WO2019222969A1 - 一种基于半球形微结构的柔性压力传感器及其制造方法 - Google Patents
一种基于半球形微结构的柔性压力传感器及其制造方法 Download PDFInfo
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- WO2019222969A1 WO2019222969A1 PCT/CN2018/088264 CN2018088264W WO2019222969A1 WO 2019222969 A1 WO2019222969 A1 WO 2019222969A1 CN 2018088264 W CN2018088264 W CN 2018088264W WO 2019222969 A1 WO2019222969 A1 WO 2019222969A1
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- carbon nanotube
- pdms
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/18—Measuring force or stress, in general using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material
Definitions
- the invention belongs to the technical field of flexible pressure sensors, and particularly relates to a flexible pressure sensor based on a hemispherical microstructure and a manufacturing method thereof.
- a pyramid groove array mold is made by photolithography and wet etching, and PDMS is poured into the mold to produce a PDMS substrate with a pyramid structure. Then a graphene oxide suspension is prepared, and then a layer-by-layer self-assembly method is used. A graphene film is made on a pyramid-shaped PDMS film. Finally, a graphene PDMS film is bonded to a PET film with an ITO coating, and electrodes are drawn on the film to complete the preparation of a flexible pressure sensor. This pressure sensor can measure a minimum pressure of 1.5Pa, the response time is only 0.2ms, and the sensitivity in the pressure range of 0 to 100Pa is -5.53 / kPa.
- a rail wafer mold having pyramid-shaped grooves was fabricated using photolithography. Mix PDMS and cross-linking agent in a ratio of 5: 1, and then dilute it with hexane and stir for more than 30 minutes. 100 ⁇ l of the diluted solution was coated on a mold and degassed. A 150-micron-thick PET film with an ITO conductive layer was treated with ultraviolet light for 20 minutes, and then the PET film was placed on a PDMS film in a vacuum environment. And apply a pressure of at least 100 MPa to the film for 4 hours under a temperature of 70 degrees Celsius, and finally connect wires at both ends of the film to make a sensor. Because the sensor has an easily deformed microstructure array, it achieves high-sensitivity measurement, and the sensitivity reaches 0.55 / kPa in the range of 2kPa.
- SWCNT single-walled carbon nanotube
- PSS polystyrene
- the PDMS solution was poured into a mold to make a 500-micron-thick PDMS film, and the PDMS surface was treated with oxygen plasma to obtain a hydrophilic surface.
- the 100-nm-thick PU-PEDOT: PSS composite elastomer layer was mixed from a solution of polyurethane (60% by weight) and PEDOT: PSS (40% by weight) and deposited on a substrate.
- the color of the tissue paper changed from white to dark red. After about ten times of repeated application and drying, until the resistance of the thin paper reached 2.5M ⁇ / sq.
- staggered Ti / Au electrodes were plated. The distance between adjacent electrodes is usually 0.1 mm, and the distance between the electrodes in the middle is 0.5 mm.
- Two 10x10mm2 contact plates are placed at both ends between the two electrodes and connected to external circuits. Finally, sandwich the film with AuNWs between the PDMS film with staggered electrodes and the blank PDMS film to form a sandwich-like structure.
- the sensor obtained by this method can measure a small pressure, and has a corresponding time of 17ms, and a sensitivity of 1.14 / kPa, which can realize real-time measurement of human pulse.
- a flexible pressure sensor based on a graphene microstructure array has a low sensitivity in an excessively high or low pressure range. As a result, the application range is small.
- a flexible sensor based on a microstructured rubber dielectric layer has a relatively low sensitivity and is only suitable for sensing static pressure.
- Gold nanowire-based flexible pressure sensors have low transparency, and the sensor has low sensitivity under a large amount of stretching, and even fails due to electrode breakage.
- the purpose of the present invention is to overcome the above-mentioned shortcomings of the prior art, and to provide a flexible pressure sensor based on a hemispherical microstructure and a manufacturing method thereof, which improve the measurement range, sensitivity, and reduce response time of the flexible pressure sensor.
- the technical solution of the present invention is: a flexible pressure sensor based on a hemispherical microstructure, including a PDMS flexible substrate layer, a carbon nanotube film, and a PDMS flexible film layer.
- the PDMS flexible substrate layer has a microstructure, and the microstructure is A spherical surface, the side of the PDMS flexible substrate layer having the microstructure is covered with the carbon nanotube film, and the carbon nanotube film is located between the PDMS flexible substrate layer and the PDMS flexible film layer An electrode is connected to the carbon nanotube film.
- the microstructure is hemispherical.
- the invention also provides a method for manufacturing a flexible pressure sensor, including the following steps:
- An electrode is connected to the carbon nanotube film.
- preparing the PDMS flexible substrate layer includes the following steps:
- a silicon wafer mold with a hemispherical groove structure is produced by using photo-etching technology
- preparing the carbon nanotube film includes the following steps:
- Step 1 Mixing hydrogen chloride and a hydrogen peroxide solution to obtain a mixed solution, and adding carbon nanotube powder to the mixed solution to heat;
- Step 2 The carbon nanotubes in step 1 are added to the dimethylformamide solution and evacuated and leaked. Finally, a layer of carbon nanotube films adhered to the leakage film is obtained.
- Step 3 Insert the leakage membrane obliquely into deionized water, and a layer of carbon nanotube film is separated from the carbon nanotube film obtained in step 2.
- Step 4 Take out the carbon nanotube film floating on the deionized water, and air dry it with a stream of nitrogen.
- step three a layer of carbon nanotube film with a thickness of 50-60 nm is separated from a carbon nanotube film with a thickness of 200-300 microns.
- covering the carbon nanotube film with a microstructured surface on the PDMS flexible substrate layer includes the following steps:
- the carbon nanotube film was transferred onto a PDMS flexible substrate layer with a hemispherical microstructure and heated.
- preparing the PDMS flexible film layer includes the following steps:
- the solution was spin-coated on a silicon wafer, heated, and then cooled, and the semi-cured PDMS flexible film layer on the silicon wafer was separated.
- the semi-cured PDMS flexible film layer is bonded to the carbon nanotube film and the PDMS flexible substrate layer, and heated.
- the electrodes are drawn on both sides of the carbon nanotube film of the intermediate layer.
- the invention provides a flexible pressure sensor based on a hemispherical microstructure and a manufacturing method thereof.
- the flexible pressure sensor uses a hemispherical internal structure, and the measurement range of the sensor is greatly improved. Carbon nanotubes make them have higher sensitivity, and by improving the manufacturing method, making flexible sensors is simpler and more feasible, reducing the difficulty of manufacturing, reducing labor costs, improving the efficiency of manufacturing, and achieving standardized manufacturing processes.
- FIG. 1 is a schematic sectional view of a flexible pressure sensor based on a hemispherical microstructure according to an embodiment of the present invention
- FIG. 2 is a schematic cross-sectional view of a silicon wafer mold used in a method for manufacturing a flexible pressure sensor according to an embodiment of the present invention
- FIG. 3 is a schematic plan view of a silicon wafer mold used in a method for manufacturing a flexible pressure sensor according to an embodiment of the present invention
- FIG. 4 is a reference flowchart of a method for manufacturing a flexible pressure sensor according to an embodiment of the present invention.
- a flexible pressure sensor based on a hemispherical microstructure includes a PDMS flexible substrate layer 1, a carbon nanotube film 2 and a PDMS flexible film layer 3, a PDMS flexible substrate layer 1, and PDMS.
- Flexible film layer 3 is made of PDMS, PDMS (polydimethylsiloxane) is the English abbreviation of polydimethylsiloxane. It has high transparency, good adhesion to silicon wafers, and good chemical inertness. It has good light transmission, good biocompatibility, and is easy to use. It is bonded to many materials at room temperature, and its structure is highly elastic due to its low Young's modulus.
- the PDMS flexible substrate layer 1 has a microstructure 11, and the microstructure 11 has a spherical convex shape, that is, the microstructure 11 may have a spherical crown shape. Preferably, the microstructure 11 may have a hemispherical shape.
- a plurality of microstructures 11 are provided, and the plurality of microstructures 11 are integrally formed in a matrix shape on one side of the PDMS flexible base layer 1.
- the side of the PDMS flexible substrate 1 having the microstructure 11 is covered with the carbon nanotube film 2, and the carbon nanotube film 2 is uniformly and closely covered with the microstructure 11 and the PDMS flexible substrate layer 1.
- the carbon nanotube film 2 is located between the PDMS flexible substrate layer 1 and the PDMS flexible film layer 3, and the carbon nanotube film 2 is connected to an electrode.
- the working principle of the flexible sensor is the piezoresistive effect. When the external environment applies a load to the flexible sensor, the internal hemispherical microstructure 11 is deformed, and the contact area between the hemispherical microstructure 11 and the substrate is reduced, making the flexible pressure The resistance of the sensor becomes smaller, resulting in an increase in the strength of the current.
- the hemispherical microstructure 11 After the load is released, due to the elastic characteristics of PDMS, the hemispherical microstructure 11 returns to the original state, so the flexible pressure sensor can measure the pressure by measuring the current, and the measurement range and sensitivity of the flexible pressure sensor are improved, and the response time is increased. shorten.
- An embodiment of the present invention also provides a method for manufacturing a flexible pressure sensor, which can be used to prepare the aforementioned flexible pressure sensor based on a hemispherical microstructure, including the following steps:
- An electrode is connected to the carbon nanotube film 2.
- preparing the PDMS flexible substrate layer 1 includes the following steps:
- a silicon wafer mold 4 having a hemispherical groove structure 41 is fabricated by using a photo-etching technique, and the hemispherical groove structure 41 can be used to mold a hemispherical microstructure 11;
- the silicon wafer mold 4 and the mixed solution are cooled, and the mixed solution is cooled and solidified to form a PDMS flexible base layer 1.
- the PDMS flexible base layer 1 is separated from the silicon wafer mold 4 to obtain a hemispherical microstructure. 11 of the PDMS flexible substrate layer 1.
- preparing the carbon nanotube film 2 includes the following steps:
- Step 1 Mixing hydrogen chloride and a hydrogen peroxide solution to obtain a mixed solution, and adding carbon nanotube powder to the mixed solution to heat;
- Step 2 The carbon nanotubes in step 1 are added to a dimethylformamide solution and evacuated and leaked. Finally, a layer of carbon nanotube film 2 attached to the leakage film is obtained.
- Step 3 The leakage membrane is obliquely inserted into deionized water, and a layer of carbon nanotube film 2 is separated from the carbon nanotube film 2 obtained in step 2.
- Step 4 The carbon nanotube film 2 floating on the deionized water is taken out and air-dried with a nitrogen stream.
- a layer of the carbon nanotube film 2 with a thickness of 50-60 nm is separated from the carbon nanotube film 2 with a thickness of 200-300 microns.
- covering the surface of the PDMS flexible substrate layer 1 with the microstructure 11 with the carbon nanotube film 2 includes the following steps:
- the carbon nanotube film 2 is transferred onto a PDMS flexible substrate layer 1 having a hemispherical microstructure 11 and then heated.
- preparing the PDMS flexible film layer 3 includes the following steps:
- the solution is spin-coated on a silicon wafer, heated, and then cooled, and the semi-cured PDMS flexible film layer 3 on the silicon wafer is separated.
- the semi-cured PDMS flexible film layer 3 is adhered to the carbon nanotube film 2 and the PDMS flexible substrate layer 1 and is heated.
- electrodes are drawn on both sides of the carbon nanotube film 2 in the intermediate layer.
- the first step a silicon wafer mold 4 having a hemispherical groove structure 41 is fabricated by using a photo-etching technique, as shown in FIGS. 2 and 3.
- Step 2 Mix the polydimethylsiloxane (PDMS) and the cross-linking agent at a weight ratio of 10: 1 for ten minutes, and then apply the solution on the silicon wafer mold 4 having a hemispherical groove structure 41 , Heated at 85 degrees Celsius for 60 minutes.
- PDMS polydimethylsiloxane
- the third step the solution temperature obtained above is cooled at room temperature, and the film is separated from the silicon wafer mold 4 after curing to obtain a PDMS film (PDMS flexible substrate layer 1) having a hemispherical microstructure 11.
- Step 4 Mix hydrogen chloride and hydrogen peroxide solution at a ratio of 3: 1, add 5 grams of carbon nanotube powder to the mixed solution, and heat at 60 degrees Celsius for 4 hours.
- the fifth step adding the treated carbon nanotubes to the dimethylformamide solution for vacuum leakage, and finally obtaining a carbon nanotube film attached to the leakage film.
- Step 6 Insert the leakage membrane obliquely into the deionized water at a 45-degree inclination angle, and a layer of 50-60 nm thick carbon nanotube film 2 is separated from the 200-300 micron thick carbon nanotube film.
- Step 7 Take out the carbon nanotube film 2 floating on the deionized water, and air-dry it with a stream of nitrogen.
- Step 8 Transfer the carbon nanotube film 2 to a PDMS film (PDMS flexible substrate 1) having a hemispherical microstructure 11 and heat it at 200-220 degrees Celsius for half an hour.
- a PDMS film PDMS flexible substrate 1 having a hemispherical microstructure 11 and heat it at 200-220 degrees Celsius for half an hour.
- Step 9 Mix polydimethylsiloxane (PDMS) and cross-linking agent at a weight ratio of 10: 1 and stir for ten minutes, and spin-coated on a silicon wafer at a speed of 900-1100 rpm, and heat it at 85 degrees Celsius for half After a few hours, the solution was cooled at room temperature to separate the semi-cured PDMS film (PDMS flexible film layer 3) on the silicon wafer.
- PDMS polydimethylsiloxane
- Step 10 Adhere the semi-cured PDMS flexible film layer 3 to the carbon nanotube film 2 and the PDMS flexible substrate layer 1, and heat them at 30 ° C for 30 minutes to perform tight adhesion (see Figure 1).
- Step 11 The electrodes are drawn out on both sides of the carbon nanotube film 2 in the intermediate layer, and the production of a flexible pressure sensor is completed.
- a flexible pressure sensor based on a hemispherical microstructure 11 and a method for manufacturing the same are provided in the embodiments of the present invention.
- the flexible pressure sensor uses a hemispherical internal structure, and the measurement range of the sensor is greatly improved.
- the conductivity of carbon nanotubes makes them have higher sensitivity, and by improving the production method, making flexible sensors is simpler and more feasible, reducing the difficulty of production, reducing labor costs, improving the efficiency of production, and achieving standardization Craftsmanship.
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Abstract
Description
Claims (10)
- 一种基于半球形微结构的柔性压力传感器,其特征在于,包括PDMS柔性基底层、碳纳米管薄膜和PDMS柔性薄膜层,所述PDMS柔性基底层具有微结构,所述微结构呈球面凸起状,所述PDMS柔性基底层具有所述微结构的一面覆盖有所述碳纳米管薄膜,且所述碳纳米管薄膜位于所述PDMS柔性基底层和所述PDMS柔性薄膜层之间,所述碳纳米管薄膜连接有电极。
- 如权利要求1所述的一种基于半球形微结构的柔性压力传感器,其特征在于,所述微结构呈半球形。
- 一种柔性压力传感器的制造方法,其特征在于,包括以下步骤:制备具有微结构呈球面凸起状的PDMS柔性基底层;制备碳纳米管薄膜;于所述PDMS柔性基底层具有微结构的表面覆盖所述碳纳米管薄膜;制备PDMS柔性薄膜层并将所述PDMS柔性薄膜层覆盖于所述碳纳米管薄膜;于所述碳纳米管薄膜连接电极。
- 如权利要求3所述的一种柔性压力传感器的制造方法,其特征在于,其中,制备所述PDMS柔性基底层包括以下步骤:采用光蚀刻技术制作出具有半球形凹槽结构的硅晶片模具;将PDMS与交联剂以10:1的重量比混合搅拌得到混合溶液,接着将所述混合溶液涂覆于具有半球形凹槽的所述硅晶片模具;加热所述硅晶片模具和所述混合溶液;冷却所述硅晶片模具和所述混合溶液,所述混合溶液冷却固化之后形成PDMS柔性基底层,将PDMS柔性基底层从所述硅晶片模具中分离出来,得到具有半球形微结构的PDMS柔性基底层。
- 如权利要求3或4所述的一种柔性压力传感器的制造方法,其特征在于,其中,制备所述碳纳米管薄膜包括以下步骤:步骤一:把氯化氢与过氧化氢溶液混合得到混合液,将碳纳米管粉末加入混合液中加热;步骤二:将步骤一中的碳纳米管加入二甲基甲酰胺溶液中抽真空渗漏,最后得到一层附着在渗漏膜上的碳纳米管薄膜;步骤三:将渗漏膜斜插入去离子水中,一层碳纳米管薄膜从步骤二中得到的碳纳米管薄膜上分离下来;步骤四:将漂浮在去离子水上的碳纳米管薄膜取出,用氮气流风干。
- 如权利要求5所述的一种柔性压力传感器的制造方法,其特征在于,在所述步骤三中,一层50-60nm厚的碳纳米管薄膜从200-300微米厚的碳纳米管薄膜上分离下来。
- 如权利要求3所述的一种柔性压力传感器的制造方法,其特征在于,于所述PDMS柔性基底层具有微结构的表面覆盖所述碳纳米管薄膜包括以下步骤:将碳纳米管薄膜转移至具有半球形微结构的PDMS柔性基底层上后加热。
- 如权利要求3所述的一种柔性压力传感器的制造方法,其特征在于,其中,制备PDMS柔性薄膜层包括以下步骤:将PDMS与交联剂以10:1的重量比混合搅拌得到溶液;将溶液旋涂在硅片上后加热,之后冷却,将硅片上的半固化的PDMS柔性薄膜层分离出来。
- 如权利要求8所述的一种柔性压力传感器的制造方法,其特征在于,将半固化的PDMS柔性薄膜层与碳纳米管薄膜和所述PDMS柔性基底层粘合,并加热。
- 如权利要求9所述的一种柔性压力传感器的制造方法,其特征在于,粘合后,在中间层的碳纳米管薄膜的两侧引出电极。
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