WO2019029142A1 - 一种纳米梁结构的打印制造方法 - Google Patents

一种纳米梁结构的打印制造方法 Download PDF

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WO2019029142A1
WO2019029142A1 PCT/CN2018/075330 CN2018075330W WO2019029142A1 WO 2019029142 A1 WO2019029142 A1 WO 2019029142A1 CN 2018075330 W CN2018075330 W CN 2018075330W WO 2019029142 A1 WO2019029142 A1 WO 2019029142A1
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nano
coaxial
substrate
inner layer
outer layer
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French (fr)
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王大志
赵小军
任同群
梁军生
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Dalian University of Technology
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Dalian University of Technology
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349—Creating layers of material on a substrate
    • B81C1/00373—Selective deposition, e.g. printing or microcontact printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00142—Bridges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
    • B81C2201/0183—Selective deposition
    • B81C2201/0185—Printing, e.g. microcontact printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
    • B81C2201/0183—Selective deposition
    • B81C2201/0188—Selective deposition techniques not provided for in B81C2201/0184 - B81C2201/0187

Definitions

  • the invention belongs to the field of advanced manufacturing technology and relates to a printing manufacturing method of a nano beam structure.
  • Nano devices have outstanding performances such as high sensitivity, low power consumption, and high integration. They have broad application prospects in energy, environment, biology, and medical fields, such as high-sensitivity nanowire sensors, high-capacity nano memories, and high-switching nano-transistors.
  • the beam structure of nano-simple beam and nano-cantilever beam has the advantages of large specific surface area, high sensitivity and easy excitation, and has become an important structure of high-performance nanodevices.
  • nano-beam structures are mainly produced by crystal growth method and transfer method.
  • the crystal growth method refers to longitudinally growing nanowires on two adjacent substrates by means of laser sintering, hydrolysis, electrochemical deposition, etc., and when the nanowires on the two substrates are grown to a certain height, the upper ends are in contact with each other.
  • a nanobeam structure is formed between the two substrates in a lapped manner.
  • the nanobeam prepared by the method has poor shape and dimensional consistency, and the low strength of the lap joint results in poor reliability of the formed nanodevice, and the method has low efficiency and poor controllability.
  • the transfer method refers to transferring nanowires prepared by a crystal growth method, an electron beam, or the like to a substrate of a pre-formed channel by a precision operation process to form a nano-beam structure.
  • the process of preparing nano-beams by transfer method is complicated, the cycle is long, the equipment is expensive, and the efficiency is low.
  • the ends of the transferred nano-beams need to be fixed by plasma-induced deposition.
  • the present invention invents a nano-beam structure printing manufacturing method.
  • Coaxial fluid is used, the inner fluid is a functional material, and the outer fluid is a high-viscosity material.
  • the inner and outer fluids respectively form nano-scale and micro-scale coaxial wrapping jets, which are prefabricated.
  • the linear package structure is printed on the support substrate, and the thermal field is applied at the same time.
  • the inner nanostructure and the outer high viscosity fluid are respectively cured and semi-cured under the action of the thermal field, and the semi-cured outer layer of the high viscosity liquid acts internally.
  • the support of the layer nano-beams, and finally the outer high-viscosity wrapping material is removed, and the nano-beams composed only of the inner layer functional materials are obtained.
  • the printing manufacturing method of the nano beam structure firstly transports the inner layer functional liquid and the outer layer high viscosity liquid to the coaxial printing nozzle, and then applies a certain voltage on the coaxial nozzle, and the electric field force acts on the coaxial inner and outer layers simultaneously.
  • the viscous force generated by the liquid, the outer liquid cone-jet deformation is superimposed on the electric field shear force of the inner liquid, and acts on the inner liquid, and the inner and outer fluids form a nano- and micro-scale wrap jet, which will be wrapped.
  • the coaxial jet is printed onto the substrate of the prefabricated support and simultaneously exerts a thermal field effect.
  • the inner nanostructure and the outer high viscosity fluid are respectively cured and semi-cured under the action of the thermal field, and the semi-cured outer layer is highly viscous liquid.
  • the support of the inner nanobeams is then removed, and the outer high viscosity wrapping material is removed, and a nanobeam structure composed only of the inner functional material is formed on the substrate of the preformed support.
  • a printing method for a nano beam structure the steps are as follows:
  • the nano beam structure is divided into a cantilever beam and a simply supported beam, and the substrate is prepared according to the nano beam; the corresponding substrate of the cantilever beam is a high temperature resistant flat plate structure; the corresponding substrate of the simple supported beam is a high temperature resistant plate with a desired aspect ratio groove.
  • the structure and the trench are prepared by micro-nano processing such as photolithography, etching, ion beam, etc.
  • a conductive coating is prepared by magnetron sputtering, evaporation, electroforming, etc., as an electrode of the nanobeam. ;
  • the inner layer functional material and the outer layer high-viscosity material are respectively injected into the coaxial printing nozzle through the micro-injection pump, and the coaxial printing nozzle is connected with the high-voltage power source to adjust the inner layer material flow rate at 1pL/min-5pL. /min, the outer material flow rate is between 100nL/min and 150nL/min, the voltage is between 500V-1000V, the distance between the nozzle and the substrate is between 500 ⁇ m-1mm, and the inner layer functional material and the outer layer are formed at the exit of the coaxial printing nozzle.
  • a coaxial stable jet composed of a high viscosity material
  • the substrate is fixed on the moving platform by a vacuum adsorption device, the coaxial nozzle is perpendicular to the substrate, and the moving platform is moved at a speed of 80 mm/s to 100 mm/s, and the coaxial stable jet composed of the inner layer functional material and the outer layer high viscosity material is used.
  • the viscosity material plays a supporting role on the inner nano-beam, and the outer high-viscosity wrapping material is removed by pyrolysis or solution dissolution, and a cantilever nano beam or a simple supported nano beam composed only of the inner layer functional material is formed on the substrate. structure.
  • the invention has the beneficial effects that the nano beam is manufactured by coaxial focusing jet printing, the inner layer fluid is a functional material, and the outer layer fluid is a high viscosity material. Under the electric field-flow field combination, the inner layer and the outer layer fluid respectively form a nanometer level. And the micron-scale coaxial package jet, printing the linear wrap structure on the prefabricated support substrate, and then removing the outer wrap material to obtain a nano-beam structure composed only of the inner functional material.
  • the coaxial focusing jet printing method for manufacturing nano-beam structures has the advantages of simple process, high consistency, and mass production, and provides an effective means for low-cost and rapid manufacturing of high-performance nano-beam devices.
  • Figure 1 is a schematic view of a printing device.
  • FIG. 2 is a flow chart of a process for manufacturing nanobeams by printing.
  • Embodiments primarily include substrate fabrication and nanobeam structure printing fabrication.
  • the single-sided polished single crystal silicon wafer was oxidized in a tube furnace for 3.5 hours, and a channel having a width of 20 ⁇ m and a depth of 5 ⁇ m was prepared on the surface by micro-nano processing such as photolithography and wet etching for printing nano-simple support.
  • the beam is then deposited by a pair of rectangular platinum electrodes having a thickness of 200 nm on the upper sides of the support on both sides of the channel by photolithography, magnetron sputtering, or the like.
  • the selected inner layer functional material and the outer layer high viscosity material are respectively injected into the coaxial printing nozzle (3) through the micro syringe pump (4), (5), and the coaxial printing nozzle is connected with the high voltage power source (2), and the adjustment is performed.
  • the flow rate of the layer material is 2pL/min
  • the flow rate of the outer layer material is 1nL/min
  • the voltage is 600V
  • the nozzle-substrate spacing is 600 ⁇ m.
  • a layer of functional material and an outer layer of high-viscosity material can be formed. Stabilize the coaxial cone-jet (7).
  • the prefabricated support substrate (6) is fixed on the moving platform (1) by a vacuum adsorption device, and the coaxial nozzle vertically prefabricates the support substrate, moves through the moving platform (100 mm/s), and the inner layer functional material and the outer layer
  • a coaxial stable jet consisting of a highly viscous material is printed on a prefabricated support substrate, and a coaxial coated jet is printed onto the substrate to form a linear wrap structure, the nanoscale inner functional material (9) and the micron outer layer of the wrapped structure.
  • the high-viscosity material (8) is separately cured and semi-cured under the action of a thermal field, and the semi-cured outer layer high-viscosity material plays a supporting role for the inner nano-beam, and the outer layer high-viscosity wrapping material is removed by pyrolysis.
  • a simple supported nano beam structure (10) composed only of an inner layer functional material is formed between the two supports.
  • the invention provides a printing manufacturing method of a nano beam structure.
  • Nano-beams are fabricated by coaxial focusing jet printing.
  • the inner layer fluid is a functional material
  • the outer layer fluid is a high-viscosity material.
  • the inner layer and the outer layer fluid form a nano-scale and a micro-scale coaxial respectively.
  • the jet is wrapped, the linear wrap structure is printed on the prefabricated support substrate, and then the outer wrap material is removed to obtain a nanobeam structure composed only of the inner functional material.
  • the coaxial focusing jet printing method for manufacturing nano-beam structures has the advantages of simple process, high consistency, and mass production, and provides an effective means for low-cost and rapid manufacturing of high-performance nano-beam devices.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Micromachines (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

一种纳米梁结构的打印制造方法，将内层功能液体与外层高粘度液体输送至同轴打印喷头（3），在同轴打印喷头（3）上施加电压，电场力同时作用于同轴内、外层液体，外层液体锥-射流形变产生的粘滞力与内层液体的电场剪切力叠加，共同作用于内层液体，内层和外层流体形成纳米级和微米级的包裹射流，将包裹同轴射流打印到预制支撑体的衬底（6）上，并同时施加热场作用，内层纳米结构和外层高粘度流体在热场作用下分别固化和半固化，然后将外层高粘度包裹材料去除，在预制支撑体的衬底（6）上形成仅由内层功能材料构成的纳米梁（10）结构。这种方法工艺简单、一致性高、可批量制造，可低成本、快速制造高性能纳米梁器件。

Description

一种纳米梁结构的打印制造方法 技术领域
本发明属于先进制造技术领域，涉及一种纳米梁结构的打印制造方法。
 背景技术
纳米器件具有高灵敏度、低功耗、高集成等突出性能，在能源、环境、生物、医疗等方面具有广泛应用前景，如高灵敏纳米线传感器、高容量纳米存储器、高开关比纳米晶体管等。在纳米器件结构中，纳米简支梁、纳米悬臂梁等梁结构具有大比表面积、高敏感度、易于激发等优点，已成为高性能纳米器件的重要结构。目前纳米梁结构的制作方法主要有晶体生长法和转移法。晶体生长法是指借助激光烧、水解、电化学沉积等工艺，分别在相邻两个衬底上纵向生长纳米线，当两衬底上的纳米线生长到一定高度后，上端发生相互接触，以搭接的方式在两衬底之间形成纳米梁结构。此方法制备的纳米梁形状和尺寸一致性差，搭接处强度低导致形成的纳米器件可靠性差，此外该方法效率低、可控性差。转移法是指将晶体生长法、电子束等工艺制备的纳米线通过精密操作工艺转移到预制沟道的衬底上，形成纳米梁结构。转移法制备纳米梁工艺复杂、周期长、设备昂贵、效率低，转移得到的纳米梁端部需要等离子诱导沉积等工艺进行固定。
 技术问题
本技术为了克服上述纳米梁制造技术的不足，发明一种纳米梁结构的打印制造方法。采用同轴流体，内层流体为功能材料，外层流体为高粘度材料，在电场-流场复合作用下，内层和外层流体分别形成纳米级和微米级的同轴包裹射流，在预制支撑体衬底上打印线型包裹结构，并同时施加热场作用，内层纳米结构和外层高粘度流体在热场作用下分别固化和半固化，半固化外层高粘度液体起到对内层纳米梁的支撑作用，最后将外层高粘度包裹材料去除，得到仅由内层功能材料构成的纳米梁。
 技术解决方案
本发明的技术方案：
一种纳米梁结构的打印制造方法，首先将内层功能液体与外层高粘度液体输送至同轴打印喷头，然后在同轴喷头上施加一定电压，电场力同时作用于同轴内、外层液体，外层液体锥-射流形变产生的粘滞力与内层液体的电场剪切力叠加，共同作用于内层液体，内层和外层流体形成纳米级和微米级的包裹射流，将包裹同轴射流打印到预制支撑体的衬底上，并同时施加热场作用，内层纳米结构和外层高粘度流体在热场作用下分别固化和半固化，半固化外层高粘度液体起到对内层纳米梁的支撑作用，然后将外层高粘度包裹材料去除，在预制支撑体的衬底上形成仅由内层功能材料构成的纳米梁结构。
一种纳米梁结构的打印制造方法，步骤如下：
(1)衬底制备
纳米梁结构分为悬臂梁和简支梁，根据纳米梁制备衬底；悬臂梁对应的衬底为耐高温平板结构；简支梁对应的衬底为开有所需深宽比沟槽的耐高温平板结构，沟槽是借助光刻、刻蚀、离子束等微纳加工工艺制备得到；在衬底上，利用磁控溅射、蒸镀、电铸等工艺制备导电涂层，作为纳米梁的电极；
(2)同轴射流的形成
根据纳米梁结构材质的需求，将内层功能材料与外层高粘度材料分别通过微量注射泵注入同轴打印喷头，同轴打印喷头与高压电源相连，调节内层材料流量在1pL/min-5pL/min、外层材料流量在100nL/min-150nL/min、电压在500V-1000V、喷头与衬底间距在500µm-1mm之间，在同轴打印喷头出口处形成由内层功能材料与外层高粘度材料组成的同轴稳定射流；
(3)纳米梁结构的打印成型
通过真空吸附装置将衬底固定于运动平台上，同轴喷头垂直衬底，以80mm/s-100mm/s速度移动运动平台，由内层功能材料与外层高粘度材料组成的同轴稳定射流打印在衬底上，同轴包裹射流打印到衬底上形成线型包裹结构，包裹结构的内层功能材料与外层高粘度材料在热场作用下分别固化与半固化，半固化外层高粘度材料起到对内层纳米梁的支撑作用，利用热解或溶液溶解方式将外层高粘度包裹材料去除，在衬底上形成仅由内层功能材料构成的悬臂纳米梁或简支纳米梁结构。
 有益效果
本发明的有益效果：采用同轴聚焦射流打印制造纳米梁，内层流体为功能材料，外层流体为高粘度材料，在电场-流场复合作用下，内层和外层流体分别形成纳米级和微米级的同轴包裹射流，在预制支撑体衬底上打印线型包裹结构，然后将外层包裹材料去除，获得仅由内层功能材料构成的纳米梁结构。同轴聚焦射流打印方法制造纳米梁结构具有工艺简单、一致性高、可批量制造等优点，为高性能纳米梁器件的低成本、快速制造提供有效手段。
 附图说明
图1为打印装置示意图。
图2为打印制造纳米梁工艺流程图。
图中：1X-Y运动平台；2高压电源；3同轴打印喷头；4微量注射泵；
5微量注射泵；6带支撑体衬底；7同轴锥-射流；8外层微米级包裹结构；
 9内层纳米级功能结构；10纳米梁。
 本发明的实施方式
以下结合技术方案和附图详细说明本发明的具体实施方式。实施例主要包括衬底制备与纳米梁结构打印制造。
实施例的具体实施步骤如下：
1、衬底制备
将单面抛光的单晶硅片在管式炉中氧化3.5小时后利用光刻、湿法刻蚀等微纳加工工艺在其表面制备出宽度20µm，深度5µm的沟道用于打印纳米简支梁；之后利用光刻、磁控溅射等工艺在沟道两侧支撑体上部沉积一对厚度为200nm的矩形铂金电极。
2、同轴射流的形成
将选定的内层功能材料与外层高粘度材料分别通过微量注射泵（4）、（5）注入到同轴打印喷头（3），同轴打印喷头与高压电源（2）相连，调节内层材料流量为2pL/min、外层材料流量为1nL/min、电压600V、喷头-衬底间距600µm，在同轴打印喷头出口处即可形成由内层功能材料与外层高粘度材料组成的稳定同轴锥-射流（7）。
3、纳米梁结构的打印成型
通过真空吸附装置将预制支撑体衬底（6）固定于运动平台（1）上，同轴喷头垂直预制支撑体衬底，通过运动平台移动（100mm/s），由内层功能材料与外层高粘度材料组成的同轴稳定射流打印在预制支撑体衬底上，同轴包裹射流打印到衬底上形成线型包裹结构，包裹结构的纳米级内层功能材料（9）与微米级外层高粘度材料（8）在热场作用下分别固化与半固化，半固化外层高粘度材料起到对内层纳米梁的支撑作用，利用热解的方式将外层高粘度包裹材料去除，在两支撑体之间形成仅由内层功能材料构成的简支纳米梁结构（10）。
本发明提出一种纳米梁结构的打印制造方法。采用同轴聚焦射流打印制造纳米梁，内层流体为功能材料，外层流体为高粘度材料，在电场-流场复合作用下，内层和外层流体分别形成纳米级和微米级的同轴包裹射流，在预制支撑体衬底上打印线型包裹结构，然后将外层包裹材料去除，获得仅由内层功能材料构成的纳米梁结构。同轴聚焦射流打印方法制造纳米梁结构具有工艺简单、一致性高、可批量制造等优点，为高性能纳米梁器件的低成本、快速制造提供有效手段。

Claims (1)

  1. 一种纳米梁结构的打印制造方法，其特征在于，步骤如下：
    (1)衬底制备
    纳米梁结构分为悬臂梁和简支梁，根据纳米梁制备衬底；悬臂梁对应的衬底为耐高温平板结构；简支梁对应的衬底为开有所需深宽比沟槽的耐高温平板结构，沟槽是借助光刻、刻蚀或离子束微纳加工工艺制备得到；在衬底上，利用磁控溅射、蒸镀或电铸工艺制备导电涂层，作为纳米梁的电极；
    (2)同轴射流的形成
    根据纳米梁结构材质的需求，选择内层功能材料与外层高粘度材料；将内层功能材料与外层高粘度材料分别通过微量注射泵注入同轴打印喷头，同轴打印喷头与高压电源相连，调节内层功能材料流量为1pL/min-5pL/min、外层高粘度材料流量为100nL/min-150nL/min、电压为500V-1000V、喷头与衬底间距为500µm-1mm，在同轴打印喷头出口处形成由内层功能材料与外层高粘度材料组成的同轴稳定射流；
    (3)纳米梁结构的打印成型
    通过真空吸附装置将衬底固定于运动平台上，同轴喷头垂直衬底，以80mm/s-100mm/s速度移动运动平台，由内层功能材料与外层高粘度材料组成的同轴稳定射流打印在衬底上，同轴包裹射流打印到衬底上形成线型包裹结构，包裹结构的内层功能材料与外层高粘度材料在热场作用下分别固化与半固化，半固化外层高粘度材料起到对内层纳米梁的支撑作用，利用热解或溶液溶解方式将外层高粘度包裹材料去除，在衬底上形成仅由内层功能材料构成的悬臂纳米梁或简支纳米梁结构。
PCT/CN2018/075330 2017-08-10 2018-02-05 一种纳米梁结构的打印制造方法 Ceased WO2019029142A1 (zh)

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