhesive sheet is peeled off from the adherend after such a heating step, electronic components (for example, electronic circuits) are more easily destroyed by static electricity generated by peeling charging, and as a result, the semiconductor element is destroyed. Sometimes.
In Patent Documents 1 and 2 described above, it is disclosed that an antistatic agent may be included in the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet. Material selection is required. In particular, in the manufacturing process of the semiconductor device that performs the sealing process, it is necessary to select a material that also takes into account the characteristics after the pressure-sensitive adhesive sheet is heated at a high temperature.
 本発明の目的は、高温(例えば150℃以上190℃以下)で加熱される工程を経た後に、所定の値未満の表面抵抗率を有する粘着剤層を有する粘着シートを用いることで、粘着シートを被着体から剥離しても、半導体素子の静電気破壊を抑制できる粘着シートを提供することである。 The object of the present invention is to use a pressure-sensitive adhesive sheet having a pressure-sensitive adhesive layer having a surface resistivity of less than a predetermined value after passing through a process of heating at a high temperature (for example, 150 ° C. or higher and 190 ° C. or lower). It is to provide an adhesive sheet that can suppress electrostatic breakdown of a semiconductor element even if it is peeled off from an adherend.
 本発明の一態様に係る粘着シートは、粘着シート上の半導体素子を封止する際に使用される粘着シートであって、基材と、帯電防止剤を含む粘着剤層と、を備え、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における前記粘着シートの前記粘着剤層の表面抵抗率が1011Ω/□未満である。 The pressure-sensitive adhesive sheet according to one embodiment of the present invention is a pressure-sensitive adhesive sheet used when sealing a semiconductor element on a pressure-sensitive adhesive sheet, and includes a base material and a pressure-sensitive adhesive layer containing an antistatic agent, and nitrogen. The surface resistivity of the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet after heating in an atmosphere at 190 ° C. for 60 minutes and then standing at 23 ° C. and 50% RH for 24 hours is less than 10 11 Ω / □.
 本発明の一態様に係る粘着シートにおいて、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における前記粘着シートの前記粘着剤層の帯電圧が0.1kV未満であることが好ましい。 In the pressure-sensitive adhesive sheet according to one embodiment of the present invention, the band of the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet after being heated in a nitrogen atmosphere at 190 ° C. for 60 minutes and then allowed to stand in an atmosphere at 23 ° C. and 50% RH for 24 hours. The voltage is preferably less than 0.1 kV.
 本発明の一態様に係る粘着シートにおいて、前記帯電防止剤は、炭素材料及びイオン性材料からなる群から選択される少なくとも1種を含むことが好ましい。 In the pressure-sensitive adhesive sheet according to one aspect of the present invention, the antistatic agent preferably contains at least one selected from the group consisting of a carbon material and an ionic material.
 本発明の一態様に係る粘着シートにおいて、前記炭素材料は、カーボンナノチューブ、グラフェン、及びカーボンブラックからなる群から選択される少なくとも1種であることが好ましい。 In the pressure-sensitive adhesive sheet according to one aspect of the present invention, the carbon material is preferably at least one selected from the group consisting of carbon nanotubes, graphene, and carbon black.
 本発明の一態様に係る粘着シートにおいて、前記イオン性材料は、イオン性液体及びイオンポリマーからなる群から選択される少なくとも1種であることが好ましい。 In the pressure-sensitive adhesive sheet according to one aspect of the present invention, the ionic material is preferably at least one selected from the group consisting of an ionic liquid and an ionic polymer.
 本発明の一態様に係る粘着シートにおいて、前記帯電防止剤は、前記イオン性液体であるか、または前記イオン性液体と前記炭素材料との混合物であることが好ましい。 In the pressure-sensitive adhesive sheet according to one aspect of the present invention, it is preferable that the antistatic agent is the ionic liquid or a mixture of the ionic liquid and the carbon material.
 本発明の一態様に係る粘着シートにおいて、前記イオン性液体は、カチオンと、下記一般式(1)で表されるアニオンとを含むことが好ましい。
Figure JPOXMLDOC01-appb-C000002
In the pressure-sensitive adhesive sheet according to one aspect of the present invention, the ionic liquid preferably contains a cation and an anion represented by the following general formula (1).
Figure JPOXMLDOC01-appb-C000002
 一般式(1)において、R及びRは、それぞれ独立に、フッ素原子、または炭素数1以上8以下のパーフルオロアルキル基であり、R及びRは、同一または異なる。 In the general formula (1), R 1 and R 2 are each independently a fluorine atom or a perfluoroalkyl group having 1 to 8 carbon atoms, and R 1 and R 2 are the same or different.
 本発明の一態様に係る粘着シートにおいて、前記イオン性液体の含有量は、前記粘着剤層全体に対して、0.01質量%以上10質量%以下であることが好ましい。 In the pressure-sensitive adhesive sheet according to one aspect of the present invention, the content of the ionic liquid is preferably 0.01% by mass or more and 10% by mass or less with respect to the entire pressure-sensitive adhesive layer.
 本発明の一態様に係る粘着シートにおいて、前記粘着剤層は、アクリル系粘着剤組成物を含有し、前記アクリル系粘着剤組成物は、アルキル基の炭素数が4以上12以下の(メタ)アクリル酸アルキルエステルを主たるモノマーとするアクリル系共重合体を含むことが好ましい。 In the pressure-sensitive adhesive sheet according to one embodiment of the present invention, the pressure-sensitive adhesive layer contains an acrylic pressure-sensitive adhesive composition, and the acrylic pressure-sensitive adhesive composition has an alkyl group having 4 to 12 carbon atoms (meth). It is preferable to include an acrylic copolymer having an alkyl acrylate as a main monomer.
 本発明の一態様に係る粘着シートにおいて、前記粘着シートを、100℃及び30分間の条件で加熱し、続いて180℃及び30分間の条件で加熱し、さらに190℃及び60分間の条件で加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における前記粘着剤層の銅箔に対する粘着力が、0.5N/25mm以上3.0N/25mm以下であり、かつ前記粘着剤層のポリイミドフィルムに対する粘着力が、0.50N/25mm以上2.00N/25mm以下であることが好ましい。 In the pressure-sensitive adhesive sheet according to one aspect of the present invention, the pressure-sensitive adhesive sheet is heated under conditions of 100 ° C. and 30 minutes, subsequently heated under conditions of 180 ° C. and 30 minutes, and further heated under conditions of 190 ° C. and 60 minutes. Then, the pressure-sensitive adhesive strength of the pressure-sensitive adhesive layer after being allowed to stand for 24 hours at 23 ° C. and 50% RH is 0.5 N / 25 mm or more and 3.0 N / 25 mm or less, and the pressure-sensitive adhesive The adhesive strength of the layer to the polyimide film is preferably 0.50 N / 25 mm or more and 2.00 N / 25 mm or less.
 本発明の一態様に係る粘着シートにおいて、前記基材の前記粘着剤層の側における表面が導電性を有することが好ましい。 In the pressure-sensitive adhesive sheet according to one embodiment of the present invention, it is preferable that the surface of the substrate on the side of the pressure-sensitive adhesive layer has conductivity.
 本発明の一態様に係る粘着シートにおいて、前記粘着シートを、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後、前記基材の前記粘着剤層の側における表面抵抗率が、10-7Ω/□以上10Ω/□以下であることが好ましい。 In the pressure-sensitive adhesive sheet according to one aspect of the present invention, the pressure-sensitive adhesive sheet is heated at 190 ° C. for 60 minutes in a nitrogen atmosphere, and then left to stand at 23 ° C. and 50% RH for 24 hours. The surface resistivity on the pressure-sensitive adhesive layer side is preferably 10 −7 Ω / □ or more and 10 7 Ω / □ or less.
 本発明の一態様に係る粘着シートにおいて、前記基材と、前記粘着剤層との間に導電層を有することが好ましい。 In the pressure-sensitive adhesive sheet according to one embodiment of the present invention, it is preferable to have a conductive layer between the base material and the pressure-sensitive adhesive layer.
 本発明の一態様に係る粘着シートにおいて、前記粘着シートを、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後、前記導電層の前記粘着剤層の側における表面抵抗率が10-7Ω/□以上10Ω/□以下であることが好ましい。 In the pressure-sensitive adhesive sheet according to one aspect of the present invention, the pressure-sensitive adhesive sheet is heated at 190 ° C. for 60 minutes in a nitrogen atmosphere, and then left to stand at 23 ° C. and 50% RH for 24 hours. The surface resistivity on the pressure-sensitive adhesive layer side is preferably 10 −7 Ω / □ or more and 10 7 Ω / □ or less.
 本発明によれば、高温(例えば150℃以上190℃以下)で加熱される工程を経た後に、所定の値未満の表面抵抗率を有する粘着剤層を有する粘着シートを用いることで、粘着シートを被着体から剥離しても、半導体素子の静電気破壊を抑制できる粘着シートを提供することができる。 According to the present invention, the pressure-sensitive adhesive sheet is obtained by using a pressure-sensitive adhesive sheet having a pressure-sensitive adhesive layer having a surface resistivity of less than a predetermined value after undergoing a process of heating at a high temperature (for example, 150 ° C. or higher and 190 ° C. or lower). Even if it peels from a to-be-adhered body, the adhesive sheet which can suppress the electrostatic breakdown of a semiconductor element can be provided.
第一実施形態に係る粘着シートの断面図である。It is sectional drawing of the adhesive sheet which concerns on 1st embodiment. 第二実施形態に係る粘着シートの断面図である。It is sectional drawing of the adhesive sheet which concerns on 2nd embodiment. 第三実施形態に係る粘着シートの断面図である。It is sectional drawing of the adhesive sheet which concerns on 3rd embodiment. 第四実施形態に係る粘着シートの断面図である。It is sectional drawing of the adhesive sheet which concerns on 4th embodiment. 第五実施形態に係る粘着シートの断面図である。It is sectional drawing of the adhesive sheet which concerns on 5th embodiment.
 以下、本発明の一態様に係る粘着シートについて図面を参照して説明する。 Hereinafter, an adhesive sheet according to an embodiment of the present invention will be described with reference to the drawings.
〔第一実施形態〕
 図1には、第一実施形態に係る粘着シート10の断面図が示されている。
 第一実施形態に係る粘着シート10は、基材11と、粘着剤層12とが接している。
 粘着シート10は、粘着シート10上の半導体素子を封止する際に使用される。
 粘着シート10には、半導体素子だけでなく、その他の部材も貼着させることができる。本明細書において、半導体素子及びその他の部材を含めて被着体と称する場合がある。その他の部材としては、例えば、枠部材が挙げられる。枠部材は、例えば、粘着シート10上の半導体素子を封止樹脂で封止する場合に、封止樹脂の硬化収縮にともなう粘着シート10の反りを防止するために用いることができる。
[First embodiment]
FIG. 1 shows a cross-sectional view of an adhesive sheet 10 according to the first embodiment.
In the pressure-sensitive adhesive sheet 10 according to the first embodiment, the base material 11 and the pressure-sensitive adhesive layer 12 are in contact with each other.
The pressure-sensitive adhesive sheet 10 is used when sealing a semiconductor element on the pressure-sensitive adhesive sheet 10.
Not only the semiconductor element but also other members can be attached to the adhesive sheet 10. In this specification, a semiconductor element and other members may be referred to as an adherend. Examples of other members include a frame member. For example, when the semiconductor element on the pressure-sensitive adhesive sheet 10 is sealed with a sealing resin, the frame member can be used to prevent warping of the pressure-sensitive adhesive sheet 10 due to curing shrinkage of the sealing resin.
 粘着シート10は、基材11と、帯電防止剤を含む粘着剤層12と、を備える。基材11は、第一基材面11a、及び第一基材面11aとは反対側の第二基材面11bを有する。粘着剤層12は、第一粘着面12a、及び第一粘着面12aとは反対側の第二粘着面12bを有する。粘着シート10においては、第一基材面11aに粘着剤層12が積層されている。この粘着剤層12には、半導体素子等の被着体が貼着される。粘着剤層12は、半導体装置の製造工程において被着体を粘着シート10上に保持する。
 粘着シート10の形状は、例えば、シート状、テープ状、ラベル状等あらゆる形状をとり得る。
The pressure-sensitive adhesive sheet 10 includes a base material 11 and a pressure-sensitive adhesive layer 12 containing an antistatic agent. The base material 11 has a first base material surface 11a and a second base material surface 11b opposite to the first base material surface 11a. The pressure-sensitive adhesive layer 12 has a first pressure-sensitive adhesive surface 12a and a second pressure-sensitive adhesive surface 12b opposite to the first pressure-sensitive adhesive surface 12a. In the adhesive sheet 10, the adhesive layer 12 is laminated | stacked on the 1st base material surface 11a. An adherend such as a semiconductor element is attached to the adhesive layer 12. The pressure-sensitive adhesive layer 12 holds the adherend on the pressure-sensitive adhesive sheet 10 in the manufacturing process of the semiconductor device.
The shape of the pressure-sensitive adhesive sheet 10 can take any shape such as a sheet shape, a tape shape, and a label shape.
 本実施形態の粘着シート10は、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における粘着剤層12の表面抵抗率が1011Ω/□未満である。
 以下、例えば、150℃以上190℃以下を「高温」と称することがあり、150℃以上190℃以下で加熱することを「高温加熱」と称することがある。
 本発明者らは、高温加熱後における粘着剤層の表面抵抗率が1011Ω/□未満である粘着シートを用いることで、半導体素子の静電気破壊を抑制できることを見出し、本発明を完成するに至った。
 本実施形態の粘着シート10によれば、高温で加熱される工程を経た後に、粘着シート10を被着体から剥離しても、半導体素子の静電気破壊を抑制することができる(以下、「本実施形態の効果」とも称する。)。
The pressure-sensitive adhesive sheet 10 of this embodiment has a surface resistivity of 10 11 Ω after being heated at 190 ° C. and 60 minutes in a nitrogen atmosphere and then allowed to stand at 23 ° C. and 50% RH for 24 hours. Less than / □.
Hereinafter, for example, 150 ° C. to 190 ° C. may be referred to as “high temperature”, and heating at 150 ° C. to 190 ° C. may be referred to as “high temperature heating”.
The present inventors have found that electrostatic breakdown of a semiconductor element can be suppressed by using a pressure-sensitive adhesive sheet having a surface resistivity of less than 10 11 Ω / □ after high-temperature heating, and to complete the present invention. It came.
According to the pressure-sensitive adhesive sheet 10 of the present embodiment, the electrostatic breakdown of the semiconductor element can be suppressed even after the pressure-sensitive adhesive sheet 10 is peeled off from the adherend after the process of being heated at a high temperature (hereinafter referred to as “book”). Also referred to as “effect of embodiment”).
〔達成手段〕
 本実施形態の粘着シート10(すなわち、高温加熱後の粘着剤層12の表面抵抗率が1011Ω/□未満である粘着シート10)を得るための達成手段としては特に限定されないが、例えば以下の方法が挙げられる。これらの方法は組み合わせてもよい。
・方法1:粘着剤層12に特定の帯電防止剤を含ませる方法
・方法2:粘着剤層12に特定の帯電防止剤を含ませ、その帯電防止剤の含有量を調整する方法
・方法3:基材11の粘着剤層12の側における表面に導電性を付与する方法
・方法4:基材11と粘着剤層12との間に導電層を設ける方法
〔Achievement means〕
The achievement means for obtaining the pressure-sensitive adhesive sheet 10 of the present embodiment (that is, the pressure-sensitive adhesive sheet 10 having a surface resistivity of less than 10 11 Ω / □ after high-temperature heating) is not particularly limited. The method is mentioned. These methods may be combined.
Method 1: Method of including a specific antistatic agent in the pressure-sensitive adhesive layer 12 Method 2: Method of including a specific antistatic agent in the pressure-sensitive adhesive layer 12 and adjusting the content of the antistatic agent Method 3 : Method / method 4: imparting conductivity to the surface of the base material 11 on the pressure-sensitive adhesive layer 12 side: Method of providing a conductive layer between the base material 11 and the pressure-sensitive adhesive layer 12
 以上の手段を用いることで、高温加熱後であっても粘着剤層12の表面抵抗率が1011Ω/□未満となる。よって、粘着シート10を剥離する際に発生した静電気が、粘着剤層12に形成された導電経路を通して、除去されやすくなる。また、前記静電気は、粘着シート10が基材11と粘着剤層12との間に他の層(例えば、導電層及び中間層の少なくとも一方)を有する場合においても、粘着剤層12及び他の層に形成された導電経路を通して、除去されやすくなる。 By using the above means, the surface resistivity of the pressure-sensitive adhesive layer 12 becomes less than 10 11 Ω / □ even after high-temperature heating. Therefore, static electricity generated when the pressure-sensitive adhesive sheet 10 is peeled is easily removed through the conductive path formed in the pressure-sensitive adhesive layer 12. In addition, the static electricity is applied even when the pressure-sensitive adhesive sheet 10 has another layer (for example, at least one of a conductive layer and an intermediate layer) between the base material 11 and the pressure-sensitive adhesive layer 12. It tends to be removed through the conductive path formed in the layer.
〔高温加熱後の粘着剤層の表面抵抗率〕
 粘着シート10の粘着剤層12の表面抵抗率とは、粘着剤層12の表面側から(図1の場合、第一粘着面12a側から)測定した値をいう。
 窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における粘着シート10の粘着剤層12の表面抵抗率は、好ましくは1×1011Ω/□未満、より好ましくは7×1010Ω/□未満、さらに好ましくは5×1010Ω/□未満である。
 粘着剤層12の表面抵抗率の下限値は特に限定されないが、好ましくは1×10Ω/□以上である。
[Surface resistivity of pressure-sensitive adhesive layer after high-temperature heating]
The surface resistivity of the pressure-sensitive adhesive layer 12 of the pressure-sensitive adhesive sheet 10 refers to a value measured from the surface side of the pressure-sensitive adhesive layer 12 (in the case of FIG. 1, from the first pressure-sensitive adhesive surface 12a side).
The surface resistivity of the pressure-sensitive adhesive layer 12 of the pressure-sensitive adhesive sheet 10 after heating in a nitrogen atmosphere at 190 ° C. for 60 minutes and then standing in a 23 ° C. and 50% RH atmosphere for 24 hours is preferably 1 × 10 11 Ω. / □, more preferably less than 7 × 10 10 Ω / □, and even more preferably less than 5 × 10 10 Ω / □.
The lower limit of the surface resistivity of the pressure-sensitive adhesive layer 12 is not particularly limited, but is preferably 1 × 10 4 Ω / □ or more.
 粘着剤層12の表面抵抗率は、以下のように測定される。
 粘着シートに剥離フィルムが設けられている場合、この剥離フィルム付き粘着シートの一部をカッター等で90mm×90mmの大きさに切り出す。次いで、切り出された剥離フィルム付き粘着シートから剥離フィルムを剥離し、粘着シートの粘着剤層をシリコンミラーウエハ(直径6インチ、厚さ0.68mm、鏡面2000番仕上げ)の鏡面に貼付する。これを試験片とする。
 なお、粘着シートに剥離フィルムが設けられていない場合、剥離フィルムが設けられていない粘着シートを用いて上記と同様の方法で試験片を得る。
 次に、試験片を雰囲気式電気炉(SKM-Series SKM-3035F、モトヤマ社製)に導入し、炉内を5分間真空引きした後、窒素ガスを常圧(1気圧)まで充填し、さらに炉内を5分間真空引きする。
 その後、窒素ガスを流し、炉内を窒素雰囲気にした後、窒素パージ(1.5L/min)しながら、昇温速度2℃/分で190℃まで昇温し、190℃のまま60分間保持する。その後、試験片を炉内から取り出し、常温(25℃)になるまで放冷し、23℃及び50%RHの雰囲気下で24時間放置する。24時間放置後の試験片(シリコンミラーウエハ付き粘着シート)から粘着シートを剥離し、これを表面抵抗率測定用試験片とする。
 この表面抵抗率測定用試験片を用いて、JIS K6911(2006)に準拠して、以下の測定条件で粘着剤層12の表面抵抗率を測定する。
The surface resistivity of the pressure-sensitive adhesive layer 12 is measured as follows.
When a release film is provided on the pressure-sensitive adhesive sheet, a part of this pressure-sensitive adhesive sheet with a release film is cut into a size of 90 mm × 90 mm with a cutter or the like. Next, the release film is peeled off from the cut-out pressure-sensitive adhesive sheet with a release film, and the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet is affixed to the mirror surface of a silicon mirror wafer (diameter 6 inches, thickness 0.68 mm, mirror surface finished 2000). This is a test piece.
In addition, when the peeling film is not provided in the adhesive sheet, a test piece is obtained by the method similar to the above using the adhesive sheet in which the peeling film is not provided.
Next, the test piece was introduced into an atmospheric electric furnace (SKM-Series SKM-3035F, manufactured by Motoyama), the inside of the furnace was evacuated for 5 minutes, and then filled with nitrogen gas to normal pressure (1 atm). Vacuum the furnace for 5 minutes.
Then, after flowing nitrogen gas and making the inside of the furnace a nitrogen atmosphere, the temperature was raised to 190 ° C. at a rate of temperature rise of 2 ° C./min while maintaining a nitrogen purge (1.5 L / min) and held at 190 ° C. for 60 minutes. To do. Thereafter, the test piece is taken out from the furnace, allowed to cool to room temperature (25 ° C.), and left in an atmosphere of 23 ° C. and 50% RH for 24 hours. The adhesive sheet is peeled off from the test piece (adhesive sheet with a silicon mirror wafer) after being left for 24 hours, and this is used as a test piece for measuring surface resistivity.
Using this test piece for measuring surface resistivity, the surface resistivity of the pressure-sensitive adhesive layer 12 is measured under the following measurement conditions in accordance with JIS K6911 (2006).
 -測定条件-
・装置:DIGITAL ELECTROMETER(ADVANTEST社製)
・測定環境  :23℃及び50%RH
・測定電圧  :100V
・電圧印加時間:1min
-Measurement condition-
・ Device: DIGITAL ELECTROMETER (ADVANTEST)
Measurement environment: 23 ° C and 50% RH
・ Measurement voltage: 100V
・ Voltage application time: 1 min
〔高温加熱後の粘着剤層の帯電圧〕
 粘着剤層12の帯電圧とは、粘着剤層12の表面側から(図1の場合、第一粘着面12a側から)測定した値をいう。
 本実施形態の効果をより発現する観点から、粘着シート10を窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における粘着シート10の粘着剤層12の帯電圧は、好ましくは0.1kV未満、より好ましくは0.07kV未満、さらに好ましくは0.05kV未満である。
 粘着剤層12の帯電圧の下限値は特に限定されないが、好ましくは0.001kV以上である。
 粘着剤層12の帯電圧が0.1kV未満である粘着シート10を得るための達成手段としては特に限定されないが、例えば、前述の方法1から方法4が挙げられる。
[Battery voltage of pressure-sensitive adhesive layer after high-temperature heating]
The charged voltage of the pressure-sensitive adhesive layer 12 refers to a value measured from the surface side of the pressure-sensitive adhesive layer 12 (in the case of FIG. 1, from the first pressure-sensitive adhesive surface 12a side).
From the viewpoint of more manifesting the effects of the present embodiment, the pressure-sensitive adhesive sheet 10 is heated at 190 ° C. for 60 minutes in a nitrogen atmosphere and then left to stand at 23 ° C. and 50% RH for 24 hours. The charged voltage of the agent layer 12 is preferably less than 0.1 kV, more preferably less than 0.07 kV, and even more preferably less than 0.05 kV.
The lower limit of the charged voltage of the pressure-sensitive adhesive layer 12 is not particularly limited, but is preferably 0.001 kV or more.
The achievement means for obtaining the pressure-sensitive adhesive sheet 10 having a voltage of the pressure-sensitive adhesive layer 12 of less than 0.1 kV is not particularly limited, and examples thereof include the above-described method 1 to method 4.
 粘着剤層12の帯電圧は、以下のように測定される。
 粘着剤層12の表面抵抗率の測定方法と同様にして、試験片及び帯電圧測定用試験片を得る。
 ただし、剥離フィルム付き粘着シートの一部または粘着シートの一部をカッター等で切り出す際の大きさは、40mm×40mmとする。
 帯電圧測定用試験片を用いて、JIS L1094(2014)に準拠して、以下の測定条件で粘着剤層12の帯電圧を測定する。
The charged voltage of the pressure-sensitive adhesive layer 12 is measured as follows.
In the same manner as the method for measuring the surface resistivity of the pressure-sensitive adhesive layer 12, a test piece and a test piece for measuring charged voltage are obtained.
However, the size when cutting out a part of the pressure-sensitive adhesive sheet with a release film or a part of the pressure-sensitive adhesive sheet with a cutter or the like is 40 mm × 40 mm.
Using the test piece for measuring the charged voltage, the charged voltage of the pressure-sensitive adhesive layer 12 is measured under the following measurement conditions in accordance with JIS L1094 (2014).
 -測定条件-
・装置:STATIC HONESTMETER H-0110(シシド静電気社製)
・測定環境  :23℃及び50%RH
・印加電圧  :10kV
・電圧印加時間:1min
-Measurement condition-
・ Apparatus: STATIC HONESTETER H-0110 (manufactured by Cicid Electrostatics)
Measurement environment: 23 ° C and 50% RH
・ Applied voltage: 10 kV
・ Voltage application time: 1 min
〔高温加熱後の粘着剤層の銅箔及びポリイミドフィルムに対する粘着力〕
<銅箔に対する粘着力>
 本実施形態の効果をより発現する観点から、粘着シート10を、100℃及び30分間の条件で加熱し、続いて180℃及び30分間の条件で加熱し、さらに190℃及び60分間の条件で加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における粘着剤層12の銅箔に対する粘着力は、好ましくは0.50N/25mm以上3.00N/25mm以下、より好ましくは1.00N/25mm以上2.50N/25mm以下、さらに好ましくは1.50N/25mm以上2.00N/25mm以下である。
 粘着剤層12の銅箔に対する粘着力が0.50N/25mm以上であると、加熱によって基材11または被着体が変形した場合に粘着シート10が被着体から剥離することを防止できる。
 粘着剤層12の銅箔に対する粘着力が3.00N/25mm以下であると、剥離力が高くなり過ぎず、粘着シート10を被着体から剥離しやすい。
 粘着剤層12の銅箔に対する粘着力が上記範囲である粘着シート10を得るための達成手段としては特に限定されないが、例えば、前述の方法1から方法4が挙げられる。
[Adhesive strength of the adhesive layer to copper foil and polyimide film after high-temperature heating]
<Adhesive strength to copper foil>
From the viewpoint of more manifesting the effect of the present embodiment, the pressure-sensitive adhesive sheet 10 is heated at 100 ° C. and 30 minutes, subsequently heated at 180 ° C. and 30 minutes, and further at 190 ° C. and 60 minutes. The adhesive strength of the adhesive layer 12 to the copper foil after being heated and then allowed to stand for 24 hours in an atmosphere of 23 ° C. and 50% RH is preferably 0.50 N / 25 mm to 3.00 N / 25 mm, more preferably It is 1.00 N / 25 mm or more and 2.50 N / 25 mm or less, More preferably, it is 1.50 N / 25 mm or more and 2.00 N / 25 mm or less.
When the adhesive strength of the adhesive layer 12 to the copper foil is 0.50 N / 25 mm or more, the adhesive sheet 10 can be prevented from peeling off from the adherend when the substrate 11 or the adherend is deformed by heating.
When the adhesive force of the adhesive layer 12 to the copper foil is 3.00 N / 25 mm or less, the peeling force does not become too high, and the adhesive sheet 10 is easily peeled from the adherend.
Although the achievement means for obtaining the adhesive sheet 10 whose adhesive force with respect to the copper foil of the adhesive layer 12 is the said range is not specifically limited, For example, the above-mentioned method 1 to method 4 are mentioned.
 粘着剤層12の銅箔に対する粘着力は、以下のように測定される。
 粘着シートに剥離フィルムが設けられている場合、この剥離フィルム付き粘着シートの一部をカッター等で25mm×25mmの大きさに切り出す。次いで、切り出された剥離フィルム付き粘着シートから剥離フィルムを剥離し、粘着シートの粘着剤層を銅箔(150mm×100mm、厚さ0.08mm、JIS H3100:2010 C1220R-H(延伸銅箔))に、JIS Z 0237:2009に準拠して貼付する。これを銅箔用試験片とする。
 なお、粘着シートに剥離フィルムが設けられていない場合、粘着シートを用いて上記と同様の方法で銅箔用試験片を得る。
 次に、銅箔用試験片を雰囲気式電気炉(SKM-Series SKM-3035F、モトヤマ社製)に導入し、100℃及び30分間の条件で加熱し、続いて180℃及び30分間の条件で加熱し、さらに190℃及び1時間の条件で加熱する。その後、試験片を炉内から取り出し、常温(25℃)になるまで放冷し、放冷後、23℃及び50%RHの雰囲気下で24時間放置する。
 この24時間放置後の銅箔用試験片を用いて、以下の測定条件で粘着剤層12の銅箔に対する粘着力を測定する。
The adhesive force with respect to the copper foil of the adhesive layer 12 is measured as follows.
When a release film is provided on the pressure-sensitive adhesive sheet, a part of this pressure-sensitive adhesive sheet with a release film is cut into a size of 25 mm × 25 mm with a cutter or the like. Next, the release film is peeled off from the cut-out adhesive sheet with release film, and the adhesive layer of the adhesive sheet is copper foil (150 mm × 100 mm, thickness 0.08 mm, JIS H3100: 2010 C1220R-H (stretched copper foil)) Is attached in accordance with JIS Z 0237: 2009. This is a test piece for copper foil.
In addition, when the peeling film is not provided in the adhesive sheet, the test piece for copper foils is obtained by the method similar to the above using an adhesive sheet.
Next, the test piece for copper foil was introduced into an atmospheric electric furnace (SKM-Series SKM-3035F, manufactured by Motoyama), heated at 100 ° C. for 30 minutes, and then at 180 ° C. for 30 minutes. It heats, and also heats on the conditions of 190 degreeC and 1 hour. Thereafter, the test piece is taken out from the furnace, allowed to cool to room temperature (25 ° C.), and left to stand in an atmosphere of 23 ° C. and 50% RH for 24 hours.
Using the test piece for copper foil after being left for 24 hours, the adhesive strength of the adhesive layer 12 to the copper foil is measured under the following measurement conditions.
 -測定条件-
・装置  :引張試験機(島津製作所社製、オートグラフAG-IS 500N)
・剥離角度 :180度
・剥離速度 :300mm/min
・測定環境 :23℃及び50%RH
-Measurement condition-
・ Device: Tensile tester (manufactured by Shimadzu Corporation, Autograph AG-IS 500N)
・ Peeling angle: 180 degrees ・ Peeling speed: 300 mm / min
・ Measurement environment: 23 ° C. and 50% RH
<ポリイミドフィルムに対する粘着力>
 本実施形態の効果をより発現する観点から、粘着シート10を、100℃及び30分間の条件で加熱し、続いて180℃及び30分間の条件で加熱し、さらに190℃及び60分間の条件で加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における粘着剤層12のポリイミドフィルムに対する粘着力は、好ましくは0.50N/25mm以上2.00N/25mm以下、より好ましくは0.70N/25mm以上1.80N/25mm以下、さらに好ましくは1.00N/25mm以上1.50N/25mm以下である。
 粘着剤層12のポリイミドフィルムに対する粘着力が0.50N/25mm以上であると、加熱によって基材11または被着体が変形した場合に粘着シート10が被着体から剥離することを防止できる。
 粘着剤層12のポリイミドフィルムに対する粘着力が2.00N/25mm以下であると、剥離力が高くなり過ぎず、粘着シート10を被着体から剥離しやすい。
 粘着剤層12のポリイミドフィルムに対する粘着力が上記範囲である粘着シート10を得るための達成手段としては特に限定されないが、前述の方法1から方法4、並びに後述する粘着剤成分の種類及び含有率を調整する方法等が挙げられる。
<Adhesive strength to polyimide film>
From the viewpoint of more manifesting the effect of the present embodiment, the pressure-sensitive adhesive sheet 10 is heated at 100 ° C. and 30 minutes, subsequently heated at 180 ° C. and 30 minutes, and further at 190 ° C. and 60 minutes. The adhesive strength of the pressure-sensitive adhesive layer 12 to the polyimide film after being heated and then allowed to stand at 23 ° C. and 50% RH for 24 hours is preferably 0.50 N / 25 mm or more and 2.00 N / 25 mm or less, more preferably It is 0.70 N / 25 mm or more and 1.80 N / 25 mm or less, More preferably, it is 1.00 N / 25 mm or more and 1.50 N / 25 mm or less.
When the adhesive force of the adhesive layer 12 to the polyimide film is 0.50 N / 25 mm or more, the adhesive sheet 10 can be prevented from peeling off from the adherend when the substrate 11 or the adherend is deformed by heating.
When the adhesive force of the pressure-sensitive adhesive layer 12 to the polyimide film is 2.00 N / 25 mm or less, the peeling force does not become too high, and the pressure-sensitive adhesive sheet 10 is easily peeled off from the adherend.
Although it does not specifically limit as an achievement means for obtaining the adhesive sheet 10 whose adhesive force with respect to the polyimide film of the adhesive layer 12 is the said range, The above-mentioned method 1 to method 4, and the kind and content rate of the adhesive component mentioned later The method etc. of adjusting are mentioned.
 粘着剤層12のポリイミドフィルムに対する粘着力は、以下のように測定される。
 ステンレス板に両面テープでポリイミドフィルム(150mm×70mm、厚さ50μm、東レ・デュポン社製、カプトン200H)を貼付し、これを被着体Aとする。
 前記銅箔に対する粘着力の測定方法において、粘着シート10の粘着剤層12を銅箔に貼付することに代えて、被着体Aのポリイミドフィルムに貼付すること以外は、粘着剤層12の銅箔に対する粘着力の測定方法と同様の方法で、粘着剤層12のポリイミドフィルムに対する粘着力を測定する。
The adhesive force with respect to the polyimide film of the adhesive layer 12 is measured as follows.
A polyimide film (150 mm × 70 mm, thickness 50 μm, manufactured by Toray DuPont, Kapton 200H) is attached to a stainless steel plate with a double-sided tape.
In the method for measuring the adhesive strength to the copper foil, the copper of the adhesive layer 12 is used except that the adhesive layer 12 of the adhesive sheet 10 is affixed to the polyimide film of the adherend A instead of being affixed to the copper foil. The adhesive force with respect to the polyimide film of the adhesive layer 12 is measured by the same method as the method for measuring the adhesive force with respect to the foil.
 次に、本実施形態の粘着シート10の構成について説明する。以下、符号の記載を省略する。 Next, the configuration of the pressure-sensitive adhesive sheet 10 of this embodiment will be described. Hereinafter, the description of the reference numerals is omitted.
<基材>
 基材は、粘着剤層を支持する部材である。
 基材としては、例えば、合成樹脂フィルム等のシート材料等を用いることができる。合成樹脂フィルムとしては、例えば、ポリエチレンフィルム、ポリプロピレンフィルム、ポリブテンフィルム、ポリブタジエンフィルム、ポリメチルペンテンフィルム、ポリ塩化ビニルフィルム、塩化ビニル共重合体フィルム、ポリエチレンテレフタレートフィルム、ポリエチレンナフタレートフィルム、ポリブチレンテレフタレートフィルム、ポリウレタンフィルム、エチレン酢酸ビニル共重合体フィルム、アイオノマー樹脂フィルム、エチレン・(メタ)アクリル酸共重合体フィルム、エチレン・(メタ)アクリル酸エステル共重合体フィルム、ポリスチレンフィルム、ポリカーボネートフィルム、及びポリイミドフィルム等が挙げられる。その他、基材としては、これらの架橋フィルム及び積層フィルム等が挙げられる。
<Base material>
A base material is a member which supports an adhesive layer.
As the substrate, for example, a sheet material such as a synthetic resin film can be used. Examples of synthetic resin films include polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polyethylene naphthalate film, and polybutylene terephthalate film. , Polyurethane film, ethylene vinyl acetate copolymer film, ionomer resin film, ethylene / (meth) acrylic acid copolymer film, ethylene / (meth) acrylic acid ester copolymer film, polystyrene film, polycarbonate film, and polyimide film Etc. In addition, examples of the substrate include these crosslinked films and laminated films.
 基材は、ポリエステル系樹脂を含むことが好ましく、ポリエステル系樹脂を主成分とする材料からなることがより好ましい。本明細書において、ポリエステル系樹脂を主成分とする材料とは、基材を構成する材料全体の質量に占めるポリエステル系樹脂の質量の割合が50質量%以上であることを意味する。
 ポリエステル系樹脂としては、例えば、ポリエチレンテレフタレート樹脂、ポリブチレンテレフタレート樹脂、ポリエチレンナフタレート樹脂、ポリブチレンナフタレート樹脂、及びこれらの樹脂の共重合樹脂からなる群から選択されるいずれかの樹脂であることが好ましく、ポリエチレンテレフタレート樹脂がより好ましい。
 基材11としては、ポリエチレンテレフタレートフィルム、またはポリエチレンナフタレートフィルムが好ましく、ポリエチレンテレフタレートフィルムがより好ましい。ポリエステルフィルムに含有するオリゴマーとしては、ポリエステル形成性モノマー、ダイマー、及びトリマー等に由来する。
The base material preferably contains a polyester-based resin, and more preferably is made of a material mainly composed of a polyester-based resin. In this specification, the material having a polyester-based resin as a main component means that the proportion of the mass of the polyester-based resin in the entire material constituting the base material is 50% by mass or more.
The polyester resin is, for example, any resin selected from the group consisting of polyethylene terephthalate resin, polybutylene terephthalate resin, polyethylene naphthalate resin, polybutylene naphthalate resin, and copolymer resins of these resins. Is preferred, and polyethylene terephthalate resin is more preferred.
As the base material 11, a polyethylene terephthalate film or a polyethylene naphthalate film is preferable, and a polyethylene terephthalate film is more preferable. The oligomer contained in the polyester film is derived from a polyester-forming monomer, a dimer, a trimer, and the like.
 本実施形態の粘着シートにおいて、加工性を良好にする観点から、基材の100℃における貯蔵弾性率は、1×10Pa以上であることが好ましい。
 基材の100℃での貯蔵弾性率の下限は、加工時の寸法安定性の観点から、1×10Pa以上が好ましく、1×10Pa以上であることがより好ましい。基材の100℃での貯蔵弾性率の上限は、加工適性の観点から1×1012Pa以下であることが好ましい。なお、本明細書において、貯蔵弾性率は、動的粘弾性測定装置を用いて、ねじりせん断法により周波数1Hzで測定した値である。測定する基材を幅5mm、長さ20mmに切断し、粘弾性測定機器(ティー・エイ・インスツルメント社製、DMAQ800)を使用し、周波数1Hz、引張モードにより、100℃の貯蔵粘弾性を測定する。
In the pressure-sensitive adhesive sheet of the present embodiment, the storage elastic modulus at 100 ° C. of the substrate is preferably 1 × 10 7 Pa or more from the viewpoint of improving the workability.
The lower limit of the storage elastic modulus at 100 ° C. of the substrate is preferably 1 × 10 7 Pa or more, more preferably 1 × 10 8 Pa or more, from the viewpoint of dimensional stability during processing. The upper limit of the storage elastic modulus at 100 ° C. of the substrate is preferably 1 × 10 12 Pa or less from the viewpoint of processability. In the present specification, the storage elastic modulus is a value measured at a frequency of 1 Hz by a torsional shear method using a dynamic viscoelasticity measuring device. The substrate to be measured is cut into a width of 5 mm and a length of 20 mm, and a viscoelasticity measuring device (manufactured by TA Instruments, DMAQ800) is used, and the storage viscoelasticity at 100 ° C. is measured at a frequency of 1 Hz and a tensile mode. Measure.
 基材の第一基材面は、第一基材面上に形成される層(本実施形態では粘着剤層)との密着性を高めるために、プライマー処理、コロナ処理、及びプラズマ処理等の少なくともいずれかの表面処理が施されてもよい。また、第一基材面上に、例えば中間層を介して粘着剤層を形成する場合には、第一基材面は、中間層との密着性を高めるために、粘着剤が塗布されて粘着処理が施されていてもよい。この粘着処理に用いられる粘着剤としては、例えば、アクリル系、ゴム系、シリコーン系、及びウレタン系等の粘着剤が挙げられる。 The first substrate surface of the substrate is subjected to primer treatment, corona treatment, plasma treatment, etc. in order to enhance adhesion with a layer (adhesive layer in this embodiment) formed on the first substrate surface. At least one of the surface treatments may be performed. In addition, when the pressure-sensitive adhesive layer is formed on the first base material surface through, for example, an intermediate layer, the first base material surface is coated with a pressure-sensitive adhesive in order to improve adhesion with the intermediate layer. An adhesion treatment may be performed. Examples of the pressure-sensitive adhesive used for this pressure-sensitive adhesive treatment include acrylic, rubber-based, silicone-based, and urethane-based pressure-sensitive adhesives.
 本実施形態の効果をより発現する観点から、基材の粘着剤層の側における表面(図1の場合、第一基材面11a)は、導電性を有することが好ましい。基材は、その表面だけでなく、基材全体が導電性を有していてもよい。これにより、高温加熱後における粘着剤層の表面(図1の場合、第一粘着面12a)の帯電防止性能が向上すると考えられる。 From the viewpoint of more manifesting the effects of the present embodiment, the surface of the substrate on the side of the pressure-sensitive adhesive layer (in the case of FIG. 1, the first substrate surface 11a) preferably has conductivity. The whole base material may have electroconductivity as well as the surface. Thereby, it is considered that the antistatic performance of the surface of the pressure-sensitive adhesive layer after heating at high temperature (in the case of FIG. 1, the first pressure-sensitive adhesive surface 12a) is improved.
 基材の粘着剤層の側における表面(以下、基材表面とも称する。)が導電性を有する場合、本実施形態の効果をより発現する観点から、粘着シートを、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における基材表面の表面抵抗率は、好ましくは10-7Ω/□以上10Ω/□以下、より好ましくは10-7Ω/□以上10Ω/□以下、さらに好ましくは10-7Ω/□以上10Ω/□以下である。
 基材の表面抵抗率とは、基材の粘着剤層の側における表面側から(図1の場合、第一基材面11a側から)測定した値をいう。測定方法は、前述の粘着剤層の表面抵抗率の測定方法と同様である。
 測定用試験片としては、粘着シートから、基材上に積層された層を除去し基材表面を露出させたものを用いる。
When the surface of the base material on the pressure-sensitive adhesive layer side (hereinafter also referred to as the base material surface) has conductivity, the pressure-sensitive adhesive sheet is heated at 190 ° C. under a nitrogen atmosphere from the viewpoint of further expressing the effects of the present embodiment. The surface resistivity of the substrate surface after being heated for 60 minutes and then allowed to stand for 24 hours in an atmosphere of 23 ° C. and 50% RH is preferably 10 −7 Ω / □ or more and 10 7 Ω / □ or less, more preferably It is 10 −7 Ω / □ or more and 10 5 Ω / □ or less, more preferably 10 −7 Ω / □ or more and 10 4 Ω / □ or less.
The surface resistivity of the substrate refers to a value measured from the surface side on the pressure-sensitive adhesive layer side of the substrate (in the case of FIG. 1, from the first substrate surface 11a side). The measuring method is the same as the measuring method of the surface resistivity of the pressure-sensitive adhesive layer described above.
As the test piece for measurement, a pressure-sensitive adhesive sheet in which the layer laminated on the substrate is removed and the surface of the substrate is exposed is used.
 基材表面に導電性を付与する方法としては特に限定されないが、例えば、基材を構成する材料に、予め導電性材料(例えば後述する帯電防止剤等)を分散もしくは練り込んで基材を作製する方法、基材表面に導電性材料を塗布する方法、基材表面に金属もしくは合金からなる層を形成する方法等が挙げられる。基材表面に金属もしくは合金からなる層を形成する方法としては、無電解めっき法、電解めっき法、蒸着法、スパッタリング法等が挙げられる。 The method for imparting conductivity to the surface of the substrate is not particularly limited. For example, a substrate is prepared by dispersing or kneading a conductive material (for example, an antistatic agent described later) in advance in the material constituting the substrate. And a method of applying a conductive material to the surface of the substrate, a method of forming a layer made of a metal or an alloy on the surface of the substrate, and the like. Examples of the method for forming a layer made of a metal or alloy on the surface of the substrate include electroless plating, electrolytic plating, vapor deposition, and sputtering.
 基材表面が導電性を有さない場合、基材の表面抵抗率は、好ましくは10Ω/□以上1016Ω/□以下、より好ましくは10Ω/□以上1016Ω/□以下、さらに好ましくは10Ω/□以上1016Ω/□以下である。 When the surface of the substrate does not have conductivity, the surface resistivity of the substrate is preferably 10 4 Ω / □ or more and 10 16 Ω / □ or less, more preferably 10 7 Ω / □ or more and 10 16 Ω / □ or less. More preferably, it is 10 8 Ω / □ or more and 10 16 Ω / □ or less.
 基材の厚さは、好ましくは10μm以上300μm以下、より好ましくは15μm以上200μm以下、さらに好ましくは20μm以上100μm以下である。 The thickness of the substrate is preferably 10 μm or more and 300 μm or less, more preferably 15 μm or more and 200 μm or less, and further preferably 20 μm or more and 100 μm or less.
<粘着剤層>
 粘着剤層は、帯電防止剤を含む粘着剤組成物(以下、単に「粘着剤組成物」とも称する。)から形成される層である。
<Adhesive layer>
The pressure-sensitive adhesive layer is a layer formed from a pressure-sensitive adhesive composition containing an antistatic agent (hereinafter also simply referred to as “pressure-sensitive adhesive composition”).
(帯電防止剤)
 粘着剤組成物に含まれる帯電防止剤としては、例えば、炭素材料、イオン性材料、金属微粒子、金属酸化物、金属フィラー、及び界面活性剤が挙げられる。
 本実施形態の効果をより発現する観点から、帯電防止剤は、炭素材料及びイオン性材料からなる群から選択される少なくとも1種を含むことが好ましい。
(Antistatic agent)
Examples of the antistatic agent contained in the pressure-sensitive adhesive composition include carbon materials, ionic materials, metal fine particles, metal oxides, metal fillers, and surfactants.
From the viewpoint of more manifesting the effects of the present embodiment, the antistatic agent preferably includes at least one selected from the group consisting of a carbon material and an ionic material.
・炭素材料
 炭素材料としては、例えば、カーボンナノチューブ、カーボンナノファイバー、グラフェン、カーボンブラック、ミルド炭素繊維、及び黒鉛等が挙げられる。これらの材料は市販品を利用してもよい。
 カーボンナノチューブおよびグラフェンは、単層であっても多層であってもよい。
 カーボンブラックとしては、例えば、ケッチェンブラック、ファーネスブラック、およびアセチレンブラック等が挙げられる。
 これらの炭素材料は、1種を単独でまたは2種以上を組み合わせて使用することができる。
 炭素材料は、カーボンナノチューブ、グラフェン、及びカーボンブラックからなる群から選択される少なくとも1種であることが好ましい。
Carbon material Examples of the carbon material include carbon nanotubes, carbon nanofibers, graphene, carbon black, milled carbon fibers, and graphite. These materials may use commercially available products.
The carbon nanotubes and graphene may be single-walled or multi-layered.
Examples of carbon black include ketjen black, furnace black, and acetylene black.
These carbon materials can be used individually by 1 type or in combination of 2 or more types.
The carbon material is preferably at least one selected from the group consisting of carbon nanotubes, graphene, and carbon black.
 本実施形態の粘着シートが、導電層を有しているか(後述の第二実施形態、第三実施形態、及び第五実施形態の場合)、または基材表面が導電性を有する場合、炭素材料の含有量は、炭素材料の種類によるが、粘着剤層全体に対して、好ましくは1.0質量%以上15.0質量%未満、より好ましくは1.5質量%以上13.0質量%未満、さらに好ましくは2.0質量%以上10.0質量%未満である。
 炭素材料の含有量が1.0質量%以上であると、帯電防止性能が発現されやすい。
 炭素材料の含有量が15.0質量%未満であると、炭素材料の凝集及び分散不良の発生が抑制されやすい。また、炭素材料の含有量が15質量%未満であると、粘着剤組成物の高粘度化が抑制されるため、平滑な塗工面が得られやすい。
 本実施形態の粘着シートが、導電層を有さないか(第一実施形態、及び後述の第四実施形態の場合)、または基材表面が導電性を有さない場合、炭素材料の含有量は、炭素材料の種類によるが、粘着剤層全体に対して、好ましくは2.5質量%以上15.0質量%未満、より好ましくは3.0質量%以上13.0質量%未満、さらに好ましくは5.0質量%以上10.0質量%未満である。
 炭素材料の含有量が2.5質量%以上であると、帯電防止性能が発現されやすい。
 炭素材料の含有量が15.0質量%未満であると、炭素材料の凝集及び分散不良の発生が抑制されやすい。また、炭素材料の含有量が15質量%未満であると、粘着剤組成物の高粘度化が抑制されるため、平滑な塗工面が得られやすい。
When the pressure-sensitive adhesive sheet of this embodiment has a conductive layer (in the case of the second embodiment, the third embodiment, and the fifth embodiment described later) or the substrate surface has conductivity, a carbon material The content of depends on the type of carbon material, but is preferably 1.0% by mass or more and less than 15.0% by mass, more preferably 1.5% by mass or more and less than 13.0% by mass with respect to the entire pressure-sensitive adhesive layer. More preferably, it is 2.0 mass% or more and less than 10.0 mass%.
When the content of the carbon material is 1.0% by mass or more, antistatic performance is easily exhibited.
When the content of the carbon material is less than 15.0% by mass, the occurrence of aggregation and poor dispersion of the carbon material is easily suppressed. Moreover, since the viscosity increase of an adhesive composition is suppressed as content of a carbon material is less than 15 mass%, a smooth coating surface is easy to be obtained.
When the pressure-sensitive adhesive sheet of this embodiment does not have a conductive layer (in the case of the first embodiment and the fourth embodiment described later) or the substrate surface does not have conductivity, the content of the carbon material Depending on the type of the carbon material, it is preferably 2.5% by mass or more and less than 15.0% by mass, more preferably 3.0% by mass or more and less than 13.0% by mass, and still more preferably, with respect to the entire pressure-sensitive adhesive layer. Is 5.0 mass% or more and less than 10.0 mass%.
When the content of the carbon material is 2.5% by mass or more, antistatic performance is easily exhibited.
When the content of the carbon material is less than 15.0% by mass, the occurrence of aggregation and poor dispersion of the carbon material is easily suppressed. Moreover, since the viscosity increase of an adhesive composition is suppressed as content of a carbon material is less than 15 mass%, a smooth coating surface is easy to be obtained.
・イオン性材料
 イオン性材料は、イオン性液体、及びイオンポリマーからなる群から選択される少なくとも1種であることが好ましい。
-Ionic material It is preferable that an ionic material is at least 1 sort (s) selected from the group which consists of an ionic liquid and an ionic polymer.
・イオン性液体
 イオン性液体は、カチオンとアニオンとで構成される塩である。
 イオン性液体のカチオンとしては、非金属性イオンが好ましく、例えば、イミダゾリウム系カチオン、ピリジニウム系カチオン、ピロリジウム系カチオン、第4級アンモニウム系カチオン、及び第4級ホスホニウム系カチオン等が挙げられる。
-Ionic liquid An ionic liquid is a salt comprised by a cation and an anion.
As the cation of the ionic liquid, a nonmetallic ion is preferable, and examples thereof include an imidazolium cation, a pyridinium cation, a pyrrolidinium cation, a quaternary ammonium cation, and a quaternary phosphonium cation.
 イオン性液体のアニオンとしては、例えば、下記一般式(1)で表されるアニオン、CFCO 、CF(CFSO 、CFSO 、(CFSO、CF(CFCO 、BF(CF、BF(C、BF(C、BF(CF 、BF(CF)(C、PF(CF、PF(C、PF(C、PF(CF 、PF(CF)(C、PF(CF 、B(C 、CHCHOSO 、CHCO 等が挙げられる。
 これらの中でも、ファンデルワールス半径が0.260nm以上のアニオンであることが好ましく、0.280nm以上のアニオンであることがより好ましく、0.300nm以上のアニオンであることがさらに好ましい。
 ファンデルワールス半径が0.260nm以上のアニオンであると、イオン性液体の結晶化が起こり難くなり、イオン性液体が常温において液体で存在しやすくなる。すなわち、イオン性液体が解離しやすくなる。このようなアニオンを含む粘着剤層を高温加熱しても、粘着剤層が劣化しにくくなる。その結果、本実施形態の効果がより発現されやすくなる。
Examples of the anion of the ionic liquid include an anion represented by the following general formula (1), CF 3 CO 2 , CF 3 (CF 2 ) 3 SO 3 , CF 3 SO 3 , (CF 3 SO 2 ) 3 C , CF 3 (CF 2 ) 2 CO 2 , BF 3 (CF 3 ) , BF 3 (C 2 F 5 ) , BF 3 (C 3 F 7 ) , BF 2 (CF 3 ) 2 , BF 2 (CF 3 ) (C 2 F 5 ) , PF 5 (CF 3 ) , PF 5 (C 2 F 5 ) , PF 5 (C 3 F 7 ) , PF 4 (CF 3 ) 2 , PF 4 (CF 3 ) (C 2 F 5 ) , PF 3 (CF 3 ) 3 , B (C 2 O 4 ) 2 , CH 3 CH 2 OSO 3 , CH 3 CO 2 Etc.
Among these, an anion having a van der Waals radius of 0.260 nm or more is preferable, an anion of 0.280 nm or more is more preferable, and an anion of 0.300 nm or more is more preferable.
When the van der Waals radius is an anion having a radius of 0.260 nm or more, the ionic liquid is hardly crystallized, and the ionic liquid tends to exist as a liquid at room temperature. That is, the ionic liquid is easily dissociated. Even if the pressure-sensitive adhesive layer containing such anions is heated at a high temperature, the pressure-sensitive adhesive layer is hardly deteriorated. As a result, the effect of the present embodiment is more easily expressed.
 イオン性液体は、カチオンと、下記一般式(1)で表されるアニオン(以下、「特定のイミドアニオン」とも称する。)とを含むことが好ましい。
 イオン性液体のアニオンが特定のイミドアニオンであると、ファンデルワールス半径が大きくなるため(好ましくは0.260nm以上になるため)、上記と同様の理由により、本実施形態の効果がより発現されやすくなる。
 なお、本明細書において、ファンデルワールス半径とは、下記文献に基づく値をいう。・M.Ue,J.Electrochem.Soc.,141,3336(1994)・M.Ue,A.Murakami,S.Nakamura,J.Electrochem.Soc.,149,A1385(2002)
The ionic liquid preferably contains a cation and an anion represented by the following general formula (1) (hereinafter also referred to as “specific imide anion”).
When the anion of the ionic liquid is a specific imide anion, the van der Waals radius becomes large (preferably 0.260 nm or more), and therefore the effect of the present embodiment is more manifested for the same reason as described above. It becomes easy.
In this specification, the van der Waals radius is a value based on the following document.・ M.Ue, J. Electrochem. Soc., 141, 3336 (1994) ・ M. Ue, A. Murakami, S. Nakamura, J. Electrochem. Soc., 149, A1385 (2002)
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 一般式(1)において、R及びRは、それぞれ独立に、フッ素原子、または炭素数1以上8以下のパーフルオロアルキル基であり、R及びRは、同一または異なる。 In the general formula (1), R 1 and R 2 are each independently a fluorine atom or a perfluoroalkyl group having 1 to 8 carbon atoms, and R 1 and R 2 are the same or different.
 一般式(1)において、R及びRは、それぞれ独立に、好ましくは炭素数1以上8以下のパーフルオロアルキル基、より好ましくは炭素数1以上6以下のパーフルオロアルキル基、さらに好ましくは炭素数1以上4以下のパーフルオロアルキル基である。
 また、R及びRは、同一であることが好ましい。
In the general formula (1), R 1 and R 2 are each independently preferably a perfluoroalkyl group having 1 to 8 carbon atoms, more preferably a perfluoroalkyl group having 1 to 6 carbon atoms, still more preferably A perfluoroalkyl group having 1 to 4 carbon atoms.
R 1 and R 2 are preferably the same.
 イオン性液体の含有量は、イオン性液体の種類によるが、粘着剤層全体に対して、好ましくは0.01質量%以上10質量%以下、より好ましくは0.05質量%以上8質量%以下、さらに好ましくは0.1質量%以上5質量%以下である。
 イオン性液体の含有量が0.01質量%以上であると、帯電防止性能が発現されやすい。
 イオン性液体の含有量が10質量%以下であると、ブリードアウトによる被着体汚染が抑制されやすく、また粘着力が確保されやすい。
The content of the ionic liquid depends on the type of the ionic liquid, but is preferably 0.01% by mass or more and 10% by mass or less, more preferably 0.05% by mass or more and 8% by mass or less with respect to the entire pressure-sensitive adhesive layer. More preferably, it is 0.1 mass% or more and 5 mass% or less.
When the content of the ionic liquid is 0.01% by mass or more, antistatic performance is easily exhibited.
When the content of the ionic liquid is 10% by mass or less, contamination of the adherend due to bleed out is easily suppressed, and adhesive strength is easily secured.
 本実施形態の効果をより発現する観点から、帯電防止剤は、イオン性液体であるか、またはイオン性液体と炭素材料との混合物であることも好ましい。
 帯電防止剤がイオン性液体と炭素材料との混合物であると、同じ表面抵抗率を発現させる際に、一種類の帯電防止剤を単体で使用する場合よりも少ない帯電防止剤の総含有量で所定の帯電防止性能を発現できるため、粘着剤成分の含有率の低下に伴う粘着力の低下を抑制できるので好ましい。
 帯電防止剤がイオン性液体と炭素材料との混合物である場合、帯電防止剤の総含有量(イオン性液体及び炭素材料の総含有量)は、粘着剤層全体に対して、好ましくは0.01質量%以上8質量%以下、より好ましくは0.05質量%以上7質量%以下、さらに好ましくは0.1質量%以上6質量%以下である。
 帯電防止剤がイオン性液体と炭素材料との混合物である場合、イオン性液体の含有量Iwと炭素材料の含有量Cwとの質量比(Iw/Cw)は、好ましくは0.01/15以上10/2以下、より好ましくは0.05/13以上8/3以下、さらに好ましくは0.10/10以上5/5以下である。
 前記質量比(Iw/Cw)が0.01/15以上であると、イオン性液体の割合が適量になり帯電圧の上昇を抑制できる。これにより、粘着シート剥離時の帯電の発生を抑制しやすくなる。
 前記質量比(Iw/Cw)が10/2以下であると、イオン性液体の割合が過剰になることが抑制されるため、粘着シート剥離時に被着体表面へのイオン性液体由来の成分移行が発生しにくくなる。
From the viewpoint of more manifesting the effects of the present embodiment, the antistatic agent is preferably an ionic liquid or a mixture of an ionic liquid and a carbon material.
When the antistatic agent is a mixture of an ionic liquid and a carbon material, when developing the same surface resistivity, the total content of the antistatic agent is smaller than when using a single type of antistatic agent alone. Since a predetermined antistatic performance can be exhibited, it is preferable because a decrease in adhesive force accompanying a decrease in the content of the adhesive component can be suppressed.
When the antistatic agent is a mixture of an ionic liquid and a carbon material, the total content of the antistatic agent (the total content of the ionic liquid and the carbon material) is preferably 0. It is 01 mass% or more and 8 mass% or less, More preferably, it is 0.05 mass% or more and 7 mass% or less, More preferably, it is 0.1 mass% or more and 6 mass% or less.
When the antistatic agent is a mixture of an ionic liquid and a carbon material, the mass ratio (Iw / Cw) of the ionic liquid content Iw and the carbon material content Cw is preferably 0.01 / 15 or more. It is 10/2 or less, more preferably 0.05 / 13 or more and 8/3 or less, and further preferably 0.10 / 10 or more and 5/5 or less.
When the mass ratio (Iw / Cw) is 0.01 / 15 or more, the ratio of the ionic liquid becomes an appropriate amount, and an increase in the charged voltage can be suppressed. Thereby, it becomes easy to suppress generation | occurrence | production of the charge at the time of peeling of an adhesive sheet.
When the mass ratio (Iw / Cw) is 10/2 or less, the ratio of the ionic liquid is suppressed from being excessive, so that the component derived from the ionic liquid is transferred to the adherend surface when the adhesive sheet is peeled off. Is less likely to occur.
・イオンポリマー
 イオンポリマーとしては、例えば、イオン性官能基およびエネルギー線硬化性基を有するポリマーが挙げられる。
 イオン性官能基は、カチオン性基(以下、単に「カチオン」とも称する)と、アニオン性基(以下、単に「アニオン」とも称する)とを含む概念である。すなわち、イオンポリマーは、カチオンと、これに対するアニオンとを含むポリマーであって、カチオンとアニオンとでイオン結合を形成し得るポリマーである。
 イオンポリマーは、イオン性官能基を有することにより、帯電防止性能を発揮する。
 イオンポリマーは、カチオンを主鎖または側鎖に有していればよいが、側鎖に有していることが好ましい。
-Ionic polymer As an ionic polymer, the polymer which has an ionic functional group and an energy-beam curable group is mentioned, for example.
The ionic functional group is a concept including a cationic group (hereinafter also simply referred to as “cation”) and an anionic group (hereinafter also simply referred to as “anion”). That is, the ionic polymer is a polymer containing a cation and an anion for the cation, and can form an ionic bond between the cation and the anion.
The ionic polymer exhibits antistatic performance by having an ionic functional group.
The ionic polymer may have a cation in the main chain or a side chain, but preferably has a cation in the side chain.
・イオン性官能基(カチオン、アニオン)
 イオンポリマーに含まれるカチオンとしては、例えば、4級アンモニウムカチオン、ホスホニウムカチオン、スルホニウムカチオン、オキソニウムカチオン、ジアゾニウムカチオン、クロロニウムカチオン、ヨードニウムカチオン、及びピリリウムカチオン等が挙げられる。これらのカチオンは、1種を単独で使用することもできるし、2種以上を組み合わせて使用することもできる。
・ Ionic functional groups (cations, anions)
Examples of the cation contained in the ionic polymer include a quaternary ammonium cation, a phosphonium cation, a sulfonium cation, an oxonium cation, a diazonium cation, a chloronium cation, an iodonium cation, and a pyrylium cation. These cations can be used alone or in combination of two or more.
 これらの中でも、カチオンとしては、帯電防止性能に優れた4級アンモニウムカチオンが特に好ましい。
 ここで、「4級アンモニウムカチオン」とは、窒素のオニウムカチオンを意味し、イミダゾリウム、ピリジウムのような複素環オニウムイオンを含む。4級アンモニウムカチオンとしては、アルキルアンモニウムカチオン(ここでいう「アルキル」は、炭素原子数1~30の炭化水素基のほか、ヒドロキシアルキルおよびアルコキシアルキルで置換されているものを含む。);ピロリジニウムカチオン、ピロリウムカチオン、イミダゾリウムカチオン、ピラゾリウムカチオン、ピリジニウムカチオン、ピペリジニウムカチオン、ピペラジニウムカチオン等の複素単環カチオン;インドリウムカチオン、ベンズイミダゾリウムカチオン、カルバゾリウムカチオン、キノリニウムカチオン等の縮合複素環カチオン;などが挙げられる。いずれも、窒素原子および/または環に炭素原子数1~30(例えば、炭素原子数1~10)の炭化水素基、ヒドロキシアルキル基またはアルコキシアルキル基が結合しているものを含む。本明細書において、「~」を用いて表される数値範囲は、「~」の前に記載される数値を下限値とし、「~」の後に記載される数値を上限値として含む範囲を意味する。
Among these, a quaternary ammonium cation excellent in antistatic performance is particularly preferable as the cation.
Here, the “quaternary ammonium cation” means an onium cation of nitrogen, and includes heterocyclic onium ions such as imidazolium and pyridium. Examples of the quaternary ammonium cation include alkylammonium cations (herein, “alkyl” includes those substituted with a hydroxy group and an alkoxyalkyl in addition to a hydrocarbon group having 1 to 30 carbon atoms); Heterocyclic cation such as nium cation, pyrrolium cation, imidazolium cation, pyrazolium cation, pyridinium cation, piperidinium cation, piperazinium cation; indolium cation, benzimidazolium cation, carbazolium cation, key And condensed heterocyclic cations such as a norinium cation. Any of them includes a nitrogen atom and / or a ring to which a hydrocarbon group, hydroxyalkyl group or alkoxyalkyl group having 1 to 30 carbon atoms (for example, 1 to 10 carbon atoms) is bonded. In this specification, a numerical range expressed using “to” means a range including a numerical value described before “to” as a lower limit value and a numerical value described after “to” as an upper limit value. To do.
 イオンポリマーに含まれる上記アニオンとしては、ハロゲン原子を有するアニオンのほか、カルボン酸、スルホン酸、リン酸等のオキソ酸の誘導体(たとえば、硫酸水素、メタンスルホナート、エチルスルファート、ジメチルフォスフェート、2-(2-メトキシエトキシ)エチルスルファート、ジシアナミド等)などが挙げられるが、中でもハロゲン原子を有するアニオンが好ましい。具体的には、(FSO(ビス{(フルオロ)スルホニル}イミドアニオン)、(CFSO(ビス{(トリフルオロメチル)スルホニル}イミドアニオン)、(CSO(ビス{(ペンタフルオロエチル)スルホニル}イミドアニオン)、CFSO-N-COCF 、R-SO-N-SOCF (Rは脂肪族基)、ArSO-N-SOCF (Arは芳香族基)等の窒素原子を有するアニオン;C2n+1CO (nは1~4の整数)、(CFSO、C2n+1SO (nは1~4の整数)、BF 、PF など、ハロゲン原子としてフッ素原子を有するアニオンが好ましく例示される。これらの中でも、ビス{(フルオロ)スルホニル}イミドアニオン、ビス{(トリフルオロメチル)スルホニル}イミドアニオン、ビス{(ペンタフルオロエチル)スルホニル}イミドアニオン、2,2,2-トリフルオロ-N-{(トリフルオロメチル)スルホニル}アセトイミドアニオン、テトラフルオロボレートアニオン、およびヘキサフロオロフォスフェートアニオンが特に好ましい。
 これらのアニオンは、1種を単独で使用することもできるし、2種以上を組み合わせて使用することもできる。
Examples of the anion contained in the ionic polymer include an anion having a halogen atom, and derivatives of oxo acids such as carboxylic acid, sulfonic acid, and phosphoric acid (for example, hydrogen sulfate, methanesulfonate, ethylsulfate, dimethylphosphate, 2- (2-methoxyethoxy) ethyl sulfate, dicyanamide, etc.), among which an anion having a halogen atom is preferred. Specifically, (FSO 2 ) 2 N (bis {(fluoro) sulfonyl} imide anion), (CF 3 SO 2 ) 2 N (bis {(trifluoromethyl) sulfonyl} imide anion), (C 2 F 5 SO 2 ) 2 N (bis {(pentafluoroethyl) sulfonyl} imide anion), CF 3 SO 2 —N—COCF 3 , R—SO 2 —N—SO 2 CF 3 (R is aliphatic Group), ArSO 2 —N—SO 2 CF 3 (Ar is an aromatic group) and other anions having a nitrogen atom; C n F 2n + 1 CO 2 (n is an integer of 1 to 4), (CF 3 SO 2 Anion having a fluorine atom as a halogen atom, such as 3 C , C n F 2n + 1 SO 3 (n is an integer of 1 to 4), BF 4 , PF 6 — and the like, is preferably exemplified. Among these, bis {(fluoro) sulfonyl} imide anion, bis {(trifluoromethyl) sulfonyl} imide anion, bis {(pentafluoroethyl) sulfonyl} imide anion, 2,2,2-trifluoro-N- { (Trifluoromethyl) sulfonyl} acetimide anion, tetrafluoroborate anion, and hexafluorophosphate anion are particularly preferred.
These anions can be used individually by 1 type, and can also be used in combination of 2 or more type.
・エネルギー線硬化性基
 イオンポリマーは、側鎖にエネルギー線硬化性基を有することにより、粘着剤層に対してエネルギー線を照射したときに、イオンポリマー同士、またはイオンポリマーと後述の粘着剤組成物中の粘着剤とが反応して架橋する。そのため、イオンポリマーの粘着剤層からのブリードアウトが抑制されるとともに、粘着シートを被着体から剥離したときに粘着剤の残渣物(パーティクル)が発生し難く、被着体の汚染を抑制することができる。
-Energy ray curable group The ionic polymer has an energy ray curable group in the side chain, so when the energy layer is irradiated to the adhesive layer, the ionic polymer or the ionic polymer and the adhesive composition described later are used. The adhesive in the product reacts and crosslinks. Therefore, bleeding out of the pressure-sensitive adhesive layer of the ionic polymer is suppressed, and when the pressure-sensitive adhesive sheet is peeled off from the adherend, it is difficult for adhesive residue (particles) to be generated, and contamination of the adherend is suppressed. be able to.
 エネルギー線硬化性基は、例えばエネルギー線硬化性の炭素-炭素二重結合を含む基である。具体的には、(メタ)アクリロイル基およびビニル基等が挙げられ、中でも(メタ)アクリロイル基、特にメタクリロイル基が好ましい。
 イオンポリマーの単位質量あたりのエネルギー線硬化性基の含有量は、5×10-5~2×10-3モル/gであることが好ましく、1×10-4~1.5×10-3モル/gであることが特に好ましく、3×10-4~1×10-3モル/gであることがさらに好ましい。
The energy ray curable group is, for example, a group containing an energy ray curable carbon-carbon double bond. Specific examples include a (meth) acryloyl group and a vinyl group. Among them, a (meth) acryloyl group, particularly a methacryloyl group is preferable.
The content of the energy ray-curable group per unit mass of the ionic polymer is preferably 5 × 10 −5 to 2 × 10 −3 mol / g, and 1 × 10 −4 to 1.5 × 10 −3. The molar ratio is particularly preferably 3 × 10 −4 to 1 × 10 −3 mol / g.
 イオンポリマーは、例えば、イオン性官能基を有する重合性モノマー(好ましくは4級アンモニウムカチオンを有する重合性モノマー)と、反応性官能基を有する重合性モノマーと、必要に応じて、エーテル結合を有する重合性モノマー及び他の重合性モノマー(好ましくはアクリル系の重合性モノマー)と、を共重合させた後、前記反応性官能基と反応する置換基およびエネルギー線硬化性基を有する硬化性基含有化合物(以下、「エネルギー線硬化性化合物」とも称する。)とを反応させることにより得られる。 The ionic polymer has, for example, a polymerizable monomer having an ionic functional group (preferably a polymerizable monomer having a quaternary ammonium cation), a polymerizable monomer having a reactive functional group, and, if necessary, an ether bond. A polymerizable monomer and another polymerizable monomer (preferably an acrylic polymerizable monomer) are copolymerized and then contain a curable group having a substituent that reacts with the reactive functional group and an energy ray-curable group. It can be obtained by reacting a compound (hereinafter also referred to as “energy ray curable compound”).
 「4級アンモニウムカチオンを有する重合性モノマー」は、重合性基を有する4級アンモニウムカチオンおよびこれに対するアニオンで構成されることが好ましい。
 重合性基としては、例えば、(メタ)アクリロイル基、ビニル基、アリル基等の炭素-炭素不飽和基、エポキシ基、オキセタン基等を有する環状エーテル類、テトラヒドロチオフェン等の環状スルフィド類及びイソシアネート基などが挙げられ、中でも(メタ)アクリロイル基およびビニル基が好ましい。
The “polymerizable monomer having a quaternary ammonium cation” is preferably composed of a quaternary ammonium cation having a polymerizable group and an anion corresponding thereto.
Examples of the polymerizable group include cyclic ethers having a carbon-carbon unsaturated group such as (meth) acryloyl group, vinyl group and allyl group, epoxy group and oxetane group, cyclic sulfides such as tetrahydrothiophene, and isocyanate groups. Among them, (meth) acryloyl group and vinyl group are preferable.
 イオンポリマー全体の質量に占める「4級アンモニウムカチオンを有する重合性モノマー」由来の構造部分の質量の割合は、20質量%以上80質量%以下であることが好ましく、25質量%以上75質量%以下であることがより好ましく、35質量%以上60質量%以下であることがさらに好ましい。
 「4級アンモニウムカチオンを有する重合性モノマー」由来の構造部分の質量の割合が20質量%以上であると、イオンポリマーが十分な帯電防止性を発揮する。
 「4級アンモニウムカチオンを有する重合性モノマー」由来の構造部分の質量の割合が80質量%以下であると、他のモノマーに由来する構造部分の質量の割合を好ましい範囲に制御することができる。
The proportion of the mass of the structural portion derived from the “polymerizable monomer having a quaternary ammonium cation” in the total mass of the ionic polymer is preferably 20% by mass or more and 80% by mass or less, and 25% by mass or more and 75% by mass or less. It is more preferable that it is 35 mass% or more and 60 mass% or less.
When the proportion of the mass of the structural portion derived from the “polymerizable monomer having a quaternary ammonium cation” is 20% by mass or more, the ionic polymer exhibits sufficient antistatic properties.
When the proportion of the mass of the structural portion derived from the “polymerizable monomer having a quaternary ammonium cation” is 80% by mass or less, the proportion of the mass of the structural portion derived from another monomer can be controlled within a preferable range.
 「反応性官能基を有する重合性モノマー」としては、(メタ)アクリル酸の他、カルボキシル基、ヒドロキシ基、アミノ基、置換アミノ基、エポキシ基等の官能基を有する(メタ)アクリル酸エステルモノマーが挙げられ、中でも(メタ)アクリル酸が好ましい。 As the “polymerizable monomer having a reactive functional group”, a (meth) acrylic acid ester monomer having a functional group such as a carboxyl group, a hydroxy group, an amino group, a substituted amino group, and an epoxy group in addition to (meth) acrylic acid Among them, (meth) acrylic acid is preferable.
 イオンポリマー全体の質量に占める「反応性官能基を有する重合性モノマー」由来の構造部分の質量の割合は、1質量%以上35質量%以下であることが好ましく、3質量%以上20質量%以下であることがより好ましく、3質量%以上10質量%以下であることがさらに好ましい。
 「反応性官能基を有する重合性モノマー」由来の構造部分の質量の割合が上記範囲にあると、エネルギー線硬化性化合物が有するエネルギー線硬化性基のイオンポリマーに対する導入量を好ましい範囲に制御することができる。
The proportion of the mass of the structural portion derived from the “polymerizable monomer having a reactive functional group” in the mass of the entire ionic polymer is preferably 1% by mass to 35% by mass, and preferably 3% by mass to 20% by mass. It is more preferable that it is 3 mass% or more and 10 mass% or less.
When the proportion of the mass of the structural portion derived from the “polymerizable monomer having a reactive functional group” is within the above range, the amount of energy ray curable group introduced into the ion polymer of the energy ray curable compound is controlled within a preferable range. be able to.
 また、イオンポリマーは、エーテル結合を有する構成単位を側鎖に有することも好ましい。この場合、イオンポリマーの原料として「エーテル結合を有する重合性モノマー」を用いる。「エーテル結合を有する重合性モノマー」としては、例えば、エーテル結合を有する(メタ)アクリレートが挙げられる。 Also, the ionic polymer preferably has a structural unit having an ether bond in the side chain. In this case, “polymerizable monomer having an ether bond” is used as a raw material of the ionic polymer. Examples of the “polymerizable monomer having an ether bond” include (meth) acrylate having an ether bond.
 イオンポリマー全体の質量に占める「エーテル結合を有する重合性モノマー」由来の構造部分の質量の割合は、5質量%以上70質量%以下であることが好ましく、10質量%以上50質量%以下であることが特に好ましく、15質量%以上40質量%以下であることがさらに好ましい。
 「エーテル結合を有する重合性モノマー」由来の構造部分の質量の割合が上記範囲にあると、粘着剤層の帯電防止性能向上効果がより得られやすくなる。
The proportion of the mass of the structural portion derived from the “polymerizable monomer having an ether bond” in the total mass of the ionic polymer is preferably 5% by mass or more and 70% by mass or less, and preferably 10% by mass or more and 50% by mass or less. Particularly preferred is 15% by mass or more and 40% by mass or less.
When the proportion of the mass of the structural portion derived from the “polymerizable monomer having an ether bond” is in the above range, the effect of improving the antistatic performance of the pressure-sensitive adhesive layer is more easily obtained.
 「他の重合性モノマー」としては、アクリル系の重合性モノマーが好ましい。
 「他の重合性モノマー」としては、(メタ)アクリル酸エステルが好ましく挙げられる。(メタ)アクリル酸エステルとしては、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート等の鎖状骨格を有する(メタ)アクリレート;シクロへキシル(メタ)アクリレート、ベンジル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、イミドアクリレート等の環状骨格を有する(メタ)アクリレートなどが挙げられる。なお、(メタ)アクリル酸エステルが(メタ)アクリル酸アルキルエステルである場合には、そのアルキル基の炭素数は1~18の範囲であることが好ましい。
As the “other polymerizable monomer”, an acrylic polymerizable monomer is preferable.
As the “other polymerizable monomer”, (meth) acrylic acid ester is preferably exemplified. Examples of the (meth) acrylic acid ester have a chain skeleton such as methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate ( (Meth) acrylate; having a cyclic skeleton such as cyclohexyl (meth) acrylate, benzyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentanyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, imide acrylate ( And (meth) acrylate. When the (meth) acrylic acid ester is a (meth) acrylic acid alkyl ester, the alkyl group preferably has 1 to 18 carbon atoms.
 「エネルギー線硬化性化合物」の例としては、エネルギー線硬化性基を有していれば特に限定されないが、汎用性の観点から低分子量化合物(単官能、多官能のモノマーおよびオリゴマー)であることが好ましい。低分子量のエネルギー線硬化性化合物(A2)の具体例としては、トリメチロールプロパントリ(メタ)アクリレート、テトラメチロールメタンテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールモノヒドロキシペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレートあるいは1,4-ブチレングリコールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、ジシクロペンタジエンジメトキシジ(メタ)アクリレート、イソボルニル(メタ)アクリレートなどの環状脂肪族骨格含有(メタ)アクリレート、オリゴエステル(メタ)アクリレート、ウレタン(メタ)アクリレートオリゴマー、エポキシ変性(メタ)アクリレート、などのアクリレート系化合物が挙げられる。 Examples of the “energy ray curable compound” are not particularly limited as long as they have an energy ray curable group, but are low molecular weight compounds (monofunctional and polyfunctional monomers and oligomers) from the viewpoint of versatility. Is preferred. Specific examples of the low molecular weight energy ray-curable compound (A2) include trimethylolpropane tri (meth) acrylate, tetramethylolmethanetetra (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol monohydroxypenta ( (Meth) acrylate, dipentaerythritol hexa (meth) acrylate or 1,4-butylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, dicyclopentadiene dimethoxydi (meth) acrylate, isobornyl (meth) ) Cyclic aliphatic skeleton-containing (meth) acrylate such as acrylate, oligoester (meth) acrylate, urethane (meth) acrylate oligomer, epoxy-modified (meth) acrylate, Include acrylate-based compound.
 「エネルギー線硬化性化合物」と「反応性官能基を有する重合性モノマー」とは、モル当量が等量程度となるように反応させることが好ましい。 It is preferable that the “energy ray curable compound” and the “polymerizable monomer having a reactive functional group” are reacted so that the molar equivalent is about the same amount.
 イオンポリマーの重量平均分子量は、本実施形態の効果をより発現する観点から、500~20万であることが好ましく、800~10万であることが特に好ましく、800~5万であることがさらに好ましい。
 なお、イオンポリマーの重量平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)法により、以下の測定条件で測定した標準ポリメチルメタクリレート換算の値である。
The weight average molecular weight of the ionic polymer is preferably 500 to 200,000, particularly preferably 800 to 100,000, and more preferably 800 to 50,000, from the viewpoint of more manifesting the effects of the present embodiment. preferable.
In addition, the weight average molecular weight of an ionic polymer is the value of standard polymethylmethacrylate conversion measured on the following measurement conditions by the gel permeation chromatography (GPC) method.
 -測定条件-
・カラム:Shodex HFIP-LG、HFIP-806M(2本)をこの順に連結したもの
・溶媒:ヘキサフルオロイソプロパノール(5mMトリフルオロ酢酸ナトリウム添加)
・測定温度:40℃
・流速:0.5ml/分
・検出器:示差屈折計
・標準試料:ポリメチルメタクリレート
-Measurement condition-
Column: Shodex HFIP-LG and HFIP-806M (two) connected in this order Solvent: hexafluoroisopropanol (5 mM sodium trifluoroacetate added)
・ Measurement temperature: 40 ℃
・ Flow rate: 0.5 ml / min ・ Detector: Differential refractometer ・ Standard sample: Polymethyl methacrylate
 イオンポリマーの含有量は、イオンポリマーに含まれるイオン性官能基の種類によるが、粘着剤層全体に対して、好ましくは0.01質量%以上20質量%以下、より好ましくは0.05質量%以上18質量%以下、さらに好ましくは0.10質量%以上15質量%以下である。
 イオンポリマーの含有量が0.01質量%以上であると、帯電防止性能が発現されやすい。
 イオンポリマーの含有量が20質量%以下であると、エネルギー線照射前における粘着剤層の凝集力が高く維持されるため、粘着シート剥離時の被着体面への糊残りが抑制されやすい。
The content of the ionic polymer depends on the type of the ionic functional group contained in the ionic polymer, but is preferably 0.01% by mass or more and 20% by mass or less, more preferably 0.05% by mass with respect to the entire pressure-sensitive adhesive layer. It is 18 mass% or less, More preferably, it is 0.10 mass% or more and 15 mass% or less.
When the content of the ionic polymer is 0.01% by mass or more, antistatic performance is easily exhibited.
When the content of the ionic polymer is 20% by mass or less, the cohesive force of the pressure-sensitive adhesive layer before irradiation with energy rays is maintained high, so that adhesive residue on the adherend surface when the pressure-sensitive adhesive sheet is peeled is easily suppressed.
・金属微粒子、金属酸化物、金属フィラー、及び界面活性剤
 金属微粒子及び金属フィラーとしては、例えば、アルミニウム、銅、チタン、鉄及びニッケル等が挙げられる。
 金属酸化物としては、ITO(酸化インジウムスズ)、ZnO(酸化亜鉛)、IZO(酸化亜鉛インジウム)、AZO(酸化亜鉛アルミニウム)、GZO(酸化亜鉛ガリウム)、IGZO(酸化インジウムガリウム亜鉛)、及びATO(酸化スズアンチモン)等が挙げられる。
 界面活性剤としては公知のものを用いることができる。
Metal fine particles, metal oxides, metal fillers, and surfactants Examples of metal fine particles and metal fillers include aluminum, copper, titanium, iron, and nickel.
Examples of the metal oxide include ITO (indium tin oxide), ZnO (zinc oxide), IZO (indium zinc oxide), AZO (zinc aluminum oxide), GZO (zinc gallium oxide), IGZO (indium gallium zinc oxide), and ATO. (Tin antimony oxide) and the like.
As the surfactant, a known one can be used.
(粘着剤組成物)
 帯電防止剤を含む粘着剤組成物に含まれる粘着剤としては、特に限定されず、様々な種類の粘着剤を粘着剤層に適用できる。粘着剤層12に含まれる粘着剤としては、例えば、ゴム系、アクリル系、シリコーン系、ポリエステル系、及びウレタン系が挙げられる。なお、粘着剤の種類は、用途及び貼着される被着体の種類等を考慮して選択される。粘着剤層12は、アクリル系粘着剤組成物またはシリコーン系粘着剤組成物を含有することが好ましい。
(Adhesive composition)
It does not specifically limit as an adhesive contained in the adhesive composition containing an antistatic agent, Various types of adhesive can be applied to an adhesive layer. Examples of the adhesive contained in the adhesive layer 12 include rubber-based, acrylic-based, silicone-based, polyester-based, and urethane-based. In addition, the kind of adhesive is selected in consideration of the use, the kind of adherend to be attached, and the like. The pressure-sensitive adhesive layer 12 preferably contains an acrylic pressure-sensitive adhesive composition or a silicone-based pressure-sensitive adhesive composition.
・アクリル系粘着剤組成物
 アクリル系粘着剤組成物は、アルキル基の炭素数が4以上12以下の(メタ)アクリル酸アルキルエステル(以下、「特定の(メタ)アクリル酸アルキルエステル」とも称する。)を主たるモノマーとするアクリル系共重合体を含むことが好ましい。
 本明細書において、「(メタ)アクリル酸」は、「アクリル酸」及び「メタクリル酸」の双方を表す場合に用いる表記であり、他の類似用語についても同様である。
 本明細書において、「特定の(メタ)アクリル酸アルキルエステル」を主たるモノマーとするとは、アクリル系共重合体全体の質量に占める特定の(メタ)アクリル酸アルキルエステル由来の共重合体成分の質量の割合が50質量%以上であることを意味する。
 特定の(メタ)アクリル酸アルキルエステルにおけるアルキル基の炭素数は、好ましくは4以上12以下、より好ましくは4以上10以下、さらに好ましくは4以上8以下である。
 特定の(メタ)アクリル酸アルキルエステルにおけるアルキル基は直鎖状、分岐状、および環状のいずれでもよいが、分岐状であることが好ましい。
 特定の(メタ)アクリル酸アルキルエステルは、単独で用いてもよいし、2種以上を組み合わせて用いてもよいが、主たるモノマーは単独で用いることが好ましい。
Acrylic pressure-sensitive adhesive composition The acrylic pressure-sensitive adhesive composition is also referred to as a (meth) acrylic acid alkyl ester having an alkyl group having 4 to 12 carbon atoms (hereinafter referred to as “specific (meth) acrylic acid alkyl ester”). It is preferable to include an acrylic copolymer having a main monomer.
In this specification, “(meth) acrylic acid” is a notation used to represent both “acrylic acid” and “methacrylic acid”, and the same applies to other similar terms.
In the present specification, “specific (meth) acrylic acid alkyl ester” is the main monomer, and the mass of the copolymer component derived from the specific (meth) acrylic acid alkyl ester in the total mass of the acrylic copolymer. It means that the ratio of is 50 mass% or more.
The carbon number of the alkyl group in the specific (meth) acrylic acid alkyl ester is preferably 4 or more and 12 or less, more preferably 4 or more and 10 or less, and still more preferably 4 or more and 8 or less.
The alkyl group in the specific (meth) acrylic acid alkyl ester may be linear, branched, or cyclic, but is preferably branched.
The specific (meth) acrylic acid alkyl ester may be used alone or in combination of two or more, but the main monomer is preferably used alone.
 特定の(メタ)アクリル酸アルキルエステルは、アクリル酸2-エチルヘキシルであることが好ましい。すなわち、アクリル系粘着剤組成物は、アクリル酸2-エチルヘキシルを主たるモノマーとするアクリル系共重合体を含むことが好ましい。 The specific (meth) acrylic acid alkyl ester is preferably 2-ethylhexyl acrylate. That is, the acrylic pressure-sensitive adhesive composition preferably contains an acrylic copolymer having 2-ethylhexyl acrylate as a main monomer.
 本実施形態においては、アクリル系共重合体における特定の(メタ)アクリル酸アルキルエステル(好ましくはアクリル酸2-エチルヘキシル)に由来する共重合体成分の割合は、50質量%以上95質量%以下であることが好ましく、60質量%以上95質量%以下であることがより好ましく、80質量%以上95質量%以下であることがさらに好ましく、85質量%以上93質量%以下であることがさらにより好ましい。
 特定の(メタ)アクリル酸アルキルエステル(好ましくはアクリル酸2-エチルヘキシル)に由来する共重合体成分の割合が50質量%以上であれば、加熱後に粘着力が高くなり過ぎず、被着体から粘着シートをより剥離し易くなり、80質量%以上であればさらに剥離し易くなる。アクリル酸2-エチルヘキシルに由来する共重合体成分の割合が95質量%以下であれば、初期密着力が不足して加熱時に基材が変形したり、その変形によって粘着シートが被着体から剥離したりすることを防止できる。
 また、粘着剤層がアクリル系粘着剤組成物を含む場合、帯電防止剤と、アクリル系共重合体と、粘着助剤と、を含んでいることが好ましい。アクリル系共重合体は、特定の(メタ)アクリル酸アルキルエステル(好ましくはアクリル酸2-エチルヘキシル)を主たるモノマーとする共重合体であることが好ましい。粘着助剤は、反応性基を有するゴム系材料を主成分として含むことが好ましい。
In the present embodiment, the proportion of the copolymer component derived from the specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate) in the acrylic copolymer is from 50% by mass to 95% by mass. It is preferably 60% by mass to 95% by mass, more preferably 80% by mass to 95% by mass, and still more preferably 85% by mass to 93% by mass. .
When the proportion of the copolymer component derived from a specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate) is 50% by mass or more, the adhesive strength does not become too high after heating, The pressure-sensitive adhesive sheet is more easily peeled off, and is more easily peeled off at 80% by mass or more. If the proportion of the copolymer component derived from 2-ethylhexyl acrylate is 95% by mass or less, the initial adhesive force is insufficient and the substrate is deformed during heating, or the adhesive sheet is peeled off from the adherend due to the deformation. Can be prevented.
Moreover, when an adhesive layer contains an acrylic adhesive composition, it is preferable that the antistatic agent, the acrylic copolymer, and the adhesion adjuvant are included. The acrylic copolymer is preferably a copolymer having a specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate) as a main monomer. The adhesion aid preferably contains a rubber-based material having a reactive group as a main component.
 アクリル系共重合体における特定の(メタ)アクリル酸アルキルエステル(好ましくはアクリル酸2-エチルヘキシル)以外の共重合体成分の種類及び数は、特に限定されない。例えば、第二の共重合体成分としては、反応性の官能基を有する官能基含有モノマーが好ましい。第二の共重合体成分の反応性官能基としては、後述する架橋剤を使用する場合には、当該架橋剤と反応し得る官能基であることが好ましい。この反応性官能基は、例えば、カルボキシル基、水酸基、アミノ基、置換アミノ基、及びエポキシ基からなる群から選択される少なくともいずれかの置換基であることが好ましく、カルボキシル基及び水酸基の少なくともいずれかの置換基であることがより好ましく、カルボキシル基であることが更に好ましい。 The type and number of copolymer components other than the specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate) in the acrylic copolymer are not particularly limited. For example, as the second copolymer component, a functional group-containing monomer having a reactive functional group is preferable. As a reactive functional group of a 2nd copolymer component, when using the crosslinking agent mentioned later, it is preferable that it is a functional group which can react with the said crosslinking agent. This reactive functional group is preferably at least one substituent selected from the group consisting of, for example, a carboxyl group, a hydroxyl group, an amino group, a substituted amino group, and an epoxy group. These substituents are more preferable, and a carboxyl group is still more preferable.
 カルボキシル基を有するモノマー(カルボキシル基含有モノマー)としては、例えば、アクリル酸、メタクリル酸、クロトン酸、マレイン酸、イタコン酸、及びシトラコン酸等のエチレン性不飽和カルボン酸が挙げられる。カルボキシル基含有モノマーの中でも、反応性及び共重合性の点から、アクリル酸が好ましい。カルボキシル基含有モノマーは、単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 Examples of the monomer having a carboxyl group (carboxyl group-containing monomer) include ethylenically unsaturated carboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, maleic acid, itaconic acid, and citraconic acid. Among the carboxyl group-containing monomers, acrylic acid is preferable from the viewpoint of reactivity and copolymerization. A carboxyl group-containing monomer may be used independently and may be used in combination of 2 or more type.
 水酸基を有するモノマー(水酸基含有モノマー)としては、例えば、(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-ヒドロキシプロピル、(メタ)アクリル酸3-ヒドロキシプロピル、(メタ)アクリル酸2-ヒドロキシブチル、(メタ)アクリル酸3-ヒドロキシブチル、及び(メタ)アクリル酸4-ヒドロキシブチル等の(メタ)アクリル酸ヒドロキシアルキルエステル等が挙げられる。水酸基含有モノマーの中でも、水酸基の反応性及び共重合性の点から、(メタ)アクリル酸2-ヒドロキシエチルが好ましい。水酸基含有モノマーは単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 Examples of the monomer having a hydroxyl group (hydroxyl group-containing monomer) include, for example, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, (meth) acrylic acid 2 And (meth) acrylic acid hydroxyalkyl esters such as hydroxybutyl, 3-hydroxybutyl (meth) acrylate, and 4-hydroxybutyl (meth) acrylate. Among the hydroxyl group-containing monomers, 2-hydroxyethyl (meth) acrylate is preferred from the viewpoint of hydroxyl reactivity and copolymerization. A hydroxyl-containing monomer may be used independently and may be used in combination of 2 or more type.
 エポキシ基を有するアクリル酸エステルとしては、例えば、グリシジルアクリレート、及びグリシジルメタクリレート等が挙げられる。 Examples of the acrylate ester having an epoxy group include glycidyl acrylate and glycidyl methacrylate.
 アクリル系共重合体における主たるモノマーが1種の特定の(メタ)アクリル酸アルキルエステル(好ましくはアクリル酸2-エチルヘキシル)である場合、この主たるモノマー以外のその他の共重合体成分としては、アルキル基の炭素数が2以上20以下の(メタ)アクリル酸アルキルエステルが挙げられる。(メタ)アクリル酸アルキルエステルとしては、例えば、(メタ)アクリル酸エチル、(メタ)アクリル酸プロピル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸n-ペンチル、(メタ)アクリル酸n-ヘキシル、メタクリル酸2-エチルヘキシル、(メタ)アクリル酸イソオクチル、(メタ)アクリル酸n-デシル、(メタ)アクリル酸n-ドデシル、(メタ)アクリル酸ミリスチル、(メタ)アクリル酸パルミチル、及び(メタ)アクリル酸ステアリル等が挙げられる。これらの(メタ)アクリル酸アルキルエステルの中でも、粘着性をより向上させる観点から、アルキル基の炭素数が2以上4以下の(メタ)アクリル酸エステルが好ましく、(メタ)アクリル酸n-ブチルがより好ましい。(メタ)アクリル酸アルキルエステルは、単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 When the main monomer in the acrylic copolymer is one specific (meth) acrylic acid alkyl ester (preferably 2-ethylhexyl acrylate), other copolymer components other than the main monomer include an alkyl group (Meth) acrylic acid alkyl ester having 2 to 20 carbon atoms. Examples of (meth) acrylic acid alkyl esters include, for example, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, n-pentyl (meth) acrylate, and (meth) acrylic acid n. -Hexyl, 2-ethylhexyl methacrylate, isooctyl (meth) acrylate, n-decyl (meth) acrylate, n-dodecyl (meth) acrylate, myristyl (meth) acrylate, palmityl (meth) acrylate, and ( Examples thereof include stearyl methacrylate. Among these (meth) acrylic acid alkyl esters, from the viewpoint of further improving adhesiveness, (meth) acrylic acid esters having an alkyl group with 2 or more and 4 or less carbon atoms are preferred, and (meth) acrylic acid n-butyl is preferred. More preferred. The (meth) acrylic acid alkyl ester may be used alone or in combination of two or more.
 アクリル系共重合体におけるその他の共重合体成分としては、例えば、アルコキシアルキル基含有(メタ)アクリル酸エステル、脂肪族環を有する(メタ)アクリル酸エステル、芳香族環を有する(メタ)アクリル酸エステル、非架橋性のアクリルアミド、非架橋性の3級アミノ基を有する(メタ)アクリル酸エステル、酢酸ビニル、及びスチレンからなる群から選択される少なくともいずれかのモノマーに由来する共重合体成分が挙げられる。
 アルコキシアルキル基含有(メタ)アクリル酸エステルとしては、例えば、(メタ)アクリル酸メトキシメチル、(メタ)アクリル酸メトキシエチル、(メタ)アクリル酸エトキシメチル、及び(メタ)アクリル酸エトキシエチルが挙げられる。
 脂肪族環を有する(メタ)アクリル酸エステルとしては、例えば、(メタ)アクリル酸シクロヘキシルが挙げられる。
 芳香族環を有する(メタ)アクリル酸エステルとしては、例えば、(メタ)アクリル酸フェニルが挙げられる。
 非架橋性のアクリルアミドとしては、例えば、アクリルアミド、及びメタクリルアミドが挙げられる。
 非架橋性の3級アミノ基を有する(メタ)アクリル酸エステルとしては、例えば、(メタ)アクリル酸(N,N-ジメチルアミノ)エチル、及び(メタ)アクリル酸(N,N-ジメチルアミノ)プロピルが挙げられる。
 アクリル系共重合体におけるその他の共重合体成分としては、粘着剤の極性を向上させ、密着性及び粘着力を向上させる観点から、窒素原子含有環を有するモノマーに由来する共重合体成分も好ましい。
 窒素原子含有環を有するモノマーとしては、N-ビニル-2-ピロリドン、N-メチルビニルピロリドン、N-ビニルピペリドン、N-ビニルピペラジン、N-ビニルピラジン、N-ビニルピロール、N-ビニルイミダゾール、N-ビニルモルホリン、N-ビニルカプロラクタム、及びN-(メタ)アクリロイルモルホリン等が挙げられる。窒素原子含有環を有するモノマーとしては、N-(メタ)アクリロイルモルホリンが好ましい。
 これらのモノマーは単独で用いてもよいし、2種以上を組み合わせて用いてもよい。
Other copolymer components in the acrylic copolymer include, for example, alkoxyalkyl group-containing (meth) acrylic acid ester, (meth) acrylic acid ester having an aliphatic ring, and (meth) acrylic acid having an aromatic ring. A copolymer component derived from at least one monomer selected from the group consisting of an ester, a non-crosslinkable acrylamide, a (meth) acrylic acid ester having a non-crosslinkable tertiary amino group, vinyl acetate, and styrene; Can be mentioned.
Examples of the alkoxyalkyl group-containing (meth) acrylic acid ester include methoxymethyl (meth) acrylate, methoxyethyl (meth) acrylate, ethoxymethyl (meth) acrylate, and ethoxyethyl (meth) acrylate. .
Examples of the (meth) acrylic acid ester having an aliphatic ring include cyclohexyl (meth) acrylate.
Examples of the (meth) acrylic acid ester having an aromatic ring include phenyl (meth) acrylate.
Examples of the non-crosslinkable acrylamide include acrylamide and methacrylamide.
Examples of the (meth) acrylic acid ester having a non-crosslinkable tertiary amino group include (meth) acrylic acid (N, N-dimethylamino) ethyl and (meth) acrylic acid (N, N-dimethylamino). Propyl.
As the other copolymer component in the acrylic copolymer, a copolymer component derived from a monomer having a nitrogen atom-containing ring is also preferable from the viewpoint of improving the polarity of the pressure-sensitive adhesive and improving the adhesion and adhesive force. .
Examples of monomers having a nitrogen atom-containing ring include N-vinyl-2-pyrrolidone, N-methylvinylpyrrolidone, N-vinylpiperidone, N-vinylpiperazine, N-vinylpyrazine, N-vinylpyrrole, N-vinylimidazole, N- Examples include vinyl morpholine, N-vinyl caprolactam, and N- (meth) acryloyl morpholine. As the monomer having a nitrogen atom-containing ring, N- (meth) acryloylmorpholine is preferable.
These monomers may be used independently and may be used in combination of 2 or more type.
 本実施形態においては、第二の共重合体成分として、カルボキシル基含有モノマーまたは水酸基含有モノマーが好ましく、アクリル酸がより好ましい。アクリル系共重合体が、アクリル酸2-エチルヘキシル由来の共重合体成分、及びアクリル酸由来の共重合体成分を含む場合、アクリル系共重合体全体の質量に占めるアクリル酸由来の共重合体成分の質量の割合が1質量%以下であることが好ましく、0.1質量%以上0.5質量%以下であることがより好ましい。アクリル酸の割合が1質量%以下であれば、粘着剤組成物に架橋剤が含まれる場合にアクリル系共重合体の架橋が早く進行し過ぎることを防止できる。 In the present embodiment, a carboxyl group-containing monomer or a hydroxyl group-containing monomer is preferable as the second copolymer component, and acrylic acid is more preferable. When the acrylic copolymer includes a copolymer component derived from 2-ethylhexyl acrylate and a copolymer component derived from acrylic acid, the copolymer component derived from acrylic acid occupies the total mass of the acrylic copolymer. The mass ratio is preferably 1% by mass or less, and more preferably 0.1% by mass or more and 0.5% by mass or less. If the ratio of acrylic acid is 1 mass% or less, when an adhesive composition contains a crosslinking agent, crosslinking of the acrylic copolymer can be prevented from proceeding too quickly.
 アクリル系共重合体は、2種類以上の官能基含有モノマー由来の共重合体成分を含んでいてもよい。例えば、アクリル系共重合体は、3元系共重合体であってもよい。アクリル系共重合体が3元系共重合体である場合、アクリル酸2-エチルヘキシル、カルボキシル基含有モノマー及び水酸基含有モノマーを共重合して得られるアクリル系共重合体が好ましく、このカルボキシル基含有モノマーは、アクリル酸であることが好ましく、水酸基含有モノマーは、アクリル酸2-ヒドロキシエチルであることが好ましい。アクリル系共重合体におけるアクリル酸2-エチルヘキシルに由来する共重合体成分の割合が80質量%以上95質量%以下であり、アクリル酸由来の共重合体成分の質量の割合が1質量%以下であり、残部がアクリル酸2-ヒドロキシエチル由来の共重合体成分であることが好ましい。 The acrylic copolymer may contain a copolymer component derived from two or more kinds of functional group-containing monomers. For example, the acrylic copolymer may be a ternary copolymer. When the acrylic copolymer is a ternary copolymer, an acrylic copolymer obtained by copolymerizing 2-ethylhexyl acrylate, a carboxyl group-containing monomer and a hydroxyl group-containing monomer is preferred, and this carboxyl group-containing monomer is preferred. Is preferably acrylic acid, and the hydroxyl group-containing monomer is preferably 2-hydroxyethyl acrylate. The ratio of the copolymer component derived from 2-ethylhexyl acrylate in the acrylic copolymer is 80% by mass or more and 95% by mass or less, and the ratio of the mass of the copolymer component derived from acrylic acid is 1% by mass or less. And the balance is preferably a copolymer component derived from 2-hydroxyethyl acrylate.
 アクリル系共重合体の重量平均分子量(Mw)は、30万以上200万以下であることが好ましく、60万以上150万以下であることがより好ましく、80万以上120万以下であることがさらに好ましい。アクリル系共重合体の重量平均分子量Mwが30万以上であれば、被着体への粘着剤の残渣なく剥離することができる。アクリル系共重合体の重量平均分子量Mwが200万以下であれば、被着体へ確実に貼り付けることができる。
 アクリル系共重合体の重量平均分子量Mwは、ゲル・パーミエーション・クロマトグラフィー(Gel Permeation Chromatography;GPC)法により測定される標準ポリスチレン換算値である。
The weight average molecular weight (Mw) of the acrylic copolymer is preferably from 300,000 to 2,000,000, more preferably from 600,000 to 1,500,000, and more preferably from 800,000 to 1,200,000. preferable. If the weight average molecular weight Mw of the acrylic copolymer is 300,000 or more, the acrylic copolymer can be peeled without a residue of the pressure-sensitive adhesive on the adherend. When the weight average molecular weight Mw of the acrylic copolymer is 2 million or less, it can be reliably attached to the adherend.
The weight average molecular weight Mw of the acrylic copolymer is a standard polystyrene equivalent value measured by a gel permeation chromatography (GPC) method.
 アクリル系共重合体は、前述の各種原料モノマーを用いて、従来公知の方法に従って製造することができる。 The acrylic copolymer can be produced according to a conventionally known method using the above-mentioned various raw material monomers.
 アクリル系共重合体の共重合の形態は、特に限定されず、ブロック共重合体、ランダム共重合体、またはグラフト共重合体のいずれでもよい。
 本実施形態において、粘着剤組成物中のアクリル系共重合体の含有率は、40質量%以上90質量%以下であることが好ましく、50質量%以上90質量%以下であることがより好ましい。
The form of copolymerization of the acrylic copolymer is not particularly limited, and any of a block copolymer, a random copolymer, and a graft copolymer may be used.
In the present embodiment, the content of the acrylic copolymer in the pressure-sensitive adhesive composition is preferably 40% by mass or more and 90% by mass or less, and more preferably 50% by mass or more and 90% by mass or less.
 粘着助剤は、反応性基を有するゴム系材料を主成分として含むことが好ましい。粘着剤組成物が反応性粘着助剤を含んでいると、糊残りを減少させることができる。粘着剤組成物中の粘着助剤の含有率は、3質量%以上50質量%以下であることが好ましく、5質量%以上30質量%以下であることがより好ましい。粘着剤組成物中の粘着助剤の含有率が3質量%以上であれば、糊残りの発生を抑制でき、50質量%以下であれば粘着力の低下を抑制できる。
 本明細書において、反応性基を有するゴム系材料を主成分として含むとは、粘着助剤全体の質量に占める反応性基を有するゴム系材料の質量の割合が50質量%を超えることを意味する。本実施形態においては、粘着助剤における反応性基を有するゴム系材料の割合は、50質量%超であることが好ましく、80質量%以上であることがより好ましい。粘着助剤が実質的に反応性基を有するゴム系材料からなることも好ましい。
The adhesion aid preferably contains a rubber-based material having a reactive group as a main component. If the pressure-sensitive adhesive composition contains a reactive pressure-sensitive adhesive aid, the adhesive residue can be reduced. The content of the adhesion assistant in the pressure-sensitive adhesive composition is preferably 3% by mass or more and 50% by mass or less, and more preferably 5% by mass or more and 30% by mass or less. If the content rate of the adhesion promoter in an adhesive composition is 3 mass% or more, generation | occurrence | production of adhesive residue can be suppressed, and if it is 50 mass% or less, the fall of adhesive force can be suppressed.
In the present specification, including a rubber-based material having a reactive group as a main component means that the proportion of the mass of the rubber-based material having a reactive group in the total mass of the adhesive aid exceeds 50% by mass. To do. In the present embodiment, the ratio of the rubber-based material having a reactive group in the adhesion assistant is preferably more than 50% by mass, and more preferably 80% by mass or more. It is also preferable that the adhesion assistant is made of a rubber-based material having a substantially reactive group.
 反応性基としては、水酸基、イソシアネート基、アミノ基、オキシラン基、酸無水物基、アルコキシ基、アクリロイル基及びメタクリロイル基からなる群より選択される一種以上の官能基であることが好ましく、水酸基であることがより好ましい。ゴム系材料が有する反応性基は、1種類でも、2種類以上でもよい。水酸基を有するゴム系材料は、さらに前述の反応性基を有していてもよい。また、反応性基の数は、ゴム系材料を構成する1分子中に1つでも、2つ以上でもよい。 The reactive group is preferably one or more functional groups selected from the group consisting of a hydroxyl group, an isocyanate group, an amino group, an oxirane group, an acid anhydride group, an alkoxy group, an acryloyl group, and a methacryloyl group. More preferably. The reactive group possessed by the rubber material may be one type or two or more types. The rubber-based material having a hydroxyl group may further have the aforementioned reactive group. In addition, the number of reactive groups may be one per molecule constituting the rubber-based material, or two or more.
 ゴム系材料としては、特に限定されないが、ポリブタジエン系樹脂、及びポリブタジエン系樹脂の水素添加物が好ましく、ポリブタジエン系樹脂の水素添加物がより好ましい。
 ポリブタジエン系樹脂としては、1,4-繰り返し単位を有する樹脂、1,2-繰り返し単位を有する樹脂、並びに1,4-繰り返し単位及び1,2-繰り返し単位の両方を有する樹脂が挙げられる。本実施形態のポリブタジエン系樹脂の水素添加物は、これらの繰り返し単位を有する樹脂の水素化物も含む。
The rubber-based material is not particularly limited, but a polybutadiene-based resin and a hydrogenated product of a polybutadiene-based resin are preferable, and a hydrogenated product of a polybutadiene-based resin is more preferable.
Examples of the polybutadiene-based resin include resins having 1,4-repeat units, resins having 1,2-repeat units, and resins having both 1,4-repeat units and 1,2-repeat units. The hydrogenated product of the polybutadiene resin of the present embodiment includes a hydride of a resin having these repeating units.
 ポリブタジエン系樹脂、及びポリブタジエン系樹脂の水素添加物は、両末端にそれぞれ反応性基を有することが好ましい。両末端の反応性基は、同一でも異なっていてもよい。両末端の反応性基は、水酸基、イソシアネート基、アミノ基、オキシラン基、酸無水物基、アルコキシ基、アクリロイル基及びメタクリロイル基からなる群より選択される一種以上の官能基であることが好ましく、水酸基であることがより好ましい。ポリブタジエン系樹脂、及びポリブタジエン系樹脂の水素添加物においては、両末端が水酸基であることがより好ましい。 The polybutadiene resin and the hydrogenated product of the polybutadiene resin preferably have reactive groups at both ends. The reactive groups at both ends may be the same or different. The reactive groups at both ends are preferably one or more functional groups selected from the group consisting of a hydroxyl group, an isocyanate group, an amino group, an oxirane group, an acid anhydride group, an alkoxy group, an acryloyl group, and a methacryloyl group. More preferably, it is a hydroxyl group. In the polybutadiene resin and the hydrogenated product of the polybutadiene resin, it is more preferable that both ends are hydroxyl groups.
 本実施形態に係る粘着剤組成物は、前述のアクリル系共重合体及び粘着助剤の他に、さらに架橋剤を配合した組成物を架橋させて得られる架橋物を含むことも好ましい。また、粘着剤組成物の固形分は、実質的に、前述のアクリル系共重合体と、粘着助剤と、架橋剤とを架橋させて得られる架橋物からなることも好ましい。ここで、実質的にとは、不可避的に粘着剤に混入してしまうような微量な不純物を除いて、粘着剤組成物の固形分が当該架橋物だけからなることを意味する。 The pressure-sensitive adhesive composition according to the present embodiment preferably contains a cross-linked product obtained by cross-linking a composition containing a cross-linking agent in addition to the acrylic copolymer and the pressure-sensitive adhesive aid. Moreover, it is preferable that the solid content of the pressure-sensitive adhesive composition is substantially composed of a cross-linked product obtained by cross-linking the above-mentioned acrylic copolymer, a pressure-sensitive adhesive aid, and a cross-linking agent. Here, “substantially” means that the solid content of the pressure-sensitive adhesive composition is composed only of the cross-linked product, excluding trace amounts of impurities that are inevitably mixed in the pressure-sensitive adhesive.
 本実施形態において、架橋剤としては、例えば、イソシアネート系架橋剤、エポキシ系架橋剤、アジリジン系架橋剤、金属キレート系架橋剤、アミン系架橋剤、及びアミノ樹脂系架橋剤が挙げられる。これらの架橋剤は、単独で用いてもよいし、2種以上を組み合わせて用いてもよい。
 本実施形態において、粘着剤組成物の耐熱性及び粘着力を向上させる観点から、これら架橋剤の中でも、イソシアネート基を有する化合物を主成分として含有する架橋剤(イソシアネート系架橋剤)が好ましい。イソシアネート系架橋剤としては、例えば、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、1,3-キシリレンジイソシアネート、1,4-キシリレンジイソシアネート、ジフェニルメタン-4,4’-ジイソシアネート、ジフェニルメタン-2,4’-ジイソシアネート、3-メチルジフェニルメタンジイソシアネート、ヘキサメチレンジイソシアネート、イソホロンジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアネート、ジシクロヘキシルメタン-2,4’-ジイソシアネート、及びリジンイソシアネート等の多価イソシアネート化合物が挙げられる。
 また、多価イソシアネート化合物は、トリメチロールプロパンアダクト型変性体、水と反応させたビュウレット型変性体、またはイソシアヌレート環を有するイソシアヌレート型変性体であってもよい。
 本明細書において、イソシアネート基を有する化合物を主成分とする架橋剤とは、架橋剤を構成する成分全体の質量に占めるイソシアネート基を有する化合物の質量の割合が50質量%以上であることを意味する。
In the present embodiment, examples of the crosslinking agent include an isocyanate crosslinking agent, an epoxy crosslinking agent, an aziridine crosslinking agent, a metal chelate crosslinking agent, an amine crosslinking agent, and an amino resin crosslinking agent. These cross-linking agents may be used alone or in combination of two or more.
In the present embodiment, from the viewpoint of improving the heat resistance and adhesive strength of the pressure-sensitive adhesive composition, among these crosslinking agents, a crosslinking agent (isocyanate-based crosslinking agent) containing a compound having an isocyanate group as a main component is preferable. Examples of the isocyanate crosslinking agent include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylylene diisocyanate, 1,4-xylylene diisocyanate, diphenylmethane-4,4′-diisocyanate, Polyvalent isocyanates such as diphenylmethane-2,4'-diisocyanate, 3-methyldiphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, dicyclohexylmethane-2,4'-diisocyanate, and lysine isocyanate Compounds.
The polyisocyanate compound may be a trimethylolpropane adduct-type modified product, a burette-type modified product reacted with water, or an isocyanurate-type modified product having an isocyanurate ring.
In the present specification, the term “crosslinking agent whose main component is a compound having an isocyanate group” means that the proportion of the compound having an isocyanate group in the total mass of the components constituting the crosslinking agent is 50% by mass or more. To do.
 本実施形態において、粘着剤組成物中の架橋剤の含有量は、アクリル系共重合体100質量部に対して、好ましくは0.1質量部以上20質量部以下、より好ましくは1質量部以上15質量部以下、さらに好ましくは5質量部以上10質量部以下である。粘着剤組成物中の架橋剤の含有量がこのような範囲内であれば、粘着剤組成物を含む層(粘着剤層)と被着体(例えば、基材)との接着性を向上させることができ、粘着シートの製造後に粘着特性を安定化させるための養生期間を短縮できる。 In the present embodiment, the content of the crosslinking agent in the pressure-sensitive adhesive composition is preferably 0.1 parts by mass or more and 20 parts by mass or less, more preferably 1 part by mass or more with respect to 100 parts by mass of the acrylic copolymer. 15 parts by mass or less, more preferably 5 parts by mass or more and 10 parts by mass or less. If content of the crosslinking agent in an adhesive composition is in such a range, the adhesiveness of the layer (adhesive layer) containing an adhesive composition and a to-be-adhered body (for example, base material) will be improved. It is possible to shorten the curing period for stabilizing the adhesive property after the production of the adhesive sheet.
 本実施形態においては、粘着剤組成物の耐熱性の観点から、イソシアネート系架橋剤は、イソシアヌレート環を有する化合物(イソシアヌレート型変性体)であることがさらに好ましい。イソシアヌレート環を有する化合物は、アクリル系共重合体の水酸基当量に対して、0.7当量以上1.5当量以下配合されていることが好ましい。イソシアヌレート環を有する化合物の配合量が0.7当量以上であれば、加熱後に粘着力が高くなり過ぎず、粘着シート10を剥離し易くなり、糊残りを減少させることができる。イソシアヌレート環を有する化合物の配合量が1.5当量以下であれば、初期粘着力が低くなり過ぎることを防止したり、貼付性の低下を防止したりすることができる。 In the present embodiment, from the viewpoint of heat resistance of the pressure-sensitive adhesive composition, the isocyanate-based crosslinking agent is more preferably a compound having an isocyanurate ring (isocyanurate-type modified product). The compound having an isocyanurate ring is preferably blended in an amount of 0.7 to 1.5 equivalents relative to the hydroxyl equivalent of the acrylic copolymer. If the compounding quantity of the compound which has an isocyanurate ring is 0.7 equivalent or more, adhesive force will not become high too high after a heating, it will become easy to peel the adhesive sheet 10, and adhesive residue can be reduced. If the compounding quantity of the compound which has an isocyanurate ring is 1.5 equivalent or less, it can prevent that an initial stage adhesive force becomes low too much, or can prevent a sticking fall.
 本実施形態における粘着剤組成物が架橋剤を含む場合、粘着剤組成物は、架橋促進剤をさらに含むことが好ましい。架橋促進剤は、架橋剤の種類等に応じて、適宜選択して用いることが好ましい。例えば、粘着剤組成物が、架橋剤としてポリイソシアネート化合物を含む場合には、有機スズ化合物等の有機金属化合物系の架橋促進剤をさらに含むことが好ましい。 When the pressure-sensitive adhesive composition in this embodiment contains a crosslinking agent, the pressure-sensitive adhesive composition preferably further contains a crosslinking accelerator. The crosslinking accelerator is preferably selected and used as appropriate according to the type of the crosslinking agent. For example, when the pressure-sensitive adhesive composition contains a polyisocyanate compound as a crosslinking agent, it is preferable to further contain an organic metal compound-based crosslinking accelerator such as an organic tin compound.
・シリコーン系粘着剤組成物
 粘着剤層がシリコーン系粘着剤組成物を含む場合、シリコーン系粘着剤組成物は、付加重合型シリコーン樹脂を含むことが好ましい。本明細書において、付加重合型シリコーン樹脂を含むシリコーン系粘着剤組成物を付加反応型シリコーン系粘着剤組成物と称する。
-Silicone-type adhesive composition When an adhesive layer contains a silicone-type adhesive composition, it is preferable that a silicone-type adhesive composition contains an addition polymerization type silicone resin. In the present specification, a silicone pressure-sensitive adhesive composition containing an addition polymerization type silicone resin is referred to as an addition reaction type silicone pressure-sensitive adhesive composition.
 付加反応型シリコーン系粘着剤組成物は、主剤、及び架橋剤を含有する。付加反応型シリコーン系粘着剤組成物は、低温での一次硬化だけで使用することが可能で、高温での2次硬化を必要としないという利点がある。ちなみに、従来の過酸化物硬化型シリコーン系粘着剤は150℃以上のような高温での2次硬化を必要とする。
 したがって、付加反応型シリコーン系粘着剤組成物を用いることにより、比較的低温での粘着シートの製造が可能となり、エネルギー経済性に優れており、かつ、比較的耐熱性の低い基材を用いて粘着シートを製造することも可能となる。また、過酸化物硬化型シリコーン系粘着剤のように硬化時に副生物を生じないので、臭気及び腐食等の問題もない。
The addition reaction type silicone pressure-sensitive adhesive composition contains a main agent and a crosslinking agent. The addition reaction type silicone pressure-sensitive adhesive composition can be used only by primary curing at a low temperature, and has an advantage that secondary curing at a high temperature is not required. Incidentally, the conventional peroxide-curing silicone pressure-sensitive adhesive requires secondary curing at a high temperature such as 150 ° C. or higher.
Therefore, by using an addition reaction type silicone pressure-sensitive adhesive composition, it becomes possible to produce a pressure-sensitive adhesive sheet at a relatively low temperature, using a base material having excellent energy economy and relatively low heat resistance. It is also possible to produce an adhesive sheet. Further, since no by-product is produced during curing unlike the peroxide-curing silicone pressure-sensitive adhesive, there are no problems such as odor and corrosion.
 付加反応型シリコーン系粘着剤組成物は、通常、シリコーン樹脂成分とシリコーンゴム成分との混合物からなる主剤、及びヒドロシリル基(SiH基)含有の架橋剤、並びに必要に応じて使用される硬化触媒からなる。
 シリコーン樹脂成分は、オルガノクロルシランまたはオルガノアルコキシシランを加水分解した後、脱水縮合反応を行うことにより得られる網状構造のオルガノポリシロキサンである。
 シリコーンゴム成分は、直鎖構造を有するジオルガノポリシロキサンである。
 シリコーン樹脂成分、及びシリコーンゴム成分におけるオルガノ基としては、メチル基、エチル基、プロピル基、ブチル基、フェニル基等が挙げられる。前述のオルガノ基は、一部、ビニル基、ヘキセニル基、アリル基、ブテニル基、ペンテニル基、オクテニル基、(メタ)アクリロイル基、(メタ)アクリロイルメチル基、(メタ)アクリロイルプロピル基、及びシクロヘキセニル基のような不飽和基に置換されていてもよい。工業的に入手が容易なビニル基を有するオルガノ基が好ましい。付加反応型シリコーン系粘着剤組成物においては、不飽和基とヒドロシリル基との付加反応によって架橋が進行して網状の構造が形成され、粘着性が発現する。
 ビニル基のような不飽和基の数は、オルガノ基100個に対して、通常0.05個以上3.0個以下、好ましくは、0.1個以上2.5個以下である。オルガノ基100個に対する不飽和基の数を0.05個以上とすることにより、ヒドロシリル基との反応性が低下して硬化しにくくなるのを防止して適度な粘着力を付与することができる。オルガノ基100個に対する不飽和基の数を3.0個以下とすることにより、粘着剤の架橋密度が高くなり粘着力及び凝集力が大きくなって被着面に悪影響を与えるのを防止する。
The addition reaction type silicone pressure-sensitive adhesive composition is usually composed of a main agent composed of a mixture of a silicone resin component and a silicone rubber component, a hydrosilyl group (SiH group) -containing crosslinking agent, and a curing catalyst used as necessary. Become.
The silicone resin component is an organopolysiloxane having a network structure obtained by hydrolyzing organochlorosilane or organoalkoxysilane and then performing a dehydration condensation reaction.
The silicone rubber component is a diorganopolysiloxane having a linear structure.
Examples of the organo group in the silicone resin component and the silicone rubber component include a methyl group, an ethyl group, a propyl group, a butyl group, and a phenyl group. The aforementioned organo groups are partially vinyl, hexenyl, allyl, butenyl, pentenyl, octenyl, (meth) acryloyl, (meth) acryloylmethyl, (meth) acryloylpropyl, and cyclohexenyl. It may be substituted with an unsaturated group such as a group. An organo group having a vinyl group that is easily available industrially is preferred. In the addition-reaction type silicone pressure-sensitive adhesive composition, crosslinking proceeds by an addition reaction between an unsaturated group and a hydrosilyl group to form a network structure, thereby exhibiting adhesiveness.
The number of unsaturated groups such as vinyl groups is usually 0.05 or more and 3.0 or less, preferably 0.1 or more and 2.5 or less, per 100 organo groups. By setting the number of unsaturated groups to 100 or more organo groups to 0.05 or more, it is possible to prevent the reactivity with the hydrosilyl group from being lowered and difficult to cure, and to impart an appropriate adhesive force. . By setting the number of unsaturated groups per 100 organo groups to 3.0 or less, the crosslinking density of the pressure-sensitive adhesive is increased, and the adhesive force and cohesive force are increased, thereby preventing adverse effects on the adherend surface.
 前述のようなオルガノポリシロキサンとしては、具体的には、信越化学工業社製のKS-3703(ビニル基の数がメチル基100個に対して0.6個であるもの)、東レ・ダウコーニング社製のBY23-753(ビニル基の数がメチル基100個に対して0.1個であるもの)及びBY24-162(ビニル基の数がメチル基100個に対して1.4個であるもの)等がある。また、東レ・ダウコーニング社製のSD4560PSA、SD4570PSA、SD4580PSA、SD4584PSA、SD4585PSA、SD4587L、及びSD4592PSA等も使用することができる。
 前述のように、シリコーン樹脂成分であるオルガノポリシロキサンは、通常、シリコーンゴム成分と混合して使用されるが、シリコーンゴム成分としては、信越化学工業社製のKS-3800(ビニル基の数がメチル基100個に対して7.6個であるもの)、東レ・ダウコーニング社製のBY24-162(ビニル基の数がメチル基100個に対して1.4個であるもの)、BY24-843(不飽和基を有していない)及びSD-7292(ビニル基の数がメチル基100個に対して5.0個であるもの)等が挙げられる。
 前述のような付加反応型シリコーンの具体例は、例えば、特開平10-219229号公報に記載されている。
Specific examples of the organopolysiloxane described above include KS-3703 manufactured by Shin-Etsu Chemical Co., Ltd. (the number of vinyl groups is 0.6 with respect to 100 methyl groups), Toray Dow Corning BY23-753 manufactured by the company (the number of vinyl groups is 0.1 per 100 methyl groups) and BY24-162 (the number of vinyl groups is 1.4 per 100 methyl groups) )). In addition, SD4560PSA, SD4570PSA, SD4580PSA, SD4584PSA, SD4585PSA, SD4587L, and SD4592PSA manufactured by Toray Dow Corning can also be used.
As described above, organopolysiloxane, which is a silicone resin component, is usually used in a mixture with a silicone rubber component. As the silicone rubber component, KS-3800 (manufactured by Shin-Etsu Chemical Co., Ltd.) 7.6 for 100 methyl groups), BY24-162 made by Toray Dow Corning (number of vinyl groups is 1.4 for 100 methyl groups), BY24- 843 (having no unsaturated group) and SD-7292 (the number of vinyl groups is 5.0 with respect to 100 methyl groups).
Specific examples of the addition reaction type silicone as described above are described, for example, in JP-A-10-219229.
 架橋剤は、シリコーン樹脂成分及びシリコーンゴム成分のビニル基のような不飽和基1個に対して、通常、ケイ素原子に結合した水素原子0.5個以上10個以下、好ましくは、1個以上2.5個以下になるように配合する。0.5個以上とすることにより、ビニル基のような不飽和基とヒドロシリル基との反応が完全には進行せずに硬化不良となるのを防止する。10個以下とすることにより、架橋剤が未反応で残存して被着面に悪影響を与えるのを防止する。 The crosslinking agent is usually 0.5 to 10 hydrogen atoms bonded to silicon atoms, preferably 1 or more to one unsaturated group such as a vinyl group of the silicone resin component and the silicone rubber component. It mix | blends so that it may become 2.5 or less. By setting the number to 0.5 or more, the reaction between the unsaturated group such as a vinyl group and the hydrosilyl group does not proceed completely, thereby preventing poor curing. By setting the number to 10 or less, it is possible to prevent the crosslinking agent from remaining unreacted and adversely affecting the adherend surface.
 付加反応型シリコーン系粘着剤組成物は、前述の付加反応型シリコーン成分(シリコーン樹脂成分とシリコーンゴム成分とからなる主剤)、及び架橋剤とともに、硬化触媒を含有していることも好ましい。
 この硬化触媒は、シリコーン樹脂成分及びシリコーンゴム成分中の不飽和基と架橋剤中のSi-H基とのヒドロシリル化反応を促進させるために使用される。
 硬化触媒としては、白金系の触媒、すなわち、塩化白金酸、塩化白金酸のアルコール溶液、塩化白金酸とアルコール溶液との反応物、塩化白金酸とオレフィン化合物との反応物、塩化白金酸とビニル基含有シロキサン化合物との反応物、白金-オレフィン錯体、白金-ビニル基含有シロキサン錯体、及び白金-リン錯体等が挙げられる。前述のような硬化触媒の具体例は、例えば、特開2006-28311号公報及び特開平10-147758号公報に記載されている。
 より具体的には、市販品として東レ・ダウコーニング社製のSRX-212、及び信越化学工業社製のPL-50T等が挙げられる。
The addition reaction type silicone pressure-sensitive adhesive composition preferably contains a curing catalyst together with the above addition reaction type silicone component (main agent comprising a silicone resin component and a silicone rubber component) and a crosslinking agent.
This curing catalyst is used to accelerate the hydrosilylation reaction between the unsaturated group in the silicone resin component and the silicone rubber component and the Si—H group in the crosslinking agent.
As a curing catalyst, platinum-based catalysts, that is, chloroplatinic acid, an alcohol solution of chloroplatinic acid, a reaction product of chloroplatinic acid and an alcohol solution, a reaction product of chloroplatinic acid and an olefin compound, chloroplatinic acid and vinyl Examples thereof include a reaction product with a group-containing siloxane compound, a platinum-olefin complex, a platinum-vinyl group-containing siloxane complex, and a platinum-phosphorus complex. Specific examples of the curing catalyst as described above are described in, for example, JP-A-2006-28311 and JP-A-10-147758.
More specifically, commercially available products include SRX-212 manufactured by Toray Dow Corning, and PL-50T manufactured by Shin-Etsu Chemical Co., Ltd.
 硬化触媒の配合量は白金分として、シリコーン樹脂成分とシリコーンゴム成分の合計量に対して、通常、5質量ppm以上2000質量ppm以下、好ましくは、10質量ppm以上500質量ppm以下である。5質量ppm以上とすることにより、硬化性が低下して架橋密度の低下、すなわち、粘着力及び凝集力(保持力)が低下するのを防ぎ、2000質量ppm以下とすることにより、コストアップを防ぐとともに粘着剤層の安定性を保持することができ、かつ、過剰に使用された硬化触媒が被着面に悪影響を与えるのを防止する。 The blending amount of the curing catalyst is usually 5 mass ppm or more and 2000 mass ppm or less, preferably 10 mass ppm or more and 500 mass ppm or less with respect to the total amount of the silicone resin component and the silicone rubber component as platinum content. By setting the content to 5 mass ppm or more, curability is lowered and the crosslinking density is reduced, that is, the adhesive force and the cohesive force (holding force) are prevented from being reduced. While preventing, the stability of an adhesive layer can be hold | maintained, and it prevents that the curing catalyst used excessively has a bad influence on a to-be-adhered surface.
 付加反応型シリコーン系粘着剤組成物においては、前述の各成分を配合することにより常温(25℃)でも粘着力が発現するが、付加反応型シリコーン系粘着剤組成物を基材11または後記する剥離シートに塗布し、基材と剥離シートとを貼り合わせた後、加熱または活性エネルギー線を照射してシリコーン樹脂成分とシリコーンゴム成分の架橋剤による架橋反応を促進させることが粘着力の安定性の面から好ましい。 In the addition reaction type silicone pressure-sensitive adhesive composition, an adhesive force is exhibited even at room temperature (25 ° C.) by blending the above-mentioned components, but the addition reaction type silicone pressure-sensitive adhesive composition will be described later on the substrate 11 or later. Applying to a release sheet, bonding the substrate and release sheet, and then heating or irradiating active energy rays to promote the crosslinking reaction of the silicone resin component and the silicone rubber component by the crosslinking agent, stability of adhesive strength From the viewpoint of
 加熱で架橋反応を促進させる場合の加熱温度は通常は、60℃以上140℃以下、好ましくは、80℃以上130℃以下である。60℃以上で加熱することにより、シリコーン樹脂成分とシリコーンゴム成分の架橋が不足し、粘着力が不十分になるのを防止し、140℃以下で加熱することにより基材に熱収縮しわが生じたり、劣化したり、変色したりするのを防止することができる。 When the crosslinking reaction is accelerated by heating, the heating temperature is usually 60 ° C. or higher and 140 ° C. or lower, preferably 80 ° C. or higher and 130 ° C. or lower. Heating at 60 ° C. or higher prevents insufficient crosslinking between the silicone resin component and the silicone rubber component and prevents the adhesive force from becoming insufficient. Heating at 140 ° C. or lower causes thermal shrinkage and wrinkles on the substrate. , Deterioration or discoloration can be prevented.
 活性エネルギー線を照射して架橋反応を促進させる場合、電磁波または荷電粒子線の中でエネルギー量子を有する活性エネルギー線、すなわち、紫外線等の活性光または電子線等を利用できる。電子線を照射して架橋させる場合、光重合開始剤を必要としないが、紫外線等の活性光を照射して架橋させる場合には、光重合開始剤を存在させることが好ましい。
 紫外線照射させる場合の光重合開始剤としては、特に制限はなく、従来、紫外線硬化型樹脂に慣用されている光重合開始剤の中から、任意の光重合開始剤を適宜選択して用いることができる。この光重合開始剤としては、例えば、ベンゾイン類、ベンゾフェノン類、アセトフェノン類、α-ヒドロキシケトン類、α-アミノケトン類、α-ジケトン類、α-ジケトンジアルキルアセタール類、アントラキノン類、チオキサントン類、及びその他化合物等が挙げられる。
 これらの光重合開始剤は、単独で用いてもよく、二種以上を組み合わせて用いてもよい。また、その使用量は、主剤として用いられる前記付加反応型シリコーン成分と架橋剤との合計量100質量部に対し、通常、0.01質量部以上30質量部以下、好ましくは0.05質量部以上20質量部以下の範囲で選定される。
 加熱または活性エネルギー線を照射して架橋することにより、安定した粘着力を有する粘着シートが得られる。
When the active energy ray is irradiated to promote the crosslinking reaction, an active energy ray having energy quanta in an electromagnetic wave or a charged particle beam, that is, an active light such as an ultraviolet ray or an electron beam can be used. In the case of crosslinking by irradiation with an electron beam, a photopolymerization initiator is not required. However, in the case of crosslinking by irradiation with active light such as ultraviolet rays, it is preferable that a photopolymerization initiator is present.
The photopolymerization initiator in the case of ultraviolet irradiation is not particularly limited, and any photopolymerization initiator that has been conventionally used in ultraviolet curable resins can be appropriately selected and used. it can. Examples of the photopolymerization initiator include benzoins, benzophenones, acetophenones, α-hydroxy ketones, α-amino ketones, α-diketones, α-diketone dialkyl acetals, anthraquinones, thioxanthones, and others. Compounds and the like.
These photopolymerization initiators may be used alone or in combination of two or more. The amount used is usually 0.01 parts by mass or more and 30 parts by mass or less, preferably 0.05 parts by mass with respect to 100 parts by mass of the total amount of the addition reaction type silicone component and the crosslinking agent used as the main agent. It is selected in the range of 20 parts by mass or less.
A pressure-sensitive adhesive sheet having stable adhesive strength can be obtained by crosslinking by irradiation with heat or active energy rays.
 活性エネルギー線の一つである電子線を照射して架橋する場合の電子線の加速電圧は、一般的には、130kV以上300kV以下、好ましくは150kV以上250kV以下である。130kV以上の加速電圧で照射することにより、シリコーン樹脂成分とシリコーンゴム成分の架橋が不足し、粘着力が不十分になるのを防ぐことができ、300kV以下の加速電圧で照射することにより粘着剤層12及び基材11が劣化したり変色したりするのを防止することができる。ビーム電流の好ましい範囲は1mA以上100mA以下である。
 照射される電子線の線量は1Mrad以上70Mrad以下が好ましく、2Mrad以上20Mrad以下がより好ましい。1Mrad以上の線量で照射することにより粘着剤層及び基材が劣化したり変色したりするのを防止し、架橋不足による粘着性が不十分になるのを防止することができる。70Mrad以下の線量で照射することにより、粘着剤層が劣化したり変色したりすることによる凝集力の低下を防止し、基材が劣化したり収縮したりするのを防止することができる。
 紫外線照射の場合の照射量としては、適宜選択されるが、光量は、100mJ/cm以上500mJ/cm以下、照度は、10mW/cm以上500mW/cm以下である。
 加熱及び活性エネルギー線の照射は、酸素による反応阻害を防止するため、窒素雰囲気下で行うのが好ましい。
The acceleration voltage of an electron beam in the case of crosslinking by irradiating with an electron beam which is one of active energy rays is generally 130 kV to 300 kV, preferably 150 kV to 250 kV. Irradiation at an acceleration voltage of 130 kV or more can prevent the silicone resin component and the silicone rubber component from being insufficiently crosslinked and prevent the adhesive force from becoming insufficient. It is possible to prevent the layer 12 and the substrate 11 from being deteriorated or discolored. A preferable range of the beam current is 1 mA or more and 100 mA or less.
The dose of the irradiated electron beam is preferably 1 Mrad or more and 70 Mrad or less, and more preferably 2 Mrad or more and 20 Mrad or less. By irradiating with a dose of 1 Mrad or more, it is possible to prevent the pressure-sensitive adhesive layer and the base material from being deteriorated or discolored, and to prevent the adhesiveness from being insufficient due to insufficient crosslinking. By irradiating with a dose of 70 Mrad or less, it is possible to prevent the cohesive force from being lowered due to deterioration or discoloration of the pressure-sensitive adhesive layer, and it is possible to prevent the base material from being deteriorated or contracted.
The irradiation amount in the case of ultraviolet irradiation is appropriately selected. The light amount is from 100 mJ / cm 2 to 500 mJ / cm 2 and the illuminance is from 10 mW / cm 2 to 500 mW / cm 2 .
Heating and irradiation with active energy rays are preferably performed in a nitrogen atmosphere in order to prevent reaction inhibition by oxygen.
・粘着剤層の厚さ
 粘着剤層の厚さは、粘着シートの用途に応じて適宜決定される。本実施形態において、粘着剤層の厚さは、5μm以上60μm以下であることが好ましく、10μm以上50μm以下であることがより好ましい。
 粘着剤層の厚さが5μm以上であると、例えば半導体チップの回路面の凹凸に粘着剤層が追従し易くなる。これにより、粘着剤層及び半導体チップ間に隙間が生じにくくなるので、その隙間に、例えば、層間絶縁材及び封止樹脂等が入り込むことが抑制される。その結果、チップ回路面の配線接続用の電極パッドが塞がれることが抑制される。
 粘着剤層の厚さが60μm以下であると、例えば半導体チップが粘着剤層に沈み込むことが抑制される。これにより、半導体チップ部分と、半導体チップを封止する樹脂部分との段差が生じにくくなり、その結果、再配線の際における配線の断線が抑制される。
-Thickness of an adhesive layer The thickness of an adhesive layer is suitably determined according to the use of an adhesive sheet. In the present embodiment, the thickness of the pressure-sensitive adhesive layer is preferably 5 μm or more and 60 μm or less, and more preferably 10 μm or more and 50 μm or less.
When the thickness of the pressure-sensitive adhesive layer is 5 μm or more, for example, the pressure-sensitive adhesive layer easily follows unevenness on the circuit surface of the semiconductor chip. Thereby, since it becomes difficult to produce a clearance gap between an adhesive layer and a semiconductor chip, it is suppressed that an interlayer insulation material, sealing resin, etc. enter into the clearance gap, for example. As a result, the electrode pad for wiring connection on the chip circuit surface is prevented from being blocked.
When the thickness of the pressure-sensitive adhesive layer is 60 μm or less, for example, the semiconductor chip is suppressed from sinking into the pressure-sensitive adhesive layer. Accordingly, a step between the semiconductor chip portion and the resin portion for sealing the semiconductor chip is less likely to occur, and as a result, disconnection of the wiring during rewiring is suppressed.
・その他の成分
 本実施形態において、粘着剤組成物には、本発明の効果を損なわない範囲で、その他の成分が含まれていてもよい。粘着剤組成物に含まれ得るその他の成分としては、例えば、難燃剤、粘着付与剤、紫外線吸収剤、光安定剤、酸化防止剤、防腐剤、防黴剤、可塑剤、消泡剤、着色剤、フィラー、及び濡れ性調整剤等が挙げられる。
 付加反応型シリコーン系粘着剤組成物には、添加剤として、ポリジメチルシロキサン及びポリメチルフェニルシロキサンのような非反応性のポリオルガノシロキサンが含まれていてもよい。
-Other component In this embodiment, the adhesive composition may contain the other component in the range which does not impair the effect of this invention. Examples of other components that can be included in the pressure-sensitive adhesive composition include flame retardants, tackifiers, ultraviolet absorbers, light stabilizers, antioxidants, antiseptics, antifungal agents, plasticizers, antifoaming agents, and coloring. Agents, fillers, wettability adjusting agents and the like.
The addition reaction type silicone pressure-sensitive adhesive composition may contain non-reactive polyorganosiloxanes such as polydimethylsiloxane and polymethylphenylsiloxane as additives.
〔粘着シートの製造方法〕
 粘着シートの製造方法としては、例えば、基材の第一基材面上に粘着剤組成物を塗布して粘着剤層を形成する方法、基材の第一基材面上に、必要に応じて中間層もしくは導電層を形成するための組成物(例えばオリゴマー封止層用組成物、プライマー層形成用組成物、導電層形成用組成物等)を塗布して中間層もしくは導電層を形成した後、粘着剤組成物を塗布して粘着剤層を形成する方法等が挙げられる。
 剥離シートを有する粘着シートを製造する方法としては、例えば、後述する剥離シート上に粘着剤層を形成し、この剥離シート上の粘着剤層と、基材上に形成された前記オリゴマー封止層もしくは前記導電層とを貼り合わせる方法が挙げられる。
 剥離シートを有する粘着シートの製造方法についての詳細は後述する。
[Method for producing adhesive sheet]
As a manufacturing method of an adhesive sheet, for example, a method of applying an adhesive composition on the first substrate surface of a substrate to form an adhesive layer, on the first substrate surface of the substrate, if necessary Then, an intermediate layer or a conductive layer was formed by applying a composition for forming an intermediate layer or a conductive layer (for example, an oligomer sealing layer composition, a primer layer forming composition, a conductive layer forming composition, etc.). Then, the method of apply | coating an adhesive composition and forming an adhesive layer etc. are mentioned.
As a method for producing a pressure-sensitive adhesive sheet having a release sheet, for example, a pressure-sensitive adhesive layer is formed on a release sheet to be described later, and the pressure-sensitive adhesive layer on the release sheet and the oligomer sealing layer formed on the substrate Or the method of bonding the said conductive layer is mentioned.
The detail about the manufacturing method of the adhesive sheet which has a peeling sheet is mentioned later.
 粘着剤組成物を塗布して粘着剤層を形成する場合には、粘着剤組成物を有機溶媒で希釈して、コーティング液を調製して用いることが好ましい。中間層および導電層を形成する場合も同様である。
 コーティング液の調製に用いる有機溶媒としては、特に限定されない。有機溶媒としては、例えば、芳香族系溶媒、脂肪族系溶媒、エステル系溶媒、ケトン系溶媒、及びアルコール系溶媒が挙げられる。芳香族系溶媒としては、例えば、ベンゼン、トルエン、及びキシレンが挙げられる。脂肪族系溶媒としては、例えば、ノルマルヘキサン、及びノルマルヘプタンが挙げられる。エステル系溶媒としては、例えば、酢酸エチル、及び酢酸ブチルが挙げられる。ケトン系溶媒としては、例えば、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、及びシクロペンタノンが挙げられる。アルコール系溶媒としては、例えば、イソプロピルアルコール、及びメタノールが挙げられる。
 塗布方法としては、例えば、スピンコート法、スプレーコート法、バーコート法、ナイフコート法、ロールナイフコート法、ロールコート法、ブレードコート法、ダイコート法、及びグラビアコート法等が挙げられる。
 有機溶媒及び低沸点成分が粘着剤層、中間層、及び導電層に残留することを防ぐため、コーティング液を、例えば基材に塗布した後、塗膜を加熱して乾燥させることが好ましい。
When the pressure-sensitive adhesive composition is applied to form a pressure-sensitive adhesive layer, it is preferable to dilute the pressure-sensitive adhesive composition with an organic solvent to prepare and use a coating solution. The same applies when the intermediate layer and the conductive layer are formed.
It does not specifically limit as an organic solvent used for preparation of a coating liquid. Examples of the organic solvent include aromatic solvents, aliphatic solvents, ester solvents, ketone solvents, and alcohol solvents. Examples of the aromatic solvent include benzene, toluene, and xylene. Examples of the aliphatic solvent include normal hexane and normal heptane. Examples of the ester solvent include ethyl acetate and butyl acetate. Examples of the ketone solvent include methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and cyclopentanone. Examples of the alcohol solvent include isopropyl alcohol and methanol.
Examples of the coating method include spin coating, spray coating, bar coating, knife coating, roll knife coating, roll coating, blade coating, die coating, and gravure coating.
In order to prevent the organic solvent and the low boiling point component from remaining in the pressure-sensitive adhesive layer, the intermediate layer, and the conductive layer, it is preferable to apply the coating liquid to, for example, a substrate and then heat and dry the coating film.
〔第二実施形態〕
 第二実施形態に係る粘着シートは、基材と、粘着剤層との間に導電層を有している点において、第一実施形態に係る粘着シートと相違する。その他の点においては第一実施形態と同様であるため、説明を省略又は簡略化する。
 すなわち、第二実施形態に係る粘着シートは、基材と、導電層と、粘着剤層とをこの順に有する粘着シートである。
[Second Embodiment]
The pressure-sensitive adhesive sheet according to the second embodiment is different from the pressure-sensitive adhesive sheet according to the first embodiment in that a conductive layer is provided between the base material and the pressure-sensitive adhesive layer. Since the other points are the same as those of the first embodiment, the description is omitted or simplified.
That is, the pressure-sensitive adhesive sheet according to the second embodiment is a pressure-sensitive adhesive sheet having a base material, a conductive layer, and a pressure-sensitive adhesive layer in this order.
<導電層>
 導電層は、導電材料を含む層である。導電層は、導電材料を含む樹脂組成物から形成されることが好ましい。
 導電材料としては特に限定されないが、例えば、帯電防止剤の項で例示した材料(炭素材料、イオン性材料(イオン性液体、イオンポリマー)、金属微粒子、金属酸化物、金属フィラー、及び界面活性剤)、前記イオン性官能基を有する化合物、並びに合金が挙げられる。また、導電材料は導電性高分子であってもよい。
<Conductive layer>
The conductive layer is a layer containing a conductive material. The conductive layer is preferably formed from a resin composition containing a conductive material.
Although it does not specifically limit as a conductive material, For example, the material (carbon material, ionic material (ionic liquid, ionic polymer), metal microparticles, metal oxide, metal filler, and surfactant illustrated in the item of antistatic agent ), Compounds having an ionic functional group, and alloys. The conductive material may be a conductive polymer.
 導電材料が導電性高分子である場合、導電層は、導電性高分子を含む樹脂組成物(以下、「導電層形成用組成物」とも称する。)から形成される。
 導電層形成用組成物に含まれる樹脂は、ポリエステル樹脂、ウレタン樹脂およびアクリル樹脂からなる群から選ばれる少なくとも1種(以下、「特定樹脂」と称する。)を主成分として含有することが好ましい。
 主成分とは、導電層形成用組成物に含まれる樹脂全体の質量に占める前記特定樹脂の総質量の割合が50質量%以上であることを意味する。
When the conductive material is a conductive polymer, the conductive layer is formed from a resin composition containing a conductive polymer (hereinafter also referred to as “conductive layer forming composition”).
The resin contained in the conductive layer forming composition preferably contains at least one selected from the group consisting of a polyester resin, a urethane resin and an acrylic resin (hereinafter referred to as “specific resin”) as a main component.
The main component means that the ratio of the total mass of the specific resin to the total mass of the resin contained in the conductive layer forming composition is 50% by mass or more.
 導電層形成用組成物に含まれる樹脂は1種を単独で用いてもよいし、異なる2種を組み合わせて使用してもよい。中でも基材がポリエステル系の材料からなる場合、基材との密着性の観点から、導電層を構成する主成分として、ポリエステル樹脂およびポリウレタン樹脂を含有することが好ましい。導電層形成用組成物に含まれる樹脂がポリエステル樹脂単体の場合、ポリエステル系の基材との密着性は十分であるが、比較的脆い樹脂であるため、裁断時に凝集破壊を生じやすく、一方、導電層形成用組成物に含まれる樹脂がポリウレタン樹脂単体では、ポリエステル系の基材との密着性に劣る。上記のように共重合ポリエステル樹脂およびポリウレタン樹脂を含有することで、これらの問題を解決し、ポリエステル系の基材に対する密着性に優れるとともに、裁断時にも破壊し難い樹脂層が得られる。なお、「ポリエステル樹脂およびポリウレタン樹脂を含有する」とは、ポリエステル構造およびポリウレタン構造を一分子中に含む重合体を単体で含むことをも意味する。 As the resin contained in the composition for forming a conductive layer, one type may be used alone, or two different types may be used in combination. In particular, when the substrate is made of a polyester-based material, it is preferable that a polyester resin and a polyurethane resin are contained as the main component constituting the conductive layer from the viewpoint of adhesion to the substrate. In the case where the resin contained in the composition for forming a conductive layer is a polyester resin alone, the adhesiveness with the polyester base material is sufficient, but since it is a relatively brittle resin, it tends to cause cohesive failure during cutting, If the resin contained in the composition for forming a conductive layer is a single polyurethane resin, the adhesiveness with a polyester base material is poor. By containing a copolymerized polyester resin and a polyurethane resin as described above, a resin layer that solves these problems, has excellent adhesion to a polyester-based substrate, and is difficult to break even during cutting is obtained. “Containing a polyester resin and a polyurethane resin” also means that a polymer containing a polyester structure and a polyurethane structure in one molecule is included alone.
(導電性高分子)
 導電性高分子としては、例えば、ポリチオフェン系、ポリアニリン系、及びポリピロール系の導電性高分子が挙げられる。
(Conductive polymer)
Examples of the conductive polymer include polythiophene-based, polyaniline-based, and polypyrrole-based conductive polymers.
 ポリチオフェン系の導電性高分子としては、例えば、ポリチオフェン、ポリ(3-アルキルチオフェン)、ポリ(3-チオフェン-β-エタンスルホン酸)、ポリアルキレンジオキシチオフェンとポリスチレンスルホネートとの混合物等が挙げられる。なお、ポリアルキレンジオキシチオフェンとしては、ポリエチレンジオキシチオフェン、ポリプロピレンジオキシチオフェン、ポリ(エチレン/プロピレン)ジオキシチオフェン等が挙げられる。
 ポリアニリン系の導電性高分子としては、例えば、ポリアニリン、ポリメチルアニリン、ポリメトキシアニリン等が挙げられる。
 ポリピロール系の導電性高分子としては、例えば、ポリピロール、ポリ3-メチルピロール、ポリ3-オクチルピロール等が挙げられる。これらの導電性高分子化合物は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。なお、これらの導電性高分子は、水中に分散させて水溶液の形態で使用することが好ましい。
Examples of the polythiophene-based conductive polymer include polythiophene, poly (3-alkylthiophene), poly (3-thiophene-β-ethanesulfonic acid), a mixture of polyalkylenedioxythiophene and polystyrene sulfonate, and the like. . Examples of the polyalkylene dioxythiophene include polyethylene dioxythiophene, polypropylene dioxythiophene, poly (ethylene / propylene) dioxythiophene, and the like.
Examples of the polyaniline-based conductive polymer include polyaniline, polymethylaniline, polymethoxyaniline, and the like.
Examples of the polypyrrole-based conductive polymer include polypyrrole, poly-3-methylpyrrole, and poly-3-octylpyrrole. These conductive polymer compounds may be used alone or in combination of two or more. These conductive polymers are preferably used in the form of an aqueous solution dispersed in water.
 導電層中における導電性高分子の含有量は、固形分換算で0.1質量%以上50質量%以下であることが好ましく、0.3質量%以上30質量%以下であることがより好ましい。
 導電性高分子の含有量が0.1質量%以上であると、帯電防止性能が発現されやすい。
 導電性高分子の含有量が50質量%以下であると、導電層の強度が高まり、凝集破壊が生じにくくなり、粘着剤層の密着性が確保されやすくなる。
The content of the conductive polymer in the conductive layer is preferably from 0.1% by mass to 50% by mass in terms of solid content, and more preferably from 0.3% by mass to 30% by mass.
When the content of the conductive polymer is 0.1% by mass or more, antistatic performance is easily exhibited.
When the content of the conductive polymer is 50% by mass or less, the strength of the conductive layer is increased, the cohesive failure is less likely to occur, and the adhesiveness of the pressure-sensitive adhesive layer is easily secured.
 導電層の厚さは、30nm以上290nm以下であり、30nm以上250nm以下であることが好ましい。
 導電層の厚さが30nm以上であると、基材の表面への造膜性が良好になり、はじきに起因するピンホールが発生しにくくなる。
 導電層の厚さが290nm以下であると、導電層の凝集破壊が発生しにくくなり、粘着剤層の密着性が確保されやすくなる。
The thickness of the conductive layer is 30 nm or more and 290 nm or less, and preferably 30 nm or more and 250 nm or less.
When the thickness of the conductive layer is 30 nm or more, the film-forming property on the surface of the substrate is good, and pinholes due to repellence are less likely to occur.
When the thickness of the conductive layer is 290 nm or less, the cohesive failure of the conductive layer is less likely to occur, and the adhesiveness of the pressure-sensitive adhesive layer is easily ensured.
 導電層を形成するには、基材の粘着剤層の側の面(図2の場合、第一基材面11c)に、導電層形成用組成物を塗布した後、乾燥すればよい。
 塗布方法としては、粘着シートの製造方法の項で記載した塗布方法が挙げられる。
 導電層形成用組成物は、当該導電層形成用組成物中の各成分を溶解または分散させることのできる有機溶媒を含有してもよい。有機溶媒としては、エーテル系溶媒、アルコール系溶媒、アルコール系溶媒と精製水との混合溶媒等が好ましい。
In order to form the conductive layer, the composition for forming a conductive layer may be applied to the surface of the substrate on the side of the pressure-sensitive adhesive layer (in the case of FIG. 2, the first substrate surface 11c) and then dried.
Examples of the coating method include the coating methods described in the section of the method for producing the pressure-sensitive adhesive sheet.
The composition for forming a conductive layer may contain an organic solvent capable of dissolving or dispersing each component in the composition for forming a conductive layer. As the organic solvent, ether solvents, alcohol solvents, mixed solvents of alcohol solvents and purified water, and the like are preferable.
 図2には、第二実施形態に係る粘着シート10Aの断面図が示されている。
 粘着シート10Aは、基材11Aと、粘着剤層12Aとの間に導電層13を有している。すなわち、粘着シート10Aは、基材11Aと、導電材料を含む導電層13と、粘着剤層12Aとをこの順に有する。
 基材11Aは、第一基材面11c、及び第一基材面11cとは反対側の第二基材面11dを有する。粘着剤層12Aは、第一粘着面12c、及び第一粘着面12cとは反対側の第二粘着面12dを有する。
 粘着シート10Aにおいては、第一基材面11cに導電層13が積層されている。
 粘着シート10Aは、高温加熱後における粘着剤層12Aの第一粘着面12cの表面抵抗率が1011Ω/□未満である。
 第二実施形態の粘着シート10Aによれば、基材11Aと、粘着剤層12Aとの間に導電層13を有するので、高温加熱後における粘着剤層12Aの第一粘着面12cの帯電防止性能が向上すると考えられる。
 したがって、第二実施形態によれば、高温で加熱される工程を経た後に、粘着シート10Aを被着体から剥離しても、半導体素子の静電気破壊をより抑制することができる。
FIG. 2 shows a cross-sectional view of the pressure-sensitive adhesive sheet 10A according to the second embodiment.
The pressure-sensitive adhesive sheet 10A has a conductive layer 13 between the base material 11A and the pressure-sensitive adhesive layer 12A. That is, the pressure-sensitive adhesive sheet 10A has a base material 11A, a conductive layer 13 containing a conductive material, and a pressure-sensitive adhesive layer 12A in this order.
The substrate 11A has a first substrate surface 11c and a second substrate surface 11d opposite to the first substrate surface 11c. The pressure-sensitive adhesive layer 12A has a first pressure-sensitive adhesive surface 12c and a second pressure-sensitive adhesive surface 12d opposite to the first pressure-sensitive adhesive surface 12c.
In the adhesive sheet 10A, the conductive layer 13 is laminated on the first base material surface 11c.
In the pressure-sensitive adhesive sheet 10A, the surface resistivity of the first pressure-sensitive adhesive surface 12c of the pressure-sensitive adhesive layer 12A after high-temperature heating is less than 10 11 Ω / □.
According to the pressure-sensitive adhesive sheet 10A of the second embodiment, since the conductive layer 13 is provided between the base material 11A and the pressure-sensitive adhesive layer 12A, the antistatic performance of the first pressure-sensitive adhesive surface 12c of the pressure-sensitive adhesive layer 12A after high-temperature heating. Is thought to improve.
Therefore, according to the second embodiment, the electrostatic breakdown of the semiconductor element can be further suppressed even if the pressure-sensitive adhesive sheet 10A is peeled off from the adherend after the process of being heated at a high temperature.
〔第三実施形態〕
 第三実施形態に係る粘着シートは、基材と導電層との間に中間層を含んでいる点において、第二実施形態に係る粘着シートと相違する。その他の点においては第二実施形態と同様であるため、説明を省略又は簡略化する。
 すなわち、第三実施形態に係る粘着シートは、基材と、中間層と、導電層と、粘着剤層とをこの順に有する粘着シートである。
[Third embodiment]
The pressure-sensitive adhesive sheet according to the third embodiment is different from the pressure-sensitive adhesive sheet according to the second embodiment in that an intermediate layer is included between the base material and the conductive layer. Since the other points are the same as those of the second embodiment, the description is omitted or simplified.
That is, the pressure-sensitive adhesive sheet according to the third embodiment is a pressure-sensitive adhesive sheet having a base material, an intermediate layer, a conductive layer, and a pressure-sensitive adhesive layer in this order.
<中間層>
 中間層は、基材と導電層との間に設けられる。中間層には所望の目的に応じた機能を持たせることが好ましい。中間層としては、例えば、オリゴマー封止層、プライマー層、及びハードコート層等が挙げられる。例えば、中間層(例えば、オリゴマー封止層、プライマー層、及びハードコート層等)を設けることにより、基材と導電層との密着性、基材表面へのオリゴマーの析出抑制、及び加熱工程における基材熱収縮のうちの少なくとも1つを向上させることができる。
<Intermediate layer>
The intermediate layer is provided between the base material and the conductive layer. The intermediate layer preferably has a function corresponding to a desired purpose. Examples of the intermediate layer include an oligomer sealing layer, a primer layer, and a hard coat layer. For example, by providing an intermediate layer (for example, an oligomer sealing layer, a primer layer, and a hard coat layer), adhesion between the substrate and the conductive layer, suppression of oligomer precipitation on the substrate surface, and heating step At least one of the substrate thermal shrinkage can be improved.
 ここで、オリゴマー封止層とは、第三実施形態の場合、粘着剤層及び導電層にオリゴマーが浸入することを防止するための層である。高温条件に粘着シートが曝されると、基材中に含まれるオリゴマーが、加熱により基材の表面に析出することがある。このため、粘着シートが、オリゴマー封止層を有することにより、基材中に含まれるオリゴマーの粘着剤層及び導電層への浸入を抑制することができる。これにより、オリゴマー成分が基材から移動することを抑制できるので、粘着剤層と導電層の界面で剥離が生じたり、被着体から粘着シートが、より剥がれにくくなる。
 なお、オリゴマー封止層は、180℃以上200℃以下の高温条件下においても、粘着剤層へのオリゴマーの浸入を防止することが好ましい。
Here, the oligomer sealing layer is a layer for preventing the oligomer from entering the pressure-sensitive adhesive layer and the conductive layer in the third embodiment. When the pressure-sensitive adhesive sheet is exposed to high temperature conditions, oligomers contained in the substrate may be deposited on the surface of the substrate by heating. For this reason, when an adhesive sheet has an oligomer sealing layer, the penetration | invasion to the adhesive layer and conductive layer of the oligomer contained in a base material can be suppressed. Thereby, since it can suppress that an oligomer component moves from a base material, peeling arises in the interface of an adhesive layer and a conductive layer, or an adhesive sheet becomes more difficult to peel from an adherend.
The oligomer sealing layer preferably prevents the oligomer from entering the pressure-sensitive adhesive layer even under high temperature conditions of 180 ° C. or higher and 200 ° C. or lower.
 以下、オリゴマー封止層について説明する。 Hereinafter, the oligomer sealing layer will be described.
(オリゴマー封止層)
 オリゴマー封止層の材質は、基材中のオリゴマーが粘着剤層及び導電層に浸入することを防止できれば、特に限定されない。
 例えば、オリゴマー封止層は、オリゴマー封止層用組成物を硬化させた硬化皮膜であることが好ましい。オリゴマー封止層用組成物は、例えば、(A)エポキシ化合物、(B)ポリエステル化合物、及び(C)多官能アミノ化合物からなる群から選択される少なくとも一種を含むことが好ましく、(A)エポキシ化合物と、(B)ポリエステル化合物と、(C)多官能アミノ化合物と、を含むことがより好ましい。
 オリゴマー封止層用組成物は、硬化反応を促進するために、更に、(D)酸性触媒を含んでいても良い。
(Oligomer sealing layer)
The material of the oligomer sealing layer is not particularly limited as long as the oligomer in the base material can be prevented from entering the pressure-sensitive adhesive layer and the conductive layer.
For example, the oligomer sealing layer is preferably a cured film obtained by curing the composition for the oligomer sealing layer. The composition for the oligomer sealing layer preferably contains, for example, at least one selected from the group consisting of (A) an epoxy compound, (B) a polyester compound, and (C) a polyfunctional amino compound. It is more preferable that a compound, (B) polyester compound, and (C) polyfunctional amino compound are included.
The composition for oligomer sealing layer may further contain (D) an acidic catalyst in order to promote the curing reaction.
・(A)エポキシ化合物
 (A)エポキシ化合物は、ビスフェノールA型エポキシ化合物であることが好ましい。ビスフェノールA型エポキシ化合物としては、ビスフェノールAジグリシジルエーテル等を挙げることができる。
-(A) Epoxy Compound (A) The epoxy compound is preferably a bisphenol A type epoxy compound. Examples of the bisphenol A type epoxy compound include bisphenol A diglycidyl ether.
・(B)ポリエステル化合物
 (B)ポリエステル化合物としては、特に限定されず、公知のポリエステル化合物の中から適宜選択して用いることができる。ポリエステル化合物としては、具体的には、多価アルコールと多塩基酸との縮合反応によって得られる樹脂であって、二塩基酸と二価アルコールとの縮合物若しくは不乾性油脂肪酸等で変性した化合物である不転化性ポリエステル化合物、及び二塩基酸と三価以上のアルコールとの縮合物である転化性ポリエステル化合物等が挙げられる。
-(B) Polyester compound (B) It does not specifically limit as a polyester compound, It can select from a well-known polyester compound suitably, and can be used. Specifically, the polyester compound is a resin obtained by a condensation reaction between a polyhydric alcohol and a polybasic acid, and is a compound modified with a condensate of a dibasic acid and a dihydric alcohol or a non-drying oil fatty acid. And a convertible polyester compound that is a condensate of a dibasic acid and a trivalent or higher alcohol.
 (B)ポリエステル化合物の原料として用いられる多価アルコール及び多塩基酸としては、公知の多価アルコール及び多塩基酸を適宜選択して用いることができる。 (B) As the polyhydric alcohol and polybasic acid used as a raw material for the polyester compound, known polyhydric alcohols and polybasic acids can be appropriately selected and used.
・(C)多官能アミノ化合物
 (C)多官能アミノ化合物としては、例えば、メラミン化合物、尿素化合物、ベンゾグアナミン化合物、及びジアミン類を用いることができる。
 メラミン化合物としては、例えば、ヘキサメトキシメチルメラミン、メチル化メラミン化合物、及びブチル化メラミン化合物が挙げられる。
 尿素化合物としては、例えば、メチル化尿素化合物、及びブチル化尿素化合物が挙げられる。
 ベンゾグアナミン化合物としては、例えば、メチル化ベンゾグアナミン化合物、及びブチル化ベンゾグアナミン化合物が挙げられる。
 ジアミン類としては、例えば、エチレンジアミン、テトラメチレンジアミン、ヘキサメチレンジアミン、N,N’-ジフェニルエチレンジアミン、及びp-キシリレンジアミンが挙げられる。
 硬化性の観点から、(C)多官能アミノ化合物としては、ヘキサメトキシメチルメラミンが好ましい。
-(C) Polyfunctional amino compound (C) As a polyfunctional amino compound, a melamine compound, a urea compound, a benzoguanamine compound, and diamine can be used, for example.
Examples of melamine compounds include hexamethoxymethyl melamine, methylated melamine compounds, and butylated melamine compounds.
Examples of the urea compound include a methylated urea compound and a butylated urea compound.
Examples of the benzoguanamine compound include a methylated benzoguanamine compound and a butylated benzoguanamine compound.
Examples of diamines include ethylenediamine, tetramethylenediamine, hexamethylenediamine, N, N′-diphenylethylenediamine, and p-xylylenediamine.
From the viewpoint of curability, the (C) polyfunctional amino compound is preferably hexamethoxymethylmelamine.
・(D)酸性触媒
 酸性触媒(D)としては、例えば、塩酸、及びp-トルエンスルホン酸が挙げられる。
-(D) Acidic catalyst Examples of the acidic catalyst (D) include hydrochloric acid and p-toluenesulfonic acid.
・硬化皮膜
 本実施形態において、オリゴマー封止層は、(A)ビスフェノールA型エポキシ化合物、(B)ポリエステル化合物、及び(C)多官能アミノ化合物を、それぞれ、(A)50質量%以上80質量%以下、(B)5質量%以上30質量%以下、及び(C)10質量%以上40質量%以下の配合率で含むオリゴマー封止層用組成物を硬化させた硬化皮膜であることが好ましい。(D)酸性触媒をオリゴマー封止層用組成物に配合する場合は、(D)成分の含有量を1質量%以上5質量%以下とすることが好ましい。
 前述の範囲の配合率のオリゴマー封止層用組成物を硬化させた硬化皮膜によれば、オリゴマー封止層による粘着剤層へのオリゴマーの浸入を防止する効果を向上させることができる。
-Cured film In this embodiment, the oligomer sealing layer comprises (A) 50 mass% or more and 80 mass% of (A) bisphenol A type epoxy compound, (B) polyester compound, and (C) polyfunctional amino compound, respectively. % Or less, (B) 5% by mass or more and 30% by mass or less, and (C) a cured film obtained by curing an oligomer sealing layer composition containing 10% by mass or more and 40% by mass or less. . (D) When mix | blending an acidic catalyst with the composition for oligomer sealing layers, it is preferable that content of (D) component shall be 1 mass% or more and 5 mass% or less.
According to the cured film obtained by curing the composition for the oligomer sealing layer having the blending ratio in the above range, the effect of preventing the oligomer from entering the pressure-sensitive adhesive layer by the oligomer sealing layer can be improved.
・中間層の膜厚
 中間層の厚さは、50nm以上500nm以下であることが好ましく、80nm以上300nm以下であることがより好ましい。
 中間層の厚さが50nm以上であれば、基材と導電層との良好な密着性が得られ易い。
 第三実施形態において、特に中間層がオリゴマー封止層の場合は、基材中に含まれるオリゴマーの粘着剤層及び導電層への浸入を効果的に防止できる。
 中間層の厚さが500nm以下であれば、例えば粘着シートをコア材にロール状に巻き取る際に巻き取り易くなる。コア材の材質としては、例えば、紙製、プラスチック製、及び金属製が挙げられる。
-Film thickness of the intermediate layer The thickness of the intermediate layer is preferably 50 nm or more and 500 nm or less, and more preferably 80 nm or more and 300 nm or less.
If the thickness of the intermediate layer is 50 nm or more, good adhesion between the substrate and the conductive layer can be easily obtained.
In 3rd embodiment, when an intermediate | middle layer is an oligomer sealing layer especially, the penetration | invasion to the adhesive layer and conductive layer of the oligomer contained in a base material can be prevented effectively.
When the thickness of the intermediate layer is 500 nm or less, for example, when the pressure-sensitive adhesive sheet is wound around the core material in a roll shape, the intermediate layer is easily wound. Examples of the material of the core material include paper, plastic, and metal.
 図3には、第三実施形態に係る粘着シート10Bの断面図が示されている。基材11Bと、導電層13Aとの間に、中間層としてオリゴマー封止層14を有している。
 すなわち、粘着シート10Bは、基材11Bと、オリゴマー封止層14と、導電層13Aと、粘着剤層12Bと、をこの順に有する。
 基材11Bは、第一基材面11e、及び第一基材面11eとは反対側の第二基材面11fを有する。粘着剤層12Bは、第一粘着面12e、及び第一粘着面12eとは反対側の第二粘着面12fを有する。粘着シート10Bにおいては、第一基材面11eにオリゴマー封止層14が積層され、オリゴマー封止層14上に導電層13Aと粘着剤層12Bとがこの順に積層されている。
 粘着シート10Bは、高温加熱後における粘着剤層12Bの第一粘着面12eの表面抵抗率が1011Ω/□未満である。
 第三実施形態の粘着シート10Bによれば、第二実施形態と同様、導電層13Aを有するので、粘着剤層12Bの第一粘着面12eにおける帯電防止性能が向上すると考えられる。
 したがって、第三実施形態によれば、高温で加熱される工程を経た後に、粘着シート10Bを被着体から剥離しても、半導体素子の静電気破壊をより抑制することができる。
 さらに、第三実施形態の粘着シート10Bによれば、基材11Bと導電層13Aとの間にオリゴマー封止層14を有するので、基材11B中に含まれるオリゴマーの粘着剤層12B及び導電層13Aへの侵入も防止することができる。
FIG. 3 shows a cross-sectional view of the pressure-sensitive adhesive sheet 10B according to the third embodiment. Between the base material 11B and the conductive layer 13A, an oligomer sealing layer 14 is provided as an intermediate layer.
That is, the pressure-sensitive adhesive sheet 10B has a base material 11B, an oligomer sealing layer 14, a conductive layer 13A, and a pressure-sensitive adhesive layer 12B in this order.
The base material 11B has a first base material surface 11e and a second base material surface 11f opposite to the first base material surface 11e. The pressure-sensitive adhesive layer 12B has a first pressure-sensitive adhesive surface 12e and a second pressure-sensitive adhesive surface 12f opposite to the first pressure-sensitive adhesive surface 12e. In the pressure-sensitive adhesive sheet 10B, the oligomer sealing layer 14 is stacked on the first base material surface 11e, and the conductive layer 13A and the pressure-sensitive adhesive layer 12B are stacked on the oligomer sealing layer 14 in this order.
In the pressure-sensitive adhesive sheet 10B, the surface resistivity of the first pressure-sensitive adhesive surface 12e of the pressure-sensitive adhesive layer 12B after high-temperature heating is less than 10 11 Ω / □.
According to the pressure-sensitive adhesive sheet 10B of the third embodiment, the antistatic performance on the first pressure-sensitive adhesive surface 12e of the pressure-sensitive adhesive layer 12B is considered to be improved because it has the conductive layer 13A as in the second embodiment.
Therefore, according to 3rd embodiment, even if it peels off the adhesive sheet 10B from a to-be-adhered body after passing through the process heated at high temperature, the electrostatic breakdown of a semiconductor element can be suppressed more.
Furthermore, according to the pressure-sensitive adhesive sheet 10B of the third embodiment, since the oligomer sealing layer 14 is provided between the base material 11B and the conductive layer 13A, the oligomer pressure-sensitive adhesive layer 12B and the conductive layer contained in the base material 11B. Intrusion into 13A can also be prevented.
〔第四実施形態〕
 第四実施形態に係る粘着シートは、基材と、粘着剤層との間に、導電層に代えて中間層を含んでいる点において、第二実施形態に係る粘着シートと相違する。その他の点においては第二実施形態と同様であるため、説明を省略又は簡略化する。
[Fourth embodiment]
The pressure-sensitive adhesive sheet according to the fourth embodiment is different from the pressure-sensitive adhesive sheet according to the second embodiment in that an intermediate layer is included instead of the conductive layer between the base material and the pressure-sensitive adhesive layer. Since the other points are the same as those of the second embodiment, the description is omitted or simplified.
 図4には、第四実施形態に係る粘着シート10Cの断面図が示されている。基材11Cと、粘着剤層12Cとの間に、中間層としてオリゴマー封止層14Aを有している。
 すなわち、粘着シート10Cは、基材11Cと、オリゴマー封止層14Aと、粘着剤層12Cと、をこの順に有する。
 ここで、オリゴマー封止層14Aとは、第四実施形態の場合、粘着剤層にオリゴマーが浸入することを防止するための層である。
 基材11Cは、第一基材面11g、及び第一基材面11gとは反対側の第二基材面11hを有する。粘着剤層12Cは、第一粘着面12g、及び第一粘着面12gとは反対側の第二粘着面12hを有する。粘着シート10Cにおいては、第一基材面11gにオリゴマー封止層14Aが積層されている。
 粘着シート10Cは、高温加熱後における粘着剤層12Cの第一粘着面12gの表面抵抗率が1011Ω/□未満である。
 したがって、第四実施形態によれば、高温で加熱される工程を経た後に、粘着シート10Cを被着体から剥離しても、半導体素子の静電気破壊をより抑制することができる。
 さらに、第四実施形態の粘着シート10Cによれば、基材11Cと粘着剤層12Cとの間にオリゴマー封止層14Aを有するので、基材11C中に含まれるオリゴマーの粘着剤層12Cへの侵入も防止することができる。これにより、被着体から粘着シート10Cが、より剥がれにくくなる。
FIG. 4 shows a cross-sectional view of the pressure-sensitive adhesive sheet 10C according to the fourth embodiment. Between the base material 11C and the pressure-sensitive adhesive layer 12C, an oligomer sealing layer 14A is provided as an intermediate layer.
That is, the pressure-sensitive adhesive sheet 10C has a base material 11C, an oligomer sealing layer 14A, and a pressure-sensitive adhesive layer 12C in this order.
Here, the oligomer sealing layer 14 </ b> A is a layer for preventing the oligomer from entering the pressure-sensitive adhesive layer in the fourth embodiment.
The substrate 11C has a first substrate surface 11g and a second substrate surface 11h opposite to the first substrate surface 11g. The pressure-sensitive adhesive layer 12C has a first pressure-sensitive adhesive surface 12g and a second pressure-sensitive adhesive surface 12h opposite to the first pressure-sensitive adhesive surface 12g. In the pressure-sensitive adhesive sheet 10C, an oligomer sealing layer 14A is laminated on the first base material surface 11g.
In the pressure-sensitive adhesive sheet 10C, the surface resistivity of the first pressure-sensitive adhesive surface 12g of the pressure-sensitive adhesive layer 12C after high-temperature heating is less than 10 11 Ω / □.
Therefore, according to the fourth embodiment, electrostatic breakdown of the semiconductor element can be further suppressed even if the pressure-sensitive adhesive sheet 10C is peeled off from the adherend after the process of being heated at a high temperature.
Furthermore, according to the pressure-sensitive adhesive sheet 10C of the fourth embodiment, since the oligomer sealing layer 14A is provided between the base material 11C and the pressure-sensitive adhesive layer 12C, the oligomer contained in the base material 11C is applied to the pressure-sensitive adhesive layer 12C. Intrusion can also be prevented. Thereby, 10 C of adhesive sheets become difficult to peel from a to-be-adhered body.
〔第五実施形態〕
 第五実施形態に係る粘着シートは、基材と、粘着剤層との間の基材の側に、さらに導電層を含んでいる点、及び中間層がプライマー層である点において、第四実施形態に係る粘着シートと相違する。その他の点においては第四実施形態と同様であるため、説明を省略又は簡略化する。
[Fifth embodiment]
The pressure-sensitive adhesive sheet according to the fifth embodiment is the fourth embodiment in that it further includes a conductive layer on the side of the base material between the base material and the pressure-sensitive adhesive layer, and the intermediate layer is a primer layer. It is different from the adhesive sheet according to the form. Since other points are the same as those of the fourth embodiment, description thereof is omitted or simplified.
 図5には、第五実施形態に係る粘着シート10Dの断面図が示されている。
 粘着シート10Dは、基材11Dと、導電層13Bと、プライマー層14Bと、粘着剤層12Dと、をこの順に有する。
 基材11Dは、第一基材面11i、及び第一基材面11iとは反対側の第二基材面11jを有する。粘着剤層12Dは、第一粘着面12i、及び第一粘着面12iとは反対側の第二粘着面12jを有する。粘着シート10Dにおいては、第一基材面11iに導電層13Bが積層されている。
 粘着シート10Dは、高温加熱後における粘着剤層12Dの第一粘着面12iの表面抵抗率が1011Ω/□未満である。
 したがって、第五実施形態によれば、高温で加熱される工程を経た後に、粘着シート10Dを被着体から剥離しても、半導体素子の静電気破壊をより抑制することができる。
 さらに、第五実施形態の粘着シート10Dによれば、粘着剤層12Dと導電層13Bとの間にプライマー層14Bを有するので、粘着剤層12Dと導電層13Bとの密着性を向上させることができる。これにより、粘着シートを剥離した後の被着体への糊残りを抑制しやすくなる。
FIG. 5 shows a cross-sectional view of an adhesive sheet 10D according to the fifth embodiment.
The pressure-sensitive adhesive sheet 10D includes a base material 11D, a conductive layer 13B, a primer layer 14B, and a pressure-sensitive adhesive layer 12D in this order.
The substrate 11D has a first substrate surface 11i and a second substrate surface 11j opposite to the first substrate surface 11i. The pressure-sensitive adhesive layer 12D has a first pressure-sensitive adhesive surface 12i and a second pressure-sensitive adhesive surface 12j opposite to the first pressure-sensitive adhesive surface 12i. In the adhesive sheet 10D, the conductive layer 13B is laminated on the first base material surface 11i.
In the pressure-sensitive adhesive sheet 10D, the surface resistivity of the first pressure-sensitive adhesive surface 12i of the pressure-sensitive adhesive layer 12D after high-temperature heating is less than 10 11 Ω / □.
Therefore, according to the fifth embodiment, the electrostatic breakdown of the semiconductor element can be further suppressed even if the pressure-sensitive adhesive sheet 10D is peeled off from the adherend after the process of being heated at a high temperature.
Furthermore, according to the pressure-sensitive adhesive sheet 10D of the fifth embodiment, since the primer layer 14B is provided between the pressure-sensitive adhesive layer 12D and the conductive layer 13B, the adhesion between the pressure-sensitive adhesive layer 12D and the conductive layer 13B can be improved. it can. Thereby, it becomes easy to suppress the adhesive residue to the to-be-adhered body after peeling an adhesive sheet.
〔第六実施形態〕
<粘着シートの使用>
 上記実施形態(第一実施形態から第五実施形態のいずれか)の粘着シートは、半導体素子を封止する際に使用される。粘着シートは、金属製リードフレームに搭載されておらず、粘着シート上に貼着された状態の半導体素子を封止する際に使用されることが好ましい。具体的には、上記実施形態の粘着シートは、金属製リードフレームに搭載された半導体素子を封止する際に使用されるのではなく、粘着剤層に貼着された状態の半導体素子を封止する際に使用されることが好ましい。金属製リードフレームを用いずに半導体素子をパッケージングする形態としては、パネルスケールパッケージ(Panel Scale Package;PSP)及びウエハレベルパッケージ(Wafer Level Package;WLP)が挙げられる。
 粘着シートは、複数の開口部が形成された枠部材を粘着シートに貼着させる工程と、前記枠部材の開口部にて露出する粘着剤層に半導体チップ(半導体素子の一例)を貼着させる工程と、前記半導体チップを封止樹脂で覆う工程と、前記封止樹脂を熱硬化させる工程と、を有するプロセスにおいて使用されることが好ましい。
[Sixth embodiment]
<Use of adhesive sheet>
The adhesive sheet of the said embodiment (any one of 5th embodiment from 1st embodiment) is used when sealing a semiconductor element. The pressure-sensitive adhesive sheet is not mounted on a metal lead frame, and is preferably used when sealing a semiconductor element stuck on the pressure-sensitive adhesive sheet. Specifically, the pressure-sensitive adhesive sheet of the above embodiment is not used when sealing a semiconductor element mounted on a metal lead frame, but seals the semiconductor element in a state of being adhered to an adhesive layer. It is preferably used when stopping. As a form of packaging a semiconductor element without using a metal lead frame, a panel scale package (Panel Scale Package; PSP) and a wafer level package (Wafer Level Package; WLP) can be cited.
The pressure-sensitive adhesive sheet attaches a semiconductor chip (an example of a semiconductor element) to the pressure-sensitive adhesive layer exposed at the step of attaching the frame member formed with a plurality of openings to the pressure-sensitive adhesive sheet and the opening of the frame member. It is preferably used in a process having a step, a step of covering the semiconductor chip with a sealing resin, and a step of thermosetting the sealing resin.
〔実施形態の変形〕
 本発明は、前記実施形態に限定されず、本発明の目的を達成できる範囲での変形及び改良等は、本発明に含まれる。なお、以下の説明では、前記実施形態で説明した部材等と同一であれば、同一符号を付してその説明を省略または簡略化する。
[Modification of Embodiment]
The present invention is not limited to the above-described embodiment, and modifications and improvements as long as the object of the present invention can be achieved are included in the present invention. In the following description, if it is the same as the member described in the above embodiment, the same reference numeral is given and the description is omitted or simplified.
 粘着シートは、枚葉であってもよく、複数枚の粘着シートが積層された状態で提供されてもよい。
 粘着シートは、長尺状のシートであってもよく、ロール状に巻き取られた状態で提供されてもよい。ロール状に巻き取られた粘着シートは、ロールから繰り出されて所望のサイズに切断する等して使用することができる。
The adhesive sheet may be a single sheet or may be provided in a state where a plurality of adhesive sheets are laminated.
The adhesive sheet may be a long sheet or may be provided in a state of being wound in a roll. The pressure-sensitive adhesive sheet wound up in a roll shape can be used by being unwound from a roll and cut into a desired size.
 粘着シートの粘着剤層は、剥離シートによって覆われていてもよい。剥離シートとしては、特に限定されない。例えば、取り扱い易さの観点から、剥離シートは、剥離基材と、剥離基材の上に剥離剤が塗布されて形成された剥離剤層とを備えることが好ましい。また、剥離シートは、剥離基材の片面のみに剥離剤層を備えていてもよいし、剥離基材の両面に剥離剤層を備えていてもよい。剥離基材としては、例えば、紙基材、この紙基材にポリエチレン等の熱可塑性樹脂をラミネートしたラミネート紙、並びにプラスチックフィルム等が挙げられる。紙基材としては、グラシン紙、コート紙、及びキャストコート紙等が挙げられる。プラスチックフィルムとしては、ポリエチレンテレフタレート、ポリブチレンテレフタレート、及びポリエチレンナフタレート等のポリエステルフィルム、並びにポリプロピレン及びポリエチレン等のポリオレフィンフィルム等が挙げられる。剥離剤としては、例えば、オレフィン系樹脂、ゴム系エラストマー(例えば、ブタジエン系樹脂、イソプレン系樹脂等)、長鎖アルキル系樹脂、アルキド系樹脂、フッ素系樹脂、及びシリコーン系樹脂が挙げられる。
 なお、本明細書におけるシートとは、一般的にシートと呼ばれているものだけでなく、一般的にフィルムと呼ばれているものも包含する概念である。
The pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet may be covered with a release sheet. The release sheet is not particularly limited. For example, from the viewpoint of ease of handling, the release sheet preferably includes a release substrate and a release agent layer formed by applying a release agent on the release substrate. Moreover, the release sheet may be provided with a release agent layer only on one side of the release substrate, or may be provided with a release agent layer on both sides of the release substrate. Examples of the release substrate include a paper substrate, a laminated paper obtained by laminating a thermoplastic resin such as polyethylene on the paper substrate, and a plastic film. Examples of the paper substrate include glassine paper, coated paper, and cast coated paper. Examples of the plastic film include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate, and polyolefin films such as polypropylene and polyethylene. Examples of the release agent include olefin resins, rubber elastomers (eg, butadiene resins, isoprene resins, etc.), long chain alkyl resins, alkyd resins, fluorine resins, and silicone resins.
In addition, the sheet | seat in this specification is the concept including not only what is generally called a sheet | seat but what is generally called a film | membrane.
 剥離シートの厚さは、特に限定されない。剥離シートの厚さは、通常、20μm以上200μm以下であり、25μm以上150μm以下であることが好ましい。
 剥離剤層の厚さは、特に限定されない。剥離剤を含む溶液を塗布して剥離剤層を形成する場合、剥離剤層の厚さは、0.01μm以上2.0μm以下であることが好ましく、0.03μm以上1.0μm以下であることがより好ましい。
 剥離基材としてプラスチックフィルムを用いる場合、当該プラスチックフィルムの厚さは、3μm以上50μm以下であることが好ましく、5μm以上40μm以下であることがより好ましい。
The thickness of the release sheet is not particularly limited. The thickness of the release sheet is usually 20 μm or more and 200 μm or less, and preferably 25 μm or more and 150 μm or less.
The thickness of the release agent layer is not particularly limited. When a release agent layer is formed by applying a solution containing a release agent, the thickness of the release agent layer is preferably 0.01 μm or more and 2.0 μm or less, and 0.03 μm or more and 1.0 μm or less. Is more preferable.
When a plastic film is used as the release substrate, the thickness of the plastic film is preferably 3 μm or more and 50 μm or less, and more preferably 5 μm or more and 40 μm or less.
 剥離シートを有する粘着シートは、例えば、次のような工程を経て製造される。
 まず、剥離シートの上に粘着剤組成物を塗布し、塗膜を形成する。次に、塗膜を乾燥させて、粘着剤層を形成する。次に、剥離シート上の粘着剤層と、基材とを貼り合わせる。
 粘着シートが、例えば中間層としてオリゴマー封止層を有する場合には、基材の第一基材面にオリゴマー封止層を形成しておく。次に、剥離シート上の粘着剤層と、基材上のオリゴマー封止層とを貼り合わせる。
 粘着シートが、導電層を有する場合も同様の方法で、基材の第一基材面もしくは前記オリゴマー封止層上に導電層を形成した後、剥離シート上の粘着剤層と、基材上の導電層とを貼り合わせる。
The pressure-sensitive adhesive sheet having a release sheet is produced, for example, through the following steps.
First, a pressure-sensitive adhesive composition is applied on a release sheet to form a coating film. Next, the coating film is dried to form an adhesive layer. Next, the adhesive layer on the release sheet and the substrate are bonded together.
In the case where the pressure-sensitive adhesive sheet has an oligomer sealing layer as an intermediate layer, for example, an oligomer sealing layer is formed on the first base material surface of the base material. Next, the pressure-sensitive adhesive layer on the release sheet and the oligomer sealing layer on the substrate are bonded together.
Even when the pressure-sensitive adhesive sheet has a conductive layer, after the conductive layer is formed on the first base material surface of the base material or the oligomer sealing layer in the same manner, the pressure-sensitive adhesive layer on the release sheet and the base material The conductive layer is attached.
 前記実施形態では、封止樹脂の材質として熱硬化性樹脂である場合を例に挙げて説明したが、本発明はこのような態様に限定されない。 In the above embodiment, the case where the material of the sealing resin is a thermosetting resin has been described as an example, but the present invention is not limited to such a mode.
 以下、実施例を挙げて本発明をさらに詳細に説明する。本発明はこれら実施例に何ら限定されない。 Hereinafter, the present invention will be described in more detail with reference to examples. The present invention is not limited to these examples.
〔粘着シートの作製〕
(実施例1)
(1)塗布用オリゴマー封止剤液の調製
 下記(A)ビスフェノールA型エポキシ化合物、(B)ポリエステル化合物、(C)多官能アミノ化合物、及び(D)酸性触媒を配合し、十分に撹拌して、塗布用オリゴマー封止剤液(オリゴマー封止層用組成物)を調製した。
[Preparation of adhesive sheet]
(Example 1)
(1) Preparation of oligomer sealing agent liquid for coating The following (A) bisphenol A type epoxy compound, (B) polyester compound, (C) polyfunctional amino compound, and (D) acidic catalyst are blended and stirred sufficiently. Thus, an oligomer sealing agent liquid for coating (composition for oligomer sealing layer) was prepared.
 (A)ビスフェノールA型エポキシ化合物
  DIC社製「EPICLON H-360」(商品名)、固形分濃度:40質量%、重量平均分子量:25000
 (B)ポリエステル化合物
  東洋紡績社製「バイロンGK680」(商品名)、数平均分子量:6000、ガラス転移温度:10℃
 (C)多官能アミノ化合物
  ヘキサメトキシメチルメラミン、日本サイテックインダストリーズ社製「サイメル303」(商品名)
 (D)酸性触媒
  p-トルエンスルホン酸のメタノール溶液(固形分濃度50質量%)
(A) Bisphenol A type epoxy compound “EPICLON H-360” (trade name) manufactured by DIC, solid content concentration: 40 mass%, weight average molecular weight: 25000
(B) Polyester compound “Byron GK680” (trade name) manufactured by Toyobo Co., Ltd., number average molecular weight: 6000, glass transition temperature: 10 ° C.
(C) Polyfunctional amino compound Hexamethoxymethylmelamine, “Cymel 303” (trade name) manufactured by Nippon Cytec Industries, Ltd.
(D) Methanol solution of p-toluenesulfonic acid (solid content concentration 50% by mass)
 具体的には、上記(A)ビスフェノールA型エポキシ化合物100質量部に、上記(B)ポリエステル化合物のトルエン希釈溶液(固形分濃度:30%)14.29質量部、及び上記(C)ヘキサメトキシメチルメラミン11.4質量部を加え、さらに、トルエン/メチルエチルケトン=50質量%/50質量%の混合溶剤で固形分が3質量%になるように希釈し、撹拌した。撹拌後の溶液に(D)p-トルエンスルホン酸のメタノール溶液(固形分濃度50質量%)を2.9質量部((A)ビスフェノールA型エポキシ化合物100質量部に対して)添加して、塗布用オリゴマー封止剤液を得た。 Specifically, 100 parts by mass of the (A) bisphenol A type epoxy compound, 14.29 parts by mass of a toluene diluted solution of the (B) polyester compound (solid content concentration: 30%), and the above (C) hexamethoxy 11.4 parts by mass of methylmelamine was added, and the mixture was further diluted with a mixed solvent of toluene / methyl ethyl ketone = 50% by mass / 50% by mass so that the solid content became 3% by mass and stirred. 2.9 parts by mass of methanol solution (solid content concentration 50% by mass) of (D) p-toluenesulfonic acid (based on 100 parts by mass of (A) bisphenol A type epoxy compound) was added to the stirred solution, An oligomer sealing agent solution for coating was obtained.
(2)オリゴマー封止層の作製
 基材として、二軸延伸ポリエチレンテレフタレートフィルム(三菱樹脂社製「ダイヤホイル T-100」(商品名)、厚さ50μm、100℃における貯蔵弾性率3.2×10Pa、以下、単に「フィルム」とも称する。)を準備した。
 調製した塗布用オリゴマー封止剤液を、準備したフィルムの一方の面にマイヤーバーコート法にて均一に塗布した。塗布後のフィルムをオーブンの内部を通過させ、塗膜を熱硬化させて、中間層としての厚さ150nmのオリゴマー封止層を得た。オーブンにおける熱風の吹き出し条件としては、温度を150℃とし、風速を8m/minとし、オーブンにおける加工速度としては、塗布後のフィルムがオーブン内部を20秒で通過するように調整した。
(2) Preparation of oligomer sealing layer As a base material, a biaxially stretched polyethylene terephthalate film (“Diafoil T-100” (trade name) manufactured by Mitsubishi Plastics, Inc., thickness 50 μm, storage elastic modulus at 100 ° C. 3.2 × 10 9 Pa, hereinafter also simply referred to as “film”).
The prepared oligomer sealing agent solution for coating was uniformly coated on one side of the prepared film by the Mayer bar coating method. The coated film was passed through the oven, and the coating film was thermally cured to obtain an oligomer sealing layer having a thickness of 150 nm as an intermediate layer. As conditions for blowing hot air in the oven, the temperature was set to 150 ° C., the wind speed was set to 8 m / min, and the processing speed in the oven was adjusted so that the coated film passed through the oven in 20 seconds.
(3)導電層の作製
 共重合ポリエステルおよびポリウレタンを含む混合樹脂エマルションに、導電性高分子であるポリエチレンジオキシチオフェン(PEDOT)およびポリスチレンスルホネート(PSS)が合計で1.0質量%混合された樹脂組成物(中京油脂社製;P-973、固形分10質量%)を、イソプロピルアルコールおよび精製水の混合液(混合比率1:1)にて固形分1.0質量%に希釈して、これを導電層形成用組成物とした。この導電層形成用組成物を、上記(2)で作製したオリゴマー封止層に均一に塗工し、120℃で1分間乾燥させて、厚さ100nmの導電層を作製した。
(3) Production of conductive layer Resin in which polyethylene dioxythiophene (PEDOT) and polystyrene sulfonate (PSS), which are conductive polymers, are mixed in a mixed resin emulsion containing copolyester and polyurethane in a total amount of 1.0% by mass. A composition (manufactured by Chukyo Yushi Co., Ltd .; P-973, solid content of 10% by mass) was diluted to a solid content of 1.0% by mass with a mixture of isopropyl alcohol and purified water (mixing ratio 1: 1). Was used as a composition for forming a conductive layer. This conductive layer forming composition was uniformly applied to the oligomer sealing layer prepared in the above (2) and dried at 120 ° C. for 1 minute to prepare a conductive layer having a thickness of 100 nm.
(4)粘着剤組成物A1の調製
 以下の材料を配合し、十分に撹拌して、塗布用粘着剤液としての粘着剤組成物A1を調製した。
 具体的には、ポリマー(X)100質量部に対し、帯電防止剤としてのケッチェンブラック1.5質量部を添加し、ディスパーを用いて、ポリマー(X)中にケッチェンブラックを分散させた。
 次に、ケッチェンブラックが分散したポリマー(X)に対し、粘着助剤12.5質量部(固形分)及び架橋剤8.75質量部(固形分)を添加し、メチルエチルケトンを用いて、固形分濃度30質量%の粘着剤組成物A1を調製した。
(4) Preparation of pressure-sensitive adhesive composition A1 The following materials were blended and stirred sufficiently to prepare pressure-sensitive adhesive composition A1 as a pressure-sensitive adhesive liquid for application.
Specifically, 1.5 parts by mass of ketjen black as an antistatic agent was added to 100 parts by mass of polymer (X), and ketjen black was dispersed in polymer (X) using a disper. .
Next, 12.5 parts by mass (solid content) of an adhesion assistant and 8.75 parts by mass (solid content) of a crosslinking agent are added to the polymer (X) in which ketjen black is dispersed, and solidified using methyl ethyl ketone. A pressure-sensitive adhesive composition A1 having a partial concentration of 30% by mass was prepared.
 -粘着剤組成物A1の調製に用いた材料-
・ポリマー(X):アクリル酸エステル共重合体、100質量部(固形分)
 アクリル酸エステル共重合体は、アクリル酸2-エチルヘキシル92.8質量%と、アクリル酸2-ヒドロキシエチル7.0質量%と、アクリル酸0.2質量%とを共重合して調製した。
・帯電防止剤:ケッチェンブラック〔ライオン・スペシャリティ・ケミカルズ社製、ED-600JD〕、1.5質量部
・粘着助剤:両末端水酸基水素化ポリブタジエン〔日本曹達(株)製;GI-1000〕、12.5質量部(固形分)
・架橋剤:ヘキサメチレンジイソシアネートを有する脂肪族系イソシアネート(ヘキサメチレンジイソシアネートのイソシアヌレート型変性体)〔日本ポリウレタン工業(株)製;コロネートHX〕、8.75質量部(固形分)
・希釈溶剤:メチルエチルケトン
-Materials used for preparation of adhesive composition A1-
-Polymer (X): Acrylate ester copolymer, 100 parts by mass (solid content)
The acrylic ester copolymer was prepared by copolymerizing 92.8% by mass of 2-ethylhexyl acrylate, 7.0% by mass of 2-hydroxyethyl acrylate, and 0.2% by mass of acrylic acid.
・ Antistatic agent: Ketjen Black (Lion Specialty Chemicals, ED-600JD), 1.5 parts by mass Adhesive aid: Hydroxylated polybutadiene at both ends (Nippon Soda Co., Ltd .; GI-1000) 12.5 parts by mass (solid content)
Crosslinking agent: aliphatic isocyanate having hexamethylene diisocyanate (isocyanurate-type modified product of hexamethylene diisocyanate) [manufactured by Nippon Polyurethane Industry Co., Ltd .; Coronate HX], 8.75 parts by mass (solid content)
・ Diluting solvent: Methyl ethyl ketone
(5)粘着剤層の作製
 剥離フィルムとして、シリコーン系剥離層を設けた透明ポリエチレンテレフタレートフィルム〔リンテック(株)製;SP-PET382150、厚さ38μm〕を準備した。
 調製した粘着剤組成物A1を、コンマコーター(登録商標)を用いて、剥離フィルムの剥離層面側に塗布し、90℃及び90秒間の加熱を行い、続いて115℃及び90秒間の加熱を行い、塗膜を乾燥させて、厚さ50μmの粘着剤層を作製した。
(5) Preparation of pressure-sensitive adhesive layer A transparent polyethylene terephthalate film (manufactured by Lintec Corporation; SP-PET 382150, thickness 38 μm) provided with a silicone-based release layer was prepared as a release film.
The prepared pressure-sensitive adhesive composition A1 is applied to the release layer side of the release film using a comma coater (registered trademark), heated at 90 ° C. for 90 seconds, and then heated at 115 ° C. for 90 seconds. The coating film was dried to produce an adhesive layer having a thickness of 50 μm.
(6)積層体の作製
 剥離フィルムの剥離層面側に作製された粘着剤層と、基材上にオリゴマー封止層を介して作製された導電層とを貼り合わせ、基材、オリゴマー封止層、導電層、粘着剤層、及び剥離フィルムからなる積層体を得た。
 その後、積層体から剥離フィルムを剥がし、実施例1の粘着シートを得た。
(6) Production of Laminate A pressure-sensitive adhesive layer produced on the release layer surface side of a release film and a conductive layer produced on the substrate via an oligomer sealing layer are bonded together to form a substrate and an oligomer sealing layer. The laminated body which consists of a conductive layer, an adhesive layer, and a peeling film was obtained.
Thereafter, the release film was peeled off from the laminate, and the pressure-sensitive adhesive sheet of Example 1 was obtained.
(実施例2)
 粘着剤組成物A1の調製において、ケッチェンブラックに代えて、カーボンナノチューブ(Kumho Petrochemical社製;K-Nanos 100P)を2.0質量部添加して粘着剤組成物A2を調製した。
 この粘着剤組成物A2を用いて粘着剤層を作製したこと以外、実施例1と同様にして実施例2の粘着シートを得た。
(Example 2)
In the preparation of the pressure-sensitive adhesive composition A1, pressure-sensitive adhesive composition A2 was prepared by adding 2.0 parts by mass of carbon nanotubes (manufactured by Kumho Petrochemical; K-Nanos 100P) instead of ketjen black.
A pressure-sensitive adhesive sheet of Example 2 was obtained in the same manner as Example 1 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition A2.
(実施例3)
 粘着剤組成物A1の調製において、ケッチェンブラックに代えて、イオン性液体(1)(1-エチル-3-メチルピリジニウムビス(トリフルオロメタンスルホニル)イミド)を1.0質量部添加して粘着剤組成物A3を調製した。
 この粘着剤組成物A3を用いて粘着剤層を作製したこと以外、実施例1と同様にして実施例3の粘着シートを得た。
Example 3
In the preparation of the pressure-sensitive adhesive composition A1, 1.0 part by mass of the ionic liquid (1) (1-ethyl-3-methylpyridinium bis (trifluoromethanesulfonyl) imide) was added instead of the ketjen black and the pressure-sensitive adhesive Composition A3 was prepared.
A pressure-sensitive adhesive sheet of Example 3 was obtained in the same manner as Example 1 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition A3.
(実施例4)
 粘着剤組成物A1に代えて、下記粘着剤組成物A4を用いて、実施例1と同様にして、基材、オリゴマー封止層、導電層、粘着剤層、及び剥離フィルムからなる積層体を得た。
 次に、粘着シートの剥離フィルム側越しから、紫外線照射装置として、アイグラフィックス社製、高圧水銀ランプを用い、照度200mW/cm、積算照射量200mJ/cmの条件で紫外線を照射した。
 その後、積層体から剥離フィルムを剥がし、実施例4の粘着シートを得た。
(Example 4)
Instead of the pressure-sensitive adhesive composition A1, the following pressure-sensitive adhesive composition A4 was used, and in the same manner as in Example 1, a laminate comprising a substrate, an oligomer sealing layer, a conductive layer, a pressure-sensitive adhesive layer, and a release film was prepared. Obtained.
Next, ultraviolet rays were irradiated from the side of the release film of the pressure-sensitive adhesive sheet under the conditions of an illuminance of 200 mW / cm 2 and an integrated irradiation amount of 200 mJ / cm 2 using a high-pressure mercury lamp manufactured by Eye Graphics as an ultraviolet irradiation device.
Thereafter, the release film was peeled off from the laminate, and the pressure-sensitive adhesive sheet of Example 4 was obtained.
・粘着剤組成物A4の調製
 以下の材料を配合し、十分に撹拌して、塗布用粘着剤液としての粘着剤組成物A4を調製した。
 具体的には、ポリマー(X)90質量部(固形分)及び帯電防止剤としてのイオンポリマー10.0質量部(固形分)を混合したポリマーに対し、粘着助剤を12.5質量部(固形分)、架橋剤を8.75質量部(固形分)、及び光重合開始剤(IGM Resins社製;Omnirad-127)を1.0質量部(固形分)添加し、メチルエチルケトンを用いて、固形分濃度30質量%の粘着剤組成物A4を調製した。
-Preparation of pressure-sensitive adhesive composition A4 The following materials were blended and sufficiently stirred to prepare pressure-sensitive adhesive composition A4 as a pressure-sensitive adhesive liquid for application.
Specifically, 12.5 parts by mass of an adhesion assistant is added to a polymer obtained by mixing 90 parts by mass (solid content) of polymer (X) and 10.0 parts by mass (solid content) of an ionic polymer as an antistatic agent. Solid content), 8.75 parts by mass of the cross-linking agent (solid content), and 1.0 parts by mass (solid content) of a photopolymerization initiator (IGM Resins; Omnirad-127) were added, and methyl ethyl ketone was used. A pressure-sensitive adhesive composition A4 having a solid content concentration of 30% by mass was prepared.
 -粘着剤組成物A4の調製に用いた材料-
・ポリマー(X):アクリル酸エステル共重合体(粘着剤組成物A1の調製で用いたポリマー(X)と同様)、90質量部(固形分)
・粘着助剤:両末端水酸基水素化ポリブタジエン〔日本曹達(株)製;GI-1000〕、12.5質量部(固形分)
・架橋剤:ヘキサメチレンジイソシアネートを有する脂肪族系イソシアネート(ヘキサメチレンジイソシアネートのイソシアヌレート型変性体)〔日本ポリウレタン工業(株)製;コロネートHX〕、8.75質量部(固形分)
・光重合開始剤:2-ヒロドキシ-1-[4-(4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル)フェニル]-2-メチル-プロパン-1-オン〔IGM Resin社製;Omnirad127〕、1.0質量部(固形分)
・希釈溶剤:メチルエチルケトン
・帯電防止剤:イオンポリマー(四級アンモニウムカチオンを含むポリマーにメタクリロイル基を付加した材料) 、10.0質量部(固形分)
 イオンポリマーは、下記の方法で作製した。
 「4級アンモニウムカチオンを有する重合性モノマー」としての[2-(メタクリロイルオキシ)エチル]トリメチルアンモニウム ビス(トリフルオロメチルスルホニル)イミド、反応性官能基を有する重合性モノマーとしてのメタクリル酸、並びに重合性モノマーとしてのアクリル酸2-エチルヘキシルおよびアクリル酸2-ヒドロキシエチルを、質量比が4級アンモニウムカチオンを有する重合性モノマー:メタクリル酸:アクリル酸2-エチルヘキシル:アクリル酸2-ヒドロキシエチル=44.27:4.68:40.24:4.63となるように共重合した。
 得られた重合体に、エネルギー線硬化性化合物としてのメタクリル酸グリシジルを(上記質量比に換算して6.18)を反応させ、イオンポリマー(側鎖にメタクリロイル基および4級アンモニウムカチオンを有する。)を得た。
 このイオンポリマーの分子量を既述の方法で測定したところ、重量平均分子量は170,000であった。
-Materials used for preparation of adhesive composition A4-
Polymer (X): acrylic acid ester copolymer (similar to polymer (X) used in the preparation of pressure-sensitive adhesive composition A1), 90 parts by mass (solid content)
-Adhesion aid: hydroxylated hydrogenated polybutadiene at both ends (manufactured by Nippon Soda Co., Ltd .; GI-1000), 12.5 parts by mass (solid content)
Crosslinking agent: aliphatic isocyanate having hexamethylene diisocyanate (isocyanurate-type modified product of hexamethylene diisocyanate) [manufactured by Nippon Polyurethane Industry Co., Ltd .; Coronate HX], 8.75 parts by mass (solid content)
Photopolymerization initiator: 2-hydroxy-1- [4- (4- (2-hydroxy-2-methyl-propionyl) -benzyl) phenyl] -2-methyl-propan-1-one [manufactured by IGM Resin; Omnirad 127], 1.0 part by mass (solid content)
・ Diluting solvent: Methyl ethyl ketone ・ Antistatic agent: Ionic polymer (material with methacryloyl group added to polymer containing quaternary ammonium cation) 10.0 parts by mass (solid content)
The ionic polymer was produced by the following method.
[2- (Methacryloyloxy) ethyl] trimethylammonium bis (trifluoromethylsulfonyl) imide as “polymerizable monomer having a quaternary ammonium cation”, methacrylic acid as a polymerizable monomer having a reactive functional group, and polymerizability A polymerizable monomer having a quaternary ammonium cation as a monomer having 2-ethylhexyl acrylate and 2-hydroxyethyl acrylate: methacrylic acid: 2-ethylhexyl acrylate: 2-hydroxyethyl acrylate = 44.27: Copolymerization was performed so that 4.68: 40.24: 4.63.
The resulting polymer is reacted with glycidyl methacrylate as an energy ray-curable compound (6.18 in terms of the above mass ratio) to have an ionic polymer (a methacryloyl group and a quaternary ammonium cation in the side chain). )
When the molecular weight of this ionic polymer was measured by the method described above, the weight average molecular weight was 170,000.
(実施例5)
 粘着剤組成物A1の調製において、ケッチェンブラックに代えて、ファーネスブラック(三菱ケミカル社製;製品名#3030B)5質量部及びイオン性液体(1)0.5質量部の混合物を添加して粘着剤組成物A5を調製した。
 この粘着剤組成物A5を用いて粘着剤層を作製したこと以外、実施例1と同様にして実施例5の粘着シートを得た。
(Example 5)
In the preparation of the pressure-sensitive adhesive composition A1, a mixture of 5 parts by mass of furnace black (manufactured by Mitsubishi Chemical; product name # 3030B) and 0.5 parts by mass of the ionic liquid (1) was added instead of ketjen black. An adhesive composition A5 was prepared.
A pressure-sensitive adhesive sheet of Example 5 was obtained in the same manner as Example 1 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition A5.
(実施例6)
 粘着剤組成物A1の調製において、ケッチェンブラックを2.5質量部添加して粘着剤組成物A6を調製した。
 この粘着剤組成物A6を用いて粘着剤層を作製したこと、及び導電層を作製しなかったこと以外、実施例1と同様にして実施例6の粘着シートを得た。
(Example 6)
In the preparation of the pressure-sensitive adhesive composition A1, 2.5 parts by mass of ketjen black was added to prepare a pressure-sensitive adhesive composition A6.
A pressure-sensitive adhesive sheet of Example 6 was obtained in the same manner as Example 1 except that the pressure-sensitive adhesive composition A6 was used to prepare a pressure-sensitive adhesive layer and the conductive layer was not prepared.
(実施例7)
 粘着剤組成物A1に代えて、下記粘着剤組成物B1を用いたこと以外は、実施例3と同様にして、実施例7の粘着シートを得た。
(Example 7)
A pressure-sensitive adhesive sheet of Example 7 was obtained in the same manner as Example 3 except that the following pressure-sensitive adhesive composition B1 was used instead of the pressure-sensitive adhesive composition A1.
・粘着剤組成物B1の調製
 以下の材料を配合し、十分に撹拌して、塗布用粘着剤液としての粘着剤組成物B1を調製した。
 具体的には、ポリマー(X)100質量部(固形分)に対し、帯電防止剤としてのイオン性液体(1)1.0質量部、架橋剤7.4質量部(固形分)、反応性官能基を有する低分子化合物23.3質量部(固形分)、光重合開始剤4.1質量部(固形分)を添加し、酢酸エチルを用いて、固形分濃度30質量%の粘着剤組成物B1を調製した。
-Preparation of pressure-sensitive adhesive composition B1 The following materials were blended and sufficiently stirred to prepare pressure-sensitive adhesive composition B1 as a pressure-sensitive adhesive liquid for application.
Specifically, with respect to 100 parts by mass (solid content) of the polymer (X), 1.0 part by mass of an ionic liquid (1) as an antistatic agent, 7.4 parts by mass (solid content) of a crosslinking agent, reactivity 23.3 parts by mass (solid content) of a low molecular compound having a functional group and 4.1 parts by mass (solid content) of a photopolymerization initiator are added, and an adhesive composition having a solid content concentration of 30% by mass using ethyl acetate. Product B1 was prepared.
 -粘着剤組成物B1の調製に用いた材料-
・ポリマー(X):アクリル酸エステル共重合体(粘着剤組成物A1の調製で用いたポリマー(X)と同様)、100質量部(固形分)
・帯電防止剤:イオン性液体(1)(1-エチル-3-メチルピリジニウムビス(トリフルオロメタンスルホニル)イミド)
・架橋剤:ヘキサメチレンジイソシアネートを有する脂肪族系イソシアネート(ヘキサメチレンジイソシアネートのイソシアヌレート型変性体)〔日本ポリウレタン工業(株)製;コロネートHX〕、7.4質量部(固形分)
・反応性官能基を有する低分子化合物:プロポキシ化ビスフェノールAジアクリレート〔新中村化学(株)社製;A-BPP〕
・光重合開始剤:2-ヒロドキシ-1-[4-(4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル)フェニル]-2-メチル-プロパン-1-オン〔IGM Resin社製;Omnirad127〕、4.1質量部(固形分)
・希釈溶剤:酢酸エチル
-Materials used for preparation of adhesive composition B1-
-Polymer (X): Acrylic ester copolymer (similar to polymer (X) used in the preparation of pressure-sensitive adhesive composition A1), 100 parts by mass (solid content)
Antistatic agent: ionic liquid (1) (1-ethyl-3-methylpyridinium bis (trifluoromethanesulfonyl) imide)
Crosslinking agent: aliphatic isocyanate having hexamethylene diisocyanate (isocyanurate type modified hexamethylene diisocyanate) [manufactured by Nippon Polyurethane Industry Co., Ltd .; Coronate HX], 7.4 parts by mass (solid content)
Low molecular weight compound having a reactive functional group: propoxylated bisphenol A diacrylate [manufactured by Shin-Nakamura Chemical Co., Ltd .; A-BPP]
Photopolymerization initiator: 2-hydroxy-1- [4- (4- (2-hydroxy-2-methyl-propionyl) -benzyl) phenyl] -2-methyl-propan-1-one [manufactured by IGM Resin; Omnirad 127], 4.1 parts by mass (solid content)
・ Diluting solvent: Ethyl acetate
(実施例8)
 ポリマー(X)90質量部(固形分)に対し、帯電防止剤としてのイオンポリマー10.0質量部、架橋剤7.4質量部(固形分)、反応性官能基を有する低分子化合物23.3質量部(固形分)、光重合開始剤4.1質量部(固形分)を添加し、酢酸エチルを用いて、固形分濃度30質量%の粘着剤組成物B2を調製した。
 なお、イオンポリマーは、粘着剤組成物A4の調製で用いたイオンポリマーと同様である。架橋剤、反応性官能基を有する低分子化合物、及び光重合開始剤は、粘着剤組成物B1の調製で用いた材料と同様である。
 この粘着剤組成物B2を用いて粘着剤層を作製したこと以外、実施例7と同様にして実施例8の粘着シートを得た。
(Example 8)
Low molecular weight compound having a reactive functional group, 10.0 parts by mass of an ionic polymer as an antistatic agent, 7.4 parts by mass (solid content), and a reactive functional group with respect to 90 parts by mass (solid content) of the polymer (X). 3 parts by mass (solid content) and 4.1 parts by mass (solid content) of a photopolymerization initiator were added, and an adhesive composition B2 having a solid content concentration of 30% by mass was prepared using ethyl acetate.
In addition, an ionic polymer is the same as the ionic polymer used by preparation of adhesive composition A4. The crosslinking agent, the low molecular compound having a reactive functional group, and the photopolymerization initiator are the same as the materials used in the preparation of the pressure-sensitive adhesive composition B1.
A pressure-sensitive adhesive sheet of Example 8 was obtained in the same manner as Example 7 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition B2.
(比較例1)
 粘着剤組成物A1の調製において、ケッチェンブラックを2.0質量部添加して粘着剤組成物A7を調製した。
 この粘着剤組成物A7を用いて粘着剤層を作製したこと、及び導電層を作製しなかったこと以外、実施例1と同様にして、比較例1の粘着シートを得た。
(Comparative Example 1)
In the preparation of the pressure-sensitive adhesive composition A1, 2.0 parts by mass of ketjen black was added to prepare a pressure-sensitive adhesive composition A7.
A pressure-sensitive adhesive sheet of Comparative Example 1 was obtained in the same manner as in Example 1 except that this pressure-sensitive adhesive composition A7 was used to prepare a pressure-sensitive adhesive layer and that a conductive layer was not prepared.
(比較例2)
 粘着剤組成物A1の調製において、ケッチェンブラックに代えて、イオン性液体(1)を1.0質量部添加して粘着剤組成物A8を調製した。
 この粘着剤組成物A8を用いて粘着剤層を作製したこと、及び導電層を作製しなかったこと以外、実施例1と同様にして、比較例2の粘着シートを得た。
(Comparative Example 2)
In the preparation of the pressure-sensitive adhesive composition A1, instead of ketjen black, 1.0 part by mass of the ionic liquid (1) was added to prepare a pressure-sensitive adhesive composition A8.
A pressure-sensitive adhesive sheet of Comparative Example 2 was obtained in the same manner as in Example 1 except that a pressure-sensitive adhesive layer was prepared using this pressure-sensitive adhesive composition A8 and a conductive layer was not prepared.
(比較例3)
 粘着剤組成物A1の調製において、ケッチェンブラックに代えて、イオン性液体(2)(1-ブチル-4-メチルピリジニウムヘキサフルオロホスファート)を1.0質量部添加して粘着剤組成物A9を調製した。
 この粘着剤組成物A9を用いて粘着剤層を作製したこと以外、実施例1と同様にして、比較例3の粘着シートを得た。
(Comparative Example 3)
In the preparation of the pressure-sensitive adhesive composition A1, 1.0 part by mass of the ionic liquid (2) (1-butyl-4-methylpyridinium hexafluorophosphate) was added in place of the ketjen black to add the pressure-sensitive adhesive composition A9. Was prepared.
A pressure-sensitive adhesive sheet of Comparative Example 3 was obtained in the same manner as in Example 1 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition A9.
(比較例4)
 粘着剤組成物A1の調製において、帯電防止剤を添加せずに粘着剤組成物A10を調製した。
 この粘着剤組成物A10を用いて粘着剤層を作製したこと以外、実施例1と同様にして、比較例4の粘着シートを得た。
(Comparative Example 4)
In preparing the pressure-sensitive adhesive composition A1, pressure-sensitive adhesive composition A10 was prepared without adding an antistatic agent.
A pressure-sensitive adhesive sheet of Comparative Example 4 was obtained in the same manner as in Example 1 except that a pressure-sensitive adhesive layer was produced using this pressure-sensitive adhesive composition A10.
 表1に、各例で得られた粘着シートの構成を示す。 Table 1 shows the configuration of the pressure-sensitive adhesive sheet obtained in each example.
 各例で得られた粘着シートを用いて以下の評価を行った。結果を表1に示す。 The following evaluation was performed using the adhesive sheet obtained in each example. The results are shown in Table 1.
〔帯電特性評価〕
(表面抵抗率)
 既述の方法により、粘着シートを、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における粘着剤層の表面抵抗率を測定した。
[Charging characteristics evaluation]
(Surface resistivity)
The surface resistivity of the pressure-sensitive adhesive layer after the pressure-sensitive adhesive sheet was heated at 190 ° C. for 60 minutes in a nitrogen atmosphere and then allowed to stand for 24 hours in an atmosphere at 23 ° C. and 50% RH was measured.
(帯電圧)
 既述の方法により、粘着シートを、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における粘着剤層の帯電圧を測定した。
(Battery voltage)
By the above-described method, the pressure-sensitive adhesive layer was measured after the pressure-sensitive adhesive sheet was heated at 190 ° C. for 60 minutes in a nitrogen atmosphere and then allowed to stand at 23 ° C. and 50% RH for 24 hours.
〔粘着力評価〕
(銅箔及びポリイミドフィルムに対する粘着力)
 既述の方法により、粘着シートを、100℃及び30分間の条件で加熱し、続いて180℃及び30分間の条件で加熱し、さらに190℃及び60分間の条件で加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における粘着剤層の銅箔に対する粘着力及びポリイミドフィルムに対する粘着力をそれぞれ測定した。
(Adhesive strength evaluation)
(Adhesive strength to copper foil and polyimide film)
According to the method described above, the pressure-sensitive adhesive sheet is heated at 100 ° C. for 30 minutes, subsequently heated at 180 ° C. for 30 minutes, further heated at 190 ° C. and 60 minutes, and then at 23 ° C. and The adhesive strength of the adhesive layer to the copper foil and the adhesive strength to the polyimide film after being allowed to stand for 24 hours in an atmosphere of 50% RH were measured.
〔残渣物評価〕
 銅箔(150mm×100mm、厚さ0.08mm、JIS H3100:2010 C1220R-H(延伸銅箔))の表面を、#800の水やすりで研磨し、銅箔の算術平均粗さRaが0.2±0.1μmとなるように研磨傷をつけた。この銅箔に、25mm×100mmに切り出した粘着シートを貼付した。なお、貼付は、JIS Z 0237:2009に準拠して行った。その後、上記粘着力評価と同様にして、粘着シートを、100℃及び30分間の条件で加熱し、続いて180℃及び30分間の条件で加熱し、さらに190℃及び60分間の条件で加熱し、室温(25℃)になるまで放冷した。
 放冷後の粘着シート(銅箔付き粘着シート)を、オートグラフ(島津製作所社製、オートグラフAG-IS 500N)を用いて、剥がし方向90度、及び剥離速度3mm/minで剥離し、剥離後の銅箔及び粘着シートをデジタル顕微鏡(キーエンス社製:デジタルマイクロスコープ、VHX-1000)にて観察し、糊残りの有無を確認した。観察倍率は500倍とした。
 糊残りしていない場合を「A」と判定し、部分的に糊残りした場合を「B」と判定した。
[Evaluation of residue]
The surface of a copper foil (150 mm × 100 mm, thickness 0.08 mm, JIS H3100: 2010 C1220R-H (stretched copper foil)) is polished with a # 800 water file, and the arithmetic average roughness Ra of the copper foil is 0.00. Polishing scratches were made so as to be 2 ± 0.1 μm. The adhesive sheet cut out to 25 mm x 100 mm was stuck on this copper foil. The pasting was performed in accordance with JIS Z 0237: 2009. Thereafter, in the same manner as the adhesive strength evaluation, the pressure-sensitive adhesive sheet is heated at 100 ° C. for 30 minutes, subsequently heated at 180 ° C. for 30 minutes, and further heated at 190 ° C. for 60 minutes. And allowed to cool to room temperature (25 ° C.).
The pressure-sensitive adhesive sheet (adhesive sheet with copper foil) after being allowed to cool is peeled off using an autograph (manufactured by Shimadzu Corporation, Autograph AG-IS 500N) at a peeling direction of 90 degrees and a peeling speed of 3 mm / min. The subsequent copper foil and the pressure-sensitive adhesive sheet were observed with a digital microscope (manufactured by Keyence Corporation: Digital Microscope, VHX-1000) to confirm the presence or absence of adhesive residue. The observation magnification was 500 times.
The case where no adhesive remained was determined as “A”, and the case where adhesive remained partially was determined as “B”.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
(表1の説明)
・「ポリマータイプ」とは、イオンポリマーを意味する。
・「有」は導電層があることを意味し、「無」は導電層がないことを意味する。
・「CNT」とは、カーボンナノチューブを意味する。
・「イオン液体1」とは、イオン性液体(1)を意味する。
・「イオン液体2」とは、イオン性液体(2)を意味する。
(Explanation of Table 1)
“Polymer type” means an ionic polymer.
“Yes” means that there is a conductive layer, and “No” means that there is no conductive layer.
“CNT” means carbon nanotubes.
“Ionic liquid 1” means ionic liquid (1).
“Ionic liquid 2” means the ionic liquid (2).
 実施例1~8の粘着シートは、窒素雰囲気下で190℃及び60分間加熱した後でも、粘着剤層の表面抵抗率が1011Ω/□未満であった。
 一方、比較例1~4の粘着シートは、高温加熱後において、粘着剤層の表面抵抗率が1011Ω/□以上であった。
 実施例3と比較例3との比較により、帯電防止剤としてイオン性液体(1)を用いた実施例3の粘着シートは、イオン性液体(2)を用いた比較例3の粘着シートに比べ、高温加熱後の表面抵抗率の上昇率(加熱後/加熱前)が大幅に抑制されていることがわかる。
 実施例1と比較例1との比較、及び実施例3と比較例2との比較により、導電層を有する実施例1、3の粘着シートは、導電層を有さない比較例1、2の粘着シートに比べ、高温加熱後の表面抵抗率の上昇率(加熱後/加熱前)が大幅に抑制されていることがわかる。
 また、実施例1~8の粘着シートは、高温加熱後でも粘着剤層の帯電圧は0.1kV未満であった。
 さらに、実施例1~8の粘着シートは、100℃及び30分間の条件で加熱し、続いて180℃及び30分間の条件で加熱し、さらに190℃及び60分間の条件で加熱した後でも、粘着剤層の銅箔に対する粘着力及びポリイミドフィルムに対する粘着力が共に確保されていた。残渣物評価も良好であった。
 したがって、本実施例の粘着シートによれば、高温で加熱される工程を経た後に、粘着シートを被着体から剥離しても、半導体素子の静電気破壊を抑制することができる。
In the pressure-sensitive adhesive sheets of Examples 1 to 8, the surface resistivity of the pressure-sensitive adhesive layer was less than 10 11 Ω / □ even after heating at 190 ° C. for 60 minutes in a nitrogen atmosphere.
On the other hand, the pressure-sensitive adhesive sheets of Comparative Examples 1 to 4 had a surface resistivity of 10 11 Ω / □ or more after high-temperature heating.
By comparing Example 3 with Comparative Example 3, the pressure-sensitive adhesive sheet of Example 3 using the ionic liquid (1) as the antistatic agent is compared with the pressure-sensitive adhesive sheet of Comparative Example 3 using the ionic liquid (2). It can be seen that the rate of increase in surface resistivity after high-temperature heating (after heating / before heating) is greatly suppressed.
According to the comparison between Example 1 and Comparative Example 1, and the comparison between Example 3 and Comparative Example 2, the adhesive sheets of Examples 1 and 3 having a conductive layer are those of Comparative Examples 1 and 2 having no conductive layer. It can be seen that the rate of increase in surface resistivity after high-temperature heating (after heating / before heating) is significantly suppressed as compared to the pressure-sensitive adhesive sheet.
In addition, in the pressure-sensitive adhesive sheets of Examples 1 to 8, the charged voltage of the pressure-sensitive adhesive layer was less than 0.1 kV even after high temperature heating.
Further, the pressure-sensitive adhesive sheets of Examples 1 to 8 were heated under the conditions of 100 ° C. and 30 minutes, subsequently heated under the conditions of 180 ° C. and 30 minutes, and further heated under the conditions of 190 ° C. and 60 minutes. Both the adhesive force to the copper foil of the adhesive layer and the adhesive force to the polyimide film were ensured. The residue evaluation was also good.
Therefore, according to the pressure-sensitive adhesive sheet of this example, the electrostatic breakdown of the semiconductor element can be suppressed even if the pressure-sensitive adhesive sheet is peeled off from the adherend after being subjected to a process of heating at a high temperature.
 10,10A,10B,10C,10D…粘着シート、11,11A,11B,11C,11D…基材、11a,11c,11e,11g,11i…第一基材面、11b,11d,11f,11h,11j…第二基材面、12,12A,12B,12C,12D…粘着剤層、12a,12c,12e,12g,12i…第一粘着面、12b,12d,12f,12h,12j…第二粘着面、13,13A,13B…導電層、14,14A…オリゴマー封止層、14B…プライマー層。 10, 10A, 10B, 10C, 10D ... Adhesive sheet, 11, 11A, 11B, 11C, 11D ... Base material, 11a, 11c, 11e, 11g, 11i ... First base material surface, 11b, 11d, 11f, 11h, 11j ... second substrate surface, 12, 12A, 12B, 12C, 12D ... adhesive layer, 12a, 12c, 12e, 12g, 12i ... first adhesive surface, 12b, 12d, 12f, 12h, 12j ... second adhesive Surface, 13, 13A, 13B ... conductive layer, 14, 14A ... oligomer sealing layer, 14B ... primer layer.

Claims (14)

  1.  粘着シート上の半導体素子を封止する際に使用される粘着シートであって、
     基材と、
     帯電防止剤を含む粘着剤層と、を備え、
     窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における前記粘着シートの前記粘着剤層の表面抵抗率が1011Ω/□未満である、
     粘着シート。
    A pressure-sensitive adhesive sheet used when sealing a semiconductor element on a pressure-sensitive adhesive sheet,
    A substrate;
    An adhesive layer containing an antistatic agent, and
    The surface resistivity of the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet is less than 10 11 Ω / □ after being heated at 190 ° C. for 60 minutes in a nitrogen atmosphere and then allowed to stand at 23 ° C. and 50% RH for 24 hours. ,
    Adhesive sheet.
  2.  窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における前記粘着シートの前記粘着剤層の帯電圧が0.1kV未満である、
     請求項1に記載の粘着シート。
    The charged voltage of the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet after being heated in a nitrogen atmosphere at 190 ° C. for 60 minutes and then allowed to stand in a 23 ° C. and 50% RH atmosphere for 24 hours is less than 0.1 kV.
    The pressure-sensitive adhesive sheet according to claim 1.
  3.  前記帯電防止剤は、炭素材料及びイオン性材料からなる群から選択される少なくとも1種を含む、
     請求項1または請求項2に記載の粘着シート。
    The antistatic agent includes at least one selected from the group consisting of a carbon material and an ionic material.
    The pressure-sensitive adhesive sheet according to claim 1 or claim 2.
  4.  前記炭素材料は、カーボンナノチューブ、グラフェン、及びカーボンブラックからなる群から選択される少なくとも1種である、
     請求項3に記載の粘着シート。
    The carbon material is at least one selected from the group consisting of carbon nanotubes, graphene, and carbon black.
    The pressure-sensitive adhesive sheet according to claim 3.
  5.  前記イオン性材料は、イオン性液体及びイオンポリマーからなる群から選択される少なくとも1種である、
     請求項3または請求項4に記載の粘着シート。
    The ionic material is at least one selected from the group consisting of an ionic liquid and an ionic polymer.
    The pressure-sensitive adhesive sheet according to claim 3 or claim 4.
  6.  前記帯電防止剤は、前記イオン性液体であるか、または前記イオン性液体と前記炭素材料との混合物である、
     請求項5に記載の粘着シート。
    The antistatic agent is the ionic liquid or a mixture of the ionic liquid and the carbon material.
    The pressure-sensitive adhesive sheet according to claim 5.
  7.  前記イオン性液体は、カチオンと、下記一般式(1)で表されるアニオンとを含む、
     請求項5または請求項6に記載の粘着シート。
    Figure JPOXMLDOC01-appb-C000001
    (一般式(1)において、R及びRは、それぞれ独立に、フッ素原子、または炭素数1以上8以下のパーフルオロアルキル基であり、R及びRは、同一または異なる。)
    The ionic liquid includes a cation and an anion represented by the following general formula (1).
    The pressure-sensitive adhesive sheet according to claim 5 or 6.
    Figure JPOXMLDOC01-appb-C000001
    (In General Formula (1), R 1 and R 2 are each independently a fluorine atom or a perfluoroalkyl group having 1 to 8 carbon atoms, and R 1 and R 2 are the same or different.)
  8.  前記イオン性液体の含有量は、前記粘着剤層全体に対して、0.01質量%以上10質量%以下である、
     請求項5から請求項7のいずれか一項に記載の粘着シート。
    The content of the ionic liquid is 0.01% by mass or more and 10% by mass or less with respect to the entire pressure-sensitive adhesive layer.
    The pressure-sensitive adhesive sheet according to any one of claims 5 to 7.
  9.  前記粘着剤層は、アクリル系粘着剤組成物を含有し、
     前記アクリル系粘着剤組成物は、アルキル基の炭素数が4以上12以下の(メタ)アクリル酸アルキルエステルを主たるモノマーとするアクリル系共重合体を含む、
     請求項1から請求項8のいずれか一項に記載の粘着シート。
    The pressure-sensitive adhesive layer contains an acrylic pressure-sensitive adhesive composition,
    The acrylic pressure-sensitive adhesive composition includes an acrylic copolymer having a main monomer of (meth) acrylic acid alkyl ester having an alkyl group having 4 to 12 carbon atoms,
    The pressure-sensitive adhesive sheet according to any one of claims 1 to 8.
  10.  前記粘着シートを、100℃及び30分間の条件で加熱し、続いて180℃及び30分間の条件で加熱し、さらに190℃及び60分間の条件で加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後における前記粘着剤層の銅箔に対する粘着力が、0.5N/25mm以上3.0N/25mm以下であり、かつ前記粘着剤層のポリイミドフィルムに対する粘着力が、0.50N/25mm以上2.00N/25mm以下である、
     請求項1から請求項9のいずれか一項に記載の粘着シート。
    The pressure-sensitive adhesive sheet is heated under conditions of 100 ° C. and 30 minutes, subsequently heated under conditions of 180 ° C. and 30 minutes, further heated under conditions of 190 ° C. and 60 minutes, and then in an atmosphere of 23 ° C. and 50% RH The pressure-sensitive adhesive strength of the pressure-sensitive adhesive layer to the copper foil after standing for 24 hours is 0.5 N / 25 mm to 3.0 N / 25 mm and the pressure-sensitive adhesive strength of the pressure-sensitive adhesive layer to the polyimide film is 0.00. 50N / 25mm or more and 2.00N / 25mm or less,
    The pressure-sensitive adhesive sheet according to any one of claims 1 to 9.
  11.  前記基材の前記粘着剤層の側における表面が導電性を有する、
     請求項1から請求項10のいずれか一項に記載の粘着シート。
    The surface of the substrate on the side of the pressure-sensitive adhesive layer has conductivity.
    The pressure-sensitive adhesive sheet according to any one of claims 1 to 10.
  12.  前記粘着シートを、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後、前記基材の前記粘着剤層の側における表面抵抗率が、10-7Ω/□以上10Ω/□以下である、
     請求項11に記載の粘着シート。
    The pressure-sensitive adhesive sheet was heated at 190 ° C. for 60 minutes in a nitrogen atmosphere and then allowed to stand for 24 hours in an atmosphere at 23 ° C. and 50% RH, and then the surface resistivity on the pressure-sensitive adhesive layer side of the substrate was 10 −7 Ω / □ or more and 10 7 Ω / □ or less,
    The pressure-sensitive adhesive sheet according to claim 11.
  13.  前記基材と、前記粘着剤層との間に導電層を有する、
     請求項1から請求項12のいずれか一項に記載の粘着シート。
    Having a conductive layer between the substrate and the adhesive layer;
    The pressure-sensitive adhesive sheet according to any one of claims 1 to 12.
  14.  前記粘着シートを、窒素雰囲気下で190℃及び60分間加熱し、次いで23℃及び50%RHの雰囲気下で24時間放置した後、前記導電層の前記粘着剤層の側における表面抵抗率が10-7Ω/□以上10Ω/□以下である、
     請求項13に記載の粘着シート。
    The pressure-sensitive adhesive sheet was heated at 190 ° C. for 60 minutes in a nitrogen atmosphere, and then allowed to stand for 24 hours in an atmosphere at 23 ° C. and 50% RH, and then the surface resistivity on the pressure-sensitive adhesive layer side of the conductive layer was 10 -7 Ω / □ or more and 10 7 Ω / □ or less,
    The pressure-sensitive adhesive sheet according to claim 13.
PCT/JP2019/021798 2018-06-13 2019-05-31 Adhesive sheet WO2019239925A1 (en)

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