WO2019144336A1 - 一种太阳能电池组件 - Google Patents
一种太阳能电池组件 Download PDFInfo
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- WO2019144336A1 WO2019144336A1 PCT/CN2018/074083 CN2018074083W WO2019144336A1 WO 2019144336 A1 WO2019144336 A1 WO 2019144336A1 CN 2018074083 W CN2018074083 W CN 2018074083W WO 2019144336 A1 WO2019144336 A1 WO 2019144336A1
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- XDXWNHPWWKGTKO-UHFFFAOYSA-N 207739-72-8 Chemical class C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C2=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC(=CC=C1C1=CC=C(C=C13)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 XDXWNHPWWKGTKO-UHFFFAOYSA-N 0.000 claims abstract description 70
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 62
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 62
- 239000010703 silicon Substances 0.000 claims abstract description 62
- 238000004528 spin coating Methods 0.000 claims abstract description 59
- 229920000144 PEDOT:PSS Polymers 0.000 claims abstract description 31
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims abstract description 30
- 238000002360 preparation method Methods 0.000 claims abstract description 29
- 239000002070 nanowire Substances 0.000 claims abstract description 28
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims abstract description 28
- 239000004926 polymethyl methacrylate Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims abstract description 15
- 238000004140 cleaning Methods 0.000 claims abstract description 6
- 238000005530 etching Methods 0.000 claims abstract description 6
- 239000011521 glass Substances 0.000 claims abstract description 6
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 6
- 239000000243 solution Substances 0.000 claims description 82
- 238000000137 annealing Methods 0.000 claims description 40
- 239000002105 nanoparticle Substances 0.000 claims description 35
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 26
- 239000008393 encapsulating agent Substances 0.000 claims description 24
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 20
- 239000002135 nanosheet Substances 0.000 claims description 15
- 239000011787 zinc oxide Substances 0.000 claims description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 10
- 239000011259 mixed solution Substances 0.000 claims description 10
- 238000005240 physical vapour deposition Methods 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 238000003756 stirring Methods 0.000 claims description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 7
- KLULSCKBRGQDOY-UHFFFAOYSA-N 2-methylprop-2-enoic acid;toluene Chemical compound CC(=C)C(O)=O.CC1=CC=CC=C1 KLULSCKBRGQDOY-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 239000002041 carbon nanotube Substances 0.000 claims description 6
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 6
- INPLXZPZQSLHBR-UHFFFAOYSA-N cobalt(2+);sulfide Chemical compound [S-2].[Co+2] INPLXZPZQSLHBR-UHFFFAOYSA-N 0.000 claims description 6
- 239000003365 glass fiber Substances 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 6
- 239000004408 titanium dioxide Substances 0.000 claims description 6
- 239000002202 Polyethylene glycol Substances 0.000 claims description 5
- 239000008367 deionised water Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 5
- 150000002191 fatty alcohols Chemical class 0.000 claims description 5
- ZPIRTVJRHUMMOI-UHFFFAOYSA-N octoxybenzene Chemical compound CCCCCCCCOC1=CC=CC=C1 ZPIRTVJRHUMMOI-UHFFFAOYSA-N 0.000 claims description 5
- 229920001223 polyethylene glycol Polymers 0.000 claims description 5
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 5
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 5
- ITRNXVSDJBHYNJ-UHFFFAOYSA-N tungsten disulfide Chemical compound S=[W]=S ITRNXVSDJBHYNJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- VPQBLCVGUWPDHV-UHFFFAOYSA-N sodium selenide Chemical compound [Na+].[Na+].[Se-2] VPQBLCVGUWPDHV-UHFFFAOYSA-N 0.000 claims description 3
- 238000009987 spinning Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 239000000853 adhesive Substances 0.000 abstract 2
- 230000001070 adhesive effect Effects 0.000 abstract 2
- 238000005538 encapsulation Methods 0.000 abstract 2
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- ANYVXHHFKAYVSA-UHFFFAOYSA-N [Bi](=[Se])=[Se] Chemical compound [Bi](=[Se])=[Se] ANYVXHHFKAYVSA-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000005121 nitriding Methods 0.000 description 3
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 230000006750 UV protection Effects 0.000 description 1
- 229920000109 alkoxy-substituted poly(p-phenylene vinylene) Polymers 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 1
- 230000004224 protection Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/10—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising heterojunctions between organic semiconductors and inorganic semiconductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/88—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
- H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present invention relates to the field of solar cell technology, and in particular to a solar cell module.
- the organic-inorganic hybrid solar cell provides a production technology that can simplify the manufacturing steps and reduce the cost.
- the commonly used organic materials are P3HT, PEDOT: PSS, MEH- PPV and Spiro-OMeTAD, etc.
- the existing Spiro-OMeTAD solution is difficult to form a high quality film on the silicon surface. Therefore, in view of the above technical problems, it is necessary to modify the Spiro-OMeTAD solution to form a high-quality Spiro-OMeTAD layer, thereby obtaining a solar cell module having stable photoelectric conversion efficiency.
- a solar cell module includes a solar cell backsheet, a first EVA encapsulant, a solar cell sheet layer, a second EVA encapsulant, and a glass cover in order from bottom to top.
- a solar cell sheet layer comprising a plurality of solar cell sheets connected in series, the method for preparing the solar cell sheet specifically comprising the following steps:
- the first EVA encapsulant and the second EVA encapsulant comprise 100 parts by weight of EVA, 1-5 parts by weight of zinc oxide nanoparticles, 5-10 parts by weight of titanium dioxide nanoparticles, and 5-10 parts by weight of nitriding.
- the single silicon nanowires in the silicon nanowire array have a diameter of 300-600 nm and a length of 1-2 micrometers, and a spacing between adjacent silicon nanowires is 400. -800 nm.
- the temperature of the first annealing treatment is 110-120 ° C and the time is 5-10 minutes
- the temperature of the second annealing treatment is 100-110 ° C and the time is 10-15 minutes
- the first The temperature of the three annealing treatment is 120-130 ° C and the time is 20-25 minutes.
- the concentration of polymethyl methacrylate in the toluene solution of the polymethyl methacrylate is 1-4 mg/ml, and the polymethyl methacrylate in toluene solution is spin-coated.
- the speed is 5000-6000 rpm and the time is 1-5 minutes, the temperature of the fourth annealing treatment is 100-110 ° C and the time is 10-15 minutes.
- the front electrode is formed by a physical vapor deposition method, and the front electrode is a silver gate electrode, and the front electrode has a thickness of 100 to 150 nm.
- the back surface electrode is formed by a physical vapor deposition method
- the front surface electrode is an aluminum electrode
- the back surface electrode has a thickness of 150 to 200 nm.
- the EVA encapsulant of the invention is added with zinc oxide nanoparticles, titanium dioxide nanoparticles, aluminum nitride nanoparticles and glass fibers, which effectively improves the ultraviolet resistance and thermal conductivity of the EVA encapsulant.
- two modified modified Spiro-OMeTAD solutions and a modified PEDOT:PSS solution are prepared, wherein the first modified Spiro-OMeTAD layer is formed during the lower pass.
- the addition of alumina nanoparticles and zinc oxide nanoparticles to the PEDOT:PSS solution can effectively reduce the defect state of the silicon surface and improve the silicon nanowire array and Spiro- through the combination of alumina nanoparticles and zinc oxide nanoparticles.
- the contact performance of OMeTAD further increases the photoelectric conversion efficiency of the corresponding solar cell.
- the second modified Spiro-OMeTAD solution is added with a bismuth diselenide nanosheet, a tungsten disulfide nanosheet and a cobalt sulfide nanosheet, and the open circuit voltage and the filling factor of the corresponding solar cell are improved by the synergistic effect of the three, so that the electron hole is facilitated.
- silver metal powder and carbon nanotubes are added to the first modified PEDOT:PSS solution, which improves the conductivity and facilitates timely transport of holes to the front electrode.
- a polymethyl methacrylate layer is disposed between the silicon wafer and the back electrode, which effectively adjusts the contact performance between the silicon wafer and the back electrode, improves the electron transport performance, and optimizes the specific structure of the solar cell, and optimizes each
- the specific process parameters of the preparation process effectively improve the stability of the solar cell and the photoelectric conversion efficiency.
- FIG. 1 is a schematic structural view of a solar cell module of the present invention
- FIG. 2 is a schematic structural view of a solar cell sheet of the present invention.
- a solar cell module includes a solar cell backsheet, a first EVA encapsulant, a solar cell sheet layer, a second EVA encapsulant, and a glass cover plate in order from bottom to top.
- the solar cell sheet layer comprises a plurality of solar cell sheets connected in series, the first EVA encapsulant and the second EVA encapsulant comprising 100 parts by weight of EVA, 1-5 parts by weight of zinc oxide nanoparticles, 5-10 Parts by weight of titanium dioxide nanoparticles, 5-10 parts by weight of aluminum nitride nanoparticles and 3-6 parts by weight of glass fibers;
- the method for preparing the solar cell sheet specifically includes the following steps:
- a silicon nanowire array by metal ion assist etching on the upper surface of the n-type silicon wafer, wherein the silicon nanowire array has a diameter of 300-600 nm and a length of 1-2 micrometers.
- the spacing between adjacent silicon nanowires is 400-800 nm;
- the front electrode is formed by physical vapor deposition, the front electrode is a silver gate electrode, the front electrode has a thickness of 100-150 nm;
- the back electrode is formed by physical vapor deposition, the front electrode is an aluminum electrode, and the back electrode has a thickness of 150 to 200 nm.
- the solar cell module includes, in order from bottom to top, a solar cell backsheet 1, a first EVA encapsulant 2, a solar cell layer 3, a second EVA encapsulant 4, and a cover glass 5,
- the solar cell sheet layer 3 includes a plurality of solar cell sheets 6 connected in series, and the solar cell sheet 6 includes a back surface electrode 61, a polymethyl methacrylate layer 62, an n-type silicon wafer 63, and silicon nanowires from bottom to top.
- a solar cell module comprising, in order from bottom to top, a solar cell backsheet, a first EVA encapsulant, a solar cell sheet layer, a second EVA encapsulant, and a glass cover, the solar cell sheet layer comprising a plurality of solar cells connected in series, the first EVA encapsulant and the second EVA encapsulant comprising 100 parts by weight of EVA, 3 parts by weight of zinc oxide nanoparticles, 7 parts by weight of titanium dioxide nanoparticles, and 7 parts by weight of nitriding Aluminum nanoparticles and 5 parts by weight of glass fibers;
- the method for preparing the solar cell sheet specifically includes the following steps:
- the front electrode is formed by physical vapor deposition, the front electrode is a silver gate electrode, the front electrode has a thickness of 150 nm;
- the back electrode was formed by a physical vapor deposition method, and the front electrode was an aluminum electrode, and the back electrode had a thickness of 200 nm.
- the solar cell sheet has an open circuit voltage of 0.62 V, a short circuit current of 33.9 mA/cm 2 , a fill factor of 0.74, and a photoelectric conversion efficiency of 15.6%.
- a solar cell module comprising, in order from bottom to top, a solar cell backsheet, a first EVA encapsulant, a solar cell sheet layer, a second EVA encapsulant, and a glass cover, the solar cell sheet layer comprising a plurality of solar cells connected in series, the first EVA encapsulant and the second EVA encapsulant comprise 100 parts by weight of EVA, 5 parts by weight of zinc oxide nanoparticles, 10 parts by weight of titanium dioxide nanoparticles, and 5 parts by weight of nitriding Aluminum nanoparticles and 6 parts by weight of glass fibers;
- the method for preparing the solar cell sheet specifically includes the following steps:
- n-type silicon wafer is ultrasonically cleaned in acetone, ethanol and deionized water for 20 minutes, and then placed in a concentrated sulfuric acid/hydrogen peroxide mixed solution, the concentrated H 2 SO 4 /H 2
- the volume ratio of H 2 SO 4 to H 2 O 2 in the O 2 mixed solution is 3:1, soaked at 105 ° C for 30 minutes, and then the n-type silicon wafer is rinsed with water for use;
- the front electrode is formed by physical vapor deposition, the front electrode is a silver gate electrode, the front electrode has a thickness of 120 nm;
- the back electrode was formed by a physical vapor deposition method, and the front electrode was an aluminum electrode, and the back electrode had a thickness of 180 nm.
- the solar cell had an open circuit voltage of 0.59 V, a short-circuit current of 34.6 mA/cm 2 , a fill factor of 0.72, and a photoelectric conversion efficiency of 14.7%.
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Hybrid Cells (AREA)
Abstract
Description
Claims (7)
- 一种太阳能电池组件,其特征在于:所述太阳能电池组件从下到上依次包括太阳能电池背板、第一EVA封装胶、太阳能电池片层、第二EVA封装胶以及玻璃盖板,所述太阳能电池片层包括多个串联连接的太阳能电池片,所述太阳能电池片的制备方法具体包括以下步骤:(1)第一改性Spiro-OMeTAD溶液的配制:在1毫升氯苯溶液中加入5-10毫克Spiro-OMeTAD、3-5毫克氧化铝纳米颗粒以及2-6毫克氧化锌纳米颗粒,然后在40-60℃下搅拌均匀以备用;(2)第二改性Spiro-OMeTAD溶液的配制:在1毫升氯苯溶液中加入20-40毫克Spiro-OMeTAD、1-2毫克脂肪醇聚氧乙烯醚、3-8毫克二硒化铌纳米片、2-6毫克二硫化钨纳米片以及1-5毫克硫化钴纳米片,然后在40-60℃下搅拌均匀以备用;(3)第一改性PEDOT:PSS溶液的配制:在1克PEDOT:PSS溶液中加入40-60毫克二甲基亚砜、5-15毫克聚乙二醇辛基苯基醚、5-15毫克银金属粉末以及10-20毫克碳纳米管,然后在50-70℃下搅拌均匀以备用;(4)n型硅片的清洗:将n型硅片依次在丙酮、乙醇、去离子水中超声清洗10-20分钟,然后置于浓硫酸/双氧水混合溶液中,所述浓H 2SO 4/H 2O 2混合溶液中H 2SO 4与H 2O 2体积比为3:1,在100-120℃下浸泡20-30分钟,接着用水冲洗所述n型硅片以备用;(5)在n型硅片的上表面通过金属离子辅助刻蚀法形成硅纳米线阵列;(6)在所述硅纳米线阵列的表面旋涂所述第一改性Spiro-OMeTAD溶液,旋涂所述第一改性Spiro-OMeTAD溶液的旋涂速度为4000-6000转/分钟以及旋涂时间为3-6分钟,并进行第一次退火处理,以形成第一改性Spiro-OMeTAD层;(7)在所述第一改性Spiro-OMeTAD层的表面旋涂所述第二改性Spiro-OMeTAD溶液,旋涂所述第二改性Spiro-OMeTAD溶液的旋涂速度为3000-4000转/分钟以及旋涂时间为2-5分钟,并进行第二次退火处理,以形成第二改性Spiro-OMeTAD层;(8)在所述第二改性Spiro-OMeTAD层的表面旋涂所述第一改性PEDOT:PSS溶液,旋涂所述第一改性PEDOT:PSS溶液的旋涂速度为1500-2500转/分钟以及旋涂时间为1-4分钟,并进行第三次退火处理,以形成第三改性PEDOT:PSS层;(9)在所述n型硅片的下表面旋涂聚甲基丙烯酸甲酯的甲苯溶液,并进行第四次退火处理,以形成聚甲基丙烯酸甲酯层;(10)正面电极的制备;(11)背面电极的制备。
- 根据权利要求1所述的太阳能电池组件,其特征在于:所述第一EVA封装胶和所述第二EVA封装胶包括100重量份EVA、1-5重量份氧化锌纳米颗粒、5-10重量份二氧化钛纳米颗粒、5-10重量份氮化铝纳米颗粒以及3-6重量份玻璃纤维。
- 根据权利要求1所述的太阳能电池组件,其特征在于:在所述步骤(5)中,所述硅纳米线阵列中单根硅纳米线的直径为300-600纳米以及长度为1-2微米,相邻硅纳米线之间的间距为400-800纳米。
- 根据权利要求1所述的太阳能电池组件,其特征在于:所述第一次退火处理的温度为110-120℃以及时间为5-10分钟,所述第二次退火处理的温度为100-110℃以及时间为10-15分钟,所述第三次退火处理的温度为120-130℃以及时间为20-25分钟。
- 根据权利要求1所述的太阳能电池组件,其特征在于:在所述步骤(9)中,所述聚甲基丙烯酸甲酯的甲苯溶液中聚甲基丙烯酸甲酯的浓度为1-4mg/ml,旋涂聚甲基丙烯酸甲酯的甲苯溶液的速度为5000-6000转/分钟以及时间为1-5分钟,所述第四次退火处理的温度为100-110℃以及时间为10-15分钟。
- 根据权利要求1所述的太阳能电池组件,其特征在于:在所述步骤(10)中,通过物理气相沉积法形成所述正面电极,所述正面电极为银栅电极,所述正面电极的厚度为100-150纳米。
- 根据权利要求1所述的太阳能电池组件的制备方法,其特征在于:在所述步骤(11)中,通过物理气相沉积法形成所述背面电极,所述正面电极为铝电极,所述背面电极的厚度为150-200纳米。
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CN201810067074.5 | 2018-01-24 | ||
CN201810067074.5A CN108336229B (zh) | 2018-01-24 | 2018-01-24 | 一种太阳能电池片及其制备方法和一种太阳能电池组件 |
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CN106129252A (zh) * | 2016-07-18 | 2016-11-16 | 武汉大学 | 基于Spiro‑OMeTAD/PbS复合空穴传输层的钙钛矿太阳能电池及其制备方法 |
CN106784085A (zh) * | 2016-12-16 | 2017-05-31 | 成都佰思汇信科技有限责任公司 | 一种有机无机杂化太阳能电池组件及其制备方法 |
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