Classifications

• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
  • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
  • C07F7/02—Silicon compounds
  • C07F7/08—Compounds having one or more C—Si linkages
  • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
  • C07F7/1804—Compounds having Si-O-C linkages
  • C07F7/1872—Preparation; Treatments not provided for in C07F7/20
  • C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
  • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
  • C07F7/02—Silicon compounds
  • C07F7/08—Compounds having one or more C—Si linkages
  • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
  • C07F7/1804—Compounds having Si-O-C linkages
  • C07F7/1872—Preparation; Treatments not provided for in C07F7/20
  • C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages

Definitions

• the present invention relates to a method for preparing silicon-containing heterocycles of the general formula (I) as defined herein by reacting at least one aminoalkoxysilane and at least one epoxide in the presence of a catalyst in a one-step reaction.
• the present invention relates to the use of the obtained silicon-containing heterocycles.
• alkoxy adducts of cyclic silanes having one alkoxide residue may lead to up to 33% less expelled alcohol compared to aminoalkyltrimethoxysilane.
• siloxacycloalkenes are disclosed in Rossmy and Koerner (Die Makromolekulare Chemie, 1964, 73, 85-108 and Die Makromolekulare Chemie, 1966, 97, 241-247), Kuwajima et al (Tanino, K.; Yoshitani, N.; Moriyama, F.; Kuwajima, ⁇ : he Journal of Organic Chemistry, 1997, 62, 4206-4207) and Woerpel et al (Bear T. J., Shaw J. T., Woerpel K. A., The Journal of Organic Chemistry, 2002, 67, 2056-2064).
• Chvalovsky and El-Hamouly discloses the preparation of 7- and 8-membered siloxacycloalkenes by hydosilylation of allylalkylsilanes on to alkoxysilane and later decomposing the disilane product to methylalkoxysilane and siloxacycloalkene in the presence of sodium ethoxide or hydroxide.
• This approach requires an expensive platinum catalyst for the hydrosilylation reaction and produces methylalkoxysilane during cyclization.
• a polymer is formed during the reaction, therefore distillation is needed to obtain a clean product.
• US Patent 4794192 and 4855351 disclose the preparation of silicon-containing heterocycles by heating a mixture of glycidyl ethers with aminoalkoxysilanes under reflux.
• JP 2014001 152 discloses the preparation of a silane coupling agent for surface treatment applications. It is prepared by ring opening of epoxides in a two-step reaction. In the first step an aminosilane and an epoxide are reacted at high temperature to yield an alcohol. In the second step a dealcoholization reaction is induced by in situ removal of the produced alcohol in the presence of a basic catalyst. The described reaction synthesis results in 30-40 % yield, suggesting poor reaction selectivity. The catalyst is usually not removed after the reaction, which can interfere with the curing catalyst used in adhesive formulations later on.
• the object of the present invention is therefore to provide a method for preparing silicon-containing heterocycles which solves some of the known issues, allowing the production of the silicon- containing heterocycles in a one-step reaction at mild conditions.
• the above-defined method has been found to produce the silicon-containing heterocycles of the general formula (I) at high yields in a one-step reaction at mild conditions.
• the method according to the present invention is more energy-efficient due to the low reaction temperature required. It also results in higher selectivity, decreasing the amount of produced waste and simplifying the purification of the product.
• the present invention provides a method for preparing a silicon-containing heterocycle of the general formula (I)
• R is hydrogen
• R 2 and R 3 are same or different and are, independently from one another, selected from a linear or branched, substituted or unsubstituted C1-C20 alkyl or C6-C18 aryl residue, preferably selected from a Ci-Cs alkyl residue, more preferably a methyl, ethyl or propyl residue, which may be interrupted by at least one heteroatom;
• R 4 is selected from a linear or branched, substituted or unsubstituted C1-C20 alkylene residue, preferably a O-Cs alkylene, more preferably a methylene, ethylene, 1 ,3-propylene, 2-methyl-1 ,3- propylene, or 1 ,4-butylene residue, most preferably a methylene or 1 ,3-propylene residue, which may be interrupted by at least one heteroatom;
• R 5 and R 6 are same or different and are, independently from one another, selected from the group consisting of hydrogen, a linear or branched, substituted or unsubstituted C1-C20 alkyl or C6- C18 aryl, preferably Ci-Cs alkyl residue or a phenyl residue, which may be interrupted by at least one heteroatom, and a C4-C8 cycloalkyl, or R 5 and R 6 may form a ring, preferably a 4- to 8-membered alkyl ring
• n 0, 1 or 2, preferably 2,
• said method comprising a one-step reaction of at least one epoxide compound of the general formula (II) and at least one aminoalkoxysilane having a primary amino group in the presence of a catalyst
• R 5 and R 6 are the same as defined for the general formula (I) above.
• the present invention also relates to use of the silicon-containing heterocycle of the general formula (I) obtained by the method according to the present invention as an adhesion promoter, urethane coupling agent, end-capping agent for moisture curable compositions, surface treatment agent, water scavenger, fiber treatment agent, paint additive, and/or a monomer for polymer preparations, preferably as an end-capping agent for moisture curable compositions.
• At least one means 1 or more, i.e., 1 , 2, 3, 4, 5, 6, 7, 8, 9, or more. With reference to an ingredient, the indication refers to the type of ingredient and not to the absolute number of molecules. "At least one polymer” thus means, for example, at least one type of polymer, i.e., that one type of polymer or a mixture of several different polymers may be used.
• Ci-C2o alkyl or “Ci-C8 alkyl” residue refers to a monovalent group that contains from 1 to 20 or from 1 to 8 carbons atoms, that is a radical of an alkane and includes linear and branched organic groups.
• alkyl residues include, but are not limited to: methyl; ethyl; propyl (or n- propyl); isopropyl; n-butyl; isobutyl; sec-butyl; tert-butyl; n-pentyl; n-hexyl; n-heptyl; and , 2-ethylhexyl.
• alkyl residues may be unsubstituted or may be substituted with one or more substituents such as halo, preferably fluoro, nitro, cyano, amido, amino, sulfonyl, sulfinyl, sulfanyl, sulfoxy, urea, thiourea, sulfamoyi, sulfamide and hydroxy.
• substituents such as halo, preferably fluoro, nitro, cyano, amido, amino, sulfonyl, sulfinyl, sulfanyl, sulfoxy, urea, thiourea, sulfamoyi, sulfamide and hydroxy.
• halo preferably fluoro, nitro, cyano, amido, amino, sulfonyl, sulfinyl, sulfanyl, sulfoxy, urea, thiourea,
• unsubstituted alkyl residues containing from 1 to 6 carbon atoms C1-C6 alkyl
• unsubstituted alkyl residues containing from 1 to 4 carbon atoms Ci- C4 alkyl
• C4-C8 cycloalkyl is understood to mean a saturated, mono- or bicyclic hydrocarbon residue having from 4 to 8 carbon atoms.
• Examples of cycloalkyl residues include, but are not limited to: cyclopropyl; cyclobutyl; cyclopentyl; cyclohexyl; cycloheptyl; cyclooctyl; and norbornane.
• an "C6-C18 aryl" residue is used alone or as part of a larger moiety - as in "aralkyl residue” - refers to optionally substituted, monocyclic, bicyclic and tricyclic ring systems in which the monocyclic ring system is aromatic or at least one of the rings in a bicyclic or tricyclic ring system is aromatic.
• the bicyclic and tricyclic ring systems include benzofused 2-3 membered carbocyclic rings.
• Exemplary aryl residues include, but are not limited to: phenyl; indenyl; naphthalenyl, tetrahydronaphthyl, tetrahydroindenyl; tetrahydroanthracenyl; and, anthracenyl.
• a phenyl residue is preferred.
• the term "C1-C20 alkylene” or "Ci-Cs alkylene” residue refers to a divalent group that contains from 1 to 20 or 1 to 8 carbon atoms, that is a radical of an alkane and includes linear, branched organic or cyclic groups, which groups may be unsubstituted or substituted and may optionally be interrupted by at least one heteroatom.
• the expression "interrupted by at least one heteroatom” means that the main chain of a residue comprises, as a chain member, at least one atom that differs from carbon atom, preferably selected from oxygen, sulfur, or nitrogen.
• the present invention provides a method for preparing a silicon-containing heterocycle of the general formula (I)
• R is hydrogen
• R 2 and R 3 are same or different and are, independently from one another, selected from a linear or branched, substituted or unsubstituted C1-C20 alkyl or C6-C18 aryl residue, preferably selected from a Ci-Cs alkyl residue, more preferably a methyl, ethyl or propyl residue, which may be interrupted by at least one heteroatom;
• R 4 is selected from a linear or branched, substituted or unsubstituted C1-C20 alkylene residue, preferably a O-Cs alkylene, more preferably a methylene, ethylene, 1 ,3-propylene, 2-methyl-1 ,3- propylene, or 1 ,4-butylene residue, most preferably a methylene or 1 ,3-propylene residue, which may be interrupted by at least one heteroatom;
• R 5 and R 6 are same or different and are, independently from one another, selected from the group consisting of hydrogen, a linear or branched, substituted or unsubstituted C1-C20 alkyl or C6- C18 aryl, preferably Ci-Cs alkyl residue or a phenyl residue, which may be interrupted by at least one heteroatom, and a C4-C8 cycloalkyl, or R 5 and R 6 may form a ring, preferably a 4- to 8-membered alkyl ring, more preferably a 4- to 8-membered alkyl ring, more preferably 5- or 6-membered alkyl ring; and
• n 0, 1 or 2, preferably 2,
• said method comprising a one-step reaction of at least one epoxide compound of the general formula (II) and at least one aminoalkoxysilane having a primary amino group in the presence of a catalyst
• R 5 and R 6 are the same as defined for the general formula (I) above.
• R is hydrogen;
• R 2 is selected from a linear or branched, substituted or unsubstituted Ci-Cs alkyl residue;
• R 3 is selected from a linear or branched, substituted or unsubstituted O-Cs alkyl residue;
• R 4 is selected from a linear or branched, substituted or unsubstituted O-Cs alkylene residue;
• R 5 is selected from hydrogen and a linear or branched, substituted or unsubstituted O-Cs alkyl residue while R 6 is selected from a linear or branched, substituted or unsubstituted O-Cs alkyl residue or a phenyl, or R 5 and R 6 form a 4- to 8- membered alkyl ring, in particular a 5- or 6-membered alkyl ring.
• n 2; R is hydrogen; R 3 is selected from a methyl, ethyl or propyl residue, most preferably a methyl residue; R 4 is selected from a methylene, ethylene, 1 ,3- propylene, 2-methyl-1 ,3-propylene, or 1 ,4-butylene residue, more preferably a methylene or 1 ,3- propylene residue, most preferably a 1 ,3-propylene residue; R 5 is hydrogen; and/or R 6 is selected from a linear or branched, substituted or unsubstituted O-Cs alkyl residue or phenyl residue, or R 5 and R 6 form a 5- or 6-membered alkyl ring.
• Examples of the epoxide of the general formula (II) include, but are not limited to: ethylene oxide, propylene oxide, 1 ,2-epoxybutane, 1 ,2-epoxyhexane, 1 ,2-epoxydodecane, cyclohexyl oxirane, n- butyl glycidyl ether, tert-butyldimethylsilyl glycidyl ether, benzyl glycidyl ether, 10, 1 1-epoxyundecan- 1-ol, 4,5-epoxypentyl butyrate, 5,6-epoxyhexanenitrile, N,N-dimethyl-10, 1 1-undecylamide, 1 ,2- epoxy-5-hexene, 1 ,2-epoxy-7-octene, (2,3-epoxypropyl)benzene, styrene oxide, and 1 ,2,7,8- diepoxyoct
• the aminoalkoxysilane used in the method for preparing silicon-containing heterocycle of the general formula (I) has the general formula (III) wherein, R to R 4 are the same as defined for the general formula (I) above; and n is 0, 1 , 2 or 3, preferably 3.
• aminoalkoxysilane examples include, but are not limited to: aminoalkylenealkoxysilane, such as N-cyclohexylaminomethylmethyldiethoxysilane, N-cyclohexylaminomethyltriethoxysilane, N- phenylaminomethyltrimethoxysilane, N-cyclohexyl-3-aminopropyltrimethoxysilane, 3- ureidopropyltrimethoxysilan, vinylbenzylaminoethylaminopropyltrimethoxysilane, aminoethylaminopropyltrimethoxysilane, for example, Dow Corning® Z-6121 Silane of Dow Corning, aminoethylaminopropylsilanetriol homopolymer, for example, Dow Corning® Z-6137 Silane of Dow Corning, bis(3-triethoxysilylpropyl)amine, bis(3-trimethoxysilylpropyl)amine,
• Dynasylan® HYDROSIL 1 151 Dynasylan® HYDROSIL 2627, Dynasylan® HYDROSIL 2909, Dynasylan® HYDROSIL 2929, Dynasylan® HYDROSIL 2776 of Evonik, triaminofunctional propyltrimethoxysilanes, for example, Dynasylan® TRIAMO of Evonik, oligosiloxanes, for example, Dynasylan® 1 146 of Evonik, N-(n-butyl)-3-aminopropyltrimethoxysilane, cationic benzylamino- functional silane hydrochloride, for example, Dynasylan® 1 161 of Evonik, 2-aminoethyl-3- aminopropylmethyldimethoxysilane, 2-aminoethyl-3-aminopropyltrimethoxysilane, gammaaminopropyltri
• the synthesis of the silicon-containing heterocycle of the general formula (I) may be carried out at a broad range of temperature such as from -100 to 50 °C, preferably from 0 to 50 °C, more preferably from 0 to 35 °C, most preferably from 10 to 25 °C such as at a room temperature.
• Reaction times may vary from 0.5 to 96 hours, preferably from 2 to 48 hours.
• the at least one epoxide is added in stoichiometric amounts or in an excess ranging from 1 to 200 %, preferably from 10 to 100 %, more preferably 50 %, with respect to the amino groups of the aminoalkoxysilane(s).
• the unreacted epoxides are removed after the reaction using high vacuum.
• the reaction is carried out in at least one neat or in dry solvent.
• solvents include, but are not limited to: toluene, acetonitrile, tetrahydrofuran, ethylene glycol, diethyl ether, dimethyl ether, benzene, ethyl acetate, isopropanol, propanol, ethanol, methanol, chloroform, chloromethane, dichloromethane, pentane, hexane, heptane, cyclohexane, isooctane, toluene, xylene, dioxane, butyl acetate, acetonitrile or dimethylformamide. Mixtures of different solvents can also be used.
• the one-step reaction according to the present invention is carried out in the presence of a catalyst.
• a catalyst include, but are not limited to: Lewis acid or base catalysts or Br0nsted- Lowry acid or base catalysts or a combination thereof.
• Lewis acid catalysts more preferably weak Lewis acid catalysts can be used.
• Lewis acid refers to any electrophilic reagent that is capable of accepting an electron pair and that is not a Br0nsted-Lowry acid.
• week Lewis acid refers to an electron pair acceptor which forms a strong conjugate base.
• the acidity of a metal based Lewis acids decrease with a growing a metal radius (e. g. AI>Fe>Ca). Therefore the term weak Lewis acid is associated to the acids containing elements like Ca, Mg, Na, etc.
• the week Lewis acid shows a pKa value of ⁇ 8 (Jander et al., MaB analyses: Why und Kir der Titrationen mit chemischen und physikalischen Indikationen. 16 th Edition. Walter de Gruyter, 2003).
• the Lewis acid portion of the catalyst includes an element selected from Groups 1 to 14 of the Periodic Table or contains a lanthanide metal.
• Useful Lewis acids may either be neutral (e.g., compounds such as AICIs, CrCI 2 , CrC , ZnCI 2 , BF 3 , BCI 3 , Yb(OTf) 3 , FeCI 2 , FeCIs, C0CI2, etc.) or cationic.
• a broad array of metallic Lewis acids have been found applicable to the present invention.
• metal is an alkaline earth metal of Group 2, such as magnesium, calcium, beryllium, strontium.
• organocalcium, organomagnesium, organostrontium or organoberyllium compounds are preferred, wherein these metal catalysts comprise preferably alkoxy groups, sulfonate groups, carboxyl groups, dialkyl phosphate groups, dialkyl pyrophosphate groups and/or diketonate groups.
• Particularly suitable catalyst is selected from calcium bistrifluoroacetate, calcium bisacetate, calcium bispivalate, calcium bisisobutyrane, calcium bispropionate, calcium acetate, calcium benzoate, calcium cyclohexanecarboxylate, calcium 2,2-difluoroacetate, calcium 2-fluoroacetate, calcium 2- chloroacetate, calcium methyl carbonate, magnesium bistrifluoroacetate, magnesium bisacetate, magnesium bispivalate, magnesium bisisobutyrane, magnesium bispropionate, magnesium acetate, magnesium benzoate, magnesium cyclohexanecarboxylate, magnesium 2,2-difluoroacetate, magnesium 2-fluoroacetate, magnesium 2-chloroacetate, and magnesium methyl carbonate.
• Transition metals can also be used in the reaction according to the present invention.
• the transition metal is aluminum, chromium, indium or gallium.
• organotitanate is used as the catalyst.
• organotitante include, but are not limited to: titanium(IV) complex compounds with two 1 ,3-diketonate ligands, in particular 2,4-pentane dionate (acetylacetonate), and two alcoholate ligands; titanium(IV) complex compounds with two 1 ,3-ketoesterate ligands, in particular ethyl acetoacetate, and two alcoholate ligands; titanium(IV) complex compounds with one or more amino alcoholate ligands, in particular triethanolamine or 2-((2-aminoethyl)amino)ethanol, and one or more alcoholate ligands; titanium(IV) complex compounds with four alcoholate ligands; as well as more highly condensed organotitanates, in particular oligomeric titanium(IV) tetrabutanolate, also referred to as polybutyl titanate; wherein, as alcoholate ligands
• Tyzor® AA GBA, GBO, AA-75, AA-65, AA-105, DC, BEAT, BTP, TE, TnBT, KTM, TOT, TPT or IBAY (all from Du Pont/Dorf Ketal); Tytan PBT, TET, X85, TAA, ET, S2, S4 or S6 (all from TensoChema) and Ken-React® KR® TTS, 7, 9QS, 12, 26S, 33DS, 38S, 39DS, 44, 134S, 138S, 133DS, 158FS or LICA® 44 (all from Kenrich Petrochemicals).
• Nitrogen-containing Lewis or Br0nsted-Lowry bases can also be used.
• these catalysts include, but are not limited to: 1 ,4-diazabicyclo[2.2.2]octane, ⁇ , ⁇ , ⁇ ', ⁇ '-tetramethyl alkylenediamines, polyoxyalkylenamines, triethylamine, tripropylamine, trimethylamine, as well as amidines, such as, in particular, 6-dibutylamino-1 ,8-diazabicyclo[5.4.0]undec-7-ene, 1 ,8-diazabicyclo[5.4.0]undec-7- ene (DBU), 1 ,5-diazabicyclo[4.3.0]non-5-ene (DBN); guanidines such as, in particular, tetramethylguanidine, acetylacetoneguanidine, 2-guanidinobenzimidazole, 2-tert.butyl-1 , 1 ,3,
• the catalyst can be added up to 10 mol-%, preferably from 0.01 to 10 mol-%, more preferably from 0.5 to 5 mol-%, most preferably from 1 to 2.5 mol-%, relative to the mol-% of the amine functionality of the aminoalkoxysilane.
• the silicon-containing heterocycle of the general formula (I) as defined herein is used as an end-capping agent for moisture-curable compositions, preferably coating, sealant or adhesive compositions, with good adherence properties to a wide range of substrates and with a reduced amount of alcohol production during the curing process.

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• 2018
  • 2018-02-15 RU RU2020107716A patent/RU2020107716A/ru unknown
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