WO2019144404A1 - 金属增材制造方法及装置 - Google Patents
金属增材制造方法及装置 Download PDFInfo
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- WO2019144404A1 WO2019144404A1 PCT/CN2018/074456 CN2018074456W WO2019144404A1 WO 2019144404 A1 WO2019144404 A1 WO 2019144404A1 CN 2018074456 W CN2018074456 W CN 2018074456W WO 2019144404 A1 WO2019144404 A1 WO 2019144404A1
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- target
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- laser
- metal
- plasma
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
Definitions
- the present disclosure relates to the field of additive manufacturing, and further relates to a method of producing a metal additive and a device for manufacturing a metal additive.
- FDM Fused Deposition Modeling
- SLS Selective Laser sintering
- LCD Laser Cladding Deposition
- an object of the present disclosure is to provide a metal additive manufacturing method and apparatus to solve at least some of the technical problems described above.
- a metal additive manufacturing method comprising the steps of:
- the laser beam is emitted by the LIPAM process to irradiate the metal target to convert the surface atoms of the target into plasma;
- the relative position and angle relationship between the target and the substrate are adjusted to control the adhesion and deposition position of the plasma on the substrate, so that the layered structure grows according to the three-dimensional model.
- the pulsed laser parameters include: pulse width, repetitive frequency, energy, spot size, and/or number of pulses.
- the process environmental parameters include vacuum and/or temperature.
- a shielding gas is also introduced during irradiation of the metal target with a laser beam to effect deceleration control of the plasma transmission.
- irradiating the metal target with the emitted laser beam comprises: emitting a plurality of lasers or splitting the single laser to respectively irradiate the metal targets of different materials.
- a metal additive manufacturing apparatus comprising:
- a laser for emitting a laser beam to irradiate the target to generate a plasma
- An optical shaping and optical path control module for controlling the laser beam transmission path and adjusting a beam spot size
- Laser parameter detection feedback module for laser energy and re-frequency detection and control, and feedback adjustment of the laser according to preparation requirements and status
- Environmental parameter detection feedback module for monitoring and controlling process environmental parameters
- a target displacement module for fixing the target and adjusting the position of the target
- An additive manufacturing device control module configured to construct a three-dimensional model of the workpiece to be manufactured, electrically connected to the target displacement module and the substrate, for adjusting a relative position and an angle relationship between the target and the substrate to control the plasma on the substrate Attached to the sedimentation site.
- a vacuum chamber is further included, the substrate and target displacement plate being disposed within the vacuum chamber.
- the vacuum chamber is also provided with an observation window for additive manufacturing status monitoring and manufacturing process display.
- the substrate includes a heating module for heating the substrate.
- the target displacement module is plural, and each target displacement module is used to carry a target, and the materials of the targets are different.
- the material of the additive of the present disclosure is a plasma generated by laser irradiation of a metal material. Unlike powder materials in SLS and LCD technology, no preparation is required in advance. In the manufacturing process of LIPAM technology, the production of materials is synchronized with the production of the workpiece.
- the material composition of the articles of the present disclosure is controllable.
- SLS and LCD technology since the powder material is prepared in advance, the material cannot be easily changed, and for the alloy powder, the composition ratio is fixed.
- workpiece materials made with additive manufacturing equipment using SLS and LCD technology are identical.
- the laser irradiated targets are all high-purity metal materials, and multiple targets are irradiated by laser parameter adjustment to obtain different metal plasmas. By means of a linked scan, a manufactured part of different components, including elements and ratios, can be obtained.
- FIG. 1 is a process flow diagram of a method of manufacturing a metal additive according to an embodiment of the present disclosure.
- FIG. 2 is a schematic view of a metal additive manufacturing apparatus of an embodiment of the present disclosure.
- FIG 3 is a schematic view of a metal additive manufacturing apparatus according to another embodiment of the present disclosure.
- LIPAM LIPAM process adopted in the method for manufacturing a metal additive according to the embodiment of the present disclosure
- the Chinese is “laser-induced plasma additive manufacturing technology”
- the English is “Laser Induced Plasma Additive Manufacturing”, referred to as “LIPAM”
- the flow chart of the technical solution is as shown in the figure. As shown in Figure 1, the following steps can be included:
- a three-dimensional model of the workpiece to be manufactured may be constructed by a corresponding software of a control end (for example, a computer), and the workpiece to be manufactured may be various shapes, and may be various regular patterns including but not limited to a rectangular parallelepiped and a sphere. And ellipsoids, can also be irregular graphics composed of these regular graphics.
- the corresponding software can construct an overall three-dimensional model of the workpiece based on the finite element model. The model can be completed from the external input of the terminal or by drawing inside the control terminal.
- step S2 wherein the pulsed laser parameters are optimized, including pulse width, repetitive frequency, energy/power, spot size, and number of pulse action; and the preparation environment is controlled, including vacuum degree and temperature (where the temperature is the preparation environment) Temperature), protective gas concentration, etc.
- the vacuum in the working chamber is selected to be less than 1 ⁇ 10 -4 Pa.
- the selection of the laser source is first considered, and the optional laser source can be a nanosecond excimer laser and an ultraviolet picosecond laser.
- the step is a process of generating a plasma by laser irradiation.
- the target is heated to a sufficiently high temperature, the outer electrons of the element contained in the target are freed from the atomic nucleus and become free electrons, so the substance is positively charged.
- the nucleus and the negatively charged electron composition produce a plasma containing the target element.
- a shielding gas is also introduced during irradiation of the metal target with a laser beam to effect deceleration control of the plasma transmission.
- the metal target may be a plurality of targets, and a plurality of corresponding laser irradiations are also performed.
- a plurality of targets simultaneous growth of a plurality of metal elements can be realized, and the method for manufacturing the metal additive is expanded. Scope of application.
- the metal target can be a high purity metal block and high purity refers to a purity greater than 99.995 wt%.
- step S4 depositing a plasma on the substrate to form a layered structure, and heating the substrate.
- This step is mainly to control the deposition of plasma on the substrate, and in order to improve the adhesion effect, preferably, the substrate is heated during deposition.
- the target plane is aligned with the substrate and the generated plasma can be deposited as much as possible to increase sputtering efficiency.
- the position of the target and the substrate needs to be adjusted so that the plasma uniformly conforms to the required deposition on the substrate; and the growth range of each section is different due to the three-dimensionality of the three-dimensional model. It is also necessary to adjust the position of the target and the substrate to grow a workpiece that meets the specific shape requirements.
- the plasma deflection of the deposition may be through a control end (containing a three-dimensional model of the workpiece to be deposited that has been constructed) and then controlling the target and/or substrate motion.
- the manufacturing method of the metal additive of this specific example includes:
- Step 1 Construct a three-dimensional model of the workpiece to be manufactured by a computer.
- Step 2 Optimize the pulsed laser parameters, including pulse width, repetitive frequency, energy/power, spot size, and number of pulses; control the preparation environment, including vacuum, temperature (where the temperature is the temperature of the preparation environment), Protective gas concentration, etc.
- Step 3 Adjust the optical path and irradiate the 99.995 wt% high purity metal block target with a laser. Adjust the optical path to control the laser propagation path, focus the spot position and size.
- Step 4 The metal surface atoms are converted to plasma under laser irradiation.
- the parameters of the pulsed laser will affect the amount and momentum of plasma generation (this specific setting can be referred to the prior art optical path setting), the quantity will affect the preparation speed, and the momentum will affect the bonding strength of the part.
- Step 5 The plasma is jetted at a high speed in the direction of the normal to the surface of the target.
- the plasma transmission can be decelerated by controlling the concentration of the shielding gas.
- Step 6 The plasma is deposited on the substrate to form a layered structure.
- Step 7 Heating the substrate to enhance structural strength.
- Step 8 Perform beam-target-substrate linkage scanning according to the three-dimensional model built in step 1.
- the beam-target linkage scanning is to adjust the laser irradiation position to make the metal surface ablate uniformly;
- the target-substrate linkage scanning is to adjust the relative position and angle relationship between the target and the substrate, and control the plasma adhesion and deposition position, so that the layered structure can be Grow in a three-dimensional model.
- a metal additive manufacturing apparatus of an embodiment of the present disclosure.
- the device may include the following components:
- a metal additive manufacturing apparatus is provided, as shown in FIG. 2, the apparatus includes:
- a laser 21 is used to emit a laser beam to irradiate the target to generate a plasma 28; the generated plasma 28 is mainly composed of a metal plasma and is ejected at a high speed in the positive direction of the normal surface of the target.
- An optical shaping and optical path control module 22 for controlling the laser beam transmission path and adjusting the beam spot size
- the laser parameter detection feedback module 23 is used for laser energy and re-frequency detection and control, and performs feedback adjustment on the laser according to preparation requirements and states;
- the environmental parameter detection feedback module 5 is used for monitoring and controlling process environment parameters
- a target displacement module 26 for fixing the target 27 and adjusting the position of the target
- the substrate 210 is used for manufacturing the adhesion deposition of the workpiece 29; the layer 28 is formed by the plasma 28, and the layered structure formed after the deposition is stacked in a three-dimensional model.
- the additive manufacturing device control module 212 is configured to construct a three-dimensional model of the workpiece 29 to be fabricated, which is electrically connected to the target displacement module and the substrate 210 for adjusting the target and the substrate phase.
- the laser 21 can be specifically a pulse laser in the ultraviolet band, and is easy to ablate the metal; the pulse width can be selected in the nanosecond, picosecond or femtosecond order according to specific requirements.
- the specific requirement is that the cost of a nanosecond laser is usually lower than that of a picosecond laser, and the maturity is higher; the picosecond can adopt a high repetition frequency to increase the preparation rate.
- the laser parameters required for different targets are slightly different. If an alloy workpiece is manufactured, it is necessary to use a single laser beam splitting adjustment or multiple lasers for parameter adjustment to irradiate the target.
- the optical shaping and optical path control module 22 it is used to control the laser transmission path to adjust the spot size.
- the component light structure, the galvanometer, the focusing mirror, and the like may be included.
- the specific arrangement may refer to the prior art optical path focusing, and the disclosure is not limited thereto.
- the laser parameter detection feedback module 23 is used for laser energy and re-frequency monitoring, and the laser is feedback-adjusted according to preparation requirements and states.
- the fabrication process is performed in a vacuum chamber 24 for maintaining environmental requirements for laser additive manufacturing, including vacuum, protective gas (inert gas, such as argon) concentration, temperature, and the like.
- protective gas inert gas, such as argon
- the vacuum chamber may include a vacuum system including a vacuum evacuation system, a heating bake system, a vacuum measurement system, the vacuum system, a vacuum leak detection system, a mass spectrometry system, and a vacuum gas injection system.
- a vacuum system including a vacuum evacuation system, a heating bake system, a vacuum measurement system, the vacuum system, a vacuum leak detection system, a mass spectrometry system, and a vacuum gas injection system.
- the molecular pump is selected as the main pump for pumping
- the multi-stage Roots dry pump is used as the foreline pump.
- the gas source in the cavity mainly considers the gas source of the material surface. After preliminary estimation, the total pumping time from 1 atmosphere to 1 ⁇ 10 -4 Pa is about 3 hours.
- the heated bake system is required in order to rapidly release gas molecules or other organic matter adsorbed on the surface of the material in the cavity and discharge the working chamber from the vacuum pumping system.
- the components used for heating and baking are initially selected from a silicone rubber heating belt (SCS), a particularly soft heating belt composed of a nickel-chromium alloy wire and an insulating material.
- SCS silicone rubber heating belt
- the design has high power density, fast heat generation, high thermal efficiency and long service life. When installing, it can be attached to the surface of the heating structure, fixed by aluminum tape, and externally added to the insulation layer.
- For a vacuum measurement system it is used to measure the degree of vacuum in the working chamber. For a full range of 1 atmosphere to 1 x 10 -4 Pa, two sets of vacuum gauges with different ranges are used.
- the vacuum gauge is roughly selected for the general gauge tube with a measurement range of 1000 to 5 ⁇ 10 -9 mbar, and the membrane gauge with a measurement range of 1.1 to 1 ⁇ 10 -4 mbar is used for accurate vacuum measurement.
- the vacuum leak detection system it is used to measure the specific leak rate of the working chamber, and is mainly composed of a leak detector. Through the estimation of the leakage rate of the working cavity, it can be known that the leak detection rate of the leak detector is higher than 10 -10 Pa ⁇ m 3 /s.
- a mass spectrometry system it is used to measure the gas composition and partial pressure in the working chamber, and is mainly composed of a quadrupole mass spectrometer.
- the test results of the quadrupole mass spectrometer are required to ensure a clean working environment in the working chamber.
- a certain amount of working gas needs to be injected during the additive manufacturing process to accelerate the laser forming process.
- the working gas comes out of the cylinder, it passes through the shut-off valve, the pressure reducing valve and the flow controller that precisely controls the gas flow, and then the pipeline is connected to the working chamber.
- the environmental parameter detection feedback module 25 it is used for monitoring and controlling the environmental parameters of the vacuum chamber. It mainly includes a control terminal (such as a computer) and a monitoring device (such as an image recording device), and the monitoring device is connected to the control terminal for inputting the detected signal to the value control terminal for analysis by the control terminal.
- a control terminal such as a computer
- a monitoring device such as an image recording device
- the target displacement module 26 which is used for adjusting the position of the target, by adjusting the relative position and angle relationship between the target and the substrate, the target-substrate linkage scanning is realized, thereby controlling the plasma deposition and deposition position, so that the layered structure can be pressed.
- target 27 can be a high purity (purity of 99.995 wt% or more) metal block, as shown in Figure 2 as a single target.
- the substrate 210 it is used for the deposition deposition of the article, the position and angle can be adjusted, and the heating function is provided.
- a viewing window 211 is also provided on the vacuum chamber for additive manufacturing status monitoring and manufacturing process display.
- the additive manufacturing device control module 212 it is used to adjust the beam-target linkage scanning to adjust the laser irradiation position to ensure uniform ablation of the metal surface; and to adjust the target-substrate linkage scanning to control the relative position of the target and the substrate.
- the plasma is attached to the deposition site so that its layered structure can grow in a three-dimensional model.
- FIG 3 is a schematic view of a metal additive manufacturing apparatus according to another embodiment of the present disclosure.
- multiple laser beams can be used to simultaneously irradiate multiple targets, and multi-component alloy parts are formed at the substrate.
- the optical shaping and optical path control module 31 controls the first laser 32 and the second laser 34 (eg, both Nd:YAG lasers) to generate laser light, the first laser 32.
- the generated first laser light passes through the frequency multiplying amplification module 33, the high mirror 36, the high mirror 37 and the focusing lens 310, and then irradiates one of the targets 312 (for example, nickel palladium) to generate a first plasma 314, which is then deposited onto the substrate.
- the targets 312 for example, nickel palladium
- the second laser generated by the second laser 34 passes through the frequency multiplying amplification module 35, the high mirror 38, the high mirror 39 and the focusing lens 311, and then irradiates another target 313 (for example, aluminum palladium) to generate a second plasma.
- 315 is also deposited onto substrate 316.
- the first scanning linkage 320 is used to control the movement of the first target 312, the second scanning linkage 319 is used to control the movement of the second target 313, and the third scanning linkage 318 is used to control the movement of the substrate 316.
- an integral heating device 317 in contact with the substrate 316 may be provided to heat the substrate 316; a monitoring diagnostic device 322 and an observation window 323 may also be provided for timely observation and diagnosis of the metal additive manufacturing process.
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Abstract
一种金属增材制造方法,包括:构建待制造工件的三维模型;确定LIPAM工艺中脉冲激光参量和工艺环境参数;采用LIPAM工艺发射激光光束对金属靶材进行辐照,使靶材表面原子转换为等离子体;使等离子体在基底附着沉积形成层状结构,并且对基底进行加热;依照所述三维模型,调节靶材与基底相对位置和角度关系,以控制等离子体在基底上的附着沉淀位置,使得层状结构按三维模型生长。以及一种金属增材制造装置。该金属增材制造方法的材料为激光辐照金属材料产生的等离子体,无需提前制备,而且制件的材料组分可控。
Description
本公开涉及增材制造领域,进一步涉及金属增材的制造方法以及金属增材的制造装置。
材料科学与制造技术一直被人们所关注,增材制造作为一种符合节约型制造理念的技术更是成为了当今制造领域的关注热点,大众及媒体通常称之为“3D打印”。目前,这种增材制造技术常见的方法有熔融堆积快速成型技术(Fused Deposition Modeling,FDM)、选择性激光烧结成型技术(Selective Laser sintering,SLS)和激光熔覆沉积技术(Laser Cladding Deposition,LCD)。FDM是将丝状熔融材料由喷嘴挤压形成球状颗粒,排列组合后形成实物。这种增材制造技术简单、成本低,适合桌面级3D打印。但是这种制造精度较低,易受温度影响而使制品不稳定;同时其多采用塑料为原材料,不适合金属材料的增材制造。
对于金属材料的增材制造,通常采用SLS和LCD。两者均采用激光作为辅助制造手段,对金属粉末进行加工。前者的技术特征是粉床铺粉,后者的技术特征是同步送粉。但是,两者的作用对象(或者说加工材料)是金属粉末,这样除了增材制造设备需要复杂的送粉装置外,还会存在两个问题:(1)需要粉末制备环节,这样导致粉末制备与增材制造异步(不同时间、不同空间)进行;(2)制品材料组分受粉末材料制约,即若粉末为单一金属材料,制品材质为此金属,若粉末为合金材料,制品材质为该合金,且组分比例与粉末一致。
发明内容
有鉴于此,本公开的目的在于提供一种金属增材制造方法及装置, 以解决以上所述的至少部分技术问题。
根据本公开的一方面,提供一种金属增材制造方法,包括步骤:
构建待制造工件的三维模型;
确定LIPAM工艺中脉冲激光参量和工艺环境参数;
采用LIPAM工艺发射激光光束对金属靶材进行辐照,使靶材表面原子转换为等离子体;
使等离子体在基底附着沉积形成层状结构,并且对基底进行加热;
依照所述三维模型,调节靶材与基底相对位置和角度关系,以控制等离子体在基底上的附着沉淀位置,使得层状结构按所述三维模型生长。
在进一步的实施方案中,脉冲激光参量包括:脉宽、重频、能量、光斑尺寸和/或脉冲个数。
在进一步的实施方案中,所述工艺环境参数包括真空度和/或温度。
在进一步的实施方案中,在采用激光光束对金属靶材进行辐照时还通入保护气体,以对等离子体传输进行减速控制。
在进一步的实施方案中,发射激光光束对金属靶材进行辐照包括:发射多束激光或者对单束激光进行分束,分别对不同材料的金属靶材进行辐照。
根据本公开的另一方面,提供一种金属增材制造装置,包括:
激光器,用于发射激光光束以对靶材进行辐照,产生等离子体;
光学整形及光路控制模块,用于控制所述激光光束传输路径,以及调节光束光斑尺寸;
激光参量检测反馈模块,用于激光能量及重频检测和控制,并根据制备要求及状态,对激光器进行反馈调节;
环境参量检测反馈模块,用于工艺环境参数进行监测与控制;
靶材位移模块,用于固定靶材以及调节靶材位置;
基底,用于制造工件的附着沉积;
增材制造装置控制模块,用于构建待制造工件的三维模型,其与所述靶材位移模块和基底电性连接,用于调节靶材与基底相对位置和角度关系,以控制等离子体在基底上的附着沉淀位置。
在进一步的实施方案中,还包括真空腔室,所述基底和靶材位移板块设置于所述真空腔室内。
在进一步的实施方案中,所述真空腔室上还设置有观察窗,用于增材制造状态监控以及制造过程展示。
在进一步的实施方案中,所述基底上包括加热模块,用于对所述基底加热。
在进一步的实施方案中,所述靶材位移模块为多个,每一靶材位移模块用于承载一靶材,各靶材的材料不同
本公开的增材制造的材料为激光辐照金属材料产生的等离子体。不同于SLS与LCD技术中的粉末材料,无需提前制备。而LIPAM技术在制造过程中,材料的产生与工件的生产同步进行。
本公开的制件的材料组分可控。在SLS和LCD技术中,由于粉末材料为提前制备,材质无法轻易转变,且对于合金粉末,组分比例已固定。通常情况下,采用SLS和LCD技术的增材制造设备制造的工件材料是相同的。而在LIPAM技术中,激光辐照的靶材均为高纯度金属材料,通过激光参量调节对多个靶材进行辐照,从而获得不同金属等离子体。通过联动扫描,可以得到不同组分(包括元素与比例)的制造工件。
为了更清楚地说明本公开实施例的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域的普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他附图。
图1为本公开实施例金属增材的制造方法的工艺流程图。
图2为本公开实施例金属增材制造装置的示意图。
图3为本公开实施例另一方案的金属增材制造装置示意图。
下面结合本公开实施例中的附图,对本公开实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本公开一部分实施例,而不是全部的实施例。基于本公开的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本公开的保护范围。
本公开实施例金属增材的制造方法采用的LIPAM工艺,中文为“激光致等离子体增材制造技术”,英文为“Laser Induced Plasma Additive Manufacturing”,简称“LIPAM”,技术方案的流程图如图1所示,可以包括以下步骤:
S1:构建待制造工件的三维模型;
S2:确定LIPAM工艺中脉冲激光参量和工艺环境参数;
S3:采用LIPAM工艺发射激光光束对金属靶材进行辐照,使靶材表面原子转换为等离子体;
S4:使等离子体在基底附着沉积形成层状结构,并且对基底进行加热;
S5:依照所述三维模型,调节靶材与基底相对位置和角度关系,以控制等离子体在基底上的附着沉淀位置,使得层状结构按所述三维模型生长。
对于步骤S1,可以是通过控制端(例如计算机)的相应软件构建出待制造工件的三维模型,该待制造工件可以是各种形状,可以是各种规则图形,包括但不限于长方体、圆球和椭球,也可以是这些规则图形所组成的不规则图形。相应的软件可基于有限元模型构造出整体的工件三维模型。该模型可以从终端的外部输入或者在控制端内部经过绘图等方式完成。
对于步骤S2,其中优化脉冲激光参量,包括脉宽、重频、能量/功率、光斑尺寸及脉冲作用个数等;而对制备环境进行控制,包括真空度、温度(此处温度为制备环境的温度)、保护气体浓度等。
在一些实施例中,为了减少杂质气体对增材制造过程的影像,需要 维持工作腔体内干净的工作环境,选择工作腔体内的真空度小于1×10
-4Pa。
在一些实施例中,对于脉冲激光产量,首先考虑激光光源的选取,可选的激光光源可以为纳秒准分子激光器和紫外皮秒激光器。
对于步骤S3,该步骤为通过激光照射产生等离子体的过程,靶材被加热至足够高的温度时,靶材所含的元素的外层电子摆脱原子核束缚成为自由电子,因此物质由带正电的原子核以及带负电的电子组成,即产生含靶材元素的等离子体。
在一些实施例中,在采用激光光束对金属靶材进行辐照时还通入保护气体,以对等离子体传输进行减速控制。
在一些实施例中,金属靶材可以是多个靶材,相应的激光辐照也为多个,通过设置多个靶材可以实现含多种金属元素的同时生长,扩展金属增材制造方法的适用范围。
在一些实施例中,金属靶材可以为高纯度的金属块,高纯度指的是纯度高于99.995wt%。
对于步骤S4:使等离子体在基底附着沉积形成层状结构,并且对基底进行加热。该步骤主要在于控制等离子沉积于基底上,为了提高附着效果,在沉积时,优选的,对基底进行加热。
在一些实施例中,将靶材平面对准基底,所产生的等离子体能够尽可能的沉积至以提高溅射效率。
S5:依照所述三维模型,调节靶材与基底相对位置和角度关系,以控制等离子体在基底上的附着沉淀位置,使得层状结构按所述三维模型生长。
在一些实施例中,如待沉积工件过大,需要调节靶材与基底的位置,使等离子体在基底上均匀符合要求的沉积;在由于三维模型的立体性,各截面上生长范围存在区别,也要调节靶材与基底位置,生长符合特定形状要求的制造工件。
在一些实施例中,可通过控制端(内部含有已经构建好的待沉积工件的三维模型),然后控制靶材和/或基底运动,是沉积的等离子体偏转。
为进一步阐述本公开,以下例举一金属增材的制造方法的实例进行详细说明,这里的详细说明不对本公开构成限制,相反,它们提供本领域内技术人员理解由所附权利要求书的范围描述的实施例涵盖的替代形式、等效物、和修正例的基础。
本具体实例的金属增材的制造方法包括:
步骤1:通过计算机,构建待制造工件的三维模型。
步骤2:优化脉冲激光参量,包括脉宽、重频、能量/功率、光斑尺寸及脉冲作用个数等;对制备环境进行控制,包括真空度、温度(此处温度为制备环境的温度)、保护气体浓度等。
步骤3:调节光路,采用激光对99.995wt%高纯度金属块靶材进行辐照。调节光路控制激光传播路径,聚焦光斑位置和尺寸。
步骤4:在激光辐照下金属表面原子转换为等离子体。脉冲激光的参量将影响等离子体产生的数量、动量(该具体设置可参照现有技术光路设置进行),数量将影响制备速度,动量将影响制件结合强度。
步骤5:等离子体沿靶材表面正法线方向高速喷射。通过控制保护气体浓度,可对等离子体传输进行减速控制。
步骤6:等离子体在基底附着沉积形成层状结构。
步骤7:对基底进行加热,增强结构强度。
步骤8:依照步骤1中所建三维模型,进行光束-靶材-基底联动扫描。光束-靶材联动扫描是调节激光照射位置,使得金属表面烧蚀均匀;靶材-基底联动扫描是调节靶材与基底相对位置和角度关系,控制等离子体附着沉淀位置,使得其层状结构可以按三维模型生长。
图2为本公开实施例金属增材制造装置。装置中可包括如下组成部分:根据本公开实施例的另一方面,提供一种金属增材制造装置,如图2所示,该装置包括:
激光器21,用于发射激光光束以对靶材进行辐照,产生等离子体28;所产生的等离子体28主要由金属等离子体组成,沿靶材表面法线正方向高速喷射。
光学整形及光路控制模块22,用于控制所述激光光束传输路径,以 及调节光束光斑尺寸;
激光参量检测反馈模块23,用于激光能量及重频检测和控制,并根据制备要求及状态,对激光器进行反馈调节;
环境参量检测反馈模块5,用于工艺环境参数进行监测与控制;
靶材位移模块26,用于固定靶材27以及调节靶材位置;
基底210,用于制造工件29的附着沉积;通过等离子体28在基底上附着,沉淀后形成的层状结构,按三维模型堆积而成。
增材制造装置控制模块212,用于构建待制造工件29的三维模型,其与所述靶材位移模块和基底210电性连接,用于调节靶材与基底相。
其中,激光器21可具体为紫外波段脉冲激光器,易于烧蚀金属;脉宽可根据具体需求选用纳秒、皮秒或者飞秒级。具体需求是指纳秒激光器成本通常低于皮秒激光器,成熟度更高;皮秒可采用高重频,提高制备速率。不同靶材所需的激光参量略有不同,若制造合金工件,需要采用单台激光器分束调节或采用多台激光器进行参量调节,对靶材进行辐照。
对于光学整形及光路控制模块22,其用于控制激光传输路径,调节光斑尺寸。具体可包含转向光路、振镜、聚焦镜等元件结构,具体的设置方式可参照现有技术的光路聚焦涉及,本公开并不以此为限。
对于激光参量检测反馈模块23,用于激光能量及重频监控,并根据制备要求及状态,对激光器进行反馈调节。
在一些实施例中,制备工艺在真空室24中进行,真空室用于维持激光增材制造的环境需求,包括真空度、保护气体(惰性气体,如氩气)浓度、温度等参量。
该真空室可包括真空系统,真空系统包括真空抽气系统、加热烘烤系统、真空度测量系统该真空系统、真空检漏系统、质谱检测系统和真空注气系统。其中,对于真空抽气系统,选取分子泵作为抽气主泵,多级罗茨干泵作为其前级泵。在抽真空过程中,腔内气源主要考虑材料表面放气气源。经过初步估算,从1个大气压到1×10
-4Pa时的总抽气时间约为3小时。对于加热烘烤系统,为了使腔内材料表面吸附的气体分子 或其他有机物迅速释放并由真空抽气系统排出工作腔,需要该加热烘烤系统。加热烘烤所用元件初步选用硅橡胶加热带(SCS),一种由镍铬合金丝和绝缘材料组成的特别柔软的加热带,其设计功率密度高,发热快,热效率高,使用寿命长。安装时,可紧贴加热结构表面,以铝胶带固定,外测加复保温层。对于真空度测量系统,其用于测量工作腔内真空度。针对1个大气压到1×10
-4Pa的全量程,使用两组不同分量程的真空计。初步选用测量范围为1000~5×10
-9mbar的普通规管进行真空度粗测,测量范围为1.1~1×10
-4mbar的薄膜规管进行真空度精确测量。对于真空检漏系统,其用于测量工作腔具体漏率,主要由检漏仪组成。通过工作腔漏率估算,可以得知检漏仪的检漏率要高于10
-10Pa·m
3/s。对于质谱检测系统,其用于测量工作腔内气体组分和分压力,主要由四极质谱计组成。在达到本底真空度后开始激光成型前,需要用四极质谱计的测试结果来确保工作腔内干净的工作环境。对于真空注气系统,在增材制造过程中,需要注入一定量的工作气体来加速激光成型过程。工作气体由气瓶出来后,经过截止阀、减压阀和精确控制气体流量的流量控制器,再由管道连通到工作腔内。
对于环境参量检测反馈模块25,其用于真空室环境参量的监测与控制。主要包括控制端(例如计算机)和监测设备(例如影像摄录设备),该监测设备连接至控制端,用于将检测的信号输入值控制端以供控制端分析。
对于靶材位移模块26,其用于调节靶材位置,通过调节靶材与基底相对位置和角度关系,实现靶材-基底联动扫描,从而控制等离子体附着沉淀位置,使得其层状结构可以按三维模型生长。
在一些实施例中,靶材27可以是高纯度(纯度99.995wt%以上)金属块,图2中展示的为单个靶材。
对于基底210,其用于制件的附着沉积,可以调节位置与角度,并具备加热功能。
在一些实施例中,真空腔室上还设置有观察窗211,用于增材制造状态监控以及制造过程展示。
对于增材制造装置控制模块212,其用于调节光束-靶材联动扫描使调节激光照射位置,保证金属表面烧蚀均匀;还用于调节靶材-基底联动扫描以控制靶材与基底相对位置和角度关系,控制等离子体附着沉淀位置,使得其层状结构可以按三维模型生长。
图3为本公开实施例另一方案的金属增材制造装置示意图。在实际应用中可采用多激光束对多个靶材同步辐照,在基底处形成多组分合金制件。
如图3所示,光学整形及光路控制模块31(例如数据分析反馈系统及总控系统)控制第一激光器32和第二激光器34(例如均为Nd:YAG激光器)产生激光,第一激光器32产生的第一激光通过倍频放大模块33、高反镜36、高反镜37和聚焦透镜310后照射其中一个靶材312(例如为镍钯),产生第一等离子体314,后沉积至基底316上;第二激光器34产生的第二激光通过倍频放大模块35、高反镜38、高反镜39和聚焦透镜311后照射另一靶材313(例如铝钯),产生第二等离子体315后也沉积至基底316上。
第一扫描联动装置320用于控制第一靶材312的移动,第二扫描联动装置319用于控制第二靶材313的移动,第三扫描联动装置318用于控制基底316的移动,他们均连接至光学整形机光路控制模块31,由其控制移动。
另外,可以设置与基底316接触的整体加热装置317以对基底316进行加热;还可设置监控诊断装置322和观察窗323对金属增材制造过程进行及时观察和诊断。
以上所述的具体实施例,对本公开的目的、技术方案和有益效果进行了进一步详细说明,应理解的是,以上所述仅为本公开的具体实施例而已,并不用于限制本公开,凡在本公开的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本公开的保护范围之内。
Claims (10)
- 一种金属增材制造方法,其特征在于包括步骤:构建待制造工件的三维模型;确定LIPAM工艺中脉冲激光参量和工艺环境参数;采用LIPAM工艺发射激光光束对金属靶材进行辐照,使靶材表面原子转换为等离子体;使等离子体在基底附着沉积形成层状结构,并且对基底进行加热;依照所述三维模型,调节靶材与基底相对位置和角度关系,以控制等离子体在基底上的附着沉淀位置,使得层状结构按所述三维模型生长。
- 根据权利要求1所述的方法,其特征在于,脉冲激光参量包括:脉宽、重频、能量、光斑尺寸和/或脉冲个数。
- 根据权利要求1所述的方法,其特征在于,所述工艺环境参数包括真空度和/或温度。
- 根据权利要求1所述的方法,其特征在于,在采用激光光束对金属靶材进行辐照时还通入保护气体,以对等离子体传输进行减速控制。
- 根据权利要求1所述的方法,其特征在于,发射激光光束对金属靶材进行辐照包括:发射多束激光或者对单束激光进行分束,分别对不同材料的金属靶材进行辐照。
- 一种金属增材制造装置,其特征在于包括:激光器,用于发射激光光束以对靶材进行辐照,产生等离子体;光学整形及光路控制模块,用于控制所述激光光束传输路径,以及调节光束光斑尺寸;激光参量检测反馈模块,用于激光能量及重频检测和控制,并根据制备要求及状态,对激光器进行反馈调节;环境参量检测反馈模块,用于工艺环境参数进行监测与控制;靶材位移模块,用于固定靶材以及调节靶材位置;基底,用于制造工件的附着沉积;增材制造装置控制模块,用于构建待制造工件的三维模型,其与所 述靶材位移模块和基底电性连接,用于调节靶材与基底相对位置和角度关系,以控制等离子体在基底上的附着沉淀位置。
- 根据权利要求6所述的装置,其特征在于,还包括真空腔室,所述基底和靶材位移板块设置于所述真空腔室内。
- 根据权利要求7所述的装置,其特征在于,所述真空腔室上还设置有观察窗,用于增材制造状态监控以及制造过程展示。
- 根据权利要求6所述的装置,其特征在于,所述基底上包括加热模块,用于对所述基底加热。
- 根据权利要求6所述的装置,其特征在于,所述靶材位移模块为多个,每一靶材位移模块用于承载一靶材,各靶材的材料不同。
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