WO2019116449A1 - Treatment system - Google Patents

Abstract

A treatment system 1 includes: a plurality of heating units 17, 18 which are provided at different longitudinal positions on a heat exchange plate; a power source 31 which supplies an alternating current; a plurality of switches 81, 82 which are serially connected with the plurality of heating units 17, 18 respectively and which selects one heating unit of interest whereto the alternating current from the power source 31 is to be supplied from among the plurality of heating units 17, 18; a switch control unit 321 which sequentially switches the heating unit of interest; an index value measuring unit 322 which measures each of the index values of the temperatures of the plurality of heating units 17, 18; and an energization control unit 323 which controls the switching timing of the heating unit of interest and/or the power supplied to the heating unit of interest from the power source 31 on the basis of the index values. The index value measuring unit 322 measures the index value of a heating unit not of interest that was not selected as the heating unit of interest using leakage current flowing through the switch that is serially connected with the heating unit not of interest according to the capacitive component of the switch.

Description

Treatment system

The present invention relates to a treatment system.

Conventionally, a heat generating portion that generates heat when energized is provided, and a gripping portion that holds a biological tissue is provided, and the heat energy generated in the heat generating portion is applied to the biological tissue to treat the biological tissue (join A treatment system for (or anastomosis) and dissection etc.) is known (see, for example, Patent Document 1).
The treatment system described in Patent Document 1 adopts a configuration that solves the problem of uneven distribution load.
Here, the uneven distribution load means a state in which the living tissue is gripped by a part of the gripping surface, not the entire gripping surface that grips the living tissue in the gripping part.
For example, in the case where a single heat generating portion is provided over the entire surface of the gripping surface and the load is unevenly distributed, heat is applied to the portion of the heat generating portion covered by the living tissue with the living tissue. Due to the transmission, the temperature of the portion becomes lower than the target temperature. On the other hand, in the heat generating portion, in the portion which is not covered by the living tissue, the heat is not transmitted to the living tissue, so the temperature of the portion becomes higher than the target temperature. That is, there is a problem that the living tissue can not be heated at the target temperature, and the treatment time is long.
So, in the treatment system of patent document 1, the heat-emitting part is each provided in the position where the longitudinal direction of a holding part differs, and the structure which controls the said several heat-emitting part independently is employ | adopted. With such a configuration, even if the load is unevenly distributed, it is possible to heat the living tissue at the target temperature and appropriately treat the living tissue.

JP 2002-136525 A

However, in the treatment system described in Patent Document 1, a plurality of power supplies are required in order to supply power for energization to the plurality of heat generating units. Therefore, there is a problem that cost reduction can not be achieved.

The present invention has been made in view of the above, and it is an object of the present invention to provide a treatment system capable of appropriately treating a living tissue even under uneven distribution load and achieving cost reduction. To aim.

In order to solve the problems described above and achieve the object, a treatment system according to the present invention comprises a heat transfer plate for applying heat energy to a living tissue in contact with the living tissue, and a tip and a base of the heat transfer plate. A plurality of heat generating portions respectively provided at different positions in the longitudinal direction connecting the ends and respectively generating heat by energization to heat the heat transfer plate; a power supply for supplying an alternating current to the plurality of heat generating portions; A plurality of switches each connected in series to the heat generating portion and selecting one target heat generating portion to be supplied with an alternating current from the power supply among the plurality of heat generating portions, and controlling the operation of the plurality of switches A switch control unit for sequentially switching the one target heating unit among the plurality of heating units; an index value measuring unit for measuring an index value serving as an indicator of the temperatures of the plurality of heating units; value And a power control unit configured to control at least one of switching timing of the target heat generating unit by the switch control unit and power supplied from the power supply to the target heat generating unit, the index value measuring unit The index value of the non-target heat generation part not selected as the target heat generation part among the plurality of heat generation parts according to the capacitance component of the switch connected in series to the non-target heat generation part among the plurality of switches Measure using the leakage current flowing to the switch.

According to the treatment system according to the present invention, it is possible to appropriately treat a living tissue even when the load is unevenly distributed, and to achieve cost reduction.

FIG. 1 is a view schematically showing a treatment system according to the first embodiment. FIG. 2 is an enlarged view of the distal end portion of the treatment tool. FIG. 3 is an exploded perspective view showing the heat generating structure. FIG. 4 is a view of the heater as viewed from the heat transfer plate side. FIG. 5 is a block diagram illustrating a treatment system. FIG. 6 is a diagram showing a circuit configuration of a treatment system. FIG. 7 is a flowchart showing the energization control method. FIG. 8 is a diagram for explaining a specific example of the energization control method shown in FIG. FIG. 9 is a diagram showing a first modification of the first embodiment. FIG. 10 is a diagram showing a modification 2 of the first embodiment. FIG. 11 is a diagram showing a treatment system according to the second embodiment. FIG. 12 is a flowchart showing the energization control method according to the third embodiment. FIG. 13 is a diagram for explaining a specific example of the energization control method shown in FIG. FIG. 14 is a diagram for explaining a specific example of the energization control method shown in FIG. FIG. 15 is a flowchart showing the energization control method according to the fourth embodiment. FIG. 16 is a diagram for explaining a specific example of the energization control method shown in FIG. FIG. 17 is a block diagram showing a treatment system according to the fifth embodiment.

Hereinafter, embodiments for carrying out the present invention (hereinafter, embodiments) will be described with reference to the drawings. The present invention is not limited by the embodiments described below. Furthermore, in the description of the drawings, the same parts are given the same reference numerals.

Embodiment 1
[Schematic Configuration of Treatment System]
FIG. 1 is a view schematically showing a treatment system 1 according to the first embodiment.
The treatment system 1 treats (joins (or anastomoses) and detaches, etc.) a living tissue by applying thermal energy to the living tissue to be treated. The treatment system 1 includes a treatment tool 2, a control device 3 and a foot switch 4 as shown in FIG.

[Configuration of treatment tool]
The treatment tool 2 is, for example, a linear surgical treatment tool for treating a living tissue through the abdominal wall. This treatment tool 2 is provided with the handle 5, the shaft 6, the holding part 7, and the heater drive part 8 (refer FIG. 5), as shown in FIG.
The handle 5 is a part held by the operator by hand. Further, as shown in FIG. 1, the handle 5 is provided with an operation knob 51.
As shown in FIG. 1, the shaft 6 has a substantially cylindrical shape, and one end (the right end in FIG. 1) is connected to the handle 5. Further, a grip 7 is attached to the other end (left end in FIG. 1) of the shaft 6. An opening / closing mechanism (shown in the drawing) opens and closes the first and second holding members 9 and 10 (FIG. 1) constituting the holding unit 7 in accordance with the operation of the operation knob 51 by the operator. ) Is provided.
The detailed configuration of the heater driving unit 8 will be described when describing the configurations of the control device 3 and the foot switch 4.

[Configuration of gripping portion]
FIG. 2 is an enlarged view of the distal end portion of the treatment tool 2.
The gripping portion 7 is a portion that grips a living tissue to treat the living tissue. The gripping portion 7 includes first and second gripping members 9 and 10 as shown in FIG. 1 or 2.
The first and second gripping members 9 and 10 are pivotally supported by the other end (left end in FIGS. 1 and 2) of the shaft 6 so as to be able to open and close in the direction of arrow R1 (FIG. 2) In accordance with the operation 51, the living tissue can be grasped.

[Configuration of First Holding Member]
In addition, "the front end side" described below is the front end side of the holding part 7, Comprising: The left side is meant in FIG. 1, FIG. Further, “proximal side” described below means the right side in FIGS. 1 and 2 on the side of the shaft 6 of the grip 7.
The first gripping member 9 is disposed below the second gripping member 10 in FIG. 1 or 2. As shown in FIG. 2, the first gripping member 9 includes a first cover member 11 and a heat generating structure 12.
The first cover member 11 is formed of a long plate extending in the longitudinal direction (left and right direction in FIGS. 1 and 2) from the tip end of the grip 7 toward the base end. In the first cover member 11, a recess 111 is formed on the upper surface in FIG.
The recess 111 is located at the center in the width direction of the first cover member 11 and extends along the longitudinal direction of the first cover member 11. Moreover, the side wall part by the side of the proximal end among the side wall parts which comprise the recessed part 111 is abbreviate | omitted. The first cover member 11 is supported by the shaft 6 with the recess 111 facing upward in FIG. 2 while supporting the heat generating structure 12 in the recess 111.

FIG. 3 is an exploded perspective view showing the heat generating structure 12. Specifically, FIG. 3 is an exploded perspective view of the heat generating structure 12 from the upper side in FIGS. 1 and 2.
The heat generating structure 12 is accommodated in the recess 111 with a part thereof protruding upward from the recess 111 in FIG. The heat generating structure 12 generates thermal energy under the control of the control device 3. As shown in FIG. 3, the heat generating structure 12 includes a heat transfer plate 13, a heater 14, and an adhesive member 15.

The heat transfer plate 13 is formed of, for example, a long plate (long plate extending in the longitudinal direction of the grip portion 7) made of a material such as copper.
Then, in a state in which the heat transfer plate 13 holds the living tissue by the first and second holding members 9 and 10, the plate surface on the upper side in FIGS. 2 and 3 contacts the living tissue, and the heater The heat from 14 is transmitted to the living tissue (heat energy is applied to the living tissue).

FIG. 4 is a view of the heater 14 as viewed from the heat transfer plate 13 side.
The heater 14 partially generates heat, and functions as a sheet heater that heats the heat transfer plate 13 by the heat generation. The heater 14 includes a substrate 16, a first resistance pattern 17, and a second resistance pattern 18 as shown in FIG. 3 or 4.
The substrate 16 is a long sheet (long sheet extending in the longitudinal direction of the grip 7) made of an insulating material such as polyimide.
In addition, as a material of the board | substrate 16, you may employ | adopt high heat-resistant insulating materials, such as not only a polyimide but aluminum nitride, an alumina, glass, a zirconia, etc., for example.

The first resistance pattern 17 is formed by processing stainless steel (SUS 304) which is a conductive material, and as shown in FIG. 3 or FIG. 4, a pair of first connection portions 171 and a first pattern main body 172 And Then, the first resistance pattern 17 is bonded to the upper surface 161 of the substrate 16 in FIG. 3 by thermocompression bonding.
The material of the first resistance pattern 17 is not limited to stainless steel (SUS304), and may be another stainless steel material (for example, No. 400 series), or a conductive material such as platinum or tungsten may be employed. Absent. Further, the first resistance pattern 17 is not limited to the structure bonded to the surface 161 of the substrate 16 by thermocompression bonding, and may be formed on the surface 161 by vapor deposition, printing, or the like.

As shown in FIG. 3 or 4, the pair of first connection portions 171 are respectively provided on the base end side (the right end side in FIGS. 3 and 4) of the substrate 16, and from the base end side to the tip side They extend toward the left end side in FIGS. 3 and 4 and are provided to face each other along the width direction of the substrate 16. Then, the pair of first connection portions 171 is connected to the heater drive unit 8, and in the shaft 6, one end side (right end portion side in FIG. 1) of the shaft 6 to the other end side (FIG. 1 in FIG. 1) , And the two first lead wires C1 (see FIG. 5) drawn to the left end side) are respectively joined (connected). In FIG. 5, for convenience of explanation, only one first lead wire C1 is shown.
One end of the first pattern main body 172 is connected (conductive) to one of the first connection portions 171, extends from the one end to the tip end while meandering in a wave shape, and substantially in the longitudinal center of the substrate 16 The other end is folded back to the proximal end side in the vicinity, and the other end is connected (conductive) to the other first connection portion 171. Further, in the first pattern main body 172, the resistance value per unit length in the longitudinal direction of the substrate 16 is set larger than that of the pair of first connection portions 171.
The first pattern main body 172 generates heat when a voltage is applied (energized) to the pair of first connection portions 171 by the heater driving unit 8 through the two first lead wires C1. That is, the first pattern main body 172 corresponds to the heat generating portion according to the present invention.

The second resistance pattern 18 is formed by processing stainless steel (SUS 304), which is a conductive material, and as shown in FIG. 3 or 4, a pair of second connection portions 181 and a second pattern main body 182 And Then, the second resistance pattern 18 is bonded to the surface 161 of the substrate 16 by thermocompression bonding.
The material of the second resistance pattern 18 is not limited to stainless steel (SUS 304), and may be another stainless steel material (for example, No. 400 series), or a conductive material such as platinum or tungsten may be employed. Absent. Further, the second resistance pattern 18 is not limited to the structure bonded to the surface 161 of the substrate 16 by thermocompression bonding, and may be formed on the surface 161 by vapor deposition, printing, or the like. The material of the second resistance pattern 18 may be the same as or different from the material of the first resistance pattern 17.

As shown in FIG. 3 or FIG. 4, the pair of second connection portions 181 extend from the base end side of the substrate 16 to near the approximate center of the substrate 16 in the longitudinal direction, and the first resistance pattern 17 is formed. It is provided so as to face each other in the width direction of the substrate 16 so as to sandwich it. The pair of second connection portions 181 is connected to the heater driving portion 8 and in the shaft 6, the one end side (right end portion side in FIG. 1) of the shaft 6 to the other end side (FIG. 1 in FIG. , And the two second lead wires C2 (see FIG. 5) drawn to the left end) are respectively joined (connected). In FIG. 5, for convenience of explanation, only one second lead wire C2 is shown.
The second pattern main body 182 is connected (conductive) at one end to one second connection portion 181, extends from the one end to the tip of the substrate 16 while meandering in a wavelike manner, and on the proximal end side at the tip To the other second connection portion 181 (conducting). Further, in the second pattern main body 182, the resistance value per unit length in the longitudinal direction of the substrate 16 is set larger than that of the pair of second connection parts 181.
Then, the second pattern main body 182 generates heat when a voltage is applied (energized) to the pair of second connection portions 181 by the heater driving unit 8 through the two second lead wires C2. That is, the second pattern main body 182 corresponds to the heat generating portion according to the present invention.
As described above, the first and second pattern bodies 172 and 182 are arranged in parallel in the longitudinal direction of the substrate 16 (provided at different positions in the longitudinal direction).

The bonding member 15 is interposed between the heat transfer plate 13 and the surface 161 (first and second resistance patterns 17 and 18) of the substrate 16 as shown in FIG. Adhesively fix. The adhesive member 15 is a long sheet (long sheet extending in the longitudinal direction of the grip portion 7) which has good thermal conductivity and electrical insulation, withstands high temperature, and has adhesiveness. It is configured.
Then, as shown in FIG. 3, the heat transfer plate 13 is disposed so as to cover the entire first and second pattern bodies 172 and 182. In addition, the bonding member 15 is disposed so as to cover the entire first and second pattern main bodies 172 and 182 and to partially cover each of the pair of first connection portions 171 and the pair of second connection portions 181. Be done. That is, the bonding member 15 is disposed in a state of being protruded to the base end side with respect to the heat transfer plate 13. The two first lead wires C1 and the two second lead wires C2 are not covered by the adhesive member 15 in the pair of first connection portions 171 and the pair of second connection portions 181. (Connected) to each other.

[Configuration of second gripping member]
The second holding member 10 includes a second cover member 19 and an opposing plate 20, as shown in FIG.
The second cover member 19 has the same shape as the first cover member 11. That is, as shown in FIG. 2, the second cover member 19 has a recess 191 similar to the recess 111. The second cover member 19 is supported by the shaft 6 in a posture in which the recess 191 faces downward in FIG. 2 (a posture facing the recess 111) while supporting the opposing plate 20 in the recess 191.
The opposing plate 20 is made of, for example, a conductive material such as copper. The opposing plate 20 is formed of a flat plate having substantially the same planar shape as the recess 191, and is fixed in the recess 191. Then, the opposing plate 20 grips the living tissue with the heat transfer plate 13.
In addition, as the opposing board 20, you may comprise not only an electroconductive material but resin materials, such as other materials, for example, PEEK (polyether ether ketone).

[Configuration of Control Device and Foot Switch]
FIG. 5 is a block diagram showing the treatment system 1. FIG. 6 is a diagram showing a circuit configuration of the treatment system 1.
The foot switch 4 is a portion operated by the operator with a foot. And according to the operation concerned to foot switch 4, control device 3 performs energization control of heater 14 (the 1st and 2nd resistance pattern 17 and 18).
In addition, as a means to perform electricity supply control, you may employ | adopt not only foot switch 4 but the switch etc. which are operated by hand in addition to this.
The control device 3 is configured to include a CPU (Central Processing Unit) or the like, and centrally controls the operation of the treatment tool 2 in accordance with a predetermined control program. The control device 3 includes a power supply 31, a control unit 32, and a memory 33, as shown in FIG. 5 or FIG.

The power supply 31 is connected to the heater driving unit 8 via the electric cable C (FIGS. 1 and 5). Then, the power supply 31 supplies power for energizing the first and second resistance patterns 17 and 18 to the heater driving unit 8 through the electric cable C under the control of the control unit 32. In the first embodiment, the power supply 31 is an AC power supply, and supplies an alternating current to the first and second resistance patterns 17 and 18.
The control unit 32 includes, for example, a CPU, an FPGA (Field-Programmable Gate Array), and the like. Then, the control unit 32 controls the operation of the power supply 31. Further, the control unit 32 communicates with the heater driving unit 8 via the electric cable C, and controls the operation of the heater driving unit 8. As shown in FIG. 5, the control unit 32 includes a switch control unit 321, an index value measurement unit 322, and an energization control unit 323.
The functions of the switch control unit 321, the index value measurement unit 322, and the energization control unit 323 will be described after the configuration of the heater driving unit 8 is described.
The memory 33 stores a control program executed by the control unit 32, data necessary for processing by the control unit 32, and the like. Here, as data necessary for processing by the control unit 32, for example, resistance temperature characteristic information indicating the relationship between the resistance value and the temperature in the first and second resistance patterns 17 and 18, respectively, the first and second data The voltage value etc. for electricity supply to the resistance patterns 17 and 18 can be illustrated.

The heater driving unit 8 is provided, for example, inside the handle 5. As shown in FIG. 5 or 6, the heater drive unit 8 includes first and second switches 81 and 82, a switch drive unit 83, first and second detection resistors 84 and 85, and DAQ Data Acquisition) 86.
The first switch 81 connects the electric cable C and the first resistance pattern 17 (first lead wire C1) such that the first switch 81 is connected in series to the first resistance pattern 17. The first supply path P1 (FIGS. 5 and 6) of the alternating current to the resistance pattern 17 is provided. Then, the first switch 81 is turned on by the switch driving unit 83, thereby allowing the supply of alternating current to the first resistance pattern 17 via the first supply path P1 (permitting energization), By turning the switch OFF, the supply of alternating current to the first resistance pattern 17 via the first supply path P1 is prohibited (prohibition of energization). In the first embodiment, as shown in FIG. 6, in the first switch 81, two MOSFETs (Metal-Oxide-Semiconductor Field-Effect Transistors) are connected in series so as to be opposite in polarity (sources Connected) is composed of an AC switch. The connected sources are connected to a ground D-GND (a ground of the switch driver 83) different from the ground P-GND of the power supply 31.

The second switch 82 connects the electric cable C and the second resistance pattern 18 (second lead wire C2) such that the second switch 82 is connected in series to the second resistance pattern 18. The second supply path P2 (FIGS. 5 and 6) of the alternating current to the resistance pattern 18 is provided. Then, the second switch 82 is turned on by the switch driving unit 83, thereby permitting the supply of alternating current to the second resistance pattern 18 via the second supply path P2 (permitting energization), By turning off the switch, the supply of alternating current to the second resistance pattern 18 via the second supply path P2 is inhibited (energization is prohibited). In the first embodiment, the second switch 82 is, as shown in FIG. 6, similarly to the first switch 81, formed of an AC switch in which two MOSFETs are connected in series so as to be opposite in polarity. ing. The connected sources are connected to a ground D-GND different from the ground P-GND of the power supply 31.

Then, when the first switch 81 is switched on and the second switch 82 is switched off, the first resistance pattern 17 (first pattern main body 172) is a target to be supplied with alternating current from the power supply 31. It is selected as one target heating unit to be On the other hand, when the first switch 81 is switched OFF and the second switch 82 is switched ON, the second resistance pattern 18 (second pattern main body 182) is a target of supply of alternating current from the power supply 31. It is selected as one target heating unit to be That is, the first and second switches 81 and 82 select one target heat generating portion among the first and second resistor patterns 17 and 18, and correspond to the switches according to the present invention.

The switch drive unit 83 is formed of, for example, a photocoupler, and turns on or off the first and second switches 81 and 82 under the control of the DAQ 86.
The first detection resistor 84 is a monitor resistor (1Ω resistor in the example of FIG. 6) provided in the first supply path P1 so as to be connected in series to the first resistor pattern 17.
The second detection resistor 85 is a monitor resistor (1Ω resistor in the example of FIG. 6) provided in the second supply path P2 so as to be connected in series to the second resistor pattern 18.
The DAQ 86 communicates with the control unit 32 of the control device 3 via the electrical cable C. Then, the DAQ 86 controls the operation of the switch drive unit 83 in accordance with the control signal transmitted from the control unit 32, and at the same time, the voltage values applied to the first and second detection resistors 84 and 85 A current value flowing through the two detection resistors 84 and 85 is detected, and a detection signal corresponding to the voltage value and the current value is transmitted to the control unit 32.

The switch control unit 321 transmits a control signal to the DAQ 86 via the electrical cable C, controls the operation of the first and second switches 81 and 82, and selects one of the first and second resistance patterns 17 and 18. One target heating unit is switched sequentially.
The index value measurement unit 322 detects the detection signal (the voltage value applied to the first and second detection resistors 84 and 85 and the first and second detection resistors 84 and 85) transmitted from the DAQ 86 via the electrical cable C. The resistance values of the first and second resistance patterns 17 and 18 are calculated based on the flowing current value). Then, the index value measurement unit 322 performs the first and second calculated resistance values based on the resistance temperature characteristic information corresponding to the first and second resistance patterns 17 and 18 stored in the memory 33, respectively. Converted to the temperature of the resistance patterns 17 and 18 of FIG.
The energization control unit 323 is based on the temperatures of the first and second resistance patterns 17 and 18 measured by the index value measurement unit 322, the switching timing of the target heating unit by the switch control unit 321 and the target heat generation from the power supply 31. Control at least one of the power supplied to the unit.

[Electric control method]
Next, the operation (power supply control method) of the treatment system 1 described above will be described.
FIG. 7 is a flowchart showing the energization control method.
The operator holds the treatment tool 2 by hand, and inserts the distal end portion (a part of the grip 7 and the shaft 6) of the treatment tool 2 into the abdominal cavity through the abdominal wall using, for example, a trocar. Then, the operator operates the operation knob 51, and the grasping unit 7 grasps the living tissue to be treated.
And control device 3 performs energization control shown below according to operation (Step S1: Yes) of foot switch 4 by an operator.

First, the control unit 32 executes an initialization process (step S2). For example, in step S2, the control unit 32 sets the initial voltage value to be supplied to the first and second resistor patterns 17 and 18 as the voltage value for supplying the first and second resistor patterns 17 and 18 to the memory 33. Remember to
After step S2, the switch control unit 321 determines a switch to be turned on among the first and second switches 81 and 82 (step S3). For example, in the case where the first switch 81 is determined as the switch to be switched on in the immediately preceding loop (the loop of steps S3 to S9), the second loop is to be switched on as the switch in the next loop. decide.

After step S3, the switch control unit 321 sets the switch determined in step S3 among the first and second switches 81 and 82 as the switch ON and the other switch OFF (step S4). That is, among the first and second resistance patterns 17 and 18, the resistance pattern connected in series to the switch which is turned on is selected as the target heat generating portion.
After step S4, the energization control unit 323 sets the voltage value for energization corresponding to the target heating portion selected in step S4 (the initial voltage value stored in the memory 33 in step S2, or in the memory 33 in step S7). The stored voltage value is read from the memory 33. Then, the energization control unit 323 controls the operation of the power supply 31, sets the peak value of the AC voltage supplied from the power supply 31 to the read voltage value, and energizes the target heating unit with the voltage value (step S5). ). In the first loop (the loop of steps S3 to S9), the energization control unit 323 reads the initial voltage value stored in the memory 33 in step S2, and energizes the target heating unit with the initial voltage value.

Hereinafter, for the convenience of description, the resistance patterns other than the target heating portion selected in step S4 among the first and second resistance patterns 17 and 18 will be described as non-target heating portions.
After step S5, the index value measurement unit 322 determines the voltage value applied to the detection resistor connected in series with the non-target heating portion among the first and second detection resistors 84 and 85 and the current flowing through the detection resistor. Based on the detection signal corresponding to the value, the temperature of the non-target heating portion (hereinafter referred to as the heater temperature) is measured (step S6).
The first and second switches 81 and 82 configured as alternating current switches respectively have predetermined capacitance components. Therefore, for example, even when the first switch 81 is switched on and the second switch 82 is switched off, the second supply path P2 is used according to the capacitance component of the second switch 82. Leakage current flows. Then, in step S6, the index value measurement unit 322 calculates the temperature of the non-target heating portion using the leakage current.

After step S6, the energization control unit 323 applies the non-target heating portion to be selected next as a target heating portion using the difference between the heater temperature of the non-target heating portion measured in step S6 and the target temperature. A voltage value to be calculated is calculated, and the calculated voltage value is stored (updated) in the memory 33 as a voltage value for energizing the target heat generating portion (step S7). In addition, general PID (Proportional-Integral-Differential) control or the like is used to calculate the voltage value.

After step S7, the energization control unit 323 constantly monitors whether the switching timing of the target heat generating unit has come (step S8). Specifically, in step S8, the energization control unit 323 sets the switching timing to a point in time when a predetermined time TC (see FIG. 8) has elapsed since the energization of the target heat generating portion is started in step S5. That is, in the first embodiment, the switching timing is set to a constant cycle.
If it is determined that the switching timing of the target heat generating portion has come (step S8: Yes), the control unit 32 determines whether the treatment time necessary for treatment of the living tissue has elapsed (step S9). Specifically, in step S9, the control unit 32 determines whether a predetermined time has elapsed since the foot switch 4 is operated (step S1: Yes).
Then, when it is determined that the treatment time has elapsed (step S9: Yes), the control device 3 ends the energization control.
On the other hand, when it is determined that the treatment time has not elapsed (step S9: No), the control device 3 returns to step S3.

[Specific example of energization control method]
Next, a specific example of the above-described energization control method will be described.
FIG. 8 is a diagram for explaining a specific example of the energization control method. Specifically, FIG. 8A is a diagram showing changes in the heater temperature and the voltage value at the time of energization in the first resistance pattern 17. FIG. 8B is a diagram showing changes in the heater temperature and the voltage value at the time of energization in the second resistance pattern 18. Note that FIG. 7 exemplifies the case where the first switch 81 is switched on first. Further, in FIG. 8, the heater temperature is represented by a line graph, and the voltage value is represented by a bar graph.

In the first loop of steps S3 to S9, the first resistance pattern 17 is selected as the target heat generating portion (step S4). That is, in the first loop, the second resistance pattern 18 is a non-target heating portion. Thereafter, as shown in FIG. 8A, the first resistance pattern 17 is energized at the initial voltage value V0 (step S5). At this time, the second switch 82 is turned off in the second supply path P2 of the alternating current to the second resistance pattern 18 which is the non-target heating portion, but the capacitance of the second switch 82 Leakage current flows depending on the component. That is, an extremely small voltage value VL2 (FIG. 8B) is applied to the second resistance pattern 18 in accordance with the leakage current. Then, using the leakage current, the heater temperature T2 (FIG. 8B) of the second resistance pattern 18 to be selected next as the target heating portion is measured (step S6), and the heater temperature T2 is used. Then, a voltage value V2 (FIG. 8B) to be applied to the second resistance pattern 18 (in the second loop of steps S3 to S9) is calculated (step S7). Thereafter, when the predetermined time TC has elapsed since the start of energization of the first resistance pattern 17 (step S8: Yes), the target heat generating portion is switched from the first resistance pattern 17 to the second resistance pattern 18 (Step S3). Thus, the first loop of steps S3 to S9 ends.

In the second loop of steps S3 to S9, the second resistance pattern 18 is selected as the target heat generating portion (step S4). That is, in the second loop, the first resistance pattern 17 is a non-target heating portion. Thereafter, the second resistance pattern 18 is energized at the voltage value V2 calculated in the first loop of steps S3 to S9 (step S5). At this time, the first switch 81 is turned off in the first supply path P1 of the alternating current to the first resistance pattern 17 which is the non-target heating portion, but the capacitance of the first switch 81 Leakage current flows depending on the component. That is, an extremely small voltage value VL1 (FIG. 8A) is applied to the first resistance pattern 17 in accordance with the leakage current. Then, using the leakage current, the heater temperature T1 (FIG. 8A) of the first resistance pattern 17 to be selected next as the target heating portion is measured (step S6), and the heater temperature T1 is used. Then, a voltage value V1 (FIG. 8A) to be applied to the first resistance pattern 17 (in the third loop of steps S3 to S9) is calculated (step S7). Thereafter, when the predetermined time TC has elapsed since the start of energization of the second resistance pattern 18 (step S8: Yes), the target heat generating portion is switched from the second resistance pattern 18 to the first resistance pattern 17 (Step S3). Thus, the second loop of steps S3 to S9 is completed.

The heater temperatures of the first and second resistance patterns 17 and 18 are respectively controlled to target temperatures as shown in FIG. 8 by repeatedly executing the loop of steps S3 to S9.

According to the first embodiment described above, the following effects can be obtained.
In the treatment system 1 according to the first embodiment, the first and second pattern bodies 172 and 182 are provided at different positions in the longitudinal direction of the grip 7 and are controlled independently of each other.
Therefore, as in the configuration described in Patent Document 1, even if the load is unevenly distributed, the living tissue can be heated at the target temperature, and the living tissue can be appropriately treated.
Further, in the treatment system 1 according to the first embodiment, a supply path (the first path from the power source 31 to the first and second resistance patterns 17 and 18 (first and second pattern bodies 172 and 182) (the first path) The first and second resistance patterns 17 and 18 are independently controlled by switching the first and second supply paths P1 and P2 by the first and second switches 81 and 82, respectively.
Therefore, compared to the configuration described in Patent Document 1, it is not necessary to provide a plurality of power supplies 31, and cost reduction can be achieved.
From the above, according to the treatment system 1 according to the first embodiment, the biological tissue can be appropriately treated even if the load is unevenly distributed, and the cost can be reduced. Play.

In particular, in the treatment system 1, the non-target heat generating portion (selected among the first and second switches 81 and 82) is selected as the target heat generating portion next to the first and second resistance patterns 17 and 18. Of the heater temperature of the resistance pattern connected in series to the switch using the leakage current flowing through the switch according to the capacitance component of the switch turned off among the first and second switches 81 and 82 taking measurement.
For this reason, a voltage value (for example, when the power is supplied to the target heating portion next time using the heater temperature immediately before being selected as the target heating portion (for example, the heater temperature T1 (T2) shown in FIG. 8) The voltage value V1 (V2) shown in FIG. 8 can be appropriately calculated. Therefore, the heater temperatures of the first and second resistance patterns 17 and 18 can be controlled appropriately and stably at the target temperature.

(Modification 1 of Embodiment 1)
FIG. 9 is a diagram showing a first modification of the first embodiment. Specifically, FIG. 9 is a cross-sectional view orthogonal to the width direction of the grasping portion 7A in a state where the grasping portion 7A according to the present modification 1 is closed (a state in which the living tissue LT is grasped by the grasping portion 7A). It is sectional drawing which cut | disconnected the said holding part 7A. In FIG. 9, for convenience of explanation, the illustration of the pair of first connection portions 171 and the pair of second connection portions 181 is omitted.
In the first embodiment described above, the first and second pattern bodies 172 and 182 are provided in parallel in the longitudinal direction in the first gripping member 9, but provided that they are provided at different positions in the longitudinal direction. It may be disposed as shown in FIG.
Specifically, in the gripping portion 7A according to the first modification, as shown in FIG. 9, the first resistance pattern 17 is provided to the first gripping member 9. On the other hand, the second resistance pattern 18 is provided on the second holding member 10. The first and second pattern bodies 172 and 182 are provided at different positions in the longitudinal direction.
Even when the configuration of the first modification described above is adopted, the same effect as that of the first embodiment described above is obtained.

(Modification 2 of Embodiment 1)
FIG. 10 is a diagram showing a modification 2 of the first embodiment.
In the first embodiment described above, as shown in FIG. 10, step S4 and step S5 may be simultaneously executed (parallel processing).
According to the second modification described above, there is no time difference between the switching of the first and second switches 81 and 82 (step S4) and the energization of the target heat generating portion (step S5). Energization control can be performed.

Second Embodiment
Next, the second embodiment will be described.
In the following description, the same components and steps as those in the first embodiment described above are denoted by the same reference numerals, and the detailed description thereof is omitted or simplified.
FIG. 11 is a diagram corresponding to FIG. 6 and is a diagram showing a treatment system 1B according to the second embodiment.
In the treatment system 1B according to the second embodiment, as shown in FIG. 11, the first and second capacitors 87 and 88 correspond to the treatment system 1 (FIG. 6) described in the first embodiment described above. Has been added.
The first capacitor 87 corresponds to a capacitive element according to the present invention, and is connected in series to the first resistance pattern 17 and parallel to the first switch 81 as shown in FIG. Are provided in the first supply path P1 so as to be connected thereto. The first capacitor 87 has a capacitance component larger than that of the first switch 81.
The second capacitor 88 corresponds to a capacitive element according to the present invention, and is connected in series to the second resistance pattern 18 and in parallel to the second switch 82 as shown in FIG. The second supply path P2 is provided to be connected to the second supply path P2. The second capacitor 88 has a capacitance component larger than that of the second switch 82.
Then, the index value measurement unit 322 according to the second embodiment is configured such that the capacitance components of the first switch 81 and the first capacitor 87 in the first and second supply paths P1 and P2 or the second In accordance with the capacitance components of the switch 82 and the second capacitor 88, the temperature of the non-target heating portion is measured using the leakage current flowing in the supply path connected to the non-target heating portion.

According to the second embodiment described above, in addition to the effects similar to the first embodiment described above, the following effects can be obtained.
In the treatment system 1B according to the second embodiment, the above-described first and second capacitors 87 and 88 are added.
Therefore, it is possible to further increase the leakage current flowing through the supply path connected to the non-target heating portion among the first and second supply paths P1 and P2, and to improve the detection accuracy of the leakage current. Therefore, the heater temperature immediately before being selected as the target heat generating portion can be calculated with high accuracy, and the energization control can be performed with high accuracy.

Third Embodiment
Next, the third embodiment will be described.
In the following description, the same components and steps as those in the first embodiment described above are denoted by the same reference numerals, and the detailed description thereof is omitted or simplified.
In the first embodiment described above, the peak value of the AC voltage supplied from the power supply 31 is controlled while the switching timing has a constant cycle.
On the other hand, in the third embodiment, while the peak value of the AC voltage supplied from the power supply 31 is constant (the predetermined voltage value Vmax (see FIG. 13C and FIG. 13D)), the target heat generation is performed. Control the energizing time to energize the unit continuously. That is, in the third embodiment, the energization control method is different from that of the first embodiment described above.

[Electric control method]
FIG. 12 is a flowchart showing the energization control method according to the third embodiment.
In the energization control method according to the third embodiment, as shown in FIG. 12, step S5 is omitted from the energization control method (FIG. 7) described in the first embodiment described above, and steps S2 and S7 are performed. , S8, instead of employing steps S2C, S7C, S8C. In the third embodiment, step S6 is executed after step S4 because step S5 is omitted. Hereinafter, only steps S2C, S7C, and S8C will be described.

Step S2C is executed when the operator operates the foot switch 4 (step S1: Yes).
Specifically, in step S2C, the energization control unit 323 operates the power supply 31 to supply the AC voltage of the predetermined voltage value Vmax from the power supply 31. After this, the control device 3 shifts to step S3.
By performing step S2C, the target heat generating portion selected in step S4 is energized at the predetermined voltage value Vmax.

Step S7C is performed after step S6.
In step S7C, similarly to step S7 described in the first embodiment, the energization control unit 323 uses the difference between the heater temperature of the non-target heating portion measured in step S6 and the target temperature and then performs the next operation. A voltage value to be supplied to the non-target heat generating portion selected as the target heat generating portion is calculated. The energization control unit 323 also calculates the ratio of the calculated voltage value to the predetermined voltage value Vmax. Then, the energization control unit 323 calculates a time corresponding to the calculated ratio with respect to the predetermined time TC as the energization time for energizing the non-target heat generating portion to be next selected as the target heat generating portion, and calculates the calculated power supply time It is stored in the memory 33.

After step S7C, the energization control unit 323 constantly monitors whether or not the switching timing of the target heat generating unit has come (step S8C). Specifically, in step S8C, the energization control unit 323 determines that the energization time (this loop is the first loop) stored in the memory 33 in the previous loop (the loop of steps S3, S4, S6, S7C, S8C, and S9). In this case, the predetermined energization time) which is the initial value is read out, and the point in time when the energization time has elapsed since the start of energization of the target heat generating portion in step S4 is taken as the switching timing. When it is determined that the switching timing has come (the energization time has elapsed) (step S8C: Yes), the control device 3 shifts to step S9.

[Specific example of energization control method]
Next, a specific example of the energization control method according to the third embodiment will be described.
13 and 14 are diagrams for explaining a specific example of the energization control method. Specifically, FIGS. 13 (a) and 13 (b) show the first, the second, and the third in the case where the energization control is performed by the energization control method (hereinafter referred to as the LEVEL method) described in the first embodiment described above. The change of the voltage value at the time of electricity supply in 2nd resistance pattern 17 and 18 is shown, respectively. 13 (c) and 13 (d) show the first and second resistance patterns 17 when the energization control is performed by the energization control method (hereinafter referred to as the PWM method) described in the third embodiment. , 18 show changes in the energizing time, respectively. 13 (c) and 13 (d), for convenience of explanation, the switching timing of the target heat generating portion is the same as the switching timing of the LEVEL method (FIGS. 13 (a) and 13 (b)). FIG. 14 is a diagram corresponding to FIG. 13 (a), 13 (c) and 14 (a) show changes in voltage value and energization time of the first resistance pattern 17 during energization. FIGS. 13B, 13D, and 14B show changes in voltage value and energization time of the second resistance pattern 18 during energization.

In the third embodiment, as shown in FIGS. 13 (c) and 13 (d), the voltage values applied to the first and second resistance patterns 17 and 18 are constant at a predetermined voltage value Vmax. . Here, the predetermined voltage value Vmax is, for example, the maximum voltage value for energizing the first and second resistance patterns 17 and 18 in the first embodiment described above.
Here, as shown in FIG. 13A, in the LEVEL system, the voltage value calculated in step S7 is a ratio of 50%, 100%, 80%, 50%, and 15% to the predetermined voltage value Vmax. It is assumed that the
In this case, in step S7C, the energization time is calculated as a time corresponding to the ratio to the predetermined time TC, so as shown in FIG. In the case of 50% of the voltage value Vmax), TC (when the calculated voltage value is 100% of the voltage value Vmax), 0.8 TC (in the case where the calculated voltage value is 80% of the voltage value Vmax), 0.. 5 TC (when the calculated voltage value is 50% of the voltage value Vmax) and 0.15 TC (when the calculated voltage value is 15% of the voltage value Vmax) are respectively calculated.
Then, the target heat generating portion is switched for each energization time (steps S8B and S3), whereby the heater temperatures of the first and second resistance patterns 17 and 18 are controlled to the target temperature as shown in FIG. Ru.

According to the third embodiment described above, the following effects can be obtained in addition to the effects similar to those of the first embodiment described above.
In the treatment system 1 according to the third embodiment, the conduction control unit 323 sets the peak value of the power supplied from the power supply 31 to the target heating unit constant (constant at the predetermined voltage value Vmax), and then the target heating unit Based on the heater temperature of the non-target heat generation part selected as, the current supply time which continues supplying current to the non-target heat generation part is controlled.
For this reason, as the power supply 31, a configuration in which the output value is fixed can be adopted instead of the configuration in which the output value is variable. Therefore, the cost of the treatment system 1 can be further reduced.

Embodiment 4
Next, the fourth embodiment will be described.
In the following description, the same components and steps as those in the first embodiment described above are denoted by the same reference numerals, and the detailed description thereof is omitted or simplified.
In the fourth embodiment, with respect to the first embodiment described above, the position of the living tissue LT in a state in which the living tissue LT is gripped by the gripping unit 7 is determined, and the heater 14 (the The control of energization of the first and second resistance patterns 17 and 18) is executed. That is, in the fourth embodiment, the energization control method is different from the above-described first embodiment.

[Electric control method]
FIG. 15 is a flowchart showing the energization control method according to the fourth embodiment.
The energization control method according to the fourth embodiment is, as shown in FIG. 15, a step S5D in place of steps S5, S8 and S9 with respect to the energization control method (FIG. 7) described in the first embodiment. , S8D, S9D2 and S9D3, and steps S10 to S13, S3D1 to S7D1, S3D2 to S8D2 and S3D3 to S8D3 are added. In the following, only steps S5D, S8D, S10 to S13, S3D1 to S7D1, S3D2 to S9D2 and S3D3 to S9D3 will be described.

Step S10 is performed after step S2.
Specifically, in step S10, the control unit 32 determines whether or not both of the first and second resistance patterns 17 and 18 are energized.
If it is determined that power is not supplied to both the first and second resistance patterns 17 and 18 (step S10: No), the control unit 32 sets one of the first and second resistance patterns 17 and 18 to one side. It is judged whether it supplied with electricity (step S11).
When it is determined that one of the first and second resistance patterns 17 and 18 is not energized (step S11: No), the control device 3 proceeds to step S3.

Step S5D is performed after step S4.
Specifically, in step S5D, the energization control unit 323 controls the operation of the power supply 31 and sets the peak value of the AC voltage supplied from the power supply 31 to the initial voltage value stored in the memory 33 in step S2. The target heating portion is energized at the initial voltage value. Thereafter, the control device 3 shifts to step S6.

If it is determined that one of the first and second resistance patterns 17 and 18 is energized (step S11: Yes), the control device 3 performs steps S3 to S7 described in the first embodiment, respectively. Similar steps S3D1 to S7D1 are executed. That is, steps S3D1 to S7D1 are executed after steps S3, S4, S5D, S6 and S7 energize one of the first and second resistance patterns 17 and 18.
Here, in step S5D1, the energization control unit 323 reads from the memory 33 the voltage value stored in the memory 33 in step S7. Then, the energization control unit 323 controls the operation of the power supply 31, sets the peak value of the AC voltage supplied from the power supply 31 to the read voltage value, and energizes the target heating unit with the voltage value.
Further, in step 6D1, the index value measurement unit 322 measures the temperature of the non-target heat generation portion in the same manner as step S6 described in the first embodiment described above. Further, the index value measurement unit 322 is responsive to the voltage value applied to the detection resistor connected in series to the target heating portion among the first and second detection resistors 84 and 85 and the current value flowing to the detection resistor. The temperature of the target heating portion is measured based on the detection signal.

Step S8D is performed after step S7 or step S7D1.
Specifically, in step S8D, the power supply control unit 323 sets a switching timing as a point in time when a set time (for example, a predetermined time TC) has elapsed since power supply to the target heat generating portion is started in step S5D or step S5D1. It constantly monitors whether the switching timing has come. Then, when it is determined that the switching timing has come (step S8D: Yes), the control device 3 returns to step S10.

Step S12 is executed when it is determined that both of the first and second resistance patterns 17 and 18 are energized (step S10: Yes).
Specifically, in step S12, the energization control unit 323 determines whether the temperature difference between the heater temperatures of the first and second resistance patterns 17 and 18 measured in step S6D1 is equal to or greater than a first threshold. Do.

Step S13 is executed when it is determined that the temperature difference between the heater temperatures of the first and second resistance patterns 17 and 18 is equal to or greater than the first threshold (step S12: Yes).
Specifically, in step S13, the conduction control unit 323 sets the conduction time of the resistance pattern having the highest heater temperature among the first and second resistance patterns 17 and 18 as the predetermined time TC. Further, the energization control unit 323 sets the energization time of the resistance pattern having a low heater temperature to be longer than the predetermined time TC. Then, the energization control unit 323 stores each energization time in the memory 33.

After step S13, the control device 3 executes the loop of steps S3D2 to S9D2 similar to the loop of steps S3 to S9 described in the first embodiment described above.
Here, in step S8D2, the conduction control unit 323 reads the conduction time corresponding to the target heating portion selected in step S4D2 out of the respective conduction times stored in the memory 33 in step S13 from the memory 33, and in step S5D2 It is constantly monitored whether or not the current application time has elapsed since the current application to the target heat generating portion has been started.
The loop of steps S13 and S3D2 to S9D2 described above corresponds to the first control according to the present invention.

When it is determined that the temperature difference between the heater temperatures of the first and second resistance patterns 17 and 18 is less than the first threshold (step S12: No), the control device 3 performs the first embodiment described above. The loop of steps S3D3 to S9D3 similar to the loop of steps S3 to S9 described above is executed.

[Specific example of energization control method]
Next, a specific example of the energization control method according to the fourth embodiment will be described.
FIG. 16 is a diagram for explaining a specific example of the energization control method. Specifically, FIGS. 16A and 16B correspond to FIG. 8 and the temperature difference between the heater temperatures of the first and second resistance patterns 17 and 18 is equal to or greater than the first threshold value. (Step S12: Yes), when the energization control is performed by the energization control method described in the first embodiment described above (when the loop of steps S3D3 to S9D3 is executed) The change of the heater temperature and the voltage value at the time of electricity supply in the resistance patterns 17 and 18 of FIG. FIGS. 16C and 16D correspond to FIG. 8 when the temperature difference between the heater temperatures of the first and second resistance patterns 17 and 18 is equal to or greater than the first threshold (see FIG. In step S12: Yes), the first and second resistance patterns in the case where the energization control is performed by the energization control method according to the fourth embodiment (when the loop of step S13 and steps S3D2 to S9D2 is executed) Changes in the heater temperature and the voltage value at the time of energization are shown at 17 and 18, respectively. 16 (a) and 16 (c) show changes of the heater temperature and the voltage value at the time of energization in the first resistance pattern 17. FIG. 16B and 16D show changes in the heater temperature and the voltage value at the time of energization in the second resistance pattern 18. Further, in FIGS. 16A to 16D, the heater temperature of the non-target heating portion (first resistance pattern 17) measured in step S6D1 is taken as the heater temperature T3, and the target heating portion (second resistance) is obtained. The heater temperature of pattern 18) is a heater temperature T4. The heater temperature T3 is lower than the heater temperature T4. The temperature difference (T4-T3) between the heater temperatures T3 and T4 is equal to or greater than the first threshold. That is, when the temperature difference (T4-T3) is the same as in FIGS. 16 (a) and 16 (b) and FIGS. 16 (c) and 16 (d), the same uneven load occurs. Respectively.

When the temperature difference between the heater temperatures of the first and second resistance patterns 17 and 18 is less than the first threshold (step S12: No), the loop of steps S3D3 to S9D3 is repeatedly performed to execute the above-described process. As in the first embodiment, the first and second resistor patterns 17 and 18 are energized at a constant cycle (every predetermined time TC). Then, the heater temperatures of the first and second resistance patterns 17 and 18 are respectively controlled to target temperatures (see, for example, FIG. 8).

On the other hand, if the temperature difference between the heater temperatures of the first and second resistance patterns 17 and 18 is equal to or greater than the first threshold (step S12: Yes), the process shown in FIGS. As described above, in step S13, the energization time of the second resistance pattern 18 that has reached the high heater temperature T4 is set to the predetermined time TC. In addition, the energization time of the first resistance pattern 17 that has become the low heater temperature T3 is set to the time (T4 / T3) · TC obtained by multiplying the ratio (T4 / T3) of the heater temperatures T3 and T4 by the predetermined time TC. Be done. Then, the loop of steps S3D2 to S9D2 is repeatedly executed, and the target heat generating portion is switched every energization time period TC, (T4 / T3) · TC, so that the heater temperatures of the first and second resistance patterns 17 and 18 become , Is controlled to the target temperature respectively.

According to the fourth embodiment described above, the following effects can be obtained in addition to the effects similar to those of the first embodiment described above.
By the way, when the load is unevenly distributed, the heater temperature of the first and second resistance patterns 17 and 18 measured in step S6D1 is a heater of the resistance pattern having many regions covered with the living tissue LT. The temperature is lower than the heater temperature of the other resistance pattern because more heat is transferred to the living tissue LT.
In the treatment system 1 according to the fourth embodiment, focusing on the above-described points, the conduction time of the resistance pattern having the low heater temperature among the first and second resistance patterns 17 and 18 is subjected to the conduction of the resistance pattern having the high heater temperature. Make it longer than time. That is, power is positively supplied to the resistance pattern having many regions covered with the living tissue LT among the first and second resistance patterns 17 and 18.
Therefore, in the case where the energization control is performed according to the energization control method described in the above-described first embodiment when the load is unevenly distributed (FIGS. 16A and 16B) and the fourth embodiment, Compared with the case where the energization control is performed by the energization control method (FIGS. 16C and 16D), the case where the energization control is performed by the energization control method according to the fourth embodiment is The heater temperature of the resistance pattern having many regions covered with the living tissue LT can be reached faster than the target temperature. For example, as shown in FIG. 16C, the heater temperature of the resistance pattern reaches the target temperature faster by the time ΔT when the energization control is performed by the energization control method according to the fourth embodiment. . Therefore, the treatment time of the living tissue LT can be shortened. The broken line shown in FIG. 16 (c) is the same as the solid line shown in FIG. 16 (a).

Further, in the treatment system 1 according to the fourth embodiment, when the temperature difference between the heater temperatures of the first and second resistance patterns 17 and 18 is equal to or greater than the first threshold (step S12: Yes), Control (steps S13, S3D2 to S9D2) are executed. That is, the first control is performed only when the uneven distribution load is significant (when the temperature difference between the heater temperatures of the first and second resistor patterns 17 and 18 is equal to or greater than the first threshold).
For this reason, when the uneven distribution load is not remarkable, there is no need to execute step S13, and the processing load of the control device 3 can be reduced by not executing the step S13.

Fifth Embodiment
Next, the fifth embodiment will be described.
In the following description, the same components and steps as those in the first embodiment described above are denoted by the same reference numerals, and the detailed description thereof is omitted or simplified.
FIG. 17 is a block diagram showing a treatment system 1E according to the fifth embodiment.
In the treatment system 1 according to the first embodiment described above, the first and second switches 81 and 82 and the switch drive unit 83 are provided in the treatment tool 2 (for example, inside the handle 5).
On the other hand, in a treatment system 1E according to the fifth embodiment, as shown in FIG. 17, a treatment tool 2E in which the first and second switches 81 and 82 and the switch drive unit 83 are omitted from the treatment tool 2 is adopted. doing. Further, in the treatment system 1E, an adapter 21 which can be attached to and detached from the control device 3 is added. Then, the treatment tool 2E and the control device 3 are mutually connected via the adapter 21 and the electric cable CE, so that the DAQ 86 and the control unit 32 can communicate and the first and second resistance patterns 17 and 18 from the power supply 31. It becomes possible to supply power.
Here, first and second switches 81 and 82 and a switch drive unit 83 are provided inside the adapter 21 though the specific illustration is omitted. Then, by connecting the treatment tool 2E and the control device 3 to each other, the first and second switches 81 and 82 are respectively disposed in the first and second supply paths P1 and P2. Further, in the fifth embodiment, the switch drive unit 83 is directly controlled by the control unit 32.

According to the fifth embodiment described above, the following effects can be obtained in addition to the effects similar to those of the first embodiment described above.
In the treatment system 1E according to the fifth embodiment, the treatment tool 2E is not provided with the first and second switches 81 and 82 and the switch drive unit 83. The first and second switches 81 and 82 and the switch driver 83 are provided inside the adapter 21.
Therefore, with respect to the treatment tool 2 described in the first embodiment described above, simplification, downsizing, and cost reduction of the configuration of the treatment tool 2E can be achieved. In addition, in the case where the treatment tool 2E is a disposable part to be discarded after use, the first and second switches 81 and 82 and the switch drive unit 83 are provided in the adapter 21 and therefore should be reused. Can.

(Other embodiments)
Although the embodiments for carrying out the present invention have been described above, the present invention is not to be limited only by the above-described first to fifth embodiments and the first and second modifications of the first embodiment.
In the first to fifth embodiments and the second modification of the first embodiment described above, the second holding member 10 may be omitted.
In the first to fifth embodiments and the first and second modifications of the first embodiment, the heat generating structure 12 is also provided to the second holding member 10, and from both of the first and second holding members 9 and 10. It is also possible to apply thermal energy to the living tissue LT.
In the first to fifth embodiments and the second modification of the first embodiment, in addition to the thermal energy, high-frequency energy or ultrasonic energy may be further applied to the living tissue LT.
In the first to fifth embodiments and the first and second modifications of the first embodiment, the gripping surface of the heat transfer plate 13 and the opposing plate 20 in contact with the living tissue LT is formed of a flat surface. Not limited to. For example, the cross-sectional shape of the gripping surface may be formed in a convex shape, a concave shape, a chevron shape or the like.

In the first to fifth embodiments and the first and second modifications of the first embodiment, the energization control of the first and second resistance patterns 17 and 18 based on the heater temperature measured by the index value measurement unit 322 It was running, but it is not limited to this. For example, the energization control of the first and second resistance patterns 17 and 18 may be executed based on the resistance value of the first and second resistance patterns 17 and 18 measured by the index value measurement unit 322. Absent.
In the first to fifth embodiments and the first and second modifications of the first embodiment, only two heat generating parts (first and second pattern bodies 172 and 182) according to the present invention are provided. Not limited to, three or more may be provided at different positions in the longitudinal direction of the gripping portions 7 and 7A. Further, the number of switches and capacitive elements according to the present invention is not limited to two (first and second switches 81 and 82, and first and second capacitors 87 and 88), and a heat generating portion according to the present invention The same number may be provided, or different numbers (for example, only one) may be provided. In addition, as a switch according to the present invention, a high-speed mechanical switch or the like may be used. Furthermore, the plurality of switches according to the present invention may be configured by one matrix switch module.
In the first and second embodiments and the second and fourth embodiments described above in connection with the first and second resistance patterns 17 and 18 in the first embodiment, in addition to the LEVEL system, the above-described embodiment has been described. The PWM method described in mode 3 may be adopted.
In Embodiment 2 described above, as long as the capacitive element according to the present invention has a capacitance component larger than that of the first and second switches 81 and 82, Embodiment 2 described above Not only the capacitors 87 and 88 described above, other elements may be adopted.
In the first to fifth embodiments and the first and second modifications of the first embodiment, the control device 3 includes the memory 33. However, the present invention is not limited to this. For example, the heater driving unit 8 may be provided with a ROM (Read Only Memory), and a part of the function of the memory 33 (for example, step 2 etc.) may be provided in the ROM.

1, 1 B, 1 E treatment system 2, 2 E treatment tool 3 control device 4 foot switch 5 handle 6 shaft 7, 7 A gripping portion 8 heater driving portion 9 first gripping member 10 second gripping member 11 first cover member 12 Heat generation structure 13 Heat transfer plate 14 Heater 15 Bonding member 16 Substrate 17 1st resistance pattern 18 2nd resistance pattern 19 2nd cover member 20 Counterplate 21 Adapter 31 Power supply 32 Control part 33 Memory 51 Operation knob 81 1st Switches 82 second switch 83 switch driver 84 first detection resistor 85 second detection resistor 86 DAQ
87 first capacitor 88 second capacitor 111 recessed portion 161 surface 171 first connecting portion 172 first pattern main body 181 second connecting portion 182 second pattern main body 191 recessed portion 321 switch control portion 322 index value measuring portion 323 Energizing control unit C, CE Electric cable C1 1st lead C2 2nd lead LT living tissue P1 1st supply path P2 2nd supply path R1 arrow T1 to T4 heater temperature TC, ΔT time V0 initial voltage value V1, V2, VL1, VL2, Vmax voltage value

Claims (7)

1. A heat transfer plate which applies heat energy to a living tissue in contact with the living tissue;
   A plurality of heat generating portions respectively provided at different positions in the longitudinal direction connecting the front end and the base end of the heat transfer plate, and generating heat by energization to heat the heat transfer plate;
   A power supply for supplying an alternating current to the plurality of heat generating parts;
   A plurality of switches connected in series to the plurality of heat generating units and selecting one target heat generating unit to be supplied with alternating current from the power supply among the plurality of heat generating units;
   A switch control unit that controls the operation of the plurality of switches and sequentially switches the one target heating unit among the plurality of heating units;
   An index value measurement unit that measures an index value that is an index of the temperatures of the plurality of heat generating portions,
   And a conduction control unit that controls at least one of switching timing of the target heating unit by the switch control unit and power supplied from the power source to the target heating unit based on the index value.
   The index value measurement unit
   The index value of the non-target heat generating part which is not selected as the target heat generating part among the plurality of heat generating parts according to the capacitance component of the switch connected in series with the non target heat generating part among the plurality of switches The treatment system which measures using the leakage current which flows into the said switch.
2. The index value measurement unit
   The index value of the non-target heating portion selected as the target heating portion next among the plurality of heating portions is a capacitance component of a switch connected in series to the non-target heating portion among the plurality of switches The treatment system according to claim 1, wherein the leakage current flowing through the switch is measured in accordance with.
3. And a plurality of capacitive elements respectively connected in series to the plurality of heat generating portions and in parallel to the plurality of switches, and each having a capacitive component larger than a capacitive component of the switches,
   The index value measurement unit
   The leakage current flowing through the switch and the capacitive element is used according to each capacitive component of the switch and the capacitive element connected in series with the index value of the asymmetric target heat generating part The treatment system according to claim 1 or 2 which measures.
4. The energization control unit is
   The treatment system according to any one of claims 1 to 3, wherein the switching timing is a fixed cycle, and the peak value of the power supplied from the power source to the target heating unit is controlled based on the index value.
5. The energization control unit is
   The peak value of the electric power supplied to the said object heat generating part from the said power supply is made constant, and the energizing time continuously supplied with electricity to the said object heat generating part based on the said index value is controlled. Treatment system described in
6. The index value measurement unit
   Measuring the temperatures of the plurality of heat generating parts respectively;
   The energization control unit is
   The switching timing is set such that, when the heat generating unit having the lowest temperature among the plurality of heat generating units is selected as the target heat generating unit, the amount of power supplied to the target heat generating unit becomes higher than that of the other heat generating units. The treatment system according to any one of claims 1 to 5, wherein a first control is performed to control at least one of the electric power supplied from the power supply to the target heat generating portion.
7. The energization control unit is
   The treatment system according to claim 6, wherein the first control is executed when a temperature difference between the lowest temperature and the highest temperature among the plurality of heat generating parts is equal to or more than a first threshold.

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