WO2019122131A1

WO2019122131A1 - Barometric liquid locks

Info

Publication number: WO2019122131A1
Application number: PCT/EP2018/086199
Authority: WO
Inventors: Christian Schwerdt; Andreas MONTKOWSKI
Original assignee: Thyssenkrupp Steel Europe Ag; Thyssenkrupp Ag
Priority date: 2017-12-22
Filing date: 2018-12-20
Publication date: 2019-06-27
Also published as: EP3728687A1; DE102017223778B4; DE102017223778A1

Abstract

The invention relates to a system for the continuous inward and/or outward transfer of material strips in vacuum installations and to a method for the continuous inward and/or outward transfer of material strips in vacuum installations.

Description

DESCRIPTION

title

Barometric fluid locks

State of the art

The present invention is based on a sluice device for material bands in vacuum chambers for treating the material strips in a vacuum. The inflow and outfeed of material bands, usually wound up in the form of coils, is labor-intensive, time-consuming and energy-intensive. For the lock process, the vacuum at the vacuum chamber must be broken and then the vacuum chamber evacuated again. In addition, it is particularly desirable in the processing of metal strips to treat them continuously and thus to prevent waste at the beginning and at the end and to be able to operate the processing processes with long-term stability.

State of the art for this purpose are different lock concepts, but all based on combinations of roles, sealing elements and calculated accepted leaks and flow resistance. EP 2 13 23 54 discloses a conventional lock concept. They are therefore all leaks, which must be permanently compensated by a variety of energy and maintenance-intensive vacuum pumps. Both in the case of bandwidth changes and changes in the thickness of the material through which the material passes, the locks must be elaborately adjusted or leaks must be compensated for by additional pumping power. In addition, the multiple, partially pressurized roller contact in a lock means problems for product quality.

Disclosure of the invention

It is therefore an object of the present invention to provide a device for the continuous sluice of material bands in vacuum chambers, which after evacuation of the vacuum chamber little or no further Vacuum pumps may be necessary, which operates regardless of strip thicknesses and / or bandwidths of the material band and which requires only a few one-sided roller contacts of the material strip. This object is achieved by a device for continuous introduction and / or removal of material bands in vacuum systems, wherein the device has a lock stage, wherein the lock stage has a siphon, wherein the siphon in the plane defined by the vertical and the horizontal plane a turn wherein the turn is placed so that the material band before moving through the turn has a downward movement component and that after passing through the turn the material strap has a movement component upwards, the turn being filled with a liquid, wherein the siphon has a connection region, the siphon connecting a first region of the device to a second region of the device. The siphon has a, preferably U-shaped, turn and a connection area. The connecting region joins the turn on one side of the turn and is preferably oriented vertically upwards. The turn is filled with a liquid, preferably water. Conceivable here would be another liquid such as an acid, preferably hydrochloric acid, or an oil. The siphon connects a first area to a second area. Because the turn is filled with the liquid, the first region is separated from the second region by the siphon in a gastight manner. A band of material can be guided by the siphon from the first area into the second area.

Advantageous embodiments and further developments of the invention are the dependent claims, as well as the description with reference to the drawings entnehmbar.

According to a preferred embodiment of the present invention, it is provided that the siphon is the only permeable connection between the first region and the second region. This ensures in an advantageous manner that no gas exchange can take place between the first region and the second region, and thus the pumping capacity can be at least significantly reduced after the evacuation of the second region. According to a further preferred embodiment of the present invention, it is provided that the second region has a vacuum pump. This can be lowered in the second area of the pressure. Conceivable here are pressure drops to the range of rough vacuum, ie about 300 mbar to 1 mbar. If the pressure is lowered in the second region, the air pressure in the first region presses onto the surface of the liquid in the siphon so that it sinks on the side of the first region and rises on the side of the second region in the connection region. In the connection area, a liquid column is formed, which is formed so high that its hydrostatic pressure equalizes the pressure on the surface of the liquid on the side of the first area. If an operating vacuum in the second range is reached, this state remains. The vacuum pump can be switched off and the siphon can be used to continuously feed a band of material from the first area to the second area. The rise height of the liquid column depends on the density of the liquid used and on the pressure difference between the first and second regions. With a pressure difference of 1 bar and the use of water as liquid, the height of rise of the liquid column would be about 10 m, with a pressure difference of 1 bar and the use of mercury as liquid, the height of rise of the liquid column would be 733 mm. The achievable with the device end pressure in the second region corresponds to the partial vapor pressure of the liquid used. If this is achieved, the liquid begins to boil in the second area and in a further evacuation, only the steam of the boiling liquid would be pumped out. If water is used as the liquid at room temperature, the partial vapor pressure is 33 mbar.

According to a further preferred embodiment of the present invention, it is provided that the siphon has a deflection device for deflecting the material band in the turn. Thus, the material band can be deflected at the reversal point of the turn of the siphon in its direction. Conceivable here is the use of a pulley. It is conceivable that the deflection roller is driven and thus prevents abrasion of the material strip. Furthermore, it is conceivable that the deflecting roller is provided with a profile through which liquid can advantageously be removed between the material band and the roller. It is preferably provided that the deflection roller is only partially immersed in the liquid and thus forms the inner part of the turn. Thus, it would be possible in an advantageous manner to suspend the deflection roller outside the fluid. The upper part of the deflection roller would thus form an intermediate wall between the first region and the connection region or the second region. It is conceivable to seal an emerging passage between the first area and the connection area or the second area at the upper part of the deflection roller and from the vacuum side the suspension by one or more scraper bars. Slight leaks in this preferred embodiment could be compensated for by vacuum pumps in the second area.

According to a further preferred embodiment of the present invention, it is provided that the deflection device is a semicircular surface, wherein the semicircular surface has bores. It is conceivable that within the semicircular surface, a pump for pumping the liquid is installed. This pump is connected to the holes in the semicircular surface so that it presses the liquid through the holes with slight overpressure in the turn against the material band and so creates a liquid cushion between the semicircular surface and the material band. Thus, it is possible to reverse the material band in its direction without contact with a solid surface. Damage or abrasion on the material band can thus be avoided.

According to a further preferred embodiment of the present invention, it is provided that in the direction of passage of the material strip after the siphon Abfettetrollen / squeeze rollers are mounted. Liquid adhering to the material band from the liquid-filled area of the siphon could have an influence on the processing process which is carried out on the material band. Squeegee rolls are used to remove macroscopic liquid residues on the material band.

According to a further preferred embodiment of the present invention, it is provided that the siphon has a reservoir filled with the liquid. If a pressure which is lower than the pressure in the first region prevails in the second region, a liquid column forms in the connection region. Due to the increase in the liquid level on the side of the second area, liquid is withdrawn from the side of the first area, which leads to a drop in the liquid level on this side. In order to prevent the liquid level from fluctuating too much under pressure fluctuations or even falling below the lower level of the turn and thus sucking air into the second area, a surge tank is attached to the siphon on the side of the first area. cher is a liquid reservoir. If the second area is vented, this expansion tank can also accommodate the volume of the liquid column of the connection area. Thus, fluctuations of the liquid level on the side of the first region are advantageously minimized.

According to a further preferred embodiment of the present invention it is provided that the siphon has a device for regulating the temperature of the liquid. The possible final vacuum in the second range depends on the partial vapor pressure of the liquid, which in turn depends on the temperature of the liquid. If, for example, water at room temperature has a partial vapor pressure of 33 mbar, then it is still at 10 mbar at 0 ° C. With a cooling of the liquid, the possible end vacuum in the second region can be improved in an advantageous manner. However, it would also be conceivable to heat the liquid in order, for example, to control chemical processes between the material band and the liquid during passage.

According to a further preferred embodiment of the present invention, it is provided that the second region has an element for heating the material strip. This advantageously makes it possible to vaporize microscopic adherences of the liquid to the material strip and thus to remove it before processing the material strip.

According to a further preferred embodiment of the present invention, it is provided that the second region has an element for heating walls of the second region. Liquid introduced from the web of material into the second region could condense on the walls of the second region. If this happens, it is difficult to prevent the liquid from dripping back onto the material band and thus causing problems when processing the material strip. On Heating the walls of the second region above the dew point of the liquid used at a given partial pressure in the second region advantageously prevents condensation of the liquid on the walls.

According to a further preferred embodiment of the present invention, it is provided that the second region has a capacitor. This capacitor could be designed as a component whose temperature is controlled so that it is always the lowest temperature in the second range. If liquid is introduced into the second area and evaporated, the point at which the liquid vapor condenses can advantageously be controlled by the placement of the condenser. It would be conceivable to choose a location for the condenser in the interior of the second area, where dripping liquid causes no damage but can be collected and removed. Alternatively, this is carried out in the form of an exhaust pump analogous to an evacuation device, in which the gas is supplied to the condenser via a piping system.

According to a further preferred embodiment of the present invention, it is provided that the device has a series arrangement of a plurality of lock stages. This advantageously makes it possible to introduce a heated strip of material in a previous processing step. In this case, the liquid of a first lock stage can absorb a large part of the heat of the material band and heat to, for example, 60 ° C. Conceivable here would be the dissipation of heat by means of a cooling tower. The evacuated area of the first lock stage in this case again has a residual gas pressure below the partial vapor pressure of the liquid of the first lock stage and therefore only has to be pumped off permanently if gases are introduced by the material band or occur in a reaction with the liquid. The liquid of a second lock stage thus only needs to absorb significantly less heat. It would also be conceivable to cool down a strip of material to below room temperature.

It would also be conceivable to use a first lock stage for cleaning the material strip. Thus, the liquid of a first lock stage, for example, an acid for pickling the material strip, preferably hydrochloric acid, be Liquid of a second lock stage could be warm water for rinsing the web of material and the liquid of a third lock stage could be cold water for pressure reduction. It is also conceivable to use squeeze rollers between the lock stages.

It is also conceivable to use a first sluice stage for discharging a material band heated in the vacuum chamber, in which the liquid is cold water and to use a second sluice stage in which the liquid is warm water. Due to the Leidenfrost effect, the fluid of the first lock stage hardly absorbs any heat. The heat release by the wetting of the surface of the strip material, which leads to the massive formation of steam, takes place only in the second lock stage. It is conceivable that the second lock stage is provided with strong vacuum pumps for maintaining the vacuum and / or with a condenser.

A further subject matter of the present invention for achieving the object stated at the outset is a method for the continuous introduction and / or discharge of material strips in vacuum systems with a device according to one of the preceding claims, wherein the material strip is guided through a lock step is passed, wherein the strip of material is passed through a filled with a liquid siphon, the material band is passed before passing through the siphon down and is passed after passing through the siphon upwards, the material band through the siphon of a first area is led into a second area. The method makes it possible to continuously feed in and out of material strips in vacuum chambers, with little or no further vacuum pumping being necessary after evacuation of the vacuum chamber. Furthermore, the method is independent of strip thicknesses and / or bandwidths of the material strip and makes it possible to manage with only a few one-sided roller contacts of the material strip. For sluicing from a first region into a second region, the material strip is guided from the first region through a liquid-filled siphon, the turn of which is preferably U-shaped, into a second region. The fact that the material band is guided through a liquid-filled compound prevents gas from being exchanged between the first region and the second region. According to a further preferred embodiment of the present invention it is provided that the second area is evacuated. By evacuating the second area, a treatment of the material band in the second area is made possible under vacuum. The gas-tight closure in the siphon makes it possible to pump the second area to an operating vacuum, preferably in the area of the rough vacuum, and then to shut off the vacuum pumps, without the vacuum breaking in the second area.

According to a further preferred embodiment of the present invention, it is provided that the material band in the siphon is deflected by a deflecting device. In this case, the running direction of the material strip is guided along the shape of the siphon. The siphon preferably has a U-shaped turn at the lowest point, through which the material band must be guided, that is, it is deflected by a downward movement in an upward movement.

According to a further preferred embodiment of the present invention, it is provided that the material strip is deflected on a semicircular deflection device with bores, wherein the liquid is pressed out of the bores with slight overpressure. It is conceivable that liquid is pressed through the bores outwards into the turn by a pump in the interior of the deflection device. If the material strip is guided along the deflection device, a liquid cushion is formed between the deflection device and the material strip. This advantageously makes it possible to deflect the material strip without contact with a solid surface.

According to a further preferred embodiment of the present invention, it is provided that the material strip is dried in the second area outside the liquid of squeezing rollers. This makes it possible to free the material band of macroscopic liquid adhesions, which can accumulate on the material band as the material band passes through the liquid-filled part of the siphon. According to a further preferred embodiment of the present invention, it is provided that the temperature of the liquid is regulated. This allows the partial vapor pressure of the liquid to be reduced. The quality of the vacuum in the second range depends on the partial vapor pressure of the liquid. If this is cooled, the partial vapor pressure drops and thus it is possible to set a better vacuum in the second range. Furthermore, it is conceivable that the liquid is heated in order to control possible chemical processes between the liquid and the material strip. Thus, it is conceivable that the liquid used is a warm acid for simultaneous cleaning of the material band during insertion.

According to a further preferred embodiment of the present invention, it is provided that the material strip is heated in the second region. In this way, microscopic liquid adhesions can advantageously be vaporized from the material strip. It would be conceivable, for example, that the material band is guided over heated rollers or that the material band is illuminated by an infrared lamp or a laser. If the material band is conductive, it is advisable to use preferably an adapted inductive heating. To prevent flashovers due to the vacuum, this preferably works at a low voltage <200 V.

According to a further preferred embodiment of the present invention it is provided that the temperature is controlled by walls of the second region. This makes it possible to prevent the condensation of liquid vapors on the walls of the second region and thus the uncontrolled dripping of the condensed liquid. Thus, an impairment of the processing of the strip of material can be avoided by dripping the liquid condensed on the walls of the second region onto the strip of material.

According to a further preferred embodiment of the present invention, it is provided that the material band is guided by a series arrangement of a plurality of lock stages. This advantageously makes it possible to introduce a heated strip of material in a previous processing step. In this case, the liquid of a first lock stage a large part absorb the heat of the material band and heat to, for example, 60 ° C. Conceivable here would be the dissipation of heat by means of a cooling tower. The evacuated area of the first lock stage in this case again has a residual gas pressure below the partial vapor pressure of the liquid of the first lock stage and therefore only has to be pumped off permanently if gases are introduced through the material band or occur in a reaction with the liquid. The liquid of a second lock stage thus only has to absorb significantly less heat. It would also be conceivable to cool down a strip of material below room temperature.

It would also be conceivable to use a first lock stage for cleaning the material strip. Thus, for example, an acid for pickling the material strip, preferably hydrochloric acid, could be used as the liquid of a first lock stage, liquid for a second lock stage could use warm water for rinsing the strip of material, and cold water for lowering the pressure could be used as the liquid of a third lock stage ,

It is also conceivable to use squeeze rollers between the lock stages.

Furthermore, it is conceivable to use a first lock stage for discharging a material band heated in the vacuum chamber, in which cold water is used as liquid and to use a second lock stage in which warm water is used as the liquid. Due to the Leidenfrost effect, the fluid of the first lock stage hardly absorbs any heat. The release of heat by the wetting of the surface of the material strip, which leads to the massive formation of steam, takes place only in the second lock stage. It is conceivable that the second lock stage is provided with strong vacuum pumps for maintaining the vacuum and / or with a condenser.

It is also conceivable, after discharging from the vacuum in a further lock stage to rinse the material band. It is also conceivable to passivate the material strip in another lock stage, for example to phosphatize. Further details, features and advantages of the invention will become apparent from the drawing, as well as from the following description of preferred embodiments with reference to the drawings. The drawing illustrates only exemplary embodiments of the invention, which do not limit the essential concept of the invention.

Short description of the drawing

FIG. 1 shows a schematic illustration of the device for the continuous introduction and / or removal of material strips in vacuum systems according to an exemplary embodiment of the present invention.

FIG. 2 shows a schematic illustration of the apparatus for the continuous introduction and removal of material bands in vacuum installations according to a further exemplary embodiment of the present invention.

FIG. 3 shows a schematic illustration of the deflection device in vacuum systems according to an exemplary embodiment of the present invention.

FIG. 4 shows a schematic illustration of the deflection device in vacuum systems according to a further exemplary embodiment of the present invention

Embodiments of the invention

In the various figures, the same parts are always provided with the same reference numerals and are therefore usually named or mentioned only once in each case.

FIG. 1 schematically shows the basic principle of the continuous introduction and / or removal of material strips in vacuum systems according to an exemplary embodiment of the present invention. A material band 7 is passed from above into a lock stage 1. The lock stage has a siphon 20 which has a turn 2 and a connection region 40. In the turn 2, the material band 7 is guided in a curve, so that the direction of movement of the material band 7 in front of the turn 2 has a directional component downwards and after the turn 2 has a directional component upwards. In the turn 2, the material band 7 is deflected by a deflection device 6. The siphon 20 is filled with a liquid 3. The siphon 20 connects a first area 4 to a second area 4 ', the siphon 20 being the only passage between the first area 4 and the second area 4'. When the second area 4 'is evacuated, the level of the liquid 3 in the connection area 40 rises to the level at which the hydrostatic pressure of the liquid column in the connection area 40 increases according to the difference between the pressure in the first area 4 and the pressure in the first area 4 second area 4 'corresponds. In this case, the second region 4 'can only be evacuated until the pressure in the second region 4' corresponds to the partial vapor pressure of the liquid 3. If the second region 4 'is further evacuated, the liquid 3 begins to boil in the second region 4' and only the vapor of the liquid 3 is pumped out of the second region 4 '. The liquid 3 is water. The water is cooled to 0.1 ° C. This allows the second area to be evacuated to around 10 mbar. The water in the siphon 20 closes the second region 4 'relative to the first region 4 gas-tight. When the final vacuum of 10 mbar is reached, the evacuation can be set and the vacuum in the second region 4 'is maintained.

In order to minimize level fluctuations of the water in the first region 4, the siphon 20 on the side of the first region 4 to a surge tank 9. This compensating tank 9 is a reservoir containing the liquid 3. In the case of the ventilation of the second region 4 ', this may also be the back-flowing water from the connection area 40 and provide during evacuation. The material strip 7 is now guided from the first region 4 through the liquid 3 into the siphon 20, where it is deflected by a deflection device 6 and introduced through the connection region 40 into the second region 4 '. To remove liquid adhesions, the material strip 7 passes through squeeze rolls 8 after leaving the liquid 3.

FIG. 2 schematically shows the basic principle of the continuous introduction and removal of material strips in vacuum systems according to a further exemplary embodiment of the present invention. Here, a plurality of lock stages 1 are connected in series. The material band 7 runs from a first region 4 through a siphon 20 into a second region 4 '. The liquid of the siphon 20 between the first region 4 and the second region 4 'is, for example, 60 ° C warm acid. The acid dekapiert the material band 7 for further processing. In the second region 4 ', the material strip 7 is dried by removal rollers 8. From the second region 4 ', the material strip 7 passes through a second siphon 21 into a third region 41. The liquid in the second siphon 21 is, for example, 60 ° C. warm water. By the 60 ° C warm water, the material band 7 is rinsed. The second region 4 'is evacuated to 0.6 bar. In order to maintain this pressure despite the hydrogen produced in the siphon 21, it must be evacuated permanently regulated. The gas-tight seal of the second region 4 'precludes the formation of an explosive atmosphere and the pumped-off hydrogen can be collected as a pure substance at the pump outlet and otherwise utilized economically. The third area 41 is evacuated to 0.3 bar. Here, the material strip 7 is dried by second squeezing rollers 80. From the third region 41, the material strip 7 is guided through a third siphon 22 into a fourth region 42. The third siphon 22 is filled with 4 ° C cold water. A heat pump 16 leads energy-saving the through the material band 7 permanently from the second siphon 21 into the third siphon 22 entrained heat energy from the liquid of the third siphon 22 of the liquid of the second Siphons 21 to. In the fourth region 42, the material strip 7 is freed of macroscopic liquid adhesions from third quenching rollers 81 and heated by a heated deflection roller 122, thereby freeing it from microscopic liquid adherence. The pressure in the fourth region 42 is up to the partial vapor pressure lowered the liquid in the third siphon 22. The fourth region 42 has a process chamber 17, in which a coating process takes place on the material strip 7 and the material strip 7 is strongly heated. The walls of the fourth area 42 are heated. Furthermore, a capacitor (not shown) is located away from the process chamber 17 away from the material band 7. At the condenser (not shown) condensed liquid vapor, which comes from the heated material band 7. In order to prevent the penetration of hydrogen from the fourth region 42 into the process chamber 17, for example, a permanent gas flow of an inert gas from the process chamber 17 is maintained. For example, this can be done with the capacitor, not shown, as a filter element, as described in DE 10 2017 221 346.9. An exemplary second embodiment, as described in DE 10 2017 221 346.9, can prevent the penetration of process residues from the process chamber 17 into the fourth region 42. The condensed liquid is discharged in a controlled manner, so that the coating process is not influenced by drops of the condensed liquid. From the fourth region 42, the material strip 7 is guided through a fourth siphon 23 into a fifth region 43. The liquid in the fourth siphon 23 is 4 ° C cold water. The highly heated in the process chamber 17 mate- rialband is guided in the 4 ° C cold water. Due to the large temperature difference between the material band 7 and water of the fourth siphon 23, there is a Leidenfrost effect between the material band 7 and the liquid of the fourth siphon 23. A thin layer of vapor prevents the material band 7 wets and larger amounts of heat to the liquid of the fourth siphon 23 and so large amounts of vapor in the fourth siphon 23 arise, which could get into the fourth region 42 and could not be dominated by the capacitor, not shown. By a fifth siphon 24, the material strip 7 is guided by the fifth region 43 in a sixth region 44. The pressure of the sixth region 44 is 1 bar. The liquid in the fifth siphon 24 is a passivation liquid, which passivates the material strip 7 during the discharge. The steams formed by the liquid during wetting and cooling of the metal strip 7 pass into the fifth region 43, where they are fed to a capacitor, not shown. The significantly higher vapor pressure possible there enables its control by the capacitor, not shown. Since the liquid in Siphon 24 can clearly heat up without exceeding the permitted partial pressure in the fifth region 43, a simple recooling of the liquid is over Cooling medium possible. In order to prevent contamination of the passivation fluid in the open cooling tower, a heat exchanger is interposed.

Figure 3 shows a schematic representation of a deflection device 6 according to a preferred embodiment of the present invention. The material band 7 is deflected by a reversing roller 12. The reversing roller 12 simultaneously forms a trunk 2 of a siphon 20. On the left side of the reversing roller 12 is a compensating tank 9 of the siphon 20 and on the right side of the reversing roller 12 is a connecting region 40 of the siphon 20. The reversing roller 12 is placed so that the suspension 13 of the reverse roller 12 does not come into contact with the liquid 3. This is achieved by separating the right side of the reversing roller 12 from the left side of the reversing roller 12 above the liquid in the region 4 and the reversing roller 12 in a gastight manner with a wall 15 and a scraper strip 14. This scraper strip is continued laterally (not shown) so that the wall 15, the scraper strip 14 and deflecting device 6 constitute a gas-tight partition or an extension of the wall 15

FIG. 4 shows a schematic sectional view of a deflection device 6 according to a further preferred embodiment of the present invention. The deflecting device 6 is designed as a semicircular surface 10. The semicircular surface 10 has a plurality of bores which connect an inner volume 100, which is enclosed by the semicircular surface 10 and a wall 15, and an outer volume 1000. The semicircular surface 10 forms a turn 2 of a siphon 20 and is immersed in a liquid 3 of the siphon 20. A pump 11 pumps the liquid 3 through the bores of the semicircular surface 10 so that a liquid cushion between a strip of material 7, which is passed by the outer volume 1000 on the semicircular surface 10, arises whose pressure the strip tension of the material band 7 at least kom- compensated. LIST OF REFERENCE NUMBERS

1 lock level

2 turn

20 siphon

3 liquid

4 First area

4 'connection area

40 Second area

41 Third area

42 Fourth area

43 fifth area

44 Sixth area 6 Reversing device 7 Material strip

8, 80, 81 squeezing rollers

9 expansion tank

10 Semicircular surface 100 Internal volume 1000 External volume 1 1 pump

12 reversing roller

122 Heated diverting pulley

13 suspension

14 scraper rail

15 wall

16 heat pump

17 process chamber

Claims

1. A device for continuous introduction and / or removal of material strips (7) in vacuum systems, wherein the device comprises a lock stage (1), wherein the lock stage comprises a siphon (20), wherein the siphon (20) in the through the vertical and the horizontal spanned plane has a turn (2), wherein the turn (2) is placed so that the material strip (7) before passing through the turn (2) has a component of movement down and that the material strip (7) after passing through the turn (2) has a movement component upwards, the turn (2) being filled with a liquid (3), the siphon (20) having a connection region (40), the siphon (20) having a first region (4 ) connects the device to a second area (4 ') of the device.

2. Device according to claim 1, wherein the siphon (20) is the only permeable connection between the first region (4) and the second region (4 ').

3. Device according to one of the preceding claims, wherein the second region (4 ') comprises a vacuum pump.

4. Device according to one of the preceding claims, wherein the siphon (20) has a deflection device (6) for deflecting the material strip (7) in the turn (2).

5. Device according to one of the preceding claims, wherein the deflecting device (6) is a semicircular surface (10), wherein the semi-circular surface (10) has bores.

6. Device according to one of the preceding claims, wherein in the direction of passage of the material strip (7) to the siphon (20) are arranged Abquetschrollen (8).

7. Device according to one of the preceding claims, wherein the siphon (20) has a filled with the liquid (3) expansion tank.

8. Device according to one of the preceding claims, wherein the siphon (20) comprises a device for regulating the temperature of the liquid (3).

9. Device according to one of the preceding claims, wherein the second region (4 ') comprises an element for Fleizen the material strip (7).

10. Device according to one of the preceding claims, wherein the second region (4 ') has an element for Fleizen walls of the second area (4').

11.Vorrichtung according to any one of the preceding claims, wherein the second region (4 ') comprises a capacitor.

12. Device according to one of the preceding claims, wherein the Vorrich- device has a series of rows of a plurality of lock levels (1).

13. A method for continuously introducing and / or discharging material strips (7) in vacuum systems with a device according to one of the preceding claims, wherein the material strip (7) through a lock stage (1) is guided wherein the strip of material is passed through a filled with a liquid (3) siphon (20), wherein the material strip (7) is passed before passing through the siphon (20) downwards and is passed after passing through the siphon (20) upwards , wherein the material band (7) is guided by the siphon (20) from a first region (4) into a second region (4 ').

14. The method of claim 13, wherein the second region (4 ') is evacuated.

15. The method according to any one of claims 13 to 14, wherein the material band (7) in the siphon (20) by a deflection device (6) is deflected.

16. The method of claim 13, wherein the material strip (7) on a semicircular deflection device with holes, wherein the liquid is pressed with slight overpressure from the holes, is deflected.

17. The method according to any one of claims 13 to 16, wherein the material band (7) in the second region (4 ') outside of the liquid (3) is dried by Abse set rolls.

18. The method according to any one of claims 13 to 17, wherein the temperature of the liquid (3) is regulated.

19. The method according to any one of claims 13 to 18, wherein the material band (7) in the second region (4 ') is heated.

20. The method according to any one of claims 13 to 19, wherein the temperature of walls of the second region (4 ') is controlled.

21.A method according to any one of claims 13 to 20, wherein the material band (7) is guided by a series of rows of a plurality of lock stages (1).