WO2019085019A1 - 抗眩盖板的制作方法 - Google Patents

抗眩盖板的制作方法 Download PDF

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Publication number
WO2019085019A1
WO2019085019A1 PCT/CN2017/110904 CN2017110904W WO2019085019A1 WO 2019085019 A1 WO2019085019 A1 WO 2019085019A1 CN 2017110904 W CN2017110904 W CN 2017110904W WO 2019085019 A1 WO2019085019 A1 WO 2019085019A1
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Prior art keywords
crosslinked
layer
crosslinking
cover plate
glare
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Ceased
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PCT/CN2017/110904
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English (en)
French (fr)
Inventor
杨勇
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to US15/578,141 priority Critical patent/US10634821B2/en
Publication of WO2019085019A1 publication Critical patent/WO2019085019A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/06—Hydrocarbons
    • C08F12/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0294—Diffusing elements; Afocal elements characterized by the use adapted to provide an additional optical effect, e.g. anti-reflection or filter
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502—Antiglare, refractive index matching layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133331—Cover glasses
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133792—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/38—Anti-reflection arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/36—Micro- or nanomaterials

Definitions

  • the invention belongs to the technical field of liquid crystal display manufacturing, and in particular to a method for manufacturing an anti-glare cover.
  • the anti-glare micro-structured cover plate prepared by the conventional wet etching process is affected by the process itself such as the concentration of the etching solution and the liquid tension, so that the microstructure-sized particles on the surface of the anti-glare microstructured cover plate are generally 5 ⁇ m or more; therefore, With the improvement of the resolution of the liquid crystal panel, the conventional wet etching process can not meet the particle size requirements of the microstructure; if the photomask process is used for preparation, there is a problem of high cost, which is not conducive to the promotion of the surface treatment technology of the cover plate.
  • the present invention provides a method for manufacturing an anti-glare cover plate, which can inexpensively produce an anti-glare cover plate having disordered size particles of less than 5 ⁇ m.
  • a method for manufacturing an anti-glare cover comprising the steps of:
  • the cover plate having the mesh crosslinked layer is further immersed in a swelling agent to make the mesh The crosslinked layer swells.
  • the amount of the crosslinkable polymer monomer organic substance is from 10 -4 mol/L to 10 -2 mol/L.
  • the crosslinkable polymer monomer organic material includes an ethylene oxide monomer, a methyl methacrylate monomer, a styrene monomer, and a siloxane monomer.
  • crosslinking initiator is a photoinitiator or a thermal initiator.
  • the amount of the crosslinking initiator is from 10 -8 mol/L to 10 -6 mol/L.
  • step S3 when the crosslinking initiator is a photoinitiator, the specific method of step S3 includes:
  • the specific method of the step S3 includes:
  • crosslinked precursor layer continues to undergo a crosslinking reaction to a degree of crosslinking greater than 90%, and the network crosslinked layer is formed on the cover sheet.
  • the mass concentration of hydrogen ions in the acid solution is 5% to 10%.
  • the specific method of removing the mask of the anti-glare microstructure surface comprises: irradiating the surface of the cover plate having the anti-glare microstructure with ultraviolet rays or X-rays to destroy the mesh a crosslinked structure in the crosslinked layer; a network crosslinked layer from which the structure of the antiglare microstructure is removed.
  • the invention obtains an anti-glare cover plate by forming a mesh cross-linked layer on the cover plate and using the mesh-shaped cross-linking layer as a mask, and then etching the cover plate and removing the mask; the anti-glare cover according to the present invention
  • the manufacturing method of the board utilizes the disorder of the mesh cross-linked layer and the characteristics of small size, and the anti-glare cover thus obtained can have a small-sized anti-glare microstructure, thereby exhibiting a slight flicker and an anti-glare effect. Excellent performance.
  • FIG. 1 is a flow chart showing the steps of a method of fabricating an anti-glare cover according to an embodiment of the present invention
  • 2-7 are process flow diagrams of a method of making an anti-glare cover in accordance with an embodiment of the present invention.
  • the invention provides a method for manufacturing an anti-glare cover.
  • the method for manufacturing the anti-glare cover will be described in detail below with reference to the embodiments.
  • a method of fabricating an anti-glare cover according to the present embodiment includes the following steps:
  • Step S1 preparing a crosslinked precursor solution.
  • the crosslinked precursor solution is an organic solution formed by dissolving a crosslinkable polymer monomer organic substance and a crosslinking initiator in an organic solvent.
  • the amount of the substance capable of controlling the organic substance capable of crosslinking the polymerizable monomer is 10 -4 mol/L to 10 -2 mol/L; and the crosslinkable polymer
  • the monomer organic substance includes an ethylene oxide monomer, a methyl methacrylate monomer, a styrene monomer, a siloxane monomer, that is, the crosslinkable polymer monomer organic substance may be an epoxy resin.
  • Ethane and its derivatives, methyl methacrylate and its derivatives, styrene and its derivatives, or siloxanes and their derivatives can be crosslinked by a crosslinking initiator, and then form a network.
  • the crosslinking initiator can be a photoinitiator or a thermal initiator.
  • the content of the crosslinking initiator in the crosslinking precursor solution is generally controlled to be in the order of micrograms; that is, the concentration of the crosslinking initiator in the crosslinking precursor solution is controlled to be 10 -8 mol/ L ⁇ 10 -6 mol / L can be.
  • Step S2 applying a crosslinked precursor solution to the surface of the cap plate 11 to form a crosslinked precursor layer 12; as shown in FIG.
  • Step S3 the cross-linking precursor layer 12 is subjected to a pre-crosslinking treatment and a cross-linking treatment in order to form a network cross-linked layer 13 on the cover plate 11; as shown in FIG.
  • the mesh-based crosslinked layer 13 formed by cross-linking functions as a mask in the subsequent etching process, so that the size and shape of the pores inside the mesh-crosslinked layer 13 determine the surface of the pre-made anti-glare cover plate.
  • the size and shape of the anti-glare microstructure; Pre-crosslinking is used to control the degree of crosslinking, thereby controlling the morphology of the mask.
  • the specific method of the step is: (a) irradiating the crosslinked precursor layer 12 with ultraviolet light to cause pre-crosslinking reaction of the crosslinked precursor layer 12; b) Increasing the ultraviolet light irradiation dose to continue to irradiate the crosslinked precursor layer 12, so that the crosslinked precursor layer 12 continues to undergo a crosslinking reaction, and a network crosslinked layer 13 is formed on the cover sheet 1.
  • the specific method of the step is: (A) heating the cover 11 having the crosslinked precursor layer 12 to cause pre-crosslinking reaction of the crosslinked precursor layer 11; (B) The cover plate 11 having the crosslinked precursor layer 12 is further heated by raising the heating temperature, so that the crosslinked precursor layer 12 continues to undergo a crosslinking reaction, and a network crosslinked layer 13 is formed on the cap plate 11.
  • the crosslinked precursor layer 12 continues to undergo a crosslinking reaction to a degree of crosslinking of more than 90% to form a network crosslinked layer 13 on the cover sheet 11.
  • Step S4 using the mesh crosslinked layer 13 as a mask, etching the cover plate 11 with an acid solution to form an anti-glare microstructure 1a on the surface of the cover plate 11; as shown in FIG.
  • the mass concentration of hydrogen ions in the acid solution is 5% to 10%; preferably, the acid solution is a mixed acid solution of hydrofluoric acid, sulfuric acid and phosphoric acid in a mass ratio of 10:1:1.
  • anti-glare microstructures 1a are obtained by controlling the concentration and/or etching rate of the etching acid.
  • Step S5 removing the mask on the surface of the anti-glare microstructure 1a to obtain the anti-glare cover 1; as shown in FIG.
  • the specific method of removing the mask network crosslinked layer 13 on the surface of the anti-glare microstructure 1a includes: (1) irradiating the surface of the cover 11 having the anti-glare microstructure 1a with ultraviolet rays or X-rays to destroy the mesh intersection The crosslinked structure in the joint layer 13 interrupts the chemical bonds between the molecules; (2) the network crosslinked layer in which the structure of the surface of the anti-glare microstructure 1a is broken.
  • the size and shape of the anti-glare microstructure 1a in the anti-glare cover 1 is determined by the gap inside the mesh cross-linked layer 13, and it is worth noting that, firstly, if a small size is pre-made
  • the anti-glare microstructure 1a controls the concentration of the crosslinkable polymer monomer organic substance in the crosslinked precursor solution to be large, and if a larger size anti-glare microstructure 1a is pre-made, Controlling the concentration of the crosslinkable polymer monomer organic substance in the crosslinked precursor solution to be small; and secondly, controlling the degree of crosslinking by the above pre-crosslinking, specifically by a suitable wavelength of ultraviolet light, an irradiation time or a heating temperature And heating time, etc.

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Abstract

一种抗眩盖板的制作方法，其包括步骤：S1、配制包括可交联高分子单体有机物和交联引发剂的交联前驱体溶液；S2、将交联前驱体溶液涂覆在盖板表面，以形成交联前驱体层；S3、对交联前驱体层先后进行预交联处理和交联处理，以在盖板上形成网状交联层；S4、以网状交联层作为掩膜，采用酸液蚀刻盖板，在盖板表面形成抗眩微结构；S5、去除抗眩微结构表面的掩膜，获得抗眩盖板。通过在盖板上制作网状交联层，利用了网状交联层的无序性以及小尺寸的特性，由此获得的抗眩盖板即可具有小尺寸的抗眩微结构，从而表现出闪烁轻微、抗眩效果好的优异性能，克服了传统湿蚀刻工艺无法达到小尺寸抗眩微结构以及光罩工艺较高的制备成本的弊端。

Description

抗眩盖板的制作方法 技术领域
本发明属于液晶显示器制作技术领域，具体来讲，涉及一种抗眩盖板的制作方法。
背景技术
随着液晶显示器的普及，人们在高亮环境中使用液晶显示器常常会受到高亮环境光的困扰；为此，在液晶显示器表面的盖板上进行抗眩抗反射处理来减轻反射光和眩光的影响，越来越成为人们的共识。然而，随着液晶面板解析度的提高，对液晶显示器表面抗眩处理的要求也越来越高，制备微结构颗粒尺寸小、清晰度高、抗眩抗反射效果好的盖板成为一种趋势，这对盖板的表面处理工艺提出了更高的要求。但是，通过传统湿蚀刻工艺制备的抗眩微结构盖板，由于受到蚀刻液浓度及液体张力等工艺本身的影响，致使抗眩微结构盖板表面的微结构尺寸颗粒一般为5μm以上；因此，随着液晶面板解析度的提高，传统湿蚀刻工艺已不能满足微结构的颗粒尺寸要求；若利用光罩工艺进行制备，则存在成本较高的问题，不利于盖板表面处理技术的推广。
因此，如何廉价地制作微结构尺寸颗粒更小的抗眩盖板的方法是亟待解决的问题。
发明内容
为解决上述现有技术存在的问题，本发明提供了一种抗眩盖板的制作方法，该制作方法可以低廉地制作无序的尺寸颗粒低于5μm的抗眩盖板。
为了达到上述发明目的，本发明采用了如下的技术方案：
一种抗眩盖板的制作方法，包括步骤：
S1、配制交联前驱体溶液；其中，所述交联前驱体溶液为有机溶 剂溶解的可交联高分子单体有机物和交联引发剂形成的有机溶液；
S2、将所述交联前驱体溶液涂覆在盖板表面，以形成交联前驱体层；
S3、对所述交联前驱体层先后进行预交联处理和交联处理，以在所述盖板上形成网状交联层；
S4、以所述网状交联层作为掩膜，采用酸液蚀刻所述盖板，在所述盖板表面形成抗眩微结构；
S5、去除所述抗眩微结构表面的掩膜，获得抗眩盖板。
进一步地，在所述步骤S3中，在所述盖板上形成所述网状交联层后，还将具有所述网状交联层的盖板浸入溶胀剂中，以使所述网状交联层发生溶胀。
进一步地，在所述交联前驱体溶液中，所述可交联高分子单体有机物的物质的量浓度为10-4mol/L～10-2mol/L。
进一步地，所述可交联高分子单体有机物包括环氧乙烷类单体、甲基丙烯酸甲酯类单体、苯乙烯类单体、硅氧烷类单体。
进一步地，所述交联引发剂为光引发剂或热引发剂。
进一步地，在所述交联前驱体溶液中，所述交联引发剂的物质的量浓度为10-8mol/L～10-6mol/L。
进一步地，当所述交联引发剂为光引发剂时，所述步骤S3的具体方法包括：
采用紫外光照射所述交联前驱体层，使所述交联前驱体层发生预交联反应；
增加紫外光照射剂量继续照射所述交联前驱体层，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层；
当所述交联引发剂为热引发剂时，所述步骤S3的具体方法包括：
加热具有所述交联前驱体层的盖板，使所述交联前驱体层发生预交联反应；
升高加热温度继续加热具有所述交联前驱体层的盖板，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层。
进一步地，所述交联前驱体层继续发生交联反应至交联度大于90％，在所述盖板上形成所述网状交联层。
进一步地，在所述步骤S4中，所述酸液中氢离子的质量浓度为5％～10％。
进一步地，在所述步骤S5中，去除所述抗眩微结构表面的掩膜的具体方法包括：采用紫外线或X射线照射具有所述抗眩微结构的盖板表面，以破坏所述网状交联层中的交联结构；去除所述抗眩微结构表面的结构被破坏的网状交联层。
本发明通过在盖板上制作网状交联层，并以该网状交联层作为掩膜，继而蚀刻该盖板并去除掩膜即可获得抗眩盖板；根据本发明的抗眩盖板的制作方法利用了网状交联层的无序性以及小尺寸的特性，由此获得的抗眩盖板即可具有小尺寸的抗眩微结构，从而表现出闪烁轻微、抗眩效果好的优异性能。相比现有技术中的抗眩盖板的一般制作方法，不仅克服了传统湿蚀刻工艺无法达到小尺寸抗眩微结构的弊端，而且避免了光罩工艺较高的制备成本的弊端。
附图说明
通过结合附图进行的以下描述，本发明的实施例的上述和其它方面、特点和优点将变得更加清楚，附图中：
图1是根据本发明的实施例的抗眩盖板的制作方法的步骤流程图；
图2-图7是根据本发明的实施例的的抗眩盖板的制作方法的工艺流程图。
具体实施方式
以下，将参照附图来详细描述本发明的实施例。然而，可以以许多不同的形式来实施本发明，并且本发明不应该被解释为限制于这里阐述的具体实施例。相反，提供这些实施例是为了解释本发明的原理 及其实际应用，从而使本领域的其他技术人员能够理解本发明的各种实施例和适合于特定预期应用的各种修改。在附图中，为了清楚起见，可以夸大元件的形状和尺寸，并且相同的标号将始终被用于表示相同或相似的元件。
本发明提供了一种抗眩盖板的制作方法，以下将参照实施例来详细描述该抗眩盖板的制作方法。
参照图1，根据本实施例的抗眩盖板的制作方法包括下述步骤：
步骤S1、配制交联前驱体溶液。
具体来讲，该交联前驱体溶液是以有机溶剂溶解可交联高分子单体有机物和交联引发剂所形成的有机溶液。
一般地，在该交联前驱体溶液中，控制可交联高分子单体有机物的物质的量浓度为10-4mol/L～10-2mol/L即可；且该可交联高分子单体有机物包括环氧乙烷类单体、甲基丙烯酸甲酯类单体、苯乙烯类单体、硅氧烷类单体，也就是说，可交联高分子单体有机物可以是环氧乙烷及其衍生物、甲基丙烯酸甲酯及其衍生物、苯乙烯及其衍生物、或硅氧烷及其衍生物等可以在交联引发剂的作用下发生交联反应、继而形成网状交联聚合物的有机小分子单体。
优选地，交联引发剂可以是光引发剂或热引发剂。
更为优选地，一般控制交联前驱体溶液中的交联引发剂的含量为微克级即可；即交联前驱体溶液中的交联引发剂的物质的量浓度控制为10-8mol/L～10-6mol/L即可。
步骤S2、将交联前驱体溶液涂覆在盖板11表面，以形成交联前驱体层12；如图2所示。
步骤S3、对交联前驱体层12先后进行预交联处理和交联处理，以在盖板11上形成网状交联层13；如图3所示。
基于通过交联所形成的网状交联层13的作用在于作为后续蚀刻工艺中的掩膜，因此网状交联层13内部的孔洞大小及形状即决定了预制作的抗眩盖板表面的抗眩微结构的大小和形状；由此需要先行通 过预交联来控制交联度，从而控制掩膜的形貌。
具体来讲，若交联引发剂为光引发剂，则该步骤的具体方法为：(a)采用紫外光照射交联前驱体层12，使交联前驱体层12发生预交联反应；(b)增加紫外光照射剂量继续照射交联前驱体层12，使交联前驱体层12继续发生交联反应，在盖板1上形成网状交联层13。
若交联引发剂为热引发剂，则该步骤的具体方法为：(A)加热具有交联前驱体层12的盖板11，使交联前驱体层11发生预交联反应；(B)升高加热温度继续加热具有交联前驱体层12的盖板11，使交联前驱体层12继续发生交联反应，在盖板11上形成网状交联层13。
更为具体地，一般认为交联前驱体层12继续发生交联反应至交联度大于90％即可在盖板11上形成网状交联层13。
步骤S4、以网状交联层13作为掩膜，采用酸液蚀刻盖板11，在盖板11表面形成抗眩微结构1a；如图4所示。
具体来讲，酸液中氢离子的质量浓度为5％～10％；优选地，该酸液为质量比为10∶1∶1的氢氟酸、硫酸和磷酸的混合酸液。
一般来讲，通过控制蚀刻酸液的浓度和/或蚀刻速率来获得不同尺寸的抗眩微结构1a。
步骤S5、去除抗眩微结构1a表面的掩膜，获得抗眩盖板1；如图5所示。
具体地，去除抗眩微结构1a表面的掩膜网状交联层13的具体方法包括：(1)采用紫外线或X射线照射具有抗眩微结构1a的盖板11表面，以破坏网状交联层13中的交联结构，打断分子间的化学键；(2)去除抗眩微结构1a表面的结构被破坏的网状交联层。
综上可以看出，抗眩盖板1中抗眩微结构1a的尺寸及形状由网状交联层13内部的空隙决定，由此值得说明的是，其一，若预制作较小尺寸的抗眩微结构1a，则控制交联前驱体溶液中可交联高分子单体有机物的浓度偏大，而若预制作较大尺寸的抗眩微结构1a，则 控制交联前驱体溶液中可交联高分子单体有机物的浓度偏小即可；其二，通过上述预交联控制交联度，具体可通过紫外光的合适波长、照射时间或通过加热温度、加热时间等来控制；其三，若经过交联形成的网状交联层13的空隙尺寸仍偏大，则优选将具有网状交联层13的盖板11浸入溶胀剂中，以使网状交联层13发生溶胀，如此即可缩小该网状交联层13的空隙，以形成较小尺寸的抗眩微结构1a，如图6和图7所示。
虽然已经参照特定实施例示出并描述了本发明，但是本领域的技术人员将理解：在不脱离由权利要求及其等同物限定的本发明的精神和范围的情况下，可在此进行形式和细节上的各种变化。

Claims (18)

  1. 一种抗眩盖板的制作方法，其中，包括步骤：
    S1、配制交联前驱体溶液；其中，所述交联前驱体溶液为有机溶剂溶解的可交联高分子单体有机物和交联引发剂形成的有机溶液；
    S2、将所述交联前驱体溶液涂覆在盖板表面，以形成交联前驱体层；
    S3、对所述交联前驱体层先后进行预交联处理和交联处理，以在所述盖板上形成网状交联层；
    S4、以所述网状交联层作为掩膜，采用酸液蚀刻所述盖板，在所述盖板表面形成抗眩微结构；
    S5、去除所述抗眩微结构表面的掩膜，获得抗眩盖板。
  2. 根据权利要求1所述的制作方法，其中，在所述步骤S3中，在所述盖板上形成所述网状交联层后，还将具有所述网状交联层的盖板浸入溶胀剂中，以使所述网状交联层发生溶胀。
  3. 根据权利要求1所述的制作方法，其中，在所述交联前驱体溶液中，所述可交联高分子单体有机物的物质的量浓度为10-4mol/L～10-2mol/L。
  4. 根据权利要求3所述的制作方法，其中，所述可交联高分子单体有机物包括环氧乙烷类单体、甲基丙烯酸甲酯类单体、苯乙烯类单体、硅氧烷类单体。
  5. 根据权利要求2所述的制作方法，其中，在所述交联前驱体溶液中，所述可交联高分子单体有机物的物质的量浓度为10-4mol/L～10-2mol/L。
  6. 根据权利要求5所述的制作方法，其中，所述可交联高分子单体有机物包括环氧乙烷类单体、甲基丙烯酸甲酯类单体、苯乙烯类单体、硅氧烷类单体。
  7. 根据权利要求1所述的制作方法，其中，所述交联引发剂为 光引发剂或热引发剂。
  8. 根据权利要求7所述的制作方法，其中，在所述交联前驱体溶液中，所述交联引发剂的物质的量浓度为10-8mol/L～10-6mol/L。
  9. 根据权利要求7所述的制作方法，其中，当所述交联引发剂为光引发剂时，所述步骤S3的具体方法包括：
    采用紫外光照射所述交联前驱体层，使所述交联前驱体层发生预交联反应；
    增加紫外光照射剂量继续照射所述交联前驱体层，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层；
    当所述交联引发剂为热引发剂时，所述步骤S3的具体方法包括：
    加热具有所述交联前驱体层的盖板，使所述交联前驱体层发生预交联反应；
    升高加热温度继续加热具有所述交联前驱体层的盖板，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层。
  10. 根据权利要求9所述的制作方法，其中，所述交联前驱体层继续发生交联反应至交联度大于90％，在所述盖板上形成所述网状交联层。
  11. 根据权利要求2所述的制作方法，其中，所述交联引发剂为光引发剂或热引发剂。
  12. 根据权利要求11所述的制作方法，其中，在所述交联前驱体溶液中，所述交联引发剂的物质的量浓度为10-8mol/L～10-6mol/L。
  13. 根据权利要求11所述的制作方法，其中，当所述交联引发剂为光引发剂时，所述步骤S3的具体方法包括：
    采用紫外光照射所述交联前驱体层，使所述交联前驱体层发生预交联反应；
    增加紫外光照射剂量继续照射所述交联前驱体层，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层；
    当所述交联引发剂为热引发剂时，所述步骤S3的具体方法包括：
    加热具有所述交联前驱体层的盖板，使所述交联前驱体层发生预交联反应；
    升高加热温度继续加热具有所述交联前驱体层的盖板，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层。
  14. 根据权利要求13所述的制作方法，其中，所述交联前驱体层继续发生交联反应至交联度大于90％，在所述盖板上形成所述网状交联层。
  15. 根据权利要求1所述的制作方法，其中，在所述步骤S4中，所述酸液中氢离子的质量浓度为5％～10％。
  16. 根据权利要求2所述的制作方法，其中，在所述步骤S4中，所述酸液中氢离子的质量浓度为5％～10％。
  17. 根据权利要求1所述的制作方法，其中，在所述步骤S5中，去除所述抗眩微结构表面的掩膜的具体方法包括：
    采用紫外线或X射线照射具有所述抗眩微结构的盖板表面，以破坏所述网状交联层中的交联结构；
    去除所述抗眩微结构表面的结构被破坏的网状交联层。
  18. 根据权利要求2所述的制作方法，其中，在所述步骤S5中，去除所述抗眩微结构表面的掩膜的具体方法包括：
    采用紫外线或X射线照射具有所述抗眩微结构的盖板表面，以破坏所述网状交联层中的交联结构；
    去除所述抗眩微结构表面的结构被破坏的网状交联层。
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